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WO2025126940A1 - Polymer, aromatic polyamide, molded object, film, vibration sensor, speaker, and structural-health monitoring system - Google Patents

Polymer, aromatic polyamide, molded object, film, vibration sensor, speaker, and structural-health monitoring system Download PDF

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Publication number
WO2025126940A1
WO2025126940A1 PCT/JP2024/043026 JP2024043026W WO2025126940A1 WO 2025126940 A1 WO2025126940 A1 WO 2025126940A1 JP 2024043026 W JP2024043026 W JP 2024043026W WO 2025126940 A1 WO2025126940 A1 WO 2025126940A1
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group
chemical formula
polymer
film
aromatic polyamide
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French (fr)
Japanese (ja)
Inventor
拓実 濱田
明光 佃
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Toray Industries Inc
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Toray Industries Inc
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    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G69/00Macromolecular compounds obtained by reactions forming a carboxylic amide link in the main chain of the macromolecule
    • C08G69/02Polyamides derived from amino-carboxylic acids or from polyamines and polycarboxylic acids
    • C08G69/26Polyamides derived from amino-carboxylic acids or from polyamines and polycarboxylic acids derived from polyamines and polycarboxylic acids
    • C08G69/32Polyamides derived from amino-carboxylic acids or from polyamines and polycarboxylic acids derived from polyamines and polycarboxylic acids from aromatic diamines and aromatic dicarboxylic acids with both amino and carboxylic groups aromatically bound
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J5/00Manufacture of articles or shaped materials containing macromolecular substances
    • C08J5/18Manufacture of films or sheets
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10NELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N30/00Piezoelectric or electrostrictive devices
    • H10N30/01Manufacture or treatment
    • H10N30/04Treatments to modify a piezoelectric or electrostrictive property, e.g. polarisation characteristics, vibration characteristics or mode tuning
    • H10N30/045Treatments to modify a piezoelectric or electrostrictive property, e.g. polarisation characteristics, vibration characteristics or mode tuning by polarising
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10NELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N30/00Piezoelectric or electrostrictive devices
    • H10N30/20Piezoelectric or electrostrictive devices with electrical input and mechanical output, e.g. functioning as actuators or vibrators
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10NELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N30/00Piezoelectric or electrostrictive devices
    • H10N30/30Piezoelectric or electrostrictive devices with mechanical input and electrical output, e.g. functioning as generators or sensors
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10NELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N30/00Piezoelectric or electrostrictive devices
    • H10N30/80Constructional details
    • H10N30/85Piezoelectric or electrostrictive active materials
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10NELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N30/00Piezoelectric or electrostrictive devices
    • H10N30/80Constructional details
    • H10N30/85Piezoelectric or electrostrictive active materials
    • H10N30/857Macromolecular compositions

