WO2025134281A1 - Photocurable composition for support material formed by inkjet 3d printer and use thereof, and support material and optically built-up article production method using said photocurable composition - Google Patents
Photocurable composition for support material formed by inkjet 3d printer and use thereof, and support material and optically built-up article production method using said photocurable composition Download PDFInfo
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- WO2025134281A1 WO2025134281A1 PCT/JP2023/045757 JP2023045757W WO2025134281A1 WO 2025134281 A1 WO2025134281 A1 WO 2025134281A1 JP 2023045757 W JP2023045757 W JP 2023045757W WO 2025134281 A1 WO2025134281 A1 WO 2025134281A1
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C64/00—Additive manufacturing, i.e. manufacturing of three-dimensional [3D] objects by additive deposition, additive agglomeration or additive layering, e.g. by 3D printing, stereolithography or selective laser sintering
- B29C64/30—Auxiliary operations or equipment
- B29C64/307—Handling of material to be used in additive manufacturing
- B29C64/314—Preparation
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C64/00—Additive manufacturing, i.e. manufacturing of three-dimensional [3D] objects by additive deposition, additive agglomeration or additive layering, e.g. by 3D printing, stereolithography or selective laser sintering
- B29C64/40—Structures for supporting 3D objects during manufacture and intended to be sacrificed after completion thereof
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B33—ADDITIVE MANUFACTURING TECHNOLOGY
- B33Y—ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3-D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3-D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
- B33Y70/00—Materials specially adapted for additive manufacturing
- B33Y70/10—Composites of different types of material, e.g. mixtures of ceramics and polymers or mixtures of metals and biomaterials
Definitions
- the present invention relates to a photocurable composition for a support material formed by an inkjet 3D printer, its use, and a method for producing a support material and a photo-modeled object using the photocurable composition.
- the inkjet 3D printer inks used in this photo-lithography method include a photo-curable composition for forming a molded body (model material) and a photo-curable composition for forming a support material used to prevent the model material from collapsing when stacking the model material in three dimensions.
- Patent Document 1 describes a photocurable composition for a support material that contains a water-soluble ethylenically unsaturated monomer that contains an ionic group and a counter ion, and a photopolymerization initiator, and discloses that the support material formed from the composition has excellent water solubility and sufficient hardness (i.e., sufficient supportability).
- Patent Document 2 describes a photocurable composition for a support material that contains a water-soluble ethylenically unsaturated monomer that contains an ionic group and a counter ion, and has a water content of 10 mass% or less relative to 100 mass% of the photocurable composition. It discloses that the composition has excellent curing properties, and that a support material formed from the composition has sufficient hardness and excellent solubility in a solvent.
- Photocurable compositions for support materials formed by inkjet 3D printers are required to have better water solubility and supportability after curing, as well as improved transparency of the cured product after curing. Therefore, an object of the present invention is to provide a photocurable composition that can enhance the solubility in water, supportability, and transparency of a cured product (support material) formed by an inkjet 3D printer.
- Z is a group represented by CH 2 ⁇ C(R 1 )-C( ⁇ O)-O-* or CH 2 ⁇ C(R 1 )-(CH 2 ) m -O-* (R 1 represents a hydrogen atom or an alkyl group having 1 to 4 carbon atoms which may have a substituent, m represents an integer of 0 to 6, and * represents a bond), R a represents an alkylene group having 1 to 4 carbon atoms; R b represents a hydrogen atom or an alkyl group having 1 to 4 carbon atoms;
- a process for forming a photo-modeled object precursor comprising: a process A for forming a supporting material layer by irradiating the photocurable composition according to any one of [1] to [9] with light; and a process B for forming a model material layer carried out at the same timing and/or at a different timing from the process A, each of which is repeated multiple times; and removing the supporting material composed of the supporting material layer from the optically shaped object precursor.
- a photocurable composition (I) according to any one of [1] to [9], a photocurable composition (II) different from the photocurable composition (I), A method of using the photocurable composition (I) by ejecting it from different ejection heads in an inkjet 3D printer.
- the present invention provides a photocurable composition that can improve the water solubility, supportability, and transparency of the cured product (support material) formed by an inkjet 3D printer.
- Photocurable composition for a support material formed by an inkjet 3D printer contains a polymerizable monomer (A) having an oxyalkylene group and a water-soluble polymerizable monomer (B) other than the polymerizable monomer (A).
- photocurable composition contains a polymerizable monomer (A) having an oxyalkylene group and a water-soluble polymerizable monomer (B) other than the polymerizable monomer (A).
- the photocurable composition described below is used for forming a support material by an inkjet 3D printer.
- the photocurable composition may be used as is as ink for an inkjet 3D printer, or may be a composition containing each component at a high concentration so that the photocurable composition can be used as ink for an inkjet 3D printer by mixing the photocurable composition with a solvent when used.
- the content of each component in the photocurable composition described below indicates the content in the photocurable composition when used as ink for an inkjet 3D printer, unless otherwise specified.
- Polymerizable monomer having an oxyalkylene group (A)
- the photocurable composition of the present invention contains a polymerizable monomer (A) having an oxyalkylene group.
- the solubility in water, supportability, and transparency of the obtained cured material (support material) are improved, and the transparency tends to be particularly improved.
- the term "polymerizable monomer” refers to a compound having one or more ethylenically unsaturated groups and polymerizing by light or the like.
- the number of oxyalkylene groups in one molecule of polymerizable monomer (A) is 1 or more, and is preferably 1 to 100, more preferably 2 to 80, even more preferably 4 to 60, and even more preferably 5 to 30.
- the polymerizable monomer (A) is preferably a monomer represented by the following formula (1x), and more preferably a monomer represented by the following formula (1).
- R a represents an alkylene group
- R b represents a hydrogen atom or a hydrocarbon group which may have a substituent
- n represents an integer of 1 or more
- x represents an integer of 1 to 4.
- n or x is an integer of 2 or more, a plurality of R a's and R b 's may be the same or different.
- the ethylenically unsaturated bond-containing group represented by Z is a monovalent to tetravalent group having one or more ethylenically unsaturated bonds.
- the valence corresponds to the number of bonds that the ethylenically unsaturated bond-containing group has for bonding to R a , and when x is 1 in formula (1x), Z is a monovalent group, and when x is 2 in formula (1x), Z is a divalent group.
- Z is a monovalent group.
- the number of ethylenically unsaturated bonds contained in the ethylenically unsaturated bond-containing group is preferably 1 to 3, and more preferably 1.
- the ethylenically unsaturated bond-containing group is preferably one having one ethylenically unsaturated group, for example, an alkene mono-, di-, tri-, or tetrayl group having about 2 to 10 carbon atoms, or a group in which the alkene mono-, di-, tri-, or tetrayl group is bonded to one or more divalent groups (such as a carbonyl group, -O-).
- the ethylenically unsaturated bond-containing group having one ethylenically unsaturated group more preferably has an ethylenically unsaturated bond at a terminal, even more preferably has a group represented by CH 2 ⁇ C(R 1 )-*, even more preferably a group represented by CH 2 ⁇ C(R 1 )-C( ⁇ O)-O-* or CH 2 ⁇ C(R 1 )-(CH 2 ) m -O-*, and particularly preferably a group represented by CH 2 ⁇ C(R 1 )-C( ⁇ O)-O-*.
- R 1 represents a hydrogen atom or an alkyl group having 1 to 4 carbon atoms which may have a substituent
- m represents an integer of 0 to 6
- * represents a bond.
- alkyl group having 1 to 4 carbon atoms represented by R 1 include a methyl group, an ethyl group, an n-propyl group, an isopropyl group, an n-butyl group, an isobutyl group, and a tert-butyl group.
- * represents a bond
- R represents a hydrocarbon group.
- Examples of the hydrocarbon group represented by R include the groups exemplified as the hydrocarbon group represented by R b described below. Among them, an alkyl group or an aromatic hydrocarbon group is preferable, and an alkyl group having 1 to 4 carbon atoms or an aromatic hydrocarbon group having 6 to 10 carbon atoms is more preferable.
- R 1 is preferably a hydrogen atom or an alkyl group having 1 to 4 carbon atoms, more preferably a hydrogen atom, a methyl group, or an ethyl group, and particularly preferably a hydrogen atom or a methyl group.
- the m is preferably an integer from 1 to 6, more preferably an integer from 1 to 4, and even more preferably 1 or 2.
- a compound in which Z in the above formula (1) is a group represented by CH 2 ⁇ C(R 1 )-C( ⁇ O)-O-*.
- the content of the compound in the above formula (1) in which Z is a group represented by CH 2 ⁇ C(R 1 )-C( ⁇ O)-O-* is preferably 30% by mass or more, more preferably 60% by mass or more, even more preferably 80% by mass or more, still more preferably 90% by mass or more, and may even be 100% by mass, in 100% by mass of polymerizable monomer (A).
- the alkylene group represented by R a may be linear or branched, but is preferably linear.
- the alkylene group represented by R a preferably has 1 to 6 carbon atoms, more preferably 1 to 4 carbon atoms, and further preferably 2 or 3 carbon atoms.
- alkylene group represented by R a examples include linear alkylene groups such as a methylene group, an ethylene group, a 1,3-propylene group, a 1,4-butylene group, a 1,5-pentylene group, and a 1,6-hexylene group; and branched alkylene groups such as a 1,2-propylene group, a 1,2-butylene group, a 1,3-butylene group, a 2,3-butylene group, and a 1,2-hexylene group.
- the alkylene group represented by R a is preferably an alkylene group having 1 to 4 carbon atoms, more preferably a linear alkylene group having 1 to 4 carbon atoms, and even more preferably a linear alkylene group having 2 or 3 carbon atoms.
- the hydrocarbon group represented by R b may be an aliphatic hydrocarbon group, an aromatic hydrocarbon group, or a combination thereof.
- Examples of the aliphatic hydrocarbon group include Alkyl groups (preferably alkyl groups having 1 to 4 carbon atoms), such as a methyl group, an ethyl group, an n-propyl group, an isopropyl group, an n-butyl group, an isobutyl group, or a tert-butyl group; alkenyl groups (preferably alkenyl groups having 2 to 6 carbon atoms) such as a vinyl group, an n-propenyl group, an isopropenyl group, a 1-butenyl group, a 2-butenyl group, a 1-pentenyl group, a 2-pentenyl group, a 2-methyl-1-butenyl group, a 2-methyl-2-butenyl group, or a 3-methyl-1-butenyl group; cycloalkyl groups (preferably cycloalkyl groups having 3 to 8 carbon atoms) such as cyclopropyl group, cyclobutyl group
- the aromatic hydrocarbon group may, for example, be a phenyl group, a methylphenyl group, a dimethylphenyl group, a trimethylphenyl group, a 4-tert-butylphenyl group, a naphthyl group, etc., and is preferably an aromatic hydrocarbon group having 6 to 10 carbon atoms.
- groups that combine the aliphatic hydrocarbon group and the aromatic hydrocarbon group include aralkyl groups such as benzyl and phenethyl groups, and preferably aralkyl groups having 7 to 12 carbon atoms.
- the hydrocarbon group represented by R b may have a substituent.
- substituents include the groups exemplified as the substituent that the alkyl group having 1 to 4 carbon atoms represented by R 1 may have, and the preferred embodiments thereof are also the same.
- R b is preferably a hydrogen atom or an alkyl group, more preferably a hydrogen atom or an alkyl group having 1 to 4 carbon atoms, further preferably a hydrogen atom, a methyl group, or an ethyl group, and particularly preferably a hydrogen atom or a methyl group.
- n is preferably an integer of 1 to 100, more preferably an integer of 2 to 80, even more preferably an integer of 4 to 60, and still more preferably an integer of 5 to 30.
- the polymerizable monomer (A) is a mixture of monomers having different values of n in the above formula (1), the above n can be the average value thereof.
- polymerizable monomer (A) examples include: (meth)acrylate compounds having an oxyethylene group, such as ethylene glycol (meth)acrylate, ethylene glycol methyl ether (meth)acrylate, polyethylene glycol (meth)acrylate having a repeat number of ethylene glycol (i.e., a repeat number of oxyethylene groups) of 2 to 100, and polyethylene glycol methyl ether (meth)acrylate having a repeat number of ethylene glycol (i.e., a repeat number of oxyethylene groups) of 2 to 100; (meth)acrylate compounds having an oxypropylene group, such as propylene glycol (meth)acrylate, propylene glycol monomethyl ether (meth)acrylate, polypropylene glycol (meth)acrylate having a propylene glycol repeat number (i.e., the oxypropylene group repeat number) of 2 to 100, and polypropylene glycol monomethyl ether (meth)acrylate having a propylene glyco
- polymerizable monomer (A) commercially available products can also be used.
- examples of commercially available products include NK Ester M-20G, M-40G, M-90G, M-130G, M-230G, M-450G, AM-90G, AM-130G, and AM-230G manufactured by Shin-Nakamura Chemical Co., Ltd.; and Blenmar (registered trademark) PME-100, PME-200, PME-400, PME-1000, PME-4000, and AME-400 manufactured by NOF Corporation.
- the photocurable composition of the present invention may contain one type of polymerizable monomer (A) alone, or two or more types of polymerizable monomers.
- the polymerizable monomer (A) preferably has a molecular weight distribution with a certain width, the molecular weight distribution is preferably unimodal or multimodal, and the molecular weight distribution of the polymerizable monomer (A) is more preferably unimodal or bimodal.
- the molecular weight distribution of the polymerizable monomer (A) can be measured by gel permeation chromatography (GPC), specifically, it can be measured under the same conditions as the measurement method of the weight average molecular weight of the polymerizable monomer (A) described later. In either case, the photocurable composition of the present invention tends to have excellent photocurability.
- the difference between the average number of oxyalkylene groups of the polymerizable monomer (A) having the largest average number of oxyalkylene groups and the average number of oxyalkylene groups of the polymerizable monomer (A) having the smallest average number of oxyalkylene groups is 5 or more, and more preferably 5 to 20.
- the usage ratio (A1:A2) is preferably 10:90 to 90:10, more preferably 30:70 to 70:30, and even more preferably 40:60 to 60:40, on a mass basis.
- the usage ratio (A3:A4) is preferably 10:90 to 90:10, more preferably 30:70 to 70:30, and even more preferably 40:60 to 60:40, on a mass basis.
- the weight average molecular weight of the polymerizable monomer (A) is not particularly limited, but is preferably 160 to 4500.
- the weight average molecular weight of the polymerizable monomer (A) can be measured by gel permeation chromatography (GPC), specifically, under the following conditions.
- Apparatus Tosoh Corporation high-speed GPC apparatus (HLC-8320GPC) Detector: RI Column: Showa Denko SHODEX (registered trademark), Asahipak (registered trademark), GF-310-HQ, GF-710-HQ, GF-1G 7B Column temperature: 40°C Flow rate: 0.5ml/min
- Calibration curve Polyacrylic Acid Standard manufactured by Sowa Science Co., Ltd.
- the content of the polymerizable monomer (A) is preferably 3 to 60% by mass, more preferably 5 to 45% by mass, and even more preferably 8 to 30% by mass, based on 100% by mass of the photocurable composition.
- the content of the polymerizable monomer (A) relative to 100% by mass of the total amount of polymerizable monomers contained in the photocurable composition of the present invention is preferably 15 to 85% by mass, more preferably 25 to 75% by mass, and even more preferably 35 to 70% by mass.
- the photocurable composition of the present invention contains a water-soluble polymerizable monomer (B) other than the polymerizable monomer (A). By containing the polymerizable monomer (B), the curability of the photocurable composition is improved, and the supportability and solubility in water of the obtained cured product are improved.
- the photocurable composition of the present invention may contain one type of polymerizable monomer (B) alone or two or more types of polymerizable monomers (B) may be contained.
- water-soluble polymerizable monomer refers to a polymerizable monomer having a water solubility at 20°C (hereinafter, water solubility (20°C)) of 20 g/L or more.
- water solubility (20°C) water solubility of 20°C
- Xg of polymerizable monomer temperature: 20°C
- 50 cc of ion-exchanged water temperature: 20°C
- 100 cc screw tube a 100 cc screw tube
- the water solubility (20°C) of the polymerizable monomer (B) is preferably 100 g/L or more, more preferably 200 g/L or more, and even more preferably 500 g/L or more.
- the content of the polymerizable monomer (B) is preferably 5 to 60 mass% in 100 mass% of the photocurable composition, more preferably 8 to 40 mass%, and even more preferably 10 to 25 mass%.
- the content of the polymerizable monomer (B) relative to 100% by mass of the total amount of polymerizable monomers contained in the photocurable composition of the present invention is preferably 15 to 85% by mass, more preferably 25 to 75% by mass, and even more preferably 30 to 65% by mass.
- the supportability of the obtained cured product can be further improved, and by adjusting the content of the polymerizable monomer (B) to be equal to or less than the above-mentioned specified value, the solubility in water of the obtained cured product can be further improved.
- the mass ratio (B/A) of the polymerizable monomer (B) to the polymerizable monomer (A) is preferably 0.1 to 5.0, more preferably 0.3 to 3.0, and even more preferably 0.5 to 2.0.
- the mass ratio (B/A) is preferably 0.1 to 5.0, more preferably 0.3 to 3.0, and even more preferably 0.5 to 2.0.
- the polymerizable monomer (B) preferably contains an ionic monomer having an ionic group (hereinafter, sometimes simply referred to as an ionic monomer).
- the ionic group may be an anionic group, and specifically may be a group obtained by removing a proton from an acidic group, such as a group obtained by removing a proton from a carboxy group, a group obtained by removing a proton from a phosphate group, or a group obtained by removing a proton from a sulfo group.
- the ionic group is preferably a group obtained by removing a proton from a carboxy group.
- the ionic monomer further has an ion (hereinafter, sometimes referred to as a counter ion) that pairs with the ionic group. It is preferable that the charges of the ionic group and the counter ion are balanced as a whole, that is, the ionic monomer is neutral as a whole.
- the counter ion is preferably a cation, specifically, a monovalent counter ion such as an alkali metal ion, such as a sodium ion or a potassium ion, or an ammonium ion; Polyvalent counter ions typified by polyvalent metal ions such as zinc ion, magnesium ion, calcium ion, aluminum ion, and neodymium ion; and the like.
- a monovalent counter ion such as an alkali metal ion, such as a sodium ion or a potassium ion, or an ammonium ion
- Polyvalent counter ions typified by polyvalent metal ions such as zinc ion, magnesium ion, calcium ion, aluminum ion, and neodymium ion; and the like.
- the counter ion is preferably a polyvalent metal ion, i.e., the ionic monomer preferably contains an ionic monomer having a polyvalent metal ion that pairs with the ionic group (hereinafter, may be referred to as a polyvalent metal ion-containing ionic monomer).
- the counter ion constituting the polyvalent metal ion-containing ionic monomer is not particularly limited as long as it is a polyvalent metal ion, but among them, it is preferably a divalent metal ion such as a zinc ion, magnesium ion, calcium ion, or neodymium ion, more preferably a zinc ion, magnesium ion, or calcium ion, and particularly preferably a zinc ion.
- a polyvalent metal ion-containing ionic monomer in combination with an ionic monomer having a monovalent cation as the counter ion (hereinafter, sometimes referred to as a monovalent cation-containing ionic monomer).
- the counter ion constituting the monovalent cation-containing ionic monomer is preferably an alkali metal ion or ammonium, more preferably a sodium ion, potassium ion or ammonium, and even more preferably a potassium ion.
- the content of the ionic monomer is preferably 30 to 100 mass% in 100 mass% of the polymerizable monomer (B), more preferably 50 to 100 mass%, even more preferably 80 to 100 mass%, and particularly preferably 95 to 100 mass%.
- the content of the ionic monomer is preferably 5 to 60% by mass, more preferably 8 to 40% by mass, and even more preferably 10 to 25% by mass, based on 100% by mass of the photocurable composition.
- the content of the ionic monomer relative to 100% by mass of the total amount of polymerizable monomers contained in the photocurable composition of the present invention is preferably 15 to 85% by mass, more preferably 25 to 75% by mass, and even more preferably 30 to 65% by mass.
- the content of the polyvalent metal ion-containing ionic monomer is, for example, 20 to 100% by mass, preferably 35% by mass or more, more preferably 50% by mass or more, even more preferably 65% by mass or more, even more preferably 80% by mass or more, and particularly preferably 90% by mass or more, based on 100% by mass of the polymerizable monomer (B).
- the content of the polyvalent metal ion-containing ionic monomer to the above range, the supportability of the obtained cured product can be further improved.
- the content of the polyvalent metal ion-containing ionic monomer to 50% by mass or more, the effect of improving the supportability tends to be further enhanced.
- the viscosity of the photocurable composition can be reduced.
- ejection defects in an inkjet 3D printer such as clogging of the ejection head, are less likely to occur, that is, ejection stability is improved.
- the content of the monovalent cation-containing ionic monomer may be, for example, 10% by mass or more, or 20% by mass or more, in 100% by mass of the polymerizable monomer (B).
- the content of the monovalent cation-containing ionic monomer may be 100% by mass in 100% by mass of the polymerizable monomer (B), but from the viewpoint of lowering the viscosity of the photocurable composition and further increasing the supportability of the obtained cured product, it is preferably 80% by mass or less, more preferably 50% by mass or less, even more preferably 35% by mass or less, even more preferably 20% by mass or less, particularly preferably 10% by mass or less, and may be 0% by mass.
- the mass ratio of the polyvalent metal ion-containing ionic monomer to the monovalent cation-containing ionic monomer contained in the photocurable composition is, for example, 20/80 to 100/0, preferably 35/65 to 100/0, more preferably 50/50 to 100/0, even more preferably 60/40 to 100/0, and particularly preferably 80/20 to 100/0.
- the ionic monomer containing a group obtained by removing a proton from a carboxy group as the ionic group is preferably a salt of an ethylenically unsaturated carboxylic acid.
- the salt of the ethylenically unsaturated carboxylic acid include monovalent salts such as alkali metal salts, such as sodium salts and potassium salts, and ammonium salts of the unsaturated carboxylic acid; and polyvalent salts represented by polyvalent metal salts, such as zinc salts, magnesium salts, calcium salts, aluminum salts, and neodymium salts.
- the ethylenically unsaturated carboxylic acid constituting the salt of the ethylenically unsaturated carboxylic acid is a carboxylic acid compound having an ethylenically unsaturated group, and specific examples thereof include aliphatic unsaturated carboxylic acids such as (meth)acrylic acid, maleic acid, fumaric acid, 2-(meth)acryloyloxyethylhexahydrophthalic acid, 2-(meth)acryloyloxyethylsuccinic acid, N-(meth)acryloylaspartic acid, and ⁇ -(meth)acroylalkane-1,1-dicarboxylic acid; and aromatic unsaturated carboxylic acids such as 2-(meth)acryloyloxybenzoic acid, 3-(meth)acryloyloxybenzoic acid, 4-(meth)acryloyloxybenzoic acid, 2-(meth)acryloyloxyethylphthalic acid, 2-vinyl
- the number of carbon atoms in the ethylenically unsaturated carboxylic acid constituting the salt of the ethylenically unsaturated carboxylic acid is preferably 3 to 15, more preferably 3 to 12, further preferably 3 to 9, and particularly preferably 3 to 6.
- the ionic monomer containing, as the ionic group, a group obtained by removing a proton from a phosphate group is preferably a salt of an ethylenically unsaturated phosphate.
- the salt of the ethylenically unsaturated phosphate include monovalent salts such as alkali metal salts, such as sodium salts and potassium salts, and ammonium salts of ethylenically unsaturated phosphate; and polyvalent salts represented by polyvalent metal salts, such as zinc salts, magnesium salts, calcium salts, aluminum salts, and neodymium salts.
- the ethylenically unsaturated phosphoric acid constituting the salt of the ethylenically unsaturated phosphoric acid is a phosphoric acid compound having an ethylenically unsaturated group, and specific examples thereof include mono(2-(meth)acryloyloxyethyl) acid phosphate, phenyl(2-(meth)acryloyloxyethyl) phosphate, acid phosphooxyethyl (meth)acrylate, (meth)acryloyloxypropyl acid phosphate, (meth)acryloyloxy-2-hydroxypropyl acid phosphate, (meth)acryloyloxy-3-hydroxypropyl acid phosphate, (meth)acryloyloxy-3-chloro-2-hydroxypropyl acid phosphate, vinyl phosphoric acid, and p-vinylbenzene phosphoric acid.
- the ionic monomer containing a group obtained by removing a proton from a sulfo group as the ionic group is preferably a salt of an ethylenically unsaturated sulfonic acid.
- the salt of the ethylenically unsaturated sulfonic acid include monovalent salts such as alkali metal salts, such as sodium salts and potassium salts, and ammonium salts of ethylenically unsaturated sulfonic acids; and polyvalent salts represented by polyvalent metal salts, such as zinc salts, magnesium salts, calcium salts, aluminum salts, and neodymium salts.
- the ethylenically unsaturated sulfonic acid constituting the salt of the ethylenically unsaturated sulfonic acid is a sulfonic acid compound having an ethylenically unsaturated group, and specific examples thereof include allylsulfonic acid, isoprene sulfonic acid, 2-(meth)acrylamide ethyl sulfonic acid, 3-(meth)acrylamide propyl sulfonic acid, 4-(meth)acrylamide butyl sulfonic acid, 2-(meth)acrylamide-2-methylpropanesulfonic acid, p-vinylbenzenesulfonic acid, and vinylsulfonic acid.
- the ionic monomer is preferably a salt of an ethylenically unsaturated carboxylic acid, more preferably a monovalent salt and/or a polyvalent metal salt of an ethylenically unsaturated carboxylic acid, even more preferably a polyvalent metal salt of an ethylenically unsaturated carboxylic acid, still more preferably a divalent metal salt such as a zinc salt, magnesium salt, calcium salt or neodymium salt of an ethylenically unsaturated carboxylic acid, particularly preferably a zinc salt, magnesium salt or calcium salt of an ethylenically unsaturated carboxylic acid, and most preferably a zinc salt of an ethylenically unsaturated carboxylic acid.
- the polyvalent metal salt of the ethylenically unsaturated carboxylic acid in combination with a monovalent salt of the ethylenically unsaturated carboxylic acid.
- the monovalent salt of the ethylenically unsaturated carboxylic acid is preferably an alkali metal salt or an ammonium salt of the ethylenically unsaturated carboxylic acid, more preferably a sodium salt, a potassium salt or an ammonium salt of the ethylenically unsaturated carboxylic acid, and even more preferably a potassium salt of the ethylenically unsaturated carboxylic acid.
- the ethylenically unsaturated carboxylic acid constituting the salt of the ethylenically unsaturated carboxylic acid is most preferably (meth)acrylic acid.
- the ionic monomer is preferably a salt of (meth)acrylic acid, more preferably a monovalent salt and/or a polyvalent metal salt of (meth)acrylic acid, even more preferably a polyvalent metal salt of (meth)acrylic acid, even more preferably a divalent metal salt such as zinc salt, magnesium salt, calcium salt, or neodymium salt of (meth)acrylic acid, particularly preferably a zinc salt, magnesium salt, or calcium salt of (meth)acrylic acid, and most preferably a zinc salt of (meth)acrylic acid.
- the polyvalent metal salt of (meth)acrylic acid is preferably an alkali metal salt or ammonium salt of (meth)acrylic acid, more preferably a sodium salt, potassium salt or ammonium salt of (meth)acrylic acid, and even more preferably a potassium salt of (meth)acrylic acid.
- the content of the salt of the ethylenically unsaturated carboxylic acid is preferably 30 to 100% by mass, more preferably 50 to 100% by mass, even more preferably 80 to 100% by mass, and particularly preferably 90 to 100% by mass, based on 100% by mass of the polymerizable monomer (B).
- the content of the salt of the ethylenically unsaturated carboxylic acid (particularly the salt of (meth)acrylic acid) relative to 100% by mass of the total amount of polymerizable monomers contained in the photocurable composition of the present invention i.e. the total amount of polymerizable monomers (A) to (C)
- the total amount of polymerizable monomers (A) to (C)) is preferably 15 to 85% by mass, more preferably 25 to 75% by mass, and even more preferably 30 to 65% by mass.
- the supportability of the obtained cured product can be further improved, and by adjusting the content of the polymerizable monomer (B) to the above-mentioned specified value or less, the solubility in water of the obtained cured product can be further improved.
- the content of the polyvalent metal salt of the ethylenically unsaturated carboxylic acid is, for example, 20 to 100% by mass, preferably 35% by mass or more, more preferably 50% by mass or more, even more preferably 65% by mass or more, and even more preferably 80% by mass or more, based on 100% by mass of the polymerizable monomer (B).
- the content of the polyvalent metal salt of the ethylenically unsaturated carboxylic acid is, for example, 20 to 100% by mass, preferably 35% by mass or more, more preferably 50% by mass or more, even more preferably 65% by mass or more, and even more preferably 80% by mass or more, based on 100% by mass of the polymerizable monomer (B).
- the content of the polyvalent metal salt of the ethylenically unsaturated carboxylic acid (particularly, the polyvalent metal salt of (meth)acrylic acid) to 50% by mass or more, the effect of improving the supportability tends to be further enhanced.
- the content of the polyvalent metal salt of the ethylenically unsaturated carboxylic acid (particularly, the polyvalent metal salt of (meth)acrylic acid) to 50% by mass or more (preferably 65% by mass or more, more preferably 80% by mass or more), the viscosity of the photocurable composition can be reduced.
- the content of the monovalent salt of the ethylenically unsaturated carboxylic acid may be, for example, 10% by mass or more, or 20% by mass or more, in 100% by mass of the polymerizable monomer (B).
- the content of the monovalent salt of the ethylenically unsaturated carboxylic acid may be 100% by mass in 100% by mass of the polymerizable monomer (B), but from the viewpoint of lowering the viscosity of the photocurable composition and further increasing the supportability of the obtained cured product, it is preferably 80% by mass or less, more preferably 50% by mass or less, even more preferably 35% by mass or less, even more preferably 20% by mass or less, particularly preferably 10% by mass or less, and may be 0% by mass.
- the mass ratio of the polyvalent metal salt of an ethylenically unsaturated carboxylic acid to the monovalent salt of an ethylenically unsaturated carboxylic acid (polyvalent metal salt of an ethylenically unsaturated carboxylic acid/monovalent salt of an ethylenically unsaturated carboxylic acid) contained in the photocurable composition is, for example, 20/80 to 100/0, preferably 35/65 to 100/0, more preferably 50/50 to 100/0, even more preferably 60/40 to 100/0, and particularly preferably 80/20 to 100/0.
- the mass ratio of the polyvalent metal salt of (meth)acrylic acid to the monovalent salt of (meth)acrylic acid (polyvalent metal salt of (meth)acrylic acid/monovalent salt of (meth)acrylic acid) contained in the photocurable composition to the above range.
- the above mass ratio i.e., polyvalent metal salt of ethylenically unsaturated carboxylic acid/monovalent salt of ethylenically unsaturated carboxylic acid, preferably polyvalent metal salt of (meth)acrylic acid/monovalent salt of (meth)acrylic acid
- 50/50 to 100/0 more preferably 60/40 to 100/0, and even more preferably 80/20 to 100/0.
- polymerizable monomers (B) other than the above ionic monomers include (meth)acrylic acid; methyl (meth)acrylate; (meth)acryloylmorpholine; N-vinylpyrrolidone; acrylamides such as (meth)acrylamide, N,N-dimethylacrylamide, N-hydroxyethylacrylamide, and N-isopropylacrylamide; and the like.
- the total content of polymerizable monomer (A) and polymerizable monomer (B) relative to 100% by mass of the total amount of polymerizable monomers contained in the photocurable composition of the present invention is preferably 50 to 100% by mass or more, more preferably 70% by mass or more, even more preferably 90% by mass or more, and particularly preferably 98% by mass or more.
- the photocurable composition of the present invention may contain a polymerizable monomer (C) other than the above-mentioned polymerizable monomers (A) and (B) (for example, a polymerizable monomer having a water solubility (20° C.) of less than 20 g/L).
