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WO2025204743A1 - Substrate holding device - Google Patents

Substrate holding device

Info

Publication number
WO2025204743A1
WO2025204743A1 PCT/JP2025/008419 JP2025008419W WO2025204743A1 WO 2025204743 A1 WO2025204743 A1 WO 2025204743A1 JP 2025008419 W JP2025008419 W JP 2025008419W WO 2025204743 A1 WO2025204743 A1 WO 2025204743A1
Authority
WO
WIPO (PCT)
Prior art keywords
substrate
flat surface
pressing member
stage
holding device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
PCT/JP2025/008419
Other languages
French (fr)
Japanese (ja)
Inventor
暁雄 鈴木
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toray Engineering Co Ltd
Original Assignee
Toray Engineering Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toray Engineering Co Ltd filed Critical Toray Engineering Co Ltd
Publication of WO2025204743A1 publication Critical patent/WO2025204743A1/en
Pending legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping

Definitions

  • the device for holding the substrate has a stage on which the substrate is placed.
  • the stage can hold the substrate along the flat surface (top surface) of the stage by adsorbing the substrate. Then, for example, a liquid ejected from a coating head of the coating device is applied to the top surface of the substrate.
  • a liquid ejected from a coating head of the coating device is applied to the top surface of the substrate.
  • the present invention therefore aims to provide a substrate holding device that can reliably hold a substrate on a stage by suction.
  • the substrate holding device of the present invention comprises a stage having a flat surface on which a substrate is placed and capable of adsorbing the substrate; a plurality of support pins arranged on the portion of the stage having the flat surface and having tips on which the substrate rests; a plurality of outer guide pins arranged on the portion of the stage surrounding the flat surface; and a presser member that can be lowered from a retracted position above the flat surface, wherein the support pins are movable between an upper position where their tips protrude above the flat surface and a lower position where their tips are below the flat surface, and the plurality of outer guide pins are positioned so that they can contact the outer edge of the substrate, which rests on the support pins that are displaced to the lower position, from multiple directions; and the presser member descends from the retracted position and presses the substrate against the flat surface with the support pins in the lower position.
  • FIG. 10 is an explanatory diagram showing a state in which the second substrate is pressed against the mounting surface by the second pressing member.
  • FIG. 11A is an explanatory diagram of a convex portion of the first pressing member shown in FIGS. 2 and 3.
  • FIG. 11B is an explanatory diagram showing a first modified example of the protrusion.
  • FIG. 11C is an explanatory diagram showing a second modified example of the protrusion.
  • FIG. 11D is an explanatory diagram showing a third modified example of the protrusion.
  • FIG. 12A is an explanatory diagram of a pressing member that can press along the edge of a substrate over a wide range.
  • FIG. 12B is an explanatory diagram showing a first modified example of the pressing member.
  • the pressing member has a protrusion for partially contacting the substrate.
  • the portion of the pressing member that comes into contact with the substrate is a convex portion, which makes it possible to reduce the contact area of the pressing member with the substrate.
  • the convex portion has a cross-sectional contour shape that becomes smaller toward the substrate.
  • the portion where the pressing member comes into contact with the substrate is the tip (lower end) of the convex portion, which makes it possible to further reduce the contact area of the pressing member with the substrate. This is preferred when it is desirable to avoid the substrate coming into contact with other items as much as possible.
  • FIG. 1 is an explanatory diagram of a coating apparatus having a substrate holding device of the present invention.
  • the coating apparatus 5 shown in Fig. 1 has a substrate holding device 10, a coating head 7 that ejects a liquid, and a drive device 8 that moves a stage 11 of the substrate holding device 10 relative to the coating head 7.
  • the substrate holding device 10 suction-holds a substrate W1 (W2).
  • the substrate holding device 10 of this embodiment can hold either a first substrate W1 or a second substrate W2, which have different sizes.
  • Each of the multiple support pins 15 can be raised and lowered in the hole 131.
  • the substrate holding device 10 has an actuator (not shown) that raises and lowers the multiple support pins 15.
  • the actuator is located below the stage 11.
  • the multiple support pins 15 rise and lower in synchronization.
  • the actuator is configured, for example, with a lifting member and a motor that moves the lifting member up and down.
  • Each of the multiple support pins 15 has a tip 16 on which the substrate W1 rests.
  • the tip 16 of the support pin 15 may be referred to as the "support pin tip 16."
  • the support pin tip 16 has a tapered shape that narrows toward the top.
  • the second substrate W2 can also be placed on the tips 16 of multiple support pins 15.
  • the multiple support pins 15 are arranged in a portion 13 having a flat surface 12 so as to be able to support the second substrate W2 (see Figure 8).
  • the multiple support pins 15 are arranged within the range in which the second substrate W2 will be placed.
  • five support pins 15 are arranged on the stage 11, but this number can be changed and may be four.
  • the square sides of the rectangular substrate W1 (W2) are supported from below by four support pins 15.
  • the center of the substrate W1 (W2) is supported by one support pin 15. Note that the number of support pins 15 is not limited to four or five.
  • the first substrate W1 when the first substrate W1 is placed on the tip 16 of the support pin and the support pin 15 is displaced from the upper position Pu to the lower position Pd, the first substrate W1 is placed on the flat surface 12 of the stage 11.
  • the first substrate W1 is warped (warpage deformation), and is placed on a plurality of support pins 15 (FIG. 3), and the warped first substrate W1 is placed on the flat surface 12 (FIG. 4).
  • the operation of placing the second substrate W2 on the flat surface 12 is the same as that for the first substrate W1.
  • FIG. 9 is an explanatory diagram showing how the second substrate W2 placed on the support pin tips 16 is placed on the stage 11 (flat surface 12) by the lowering of the support pins 15.
  • Each of the multiple inner guide pins 22 can be raised and lowered in the hole 133.
  • the substrate holding device 10 has an actuator (not shown) that raises and lowers the multiple inner guide pins 22.
  • the actuator is located below the stage 11.
  • the multiple inner guide pins 22 rise and lower in synchronization.
  • the actuator is configured, for example, with a lifting member and a motor that moves the lifting member up and down.
  • Each of the multiple inner guide pins 22 has a tapered tip 23.
  • the tip 23 of the inner guide pin 22 may be referred to as the “inner pin tip 23.”
  • the inner pin tip 23 has a tapered shape that narrows toward the top.
  • the inner guide pin 22 is displaceable between an upper position Ru (see FIG. 9) and a lower position Rd (see FIGS. 3, 4, 5, and 6).
  • the upper position Ru is a position where the inner pin tip 23 protrudes above the flat surface 12.
  • the lower position Rd is a position where the inner pin tip 23 is below the flat surface 12. This displacement is performed by the actuator (not shown) for the inner guide pin 22.
  • the inner guide pin 22 has a columnar shape with a circular cross section. Therefore, the inner guide pin 22 can come into point contact with a part of the outer circumferential edge W2e of the second substrate W2. In other words, the inner guide pin 22 has a contact point 221 on its side surface that can come into contact with a part of the outer circumferential edge W2e of the second substrate W2. In a plan view, the range of a rectangle connecting the contact points 221 of the eight inner guide pins 22 is slightly larger than the outline shape of the second substrate W2.
  • the inner guide pins 22 are arranged so as to be able to come into contact with the outer periphery W2e of the second substrate W2 from four directions, i.e., front, rear, left and right.
  • the range of the rectangle connecting the contact points 221 of the eight inner guide pins 22 is slightly larger than the outline shape of the second substrate W2, and therefore, the descending second substrate W2 does not come into contact with all eight inner guide pins 22, but rather with some of the eight inner guide pins 22.
  • the inner guide pins 22 may come into contact with the outer peripheral edge W2e of the second substrate W2 from two of the four directions, front, back, left, and right (for example, from the front and right).
  • the outer peripheral edge W2e of the second substrate W2 placed on the support pins 15 can come into contact with the eight inner guide pins 22 from multiple directions (for example, from the front and right), and the second substrate W2 descends while being positioned by these inner guide pins 22.
  • the second substrate W2 is positioned so that it fits within the area inside the eight inner guide pins 22.
  • the inner guide pin 22 has a tapered inner pin tip 23. Therefore, even if the second substrate W2 placed on the support pin 15 displaced to the lower position Pd comes into contact with the inner pin tip 23, the second substrate W2 will slide along the tapered inner pin tip 23 and move along the inner guide pin 22 toward the stage 11, where it will be positioned.
  • the first pressing member 25 descends from the retracted position S1 and presses the first substrate W1 on the stage 11 onto the flat surface 12.
  • the support pins 15 and inner guide pins 22 are in their lower positions.
  • the warped first substrate W1 ( Figure 4) is corrected to a flat shape that conforms to the flat surface 12 ( Figure 5).
  • the stage 11 adsorbs the first substrate W1.
  • the second pressing member 27 is movable between a retracted position S2 (see Figure 9) above the flat surface 12 and a pressing position D2 (see Figure 10).
  • the retracted position S2 is a position where the second pressing member 27 is away from the stage 11 (flat surface 12).
  • the pressing position D2 is a position where the second pressing member 27 is close to the stage 11 (flat surface 12).
  • the pressing position D2 is a position where the second substrate W2 is pressed against the stage 11 (flat surface 12) from above.
  • the second pressing member 27 is capable of descending from the retracted position S2 above the flat surface 12 to the pressing position D2.
  • the second pressing member 25 descends from the retracted position S2 and presses the second substrate W2 on the stage 11 onto the flat surface 12.
  • the support pins 15 are in the lower position Pd.
  • the warped second substrate W2 ( Figure 9) is corrected to a flat shape that conforms to the flat surface 12 ( Figure 10).
  • the stage 11 adsorbs the second substrate W2.
  • the portion where the first pressing member 25 comes into contact with the first substrate W1 will be the convex portion 29. This reduces the contact area of the first pressing member 25 with the first substrate W1.
  • the second pressing member 27 (see Figure 2) has a second frame 52 that has a shape that is roughly the same as the outer contour shape of the second substrate W2.
  • the second frame 52 is made up of four straight beam members 521, forming a rectangle overall. The area surrounded by the four beam members 521 is open.
  • the lifting rod 62 is attached to the second frame 52.
  • the portion where the second pressing member 27 comes into contact with the second substrate W2 will be the convex portion 39. This reduces the contact area of the second pressing member 27 with the second substrate W2.
  • the convex portion 29 of the first pressing member 25 and the convex portion 39 of the second pressing member 27 may have the same shape. Below, the specific configuration will be explained using the convex portion 29 of the first pressing member 25 as an example.
  • FIG. 11C is an explanatory diagram showing a second modified example of the protrusion 29.
  • the bottom view of FIG. 11C is a side view of the protrusion 29, and the top view of FIG. 11C is a cross-sectional view taken along arrow C in the bottom view of FIG. 11C.
  • the protrusion 29 has a truncated cone shape.
  • the first pressing member 25 may be preferable for the first pressing member 25 to press the first substrate W1 over a wide range along the edge of the first substrate W1.
  • the second pressing member 27 may be preferable for the second pressing member 27 to press over a wide area along the edge of the second substrate W2.
  • 12A has a frame structure having substantially the same shape as the outer peripheral contour of the first substrate W1.
  • the first pressing member 25 is formed by combining four linear portions 30 to form a rectangle as a whole. The area surrounded by the four linear portions 30 is open.
  • 12A, the first pressing member 25 shown in Fig. 12B has four linear portions 30. However, these linear portions 30 are discontinuous.
  • the lifting rod 61 (see Fig. 13) is attached to each of the linear portions 30. In the case of the first pressing member 25 shown in FIGS. 12A and 12B, it is possible to press the substrate W1 along the entire periphery.
  • the outer peripheral edge W1e of the first substrate W1 can come into contact with the multiple outer guide pins 18 from multiple directions, and the first substrate W1 descends while being positioned by the multiple outer guide pins 18.
  • the support pins 15 reach the lower position Pd (see Figure 4)
  • the first substrate W1 rests on the flat surface 12 of the stage 11. In this state, the warping of the first substrate W1 has not been eliminated.
  • the first pressing member 25 descends from the retracted position S1
  • the first pressing member 25 presses the first substrate W1 onto the flat surface 12.
  • the support pins 15 and inner guide pins 22 are in the lower position. Any warping that has occurred in the first substrate W1 is corrected by the first pressing member 25.
  • the stage 11 suction-holds the first substrate W1. As a result, the first substrate W1 is securely suction-held on the stage 11.
  • first substrate W1 Various processes are performed on the first substrate W1 while the substrate holding device 10 holds the first substrate W1.
  • the first substrate W1 (stage 11) and the coating head 7 move relative to each other, and liquid is ejected from the coating head 7 to coat the first substrate W1 with the liquid.
  • suction of the first substrate W1 on the stage 11 is stopped.
  • the support pins 15 move from the lower position Pd to the upper position Pu.
  • the coated (processed) first substrate W1 placed on the support pins 15 is carried out of the substrate holding device 10 by a transport robot (not shown).
  • the substrate holding device 10 holds a second substrate W2, which is warped.
  • a transport robot (not shown) loads the second substrate W2 onto the stage 11 and places it on the support pins 15.
  • the second substrate W2 is placed on the tips 16 of the support pins.
  • the inner guide pin 22 is in the upper position Ru, and the outer guide pin 18 is in the lower position Qd.
  • the support pins 15 are displaced to the lower position Pd, the outer circumferential edge W2e of the second substrate W2 can come into contact with the inner guide pins 22 from multiple directions, and the second substrate W2 descends while being positioned by the inner guide pins 22.
  • the support pins 15 reach the lower position Pd (see FIG. 9), the second substrate W2 rests on the flat surface 12 of the stage 11. In this state, the warpage of the second substrate W2 has not been eliminated.
  • the second substrate W2 (stage 11) and the coating head 7 move relative to each other, and liquid is ejected from the coating head 7 to coat the second substrate W2 with the liquid.
  • suction of the second substrate W2 on the stage 11 is stopped.
  • the support pins 15 move from the lower position Pd to the upper position Pu.
  • the coated (processed) second substrate W2 placed on the support pins 15 is carried out of the substrate holding device 10 by a transport robot (not shown).
  • the substrate holding device 10 of this embodiment is capable of holding, on the stage 11, not only the first substrate W1 but also a second substrate W2 that is smaller than the first substrate W1.
  • the second substrate W2 is supported by the support pins 15 and lowered, and is then positioned by the inner guide pins 22 (see FIG. 9). Even if the second substrate W2 is warped, it is corrected by the second pressing member 27 (see FIG. 10), and the stage 11 suction-holds the second substrate W2.
  • the substrate holding device 10 can be used for two types of substrates with different contour sizes.
  • the substrate holding device 10 of this embodiment is used for two types of substrates (W1, W2) having different contour sizes as described above, but may be configured to hold only one type of substrate.
  • the substrate holding device of the present invention is not limited to being provided in the coating device 5, but can also be applied to other devices.
  • Substrate holding device 11 Stage 12 Flat surface 13 Portion having flat surface 14 Portion surrounding flat surface 15 Support pin 16 Tip (support pin tip) 18 outer guide pin 19 tip (outer pin tip) 22 Inner guide pin 23 Tip (inner pin tip) 25 First pressing member 27 Second pressing member 29 Convex portion 30 Linear portion 39 Convex portion W1 First substrate W1e Outer periphery W2 Second substrate W2e Outer periphery S1 Retracted position D1 Pressing position S2 Retracted position D2 Pressing position Pu Upper position of support pin Pd Lower position of support pin Qu Upper position of outer guide pin Qd Lower position of outer guide pin Ru Upper position of inner guide pin Rd Lower position of inner guide pin

