WO2025205910A1 - Polymerizable composition, adhesive, sealing material, cured product, semiconductor device, and electronic component - Google Patents
Polymerizable composition, adhesive, sealing material, cured product, semiconductor device, and electronic componentInfo
- Publication number
- WO2025205910A1 WO2025205910A1 PCT/JP2025/011969 JP2025011969W WO2025205910A1 WO 2025205910 A1 WO2025205910 A1 WO 2025205910A1 JP 2025011969 W JP2025011969 W JP 2025011969W WO 2025205910 A1 WO2025205910 A1 WO 2025205910A1
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- WIPO (PCT)
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- polymerizable composition
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- polydimethylsiloxane
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K3/00—Use of inorganic substances as compounding ingredients
- C08K3/01—Use of inorganic substances as compounding ingredients characterized by their specific function
- C08K3/013—Fillers, pigments or reinforcing additives
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L63/00—Compositions of epoxy resins; Compositions of derivatives of epoxy resins
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L83/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon only; Compositions of derivatives of such polymers
- C08L83/04—Polysiloxanes
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J11/00—Features of adhesives not provided for in group C09J9/00, e.g. additives
- C09J11/02—Non-macromolecular additives
- C09J11/04—Non-macromolecular additives inorganic
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J11/00—Features of adhesives not provided for in group C09J9/00, e.g. additives
- C09J11/02—Non-macromolecular additives
- C09J11/06—Non-macromolecular additives organic
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J163/00—Adhesives based on epoxy resins; Adhesives based on derivatives of epoxy resins
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J183/00—Adhesives based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Adhesives based on derivatives of such polymers
- C09J183/04—Polysiloxanes
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J201/00—Adhesives based on unspecified macromolecular compounds
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/28—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
- H01L23/29—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the material, e.g. carbon
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/28—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
- H01L23/31—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape
Definitions
- the present invention relates to a polymerizable composition, an adhesive or sealant containing the same, a cured product thereof, and a semiconductor device and electronic component containing the cured product.
- curable resin compositions are often used to assemble and mount components used in semiconductor devices, such as semiconductor chips, in order to maintain reliability.
- Patent Documents 1 and 2 disclose photocurable and low-temperature curable cationically curable resin compositions.
- Bleeding is an issue in the assembly process of semiconductor modules. Bleeding is a phenomenon in which unreacted components seep out from the adhesive coating or cured product over time when an adhesive containing a curable resin composition is used to fix or bond components; the exuded components themselves are sometimes called "bleed.” If the bleed comes into contact with the metal wiring on the board, it can cause electrical defects, reducing the reliability of the semiconductor module. In particular, inner bleed, which occurs from uncured parts of the adhesive, tends to progress when the adhesive coating is left at room temperature and/or when it is thermally cured, and the bleed length tends to increase.
- the present invention therefore aims to provide at least a photocurable or thermosetting polymerizable composition and adhesive that can suppress the bleeding phenomenon.
- aspects of the present invention include the following polymerizable compositions, adhesives or sealants, cured products, and semiconductor devices or electronic components.
- A a cationically polymerizable compound, (B) an acid generator, and (C) a modified polydimethylsiloxane that satisfies at least one of the following characteristics (a), (b), and (c): (a) an organic substituent containing a COOH group is bonded to polydimethylsiloxane directly or via a linker; (b) an organic substituent containing an OH group and optionally an ether group is bonded to the polydimethylsiloxane directly or via a linker, and when the organic substituent contains an ether group, the ratio of the number of polypropylene glycol repeating units to the number of polyethylene glycol repeating units in the organic substituent is less than 0.3; (c) In a 1 H NMR spectrum measured in deuterated chloroform
- a polymerizable composition comprising: [2] The polymerizable composition according to the above [1], wherein the (A) cationically polymerizable compound includes a compound having an epoxy group and a compound having an oxetanyl group.
- At least a photocurable or thermosetting polymerizable composition capable of suppressing bleeding, an adhesive or sealant containing the same, a cured product obtained by curing the composition or the like, and a semiconductor device or electronic component containing the cured product.
- the polymerizable composition comprises: (A) a cationically polymerizable compound, (B) an acid generator, and (C) a modified polydimethylsiloxane that satisfies at least one of the following characteristics (a), (b), and (c): (a) an organic substituent containing a COOH group is bonded to polydimethylsiloxane directly or via a linker; (b) an organic substituent containing an OH group and optionally an ether group is bonded to the polydimethylsiloxane directly or via a linker, and when the organic substituent contains an ether group, the ratio of the number of polypropylene glycol repeating units to the number of polyethylene glycol repeating units in the organic substituent is less than 0.3; (c) In 1 H NMR measured in deuterated chloroform, it has signals in the ranges of 0.3 to ⁇ 0.3 ppm and 4.4 to 3.2 ppm
- the polymerizable composition of this embodiment contains (A) a cationic polymerizable compound (hereinafter also referred to as "component (A)").
- component (A) a cationic polymerizable compound
- examples of the (A) cationic polymerizable compound include, but are not limited to, compounds having an epoxy group, compounds having an oxetanyl group, compounds having a vinyl ether group, compounds having other cationic polymerizable groups, and compounds having any combination of these cationic polymerizable groups.
- the cationic polymerizable compound preferably contains a compound having an epoxy group and a compound having an oxetanyl group.
- a compound having an epoxy group refers to a compound having at least one epoxy group in its molecule, and is also referred to as an epoxy compound.
- examples include monofunctional epoxy compounds having one epoxy group and polyfunctional epoxy compounds having two or more epoxy groups.
- the epoxy compound preferably contains at least a polyfunctional epoxy compound, and may contain a combination of a polyfunctional epoxy compound and a monofunctional epoxy compound.
- Epoxy compounds can be broadly classified according to the type of skeleton into epoxy compounds having an aromatic ring skeleton, aliphatic epoxy compounds, and alicyclic epoxy compounds.
- a compound having an oxetanyl group is a compound having at least one oxetane ring (e.g., a 3-oxetanyl group) in the molecule, and is also referred to as an oxetane compound.
- the oxetane compound preferably has 1 to 6 oxetanyl groups in the molecule, and more preferably has 1 to 2 oxetanyl groups in the molecule.
- a compound having a vinyl ether group is a compound having at least one vinyl ether group in the molecule.
- cationic polymerizable compounds include glycidyl ethers of tetra(hydrophenyl)alkanes, glycidyl ethers of tetrahydroxybenzophenone, epoxidized polyvinylphenol, p-tert-butylphenyl glycidyl ether, ethylene glycol diglycidyl ether, diethylene glycol diglycidyl ether, propylene glycol diglycidyl ether, 1,4-butanediol diglycidyl ether, neopentyl glycol diglycidyl ether, 1,6-hexanediol diglycidyl ether, glycerin diglycidyl ether, trimethylolpropane triglycidyl ether, polyethylene glycol diglycidyl ether, hydrogenated bisphenol A diglycidyl ether, n-butyl glycidyl ether, 2-ethyl
- EPICLON registered trademark
- EXA-850CRP EXA-8067 manufactured by DIC Corporation
- AER9000 manufactured by Asahi Kasei Corporation
- EP-4000S, EP-4003S, and EP-4010S manufactured by ADEKA Corporation
- EPICLON registered trademark 830-S and EXA-830 manufactured by DIC Corporation.
- EXA-835LV LVP, EXA-835LV; EPICLON (registered trademark) HP-4032D, HP-720H manufactured by DIC Corporation; EPICLON (registered trademark) N-740, N-770 manufactured by DIC Corporation; EPICLON (registered trademark) N-660, N-670, N-655-EXP-S manufactured by DIC Corporation; ADEKA GLYCILOR (registered trademark) ED-5 manufactured by ADEKA Corporation 09E, ED-509S; OPP-G manufactured by Sanko Co., Ltd.; Epolite 100MF manufactured by Kyoeisha Chemical Co., Ltd.; AER-9000 manufactured by Asahi Kasei Corporation; jER YX7400N manufactured by Mitsubishi Chemical Corporation; jER YX8000 manufactured by Mitsubishi Chemical Corporation; CELLOXIDE (registered trademark) 2021P manufactured by Daicel Corporation; CELLOXIDE (registered trademark) 8010 manufactured by Daicel Corporation; EHPE3150 manufactured
- Examples of phosphonium cations include tetraarylphosphoniums such as tetraphenylphosphonium, tetra-p-tolylphosphonium, tetrakis(2-methoxyphenyl)phosphonium, tetrakis(3-methoxyphenyl)phosphonium, and tetrakis(4-methoxyphenyl)phosphonium; triarylphosphoniums such as triphenylbenzylphosphonium, triphenylphenacylphosphonium, triphenylmethylphosphonium, and triphenylbutylphosphonium; and tetraalkylphosphoniums such as triethylbenzylphosphonium, tributylbenzylphosphonium, tetraethylphosphonium, tetrabutylphosphonium, tetrahexylphosphonium, triethylphenacylphosphonium, and tributylphenacylphospho
- modified polydimethylsiloxanes in which the organic substituents contain OH groups but not ether groups include those commercially available under the names carbinol-modified polydimethylsiloxanes or carbinol-modified silicones.
- examples of commercially available products of this type include, but are not limited to, products sold by Shin-Etsu Chemical Co., Ltd. under the names: X-22-4039, X-22-4015, KF-6000, KF-6001, KF-6002, KF-6003, X-22-170BX, and X-22-170DX.
- Reactive silicones whose hydroxyl values are disclosed in catalogs or the like can also be assumed to be modified polydimethylsiloxanes in which the organic substituents contain OH groups and, optionally, ether groups.
- the hydroxyl value of the modified polydimethylsiloxane may be measured to confirm the presence of OH groups in the modified polydimethylsiloxane.
- the modified polydimethylsiloxane has a hydroxyl value of 1 mg KOH/g or more.
- the hydroxyl value can be measured, for example, by a method conforming to JIS K 0070 or by FT-NIR (near-infrared spectroscopy) conforming to JIS K 1557-6.
- the organic substituent of the modified polydimethylsiloxane contains an OH group can also be confirmed by measuring the modified polydimethylsiloxane by Fourier transform infrared spectroscopy (FT-IR) and observing the presence or absence of an IR spectrum at about 1360 to 1340 cm ⁇ 1 due to the deformation vibration of alcoholic OH.
- FT-IR Fourier transform infrared spectroscopy
- the ratio of the number of polypropylene glycol repeating units to the number of polyethylene glycol repeating units in the organic substituent can be determined from the structure of the modified polydimethylsiloxane disclosed in a catalog or the like. For example, if it is clear that the modified polydimethylsiloxane contains an OH group and an ether group but does not contain a polypropylene glycol repeating unit, the ratio of the number of polypropylene glycol repeating units to the number of polyethylene glycol repeating units will be 0, satisfying feature (b).
- a specific structure is not disclosed, as described below with respect to feature (c), it can be calculated based on the 1H NMR spectrum of the modified polydimethylsiloxane measured in deuterated chloroform.
- the value calculated using the following formula (1) based on the 1H NMR spectrum of the modified polydimethylsiloxane measured in deuterated chloroform can be considered to be the ratio of the number of polypropylene glycol repeating units to the number of polyethylene glycol repeating units.
- modified polydimethylsiloxanes do not disclose the detailed structure of the modifying group. Furthermore, some commercially available additives, such as surfactants, surface conditioners, leveling agents, antifoaming agents, wetting agents, and dispersants, are classified as modified polydimethylsiloxanes, even though they are not explicitly referred to as modified polydimethylsiloxanes or their structures are not disclosed.
- the modified polydimethylsiloxanes of this embodiment are those that, in their 1H NMR spectrum measured in deuterated chloroform, have signals in the ranges of 0.3 to -0.3 ppm and 4.4 to 3.2 ppm, have or do not have a signal in the range of 1.25 to 0.95 ppm, and have a signal in the range of 13 to 0 ppm that disappears upon addition of D2O , and for which the value calculated from the following formula (1) is less than 0.3 (the above-mentioned feature (c)).
- first signal is a signal derived from a hydrogen atom (-Si(C H 3 ) 2 -) connected to a carbon atom adjacent to a Si atom.
- the signal observed in the range of 4.4 to 3.2 ppm is a signal derived from a hydrogen atom connected to a carbon adjacent to an OH group or an oxygen atom of an ether (e.g., -O-C H 2 C H 2 -O-, -O-C H 2 C H (CH 3 )-O-, -C H 2 -OH).
- the signal observed in the range of 1.25 to 0.95 ppm (hereinafter also referred to as "third signal”) is a signal derived from a hydrogen atom (-CH 2 CH(C H 3 )-O-) of a methyl group in a polypropylene glycol chain as a polyether modifying group.
- the signal observed in the range of 13 to 0 ppm and disappearing upon addition of D 2 O (hereinafter also referred to as "fourth signal”) can be presumed to be a signal derived from the hydrogen atom of an OH group or an NH group.
- Signals that disappear upon addition of D 2 O are usually observed in the range of 13 to 0 ppm. Among these, signals observed in the range of 3 to 2 ppm and that disappear upon addition of D 2 O can be presumed to be signals derived from hydrogen atoms of OH groups.
- Whether the signal that disappears upon addition of D 2 O is a signal derived from a hydrogen atom of an OH group or an NH group can also be estimated by, for example, the following method.
- Fourier transform infrared spectroscopy (FT-IR) measurement In addition to the above 1 H NMR measurement, the presence or absence of an IR spectrum at approximately 1360 to 1340 cm ⁇ 1 derived from the deformation vibration of alcoholic OH groups can be observed by Fourier transform infrared spectroscopy (FT-IR) measurement of the modified polydimethylsiloxane, and it can be assumed that the signal that disappears upon addition of D 2 O is a signal derived from the hydrogen atom of the OH group.
- FT-IR Fourier transform infrared spectroscopy
- measurement of the acidity of modified polydimethylsiloxane allows estimation of whether the signal that disappears upon addition of D2O is derived from the hydrogen atom of an OH group or an NH group.
- 100 mg of a measurement sample of modified polydimethylsiloxane is dissolved in 200 uL of isopropyl alcohol, 200 uL of pure water is added, and the solution is shaken well, and the pH of the liquid is measured. If the pH is 3 to 7, the signal that disappears upon addition of D2O can be estimated to be derived from the hydrogen atom of an OH group. If the pH is 8 or higher, which is basic, the signal that disappears upon addition of D2O can be estimated to be derived from the hydrogen atom of an NH group.
- the value calculated from formula (1) is less than 0.3, which roughly corresponds to the ratio of the number of polypropylene glycol repeating units to the number of polyethylene glycol repeating units in the modified polydimethylsiloxane, as shown below.
- the signal observed in the range of 0.3 to ⁇ 0.3 ppm (first signal) is attributed to the underlined hydrogen atom of the dimethylsiloxane repeating unit —O—Si(C H 3 ) 2 —.
- the number of polypropylene glycol repeating units per dimethylsiloxane repeating unit can be calculated using the following formula (2): Equation (2): (integral value of the third signal)/3
- the number of polyethylene glycol repeating units per dimethylsiloxane repeating unit can be calculated using the following formula (3): Equation (3): [(integral value of the second signal) - (integral value of the third signal)]/4
- the ratio of the number of polypropylene glycol repeating units to the number of polyethylene glycol repeating units in the modified polydimethylsiloxane can be calculated using formula (1).
- modified polydimethylsiloxanes that satisfy characteristic (c) include products sold by Shin-Etsu Chemical Co., Ltd. under the product names KF-945 and X-22-4039, and products sold by Evonik Japan Co., Ltd. under the product names TEGO TWIN 4000 and TEGO TWIN 4100.
- a modified polydimethylsiloxane in the polymerizable composition is thought to be, but is not limited to, the following: When a polymerizable composition containing a modified polydimethylsiloxane is applied to a substrate or the like, a portion of the modified polydimethylsiloxane migrates to the coating surface of the polymerizable composition due to the surface migration of the modified polydimethylsiloxane.
- a small amount of the modified polydimethylsiloxane that has migrated to the coating surface migrates to a substrate that is not in contact with the polymerizable composition, before other unreacted components seep out of the coating of the polymerizable composition, and the modifying group of the modified polydimethylsiloxane adsorbs to the surface of the substrate. This is thought to form an adsorption film of modified polydimethylsiloxane on the substrate surface, resulting in water- and oil-repellent properties attributable to the polydimethylsiloxane portion and suppressing bleeding.
- the organic substituent as the modifying group containing a COOH group or an OH group can provide a higher adsorption effect of the modified polydimethylsiloxane to the substrate. Furthermore, when the organic substituent as the modifying group contains an OH group, it is thought that the adsorption effect of the OH group to the substrate is not suppressed if the amount of polypropylene glycol groups contained in the organic substituent is below a certain amount.
- a modified polydimethylsiloxane satisfying at least one of features (b) and (c) is one in which, in a 1 H NMR spectrum measured in deuterated chloroform, the integral of each signal (second signal) observed in the range of 4.4 to 3.2 ppm is preferably 0.3 to 19, and even more preferably 0.3 to 17, when the integral of the first signal corresponding to one dimethylsiloxane repeating unit is set to 6 and the integral of each signal is calculated.
- 1H NMR measurements can be performed under normal conditions. For example, 100 mg of a measurement sample is dissolved in 500 ⁇ l of deuterated chloroform and placed in a 5 mm diameter 1H NMR sample tube, and measurements are performed under the following conditions. After the measurement, 50 ⁇ l of heavy water ( D2O ) is added to the sample tube, and measurements are performed again under the same conditions. The signal that disappears after the addition of heavy water is found to be a signal derived from active hydrogen bonded to a hydroxyl group or an amino group. Measurement frequency: 40-600 MHz Solvent: deuterated chloroform Measurement nuclide: 1 H Accumulation count: 4 to 80 times Measurement temperature: 15 to 50°C
- the content of (C) modified polydimethylsiloxane is preferably 0.01% by mass or more, more preferably 0.1% by mass or more, and even more preferably 0.2% by mass or more, relative to the total mass of the polymerizable composition. It is also preferably 5% by mass or less, more preferably 4% by mass or less, and even more preferably 3% by mass or less. In some embodiments, the content of (C) modified polydimethylsiloxane is preferably 0.01 to 5% by mass, more preferably 0.1 to 4% by mass, and even more preferably 0.2 to 3% by mass, relative to the total mass of the polymerizable composition.
- the polymerizable composition of this embodiment may contain optional components other than the above components (A) to (C), such as those described below, as needed.
- the polymerizable composition of this embodiment may contain (D) filler (hereinafter also referred to as "component (D)”) within a range that does not impair the effects of the present invention.
- component (D) filler
- the linear expansion coefficient of the cured product obtained by curing the polymerizable composition can be reduced, and thermal cycle resistance can be improved.
- the filler has a low elastic modulus, it can alleviate stress generated in the cured product, and long-term reliability can be improved.
- (D) fillers are broadly classified into inorganic fillers and organic fillers.
- the inorganic filler is not particularly limited as long as it is made of granular material and has the effect of lowering the linear expansion coefficient when added.
- examples of inorganic materials that can be used include silica, talc, alumina, aluminum nitride, calcium carbonate, aluminum silicate, magnesium silicate, magnesium carbonate, barium sulfate, barium carbonate, lime sulfate, aluminum hydroxide, calcium silicate, potassium titanate, titanium oxide, zinc oxide, silicon carbide, silicon nitride, and boron nitride. Any one of these inorganic fillers may be used alone, or two or more may be used in combination.
- Silica filler is preferred as the inorganic filler, as it allows for a high loading.
- Amorphous silica is preferred as the silica.
- the surface of the inorganic filler be treated with a coupling agent such as a silane coupling agent. This allows the viscosity of the polymerizable composition to be within an appropriate range.
- organic fillers examples include polytetrafluoroethylene (PTFE) filler, silicone filler, acrylic filler, styrene filler, etc.
- PTFE polytetrafluoroethylene
- silicone filler acrylic filler
- styrene filler etc.
- the organic filler may be surface-treated.
- the glass transition point of the organic filler is preferably above 40°C.
- the shape of the filler is not particularly limited and may be spherical, flaky, needle-like, irregular, etc.
- the lower limit of the average particle size of the filler is not particularly limited, but from the viewpoint of the viscosity of the polymerizable composition, it is preferably 0.005 ⁇ m or more, and more preferably 0.1 ⁇ m or more.
- the average particle size of the filler is preferably 0.01 ⁇ m to 5.0 ⁇ m, more preferably 0.1 ⁇ m to 3.0 ⁇ m.
- Fillers with different average particle sizes may be used in combination, for example, a filler with an average particle size of 0.005 ⁇ m or more and less than 0.1 ⁇ m may be used in combination with a filler with an average particle size of 0.1 ⁇ m to 5.0 ⁇ m.
- the content of the filler (D) in the polymerizable composition of this embodiment is preferably 0.5 to 80% by mass, more preferably 1 to 70% by mass, and even more preferably 3 to 60% by mass, relative to the total mass of the polymerizable composition.
- the polymerizable composition of this embodiment may contain a photosensitizer, if desired, within the range that does not impair the effects of the present invention.
- the photosensitizer absorbs light energy and transmits it to the acid generator, thereby increasing the sensitivity of the acid generator to light.
- photosensitizers include, but are not limited to, thioxanthone derivatives, carbonyl compounds, organic sulfur compounds, persulfides, redox compounds, azo and diazo compounds, halogen compounds, and photoreducible dyes.
- the content of the photosensitizer is preferably 0.1 to 1000% by mass, and more preferably 1 to 500% by mass, relative to the total mass of the acid generator.
