WO2025205677A1 - Wiring sheet - Google Patents
Wiring sheetInfo
- Publication number
- WO2025205677A1 WO2025205677A1 PCT/JP2025/011574 JP2025011574W WO2025205677A1 WO 2025205677 A1 WO2025205677 A1 WO 2025205677A1 JP 2025011574 W JP2025011574 W JP 2025011574W WO 2025205677 A1 WO2025205677 A1 WO 2025205677A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- conductive linear
- wiring sheet
- wiring
- linear body
- less
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B3/00—Ohmic-resistance heating
- H05B3/02—Details
- H05B3/03—Electrodes
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B3/00—Ohmic-resistance heating
- H05B3/10—Heating elements characterised by the composition or nature of the materials or by the arrangement of the conductor
- H05B3/12—Heating elements characterised by the composition or nature of the materials or by the arrangement of the conductor characterised by the composition or nature of the conductive material
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B3/00—Ohmic-resistance heating
- H05B3/20—Heating elements having extended surface area substantially in a two-dimensional plane, e.g. plate-heater
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B3/00—Ohmic-resistance heating
- H05B3/20—Heating elements having extended surface area substantially in a two-dimensional plane, e.g. plate-heater
- H05B3/22—Heating elements having extended surface area substantially in a two-dimensional plane, e.g. plate-heater non-flexible
- H05B3/26—Heating elements having extended surface area substantially in a two-dimensional plane, e.g. plate-heater non-flexible heating conductor mounted on insulating base
Definitions
- the present invention relates to a wiring sheet.
- Wiring sheets equipped with wiring bodies are known. These wiring sheets can be used, for example, as materials for heat-generating textiles, components that generate heat in various items, and heating elements in heat-generating devices used in sensors and the like.
- Patent Document 1 discloses a wiring sheet equipped with a contact sensor.
- the sensor disclosed in Patent Document 1 is a contact sensor comprising a pseudo-sheet structure in which a plurality of conductive linear bodies are arranged at intervals, a first electrode electrically connected to the conductive linear bodies, and a second electrode disposed at a distance from the pseudo-sheet structure and the first electrode, which intersects with the conductive linear bodies but does not overlap with the first electrode in a plan view of the pseudo-sheet structure.
- Patent Document 2 discloses a pressure-sensitive heating element having a pressure-sensitive heating section made of a foamed conductive material.
- the pressure-sensitive heating section generates heat when electricity is applied, and elastically deforms when subjected to a compressive load. When electricity is applied and the compressive load is applied, the amount of heat generated increases as the compressive load increases.
- the pressure-sensitive heating element disclosed in Patent Document 2 is also provided with a conductive cloth.
- Patent Document 3 discloses a transparent film heater having a transparent heat-generating layer on the surface of a transparent film substrate.
- the transparent heat-generating layer contains at least metal nanowires.
- wiring sheets are required to be constructed with, for example, a more aesthetically pleasing design.
- wiring sheets are required to be constructed with a design that is more suitable for use as heaters for optical sensors such as LiDAR (Light Detection and Ranging or Laser Imaging Detection and Ranging).
- LiDAR Light Detection and Ranging or Laser Imaging Detection and Ranging
- the pressure-sensitive heating element disclosed in Patent Document 2 uses a carbon-coated copper-nickel plated woven fabric as the conductive fabric that enables electrical conduction.
- the transparent film heater of Patent Document 3 uses silver nanowires. It is disclosed that the silver nanowires used in the transparent film heater of Patent Document 3 are made of a silver alloy for sulfide stability. These silver nanowires are not blackened. Furthermore, the silver nanowires of Patent Document 3 have poor corrosion stability when used or stored in a humid and hot environment.
- a wiring body with a more aesthetically pleasing design can be obtained by replacing the conductive linear bodies with the carbon-coated linear bodies disclosed in Patent Document 2.
- a wiring sheet is made using carbon-coated linear bodies, there is a concern that corrosion may occur in the wiring sheet when it is used or stored in a humid and hot environment, for example, and the resistance value of the wiring sheet may increase.
- the wiring sheet according to any one of [1] to [4], has a structure in which the conductive linear bodies are arranged at intervals. Wiring sheet.
- One aspect of the present invention provides a wiring sheet that can suppress corrosion in humid and hot environments while achieving black coloring of conductive linear bodies compared to conventional wiring sheets.
- the wiring sheet 100 includes a wiring body 2 and a pair of electrodes 4.
- the wiring body 2 includes a conductive linear body 21.
- the pair of electrodes 4 are in direct contact with the conductive linear body 21.
- the conductive linear body 21 has an infrared reflectance of 0% or more and 90% or less at a wavelength of 1000 nm.
- the wiring sheet 100 exhibits a resistance change rate of 50% or less after being left for 1000 hours in a humid and hot environment at a temperature of 85°C and a relative humidity of 85% RH.
- the wiring sheet 100 further includes a substrate 1 and a resin layer 3.
- the wiring body 2 has a structure in which conductive linear bodies 21 are arranged.
- the resin layer 3 also supports the wiring body 2 directly or indirectly.
- the inventors speculate as follows as to why the wiring sheet 100 according to this embodiment, having the above-described configuration, is able to blacken the conductive linear members 21 while suppressing corrosion in a humid and hot environment.
- the infrared reflectivity of the conductive linear members 21 used in the wiring sheet 100 to a value lower than conventional values, diffuse reflection of light from the conductive linear members 21 is suppressed, thereby enabling the blackening of the conductive linear members 21.
- blackening can be achieved when carbon-coated conductive linear members are used.
- the wiring sheet has low durability to humid and hot conditions, resulting in a significant change in the resistance value of the wiring sheet.
- the wiring sheet 100 according to this embodiment is configured so that the rate of change in resistance after being left for 1000 hours in a humid and hot environment at a temperature of 85°C and a relative humidity of 85% RH is in the range of 50% or less. This improves the corrosion resistance of the conductive linear members 21 in a humid and hot environment. As a result, the wiring sheet 100 according to this embodiment can suppress corrosion in a humid and hot environment while achieving blackening of the conductive linear members 21.
- the substrate 1 can directly or indirectly support the wiring body 2.
- the substrate 1 is not necessarily provided.
- the substrate 1 is a member that is provided as needed.
- materials for the substrate 1 include resin, paper, metal, nonwoven fabric, cloth, and glass. Among these, from the viewpoint of strength or handleability, the material for the substrate 1 is preferably resin or glass.
- resins used for the substrate 1 include polyethylene, polypropylene, polystyrene, polycarbonate, and polyacetal.
- the covering layer is provided on at least one surface of the substrate 1. That is, the covering layer may be provided, for example, on the surface of the substrate 1 on which the pair of electrodes 4 are provided, or on the surface of the substrate 1 opposite the side on which the pair of electrodes 4 are provided.
- the covering layer may be provided in direct contact with the substrate 1.
- the pair of electrodes 4 may be provided in direct contact with the covering layer.
- the wiring sheet 100 can be easily used as a component for an optical sensor, for example. It is preferable that the transmittance of the coating layer for near-infrared rays with wavelengths of 905 nm to 1000 nm be such that the minimum value of the near-infrared transmittance in that wavelength range is within the above range.
- the organic pigment is not particularly limited and may include, for example, lactam black pigments, perylene pigments, phthalocyanine pigments, benzofuranone pigments, azo pigments, anthraquinone pigments, indanthrene pigments, isoindolinone pigments, quinacridone pigments, quinophthalone pigments, diketopyrrolopyrrole pigments, dioxazine pigments, and thioindigo pigments. These pigments may be used alone or in combination.
- the coloring pigment is preferably an organic pigment.
- At least one pigment selected from the group consisting of perylene pigments and phthalocyanine pigments which can be set to have a low refractive index and suppress light scattering. Furthermore, by including at least one pigment selected from the group consisting of perylene pigments and phthalocyanine pigments in the infrared-transmitting ink, it is possible to suppress the visible light transmittance of the coating layer while easily achieving infrared transmittance.
- the perylene-based pigment is not particularly limited as long as it is an organic pigment having a perylene skeleton.
- a perylene-based pigment has a structure in which two oxygen atoms constituting a six-membered ring of perylene tetracarboxylic dianhydride have been removed.
- Specific examples of perylene-based pigments include perylene red, perylene violet, and perylene black.
- Perylene-based pigments can be used alone or in combination of two or more.
- the resin component is not particularly limited and may include, for example, various resins such as acrylic resins, vinyl chloride resins, butyral resins, polyester resins, polyurethane resins, cellulose resins, and epoxy resins, and one or more of these may be used in combination. It is preferable that the resin component includes an acrylic resin. It is also preferable that the resin component is an acrylic resin.
- the infrared transparent ink may contain at least one additive such as a surfactant, surface conditioner, defoamer, leveling agent, curing accelerator, dispersant, light stabilizer, flow conditioner, polymerization inhibitor, and oxidation polymerization inhibitor.
- a surfactant such as a surfactant, surface conditioner, defoamer, leveling agent, curing accelerator, dispersant, light stabilizer, flow conditioner, polymerization inhibitor, and oxidation polymerization inhibitor.
- the thickness of the coating layer is preferably 1 ⁇ m or more, more preferably 2 ⁇ m or more, and even more preferably 4 ⁇ m or more.
- the thickness of the coating layer is preferably 30 ⁇ m or less, more preferably 20 ⁇ m or less, and even more preferably 15 ⁇ m or less.
- the wiring body 2 includes conductive linear bodies 21.
- the wiring body 2 has a structure in which the conductive linear bodies 21 are arranged. Furthermore, in the wiring sheet 100, the wiring body 2 has a structure in which a plurality of the conductive linear bodies 21 are arranged in parallel. In the wiring sheet 100, the wiring body 2 has a structure in which the plurality of conductive linear bodies 21 are arranged at intervals from one another.
- the wiring sheet 100 according to the present embodiment is a preferred example, and is not limited to this.
- the wiring body 2 does not have to have a structure in which the plurality of conductive linear bodies 21 are arranged at intervals from one another.
- the wiring body 2 may have a structure consisting of only one conductive linear body 21. When the wiring body 2 is composed of one conductive linear body 21, the wiring body 2 may have a pattern in which the single conductive linear body 21 has at least one bent portion.
- the conductive linear members 21 are linear when viewed in a plan view of the wiring sheet 100.
- the conductive linear members 21 may be wavy when viewed in a plan view of the wiring sheet 100. Examples of wavy shapes include a sine wave, a rectangular wave, a triangular wave, and a sawtooth wave.
- breakage of the conductive linear members 21 can be suppressed when the wiring sheet 100 is stretched in the axial direction of the conductive linear members 21.
- the diameter D (see FIG. 2 ) of the conductive linear body 21 is preferably 3 ⁇ m or more and 200 ⁇ m or less. From the viewpoints of suppressing an increase in sheet resistance and improving the heat generation efficiency and dielectric breakdown resistance characteristics of the wiring sheet 100, the diameter D of the conductive linear body 21 is more preferably 4 ⁇ m or more, and even more preferably 5 ⁇ m or more.
- the diameter D of the conductive linear body 21 is more preferably 150 ⁇ m or less, even more preferably 100 ⁇ m or less, even more preferably 50 ⁇ m or less, and even more preferably 20 ⁇ m or less.
- the cross section of the conductive linear body 21 is elliptical, it is preferable that the major axis is in the same range as the diameter D described above.
- the diameter D of the conductive linear body 21 is determined by observing the conductive linear body 21 using a digital microscope, measuring the diameter of the conductive linear body 21 at five randomly selected points, and taking the average value.
- the interval L (see FIG. 2 ) between the conductive linear bodies 21 is preferably 0.3 mm or more, more preferably 0.5 mm or more, even more preferably 0.8 mm or more, and particularly preferably 1.5 mm or more. Furthermore, the interval L between the conductive linear bodies 21 is preferably 50 mm or less, more preferably 30 mm or less, even more preferably 20 mm or less, and particularly preferably 5 mm or less. If the spacing between the conductive linear bodies 21 is within the above range, the conductive linear bodies 21 are relatively densely packed, which improves the functionality of the wiring sheet 100, such as maintaining low resistance of the wiring body 2.
- Condition (a) The infrared reflectance of the conductive linear body 21 at a wavelength of 1000 nm is 0% or more and 90% or less.
- Condition (b) The rate of change in resistance of the wiring sheet 100 after being left for 1000 hours in a humid and hot environment at a temperature of 85°C and a relative humidity of 85% RH is 50% or less.
- the conductive linear body 21 can be produced by, for example, etching, screen printing, inkjet printing, or the like.
- the conductive linear body 21 is preferably a linear body including a metal wire (hereinafter also referred to as a "metal wire linear body").
- Metal wire has high thermal conductivity, high electrical conductivity, and easy handling.
- Metal wire linear bodies can significantly reduce resistance, and even if the diameter of the metal wire linear body is extremely small, it can still pass the current required to heat the wiring sheet 100. This makes it possible to make the conductive linear body 21 less visible. In other words, using a metal wire linear body as the conductive linear body 21 reduces the resistance value of the wiring body 2 while improving light transmittance. Furthermore, the wiring sheet 100 is more likely to generate heat quickly. Furthermore, as described above, it is easy to obtain linear bodies with a small diameter.
- the metal wire linear body may be a linear body made of a single metal wire, or may be a linear body made of a plurality of twisted metal wires.
- metal wires include wires containing metals such as copper, aluminum, tungsten, iron, molybdenum, nickel, titanium, silver, and gold, or alloys containing two or more metals such as stainless steel, carbon steel, brass, phosphor bronze, zirconium-copper alloy, beryllium copper, iron-nickel, nichrome, nickel-titanium, Kanthal, Hastelloy, and rhenium-tungsten.
- wires containing one or more metals selected from tungsten and molybdenum, and alloys containing these, are preferred from the viewpoint of low volume resistivity.
- a linear body coated with sulfide or palladium may (i) be a linear body directly coated with sulfide or palladium, (ii) be a linear body coated with sulfide or palladium via a coating of a material other than sulfide or a material other than palladium, or (iii) be coated with a mixture of sulfide and a material other than sulfide, or a mixture of palladium and a material other than palladium.
- materials other than palladium include metals other than palladium, and metal oxides.
- the metal wire when the linear body coated with palladium is a metal wire, the metal wire may be directly coated with palladium alone, the metal wire may be coated with palladium alone via a coating of a metal other than palladium or a metal oxide, or the metal wire may be coated with a mixture of palladium and a metal other than palladium or a metal oxide.
- the conductive linear body 21 is preferably coated with silver sulfide. It is also preferable that the conductive linear body 21 be coated with a mixture of palladium and a metal other than palladium or a metal oxide.
- the conductive linear body 21 is coated with sulfide or palladium, the metallic luster is reduced, making it easier to make the metal wire less noticeable. Furthermore, if the metal wire is coated with sulfide or palladium, metal corrosion is more likely to be suppressed, making it easier to satisfy both conditions (a) and (b).
- the conductive linear body 21 is coated with a sulfide or palladium, the sulfide or palladium coating on the linear body can be formed, for example, by the plating and vapor deposition methods described above.
- the conductive linear body 21 may be, for example, a sulfide-plated linear body or a palladium-plated linear body.
- the conductive linear body 21 is preferably a silver sulfide-plated linear body. It is also preferable that the conductive linear body 21 be a linear body plated with a mixture of palladium and a metal or metal oxide other than palladium.
- the metal or metal oxide mixed with palladium is not particularly limited, and examples include one or more selected from the group consisting of copper, silver, and oxides of these metals.
- the infrared reflectance of the conductive linear body 21 at a wavelength of 1000 nm is 0% or more and 90% or less. From the viewpoint of blackening the conductive linear body 21, the infrared reflectance at a wavelength of 1000 nm is preferably 86% or less, more preferably 78% or less, even more preferably 74% or less, even more preferably 50% or less, even more preferably 35% or less, and even more preferably 30% or less. From the same viewpoint, the infrared reflectance of the conductive linear body 21 at a wavelength of 1000 nm may be 1% or more, 3% or more, 6% or more, 8% or more, or 10% or more.
- the infrared reflectance of the conductive linear body 21 at a wavelength of 1000 nm can be measured using the method described in the Examples below.
- the thickness of the resin layer 3 is not particularly limited. It may be equal to or greater than the diameter D of the conductive linear body 21, or it may be less than the diameter D of the conductive linear body 21. If the thickness of the resin layer 3 is equal to or greater than the diameter D of the conductive linear body 21, the wiring body 2 can be contained within the resin layer 3. If the thickness of the resin layer 3 is less than the diameter D of the conductive linear body 21, the wiring body 2 is exposed from the resin layer 3. Furthermore, if the wiring body 2 is exposed from the resin layer 3, it may be exposed on the side of the substrate 1 or on the side opposite the substrate 1.
- the thickness of the resin layer 3 is preferably 1 ⁇ m or greater, more preferably 3 ⁇ m or greater, and even more preferably 5 ⁇ m or greater.
- the thickness of the resin layer 3 is preferably 100 ⁇ m or less, more preferably 50 ⁇ m or less, and even more preferably 30 ⁇ m or less.
- the resin layer 3 is preferably a layer made of a cured product of a curable adhesive.
- curable adhesives include thermosetting adhesives that are cured by heat, and energy ray-curable adhesives.
- energy rays include ultraviolet rays, visible energy rays, infrared rays, and electron beams. Note that "energy ray curing” also includes thermal curing by heating using energy rays.
- the thermosetting adhesive preferably contains a thermosetting resin.
- Thermosetting resins are not particularly limited, and specific examples include epoxy resins, phenolic resins, melamine resins, urea resins, polyester resins, urethane resins, acrylic resins, benzoxazine resins, phenoxy resins, amine compounds, and acid anhydride compounds. These can be used alone or in combination of two or more. Among these, epoxy resins, phenolic resins, melamine resins, urea resins, amine compounds, and acid anhydride compounds are preferred as thermosetting resins, as they are suitable for curing using an imidazole curing catalyst.
- epoxy resins aromatic epoxy resins or cyclic epoxy resins such as alicyclic epoxy resins are preferred from the perspective of increasing the storage modulus of resin layer 3.
- epoxy resins with flexible segments such as oxyalkylene chains tend to decrease the storage modulus of resin layer 3.
- the weight average molecular weight (Mw) of the energy ray-curable resin is preferably 100 or more, and more preferably 300 or more. Furthermore, this weight average molecular weight is preferably 30,000 or less, and more preferably 10,000 or less. Note that the weight average molecular weight in this specification is a value measured by gel permeation chromatography (GPC) in terms of standard polystyrene.
- the adhesive may contain only one type of energy ray-curable resin, or two or more types. If two or more types of energy ray-curable resins are used, the combination and ratio of these resins can be selected as desired.
- a photopolymerization initiator or a thermal polymerization initiator When using an energy ray-curable resin or a thermosetting resin, it is preferable to use a photopolymerization initiator or a thermal polymerization initiator. By using a photopolymerization initiator or a thermal polymerization initiator, the polymerization reaction of the curable resin can be easily initiated, making it easier to control the curing reaction.
- Photopolymerization initiators include photoradical polymerization initiators such as benzophenone, acetophenone, benzoin, benzoin methyl ether, benzoin ethyl ether, benzoin isopropyl ether, benzoin isobutyl ether, benzoin benzoic acid, benzoin methyl benzoate, benzoin dimethyl ketal, 2,4-diethylthioxanthone, 1-hydroxycyclohexyl phenyl ketone, benzyl diphenyl sulfide, tetramethylthiuram monosulfide, azobisisobutyronitrile, 2-chloroanthraquinone, diphenyl(2,4,6-trimethylbenzoyl)phosphine oxide, and bis(2,4,6-trimethylbenzoyl)phenylphosphine oxide.
- photoradical polymerization initiators such as benzophenone, acetophenone, benzoin, be
- Photocationic polymerization initiators are compounds that generate cationic species when irradiated with energy rays, initiating the curing reaction of cationic curable compounds. They consist of a cationic moiety that absorbs energy rays and an anionic moiety that serves as an acid generation source.
- cationic photopolymerization initiators examples include sulfonium salt compounds, iodonium salt compounds, phosphonium salt compounds, ammonium salt compounds, antimonate compounds, diazonium salt compounds, selenium salt compounds, oxonium salt compounds, and bromine salt compounds.
- the cationic photopolymerization initiator is preferably a sulfonium salt compound, and more preferably an aromatic sulfonium salt compound having an aromatic group.
- sulfonium salt compounds include triphenylsulfonium hexafluorophosphate, triphenylsulfonium hexafluoroantimonate, and triphenylsulfonium tetrakis(pentafluorophenyl)borate.
- Phosphonium salt compounds include tri-n-butyl(2,5-dihydroxyphenyl)phosphonium bromide and hexadecyltributylphosphonium chloride.
