[go: up one dir, main page]

WO2025246757A1 - Gas intake system and furnace pipe apparatus - Google Patents

Gas intake system and furnace pipe apparatus

Info

Publication number
WO2025246757A1
WO2025246757A1 PCT/CN2025/091433 CN2025091433W WO2025246757A1 WO 2025246757 A1 WO2025246757 A1 WO 2025246757A1 CN 2025091433 W CN2025091433 W CN 2025091433W WO 2025246757 A1 WO2025246757 A1 WO 2025246757A1
Authority
WO
WIPO (PCT)
Prior art keywords
pipe
intake
flow
pressure
pipeline
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
PCT/CN2025/091433
Other languages
French (fr)
Chinese (zh)
Inventor
李抒怀
周冬成
石家燕
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Acm Research Lingang Inc
ACM Research Shanghai Inc
Original Assignee
Acm Research Lingang Inc
ACM Research Shanghai Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Acm Research Lingang Inc, ACM Research Shanghai Inc filed Critical Acm Research Lingang Inc
Publication of WO2025246757A1 publication Critical patent/WO2025246757A1/en
Pending legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/52Controlling or regulating the coating process
    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B25/00Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour-deposition growth
    • C30B25/02Epitaxial-layer growth
    • C30B25/14Feed and outlet means for the gases; Modifying the flow of the reactive gases
    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B25/00Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour-deposition growth
    • C30B25/02Epitaxial-layer growth
    • C30B25/16Controlling or regulating

