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WO2025220439A1 - Thermally conductive silicone potting composition and cured product thereof - Google Patents

Thermally conductive silicone potting composition and cured product thereof

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Publication number
WO2025220439A1
WO2025220439A1 PCT/JP2025/011623 JP2025011623W WO2025220439A1 WO 2025220439 A1 WO2025220439 A1 WO 2025220439A1 JP 2025011623 W JP2025011623 W JP 2025011623W WO 2025220439 A1 WO2025220439 A1 WO 2025220439A1
Authority
WO
WIPO (PCT)
Prior art keywords
thermally conductive
conductive silicone
component
silicone potting
potting composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
PCT/JP2025/011623
Other languages
French (fr)
Japanese (ja)
Inventor
晶 坂本
一馬 石田
展明 松本
利之 小材
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shin Etsu Chemical Co Ltd
Original Assignee
Shin Etsu Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shin Etsu Chemical Co Ltd filed Critical Shin Etsu Chemical Co Ltd
Publication of WO2025220439A1 publication Critical patent/WO2025220439A1/en
Pending legal-status Critical Current
Anticipated expiration legal-status Critical

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Classifications

    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J11/00Features of adhesives not provided for in group C09J9/00, e.g. additives
    • C09J11/02Non-macromolecular additives
    • C09J11/04Non-macromolecular additives inorganic
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J11/00Features of adhesives not provided for in group C09J9/00, e.g. additives
    • C09J11/02Non-macromolecular additives
    • C09J11/06Non-macromolecular additives organic
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J183/00Adhesives based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Adhesives based on derivatives of such polymers
    • C09J183/04Polysiloxanes
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J9/00Adhesives characterised by their physical nature or the effects produced, e.g. glue sticks
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K7/00Constructional details common to different types of electric apparatus
    • H05K7/20Modifications to facilitate cooling, ventilating, or heating