- antimonate compounds include triphenylsulfonium hexafluoroantimonate, p-(phenylthio)phenyldiphenylsulfonium hexafluoroantimonate, and diaryliodonium hexafluoroantimonate.
- Thermal polymerization initiators include peroxodisulfates such as hydrogen peroxide, ammonium peroxodisulfate, sodium peroxodisulfate, and potassium peroxodisulfate; azo compounds such as 2,2'-azobis(2-amidinopropane) dihydrochloride, 4,4'-azobis(4-cyanovaleric acid), 2,2'-azobisisobutyronitrile, and 2,2'-azobis(4-methoxy-2,4-dimethylvaleronitrile); and thermal radical polymerization initiators such as organic peroxides such as benzoyl peroxide, lauroyl peroxide, peracetic acid, persuccinic acid, di-t-butyl peroxide, t-butyl hydroperoxide, and cumene hydroperoxide.
- peroxodisulfates such as hydrogen peroxide, ammonium peroxodisulfate, sodium peroxodisulfate, and potassium pe
- Sulfonium salts include triphenylsulfonium tetrafluoroborate, triphenylsulfonium hexafluoroantimonate, benzyl(4-hydroxyphenyl)methylsulfonium tetrakis(pentafluorophenyl)borate, (4-hydroxyphenyl)methyl(4-methylbenzyl)sulfonium tetrakis(pentafluorophenyl)borate, and triphenylsulfonium hexafluoroarsinate.
- Quaternary ammonium salts include tetrabutylammonium tetrafluoroborate, tetrabutylammonium hexafluorophosphate, and tetrabutylammonium hydrogen sulfate.
- Phosphonium salts include ethyltriphenylphosphonium hexafluoroantimonate and tetrabutylphosphonium hexafluoroantimonate.
- Diazonium salts include benzenediazonium chloride.
- Iodonium salts include diphenyliodonium hexafluoroarsinate, bis(4-chlorophenyl)iodonium hexafluoroarsinate, bis(4-bromophenyl)iodonium hexafluoroarsinate, and phenyl(4-methoxyphenyl)iodonium hexafluoroarsinate.
- polymerization initiators may be used alone or in combination of two or more.
- the amount used is preferably 0.1 parts by mass or more and 30 parts by mass or less, more preferably 0.3 parts by mass or more and 20 parts by mass or less, and particularly preferably 0.5 parts by mass or more and 10 parts by mass or less, relative to 100 parts by mass of the energy ray-curable resin or the thermosetting resin.
- thermosetting resin a thermosetting resin
- a curing catalyst such as an imidazole-based curing catalyst may also be used.
- the curable adhesive may contain, in addition to the energy ray-curable resin or thermosetting resin, a flexibility-adjusting component to facilitate maintaining the sheet shape before curing.
- a flexibility-adjusting component to facilitate maintaining the sheet shape before curing.
- polymers that can be used as flexibility-adjusting components include phenoxy resin, polyolefin resin or modified polyolefin resin, polyamide-imide resin, polyimide resin, rubber-based resin, and acrylic resin.
- These softness-adjusting ingredients can be used alone or in combination of two or more.
- the total amount of energy ray-curable resin or thermosetting resin contained in the adhesive is, from the viewpoint of adjusting the storage modulus of the resin layer 3, preferably 15 parts by mass or more and 300 parts by mass or less, more preferably 30 parts by mass or more and 250 parts by mass or less, and even more preferably 60 parts by mass or more and 200 parts by mass or less, per 100 parts by mass of the flexibility-adjusting component.
- the adhesive contains an energy ray-curable resin or thermosetting resin but does not contain a flexibility-adjusting component, the storage modulus of the resin layer 3 tends to be too high.
- the curable adhesive may or may not contain a filler. From the viewpoint of increasing the storage modulus of the resin layer 3 at 23°C, the curable adhesive may contain a filler. From the viewpoint of suppressing an increase in the storage modulus of the resin layer 3 at 23°C, the curable adhesive may not contain a filler.
- Fillers include, for example, inorganic powders such as silica, alumina, talc, calcium carbonate, titanium white, red iron oxide, silicon carbide, and boron nitride; beads made by spheroidizing inorganic powders, single-crystal fibers, and glass fibers. Of these, silica filler and alumina filler are preferred. Fillers may be used alone or in combination of two or more types.
- the curable adhesive may contain other components.
- other components include well-known additives such as organic solvents, coupling agents, flame retardants, tackifiers, UV absorbers, antioxidants, preservatives, antifungal agents, plasticizers, antifoaming agents, and wettability adjusters.
- the relationship between the resistance value R of the electrode 4 in the axial direction and the overall resistance value r of the conductive linear body 21 in the axial direction satisfies the condition expressed by the following formula (F1).
- the condition expressed by the following formula (F1) is satisfied, heat generation of the electrode 4 can be reduced. r>R...(F1)
- R/r is preferably 0.0001 or greater, and more preferably 0.0005 or greater. Furthermore, R/r is preferably 0.3 or less, and more preferably 0.15 or less.
- wiring sheet 100 When using wiring sheet 100 as a heating element, wiring body 2 needs to have a certain degree of resistance in order to generate heat, while electrodes 4 preferably allow current to flow as easily as possible.
- the Young's modulus of the electrode 4 is preferably more than 1 ⁇ 10 9 Pa and not more than 1 ⁇ 10 11 Pa. If the Young's modulus of the electrode 4 is 1 ⁇ 10 11 Pa or less, the contact resistance between the conductive linear body 21 and the electrode 4 tends to be smaller. From the same viewpoint, the Young's modulus of the electrode 4 is more preferably 8.5 ⁇ 10 10 Pa or less, and even more preferably 7 ⁇ 10 10 Pa or less. The Young's modulus of the electrode 4 may be 2 ⁇ 10 9 Pa or more, 3 ⁇ 10 9 Pa or more, or 5 ⁇ 10 9 Pa or more.
- the Young's modulus of the electrode 4 can be measured by a continuous stiffness measurement method.
- the Young's modulus of the electrode 4 provided on a glass substrate at 25° C. can be measured using a nanoindenter (manufactured by MTS Systems) under the following conditions.
- the maximum thickness of the electrode 4 is preferably 40 ⁇ m or less.
- the maximum thickness of the electrode 4 is more preferably 30 ⁇ m or less, and even more preferably 20 ⁇ m or less. If the maximum thickness of the electrode 4 is 40 ⁇ m or less, deformation of the conductive linear body 21 tends to be small when the conductive linear body 21 and the electrode 4 are brought into contact, and conductivity tends to be more stable.
- the maximum thickness of the electrode 4 is preferably 5 ⁇ m or more, more preferably 8 ⁇ m or more, and even more preferably 10 ⁇ m or more.
- the maximum width of the electrode 4 is preferably 1 mm or more and 10 mm or less.
- the maximum width of one of the electrodes 4 is preferably within the above range.
- the maximum width of the electrode 4 is more preferably 1.5 mm or more, and even more preferably 2 mm or more.
- the maximum width of the electrode 4 is more preferably 8 mm or less, even more preferably 6 mm or less, and even more preferably 4 mm or less.
- the maximum width of the electrode 4 is 1 mm or more and 10 mm or less, it is easier to ensure contact points with the conductive linear members 21.
- Conductive pastes include silver paste, copper paste, and carbon paste. Of these, silver paste is preferred as the conductive paste from the standpoint of low volume resistivity.
- the metal of the metal foil or metal wire examples include copper, aluminum, tungsten, iron, molybdenum, nickel, titanium, silver, and gold; or alloys containing two or more metals, such as steels such as stainless steel and carbon steel, brass, phosphor bronze, zirconium-copper alloys, beryllium copper, iron-nickel, nichrome, nickel-titanium, Kanthal, Hastelloy, and rhenium-tungsten.
- the metal foil or metal wire may also be plated with gold, tin, zinc, silver, nickel, chromium, nickel-chromium alloys, solder, or the like.
- the metal wire may be one or two or more.
- the electrode 4 is preferably gold-plated. This gold plating process can suppress migration of the electrode 4.
- the wiring sheet 100 according to the present embodiment can be suitably used, for example, as a sheet heater.
- examples of uses of the sheet heater include a window defogger and a defroster.
- the wiring sheet 100 can also be used as a flat cable for wiring electrical signals.
- the wiring sheet 100 according to the present embodiment can also be used as a heater for an optical sensor.
- the heater for the optical sensor can be used, for example, as a heater for an optical sensor such as a LiDAR sensor.
- the resistance change rate when the wiring sheet 100 is used or stored in a humid and hot environment at a temperature of 85°C and a relative humidity of 85% RH is preferably 20% or less, more preferably 18% or less, even more preferably 17% or less, even more preferably 15% or less, and even more preferably 13% or less.
- the resistance change rate when the wiring sheet 100 is used or stored in a humid and hot environment at a temperature of 85°C and a relative humidity of 85% RH is preferably 0% or close to 0%.
- the resistance change rate when the wiring sheet 100 is used or stored in a humid and hot environment may be 0% or more, or even 0.1% or more.
- the method for manufacturing the wiring sheet 100 according to the present embodiment is not particularly limited.
- the method for manufacturing the wiring sheet 100 according to the present embodiment is one example of a method capable of producing the above-described wiring sheet 100.
- the wiring sheet 100 can be manufactured, for example, by the following steps.
- a process for producing a wiring sheet including wiring body 2 is performed.
- a resin layer 3 is formed on a release sheet. If the resin layer 3 is formed from a thermosetting adhesive, the thermosetting adhesive for forming the resin layer 3 is applied to form a coating film. Next, the coating film is dried to produce an adhesive layer as the resin layer 3.
- conductive linear bodies 21 are arranged and placed on the adhesive layer to form the wiring body 2. For example, with the adhesive layer with a release sheet placed on the outer surface of a drum member, the drum member is rotated and the conductive linear bodies 21 are spirally wound around the adhesive layer. Then, the bundle of spirally wound conductive linear bodies 21 is cut along the axial direction of the drum member.
- a process is performed to provide a pair of electrodes 4 on the substrate 1.
- a conductive paste or the like is printed in a predetermined arrangement on the substrate 1, and then dried, etc., to provide the pair of electrodes 4.
- the following effects can be achieved.
- (1) According to this embodiment even when used or stored in a humid and hot environment (for example, an environment at a temperature of 85° C. and a relative humidity of 85% RH), changes in the resistance value of wiring sheet 100 can be suppressed.
- the conductive linear body 21 can be blackened by setting the infrared reflectance at a wavelength of 1000 nm of the conductive linear body 21 to a range of 0% to 90%. This makes it possible to impart design features to the wiring sheet 100, for example.
- the wiring sheet 100 can be used as a heater for an optical sensor, for example.
- the resin layer 3 can fix the conductive linear body 21, suppress deformation in the thickness direction inside the wiring sheet 100, stabilize the contact between the conductive linear body 21 and the electrode 4, and stabilize the resistance value of the wiring body 2.
- interconnect sheet 100 includes substrate 1, but is not limited to this.
- interconnect sheet 100 does not have to include substrate 1.
- interconnect sheet 100 can be used by being attached to an adherend by resin layer 3.
- the resin layer 3 is disposed on the surface of the wiring sheet 100, but this is not limiting.
- a protective sheet (not shown) may be provided on the resin layer 3 of the wiring sheet 100 to protect the wiring body 2.
- a tungsten plate having the same composition as the wire used in each Example and Comparative Example was plated with silver sulfide, palladium, copper oxide-palladium, or gold, each having the same composition as the plating layer used in each Example and Comparative Example 2, or a carbon coating having the same composition as the coating layer used in Comparative Example 1, to form a plating layer or coating layer of the respective material on the tungsten plate.
- the plating layer or coating layer was formed in the same manner as the plated tungsten wire or carbon-coated tungsten wire used in each Example and Comparative Example.
- a curable adhesive was obtained by blending 100 parts by mass of phenoxy resin (manufactured by Mitsubishi Chemical Corporation, product name "YX7200B35”) with 170 parts by mass of a polyfunctional hydrogenated bisphenol A diglycidyl ether epoxy compound (manufactured by Mitsubishi Chemical Corporation, product name "YX8000”), 0.2 parts by mass of 8-glycidoxyoctyltrimethoxysilane as a silane coupling agent, and 2 parts by mass of benzyl(4-hydroxyphenyl)methylsulfonium tetrakis(pentafluorophenyl)borate and 2 parts by mass of (4-hydroxyphenyl)methyl(4-methylbenzyl)sulfonium tetrakis(pentafluorophenyl)borate as thermal cationic polymerization initiators.
- phenoxy resin manufactured by Mitsubishi Chemical Corporation, product name "YX7200B35
- [Preparation Example 3] (Preparation of adhesive composition) 100 parts by mass of the (meth)acrylic acid ester polymer (A) obtained in the above process, 0.18 parts by mass of trimethylolpropane-modified tolylene diisocyanate as the crosslinking agent (B), 7 parts by mass of ⁇ -caprolactone-modified tris-(2-acryloxyethyl)isocyanurate as the active energy ray-curable component (C), 0.7 parts by mass of a mixture of benzophenone and 1-hydroxycyclohexyl phenyl ketone in a 1:1 mass ratio as the photopolymerization initiator (D), and 0.28 parts by mass of 3-glycidoxypropyltrimethoxysilane as the silane coupling agent were mixed, thoroughly stirred, and diluted with methyl ethyl ketone to obtain a coating solution of a pressure-sensitive adhesive composition.
- Example 1 (Preparation of silver sulfide-plated tungsten wire) A sulfurizing solution was prepared by adding 3.5 g of potassium sulfide to 1 L of water. A silver-plated tungsten wire (diameter 12 ⁇ m, volume resistivity 5.5 ⁇ 10 ⁇ 8 ⁇ m) was immersed in the sulfurizing solution to prepare a silver sulfide-plated tungsten wire. The thickness of the silver sulfide plating layer on the prepared silver sulfide-plated tungsten wire was 0.1 ⁇ m. The silver sulfide-plated tungsten wire had a hue close to black.
- the curable adhesive obtained in Preparation Example 1 was applied to a thickness of 10 ⁇ m on a 38 ⁇ m thick release sheet (manufactured by Lintec Corporation, product name "SP-PET382150”) and cut into a 250 mm x 320 mm rectangle to produce an adhesive sheet with a curable adhesive layer (hereinafter sometimes referred to as the adhesive layer).
- the silver sulfide-plated tungsten wire (hereinafter sometimes referred to as the wire) produced above was prepared as the conductive linear body.
- the adhesive sheet obtained above was wrapped around a drum member with a rubber outer periphery, with the surface of the adhesive layer facing outward and without wrinkles, and both ends of the adhesive sheet in the circumferential direction were fixed with double-sided tape.
- the wire wound around the bobbin was attached to the surface of the adhesive layer of the adhesive sheet located near the end of the drum member, and the wire was then unwound and wound around the drum member.
- the drum member was gradually moved in a direction parallel to the drum axis so that the wire was wound around the drum member in a spiral at equal intervals of 3 mm. This resulted in a wiring body with 96 wires arranged on the surface of the adhesive layer.
- the wires were then cut, and the wiring body was removed from the drum member.
- the wiring body was cut into a 40 mm x 82 mm width so that 12 wires could be removed, and a wiring body sheet was produced.
- the overall resistance value r in the axial direction of the conductive linear body was 4.93 ⁇
- composition for forming coating layer A visible light-absorbing infrared transparent ink (manufactured by Jujo Chemical Co., Ltd., product name "TG-IR Ink PB-A Black") was prepared as the infrared transparent ink.
- This infrared transparent ink contains a perylene-based pigment. 2 parts by mass of 3-aminopropyltrimethoxysilane and 5 parts by mass of trimethylolpropane adduct xylylene diisocyanate were blended with 100 parts by mass of this infrared transparent ink to obtain a coating layer-forming composition.
- the coating layer-forming composition prepared above was screen printed on the surface opposite to the electrode-provided surface of the electrode-equipped substrate to form a coating film.
- the coating film was then dried under two-stage drying conditions: 10 minutes at 90 ° C., followed by 30 minutes at 150 ° C., to form a coating layer with a thickness of 6 ⁇ m on the substrate.
- the coating layer formed from the coating layer-forming composition was colored black, and had a maximum transmittance of 89% and a minimum of 86% for near-infrared light with a wavelength of 905 nm to 1000 nm, and a maximum transmittance of 5% and a minimum of 0% for visible light with a wavelength of 380 nm to 700 nm.
- the refractive index of near-infrared light with a wavelength of 905 nm was 2.10.
- the wiring sheet prepared above was attached to the substrate with electrodes so that the electrodes were located at both ends of the wires, and then heated at a temperature of 120°C under a pressure of 0.5 MPa for 30 minutes to obtain the wiring sheet of Example 1.
- the protective sheet was attached to the wiring sheet so that the electrodes of the wiring sheet and the circles of the protective sheet were aligned. Then, ultraviolet light with a wavelength of 365 nm was irradiated at an illuminance of 200 mW/cm 2 and a light quantity of 1000 mJ/cm 2 to obtain a wiring sheet with the protective sheet.
- a copper-plated tungsten wire (diameter 12 ⁇ m, volume resistivity 4.23 ⁇ 10 ⁇ 8 ⁇ m) was immersed in a plating solution containing palladium ("OPC Black Copper", manufactured by Okuno Chemical Industries Co., Ltd.), and then treated with an anti-tarnish agent ("OPC Black Keep”, manufactured by Okuno Chemical Industries Co., Ltd.) to produce a copper oxide-palladium-plated tungsten wire.
- the copper oxide-palladium-plated tungsten wire has a plating layer containing a mixture of copper oxide and palladium on the tungsten wire. The thickness of the copper oxide-palladium plating layer on the produced copper oxide-palladium-plated tungsten wire was 0.2 ⁇ m.
- Example 1 A wiring sheet with a protective sheet was produced in the same manner as in Example 1, except that a carbon-coated tungsten wire (diameter 12 ⁇ m, volume resistivity 5.5 ⁇ 10 ⁇ 8 ⁇ m) was used as the conductive linear body instead of the silver sulfide-plated tungsten wire.
- the carbon-coated tungsten wire has a hue close to black.
- Example 2 A wiring sheet with a protective sheet was produced in the same manner as in Example 1, except that gold-plated tungsten wire (diameter 12 ⁇ m, volume resistivity 5.5 ⁇ 10 ⁇ 8 ⁇ m) was used as the conductive linear body instead of the silver sulfide-plated tungsten wire.
- the gold-plated tungsten wire does not have a hue close to black.
- the wiring sheets obtained in each example demonstrated better results in both reflectance evaluation and resistance evaluation compared to the wiring sheets obtained in each comparative example. Furthermore, each example with a low rate of change in resistance and low infrared reflectance also demonstrated good appearance evaluation and excellent design.
- Figure 3 shows a graph showing the relationship between time and the rate of change in resistance when the wiring sheet is left in an environment at a temperature of 85°C and a relative humidity of 85% RH.
- the horizontal axis represents the time of leaving, and the vertical axis represents the rate of change in resistance.
- E represents the wiring sheet produced in Example 1
- C represents the wiring sheet produced in Comparative Example 1.
- the wiring sheet produced in Example 1 shows a larger rate of change in resistance over time than the wiring sheet produced in Comparative Example 1.
Landscapes
- Laminated Bodies (AREA)
Abstract
Description
本発明は、配線シートに関する。 The present invention relates to a wiring sheet.
配線体を備える配線シートが知られている。この配線シートは、例えば、発熱するテキスタイルの材料、種々の物品を発熱させる部材、及びセンサ等に適用される発熱装置の発熱体等に利用できる。 Wiring sheets equipped with wiring bodies are known. These wiring sheets can be used, for example, as materials for heat-generating textiles, components that generate heat in various items, and heating elements in heat-generating devices used in sensors and the like.
特許文献1には、接触センサを備える配線シートが開示されている。特許文献1に開示されるセンサは、複数の導電性線状体が間隔をもって配列された疑似シート構造体と、前記導電性線状体に電気的に接続する第一電極と、前記疑似シート構造体および前記第一電極に離間して配置され、前記疑似シート構造体の平面視において、前記導電性線状体と交差し、かつ前記第一電極と重ならない第二電極とを備える接触センサである。 Patent Document 1 discloses a wiring sheet equipped with a contact sensor. The sensor disclosed in Patent Document 1 is a contact sensor comprising a pseudo-sheet structure in which a plurality of conductive linear bodies are arranged at intervals, a first electrode electrically connected to the conductive linear bodies, and a second electrode disposed at a distance from the pseudo-sheet structure and the first electrode, which intersects with the conductive linear bodies but does not overlap with the first electrode in a plan view of the pseudo-sheet structure.