Definitions

  • This application relates to the field of semiconductor equipment technology, specifically to an air intake system and furnace tube equipment.
  • furnace tube's air intake system experiences pressure fluctuations during air intake, affecting the process. This is especially true during the ALD process, where it severely impacts process stability.
  • the following cycle is required to deposit the film: introducing the first reactive gas – performing a purging operation – introducing the second reactive gas – performing a purging operation.
  • the carrier gas line 100' is used to introduce nitrogen
  • the inlet line 200' is used to introduce the first reactive gas.
  • the first reactive gas enters the reaction chamber 400' as a carrier gas. Because the first and second reactive gases are frequently switched into the reaction chamber 400', valve 210' is frequently opened and closed. When valve 210' is closed, a pressure difference exists across its two ends; when valve 210' is open, pressure fluctuations occur during the intake, leading to unstable intake volume and affecting the process.
  • This application provides an air intake system and furnace tube equipment, which helps to reduce pressure fluctuations during air intake and make the air intake volume more accurate.
  • An intake system comprising:
  • the second intake pipe is connected to the first intake pipe and the pre-flow pipe via a first pipe switching device, the first pipe switching device being configured to allow the second intake pipe to be connected to one of the first intake pipe and the pre-flow pipe.
  • a differential pressure detection device is used to measure the differential pressure between the first intake pipe and the pre-flow pipe or between the first intake pipe and the second intake pipe.
  • a pressure regulating device is used to control the pressure of the pre-flow pipeline
  • the control unit is communicatively connected to the differential pressure detection device and is used to control the pressure regulating device according to the differential pressure, thereby regulating the pressure of the pre-flow pipeline.
  • a furnace tube device includes the above-described air intake system, the furnace tube device includes a reaction chamber, and a first air intake pipe is connected to the reaction chamber.
  • the control unit can obtain the value from the differential pressure detection device and adjust the pressure in the pre-flow pipeline by controlling the pump. This balances the pressure difference between the pre-flow pipeline and the first intake pipeline, resulting in smaller pressure fluctuations and a more stable switching when the second intake pipeline switches from the pre-flow pipeline to the first intake pipeline. Consequently, the amount of gas supplied by the second intake pipeline is more precise and stable.
  • Figure 1 is a schematic diagram of the air intake system of Embodiment 1 of this application.
  • Figure 2 is a schematic diagram of the air intake system of Embodiment 2 of this application.
  • Figure 3 is a schematic diagram of the air intake system of Embodiment 3 of this application.
  • Figure 4 is a schematic diagram of the existing furnace tube air intake system.
  • this embodiment provides an air intake system, including a first air intake pipe 100, a pre-flow pipe 300, a second air intake pipe 200, a differential pressure detection device 600, and a control unit 150.
  • the first air intake pipe 100 is connected to the reaction chamber 400 of the furnace tube equipment.
  • the pre-flow pipe 300 is equipped with a pump 310.
  • the second air intake pipe 200 is connected to the first air intake pipe 100 and the pre-flow pipe 300 via a first pipe switching device, which is configured to allow the second air intake pipe 200 to be connected to one of the first air intake pipe 100 and the pre-flow pipe 300.
  • the differential pressure detection device 600 is used to measure the pressure difference between the first air intake pipe 100 and the pre-flow pipe 300.
  • the control unit 150 is communicatively connected to the differential pressure detection device 600 and is used to control the power of the pump 310 and thus adjust the pressure of the pre-flow pipe 300 based on the value measured by the differential pressure detection device 600.
  • the first pipeline switching device includes a first valve 510 disposed between the first intake pipeline 100 and the second intake pipeline 200 and a second valve 520 disposed between the second intake pipeline 200 and the pre-flow pipeline 300.
  • the second intake pipeline 200 can be switched between the first intake pipeline 100 and the pre-flow pipeline 300.
  • the differential pressure detection device 600 is a differential pressure gauge, which is installed between the first intake pipe 100 and the pre-flow pipe 300.
  • the second valve 520 When the second valve 520 is opened, the second intake pipe 200 is connected to the pre-flow pipe 300, and the pressure in the second intake pipe 200 is the same as the pressure in the pre-flow pipe 300. Therefore, the value measured by the differential pressure detection device 600 is also the differential pressure between the first intake pipe 100 and the second intake pipe 200.
  • the differential pressure detection device 600 may also be disposed between the first intake pipe 100 and the second intake pipe 200.
  • the control unit 150 is a programmable logic controller (PLC). In this embodiment, the control unit 150 communicates wirelessly; in some embodiments, the control unit 150 may also communicate via a wired connection.
  • PLC programmable logic controller
  • the differential pressure detection device 600 may also be equipped with pressure gauges on the first intake pipe 100 and the pre-flow pipe 300 respectively to obtain the differential pressure between the first intake pipe 100 and the pre-flow pipe 300.
  • the first air inlet pipe 100 is connected to the reaction chamber 400 of the furnace tube equipment.
  • the reaction chamber 400 of the furnace tube equipment is usually under negative pressure (less than standard atmospheric pressure), so the pressure in the first air inlet pipe 100 will be less than atmospheric pressure.
  • This application adds a pre-flow pipe 300 and installs a pump 310 in the pre-flow pipe 300. By turning on the pump 310 to pump air, the pressure in the pre-flow pipe 300 can be reduced.
  • a differential pressure detection device 600 is also provided to detect the pressure difference between the pre-flow pipe 300 and the first air inlet pipe 100.
  • the second inlet pipe 200 is connected to the pre-flow pipe 300 for pre-flow.
  • the control unit 150 can obtain the value from the differential pressure detection device 600 and adjust the pressure of the pre-flow pipe 300 by controlling the pump 310, thereby balancing the pressure difference between the pre-flow pipe 300 and the first inlet pipe 100. This reduces or even eliminates the pressure difference across the first valve 510. Consequently, when the second inlet pipe 200 switches from the pre-flow pipe 300 to the first inlet pipe 100 (i.e., from the second valve 520 to the first valve 510), the pressure fluctuation is smaller, and the switching is more stable. This results in a more precise and stable amount of gas entering the reaction chamber 400 from the second inlet pipe 200. Furthermore, the switching process also helps reduce the wear and tear on the first pipe switching device and extends its service life.
  • the control unit 150 adjusts the pressure in the pre-flow pipe 300 by controlling the pump 310, adjusting the value of the differential pressure detection device 600 to a preset value to reduce the pressure difference between the first intake pipe 100 and the pre-flow pipe 300.
  • the preset value is determined according to different process requirements. For processes that require more precise air intake, the preset value can be set smaller to reduce pressure fluctuations when the second intake pipe 200 switches from the pre-flow pipe 300 to the first intake pipe 100.
  • the pressure of the pre-flow line 300 can be adjusted by controlling the pump 310, thereby balancing the pressure difference between the pre-flow line 300 and the first intake line 100.
  • the devices connected to the first intake pipe 100 are not limited to this, and the first intake pipe 100 may also be connected to other devices that require pipe switching.
  • a mass flow controller (MFC) 110 is provided on the first intake pipe 100 to control the flow rate of gas in the first intake pipe 100
  • a mass flow controller 210 is provided on the second intake pipe 200 to control the flow rate of gas in the second intake pipe 200.
  • the connection end of the differential pressure detection device 600 to the first intake pipe 100 is located downstream of the mass flow controller (MFC) 110
  • the connection end of the differential pressure detection device 600 to the pre-flow pipe 300 is located between the second valve 520 and the pump 310.
  • the intake system provided in this embodiment is basically the same as the solution in embodiment 1. The difference is that in this embodiment, the intake system also includes a pressure regulating pipeline 900, which is connected to the pre-flow pipeline 300.
  • a mass flow controller 910 is provided on the pressure regulating pipeline 900, and the control unit 150 is also communicatively connected to the mass flow controller 910.
  • the control unit 150 can not only coarsely adjust the pressure of the pre-flow line 300 through the pump 310, but also precisely control the pressure of the pre-flow line 300 by adjusting the mass flow controller 910 on the pressure regulating line 900.
  • the pressure of the pre-flow line 300 can be controlled within a certain range.
  • the flow rate of the pre-flow line 300 through the mass flow controller 910 the pressure of the pre-flow line 300 can be precisely controlled.
  • the pressure control of the pre-flow line 300 is more accurate, which further reduces the pressure fluctuation when the second intake line 200 switches from the pre-flow line 300 to the first intake line 100.
  • the pump 310 may be omitted, and the pressure of the pre-flow line 300 may be controlled solely by the mass flow controller 910 on the pressure regulating line 900.
  • the first pipeline switching device is a two-position five-way valve 540, and the pressure regulating pipeline 900 and the pre-flow pipeline 300 are connected through the two-position five-way valve 540.
  • the use of a two-position five-way valve 540 as the first pipeline switching device helps to reduce the number of individual valves, optimize pipeline design, and simplify control.
  • the air intake system provided in this embodiment is basically the same as the scheme in embodiment 2. The difference is that in this embodiment, the air intake system also includes a first branch 810, a second branch 820, and an air source container 700.
  • the air source container 700 is used to contain the air source.
  • the air intake end of the first branch 810 is connected to the second air intake pipe 200 through the second pipe switching device 530.
  • the air outlet end of the first branch 810 is connected to the air intake end of the air source container 700.
  • the air intake end of the second branch 820 is connected to the air outlet end of the air source container 700.
  • the air outlet end of the second branch 820 is connected to the second air intake pipe 200 through the second pipe switching device 530.
  • the second pipeline switching device 530 is a two-position four-way valve.
  • the gas source container 700 contains DCE (dichloroethylene) liquid.
  • DCE dichloroethylene
  • the nitrogen from the plant end enters the third inlet pipeline 830 through the mass flow controller 210, and then enters the gas source container 700 through the first branch 810.
  • the nitrogen carries the DCE (gaseous) through the second branch 820 into the second inlet pipeline 200 by bubbling.
  • an electronic pressure controller (EPC) 220 is provided on the second air intake pipe 200.
  • the electronic pressure controller 220 is located downstream of the second pipe switching device 530 and is used to control the pressure of the second air intake pipe 200.
  • the electronic pressure controller 220 ensures that the amount of gas carried out from the gas source container 700 can be accurately controlled, and that the amount of gas will not fluctuate due to pressure fluctuations.
  • a regulating valve 320 is also provided on the pre-flow pipeline 300.
  • the regulating valve 320 is located upstream of the pump 310 and downstream of the two-position five-way valve 540.
  • the regulating valve 320 is used to regulate the pressure of the pre-flow pipeline 300.
  • the regulating valve 320 can be a throttle valve, and the pressure of the pre-flow pipeline 300 is regulated by controlling the opening degree of the throttle valve.
  • This embodiment provides a furnace tube device, which includes the air intake system described in the above embodiment.