Definitions

  • the present invention relates to a thermally conductive silicone potting composition and its cured product.
  • thermally conductive silicone composition such as a thermally conductive silicone grease composition, a thermally conductive silicone gel composition, or a thermally conductive silicone potting composition between the heat-generating component and the cooler.
  • Patent Document 1 proposes a method in which a cooler and a heat-generating component are assembled in advance, and then a highly fluid, thermally conductive silicone potting composition is poured into the assembly to thermally connect the heat-generating component and the cooler.
  • the thermal conductivity is limited to approximately 1.0 W/m ⁇ K, which is insufficient to deal with the further increase in heat generation that has accompanied the recent trend toward miniaturization of devices and miniaturization of components.
  • Patent Documents 2 to 5 propose silicone potting compositions that contain large amounts of thermally conductive fillers to achieve high thermal conductivity while also maintaining high fluidity.
  • compositions have high fluidity, they also have high viscosity, and with the recent trend toward smaller devices and finer components, it can be difficult to pot every corner of the components, and they have not been able to impart sufficient heat dissipation properties. Therefore, in order to improve the performance of inverters, there is a strong demand for a thermally conductive silicone potting material that not only has high thermal conductivity and high fluidity, but also has a lower viscosity.
  • the present invention has been made in consideration of the above circumstances, and aims to provide a thermally conductive silicone potting composition that, despite containing a large amount of thermally conductive filler, has low viscosity and high flowability, can flow into minute spaces, and has the desired thermal conductivity after curing.
  • a thermally conductive silicone potting composition comprising: (A) 100 parts by weight of a linear organopolysiloxane having an average of 0.5 to 1.8 alkenyl groups bonded to silicon atoms at the molecular chain terminals per molecule; (B) 500 to 2,000 parts by weight of a thermally conductive filler; (C) 0.1 to 100 parts by weight of an organohydrogensiloxane having at least two SiH groups per molecule; and (D) a hydrosilylation reaction catalyst; 2.
  • the thermally conductive silicone potting composition of 3 wherein the thermally conductive filler (B) is surface-treated with component (E). 5.
  • a cured product is provided by curing the thermally conductive silicone potting composition of any one of 1 to 5.
  • the thermally conductive silicone potting composition of the present invention Before curing, the thermally conductive silicone potting composition of the present invention has low viscosity and high flowability, allowing it to flow into minute spaces. After curing, it achieves the desired thermal conductivity and is able to protect heat-generating components without peeling off. For this reason, the composition of the present invention is effective for potting when it is fixed to a cooler of a component having a fine structure, such as a transformer. In such components, after hardening, the composition has high thermal conductivity and can efficiently transfer heat from the component to the cooler, making it highly reliable even when used in high-temperature environments.
  • the thermally conductive silicone potting composition of the present invention cures at room temperature or under heat and adheres to metals, organic resins, etc., and contains the following essential components (A) to (D): (A) alkenyl group-containing organopolysiloxane (B) thermally conductive filler (C) organohydrogensiloxane (D) hydrosilylation reaction catalyst
  • Component (A) is a linear organopolysiloxane having an average of 0.5 to 1.8 alkenyl groups per molecule bonded to silicon atoms at the molecular chain terminals.
  • the average number of alkenyl groups per molecule of component (A) is preferably 0.8 to 1.8, and more preferably 1.0 to 1.6. If the number of alkenyl groups is less than 0.5, the strength of the cured product will be low or the composition will not cure, while if the number exceeds 1.8, the flowability of the composition will be reduced.
  • the viscosity of component (A) at 25°C is preferably 10 to 500 mPa ⁇ s, more preferably 10 to 200 mPa ⁇ s, and even more preferably 10 to 100 mPa ⁇ s. If the viscosity at 25°C is 10 mPa ⁇ s or higher, the composition will have excellent storage stability, and if it is 500 mPa ⁇ s or lower, the composition will have good flowability. The above viscosity is measured using a B-type rotational viscometer (the same applies hereinafter).
  • the alkenyl group bonded to the silicon atom is not particularly limited, but is preferably an alkenyl group having 2 to 10 carbon atoms, and more preferably an alkenyl group having 2 to 8 carbon atoms. Specific examples thereof include vinyl, allyl, 1-butenyl, and 1-hexenyl groups, and among these, vinyl groups are preferred from the standpoint of ease of synthesis and cost.
  • the organic group bonded to the silicon atom other than the alkenyl group is not particularly limited, but is preferably a monovalent hydrocarbon group having 1 to 20 carbon atoms and excluding aliphatic unsaturated bonds, and more preferably a monovalent hydrocarbon group having 1 to 10 carbon atoms and excluding aliphatic unsaturated bonds.
  • Specific examples thereof include alkyl groups such as methyl, ethyl, n-propyl, n-butyl, n-hexyl, and n-dodecyl; aryl groups such as phenyl; and aralkyl groups such as 2-phenylethyl and 2-phenylpropyl.
  • the hydrogen atoms of these hydrocarbon groups may be substituted with halogen atoms such as chlorine, fluorine, or bromine, and specific examples thereof include halogen-substituted monovalent hydrocarbon groups such as fluoromethyl, 2-bromoethyl, chloromethyl, and 3,3,3-trifluoropropyl groups.
  • halogen atoms such as chlorine, fluorine, or bromine
  • specific examples thereof include halogen-substituted monovalent hydrocarbon groups such as fluoromethyl, 2-bromoethyl, chloromethyl, and 3,3,3-trifluoropropyl groups.
  • the organic groups bonded to silicon atoms other than alkenyl groups are preferably alkyl groups having 1 to 5 carbon atoms, and more preferably 90 mol % or more of which are methyl groups from the standpoint of ease of synthesis and cost.
  • Component (A) preferably does not contain an organoxysilyl group, and examples of organoxy groups include alkoxy groups, alkoxyalkoxy groups, alkenyloxy groups, and acyloxy groups.
  • the alkoxy group includes those having 1 to 10 carbon atoms, preferably 1 to 6 carbon atoms, and more preferably 1 to 3 carbon atoms, such as a methoxy group and an ethoxy group.
  • the alkoxyalkoxy group includes those in which each alkoxy group has 1 to 6 carbon atoms, preferably 1 to 3 carbon atoms, such as a methoxyethoxy group and a methoxypropoxy group.
  • the alkenyloxy group may have 2 to 6 carbon atoms, such as a vinyloxy group or an allyloxy group.
  • the acyloxy group may have 1 to 10 carbon atoms, such as an acetyloxy group or an octanoyloxy group.
  • Component (B) is a thermally conductive filler that serves to impart thermal conductivity to the composition.
  • thermally conductive filler conventionally known ones can be used, and specific examples thereof include aluminum powder, copper powder, silver powder, nickel powder, gold powder, alumina powder, zinc oxide powder, magnesium oxide powder, aluminum nitride powder, aluminum hydroxide powder, boron nitride powder, silicon nitride powder, diamond powder, carbon powder, indium, gallium, etc.
  • thermally conductive fillers may be used alone or in combination of two or more.
  • the thermally conductive filler preferably has a thermal conductivity of 10 W/m ⁇ K or more in order to impart sufficient thermal conductivity to the composition.
  • the average particle size of the thermally conductive filler is preferably 0.1 to 100 ⁇ m, more preferably 0.5 to 90 ⁇ m. Within this range, aggregation of the thermally conductive filler particles is suppressed, resulting in excellent fluidity.
  • the average particle size in the present invention is the median diameter (D50) in the volume-based particle size distribution determined by laser diffraction method.
  • the thermally conductive filler may have any shape, such as an irregular shape or a spherical shape.
  • the amount of component (B) blended is 500 to 2,000 parts by mass, preferably 800 to 1,500 parts by mass, per 100 parts by mass of component (A). If it is less than 500 parts by mass, sufficient thermal conductivity may not be achieved, and if it exceeds 2,000 parts by mass, the composition may become highly viscous or its flowability may decrease.
  • Component (C) is an organohydrogensiloxane having at least two, preferably three or more, and more preferably 3 to 100 hydrogen atoms bonded to silicon atoms (SiH groups) per molecule.
  • the molecular structure of the organohydrogensiloxane of component (C) may be linear, branched, or network, and multiple organohydrogensiloxane chains may be linked by linking groups.
  • Silicon-bonded hydrogen atoms may be present either at the molecular chain terminals (both terminals or one terminal) or non-terminal portions, or may be present in both locations.
  • the organic groups other than hydrogen atoms bonded to the silicon atoms in component (C) include monovalent hydrocarbon groups having 1 to 10 carbon atoms, excluding alkenyl groups. Specific examples include alkyl groups such as methyl, ethyl, propyl, and butyl; aryl groups such as phenyl and tolyl; aralkyl groups such as phenylethyl and phenylpropyl; and halogenated alkyl groups in which some or all of the hydrogen atoms in these groups have been replaced with halogen atoms such as chlorine, fluorine, or bromine, such as gamma-chloropropyl and 3,3,3-trifluoropropyl.
  • alkyl groups such as methyl, ethyl, propyl, and butyl
  • aryl groups such as phenyl and tolyl
  • aralkyl groups such as phenylethyl and phenylpropyl
  • alkyl groups having 1 to 6 carbon atoms are preferred, and alkyl groups having 1 to 3 carbon atoms are more preferred.
  • the kinematic viscosity of component (C) at 25°C is not particularly limited, but is preferably 1 to 10,000 mm2 /s, and more preferably 1 to 1,000 mm2 /s.
  • the kinematic viscosity is measured at 25°C using a Cannon-Fenske viscometer (the same applies hereinafter).
  • Several components with different viscosities may be used in combination as component (C).
  • Component (C) may be a compound containing a cyclic organohydrogensiloxane represented by the following general formula (3-1) and/or a cyclic organohydrogensiloxane represented by the following general formula (3-2). These compounds serve to crosslink with component (A) and to impart adhesive properties.
  • R2 's are each independently an alkyl group having 1 to 6 carbon atoms, preferably 1 to 3 carbon atoms, and specific examples thereof include methyl, ethyl, n-propyl, n-butyl, n-pentyl, n-hexyl, etc. Among these, from the standpoint of ease of synthesis and cost, it is preferable that 90 mol % or more of R2 's are methyl groups.
  • R3 's are each independently an epoxy group or a trialkoxysilyl group bonded to the silicon atom via a carbon atom or via a carbon atom and an oxygen atom.
  • Examples of epoxy groups bonded to a silicon atom via a carbon atom or via a carbon atom and an oxygen atom include 3-glycidoxypropyl, 3-glycidoxyethyl, and 3,4-epoxycyclohexylethyl groups.
  • trialkoxysilyl groups bonded to a silicon atom via a carbon atom or via a carbon atom and an oxygen atom include trimethoxysilylpropyl, trimethoxysilylpropylmethyl, trimethoxysilylethyl, triethoxysilylpropyl, triethoxysilylpropylmethyl, and triethoxysilylethyl groups.
  • i is an integer of 2 or more
  • j is an integer of 1 or more
  • i+j is an integer of 4 to 12, preferably an integer of 4 to 8, more preferably an integer of 4 to 6, and even more preferably 4.
  • the siloxane units in formula (3-1) may be arranged in any order, and may be arranged randomly, in blocks, or alternately.
  • X is a divalent hydrocarbon group which may contain an ether bond, and is preferably a group containing a bisphenol A residue represented by the following formula (4).
  • k's are each independently an integer of 3 to 11, preferably an integer of 3 to 7, more preferably an integer of 3 to 5, and even more preferably 3.
  • component (C) include, but are not limited to, organohydrogensiloxanes represented by the following formula.
  • Component (C) may be used alone or in combination of two or more types.
  • the blending amount of component (C) is 0.1 to 100 parts by mass, and more preferably 1 to 20 parts by mass, per 100 parts by mass of component (A). Less than 0.1 parts by mass will result in insufficient curing, while more than 100 parts by mass may result in reduced mechanical properties of the cured product.
  • Component (D) is a hydrosilylation catalyst. Any hydrosilylation catalyst that promotes the addition reaction between the alkenyl group of component (A) and the Si—H group of component (C) can be used, and any conventionally known catalyst can be used. Specifically, platinum group metal catalysts are preferred, and among these, catalysts selected from platinum and platinum compounds are preferred.
  • catalysts include platinum (including platinum black); platinum group metals such as rhodium and palladium ; H2PtCl4.nH2O , H2PtCl6.H2O , NaHPtCl6.nH2O , KHPtCl6.nH2O , Na2PtCl6.nH2O , K2PtCl4.nH2O , PtCl4.nH2O , PtCl2 , Na2HPtCl4.nH2O , chloroplatinic acid; chloroplatinic acid salts; alcohol-modified chloroplatinic acid; complexes of chloroplatinic acid with olefins; platinum group metals such as platinum black or palladium supported on a support such as alumina, silica or carbon; rhodium-olefin complexes; chlorotris(triphenylphosphine)rhodium (Wilkinson's catalyst); complex
  • the amount of component (D) to be added should be an effective amount as a catalyst, an amount that can promote the reaction between components (A) and (C), and can be adjusted appropriately depending on the desired curing rate. In particular, an amount equivalent to 0.1 to 7,000 ppm, and more preferably 1 to 6,000 ppm, by mass, calculated as platinum group metal atoms relative to the mass of component (A), is preferred. When the blending amount of component (E) is within the above range, more efficient catalytic action can be expected.
  • the thermally conductive silicone potting composition of the present invention preferably contains, as component (E), a silane compound represented by the following general formula (1) and an organopolysiloxane represented by the following general formula (2). This component acts on the surface of the thermally conductive filler and has the role of improving fluidity.
  • R1 's each independently represent a monovalent hydrocarbon group, and n represents an integer of 0 to 30.
  • the monovalent hydrocarbon group for R1 is not particularly limited, but is preferably a monovalent hydrocarbon group having 1 to 10 carbon atoms, more preferably a monovalent hydrocarbon group having 1 to 6 carbon atoms, and even more preferably a monovalent hydrocarbon group having 1 to 3 carbon atoms.
  • Specific examples of the monovalent hydrocarbon group include alkyl, alkenyl, aryl, and aralkyl groups, as well as halogenated monovalent hydrocarbon groups such as halogenated alkyl groups in which some or all of the hydrogen atoms of these monovalent hydrocarbon groups have been substituted with halogen atoms such as chlorine, fluorine, or bromine.
  • the alkyl group may be linear, branched, or cyclic, and specific examples thereof include linear alkyl groups such as methyl, ethyl, n-propyl, n-hexyl, and n-octyl groups; branched alkyl groups such as isopropyl, isobutyl, tert-butyl, and 2-ethylhexyl groups; and cyclic alkyl groups such as cyclopentyl and cyclohexyl groups.
  • Specific examples of the alkenyl group include vinyl, allyl, 1-butenyl, and 1-hexenyl groups.
  • Specific examples of the aryl group include phenyl and tolyl groups.
  • aralkyl group examples include 2-phenylethyl and 2-methyl-2-phenylethyl groups.
  • halogenated alkyl groups include 3,3,3-trifluoropropyl, 2-(nonafluorobutyl)ethyl, and 2-(heptadecafluorooctyl)ethyl groups.
  • R 1 is preferably a methyl group, a phenyl group, or a vinyl group, and more preferably a methyl group.
  • n is preferably an integer from 0 to 20, and more preferably an integer from 1 to 10.
  • the blending amount is 0.1 to 30 parts by mass, and more preferably 0.1 to 20 parts by mass, per 100 parts by mass of component (A).Within this range, a highly fluid composition is likely to be obtained.
  • the component (E) may be used alone or in combination of two or more types.
  • the thermally conductive silicone potting composition of the present invention may contain known additives, provided that the addition does not impair the object of the present invention.
  • additives include, for example, reaction inhibitors for the purpose of suppressing the curing reaction of the composition at room temperature and extending the shelf life and pot life.
  • the reaction inhibitor may be any known reaction inhibitor that can suppress the catalytic activity of component (D).
  • Specific examples include acetylene alcohol compounds such as 1-ethynyl-1-cyclohexanol and 3-butyn-1-ol; nitrogen-containing compounds such as triallyl isocyanurate; organic phosphorus compounds; oxime compounds; and organic chloro compounds. These may be used alone or in combination of two or more. Of these, 1-ethynyl-1-cyclohexanol and triallyl isocyanurate are preferred.
  • thermally conductive silicone potting composition of the present invention can also contain hindered phenol-based antioxidants, reinforcing and non-reinforcing fillers such as calcium carbonate, and colorants such as pigments and dyes.
  • the thermally conductive silicone potting composition of the present invention can be prepared by mixing the above-mentioned components (A) to (D), and optionally component (E) and other components, using a known method such as a gate mixer, kneader, or planetary mixer.
  • the thermally conductive silicone potting composition of the present invention may be a two-part composition in which a first part consisting of components (A), (B), and (D), and optionally component (E) and other components, and a second part consisting of components (A), (B), and (C), and optionally component (E) and other components, are prepared separately, and the first and second parts are mixed together before use. There may also be components that are shared by both the first and second parts. By forming the composition into such a two-part composition, storage stability can be further ensured.
  • the viscosity of the thermally conductive silicone potting composition of the present invention at 25°C is preferably 1 to 30 Pa ⁇ s, and more preferably 1 to 20 Pa ⁇ s, from the standpoints of dispersibility of the thermally conductive filler and workability.
  • the viscosity is measured using a Brookfield type rotational viscometer at 20 rpm (approximate shear rate of 4.2 s -1 ).
  • the thermally conductive silicone potting composition preferably has a thixotropic index value of 1.3 or less after mixing and before curing. If the thixotropic index exceeds 1.3 after mixing and before curing, the composition may have poor fluidity, making it difficult for the composition to flow into heat-generating components with fine structures.
  • the thixotropic index is the viscosity measured at 10 rpm (approximate shear rate of 2.1 s -1 ) using a Brookfield viscometer divided by the viscosity measured at 20 rpm (approximate shear rate of 4.2 s -1 ).
  • the thermally conductive silicone potting composition of the present invention preferably has a flowability of 100 mm or more at 23°C, the measurement method of which will be described in detail in the Examples below.
  • the flowability is preferably 120 mm or more. The higher the flowability, the better, but because the measurement limit depends on the length of the aluminum plate, the upper measurement limit here is 400 mm.
  • the curing conditions for the thermally conductive silicone potting composition of the present invention are not particularly limited, and can be the same as those for conventionally known silicone gels. After pouring, the thermally conductive silicone potting composition may be cured by the heat from the heat-generating component, or may be actively heated and cured.
  • the heat-curing conditions are preferably 60 to 180°C, more preferably 80 to 150°C, and preferably 0.1 to 3 hours, more preferably 0.5 to 2 hours.
  • the thermal conductivity of the cured product of the thermally conductive silicone potting composition of the present invention at an ambient temperature of 25° C. is preferably 1.5 W/m K or more, and more preferably 2.0 W/m K or more. There is no particular upper limit, but it is usually 10.0 W/m K or less.
  • the hardness of the cured product is preferably 10 or more as measured by a type A durometer, and although there is no particular upper limit, it is usually 80 or less.
  • the present invention will be described in more detail below with reference to examples and comparative examples, but the present invention is not limited to these examples.
  • the weight average molecular weight is a polystyrene-equivalent value measured by gel permeation chromatography (GPC).
  • GPC gel permeation chromatography
  • Component A-1 A dimethylpolysiloxane in which 80% of the terminals are blocked with dimethylvinylsilyl groups and 20% are blocked with trimethylsilyl groups, and which has a viscosity of 50 mPa ⁇ s at 25°C.
  • A-2 A dimethylpolysiloxane in which both terminals are blocked with dimethylvinylsilyl groups, and which has a viscosity of 60 mPa ⁇ s at 25°C.
  • Component B-1 Alumina powder with an average particle size of 1.0 ⁇ m
  • B-2 Alumina powder with an average particle size of 10 ⁇ m
  • B-3 Alumina powder with an average particle size of 40 ⁇ m
  • B-4 Alumina powder with an average particle size of 80 ⁇ m
  • C-2 Organohydrogensiloxane having an average structure represented by the following formula: (In the formula, the order of the siloxane units in parentheses is not specified.)
  • Component D-1 Dimethylpolysiloxane solution of platinum-divinyltetramethyldisiloxane complex (both ends of which are capped with dimethylvinylsilyl groups, dissolved in dimethylpolysiloxane having a viscosity of 0.6 Pa ⁇ s at 25°C; platinum concentration: 1% by mass)
  • Example 1 to 3 Components (A) through (E) and other components were mixed as follows to obtain a silicone potting composition.
  • Component (A), component (B), and component (E) were added to a 5L gate mixer (manufactured by Inoue Seisakusho Co., Ltd., product name: 5L Planetary Mixer) in the amounts shown in Table 1, and mixed at 25°C for 1 hour, followed by mixing under reduced pressure at 150°C for 2 hours to obtain a mixture (for Example 2, a mixture in which component (B) was surface-treated with component (E)).
  • component (D) was added and the mixture was mixed at 25°C for 30 minutes.
  • reaction inhibitors (F-1) and (F-2) were added and the mixture was mixed at 25°C for 30 minutes.
  • component (C) was added and the mixture was mixed at room temperature for 30 minutes.
  • the resulting composition was measured for the following physical properties, and the results are shown in Table 2.
  • Viscosity The viscosity of the thermally conductive silicone potting composition at 25°C was measured using a Brookfield viscometer (TVB-10H, manufactured by Toki Sangyo Co., Ltd.) with a No. 7 rotor at 20 rpm (approximate shear rate of 4.2 s -1 ).
  • Flowability 0.60 mL of the thermally conductive silicone potting composition was weighed out and dropped onto an aluminum plate (JIS H 4000:2022, width 25 mm x length 400 mm x thickness 0.5 mm).
  • the viscosity of the thermally conductive silicone potting composition at 25°C was calculated by dividing the viscosity measured at 10 rpm (approximate shear rate of 2.1 s ) using a Brookfield viscometer (TVB-10H, manufactured by Toki Sangyo Co., Ltd.) with a No. 7 rotor by the viscosity measured at 20 rpm (approximate shear rate of 4.2 s ).
  • thermally conductive silicone potting composition was press-cured to a thickness of 2.0 mm at 120°C for 10 minutes, and then heated in an oven at 120°C for 50 minutes.
  • the thermal conductivity of the resulting cured product was measured in accordance with ISO 22007-2 using a hot disc thermophysical property analyzer TPA-501 (manufactured by Kyoto Electronics Manufacturing Co., Ltd.) at an ambient temperature of 25°C.
  • Density The thermally conductive silicone potting composition was press-cured to a thickness of 2.0 mm at 120°C for 10 minutes, and then heated in an oven at 120°C for 50 minutes. The density of the resulting silicone sheet was measured in accordance with JIS K 6251:2017.
  • the tensile shear adhesive strength of the resulting test piece was measured in accordance with JIS K 6850:1999.
  • Hardness The thermally conductive silicone potting composition was press-cured to a thickness of 2.0 mm at 120°C for 10 minutes, and then heated in an oven at 120°C for 50 minutes. Three of the resulting silicone sheets were stacked, and the hardness was measured using a Type A durometer as specified in JIS K 6253:2012.
  • thermally conductive silicone potting compositions of Examples 1 and 2 exhibit low viscosity and high flowability, and are known to have excellent thermal conductivity after curing.

