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WO2025121366A1 - Glass plate, laminate, and display device - Google Patents

Glass plate, laminate, and display device Download PDF

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Publication number
WO2025121366A1
WO2025121366A1 PCT/JP2024/042957 JP2024042957W WO2025121366A1 WO 2025121366 A1 WO2025121366 A1 WO 2025121366A1 JP 2024042957 W JP2024042957 W JP 2024042957W WO 2025121366 A1 WO2025121366 A1 WO 2025121366A1
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WO
WIPO (PCT)
Prior art keywords
glass
less
glass plate
main surface
plate according
Prior art date
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Pending
Application number
PCT/JP2024/042957
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French (fr)
Japanese (ja)
Inventor
博之 土屋
和孝 小野
丈宜 三浦
広樹 高橋
誠二 稲葉
智恵子 鈴木
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AGC Inc
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Asahi Glass Co Ltd
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Filing date
Publication date
Application filed by Asahi Glass Co Ltd filed Critical Asahi Glass Co Ltd
Publication of WO2025121366A1 publication Critical patent/WO2025121366A1/en
Pending legal-status Critical Current
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    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B18/00Shaping glass in contact with the surface of a liquid
    • C03B18/02Forming sheets
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B32/00Thermal after-treatment of glass products not provided for in groups C03B19/00, C03B25/00 - C03B31/00 or C03B37/00, e.g. crystallisation, eliminating gas inclusions or other impurities; Hot-pressing vitrified, non-porous, shaped glass products
    • C03B32/02Thermal crystallisation, e.g. for crystallising glass bodies into glass-ceramic articles
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C10/00Devitrified glass ceramics, i.e. glass ceramics having a crystalline phase dispersed in a glassy phase and constituting at least 50% by weight of the total composition
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C21/00Treatment of glass, not in the form of fibres or filaments, by diffusing ions or metals in the surface
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C23/00Other surface treatment of glass not in the form of fibres or filaments
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C27/00Joining pieces of glass to pieces of other inorganic material; Joining glass to glass other than by fusing
    • C03C27/06Joining glass to glass by processes other than fusing
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00Glass compositions
    • C03C3/04Glass compositions containing silica
    • C03C3/076Glass compositions containing silica with 40% to 90% silica, by weight
    • C03C3/083Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00Glass compositions
    • C03C3/04Glass compositions containing silica
    • C03C3/076Glass compositions containing silica with 40% to 90% silica, by weight
    • C03C3/083Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound
    • C03C3/085Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound containing an oxide of a divalent metal
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00Glass compositions
    • C03C3/04Glass compositions containing silica
    • C03C3/076Glass compositions containing silica with 40% to 90% silica, by weight
    • C03C3/083Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound
    • C03C3/085Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound containing an oxide of a divalent metal
    • C03C3/087Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound containing an oxide of a divalent metal containing calcium oxide, e.g. common sheet or container glass
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00Glass compositions
    • C03C3/04Glass compositions containing silica
    • C03C3/076Glass compositions containing silica with 40% to 90% silica, by weight
    • C03C3/095Glass compositions containing silica with 40% to 90% silica, by weight containing rare earths
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00Glass compositions
    • C03C3/04Glass compositions containing silica
    • C03C3/076Glass compositions containing silica with 40% to 90% silica, by weight
    • C03C3/097Glass compositions containing silica with 40% to 90% silica, by weight containing phosphorus, niobium or tantalum