- the polymerizable composition of this embodiment may contain a photoradical initiator, if desired, within the scope of not impairing the effects of the present invention.
- the photoradical initiator absorbs light to generate radicals as active species, which can reductively decompose the acid generator and promote the generation of acid from the acid generator.
- Examples of photoradical initiators include, but are not limited to, alkylphenone compounds, acylphosphine oxide compounds, oxime ester compounds, and compounds having a photosensitive moiety and a peroxide structure.
- the polymerizable composition of this embodiment may contain a thermal radical initiator, if desired, within a range that does not impair the effects of the present invention.
- the thermal radical initiator generates an active radical by cleavage at a predetermined temperature, which can reductively decompose the acid generator and promote the generation of an acid from the acid generator.
- thermal radical initiators include organic peroxides, inorganic peroxides, and azo compounds.
- thermal radical initiators Any one of the thermal radical initiators may be used, or two or more may be used in combination.
- the content of the thermal radical initiator is preferably 1 to 200% by mass, and more preferably 10 to 150% by mass, relative to the total mass of the acid generator.
- the polymerizable composition of this embodiment may contain a radically polymerizable compound to the extent that the effects of the present invention are not impaired.
- active species radicals may also be generated, which causes radical polymerization of the radically polymerizable compound to proceed, imparting curability and adhesiveness to the polymerizable composition.
- radically polymerizable compounds include, but are not limited to, compounds having an unsaturated double bond such as (meth)acrylate compounds, bismaleimide compounds, styrene compounds, and polybutadiene compounds, as well as mixtures of compounds having an unsaturated double bond and thiol compounds (mixtures capable of ene-thiol reaction). Any one type of radically polymerizable compound may be used, or two or more types may be used in combination.
- the polymerizable composition may further contain other additives, such as a stabilizer, a coupling agent, carbon black, titanium black, an ion trapping agent, a leveling agent, an antioxidant, an antifoaming agent, a thixotropic agent, a viscosity modifier, or a flame retardant, as needed, within the scope of the present embodiment.
- additives such as a stabilizer, a coupling agent, carbon black, titanium black, an ion trapping agent, a leveling agent, an antioxidant, an antifoaming agent, a thixotropic agent, a viscosity modifier, or a flame retardant, as needed, within the scope of the present embodiment.
- the polymerizable composition of this embodiment preferably contains substantially no solvent, from the viewpoint of suppressing VOC emissions and shrinkage of the cured product.
- the polymerizable composition contains substantially no solvent means that the content of solvent in the polymerizable composition is 1 mass % or less relative to the total mass of the polymerizable composition.
- the viscosity of the polymerizable composition of this embodiment is preferably 0.5 to 100 Pa ⁇ s.
- the viscosity can be adjusted appropriately depending on the intended use and application location of the polymerizable composition.
- the viscosity of the composition is expressed as a value measured in accordance with Japanese Industrial Standard JIS K6833, unless otherwise specified. Specifically, it can be determined by measuring using an E-type viscometer at a rotation speed of 10 rpm. There are no particular restrictions on the equipment, rotor, or measurement range used.
- each component may contain one or more components selected from the components (A) to (C) and other optional components as needed.
- Components (A) to (C) may be contained in a single component, or a component may contain only the components (A) to (C) and/or other optional components as needed.
- the separation may be as follows: liquid A: component (A), liquid B: component (B) and component (C), liquid A: component (A) and component (C), liquid B: component (B), liquid A: component (A) and component (C), liquid B: component (B) and component (C), liquid A: component (A), liquid B: component (B), component (C), and component (D), liquid A: component (A) and component (C), liquid B: component (B) and component (D), or liquid A: component (A) and component (D), liquid B: component (B) and component (C).
- liquid A When components (A) to (C) are contained in liquid A and other components are contained in liquid B, only liquid A or a combination of liquid A and liquid B can be considered as the polymerizable composition of this embodiment.
- components (A) to (C) when components (A) to (C) are contained in separate liquids, the liquids can be considered together to be the polymerizable composition of this embodiment.
- An example of a case in which components (A) to (C) are contained in separate liquids is a polymerizable composition in which components (A) to (C) are separated into two or more containers, specifically a kit composed of multiple liquids containing any of components (A) to (C).
- the polymerizable composition of this embodiment can be used, for example, as an adhesive, sealant, or damming agent for fixing, adhering, or protecting components, as well as a raw material for these, and is suitable as a one-component type.
- the damming agent is formed, for example, around the periphery of the substrate before sealing multiple semiconductor chips or the like on the substrate with a low-viscosity filler or the like. The formation of a dam by this damming agent can prevent the subsequent outflow of the low-viscosity filler that seals the multiple semiconductor chips.
- adhesives containing the polymerizable composition of this embodiment enable good bonding to engineering plastics, ceramics, and metals.
- the method for applying the polymerizable composition is not particularly limited, and for example, it can be applied to the desired portion of a component such as a substrate by a known printing method, dispensing method, or coating method.
- Printing methods include, but are not limited to, inkjet printing, screen printing, lithographic printing, carton printing, metal printing, offset printing, gravure printing, and flexographic printing.
- Dispensing methods include, but are not limited to, methods using a jet dispenser or air dispenser.
- Coating methods include, but are not limited to, dip coating, spray coating, bar coater coating, gravure coating, reverse gravure coating, and spin coater coating.
- the method for applying the polymerizable composition is preferably a method using an air dispenser.
- the adhesive or sealant of this embodiment can be a one-component adhesive or sealant contained in a single container, or a two-component (or multi-component) adhesive or sealant separated into two or more containers.
- a two-component (or multi-component) adhesive or sealant is used, the components (A) to (C) and other optional components as needed can be selected in the same way as for a one-component adhesive or sealant.
- the components (A) to (C) and other optional components as needed can be separated into two or multiple components in any manner without particular restrictions.
- each component may contain one or more components selected from the components (A) to (C) and other optional components as needed.
- Components (A) to (C) may be contained in a single component, or a component may be a component consisting solely of the components (A) to (C) and/or other optional components as needed.
- the division may be liquid A: component (A), liquid B: component (B) and component (C), or liquid A: component (A) and component (C), liquid B: component (B), or liquid A: component (A) and component (C), liquid B: component (B) and component (C), or liquid A: component (A), liquid B: component (B), component (C), and component (D), or liquid A: component (A) and component (C), liquid B: component (B) and component (D), or liquid A: component (A) and component (D), or liquid B: component (B) and component (C).
- the cured product according to another embodiment of the present invention is a cured product obtained by curing the polymerizable composition according to the above embodiment or the adhesive or sealant according to the above embodiment. Bleeding is suppressed around an adherend to which the cured product is adhered.
- a semiconductor device or electronic component according to one embodiment of the present invention includes the cured product according to the above-described embodiment.
- semiconductor device refers to any device that can function by utilizing semiconductor properties, including electronic components, semiconductor circuits, modules incorporating these, and electronic devices. Examples of semiconductor devices or electronic components include, but are not limited to, HDDs, semiconductor elements, optical sensor modules, other semiconductor modules, and integrated circuits.
- optical sensors include, but are not limited to, photodiodes, photo ICs, photomultiplier tubes (PMTs), phototubes, image sensors, spectroscopes/spectroscopic sensors, infrared sensors, ultraviolet/flame sensors, X-ray sensors, radiation sensors, electron/ion sensors, and distance/position sensors.
- D Filler (Component (D))
- D-1 Surface-treated silica filler (product name: SE5200SEE, average particle size 2 ⁇ m, manufactured by Admatechs Co., Ltd.)
- D-2) Silica filler (product name: CAB-O-SIL (registered trademark) TS-720, polydimethylsiloxane surface-treated fumed silica, manufactured by Cabot Corporation)
- E-1 Dicetyl peroxydicarbonate (product name: Perkadox 24L, manufactured by Kayaku Nouryon Co., Ltd., thermal radical initiator)
- E-2) 2,4-diethylthioxanthone (DETX) (photosensitizer)
- the polymerizable compositions of Examples 1 to 19 containing (C) a modified polydimethylsiloxane that satisfies at least one of characteristics (a), (b), and (c) showed significantly reduced bleeding under both Condition 1 and Condition 2, compared to the polymerizable compositions of Comparative Examples 1 and 7 to 11 that did not contain the (C) modified polydimethylsiloxane, and the polymerizable compositions of Comparative Examples 2 to 6 that contained (C') a modified polydimethylsiloxane other than component (C).
- the present invention relates to a polymerizable composition that is at least photocurable or thermosetting and can suppress bleeding, and is particularly useful as an adhesive or sealant used to fix, bond, or protect components in miniaturized or highly integrated semiconductor modules.
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Abstract
Description
本発明は、重合性組成物、それを含む接着剤又は封止材、その硬化物、その硬化物を含む半導体装置及び電子部品に関する。 The present invention relates to a polymerizable composition, an adhesive or sealant containing the same, a cured product thereof, and a semiconductor device and electronic component containing the cured product.
現在、半導体装置に用いられる部品、例えば半導体チップの組み立てや装着には、信頼性の保持等を目的として、硬化性樹脂組成物を含む接着剤、封止材等がしばしば用いられる。 Currently, adhesives, sealants, etc. containing curable resin compositions are often used to assemble and mount components used in semiconductor devices, such as semiconductor chips, in order to maintain reliability.
光硬化性及び/又は低温で硬化可能な硬化性樹脂組成物の開発が進められている。例えば、特許文献1及び特許文献2には、光硬化性および低温硬化性のカチオン硬化性樹脂組成物が開示されている。 The development of photocurable and/or low-temperature curable resin compositions is progressing. For example, Patent Documents 1 and 2 disclose photocurable and low-temperature curable cationically curable resin compositions.
半導体モジュールの組立プロセスにおいて、ブリードが課題となっている。ブリードとは、部品の固定や接着に硬化性樹脂組成物を含む接着剤を使用した際に、未反応成分が時間経過とともに接着剤塗布物又は硬化物から染み出る現象であり、染み出した成分そのものを「ブリード」と呼ぶこともある。ブリードが基板上の金属配線部に接触することで、電気的な不良の原因となる場合があり、半導体モジュールの信頼性が低下するという課題がある。特に、接着剤の未硬化部分から発生するインナーブリードは、接着剤塗布物の常温放置の際及び/又は熱硬化の際に進展し、ブリード長が長くなる傾向がある。 Bleeding is an issue in the assembly process of semiconductor modules. Bleeding is a phenomenon in which unreacted components seep out from the adhesive coating or cured product over time when an adhesive containing a curable resin composition is used to fix or bond components; the exuded components themselves are sometimes called "bleed." If the bleed comes into contact with the metal wiring on the board, it can cause electrical defects, reducing the reliability of the semiconductor module. In particular, inner bleed, which occurs from uncured parts of the adhesive, tends to progress when the adhesive coating is left at room temperature and/or when it is thermally cured, and the bleed length tends to increase.
近年、半導体チップ等の電子部品は益々小型化又は高集積化が求められてきており、電子部品周辺に配置される配線部までの距離が短くなっている。このような小型化又は高集積化された電子部品を備える半導体モジュールでは、ブリード現象によりブリードと配線部との接触リスクが高まるという課題がある。 In recent years, there has been a growing demand for electronic components such as semiconductor chips to be increasingly smaller and more highly integrated, resulting in shorter distances to the wiring areas located around the electronic components. Semiconductor modules equipped with such smaller and more highly integrated electronic components pose a challenge, as bleeding increases the risk of contact between the bleeding and the wiring areas.
そこで、本発明は、ブリード現象を抑制可能な、少なくとも光硬化性又は熱硬化性の重合性組成物及び接着剤を提供することを目的とする。 The present invention therefore aims to provide at least a photocurable or thermosetting polymerizable composition and adhesive that can suppress the bleeding phenomenon.
前記課題を解決するための具体的手段は以下の通りである。本発明態様は、以下の態様の重合性組成物、接着剤又は封止材、硬化物、及び半導体装置又は電子部品を包含する。
[1](A)カチオン重合性化合物、
(B)酸発生剤、及び
(C)以下の特徴(a)、(b)及び(c)の少なくとも1つを満たす変性ポリジメチルシロキサン:
(a)COOH基を含有する有機置換基が、ポリジメチルシロキサンと直接又はリンカーを介して結合している;
(b)OH基及び場合によりエーテル基を含有する有機置換基が、ポリジメチルシロキサンと直接又はリンカーを介して結合しており、有機置換基がエーテル基を含有する場合、該有機置換基中のポリエチレングリコール繰り返し単位数に対する、ポリプロピレングリコール繰り返し単位数の比が、0.3未満である;
(c)重クロロホルム中で測定した1H NMRスペクトルにおいて、0.3~-0.3ppm及び4.4~3.2ppmの範囲にシグナルを有し、1.25~0.95ppmの範囲にシグナルを有するかあるいは有さず、13~0ppmの範囲にD2O添加によって消失するシグナルを有し、かつ以下の式(1)より算出される数値が、0.3未満である、
式(1):[(1.25~0.95ppmの範囲のシグナルの積分値)/3]/{[(4.4~3.2ppmの範囲のシグナルの積分値)-(1.25~0.95ppmの範囲のシグナルの積分値)]/4}
を含む重合性組成物。
[2]前記(A)カチオン重合性化合物が、エポキシ基を有する化合物及びオキセタニル基を有する化合物を含む、上記[1]に記載の重合性組成物。
[3]前記(C)変性ポリジメチルシロキサンの含有量が、重合性組成物の総質量に対し0.01~5質量%である、上記[1]又は[2]に記載の重合性組成物。
[4]さらに、(D)フィラーを含む、上記[1]~[3]のいずれかに記載の重合性組成物。
[5]前記成分(A)~成分(C)が単一の容器に入れられたものとして構成される、上記[1]~[4]のいずれか1項に記載の重合性組成物。
[6]前記成分(A)~成分(C)が2つ以上の容器に分けられたものとして構成される、上記[1]~[4]のいずれか1項に記載の重合性組成物。
[7]上記[1]~[6]のいずれかに記載の重合性組成物を含む接着剤又は封止材。
[8]光学センサモジュール又はそれを構成する部品の固定、接着又は保護に用いられる、上記[7]に記載の接着剤又は封止材。
[9]上記[1]~[6]のいずれかに記載の重合性組成物、もしくは上記[7]又は[8]に記載の接着剤又は封止材が硬化された硬化物。
[10]上記[9]に記載の硬化物を含む半導体装置又は電子部品。
[11]光学センサモジュールである、上記[10]に記載の半導体装置又は電子部品。
Specific means for solving the above problems are as follows: Aspects of the present invention include the following polymerizable compositions, adhesives or sealants, cured products, and semiconductor devices or electronic components.
[1] (A) a cationically polymerizable compound,
(B) an acid generator, and (C) a modified polydimethylsiloxane that satisfies at least one of the following characteristics (a), (b), and (c):
(a) an organic substituent containing a COOH group is bonded to polydimethylsiloxane directly or via a linker;
(b) an organic substituent containing an OH group and optionally an ether group is bonded to the polydimethylsiloxane directly or via a linker, and when the organic substituent contains an ether group, the ratio of the number of polypropylene glycol repeating units to the number of polyethylene glycol repeating units in the organic substituent is less than 0.3;
(c) In a 1 H NMR spectrum measured in deuterated chloroform, it has signals in the ranges of 0.3 to −0.3 ppm and 4.4 to 3.2 ppm, has or has no signal in the range of 1.25 to 0.95 ppm, has a signal in the range of 13 to 0 ppm that disappears upon addition of D 2 O, and the value calculated by the following formula (1) is less than 0.3.
Formula (1): [(integral value of signals in the range of 1.25 to 0.95 ppm)/3]/{[(integral value of signals in the range of 4.4 to 3.2 ppm)-(integral value of signals in the range of 1.25 to 0.95 ppm)]/4}
A polymerizable composition comprising:
[2] The polymerizable composition according to the above [1], wherein the (A) cationically polymerizable compound includes a compound having an epoxy group and a compound having an oxetanyl group.
[3] The polymerizable composition according to the above [1] or [2], wherein the content of the (C) modified polydimethylsiloxane is 0.01 to 5 mass % relative to the total mass of the polymerizable composition.
[4] The polymerizable composition according to any one of the above [1] to [3], further comprising (D) a filler.
[5] The polymerizable composition according to any one of the above [1] to [4], wherein the components (A) to (C) are contained in a single container.
[6] The polymerizable composition according to any one of the above [1] to [4], wherein the components (A) to (C) are separated into two or more containers.
[7] An adhesive or sealant comprising the polymerizable composition according to any one of [1] to [6] above.
[8] The adhesive or sealant according to [7] above, which is used for fixing, adhering or protecting an optical sensor module or a component constituting the optical sensor module.
[9] A cured product obtained by curing the polymerizable composition according to any one of [1] to [6] above, or the adhesive or sealant according to [7] or [8] above.
[10] A semiconductor device or electronic component comprising the cured product according to [9] above.
[11] The semiconductor device or electronic component according to [10] above, which is an optical sensor module.
本発明の態様によれば、ブリード現象を抑制可能な、少なくとも光硬化性又は熱硬化性の重合性組成物、それを含む接着剤又は封止材、それらが硬化された硬化物、及びその硬化物を含む半導体装置又は電子部品が提供される。 According to aspects of the present invention, there are provided at least a photocurable or thermosetting polymerizable composition capable of suppressing bleeding, an adhesive or sealant containing the same, a cured product obtained by curing the composition or the like, and a semiconductor device or electronic component containing the cured product.
[重合性組成物]
本発明の一態様である重合性組成物は、
(A)カチオン重合性化合物、
(B)酸発生剤、及び
(C)以下の特徴(a)、(b)及び(c)の少なくとも1つを満たす変性ポリジメチルシロキサン:
(a)COOH基を含有する有機置換基が、ポリジメチルシロキサンと直接又はリンカーを介して結合している;
(b)OH基及び場合によりエーテル基を含有する有機置換基が、ポリジメチルシロキサンと直接又はリンカーを介して結合しており、有機置換基がエーテル基を含有する場合、該有機置換基中のポリエチレングリコール繰り返し単位数に対する、ポリプロピレングリコール繰り返し単位数の比が、0.3未満である;
(c)重クロロホルム中で測定した1H NMRにおいて、0.3~-0.3ppm及び4.4~3.2ppmの範囲にシグナルを有し、1.25~0.95ppmの範囲にシグナルを有するかあるいは有さず、13~0ppmの範囲にD2O添加によって消失するシグナルを有し、かつ以下の式(1)より算出される数値が、0.3未満である、
式(1):[(1.25~0.95ppmの範囲のシグナルの積分値)/3]/{[(4.4~3.2ppmの範囲のシグナルの積分値)-(1.25~0.95ppmの範囲のシグナルの積分値)]/4}
を含む。本態様によれば、ブリード現象を抑制可能な、少なくとも光硬化性又は熱硬化性の重合性組成物を提供することができる。
[Polymerizable composition]
The polymerizable composition according to one embodiment of the present invention comprises:
(A) a cationically polymerizable compound,
(B) an acid generator, and (C) a modified polydimethylsiloxane that satisfies at least one of the following characteristics (a), (b), and (c):
(a) an organic substituent containing a COOH group is bonded to polydimethylsiloxane directly or via a linker;
(b) an organic substituent containing an OH group and optionally an ether group is bonded to the polydimethylsiloxane directly or via a linker, and when the organic substituent contains an ether group, the ratio of the number of polypropylene glycol repeating units to the number of polyethylene glycol repeating units in the organic substituent is less than 0.3;
(c) In 1 H NMR measured in deuterated chloroform, it has signals in the ranges of 0.3 to −0.3 ppm and 4.4 to 3.2 ppm, has or has no signal in the range of 1.25 to 0.95 ppm, has a signal in the range of 13 to 0 ppm that disappears upon addition of D 2 O, and the value calculated by the following formula (1) is less than 0.3.
Formula (1): [(integral value of signals in the range of 1.25 to 0.95 ppm)/3]/{[(integral value of signals in the range of 4.4 to 3.2 ppm)-(integral value of signals in the range of 1.25 to 0.95 ppm)]/4}
According to this aspect, it is possible to provide a polymerizable composition that is at least photocurable or thermosetting and that can suppress the bleeding phenomenon.
(A)カチオン重合性化合物
本態様の重合性組成物は、(A)カチオン重合性化合物(以下、「成分(A)」とも言う)を含む。(A)カチオン重合性化合物の例としては、エポキシ基を有する化合物、オキセタニル基を有する化合物、ビニルエーテル基を有する化合物、その他のカチオン重合性基を有する化合物、これらのカチオン重合性基を任意に組み合わせて有する化合物等が挙げられるが、これらに限定されない。一実施形態において、カチオン重合性化合物は、エポキシ基を有する化合物及びオキセタニル基を有する化合物を含むことが好ましい。
(A) Cationic Polymerizable Compound The polymerizable composition of this embodiment contains (A) a cationic polymerizable compound (hereinafter also referred to as "component (A)"). Examples of the (A) cationic polymerizable compound include, but are not limited to, compounds having an epoxy group, compounds having an oxetanyl group, compounds having a vinyl ether group, compounds having other cationic polymerizable groups, and compounds having any combination of these cationic polymerizable groups. In one embodiment, the cationic polymerizable compound preferably contains a compound having an epoxy group and a compound having an oxetanyl group.