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Inorganic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Thermal Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Compositions Of Macromolecular Compounds (AREA)

Abstract

[Problem] To provide a thermally conductive silicone potting composition that has low viscosity and high flowability in spite of containing a large amount of a thermally conductive filler, is capable of flowing into a minute space, and exhibits a desired thermal conductivity after being cured. [Solution] The thermally conductive silicone potting composition comprises: (A) 100 parts by mass of a linear organopolysiloxane having, on average, 0.5 to 1.8 alkenyl groups bonded to a silicon atom at a molecular chain terminal per molecule; (B) 500-2,000 parts by mass of a thermally conductive filler; (C) 0.1 to 100 parts by mass of an organohydrogensiloxane having at least two SiH groups in one molecule; and (D) a hydrosilylation reaction catalyst.

Description

熱伝導性シリコーンポッティング組成物およびその硬化物Thermally conductive silicone potting composition and its cured product

 本発明は、熱伝導性シリコーンポッティング組成物およびその硬化物に関する。 The present invention relates to a thermally conductive silicone potting composition and its cured product.

 地球温暖化への意識の高まりから、自動車業界では温室効果ガス低減を目的として、ハイブリット車、プラグインハイブリット車、電気自動車等の環境対策車の開発が進んでおり、それらの燃費性能を向上させる目的で、車両に搭載されるインバータが高性能化・小型化されている。
 それに伴ってインバータ内のICやリアクトル等の部品も小型化され、発熱量も増大している。このような発熱する部品に対しては、従来、発熱部品と冷却器との間に熱伝導性シリコーングリース組成物、熱伝導性シリコーンゲル組成物、熱伝導性シリコーンポッティング組成物等の熱伝導性シリコーン組成物を介在させることで、部品の冷却効率を向上させて部品を保護している。
Due to growing awareness of global warming, the automotive industry is developing environmentally friendly vehicles such as hybrid vehicles, plug-in hybrid vehicles, and electric vehicles with the aim of reducing greenhouse gas emissions. In order to improve the fuel efficiency of these vehicles, the inverters installed in these vehicles are becoming more powerful and smaller.
Accordingly, components such as ICs and reactors within inverters have become smaller, resulting in increased heat generation. Conventionally, to protect such heat-generating components, the cooling efficiency of the components has been improved by interposing a thermally conductive silicone composition such as a thermally conductive silicone grease composition, a thermally conductive silicone gel composition, or a thermally conductive silicone potting composition between the heat-generating component and the cooler.

 例えば、特許文献1では、冷却器と発熱部品をあらかじめ組み付けておいて、そこに流動性の高い熱伝導性シリコーンポッティング組成物を流し込み、発熱部品と冷却器の間を熱的に接続する手法が提案されている。
 しかし、特許文献1の手法によって実用的な流動性を維持した場合、1.0W/m・K程度の熱伝導率が限界であり、近年の機器の小型化および部品の微細化に伴うさらなる発熱量の増大に十分に対応ができていなかった。
For example, Patent Document 1 proposes a method in which a cooler and a heat-generating component are assembled in advance, and then a highly fluid, thermally conductive silicone potting composition is poured into the assembly to thermally connect the heat-generating component and the cooler.
However, when practical fluidity is maintained using the method of Patent Document 1, the thermal conductivity is limited to approximately 1.0 W/m·K, which is insufficient to deal with the further increase in heat generation that has accompanied the recent trend toward miniaturization of devices and miniaturization of components.

 この問題を解決する技術として、特許文献2~5では、熱伝導性充填剤を多量に含有させて高熱伝導率化しながらも高流動性を両立させたシリコーンポッティング組成物が提案されている。 As a solution to this problem, Patent Documents 2 to 5 propose silicone potting compositions that contain large amounts of thermally conductive fillers to achieve high thermal conductivity while also maintaining high fluidity.

 しかし、これらの組成物は、高流動性ではあるものの粘度が高く、近年の機器の小型化および部品の微細化に伴い、部品の隅々までポッティングすることが困難な場合があり、十分な放熱特性を付与することができていなかった。
 このため、インバータの性能向上においては、高熱伝導率、高流動性に留まらず、より低粘度の熱伝導性シリコーンポッティング材が切に望まれている。
However, although these compositions have high fluidity, they also have high viscosity, and with the recent trend toward smaller devices and finer components, it can be difficult to pot every corner of the components, and they have not been able to impart sufficient heat dissipation properties.
Therefore, in order to improve the performance of inverters, there is a strong demand for a thermally conductive silicone potting material that not only has high thermal conductivity and high fluidity, but also has a lower viscosity.

特開2011-122000号公報JP 2011-122000 A 特開2016-084378号公報JP 2016-084378 A 特開2019-077843号公報Japanese Patent Application Laid-Open No. 2019-077843 特開2019-077845号公報Japanese Patent Application Laid-Open No. 2019-077845 特開2021-113290号公報Japanese Patent Application Laid-Open No. 2021-113290

 本発明は、上記事情に鑑みなされたもので、熱伝導性充填剤を多量に含んでいるにもかかわらず、低粘度かつ高い流れ性を有し、微細な空間に流れ込むことができ、硬化後は所望の熱伝導率を有する熱伝導性シリコーンポッティング組成物を提供することを目的とする。 The present invention has been made in consideration of the above circumstances, and aims to provide a thermally conductive silicone potting composition that, despite containing a large amount of thermally conductive filler, has low viscosity and high flowability, can flow into minute spaces, and has the desired thermal conductivity after curing.

 本発明者らは、上記目的を達成するために鋭意検討を重ねた結果、所定の官能基量を有するベースポリマーを用いることで、熱伝導性充填剤を多量に含むにもかかわらず、低粘度かつ流れ性が高い熱伝導性シリコーンポッティング組成物が得られることを見出し、本発明を完成した。 As a result of extensive research into achieving the above objectives, the inventors discovered that by using a base polymer with a specified amount of functional groups, it is possible to obtain a thermally conductive silicone potting composition that has low viscosity and high flowability, despite containing a large amount of thermally conductive filler, and thus completed the present invention.