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

Provided is a substrate holding device which enables a substrate to be securely suction-attached to a stage. Specifically, the substrate holding device 10 comprises: a stage 11 which has a flat surface 12 on which a substrate W1 is mounted and to which the substrate W1 can be suction-attached; a plurality of support pins 15 which are disposed in a portion 13 of the stage 11 having the flat surface 12 and which have a tip end on which the substrate W1 is mounted; a plurality of outer guide pins 18 which are disposed in a portion of the stage 11 around the flat surface 12; and a pressing member 25 which is capable of descending from a retracted position above the flat surface 12. The support pins 15 can be displaced between an upper position in which the tip end projects upward from the flat surface 12 and a lower position where the tip end is lower than the flat surface 12. The outer guide pins 18 are disposed so as to be capable of contacting the outer peripheral edge of the substrate W1, which is mounted on the support pins 15 displaced to the lower position, from a plurality of directions. The pressing member 25 descends from the retracted position and pushes the substrate W1 onto the flat surface 12.

Description

基板保持装置Substrate holding device

 本発明は、基板保持装置に関する。 The present invention relates to a substrate holding device.

 半導体ウエハ用の基板、ディスプレイ用の基板、又はカラーフィルタ用の基板等の各種基板の製造工程において、その基板に対して、例えば液を塗布する塗布処理等の様々な処理が行われる。その際、処理は、基板がステージに保持された状態で行われる場合がある。例えば、特許文献1に、基板に液を塗布する塗布装置が開示されている。その塗布装置は、塗布処理のために基板を保持する装置を有する。 In the manufacturing process of various substrates, such as substrates for semiconductor wafers, display substrates, or color filters, the substrates are subjected to various processes, such as a coating process in which a liquid is applied to the substrate. In these processes, the substrate may be held on a stage. For example, Patent Document 1 discloses a coating device that applies a liquid to a substrate. This coating device has a device that holds the substrate for the coating process.

特開2012-69833号公報JP 2012-69833 A

 基板を保持する装置は、基板を載せるステージを有する。ステージは、基板を吸着することで、その基板をステージの平坦面(上面)に沿って保持することが可能である。そして、例えば、塗布装置が有する塗布ヘッドから吐出された液が、その基板の上面に塗布される。
 ここで、基板に反り(反り変形)が生じている場合、その基板は、ステージの平坦面に載せられても、その平坦面に沿わず、基板の保持が確実に行われない可能性がある。
The device for holding the substrate has a stage on which the substrate is placed. The stage can hold the substrate along the flat surface (top surface) of the stage by adsorbing the substrate. Then, for example, a liquid ejected from a coating head of the coating device is applied to the top surface of the substrate.
Here, if the substrate is warped (warping deformation), even if the substrate is placed on the flat surface of the stage, it may not conform to the flat surface and the substrate may not be held securely.

 そこで、本発明は、基板をステージに確実に吸着保持することが可能となる基板保持装置を提供することを目的とする。 The present invention therefore aims to provide a substrate holding device that can reliably hold a substrate on a stage by suction.

 本発明の基板保持装置は、基板が載る平坦面を有し前記基板を吸着可能であるステージと、前記ステージのうちの前記平坦面を有する部分に配置され前記基板が載る先端を有する複数本の支持ピンと、前記ステージのうちの前記平坦面の周囲の部分に配置されている複数本の外ガイドピンと、前記平坦面の上方の退避位置から降下可能である押さえ部材と、を有し、前記支持ピンは、前記先端が前記平坦面から上に突出する上位置と、前記先端が前記平坦面よりも下となる下位置と、の間を変位可能であり、前記複数本の外ガイドピンは、前記下位置へ変位する前記支持ピンに載る前記基板の外周縁に、複数方向から接触可能となるように配置され、前記押さえ部材は、前記退避位置から降下して、前記支持ピンが前記下位置にある状態で前記基板を前記平坦面に押す。 The substrate holding device of the present invention comprises a stage having a flat surface on which a substrate is placed and capable of adsorbing the substrate; a plurality of support pins arranged on the portion of the stage having the flat surface and having tips on which the substrate rests; a plurality of outer guide pins arranged on the portion of the stage surrounding the flat surface; and a presser member that can be lowered from a retracted position above the flat surface, wherein the support pins are movable between an upper position where their tips protrude above the flat surface and a lower position where their tips are below the flat surface, and the plurality of outer guide pins are positioned so that they can contact the outer edge of the substrate, which rests on the support pins that are displaced to the lower position, from multiple directions; and the presser member descends from the retracted position and presses the substrate against the flat surface with the support pins in the lower position.

 本発明の基板保持装置によれば、基板に反りが生じていても、その反りは押さえ部材によって矯正され、ステージはその基板を吸着し保持する。基板は、ステージに確実に吸着保持される。 With the substrate holding device of the present invention, even if the substrate is warped, the warp is corrected by the pressing member, and the stage sucks and holds the substrate. The substrate is securely sucked and held on the stage.

図1は、本発明の基板保持装置を有する塗布装置の説明図である。FIG. 1 is an explanatory diagram of a coating apparatus having a substrate holding device of the present invention. 図2は、基板保持装置の一例を示す平面図である。FIG. 2 is a plan view showing an example of a substrate holding device. 図3は、図1に示す基板保持装置を側方から見た場合の断面図である。FIG. 3 is a cross-sectional view of the substrate holding device shown in FIG. 1 as seen from the side. 図4は、基板保持装置の動作の説明図である。FIG. 4 is an explanatory diagram of the operation of the substrate holding device. 図5は、基板保持装置の動作の説明図である。FIG. 5 is an explanatory diagram of the operation of the substrate holding device. 図6は、基板保持装置の動作の説明図である。FIG. 6 is an explanatory diagram of the operation of the substrate holding device. 図7は、基板保持装置が第一の基板を保持する状態を示す平面図である。FIG. 7 is a plan view showing a state in which the substrate holding device holds the first substrate. 図8は、基板保持装置が第二の基板を保持する状態を示す平面図である。FIG. 8 is a plan view showing a state in which the substrate holding device holds the second substrate. 図9は、第二の基板がステージに載せられる様子を示す説明図である。FIG. 9 is an explanatory diagram showing how the second substrate is placed on the stage. 図10は、第二の基板が、第二の押さえ部材によって載置面に押さえられた状態を示す説明図である。FIG. 10 is an explanatory diagram showing a state in which the second substrate is pressed against the mounting surface by the second pressing member. 図11Aは、図2及び図3に示す第一の押さえ部材が有する凸部の説明図である。FIG. 11A is an explanatory diagram of a convex portion of the first pressing member shown in FIGS. 2 and 3. FIG. 図11Bは、凸部の第一の変形例を示す説明図である。FIG. 11B is an explanatory diagram showing a first modified example of the protrusion. 図11Cは、凸部の第二の変形例を示す説明図である。FIG. 11C is an explanatory diagram showing a second modified example of the protrusion. 図11Dは、凸部の第三の変形例を示す説明図である。FIG. 11D is an explanatory diagram showing a third modified example of the protrusion. 図12Aは、基板の縁部に沿って広い範囲で押すことのできる押さえ部材の説明図である。FIG. 12A is an explanatory diagram of a pressing member that can press along the edge of a substrate over a wide range. 図12Bは、押さえ部材の第一の変形例を示す説明図である。FIG. 12B is an explanatory diagram showing a first modified example of the pressing member. 図12Cは、押さえ部材の第二の変形例を示す説明図である。FIG. 12C is an explanatory diagram showing a second modified example of the pressing member. 図12Dは、押さえ部材の第三の変形例を示す説明図である。FIG. 12D is an explanatory diagram showing a third modified example of the pressing member. 図13は、押さえ部材が、基板をステージに押し付けた状態を示す説明図である。FIG. 13 is an explanatory diagram showing a state in which the pressing member presses the substrate against the stage.

<本発明の実施形態の概要>
 以下、本発明の実施形態の概要を列記して説明する。
(1)本発明の基板保持装置は、基板が載る平坦面を有し前記基板を吸着可能であるステージと、前記ステージのうちの前記平坦面を有する部分に配置され前記基板が載る先端を有する複数本の支持ピンと、前記ステージのうちの前記平坦面の周囲の部分に配置されている複数本の外ガイドピンと、前記平坦面の上方の退避位置から降下可能である押さえ部材と、を有し、前記支持ピンは、前記先端が前記平坦面から上に突出する上位置と、前記先端が前記平坦面よりも下となる下位置と、の間を変位可能であり、前記複数本の外ガイドピンは、前記下位置へ変位する前記支持ピンに載る前記基板の外周縁に、複数方向から接触可能となるように配置され、前記押さえ部材は、前記退避位置から降下して、前記支持ピンが前記下位置にある状態で前記基板を前記平坦面に押す。
<Outline of the embodiment of the present invention>
Hereinafter, an outline of an embodiment of the present invention will be listed and described.
(1) A substrate holding device of the present invention comprises a stage having a flat surface on which a substrate is placed and capable of adsorbing the substrate; a plurality of support pins arranged on the portion of the stage having the flat surface and having tips on which the substrate is placed; a plurality of outer guide pins arranged on the portion of the stage surrounding the flat surface; and a pressing member that can be lowered from a retracted position above the flat surface, wherein the support pins are displaceable between an upper position in which the tips protrude above the flat surface and a lower position in which the tips are below the flat surface, and the plurality of outer guide pins are arranged so as to be able to contact, from multiple directions, the outer edge of the substrate placed on the support pins that are displaced to the lower position, and the pressing member descends from the retracted position to press the substrate against the flat surface while the support pins are in the lower position.