Definitions

  • polymer-based materials have lower piezoelectric and pyroelectric coefficients than inorganic materials, their specific heat and dielectric constant are small and therefore their performance index is good. They are therefore used as piezoelectric elements in applications that require flexibility, light weight, and large area, such as wearable devices, and their applications as memory materials, etc. are being investigated.
  • remanent polarization is formed by aligning the dipoles in the polymer in one direction, and ferroelectricity is expressed.
  • the orientation of the dipoles is achieved by controlling the higher-order structure of the polymer chains through the molecular orientation and crystal system in the material.
  • the polymer is heated to a temperature above the glass transition temperature and below the melting point so that the polymer chains can move, and then an electric field is applied to the polymer for a certain period of time to fix the structure while maintaining the electric field, which is called poling treatment, or mechanical uniaxial or biaxial stretching.
  • poling treatment or mechanical uniaxial or biaxial stretching.
  • the higher-order structure is destroyed by stress or heat generated in the material during use, which deactivates the ferroelectricity, and this limits the durability and usage environment, which is an issue for polymer-based materials.
  • Aromatic polyamides are polymeric materials that are expected to have high durability in addition to ferroelectricity.
  • fully aromatic polyamides have excellent heat resistance and chemical resistance, and are therefore used as heat-resistant and highly elastic fibers.
  • Patent Document 1 discloses a polyamide film with residual polarization.
  • Patent Document 2 discloses a polyamide-based liquid crystal alignment agent varnish.
  • Patent Document 3 discloses a mixture of ferroelectric aromatic polyamide and liquid crystal polymer.
  • Patent Document 4 discloses a block copolymer of ferroelectric aromatic polyamide and a polymer having a melting point and glass transition temperature.
  • Patent Document 5 discloses a manufacturing method in which an aliphatic polyamide dissolved in an organic solvent is applied to a substrate, dried, the resulting film is heat-treated and cooled, and then uniaxially stretched to obtain a piezoelectric polyamide film.
  • the aromatic polyamides disclosed in Patent Documents 1 and 2 are not fully aromatic polyamides, and the inclusion of alkyl moieties in the structure may reduce the dielectric constant and residual polarization.
  • the aromatic polyamide-based materials disclosed in Patent Documents 3 and 4 introduce a flexible polymer structure to make the glass transition temperature and/or melting point of the polymer industrially easy to handle, but this may reduce the content of aromatic polyamide moieties and reduce ferroelectricity.
  • the manufacturing method for piezoelectric films disclosed in Patent Document 5 is limited to aliphatic polyamides, and due to differences in the solubility and packing properties of the polymers, it is difficult to apply the described manufacturing method to fully aromatic polyamides.
  • all of the materials disclosed in Patent Documents 1 to 5 may have inferior durability to heat and stress compared to fully aromatic polyamides.
  • the present invention aims to provide a molded article and/or film with excellent piezoelectric properties, mechanical properties, and heat resistance by forming a ferroelectric aromatic polyamide in which each amide group in the repeating unit is connected via an odd number of atoms and the amide group is bonded to an aromatic ring atom.
  • A is a hydrogen-bonding group
  • B 1 and B 2 are n-membered ring groups (n is a natural number of 5 or more and 10 or less).
  • An aromatic polyamide in which the hydrogen-bonding group A is an amide group, and both B 1 and B 2 are aromatic groups.
  • X is an amide group
  • Ar 1 and Ar 2 are aromatic groups.
  • (6) The polymer and/or aromatic polyamide according to any one of (1) to (5), wherein the structure in the repeating unit satisfies at least any one of the following (v) to (viii): (v): An electron-donating group is bonded to an atom on the shortest path along the bonds connecting the N atoms of the two amide groups. (vi): An electron-withdrawing group is bonded to an atom on the shortest path along the bond connecting the two C atoms of the amide groups. (vii): An electron-withdrawing group is bonded to an atom that is not on the shortest path along the bond connecting the two N atoms of the amide groups.
  • Ar 3 and Ar 4 are groups containing the molecular skeleton structures shown in chemical formulas (IV) to (VIII). Chemical formula (IV):
  • R 1 is any group satisfying (v) to (viii) in (6).
  • R 7 is an electron withdrawing group and R 8 is --H or an electron donating group.
  • R9 is an electron withdrawing group.
  • R10 is an electron donating group.
  • the polymer and/or aromatic polyamide according to any one of (1) to (8) which contains at least one group selected from the group consisting of a perfluoroalkyl group having from 1 to 3 carbon atoms, a nitro group, a cyano group, and a sulfone group.
  • a molded article comprising as a main component the polymer and/or aromatic polyamide according to any one of (1) to (10).
  • a piezoelectric element comprising the molded article according to (11) and/or the film according to (13).
  • An actuator comprising the molded article according to (11) and/or the film according to (13).
  • a vibrator comprising the molded article according to (11) and/or the film according to (13).
  • a vibration sensor comprising the piezoelectric element according to (17).
  • (22) A structural health monitoring system comprising at least the vibration sensor according to (20) and a communication device, the vibration sensor detecting the vibration state of a structure and diagnosing the structure.
  • the polymer and/or aromatic polyamide of the present invention can provide a molded article and/or film that has excellent piezoelectric properties, mechanical properties, and heat resistance. Therefore, the polymer, aromatic polyamide, molded article, and film of the present invention can be suitably used as components for piezoelectric elements, actuators, vibrators, and the like.
  • the polymer of the present invention is a polymer containing a structure represented by chemical formula (I) as a repeating unit, and is characterized by satisfying the following (i) and (ii): (i): The hydrogen-bonding group A in the chemical formula (I) is bonded to a ring atom. (ii): In the chemical formula (I), the number of atoms on the shortest path connecting the two A atoms is odd.
  • the polymer of the present invention preferably has a remanent polarization of 15 mC/m 2 or more and 300 mC/m 2 or less.
  • the polymer of the present invention preferably has the hydrogen bonding group A in chemical formula (I) being at least one of an amide group, a urea group, and a urethane group.
  • the aromatic polyamide of the present invention is characterized in that it contains a structure represented by the following chemical formula (II) as a repeating unit and satisfies the following (iii) and (iv).
  • X is an amide group, and Ar 1 and Ar 2 are aromatic groups.
  • the aromatic ring member atom is a constituent atom forming a ring structure in a cyclic molecular structure having aromaticity.
  • the path connecting the atoms between two Xs in chemical formula (II) refers to a path connecting the atoms present from the atom to which one X is bonded to the atom to which the other X is bonded in two adjacent Xs along the bond.
  • the shortest path refers to a path in which the number of atoms present on the path connecting the atoms between the two Xs is the smallest.
  • the polymer and/or aromatic polyamide of the present invention preferably has a lower limit of residual polarization of 15 mC/m 2 or more. More preferably, the lower limit of residual polarization is 20 mC/m 2 or more, and even more preferably, 25 mC/m 2. If the lower limit of residual polarization is less than 15 mC/m 2 , the ferroelectricity is low, so that piezoelectricity may not be obtained when the molded body or film is formed.
  • the upper limit of residual polarization is preferably 300 mC/m 2 or less, and more preferably 50 mC/m 2.
  • the range of residual polarization is preferably 15 mC/m 2 or more and 300 mC/m 2 or less, more preferably 20 mC/m 2 or more and 300 mC/m 2 or less, more preferably 25 mC/m 2 or more and 300 mC/m 2 or less, and most preferably 25 mC/m 2 or more and 50 mC/m 2 or less.
  • the aromatic polyamide contains the above-mentioned structure and that the aromatic polyamide is subjected to a treatment such as stretching or poling to improve the packing and anisotropy of the aromatic polyamide. It is preferable that the structure in the repeating unit represented by chemical formula (II) of the aromatic polyamide of the present invention satisfies at least any one of the following (v) to (viii):
  • the electron-withdrawing group and the electron-donating group are determined by the Hammett substituent constant (Chem. Rev. 1991, 91, 99-257, etc.), and a functional group with a positive ⁇ p value is an electron-withdrawing group, and a functional group with a negative ⁇ p value is an electron-donating group.
  • the electron-withdrawing group is a group containing at least one of a perfluoroalkyl group, a sulfone group, a nitro group, and a cyano group having 1 to 3 carbon atoms
  • the electron-donating group is preferably a group containing at least one of an alkyl group having 1 to 3 carbon atoms, an alkoxy group having 1 to 3 carbon atoms, and a hydroxyl group, but is not limited to these structures.
  • an aromatic polyamide that satisfies these characteristics is a meta-junction type wholly aromatic polyamide. From the viewpoint of polymerizability and availability of raw materials, it is particularly preferable that the polyamide has a structure represented by the following chemical formula (III). Chemical formula (III):
  • Ar 3 and Ar 4 are groups containing the molecular skeleton structures shown in chemical formulas (IV) to (VIII), and any group satisfying any of the above (v) to (viii) may be bonded to each of the molecular skeleton structures.
  • R 1 is any group satisfying the above (v) to (viii). Chemical formula (VIII):
  • R2 is any group satisfying the above (v) to (viii).
  • Ar 5 is a group including a structure represented by any one of chemical formulas (X) to (XII), and Ar 6 is a group including a structure represented by any one of chemical formulas (XIII) to (XV).
  • R3 is --H or an electron donating group
  • R4 is an electron withdrawing group.
  • R5 is an electron donating group.
  • R6 is an electron withdrawing group.
  • R 7 is an electron withdrawing group and R 8 is --H or an electron withdrawing group.
  • R9 is an electron withdrawing group.
  • R10 is an electron donating group.
  • the number of repeating units containing the above-mentioned structure is preferably 80% or more and 100% or less of the total number of repeating units in the polymer. If the ratio of repeating units containing the above-mentioned structure is less than 80%, the orientation of the polymer chain and dipole moment may deteriorate, resulting in reduced ferroelectricity.
  • the polymer and/or aromatic polyamide of the present invention preferably has a glass transition temperature of 130°C or higher, more preferably 200°C or higher.
  • the range is preferably 130°C or higher and 400°C or lower, more preferably 200°C or higher and 400°C or lower.
  • the aromatic polyamide may include the above-mentioned structure or the content of components with low glass transition temperatures may be reduced.
  • An embodiment of the present invention is a molded article and/or film that contains as a main component the polymer and/or aromatic polyamide of the present invention.
  • "containing as a main component the polymer and/or aromatic polyamide” means that the component contained in the largest amount in the molded article and/or film is the polymer and/or aromatic polyamide described in the present invention.
  • the amount of the component is not particularly limited, but the lower limit is preferably 70% by weight or more, and more preferably 80% by weight or more, based on the entire film.
  • the amount of the component is preferably in the range of 70% by weight to 100% by weight, and more preferably 80% by weight to 100% by weight, based on the entire film, so that the mechanical properties derived from the aromatic polyamide can be more effectively exhibited.
  • the molded article and/or film of the present invention may contain a ferroelectric material.
  • the ferroelectricity may be improved and excellent piezoelectric performance may be obtained.
  • the ferroelectric material may be either an organic material or an inorganic material.
  • organic ferroelectric materials include polyvinylidene fluoride (PVDF), copolymers of vinylidene fluoride and trifluoroethylene, nylon, etc.
  • inorganic ferroelectric materials include lead zirconate titanate (PZT), barium titanate (BTO), lead titanate (PTO), bismuth sodium titanate-barium titanate (BNT-BT), etc.
  • the ferroelectric material contained is a material that has a larger remanent polarization than the polymer and/or aromatic polyamide of the present invention when poling treatment is performed under the same conditions.
  • the film of the present invention has a thickness of 1 ⁇ m or more and 200 ⁇ m or less. If the thickness is less than 1 ⁇ m, handling properties may deteriorate. If the thickness is more than 200 ⁇ m, flexibility may decrease, and workability as a film may decrease.
  • At least one of the piezoelectric constants d 31 and d 33 is preferably greater than 0 pC/N as a lower limit, and more preferably 5 pC/N or more. Moreover, as an upper limit, it is preferably 50 pC/N or less, and more preferably 40 pC/N. As a range, it is preferable that it is greater than 0 pC/N and 50.0 pC/N or less, and more preferably greater than 0 pC/N and 40.0 pC/N or less.
  • the measurement method of the piezoelectric constants d 31 and d 33 is not particularly limited as long as it is a method that can obtain sufficiently accurate values, and can be measured and determined by any method.
  • aluminum electrodes are vapor-deposited on the upper and lower surfaces of the measurement sample so that an overlapping area of 6 ⁇ 10 -5 m 2 appears in a planar view.
  • Two leads made of aluminum foil reinforced with insulating adhesive tape are bonded to each of the upper and lower planar electrodes using a conductive epoxy resin.
  • a piezoelectric signal that appears when a displacement is applied to both ends of the sample at a constant frequency and amplitude can be measured with a logger via a charge amplifier, and the amount of generated charge per unit area can be calculated.
  • the elastic modulus of the film of the present invention is preferably 4.0 GPa or more as a lower limit, and more preferably 5.0 GPa or more.
  • the upper limit is preferably 15.0 GPa or less, and more preferably 7.0 GPa or less.
  • the elastic modulus is preferably in the range of 4.0 GPa to 15.0 GPa. More preferably, it is 5.0 GPa to 15.0 GPa, and even more preferably, it is 5.0 GPa to 15.0 GPa. If the elastic modulus is less than 4.0 GPa, it is likely to break or be damaged when used as a molded body or film.
  • the elastic modulus is greater than 15.0 GPa, it may become difficult to deform and piezoelectric properties may not be obtained.
  • the elastic modulus of the film By setting the elastic modulus of the film within the above range, piezoelectricity with excellent response to strain and/or electric field changes can be obtained, the responsiveness of the sensor can be improved, and the vibration frequency of the vibrator can be made wider.
  • the elastic modulus obtained by AFM is measured by performing force curve mapping measurement of AFM.
  • AFM is a scanning probe microscope that obtains information about the surface of a sample by utilizing the atomic force between the sample and the probe (tip). While changing the distance between the sample and the probe attached to the cantilever, the force acting on the probe (the amount of deflection of the cantilever) is measured to obtain a force curve.
  • This force curve contains various information about the sample surface, and various physicochemical properties of the sample surface can be evaluated by analyzing the force curve.
  • Force curve mapping measurement obtains this force curve at multiple points on the sample surface by scanning parallel to the sample surface.
  • the sample is fixed to the sample fixing stage of the AFM, and the shape image of the sample is measured in PeakForceQNM mode (a mode that automatically measures force curves at multiple points continuously).
  • PeakForceQNM mode a mode that automatically measures force curves at multiple points continuously.
  • the elastic modulus of the sample can be evaluated by analyzing the elastic modulus using existing software based on the results of the force curve mapping measurement.
  • the normalized molecular orientation MORc of the film of the present invention is preferably 1.1 or more as a lower limit, more preferably 1.2 or more, and even more preferably 1.3 or more.
  • the upper limit is preferably 15 or less, and even more preferably 2 or less. It is preferable that MORc is in the range of 1.1 to 15. More preferably, MORc is 1.2 to 15, and even more preferably, MORc is 1.3 to 15.
  • the normalized molecular orientation MORc is a value determined based on the molecular orientation degree MOR, which is an index showing the degree of orientation of polymer chains in the film.
  • the molecular orientation degree MOR is measured by the following microwave measurement method.
  • the normalized molecular orientation MORc can be measured by a known molecular orientation meter, for example, MOR-7015 manufactured by Oji Scientific Instruments Co., Ltd.
  • the normalized molecular orientation MORc can be controlled by the stretching conditions such as the stretch ratio and stretching temperature of the film, and the film-forming conditions such as the temperature and speed.
  • the main component of the molded body and/or film is the polymer and/or aromatic polyamide described in the present invention, or that the film is uniaxially stretched.
  • is preferably 0 to 0.5, more preferably 0 to 0.3, and even more preferably 0 to 0.2.
  • the heat treatment of the molded body and/or film is preferably performed by leaving the molded body and/or film in a hot air oven set at 150°C for 10 minutes.
  • the molded body and/or film of the present invention may contain organic-inorganic hybrid resins such as thermosetting resins, ultraviolet-curing resins, hydrolysis/condensation resins, and alkoxysilane compounds for the purpose of adjusting mechanical properties and density. Particles may also be included. Here, the particles may be either inorganic particles or organic particles.
  • the inorganic particles are not particularly limited, but include oxides, silicides, nitrides, borides, chlorides, carbonates, etc.
  • silica SiO 2
  • aluminum oxide Al 2 O 3
  • zinc oxide ZnO
  • zirconium oxide ZrO 2
  • titanium oxide TiO 2
  • antimony oxide Sb 2 O 3
  • indium tin oxide ITO
  • lead zirconate titanate PZT
  • barium titanate BTO
  • lead titanate PTO
  • bismuth sodium titanate-barium titanate BNT-BT
  • each component separated using a combination of techniques such as chromatography, distillation, separation, and reprecipitation can be analyzed using a combination of nuclear magnetic resonance (NMR), Fourier transform infrared spectroscopy (FT-IR), mass spectrometry (MS), elemental analysis, and single crystal structure analysis.
  • NMR nuclear magnetic resonance
  • FT-IR Fourier transform infrared spectroscopy
  • MS mass spectrometry
  • Polymers and/or aromatic polyamides can be obtained by various known methods such as solution polymerization and precipitation polymerization.
  • solution polymerization and precipitation polymerization For example, when polymerizing aromatic polyamides by solution polymerization, the raw materials, acid dichloride and diamine, can be reacted in an aprotic solvent at low temperature to polymerize.
  • an aprotic solvent is a polar solvent that does not have proton (hydrogen ion) donating properties, such as N-methyl-2-pyrrolidone, N,N-dimethylacetamide, N,N-dimethylisobutyramide, 3-methoxy-N,N-dimethylpropanamide, tetrahydrofuran, ⁇ -butyrolactone, ethyl acetate, acetonitrile, dimethylformamide, and dimethylsulfoxide.
  • proton (hydrogen ion) donating properties such as N-methyl-2-pyrrolidone, N,N-dimethylacetamide, N,N-dimethylisobutyramide, 3-methoxy-N,N-dimethylpropanamide, tetrahydrofuran, ⁇ -butyrolactone, ethyl acetate, acetonitrile, dimethylformamide, and dimethylsulfoxide.
  • the water content of the solvent used in polymerization is more than 0 ppm and less than 500 ppm (by mass, the same applies below), and more preferably more than 0 ppm and less than 200 ppm.
  • the molar ratio of the acid dichloride and the diamine is equal, a polymer with an ultra-high molecular weight tends to be produced, so it is preferable to adjust the molar ratio so that one is 96.0 to 99.8% of the other, more preferably 96.0 to 99.0%. If polymerization is carried out at this molar ratio, the diamine will be in excess relative to the acid dichloride, and the terminal functional group will be an amino group.
  • the polymerization reaction of aromatic polyamide is accompanied by heat generation, so it is preferable to keep the temperature of the solution during polymerization at 40°C or less. If it exceeds 40°C, side reactions may occur and the degree of polymerization may not increase sufficiently. It is more preferable to keep the temperature of the solution during polymerization at 30°C or less.
  • a method of neutralizing with an inorganic neutralizing agent such as lithium carbonate, calcium carbonate, or calcium hydroxide can be used.
  • the solution contains inorganic salts (e.g., lithium chloride) produced by the neutralization reaction.
  • inorganic salts e.g., lithium chloride
  • These inorganic salts ionize in the solvent and coordinate with the amide groups of the aromatic polyamide, acting as a dissolving aid in the solvent, and are therefore effective in improving the pot life of the solution and suppressing the aggregation of the polymer during molding.
  • a washing process for removing the inorganic salts is required during the molding process, it may not be usable depending on the dimensions of the molded body and/or film and the manufacturing process.
  • the polymer solution obtained by solution polymerization is mixed with a large amount of a poor solvent such as water to precipitate the polymer as a solid, and the polymer can be separated from the solution by filtration or other methods to separate the polymer and hydrogen chloride.
  • the isolated polymer can be redissolved in the aprotic solvent mentioned above to make it into a solution.
  • the method of introducing electron-withdrawing groups and/or electron-donating groups into the aromatic polyamide of the present invention so as to satisfy at least one of the above (v) to (viii) includes a method of polymerizing an aromatic polyamide using a monomer in which an electron-withdrawing group and/or an electron-donating group has been substituted at the desired position as a raw material, and a method of introducing the groups by polymerizing the aromatic polyamide as a raw material and then functionalizing it.
  • a method of derivatizing the desired functional group from a leaving group such as -H or a halogen group introduced on the aromatic group as a starting point is included.
  • the position selectivity may be poor, resulting in an unintended structure, or the reactivity may be insufficient, resulting in a low introduction rate of the functional group.
  • a method of using a monomer in which an electron-withdrawing group and/or an electron-donating group has been substituted at the desired position as a raw material is preferable.
  • the molded article and/or film of the present invention is preferably obtained by filling a solution containing the polymer and/or aromatic polyamide of the present invention into a mold or casting it onto a substrate, followed by curing.
  • a solution containing the polymer and/or aromatic polyamide of the present invention into a mold or casting it onto a substrate, followed by curing.
  • the film of the present invention can be obtained by dissolving the polymer obtained as described above in a solvent and applying the solution to a substrate to form a film.
  • the solvent is an aprotic solvent.
  • the solution may also contain the above-mentioned resin, electrolyte, particles, etc., in order to improve the properties of the film.
  • film formation methods include a dry-wet method in which a preliminary drying step and a washing step in a wet bath are followed by a heat treatment, a dry method in which a solvent is dried without a washing step, or a wet method in which a heat treatment is performed after introduction into a wet bath without a solvent drying step. Any of these methods may be used to form a film, but it is preferable to form a film by a dry method from the viewpoints of process simplicity and processability that allows a film to be formed on an object in the device manufacturing process.
  • the method of coating the substrate can be selected from known methods such as die coating, roller coating, wire bar coating, gravure coating, etc.
  • the substrate may be any material that is not corroded by the raw material solution and does not deform or denature when heated for drying the solvent, and examples of the substrate include glass plates, thin glass films, resin films, metal plates, quartz plates, silicon wafers, etc.
  • the surface structure of the substrate may be smooth or may have a fine structure.
  • Methods for drying the solvent include, but are not limited to, hot air, infrared irradiation, microwave irradiation, etc.
  • the drying temperature is preferably 50 to 400°C. From the viewpoint of improving thermal dimensional stability, it is more preferable that the drying step includes a step in the temperature range of 150 to 400°C. For the purpose of preventing surface roughening due to rapid solvent evaporation, it is even more preferable to perform preliminary drying at 50 to 200°C and then stepwise solvent drying at 200 to 400°C.
  • stretching or poling treatment may be performed during molding.
  • stretching it is preferable to stretch the film after the drying process described above using a stretching machine.
  • poling treatment it can be performed by applying a voltage to the obtained film and/or molded article.
  • Methods for applying voltage include known methods such as DC voltage application treatment, AC voltage application treatment, and corona discharge treatment, and an appropriate method can be selected depending on the shape of the film or molded article.
  • the applied electric field is preferably in the range of 10 kV/mm to 150 kV/mm.
  • electrodes, needle electrodes, wire electrodes, mesh electrodes, and flat electrodes have been conventionally used, but the present invention is not limited to these.
  • a magnetic field may be used for poling treatment.
  • the polymer, aromatic polyamide, molded article and film of the present invention can be suitably used as a piezoelectric element, a sensor, an actuator, a diaphragm, a vibrator, and a raw material thereof.
  • the piezoelectric element, actuator, and vibrator comprising the molded article and/or film of the present invention are characterized by having a conductive thin film on at least one surface of the molded article and/or film of the present invention. This allows the piezoelectric element, actuator, and vibrator to exhibit excellent response and heat resistance while maintaining the same ease of use as conventional piezoelectric elements, actuators, and vibrators containing polymer-based piezoelectric materials.
  • the piezoelectric element, actuator, and vibrator of the present invention can be suitably used as a member to be mounted on a vibration sensor, a speaker, etc.
  • the structural monitoring system of the present invention is characterized by comprising at least the vibration sensor and communication device described in the present invention, and diagnosing the vibration state of a structure using the vibration sensor.
  • the structural monitoring system of the present invention is characterized by comprising the vibration sensor of the present invention, thereby improving durability and reducing the frequency of maintenance.
  • the structural health monitoring system is a system that measures the vibration state of a target structure in response to external factors such as earthquakes and vibrations generated by driving parts such as motors, thereby diagnosing the durability of the structure, detecting deterioration over time, and calculating the timing of repairs to the structure, etc.
  • the physical properties of the present invention were evaluated in the form of a film, for example.
  • the sample films used for evaluating the physical properties were prepared according to the following method using the aromatic polyamide of the present invention.
  • the sample solution was cast into a film shape using an applicator onto a glass plate with an Al electrode attached.
  • the temperatures of the sample solution, glass plate, and casting atmosphere were room temperature.
  • the cast thickness was adjusted so that the film thickness after the solvent dried would be 10 ⁇ m.
  • the glass plate was placed in a hot air oven and dried for 10 minutes at Tb-50°C, where Tb is the boiling point of the aprotic solvent that makes up the solution (in the case of a mixed solvent, the boiling point of the solvent with the highest boiling point among those that are contained in 30 mass% or more of the total solvent amount).
  • an aluminum electrode layer (100 nm) was attached to the surface of the resulting dried film by vapor deposition, and the temperature was raised to Tb+40°C at a rate of 5°C/min while an electric field of 100 kV/mm was applied using a DC high-voltage stabilized power supply EV10-1AVR+ (Kasuga Electric Co., Ltd.) connected to a wire electrode. After maintaining the film at this temperature for 15 minutes, the film was slowly cooled to room temperature with the voltage still applied, thereby carrying out a poling treatment.
  • the glass transition temperature of the sample film was determined from the inflection point of the storage modulus (E') by dynamic mechanical analysis (DMA) in accordance with ASTM E1640-13. DMA was performed using the following apparatus and conditions.
  • the cantilever's warpage sensitivity, spring constant, and tip curvature were calibrated according to the PeakForceQNM mode manual, and then measurements were performed under the following conditions, and the data obtained from the DMT Modulus channel was adopted as one piece of data for the elastic modulus.
  • the spring constant and tip curvature vary depending on the individual cantilever, a cantilever that satisfies the conditions of a spring constant of 0.3 N/m to 0.5 N/m and a tip curvature radius of 15 nm or less was adopted and used for the measurement, as a range that does not affect the measurement.
  • the above measurements were carried out on five randomly selected samples, and the numerical average of the obtained data was regarded as the elastic modulus of the sample film.
  • Measurement equipment Atomic force microscope (AFM) manufactured by Burker Corporation
  • Measurement mode PeakForceQNM (force curve method)
  • Cantilever Bruker AXS SCANASYST-AIR (Material: Si, spring constant K: 0.4 N/m, tip curvature radius R: 2 nm)
  • Measurement atmosphere 23°C, in air Measurement range: 3 ⁇ m Square resolution: 512 x 512
  • Maximum pressing load 10 nN.
  • Example 1 In dehydrated DMAc (boiling point 165°C), 5-nitro-m-phenylenediamine, which corresponds to 100 mol% of the total amount of diamine as a diamine, was dissolved under nitrogen flow, and the liquid temperature was cooled to 5°C in an ice water bath. 2-nitroisophthalic acid dichloride, which corresponds to 99 mol% of the total amount of diamine, was added thereto over 30 minutes while keeping the inside of the system in an ice water bath under nitrogen flow, and after the entire amount was added, the mixture was stirred for about 1 hour to polymerize aromatic polyamide (polymer A).
  • the obtained polymerization solution was added to a large amount of pure water while stirring, so that polymer A was solidified into a fibrous form, which was then crushed in a mixer for 5 minutes, and dried in a hot air oven at 80°C for 1 hour and in a vacuum oven at 120°C for 12 hours to obtain a powder of polymer A.
  • a solution was obtained by dissolving polymer A in DMAc so that the polymer concentration was 10% by mass.
  • a film of the polymer A solution was applied to a glass plate with an Al electrode, and the plate was dried in a hot air oven at 130°C for 10 minutes, and then subjected to a poling treatment under the above-mentioned conditions to obtain a film of polymer A having a thickness of 10 ⁇ m.
  • the polymer A has a structure described in chemical formula (VIV) in which Ar 5 is chemical formula (X) and Ar 6 is chemical formula (XIII).
  • Example 2 An aromatic polyamide (polymer B) and a film thereof were obtained in the same manner as in Example 1, except that 5-trifluoro-m-phenylenediamine was used instead of 5-nitro-m-phenylenediamine.
  • the evaluation results of the obtained sample are shown in Table 1.
  • Polymer B has a structure represented by chemical formula (IX), in which Ar 5 is represented by chemical formula (X) and Ar 6 is represented by chemical formula (XIII).
  • Example 3 An aromatic polyamide (polymer C) and a film thereof were obtained in the same manner as in Example 1, except that 3,3'-sulfonylbisbenzoic acid dichloride was used instead of 2-nitroisophthalic acid dichloride. The evaluation results of the obtained sample are shown in Table 1.
  • Polymer C has a structure represented by chemical formula (IX), in which Ar 5 is represented by chemical formula (X) and Ar 6 is represented by chemical formula (XIV).
  • Example 4 An aromatic polyamide (polymer D) and a film thereof were obtained in the same manner as in Example 1, except that 4,4'-diaminodiphenylsulfone was used instead of 5-nitro-m-phenylenediamine.
  • the evaluation results of the obtained sample are shown in Table 1.
  • Polymer D has a structure represented by chemical formula (IX) in which Ar 5 is represented by chemical formula (X) and Ar 6 is represented by chemical formula (XI).
  • Example 5 An aromatic polyamide (polymer E) and a film thereof were obtained in the same manner as in Example 1, except that 2,7-naphthalenedicarbonyl dichloride was used instead of 2-nitroisophthalic acid dichloride. The evaluation results of the obtained sample are shown in Table 1.
  • Polymer E has a structure represented by chemical formula (III), in which Ar 3 is represented by chemical formula (IV) and Ar 4 is represented by chemical formula (V).
  • Example 6 An aromatic polyamide (polymer F) and a film thereof were obtained in the same manner as in Example 1, except that 1,6-naphthalenedicarbonyl dichloride was used instead of 2-nitroisophthalic acid dichloride. The evaluation results of the obtained sample are shown in Table 1.
  • Polymer F has a structure represented by chemical formula (III) in which Ar 3 is represented by chemical formula (IV) and Ar 4 is represented by chemical formula (VI).
  • Example 7 After dissolving 2,5-thiophenedicarboxylic acid-1,1-dioxide in dehydrated chlorobenzene, oxalyl chloride equivalent to 2.2 molar equivalents relative to the dicarboxylic acid was added dropwise at room temperature. The solution was heated to 60°C and stirred for 2 hours, then returned to room temperature and distilled under reduced pressure to remove excess oxalyl chloride. Heptane was added to the reaction solution to precipitate 2,5-thiophenedicarboxylic acid dichloride-1,1-dioxide. The powder was filtered and then dried under reduced pressure to isolate it.
  • Polymer G An aromatic polyamide (Polymer G) and a film thereof were obtained in the same manner as in Example 1, except that the 2,5-thiophenedicarboxylic acid dichloride-1,1-dioxide obtained by the above method was used instead of 2-nitroisophthalic acid dichloride.
  • the evaluation results of the obtained sample are shown in Table 1. Note that Polymer G does not have any of the structures shown in chemical formulas (III) and (IX).
  • Example 8 An aromatic polyamide (polymer H) and a film thereof were obtained in the same manner as in Example 1, except that 5-nitro-m-phenylenediamine equivalent to 80 mol % and 2-chloro-p-phenylenediamine equivalent to 20 mol % were added instead of 5-nitro-m-phenylenediamine equivalent to 100 mol % based on the total amount of diamines.
  • the evaluation results of the obtained sample are shown in Table 1.
  • Polymer H contains a structure represented by chemical formula (IX), in which Ar 5 is chemical formula (IX) and Ar 6 is chemical formula (XIII).
  • Example 9 An aromatic polyamide (polymer I) and a film thereof were obtained in the same manner as in Example 1, except that 2-nitroisophthalic acid dichloride corresponding to 80 mol % and 2-chloroterephthalic acid dichloride corresponding to 19 mol % were added instead of 2-nitroisophthalic acid dichloride corresponding to 99 mol % based on the total amount of diamine.
  • the evaluation results of the obtained sample are shown in Table 1.
  • Polymer I contains a structure represented by chemical formula (IX) in which Ar 5 is chemical formula (X) and Ar 6 is chemical formula (XIII).
  • Example 10 An aromatic polyamide (polymer A) and a film thereof were obtained in the same manner as in Example 1, except that instead of carrying out the poling treatment, both ends of the dried film were supported and the film was uniaxially stretched to 1.1 times at 130° C. using a stretching machine.
  • the evaluation results of the obtained sample are shown in Table 1.
  • Comparative Example 1 In the dehydrated DMAc, 2,2'-ditrifluoromethyl-4,4'-diaminobiphenyl (TFMB) was dissolved in an amount equivalent to 100 mol% of the total amount of diamines under a nitrogen stream, and the liquid temperature was cooled to 5°C in an ice water bath.
  • TFMB 2,2'-ditrifluoromethyl-4,4'-diaminobiphenyl
  • the obtained polymerization solution was added to a large amount of pure water while stirring to solidify polymer K into a fibrous form, which was then crushed in a mixer for 5 minutes, and dried in a hot air oven at 80° C. for 1 hour and in a vacuum oven at 120° C. for 12 hours to obtain a powder of polymer K.
  • a solution was obtained by dissolving polymer K in DMAc so that the polymer concentration was 10% by mass.
  • a film of the solution of polymer K was applied onto a glass plate with an Al electrode, and the film was dried in a hot air oven at 130° C. for 10 minutes, and then subjected to a poling treatment under the above-mentioned conditions to obtain a film of polymer K having a thickness of 10 ⁇ m.
  • the evaluation results of the obtained sample are shown in Table 1. Note that polymer K does not have any of the structures described in chemical formulas (III) and (IX).
  • the obtained polymerization solution was added to a large amount of pure water while stirring to solidify polymer L into a fibrous form, which was then crushed in a mixer for 5 minutes and dried in a hot air oven at 80°C for 1 hour and in a vacuum oven at 120°C for 12 hours to obtain a powder of polymer L.
  • a solution was obtained by dissolving polymer L in DMAc so that the polymer concentration was 10% by mass.
  • a film of the polymer L solution was applied to a glass plate with an Al electrode, and the plate was dried in a hot air oven at 130°C for 10 minutes, and then subjected to a poling treatment under the above-mentioned conditions to obtain a film of polymer L having a thickness of 10 ⁇ m.
  • the polymer L has a structure described in chemical formula (III) in which both Ar 3 and Ar 4 are chemical formula (IV).