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Control Of Fluid Pressure (AREA)

Abstract

The present application relates to the technical field of semiconductor apparatuses. Disclosed are a gas intake system and a furnace pipe apparatus. The gas intake system comprises: a first gas intake pipe; a pre-flow pipe; a second gas intake pipe, which is connected to the first gas intake pipe and the pre-flow pipe by means of a first pipe switching device, wherein the first pipe switching device is configured to enable the second gas intake pipe to be in communication with one of the first gas intake pipe and the pre-flow pipe; a pressure difference measurement device, which is used for measuring a pressure difference between the first gas intake pipe and the pre-flow pipe or a pressure difference between the first gas intake pipe and the second gas intake pipe; a pressure adjustment device, which is used for controlling the pressure of the pre-flow pipe; and a control unit, which is in communication connection with the pressure difference measurement device and is used for controlling the pressure adjustment device on the basis of the pressure difference, so as to adjust the pressure of the pre-flow pipe. In the present application, the gas intake pressure of the pipes fluctuates slightly and is more stable.

Description

进气系统及炉管设备Air intake system and furnace tube equipment 技术领域Technical Field

本申请涉及半导体设备技术领域,具体涉及一种进气系统及炉管设备。This application relates to the field of semiconductor equipment technology, specifically to an air intake system and furnace tube equipment.

背景技术Background Technology

目前炉管的进气系统在进气时存在压力波动,影响工艺制程。尤其是在ALD工艺过程中,会严重影响工艺的稳定性。Currently, the furnace tube's air intake system experiences pressure fluctuations during air intake, affecting the process. This is especially true during the ALD process, where it severely impacts process stability.

具体地,在ALD工艺中,需要循环以下操作来沉积膜层,通入第一反应气体-进行吹扫操作-通入第二反应气体-进行吹扫操作。参考附图4(仅示出了通入第一反应气体的进气管路,第二反应气体的进气管路与第一反应气体的进气方式相同),载气管路100'用于通入氮气,进气管路200'用于通入第一反应气体,第一反应气体采用载气的方式进入到反应腔室400’内。由于要频繁地切换第一反应气体和第二反应气体通入到反应腔室400’内,因此阀门210’会频繁地打开和关闭,在阀门210’关闭时,阀门210’的两端存在压力差,在阀门210’打开时,进气会存在压力波动,导致进气量不稳定,从而影响工艺制程。Specifically, in the ALD process, the following cycle is required to deposit the film: introducing the first reactive gas – performing a purging operation – introducing the second reactive gas – performing a purging operation. Referring to Figure 4 (only the inlet line for the first reactive gas is shown; the inlet line for the second reactive gas is the same as the first), the carrier gas line 100' is used to introduce nitrogen, and the inlet line 200' is used to introduce the first reactive gas. The first reactive gas enters the reaction chamber 400' as a carrier gas. Because the first and second reactive gases are frequently switched into the reaction chamber 400', valve 210' is frequently opened and closed. When valve 210' is closed, a pressure difference exists across its two ends; when valve 210' is open, pressure fluctuations occur during the intake, leading to unstable intake volume and affecting the process.

发明内容Summary of the Invention

本申请提供一种进气系统及炉管设备,有利于减小进气时的压力波动,进气量更为精准。This application provides an air intake system and furnace tube equipment, which helps to reduce pressure fluctuations during air intake and make the air intake volume more accurate.

本申请是通过下述技术方案来解决上述技术问题:This application solves the above-mentioned technical problems through the following technical solution:

一种进气系统,包括:An intake system, comprising:

第一进气管路;First intake pipe;

预流管路;Pre-flow piping;

第二进气管路,与所述第一进气管路和所述预流管路通过第一管路切换装置连接,所述第一管路切换装置配置为使得所述第二进气管路能够与所述第一进气管路和所述预流管路中的一者相连通;The second intake pipe is connected to the first intake pipe and the pre-flow pipe via a first pipe switching device, the first pipe switching device being configured to allow the second intake pipe to be connected to one of the first intake pipe and the pre-flow pipe.

压差检测装置,用于测量所述第一进气管路和所述预流管路之间的压差或所述第一进气管路和所述第二进气管路之间的压差;A differential pressure detection device is used to measure the differential pressure between the first intake pipe and the pre-flow pipe or between the first intake pipe and the second intake pipe.

