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WO2025204874A1 - Procédé de purification de polymère et procédé de production d'une composition de photorésine - Google Patents

Procédé de purification de polymère et procédé de production d'une composition de photorésine

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Publication number
WO2025204874A1
WO2025204874A1 PCT/JP2025/009166 JP2025009166W WO2025204874A1 WO 2025204874 A1 WO2025204874 A1 WO 2025204874A1 JP 2025009166 W JP2025009166 W JP 2025009166W WO 2025204874 A1 WO2025204874 A1 WO 2025204874A1
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Prior art keywords
polymer
solvent
precipitate
purifying
molecular weight
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PCT/JP2025/009166
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English (en)
Japanese (ja)
Inventor
直佑 堀田
丈 小名川
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Zeon Corp
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Zeon Corp
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Publication of WO2025204874A1 publication Critical patent/WO2025204874A1/fr
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Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F6/00—Post-polymerisation treatments
    • C08F6/06—Treatment of polymer solutions
    • C08F6/12—Separation of polymers from solutions
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J3/00—Processes of treating or compounding macromolecular substances
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists

Definitions

  • reprecipitation has been known as a method for removing low molecular weight components from synthesized polymers to obtain purified polymers with a narrow molecular weight distribution (weight average molecular weight/number average molecular weight).
  • the present inventors conducted extensive research to solve the above-mentioned problems. They discovered that when purifying a polymer using a reprecipitation method, a purified polymer with a narrow molecular weight distribution can be obtained in high yield by adding a poor solvent to the polymer solution so that specific conditions are met, rather than by dissolving the polymer in a good solvent and dropping the resulting polymer solution into a poor solvent. They also discovered that using this purification method makes it possible to efficiently produce a resist composition with excellent pattern formability, and thus completed the present invention.
  • the SP value ( ⁇ ) is a value defined by three-dimensional parameters of the Hansen solubility parameters ( ⁇ d , ⁇ p , ⁇ h ), and is expressed by the following formula (1).
  • ⁇ 2 ( ⁇ d ) 2 + ( ⁇ p ) 2 + ( ⁇ h ) 2 ...(1)
  • ⁇ d represents a dispersion term (also referred to as the London dispersion force term)
  • ⁇ p represents a polar term (also referred to as the molecular polarization term)
  • ⁇ h represents a hydrogen bond term.
  • the Hansen solubility parameters ⁇ d , ⁇ p and ⁇ h can be easily estimated from the chemical structure of a substance for which literature values are not known by using HSPiP (Hansen Solubility Parameters in Practice), a program developed by the group of Dr.
  • Hansen who proposed the Hansen solubility parameters.
  • the values are used, and for substances not registered, estimated values using HSPiP version 5.4 are used to determine ⁇ d, ⁇ p, and ⁇ h.
  • ⁇ d, ⁇ p , and ⁇ h for a mixture containing multiple substances are calculated by multiplying the ⁇ d , ⁇ p , and ⁇ h of each individual substance contained in the mixture by the content (by mass) of that substance, and then adding up the resulting values.
  • ⁇ d , ⁇ p , and ⁇ h for a polymer are calculated by multiplying the ⁇ d , ⁇ p , and ⁇ h of the monomers used to form each structural unit contained in the polymer by the content (by mass) of that structural unit, and then adding up the resulting values.
  • the method for purifying a polymer of the present invention [2] is preferably the method for purifying a polymer according to the above [1], wherein the weight-average molecular weight of the precipitate is 130,000 or more and 240,000 or less.
  • the "weight average molecular weight" can be measured by gel permeation chromatography.
  • the method for purifying a polymer of the present invention is preferably a method for purifying a polymer described in any one of [1] to [3] above, in which the solvent is at least one selected from the group consisting of ethers, ketones, and esters.
  • the method for purifying a polymer of the present invention is preferably a method for purifying a polymer described in any of [1] to [4] above, in which the poor solvent is at least one selected from the group consisting of alcohols, aliphatic hydrocarbons, and water.
  • the method for purifying a polymer of the present invention is preferably a method for purifying a polymer described in any one of [1] to [6] above, in which the proportion of the solvent in the mixed solvent is 10% by mass or more and 40% by mass or less.