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Abstract

[Problem] To provide a polymer, an aromatic polyamide, a molded object, and a film which have excellent piezoelectric properties and mechanical properties. [Solution] A polymer that has a repeating unit in which hydrogen-bonding groups are bonded to ring-member atoms and the number of atoms present on the shortest of paths which each connect an atom of one hydrogen-bonding group to an atom of another hydrogen-bonding group is an odd number, and that has a residual polarization of 15 mC/m2 to 300 mC/m2.

Description

ポリマー、芳香族ポリアミド、成形体、フィルム、振動センサー、スピーカー、構造ヘルスモニタリングシステムPolymers, aromatic polyamides, moldings, films, vibration sensors, speakers, structural health monitoring systems

 本発明は、強誘電性を持つポリマー、芳香族ポリアミド、成形体、フィルムに関するものである。 The present invention relates to ferroelectric polymers, aromatic polyamides, molded bodies, and films.

強誘電性材料はその圧電性、焦電性により各種センサー、画像記録用途に用いられている。従来から強誘電性材料としては、PbZrTiO(PZT)に代表される無機系材料や、ポリフッ化ビニリデン(PVDF)などのフッ化ビニリデン系ポリマーやポリ乳酸、奇数ナイロンに代表される高分子系材料が知られている。これらのうち、無機系材料は、焦電性や耐熱性に優れるといった特性面の利点を備えるが、柔軟性が乏しく、成形加工が困難であるため、大面積、薄膜、複雑な形状の圧電素子の材料としては不適である。
一方、高分子系材料は、圧電・焦電率は無機系材料に比べて低い反面、比熱や誘電率が小さいため性能指数も良好であり、ウェアラブルデバイスをはじめとする柔軟性、軽量性、大面積が求められる用途において圧電素子として利用されたり、メモリ材料などへの応用が検討されている。
高分子系材料の場合、高分子中の双極子の向きを一方向に揃えることで残留分極が形成され、強誘電性が発現する。双極子の配向は多くの場合、材料中の分子配向や結晶系によりポリマー鎖の高次構造を制御することにより達成される。この方法として、例えば、ポリマーをガラス転移温度以上、融点以下の温度とするなど、ポリマー鎖が運動可能な状態とした上で、ある一定時間ポリマーに電界を印加してその電界を維持した状態で構造を固定化する、いわゆるポーリング処理を行なう方法や、機械的に一軸延伸、二軸延伸を行なう方法などが挙げられる。しかしながら、使用上で材料に発生する応力や熱により高次構造が崩れることで強誘電性が失活するため、耐久性や使用環境に制限があることが、高分子系材料の課題である。
Ferroelectric materials are used in various sensors and image recording applications due to their piezoelectricity and pyroelectricity. Conventionally, inorganic materials such as PbZrTiO 3 (PZT) and polymeric materials such as vinylidene fluoride polymers such as polyvinylidene fluoride (PVDF), polylactic acid, and odd-numbered nylon are known as ferroelectric materials. Among these, inorganic materials have advantages in terms of characteristics such as excellent pyroelectricity and heat resistance, but are poor in flexibility and difficult to mold, making them unsuitable as materials for large-area, thin-film, and complex-shaped piezoelectric elements.
On the other hand, while polymer-based materials have lower piezoelectric and pyroelectric coefficients than inorganic materials, their specific heat and dielectric constant are small and therefore their performance index is good. They are therefore used as piezoelectric elements in applications that require flexibility, light weight, and large area, such as wearable devices, and their applications as memory materials, etc. are being investigated.
In the case of polymer-based materials, remanent polarization is formed by aligning the dipoles in the polymer in one direction, and ferroelectricity is expressed. In many cases, the orientation of the dipoles is achieved by controlling the higher-order structure of the polymer chains through the molecular orientation and crystal system in the material. For example, the polymer is heated to a temperature above the glass transition temperature and below the melting point so that the polymer chains can move, and then an electric field is applied to the polymer for a certain period of time to fix the structure while maintaining the electric field, which is called poling treatment, or mechanical uniaxial or biaxial stretching. However, the higher-order structure is destroyed by stress or heat generated in the material during use, which deactivates the ferroelectricity, and this limits the durability and usage environment, which is an issue for polymer-based materials.

 強誘電性に合わせて高い耐久性を持つことが期待される高分子材料として、芳香族ポリアミドが挙げられる。特に、全芳香族ポリアミドは優れた耐熱性、耐薬品性を有しているため、耐熱性の繊維、高弾性繊維として利用されている一方で、双極子モーメントの大きなアミド結合を有していることから、芳香族の構造を適切に選択することにより、奇数ナイロン同様の強誘電性を示すことが期待される。このような材料の例として、例えば特許文献1に、残留分極を有するポリアミドフィルムが開示されている。特許文献2には、ポリアミド系液晶配向剤ワニスが開示されている。特許文献3には、強誘電性の芳香族ポリアミドと液晶性高分子の混合体が開示されている。特許文献4には、強誘電性の芳香族ポリアミドと融点ならびにガラス転移温度を有する高分子のブロック共重合体が開示されている。特許文献5には、有機溶剤に溶解した脂肪族ポリアミドを基材上に塗布し乾燥させて得たフィルムを熱処理および冷却した後、一軸延伸することで圧電性ポリアミドフィルムを得る製造方法が開示されている。 Aromatic polyamides are polymeric materials that are expected to have high durability in addition to ferroelectricity. In particular, fully aromatic polyamides have excellent heat resistance and chemical resistance, and are therefore used as heat-resistant and highly elastic fibers. On the other hand, because they have amide bonds with large dipole moments, it is expected that they will exhibit ferroelectricity similar to that of odd-numbered nylons by appropriately selecting the aromatic structure. As an example of such a material, for example, Patent Document 1 discloses a polyamide film with residual polarization. Patent Document 2 discloses a polyamide-based liquid crystal alignment agent varnish. Patent Document 3 discloses a mixture of ferroelectric aromatic polyamide and liquid crystal polymer. Patent Document 4 discloses a block copolymer of ferroelectric aromatic polyamide and a polymer having a melting point and glass transition temperature. Patent Document 5 discloses a manufacturing method in which an aliphatic polyamide dissolved in an organic solvent is applied to a substrate, dried, the resulting film is heat-treated and cooled, and then uniaxially stretched to obtain a piezoelectric polyamide film.

特開平8-302036号公報Japanese Patent Application Publication No. 8-302036 特開2002-363280号公報JP 2002-363280 A 特開2002-37889号公報JP 2002-37889 A 特開2001-279117号公報JP 2001-279117 A 特開2020-167203号公報JP 2020-167203 A

 しかしながら、特許文献1~2に開示されている芳香族ポリアミドは全芳香族ポリアミドではなく、アルキル部位を構造中に含むことで誘電率や残留分極が低減する場合がある。また、特許文献3~4に開示されている芳香族ポリアミド系材料は、ポリマーのガラス転移温度および/または融点を工業的に扱いやすい温度とするために柔軟な高分子構造を導入しているが、これにより芳香族ポリアミド部位の含有量が低下して強誘電性が低減する場合がある。特許文献5に開示されている圧電性フィルムの製造方法は脂肪族ポリアミドに限定されており、ポリマーの溶解性やパッキング性の差異から、記載の製造方法を全芳香族ポリアミドに適用することは困難である。また上記の構造の差異に起因して、特許文献1~5に開示される材料はいずれも、全芳香族ポリアミドと比較した場合、熱や応力に対する耐久性が劣ることがある。 However, the aromatic polyamides disclosed in Patent Documents 1 and 2 are not fully aromatic polyamides, and the inclusion of alkyl moieties in the structure may reduce the dielectric constant and residual polarization. In addition, the aromatic polyamide-based materials disclosed in Patent Documents 3 and 4 introduce a flexible polymer structure to make the glass transition temperature and/or melting point of the polymer industrially easy to handle, but this may reduce the content of aromatic polyamide moieties and reduce ferroelectricity. The manufacturing method for piezoelectric films disclosed in Patent Document 5 is limited to aliphatic polyamides, and due to differences in the solubility and packing properties of the polymers, it is difficult to apply the described manufacturing method to fully aromatic polyamides. In addition, due to the above-mentioned structural differences, all of the materials disclosed in Patent Documents 1 to 5 may have inferior durability to heat and stress compared to fully aromatic polyamides.

 本発明は、繰り返し単位中の各アミド基が奇数個の原子を介して接続され、アミド基が芳香族環員原子に結合している強誘電性芳香族ポリアミドとすることで、圧電特性、機械特性、および耐熱性に優れた成形体および/またはフィルムを提供することを目的とする。 The present invention aims to provide a molded article and/or film with excellent piezoelectric properties, mechanical properties, and heat resistance by forming a ferroelectric aromatic polyamide in which each amide group in the repeating unit is connected via an odd number of atoms and the amide group is bonded to an aromatic ring atom.

上記目的を達成するための本発明は、以下を特徴とする。
(1)下記化学式(I)で示される構造を繰り返し単位として含むポリマーであって、下記(i)および(ii)を満たすポリマー。
(i):化学式(I)中の水素結合性基Aが環員原子に結合している。
(ii):化学式(I)中の二つのA間の原子を結ぶ経路において、最短となる経路上に存在する原子の個数が奇数である。
化学式(I):
In order to achieve the above object, the present invention is characterized as follows.
(1) A polymer containing a structure represented by the following chemical formula (I) as a repeating unit, which satisfies the following (i) and (ii):
(i): The hydrogen-bonding group A in the chemical formula (I) is bonded to a ring atom.
(ii): In the chemical formula (I), the number of atoms on the shortest path connecting the two A atoms is odd.
Chemical formula (I):

Figure JPOXMLDOC01-appb-C000015
Figure JPOXMLDOC01-appb-C000015

Aは水素結合性基であり、B,Bはn員環基(ただしnは5以上10以下のいずれかの自然数)である。
(2)残留分極が15mC/m以上300mC/m以下である、(1)に記載のポリマー。
(3)水素結合性基Aがアミド基、ウレア基、ウレタン基の少なくともいずれかである、(1)または(2)に記載のポリマー。
(4)水素結合性基Aがアミド基であり、B、Bがいずれも芳香族基である、芳香族ポリアミド。
(5)下記化学式(II)で示される構造を繰り返し単位として含む芳香族ポリアミドであって、下記(iii)および(iv)を満たし、残留分極が15mC/m以上である、芳香族ポリアミド。
(iii):化学式(II)中のXが芳香族環員原子に結合している。
(iv):化学式(II)中の二つのX間の原子を結ぶ経路において、最短となる経路上に存在する原子の個数が奇数である。
化学式(II):
A is a hydrogen-bonding group, and B 1 and B 2 are n-membered ring groups (n is a natural number of 5 or more and 10 or less).
(2) The polymer according to (1), having a remanent polarization of 15 mC/ m2 or more and 300 mC/ m2 or less.
(3) The polymer according to (1) or (2), wherein the hydrogen-bonding group A is at least one of an amide group, a urea group, and a urethane group.
(4) An aromatic polyamide, in which the hydrogen-bonding group A is an amide group, and both B 1 and B 2 are aromatic groups.
(5) An aromatic polyamide containing a structure represented by the following chemical formula (II) as a repeating unit, which satisfies the following (iii) and (iv) and has a remanent polarization of 15 mC/m2 or more .
(iii): X in the chemical formula (II) is bonded to an aromatic ring atom.
(iv): In the chemical formula (II), the number of atoms on the shortest path connecting the two X atoms is odd.
Chemical formula (II):

Figure JPOXMLDOC01-appb-C000016
Figure JPOXMLDOC01-appb-C000016

Xはアミド基であり、Ar,Arは芳香族基である。
(6)繰り返し単位中の構造が下記(v)~(viii)の少なくともいずれかを満たす、(1)~(5)のいずれかに記載のポリマーおよび/または芳香族ポリアミド。
(v):2つのアミド基N原子間をつなぐ結合に沿った経路のうち、最短経路上の原子に電子供与基が結合している。
(vi):2つのアミド基C原子間をつなぐ結合に沿った経路のうち、最短経路上の原子に電子吸引基が結合している。
(vii):2つのアミド基N原子間をつなぐ結合に沿った経路のうち、最短経路上でない原子に電子吸引基が結合している。
(viii):2つのアミド基C原子間をつなぐ結合に沿った経路のうち、最短経路上でない原子に電子供与基が結合している。
(7)下記化学式(III)で示される分子骨格構造を持つ、(1)~(6)に記載のポリマーおよび/または芳香族ポリアミド。
化学式(III):
X is an amide group, and Ar 1 and Ar 2 are aromatic groups.
(6) The polymer and/or aromatic polyamide according to any one of (1) to (5), wherein the structure in the repeating unit satisfies at least any one of the following (v) to (viii):
(v): An electron-donating group is bonded to an atom on the shortest path along the bonds connecting the N atoms of the two amide groups.
(vi): An electron-withdrawing group is bonded to an atom on the shortest path along the bond connecting the two C atoms of the amide groups.
(vii): An electron-withdrawing group is bonded to an atom that is not on the shortest path along the bond connecting the two N atoms of the amide groups.
(viii): An electron-donating group is bonded to an atom that is not on the shortest path along the bond connecting the two C atoms of the amide groups.
(7) The polymer and/or aromatic polyamide according to any one of (1) to (6) above, which has a molecular skeleton structure represented by the following chemical formula (III):
Chemical formula (III):

Figure JPOXMLDOC01-appb-C000017
Figure JPOXMLDOC01-appb-C000017

Ar、Arは化学式(IV)~(VIII)に示す分子骨格構造を含む基。
化学式(IV):
Ar 3 and Ar 4 are groups containing the molecular skeleton structures shown in chemical formulas (IV) to (VIII).
Chemical formula (IV):

Figure JPOXMLDOC01-appb-C000018
Figure JPOXMLDOC01-appb-C000018

化学式(V): Chemical formula (V):

Figure JPOXMLDOC01-appb-C000019
Figure JPOXMLDOC01-appb-C000019

化学式(VI): Chemical formula (VI):

Figure JPOXMLDOC01-appb-C000020
Figure JPOXMLDOC01-appb-C000020

化学式(VII): Chemical formula (VII):

Figure JPOXMLDOC01-appb-C000021
Figure JPOXMLDOC01-appb-C000021

は(6)における(v)~(viii)を満たす任意の基。
化学式(VIII):
R 1 is any group satisfying (v) to (viii) in (6).
Chemical formula (VIII):

Figure JPOXMLDOC01-appb-C000022
Figure JPOXMLDOC01-appb-C000022

は(6)における(v)~(viii)を満たす任意の基。
(8)下記化学式(IX)で示される構造を持つ、(1)~(7)に記載のポリマーおよび/または芳香族ポリアミド。
化学式(IX):
R2 is any group satisfying (v) to (viii) in (6).
(8) The polymer and/or aromatic polyamide according to any one of (1) to (7) above, having a structure represented by the following chemical formula (IX):
Chemical formula (IX):

Figure JPOXMLDOC01-appb-C000023
Figure JPOXMLDOC01-appb-C000023

Arは化学式(X)~(XII)に示す構造を含み、Arは化学式(XIII)~(XV)に示す構造を含む基。
化学式(X):
Ar 5 is a group including a structure represented by any one of chemical formulas (X) to (XII), and Ar 6 is a group including a structure represented by any one of chemical formulas (XIII) to (XV).
Chemical formula (X):

Figure JPOXMLDOC01-appb-C000024
Figure JPOXMLDOC01-appb-C000024

は-Hまたは電子供与基、Rは電子吸引基である。
化学式(XI):
R3 is --H or an electron donating group, and R4 is an electron withdrawing group.
Chemical formula (XI):

Figure JPOXMLDOC01-appb-C000025
Figure JPOXMLDOC01-appb-C000025

は電子供与基である。
化学式(XII):
R5 is an electron donating group.
Chemical formula (XII):

Figure JPOXMLDOC01-appb-C000026
Figure JPOXMLDOC01-appb-C000026

は電子吸引基である。
化学式(XIII):
R6 is an electron withdrawing group.
Chemical formula (XIII):

Figure JPOXMLDOC01-appb-C000027
Figure JPOXMLDOC01-appb-C000027

は電子吸引基、Rは-Hまたは電子供与基である。
化学式(XIV):
R 7 is an electron withdrawing group and R 8 is --H or an electron donating group.
Chemical formula (XIV):

Figure JPOXMLDOC01-appb-C000028
Figure JPOXMLDOC01-appb-C000028

は電子吸引基である。
化学式(XV):
R9 is an electron withdrawing group.
Chemical formula (XV):

Figure JPOXMLDOC01-appb-C000029
Figure JPOXMLDOC01-appb-C000029

10は電子供与基である。
(9)炭素数1以上3以下のパーフルオロアルキル基、ニトロ基、シアノ基、スルホン基の少なくともいずれかの基を含む、(1)~(8)に記載のポリマーおよび/または芳香族ポリアミド。
(10)ガラス転移温度が130℃以上400℃以下である、(1)~(9)に記載のポリマーおよび/または芳香族ポリアミド。
(11)(1)~(10)に記載のポリマーおよび/または芳香族ポリアミドを主成分とする成形体。
(12)圧電定数d31またはd33の少なくともいずれかが0pC/Nより大きく50.0pC/N以下である、(11)に記載の成形体。
(13)(1)~(10)に記載のポリマーおよび/または芳香族ポリアミドを主成分とするフィルム。
(14)AFMにより得られる弾性率が4.0GPa以上15.0GPa以下であることを特徴とする、(13)に記載のフィルム。
(15)規格化分子配向MORcが1.1以上15以下である、(13)に記載のフィルム。
(16)150℃で10分間の加熱処理を行った後の静電定数をd‘としたとき、加熱処理による圧電定数の変化の絶対値|(d31-d’31)/d31|および|(d33-d’33)/d33|のうち大きい方の値が0以上0.5以下である、(11)に記載の成形体。
(17)(11)に記載の成形体および/または(13)に記載のフィルムを含む、圧電素子。
(18)(11)に記載の成形体および/または(13)に記載のフィルムを含む、アクチュエータ。
(19)(11)に記載の成形体および/または(13)に記載のフィルムを含む、振動子。
(20)(17)に記載の圧電素子を備えた、振動センサー。
(21)(18)にアクチュエータを備えた、スピーカー。
(22)少なくとも(20)に記載の振動センサーと通信装置を備え、該振動センサーにより構造物の振動状態を検出し、構造物を診断する構造ヘルスモニタリングシステム。
R10 is an electron donating group.
(9) The polymer and/or aromatic polyamide according to any one of (1) to (8), which contains at least one group selected from the group consisting of a perfluoroalkyl group having from 1 to 3 carbon atoms, a nitro group, a cyano group, and a sulfone group.
(10) The polymer and/or aromatic polyamide according to any one of (1) to (9), having a glass transition temperature of 130° C. or higher and 400° C. or lower.
(11) A molded article comprising as a main component the polymer and/or aromatic polyamide according to any one of (1) to (10).
(12) The molded article according to (11), wherein at least one of the piezoelectric constants d31 and d33 is greater than 0 pC/N and less than or equal to 50.0 pC/N.
(13) A film comprising as a main component the polymer and/or aromatic polyamide according to (1) to (10).
(14) The film according to (13), characterized in that the elastic modulus measured by AFM is 4.0 GPa or more and 15.0 GPa or less.
(15) The film according to (13), having a normalized molecular orientation MORc of 1.1 or more and 15 or less.
(16) The molded body according to (11), in which, when the electrostatic constant after heat treatment at 150° C. for 10 minutes is d', the larger of the absolute values of changes in the piezoelectric constant due to heat treatment, |(d 31 - d' 31 )/d 31 | and |(d 33 - d' 33 )/ d 33 |, is 0 or more and 0.5 or less.
(17) A piezoelectric element comprising the molded article according to (11) and/or the film according to (13).
(18) An actuator comprising the molded article according to (11) and/or the film according to (13).
(19) A vibrator comprising the molded article according to (11) and/or the film according to (13).
(20) A vibration sensor comprising the piezoelectric element according to (17).
(21) A speaker having an actuator as described in (18).
(22) A structural health monitoring system comprising at least the vibration sensor according to (20) and a communication device, the vibration sensor detecting the vibration state of a structure and diagnosing the structure.