 すなわち、本発明は、
1. (A)分子鎖末端の珪素原子と結合するアルケニル基を1分子あたり平均0.5~1.8個有する直鎖状オルガノポリシロキサン:100質量部
(B)熱伝導性充填剤:500~2,000質量部
(C)1分子中に少なくとも2個のSiH基を有するオルガノハイドロジェンシロキサン:0.1~100質量部、および
(D)ヒドロシリル化反応触媒
を含む熱伝導性シリコーンポッティング組成物、
2. 前記(A)成分の直鎖状オルガノポリシロキサンのB型回転粘度計による25℃における粘度が、10~500mPa・sである1の熱伝導性シリコーンポッティング組成物、
3. (E)下記一般式(1)で表されるシラン化合物および下記一般式(2)で表されるオルガノポリシロキサンを、(A)成分100質量部に対して0.1~30質量部含む1の熱伝導性シリコーンポッティング組成物、
(式中、R1は、互いに独立して一価炭化水素基を表し、nは、0~30の整数を表す。)
4. 前記(B)熱伝導性充填剤が、前記(E)成分で表面処理されている3の熱伝導性シリコーンポッティング組成物、
5. 25℃における粘度が30Pa・s以下である1の熱伝導性シリコーンポッティング組成物、
6. 1~5のいずれかの熱伝導性シリコーンポッティング組成物を硬化してなる硬化物
を提供する。
That is, the present invention is
1. A thermally conductive silicone potting composition comprising: (A) 100 parts by weight of a linear organopolysiloxane having an average of 0.5 to 1.8 alkenyl groups bonded to silicon atoms at the molecular chain terminals per molecule; (B) 500 to 2,000 parts by weight of a thermally conductive filler; (C) 0.1 to 100 parts by weight of an organohydrogensiloxane having at least two SiH groups per molecule; and (D) a hydrosilylation reaction catalyst;
2. The thermally conductive silicone potting composition of 1, wherein the linear organopolysiloxane of component (A) has a viscosity of 10 to 500 mPa·s at 25°C as measured with a Brookfield type rotational viscometer.
3. (E) A thermally conductive silicone potting composition according to item 1, which comprises a silane compound represented by the following general formula (1) and an organopolysiloxane represented by the following general formula (2), in an amount of 0.1 to 30 parts by mass per 100 parts by mass of component (A):
(In the formula, R1 's each independently represent a monovalent hydrocarbon group, and n represents an integer of 0 to 30.)
4. The thermally conductive silicone potting composition of 3, wherein the thermally conductive filler (B) is surface-treated with component (E).
5. The thermally conductive silicone potting composition of 1, having a viscosity at 25°C of 30 Pa·s or less.
6. A cured product is provided by curing the thermally conductive silicone potting composition of any one of 1 to 5.

 本発明の熱伝導性シリコーンポッティング組成物は、硬化前は低粘度かつ高い流れ性を有し、微細な空間に流れ込むことができ、硬化後は所望の熱伝導率が得られ、発熱部品から剥離することなく、部品を保護することができる。
 このため、本発明の組成物は、例えば、トランスのような微細な構造を有する部品冷却器に固定されている場合のポッティングに有効で、このような部材において、硬化後は高い熱伝導率で効率よく部品の熱を冷却器に伝熱することが可能であり、高温環境での使用においても信頼性が高い。
Before curing, the thermally conductive silicone potting composition of the present invention has low viscosity and high flowability, allowing it to flow into minute spaces. After curing, it achieves the desired thermal conductivity and is able to protect heat-generating components without peeling off.
For this reason, the composition of the present invention is effective for potting when it is fixed to a cooler of a component having a fine structure, such as a transformer. In such components, after hardening, the composition has high thermal conductivity and can efficiently transfer heat from the component to the cooler, making it highly reliable even when used in high-temperature environments.

 以下、本発明について具体的に説明する。
 本発明に係る熱伝導性シリコーンポッティング組成物は、室温または加熱下で硬化し、かつ金属、有機樹脂等に接着するものであり、下記(A)~(D)成分を必須成分として含有する。
(A)アルケニル基含有オルガノポリシロキサン
(B)熱伝導性充填剤
(C)オルガノハイドロジェンシロキサン
(D)ヒドロシリル化反応触媒
The present invention will be specifically described below.
The thermally conductive silicone potting composition of the present invention cures at room temperature or under heat and adheres to metals, organic resins, etc., and contains the following essential components (A) to (D):
(A) alkenyl group-containing organopolysiloxane (B) thermally conductive filler (C) organohydrogensiloxane (D) hydrosilylation reaction catalyst

[1](A)成分
 (A)成分は、分子鎖末端の珪素原子と結合するアルケニル基を1分子あたり平均0.5~1.8個有する直鎖状オルガノポリシロキサンである。
 (A)成分のアルケニル基数は、好ましくは1分子あたり平均0.8~1.8個であり、より好ましくは1.0~1.6個である。アルケニル基数が0.5個未満であると、硬化物の強度が低くなる、または硬化しなくなり、1.8個を超えると組成物の流れ性が低下してしまう。
[1] Component (A) Component (A) is a linear organopolysiloxane having an average of 0.5 to 1.8 alkenyl groups per molecule bonded to silicon atoms at the molecular chain terminals.
The average number of alkenyl groups per molecule of component (A) is preferably 0.8 to 1.8, and more preferably 1.0 to 1.6. If the number of alkenyl groups is less than 0.5, the strength of the cured product will be low or the composition will not cure, while if the number exceeds 1.8, the flowability of the composition will be reduced.

 (A)成分の25℃における粘度は、10~500mPa・sが好ましく、10~200mPa・sがより好ましく、10~100mPa・sがより一層好ましい。25℃における粘度が10mPa・s以上であれば、組成物の保存安定性に優れ、500mPa・s以下であれば、組成物の流れ性が良好なものとなる。なお、上記粘度は、B型回転粘度計による測定値である(以下、同じ。)。 The viscosity of component (A) at 25°C is preferably 10 to 500 mPa·s, more preferably 10 to 200 mPa·s, and even more preferably 10 to 100 mPa·s. If the viscosity at 25°C is 10 mPa·s or higher, the composition will have excellent storage stability, and if it is 500 mPa·s or lower, the composition will have good flowability. The above viscosity is measured using a B-type rotational viscometer (the same applies hereinafter).

 珪素原子に結合するアルケニル基は、特に限定されるものではないが、炭素数2~10のアルケニル基が好ましく、炭素数2~8のアルケニル基がより好ましい。
 その具体例としては、ビニル、アリル、1-ブテニル、1-ヘキセニル基等が挙げられ、これらの中でも、合成のし易さやコストの面からビニル基が好ましい。
The alkenyl group bonded to the silicon atom is not particularly limited, but is preferably an alkenyl group having 2 to 10 carbon atoms, and more preferably an alkenyl group having 2 to 8 carbon atoms.
Specific examples thereof include vinyl, allyl, 1-butenyl, and 1-hexenyl groups, and among these, vinyl groups are preferred from the standpoint of ease of synthesis and cost.

 アルケニル基以外の珪素原子に結合する有機基は、特に限定されるものではないが、脂肪族不飽和結合を除く炭素数1~20の一価炭化水素基が好ましく、脂肪族不飽和結合を除く炭素数1~10の一価炭化水素基がより好ましい。
 その具体例としては、メチル、エチル、n-プロピル、n-ブチル、n-ヘキシル、n-ドデシル基等のアルキル基;フェニル基等のアリール基;2-フェニルエチル、2-フェニルプロピル基等のアラルキル基等が挙げられる。
 また、これらの炭化水素基の水素原子の一部または全部は、塩素、フッ素、臭素等のハロゲン原子で置換されていてもよく、その具体例としては、フルオロメチル、2-ブロモエチル、クロロメチル、3,3,3-トリフルオロプロピル基等のハロゲン置換一価炭化水素基などが挙げられる。
 これらの中でも、アルケニル基以外の珪素原子に結合する有機基は、炭素数1~5のアルキル基が好ましく、合成のし易さやコストの面から90モル%以上がメチル基であることがさらに好ましい。
The organic group bonded to the silicon atom other than the alkenyl group is not particularly limited, but is preferably a monovalent hydrocarbon group having 1 to 20 carbon atoms and excluding aliphatic unsaturated bonds, and more preferably a monovalent hydrocarbon group having 1 to 10 carbon atoms and excluding aliphatic unsaturated bonds.
Specific examples thereof include alkyl groups such as methyl, ethyl, n-propyl, n-butyl, n-hexyl, and n-dodecyl; aryl groups such as phenyl; and aralkyl groups such as 2-phenylethyl and 2-phenylpropyl.
In addition, some or all of the hydrogen atoms of these hydrocarbon groups may be substituted with halogen atoms such as chlorine, fluorine, or bromine, and specific examples thereof include halogen-substituted monovalent hydrocarbon groups such as fluoromethyl, 2-bromoethyl, chloromethyl, and 3,3,3-trifluoropropyl groups.
Among these, the organic groups bonded to silicon atoms other than alkenyl groups are preferably alkyl groups having 1 to 5 carbon atoms, and more preferably 90 mol % or more of which are methyl groups from the standpoint of ease of synthesis and cost.

 なお、(A)成分は、オルガノキシシリル基を含まないものが好ましく、オルガノキシ基としては、アルコキシ基、アルコキシアルコキシ基、アルケニルオキシ基、アシロキシ基等が挙げられる。
 アルコキシ基としては、炭素数1~10、好ましくは炭素数1~6、より好ましくは炭素数1~3のものが挙げられ、例えば、メトキシ基、エトキシ基等が挙げられる。
 アルコキシアルコキシ基としては、各アルコキシ基の炭素数がそれぞれ1~6、好ましくは1~3のものが挙げられ、例えば、メトキシエトキシ基、メトキシプロポキシ基等が挙げられる。
 アルケニルオキシ基としては、炭素数2~6のものが挙げられ、例えば、ビニロキシ基、アリロキシ基等が挙げられる。
 アシロキシ基としては、炭素数1~10のものが挙げられ、例えば、アセチルオキシ基、オクタノイルオキシ基等が挙げられる。
Component (A) preferably does not contain an organoxysilyl group, and examples of organoxy groups include alkoxy groups, alkoxyalkoxy groups, alkenyloxy groups, and acyloxy groups.
The alkoxy group includes those having 1 to 10 carbon atoms, preferably 1 to 6 carbon atoms, and more preferably 1 to 3 carbon atoms, such as a methoxy group and an ethoxy group.
The alkoxyalkoxy group includes those in which each alkoxy group has 1 to 6 carbon atoms, preferably 1 to 3 carbon atoms, such as a methoxyethoxy group and a methoxypropoxy group.
The alkenyloxy group may have 2 to 6 carbon atoms, such as a vinyloxy group or an allyloxy group.
The acyloxy group may have 1 to 10 carbon atoms, such as an acetyloxy group or an octanoyloxy group.