压力调节装置,用于控制所述预流管路的压力;A pressure regulating device is used to control the pressure of the pre-flow pipeline;

控制单元,所述控制单元与所述压差检测装置通信连接,用于根据所述压差控制所述压力调节装置进而调节所述预流管路的压力。The control unit is communicatively connected to the differential pressure detection device and is used to control the pressure regulating device according to the differential pressure, thereby regulating the pressure of the pre-flow pipeline.

一种炉管设备,其包括上述的进气系统,所述炉管设备包括反应腔室,所述第一进气管路与所述反应腔室连通。A furnace tube device includes the above-described air intake system, the furnace tube device includes a reaction chamber, and a first air intake pipe is connected to the reaction chamber.

本申请的积极进步效果在于:本申请通过增加预流管路,在预流管路中设置泵,并设置有压差检测装置来检测预流管路和第一进气管路之间的压差。控制单元能够获取压差检测装置的数值,通过控制泵,来调节预流管路的压力,从而平衡预流管路和第一进气管路之间的压差,进而当第二进气管路从预流管路切换至第一进气管路时,压力波动更小,切换更为稳定,使得第二进气管路供应的气体量更为精准稳定。The positive and progressive effects of this application are as follows: By adding a pre-flow pipeline, installing a pump in the pre-flow pipeline, and incorporating a differential pressure detection device to detect the pressure difference between the pre-flow pipeline and the first intake pipeline, the control unit can obtain the value from the differential pressure detection device and adjust the pressure in the pre-flow pipeline by controlling the pump. This balances the pressure difference between the pre-flow pipeline and the first intake pipeline, resulting in smaller pressure fluctuations and a more stable switching when the second intake pipeline switches from the pre-flow pipeline to the first intake pipeline. Consequently, the amount of gas supplied by the second intake pipeline is more precise and stable.

附图概述Overview of the attached figures

本申请的特征、性能由以下的实施例及其附图进一步描述。The features and performance of this application are further described by the following embodiments and accompanying drawings.

图1为本申请实施例1的进气系统示意图;Figure 1 is a schematic diagram of the air intake system of Embodiment 1 of this application;

图2为本申请实施例2的进气系统示意图;Figure 2 is a schematic diagram of the air intake system of Embodiment 2 of this application;

图3为本申请实施例3的进气系统示意图;Figure 3 is a schematic diagram of the air intake system of Embodiment 3 of this application;

图4为现有的炉管进气系统的示意图。Figure 4 is a schematic diagram of the existing furnace tube air intake system.

本申请的较佳实施方式Preferred embodiments of this application

下面通过实施例的方式进一步说明本申请,但并不因此将本申请限制在实施例范围之中。The present application is further illustrated below by way of embodiments, but this does not limit the present application to the scope of the embodiments.

实施例1Example 1

如图1所示,本实施例提供了一种进气系统,包括第一进气管路100、预流管路300、第二进气管路200、压差检测装置600和控制单元150。第一进气管路100与炉管设备的反应腔室400连通。预流管路300设置有泵310。第二进气管路200与第一进气管路100和预流管路300通过第一管路切换装置连接,第一管路切换装置配置为使得第二进气管路200能够与第一进气管路100和预流管路300中的一者相连通。压差检测装置600,用于测量第一进气管路100和预流管路300之间的压差。控制单元150与压差检测装置600通信连接,用于根据压差检测装置600的数值控制泵310的功率进而调节预流管路300的压力。As shown in Figure 1, this embodiment provides an air intake system, including a first air intake pipe 100, a pre-flow pipe 300, a second air intake pipe 200, a differential pressure detection device 600, and a control unit 150. The first air intake pipe 100 is connected to the reaction chamber 400 of the furnace tube equipment. The pre-flow pipe 300 is equipped with a pump 310. The second air intake pipe 200 is connected to the first air intake pipe 100 and the pre-flow pipe 300 via a first pipe switching device, which is configured to allow the second air intake pipe 200 to be connected to one of the first air intake pipe 100 and the pre-flow pipe 300. The differential pressure detection device 600 is used to measure the pressure difference between the first air intake pipe 100 and the pre-flow pipe 300. The control unit 150 is communicatively connected to the differential pressure detection device 600 and is used to control the power of the pump 310 and thus adjust the pressure of the pre-flow pipe 300 based on the value measured by the differential pressure detection device 600.

具体地,在本实施例中,第一管路切换装置包括设置于第一进气管路100和第二进气管路200之间的第一阀门510和设置于第二进气管路200和预流管路300之间的第二阀门520,通过控制第一阀门510和第二阀门520的开关,可以将第二进气管路200在第一进气管路100和预流管路300之间切换。Specifically, in this embodiment, the first pipeline switching device includes a first valve 510 disposed between the first intake pipeline 100 and the second intake pipeline 200 and a second valve 520 disposed between the second intake pipeline 200 and the pre-flow pipeline 300. By controlling the opening and closing of the first valve 510 and the second valve 520, the second intake pipeline 200 can be switched between the first intake pipeline 100 and the pre-flow pipeline 300.

在本实施例中,压差检测装置600为压差计,设置于第一进气管路100和预流管路300之间。当第二阀门520打开时,第二进气管路200与预流管路300连通,第二进气管路200的压力与预流管路300的压力相同,因此压差检测装置600测量的数值也是第一进气管路100和第二进气管路200之间的压差。In this embodiment, the differential pressure detection device 600 is a differential pressure gauge, which is installed between the first intake pipe 100 and the pre-flow pipe 300. When the second valve 520 is opened, the second intake pipe 200 is connected to the pre-flow pipe 300, and the pressure in the second intake pipe 200 is the same as the pressure in the pre-flow pipe 300. Therefore, the value measured by the differential pressure detection device 600 is also the differential pressure between the first intake pipe 100 and the second intake pipe 200.

