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WO2025127790A1 - Method for preparing relugolix - Google Patents

Method for preparing relugolix Download PDF

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WO2025127790A1
WO2025127790A1 PCT/KR2024/096649 KR2024096649W WO2025127790A1 WO 2025127790 A1 WO2025127790 A1 WO 2025127790A1 KR 2024096649 W KR2024096649 W KR 2024096649W WO 2025127790 A1 WO2025127790 A1 WO 2025127790A1
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chemical formula
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manufacturing
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Korean (ko)
Inventor
김유빈
사이드하레디풀리
유하이양
명인수
이승종
이기영
오창영
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YS Life Science Co Ltd
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    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D495/00Heterocyclic compounds containing in the condensed system at least one hetero ring having sulfur atoms as the only ring hetero atoms
    • C07D495/02Heterocyclic compounds containing in the condensed system at least one hetero ring having sulfur atoms as the only ring hetero atoms in which the condensed system contains two hetero rings
    • C07D495/04Ortho-condensed systems
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D333/00Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom
    • C07D333/02Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom not condensed with other rings
    • C07D333/04Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom not condensed with other rings not substituted on the ring sulphur atom
    • C07D333/26Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom not condensed with other rings not substituted on the ring sulphur atom with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
    • C07D333/38Carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals
    • AHUMAN NECESSITIES
    • A61MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61KPREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
    • A61K31/00Medicinal preparations containing organic active ingredients
    • A61K31/33Heterocyclic compounds
    • A61K31/395Heterocyclic compounds having nitrogen as a ring hetero atom, e.g. guanethidine or rifamycins
    • A61K31/495Heterocyclic compounds having nitrogen as a ring hetero atom, e.g. guanethidine or rifamycins having six-membered rings with two or more nitrogen atoms as the only ring heteroatoms, e.g. piperazine or tetrazines
    • A61K31/505Pyrimidines; Hydrogenated pyrimidines, e.g. trimethoprim
    • A61K31/519Pyrimidines; Hydrogenated pyrimidines, e.g. trimethoprim ortho- or peri-condensed with heterocyclic rings

Definitions

  • the present invention relates to a method for producing relugolix, and more specifically, to a method for economically producing high-purity relugolix with a high yield.
  • Relugolix (1-(4-(1-(2,6-difluorobenzyl)-5-((dimethylamino)methyl)-3-(6-methoxypyridazin-3-yl)-2,4-dioxo-1,2,3,4-tetrahydrothieno[2,3-d]pyrimidin-6-yl)phenyl)-3-methoxyurea), of the following chemical formula 1, is the active pharmaceutical ingredient (API) of Orgovyx ® , a drug for the treatment of prostate cancer.
  • API active pharmaceutical ingredient
  • U.S. Patent No. 10,150,778 discloses a method for producing relugolix by a total of 7 steps using ethyl 2-((2,6-difluorobenzyl)(ethoxycarbonyl)amino)-4-methyl-5-(4-nitrophenyl)thiophene-3-carboxylate as a starting material, as shown in the following reaction scheme 1.
  • One object of the present invention is to provide a method for economically producing high-purity relugolix in high yield.
  • One embodiment of the present invention relates to a method for producing relugolix of the following chemical formula 1, wherein the method of the present invention comprises:
  • R 2 is a halogen atom, a tosylate group, a mesylate group, or a nitrobenzenesulfonate group.
  • reaction scheme 2 The method described in the following reaction scheme 2 is merely an example of a representatively used method, and the reaction reagents, reaction conditions, etc. may be changed at any time depending on the case.
  • the above base is not particularly limited, and any known base can be used.
  • the above amide coupling reaction can be performed in the presence or absence of a coupling reagent.
  • Toluene, hexane, heptane, pentane, benzene, cyclohexane, diethyl ether, etc. can be used as the reaction solvent, and toluene is particularly preferred.
  • the reaction temperature can be about 0 to 200°C, preferably 90 to 110°C.
  • the reaction time can be from 1 to 24 hours, preferably from 1 to 4 hours.
  • the compound of chemical formula 6 can be prepared by alkylating the compound of chemical formula 4 with the compound of chemical formula 5.
  • Examples of compounds of the above chemical formula 5 that can be used include 2-(chloromethyl)-1,3-difluorobenzene, 2-(bromomethyl)-1,3-difluorobenzene, 2-(iodomethyl)-1,3-difluorobenzene, 2,6-difluorobenzyl 4-methylbenzenesulfonic acid, 2,6-difluorobenzyl methanesulfonic acid, and 2,6-difluorobenzyl 4-nitrobenzenesulfonic acid.
  • the above alkylation reaction can be carried out in the presence or absence of a base.
  • the above base is not particularly limited, and any known base can be used.
  • the base may include sodium carbonate, potassium carbonate, cesium carbonate, sodium hydride, potassium hydride, etc., and these may be used alone or in combination of two or more.
  • the base may be potassium carbonate.
  • the above alkylation reaction can be carried out with or without a catalyst.
  • the catalyst examples include potassium iodide, sodium iodide, cesium iodide, etc., and these can be used alone or in combination of two or more.
  • the catalyst can be potassium iodide.
  • the reaction is carried out in the presence of a solvent.
  • a solvent There is no particular limitation on the type of reaction solvent as long as the reaction proceeds.
  • DMF DMC
  • NMP DMSO
  • THF THF
  • DMF preferably used as the reaction solvent
  • the above base may be an organic base or an inorganic base.
  • triethylamine it is preferable to use triethylamine as the base.
  • the reaction temperature may be -10°C to reflux temperature, and preferably 0 to room temperature.
  • Reaction times can range from 10 minutes to 30 hours.
  • Step 5 Preparation of the compound of chemical formula 9 and its HBr salt
  • the compound of chemical formula 9 can be prepared by reducing the nitro group of the compound of chemical formula 8.
  • the above reduction reaction can be performed using a metal as a reducing agent in the presence of an acid.
  • the metal used may be iron (Fe), tin (Sn), zinc (Zn), copper (Cu), or nickel (Ni), and iron (Fe) is preferred.
  • the above metal can be used in an amount of 1 to 5 moles, preferably 2 to 3 moles, per 1 mole of the compound of chemical formula 8.
  • the above acid can be hydrochloric acid, sulfuric acid, acetic acid, formic acid, phosphoric acid, nitric acid, etc., and hydrochloric acid is preferably used.
  • the reaction time can generally be from 1 to 120 hours, preferably from 6 to 14 hours.
  • the above methoxy ammonium chloride can be used in an amount of 1 to 2 moles per mole of the compound of chemical formula 9 or its HBr salt.
  • Reaction times can range from 10 minutes to 36 hours.
  • the compound of chemical formula 1 can be prepared by subjecting the compound of chemical formula 13 to an ester hydrolysis reaction in the presence of a base, followed by a cyclization reaction.
  • the above base may be an organic base or an inorganic base.
  • Examples of the above inorganic base include alkali metal carbonates such as cesium carbonate, potassium carbonate, and sodium carbonate; or alkali metal hydroxides such as sodium hydroxide, potassium hydroxide, and lithium hydroxide. These may be used alone or in combination of two or more.
  • reaction solvents Methanol, ethanol, acetonitrile, tetrahydrofuran, water, etc. can be used as reaction solvents.
  • Methyl chloroformate (124 g) as a compound of formula 3 was added dropwise to a solution of the compound of formula 2 (200 g) in toluene (600 mL) at 90 to 100°C, and the reaction mixture was stirred until less than 1% of the compound of formula 2 remained (HPLC).
  • the reaction mixture was cooled to 60 to 70°C, and ethanol was added dropwise (1800 mL).
  • the reaction mixture was cooled to 0 to 10°C and stirred at that temperature for 1 hour.
  • the reaction mixture was filtered, and the cake was washed with 1000 mL of ethanol.
  • the washed reaction product was dried under vacuum to obtain 232.5 g of the compound of formula 4 (yield: 97.8%, purity: 96.87%).
  • the compound of chemical formula 1 obtained in the above Example 9 was placed in a container, 40 mL of dimethyl sulfoxide (DMSO) was added, and stirred at 40°C to completely dissolve. Then, activated carbon ( ⁇ 0.05) was added, and the mixture was stirred at the same temperature for an additional 30 minutes, and then the activated carbon was removed through filtration. The filtered solution was cooled to 35°C, and the seed compound of Form I (crystalline form prepared in Example 8 of U.S. Patent No. 10,464,945) was added, the temperature was raised to 50°C, and stirred for 2 hours. Thereafter, the temperature was lowered to 35°C again, reheated to 50°C, and 40 mL of ethanol was added.
  • DMSO dimethyl sulfoxide

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  • Animal Behavior & Ethology (AREA)
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  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)

Abstract

The present invention provides a method for economically preparing high-purity relugolix at high yield.

Description

렐루골릭스의 제조방법Method of manufacturing relugolix

본 발명은 렐루골릭스의 제조방법에 관한 것으로, 보다 상세하게는 고순도의 렐루골릭스를 고수율로 경제적으로 제조하는 방법에 관한 것이다.The present invention relates to a method for producing relugolix, and more specifically, to a method for economically producing high-purity relugolix with a high yield.

하기 화학식 1의 렐루골릭스(relugolix) (1-(4-(1-(2,6-디플루오로벤질)-5-((디메틸아미노)메틸)-3-(6-메톡시피리다진-3-일)-2,4-디옥소-1,2,3,4-테트라하이드로티에노[2,3-d]피리미딘-6-일)페닐)-3-메톡시우레아)는 전립선암 치료제인 오르고빅스 (Orgovyx®)의 활성 약학적 성분(API)이다.Relugolix (1-(4-(1-(2,6-difluorobenzyl)-5-((dimethylamino)methyl)-3-(6-methoxypyridazin-3-yl)-2,4-dioxo-1,2,3,4-tetrahydrothieno[2,3-d]pyrimidin-6-yl)phenyl)-3-methoxyurea), of the following chemical formula 1, is the active pharmaceutical ingredient (API) of Orgovyx ® , a drug for the treatment of prostate cancer.

[화학식 1][Chemical Formula 1]

Figure PCTKR2024096649-appb-img-000001
Figure PCTKR2024096649-appb-img-000001

미국 특허 제10,150,778호에는 하기 반응식 1 과 같이, 에틸 2-((2,6-디플루오로벤질)(에톡시카보닐)아미노)-4-메틸-5-(4-니트로페닐)티오펜-3-카복실레이트를 출발물질로 사용하여 총 7 단계 공정에 의해 렐루골릭스를 제조하는 방법이 개시되어 있다.U.S. Patent No. 10,150,778 discloses a method for producing relugolix by a total of 7 steps using ethyl 2-((2,6-difluorobenzyl)(ethoxycarbonyl)amino)-4-methyl-5-(4-nitrophenyl)thiophene-3-carboxylate as a starting material, as shown in the following reaction scheme 1.

[반응식 1][Reaction Formula 1]

Figure PCTKR2024096649-appb-img-000002
Figure PCTKR2024096649-appb-img-000002

본 발명의 한 목적은 고순도의 렐루골릭스를 고수율로 경제적으로 제조하는 방법을 제공하는 것이다.One object of the present invention is to provide a method for economically producing high-purity relugolix in high yield.