 前記基板保持装置によれば、基板は支持ピンの先端に載せられる。支持ピンが下位置へ変位すると、基板の外周縁は、複数本の外ガイドピンに複数方向から接触可能であり、基板は、複数本の外ガイドピンにより位置決めされながら降下する。
 支持ピンが下位置に到達すると、その基板はステージの平坦面に載る。押さえ部材が降下すると、その押さえ部材が基板を平坦面に押す。この際、支持ピンは下位置にある。基板に反りが生じていても、その反りは押さえ部材によって矯正され、ステージはその基板を吸着し保持する。以上より、基板は、ステージに確実に吸着保持される。
In the substrate holding device, the substrate is placed on the tips of the support pins. When the support pins are displaced to the lower position, the outer periphery of the substrate can contact the outer guide pins from multiple directions, and the substrate is lowered while being positioned by the outer guide pins.
When the support pins reach their lower positions, the substrate rests on the flat surface of the stage. When the pressing members descend, they press the substrate onto the flat surface. At this time, the support pins are in their lower positions. Even if the substrate is warped, the warping is corrected by the pressing members, and the stage sucks and holds the substrate. As a result, the substrate is securely sucked and held on the stage.

(2)前記(1)の基板保持装置において、前記複数本の外ガイドピンよりも前記平坦面の中央側の部分に配置されている複数本の内ガイドピンと、前記平坦面の上方の退避位置から降下可能である第二の押さえ部材と、を有し、前記複数本の支持ピンは、前記基板よりも小さい第二の基板を支持可能とするように前記平坦面を有する部分に配置され、前記複数本の内ガイドピンは、その先端が前記平坦面から上に突出する上位置と、その先端が前記平坦面よりも下となる下位置と、の間を変位可能であり、前記複数本の内ガイドピンは、前記下位置へ変位する前記支持ピンに載る前記第二の基板の外周縁に、複数方向から接触可能となるように配置され、前記第二の押さえ部材は、前記退避位置から降下して、前記支持ピンが前記下位置にある状態で前記第二の基板を前記平坦面に押す。 (2) The substrate holding device of (1) further includes a plurality of inner guide pins arranged closer to the center of the flat surface than the plurality of outer guide pins, and a second pressing member that can be lowered from a retracted position above the flat surface, wherein the plurality of support pins are arranged in the portion having the flat surface so as to be able to support a second substrate that is smaller than the first substrate, the plurality of inner guide pins are displaceable between an upper position in which their tips protrude above the flat surface and a lower position in which their tips are below the flat surface, the plurality of inner guide pins are arranged so as to be able to contact, from multiple directions, the outer edge of the second substrate that rests on the support pins that are displaced to the lower position, and the second pressing member is lowered from the retracted position to press the second substrate against the flat surface with the support pins in the lower position.

 前記構成を有する基板保持装置の場合、ステージに、前記(1)の基板(第一の基板)の他に、その基板よりも小さい第二の基板を保持することが可能となる。第二の基板は、前記(1)の基板の場合と同様に支持ピンに支持され降下すると、内ガイドピンによって位置決めされる。第二の基板は、反りが生じていても、第二の押さえ部材によって矯正され、ステージは、その第二の基板を吸着し保持する。基板保持装置は、輪郭の大きさが異なる二種類の基板について、兼用される。 In the case of a substrate holding device having the above configuration, in addition to the substrate (1) (first substrate), it is possible to hold a second substrate that is smaller than the first substrate on the stage. As with the substrate (1), the second substrate is supported by the support pins and, when lowered, is positioned by the inner guide pins. Even if the second substrate is warped, it is corrected by the second pressing member, and the stage adsorbs and holds the second substrate. The substrate holding device can be used for two types of substrates with different outline sizes.

(3)前記(1)又は(2)の基板保持装置において、前記外ガイドピンは、先細りとなる先端を有する。
 下位置へ変位する支持ピンに載る基板が、外ガイドピンの先端に接触したとしても、その基板は、先細りとなる先端を滑り、外ガイドピンに沿ってステージに向かい、位置決めされる。
(3) In the substrate holding device of (1) or (2), the outer guide pin has a tapered tip.
Even if the substrate placed on the support pins displaced to the lower position comes into contact with the tip of the outer guide pin, the substrate slides along the tapered tip and moves toward the stage along the outer guide pin, where it is positioned.

(4)前記(2)の基板保持装置において、前記内ガイドピンは、先細りとなる先端を有する。
 下位置へ変位する支持ピンに載る第二の基板が、内ガイドピンの先端に接触したとしても、その第二の基板は、先細りとなる先端を滑り、内ガイドピンに沿ってステージに向かい、位置決めされる。
(4) In the substrate holding device of (2), the inner guide pin has a tapered tip.
Even if the second substrate placed on the support pin displaced to the lower position comes into contact with the tip of the inner guide pin, the second substrate slides along the tapered tip and moves toward the stage along the inner guide pin, where it is positioned.

(5)前記(1)から(4)のいずれか一つの基板保持装置において、前記押さえ部材は、前記基板に部分的に接触するための凸部を有する。
 押さえ部材が基板に接触する部分は、凸部となり、基板に対する押さえ部材の接触面積を小さくすることが可能となる。
(5) In the substrate holding device according to any one of (1) to (4), the pressing member has a protrusion for partially contacting the substrate.
The portion of the pressing member that comes into contact with the substrate is a convex portion, which makes it possible to reduce the contact area of the pressing member with the substrate.

(6)前記(5)の基板保持装置において、前記凸部は、前記基板側に向かって断面輪郭形状が小さくなる形状を有する。
 押さえ部材が基板に接触する部分は、凸部の先端(下端)となり、基板に対する押さえ部材の接触面積をより一層小さくすることができる。
 基板が、他の物品との接触を可能な限り避けることが望ましい場合に、好適である。
(6) In the substrate holding device of (5), the convex portion has a cross-sectional contour shape that becomes smaller toward the substrate.
The portion where the pressing member comes into contact with the substrate is the tip (lower end) of the convex portion, which makes it possible to further reduce the contact area of the pressing member with the substrate.
This is preferred when it is desirable to avoid the substrate coming into contact with other items as much as possible.

(7)又は、基板の反りの形態によっては、押さえ部材は、その基板の縁部に沿って広い範囲で押すのが好ましい場合がある。そこで、この場合、前記(1)から(4)のいずれか一つの基板保持装置において、前記押さえ部材は、前記基板の縁部に沿って接触する線状部を有する。 (7) Alternatively, depending on the type of warping of the substrate, it may be preferable for the pressing member to press over a wide area along the edge of the substrate. In this case, in any one of the substrate holding devices (1) to (4) above, the pressing member has a linear portion that contacts the edge of the substrate.

(8)前記(1)から(7)のいずれか一つの基板保持装置において、前記外ガイドピンは、その先端が前記平坦面から上に突出する上位置と、その先端が前記平坦面よりも下となる下位置と、の間を変位可能である。
 ステージに保持された基板に対して処理(例えば、塗布処理)を行う場合、及び、前記処理の後に基板をステージから搬出する場合に、外ガイドピンは下位置にあることで、外ガイドピンが邪魔にならない。
(8) In any one of the substrate holding devices (1) to (7), the outer guide pin is displaceable between an upper position in which its tip protrudes above the flat surface and a lower position in which its tip is below the flat surface.
When processing (e.g., coating processing) the substrate held on the stage, and when the substrate is removed from the stage after the processing, the outer guide pins are in the lower position so that they do not get in the way.

<本発明の実施形態の詳細>
 以下、本発明の実施形態の詳細を説明する。
〔基板保持装置の全体構成〕
 図1は、本発明の基板保持装置を有する塗布装置の説明図である。図1に示す塗布装置5は、基板保持装置10と、液を吐出する塗布ヘッド7と、基板保持装置10が有するステージ11と塗布ヘッド7とを相対移動させる駆動装置8とを有する。基板保持装置10は、基板W1(W2)を吸着保持する。本実施形態の基板保持装置10は、大きさの異なる第一の基板W1及び第二の基板W2のいずれか一方を保持可能である。
<Details of the embodiment of the present invention>
Hereinafter, the details of the embodiments of the present invention will be described.
[Overall configuration of the substrate holding device]
Fig. 1 is an explanatory diagram of a coating apparatus having a substrate holding device of the present invention. The coating apparatus 5 shown in Fig. 1 has a substrate holding device 10, a coating head 7 that ejects a liquid, and a drive device 8 that moves a stage 11 of the substrate holding device 10 relative to the coating head 7. The substrate holding device 10 suction-holds a substrate W1 (W2). The substrate holding device 10 of this embodiment can hold either a first substrate W1 or a second substrate W2, which have different sizes.

 基板保持装置10のステージ11と塗布ヘッド7とが駆動装置8によって相対移動しながら、塗布ヘッド7から吐出された液が、基板保持装置10(ステージ11)に保持された基板W1(W2)の上面に塗布される。これにより、基板W1(W2)の上に所定形状の塗膜が形成される。
 基板W1(W2)は、例えば、半導体ウエハ用の基板、ディスプレイ用の基板、又はカラーフィルタ用の基板である。
While the stage 11 of the substrate holding device 10 and the coating head 7 are moved relative to each other by the drive device 8, the liquid ejected from the coating head 7 is applied to the upper surface of the substrate W1 (W2) held by the substrate holding device 10 (stage 11). As a result, a coating film having a predetermined shape is formed on the substrate W1 (W2).
The substrate W1 (W2) is, for example, a substrate for a semiconductor wafer, a substrate for a display, or a substrate for a color filter.

 図2は、基板保持装置10の一例を示す平面図である。図3は、図1に示す基板保持装置10を側方から見た場合の断面図である。図4、図5、及び図6は、基板保持装置10の動作の説明図である。
 本実施形態の基板保持装置10は、ステージ11、複数本の支持ピン15、複数本の外ガイドピン18、複数本の内ガイドピン22、第一の押さえ部材25、及び、第二の押さえ部材27を有する。基板保持装置10は、更に吸引装置41を有する(図2参照)。
Fig. 2 is a plan view showing an example of the substrate holding device 10. Fig. 3 is a cross-sectional view of the substrate holding device 10 shown in Fig. 1 as seen from the side. Figs. 4, 5, and 6 are explanatory views of the operation of the substrate holding device 10.
The substrate holding device 10 of this embodiment includes a stage 11, a plurality of support pins 15, a plurality of outer guide pins 18, a plurality of inner guide pins 22, a first pressing member 25, and a second pressing member 27. The substrate holding device 10 further includes a suction device 41 (see FIG. 2).

〔ステージ11について〕
 ステージ11は、その上面として、基板W1が載る平坦面(載置面)12を有する。ステージ11は、図示しないが、平坦面12で開口する多数の貫通穴を有する。又は、ステージ11は、多孔質の穴を有する。吸引装置41は、前記多数の貫通穴(又は多孔質の穴)とつながるエア流路42を有する。吸引装置41は、例えば、吸引ポンプ411を有する。吸引ポンプ411によって、平坦面12上のエアが、前記貫通穴(又は多孔質の穴)及びエア流路42を通じて吸引される。これにより、ステージ11は、平坦面12に載る基板W1を吸着可能である(図5、図6参照)。
[About Stage 11]
The stage 11 has, as its upper surface, a flat surface (mounting surface) 12 on which the substrate W1 is placed. Although not shown, the stage 11 has a number of through holes opening on the flat surface 12. Alternatively, the stage 11 has porous holes. The suction device 41 has air flow paths 42 connecting to the many through holes (or porous holes). The suction device 41 has, for example, a suction pump 411. The suction pump 411 sucks air on the flat surface 12 through the through holes (or porous holes) and the air flow paths 42. This allows the stage 11 to adsorb the substrate W1 placed on the flat surface 12 (see FIGS. 5 and 6).

〔支持ピン15について〕
 複数本の支持ピン15は、ステージ11のうちの平坦面12を有する部分13に配置されている。本実施形態の場合(図2参照)、5本の支持ピン15がステージ11に分かれて配置されている。支持ピン15は、上下方向に長い針状(細い柱状)の部材である。
 ステージ11のうち、平坦面12を有する部分13に、支持ピン15と同数の穴131が設けられている(図3参照)。一つの穴131に1本の支持ピン15が設けられる。
[Regarding the support pin 15]
The plurality of support pins 15 are arranged on a portion 13 of the stage 11 that has a flat surface 12. In the present embodiment (see FIG. 2), five support pins 15 are arranged separately on the stage 11. The support pins 15 are needle-shaped (thin columnar) members that are long in the vertical direction.
The stage 11 has a portion 13 having a flat surface 12, and is provided with holes 131 in the same number as the support pins 15 (see FIG. 3). One support pin 15 is provided in each hole 131.