在一些实施例中,压差检测装置600也可以设置于第一进气管路100和第二进气管路200之间。In some embodiments, the differential pressure detection device 600 may also be disposed between the first intake pipe 100 and the second intake pipe 200.

控制单元150采用可编程逻辑控制器(PLC)。在本实施例中控制单元150采用无线的方式进行通信连接,在一些实施例中,控制单元150也可以采用有线的方式进行通信连接。The control unit 150 is a programmable logic controller (PLC). In this embodiment, the control unit 150 communicates wirelessly; in some embodiments, the control unit 150 may also communicate via a wired connection.

在一些实施例中,压差检测装置600也可以分别在第一进气管路100和预流管路300上设置压力表,来获取第一进气管路100和预流管路300之间的压差。In some embodiments, the differential pressure detection device 600 may also be equipped with pressure gauges on the first intake pipe 100 and the pre-flow pipe 300 respectively to obtain the differential pressure between the first intake pipe 100 and the pre-flow pipe 300.

本实施例中,第一进气管路100与炉管设备的反应腔室400连通,炉管设备的反应腔室400通常为负压(小于标准大气压),因此第一进气管路100中的压力会小于大气压。本申请通过增加预流管路300,在预流管路300中设置泵310,通过打开泵310进行抽气,能够降低预流管路300中的压力,并设置有压差检测装置600来检测预流管路300和第一进气管路100之间的压差。在炉管的工艺过程中,第二进气管路200与预流管路300连通进行预流,控制单元150能够获取压差检测装置600的数值,通过控制泵310,来调节预流管路300的压力,从而平衡预流管路300和第一进气管路100之间的压差,使得第一阀门510的两端压差减小,甚至消除,进而当第二进气管路200从预流管路300切换至第一进气管路100时(也即由第二阀门520导通切换至第一阀门510导通时),压力波动更小,切换更为稳定,使得第二进气管路200进入到反应腔室400的气体量更为精准稳定。此外,在切换过程中,还有利于降低第一管路切换装置的损耗,提高第一管路切换装置的使用寿命。In this embodiment, the first air inlet pipe 100 is connected to the reaction chamber 400 of the furnace tube equipment. The reaction chamber 400 of the furnace tube equipment is usually under negative pressure (less than standard atmospheric pressure), so the pressure in the first air inlet pipe 100 will be less than atmospheric pressure. This application adds a pre-flow pipe 300 and installs a pump 310 in the pre-flow pipe 300. By turning on the pump 310 to pump air, the pressure in the pre-flow pipe 300 can be reduced. A differential pressure detection device 600 is also provided to detect the pressure difference between the pre-flow pipe 300 and the first air inlet pipe 100. During the furnace tube process, the second inlet pipe 200 is connected to the pre-flow pipe 300 for pre-flow. The control unit 150 can obtain the value from the differential pressure detection device 600 and adjust the pressure of the pre-flow pipe 300 by controlling the pump 310, thereby balancing the pressure difference between the pre-flow pipe 300 and the first inlet pipe 100. This reduces or even eliminates the pressure difference across the first valve 510. Consequently, when the second inlet pipe 200 switches from the pre-flow pipe 300 to the first inlet pipe 100 (i.e., from the second valve 520 to the first valve 510), the pressure fluctuation is smaller, and the switching is more stable. This results in a more precise and stable amount of gas entering the reaction chamber 400 from the second inlet pipe 200. Furthermore, the switching process also helps reduce the wear and tear on the first pipe switching device and extends its service life.

具体地,在本实施例中,在第二进气管路200由与预流管路300连通切换至与第一进气管路100连通前,第一进气管路100的进气已处于稳定状态,控制单元150通过控制泵310调节预流管路300中的压力,将压差检测装置600的数值调节至预设值,以减少第一进气管路100和预流管路300之间的压差。预设值的设定根据不同的工艺需求进行确定,对于进气量要求比较精确的工艺,可以将预设值设置的小一点,以减小第二进气管路200由预流管路300切换至第一进气管路100时的压力波动。在一些实施例中,在第二进气管路200由与第一进气管路100连通切换至与预流管路300连通前,也可以通过控制泵310,来调节预流管路300的压力,从而平衡预流管路300和第一进气管路100之间的压差。Specifically, in this embodiment, before the second intake pipe 200 switches from being connected to the pre-flow pipe 300 to being connected to the first intake pipe 100, the air intake of the first intake pipe 100 is already in a stable state. The control unit 150 adjusts the pressure in the pre-flow pipe 300 by controlling the pump 310, adjusting the value of the differential pressure detection device 600 to a preset value to reduce the pressure difference between the first intake pipe 100 and the pre-flow pipe 300. The preset value is determined according to different process requirements. For processes that require more precise air intake, the preset value can be set smaller to reduce pressure fluctuations when the second intake pipe 200 switches from the pre-flow pipe 300 to the first intake pipe 100. In some embodiments, before the second intake line 200 is switched from being connected to the first intake line 100 to being connected to the pre-flow line 300, the pressure of the pre-flow line 300 can be adjusted by controlling the pump 310, thereby balancing the pressure difference between the pre-flow line 300 and the first intake line 100.