Definitions

  • the present invention relates to a glass plate, a laminate, and a display device.
  • Chemically strengthened glass is glass that has been immersed in a molten salt composition such as sodium nitrate to cause an ion exchange between the alkali ions contained in the glass and the alkali ions with a larger ionic radius contained in the molten salt composition, thereby forming a compressive stress layer on the surface of the glass.
  • a molten salt composition such as sodium nitrate
  • Chemically strengthened glass is widely used in applications where strength is required.
  • Examples of such applications include protective materials for display devices such as mobile phones, smartphones, and tablet terminals, building materials such as window glass, table tops, interiors of automobiles and airplanes, and protective materials for these (for example, Patent Document 1).
  • Chemically strengthened glass has an increased refractive index in the chemically strengthened area.
  • the refractive index of light at the surface layer increases and tends to approach the refractive index of light at the center of the plate thickness from the surface layer to the interior (Patent Document 2).
  • the present invention was made in consideration of the above problems, and aims to provide a glass plate that can improve the light extraction efficiency.
  • the present inventors discovered that the light extraction efficiency can be improved by providing glass with a SnO2 concentration distribution, and thus completed the present invention.
  • the present invention is as follows. 1. A semiconductor device having a first main surface and a second main surface opposite to the first main surface, The thickness is 0.30 to 1.00 mm, A glass plate satisfying the following formulas (1) and (2) in terms of mass percentage based on oxides.
  • the base composition is expressed as a mass percentage based on oxides. SiO2 55-75%, 7.0 to 30% Al 2 O 3 , 4.
  • the base composition is expressed as a mass percentage based on oxides. SiO2 55-75%, 7.0 to 30% Al 2 O 3 , 0.01 to 13.0% Li 2 O, 0-18% Na 2 O, ZrO2 from 0.1 to 6.0%, 1.0 to 9.0% Y 2 O 3 , 5.
  • the base composition is expressed as a mass percentage based on oxides.
  • the base composition is expressed as a mass percentage based on oxides. SiO2 60-66%, 18-24% Al 2 O 3 , 4.0 to 6.0% Li 2 O, 0.5-1.5% Na 2 O, K 2 O 0.1 to 1.5%, TiO2 0.01-0.2%, ZrO2 from 2.0 to 3.5%, 5.
  • the base composition is expressed as a mass percentage based on oxides. SiO2 56-60%, 25-29% Al 2 O 3 , 4.5 to 7.0% Li 2 O, 0.3-1.0% Na 2 O, K 2 O 0.1 to 0.5%, TiO2 0.01-0.2%, ZrO2 2.5-3.5%, 5.
  • the base composition is expressed as a mass percentage based on oxides.
  • the base composition is expressed as a mass percentage based on oxides.
  • the base composition is expressed as a mass percentage based on oxides. SiO2 58-62%, 21-25% Al 2 O 3 , 3.5-5.5% Li 2 O, 0.5-1.5% Na 2 O, K 2 O 0.3 to 1.5%, TiO2 0.01-0.2%, ZrO2 from 2.0 to 3.5%, 5.
  • the glass plate according to any one of 1 to 5 above which is made of crystallized glass.
  • the glass plate according to any one of 1 to 14 above which has a visible light transmittance of 91.0% or more when converted into a glass plate with a thickness of 0.7 mm.
  • a laminate comprising the glass plate according to any one of 1 to 15 above and a liquid crystal glass plate, The lamination surface of the glass plate with the liquid crystal glass plate is the second main surface, a laminate, wherein an absolute value of a difference between a refractive index of the second main surface of the glass plate measured with a prism coupler and a refractive index of the liquid crystal glass plate measured with a prism coupler is 0.001 to 0.20.
  • a display device comprising the glass plate according to any one of 1 to 15 above or the laminate according to 16 above.
  • the glass plate of the present invention has a refractive index distribution resulting from a specific range of SnO2 concentration distribution, and therefore can improve the light extraction efficiency.
  • the glass plate of the present invention as a protective member for a display device, the light extraction efficiency of the light emitted by the light-emitting element can be improved, and power saving can be achieved.
  • FIG. 1 is a diagram showing one aspect of the relationship when the horizontal axis represents the depth from the first main surface and the vertical axis represents the SnO2 concentration in a glass plate according to one embodiment.
  • 2A and 2B are diagrams each showing one aspect of the relationship between the depth from the first main surface of a glass plate according to one embodiment and the SnO2 concentration.
  • FIG. 3 is a schematic diagram of a glass manufacturing apparatus using the float process.
  • the glass plate of the present invention will be described in detail below based on the embodiments, but the present invention is not limited to the following embodiments, and can be modified as desired without departing from the gist of the present invention.
  • chemically strengthened glass refers to glass after chemical strengthening treatment.
  • glass for chemical strengthening refers to glass before chemical strengthening treatment.
  • the glass composition of glass for chemical strengthening is sometimes referred to as the base composition of chemically strengthened glass.
  • a compressive stress layer is usually formed on the glass surface due to ion exchange, so the glass composition of the non-ion-exchanged portion matches the base composition of chemically strengthened glass.
  • the concentration of components other than alkali metal oxides does not fundamentally change when expressed as mole percentage based on oxide.
  • the glass composition in this specification is expressed as mass percentage based on oxide, but the change in glass components before and after ion exchange is based on mole percentage based on oxide.
  • glass compositions are expressed as mass percentages based on oxides, and mass% may be simply written as %.
  • indicating a numerical range is used to mean that the numerical values written before and after it are included as the lower and upper limits.
  • the glass according to this embodiment has a first principal surface and a second principal surface opposite to the first principal surface, and is characterized in that it has a thickness of 0.30 to 1.00 mm and satisfies the following formulas (1) and (2) in terms of mass percentage based on oxides: 0.03 ⁇ ( ⁇ SnO 2 ) T ⁇ 1.0 (1) 0.20 ⁇ ( ⁇ SnO 2 ) B ⁇ 1.5 (2) ( ⁇ SnO 2 ) T : Value (%) obtained by subtracting [SnO 2 concentration (%) at the first main surface] from [SnO 2 concentration (%) at the sheet thickness center] ( ⁇ SnO 2 ) B : Value (%) obtained by subtracting [SnO 2 concentration (%) at the sheet thickness center] from [SnO 2 concentration (%) at the second main surface]
  • the glass sheet according to this embodiment is preferably a glass sheet (float glass) manufactured by the float method.
  • a float glass sheet has a bottom surface that comes into contact with the molten metal during forming, and a top surface that faces the bottom surface.
  • the first main surface is the top surface and the second main surface is the bottom surface.
  • ( SnO2 concentration) In the glass plate according to the present embodiment, ( ⁇ SnO2 ) T , which is the value (%) obtained by subtracting [ SnO2 concentration (%) at the first principal surface] from [ SnO2 concentration (%) at the plate thickness center], is 0.03% or more and 1.0% or less.
  • ( ⁇ SnO2 ) T 0.03% or more and 1.0% or less, a refractive index distribution can be imparted to the glass surface layer of the first principal surface, and the extraction efficiency of light emitted from the plate thickness center of the glass through the first principal surface to the outside can be improved.
  • ( ⁇ SnO 2 ) T is preferably 0.05% or more, and is preferably 0.07% or more, 0.10% or more, 0.13% or more, 0.15% or more, 0.17% or more, 0.20% or more, 0.23% or more, 0.25% or more, 0.28% or more, or 0.30% or more in the following stepwise manner.
  • ( ⁇ SnO 2 ) T may be 0.40% or more, 0.45% or more, or 0.50% or more.
  • ( ⁇ SnO 2 ) T is preferably 0.90% or less, and is preferably 0.85% or less, 0.80% or less, 0.75% or less, 0.70% or less, 0.65% or less, 0.60% or less, 0.55% or less, or 0.50% or less in the following stepwise manner.
  • ( ⁇ SnO2 ) B which is the value (%) obtained by subtracting [ SnO2 concentration (%) at the center of the plate thickness] from [ SnO2 concentration (%) at the second main surface] is 0.20% or more and 1.5% or less.
  • ( ⁇ SnO 2 ) B is preferably 0.25% or more, and is preferably 0.25% or more, 0.30% or more, 0.35% or more, 0.40% or more, 0.45% or more, or 0.50% or more in the following stepwise manner. Also, ( ⁇ SnO 2 ) B may be 0.60% or more, 0.65% or more, or 0.70% or more. Also, from the viewpoint of reducing the deformation amount when heat is applied, ( ⁇ SnO 2 ) B is preferably 1.4% or less, more preferably 1.3% or less, even more preferably 1.2% or less, particularly preferably 1.1% or less, and most preferably 1.0% or less.
  • the value obtained by subtracting the [ SnO2 concentration (%) at the first main surface] from the [ SnO2 concentration (%) at a depth of 100 ⁇ m from the first main surface] is preferably 0 to 0.9%.
  • the value obtained by subtracting the [SnO 2 concentration (%) at the first main surface] from the [SnO 2 concentration (%) at a depth of 100 ⁇ m from the first main surface] is more preferably 0.05% or more, even more preferably 0.1% or more, and particularly preferably 0.2% or more.
  • the value obtained by subtracting the [SnO 2 concentration (%) at the first main surface] from the [SnO 2 concentration (%) at a depth of 100 ⁇ m from the first main surface] may be 0.3% or more, or may be 0.4% or more.
  • the value obtained by subtracting the [SnO 2 concentration (%) at the first main surface] from the [SnO 2 concentration (%) at a depth of 100 ⁇ m from the first main surface] is more preferably 0.8% or less, even more preferably 0.7% or less, particularly preferably 0.6% or less, and most preferably 0.5% or less.
  • the value obtained by subtracting the [ SnO2 concentration (%) at the first main surface] from the [ SnO2 concentration (%) at a depth of 100 ⁇ m from the first main surface] may be 0.4% or less, 0.3% or less, or 0.2% or less.
  • [ SnO2 concentration (%) on the first principal surface] refers to the average tin oxide concentration in terms of SnO2 at a depth of 10 ⁇ m from the first principal surface.
  • the value obtained by subtracting the SnO 2 concentration (%) at a depth of 100 ⁇ m from the second main surface from the SnO 2 concentration (%) is preferably 0.15% or more, and is preferably 0.20% or more, 0.25% or more, 0.30% or more, 0.35% or more, and 0.40% or more in a stepwise manner.
  • the value obtained by subtracting the SnO 2 concentration (%) at a depth of 100 ⁇ m from the second main surface from the SnO 2 concentration (%) is preferably 1.4% or less, and is preferably 1.3% or less, 1.2% or less, 1.0% or less, 0.9% or less, 0.8% or less, and 0.7% or less in a stepwise manner.
  • a refractive index distribution is imparted to the second principal surface, thereby further increasing the efficiency of light capture entering from the second principal surface toward the center of the plate thickness, and as a result, the efficiency of light extraction from the first principal surface can be further improved.
  • [ SnO2 concentration (%) on the second principal surface] refers to the average tin oxide concentration in terms of SnO2 at a depth of 10 ⁇ m from the second principal surface.
  • the value obtained by subtracting [SnO 2 concentration (%) at a depth of 100 ⁇ m from the second main surface] from [SnO 2 concentration (%) at the second main surface] is preferably 0.15% or more, and is preferably 0.20% or more, 0.25% or more, 0.30% or more, 0.35% or more, or 0.40% or more in the following stepwise manner.
  • the value may be 0.5% or more, 0.6% or more, 0.7% or more, or 0.8% or more.
  • the value obtained by subtracting [SnO 2 concentration (%) at a depth of 100 ⁇ m from the second main surface] from [SnO 2 concentration (%) at the second main surface] is preferably 1.4% or less, and is preferably 1.3% or less, 1.2% or less, 1.0% or less, 0.9% or less, 0.8% or less, or 0.7% or less in the following stepwise manner.
  • the SnO2 concentration can be evaluated by XRF (X-ray Fluorescence Spectrometer). Examples of analysis conditions for the XRF method are as follows: The amount can be determined by a calibration curve method using glass containing SnO2 as a standard sample.
  • the measurement device can be ZSX100 manufactured by Rigaku Corporation. Output: Rh 50kV-72mA Filter: OUT Attenuator: 1/1 Slit: S4 Spectroscopic crystal: LiF (200) Detector: PC Peak angle (2 ⁇ /deg.): 126.790 Peak measurement time (sec): 40B.G.1. (2 ⁇ /deg.): 124.25B. G. 2. (2 ⁇ /deg.): 129.55B. G. 1.
  • the concentration of tin oxide can also be measured using an electron probe microanalyzer (EPMA) and a wavelength dispersive X-ray detector (WDX) attached thereto. Specifically, based on the measurement results of WDX analysis using an EPMA (JXA8600, manufactured by JEOL Ltd.), divalent and tetravalent Sn is converted to tetravalent Sn.
  • EPMA electron probe microanalyzer
  • WDX wavelength dispersive X-ray detector
  • the SnO2 concentration distribution in the glass sheet can be adjusted in the production of the glass sheet by, for example, the rising speed, the hydrogen concentration in the air, the temperature of the molten metal bath and the dealkalization treatment, and the glass composition (for example, the SnO2 content) during forming by the float method.
  • FIG. 1 shows one aspect of the relationship when the horizontal axis is the depth from the first main surface and the vertical axis is the SnO 2 concentration.
  • t represents the sheet thickness
  • t/2 represents the sheet thickness center.
  • the SnO 2 concentration gradually increases to the SnO 2 concentration at the sheet thickness center as the depth from the first main surface increases.
  • the SnO 2 concentration gradually increases from the concentration at the sheet thickness center as the depth from the first main surface increases.
  • the depth from the first main surface to x1 (represented by a1 in FIG. 1) is preferably 1/10 or more and less than 1/2 of the plate thickness t, more preferably 1/9 or more and 1/3 or less, even more preferably 1/8 or more and 1/4 or less, and particularly preferably 1/7 or more and 1/5 or less, from the viewpoint of further improving the light extraction efficiency.
  • the depth from x2 to the second main surface is preferably 1/10 or more and less than 1/2 of the plate thickness t, more preferably 1/9 or more and 1/3 or less, even more preferably 1/8 or more and 1/4 or less, and particularly preferably 1/7 or more and 1/5 or less, from the viewpoint of further improving the light extraction efficiency.
  • the gradient (wt%/mm) at the depth from the first main surface to x1 is preferably 0.01 or more and 5.0 or less, more preferably 0.1 or more and 3.0 or less, even more preferably 0.2 or more and 2.0 or less, and particularly preferably 0.3 or more and 1.5 or less.
  • the gradient (wt%/mm) at the depth from x2 to the second main surface is preferably 0.01 or more and 5.0 or less, more preferably 0.1 or more and 3.0 or less, even more preferably 0.2 or more and 2.0 or less, and particularly preferably 0.3 or more and 1.5 or less.
  • the glass plate according to one embodiment each show an aspect of the relationship between the depth from the first main surface of the glass plate according to one embodiment and the SnO2 concentration.
  • the glass plate according to one embodiment if ( ⁇ SnO 2 ) T ⁇ ( ⁇ SnO 2 ) B , warping of the glass is reduced, which is preferable.
  • the glass plate according to one embodiment is preferably such that ( ⁇ SnO 2 ) T ⁇ ( ⁇ SnO 2 ) B , since a larger refractive index difference can be created and the extraction efficiency is improved.
  • composition The composition of the glass sheet according to this embodiment will be described below.
  • the composition of the glass sheet will be described as the matrix composition.
  • the matrix composition is equivalent to the composition at the center of the sheet thickness.
  • the glass composition is expressed in mass percentage based on oxides, and the term "%" indicates mass%.
  • the glass plate according to this embodiment may contain 0.10% to 2.5% SnO 2.
  • Sn can be divalent or tetravalent, but in this specification, the concentration is expressed based on SnO 2.
  • the glass surface layer on the first main surface and the second main surface can have a refractive index, thereby improving the light extraction efficiency. If the SnO 2 content is too high, devitrification and coloring are likely to occur, so from the viewpoint of suppressing devitrification and coloring, the SnO 2 content is 2.5% or less.
  • the content of SnO2 is preferably 0.15% or more, and more preferably 0.20% or more, 0.25% or more, 0.30% or more, 0.35% or more, 0.40% or more, and 0.45% or more in the following stepwise manner.
  • the content of SnO2 is preferably 2.5% or less, more preferably 2.2% or less, particularly preferably 2.0% or less, and most preferably 1.8% or less.
  • the glass plate according to this embodiment preferably contains 55 to 75% SiO 2 , 7.0 to 30% Al 2 O 3 , and 4.5 to 13.0% Li 2 O.
  • a more preferred composition of the glass plate according to this embodiment may include a composition containing 55 to 75% SiO2 , 7.0 to 30% Al2O3 , 0.01 to 13.0% Li2O , 0 to 18% Na2O , 0.1 to 6.0% ZrO2 , 1.0 to 9.0 % Y2O3 , and 0 to 5.0% P2O5 .