本明細書中、エポキシ基を有する化合物とは、分子中に少なくとも1つのエポキシ基を有する化合物であり、エポキシ化合物とも称する。エポキシ基を1つ有する単官能エポキシ化合物及びエポキシ基を2つ以上有する多官能エポキシ化合物が挙げられる。本態様において、エポキシ化合物は、少なくとも多官能エポキシ化合物を含むことが好ましく、多官能エポキシ化合物と単官能エポキシ化合物とを組み合わせて含んでいてもよい。エポキシ化合物は、骨格の種類に応じて、芳香環骨格を有するエポキシ化合物、脂肪族エポキシ化合物、及び脂環式エポキシ化合物に大別することができる。 In this specification, a compound having an epoxy group refers to a compound having at least one epoxy group in its molecule, and is also referred to as an epoxy compound. Examples include monofunctional epoxy compounds having one epoxy group and polyfunctional epoxy compounds having two or more epoxy groups. In this embodiment, the epoxy compound preferably contains at least a polyfunctional epoxy compound, and may contain a combination of a polyfunctional epoxy compound and a monofunctional epoxy compound. Epoxy compounds can be broadly classified according to the type of skeleton into epoxy compounds having an aromatic ring skeleton, aliphatic epoxy compounds, and alicyclic epoxy compounds.
本明細書中において、オキセタニル基を有する化合物は、分子内にオキセタン環(例えば、3-オキセタニル基)を少なくとも1つ有する化合物であり、オキセタン化合物とも称する。ある実施形態において、オキセタン化合物は、分子内にオキセタニル基を1~6個有することが好ましく、分子内にオキセタニル基を1~2個有することがより好ましい。 In this specification, a compound having an oxetanyl group is a compound having at least one oxetane ring (e.g., a 3-oxetanyl group) in the molecule, and is also referred to as an oxetane compound. In certain embodiments, the oxetane compound preferably has 1 to 6 oxetanyl groups in the molecule, and more preferably has 1 to 2 oxetanyl groups in the molecule.
本明細書中において、ビニルエーテル基を有する化合物は、分子内にビニルエーテル基を少なくとも1つ有する化合物である。 In this specification, a compound having a vinyl ether group is a compound having at least one vinyl ether group in the molecule.
カチオン重合性化合物の具体例としては、テトラ(ヒドロフェニル)アルカンのグリシジルエーテル、テトラヒドロキシベンゾフェノンのグリシジルエーテル、エポキシ化ポリビニルフェノール、p-tert-ブチルフェニルグリシジルエーテル、エチレングリコールジグリシジルエーテル、ジエチレングリコールジグリシジルエーテル、プロピレングリコールジグリシジルエーテル、1,4-ブタンジオールジグリシジルエーテル、ネオペンチルグリコールジグリシジルエーテル、1,6-ヘキサンジオールジグリシジルエーテル、グリセリンジグリシジルエーテル、トリメチロールプロパントリグリシジルエーテル、ポリエチレングリコールジグリシジルエーテル、水素化ビスフェノールAジグリシジルエーテル、n-ブチルグリシジルエーテル、2-エチルヘキシルグリシジルエーテル、1,2-エポキシテトラデカン、3,4-エポキシシクロヘキシルメチル-3,4-エポキシシクロヘキサンカルボキシレート、3,4-エポキシ-1-メチルシクロヘキシル-3,4-エポキシ-1-メチルヘキサンカルボキシレート、6-メチル-3,4-エポキシシクロヘキシルメチル-6-メチル-3,4-エポキシシクロヘキサンカルボキシレート、3,4-エポキシ-3-メチルシクロヘキシルメチル-3,4-エポキシ-3-メチルシクロヘキサンカルボキシレート、3,4-エポキシ-5-メチルシクロヘキシルメチル-3,4-エポキシ-5-メチルシクロヘキサンカルボキシレート、ビス(3,4-エポキシシクロヘキシルメチル)アジペート、3,4-エポキシ-6-メチルシクロヘキサンカルボキシレート、メチレンビス(3,4-エポキシシクロヘキサン)、プロパン-2,2-ジイル-ビス(3,4-エポキシシクロヘキサン)、2,2-ビス(3,4-エポキシシクロヘキシル)プロパン、ジシクロペンタジエンジエポキサイド、エチレンビス(3,4-エポキシシクロヘキサンカルボキシレート)、リモネンジオキシド(1,2:8,9-ジエポキシリモネン)、(3,3’,4,4’-ジエポキシ)ビシクロヘキシル、エポキシヘキサヒドロフタル酸ジオクチル、エポキシヘキサヒドロフタル酸ジ-2-エチルヘキシル、1-エポキシエチル-3,4-エポキシシクロヘキサン、1,2-エポキシ-2-エポキシエチルシクロヘキサン、1、2-エポキシ-4-ビニルシクロヘキサン、α-ピネンオキシド、2,2-ビス(ヒドロキシメチル)-1-ブタノールの1,2-エポキシ-4-(2-オキシラニル)シクロヘキサン付加物、エポキシ化ポリブタジエン、スチレンブタジエンコポリマーの二重結合の一部又は全てがエポキシ化された化合物、ビス[1-エチル(3-オキセタニル)]メチルエーテル(別名として、(3-エチル-3{[(3-エチルオキセタン-3-イル)メトキシ]メチル}オキセタン))、キシリレンビスオキセタン、4,4’-ビス[3-エチル-(3-オキセタニル)メトキシメチル]ビフェニル、1,4-ビス(3-エチル-3-オキセタニルメトキシ)メチルベンゼン、(ビス[(3-エチル-3-オキセタニル)メチル]イソフタレート)、3-エチル-3-ヒドロキシメチルオキセタン、2-エチルヘキシルオキセタン、(3-エチルオキセタン-3-イル)メタクリル酸メチル、3-エチル-3-[(2-エチルヘキシルオキシ)メチル]オキセタン、3-エチル-3-(4-ヒドロキシブチル)オキシメチルオキセタン、3-エチル-3-フェノキシメチルオキセタン、オキセタニルシルセスキオキセタン、3-エチル-3{[(3-エチルオキセタン-3-イル)メトキシ]メチル}オキセタン、フェノールノボラックオキセタン、1,4-ブタンジオールジビニエーテル、ジエチレングリコールジビニルエーテル、トリエチレングリコールジビニルエーテル、テトラエチレングリコールジビニルエーテル、ノルマルプロピルビニルエーテル、イソプロピルビニルエーテル、ノルマルブチルビニルエーテル、イソブチルビニルエーテル、2-エチルヘキシルビニルエーテル、シクロヘキシルビニルエーテル、2-ヒドロキシエチルビニルエーテル、ジエチレングリコールモノビニルエーテル,4-ヒドロキシブチルビニルエーテル、アクリル酸2-(2-ビニロキシエトキシ)エチル、メタクリル酸2-(2-ビニロキシエトキシ)エチル、1,4-シクロヘキサンジメタノールモノビニルエーテル、1,4-シクロヘキサンジメタノールジビニルエーテル等が挙げられるが、これらに限定されない。 Specific examples of cationic polymerizable compounds include glycidyl ethers of tetra(hydrophenyl)alkanes, glycidyl ethers of tetrahydroxybenzophenone, epoxidized polyvinylphenol, p-tert-butylphenyl glycidyl ether, ethylene glycol diglycidyl ether, diethylene glycol diglycidyl ether, propylene glycol diglycidyl ether, 1,4-butanediol diglycidyl ether, neopentyl glycol diglycidyl ether, 1,6-hexanediol diglycidyl ether, glycerin diglycidyl ether, trimethylolpropane triglycidyl ether, polyethylene glycol diglycidyl ether, hydrogenated bisphenol A diglycidyl ether, n-butyl glycidyl ether, 2-ethylhexyl glycidyl ether, 1,2-epoxytetradecane, 3,4-epoxycyclohexylmethyl-3,4-epoxycyclohexanecarboxylate, 3,4-epoxy-1-methylcyclohexyl-3,4-epoxy-1-methylhexanecarboxylate, 6-methyl -3,4-epoxycyclohexylmethyl-6-methyl-3,4-epoxycyclohexanecarboxylate, 3,4-epoxy-3-methylcyclohexylmethyl-3,4-epoxy-3-methylcyclohexanecarboxylate, 3,4-epoxy-5-methylcyclohexylmethyl-3,4-epoxy-5-methylcyclohexanecarboxylate, bis(3,4-epoxycyclohexylmethyl)adipate, 3,4-epoxy-6-methylcyclohexanecarboxylate, methylenebis(3,4-epoxycyclohexylmethyl)adipate 2,2-bis(3,4-epoxycyclohexane), propane-2,2-diyl-bis(3,4-epoxycyclohexane), 2,2-bis(3,4-epoxycyclohexyl)propane, dicyclopentadiene diepoxide, ethylene bis(3,4-epoxycyclohexanecarboxylate), limonene dioxide (1,2:8,9-diepoxylimonene), (3,3',4,4'-diepoxy)bicyclohexyl, dioctyl epoxyhexahydrophthalate, di-2-ethylhexyl epoxyhexahydrophthalate, 1-epoxyethyl-3,4-epoxy Cyclohexane, 1,2-epoxy-2-epoxyethylcyclohexane, 1,2-epoxy-4-vinylcyclohexane, α-pinene oxide, 1,2-epoxy-4-(2-oxiranyl)cyclohexane adduct of 2,2-bis(hydroxymethyl)-1-butanol, epoxidized polybutadiene, compounds in which some or all of the double bonds of styrene-butadiene copolymers have been epoxidized, bis[1-ethyl(3-oxetanyl)]methyl ether (also known as (3-ethyl-3[(3-ethyloxetan-3-yl) ) methoxy] methyl} oxetane), xylylene bisoxetane, 4,4'-bis[3-ethyl-(3-oxetanyl) methoxymethyl] biphenyl, 1,4-bis(3-ethyl-3-oxetanylmethoxy) methylbenzene, (bis[(3-ethyl-3-oxetanyl) methyl] isophthalate), 3-ethyl-3-hydroxymethyl oxetane, 2-ethylhexyl oxetane, (3-ethyloxetan-3-yl) methyl methacrylate, 3-ethyl-3-[(2-ethylhexyloxy) methyl] oxetane, 3-ethyl Examples of vinyl ethers include, but are not limited to, ethyl-3-(4-hydroxybutyl)oxymethyloxetane, 3-ethyl-3-phenoxymethyloxetane, oxetanylsilsesquioxetane, 3-ethyl-3{[(3-ethyloxetan-3-yl)methoxy]methyl}oxetane, phenol novolac oxetane, 1,4-butanediol divinyl ether, diethylene glycol divinyl ether, triethylene glycol divinyl ether, tetraethylene glycol divinyl ether, normal propyl vinyl ether, isopropyl vinyl ether, normal butyl vinyl ether, isobutyl vinyl ether, 2-ethylhexyl vinyl ether, cyclohexyl vinyl ether, 2-hydroxyethyl vinyl ether, diethylene glycol monovinyl ether, 4-hydroxybutyl vinyl ether, 2-(2-vinyloxyethoxy)ethyl acrylate, 2-(2-vinyloxyethoxy)ethyl methacrylate, 1,4-cyclohexanedimethanol monovinyl ether, and 1,4-cyclohexanedimethanol divinyl ether.
カチオン重合性化合物の市販品としては、DIC株式会社製のEPICLON(登録商標)850、850-S、EXA-850CRP、EXA-8067;旭化成株式会社製のAER9000;株式会社ADEKA製のEP-4000S、EP-4003S、EP-4010S;DIC株式会社製のEPICLON(登録商標)830-S、EXA-830LVP、EXA―835LV;DIC株式会社製のEPICLON(登録商標)HP-4032D、HP-720H;DIC株式会社製のEPICLON(登録商標)N-740、N-770;DIC株式会社製のEPICLON(登録商標)N-660、N-670、N-655-EXP-S;株式会社ADEKA製のアデカグリシロール(登録商標)ED-509E、ED-509S;三光株式会社製のOPP-G;共栄社化学株式会社製のエポライト100MF;旭化成株式会社製のAER-9000;三菱ケミカル株式会社製のjER YX7400N;三菱ケミカル株式会社製のjER YX8000;株式会社ダイセル製のセロキサイド(登録商標)2021P;株式会社ダイセル製のセロキサイド(登録商標)8010;株式会社ダイセル製のEHPE3150;株式会社ダイセル製のEPOLEAD PB;株式会社ダイセル製のEPOFRIEND;四国化成工業株式会社製のHiREM-1、HiREM-2;東亞合成株式会社製のOXT-191;東亞合成株式会社製のOXT-221;東亞合成株式会社製のPHOX等が挙げられるが、これらに限定されない。 Commercially available cationic polymerizable compounds include EPICLON (registered trademark) 850, 850-S, EXA-850CRP, and EXA-8067 manufactured by DIC Corporation; AER9000 manufactured by Asahi Kasei Corporation; EP-4000S, EP-4003S, and EP-4010S manufactured by ADEKA Corporation; and EPICLON (registered trademark) 830-S and EXA-830 manufactured by DIC Corporation. LVP, EXA-835LV; EPICLON (registered trademark) HP-4032D, HP-720H manufactured by DIC Corporation; EPICLON (registered trademark) N-740, N-770 manufactured by DIC Corporation; EPICLON (registered trademark) N-660, N-670, N-655-EXP-S manufactured by DIC Corporation; ADEKA GLYCILOR (registered trademark) ED-5 manufactured by ADEKA Corporation 09E, ED-509S; OPP-G manufactured by Sanko Co., Ltd.; Epolite 100MF manufactured by Kyoeisha Chemical Co., Ltd.; AER-9000 manufactured by Asahi Kasei Corporation; jER YX7400N manufactured by Mitsubishi Chemical Corporation; jER YX8000 manufactured by Mitsubishi Chemical Corporation; CELLOXIDE (registered trademark) 2021P manufactured by Daicel Corporation; CELLOXIDE (registered trademark) 8010 manufactured by Daicel Corporation; EHPE3150 manufactured by Daicel Corporation; EPOLEAD PB manufactured by Daicel Corporation; EPOFRIEND manufactured by Daicel Corporation; HiREM-1, HiREM-2 manufactured by Shikoku Chemicals Corporation; OXT-191 manufactured by Toagosei Co., Ltd.; OXT-221 manufactured by Toagosei Co., Ltd.; PHOX manufactured by Toagosei Co., Ltd., and the like, but are not limited to these.
カチオン重合性化合物は、いずれか1種を用いてもよいし、2種以上を併用してもよい。 Any one of the cationically polymerizable compounds may be used, or two or more may be used in combination.
カチオン重合性化合物のカチオン重合性基当量は90~1000g/eqであることが好ましく、120~800g/eqであることがより好ましく、150~500g/eqであることがさらに好ましい。 The cationic polymerizable group equivalent of the cationic polymerizable compound is preferably 90 to 1000 g/eq, more preferably 120 to 800 g/eq, and even more preferably 150 to 500 g/eq.
成分(A)は、0.001~100Pa・sの粘度を有していることが、重合性組成物の調製及びディスペンス性の観点から、好ましい。なお、本明細書中において、粘度は、粘度域に応じて適切な粘度計を用いて、25℃の測定温度で測定した値をいう。 From the viewpoint of preparation and dispensability of the polymerizable composition, it is preferable that component (A) have a viscosity of 0.001 to 100 Pa·s. Note that, in this specification, viscosity refers to a value measured at a measurement temperature of 25°C using a viscometer appropriate for the viscosity range.
成分(A)の含有量は、重合性組成物の接着強度の観点から、重合性組成物の総質量に対し10~95質量%であることが好ましく、20~90質量%であることがより好ましい。 From the viewpoint of the adhesive strength of the polymerizable composition, the content of component (A) is preferably 10 to 95 mass %, and more preferably 20 to 90 mass %, relative to the total mass of the polymerizable composition.
(B)酸発生剤
本態様の重合性組成物は、(B)酸発生剤(以下、「成分(B)」とも言う)を含む。本明細書において、酸発生剤は、光又は熱により活性種として酸を発生させ、カチオン重合性化合物の重合を進行させる。酸発生剤としては、BF4
-、SbF6-、AsF6
-、B(C6F5)4
-、Ga(C6F5)4
-、C(CF3SO2)3
-、[P(R1)aF6-a]-、[C(R1SO2)3]-、又は[N(R1SO2)2]-(式中、R1は、それぞれ独立して、水素原子の少なくとも一部がフッ素原子で置換されているアルキル基であり、aは0~5の整数であり、aが2以上の整数である場合、複数存在するR1は、互いに同一でもよく異なっていてもよい。)等を対アニオンとし、ヨードニウムカチオン、スルホニウムカチオン、アンモニウムカチオン、及びホスホニウムカチオン等をカチオン部とする、種々のオニウム塩が挙げられる。
The polymerizable composition of this embodiment contains (B) an acid generator (hereinafter also referred to as "component (B)"). In this specification, the acid generator generates an acid as an active species by exposure to light or heat, thereby promoting polymerization of the cationically polymerizable compound. Examples of the acid generator include various onium salts having a counter anion such as BF 4 − , SbF 6 − , AsF 6 − , B(C 6 F 5 ) 4 − , Ga(C 6 F 5 ) 4 − , C(CF 3 SO 2 ) 3 − , [P(R 1 ) a F 6-a ] − , [C(R 1 SO 2 ) 3 ] − , or [N(R 1 SO 2 ) 2 ] − ( wherein R 1 is each independently an alkyl group in which at least a portion of the hydrogen atoms is substituted with a fluorine atom, a is an integer of 0 to 5, and when a is an integer of 2 or greater, multiple R 1s may be the same or different), and an iodonium cation, sulfonium cation, ammonium cation, phosphonium cation, or the like as the cation moiety.
ヨードニウムカチオンとしては、例えば、ジフェニルヨードニウム、ジ-p-トリルヨードニウム、ビス(4-ドデシルフェニル)ヨードニウム、ビス(4-メトキシフェニル)ヨードニウム、(4-オクチルオキシフェニル)フェニルヨードニウム、ビス(4-デシルオキシ)フェニルヨードニウム、4-(2-ヒドロキシテトラデシルオキシ)フェニルフェニルヨードニウム、4-イソプロピルフェニル(p-トリル)ヨードニウム及び4-イソブチルフェニル(p-トリル)ヨードニウム等のヨードニウムイオン等が挙げられる。 Examples of iodonium cations include iodonium ions such as diphenyliodonium, di-p-tolyliodonium, bis(4-dodecylphenyl)iodonium, bis(4-methoxyphenyl)iodonium, (4-octyloxyphenyl)phenyliodonium, bis(4-decyloxy)phenyliodonium, 4-(2-hydroxytetradecyloxy)phenylphenyliodonium, 4-isopropylphenyl(p-tolyl)iodonium, and 4-isobutylphenyl(p-tolyl)iodonium.