[2](B)成分
 (B)成分は、熱伝導性充填剤であり、組成物に熱伝導性を付与する役割を有する。
 熱伝導性充填剤は、従来公知のものを使用でき、その具体例としては、アルミニウム粉末、銅粉末、銀粉末、ニッケル粉末、金粉末、アルミナ粉末、酸化亜鉛粉末、酸化マグネシウム粉末、窒化アルミニウム粉末、水酸化アルミニウム粉末、窒化ホウ素粉末、窒化珪素粉末、ダイヤモンド粉末、カーボン粉末、インジウム、ガリウム等が挙げられる。このような熱伝導性充填剤は、1種単独で用いても、2種以上併用してもよい。
 熱伝導性充填剤は、組成物に十分な熱伝導率を付与するため10W/m・K以上の熱伝導性を有するものが好ましい。
 熱伝導性充填剤の平均粒径は、好ましくは0.1~100μm、より好ましくは0.5~90μmである。このような範囲であれば、熱伝導性充填剤粒子同士の凝集を抑制し、流動性に優れる。なお、本発明における平均粒径は、レーザー光回折法による体積基準の粒度分布におけるメジアン径(D50)である。
 熱伝導性充填剤の形状は、不定形でも球形等の任意の形状でもよい。
[2] Component (B) Component (B) is a thermally conductive filler that serves to impart thermal conductivity to the composition.
As the thermally conductive filler, conventionally known ones can be used, and specific examples thereof include aluminum powder, copper powder, silver powder, nickel powder, gold powder, alumina powder, zinc oxide powder, magnesium oxide powder, aluminum nitride powder, aluminum hydroxide powder, boron nitride powder, silicon nitride powder, diamond powder, carbon powder, indium, gallium, etc. Such thermally conductive fillers may be used alone or in combination of two or more.
The thermally conductive filler preferably has a thermal conductivity of 10 W/m·K or more in order to impart sufficient thermal conductivity to the composition.
The average particle size of the thermally conductive filler is preferably 0.1 to 100 μm, more preferably 0.5 to 90 μm. Within this range, aggregation of the thermally conductive filler particles is suppressed, resulting in excellent fluidity. Note that the average particle size in the present invention is the median diameter (D50) in the volume-based particle size distribution determined by laser diffraction method.
The thermally conductive filler may have any shape, such as an irregular shape or a spherical shape.

 (B)成分の配合量は、(A)成分100質量部に対して500~2,000質量部であり、800~1,500質量部が好ましい。500質量部未満であると、十分な熱伝導性が得られない場合があり、2,000質量部を超えると、組成物が高粘度となったり流動性が低下したりする場合がある。 The amount of component (B) blended is 500 to 2,000 parts by mass, preferably 800 to 1,500 parts by mass, per 100 parts by mass of component (A). If it is less than 500 parts by mass, sufficient thermal conductivity may not be achieved, and if it exceeds 2,000 parts by mass, the composition may become highly viscous or its flowability may decrease.

[3](C)成分
 (C)成分は、1分子中に少なくとも2個、好ましくは3個以上、より好ましくは3~100個の珪素原子に結合した水素原子(SiH基)を有するオルガノハイドロジェンシロキサンである。
 (C)成分のオルガノハイドロジェンシロキサンの分子構造は、直鎖状、分岐状および網状のいずれでもよく、複数のオルガノハイドロジェンシロキサン鎖が連結基によって結合していてもよい。珪素原子結合水素原子は、分子鎖末端部分(両末端または片末端)および分子鎖非末端部分のどちらか一方にのみ存在していてもよいし、その両方に存在していてもよい。
[3] Component (C) Component (C) is an organohydrogensiloxane having at least two, preferably three or more, and more preferably 3 to 100 hydrogen atoms bonded to silicon atoms (SiH groups) per molecule.
The molecular structure of the organohydrogensiloxane of component (C) may be linear, branched, or network, and multiple organohydrogensiloxane chains may be linked by linking groups. Silicon-bonded hydrogen atoms may be present either at the molecular chain terminals (both terminals or one terminal) or non-terminal portions, or may be present in both locations.

 (C)成分の珪素原子に結合する水素原子以外の有機基としては、アルケニル基を除く炭素数1~10の一価炭化水素基が挙げられ、その具体例としては、メチル、エチル、プロピル、ブチル基等のアルキル基;フェニル、トリル基等のアリール基;フェニルエチル、フェニルプロピル基等のアラルキル基;これらの基の水素原子の一部または全部が、塩素、フッ素、臭素等のハロゲン原子で置換された、γ-クロロプロピル、3,3,3-トリフルオロプロピル基等のハロゲン化アルキル基などが挙げられる。これらの中でも、炭素数1~6のアルキル基が好ましく、炭素数1~3のアルキル基がより好ましくい。特に、合成のし易さ、コストの面から水素原子以外の有機基のうち90モル%以上がメチル基であることがより好ましい。 The organic groups other than hydrogen atoms bonded to the silicon atoms in component (C) include monovalent hydrocarbon groups having 1 to 10 carbon atoms, excluding alkenyl groups. Specific examples include alkyl groups such as methyl, ethyl, propyl, and butyl; aryl groups such as phenyl and tolyl; aralkyl groups such as phenylethyl and phenylpropyl; and halogenated alkyl groups in which some or all of the hydrogen atoms in these groups have been replaced with halogen atoms such as chlorine, fluorine, or bromine, such as gamma-chloropropyl and 3,3,3-trifluoropropyl. Among these, alkyl groups having 1 to 6 carbon atoms are preferred, and alkyl groups having 1 to 3 carbon atoms are more preferred. In particular, from the standpoint of ease of synthesis and cost, it is more preferable that 90 mol % or more of the organic groups other than hydrogen atoms be methyl groups.

 (C)成分の25℃における動粘度は、特に限定されるものではないが、1~10,000mm2/sが好ましく、1~1,000mm2/sがより好ましい。なお、上記動粘度は、キャノン・フェンスケ粘度計により測定した25℃における測定値である(以下、同様。)。(C)成分は、粘度の違う数種類を併用してもよい。 The kinematic viscosity of component (C) at 25°C is not particularly limited, but is preferably 1 to 10,000 mm2 /s, and more preferably 1 to 1,000 mm2 /s. The kinematic viscosity is measured at 25°C using a Cannon-Fenske viscometer (the same applies hereinafter). Several components with different viscosities may be used in combination as component (C).

 (C)成分としては、下記一般式(3-1)で示される環状オルガノハイドロジェンシロキサンおよび/または下記一般式(3-2)で示される環状オルガノハイドロジェンシロキサンを含む化合物を使用してもよい。これらの化合物は、(A)成分と架橋する役割と接着性を付与する役割を持つ。 Component (C) may be a compound containing a cyclic organohydrogensiloxane represented by the following general formula (3-1) and/or a cyclic organohydrogensiloxane represented by the following general formula (3-2). These compounds serve to crosslink with component (A) and to impart adhesive properties.

 上記各式において、R2は、互いに独立して炭素数1~6、好ましくは炭素数1~3のアルキル基であり、その具体例としては、メチル、エチル、n-プロピル、n-ブチル、n-ペンチル、n-ヘキシル基等が挙げられる。これらの中でも、合成のしやすさや、コストの面から、R2の90モル%以上がメチル基であることが好ましい。 In each of the above formulas, R2 's are each independently an alkyl group having 1 to 6 carbon atoms, preferably 1 to 3 carbon atoms, and specific examples thereof include methyl, ethyl, n-propyl, n-butyl, n-pentyl, n-hexyl, etc. Among these, from the standpoint of ease of synthesis and cost, it is preferable that 90 mol % or more of R2 's are methyl groups.

 R3は、互いに独立して、炭素原子を介して、または炭素原子と酸素原子を介して珪素原子に結合している、エポキシ基またはトリアルコキシシリル基である。
 炭素原子を介して、または炭素原子と酸素原子を介して珪素原子に結合しているエポキシ基としては、3-グリシドキシプロピル、3-グリシドキシエチル、3,4-エポキシシクロヘキシルエチル基等が挙げられる。
 炭素原子を介して、または炭素原子と酸素原子を介して珪素原子に結合しているトリアルコキシシリル基としては、トリメトキシシリルプロピル、トリメトキシシリルプロピルメチル、トリメトキシシリルエチル、トリエトキシシリルプロピル、トリエトキシシリルプロピルメチル、トリエトキシシリルエチル基等が挙げられる。
R3 's are each independently an epoxy group or a trialkoxysilyl group bonded to the silicon atom via a carbon atom or via a carbon atom and an oxygen atom.
Examples of epoxy groups bonded to a silicon atom via a carbon atom or via a carbon atom and an oxygen atom include 3-glycidoxypropyl, 3-glycidoxyethyl, and 3,4-epoxycyclohexylethyl groups.
Examples of trialkoxysilyl groups bonded to a silicon atom via a carbon atom or via a carbon atom and an oxygen atom include trimethoxysilylpropyl, trimethoxysilylpropylmethyl, trimethoxysilylethyl, triethoxysilylpropyl, triethoxysilylpropylmethyl, and triethoxysilylethyl groups.

 式(3-1)において、iは、2以上の整数であり、jは、1以上の整数であり、i+jは、4~12の整数、好ましくは4~8の整数、より好ましくは4~6の整数、より一層好ましくは4である。
 式(3-1)中のシロキサン単位の配列順は任意であってよく、ランダム、ブロック、交互のいずれであってもよい。
 式(3-2)において、Xは、エーテル結合を含んでいてもよい二価炭化水素基であり、好ましくは下記式(4)で表されるビスフェノールA残基を含む基である。
 kは、互いに独立して3~11の整数、好ましくは3~7の整数、より好ましくは3~5の整数、より一層好ましくは3である。
In formula (3-1), i is an integer of 2 or more, j is an integer of 1 or more, and i+j is an integer of 4 to 12, preferably an integer of 4 to 8, more preferably an integer of 4 to 6, and even more preferably 4.
The siloxane units in formula (3-1) may be arranged in any order, and may be arranged randomly, in blocks, or alternately.
In formula (3-2), X is a divalent hydrocarbon group which may contain an ether bond, and is preferably a group containing a bisphenol A residue represented by the following formula (4).
k's are each independently an integer of 3 to 11, preferably an integer of 3 to 7, more preferably an integer of 3 to 5, and even more preferably 3.

(破線は、珪素原子との結合手を表す。) (The dashed lines represent bonds to the silicon atom.)

 (C)成分の具体例としては、下記式で示されるオルガノハイドロジェンシロキサンが挙げられるが、これらに限定されるものではない。なお、(C)成分は、1種単独で使用しても、2種類以上を併用してもよい。 Specific examples of component (C) include, but are not limited to, organohydrogensiloxanes represented by the following formula. Component (C) may be used alone or in combination of two or more types.

 (C)成分の配合量は、硬化性および硬化物の機械特性の点から、(A)成分100質量部に対して、0.1~100質量部であり、1~20質量部がより好ましい。0.1質量部未満であると硬化が不十分なものとなり、100質量部を超えると硬化物の機械特性が低下する場合がある。 In terms of curability and the mechanical properties of the cured product, the blending amount of component (C) is 0.1 to 100 parts by mass, and more preferably 1 to 20 parts by mass, per 100 parts by mass of component (A). Less than 0.1 parts by mass will result in insufficient curing, while more than 100 parts by mass may result in reduced mechanical properties of the cured product.