  • the method for purifying a polymer of the present invention is preferably the method for purifying a polymer according to any one of the above [1] to [7], wherein the SP value of the mixed solvent is 15.0 MPa 0.5 or more and 27.0 MPa 0.5 or less.
  • the method for producing a resist composition of the present invention is characterized by comprising the steps of purifying a polymer using the polymer purification method described in any one of [1] to [8] above, and preparing a resist composition using the purified polymer obtained.
  • the polymer purification method of the present invention makes it possible to obtain polymers with narrow molecular weight distributions in high yields.
  • the polymer purification method of the present invention can be used when removing low-molecular-weight components from a polymer to obtain a purified polymer.
  • the polymer purification method of the present invention is not particularly limited, and can be suitably used when purifying a polymer that can be used as a resist and producing a resist composition.
  • the method for purifying a polymer of the present invention includes a step (A) of adding a poor solvent for the polymer to a polymer solution containing a solvent and a polymer dissolved in the solvent to precipitate a portion of the polymer, thereby obtaining a mixture containing the precipitate and a mixed solvent containing the solvent and the poor solvent, and a step (B) of recovering the precipitate from the mixture.
  • the method for purifying a polymer of the present invention requires that the poor solvent be added so that the absolute value of the difference between the SP value of the polymer and the SP value of the mixed solvent is 10.0 MPa or less.
  • step (A) a poor solvent is added to a polymer solution containing a solvent and a polymer to precipitate a portion of the polymer, thereby obtaining a mixture containing the precipitate and the mixed solvent.
  • the polymer solution contains a solvent and a polymer dissolved in the solvent, and may optionally further contain other components.
  • the polymer concentration in the polymer solution is not particularly limited, and is preferably 1% by mass or more, more preferably 5% by mass or more, and preferably 50% by mass or less, and more preferably 25% by mass or less. If the polymer concentration is equal to or less than the above upper limit, it becomes easier to remove low-molecular-weight components. Furthermore, if the polymer concentration is equal to or greater than the above lower limit, it is possible to suppress an increase in the amount of poor solvent used, thereby reducing the cost required for polymer purification.
  • the solvent is not particularly limited as long as it can dissolve the polymer, and any solvent can be used.
  • the solvent may be one in which the solubility of the polymer at a temperature of 25° C. is 5 g/100 g or more.
  • the solvent is not particularly limited, and at least one selected from the group consisting of ethers such as diethyl ether, dioxane, and tetrahydrofuran; ketones such as acetone, methyl ethyl ketone, cyclohexanone, diisobutyl ketone, and cyclopentanone; and esters such as ethyl acetate, butyl acetate, ethyl propionate, and butyl propionate can be used.
  • ethers such as diethyl ether, dioxane, and tetrahydrofuran
  • ketones such as acetone, methyl ethyl ketone, cyclohexanone, diisobutyl ketone, and cyclopentanone
  • esters such as ethyl acetate, butyl acetate, ethyl propionate, and butyl propionate can be used.
  • cyclic ethers are preferred as ethers, with tetrahydrofuran being more preferred; acetone and cyclopentanone are preferred as ketones; and acetate and propionate are preferred as esters, with acetate being more preferred, and ethyl acetate being even more preferred.
  • the polymer is not particularly limited, and examples thereof include acrylic polymers such as polymethyl methacrylate; diene polymers such as polybutadiene, polyisoprene, styrene-butadiene polymer (SBR), styrene-butadiene-styrene block polymer (SBS), styrene-isoprene polymer, styrene-isoprene-styrene block polymer (SIS), and acrylonitrile-butadiene polymer (NBR), and hydrogenated products thereof; cyclic olefin polymers such as cyclic olefin copolymer (COC) and cyclic olefin polymer (COP), and hydrogenated products thereof; and other polymers.
  • diene polymers such as polybutadiene, polyisoprene, styrene-butadiene polymer (SBR), styrene-butadiene-sty
  • acrylic polymer refers to a polymer having the highest content of (meth)acrylic acid ester units among all repeating units constituting the polymer.
  • die polymer refers to a polymer having the highest content of structural units derived from aliphatic conjugated dienes among all repeating units constituting the polymer.