- Examples of the polymerizable monomer (C) include: Ethyl (meth)acrylate, propyl (meth)acrylate, butyl (meth)acrylate, 2-ethylhexyl (meth)acrylate, pentyl (meth)acrylate, isoamyl (meth)acrylate, octyl (meth)acrylate, isooctyl (meth)acrylate, isononyl (meth)acrylate, decyl (meth)acrylate, isodecyl (meth)acrylate, lauryl (meth)acrylate, tridecyl (meth)acrylate, isomyristyl (meth)acrylate, isostearyl (meth)acrylate, n-stearyl (meth)acrylate alicyclic hydrocarbon group-containing (meth)acrylates such as cyclohexyl (meth)acrylate, t-butylcyclohexyl (meth)
- the content of the polymerizable monomer (C) is preferably 30% by mass or less, more preferably 10% by mass or less, and particularly preferably less than 2% by mass, based on 100% by mass of the photocurable composition.
- the total content of the polymerizable monomer (A), the polymerizable monomer (B), and the polymerizable monomer (C) is preferably 80% by mass or less, more preferably 60% by mass or less, even more preferably less than 50% by mass, even more preferably 45% by mass or less, and particularly preferably 40% by mass or less, in 100% by mass of the photocurable composition.
- the total content of the polymerizable monomer (A), the polymerizable monomer (B), and the polymerizable monomer (C) is preferably 8% by mass or more, more preferably 15% by mass or more, and even more preferably 20% by mass or more, based on 100% by mass of the photocurable composition.
- the total content of the polymerizable monomer (A), the polymerizable monomer (B), and the polymerizable monomer (C) is preferably 8 to 80 mass%, more preferably 15 to 60 mass%, even more preferably 20 mass% or more and less than 50 mass%, still more preferably 20 to 45 mass%, and particularly preferably 20 to 40 mass%, in 100 mass% of the photocurable composition.
- the supportability of the resulting cured product can be increased even if the total amount of polymerizable monomers in the photocurable composition is at least.
- the polyvalent metal ion-containing ionic monomer preferably a polyvalent metal salt of an ethylenically
- the viscosity of the photocurable composition can be kept low even if the content of the polymerizable monomer in the photocurable composition is high.
- the viscosity of the photocurable composition can be kept low by adjusting the content of the polyvalent metal ion-containing ionic monomer (preferably a polyvalent metal salt of an ethylenically unsaturated carboxylic acid, more preferably a polyvalent metal salt of (meth)acrylic acid) to 50 to 100% by mass in 100% by mass of the polymerizable monomer (B).
- the polyvalent metal ion-containing ionic monomer preferably a polyvalent metal salt of an ethylenically unsaturated carboxylic acid, more preferably a polyvalent metal salt of (meth)acrylic acid
- Organic acid and/or salt thereof The photocurable composition of the present invention may contain an organic acid and/or a salt thereof. By containing an organic acid and/or a salt thereof, storage stability is further improved. Note that the organic acid and/or a salt thereof is a compound that does not have a polymerizable unsaturated group, that is, the above polymerizable monomers (A) to (C) are not included.
- Examples of the organic acid include organic carboxylic acids, organic sulfonic acids, and organic phosphoric acids.
- the organic carboxylic acid include aliphatic carboxylic acids such as formic acid, acetic acid, propionic acid, butyric acid, valeric acid, hexanoic acid, heptanoic acid, octanoic acid, octylic acid, nonanoic acid, decanoic acid, lauric acid, myristic acid, palmitic acid, stearic acid, behenic acid, tridecanoic acid, pentadecanoic acid, heptadecanoic acid, lactic acid, malic acid, citric acid, oxalic acid, malonic acid, succinic acid, fumaric acid, adipic acid, glycine, polyacrylic acid, and polylactic acid; and aromatic carboxylic acids such as benzoic acid, phthalic acid, and salicylic acid.
- organic sulfonic acid examples include p-toluenesulfonic acid.
- organic phosphoric acid examples include phenylphosphonic acid.
- organic carboxylic acids are preferred, aliphatic carboxylic acids are more preferred, and lactic acid, propionic acid, and polyacrylic acid are even more preferred.
- the salt of the organic acid is preferably a metal salt of the organic acid, and specific examples thereof include alkali metal salts such as lithium salts, sodium salts, and potassium salts of the organic acids described above; and alkaline earth metal salts such as magnesium salts, calcium salts, strontium salts, and barium salts of the organic acids described above. Of these, alkali metal salts of the organic acids described above are preferred, and potassium salts of the organic acids described above are more preferred.
- organic acids and/or salts thereof may be contained in the photocurable composition of the present invention either alone or in combination of two or more kinds.
- the organic acid and/or its salt are preferably an organic carboxylic acid or a metal salt of an organic carboxylic acid, more preferably an aliphatic carboxylic acid or a metal salt of an aliphatic carboxylic acid, and even more preferably lactic acid, a metal salt of lactic acid, propionic acid, a metal salt of propionic acid, polyacrylic acid, or a metal salt of polyacrylic acid.
- the content of the organic acid and/or its salt is, for example, 0 to 20% by mass in 100% by mass of the photocurable composition.
- the content is preferably 0.1 to 20% by mass, more preferably 0.5 to 10% by mass, and even more preferably 1 to 5% by mass.
- Photopolymerization initiator The photocurable composition of the present invention may contain a photopolymerization initiator.
- the photopolymerization initiator include: Benzoin compounds such as benzoin, benzoin methyl ether, benzoin ethyl ether, benzoin propyl ether, and benzoin isobutyl ether; Acetophenone compounds such as acetophenone, 2-hydroxy-2-methyl-1-phenylpropan-1-one, diethoxyacetophenone, 1-hydroxycyclohexyl phenyl ketone, 1-[4-(2-hydroxyethoxy)-phenyl]-2-hydroxy-methylpropanone, 2-methyl-1-[4-(methylthio)phenyl]-2-morpholinopropan-1-one, and 2-benzyl-2-dimethylamino-1-(4-morpholinophenyl)-butan-1-one; Anthraquinone compounds such as 2-ethylanthraquinone, 2-
- the photopolymerization initiator is Benzoin compounds, acetophenone compounds, ketal compounds, and phosphine oxide compounds are preferred; Benzoin compounds; ⁇ -hydroxyacetophenone compounds such as 2-hydroxy-2-methyl-1-phenylpropan-1-one, 1-hydroxycyclohexyl phenyl ketone, and 1-[4-(2-hydroxyethoxy)-phenyl]-2-hydroxy-methylpropanone; ⁇ -aminoacetophenone compounds such as 2-methyl-1-[4-(methylthio)phenyl]-2-morpholinopropan-1-one and 2-benzyl-2-dimethylamino-1-(4-morpholinophenyl)-butan-1-one; benzyl ketal compounds such as benzyl dimethyl ketal and benzyl diethyl ketal; acylphosphine oxide compounds such as 2,4,6-trimethylbenzoyldiphenylphosphine oxide, bis-(2,
- the content of the photopolymerization initiator is preferably 0.05 to 10.0% by mass, more preferably 0.1 to 7.0% by mass, and even more preferably 0.2 to 5.0% by mass, based on 100% by mass of the photocurable composition. By adjusting the content of the photopolymerization initiator within the above range, the curability can be further improved.
- the content of the photopolymerization initiator is preferably 0.5 to 20 parts by mass, more preferably 1.0 to 15 parts by mass, and even more preferably 3.0 to 10 parts by mass, relative to 100 parts by mass of the total of the polymerizable monomers (A) to (C) (particularly, the total of the polymerizable monomer (A) and the polymerizable monomer (B)).
- the photocurable composition of the present invention may contain a polymerization inhibitor within a range that does not impair the effects of the present invention. By containing a polymerization inhibitor, the thermal stability of the photocurable composition is improved.
- Polymerization inhibitors include: Phenols with a molecular weight of less than 300, such as hydroquinone, catechol, resorcin, p-methoxyphenol, t-butylcatechol, t-butylhydroquinone, pyrogallol, 2,4-dihydroxybenzophenone, 2,6-di-t-butyl-p-cresol, butylated hydroxyanisole, and 2,6-di-t-butyl-4-ethylphenol; 2,2'-methylenebis(4-methyl-6-t-butylphenol), 2,2'-methylenebis(4-ethyl-6-t-butylphenol), 4,4'-thiobis(3 bisphenols such as 4,4'-(2,3-dimethyl-tetramethylene)dipyrocatechol; stearyl- ⁇ -(3,5-di-t-butyl-4-hydroxyphenyl)propionate, 3,4, 5-Trihydroxybenzoic acid
- polymerization inhibitors may be used alone or in combination of two or more types.
- the total amount of the phenol-based antioxidant, the sulfur-based antioxidant, the phosphorus-based antioxidant, the hindered amine-based antioxidant, and the alkoxyamine radical is preferably 50 to 100% by mass, more preferably 80% by mass or more, even more preferably 90% by mass or more, and particularly preferably 95% by mass or more.
- the photocurable composition of the present invention may contain a solvent within a range that does not impair the effects of the present invention.
- the solvent include water, monohydric alcohol, glycol, glycol ether, glycol ether acetate, and trihydric alcohol.
- the monohydric alcohol examples include methanol, ethanol, and propanol, and preferably have 1 to 5 carbon atoms.
- glycol examples include: Alkylene glycols such as ethylene glycol, propylene glycol, 1,3-butylene glycol, hexylene glycol, and 1,2-hexanediol (preferably, C 2-6 alkylene glycol); Polyalkylene glycols having a total number of repeating alkylene glycol units (i.e., the number of repeating oxyalkylene groups) of 2 or more (preferably 2 to 20, more preferably 2 to 10), such as diethylene glycol, triethylene glycol, dipropylene glycol, tripropylene glycol, and a copolymer of ethylene glycol and propylene glycol.
- Alkylene glycols such as ethylene glycol, propylene glycol, 1,3-butylene glycol, hexylene glycol, and 1,2-hexanediol (preferably, C 2-6 alkylene glycol)
- glycol ether examples include propylene glycol monomethyl ether, dipropylene glycol monomethyl ether, dipropylene glycol monopropyl ether, and propylene glycol monopropyl ether, and preferably (poly)C 2-3 alkylene glycol C 1-4 alkyl ether.
- glycol ether acetate examples include propylene glycol monomethyl ether acetate and propylene glycol monoethyl ether acetate, and preferably (poly)C 2-3 alkylene glycol mono C 1-4 alkyl ether acetate.
- trihydric alcohol examples include glycerol.
- glycols (poly) C2-6 alkylene glycols containing an alkylene chain having 2 to 6 carbon atoms as the alkylene chain constituting the glycol molecule are preferred, (poly) C2-3 alkylene glycols containing an alkylene chain having 2 and/or 3 carbon atoms are more preferred, and (poly)propylene glycols containing an alkylene chain having 3 carbon atoms are even more preferred.
- the above glycol preferably contains at least a C2-6 alkylene glycol, more preferably contains at least ethylene glycol and/or propylene glycol, and even more preferably contains at least propylene glycol.
- the content of C 2-6 alkylene glycol (particularly the content of propylene glycol) is preferably from 20 to 100% by mass, more preferably from 30 to 95% by mass, and even more preferably from 40 to 90% by mass, based on 100% by mass of the solvent.
- the glycol preferably contains a C 2-6 alkylene glycol and a poly C 2-6 alkylene glycol, more preferably contains ethylene glycol and/or propylene glycol and polyethylene glycol and/or polypropylene glycol, further preferably contains ethylene glycol and/or propylene glycol and a polyethylene glycol having an ethylene glycol repeat number (i.e., the number of oxyethylene group repeats) of 2 to 20 and/or a polypropylene glycol having a propylene glycol repeat number (i.e., the number of oxypropylene group repeats) of 2 to 20, and particularly preferably contains propylene glycol and a polyethylene glycol having an ethylene glycol repeat number (i.e., the number of oxyethylene group repeats) of 2 to 10 and/or a polypropylene glycol having a propylene glycol repeat number (i.e., the number of oxypropylene group repeats) of 2 to 10.
- ethylene glycol repeat number i.e
- the compatibility between the polymer obtained by curing the photocurable composition of the present invention and the solvent becomes good, probably because of the good compatibility with the polymerizable monomer (A), and the transparency of the obtained support material is enhanced. As a result, the surface properties of the resulting stereolithographic object tend to be improved.
- the total content of the C 2-6 alkylene glycol and poly C 2-6 alkylene glycol is preferably from 50 to 100% by mass, more preferably from 70 to 100% by mass, and even more preferably from 80 to 100% by mass, in 100% by mass of the solvent.
- the content of poly C2-6 alkylene glycol per 100 parts by mass of C2-6 alkylene glycol is preferably 5 to 200 parts by mass, more preferably 10 to 150 parts by mass, and even more preferably 20 to 120 parts by mass.
- the content of the polyC 2-6 alkylene glycol per 100 parts by mass of the polymerizable monomer (A) is preferably from 10 to 500 parts by mass, more preferably from 30 to 450 parts by mass, and even more preferably from 50 to 400 parts by mass.
- the solvent may contain water, but the content is preferably small.
- the content of water is preferably 0 to 10% by mass, more preferably 5% by mass or less, and even more preferably 3% by mass or less, based on 100% by mass of the photocurable composition.
- the water content in the photocurable composition can be calculated from the water content of each compound added, or can be determined by Karl Fischer measurement.
- the total content of the above solvents is preferably 20 to 90% by mass, more preferably 30 to 85% by mass, even more preferably 40 to 80% by mass, and even more preferably 50 to 80% by mass or 55 to 80% by mass.
- the photocurable composition of the present invention may contain other additives as necessary within the range that does not impair the effects of the present invention.
- the additives include known additives such as photoinitiator assistants, surfactants, colorants, chain transfer agents, fillers, emulsion stabilizers, penetration promoters, UV absorbers, preservatives, antifungal agents, rust inhibitors, pH adjusters, surface tension adjusters, antifoaming agents, viscosity adjusters, dispersants, dispersion stabilizers, chelating agents, drying inhibitors (wetting agents), discoloration inhibitors, resistivity adjusters, and film adjusters.
- photoinitiator assistants such as photoinitiator assistants, surfactants, colorants, chain transfer agents, fillers, emulsion stabilizers, penetration promoters, UV absorbers, preservatives, antifungal agents, rust inhibitors, pH adjusters, surface tension adjusters, antifoaming agents, viscosity adjusters, dispersants, dispersion
- photoinitiator assistants include tertiary amine compounds such as N,N-dimethylaniline, N,N-diethylaniline, N,N-dimethyl-p-toluidine, N,N-dimethylamino-p-benzoic acid ethyl ester, N,N-dimethylamino-p-benzoic acid isoamyl ethyl ester, N,N-dihydroxyethylaniline, triethylamine, and N,N-dimethylhexylamine.
- tertiary amine compounds such as N,N-dimethylaniline, N,N-diethylaniline, N,N-dimethyl-p-toluidine, N,N-dimethylamino-p-benzoic acid ethyl ester, N,N-dimethylamino-p-benzoic acid isoamyl ethyl ester, N,N-dihydroxy
- Surfactants include PEG-type nonionic surfactants such as 1-40 mole ethylene oxide (hereinafter abbreviated as EO) adduct of nonylphenol and 1-40 mole EO adduct of stearic acid; polyhydric alcohol-type nonionic surfactants such as sorbitan palmitate monoester, sorbitan stearate monoester, and sorbitan stearate triester; fluorine-containing surfactants such as 1-50 mole EO adduct of perfluoroalkyl, perfluoroalkyl carboxylate, and perfluoroalkyl betaine; modified silicone oils such as polyether-modified silicone oil and (meth)acrylate-modified silicone oil; etc.
- EO ethylene oxide
- Colorants include toluidine red, permanent carmine FB, fast yellow G, disazo yellow AAA, disazo orange PMP, soluble azo pigments, condensed azo pigments, chelate azo pigments, phthalocyanine blue, indanthrone blue, quinacridone red, dioxazine violet, basic dyes, acid dyes, aniline black, daylight fluorescent pigments, nitroso pigments, nitro pigments, natural pigments, metal oxides as inorganic pigments, carbon black, etc.
- Chain transfer agents include hydroquinone, diethylmethylamine, diphenylamine, diethyl disulfide, di-1-octyl disulfide, toluene, xylene, 1-butene, 1-nonene, dichloromethane, carbon tetrachloride, methanol, 1-butanol, ethyl thiol, 1-octyl thiol, acetone, methyl ethyl ketone, 2-methyl-2-propyl aldehyde, 1-pentyl aldehyde, phenol, m-cresol, p-cresol, and o-cresol.
- Fillers include alumina powder, silica powder, talc, mica, clay, aluminum hydroxide, calcium carbonate, calcium silicate, aluminum powder, copper powder, carbon fiber, glass fiber, cotton fiber, nylon fiber, acrylic fiber, rayon fiber, microballoons, carbon black, metal sulfides, and wood powder.
- the above additives may be used alone or in combination of two or more kinds.
- the content of the additives may be appropriately adjusted depending on the additives used, but is preferably 0 to 30 mass%, more preferably 0.05 to 20 mass%, and even more preferably 0.05 to 10 mass% or 0.05 to 5 mass%, relative to 100 mass% of the photocurable composition.
- the photocurable composition of the present invention can be prepared using the various components described above, and the preparation means and conditions are not particularly limited, but examples thereof include a method of stirring and mixing using a mixing or stirring device such as a general stirring blade or ultrasonic homogenizer, a high-speed homogenizer, a high-pressure homogenizer, a planetary stirring device, a three-roll mill, a ball mill, a Kitty mill, a disk mill, a pin mill, a Dyno mill, etc.
- the mixture obtained by stirring and mixing may be filtered using various filters.
- the photocurable composition of the present invention preferably has a viscosity of 20 mPa ⁇ s or less at the ejection temperature. Moreover, from the viewpoint of discharge stability, the photocurable composition of the present invention preferably has a low viscosity at 25°C. Specifically, the viscosity is preferably 300 mPa ⁇ s or less, more preferably 200 mPa ⁇ s or less, even more preferably 150 mPa ⁇ s or less, and particularly preferably 100 mPa ⁇ s or less.
- the lower limit is not particularly limited, but is, for example, 5 mPa ⁇ s or more, preferably 20 mPa ⁇ s or more.
- the viscosity of the photocurable composition can be measured using an E-type viscometer in accordance with JIS Z 8803.
- the photocurable composition of the present invention preferably has a surface tension of 25 to 70 mN/m at 25°C.
- the surface tension of the photocurable composition can be measured, for example, using a bubble pressure type dynamic surface tensiometer BP100 (manufactured by KRUSS).
- the photocurable composition of the present invention has excellent curability.
- the photocurable composition of the present invention is preferably cured by irradiation with ultraviolet light of 100 to 3000 mJ/ cm2 .
- curing means that the composition is no longer liquid and loses fluidity.
- the cured product obtained by using the photocurable composition of the present invention has excellent supportability.
- the supportability refers to the ability of the cured product obtained by curing the photocurable composition to support a model material.
- the hardness of a plate-shaped cured product (thickness 3 mm) obtained by irradiating the photocurable composition of the present invention with ultraviolet light of 100 mW/cm 2 for 3 minutes is measured using a type E durometer
- the hardness 0 seconds after the start of measurement is preferably 65 or more, more preferably 75 or more, even more preferably 80 or more, and particularly preferably 85 or more or more than 85.
- the cured product formed from the photocurable composition of the present invention preferably has a property of being easily removable by water.
- a piece of the cured product (2 cm x 2 cm x 3 mm thick) obtained by irradiating the photocurable composition of the present invention with 100 mW/ cm2 ultraviolet light for 3 minutes is added to 50 mL of water at 25°C and left to stand for 3 hours, preferably 50% by mass or more of the cured product piece dissolves, more preferably 80% by mass or more of the cured product piece dissolves, and particularly preferably all of the cured product piece dissolves.
- the cured product formed from the photocurable composition of the present invention has excellent transparency.
- the present inventors have discovered that the more transparent the cured product formed from the photocurable composition for supporting material is (specifically, the lower the haze of the cured product is), the cleaner (less rough) the surface state of the resulting photomodeled product (model material) is.
- the supporting material is made of a photocurable composition in which a polymerizable monomer with high water solubility is dissolved or dispersed (i.e., a photocurable composition with water affinity)
- the model material is made of a photocurable composition in which a polymerizable monomer with low water solubility is dissolved or dispersed (i.e., a photocurable composition with low water affinity)
- the more transparent the cured product (supporting material) formed from the photocurable composition for supporting material with water affinity is, the more difficult it is for the photocurable composition for supporting material to mix with the photocurable composition for model material with low water affinity.
- the photocurable composition for supporting material and the photocurable composition for model material are discharged, the separation of the interface between them is enhanced, and it is considered that a photomodeled product (model material) with a clean surface derived from the interface is obtained.
- the photocurable composition of the present invention is irradiated with ultraviolet light at 100 mW/ cm2 for 3 minutes to obtain a plate-shaped cured product piece (thickness: 2 mm) and the haze is measured using a turbidity meter
- the haze is preferably 70% or less, more preferably 50% or less, even more preferably 10% or less, and particularly preferably less than 5%.
- Cartridge for inkjet 3D printer The photocurable composition is used as an ink for inkjet 3D printers.
- the photocurable composition is usually filled into a cartridge for inkjet 3D printers for use.
- the inkjet 3D printer cartridge may be filled with the photocurable composition, and any cartridge for inkjet 3D printers may be used in the form of a known cartridge.
- the support material of the present invention is manufactured by irradiating the photocurable composition with light. That is, the method for manufacturing a support material of the present invention may include a step of irradiating the photocurable composition with light, and specifically, it is preferable to include a step of discharging the photocurable composition from the discharge head of an inkjet 3D printer (discharge step a) and a step of irradiating the discharged photocurable composition with light (light irradiation step a) to form a support material layer A. By repeatedly performing this support material layer formation step A, the support material layers can be laminated to produce a support material of the desired shape. In the discharge step a, a known method can be used other than using the photocurable composition.
- the light irradiation step a can also be carried out by a known method.
- the light to be irradiated to the photocurable composition can be ultraviolet light, near ultraviolet light, visible light, infrared light, far infrared light, electron beams, alpha rays, gamma rays, X-rays, etc., with ultraviolet light being preferred.
- the exposure dose during light irradiation is preferably from 100 mJ/cm 2 to 3000 mJ/cm 2 , more preferably from 100 to 2000 mJ/cm 2 , and even more preferably from 100 to 1000 mJ/cm 2 .
- the method for producing a photo-modeled object of the present invention includes the steps of: a forming step of a modeled object precursor, in which a forming step A of a supporting material layer in which the photocurable composition is irradiated with light and a forming step B of a model material layer carried out at the same timing and/or different timing as the forming step A are each repeated multiple times; and removing the support material formed of the support material layer from the optically shaped object precursor.
- the step A of forming the support material layer preferably includes a step of ejecting the above-mentioned photocurable composition (I) from the ejection head of an inkjet 3D printer (ejection step a) and a step of irradiating the ejected photocurable composition (I) with light (light irradiation step a).
- the support material layers can be stacked to produce a support material of the desired shape.
- the preferred aspects of the ejection step a and the light irradiation step a are the same as those described above.
- the model material layer forming process B preferably includes a process of irradiating light to a photocurable composition for the model material (hereinafter sometimes referred to as photocurable composition (II)). Specifically, it preferably includes a process (discharging process b) of discharging the photocurable composition (II) from the discharge head of the inkjet 3D printer, and a process (light irradiation process b) of irradiating the discharged photocurable composition (II) with light.
- a process of irradiating light to a photocurable composition for the model material hereinafter sometimes referred to as photocurable composition (II)
- a process (light irradiation process b) of irradiating the discharged photocurable composition (II) with light By repeatedly performing this model material layer forming process B, model material
- the ejection step b in the model material layer formation step B is a step of ejecting the photocurable composition (II) from the ejection head of the inkjet 3D printer.
- a known method can be used.
- the ejection head that ejects the photocurable composition (I) in the ejection step a is different from the ejection head that ejects the photocurable composition (II) in the ejection step b.
- the inkjet 3D printer used in the present invention is preferably equipped with an ejection head for ejecting the photocurable composition (I) and an ejection head for ejecting the photocurable composition (II).
- the light irradiation step b in the model material layer formation step B is a step of irradiating the photocurable composition (II) discharged in the discharge step b with light, and a known method can be used.
- the preferred embodiment of the light irradiation step b is the same as the preferred embodiment of the light irradiation step a.
- the optically shaped object precursor composed of the supporting material and the model material is manufactured by repeating each of the forming steps A and B a plurality of times.
- the optically shaped object precursor can be manufactured by stacking layers of the desired optically shaped object precursor finely divided into thin pieces, and each layer can be a layer consisting of only a supporting material, a layer consisting of only a modeling material, or a layer consisting of a supporting material and a modeling material (i.e., a layer in which a supporting material and a modeling material are present on the same plane).
- the forming step A When forming a layer consisting of only a supporting material, the forming step A is carried out, when forming a layer consisting of only a modeling material, the forming step B is carried out, and when forming a layer consisting of a supporting material and a modeling material, the forming step A and the forming step B can be carried out simultaneously.
- the desired optically shaped object precursor can be manufactured.
- the order of forming step A, forming step B, and the step of simultaneously carrying out forming step A and forming step B, as well as the number of repetitions, may be appropriately adjusted according to the desired shape of the optically shaped object precursor.
- the discharge step a and the discharge step b may be performed simultaneously, or may be performed at different times, such as performing the discharge step b after the discharge step a, or performing the discharge step a after the discharge step b.
- the separation of the interface between the photocurable composition (I) and the photocurable composition (II) discharged by the discharge step a and the discharge step b is increased.
- the light irradiation step a and the light irradiation step b can be performed while the separation of the interface is increased, a photo-molded object (model material) with a clean surface derived from the interface can be obtained.
- the photocurable composition (II) used in the formation process B is preferably a composition containing a polymerizable monomer (D) and a photopolymerization initiator.
- the polymerizable monomer (D) is not particularly limited as long as it is a compound having one or more ethylenically unsaturated groups and is polymerizable by light or the like.
- the content of the polymerizable monomer having a water solubility (20° C.) of less than 20 g/L is preferably 50 to 100 mass%, and more preferably 60 to 100 mass%, based on 100 mass% of the polymerizable monomer (D), from the viewpoint of preventing the resulting cured product (model material) from dissolving in water.
- the photocurable composition (II) may further contain a solvent.
- the solvent the solvents exemplified as the solvent for the photocurable composition (I) can be used.
- the content of the solvent is not particularly limited, and may be adjusted so that the photocurable composition (II) has a suitable viscosity.
- the photocurable composition (II) preferably has a viscosity of 5 to 300 mPa ⁇ s at 25°C.
- the viscosity of the photocurable composition (II) at the ejection temperature is 20 mPa ⁇ s or less.
- the photocurable composition (II) may contain other additives as necessary, provided that the effects of the present invention are not impaired.
- the additives include known additives such as photoinitiator assistants, polymerization inhibitors, surfactants, colorants, chain transfer agents, fillers, emulsion stabilizers, penetration promoters, UV absorbers, preservatives, antifungal agents, rust inhibitors, pH adjusters, surface tension adjusters, antifoaming agents, viscosity adjusters, dispersants, dispersion stabilizers, chelating agents, drying inhibitors (wetting agents), discoloration inhibitors, resistivity adjusters, and film adjusters.
- photoinitiator assistants such as photoinitiator assistants, polymerization inhibitors, surfactants, colorants, chain transfer agents, fillers, emulsion stabilizers, penetration promoters, UV absorbers, preservatives, antifungal agents, rust inhibitors, pH adjusters, surface tension adjusters, antifoaming agents, viscosity
- the model material formed from the photocurable composition (II) needs to be resistant to the support material removal process.
- a cured piece (2 cm x 2 cm x 3 mm) obtained by irradiating the photocurable composition (II) with 100 mW/ cm2 ultraviolet light for 3 minutes is added to 50 mL of water at 25°C and allowed to stand for 3 hours, it is preferable that the cured piece does not dissolve at all.
- the support material can be easily removed using a polar solvent such as water, alcohol, acidic solution, or basic solution. From the viewpoints of safety and reducing environmental load, it is preferable to use water as the polar solvent. From the viewpoints of safety and cost, the support material removal process is preferably a method in which the stereolithography precursor is left to stand in a polar solvent (preferably water) to remove the support material.
- the standing time is not particularly limited, but from the viewpoint of workability, it is preferably 1 to 5 hours, more preferably 0.5 to 2 hours.
- the temperature of the polar solvent (preferably water) is preferably 10 to 40°C, more preferably 20 to 30°C.
- Example 1 To a 20 mL brown screw tube, 20 parts of methoxypolyethylene glycol acrylate (average number of repeating oxyethylene groups: approximately 9, manufactured by Shin-Nakamura Chemical Co., Ltd., product name "NK Ester AM-90G”), 15 parts of zinc acrylate, 30 parts of propylene glycol, 30 parts of triethylene glycol, 5 parts of glycerin, and 2 parts of a photopolymerization initiator (manufactured by IGM Resins B.V., product name "Omnirad2959”) were added and mixed with stirring to obtain a photocurable composition.
- the photocurable compositions obtained in the examples and comparative examples were evaluated using the following evaluation methods.
- the photocurable composition was irradiated with 100 mW/ cm2 ultraviolet light (wavelength 365 nm) for 30 seconds, and the appearance of the resulting photoirradiated object (2 cm x 2 cm x thickness 3 mm) was visually inspected and evaluated.
- the evaluation criteria were as follows. The results are shown in Table 1. ⁇ : The light irradiated material did not flow, i.e., it hardened. ⁇ : The light irradiated material was a liquid or viscous liquid and had flowability.
- AM-90G Methoxypolyethylene glycol acrylate (average number of repeating oxyethylene groups: about 9), manufactured by Shin-Nakamura Chemical Co., Ltd., product name "NK Ester AM-90G” AM-130G: Methoxypolyethylene glycol acrylate (average number of repeating oxyethylene groups: about 13), manufactured by Shin-Nakamura Chemical Co., Ltd., product name "NK Ester AM-130G” AM-230G: Methoxypolyethylene glycol acrylate (average number of repeating oxyethylene groups: about 23), manufactured by Shin-Nakamura Chemical Co., Ltd., product name "NK Ester AM-230G” M-90G: Methoxypolyethylene glycol methacrylate (average number of repeating oxyethylene groups: about 9), manufactured by Shin-Nakamura Chemical Co., Ltd., product name "NK Ester M-90G” M-130G: Methoxypolyethyleneglycol methacrylate
- the photocurable resin composition of the example containing a polymerizable monomer (A) having an oxyalkylene group and a water-soluble polymerizable monomer (B) other than the polymerizable monomer (A) had excellent curing properties as shown in Table 1, and a cured product (support material) with improved supportability, transparency, and solubility in water was obtained.
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Abstract
Description
本発明は、インクジェット3Dプリンターにより形成されるサポート材用の光硬化性組成物及びその使用、並びに、該光硬化性組成物を用いたサポート材及び光造形物の製造方法に関するものである。 The present invention relates to a photocurable composition for a support material formed by an inkjet 3D printer, its use, and a method for producing a support material and a photo-modeled object using the photocurable composition.
近年、インクジェットノズルから吐出した液状の光硬化性組成物を硬化させ、積層して造形物を製造する、インクジェット3Dプリンターを用いた光造形法が提案されている。この光造形法に用いられるインクジェット3Dプリンター用インクとしては、成形体(モデル材)を形成するための光硬化性組成物と、モデル材を立体的に積み上げる際にモデル材が崩れないようにするために用いられるサポート材を形成するための光硬化性組成物とが用いられる。光硬化されたサポート材の上に、光硬化されたモデル材を積層後、該サポート材を除去することにより、オーバーハング構造や中空構造等を造形することが可能となる。 In recent years, a photo-lithography method using an inkjet 3D printer has been proposed, in which a liquid photo-curable composition ejected from an inkjet nozzle is cured and layered to produce a model. The inkjet 3D printer inks used in this photo-lithography method include a photo-curable composition for forming a molded body (model material) and a photo-curable composition for forming a support material used to prevent the model material from collapsing when stacking the model material in three dimensions. By layering a photo-cured model material on top of the photo-cured support material and then removing the support material, it becomes possible to form an overhang structure, hollow structure, etc.