본 발명의 일 실시형태는 하기 화학식 1의 렐루골릭스의 제조방법에 관한 것으로, 본 발명의 제조방법은 One embodiment of the present invention relates to a method for producing relugolix of the following chemical formula 1, wherein the method of the present invention comprises:

(i) 하기 화학식 2의 화합물을 하기 화학식 3의 화합물과 아미드 결합 반응시켜 하기 화학식 4의 화합물을 수득하는 단계;(i) a step of obtaining a compound of the following chemical formula 4 by subjecting a compound of the following chemical formula 2 to an amide bond reaction with a compound of the following chemical formula 3;

(ii) 하기 화학식 4의 화합물을 하기 화학식 5의 화합물로 알킬화 반응시켜 하기 화학식 6의 화합물을 수득하는 단계;(ii) a step of subjecting a compound of chemical formula 4 below to an alkylation reaction with a compound of chemical formula 5 below to obtain a compound of chemical formula 6 below;

(iii) 하기 화학식 6의 화합물을 브로마이드화 반응시켜 하기 화학식 7의 화합물을 수득하는 단계;(iii) a step of obtaining a compound of chemical formula 7 by subjecting a compound of chemical formula 6 to a bromide reaction;

(iv) 하기 화학식 7의 화합물의 브로마이드를 디메틸아민염과 치환 반응시켜 하기 화학식 8의 화합물을 수득하는 단계;(iv) a step of obtaining a compound of chemical formula 8 by subjecting the bromide of the compound of chemical formula 7 below to a substitution reaction with a dimethylamine salt;

(v) 하기 화학식 8의 화합물의 니트로기를 환원 반응시키고 HBr과 반응시켜 하기 화학식 9의 화합물의 HBr 염을 수득하는 단계;(v) a step of reducing the nitro group of the compound of the following chemical formula 8 and reacting it with HBr to obtain an HBr salt of the compound of the following chemical formula 9;

(vi) 하기 화학식 9의 화합물의 HBr 염을 카르보닐화제 및 메톡시 암모늄 염화물과 염기의 존재 하에 반응시켜 하기 화학식 10의 화합물을 수득하는 단계;(vi) a step of reacting the HBr salt of the compound of the following chemical formula 9 in the presence of a carbonylating agent and methoxy ammonium chloride and a base to obtain a compound of the following chemical formula 10;

(vii) 하기 화학식 10의 화합물을 에스테르 가수분해 반응시켜 하기 화학식 11의 화합물을 수득하는 단계;(vii) a step of subjecting a compound of chemical formula 10 below to an ester hydrolysis reaction to obtain a compound of chemical formula 11 below;

(viii) 하기 화학식 11의 화합물을 커플링제 및 염기의 존재 하에 하기 화학식 12의 화합물과 탈수축합 반응시켜 하기 화학식 13의 화합물을 수득하는 단계; 및(viii) a step of subjecting a compound of the following chemical formula 11 to a dehydration condensation reaction with a compound of the following chemical formula 12 in the presence of a coupling agent and a base to obtain a compound of the following chemical formula 13; and

(ix) 하기 화학식 13의 화합물을 염기의 존재 하에 에스테르 가수분해 반응시킨 후, 고리화 반응시키는 단계를 포함한다.(ix) A step of subjecting a compound of the following chemical formula 13 to an ester hydrolysis reaction in the presence of a base, followed by a cyclization reaction is included.

[화학식 1][Chemical Formula 1]

Figure PCTKR2024096649-appb-img-000003
Figure PCTKR2024096649-appb-img-000003

[화학식 2][Chemical formula 2]

Figure PCTKR2024096649-appb-img-000004
Figure PCTKR2024096649-appb-img-000004

[화학식 3][Chemical Formula 3]

Figure PCTKR2024096649-appb-img-000005
Figure PCTKR2024096649-appb-img-000005

[화학식 4][Chemical Formula 4]

Figure PCTKR2024096649-appb-img-000006
Figure PCTKR2024096649-appb-img-000006

[화학식 5][Chemical Formula 5]

Figure PCTKR2024096649-appb-img-000007
Figure PCTKR2024096649-appb-img-000007

[화학식 6][Chemical formula 6]

Figure PCTKR2024096649-appb-img-000008
Figure PCTKR2024096649-appb-img-000008

[화학식 7][Chemical formula 7]

Figure PCTKR2024096649-appb-img-000009
Figure PCTKR2024096649-appb-img-000009

[화학식 8][Chemical formula 8]

Figure PCTKR2024096649-appb-img-000010
Figure PCTKR2024096649-appb-img-000010

[화학식 9][Chemical formula 9]

Figure PCTKR2024096649-appb-img-000011
Figure PCTKR2024096649-appb-img-000011

[화학식 10][Chemical Formula 10]

Figure PCTKR2024096649-appb-img-000012
Figure PCTKR2024096649-appb-img-000012

[화학식 11][Chemical Formula 11]

Figure PCTKR2024096649-appb-img-000013
Figure PCTKR2024096649-appb-img-000013

[화학식 12][Chemical Formula 12]

Figure PCTKR2024096649-appb-img-000014
Figure PCTKR2024096649-appb-img-000014

[화학식 13][Chemical Formula 13]

Figure PCTKR2024096649-appb-img-000015
Figure PCTKR2024096649-appb-img-000015

상기 식에서, In the above formula,

R1은 할로겐 원자 또는 수소 원자이고, R 1 is a halogen atom or a hydrogen atom,

R2는 할로겐 원자, 토실레이트기, 메실레이트기 또는 니트로벤젠설포네이트기이다.R 2 is a halogen atom, a tosylate group, a mesylate group, or a nitrobenzenesulfonate group.

이하, 본 발명의 제조방법을 하기 반응식 2를 참조로 보다 상세히 설명한다. 하기 반응식 2에 기재된 방법은 대표적으로 사용된 방법을 예시한 것일 뿐 반응시약, 반응조건 등은 경우에 따라 얼마든지 변경될 수 있다.Hereinafter, the manufacturing method of the present invention will be described in more detail with reference to the following reaction scheme 2. The method described in the following reaction scheme 2 is merely an example of a representatively used method, and the reaction reagents, reaction conditions, etc. may be changed at any time depending on the case.

[반응식 2][Reaction Formula 2]

Figure PCTKR2024096649-appb-img-000016
Figure PCTKR2024096649-appb-img-000016

제1단계: 화학식 4의 화합물의 제조Step 1: Preparation of compound of chemical formula 4

화학식 4의 화합물은 화학식 2의 화합물을 화학식 3의 화합물과 아미드 결합 반응시켜 제조할 수 있다.The compound of chemical formula 4 can be prepared by an amide bond reaction of the compound of chemical formula 2 with the compound of chemical formula 3.

상기 화학식 3의 화합물로는 메틸 할로포르메이트 또는 메틸 하이드로겐 카보네이트를 예로 들 수 있다.Examples of the compound of the above chemical formula 3 include methyl haloformate or methyl hydrogen carbonate.

상기 메틸 할로포르메이트로는 메틸 클로로포르메이트, 메틸 브로모포르메이트, 메틸 요오도포르메이트, 메틸 플루오로포르메이트 등이 사용될 수 있고, 특히 메틸 클로로포르메이트가 바람직하다.As the above methyl haloformate, methyl chloroformate, methyl bromoformate, methyl iodoformate, methyl fluoroformate, etc. can be used, and methyl chloroformate is particularly preferred.

상기 화학식 3의 화합물은 화학식 2의 화합물 1몰에 대하여 1 내지 4몰, 바람직하기로는 2 내지 3몰의 양으로 사용될 수 있다.The compound of the above chemical formula 3 can be used in an amount of 1 to 4 moles, preferably 2 to 3 moles, per 1 mole of the compound of the above chemical formula 2.

상기 아미드 결합 반응은 염기의 존재 하에 또는 없이 수행할 수 있다.The above amide bond reaction can be performed with or without a base.

상기 염기는 특별히 제한되지 않으며, 공지의 염기를 사용할 수 있다.The above base is not particularly limited, and any known base can be used.

상기 아미드 결합 반응은 결합 시약의 존재 하에 또는 없이 수행할 수 있다.The above amide coupling reaction can be performed in the presence or absence of a coupling reagent.

반응 용매로는 톨루엔, 헥산, 헵탄, 펜탄, 벤젠, 시클로헥산, 디에틸 에테르 등이 사용될 수 있으며, 특히 톨루엔이 바람직하다.Toluene, hexane, heptane, pentane, benzene, cyclohexane, diethyl ether, etc. can be used as the reaction solvent, and toluene is particularly preferred.

반응 온도는 약 0 내지 200℃, 바람직하기로는 90 내지 110℃일 수 있다.The reaction temperature can be about 0 to 200°C, preferably 90 to 110°C.

반응 시간은 1 내지 24시간, 바람직하기로는 1 내지 4시간일 수 있다.The reaction time can be from 1 to 24 hours, preferably from 1 to 4 hours.

제2단계: 화학식 6의 화합물의 제조Step 2: Preparation of compound of chemical formula 6

화학식 6의 화합물은 화학식 4의 화합물을 화학식 5의 화합물로 알킬화 반응시켜 제조할 수 있다.The compound of chemical formula 6 can be prepared by alkylating the compound of chemical formula 4 with the compound of chemical formula 5.

상기 화학식 5의 화합물로는 2-(클로로메틸)-1,3-디플루오로벤젠, 2-(브로모메틸)-1,3-디플루오로벤젠, 2-(요오드메틸)-1,3-디플루오로벤젠, 2,6-디플루오로벤질 4-메틸벤젠술폰산, 2,6-디플루오로벤질 메테인술폰산, 2,6-디플루오로벤질 4-니트로벤젠술폰산 등을 사용할 수 있다.Examples of compounds of the above chemical formula 5 that can be used include 2-(chloromethyl)-1,3-difluorobenzene, 2-(bromomethyl)-1,3-difluorobenzene, 2-(iodomethyl)-1,3-difluorobenzene, 2,6-difluorobenzyl 4-methylbenzenesulfonic acid, 2,6-difluorobenzyl methanesulfonic acid, and 2,6-difluorobenzyl 4-nitrobenzenesulfonic acid.

상기 알킬화 반응은 염기의 존재 하에 또는 없이 수행할 수 있다.The above alkylation reaction can be carried out in the presence or absence of a base.

상기 염기는 특별히 제한되지 않으며, 공지의 염기를 사용할 수 있다.The above base is not particularly limited, and any known base can be used.

예를 들어, 상기 염기로는 탄산 나트륨, 탄산 칼륨, 탄산 세슘, 수소화 나트륨, 수소화 칼륨 등을 사용할 수 있으며, 이들은 단독으로 또는 2종 이상 조합하여 사용할 수 있다. 특히, 상기 염기는 탄산 칼륨일 수 있다.For example, the base may include sodium carbonate, potassium carbonate, cesium carbonate, sodium hydride, potassium hydride, etc., and these may be used alone or in combination of two or more. In particular, the base may be potassium carbonate.

상기 알킬화 반응은 촉매의 존재 하에 또는 없이 수행할 수 있다.The above alkylation reaction can be carried out with or without a catalyst.

상기 촉매로는 예를 들어 요오드화 칼륨, 요오드화 나트륨, 요오드화 세슘 등을 사용할 수 있으며, 이들은 단독으로 또는 2종 이상 조합하여 사용할 수 있다. 특히, 상기 촉매는 요오드화 칼륨일 수 있다.Examples of the catalyst that can be used include potassium iodide, sodium iodide, cesium iodide, etc., and these can be used alone or in combination of two or more. In particular, the catalyst can be potassium iodide.

반응은 용매 존재 하에 수행된다. 반응 용매로는 반응이 진행되는 한 그 종류가 특별히 제한되지 않는다.The reaction is carried out in the presence of a solvent. There is no particular limitation on the type of reaction solvent as long as the reaction proceeds.

예를 들어, 상기 반응 용매로는 DMF, DMC, NMP, DMSO, THF 등을 사용할 수 있으며, 바람직하기로는 DMF를 사용할 수 있다.For example, DMF, DMC, NMP, DMSO, THF, etc. can be used as the reaction solvent, and DMF can be preferably used.

반응 온도는 0 내지 100℃일 수 있으며, 바람직하게는 20 내지 30℃일 수 있다.The reaction temperature may be 0 to 100°C, preferably 20 to 30°C.

반응 시간은 일반적으로 1 내지 48시간이며, 바람직하게는 18 내지 24시간일 수 있다.The reaction time is generally 1 to 48 hours, preferably 18 to 24 hours.

제3단계: 화학식 7의 화합물의 제조Step 3: Preparation of compound of chemical formula 7

화학식 7의 화합물은 화학식 6의 화합물을 브로마이드화 반응시켜 제조할 수 있다.The compound of chemical formula 7 can be prepared by bromiding the compound of chemical formula 6.

상기 브로마이드화 반응은 브로마이드화 시약을 사용하여 수행할 수 있다.The above bromide reaction can be performed using a bromide reagent.

상기 브로마이드화 시약으로는 예를 들어 N-브로모석신이미드(N-bromosuccinimide, NBS)를 사용할 수 있다.As the above bromide reagent, for example, N-bromosuccinimide (NBS) can be used.

상기 브로마이드화 시약은 화학식 6의 화합물 1몰에 대하여 1 내지 5몰의 양으로 사용될 수 있다.The above bromide reagent can be used in an amount of 1 to 5 moles per 1 mole of the compound of chemical formula 6.

바람직하게는, 상기 브로마이드화 반응은 라디칼 생성 시약의 촉매량 존재 하에 수행될 수 있다.Preferably, the bromide reaction can be performed in the presence of a catalytic amount of a radical generating reagent.