 本発明によれば、本発明のポリマーおよび/または芳香族ポリアミドにより、圧電特性、機械特性、および耐熱性に優れた成形体および/またはフィルムを提供することができる。そのため、本発明のポリマー、芳香族ポリアミド、成形体、フィルムは、特に圧電素子、アクチュエータ、振動子などの部材として好適に使用できる。 According to the present invention, the polymer and/or aromatic polyamide of the present invention can provide a molded article and/or film that has excellent piezoelectric properties, mechanical properties, and heat resistance. Therefore, the polymer, aromatic polyamide, molded article, and film of the present invention can be suitably used as components for piezoelectric elements, actuators, vibrators, and the like.

本発明のポリマーは化学式(I)で示される構造を繰り返し単位として含むポリマーであって、下記(i)および(ii)を満たすことを特徴とする。
(i):化学式(I)中の水素結合性基Aが環員原子に結合している。
(ii):化学式(I)中の二つのA間の原子を結ぶ経路において、最短となる経路上に存在する原子の個数が奇数である。
The polymer of the present invention is a polymer containing a structure represented by chemical formula (I) as a repeating unit, and is characterized by satisfying the following (i) and (ii):
(i): The hydrogen-bonding group A in the chemical formula (I) is bonded to a ring atom.
(ii): In the chemical formula (I), the number of atoms on the shortest path connecting the two A atoms is odd.

 これらの特徴を満たすことで、水素結合性基に由来する優れた機械特性および熱安定性と、分子形状と配向性に起因する強誘電性を並立することができる。
優れた強誘電性を発現する観点で、本発明のポリマーは残留分極が15mC/m以上300mC/m以下であることが好ましい。また、効率的な水素結合性が得られることから、本発明のポリマーは化学式(I)中の水素結合性基Aがアミド基、ウレア基、ウレタン基の少なくともいずれかであることが好ましい。
本発明の芳香族ポリアミドは、下記化学式(II)で示される構造を繰り返し単位として含み、下記(iii)および(iv)を満たすことを特徴とする。
(iii):化学式(II)中のXが芳香族環員原子に結合している。
(iv):化学式(II)中の二つのX間の原子を結ぶ経路において、最短となる経路上に存在する原子の個数が奇数である。
化学式(II):
By satisfying these characteristics, it is possible to simultaneously achieve excellent mechanical properties and thermal stability derived from the hydrogen-bonding groups and ferroelectricity due to the molecular shape and orientation.
From the viewpoint of exhibiting excellent ferroelectricity, the polymer of the present invention preferably has a remanent polarization of 15 mC/m 2 or more and 300 mC/m 2 or less. In addition, in order to obtain efficient hydrogen bonding, the polymer of the present invention preferably has the hydrogen bonding group A in chemical formula (I) being at least one of an amide group, a urea group, and a urethane group.
The aromatic polyamide of the present invention is characterized in that it contains a structure represented by the following chemical formula (II) as a repeating unit and satisfies the following (iii) and (iv).
(iii): X in the chemical formula (II) is bonded to an aromatic ring atom.
(iv): In the chemical formula (II), the number of atoms on the shortest path connecting the two X atoms is odd.
Chemical formula (II):

Figure JPOXMLDOC01-appb-C000030
Figure JPOXMLDOC01-appb-C000030

Xはアミド基であり、Ar,Arは芳香族基である。 X is an amide group, and Ar 1 and Ar 2 are aromatic groups.

 これらの特徴を満たすことで、芳香族ポリアミドに由来する優れた機械特性および熱安定性と、分子形状と配向性に起因する強誘電性を並立することができる。 By satisfying these characteristics, it is possible to combine the excellent mechanical properties and thermal stability derived from aromatic polyamide with the ferroelectric properties resulting from molecular shape and orientation.

 ここで、芳香族環員原子とは、芳香族性を有する環状分子構造において環構造を形成している構成原子である。また、化学式(II)中の二つのX間の原子を結ぶ経路とは、隣り合う二つのXにおいて、一方のXが結合している原子からもう一方のXが結合している原子までに存在する原子を、結合に沿って結んだ経路のことである。最短となる経路とは、二つのX間の原子を結ぶ経路上に存在する原子の数が最も少なくなる経路のことである。例えば、化学式(II)のAr,Arとして、ベンゼン環の1位と3位にXがそれぞれ結合している場合(最短となる経路上の原子の個数が3)や、ナフタレン環の2位と7位にXがそれぞれ結合している場合(最短となる経路上の原子の個数が5)などは、上記(iii)および(iv)をともに満たすが、ベンゼン環の1位と4位にXが結合している場合(最短となる経路上の原子の数が4)は、(iv)を満たさない。 Here, the aromatic ring member atom is a constituent atom forming a ring structure in a cyclic molecular structure having aromaticity. In addition, the path connecting the atoms between two Xs in chemical formula (II) refers to a path connecting the atoms present from the atom to which one X is bonded to the atom to which the other X is bonded in two adjacent Xs along the bond. The shortest path refers to a path in which the number of atoms present on the path connecting the atoms between the two Xs is the smallest. For example, when X is bonded to the 1st and 3rd positions of the benzene ring as Ar 1 and Ar 2 in chemical formula (II) (the number of atoms on the shortest path is 3), or when X is bonded to the 2nd and 7th positions of the naphthalene ring (the number of atoms on the shortest path is 5), both of the above (iii) and (iv) are satisfied, but when X is bonded to the 1st and 4th positions of the benzene ring (the number of atoms on the shortest path is 4), (iv) is not satisfied.

 本発明のポリマーおよび/または芳香族ポリアミドは、残留分極の下限が15mC/m以上であることが好ましい。残留分極の下限が20mC/m以上であることがより好ましく、25mC/mであることがさらに好ましい。残留分極の下限が15mC/m未満である場合、強誘電性が低いため成形体やフィルムとしたときに圧電性が得られない場合がある。また、残留分極の上限が300mC/m以下であることが好ましく、50mC/mであることがより好ましい。残留分極の範囲として、15mC/m以上300mC/m以下であることが好ましく、20mC/m以上300mC/m以下であることがより好ましく、25mC/m以上300mC/m以下であることがさらに好ましく、25mC/m以上50mC/m以下であることが最も好ましい。残留分極を上記の範囲内とするには、芳香族ポリアミドが上述の構造を含むことや、延伸やポーリングなどの処理を施して芳香族ポリアミドのパッキングや異方性を向上することが重要である
 本発明の芳香族ポリアミドは、化学式(II)で示される繰り返し単位中の構造が下記(v)~(viii)の少なくともいずれかを満たすことが好ましい。
The polymer and/or aromatic polyamide of the present invention preferably has a lower limit of residual polarization of 15 mC/m 2 or more. More preferably, the lower limit of residual polarization is 20 mC/m 2 or more, and even more preferably, 25 mC/m 2. If the lower limit of residual polarization is less than 15 mC/m 2 , the ferroelectricity is low, so that piezoelectricity may not be obtained when the molded body or film is formed. In addition, the upper limit of residual polarization is preferably 300 mC/m 2 or less, and more preferably 50 mC/m 2. The range of residual polarization is preferably 15 mC/m 2 or more and 300 mC/m 2 or less, more preferably 20 mC/m 2 or more and 300 mC/m 2 or less, more preferably 25 mC/m 2 or more and 300 mC/m 2 or less, and most preferably 25 mC/m 2 or more and 50 mC/m 2 or less. In order to set the remanent polarization within the above range, it is important that the aromatic polyamide contains the above-mentioned structure and that the aromatic polyamide is subjected to a treatment such as stretching or poling to improve the packing and anisotropy of the aromatic polyamide. It is preferable that the structure in the repeating unit represented by chemical formula (II) of the aromatic polyamide of the present invention satisfies at least any one of the following (v) to (viii):

 (v):2つのアミド基N原子間をつなぐ結合に沿った経路のうち、最短経路上の原子に電子供与基が結合している。
(vi):2つのアミド基C原子間をつなぐ結合に沿った経路のうち、最短経路上の原子に電子吸引基が結合している。
(vii):2つのアミド基N原子間をつなぐ結合に沿った経路のうち、最短経路上でない原子に電子吸引基が結合している。
(viii):2つのアミド基C原子間をつなぐ結合に沿った経路のうち、最短経路上でない原子に電子供与基が結合している。
(v): An electron-donating group is bonded to an atom on the shortest path along the bonds connecting the N atoms of the two amide groups.
(vi): An electron-withdrawing group is bonded to an atom on the shortest path along the bond connecting the two C atoms of the amide groups.
(vii): An electron-withdrawing group is bonded to an atom that is not on the shortest path along the bond connecting the two N atoms of the amide groups.
(viii): An electron-donating group is bonded to an atom that is not on the shortest path along the bond connecting the two C atoms of the amide groups.

 ここで、電子吸引基および電子供与基とは、Hammett置換基定数(Chem.Rev.1991,91,99-257.など)により決定され、σ値が正の値である官能基が電子吸引基、σ値が負の値である官能基が電子供与基である。本発明において、電子吸引基は炭素数が1以上3以下であるパーフルオロアルキル基,スルホン基、ニトロ基、シアノ基の少なくともいずれかを含む基であり、電子供与基は炭素数が1以上3以下であるアルキル基、炭素数が1以上3以下のアルコキシ基、ヒドロキシ基の少なくともいずれかを含む基であることが好ましいが、これらの構造に制限するものではない。上記(v)~(viii)の少なくともいずれかを満たすことで、双極子モーメントが誘起されて残留分極が増大し、圧電特性を向上することができる。 Here, the electron-withdrawing group and the electron-donating group are determined by the Hammett substituent constant (Chem. Rev. 1991, 91, 99-257, etc.), and a functional group with a positive σ p value is an electron-withdrawing group, and a functional group with a negative σ p value is an electron-donating group. In the present invention, the electron-withdrawing group is a group containing at least one of a perfluoroalkyl group, a sulfone group, a nitro group, and a cyano group having 1 to 3 carbon atoms, and the electron-donating group is preferably a group containing at least one of an alkyl group having 1 to 3 carbon atoms, an alkoxy group having 1 to 3 carbon atoms, and a hydroxyl group, but is not limited to these structures. By satisfying at least one of the above (v) to (viii), a dipole moment is induced to increase the remanent polarization, and the piezoelectric properties can be improved.

 これらの特徴を満たす芳香族ポリアミドとしてメタ接合型全芳香族ポリアミドが挙げられるが、重合性や原料入手性の観点から、下記化学式(III)で示される構造を持つことが特に好ましい。
化学式(III):
An example of an aromatic polyamide that satisfies these characteristics is a meta-junction type wholly aromatic polyamide. From the viewpoint of polymerizability and availability of raw materials, it is particularly preferable that the polyamide has a structure represented by the following chemical formula (III).
Chemical formula (III):

Figure JPOXMLDOC01-appb-C000031
Figure JPOXMLDOC01-appb-C000031

Ar、Arは化学式(IV)~(VIII)に示す分子骨格構造を含む基であり、各分子骨格構造上には上記(v)~(viii)のいずれかを満たす任意の基が結合していても良い。
化学式(IV):
Ar 3 and Ar 4 are groups containing the molecular skeleton structures shown in chemical formulas (IV) to (VIII), and any group satisfying any of the above (v) to (viii) may be bonded to each of the molecular skeleton structures.
Chemical formula (IV):

Figure JPOXMLDOC01-appb-C000032
Figure JPOXMLDOC01-appb-C000032

化学式(V): Chemical formula (V):

Figure JPOXMLDOC01-appb-C000033
Figure JPOXMLDOC01-appb-C000033

化学式(VI): Chemical formula (VI):

Figure JPOXMLDOC01-appb-C000034
Figure JPOXMLDOC01-appb-C000034

化学式(VII): Chemical formula (VII):

Figure JPOXMLDOC01-appb-C000035
Figure JPOXMLDOC01-appb-C000035

は上記(v)~(viii)を満たす任意の基。
化学式(VIII):
R 1 is any group satisfying the above (v) to (viii).
Chemical formula (VIII):

Figure JPOXMLDOC01-appb-C000036
Figure JPOXMLDOC01-appb-C000036

は上記(v)~(viii)を満たす任意の基。 R2 is any group satisfying the above (v) to (viii).

 また、上記の中でも、下記化学式(IX)で示される構造単位を含むことが、高い剛性を実現する点で特に好ましい。
化学式(IX):
Among the above, it is particularly preferable that the structural unit represented by the following chemical formula (IX) is contained in order to realize high rigidity.
Chemical formula (IX):

Figure JPOXMLDOC01-appb-C000037
Figure JPOXMLDOC01-appb-C000037

Arは化学式(X)~(XII)に示す構造を含み、Arは化学式(XIII)~(XV)に示す構造を含む基。
化学式(X):
Ar 5 is a group including a structure represented by any one of chemical formulas (X) to (XII), and Ar 6 is a group including a structure represented by any one of chemical formulas (XIII) to (XV).
Chemical formula (X):

Figure JPOXMLDOC01-appb-C000038
Figure JPOXMLDOC01-appb-C000038

は-Hまたは電子供与基、Rは電子吸引基である。
化学式(XI):
R3 is --H or an electron donating group, and R4 is an electron withdrawing group.
Chemical formula (XI):

Figure JPOXMLDOC01-appb-C000039
Figure JPOXMLDOC01-appb-C000039

は電子供与基である。
化学式(XII):
R5 is an electron donating group.
Chemical formula (XII):

Figure JPOXMLDOC01-appb-C000040
Figure JPOXMLDOC01-appb-C000040

は電子吸引基である。
化学式(XIII):
R6 is an electron withdrawing group.
Chemical formula (XIII):

Figure JPOXMLDOC01-appb-C000041
Figure JPOXMLDOC01-appb-C000041

は電子吸引基、Rは-Hまたは電子吸引基である。
化学式(XIV):
R 7 is an electron withdrawing group and R 8 is --H or an electron withdrawing group.
Chemical formula (XIV):

Figure JPOXMLDOC01-appb-C000042
Figure JPOXMLDOC01-appb-C000042

は電子吸引基である。
化学式(XV):
R9 is an electron withdrawing group.
Chemical formula (XV):

Figure JPOXMLDOC01-appb-C000043
Figure JPOXMLDOC01-appb-C000043

10は電子供与基である。 R10 is an electron donating group.

 本発明の芳香族ポリアミドは、上述の構造を含む繰り返し単位の個数が、ポリマー中の全繰り返し単位の個数に対して80%以上100%以下であることが好ましい。上述の構造を含む繰り返し単位の割合が80%未満である場合、ポリマー鎖や双極子モーメントの配向性が悪化して強誘電性が低下する場合がある。 In the aromatic polyamide of the present invention, the number of repeating units containing the above-mentioned structure is preferably 80% or more and 100% or less of the total number of repeating units in the polymer. If the ratio of repeating units containing the above-mentioned structure is less than 80%, the orientation of the polymer chain and dipole moment may deteriorate, resulting in reduced ferroelectricity.

 本発明のポリマーおよび/または芳香族ポリアミドは、ガラス転移温度が、下限として130℃以上であることが好ましく、200℃以上であることがより好ましい。また、範囲として、130℃以上400℃以下に含まれることが好ましく、200℃以上400℃以下に含まれることがより好ましい。ガラス転移温度が130℃以上400℃以下であることで、熱や経時により強誘電性が低減するのを防ぐことができる。ガラス転移温度を130℃以上400℃以下とするには、芳香族ポリアミドが上述の構造を含むことや、ガラス転移温度が低い成分の含有量を低くすることが挙げられる。 The polymer and/or aromatic polyamide of the present invention preferably has a glass transition temperature of 130°C or higher, more preferably 200°C or higher. The range is preferably 130°C or higher and 400°C or lower, more preferably 200°C or higher and 400°C or lower. By having a glass transition temperature of 130°C or higher and 400°C or lower, it is possible to prevent the ferroelectricity from decreasing due to heat or over time. In order to achieve a glass transition temperature of 130°C or higher and 400°C or lower, the aromatic polyamide may include the above-mentioned structure or the content of components with low glass transition temperatures may be reduced.

 本発明の態様として、本発明のポリマーおよび/または芳香族ポリアミドを主成分とする成形体および/またはフィルムが挙げられる。ここで、ポリマーおよび/または芳香族ポリアミドを主成分とするとは、成形体および/またはフィルム中に最も多く含まれる成分が本発明に記載のポリマーおよび/または芳香族ポリアミドであることを表す。成分量は特に限定されないが、下限量としてはフィルム全体に対して70重量%以上であることが好ましく、80重量%以上であることがより好ましい。成分量の範囲として、好ましくはフィルム全体に対して70重量%以上100重量%以下、更に好ましくは80重量%以上100重量%以下であると、芳香族ポリアミド由来の機械特性がより発揮できる。 An embodiment of the present invention is a molded article and/or film that contains as a main component the polymer and/or aromatic polyamide of the present invention. Here, "containing as a main component the polymer and/or aromatic polyamide" means that the component contained in the largest amount in the molded article and/or film is the polymer and/or aromatic polyamide described in the present invention. The amount of the component is not particularly limited, but the lower limit is preferably 70% by weight or more, and more preferably 80% by weight or more, based on the entire film. The amount of the component is preferably in the range of 70% by weight to 100% by weight, and more preferably 80% by weight to 100% by weight, based on the entire film, so that the mechanical properties derived from the aromatic polyamide can be more effectively exhibited.

