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WO2025203871A1 - Method for producing lithium-containing silicon oxide - Google Patents

Method for producing lithium-containing silicon oxide

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Publication number
WO2025203871A1
WO2025203871A1 PCT/JP2024/042315 JP2024042315W WO2025203871A1 WO 2025203871 A1 WO2025203871 A1 WO 2025203871A1 JP 2024042315 W JP2024042315 W JP 2024042315W WO 2025203871 A1 WO2025203871 A1 WO 2025203871A1
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Prior art keywords
lithium
silicon oxide
containing silicon
powder
raw material
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PCT/JP2024/042315
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French (fr)
Japanese (ja)
Inventor
彩恵子 西本
浩樹 竹下
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Osaka Titanium Technologies Co Ltd
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Osaka Titanium Technologies Co Ltd
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Publication of WO2025203871A1 publication Critical patent/WO2025203871A1/en
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    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00Silicon; Compounds thereof
    • C01B33/113Silicon oxides; Hydrates thereof
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01MPROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
    • H01M4/00Electrodes
    • H01M4/02Electrodes composed of, or comprising, active material
    • H01M4/36Selection of substances as active materials, active masses, active liquids
    • H01M4/48Selection of substances as active materials, active masses, active liquids of inorganic oxides or hydroxides

Definitions

  • the present invention relates to a method for producing lithium (Li)-containing silicon oxide, which is used as a negative electrode material for lithium-ion secondary batteries, etc.
  • One method for producing lithium-containing silicon oxide which is used as a negative electrode material in lithium-ion secondary batteries, is the method disclosed in JP 2021-051904 A. This method produces lithium-containing silicon oxide by heating a silicon/lithium silicate-containing raw material under reduced pressure to generate gases from the raw material, cooling the gases at a predetermined temperature, and powdering the resulting precipitate.
  • the manufacturing method of lithium-containing silicon oxide used as the negative electrode material of lithium-ion secondary batteries includes a step (pulverization step) of pulverizing (powdering) the lithium-containing silicon oxide obtained by calcination.
  • a step (pulverization step) of pulverizing (powdering) the lithium-containing silicon oxide obtained by calcination includes a step (pulverization step) of pulverizing (powdering) the lithium-containing silicon oxide obtained by calcination.
  • pulverization step By classifying the lithium-containing silicon oxide powder obtained in this pulverization step, lithium-containing silicon oxide powder (fine powder) having the desired median diameter (D50), lithium-containing silicon oxide powder (coarse powder) having a median diameter (D50) larger than that of the fine powder, and lithium-containing silicon oxide powder (extra-fine powder) having a median diameter (D50) smaller than that of the fine powder can be obtained.
  • the coarse powder is often returned to the pulverization step and reused.
  • extra-fine powder has problems such as a higher oxygen content than fine or coarse powders, a tendency for impurities from the pulverizer to be mixed in (high surface impurity content), and the generation of excessive decomposition products with the electrolyte during charge/discharge reactions within the battery.
  • extra-fine powder is used as the negative electrode material, either directly or mixed with fine powder, to fabricate a lithium-ion secondary battery, the performance of the battery may be reduced.
  • conventional methods for producing lithium-containing silicon oxide have had the problem of producing excessively fine powder, resulting in a reduced yield of the resulting lithium-containing silicon oxide.
  • the object of the present invention is to provide a method for producing lithium-containing silicon oxide that can improve the yield during the production of lithium-containing silicon oxide.
  • the method for producing lithium-containing silicon oxide according to the present invention comprises a reaction step in which a silicon/lithium silicate-containing raw material (gas-generating raw material) containing silicon powder and lithium silicate is vaporized and reacted. It also comprises a precipitation step in which the gas generated in the reaction step is cooled and precipitated. It further comprises a pulverization step in which the precipitate obtained in the precipitation step is recovered and pulverized to obtain lithium-containing silicon oxide powder. It also comprises a reuse step in which the ultrafine lithium-containing silicon oxide powder obtained in the pulverization step is reused in the reaction step.
  • the ultrafine lithium-containing silicon oxide powder obtained in the pulverization process is reused in the reaction process. This improves the yield during the production of lithium-containing silicon oxide.
  • the median diameter (D50) of the ultrafine lithium-containing silicon oxide powder obtained in the pulverization step is less than 5 ⁇ m.
  • the recycling step further includes a silicon (Si) powder supply step for supplying silicon (Si) powder.
  • silicon powder is supplied (mixed) when the surface-oxidized ultrafine powder is reused as a synthesis raw material (gas-generating raw material) in the reaction process. This makes it possible to improve the reaction rate in the reaction process in which the ultrafine powder is reused.
  • FIG. 1 is a schematic diagram of a lithium-containing silicon oxide manufacturing apparatus according to an embodiment of the present invention.
  • Vapor deposition apparatus 110 Crucible 120 Heater 130 Vapor deposition drum 141 Scraper 143 Particle guide 150 Chamber 151 Chamber main body 152 Recovery section 153 Exhaust pipe 160 Raw material supply hopper 170 Raw material introduction pipe 180 Recovery container 190 Recovery pipe Gg Gas guide OP Opening RM Deposition chamber Sr Molten metal VL1 First valve VL2 Second valve
  • a method for producing lithium-containing silicon oxide includes a reaction step in which a silicon/lithium silicate-containing raw material (gas-generating raw material) containing silicon powder and lithium silicate is vaporized and reacted.
  • the gas-generating raw material such as the silicon/lithium silicate-containing raw material, is heated under reduced pressure in a reaction vessel to generate raw material gas from the silicon and lithium silicate in the raw material.
  • the method for producing lithium-containing silicon oxide according to an embodiment of the present invention includes a deposition step in which the gas generated in the reaction step is cooled and deposited.
  • the mixed gas (reaction gas) obtained by mixing and reacting the gases generated from the gas-generating raw materials in the reaction step described above is cooled and deposited on the surface of a deposition table located outside the reaction vessel.
  • the method for producing lithium-containing silicon oxide according to an embodiment of the present invention includes a pulverization step in which the precipitate obtained in the precipitation step is recovered and pulverized to obtain lithium-containing silicon oxide powder.
  • the lithium-containing silicon oxide obtained in the precipitation step is pulverized using a pulverizer such as a bead mill.
  • the lithium-containing silicon oxide powder obtained by pulverization using the pulverizer is then classified into fine powder, coarse powder, and ultrafine powder. Pulverization and classification may be performed simultaneously using a pulverizer or the like equipped with a classification function.
  • lithium-containing silicon oxide powder having a median diameter (D50) of 5 ⁇ m or more and 10 ⁇ m or less as fine powder, and lithium-containing silicon oxide powder having a median diameter (D50) of less than 5 ⁇ m as ultrafine powder. Furthermore, lithium-containing silicon oxide powder (coarse powder) having a median diameter (D50) of more than 10 ⁇ m is pulverized again (reused) in the pulverization step. Therefore, coarse particles do not affect the yield of the entire process.
  • the method for producing lithium-containing silicon oxide according to an embodiment of the present invention further includes a recycling step in which the ultra-fine lithium-containing silicon oxide powder obtained in the above-mentioned pulverization step is reused in the reaction step.
  • the ultra-fine lithium-containing silicon oxide powder obtained in the pulverization step is reused as a gas-generating raw material in the reaction step.
  • the ultra-fine lithium-containing silicon oxide powder is supplied into a reaction vessel. Then, in the reaction vessel, the ultra-fine lithium-containing silicon oxide powder is heated under reduced pressure.
  • the lithium silicate contained in the lithium-containing silicon oxide powder has a low melting point
  • the reaction temperature in the reaction step is adjusted according to the melting point of the lithium silicate contained in the lithium-containing silicon oxide powder (for example, about 1030 °C for Li2Si2O5 , or about 1200° C for Li2SiO3 ).
  • the recycling step preferably further comprises a silicon (Si) powder supplying step for supplying silicon (Si) powder.
  • the silicon (Si) powder supplied is preferably mixed with the silicon (Si) powder in the ultrafine powder of the lithium-containing silicon oxide powder recycled in the recycling step described above at a molar ratio of 1/10 or less to prepare a mixed powder (gas generating raw material).
  • the lower limit of this molar ratio is not particularly limited as long as it does not impair the gist of the present invention, but if a lower limit is to be imposed, it is preferable that the value be 1/20.
  • the prepared mixed powder (gas generating raw material) is supplied into a reaction vessel.
  • Fig. 1 is a diagram showing an example of the configuration of a lithium-containing silicon oxide production apparatus.
  • the vapor deposition apparatus 100 will be described, and then the above-mentioned production method will be described.
  • the vapor deposition apparatus 100 is mainly composed of a crucible 110, a heater 120, a vapor deposition drum 130, a scraper 141, a particle guide 143, a chamber 150, a raw material supply hopper 160, a raw material introduction pipe 170, a recovery container 180, a first valve VL1, and a second valve VL2.
  • the crucible 110 is a heat-resistant container with an opening in the center of the top wall, and is installed in the chamber 150.
  • a through-hole (not shown) is formed in one location on the periphery of the top wall of the crucible 110, and a raw material introduction pipe 170 is inserted into this through-hole. That is, raw material in the raw material supply hopper 160 is supplied to the crucible 110 through the raw material introduction pipe 170.
  • a gas guide Gg is also disposed above the top wall of the crucible 110. This gas guide Gg is a component that guides the raw material gas generated in the crucible 110 to the evaporation drum 130, and as shown in FIG. 1, is installed on the upper surface of the top wall so as to surround the center of the top wall.
  • the temperature inside the deposition chamber RM is preferably in the range of 1000°C or higher and 1600°C or lower, more preferably in the range of 1100°C or higher and 1500°C or lower, and particularly preferably in the range of 1200°C or higher and lower than 1400°C.