상기 라디칼 생성 시약으로는 예를 들어 아조비스이소부티로니트릴(AIBN)을 사용할 수 있다.As the radical generating reagent, for example, azobisisobutyronitrile (AIBN) can be used.

상기 라디칼 생성 시약은 화학식 6의 화합물 1몰에 대하여 0.1 내지 0.3몰의 양으로 사용될 수 있다.The above radical generating reagent can be used in an amount of 0.1 to 0.3 mol per 1 mol of the compound of chemical formula 6.

상기 반응 용매로는 에틸 아세테이트, 아세토니트릴, 테트라하이드로퓨란, N,N-디메틸포름아미드, 디메틸설폭사이드, N,N-디메틸아세트아미드, 에틸아세테이트와 아세토니트릴의 혼합 용매 등을 사용할 수 있다. 이때, 에틸아세테이트(EA):아세토니트릴(ACN)는 부피 기준으로 8:1일 수 있다.As the above reaction solvent, ethyl acetate, acetonitrile, tetrahydrofuran, N,N-dimethylformamide, dimethyl sulfoxide, N,N-dimethylacetamide, a mixed solvent of ethyl acetate and acetonitrile, etc. can be used. At this time, ethyl acetate (EA): acetonitrile (ACN) can be 8:1 by volume.

반응 온도는 0℃ 내지 환류 온도일 수 있으며, 바람직하게는 70 내지 80℃일 수 있다.The reaction temperature may be from 0°C to reflux temperature, and preferably from 70 to 80°C.

반응 시간은 3 내지 48시간일 수 있다.Response times can range from 3 to 48 hours.

제4단계: 화학식 8의 화합물의 제조Step 4: Preparation of compound of chemical formula 8

화학식 8의 화합물은 화학식 7의 화합물의 브로마이드를 디메틸아민염과 치환 반응시켜 제조할 수 있다.The compound of chemical formula 8 can be prepared by a substitution reaction of the bromide of the compound of chemical formula 7 with a dimethylamine salt.

상기 치환 반응은 SN2 치환 반응일 수 있다.The above substitution reaction may be an SN2 substitution reaction.

상기 디메틸아민염은 디메틸아민 염화수소, 디메틸아민 브롬화수소 및 디메틸아민 요오드화수소 중 하나 이상일 수 있으며, 바람직하게는 디메틸아민 염화수소일 수 있다.The above dimethylamine salt may be at least one of dimethylamine hydrogen chloride, dimethylamine hydrogen bromide and dimethylamine hydrogen iodide, and preferably dimethylamine hydrogen chloride.

상기 디메틸아민염은 화학식 7의 화합물 1몰에 대하여 2 내지 8몰의 양으로 사용될 수 있다.The above dimethylamine salt can be used in an amount of 2 to 8 moles per 1 mole of the compound of chemical formula 7.

상기 치환 반응은 염기의 존재 하에 또는 없이 수행할 수 있다.The above substitution reaction can be carried out in the presence or absence of a base.

상기 염기는 유기 염기 또는 무기 염기일 수 있다.The above base may be an organic base or an inorganic base.

상기 유기 염기로는 트리에틸아민, 트리부틸아민, 디이소프로필에틸아민, 피리딘 등을 예로 들 수 있으며, 이들은 단독으로 또는 2종 이상 조합하여 사용할 수 있다.Examples of the organic bases include triethylamine, tributylamine, diisopropylethylamine, pyridine, etc., and these may be used alone or in combination of two or more.

상기 무기 염기로는 세슘 탄산염, 칼륨 탄산염, 나트륨 탄산염 등의 알칼리 금속 탄산염; 또는 나트륨 수소화물, 칼륨 수소화물 등의 알칼리 금속 수소화물 등을 예로 들 수 있다. 이들은 단독으로 또는 2종 이상 조합하여 사용할 수 있다.Examples of the above inorganic base include alkali metal carbonates such as cesium carbonate, potassium carbonate, and sodium carbonate; or alkali metal hydrides such as sodium hydride and potassium hydride. These may be used alone or in combination of two or more.

특히, 상기 염기로는 트리에틸아민을 사용하는 것이 바람직하다.In particular, it is preferable to use triethylamine as the base.

상기 염기는 화학식 7의 화합물 1몰에 대하여 4 내지 10몰의 양으로 사용될 수 있다.The above base can be used in an amount of 4 to 10 moles per 1 mole of the compound of chemical formula 7.

반응용매로는 디메틸설폭사이드, N,N-디메틸포름아미드, N,N-디메틸아세트아미드, 테트라하이드로퓨란, 에틸아세테이트, 아세토니트릴, 톨루엔, 클로로포름 등을 사용할 수 있다.Dimethyl sulfoxide, N,N-dimethylformamide, N,N-dimethylacetamide, tetrahydrofuran, ethyl acetate, acetonitrile, toluene, chloroform, etc. can be used as reaction solvents.

반응 온도는 -10℃ 내지 환류 온도일 수 있으며, 바람직하게는 0 내지 실온일 수 있다.The reaction temperature may be -10°C to reflux temperature, and preferably 0 to room temperature.

반응 시간은 10분 내지 30시간일 수 있다.Reaction times can range from 10 minutes to 30 hours.

제5단계: 화학식 9의 화합물 및 이의 HBr 염의 제조Step 5: Preparation of the compound of chemical formula 9 and its HBr salt

화학식 9의 화합물은 화학식 8의 화합물의 니트로기를 환원 반응시켜 제조할 수 있다.The compound of chemical formula 9 can be prepared by reducing the nitro group of the compound of chemical formula 8.

상기 환원 반응은 산 존재 하에 환원제로서 금속을 사용하여 수행할 수 있다.The above reduction reaction can be performed using a metal as a reducing agent in the presence of an acid.

상기 금속으로는 철(Fe), 주석(Sn), 아연(Zn), 구리(Cu) 또는 니켈(Ni)을 사용할 수 있으며, 바람직하기로는 철(Fe)을 사용할 수 있다.The metal used may be iron (Fe), tin (Sn), zinc (Zn), copper (Cu), or nickel (Ni), and iron (Fe) is preferred.

상기 금속은 화학식 8의 화합물 1몰에 대하여 1 내지 5몰, 바람직하기로는 2 내지 3몰의 양으로 사용될 수 있다.The above metal can be used in an amount of 1 to 5 moles, preferably 2 to 3 moles, per 1 mole of the compound of chemical formula 8.

상기 산으로는 염산, 황산, 아세트산, 포름산, 인산, 질산 등을 사용하여 할 수 있으며, 바람직하기로는 염산을 사용할 수 있다.The above acid can be hydrochloric acid, sulfuric acid, acetic acid, formic acid, phosphoric acid, nitric acid, etc., and hydrochloric acid is preferably used.

반응 용매로는 물, 메탄올, 에탄올, 아세트산, 다이옥산, 톨루엔, 염산 등을 사용할 수 있으며, 바람직하기로는 물을 사용할 수 있다.Water, methanol, ethanol, acetic acid, dioxane, toluene, hydrochloric acid, etc. can be used as a reaction solvent, and water is preferred.

반응 온도는 0℃ 내지 환류 온도일 수 있으며, 바람직하게는 실온일 수 있다.The reaction temperature may be 0°C to reflux temperature, and preferably room temperature.

반응 시간은 일반적으로 1 내지 120시간, 바람직하게는 6 내지 14시간일 수 있다.The reaction time can generally be from 1 to 120 hours, preferably from 6 to 14 hours.

화학식 9의 화합물의 HBr 염은 화학식 9의 화합물을 HBr과 반응시켜 제조할 수 있다.The HBr salt of the compound of formula 9 can be prepared by reacting the compound of formula 9 with HBr.

상기 화학식 9의 화합물의 HBr 염은 화학식 9의 화합물의 2HBr 염일 수 있다.The HBr salt of the compound of the above chemical formula 9 may be a 2HBr salt of the compound of the above chemical formula 9.

상기 화학식 9의 화합물의 2HBr 염은 결정형(crystal)일 수 있다.The 2HBr salt of the compound of the above chemical formula 9 may be in a crystal form.

화학식 9의 화합물은 끈적한 특성을 가지고 있으나, 화학식 9의 화합물의 2HBr 염은 결정형이기 때문에 공정시 조작성이 우수하고 순도도 높아져 이를 이용하여 제조되는 렐루골릭스의 순도 및 수율 측면에서도 유리하다.Although the compound of chemical formula 9 has a sticky characteristic, the 2HBr salt of the compound of chemical formula 9 is in a crystalline form, so it has excellent handleability during the process and its purity is also high, which is also advantageous in terms of the purity and yield of relugolix manufactured using it.

제6단계: 화학식 10의 화합물의 제조Step 6: Preparation of compound of chemical formula 10

화학식 10의 화합물은 화학식 9의 화합물 또는 이의 HBr 염을 카르보닐화제 및 메톡시 암모늄 염화물과 염기의 존재 하에 반응시켜 제조할 수 있다.The compound of formula 10 can be prepared by reacting the compound of formula 9 or its HBr salt in the presence of a carbonylating agent and methoxy ammonium chloride and a base.

상기 카르보닐화제는 카르보닐디이미다졸(CDI)일 수 있다.The above carbonylating agent may be carbonyldiimidazole (CDI).

상기 카르보닐화제는 화학식 9의 화합물 또는 이의 HBr 염 1몰에 대하여 1 내지 2몰의 양으로 사용될 수 있다.The above carbonylating agent can be used in an amount of 1 to 2 moles per mole of the compound of chemical formula 9 or its HBr salt.

상기 메톡시 암모늄 염화물은 화학식 9의 화합물 또는 이의 HBr 염 1몰에 대하여 1 내지 2몰의 양으로 사용될 수 있다.The above methoxy ammonium chloride can be used in an amount of 1 to 2 moles per mole of the compound of chemical formula 9 or its HBr salt.

상기 염기로는 트리에틸아민, 디이소프로필에틸아민, 트리부틸아민, 피리딘 등을 사용할 수 있으며, 이들은 단독으로 또는 2종 이상 조합하여 사용할 수 있다. 특히, 상기 염기는 트리에틸아민일 수 있다.As the above base, triethylamine, diisopropylethylamine, tributylamine, pyridine, etc. can be used, and these can be used alone or in combination of two or more. In particular, the base can be triethylamine.

상기 염기는 화학식 9의 화합물 또는 이의 HBr 염 1몰에 대하여 1 내지 5몰, 바람직하기로는 1 내지 2몰의 양으로 사용될 수 있다.The above base can be used in an amount of 1 to 5 moles, preferably 1 to 2 moles, per 1 mole of the compound of chemical formula 9 or its HBr salt.

반응 용매로는 디클로로메탄, 클로로포름, 1,2-디클로로에탄, 에틸아세테이트, 아세토니트릴 등을 사용할 수 있다.Dichloromethane, chloroform, 1,2-dichloroethane, ethyl acetate, acetonitrile, etc. can be used as reaction solvents.

반응 온도는 0℃ 내지 환류 온도일 수 있으며, 바람직하게는 실온일 수 있다.The reaction temperature may be 0°C to reflux temperature, and preferably room temperature.

반응 시간은 10분 내지 24시간, 바람직하게는 10 내지 16시간일 수 있다.The reaction time can be from 10 minutes to 24 hours, preferably from 10 to 16 hours.

제7단계: 화학식 11의 화합물의 제조Step 7: Preparation of compound of chemical formula 11

화학식 11의 화합물은 화학식 10의 화합물을 에스테르 가수분해 반응시켜 제조할 수 있다.The compound of chemical formula 11 can be prepared by ester hydrolysis reaction of the compound of chemical formula 10.

상기 에스테르 가수분해 반응은 염기의 존재 하에 수행될 수 있다.The above ester hydrolysis reaction can be performed in the presence of a base.

상기 염기로는 수산화나트륨, 수산화칼륨, 수산화리튬 등을 사용할 수 있으며, 이들은 단독으로 또는 2종 이상 조합하여 사용할 수 있다. 특히, 상기 염기는 수산화칼륨일 수 있다.As the above base, sodium hydroxide, potassium hydroxide, lithium hydroxide, etc. can be used, and these can be used alone or in combination of two or more. In particular, the base can be potassium hydroxide.

상기 염기는 화학식 10의 화합물 1몰에 대하여 2 내지 10몰, 바람직하게는 5 내지 6몰의 양으로 사용될 수 있다.The above base can be used in an amount of 2 to 10 moles, preferably 5 to 6 moles, per 1 mole of the compound of chemical formula 10.