 複数本の支持ピン15それぞれは、穴131において昇降可能である。基板保持装置10は、複数本の支持ピン15を昇降させるアクチュエータ(図示せず)を有する。そのアクチュエータは、ステージ11の下に位置する。複数本の支持ピン15は、同期して昇降する。前記アクチュエータは、例えば、昇降部材と、その昇降部材を上下動させるモータ等を有して構成される。 Each of the multiple support pins 15 can be raised and lowered in the hole 131. The substrate holding device 10 has an actuator (not shown) that raises and lowers the multiple support pins 15. The actuator is located below the stage 11. The multiple support pins 15 rise and lower in synchronization. The actuator is configured, for example, with a lifting member and a motor that moves the lifting member up and down.

 複数本の支持ピン15それぞれは、基板W1が載る先端16を有する。以下において、支持ピン15の先端16は「支持ピン先端16」と呼ばれることがある。支持ピン先端16は、上に向かって細くなる先細り形状を有する。 Each of the multiple support pins 15 has a tip 16 on which the substrate W1 rests. Hereinafter, the tip 16 of the support pin 15 may be referred to as the "support pin tip 16." The support pin tip 16 has a tapered shape that narrows toward the top.

 支持ピン15は、上位置Pu(図3参照)と、下位置Pd(図4、図5、図6参照)との間を変位可能である。上位置Puは、支持ピン先端16が平坦面12から上に突出する位置である。下位置Pdは、支持ピン先端16が平坦面12よりも下となる位置である。この変位は、支持ピン15用の前記アクチュエータ(図示せず)によって行われる。
 支持ピン15が上位置Puにある状態で(図3参照)、図外の搬送ロボットが、第一の基板W1をステージ11上に搬入し、複数本の支持ピン15の上に載置する。
The support pin 15 is displaceable between an upper position Pu (see FIG. 3) and a lower position Pd (see FIGS. 4, 5, and 6). The upper position Pu is a position where the support pin tip 16 protrudes above the flat surface 12. The lower position Pd is a position where the support pin tip 16 is below the flat surface 12. This displacement is performed by the actuator (not shown) for the support pin 15.
With the support pins 15 in the upper position Pu (see FIG. 3), a transport robot (not shown) carries the first substrate W1 onto the stage 11 and places it on the support pins 15.

 図7は、基板保持装置10が第一の基板W1を保持する状態を示す平面図である。ステージ11が保持する対象とする基板は、第一の基板W1のみではなく、輪郭の大きさが異なる第二の基板W2を含む。図8は、基板保持装置10が第二の基板W2を保持する状態を示す平面図である。第二の基板W2は、基板W1よりも小さい。ステージ11(平坦面12)において、第二の基板W2は、第一の基板W1が載置される範囲の内側に載置される。 Figure 7 is a plan view showing the state in which the substrate holding device 10 is holding a first substrate W1. The substrates that the stage 11 can hold include not only the first substrate W1 but also a second substrate W2, which has a different contour size. Figure 8 is a plan view showing the state in which the substrate holding device 10 is holding a second substrate W2. The second substrate W2 is smaller than the substrate W1. On the stage 11 (flat surface 12), the second substrate W2 is placed inside the range in which the first substrate W1 is placed.

 第二の基板W2も、第一の基板W1と同様に、複数本の支持ピン15の先端16に載ることが可能である。つまり、複数本の支持ピン15は、第二の基板W2を支持可能とするように、平坦面12を有する部分13に配置されている(図8参照)。ステージ11(平坦面12)において、複数本の支持ピン15は、第二の基板W2が載置される範囲内に配置される。 Like the first substrate W1, the second substrate W2 can also be placed on the tips 16 of multiple support pins 15. In other words, the multiple support pins 15 are arranged in a portion 13 having a flat surface 12 so as to be able to support the second substrate W2 (see Figure 8). On the stage 11 (flat surface 12), the multiple support pins 15 are arranged within the range in which the second substrate W2 will be placed.

 本実施形態の場合、5本の支持ピン15がステージ11に配置されているが、その数は変更可能であり、4本であってもよい。矩形である基板W1(W2)の四角側が、4本の支持ピン15によって下から支持される。支持ピン15が5本である場合、基板W1(W2)の中央が、1本の支持ピン15によって支持される。なお、支持ピン15の数は、4本又は5本に限定されない。 In this embodiment, five support pins 15 are arranged on the stage 11, but this number can be changed and may be four. The square sides of the rectangular substrate W1 (W2) are supported from below by four support pins 15. When there are five support pins 15, the center of the substrate W1 (W2) is supported by one support pin 15. Note that the number of support pins 15 is not limited to four or five.

 図3から図4に示すように、第一の基板W1が、支持ピン先端16に載った状態で、支持ピン15が上位置Puから下位置Pdへ変位すると、第一の基板W1は、ステージ11の平坦面12に載った状態となる。
 本実施形態では、第一の基板W1に反り(反り変形)が生じており、そのような第一の基板W1が、複数本の支持ピン15に載り(図3)、そして、第一の基板W1は、反りが生じている状態で、平坦面12に載る(図4)。なお、第二の基板W2が、平坦面12に載せられる動作は、第一の基板W1の場合と同様である。
As shown in Figures 3 and 4, when the first substrate W1 is placed on the tip 16 of the support pin and the support pin 15 is displaced from the upper position Pu to the lower position Pd, the first substrate W1 is placed on the flat surface 12 of the stage 11.
In this embodiment, the first substrate W1 is warped (warpage deformation), and is placed on a plurality of support pins 15 (FIG. 3), and the warped first substrate W1 is placed on the flat surface 12 (FIG. 4). The operation of placing the second substrate W2 on the flat surface 12 is the same as that for the first substrate W1.

〔外ガイドピン18について〕
 複数本の外ガイドピン18は、ステージ11のうちの平坦面12の周囲の部分14に配置されている。平坦面12の周囲の部分14の上面は、平坦面12と共通する平面を構成する。本実施形態の場合(図2参照)、8本の外ガイドピン18がステージ11に分かれて配置されている。外ガイドピン18は、上下方向に長い柱状の部材である。
 ステージ11のうち、平坦面12の周囲の部分14に、外ガイドピン18と同数の穴132が設けられている(図3参照)。一つの穴132に1本の外ガイドピン18が設けられる。
[Regarding the outer guide pin 18]
The plurality of outer guide pins 18 are arranged in a peripheral portion 14 of the flat surface 12 of the stage 11. The upper surface of the peripheral portion 14 of the flat surface 12 forms a common plane with the flat surface 12. In the present embodiment (see FIG. 2), eight outer guide pins 18 are arranged separately on the stage 11. The outer guide pins 18 are columnar members that are long in the vertical direction.
The stage 11 has holes 132 in the peripheral portion 14 of the flat surface 12, the number of which is the same as the number of outer guide pins 18 (see FIG. 3). One outer guide pin 18 is provided in one hole 132.

 複数本の外ガイドピン18それぞれは、穴132において昇降可能である。基板保持装置10は、複数本の外ガイドピン18を昇降させるアクチュエータ(図示せず)を有する。そのアクチュエータは、ステージ11の下に位置する。複数本の外ガイドピン18は、同期して昇降する。前記アクチュエータは、例えば、昇降部材と、その昇降部材を上下動させるモータ等を有して構成される。 Each of the multiple outer guide pins 18 can be raised and lowered in the hole 132. The substrate holding device 10 has an actuator (not shown) that raises and lowers the multiple outer guide pins 18. The actuator is located below the stage 11. The multiple outer guide pins 18 rise and lower in synchronization. The actuator is configured, for example, with a lifting member and a motor that moves the lifting member up and down.

 複数本の外ガイドピン18それぞれは、先細りとなる先端19を有する。以下において、外ガイドピン18の先端19は「外ピン先端19」と呼ばれることがある。外ピン先端19は、上に向かって細くなる先細り形状を有する。
 外ガイドピン18は、上位置Qu(図3、図4、図5参照)と、下位置Qd(図6参照)との間を変位可能である。上位置Quは、外ピン先端19が平坦面12から上に突出する位置である。下位置Qdは、外ピン先端19が平坦面12よりも下となる位置である。この変位は、外ガイドピン18用の前記アクチュエータ(図示せず)によって行われる。
Each of the outer guide pins 18 has a tapered tip 19. Hereinafter, the tip 19 of the outer guide pin 18 may be referred to as the "outer pin tip 19." The outer pin tip 19 has a tapered shape that narrows toward the top.
The outer guide pin 18 is displaceable between an upper position Qu (see FIGS. 3, 4, and 5) and a lower position Qd (see FIG. 6). The upper position Qu is a position where the outer pin tip 19 protrudes above the flat surface 12. The lower position Qd is a position where the outer pin tip 19 is below the flat surface 12. This displacement is performed by the actuator (not shown) for the outer guide pin 18.

 外ガイドピン18は、矩形である第一の基板W1の各角E1を挟む両側に配置されている(図7参照)。このために、8本の外ガイドピン18がステージ11に設けられている。第一の基板W1の一つの辺に対して、2本の外ガイドピン18が接触可能となる。 The outer guide pins 18 are arranged on both sides of each corner E1 of the rectangular first substrate W1 (see Figure 7). For this reason, eight outer guide pins 18 are provided on the stage 11. Two outer guide pins 18 can come into contact with one side of the first substrate W1.

 外ガイドピン18は、断面円形となる柱形状を有する。このため、外ガイドピン18は、第一の基板W1の外周縁W1eの一部に、点接触することが可能である。つまり、外ガイドピン18は、その側面に、第一の基板W1の外周縁W1eの一部に接触可能である接触点181を有する。
 平面視において、8本の外ガイドピン18の接触点181を結ぶ矩形の範囲は、第一の基板W1の輪郭形状よりも僅かに大きい。
The outer guide pins 18 have a columnar shape with a circular cross section. Therefore, the outer guide pins 18 can come into point contact with part of the outer peripheral edge W1e of the first substrate W1. In other words, the outer guide pins 18 have contact points 181 on their side surfaces that can come into contact with part of the outer peripheral edge W1e of the first substrate W1.
In a plan view, the range of the rectangle connecting the contact points 181 of the eight outer guide pins 18 is slightly larger than the outline shape of the first substrate W1.

 以上のように、複数本(8本)の外ガイドピン18は、図3から図4に示すように、上位置Puから下位置Pdへ変位する支持ピン15(支持ピン先端16)に載る第一の基板W1の外周縁W1eに、複数方向から接触可能となるように配置されている。 As described above, the multiple (eight) outer guide pins 18 are positioned so that they can contact the outer peripheral edge W1e of the first substrate W1, which is placed on the support pins 15 (support pin tips 16) that are displaced from the upper position Pu to the lower position Pd, from multiple directions, as shown in Figures 3 and 4.

 本実施形態の場合(図7参照)、外ガイドピン18は、第一の基板W1の外周縁W1eに、前後左右の4方向から接触可能となるように配置されている。
 ただし、前記のとおり、8本の外ガイドピン18の接触点181を結ぶ矩形の範囲は、第一の基板W1の輪郭形状よりも僅かに大きいことから、降下する第一の基板W1に対して、8本すべての外ガイドピン18が接触するのではなく、8本の外ガイドピン18の一部と接触する。外ガイドピン18は、第一の基板W1の外周縁W1eに、前後左右の4方向のうちの2方向(例えば前と右との2方向)から接触する場合がある。
In this embodiment (see FIG. 7), the outer guide pins 18 are arranged so as to be able to come into contact with the outer periphery W1e of the first substrate W1 from four directions, i.e., front, rear, left and right.
However, as described above, the range of the rectangle connecting the contact points 181 of the eight outer guide pins 18 is slightly larger than the outline shape of the first substrate W1, and therefore, not all eight outer guide pins 18 come into contact with the descending first substrate W1, but rather only some of the eight outer guide pins 18. The outer guide pins 18 may come into contact with the outer peripheral edge W1e of the first substrate W1 from two of the four directions, front, back, left, and right (for example, from the front and right).