Landscapes

  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Battery Electrode And Active Subsutance (AREA)
  • Silicon Compounds (AREA)

Abstract

The present invention addresses the problem of providing a method for producing lithium-containing silicon oxide, the method making it possible to improve the yield in the production of the lithium-containing silicon oxide. This method for producing lithium-containing silicon oxide includes a reaction step in which a silicon- and lithium-silicate-containing raw material, which comprises a silicon powder and lithium silicate, is vaporized and reacted. The method further includes a precipitation step in which a gas produced in the reaction step is cooled to cause precipitation. The method furthermore includes a pulverization step in which the precipitate obtained in the precipitation step is collected and pulverized to obtain a powder of lithium-containing silicon oxide. The method furthermore includes a recycle step in which an excessively finely pulverized portion of the powder of lithium-containing silicon oxide obtained in the pulverization step is recycled to the reaction step.

Description

リチウム含有酸化ケイ素の製造方法Method for producing lithium-containing silicon oxide

 本発明は、リチウムイオン二次電池の負極材料等に使用されるリチウム(Li)含有酸化ケイ素の製造方法に関する。 The present invention relates to a method for producing lithium (Li)-containing silicon oxide, which is used as a negative electrode material for lithium-ion secondary batteries, etc.

 リチウムイオン二次電池の負極材料等に使用されるリチウム含有酸化ケイ素の製造方法の一つとして、特開2021-051904号公報に開示された方法が挙げられる。これは、ケイ素・ケイ酸リチウム含有原料を減圧加熱して、当該原料からガスを発生させ、それらのガスを所定の温度で冷却して得られた析出物を粉末化することでリチウム含有酸化ケイ素を製造する方法である。 One method for producing lithium-containing silicon oxide, which is used as a negative electrode material in lithium-ion secondary batteries, is the method disclosed in JP 2021-051904 A. This method produces lithium-containing silicon oxide by heating a silicon/lithium silicate-containing raw material under reduced pressure to generate gases from the raw material, cooling the gases at a predetermined temperature, and powdering the resulting precipitate.

特開2021-051904Patent Publication No. 2021-051904

 ところで、上述のようなリチウムイオン二次電池の負極材料等に使用されるリチウム含有酸化ケイ素の製造方法において、焼成により得られたリチウム含有酸化ケイ素を粉砕(粉末化)する工程(粉砕工程)が設けられている。この粉砕工程により得られたリチウム含有酸化ケイ素粉末を分級することで、狙いのメディアン径(D50)を有するリチウム含有酸化ケイ素粉末(微粉)、微粉よりも大きなメディアン径(D50)を有するリチウム含有酸化ケイ素粉末(粗粉)、微粉よりも小さなメディアン径(D50)を有するリチウム含有酸化ケイ素粉末(過微粉)が得られる。この場合、粗粉については再び粉砕工程に戻して再利用される場合が多い。しかし、過微粉は、その表面積の大きさから微粉や粗粉に比べて酸素含有量が高いこと、粉砕機由来の不純物が混入しやすいこと(表面不純物含有量が多いこと)、電池内での充放電反応時に電解液との分解生成物を過剰に生成させてしまうと言った問題がある。このため、過微粉を、そのまま若しくは微粉に混ぜて負極材料として使用し、リチウムイオン二次電池を作製すると、その電池の性能が低下してしまう場合がある。このため、従来のリチウム含有酸化ケイ素の製造方法では、過微粉が生成されることにより、得られるリチウム含有酸化ケイ素の歩留まりが低下するという問題が生じていた。 Incidentally, the manufacturing method of lithium-containing silicon oxide used as the negative electrode material of lithium-ion secondary batteries, as described above, includes a step (pulverization step) of pulverizing (powdering) the lithium-containing silicon oxide obtained by calcination. By classifying the lithium-containing silicon oxide powder obtained in this pulverization step, lithium-containing silicon oxide powder (fine powder) having the desired median diameter (D50), lithium-containing silicon oxide powder (coarse powder) having a median diameter (D50) larger than that of the fine powder, and lithium-containing silicon oxide powder (extra-fine powder) having a median diameter (D50) smaller than that of the fine powder can be obtained. In this case, the coarse powder is often returned to the pulverization step and reused. However, due to its large surface area, extra-fine powder has problems such as a higher oxygen content than fine or coarse powders, a tendency for impurities from the pulverizer to be mixed in (high surface impurity content), and the generation of excessive decomposition products with the electrolyte during charge/discharge reactions within the battery. For this reason, if extra-fine powder is used as the negative electrode material, either directly or mixed with fine powder, to fabricate a lithium-ion secondary battery, the performance of the battery may be reduced. For this reason, conventional methods for producing lithium-containing silicon oxide have had the problem of producing excessively fine powder, resulting in a reduced yield of the resulting lithium-containing silicon oxide.

 本発明の課題は、リチウム含有酸化ケイ素の製造時における歩留まりを向上させることができるリチウム含有酸化ケイ素の製造方法を提供することである。 The object of the present invention is to provide a method for producing lithium-containing silicon oxide that can improve the yield during the production of lithium-containing silicon oxide.

 本発明に係るリチウム含有酸化ケイ素の製造方法は、ケイ素粉末とケイ酸リチウムとを含むケイ素・ケイ酸リチウム含有原料(ガス発生原料)を気化させて反応させる反応工程を備える。また、反応工程で発生した気体を冷却して析出させる析出工程を備える。さらに、析出工程で得られた析出物を回収し、その析出物を粉砕してリチウム含有酸化ケイ素粉末を得る粉砕工程を備える。そして、粉砕工程により得られた過微粉のリチウム含有酸化ケイ素粉末を反応工程に再利用する再利用工程をさらに備える。 The method for producing lithium-containing silicon oxide according to the present invention comprises a reaction step in which a silicon/lithium silicate-containing raw material (gas-generating raw material) containing silicon powder and lithium silicate is vaporized and reacted. It also comprises a precipitation step in which the gas generated in the reaction step is cooled and precipitated. It further comprises a pulverization step in which the precipitate obtained in the precipitation step is recovered and pulverized to obtain lithium-containing silicon oxide powder. It also comprises a reuse step in which the ultrafine lithium-containing silicon oxide powder obtained in the pulverization step is reused in the reaction step.