  • SiO 2 is a component that forms a network structure of glass. It is also a component that increases chemical durability and can be a constituent of precipitated crystals.
  • the content of SiO 2 is preferably 55% or more, and is preferably 56% or more, 57% or more, 58% or more, 59% or more, 60% or more, 61% or more, and 62% or more in the following stepwise manner.
  • the content of SiO 2 may be 64% or more, 66% or more, or 67% or more.
  • the content of SiO 2 is preferably 75% or less, and is preferably 73% or less, 72% or less, 71% or less, 70% or less, 69% or less, 68% or less, 67% or less, 66% or less, 65% or less, 64% or less, 63% or less, 62% or less, 61% or less, and 60% or less in the following stepwise manner.
  • Al 2 O 3 is a component that increases the surface compressive stress due to chemical strengthening.
  • the content of Al 2 O 3 is preferably 7.0% or more, and is preferably 8.0% or more, 8.5% or more, 9.0% or more, 9.5% or more, 10.0% or more, 11.0% or more, 12.0% or more, 13.0% or more, 14.0% or more, 15.0% or more, 16.0% or more, 17.0% or more, 18.0% or more, 19.0% or more, 20.0% or more, 21.0% or more, 22.0% or more, 23.0% or more, 24.0% or more, and 25.0% or more.
  • the content of Al 2 O 3 is preferably 30% or less, and is stepwise increased to 29% or less, 28% or less, 27% or less, 26% or less, 25% or less, 24% or less, 23% or less, 22% or less, 21% or less, 20% or less, 19% or less, and 18% or less.
  • Li 2 O is a component that forms surface compressive stress by ion exchange, and can also be a component of precipitated crystals.
  • the content of Li 2 O is preferably 0.01% or more, and is preferably 0.05% or more, 0.1% or more, 0.5% or more, 1.0% or more, 1.5% or more, 2.0% or more, 2.5% or more, 3.0% or more, 3.5% or more, and 4.0% or more in the following stepwise manner.
  • the content of Li 2 O may be 4.5% or more, 5.0% or more, 5.5% or more, 6.0% or more, or 6.5% or more.
  • the content of Li 2 O is preferably 13.0% or less, and thereafter, stepwise, preferably, 12.0% or less, 11.0% or less, 10.5% or less, 10.0% or less, 9.0% or less, 8.0% or less, 7.0% or less, 6.5% or less, 6.0% or less, 5.5% or less, and 5.0% or less.
  • Na 2 O is a component that improves the melting property of glass.
  • the content is preferably 0.2% or more, and is preferably 0.3% or more, 0.4% or more, 0.5% or more, 0.6% or more, 0.7% or more, 0.8% or more, 0.9% or more, and 1.0% or more in the following stepwise manner.
  • Na 2 O is too much, crystals are difficult to precipitate or the chemical strengthening properties are reduced, so it is preferably 18% or less, and is preferably 10% or less, 5% or less, 4% or less, 3% or less, 2% or less, 1.5% or less, 1.3% or less, 1.2% or less, 1.1% or less, and 1.0% or less in the following stepwise manner.
  • K 2 O is a component that lowers the melting temperature of glass like Na 2 O, and may be contained.
  • the content is preferably 0.1% or more, more preferably 0.2% or more, even more preferably 0.3% or more, particularly preferably 0.4% or more, and most preferably 0.5% or more. If K 2 O is too much, the chemical strengthening properties are reduced or the chemical durability is reduced, so 8.0% or less is preferable, and the following stepwise are preferable: 5.0% or less, 3.0% or less, 2.0% or less, 1.5% or less, 1.3% or less, 1.2% or less, 1.1% or less, and 1.0% or less.
  • the total content Na 2 O and K 2 O is preferably 0% or more and 3.0% or less.
  • Na 2 O + K 2 O is more preferably 0.2% or more, even more preferably 0.4% or more, even more preferably 0.6% or more, particularly preferably 0.7% or more, and most preferably 0.8% or more.
  • Na 2 O + K 2 O is too high, the chemical strengthening properties are reduced or the chemical durability is reduced, so it is more preferably 2.7% or less, even more preferably 2.5% or less, even more preferably 2.3% or less, particularly preferably 2.2% or less, and most preferably 2.1% or less.
  • the total content of Li 2 O, Na 2 O and K 2 O is R 2 O, and R 2 O is preferably 4.5% or more and 16% or less.
  • R 2 O is more preferably 5.0% or more, further preferably 6.0% or more, particularly preferably 6.5% or more, and most preferably 7.0% or more.
  • R 2 O is preferably 15% or less, and is preferably 14% or less, 13% or less, 12% or less, 11% or less, 10% or less, 9% or less, 8% or less, and 7% or less in a stepwise manner.
  • K 2 O/R 2 O is preferably 0.20 or less, more preferably 0.15 or less, even more preferably 0.13 or less, particularly preferably 0.12 or less, and most preferably 0.11 or less.
  • the lower limit of K 2 O/R 2 O is not particularly limited, but may be, for example, 0.003 or more, 0.01 or more, 0.03 or more, 0.05 or more, or 0.10 or more.
  • ZrO2 is a component that can form a crystal nucleus during crystallization treatment, and may be contained.
  • the content of ZrO2 is preferably 0.1% or more, and is preferably 0.5% or more, 1.0% or more, 1.5% or more, 2.0% or more, and 2.5% or more in a stepwise manner.
  • the content of ZrO2 may be 3.0% or more.
  • the content of ZrO2 is preferably 6.0% or less, and is preferably 5.5% or less, 5.0% or less, 4.5% or less, 4.2% or less, 4.0% or less, 3.5% or less, and 3.0% or less in a stepwise manner.
  • ZrO2 / R2O is preferably 0.1 or more, more preferably 0.2 or more, from the viewpoint of improving chemical durability. From the viewpoint of improving transparency after crystallization, ZrO2 / R2O is preferably 0.8 or less, more preferably 0.6 or less.
  • Y 2 O 3 is a component that makes it difficult for fragments to scatter when the chemically strengthened glass is broken, and may be contained.
  • the content of Y 2 O 3 is preferably 1.0% or more, more preferably 1.3% or more, even more preferably 1.6% or more, particularly preferably 1.9% or more, and most preferably 2.1% or more.
  • the content of Y 2 O 3 is preferably 9.0% or less, more preferably 8.0% or less, even more preferably 7.0% or less, particularly preferably 6.0% or less, and most preferably 5.0% or less.
  • P 2 O 5 is not essential, but may be contained since it has the effect of promoting the phase separation of glass and promoting crystallization.
  • the content is preferably 0.2% or more, and is preferably 0.4% or more, 0.6% or more, 0.8% or more, 1.0% or more, 1.5% or more, 2.0% or more, and 2.5% or more in a stepwise manner.
  • the content of P 2 O 5 is preferably 5.0% or less, more preferably 4.5% or less, even more preferably 4.0% or less, particularly preferably 3.7% or less, and most preferably 3.5% or less.
  • TiO 2 is a component that can form a crystal nucleus during crystallization treatment, and may be contained. TiO 2 is not essential, but if it is contained, it is preferably 0.01% or more, and is preferably 0.05% or more, 0.08% or more, 0.10% or more, 0.15% or more, and 0.20% or more in the following stepwise manner. The content of TiO 2 may be 1.0% or more, or may be 1.5% or more.
  • the content of TiO 2 is preferably 3.0% or less, and is preferably 0.8% or less, 0.6% or less, 0.5% or less, 0.4% or less, 0.3% or less, 0.2% or less, and 0.15% or less in the following stepwise manner.
  • B 2 O 3 is not essential, it is a component that improves the chipping resistance of the chemically strengthened glass or chemically strengthened glass and improves the meltability, and may be contained.
  • the content is preferably 0% or more and 3.0% or less. From the viewpoint of further improving the meltability, the content of B 2 O 3 is more preferably 0.2% or more, even more preferably 0.4% or more, particularly preferably 0.6% or more, and most preferably 0.8% or more.
  • the content of B 2 O 3 is more preferably 2.0% or less, even more preferably 1.5% or less, particularly preferably 1.0% or less, and most preferably 0.8% or less.
  • BaO, SrO, MgO, CaO and ZnO are components that improve the meltability of glass and may be contained.
  • the total content of BaO, SrO, MgO, CaO and ZnO, BaO+SrO+MgO+CaO+ZnO is preferably more than 0% and 3.0% or less.
  • BaO+SrO+MgO+CaO+ZnO is more preferably 0.1% or more, even more preferably 0.2% or more, particularly preferably 0.3% or more, and most preferably 0.5% or more.
  • BaO+SrO+MgO+CaO+ZnO is preferably 2.5% or less, and thereafter, in steps, 2.0% or less, 1.8% or less, 1.5% or less, 1.0% or less, 0.8% or less, 0.6% or less, 0.4% or less, and 0.2% or less are preferable.
  • BaO, SrO and ZnO may be contained to improve the refractive index of the residual glass and bring it closer to the precipitated crystal phase, thereby improving the light transmittance of the crystallized glass and reducing the haze value.
  • the total content of BaO+SrO+ZnO is preferably 0% or more and 1.0% or less.
  • BaO+SrO+ZnO is more preferably 0.05% or more, even more preferably 0.10% or more, particularly preferably 0.20% or more, and most preferably 0.30% or more.
  • these components may reduce the ion exchange rate.
  • BaO+SrO+ZnO is more preferably 0.8% or less, even more preferably 0.6% or less, and particularly preferably 0.5% or less. BaO+SrO+ZnO may also be 0.4% or less.
  • CeO2 has the effect of oxidizing glass and may suppress coloring, so it may be contained.
  • the content is preferably 0% or more and 1.0% or less.
  • the content of CeO2 is more preferably 0.1% or more, even more preferably 0.2% or more, particularly preferably 0.3% or more, and most preferably 0.4% or more.
  • CeO2 is used as an oxidizing agent, the content of CeO2 is more preferably 0.8% or less, even more preferably 0.7% or less, particularly preferably 0.6% or less, and most preferably 0.5% or less in order to increase transparency.
  • coloring components may be added within a range that does not inhibit the achievement of the desired chemical strengthening characteristics.
  • Suitable examples of coloring components include CoO, Co3O4 , MnO, MnO2 , FeO, Fe2O3 , NiO, CuO , Cu2O , Cr2O3 , V2O5 , Bi2O3 , SeO2 , Se , Er2O3 , Nd2O3 , Eu2O3 , and Pr6O11 .
  • the total content of the coloring components is preferably 1.0 % or less. More preferably, it is 0.8% or less, even more preferably 0.6 % or less, and most preferably 0.4% or less. If it is desired to increase the visible light transmittance of the glass, it is preferable that these components are not substantially contained.
  • SO 3 As a fining agent for melting the glass, SO 3 , chlorides, fluorides, etc. may be appropriately contained. It is preferable that As 2 O 3 is not contained. When As 2 O 3 is contained, it is preferably 0.3% or less, more preferably 0.1% or less, and most preferably not contained.
  • the glass composition is not particularly limited, but specific examples include the following glass compositions.
  • the glass plate according to this embodiment has a visible light transmittance of preferably 91.0% or more when converted to a thickness of 0.7 mm, so that when used as a protective member for a display device, the display screen is easily visible.
  • the visible light transmittance is more preferably 91.2% or more, and even more preferably 91.4% or more. The higher the visible light transmittance, the more preferable it is, but it is usually 92% or less.
  • the visible light transmittance of ordinary amorphous glass is about 90%.
  • the visible light transmittance can be measured by a method in accordance with JIS R3106 (2019).
  • the glass plate according to this embodiment has a haze value of preferably 0.50% or less, more preferably 0.30% or less, even more preferably 0.20% or less, particularly preferably 0.10% or less, and most preferably 0.05% or less, when measured at a thickness of 0.7 mm.
  • the haze value is a value measured according to JIS K7136 (2000).
  • T0.7 /100 T/1000.7 /t/(1-R /100) ⁇ (1.4/t-2), where X ⁇ Y represents XY .
  • the thickness of the glass plate according to this embodiment is 0.30 to 1.00 mm.
  • the thickness is preferably 0.90 mm or less, more preferably 0.80 mm or less, even more preferably 0.70 mm or less, particularly preferably 0.65 mm or less, and most preferably 0.60 mm or less. From the viewpoint of further increasing the strength, the thickness is preferably 0.35 mm or more, more preferably 0.40 mm or more, even more preferably 0.45 mm or more, and particularly preferably 0.50 mm or more.
  • the shape of the glass plate according to this embodiment may be a shape other than a plate shape, depending on the product to which it is applied, its use, etc.
  • the glass plate may also have a border shape with a different thickness around the periphery.
  • the shape of the glass plate is not limited to this, and for example, the two main surfaces do not have to be parallel to each other, and one or both of the two main surfaces may be entirely or partially curved. More specifically, the glass plate may be, for example, a flat glass plate without warping, or a curved glass plate having a curved surface.
  • the glass plate according to the present embodiment is preferably crystallized glass.
  • the crystallized glass is obtained by heating and crystallizing amorphous glass.
  • the glass composition of the crystallized glass is the same as the composition of the amorphous glass before crystallization. That is, the matrix composition of the crystallized glass according to the present embodiment is the same as the composition of the glass plate according to the present embodiment described above, and the preferred composition range is also the same.
  • crystallized glass refers to glass in which a diffraction peak indicating crystallization is observed by X-ray diffraction (XRD).
  • X-ray diffraction measurement can be performed, for example, by using CuK ⁇ radiation to measure the range of 2 ⁇ from 10° to 80°.
  • the crystals include, for example, ⁇ -spodumene crystals, lithium disilicate crystals, ⁇ -quartz crystals, lithium metasilicate crystals, and lithium phosphate crystals, which are crystals containing lithium. These crystals may form solid solutions and dissolve various elements.
  • the elements that dissolve are alkali metals (Na, K) and alkaline earth metals (Mg, Ca, Sr, Ba), but this is not necessarily the case.
  • examples of crystals that do not contain lithium include ZrO 2 and solid solutions thereof.
  • examples of the elements that dissolve are Y, Sn, etc., but this is not necessarily the case.
  • the crystallized glass preferably contains ⁇ -spodumene as crystals. Since ⁇ -spodumene has a denser crystal structure than ⁇ -quartz solid solution, it is considered that when ions in the precipitated crystals are replaced with larger ions by ion exchange treatment for chemical strengthening, high compressive stress is generated, and the effect of chemical strengthening is enhanced.
  • the crystallized glass may contain virgilite. Virgilite is also called keatite, and is a crystal expressed as LiAlSi 2 O 6 like ⁇ -spodumene, but has a different crystal structure.
  • the average particle size of the precipitated crystals in the crystallized glass is preferably 150 nm or less, more preferably 100 nm or less, even more preferably 50 nm or less, and particularly preferably 20 nm or less.
  • the average particle size of the precipitated crystals can be determined from a transmission electron microscope (TEM) image. It can also be estimated from a scanning electron microscope (SEM) image.
  • the glass plate according to the present embodiment is preferably a chemically strengthened glass.
  • the chemically strengthened glass according to the present embodiment is obtained by chemically strengthening the glass plate according to the present embodiment described above. That is, the base composition of the chemically strengthened glass according to the present embodiment is the same as the composition of the glass plate according to the present embodiment described above, and the preferred composition range is also the same.
  • the content of alkali metal elements differs between the surface and the center in the thickness direction.
  • the glass composition in the deepest part from the surface of the chemically strengthened glass is the same as the base composition of the chemically strengthened glass.
  • the deepest part from the glass surface is, for example, a depth of 1/2 the plate thickness t.
  • the chemically strengthened glass according to this embodiment preferably has a surface compressive stress value CS 0 of 300 MPa or more, more preferably 350 MPa or more, even more preferably 400 MPa or more, and even more preferably 450 MPa or more.
  • the upper limit of the surface compressive stress value CS 0 is not particularly limited, but the surface compressive stress value CS 0 may be, for example, 1400 MPa or less.
  • the CT may become too large, so it is preferably 0.30t or less, and more preferably 0.20t or less. From the viewpoint of improving strength, the DOL is preferably 0.10t or more, and more preferably 0.15t or more.
  • the chemically strengthened glass according to this embodiment preferably has a reflectance of 4.4% or less on the first main surface.
  • the reflectance on the first main surface is more preferably 4.3% or less, even more preferably 4.2% or less, and particularly preferably 4.1% or less.
  • the chemically strengthened glass according to this embodiment preferably has a reflectance of 4.4% or more at the second principal surface.
  • a reflectance of 4.4% or more at the second principal surface With a reflectance of 4.4% or more at the second principal surface, the efficiency of capturing light entering from the second principal surface toward the center of the plate thickness can be increased, resulting in a further improvement in the efficiency of extracting light from the first principal surface.