特許文献1には、イオン性基と対イオンとを含有する水溶性エチレン性不飽和単量体と、光重合開始剤とを含むサポート材用の光硬化性組成物が記載されており、該組成物から形成されたサポート材は水溶性に優れ且つ硬度が十分(すなわち、サポート性が十分)であることが開示されている。 Patent Document 1 describes a photocurable composition for a support material that contains a water-soluble ethylenically unsaturated monomer that contains an ionic group and a counter ion, and a photopolymerization initiator, and discloses that the support material formed from the composition has excellent water solubility and sufficient hardness (i.e., sufficient supportability).
特許文献2には、イオン性基と対イオンとを含有する水溶性エチレン性不飽和単量体を含み、水の含有量が光硬化性組成物100質量%中、10質量%以下であるサポート材用の光硬化性組成物が記載されており、該組成物は硬化性に優れていること、また該組成物から形成されるサポート材は硬度が十分であり、且つ、溶媒への溶解性に優れることが開示されている。 Patent Document 2 describes a photocurable composition for a support material that contains a water-soluble ethylenically unsaturated monomer that contains an ionic group and a counter ion, and has a water content of 10 mass% or less relative to 100 mass% of the photocurable composition. It discloses that the composition has excellent curing properties, and that a support material formed from the composition has sufficient hardness and excellent solubility in a solvent.
インクジェット3Dプリンターにより形成されるサポート材用の光硬化性組成物としては、硬化後の硬化物の水溶性やサポート性がより良好であるとともに、硬化後の硬化物の透明性が高められるものが求められている。
そこで本発明は、インクジェット3Dプリンターにより形成される硬化物(サポート材)の水への溶解性、サポート性、及び透明性を高めることのできる光硬化性組成物を提供することを目的とする。
Photocurable compositions for support materials formed by inkjet 3D printers are required to have better water solubility and supportability after curing, as well as improved transparency of the cured product after curing.
Therefore, an object of the present invention is to provide a photocurable composition that can enhance the solubility in water, supportability, and transparency of a cured product (support material) formed by an inkjet 3D printer.
本発明者らは、前記課題を解決するために鋭意研究を重ねた結果、オキシアルキレン基を有する重合性モノマー(A)と、前記重合性モノマー(A)以外の水溶性の重合性モノマー(B)とを含む光硬化性組成物を用いることにより、インクジェット3Dプリンターにより形成される硬化物(サポート材)の水への溶解性、サポート性、及び透明性を高めることができることを見出し、本発明を完成するに至った。 As a result of extensive research to solve the above problems, the inventors discovered that by using a photocurable composition containing a polymerizable monomer (A) having an oxyalkylene group and a water-soluble polymerizable monomer (B) other than the polymerizable monomer (A), it is possible to improve the solubility in water, supportability, and transparency of a cured product (support material) formed by an inkjet 3D printer, and thus completed the present invention.
すなわち、本発明は以下の通りである。
[1] オキシアルキレン基を有する重合性モノマー(A)と、前記重合性モノマー(A)以外の水溶性の重合性モノマー(B)とを含む、インクジェット3Dプリンターにより形成されるサポート材用の光硬化性組成物。
[2] 前記重合性モノマー(B)が、イオン性基を有するイオン性モノマーである、[1]に記載の光硬化性組成物。
[3] 前記イオン性モノマーが、前記イオン性基と対となる多価金属イオンを有するイオン性モノマーを含む、[2]に記載の光硬化性組成物。
[4] 前記多価金属イオンを有するイオン性モノマーの含有量が、前記重合性モノマー(B)100質量%中、50質量%以上である、[3]に記載の光硬化性組成物。
[5] 前記重合性モノマー(A)及び前記重合性モノマー(B)の合計含有量が、前記光硬化性組成物100質量%中、50質量%未満である、[1]~[4]のいずれかに記載の光硬化性組成物。
[6] 前記重合性モノマー(A)が、下記式(1)で表されるモノマーである、[1]~[5]のいずれかに記載の光硬化性組成物。
Z-(Ra-O)n-Rb …(1)
[式(1)中、Zはエチレン性不飽和結合含有基を表し、Raはアルキレン基を表し、Rbは水素原子又は置換基を有していてもよい炭化水素基を表し、nは1以上の整数を表す。なお、nが2以上の整数である場合、複数のRaはそれぞれ同一であってもよく、異なっていてもよい。]
[7] 前記式(1)において、
Zが、CH2=C(R1)-C(=O)-O-*又はCH2=C(R1)-(CH2)m-O-*で表される基(R1は水素原子又は置換基を有していてもよい炭素数1~4のアルキル基を表し、mは0~6の整数を表し、*は結合手を表す)を示し、
Raが、炭素数1~4のアルキレン基を示し、
Rbが、水素原子又は炭素数1~4のアルキル基を示し、
nが、1~100の整数を示す、[6]に記載の光硬化性組成物。
[8] さらに、光重合開始剤を含む、[1]~[7]のいずれかに記載の光硬化性組成物。
[9] 100mW/cm2の光を3分間照射して得られた硬化物片(2cm×2cm×3mm)を25℃の水50mLに加えて3時間静置した際、硬化物片の50質量%以上が溶解する、[1]~[8]のいずれかに記載の光硬化性組成物。
[10] [1]~[9]のいずれかに記載の光硬化性組成物に光を照射する、サポート材の製造方法。
[11] [1]~[9]のいずれかに記載の光硬化性組成物に光を照射するサポート材層の形成工程Aと、前記形成工程Aと同じ及び/又は異なるタイミングで実施されるモデル材層の形成工程Bとをそれぞれ複数回繰り返す光造形物前駆体の形成工程と、
前記サポート材層から構成されるサポート材を前記光造形物前駆体から除去する工程とを含む、光造形物の製造方法。
[12] [1]~[9]のいずれかに記載の光硬化性組成物の、インクジェット3Dプリンターによるサポート材形成のための使用。
[13] [1]~[9]のいずれかに記載の光硬化性組成物(I)と、
前記光硬化性組成物(I)とは異なる光硬化性組成物(II)とを、
インクジェット3Dプリンターにおける異なる吐出ヘッドから吐出する、光硬化性組成物(I)の使用方法。
That is, the present invention is as follows.
[1] A photocurable composition for a support material formed by an inkjet 3D printer, comprising a polymerizable monomer (A) having an oxyalkylene group and a water-soluble polymerizable monomer (B) other than the polymerizable monomer (A).
[2] The photocurable composition according to [1], wherein the polymerizable monomer (B) is an ionic monomer having an ionic group.
[3] The photocurable composition according to [2], wherein the ionic monomer includes an ionic monomer having a polyvalent metal ion that forms a pair with the ionic group.
[4] The photocurable composition according to [3], wherein the content of the ionic monomer having a polyvalent metal ion is 50 mass% or more in 100 mass% of the polymerizable monomer (B).
[5] The photocurable composition according to any one of [1] to [4], wherein a total content of the polymerizable monomer (A) and the polymerizable monomer (B) is less than 50 mass% in 100 mass% of the photocurable composition.
[6] The photocurable composition according to any one of [1] to [5], wherein the polymerizable monomer (A) is a monomer represented by the following formula (1):
Z-(R a -O) n -R b ...(1)
[In formula (1), Z represents an ethylenically unsaturated bond-containing group, R a represents an alkylene group, R b represents a hydrogen atom or a hydrocarbon group which may have a substituent, and n represents an integer of 1 or more. When n is an integer of 2 or more, the multiple R a 's may be the same or different.]
[7] In the formula (1),
Z is a group represented by CH 2 ═C(R 1 )-C(═O)-O-* or CH 2 ═C(R 1 )-(CH 2 ) m -O-* (R 1 represents a hydrogen atom or an alkyl group having 1 to 4 carbon atoms which may have a substituent, m represents an integer of 0 to 6, and * represents a bond),
R a represents an alkylene group having 1 to 4 carbon atoms;
R b represents a hydrogen atom or an alkyl group having 1 to 4 carbon atoms;
The photocurable composition according to [6], wherein n is an integer from 1 to 100.
[8] The photocurable composition according to any one of [1] to [7], further comprising a photopolymerization initiator.
[9] The photocurable composition according to any one of [1] to [8], in which when a piece of a cured product (2 cm × 2 cm × 3 mm) obtained by irradiating the piece with light at 100 mW/ cm2 for 3 minutes is added to 50 mL of water at 25°C and allowed to stand for 3 hours, 50 mass% or more of the cured product piece dissolves.
[10] A method for producing a support material, comprising irradiating the photocurable composition according to any one of [1] to [9] with light.
[11] A process for forming a photo-modeled object precursor, comprising: a process A for forming a supporting material layer by irradiating the photocurable composition according to any one of [1] to [9] with light; and a process B for forming a model material layer carried out at the same timing and/or at a different timing from the process A, each of which is repeated multiple times;
and removing the supporting material composed of the supporting material layer from the optically shaped object precursor.
[12] Use of the photocurable composition according to any one of [1] to [9] for forming a support material by an inkjet 3D printer.
[13] A photocurable composition (I) according to any one of [1] to [9],
a photocurable composition (II) different from the photocurable composition (I),
A method of using the photocurable composition (I) by ejecting it from different ejection heads in an inkjet 3D printer.
本発明によれば、インクジェット3Dプリンターにより形成される硬化物(サポート材)の水への溶解性、サポート性、及び透明性を高めることが可能な光硬化性組成物を提供できる。 The present invention provides a photocurable composition that can improve the water solubility, supportability, and transparency of the cured product (support material) formed by an inkjet 3D printer.
本発明の一実施形態に関して以下に説明するが、本発明はこれに限定されるものではない。なお、本明細書において特記しない限り、数値範囲を表す「A~B」は、「A以上、B以下」を意味する。また、「(メタ)アクリル酸」とは、アクリル酸又はメタクリル酸を意味し、「(メタ)アクリレート」とは、アクリレート又はメタクリレートを意味する。「(メタ)アクリロキシ」や「(メタ)アクリロイル」等の用語も同様である。 One embodiment of the present invention will be described below, but the present invention is not limited thereto. In this specification, unless otherwise specified, "A to B" indicating a numerical range means "A or more, B or less." In addition, "(meth)acrylic acid" means acrylic acid or methacrylic acid, and "(meth)acrylate" means acrylate or methacrylate. The same applies to terms such as "(meth)acryloxy" and "(meth)acryloyl."
1.インクジェット3Dプリンターにより形成されるサポート材用の光硬化性組成物
本発明のインクジェット3Dプリンターにより形成されるサポート材用の光硬化性組成物(以下、単に「光硬化性組成物」という場合がある)は、オキシアルキレン基を有する重合性モノマー(A)と、前記重合性モノマー(A)以外の水溶性の重合性モノマー(B)とを含む。本発明の光硬化性組成物が上記重合性モノマー(A)及び(B)を含むことで、水への溶解性、サポート性、及び透明性が高められたサポート材を得ることができる。
1. Photocurable composition for a support material formed by an inkjet 3D printer The photocurable composition for a support material formed by an inkjet 3D printer of the present invention (hereinafter, may be simply referred to as "photocurable composition") contains a polymerizable monomer (A) having an oxyalkylene group and a water-soluble polymerizable monomer (B) other than the polymerizable monomer (A). By containing the polymerizable monomers (A) and (B) in the photocurable composition of the present invention, a support material with improved solubility in water, supportability, and transparency can be obtained.
なお、以下に述べる光硬化性組成物は、インクジェット3Dプリンターによるサポート材形成のために使用される。すなわち、インクジェット3Dプリンターで用いるための組成物であり、該光硬化性組成物をそのままインクジェット3Dプリンター用インクとして用いてもよいし、使用時に該光硬化性組成物と溶媒とを混合することでインクジェット3Dプリンター用インクとして用いることができるように、各成分を高い濃度で含有する組成物としてもよい。なお、以下に述べる光硬化性組成物の各成分の含有量としては、特別な記載のない限り、インクジェット3Dプリンター用インクとして使用する際の光硬化性組成物中での含有量を示す。 The photocurable composition described below is used for forming a support material by an inkjet 3D printer. In other words, it is a composition for use in an inkjet 3D printer, and the photocurable composition may be used as is as ink for an inkjet 3D printer, or may be a composition containing each component at a high concentration so that the photocurable composition can be used as ink for an inkjet 3D printer by mixing the photocurable composition with a solvent when used. The content of each component in the photocurable composition described below indicates the content in the photocurable composition when used as ink for an inkjet 3D printer, unless otherwise specified.
1-1.オキシアルキレン基を有する重合性モノマー(A)
本発明の光硬化性組成物は、オキシアルキレン基を有する重合性モノマー(A)を含む。光硬化性組成物が、オキシアルキレン基を有する重合性モノマー(A)を含むことで、得られる硬化物(サポート材)の水への溶解性、サポート性、及び透明性が高められ、特に透明性が高められる傾向にある。なお、本明細書において、「重合性モノマー」とは、エチレン性不飽和基を1つ以上有する化合物であって、光等により重合する化合物を指す。
1-1. Polymerizable monomer having an oxyalkylene group (A)
The photocurable composition of the present invention contains a polymerizable monomer (A) having an oxyalkylene group. When the photocurable composition contains a polymerizable monomer (A) having an oxyalkylene group, the solubility in water, supportability, and transparency of the obtained cured material (support material) are improved, and the transparency tends to be particularly improved. In this specification, the term "polymerizable monomer" refers to a compound having one or more ethylenically unsaturated groups and polymerizing by light or the like.
重合性モノマー(A)1分子が有するオキシアルキレン基の数は、1以上であり、1~100であることが好ましく、より好ましくは2~80、さらに好ましくは4~60、よりさらに好ましくは5~30である。 The number of oxyalkylene groups in one molecule of polymerizable monomer (A) is 1 or more, and is preferably 1 to 100, more preferably 2 to 80, even more preferably 4 to 60, and even more preferably 5 to 30.
前記重合性モノマー(A)は、下記式(1x)で表されるモノマーであることが好ましく、下記式(1)で表されるモノマーであることがより好ましい。
Z-((Ra-O)n-Rb)x …(1x)
Z-(Ra-O)n-Rb …(1)
[式中、Zはエチレン性不飽和結合含有基を表し、Raはアルキレン基を表し、Rbは水素原子又は置換基を有していてもよい炭化水素基を表し、nは1以上の整数を表し、xは1~4の整数を表す。なお、n又はxが2以上の整数である場合、複数のRa及びRbはそれぞれ同一であってもよく、異なっていてもよい。]
The polymerizable monomer (A) is preferably a monomer represented by the following formula (1x), and more preferably a monomer represented by the following formula (1).
Z-((R a -O) n -R b ) x ...(1x)
Z-(R a -O) n -R b ...(1)
[In the formula, Z represents an ethylenically unsaturated bond-containing group, R a represents an alkylene group, R b represents a hydrogen atom or a hydrocarbon group which may have a substituent, n represents an integer of 1 or more, and x represents an integer of 1 to 4. When n or x is an integer of 2 or more, a plurality of R a's and R b 's may be the same or different.]
Zで表されるエチレン性不飽和結合含有基は、エチレン性不飽和結合を1つ以上有する1~4価の基である。前記価数は、エチレン性不飽和結合含有基が有するRaに結合するための結合手の数に相当し、式(1x)においてxが1である場合にはZは1価の基となり、式(1x)においてxが2である場合にはZは2価の基となる。また、式(1)において、Zは1価の基である。
エチレン性不飽和結合含有基に含まれるエチレン性不飽和結合の数は、1~3であることが好ましく、より好ましくは1である。
The ethylenically unsaturated bond-containing group represented by Z is a monovalent to tetravalent group having one or more ethylenically unsaturated bonds. The valence corresponds to the number of bonds that the ethylenically unsaturated bond-containing group has for bonding to R a , and when x is 1 in formula (1x), Z is a monovalent group, and when x is 2 in formula (1x), Z is a divalent group. In formula (1), Z is a monovalent group.
The number of ethylenically unsaturated bonds contained in the ethylenically unsaturated bond-containing group is preferably 1 to 3, and more preferably 1.
エチレン性不飽和結合含有基は、エチレン性不飽和基を1つ有するもの、例えば、炭素数2~10程度のアルケンモノ、ジ、トリ、又はテトライル基、又は該アルケンモノ、ジ、トリ、又はテトライル基と1つ以上の2価の基(カルボニル基、-O-など)が結合した基が好ましい。該エチレン性不飽和基を1つ有するエチレン性不飽和結合含有基としては、末端にエチレン性不飽和結合を有することがより好ましく、CH2=C(R1)-*で表される基を有することがさらに好ましく、CH2=C(R1)-C(=O)-O-*又はCH2=C(R1)-(CH2)m-O-*で表される基であることがよりさらに好ましく、CH2=C(R1)-C(=O)-O-*で表される基であることが特に好ましい。
なお、R1は水素原子又は置換基を有していてもよい炭素数1~4のアルキル基を表し、mは0~6の整数を表し、*は結合手を表す。
The ethylenically unsaturated bond-containing group is preferably one having one ethylenically unsaturated group, for example, an alkene mono-, di-, tri-, or tetrayl group having about 2 to 10 carbon atoms, or a group in which the alkene mono-, di-, tri-, or tetrayl group is bonded to one or more divalent groups (such as a carbonyl group, -O-). The ethylenically unsaturated bond-containing group having one ethylenically unsaturated group more preferably has an ethylenically unsaturated bond at a terminal, even more preferably has a group represented by CH 2 ═C(R 1 )-*, even more preferably a group represented by CH 2 ═C(R 1 )-C(═O)-O-* or CH 2 ═C(R 1 )-(CH 2 ) m -O-*, and particularly preferably a group represented by CH 2 ═C(R 1 )-C(═O)-O-*.
In addition, R 1 represents a hydrogen atom or an alkyl group having 1 to 4 carbon atoms which may have a substituent, m represents an integer of 0 to 6, and * represents a bond.
前記R1で表される炭素数1~4のアルキル基としては、具体的に、メチル基、エチル基、n-プロピル基、イソプロピル基、n-ブチル基、イソブチル基、tert-ブチル基等が挙げられる。 Specific examples of the alkyl group having 1 to 4 carbon atoms represented by R 1 include a methyl group, an ethyl group, an n-propyl group, an isopropyl group, an n-butyl group, an isobutyl group, and a tert-butyl group.
前記R1で表される炭素数1~4のアルキル基は置換基を有していてもよく、該置換基としては、フッ素原子、塩素原子、臭素原子、ヨウ素原子等のハロゲン原子、ヒドロキシ基、チオール基、*-C(=O)-Rで表される基、*-O-Rで表される基、*-S-Rで表される基等が挙げられる。なお、*は結合手を示し、Rは炭化水素基を示す。
前記Rで表される炭化水素基としては、後述のRbで表される炭化水素基として例示した基が挙げられ、中でもアルキル基又は芳香族炭化水素基であることが好ましく、炭素数1~4のアルキル基又は炭素数6~10の芳香族炭化水素基であることがより好ましい。
The alkyl group having 1 to 4 carbon atoms represented by R1 may have a substituent, and examples of the substituent include halogen atoms such as fluorine atom, chlorine atom, bromine atom, and iodine atom, hydroxyl group, thiol group, group represented by *-C(=O)-R, group represented by *-O-R, group represented by *-S-R, etc. In addition, * represents a bond and R represents a hydrocarbon group.
Examples of the hydrocarbon group represented by R include the groups exemplified as the hydrocarbon group represented by R b described below. Among them, an alkyl group or an aromatic hydrocarbon group is preferable, and an alkyl group having 1 to 4 carbon atoms or an aromatic hydrocarbon group having 6 to 10 carbon atoms is more preferable.
R1としては、水素原子又は炭素数1~4のアルキル基であることが好ましく、水素原子、メチル基、又はエチル基であることがより好ましく、水素原子又はメチル基であることが特に好ましい。 R 1 is preferably a hydrogen atom or an alkyl group having 1 to 4 carbon atoms, more preferably a hydrogen atom, a methyl group, or an ethyl group, and particularly preferably a hydrogen atom or a methyl group.
前記mは、1~6の整数であることが好ましく、1~4の整数であることがより好ましく、1又は2であることがさらに好ましい。 The m is preferably an integer from 1 to 6, more preferably an integer from 1 to 4, and even more preferably 1 or 2.
中でも、Zで表されるエチレン性不飽和結合含有基としては、CH2=C(H)-C(=O)-O-*で表される基、CH2=C(CH3)-C(=O)-O-*で表される基、CH2=C(H)-(CH2)m1-O-*で表される基、又はCH2=C(CH3)-(CH2)m1-O-*で表される基であることが好ましい(m1は1~4の整数を表す)。 Among these, the ethylenically unsaturated bond-containing group represented by Z is preferably a group represented by CH2 =C(H)-C(=O)-O-*, a group represented by CH2 =C( CH3 )-C(=O)-O-*, a group represented by CH2 =C(H)-( CH2 ) m1 -O-*, or a group represented by CH2 =C( CH3 )-( CH2 ) m1 -O-* (m1 represents an integer of 1 to 4).
また、得られる硬化物の透明性をより高める観点から、上記式(1)においてZがCH2=C(R1)-C(=O)-O-*で表される基である化合物を含むことが好ましい。上記式(1)においてZがCH2=C(R1)-C(=O)-O-*で表される基である化合物の含有量は、重合性モノマー(A)100質量%中、30質量%以上が好ましく、より好ましくは60質量%以上、さらに好ましくは80質量%以上、よりさらに好ましくは90質量%以上であり、100質量%であってもよい。 From the viewpoint of further enhancing the transparency of the obtained cured product, it is preferable to contain a compound in which Z in the above formula (1) is a group represented by CH 2 ═C(R 1 )-C(═O)-O-*. The content of the compound in the above formula (1) in which Z is a group represented by CH 2 ═C(R 1 )-C(═O)-O-* is preferably 30% by mass or more, more preferably 60% by mass or more, even more preferably 80% by mass or more, still more preferably 90% by mass or more, and may even be 100% by mass, in 100% by mass of polymerizable monomer (A).
Raで表されるアルキレン基は、直鎖状であっても分岐鎖状であってもよいが、直鎖状であることが好ましい。
Raで表されるアルキレン基の炭素数は、1~6であることが好ましく、より好ましくは1~4、さらに好ましくは2又は3である。
Raで表されるアルキレン基としては、具体的に、メチレン基、エチレン基、1,3-プロピレン基、1,4-ブチレン基、1,5-ペンチレン基、1,6-ヘキシレン基等の直鎖状アルキレン基;1,2-プロピレン基、1,2-ブチレン基、1,3-ブチレン基、2,3-ブチレン基、1,2-ヘキシレン基等の分岐鎖状アルキレン基;が挙げられる。
Raで表されるアルキレン基としては、炭素数1~4のアルキレン基であることが好ましく、より好ましくは炭素数1~4の直鎖状アルキレン基、さらに好ましくは、炭素数2又は3の直鎖状アルキレン基である。
The alkylene group represented by R a may be linear or branched, but is preferably linear.
The alkylene group represented by R a preferably has 1 to 6 carbon atoms, more preferably 1 to 4 carbon atoms, and further preferably 2 or 3 carbon atoms.
Specific examples of the alkylene group represented by R a include linear alkylene groups such as a methylene group, an ethylene group, a 1,3-propylene group, a 1,4-butylene group, a 1,5-pentylene group, and a 1,6-hexylene group; and branched alkylene groups such as a 1,2-propylene group, a 1,2-butylene group, a 1,3-butylene group, a 2,3-butylene group, and a 1,2-hexylene group.
The alkylene group represented by R a is preferably an alkylene group having 1 to 4 carbon atoms, more preferably a linear alkylene group having 1 to 4 carbon atoms, and even more preferably a linear alkylene group having 2 or 3 carbon atoms.
なお、式(1x)又は式(1)において、nが2以上の整数であって、2種以上のRaで表されるアルキレン基を含む場合、すなわち、式(1x)又は式(1)で表される化合物が、2種以上のアルキレンオキシ基を含む場合、それらのアルキレンオキシ基は、ランダム付加、ブロック付加、交互付加等により付加されていてもよい。 In addition, in formula (1x) or formula (1), when n is an integer of 2 or more and the compound contains two or more alkylene groups represented by R a , that is, when the compound represented by formula (1x) or formula (1) contains two or more alkyleneoxy groups, those alkyleneoxy groups may be added by random addition, block addition, alternating addition, or the like.
Rbで表される炭化水素基としては、脂肪族炭化水素基であってもよく、芳香族炭化水素基であってもよく、それらを組み合わせた基であってもよい。 The hydrocarbon group represented by R b may be an aliphatic hydrocarbon group, an aromatic hydrocarbon group, or a combination thereof.
前記脂肪族炭化水素基としては、例えば、
メチル基、エチル基、n-プロピル基、イソプロピル基、n-ブチル基、イソブチル基、tert-ブチル基等のアルキル基(好ましくは炭素数1~4のアルキル基);
ビニル基、n-プロペニル基、イソプロペニル基、1-ブテニル基、2-ブテニル基、1-ペンテニル基、2-ペンテニル基、2-メチル-1-ブテニル基、2-メチル-2-ブテニル基、3-メチル-1-ブテニル基等のアルケニル基(好ましくは炭素数2~6のアルケニル基);
シクロプロピル基、シクロブチル基、シクロペンチル基、シクロヘキシル基、3-メチルシクロヘキシル基、4-メチルシクロヘキシル基、4-エチルシクロヘキシル基等のシクロアルキル基(好ましくは炭素数3~8のシクロアルキル基);等が挙げられる。
中でも、アルキル基が好ましく、より好ましくは炭素数1~4のアルキル基、さらに好ましくはメチル基またはエチル基、特に好ましくはメチル基である。
Examples of the aliphatic hydrocarbon group include
Alkyl groups (preferably alkyl groups having 1 to 4 carbon atoms), such as a methyl group, an ethyl group, an n-propyl group, an isopropyl group, an n-butyl group, an isobutyl group, or a tert-butyl group;
alkenyl groups (preferably alkenyl groups having 2 to 6 carbon atoms) such as a vinyl group, an n-propenyl group, an isopropenyl group, a 1-butenyl group, a 2-butenyl group, a 1-pentenyl group, a 2-pentenyl group, a 2-methyl-1-butenyl group, a 2-methyl-2-butenyl group, or a 3-methyl-1-butenyl group;
cycloalkyl groups (preferably cycloalkyl groups having 3 to 8 carbon atoms) such as cyclopropyl group, cyclobutyl group, cyclopentyl group, cyclohexyl group, 3-methylcyclohexyl group, 4-methylcyclohexyl group, and 4-ethylcyclohexyl group; and the like.
Among these, an alkyl group is preferable, an alkyl group having 1 to 4 carbon atoms is more preferable, a methyl group or an ethyl group is even more preferable, and a methyl group is particularly preferable.
前記芳香族炭化水素基としては、例えば、フェニル基、メチルフェニル基、ジメチルフェニル基、トリメチルフェニル基、4-tert-ブチルフェニル基、ナフチル基等が挙げられ、好ましくは炭素数6~10の芳香族炭化水素基である。 The aromatic hydrocarbon group may, for example, be a phenyl group, a methylphenyl group, a dimethylphenyl group, a trimethylphenyl group, a 4-tert-butylphenyl group, a naphthyl group, etc., and is preferably an aromatic hydrocarbon group having 6 to 10 carbon atoms.
前記脂肪族炭化水素基と前記芳香族炭化水素基とを組み合わせた基としては、例えば、ベンジル基、フェネチル基等のアラルキル基等が挙げられ、好ましくは炭素数7~12のアラルキル基である。 Examples of groups that combine the aliphatic hydrocarbon group and the aromatic hydrocarbon group include aralkyl groups such as benzyl and phenethyl groups, and preferably aralkyl groups having 7 to 12 carbon atoms.
Rbで表される炭化水素基は置換基を有していてもよく、該置換基としては、R1で表される炭素数1~4のアルキル基が有していてもよい置換基として例示した基が挙げられ、その好ましい態様も同様である The hydrocarbon group represented by R b may have a substituent. Examples of the substituent include the groups exemplified as the substituent that the alkyl group having 1 to 4 carbon atoms represented by R 1 may have, and the preferred embodiments thereof are also the same.
Rbとしては、水素原子又はアルキル基であることが好ましく、水素原子又は炭素数1~4のアルキル基であることがより好ましく、水素原子、メチル基、又はエチル基であることがさらに好ましく、水素原子又はメチル基であることが特に好ましい。 R b is preferably a hydrogen atom or an alkyl group, more preferably a hydrogen atom or an alkyl group having 1 to 4 carbon atoms, further preferably a hydrogen atom, a methyl group, or an ethyl group, and particularly preferably a hydrogen atom or a methyl group.
nは1~100の整数であることが好ましく、より好ましくは2~80の整数、さらに好ましくは4~60の整数、よりさらに好ましくは5~30の整数である。
なお、重合性モノマー(A)が、上記式(1)におけるnの値が異なるものの混合物である場合、上記nはそれらの平均値とすることができる。
n is preferably an integer of 1 to 100, more preferably an integer of 2 to 80, even more preferably an integer of 4 to 60, and still more preferably an integer of 5 to 30.
When the polymerizable monomer (A) is a mixture of monomers having different values of n in the above formula (1), the above n can be the average value thereof.
前記式(1)で表される化合物としては、
Zが、CH2=C(R1)-C(=O)-O-*又はCH2=C(R1)-(CH2)m-O-*で表される基(R1、m、及び*は、前記に同じ)を示し、Raが、炭素数1~4のアルキレン基を示し、Rbが、水素原子又は炭素数1~4のアルキル基を示し、nが、1~100の整数を示す化合物であることが好ましく;
Zが、CH2=C(R2)-C(=O)-O-*又はCH2=C(R2)-(CH2)m2-O-*で表される基(R2は水素原子又はメチル基を表し、m2は1~4の整数を表し、*は結合手を表す)を示し、Raが、炭素数2又は3のアルキレン基を示し、Rbが、水素原子又はメチル基を示し、nが、5~30の整数を示す化合物であることがより好ましい。
The compound represented by the formula (1) is
It is preferable that Z is a group represented by CH 2 ═C(R 1 )-C(═O)-O-* or CH 2 ═C(R 1 )-(CH 2 ) m -O-* (R 1 , m, and * are the same as above), R a is an alkylene group having 1 to 4 carbon atoms, R b is a hydrogen atom or an alkyl group having 1 to 4 carbon atoms, and n is an integer of 1 to 100;
It is more preferable that Z is a group represented by CH2 =C( R2 )-C(=O)-O-* or CH2 =C( R2 )-( CH2 ) m2 -O-* ( R2 is a hydrogen atom or a methyl group, m2 is an integer of 1 to 4, and * is a bond), R a is an alkylene group having 2 or 3 carbon atoms, R b is a hydrogen atom or a methyl group, and n is an integer of 5 to 30.