 このリチウム含有酸化ケイ素の製造方法では、粉砕工程により得られた過微粉のリチウム含有酸化ケイ素粉末が反応工程で再利用される。このため、リチウム含有酸化ケイ素の製造時における歩留まりを向上させることができる。 In this method for producing lithium-containing silicon oxide, the ultrafine lithium-containing silicon oxide powder obtained in the pulverization process is reused in the reaction process. This improves the yield during the production of lithium-containing silicon oxide.

 また、本発明に係るリチウム含有酸化ケイ素の製造方法において、粉砕工程により得られた過微粉のリチウム含有酸化ケイ素粉末のメディアン径(D50)が5μm未満であることが好適である。 Furthermore, in the method for producing lithium-containing silicon oxide according to the present invention, it is preferable that the median diameter (D50) of the ultrafine lithium-containing silicon oxide powder obtained in the pulverization step is less than 5 μm.

 さらに、本発明に係るリチウム含有酸化ケイ素の製造方法では、上述の再利用工程において、ケイ素(Si)粉末を供給するケイ素(Si)粉末供給工程をさらに備えることが好適である。 Furthermore, in the method for producing lithium-containing silicon oxide according to the present invention, it is preferable that the recycling step further includes a silicon (Si) powder supply step for supplying silicon (Si) powder.

 このリチウム含有酸化ケイ素の製造方法では、反応工程において、表面酸化が進行した過微粉を合成原料(ガス発生原料)として再利用する際に、ケイ素粉末が供給(混合)される。このため、過微粉を再利用した反応工程における反応率を向上させることができる。 In this method for producing lithium-containing silicon oxide, silicon powder is supplied (mixed) when the surface-oxidized ultrafine powder is reused as a synthesis raw material (gas-generating raw material) in the reaction process. This makes it possible to improve the reaction rate in the reaction process in which the ultrafine powder is reused.

本発明の実施の形態に係るリチウム含有酸化ケイ素の製造装置の概略図である。1 is a schematic diagram of a lithium-containing silicon oxide manufacturing apparatus according to an embodiment of the present invention.

100   蒸着装置
110   ルツボ
120   ヒータ
130   蒸着ドラム
141   スクレーパ
143   粒体ガイド
150   チャンバ
151   チャンバ本体部
152   回収部
153   排気管
160   原料供給ホッパ
170   原料導入管
180   回収容器
190   回収管
Gg    ガスガイド
OP    開口
RM    析出室
Sr    溶湯
VL1   第1バルブ
VL2   第2バルブ
100 Vapor deposition apparatus 110 Crucible 120 Heater 130 Vapor deposition drum 141 Scraper 143 Particle guide 150 Chamber 151 Chamber main body 152 Recovery section 153 Exhaust pipe 160 Raw material supply hopper 170 Raw material introduction pipe 180 Recovery container 190 Recovery pipe Gg Gas guide OP Opening RM Deposition chamber Sr Molten metal VL1 First valve VL2 Second valve

 本発明の実施の形態に係るリチウム含有酸化ケイ素の製造方法は、ケイ素粉末とケイ酸リチウムとを含むケイ素・ケイ酸リチウム含有原料(ガス発生原料)を気化させて反応させる反応工程を備える。この工程では、反応容器内でケイ素・ケイ酸リチウム含有原料等のガス発生原料を減圧下で加熱することにより、原料中のケイ素、ケイ酸リチウムから原料ガスを発生させる。 A method for producing lithium-containing silicon oxide according to an embodiment of the present invention includes a reaction step in which a silicon/lithium silicate-containing raw material (gas-generating raw material) containing silicon powder and lithium silicate is vaporized and reacted. In this step, the gas-generating raw material, such as the silicon/lithium silicate-containing raw material, is heated under reduced pressure in a reaction vessel to generate raw material gas from the silicon and lithium silicate in the raw material.

 また、本発明の実施の形態に係るリチウム含有酸化ケイ素の製造方法は、反応工程で発生した気体を冷却して析出させる析出工程を備える。この工程では、上述の反応工程においてガス発生原料から発生させたガスが混合・反応した混合ガス(反応ガス)を反応容器外部に配置された蒸着台の表面で冷却し析出させる。 Furthermore, the method for producing lithium-containing silicon oxide according to an embodiment of the present invention includes a deposition step in which the gas generated in the reaction step is cooled and deposited. In this step, the mixed gas (reaction gas) obtained by mixing and reacting the gases generated from the gas-generating raw materials in the reaction step described above is cooled and deposited on the surface of a deposition table located outside the reaction vessel.

 さらに、本発明の実施の形態に係るリチウム含有酸化ケイ素の製造方法は、析出工程で得られた析出物を回収し、その析出物を粉砕してリチウム含有酸化ケイ素粉末を得る粉砕工程を備える。この工程では、上述の析出工程により得られたリチウム含有酸化ケイ素をビーズミル等の粉砕機により粉砕する。そして、この工程では、同粉砕機により粉砕して得られたリチウム含有酸化ケイ素粉末を微粉、粗粉および過微粉等に分級する。なお、このとき、分級機能が設けられている粉砕機等を用いることにより、粉砕と分級を同時に行ってもよい。なお、本発明に係るリチウム含有酸化ケイ素の製造方法においては、メディアン径(D50)が5μm以上10μm以下の範囲内であるリチウム含有酸化ケイ素粉末を微粉と、メディアン径(D50)が5μm未満であるリチウム含有酸化ケイ素粉末を過微粉として分級することが好ましい。また、メディアン径(D50)が10μm超のリチウム含有酸化ケイ素粉末(粗粉)は、再度粉砕工程で粉砕(再利用)される。このため、粗粉は工程全体の歩留まりには影響を与えるものではない。 Furthermore, the method for producing lithium-containing silicon oxide according to an embodiment of the present invention includes a pulverization step in which the precipitate obtained in the precipitation step is recovered and pulverized to obtain lithium-containing silicon oxide powder. In this step, the lithium-containing silicon oxide obtained in the precipitation step is pulverized using a pulverizer such as a bead mill. The lithium-containing silicon oxide powder obtained by pulverization using the pulverizer is then classified into fine powder, coarse powder, and ultrafine powder. Pulverization and classification may be performed simultaneously using a pulverizer or the like equipped with a classification function. In the method for producing lithium-containing silicon oxide according to the present invention, it is preferable to classify lithium-containing silicon oxide powder having a median diameter (D50) of 5 μm or more and 10 μm or less as fine powder, and lithium-containing silicon oxide powder having a median diameter (D50) of less than 5 μm as ultrafine powder. Furthermore, lithium-containing silicon oxide powder (coarse powder) having a median diameter (D50) of more than 10 μm is pulverized again (reused) in the pulverization step. Therefore, coarse particles do not affect the yield of the entire process.

 本発明の実施の形態に係るリチウム含有酸化ケイ素の製造方法は、上述の粉砕工程により得られた過微粉のリチウム含有酸化ケイ素粉末を反応工程に再利用する再利用工程をさらに備える。この工程では、粉砕工程において得られたリチウム含有酸化ケイ素粉末の過微粉が、反応工程におけるガス発生原料として再利用される。このとき、同過微粉は、反応容器内に供給される。そして、反応容器内において、同過微粉は減圧下で加熱される。 The method for producing lithium-containing silicon oxide according to an embodiment of the present invention further includes a recycling step in which the ultra-fine lithium-containing silicon oxide powder obtained in the above-mentioned pulverization step is reused in the reaction step. In this step, the ultra-fine lithium-containing silicon oxide powder obtained in the pulverization step is reused as a gas-generating raw material in the reaction step. At this time, the ultra-fine lithium-containing silicon oxide powder is supplied into a reaction vessel. Then, in the reaction vessel, the ultra-fine lithium-containing silicon oxide powder is heated under reduced pressure.