반응 용매로는 메탄올, 에탄올, 이소프로판올, 아세토니트릴, N,N-디메틸포름아미드, 물, 메탄올과 물의 혼합 용매, 또는 에탄올과 물의 혼합 용매 등을 사용할 수 있으며, 바람직하게는 에탄올과 물의 혼합 용매를 사용할 수 있다.As the reaction solvent, methanol, ethanol, isopropanol, acetonitrile, N,N-dimethylformamide, water, a mixed solvent of methanol and water, or a mixed solvent of ethanol and water can be used, and preferably, a mixed solvent of ethanol and water can be used.

반응 온도는 0℃ 내지 환류 온도일 수 있으며, 바람직하게는 실온일 수 있다.The reaction temperature may be 0°C to reflux temperature, and preferably room temperature.

반응 시간은 30분 내지 36시간, 바람직하게는 12 내지 24시간일 수 있다.The reaction time can be from 30 minutes to 36 hours, preferably from 12 to 24 hours.

제8단계: 화학식 13의 화합물의 제조Step 8: Preparation of compound of chemical formula 13

화학식 13의 화합물은 화학식 11의 화합물을 커플링제 및 염기의 존재 하에 화학식 12의 화합물과 탈수축합 반응시켜 제조할 수 있다.The compound of chemical formula 13 can be prepared by a dehydration condensation reaction of the compound of chemical formula 11 with the compound of chemical formula 12 in the presence of a coupling agent and a base.

상기 커플링제로는 프로판포스폰산 무수물 (propanephosphonic acid anhydride, T3P), 1,3,5,2,4,6-트리옥사트리포스포리네인, 2,4,6-트리부틸-, 2,4,6-트리옥사이드 (1,3,5,2,4,6-Trioxatriphosphorinane, 2,4,6-tributyl-, 2,4,6-trioxide, T4P), 헥사플루오로포스페이트 아자벤조트리아졸 테트라메틸 우로늄 (hexafluorophosphate azabenzotriazole tetramethyl uronium, HATU), 비스(2-옥소-3-옥사졸리디닐)포스핀산 염화물 (bis(2-oxo-3-oxazolidinyl)phosphinic chloride, BOP-Cl) 및 1-에틸-3-(3-디메틸아미노프로필)카보디이미드 하이드로클로라이드 (1-ethyl-3-(3-dimethylaminopropyl)carbodiimide hydrochloride, EDC·HCl)로 구성된 군으로부터 선택되는 하나 이상을 사용할 수 있으며, 바람직하게는 T4P를 사용할 수 있다.The coupling agent includes propanephosphonic acid anhydride (T3P), 1,3,5,2,4,6-trioxatriphosphorinane, 2,4,6-tributyl-, 2,4,6-trioxide (T4P), hexafluorophosphate azabenzotriazole tetramethyl uronium (HATU), bis(2-oxo-3-oxazolidinyl)phosphinic chloride (BOP-Cl), and 1-ethyl-3-(3-dimethylaminopropyl)carbodiimide. At least one selected from the group consisting of hydrochloride (1-ethyl-3-(3-dimethylaminopropyl)carbodiimide hydrochloride, EDC·HCl) can be used, and preferably T4P can be used.

상기 염기는 특별히 제한되지 않으며, 공지의 염기를 사용할 수 있다.The above base is not particularly limited, and any known base can be used.

예를 들어, 상기 염기로는 피리딘, 루티딘, 트리에틸아민, N,N-디이소프로필에틸아민 (DIPEA), t-부틸아민 등을 사용할 수 있다. 이들은 단독으로 또는 2종 이상 조합하여 사용할 수 있다. 특히, 상기 염기는 N,N-디이소프로필에틸아민 (DIPEA)일 수 있다.For example, the base may be pyridine, lutidine, triethylamine, N,N-diisopropylethylamine (DIPEA), t-butylamine, etc. These may be used alone or in combination of two or more. In particular, the base may be N,N-diisopropylethylamine (DIPEA).

상기 화학식 12의 화합물은 화학식 11의 화합물 1몰에 대하여 1 내지 2몰의 양으로 사용될 수 있다.The compound of the above chemical formula 12 can be used in an amount of 1 to 2 moles per 1 mole of the compound of the above chemical formula 11.

상기 커플링제 및 염기는 화학식 11의 화합물 1몰에 대하여 각각 1 내지 3몰 및 1 내지 5몰의 양으로 사용될 수 있다.The above coupling agent and base can be used in amounts of 1 to 3 mol and 1 to 5 mol, respectively, per 1 mol of the compound of chemical formula 11.

반응 용매는 반응이 진행되는 한 그 종류가 특별히 제한되지 않는다.The type of reaction solvent is not particularly limited as long as the reaction proceeds.

예를 들어, 상기 반응 용매로는 디메틸설폭사이드, N,N-디메틸포름아미드, N,N-디메틸아세트아미드, 테트라하이드로퓨란, 아세토니트릴, 디클로로메테인, 클로로포름 등이 있다.For example, the reaction solvents include dimethyl sulfoxide, N,N-dimethylformamide, N,N-dimethylacetamide, tetrahydrofuran, acetonitrile, dichloromethane, chloroform, and the like.

반응 온도는 0℃ 내지 환류 온도일 수 있으며, 바람직하게는 0℃ 내지 실온일 수 있다.The reaction temperature may be from 0°C to reflux temperature, and preferably from 0°C to room temperature.

반응 시간은 10분 내지 36시간일 수 있다.Reaction times can range from 10 minutes to 36 hours.

제9단계: 화학식 1의 렐루골릭스의 제조Step 9: Preparation of relugolix of chemical formula 1

화학식 1의 화합물은 화학식 13의 화합물을 염기의 존재 하에 에스테르 가수분해 반응시킨 후, 고리화 반응시켜 제조할 수 있다.The compound of chemical formula 1 can be prepared by subjecting the compound of chemical formula 13 to an ester hydrolysis reaction in the presence of a base, followed by a cyclization reaction.

상기 염기는 유기 염기 또는 무기 염기일 수 있다.The above base may be an organic base or an inorganic base.

상기 유기 염기로는 나트륨 메톡사이드, 나트륨 에톡사이드, 칼륨 t-부톡사이드 등을 예로 들 수 있다. 이들은 단독으로 또는 2종 이상 조합하여 사용할 수 있다.Examples of the organic bases include sodium methoxide, sodium ethoxide, potassium t-butoxide, etc. These may be used alone or in combination of two or more.

상기 무기 염기로는 세슘 탄산염, 칼륨 탄산염, 나트륨 탄산염 등의 알칼리 금속 탄산염; 또는 나트륨 수산화물, 칼륨 수산화물, 리튬 수산화물 등의 알칼리 금속 수산화물 등을 예로 들 수 있다. 이들은 단독으로 또는 2종 이상 조합하여 사용할 수 있다.Examples of the above inorganic base include alkali metal carbonates such as cesium carbonate, potassium carbonate, and sodium carbonate; or alkali metal hydroxides such as sodium hydroxide, potassium hydroxide, and lithium hydroxide. These may be used alone or in combination of two or more.

특히, 상기 염기로는 나트륨 메톡사이드를 사용하는 것이 바람직하다.In particular, it is preferable to use sodium methoxide as the base.

반응 용매로는 메탄올, 에탄올, 아세토니트릴, 테트라하이드로퓨란, 물 등이 사용될 수 있다.Methanol, ethanol, acetonitrile, tetrahydrofuran, water, etc. can be used as reaction solvents.

반응 온도는 0℃ 내지 환류 온도일 수 있으며, 바람직하게는 20℃ 내지 30℃일 수 있다.The reaction temperature may be from 0°C to reflux temperature, and preferably from 20°C to 30°C.

반응 시간은 30분 내지 24시간일 수 있다.Response times can range from 30 minutes to 24 hours.

상기 화학식 1의 화합물은 결정형일 수 있다.The compound of the above chemical formula 1 may be in crystalline form.

본 발명의 일 실시형태는 상기 화학식 9의 화합물의 HBr 염의 제조방법에 관한 것으로, 본 발명의 일 실시형태에 따른 제조방법은One embodiment of the present invention relates to a method for producing an HBr salt of the compound of the above chemical formula 9, and the production method according to one embodiment of the present invention is

(i) 하기 화학식 2의 화합물을 하기 화학식 3의 화합물과 아미드 결합 반응시켜 하기 화학식 4의 화합물을 수득하는 단계;(i) a step of obtaining a compound of the following chemical formula 4 by subjecting a compound of the following chemical formula 2 to an amide bond reaction with a compound of the following chemical formula 3;

(ii) 하기 화학식 4의 화합물을 하기 화학식 5의 화합물로 알킬화 반응시켜 하기 화학식 6의 화합물을 수득하는 단계;(ii) a step of subjecting a compound of chemical formula 4 below to an alkylation reaction with a compound of chemical formula 5 below to obtain a compound of chemical formula 6 below;

(iii) 하기 화학식 6의 화합물을 브로마이드화 반응시켜 하기 화학식 7의 화합물을 수득하는 단계;(iii) a step of obtaining a compound of chemical formula 7 by subjecting a compound of chemical formula 6 to a bromide reaction;

(iv) 하기 화학식 7의 화합물의 브로마이드를 디메틸아민염과 치환 반응시켜 하기 화학식 8의 화합물을 수득하는 단계; 및 (iv) a step of obtaining a compound of the following chemical formula 8 by substitution reaction of the bromide of the compound of the following chemical formula 7 with a dimethylamine salt; and

(v) 하기 화학식 8의 화합물의 니트로기를 환원 반응시키고 HBr과 반응시키는 단계를 포함한다.(v) a step of reducing the nitro group of the compound of the following chemical formula 8 and reacting it with HBr.

[화학식 2][Chemical formula 2]

Figure PCTKR2024096649-appb-img-000017
Figure PCTKR2024096649-appb-img-000017

[화학식 3][Chemical Formula 3]

Figure PCTKR2024096649-appb-img-000018
Figure PCTKR2024096649-appb-img-000018

[화학식 4][Chemical Formula 4]

Figure PCTKR2024096649-appb-img-000019
Figure PCTKR2024096649-appb-img-000019

[화학식 5][Chemical Formula 5]

Figure PCTKR2024096649-appb-img-000020
Figure PCTKR2024096649-appb-img-000020

[화학식 6][Chemical formula 6]

Figure PCTKR2024096649-appb-img-000021
Figure PCTKR2024096649-appb-img-000021

[화학식 7][Chemical formula 7]

Figure PCTKR2024096649-appb-img-000022
Figure PCTKR2024096649-appb-img-000022

[화학식 8][Chemical formula 8]

Figure PCTKR2024096649-appb-img-000023
Figure PCTKR2024096649-appb-img-000023

[화학식 9][Chemical formula 9]

Figure PCTKR2024096649-appb-img-000024
Figure PCTKR2024096649-appb-img-000024

상기 단계 (i) 내지 (v)는 상기 화학식 1의 렐루골릭스의 제조방법에서 설명한 단계 (i) 내지 (v)와 동일한 바, 구체적인 설명을 생략한다.The above steps (i) to (v) are the same as steps (i) to (v) described in the method for manufacturing relugolix of the above chemical formula 1, and thus a detailed description is omitted.

본 발명의 일 실시형태는 렐루골릭스의 제조 중간체인 하기 화학식 9의 화합물의 HBr 염에 관한 것이다.One embodiment of the present invention relates to an HBr salt of a compound of the following chemical formula 9, which is an intermediate for producing relugolix.

[화학식 9][Chemical formula 9]

Figure PCTKR2024096649-appb-img-000025
Figure PCTKR2024096649-appb-img-000025

상기 화학식 9의 화합물의 HBr 염은 상기 화학식 1의 렐루골릭스의 제조방법에서 설명한 바와 동일하다.The HBr salt of the compound of the above chemical formula 9 is the same as that described in the method for preparing relugolix of the above chemical formula 1.

본 발명의 제조방법에 따르면, 고순도의 렐루골릭스를 고수율로 경제적으로 제조할 수 있다.According to the manufacturing method of the present invention, high-purity relugolix can be manufactured economically with a high yield.

도 1은 화학식 9의 화합물의 2HBr 염의 X선 분말 회절도이다.Figure 1 is an X-ray powder diffraction diagram of the 2HBr salt of the compound of chemical formula 9.