在一些实施例中,第一进气管路100所连接的设备不局限于此,第一进气管路100也可以与其他需要管路切换的设备连接。In some embodiments, the devices connected to the first intake pipe 100 are not limited to this, and the first intake pipe 100 may also be connected to other devices that require pipe switching.

在本实施例中,第一进气管路100设置有质量流量控制器(MFC)110,用于控制第一进气管路100中气体的流量,第二进气管路200上设置有质量流量控制器210,用于控制第二进气管路200中气体的流量。此外,本示例中,压差检测装置600与第一进气管路100的连接端位于质量流量控制器(MFC)110的下游,压差检测装置600与预流管路300的连接端位于第二阀门520和泵310之间。In this embodiment, a mass flow controller (MFC) 110 is provided on the first intake pipe 100 to control the flow rate of gas in the first intake pipe 100, and a mass flow controller 210 is provided on the second intake pipe 200 to control the flow rate of gas in the second intake pipe 200. Furthermore, in this example, the connection end of the differential pressure detection device 600 to the first intake pipe 100 is located downstream of the mass flow controller (MFC) 110, and the connection end of the differential pressure detection device 600 to the pre-flow pipe 300 is located between the second valve 520 and the pump 310.

实施例2Example 2

如图2所示,本实施例提供的进气系统与实施例1中的方案基本相同,其不同之处在于,在本实施例中,进气系统还包括压力调节管路900,压力调节管路900与预流管路300连接,压力调节管路900上设置有质量流量控制器910,控制单元150还与质量流量控制器910通信连接。As shown in Figure 2, the intake system provided in this embodiment is basically the same as the solution in embodiment 1. The difference is that in this embodiment, the intake system also includes a pressure regulating pipeline 900, which is connected to the pre-flow pipeline 300. A mass flow controller 910 is provided on the pressure regulating pipeline 900, and the control unit 150 is also communicatively connected to the mass flow controller 910.

控制单元150不仅可以通过泵310对预流管路300的压力进行粗略调节,还可以通过调节压力调节管路900上的质量流量控制器910来对预流管路300的压力进行精确的控制。通过调节泵310的功率能够将预流管路300的压力控制在一定范围内,再通过质量流量控制器910对预流管路300的流量进行调节,进而能够对预流管路300的压力进行精确的控制,预流管路300的压力控制更为精准,进一步降低了第二进气管路200由预流管路300切换至第一进气管路100时的压力波动。The control unit 150 can not only coarsely adjust the pressure of the pre-flow line 300 through the pump 310, but also precisely control the pressure of the pre-flow line 300 by adjusting the mass flow controller 910 on the pressure regulating line 900. By adjusting the power of the pump 310, the pressure of the pre-flow line 300 can be controlled within a certain range. Then, by adjusting the flow rate of the pre-flow line 300 through the mass flow controller 910, the pressure of the pre-flow line 300 can be precisely controlled. The pressure control of the pre-flow line 300 is more accurate, which further reduces the pressure fluctuation when the second intake line 200 switches from the pre-flow line 300 to the first intake line 100.

在一些实施例中,也可以不设置泵310,单独通过压力调节管路900上的质量流量控制器910来控制预流管路300的压力。In some embodiments, the pump 310 may be omitted, and the pressure of the pre-flow line 300 may be controlled solely by the mass flow controller 910 on the pressure regulating line 900.

在本实施例中,第一管路切换装置为两位五通阀540,压力调节管路900与预流管路300通过两位五通阀540连接。第一管路切换装置采用两位五通阀540,有利于减少单个阀门的数量,优化管路设计,控制更为简单。In this embodiment, the first pipeline switching device is a two-position five-way valve 540, and the pressure regulating pipeline 900 and the pre-flow pipeline 300 are connected through the two-position five-way valve 540. The use of a two-position five-way valve 540 as the first pipeline switching device helps to reduce the number of individual valves, optimize pipeline design, and simplify control.

实施例3Example 3

如图3所示,本实施例提供的进气系统与实施例2中的方案基本相同,其不同之处在于,在本实施例中,进气系统还包括第一支路810、第二支路820和气源容纳器700,气源容纳器700用于容纳气源,第一支路810的进气端通过第二管路切换装置530与第二进气管路200连接,第一支路810的出气端与气源容纳器700的进气端连接,第二支路820的进气端与气源容纳器700的出气端连接,第二支路820的出气端通过第二管路切换装置530与第二进气管路200连接。As shown in Figure 3, the air intake system provided in this embodiment is basically the same as the scheme in embodiment 2. The difference is that in this embodiment, the air intake system also includes a first branch 810, a second branch 820, and an air source container 700. The air source container 700 is used to contain the air source. The air intake end of the first branch 810 is connected to the second air intake pipe 200 through the second pipe switching device 530. The air outlet end of the first branch 810 is connected to the air intake end of the air source container 700. The air intake end of the second branch 820 is connected to the air outlet end of the air source container 700. The air outlet end of the second branch 820 is connected to the second air intake pipe 200 through the second pipe switching device 530.

具体地,第二管路切换装置530为两位四通阀。Specifically, the second pipeline switching device 530 is a two-position four-way valve.

在本实施例中,气源容纳器700容纳DCE(二氯乙烯)液体,当第二管路切换装置530的1通路断开,2、3通路连通时,厂务端的氮气经过质量流量控制器210进入到第三进气管路830,并经过第一支路810进入到气源容纳器700中,通过鼓泡的方式用氮气携带DCE(气态)通过第二支路820进入到第二进气管路200中。In this embodiment, the gas source container 700 contains DCE (dichloroethylene) liquid. When the first passage of the second pipeline switching device 530 is disconnected and the second and third passages are connected, the nitrogen from the plant end enters the third inlet pipeline 830 through the mass flow controller 210, and then enters the gas source container 700 through the first branch 810. The nitrogen carries the DCE (gaseous) through the second branch 820 into the second inlet pipeline 200 by bubbling.