 このように、支持ピン15が下位置Pdへ変位すると、支持ピン15に載る第一の基板W1の外周縁W1eは、8本の外ガイドピン18に複数方向(例えば前と右との2方向)から接触可能であり、第一の基板W1は、これら外ガイドピン18により位置決めされながら降下する。第一の基板W1は、8本の外ガイドピン18の内側の領域に収まるように、位置決めされる。支持ピン15が下位置Pdに到達すると、その基板W1はステージ11の平坦面12に載る(図4参照)。 In this way, when the support pins 15 are displaced to the lower position Pd, the outer peripheral edge W1e of the first substrate W1 placed on the support pins 15 can come into contact with the eight outer guide pins 18 from multiple directions (for example, from the front and right), and the first substrate W1 descends while being positioned by these outer guide pins 18. The first substrate W1 is positioned so that it fits within the area inside the eight outer guide pins 18. When the support pins 15 reach the lower position Pd, the substrate W1 rests on the flat surface 12 of the stage 11 (see Figure 4).

 前記のとおり、外ガイドピン18は、先細りとなる外ピン先端19を有する。このため、下位置Pdへ変位する支持ピン15に載る第一の基板W1が、仮に、外ピン先端19に接触したとしても、その第一の基板W1は、先細りとなる外ピン先端19を滑り、外ガイドピン18に沿ってステージ11に向かい、位置決めされる。 As mentioned above, the outer guide pins 18 have tapered outer pin tips 19. Therefore, even if the first substrate W1 placed on the support pins 15 displaced to the lower position Pd comes into contact with the outer pin tips 19, the first substrate W1 will slide along the tapered outer pin tips 19 and move along the outer guide pins 18 toward the stage 11, where it will be positioned.

〔内ガイドピン22について〕
 複数本の内ガイドピン22は、第一の基板W1よりも小さい第二の基板W2の位置決めを行うための機能を有する。図9は、支持ピン先端16に載せられた第二の基板W2が、支持ピン15の降下によって、ステージ11(平坦面12)に載せられる様子を示す説明図である。
[Regarding the inner guide pin 22]
The multiple inner guide pins 22 function to position the second substrate W2, which is smaller than the first substrate W1. Fig. 9 is an explanatory diagram showing how the second substrate W2 placed on the support pin tips 16 is placed on the stage 11 (flat surface 12) by the lowering of the support pins 15.

 複数本の内ガイドピン22は、ステージ11のうちの平坦面12を有する部分13に配置されている。この配置をより具体的に説明すると(図2参照)、複数本の内ガイドピン22は、複数本(8本)の外ガイドピン18よりも平坦面12の中央側の部分に配置されている。複数本の内ガイドピン22は、複数本(5本)の支持ピン15よりも、外ガイドピン18側に配置されている。 The multiple inner guide pins 22 are arranged in the portion 13 of the stage 11 that has the flat surface 12. To explain this arrangement more specifically (see Figure 2), the multiple inner guide pins 22 are arranged closer to the center of the flat surface 12 than the multiple (8) outer guide pins 18. The multiple inner guide pins 22 are arranged closer to the outer guide pins 18 than the multiple (5) support pins 15.

 本実施形態の場合(図2参照)、8本の内ガイドピン22がステージ11に分かれて配置されている。内ガイドピン22は、上下方向に長い柱状の部材である。
 ステージ11のうち、平坦面12を有する部分13に、内ガイドピン22と同数の穴133が設けられている(図3、図9参照)。一つの穴133に1本の内ガイドピン22が設けられる。
In this embodiment (see FIG. 2), eight inner guide pins 22 are arranged separately on the stage 11. The inner guide pins 22 are columnar members that are long in the vertical direction.
The stage 11 has a portion 13 having a flat surface 12, and is provided with holes 133 in the same number as the inner guide pins 22 (see FIGS. 3 and 9). One inner guide pin 22 is provided in one hole 133.

 複数本の内ガイドピン22それぞれは、穴133において昇降可能である。基板保持装置10は、複数本の内ガイドピン22を昇降させるアクチュエータ(図示せず)を有する。そのアクチュエータは、ステージ11の下に位置する。複数本の内ガイドピン22は、同期して昇降する。前記アクチュエータは、例えば、昇降部材と、その昇降部材を上下動させるモータ等を有して構成される。 Each of the multiple inner guide pins 22 can be raised and lowered in the hole 133. The substrate holding device 10 has an actuator (not shown) that raises and lowers the multiple inner guide pins 22. The actuator is located below the stage 11. The multiple inner guide pins 22 rise and lower in synchronization. The actuator is configured, for example, with a lifting member and a motor that moves the lifting member up and down.

 複数本の内ガイドピン22それぞれは、先細りとなる先端23を有する。以下において、内ガイドピン22の先端23は「内ピン先端23」と呼ばれることがある。内ピン先端23は、上に向かって細くなる先細り形状を有する。
 内ガイドピン22は、上位置Ru(図9参照)と、下位置Rd(図3、図4、図5、図6参照)との間を変位可能である。上位置Ruは、内ピン先端23が平坦面12から上に突出する位置である。下位置Rdは、内ピン先端23が平坦面12よりも下となる位置である。この変位は、内ガイドピン22用の前記アクチュエータ(図示せず)によって行われる。
Each of the multiple inner guide pins 22 has a tapered tip 23. Hereinafter, the tip 23 of the inner guide pin 22 may be referred to as the "inner pin tip 23." The inner pin tip 23 has a tapered shape that narrows toward the top.
The inner guide pin 22 is displaceable between an upper position Ru (see FIG. 9) and a lower position Rd (see FIGS. 3, 4, 5, and 6). The upper position Ru is a position where the inner pin tip 23 protrudes above the flat surface 12. The lower position Rd is a position where the inner pin tip 23 is below the flat surface 12. This displacement is performed by the actuator (not shown) for the inner guide pin 22.

 内ガイドピン22は、矩形である第二の基板W2の各角E2を挟む両側に配置されている(図8参照)。このために、8本の内ガイドピン22がステージ11に設けられている。第二の基板W2の一つの辺に対して、2本の内ガイドピン22が接触可能となる。 The inner guide pins 22 are arranged on both sides of each corner E2 of the rectangular second substrate W2 (see Figure 8). For this purpose, eight inner guide pins 22 are provided on the stage 11. Two inner guide pins 22 can come into contact with one side of the second substrate W2.

 内ガイドピン22は、断面円形となる柱形状を有する。このため、内ガイドピン22は、第二の基板W2の外周縁W2eの一部に、点接触することが可能である。つまり、内ガイドピン22は、その側面に、第二の基板W2の外周縁W2eの一部に接触可能である接触点221を有する。
 平面視において、8本の内ガイドピン22の接触点221を結ぶ矩形の範囲は、第二の基板W2の輪郭形状よりも僅かに大きい。
The inner guide pin 22 has a columnar shape with a circular cross section. Therefore, the inner guide pin 22 can come into point contact with a part of the outer circumferential edge W2e of the second substrate W2. In other words, the inner guide pin 22 has a contact point 221 on its side surface that can come into contact with a part of the outer circumferential edge W2e of the second substrate W2.
In a plan view, the range of a rectangle connecting the contact points 221 of the eight inner guide pins 22 is slightly larger than the outline shape of the second substrate W2.

 以上のように、複数本(8本)の内ガイドピン22は、図9から図10に示すように、上位置Puから下位置Pdへ変位する支持ピン15(支持ピン先端16)に載る第二の基板W2の外周縁W2eに、複数方向から接触可能となるように配置されている。
 図10は、平坦面12に載せられた第二の基板W2が、後述する第二の押さえ部材27によって平坦面12に押さえられた状態を示す説明図である。
As described above, the multiple (eight) inner guide pins 22 are arranged so as to be able to contact the outer edge W2e of the second substrate W2 placed on the support pin 15 (support pin tip 16) displacing from the upper position Pu to the lower position Pd from multiple directions, as shown in Figures 9 and 10.
FIG. 10 is an explanatory diagram showing a state in which the second substrate W2 placed on the flat surface 12 is pressed onto the flat surface 12 by a second pressing member 27, which will be described later.

 本実施形態の場合(図8参照)、内ガイドピン22は、第二の基板W2の外周縁W2eに、前後左右の4方向から接触可能となるように配置されている。
 ただし、前記のとおり、8本の内ガイドピン22の接触点221を結ぶ矩形の範囲は、第二の基板W2の輪郭形状よりも僅かに大きいことから、降下する第二の基板W2に対して、8本すべての内ガイドピン22が接触するのではなく、8本の内ガイドピン22の一部と接触する。内ガイドピン22は、第二の基板W2の外周縁W2eに、前後左右の4方向のうちの2方向(例えば前と右との2方向)から接触する場合がある。
In this embodiment (see FIG. 8), the inner guide pins 22 are arranged so as to be able to come into contact with the outer periphery W2e of the second substrate W2 from four directions, i.e., front, rear, left and right.
However, as described above, the range of the rectangle connecting the contact points 221 of the eight inner guide pins 22 is slightly larger than the outline shape of the second substrate W2, and therefore, the descending second substrate W2 does not come into contact with all eight inner guide pins 22, but rather with some of the eight inner guide pins 22. The inner guide pins 22 may come into contact with the outer peripheral edge W2e of the second substrate W2 from two of the four directions, front, back, left, and right (for example, from the front and right).

 このように、支持ピン15が下位置Pdへ変位すると、支持ピン15に載る第二の基板W2の外周縁W2eは、8本の内ガイドピン22に複数方向(例えば前と右との2方向)から接触可能であり、第二の基板W2は、これら内ガイドピン22により位置決めされながら降下する。第二の基板W2は、8本の内ガイドピン22の内側の領域に収まるように、位置決めされる。支持ピン15が下位置Pdに到達すると、その基板W2はステージ11の平坦面12に載る(図9参照)。 In this way, when the support pins 15 are displaced to the lower position Pd, the outer peripheral edge W2e of the second substrate W2 placed on the support pins 15 can come into contact with the eight inner guide pins 22 from multiple directions (for example, from the front and right), and the second substrate W2 descends while being positioned by these inner guide pins 22. The second substrate W2 is positioned so that it fits within the area inside the eight inner guide pins 22. When the support pins 15 reach the lower position Pd, the substrate W2 rests on the flat surface 12 of the stage 11 (see Figure 9).

 前記のとおり、内ガイドピン22は、先細りとなる内ピン先端23を有する。このため、下位置Pdへ変位する支持ピン15に載る第二の基板W2が、仮に、内ピン先端23に接触したとしても、その第二の基板W2は、先細りとなる内ピン先端23を滑り、内ガイドピン22に沿ってステージ11に向かい、位置決めされる。 As mentioned above, the inner guide pin 22 has a tapered inner pin tip 23. Therefore, even if the second substrate W2 placed on the support pin 15 displaced to the lower position Pd comes into contact with the inner pin tip 23, the second substrate W2 will slide along the tapered inner pin tip 23 and move along the inner guide pin 22 toward the stage 11, where it will be positioned.

〔第一の押さえ部材25について〕
 第一の押さえ部材25は、ステージ11の平坦面12の上に設けられていて、昇降可能である(図3、図5参照)。基板保持装置10は、第一の押さえ部材25を昇降させるアクチュエータ(図示せず)を有する。そのアクチュエータは、ステージ11の上方に位置する。前記アクチュエータは、例えば、昇降部材と、その昇降部材を上下動させるモータ等を有して構成される。前記昇降部材に、第一の昇降ロッド61を介して第一の押さえ部材25が取り付けられている。
[Regarding the first pressing member 25]
The first pressing member 25 is provided on the flat surface 12 of the stage 11 and is movable up and down (see FIGS. 3 and 5). The substrate holding device 10 has an actuator (not shown) that raises and lowers the first pressing member 25. The actuator is located above the stage 11. The actuator is configured to include, for example, a lifting member and a motor that moves the lifting member up and down. The first pressing member 25 is attached to the lifting member via a first lifting rod 61.

 第一の押さえ部材25は、平坦面12の上方の退避位置S1(図3参照)と、押さえ位置D1(図5参照)との間を変位可能である。退避位置S1は、第一の押さえ部材25がステージ11(平坦面12)から離れた位置である。押さえ位置D1は、第一の押さえ部材25がステージ11(平坦面12)に接近した位置である。押さえ位置D1は、第一の基板W1をステージ11(平坦面12)に上から押し付けた状態となる位置である。第一の押さえ部材25は、平坦面12の上方の退避位置S1から押さえ位置D1まで降下可能である。 The first pressing member 25 is movable between a retracted position S1 (see Figure 3) above the flat surface 12 and a pressing position D1 (see Figure 5). The retracted position S1 is a position where the first pressing member 25 is away from the stage 11 (flat surface 12). The pressing position D1 is a position where the first pressing member 25 is close to the stage 11 (flat surface 12). The pressing position D1 is a position where the first substrate W1 is pressed against the stage 11 (flat surface 12) from above. The first pressing member 25 is capable of descending from the retracted position S1 above the flat surface 12 to the pressing position D1.