 また、リチウム含有酸化ケイ素粉末中に含まれるケイ酸リチウムは融点が低いため、反応工程における反応温度をケイ酸リチウムの融点以上とすることで、反応容器内におけるリチウム含有酸化ケイ素粉末の過微粉の少なくとも一部を溶融状態とすることができる。これにより、同過微粉が反応容器内に供給された際に、同過微粉が加熱されることにより発生する原料ガス(あるいは、反応ガス)に、同過微粉が舞い上げられて、同過微粉が反応容器外部に配置された蒸着台の表面に析出した析出物(蒸着物)に混入してしまうことを防ぐことができる。なお、反応温度は、リチウム含有酸化ケイ素粉末中に含まれケイ酸リチウムの融点(例えば、LiSiであれば約1030℃、LiSiOであれば約1200℃)に応じて調整する。 Furthermore, since the lithium silicate contained in the lithium-containing silicon oxide powder has a low melting point, by setting the reaction temperature in the reaction step to be equal to or higher than the melting point of the lithium silicate, at least a portion of the ultrafine powder of the lithium-containing silicon oxide powder in the reaction vessel can be melted. This prevents the ultrafine powder from being blown up by the raw material gas (or reaction gas) generated by heating the ultrafine powder when supplied to the reaction vessel, and from being mixed into the deposit (deposit) deposited on the surface of the deposition table located outside the reaction vessel. The reaction temperature is adjusted according to the melting point of the lithium silicate contained in the lithium-containing silicon oxide powder (for example, about 1030 °C for Li2Si2O5 , or about 1200° C for Li2SiO3 ).

 本発明の実施の形態に係るリチウム含有酸化ケイ素の製造方法では、上述の再利用工程において、ケイ素(Si)粉末を供給するケイ素(Si)粉末供給工程をさらに備えることが好ましい。また、このケイ素(Si)粉末供給工程において、供給されるケイ素(Si)粉末は、上述の再利用工程において再利用されるリチウム含有酸化ケイ素粉末の過微粉中のケイ素(Si)に対し、モル比が1/10以下となるように混合して混合粉末(ガス発生原料)を調製することが好ましい。また、このモル比の下限値は、本発明の主旨を損なわない限り特に制限されないが、強いて下限値を設けるならば、その値は1/20であることが好ましい。この場合において、調製された混合粉末(ガス発生原料)は、反応容器内に供給される。 In the method for producing lithium-containing silicon oxide according to an embodiment of the present invention, the recycling step preferably further comprises a silicon (Si) powder supplying step for supplying silicon (Si) powder. Furthermore, in this silicon (Si) powder supplying step, the silicon (Si) powder supplied is preferably mixed with the silicon (Si) powder in the ultrafine powder of the lithium-containing silicon oxide powder recycled in the recycling step described above at a molar ratio of 1/10 or less to prepare a mixed powder (gas generating raw material). Furthermore, the lower limit of this molar ratio is not particularly limited as long as it does not impair the gist of the present invention, but if a lower limit is to be imposed, it is preferable that the value be 1/20. In this case, the prepared mixed powder (gas generating raw material) is supplied into a reaction vessel.

 以下、本発明の実施の形態に係るリチウム含有酸化ケイ素の製造方法を実施するための一例を、図1を参照しながら説明する。 Below, an example of a method for implementing a method for producing lithium-containing silicon oxide according to an embodiment of the present invention will be described with reference to Figure 1.

(リチウム含有酸化ケイ素の製造方法について)
 本発明の実施の形態に係るリチウム含有酸化ケイ素の製造方法は、図1に示されるような蒸着装置100を用いて実施することができる。なお、図1は、リチウム含有酸化ケイ素の製造装置の構成例を示す図である。以下、この蒸着装置100を説明した後で、上述の製造方法について説明する。
(Regarding the method for producing lithium-containing silicon oxide)
The method for producing lithium-containing silicon oxide according to the embodiment of the present invention can be carried out using a vapor deposition apparatus 100 as shown in Fig. 1. Fig. 1 is a diagram showing an example of the configuration of a lithium-containing silicon oxide production apparatus. Hereinafter, the vapor deposition apparatus 100 will be described, and then the above-mentioned production method will be described.

 蒸着装置100は、図1に示されるように、主に、ルツボ110、ヒータ120、蒸着ドラム130、スクレーパ141、粒体ガイド143、チャンバ150、原料供給ホッパ160、原料導入管170、回収容器180、第1バルブVL1および第2バルブVL2から構成されている。 As shown in Figure 1, the vapor deposition apparatus 100 is mainly composed of a crucible 110, a heater 120, a vapor deposition drum 130, a scraper 141, a particle guide 143, a chamber 150, a raw material supply hopper 160, a raw material introduction pipe 170, a recovery container 180, a first valve VL1, and a second valve VL2.

 ルツボ110は、図1に示されるように天壁の中央部分が開口する耐熱容器であって、チャンバ150に設置されている。また、このルツボ110の天壁の周囲部の一箇所に貫通孔(図示せず)が形成されており、この貫通孔には原料導入管170が挿通されている。すなわち、原料供給ホッパ160内の原料は、原料導入管170を通ってルツボ110に供給されている。また、このルツボ110の天壁の上側には、ガスガイドGgが配設されている。このガスガイドGgは、ルツボ110で発生する原料ガスを蒸着ドラム130に導く部材であって、図1に示される通り、天壁の中央部分を囲むように天壁の上面に設置されている。 As shown in FIG. 1, the crucible 110 is a heat-resistant container with an opening in the center of the top wall, and is installed in the chamber 150. A through-hole (not shown) is formed in one location on the periphery of the top wall of the crucible 110, and a raw material introduction pipe 170 is inserted into this through-hole. That is, raw material in the raw material supply hopper 160 is supplied to the crucible 110 through the raw material introduction pipe 170. A gas guide Gg is also disposed above the top wall of the crucible 110. This gas guide Gg is a component that guides the raw material gas generated in the crucible 110 to the evaporation drum 130, and as shown in FIG. 1, is installed on the upper surface of the top wall so as to surround the center of the top wall.

 ヒータ120は、ルツボ110を高温加熱するためのものであって、ルツボ110の外周を取り込むように配設されている。 The heater 120 is used to heat the crucible 110 to high temperatures and is arranged to surround the outer periphery of the crucible 110.

 蒸着ドラム130は、例えば、円筒形状の水平ドラムであって、図1に示されるように、ルツボ110の天壁の開口OPの上方に配設されており、その下部がガスガイドGgに囲まれている。そして、この蒸着ドラム130は、図示されない駆動機構により一方向に回転駆動される。なお、この蒸着ドラム130には、外周面を一定温度に保つための温度調節器(図示せず)が設けられている。この温度調節器は、外部から供給される冷却媒体により、蒸着ドラム130の外周面温度を、蒸着源ガスの蒸着に適した温度に冷却する。また、蒸着ドラム130の外周面温度は、蒸着ドラム上に残った析出物の上に堆積する析出物の結晶性に影響を与え得る。この温度が低すぎると、析出物の組織構造が疎になりすぎるおそれがあり、反対に高すぎると不均化反応による結晶成長が進行するおそれがある。なお、この温度は、900℃以下であることが望ましく、150℃以上800℃以下の範囲内であることがより望ましく、150℃以上700℃以下の範囲内であることが特に望ましい。 The evaporation drum 130 is, for example, a cylindrical horizontal drum, and as shown in FIG. 1, is disposed above the opening OP in the top wall of the crucible 110, with its lower portion surrounded by a gas guide Gg. The evaporation drum 130 is driven to rotate in one direction by a drive mechanism (not shown). The evaporation drum 130 is also provided with a temperature regulator (not shown) for maintaining a constant temperature on its outer periphery. This temperature regulator uses an externally supplied cooling medium to cool the temperature of the outer periphery of the evaporation drum 130 to a temperature suitable for evaporating the evaporation source gas. The temperature of the outer periphery of the evaporation drum 130 can also affect the crystallinity of the precipitate that accumulates on the precipitate remaining on the evaporation drum. If this temperature is too low, the structure of the precipitate may become too sparse; conversely, if it is too high, crystal growth due to disproportionation reactions may occur. This temperature is preferably 900°C or less, more preferably in the range of 150°C to 800°C, and especially preferably in the range of 150°C to 700°C.