  • the reflectance at the second principal surface is more preferably 4.45% or more, even more preferably 4.50% or more, and particularly preferably 4.55% or more.
  • Reflectance can be measured using a UV-Visible spectrophotometer by installing a reflectance unit (e.g., a Perkin Elma Lambda 900 and an automatic angle variable universal reflectance accessory).
  • a reflectance unit e.g., a Perkin Elma Lambda 900 and an automatic angle variable universal reflectance accessory.
  • the glass plate according to this embodiment can be used as cover glass for mobile electronic devices such as mobile phones, smartphones, personal digital assistants (PDAs), and tablet terminals. It is also useful as cover glass for electronic devices that are not intended to be portable, such as televisions (TVs), personal computers (PCs), and touch panels. It is also useful as building materials such as window glass, table tops, and the interiors of automobiles and airplanes, as well as cover glass for these (for example, vehicle-mounted cover glass).
  • the glass plate according to this embodiment can be bent or shaped before or after chemical strengthening to form it into a shape other than a flat plate, making it useful for applications such as enclosures with curved surfaces.
  • the method for producing a glass plate according to the present embodiment preferably includes at least the following step (1), more preferably includes at least one of the following steps (2) and (3) in addition to the step (1), and further preferably includes the following steps (1) to (3): (1) Step of producing amorphous glass (2) Step of heat-treating glass to obtain crystallized glass (3) Step of ion-exchange-treating glass to obtain chemically strengthened glass Each step will be described below.
  • Amorphous Glass can be produced, for example, by the following method. Glass raw materials are mixed so as to obtain glass of a desired composition, and heated and melted in a glass melting furnace. The molten glass is then homogenized by bubbling, stirring, adding a fining agent, etc., and formed into a glass plate of a predetermined thickness by a known forming method, and slowly cooled.
  • the preferred forming method is the float method.
  • the float method refers to a method in which molten glass is poured onto a molten metal bath and formed into a sheet.
  • the upstream side of the molten metal bath refers to the side where the molten glass flows in
  • the downstream side refers to the side where the glass formed into a ribbon shape is discharged.
  • FIG 3 shows a schematic diagram of a glass manufacturing apparatus using the float method.
  • the glass manufacturing apparatus using the float method has a melting furnace 10, a float bath 20, and an annealing furnace (lehr) 30.
  • a melting furnace 10 In manufacturing glass using the float method, glass raw materials are first melted in the melting furnace 10 to obtain molten glass.
  • the melting furnace 10 has a melting kiln 11, in which the glass raw materials 1 charged are melted to obtain molten glass 2.
  • the melting kiln 11 has a melting tank 12 on the upstream side and a cooling tank 13 on the downstream side, which are connected by a neck 14 (or throat), and the glass raw materials 1 are melted on the upstream side (i.e., the melting tank) to become molten glass 2, and the temperature of the molten glass 2 is adjusted on the downstream side.
  • molten glass 2 is continuously supplied from the upstream side onto the surface of the molten metal bath 21 stored in the float bath 20 to form a glass ribbon 3.
  • the formed glass ribbon 3 is then drawn out from the downstream end of the float bath 20 and introduced into an annealing furnace (lehr) 30 for annealing, thereby producing sheet glass.
  • the glass ribbon 3 introduced into the lehr 30 is annealed while being transported to an annealing furnace (not shown) by a transport means such as a roller conveyor.
  • the transport speed (lehr speed) in the lehr 30 depends on the speed at which the molten glass 2 flows from upstream to downstream on the molten metal bath 21.
  • the glass ribbon 3 in the lehr 30 is solidified, the molten glass 2 flows, so the speed of the molten glass 2 is slower than the lehr speed, and the speed of the molten glass 2 on the molten metal bath 21 tends to be faster downstream.
  • the type of molten metal is not particularly limited, but molten tin is an example.
  • the SnO2 concentration distribution in the glass sheet can be adjusted by 1) the lee speed, 2) the hydrogen concentration in the air, 3) the temperature of the molten metal bath, and 4) the glass composition (e.g., the SnO2 content) during forming by the float method.
  • the glass composition e.g., the SnO2 content
  • the rare speed is preferably 20 m/h or more, more preferably 100 m/h or more, even more preferably 200 m/h or more, particularly preferably 300 m/h or more, and most preferably 400 m/h or more. If the rare speed is too high, the quality of the glass is likely to deteriorate, so the rare speed is preferably 1200 m/h or less, more preferably 1000 m/h or less, even more preferably 900 m/h or less, particularly preferably 850 m/h or less, and most preferably 800 m/h or less.
  • the hydrogen concentration in the atmosphere during float forming can be adjusted by the concentration of gas such as reducing gas or oxidizing gas supplied to the glass during float forming, the amount of gas sprayed, the main surface to be sprayed, the treatment temperature and time, etc.
  • gas supply include supply from a hole in the ceiling disposed at an interval from the molten metal bath 21, and spraying the gas against the glass sheet in an annealing furnace.
  • the reducing gas may be, for example, nitrogen gas, hydrogen gas, carbon monoxide gas, or a mixture of these.
  • the reducing gas may contain an inert gas such as air, nitrogen, or argon as a carrier gas.
  • the reducing gas may be supplied, for example, from a hole in the ceiling spaced apart from the molten metal bath 21.
  • Specific examples of the reducing gas treatment conditions include a mixed gas of 0.1 to 100 cc/min and a treatment temperature of 600 to 1200°C.
  • the mixed gas is, for example, a mixed gas of nitrogen gas and hydrogen gas, containing 80% to 99.5% by volume of nitrogen gas and 0.5% to 20% by volume of hydrogen gas.
  • the oxidizing gas examples include sulfur dioxide gas ( SO2 gas), hydrofluoric acid gas, oxygen gas, or a mixture thereof.
  • the oxidizing gas may contain an inert gas such as air, nitrogen, or argon as a carrier gas.
  • the oxidizing gas may further contain water vapor.
  • the oxidizing gas is, for example, sprayed onto the main surface of the glass plate (preferably at least the top surface, specifically, for example, only the first main surface or both the first main surface and the second main surface) in an annealing furnace.
  • Specific examples of the treatment conditions for the oxidizing gas include a mixed gas of 0.1 to 100 cc/min and a treatment temperature of 600 to 1200°C.
  • the mixed gas may vary, for example, in an oxygen content range of 0.5% by volume to 10% by volume or higher. In some embodiments, the mixed gas may be oxygen gas with a maximum of 100% by volume.
  • the temperature of the molten metal bath is preferably 700° C. or higher, more preferably 800° C. or higher, even more preferably 850° C. or higher, and particularly preferably 900° C. or higher. From the viewpoint of volatilization of metallic tin, the temperature is preferably 1300° C. or lower, more preferably 1250° C. or lower, even more preferably 1200° C. or lower, and particularly preferably 1150° C. or lower.
  • the SnO2 concentration distribution in the glass sheet can also be adjusted by adjusting the SnO2 concentration of the matrix composition.
  • the preferred range of the SnO2 concentration of the matrix composition is the same as the range described above in the section ⁇ Glass sheet> (composition).
  • the heat treatment includes a multi-stage heat treatment of two or more stages.
  • the multi-stage heat treatment means a heat treatment in which a predetermined temperature range is held for a predetermined time, and the temperature range is changed and the like is held multiple times.
  • the multi-stage heat treatment can be, for example, a two-stage heat treatment in which the temperature is raised from room temperature to a first treatment temperature and held for a certain time, and then the second treatment temperature, which is higher than the first treatment temperature, is held for a certain time.
  • the first treatment temperature is preferably in a temperature range where the crystal nucleation rate is high for that glass composition
  • the second treatment temperature is preferably in a temperature range where the crystal growth rate is high for that glass composition.
  • the first treatment temperature is, for example, 550°C to 800°C
  • the second treatment temperature is, for example, 850°C to 1000°C, and after being held at the first treatment temperature for 2 to 10 hours, it is held at the second treatment temperature for 2 to 10 hours.
  • the heating and cooling rates in each stage of heat treatment are preferably 5 to 120°C/min.
  • a heating and cooling rate of 5°C/min or more is preferable because it allows the rate to follow the rate of crystal formation within the material.
  • a heating and cooling rate of 120°C/min or less is preferable because it allows the deformation of the material to be suppressed.
  • the molten glass is homogenized and formed into a glass plate of a specified thickness, or the molten glass is formed into a block shape, followed by a continuous crystallization process.
  • the crystallized glass obtained by the above procedure is ground and polished as necessary to form a crystallized glass plate.
  • the chemical strengthening treatment is performed by, for example, immersing the glass plate for 0.1 to 500 hours in a molten salt such as potassium nitrate heated to 360 to 600° C.
  • a molten salt such as potassium nitrate heated to 360 to 600° C.
  • the heating temperature of the molten salt is preferably 375 to 500° C.
  • the immersion time of the glass plate in the molten salt is preferably 0.3 to 200 hours.
  • Examples of molten salts for carrying out chemical strengthening treatment include nitrates, sulfates, carbonates, and chlorides.
  • examples of nitrates include lithium nitrate, sodium nitrate, potassium nitrate, cesium nitrate, and silver nitrate.
  • examples of sulfates include lithium sulfate, sodium sulfate, potassium sulfate, cesium sulfate, and silver sulfate.
  • Examples of carbonates include lithium carbonate, sodium carbonate, and potassium carbonate.
  • Examples of chlorides include lithium chloride, sodium chloride, potassium chloride, cesium chloride, and silver chloride.
  • the processing conditions for the chemical strengthening treatment can be appropriately selected taking into consideration the properties and composition of the glass for chemical strengthening, the type of molten salt, and the chemical strengthening properties, such as the surface compressive stress and the depth of the compressive stress layer, desired for the final chemically strengthened glass.
  • a long-term chemical strengthening treatment on amorphous glass or crystallized glass, which has a large fracture toughness value.
  • a long-term chemical strengthening treatment When an ion exchange reaction progresses due to a long-term chemical strengthening treatment, a large compressive stress is generated in the surface layer, and at the same time, a decrease in compressive stress occurs mainly near the surface due to structural relaxation, making it easier to achieve the compressive stress balance of this embodiment.
  • the chemical strengthening treatment may be performed only once, or multiple chemical strengthening treatments (multi-stage strengthening) may be performed under two or more different conditions.
  • the laminate according to this embodiment is a laminate including the glass plate according to the embodiment described above and a liquid crystal glass plate, wherein a first main surface of the glass plate is the outermost surface of the laminate, a second main surface of the glass plate is a lamination surface with the liquid crystal glass plate, and the absolute value of the difference between the refractive index of the second main surface of the glass plate measured with a prism coupler and the refractive index of the liquid crystal glass plate measured with a prism coupler is 0.001 to 0.20.
  • the absolute value of the difference between the refractive index measured with a prism coupler on the second main surface of the glass plate and the refractive index measured with a prism coupler on the liquid crystal glass plate is preferably 0.001 to 0.20, which allows light to easily enter the glass plate from the liquid crystal glass plate and suppresses light loss.
  • the laminate according to this embodiment preferably has an absolute value of the difference between the refractive index measured with a prism coupler of the second main surface of the glass plate and the refractive index measured with a prism coupler of the liquid crystal glass plate of 0.10 or less, more preferably 0.050 or less, even more preferably 0.030 or less, and particularly preferably 0.010 or less.
  • the second main surface of the glass plate is the lamination surface with the liquid crystal glass plate, but an intermediate layer may be included between the glass plate and the liquid crystal glass plate.
  • intermediate layers include an adhesive layer, a printed layer, and a functional layer (e.g., an optical filter layer, a refractive index matching layer).
  • a functional layer e.g., an anti-fouling layer, an anti-reflection layer
  • the display device according to the present embodiment includes the glass plate according to the present embodiment or the laminate according to the present embodiment.
  • Examples of the display device according to the present embodiment include a display device such as an in-vehicle car navigation system and a portable display device such as a smartphone.
  • Examples 1 to 20 are examples, and Examples 21 to 31 are comparative examples.
  • Examples 1 to 20 Production of Glass> Glasses were prepared by the float process so as to have the compositions shown in Tables 1 to 3 in terms of mass percentage based on oxides. In Examples 4, 6 to 8, 10, 12, and 14, a two-stage heat treatment was carried out under the conditions shown in the table to obtain glass plates of crystallized glass.
  • Examples 21 to 31 Production of Glass> Glass raw materials were mixed to obtain the compositions shown in Tables 3 and 4 in terms of mass percentage based on oxides, and weighed out to give 400 g of glass. The mixed raw materials were then placed in a platinum crucible and placed in an electric furnace at 1500 to 1700°C, melted for about 3 hours, degassed, and homogenized. The molten glass thus obtained was poured into a metal mold and held at a temperature about 50° C. higher than the glass transition point for 1 hour, and then cooled to room temperature at a rate of 0.5° C./min to obtain a glass block. The obtained glass block was cut and ground, and finally both sides were polished to obtain a glass plate having a thickness of 0.7 mm. For Examples 25, 27, and 28, a two-stage heat treatment was carried out under the conditions shown in Table 4 to obtain glass plates of crystallized glass.
  • ⁇ Glass evaluation> Each of the glass plates obtained above was evaluated as follows. For each glass, the tin oxide concentration (SnO 2 ) T near the surface layer on the top surface (first main surface) and the tin oxide concentration (SnO 2 ) B near the surface layer on the bottom surface (second main surface) were evaluated. The concentration of tin oxide was measured for the same glass plate as that used in the examples and comparative examples using an electron probe microphone analyzer (EPMA) and a wavelength dispersive X-ray detector (WDX) attached thereto. Specifically, WDX analysis was performed using an EPMA (JXA8600, manufactured by JEOL Ltd.). From the measurement results, divalent and tetravalent Sn was converted to tetravalent.
  • EPMA electron probe microphone analyzer
  • WDX wavelength dispersive X-ray detector
  • the tin oxide concentration in terms of SnO 2 at a depth of 10 ⁇ m from the top surface was averaged, and this was taken as the SnO 2 concentration (SnO 2 ) T at the top surface (first main surface).
  • the tin oxide concentration in terms of SnO 2 at a depth of 10 ⁇ m from the bottom surface was averaged, and this was taken as the SnO 2 concentration (SnO 2 ) B at the bottom surface (second main surface).
  • the tin oxide concentration in terms of SnO2 at the center of the sheet thickness was also measured in the same manner, and ⁇ ( SnO2 ) T and ⁇ ( SnO2 ) B were calculated from these values.
  • the refractive index of the bottom surface (second main surface) was greater than that of the top surface (first main surface). From this, when used as cover glass for a display, it is expected that light will easily enter the second main surface from the liquid crystal glass plate because the refractive index of the bottom surface can be made closer to the refractive index of the glass on the surface of the light-emitting component. In addition, since the glass surface layer on the top surface has a refractive index distribution, it is expected that light will easily be emitted from the center of the glass thickness through the first main surface to the outside. In other words, when used as cover glass with the bottom surface of the glass plate facing the display, it is expected that the light extraction efficiency can be further improved.