 第一の押さえ部材25は、図4から図5に示すように、退避位置S1から降下して、ステージ11上の第一の基板W1を平坦面12に押す。なお、この際、支持ピン15及び内ガイドピン22は下位置にある。これにより、反りが生じていた第一の基板W1(図4)は、平坦面12に沿った平面形状に矯正される(図5)。そして、第一の押さえ部材25が第一の基板W1を平坦面12に押し付けた状態で、ステージ11が第一の基板W1を吸着する。 As shown in Figures 4 and 5, the first pressing member 25 descends from the retracted position S1 and presses the first substrate W1 on the stage 11 onto the flat surface 12. At this time, the support pins 15 and inner guide pins 22 are in their lower positions. As a result, the warped first substrate W1 (Figure 4) is corrected to a flat shape that conforms to the flat surface 12 (Figure 5). Then, with the first pressing member 25 pressing the first substrate W1 against the flat surface 12, the stage 11 adsorbs the first substrate W1.

〔第二の押さえ部材27について〕
 第二の押さえ部材27は、ステージ11の平坦面12の上に設けられていて、昇降可能である(図9、図10参照)。基板保持装置10は、第二の押さえ部材27を昇降させるアクチュエータ(図示せず)を有する。そのアクチュエータは、ステージ11の上方に位置する。前記アクチュエータは、例えば、昇降部材と、その昇降部材を上下動させるモータ等を有して構成される。前記昇降部材に、第二の昇降ロッド62を介して第二の押さえ部材27が取り付けられている。
[Regarding the second pressing member 27]
The second pressing member 27 is provided on the flat surface 12 of the stage 11 and is movable up and down (see FIGS. 9 and 10). The substrate holding device 10 has an actuator (not shown) that moves the second pressing member 27 up and down. The actuator is located above the stage 11. The actuator includes, for example, a lifting member and a motor that moves the lifting member up and down. The second pressing member 27 is attached to the lifting member via a second lifting rod 62.

 第二の押さえ部材27は、平坦面12の上方の退避位置S2(図9参照)と、押さえ位置D2(図10参照)との間を変位可能である。退避位置S2は、第二の押さえ部材27がステージ11(平坦面12)から離れた位置である。押さえ位置D2は、第二の押さえ部材25がステージ11(平坦面12)に接近した位置である。押さえ位置D2は、第二の基板W2をステージ11(平坦面12)に上から押し付けた状態となる位置である。第二の押さえ部材27は、平坦面12の上方の退避位置S2から押さえ位置D2まで降下可能である。 The second pressing member 27 is movable between a retracted position S2 (see Figure 9) above the flat surface 12 and a pressing position D2 (see Figure 10). The retracted position S2 is a position where the second pressing member 27 is away from the stage 11 (flat surface 12). The pressing position D2 is a position where the second pressing member 27 is close to the stage 11 (flat surface 12). The pressing position D2 is a position where the second substrate W2 is pressed against the stage 11 (flat surface 12) from above. The second pressing member 27 is capable of descending from the retracted position S2 above the flat surface 12 to the pressing position D2.

 第二の押さえ部材25は、図9から図10に示すように、退避位置S2から降下して、ステージ11上の第二の基板W2を平坦面12に押す。なお、この際、支持ピン15は下位置Pdにある。これにより、反りが生じていた第二の基板W2(図9)は、平坦面12に沿った平面形状に矯正される(図10)。そして、第二の押さえ部材27が第二の基板W2を平坦面12に押し付けた状態で、ステージ11が第二の基板W2を吸着する。 As shown in Figures 9 and 10, the second pressing member 25 descends from the retracted position S2 and presses the second substrate W2 on the stage 11 onto the flat surface 12. At this time, the support pins 15 are in the lower position Pd. As a result, the warped second substrate W2 (Figure 9) is corrected to a flat shape that conforms to the flat surface 12 (Figure 10). Then, with the second pressing member 27 pressing the second substrate W2 against the flat surface 12, the stage 11 adsorbs the second substrate W2.

〔第一の押さえ部材25及び第二の押さえ部材27について〕
 本実施形態の第一の押さえ部材25は、図2及び図3に示すように、基板W1に部分的に接触するための複数の凸部29を有する。
 第一の押さえ部材25は(図2参照)、第一の基板W1の外周輪郭形状と、ほぼ同じ形状の第一のフレーム51を有する。第一のフレーム51は、4本の直線である梁部材511が組み合わされ、全体として矩形となる。4本の梁部材511で囲われる範囲は開口している。第一のフレーム51に、前記昇降ロッド61が取り付けられている。
[Regarding the first pressing member 25 and the second pressing member 27]
As shown in FIGS. 2 and 3, the first pressing member 25 of this embodiment has a plurality of protrusions 29 for partially contacting the substrate W1.
The first presser member 25 (see FIG. 2) has a first frame 51 having a shape substantially the same as the contour of the outer periphery of the first substrate W1. The first frame 51 is formed by combining four straight beam members 511, forming a rectangle as a whole. The area surrounded by the four beam members 511 is open. The lifting rod 61 is attached to the first frame 51.

 複数の凸部29は、第一のフレーム51の下に取り付けられている。図2に示す形態の場合、凸部29は、第一のフレーム51の四角それぞれに取り付けられている。第一の押さえ部材25が、下位置となる押さえ位置D1にある状態で(図5参照)、四角の凸部29が、第一の基板W1の四角を押さえる。本実施形態の場合、凸部29は、更に、1本の梁部材511の長手方向の中央部にも設けられていて、これら凸部29も、第一の基板W1を押さえる。
 第一の基板W1の反りの形態に応じて、凸部29が配置されればよい。
A plurality of protrusions 29 are attached to the bottom of the first frame 51. In the embodiment shown in Fig. 2, a protrusion 29 is attached to each of the four corners of the first frame 51. When the first pressing member 25 is in the pressing position D1, which is the lower position (see Fig. 5), the square protrusions 29 press the four corners of the first substrate W1. In the present embodiment, a protrusion 29 is also provided at the center in the longitudinal direction of one beam member 511, and these protrusions 29 also press the first substrate W1.
The protrusions 29 may be arranged in accordance with the type of warpage of the first substrate W1.

 第一の押さえ部材25が、凸部29を有する場合、第一の押さえ部材25が第一の基板W1に接触する部分は、凸部29となる。第一の基板W1に対する第一の押さえ部材25の接触面積が小さくなる。 If the first pressing member 25 has a convex portion 29, the portion where the first pressing member 25 comes into contact with the first substrate W1 will be the convex portion 29. This reduces the contact area of the first pressing member 25 with the first substrate W1.

 本実施形態の第二の押さえ部材25は、図2及び図9に示すように、基板W2に部分的に接触するための複数の凸部39を有する。
 第二の押さえ部材27は、第一の押さえ部材25と比較して、その大きさが小さくなって構成される。第二の押さえ部材27は、第一のフレーム51の前記開口を通過可能である。
As shown in FIGS. 2 and 9, the second pressing member 25 of this embodiment has a plurality of protrusions 39 for partially contacting the substrate W2.
The second pressing member 27 is configured to be smaller in size than the first pressing member 25. The second pressing member 27 can pass through the opening of the first frame 51.

 第二の押さえ部材27は(図2参照)、第二の基板W2の外周輪郭形状と、ほぼ同じ形状の第二のフレーム52を有する。第二のフレーム52は、4本の直線である梁部材521が組み合わされ、全体として矩形となる。4本の梁部材521で囲われる範囲は開口している。第二のフレーム52に、前記昇降ロッド62が取り付けられている。 The second pressing member 27 (see Figure 2) has a second frame 52 that has a shape that is roughly the same as the outer contour shape of the second substrate W2. The second frame 52 is made up of four straight beam members 521, forming a rectangle overall. The area surrounded by the four beam members 521 is open. The lifting rod 62 is attached to the second frame 52.

 複数の凸部39は、第二のフレーム52の下に取り付けられている。図2に示す形態の場合、凸部39は、第二のフレーム52の四角それぞれに取り付けられている。第二の押さえ部材27が、下位置となる押さえ位置D2にある状態で(図10参照)、4つの凸部39が、第二の基板W2の四角を押さえる。凸部39は、更に、1本の梁部材521の長手方向の中央部にも設けられていてもよい。
 第二の基板W2の反りの形態に応じて、凸部39が配置されればよい
The plurality of protrusions 39 are attached to the bottom of the second frame 52. In the embodiment shown in Fig. 2, the protrusions 39 are attached to each of the four corners of the second frame 52. When the second pressing member 27 is in the pressing position D2 (see Fig. 10), which is the lower position, the four protrusions 39 press the four corners of the second substrate W2. The protrusions 39 may also be provided at the center of one beam member 521 in the longitudinal direction.
The protrusions 39 may be arranged depending on the type of warpage of the second substrate W2.

 第二の押さえ部材27が、凸部39を有する場合、第二の押さえ部材27が第二の基板W2に接触する部分は、凸部39となる。第二の基板W2に対する第二の押さえ部材27の接触面積が小さくなる。 If the second pressing member 27 has a convex portion 39, the portion where the second pressing member 27 comes into contact with the second substrate W2 will be the convex portion 39. This reduces the contact area of the second pressing member 27 with the second substrate W2.

 第一の押さえ部材25の凸部29と、第二の押さえ部材27の凸部39とは、同じ形状であってもよい。以下、第一の押さえ部材25の凸部29を例として、その具体的構成を説明する。 The convex portion 29 of the first pressing member 25 and the convex portion 39 of the second pressing member 27 may have the same shape. Below, the specific configuration will be explained using the convex portion 29 of the first pressing member 25 as an example.

 図11Aは、図2及び図3に示す第一の押さえ部材25が有する凸部29の説明図である。図11Aの下図は、凸部29の側面図であり、図11Aの上図は、図11Aの下図におけるA矢視の断面図である。
 凸部29は、軸方向に短い円柱部291と、円柱部291に連続し下に向かうにしたがって断面輪郭形状が小さくなる先部292とを有する。先部292は、球面に沿った形状を有する。
Fig. 11A is an explanatory diagram of the protrusion 29 of the first pressing member 25 shown in Fig. 2 and Fig. 3. The lower diagram of Fig. 11A is a side view of the protrusion 29, and the upper diagram of Fig. 11A is a cross-sectional view taken along the arrow A in the lower diagram of Fig. 11A.
The protrusion 29 has a columnar portion 291 that is short in the axial direction, and a tip portion 292 that is continuous with the columnar portion 291 and has a cross-sectional contour that becomes smaller toward the bottom. The tip portion 292 has a shape that follows a spherical surface.

 図11Bは、凸部29の第一の変形例を示す説明図である。図11Bの下図は、凸部29の側面図であり、図11Aの上図は、図11Aの下図におけるB矢視の断面図である。凸部29は、軸方向に短い円柱部291と、円柱部291に連続し下に向かうにしたがって断面輪郭形状が小さくなる先部292とを有する。先部292は、円錐面に沿った形状を有する。 Figure 11B is an explanatory diagram showing a first modified example of the convex portion 29. The bottom view of Figure 11B is a side view of the convex portion 29, and the top view of Figure 11A is a cross-sectional view taken along arrow B in the bottom view of Figure 11A. The convex portion 29 has a cylindrical portion 291 that is short in the axial direction, and a tip portion 292 that is continuous with the cylindrical portion 291 and whose cross-sectional contour shape becomes smaller as it extends downward. The tip portion 292 has a shape that follows the shape of a conical surface.

 図11Cは、凸部29の第二の変形例を示す説明図である。図11Cの下図は、凸部29の側面図であり、図11Cの上図は、図11Cの下図におけるC矢視の断面図である。凸部29は、円錐台形状を有する。 FIG. 11C is an explanatory diagram showing a second modified example of the protrusion 29. The bottom view of FIG. 11C is a side view of the protrusion 29, and the top view of FIG. 11C is a cross-sectional view taken along arrow C in the bottom view of FIG. 11C. The protrusion 29 has a truncated cone shape.