 スクレーパ141は、蒸着ドラム上に形成される薄膜を蒸着ドラム130から掻き取る役目を担う部材であって、図1に示されるように蒸着ドラム130の近傍に配設されている。このスクレーパ141によって掻き落とされた薄片(活物質粒子)は、粒体ガイド143に落下する。また、このスクレーパ141の材質は活物質粒子の不純物汚染に影響する。その影響を抑制する観点から、スクレーパ141の材質はステンレス鋼やセラミックスであることが好ましく、セラミックスであることが特に好ましい。また、このスクレーパ141は、蒸着ドラム130の外周面に接触させないのがよい。回収される活物質粒子に、蒸着ドラム130とスクレーパ141との直接接触により生じ得る不純物汚染が混入することを防止することができるからである。 The scraper 141 is a component that scrapes the thin film formed on the deposition drum 130 from the deposition drum 130, and is disposed near the deposition drum 130 as shown in FIG. 1. The flakes (active material particles) scraped off by the scraper 141 fall into the particle guide 143. The material of the scraper 141 also affects impurity contamination of the active material particles. To suppress this effect, the material of the scraper 141 is preferably stainless steel or ceramic, and ceramic is particularly preferred. The scraper 141 should not come into contact with the outer peripheral surface of the deposition drum 130. This is because this prevents impurity contamination that could occur due to direct contact between the deposition drum 130 and the scraper 141 from being mixed into the recovered active material particles.

 粒体ガイド143は、例えば、振動式の搬送部材であって、図1に示されるように、蒸着ドラムの近傍からチャンバ150の回収部152に向かうに従って下方に傾斜するように配設されており、その上方に配設されるスクレーパ141により掻き落とされる薄膜片を受けてチャンバ150の回収部152へと送る。 The particle guide 143 is, for example, a vibrating conveying member, and as shown in Figure 1, is arranged so that it slopes downward as it moves from the vicinity of the deposition drum toward the collection section 152 of the chamber 150. It receives thin film fragments scraped off by the scraper 141 arranged above it and sends them to the collection section 152 of the chamber 150.

 チャンバ150は、図1に示されるように、主に、チャンバ本体部151、回収部152および排気管153から形成されている。チャンバ本体部151は、図1に示されるように内部に析出室RMを有する箱状部位であって、ルツボ110、ヒータ120、蒸着ドラム130、スクレーパ141および粒体ガイド143を収容している。回収部152は、図1に示されるように、チャンバ本体部151の側壁から外方に突出する部位であって、チャンバ本体部151の析出室RMに連通する空間を有している。なお、上述の通り、この回収部152には、粒体ガイド143の先端部位が位置している。 As shown in FIG. 1, the chamber 150 is mainly composed of a chamber main body 151, a recovery section 152, and an exhaust pipe 153. As shown in FIG. 1, the chamber main body 151 is a box-shaped section with a deposition chamber RM inside, and houses the crucible 110, heater 120, evaporation drum 130, scraper 141, and particle guide 143. As shown in FIG. 1, the recovery section 152 is a section that protrudes outward from the side wall of the chamber main body 151, and has a space that communicates with the deposition chamber RM of the chamber main body 151. As mentioned above, the tip of the particle guide 143 is located in this recovery section 152.

 原料供給ホッパ160は、原料供給源であって、図1に示されるように出口が原料導入管170に接続されている。すなわち、原料供給ホッパ160に投入された原料は、適当なタイミングで原料導入管170を介してルツボ110に供給される。なお、ルツボ110に供給された原料は、溶湯Srとなった後に気化して原料ガスとなる。 The raw material supply hopper 160 is a raw material supply source, and as shown in Figure 1, its outlet is connected to the raw material introduction pipe 170. That is, the raw material fed into the raw material supply hopper 160 is supplied to the crucible 110 via the raw material introduction pipe 170 at an appropriate time. The raw material supplied to the crucible 110 becomes molten Sr, and then vaporizes to become raw material gas.

 原料導入管170は、原料供給ホッパ160に投入されている固体の原料をルツボ110に供給するための丸孔状のノズルであって、ルツボ110の天板部の中央部分において上方に口を向けるように配設されている。 The raw material introduction pipe 170 is a round-hole nozzle for supplying the solid raw material placed in the raw material supply hopper 160 to the crucible 110, and is arranged in the center of the top plate of the crucible 110 with its mouth facing upward.

 回収容器180は、第1バルブVL1および第2バルブVL2を通過してきた薄膜片を回収するための容器である。 The collection container 180 is a container for collecting thin film fragments that have passed through the first valve VL1 and the second valve VL2.

 第1バルブVL1および第2バルブVL2は、開閉により回収容器180への薄膜片の回収量を調整するためのものであって、チャンバ150の回収部152と回収容器180とを繋ぐ回収管190に設けられている。 The first valve VL1 and the second valve VL2 are opened and closed to adjust the amount of thin film pieces collected in the collection container 180, and are provided on the collection pipe 190 connecting the collection section 152 of the chamber 150 and the collection container 180.

 原料供給ホッパ160から原料導入管170を介してルツボ110に原料(混合粉体あるいは造粒物)を投入するか、原料を直接ルツボ110に投入する。ここでは、原料としてケイ素(Si)とリチウムダイシリケート(LiSi)等のケイ酸塩等との混合粉体や、炭酸リチウム(LiCO)等の炭酸塩、二酸化ケイ素(SiO)およびケイ素(Si)との混合粉体等が用いられる。かかる場合、混合粉体は、所定温度まで加熱されることによって原料ガスであるLi等の金属元素入りのSiOガスを発生する。 The raw material (mixed powder or granulated material) is fed from a raw material supply hopper 160 through a raw material introduction pipe 170 into the crucible 110, or the raw material is fed directly into the crucible 110. In this case, the raw material may be a mixed powder of silicon (Si) and a silicate such as lithium disilicate (Li 2 Si 2 O 5 ), or a mixed powder of a carbonate such as lithium carbonate (Li 2 CO 3 ), silicon dioxide (SiO 2 ) and silicon (Si). In such cases, the mixed powder generates SiO gas containing a metal element such as Li, which is the raw material gas, by heating it to a predetermined temperature.

 ルツボ110に原料が投入されたら析出室RM内を減圧しながら、ルツボ110をヒータ120によって加熱する。なお、析出室RM内の圧力は、高すぎると原料からSiOガスが発生する反応が起こりにくくなる。このため、析出室RM内の圧力は、1000Pa以下であることが好ましく、750Pa以下であることがより好ましく、100Pa以下であることがさらに好ましく、20Pa以下であることが特に好ましい。また、析出室RM内の温度はSiOの反応速度に影響し、同温度が低すぎると反応速度が遅くなり、同温度が高すぎると原料の融解による副反応進行や、エネルギー効率低下などが懸念される。また、同温度がルツボ110の損傷も懸念される。この観点から、析出室RM内の温度は、1000℃以上1600℃以下の範囲内であることが好ましく、1100℃以上1500℃以下の範囲であることがより好ましく、1200℃以上1400℃未満の範囲内であることが特に好ましい。 Once the raw materials are placed into the crucible 110, the pressure inside the precipitation chamber RM is reduced while the crucible 110 is heated by the heater 120. If the pressure inside the precipitation chamber RM is too high, the reaction that generates SiO gas from the raw materials becomes difficult to occur. For this reason, the pressure inside the precipitation chamber RM is preferably 1000 Pa or less, more preferably 750 Pa or less, even more preferably 100 Pa or less, and particularly preferably 20 Pa or less. The temperature inside the precipitation chamber RM also affects the reaction rate of SiO; if the temperature is too low, the reaction rate will be slow, and if the temperature is too high, there is concern that side reactions will occur due to the melting of the raw materials and reduced energy efficiency will occur. There is also concern that the temperature may damage the crucible 110. From this perspective, the temperature inside the deposition chamber RM is preferably in the range of 1000°C or higher and 1600°C or lower, more preferably in the range of 1100°C or higher and 1500°C or lower, and particularly preferably in the range of 1200°C or higher and lower than 1400°C.