도 2는 화학식 1의 화합물의 X선 분말 회절도이다.Figure 2 is an X-ray powder diffraction diagram of the compound of chemical formula 1.

이하, 실시예에 의해 본 발명을 보다 구체적으로 설명하고자 한다. 이들 실시예는 오직 본 발명을 설명하기 위한 것으로 본 발명의 범위가 이들 실시예에 국한되지 않는다는 것은 당업자에게 있어서 자명하다.Hereinafter, the present invention will be described more specifically by examples. It will be apparent to those skilled in the art that these examples are only for the purpose of explaining the present invention and that the scope of the present invention is not limited to these examples.

실시예 1: 화학식 4의 화합물의 제조Example 1: Preparation of a compound of chemical formula 4

화학식 2의 화합물 (200g)의 톨루엔 (600 mL) 용액에 화학식 3의 화합물로서 메틸 클로로포르메이트 (124g)를 90 내지 100℃에서 점적으로 첨가하고, 화학식 2의 화합물이 1% 미만 남을 때까지(HPLC) 반응 혼합물을 교반하였다. 반응 혼합물을 60 내지 70℃로 냉각한 후 에탄올을 점적으로 첨가하였다(1800 mL). 반응 혼합물을 0 내지 10℃로 냉각하고 이 온도에서 1시간 동안 교반하였다. 반응 혼합물을 여과하고, 케이크를 1000 mL 에탄올로 세척하였다. 세척된 반응 생성물을 진공 하에서 건조하여 화학식 4의 화합물 232.5 g을 얻었다(수율: 97.8%, 순도: 96.87%).Methyl chloroformate (124 g) as a compound of formula 3 was added dropwise to a solution of the compound of formula 2 (200 g) in toluene (600 mL) at 90 to 100°C, and the reaction mixture was stirred until less than 1% of the compound of formula 2 remained (HPLC). The reaction mixture was cooled to 60 to 70°C, and ethanol was added dropwise (1800 mL). The reaction mixture was cooled to 0 to 10°C and stirred at that temperature for 1 hour. The reaction mixture was filtered, and the cake was washed with 1000 mL of ethanol. The washed reaction product was dried under vacuum to obtain 232.5 g of the compound of formula 4 (yield: 97.8%, purity: 96.87%).

1H NMR (400 MHz, CDCl3) δ ppm: 1.46 (t, J = 7.1 Hz, 3H), 2.46 (s, 3H), 3.91 (s, 3H), 4.43 (q, J = 7.1 Hz, 2H), 7.60 (d, J = 8.8 Hz, 2H), 8.31 (d, J = 8.8 Hz, 2H), 10.73 (s, 1H). 1 H NMR (400 MHz, CDCl 3 ) δ ppm: 1.46 (t, J = 7.1 Hz, 3H), 2.46 (s, 3H), 3.91 (s, 3H), 4.43 (q, J = 7.1 Hz, 2H), 7.60 (d, J = 8.8 Hz, 2H), 8.31 (d, J = 8.8 Hz, 2H), 10.73 (s, 1H).

실시예 2: 화학식 6의 화합물의 제조Example 2: Preparation of compound of chemical formula 6

화학식 4의 화합물 (55.4g)의 DMF (277~388 mL) 용액에 화학식 5의 화합물로서 2-(클로로메틸)-1,3-디플루오로벤젠 (27.2g), KI (27.76g), K2CO3 (25.22g)를 첨가하고, 20 내지 30℃에서 20 내지 22시간 동안 반응 혼합물을 교반하였다. 에틸 아세테이트 (EtOAc, 443 mL)와 물 (554 mL)을 첨가하고 층을 분리하였다. 수성 층은 에틸 아세테이트 (443 mL)로 추가로 추출하였다. 유기 추출물을 합하여 물 (443 mL × 2)로 세척한 후, 유기 층을 진공 하에서 166 mL로 농축하였다. 그런 다음 20 내지 30℃로 냉각하였다. 20 내지 30℃에서 헵탄 (166 mL)을 첨가하고 1시간 동안 교반하였다. 반응 혼합물을 여과하고 고체를 헵탄/에틸 아세테이트 (1:1, v/v) 110 mL 로 세척하였다. 고체를 수집한 다음 진공 하에서 건조하여 화학식 6의 화합물 63g을 얻었다(수율: 85%, 순도: 99.88%).To a solution of the compound of formula 4 (55.4 g) in DMF (277-388 mL) were added 2-(chloromethyl)-1,3-difluorobenzene (27.2 g), KI (27.76 g), and K 2 CO 3 (25.22 g) as the compound of formula 5, and the reaction mixture was stirred at 20-30 °C for 20-22 hours. Ethyl acetate (EtOAc, 443 mL) and water (554 mL) were added, and the layers were separated. The aqueous layer was further extracted with ethyl acetate (443 mL). The organic extracts were combined, washed with water (443 mL × 2), and the organic layer was concentrated under vacuum to 166 mL. It was then cooled to 20-30 °C. Heptane (166 mL) was added at 20-30 °C and stirred for 1 hour. The reaction mixture was filtered, and the solid was washed with 110 mL of heptane/ethyl acetate (1:1, v/v). The solid was collected and dried under vacuum to obtain 63 g of the compound of formula 6 (yield: 85%, purity: 99.88%).

1H NMR (400 MHz, CDCl3) δ ppm: 1.47 (t, J = 7.6 Hz, 3H), 2.46 (s, 3H), 3.76 (s, 3H), 4.30 (q, J = 7.6 Hz, 2H), 5.02 (s, 2H), 6.87-6.93 (m, 2H), 7.29-7.33 (m, 1H), 7.56 (d, J = 8.8 Hz, 2H), 8.30 (d, J = 8.8 Hz, 2H). 1 H NMR (400 MHz, CDCl 3 ) δ ppm: 1.47 (t, J = 7.6 Hz, 3H), 2.46 (s, 3H), 3.76 (s, 3H), 4.30 (q, J = 7.6 Hz, 2H), 5.02 (s, 2H), 6.87-6.93 (m, 2H), 7.29-7.33 (m, 1H), 7.56 (d, J = 8.8 Hz, 2H), 8.30 (d, J = 8.8 Hz, 2H).

실시예 3: 화학식 7의 화합물의 제조Example 3: Preparation of a compound of chemical formula 7

화학식 6의 화합물 (198.8g)의 에틸 아세테이트 (1600 mL) 및 아세토니트릴 (200 mL) 용액에 N-브로모석신이미드 (NBS, 108.2g)와 아조비스이소부티로니트릴 (AIBN, 6.66g)을 첨가한 후, 반응 혼합물을 70 내지 75℃까지 가열하고 5시간 동안 교반하였다. 반응 혼합물에 5% 염산 (수용액, 600 mL), 5% 탄산나트륨 (수용액, 600 mL), 및 물 (600 mL)을 첨가한 후 층을 분리하였다. 얻어진 유기 층을 별도의 분리 정제 과정 없이 후속 단계에 사용하였다.N-bromosuccinimide (NBS, 108.2 g) and azobisisobutyronitrile (AIBN, 6.66 g) were added to a solution of the compound of chemical formula 6 (198.8 g) in ethyl acetate (1600 mL) and acetonitrile (200 mL), and the reaction mixture was heated to 70 to 75°C and stirred for 5 hours. 5% hydrochloric acid (aqueous solution, 600 mL), 5% sodium carbonate (aqueous solution, 600 mL), and water (600 mL) were added to the reaction mixture, and the layers were separated. The obtained organic layer was used in the subsequent step without a separate separation and purification process.

실시예 4: 화학식 8의 화합물의 제조Example 4: Preparation of a compound of chemical formula 8

디메틸아민 염화수소 (132g)의 아세토니트릴 (MeCN, 660mL) 용액에 트리에틸아민 (120g)을 첨가하고 반응 혼합물을 0 내지 5℃까지 냉각하였다. 이 반응 혼합물에 상기 실시예 3에서 얻은 유기층을 0 내지 5℃에서 점적으로 첨가한 후, 14시간 동안 교반하였다. 반응 혼합물을 여과한 후 진공 하에서 농축하였다. 농축된 유기 잔여물에 MTBE (1320mL)을 첨가하고, 물 (1320mL)을 추가로 첨가하고 10분 동안 교반하였다. 유기층을 분리하고, 유기층에 2M HCl (수용액, 260 mL)을 첨가한 다음 층을 분리하였다. 수용층에 NaHCO3 (9%, 수용액, 1320mL)를 추가한 다음, 에틸 아세테이트 (1320mL)를 추가하고 10분 동안 교반하였다. 층 분리를 하고, 유기층을 진공 하에서 건조하여 화학식 8의 화합물 202.84 g을 얻었다. (수율: 93.8%, 순도: 95.92%).Triethylamine (120 g) was added to a solution of dimethylamine hydrogen chloride (132 g) in acetonitrile (MeCN, 660 mL), and the reaction mixture was cooled to 0 to 5°C. The organic layer obtained in Example 3 was added dropwise to the reaction mixture at 0 to 5°C, and the mixture was stirred for 14 hours. The reaction mixture was filtered and concentrated under vacuum. MTBE (1320 mL) was added to the concentrated organic residue, and water (1320 mL) was further added, and the mixture was stirred for 10 minutes. The organic layer was separated, and 2 M HCl (aqueous solution, 260 mL) was added to the organic layer, and the layers were separated. NaHCO 3 (9%, aqueous solution, 1320 mL) was added to the aqueous layer, and then ethyl acetate (1320 mL) was added, and the mixture was stirred for 10 minutes. The layers were separated, and the organic layer was dried under vacuum to obtain 202.84 g of the compound of chemical formula 8. (Yield: 93.8%, purity: 95.92%).

1H NMR (400 MHz, CDCl3) δ ppm: 8.29 - 8.19 (m, 2H), 7.69 - 7.61 (m, 2H), 7.32 - 7.19 (m, 1H), 6.92 - 6.80 (m, 2H), 5.09 - 4.95 (m, 2H), 5.03 (s, 2H), 4.24 (q, J = 5.6 Hz, 2H), 3.81 (s, 3H), 3.71 (brs, 3H), 3.50 (s, 2H), 2.03 (s, 6H), 1.31 (t, J = 5.6 Hz, 3H). 1 H NMR (400 MHz, CDCl 3 ) δ ppm: 8.29 - 8.19 (m, 2H), 7.69 - 7.61 (m, 2H), 7.32 - 7.19 (m, 1H), 6.92 - 6.80 (m, 2H), 5.09 - 4.95 (m, 2H), 5.03 (s, 2H), 4.24 (q, J = 5.6 Hz, 2H), 3.81 (s, 3H), 3.71 (brs, 3H), 3.50 (s, 2H), 2.03 (s, 6H), 1.31 (t, J = 5.6 Hz, 3H).

실시예 5: 화학식 9의 화합물 및 이의 2HBr 염의 제조Example 5: Preparation of a compound of chemical formula 9 and its 2HBr salt

화학식 8의 화합물 (230.06 g)에 4M 염산 (HCl 수용액, 1380mL)을 첨가하고 10분 동안 교반하였다. 철 (Fe, 3.4 eq.)을 첨가하고 12 시간 동안 교반하였다. 반응 혼합물에 4M NaOH (수용액, 1750mL)를 첨가하여 pH를 8~9로 조절하고, 반응 혼합물을 셀라이트(Celite)로 여과한 후 셀라이트를 에틸 아세테이트 (460mL) 로 세척하였다. 여과액에 에틸 아세테이트(1150mL)를 첨가한 후, 층을 분리하여 유기층을 진공 하에서 건조하여 화학식 9의 화합물 190.0g을 얻었다(수율: 87.5%, 순도: 96.61%).To the compound of chemical formula 8 (230.06 g) was added 4 M hydrochloric acid (HCl aqueous solution, 1380 mL) and stirred for 10 minutes. Iron (Fe, 3.4 eq.) was added and stirred for 12 hours. 4 M NaOH (aqueous solution, 1750 mL) was added to the reaction mixture to adjust the pH to 8–9, the reaction mixture was filtered through Celite, and the Celite was washed with ethyl acetate (460 mL). Ethyl acetate (1150 mL) was added to the filtrate, the layers were separated, and the organic layer was dried under vacuum to obtain 190.0 g of the compound of chemical formula 9 (yield: 87.5%, purity: 96.61%).