  • cyclic olefin polymer refers to a polymer having the highest content of structural units derived from cyclic olefins among all repeating units constituting the polymer.
  • (meth)acrylic acid ester refers to an acrylic acid ester and/or a methacrylic acid ester.
  • structural units derived from” a certain monomer include not only monomer units formed upon polymerization of the monomer, but also structural units formed by hydrogenating or crosslinking the formed monomer units.
  • polymers that can be used as positive resists are preferred, and polymers that can be used as main chain scission type positive resists, in which the main chain is scissed when irradiated with ionizing radiation such as electron beams or short wavelength light such as ultraviolet light (including extreme ultraviolet light (EUV)), thereby increasing the solubility in a developer, are even more preferred.
  • ionizing radiation such as electron beams or short wavelength light such as ultraviolet light (including extreme ultraviolet light (EUV)
  • examples of polymers that can be used as main chain scission type positive resists include those represented by the following formula (I): [In formula (I), R1 is a halogen atom or an alkyl group substituted with a halogen atom, R2 is an organic group, and R3 and R4 are each independently a hydrogen atom, a fluorine atom, an unsubstituted alkyl group, or an alkyl group substituted with a fluorine atom, and may be the same or different.]
  • [In formula (II) R 5 , R 7 , and R 8 each independently represent a hydrogen atom, a halogen atom, an unsubstituted alkyl group, or an alkyl group substituted with a halogen atom, and may be the same
  • polymers that can be used as main chain scission type positive resists include at least one monomer unit selected from the group consisting of methyl ⁇ -chloroacrylate unit, ethyl ⁇ -chloroacrylate unit, benzyl ⁇ -chloroacrylate unit, 1-adamantyl ⁇ -chloroacrylate unit, 2,2,3,3,3-pentafluoropropyl ⁇ -chloroacrylate unit, 2,2,3,3,4,4,4-heptafluorobutyl ⁇ -chloroacrylate-1-phenyl-1-trifluoromethyl-2,2,2-trifluoroethyl ⁇ -chloroacrylate unit, 2,2,3,3,3-pentafluoropropyl ⁇ -chloroacrylate unit, and 2,2,3,3,4,4,5,5,5-nonafluoropentyl ⁇ -chloroacrylate unit, in which R 1 is a chlorine atom and R 3 and R Preferred is a polymer containing
  • the SP value of the polymer is preferably 15.0 MPa 1/2 or more and 25.0 MPa 1/2 or less, and more preferably 15.0 MPa 1/2 or more and 20.0 MPa 1/2 or less.
  • the weight average molecular weight of the polymer may be 50,000 or more, 80,000 or more, 150,000 or more, 250,000 or less, 220,000 or less, or 200,000 or less.
  • the molecular weight distribution (dispersity) of the polymer may be 1.8 or more, 2.2 or more, 2.3 or more, 2.5 or less, or 2.4 or less.
  • the "molecular weight distribution" can be calculated from the weight average molecular weight and number average molecular weight measured using gel permeation chromatography.
  • the proportion of components in the polymer with a molecular weight of 24,000 or less can be 2.00% or more and 10.0% or less in terms of area ratio in gel permeation chromatography measurement.
  • the above-mentioned polymers are not particularly limited and can be prepared by known methods such as emulsion polymerization, suspension polymerization, and solution polymerization.
  • the polymer solution may be prepared by using the reaction liquid obtained by the polymerization reaction as is, or by recovering the polymer from the reaction liquid and dissolving the polymer again in a solvent.
  • the poor solvent is not particularly limited as long as it can precipitate a part of the polymer from the polymer solution, and any liquid can be used.
  • the poor solvent can be a liquid in which the solubility of the polymer at a temperature of 25° C. is less than 5 g/100 g.
  • the poor solvent is not particularly limited, and at least one selected from the group consisting of alcohols such as methanol, ethanol, n-propanol, isopropanol, n-butanol, isobutanol, t-butanol, pentanol, and hexanol; aliphatic hydrocarbons such as hexane, heptane, cyclopentane, and cyclohexane; and water can be used.