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Abstract

The purpose of the present invention is to provide glass capable of improving the light extraction efficiency. The glass plate has a first main surface and a second main surface facing the first main surface, has a thickness of 0.30-1.00 mm, and satisfies formulas (1) and (2) with expression as the mass percentage on an oxide basis. (1): 0.03 ≤ (ΔSnO2)T ≤ 1.0; (2): 0.20 ≤ (ΔSnO2)B ≤ 1.5

Description

ガラス板、積層体及びディスプレイ装置Glass plate, laminate and display device

 本発明は、ガラス板、積層体及びディスプレイ装置に関する。 The present invention relates to a glass plate, a laminate, and a display device.

 化学強化ガラスは、ガラスを硝酸ナトリウムなどの溶融塩組成物に浸漬する等の方法で、ガラス中に含まれるアルカリイオンと、溶融塩組成物に含まれるイオン半径がより大きいアルカリイオンとのイオン交換を生じさせ、それによってガラスの表層部分に圧縮応力層を形成したガラスである。 Chemically strengthened glass is glass that has been immersed in a molten salt composition such as sodium nitrate to cause an ion exchange between the alkali ions contained in the glass and the alkali ions with a larger ionic radius contained in the molten salt composition, thereby forming a compressive stress layer on the surface of the glass.

 化学強化ガラスは、強度が求められる用途に広く用いられている。かかる用途としては、携帯電話、スマートフォン又はタブレット端末等のディスプレイ装置の保護部材、窓ガラス等の建築用資材、テーブルトップ、自動車や飛行機等の内装等やそれらの保護部材が挙げられる(例えば、特許文献1)。 Chemically strengthened glass is widely used in applications where strength is required. Examples of such applications include protective materials for display devices such as mobile phones, smartphones, and tablet terminals, building materials such as window glass, table tops, interiors of automobiles and airplanes, and protective materials for these (for example, Patent Document 1).

 化学強化ガラスは、化学強化された領域における光の屈折率が上昇する。ガラスの表層がイオン交換された化学強化ガラスでは、表層における光の屈折率が上昇し、表層から内部にかけて板厚中心における光の屈折率に近づいていく傾向となる(特許文献2)。 Chemically strengthened glass has an increased refractive index in the chemically strengthened area. In chemically strengthened glass in which the surface layer is ion-exchanged, the refractive index of light at the surface layer increases and tends to approach the refractive index of light at the center of the plate thickness from the surface layer to the interior (Patent Document 2).

国際公開第2019/070005号International Publication No. 2019/070005 日本国特開2012-211051号公報Japanese Patent Application Publication No. 2012-211051

 ガラスの表層がイオン交換された化学強化ガラスをディスプレイ装置等の発光素子を有する部材の保護部材として用いると、発光素子からの光の取り出し効率が低下するという課題がある。 When chemically strengthened glass with an ion-exchanged surface is used as a protective material for components that have light-emitting elements, such as display devices, there is an issue that the efficiency of extracting light from the light-emitting elements decreases.

 本発明は、上記課題を鑑みてなされたものであり、光の取り出し効率を向上し得るガラス板の提供を目的とする。 The present invention was made in consideration of the above problems, and aims to provide a glass plate that can improve the light extraction efficiency.

 本発明者らは、ガラスにSnO濃度分布を持たせることで、光の取り出し効率を向上し得ることを見出し、本発明を完成するに至った。 The present inventors discovered that the light extraction efficiency can be improved by providing glass with a SnO2 concentration distribution, and thus completed the present invention.

 すなわち、本発明は下記の通りである。
1.第1主面と、前記第1主面に対向する第2主面と、を有し、
 厚さが0.30~1.00mmであり、 
 酸化物基準の質量百分率表示で、下記式(1)及び(2)を満たす、ガラス板。
 0.03≦(ΔSnO≦1.0 (1)
 0.20≦(ΔSnO≦1.5 (2)
(ΔSnO:[板厚中心におけるSnO濃度(%)]から[前記第1主面におけるSnO濃度(%)]を減じた値(%)
(ΔSnO:[前記第2主面におけるSnO濃度(%)]から[板厚中心におけるSnO濃度(%)]を減じた値(%) 
2.酸化物基準の質量百分率表示で、前記第1主面から深さ100μmにおけるSnO濃度(%)から、前記第1主面におけるSnO濃度(%)を減じた値が0~0.9%である、前記1に記載のガラス板。
3.酸化物基準の質量百分率表示で、前記第2主面におけるSnO濃度(%)から、前記第2主面から深さ100μmにおけるSnO濃度(%)を減じた値が0.15~1.4%である、前記1又は2に記載のガラス板。
4.母組成が、酸化物基準の質量百分率表示で、
 SiOを55~75%、
 Alを7.0~30%、
 LiOを0.01~13.0%含有する、前記1~3のいずれか1に記載のガラス板。
5.母組成が、酸化物基準の質量百分率表示で、
 SiOを55~75%、
 Alを7.0~30%、
 LiOを0.01~13.0%、
 NaOを0~18%、
 ZrOを0.1~6.0%、
 Yを1.0~9.0%、
 Pを0~5.0%含有する、前記1~4のいずれか1に記載のガラス板。
6.母組成が、酸化物基準の質量百分率表示で、
 SiOを60~66%、
 Alを23~27%、
 LiOを3.5~5.0%、
 NaOを1.0~2.0%、
 KOを0.1~0.5%、
 TiOを0.01~0.2%、
 ZrOを2.5~3.5%、
 SnOを0.4~1.0%、含有する前記1~4のいずれか1に記載のガラス板。
7.母組成が、酸化物基準の質量百分率表示で、
 SiOを60~66%、
 Alを18~24%、
 LiOを4.0~6.0%、
 NaOを0.5~1.5%、
 KOを0.1~1.5%、
 TiOを0.01~0.2%、
 ZrOを2.0~3.5%、
 SnOを1.5~3.0%、含有する前記1~4のいずれか1に記載のガラス板。
8.母組成が、酸化物基準の質量百分率表示で、
 SiOを56~60%、
 Alを25~29%、
 LiOを4.5~7.0%、
 NaOを0.3~1.0%、
 KOを0.1~0.5%、
 TiOを0.01~0.2%、
 ZrOを2.5~3.5%、
 SnOを1.5~3.0%、含有する前記1~4のいずれか1に記載のガラス板。
9.母組成が、酸化物基準の質量百分率表示で、
 SiOを60~64%、
 Alを20~24%、
 LiOを3.5~5.5%、
 NaOを0.8~1.5%、
 KOを0.5~1.0%、
 TiOを0.01~0.2%、
 ZrOを2.5~3.5%、
 SnOを1.5~3.0%、含有する前記1~4のいずれか1に記載のガラス板。
10.母組成が、酸化物基準の質量百分率表示で、
 SiOを58~62%、
 Alを21~25%、
 LiOを3.5~5.5%、
 NaOを0.5~1.5%、
 KOを0.3~1.5%、
 TiOを0.01~0.2%、
 ZrOを2.0~3.0%、含有する前記1~4のいずれか1に記載のガラス板。
11.母組成が、酸化物基準の質量百分率表示で、
 SiOを58~62%、
 Alを21~25%、
 LiOを3.5~5.5%、
 NaOを0.5~1.5%、
 KOを0.3~1.5%、
 TiOを0.01~0.2%、
 ZrOを2.0~3.5%、
 SnOを1.5~3.0%、含有する前記1~4のいずれか1に記載のガラス板。
12.結晶化ガラスである、前記1~5のいずれか1に記載のガラス板。
13.化学強化ガラスである、前記1~12のいずれか1に記載のガラス板。
14.フロートガラスである、前記1~13のいずれか1に記載のガラス板。
15.厚さ0.7mmに換算した場合の可視光透過率が91.0%以上である、前記1~14のいずれか1に記載のガラス板。
16.前記1~15のいずれか1に記載のガラス板と、液晶ガラス板とを含む積層体であって、
 前記ガラス板における前記液晶ガラス板との積層面は前記第2主面であり、
 前記ガラス板における前記第2主面のプリズムカプラーで測定した屈折率と、前記液晶ガラス板のプリズムカプラーで測定した屈折率との差の絶対値が0.001~0.20である、積層体。
17.前記1~15のいずれか1に記載のガラス板又は前記16に記載の積層体を含むディスプレイ装置。
That is, the present invention is as follows.
1. A semiconductor device having a first main surface and a second main surface opposite to the first main surface,
The thickness is 0.30 to 1.00 mm,
A glass plate satisfying the following formulas (1) and (2) in terms of mass percentage based on oxides.
0.03≦(ΔSnO 2 ) T ≦1.0 (1)
0.20≦(ΔSnO 2 ) B ≦1.5 (2)
(ΔSnO 2 ) T : Value (%) obtained by subtracting [SnO 2 concentration (%) on the first main surface] from [SnO 2 concentration (%) on the sheet thickness center]
(ΔSnO 2 ) B : Value (%) obtained by subtracting [SnO 2 concentration (%) at the center of sheet thickness] from [SnO 2 concentration (%) at the second main surface]
2. The glass plate according to 1, wherein the value obtained by subtracting the SnO2 concentration (%) at the first main surface from the SnO2 concentration (%) at a depth of 100 μm from the first main surface is 0 to 0.9%, expressed in mass percentage based on oxide.
3. The glass plate according to 1 or 2, wherein the value obtained by subtracting the SnO2 concentration (%) at a depth of 100 μm from the second main surface from the SnO2 concentration (%) in the second main surface is 0.15 to 1.4%, expressed in mass percentage based on oxide.
4. The base composition is expressed as a mass percentage based on oxides.
SiO2 55-75%,
7.0 to 30% Al 2 O 3 ,
4. The glass plate according to any one of 1 to 3 above, containing 0.01 to 13.0% of Li 2 O.
5. The base composition is expressed as a mass percentage based on oxides.
SiO2 55-75%,
7.0 to 30% Al 2 O 3 ,
0.01 to 13.0% Li 2 O,
0-18% Na 2 O,
ZrO2 from 0.1 to 6.0%,
1.0 to 9.0% Y 2 O 3 ,
5. The glass plate according to any one of 1 to 4 above, containing 0 to 5.0% of P 2 O 5 .
6. The base composition is expressed as a mass percentage based on oxides.
SiO2 60-66%,
23-27% Al 2 O 3 ,
3.5 to 5.0% Li 2 O,
1.0-2.0% Na 2 O,
K 2 O 0.1 to 0.5%,
TiO2 0.01-0.2%,
ZrO2 2.5-3.5%,
5. The glass plate according to any one of 1 to 4 above, containing 0.4 to 1.0% of SnO2 .
7. The base composition is expressed as a mass percentage based on oxides.
SiO2 60-66%,
18-24% Al 2 O 3 ,
4.0 to 6.0% Li 2 O,
0.5-1.5% Na 2 O,
K 2 O 0.1 to 1.5%,
TiO2 0.01-0.2%,
ZrO2 from 2.0 to 3.5%,
5. The glass plate according to any one of 1 to 4 above, containing 1.5 to 3.0% of SnO2 .
8. The base composition is expressed as a mass percentage based on oxides.
SiO2 56-60%,
25-29% Al 2 O 3 ,
4.5 to 7.0% Li 2 O,
0.3-1.0% Na 2 O,
K 2 O 0.1 to 0.5%,
TiO2 0.01-0.2%,
ZrO2 2.5-3.5%,
5. The glass plate according to any one of 1 to 4 above, containing 1.5 to 3.0% of SnO2 .
9. The base composition is expressed as a mass percentage based on oxides.
SiO2 60 to 64%,
20-24% Al 2 O 3 ,
3.5-5.5% Li 2 O,
0.8-1.5% Na 2 O,
K 2 O 0.5 to 1.0%,
TiO2 0.01-0.2%,
ZrO2 2.5-3.5%,
5. The glass plate according to any one of 1 to 4 above, containing 1.5 to 3.0% of SnO2 .
10. The base composition is expressed as a mass percentage based on oxides.
SiO2 58-62%,
21-25% Al 2 O 3 ,
3.5-5.5% Li 2 O,
0.5-1.5% Na 2 O,
K 2 O 0.3 to 1.5%,
TiO2 0.01-0.2%,
5. The glass plate according to any one of 1 to 4 above, containing 2.0 to 3.0% of ZrO2 .
11. The base composition is expressed as a mass percentage based on oxides.
SiO2 58-62%,
21-25% Al 2 O 3 ,
3.5-5.5% Li 2 O,
0.5-1.5% Na 2 O,
K 2 O 0.3 to 1.5%,
TiO2 0.01-0.2%,
ZrO2 from 2.0 to 3.5%,
5. The glass plate according to any one of 1 to 4 above, containing 1.5 to 3.0% of SnO2 .
12. The glass plate according to any one of 1 to 5 above, which is made of crystallized glass.
13. The glass plate according to any one of 1 to 12 above, which is a chemically strengthened glass.
14. The glass plate according to any one of 1 to 13 above, which is a float glass.
15. The glass plate according to any one of 1 to 14 above, which has a visible light transmittance of 91.0% or more when converted into a glass plate with a thickness of 0.7 mm.
16. A laminate comprising the glass plate according to any one of 1 to 15 above and a liquid crystal glass plate,
The lamination surface of the glass plate with the liquid crystal glass plate is the second main surface,
a laminate, wherein an absolute value of a difference between a refractive index of the second main surface of the glass plate measured with a prism coupler and a refractive index of the liquid crystal glass plate measured with a prism coupler is 0.001 to 0.20.
17. A display device comprising the glass plate according to any one of 1 to 15 above or the laminate according to 16 above.