スルホニウムイオンとしては、例えば、
トリフェニルスルホニウム、トリ-p-トリルスルホニウム、トリ-o-トリルスルホニウム、トリス(4-メトキシフェニル)スルホニウム、1-ナフチルジフェニルスルホニウム、2-ナフチルジフェニルスルホニウム、トリス(4-フルオロフェニル)スルホニウム、トリ-1-ナフチルスルホニウム、トリ-2-ナフチルスルホニウム、トリス(4-ヒドロキシフェニル)スルホニウム、4-(フェニルチオ)フェニルジフェニルスルホニウム、4-(p-トリルチオ)フェニルジ-p-トリルスルホニウム、4-(4-メトキシフェニルチオ)フェニルビス(4-メトキシフェニル)スルホニウム、4-(フェニルチオ)フェニルビス(4-フルオロフェニル)スルホニウム、4-(フェニルチオ)フェニルビス(4-メトキシフェニル)スルホニウム、4-(フェニルチオ)フェニルジ-p-トリルスルホニウム、[4-(4-ビフェニリルチオ)フェニル]-4-ビフェニリルフェニルスルホニウム、[4-(2-チオキサントニルチオ)フェニル]ジフェニルスルホニウム、ビス[4-(ジフェニルスルホニオ)フェニル]スルフィド、ビス〔4-{ビス[4-(2-ヒドロキシエトキシ)フェニル]スルホニオ}フェニル〕スルフィド、ビス{4-[ビス(4-フルオロフェニル)スルホニオ]フェニル}スルフィド、ビス{4-[ビス(4-メチルフェニル)スルホニオ]フェニル}スルフィド、ビス{4-[ビス(4-メトキシフェニル)スルホニオ] フェニル}スルフィド、4-(4-ベンゾイル-2-クロロフェニルチオ)フェニルビス(4-フルオロフェニル)スルホニウム、4-(4-ベンゾイル-2-クロロフェニルチオ)フェニルジフェニルスルホニウム、4-(4-ベンゾイルフェニルチオ)フェニルビス(4-フルオロフェニル)スルホニウム、4-(4-ベンゾイルフェニルチオ)フェニルジフェニルスルホニウム、7-イソプロピル-9-オキソ-10-チア-9,10-ジヒドロアントラセン-2-イルジ-p-トリルスルホニウム、7-イソプロピル-9-オキソ-10-チア-9,10-ジヒドロアントラセン-2-イルジフェニルスルホニウム、2-[(ジ-p-トリル)スルホニオ]チオキサントン、2-[(ジフェニル)スルホニオ]チオキサントン、4-(9-オキソ-9H-チオキサンテン-2-イル)チオフェニル-9-オキソ-9H-チオキサンテン-2-イルフェニルスルホニウム、4-[4-(4-t-ブチルベンゾイル)フェニルチオ]フェニルジ-p-トリルスルホニウム、4-[4-(4-t-ブチルベンゾイル)フェニルチオ]フェニルジフェニルスルホニウム、4-[4-(ベンゾイルフェニルチオ)]フェニルジ-p-トリルスルホニウム、4-[4-(ベンゾイルフェニルチオ)]フェニルジフェニルスルホニウム、5-(4-メトキシフェニル)チアアンスレニウム、5-フェニルチアアンスレニウム、5-トリルチアアンスレニウム、5-(4-エトキシフェニル)チアアンスレニウム及び5-(2,4,6-トリメチルフェニル)チアアンスレニウム等のトリアリールスルホニウム、
ジフェニルフェナシルスルホニウム、ジフェニル4-ニトロフェナシルスルホニウム、ジフェニルベンジルスルホニウム及びジフェニルメチルスルホニウム等のジアリールスルホニウム、
フェニルメチルベンジルスルホニウム、4-ヒドロキシフェニルメチルベンジルスルホニウム、4-メトキシフェニルメチルベンジルスルホニウム、4-アセトカルボニルオキシフェニルメチルベンジルスルホニウム、4-ヒドロキシフェニル(2-ナフチルメチル)メチルスルホニウム、2-ナフチルメチルベンジルスルホニウム、2-ナフチルメチル(1-エトキシカルボニル)エチルスルホニウム、フェニルメチルフェナシルスルホニウム、4-ヒドロキシフェニルメチルフェナシルスルホニウム、4-メトキシフェニルメチルフェナシルスルホニウム、4-アセトカルボニルオキシフェニルメチルフェナシルスルホニウム、2-ナフチルメチルフェナシルスルホニウム、2-ナフチルオクタデシルフェナシルスルホニウム及び9-アントラセニルメチルフェナシルスルホニウム等のモノアリールスルホニウム、
ジメチルフェナシルスルホニウム、フェナシルテトラヒドロチオフェニウム、ジメチルベンジルスルホニウム、ベンジルテトラヒドロチオフェニウム及びオクタデシルメチルフェナシルスルホニウム等のトリアルキルスルホニウム等が挙げられる。
Examples of sulfonium ions include:
triphenylsulfonium, tri-p-tolylsulfonium, tri-o-tolylsulfonium, tris(4-methoxyphenyl)sulfonium, 1-naphthyldiphenylsulfonium, 2-naphthyldiphenylsulfonium, tris(4-fluorophenyl)sulfonium, tri-1-naphthylsulfonium, tri-2-naphthylsulfonium, tris(4-hydroxyphenyl)sulfonium, 4-(phenylthio)phenyldiphenylsulfonium, 4-(p-tolylthio)phenyldi-p-tolylsulfonium, 4-(4-methoxyphenylthio)phenylbis(4-methoxyphenyl)sulfonium, 4-(phenylthio)phenylbis(4-fluorophenyl)sulfonium, 4-(phenylthio)phenylbis(4-methoxyphenyl)sulfonium, 4-(phenylthio)phenyldi-p-tolylsulfonium, [4-(4-biphenylylthio)phenyl]-4-biphenylylphenylsulfonium, [4-(2-thioxanthonylthio)phenyl]diphenylsulfonium, bis[4-(diphenylsulfonio)phenyl]sulfide, bis[4-{bis[4-(2-hydroxyethoxy)phenyl]sulfonio}phenyl]sulfide, bis{4-[bis(4-fluorophenyl)sulfonio]phenyl}sulfide, bis{4-[bis(4-methylphenyl)sulfonio]phenyl}sulfide, bis{4-[bis(4-methoxyphenyl)sulfonio] phenyl} sulfide, 4-(4-benzoyl-2-chlorophenylthio)phenylbis(4-fluorophenyl)sulfonium, 4-(4-benzoyl-2-chlorophenylthio)phenyldiphenylsulfonium, 4-(4-benzoylphenylthio)phenylbis(4-fluorophenyl)sulfonium, 4-(4-benzoylphenylthio)phenyldiphenylsulfonium, 7-isopropyl-9-oxo-10-thia-9,10-dihydroanthracen-2-yldi-p-tolylsulfonium, 7-isopropyl-9-oxo-10-thia-9,10-dihydroanthracen-2-yldiphenylsulfonium, 2-[(di-p-tolyl)sulfonio]thioxanthone, 2-[(diphenyl)sulfonio]thioxanthone, 4-(9-oxo triarylsulfonium compounds such as so-9H-thioxanthen-2-yl)thiophenyl-9-oxo-9H-thioxanthen-2-ylphenylsulfonium, 4-[4-(4-t-butylbenzoyl)phenylthio]phenyldi-p-tolylsulfonium, 4-[4-(4-t-butylbenzoyl)phenylthio]phenyldiphenylsulfonium, 4-[4-(benzoylphenylthio)]phenyldi-p-tolylsulfonium, 4-[4-(benzoylphenylthio)]phenyldiphenylsulfonium, 5-(4-methoxyphenyl)thiaanthrenenium, 5-phenylthiaanthrenenium, 5-tolylthiaanthrenenium, 5-(4-ethoxyphenyl)thiaanthrenenium and 5-(2,4,6-trimethylphenyl)thiaanthrenenium;
diarylsulfonium such as diphenylphenacylsulfonium, diphenyl 4-nitrophenacylsulfonium, diphenylbenzylsulfonium and diphenylmethylsulfonium;
monoarylsulfonium compounds such as phenylmethylbenzylsulfonium, 4-hydroxyphenylmethylbenzylsulfonium, 4-methoxyphenylmethylbenzylsulfonium, 4-acetocarbonyloxyphenylmethylbenzylsulfonium, 4-hydroxyphenyl(2-naphthylmethyl)methylsulfonium, 2-naphthylmethylbenzylsulfonium, 2-naphthylmethyl(1-ethoxycarbonyl)ethylsulfonium, phenylmethylphenacylsulfonium, 4-hydroxyphenylmethylphenacylsulfonium, 4-methoxyphenylmethylphenacylsulfonium, 4-acetocarbonyloxyphenylmethylphenacylsulfonium, 2-naphthylmethylphenacylsulfonium, 2-naphthyloctadecylphenacylsulfonium, and 9-anthracenylmethylphenacylsulfonium;
Examples thereof include trialkylsulfonium such as dimethylphenacylsulfonium, phenacyltetrahydrothiophenium, dimethylbenzylsulfonium, benzyltetrahydrothiophenium, and octadecylmethylphenacylsulfonium.
アンモニウムカチオンとしては、例えば、N,N-ジメチルピロリジニウム、N-エチル-N-メチルピロリジニウム及びN,N-ジエチルピロリジニウム等のピロリジニウム、N,N’-ジメチルイミダゾリニウム、N,N’-ジエチルイミダゾリニウム、N-エチル-N’-メチルイミダゾリニウム、1,3,4-トリメチルイミダゾリニウム及び1,2,3,4-テトラメチルイミダゾリニウム等のイミダゾリニウム、N,N’-ジメチルテトラヒドロピリミジニウム等のテトラヒドロピリミジニウム、N,N’-ジメチルモルホリニウム等のモルホリニウム、N,N’-ジエチルピペリジニウム等のピペリジニウム、N-メチルピリジニウム、N-ベンジルピリジニウム及びN-フェナシルピリジウム等のピリジニウム、N,N’-ジメチルイミダゾリウム等のイミダゾリウム、N-メチルキノリウム、N-ベンジルキノリウム及びN-フェナシルキノリウム等のキノリウム、N-メチルイソキノリウム等のイソキノリウム、ベンジルベンゾチアゾニウム及びフェナシルベンゾチアゾニウム等のチアゾニウム、ベンジルアクリジウム及びフェナシルアクリジウム等のアクリジウム等が挙げられる。 Examples of ammonium cations include pyrrolidiniums such as N,N-dimethylpyrrolidinium, N-ethyl-N-methylpyrrolidinium, and N,N-diethylpyrrolidinium; imidazoliniums such as N,N'-dimethylimidazolinium, N,N'-diethylimidazolinium, N-ethyl-N'-methylimidazolinium, 1,3,4-trimethylimidazolinium, and 1,2,3,4-tetramethylimidazolinium; tetrahydropyrimidiniums such as N,N'-dimethyltetrahydropyrimidinium; and morpholiniums such as N,N'-dimethylmorpholinium. Examples include sulfolinium, piperidinium such as N,N'-diethylpiperidinium, pyridinium such as N-methylpyridinium, N-benzylpyridinium, and N-phenacylpyridinium, imidazolium such as N,N'-dimethylimidazolium, quinolium such as N-methylquinolium, N-benzylquinolium, and N-phenacylquinolium, isoquinolium such as N-methylisoquinolium, thiazonium such as benzylbenzothiazonium and phenacylbenzothiazonium, and acridium such as benzylacridium and phenacylacridium.
ホスホニウムカチオンとしては、例えば、テトラフェニルホスホニウム、テトラ-p-トリルホスホニウム、テトラキス(2-メトキシフェニル)ホスホニウム、テトラキス(3-メトキシフェニル)ホスホニウム及びテトラキス(4-メトキシフェニル)ホスホニウム等のテトラアリールホスホニウム、トリフェニルベンジルホスホニウム、トリフェニルフェナシルホスホニウム、トリフェニルメチルホスホニウム及びトリフェニルブチルホスホニウム等のトリアリールホスホニウム、トリエチルベンジルホスホニウム、トリブチルベンジルホスホニウム、テトラエチルホスホニウム、テトラブチルホスホニウム、テトラヘキシルホスホニウム、トリエチルフェナシルホスホニウム及びトリブチルフェナシルホスホニウム等のテトラアルキルホスホニウム等が挙げられる。 Examples of phosphonium cations include tetraarylphosphoniums such as tetraphenylphosphonium, tetra-p-tolylphosphonium, tetrakis(2-methoxyphenyl)phosphonium, tetrakis(3-methoxyphenyl)phosphonium, and tetrakis(4-methoxyphenyl)phosphonium; triarylphosphoniums such as triphenylbenzylphosphonium, triphenylphenacylphosphonium, triphenylmethylphosphonium, and triphenylbutylphosphonium; and tetraalkylphosphoniums such as triethylbenzylphosphonium, tributylbenzylphosphonium, tetraethylphosphonium, tetrabutylphosphonium, tetrahexylphosphonium, triethylphenacylphosphonium, and tributylphenacylphosphonium.
ヨードニウム塩系酸発生剤の具体例としては、
ジフェニルヨードニウム・ヘキサフルオロアルセネート、ジ(4-クロロフェニル)ヨードニウム・ヘキサフルオロアルセネート、ジ(4-ブロムフェニル)ヨードニウム・ヘキサフルオロアルセネート、フェニル(4-メトキシフェニル)ヨードニウム・ヘキサフルオロアルセネート等のアルセネート系ヨードニウム塩である光酸発生剤;
4-メチルフェニル-4-(1-メチルエチル)フェニルヨードニウム・ヘキサフルオロホスフェート、4-メチルフェニル-4-(1-メチルエチル)フェニルヨードニウム・トリ(ペンタフルオロエチル)トリフルオロホスフェート(例えば、サンアプロ株式会社製のIK-1)、4-メチルフェニル-4-(2-メチルプロピル)フェニルヨードニウム・ヘキサフルオロホスフェート(例えば、BASF社製のIRGACURE(登録商標)250)、ビス(C10~14-アルキルフェニル)ヨードニウム・ヘキサフルオロホスフェート(例えば、富士フイルム和光純薬株式会社製のWPI-113)等のホスフェート系ヨードニウム塩である光酸発生剤(ここで、サンアプロ株式会社製のIK-1は、熱酸発生剤としても使用可能である。);
4-メチルフェニル-4-(1-メチルエチル)フェニルヨードニウム・ヘキサフルオロアンチモネート(例えば、富士フイルム和光純薬株式会社製のWPI-116等)等のアンチモネート系ヨードニウム塩である光酸発生剤;
IK-1FG(サンアプロ株式会社製)等のガレート系ヨードニウム塩である光酸発生剤(ここで、IK-1FGは、熱酸発生剤としても使用可能である。);
4-メチルフェニル-4-(1-メチルエチル)フェニルヨードニウム・テトラキス(ペンタフルオロフェニル)ボレート、4-イソプロピル-4’-メチルジフェニルヨードニウムテトラキス(ペンタフルオロフェニル)ボレート(例えば、ELKEM SILICONES社製のBLUESIL(登録商標)PI 2074等)等のボレート系ヨードニウム塩である光酸発生剤
等が挙げられるが、これらに限定されない。
Specific examples of iodonium salt acid generators include:
photoacid generators which are arsenate-based iodonium salts such as diphenyliodonium hexafluoroarsenate, di(4-chlorophenyl)iodonium hexafluoroarsenate, di(4-bromophenyl)iodonium hexafluoroarsenate, and phenyl(4-methoxyphenyl)iodonium hexafluoroarsenate;
photoacid generators which are phosphate-based iodonium salts, such as 4-methylphenyl-4-(1-methylethyl)phenyliodonium hexafluorophosphate, 4-methylphenyl-4-(1-methylethyl)phenyliodonium tri(pentafluoroethyl)trifluorophosphate (e.g., IK-1 manufactured by San-Apro Ltd.), 4-methylphenyl-4-(2-methylpropyl)phenyliodonium hexafluorophosphate (e.g., IRGACURE (registered trademark) 250 manufactured by BASF), and bis(C 10-14 -alkylphenyl)iodonium hexafluorophosphate (e.g., WPI-113 manufactured by Fujifilm Wako Pure Chemical Industries, Ltd.) (here, IK-1 manufactured by San-Apro Ltd. can also be used as a thermal acid generator);
Photoacid generators which are antimonate-based iodonium salts such as 4-methylphenyl-4-(1-methylethyl)phenyliodonium hexafluoroantimonate (for example, WPI-116 manufactured by Fujifilm Wako Pure Chemical Industries, Ltd.);
a photoacid generator which is a gallate-based iodonium salt such as IK-1FG (manufactured by San-Apro Co., Ltd.) (wherein IK-1FG can also be used as a thermal acid generator);
Examples of photoacid generators include, but are not limited to, borate-based iodonium salts such as 4-methylphenyl-4-(1-methylethyl)phenyliodonium tetrakis(pentafluorophenyl)borate and 4-isopropyl-4′-methyldiphenyliodonium tetrakis(pentafluorophenyl)borate (e.g., BLUESIL (registered trademark) PI 2074 manufactured by ELKEM SILICONES).
スルホニウム塩系酸発生剤の具体例としては、ボレート系スルホニウム塩である光酸発生剤(サンアプロ株式会社製の品名:CPI-110B、CPI-310B、CPI-410B等)、ホスフェート系スルホニウム塩である光酸発生剤(サンアプロ株式会社製の品名:CPI-210S、VC-1S、CPI-410S等)、ホスフェート系スルホニウム塩である熱酸発生剤(サンアプロ株式会社製の品名:TA-100等)、ガレート系スルホニウム塩である光酸発生剤(サンアプロ株式会社製の品名:CPI-310FG、VC-1FG等)、ガレート系スルホニウム塩である熱酸発生剤(サンアプロ株式会社製の品名:TA-100FG等)等が挙げられるが、これらに限定されない。 Specific examples of sulfonium salt acid generators include, but are not limited to, borate-based sulfonium salt photoacid generators (products manufactured by San-Apro Ltd. such as CPI-110B, CPI-310B, and CPI-410B), phosphate-based sulfonium salt photoacid generators (products manufactured by San-Apro Ltd. such as CPI-210S, VC-1S, and CPI-410S), phosphate-based sulfonium salt thermal acid generators (products manufactured by San-Apro Ltd. such as TA-100), gallate-based sulfonium salt photoacid generators (products manufactured by San-Apro Ltd. such as CPI-310FG and VC-1FG), and gallate-based sulfonium salt thermal acid generators (products manufactured by San-Apro Ltd. such as TA-100FG).
アンモニウム塩酸発生剤の具体例としては、ボレート系第4級アンモニウム塩である熱酸発生剤(King Industries, Inc.製の品名:CXC-1821等)等が挙げられるが、これらに限定されない。 Specific examples of ammonium hydrochloric acid generators include, but are not limited to, thermal acid generators that are borate-based quaternary ammonium salts (e.g., product name: CXC-1821, manufactured by King Industries, Inc.).
本態様において、重合性組成物中の(B)酸発生剤の含有量は、重合性組成物の総質量に対して、0.1~10質量%であることが好ましく、0.3~8質量%であることがより好ましく、0.5~5質量%であることがさらに好ましい。重合性組成物中の(B)酸発生剤の含有量は、前記成分(A)の総質量に対して、0.1~30質量%であることが好ましく、0.5~20質量%であることがより好ましく、1~15質量%であることがさらに好ましい。 In this embodiment, the content of the acid generator (B) in the polymerizable composition is preferably 0.1 to 10% by mass, more preferably 0.3 to 8% by mass, and even more preferably 0.5 to 5% by mass, relative to the total mass of the polymerizable composition. The content of the acid generator (B) in the polymerizable composition is preferably 0.1 to 30% by mass, more preferably 0.5 to 20% by mass, and even more preferably 1 to 15% by mass, relative to the total mass of the component (A).
(C)変性ポリジメチルシロキサン
本態様の重合性組成物は、(C)変性ポリジメチルシロキサン(以下、「成分(C)」とも言う)を含む。本態様において、(C)変性ポリジメチルシロキサンは、以下の特徴(a)、(b)及び(c)の少なくとも1つを満たすものである。
(a)COOH基を含有する有機置換基が、ポリジメチルシロキサンと直接又はリンカーを介して結合している。
(b)OH基及び場合によりエーテル基を含有する有機置換基が、ポリジメチルシロキサンと直接又はリンカーを介して結合しており、有機置換基がエーテル基を含有する場合、該有機置換基中のポリエチレングリコール繰り返し単位数に対する、ポリプロピレングリコール繰り返し単位数の比が、0.3未満である。
(c)重クロロホルム中で測定した1H NMRスペクトルにおいて、0.3~-0.3ppm及び4.4~3.2ppmの範囲にシグナルを有し、1.25~0.95ppmの範囲にシグナルを有するかあるいは有さず、13~0ppmの範囲にD2O添加によって消失するシグナルを有し、かつ以下の式(1)より算出される数値が、0.3未満である。
式(1):[(1.25~0.95ppmの範囲のシグナルの積分値)/3]/{[(4.4~3.2ppmの範囲のシグナルの積分値)-(1.25~0.95ppmの範囲のシグナルの積分値)]/4}
(C) Modified Polydimethylsiloxane The polymerizable composition of this embodiment contains (C) a modified polydimethylsiloxane (hereinafter also referred to as "component (C)"). In this embodiment, the modified polydimethylsiloxane (C) satisfies at least one of the following characteristics (a), (b), and (c):
(a) An organic substituent containing a COOH group is bonded to polydimethylsiloxane directly or via a linker.
(b) An organic substituent containing an OH group and optionally an ether group is bonded to the polydimethylsiloxane directly or via a linker, and when the organic substituent contains an ether group, the ratio of the number of polypropylene glycol repeating units to the number of polyethylene glycol repeating units in the organic substituent is less than 0.3.
(c) In a 1 H NMR spectrum measured in deuterated chloroform, it has signals in the ranges of 0.3 to −0.3 ppm and 4.4 to 3.2 ppm, has or has no signal in the range of 1.25 to 0.95 ppm, has a signal in the range of 13 to 0 ppm that disappears upon addition of D 2 O, and the value calculated from the following formula (1) is less than 0.3.
Formula (1): [(integral value of signals in the range of 1.25 to 0.95 ppm)/3]/{[(integral value of signals in the range of 4.4 to 3.2 ppm)-(integral value of signals in the range of 1.25 to 0.95 ppm)]/4}
変性ポリジメチルシロキサンは、より具体的には、式:
で表されるジメチルシロキサン繰り返し単位からなるポリジメチルシロキサン主鎖の側鎖及び/又は末端に、直接又はアルキル基やアルキレン基等のリンカーを介して、変性基として有機置換基が導入された構造を有する。ここで、「ポリジメチルシロキサン主鎖の側鎖に有機置換基が導入された」とは、ポリジメチルシロキサン主鎖の一部のメチル基が有機置換基に置換されていることを意味する。「ポリジメチルシロキサン主鎖の末端に有機置換基が導入された」とは、ポリジメチルシロキサン主鎖の末端(例えば、メチル基又は-OSi(CH3)3)が有機置換基に置換されていることを意味する。変性ポリジメチルシロキサンの変性基の導入位置としては、側鎖、末端(片末端又は両末端)、側鎖と末端との両方のいずれであってもよい。また、変性ポリジメチルシロキサンには、ジェミニ構造のポリジメチルシロキサンも含まれる。変性ポリジメチルシロキサンの重合度(ジメチルシロキサン繰り返し単位の数)は特に限定されず、例えば、3以上であり、好ましくは5以上である。
More specifically, the modified polydimethylsiloxane is represented by the formula:
The modified polydimethylsiloxane has a structure in which an organic substituent is introduced as a modifying group into the side chain and/or terminal of a polydimethylsiloxane main chain consisting of dimethylsiloxane repeating units represented by the formula (I), either directly or via a linker such as an alkyl group or alkylene group. Here, "an organic substituent is introduced into the side chain of the polydimethylsiloxane main chain" means that some methyl groups in the polydimethylsiloxane main chain are substituted with organic substituents. "an organic substituent is introduced into the terminal of the polydimethylsiloxane main chain" means that the terminal of the polydimethylsiloxane main chain (e.g., a methyl group or -OSi( CH3 ) 3 ) is substituted with an organic substituent. The position at which the modifying group is introduced into the modified polydimethylsiloxane may be the side chain, the terminal (one terminal or both terminals), or both the side chain and the terminal. The modified polydimethylsiloxane also includes polydimethylsiloxanes with a gemini structure. The degree of polymerization of the modified polydimethylsiloxane (the number of dimethylsiloxane repeating units) is not particularly limited and is, for example, 3 or more, preferably 5 or more.