  • alcohols such as methanol, ethanol, n-propanol, isopropanol, n-butanol, isobutanol, t-butanol, pentanol, and hexanol
  • aliphatic hydrocarbons such as hexane, heptane, cyclopentane, and cyclohexane
  • water can be used.
  • the addition of the poor solvent to the polymer solution is not particularly limited, but can be carried out by adding the poor solvent to the polymer solution while stirring.
  • the poor solvent is preferably added over a period of time of, for example, 0.1 to 3 hours.
  • the temperature when adding the poor solvent to the polymer solution is preferably 0°C or higher, more preferably 5°C or higher, and preferably 100°C or lower, more preferably 50°C or lower.
  • the mixture After adding the poor solvent, it is preferable to further stir the mixture for, for example, 0.5 to 3 hours, and heating and/or cooling may be carried out during stirring after adding the poor solvent.
  • the amount of poor solvent added is preferably 60% by mass or more, more preferably 70% by mass or more, and preferably 90% by mass or less, and more preferably 85% by mass or less, where the total of the amount of solvent in the polymer solution and the amount of poor solvent added is 100% by mass.
  • a poor solvent is added to a polymer solution.
  • precipitation usually occurs gradually, starting with components with higher molecular weights. Therefore, the precipitate usually consists of a purified polymer with a narrow molecular weight distribution in which the content of low molecular weight components is reduced.
  • the weight-average molecular weight of the precipitate will usually be larger than the weight-average molecular weight of the polymer contained in the polymer solution, and is preferably 100,000 or more, more preferably 130,000 or more, even more preferably 180,000 or more, and preferably 300,000 or less, more preferably 250,000 or less, and even more preferably 240,000 or less. If the weight-average molecular weight of the precipitate is within the above range, the pattern formability of the resist composition prepared using the precipitate can be improved, particularly when the polymer is a polymer that can be used as a main-chain scission-type positive resist.
  • the molecular weight distribution (dispersity) of the precipitate will usually be smaller than the molecular weight distribution of the polymer contained in the polymer solution, and is preferably 1.6 or greater, more preferably 1.7 or greater, and preferably 2.1 or less, and more preferably 2.0 or less. If the molecular weight distribution of the precipitate is within the above range, the pattern formability of the resist composition prepared using the precipitate can be improved, particularly when the polymer is a polymer that can be used as a main chain scission type positive resist.
  • the proportion of components having a molecular weight of 24,000 or less contained in the precipitate is usually lower than the proportion of components having a molecular weight of 24,000 or less in the polymer contained in the polymer solution, and is preferably 1.34% or less, and more preferably 1.30% or less, in terms of area ratio measured by gel permeation chromatography.
  • the proportion of components having a molecular weight of 24,000 or less is equal to or less than the above upper limit, the pattern formability of a resist composition prepared using the precipitate can be improved, particularly when the polymer is a polymer that can be used as a main chain scission type positive resist.
  • the lower limit of the proportion of components having a molecular weight of 24,000 or less contained in the precipitate is not particularly limited.
  • the mixed solvent contains the solvent contained in the polymer solution and a poor solvent.
  • the absolute value of the difference between the SP value of the polymer and the SP value of the mixed solvent must be 10.0 MPa or less.
  • the absolute value of the difference between the SP value of the polymer and the SP value of the mixed solvent is 10.0 MPa or less, the content of low molecular weight components in the precipitate can be sufficiently reduced, and a precipitate consisting of a purified polymer with a narrow molecular weight distribution can be obtained.
  • the absolute value of the difference between the SP value of the polymer and the SP value of the mixed solvent is preferably 9.0 MPa or less. There is no particular limitation on the lower limit of the absolute value of the difference between the SP value of the polymer and the SP value of the mixed solvent.
  • the mixed solvent preferably has an SP value of 15.0 MPa 0.5 or more and 27.0 MPa 0.5 or less. If the SP value of the mixed solvent is within the above range, the precipitate can be favorably precipitated.
  • the proportion of the solvent contained in the polymer solution in the mixed solvent is preferably 10% by mass or more, more preferably 15% by mass or more, and preferably 40% by mass or less, and more preferably 30% by mass or less. If the solvent proportion is above the above lower limit, the content of low molecular weight components can be further reduced, and a purified polymer with a narrower molecular weight distribution can be obtained. Furthermore, if the solvent proportion is below the above upper limit, the yield of the purified polymer obtained can be further increased.