特許文献2には、導電性材料の発泡体によって構成される感圧発熱部を有する感圧発熱素子が開示されている。特許文献2に開示される感圧発熱素子において、前記感圧発熱部は、通電されると発熱し、圧縮荷重を受けると弾性変形し、通電されている状態かつ圧縮荷重を受ける状態にある場合には、圧縮荷重が増大するほど発熱量が増大する。また、特許文献2に開示される感圧発熱素子には、導電布が設けられている。 Patent Document 2 discloses a pressure-sensitive heating element having a pressure-sensitive heating section made of a foamed conductive material. In the pressure-sensitive heating element disclosed in Patent Document 2, the pressure-sensitive heating section generates heat when electricity is applied, and elastically deforms when subjected to a compressive load. When electricity is applied and the compressive load is applied, the amount of heat generated increases as the compressive load increases. The pressure-sensitive heating element disclosed in Patent Document 2 is also provided with a conductive cloth.
特許文献3には、透明フィルム基材の表面に透明発熱層を有する透明フィルムヒーターが開示されている。特許文献3に開示される透明フィルムヒーターにおいて、前記透明発熱層が少なくとも金属ナノワイヤーを含む。 Patent Document 3 discloses a transparent film heater having a transparent heat-generating layer on the surface of a transparent film substrate. In the transparent film heater disclosed in Patent Document 3, the transparent heat-generating layer contains at least metal nanowires.
例えば、特許文献1の配線シートには、金めっきが施された線状体が用いられている。特許文献1に開示される配線シートは、湿熱環境下で使用又は保管した場合にも高い耐食性を有する。 For example, the wiring sheet in Patent Document 1 uses gold-plated linear elements. The wiring sheet disclosed in Patent Document 1 has high corrosion resistance even when used or stored in a humid and hot environment.
ところで、配線シートには、例えば、より意匠性の高い配線シートに構成することが要求される場合がある。また、配線シートには、例えば、LiDAR(Light Detection and Ranging又はLaser Imaging Detection and Ranging)等の光学センサのヒーターとして、より適した配線シートに構成することが要求される場合がある。これらの要求に対応するため、例えば、配線シートに用いられる通電を可能にする部材を黒色化することが考えられる。 However, there are cases where wiring sheets are required to be constructed with, for example, a more aesthetically pleasing design. Furthermore, there are cases where wiring sheets are required to be constructed with a design that is more suitable for use as heaters for optical sensors such as LiDAR (Light Detection and Ranging or Laser Imaging Detection and Ranging). To meet these demands, it is conceivable to, for example, color the components used in wiring sheets that allow electricity to flow black.
特許文献2に開示される感圧発熱素子には、通電を可能にする導電布として、カーボンコート付きの銅-ニッケルめっき織布が使用されている。特許文献2の感圧発熱素子を、湿熱環境下で使用又は保管した場合には、カーボンコート付きの銅-ニッケルめっき織布が使用されているため、腐食が生じる。このため、特許文献2の感圧発熱素子は、湿熱環境下での耐食性が低い。特許文献3の透明フィルムヒーターには、銀ナノワイヤーが用いられている。特許文献3の透明フィルムヒーターに用いられている銀ナノワイヤーは、硫化安定性のために、銀合金とすることが記載されている。この銀ナノワイヤーは黒色化されていない。また、特許文献3の銀ナノワイヤーは、湿熱環境下で使用又は保管した場合の腐食安定性に難がある。 The pressure-sensitive heating element disclosed in Patent Document 2 uses a carbon-coated copper-nickel plated woven fabric as the conductive fabric that enables electrical conduction. When the pressure-sensitive heating element of Patent Document 2 is used or stored in a humid and hot environment, corrosion occurs due to the use of a carbon-coated copper-nickel plated woven fabric. For this reason, the pressure-sensitive heating element of Patent Document 2 has low corrosion resistance in humid and hot environments. The transparent film heater of Patent Document 3 uses silver nanowires. It is disclosed that the silver nanowires used in the transparent film heater of Patent Document 3 are made of a silver alloy for sulfide stability. These silver nanowires are not blackened. Furthermore, the silver nanowires of Patent Document 3 have poor corrosion stability when used or stored in a humid and hot environment.
例えば、特許文献1に開示されるような配線体において、導電性線状体を、特許文献2に開示されるカーボン被覆した線状体とすることによって、より意匠性の高い配線体が得られると考えられる。しかしながら、カーボン被覆した線状体を用いた配線シートを構成した場合、例えば、湿熱環境下で使用又は保管すると、配線シートに腐食が生じることにより、配線シートの抵抗値が上昇してしまうことが懸念される。 For example, in a wiring body such as that disclosed in Patent Document 1, it is believed that a wiring body with a more aesthetically pleasing design can be obtained by replacing the conductive linear bodies with the carbon-coated linear bodies disclosed in Patent Document 2. However, if a wiring sheet is made using carbon-coated linear bodies, there is a concern that corrosion may occur in the wiring sheet when it is used or stored in a humid and hot environment, for example, and the resistance value of the wiring sheet may increase.
本発明の目的は、導電性線状体の黒色化を達成しつつ、湿熱環境下での腐食を抑制できる配線シートを提供することである。 The object of the present invention is to provide a wiring sheet that can blacken conductive linear bodies while suppressing corrosion in humid and hot environments.
[1] 導電性線状体を備える配線体と、
前記導電性線状体に直接的に接触する一対の電極と、
を備え、
前記導電性線状体の波長1000nmにおける赤外線反射率が、0%以上、90%以下であり、
温度85℃、相対湿度85%RHの湿熱環境下で1000時間静置した後の抵抗値変化率が、50%以下である、
配線シート。
[1] A wiring body including a conductive linear body;
a pair of electrodes in direct contact with the conductive linear body;
Equipped with
the conductive linear body has an infrared reflectance of 0% or more and 90% or less at a wavelength of 1000 nm;
The rate of change in resistance value after leaving the capacitor for 1000 hours in a humid and hot environment at a temperature of 85°C and a relative humidity of 85% RH is 50% or less.
Wiring sheet.
[2] [1]に記載の配線シートにおいて、
前記電極の軸方向における抵抗値Rと、前記導電性線状体の軸方向における全体の抵抗値rとの関係が、下記数式(F1)で表される条件を満たす、
配線シート。
r>R ・・・(F1)
[2] The wiring sheet according to [1],
a relationship between a resistance value R of the electrode in the axial direction and a total resistance value r of the conductive linear body in the axial direction satisfies the condition expressed by the following formula (F1):
Wiring sheet.
r>R...(F1)
[3] [1]又は[2]に記載の配線シートにおいて、
さらに、前記配線体を直接的又は間接的に支持する樹脂層を、備える、
配線シート。
[3] The wiring sheet according to [1] or [2],
Further, a resin layer is provided to directly or indirectly support the wiring body.
Wiring sheet.
[4] [1]から[3]のいずれか一項に記載の配線シートにおいて、
前記電極の幅の最大値が、1mm以上、10mm以下である、
配線シート。
[4] The wiring sheet according to any one of [1] to [3],
The maximum width of the electrode is 1 mm or more and 10 mm or less.
Wiring sheet.
[5] [1]から[4]のいずれか一項に記載の配線シートにおいて、
前記配線体は、前記導電性線状体が間隔をもって配列された構造を有する、
配線シート。
[5] The wiring sheet according to any one of [1] to [4],
The wiring body has a structure in which the conductive linear bodies are arranged at intervals.
Wiring sheet.
[6] [1]から[5]のいずれか一項に記載の配線シートにおいて、
前記配線体は、一本の前記導電性線状体のみからなる、
配線シート。
[6] The wiring sheet according to any one of [1] to [5],
The wiring body is composed of only one of the conductive linear bodies.
Wiring sheet.
[7] [1]から[6]のいずれか一項に記載の配線シートにおいて、
前記導電性線状体が、硫化物又はパラジウムで被覆されている、
配線シート。
[7] The wiring sheet according to any one of [1] to [6],
The conductive linear body is coated with sulfide or palladium.
Wiring sheet.
[8] [1]から[7]のいずれか一項に記載の配線シートにおいて、
前記導電性線状体が、硫化銀で被覆されている、
配線シート。
[8] The wiring sheet according to any one of [1] to [7],
The conductive linear body is coated with silver sulfide.
Wiring sheet.
本発明の一態様によれば、従来の配線シートに比べ、導電性線状体の黒色化を達成しつつ、湿熱環境下での腐食を抑制できる配線シートを提供できる。 One aspect of the present invention provides a wiring sheet that can suppress corrosion in humid and hot environments while achieving black coloring of conductive linear bodies compared to conventional wiring sheets.
[実施形態]
以下、本発明について実施形態を例に挙げて、図面に基づいて説明する。本発明は実施形態の内容に限定されない。なお、図面においては、説明を容易にするために拡大又は縮小をして図示した部分がある。
[Embodiment]
The present invention will be described below with reference to the drawings, taking an embodiment as an example. The present invention is not limited to the content of the embodiment. In the drawings, some parts are illustrated enlarged or reduced in size for ease of explanation.
[配線シート]
本実施形態に係る配線シート100は、図1及び図2に示されるように、配線体2と、一対の電極4と、を備えている。配線体2は、導電性線状体21を備えている。一対の電極4は、導電性線状体21に直接的に接触している。そして、導電性線状体21の波長1000nmにおける赤外線反射率が、0%以上、90%以下である。また、配線シート100は、温度85℃、相対湿度85%RHの湿熱環境下で1000時間静置した後の抵抗値変化率が、50%以下である。
[Wiring sheet]
As shown in Figures 1 and 2, the wiring sheet 100 according to this embodiment includes a wiring body 2 and a pair of electrodes 4. The wiring body 2 includes a conductive linear body 21. The pair of electrodes 4 are in direct contact with the conductive linear body 21. The conductive linear body 21 has an infrared reflectance of 0% or more and 90% or less at a wavelength of 1000 nm. Furthermore, the wiring sheet 100 exhibits a resistance change rate of 50% or less after being left for 1000 hours in a humid and hot environment at a temperature of 85°C and a relative humidity of 85% RH.
図1及び図2に示されるように、配線シート100は、さらに、基材1と、樹脂層3とを備えている。配線シート100において、配線体2は、導電性線状体21が、配列された構造を有する。また、樹脂層3は、配線体2を直接的又は間接的に支持する。 As shown in Figures 1 and 2, the wiring sheet 100 further includes a substrate 1 and a resin layer 3. In the wiring sheet 100, the wiring body 2 has a structure in which conductive linear bodies 21 are arranged. The resin layer 3 also supports the wiring body 2 directly or indirectly.
本実施形態に係る配線シート100が、上記構成を有することにより、導電性線状体21の黒色化を達成しつつ、湿熱環境下での腐食を抑制できる理由について、本発明者らは、以下のように推察している。配線シート100に用いられている導電性線状体21の赤外線に対する反射率を、従来よりも低く抑えることにより、導電性線状体21の光の乱反射が抑制されるため、導電性線状体21の黒色化が実現できる。例えば、導電性線状体として、カーボン被覆された線状体を用いた場合、黒色化の達成は可能である。しかし、カーボン被覆された線状体を用いた場合、配線シートは、湿熱耐久性が低くなるため、配線シートの抵抗値が大きく変化する。配線シート100においては、導電性線状体21が間隔をもって配列された構造を有している。このような構造を有する配線シートの導電性線状体として、カーボン被覆された線状体を用いた場合、湿熱環境下で使用又は保管したとき、導電性線状体に腐食が生じることで、配線シートの抵抗値の変化率が大きくなる。一方、本実施形態に係る配線シート100において、導電性線状体21の波長1000nmにおける赤外線反射率が、0%以上、90%以下の範囲となるように、導電性線状体21を構成する。これにより、導電性線状体21の黒色化を達成することができる。さらに、本実施形態に係る配線シート100において、温度85℃、相対湿度85%RHの湿熱環境下で1000時間静置した後の抵抗値変化率が、50%以下の範囲となるように構成する。これにより、湿熱環境下における導電性線状体21の耐食性が向上する。その結果として、本実施形態に係る配線シート100は、導電性線状体21の黒色化を達成しつつ、湿熱環境下での腐食を抑制できる。 The inventors speculate as follows as to why the wiring sheet 100 according to this embodiment, having the above-described configuration, is able to blacken the conductive linear members 21 while suppressing corrosion in a humid and hot environment. By reducing the infrared reflectivity of the conductive linear members 21 used in the wiring sheet 100 to a value lower than conventional values, diffuse reflection of light from the conductive linear members 21 is suppressed, thereby enabling the blackening of the conductive linear members 21. For example, blackening can be achieved when carbon-coated conductive linear members are used. However, when carbon-coated conductive linear members are used, the wiring sheet has low durability to humid and hot conditions, resulting in a significant change in the resistance value of the wiring sheet. The wiring sheet 100 has a structure in which the conductive linear members 21 are arranged at intervals. When carbon-coated conductive linear members are used as the conductive linear members of a wiring sheet having such a structure, corrosion occurs in the conductive linear members when the wiring sheet is used or stored in a humid and hot environment, resulting in a large rate of change in the resistance value of the wiring sheet. Meanwhile, in the wiring sheet 100 according to this embodiment, the conductive linear members 21 are configured so that their infrared reflectance at a wavelength of 1000 nm is in the range of 0% to 90%. This allows the conductive linear members 21 to be blackened. Furthermore, the wiring sheet 100 according to this embodiment is configured so that the rate of change in resistance after being left for 1000 hours in a humid and hot environment at a temperature of 85°C and a relative humidity of 85% RH is in the range of 50% or less. This improves the corrosion resistance of the conductive linear members 21 in a humid and hot environment. As a result, the wiring sheet 100 according to this embodiment can suppress corrosion in a humid and hot environment while achieving blackening of the conductive linear members 21.
(基材)
基材1は、配線体2を直接的又は間接的に支持できる。なお、基材1は、必ずしも備えていなくてもよい。基材1は必要に応じて設けられる部材である。
基材1の材質としては、樹脂、紙、金属、不織布、布、及びガラス等が挙げられる。これらの中でも、強度又はハンドリング性の観点から、基材1の材質は、樹脂又はガラス等であることが好ましい。基材1に用いられる樹脂としては、ポリエチレン、ポリプロピレン、ポリスチレン、ポリカーボネート、及びポリアセタール等が挙げられる。
(Base material)
The substrate 1 can directly or indirectly support the wiring body 2. The substrate 1 is not necessarily provided. The substrate 1 is a member that is provided as needed.
Examples of materials for the substrate 1 include resin, paper, metal, nonwoven fabric, cloth, and glass. Among these, from the viewpoint of strength or handleability, the material for the substrate 1 is preferably resin or glass. Examples of resins used for the substrate 1 include polyethylene, polypropylene, polystyrene, polycarbonate, and polyacetal.
基材1は、着色剤を含有していてもよく、着色剤を含有していなくてもよい。この着色剤により、配線シート100における可視光及び近赤外光の透過率を、目的とする範囲内に調整できる。また、着色剤は、基材1の内部に含有していてもよく、基材1の外側に設けられた被覆層(不図示)に含まれていてもよい。被覆層は必要に応じて設けられる層である。 The substrate 1 may or may not contain a colorant. The colorant allows the visible light and near-infrared light transmittance of the wiring sheet 100 to be adjusted to within the desired range. The colorant may be contained inside the substrate 1, or may be contained in a coating layer (not shown) provided on the outside of the substrate 1. The coating layer is a layer that is provided as needed.
配線シート100が、基材1の外側に、図示しない被覆層を備える場合、被覆層は、基材1の少なくとも一方の面に設けられる。すなわち、被覆層は、例えば、基材1の一対の電極4が設けられる側の面に設けられてもよく、基材1の一対の電極4が設けられる側とは反対側の面に設けられてもよい。被覆層は、基材1に、直接、接して設けられていてもよい。被覆層が、基材1の一対の電極4が設けられる側の面に設けられる場合、一対の電極4は、被覆層に直接、接して設けられていてもよい。 When the wiring sheet 100 includes a covering layer (not shown) on the outside of the substrate 1, the covering layer is provided on at least one surface of the substrate 1. That is, the covering layer may be provided, for example, on the surface of the substrate 1 on which the pair of electrodes 4 are provided, or on the surface of the substrate 1 opposite the side on which the pair of electrodes 4 are provided. The covering layer may be provided in direct contact with the substrate 1. When the covering layer is provided on the surface of the substrate 1 on which the pair of electrodes 4 are provided, the pair of electrodes 4 may be provided in direct contact with the covering layer.
基材1が被覆層を持つ場合、被覆層は、波長380nmから700nmの可視光透過率が10%以下であることが好ましい。被覆層の波長380nmから700nmの可視光透過率は、8%以下であることがより好ましく、6%以下であることがさらに好ましい。被覆層の色相は、380nm以上、700nm以下の波長範囲である可視光透過率が10%以下に調整できれば、特に限定されない。被覆層は、例えば、黒色に着色されていることが好ましい。黒色とは、一般的に黒色と認識される色相であればよい。被覆層が黒色に着色される場合、例えば、一種類の色材を含む赤外線透過インクによって黒色に着色されていてもよく、二種以上の色材を含む赤外線透過インクによって黒色に着色されていてもよく、異なる色を呈する複数の赤外線透過インクによって黒色に着色されていてもよい。なお、被覆層の波長380nmから700nmの可視光透過率は、当該波長範囲における可視光透過率の最高値が上記範囲であることが好ましい。 If the substrate 1 has a coating layer, the coating layer preferably has a visible light transmittance of 10% or less for wavelengths from 380 nm to 700 nm. The visible light transmittance of the coating layer for wavelengths from 380 nm to 700 nm is more preferably 8% or less, and even more preferably 6% or less. The hue of the coating layer is not particularly limited as long as the visible light transmittance in the wavelength range of 380 nm to 700 nm can be adjusted to 10% or less. The coating layer is preferably colored, for example, black. Black may be any hue that is generally recognized as black. When the coating layer is colored black, it may be colored black using, for example, an infrared-transparent ink containing a single type of colorant, an infrared-transparent ink containing two or more types of colorant, or multiple infrared-transparent inks of different colors. It is preferable that the visible light transmittance of the coating layer for wavelengths from 380 nm to 700 nm be such that the maximum visible light transmittance in that wavelength range is within the above range.
被覆層は、例えば、光によってセンシングを行う技術の用途に適用しやすくする観点で、所望の赤外線透過率を有し、一定以上の屈折率を持つことが望ましい。
被覆層の波長905nmにおける屈折率は、1.65以上であることが好ましく、1.75以上であることがより好ましく、1.85以上であることがさらに好ましい。被覆層の屈折率が1.65以上であることで、例えば、配線シート100を光によってセンシングを行う技術の部材として用いられる光学センサ用の部材として適用しやすい。被覆層の波長905nmにおける屈折率の上限は特に限定されず、例えば、3.00以下であることが好ましく、2.70以下であることがより好ましく、2.40以下であることがさらに好ましい。
The covering layer preferably has a desired infrared transmittance and a refractive index of at least a certain level, from the viewpoint of facilitating application to, for example, optical sensing technology.
The refractive index of the coating layer at a wavelength of 905 nm is preferably 1.65 or more, more preferably 1.75 or more, and even more preferably 1.85 or more. A refractive index of the coating layer of 1.65 or more makes the wiring sheet 100 suitable for use as, for example, an optical sensor component used in optical sensing technology. The upper limit of the refractive index of the coating layer at a wavelength of 905 nm is not particularly limited, and is preferably 3.00 or less, more preferably 2.70 or less, and even more preferably 2.40 or less.
被覆層は、赤外線透過インクを含むことが好ましい。被覆層は、波長905nmから1000nmの近赤外線の透過率が70%以上であることが好ましい。赤外線透過インクは、905nm以上、1000nm以下の波長範囲における近赤外線が透過する一方で、可視光線及び紫外線の透過が抑制されるインクである。赤外線透過インクは、905nm以上、1000nm以下の波長範囲における近赤外線を、例えば、70%以上透過することができる。赤外線透過インクを含む被覆層における波長905nmから1000nmの近赤外線の透過率は、75%以上であることがより好ましく、80%以上であることがさらに好ましく、85%以上であることがよりさらに好ましい。赤外線透過インクを含む被覆層における波長905nmから1000nmの近赤外線の透過率は、100%未満であってもよく、99%以下であってもよく、95%以下であってもよい。赤外線透過インクが被覆層に含有されており、被覆層における波長905nmから1000nmの近赤外線の透過率が、70%以上であれば、例えば、配線シート100を光学センサ用の部材として適用しやすい。なお、被覆層の波長905nmから1000nmの近赤外線の透過率は、当該波長範囲における近赤外線透過率の最低値が上記範囲であることが好ましい。 The coating layer preferably contains infrared-transparent ink. The coating layer preferably has a transmittance of 70% or more for near-infrared rays with wavelengths of 905 nm to 1000 nm. Infrared-transparent ink is an ink that transmits near-infrared rays in the wavelength range of 905 nm to 1000 nm, while suppressing the transmission of visible light and ultraviolet rays. The infrared-transparent ink can transmit, for example, 70% or more of near-infrared rays in the wavelength range of 905 nm to 1000 nm. The transmittance of near-infrared rays with wavelengths of 905 nm to 1000 nm in a coating layer containing infrared-transparent ink is more preferably 75% or more, even more preferably 80% or more, and even more preferably 85% or more. The transmittance of near-infrared rays with wavelengths of 905 nm to 1000 nm in a coating layer containing infrared-transparent ink may be less than 100%, may be 99% or less, or may be 95% or less. If the coating layer contains infrared-transmitting ink and the transmittance of the coating layer for near-infrared rays with wavelengths of 905 nm to 1000 nm is 70% or higher, the wiring sheet 100 can be easily used as a component for an optical sensor, for example. It is preferable that the transmittance of the coating layer for near-infrared rays with wavelengths of 905 nm to 1000 nm be such that the minimum value of the near-infrared transmittance in that wavelength range is within the above range.