上記の特徴(a)に係る変性ポリジメチルシロキサンにおいて、有機置換基は、COOH基を含有する。 In the modified polydimethylsiloxane according to feature (a) above, the organic substituent contains a COOH group.
上記有機置換基がCOOH基を含む変性ポリジメチルシロキサンの例としては、カルボキシル変性ポリジメチルシロキサン又はカルボキシル変性シリコーンなどと呼ばれて市販されているものが挙げられる。そのような市販品の例としては、信越化学工業株式会社販売の製品名:X-22-3701E、X-22-162C、X-22-3710等が挙げられるが、これに限定されない。 Examples of modified polydimethylsiloxanes in which the organic substituents contain COOH groups include those commercially available under the names carboxyl-modified polydimethylsiloxane or carboxyl-modified silicone. Examples of such commercially available products include, but are not limited to, product names X-22-3701E, X-22-162C, and X-22-3710 sold by Shin-Etsu Chemical Co., Ltd.
変性ポリジメチルシロキサンの有機置換基がCOOH基を含むかどうかの確認は、変性ポリジメチルシロキサンのフーリエ変換赤外分光法(FT-IR)測定により、カルボン酸のC=O伸縮振動に由来する約1715cm-1のIRスペクトルの有無を観察することによっても、行うことができる。 Whether or not the organic substituent of the modified polydimethylsiloxane contains a COOH group can also be confirmed by measuring the modified polydimethylsiloxane by Fourier transform infrared spectroscopy (FT-IR) and observing the presence or absence of an IR spectrum at about 1715 cm −1 derived from the C═O stretching vibration of carboxylic acid.
上記の特徴(b)に係る変性ポリジメチルシロキサンにおいて、有機置換基は、OH基及び場合によりエーテル基を含有し、有機置換基がエーテル基を含有する場合、該有機置換基中のポリエチレングリコール(PEG)繰り返し単位数に対する、ポリプロピレングリコール(PPG)繰り返し単位数の比が、0.3未満である。特徴(b)において、有機置換基に場合により含まれ得るエーテル基の例としては、ポリエチレングリコール基及びポリプロピレングリコール基が挙げられる。特徴(b)において、有機置換基がエーテル基を含有する場合、ポリエチレングリコール繰り返し単位数に対する、ポリプロピレングリコール繰り返し単位数の比は、0.1未満であることが好ましく、0.01未満であること(すなわち、有機置換基がポリプロピレングリコール繰り返し単位を実質的に含まないこと)がより好ましい。一実施形態において、ポリエチレングリコール繰り返し単位数に対する、ポリプロピレングリコール繰り返し単位数の比は、0であり得る。 In the modified polydimethylsiloxane according to feature (b) above, the organic substituent contains an OH group and optionally an ether group. When the organic substituent contains an ether group, the ratio of the number of polypropylene glycol (PPG) repeating units to the number of polyethylene glycol (PEG) repeating units in the organic substituent is less than 0.3. In feature (b), examples of ether groups that may be optionally contained in the organic substituent include polyethylene glycol groups and polypropylene glycol groups. In feature (b), when the organic substituent contains an ether group, the ratio of the number of polypropylene glycol repeating units to the number of polyethylene glycol repeating units is preferably less than 0.1, and more preferably less than 0.01 (i.e., the organic substituent is substantially free of polypropylene glycol repeating units). In one embodiment, the ratio of the number of polypropylene glycol repeating units to the number of polyethylene glycol repeating units may be 0.
上記有機置換基がOH基を含みかつエーテル基を含まない変性ポリジメチルシロキサンの例としては、カルビノール変性ポリジメチルシロキサン又はカルビノール変性シリコーンなどとよばれて市販されているものが挙げられる。そのようなものの市販品の例としては、信越化学工業株式会社販売の製品名:X-22-4039、X-22-4015、KF-6000、KF-6001、KF-6002、KF-6003、X-22-170BX、X-22-170DX等が挙げられるが、これに限定されない。 Examples of modified polydimethylsiloxanes in which the organic substituents contain OH groups but not ether groups include those commercially available under the names carbinol-modified polydimethylsiloxanes or carbinol-modified silicones. Examples of commercially available products of this type include, but are not limited to, products sold by Shin-Etsu Chemical Co., Ltd. under the names: X-22-4039, X-22-4015, KF-6000, KF-6001, KF-6002, KF-6003, X-22-170BX, and X-22-170DX.
上記有機置換基がOH基及びエーテル基を含む変性ポリジメチルシロキサンの例としては、ポリエーテル変性ポリジメチルシロキサン又はポリエーテル変性シリコーンなどとよばれ、かつポリエーテル基の末端がOH基であるものが挙げられる。そのようなものであって、ポリエチレングリコール繰り返し単位数に対する、ポリプロピレングリコール繰り返し単位数の比が、0.3未満であるものの市販品の例としては、信越化学工業株式会社販売の製品名:X-22-4272、KF-6123等が挙げられるが、これに限定されない。また、このようなポリエーテル変性ポリジメチルシロキサン又はポリエーテル変性シリコーンは、化粧品表示名称で「PEG-(数字)ジメチコン」と命名される場合がある。「PEG-(数字)」は、nが平均当該数字のPEG(ポリエチレングリコール)鎖を有することを意味する。「PEG-(数字)ジメチコン」は、INCI命名法では「PEG-(n) DIMETHICONE」と表記される。そのようなものであって、ポリエチレングリコール繰り返し単位数に対する、ポリプロピレングリコール繰り返し単位数の比が、0.3未満であるものの例としては、PEG-9ジメチコン(製品名:KF-6013)、PEG-3ジメチコン(信越化学工業株式会社販売の製品名:KF-6015)、PEG-10ジメチコン(信越化学工業株式会社販売の製品名:KF-6017)、PEG-10ジメチコン(信越化学工業株式会社販売の製品名:KF-6043)等が挙げられるが、これらに限定されない。 Examples of modified polydimethylsiloxanes in which the above-mentioned organic substituents contain OH groups and ether groups include those called polyether-modified polydimethylsiloxanes or polyether-modified silicones, in which the polyether group terminates in an OH group. Examples of commercially available products in which the ratio of the number of polypropylene glycol repeating units to the number of polyethylene glycol repeating units is less than 0.3 include, but are not limited to, product names X-22-4272 and KF-6123 sold by Shin-Etsu Chemical Co., Ltd. Furthermore, such polyether-modified polydimethylsiloxanes or polyether-modified silicones are sometimes labeled "PEG-(number) dimethicone" in cosmetic product names. "PEG-(number)" indicates that the average number of PEG (polyethylene glycol) chains is n. In the INCI nomenclature, "PEG-(number) dimethicone" is abbreviated as "PEG-(n) DIMETHICONE." Examples of such polypropylene glycol repeating units in a ratio of less than 0.3 include, but are not limited to, PEG-9 dimethicone (product name: KF-6013), PEG-3 dimethicone (sold by Shin-Etsu Chemical Co., Ltd., product name: KF-6015), PEG-10 dimethicone (sold by Shin-Etsu Chemical Co., Ltd., product name: KF-6017), and PEG-10 dimethicone (sold by Shin-Etsu Chemical Co., Ltd., product name: KF-6043).
水酸基価がカタログ等で開示されている反応性シリコーンもまた、上記有機置換基がOH基及び場合によりエーテル基を含む変性ポリジメチルシロキサンであると推定できる。変性ポリジメチルシロキサンの水酸基価を測定し、変性ポリジメチルシロキサン中のOH基の存在を確認してもよい。一実施形態において、変性ポリジメチルシロキサンは、1mg KOH/g以上の水酸基価を有する。水酸基価の測定は、例えば、JIS K 0070に準拠する方法、又はJIS K 1557-6 に準拠するFT-NIR(近赤外分光分析法)により行うことができる。
変性ポリジメチルシロキサンの有機置換基がOH基を含むかどうかの確認は、変性ポリジメチルシロキサンのフーリエ変換赤外分光法(FT-IR)測定により、アルコール性OHの変角振動に由来する約1360~1340cm-1のIRスペクトルの有無を観察することによっても、行うことができる。
Reactive silicones whose hydroxyl values are disclosed in catalogs or the like can also be assumed to be modified polydimethylsiloxanes in which the organic substituents contain OH groups and, optionally, ether groups. The hydroxyl value of the modified polydimethylsiloxane may be measured to confirm the presence of OH groups in the modified polydimethylsiloxane. In one embodiment, the modified polydimethylsiloxane has a hydroxyl value of 1 mg KOH/g or more. The hydroxyl value can be measured, for example, by a method conforming to JIS K 0070 or by FT-NIR (near-infrared spectroscopy) conforming to JIS K 1557-6.
Whether or not the organic substituent of the modified polydimethylsiloxane contains an OH group can also be confirmed by measuring the modified polydimethylsiloxane by Fourier transform infrared spectroscopy (FT-IR) and observing the presence or absence of an IR spectrum at about 1360 to 1340 cm −1 due to the deformation vibration of alcoholic OH.
有機置換基がエーテル基を含む場合、該有機置換基中のポリエチレングリコール繰り返し単位数に対する、ポリプロピレングリコール繰り返し単位数の比は、カタログ等で開示されている変性ポリジメチルシロキサンの構造から求めることができる。例えば、変性ポリジメチルシロキサンが、OH基及びエーテル基を含み、かつポリプロピレングリコール繰り返し単位を含まないことが明らかな場合は、ポリエチレングリコール繰り返し単位数に対する、ポリプロピレングリコール繰り返し単位数の比は、0となり、特徴(b)を満たす。具体的な構造が開示されていない場合は、特徴(c)に関して後述したように、変性ポリジメチルシロキサンの重クロロホルム中で測定した1H NMRスペクトルに基づき算出することができる。具体的には、変性ポリジメチルシロキサンの重クロロホルム中で測定した1H NMRスペクトルに基づき、以下の式(1)により算出した値を、ポリエチレングリコール繰り返し単位数に対する、ポリプロピレングリコール繰り返し単位数の比とみなすことができる。
式(1):[(1.25~0.95ppmの範囲のシグナルの積分値)/3]/{[(4.4~3.2ppmの範囲のシグナルの積分値)-(1.25~0.95ppmの範囲のシグナルの積分値)]/4}
When the organic substituent contains an ether group, the ratio of the number of polypropylene glycol repeating units to the number of polyethylene glycol repeating units in the organic substituent can be determined from the structure of the modified polydimethylsiloxane disclosed in a catalog or the like. For example, if it is clear that the modified polydimethylsiloxane contains an OH group and an ether group but does not contain a polypropylene glycol repeating unit, the ratio of the number of polypropylene glycol repeating units to the number of polyethylene glycol repeating units will be 0, satisfying feature (b). If a specific structure is not disclosed, as described below with respect to feature (c), it can be calculated based on the 1H NMR spectrum of the modified polydimethylsiloxane measured in deuterated chloroform. Specifically, the value calculated using the following formula (1) based on the 1H NMR spectrum of the modified polydimethylsiloxane measured in deuterated chloroform can be considered to be the ratio of the number of polypropylene glycol repeating units to the number of polyethylene glycol repeating units.
Formula (1): [(integral value of signals in the range of 1.25 to 0.95 ppm)/3]/{[(integral value of signals in the range of 4.4 to 3.2 ppm)-(integral value of signals in the range of 1.25 to 0.95 ppm)]/4}
市販されている変性ポリジメチルシロキサンによっては、変性基の詳細な構造が開示されていない場合がある。また、界面活性剤、表面調整剤、レベリング剤、消泡剤、湿潤剤、分散剤等の各種添加剤として市販され、変性ポリジメチルシロキサンとの明示やその構造が開示されていないものの、変性ポリジメチルシロキサンに該当するものもある。その場合、変性ポリジメチルシロキサンの重クロロホルム中で測定した1H NMRスペクトルにおいて、0.3~-0.3ppm及び4.4~3.2ppmの範囲にシグナルを有し、1.25~0.95ppmの範囲にシグナルを有するかあるいは有さず、13~0ppmの範囲にD2O添加によって消失するシグナルを有し、かつ以下の式(1)より算出される数値が、0.3未満であるものが、本態様の変性ポリジメチルシロキサンに該当する(上記特徴(c))。
式(1):[(1.25~0.95ppmの範囲のシグナルの積分値)/3]/{[(4.4~3.2ppmの範囲のシグナルの積分値)-(1.25~0.95ppmの範囲のシグナルの積分値)]/4}
0.3~-0.3ppmの範囲に観測されるシグナル(以下、「第1シグナル」ともいう)は、Si原子に隣接する炭素原子に接続する水素原子(-Si(CH
3 )2-)由来のシグナルである。
4.4~3.2ppmの範囲に観測されるシグナル(以下、「第2シグナル」ともいう)は、OH基又はエーテルの酸素原子に隣接する炭素に接続する水素原子(例えば、-O-CH
2 CH
2 -O-、-O-CH
2 CH(CH3)-O-、-CH
2 -OH)由来のシグナルである。
1.25~0.95ppmの範囲に観測されるシグナル(以下、「第3シグナル」ともいう)は、ポリエーテル変性基としてのポリプロピレングリコール鎖中のメチル基の水素原子(-CH2CH(CH
3 )-O-)由来のシグナルである。
13~0ppmの範囲に観察され、かつD2O添加によって消失するシグナル(以下、「第4シグナル」ともいう)は、OH基またはNH基の水素原子由来のシグナルであると推定できる。
Some commercially available modified polydimethylsiloxanes do not disclose the detailed structure of the modifying group. Furthermore, some commercially available additives, such as surfactants, surface conditioners, leveling agents, antifoaming agents, wetting agents, and dispersants, are classified as modified polydimethylsiloxanes, even though they are not explicitly referred to as modified polydimethylsiloxanes or their structures are not disclosed. In such cases, the modified polydimethylsiloxanes of this embodiment are those that, in their 1H NMR spectrum measured in deuterated chloroform, have signals in the ranges of 0.3 to -0.3 ppm and 4.4 to 3.2 ppm, have or do not have a signal in the range of 1.25 to 0.95 ppm, and have a signal in the range of 13 to 0 ppm that disappears upon addition of D2O , and for which the value calculated from the following formula (1) is less than 0.3 (the above-mentioned feature (c)).
Formula (1): [(integral value of signals in the range of 1.25 to 0.95 ppm)/3]/{[(integral value of signals in the range of 4.4 to 3.2 ppm)-(integral value of signals in the range of 1.25 to 0.95 ppm)]/4}
The signal observed in the range of 0.3 to -0.3 ppm (hereinafter also referred to as "first signal") is a signal derived from a hydrogen atom (-Si(C H 3 ) 2 -) connected to a carbon atom adjacent to a Si atom.
The signal observed in the range of 4.4 to 3.2 ppm (hereinafter also referred to as "second signal") is a signal derived from a hydrogen atom connected to a carbon adjacent to an OH group or an oxygen atom of an ether (e.g., -O-C H 2 C H 2 -O-, -O-C H 2 C H (CH 3 )-O-, -C H 2 -OH).
The signal observed in the range of 1.25 to 0.95 ppm (hereinafter also referred to as "third signal") is a signal derived from a hydrogen atom (-CH 2 CH(C H 3 )-O-) of a methyl group in a polypropylene glycol chain as a polyether modifying group.
The signal observed in the range of 13 to 0 ppm and disappearing upon addition of D 2 O (hereinafter also referred to as "fourth signal") can be presumed to be a signal derived from the hydrogen atom of an OH group or an NH group.
D2O添加によって消失するシグナルは、通常、13~0ppmの範囲に観測される。そのうち、3~2ppmの範囲に観測され、かつD2O添加によって消失するシグナルは、OH基の水素原子由来のシグナルであると推定できる。 Signals that disappear upon addition of D 2 O are usually observed in the range of 13 to 0 ppm. Among these, signals observed in the range of 3 to 2 ppm and that disappear upon addition of D 2 O can be presumed to be signals derived from hydrogen atoms of OH groups.
D2O添加によって消失するシグナルが、OH基またはNH基のいずれの水素原子由来のシグナルであるかの推定は、例えば、以下の方法でも行うことができる。
・フーリエ変換赤外分光法(FT-IR)測定
上記の1H NMR測定に加え、変性ポリジメチルシロキサンのフーリエ変換赤外分光法(FT-IR)測定により、アルコール性OHの変角振動に由来する約1360~1340cm-1のIRスペクトルの有無を観察することによって、D2O添加によって消失するシグナルは、OH基の水素原子由来のシグナルであると推定できる。
・酸性度の測定
上記の1H NMR測定に加え、変性ポリジメチルシロキサンの酸性度の測定により、D2O添加によって消失するシグナルは、OH基またはNH基のいずれの水素原子由来のシグナルであるかの推定ができる。例えば、変性ポリジメチルシロキサンの測定試料100mgをイソプロピルアルコールに200uLに溶解し、純水200uLを加えてよく振とうし、液体のpHを測定する。pHが3~7を示す場合は、D2O添加によって消失するシグナルは、OH基の水素原子由来のシグナルであると推定できる。pHが8以上の塩基性を示す場合は、D2O添加によって消失するシグナルは、NH基の水素原子由来のシグナルであると推定できる。
Whether the signal that disappears upon addition of D 2 O is a signal derived from a hydrogen atom of an OH group or an NH group can also be estimated by, for example, the following method.
Fourier transform infrared spectroscopy (FT-IR) measurement In addition to the above 1 H NMR measurement, the presence or absence of an IR spectrum at approximately 1360 to 1340 cm −1 derived from the deformation vibration of alcoholic OH groups can be observed by Fourier transform infrared spectroscopy (FT-IR) measurement of the modified polydimethylsiloxane, and it can be assumed that the signal that disappears upon addition of D 2 O is a signal derived from the hydrogen atom of the OH group.
Measurement of Acidity In addition to the above 1H NMR measurement, measurement of the acidity of modified polydimethylsiloxane allows estimation of whether the signal that disappears upon addition of D2O is derived from the hydrogen atom of an OH group or an NH group. For example, 100 mg of a measurement sample of modified polydimethylsiloxane is dissolved in 200 uL of isopropyl alcohol, 200 uL of pure water is added, and the solution is shaken well, and the pH of the liquid is measured. If the pH is 3 to 7, the signal that disappears upon addition of D2O can be estimated to be derived from the hydrogen atom of an OH group. If the pH is 8 or higher, which is basic, the signal that disappears upon addition of D2O can be estimated to be derived from the hydrogen atom of an NH group.
上記特徴(c)において、式(1)より算出される数値は、0.3未満である。ここで、この数値は、以下に示す通り、変性ポリジメチルシロキサン中のポリエチレングリコール繰り返し単位数に対する、ポリプロピレングリコール繰り返し単位数の比におおよそ対応する。
式(1)において、
0.3~-0.3ppmの範囲に観測されるシグナル(第1シグナル)は、ジメチルシロキサン繰り返し単位-O-Si(CH
3 )2-の下線の水素原子に帰属し、
4.4~3.2ppmの範囲に観測されるシグナル(第2シグナル)は、ポリエチレングリコール繰り返し単位-O-CH
2 CH
2 -O-の下線の水素原子、及びポリプロピレングリコール繰り返し単位-O-CH
2 CH(CH3)-O-の下線の水素原子に帰属し、
1.25~0.95ppmの範囲に観測されるシグナル(第3シグナル)は、ポリプロピレングリコール繰り返し単位-CH2CH(CH
3 )-O-の下線の水素原子に帰属する、
と仮定したものである。
上記の仮定において、ジメチルシロキサン繰り返し単位1つ分に相当する第1シグナルの積分値を6として各シグナルの積分値を計算した場合、ジメチルシロキサン繰り返し単位1つに対するポリプロピレングリコール繰り返し単位の数は、次の式(2)で計算できる。
式(2):(第3シグナルの積分値)/3
同様に、ジメチルシロキサン繰り返し単位1つに対するポリエチレングリコール繰り返し単位の数は、次の式(3)で計算できる。
式(3):[(第2シグナルの積分値)―(第3シグナルの積分値)]/4
上記式(2)及び式(3)に基づき、変性ポリジメチルシロキサン中のポリエチレングリコール繰り返し単位数に対する、ポリプロピレングリコール繰り返し単位数の比が、式(1)で計算できる。
式(1):[(第3シグナルの積分値)/3]/{[(第2シグナルの積分値)-(第3シグナルの積分値)]/4}
In the above characteristic (c), the value calculated from formula (1) is less than 0.3, which roughly corresponds to the ratio of the number of polypropylene glycol repeating units to the number of polyethylene glycol repeating units in the modified polydimethylsiloxane, as shown below.
In formula (1),
The signal observed in the range of 0.3 to −0.3 ppm (first signal) is attributed to the underlined hydrogen atom of the dimethylsiloxane repeating unit —O—Si(C H 3 ) 2 —.
The signal (second signal) observed in the range of 4.4 to 3.2 ppm is attributed to the underlined hydrogen atoms of the polyethylene glycol repeating unit -O-C H 2 C H 2 -O- and the underlined hydrogen atoms of the polypropylene glycol repeating unit -O-C H 2 C H (CH 3 )-O-,
The signal observed in the range of 1.25 to 0.95 ppm (third signal) is assigned to the underlined hydrogen atom of the polypropylene glycol repeating unit -CH 2 CH(C H 3 )-O-.
This is the assumption.