 本発明の成形体および/またはフィルムは、強誘電性材料を含んでも良い。本発明の成形体および/またはフィルムが強誘電性材料を含むことで、強誘電性が向上されて優れた圧電性能が得られる場合がある。ここで、強誘電性材料は有機系材料、無機系材料のいずれでも良く、例えば、有機系強誘電性材料としてはポリフッ化ビニリデン(PVDF)、フッ化ビニリデンとトリフルオロエチレンの共重合体、ナイロンなどが挙げられ、無機系強誘電性材料としてはチタン酸ジルコン酸鉛(PZT)、チタン酸バリウム(BTO)、チタン酸鉛(PTO)、チタン酸ビスマスナチリウム-チタン酸バリウム(BNT-BT)などが挙げられる。含まれる強誘電性材料としては、同一条件にてポーリング処理を実施した場合に得られる残留分極が、本発明のポリマーおよび/または芳香族ポリアミドより大きい材料であることが好ましい。 The molded article and/or film of the present invention may contain a ferroelectric material. When the molded article and/or film of the present invention contains a ferroelectric material, the ferroelectricity may be improved and excellent piezoelectric performance may be obtained. Here, the ferroelectric material may be either an organic material or an inorganic material. For example, organic ferroelectric materials include polyvinylidene fluoride (PVDF), copolymers of vinylidene fluoride and trifluoroethylene, nylon, etc., and inorganic ferroelectric materials include lead zirconate titanate (PZT), barium titanate (BTO), lead titanate (PTO), bismuth sodium titanate-barium titanate (BNT-BT), etc. It is preferable that the ferroelectric material contained is a material that has a larger remanent polarization than the polymer and/or aromatic polyamide of the present invention when poling treatment is performed under the same conditions.

 また、本発明のフィルムは、膜厚を1μm以上200μm以下とすることが好ましい。膜厚が1μm未満である場合、ハンドリング性が悪化する場合がある。膜厚が200μmより大きい場合、柔軟性が低下して膜としての加工性が低減する場合がある。 Furthermore, it is preferable that the film of the present invention has a thickness of 1 μm or more and 200 μm or less. If the thickness is less than 1 μm, handling properties may deteriorate. If the thickness is more than 200 μm, flexibility may decrease, and workability as a film may decrease.

 本発明の成形体は、圧電定数d31またはd33の少なくともいずれかが、下限として0pC/Nより大きいことが好ましく、5pC/N以上であることがより好ましい。また、上限として、50pC/N以下であることが好ましく、40pC/Nであることがより好ましい。範囲として、0pC/Nより大きく50.0pC/N以下に含まれることが好ましく、0pC/Nより大きく40.0pC/N以下に含まれることがより好ましい。本発明において、圧電定数d31およびd33の測定方法は、十分に正確な値が得られる方法であれば特に限定されることはなく、任意の方法で測定および決定できる。例えば、測定サンプルの上面及び下面に、平面視で面積6×10-5の重複部が出るように、それぞれアルミニウム電極を蒸着する。絶縁粘着テープを貼りつけて補強したアルミニウム箔製の2本のリードを、導電性エポキシ樹脂を用いて上下の平面電極のそれぞれに接着する。動的粘弾性測定装置を用いて、該サンプルの両端に一定の周波数および振幅で変位を与えたときに現れた圧電信号を、チャージアンプを介してロガーで測定し、及び単位面積あたりの発生電荷量を計算することができる。本発明の成形体の圧電定数を上記範囲内とするには、ポーリング処理や延伸による配向処理を行うことで該成形体の残留分極を増大させることが好ましい。 In the molded body of the present invention, at least one of the piezoelectric constants d 31 and d 33 is preferably greater than 0 pC/N as a lower limit, and more preferably 5 pC/N or more. Moreover, as an upper limit, it is preferably 50 pC/N or less, and more preferably 40 pC/N. As a range, it is preferable that it is greater than 0 pC/N and 50.0 pC/N or less, and more preferably greater than 0 pC/N and 40.0 pC/N or less. In the present invention, the measurement method of the piezoelectric constants d 31 and d 33 is not particularly limited as long as it is a method that can obtain sufficiently accurate values, and can be measured and determined by any method. For example, aluminum electrodes are vapor-deposited on the upper and lower surfaces of the measurement sample so that an overlapping area of 6 × 10 -5 m 2 appears in a planar view. Two leads made of aluminum foil reinforced with insulating adhesive tape are bonded to each of the upper and lower planar electrodes using a conductive epoxy resin. Using a dynamic viscoelasticity measuring device, a piezoelectric signal that appears when a displacement is applied to both ends of the sample at a constant frequency and amplitude can be measured with a logger via a charge amplifier, and the amount of generated charge per unit area can be calculated. In order to set the piezoelectric constant of the molded article of the present invention within the above range, it is preferable to increase the residual polarization of the molded article by performing a poling treatment or an orientation treatment by stretching.

 本発明のフィルムは、原子間力顕微鏡(AFM)により得られる弾性率が下限として4.0GPa以上であることが好ましく、5.0GPa以上であることがより好ましい。また上限として、15.0GPa以下であることが好ましく、7.0GPa以下であることがより好ましい。弾性率の範囲として、4.0GPa以上15.0GPa以下であることが好ましい。より好ましくは5.0GPa以上15.0GPa以下であり、さらに好ましくは5.0GPa以上15.0GPa以下である。弾性率が4.0GPa未満である場合、成形体やフィルムとして使用した際に破れや破損が起こりやすくなる。弾性率が15.0GPaより大きい場合、変形しにくくなり圧電特性が得られない場合がある。該フィルムの弾性率を上記範囲内とすることで、歪みおよび/または電場変化に対してレスポンス性に優れた圧電性が得られ、センサーの応答性が向上したり、振動子の振動周波数を高帯域化できる。 The elastic modulus of the film of the present invention, as measured by an atomic force microscope (AFM), is preferably 4.0 GPa or more as a lower limit, and more preferably 5.0 GPa or more. The upper limit is preferably 15.0 GPa or less, and more preferably 7.0 GPa or less. The elastic modulus is preferably in the range of 4.0 GPa to 15.0 GPa. More preferably, it is 5.0 GPa to 15.0 GPa, and even more preferably, it is 5.0 GPa to 15.0 GPa. If the elastic modulus is less than 4.0 GPa, it is likely to break or be damaged when used as a molded body or film. If the elastic modulus is greater than 15.0 GPa, it may become difficult to deform and piezoelectric properties may not be obtained. By setting the elastic modulus of the film within the above range, piezoelectricity with excellent response to strain and/or electric field changes can be obtained, the responsiveness of the sensor can be improved, and the vibration frequency of the vibrator can be made wider.

 ここで、AFMにより得られる弾性率は、AFMのフォースカーブマッピング測定を行うことで測定される。AFMは試料とプローブ(探針)の原子間力を利用して試料の表面についての情報を得る走査型プローブ顕微鏡であり、試料とカンチレバーに備えられたプローブとの距離を変えながら、プローブに働く力(カンチレバーのたわみ量)を測定して、フォースカーブを取得する。このフォースカーブは試料表面の様々な情報を含んでおり、フォースカーブを解析することで、試料表面の様々な物理化学的特性を評価することができる。フォースカーブマッピング測定は、このフォースカーブの取得を、試料表面に対して平行にスキャンして、試料表面の多点において行うものであり、試料をAFMの試料固定台に固定し、試料の形状像をPeakForceQNMモード(フォースカーブを多点で連続自動測定するモード)で測定すればよい。フォースカーブマッピング測定の結果に基づき、既存のソフトウェア等を用いて弾性率について解析を行わせることで、試料の弾性率を評価できる。 Here, the elastic modulus obtained by AFM is measured by performing force curve mapping measurement of AFM. AFM is a scanning probe microscope that obtains information about the surface of a sample by utilizing the atomic force between the sample and the probe (tip). While changing the distance between the sample and the probe attached to the cantilever, the force acting on the probe (the amount of deflection of the cantilever) is measured to obtain a force curve. This force curve contains various information about the sample surface, and various physicochemical properties of the sample surface can be evaluated by analyzing the force curve. Force curve mapping measurement obtains this force curve at multiple points on the sample surface by scanning parallel to the sample surface. The sample is fixed to the sample fixing stage of the AFM, and the shape image of the sample is measured in PeakForceQNM mode (a mode that automatically measures force curves at multiple points continuously). The elastic modulus of the sample can be evaluated by analyzing the elastic modulus using existing software based on the results of the force curve mapping measurement.

 本発明のフィルムは、規格化分子配向MORcが、下限として1.1以上であることが好ましく、1.2以上であることがより好ましく、1.3以上であることがさらに好ましい。また上限として、15以下であることが好ましく、2以下であることがより好ましい。MORcが範囲として1.1以上15以下に含まれることが好ましい。より好ましくはMORcが1.2以上15以下であり、さらに好ましくはMORcが1.3以上15以下である。ここで規格化分子配向MORcはフィルム中の高分子鎖の配向の度合いを示す指標である分子配向度MORに基づいて決定される値である。分子配向度MORは、以下のようなマイクロ波測定法により測定される。 The normalized molecular orientation MORc of the film of the present invention is preferably 1.1 or more as a lower limit, more preferably 1.2 or more, and even more preferably 1.3 or more. The upper limit is preferably 15 or less, and even more preferably 2 or less. It is preferable that MORc is in the range of 1.1 to 15. More preferably, MORc is 1.2 to 15, and even more preferably, MORc is 1.3 to 15. Here, the normalized molecular orientation MORc is a value determined based on the molecular orientation degree MOR, which is an index showing the degree of orientation of polymer chains in the film. The molecular orientation degree MOR is measured by the following microwave measurement method.

 すなわち、高分子圧電フィルムを周知のマイクロ波透過型分子配向系のマイクロ波共振導波管中に、マイクロ波の進行方向と垂直な面内で0~360°回転させて、試料を透過したマイクロ波強度を測定することにより分子配向度MORを求めることができる。
規格化分子配向MORcは、基準厚さtcを50μmとしたときの分子配向度MORであって、下記式により求めることができる。
MORc=(tc/t)×(MOR-1)+1
ここで、tcは基準厚さ、tはフィルム厚さである。
規格化分子配向MORcは、公知の分子配向計で測定することができ、例えば王子計測機器株式会社製MOR-7015などで測定することができる。フィルムが延伸フィルムである場合、規格化分子配向MORcはフィルムの延伸倍率や延伸温度などの延伸条件や、温度や速度などの製膜条件によって制御することができる。規格化分子配向MORcを上記の範囲内とすることで、フィルム中の分子鎖の配向性および/またはパッキング性が向上して、優れた圧電性を得ることができる。MORcを上記範囲内とするには、成形体および/またはフィルムの主成分を本発明に記載のポリマーおよび/または芳香族ポリアミドとしたり、一軸延伸することが好ましい。
本発明の成形体および/またはフィルムは、150℃で10分の加熱処理を行った後の圧電定数をd‘としたとき、加熱処理による圧電定数の変化率の絶対値|(d31-d’31)/d31|および|(d33-d‘33)/d33|のうち大きい方の値が0以上0.5以下であることが好ましく、0以上0.3以下あることがより好ましく、0以上0.2以下であることがさらに好ましい。加熱処理による圧電定数の変化率を上記範囲内とすることで、温度条件に圧電特性が依存しにくくなり、センサーやアクチュエータが高温条件下や長時間での使用時の性能を安定化できる。加熱処理による圧電定数の変化率を上記範囲内とするには、成形体および/またはフィルムの主成分を本発明に記載のポリマーおよび/または芳香族ポリアミドとすることが好ましい。
ここで、150℃で10分の加熱処理を行った後の圧電定数d‘31およびd’33は、加熱処理を行った成形体および/またはフィルムを試料とすること以外は、上記のd31およびd33と同様の方法で測定することができる。成形体および/またはフィルムの加熱処理は、150℃に設定した熱風オーブン中に成形体および/またはフィルムを10分間静置することで行うのが好ましい。 本発明のる成形体および/またはフィルムは、機械特性や密度などを調整する目的で熱硬化性樹脂、紫外線硬化性樹脂、加水分解・縮合樹脂、アルコキシシラン化合物などの有機無機ハイブリット系樹脂などを含有していてもよい。また、粒子が含まれていてもよい。ここで、粒子とは無機粒子、有機粒子のいずれでもよい無機粒子は特に限定されないが、金属や半金属の酸化物、珪素化物、窒化物、ホウ素化物、塩化物、炭酸塩などが挙げられ、具体的には、シリカ(SiO)、酸化アルミニウム(Al)、酸化亜鉛(ZnO)、酸化ジルコニウム(ZrO)、酸化チタン(TiO)、酸化アンチモン(Sb)及びインジウムスズ酸化物(ITO)などが挙げられる。また、強誘電特性を増大する目的で、チタン酸ジルコン酸鉛(PZT)、チタン酸バリウム(BTO)、チタン酸鉛(PTO)、チタン酸ビスマスナチリウム-チタン酸バリウム(BNT-BT)などを含有していても良い。
That is, the polymer piezoelectric film is placed in a microwave resonant waveguide of a well-known microwave transmission type molecular orientation system, rotated 0 to 360° in a plane perpendicular to the direction of microwave propagation, and the microwave intensity transmitted through the sample is measured, thereby determining the molecular orientation ratio MOR.
The normalized molecular orientation MORc is the degree of molecular orientation MOR when the reference thickness tc is set to 50 μm, and can be calculated by the following formula.
MORc=(tc/t)×(MOR-1)+1
where tc is the reference thickness and t is the film thickness.
The normalized molecular orientation MORc can be measured by a known molecular orientation meter, for example, MOR-7015 manufactured by Oji Scientific Instruments Co., Ltd. When the film is a stretched film, the normalized molecular orientation MORc can be controlled by the stretching conditions such as the stretch ratio and stretching temperature of the film, and the film-forming conditions such as the temperature and speed. By setting the normalized molecular orientation MORc within the above range, the orientation and/or packing of the molecular chains in the film is improved, and excellent piezoelectricity can be obtained. In order to set the MORc within the above range, it is preferable that the main component of the molded body and/or film is the polymer and/or aromatic polyamide described in the present invention, or that the film is uniaxially stretched.
In the molded article and/or film of the present invention, when the piezoelectric constant after heat treatment at 150° C. for 10 minutes is d', the larger of the absolute values of the rate of change in the piezoelectric constant due to heat treatment |(d 31 -d' 31 )/d 31 | and |(d 33 -d' 33 )/d 33 | is preferably 0 to 0.5, more preferably 0 to 0.3, and even more preferably 0 to 0.2. By setting the rate of change in the piezoelectric constant due to heat treatment within the above range, the piezoelectric characteristics become less dependent on temperature conditions, and the performance of sensors and actuators can be stabilized under high temperature conditions or when used for a long time. In order to set the rate of change in the piezoelectric constant due to heat treatment within the above range, it is preferable that the molded article and/or film is mainly composed of the polymer and/or aromatic polyamide described in the present invention.
Here, the piezoelectric constants d' 31 and d' 33 after 10 minutes of heat treatment at 150°C can be measured in the same manner as d31 and d33 described above, except that the heat-treated molded body and/or film is used as the sample. The heat treatment of the molded body and/or film is preferably performed by leaving the molded body and/or film in a hot air oven set at 150°C for 10 minutes. The molded body and/or film of the present invention may contain organic-inorganic hybrid resins such as thermosetting resins, ultraviolet-curing resins, hydrolysis/condensation resins, and alkoxysilane compounds for the purpose of adjusting mechanical properties and density. Particles may also be included. Here, the particles may be either inorganic particles or organic particles. The inorganic particles are not particularly limited, but include oxides, silicides, nitrides, borides, chlorides, carbonates, etc. of metals or semimetals, and specific examples thereof include silica (SiO 2 ), aluminum oxide (Al 2 O 3 ), zinc oxide (ZnO), zirconium oxide (ZrO 2 ), titanium oxide (TiO 2 ), antimony oxide (Sb 2 O 3 ), indium tin oxide (ITO), etc. In addition, for the purpose of increasing ferroelectric properties, lead zirconate titanate (PZT), barium titanate (BTO), lead titanate (PTO), bismuth sodium titanate-barium titanate (BNT-BT), etc. may be contained.

 本発明のポリマー、芳香族ポリアミド、成形体、フィルム、およびその他含有物について、化学構造や含有する官能基、構成比の同定が必要な場合は、クロマトグラフィー、蒸留、分液、再沈殿などの手法を組み合わせて分離される各成分について、核磁気共鳴法(NMR)、フーリエ変換赤外分光法(FT-IR)、質量分析法(MS)、元素分析、単結晶構造解析などを組み合わせて解析を行うことができる。 If it is necessary to identify the chemical structure, functional groups, or composition ratio of the polymers, aromatic polyamides, molded articles, films, and other contents of the present invention, each component separated using a combination of techniques such as chromatography, distillation, separation, and reprecipitation can be analyzed using a combination of nuclear magnetic resonance (NMR), Fourier transform infrared spectroscopy (FT-IR), mass spectrometry (MS), elemental analysis, and single crystal structure analysis.

 以下、本発明のポリマー、芳香族ポリアミド、成形体、溶液の製造方法について説明するが、本発明はこれに限定されるものではない。  The methods for producing the polymer, aromatic polyamide, molded body, and solution of the present invention are described below, but the present invention is not limited thereto.