화학식 9의 화합물(190.0g)에 에틸 아세테이트(1900mL)를 첨가한후 HBr 용액(48% 수용액, 2.5 eq.)을 첨가하고 10분 동안 교반하였다. 이어서 이소프로필알콜(950 mL)를 첨가하고 7시간 동안 교반한 후 반응 혼합물을 0℃로 냉각하고 1 시간 동안 교반하였다. 반응 혼합물을 여과하고 고체를 이소프로필알콜(570 mL)로 세척한 후 진공 하에서 건조하여 화학식 9의 화합물의 2HBr 염 249.4 g을 얻었다 (수율: 96.2%, 순도: 99.345%).To the compound of chemical formula 9 (190.0 g) was added ethyl acetate (1900 mL), followed by adding HBr solution (48% aqueous solution, 2.5 eq.) and stirring for 10 minutes. Then, isopropyl alcohol (950 mL) was added and stirred for 7 hours, and the reaction mixture was cooled to 0°C and stirred for 1 hour. The reaction mixture was filtered, and the solid was washed with isopropyl alcohol (570 mL) and dried under vacuum to obtain 249.4 g of the 2HBr salt of the compound of chemical formula 9 (yield: 96.2%, purity: 99.345%).

1H NMR (400 MHz, DMSO, d 6) δ ppm: 7.49 - 7.37 (m, 1H), 7.07 (t, J = 8.0 Hz, 2H), 7.02 (d, J = 8.4 Hz, 2H), 6.59 (d, J = 8.4 Hz, 2H), 5.40 (s, 2H), 4.92 (s, 2H), 4.13 (q, J = 7.2 Hz, 2H), 3.61 (s, 3H), 3.39 (s, 2H), 1.94 (s, 6H), 1.23 (t, J = 7.2 Hz 3H). 1 H NMR (400 MHz, DMSO, d 6 ) δ ppm: 7.49 - 7.37 (m, 1H), 7.07 (t, J = 8.0 Hz, 2H), 7.02 (d, J = 8.4 Hz, 2H), 6.59 (d, J = 8.4 Hz, 2H), 5.40 (s, 2H), 4.92 (s, 2H), 4.13 (q, J = 7.2 Hz, 2H), 3.61 (s, 3H), 3.39 (s, 2H), 1.94 (s, 6H), 1.23 (t, J = 7.2 Hz 3H).

상기 화학식 9의 화합물의 2HBr 염의 X선 분말 회절 분석을 수행하여 그 결과를 하기 표 1 및 도 1에 나타내었다.X-ray powder diffraction analysis of the 2HBr salt of the compound of the above chemical formula 9 was performed, and the results are shown in Table 1 and Figure 1 below.

도 1의 X선 분말 회절도에 나타난 특징적인 피크(peak)를 하기 표 1에 나타내었으며, 여기서 ‘2θ’는 회절각을, ‘I/I0'는 피크(peak)의 상대강도를 의미한다. 회절각은 ±0.2°편차 범위를 갖는다.The characteristic peaks that appear in the X-ray powder diffraction diagram of Fig. 1 are shown in Table 1 below, where '2θ' represents the diffraction angle and 'I/I 0 ' represents the relative intensity of the peak. The diffraction angle has a deviation range of ±0.2°.

상기 X선 분말 회절 분석을 통해, 상기 수득된 화학식 9의 화합물의 2HBr 염이 결정형임을 확인하였다.Through the above X-ray powder diffraction analysis, it was confirmed that the 2HBr salt of the compound of chemical formula 9 obtained above was in crystalline form.

회절각(2θ)Diffraction angle (2θ) I/Io (%)I/I o (%) 11 8.38.3 10.710.7 22 8.98.9 29.129.1 33 9.19.1 22.922.9 44 10.810.8 72.672.6 55 11.711.7 16.416.4 66 12.112.1 83.183.1 77 12.812.8 52.252.2 88 13.713.7 6.26.2 99 14.214.2 31.031.0 1010 14.914.9 13.013.0 1111 15.315.3 38.838.8 1212 16.516.5 16.116.1 1313 17.017.0 18.618.6 1414 17.817.8 70.770.7 1515 17.917.9 38.638.6 1616 19.119.1 82.582.5 1717 19.519.5 99.899.8 1818 20.420.4 34.134.1 1919 20.720.7 19.319.3 2020 21.321.3 72.572.5 2121 21.521.5 40.540.5 2222 21.821.8 8.18.1 2323 22.322.3 16.516.5 2424 23.323.3 51.651.6 2525 24.024.0 24.724.7 2626 24.424.4 100100 2727 25.125.1 19.819.8 2828 25.525.5 21.421.4 2929 25.725.7 21.221.2 3030 26.526.5 91.291.2 3131 17.217.2 33.333.3 3232 27.527.5 30.530.5 3333 28.928.9 13.413.4 3434 29.629.6 20.220.2 3535 30.330.3 27.527.5 3636 30.830.8 13.313.3 3737 31.531.5 15.715.7 3838 32.232.2 12.912.9 3939 33.333.3 25.225.2 4040 33.433.4 14.714.7 4141 35.335.3 10.710.7 4242 37.337.3 12.112.1 4343 37.737.7 18.218.2 4444 38.538.5 15.115.1

실시예 6: 화학식 10의 화합물의 제조Example 6: Preparation of a compound of chemical formula 10

메톡시 암모늄 클로라이드 (methoxy ammonium chloride, MOAc) (1.5 eq.)의 디클로로메탄 (DCM, 180 mL) 용액에 트리에틸아민 (Et3N, 1.5 eq.)을 첨가하고, 20 내지 30℃에서 질소 충진하여 카르보디이미드 (CDI, 1.4 eq.)를 첨가하고 반응 혼합물을 20 내지 30℃에서 2시간 동안 교반하였다. 이어 화학식 9의 화합물의 2HBr 염 (45.2g)을 첨가하고 7시간 동안 교반하였다. 반응 혼합물에 물 (226 mL)을 첨가하고 층을 분리한 후, 유기층을 다시 물 (226mL)로 세척하였다. 유기층을 따로 두고, 수층을 합하여 디클로로메탄 (DCM, 226mL)으로 추출하였다. 유기 추출물을 합한 후 농축하여 화학식 10의 화합물 37.6g을 얻었다(수율: 96%, 순도: 98.813%).To a solution of methoxy ammonium chloride (MOAc) (1.5 eq.) in dichloromethane (DCM, 180 mL) was added triethylamine (Et 3 N, 1.5 eq.), the mixture was filled with nitrogen at 20 to 30 °C, carbodiimide (CDI, 1.4 eq.) was added, and the reaction mixture was stirred at 20 to 30 °C for 2 hours. Then, 2HBr salt (45.2 g) of the compound of formula 9 was added and stirred for 7 hours. Water (226 mL) was added to the reaction mixture, and the layers were separated, and the organic layer was washed again with water (226 mL). The organic layer was set aside, the aqueous layers were combined, and extracted with dichloromethane (DCM, 226 mL). After combining the organic extracts, concentration was performed to obtain 37.6 g of the compound of chemical formula 10 (yield: 96%, purity: 98.813%).

1H NMR (400 MHz, CD3Cl) δ ppm: 7.61 (s, 1H), 7.51 (d, J = 8.6 Hz, 2H), 7.36 (d, J = 8.6 Hz, 2H), 7.25 - 7.21 (m, 1H), 6.96 - 6.72 (m, 2H), 5.02 (s, 2H), 4.23 (q, J = 7.1 Hz, 2H), 4.12 (p, J = 7.0 Hz, 1H), 3.81 (s, 4H), 3.72 (dd, J = 31.4, 11.2 Hz, 3H), 3.50 (s, 2H), 2.04 (d, J = 9.6 Hz, 7H), 1.65 (s, 2H), 1.31 (t, J = 7.1 Hz, 3H), 1.26 (t, J = 7.1 Hz, 1H). 1 H NMR (400 MHz, CD 3 Cl) δ ppm: 7.61 (s, 1H), 7.51 (d, J = 8.6 Hz, 2H), 7.36 (d, J = 8.6 Hz, 2H), 7.25 - 7.21 (m, 1H), 6.96 - 6.72 (m, 2H), 5.02 (s, 2H), 4.23 (q, J = 7.1 Hz, 2H), 4.12 (p, J = 7.0 Hz, 1H), 3.81 (s, 4H), 3.72 (dd, J = 31.4, 11.2 Hz, 3H), 3.50 (s, 2H), 2.04 (d, J = 9.6 Hz, 7H), 1.65 (s, 2H), 1.31 (t, J = 7.1 Hz, 3H), 1.26 (t, J = 7.1 Hz, 1H).

실시예 7: 화학식 11의 화합물의 제조Example 7: Preparation of a compound of chemical formula 11

화학식 10의 화합물 56g의 물 (H2O, 170 mL) 및 에탄올 (EtOH, 170 mL) 용액에 수산화칼륨 (KOH, 30.22g)을 첨가하고 반응 혼합물을 10 내지 20℃로 가열하여 17시간 동안 교반하였다. 반응 혼합물을 진공 하에서 농축하여 에탄올을 제거한 후 물을 첨가하고 이소프로필 아세테이트 (IPAc, ×3)로 추출하였다. 층을 분리한 후, 수용층의 pH를 1N 염산을 사용하여 5 내지 6으로 조정하였다. 수용층을 디클로로메탄 (DCM, 448 mL ×3)으로 추출한 후, 유기 추출물을 합한 다음 물 (280 mL)을 첨가하여 원하는 화학식 11의 화합물을 응고시켰다. 전체 혼합물을 여과하여 고체를 건조시켜 화학식 11의 화합물 33.9g을 얻었다(수율: 63%, 순도: 93.80%).Potassium hydroxide (KOH, 30.22 g) was added to a solution of 56 g of the compound of chemical formula 10 in water (H 2 O, 170 mL) and ethanol (EtOH, 170 mL), and the reaction mixture was heated to 10 to 20 °C and stirred for 17 hours. The reaction mixture was concentrated in vacuo to remove ethanol, water was added, and then extracted with isopropyl acetate (IPAc, × 3). After separating the layers, the pH of the aqueous layer was adjusted to 5 to 6 using 1 N hydrochloric acid. The aqueous layer was extracted with dichloromethane (DCM, 448 mL × 3), the organic extracts were combined, and then water (280 mL) was added to precipitate the desired compound of chemical formula 11. The entire mixture was filtered, and the solid was dried to obtain 33.9 g of the compound of chemical formula 11 (yield: 63%, purity: 93.80%).

1H NMR (400 MHz, DMSO, d 6) δ ppm: 9.90 (s, 1H), 9.36 (s, 1H), 7.69 (d, J = 8.0 Hz, 2H), 7.45 - 7.37 (m, 1H), 7.16 (d, J = 8.0 Hz, 2H), 7.08 - 7.02 (m, 2H), 4.94 (brs, 2H), 3.90 (s, 2H), 3.90 (s, 2H), 3.65 (d, J = 13.1 Hz, 3H), 3.64 (s, 3H), 3.58 (s, 3H), 2.41 (s, 6H). 1 H NMR (400 MHz, DMSO, d 6 ) δ ppm: 9.90 (s, 1H), 9.36 (s, 1H), 7.69 (d, J = 8.0 Hz, 2H), 7.45 - 7.37 (m, 1H), 7.16 (d, J = 8.0 Hz, 2H), 7.08 - 7.02 (m, 2H), 4.94 (brs, 2H), 3.90 (s, 2H), 3.90 (s, 2H), 3.65 (d, J = 13.1 Hz, 3H), 3.64 (s, 3H), 3.58 (s, 3H), 2.41 (s, 6H).