 図11A、図11B、及び図11Cそれぞれに示す凸部29は、基板W1側となる下側に向かって断面輪郭形状が徐々に小さくなる形状を有する。この構成の場合、押さえ部材25が基板W1に接触する部分は、凸部29の先端となり、基板W1に対する押さえ部材25の接触面積をより一層小さくすることが可能となる。
 特に、図11A又は図11Bに示す形態の凸部29が好ましい。基板W1に対する押さえ部材25(凸部29)の接触態様が、点接触に近くなり、接触面積をより一層小さくすることが可能となる。
11A, 11B, and 11C have a cross-sectional contour that gradually decreases downward toward the substrate W1 side. In this configuration, the portion where the pressing member 25 comes into contact with the substrate W1 is the tip of the pressing member 25, making it possible to further reduce the contact area of the pressing member 25 with the substrate W1.
11A or 11B is particularly preferable, as the contact mode of the pressing member 25 (protrusion 29) with the substrate W1 becomes close to point contact, making it possible to further reduce the contact area.

 図11Dは、凸部29の第三の変形例を示す説明図である。図11Dの下図は、凸部29の側面図であり、図11Dの上図は、図11Dの下図におけるD矢視の断面図である。凸部29は、軸方向に短い円柱形状を有する。
 図11A、図11B、図11C、及び図11Dそれぞれに示す凸部29の場合、基板W1に対する押さえ部材25の接触面積を小さくすることができる。この構成は、基板W1が、他の物品との接触を可能な限り避けることが望ましい場合に、好適である。
Fig. 11D is an explanatory diagram showing a third modified example of the protrusion 29. The lower view of Fig. 11D is a side view of the protrusion 29, and the upper view of Fig. 11D is a cross-sectional view taken along arrow D in the lower view of Fig. 11D. The protrusion 29 has a cylindrical shape that is short in the axial direction.
11A, 11B, 11C, and 11D, the contact area of the pressing member 25 with the substrate W1 can be reduced. This configuration is suitable when it is desirable to avoid contact of the substrate W1 with other articles as much as possible.

 又は、第一の基板W1の反りの形態によっては、第一の押さえ部材25は、その第一の基板W1の縁部に沿って広い範囲で押すのが好ましい場合がある。
 これと同様に、第二の基板W2の反りの形態によっては、第二の押さえ部材27は、その第二の基板W2の縁部に沿って広い範囲で押すのが好ましい場合がある。
Alternatively, depending on the type of warpage of the first substrate W1, it may be preferable for the first pressing member 25 to press the first substrate W1 over a wide range along the edge of the first substrate W1.
Similarly, depending on the type of warpage of the second substrate W2, it may be preferable for the second pressing member 27 to press over a wide area along the edge of the second substrate W2.

 基板をその縁部に反って広い範囲で押す場合、第一の押さえ部材25と、第二の押さえ部材27とを同じ構成とすることが可能である(ただし、外周輪郭の大きさは異なる。)。以下、第一の押さえ部材25を例として、その具体的構成を説明する。 When pressing the substrate against its edge over a wide area, the first pressing member 25 and the second pressing member 27 can have the same configuration (however, the size of the outer periphery contour will differ). The specific configuration will be explained below using the first pressing member 25 as an example.

 図12A、図12B、図12C、及び図12Dは、第一の基板W1の縁部に沿って広い範囲で押すことのできる第一の押さえ部材25の説明図である。これらの第一の押さえ部材25を、その上から見た場合の図である。各図において基板W1を二点鎖線で示す。
 図13は、前記第一の押さえ部材25が、基板W1をステージ11(平坦面12)に押し付けた状態を示す説明図である。
12A, 12B, 12C, and 12D are explanatory diagrams of the first pressing member 25 that can press the first substrate W1 over a wide area along the edge of the substrate W1. These diagrams show the first pressing member 25 as viewed from above. In each diagram, the substrate W1 is indicated by a two-dot chain line.
FIG. 13 is an explanatory diagram showing a state in which the first pressing member 25 presses the substrate W1 against the stage 11 (flat surface 12).

 図12Aに示す第一の押さえ部材25は、第一の基板W1の外周輪郭形状と、ほぼ同じ形状のフレーム構造を有する。第一の押さえ部材25は、4本の線状部30が組み合わされ、全体として矩形となる。4本の線状部30で囲われる範囲は開口している。
 図12Bに示す第一の押さえ部材25は、図12Aに示す場合と同様、4本の線状部30を有する。しかし、これら線状部30同士は不連続である。線状部30それぞれに、前記昇降ロッド61(図13参照)が取り付けられる。
 図12A及び図12Bに示す第一の押さえ部材25の場合、基板W1を全周に沿って押さえることが可能となる。
12A has a frame structure having substantially the same shape as the outer peripheral contour of the first substrate W1. The first pressing member 25 is formed by combining four linear portions 30 to form a rectangle as a whole. The area surrounded by the four linear portions 30 is open.
12A, the first pressing member 25 shown in Fig. 12B has four linear portions 30. However, these linear portions 30 are discontinuous. The lifting rod 61 (see Fig. 13) is attached to each of the linear portions 30.
In the case of the first pressing member 25 shown in FIGS. 12A and 12B, it is possible to press the substrate W1 along the entire periphery.

 図12C及び図12Dそれぞれに示す第一の押さえ部材25は、2本の線状部30を有する。2本の線状部30は、平行に配置されている。
 第一の基板W1の反りの形態に応じて、線状部30が配置される。つまり、基板W1が反っていて、その左右方向両側の縁部が平坦面12から浮いた状態となる場合、図12Cに示す第一の押さえ部材25が採用される。この構成により、基板W1の左右方向両側の浮いている縁部を押さえることが可能となり、好適である。
The first pressing member 25 shown in each of Figures 12C and 12D has two linear portions 30. The two linear portions 30 are arranged in parallel.
The linear portions 30 are arranged according to the type of warpage of the first substrate W1. That is, when the substrate W1 is warped and both left and right edge portions thereof are raised above the flat surface 12, the first pressing member 25 shown in Fig. 12C is employed. This configuration is preferable because it makes it possible to press down the raised edge portions on both left and right sides of the substrate W1.

 基板W1が反っていて、その前後方向両側の縁部が平坦面12から浮いた状態となる場合、図12Dに示す第一の押さえ部材25が採用される。この構成により、基板W1の前後方向両側の浮いている縁部を押さえることが可能となり、好適である。
 以上のように、図12A、図12B、図12C、及び図12Dそれぞれに示す押さえ部材25は、基板W1の縁部(辺)に沿って接触する線状部30を有する。
12D is employed when the substrate W1 is warped and both edge portions in the front-rear direction are raised above the flat surface 12. This configuration is preferable because it makes it possible to press down the raised edge portions in the front-rear direction of the substrate W1.
As described above, the pressing members 25 shown in each of FIGS. 12A, 12B, 12C, and 12D have linear portions 30 that come into contact with the edge (side) of the substrate W1.

〔基板保持装置10の動作について〕
 以上の構成を有する基板保持装置10が行う基板の保持動作について説明する。
 基板保持装置10が、第一の基板W1を保持する場合について説明する。なお、その第一の基板W1に反りが生じている。
 支持ピン15が上位置Puにある状態で(図3参照)、図外の搬送ロボットが、第一の基板W1をステージ11上に搬入し、複数本の支持ピン15の上に載置する。第一の基板W1は支持ピン先端16に載せられる。
[Operation of the substrate holding device 10]
The substrate holding operation performed by the substrate holding device 10 having the above configuration will now be described.
A case will be described in which the substrate holding device 10 holds a first substrate W1, which is warped.
With the support pins 15 in the upper position Pu (see FIG. 3), a transport robot (not shown) carries the first substrate W1 onto the stage 11 and places it on the support pins 15. The first substrate W1 is placed on the tips 16 of the support pins.

 支持ピン15が下位置Pdへ変位すると、第一の基板W1の外周縁W1eは、複数本の外ガイドピン18に複数方向から接触可能であり、第一の基板W1は、複数本の外ガイドピン18により位置決めされながら降下する。支持ピン15が下位置Pdに到達すると(図4参照)、第一の基板W1はステージ11の平坦面12に載る。この状態で、第一の基板W1の反りは、解消されていない。 When the support pins 15 are displaced to the lower position Pd, the outer peripheral edge W1e of the first substrate W1 can come into contact with the multiple outer guide pins 18 from multiple directions, and the first substrate W1 descends while being positioned by the multiple outer guide pins 18. When the support pins 15 reach the lower position Pd (see Figure 4), the first substrate W1 rests on the flat surface 12 of the stage 11. In this state, the warping of the first substrate W1 has not been eliminated.

 図5に示すように、第一の押さえ部材25が退避位置S1から降下すると、その第一の押さえ部材25が第一の基板W1を平坦面12に押す。この際、支持ピン15及び内ガイドピン22は下位置にある。第一の基板W1に反りが生じていたが、その反りは第一の押さえ部材25によって矯正される。ステージ11は第一の基板W1を吸着し保持する。以上より、第一の基板W1は、ステージ11に確実に吸着保持される。 As shown in Figure 5, when the first pressing member 25 descends from the retracted position S1, the first pressing member 25 presses the first substrate W1 onto the flat surface 12. At this time, the support pins 15 and inner guide pins 22 are in the lower position. Any warping that has occurred in the first substrate W1 is corrected by the first pressing member 25. The stage 11 suction-holds the first substrate W1. As a result, the first substrate W1 is securely suction-held on the stage 11.

 基板保持装置10が第一の基板W1を保持した状態で、その第一の基板W1に対して各種の処理が行われる。本実施形態の場合(図1参照)、第一の基板W1(ステージ11)と塗布ヘッド7との相対移動が行われ、塗布ヘッド7から液が吐出され、第一の基板W1に液が塗布される。
 塗布処理が完了すると、ステージ11における第一の基板W1の吸引は停止される。支持ピン15が下位置Pdから上位置Puに移動する。支持ピン15に載る塗布済み(処理済み)の第一の基板W1が、図外の搬送ロボットによって、基板保持装置10の外に搬出される。
Various processes are performed on the first substrate W1 while the substrate holding device 10 holds the first substrate W1. In the present embodiment (see FIG. 1 ), the first substrate W1 (stage 11) and the coating head 7 move relative to each other, and liquid is ejected from the coating head 7 to coat the first substrate W1 with the liquid.
When the coating process is completed, suction of the first substrate W1 on the stage 11 is stopped. The support pins 15 move from the lower position Pd to the upper position Pu. The coated (processed) first substrate W1 placed on the support pins 15 is carried out of the substrate holding device 10 by a transport robot (not shown).

 ステージ11に保持された第一の基板W1に対して処理(例えば、塗布処理)を行う場合、及び、前記処理の後に第一の基板W1をステージ11から搬出する場合に、外ガイドピン18は下位置Qdにあることで(図6参照)、外ガイドピン18が邪魔にならない。 When processing (e.g., coating) the first substrate W1 held on the stage 11, and when the first substrate W1 is removed from the stage 11 after the processing, the outer guide pins 18 are in the lower position Qd (see Figure 6), so they do not get in the way.

 基板保持装置10が、第二の基板W2を保持する場合について説明する。なお、その第二の基板W2に反りが生じている。
 第一の基板W1の場合(図3参照)と同様に、支持ピン15が上位置Puにある状態で、図外の搬送ロボットが、第二の基板W2をステージ11上に搬入し、複数本の支持ピン15の上に載置する。第二の基板W2は支持ピン先端16に載せられる。
A case will be described in which the substrate holding device 10 holds a second substrate W2, which is warped.
As in the case of the first substrate W1 (see FIG. 3), with the support pins 15 in the upper position Pu, a transport robot (not shown) loads the second substrate W2 onto the stage 11 and places it on the support pins 15. The second substrate W2 is placed on the tips 16 of the support pins.

 図9に示すように、内ガイドピン22は、上位置Ruにある。外ガイドピン18は、下位置Qdにある。
 支持ピン15が下位置Pdへ変位すると、第二の基板W2の外周縁W2eは、複数本の内ガイドピン22に複数方向から接触可能であり、第二の基板W2は、複数本の内ガイドピン22により位置決めされながら降下する。支持ピン15が下位置Pdに到達すると(図9参照)、第二の基板W2はステージ11の平坦面12に載る。この状態で、第二の基板W2の反りは、解消されていない。
9, the inner guide pin 22 is in the upper position Ru, and the outer guide pin 18 is in the lower position Qd.
When the support pins 15 are displaced to the lower position Pd, the outer circumferential edge W2e of the second substrate W2 can come into contact with the inner guide pins 22 from multiple directions, and the second substrate W2 descends while being positioned by the inner guide pins 22. When the support pins 15 reach the lower position Pd (see FIG. 9), the second substrate W2 rests on the flat surface 12 of the stage 11. In this state, the warpage of the second substrate W2 has not been eliminated.