 上述の通りに原料を減圧加熱することにより、ルツボ110内の原料から原料ガスが発生し、その原料ガスがガスガイドGgを通って蒸着ドラム130に供給される。そして、この際、蒸着ドラム130が、駆動源によって回転駆動されている。なお、蒸着ドラム130の外周面の温度は、析出室RM内の温度より低く設定されている。より詳しくは、同温度は、原料ガスの凝縮温度より低く設定されている。この設定により、ルツボ110から生じる原料ガスが、回転する蒸着ドラム130の外周面に蒸着(析出)して堆積し、スクレーパ141により蒸着ドラム130からその堆積物が掻き取られる。なお、掻き取られた堆積物の欠片は蒸着ドラム130の外周面に沿って粒体ガイド143に落下していく。 By heating the raw material under reduced pressure as described above, raw material gas is generated from the raw material in the crucible 110, and this raw material gas is supplied to the evaporation drum 130 through the gas guide Gg. At this time, the evaporation drum 130 is rotated by a drive source. The temperature of the outer surface of the evaporation drum 130 is set lower than the temperature in the deposition chamber RM. More specifically, this temperature is set lower than the condensation temperature of the raw material gas. With this setting, the raw material gas generated from the crucible 110 is evaporated (precipitated) and deposited on the outer surface of the rotating evaporation drum 130, and the deposit is scraped off from the evaporation drum 130 by the scraper 141. The scraped-off pieces of the deposit fall along the outer surface of the evaporation drum 130 into the particle guide 143.

 本発明の実施の形態に係る蒸着装置100では、上述のようにしてリチウム含有酸化ケイ素が製造される。 In the vapor deposition apparatus 100 according to an embodiment of the present invention, lithium-containing silicon oxide is produced as described above.

 次に、上述で得られたリチウム含有酸化ケイ素は、ビーズミル等の粉砕機により粉砕される。そして、この工程では、同粉砕機により粉砕して得られたリチウム含有酸化ケイ素粉末が微粉、粗粉および過微粉に分級される。 Next, the lithium-containing silicon oxide obtained above is pulverized using a pulverizer such as a bead mill. In this process, the lithium-containing silicon oxide powder obtained by pulverization using the pulverizer is classified into fine powder, coarse powder, and extra-fine powder.

 続いて、上述の分級により得られたリチウム含有酸化ケイ素粉末の過微粉が、次の反応工程におけるガス発生原料として再利用される。この場合、同過微粉は、図1に示されるような原料供給ホッパ160から原料導入管170を介してルツボ110内に供給されるか、直接ルツボ110内に供給される。 The ultra-fine powder of lithium-containing silicon oxide powder obtained by the above-mentioned classification is then reused as a gas-generating raw material in the next reaction step. In this case, the ultra-fine powder is supplied into the crucible 110 from the raw material supply hopper 160 via the raw material introduction pipe 170 as shown in Figure 1, or is supplied directly into the crucible 110.

 また、上述において分級により得られたリチウム含有酸化ケイ素粉末の過微粉を再利用する際に、ケイ素(Si)粉末を、同過微粉中のケイ素(Si)に対してモル比が1/10となるように混合して混合粉末(ガス発生原料)を調製することが好ましい。この場合において、調製された混合粉末(ガス発生原料)は、図1に示されるような原料供給ホッパ160から原料導入管170を介してルツボ110内に供給されるか、直接ルツボ110内に供給される。 Furthermore, when reusing the ultra-fine powder of lithium-containing silicon oxide powder obtained by classification as described above, it is preferable to prepare a mixed powder (gas generating raw material) by mixing silicon (Si) powder with the ultra-fine powder at a molar ratio of 1/10 relative to the silicon (Si) in the ultra-fine powder. In this case, the prepared mixed powder (gas generating raw material) is supplied from a raw material supply hopper 160 as shown in Figure 1 through a raw material introduction pipe 170 into the crucible 110, or is supplied directly into the crucible 110.

 <変形例>
 先の実施の形態に係るリチウム含有酸化ケイ素の製造方法では、ケイ素(Si)粉末を、リチウム含有酸化ケイ素粉末の過微粉中のケイ素(Si)に対してモル比が1/10となるように混合して混合粉末を調製した後、同混合粉末を上述の反応工程におけるガス発生原料として原料供給ホッパ160から原料導入管170を介してルツボ110内に供給していたが、本発明では、上述の反応工程におけるガス発生原料としてケイ素(Si)粉末を、リチウム含有酸化ケイ素粉末の過微粉中のケイ素(Si)に対してモル比が1/10となるように秤量した後、別々に原料供給ホッパ160から原料導入管170を介してルツボ110内に供給しても構わない。
<Modification>
In the method for producing lithium-containing silicon oxide according to the previous embodiment, silicon (Si) powder is mixed with the silicon (Si) in the ultrafine powder of lithium-containing silicon oxide powder at a molar ratio of 1/10 to prepare a mixed powder, and then the mixed powder is supplied from the raw material supply hopper 160 through the raw material introduction pipe 170 into the crucible 110 as the gas generating raw material in the above-mentioned reaction step. However, in the present invention, silicon (Si) powder may be weighed as the gas generating raw material in the above-mentioned reaction step at a molar ratio of 1/10 to the silicon (Si) in the ultrafine powder of lithium-containing silicon oxide powder, and then separately supplied from the raw material supply hopper 160 through the raw material introduction pipe 170 into the crucible 110.

 以下、本発明をより詳細に説明するために実施例および比較例を示す。なお、本発明は、この実施例に限定されることはない。 The following examples and comparative examples are provided to explain the present invention in more detail. However, the present invention is not limited to these examples.

(1)反応・析出工程
 メディアン径(D50)が2.5μmであるケイ素(Si)粉末とメディアン径(D50)が25μmであるリチウムダイシリケート(LiSi)粉末をモル比3:1で混合し、混合粉末を調製した。そして、この混合粉末をガス発生原料として図1に示す蒸着装置100のルツボ110に仕込み、析出室RMを5Paに減圧すると共にルツボ110内を30分かけて1400℃に昇温し、その後30分間ルツボ110内の温度を1400℃に維持してLiガスとSiOガスを発生させ、混合・反応させた。次いで、蒸着ドラム130の外周面温度が25℃となるように温度管理しながら蒸着ドラム130を回転させて、蒸着ドラム130の外周面でLiガスとSiOガスの混合ガス(反応ガス)を凝縮・析出させた。その後、蒸着ドラム130にスクレーパ141を近づけ、蒸着ドラム130の外周面に堆積したリチウム含有酸化ケイ素薄膜を削り取って、リチウム含有酸化ケイ素粉末を得た。
(1) Reaction and Deposition Process Silicon (Si) powder having a median diameter (D50) of 2.5 μm and lithium disilicate (Li 2 Si 2 O 5 ) powder having a median diameter (D50) of 25 μm were mixed in a molar ratio of 3:1 to prepare a mixed powder. Then, this mixed powder was charged into the crucible 110 of the deposition apparatus 100 shown in FIG. 1 as a gas generating raw material, and the deposition chamber RM was reduced in pressure to 5 Pa and the temperature inside the crucible 110 was raised to 1400 ° C. over 30 minutes. Thereafter, the temperature inside the crucible 110 was maintained at 1400 ° C. for 30 minutes to generate Li gas and SiO gas, which were then mixed and reacted. Next, the deposition drum 130 was rotated while controlling the temperature so that the outer peripheral surface temperature of the deposition drum 130 was 25 ° C., and a mixed gas (reaction gas) of Li gas and SiO gas was condensed and precipitated on the outer peripheral surface of the deposition drum 130. Thereafter, a scraper 141 was brought close to the deposition drum 130 to scrape off the lithium-containing silicon oxide thin film deposited on the outer peripheral surface of the deposition drum 130, thereby obtaining a lithium-containing silicon oxide powder.