Under the above assumptions, when the integral value of each signal is calculated assuming that the integral value of the first signal corresponding to one dimethylsiloxane repeating unit is 6, the number of polypropylene glycol repeating units per dimethylsiloxane repeating unit can be calculated using the following formula (2):
Equation (2): (integral value of the third signal)/3
Similarly, the number of polyethylene glycol repeating units per dimethylsiloxane repeating unit can be calculated using the following formula (3):
Equation (3): [(integral value of the second signal) - (integral value of the third signal)]/4
Based on the above formulas (2) and (3), the ratio of the number of polypropylene glycol repeating units to the number of polyethylene glycol repeating units in the modified polydimethylsiloxane can be calculated using formula (1).
Formula (1): [(integral value of the third signal)/3]/{[(integral value of the second signal)-(integral value of the third signal)]/4}
特徴(c)を満たす変性ポリジメチルシロキサンの例としては、信越化学工業株式会社販売の製品名:KF-945、X-22-4039、エボニック ジャパン株式会社販売の製品名:TEGO TWIN 4000、TEGO TWIN 4100等が挙げられる。 Examples of modified polydimethylsiloxanes that satisfy characteristic (c) include products sold by Shin-Etsu Chemical Co., Ltd. under the product names KF-945 and X-22-4039, and products sold by Evonik Japan Co., Ltd. under the product names TEGO TWIN 4000 and TEGO TWIN 4100.
本態様の重合性組成物では、(C)特徴(a)、(b)及び(c)の少なくとも1つを満たす変性ポリジメチルシロキサンを含むことにより、基板等への塗布後、熱硬化の際だけでなく常温放置の際にもブリード現象が抑制される。重合性組成物が(C)変性ポリジメチルシロキサンを含むことにより、ブリード現象が抑制される理由としては、これに限定されないが、以下が考えられる。変性ポリジメチルシロキサンを含む重合性組成物が基板等に適用されると、変性ポリジメチルシロキサンの表面移行性により、変性ポリジメチルシロキサンの一部が重合性組成物の塗膜表面に移行する。その塗膜表面に移行した変性ポリジメチルシロキサンが、重合性組成物の塗膜から他の未反応成分が染み出す前に、重合性組成物と接触していない基板上にごくわずかに移行し、変性ポリジメチルシロキサンの変性基が基板表面に吸着する。これにより、基板表面に変性ポリジメチルシロキサンの吸着膜が形成され、そのポリジメチルシロキサン部分に起因する撥水・撥油性が発現し、ブリードを抑制すると考えられる。また、変性基としての有機置換基がCOOH基又はOH基を含有することにより、変性ポリジメチルシロキサンの基板へのより高い吸着効果が得られると考えられる。さらに、変性基としての有機置換基がOH基を含有する場合、有機置換基に含まれるポリプロピレングリコール基の量が一定量以下であることにより、OH基による基板への吸着効果が抑制されないと考えられる。 In the polymerizable composition of this embodiment, by including (C) a modified polydimethylsiloxane that satisfies at least one of characteristics (a), (b), and (c), bleeding is suppressed after application to a substrate or the like, not only during thermal curing but also when left at room temperature. The reason why bleeding is suppressed by including (C) a modified polydimethylsiloxane in the polymerizable composition is thought to be, but is not limited to, the following: When a polymerizable composition containing a modified polydimethylsiloxane is applied to a substrate or the like, a portion of the modified polydimethylsiloxane migrates to the coating surface of the polymerizable composition due to the surface migration of the modified polydimethylsiloxane. A small amount of the modified polydimethylsiloxane that has migrated to the coating surface migrates to a substrate that is not in contact with the polymerizable composition, before other unreacted components seep out of the coating of the polymerizable composition, and the modifying group of the modified polydimethylsiloxane adsorbs to the surface of the substrate. This is thought to form an adsorption film of modified polydimethylsiloxane on the substrate surface, resulting in water- and oil-repellent properties attributable to the polydimethylsiloxane portion and suppressing bleeding. Furthermore, it is thought that the organic substituent as the modifying group containing a COOH group or an OH group can provide a higher adsorption effect of the modified polydimethylsiloxane to the substrate. Furthermore, when the organic substituent as the modifying group contains an OH group, it is thought that the adsorption effect of the OH group to the substrate is not suppressed if the amount of polypropylene glycol groups contained in the organic substituent is below a certain amount.
一実施形態において、特徴(b)及び(c)の少なくとも1つを満たす変性ポリジメチルシロキサンは、重クロロホルム中で測定した1H NMRスペクトルにおいて、ジメチルシロキサン繰り返し単位1つ分に相当する第1シグナルの積分値を6として各シグナルの積分値を計算した場合、4.4~3.2ppmの範囲に観測されるシグナル(第2シグナル)の積分値が、0.3~19であるものがより好ましく、0.3~17であるものがさらに好ましい。 In one embodiment, a modified polydimethylsiloxane satisfying at least one of features (b) and (c) is one in which, in a 1 H NMR spectrum measured in deuterated chloroform, the integral of each signal (second signal) observed in the range of 4.4 to 3.2 ppm is preferably 0.3 to 19, and even more preferably 0.3 to 17, when the integral of the first signal corresponding to one dimethylsiloxane repeating unit is set to 6 and the integral of each signal is calculated.
1H NMRの測定は、通常の条件を用いて行うことができる。例えば、測定試料100mgを500μlの重クロロホルムに溶解し、直径5mmの1H NMR用試料管に入れて、以下の条件で測定を行う。測定後、試料入り試料管に50μlの重水(D2O)を添加し、同一条件で再度測定を行う。重水添加後に消失した信号は、水酸基又はアミノ基に結合した活性水素由来の信号であることがわかる。
測定周波数:40~600 MHz
溶媒:重クロロホルム
測定核種:1H
積算回数:4~80回
測定温度:15~50℃
1H NMR measurements can be performed under normal conditions. For example, 100 mg of a measurement sample is dissolved in 500 μl of deuterated chloroform and placed in a 5 mm diameter 1H NMR sample tube, and measurements are performed under the following conditions. After the measurement, 50 μl of heavy water ( D2O ) is added to the sample tube, and measurements are performed again under the same conditions. The signal that disappears after the addition of heavy water is found to be a signal derived from active hydrogen bonded to a hydroxyl group or an amino group.
Measurement frequency: 40-600 MHz
Solvent: deuterated chloroform Measurement nuclide: 1 H
Accumulation count: 4 to 80 times Measurement temperature: 15 to 50°C
(C)変性ポリジメチルシロキサンは、いずれか1種を用いてもよいし、2種以上を併用してもよい。 (C) Modified polydimethylsiloxane may be used alone or in combination of two or more types.
(C)変性ポリジメチルシロキサンの含有量は、重合性組成物の総質量に対し0.01質量%以上であることが好ましく、0.1質量%以上であることがより好ましく、0.2質量%以上であることがさらに好ましい。また、5質量%以下であることが好ましく、4質量%以下であることがより好ましく、3質量%以下であることがさらに好ましい。ある実施形態においては、(C)変性ポリジメチルシロキサンの含有量は、重合性組成物の総質量に対し、0.01~5質量%であることが好ましく、より好ましくは0.1~4質量%であることがより好ましく、0.2~3質量%であることがさらに好ましい。 The content of (C) modified polydimethylsiloxane is preferably 0.01% by mass or more, more preferably 0.1% by mass or more, and even more preferably 0.2% by mass or more, relative to the total mass of the polymerizable composition. It is also preferably 5% by mass or less, more preferably 4% by mass or less, and even more preferably 3% by mass or less. In some embodiments, the content of (C) modified polydimethylsiloxane is preferably 0.01 to 5% by mass, more preferably 0.1 to 4% by mass, and even more preferably 0.2 to 3% by mass, relative to the total mass of the polymerizable composition.
本態様の重合性組成物は、所望であれば、上記成分(A)~(C)以外の任意成分、例えば以下に述べるものを必要に応じて含有してもよい。 If desired, the polymerizable composition of this embodiment may contain optional components other than the above components (A) to (C), such as those described below, as needed.
(D)フィラー
本態様の重合性組成物は、本発明の効果を損なわない範囲で、(D)フィラー(以下、「成分(D)」とも言う)を含有してもよい。(D)フィラーを重合性組成物に含有することによって、重合性組成物を硬化させた硬化物の線膨張係数を下げることができ、耐サーマルサイクル性が向上する。また、低弾性率のフィラーであれば、硬化物に生じる応力を緩和することができ、長期信頼性が向上する。(D)フィラーは、無機フィラー及び有機フィラーに大別される。
(D) Filler The polymerizable composition of this embodiment may contain (D) filler (hereinafter also referred to as "component (D)") within a range that does not impair the effects of the present invention. By containing (D) filler in the polymerizable composition, the linear expansion coefficient of the cured product obtained by curing the polymerizable composition can be reduced, and thermal cycle resistance can be improved. Furthermore, if the filler has a low elastic modulus, it can alleviate stress generated in the cured product, and long-term reliability can be improved. (D) fillers are broadly classified into inorganic fillers and organic fillers.
無機フィラーは、無機材料によって形成された粒状体からなり、添加により線膨張係数を下げる効果を有するものであれば、特に限定されない。無機材料としては、シリカ、タルク、アルミナ、窒化アルミニウム、炭酸カルシウム、ケイ酸アルミニウム、ケイ酸マグネシウム、炭酸マグネシウム、硫酸バリウム、炭酸バリウム、硫酸石灰、水酸化アルミニウム、ケイ酸カルシウム、チタン酸カリウム、酸化チタン、酸化亜鉛、炭化ケイ素、窒化ケイ素、窒化ホウ素等を用いることができる。無機フィラーは、いずれか1種を用いてもよいし、2種以上を併用してもよい。無機フィラーとしては、充填量を高くできることから、シリカフィラーを用いることが好ましい。シリカは、非晶質シリカが好ましい。 The inorganic filler is not particularly limited as long as it is made of granular material and has the effect of lowering the linear expansion coefficient when added. Examples of inorganic materials that can be used include silica, talc, alumina, aluminum nitride, calcium carbonate, aluminum silicate, magnesium silicate, magnesium carbonate, barium sulfate, barium carbonate, lime sulfate, aluminum hydroxide, calcium silicate, potassium titanate, titanium oxide, zinc oxide, silicon carbide, silicon nitride, and boron nitride. Any one of these inorganic fillers may be used alone, or two or more may be used in combination. Silica filler is preferred as the inorganic filler, as it allows for a high loading. Amorphous silica is preferred as the silica.
無機フィラーは、その表面がシランカップリング剤等のカップリング剤で表面処理されたものが好ましい。それにより、重合性組成物の粘度を適正な範囲とすることができる。 It is preferable that the surface of the inorganic filler be treated with a coupling agent such as a silane coupling agent. This allows the viscosity of the polymerizable composition to be within an appropriate range.
有機フィラーの例としては、ポリテトラフルオロエチレン(PTFE)フィラー、シリコーンフィラー、アクリルフィラー、スチレンフィラー等が挙げられる。有機フィラーは、表面処理されていてもよい。有機フィラーのガラス転移点は、40℃超であることが好ましい。 Examples of organic fillers include polytetrafluoroethylene (PTFE) filler, silicone filler, acrylic filler, styrene filler, etc. The organic filler may be surface-treated. The glass transition point of the organic filler is preferably above 40°C.
フィラーの形状は、特に限定されず、球状、りん片状、針状、不定形等のいずれであってもよい。 The shape of the filler is not particularly limited and may be spherical, flaky, needle-like, irregular, etc.
ある実施形態において、フィラーの平均粒径は、5.0μm以下であることが好ましく、4.0μm以下であることがより好ましく、3.0μm以下であることがさらに好ましい。本明細書において、平均粒径とは、ISO-13320(2009)に準拠してレーザー回折法によって測定した体積基準のメジアン径(d50)、あるいは透過型電子顕微鏡(TEM)又は走査型電子顕微鏡(SEM)により取得された観察画像から任意に選択した50個の測定値の数平均として求められる値を指す。フィラーの平均粒径を上限以下とすることにより、フィラーの沈降を抑制することができ、また、粗粒の形成を抑制し、ディスペンサーのノズルの詰まりを抑制することができる。フィラーの平均粒径の下限は特に限定されないが、重合性組成物の粘度の観点から、0.005μm以上であることが好ましく、0.1μm以上であることがより好ましい。本態様のある実施形態において、フィラーの平均粒径は、好ましくは0.01μm~5.0μmであり、より好ましくは0.1μm~3.0μmである。平均粒径が異なるフィラーを組み合わせて用いてもよい。例えば、平均粒径0.005μm以上0.1μm未満のフィラーと、平均粒径0.1μm~5.0μmのフィラーとを組み合わせて用いてもよい。 In some embodiments, the average particle size of the filler is preferably 5.0 μm or less, more preferably 4.0 μm or less, and even more preferably 3.0 μm or less. In this specification, the average particle size refers to the volume-based median diameter (d 50 ) measured by laser diffraction in accordance with ISO-13320 (2009), or the value calculated as the number average of 50 measurements arbitrarily selected from observation images acquired with a transmission electron microscope (TEM) or a scanning electron microscope (SEM). By setting the average particle size of the filler to the upper limit or less, sedimentation of the filler can be suppressed, and the formation of coarse particles can be suppressed, thereby preventing clogging of the dispenser nozzle. The lower limit of the average particle size of the filler is not particularly limited, but from the viewpoint of the viscosity of the polymerizable composition, it is preferably 0.005 μm or more, and more preferably 0.1 μm or more. In some embodiments of this aspect, the average particle size of the filler is preferably 0.01 μm to 5.0 μm, more preferably 0.1 μm to 3.0 μm. Fillers with different average particle sizes may be used in combination, for example, a filler with an average particle size of 0.005 μm or more and less than 0.1 μm may be used in combination with a filler with an average particle size of 0.1 μm to 5.0 μm.
本態様の重合性組成物における(D)フィラーの含有量は、重合性組成物の総質量に対し、好ましくは0.5~80質量%であり、より好ましくは1~70質量%であり、さらに好ましくは3~60%である。(D)フィラーの含有量を上記範囲とすることにより、耐サーマルサイクル性が向上し、また、重合性組成物の粘度を適切な範囲とし、ディスペンサーでの適用性が向上する。 The content of the filler (D) in the polymerizable composition of this embodiment is preferably 0.5 to 80% by mass, more preferably 1 to 70% by mass, and even more preferably 3 to 60% by mass, relative to the total mass of the polymerizable composition. By keeping the content of the filler (D) within this range, thermal cycle resistance is improved, and the viscosity of the polymerizable composition is kept within an appropriate range, improving applicability in dispensers.
・光増感剤
本態様の重合性組成物は、所望であれば、本発明の効果を損なわない範囲で、光増感剤を含有していてもよい。光増感剤は、光エネルギーを吸収し、これを酸発生剤に伝播し、酸発生剤の光への感度を高めることができる。光増感剤としては、チオキサントン誘導体、カルボニル化合物、有機硫黄化合物、過硫化物、レドックス系化合物、アゾ及びジアゾ化合物、ハロゲン化合物、光還元性色素等が挙げられるが、これらに限定されない。
Photosensitizer The polymerizable composition of this embodiment may contain a photosensitizer, if desired, within the range that does not impair the effects of the present invention. The photosensitizer absorbs light energy and transmits it to the acid generator, thereby increasing the sensitivity of the acid generator to light. Examples of photosensitizers include, but are not limited to, thioxanthone derivatives, carbonyl compounds, organic sulfur compounds, persulfides, redox compounds, azo and diazo compounds, halogen compounds, and photoreducible dyes.
光増感剤は、いずれか1種を用いてもよいし、2種以上を併用してもよい。本態様の重合性組成物が光増感剤を含有する場合、光増感剤の含有量は、酸発生剤の総質量に対して、0.1~1000質量%であることが好ましく、1~500質量%であることがより好ましい。 Any one of the photosensitizers may be used, or two or more may be used in combination. When the polymerizable composition of this embodiment contains a photosensitizer, the content of the photosensitizer is preferably 0.1 to 1000% by mass, and more preferably 1 to 500% by mass, relative to the total mass of the acid generator.
・光ラジカル開始剤
本態様の重合性組成物は、所望であれば、本発明の効果を損なわない範囲で、光ラジカル開始剤を含有していてもよい。光ラジカル開始剤は、光を吸収して活性種としてラジカルを発生させ、酸発生剤を還元的に分解し、酸発生剤からの酸の発生を促進することができる。光ラジカル開始剤の例としては、アルキルフェノン系化合物、アシルフォスフィンオキサイド系化合物、オキシムエステル系化合物、感光部位及びペルオキシド構造を有する化合物等が挙げられるが、これらに限定されない。
Photoradical Initiator The polymerizable composition of this embodiment may contain a photoradical initiator, if desired, within the scope of not impairing the effects of the present invention. The photoradical initiator absorbs light to generate radicals as active species, which can reductively decompose the acid generator and promote the generation of acid from the acid generator. Examples of photoradical initiators include, but are not limited to, alkylphenone compounds, acylphosphine oxide compounds, oxime ester compounds, and compounds having a photosensitive moiety and a peroxide structure.
光ラジカル開始剤は、いずれか1種を用いてもよいし、2種以上を併用してもよい。本態様の重合性組成物が光ラジカル開始剤を含有する場合、光ラジカル開始剤の含有量は、酸発生剤の総質量に対して、10~200質量%であることが好ましく、50~150質量%であることがより好ましい。 Any one of the photoradical initiators may be used, or two or more may be used in combination. When the polymerizable composition of this embodiment contains a photoradical initiator, the content of the photoradical initiator is preferably 10 to 200% by mass, and more preferably 50 to 150% by mass, relative to the total mass of the acid generator.
・熱ラジカル開始剤
本態様の重合性組成物は、所望であれば、本発明の効果を損なわない範囲で、熱ラジカル開始剤を含有していてもよい。熱ラジカル開始剤は、所定の温度で開裂することにより活性種ラジカルを発生させ、酸発生剤を還元的に分解し、酸発生剤からの酸の発生を促進することができる。熱ラジカル開始剤の例としては、有機過酸化物、無機過酸化物、アゾ化合物等が挙げられる。
Thermal Radical Initiator The polymerizable composition of this embodiment may contain a thermal radical initiator, if desired, within a range that does not impair the effects of the present invention. The thermal radical initiator generates an active radical by cleavage at a predetermined temperature, which can reductively decompose the acid generator and promote the generation of an acid from the acid generator. Examples of thermal radical initiators include organic peroxides, inorganic peroxides, and azo compounds.
熱ラジカル開始剤は、いずれか1種を用いてもよいし、2種以上を併用してもよい。本態様の重合性組成物が熱ラジカル開始剤を含有する場合、熱ラジカル開始剤の含有量は、酸発生剤の総質量に対して、1~200質量%であることが好ましく、10~150質量%であることがより好ましい。 Any one of the thermal radical initiators may be used, or two or more may be used in combination. When the polymerizable composition of this embodiment contains a thermal radical initiator, the content of the thermal radical initiator is preferably 1 to 200% by mass, and more preferably 10 to 150% by mass, relative to the total mass of the acid generator.
・ラジカル重合性化合物
本態様の重合性組成物は、本発明の効果を損なわない範囲で、ラジカル重合性化合物を含んでいてもよい。酸発生剤の種類によっては、活性種ラジカルも生成されるため、ラジカル重合性化合物のラジカル重合が進行し、重合性組成物に硬化性及び接着性を付与する。ラジカル重合性化合物の例としては、(メタ)アクリレート化合物、ビスマレイミド化合物、スチレン化合物、ポリブタジエン化合物等の不飽和二重結合を有する化合物、又は不飽和二重結合を有する化合物とチオール化合物との混合物(エン-チオール反応可能な混合物)が挙げられるが、これらに限定されない。ラジカル重合性化合物は、いずれか1種を用いてもよいし、2種以上を併用してもよい。
Radical Polymerizable Compound The polymerizable composition of this embodiment may contain a radically polymerizable compound to the extent that the effects of the present invention are not impaired. Depending on the type of acid generator, active species radicals may also be generated, which causes radical polymerization of the radically polymerizable compound to proceed, imparting curability and adhesiveness to the polymerizable composition. Examples of radically polymerizable compounds include, but are not limited to, compounds having an unsaturated double bond such as (meth)acrylate compounds, bismaleimide compounds, styrene compounds, and polybutadiene compounds, as well as mixtures of compounds having an unsaturated double bond and thiol compounds (mixtures capable of ene-thiol reaction). Any one type of radically polymerizable compound may be used, or two or more types may be used in combination.
・その他の添加剤
重合性組成物は、本態様の目的を損なわない範囲で、必要に応じ、その他の添加剤、例えば、安定化剤、カップリング剤、カーボンブラック、チタンブラック、イオントラップ剤、レベリング剤、酸化防止剤、消泡剤、揺変剤、粘度調整剤、難燃剤等をさらに含有してもよい。
Other Additives The polymerizable composition may further contain other additives, such as a stabilizer, a coupling agent, carbon black, titanium black, an ion trapping agent, a leveling agent, an antioxidant, an antifoaming agent, a thixotropic agent, a viscosity modifier, or a flame retardant, as needed, within the scope of the present embodiment.