上記重合性モノマー(A)としては、具体的に、
エチレングリコール(メタ)アクリレート、エチレングリコールメチルエーテル(メタ)アクリレート、エチレングリコールの繰り返し数(すなわち、オキシエチレン基の繰り返し数)が2~100であるポリエチレングリコール(メタ)アクリレート、エチレングリコールの繰り返し数(すなわち、オキシエチレン基の繰り返し数)が2~100であるポリエチレングリコールメチルエーテル(メタ)アクリレート等のオキシエチレン基を有する(メタ)アクリレート化合物;
プロピレングリコール(メタ)アクリレート、プロピレングリコールモノメチルエーテル(メタ)アクリレート、プロピレングリコールの繰り返し数(すなわち、オキシプロピレン基の繰り返し数)が2~100であるポリプロピレングリコール(メタ)アクリレート、プロピレングリコールの繰り返し数(すなわち、オキシプロピレン基の繰り返し数)が2~100であるポリプロピレングリコールモノメチルエーテル(メタ)アクリレート等のオキシプロピレン基を有する(メタ)アクリレート化合物;
ビニルアルコールエチレンオキシド(以下EO)付加物(EO付加モル数1~100モル)、(メタ)アリルアルコールEO付加物(EO付加モル数1~100モル)、3-ブテン-1-オールEO付加物(EO付加モル数1~100モル)、イソプレンアルコールEO付加物(EO付加モル数1~100モル)、3-メチル-2-ブテン-1-オールEO付加物(EO付加モル数1~100モル)、2-メチル-3-ブテン-2-オールEO付加物(EO付加モル数1~100モル)、2-メチル-2-ブテン-1-オールEO付加物(EO付加モル数1~100モル)、2-メチル-3-ブテン-1-オールEO付加物(EO付加モル数1~100モル)等の不飽和アルコールのエチレンオキシド付加物;
ビニルアルコールプロピレンオキシド(以下PO)付加物(PO付加モル数1~100モル)、(メタ)アリルアルコールPO付加物(PO付加モル数1~100モル)、3-ブテン-1-オールPO付加物(PO付加モル数1~100モル)、イソプレンアルコールPO付加物(PO付加モル数1~100モル)、3-メチル-2-ブテン-1-オールPO付加物(PO付加モル数1~100モル)、2-メチル-3-ブテン-2-オールPO付加物(PO付加モル数1~100モル)、2-メチル-2-ブテン-1-オールPO付加物(PO付加モル数1~100モル)、2-メチル-3-ブテン-1-オールPO付加物(PO付加モル数1~100モル)等の不飽和アルコールのプロピレンオキシド付加物;等が挙げられる。
Specific examples of the polymerizable monomer (A) include:
(meth)acrylate compounds having an oxyethylene group, such as ethylene glycol (meth)acrylate, ethylene glycol methyl ether (meth)acrylate, polyethylene glycol (meth)acrylate having a repeat number of ethylene glycol (i.e., a repeat number of oxyethylene groups) of 2 to 100, and polyethylene glycol methyl ether (meth)acrylate having a repeat number of ethylene glycol (i.e., a repeat number of oxyethylene groups) of 2 to 100;
(meth)acrylate compounds having an oxypropylene group, such as propylene glycol (meth)acrylate, propylene glycol monomethyl ether (meth)acrylate, polypropylene glycol (meth)acrylate having a propylene glycol repeat number (i.e., the oxypropylene group repeat number) of 2 to 100, and polypropylene glycol monomethyl ether (meth)acrylate having a propylene glycol repeat number (i.e., the oxypropylene group repeat number) of 2 to 100;
Ethylene oxide adducts of unsaturated alcohols such as vinyl alcohol ethylene oxide (hereinafter EO) adducts (EO added mole number 1 to 100 moles), (meth)allyl alcohol EO adducts (EO added mole number 1 to 100 moles), 3-buten-1-ol EO adducts (EO added mole number 1 to 100 moles), isoprene alcohol EO adducts (EO added mole number 1 to 100 moles), 3-methyl-2-buten-1-ol EO adducts (EO added mole number 1 to 100 moles), 2-methyl-3-buten-2-ol EO adducts (EO added mole number 1 to 100 moles), 2-methyl-2-buten-1-ol EO adducts (EO added mole number 1 to 100 moles), and 2-methyl-3-buten-1-ol EO adducts (EO added mole number 1 to 100 moles);
Examples of propylene oxide adducts of unsaturated alcohols include vinyl alcohol propylene oxide (hereinafter referred to as PO) adducts (number of moles of PO added: 1 to 100 moles), (meth)allyl alcohol PO adducts (number of moles of PO added: 1 to 100 moles), 3-buten-1-ol PO adducts (number of moles of PO added: 1 to 100 moles), isoprene alcohol PO adducts (number of moles of PO added: 1 to 100 moles), 3-methyl-2-buten-1-ol PO adducts (number of moles of PO added: 1 to 100 moles), 2-methyl-3-buten-2-ol PO adducts (number of moles of PO added: 1 to 100 moles), 2-methyl-2-buten-1-ol PO adducts (number of moles of PO added: 1 to 100 moles), and 2-methyl-3-buten-1-ol PO adducts (number of moles of PO added: 1 to 100 moles).
上記重合性モノマー(A)としては、市販品を用いることもできる。市販品としては、新中村化学工業社製のNKエステル M-20G、M-40G、M-90G、M-130G、M-230G、M-450G、AM-90G、AM-130G、AM-230G;日油社製のブレンマー(登録商標)PME-100、PME-200、PME-400、PME-1000、PME-4000、AME-400;等が挙げられる。 As the polymerizable monomer (A), commercially available products can also be used. Examples of commercially available products include NK Ester M-20G, M-40G, M-90G, M-130G, M-230G, M-450G, AM-90G, AM-130G, and AM-230G manufactured by Shin-Nakamura Chemical Co., Ltd.; and Blenmar (registered trademark) PME-100, PME-200, PME-400, PME-1000, PME-4000, and AME-400 manufactured by NOF Corporation.
前記重合性モノマー(A)は、本発明の光硬化性組成物に1種単独で含まれていてもよく、2種以上が含まれていてもよい。 The photocurable composition of the present invention may contain one type of polymerizable monomer (A) alone, or two or more types of polymerizable monomers.
前記重合性モノマー(A)を2種以上併用することは、好ましい形態の一つである。 One preferred embodiment is to use two or more types of polymerizable monomer (A).
2種以上の重合性モノマー(A)を併用する場合、オキシアルキレン基の数が異なる重合性モノマー(A)を併用することが好ましい。
上記併用の形態としては、たとえば、オキシアルキレン基の数が3である重合性モノマー(A)とオキシアルキレン基の数が4である重合性モノマー(A)とオキシアルキレン基の数が5である重合性モノマー(A)との混合物(たとえば、式(1x)または式(1)においてnが3、4、及び5である化合物の混合物)のように、オキシアルキレン基の数が隣接する2種以上の重合性モノマー(A)の混合物を用いる形態であってもよいし、後述するオキシアルキレン基の平均数が異なる重合性モノマー(A)を2種以上併用する形態であってもよい。
When two or more kinds of polymerizable monomers (A) are used in combination, it is preferable to use polymerizable monomers (A) having different numbers of oxyalkylene groups in combination.
The above-mentioned combined use may be, for example, a mixture of two or more polymerizable monomers (A) having adjacent numbers of oxyalkylene groups, such as a mixture of a polymerizable monomer (A) having 3 oxyalkylene groups, a polymerizable monomer (A) having 4 oxyalkylene groups, and a polymerizable monomer (A) having 5 oxyalkylene groups (for example, a mixture of compounds in which n is 3, 4, and 5 in formula (1x) or formula (1)), or may be a combined use of two or more polymerizable monomers (A) having different average numbers of oxyalkylene groups, as described below.
本開示の光硬化性組成物において、重合性モノマー(A)は幅をもった分子量分布を有することが好ましく、該分子量分布が一峰性または多峰性を示すことが好ましく、重合性モノマー(A)の分子量分布が一峰性または二峰性を示すことがより好ましい。なお、重合性モノマー(A)の分子量分布は、ゲル浸透クロマトグラフィー(GPC)で測定することができ、具体的には後述の重合性モノマー(A)の重量平均分子量の測定方法と同様の条件にて測定することができる。
いずれの形態であっても、本発明の光硬化性組成物が光硬化性に優れるものとなり易い傾向にある。
In the photocurable composition of the present disclosure, the polymerizable monomer (A) preferably has a molecular weight distribution with a certain width, the molecular weight distribution is preferably unimodal or multimodal, and the molecular weight distribution of the polymerizable monomer (A) is more preferably unimodal or bimodal. The molecular weight distribution of the polymerizable monomer (A) can be measured by gel permeation chromatography (GPC), specifically, it can be measured under the same conditions as the measurement method of the weight average molecular weight of the polymerizable monomer (A) described later.
In either case, the photocurable composition of the present invention tends to have excellent photocurability.
重合性モノマー(A)としてオキシアルキレン基の平均数が異なる重合性モノマー(A)を2種以上併用する形態においては、オキシアルキレン基の平均数が異なる重合性モノマー(A)を2種併用することが好ましい。すなわち、重合性モノマー(A)の分子量分布が多峰性を示す形態のうち、重合性モノマー(A)の分子量分布が二峰性を示すことが好ましい。 In a form in which two or more polymerizable monomers (A) having different average numbers of oxyalkylene groups are used in combination as the polymerizable monomer (A), it is preferable to use two polymerizable monomers (A) having different average numbers of oxyalkylene groups in combination. In other words, among forms in which the molecular weight distribution of the polymerizable monomer (A) is multimodal, it is preferable that the molecular weight distribution of the polymerizable monomer (A) is bimodal.
オキシアルキレン基の平均数が異なる重合性モノマー(A)を2種以上併用する場合、オキシアルキレン基の平均数が最大である重合性モノマー(A)のオキシアルキレン基の平均数と、オキシアルキレン基の平均数が最小である重合性モノマー(A)のオキシアルキレン基の平均数との差が、5以上であることが好ましく、より好ましくは5~20である。例えば、オキシアルキレン基の平均数が1~5である重合性モノマー(A)とオキシアルキレン基の平均数が10以上である重合性モノマー(A)との組み合わせ、オキシアルキレン基の平均数が6~15である重合性モノマー(A)とオキシアルキレン基の平均数が20以上である重合性モノマー(A)との組み合わせが好ましく、オキシアルキレン基の平均数が1~5である重合性モノマー(A)とオキシアルキレン基の平均数が10~20である重合性モノマー(A)との組み合わせ、オキシアルキレン基の平均数が10~15である重合性モノマー(A)とオキシアルキレン基の平均数が20~30である重合性モノマー(A)との組み合わせがより好ましい。 When two or more polymerizable monomers (A) having different average numbers of oxyalkylene groups are used in combination, it is preferable that the difference between the average number of oxyalkylene groups of the polymerizable monomer (A) having the largest average number of oxyalkylene groups and the average number of oxyalkylene groups of the polymerizable monomer (A) having the smallest average number of oxyalkylene groups is 5 or more, and more preferably 5 to 20. For example, a combination of a polymerizable monomer (A) having an average number of oxyalkylene groups of 1 to 5 and a polymerizable monomer (A) having an average number of oxyalkylene groups of 10 or more, a combination of a polymerizable monomer (A) having an average number of oxyalkylene groups of 6 to 15 and a polymerizable monomer (A) having an average number of oxyalkylene groups of 20 or more are preferred, a combination of a polymerizable monomer (A) having an average number of oxyalkylene groups of 1 to 5 and a polymerizable monomer (A) having an average number of oxyalkylene groups of 10 to 20, and a combination of a polymerizable monomer (A) having an average number of oxyalkylene groups of 10 to 15 and a polymerizable monomer (A) having an average number of oxyalkylene groups of 20 to 30 are more preferred.
オキシアルキレン基の平均数が1~5である重合性モノマー(A)(以下、A1)とオキシアルキレン基の平均数が10以上である重合性モノマー(A)(以下、A2)とを併用する場合、その使用比率(A1:A2)は、質量基準で、10:90~90:10であることが好ましく、より好ましくは30:70~70:30、さらに好ましくは40:60~60:40である。
また、オキシアルキレン基の平均数が6~15である重合性モノマー(A)(以下、A3)とオキシアルキレン基の平均数が20以上である重合性モノマー(A)(以下、A4)とを併用する場合、その使用比率(A3:A4)は、質量基準で、10:90~90:10であることが好ましく、より好ましくは30:70~70:30、さらに好ましくは40:60~60:40である。
When a polymerizable monomer (A) having an average number of oxyalkylene groups of 1 to 5 (hereinafter, A1) and a polymerizable monomer (A) having an average number of oxyalkylene groups of 10 or more (hereinafter, A2) are used in combination, the usage ratio (A1:A2) is preferably 10:90 to 90:10, more preferably 30:70 to 70:30, and even more preferably 40:60 to 60:40, on a mass basis.
In addition, when a polymerizable monomer (A) having an average number of oxyalkylene groups of 6 to 15 (hereinafter, A3) is used in combination with a polymerizable monomer (A) having an average number of oxyalkylene groups of 20 or more (hereinafter, A4), the usage ratio (A3:A4) is preferably 10:90 to 90:10, more preferably 30:70 to 70:30, and even more preferably 40:60 to 60:40, on a mass basis.
なお2種以上の重合性モノマー(A)を併用する場合、それら重合性モノマー(A)が有するエチレン性不飽和結合含有基が全てCH2=C(R1)-C(=O)-O-*で表される基であるか、全てCH2=C(R1)-(CH2)m-O-*で表される基であることが好ましく、全てCH2=C(R1)-C(=O)-O-*で表される基であることがより好ましく、全てCH2=C(H)-C(=O)-O-*で表される基であるか又は全てCH2=C(CH3)-C(=O)-O-*で表される基であることがさらに好ましい。 When two or more types of polymerizable monomers (A) are used in combination, it is preferred that all of the ethylenically unsaturated bond-containing groups in those polymerizable monomers (A) are groups represented by CH2 =C( R1 )-C(=O)-O-* or all are groups represented by CH2 =C( R1 )-( CH2 ) m -O-*, it is more preferred that all are groups represented by CH2 =C( R1 )-C(=O)-O-*, and it is even more preferred that all are groups represented by CH2 =C(H)-C(=O)-O-* or all are groups represented by CH2 =C( CH3 )-C(=O)-O-*.
前記重合性モノマー(A)の重量平均分子量は、特に制限されないが、160~4500であることが好ましい。 The weight average molecular weight of the polymerizable monomer (A) is not particularly limited, but is preferably 160 to 4500.
重合性モノマー(A)の重量平均分子量は、ゲル浸透クロマトグラフィー(GPC)で測定することができ、具体的には以下の条件にて測定すればよい。
装置:東ソー社製 高速GPC装置(HLC-8320GPC)
検出器:RI
カラム:昭和電工製 SHODEX(登録商標) Asahipak(登録商標)GF-310-HQ、GF-710-HQ、GF-1G 7B
カラム温度:40℃
流速:0.5ml/min
検量線:創和科学社製 POLYACRYLIC ACID STANDARD
溶離液:0.1N酢酸ナトリウム水溶液/アセトニトリル=3/1(重量比)
The weight average molecular weight of the polymerizable monomer (A) can be measured by gel permeation chromatography (GPC), specifically, under the following conditions.
Apparatus: Tosoh Corporation high-speed GPC apparatus (HLC-8320GPC)
Detector: RI
Column: Showa Denko SHODEX (registered trademark), Asahipak (registered trademark), GF-310-HQ, GF-710-HQ, GF-1G 7B
Column temperature: 40°C
Flow rate: 0.5ml/min
Calibration curve: Polyacrylic Acid Standard manufactured by Sowa Science Co., Ltd.
Eluent: 0.1N sodium acetate aqueous solution/acetonitrile = 3/1 (weight ratio)
前記重合性モノマー(A)の含有量は、光硬化性組成物100質量%中、好ましくは3~60質量%、より好ましくは5~45質量%、さらに好ましくは8~30質量%である。 The content of the polymerizable monomer (A) is preferably 3 to 60% by mass, more preferably 5 to 45% by mass, and even more preferably 8 to 30% by mass, based on 100% by mass of the photocurable composition.
また、本発明の光硬化性組成物中に含まれる重合性モノマーの総量(すなわち重合性モノマー(A)~(C)の合計量)100質量%に対する前記重合性モノマー(A)の含有量は、15~85質量%であることが好ましく、より好ましくは25~75質量%、さらに好ましくは35~70質量%である。重合性モノマー(A)の含有量を上記所定値以上に調整することで得られる硬化物の透明性や水への溶解性がより高められる傾向にあり、また重合性モノマー(A)の含有量を上記所定値以下に調整することで、得られる硬化物のサポート性がより高められる傾向にある。 The content of the polymerizable monomer (A) relative to 100% by mass of the total amount of polymerizable monomers contained in the photocurable composition of the present invention (i.e., the total amount of polymerizable monomers (A) to (C)) is preferably 15 to 85% by mass, more preferably 25 to 75% by mass, and even more preferably 35 to 70% by mass. By adjusting the content of the polymerizable monomer (A) to the above-mentioned specified value or more, the transparency and water solubility of the obtained cured product tend to be further improved, and by adjusting the content of the polymerizable monomer (A) to the above-mentioned specified value or less, the supportability of the obtained cured product tends to be further improved.
1-2.水溶性の重合性モノマー(B)
本発明の光硬化性組成物は、前記重合性モノマー(A)以外の水溶性の重合性モノマー(B)を含む。重合性モノマー(B)を含むことにより、光硬化性組成物の硬化性が良好なものとなり、また得られる硬化物のサポート性及び水への溶解性が高められる。なお、重合性モノマー(B)は本発明の光硬化性組成物に1種単独で含まれていてもよく、2種以上が含まれていてもよい。
なお本明細書において「水溶性の重合性モノマー」とは、20℃での水溶解度(以下、水溶解度(20℃))が20g/L以上である重合性モノマーを指す。本明細書においては、温度20℃の恒温恒湿室において、100ccのスクリュー管中で、イオン交換水50cc(温度:20℃)に重合性モノマーXg(温度:20℃)を添加し、マグネチックスターラー(回転子:長さ10mm×φ4mmを使用)を用いて、5分間攪拌した後、10分間静置した溶液を目視により確認した際、得られた溶液が均一透明となった場合、該重合性モノマーの水溶解度(20℃)はYg/L以上である(Y=20X)と判断され、得られた溶液が均一透明とならなかった場合に、該重合性モノマーの水溶解度(20℃)はYg/L未満である(Y=20X)と判断される。すなわち、重合性モノマー(B)は、上記水溶解度(20℃)の測定において、1gの重合性モノマーを使用した際に、得られる溶液が均一透明となる重合性モノマーであるといえる。なお、均一透明とは、目視により相分離が認められず、且つ、白濁が認められないことを意味する。
1-2. Water-soluble polymerizable monomer (B)
The photocurable composition of the present invention contains a water-soluble polymerizable monomer (B) other than the polymerizable monomer (A). By containing the polymerizable monomer (B), the curability of the photocurable composition is improved, and the supportability and solubility in water of the obtained cured product are improved. The photocurable composition of the present invention may contain one type of polymerizable monomer (B) alone or two or more types of polymerizable monomers (B) may be contained.
In this specification, the term "water-soluble polymerizable monomer" refers to a polymerizable monomer having a water solubility at 20°C (hereinafter, water solubility (20°C)) of 20 g/L or more. In this specification, in a thermo-hygroscopic chamber at 20°C, Xg of polymerizable monomer (temperature: 20°C) is added to 50 cc of ion-exchanged water (temperature: 20°C) in a 100 cc screw tube, and the solution is stirred for 5 minutes using a magnetic stirrer (rotor: length 10 mm x φ4 mm is used) and then allowed to stand for 10 minutes. When the solution obtained is visually confirmed as being uniformly transparent, the water solubility (20°C) of the polymerizable monomer is judged to be Yg/L or more (Y = 20X), and when the solution obtained is not uniformly transparent, the water solubility (20°C) of the polymerizable monomer is judged to be less than Yg/L (Y = 20X). That is, the polymerizable monomer (B) is a polymerizable monomer that, when 1 g of the polymerizable monomer is used in the measurement of the water solubility (20° C.), the resulting solution is uniform and transparent. Note that the term "uniform and transparent" means that no phase separation is observed by visual inspection and no cloudiness is observed.
前記重合性モノマー(B)の水溶解度(20℃)は、100g/L以上であることが好ましく、より好ましくは200g/L以上、さらに好ましくは500g/L以上である。 The water solubility (20°C) of the polymerizable monomer (B) is preferably 100 g/L or more, more preferably 200 g/L or more, and even more preferably 500 g/L or more.
前記重合性モノマー(B)の含有量は、光硬化性組成物100質量%中、5~60質量%であることが好ましく、より好ましくは8~40質量%、さらに好ましくは10~25質量%である。 The content of the polymerizable monomer (B) is preferably 5 to 60 mass% in 100 mass% of the photocurable composition, more preferably 8 to 40 mass%, and even more preferably 10 to 25 mass%.
また、本発明の光硬化性組成物中に含まれる重合性モノマーの総量(すなわち重合性モノマー(A)~(C)の合計量)100質量%に対する前記重合性モノマー(B)の含有量は、15~85質量%であることが好ましく、より好ましくは25~75質量%、さらに好ましくは30~65質量%である。重合性モノマー(B)の含有量を上記所定値以上に調整することで、得られる硬化物のサポート性がより高められ、また重合性モノマー(B)の含有量を上記所定値以下に調整することで、得られる硬化物の水への溶解性をより高めることができる。 The content of the polymerizable monomer (B) relative to 100% by mass of the total amount of polymerizable monomers contained in the photocurable composition of the present invention (i.e., the total amount of polymerizable monomers (A) to (C)) is preferably 15 to 85% by mass, more preferably 25 to 75% by mass, and even more preferably 30 to 65% by mass. By adjusting the content of the polymerizable monomer (B) to be equal to or greater than the above-mentioned specified value, the supportability of the obtained cured product can be further improved, and by adjusting the content of the polymerizable monomer (B) to be equal to or less than the above-mentioned specified value, the solubility in water of the obtained cured product can be further improved.
また、重合性モノマー(A)に対する重合性モノマー(B)の質量比(B/A)は、0.1~5.0であることが好ましく、より好ましくは0.3~3.0、さらに好ましくは0.5~2.0である。質量比(B/A)を上記範囲に調整することで、得られる硬化物の透明性と水への溶解性がより優れるものとなりやすい。 The mass ratio (B/A) of the polymerizable monomer (B) to the polymerizable monomer (A) is preferably 0.1 to 5.0, more preferably 0.3 to 3.0, and even more preferably 0.5 to 2.0. By adjusting the mass ratio (B/A) to the above range, the resulting cured product tends to have better transparency and water solubility.
前記重合性モノマー(B)は、イオン性基を有するイオン性モノマー(以下、単にイオン性モノマーという場合がある)を含むことが好ましい。 The polymerizable monomer (B) preferably contains an ionic monomer having an ionic group (hereinafter, sometimes simply referred to as an ionic monomer).
前記イオン性基としては、陰イオン性基が挙げられ、具体的には、カルボキシ基からプロトンを除いた基、リン酸基からプロトンを除いた基、スルホ基からプロトンを除いた基等の酸性基からプロトンを除いた基等が挙げられる。中でも前記イオン性基としては、カルボキシ基からプロトンを除いた基であることが好ましい。 The ionic group may be an anionic group, and specifically may be a group obtained by removing a proton from an acidic group, such as a group obtained by removing a proton from a carboxy group, a group obtained by removing a proton from a phosphate group, or a group obtained by removing a proton from a sulfo group. Of these, the ionic group is preferably a group obtained by removing a proton from a carboxy group.
前記イオン性モノマーは、さらに、上記イオン性基と対となるイオン(以下、対イオンという場合がある)を有することが好ましい。なおイオン性モノマーは、全体としてイオン性基と対イオンの電荷が釣り合っていること、すなわち全体として中性であることが好ましい。 It is preferable that the ionic monomer further has an ion (hereinafter, sometimes referred to as a counter ion) that pairs with the ionic group. It is preferable that the charges of the ionic group and the counter ion are balanced as a whole, that is, the ionic monomer is neutral as a whole.
前記対イオンは、陽イオンであることが好ましく、具体的には、
ナトリウムイオン、カリウムイオン等のアルカリ金属イオン、アンモニウム等の1価の対イオン;
亜鉛イオン、マグネシウムイオン、カルシウムイオン、アルミニウムイオン、ネオジウムイオン等の多価金属イオンに代表される多価の対イオン;等が挙げられる。
The counter ion is preferably a cation, specifically,
a monovalent counter ion such as an alkali metal ion, such as a sodium ion or a potassium ion, or an ammonium ion;
Polyvalent counter ions typified by polyvalent metal ions such as zinc ion, magnesium ion, calcium ion, aluminum ion, and neodymium ion; and the like.
特に、得られる硬化物のサポート性をより高める観点から、前記対イオンとしては、多価金属イオンであることが好ましく、すなわち前記イオン性モノマーは、前記イオン性基と対となる多価金属イオンを有するイオン性モノマー(以下、多価金属イオン含有イオン性モノマーという場合がある)を含むことが好ましい。多価金属イオン含有イオン性モノマーを構成する対イオンとしては、多価金属イオンであれば特に限定されないが、中でも、亜鉛イオン、マグネシウムイオン、カルシウムイオン、ネオジウムイオン等の2価金属イオンであることが好ましく、亜鉛イオン、マグネシウムイオン、カルシウムイオンがより好ましく、亜鉛イオンが特に好ましい。 In particular, from the viewpoint of further enhancing the supportability of the resulting cured product, the counter ion is preferably a polyvalent metal ion, i.e., the ionic monomer preferably contains an ionic monomer having a polyvalent metal ion that pairs with the ionic group (hereinafter, may be referred to as a polyvalent metal ion-containing ionic monomer). The counter ion constituting the polyvalent metal ion-containing ionic monomer is not particularly limited as long as it is a polyvalent metal ion, but among them, it is preferably a divalent metal ion such as a zinc ion, magnesium ion, calcium ion, or neodymium ion, more preferably a zinc ion, magnesium ion, or calcium ion, and particularly preferably a zinc ion.
また、前記イオン性モノマーとしては、多価金属イオン含有イオン性モノマーと、前記対イオンとして1価の陽イオンを有するイオン性モノマー(以下、1価陽イオン含有イオン性モノマーという場合がある)とを併用することも好ましい。前記1価陽イオン含有イオン性モノマーを構成する対イオンとしては、アルカリ金属イオン又はアンモニウムであることが好ましく、より好ましくはナトリウムイオン、カリウムイオン又はアンモニウムであり、さらに好ましくはカリウムイオンである。 It is also preferable to use, as the ionic monomer, a polyvalent metal ion-containing ionic monomer in combination with an ionic monomer having a monovalent cation as the counter ion (hereinafter, sometimes referred to as a monovalent cation-containing ionic monomer). The counter ion constituting the monovalent cation-containing ionic monomer is preferably an alkali metal ion or ammonium, more preferably a sodium ion, potassium ion or ammonium, and even more preferably a potassium ion.
前記イオン性モノマーの含有量(特に、前記1価陽イオン含有イオン性モノマーと前記多価金属イオン含有イオン性モノマーとの合計含有量)は、前記重合性モノマー(B)100質量%中、30~100質量%であることが好ましく、より好ましくは50~100質量%、さらに好ましくは80~100質量%、特に好ましくは95~100質量%である。 The content of the ionic monomer (particularly the total content of the monovalent cation-containing ionic monomer and the polyvalent metal ion-containing ionic monomer) is preferably 30 to 100 mass% in 100 mass% of the polymerizable monomer (B), more preferably 50 to 100 mass%, even more preferably 80 to 100 mass%, and particularly preferably 95 to 100 mass%.
前記イオン性モノマーの含有量は、光硬化性組成物100質量%中、5~60質量%であることが好ましく、より好ましくは8~40質量%、さらに好ましくは10~25質量%である。 The content of the ionic monomer is preferably 5 to 60% by mass, more preferably 8 to 40% by mass, and even more preferably 10 to 25% by mass, based on 100% by mass of the photocurable composition.
また、本発明の光硬化性組成物中に含まれる重合性モノマーの総量(すなわち重合性モノマー(A)~(C)の合計量)100質量%に対する前記イオン性モノマーの含有量は、15~85質量%であることが好ましく、より好ましくは25~75質量%、さらに好ましくは30~65質量%である。イオン性モノマーの含有量を上記所定値以上に調整することで、得られる硬化物のサポート性がより高められ、また重合性モノマー(B)の含有量を上記所定値以下に調整することで、得られる硬化物の水への溶解性をより高めることができる。 The content of the ionic monomer relative to 100% by mass of the total amount of polymerizable monomers contained in the photocurable composition of the present invention (i.e., the total amount of polymerizable monomers (A) to (C)) is preferably 15 to 85% by mass, more preferably 25 to 75% by mass, and even more preferably 30 to 65% by mass. By adjusting the content of the ionic monomer to be equal to or greater than the above-mentioned specified value, the supportability of the obtained cured product can be further improved, and by adjusting the content of the polymerizable monomer (B) to be equal to or less than the above-mentioned specified value, the solubility in water of the obtained cured product can be further improved.
前記多価金属イオン含有イオン性モノマーの含有量は、前記重合性モノマー(B)100質量%中、例えば20~100質量%であり、好ましくは35質量%以上、より好ましくは50質量%以上、さらに好ましくは65質量%以上、よりさらに好ましくは80質量%以上、特に好ましくは90質量%以上である。多価金属イオン含有イオン性モノマーの含有量を上記範囲に調整することで、得られる硬化物のサポート性をより高めることができる。特に、多価金属イオン含有イオン性モノマーの前記含有量を50質量%以上に調整することで、サポート性の向上効果がさらに高められる傾向にある。また、多価金属イオン含有イオン性モノマーの前記含有量を50質量%以上(好ましくは65質量%以上、より好ましくは80質量%以上、さらに好ましくは90質量%以上)に調整することで、光硬化性組成物の低粘度化が可能となる。光硬化性組成物の低粘度化により、吐出ヘッドでの目詰まりといったインクジェット3Dプリンターでの吐出不良が生じ難く、すなわち吐出安定性が高められる。 The content of the polyvalent metal ion-containing ionic monomer is, for example, 20 to 100% by mass, preferably 35% by mass or more, more preferably 50% by mass or more, even more preferably 65% by mass or more, even more preferably 80% by mass or more, and particularly preferably 90% by mass or more, based on 100% by mass of the polymerizable monomer (B). By adjusting the content of the polyvalent metal ion-containing ionic monomer to the above range, the supportability of the obtained cured product can be further improved. In particular, by adjusting the content of the polyvalent metal ion-containing ionic monomer to 50% by mass or more, the effect of improving the supportability tends to be further enhanced. In addition, by adjusting the content of the polyvalent metal ion-containing ionic monomer to 50% by mass or more (preferably 65% by mass or more, more preferably 80% by mass or more, and even more preferably 90% by mass or more), the viscosity of the photocurable composition can be reduced. By reducing the viscosity of the photocurable composition, ejection defects in an inkjet 3D printer, such as clogging of the ejection head, are less likely to occur, that is, ejection stability is improved.
前記1価陽イオン含有イオン性モノマーの含有量は、前記重合性モノマー(B)100質量%中、例えば10質量%以上であってもよく、20質量%以上であってもよい。前記1価陽イオン含有イオン性モノマーの含有量は、前記重合性モノマー(B)100質量%中、100質量%であってもよいが、光硬化性組成物の低粘度化及び得られる硬化物のサポート性をより高める観点から、80質量%以下であることが好ましく、より好ましくは50質量%以下、さらに好ましくは35質量%以下、よりさらに好ましくは20質量%以下、特に好ましくは10質量%以下であり、0質量%であってもよい。 The content of the monovalent cation-containing ionic monomer may be, for example, 10% by mass or more, or 20% by mass or more, in 100% by mass of the polymerizable monomer (B). The content of the monovalent cation-containing ionic monomer may be 100% by mass in 100% by mass of the polymerizable monomer (B), but from the viewpoint of lowering the viscosity of the photocurable composition and further increasing the supportability of the obtained cured product, it is preferably 80% by mass or less, more preferably 50% by mass or less, even more preferably 35% by mass or less, even more preferably 20% by mass or less, particularly preferably 10% by mass or less, and may be 0% by mass.