 本発明のガラス板によれば、特定範囲のSnO濃度分布に起因する屈折率分布を有しているため光の取り出し効率を向上し得る。本発明のガラス板をディスプレイ装置の保護部材等として用いることにより、発光素子が放出する光の取り出し効率を高め、省電力化を図り得る。 The glass plate of the present invention has a refractive index distribution resulting from a specific range of SnO2 concentration distribution, and therefore can improve the light extraction efficiency. By using the glass plate of the present invention as a protective member for a display device, the light extraction efficiency of the light emitted by the light-emitting element can be improved, and power saving can be achieved.

図1は、一実施形態に係るガラス板における、横軸を第1主面からの深さとし、縦軸をSnO濃度とした場合の関係の一態様を表す図である。FIG. 1 is a diagram showing one aspect of the relationship when the horizontal axis represents the depth from the first main surface and the vertical axis represents the SnO2 concentration in a glass plate according to one embodiment. 図2の(a)及び(b)は、一実施形態に係るガラス板の第1主面からの深さとSnO濃度との関係の一態様をそれぞれ示す図である。2A and 2B are diagrams each showing one aspect of the relationship between the depth from the first main surface of a glass plate according to one embodiment and the SnO2 concentration. 図3は、フロート法によるガラスの製造装置の概略図である。FIG. 3 is a schematic diagram of a glass manufacturing apparatus using the float process.

 以下に、本発明のガラス板について実施形態に基づき詳細に説明するが、本発明は以下の実施形態に限定されるものではなく、本発明の要旨を逸脱しない範囲において、任意に変形して実施できる。 The glass plate of the present invention will be described in detail below based on the embodiments, but the present invention is not limited to the following embodiments, and can be modified as desired without departing from the gist of the present invention.

 本明細書において、「化学強化ガラス」は、化学強化処理を施した後のガラスを指す。また、「化学強化用ガラス」は、化学強化処理を施す前のガラスを指す。 In this specification, "chemically strengthened glass" refers to glass after chemical strengthening treatment. Also, "glass for chemical strengthening" refers to glass before chemical strengthening treatment.

 本明細書において化学強化用ガラスのガラス組成を、化学強化ガラスの母組成ということがある。化学強化ガラスでは通常、ガラス表面部分にイオン交換による圧縮応力層が形成されるので、イオン交換されていない部分のガラス組成は化学強化ガラスの母組成と一致する。また、イオン交換された部分でもアルカリ金属酸化物以外の成分の濃度は、酸化物基準のモル百分率表示で基本的に変化しない。なお、後述するように本明細書のガラス組成は酸化物基準の質量百分率表示で示すが、イオン交換前後のガラス成分の変化は酸化物基準のモル百分率表示に基づくものとする。 In this specification, the glass composition of glass for chemical strengthening is sometimes referred to as the base composition of chemically strengthened glass. In chemically strengthened glass, a compressive stress layer is usually formed on the glass surface due to ion exchange, so the glass composition of the non-ion-exchanged portion matches the base composition of chemically strengthened glass. Furthermore, even in the ion-exchanged portion, the concentration of components other than alkali metal oxides does not fundamentally change when expressed as mole percentage based on oxide. As will be described later, the glass composition in this specification is expressed as mass percentage based on oxide, but the change in glass components before and after ion exchange is based on mole percentage based on oxide.

 本明細書において、ガラス組成は酸化物基準の質量百分率表示で示し、質量%を単に%と記載することがある。また、数値範囲を示す「~」とは、その前後に記載された数値を下限値及び上限値として含む意味で使用される。 In this specification, glass compositions are expressed as mass percentages based on oxides, and mass% may be simply written as %. In addition, "~" indicating a numerical range is used to mean that the numerical values written before and after it are included as the lower and upper limits.

<ガラス板>
 本実施形態に係るガラスは、第1主面と、前記第1主面に対向する第2主面と、を有し、厚さが0.30~1.00mmであり、酸化物基準の質量百分率表示で、下記式(1)及び(2)を満たすことを特徴とする。
 0.03≦(ΔSnO≦1.0 (1)
 0.20≦(ΔSnO≦1.5 (2)
(ΔSnO:[板厚中心におけるSnO濃度(%)]から[前記第1主面におけるSnO濃度(%)]を減じた値(%)(ΔSnO:[前記第2主面におけるSnO濃度(%)]から[板厚中心におけるSnO濃度(%)]を減じた値(%)
<Glass plate>
The glass according to this embodiment has a first principal surface and a second principal surface opposite to the first principal surface, and is characterized in that it has a thickness of 0.30 to 1.00 mm and satisfies the following formulas (1) and (2) in terms of mass percentage based on oxides:
0.03≦(ΔSnO 2 ) T ≦1.0 (1)
0.20≦(ΔSnO 2 ) B ≦1.5 (2)
(ΔSnO 2 ) T : Value (%) obtained by subtracting [SnO 2 concentration (%) at the first main surface] from [SnO 2 concentration (%) at the sheet thickness center] (ΔSnO 2 ) B : Value (%) obtained by subtracting [SnO 2 concentration (%) at the sheet thickness center] from [SnO 2 concentration (%) at the second main surface]

 本実施形態に係るガラス板は、フロート法により製造されたガラス(フロートガラス)板であることが好ましい。フロートガラス板には、成形時に溶融金属と接するボトム面と、該ボトム面に対向するトップ面とが存在する。本実施形態において、ガラス板がフロートガラス板である場合、第1主面はトップ面であり、第2主面はボトム面であることが好ましい。 The glass sheet according to this embodiment is preferably a glass sheet (float glass) manufactured by the float method. A float glass sheet has a bottom surface that comes into contact with the molten metal during forming, and a top surface that faces the bottom surface. In this embodiment, when the glass sheet is a float glass sheet, it is preferable that the first main surface is the top surface and the second main surface is the bottom surface.

(SnO濃度)
 本実施形態に係るガラス板は、[板厚中心におけるSnO濃度(%)]から[第1主面におけるSnO濃度(%)]を減じた値(%)である(ΔSnOが、0.03%以上1.0%以下である。(ΔSnOが、0.03%以上1.0%以下であることにより、第1主面のガラス表層において屈折率分布を持たせて、ガラスの板厚中心から第1主面を経て外部へと放出される光の取り出し効率を向上し得る。
( SnO2 concentration)
In the glass plate according to the present embodiment, ( ΔSnO2 ) T , which is the value (%) obtained by subtracting [ SnO2 concentration (%) at the first principal surface] from [ SnO2 concentration (%) at the plate thickness center], is 0.03% or more and 1.0% or less. By making ( ΔSnO2 ) T 0.03% or more and 1.0% or less, a refractive index distribution can be imparted to the glass surface layer of the first principal surface, and the extraction efficiency of light emitted from the plate thickness center of the glass through the first principal surface to the outside can be improved.

 光の取り出し効率をより高める観点から、(ΔSnOは0.05%以上が好ましく、以下段階的に0.07%以上、0.10%以上、0.13%以上、0.15%以上、0.17%以上、0.20%以上、0.23%以上、0.25%以上、0.28%以上、0.30%以上が好ましい。また、(ΔSnOは0.40%以上であってもよく、0.45%以上であってもよく、0.50%以上であってもよい。また、イオン交換の効率の観点から、(ΔSnOは0.90%以下が好ましく、以下段階的に0.85%以下、0.80%以下、0.75%以下、0.70%以下、0.65%以下、0.60%以下、0.55%以下、0.50%以下が好ましい。 From the viewpoint of further increasing the light extraction efficiency, (ΔSnO 2 ) T is preferably 0.05% or more, and is preferably 0.07% or more, 0.10% or more, 0.13% or more, 0.15% or more, 0.17% or more, 0.20% or more, 0.23% or more, 0.25% or more, 0.28% or more, or 0.30% or more in the following stepwise manner. In addition, (ΔSnO 2 ) T may be 0.40% or more, 0.45% or more, or 0.50% or more. In addition, from the viewpoint of ion exchange efficiency, (ΔSnO 2 ) T is preferably 0.90% or less, and is preferably 0.85% or less, 0.80% or less, 0.75% or less, 0.70% or less, 0.65% or less, 0.60% or less, 0.55% or less, or 0.50% or less in the following stepwise manner.