[4](D)成分
 (D)成分は、ヒドロシリル化反応触媒である。ヒドロシリル化反応触媒は、(A)成分のアルケニル基と(C)成分のSi-H基との間の付加反応を促進するものであればよく、従来公知のものを使用することができる。具体的には、白金族金属系触媒を用いることが好ましく、中でも、白金および白金化合物から選ばれる触媒が好ましい。
[4] Component (D) Component (D) is a hydrosilylation catalyst. Any hydrosilylation catalyst that promotes the addition reaction between the alkenyl group of component (A) and the Si—H group of component (C) can be used, and any conventionally known catalyst can be used. Specifically, platinum group metal catalysts are preferred, and among these, catalysts selected from platinum and platinum compounds are preferred.

 触媒の具体例としては、白金(白金黒を含む。);ロジウム、パラジウム等の白金族金属単体;H2PtCl4・nH2O、H2PtCl6・H2O、NaHPtCl6・nH2O、KHPtCl6・nH2O、Na2PtCl6・nH2O、K2PtCl4・nH2O、PtCl4・nH2O、PtCl2、Na2HPtCl4・nH2O(但し、式中のnは0~6の整数であり、好ましくは0または6である。)等の塩化白金類;塩化白金酸;塩化白金酸塩;アルコール変性塩化白金酸;塩化白金酸とオレフィンとの錯体;白金黒やパラジウム等の白金族金属をアルミナ、シリカ、カーボン等の担体に担持させたもの;ロジウム-オレフィン錯体;クロロトリス(トリフェニルフォスフィン)ロジウム(ウィルキンソン触媒);塩化白金、塩化白金酸または塩化白金酸塩とビニル基含有シロキサンとの錯体などが挙げられ、これらは、1種単独で使用しても、2種以上を組み合わせて使用してもよい。 Specific examples of catalysts include platinum (including platinum black); platinum group metals such as rhodium and palladium ; H2PtCl4.nH2O , H2PtCl6.H2O , NaHPtCl6.nH2O , KHPtCl6.nH2O , Na2PtCl6.nH2O , K2PtCl4.nH2O , PtCl4.nH2O , PtCl2 , Na2HPtCl4.nH2O , chloroplatinic acid; chloroplatinic acid salts; alcohol-modified chloroplatinic acid; complexes of chloroplatinic acid with olefins; platinum group metals such as platinum black or palladium supported on a support such as alumina, silica or carbon; rhodium-olefin complexes; chlorotris(triphenylphosphine)rhodium (Wilkinson's catalyst); complexes of platinum chloride, chloroplatinic acid or chloroplatinic acid salts with vinyl group-containing siloxanes, and the like, may be used alone or in combination of two or more.

 (D)成分の配合量は、触媒としての有効量であり、(A)成分と(C)成分との反応を進行できる量であればよく、希望する硬化速度に応じて適宜調整すればよい。
 特に、(A)成分の質量に対して、白金族金属原子に換算した質量基準で0.1~7,000ppmとなる量が好ましく、1~6,000ppmとなる量がより好ましい。(E)成分の配合量が上記範囲であると、より効率のよい触媒作用が期待できる。
The amount of component (D) to be added should be an effective amount as a catalyst, an amount that can promote the reaction between components (A) and (C), and can be adjusted appropriately depending on the desired curing rate.
In particular, an amount equivalent to 0.1 to 7,000 ppm, and more preferably 1 to 6,000 ppm, by mass, calculated as platinum group metal atoms relative to the mass of component (A), is preferred. When the blending amount of component (E) is within the above range, more efficient catalytic action can be expected.

[5](E)成分
 本発明の熱伝導性シリコーンポッティング組成物は、(E)成分として、下記一般式(1)で表されるシラン化合物および下記一般式(2)で表されるオルガノポリシロキサンを含むことが好ましい。本成分は熱伝導性充填剤表面に作用し、流動性を向上させる役割を有する。
[5] Component (E) The thermally conductive silicone potting composition of the present invention preferably contains, as component (E), a silane compound represented by the following general formula (1) and an organopolysiloxane represented by the following general formula (2). This component acts on the surface of the thermally conductive filler and has the role of improving fluidity.

(式中、R1は、互いに独立して一価炭化水素基を表し、nは、0~30の整数を表す。) (In the formula, R1 's each independently represent a monovalent hydrocarbon group, and n represents an integer of 0 to 30.)

 R1の一価炭化水素基としては、特に限定されるものではないが、炭素数1~10の一価炭化水素基が好ましく、炭素数1~6の一価炭化水素基がより好ましく、炭素数1~3の一価炭化水素基がより一層好ましい。
 一価炭化水素基の具体例としては、アルキル、アルケニル、アリール、アラルキル基や、これら一価炭化水素基の水素原子の一部または全部が塩素、フッ素、臭素等のハロゲン原子で置換されたハロゲン化アルキル基等のハロゲン化一価炭化水素基などが挙げられる。
 アルキル基は、直鎖状、分岐鎖状および環状のいずれでもよく、その具体例としては、メチル、エチル、n-プロピル、n-ヘキシル、n-オクチル基等の直鎖状アルキル基;イソプロピル、イソブチル、tert-ブチル、2-エチルヘキシル基等の分岐鎖状アルキル基;シクロペンチル、シクロヘキシル基等の環状アルキル基が挙げられる。
 アルケニル基の具体例としては、ビニル、アリル、1-ブテニル、1-ヘキセニル基等が挙げられる。
 アリール基の具体例としては、フェニル、トリル基等が挙げられる。
 アラルキル基の具体例としては、2-フェニルエチル、2-メチル-2-フェニルエチル基等が挙げられる。
 ハロゲン化アルキル基の具体例としては、3,3,3-トリフルオロプロピル、2-(ノナフルオロブチル)エチル、2-(ヘプタデカフルオロオクチル)エチル基等が挙げられる。
 これらの中でも、R1としては、メチル基、フェニル基、ビニル基が好ましく、メチル基がより好ましい。
The monovalent hydrocarbon group for R1 is not particularly limited, but is preferably a monovalent hydrocarbon group having 1 to 10 carbon atoms, more preferably a monovalent hydrocarbon group having 1 to 6 carbon atoms, and even more preferably a monovalent hydrocarbon group having 1 to 3 carbon atoms.
Specific examples of the monovalent hydrocarbon group include alkyl, alkenyl, aryl, and aralkyl groups, as well as halogenated monovalent hydrocarbon groups such as halogenated alkyl groups in which some or all of the hydrogen atoms of these monovalent hydrocarbon groups have been substituted with halogen atoms such as chlorine, fluorine, or bromine.
The alkyl group may be linear, branched, or cyclic, and specific examples thereof include linear alkyl groups such as methyl, ethyl, n-propyl, n-hexyl, and n-octyl groups; branched alkyl groups such as isopropyl, isobutyl, tert-butyl, and 2-ethylhexyl groups; and cyclic alkyl groups such as cyclopentyl and cyclohexyl groups.
Specific examples of the alkenyl group include vinyl, allyl, 1-butenyl, and 1-hexenyl groups.
Specific examples of the aryl group include phenyl and tolyl groups.
Specific examples of the aralkyl group include 2-phenylethyl and 2-methyl-2-phenylethyl groups.
Specific examples of halogenated alkyl groups include 3,3,3-trifluoropropyl, 2-(nonafluorobutyl)ethyl, and 2-(heptadecafluorooctyl)ethyl groups.
Among these, R 1 is preferably a methyl group, a phenyl group, or a vinyl group, and more preferably a methyl group.

 nは、0~20の整数が好ましく、より好ましくは1~10の整数である。 n is preferably an integer from 0 to 20, and more preferably an integer from 1 to 10.

 (E)成分を使用する場合の配合量は、(A)成分100質量部に対して、0.1~30質量部であり、0.1~20質量部がより好ましい。このような範囲であれば、高流動性の組成物が得られやすい。
 なお、(E)成分は、1種単独で使用しても、2種類以上を併用してもよい。
When component (E) is used, the blending amount is 0.1 to 30 parts by mass, and more preferably 0.1 to 20 parts by mass, per 100 parts by mass of component (A).Within this range, a highly fluid composition is likely to be obtained.
The component (E) may be used alone or in combination of two or more types.

[7]その他の成分
 本発明の熱伝導性シリコーンポッティング組成物は、上記(A)~(E)成分以外に、公知の添加剤を本発明の目的を損なわない範囲で添加してもよい。
 このような添加剤としては、例えば、室温での組成物の硬化反応を抑え、シェルフライフ、ポットライフを延長させる目的で反応制御剤が挙げられる。
 反応制御剤としては、(D)成分の触媒活性を抑制できるものであればよく、従来公知の反応制御剤を使用することができる。その具体例としては、1-エチニル-1-シクロヘキサノール、3-ブチン-1-オール等のアセチレンアルコール化合物;トリアリルイソシアヌレート等の含窒素化合物;有機リン化合物;オキシム化合物;有機クロロ化合物などが挙げられ、これらは1種単独で用いても、2種以上を併用してもよい。これらの中でも、1-エチニル-1-シクロヘキサノール、トリアリルイソシアヌレートが好ましい。
[7] Other Components In addition to the components (A) through (E) above, the thermally conductive silicone potting composition of the present invention may contain known additives, provided that the addition does not impair the object of the present invention.
Such additives include, for example, reaction inhibitors for the purpose of suppressing the curing reaction of the composition at room temperature and extending the shelf life and pot life.
The reaction inhibitor may be any known reaction inhibitor that can suppress the catalytic activity of component (D). Specific examples include acetylene alcohol compounds such as 1-ethynyl-1-cyclohexanol and 3-butyn-1-ol; nitrogen-containing compounds such as triallyl isocyanurate; organic phosphorus compounds; oxime compounds; and organic chloro compounds. These may be used alone or in combination of two or more. Of these, 1-ethynyl-1-cyclohexanol and triallyl isocyanurate are preferred.

 反応制御剤を使用する場合の配合量は、組成物のシェルフライフおよびポットライフと、組成物の硬化性とを考慮すると、(A)成分100質量部に対して、好ましくは0.01~5質量部であり、より好ましくは0.05~1質量部である。
 なお、反応制御剤は、組成物への分散性を良くするためにトルエン、キシレン、イソプロピルアルコール等の有機溶剤で希釈して使用してもよい。
When a reaction inhibitor is used, the amount added is preferably 0.01 to 5 parts by mass, and more preferably 0.05 to 1 part by mass, per 100 parts by mass of component (A), taking into consideration the shelf life and pot life of the composition, as well as the curability of the composition.
The reaction inhibitor may be diluted with an organic solvent such as toluene, xylene, or isopropyl alcohol to improve dispersibility in the composition.