また、光硬化性組成物に含まれる多価金属イオン含有イオン性モノマーと1価陽イオン含有イオン性モノマーの質量比(多価金属イオン含有イオン性モノマー/1価陽イオン含有イオン性モノマー)は、例えば20/80~100/0であり、好ましくは35/65~100/0、より好ましくは50/50~100/0、よりさらに好ましくは60/40~100/0、特に好ましくは80/20~100/0である。特に、光硬化性組成物の低粘度化の観点からは、上記質量比を50/50~100/0に調整することが好ましく、60/40~100/0に調整することがより好ましく、80/20~100/0に調整することがさらに好ましい。 The mass ratio of the polyvalent metal ion-containing ionic monomer to the monovalent cation-containing ionic monomer contained in the photocurable composition (polyvalent metal ion-containing ionic monomer/monovalent cation-containing ionic monomer) is, for example, 20/80 to 100/0, preferably 35/65 to 100/0, more preferably 50/50 to 100/0, even more preferably 60/40 to 100/0, and particularly preferably 80/20 to 100/0. In particular, from the viewpoint of reducing the viscosity of the photocurable composition, it is preferable to adjust the above mass ratio to 50/50 to 100/0, more preferably 60/40 to 100/0, and even more preferably 80/20 to 100/0.
前記イオン性基としてカルボキシ基からプロトンを除いた基を含有するイオン性モノマーとしては、エチレン性不飽和カルボン酸の塩であることが好ましい。
前記エチレン性不飽和カルボン酸の塩としては、不飽和カルボン酸のナトリウム塩、カリウム塩等のアルカリ金属塩、アンモニウム塩等の1価塩;亜鉛塩、マグネシウム塩、カルシウム塩、アルミニウム塩、ネオジウム塩等の多価金属塩に代表される多価塩;などが挙げられる。
前記エチレン性不飽和カルボン酸の塩を構成するエチレン性不飽和カルボン酸とは、エチレン性不飽和基を有するカルボン酸化合物であり、具体的に、(メタ)アクリル酸、マレイン酸、フマル酸、2-(メタ)アクリロイロキシエチルヘキサヒドロフタル酸、2-(メタ)アクリロイルオキシエチルコハク酸、N-(メタ)アクリロイルアスパラギン酸、ω-(メタ)アクロイルアルカン-1,1-ジカルボン酸等の脂肪族不飽和カルボン酸;2-(メタ)アクリロイルオキシ安息香酸、3-(メタ)アクリロイルオキシ安息香酸、4-(メタ)アクリロイルオキシ安息香酸、2-(メタ)アクリロイロキシエチルフタル酸、2-ビニル安息香酸、3-ビニル安息香酸、4-ビニル安息香酸等の芳香族不飽和カルボン酸;等が挙げられ、中でも脂肪族不飽和カルボン酸であることが好ましい。
前記エチレン性不飽和カルボン酸の塩を構成するエチレン性不飽和カルボン酸の炭素数は、3~15であることが好ましく、より好ましくは3~12、さらに好ましくは3~9、特に好ましくは3~6である。炭素数が少ないエチレン性不飽和カルボン酸の塩を用いることにより、分子中の疎水性部分を小さくすることができ、得られる硬化物の水への溶解性をより高めることができる。
The ionic monomer containing a group obtained by removing a proton from a carboxy group as the ionic group is preferably a salt of an ethylenically unsaturated carboxylic acid.
Examples of the salt of the ethylenically unsaturated carboxylic acid include monovalent salts such as alkali metal salts, such as sodium salts and potassium salts, and ammonium salts of the unsaturated carboxylic acid; and polyvalent salts represented by polyvalent metal salts, such as zinc salts, magnesium salts, calcium salts, aluminum salts, and neodymium salts.
The ethylenically unsaturated carboxylic acid constituting the salt of the ethylenically unsaturated carboxylic acid is a carboxylic acid compound having an ethylenically unsaturated group, and specific examples thereof include aliphatic unsaturated carboxylic acids such as (meth)acrylic acid, maleic acid, fumaric acid, 2-(meth)acryloyloxyethylhexahydrophthalic acid, 2-(meth)acryloyloxyethylsuccinic acid, N-(meth)acryloylaspartic acid, and ω-(meth)acroylalkane-1,1-dicarboxylic acid; and aromatic unsaturated carboxylic acids such as 2-(meth)acryloyloxybenzoic acid, 3-(meth)acryloyloxybenzoic acid, 4-(meth)acryloyloxybenzoic acid, 2-(meth)acryloyloxyethylphthalic acid, 2-vinylbenzoic acid, 3-vinylbenzoic acid, and 4-vinylbenzoic acid; and among these, aliphatic unsaturated carboxylic acids are preferable.
The number of carbon atoms in the ethylenically unsaturated carboxylic acid constituting the salt of the ethylenically unsaturated carboxylic acid is preferably 3 to 15, more preferably 3 to 12, further preferably 3 to 9, and particularly preferably 3 to 6. By using a salt of an ethylenically unsaturated carboxylic acid having a small number of carbon atoms, the hydrophobic portion in the molecule can be made smaller, and the solubility of the obtained cured product in water can be further increased.
前記イオン性基としてリン酸基からプロトンを除いた基を含有するイオン性モノマーとしては、エチレン性不飽和リン酸の塩であることが好ましい。
前記エチレン性不飽和リン酸の塩としては、エチレン性不飽和リン酸のナトリウム塩、カリウム塩等のアルカリ金属塩、アンモニウム塩等の1価塩;亜鉛塩、マグネシウム塩、カルシウム塩、アルミニウム塩、ネオジウム塩等の多価金属塩に代表される多価塩;などが挙げられる。
前記エチレン性不飽和リン酸の塩を構成するエチレン性不飽和リン酸とは、エチレン性不飽和基を有するリン酸化合物であり、具体的に、モノ(2-(メタ)アクリロイルオキシエチル)アシッドホスフェート、フェニル(2-(メタ)アクリロイルオキシエチル)ホスフェート、アシッドホスホオキシエチル(メタ)アクリレート、(メタ)アクリロイルオキシプロピルアシッドホスフェート、(メタ)アクリロイルオキシ-2-ヒドロキシプロピルアシッドホスフェート、(メタ)アクリロイルオキシ-3-ヒドロキシプロピルアシッドホスフェート、(メタ)アクリロイルオキシ-3-クロロ-2-ヒドロキシプロピルアシッドホスフェート、ビニルリン酸、p-ビニルベンゼンリン酸等が挙げられる。
The ionic monomer containing, as the ionic group, a group obtained by removing a proton from a phosphate group, is preferably a salt of an ethylenically unsaturated phosphate.
Examples of the salt of the ethylenically unsaturated phosphate include monovalent salts such as alkali metal salts, such as sodium salts and potassium salts, and ammonium salts of ethylenically unsaturated phosphate; and polyvalent salts represented by polyvalent metal salts, such as zinc salts, magnesium salts, calcium salts, aluminum salts, and neodymium salts.
The ethylenically unsaturated phosphoric acid constituting the salt of the ethylenically unsaturated phosphoric acid is a phosphoric acid compound having an ethylenically unsaturated group, and specific examples thereof include mono(2-(meth)acryloyloxyethyl) acid phosphate, phenyl(2-(meth)acryloyloxyethyl) phosphate, acid phosphooxyethyl (meth)acrylate, (meth)acryloyloxypropyl acid phosphate, (meth)acryloyloxy-2-hydroxypropyl acid phosphate, (meth)acryloyloxy-3-hydroxypropyl acid phosphate, (meth)acryloyloxy-3-chloro-2-hydroxypropyl acid phosphate, vinyl phosphoric acid, and p-vinylbenzene phosphoric acid.
前記イオン性基としてスルホ基からプロトンを除いた基を含有するイオン性モノマーとしては、エチレン性不飽和スルホン酸の塩であることが好ましい。
前記エチレン性不飽和スルホン酸の塩としては、エチレン性不飽和スルホン酸のナトリウム塩、カリウム塩等のアルカリ金属塩、アンモニウム塩等の1価塩;亜鉛塩、マグネシウム塩、カルシウム塩、アルミニウム塩、ネオジウム塩等の多価金属塩に代表される多価塩;などが挙げられる。
前記エチレン性不飽和スルホン酸の塩を構成するエチレン性不飽和スルホン酸とは、エチレン性不飽和基を有するスルホン酸化合物であり、具体的に、アリルスルホン酸、イソプレンスルホン酸、2-(メタ)アクリルアミドエチルスルホン酸、3-(メタ)アクリルアミドプロピルスルホン酸、4-(メタ)アクリルアミドブチルスルホン酸、2-(メタ)アクリルアミド-2-メチルプロパンスルホン酸、p-ビニルベンゼンスルホン酸、ビニルスルホン酸等が挙げられる。
The ionic monomer containing a group obtained by removing a proton from a sulfo group as the ionic group is preferably a salt of an ethylenically unsaturated sulfonic acid.
Examples of the salt of the ethylenically unsaturated sulfonic acid include monovalent salts such as alkali metal salts, such as sodium salts and potassium salts, and ammonium salts of ethylenically unsaturated sulfonic acids; and polyvalent salts represented by polyvalent metal salts, such as zinc salts, magnesium salts, calcium salts, aluminum salts, and neodymium salts.
The ethylenically unsaturated sulfonic acid constituting the salt of the ethylenically unsaturated sulfonic acid is a sulfonic acid compound having an ethylenically unsaturated group, and specific examples thereof include allylsulfonic acid, isoprene sulfonic acid, 2-(meth)acrylamide ethyl sulfonic acid, 3-(meth)acrylamide propyl sulfonic acid, 4-(meth)acrylamide butyl sulfonic acid, 2-(meth)acrylamide-2-methylpropanesulfonic acid, p-vinylbenzenesulfonic acid, and vinylsulfonic acid.
前記イオン性モノマーとしては、エチレン性不飽和カルボン酸の塩であることが好ましく、エチレン性不飽和カルボン酸の1価塩及び/又は多価金属塩であることがより好ましく、エチレン性不飽和カルボン酸の多価金属塩であることがさらに好ましく、エチレン性不飽和カルボン酸の亜鉛塩、マグネシウム塩、カルシウム塩、ネオジウム塩等の2価金属塩であることがさらにより好ましく、エチレン性不飽和カルボン酸の亜鉛塩、マグネシウム塩、カルシウム塩が特に好ましく、エチレン性不飽和カルボン酸の亜鉛塩が最も好ましい。
また、前記エチレン性不飽和カルボン酸の多価金属塩と、エチレン性不飽和カルボン酸の1価塩とを併用することも好ましい。該エチレン性不飽和カルボン酸の1価塩としては、エチレン性不飽和カルボン酸のアルカリ金属塩又はアンモニウム塩であることが好ましく、より好ましくはエチレン性不飽和カルボン酸のナトリウム塩、カリウム塩又はアンモニウム塩であり、さらに好ましくはエチレン性不飽和カルボン酸のカリウム塩である。
The ionic monomer is preferably a salt of an ethylenically unsaturated carboxylic acid, more preferably a monovalent salt and/or a polyvalent metal salt of an ethylenically unsaturated carboxylic acid, even more preferably a polyvalent metal salt of an ethylenically unsaturated carboxylic acid, still more preferably a divalent metal salt such as a zinc salt, magnesium salt, calcium salt or neodymium salt of an ethylenically unsaturated carboxylic acid, particularly preferably a zinc salt, magnesium salt or calcium salt of an ethylenically unsaturated carboxylic acid, and most preferably a zinc salt of an ethylenically unsaturated carboxylic acid.
It is also preferable to use the polyvalent metal salt of the ethylenically unsaturated carboxylic acid in combination with a monovalent salt of the ethylenically unsaturated carboxylic acid. The monovalent salt of the ethylenically unsaturated carboxylic acid is preferably an alkali metal salt or an ammonium salt of the ethylenically unsaturated carboxylic acid, more preferably a sodium salt, a potassium salt or an ammonium salt of the ethylenically unsaturated carboxylic acid, and even more preferably a potassium salt of the ethylenically unsaturated carboxylic acid.
前記エチレン性不飽和カルボン酸の塩を構成するエチレン性不飽和カルボン酸としては、(メタ)アクリル酸であることが最も好ましい。すなわち、前記イオン性モノマーとしては、(メタ)アクリル酸の塩であることが好ましく、(メタ)アクリル酸の1価塩及び/又は多価金属塩であることがより好ましく、(メタ)アクリル酸の多価金属塩であることがさらに好ましく、(メタ)アクリル酸の亜鉛塩、マグネシウム塩、カルシウム塩、ネオジウム塩等の2価金属塩であることがさらにより好ましく、(メタ)アクリル酸の亜鉛塩、マグネシウム塩、カルシウム塩が特に好ましく、(メタ)アクリル酸の亜鉛塩が最も好ましい。
また、前記(メタ)アクリル酸の多価金属塩と、(メタ)アクリル酸の1価塩とを併用することも好ましい。該(メタ)アクリル酸の1価塩としては、(メタ)アクリル酸のアルカリ金属塩又はアンモニウム塩であることが好ましく、より好ましくは(メタ)アクリル酸のナトリウム塩、カリウム塩又はアンモニウム塩であり、さらに好ましくは(メタ)アクリル酸のカリウム塩である。
The ethylenically unsaturated carboxylic acid constituting the salt of the ethylenically unsaturated carboxylic acid is most preferably (meth)acrylic acid.That is, the ionic monomer is preferably a salt of (meth)acrylic acid, more preferably a monovalent salt and/or a polyvalent metal salt of (meth)acrylic acid, even more preferably a polyvalent metal salt of (meth)acrylic acid, even more preferably a divalent metal salt such as zinc salt, magnesium salt, calcium salt, or neodymium salt of (meth)acrylic acid, particularly preferably a zinc salt, magnesium salt, or calcium salt of (meth)acrylic acid, and most preferably a zinc salt of (meth)acrylic acid.
It is also preferable to use the polyvalent metal salt of (meth)acrylic acid in combination with a monovalent salt of (meth)acrylic acid. The monovalent salt of (meth)acrylic acid is preferably an alkali metal salt or ammonium salt of (meth)acrylic acid, more preferably a sodium salt, potassium salt or ammonium salt of (meth)acrylic acid, and even more preferably a potassium salt of (meth)acrylic acid.
前記エチレン性不飽和カルボン酸の塩(特に(メタ)アクリル酸の塩)の含有量は、前記重合性モノマー(B)100質量%中、30~100質量%であることが好ましく、より好ましくは50~100質量%、さらに好ましくは80~100質量%、特に好ましくは90~100質量%である。 The content of the salt of the ethylenically unsaturated carboxylic acid (particularly the salt of (meth)acrylic acid) is preferably 30 to 100% by mass, more preferably 50 to 100% by mass, even more preferably 80 to 100% by mass, and particularly preferably 90 to 100% by mass, based on 100% by mass of the polymerizable monomer (B).
前記エチレン性不飽和カルボン酸の塩(特に、(メタ)アクリル酸の塩)の含有量は、光硬化性組成物100質量%中、5~60質量%であることが好ましく、より好ましくは8~40質量%、さらに好ましくは10~25質量%である。 The content of the salt of the ethylenically unsaturated carboxylic acid (particularly the salt of (meth)acrylic acid) is preferably 5 to 60 mass %, more preferably 8 to 40 mass %, and even more preferably 10 to 25 mass %, based on 100 mass % of the photocurable composition.
また、本発明の光硬化性組成物中に含まれる重合性モノマーの総量(すなわち重合性モノマー(A)~(C)の合計量)100質量%に対する前記エチレン性不飽和カルボン酸の塩(特に、(メタ)アクリル酸の塩)の含有量は、15~85質量%であることが好ましく、より好ましくは25~75質量%、さらに好ましくは30~65質量%である。エチレン性不飽和カルボン酸の塩の含有量を上記所定値以上に調整することで、得られる硬化物のサポート性がより高められ、また重合性モノマー(B)の含有量を上記所定値以下に調整することで、得られる硬化物の水への溶解性をより高めることができる。 The content of the salt of the ethylenically unsaturated carboxylic acid (particularly the salt of (meth)acrylic acid) relative to 100% by mass of the total amount of polymerizable monomers contained in the photocurable composition of the present invention (i.e. the total amount of polymerizable monomers (A) to (C)) is preferably 15 to 85% by mass, more preferably 25 to 75% by mass, and even more preferably 30 to 65% by mass. By adjusting the content of the salt of the ethylenically unsaturated carboxylic acid to the above-mentioned specified value or more, the supportability of the obtained cured product can be further improved, and by adjusting the content of the polymerizable monomer (B) to the above-mentioned specified value or less, the solubility in water of the obtained cured product can be further improved.
前記エチレン性不飽和カルボン酸の多価金属塩(特に、(メタ)アクリル酸の多価金属塩)の含有量は、前記重合性モノマー(B)100質量%中、例えば20~100質量%であり、好ましくは35質量%以上、より好ましくは50質量%以上、さらに好ましくは65質量%以上、よりさらに好ましくは80質量%以上である。エチレン性不飽和カルボン酸の多価金属塩の含有量を上記範囲に調整することで、得られる硬化物のサポート性をより高めることができる。特に、エチレン性不飽和カルボン酸の多価金属塩(特に、(メタ)アクリル酸の多価金属塩)の前記含有量を50質量%以上に調整することで、サポート性の向上効果がさらに高められる傾向にある。また、エチレン性不飽和カルボン酸の多価金属塩(特に、(メタ)アクリル酸の多価金属塩)の前記含有量を50質量%以上(好ましくは65質量%以上、より好ましくは80質量%以上)に調整することで、光硬化性組成物の低粘度化が可能となる。 The content of the polyvalent metal salt of the ethylenically unsaturated carboxylic acid (particularly, the polyvalent metal salt of (meth)acrylic acid) is, for example, 20 to 100% by mass, preferably 35% by mass or more, more preferably 50% by mass or more, even more preferably 65% by mass or more, and even more preferably 80% by mass or more, based on 100% by mass of the polymerizable monomer (B). By adjusting the content of the polyvalent metal salt of the ethylenically unsaturated carboxylic acid to the above range, the supportability of the obtained cured product can be further improved. In particular, by adjusting the content of the polyvalent metal salt of the ethylenically unsaturated carboxylic acid (particularly, the polyvalent metal salt of (meth)acrylic acid) to 50% by mass or more, the effect of improving the supportability tends to be further enhanced. In addition, by adjusting the content of the polyvalent metal salt of the ethylenically unsaturated carboxylic acid (particularly, the polyvalent metal salt of (meth)acrylic acid) to 50% by mass or more (preferably 65% by mass or more, more preferably 80% by mass or more), the viscosity of the photocurable composition can be reduced.
前記エチレン性不飽和カルボン酸の1価塩(特に、(メタ)アクリル酸の1価塩)の含有量は、前記重合性モノマー(B)100質量%中、例えば10質量%以上であってもよく、20質量%以上であってもよい。前記エチレン性不飽和カルボン酸の1価塩(特に、(メタ)アクリル酸の1価塩)の含有量は、前記重合性モノマー(B)100質量%中、100質量%であってもよいが、光硬化性組成物の低粘度化及び得られる硬化物のサポート性をより高める観点から、80質量%以下であることが好ましく、より好ましくは50質量%以下、さらに好ましくは35質量%以下、よりさらに好ましくは20質量%以下、特に好ましくは10質量%以下であり、0質量%であってもよい。 The content of the monovalent salt of the ethylenically unsaturated carboxylic acid (particularly, the monovalent salt of (meth)acrylic acid) may be, for example, 10% by mass or more, or 20% by mass or more, in 100% by mass of the polymerizable monomer (B). The content of the monovalent salt of the ethylenically unsaturated carboxylic acid (particularly, the monovalent salt of (meth)acrylic acid) may be 100% by mass in 100% by mass of the polymerizable monomer (B), but from the viewpoint of lowering the viscosity of the photocurable composition and further increasing the supportability of the obtained cured product, it is preferably 80% by mass or less, more preferably 50% by mass or less, even more preferably 35% by mass or less, even more preferably 20% by mass or less, particularly preferably 10% by mass or less, and may be 0% by mass.
また、光硬化性組成物に含まれるエチレン性不飽和カルボン酸の多価金属塩とエチレン性不飽和カルボン酸の1価塩の質量比(エチレン性不飽和カルボン酸の多価金属塩/エチレン性不飽和カルボン酸の1価塩)は、例えば20/80~100/0であり、好ましくは35/65~100/0、より好ましくは50/50~100/0、よりさらに好ましくは60/40~100/0、特に好ましくは80/20~100/0である。また、光硬化性組成物に含まれる(メタ)アクリル酸の多価金属塩と(メタ)アクリル酸の1価塩の質量比((メタ)アクリル酸の多価金属塩/(メタ)アクリル酸の1価塩)を上記範囲に調整することも好ましい。特に、光硬化性組成物の低粘度化の観点からは、上記質量比(すなわち、エチレン性不飽和カルボン酸の多価金属塩/エチレン性不飽和カルボン酸の1価塩、好ましくは(メタ)アクリル酸の多価金属塩/(メタ)アクリル酸の1価塩)を50/50~100/0に調整することが好ましく、60/40~100/0に調整することがより好ましく、80/20~100/0に調整することがさらに好ましい。 In addition, the mass ratio of the polyvalent metal salt of an ethylenically unsaturated carboxylic acid to the monovalent salt of an ethylenically unsaturated carboxylic acid (polyvalent metal salt of an ethylenically unsaturated carboxylic acid/monovalent salt of an ethylenically unsaturated carboxylic acid) contained in the photocurable composition is, for example, 20/80 to 100/0, preferably 35/65 to 100/0, more preferably 50/50 to 100/0, even more preferably 60/40 to 100/0, and particularly preferably 80/20 to 100/0. In addition, it is also preferable to adjust the mass ratio of the polyvalent metal salt of (meth)acrylic acid to the monovalent salt of (meth)acrylic acid (polyvalent metal salt of (meth)acrylic acid/monovalent salt of (meth)acrylic acid) contained in the photocurable composition to the above range. In particular, from the viewpoint of reducing the viscosity of the photocurable composition, it is preferable to adjust the above mass ratio (i.e., polyvalent metal salt of ethylenically unsaturated carboxylic acid/monovalent salt of ethylenically unsaturated carboxylic acid, preferably polyvalent metal salt of (meth)acrylic acid/monovalent salt of (meth)acrylic acid) to 50/50 to 100/0, more preferably 60/40 to 100/0, and even more preferably 80/20 to 100/0.
上記イオン性モノマー以外の重合性モノマー(B)としては、(メタ)アクリル酸;メチル(メタ)アクリレート;(メタ)アクリロイルモルホリン;N-ビニルピロリドン;(メタ)アクリルアミド、N,N-ジメチルアクリルアミド、N-ヒドロキシエチルアクリルアミド、N-イソプロピルアクリルアミド等のアクリルアミド;等が挙げられる。 Examples of polymerizable monomers (B) other than the above ionic monomers include (meth)acrylic acid; methyl (meth)acrylate; (meth)acryloylmorpholine; N-vinylpyrrolidone; acrylamides such as (meth)acrylamide, N,N-dimethylacrylamide, N-hydroxyethylacrylamide, and N-isopropylacrylamide; and the like.
本発明の光硬化性組成物中に含まれる重合性モノマーの総量(すなわち重合性モノマー(A)~(C)の合計量)100質量%に対する重合性モノマー(A)及び重合性モノマー(B)の合計含有量は、50~100質量%以上であることが好ましく、より好ましくは70質量%以上、さらに好ましくは90質量%以上、特に好ましくは98質量%以上である。 The total content of polymerizable monomer (A) and polymerizable monomer (B) relative to 100% by mass of the total amount of polymerizable monomers contained in the photocurable composition of the present invention (i.e., the total amount of polymerizable monomers (A) to (C)) is preferably 50 to 100% by mass or more, more preferably 70% by mass or more, even more preferably 90% by mass or more, and particularly preferably 98% by mass or more.
1-3.重合性モノマー(C)
本発明の光硬化性組成物は、上記重合性モノマー(A)及び(B)以外の、重合性モノマー(C)(例えば、水溶解度(20℃)が20g/L未満の重合性モノマー)を含んでいてもよい。重合性モノマー(C)としては、例えば、
エチル(メタ)アクリレート、プロピル(メタ)アクリレート、ブチル(メタ)アクリレート、2-エチルヘキシル(メタ)アクリレート、ペンチル(メタ)アクリレート、イソアミル(メタ)アクリレート、オクチル(メタ)アクリレート、イソオクチル(メタ)アクリレート、イソノニル(メタ)アクリレート、デシル(メタ)アクリレート、イソデシル(メタ)アクリレート、ラウリル(メタ)アクリレート、トリデシル(メタ)アクリレート、イソミリスチル(メタ)アクリレート、イソステアリル(メタ)アクリレート、n-ステアリル(メタ)アクリレート等のアルキル(メタ)アクリレート;シクロヘキシル(メタ)アクリレート、t-ブチルシクロヘキシル(メタ)アクリレート、イソボルニル(メタ)アクリレート、ジシクロペンテニル(メタ)アクリレート、ジシクロペンタニル(メタ)アクリレート等の脂環式炭化水素基含有(メタ)アクリレート;フェニル(メタ)アクリレート、ベンジル(メタ)アクリレート、2-ヒドロキシ-3-フェノキシプロピル(メタ)アクリレート等の芳香族炭化水素基含有(メタ)アクリレート;テトラヒドロフルフリル(メタ)アクリレート等の(メタ)アクリレート化合物;
フェニルアリルエーテル、o-,m-,p-クレゾールモノアリルエーテル、ビフェニル-2-オールモノアリルエーテル、ビフェニル-4-オールモノアリルエーテル、ブチルアリルエーテル、シクロヘキシルアリルエーテル、シクロヘキサンメタノールモノアリルエーテル等のアリルエーテル化合物;
ブチルビニルエーテル、ブチルプロペニルエーテル、ブチルブテニルエーテル、ヘキシルビニルエーテル、エチルヘキシルビニルエーテル、フェニルビニルエーテル、ベンジルビニルエーテル、アセチルエトキシエトキシビニルエーテル、シクロヘキシルビニルエーテル、アダマンチルビニルエーテル等のビニルエーテル化合物;
フェニルマレイミド、シクロヘキシルマレイミド、n-ヘキシルマレイミド等のマレイミド化合物;等が挙げられる。
これらは1種で単独使用してもよく、2種以上を併用してもよい。
1-3. Polymerizable monomer (C)
The photocurable composition of the present invention may contain a polymerizable monomer (C) other than the above-mentioned polymerizable monomers (A) and (B) (for example, a polymerizable monomer having a water solubility (20° C.) of less than 20 g/L). Examples of the polymerizable monomer (C) include:
Ethyl (meth)acrylate, propyl (meth)acrylate, butyl (meth)acrylate, 2-ethylhexyl (meth)acrylate, pentyl (meth)acrylate, isoamyl (meth)acrylate, octyl (meth)acrylate, isooctyl (meth)acrylate, isononyl (meth)acrylate, decyl (meth)acrylate, isodecyl (meth)acrylate, lauryl (meth)acrylate, tridecyl (meth)acrylate, isomyristyl (meth)acrylate, isostearyl (meth)acrylate, n-stearyl (meth)acrylate alicyclic hydrocarbon group-containing (meth)acrylates such as cyclohexyl (meth)acrylate, t-butylcyclohexyl (meth)acrylate, isobornyl (meth)acrylate, dicyclopentenyl (meth)acrylate, dicyclopentanyl (meth)acrylate, etc.; aromatic hydrocarbon group-containing (meth)acrylates such as phenyl (meth)acrylate, benzyl (meth)acrylate, 2-hydroxy-3-phenoxypropyl (meth)acrylate, etc.; (meth)acrylate compounds such as tetrahydrofurfuryl (meth)acrylate, etc.;
Allyl ether compounds such as phenyl allyl ether, o-, m-, p-cresol monoallyl ether, biphenyl-2-ol monoallyl ether, biphenyl-4-ol monoallyl ether, butyl allyl ether, cyclohexyl allyl ether, and cyclohexanemethanol monoallyl ether;
Vinyl ether compounds such as butyl vinyl ether, butyl propenyl ether, butyl butenyl ether, hexyl vinyl ether, ethylhexyl vinyl ether, phenyl vinyl ether, benzyl vinyl ether, acetylethoxyethoxy vinyl ether, cyclohexyl vinyl ether, and adamantyl vinyl ether;
Maleimide compounds such as phenylmaleimide, cyclohexylmaleimide, and n-hexylmaleimide; and the like.
These may be used alone or in combination of two or more.
前記重合性モノマー(C)の含有量としては、光硬化性組成物100質量%中、30質量%以下であることが好ましく、より好ましくは10質量%以下、特に好ましくは2質量%未満である。重合性モノマー(C)の含有量を上記範囲に調整することで、光硬化性組成物の臭気をより抑制できる。 The content of the polymerizable monomer (C) is preferably 30% by mass or less, more preferably 10% by mass or less, and particularly preferably less than 2% by mass, based on 100% by mass of the photocurable composition. By adjusting the content of the polymerizable monomer (C) to the above range, the odor of the photocurable composition can be further suppressed.
重合性モノマー(A)、重合性モノマー(B)、及び重合性モノマー(C)の合計含有量(特に重合性モノマー(A)及び(B)の合計含有量)は、光硬化性組成物100質量%中、80質量%以下が好ましく、60質量%以下がより好ましく、50質量%未満がさらに好ましく、45質量%以下がよりさらに好ましく、40質量%以下が特に好ましい。重合性モノマーの合計量(特に重合性モノマー(A)及び(B)の合計含有量)を上記範囲に調整することで、光硬化性組成物の低粘度化が可能となり、また光硬化性組成物の熱安定性(具体的には、高温条件下で保管した際の増粘抑制効果)を高めることができる。
また重合性モノマー(A)、重合性モノマー(B)、及び重合性モノマー(C)の合計含有量(特に重合性モノマー(A)及び(B)の合計含有量)は、光硬化性組成物100質量%中、8質量%以上が好ましく、15質量%以上がより好ましく、20質量%以上がさらに好ましい。重合性モノマーの合計量(特に重合性モノマー(A)及び(B)の合計含有量)を上記範囲に調整することで、得られる硬化物のサポート性をより高めることができる。
すなわち、重合性モノマー(A)、重合性モノマー(B)、及び重合性モノマー(C)の合計含有量(特に重合性モノマー(A)及び(B)の合計含有量)は、光硬化性組成物100質量%中、8~80質量%が好ましく、より好ましくは15~60質量%、さらに好ましくは20質量%以上50質量%未満、よりさらに好ましくは20~45質量%、特に好ましくは20~40質量%である。
The total content of the polymerizable monomer (A), the polymerizable monomer (B), and the polymerizable monomer (C) (particularly the total content of the polymerizable monomers (A) and (B)) is preferably 80% by mass or less, more preferably 60% by mass or less, even more preferably less than 50% by mass, even more preferably 45% by mass or less, and particularly preferably 40% by mass or less, in 100% by mass of the photocurable composition. By adjusting the total amount of the polymerizable monomers (particularly the total content of the polymerizable monomers (A) and (B)) to the above range, it is possible to reduce the viscosity of the photocurable composition, and also to increase the thermal stability of the photocurable composition (specifically, the effect of suppressing thickening when stored under high temperature conditions).
The total content of the polymerizable monomer (A), the polymerizable monomer (B), and the polymerizable monomer (C) (particularly the total content of the polymerizable monomers (A) and (B)) is preferably 8% by mass or more, more preferably 15% by mass or more, and even more preferably 20% by mass or more, based on 100% by mass of the photocurable composition. By adjusting the total amount of the polymerizable monomers (particularly the total content of the polymerizable monomers (A) and (B)) within the above range, the supportability of the obtained cured product can be further improved.
That is, the total content of the polymerizable monomer (A), the polymerizable monomer (B), and the polymerizable monomer (C) (particularly the total content of the polymerizable monomers (A) and (B)) is preferably 8 to 80 mass%, more preferably 15 to 60 mass%, even more preferably 20 mass% or more and less than 50 mass%, still more preferably 20 to 45 mass%, and particularly preferably 20 to 40 mass%, in 100 mass% of the photocurable composition.