(2)粉砕工程
 上記リチウム含有酸化ケイ素を、ビーズミル(アシザワファインテック社製 SDA1)を用いて大気中でメディアン径(D50)が5μm以上10μm以下の範囲内となるように粉砕してリチウム含有酸化ケイ素粉末を得た。また、粉砕用ビーズにはジルコニア製のビーズを利用した。得られたリチウム含有酸化ケイ素粉末を分級機(日清エンジニアリング社製 TC15)により分級して、メディアン径(D50)が5μmである目的のリチウム含有酸化ケイ素粉末(微粉)、メディアン径(D50)が1.9μmのリチウム含有酸化ケイ素粉末(過微粉)を得た。このとき、メディアン径(D50)が10μm超の粗粉は再び粉砕工程に戻し、粗粉が得られなくなるまで粉砕・分級を繰り返した。なお、上述の分級により得られたそれぞれのリチウム含有酸化ケイ素粉末のメディアン径(D50)は、レーザー回折式の粒度分布測定装置(Malvern社製のMastersizer3000)を用いて測定した。このときの測定条件は以下の通りであった。
(2) Pulverization Step The lithium-containing silicon oxide was pulverized in air using a bead mill (SDA1 manufactured by Ashizawa Finetech Co., Ltd.) to a median diameter (D50) of 5 μm or more and 10 μm or less to obtain a lithium-containing silicon oxide powder. Zirconia beads were used as the pulverizing beads. The obtained lithium-containing silicon oxide powder was classified using a classifier (TC15 manufactured by Nisshin Engineering Co., Ltd.) to obtain the desired lithium-containing silicon oxide powder (fine powder) having a median diameter (D50) of 5 μm and the lithium-containing silicon oxide powder (extra-fine powder) having a median diameter (D50) of 1.9 μm. At this time, coarse powder having a median diameter (D50) of more than 10 μm was returned to the pulverization step, and pulverization and classification were repeated until no coarse powder was obtained. The median diameter (D50) of each lithium-containing silicon oxide powder obtained by the above classification was measured using a laser diffraction particle size distribution measuring device (Malvern Mastersizer 3000). The measurement conditions were as follows:

 ・分散媒:イソプロピルアルコール(2-プロパノール)
 ・粒子屈折率:3.500
 ・粒子吸収率:1.000
 ・分散媒屈折率:1.390
Dispersion medium: isopropyl alcohol (2-propanol)
Particle refractive index: 3.500
Particle absorption rate: 1.000
Dispersion medium refractive index: 1.390

 上述の(3)粉砕工程において得られたメディアン径(D50)が5μmである目的のリチウム含有酸化ケイ素粉末(微粉)とメディアン径(D50)が1.9μmのリチウム含有酸化ケイ素粉末(過微粉)のジルコニウム濃度を測定すると、それぞれ400ppm、737ppmであった。なお、上述のリチウム含有酸化ケイ素粉末のジルコニア濃度は、ICP分析装置(株式会社日立ハイテクサイエンス製 PS3520VDD II)を用いて以下の条件に従い測定された。 The zirconium concentrations of the target lithium-containing silicon oxide powder (fine powder) with a median diameter (D50) of 5 μm and the lithium-containing silicon oxide powder (extra-fine powder) with a median diameter (D50) of 1.9 μm obtained in the above-mentioned (3) pulverization step were measured and found to be 400 ppm and 737 ppm, respectively. The zirconia concentration of the above-mentioned lithium-containing silicon oxide powder was measured using an ICP analyzer (PS3520VDD II, manufactured by Hitachi High-Tech Science Corporation) under the following conditions:

(測定条件)
 起動時間(暖機時間):15分以上
 測定モード:iFR
 測定波長域:160nm~850nm
 分光器内雰囲気:真空
(Measurement conditions)
Start-up time (warm-up time): 15 minutes or more Measurement mode: iFR
Measurement wavelength range: 160nm to 850nm
Spectrometer atmosphere: vacuum

(3)再利用工程
 上述の(3)粉砕工程において得られたメディアン径(D50)が1.9μmのリチウム含有酸化ケイ素粉末(過微粉)を、上述の粉砕工程以降の反応工程におけるガス発生原料として原料供給ホッパ160から原料導入管170を介してルツボ110内に供給した。そして、上述と同様に反応工程、析出工程を行った。なお、過微粉をルツボ110内に供給した際に、過微粉が蒸着ドラムに舞い上げられていないことを析出工程後のリチウム含有酸化ケイ素粉末のジルコニウム濃度で確認した。その結果、析出工程後のジルコニア濃度は1ppmであった。このことから、反応・析出工程で得たリチウム含有酸化ケイ素には過微粉が混入していないことが確認できた。
次に上記と同様に粉砕工程を経て、メディアン径(D50)が5μm以上10μm以下の範囲内である目的のリチウム含有酸化ケイ素粉末(微粉)を得た。
(3) Reuse Step The lithium-containing silicon oxide powder (extra-fine powder) having a median diameter (D50) of 1.9 μm obtained in the above-mentioned (3) pulverization step was supplied from the raw material supply hopper 160 to the crucible 110 via the raw material introduction pipe 170 as a gas generating raw material in the reaction step following the above-mentioned pulverization step. Then, the reaction step and the precipitation step were carried out in the same manner as described above. Note that when the extra-fine powder was supplied to the crucible 110, it was confirmed by the zirconium concentration of the lithium-containing silicon oxide powder after the precipitation step that the extra-fine powder was not blown up onto the deposition drum. As a result, the zirconia concentration after the precipitation step was 1 ppm. From this, it was confirmed that the lithium-containing silicon oxide obtained in the reaction and precipitation steps was not contaminated with the extra-fine powder.
Next, the powder was subjected to a pulverization process in the same manner as above to obtain the desired lithium-containing silicon oxide powder (fine powder) having a median diameter (D50) in the range of 5 μm to 10 μm.

 上述の工程による、メディアン径(D50)が5μm以上10μm以下の範囲内である目的のリチウム含有酸化ケイ素粉末(微粉)の歩留まりは86%であった(表1参照)。なお、この歩留まりは、「微粉の重量」を「原料の重量」で除した割合の百分率(すなわち、「(微粉重量/原料重量)×100(%)」)である。 The yield of the target lithium-containing silicon oxide powder (fine powder) with a median diameter (D50) in the range of 5 μm to 10 μm obtained through the above process was 86% (see Table 1). Note that this yield is expressed as a percentage of the "weight of fine powder" divided by the "weight of raw material" (i.e., "(weight of fine powder/weight of raw material) x 100 (%)").

 粉砕工程において、メディアン径(D50)が8.1μmである目的のリチウム含有酸化ケイ素粉末(微粉)、メディアン径(D50)が4.7μmのリチウム含有酸化ケイ素粉末(過微粉)を得たこと以外は、実施例1と同様の方法により、リチウム含有酸化ケイ素を得た。この場合における、析出工程後のジルコニウム濃度は1ppmであり、メディアン径(D50)が5μm以上10μm以下の範囲内である目的のリチウム含有酸化ケイ素粉末(微粉)の歩留まりは86%であった(表1参照)。 Lithium-containing silicon oxide was obtained by the same method as in Example 1, except that the target lithium-containing silicon oxide powder (fine powder) having a median diameter (D50) of 8.1 μm and the target lithium-containing silicon oxide powder (extra-fine powder) having a median diameter (D50) of 4.7 μm were obtained in the pulverization step. In this case, the zirconium concentration after the precipitation step was 1 ppm, and the yield of the target lithium-containing silicon oxide powder (fine powder) having a median diameter (D50) in the range of 5 μm to 10 μm was 86% (see Table 1).