在本实施例中,第二进气管路200上设置有电子压力控制器(EPC)220,电子压力控制器220位于第二管路切换装置530的下游端,用于控制第二进气管路200的压力。通过电子压力控制器220能够确保从气源容纳器700中带出气体量能够精确控制,不会因为压力波动而造成气体量的波动。In this embodiment, an electronic pressure controller (EPC) 220 is provided on the second air intake pipe 200. The electronic pressure controller 220 is located downstream of the second pipe switching device 530 and is used to control the pressure of the second air intake pipe 200. The electronic pressure controller 220 ensures that the amount of gas carried out from the gas source container 700 can be accurately controlled, and that the amount of gas will not fluctuate due to pressure fluctuations.

在本实施例中,预流管路300上还设置有调节阀320,调节阀320位于泵310的上游且位于两位五通阀540的下游,调节阀320用于调节预流管路300的压力。具体地,调节阀320可以采用节流阀,通过控制节流阀的开度来对预流管路300的压力进行调节。In this embodiment, a regulating valve 320 is also provided on the pre-flow pipeline 300. The regulating valve 320 is located upstream of the pump 310 and downstream of the two-position five-way valve 540. The regulating valve 320 is used to regulate the pressure of the pre-flow pipeline 300. Specifically, the regulating valve 320 can be a throttle valve, and the pressure of the pre-flow pipeline 300 is regulated by controlling the opening degree of the throttle valve.

实施例4Example 4

本实施例提供了一种炉管设备,其包括上述实施例中的进气系统。This embodiment provides a furnace tube device, which includes the air intake system described in the above embodiment.

虽然以上描述了本申请的具体实施方式,但是本领域的技术人员应当理解,这仅是举例说明,本申请的保护范围是由所附权利要求书限定的。本领域的技术人员在不背离本申请的原理和实质的前提下,可以对这些实施方式做出多种变更或修改,但这些变更和修改均落入本申请的保护范围。While specific embodiments of this application have been described above, those skilled in the art should understand that these are merely illustrative examples, and the scope of protection of this application is defined by the appended claims. Those skilled in the art can make various changes or modifications to these embodiments without departing from the principles and essence of this application, but all such changes and modifications fall within the scope of protection of this application.

Claims (10)

一种进气系统,其特征在于,包括:An intake system, characterized in that it comprises: 第一进气管路;First intake pipe; 预流管路;Pre-flow piping; 第二进气管路,与所述第一进气管路和所述预流管路通过第一管路切换装置连接,所述第一管路切换装置配置为使得所述第二进气管路能够与所述第一进气管路和所述预流管路中的一者相连通;The second intake pipe is connected to the first intake pipe and the pre-flow pipe via a first pipe switching device, the first pipe switching device being configured to allow the second intake pipe to be connected to one of the first intake pipe and the pre-flow pipe. 压差检测装置,用于测量所述第一进气管路和所述预流管路之间的压差或所述第一进气管路和所述第二进气管路之间的压差;A differential pressure detection device is used to measure the differential pressure between the first intake pipe and the pre-flow pipe or between the first intake pipe and the second intake pipe. 压力调节装置,用于控制所述预流管路的压力;A pressure regulating device is used to control the pressure of the pre-flow pipeline; 控制单元,所述控制单元与所述压差检测装置通信连接,用于根据所述压差控制所述压力调节装置进而调节所述预流管路的压力。The control unit is communicatively connected to the differential pressure detection device and is used to control the pressure regulating device according to the differential pressure, thereby regulating the pressure of the pre-flow pipeline. 如权利要求1所述的进气系统,其特征在于,所述控制单元控制所述压力调节装置以将所述压差检测装置的测量结果调节至预设值。The intake system as claimed in claim 1, wherein the control unit controls the pressure regulating device to adjust the measurement result of the differential pressure detection device to a preset value. 如权利要求1所述的进气系统,其特征在于,所述压差检测装置为压差计,所述压差计设置于所述第一进气管路和所述预流管路或所述第二进气管路之间。The intake system as described in claim 1, wherein the differential pressure detection device is a differential pressure gauge, and the differential pressure gauge is disposed between the first intake pipeline and the pre-flow pipeline or the second intake pipeline. 如权利要求1所述的进气系统,其特征在于,所述压差检测装置包括泵,所述泵设置于所述预流管路上。The intake system as described in claim 1, wherein the differential pressure detection device includes a pump, and the pump is disposed on the pre-flow pipeline. 如权利要求1或4所述的进气系统,其特征在于,所述压差检测装置包括压力调节管路,所述压力调节管路与所述预流管路连接,所述压力调节管路上设置有质量流量控制器。The intake system as described in claim 1 or 4 is characterized in that the differential pressure detection device includes a pressure regulating pipeline, the pressure regulating pipeline is connected to the pre-flow pipeline, and a mass flow controller is provided on the pressure regulating pipeline. 如权利要求5所述的进气系统,其特征在于,所述压力调节管路与所述预流管路通过所述第一管路切换装置连接。The intake system as described in claim 5 is characterized in that the pressure regulating pipeline and the pre-flow pipeline are connected through the first pipeline switching device. 如权利要求4所述的进气系统,其特征在于,所述预流管路上还设置有调节阀,所述调节阀位于所述泵的上游,所述调节阀用于调节所述预流管路的压力。The intake system as described in claim 4 is characterized in that a regulating valve is further provided on the pre-flow pipeline, the regulating valve being located upstream of the pump, and the regulating valve being used to regulate the pressure of the pre-flow pipeline. 如权利要求1所述的进气系统,其特征在于,还包括第一支路、第二支路和气源容纳器,所述气源容纳器用于容纳气源,所述第一支路的进气端通过第二管路切换装置与所述第二进气管路连接,所述第一支路的出气端与所述气源容纳器的进气端连接,所述第二支路的进气端与所述气源容纳器的出气端连接,所述第二支路的出气端通过所述第二管路切换装置与所述第二进气管路连接。The air intake system as described in claim 1, characterized in that it further includes a first branch, a second branch, and an air source container, wherein the air source container is used to contain an air source, the air intake end of the first branch is connected to the second air intake pipe through a second pipe switching device, the air outlet end of the first branch is connected to the air intake end of the air source container, the air intake end of the second branch is connected to the air outlet end of the air source container, and the air outlet end of the second branch is connected to the second air intake pipe through the second pipe switching device. 如权利要求8所述的进气系统,其特征在于,所述第二进气管路上设置有电子压力控制器,所述电子压力控制器位于所述第二管路切换装置的下游端,用于控制所述第二进气管路的压力。The intake system as described in claim 8 is characterized in that an electronic pressure controller is provided on the second intake pipe, the electronic pressure controller being located downstream of the second pipe switching device and used to control the pressure of the second intake pipe. 一种炉管设备,其特征在于,其包括如权利要求1-9任意一项所述的进气系统,所述炉管设备包括反应腔室,所述第一进气管路与所述反应腔室连通。A furnace tube device, characterized in that it includes an air intake system as described in any one of claims 1-9, the furnace tube device including a reaction chamber, and a first air intake pipe communicating with the reaction chamber.
PCT/CN2025/091433 2024-05-29 2025-04-27 Gas intake system and furnace pipe apparatus Pending WO2025246757A1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
CN202410685462.5A CN121046813A (en) 2024-05-29 2024-05-29 Air intake system and furnace tube equipment
CN202410685462.5 2024-05-29