 ポリマーおよび/または芳香族ポリアミドを得る方法は溶液重合法や沈殿重合法など公知の種々の方法が利用可能である。例えば、溶液重合で芳香族ポリアミドを重合する場合、酸ジクロライドとジアミンを原料として、非プロトン性溶媒中、低温下にて反応させることで重合することができる。ここで、非プロトン性溶媒とは、プロトン(水素イオン)供与性を持たない極性溶媒であり、例えばN-メチル-2-ピロリドン、N,N-ジメチルアセトアミド、N,N-ジメチルイソブチルアミド、3-メトキシ-N,N-ジメチルプロパンアミド、テトラヒドロフラン、γ-ブチロラクトン、酢酸エチル、アセトニトリル、ジメチルホルムアミド、ジメチルスルホキシドなどが挙げられる。酸ジクロライドの失活を抑制するため、重合に使用する溶媒の水分率を0ppmより大きく500ppm以下(質量基準、以下同様)とすることが好ましく、0ppmより大きく200ppm以下とすることがより好ましい。ここで酸ジクロライドとジアミンとのモル比を等量とすると超高分子量のポリマーが生成する傾向にあるため、モル比を一方が他方の96.0~99.8%、より好ましくは96.0~99.0%になるように調整することが好ましい。このモル比で重合を行った場合、酸ジクロライドに対してジアミンが過剰量となるため、末端官能基はアミノ基となる。また、芳香族ポリアミドの重合反応は発熱を伴うが、重合中の溶液の温度を40℃以下にすることが好ましい。40℃を超えると、副反応が起きて、重合度が十分に上がらないことがある。重合中の溶液の温度は30℃以下にすることがより好ましい。 Polymers and/or aromatic polyamides can be obtained by various known methods such as solution polymerization and precipitation polymerization. For example, when polymerizing aromatic polyamides by solution polymerization, the raw materials, acid dichloride and diamine, can be reacted in an aprotic solvent at low temperature to polymerize. Here, an aprotic solvent is a polar solvent that does not have proton (hydrogen ion) donating properties, such as N-methyl-2-pyrrolidone, N,N-dimethylacetamide, N,N-dimethylisobutyramide, 3-methoxy-N,N-dimethylpropanamide, tetrahydrofuran, γ-butyrolactone, ethyl acetate, acetonitrile, dimethylformamide, and dimethylsulfoxide. In order to suppress the deactivation of the acid dichloride, it is preferable that the water content of the solvent used in polymerization is more than 0 ppm and less than 500 ppm (by mass, the same applies below), and more preferably more than 0 ppm and less than 200 ppm. Here, if the molar ratio of the acid dichloride and the diamine is equal, a polymer with an ultra-high molecular weight tends to be produced, so it is preferable to adjust the molar ratio so that one is 96.0 to 99.8% of the other, more preferably 96.0 to 99.0%. If polymerization is carried out at this molar ratio, the diamine will be in excess relative to the acid dichloride, and the terminal functional group will be an amino group. In addition, the polymerization reaction of aromatic polyamide is accompanied by heat generation, so it is preferable to keep the temperature of the solution during polymerization at 40°C or less. If it exceeds 40°C, side reactions may occur and the degree of polymerization may not increase sufficiently. It is more preferable to keep the temperature of the solution during polymerization at 30°C or less.

 ここで、酸ジクロライドとジアミンを原料とする場合、反応の進行に伴って塩化水素が副生するため、得られる芳香族ポリアミドの溶液は強い酸性を示す溶液となる。この溶液は腐食性が高く、そのままでは成形体やフィルムの製造工程において用いる金属基板などの部材が腐食され、使用できないことがある。副生する塩化水素を除去する方法として、重合時に中和剤を添加することで塩化水素を中和除去する方法や、ポリマーを析出させて単離する方法などが挙げられる。重合中に塩化水素を中和除去する場合、例えば、炭酸リチウム、炭酸カルシウム、水酸化カルシウムなどの無機中和剤により中和する方法が挙げられる。無機中和剤により中和する場合、溶液中には中和反応により生成した無機塩(例えば、塩化リチウムなど)が含まれる。この無機塩は溶媒中でイオン化し芳香族ポリアミドのアミド基に配位することで溶媒への溶解助剤として働くため、溶液のポットライフ向上や成形時のポリマーの凝集抑制に有効である。ただし、成形工程中に無機塩を除去する洗浄工程が必要となるため、成形体および/またはフィルムの寸法や製造工程によっては使用できないことがある。 Here, when acid dichloride and diamine are used as raw materials, hydrogen chloride is produced as a by-product as the reaction proceeds, and the resulting aromatic polyamide solution is a highly acidic solution. This solution is highly corrosive, and if used as is, it may corrode components such as metal substrates used in the manufacturing process of molded bodies and films, making them unusable. Methods for removing the by-product hydrogen chloride include a method of neutralizing and removing hydrogen chloride by adding a neutralizing agent during polymerization, and a method of precipitating and isolating the polymer. When neutralizing and removing hydrogen chloride during polymerization, for example, a method of neutralizing with an inorganic neutralizing agent such as lithium carbonate, calcium carbonate, or calcium hydroxide can be used. When neutralizing with an inorganic neutralizing agent, the solution contains inorganic salts (e.g., lithium chloride) produced by the neutralization reaction. These inorganic salts ionize in the solvent and coordinate with the amide groups of the aromatic polyamide, acting as a dissolving aid in the solvent, and are therefore effective in improving the pot life of the solution and suppressing the aggregation of the polymer during molding. However, since a washing process for removing the inorganic salts is required during the molding process, it may not be usable depending on the dimensions of the molded body and/or film and the manufacturing process.

 また、ポリマーを析出させて単離する場合、溶液重合で得られるポリマー溶液を多量の水などの貧溶媒と混和することでポリマーを固体として析出させ、濾別などにより溶液から分離することで、ポリマーと塩化水素を分離することができる。単離したポリマーを前述の非プロトン性溶媒へ再溶解することで、溶液とすることができる。ポリマーを析出させて塩化水素と分離することで、中和剤と塩化水素の反応で生じる中和生成物を含まず、成形体やフィルム中に残留する不純物量を低減することができる。 In addition, when isolating the polymer by precipitating it, the polymer solution obtained by solution polymerization is mixed with a large amount of a poor solvent such as water to precipitate the polymer as a solid, and the polymer can be separated from the solution by filtration or other methods to separate the polymer and hydrogen chloride. The isolated polymer can be redissolved in the aprotic solvent mentioned above to make it into a solution. By precipitating the polymer and separating it from the hydrogen chloride, it does not contain neutralization products generated by the reaction of the neutralizing agent with hydrogen chloride, and the amount of impurities remaining in the molded product or film can be reduced.

 本発明の芳香族ポリアミドに上記(v)~(viii)の少なくともいずれかを満たすように電子吸引基および/または電子供与基を導入する方法として、あらかじめ目的の位置に電子吸引基および/または電子供与基が置換されたモノマーを原料として芳香族ポリアミドを重合する方法や、原料となる芳香族ポリアミドを重合してから官能基化することで導入する方法などが挙げられる。芳香族ポリアミドの官能基化により導入する場合、芳香族上に導入された-Hやハロゲン基などの脱離基を起点として目的の官能基へ誘導化する方法が挙げられる。しかしながら、用いる官能基変換反応によっては位置選択性が乏しく目的でない構造となったり、反応性が十分でなく該官能基の導入率が低くなることがある。このため、あらかじめ電子吸引基および/または電子供与基が置換されたモノマーを原料とする方法が好ましい。 The method of introducing electron-withdrawing groups and/or electron-donating groups into the aromatic polyamide of the present invention so as to satisfy at least one of the above (v) to (viii) includes a method of polymerizing an aromatic polyamide using a monomer in which an electron-withdrawing group and/or an electron-donating group has been substituted at the desired position as a raw material, and a method of introducing the groups by polymerizing the aromatic polyamide as a raw material and then functionalizing it. When introducing the groups by functionalizing an aromatic polyamide, a method of derivatizing the desired functional group from a leaving group such as -H or a halogen group introduced on the aromatic group as a starting point is included. However, depending on the functional group conversion reaction used, the position selectivity may be poor, resulting in an unintended structure, or the reactivity may be insufficient, resulting in a low introduction rate of the functional group. For this reason, a method of using a monomer in which an electron-withdrawing group and/or an electron-donating group has been substituted at the desired position as a raw material is preferable.

 本発明の成形体および/またはフィルムは、本発明のポリマーおよび/または芳香族ポリアミドを含む溶液をモールドに充填したり基板上にキャストした後、硬化することで得ることが好ましい。ここでモールドや基板の材質や形状、充填および/またはキャスト方法は限定されず、成形体および/またはフィルムの目的や用途によって任意のものを使用できる。 The molded article and/or film of the present invention is preferably obtained by filling a solution containing the polymer and/or aromatic polyamide of the present invention into a mold or casting it onto a substrate, followed by curing. There are no limitations on the material or shape of the mold or substrate, or the filling and/or casting method, and any method can be used depending on the purpose and use of the molded article and/or film.

 本発明のフィルムは、上記のようにして得られたポリマーを溶媒に溶解し、基材上に塗布して製膜することで得ることができる。ここで、溶媒としてはポリマーを溶解する限り制限はないが、非プロトン性溶媒であることが好ましい。また、この溶液はフィルムの特性を向上する目的で、前述の樹脂、電解質、粒子などを含んでも良い。製膜法としては、例えば、予備乾燥工程、湿式浴での洗浄工程を経て熱処理を施す乾湿式法、洗浄工程を経ずに溶媒乾燥を施す乾式法、あるいは溶媒乾燥工程を経ずに湿式浴に導入後、熱処理を施す湿式法などが挙げられる。これらのうち、いずれの方法で製膜しても差し支えないが、工程の簡便性、およびデバイスの製造工程において対象物上にフィルムを形成できる加工性の観点から、乾式法で製膜することが好ましい。 The film of the present invention can be obtained by dissolving the polymer obtained as described above in a solvent and applying the solution to a substrate to form a film. There are no limitations on the solvent as long as it dissolves the polymer, but it is preferable that the solvent is an aprotic solvent. The solution may also contain the above-mentioned resin, electrolyte, particles, etc., in order to improve the properties of the film. Examples of film formation methods include a dry-wet method in which a preliminary drying step and a washing step in a wet bath are followed by a heat treatment, a dry method in which a solvent is dried without a washing step, or a wet method in which a heat treatment is performed after introduction into a wet bath without a solvent drying step. Any of these methods may be used to form a film, but it is preferable to form a film by a dry method from the viewpoints of process simplicity and processability that allows a film to be formed on an object in the device manufacturing process.

  基材上への塗布方法としては、口金やダイコート法、ローラーコート法、ワイヤーバーコート法、グラビアコート法などの公知の方法から選択できる。基材としては、原料溶液に腐食されず、溶媒乾燥の為の加熱で変形や変性を示さない材質であればよく、例えばガラス板、薄膜ガラス、樹脂フィルム、金属板、石英板、シリコンウェーハなどが挙げられる。また、基板の表面構造として平滑であっても微細構造を有していても構わない。
溶媒乾燥の方法としては、熱風、赤外線照射、マイクロ波照射などが挙げられ、特に限定されない。乾燥温度は50~400℃であることが好ましい。熱寸法安定性向上などの点で、乾燥工程において150~400℃の温度範囲の工程を含むことが、より好ましい。急激な溶媒蒸発による面荒れを防ぐ目的で、50~200℃にて予備乾燥後、200~400℃にて段階的に溶媒乾燥を施すことが、さらに好ましい。
The method of coating the substrate can be selected from known methods such as die coating, roller coating, wire bar coating, gravure coating, etc. The substrate may be any material that is not corroded by the raw material solution and does not deform or denature when heated for drying the solvent, and examples of the substrate include glass plates, thin glass films, resin films, metal plates, quartz plates, silicon wafers, etc. The surface structure of the substrate may be smooth or may have a fine structure.
Methods for drying the solvent include, but are not limited to, hot air, infrared irradiation, microwave irradiation, etc. The drying temperature is preferably 50 to 400°C. From the viewpoint of improving thermal dimensional stability, it is more preferable that the drying step includes a step in the temperature range of 150 to 400°C. For the purpose of preventing surface roughening due to rapid solvent evaporation, it is even more preferable to perform preliminary drying at 50 to 200°C and then stepwise solvent drying at 200 to 400°C.

 本発明のポリマー、芳香族ポリアミド、成形体、フィルムに残留分極を付与する方法として、成形時に延伸やポーリング処理を行っても良い。延伸を行う場合、上記の乾燥工程後のフィルムを延伸機により延伸することが好ましい。また、ポーリング処理を行う場合、得られたフィルムおよび/または成形体に電圧を印加することで実施できる。電圧の印加方法としては、公知の直流電圧印可処理、交流電圧印可処理、コロナ放電処理等の方法が挙げられ、フィルムや成形体の形状によって適切なものを選択できる。印加される電場としては10kV/mm以上150kV/mm以下の範囲とすることが好ましい。電極としては、従来から用いられているものとしてニードル電極、ワイヤー電極、網状電極、平板電極が挙げられるが、本発明はこれらに限定されるものではない。また、ポーリング処理には磁場を用いても良い。 As a method of imparting residual polarization to the polymer, aromatic polyamide, molded article, and film of the present invention, stretching or poling treatment may be performed during molding. When stretching is performed, it is preferable to stretch the film after the drying process described above using a stretching machine. Furthermore, when poling treatment is performed, it can be performed by applying a voltage to the obtained film and/or molded article. Methods for applying voltage include known methods such as DC voltage application treatment, AC voltage application treatment, and corona discharge treatment, and an appropriate method can be selected depending on the shape of the film or molded article. The applied electric field is preferably in the range of 10 kV/mm to 150 kV/mm. As electrodes, needle electrodes, wire electrodes, mesh electrodes, and flat electrodes have been conventionally used, but the present invention is not limited to these. Furthermore, a magnetic field may be used for poling treatment.

 本発明のポリマー、芳香族ポリアミド、成形体、フィルムは圧電素子、センサー、アクチュエータ、振動板、振動子、およびそれらの原料などとして好適に使用できる。
本発明の成形体および/またはフィルムを含んで成る圧電素子、アクチュエータ、および振動子は、本発明の成形体および/またはフィルムの少なくとも一面に導電性薄膜を有することを特徴とする。これにより、従来の高分子系圧電材料を含む圧電素子、アクチュエータ、および振動子と同等の簡便性を保ちながら、優れたレスポンス性や耐熱性を発揮できる。本発明の圧電素子、アクチュエータ、および振動子は、振動センサー、スピーカーなどに搭載される部材として好適に使用できる。
本発明の構造モニタリングシステムは、少なくとも本発明に記載の振動センサーと通信装置とを備え、該振動センサーにより構造物の振動状態を診断することを特徴とする。システムである。本発明の構造モニタリングシステムが本発明の振動センサーを備えることで耐久性が向上してメンテナンス頻度を低減できる。ここで、構造ヘルスモニタリングシステムとは、地震等の外的要因や、モーター等の駆動部による発生する振動などに対して対象となる構造物の振動状態を測定することで、該構造体がどの程度尾耐久性を持つかを診断したり、経年劣化を検出したり、構造体の補修時期等を算出するシステムである。
The polymer, aromatic polyamide, molded article and film of the present invention can be suitably used as a piezoelectric element, a sensor, an actuator, a diaphragm, a vibrator, and a raw material thereof.
The piezoelectric element, actuator, and vibrator comprising the molded article and/or film of the present invention are characterized by having a conductive thin film on at least one surface of the molded article and/or film of the present invention. This allows the piezoelectric element, actuator, and vibrator to exhibit excellent response and heat resistance while maintaining the same ease of use as conventional piezoelectric elements, actuators, and vibrators containing polymer-based piezoelectric materials. The piezoelectric element, actuator, and vibrator of the present invention can be suitably used as a member to be mounted on a vibration sensor, a speaker, etc.
The structural monitoring system of the present invention is characterized by comprising at least the vibration sensor and communication device described in the present invention, and diagnosing the vibration state of a structure using the vibration sensor. The structural monitoring system of the present invention is characterized by comprising the vibration sensor of the present invention, thereby improving durability and reducing the frequency of maintenance. Here, the structural health monitoring system is a system that measures the vibration state of a target structure in response to external factors such as earthquakes and vibrations generated by driving parts such as motors, thereby diagnosing the durability of the structure, detecting deterioration over time, and calculating the timing of repairs to the structure, etc.

 以下に実施例を挙げて、本発明をさらに具体的に説明する。 The present invention will be explained in more detail below with reference to the following examples.

 本発明における各物性値は、例としてフィルムの様態で評価を行った。各物性評価に供する試料フィルムは、本発明の芳香族ポリアミドを用いて下記の方法に従って作製した。 The physical properties of the present invention were evaluated in the form of a film, for example. The sample films used for evaluating the physical properties were prepared according to the following method using the aromatic polyamide of the present invention.

 まず、Al電極が付されたガラス板上に、アプリケーターを用いて試料溶液をフィルム状にキャストした。この時、試料溶液、ガラス板およびキャスト雰囲気の温度は室温とした。キャスト厚みは、溶媒乾燥後のフィルム厚みが10μmとなるよう調整した。次に、熱風オーブン内へガラス板ごと投入し、溶液を構成する非プロトン性溶媒の沸点(混合溶媒の場合、全溶媒量に対して30質量%以上含まれる溶媒のうち、最も沸点が高い溶媒の沸点)をTbとしたとき、Tb-50℃にて10分乾燥した。 First, the sample solution was cast into a film shape using an applicator onto a glass plate with an Al electrode attached. At this time, the temperatures of the sample solution, glass plate, and casting atmosphere were room temperature. The cast thickness was adjusted so that the film thickness after the solvent dried would be 10 μm. Next, the glass plate was placed in a hot air oven and dried for 10 minutes at Tb-50°C, where Tb is the boiling point of the aprotic solvent that makes up the solution (in the case of a mixed solvent, the boiling point of the solvent with the highest boiling point among those that are contained in 30 mass% or more of the total solvent amount).

 次に、得られた乾燥フィルム表面にアルミ電極層(100nm)を蒸着で取り付け、ワイヤー電極を接続した直流高圧安定化電源EV10-1AVR+(春日電機社製)を用いて100kV/mmの電場を印加した状態で、Tb+40℃の温度まで5℃/minの割合で上昇した。同温度で15分間保持した後、電圧は印加したままで室温まで徐冷することで、ポーリング処理を施した。 Next, an aluminum electrode layer (100 nm) was attached to the surface of the resulting dried film by vapor deposition, and the temperature was raised to Tb+40°C at a rate of 5°C/min while an electric field of 100 kV/mm was applied using a DC high-voltage stabilized power supply EV10-1AVR+ (Kasuga Electric Co., Ltd.) connected to a wire electrode. After maintaining the film at this temperature for 15 minutes, the film was slowly cooled to room temperature with the voltage still applied, thereby carrying out a poling treatment.

 また、本発明における物性の測定方法、効果の評価方法は次の方法に従って行った。 The methods for measuring physical properties and evaluating the effects of the present invention were as follows:

 (1)残留分極
 20mm×20mmに切り出した試料フィルムの中央部5mm×5mmにアルミニウム電極(平面電極)を真空加工蒸着した。この平面電極に、絶縁テープを貼り付けて補強したアルミニウム箔製の2本のリード(3mm×80mm)の電極を、導電性両面テープで平面電極に接着した。この試料フィルム、ファンクションジェネレーター、高圧アンプ、およびオシロスコープをソーヤータワー回路に組み込み、三角波を試料フィルムに印加(最大±10kV)した。試料フィルムの応答を、オシロスコープを用いて測定することにより、印加電界100kV/mmにおける残留分極量を求めた。
(1) Residual polarization An aluminum electrode (flat electrode) was vacuum-deposited on the central 5 mm x 5 mm area of a sample film cut to 20 mm x 20 mm. Two aluminum foil lead electrodes (3 mm x 80 mm) reinforced with insulating tape were attached to the flat electrode with conductive double-sided tape. The sample film, a function generator, a high-voltage amplifier, and an oscilloscope were assembled into a Sawyer Tower circuit, and a triangular wave was applied to the sample film (maximum ±10 kV). The response of the sample film was measured using an oscilloscope to determine the residual polarization at an applied electric field of 100 kV/mm.