 図10に示すように、第二の押さえ部材27が退避位置S1から降下すると、その第二の押さえ部材27が第二の基板W2を平坦面12に押す。この際、支持ピン15は下位置Pdにある。第二の基板W2に反りが生じていたが、その反りは第二の押さえ部材27によって矯正される。ステージ11は第二の基板W2を吸着し保持する。以上より、第二の基板W2は、ステージ11に確実に吸着保持される。 As shown in Figure 10, when the second pressing member 27 descends from the retracted position S1, the second pressing member 27 presses the second substrate W2 onto the flat surface 12. At this time, the support pins 15 are in the lower position Pd. Any warping that has occurred in the second substrate W2 is corrected by the second pressing member 27. The stage 11 suctions and holds the second substrate W2. As a result, the second substrate W2 is securely suctioned and held on the stage 11.

 基板保持装置10が第二の基板W2を保持した状態で、その第二の基板W2に対して各種の処理が行われる。本実施形態の場合(図1参照)、第二の基板W2(ステージ11)と塗布ヘッド7との相対移動が行われ、塗布ヘッド7から液が吐出され、第二の基板W2に液が塗布される。
 塗布処理が完了すると、ステージ11における第二の基板W2の吸引は停止される。支持ピン15が下位置Pdから上位置Puに移動する。支持ピン15に載る塗布済み(処理済み)の第二の基板W2が、図外の搬送ロボットによって、基板保持装置10の外に搬出される。
Various processes are performed on the second substrate W2 while the substrate holding device 10 holds the second substrate W2. In the present embodiment (see FIG. 1 ), the second substrate W2 (stage 11) and the coating head 7 move relative to each other, and liquid is ejected from the coating head 7 to coat the second substrate W2 with the liquid.
When the coating process is completed, suction of the second substrate W2 on the stage 11 is stopped. The support pins 15 move from the lower position Pd to the upper position Pu. The coated (processed) second substrate W2 placed on the support pins 15 is carried out of the substrate holding device 10 by a transport robot (not shown).

 ステージ11に保持された第二の基板W2に対して処理(例えば、塗布処理)を行う場合、及び、前記処理の後に第二の基板W2をステージ11から搬出する場合に、図示しないが、内ガイドピン22及び外ガイドピン18は下位置にあることで、内ガイドピン22及び外ガイドピン18が邪魔にならない。 When processing (e.g., coating) the second substrate W2 held on the stage 11, and when removing the second substrate W2 from the stage 11 after the processing, the inner guide pin 22 and outer guide pin 18 are in a lower position (not shown), so that the inner guide pin 22 and outer guide pin 18 do not get in the way.

〔本実施形態の基板保持装置10について〕
 本実施形態の基板保持装置10は、ステージ11に、第一の基板W1の他に、その第一の基板W1よりも小さい第二の基板W2を保持することが可能となる。第二の基板W2は、第一の基板W1の場合と同様に、支持ピン15に支持され降下すると、内ガイドピン22によって位置決めされる(図9参照)。第二の基板W2は、反りが生じていても、第二の押さえ部材27によって矯正され(図10参照)、ステージ11は、その第二の基板W2を吸着し保持する。基板保持装置10は、輪郭の大きさが異なる二種類の基板について、兼用される。
[Regarding the substrate holding device 10 of this embodiment]
The substrate holding device 10 of this embodiment is capable of holding, on the stage 11, not only the first substrate W1 but also a second substrate W2 that is smaller than the first substrate W1. As with the first substrate W1, the second substrate W2 is supported by the support pins 15 and lowered, and is then positioned by the inner guide pins 22 (see FIG. 9). Even if the second substrate W2 is warped, it is corrected by the second pressing member 27 (see FIG. 10), and the stage 11 suction-holds the second substrate W2. The substrate holding device 10 can be used for two types of substrates with different contour sizes.

〔その他〕
 本実施形態の基板保持装置10は、前記のとおり輪郭の大きさが異なる二種類の基板(W1、W2)について、兼用されるが、一種類の基板のみを保持する構成であってもよい。
 本発明の基板保持装置は、塗布装置5に設けられる以外に、その他の装置に適用可能である。
〔others〕
The substrate holding device 10 of this embodiment is used for two types of substrates (W1, W2) having different contour sizes as described above, but may be configured to hold only one type of substrate.
The substrate holding device of the present invention is not limited to being provided in the coating device 5, but can also be applied to other devices.

 今回開示した実施形態は全ての点で例示であって制限的なものではない。本発明の技術的範囲は前述の実施形態に限定されるものではなく、この技術的範囲には特許請求の範囲に記載された構成と均等の範囲内での全ての変更が含まれる。 The embodiments disclosed herein are illustrative in all respects and are not restrictive. The technical scope of the present invention is not limited to the above-described embodiments, and includes all modifications within the scope of equivalents to the configurations described in the claims.

 10 基板保持装置
 11 ステージ
 12 平坦面
 13 平坦面を有する部分
 14 平坦面の周囲の部分
 15 支持ピン
 16 先端(支持ピン先端)
 18 外ガイドピン
 19 先端(外ピン先端)
 22 内ガイドピン
 23 先端(内ピン先端)
 25 第一の押さえ部材
 27 第二の押さえ部材
 29 凸部
 30 線状部
 39 凸部
 W1 第一の基板
 W1e 外周縁
 W2 第二の基板
 W2e 外周縁
 S1 退避位置
 D1 押さえ位置
 S2 退避位置
 D2 押さえ位置
 Pu 支持ピンの上位置
 Pd 支持ピンの下位置
 Qu 外ガイドピンの上位置
 Qd 外ガイドピンの下位置
 Ru 内ガイドピンの上位置
 Rd 内ガイドピンの下位置
10 Substrate holding device 11 Stage 12 Flat surface 13 Portion having flat surface 14 Portion surrounding flat surface 15 Support pin 16 Tip (support pin tip)
18 outer guide pin 19 tip (outer pin tip)
22 Inner guide pin 23 Tip (inner pin tip)
25 First pressing member 27 Second pressing member 29 Convex portion 30 Linear portion 39 Convex portion W1 First substrate W1e Outer periphery W2 Second substrate W2e Outer periphery S1 Retracted position D1 Pressing position S2 Retracted position D2 Pressing position Pu Upper position of support pin Pd Lower position of support pin Qu Upper position of outer guide pin Qd Lower position of outer guide pin Ru Upper position of inner guide pin Rd Lower position of inner guide pin

Claims (8)

 基板が載る平坦面を有し前記基板を吸着可能であるステージと、
 前記ステージのうちの前記平坦面を有する部分に配置され前記基板が載る先端を有する複数本の支持ピンと、
 前記ステージのうちの前記平坦面の周囲の部分に配置されている複数本の外ガイドピンと、
 前記平坦面の上方の退避位置から降下可能である押さえ部材と、
 を有し、
 前記支持ピンは、前記先端が前記平坦面から上に突出する上位置と、前記先端が前記平坦面よりも下となる下位置と、の間を変位可能であり、
 前記複数本の外ガイドピンは、前記下位置へ変位する前記支持ピンに載る前記基板の外周縁に、複数方向から接触可能となるように配置され、
 前記押さえ部材は、前記退避位置から降下して、前記支持ピンが前記下位置にある状態で前記基板を前記平坦面に押す、
 基板保持装置。
a stage having a flat surface on which a substrate can be placed and capable of adsorbing the substrate;
a plurality of support pins arranged in the portion of the stage having the flat surface and having tips on which the substrate rests;
a plurality of outer guide pins arranged around the flat surface of the stage;
a pressing member that can be lowered from a retracted position above the flat surface;
and
the support pin is displaceable between an upper position where the tip protrudes above the flat surface and a lower position where the tip is below the flat surface,
the plurality of outer guide pins are arranged so as to be able to contact, from a plurality of directions, the outer periphery of the substrate placed on the support pins displaced to the lower position;
the pressing member descends from the retracted position and presses the substrate against the flat surface with the support pins in the lower position;
Substrate holding device.
 前記複数本の外ガイドピンよりも前記平坦面の中央側の部分に配置されている複数本の内ガイドピンと、
 前記平坦面の上方の退避位置から降下可能である第二の押さえ部材と、
 を有し、
 前記複数本の支持ピンは、前記基板よりも小さい第二の基板を支持可能とするように前記平坦面を有する部分に配置され、
 前記複数本の内ガイドピンは、その先端が前記平坦面から上に突出する上位置と、その先端が前記平坦面よりも下となる下位置と、の間を変位可能であり、
 前記複数本の内ガイドピンは、前記下位置へ変位する前記支持ピンに載る前記第二の基板の外周縁に、複数方向から接触可能となるように配置され、
 前記第二の押さえ部材は、前記退避位置から降下して、前記支持ピンが前記下位置にある状態で前記第二の基板を前記平坦面に押す、
 請求項1に記載の基板保持装置。
a plurality of inner guide pins arranged in a portion closer to the center of the flat surface than the plurality of outer guide pins;
a second pressing member that can be lowered from a retracted position above the flat surface;
and
the plurality of support pins are arranged in the portion having the flat surface so as to be able to support a second substrate smaller than the substrate;
the plurality of inner guide pins are displaceable between an upper position where their tips protrude above the flat surface and a lower position where their tips are below the flat surface,
the plurality of inner guide pins are arranged so as to be able to contact, from a plurality of directions, an outer circumferential edge of the second substrate placed on the support pins displaced to the lower position;
the second pressing member descends from the retracted position and presses the second substrate against the flat surface with the support pins in the lower position;
The substrate holding device according to claim 1 .
 前記外ガイドピンは、先細りとなる先端を有する、
 請求項1又は請求項2に記載の基板保持装置。
The outer guide pin has a tapered tip.
3. The substrate holding device according to claim 1 or 2.
 前記内ガイドピンは、先細りとなる先端を有する、
 請求項2に記載の基板保持装置。
The inner guide pin has a tapered tip.
The substrate holding device according to claim 2 .
 前記押さえ部材は、前記基板に部分的に接触するための凸部を有する、
 請求項1又は請求項2に記載の基板保持装置。
The pressing member has a protrusion for partially contacting the substrate.
3. The substrate holding device according to claim 1 or 2.
 前記凸部は、前記基板側に向かって断面輪郭形状が小さくなる形状を有する、
 請求項5に記載の基板保持装置。
The convex portion has a cross-sectional contour shape that becomes smaller toward the substrate side.
The substrate holding device according to claim 5 .
 前記押さえ部材は、前記基板の縁部に沿って接触する線状部を有する、
 請求項1又は請求項2に記載の基板保持装置。
The pressing member has a linear portion that contacts the edge of the substrate.
3. The substrate holding device according to claim 1 or 2.
 前記外ガイドピンは、その先端が前記平坦面から上に突出する上位置と、その先端が前記平坦面よりも下となる下位置と、の間を変位可能である、
 請求項1又は請求項2に記載の基板保持装置。
The outer guide pin is displaceable between an upper position where its tip protrudes above the flat surface and a lower position where its tip is below the flat surface.
3. The substrate holding device according to claim 1 or 2.
PCT/JP2025/008419 2024-03-26 2025-03-07 Substrate holding device Pending WO2025204743A1 (en)

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Citations (5)

* Cited by examiner, † Cited by third party
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JPH08274148A (en) * 1995-01-30 1996-10-18 Sony Corp Base fixing device and base fixing method
JP2008198739A (en) * 2007-02-09 2008-08-28 Tokyo Electron Ltd Placing table structure, treating apparatus using this structure, and method for using this apparatus
JP2009187990A (en) * 2008-02-01 2009-08-20 Tokyo Electron Ltd Plasma processing apparatus
WO2013039080A1 (en) * 2011-09-16 2013-03-21 住友重機械工業株式会社 Substrate manufacturing device
JP2021093479A (en) * 2019-12-12 2021-06-17 株式会社Screenホールディングス Cooling device, cooling method and manufacturing method of semiconductor package

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08274148A (en) * 1995-01-30 1996-10-18 Sony Corp Base fixing device and base fixing method
JP2008198739A (en) * 2007-02-09 2008-08-28 Tokyo Electron Ltd Placing table structure, treating apparatus using this structure, and method for using this apparatus
JP2009187990A (en) * 2008-02-01 2009-08-20 Tokyo Electron Ltd Plasma processing apparatus
WO2013039080A1 (en) * 2011-09-16 2013-03-21 住友重機械工業株式会社 Substrate manufacturing device
JP2021093479A (en) * 2019-12-12 2021-06-17 株式会社Screenホールディングス Cooling device, cooling method and manufacturing method of semiconductor package

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