Publications (1)

Publication Number Publication Date
WO2025246757A1 true WO2025246757A1 (en) 2025-12-04

Family

ID=97811954

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/CN2025/091433 Pending WO2025246757A1 (en) 2024-05-29 2025-04-27 Gas intake system and furnace pipe apparatus

Country Status (2)

Country Link
CN (1) CN121046813A (en)
WO (1) WO2025246757A1 (en)

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103074675A (en) * 2011-12-09 2013-05-01 光达光电设备科技(嘉兴)有限公司 Gas system
US20150284848A1 (en) * 2014-04-07 2015-10-08 Asm Ip Holding B.V. Method for Stabilizing Reaction Chamber Pressure
CN117612920A (en) * 2024-01-23 2024-02-27 上海邦芯半导体科技有限公司 Reactive gas switching system and plasma processing apparatus

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103074675A (en) * 2011-12-09 2013-05-01 光达光电设备科技(嘉兴)有限公司 Gas system
US20150284848A1 (en) * 2014-04-07 2015-10-08 Asm Ip Holding B.V. Method for Stabilizing Reaction Chamber Pressure
CN117612920A (en) * 2024-01-23 2024-02-27 上海邦芯半导体科技有限公司 Reactive gas switching system and plasma processing apparatus

Also Published As

Publication number Publication date
CN121046813A (en) 2025-12-02

Similar Documents

Publication Publication Date Title
KR100980236B1 (en) Gas supply unit
JP4102564B2 (en) Improved pressure flow controller
US8240324B2 (en) Method and apparatus for in situ testing of gas flow controllers
US9556518B2 (en) Raw material gas supply apparatus for semiconductor manufacturing equipment
US8606412B2 (en) Method for detecting malfunction of valve on the downstream side of throttle mechanism of pressure type flow control apparatus
US20130036833A1 (en) Gas flow-rate verification system and gas flow-rate verification unit
EP1096351A1 (en) Parallel bypass type fluid feeding device, and method and device for controlling fluid variable type pressure system flow rate used for the device
CN111106366B (en) Fuel cell stack test board and back pressure control method thereof
JP3557087B2 (en) Mass flow controller flow rate verification system
WO2003102707A1 (en) Method for supplying gas while dividing to chamber from gas supply facility equipped with flow controller
JP2635929B2 (en) Mass flow controller absolute flow rate verification system
CN110528085A (en) A kind of control device and method of voltage input bottle pressure
CN117612920B (en) Reactive gas switching system and plasma processing apparatus
CN107607676B (en) Standard generation system for trace moisture in gas
WO2025246757A1 (en) Gas intake system and furnace pipe apparatus
JP2018065073A (en) Diluted hydrogen gas generator
JP2542695B2 (en) Plasma etching equipment
CN115931086A (en) Calibration system and calibration method for a mass flowmeter
JP2003167630A (en) Flow control device and flow control method
JPH08261399A (en) Gas holder parallel operation device and control method
JP3311762B2 (en) Mass flow controller and semiconductor device manufacturing equipment
CN218098290U (en) Off-line calibrating device of self-operated regulating valve
CN222861619U (en) Transmission chamber pressure control device and thin film deposition equipment
CN221580263U (en) Gas dilution system and gas dilution instrument
CN111122151A (en) Breathing valve flow testing device and testing method thereof