 その他、本発明の熱伝導性シリコーンポッティング組成物には、ヒンダードフェノール系酸化防止剤、炭酸カルシウム等の補強性、非補強性充填材、顔料、染料等の着色剤を添加することもできる。 In addition, the thermally conductive silicone potting composition of the present invention can also contain hindered phenol-based antioxidants, reinforcing and non-reinforcing fillers such as calcium carbonate, and colorants such as pigments and dyes.

 本発明の熱伝導性シリコーンポッティング組成物は、上記(A)~(D)成分、および必要に応じて(E)成分およびその他の成分を、ゲートミキサー、ニーダー、プラネタリミキサー等を用いた公知の方法で混合して調製することができる。 The thermally conductive silicone potting composition of the present invention can be prepared by mixing the above-mentioned components (A) to (D), and optionally component (E) and other components, using a known method such as a gate mixer, kneader, or planetary mixer.

 本発明の熱伝導性シリコーンポッティング組成物は、(A)、(B)および(D)成分ならびに必要に応じて(E)成分およびその他の成分からなる第一剤と、(A)、(B)および(C)成分ならびに必要に応じて(E)成分およびその他の成分からなる第二剤を別々に調製し、使用前に第一剤と第二剤を混合する二剤型の組成物としてもよい。なお、第一剤および第二剤で共通に使用される成分があってもよい。組成物をこのような二剤型とすることにより、さらに保存安定性を確保できる。 The thermally conductive silicone potting composition of the present invention may be a two-part composition in which a first part consisting of components (A), (B), and (D), and optionally component (E) and other components, and a second part consisting of components (A), (B), and (C), and optionally component (E) and other components, are prepared separately, and the first and second parts are mixed together before use. There may also be components that are shared by both the first and second parts. By forming the composition into such a two-part composition, storage stability can be further ensured.

 本発明の熱伝導性シリコーンポッティング組成物の25℃での粘度は、熱伝導性充填材の分散性、および作業性の観点から、好ましくは1~30Pa・s、より好ましくは1~20Pa・sである。なお、粘度は、B型回転粘度計を用いて20rpm(ずり速度近似値4.2s-1)で測定した値である。
 また、熱伝導性シリコーンポッティング組成物は、混合後硬化前のチキソトロピックインデックス値が、好ましくは1.3以下である。混合後硬化前のチキソトロピックインデックスが1.3を超えると流動性が乏しくなることがあり、微細構造を有する発熱部品に対して流れ込むことが難しくなる。ここで、チキソトロピックインデックスとは、B型粘度計を用いて、10rpm(ずり速度近似値2.1s-1)で測定した粘度値を20rpm(ずり速度近似値4.2s-1)で測定した粘度値で割った値である。
The viscosity of the thermally conductive silicone potting composition of the present invention at 25°C is preferably 1 to 30 Pa·s, and more preferably 1 to 20 Pa·s, from the standpoints of dispersibility of the thermally conductive filler and workability. The viscosity is measured using a Brookfield type rotational viscometer at 20 rpm (approximate shear rate of 4.2 s -1 ).
Furthermore, the thermally conductive silicone potting composition preferably has a thixotropic index value of 1.3 or less after mixing and before curing. If the thixotropic index exceeds 1.3 after mixing and before curing, the composition may have poor fluidity, making it difficult for the composition to flow into heat-generating components with fine structures. Here, the thixotropic index is the viscosity measured at 10 rpm (approximate shear rate of 2.1 s -1 ) using a Brookfield viscometer divided by the viscosity measured at 20 rpm (approximate shear rate of 4.2 s -1 ).

 本発明の熱伝導性シリコーンポッティング組成物は、後の実施例でその測定法を詳述する23℃での流れ性が100mm以上であることが好ましい。トランスのような微細構造を有する部品が、冷却器に取り付けてあるところに対して、シリコーンポッティング組成物を流し込む場合、上記流れ性は120mm以上が好ましい。流れ性は、高ければ高いほど好ましいが、測定限界がアルミニウム板の長さによるため、ここでは測定上限は400mmとなる。 The thermally conductive silicone potting composition of the present invention preferably has a flowability of 100 mm or more at 23°C, the measurement method of which will be described in detail in the Examples below. When pouring the silicone potting composition into a cooler where a component with a fine structure, such as a transformer, is attached, the flowability is preferably 120 mm or more. The higher the flowability, the better, but because the measurement limit depends on the length of the aluminum plate, the upper measurement limit here is 400 mm.

 本発明の熱伝導性シリコーンポッティング組成物の硬化条件は、特に限定されるものではなく、従来公知のシリコーンゲルと同様の条件とすることができる。
 なお、熱伝導性シリコーンポッティング組成物は、流し込んだ後、発熱部品からの熱によって硬化させても、積極的に加熱硬化させてもよい。加熱硬化の条件は、好ましくは60~180℃、より好ましくは80~150℃で、好ましくは0.1~3時間、より好ましくは0.5~2時間である。
The curing conditions for the thermally conductive silicone potting composition of the present invention are not particularly limited, and can be the same as those for conventionally known silicone gels.
After pouring, the thermally conductive silicone potting composition may be cured by the heat from the heat-generating component, or may be actively heated and cured. The heat-curing conditions are preferably 60 to 180°C, more preferably 80 to 150°C, and preferably 0.1 to 3 hours, more preferably 0.5 to 2 hours.

 本発明の熱伝導性シリコーンポッティング組成物の硬化物の環境温度25℃における熱伝導率は、1.5W/m・K以上が好ましく、2.0W/m・K以上がより好ましい。上限は特に制限されないが、通常10.0W/m・K以下である。
 硬化物の硬度は、タイプAデュロメータによる測定値で10以上が好ましく、上限は特に制限されないが、通常80以下である。
The thermal conductivity of the cured product of the thermally conductive silicone potting composition of the present invention at an ambient temperature of 25° C. is preferably 1.5 W/m K or more, and more preferably 2.0 W/m K or more. There is no particular upper limit, but it is usually 10.0 W/m K or less.
The hardness of the cured product is preferably 10 or more as measured by a type A durometer, and although there is no particular upper limit, it is usually 80 or less.

 以下、実施例および比較例を示して本発明をより詳しく説明するが、本発明はこれらの実施例に限定されるものではない。なお、下記例において、重量平均分子量は、ゲルパーミエーションクロマトグラフィー(GPC)により測定したポリスチレン換算値を示す。
 実施例および比較例において使用した各成分を以下に示す。
The present invention will be described in more detail below with reference to examples and comparative examples, but the present invention is not limited to these examples. In the following examples, the weight average molecular weight is a polystyrene-equivalent value measured by gel permeation chromatography (GPC).
The components used in the examples and comparative examples are shown below.

(A)成分
A-1:末端のうち80%がジメチルビニルシリル基で封鎖され、20%がトリメチルシリル基で封鎖された25℃における粘度が50mPa・sであるジメチルポリシロキサン
A-2:両末端がジメチルビニルシリル基で封鎖され、25℃における粘度が60mPa・sであるジメチルポリシロキサン
(A) Component A-1: A dimethylpolysiloxane in which 80% of the terminals are blocked with dimethylvinylsilyl groups and 20% are blocked with trimethylsilyl groups, and which has a viscosity of 50 mPa·s at 25°C. A-2: A dimethylpolysiloxane in which both terminals are blocked with dimethylvinylsilyl groups, and which has a viscosity of 60 mPa·s at 25°C.

(B)成分
B-1:平均粒径1.0μmのアルミナ粉末
B-2:平均粒径10μmのアルミナ粉末
B-3:平均粒径40μmのアルミナ粉末
B-4:平均粒径80μmのアルミナ粉末
(B) Component B-1: Alumina powder with an average particle size of 1.0 μm B-2: Alumina powder with an average particle size of 10 μm B-3: Alumina powder with an average particle size of 40 μm B-4: Alumina powder with an average particle size of 80 μm

(C)成分
C-1:下記式で表されるオルガノハイドロジェンシロキサン
(C) Component C-1: organohydrogensiloxane represented by the following formula:

C-2:下記式で示される平均構造を有するオルガノハイドロジェンシロキサン
(式中、括弧内のシロキサン単位の配列順は不定である。)
C-2: Organohydrogensiloxane having an average structure represented by the following formula:
(In the formula, the order of the siloxane units in parentheses is not specified.)

C-3:下記式で表される環状オルガノハイドロジェンシロキサン
C-3: Cyclic organohydrogensiloxane represented by the following formula:

C-4:下記式で表される環状オルガノハイドロジェンシロキサン誘導体
C-4: Cyclic organohydrogensiloxane derivative represented by the following formula:

(D)成分
D-1:白金-ジビニルテトラメチルジシロキサン錯体のジメチルポリシロキサン溶液(両末端がジメチルビニルシリル基で封鎖され、25℃における粘度が0.6Pa・sであるジメチルポリシロキサンに溶解したもの。白金濃度1質量%)
(D) Component D-1: Dimethylpolysiloxane solution of platinum-divinyltetramethyldisiloxane complex (both ends of which are capped with dimethylvinylsilyl groups, dissolved in dimethylpolysiloxane having a viscosity of 0.6 Pa·s at 25°C; platinum concentration: 1% by mass)

(E)成分
E-1:トリメチルシラノール
(E) Component E-1: Trimethylsilanol

E-2:下記式で表されるオルガノポリシロキサン
E-2: Organopolysiloxane represented by the following formula

(F)その他の成分
F-1:1-エチニル-1-シクロヘキサノール
F-2:トリアリルイソシアヌレート
(F) Other Components F-1: 1-ethynyl-1-cyclohexanol F-2: triallyl isocyanurate

[実施例1~3、比較例1~3]
 成分(A)~(E)およびその他の成分を以下のように混合してシリコーンポッティング組成物を得た。
 5Lゲートミキサー(井上製作所(株)製、商品名;5Lプラネタリミキサー)に、表1で示す配合量で(A)成分、(B)成分、(E)成分を加え、25℃で1時間混合後、150℃で2時間減圧混合して混合物(実施例2については、(B)成分が(E)成分で表面処理された混合物)を得た。混合物を冷却した後に、(D)成分を加えて25℃で30分混合した。次に、反応制御剤(F-1)および(F-2)成分を加えて25℃で30分混合した。最後に、(C)成分を加えて室温にて30分混合した。
[Examples 1 to 3, Comparative Examples 1 to 3]
Components (A) through (E) and other components were mixed as follows to obtain a silicone potting composition.
Component (A), component (B), and component (E) were added to a 5L gate mixer (manufactured by Inoue Seisakusho Co., Ltd., product name: 5L Planetary Mixer) in the amounts shown in Table 1, and mixed at 25°C for 1 hour, followed by mixing under reduced pressure at 150°C for 2 hours to obtain a mixture (for Example 2, a mixture in which component (B) was surface-treated with component (E)). After cooling the mixture, component (D) was added and the mixture was mixed at 25°C for 30 minutes. Next, reaction inhibitors (F-1) and (F-2) were added and the mixture was mixed at 25°C for 30 minutes. Finally, component (C) was added and the mixture was mixed at room temperature for 30 minutes.