赤外線透過インクは、例えば、色材と樹脂成分とを含む。赤外線透過インクは、必要に応じて添加剤を含むことが好ましい。色材は、染料及び着色顔料のうちの少なくとも一種を含んでいてもよい。色材としては、着色顔料を含むことが好ましい。着色顔料は、特に限定されず、例えば、無機顔料及び有機顔料が挙げられ、これらを単独又は併用することができる。無機顔料としては、特に限定されず、例えば、硫化ビスマス、カーボンブラック、べんがら、カドミウムレッド、紺青、及び群青等が挙げられ、これらを一種単独で、又は二種以上を組み合わせて用いることができる。有機顔料としては、特に限定されず、例えば、ラクタムブラック系顔料、ペリレン系顔料、フタロシアニン系顔料、ベンゾフラノン系顔料、アゾ系顔料、アントラキノン系顔料、インダンスレン系顔料、イソインドリノン系顔料、キナクリドン系顔料、キノフタロン系顔料、ジケトピロロピロール系顔料、ジオキサジン系顔料、及びチオインジゴ系顔料等が挙げられ、これらを一種単独で、又は二種以上を組み合わせて用いることができる。これらの中でも、着色顔料は、有機顔料であることがよく、対象物にレーザー光を照射することによって得られた対象物の像がより鮮明化されやすくなる観点で、屈折率が低く設定でき、光の散乱を抑制できるペリレン系顔料及びフタロシアニン系顔料からなる群から選択される少なくとも一種を含むことが好ましい。さらに、赤外線透過インクが、ペリレン系顔料及びフタロシアニン系顔料からなる群から選択される少なくとも一種を含むことで、被覆層の可視光透過率を抑制しつつ、赤外線の透過性が得られやすい。 The infrared-transmitting ink contains, for example, a colorant and a resin component. The infrared-transmitting ink preferably contains additives as necessary. The colorant may contain at least one of a dye and a colored pigment. The colorant preferably contains a colored pigment. The colored pigment is not particularly limited, and examples include inorganic pigments and organic pigments, which can be used alone or in combination. The inorganic pigment is not particularly limited, and examples include bismuth sulfide, carbon black, red iron oxide, cadmium red, Prussian blue, and ultramarine blue, and these can be used alone or in combination of two or more. The organic pigment is not particularly limited and may include, for example, lactam black pigments, perylene pigments, phthalocyanine pigments, benzofuranone pigments, azo pigments, anthraquinone pigments, indanthrene pigments, isoindolinone pigments, quinacridone pigments, quinophthalone pigments, diketopyrrolopyrrole pigments, dioxazine pigments, and thioindigo pigments. These pigments may be used alone or in combination. Among these, the coloring pigment is preferably an organic pigment. From the viewpoint of enhancing the clarity of the image of the object obtained by irradiating the object with laser light, it is preferable to include at least one pigment selected from the group consisting of perylene pigments and phthalocyanine pigments, which can be set to have a low refractive index and suppress light scattering. Furthermore, by including at least one pigment selected from the group consisting of perylene pigments and phthalocyanine pigments in the infrared-transmitting ink, it is possible to suppress the visible light transmittance of the coating layer while easily achieving infrared transmittance.
ペリレン系顔料は、ペリレン骨格を有する有機顔料であれば、特に限定されない。ペリレン系顔料は、例えば、ペリレンテトラカルボン酸二無水物の六員環を構成している酸素原子2個を脱落させた構造を有する。具体的には、ペリレン系顔料は、ペリレンレッド、ペリレンバイオレット、及びペリレンブラックなどが挙げられる。ペリレン系顔料は、一種単独で、又は二種以上を組み合わせて用いることができる。 The perylene-based pigment is not particularly limited as long as it is an organic pigment having a perylene skeleton. For example, a perylene-based pigment has a structure in which two oxygen atoms constituting a six-membered ring of perylene tetracarboxylic dianhydride have been removed. Specific examples of perylene-based pigments include perylene red, perylene violet, and perylene black. Perylene-based pigments can be used alone or in combination of two or more.
フタロシアニン系顔料は、フタロシアニン骨格を有する有機顔料であれば、特に限定されない。フタロシアニン系顔料は、例えば、4つのフタル酸イミドが窒素原子で架橋された環状構造を有する。フタロシアニン系顔料は、配位金属を有していてもよい。配位金属としては、例えば、銅、マグネシウム、チタン、鉄、コバルト、ニッケル、亜鉛、及びアルミニウム等が挙げられる。フタロシアニン系顔料が配位金属を含む場合、フタロシアニン系顔料は、銅が配位された銅フタロシアニン系顔料であってもよい。具体的には、フタロシアニン系顔料は、フタロシアニンブルー及びフタロシアニングリーン等が挙げられる。フタロシアニン系顔料は、一種単独で、又は二種以上を組み合わせて用いることができる。 The phthalocyanine pigment is not particularly limited as long as it is an organic pigment having a phthalocyanine skeleton. For example, the phthalocyanine pigment has a cyclic structure in which four phthalic acid imides are bridged by nitrogen atoms. The phthalocyanine pigment may have a coordinated metal. Examples of the coordinated metal include copper, magnesium, titanium, iron, cobalt, nickel, zinc, and aluminum. When the phthalocyanine pigment contains a coordinated metal, the phthalocyanine pigment may be a copper phthalocyanine pigment in which copper is coordinated. Specific examples of the phthalocyanine pigment include phthalocyanine blue and phthalocyanine green. The phthalocyanine pigments can be used alone or in combination of two or more.
樹脂成分としては、特に限定されず、例えば、アクリル系樹脂、塩化ビニル系樹脂、ブチラール系樹脂、ポリエステル系樹脂、ポリウレタン系樹脂、セルロース系樹脂、及びエポキシ系樹脂等の各種樹脂が挙げられ、これらの一種又は二種以上を組み合わせて用いることができる。樹脂成分は、アクリル系樹脂を含むことが好ましい。樹脂成分は、アクリル系樹脂であることも好ましい。 The resin component is not particularly limited and may include, for example, various resins such as acrylic resins, vinyl chloride resins, butyral resins, polyester resins, polyurethane resins, cellulose resins, and epoxy resins, and one or more of these may be used in combination. It is preferable that the resin component includes an acrylic resin. It is also preferable that the resin component is an acrylic resin.
赤外線透過インクは、必要に応じて、界面活性剤、表面調整剤、消泡剤、レベリング剤、硬化促進剤、分散剤、光安定剤、流動調整剤、重合禁止剤、及び酸化重合防止剤等の少なくとも一種の添加剤を使用することができる。 If necessary, the infrared transparent ink may contain at least one additive such as a surfactant, surface conditioner, defoamer, leveling agent, curing accelerator, dispersant, light stabilizer, flow conditioner, polymerization inhibitor, and oxidation polymerization inhibitor.
被覆層の厚さは、特に制限されない。被覆層の厚さは、1μm以上であることが好ましく、2μm以上であることがより好ましく、4μm以上であることがさらに好ましい。被覆層の厚さは、30μm以下であることが好ましく、20μm以下であることがより好ましく、15μm以下であることがさらに好ましい。 There are no particular restrictions on the thickness of the coating layer. The thickness of the coating layer is preferably 1 μm or more, more preferably 2 μm or more, and even more preferably 4 μm or more. The thickness of the coating layer is preferably 30 μm or less, more preferably 20 μm or less, and even more preferably 15 μm or less.
基材1の厚さは、0.05mm以上であることが好ましく、0.25mm以上であることがより好ましく、0.5mm以上であることがさらに好ましく、1.0mm以上であることがよりさらに好ましく、1.5mm以上であることが特に好ましい。基材1の厚さは、10mm以下であることが好ましく、5mm以下であることがより好ましく、3mm以下であることがさらに好ましい。基材1の厚さが、0.05mm以上、10mm以下の範囲にあることで、優れた強度等を得ることができる。 The thickness of the substrate 1 is preferably 0.05 mm or more, more preferably 0.25 mm or more, even more preferably 0.5 mm or more, even more preferably 1.0 mm or more, and particularly preferably 1.5 mm or more. The thickness of the substrate 1 is preferably 10 mm or less, more preferably 5 mm or less, and even more preferably 3 mm or less. By having the thickness of the substrate 1 in the range of 0.05 mm or more and 10 mm or less, excellent strength, etc. can be obtained.
(配線体)
配線体2は、導電性線状体21を備える。配線シート100において、配線体2は、導電性線状体21が、配列された構造を有する。また、配線シート100において、配線体2は、導電性線状体21が、平行に複数配列された構造である。配線シート100においては、配線体2は、複数の導電性線状体21が、互いに間隔をもって配列された構造を有しているが、本実施形態に係る配線シート100は好ましい一例であり、これに限定されない。配線体2は、複数の導電性線状体21が、互いに間隔をもって配列された構造を有していなくてもよい。配線体2は、1本の導電性線状体21のみなる構造であってもよい。配線体2が、1本の導電性線状体21から構成されている場合、配線体2は、1本の導電性線状体21が少なくとも1つの折れ曲がり部を有するパターンが形成していていもよい。
(Wiring body)
The wiring body 2 includes conductive linear bodies 21. In the wiring sheet 100, the wiring body 2 has a structure in which the conductive linear bodies 21 are arranged. Furthermore, in the wiring sheet 100, the wiring body 2 has a structure in which a plurality of the conductive linear bodies 21 are arranged in parallel. In the wiring sheet 100, the wiring body 2 has a structure in which the plurality of conductive linear bodies 21 are arranged at intervals from one another. However, the wiring sheet 100 according to the present embodiment is a preferred example, and is not limited to this. The wiring body 2 does not have to have a structure in which the plurality of conductive linear bodies 21 are arranged at intervals from one another. The wiring body 2 may have a structure consisting of only one conductive linear body 21. When the wiring body 2 is composed of one conductive linear body 21, the wiring body 2 may have a pattern in which the single conductive linear body 21 has at least one bent portion.
配線シート100において、導電性線状体21は、配線シート100の平面視において、直線状である。これに限られず、導電性線状体21は、配線シート100の平面視において、波形状を成していてもよい。波形状としては、例えば、正弦波、矩形波、三角波、及び、のこぎり波等が挙げられる。例えば、配線体2が、このような波形状を成している構造であれば、導電性線状体21の軸方向に、配線シート100を伸張した際に、導電性線状体21の断線を抑制できる。 In the wiring sheet 100, the conductive linear members 21 are linear when viewed in a plan view of the wiring sheet 100. However, this is not limiting, and the conductive linear members 21 may be wavy when viewed in a plan view of the wiring sheet 100. Examples of wavy shapes include a sine wave, a rectangular wave, a triangular wave, and a sawtooth wave. For example, if the wiring member 2 has such a wavy structure, breakage of the conductive linear members 21 can be suppressed when the wiring sheet 100 is stretched in the axial direction of the conductive linear members 21.
導電性線状体21の体積抵抗率は、1.0×10-9Ω・m以上であることが好ましく、3.0×10-9Ω・m以上であることがより好ましく、1.0×10-8Ω・m以上であることがさらに好ましい。また、導電性線状体21の体積抵抗率は、1.0×10-3Ω・m以下であることが好ましく、1.0×10-4Ω・m以下であることがより好ましく、5.0×10-5Ω・m以下であることがさらに好ましい。導電性線状体21の体積抵抗率を上記範囲にすると、配線体2の面抵抗が低下しやすくなる。
導電性線状体21の体積抵抗率の測定は、次のとおりである。導電性線状体21の端部及び端部からの長さが40mmの部分に銀ペーストを塗布し、端部及び端部から長さ40mmの部分の抵抗を測定する。そして、導電性線状体21の断面積(単位:m2)を上記の抵抗値に乗じ、得られた値を上記の測定した長さ(0.04m)で除して、導電性線状体21の体積抵抗率を算出する。
The volume resistivity of the conductive linear body 21 is preferably 1.0×10 −9 Ω·m or more, more preferably 3.0×10 −9 Ω·m or more, and even more preferably 1.0×10 −8 Ω·m or more. The volume resistivity of the conductive linear body 21 is preferably 1.0×10 −3 Ω·m or less, more preferably 1.0×10 −4 Ω·m or less, and even more preferably 5.0×10 −5 Ω·m or less. When the volume resistivity of the conductive linear body 21 is within the above range, the surface resistance of the wiring body 2 is likely to decrease.
The volume resistivity of the conductive linear body 21 was measured as follows: Silver paste was applied to the end of the conductive linear body 21 and to a section 40 mm from the end, and the resistance of the end and the section 40 mm from the end was measured. The volume resistivity of the conductive linear body 21 was then calculated by multiplying the resistance value by the cross-sectional area (unit: m2 ) of the conductive linear body 21 and dividing the obtained value by the measured length (0.04 m).
導電性線状体21の断面の形状は、特に限定されず、多角形、扁平形、楕円形、又は円形等を取り得る。樹脂層3との馴染み等の観点から、導電性線状体21の断面の形状は、楕円形、又は円形であることが好ましい。 The cross-sectional shape of the conductive linear body 21 is not particularly limited and may be polygonal, flat, elliptical, circular, or the like. From the standpoint of compatibility with the resin layer 3, the cross-sectional shape of the conductive linear body 21 is preferably elliptical or circular.
導電性線状体21の断面が円形である場合には、導電性線状体21の直径D(図2参照)は、3μm以上、200μm以下であることが好ましい。シート抵抗の上昇抑制と、配線シート100の発熱効率及び耐絶縁破壊特性の向上との観点から、導電性線状体21の直径Dは、4μm以上であることがより好ましく、5μm以上であることがさらに好ましい。導電性線状体21の直径Dは、150μm以下であることがより好ましく、100μm以下であることがさらに好ましく、50μm以下であることがよりさらに好ましく、20μm以下であることがさらになお好ましい。
導電性線状体21の断面が楕円形である場合には、長径が上記の直径Dと同様の範囲にあることが好ましい。
When the cross section of the conductive linear body 21 is circular, the diameter D (see FIG. 2 ) of the conductive linear body 21 is preferably 3 μm or more and 200 μm or less. From the viewpoints of suppressing an increase in sheet resistance and improving the heat generation efficiency and dielectric breakdown resistance characteristics of the wiring sheet 100, the diameter D of the conductive linear body 21 is more preferably 4 μm or more, and even more preferably 5 μm or more. The diameter D of the conductive linear body 21 is more preferably 150 μm or less, even more preferably 100 μm or less, even more preferably 50 μm or less, and even more preferably 20 μm or less.
When the cross section of the conductive linear body 21 is elliptical, it is preferable that the major axis is in the same range as the diameter D described above.
導電性線状体21の直径Dは、デジタル顕微鏡を用いて、導電性線状体21を観察し、無作為に選んだ5箇所で、導電性線状体21の直径を測定し、その平均値とする。 The diameter D of the conductive linear body 21 is determined by observing the conductive linear body 21 using a digital microscope, measuring the diameter of the conductive linear body 21 at five randomly selected points, and taking the average value.
配線体2が複数の導電性線状体21が、互いに間隔をもって配列された構造を有する場合には、導電性線状体21の間隔L(図2参照)は、0.3mm以上であることが好ましく、0.5mm以上であることがより好ましく、0.8mm以上であることがさらに好ましく、1.5mm以上であることが特に好ましい。また、導電性線状体21の間隔Lは、50mm以下であることが好ましく、30mm以下であることがより好ましく、20mm以下であることがさらに好ましく、5mm以下であることが特に好ましい。
導電性線状体21同士の間隔が上記範囲であれば、導電性線状体21がある程度密集しているため、配線体2の抵抗を低く維持するといった配線シート100の機能の向上を図ることができる。
When the wiring body 2 has a structure in which a plurality of conductive linear bodies 21 are arranged at intervals from one another, the interval L (see FIG. 2 ) between the conductive linear bodies 21 is preferably 0.3 mm or more, more preferably 0.5 mm or more, even more preferably 0.8 mm or more, and particularly preferably 1.5 mm or more. Furthermore, the interval L between the conductive linear bodies 21 is preferably 50 mm or less, more preferably 30 mm or less, even more preferably 20 mm or less, and particularly preferably 5 mm or less.
If the spacing between the conductive linear bodies 21 is within the above range, the conductive linear bodies 21 are relatively densely packed, which improves the functionality of the wiring sheet 100, such as maintaining low resistance of the wiring body 2.
導電性線状体21の間隔Lは、デジタル顕微鏡を用いて、例えば、配線体2の導電性線状体21を観察し、隣り合う2つの導電性線状体21の間隔を測定する。
なお、隣り合う2つの導電性線状体21の間隔とは、導電性線状体21を配列させていった方向に沿った長さであって、2つの導電性線状体21の対向する部分間の長さである(図2参照)。間隔Lは、導電性線状体21の配列が不等間隔である場合には、全ての隣り合う導電性線状体21同士の間隔の平均値である。
The distance L between the conductive linear members 21 is measured by, for example, observing the conductive linear members 21 of the wiring body 2 using a digital microscope and measuring the distance between two adjacent conductive linear members 21 .
The interval between two adjacent conductive linear bodies 21 is the length along the direction in which the conductive linear bodies 21 are arranged, and is the length between opposing portions of the two conductive linear bodies 21 (see FIG. 2 ). When the conductive linear bodies 21 are arranged at uneven intervals, the interval L is the average value of the intervals between all adjacent conductive linear bodies 21.
導電性線状体21は、下記(a)及び(b)の両者の条件を満たすことができれば、導電性線状体21の態様は、特に制限はない。条件(a)導電性線状体21の波長1000nmにおける赤外線反射率が、0%以上、90%以下である。条件(b)配線シート100における温度85℃、相対湿度85%RHの湿熱環境下で1000時間静置した後の抵抗値変化率が、50%以下である。 There are no particular restrictions on the form of the conductive linear body 21 as long as it satisfies both of the following conditions (a) and (b): Condition (a) The infrared reflectance of the conductive linear body 21 at a wavelength of 1000 nm is 0% or more and 90% or less. Condition (b) The rate of change in resistance of the wiring sheet 100 after being left for 1000 hours in a humid and hot environment at a temperature of 85°C and a relative humidity of 85% RH is 50% or less.
導電性線状体21の態様は、例えば、エッチング、スクリーン印刷、又はインクジェット等の方式で作製することができる。導電性線状体21の態様は、金属ワイヤーを含む線状体(以下「金属ワイヤー線状体」とも称する)であることがよい。金属ワイヤーは高い熱伝導性、高い電気伝導性、及び高いハンドリング性を有する。金属ワイヤー線状体は抵抗を大きく低下させることが可能であり、金属ワイヤー線状体の直径を極めて小さくしても、配線シート100の発熱に必要な電流で通電できる。これにより、導電性線状体21が視認されにくい状態にできる。すなわち、導電性線状体21として金属ワイヤー線状体を適用すると、配線体2の抵抗値を低減しつつ、光線透過性が向上しやすくなる。また、配線シート100は、速やかな発熱が実現されやすくなる。さらに、上述したように直径が細い線状体を得られやすい。 The conductive linear body 21 can be produced by, for example, etching, screen printing, inkjet printing, or the like. The conductive linear body 21 is preferably a linear body including a metal wire (hereinafter also referred to as a "metal wire linear body"). Metal wire has high thermal conductivity, high electrical conductivity, and easy handling. Metal wire linear bodies can significantly reduce resistance, and even if the diameter of the metal wire linear body is extremely small, it can still pass the current required to heat the wiring sheet 100. This makes it possible to make the conductive linear body 21 less visible. In other words, using a metal wire linear body as the conductive linear body 21 reduces the resistance value of the wiring body 2 while improving light transmittance. Furthermore, the wiring sheet 100 is more likely to generate heat quickly. Furthermore, as described above, it is easy to obtain linear bodies with a small diameter.