  • step (B) a precipitate is recovered from the mixture obtained in step (A).
  • the method for recovering the precipitate is not particularly limited, and can be performed using a known solid-liquid separation method such as centrifugation or filtration. Among these, from the viewpoint of efficiently recovering the precipitate, it is preferable to recover the precipitate by filtering the mixture.
  • the recovered precipitate can optionally be subjected to post-treatment such as drying.
  • the method for producing a resist composition of the present invention includes the steps of purifying a polymer using the above-mentioned method for purifying a polymer of the present invention, and preparing a resist composition using the purified polymer. In this way, by using the purified polymer obtained using the method for purifying a polymer of the present invention, it is possible to obtain a resist composition that has excellent pattern formability and is capable of forming a resist film that has excellent local dimensional uniformity and few defects.
  • the resist composition is not particularly limited and can be prepared by mixing the purified polymer precipitate with a solvent and any other components that may be used. There are no particular limitations on the mixing method, and mixing can be done using a known method. Alternatively, the resist composition can be prepared by mixing the components and then filtering the mixture.
  • the solvent is not particularly limited, and known solvents such as isoamyl acetate can be used.
  • ⁇ Number average molecular weight, weight average molecular weight and molecular weight distribution The number average molecular weight (Mn) and weight average molecular weight (Mw) were measured by gel permeation chromatography, and the molecular weight distribution (Mw/Mn) was calculated. Specifically, a gel permeation chromatograph (HLC-8420, manufactured by Tosoh Corporation) was used with tetrahydrofuran as a developing solvent to determine the number average molecular weight (Mn) and weight average molecular weight (Mw) of the polymer in terms of standard polystyrene, and the molecular weight distribution (Mw/Mn) was then calculated.
  • HSC-8420 gel permeation chromatograph
  • a chromatogram of the polymer was obtained using a gel permeation chromatograph (HLC-8420, manufactured by Tosoh Corporation) and tetrahydrofuran as a developing solvent. From the obtained chromatogram, the total area of the peaks (A) and the sum of the areas of the peaks of components having a molecular weight of 24,000 or less (B) were calculated. The proportion of each molecular weight component was calculated using the following formula.
  • Proportion (%) of components with molecular weight of 24,000 or less (B/A) x 100 ⁇ Pattern Formability> E2Stack (registered trademark) AL412 (manufactured by Brewer Science, Inc.) was applied onto a silicon substrate using a coater developer (DT-3000 manufactured by SCREEN), and dried at 220°C for 60 seconds to form an EUV assist layer with a thickness of 5 nm. Thereafter, the prepared positive resist composition was applied onto the EUV assist layer using the coater developer, and dried at 170°C for 60 seconds to form a resist film with a thickness of 40 nm.
  • E2Stack registered trademark
  • AL412 manufactured by Brewer Science, Inc.
  • the resulting resist film was exposed to EUV light using an EUV exposure system (NXE3400B, manufactured by ASML) through a mask with a pitch of 40 nm and a hole diameter of 25 nm, and then developed with isopropyl alcohol at 23° C. for 30 seconds and dried to obtain a resist film having a contact hole pattern formed therein. Then, 40,000 contact holes in the resist film with the contact hole pattern formed were evaluated for LCDU (Local Critical Dimension Uniformity) and defects using a CD-SEM (Hitachi CG6300). Specifically, LCDU was calculated as three times the standard deviation of the observed hole diameters, and evaluated as LCDU. A smaller value indicates better performance. Furthermore, for defects, built-in software was used to identify patterns, and those that could not be measured as holes were determined to be defects and counted.