 得られた組成物について以下の各物性を測定した。結果を表2に示す。
[1]粘度
 熱伝導性シリコーンポッティング組成物の25℃における粘度を、B型粘度計(東機産業製 TVB-10H)を用いて、ローターNo.7にて20rpm(ずり速度近似値4.2s-1)にて測定した。
[2]流れ性
 熱伝導性シリコーンポッティング組成物を0.60mL量り取り、アルミニウム板(JIS H 4000:2022、幅25×長さ400×厚み0.5mm)に垂らした。垂らした後、すぐにアルミニウム板を28°に傾斜させ、23℃(±2℃)の雰囲気下で1時間放置した。放置した後の熱伝導性シリコーンポッティング組成物の長さを流れた端から端まで測定した。
[3]チキソトロピックインデックス
 熱伝導性シリコーンポッティング組成物の25℃における粘度について、B型粘度計(東機産業製 TVB-10H)を用いて、ローターNo.7にて10rpm(ずり速度近似値2.1s-1)で測定した粘度値を20rpm(ずり速度近似値4.2s-1)で測定した粘度値で割って算出した。
[4]熱伝導率
 熱伝導性シリコーンポッティング組成物を2.0mmの厚さで120℃にて10分プレス硬化し、さらに120℃のオーブン中で50分間加熱した。得られた硬化物の熱伝導率を、ISO 22007-2に従って、ホットディスク法熱物性測定装置TPA-501(京都電子工業(株)製)を用い、環境温度25℃で測定した。
[5]密度
 熱伝導性シリコーンポッティング組成物を2.0mmの厚さで120℃にて10分プレス硬化し、さらに120℃のオーブン中で50分間加熱した。得られたシリコーンシートの密度をJIS K 6251:2017に従って測定した。
[6]切断時伸び、引張強さ
 熱伝導性シリコーンポッティング組成物を2.0mmの厚さで120℃にて10分プレス硬化し、さらに120℃のオーブン中で50分間加熱した。得られたシリコーンシートの切断時伸びと引張り強さをJIS K 6251:2017に従って測定した。
[7]引張せん断接着強さ
 厚み1.0mmのアルミニウム板(JIS H 4000:2022)の間に、熱伝導性シリコーンポッティング組成物を、厚さ2.0mm、接着面積25mm×10mmとなるように挟み込んだ状態で、120℃で1時間加熱し、シリコーンポッティング組成物を硬化させ、接着試験片を作製した。得られた試験片の引張せん断接着強さをJIS K 6850:1999に従って測定した。
[8]硬度
 熱伝導性シリコーンポッティング組成物を2.0mmの厚さで120℃にて10分プレス硬化し、さらに120℃のオーブン中で50分間加熱した。得られたシリコーンシートを3枚重ねて、JIS K 6253:2012に規定されるタイプAデュロメータにより硬さを測定した。
The resulting composition was measured for the following physical properties, and the results are shown in Table 2.
[1] Viscosity The viscosity of the thermally conductive silicone potting composition at 25°C was measured using a Brookfield viscometer (TVB-10H, manufactured by Toki Sangyo Co., Ltd.) with a No. 7 rotor at 20 rpm (approximate shear rate of 4.2 s -1 ).
[2] Flowability 0.60 mL of the thermally conductive silicone potting composition was weighed out and dropped onto an aluminum plate (JIS H 4000:2022, width 25 mm x length 400 mm x thickness 0.5 mm). Immediately after dropping, the aluminum plate was tilted at an angle of 28° and left to stand in an atmosphere of 23°C (±2°C) for 1 hour. After leaving the plate, the length of the thermally conductive silicone potting composition was measured from one end to the other of the flow.
[3] Thixotropic Index The viscosity of the thermally conductive silicone potting composition at 25°C was calculated by dividing the viscosity measured at 10 rpm (approximate shear rate of 2.1 s ) using a Brookfield viscometer (TVB-10H, manufactured by Toki Sangyo Co., Ltd.) with a No. 7 rotor by the viscosity measured at 20 rpm (approximate shear rate of 4.2 s ).
[4] Thermal Conductivity The thermally conductive silicone potting composition was press-cured to a thickness of 2.0 mm at 120°C for 10 minutes, and then heated in an oven at 120°C for 50 minutes. The thermal conductivity of the resulting cured product was measured in accordance with ISO 22007-2 using a hot disc thermophysical property analyzer TPA-501 (manufactured by Kyoto Electronics Manufacturing Co., Ltd.) at an ambient temperature of 25°C.
[5] Density The thermally conductive silicone potting composition was press-cured to a thickness of 2.0 mm at 120°C for 10 minutes, and then heated in an oven at 120°C for 50 minutes. The density of the resulting silicone sheet was measured in accordance with JIS K 6251:2017.
[6] Elongation at break and tensile strength A thermally conductive silicone potting composition was press-cured to a thickness of 2.0 mm at 120°C for 10 minutes, and then heated in an oven at 120°C for 50 minutes. The elongation at break and tensile strength of the resulting silicone sheet were measured in accordance with JIS K 6251:2017.
[7] Tensile shear adhesive strength A thermally conductive silicone potting composition was sandwiched between 1.0 mm thick aluminum plates (JIS H 4000:2022) to a thickness of 2.0 mm and an adhesive area of 25 mm x 10 mm. The composition was then heated at 120°C for 1 hour to cure the silicone potting composition, producing an adhesive test piece. The tensile shear adhesive strength of the resulting test piece was measured in accordance with JIS K 6850:1999.
[8] Hardness The thermally conductive silicone potting composition was press-cured to a thickness of 2.0 mm at 120°C for 10 minutes, and then heated in an oven at 120°C for 50 minutes. Three of the resulting silicone sheets were stacked, and the hardness was measured using a Type A durometer as specified in JIS K 6253:2012.

 表2に示されるように、実施例1および2の熱伝導性シリコーンポッティング組成物は、低粘度でかつ高い流れ性を示し、硬化後の熱伝導性に優れていることがわかる。
 一方で、(A)成分を両末端がジメチルビニルシリル基で封鎖された直鎖状オルガノポリシロキサンに変更した比較例1および2の熱伝導性シリコーンポッティング組成物は、粘度が高く、流れ性に劣ることがわかる。
As shown in Table 2, the thermally conductive silicone potting compositions of Examples 1 and 2 exhibit low viscosity and high flowability, and are known to have excellent thermal conductivity after curing.
On the other hand, the thermally conductive silicone potting compositions of Comparative Examples 1 and 2, in which component (A) was changed to a linear organopolysiloxane terminated at both ends with dimethylvinylsilyl groups, were found to have high viscosity and poor flowability.

Claims (6)

 (A)分子鎖末端の珪素原子と結合するアルケニル基を1分子あたり平均0.5~1.8個有する直鎖状オルガノポリシロキサン:100質量部
(B)熱伝導性充填剤:500~2,000質量部
(C)1分子中に少なくとも2個のSiH基を有するオルガノハイドロジェンシロキサン:0.1~100質量部、および
(D)ヒドロシリル化反応触媒
を含む熱伝導性シリコーンポッティング組成物。
A thermally conductive silicone potting composition comprising: (A) 100 parts by mass of a linear organopolysiloxane having an average of 0.5 to 1.8 alkenyl groups bonded to silicon atoms at the molecular chain terminals per molecule; (B) 500 to 2,000 parts by mass of a thermally conductive filler; (C) 0.1 to 100 parts by mass of an organohydrogensiloxane having at least two SiH groups per molecule; and (D) a hydrosilylation reaction catalyst.
 前記(A)成分の直鎖状オルガノポリシロキサンのB型回転粘度計による25℃における粘度が、10~500mPa・sである請求項1記載の熱伝導性シリコーンポッティング組成物。 The thermally conductive silicone potting composition according to claim 1, wherein the viscosity of the linear organopolysiloxane of component (A) at 25°C measured with a Brookfield type rotational viscometer is 10 to 500 mPa·s.  (E)下記一般式(1)で表されるシラン化合物および下記一般式(2)で表されるオルガノポリシロキサンを、(A)成分100質量部に対して0.1~30質量部含む請求項1記載の熱伝導性シリコーンポッティング組成物。
(式中、R1は、互いに独立して一価炭化水素基を表し、nは、0~30の整数を表す。)
The thermally conductive silicone potting composition according to claim 1, which comprises (E) a silane compound represented by the following general formula (1) and an organopolysiloxane represented by the following general formula (2) in an amount of 0.1 to 30 parts by mass per 100 parts by mass of component (A):
(In the formula, R1 's each independently represent a monovalent hydrocarbon group, and n represents an integer of 0 to 30.)
 前記(B)熱伝導性充填剤が、前記(E)成分で表面処理されている請求項3記載の熱伝導性シリコーンポッティング組成物。 The thermally conductive silicone potting composition according to claim 3, wherein the thermally conductive filler (B) is surface-treated with component (E).  25℃における粘度が30Pa・s以下である請求項1記載の熱伝導性シリコーンポッティング組成物。 The thermally conductive silicone potting composition according to claim 1, which has a viscosity of 30 Pa·s or less at 25°C.  請求項1~5のいずれか1項記載の熱伝導性シリコーンポッティング組成物を硬化してなる硬化物。 A cured product obtained by curing the thermally conductive silicone potting composition described in any one of claims 1 to 5.
PCT/JP2025/011623 2024-04-17 2025-03-25 Thermally conductive silicone potting composition and cured product thereof Pending WO2025220439A1 (en)

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Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05105814A (en) * 1991-01-24 1993-04-27 Shin Etsu Chem Co Ltd Curable silicone composition and cured product thereof
JPH07324165A (en) * 1993-06-17 1995-12-12 Shin Etsu Chem Co Ltd Thixotropic fluorosilicone gel composition
WO2014185296A1 (en) * 2013-05-16 2014-11-20 信越化学工業株式会社 Thermally conductive silicone adhesive composition for reactor and reactor

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05105814A (en) * 1991-01-24 1993-04-27 Shin Etsu Chem Co Ltd Curable silicone composition and cured product thereof
JPH07324165A (en) * 1993-06-17 1995-12-12 Shin Etsu Chem Co Ltd Thixotropic fluorosilicone gel composition
WO2014185296A1 (en) * 2013-05-16 2014-11-20 信越化学工業株式会社 Thermally conductive silicone adhesive composition for reactor and reactor

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