 (2)ガラス転移温度
試料フィルムについて、ASTM E1640-13に準拠して、動的粘弾性測定(DMA)により貯蔵弾性率(E’)の変曲点から求めた。DMAは下記装置および条件にて実施した。
(2) Glass transition temperature: The glass transition temperature of the sample film was determined from the inflection point of the storage modulus (E') by dynamic mechanical analysis (DMA) in accordance with ASTM E1640-13. DMA was performed using the following apparatus and conditions.

 装置:粘弾性測定装置DMS6100(セイコーインスツルメンツ社製)
 測定モード:引張モード
 測定周波数:1Hz
 昇温速度:5℃/分
 温度範囲:25℃~400℃
  保持時間:2分。
Apparatus: Viscoelasticity measuring device DMS6100 (Seiko Instruments Inc.)
Measurement mode: Tensile mode Measurement frequency: 1 Hz
Heating rate: 5°C/min Temperature range: 25°C to 400°C
Holding time: 2 minutes.

  (3)圧電定数
SINOCERA PIEZOTRONICS社のピエゾメーターYE2730又はその同等品を用いて、0.25N、110Hzの力を加えることによりd31およびd33を、それぞれサンプル上に選択した各10点にて測定した。測定されたd31およびd33それぞれの算術平均値を比較し、大きい方の平均値をそのサンプルの圧電定数の値とした。なお、d31、d33の実測値は、測定されるサンプルの表裏や向きによって、正の値または負の値となるが、本明細書中においては、その絶対値を測定値として扱った。
(3) Piezoelectric constant Using a piezometer YE2730 manufactured by SINOCERA PIEZOTRONICS or an equivalent product, d31 and d33 were measured at 10 selected points on the sample by applying a force of 0.25 N and 110 Hz. The arithmetic average values of the measured d31 and d33 were compared, and the larger average value was taken as the value of the piezoelectric constant of the sample. Note that the measured values of d31 and d33 are positive or negative depending on the front, back, and orientation of the sample being measured, but in this specification, the absolute values are treated as the measured values.

 (4)加熱処理による圧電定数の変化率
に、サンプルを10分間静置した。熱風オーブンから取り出し室温に空冷後、上記(3)圧電定数に記載の方法と同様にして、d‘31およびd’33を測定した。得られたd31、d33、d‘31、d’33を用いて、|(d31-d’31)/d31|および|(d33-d‘33)/d33|を算出し、これらのうち大きい方の値を、そのサンプルの加熱処理による圧電定数の変化率とした。
(4) Rate of change in piezoelectric constant due to heat treatment The sample was left to stand for 10 minutes. After being removed from the hot air oven and air-cooled to room temperature, d' 31 and d' 33 were measured in the same manner as in the method described in (3) Piezoelectric constant above. Using the obtained d31 , d33 , d' 31 , and d' 33 , |( d31 - d'31 )/ d31 | and |( d33 - d'33 )/ d33 | were calculated, and the larger of these values was taken as the rate of change in piezoelectric constant due to heat treatment of the sample.

 (5)弾性率
AFM(Burker Corporation製 DimensionIcon)を用い、PeakForceQNMモードにて測定を実施し、得られたフォースカーブから付属の解析ソフトNanoScopeAnalysis V1.40を用いて、JKR接触理論に基づいた解析を行い、弾性率分布を求めた。
(5) Elastic modulus Measurement was performed using an AFM (Dimension Icon manufactured by Burker Corporation) in PeakForceQNM mode, and the elastic modulus distribution was determined from the obtained force curve using the attached analysis software NanoScopeAnalysis V1.40 based on the JKR contact theory.

 具体的にはPeakForceQNMモードのマニュアルに従い、カンチレバーの反り
感度、バネ定数、先端曲率の校正を行った後、下記の条件にて測定を実施し、得られたDMT Modulusチャンネルのデータを弾性率の1データとして採用した。なお、バネ定数および先端曲率は個々のカンチレバーによってバラつきを有するが、測定に影響しない範囲として、バネ定数0.3N/m以上0.5N/m以下、先端曲率半径15nm以下の条件を満たすカンチレバーを採用し、測定に使用した。
任意に採取した5サンプルについて上記測定を実施し、得られたデータの数平均をその試料フィルムの弾性率とした。
Specifically, the cantilever's warpage sensitivity, spring constant, and tip curvature were calibrated according to the PeakForceQNM mode manual, and then measurements were performed under the following conditions, and the data obtained from the DMT Modulus channel was adopted as one piece of data for the elastic modulus. Note that although the spring constant and tip curvature vary depending on the individual cantilever, a cantilever that satisfies the conditions of a spring constant of 0.3 N/m to 0.5 N/m and a tip curvature radius of 15 nm or less was adopted and used for the measurement, as a range that does not affect the measurement.
The above measurements were carried out on five randomly selected samples, and the numerical average of the obtained data was regarded as the elastic modulus of the sample film.

 測定条件は下記に示す。
測定装置  : Burker Corporation製原子間力顕微鏡(AFM)
測定モード : PeakForceQNM(フォースカーブ法)
カンチレバー: ブルカーAXS社製SCANASYST-AIR
(材質:Si、バネ定数K:0.4N/m、先端曲率半径R:2nm)
測定雰囲気 : 23℃・大気中
測定範囲  : 3μm四方
分解能   : 512×512
カンチレバー移動速度: 10μm/s
最大押し込み荷重  : 10nN。
The measurement conditions are shown below.
Measurement equipment: Atomic force microscope (AFM) manufactured by Burker Corporation
Measurement mode: PeakForceQNM (force curve method)
Cantilever: Bruker AXS SCANASYST-AIR
(Material: Si, spring constant K: 0.4 N/m, tip curvature radius R: 2 nm)
Measurement atmosphere: 23°C, in air Measurement range: 3 μm Square resolution: 512 x 512
Cantilever movement speed: 10 μm/s
Maximum pressing load: 10 nN.

  (6)規格化分子配向
  サンプルフィルムから10cm×10cmで切り出した試料片について、下記測定条件にて規格化分子配向MORcを測定した。
測定装置  :王子計測機器株式会社製MOR-7015
周波数   : 15GHz
基準厚さtc: 50mm。
(6) Normalized Molecular Orientation A sample piece measuring 10 cm x 10 cm was cut out from the sample film, and the normalized molecular orientation MORc was measured under the following measurement conditions.
Measuring device: Oji Measurement Instruments MOR-7015
Frequency: 15 GHz
Reference thickness tc: 50 mm.

 (実施例1)
 脱水したDMAc(沸点165℃)に、ジアミンとしてジアミン全量に対して100モル%に相当する5-ニトロ-m-フェニレンジアミンを窒素気流下で溶解させ、氷水浴で液温を5℃に冷却した。そこへ、系内を窒素気流下氷水浴中に保った状態で、ジアミン全量に対して99モル%に相当する2-ニトロイソフタル酸ジクロライドを30分かけて添加し、全量添加後、約1時間の撹拌を行うことで、芳香族ポリアミド(ポリマーA)を重合した。得られた重合溶液を、多量の純水中に攪拌しながら添加することでポリマーAを繊維状に固化させ、ミキサーで5分間粉砕し、80℃の熱風オーブンで1時間、120℃の真空オーブンで12時間乾燥させることで、ポリマーAの粉体を得た。
ポリマー濃度が10質量%となるようにポリマーAをDMAcに溶解することで、溶液を得た。Al電極を付したガラス板上にポリマーAの溶液を膜状に塗布し、熱風オーブンにて130℃10分間乾燥させた後、上述の条件でポーリング処理を施し、厚み10μmのポリマーAからなるフィルムを得た。ここで、熱風オーブンはセーフティオーブンSPH100(エスペック株式会社製)を用い、開閉ダンパー50%にて温度表示が設定温度に到達して1時間後に使用した。得られた試料の評価結果を表1に示す。なお、ポリマーAは、Arが化学式(X)、Arが化学式(XIII)である、化学式(VIV)に記載の構造を持つ。
Example 1
In dehydrated DMAc (boiling point 165°C), 5-nitro-m-phenylenediamine, which corresponds to 100 mol% of the total amount of diamine as a diamine, was dissolved under nitrogen flow, and the liquid temperature was cooled to 5°C in an ice water bath. 2-nitroisophthalic acid dichloride, which corresponds to 99 mol% of the total amount of diamine, was added thereto over 30 minutes while keeping the inside of the system in an ice water bath under nitrogen flow, and after the entire amount was added, the mixture was stirred for about 1 hour to polymerize aromatic polyamide (polymer A). The obtained polymerization solution was added to a large amount of pure water while stirring, so that polymer A was solidified into a fibrous form, which was then crushed in a mixer for 5 minutes, and dried in a hot air oven at 80°C for 1 hour and in a vacuum oven at 120°C for 12 hours to obtain a powder of polymer A.
A solution was obtained by dissolving polymer A in DMAc so that the polymer concentration was 10% by mass. A film of the polymer A solution was applied to a glass plate with an Al electrode, and the plate was dried in a hot air oven at 130°C for 10 minutes, and then subjected to a poling treatment under the above-mentioned conditions to obtain a film of polymer A having a thickness of 10 μm. Here, a safety oven SPH100 (manufactured by Espec Corporation) was used as the hot air oven, and the oven was used 1 hour after the temperature display reached the set temperature with the opening and closing damper at 50%. The evaluation results of the obtained sample are shown in Table 1. The polymer A has a structure described in chemical formula (VIV) in which Ar 5 is chemical formula (X) and Ar 6 is chemical formula (XIII).

 (実施例2)
5-ニトロ-m-フェニレンジアミンの代わりに5-トリフルオロ-m-フェニレンジアミンを用いること以外は実施例1と同様にして、芳香族ポリアミド(ポリマーB)およびそのフィルムを得た。得られた試料の評価結果を表1に示す。なお、ポリマーBは、Arが化学式(X)、Arが化学式(XIII)である、化学式(IX)に記載の構造を持つ。
Example 2
An aromatic polyamide (polymer B) and a film thereof were obtained in the same manner as in Example 1, except that 5-trifluoro-m-phenylenediamine was used instead of 5-nitro-m-phenylenediamine. The evaluation results of the obtained sample are shown in Table 1. Polymer B has a structure represented by chemical formula (IX), in which Ar 5 is represented by chemical formula (X) and Ar 6 is represented by chemical formula (XIII).

 (実施例3)
2-ニトロイソフタル酸ジクロライドの代わりに3,3‘-スルホニルビス安息香酸ジクロライドを用いること以外は実施例1と同様にして、芳香族ポリアミド(ポリマーC)およびそのフィルムを得た。得られた試料の評価結果を表1に示す。なお、ポリマーCは、Arが化学式(X)、Arが化学式(XIV)である、化学式(IX)に記載の構造を持つ。
Example 3
An aromatic polyamide (polymer C) and a film thereof were obtained in the same manner as in Example 1, except that 3,3'-sulfonylbisbenzoic acid dichloride was used instead of 2-nitroisophthalic acid dichloride. The evaluation results of the obtained sample are shown in Table 1. Polymer C has a structure represented by chemical formula (IX), in which Ar 5 is represented by chemical formula (X) and Ar 6 is represented by chemical formula (XIV).

 (実施例4)
5-ニトロ-m-フェニレンジアミンの代わりに4,4‘-ジアミノジフェニルスルホンを用いること以外は実施例1と同様にして、芳香族ポリアミド(ポリマーD)およびそのフィルムを得た。得られた試料の評価結果を表1に示す。なお、ポリマーDは、Arが化学式(X)、Arが化学式(XI)である、化学式(IX)に記載の構造を持つ。
Example 4
An aromatic polyamide (polymer D) and a film thereof were obtained in the same manner as in Example 1, except that 4,4'-diaminodiphenylsulfone was used instead of 5-nitro-m-phenylenediamine. The evaluation results of the obtained sample are shown in Table 1. Polymer D has a structure represented by chemical formula (IX) in which Ar 5 is represented by chemical formula (X) and Ar 6 is represented by chemical formula (XI).

 (実施例5)
2-ニトロイソフタル酸ジクロライドの代わりに2,7-ナフタレンジカルボニルジクロライドを用いること以外は実施例1と同様にして、芳香族ポリアミド(ポリマーE)およびそのフィルムを得た。得られた試料の評価結果を表1に示す。なお、ポリマーEは、Arが化学式(IV)、Arが化学式(V)である、化学式(III)に記載の構造を持つ。
(Example 5)
An aromatic polyamide (polymer E) and a film thereof were obtained in the same manner as in Example 1, except that 2,7-naphthalenedicarbonyl dichloride was used instead of 2-nitroisophthalic acid dichloride. The evaluation results of the obtained sample are shown in Table 1. Polymer E has a structure represented by chemical formula (III), in which Ar 3 is represented by chemical formula (IV) and Ar 4 is represented by chemical formula (V).

 (実施例6)
2-ニトロイソフタル酸ジクロライドの代わりに1,6-ナフタレンジカルボニルジクロライドを用いること以外は実施例1と同様にして、芳香族ポリアミド(ポリマーF)およびそのフィルムを得た。得られた試料の評価結果を表1に示す。なお、ポリマーFは、Arが化学式(IV)、Arが化学式(VI)である、化学式(III)に記載の構造を持つ。
Example 6
An aromatic polyamide (polymer F) and a film thereof were obtained in the same manner as in Example 1, except that 1,6-naphthalenedicarbonyl dichloride was used instead of 2-nitroisophthalic acid dichloride. The evaluation results of the obtained sample are shown in Table 1. Polymer F has a structure represented by chemical formula (III) in which Ar 3 is represented by chemical formula (IV) and Ar 4 is represented by chemical formula (VI).

 (実施例7)
脱水したクロロベンゼンに2,5-チオフェンジカルボン酸-1,1-ジオキサイドを溶解した後、室温にて該ジカルボン酸に対して2.2モル当量に相当する塩化オキサリルを滴下した。この溶液を60℃に昇温して2時間攪拌した後、室温に戻して減圧留去することで余剰分の塩化オキサリルを除去した。反応溶液にヘプタンを添加することで2,5-チオフェンジカルボン酸ジクロライド-1,1-ジオキサイドを析出させた。この粉体をろ別した後、減圧で乾燥させることで、単離した。
以上の方法で得られた2,5-チオフェンジカルボン酸ジクロライド-1,1-ジオキサイドを、2-ニトロイソフタル酸ジクロライドの代わりに用いること以外は実施例1と同様にして、芳香族ポリアミド(ポリマーG)およびそのフィルムを得た。得られた試料の評価結果を表1に示す。なお、ポリマーGは、化学式(III)および(IX)にそれぞれ記載の構造をいずれも持たない。
(Example 7)
After dissolving 2,5-thiophenedicarboxylic acid-1,1-dioxide in dehydrated chlorobenzene, oxalyl chloride equivalent to 2.2 molar equivalents relative to the dicarboxylic acid was added dropwise at room temperature. The solution was heated to 60°C and stirred for 2 hours, then returned to room temperature and distilled under reduced pressure to remove excess oxalyl chloride. Heptane was added to the reaction solution to precipitate 2,5-thiophenedicarboxylic acid dichloride-1,1-dioxide. The powder was filtered and then dried under reduced pressure to isolate it.
An aromatic polyamide (Polymer G) and a film thereof were obtained in the same manner as in Example 1, except that the 2,5-thiophenedicarboxylic acid dichloride-1,1-dioxide obtained by the above method was used instead of 2-nitroisophthalic acid dichloride. The evaluation results of the obtained sample are shown in Table 1. Note that Polymer G does not have any of the structures shown in chemical formulas (III) and (IX).

 (実施例8)
ジアミン全量に対して100モル%に相当する5-ニトロ-m-フェニレンジアミンを添加する代わりに、ジアミン全量に対して80モル%に相当する5-ニトロ-m-フェニレンジアミンと20モル%に相当する2-クロロ-p-フェニレンジアミンを添加すること以外は実施例1と同様にして、芳香族ポリアミド(ポリマーH)およびそのフィルムを得た。得られた試料の評価結果を表1に示す。なお、ポリマーHは、Arが化学式(IX)、Arが化学式(XIII)である、化学式(IX)に記載の構造を含む。
(Example 8)
An aromatic polyamide (polymer H) and a film thereof were obtained in the same manner as in Example 1, except that 5-nitro-m-phenylenediamine equivalent to 80 mol % and 2-chloro-p-phenylenediamine equivalent to 20 mol % were added instead of 5-nitro-m-phenylenediamine equivalent to 100 mol % based on the total amount of diamines. The evaluation results of the obtained sample are shown in Table 1. Polymer H contains a structure represented by chemical formula (IX), in which Ar 5 is chemical formula (IX) and Ar 6 is chemical formula (XIII).

 (実施例9)
ジアミン全量に対して99モル%に相当する2-ニトロイソフタル酸ジクロライドを添加する代わりに、ジアミン全量に対して80モル%に相当する2-ニトロイソフタル酸ジクロライドと19モル%に相当する2-クロロテレフタル酸ジクロライドを添加すること以外は実施例1と同様にして、芳香族ポリアミド(ポリマーI)およびそのフィルムを得た。得られた試料の評価結果を表1に示す。なお、ポリマーIは、Arが化学式(X)、Arが化学式(XIII)である、化学式(IX)に記載の構造を含む。
(実施例10)
ポーリング処理を施す代わりに、乾燥したフィルムの両端を担持して、延伸機を用いて130℃にて1.1倍に一軸延伸すること以外は実施例1と同様にして、芳香族ポリアミド(ポリマーA)およびそのフィルムを得た。得られた試料の評価結果を表1に示す。
(比較例1)
脱水したDMAcに、ジアミンとしてジアミン全量に対して100モル%に相当する2,2’-ジトリフルオロメチル-4,4’-ジアミノビフェニル(TFMB)を窒素気流下で溶解させ、氷水浴で液温を5℃に冷却した。そこへ、系内を窒素気流下氷水浴中に保った状態で、ジアミン全量に対して99モル%に相当する2-クロロテレフタロイルクロライド(CTPC)を30分かけて添加し、全量添加後、約1時間の撹拌を行うことで、芳香族ポリアミド(ポリマーJ)を重合した。得られた重合溶液を、多量の純水中に攪拌しながら添加することでポリマーJを繊維状に固化させ、ミキサーで5分間粉砕し、80℃の熱風オーブンで1時間、120℃の真空オーブンで12時間乾燥させることで、ポリマーJの粉体を得た。それ以降は実施例1と同様にして、ポリマーJからなるフィルムを得た。得られた試料の評価結果を表1に示す。なお、ポリマーJは、化学式(III)および(IX)にそれぞれ記載の構造をいずれも持たない。
(Example 9)
An aromatic polyamide (polymer I) and a film thereof were obtained in the same manner as in Example 1, except that 2-nitroisophthalic acid dichloride corresponding to 80 mol % and 2-chloroterephthalic acid dichloride corresponding to 19 mol % were added instead of 2-nitroisophthalic acid dichloride corresponding to 99 mol % based on the total amount of diamine. The evaluation results of the obtained sample are shown in Table 1. Polymer I contains a structure represented by chemical formula (IX) in which Ar 5 is chemical formula (X) and Ar 6 is chemical formula (XIII).
(Example 10)
An aromatic polyamide (polymer A) and a film thereof were obtained in the same manner as in Example 1, except that instead of carrying out the poling treatment, both ends of the dried film were supported and the film was uniaxially stretched to 1.1 times at 130° C. using a stretching machine. The evaluation results of the obtained sample are shown in Table 1.
(Comparative Example 1)
In the dehydrated DMAc, 2,2'-ditrifluoromethyl-4,4'-diaminobiphenyl (TFMB) was dissolved in an amount equivalent to 100 mol% of the total amount of diamines under a nitrogen stream, and the liquid temperature was cooled to 5°C in an ice water bath. 2-chloroterephthaloyl chloride (CTPC) equivalent to 99 mol% of the total amount of diamines was added thereto over 30 minutes while keeping the inside of the system in an ice water bath under a nitrogen stream, and after the entire amount was added, the mixture was stirred for about 1 hour to polymerize aromatic polyamide (polymer J). The obtained polymerization solution was added to a large amount of pure water while stirring to solidify polymer J into a fibrous form, which was then crushed in a mixer for 5 minutes and dried in a hot air oven at 80°C for 1 hour and in a vacuum oven at 120°C for 12 hours to obtain a powder of polymer J. Thereafter, a film made of polymer J was obtained in the same manner as in Example 1. The evaluation results of the obtained sample are shown in Table 1. Polymer J does not have any of the structures shown in chemical formulas (III) and (IX).