金属ワイヤー線状体は、1本の金属ワイヤーからなる線状体であってもよいし、複数本の金属ワイヤーを撚った線状体であってもよい。
金属ワイヤーとしては、銅、アルミニウム、タングステン、鉄、モリブデン、ニッケル、チタン、銀、及び金等の金属、又は、ステンレス鋼、炭素鋼等の鋼鉄、真鍮、りん青銅、ジルコニウム銅合金、ベリリウム銅、鉄ニッケル、ニクロム、ニッケルチタン、カンタル、ハステロイ、及びレニウムタングステン等の金属を2種以上含む合金を含むワイヤーが挙げられる。特に、タングステン及びモリブデン、並びにこれらを含む合金から選ばれる一種以上の金属を含むワイヤーが、低い体積抵抗率の観点から好ましい。
The metal wire linear body may be a linear body made of a single metal wire, or may be a linear body made of a plurality of twisted metal wires.
Examples of metal wires include wires containing metals such as copper, aluminum, tungsten, iron, molybdenum, nickel, titanium, silver, and gold, or alloys containing two or more metals such as stainless steel, carbon steel, brass, phosphor bronze, zirconium-copper alloy, beryllium copper, iron-nickel, nichrome, nickel-titanium, Kanthal, Hastelloy, and rhenium-tungsten. In particular, wires containing one or more metals selected from tungsten and molybdenum, and alloys containing these, are preferred from the viewpoint of low volume resistivity.
導電性線状体21の黒色化が達成され、かつ、湿熱環境下における配線シート100の腐食が抑制される観点から、導電性線状体21は、硫化物又はパラジウムで被覆されている線状体であることが好ましい。本明細書において、硫化物で被覆されていることを硫化物被覆と称し、パラジウムで被覆されていることをパラジウム被覆と称する場合がある。硫化物又はパラジウムで被覆されている線状体は、(i)直接、硫化物又はパラジウムで被覆されている線状体であってもよく、(ii)硫化物以外の材料又はパラジウム以外の材料による被覆を介在して、硫化物又はパラジウムで被覆されている線状体であってもよく、(iii)硫化物と硫化物以外の材料とが混在又はパラジウムとパラジウム以外の材料とが混在した状態で被覆されていてもよい。パラジウム以外の材料の一例としては、パラジウム以外の金属が挙げられ、金属酸化物も挙げられる。例えば、パラジウムで被覆されている線状体は、線状体が金属ワイヤーである場合、金属ワイヤーに、直接、パラジウム単体が被覆されていてもよく、金属ワイヤーに、パラジウム以外の金属又は金属酸化物による被覆を介して、パラジウム単体が被覆されていてもよく、金属ワイヤーに、パラジウム以外の金属又は金属酸化物とパラジウムとが混在した状態で被膜されていてもよい。導電性線状体21の黒色化がより達成され、かつ、湿熱環境下における配線シート100の腐食がより抑制される観点から、導電性線状体21は、硫化銀で被覆されている線状体であることが好ましい。導電性線状体21は、パラジウム以外の金属又は金属酸化物とパラジウムとが混在して被覆された線状体であることも好ましい。導電性線状体21は、硫化物で被覆されている線状体であるか、又はパラジウムで被覆されている線状体であれば、金属光沢が低減し、金属ワイヤーの存在を目立たなくすることが容易となる。また、金属ワイヤーは、硫化物又はパラジウムで被覆されていると、金属腐食も抑制されやすくなるため、上記条件(a)及び(b)の両方の条件を満足させやすい。導電性線状体21が、硫化物被覆又はパラジウム被覆を備える場合、線状体への硫化物被覆又はパラジウム被覆は、例えば、上記のめっき、及び蒸着法等により形成することができる。導電性線状体21は、例えば、硫化物めっきが施された線状体であってもよく、パラジウムめっきが施された線状体であってもよい。これらの中でも、導電性線状体21は、硫化銀めっきが施された線状体であることが好ましい。導電性線状体21は、パラジウム以外の金属又は金属酸化物とパラジウムとが混在しためっきが施された線状体であることも好ましい。パラジウムと混在させる金属又は金属酸化物としては、特に限定されず、例えば、銅、銀、及びこれら金属の酸化物からなる群から選択される1種以上であることが挙げられる。 From the viewpoint of achieving blackening of the conductive linear body 21 and suppressing corrosion of the wiring sheet 100 in a humid and hot environment, the conductive linear body 21 is preferably a linear body coated with sulfide or palladium. In this specification, a coating with sulfide may be referred to as sulfide coating, and a coating with palladium may be referred to as palladium coating. A linear body coated with sulfide or palladium may (i) be a linear body directly coated with sulfide or palladium, (ii) be a linear body coated with sulfide or palladium via a coating of a material other than sulfide or a material other than palladium, or (iii) be coated with a mixture of sulfide and a material other than sulfide, or a mixture of palladium and a material other than palladium. Examples of materials other than palladium include metals other than palladium, and metal oxides. For example, when the linear body coated with palladium is a metal wire, the metal wire may be directly coated with palladium alone, the metal wire may be coated with palladium alone via a coating of a metal other than palladium or a metal oxide, or the metal wire may be coated with a mixture of palladium and a metal other than palladium or a metal oxide. From the viewpoint of further achieving blackening of the conductive linear body 21 and further suppressing corrosion of the wiring sheet 100 in a humid and hot environment, the conductive linear body 21 is preferably coated with silver sulfide. It is also preferable that the conductive linear body 21 be coated with a mixture of palladium and a metal other than palladium or a metal oxide. If the conductive linear body 21 is coated with sulfide or palladium, the metallic luster is reduced, making it easier to make the metal wire less noticeable. Furthermore, if the metal wire is coated with sulfide or palladium, metal corrosion is more likely to be suppressed, making it easier to satisfy both conditions (a) and (b). When the conductive linear body 21 is coated with a sulfide or palladium, the sulfide or palladium coating on the linear body can be formed, for example, by the plating and vapor deposition methods described above. The conductive linear body 21 may be, for example, a sulfide-plated linear body or a palladium-plated linear body. Among these, the conductive linear body 21 is preferably a silver sulfide-plated linear body. It is also preferable that the conductive linear body 21 be a linear body plated with a mixture of palladium and a metal or metal oxide other than palladium. The metal or metal oxide mixed with palladium is not particularly limited, and examples include one or more selected from the group consisting of copper, silver, and oxides of these metals.
導電性線状体21の波長1000nmにおける赤外線反射率は、0%以上、90%以下である。導電性線状体21の黒色化の観点から、波長1000nmにおける赤外線反射率は、86%以下であることが好ましく、78%以下であることがより好ましく、74%以下であることがより好ましく、50%以下であることがよりさらに好ましく、35%以下であることがよりさらに好ましく、30%以下であることがさらになお好ましい。同様の観点から、導電性線状体21の波長1000nmにおける赤外線反射率は、1%以上であってもよく、3%以上であってもよく、6%以上であってもよく、8%以上であってもよく、10%以上であってもよい。 The infrared reflectance of the conductive linear body 21 at a wavelength of 1000 nm is 0% or more and 90% or less. From the viewpoint of blackening the conductive linear body 21, the infrared reflectance at a wavelength of 1000 nm is preferably 86% or less, more preferably 78% or less, even more preferably 74% or less, even more preferably 50% or less, even more preferably 35% or less, and even more preferably 30% or less. From the same viewpoint, the infrared reflectance of the conductive linear body 21 at a wavelength of 1000 nm may be 1% or more, 3% or more, 6% or more, 8% or more, or 10% or more.
導電性線状体21の波長1000nmにおける赤外線反射率は、後述の実施例に記載の方法で測定できる。 The infrared reflectance of the conductive linear body 21 at a wavelength of 1000 nm can be measured using the method described in the Examples below.
(樹脂層)
樹脂層3は、配線体2を直接的又は間接的に支持する。なお、樹脂層3は、必ずしも備えていなくてもよい。樹脂層3は必要に応じて設けられる部材である。この樹脂層3により、配線体2の抵抗値を安定化できる。すなわち、この樹脂層3により、導電性線状体21を固定でき、導電性線状体21と電極4との接触を安定させ、抵抗値上昇が発生しにくくできる。
(Resin layer)
The resin layer 3 directly or indirectly supports the wiring body 2. The resin layer 3 is not necessarily provided. The resin layer 3 is a component that is provided as needed. The resin layer 3 stabilizes the resistance value of the wiring body 2. That is, the resin layer 3 fixes the conductive linear body 21, stabilizes the contact between the conductive linear body 21 and the electrode 4, and makes it less likely that an increase in resistance value will occur.
樹脂層3の厚さは、特に制限されない。樹脂層3の厚さは、導電性線状体21の直径D以上であってもよく、導電性線状体21の直径D未満であってもよい。樹脂層3の厚さが導電性線状体21の直径D以上であれば、樹脂層3の中に、配線体2を含むことができる。樹脂層3の厚さが導電性線状体21の直径D未満である場合には、樹脂層3から配線体2が露出する。また、樹脂層3から配線体2が露出する場合、配線体2は、基材1の側に露出してもよく、基材1の反対側に露出してもよい。樹脂層3の厚さは、1μm以上であることが好ましく、3μm以上であることがより好ましく、5μm以上であることがさらに好ましい。樹脂層3の厚さは、100μm以下であることが好ましく、50μm以下であることがより好ましく、30μm以下であることがさらに好ましい。 The thickness of the resin layer 3 is not particularly limited. It may be equal to or greater than the diameter D of the conductive linear body 21, or it may be less than the diameter D of the conductive linear body 21. If the thickness of the resin layer 3 is equal to or greater than the diameter D of the conductive linear body 21, the wiring body 2 can be contained within the resin layer 3. If the thickness of the resin layer 3 is less than the diameter D of the conductive linear body 21, the wiring body 2 is exposed from the resin layer 3. Furthermore, if the wiring body 2 is exposed from the resin layer 3, it may be exposed on the side of the substrate 1 or on the side opposite the substrate 1. The thickness of the resin layer 3 is preferably 1 μm or greater, more preferably 3 μm or greater, and even more preferably 5 μm or greater. The thickness of the resin layer 3 is preferably 100 μm or less, more preferably 50 μm or less, and even more preferably 30 μm or less.
樹脂層3は、貯蔵弾性率をより高くするという観点から、硬化性の接着剤の硬化物からなる層であることが好ましい。
硬化性の接着剤としては、熱により硬化する熱硬化性の接着剤、及びエネルギー線硬化性の接着剤等が挙げられる。エネルギー線としては、紫外線、可視エネルギー線、赤外線、及び電子線等が挙げられる。なお、「エネルギー線硬化」には、エネルギー線を用いた加熱による熱硬化も含まれる。
From the viewpoint of increasing the storage modulus, the resin layer 3 is preferably a layer made of a cured product of a curable adhesive.
Examples of curable adhesives include thermosetting adhesives that are cured by heat, and energy ray-curable adhesives. Examples of energy rays include ultraviolet rays, visible energy rays, infrared rays, and electron beams. Note that "energy ray curing" also includes thermal curing by heating using energy rays.
熱硬化性の接着剤は、熱硬化性樹脂を含むことが好ましい。熱硬化性樹脂としては、特に限定されず、具体的には、エポキシ樹脂、フェノール樹脂、メラミン樹脂、尿素樹脂、ポリエステル樹脂、ウレタン樹脂、アクリル樹脂、ベンゾオキサジン樹脂、フェノキシ樹脂、アミン系化合物、及び酸無水物系化合物等が挙げられる。これらは1種を単独で又は2種以上を組み合わせて用いることができる。これらの中でも、イミダゾール系硬化触媒を使用した硬化に適するという観点から、熱硬化性樹脂としては、エポキシ樹脂、フェノール樹脂、メラミン樹脂、尿素樹脂、アミン系化合物、及び酸無水物系化合物を使用することが好ましく、特に、優れた硬化性を示すという観点から、エポキシ樹脂、フェノール樹脂、それらの混合物、又はエポキシ樹脂と、フェノール樹脂、メラミン樹脂、尿素樹脂、アミン系化合物、及び酸無水物系化合物からなる群から選択される少なくとも1種との混合物を使用することが好ましく、エポキシ樹脂を使用することが好ましい。 The thermosetting adhesive preferably contains a thermosetting resin. Thermosetting resins are not particularly limited, and specific examples include epoxy resins, phenolic resins, melamine resins, urea resins, polyester resins, urethane resins, acrylic resins, benzoxazine resins, phenoxy resins, amine compounds, and acid anhydride compounds. These can be used alone or in combination of two or more. Among these, epoxy resins, phenolic resins, melamine resins, urea resins, amine compounds, and acid anhydride compounds are preferred as thermosetting resins, as they are suitable for curing using an imidazole curing catalyst. In particular, epoxy resins, phenolic resins, mixtures thereof, or mixtures of epoxy resins with at least one selected from the group consisting of phenolic resins, melamine resins, urea resins, amine compounds, and acid anhydride compounds are preferred, as they exhibit excellent curing properties. Epoxy resins are preferred.
エポキシ樹脂としては、芳香族エポキシ樹脂、又は脂環式エポキシ樹脂のように、環式のエポキシ樹脂が、樹脂層3の貯蔵弾性率を高くする観点から好ましい。オキシアルキレン鎖のような柔軟性のセグメントを有するエポキシ樹脂は、樹脂層3の貯蔵弾性率を低下させる傾向がある。 As epoxy resins, aromatic epoxy resins or cyclic epoxy resins such as alicyclic epoxy resins are preferred from the perspective of increasing the storage modulus of resin layer 3. Epoxy resins with flexible segments such as oxyalkylene chains tend to decrease the storage modulus of resin layer 3.
エネルギー線硬化性の接着剤は、エネルギー線硬化性樹脂を含むことが好ましい。エネルギー線硬化性樹脂としては、例えば、分子内に少なくとも1個の重合性二重結合を有する化合物が挙げられ、(メタ)アクリロイル基を有するアクリレート系化合物であることが好ましい。 The energy ray-curable adhesive preferably contains an energy ray-curable resin. Examples of energy ray-curable resins include compounds having at least one polymerizable double bond in the molecule, and are preferably acrylate compounds having a (meth)acryloyl group.
アクリレート系化合物としては、例えば、ジシクロペンタジエンジアクリレート、トリメチロールプロパントリ(メタ)アクリレート、テトラメチロールメタンテトラ(メタ)アクリレート、ペンタエリスリトールトリ(メタ)アクリレート、ペンタエリスリトールテトラ(メタ)アクリレート、ジペンタエリスリトールモノヒドロキシペンタ(メタ)アクリレート、ジペンタエリスリトールヘキサ(メタ)アクリレート、1,4-ブチレングリコールジ(メタ)アクリレート、及び1,6-ヘキサンジオールジ(メタ)アクリレート等の鎖状脂肪族骨格含有(メタ)アクリレート;ジシクロペンタニルジ(メタ)アクリレート等の環状脂肪族骨格含有(メタ)アクリレート;ポリエチレングリコールジ(メタ)アクリレート等のポリアルキレングリコール(メタ)アクリレート;オリゴエステル(メタ)アクリレート、ウレタン(メタ)アクリレートオリゴマー、エポキシ変性(メタ)アクリレート、ポリアルキレングリコール(メタ)アクリレート以外のポリエーテル(メタ)アクリレート、及びイタコン酸オリゴマー等が挙げられる。 Examples of acrylate compounds include dicyclopentadiene diacrylate, trimethylolpropane tri(meth)acrylate, tetramethylolmethane tetra(meth)acrylate, pentaerythritol tri(meth)acrylate, pentaerythritol tetra(meth)acrylate, dipentaerythritol monohydroxypenta(meth)acrylate, dipentaerythritol hexa(meth)acrylate, 1,4-butylene glycol di(meth)acrylate, and 1,6-hexanediol di(meth)acrylate. (meth)acrylates containing a chain aliphatic skeleton such as dicyclopentanyl di(meth)acrylate; (meth)acrylates containing a cyclic aliphatic skeleton such as dicyclopentanyl di(meth)acrylate; polyalkylene glycol (meth)acrylates such as polyethylene glycol di(meth)acrylate; oligoester (meth)acrylates, urethane (meth)acrylate oligomers, epoxy-modified (meth)acrylates, polyether (meth)acrylates other than polyalkylene glycol (meth)acrylates, and itaconic acid oligomers.
エネルギー線硬化性樹脂の重量平均分子量(Mw)は、100以上であることが好ましく、300以上であることがより好ましい。また、この重量平均分子量は、30000以下であることが好ましく、10000以下であることがより好ましい。なお、本明細書における重量平均分子量は、ゲルパーミエーションクロマトグラフィー(GPC)法により測定した標準ポリスチレン換算の値である。 The weight average molecular weight (Mw) of the energy ray-curable resin is preferably 100 or more, and more preferably 300 or more. Furthermore, this weight average molecular weight is preferably 30,000 or less, and more preferably 10,000 or less. Note that the weight average molecular weight in this specification is a value measured by gel permeation chromatography (GPC) in terms of standard polystyrene.
接着剤が含有するエネルギー線硬化性樹脂は、1種のみでもよいし、2種以上でもよい。エネルギー線硬化性樹脂が2種以上である場合、それらの組み合わせ及び比率は任意に選択できる。 The adhesive may contain only one type of energy ray-curable resin, or two or more types. If two or more types of energy ray-curable resins are used, the combination and ratio of these resins can be selected as desired.
エネルギー線硬化性樹脂又は熱硬化性樹脂を用いる場合、光重合開始剤及び熱重合開始剤等を用いることが好ましい。光重合開始剤及び熱重合開始剤等を用いることで、硬化性樹脂の重合反応を容易に開始させることができ、硬化反応の制御が容易になる。 When using an energy ray-curable resin or a thermosetting resin, it is preferable to use a photopolymerization initiator or a thermal polymerization initiator. By using a photopolymerization initiator or a thermal polymerization initiator, the polymerization reaction of the curable resin can be easily initiated, making it easier to control the curing reaction.
光重合開始剤としては、ベンゾフェノン、アセトフェノン、ベンゾイン、ベンゾインメチルエーテル、ベンゾインエチルエーテル、ベンゾインイソプロピルエーテル、ベンゾインイソブチルエーテル、ベンゾイン安息香酸、ベンゾイン安息香酸メチル、ベンゾインジメチルケタール、2,4-ジエチルチオキサントン、1-ヒドロキシシクロヘキシルフェニルケトン、ベンジルジフェニルサルファイド、テトラメチルチウラムモノサルファイド、アゾビスイソブチロニトリル、2-クロールアンスラキノン、ジフェニル(2,4,6-トリメチルベンゾイル)ホスフィンオキサイド、及びビス(2,4,6-トリメチルベンゾイル)-フェニル-ホスフィンオキサイド等の光ラジカル重合開始剤が挙げられる。 Photopolymerization initiators include photoradical polymerization initiators such as benzophenone, acetophenone, benzoin, benzoin methyl ether, benzoin ethyl ether, benzoin isopropyl ether, benzoin isobutyl ether, benzoin benzoic acid, benzoin methyl benzoate, benzoin dimethyl ketal, 2,4-diethylthioxanthone, 1-hydroxycyclohexyl phenyl ketone, benzyl diphenyl sulfide, tetramethylthiuram monosulfide, azobisisobutyronitrile, 2-chloroanthraquinone, diphenyl(2,4,6-trimethylbenzoyl)phosphine oxide, and bis(2,4,6-trimethylbenzoyl)phenylphosphine oxide.
また、光重合開始剤としては、光ラジカル重合開始剤以外に、光カチオン重合開始剤が挙げられる。光カチオン重合開始剤は、エネルギー線が照射されることによってカチオン種を発生して、カチオン硬化性化合物の硬化反応を開始させる化合物であり、エネルギー線を吸収するカチオン部と酸の発生源となるアニオン部からなる。 In addition to photoradical polymerization initiators, photocationic polymerization initiators can also be used. Photocationic polymerization initiators are compounds that generate cationic species when irradiated with energy rays, initiating the curing reaction of cationic curable compounds. They consist of a cationic moiety that absorbs energy rays and an anionic moiety that serves as an acid generation source.