실시예 8: 화학식 13의 화합물의 제조Example 8: Preparation of compound of chemical formula 13

화학식 11의 화합물 33.9g의 N,N-디메틸아세트아미드 (DMAc, 100 mL) 용액에 N,N-디이소프로필에틸아민 (DIPEA, 3eq.)과 화학식 12의 화합물 (1.5 eq.)을 첨가하고, 반응 혼합물을 40 내지 50℃로 가열하였다. 이어 50% T4P 용액 (EtOAc, 2eq.)을 같은 온도에서 천천히 첨가하고 3시간 동안 교반하였다. 반응 혼합물의 pH를 8 내지 9로 조정하기 위해 10% 탄산칼륨 (K2CO3) 수용액을 첨가한 후, 에틸 아세테이트 (EtOAc)로 두 번 추출하였다. 층을 분리한 후, 합쳐진 유기 추출물을 물로 두 번 세척한 다음, 유기 층을 200mL 로 농축하였다. 농축된 혼합물을 여과한 후, 고체를 진공 하에서 건조시켜 화학식 13의 화합물 32.3g을 얻었다(수율: 79.7%, 순도: 92.98%).N,N-diisopropylethylamine (DIPEA, 3 eq.) and the compound of formula 12 (1.5 eq.) were added to a solution of 33.9 g of the compound of formula 11 in N,N-dimethylacetamide (DMAc, 100 mL), and the reaction mixture was heated to 40 to 50 °C. Then, a 50% T4P solution (EtOAc, 2 eq.) was slowly added at the same temperature, and the mixture was stirred for 3 hours. To adjust the pH of the reaction mixture to 8 to 9, a 10% aqueous potassium carbonate (K 2 CO 3 ) solution was added, and the mixture was extracted twice with ethyl acetate (EtOAc). After separating the layers, the combined organic extracts were washed twice with water, and the organic layer was concentrated to 200 mL. After filtering the concentrated mixture, the solid was dried under vacuum to obtain 32.3 g of the compound of chemical formula 13 (yield: 79.7%, purity: 92.98%).

1H NMR (400 MHz, DMSO, d 6) δ ppm: 13.97 (s, 1H), 9.66 (s, 1H), 9.11 (s, 1H), 8.36 (d, J = 8 Hz, 2H), 7.72 (d, J = 8 Hz, 2H), 7.28 (d, J = 8 Hz, 4H), 7.21 (d, J = 8 Hz, 4H), 6.96 - 6.97 (t, J = 6 Hz, 2H), 4.87 (s,2H), 4.09 (s,3H), 3.64 (s, 4H), 3.53 (s, 2H), 2.11 (s, 6H). 1H NMR (400 MHz, DMSO, d 6 ) δ ppm: 13.97 (s, 1H), 9.66 (s, 1H), 9.11 (s, 1H), 8.36 (d, J = 8 Hz, 2H), 7.72 (d, J = 8 Hz, 2H), 7.28 (d, J = 8) Hz, 4H), 7.21 (d, J = 8 Hz, 4H), 6.96 - 6.97 (t, J = 6 Hz, 2H), 4.87 (s,2H), 4.09 (s,3H), 3.64 (s, 4H), 3.53 (s, 2H), 2.11 (s, 6H).

실시예 9: 화학식 1의 화합물의 제조Example 9: Preparation of the compound of chemical formula 1

화학식 13의 화합물 32.3g의 메탄올 (MeOH, 130 mL) 용액에 30% 나트륨 메톡사이드 (MeONa) 메탄올 용액 (1.5 eq.)을 첨가하고, 20 내지 30℃에서 2시간 동안 반응 혼합물을 교반하였다. 반응 혼합물에 에틸 아세테이트 (EtOAc) 중 2M 염산 (HCl)을 첨가하여 pH를 3 내지 4로 조정하였다. 그런 다음, 10% 탄산 칼륨 (K2CO3) 수용액을 첨가하여 pH를 8 내지 9로 조정하였다. 반응 혼합물을 농축하여 유기 용매를 제거하고, 수성 잔여물에 디클로로메탄 (DCM, 160 mL)을 첨가하였다. 그리고 유기 층을 분리하였다. 유기 층을 물 (160 mL)로 두 번 세척한 후, 합한 유기 추출물을 농축하였다. 유기 농축물에 에틸아세테이트 (EtOAc, 33 mL)를 첨가하고, 15 내지 25℃에서 1시간 동안 교반하였다. 반응 혼합물을 여과하고, 여과액을 농축하여 크로마토그래피로 정제하여 화학식 1의 화합물 19.9g을 얻었다(수율: 64.8%, 순도: 98.95%).To a solution of 32.3 g of the compound of chemical formula 13 in methanol (MeOH, 130 mL) was added a 30% sodium methoxide (MeONa) methanol solution (1.5 eq.), and the reaction mixture was stirred at 20 to 30°C for 2 hours. 2 M hydrochloric acid (HCl) in ethyl acetate (EtOAc) was added to the reaction mixture to adjust the pH to 3 to 4. Then, a 10% potassium carbonate (K 2 CO 3 ) aqueous solution was added to adjust the pH to 8 to 9. The reaction mixture was concentrated to remove the organic solvent, and dichloromethane (DCM, 160 mL) was added to the aqueous residue. Then, the organic layer was separated. The organic layer was washed twice with water (160 mL), and the combined organic extracts were concentrated. Ethyl acetate (EtOAc, 33 mL) was added to the organic concentrate, and the mixture was stirred at 15 to 25°C for 1 hour. The reaction mixture was filtered, and the filtrate was concentrated and purified by chromatography to obtain 19.9 g of the compound of chemical formula 1 (yield: 64.8%, purity: 98.95%).

1H NMR (400 MHz, DMSO, d 6) δ ppm: 2.06 (s, 6H), 3.54 (s, 1H), 3.65 (s, 4H), 4.11 (s, 3H), 5.30 (dd, J 1 = 36 Hz, J 2 = 16 Hz 2H), 7.13 - 7.19 (m, 2H), 7.45 - 7.51 (m, 2H), 7.54 (d, J = 8 Hz, 2H), 7.74 (d, J = 8 Hz, 2H), 7.77 (d, J = 8 Hz, 2H), 9.10 (s, 1H), 9.65 (s, 1H). 1 H NMR (400 MHz, DMSO, d 6 ) δ ppm: 2.06 (s, 6H), 3.54 (s, 1H), 3.65 (s, 4H), 4.11 (s, 3H), 5.30 (dd, J 1 = 36 Hz, J 2 = 16 Hz 2H), 7.13 - 7.19 (m, 2H), 7.45 - 7.51 (m, 2H), 7.54 (d, J = 8 Hz, 2H), 7.74 (d, J = 8 Hz, 2H), 7.77 (d, J = 8 Hz, 2H), 9.10 (s, 1H), 9.65 (s, 1H).

13C NMR (400 MHz, DMSO, d 6) δ: 41.34, 44.94, 53.21, 55.41, 64.43, 110.73, 110.91, 111.08, 112.25, 112.49, 115.08, 120.00, 125.96, 130.39, 131.57, 132.12, 132.32, 133.13, 140.10, 149.87, 150.54, 153.16, 157.36, 158.31, 160.22, 160.29, 162.70, 162.77, 165.42. 13 C NMR (400 MHz, DMSO, d 6 ) δ: 41.34, 44.94, 53.21, 55.41, 64.43, 110.73, 110.91, 111.08, 112.25, 112.49, 115.08, 120.00, 125.96, 130.39, 131.57, 132.12, 132.32, 133.13, 140.10, 149.87, 150.54, 153.16, 157.36, 158.31, 160.22, 160.29, 162.70, 162.77, 165.42.

상기 화학식 1의 화합물의 X선 분말 회절 분석을 수행하여 그 결과를 하기 표 2 및 도 2에 나타내었다.X-ray powder diffraction analysis of the compound of the above chemical formula 1 was performed, and the results are shown in Table 2 and Figure 2 below.

도 2의 X선 분말 회절도에 나타난 특징적인 피크(peak)를 하기 표 2에 나타내었으며, 여기서 ‘2θ’는 회절각을, ‘I/I0'는 피크(peak)의 상대강도를 의미한다. 회절각은 ±0.2°편차 범위를 갖는다.The characteristic peaks that appeared in the X-ray powder diffraction diagram of Fig. 2 are shown in Table 2 below, where '2θ' represents the diffraction angle and 'I/I 0 ' represents the relative intensity of the peak. The diffraction angle has a deviation range of ±0.2°.

상기 X선 분말 회절 분석을 통해, 상기 수득된 화학식 1의 화합물이 결정형임을 확인하였다.Through the above X-ray powder diffraction analysis, it was confirmed that the obtained compound of chemical formula 1 was in crystalline form.

회절각(2θ)Diffraction angle (2θ) 상대 강도 [%]Relative Strength [%] 11 7.57.5 3.73.7 22 9.09.0 55.955.9 33 10.110.1 34.434.4 44 10.310.3 7.47.4 55 11.511.5 15.615.6 66 12.212.2 41.041.0 77 12.512.5 8.98.9 88 13.313.3 10.910.9 99 13.513.5 4.04.0 1010 15.015.0 16.116.1 1111 15.915.9 2.02.0 1212 16.716.7 100100 1313 17.517.5 59.159.1 1414 18.218.2 8.28.2 1515 18.918.9 15.615.6 1616 19.519.5 18.518.5 1717 20.220.2 11.911.9 1818 20.820.8 1.71.7 1919 21.521.5 9.69.6 2020 22.122.1 23.423.4 2121 22.422.4 44.844.8 2222 22.922.9 43.143.1 2323 23.123.1 18.518.5 2424 23.723.7 13.613.6 2525 24.524.5 8.58.5 2626 25.125.1 3.63.6 2727 25.425.4 2.72.7 2828 25.825.8 2.32.3 2929 26.426.4 4.64.6 3030 26.826.8 13.013.0 3131 27.627.6 23.023.0 3232 28.028.0 3.73.7 3333 28.428.4 3.13.1 3434 29.129.1 16.916.9 3535 29.829.8 12.312.3 3636 30.430.4 2.62.6 3737 31.231.2 2.42.4 3838 31.531.5 2.02.0 3939 33.033.0 6.76.7 4040 34.234.2 5.85.8 4141 34.934.9 5.35.3 4242 35.435.4 2.32.3 4343 35.635.6 15.015.0 4444 36.736.7 2.32.3 4545 37.537.5 2.22.2 4646 38.238.2 2.42.4 4747 38.538.5 1.11.1

실시예 10: 화학식 1의 화합물의 정제Example 10: Purification of the compound of formula 1

상기 실시예 9에서 얻은 화학식 1의 화합물을 용기에 넣고 디메틸설폭사이드 (DMSO) 40 mL를 가하여 40℃에서 교반하여 완전히 용해시켰다. 이어서 활성탄(activated carbon) (×0.05)을 첨가하고 같은 온도에서 30분간 추가로 교반한 후, 여과를 통해 활성탄을 제거하였다. 여과된 용액을 35℃로 냉각한 뒤 형태 I의 씨앗 화합물(미국특허 제10,464,945호의 실시예 8에서 제조된 결정형)을 가하고, 온도를 50℃까지 상승시켜 2시간 동안 교반하였다. 이후 다시 온도를 35℃로 낮추고, 50℃로 재가열한 뒤 에탄올 40mL를 첨가하였다. 상기 혼합물을 40℃로 냉각시킨 후, 형태 I의 씨앗 화합물을 추가하여 35℃로 다시 냉각시켰다. 그 다음 1시간 동안 교반하고, 온도를 20℃로 낮춘 후 또 다시 1시간 교반하였다. 최종적으로 혼합물을 여과하고, 에탄올 40 mL로 세척한 뒤, 50℃에서 진공 건조기를 이용하여 건조하여 화학식 1의 화합물 16.0g을 얻었다(수율: 80%, 순도: 99.86%).The compound of chemical formula 1 obtained in the above Example 9 was placed in a container, 40 mL of dimethyl sulfoxide (DMSO) was added, and stirred at 40°C to completely dissolve. Then, activated carbon (×0.05) was added, and the mixture was stirred at the same temperature for an additional 30 minutes, and then the activated carbon was removed through filtration. The filtered solution was cooled to 35°C, and the seed compound of Form I (crystalline form prepared in Example 8 of U.S. Patent No. 10,464,945) was added, the temperature was raised to 50°C, and stirred for 2 hours. Thereafter, the temperature was lowered to 35°C again, reheated to 50°C, and 40 mL of ethanol was added. The mixture was cooled to 40°C, the seed compound of Form I was added, and cooled again to 35°C. The mixture was then stirred for 1 hour, the temperature was lowered to 20°C, and stirred for another hour. Finally, the mixture was filtered, washed with 40 mL of ethanol, and dried using a vacuum dryer at 50°C to obtain 16.0 g of the compound of chemical formula 1 (yield: 80%, purity: 99.86%).