本態様の重合性組成物は、VOC排出抑制及び硬化物の収縮抑制の観点から、溶剤を実質的に含まないことが好ましい。本明細書中、「重合性組成物が溶剤を実質的に含まない」とは、重合性組成物中の溶剤の含有量が、重合性組成物の総質量に対し1質量%以下であることをいう。溶剤の例としては、炭化水素類(ベンゼン、トルエン、キシレン、シクロヘキサン等)、非プロトン性極性溶媒(N,N-ジメチルホルムアミド、ジメチルスルホキシド、N-メチル-2-ピロリドン等)、ニトリル類(アセトニトリル等)、ケトン類(アセトン、メチルエチルケトン、メチルイソブチルケトン、シクロヘキサノン等)、エステル類(酢酸エチル、酢酸ブチル、ブチロラクトン、プロピレンカーボネート等)、エーテル類(シクロペンチルメチルエーテル、ジエチルエーテル、テトラヒドロフラン、ジメトキシエタン等)、アルコール類(メタノール、エタノール、プロパノール、ブタノール等)、テルペン類(テレビン油、ターピネオール、イソボルニルアセテート等)、ハロゲン系溶媒(ジクロロメタン、クロロホルム等)等の硬化性組成物の分野で一般的な有機溶剤が挙げられる。 The polymerizable composition of this embodiment preferably contains substantially no solvent, from the viewpoint of suppressing VOC emissions and shrinkage of the cured product. In this specification, "the polymerizable composition contains substantially no solvent" means that the content of solvent in the polymerizable composition is 1 mass % or less relative to the total mass of the polymerizable composition. Examples of solvents include organic solvents commonly used in the field of curable compositions, such as hydrocarbons (benzene, toluene, xylene, cyclohexane, etc.), aprotic polar solvents (N,N-dimethylformamide, dimethyl sulfoxide, N-methyl-2-pyrrolidone, etc.), nitriles (acetonitrile, etc.), ketones (acetone, methyl ethyl ketone, methyl isobutyl ketone, cyclohexanone, etc.), esters (ethyl acetate, butyl acetate, butyrolactone, propylene carbonate, etc.), ethers (cyclopentyl methyl ether, diethyl ether, tetrahydrofuran, dimethoxyethane, etc.), alcohols (methanol, ethanol, propanol, butanol, etc.), terpenes (turpentine, terpineol, isobornyl acetate, etc.), and halogenated solvents (dichloromethane, chloroform, etc.).
本態様の重合性組成物の粘度は、好ましくは0.5~100Pa・sである。重合性組成物の適用用途及び適用箇所に応じて、適宜粘度を調整することができる。本明細書において、組成物の粘度は、別段の断りがない限り、日本工業規格JIS K6833に従って測定した値で表記する。具体的には、E型粘度計を用いて、回転数10rpmで測定することにより求めることができる。使用する機器やローターや測定レンジに特に制限はない。 The viscosity of the polymerizable composition of this embodiment is preferably 0.5 to 100 Pa·s. The viscosity can be adjusted appropriately depending on the intended use and application location of the polymerizable composition. In this specification, the viscosity of the composition is expressed as a value measured in accordance with Japanese Industrial Standard JIS K6833, unless otherwise specified. Specifically, it can be determined by measuring using an E-type viscometer at a rotation speed of 10 rpm. There are no particular restrictions on the equipment, rotor, or measurement range used.
重合性組成物は、例えば、成分(A)~成分(C)、必要に応じてその他の成分を、同時に又は別々に、必要により加熱処理を加えながら、撹拌、溶融、混合及び/又は分散させることにより、得ることができる。これらの混合、撹拌及び分散等のための装置としては、特に限定されない。この装置として、撹拌及び加熱装置を備えた、ライカイ機、ヘンシェルミキサー、3本ロールミル、ボールミル、プラネタリーミキサー、及びビーズミル等を使用することができる。また、これらの装置は、適宜に組み合わせられて使用されてもよい。 The polymerizable composition can be obtained, for example, by stirring, melting, mixing, and/or dispersing components (A) to (C), and optionally other components, simultaneously or separately, while applying heat treatment as necessary. There are no particular limitations on the equipment used for mixing, stirring, dispersing, etc. Examples of equipment that can be used include a Raikai mixer, Henschel mixer, three-roll mill, ball mill, planetary mixer, and bead mill, all equipped with a stirring and heating device. These devices may also be used in appropriate combinations.
本態様の重合性組成物は、その用途等に応じて、単一の容器に入れられたものとして構成される一液型重合性組成物とすることも、2つ以上の容器に分けられたものとして構成される二液型(又は多液型)重合性組成物とすることも可能である。二液型(又は多液型)重合性組成物とする場合、前記成分(A)~成分(C)、及び必要に応じたその他の任意成分は、一液型と同じように選択することができる。また、二液型(又は多液型)重合性組成物とする場合、前記成分(A)~成分(C)、及び必要に応じたその他の任意成分は、特に制限なく任意の分け方で二液又は多液に分けることができる。任意の分け方で二液又は多液に分ける場合、前記成分(A)~成分(C)及び必要に応じたその他の任意成分から選択される1種以上が各液にそれぞれ含まれていてもよく、前記成分(A)~成分(C)が1つの液に含まれていてもよく、前記成分(A)~成分(C)及び/又は必要に応じたその他の任意成分のみからなる液があってもよい。例えば、A液とB液とに分ける場合、その分け方は、A液:成分(A)、B液:成分(B)及び成分(C)でもよく、A液:成分(A)及び成分(C)、B液:成分(B)でもよく、A液:成分(A)及び成分(C)、B液:成分(B)及び成分(C)でもよく、A液:成分(A)、B液:成分(B)及び成分(C)及び成分(D)でもよく、A液:成分(A)及び成分(C)、B液:成分(B)及び成分(D)でもよく、A液:成分(A)及び成分(D)、B液:成分(B)及び成分(C)でもよい。前記成分(A)~成分(C)がA液に含まれ、それ以外の成分がB液に含まれる場合、A液のみを、又はA液とB液とを合わせて、本態様の重合性組成物とみなすことができる。一方、前記成分(A)~成分(C)がそれぞれ別の液に含まれる場合、それぞれの液を合わせて本態様の重合性組成物とみなすことができる。前記成分(A)~成分(C)がそれぞれ別の液に含まれる場合の例としては、たとえば、前記成分(A)~成分(C)が2つ以上の容器に分けられたものとして構成される重合性組成物、具体的には、前記成分(A)~成分(C)のいずれかを含む複数の液から構成されるキットが挙げられる。 Depending on the intended use, the polymerizable composition of this embodiment can be a one-component polymerizable composition contained in a single container, or a two-component (or multi-component) polymerizable composition separated into two or more containers. When a two-component (or multi-component) polymerizable composition is used, the components (A) to (C) and other optional components as needed can be selected in the same way as for a one-component composition. Furthermore, when a two-component (or multi-component) polymerizable composition is used, the components (A) to (C) and other optional components as needed can be separated into two or multiple components in any manner without particular restrictions. When separating into two or multiple components in any manner, each component may contain one or more components selected from the components (A) to (C) and other optional components as needed. Components (A) to (C) may be contained in a single component, or a component may contain only the components (A) to (C) and/or other optional components as needed. For example, when the liquid is separated into liquid A and liquid B, the separation may be as follows: liquid A: component (A), liquid B: component (B) and component (C), liquid A: component (A) and component (C), liquid B: component (B), liquid A: component (A) and component (C), liquid B: component (B) and component (C), liquid A: component (A), liquid B: component (B), component (C), and component (D), liquid A: component (A) and component (C), liquid B: component (B) and component (D), or liquid A: component (A) and component (D), liquid B: component (B) and component (C). When components (A) to (C) are contained in liquid A and other components are contained in liquid B, only liquid A or a combination of liquid A and liquid B can be considered as the polymerizable composition of this embodiment. On the other hand, when components (A) to (C) are contained in separate liquids, the liquids can be considered together to be the polymerizable composition of this embodiment. An example of a case in which components (A) to (C) are contained in separate liquids is a polymerizable composition in which components (A) to (C) are separated into two or more containers, specifically a kit composed of multiple liquids containing any of components (A) to (C).
このようにして得られた重合性組成物は、重合性組成物中に含まれる酸発生剤の種類に応じて、光硬化性、熱硬化性、又は光及び熱硬化性である。重合性組成物の光硬化は、例えば、重合性組成物にUV光を照射することにより行う。重合性組成物の熱硬化は、例えば、温度100℃の条件下で行う。重合性組成物の熱硬化温度は、重合性組成物が高温条件下で劣化する部品を含む半導体モジュール(例えば、カメラモジュール等の光学センサモジュール)の製造に使用される場合には、60~90℃であることが好ましい。熱硬化時間は、他の硬化条件によるが、例えば、30~120分であり得る。重合性組成物が光及び熱硬化性の場合、例えば、重合性組成物を光(UV)での硬化により予備硬化した後に、熱での硬化により本硬化させることができる。 The polymerizable composition obtained in this manner may be photocurable, thermocurable, or photo- and thermo-curable, depending on the type of acid generator contained in the polymerizable composition. Photocuring of the polymerizable composition is carried out, for example, by irradiating the polymerizable composition with UV light. Thermocuring of the polymerizable composition is carried out, for example, at a temperature of 100°C. The thermocuring temperature of the polymerizable composition is preferably 60 to 90°C when the polymerizable composition is used to manufacture semiconductor modules (e.g., optical sensor modules such as camera modules) that include components that deteriorate under high temperature conditions. The thermocuring time depends on other curing conditions, but may be, for example, 30 to 120 minutes. When the polymerizable composition is photo- and thermo-curable, for example, the polymerizable composition can be pre-cured by curing with light (UV), and then fully cured by curing with heat.
本態様の重合性組成物は、例えば、部品を固定、接着又は保護するための接着剤、封止材、ダム剤、及びその原料として用いることができ、1液タイプとして好適である。ここで、ダム剤は、例えば、基板上に、複数の半導体チップ等を低粘度フィル剤等で封止する前に、予め基板の外周に形成される。このダム剤によるダムの形成により、その後の複数の半導体チップを封止する低粘度フィル剤の流出を抑制することができる。また、本態様の重合性組成物を含む接着剤は、エンジニアリングプラスチック、セラミックス、及び金属に対しても、良好な接合を可能にする。 The polymerizable composition of this embodiment can be used, for example, as an adhesive, sealant, or damming agent for fixing, adhering, or protecting components, as well as a raw material for these, and is suitable as a one-component type. Here, the damming agent is formed, for example, around the periphery of the substrate before sealing multiple semiconductor chips or the like on the substrate with a low-viscosity filler or the like. The formation of a dam by this damming agent can prevent the subsequent outflow of the low-viscosity filler that seals the multiple semiconductor chips. Furthermore, adhesives containing the polymerizable composition of this embodiment enable good bonding to engineering plastics, ceramics, and metals.
重合性組成物の塗布方法は、特に限定されず、例えば、基材等部品の所望の部分に、公知の印刷方法、ディスペンス方法又はコーティング方法により、塗布することができる。印刷方法としては、インクジェット印刷、スクリーン印刷、平版印刷、カルトン印刷、金属印刷、オフセット印刷、グラビア印刷、フレキソ印刷等が挙げられるが、これらに限定されない。ディスペンス方法としては、ジェットディスペンサー、エアーディスペンサー等を使用する方法が挙げられるが、これらに限定されない。コーティング方法としては、ディップ塗工、スプレー塗工、バーコーター塗工、グラビア塗工、リバースグラビア塗工、スピンコーター塗工等が挙げられるが、これらに限定されない。一実施形態において、重合性組成物の塗布方法は、エアーディスペンサーを使用する方法が好ましい。 The method for applying the polymerizable composition is not particularly limited, and for example, it can be applied to the desired portion of a component such as a substrate by a known printing method, dispensing method, or coating method. Printing methods include, but are not limited to, inkjet printing, screen printing, lithographic printing, carton printing, metal printing, offset printing, gravure printing, and flexographic printing. Dispensing methods include, but are not limited to, methods using a jet dispenser or air dispenser. Coating methods include, but are not limited to, dip coating, spray coating, bar coater coating, gravure coating, reverse gravure coating, and spin coater coating. In one embodiment, the method for applying the polymerizable composition is preferably a method using an air dispenser.
[接着剤又は封止材]
本発明の一態様である接着剤又は封止材は、上述の態様の重合性組成物を含む。この接着剤又は封止材は、汎用プラスチック(例えば、PE、PS、PP等)、エンジニアリングプラスチック(例えば、LCP(液晶ポリマー)、ポリアミド、ポリカーボネート等)、セラミックス(例えば、アルミナ、窒化アルミニウム、酸化ベリリウム等)、及び金属(例えば、銅、ニッケル等)に対して、良好な固定、接合又は保護を可能にし、半導体装置又は電子部品を構成する部品同士を固定、接合又は保護するために使用することができる。半導体装置としては、例えば、HDD、半導体素子、光学センサモジュール、その他の半導体モジュール、集積回路などが挙げられるが、これらに限定されない。態様の接着剤又は封止材は、好ましくは、カメラモジュール等の光学センサモジュールを構成する部品の固定、接着又は保護に用いられる。
[Adhesive or sealant]
An adhesive or sealant according to one embodiment of the present invention comprises the polymerizable composition of the above-described embodiment. This adhesive or sealant provides excellent fixation, bonding, or protection for general-purpose plastics (e.g., PE, PS, PP, etc.), engineering plastics (e.g., LCP (liquid crystal polymer), polyamide, polycarbonate, etc.), ceramics (e.g., alumina, aluminum nitride, beryllium oxide, etc.), and metals (e.g., copper, nickel, etc.), and can be used to fix, bond, or protect components constituting semiconductor devices or electronic components. Examples of semiconductor devices include, but are not limited to, HDDs, semiconductor elements, optical sensor modules, other semiconductor modules, and integrated circuits. The adhesive or sealant according to this embodiment is preferably used to fix, bond, or protect components constituting optical sensor modules such as camera modules.
本態様の接着剤又は封止材は、その用途等に応じて、単一の容器に入れられたものとして構成される一液型接着剤又は封止材とすることも、2つ以上の容器に分けられたものとして構成される二液型(又は多液型)接着剤又は封止材とすることも可能である。二液型(又は多液型)接着剤又は封止材とする場合、前記成分(A)~成分(C)、及び必要に応じたその他の任意成分は、一液型と同じように選択することができる。また、二液型(又は多液型)接着剤又は封止材とする場合、前記成分(A)~成分(C)、及び必要に応じたその他の任意成分は、特に制限なく任意の分け方で二液又は多液に分けることができる。任意の分け方で二液又は多液に分ける場合、前記成分(A)~成分(C)及び必要に応じたその他の任意成分から選択される1種以上が各液にそれぞれ含まれていてもよく、前記成分(A)~成分(C)が1つの液に含まれていてもよく、前記成分(A)~成分(C)及び/又は必要に応じたその他の任意成分のみからなる液があってもよい。例えば、A液とB液とに分ける場合、その分け方は、A液:成分(A)、B液:成分(B)及び成分(C)でもよく、A液:成分(A)及び成分(C)、B液:成分(B)でもよく、A液:成分(A)及び成分(C)、B液:成分(B)及び成分(C)でもよく、A液:成分(A)、B液:成分(B)及び成分(C)及び成分(D)でもよく、A液:成分(A)及び成分(C)、B液:成分(B)及び成分(D)でもよく、A液:成分(A)及び成分(D)、B液:成分(B)及び成分(C)でもよい。前記成分(A)~成分(C)がA液に含まれ、それ以外の成分がB液に含まれる場合、A液のみを、又はA液とB液とを合わせて、本態様の接着剤又は封止材とみなすことができる。一方、前記成分(A)~成分(C)がそれぞれ別の液に含まれる場合、それぞれの液を合わせて本態様の接着剤又は封止材とみなすことができる。前記成分(A)~成分(C)がそれぞれ別の液に含まれる場合の例としては、たとえば、前記成分(A)~成分(C)が2つ以上の容器に分けられたものとして構成される接着剤又は封止材、具体的には、前記成分(A)~成分(C)のいずれかを含む複数の液から構成されるキットが挙げられる。 Depending on the intended use, the adhesive or sealant of this embodiment can be a one-component adhesive or sealant contained in a single container, or a two-component (or multi-component) adhesive or sealant separated into two or more containers. When a two-component (or multi-component) adhesive or sealant is used, the components (A) to (C) and other optional components as needed can be selected in the same way as for a one-component adhesive or sealant. Furthermore, when a two-component (or multi-component) adhesive or sealant is used, the components (A) to (C) and other optional components as needed can be separated into two or multiple components in any manner without particular restrictions. When separated into two or multiple components in any manner, each component may contain one or more components selected from the components (A) to (C) and other optional components as needed. Components (A) to (C) may be contained in a single component, or a component may be a component consisting solely of the components (A) to (C) and/or other optional components as needed. For example, when the liquid is divided into liquid A and liquid B, the division may be liquid A: component (A), liquid B: component (B) and component (C), or liquid A: component (A) and component (C), liquid B: component (B), or liquid A: component (A) and component (C), liquid B: component (B) and component (C), or liquid A: component (A), liquid B: component (B), component (C), and component (D), or liquid A: component (A) and component (C), liquid B: component (B) and component (D), or liquid A: component (A) and component (D), or liquid B: component (B) and component (C). When components (A) to (C) are contained in liquid A and other components are contained in liquid B, only liquid A, or a combination of liquid A and liquid B, can be considered as the adhesive or sealant of this embodiment. On the other hand, when components (A) to (C) are contained in separate liquids, the liquids can be considered together to be the adhesive or sealant of this embodiment. An example of a case in which components (A) to (C) are contained in separate liquids is an adhesive or sealant in which components (A) to (C) are separated into two or more containers, specifically a kit composed of multiple liquids containing any of components (A) to (C).
[重合性組成物もしくは接着剤又は封止材の硬化物]
本発明の別の態様である硬化物は、上述の態様の重合性組成物もしくは上述の態様の接着剤又は封止材が硬化された硬化物である。この硬化物が接着された被着体周辺は、ブリードが抑制される。
[Cured product of polymerizable composition, adhesive or sealant]
The cured product according to another embodiment of the present invention is a cured product obtained by curing the polymerizable composition according to the above embodiment or the adhesive or sealant according to the above embodiment. Bleeding is suppressed around an adherend to which the cured product is adhered.
[半導体装置、電子部品]
本発明の一態様の半導体装置又は電子部品は、上述の態様の硬化物を含む。ここで、半導体装置とは、半導体特性を利用することで機能し得る装置全般を指し、電子部品、半導体回路、これらを組み込んだモジュール、電子機器等を含むものである。半導体装置又は電子部品は、例えば、HDD、半導体素子、光学センサモジュール、その他の半導体モジュール、集積回路などが挙げられるが、これらに限定されない。光学センサは、例えば、フォトダイオード、フォトIC、光電子増倍管(PMT)、光電管、イメージセンサ、分光器・分光センサ、赤外線センサ、紫外線・炎センサ、X線センサ、放射線センサ、電子・イオンセンサ、距離・位置センサなどが挙げられるが、これらに限定されない。
[Semiconductor devices, electronic components]
A semiconductor device or electronic component according to one embodiment of the present invention includes the cured product according to the above-described embodiment. Here, the term "semiconductor device" refers to any device that can function by utilizing semiconductor properties, including electronic components, semiconductor circuits, modules incorporating these, and electronic devices. Examples of semiconductor devices or electronic components include, but are not limited to, HDDs, semiconductor elements, optical sensor modules, other semiconductor modules, and integrated circuits. Examples of optical sensors include, but are not limited to, photodiodes, photo ICs, photomultiplier tubes (PMTs), phototubes, image sensors, spectroscopes/spectroscopic sensors, infrared sensors, ultraviolet/flame sensors, X-ray sensors, radiation sensors, electron/ion sensors, and distance/position sensors.
以下、本発明を実施例及び比較例によりさらに詳細に説明するが、本発明はこれら実施例に限定されるものではない。なお、以下の実施例において、部、%は断りのない限り、質量部、質量%を示す。 The present invention will be explained in more detail below with reference to examples and comparative examples, but the present invention is not limited to these examples. In the following examples, parts and percentages indicate parts by mass and percentages by mass unless otherwise specified.