光カチオン重合開始剤としては、例えば、スルホニウム塩系化合物、ヨードニウム塩系化合物、ホスホニウム塩系化合物、アンモニウム塩系化合物、アンチモン酸塩系化合物、ジアゾニウム塩系化合物、セレニウム塩系化合物、オキソニウム塩系化合物、及び臭素塩系化合物等が挙げられる。これらの中でも、相溶性に優れ、得られる接着剤の保存安定性に優れるという観点から、光カチオン重合開始剤は、スルホニウム塩系化合物であることが好ましく、芳香族基を有する芳香族スルホニウム塩系化合物であることがより好ましい。 Examples of cationic photopolymerization initiators include sulfonium salt compounds, iodonium salt compounds, phosphonium salt compounds, ammonium salt compounds, antimonate compounds, diazonium salt compounds, selenium salt compounds, oxonium salt compounds, and bromine salt compounds. Among these, from the viewpoints of excellent compatibility and excellent storage stability of the resulting adhesive, the cationic photopolymerization initiator is preferably a sulfonium salt compound, and more preferably an aromatic sulfonium salt compound having an aromatic group.
スルホニウム塩系化合物としては、トリフェニルスルホニウムヘキサフルオロホスフェート、トリフェニルスルホニウムヘキサフルオロアンチモネート、及びトリフェニルスルホニウムテトラキス(ペンタフルオロフェニル)ボレート等が挙げられる。 Examples of sulfonium salt compounds include triphenylsulfonium hexafluorophosphate, triphenylsulfonium hexafluoroantimonate, and triphenylsulfonium tetrakis(pentafluorophenyl)borate.
ヨードニウム塩系化合物としては、ジフェニルヨードニウムテトラキス(ペンタフルオロフェニル)ボレート、ジフェニルヨードニウムヘキサフルオロホスフェート、及び(トリクミル)ヨードニウムテトラキス(ペンタフルオロフェニル)ボレート等が挙げられる。 Examples of iodonium salt compounds include diphenyliodonium tetrakis(pentafluorophenyl)borate, diphenyliodonium hexafluorophosphate, and (tricumyl)iodonium tetrakis(pentafluorophenyl)borate.
ホスホニウム塩系化合物としては、トリ-n-ブチル(2,5-ジヒドロキシフェニル)ホスホニウムブロマイド、及びヘキサデシルトリブチルホスホニウムクロライド等が挙げられる。 Phosphonium salt compounds include tri-n-butyl(2,5-dihydroxyphenyl)phosphonium bromide and hexadecyltributylphosphonium chloride.
アンモニウム塩系化合物としては、ベンジルトリメチルアンモニウムクロライド、フェニルトリブチルアンモニウムクロライド、及びベンジルトリメチルアンモニウムブロマイド等が挙げられる。 Examples of ammonium salt compounds include benzyltrimethylammonium chloride, phenyltributylammonium chloride, and benzyltrimethylammonium bromide.
アンチモン酸塩系化合物としては、トリフェニルスルホニウムヘキサフルオロアンチモネート、p-(フェニルチオ)フェニルジフェニルスルホニウムヘキサフルオロアンチモネート、及びジアリルヨードニウムヘキサフルオロアンチモネート等が挙げられる。 Examples of antimonate compounds include triphenylsulfonium hexafluoroantimonate, p-(phenylthio)phenyldiphenylsulfonium hexafluoroantimonate, and diaryliodonium hexafluoroantimonate.
熱重合開始剤としては、過酸化水素、ペルオキソ二硫酸アンモニウム、ペルオキソ二硫酸ナトリウム、及びペルオキソ二硫酸カリウム等のペルオキソ二硫酸塩;2,2’-アゾビス(2-アミジノプロパン)二塩酸塩、4,4’-アゾビス(4-シアノバレリン酸)、2,2’-アゾビスイソブチロニトリル、及び2,2’-アゾビス(4-メトキシ-2,4-ジメチルバレロニトリル)等のアゾ系化合物;並びに、過酸化ベンゾイル、過酸化ラウロイル、過酢酸、過コハク酸、ジ-t-ブチルパーオキサイド、t-ブチルヒドロパーオキサイド、及びクメンヒドロパーオキサイド等の有機過酸化物等の熱ラジカル重合開始剤が挙げられる。 Thermal polymerization initiators include peroxodisulfates such as hydrogen peroxide, ammonium peroxodisulfate, sodium peroxodisulfate, and potassium peroxodisulfate; azo compounds such as 2,2'-azobis(2-amidinopropane) dihydrochloride, 4,4'-azobis(4-cyanovaleric acid), 2,2'-azobisisobutyronitrile, and 2,2'-azobis(4-methoxy-2,4-dimethylvaleronitrile); and thermal radical polymerization initiators such as organic peroxides such as benzoyl peroxide, lauroyl peroxide, peracetic acid, persuccinic acid, di-t-butyl peroxide, t-butyl hydroperoxide, and cumene hydroperoxide.
また、熱重合開始剤としては、上記の熱ラジカル重合開始剤以外に、熱カチオン重合開始剤が挙げられる。熱カチオン重合開始剤は、加熱によって、重合を開始させるカチオン種を発生しうる化合物である。熱カチオン重合開始剤としては、スルホニウム塩、第四級アンモニウム塩、ホスホニウム塩、ジアゾニウム塩、及びヨードニウム塩等が挙げられる。これらの中でも、入手が容易であること、接着性及び透明性により優れる樹脂層3が得られ易いこと等の観点から、熱カチオン重合開始剤は、スルホニウム塩であることが好ましい。 In addition to the above-mentioned thermal radical polymerization initiators, thermal cationic polymerization initiators can also be used as thermal polymerization initiators. Thermal cationic polymerization initiators are compounds that, when heated, can generate cationic species that initiate polymerization. Examples of thermal cationic polymerization initiators include sulfonium salts, quaternary ammonium salts, phosphonium salts, diazonium salts, and iodonium salts. Among these, sulfonium salts are preferred as the thermal cationic polymerization initiator, as they are easily available and can easily produce a resin layer 3 with superior adhesion and transparency.
スルホニウム塩としては、トリフェニルスルホニウムテトラフルオロボレート、トリフェニルスルホニウムヘキサフルオロアンチモネート、ベンジル(4-ヒドロキシフェニル)メチルスルホニウムテトラキス(ペンタフルオロフェニル)ボレート、(4-ヒドロキシフェニル)メチル(4-メチルベンジル)スルホニウムテトラキス(ペンタフルオロフェニル)ボレート及びトリフェニルスルホニウムヘキサフルオロアルシネート等が挙げられる。 Sulfonium salts include triphenylsulfonium tetrafluoroborate, triphenylsulfonium hexafluoroantimonate, benzyl(4-hydroxyphenyl)methylsulfonium tetrakis(pentafluorophenyl)borate, (4-hydroxyphenyl)methyl(4-methylbenzyl)sulfonium tetrakis(pentafluorophenyl)borate, and triphenylsulfonium hexafluoroarsinate.
第四級アンモニウム塩としては、テトラブチルアンモニウムテトラフルオロボレート、テトラブチルアンモニウムヘキサフルオロホスフェート、及びテトラブチルアンモニウムハイドロジェンサルフェート等が挙げられる。また、ホスホニウム塩としては、エチルトリフェニルホスホニウムヘキサフルオロアンチモネート、及びテトラブチルホスホニウムヘキサフルオロアンチモネート等が挙げられる。 Quaternary ammonium salts include tetrabutylammonium tetrafluoroborate, tetrabutylammonium hexafluorophosphate, and tetrabutylammonium hydrogen sulfate. Phosphonium salts include ethyltriphenylphosphonium hexafluoroantimonate and tetrabutylphosphonium hexafluoroantimonate.
ジアゾニウム塩としては、塩化ベンゼンジアゾニウム等が挙げられる。ヨードニウム塩としては、ジフェニルヨードニウムヘキサフルオロアルシネート、ビス(4-クロロフェニル)ヨードニウムヘキサフルオロアルシネート、ビス(4-ブロモフェニル)ヨードニウムヘキサフルオロアルシネート、及びフェニル(4-メトキシフェニル)ヨードニウムヘキサフルオロアルシネート等が挙げられる。 Diazonium salts include benzenediazonium chloride. Iodonium salts include diphenyliodonium hexafluoroarsinate, bis(4-chlorophenyl)iodonium hexafluoroarsinate, bis(4-bromophenyl)iodonium hexafluoroarsinate, and phenyl(4-methoxyphenyl)iodonium hexafluoroarsinate.
これらの重合開始剤は、1種単独で、あるいは2種以上を組み合わせて用いることができる。
これらの重合開始剤を用いて架橋構造を形成する場合、その使用量は、エネルギー線硬化性樹脂又は熱硬化性樹脂100質量部に対して、0.1質量部以上、30質量部以下であることが好ましく、0.3質量部以上、20質量部以下であることがより好ましく、0.5質量部以上、10質量部以下であることが特に好ましい。
These polymerization initiators may be used alone or in combination of two or more.
When forming a crosslinked structure using these polymerization initiators, the amount used is preferably 0.1 parts by mass or more and 30 parts by mass or less, more preferably 0.3 parts by mass or more and 20 parts by mass or less, and particularly preferably 0.5 parts by mass or more and 10 parts by mass or less, relative to 100 parts by mass of the energy ray-curable resin or the thermosetting resin.
また、熱硬化性樹脂を用いる場合、イミダゾール系硬化触媒等の硬化触媒を用いてもよい。 If a thermosetting resin is used, a curing catalyst such as an imidazole-based curing catalyst may also be used.
本実施形態において、硬化性の接着剤は、エネルギー線硬化性樹脂又は熱硬化性樹脂と共に、硬化前のシート形状の維持を容易にするため、柔軟性調整成分を含有していてもよい。柔軟性調整成分として用いられるポリマーとしては、フェノキシ樹脂、ポリオレフィン系樹脂又はその変性物、ポリアミドイミド樹脂、ポリイミド樹脂、ゴム系樹脂、及びアクリル樹脂等が挙げられる。 In this embodiment, the curable adhesive may contain, in addition to the energy ray-curable resin or thermosetting resin, a flexibility-adjusting component to facilitate maintaining the sheet shape before curing. Examples of polymers that can be used as flexibility-adjusting components include phenoxy resin, polyolefin resin or modified polyolefin resin, polyamide-imide resin, polyimide resin, rubber-based resin, and acrylic resin.
これらの柔軟性調整成分は、1種単独で、あるいは2種以上を組み合わせて用いることができる。 These softness-adjusting ingredients can be used alone or in combination of two or more.
本実施形態に用いる硬化性の接着剤が柔軟性調整成分を含む場合、接着剤が含むエネルギー線硬化性樹脂又は熱硬化性樹脂の合計量は、樹脂層3の貯蔵弾性率を調整する観点から、柔軟性調整成分100質量部に対して、15質量部以上、300質量部以下であることが好ましく、30質量部以上、250質量部以下であることがより好ましく、60質量部以上、200質量部以下であることがさらに好ましい。また、接着剤がエネルギー線硬化性樹脂又は熱硬化性樹脂を含み、柔軟性調整成分を含まない場合、樹脂層3の貯蔵弾性率が高くなり過ぎてしまう傾向がある。 When the curable adhesive used in this embodiment contains a flexibility-adjusting component, the total amount of energy ray-curable resin or thermosetting resin contained in the adhesive is, from the viewpoint of adjusting the storage modulus of the resin layer 3, preferably 15 parts by mass or more and 300 parts by mass or less, more preferably 30 parts by mass or more and 250 parts by mass or less, and even more preferably 60 parts by mass or more and 200 parts by mass or less, per 100 parts by mass of the flexibility-adjusting component. Furthermore, when the adhesive contains an energy ray-curable resin or thermosetting resin but does not contain a flexibility-adjusting component, the storage modulus of the resin layer 3 tends to be too high.
本実施形態において、硬化性の接着剤は、充填材を含有していてもよく、充填材を含有していなくてもよい。樹脂層3の23℃における貯蔵弾性率をより高くできる観点から、硬化性の接着剤は、充填材を含有していてもよい。樹脂層3の23℃における貯蔵弾性率の上昇を抑制する観点から、硬化性の接着剤は、充填材を含有していなくてもよい。 In this embodiment, the curable adhesive may or may not contain a filler. From the viewpoint of increasing the storage modulus of the resin layer 3 at 23°C, the curable adhesive may contain a filler. From the viewpoint of suppressing an increase in the storage modulus of the resin layer 3 at 23°C, the curable adhesive may not contain a filler.
充填材としては、例えば、シリカ、アルミナ、タルク、炭酸カルシウム、チタンホワイト、ベンガラ、炭化珪素、及び窒化ホウ素等の無機粉末;無機粉末を球形化したビーズ、単結晶繊維、及びガラス繊維等が挙げられる。これらの中でも、充填材は、シリカフィラー及びアルミナフィラーであることが好ましい。充填材は、1種単独で用いてもよく、2種以上を併用してもよい。 Fillers include, for example, inorganic powders such as silica, alumina, talc, calcium carbonate, titanium white, red iron oxide, silicon carbide, and boron nitride; beads made by spheroidizing inorganic powders, single-crystal fibers, and glass fibers. Of these, silica filler and alumina filler are preferred. Fillers may be used alone or in combination of two or more types.
硬化性の接着剤には、その他の成分が含まれていてもよい。その他の成分としては、例えば、有機溶媒、カップリング剤、難燃剤、粘着付与剤、紫外線吸収剤、酸化防止剤、防腐剤、防黴剤、可塑剤、消泡剤、及び濡れ性調整剤等の周知の添加剤が挙げられる。 The curable adhesive may contain other components. Examples of other components include well-known additives such as organic solvents, coupling agents, flame retardants, tackifiers, UV absorbers, antioxidants, preservatives, antifungal agents, plasticizers, antifoaming agents, and wettability adjusters.
(電極)
電極4は、導電性線状体21に電流を供給するために用いられる。電極4は、一対になっている。電極4は、導電性線状体21に直接的に接触する。そして、電極4は、導電性線状体21の両端部に電気的に接続されて配置される。
(electrode)
The electrodes 4 are used to supply current to the conductive linear body 21. The electrodes 4 are in a pair. The electrodes 4 are in direct contact with the conductive linear body 21. The electrodes 4 are disposed so as to be electrically connected to both ends of the conductive linear body 21.
電極4の軸方向における抵抗値Rと、導電性線状体21の軸方向における全体の抵抗値rとの関係は、下記数式(F1)で表される条件を満たすことが好ましい。下記数式(F1)で表される条件を満たす場合には、電極4の発熱を小さくできる。
r>R ・・・(F1)
It is preferable that the relationship between the resistance value R of the electrode 4 in the axial direction and the overall resistance value r of the conductive linear body 21 in the axial direction satisfies the condition expressed by the following formula (F1). When the condition expressed by the following formula (F1) is satisfied, heat generation of the electrode 4 can be reduced.
r>R...(F1)
R/rの値は、0.0001以上であることが好ましく、0.0005以上であることがより好ましい。また、R/rは、0.3以下であることが好ましく、0.15以下であることがより好ましい。配線シート100を発熱体として用いる場合、配線体2を発熱させるため、配線体2はある程度の抵抗を有する必要がある一方、電極4は可能な限り電流が流れやすいことが好ましい。 The value of R/r is preferably 0.0001 or greater, and more preferably 0.0005 or greater. Furthermore, R/r is preferably 0.3 or less, and more preferably 0.15 or less. When using wiring sheet 100 as a heating element, wiring body 2 needs to have a certain degree of resistance in order to generate heat, while electrodes 4 preferably allow current to flow as easily as possible.
電極4の軸方向における抵抗値Rと、導電性線状体21の軸方向における全体の抵抗値rは、テスターを用いて測定することができる。まず電極4の軸方向における抵抗値Rと導電性線状体21の軸方向における抵抗値(1本あたり)を測定する。導電性線状体21の軸方向における抵抗値は、導電性線状体21の断面積に反比例することから、導電性線状体21の軸方向における抵抗値(1本あたり)を導電性線状体21の本数で割ることで、導電性線状体21の軸方向における全体の抵抗値rを算出する。 The resistance value R in the axial direction of the electrode 4 and the overall resistance value r in the axial direction of the conductive linear body 21 can be measured using a tester. First, the resistance value R in the axial direction of the electrode 4 and the resistance value (per wire) in the axial direction of the conductive linear body 21 are measured. Since the resistance value in the axial direction of the conductive linear body 21 is inversely proportional to the cross-sectional area of the conductive linear body 21, the overall resistance value r in the axial direction of the conductive linear body 21 can be calculated by dividing the resistance value (per wire) in the axial direction of the conductive linear body 21 by the number of conductive linear bodies 21.
電極4のヤング率は、1×109Pa超、1×1011Pa以下であることが好ましい。電極4のヤング率が1×1011Pa以下であれば、導電性線状体21と電極4との接触抵抗をより小さくできる傾向にある。同様の観点から、電極4のヤング率は、8.5×1010Pa以下であることがより好ましく、7×1010Pa以下であることがさらに好ましい。電極4のヤング率は、2×109Pa以上であってもよく、3×109Pa以上であってもよく、5×109Pa以上であってもよい。 The Young's modulus of the electrode 4 is preferably more than 1×10 9 Pa and not more than 1×10 11 Pa. If the Young's modulus of the electrode 4 is 1×10 11 Pa or less, the contact resistance between the conductive linear body 21 and the electrode 4 tends to be smaller. From the same viewpoint, the Young's modulus of the electrode 4 is more preferably 8.5×10 10 Pa or less, and even more preferably 7×10 10 Pa or less. The Young's modulus of the electrode 4 may be 2×10 9 Pa or more, 3×10 9 Pa or more, or 5×10 9 Pa or more.
電極4のヤング率は、連続剛性測定法により測定できる。例えば、ナノインデンター(MTSシステムズ社製)を用いて、以下の条件で、ガラス基材上に設けられた電極4の25℃でのヤング率を測定できる。
圧子形状:三角錐
圧子の最大押し込み深さ:500nm
振動周波数:75Hz
The Young's modulus of the electrode 4 can be measured by a continuous stiffness measurement method. For example, the Young's modulus of the electrode 4 provided on a glass substrate at 25° C. can be measured using a nanoindenter (manufactured by MTS Systems) under the following conditions.
Indenter shape: triangular pyramid Maximum indenter depth: 500 nm
Vibration frequency: 75Hz
電極4の厚さの最大値は、40μm以下であることが好ましい。電極4の厚さの最大値は、30μm以下であることがより好ましく、20μm以下であることがさらに好ましい。電極4の厚さの最大値は、40μm以下であれば、導電性線状体21と電極4とを接触させた際に、導電性線状体21の変形が小さく、導通が安定化しやすい傾向にある。電極4の厚さの最大値は、5μm以上であることが好ましく、8μm以上であることがより好ましく、10μm以上であることがさらに好ましい。 The maximum thickness of the electrode 4 is preferably 40 μm or less. The maximum thickness of the electrode 4 is more preferably 30 μm or less, and even more preferably 20 μm or less. If the maximum thickness of the electrode 4 is 40 μm or less, deformation of the conductive linear body 21 tends to be small when the conductive linear body 21 and the electrode 4 are brought into contact, and conductivity tends to be more stable. The maximum thickness of the electrode 4 is preferably 5 μm or more, more preferably 8 μm or more, and even more preferably 10 μm or more.
配線シート100の平面視において、電極4の幅の最大値は、1mm以上、10mm以下であることが好ましい。電極4の幅の最大値は、電極4の一方の電極4の幅が、上記範囲であることが好ましい。電極4の幅の最大値は、1.5mm以上であることがより好ましく、2mm以上であることがさらに好ましい。電極4の幅の最大値は、8mm以下であることがより好ましく、6mm以下であることがさらに好ましく、4mm以下であることがよりさらに好ましい。配線シート100の平面視において、電極4の幅の最大値が、1mm以上、10mm以下であれば、導電性線状体21との接触箇所を確保しやすい。 In a plan view of the wiring sheet 100, the maximum width of the electrode 4 is preferably 1 mm or more and 10 mm or less. The maximum width of one of the electrodes 4 is preferably within the above range. The maximum width of the electrode 4 is more preferably 1.5 mm or more, and even more preferably 2 mm or more. The maximum width of the electrode 4 is more preferably 8 mm or less, even more preferably 6 mm or less, and even more preferably 4 mm or less. In a plan view of the wiring sheet 100, if the maximum width of the electrode 4 is 1 mm or more and 10 mm or less, it is easier to ensure contact points with the conductive linear members 21.
電極4は、公知の電極材料を用いて形成できる。電極材料としては、導電性ペースト、金属箔、及び金属ワイヤー等が挙げられる。 The electrode 4 can be formed using known electrode materials. Examples of electrode materials include conductive paste, metal foil, and metal wire.
導電性ペーストとしては、銀ペースト、銅ペースト、及びカーボンペースト等が挙げられる。これらの中でも、低い体積抵抗率の観点から、導電性ペーストは、銀ペーストであることが好ましい。 Conductive pastes include silver paste, copper paste, and carbon paste. Of these, silver paste is preferred as the conductive paste from the standpoint of low volume resistivity.