なお、上記重合性モノマー(B)における多価金属イオン含有イオン性モノマーの割合を高めることで、光硬化性組成物中の重合性モノマーの合計量が少なくとも、得られる硬化物のサポート性を高めることができる。すなわち、重合性モノマー(A)、重合性モノマー(B)、及び重合性モノマー(C)の合計含有量(特に重合性モノマー(A)及び(B)の合計含有量)が、光硬化性組成物100質量%中、8質量%以上50質量%未満(好ましくは15~45質量%、より好ましくは20~45質量%、さらに好ましくは20~40質量%)であり、前記多価金属イオン含有イオン性モノマー(好ましくはエチレン性不飽和カルボン酸の多価金属塩、より好ましくは(メタ)アクリル酸の多価金属塩)の含有量が、重合性モノマー(B)100質量%中、50~100質量%である態様は、光硬化性組成物の熱安定性と得られる硬化物のサポート性との両立の観点から好ましい。 In addition, by increasing the proportion of the polyvalent metal ion-containing ionic monomer in the polymerizable monomer (B), the supportability of the resulting cured product can be increased even if the total amount of polymerizable monomers in the photocurable composition is at least. That is, an embodiment in which the total content of polymerizable monomer (A), polymerizable monomer (B), and polymerizable monomer (C) (particularly the total content of polymerizable monomers (A) and (B)) is 8% by mass or more and less than 50% by mass (preferably 15 to 45% by mass, more preferably 20 to 45% by mass, and even more preferably 20 to 40% by mass) in 100% by mass of the photocurable composition, and the content of the polyvalent metal ion-containing ionic monomer (preferably a polyvalent metal salt of an ethylenically unsaturated carboxylic acid, more preferably a polyvalent metal salt of (meth)acrylic acid) is 50 to 100% by mass in 100% by mass of polymerizable monomer (B) is preferable from the viewpoint of achieving both the thermal stability of the photocurable composition and the supportability of the resulting cured product.
また、上記重合性モノマー(B)における多価金属イオン含有イオン性モノマーの割合を高めることで、光硬化性組成物中の重合性モノマーの含有割合が多くとも、光硬化性組成物の粘度を低く抑えることができる。すなわち、重合性モノマー(A)、重合性モノマー(B)、及び重合性モノマー(C)の合計含有量(特に重合性モノマー(A)及び(B)の合計含有量)が、光硬化性組成物100質量%中、例えば15質量%以上(好ましくは20~45質量%)であっても、前記多価金属イオン含有イオン性モノマー(好ましくはエチレン性不飽和カルボン酸の多価金属塩、より好ましくは(メタ)アクリル酸の多価金属塩)の含有量を、重合性モノマー(B)100質量%中、50~100質量%に調整することで、光硬化性組成物の粘度を低く抑えることができる。 In addition, by increasing the proportion of the polyvalent metal ion-containing ionic monomer in the polymerizable monomer (B), the viscosity of the photocurable composition can be kept low even if the content of the polymerizable monomer in the photocurable composition is high. That is, even if the total content of the polymerizable monomer (A), polymerizable monomer (B), and polymerizable monomer (C) (particularly the total content of the polymerizable monomers (A) and (B)) is, for example, 15% by mass or more (preferably 20 to 45% by mass) in 100% by mass of the photocurable composition, the viscosity of the photocurable composition can be kept low by adjusting the content of the polyvalent metal ion-containing ionic monomer (preferably a polyvalent metal salt of an ethylenically unsaturated carboxylic acid, more preferably a polyvalent metal salt of (meth)acrylic acid) to 50 to 100% by mass in 100% by mass of the polymerizable monomer (B).
1-4.有機酸及び/又はその塩
本発明の光硬化性組成物は、有機酸及び/又はその塩を含んでいてもよい。有機酸及び/又はその塩を含むことで、貯蔵安定性がより向上する。なお、有機酸及び/又はその塩は、重合性不飽和基を有さない化合物であり、すなわち、上記重合性モノマー(A)~(C)は包含されない。
1-4. Organic acid and/or salt thereof The photocurable composition of the present invention may contain an organic acid and/or a salt thereof. By containing an organic acid and/or a salt thereof, storage stability is further improved. Note that the organic acid and/or a salt thereof is a compound that does not have a polymerizable unsaturated group, that is, the above polymerizable monomers (A) to (C) are not included.
前記有機酸としては、例えば、有機カルボン酸、有機スルホン酸、有機リン酸等が挙げられる。
前記有機カルボン酸としては、例えば、ギ酸、酢酸、プロピオン酸、酪酸、吉草酸、ヘキサン酸、ヘプタン酸、オクタン酸、オクチル酸、ノナン酸、デカン酸、ラウリン酸、ミリスチン酸、パルミチン酸、ステアリン酸、ベヘン酸、トリデカン酸、ペンタデカン酸、ヘプタデカン酸、乳酸、リンゴ酸、クエン酸、シュウ酸、マロン酸、コハク酸、フマル酸、アジピン酸、グリシン、ポリアクリル酸、ポリ乳酸等の脂肪族カルボン酸;安息香酸、フタル酸、サリチル酸等の芳香族カルボン酸;等が挙げられる。
前記有機スルホン酸としては、具体的に、p-トルエンスルホン酸等が挙げられる。
前記有機リン酸としては、具体的に、フェニルホスホン酸等が挙げられる。
なかでも、有機カルボン酸が好ましく、脂肪族カルボン酸がより好ましく、乳酸、プロピオン酸、ポリアクリル酸がさらに好ましい。
Examples of the organic acid include organic carboxylic acids, organic sulfonic acids, and organic phosphoric acids.
Examples of the organic carboxylic acid include aliphatic carboxylic acids such as formic acid, acetic acid, propionic acid, butyric acid, valeric acid, hexanoic acid, heptanoic acid, octanoic acid, octylic acid, nonanoic acid, decanoic acid, lauric acid, myristic acid, palmitic acid, stearic acid, behenic acid, tridecanoic acid, pentadecanoic acid, heptadecanoic acid, lactic acid, malic acid, citric acid, oxalic acid, malonic acid, succinic acid, fumaric acid, adipic acid, glycine, polyacrylic acid, and polylactic acid; and aromatic carboxylic acids such as benzoic acid, phthalic acid, and salicylic acid.
Specific examples of the organic sulfonic acid include p-toluenesulfonic acid.
Specific examples of the organic phosphoric acid include phenylphosphonic acid.
Among these, organic carboxylic acids are preferred, aliphatic carboxylic acids are more preferred, and lactic acid, propionic acid, and polyacrylic acid are even more preferred.
前記有機酸の塩としては、有機酸の金属塩が好ましく、具体的には、前述の有機酸のリチウム塩、ナトリウム塩、カリウム塩等のアルカリ金属塩;前述の有機酸のマグネシウム塩、カルシウム塩、ストロンチウム塩、バリウム塩等のアルカリ土類金属塩;等が挙げられる。なかでも、前述の有機酸のアルカリ金属塩が好ましく、前述の有機酸のカリウム塩がより好ましい。 The salt of the organic acid is preferably a metal salt of the organic acid, and specific examples thereof include alkali metal salts such as lithium salts, sodium salts, and potassium salts of the organic acids described above; and alkaline earth metal salts such as magnesium salts, calcium salts, strontium salts, and barium salts of the organic acids described above. Of these, alkali metal salts of the organic acids described above are preferred, and potassium salts of the organic acids described above are more preferred.
これら有機酸及び/又はその塩は、本発明の光硬化性組成物に1種単独で含まれていてもよく、2種以上が含まれていてもよい。 These organic acids and/or salts thereof may be contained in the photocurable composition of the present invention either alone or in combination of two or more kinds.
前記有機酸及び/又はその塩としては、有機カルボン酸、有機カルボン酸の金属塩が好ましく、脂肪族カルボン酸、脂肪族カルボン酸の金属塩がより好ましく、乳酸、乳酸の金属塩、プロピオン酸、プロピオン酸の金属塩、ポリアクリル酸、ポリアクリル酸の金属塩がさらに好ましい。 The organic acid and/or its salt are preferably an organic carboxylic acid or a metal salt of an organic carboxylic acid, more preferably an aliphatic carboxylic acid or a metal salt of an aliphatic carboxylic acid, and even more preferably lactic acid, a metal salt of lactic acid, propionic acid, a metal salt of propionic acid, polyacrylic acid, or a metal salt of polyacrylic acid.
有機酸及び/又はその塩の含有量は、光硬化性組成物100質量%中、例えば0~20質量%である。特に、貯蔵安定性を高める観点から、好ましくは0.1~20質量%であり、より好ましくは0.5~10質量%、さらに好ましくは1~5質量%である。 The content of the organic acid and/or its salt is, for example, 0 to 20% by mass in 100% by mass of the photocurable composition. In particular, from the viewpoint of improving storage stability, the content is preferably 0.1 to 20% by mass, more preferably 0.5 to 10% by mass, and even more preferably 1 to 5% by mass.
1-5.光重合開始剤
本発明の光硬化性組成物は、光重合開始剤を含んでいてもよい。光重合開始剤としては、具体的に、
ベンゾイン、ベンゾインメチルエーテル、ベンゾインエチルエーテル、ベンゾインプロピルエーテル、ベンゾインイソブチルエーテル等のベンゾイン化合物;
アセトフェノン、2-ヒドロキシ-2-メチル-1-フェニルプロパン-1-オン、ジエトキシアセトフェノン、1-ヒドロキシシクロヘキシルフェニルケトン、1-[4-(2-ヒドロキシエトキシ)-フェニル]-2-ヒドロキシ-メチルプロパノン、2-メチル-1-[4-(メチルチオ)フェニル]-2-モルホリノプロパン-1-オン、2-ベンジル-2-ジメチルアミノ-1-(4-モルホリノフェニル)-ブタン-1-オン等のアセトフェノン化合物;
2-エチルアントラキノン、2-t-ブチルアントラキノン、2-クロロアントラキノン、2-アミルアントラキノン等のアントラキノン化合物;
2,4-ジエチルチオキサントン、2-イソプロピルチオキサントン、2-クロロチオキサントン、[3-(3,4-ジメチル-9-オキソチオキサンテン-2-イル)オキシ-2-ヒドロキシプロピル]-トリメチルアザニウムクロリド等のチオキサントン化合物;
アセトフェノンジメチルケタール、ベンジルジメチルケタール、ベンジルジエチルケタール等のケタール化合物;
ベンゾフェノン、4-ベンゾイル-4’-メチルジフェニルサルファイド、4,4’-ビスメチルアミノベンゾフェノン等のベンゾフェノン化合物;
2,4,6-トリメチルベンゾイルジフェニルホスフィンオキシド、ビス-(2、6-ジメトキシベンゾイル)-2,4,4-トリメチルペンチルホスフィンオキシド、ビス(2,4,6-トリメチルベンゾイル)-フェニルホスフィンオキシド等のホスフィンオキシド化合物;等が挙げられる。
これらは1種で単独使用してもよく、2種以上を併用してもよい。
1-5. Photopolymerization initiator The photocurable composition of the present invention may contain a photopolymerization initiator. Specific examples of the photopolymerization initiator include:
Benzoin compounds such as benzoin, benzoin methyl ether, benzoin ethyl ether, benzoin propyl ether, and benzoin isobutyl ether;
Acetophenone compounds such as acetophenone, 2-hydroxy-2-methyl-1-phenylpropan-1-one, diethoxyacetophenone, 1-hydroxycyclohexyl phenyl ketone, 1-[4-(2-hydroxyethoxy)-phenyl]-2-hydroxy-methylpropanone, 2-methyl-1-[4-(methylthio)phenyl]-2-morpholinopropan-1-one, and 2-benzyl-2-dimethylamino-1-(4-morpholinophenyl)-butan-1-one;
Anthraquinone compounds such as 2-ethylanthraquinone, 2-t-butylanthraquinone, 2-chloroanthraquinone, and 2-amylanthraquinone;
Thioxanthone compounds such as 2,4-diethylthioxanthone, 2-isopropylthioxanthone, 2-chlorothioxanthone, and [3-(3,4-dimethyl-9-oxothioxanthen-2-yl)oxy-2-hydroxypropyl]-trimethylazanium chloride;
Ketal compounds such as acetophenone dimethyl ketal, benzil dimethyl ketal, and benzil diethyl ketal;
Benzophenone compounds such as benzophenone, 4-benzoyl-4'-methyldiphenyl sulfide, and 4,4'-bismethylaminobenzophenone;
Phosphine oxide compounds such as 2,4,6-trimethylbenzoyldiphenylphosphine oxide, bis-(2,6-dimethoxybenzoyl)-2,4,4-trimethylpentylphosphine oxide, and bis(2,4,6-trimethylbenzoyl)-phenylphosphine oxide; and the like.
These may be used alone or in combination of two or more.
中でも、光重合開始剤としては、
ベンゾイン化合物、アセトフェノン化合物、ケタール化合物、ホスフィンオキシド化合物が好ましく、
ベンゾイン化合物;2-ヒドロキシ-2-メチル-1-フェニルプロパン-1-オン、1-ヒドロキシシクロヘキシルフェニルケトン、1-[4-(2-ヒドロキシエトキシ)-フェニル]-2-ヒドロキシ-メチルプロパノン等のα-ヒドロキシアセトフェノン化合物;2-メチル-1-[4-(メチルチオ)フェニル]-2-モルホリノプロパン-1-オン、2-ベンジル-2-ジメチルアミノ-1-(4-モルホリノフェニル)-ブタン-1-オン等のα-アミノアセトフェノン化合物;ベンジルジメチルケタール、ベンジルジエチルケタール等のベンジルケタール化合物;2,4,6-トリメチルベンゾイルジフェニルホスフィンオキシド、ビス-(2、6-ジメトキシベンゾイル)-2,4,4-トリメチルペンチルホスフィンオキシド、ビス(2,4,6-トリメチルベンゾイル)-フェニルホスフィンオキシド等のアシルホスフィンオキシド化合物がより好ましく、 α-ヒドロキシアセトフェノン化合物が特に好ましい。
Among them, the photopolymerization initiator is
Benzoin compounds, acetophenone compounds, ketal compounds, and phosphine oxide compounds are preferred;
Benzoin compounds; α-hydroxyacetophenone compounds such as 2-hydroxy-2-methyl-1-phenylpropan-1-one, 1-hydroxycyclohexyl phenyl ketone, and 1-[4-(2-hydroxyethoxy)-phenyl]-2-hydroxy-methylpropanone; α-aminoacetophenone compounds such as 2-methyl-1-[4-(methylthio)phenyl]-2-morpholinopropan-1-one and 2-benzyl-2-dimethylamino-1-(4-morpholinophenyl)-butan-1-one; benzyl ketal compounds such as benzyl dimethyl ketal and benzyl diethyl ketal; acylphosphine oxide compounds such as 2,4,6-trimethylbenzoyldiphenylphosphine oxide, bis-(2,6-dimethoxybenzoyl)-2,4,4-trimethylpentylphosphine oxide, and bis(2,4,6-trimethylbenzoyl)-phenylphosphine oxide are more preferred, and α-hydroxyacetophenone compounds are particularly preferred.
前記光重合開始剤の含有量としては、光硬化性組成物100質量%中、好ましくは0.05~10.0質量%、より好ましくは0.1~7.0質量%、さらに好ましくは0.2~5.0質量%である。光重合開始剤の含有量を上記範囲に調整することで、硬化性がより高められる。
また、前記光重合開始剤の含有量は、重合性モノマー(A)~(C)の合計(特に、重合性モノマー(A)及び重合性モノマー(B)の合計)100質量部に対して、好ましくは0.5~20質量部、より好ましくは1.0~15質量部、さらに好ましくは3.0~10質量部である。
The content of the photopolymerization initiator is preferably 0.05 to 10.0% by mass, more preferably 0.1 to 7.0% by mass, and even more preferably 0.2 to 5.0% by mass, based on 100% by mass of the photocurable composition. By adjusting the content of the photopolymerization initiator within the above range, the curability can be further improved.
The content of the photopolymerization initiator is preferably 0.5 to 20 parts by mass, more preferably 1.0 to 15 parts by mass, and even more preferably 3.0 to 10 parts by mass, relative to 100 parts by mass of the total of the polymerizable monomers (A) to (C) (particularly, the total of the polymerizable monomer (A) and the polymerizable monomer (B)).
1-6.重合禁止剤
本発明の光硬化性組成物は、本発明の効果を阻害しない範囲で重合禁止剤を含んでいてもよい。重合禁止剤を含むことで光硬化性組成物の熱安定性が向上する。
1-6. Polymerization Inhibitor The photocurable composition of the present invention may contain a polymerization inhibitor within a range that does not impair the effects of the present invention. By containing a polymerization inhibitor, the thermal stability of the photocurable composition is improved.
重合禁止剤としては、
ヒドロキノン、カテコール、レゾルシン、p-メトキシフェノール、t-ブチルカテコール、t-ブチルハイドロキノン、ピロガロール、2,4-ジヒドロキシベンゾフェノン、2,6-ジ-t-ブチル-p-クレゾール、ブチル化ヒドロキシアニソール、2,6-ジ-t-ブチル-4-エチルフェノール等の分子量300未満のフェノール類;2,2’-メチレンビス(4-メチル-6-t-ブチルフェノール)、2,2’-メチレンビス(4-エチル-6-t-ブチルフェノール)、4,4’-チオビス(3-メチル-6-t-ブチルフェノール)、4,4’-ブチリデンビス(3-メチル-6-t-ブチルフェノール)、3,9-ビス〔1,1-ジメチル-2-〔β-(3-t-ブチル-4-ヒドロキシ-5-メチルフェニル)プロピオニルオキシ〕エチル〕-2,4,8,10-テトラオキサスピロ〔5,5〕ウンデカン、4,4’-(2,3-ジメチル-テトラメチレン)ジピロカテコール等のビスフェノール類;ステアリル-β-(3,5-ジ-t-ブチル-4-ヒドロキシフェニル)プロピオネート、3,4,5-トリヒドロキシベンゾイックアシッドプロピルエステル、1,1,3-トリス(2-メチル-4-ヒドロキシ-5-t-ブチルフェニル)ブタン、1,3,5-トリメチル-2,4,6-トリス(3,5-ジ-t-ブチル-4-ヒドロキシベンジル)ベンゼン(イルガノックス(登録商標)1330、BASF社製)、テトラキス-〔メチレン-3-(3’,5’-ジ-t-ブチル-4’-ヒドロキシフェニル)プロピオネート〕メタン、ビス〔3,3’-ビス-(4’-ヒドロキシ-3’-t-ブチルフェニル)ブチリックアシッド〕グリコールエステル、1,3,5-トリス(3’,5’-ジ-t-ブチル-4’-ヒドロキシベンジル)-s-トリアジン-2,4,6-(1H,3H,5H)トリオン、トコフェロール、トコフェロール誘導体、2-[1-(2-ヒドロキシ-3,5-ジ-tert-ペンチルフェニル)エチル]-4,6-ジ-tert-ペンチルフェニル=アクリラート(スミライザー(登録商標)GS、住友化学社製)等の分子量300以上の高分子フェノール類等のフェノール系酸化防止剤、
2-メルカプトベンズイミダゾール、ジラウリル3,3’-チオジプロピオネート、ジミリスチル3,3’-チオジプロピオネート、ジステアリル3,3’-チオジプロピオネート、2-メルカプトベンズイミダゾール、テトラキスメチレン-3-(ラウリルチオ)プロピオネートメタン、ステアリルチオプロピルアミド等の硫黄系酸化防止剤、
トリフェニルホスファイト、ジフェニルイソデシルホスファイト、フェニルジイソデシルホスファイト、4,4’-ブチリデン-ビス(3-メチル-6-t-ブチルフェニルジトリデシル)ホスファイト、サイクリックネオペンタンテトライルビス(オクタデシル)ホスファイト、トリス(ノニルフェニル)ホスファイト、トリス(モノおよび/またはジノニルフェニル)ホスファイト、ジイソデシルペンタエリスリトールジフォスファイト、9,10-ジヒドロ-9-オキサ-10-ホスファフェナントレン-10-オキサイド、10-(3,5-ジ-t-ブチル-4-ヒドロキシベンジル)-9,10-ジヒドロ-9-オキサ-10-ホスファフェナントレン-10-オキサイド、10-デシロキシ-9,10-ジヒドロ-9-オキサ-10-ホスファフェナントレン、トリス(2,4-ジ-t-ブチルフェニル)ホスファイト、サイクリックネオペンタンテトライルビス(2,4-ジ-t-ブチルフェニル)ホスファイト、サイクリックネオペンタンテトライルビス(2,6-ジ-t-ブチル-4-メチルフェニル)ホスファイト、2,2-メチレンビス(4,6-ジ-t-ブチルフェニル)オクチルホスファイト、ジステアリルペンタエリスリトールジホスファイト、ジ(2,4-ジ-t-ブチルフェニル)ホスファイト、テトラキス(2,4-ジ-t-ブチルフェニル)-4,4-ビフェニレンホスフォナイト等のリン系酸化防止剤、
4-ベンゾイルオキシ-2,2,6,6-テトラメチルピペリジン、ビス(2,2,6,6-テトラメチル-4-ピペリジニル)セバケート、ビス(1-オクチロキシ-2,2,6,6-テトラメチル-4-ピペリジニル)セバケート、ビス(1,2,2,6,6-ペンタメチル-4-ピペリジニル)セバケート、コハク酸ジメチル-1-(2-ヒドロキシエチル)-4-ヒドロキシ-2,2,6,6-テトラメチルピペリジンおよびその縮合物、8-アセチル-3-ドデシル-7,7,9,9-テトラメチル-1,3,8-トリアザスピロ〔4,5〕デカン-2,4-ジオン等のヒンダードアミン系酸化防止剤、
4-ヒドロキシ-2,2,6,6-テトラメチルピペリジン-1-オキシルフリーラジカル等のアルコキシアミンラジカル、
1,1-ジフェニル-2-ピクリルヒドラジル、フェノチアジン、p-ベンゾキノン、ニトロソベンゼン、2,5-ジ-t-ブチル-p-ベンゾキノン、ジチオベンゾイルジスルフィド、ピクリン酸、クペロン、アルミニウムN-ニトロソフェニルヒドロキシルアミン、トリ-p-ニトロフェニルメチル、N-(3-オキシアニリノ-1,3-ジメチルブチリデン)アニリンオキシド、シクロヘキサノンオキシムクレゾール、グアヤコール、o-イソプロピルフェノール、ブチラルドキシム、メチルエチルケトキシム、又はシクロヘキサノンオキシム等が挙げられる。
Polymerization inhibitors include:
Phenols with a molecular weight of less than 300, such as hydroquinone, catechol, resorcin, p-methoxyphenol, t-butylcatechol, t-butylhydroquinone, pyrogallol, 2,4-dihydroxybenzophenone, 2,6-di-t-butyl-p-cresol, butylated hydroxyanisole, and 2,6-di-t-butyl-4-ethylphenol; 2,2'-methylenebis(4-methyl-6-t-butylphenol), 2,2'-methylenebis(4-ethyl-6-t-butylphenol), 4,4'-thiobis(3 bisphenols such as 4,4'-(2,3-dimethyl-tetramethylene)dipyrocatechol; stearyl-β-(3,5-di-t-butyl-4-hydroxyphenyl)propionate, 3,4, 5-Trihydroxybenzoic acid propyl ester, 1,1,3-tris(2-methyl-4-hydroxy-5-t-butylphenyl)butane, 1,3,5-trimethyl-2,4,6-tris(3,5-di-t-butyl-4-hydroxybenzyl)benzene (Irganox (registered trademark) 1330, manufactured by BASF Corporation), tetrakis-[methylene-3-(3',5'-di-t-butyl-4'-hydroxyphenyl)propionate]methane, bis[3,3'-bis-(4'-hydroxy-3'-t-butylphenyl)propionate]methane, phenolic antioxidants such as polymeric phenols having a molecular weight of 300 or more, such as 1,3,5-tris(3',5'-di-t-butyl-4'-hydroxybenzyl)-s-triazine-2,4,6-(1H,3H,5H)trione, tocopherol, tocopherol derivatives, and 2-[1-(2-hydroxy-3,5-di-tert-pentylphenyl)ethyl]-4,6-di-tert-pentylphenyl=acrylate (Sumilizer (registered trademark) GS, manufactured by Sumitomo Chemical Co., Ltd.);
sulfur-based antioxidants such as 2-mercaptobenzimidazole, dilauryl 3,3'-thiodipropionate, dimyristyl 3,3'-thiodipropionate, distearyl 3,3'-thiodipropionate, 2-mercaptobenzimidazole, tetrakismethylene-3-(laurylthio)propionate methane, and stearylthiopropylamide;
Triphenyl phosphite, diphenyl isodecyl phosphite, phenyl diisodecyl phosphite, 4,4'-butylidene-bis(3-methyl-6-t-butylphenyl ditridecyl)phosphite, cyclic neopentane tetrayl bis(octadecyl)phosphite, tris(nonylphenyl)phosphite, tris(mono- and/or dinonylphenyl)phosphite, diisodecyl pentaerythritol diphosphite, 9,10-dihydro-9-oxa-10-phosphaphenanthrene-10-oxide, 10-(3,5-di-t-butyl-4-hydroxybenzyl)-9,10-dihydro-9-oxa-10-phosphaphenanthrene-10-oxide phosphorus-based antioxidants such as tetrakis(2,4-di-t-butylphenyl)phosphite, 10-decyloxy-9,10-dihydro-9-oxa-10-phosphaphenanthrene, tris(2,4-di-t-butylphenyl)phosphite, cyclic neopentanetetraylbis(2,4-di-t-butylphenyl)phosphite, cyclic neopentanetetraylbis(2,6-di-t-butyl-4-methylphenyl)phosphite, 2,2-methylenebis(4,6-di-t-butylphenyl)octylphosphite, distearyl pentaerythritol diphosphite, di(2,4-di-t-butylphenyl)phosphite, and tetrakis(2,4-di-t-butylphenyl)-4,4-biphenylenephosphonite;
hindered amine antioxidants such as 4-benzoyloxy-2,2,6,6-tetramethylpiperidine, bis(2,2,6,6-tetramethyl-4-piperidinyl)sebacate, bis(1-octyloxy-2,2,6,6-tetramethyl-4-piperidinyl)sebacate, bis(1,2,2,6,6-pentamethyl-4-piperidinyl)sebacate, dimethyl succinate-1-(2-hydroxyethyl)-4-hydroxy-2,2,6,6-tetramethylpiperidine and condensates thereof, and 8-acetyl-3-dodecyl-7,7,9,9-tetramethyl-1,3,8-triazaspiro[4,5]decane-2,4-dione;
Alkoxyamine radicals such as 4-hydroxy-2,2,6,6-tetramethylpiperidine-1-oxyl free radicals;
Examples of the oxime include 1,1-diphenyl-2-picrylhydrazyl, phenothiazine, p-benzoquinone, nitrosobenzene, 2,5-di-t-butyl-p-benzoquinone, dithiobenzoyl disulfide, picric acid, cupferron, aluminum N-nitrosophenylhydroxylamine, tri-p-nitrophenylmethyl, N-(3-oxyanilino-1,3-dimethylbutylidene)aniline oxide, cyclohexanone oxime cresol, guaiacol, o-isopropylphenol, butyraldoxime, methyl ethyl ketoxime, and cyclohexanone oxime.
これら重合禁止剤は、1種で単独使用してもよく、2種以上を併用してもよい。 These polymerization inhibitors may be used alone or in combination of two or more types.
前記重合禁止剤としては、フェノール系酸化防止剤、硫黄系酸化防止剤、リン系酸化防止剤、ヒンダードアミン系酸化防止剤、及びアルコキシアミンラジカルからなる群より選択される少なくとも1種であることが好ましく、フェノール系酸化防止剤及び/又はアルコキシアミンラジカルであることがより好ましい。
重合禁止剤100質量%中、フェノール系酸化防止剤、硫黄系酸化防止剤、リン系酸化防止剤、ヒンダードアミン系酸化防止剤、及びアルコキシアミンラジカルの合計量(好ましくは、フェノール系酸化防止剤及びアルコキシアミンラジカルの合計量)は、50~100質量%が好ましく、より好ましくは80質量%以上、さらに好ましくは90質量%以上、特に好ましくは95質量%以上である。
The polymerization inhibitor is preferably at least one selected from the group consisting of a phenol-based antioxidant, a sulfur-based antioxidant, a phosphorus-based antioxidant, a hindered amine-based antioxidant, and an alkoxyamine radical, and is more preferably a phenol-based antioxidant and/or an alkoxyamine radical.
In 100% by mass of the polymerization inhibitor, the total amount of the phenol-based antioxidant, the sulfur-based antioxidant, the phosphorus-based antioxidant, the hindered amine-based antioxidant, and the alkoxyamine radical (preferably the total amount of the phenol-based antioxidant and the alkoxyamine radical) is preferably 50 to 100% by mass, more preferably 80% by mass or more, even more preferably 90% by mass or more, and particularly preferably 95% by mass or more.
前記重合禁止剤の含有量は、光硬化性組成物100質量%中、0.01~5.0質量%であることが好ましく、より好ましくは0.03~3.0質量%、さらに好ましくは0.05~1.0質量%である。
また、前記重合禁止剤の含有量は、重合性モノマー(A)~(C)の合計(特に、重合性モノマー(A)及び重合性モノマー(B)の合計)100質量部に対して、好ましくは0.03~14.0質量部、より好ましくは0.08~9.0質量部、さらに好ましくは0.14~3.0質量部である。
The content of the polymerization inhibitor is preferably 0.01 to 5.0% by mass, more preferably 0.03 to 3.0% by mass, and even more preferably 0.05 to 1.0% by mass, based on 100% by mass of the photocurable composition.
The content of the polymerization inhibitor is preferably 0.03 to 14.0 parts by mass, more preferably 0.08 to 9.0 parts by mass, and even more preferably 0.14 to 3.0 parts by mass, relative to 100 parts by mass of the total of the polymerizable monomers (A) to (C) (particularly, the total of the polymerizable monomer (A) and the polymerizable monomer (B)).
1-7.溶媒
本発明の光硬化性組成物は、本発明の効果を阻害しない範囲で溶媒を含んでいてもよい。前記溶媒としては、水、1価アルコール、グリコール、グリコールエーテル、グリコールエーテルアセテート、3価アルコール等が挙げられる。
The photocurable composition of the present invention may contain a solvent within a range that does not impair the effects of the present invention. Examples of the solvent include water, monohydric alcohol, glycol, glycol ether, glycol ether acetate, and trihydric alcohol.
前記1価アルコールとしては、具体的に、メタノール、エタノール、プロパノール等が挙げられ、好ましくは炭素数1~5の1価アルコールである。 Specific examples of the monohydric alcohol include methanol, ethanol, and propanol, and preferably have 1 to 5 carbon atoms.
前記グリコールとしては、具体的に、
エチレングリコール、プロピレングリコール、1,3-ブチレングリコール、ヘキシレングリコール、1,2-ヘキサンジオール等のアルキレングリコール(好ましくは、C2-6アルキレングリコール);
ジエチレングリコール、トリエチレングリコール、ジプロピレングリコール、トリプロピレングリコール、エチレングリコールとプロピレングリコールとの共重合体等のアルキレングリコールの繰り返し数(すなわち、オキシアルキレン基の繰り返し数)の合計が2以上(好ましくは2~20、より好ましくは2~10)のポリアルキレングリコール;等が挙げられる。
Specific examples of the glycol include:
Alkylene glycols such as ethylene glycol, propylene glycol, 1,3-butylene glycol, hexylene glycol, and 1,2-hexanediol (preferably, C 2-6 alkylene glycol);
Polyalkylene glycols having a total number of repeating alkylene glycol units (i.e., the number of repeating oxyalkylene groups) of 2 or more (preferably 2 to 20, more preferably 2 to 10), such as diethylene glycol, triethylene glycol, dipropylene glycol, tripropylene glycol, and a copolymer of ethylene glycol and propylene glycol.
前記グリコールエーテルとしては、具体的に、プロピレングリコールモノメチルエーテル、ジプロピレングリコールモノメチルエーテル、ジプロピレングリコールモノプロピルエーテル、プロピレングリコールモノプロピルエーテル等が挙げられ、好ましくは(ポリ)C2-3アルキレングリコールC1-4アルキルエーテルである。 Specific examples of the glycol ether include propylene glycol monomethyl ether, dipropylene glycol monomethyl ether, dipropylene glycol monopropyl ether, and propylene glycol monopropyl ether, and preferably (poly)C 2-3 alkylene glycol C 1-4 alkyl ether.