[重合性組成物の調製]
表2-1~表2-5に示す配合に従って、3本ロールミルを用いて所定の量の各成分を混合することにより、実施例及び比較例の重合性組成物を調製した。表2-1~表2-5において、各成分の量は質量部(単位:g)で表されている。実施例及び比較例において用いた成分は、以下の通りである。
[Preparation of polymerizable composition]
Polymerizable compositions of the Examples and Comparative Examples were prepared by mixing predetermined amounts of each component using a three-roll mill according to the formulations shown in Tables 2-1 to 2-5. In Tables 2-1 to 2-5, the amount of each component is expressed in parts by mass (unit: g). The components used in the Examples and Comparative Examples are as follows:
・(A)カチオン重合性化合物
(A-1):水素化ビスフェノールA型ジグリシジルエーテル(品名:jER YX8000、三菱ケミカル株式会社製、エポキシ当量:205g/eq)
(A-2):特殊エポキシ樹脂(品名:AER9000、旭化成株式会社製、ポリエーテル型エポキシ、エポキシ当量:380g/eq)
(A-3):3,4-エポキシシクロヘキシルメチル-3,4-エポキシシクロヘキサンカルボキシレート(品名:セロキサイド(登録商標)2021P、株式会社ダイセル製、脂環式エポキシ、エポキシ当量:130g/eq)
(A-4):1,2-エポキシテトラデカン(品名:TD-EX、四日市合成株式会社製、単官能エポキシ、エポキシ当量:212g/eq)
(A-5):特殊エポキシ樹脂(品名:HiREM-2、四国化成株式会社製、エポキシ当量:80g/eq)
(A-6):3-エチル-3{[(3-エチルオキセタン-3-イル)メトキシ]メチル}オキセタン(品名:OXT-221、東亞合成株式会社製、オキセタン当量:107g/eq)
・(B)酸発生剤
(B-1):4-イソプロピル-4’-メチルジフェニルヨードニウムテトラキス(ペンタフルオロフェニル)ボレート(品名:BLUESIL(登録商標)PI 2074、ELKEM SILICONES社製、光酸発生剤)
(B-2):スルホニウム塩系酸発生剤(品名:VC-1FG、サンアプロ株式会社製、光酸発生剤)
(B-3):ボレート系第4級アンモニウム塩(品名:CXC-1821、King Industries, Inc.製、熱酸発生剤)
(A) Cationic Polymerizable Compound (A-1): Hydrogenated bisphenol A diglycidyl ether (product name: jER YX8000, manufactured by Mitsubishi Chemical Corporation, epoxy equivalent: 205 g/eq)
(A-2): Special epoxy resin (product name: AER9000, manufactured by Asahi Kasei Corporation, polyether type epoxy, epoxy equivalent: 380 g/eq)
(A-3): 3,4-epoxycyclohexylmethyl-3,4-epoxycyclohexanecarboxylate (product name: CELLOXIDE (registered trademark) 2021P, manufactured by Daicel Corporation, alicyclic epoxy, epoxy equivalent: 130 g/eq)
(A-4): 1,2-epoxytetradecane (product name: TD-EX, manufactured by Yokkaichi Synthetic Co., Ltd., monofunctional epoxy, epoxy equivalent: 212 g/eq)
(A-5): Special epoxy resin (product name: HiREM-2, manufactured by Shikoku Chemicals Co., Ltd., epoxy equivalent: 80 g/eq)
(A-6): 3-ethyl-3{[(3-ethyloxetan-3-yl)methoxy]methyl}oxetane (product name: OXT-221, manufactured by Toagosei Co., Ltd., oxetane equivalent: 107 g/eq)
(B) Acid Generator (B-1): 4-isopropyl-4'-methyldiphenyliodonium tetrakis(pentafluorophenyl)borate (product name: BLUESIL (registered trademark) PI 2074, manufactured by ELKEM SILICONES, photoacid generator)
(B-2): Sulfonium salt-based acid generator (product name: VC-1FG, manufactured by San-Apro Co., Ltd., photoacid generator)
(B-3): Borate-based quaternary ammonium salt (product name: CXC-1821, manufactured by King Industries, Inc., thermal acid generator)
・(C)変性ポリジメチルシロキサン(成分(C))
・(C’)成分(C)以外の変性ポリジメチルシロキサン(成分(C’))
成分(C)及び成分(C’)として、以下の表1に記載の変性ポリジメチルシロキサンを使用した。各種変性ポリジメチルシロキサンの重クロロホルム中での1H NMR測定、フーリエ変換赤外分光法(FT-IR)測定、及び酸性度測定の結果を表1に示す。
(C) Modified polydimethylsiloxane (component (C))
(C') Modified polydimethylsiloxane other than component (C) (component (C'))
The modified polydimethylsiloxanes used as components (C) and (C') were those listed in Table 1. The results of 1 H NMR measurement, Fourier transform infrared spectroscopy (FT-IR) measurement, and acidity measurement of the various modified polydimethylsiloxanes in deuterated chloroform are shown in Table 1.
表1中、「Ph」はフェニル基を示し、「Me」はメチル基を示す。
表1中、「[(第3シグナル)/3]/{[(第2シグナル)-(第3シグナル)]/4}」は、式(1)の[(1.25~0.95ppmの範囲のシグナルの積分値)/3]/{[(4.4~3.2ppmの範囲のシグナルの積分値)-(1.25~0.95ppmの範囲のシグナルの積分値)]/4}を示す。
In Table 1, "Ph" represents a phenyl group and "Me" represents a methyl group.
In Table 1, "[(third signal)/3]/{[(second signal)-(third signal)]/4}" represents [(integral value of signals in the range of 1.25 to 0.95 ppm)/3]/{[(integral value of signals in the range of 4.4 to 3.2 ppm)-(integral value of signals in the range of 1.25 to 0.95 ppm)]/4} in formula (1).
・(D)フィラー(成分(D))
(D-1):表面処理シリカフィラー(品名:SE5200SEE、平均粒径2μm、株式会社アドマテックス製)
(D-2):シリカフィラー(品名:CAB-O-SIL(登録商標)TS-720、ポリジメチルシロキサン表面処理ヒュームドシリカ、Cabot Corporation製)
・(E)その他の任意成分
(E-1):ジセチルパーオキシジカーボネート(品名:Perkadox24L、化薬ヌーリオン株式会社製、熱ラジカル開始剤)
(E-2):2,4-ジエチルチオキサントン(DETX)(光増感剤)
(D) Filler (Component (D))
(D-1): Surface-treated silica filler (product name: SE5200SEE, average particle size 2 μm, manufactured by Admatechs Co., Ltd.)
(D-2): Silica filler (product name: CAB-O-SIL (registered trademark) TS-720, polydimethylsiloxane surface-treated fumed silica, manufactured by Cabot Corporation)
(E) Other optional components (E-1): Dicetyl peroxydicarbonate (product name: Perkadox 24L, manufactured by Kayaku Nouryon Co., Ltd., thermal radical initiator)
(E-2): 2,4-diethylthioxanthone (DETX) (photosensitizer)
[変性ポリジメチルシロキサンの1H NMR測定]
各種変性ポリジメチルシロキサンの測定試料100mgを500μLの重クロロホルムに溶解し、直径5mmの1H NMR用試料管に入れて、以下の条件で測定を行った。測定後、試料入り試料管に50μLの重水(D2O)を添加し、同一条件で再度測定を行った。クロロホルム由来のシグナルで0.3~―0.3ppmのシグナルを積分した値を6とした場合の、各シグナルの積分値を表1に示した。
測定装置:Oxford instrument Pulsar HF
測定周波数:60 MHz
溶媒:重クロロホルム
測定核種:1H
測定温度:37℃
積算回数:32回
[ 1H NMR Measurement of Modified Polydimethylsiloxane]
100 mg of a measurement sample of each modified polydimethylsiloxane was dissolved in 500 μL of deuterated chloroform and placed in a 5 mm diameter 1 H NMR sample tube, and measurement was performed under the following conditions. After the measurement, 50 μL of heavy water (D 2 O) was added to the sample tube, and measurement was performed again under the same conditions. The integral value of each signal, where the integral value of the chloroform-derived signal from 0.3 to -0.3 ppm is set to 6, is shown in Table 1.
Measurement equipment: Oxford instrument Pulsar HF
Measurement frequency: 60 MHz
Solvent: deuterated chloroform Measurement nuclide: 1 H
Measurement temperature: 37℃
Number of times accumulated: 32
上記測定条件での各シグナルの帰属例は、以下の通りである。
0.3~―0.3ppm:Si原子に隣接する炭素原子に接続する水素原子(-Si(CH
3 )2-)由来のシグナル
4.4~3.2ppm:OH基又はエーテルの酸素原子に隣接する炭素に接続する水素原子(例えば、-O-CH
2 CH
2 -O-、-O-CH
2 CH(CH3)-O-、-CH
2 -OH)由来のシグナル
1.25~0.95ppm(d、約6Hz):ポリプロピレングリコール鎖中のメチル基の水素原子(-CH2CH(CH
3 )-O-)由来のシグナル
上記測定条件では、9.0~0.5ppmの範囲に出現し、かつD2O添加によって消失するシグナル:OH基またはNH基の水素原子由来のシグナル
An example of the assignment of each signal under the above measurement conditions is as follows:
0.3 to -0.3 ppm: signal derived from a hydrogen atom (-Si(C H 3 ) 2 -) connected to a carbon atom adjacent to an Si atom 4.4 to 3.2 ppm: signal derived from a hydrogen atom connected to a carbon adjacent to an OH group or an oxygen atom of an ether (for example, -O-C H 2 C H 2 -O-, -O-C H 2 C H (CH 3 )-O-, -C H 2 -OH) 1.25 to 0.95 ppm (d, approximately 6 Hz): signal derived from a hydrogen atom of a methyl group in a polypropylene glycol chain (-CH 2 CH(C H 3 )-O-) Signals that appear in the range of 9.0 to 0.5 ppm under the above measurement conditions and disappear upon addition of D 2 O: signals derived from a hydrogen atom of an OH group or an NH group
[変性ポリジメチルシロキサンのフーリエ変換赤外分光法(FT-IR)測定]
以下の条件で各種変性ポリジメチルシロキサンのフーリエ変換赤外分光法(FT-IR)測定を行い、カルボン酸のC=O伸縮振動(約1715cm-1)の有無と、アルコール性OHの変角振動(約1360~1340cm-1)の有無を確認した。結果を表1に示す。
測定装置:Perkin-Elmer FT-IR Spectrometer Spectrum 3
測定方法:ATR法
[Fourier transform infrared spectroscopy (FT-IR) measurement of modified polydimethylsiloxane]
Fourier transform infrared spectroscopy (FT-IR) measurements were performed on various modified polydimethylsiloxanes under the following conditions to confirm the presence or absence of the carboxylic acid C=O stretching vibration (approximately 1715 cm -1 ) and the alcoholic OH deformation vibration (approximately 1360 to 1340 cm -1 ). The results are shown in Table 1.
Measurement equipment: Perkin-Elmer FT-IR Spectrometer Spectrum 3
Measurement method: ATR method
[変性ポリジメチルシロキサンの酸性度測定]
各種変性ポリジメチルシロキサンのサンプル100mgをイソプロピルアルコール(IPA)200μLに溶解し、純水200μLを加えてよく振とうし、得られた液体にpH試験紙を浸漬し、pHを判定した。pH試験紙は、Macherey Nagel #90204 Universal indicator paperを使用した。結果を表1に示す。
[Measurement of acidity of modified polydimethylsiloxane]
100 mg of each modified polydimethylsiloxane sample was dissolved in 200 μL of isopropyl alcohol (IPA), 200 μL of pure water was added, and the mixture was shaken well. pH test paper was immersed in the resulting liquid and the pH was determined. Macherey Nagel #90204 Universal indicator paper was used as the pH test paper. The results are shown in Table 1.
実施例及び比較例においては、重合性組成物の特性を、以下のようにして測定した。 In the examples and comparative examples, the properties of the polymerizable compositions were measured as follows.
[ブリード評価]
アルゴン(Ar)ガスにてプラズマ処理を施したセラミックス基板上に、実施例及び比較例の重合性組成物を、ディスペンサにより1.5mgポッティングした。以下、2条件のブリード長さをCCDカメラで測定した(N=3pcs×2sides)。結果を表2-1~表2-5に示す。条件1;ポッティング後、60分間室温(20℃~25℃)に放置したのちのセラミックス基板上に発生したブリード長さ。条件2;ポッティング後、60分間室温(20℃~25℃)に放置し、重合性組成物を、80℃で60分間の条件で熱硬化させたのちのセラミックス基板上に発生したブリード長さ。
なお、表2-1~表2-5に示したブリード長さについて、3000μmがブリード長さの測定限界のため、ブリード長さが測定限界を超えたものは>3000μmと記載した。
[Bleeding evaluation]
Using a dispenser, 1.5 mg of the polymerizable compositions of the Examples and Comparative Examples were potted onto a ceramic substrate that had been plasma-treated with argon (Ar) gas. The bleed lengths under the following two conditions were measured using a CCD camera (N = 3 pcs × 2 sides). The results are shown in Tables 2-1 to 2-5. Condition 1: The bleed length on the ceramic substrate after potting and leaving it at room temperature (20°C to 25°C) for 60 minutes. Condition 2: The bleed length on the ceramic substrate after potting and leaving it at room temperature (20°C to 25°C) for 60 minutes, and then thermally curing the polymerizable composition at 80°C for 60 minutes.
In addition, with regard to the bleeding lengths shown in Tables 2-1 to 2-5, since the measurement limit for bleeding length is 3000 μm, bleeding lengths exceeding the measurement limit are recorded as >3000 μm.
実施例1~19の、(C)特徴(a)、(b)及び(c)の少なくとも1つを満たす変性ポリジメチルシロキサンを含む重合性組成物は、(C)変性ポリジメチルシロキサンを含まない比較例1、7~11の重合性組成物及び(C’)成分(C)以外の変性ポリジメチルシロキサンを含む比較例2~6の重合性組成物と比較して、条件1及び条件2のいずれにおいても、ブリード現象が顕著に抑制されたことがわかる。 The polymerizable compositions of Examples 1 to 19 containing (C) a modified polydimethylsiloxane that satisfies at least one of characteristics (a), (b), and (c) showed significantly reduced bleeding under both Condition 1 and Condition 2, compared to the polymerizable compositions of Comparative Examples 1 and 7 to 11 that did not contain the (C) modified polydimethylsiloxane, and the polymerizable compositions of Comparative Examples 2 to 6 that contained (C') a modified polydimethylsiloxane other than component (C).
本発明は、ブリード現象を抑制可能な、少なくとも光硬化性又は熱硬化性の重合性組成物であり、特に、小型化又は高集積化された半導体モジュールの部品の固定、接着又は保護に用いられる接着剤又は封止材として、非常に有用である。 The present invention relates to a polymerizable composition that is at least photocurable or thermosetting and can suppress bleeding, and is particularly useful as an adhesive or sealant used to fix, bond, or protect components in miniaturized or highly integrated semiconductor modules.
日本国特許出願2024-056011号(出願日:2024年3月29日)の開示はその全体が参照により本明細書に取り込まれる。
本明細書に記載された全ての文献、特許出願、および技術規格は、個々の文献、特許出願、および技術規格が参照により取り込まれることが具体的かつ個々に記された場合と同程度に、本明細書に参照により取り込まれる。
The disclosure of Japanese Patent Application No. 2024-056011 (filing date: March 29, 2024) is incorporated herein by reference in its entirety.
All publications, patent applications, and technical standards mentioned in this specification are herein incorporated by reference to the same extent as if each individual publication, patent application, or technical standard was specifically and individually indicated to be incorporated by reference.
Claims (11)
(B)酸発生剤、
及び
(C)以下の特徴(a)、(b)及び(c)の少なくとも1つを満たす変性ポリジメチルシロキサン:
(a)COOH基を含有する有機置換基が、ポリジメチルシロキサンと直接又はリンカーを介して結合している;
(b)OH基及び場合によりエーテル基を含有する有機置換基が、ポリジメチルシロキサンと直接又はリンカーを介して結合しており、有機置換基がエーテル基を含有する場合、該有機置換基中のポリエチレングリコール繰り返し単位数に対する、ポリプロピレングリコール繰り返し単位数の比が、0.3未満である;
(c)重クロロホルム中で測定した1H NMRスペクトルにおいて、0.3~-0.3ppm及び4.4~3.2ppmの範囲にシグナルを有し、1.25~0.95ppmの範囲にシグナルを有するかあるいは有さず、13~0ppmの範囲にD2O添加によって消失するシグナルを有し、かつ以下の式(1)より算出される数値が、0.3未満である、
式(1):[(1.25~0.95ppmの範囲のシグナルの積分値)/3]/{[(4.4~3.2ppmの範囲のシグナルの積分値)-(1.25~0.95ppmの範囲のシグナルの積分値)]/4}
を含む重合性組成物。 (A) a cationically polymerizable compound,
(B) an acid generator,
and (C) a modified polydimethylsiloxane that satisfies at least one of the following characteristics (a), (b), and (c):
(a) an organic substituent containing a COOH group is bonded to polydimethylsiloxane directly or via a linker;
(b) an organic substituent containing an OH group and optionally an ether group is bonded to the polydimethylsiloxane directly or via a linker, and when the organic substituent contains an ether group, the ratio of the number of polypropylene glycol repeating units to the number of polyethylene glycol repeating units in the organic substituent is less than 0.3;
(c) In a 1 H NMR spectrum measured in deuterated chloroform, it has signals in the ranges of 0.3 to −0.3 ppm and 4.4 to 3.2 ppm, has or has no signal in the range of 1.25 to 0.95 ppm, has a signal in the range of 13 to 0 ppm that disappears upon addition of D 2 O, and the value calculated by the following formula (1) is less than 0.3.
Formula (1): [(integral value of signals in the range of 1.25 to 0.95 ppm)/3]/{[(integral value of signals in the range of 4.4 to 3.2 ppm)-(integral value of signals in the range of 1.25 to 0.95 ppm)]/4}
A polymerizable composition comprising:
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Citations (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006219575A (en) * | 2005-02-10 | 2006-08-24 | Sumitomo Bakelite Co Ltd | Liquid sealing resin and semiconductor device using the same |
| JP2016199736A (en) * | 2015-03-12 | 2016-12-01 | パナソニックIpマネジメント株式会社 | Photocationic polymerization composition, adhesion method, electronic device and manufacturing method thereof, display device and manufacturing method thereof |
| JP2017171754A (en) * | 2016-03-23 | 2017-09-28 | ナミックス株式会社 | Epoxy resin composition, underfill agent, cured product, semiconductor device |
| WO2017175735A1 (en) * | 2016-04-06 | 2017-10-12 | 株式会社スリーボンド | Cationic-curable resin composition |
| JP2020070347A (en) * | 2018-10-31 | 2020-05-07 | 日立化成株式会社 | Resin composition for underfill and electronic component device and method for producing the same |
| WO2021157491A1 (en) * | 2020-02-04 | 2021-08-12 | 株式会社Adeka | Composition, cured product, optical filter, and method for producing cured product |
| WO2022239553A1 (en) * | 2021-05-12 | 2022-11-17 | 昭和電工マテリアルズ株式会社 | Underfill resin composition, electronic component device, and manufacturing method for same |
| WO2022239554A1 (en) * | 2021-05-12 | 2022-11-17 | 昭和電工マテリアルズ株式会社 | Resin composition for underfill, and electronic component device and production method therefor |
| WO2024057999A1 (en) * | 2022-09-16 | 2024-03-21 | 富士フイルム株式会社 | Coloring composition, cured film, color filter, display device and method for producing cured film |
| JP2024039208A (en) * | 2022-09-09 | 2024-03-22 | 日亜化学工業株式会社 | Light emitting device and its manufacturing method |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE202012006432U1 (en) * | 2012-07-05 | 2012-08-06 | Pelikan Hardcopy Production Ag | Radiation-curable acrylate-based inkjet ink |
| KR101884177B1 (en) * | 2013-12-27 | 2018-08-02 | 다우 코닝 도레이 캄파니 리미티드 | Room-temperature-curable silicone rubber composition, and the use thereof |
| JP6897008B2 (en) * | 2016-04-22 | 2021-06-30 | 昭和電工マテリアルズ株式会社 | Thermosetting resin composition for interlayer insulation layer, resin film for interlayer insulation layer, multilayer resin film, multilayer printed wiring board and its manufacturing method |
| JP2020015883A (en) * | 2018-07-27 | 2020-01-30 | 日立化成株式会社 | Resin composition for interlayer insulation layer, resin film for interlayer insulation layer, multilayer printed board and semiconductor package |
| JP7078138B2 (en) * | 2018-12-18 | 2022-05-31 | 住友ベークライト株式会社 | Manufacturing method of semiconductor device |
| JP7260371B2 (en) * | 2019-03-29 | 2023-04-18 | シーカ・ハマタイト株式会社 | Sealant composition |
| JP2023127565A (en) * | 2022-03-01 | 2023-09-13 | 積水化学工業株式会社 | Curable resin compositions, cured products, adhesives for electronic components, thermosetting adhesive films for electronic components, and sealants for display elements |
-
2025
- 2025-03-26 WO PCT/JP2025/011970 patent/WO2025205911A1/en active Pending
- 2025-03-26 WO PCT/JP2025/011969 patent/WO2025205910A1/en active Pending
Patent Citations (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006219575A (en) * | 2005-02-10 | 2006-08-24 | Sumitomo Bakelite Co Ltd | Liquid sealing resin and semiconductor device using the same |
| JP2016199736A (en) * | 2015-03-12 | 2016-12-01 | パナソニックIpマネジメント株式会社 | Photocationic polymerization composition, adhesion method, electronic device and manufacturing method thereof, display device and manufacturing method thereof |
| JP2017171754A (en) * | 2016-03-23 | 2017-09-28 | ナミックス株式会社 | Epoxy resin composition, underfill agent, cured product, semiconductor device |
| WO2017175735A1 (en) * | 2016-04-06 | 2017-10-12 | 株式会社スリーボンド | Cationic-curable resin composition |
| JP2020070347A (en) * | 2018-10-31 | 2020-05-07 | 日立化成株式会社 | Resin composition for underfill and electronic component device and method for producing the same |
| WO2021157491A1 (en) * | 2020-02-04 | 2021-08-12 | 株式会社Adeka | Composition, cured product, optical filter, and method for producing cured product |
| WO2022239553A1 (en) * | 2021-05-12 | 2022-11-17 | 昭和電工マテリアルズ株式会社 | Underfill resin composition, electronic component device, and manufacturing method for same |
| WO2022239554A1 (en) * | 2021-05-12 | 2022-11-17 | 昭和電工マテリアルズ株式会社 | Resin composition for underfill, and electronic component device and production method therefor |
| JP2024039208A (en) * | 2022-09-09 | 2024-03-22 | 日亜化学工業株式会社 | Light emitting device and its manufacturing method |
| WO2024057999A1 (en) * | 2022-09-16 | 2024-03-21 | 富士フイルム株式会社 | Coloring composition, cured film, color filter, display device and method for producing cured film |
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