電極材料が、金属箔又は金属ワイヤーである場合、金属箔又は金属ワイヤーの金属としては、銅、アルミニウム、タングステン、鉄、モリブデン、ニッケル、チタン、銀、及び金等の金属;又は、ステンレス鋼、炭素鋼等の鋼鉄、真鍮、りん青銅、ジルコニウム銅合金、ベリリウム銅、鉄ニッケル、ニクロム、ニッケルチタン、カンタル、ハステロイ、及びレニウムタングステン等の金属を二種以上含む合金が挙げられる。また、金属箔又は金属ワイヤーは、金、錫、亜鉛、銀、ニッケル、クロム、ニッケルクロム合金、又は、はんだ等でめっきされていてもよい。電極材料が金属ワイヤーである場合、金属ワイヤーは、1本であってもよく、2本以上であってもよい。 When the electrode material is a metal foil or metal wire, examples of the metal of the metal foil or metal wire include copper, aluminum, tungsten, iron, molybdenum, nickel, titanium, silver, and gold; or alloys containing two or more metals, such as steels such as stainless steel and carbon steel, brass, phosphor bronze, zirconium-copper alloys, beryllium copper, iron-nickel, nichrome, nickel-titanium, Kanthal, Hastelloy, and rhenium-tungsten. The metal foil or metal wire may also be plated with gold, tin, zinc, silver, nickel, chromium, nickel-chromium alloys, solder, or the like. When the electrode material is a metal wire, the metal wire may be one or two or more.
電極4は、金めっき処理が施されていることが好ましい。この金めっき処理により、電極4のマイグレーションを抑制できる。 The electrode 4 is preferably gold-plated. This gold plating process can suppress migration of the electrode 4.
(配線シートの用途等)
本実施形態に係る配線シート100は、例えば、面状ヒーターとして好適に使用できる。この場合、面状ヒーターの用途としては、例えば、窓ガラス用のデフォッガー、及びデフロスター等が挙げられる。また、面状ヒーターとしての利用以外にも、電気信号の配線のためのフラットケーブルとしても利用することができる。また、本実施形態に係る配線シート100は、光学センサ用ヒーターとして使用できる。この場合、光学センサ用ヒーターとしては、例えば、LiDARセンサ等の光学センサ用ヒーターとして使用できる。
(Use of wiring sheet, etc.)
The wiring sheet 100 according to the present embodiment can be suitably used, for example, as a sheet heater. In this case, examples of uses of the sheet heater include a window defogger and a defroster. In addition to use as a sheet heater, the wiring sheet 100 can also be used as a flat cable for wiring electrical signals. The wiring sheet 100 according to the present embodiment can also be used as a heater for an optical sensor. In this case, the heater for the optical sensor can be used, for example, as a heater for an optical sensor such as a LiDAR sensor.
配線シート100を温度85℃、相対湿度85%RHの湿熱環境下で使用又は保管した際の抵抗値変化率は、20%以下であることが好ましく、18%以下であることがより好ましく、17%以下であることがさらに好ましく、15%以下であることがよりさらに好ましく、13%以下であることがさらになお好ましい。配線シート100を温度85℃、相対湿度85%RHの湿熱環境下で使用又は保管した際の抵抗値変化率は、0%又は0%に近いほうが好ましい。配線シート100を湿熱環境下で使用又は保管した際の抵抗値変化率は、0%以上であってもよく、0.1%以上であってもよい。抵抗値変化率が20%以下であれば、配線シートを湿熱環境下で使用又は保管しても、配線シートの腐食が抑制される。また、配線シートを湿熱環境下で使用又は保管することが可能となる。抵抗値変化率は後述の実施例に記載の方法で測定できる。ここで、配線シート100を上記の湿熱環境下で使用又は保管した際の時間は1000時間である。なお、上記の抵抗値変化率は、0%を下回ってもよい。また、上記の抵抗値変化率は、配線シート100を温度85℃、相対湿度85%RHの湿熱環境下で使用又は保管した前後の抵抗値変化率の絶対値として、0%以上、20%以下であることも好ましい。 The resistance change rate when the wiring sheet 100 is used or stored in a humid and hot environment at a temperature of 85°C and a relative humidity of 85% RH is preferably 20% or less, more preferably 18% or less, even more preferably 17% or less, even more preferably 15% or less, and even more preferably 13% or less. The resistance change rate when the wiring sheet 100 is used or stored in a humid and hot environment at a temperature of 85°C and a relative humidity of 85% RH is preferably 0% or close to 0%. The resistance change rate when the wiring sheet 100 is used or stored in a humid and hot environment may be 0% or more, or even 0.1% or more. A resistance change rate of 20% or less suppresses corrosion of the wiring sheet even when the wiring sheet is used or stored in a humid and hot environment. Furthermore, the wiring sheet can be used or stored in a humid and hot environment. The resistance change rate can be measured by the method described in the Examples below. Here, the time period when the wiring sheet 100 is used or stored in the above-mentioned humid and hot environment is 1,000 hours. The above-mentioned rate of change in resistance value may be below 0%. Furthermore, the rate of change in resistance value is preferably 0% or more and 20% or less, in terms of the absolute value of the rate of change in resistance value before and after use or storage of the wiring sheet 100 in a humid and hot environment at a temperature of 85°C and a relative humidity of 85% RH.
[配線シートの製造方法]
次に、本実施形態に係る配線シート100の製造方法について説明する。本実施形態に係る配線シート100の製造方法は、特に限定されない。本実施形態に係る配線シート100の製造方法は、前述の配線シート100を作製できる方法の一例である。配線シート100は、例えば、次の工程により、製造できる。
[Method of manufacturing wiring sheet]
Next, a method for manufacturing the wiring sheet 100 according to the present embodiment will be described. The method for manufacturing the wiring sheet 100 according to the present embodiment is not particularly limited. The method for manufacturing the wiring sheet 100 according to the present embodiment is one example of a method capable of producing the above-described wiring sheet 100. The wiring sheet 100 can be manufactured, for example, by the following steps.
まず、配線体2を備える配線体シートを作製する工程を行う。この工程では、剥離シートの上に、樹脂層3を形成する。樹脂層3が熱硬化性の接着剤により形成される場合、樹脂層3を形成するための熱硬化性の接着剤を塗布し、塗膜を形成する。次に、塗膜を乾燥させて、樹脂層3としての接着剤層を作製する。次に、接着剤層上に、導電性線状体21を配列しながら配置して、配線体2を形成する。例えば、ドラム部材の外周面に剥離シート付きの接着剤層を配置した状態で、ドラム部材を回転させながら、接着剤層上に導電性線状体21を螺旋状に巻き付ける。その後、螺旋状に巻き付けた導電性線状体21の束をドラム部材の軸方向に沿って切断する。これにより、配線体2を形成すると共に、接着剤層上に配置する。このようにして、剥離シート付きの接着剤層上に配線体2が形成されている配線体シートが得られる。この方法によれば、例えば、ドラム部材を回転させながら、導電性線状体21の繰り出し部をドラム部材の軸と平行な方向に沿って移動させることで、配線体2における隣り合う導電性線状体21の間隔Lを調整することが容易である。 First, a process for producing a wiring sheet including wiring body 2 is performed. In this process, a resin layer 3 is formed on a release sheet. If the resin layer 3 is formed from a thermosetting adhesive, the thermosetting adhesive for forming the resin layer 3 is applied to form a coating film. Next, the coating film is dried to produce an adhesive layer as the resin layer 3. Next, conductive linear bodies 21 are arranged and placed on the adhesive layer to form the wiring body 2. For example, with the adhesive layer with a release sheet placed on the outer surface of a drum member, the drum member is rotated and the conductive linear bodies 21 are spirally wound around the adhesive layer. Then, the bundle of spirally wound conductive linear bodies 21 is cut along the axial direction of the drum member. This forms the wiring body 2, which is then placed on the adhesive layer. In this way, a wiring body sheet is obtained in which wiring body 2 is formed on an adhesive layer with a release sheet. With this method, for example, by rotating the drum member and moving the payout portion of the conductive linear member 21 in a direction parallel to the axis of the drum member, it is easy to adjust the spacing L between adjacent conductive linear members 21 in the wiring body 2.
次に、基材1の上に、一対の電極4を設ける工程を行う。この工程では、基材1の上に、例えば、導電性ペースト等を所定の配置で印刷し、乾燥等することで、一対の電極4を設けることができる。 Next, a process is performed to provide a pair of electrodes 4 on the substrate 1. In this process, for example, a conductive paste or the like is printed in a predetermined arrangement on the substrate 1, and then dried, etc., to provide the pair of electrodes 4.
次に、一対の電極4が設けられた基材1の上に、上記で作製した配線体シートを配置し、熱硬化性の接着剤を硬化させる工程を行う。この工程では、配線体シートの配線体2における導電性線状体21の両端部に、一対の電極4が接触するように、一対の電極4が設けられた基材1の上に、配線体シートを貼り合わせる。そして、剥離シートを剥がした後で、熱硬化性の接着剤に、所定の熱処理を施すことで、樹脂層3を形成して、配線シート100を作製する。 Next, the wiring sheet prepared above is placed on the substrate 1 provided with a pair of electrodes 4, and the thermosetting adhesive is cured. In this process, the wiring sheet is attached to the substrate 1 provided with a pair of electrodes 4 so that the pair of electrodes 4 contact both ends of the conductive linear members 21 in the wiring 2 of the wiring sheet. After the release sheet is removed, the thermosetting adhesive is subjected to a specified heat treatment to form a resin layer 3, and the wiring sheet 100 is produced.
[実施形態の作用効果]
本実施形態によれば、次のような作用効果を奏することができる。
(1)本実施形態によれば、湿熱環境下(例えば、温度85℃、相対湿度85%RHの環境下)で使用又は保管しても、配線シート100の抵抗値変化を抑制できる。
(2)本実施形態によれば、導電性線状体21の波長1000nmにおける赤外線反射率を、0%以上、90%以下の範囲とすることにより、導電性線状体21を黒色化できる。このため、例えば、配線シート100に意匠性を付与することが可能になる。また、例えば、配線シート100を光学センサ用ヒーターとして適用することができる。
(3)本実施形態によれば、樹脂層3により、導電性線状体21を固定でき、配線シート100の内部における厚さ方向の変形を抑制し、導電性線状体21と電極4との接触を安定させ、配線体2の抵抗値を安定化できる。
[Effects of the embodiment]
According to this embodiment, the following effects can be achieved.
(1) According to this embodiment, even when used or stored in a humid and hot environment (for example, an environment at a temperature of 85° C. and a relative humidity of 85% RH), changes in the resistance value of wiring sheet 100 can be suppressed.
(2) According to this embodiment, the conductive linear body 21 can be blackened by setting the infrared reflectance at a wavelength of 1000 nm of the conductive linear body 21 to a range of 0% to 90%. This makes it possible to impart design features to the wiring sheet 100, for example. Furthermore, the wiring sheet 100 can be used as a heater for an optical sensor, for example.
(3) According to this embodiment, the resin layer 3 can fix the conductive linear body 21, suppress deformation in the thickness direction inside the wiring sheet 100, stabilize the contact between the conductive linear body 21 and the electrode 4, and stabilize the resistance value of the wiring body 2.
[実施形態の変形]
本発明は前述の実施形態に限定されず、本発明の目的を達成できる範囲での変形、又は改良等は本発明に含まれる。
例えば、前述の実施形態では、配線シート100は、基材1を備えているが、これに限定されない。例えば、配線シート100は、基材1を備えていなくてもよい。このような場合には、樹脂層3により、配線シート100を被着体に貼り付けて使用できる。
また、前述の実施形態では、配線シート100の表面に樹脂層3が配置されているが、これに限定されない。例えば、配線シート100における樹脂層3の上に、保護シート(図示しない)を設けて、配線体2を保護してもよい。
[Modification of the embodiment]
The present invention is not limited to the above-described embodiment, and includes modifications and improvements within the scope of achieving the object of the present invention.
For example, in the above-described embodiment, interconnect sheet 100 includes substrate 1, but is not limited to this. For example, interconnect sheet 100 does not have to include substrate 1. In such a case, interconnect sheet 100 can be used by being attached to an adherend by resin layer 3.
In the above-described embodiment, the resin layer 3 is disposed on the surface of the wiring sheet 100, but this is not limiting. For example, a protective sheet (not shown) may be provided on the resin layer 3 of the wiring sheet 100 to protect the wiring body 2.
以下、実施例を挙げて本発明をさらに詳細に説明する。本発明はこれら実施例に何ら限定されない。また、特段の記載がない限り、質量部で示した配合比は固形分の比である。
また、実施例で得られた配線シートの評価は、以下のようにして行った。
The present invention will be described in more detail below with reference to examples. However, the present invention is not limited to these examples. Unless otherwise specified, the blending ratios shown in parts by mass are the ratios of solid content.
The wiring sheets obtained in the examples were evaluated as follows.
[反射率評価]
各実施例及び比較例で使用したワイヤーと同組成のタングステン板に、各実施例及び比較例2で使用しためっき層と同組成の硫化銀めっき、パラジウムめっき、酸化銅-パラジウムめっき、もしくは金めっき、又は比較例1で使用したコート層と同組成のカーボンコートのいずれかを施して、タングステン板に、それぞれの材料によってめっき層又はコート層を形成した。めっき層又はコート層は、各実施例及び各比較例で用いためっき付きタングステンワイヤー又はカーボンコートタングステンワイヤーと同様の方法でコーティングした。硫化銀めっきでめっき層が形成されたタングステン板、パラジウムめっきでめっき層が形成されたタングステン板、酸化銅-パラジウムめっきでめっき層が形成されたタングステン板、金めっきでめっき層が形成されたタングステン板、又はカーボンでコート層が形成されたタングステン板について、それぞれのめっき層又はコート層を、紫外可視近赤外分光光度計(株式会社島津製作所製、製品名「UV-VIS-NIR SPECTROPHOTOMETER UV-3600」)を用いて、波長1000nmにおける赤外線反射率を測定した。
[Reflectance evaluation]
A tungsten plate having the same composition as the wire used in each Example and Comparative Example was plated with silver sulfide, palladium, copper oxide-palladium, or gold, each having the same composition as the plating layer used in each Example and Comparative Example 2, or a carbon coating having the same composition as the coating layer used in Comparative Example 1, to form a plating layer or coating layer of the respective material on the tungsten plate. The plating layer or coating layer was formed in the same manner as the plated tungsten wire or carbon-coated tungsten wire used in each Example and Comparative Example. For a tungsten plate having a silver sulfide-plated layer, a tungsten plate having a palladium-plated layer, a tungsten plate having a copper oxide-palladium-plated layer, a tungsten plate having a gold-plated layer, or a tungsten plate having a carbon-coated layer, the infrared reflectance of each of the plating layers or coating layers was measured at a wavelength of 1000 nm using an ultraviolet-visible-near-infrared spectrophotometer (manufactured by Shimadzu Corporation, product name "UV-VIS-NIR SPECTROPHOTOMETER UV-3600").
[抵抗値評価]
電極に抵抗計(日置電機株式会社製、製品名「RM3545」)を接続し、配線シートの抵抗値(R1)を測定した。配線シートを温度85℃、相対湿度85%RHの湿熱環境下で1000時間静置した後、電極に抵抗計を接続し、配線シートの抵抗値(R2)を測定した。その後、下記数式(F2)から、R1とR2との抵抗値変化率(単位:%)を求めた。この抵抗値変化率が小さいほど、配線シートの抵抗値変化が抑制されている。
抵抗値変化率=[(R2-R1)/R1]×100(%) ・・・(F2)
[Resistance value evaluation]
A resistance meter (manufactured by Hioki E.E. Corporation, product name "RM3545") was connected to the electrodes, and the resistance value ( R1 ) of the wiring sheet was measured. After the wiring sheet was left to stand for 1000 hours in a humid and hot environment at a temperature of 85°C and a relative humidity of 85% RH, a resistance meter was connected to the electrodes, and the resistance value ( R2 ) of the wiring sheet was measured. Then, the rate of change in resistance between R1 and R2 (unit: %) was calculated using the following formula (F2). The smaller this rate of change in resistance, the more suppressed the change in resistance of the wiring sheet.
Resistance change rate=[(R 2 −R 1 )/R 1 ]×100(%) (F2)
[外観評価]
各実施例及び各比較例で得られた配線シートを黒色の板上に設置し、目視で確認した。表1中、導電性線状体が視認できず意匠性に優れる場合を「A」と表記し、導電性線状体が視認され意匠性に劣る場合を「F」と表記した。
[Appearance evaluation]
The wiring sheets obtained in each example and comparative example were placed on a black board and visually inspected. In Table 1, cases in which the conductive linear bodies were not visible and the design was excellent were indicated by "A," and cases in which the conductive linear bodies were visible and the design was poor were indicated by "F."
[調製例1]
(硬化性の接着剤の調整)
フェノキシ樹脂(三菱ケミカル株式会社製、製品名「YX7200B35」)100質量部に、多官能水添ビスフェノールAジグリシジルエーテルエポキシ化合物(三菱ケミカル株式会社製、製品名「YX8000」)170質量部、シランカップリング剤として、8-グリシドキシオクチルトリメトキシシラン0.2質量部、熱カチオン重合開始剤として、ベンジル(4-ヒドロキシフェニル)メチルスルホニウムテトラキス(ペンタフルオロフェニル)ボレート2質量部、及び、(4-ヒドロキシフェニル)メチル(4-メチルベンジル)スルホニウムテトラキス(ペンタフルオロフェニル)ボレート2質量部を配合して、硬化性の接着剤を得た。
[Preparation Example 1]
(Preparation of curable adhesive)
A curable adhesive was obtained by blending 100 parts by mass of phenoxy resin (manufactured by Mitsubishi Chemical Corporation, product name "YX7200B35") with 170 parts by mass of a polyfunctional hydrogenated bisphenol A diglycidyl ether epoxy compound (manufactured by Mitsubishi Chemical Corporation, product name "YX8000"), 0.2 parts by mass of 8-glycidoxyoctyltrimethoxysilane as a silane coupling agent, and 2 parts by mass of benzyl(4-hydroxyphenyl)methylsulfonium tetrakis(pentafluorophenyl)borate and 2 parts by mass of (4-hydroxyphenyl)methyl(4-methylbenzyl)sulfonium tetrakis(pentafluorophenyl)borate as thermal cationic polymerization initiators.
[調製例2]
((メタ)アクリル酸エステル重合体(A)の調製)
2-エチルヘキシルアクリレート55質量部、4-アクリロイルモルホリン5質量部、イソボルニルアクリレート15質量部、及び2-ヒドロキシエチルアクリレート25質量部を溶液重合法により共重合させて、(メタ)アクリル酸エステル重合体(A)を調製した。この(メタ)アクリル酸エステル重合体(A)の分子量を既述の方法で測定したところ、重量平均分子量(Mw)60万であった。また、この(メタ)アクリル酸エステル重合体(A)のガラス転移温度(Tg;℃)を、(メタ)アクリル酸エステル重合体(A)を構成する各モノマーのホモポリマーとしてのガラス転移温度(Tg)に基づき、FOXの式により算出したところ、-36.5℃であった。
[Preparation Example 2]
(Preparation of (meth)acrylic acid ester polymer (A))
A (meth)acrylic acid ester polymer (A) was prepared by copolymerizing 55 parts by mass of 2-ethylhexyl acrylate, 5 parts by mass of 4-acryloylmorpholine, 15 parts by mass of isobornyl acrylate, and 25 parts by mass of 2-hydroxyethyl acrylate by solution polymerization. The molecular weight of this (meth)acrylic acid ester polymer (A) was measured by the method described above, and the weight average molecular weight (Mw) was 600,000. The glass transition temperature (Tg; °C) of this (meth)acrylic acid ester polymer (A) was calculated using the FOX equation based on the glass transition temperatures (Tg) of the respective monomers constituting the (meth)acrylic acid ester polymer (A) as homopolymers, and was found to be -36.5 °C.
[調製例3]
(粘着性組成物の調製)
上記工程で得られた(メタ)アクリル酸エステル重合体(A)100質量部と、架橋剤(B)としてのトリメチロールプロパン変性トリレンジイソシアネート0.18質量部と、活性エネルギー線硬化性成分(C)としてのε-カプロラクトン変性トリス-(2-アクリロキシエチル)イソシアヌレート7質量部と、光重合開始剤(D)としての、ベンゾフェノン及び1-ヒドロキシシクロヘキシルフェニルケトンを1:1の質量比で混合した混合物0.7質量部と、シランカップリング剤としての3-グリシドキシプロピルトリメトキシシラン0.28質量部とを混合し、十分に撹拌して、メチルエチルケトンで希釈することにより、粘着性組成物の塗布溶液を得た。
[Preparation Example 3]
(Preparation of adhesive composition)
100 parts by mass of the (meth)acrylic acid ester polymer (A) obtained in the above process, 0.18 parts by mass of trimethylolpropane-modified tolylene diisocyanate as the crosslinking agent (B), 7 parts by mass of ε-caprolactone-modified tris-(2-acryloxyethyl)isocyanurate as the active energy ray-curable component (C), 0.7 parts by mass of a mixture of benzophenone and 1-hydroxycyclohexyl phenyl ketone in a 1:1 mass ratio as the photopolymerization initiator (D), and 0.28 parts by mass of 3-glycidoxypropyltrimethoxysilane as the silane coupling agent were mixed, thoroughly stirred, and diluted with methyl ethyl ketone to obtain a coating solution of a pressure-sensitive adhesive composition.