前記グリコールエーテルアセテートとしては、具体的に、プロピレングリコールモノメチルエーテルアセテート、プロピレングリコールモノエチルエーテルアセテート等が挙げられ、好ましくは(ポリ)C2-3アルキレングリコールモノC1-4アルキルエーテルアセテートである。 Specific examples of the glycol ether acetate include propylene glycol monomethyl ether acetate and propylene glycol monoethyl ether acetate, and preferably (poly)C 2-3 alkylene glycol mono C 1-4 alkyl ether acetate.
前記3価アルコールとしては、具体的に、グリセロール等が挙げられる。 Specific examples of the trihydric alcohol include glycerol.
上記溶媒は1種のみを使用してもよく、2種以上を併用してもよい。 The above solvents may be used alone or in combination of two or more.
前記溶媒としては、グリコール、グリコールエーテル、グリコールエーテルアセテート、及びグリセロールからなる群から選択される少なくとも1種を含むことが好ましく、グリコール及びグリセロールからなる群から選択される少なくとも1種を含むことがより好ましく、グリコールを含むことが特に好ましい。
グリコール、グリコールエーテル、グリコールエーテルアセテート、及びグリセロールの合計含有量(特に、グリコール及びグリセロールの合計含有量)は、溶媒100質量%中、50~100質量%であることが好ましく、より好ましくは80~100質量%、さらに好ましくは95~100質量%である。
また、グリコールの含有量は、溶媒100質量%中、50~100質量%以上であることが好ましく、より好ましくは70~100質量%、さらに好ましくは90~100質量%である。
The solvent preferably contains at least one selected from the group consisting of glycol, glycol ether, glycol ether acetate, and glycerol, more preferably contains at least one selected from the group consisting of glycol and glycerol, and particularly preferably contains glycol.
The total content of glycol, glycol ether, glycol ether acetate, and glycerol (particularly, the total content of glycol and glycerol) is preferably 50 to 100 mass%, more preferably 80 to 100 mass%, and even more preferably 95 to 100 mass%, based on 100 mass% of the solvent.
The content of the glycol is preferably 50 to 100% by mass or more, more preferably 70 to 100% by mass, and further preferably 90 to 100% by mass, based on 100% by mass of the solvent.
グリコールの中でも、グリコール分子を構成するアルキレン鎖として、炭素数が2~6のアルキレン鎖を含む(ポリ)C2-6アルキレングリコールが好ましく、炭素数が2および/または3のアルキレン鎖を含む(ポリ)C2-3アルキレングリコールがより好ましく、炭素数が3のアルキレン鎖を含む(ポリ)プロピレングリコールがさらに好ましい。 Among glycols, (poly) C2-6 alkylene glycols containing an alkylene chain having 2 to 6 carbon atoms as the alkylene chain constituting the glycol molecule are preferred, (poly) C2-3 alkylene glycols containing an alkylene chain having 2 and/or 3 carbon atoms are more preferred, and (poly)propylene glycols containing an alkylene chain having 3 carbon atoms are even more preferred.
上記グリコールとしては、光硬化性組成物の熱安定性向上の観点から、少なくともC2-6アルキレングリコールを含むことが好ましく、少なくともエチレングリコール及び/又はプロピレングリコールを含むことがより好ましく、少なくともプロピレングリコールを含むことがさらに好ましい。 From the viewpoint of improving the thermal stability of the photocurable composition, the above glycol preferably contains at least a C2-6 alkylene glycol, more preferably contains at least ethylene glycol and/or propylene glycol, and even more preferably contains at least propylene glycol.
C2-6アルキレングリコールの含有量(特に、プロピレングリコールの含有量)は、溶媒100質量%中、20~100質量%であることが好ましく、より好ましくは30~95質量%、さらに好ましくは40~90質量%である。 The content of C 2-6 alkylene glycol (particularly the content of propylene glycol) is preferably from 20 to 100% by mass, more preferably from 30 to 95% by mass, and even more preferably from 40 to 90% by mass, based on 100% by mass of the solvent.
また、上記グリコールとしては、C2-6アルキレングリコールと、ポリC2-6アルキレングリコールとを含むことが好ましく、エチレングリコール及び/又はプロピレングリコールと、ポリエチレングリコール及び/又はポリプロピレングリコールとを含むことがより好ましく、エチレングリコール及び/又はプロピレングリコールと、エチレングリコールの繰り返し数(すなわち、オキシエチレン基の繰り返し数)が2~20のポリエチレングリコール及び/又はプロピレングリコールの繰り返し数(すなわち、オキシプロピレン基の繰り返し数)が2~20のポリプロピレングリコールとを含むことがさらに好ましく、プロピレングリコールと、エチレングリコールの繰り返し数(すなわち、オキシエチレン基の繰り返し数)が2~10のポリエチレングリコール及び/又はプロピレングリコールの繰り返し数(すなわち、オキシプロピレン基の繰り返し数)が2~10のポリプロピレングリコールとを含むことが特に好ましい。このようなグリコールを溶媒として用いることで、重合性モノマー(A)との相性が良いためか、本発明の光硬化性組成物を硬化して得られるポリマーと溶媒との相溶性が良好となり、得られるサポート材の透明性が高められる。その結果、得られる光造形物の表面特性が高められる傾向にある。 The glycol preferably contains a C 2-6 alkylene glycol and a poly C 2-6 alkylene glycol, more preferably contains ethylene glycol and/or propylene glycol and polyethylene glycol and/or polypropylene glycol, further preferably contains ethylene glycol and/or propylene glycol and a polyethylene glycol having an ethylene glycol repeat number (i.e., the number of oxyethylene group repeats) of 2 to 20 and/or a polypropylene glycol having a propylene glycol repeat number (i.e., the number of oxypropylene group repeats) of 2 to 20, and particularly preferably contains propylene glycol and a polyethylene glycol having an ethylene glycol repeat number (i.e., the number of oxyethylene group repeats) of 2 to 10 and/or a polypropylene glycol having a propylene glycol repeat number (i.e., the number of oxypropylene group repeats) of 2 to 10. By using such a glycol as a solvent, the compatibility between the polymer obtained by curing the photocurable composition of the present invention and the solvent becomes good, probably because of the good compatibility with the polymerizable monomer (A), and the transparency of the obtained support material is enhanced. As a result, the surface properties of the resulting stereolithographic object tend to be improved.
C2-6アルキレングリコール及びポリC2-6アルキレングリコールの合計含有量は、溶媒100質量%中、50~100質量%以上であることが好ましく、より好ましくは70~100質量%、さらに好ましくは80~100質量%である。
C2-6アルキレングリコール100質量部に対する、ポリC2-6アルキレングリコールの含有量は、5~200質量部であることが好ましく、より好ましくは10~150質量部、さらに好ましくは20~120質量部である。特に、プロピレングリコール100質量部に対する、ポリエチレングリコール及びポリプロピレングリコールの合計含有量を上記範囲に調整することが好ましい。
また、前記重合性モノマー(A)100質量部に対する、ポリC2-6アルキレングリコールの含有量は、10~500質量部が好ましく、より好ましくは30~450質量部、さらに好ましくは50~400質量部である。
The total content of the C 2-6 alkylene glycol and poly C 2-6 alkylene glycol is preferably from 50 to 100% by mass, more preferably from 70 to 100% by mass, and even more preferably from 80 to 100% by mass, in 100% by mass of the solvent.
The content of poly C2-6 alkylene glycol per 100 parts by mass of C2-6 alkylene glycol is preferably 5 to 200 parts by mass, more preferably 10 to 150 parts by mass, and even more preferably 20 to 120 parts by mass. In particular, it is preferable to adjust the total content of polyethylene glycol and polypropylene glycol per 100 parts by mass of propylene glycol to be within the above range.
The content of the polyC 2-6 alkylene glycol per 100 parts by mass of the polymerizable monomer (A) is preferably from 10 to 500 parts by mass, more preferably from 30 to 450 parts by mass, and even more preferably from 50 to 400 parts by mass.
上述の通り、前記溶媒として水を含んでいてもよいが、その含有量は少ないことが好ましい。水の含有量は、光硬化性組成物100質量%中、0~10質量%であることが好ましく、より好ましくは5質量%以下、さらに好ましくは3質量%以下である。水の含有量を上記範囲に調整することで、サポート性がより高められる。
光硬化性組成物中の水の含有量は、仕込んだ各化合物の水の含有量から計算で求めることができる。また、カールフィッシャー測定法で求めることもできる。
As described above, the solvent may contain water, but the content is preferably small. The content of water is preferably 0 to 10% by mass, more preferably 5% by mass or less, and even more preferably 3% by mass or less, based on 100% by mass of the photocurable composition. By adjusting the content of water to the above range, the supportability can be further improved.
The water content in the photocurable composition can be calculated from the water content of each compound added, or can be determined by Karl Fischer measurement.
本発明の光硬化性組成物100質量%中、上記溶媒の合計含有量は、20~90質量%が好ましく、より好ましくは30~85質量%、さらに好ましくは40~80質量%、よりさらに好ましくは50~80質量%又は55~80質量%である。 In 100% by mass of the photocurable composition of the present invention, the total content of the above solvents is preferably 20 to 90% by mass, more preferably 30 to 85% by mass, even more preferably 40 to 80% by mass, and even more preferably 50 to 80% by mass or 55 to 80% by mass.
1-8.その他の添加剤
本発明の光硬化性組成物は、本発明の効果を阻害しない範囲で必要によりその他の添加剤を含んでもよい。前記添加剤としては、例えば、光開始助剤、界面活性剤、着色剤、連鎖移動剤、充填剤、乳化安定剤、浸透促進剤、紫外線吸収剤、防腐剤、防黴剤、防錆剤、pH調整剤、表面張力調整剤、消泡剤、粘度調整剤、分散剤、分散安定剤、キレート剤、乾燥防止剤(湿潤剤)、褪色防止剤、比抵抗調整剤、皮膜調整剤等の公知の添加剤が挙げられる。
1-8. Other Additives The photocurable composition of the present invention may contain other additives as necessary within the range that does not impair the effects of the present invention. Examples of the additives include known additives such as photoinitiator assistants, surfactants, colorants, chain transfer agents, fillers, emulsion stabilizers, penetration promoters, UV absorbers, preservatives, antifungal agents, rust inhibitors, pH adjusters, surface tension adjusters, antifoaming agents, viscosity adjusters, dispersants, dispersion stabilizers, chelating agents, drying inhibitors (wetting agents), discoloration inhibitors, resistivity adjusters, and film adjusters.
光開始助剤としては、N,N-ジメチルアニリン、N,N-ジエチルアニリン、N,N-ジメチル-p-トルイジン、N,N-ジメチルアミノ-p-安息香酸エチルエステル、N,N-ジメチルアミノ-p-安息香酸イソアミルエチルエステル、N,N-ジヒドロキシエチルアニリン、トリエチルアミン、N,N-ジメチルヘキシルアミン等の第3級アミン化合物が挙げられる。 Examples of photoinitiator assistants include tertiary amine compounds such as N,N-dimethylaniline, N,N-diethylaniline, N,N-dimethyl-p-toluidine, N,N-dimethylamino-p-benzoic acid ethyl ester, N,N-dimethylamino-p-benzoic acid isoamyl ethyl ester, N,N-dihydroxyethylaniline, triethylamine, and N,N-dimethylhexylamine.
界面活性剤としては、ノニルフェノールのエチレンオキサイド(以下EOと略記)1~40モル付加物、ステアリン酸のEO1~40モル付加物等のPEG型非イオン界面活性剤;ソルビタンパルミチン酸モノエステル、ソルビタンステアリン酸モノエステル、ソルビタンステアリン酸トリエステル等の多価アルコール型非イオン界面活性剤;パーフルオロアルキルのEO1~50モル付加物、パーフルオロアルキルカルボン酸塩、パーフルオロアルキルベタイン等のフッ素含有界面活性剤;ポリエーテル変性シリコーンオイル、(メタ)アクリレート変性シリコーンオイル等の変性シリコーンオイル;等が挙げられる。 Surfactants include PEG-type nonionic surfactants such as 1-40 mole ethylene oxide (hereinafter abbreviated as EO) adduct of nonylphenol and 1-40 mole EO adduct of stearic acid; polyhydric alcohol-type nonionic surfactants such as sorbitan palmitate monoester, sorbitan stearate monoester, and sorbitan stearate triester; fluorine-containing surfactants such as 1-50 mole EO adduct of perfluoroalkyl, perfluoroalkyl carboxylate, and perfluoroalkyl betaine; modified silicone oils such as polyether-modified silicone oil and (meth)acrylate-modified silicone oil; etc.
着色剤としては、トルイジンレッド、パーマネントカーミンFB、ファストイエローG、ジスアゾイエローAAA、ジスアゾオレンジPMP、溶性アゾ顔料、縮合アゾ顔料、キレートアゾ顔料、フタロシアニンブルー、インダントロンブルー、キナクリドンレッド、ジオキサジンバイオレット、塩基性染料、酸性染料、アニリンブラック、昼光蛍光顔料、ニトロソ顔料、ニトロ顔料、天然顔料、無機顔料としての金属酸化物、カーボンブラック等が挙げられる。 Colorants include toluidine red, permanent carmine FB, fast yellow G, disazo yellow AAA, disazo orange PMP, soluble azo pigments, condensed azo pigments, chelate azo pigments, phthalocyanine blue, indanthrone blue, quinacridone red, dioxazine violet, basic dyes, acid dyes, aniline black, daylight fluorescent pigments, nitroso pigments, nitro pigments, natural pigments, metal oxides as inorganic pigments, carbon black, etc.
連鎖移動剤としては、ヒドロキノン、ジエチルメチルアミン、ジフェニルアミン、ジエチルジスルフィド、ジ-1-オクチルジスルフィド、トルエン、キシレン、1-ブテン、1-ノネン、ジクロロメタン、四塩化炭素、メタノール、1-ブタノール、エチルチオール、1-オクチルチオール、アセトン、メチルエチルケトン、2-メチル-2-プロピルアルデヒド、1-ペンチルアルデヒド、フェノール、m-クレゾール、p-クレゾール、又はo-クレゾール等が挙げられる。 Chain transfer agents include hydroquinone, diethylmethylamine, diphenylamine, diethyl disulfide, di-1-octyl disulfide, toluene, xylene, 1-butene, 1-nonene, dichloromethane, carbon tetrachloride, methanol, 1-butanol, ethyl thiol, 1-octyl thiol, acetone, methyl ethyl ketone, 2-methyl-2-propyl aldehyde, 1-pentyl aldehyde, phenol, m-cresol, p-cresol, and o-cresol.
充填剤としては、アルミナ粉、シリカ粉、タルク、マイカ、クレー、水酸化アルミニウム、炭酸カルシウム、ケイ酸カルシウム、アルミニウム粉、銅粉、炭素繊維、ガラス繊維、コットン繊維、ナイロン繊維、アクリル繊維、レーヨン繊維、マイクロバルーン、カーボンブラック、金属硫化物、又は木粉等が挙げられる。 Fillers include alumina powder, silica powder, talc, mica, clay, aluminum hydroxide, calcium carbonate, calcium silicate, aluminum powder, copper powder, carbon fiber, glass fiber, cotton fiber, nylon fiber, acrylic fiber, rayon fiber, microballoons, carbon black, metal sulfides, and wood powder.
上記添加物は、単独で用いてもよいし、2種以上を組み合わせて使用してもよい。
上記添加物の含有量としては、使用する添加剤に応じて適宜調整すればよいが、光硬化性組成物100質量%中、好ましくは0~30質量%、より好ましくは0.05~20質量%、さらに好ましくは0.05~10質量%又は0.05~5質量%である。
The above additives may be used alone or in combination of two or more kinds.
The content of the additives may be appropriately adjusted depending on the additives used, but is preferably 0 to 30 mass%, more preferably 0.05 to 20 mass%, and even more preferably 0.05 to 10 mass% or 0.05 to 5 mass%, relative to 100 mass% of the photocurable composition.
1-9.光硬化性組成物の調製方法
本発明の光硬化性組成物は、上述した各種成分を用いて調製することができ、その調製手段や条件は特に限定されないが、例えば、一般的な撹拌羽根若しくは超音波ホモジナイザー、高速ホモジナイザー、高圧ホモジナイザー、遊星撹拌装置、3本ロール、ボールミル、キティーミル、ディスクミル、ピンミル、ダイノーミル等の混合又は撹拌できる装置を用いて撹拌・混合する方法が挙げられる。撹拌・混合により得られた混合物を各種フィルターを用いてろ過をしてもよい。
1-9. Method for preparing photocurable composition The photocurable composition of the present invention can be prepared using the various components described above, and the preparation means and conditions are not particularly limited, but examples thereof include a method of stirring and mixing using a mixing or stirring device such as a general stirring blade or ultrasonic homogenizer, a high-speed homogenizer, a high-pressure homogenizer, a planetary stirring device, a three-roll mill, a ball mill, a Kitty mill, a disk mill, a pin mill, a Dyno mill, etc. The mixture obtained by stirring and mixing may be filtered using various filters.
1-10.光硬化性組成物の物性
本発明の光硬化性組成物は、インクジェット3Dプリンターにおける吐出ヘッドからの吐出性を良好にする観点から、吐出温度での粘度が20mPa・s以下であることが好ましい。
また、本発明の光硬化性組成物は、吐出安定性の観点から、25℃における粘度が低いことが好ましく、具体的には300mPa・s以下であることが好ましく、より好ましくは200mPa・s以下、さらに好ましくは150mPa・s以下、特に好ましくは100mPa・s以下であり、下限は特に限定されないが例えば5mPa・s以上、好ましくは20mPa・s以上である。
なお、光硬化性組成物の粘度測定は、JIS Z 8803に準拠し、E型粘度計を用いて行うことができる。
1-10. Physical Properties of Photocurable Composition From the viewpoint of improving the ejection properties from the ejection head of an inkjet 3D printer, the photocurable composition of the present invention preferably has a viscosity of 20 mPa·s or less at the ejection temperature.
Moreover, from the viewpoint of discharge stability, the photocurable composition of the present invention preferably has a low viscosity at 25°C. Specifically, the viscosity is preferably 300 mPa·s or less, more preferably 200 mPa·s or less, even more preferably 150 mPa·s or less, and particularly preferably 100 mPa·s or less. The lower limit is not particularly limited, but is, for example, 5 mPa·s or more, preferably 20 mPa·s or more.
The viscosity of the photocurable composition can be measured using an E-type viscometer in accordance with JIS Z 8803.
本発明の光硬化性組成物は、25℃における表面張力が25~70mN/mであることが好ましい。光硬化性組成物の表面張力は、例えば、バブルプレッシャー式動的表面張力計BP100(KRUSS社製)を用いて測定することができる。 The photocurable composition of the present invention preferably has a surface tension of 25 to 70 mN/m at 25°C. The surface tension of the photocurable composition can be measured, for example, using a bubble pressure type dynamic surface tensiometer BP100 (manufactured by KRUSS).
本発明の光硬化性組成物は、硬化性に優れている。本発明の光硬化性組成物は、100~3000mJ/cm2の紫外線を照射することにより硬化することが好ましい。ここで、硬化するとは、液状でなくなり、流動性がなくなることをいう。 The photocurable composition of the present invention has excellent curability. The photocurable composition of the present invention is preferably cured by irradiation with ultraviolet light of 100 to 3000 mJ/ cm2 . Here, curing means that the composition is no longer liquid and loses fluidity.
本発明の光硬化性組成物を用いて得られる硬化物はサポート性に優れている。ここで、サポート性とは、光硬化性組成物を硬化して得られる硬化物が、モデル材を支える性能を示す。光硬化性組成物を硬化して得られる硬化物の硬度が高い程、サポート性が高いといえる。本発明の光硬化性組成物に100mW/cm2の紫外線を3分間照射して得られた板状の硬化物(厚さ3mm)をタイプEデュロメータを用いて硬度を測定した際、測定開始から0秒後の硬度が65以上であることが好ましく、より好ましくは75以上、さらに好ましくは80以上、特に好ましくは85以上又は85超えである。 The cured product obtained by using the photocurable composition of the present invention has excellent supportability. Here, the supportability refers to the ability of the cured product obtained by curing the photocurable composition to support a model material. The higher the hardness of the cured product obtained by curing the photocurable composition, the higher the supportability. When the hardness of a plate-shaped cured product (thickness 3 mm) obtained by irradiating the photocurable composition of the present invention with ultraviolet light of 100 mW/cm 2 for 3 minutes is measured using a type E durometer, the hardness 0 seconds after the start of measurement is preferably 65 or more, more preferably 75 or more, even more preferably 80 or more, and particularly preferably 85 or more or more than 85.
本発明の光硬化性組成物から形成される硬化物は、水により容易に除去できる性質を有することが好ましい。本発明の光硬化性組成物に100mW/cm2の紫外線を3分間照射して得られた硬化物片(2cm×2cm×厚さ3mm)を25℃の水50mLに加えて3時間静置した際、硬化物片の50質量%以上が溶解することが好ましく、硬化物片の80質量%以上が溶解することがより好ましく、硬化物片全てが溶解することが特に好ましい。 The cured product formed from the photocurable composition of the present invention preferably has a property of being easily removable by water. When a piece of the cured product (2 cm x 2 cm x 3 mm thick) obtained by irradiating the photocurable composition of the present invention with 100 mW/ cm2 ultraviolet light for 3 minutes is added to 50 mL of water at 25°C and left to stand for 3 hours, preferably 50% by mass or more of the cured product piece dissolves, more preferably 80% by mass or more of the cured product piece dissolves, and particularly preferably all of the cured product piece dissolves.
本発明の光硬化性組成物から形成される硬化物は透明性に優れている。本発明者らは、サポート材用光硬化性組成物から形成される硬化物の透明性が優れている程(具体的には硬化物のヘイズが低い程)、得られる光造形物(モデル材)の表面状態がクリーンな(粗くない)ものが得られることを発見した。この機構は明らかではないが、サポート材が水溶性の高い重合性モノマーが溶解又は分散した光硬化性組成物からなるもの(すなわち水親和性の光硬化性組成物)であり、モデル材が水溶性の低い重合性モノマーが溶解又は分散した光硬化性組成物からなるもの(すなわち水非親和性の光硬化性組成物)であるとき、該水親和性のサポート材用光硬化性組成物から形成される硬化物(サポート材)の透明性が優れている程、水非親和性のモデル材用光硬化性組成物に対して前記サポート材用光硬化性組成物が混ざりにくい状態となり、その結果、サポート材用光硬化性組成物とモデル材用光硬化性組成物の両方を吐出したときにその界面の分離性が高まって、該界面由来の表面がクリーンな光造形物(モデル材)が得られるものと考えられる。
本発明の光硬化性組成物に100mW/cm2の紫外線を3分間照射して得られた板状の硬化物片(厚さ2mm)のヘイズを濁度計を用いて測定した際、該ヘイズが70%以下であることが好ましく、より好ましくは50%以下、さらに好ましくは10%以下、特に好ましくは5%未満である。
The cured product formed from the photocurable composition of the present invention has excellent transparency. The present inventors have discovered that the more transparent the cured product formed from the photocurable composition for supporting material is (specifically, the lower the haze of the cured product is), the cleaner (less rough) the surface state of the resulting photomodeled product (model material) is. Although the mechanism is unclear, when the supporting material is made of a photocurable composition in which a polymerizable monomer with high water solubility is dissolved or dispersed (i.e., a photocurable composition with water affinity), and the model material is made of a photocurable composition in which a polymerizable monomer with low water solubility is dissolved or dispersed (i.e., a photocurable composition with low water affinity), the more transparent the cured product (supporting material) formed from the photocurable composition for supporting material with water affinity is, the more difficult it is for the photocurable composition for supporting material to mix with the photocurable composition for model material with low water affinity. As a result, when both the photocurable composition for supporting material and the photocurable composition for model material are discharged, the separation of the interface between them is enhanced, and it is considered that a photomodeled product (model material) with a clean surface derived from the interface is obtained.
When the photocurable composition of the present invention is irradiated with ultraviolet light at 100 mW/ cm2 for 3 minutes to obtain a plate-shaped cured product piece (thickness: 2 mm) and the haze is measured using a turbidity meter, the haze is preferably 70% or less, more preferably 50% or less, even more preferably 10% or less, and particularly preferably less than 5%.
2.インクジェット3Dプリンター用カートリッジ
上記光硬化性組成物は、インクジェット3Dプリンター用インクとして用いられる。上記光硬化性組成物は、通常、インクジェット3Dプリンター用カートリッジに充填されて使用される。前記インクジェット3Dプリンター用カートリッジは、上記光硬化性組成物が充填されていればよく、インクジェット3Dプリンター用カートリッジの形態としては公知のものが使用できる。
2. Cartridge for inkjet 3D printer The photocurable composition is used as an ink for inkjet 3D printers. The photocurable composition is usually filled into a cartridge for inkjet 3D printers for use. The inkjet 3D printer cartridge may be filled with the photocurable composition, and any cartridge for inkjet 3D printers may be used in the form of a known cartridge.
3.サポート材の製造方法
本発明のサポート材は、上記光硬化性組成物に光を照射することで製造される。すなわち、本発明のサポート材の製造方法は、光硬化性組成物に光を照射する工程を含んでいればよく、具体的には、インクジェット3Dプリンターにおける吐出ヘッドから上記光硬化性組成物を吐出する工程(吐出工程a)と、吐出された光硬化性組成物に光を照射する工程(光照射工程a)を含むサポート材層の形成工程Aを含むことが好ましい。このサポート材層の形成工程Aを繰り返し行うことで、サポート材層を積層させ、目的とする形状のサポート材を製造することができる。前記吐出工程aにおいては、上記光硬化性組成物を用いる他は、公知の方法が使用できる。
3. Method for manufacturing a support material The support material of the present invention is manufactured by irradiating the photocurable composition with light. That is, the method for manufacturing a support material of the present invention may include a step of irradiating the photocurable composition with light, and specifically, it is preferable to include a step of discharging the photocurable composition from the discharge head of an inkjet 3D printer (discharge step a) and a step of irradiating the discharged photocurable composition with light (light irradiation step a) to form a support material layer A. By repeatedly performing this support material layer formation step A, the support material layers can be laminated to produce a support material of the desired shape. In the discharge step a, a known method can be used other than using the photocurable composition.
また、前記光照射工程aも、公知の方法が使用できる。光硬化性組成物に照射する光としては、紫外線、近紫外線、可視光線、赤外線、遠赤外線、電子線、α線、γ線、エックス線等を使用することができるが、中でも紫外線が好ましい。 The light irradiation step a can also be carried out by a known method. The light to be irradiated to the photocurable composition can be ultraviolet light, near ultraviolet light, visible light, infrared light, far infrared light, electron beams, alpha rays, gamma rays, X-rays, etc., with ultraviolet light being preferred.
光照射時の露光量としては、100mJ/cm2~3000mJ/cm2が好ましく、より好ましくは100~2000mJ/cm2、さらに好ましくは100~1000mJ/cm2である。 The exposure dose during light irradiation is preferably from 100 mJ/cm 2 to 3000 mJ/cm 2 , more preferably from 100 to 2000 mJ/cm 2 , and even more preferably from 100 to 1000 mJ/cm 2 .
4.光造形物の製造方法
本発明の光造形物の製造方法は、
前述の光硬化性組成物に光を照射するサポート材層の形成工程Aと、前記形成工程Aと同じ及び/又は異なるタイミングで実施されるモデル材層の形成工程Bとをそれぞれ複数回繰り返す造形物前駆体の形成工程と、
前記サポート材層から構成されるサポート材を前記光造形物前駆体から除去する工程とを含む。
4. Method for Producing a Photo-Modeled Object The method for producing a photo-modeled object of the present invention includes the steps of:
a forming step of a modeled object precursor, in which a forming step A of a supporting material layer in which the photocurable composition is irradiated with light and a forming step B of a model material layer carried out at the same timing and/or different timing as the forming step A are each repeated multiple times;
and removing the support material formed of the support material layer from the optically shaped object precursor.
上記光造形物の製造方法では、サポート材層の形成工程Aにおいて前述の光硬化性組成物(以下、光硬化性組成物(I)という場合がある)を用いる他は、公知の方法が使用できる。具体的には、サポート材層の形成工程Aとは、インクジェット3Dプリンターにおける吐出ヘッドから上記光硬化性組成物(I)を吐出する工程(吐出工程a)と、吐出された光硬化性組成物(I)に光を照射する工程(光照射工程a)を含むことが好ましい。このサポート材層の形成工程Aを繰り返し行うことで、サポート材層を積層させ、目的とする形状のサポート材を製造することができる。前記吐出工程a及び光照射工程aの好ましい態様は、前記と同様である。 In the above-mentioned method for producing a photo-cured object, a known method can be used in addition to using the above-mentioned photocurable composition (hereinafter sometimes referred to as photocurable composition (I)) in the step A of forming the support material layer. Specifically, the step A of forming the support material layer preferably includes a step of ejecting the above-mentioned photocurable composition (I) from the ejection head of an inkjet 3D printer (ejection step a) and a step of irradiating the ejected photocurable composition (I) with light (light irradiation step a). By repeatedly performing the step A of forming the support material layer, the support material layers can be stacked to produce a support material of the desired shape. The preferred aspects of the ejection step a and the light irradiation step a are the same as those described above.
モデル材層の形成工程Bでは、モデル材用の光硬化性組成物(以下、光硬化性組成物(II)という場合がある)に光を照射する工程を含んでいることが好ましい。具体的には、インクジェット3Dプリンターにおける吐出ヘッドから光硬化性組成物(II)を吐出する工程(吐出工程b)と、吐出された光硬化性組成物(II)に光を照射する工程(光照射工程b)を含むことが好ましい。このモデル材層の形成工程Bを繰り返し行うことで、モデル材層を積層させ、目的とする形状のモデル材を製造することができる。 The model material layer forming process B preferably includes a process of irradiating light to a photocurable composition for the model material (hereinafter sometimes referred to as photocurable composition (II)). Specifically, it preferably includes a process (discharging process b) of discharging the photocurable composition (II) from the discharge head of the inkjet 3D printer, and a process (light irradiation process b) of irradiating the discharged photocurable composition (II) with light. By repeatedly performing this model material layer forming process B, model material layers can be stacked to produce a model material of the desired shape.
モデル材層の形成工程Bにおける吐出工程bは、インクジェット3Dプリンターにおける吐出ヘッドから光硬化性組成物(II)を吐出する工程である。前記吐出工程bにおいては、公知の方法が使用できる。 The ejection step b in the model material layer formation step B is a step of ejecting the photocurable composition (II) from the ejection head of the inkjet 3D printer. In the ejection step b, a known method can be used.
なお、吐出工程aにおいて光硬化性組成物(I)を吐出する吐出ヘッドと、吐出工程bにおいて光硬化性組成物(II)を吐出する吐出ヘッドとは異なるものであることが好ましい。すなわち、本発明に用いられるインクジェット3Dプリンターは、光硬化性組成物(I)を吐出するための吐出ヘッドと、光硬化性組成物(II)を吐出するための吐出ヘッドとを備えていることが好ましい。 It is preferable that the ejection head that ejects the photocurable composition (I) in the ejection step a is different from the ejection head that ejects the photocurable composition (II) in the ejection step b. In other words, the inkjet 3D printer used in the present invention is preferably equipped with an ejection head for ejecting the photocurable composition (I) and an ejection head for ejecting the photocurable composition (II).
モデル材層の形成工程Bにおける光照射工程bは、吐出工程bで吐出された光硬化性組成物(II)に光を照射する工程であり、公知の方法が使用できる。光照射工程bにおける好ましい態様は、光照射工程aにおける好ましい態様と同様である。 The light irradiation step b in the model material layer formation step B is a step of irradiating the photocurable composition (II) discharged in the discharge step b with light, and a known method can be used. The preferred embodiment of the light irradiation step b is the same as the preferred embodiment of the light irradiation step a.