 再利用工程において、ケイ素(Si)粉末を供給したこと(ケイ素(Si)粉末供給工程を設けたこと)以外は実施例1と同様の方法により、リチウム含有酸化ケイ素を得た。以下、ケイ素粉末供給工程について説明する。 Lithium-containing silicon oxide was obtained in the same manner as in Example 1, except that silicon (Si) powder was supplied in the recycling process (a silicon (Si) powder supplying process was added). The silicon powder supplying process will be described below.

(ケイ素粉末供給工程)
 メディアン径(D50)が3μmであるケイ素(Si)粉末を、上述の粉砕工程において得られたメディアン径(D50)が1.9μmのリチウム含有酸化ケイ素粉末(過微粉)中のケイ素(Si)に対してモル比が1/10となるように混合し、混合粉末を調製した。そして、この混合粉末を上述の反応工程におけるガス発生原料として原料供給ホッパ160から原料導入管170を介してルツボ110内に供給した。
(Silicon powder supply process)
A silicon (Si) powder having a median diameter (D50) of 3 μm was mixed with the silicon (Si) in the lithium-containing silicon oxide powder (ultrafine powder) having a median diameter (D50) of 1.9 μm obtained in the above-mentioned pulverization step so that the molar ratio was 1/10, to prepare a mixed powder. Then, this mixed powder was supplied into the crucible 110 from the raw material supply hopper 160 via the raw material introduction pipe 170 as a gas generating raw material in the above-mentioned reaction step.

 この場合における、析出工程後のジルコニウム濃度は1ppmであり、メディアン径(D50)が5μm以上10μm以下の範囲内である目的のリチウム含有酸化ケイ素粉末(微粉)の歩留まりは87%であった(表1参照)。 In this case, the zirconium concentration after the precipitation process was 1 ppm, and the yield of the desired lithium-containing silicon oxide powder (fine powder) with a median diameter (D50) in the range of 5 μm to 10 μm was 87% (see Table 1).

(比較例1)
 上述の(4)再利用工程を設けなかったこと以外は(すなわち、粉砕工程において分級された過微粉を反応工程におけるガス発生原料として再利用しなかったこと以外は)、実施例1と同様の方法により、リチウム含有酸化ケイ素を得た。この場合における、析出工程後のジルコニア濃度は1ppmであり、メディアン径(D50)が5μm以上10μm以下の範囲内である目的のリチウム含有酸化ケイ素粉末(微粉)の歩留まりは81%であった(表1参照)。
(Comparative Example 1)
Except for not providing the above-mentioned (4) recycling step (i.e., not recycling the superfine powder classified in the pulverization step as a gas generating raw material in the reaction step), lithium-containing silicon oxide was obtained by the same method as in Example 1. In this case, the zirconia concentration after the precipitation step was 1 ppm, and the yield of the target lithium-containing silicon oxide powder (fine powder) having a median diameter (D50) in the range of 5 μm or more and 10 μm or less was 81% (see Table 1).

(まとめ)
 上記の表1から明らかな通り、本発明に係るリチウム含有酸化ケイ素の製造方法によれば、粉砕工程により得られたリチウム含有酸化ケイ素粉末の過微粉を、反応工程におけるガス発生原料として再利用することにより、リチウム含有酸化ケイ素の製造時における歩留まりを向上させることができる。また、実施例1-3(すなわち、再利用工程を設けた方法により作製されたリチウム含有酸化ケイ素粉末)および比較例1(すなわち、再利用工程を設けなかった方法(従来法)により作製されたリチウム含有酸化ケイ素粉末)における析出工程後のジルコニウム濃度は1ppmであった。このことから、本発明に係る製造方法により作製されたリチウム含有酸化ケイ素粉末により作製された負極材料を使用した電池の性能は、従来の製造方法により作製されたリチウム含有酸化ケイ素粉末により作製された負極材料を使用した電池の性能と同等であると考えられる。

 
(summary)
As is clear from Table 1 above, according to the method for producing lithium-containing silicon oxide of the present invention, the yield during the production of lithium-containing silicon oxide can be improved by reusing the ultrafine powder of lithium-containing silicon oxide powder obtained in the pulverization step as a gas-generating raw material in the reaction step. Furthermore, the zirconium concentration after the precipitation step in Examples 1-3 (i.e., lithium-containing silicon oxide powder produced by a method including a recycling step) and Comparative Example 1 (i.e., lithium-containing silicon oxide powder produced by a method (conventional method) without a recycling step) was 1 ppm. From this, it is considered that the performance of a battery using a negative electrode material produced from the lithium-containing silicon oxide powder produced by the production method of the present invention is equivalent to the performance of a battery using a negative electrode material produced from the lithium-containing silicon oxide powder produced by a conventional production method.

Claims (3)

 ケイ素粉末とケイ酸リチウムとを含むケイ素・ケイ酸リチウム含有原料を気化させて反応させる反応工程と、
 前記反応工程で発生した気体を冷却して析出させる析出工程と、
 前記析出工程で得られた析出物を回収し、前記析出物を粉砕してリチウム含有酸化ケイ素粉末を得る粉砕工程と
を備え、
 前記粉砕工程により得られた過微粉の前記リチウム含有酸化ケイ素粉末を前記反応工程に再利用する再利用工程をさらに備える、
リチウム含有酸化ケイ素の製造方法。
a reaction step of vaporizing and reacting a silicon/lithium silicate-containing raw material containing silicon powder and lithium silicate;
a deposition step of cooling and depositing the gas generated in the reaction step;
a pulverization step of recovering the precipitate obtained in the precipitation step and pulverizing the precipitate to obtain a lithium-containing silicon oxide powder,
The method further includes a recycling step of recycling the ultrafine lithium-containing silicon oxide powder obtained by the pulverization step in the reaction step.
A method for producing lithium-containing silicon oxide.
 前記過微粉のリチウム含有酸化ケイ素粉末のメディアン径(D50)が5μm未満である、
請求項1に記載のリチウム含有酸化ケイ素の製造方法。
The median diameter (D50) of the ultrafine lithium-containing silicon oxide powder is less than 5 μm.
The method for producing lithium-containing silicon oxide according to claim 1 .
 前記再利用工程において、ケイ素粉末を供給するケイ素粉末供給工程をさらに備える、
請求項1または2に記載のリチウム含有酸化ケイ素の製造方法。

 
The recycling step further includes a silicon powder supply step of supplying silicon powder.
The method for producing lithium-containing silicon oxide according to claim 1 or 2.

PCT/JP2024/042315 2024-03-28 2024-11-29 Method for producing lithium-containing silicon oxide Pending WO2025203871A1 (en)

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Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113264773A (en) * 2021-05-26 2021-08-17 葫芦岛市铭浩新能源材料有限公司 Method for preparing lithium ion battery cathode raw material by regeneration
JP2021183550A (en) * 2020-05-21 2021-12-02 株式会社大阪チタニウムテクノロジーズ Lithium disilicate-containing lithium-containing silicon oxide and its manufacturing method
CN113912055A (en) * 2021-09-30 2022-01-11 云南中晟新材料有限责任公司 Graphite cathode ultrafine powder recycling method

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2021183550A (en) * 2020-05-21 2021-12-02 株式会社大阪チタニウムテクノロジーズ Lithium disilicate-containing lithium-containing silicon oxide and its manufacturing method
CN113264773A (en) * 2021-05-26 2021-08-17 葫芦岛市铭浩新能源材料有限公司 Method for preparing lithium ion battery cathode raw material by regeneration
CN113912055A (en) * 2021-09-30 2022-01-11 云南中晟新材料有限责任公司 Graphite cathode ultrafine powder recycling method

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