[実施例1]
(硫化銀めっきタングステンワイヤーの作製)
水1Lに対し、硫化カリウムを3.5g加え、硫化液を調整した。硫化液に銀めっきタングステンワイヤー(直径12μm、体積抵抗率5.5×10-8Ω・m)を浸し、硫化銀めっきタングステンワイヤーを作製した。なお、作製した硫化銀めっきタングステンワイヤーにおける硫化銀めっき層の厚さは、0.1μmであった。硫化銀めっきタングステンワイヤーは黒色に近い色相であった。
[Example 1]
(Preparation of silver sulfide-plated tungsten wire)
A sulfurizing solution was prepared by adding 3.5 g of potassium sulfide to 1 L of water. A silver-plated tungsten wire (diameter 12 μm, volume resistivity 5.5×10 −8 Ω·m) was immersed in the sulfurizing solution to prepare a silver sulfide-plated tungsten wire. The thickness of the silver sulfide plating layer on the prepared silver sulfide-plated tungsten wire was 0.1 μm. The silver sulfide-plated tungsten wire had a hue close to black.
(配線体シートの作製)
厚さ38μmの剥離シート(リンテック株式会社製、製品名「SP-PET382150」)上に、調製例1で得られた硬化性の接着剤を厚さ10μmに塗布し、250mm×320mmの長方形に裁断し、硬化性の接着剤層(以下、接着剤層と称する場合がある。)を備える接着シートを作製した。導電性線状体として、上記で作製した硫化銀めっきタングステンワイヤー(以下、ワイヤーと称する場合がある。)を準備した。次に、外周面がゴム製のドラム部材に、上記で得られた接着シートを、接着剤層の表面が外側を向き、しわのないように巻きつけ、円周方向における上記接着シートの両端部を両面テープで固定した。ボビンに巻き付けた上記ワイヤーを、ドラム部材の端部付近に位置する接着シートの接着剤層の表面に付着させた上で、ワイヤーを繰り出しながらドラム部材で巻き取り、少しずつドラム部材をドラム軸と平行な方向に移動させていき、ワイヤーが等間隔3mmでらせんを描きながらドラム部材に巻きつくようにした。これにより、ワイヤーが接着剤層の表面に96本並べられた状態で配線体を形成した。その後、ワイヤーを切断し、ドラム部材上から、配線体を取り外した。ワイヤー12本分が取り出されるように、40mm×82mm幅に配線体を裁断し、配線体シートを作製した。導電性線状体の軸方向における全体の抵抗値rは4.93Ωであった。
(Production of wiring sheet)
The curable adhesive obtained in Preparation Example 1 was applied to a thickness of 10 μm on a 38 μm thick release sheet (manufactured by Lintec Corporation, product name "SP-PET382150") and cut into a 250 mm x 320 mm rectangle to produce an adhesive sheet with a curable adhesive layer (hereinafter sometimes referred to as the adhesive layer). The silver sulfide-plated tungsten wire (hereinafter sometimes referred to as the wire) produced above was prepared as the conductive linear body. Next, the adhesive sheet obtained above was wrapped around a drum member with a rubber outer periphery, with the surface of the adhesive layer facing outward and without wrinkles, and both ends of the adhesive sheet in the circumferential direction were fixed with double-sided tape. The wire wound around the bobbin was attached to the surface of the adhesive layer of the adhesive sheet located near the end of the drum member, and the wire was then unwound and wound around the drum member. The drum member was gradually moved in a direction parallel to the drum axis so that the wire was wound around the drum member in a spiral at equal intervals of 3 mm. This resulted in a wiring body with 96 wires arranged on the surface of the adhesive layer. The wires were then cut, and the wiring body was removed from the drum member. The wiring body was cut into a 40 mm x 82 mm width so that 12 wires could be removed, and a wiring body sheet was produced. The overall resistance value r in the axial direction of the conductive linear body was 4.93 Ω.
(電極付き基材の作製)
厚さ2mmのガラスに対して、銀ペースト(十条ケミカル株式会社製、製品名「#2 TF銀ペースト」)を3mm幅で電極間距離7.8mmになるようにスクリーン印刷した後、150℃、30分の条件にて乾燥させて膜厚が12μmの塗膜を形成し、電極付き基材を作製した。その後、無電解めっきにより、銀ペースト上にニッケル層(厚さ:1μm)及び金層(厚さ:50nm)をこの順に積層し、電極(抵抗値R:0.56Ω)付き基材を作製した。電極の弾性率は62.6GPaであった。
(Preparation of substrate with electrode)
A silver paste (manufactured by Jujo Chemical Co., Ltd., product name "#2 TF Silver Paste") was screen-printed onto a 2 mm thick glass substrate with a width of 3 mm and an inter-electrode distance of 7.8 mm. The resulting substrate was then dried at 150 °C for 30 minutes to form a coating film with a thickness of 12 μm, producing a substrate with electrodes. Subsequently, a nickel layer (thickness: 1 μm) and a gold layer (thickness: 50 nm) were laminated in this order on the silver paste by electroless plating, producing a substrate with electrodes (resistance value R: 0.56 Ω). The elastic modulus of the electrode was 62.6 GPa.
(被覆層形成用組成物の調製)
赤外線透過インクとして、可視光吸収赤外線透過インク(十条ケミカル株式会社製、製品名「TG-IRインキPB-Aブラック」)を準備した。この赤外線透過インクは、ペリレン系顔料を含んでいる。この赤外線透過インク100質量部に対して、3-アミノプロピルトリメトキシシラン2質量部、及びトリメチロールプロパンアダクトキシリレンジイソシアナート5質量部を配合して、被覆層形成用組成物を得た。
(Preparation of composition for forming coating layer)
A visible light-absorbing infrared transparent ink (manufactured by Jujo Chemical Co., Ltd., product name "TG-IR Ink PB-A Black") was prepared as the infrared transparent ink. This infrared transparent ink contains a perylene-based pigment. 2 parts by mass of 3-aminopropyltrimethoxysilane and 5 parts by mass of trimethylolpropane adduct xylylene diisocyanate were blended with 100 parts by mass of this infrared transparent ink to obtain a coating layer-forming composition.
(被覆層付き基材の作製)
上記電極付き基材の電極を設けた面とは反対面に対して、上記で調製した被覆層形成用組成物をスクリーン印刷で印刷して塗膜を形成した。その後、90℃で10分乾燥させた後に、150℃で30分乾燥させる二段階の乾燥条件で塗膜を乾燥させることで、基材上に、厚さ6μmの被覆層を形成した。なお、被覆層形成用組成物から形成した被覆層は、黒色に着色されており、波長905nmから1000nmの近赤外線の透過率の最高値は89%、最低値は86%であり、波長380nmから700nmの可視光透過率の最高値は5%、最低値は0%であった。また波長905nmの近赤外線の屈折率は2.10であった。
(Preparation of substrate with coating layer)
The coating layer-forming composition prepared above was screen printed on the surface opposite to the electrode-provided surface of the electrode-equipped substrate to form a coating film. The coating film was then dried under two-stage drying conditions: 10 minutes at 90 ° C., followed by 30 minutes at 150 ° C., to form a coating layer with a thickness of 6 μm on the substrate. The coating layer formed from the coating layer-forming composition was colored black, and had a maximum transmittance of 89% and a minimum of 86% for near-infrared light with a wavelength of 905 nm to 1000 nm, and a maximum transmittance of 5% and a minimum of 0% for visible light with a wavelength of 380 nm to 700 nm. The refractive index of near-infrared light with a wavelength of 905 nm was 2.10.
(配線シートの作製)
電極付き基材に、上記で作製した配線体シートを、ワイヤーの両端に電極が位置するように貼り合わせた。その後、温度120℃、圧力0.5MPa、時間30分の条件で加熱し、実施例1の配線シートを得た。
(Fabrication of wiring sheet)
The wiring sheet prepared above was attached to the substrate with electrodes so that the electrodes were located at both ends of the wires, and then heated at a temperature of 120°C under a pressure of 0.5 MPa for 30 minutes to obtain the wiring sheet of Example 1.
(保護シートの作製)
厚さ100μmのシクロオレフィンポリマーフィルム(日本ゼオン株式会社製、製品名「ZF16」)上に、調製例3で得られた粘着性組成物を厚さ100μmに塗布し、50mm×120mmの長方形に裁断した。その後、2つの円の中心間距離が7.8mmになるように直径5mmの円をくり抜き、保護シートを作製した。
(Preparation of protective sheet)
The pressure-sensitive adhesive composition obtained in Preparation Example 3 was applied to a thickness of 100 μm on a 100 μm cycloolefin polymer film (manufactured by Zeon Corporation, product name "ZF16") and cut into a 50 mm × 120 mm rectangle. A circle with a diameter of 5 mm was then cut out so that the center-to-center distance between the two circles was 7.8 mm, to prepare a protective sheet.
(保護シート付き配線シートの作製)
配線シートに対し、配線シートの電極と保護シートの円が合わさるように保護シートを貼り合わせた。その後、波長365nmの紫外線を、照度200mW/cm2、光量1000mJ/cm2の条件で照射し、保護シート付き配線シートを得た。
(Production of wiring sheet with protective sheet)
The protective sheet was attached to the wiring sheet so that the electrodes of the wiring sheet and the circles of the protective sheet were aligned. Then, ultraviolet light with a wavelength of 365 nm was irradiated at an illuminance of 200 mW/cm 2 and a light quantity of 1000 mJ/cm 2 to obtain a wiring sheet with the protective sheet.
[実施例2]
配線体シートの作製において、導電性線状体として、硫化銀めっきタングステンワイヤーに代えて、パラジウムめっきタングステンワイヤー(直径12μm、体積抵抗率5.5×10-8Ω・m)を使用したこと以外、実施例1と同様にして保護シート付き配線シートを作製した。パラジウムめっきタングステンワイヤーは黒色に近い色相である。
[Example 2]
A wiring sheet with a protective sheet was produced in the same manner as in Example 1, except that palladium-plated tungsten wire (diameter 12 μm, volume resistivity 5.5×10 −8 Ω·m) was used as the conductive linear body instead of the silver sulfide-plated tungsten wire. The palladium-plated tungsten wire has a hue close to black.
[実施例3]
配線体シートの作製において、導電性線状体として、硫化銀めっきタングステンワイヤーに代えて、酸化銅-パラジウムめっきタングステンワイヤーを使用したこと以外、実施例1と同様にして保護シート付き配線シートを作製した。酸化銅-パラジウムめっきタングステンワイヤーは黒色に近い色相である。酸化銅-パラジウムめっきタングステンワイヤーは、以下のようにして作製した。
[Example 3]
A wiring sheet with a protective sheet was produced in the same manner as in Example 1, except that copper oxide-palladium-plated tungsten wire was used as the conductive linear body instead of the silver sulfide-plated tungsten wire. The copper oxide-palladium-plated tungsten wire has a hue close to black. The copper oxide-palladium-plated tungsten wire was produced as follows.
パラジウムを含むめっき液(「OPCブラックカッパー」、奥野製薬工業株式会社製)に、銅めっき処理したタングステンワイヤー(直径12μm、体積抵抗率4.23×10-8Ω・m)を浸し、その後、変色防止剤(「OPCブラックキープ」、奥野製薬工業株式会社製)にて処理することで、酸化銅-パラジウムめっきタングステンワイヤーを作製した。酸化銅-パラジウムめっきタングステンワイヤーは、タングステンワイヤーに、酸化銅とパラジウムとが混在しためっき層を有する。なお、作製した酸化銅-パラジウムめっきタングステンワイヤーにおける酸化銅-パラジウムめっき層の厚さは、0.2μmであった。 A copper-plated tungsten wire (diameter 12 μm, volume resistivity 4.23×10 −8 Ω·m) was immersed in a plating solution containing palladium ("OPC Black Copper", manufactured by Okuno Chemical Industries Co., Ltd.), and then treated with an anti-tarnish agent ("OPC Black Keep", manufactured by Okuno Chemical Industries Co., Ltd.) to produce a copper oxide-palladium-plated tungsten wire. The copper oxide-palladium-plated tungsten wire has a plating layer containing a mixture of copper oxide and palladium on the tungsten wire. The thickness of the copper oxide-palladium plating layer on the produced copper oxide-palladium-plated tungsten wire was 0.2 μm.
[比較例1]
配線体シートの作製において、導電性線状体として、硫化銀めっきタングステンワイヤーに代えて、カーボンコートタングステンワイヤー(直径12μm、体積抵抗率5.5×10-8Ω・m)を使用したこと以外、実施例1と同様にして保護シート付き配線シートを作製した。カーボンコートタングステンワイヤーは、黒色に近い色相である。
[Comparative Example 1]
A wiring sheet with a protective sheet was produced in the same manner as in Example 1, except that a carbon-coated tungsten wire (diameter 12 μm, volume resistivity 5.5×10 −8 Ω·m) was used as the conductive linear body instead of the silver sulfide-plated tungsten wire. The carbon-coated tungsten wire has a hue close to black.
[比較例2]
配線体シートの作製において、導電性線状体として、硫化銀めっきタングステンワイヤーに代えて、金めっきタングステンワイヤー(直径12μm、体積抵抗率5.5×10-8Ω・m)を使用したこと以外、実施例1と同様にして保護シート付き配線シートを作製した。金めっきタングステンワイヤーは、黒色に近い色相ではない。
[Comparative Example 2]
A wiring sheet with a protective sheet was produced in the same manner as in Example 1, except that gold-plated tungsten wire (diameter 12 μm, volume resistivity 5.5×10 −8 Ω·m) was used as the conductive linear body instead of the silver sulfide-plated tungsten wire. The gold-plated tungsten wire does not have a hue close to black.
各実施例で得られた配線シートは、各比較例で得られた配線シートに比べ、反射率評価及び抵抗値評価の結果がいずれも良好であった。また、抵抗値変化率が低く、赤外線反射率が低い各実施例は、外観評価が良好であり、意匠性に優れていた。 The wiring sheets obtained in each example demonstrated better results in both reflectance evaluation and resistance evaluation compared to the wiring sheets obtained in each comparative example. Furthermore, each example with a low rate of change in resistance and low infrared reflectance also demonstrated good appearance evaluation and excellent design.
図3には、配線シートを温度85℃、相対湿度85%RHの環境下に放置したときにおいて、時間と抵抗値変化率との関係を表すグラフが示されている。図3中、横軸は放置時間であり、縦軸は抵抗値変化率である。図3中、Eは、実施例1で作製した配線シートであり、Cは、比較例1で作製した配線シートである。図3に示されるように、実施例1で作製した配線シートは、比較例1で作製した配線シートに比べ、時間の経過と共に抵抗値変化率が大きくなることが分かる。 Figure 3 shows a graph showing the relationship between time and the rate of change in resistance when the wiring sheet is left in an environment at a temperature of 85°C and a relative humidity of 85% RH. In Figure 3, the horizontal axis represents the time of leaving, and the vertical axis represents the rate of change in resistance. In Figure 3, E represents the wiring sheet produced in Example 1, and C represents the wiring sheet produced in Comparative Example 1. As shown in Figure 3, the wiring sheet produced in Example 1 shows a larger rate of change in resistance over time than the wiring sheet produced in Comparative Example 1.
以上の結果から、本実施形態に係る配線シートによれば、導電性線状体の黒色化を達成しつつ、湿熱環境下での腐食を抑制できることが確認された。 These results confirm that the wiring sheet according to this embodiment can suppress corrosion in a humid and hot environment while achieving blackening of the conductive linear body.
1…基材、2…配線体、21…導電性線状体、3…樹脂層、4…電極、100…配線シート。 1...substrate, 2...wiring body, 21...conductive linear body, 3...resin layer, 4...electrode, 100...wiring sheet.
Claims (8)
前記導電性線状体に直接的に接触する一対の電極と、
を備え、
前記導電性線状体の波長1000nmにおける赤外線反射率が、0%以上、90%以下であり、
温度85℃、相対湿度85%RHの湿熱環境下で1000時間静置した後の抵抗値変化率が、50%以下である、
配線シート。 a wiring body including a conductive linear body;
a pair of electrodes in direct contact with the conductive linear body;
Equipped with
the conductive linear body has an infrared reflectance of 0% or more and 90% or less at a wavelength of 1000 nm;
The rate of change in resistance value after leaving the capacitor for 1000 hours in a humid and hot environment at a temperature of 85°C and a relative humidity of 85% RH is 50% or less.
Wiring sheet.
前記電極の軸方向における抵抗値Rと、前記導電性線状体の軸方向における全体の抵抗値rとの関係が、下記数式(F1)で表される条件を満たす、
配線シート。
r>R ・・・(F1) The wiring sheet according to claim 1 ,
a relationship between a resistance value R of the electrode in the axial direction and a total resistance value r of the conductive linear body in the axial direction satisfies the condition expressed by the following formula (F1):
Wiring sheet.
r>R...(F1)
さらに、前記配線体を直接的又は間接的に支持する樹脂層を、備える、
配線シート。 The wiring sheet according to claim 1 or 2,
Further, a resin layer is provided to directly or indirectly support the wiring body.
Wiring sheet.
前記電極の幅の最大値が、1mm以上、10mm以下である、
配線シート。 The wiring sheet according to claim 1 or 2,
The maximum width of the electrode is 1 mm or more and 10 mm or less.
Wiring sheet.
前記配線体は、前記導電性線状体が間隔をもって配列された構造を有する、
配線シート。 The wiring sheet according to claim 1 or 2,
The wiring body has a structure in which the conductive linear bodies are arranged at intervals.
Wiring sheet.
前記配線体は、一本の前記導電性線状体のみからなる、
配線シート。 The wiring sheet according to claim 1 or 2,
The wiring body is composed of only one of the conductive linear bodies.
Wiring sheet.
前記導電性線状体が、硫化物又はパラジウムで被覆されている、
配線シート。 The wiring sheet according to claim 1 or 2,
The conductive linear body is coated with sulfide or palladium.
Wiring sheet.
前記導電性線状体が、硫化銀で被覆されている、
配線シート。 The wiring sheet according to claim 1 or 2,
The conductive linear body is coated with silver sulfide.
Wiring sheet.
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|---|---|---|---|
| JP2024-056940 | 2024-03-29 | ||
| JP2024056940 | 2024-03-29 |
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|---|---|
| WO2025205677A1 true WO2025205677A1 (en) | 2025-10-02 |
Family
ID=97219884
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| PCT/JP2025/011574 Pending WO2025205677A1 (en) | 2024-03-29 | 2025-03-24 | Wiring sheet |
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| JP2023034082A (en) * | 2021-08-30 | 2023-03-13 | 富士フイルム株式会社 | Production method of electrically-conductive board and electrically-conductive board |
| JP2023062211A (en) * | 2020-03-23 | 2023-05-08 | リンテック株式会社 | Wiring sheet and sheet-shaped heater |
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2025
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|---|---|---|---|---|
| JPH087675A (en) * | 1994-06-17 | 1996-01-12 | Sumitomo Electric Ind Ltd | Oxide superconducting wire, method for producing the same, and oxide superconducting conductor |
| JP2001357965A (en) * | 2000-06-15 | 2001-12-26 | Ibiden Co Ltd | Hot plate for manufacture and inspection of semiconductor |
| JP2018206643A (en) * | 2017-06-06 | 2018-12-27 | 大日本印刷株式会社 | Heating electrode sheet, energizing heating panel, and vehicle |
| JP2019167275A (en) * | 2018-03-23 | 2019-10-03 | Agc株式会社 | Glass laminate |
| JP2020015491A (en) * | 2018-07-13 | 2020-01-30 | Agc株式会社 | Vehicle window glass |
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| WO2021002331A1 (en) * | 2019-07-04 | 2021-01-07 | リンテック株式会社 | Heat radiant heater |
| JP2023062211A (en) * | 2020-03-23 | 2023-05-08 | リンテック株式会社 | Wiring sheet and sheet-shaped heater |
| JP2023034082A (en) * | 2021-08-30 | 2023-03-13 | 富士フイルム株式会社 | Production method of electrically-conductive board and electrically-conductive board |
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