 本実施形態に係るガラス板は、[前記第2主面におけるSnO濃度(%)]から[板厚中心におけるSnO濃度(%)]を減じた値(%)である(ΔSnOが、0.20%以上1.5%以下である。(ΔSnOが、0.20%以上1.5%以下であることにより、第2主面のガラス表層において屈折率分布を持たせて、発光部材表面のガラスとの屈折率を近づけることにより、第2主面から板厚中心にかけて入ってくる光の取り込み効率を高めることで、結果として第1主面からの光の取り出し効率を向上し得る。 In the glass plate according to the present embodiment, ( ΔSnO2 ) B , which is the value (%) obtained by subtracting [ SnO2 concentration (%) at the center of the plate thickness] from [ SnO2 concentration (%) at the second main surface], is 0.20% or more and 1.5% or less. By having ( ΔSnO2 ) B of 0.20% or more and 1.5% or less, a refractive index distribution is provided in the glass surface layer of the second main surface, and the refractive index is made closer to that of the glass on the surface of the light-emitting component, thereby increasing the efficiency of light capture entering from the second main surface toward the center of the plate thickness, and as a result, the efficiency of light extraction from the first main surface can be improved.

 光の取り出し効率をより高める観点から、(ΔSnOは0.25%以上が好ましく、以下段階的に0.25%以上、0.30%以上、0.35%以上、0.40%以上、0.45%以上、0.50%以上が好ましい。また、(ΔSnOは0.60%以上であってもよく、0.65%以上であってもよく、0.70%以上であってもよい。また、熱を加えたときの変形量を小さくする観点から、(ΔSnOは好ましくは1.4%以下、より好ましくは1.3%以下、さらに好ましくは1.2%以下、特に好ましくは1.1%以下、最も好ましくは1.0%以下である。 From the viewpoint of further increasing the light extraction efficiency, (ΔSnO 2 ) B is preferably 0.25% or more, and is preferably 0.25% or more, 0.30% or more, 0.35% or more, 0.40% or more, 0.45% or more, or 0.50% or more in the following stepwise manner. Also, (ΔSnO 2 ) B may be 0.60% or more, 0.65% or more, or 0.70% or more. Also, from the viewpoint of reducing the deformation amount when heat is applied, (ΔSnO 2 ) B is preferably 1.4% or less, more preferably 1.3% or less, even more preferably 1.2% or less, particularly preferably 1.1% or less, and most preferably 1.0% or less.

 本実施形態に係るガラス板は、[第1主面から深さ100μmにおけるSnO濃度(%)]から、[第1主面におけるSnO濃度(%)]を減じた値が0~0.9%であることが好ましい。当該値が0~0.9%であることにより、第1主面において屈折率分布を持たせて、ガラスの板厚中心から第1主面を経て外部へと放出される光の取り出し効率をより向上し得る。 In the glass plate according to the present embodiment, the value obtained by subtracting the [ SnO2 concentration (%) at the first main surface] from the [ SnO2 concentration (%) at a depth of 100 μm from the first main surface] is preferably 0 to 0.9%. By making the value 0 to 0.9%, it is possible to provide a refractive index distribution at the first main surface and further improve the extraction efficiency of light emitted from the center of the glass plate thickness through the first main surface to the outside.

 本実施形態に係るガラス板は、光の取り出し効率をより向上する観点から、[第1主面から深さ100μmにおけるSnO濃度(%)]から、[第1主面におけるSnO濃度(%)]を減じた値は、より好ましくは0.05%以上、さらに好ましくは0.1%以上、特に好ましくは0.2%以上である。また、[第1主面から深さ100μmにおけるSnO濃度(%)]から、[第1主面におけるSnO濃度(%)]を減じた値は、0.3%以上であってもよく、0.4%以上であってもよい。イオン交換の効率の観点から、[第1主面から深さ100μmにおけるSnO濃度(%)]から、[第1主面におけるSnO濃度(%)]を減じた値は、より好ましくは0.8%以下、さらに好ましくは0.7%以下、特に好ましくは0.6%以下、最も好ましくは0.5%以下である。また、[第1主面から深さ100μmにおけるSnO濃度(%)]から、[第1主面におけるSnO濃度(%)]を減じた値は、0.4%以下であってもよく、0.3%以下であってもよく、0.2%以下であってもよい。
 ここで、[第1主面におけるSnO濃度(%)]は第1主面から10μmまでの深さにおけるSnO換算の酸化スズ濃度の平均をいう。
In the glass plate according to the present embodiment, from the viewpoint of further improving the light extraction efficiency, the value obtained by subtracting the [SnO 2 concentration (%) at the first main surface] from the [SnO 2 concentration (%) at a depth of 100 μm from the first main surface] is more preferably 0.05% or more, even more preferably 0.1% or more, and particularly preferably 0.2% or more. In addition, the value obtained by subtracting the [SnO 2 concentration (%) at the first main surface] from the [SnO 2 concentration (%) at a depth of 100 μm from the first main surface] may be 0.3% or more, or may be 0.4% or more. From the viewpoint of ion exchange efficiency, the value obtained by subtracting the [SnO 2 concentration (%) at the first main surface] from the [SnO 2 concentration (%) at a depth of 100 μm from the first main surface] is more preferably 0.8% or less, even more preferably 0.7% or less, particularly preferably 0.6% or less, and most preferably 0.5% or less. In addition, the value obtained by subtracting the [ SnO2 concentration (%) at the first main surface] from the [ SnO2 concentration (%) at a depth of 100 μm from the first main surface] may be 0.4% or less, 0.3% or less, or 0.2% or less.
Here, [ SnO2 concentration (%) on the first principal surface] refers to the average tin oxide concentration in terms of SnO2 at a depth of 10 μm from the first principal surface.

 本実施形態に係るガラス板は、[第2主面におけるSnO濃度(%)]から、[第2主面から深さ100μmにおけるSnO濃度(%)]を減じた値が0.15%以上であることが好ましく、以下段階的に0.20%以上、0.25%以上、0.30%以上、0.35%以上、0.40%以上であることが好ましい。また、本実施形態に係るガラス板は、[第2主面におけるSnO濃度(%)]から、[第2主面から深さ100μmにおけるSnO濃度(%)]を減じた値が1.4%以下であることが好ましく、以下段階的に1.3%以下、1.2%以下、1.0%以下、0.9%以下、0.8%以下、0.7%以下であることが好ましい。当該値が前記数値範囲内であることにより、第2主面において屈折率分布を持たせて、第2主面から板厚中心にかけて入ってくる光の取り込み効率をより高めることで、結果として第1主面からの光の取り出し効率をより向上し得る。
 ここで、[第2主面におけるSnO濃度(%)]は第2主面から10μmまでの深さにおけるSnO換算の酸化スズ濃度の平均をいう。
In the glass plate according to the present embodiment, the value obtained by subtracting the SnO 2 concentration (%) at a depth of 100 μm from the second main surface from the SnO 2 concentration (%) is preferably 0.15% or more, and is preferably 0.20% or more, 0.25% or more, 0.30% or more, 0.35% or more, and 0.40% or more in a stepwise manner. In addition, in the glass plate according to the present embodiment, the value obtained by subtracting the SnO 2 concentration (%) at a depth of 100 μm from the second main surface from the SnO 2 concentration (%) is preferably 1.4% or less, and is preferably 1.3% or less, 1.2% or less, 1.0% or less, 0.9% or less, 0.8% or less, and 0.7% or less in a stepwise manner. By having this value within the above numerical range, a refractive index distribution is imparted to the second principal surface, thereby further increasing the efficiency of light capture entering from the second principal surface toward the center of the plate thickness, and as a result, the efficiency of light extraction from the first principal surface can be further improved.
Here, [ SnO2 concentration (%) on the second principal surface] refers to the average tin oxide concentration in terms of SnO2 at a depth of 10 μm from the second principal surface.

 本実施形態に係るガラス板は、光の取り出し効率をより向上する観点から、[第2主面におけるSnO濃度(%)]から、[第2主面から深さ100μmにおけるSnO濃度(%)]を減じた値は、0.15%以上であることが好ましく、以下段階的に0.20%以上、0.25%以上、0.30%以上、0.35%以上、0.40%以上であることが好ましい。また、当該値は0.5%以上であってもよく、0.6%以上であってもよく、0.7%以上であってもよく、0.8%以上であってもよい。熱を加えたときの変形量を小さくする観点から、[第2主面におけるSnO濃度(%)]から、[第2主面から深さ100μmにおけるSnO濃度(%)]を減じた値は、1.4%以下が好ましく、以下段階的に1.3%以下、1.2%以下、1.0%以下、0.9%以下、0.8%以下、0.7%以下であることが好ましい。 In the glass plate according to the present embodiment, from the viewpoint of further improving the light extraction efficiency, the value obtained by subtracting [SnO 2 concentration (%) at a depth of 100 μm from the second main surface] from [SnO 2 concentration (%) at the second main surface] is preferably 0.15% or more, and is preferably 0.20% or more, 0.25% or more, 0.30% or more, 0.35% or more, or 0.40% or more in the following stepwise manner. In addition, the value may be 0.5% or more, 0.6% or more, 0.7% or more, or 0.8% or more. From the viewpoint of reducing the amount of deformation when heat is applied, the value obtained by subtracting [SnO 2 concentration (%) at a depth of 100 μm from the second main surface] from [SnO 2 concentration (%) at the second main surface] is preferably 1.4% or less, and is preferably 1.3% or less, 1.2% or less, 1.0% or less, 0.9% or less, 0.8% or less, or 0.7% or less in the following stepwise manner.

 SnO濃度は、XRF(X-ray Fluorescence Spectrometer、蛍光X線分析)により評価できる。XRF法の分析条件の例は以下とする。
 定量は標準試料として値付けされたSnOを含むガラスを用いて検量線法にて測定できる。測定装置としては、株式会社リガク製ZSX100が挙げられる。
 出力:Rh 50kV-72mA
 フィルタ:OUT
 アッテネータ:1/1
 スリット:S4
 分光結晶:LiF(200)
 検出器:PC
 ピーク角度(2θ/deg.):126.790
 ピーク測定時間(秒):40B.G.1.
 (2θ/deg.):124.25B.G.2.
 (2θ/deg.):129.55B.G.1.
 測定時間(秒):10B.G.2.
 測定時間(秒):10PHA:100-300
 また、電子線プローブマイク口アナライザ(EPMA)とそれに装着した波長分散型X線検出器(WDX)を用いても、酸化スズの濃度を測定できる。具体的には、EPMA(JXA8600、日本電子株式会社製)によるWDX分析での測定結果から、2価および4価で存在するSnを4価に換算する。
The SnO2 concentration can be evaluated by XRF (X-ray Fluorescence Spectrometer). Examples of analysis conditions for the XRF method are as follows:
The amount can be determined by a calibration curve method using glass containing SnO2 as a standard sample. The measurement device can be ZSX100 manufactured by Rigaku Corporation.
Output: Rh 50kV-72mA
Filter: OUT
Attenuator: 1/1
Slit: S4
Spectroscopic crystal: LiF (200)
Detector: PC
Peak angle (2θ/deg.): 126.790
Peak measurement time (sec): 40B.G.1.
(2θ/deg.): 124.25B. G. 2.
(2θ/deg.): 129.55B. G. 1.
Measurement time (seconds): 10B. G. 2.
Measurement time (sec): 10 PHA: 100-300
The concentration of tin oxide can also be measured using an electron probe microanalyzer (EPMA) and a wavelength dispersive X-ray detector (WDX) attached thereto. Specifically, based on the measurement results of WDX analysis using an EPMA (JXA8600, manufactured by JEOL Ltd.), divalent and tetravalent Sn is converted to tetravalent Sn.