 (比較例2)
脱水したDMAcに、ジアミンとしてジアミン全量に対して100モル%に相当する5-ニトロ-m-フェニレンジアミンを窒素気流下で溶解させ、氷水浴で液温を5℃に冷却した。そこへ、系内を窒素気流下氷水浴中に保った状態で、ジアミン全量に対して99モル%に相当するCTPCを30分かけて添加し、全量添加後、約1時間の撹拌を行うことで、芳香族ポリアミド(ポリマーK)を重合した。得られた重合溶液を、多量の純水中に攪拌しながら添加することでポリマーKを繊維状に固化させ、ミキサーで5分間粉砕し、80℃の熱風オーブンで1時間、120℃の真空オーブンで12時間乾燥させることで、ポリマーKの粉体を得た。
ポリマー濃度が10質量%となるようにポリマーKをDMAcに溶解することで、溶液を得た。Al電極を付したガラス板上にポリマーKの溶液を膜状に塗布し、熱風オーブンにて130℃10分間乾燥させた後、上述の条件でポーリング処理を施し、厚み10μmのポリマーKからなるフィルムを得た。得られた試料の評価結果を表1に示す。なお、ポリマーKは、化学式(III)および(IX)にそれぞれ記載の構造をいずれも持たない。
(Comparative Example 2)
In the dehydrated DMAc, 5-nitro-m-phenylenediamine, which corresponds to 100 mol % of the total amount of diamine as a diamine, was dissolved under a nitrogen stream, and the liquid temperature was cooled to 5° C. in an ice water bath. CTPC, which corresponds to 99 mol % of the total amount of diamine, was added thereto over 30 minutes while keeping the inside of the system in an ice water bath under a nitrogen stream, and after the entire amount was added, the mixture was stirred for about 1 hour to polymerize aromatic polyamide (polymer K). The obtained polymerization solution was added to a large amount of pure water while stirring to solidify polymer K into a fibrous form, which was then crushed in a mixer for 5 minutes, and dried in a hot air oven at 80° C. for 1 hour and in a vacuum oven at 120° C. for 12 hours to obtain a powder of polymer K.
A solution was obtained by dissolving polymer K in DMAc so that the polymer concentration was 10% by mass. A film of the solution of polymer K was applied onto a glass plate with an Al electrode, and the film was dried in a hot air oven at 130° C. for 10 minutes, and then subjected to a poling treatment under the above-mentioned conditions to obtain a film of polymer K having a thickness of 10 μm. The evaluation results of the obtained sample are shown in Table 1. Note that polymer K does not have any of the structures described in chemical formulas (III) and (IX).

 (比較例3)
脱水したDMAc(沸点165℃)に、ジアミンとしてジアミン全量に対して100モル%に相当するm-フェニレンジアミンを窒素気流下で溶解させ、氷水浴で液温を5℃に冷却した。そこへ、系内を窒素気流下氷水浴中に保った状態で、ジアミン全量に対して99モル%に相当するイソフタル酸ジクロライドを30分かけて添加し、全量添加後、約1時間の撹拌を行うことで、芳香族ポリアミド(ポリマーL)を重合した。得られた重合溶液を、多量の純水中に攪拌しながら添加することでポリマーLを繊維状に固化させ、ミキサーで5分間粉砕し、80℃の熱風オーブンで1時間、120℃の真空オーブンで12時間乾燥させることで、ポリマーLの粉体を得た。
ポリマー濃度が10質量%となるようにポリマーLをDMAcに溶解することで、溶液を得た。Al電極を付したガラス板上にポリマーLの溶液を膜状に塗布し、熱風オーブンにて130℃10分間乾燥させた後、上述の条件でポーリング処理を施し、厚み10μmのポリマーLからなるフィルムを得た。ここで、熱風オーブンはセーフティオーブンSPH100(エスペック株式会社製)を用い、開閉ダンパー50%にて温度表示が設定温度に到達して1時間後に使用した。得られた試料の評価結果を表1に示す。なお、ポリマーLは、Ar、Arがともに化学式(IV)である、化学式(III)に記載の構造を持つ。
(Comparative Example 3)
In dehydrated DMAc (boiling point 165°C), m-phenylenediamine equivalent to 100 mol% of the total amount of diamine was dissolved under nitrogen flow, and the liquid temperature was cooled to 5°C in an ice water bath. While the system was kept in an ice water bath under nitrogen flow, isophthalic acid dichloride equivalent to 99 mol% of the total amount of diamine was added over 30 minutes, and after the entire amount was added, the mixture was stirred for about 1 hour to polymerize aromatic polyamide (polymer L). The obtained polymerization solution was added to a large amount of pure water while stirring to solidify polymer L into a fibrous form, which was then crushed in a mixer for 5 minutes and dried in a hot air oven at 80°C for 1 hour and in a vacuum oven at 120°C for 12 hours to obtain a powder of polymer L.
A solution was obtained by dissolving polymer L in DMAc so that the polymer concentration was 10% by mass. A film of the polymer L solution was applied to a glass plate with an Al electrode, and the plate was dried in a hot air oven at 130°C for 10 minutes, and then subjected to a poling treatment under the above-mentioned conditions to obtain a film of polymer L having a thickness of 10 μm. Here, a safety oven SPH100 (manufactured by Espec Corporation) was used as the hot air oven, and the oven was used 1 hour after the temperature display reached the set temperature with the opening and closing damper at 50%. The evaluation results of the obtained sample are shown in Table 1. The polymer L has a structure described in chemical formula (III) in which both Ar 3 and Ar 4 are chemical formula (IV).

 (比較例4)
芳香族ポリアミドの代わりにナイロン11(Rilsan(R)PA11,ポリマーM)を用いること以外は実施例1と同様にして、ポリマーMからなるフィルムを得た。得られた試料の評価結果を表1に示す。なお、ポリマーMは、化学式(III)および(IX)にそれぞれ記載の構造をいずれも持たない。
(Comparative Example 4)
A film made of polymer M was obtained in the same manner as in Example 1, except that nylon 11 (Rilsan(R) PA11, polymer M) was used instead of aromatic polyamide. The evaluation results of the obtained sample are shown in Table 1. Note that polymer M does not have any of the structures shown in chemical formulas (III) and (IX).

 (比較例5)
市販の圧電性PVDFフィルム(KFピエゾフィルム、株式会社クレハ製)を試料として、各評価を実施した。評価結果を表1に示す。なお、PVDFは、化学式(III)および(IX)にそれぞれ記載の構造をいずれも持たない。規格化分子配向測定は実施しなかった。
(Comparative Example 5)
Each evaluation was performed using a commercially available piezoelectric PVDF film (KF Piezofilm, manufactured by Kureha Corporation) as a sample. The evaluation results are shown in Table 1. Note that PVDF does not have any of the structures shown in chemical formulas (III) and (IX). No normalized molecular orientation measurement was performed.

Figure JPOXMLDOC01-appb-T000044
Figure JPOXMLDOC01-appb-T000044

Claims (21)

下記化学式(I)で示される構造を繰り返し単位として含むポリマーであって、下記(i)および(ii)を満たすポリマー。
(i):化学式(I)中の水素結合性基Aが環員原子に結合している。
(ii):化学式(I)中の二つのA間の原子を結ぶ経路において、最短となる経路上に存在する原子の個数が奇数である。
化学式(I):
Figure JPOXMLDOC01-appb-C000001
Aは水素結合性基であり、B,Bはn員環基(ただしnは5以上10以下のいずれかの自然数)である。
A polymer comprising a structure represented by the following chemical formula (I) as a repeating unit, which satisfies the following (i) and (ii):
(i): The hydrogen-bonding group A in the chemical formula (I) is bonded to a ring atom.
(ii): In the chemical formula (I), the number of atoms on the shortest path connecting the two A atoms is odd.
Chemical formula (I):
Figure JPOXMLDOC01-appb-C000001
A is a hydrogen-bonding group, and B 1 and B 2 are n-membered ring groups (n is a natural number of 5 or more and 10 or less).
残留分極が15mC/m以上300mC/m以下である、請求項1に記載のポリマー。 2. The polymer of claim 1, having a remanent polarization of 15 mC/ m2 or more and 300 mC/ m2 or less. 水素結合性基Aがアミド基、ウレア基、ウレタン基の少なくともいずれかである、請求項1に記載のポリマー。 The polymer according to claim 1, wherein the hydrogen-bonding group A is at least one of an amide group, a urea group, and a urethane group. 請求項1に記載のポリマーであって、水素結合性基Aがアミド基であり、B、Bがいずれも芳香族基である、芳香族ポリアミド。 2. The polymer according to claim 1, wherein the hydrogen-bonding group A is an amide group, and B 1 and B 2 are both aromatic groups. 繰り返し単位中の構造が下記(v)~(viii)の少なくともいずれかを満たす、請求項4に記載の芳香族ポリアミド。
(v):2つのアミド基N原子間をつなぐ結合に沿った経路のうち、最短経路上の原子に電子供与基が結合している。
(vi):2つのアミド基C原子間をつなぐ結合に沿った経路のうち、最短経路上の原子に電子吸引基が結合している。
(vii):2つのアミド基N原子間をつなぐ結合に沿った経路のうち、最短経路上でない原子に電子吸引基が結合している。
(viii):2つのアミド基C原子間をつなぐ結合に沿った経路のうち、最短経路上でない原子に電子供与基が結合している。
The aromatic polyamide according to claim 4, wherein the repeating unit has a structure that satisfies at least any one of the following (v) to (viii):
(v): An electron-donating group is bonded to an atom on the shortest path along the bonds connecting the N atoms of the two amide groups.
(vi): An electron-withdrawing group is bonded to an atom on the shortest path along the bond connecting the two C atoms of the amide groups.
(vii): An electron-withdrawing group is bonded to an atom that is not on the shortest path along the bond connecting the two N atoms of the amide groups.
(viii): An electron-donating group is bonded to an atom that is not on the shortest path along the bond connecting the two C atoms of the amide groups.
下記化学式(III)で示される分子骨格構造を持つ、請求項5に記載の芳香族ポリアミド。
化学式(III):
Figure JPOXMLDOC01-appb-C000002
Ar、Arは化学式(IV)~(VIII)に示す分子骨格構造を含む基。
化学式(IV):
Figure JPOXMLDOC01-appb-C000003
化学式(V):
Figure JPOXMLDOC01-appb-C000004
化学式(VI):
Figure JPOXMLDOC01-appb-C000005
化学式(VII):
Figure JPOXMLDOC01-appb-C000006
は請求項5における(v)~(viii)を満たす任意の基。
化学式(VIII):
Figure JPOXMLDOC01-appb-C000007
は請求項5における(v)~(viii)を満たす任意の基。
6. The aromatic polyamide according to claim 5, having a molecular skeleton structure represented by the following chemical formula (III):
Chemical formula (III):
Figure JPOXMLDOC01-appb-C000002
Ar 3 and Ar 4 are groups containing the molecular skeleton structures shown in chemical formulas (IV) to (VIII).
Chemical formula (IV):
Figure JPOXMLDOC01-appb-C000003
Chemical formula (V):
Figure JPOXMLDOC01-appb-C000004
Chemical formula (VI):
Figure JPOXMLDOC01-appb-C000005
Chemical formula (VII):
Figure JPOXMLDOC01-appb-C000006
R 1 is any group satisfying (v) to (viii) in claim 5.
Chemical formula (VIII):
Figure JPOXMLDOC01-appb-C000007
R2 is any group satisfying (v) to (viii) in claim 5.
下記化学式(IX)で示される構造を持つ、請求項5に記載の芳香族ポリアミド。
化学式(IX):
Figure JPOXMLDOC01-appb-C000008
Arは化学式(X)~(XII)に示す構造を含み、Arは化学式(XIII)~(XV)に示す構造を含む基。
化学式(X):
Figure JPOXMLDOC01-appb-C000009
は-Hまたは電子供与基、Rは電子吸引基である。
化学式(XI):
Figure JPOXMLDOC01-appb-C000010
は電子供与基である。
化学式(XII):
Figure JPOXMLDOC01-appb-C000011
は電子吸引基である。
化学式(XIII):
Figure JPOXMLDOC01-appb-C000012
は電子吸引基、Rは-Hまたは電子供与基である。
化学式(XIV):
Figure JPOXMLDOC01-appb-C000013
は電子吸引基である。
化学式(XV):
Figure JPOXMLDOC01-appb-C000014
10は電子供与基である。
6. The aromatic polyamide of claim 5, having a structure represented by the following chemical formula (IX):
Chemical formula (IX):
Figure JPOXMLDOC01-appb-C000008
Ar 5 is a group including a structure represented by any one of chemical formulas (X) to (XII), and Ar 6 is a group including a structure represented by any one of chemical formulas (XIII) to (XV).
Chemical formula (X):
Figure JPOXMLDOC01-appb-C000009
R3 is --H or an electron donating group, and R4 is an electron withdrawing group.
Chemical formula (XI):
Figure JPOXMLDOC01-appb-C000010
R5 is an electron donating group.
Chemical formula (XII):
Figure JPOXMLDOC01-appb-C000011
R6 is an electron withdrawing group.
Chemical formula (XIII):
Figure JPOXMLDOC01-appb-C000012
R 7 is an electron withdrawing group and R 8 is --H or an electron donating group.
Chemical formula (XIV):
Figure JPOXMLDOC01-appb-C000013
R9 is an electron withdrawing group.
Chemical formula (XV):
Figure JPOXMLDOC01-appb-C000014
R10 is an electron donating group.
炭素数1以上3以下のパーフルオロアルキル基、ニトロ基、シアノ基、スルホン基の少なくともいずれかの基を含む、請求項7に記載の芳香族ポリアミド。 The aromatic polyamide according to claim 7, which contains at least one of a perfluoroalkyl group having 1 to 3 carbon atoms, a nitro group, a cyano group, and a sulfone group. ガラス転移温度が130℃以上400℃以下である、請求項4に記載の芳香族ポリアミド。 The aromatic polyamide according to claim 4, having a glass transition temperature of 130°C or higher and 400°C or lower. 請求項4に記載の芳香族ポリアミドを主成分とする成形体。 A molded body mainly composed of the aromatic polyamide according to claim 4. 圧電定数d31またはd33の少なくともいずれかが0pC/Nより大きく50.0pC/N以下である、請求項10に記載の成形体。 The molded article according to claim 10, wherein at least one of the piezoelectric constants d31 and d33 is greater than 0 pC/N and less than or equal to 50.0 pC/N. 請求項4に記載の芳香族ポリアミドを主成分とするフィルム。 A film mainly composed of the aromatic polyamide described in claim 4. AFMにより得られる弾性率が4.0GPa以上15.0GPa以下であることを特徴とする、請求項12に記載のフィルム。 The film described in claim 12, characterized in that the elastic modulus obtained by AFM is 4.0 GPa or more and 15.0 GPa or less. 規格化分子配向MORcが1.1以上15以下である、請求項12に記載のフィルム。 The film according to claim 12, having a normalized molecular orientation MORc of 1.1 or more and 15 or less. 150℃で10分間の加熱処理を行った後の静電定数をd‘としたとき、加熱処理による圧電定数の変化の絶対値|(d31-d’31)/d31|および|(d33-d’33)/d33|のうち大きい方の値が0以上0.5以下である、請求項10に記載の成形体。 The molded body according to claim 10, wherein, when the electrostatic constant after heat treatment at 150° C. for 10 minutes is d', the larger of the absolute values of changes in the piezoelectric constant due to heat treatment, |(d 31 - d' 31 )/d 31 | and |(d 33 - d' 33 )/d 33 |, is 0 or more and 0.5 or less. 請求項10に記載の成形体および/または請求項12に記載のフィルムを含む、圧電素子。 A piezoelectric element comprising the molded body according to claim 10 and/or the film according to claim 12. 請求項10に記載の成形体および/または請求項12に記載のフィルムを含む、アクチュエータ。 An actuator comprising the molded body described in claim 10 and/or the film described in claim 12. 請求項10に記載の成形体および/または請求項12に記載のフィルムを含む、振動子。 A vibrator comprising the molded body according to claim 10 and/or the film according to claim 12. 請求項16に記載の圧電素子を備えた、振動センサー。 A vibration sensor comprising the piezoelectric element according to claim 16. 請求項17にアクチュエータを備えた、スピーカー。 A speaker having an actuator as described in claim 17. 少なくとも請求項19に記載の振動センサーと通信装置を備え、該振動センサーにより構造物の振動状態を検出し、構造物を診断する構造ヘルスモニタリングシステム。
 
A structural health monitoring system comprising at least the vibration sensor according to claim 19 and a communication device, the structural health monitoring system detecting a vibration state of a structure by the vibration sensor and diagnosing the structure.
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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5311995A (en) * 1976-07-21 1978-02-02 Teijin Ltd Piezoelectric high-polymer film having good high-temperature performance
JPS627732A (en) * 1985-07-04 1987-01-14 Teijin Ltd Production of wholly aromatic polyamide carrying pendant primary amino group
JPH1176777A (en) * 1997-07-18 1999-03-23 Toray Ind Inc Semipermeable composite membrane and its production
JP2001131281A (en) * 1999-10-29 2001-05-15 Kyocera Corp Ferroelectric polymer material and polymer nonlinear optical material using the same
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