Claims (18)

(i) 하기 화학식 2의 화합물을 하기 화학식 3의 화합물과 아미드 결합 반응시켜 하기 화학식 4의 화합물을 수득하는 단계;(i) a step of obtaining a compound of the following chemical formula 4 by subjecting a compound of the following chemical formula 2 to an amide bond reaction with a compound of the following chemical formula 3; (ii) 하기 화학식 4의 화합물을 하기 화학식 5의 화합물로 알킬화 반응시켜 하기 화학식 6의 화합물을 수득하는 단계;(ii) a step of subjecting a compound of chemical formula 4 below to an alkylation reaction with a compound of chemical formula 5 below to obtain a compound of chemical formula 6 below; (iii) 하기 화학식 6의 화합물을 브로마이드화 반응시켜 하기 화학식 7의 화합물을 수득하는 단계;(iii) a step of obtaining a compound of chemical formula 7 by subjecting a compound of chemical formula 6 to a bromide reaction; (iv) 하기 화학식 7의 화합물의 브로마이드를 디메틸아민염과 치환 반응시켜 하기 화학식 8의 화합물을 수득하는 단계;(iv) a step of obtaining a compound of chemical formula 8 by subjecting the bromide of the compound of chemical formula 7 below to a substitution reaction with a dimethylamine salt; (v) 하기 화학식 8의 화합물의 니트로기를 환원 반응시키고 HBr과 반응시켜 하기 화학식 9의 화합물의 HBr 염을 수득하는 단계;(v) a step of reducing the nitro group of the compound of the following chemical formula 8 and reacting it with HBr to obtain an HBr salt of the compound of the following chemical formula 9; (vi) 하기 화학식 9의 화합물의 HBr 염을 카르보닐화제 및 메톡시 암모늄 염화물과 염기의 존재 하에 반응시켜 하기 화학식 10의 화합물을 수득하는 단계;(vi) a step of reacting the HBr salt of the compound of the following chemical formula 9 in the presence of a carbonylating agent and methoxy ammonium chloride and a base to obtain a compound of the following chemical formula 10; (vii) 하기 화학식 10의 화합물을 에스테르 가수분해 반응시켜 하기 화학식 11의 화합물을 수득하는 단계;(vii) a step of subjecting a compound of chemical formula 10 below to an ester hydrolysis reaction to obtain a compound of chemical formula 11 below; (viii) 하기 화학식 11의 화합물을 커플링제 및 염기의 존재 하에 하기 화학식 12의 화합물과 탈수축합 반응시켜 하기 화학식 13의 화합물을 수득하는 단계; 및(viii) a step of subjecting a compound of the following chemical formula 11 to a dehydration condensation reaction with a compound of the following chemical formula 12 in the presence of a coupling agent and a base to obtain a compound of the following chemical formula 13; and (ix) 하기 화학식 13의 화합물을 염기의 존재 하에 에스테르 가수분해 반응시킨 후, 고리화 반응시키는 단계를 포함하는 하기 화학식 1의 렐루골릭스의 제조방법:(ix) A method for producing relugolix of the following chemical formula 1, comprising the step of subjecting a compound of the following chemical formula 13 to an ester hydrolysis reaction in the presence of a base, followed by a cyclization reaction: [화학식 2][Chemical formula 2]
Figure PCTKR2024096649-appb-img-000026
Figure PCTKR2024096649-appb-img-000026
[화학식 3][Chemical Formula 3]
Figure PCTKR2024096649-appb-img-000027
Figure PCTKR2024096649-appb-img-000027
[화학식 4][Chemical Formula 4]
Figure PCTKR2024096649-appb-img-000028
Figure PCTKR2024096649-appb-img-000028
[화학식 5][Chemical Formula 5]
Figure PCTKR2024096649-appb-img-000029
Figure PCTKR2024096649-appb-img-000029
[화학식 6][Chemical formula 6]
Figure PCTKR2024096649-appb-img-000030
Figure PCTKR2024096649-appb-img-000030
[화학식 7][Chemical formula 7]
Figure PCTKR2024096649-appb-img-000031
Figure PCTKR2024096649-appb-img-000031
[화학식 8][Chemical formula 8]
Figure PCTKR2024096649-appb-img-000032
Figure PCTKR2024096649-appb-img-000032
[화학식 9][Chemical formula 9]
Figure PCTKR2024096649-appb-img-000033
Figure PCTKR2024096649-appb-img-000033
[화학식 10][Chemical Formula 10]
Figure PCTKR2024096649-appb-img-000034
Figure PCTKR2024096649-appb-img-000034
[화학식 11][Chemical Formula 11]
Figure PCTKR2024096649-appb-img-000035
Figure PCTKR2024096649-appb-img-000035
[화학식 12][Chemical Formula 12]
Figure PCTKR2024096649-appb-img-000036
Figure PCTKR2024096649-appb-img-000036
[화학식 13][Chemical Formula 13]
Figure PCTKR2024096649-appb-img-000037
Figure PCTKR2024096649-appb-img-000037
[화학식 1][Chemical Formula 1]
Figure PCTKR2024096649-appb-img-000038
Figure PCTKR2024096649-appb-img-000038
상기 식에서, In the above formula, R1은 할로겐 원자 또는 수소 원자이고, R 1 is a halogen atom or a hydrogen atom, R2는 할로겐 원자, 토실레이트기, 메실레이트기 또는 니트로벤젠설포네이트기이다.R 2 is a halogen atom, a tosylate group, a mesylate group, or a nitrobenzenesulfonate group.
제1항에 있어서, 단계 (ii)에서 알킬화 반응은 염기 및 촉매의 존재 하에 수행되는 제조방법.A manufacturing method in claim 1, wherein the alkylation reaction in step (ii) is performed in the presence of a base and a catalyst. 제2항에 있어서, 상기 염기는 탄산 칼륨이고, 상기 촉매는 요오드화 칼륨인 제조방법.A manufacturing method in claim 2, wherein the base is potassium carbonate and the catalyst is potassium iodide. 제1항에 있어서, 단계 (iii)에서 상기 브로마이드화 반응은 브로마이드화 시약을 사용하여 라디칼 생성 시약의 존재 하에 수행되는 제조방법.A manufacturing method in which, in step (iii), the bromide reaction is performed in the presence of a radical generating reagent using a bromide reagent. 제4항에 있어서, 상기 브로마이드화 시약은 N-브로모석신이미드이고, 상기 라디칼 생성 시약은 아조비스이소부티로니트릴인 제조방법.A manufacturing method in claim 4, wherein the bromide reagent is N-bromosuccinimide and the radical generating reagent is azobisisobutyronitrile. 제1항에 있어서, 단계 (iv)에서 상기 디메틸아민염은 디메틸아민 염화수소, 디메틸아민 브롬화수소 및 디메틸아민 요오드화수소 중 하나 이상인 제조방법.A manufacturing method in claim 1, wherein in step (iv), the dimethylamine salt is at least one of dimethylamine hydrogen chloride, dimethylamine hydrogen bromide and dimethylamine hydrogen iodide. 제1항에 있어서, 단계 (iv)에서 상기 치환 반응은 염기의 존재 하에 수행되는 제조방법.A manufacturing method in claim 1, wherein the substitution reaction in step (iv) is performed in the presence of a base. 제7항에 있어서, 상기 염기는 트리에틸아민인 제조방법.A manufacturing method in claim 7, wherein the base is triethylamine. 제1항에 있어서, 단계 (v)에서 상기 환원 반응은 산 존재 하에 환원제로서 금속을 사용하여 수행되는 제조방법.A manufacturing method in claim 1, wherein in step (v), the reduction reaction is performed using a metal as a reducing agent in the presence of an acid. 제1항에 있어서, 단계 (vi)에서 상기 카르보닐화제는 카르보닐디이미다졸(CDI)인 제조방법.A manufacturing method in claim 1, wherein the carbonylating agent in step (vi) is carbonyldiimidazole (CDI). 제1항에 있어서, 단계 (vi)에서 상기 염기는 트리에틸아민인 제조방법.A manufacturing method in claim 1, wherein in step (vi), the base is triethylamine. 제1항에 있어서, 단계 (vii)에서 상기 에스테르 가수분해 반응은 염기의 존재 하에 수행되는 제조방법.A manufacturing method in claim 1, wherein the ester hydrolysis reaction in step (vii) is performed in the presence of a base. 제12항에 있어서, 상기 염기는 수산화칼륨인 제조방법.A manufacturing method in claim 12, wherein the base is potassium hydroxide. 제1항에 있어서, 단계 (viii)에서 상기 커플링제는 1,3,5,2,4,6-트리옥사트리포스포리네인, 2,4,6-트리부틸-, 2,4,6-트리옥사이드 (1,3,5,2,4,6-Trioxatriphosphorinane, 2,4,6-tributyl-, 2,4,6-trioxide, T4P)인 제조방법.A manufacturing method in claim 1, wherein in step (viii), the coupling agent is 1,3,5,2,4,6-Trioxatriphosphorinane, 2,4,6-tributyl-, 2,4,6-trioxide (T4P). 제1항에 있어서, 단계 (viii)에서 상기 염기는 N,N-디이소프로필에틸아민 (DIPEA)인 제조방법.A manufacturing method in claim 1, wherein in step (viii), the base is N,N-diisopropylethylamine (DIPEA). 제1항에 있어서, 단계 (ix)에서 상기 염기는 나트륨 메톡사이드인 제조방법.A manufacturing method in claim 1, wherein in step (ix), the base is sodium methoxide. (i) 하기 화학식 2의 화합물을 하기 화학식 3의 화합물과 아미드 결합 반응시켜 하기 화학식 4의 화합물을 수득하는 단계;(i) a step of obtaining a compound of the following chemical formula 4 by subjecting a compound of the following chemical formula 2 to an amide bond reaction with a compound of the following chemical formula 3; (ii) 하기 화학식 4의 화합물을 하기 화학식 5의 화합물로 알킬화 반응시켜 하기 화학식 6의 화합물을 수득하는 단계;(ii) a step of subjecting a compound of chemical formula 4 below to an alkylation reaction with a compound of chemical formula 5 below to obtain a compound of chemical formula 6 below; (iii) 하기 화학식 6의 화합물을 브로마이드화 반응시켜 하기 화학식 7의 화합물을 수득하는 단계;(iii) a step of obtaining a compound of chemical formula 7 by subjecting a compound of chemical formula 6 to a bromide reaction; (iv) 하기 화학식 7의 화합물의 브로마이드를 디메틸아민염과 치환 반응시켜 하기 화학식 8의 화합물을 수득하는 단계; 및 (iv) a step of obtaining a compound of the following chemical formula 8 by substitution reaction of the bromide of the compound of the following chemical formula 7 with a dimethylamine salt; and (v) 하기 화학식 8의 화합물의 니트로기를 환원 반응시키고 HBr과 반응시키는 단계를 포함하는 하기 화학식 9의 화합물의 HBr 염의 제조방법:(v) A method for producing an HBr salt of a compound of the following chemical formula 9, comprising the step of reducing a nitro group of a compound of the following chemical formula 8 and reacting it with HBr: [화학식 2][Chemical formula 2]
Figure PCTKR2024096649-appb-img-000039
Figure PCTKR2024096649-appb-img-000039
[화학식 3][Chemical Formula 3]
Figure PCTKR2024096649-appb-img-000040
Figure PCTKR2024096649-appb-img-000040
[화학식 4][Chemical Formula 4]
Figure PCTKR2024096649-appb-img-000041
Figure PCTKR2024096649-appb-img-000041
[화학식 5][Chemical Formula 5]
Figure PCTKR2024096649-appb-img-000042
Figure PCTKR2024096649-appb-img-000042
[화학식 6][Chemical formula 6]
Figure PCTKR2024096649-appb-img-000043
Figure PCTKR2024096649-appb-img-000043
[화학식 7][Chemical formula 7]
Figure PCTKR2024096649-appb-img-000044
Figure PCTKR2024096649-appb-img-000044
[화학식 8][Chemical formula 8]
Figure PCTKR2024096649-appb-img-000045
Figure PCTKR2024096649-appb-img-000045
[화학식 9][Chemical formula 9]
Figure PCTKR2024096649-appb-img-000046
Figure PCTKR2024096649-appb-img-000046
상기 식에서, In the above formula, R1은 할로겐 원자 또는 수소 원자이고, R 1 is a halogen atom or a hydrogen atom, R2는 할로겐 원자, 토실레이트기, 메실레이트기 또는 니트로벤젠설포네이트기이다.R 2 is a halogen atom, a tosylate group, a mesylate group, or a nitrobenzenesulfonate group.
하기 화학식 9의 화합물의 HBr 염:HBr salt of the compound of formula 9 below: [화학식 9][Chemical formula 9]
Figure PCTKR2024096649-appb-img-000047
Figure PCTKR2024096649-appb-img-000047
PCT/KR2024/096649 2023-12-12 2024-12-10 Method for preparing relugolix Pending WO2025127790A1 (en)

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