サポート材及びモデル材から構成される光造形物前駆体は、前記形成工程Aと前記形成工程Bとをそれぞれ複数回繰り返すことで製造される。
具体的には、目的とする光造形物前駆体を薄片状に微分割した層を積層することで光造形物前駆体を製造でき、各層としては、サポート材のみからなる層、モデル材のみからなる層、サポート材及びモデル材からなる層(すなわち、同一平面にサポート材及びモデル材が存在する層)が挙げられる。サポート材のみからなる層を形成する場合は前記形成工程Aを実施し、モデル材のみからなる層を形成する場合は前記形成工程Bを実施し、サポート材及びモデル材からなる層を形成する場合は、前記形成工程Aと前記形成工程Bとを同時に実施すればよい。これらを適宜繰り返すことで、目的とする光造形物前駆体を製造できる。
なお、形成工程A、形成工程B、並びに、形成工程A及び形成工程Bを同時に実施する工程の順序や繰り返しの回数は、目的とする光造形物前駆体の形状に応じて適宜調整すればよい。
The optically shaped object precursor composed of the supporting material and the model material is manufactured by repeating each of the forming steps A and B a plurality of times.
Specifically, the optically shaped object precursor can be manufactured by stacking layers of the desired optically shaped object precursor finely divided into thin pieces, and each layer can be a layer consisting of only a supporting material, a layer consisting of only a modeling material, or a layer consisting of a supporting material and a modeling material (i.e., a layer in which a supporting material and a modeling material are present on the same plane). When forming a layer consisting of only a supporting material, the forming step A is carried out, when forming a layer consisting of only a modeling material, the forming step B is carried out, and when forming a layer consisting of a supporting material and a modeling material, the forming step A and the forming step B can be carried out simultaneously. By appropriately repeating these steps, the desired optically shaped object precursor can be manufactured.
The order of forming step A, forming step B, and the step of simultaneously carrying out forming step A and forming step B, as well as the number of repetitions, may be appropriately adjusted according to the desired shape of the optically shaped object precursor.
形成工程Aと形成工程Bとを同時に行う場合には、まず吐出工程a及び吐出工程bを行うことで、同一平面上に光硬化性組成物(I)及び光硬化性組成物(II)を置いた後に光照射工程a及び光照射工程bを行うことが好ましい。この場合、吐出工程a及び吐出工程bは同時に行ってもよく、吐出工程aの後に吐出工程bを行う或いは吐出工程bの後に吐出工程aを行う等異なるタイミングで行ってもよい。本発明においては、サポート材用の光硬化性組成物(すなわち、光硬化性組成物(I))として、得られる硬化物の透明性が高められているものを使用しているため、吐出工程a及び吐出工程bにより吐出された光硬化性組成物(I)と光硬化性組成物(II)の界面の分離性が高められている。そしてこの界面の分離性が高められたまま光照射工程a及び光照射工程bを行うことができるため、該界面由来の表面がクリーンな光造形物(モデル材)を得ることができる。
サポート材層の形成工程Aとモデル材層の形成工程Bとを同時に行う場合には、光照射工程a及び光照射工程bは同時行うことがより好ましい。
When the formation step A and the formation step B are performed simultaneously, it is preferable to first perform the discharge step a and the discharge step b, place the photocurable composition (I) and the photocurable composition (II) on the same plane, and then perform the light irradiation step a and the light irradiation step b. In this case, the discharge step a and the discharge step b may be performed simultaneously, or may be performed at different times, such as performing the discharge step b after the discharge step a, or performing the discharge step a after the discharge step b. In the present invention, since a photocurable composition for the support material (i.e., the photocurable composition (I)) in which the transparency of the obtained cured product is increased is used, the separation of the interface between the photocurable composition (I) and the photocurable composition (II) discharged by the discharge step a and the discharge step b is increased. And since the light irradiation step a and the light irradiation step b can be performed while the separation of the interface is increased, a photo-molded object (model material) with a clean surface derived from the interface can be obtained.
When the supporting material layer forming step A and the model material layer forming step B are carried out simultaneously, it is more preferable to carry out the light irradiation steps a and b simultaneously.
前記形成工程Bで用いられる光硬化性組成物(II)としては、重合性モノマー(D)と光重合開始剤とを含む組成物であることが好ましい。 The photocurable composition (II) used in the formation process B is preferably a composition containing a polymerizable monomer (D) and a photopolymerization initiator.
前記重合性モノマー(D)としては、エチレン性不飽和基を1つ以上有する化合物であって、光等により重合する化合物であれば特に限定されず、具体的に、
(メタ)アクリル酸;
メチル(メタ)アクリレート、エチル(メタ)アクリレート、イソブチル(メタ)アクリレート、ラウリル(メタ)アクリレート、ステアリル(メタ)アクリレート、イソステアリル(メタ)アクリレート、t-ブチル(メタ)アクリレート等のアルキル(メタ)アクリレート;
2-ヒドロキシエチル(メタ)アクリレート、2-ヒドロキシプロピル(メタ)アクリレート等のヒドロキシアルキル(メタ)アクリレート;
シクロヘキシル(メタ)アクリレート、4-t-ブチルシクロヘキシル(メタ)アクリレート、イソボルニル(メタ)アクリレート、ジシクロペンタニル(メタ)アクリレート、ジメチロールトリシクロデカンジ(メタ)アクリレート、トリシクロデカンジメタノールジ(メタ)アクリレート、アダマンチル(メタ)アクリレート等の脂環式炭化水素基含有(メタ)アクリレート;
フェニル(メタ)アクリレート、フェノキシエチル(メタ)アクリレート等の芳香族炭化水素基含有(メタ)アクリレート;
テトラヒドロフルフリル(メタ)アクリレート、4-(メタ)アクリロイルオキシメチル-2-メチル-2-エチル-1,3-ジオキソラン、4-(メタ)アクリロイルオキシメチル-2-シクロヘキシル-1,3-ジオキソラン、環状トリメチロールプロパンホルマール(メタ)アクリレート、(メタ)アクリル酸グリシジル等の複素環含有(メタ)アクリレート;
トリプロピレングリコールジ(メタ)アクリレート、1,6-ヘキサンジオールジ(メタ)アクリレート、ネオペンチルグリコールジ(メタ)アクリレート、1,9-ノナンジオールジ(メタ)アクリレート、3-メチル-1,5-ペンタンジオールジ(メタ)アクリレート、2-n-ブチル-2-エチル-1,3-プロパンジオールジ(メタ)アクリレート、ペンタエリスリトールトリ(メタ)アクリレート、2-(2-ビニロキシエトキシ)エチル(メタ)アクリレート等のアルキレンオキシ基含有(メタ)アクリレート;
炭素数が1~12のアルキル基を導入したN-アルキル(メタ)アクリルアミド等の(メタ)アクリルアミド;
酢酸ビニル、プロピオン酸ビニル、メチルビニルエーテル、スチレン、N-ビニルカプロラクタム等のビニル化合物;
アリルオキシメチルアクリル酸メチル;などが挙げられる。
The polymerizable monomer (D) is not particularly limited as long as it is a compound having one or more ethylenically unsaturated groups and is polymerizable by light or the like. Specifically,
(Meth)acrylic acid;
Alkyl (meth)acrylates such as methyl (meth)acrylate, ethyl (meth)acrylate, isobutyl (meth)acrylate, lauryl (meth)acrylate, stearyl (meth)acrylate, isostearyl (meth)acrylate, and t-butyl (meth)acrylate;
Hydroxyalkyl (meth)acrylates such as 2-hydroxyethyl (meth)acrylate and 2-hydroxypropyl (meth)acrylate;
(meth)acrylates containing an alicyclic hydrocarbon group, such as cyclohexyl (meth)acrylate, 4-t-butylcyclohexyl (meth)acrylate, isobornyl (meth)acrylate, dicyclopentanyl (meth)acrylate, dimethyloltricyclodecane di(meth)acrylate, tricyclodecane dimethanol di(meth)acrylate, and adamantyl (meth)acrylate;
Aromatic hydrocarbon group-containing (meth)acrylates, such as phenyl (meth)acrylate and phenoxyethyl (meth)acrylate;
Heterocycle-containing (meth)acrylates such as tetrahydrofurfuryl (meth)acrylate, 4-(meth)acryloyloxymethyl-2-methyl-2-ethyl-1,3-dioxolane, 4-(meth)acryloyloxymethyl-2-cyclohexyl-1,3-dioxolane, cyclic trimethylolpropane formal (meth)acrylate, and glycidyl (meth)acrylate;
Alkyleneoxy group-containing (meth)acrylates such as tripropylene glycol di(meth)acrylate, 1,6-hexanediol di(meth)acrylate, neopentyl glycol di(meth)acrylate, 1,9-nonanediol di(meth)acrylate, 3-methyl-1,5-pentanediol di(meth)acrylate, 2-n-butyl-2-ethyl-1,3-propanediol di(meth)acrylate, pentaerythritol tri(meth)acrylate, and 2-(2-vinyloxyethoxy)ethyl (meth)acrylate;
(Meth)acrylamides such as N-alkyl(meth)acrylamides having an alkyl group having 1 to 12 carbon atoms;
Vinyl compounds such as vinyl acetate, vinyl propionate, methyl vinyl ether, styrene, and N-vinyl caprolactam;
methyl allyloxymethylacrylate; and the like.
前記重合性モノマー(D)は単独で用いてもよいし、2種以上を併用してもよい。また重合性モノマー(D)は、金属成分を含まない単量体であることが好ましく、上述の重合性モノマー(A)や重合性モノマー(B)(特に、イオン性モノマー)を含まないことがより好ましい。 The polymerizable monomer (D) may be used alone or in combination of two or more kinds. In addition, the polymerizable monomer (D) is preferably a monomer that does not contain a metal component, and more preferably does not contain the above-mentioned polymerizable monomer (A) or polymerizable monomer (B) (particularly, an ionic monomer).
前記重合性モノマー(D)は、水溶解度(20℃)が20g/L未満である重合性モノマーを含むことが好ましく、水溶解度(20℃)が10g/L以下である重合性モノマーを含むことがより好ましく、水溶解度(20℃)が1g/L以下である重合性モノマーを含むことがさらに好ましい。
水溶解度(20℃)が20g/L未満(好ましくは10g/L以下、より好ましくは1g/L以下)である重合性モノマーの含有量は、得られる硬化物(モデル材)が水に溶解することを防ぐ観点から、重合性モノマー(D)100質量%中、50~100質量%であることが好ましく、60~100質量%であることがより好ましい。
The polymerizable monomer (D) preferably contains a polymerizable monomer having a water solubility (20° C.) of less than 20 g/L, more preferably contains a polymerizable monomer having a water solubility (20° C.) of 10 g/L or less, and even more preferably contains a polymerizable monomer having a water solubility (20° C.) of 1 g/L or less.
The content of the polymerizable monomer having a water solubility (20° C.) of less than 20 g/L (preferably 10 g/L or less, more preferably 1 g/L or less) is preferably 50 to 100 mass%, and more preferably 60 to 100 mass%, based on 100 mass% of the polymerizable monomer (D), from the viewpoint of preventing the resulting cured product (model material) from dissolving in water.
前記重合性モノマー(D)の含有量は、光硬化性組成物(II)の硬化性を向上させる観点から、光硬化性組成物(II)100質量%中、15~90質量%であることが好ましく、20~80質量%であることがより好ましい。 The content of the polymerizable monomer (D) is preferably 15 to 90 mass% and more preferably 20 to 80 mass% in 100 mass% of the photocurable composition (II) from the viewpoint of improving the curability of the photocurable composition (II).
前記光硬化性組成物(II)に含まれる光重合開始剤としては、光硬化性組成物(I)における光重合開始剤として例示した化合物を用いることができる。 The photopolymerization initiator contained in the photocurable composition (II) may be any of the compounds exemplified as the photopolymerization initiator in the photocurable composition (I).
前記光重合開始剤の含有量としては、光硬化性組成物(II)100質量%中、好ましくは0.05~10.0質量%、より好ましくは0.1~7.0質量%、さらに好ましくは0.2~5.0質量%である。光重合開始剤の含有量を上記範囲に調整することで、硬化性がより高められる。
また、前記光重合開始剤の含有量は、重合性モノマー(D)100質量部に対して、好ましくは0.5~20質量部、より好ましくは1.0~15質量部、さらに好ましくは3.0~10質量部である。
The content of the photopolymerization initiator is preferably 0.05 to 10.0% by mass, more preferably 0.1 to 7.0% by mass, and even more preferably 0.2 to 5.0% by mass, based on 100% by mass of the photocurable composition (II). By adjusting the content of the photopolymerization initiator within the above range, the curability can be further improved.
The content of the photopolymerization initiator is preferably 0.5 to 20 parts by mass, more preferably 1.0 to 15 parts by mass, and further preferably 3.0 to 10 parts by mass, based on 100 parts by mass of the polymerizable monomer (D).
前記光硬化性組成物(II)は、さらに溶媒を含んでいてもよい。前記溶媒としては、光硬化性組成物(I)における溶媒として例示した溶媒を用いることができる。前記溶媒の含有量は特に限定されず、光硬化性組成物(II)が好適な粘度となるよう調整すればよい。前記光硬化性組成物(II)は、25℃における粘度が5~300mPa・sであることが好ましい。また、インクジェット3Dプリンターにおける吐出ヘッドからの吐出性を良好にする観点からは、前記光硬化性組成物(II)の吐出温度での粘度が20mPa・s以下であることが好ましい。 The photocurable composition (II) may further contain a solvent. As the solvent, the solvents exemplified as the solvent for the photocurable composition (I) can be used. The content of the solvent is not particularly limited, and may be adjusted so that the photocurable composition (II) has a suitable viscosity. The photocurable composition (II) preferably has a viscosity of 5 to 300 mPa·s at 25°C. In addition, from the viewpoint of improving the ejection properties from the ejection head of the inkjet 3D printer, it is preferable that the viscosity of the photocurable composition (II) at the ejection temperature is 20 mPa·s or less.
前記光硬化性組成物(II)は、本発明の効果を阻害しない範囲で、必要によりその他の添加剤を含んでもよい。前記添加剤としては、例えば、光開始助剤、重合禁止剤、界面活性剤、着色剤、連鎖移動剤、充填剤、乳化安定剤、浸透促進剤、紫外線吸収剤、防腐剤、防黴剤、防錆剤、pH調整剤、表面張力調整剤、消泡剤、粘度調整剤、分散剤、分散安定剤、キレート剤、乾燥防止剤(湿潤剤)、褪色防止剤、比抵抗調整剤、皮膜調整剤等の公知の添加剤が挙げられる。 The photocurable composition (II) may contain other additives as necessary, provided that the effects of the present invention are not impaired. Examples of the additives include known additives such as photoinitiator assistants, polymerization inhibitors, surfactants, colorants, chain transfer agents, fillers, emulsion stabilizers, penetration promoters, UV absorbers, preservatives, antifungal agents, rust inhibitors, pH adjusters, surface tension adjusters, antifoaming agents, viscosity adjusters, dispersants, dispersion stabilizers, chelating agents, drying inhibitors (wetting agents), discoloration inhibitors, resistivity adjusters, and film adjusters.
前記光硬化性組成物(II)から形成されるモデル材は、サポート材の除去工程に耐性を有する必要がある。前記光硬化性組成物(II)に100mW/cm2の紫外線を3分間照射して得られた硬化物片(2cm×2cm×3mm)を25℃の水50mLに加えて3時間静置した際、硬化物片が全く溶解しないことが好ましい。 The model material formed from the photocurable composition (II) needs to be resistant to the support material removal process. When a cured piece (2 cm x 2 cm x 3 mm) obtained by irradiating the photocurable composition (II) with 100 mW/ cm2 ultraviolet light for 3 minutes is added to 50 mL of water at 25°C and allowed to stand for 3 hours, it is preferable that the cured piece does not dissolve at all.
続いて、得られた光造形物前駆体から、前記サポート材層から構成されるサポート材を除去する工程を実施することで、目的とする光造形物(モデル材から構成される光造形物)が得られる。前記サポート材は、水やアルコール、酸性溶液、塩基性溶液等の極性溶媒を用いて容易に除去できる。安全面や環境負荷低減の観点からは、前記極性溶媒としては、水を用いることが好ましい。前記サポート材の除去工程としては、安全面やコスト面から、光造形物前駆体を極性溶媒(好ましくは水)中に静置して、サポート材を除去する方法が好ましい。静置時間は特に限定されないが、作業性の観点から、好ましくは1~5時間、より好ましくは0.5~2時間である。またこの際、極性溶媒(好ましくは水)の温度は、10~40℃であることが好ましく、より好ましくは20~30℃である。 Subsequently, a process of removing the support material composed of the support material layer from the obtained stereolithography precursor is carried out to obtain the desired stereolithography (stereolithography composed of model material). The support material can be easily removed using a polar solvent such as water, alcohol, acidic solution, or basic solution. From the viewpoints of safety and reducing environmental load, it is preferable to use water as the polar solvent. From the viewpoints of safety and cost, the support material removal process is preferably a method in which the stereolithography precursor is left to stand in a polar solvent (preferably water) to remove the support material. The standing time is not particularly limited, but from the viewpoint of workability, it is preferably 1 to 5 hours, more preferably 0.5 to 2 hours. In addition, the temperature of the polar solvent (preferably water) is preferably 10 to 40°C, more preferably 20 to 30°C.
以下、実施例を挙げて本発明をより具体的に説明するが、本発明はもとより下記実施例によって制限を受けるものではなく、前・後記の趣旨に適合し得る範囲で適当に変更を加えて実施することも勿論可能であり、それらはいずれも本発明の技術的範囲に包含される。なお、以下においては、特に断りのない限り、「部」は「質量部」を、「%」は「質量%」を意味する。 The present invention will be explained in more detail below with reference to examples, but the present invention is not limited to the following examples, and it is of course possible to carry out the invention with appropriate modifications within the scope of the intent described above and below, all of which are included in the technical scope of the present invention. In the following, unless otherwise specified, "parts" means "parts by mass" and "%" means "% by mass".
[実施例1]
20mL褐色スクリュー管に、メトキシポリエチレングリコールアクリレート(オキシエチレン基の繰り返し数の平均値:約9、新中村化学工業社製、商品名「NKエステル AM-90G」)20部、アクリル酸亜鉛15部、プロピレングリコール30部、トリエチレングリコール30部、グリセリン5部、及び光重合開始剤(IGM Resins B.V.社製、商品名「Omnirad2959」)2部を加えて撹拌混合し、光硬化性組成物を得た。
[Example 1]
To a 20 mL brown screw tube, 20 parts of methoxypolyethylene glycol acrylate (average number of repeating oxyethylene groups: approximately 9, manufactured by Shin-Nakamura Chemical Co., Ltd., product name "NK Ester AM-90G"), 15 parts of zinc acrylate, 30 parts of propylene glycol, 30 parts of triethylene glycol, 5 parts of glycerin, and 2 parts of a photopolymerization initiator (manufactured by IGM Resins B.V., product name "Omnirad2959") were added and mixed with stirring to obtain a photocurable composition.
[実施例2~13、比較例1~3]
表1に記載の組成に変更したこと以外は、実施例1と同様にして、光硬化性組成物を得た。
[Examples 2 to 13, Comparative Examples 1 to 3]
Photocurable compositions were obtained in the same manner as in Example 1, except that the compositions were changed to those shown in Table 1.
実施例及び比較例で得た光硬化性組成物について、以下の評価方法で評価を行った。 The photocurable compositions obtained in the examples and comparative examples were evaluated using the following evaluation methods.
(1)光硬化性組成物の粘度の評価
JIS Z 8803に準拠した方法により、TPE100形粘度計(東機産業社製)を用いて、温度25℃の条件下で、実施例11~13の光硬化性組成物の粘度を測定した。得られた粘度(単位:mPa・s)を表1に示す。
(1) Evaluation of Viscosity of Photocurable Composition The viscosity of the photocurable compositions of Examples 11 to 13 was measured at 25° C. using a TPE100 viscometer (manufactured by Toki Sangyo Co., Ltd.) according to a method in accordance with JIS Z 8803. The obtained viscosities (unit: mPa s) are shown in Table 1.
(2)硬化性の評価
光硬化性組成物に、100mW/cm2の紫外線(波長365nm)を30秒間照射して得られた光照射物(2cm×2cm×厚さ3mm)の外観を目視で確認して評価した。評価基準は、次の通りである。結果を表1に示す。
○:光照射物は流動せず、すなわち硬化した
×:光照射物は液体または粘性液体であり、流動性を有していた
(2) Evaluation of curability The photocurable composition was irradiated with 100 mW/ cm2 ultraviolet light (wavelength 365 nm) for 30 seconds, and the appearance of the resulting photoirradiated object (2 cm x 2 cm x thickness 3 mm) was visually inspected and evaluated. The evaluation criteria were as follows. The results are shown in Table 1.
○: The light irradiated material did not flow, i.e., it hardened. ×: The light irradiated material was a liquid or viscous liquid and had flowability.
(3)サポート性の評価
光硬化性組成物に100mW/cm2の紫外線(波長365nm)を3分間照射して得られた硬化物(2cm×2cm×厚さ3mm)についてタイプEデュロメータ(高分子計器社製)を用いて、測定開始から0秒後の硬度を測定して評価した。評価基準は、次の通りである。結果を表1に示す。
〇:85超え
△:65以上85以下
×:65未満
(3) Evaluation of Supportability The photocurable composition was irradiated with 100 mW/ cm2 ultraviolet light (wavelength 365 nm) for 3 minutes to obtain a cured product (2 cm x 2 cm x thickness 3 mm). The hardness was measured 0 seconds after the start of measurement using a Type E Durometer (manufactured by Kobunshi Keiki Co., Ltd.) and evaluated. The evaluation criteria were as follows. The results are shown in Table 1.
〇: Over 85 △: Between 65 and 85 ×: Less than 65
(4)透明性の評価
光硬化性組成物に100mW/cm2の紫外線(波長365nm)を3分間照射して得られた硬化物片(6cm×3cm×2mm)のヘイズを濁度計(日本電色工業社製ヘイズメーターNDH7000)を用いて測定した。評価基準は、次の通りである。結果を表1に示す。
○:ヘイズが5%未満
△:ヘイズが5%以上50%以下
×:ヘイズが50%超
(4) Evaluation of Transparency The haze of a piece of the cured product (6 cm x 3 cm x 2 mm) obtained by irradiating the photocurable composition with 100 mW/ cm2 ultraviolet light (wavelength 365 nm) for 3 minutes was measured using a turbidity meter (Nippon Denshoku Industries Co., Ltd., Haze Meter NDH7000). The evaluation criteria are as follows. The results are shown in Table 1.
○: Haze is less than 5% △: Haze is 5% to 50% ×: Haze is more than 50%
(5)水溶解性の評価
光硬化性組成物に100mW/cm2の紫外線(波長365nm)を3分間照射して得られた硬化物片(2cm×2cm×厚さ3mm)を金網の上に置き、水温25℃の水50mL中で保持した際に、硬化物片が全て溶解するまでの時間を測定した。評価基準は、次の通りである。結果を表1に示す。
〇:3時間未満
×:3時間以上
(5) Evaluation of Water Solubility A piece of cured material (2 cm x 2 cm x 3 mm thick) obtained by irradiating a photocurable composition with 100 mW/ cm2 ultraviolet light (wavelength 365 nm) for 3 minutes was placed on a wire net and kept in 50 mL of water at 25°C, and the time until the cured material piece was completely dissolved was measured. The evaluation criteria were as follows. The results are shown in Table 1.
○: Less than 3 hours ×: More than 3 hours
表1に記載された各成分の詳細は以下の通りである。
AM-90G:メトキシポリエチレングリコールアクリレート(オキシエチレン基の繰り返し数の平均値:約9)、新中村化学工業社製、商品名「NKエステル AM-90G」
AM-130G:メトキシポリエチレングリコールアクリレート(オキシエチレン基の繰り返し数の平均値:約13)、新中村化学工業社製、商品名「NKエステル AM-130G」
AM-230G:メトキシポリエチレングリコールアクリレート(オキシエチレン基の繰り返し数の平均値:約23)、新中村化学工業社製、商品名「NKエステル AM-230G」
M-90G:メトキシポリエチレングリコールメタクリレート(オキシエチレン基の繰り返し数の平均値:約9)、新中村化学工業社製、商品名「NKエステル M-90G」
M-130G:メトキシポリエチレングリコールメタクリレート(オキシエチレン基の繰り返し数の平均値:約13)、新中村化学工業社製、商品名「NKエステル M-130G」
M-230G:メトキシポリエチレングリコールメタクリレート(オキシエチレン基の繰り返し数の平均値:約23)、新中村化学工業社製、商品名「NKエステル M-230G」
ビスコート#MTG:メトキシトリエチレングリコールアクリレート、大阪有機化学工業社製、商品名「ビスコート#MTG」
ポリエチレングリコール400:富士フィルム和光純薬社製、商品名「ポリエチレングリコール400」
ポリプロピレングリコール(ジオール型、Mn=400):富士フィルム和光純薬社製、商品名「ポリプロピレングリコール、ジオール型、400」
Omnirad2959(商品名):1-[4-(2-ヒドロキシエトキシ)-フェニル]-2-ヒドロキシ-メチルプロパノン(アセトフェノン型光重合開始剤)、IGM Resins B.V.社製
Details of each component listed in Table 1 are as follows.
AM-90G: Methoxypolyethylene glycol acrylate (average number of repeating oxyethylene groups: about 9), manufactured by Shin-Nakamura Chemical Co., Ltd., product name "NK Ester AM-90G"
AM-130G: Methoxypolyethylene glycol acrylate (average number of repeating oxyethylene groups: about 13), manufactured by Shin-Nakamura Chemical Co., Ltd., product name "NK Ester AM-130G"
AM-230G: Methoxypolyethylene glycol acrylate (average number of repeating oxyethylene groups: about 23), manufactured by Shin-Nakamura Chemical Co., Ltd., product name "NK Ester AM-230G"
M-90G: Methoxypolyethylene glycol methacrylate (average number of repeating oxyethylene groups: about 9), manufactured by Shin-Nakamura Chemical Co., Ltd., product name "NK Ester M-90G"
M-130G: Methoxypolyethyleneglycol methacrylate (average number of repeating oxyethylene groups: about 13), manufactured by Shin-Nakamura Chemical Co., Ltd., product name "NK Ester M-130G"
M-230G: Methoxypolyethyleneglycol methacrylate (average number of repeating oxyethylene groups: about 23), manufactured by Shin-Nakamura Chemical Co., Ltd., product name "NK Ester M-230G"
Viscoat #MTG: Methoxytriethyleneglycol acrylate, manufactured by Osaka Organic Chemical Industry Co., Ltd., product name "Viscoat #MTG"
Polyethylene glycol 400: Fujifilm Wako Pure Chemical Industries, Ltd., product name "Polyethylene glycol 400"
Polypropylene glycol (diol type, Mn = 400): manufactured by Fujifilm Wako Pure Chemical Industries, Ltd., product name "Polypropylene glycol, diol type, 400"
Omnirad 2959 (trade name): 1-[4-(2-hydroxyethoxy)-phenyl]-2-hydroxy-methylpropanone (acetophenone-type photopolymerization initiator), manufactured by IGM Resins B.V.
オキシアルキレン基を有する重合性モノマー(A)と、前記重合性モノマー(A)以外の水溶性の重合性モノマー(B)とを含む実施例の光硬化性樹脂組成物は、表1に示すように、硬化性に優れており、また、サポート性、透明性、及び水への溶解性が高められた硬化物(サポート材)が得られた。 The photocurable resin composition of the example containing a polymerizable monomer (A) having an oxyalkylene group and a water-soluble polymerizable monomer (B) other than the polymerizable monomer (A) had excellent curing properties as shown in Table 1, and a cured product (support material) with improved supportability, transparency, and solubility in water was obtained.
Claims (13)
Z-(Ra-O)n-Rb …(1)
[式(1)中、Zはエチレン性不飽和結合含有基を表し、Raはアルキレン基を表し、Rbは水素原子又は置換基を有していてもよい炭化水素基を表し、nは1以上の整数を表す。なお、nが2以上の整数である場合、複数のRaはそれぞれ同一であってもよく、異なっていてもよい。] The photocurable composition according to claim 1 , wherein the polymerizable monomer (A) is a monomer represented by the following formula (1):
Z-(R a -O) n -R b ...(1)
[In formula (1), Z represents an ethylenically unsaturated bond-containing group, R a represents an alkylene group, R b represents a hydrogen atom or a hydrocarbon group which may have a substituent, and n represents an integer of 1 or more. When n is an integer of 2 or more, the multiple R a 's may be the same or different.]
Zが、CH2=C(R1)-C(=O)-O-*又はCH2=C(R1)-(CH2)m-O-*で表される基(R1は水素原子又は置換基を有していてもよい炭素数1~4のアルキル基を表し、mは0~6の整数を表し、*は結合手を表す)を示し、
Raが、炭素数1~4のアルキレン基を示し、
Rbが、水素原子又は炭素数1~4のアルキル基を示し、
nが、1~100の整数を示す、請求項6に記載の光硬化性組成物。 In the formula (1),
Z is a group represented by CH 2 ═C(R 1 )-C(═O)-O-* or CH 2 ═C(R 1 )-(CH 2 ) m -O-* (R 1 represents a hydrogen atom or an alkyl group having 1 to 4 carbon atoms which may have a substituent, m represents an integer of 0 to 6, and * represents a bond),
R a represents an alkylene group having 1 to 4 carbon atoms;
R b represents a hydrogen atom or an alkyl group having 1 to 4 carbon atoms;
The photocurable composition according to claim 6, wherein n is an integer of 1 to 100.
前記サポート材層から構成されるサポート材を前記光造形物前駆体から除去する工程とを含む、光造形物の製造方法。 a step of forming a photo-modeled object precursor, the step of forming a supporting material layer by irradiating the photocurable composition according to any one of claims 1 to 9 with light, and the step of forming a model material layer by repeating the step of forming a supporting material layer multiple times and/or the step of forming a model material layer multiple times;
and removing the supporting material composed of the supporting material layer from the optically shaped object precursor.
前記光硬化性組成物(I)とは異なる光硬化性組成物(II)とを、
インクジェット3Dプリンターにおける異なる吐出ヘッドから吐出する、光硬化性組成物(I)の使用方法。
A photocurable composition (I) according to any one of claims 1 to 9,
a photocurable composition (II) different from the photocurable composition (I),
A method of using the photocurable composition (I) by ejecting it from different ejection heads in an inkjet 3D printer.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| PCT/JP2023/045757 WO2025134281A1 (en) | 2023-12-20 | 2023-12-20 | Photocurable composition for support material formed by inkjet 3d printer and use thereof, and support material and optically built-up article production method using said photocurable composition |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| PCT/JP2023/045757 WO2025134281A1 (en) | 2023-12-20 | 2023-12-20 | Photocurable composition for support material formed by inkjet 3d printer and use thereof, and support material and optically built-up article production method using said photocurable composition |
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Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2021030625A (en) * | 2019-08-27 | 2021-03-01 | 株式会社日本触媒 | Method for manufacturing support material for inkjet 3d printer, support material, and method for manufacturing optically formed product |
| JP2021146524A (en) * | 2020-03-16 | 2021-09-27 | 株式会社日本触媒 | Photocurable composition set for 3d printer, photomolded article using the same and method for producing the same |
| JP2021146562A (en) * | 2020-03-18 | 2021-09-27 | 株式会社日本触媒 | Photocurable composition for support material for 3d printer and support material for 3d printer |
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Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2021030625A (en) * | 2019-08-27 | 2021-03-01 | 株式会社日本触媒 | Method for manufacturing support material for inkjet 3d printer, support material, and method for manufacturing optically formed product |
| JP2021146524A (en) * | 2020-03-16 | 2021-09-27 | 株式会社日本触媒 | Photocurable composition set for 3d printer, photomolded article using the same and method for producing the same |
| JP2021146562A (en) * | 2020-03-18 | 2021-09-27 | 株式会社日本触媒 | Photocurable composition for support material for 3d printer and support material for 3d printer |
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