  • NXE3400B manufactured by ASML
  • Example 1 [Preparation of Polymer] 10.00 g of ⁇ -chloroacrylate-1-phenyl-1-trifluoromethyl-2,2,2-trifluoroethyl ester and 3.55 g of ⁇ -methylstyrene as monomers, 22.09 g of ultrapure water as a reaction solvent, 3.39 g of sodium laurate as soap (emulsifier), and 0.0987 g of azobisisobutyronitrile as a polymerization initiator were placed in a glass container. The glass container was sealed and purged with nitrogen, and the mixture was stirred in a nitrogen atmosphere in a 75°C thermostatic chamber for 3 hours. The temperature was then returned to room temperature, and the glass container was opened to the atmosphere.
  • the obtained polymer A had a number average molecular weight (Mn) of 72,000, a weight average molecular weight (Mw) of 172,000, a molecular weight distribution (Mw/Mn) of 2.40, and a proportion of components having a molecular weight of 24,000 or less of 5.96%.
  • Example 7 During the preparation of the polymer, the amount of azobisisobutyronitrile added as a polymerization initiator was changed to 0.3388 g, and Polymer A' was prepared. The number average molecular weight (Mn) was 44,000, the weight average molecular weight (Mw) was 98,000, the molecular weight distribution (Mw/Mn) was 2.25, and the proportion of components having a molecular weight of 24,000 or less was 9.53%. A precipitate (purified polymer) consisting of a white coagulated substance was obtained in the same manner as in Example 1, except that Polymer A' was used instead of Polymer A (8.0 g, yield: 80%). A resist composition was also prepared in the same manner as in Example 1. Measurements and evaluations were then performed in the same manner as in Example 1. The results are shown in Table 1.
  • Example 8 During the preparation of the polymer, the amount of azobisisobutyronitrile added as a polymerization initiator was changed to 0.0148 g, and a polymer A" was prepared having a number average molecular weight (Mn) of 121,000, a weight average molecular weight (Mw) of 220,000, a molecular weight distribution (Mw/Mn) of 1.82, and a proportion of components having a molecular weight of 24,000 or less of 2.20%.
  • a precipitate (purified polymer) consisting of a white coagulate was obtained in the same manner as in Example 1, except that polymer A" was used instead of polymer A (8.8 g, yield: 88%).
  • a resist composition was also prepared in the same manner as in Example 1. Measurements and evaluations were then carried out in the same manner as in Example 1. The results are shown in Table 1.
  • Example 9 [Preparation of Polymer] 10.00 g of 2,2,3,3,3-pentafluoropropyl ⁇ -chloroacrylate and 5.63 g of 4-hydroxy- ⁇ -methylstyrene as monomers, 62.52 g of cyclopentanone as a reaction solvent, and 0.0026 g of 2,2'-azobis(4-methoxy-2,4-dimethylvaleronitrile) as a polymerization initiator were placed in a glass container, and the glass container was sealed and purged with nitrogen. The mixture was stirred in a nitrogen atmosphere in a thermostatic bath at 23°C for 72 hours.
  • the glass container was opened to the atmosphere, and the resulting polymerization solution was added dropwise to 782 g of heptane to precipitate a polymer. Thereafter, the solution containing the precipitated polymer was filtered using a Kiriyama funnel to obtain a white coagulum (Polymer B).
  • the number average molecular weight (Mn) of the obtained polymer B was 79,000, the weight average molecular weight (Mw) was 182,000, the molecular weight distribution (Mw/Mn) was 2.30, and the proportion of components having a molecular weight of 24,000 or less was 5.31%.

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Abstract

La présente invention concerne un procédé de purification d'un polymère qui permet d'obtenir un polymère présentant une distribution de poids moléculaire étroite avec un rendement élevé. Ce procédé de purification d'un polymère comprend : une étape (A) dans laquelle, dans une solution de polymère contenant un solvant et un polymère dissous dans le solvant, un mauvais solvant pour le polymère est ajouté pour précipiter une partie du polymère, puis un mélange contenant le précipité et un solvant mixte contenant le solvant ainsi que le mauvais solvant est obtenu ; et une étape (B) dans laquelle le précipité est récupéré à partir du mélange. La valeur absolue de la différence entre la valeur SP du polymère et la valeur SP du solvant mixte est de 10,0 MPa0,5 ou moins.
PCT/JP2025/009166 2024-03-27 2025-03-11 Procédé de purification de polymère et procédé de production d'une composition de photorésine Pending WO2025204874A1 (fr)

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