 ガラス板のSnO濃度分布は、後述するように、ガラス板の製造において、例えば、フロート法による成形時における、レアー速度、空気中の水素濃度、溶融金属浴の温度及び脱アルカリ処理並びにガラス組成(例えば、SnOの含有量)等により調整し得る。 As described later, the SnO2 concentration distribution in the glass sheet can be adjusted in the production of the glass sheet by, for example, the rising speed, the hydrogen concentration in the air, the temperature of the molten metal bath and the dealkalization treatment, and the glass composition (for example, the SnO2 content) during forming by the float method.

 一実施形態として、図1に、横軸を第1主面からの深さとし、縦軸をSnO濃度とした場合の関係の一態様を示す。図1において、tは板厚を表し、t/2は板厚中心を表す。図1に示すように、本実施形態のガラス板は、第1主面から深さx1までの領域において、第1主面からの深さが深くなるに従い板厚中心におけるSnO濃度まで徐々にSnO濃度が上昇する。また、深さx2から第2主面までの領域において、第1主面からの深さが深くなるに従い板厚中心の濃度から徐々にSnO濃度が上昇する。 As an embodiment, FIG. 1 shows one aspect of the relationship when the horizontal axis is the depth from the first main surface and the vertical axis is the SnO 2 concentration. In FIG. 1, t represents the sheet thickness, and t/2 represents the sheet thickness center. As shown in FIG. 1, in the glass sheet of this embodiment, in the region from the first main surface to a depth x1, the SnO 2 concentration gradually increases to the SnO 2 concentration at the sheet thickness center as the depth from the first main surface increases. Also, in the region from the depth x2 to the second main surface, the SnO 2 concentration gradually increases from the concentration at the sheet thickness center as the depth from the first main surface increases.

 一実施形態に係るガラス板は、第1主面からx1までの深さ(図1中、a1で表す)は、光の取り出し効率をより向上する観点から、板厚tに対し、1/10以上1/2未満であることが好ましく、より好ましくは1/9以上1/3以下であり、さらに好ましくは1/8以上1/4以下であり、特に好ましくは1/7以上1/5以下である。 In one embodiment of the glass plate, the depth from the first main surface to x1 (represented by a1 in FIG. 1) is preferably 1/10 or more and less than 1/2 of the plate thickness t, more preferably 1/9 or more and 1/3 or less, even more preferably 1/8 or more and 1/4 or less, and particularly preferably 1/7 or more and 1/5 or less, from the viewpoint of further improving the light extraction efficiency.

 一実施形態に係るガラス板は、x2から第2主面までの深さ(図1中、a2で表す)は、光の取り出し効率をより向上する観点から、板厚tに対し、1/10以上1/2未満であることが好ましく、より好ましくは1/9以上1/3以下であり、さらに好ましくは1/8以上1/4以下であり、特に好ましくは1/7以上1/5以下である。 In one embodiment of the glass plate, the depth from x2 to the second main surface (represented by a2 in FIG. 1) is preferably 1/10 or more and less than 1/2 of the plate thickness t, more preferably 1/9 or more and 1/3 or less, even more preferably 1/8 or more and 1/4 or less, and particularly preferably 1/7 or more and 1/5 or less, from the viewpoint of further improving the light extraction efficiency.

 一実施形態に係るガラス板は、横軸を第1主面からの深さ(mm)とし、縦軸をSnO濃度(wt%)とした場合、光の取り出し効率をより向上する観点から、第1主面からx1までの深さにおける傾き(wt%/mm)は、0.01以上5.0以下であることが好ましく、より好ましくは0.1以上3.0以下、さらに好ましくは0.2以上2.0以下、特に好ましくは0.3以上1.5以下である。 In the glass plate according to one embodiment, when the horizontal axis represents the depth (mm) from the first main surface and the vertical axis represents the SnO2 concentration (wt%), from the viewpoint of further improving the light extraction efficiency, the gradient (wt%/mm) at the depth from the first main surface to x1 is preferably 0.01 or more and 5.0 or less, more preferably 0.1 or more and 3.0 or less, even more preferably 0.2 or more and 2.0 or less, and particularly preferably 0.3 or more and 1.5 or less.

 一実施形態に係るガラス板は、横軸を第1主面からの深さ(mm)とし、縦軸をSnO濃度(wt%)とした場合、光の取り出し効率をより向上する観点から、x2から第2主面までの深さにおける傾き(wt%/mm)は、0.01以上5.0以下であることが好ましく、より好ましくは0.1以上3.0以下、さらに好ましくは0.2以上2.0以下、特に好ましくは0.3以上1.5以下である。 In the glass plate according to one embodiment, when the horizontal axis represents the depth (mm) from the first main surface and the vertical axis represents the SnO2 concentration (wt%), from the viewpoint of further improving the light extraction efficiency, the gradient (wt%/mm) at the depth from x2 to the second main surface is preferably 0.01 or more and 5.0 or less, more preferably 0.1 or more and 3.0 or less, even more preferably 0.2 or more and 2.0 or less, and particularly preferably 0.3 or more and 1.5 or less.

 図2の(a)及び(b)に、一実施形態に係るガラス板の第1主面からの深さとSnO濃度との関係の一態様をそれぞれ示す。
 一実施形態に係るガラス板は、図2の(a)に示すように、(ΔSnO≦(ΔSnOであれば、ガラスの反りが減るため、好ましい。
 一実施形態に係るガラス板は、図2の(b)に示すように、(ΔSnO≧(ΔSnOであれば、より大きな屈折率差を作ることができ取り出し効率が向上するため、好ましい。
2A and 2B each show an aspect of the relationship between the depth from the first main surface of the glass plate according to one embodiment and the SnO2 concentration.
As shown in FIG. 2( a ), in the glass plate according to one embodiment, if (ΔSnO 2 ) T ≦(ΔSnO 2 ) B , warping of the glass is reduced, which is preferable.
As shown in FIG. 2B, the glass plate according to one embodiment is preferably such that (ΔSnO 2 ) T ≧(ΔSnO 2 ) B , since a larger refractive index difference can be created and the extraction efficiency is improved.

(組成)
 以下、本実施形態に係るガラス板の組成について説明する。ガラス板の組成は母組成について記載する。母組成とは板厚中心における組成と同等である。本明細書において、ガラス組成は酸化物基準の質量百分率表示で示し、「%」との記載は、質量%を示すものとする。
(composition)
The composition of the glass sheet according to this embodiment will be described below. The composition of the glass sheet will be described as the matrix composition. The matrix composition is equivalent to the composition at the center of the sheet thickness. In this specification, the glass composition is expressed in mass percentage based on oxides, and the term "%" indicates mass%.

 本実施形態に係るガラス板は、SnOを0.10%~2.5%含有してもよい。Snは2価及び4価を取り得るが、本明細書ではSnOを基準として濃度を表す。SnOの含有量が0.10%以上であることにより、第1主面及び第2主面におけるガラス表層に屈折率を持たせて光の取り出し効率を向上し得る。SnOの含有量が多すぎると失透や着色が起こりやすくなるため、失透及び着色を抑制する観点から、SnOの含有量は2.5%以下である。 The glass plate according to this embodiment may contain 0.10% to 2.5% SnO 2. Sn can be divalent or tetravalent, but in this specification, the concentration is expressed based on SnO 2. By having a SnO 2 content of 0.10% or more, the glass surface layer on the first main surface and the second main surface can have a refractive index, thereby improving the light extraction efficiency. If the SnO 2 content is too high, devitrification and coloring are likely to occur, so from the viewpoint of suppressing devitrification and coloring, the SnO 2 content is 2.5% or less.

 光の取り出し効率をより向上する観点から、SnOの含有量は、0.15%以上が好ましく、以下段階的に、0.20%以上、0.25%以上、0.30%以上、0.35%以上、0.40%以上、0.45%以上がさらに好ましい。失透及び着色をより抑制する観点から、SnOの含有量は、好ましくは2.5%以下、さらに好ましくは2.2%以下、特に好ましくは2.0%以下、最も好ましくは1.8%以下である。 From the viewpoint of further improving the light extraction efficiency, the content of SnO2 is preferably 0.15% or more, and more preferably 0.20% or more, 0.25% or more, 0.30% or more, 0.35% or more, 0.40% or more, and 0.45% or more in the following stepwise manner. From the viewpoint of further suppressing devitrification and coloration, the content of SnO2 is preferably 2.5% or less, more preferably 2.2% or less, particularly preferably 2.0% or less, and most preferably 1.8% or less.

 本実施形態に係るガラス板は、SiOを55~75%、Alを7.0~30%、LiOを4.5~13.0%含有することが好ましい。 The glass plate according to this embodiment preferably contains 55 to 75% SiO 2 , 7.0 to 30% Al 2 O 3 , and 4.5 to 13.0% Li 2 O.

 本実施形態に係るガラス板のより好ましい組成としては、具体的には例えば、SiOを55~75%、Alを7.0~30%、LiOを0.01~13.0%、NaOを0~18%、ZrOを0.1~6.0%、Yを1.0~9.0%、Pを0~5.0%含有する組成が挙げられる。 More specifically, a more preferred composition of the glass plate according to this embodiment may include a composition containing 55 to 75% SiO2 , 7.0 to 30% Al2O3 , 0.01 to 13.0% Li2O , 0 to 18% Na2O , 0.1 to 6.0% ZrO2 , 1.0 to 9.0 % Y2O3 , and 0 to 5.0% P2O5 .

 SiOはガラスのネットワーク構造を形成する成分である。また、化学的耐久性を上げる成分であり、析出結晶の構成成分ともなり得る。SiOの含有量は55%以上が好ましく、以下段階的に56%以上、57%以上、58%以上、59%以上、60%以上、61%以上、62%以上が好ましい。また、SiOの含有量は64%以上であってもよく、66%以上であってもよく、67%以上であってもよい。一方、溶融性を良くするためにSiOの含有量は75%以下が好ましく、以下段階的に73%以下、72%以下、71%以下、70%以下、69%以下、68%以下、67%以下、66%以下、65%以下、64%以下、63%以下、62%以下、61%以下、60%以下が好ましい。 SiO 2 is a component that forms a network structure of glass. It is also a component that increases chemical durability and can be a constituent of precipitated crystals. The content of SiO 2 is preferably 55% or more, and is preferably 56% or more, 57% or more, 58% or more, 59% or more, 60% or more, 61% or more, and 62% or more in the following stepwise manner. The content of SiO 2 may be 64% or more, 66% or more, or 67% or more. On the other hand, in order to improve the melting property, the content of SiO 2 is preferably 75% or less, and is preferably 73% or less, 72% or less, 71% or less, 70% or less, 69% or less, 68% or less, 67% or less, 66% or less, 65% or less, 64% or less, 63% or less, 62% or less, 61% or less, and 60% or less in the following stepwise manner.

 Alは化学強化による表面圧縮応力を大きくする成分である。Alの含有量は7.0%以上が好ましく、以下段階的に8.0%以上、8.5%以上、9.0%以上、9.5%以上、10.0%以上、11.0%以上、12.0%以上、13.0%以上、14.0%以上、15.0%以上、16.0%以上、17.0%以上、18.0%以上、19.0%以上、20.0%以上、21.0%以上、22.0%以上、23.0%以上、24.0%以上、25.0%以上が好ましい。一方、ガラスの失透温度が高くなりすぎるのを抑制する観点から、Alの含有量は、30%以下が好ましく、以下段階的に29%以下、28%以下、27%以下、26%以下、25%以下、24%以下、23%以下、22%以下、21%以下、20%以下、19%以下、18%以下が好ましい。 Al 2 O 3 is a component that increases the surface compressive stress due to chemical strengthening. The content of Al 2 O 3 is preferably 7.0% or more, and is preferably 8.0% or more, 8.5% or more, 9.0% or more, 9.5% or more, 10.0% or more, 11.0% or more, 12.0% or more, 13.0% or more, 14.0% or more, 15.0% or more, 16.0% or more, 17.0% or more, 18.0% or more, 19.0% or more, 20.0% or more, 21.0% or more, 22.0% or more, 23.0% or more, 24.0% or more, and 25.0% or more. On the other hand, from the viewpoint of suppressing an excessively high devitrification temperature of the glass, the content of Al 2 O 3 is preferably 30% or less, and is stepwise increased to 29% or less, 28% or less, 27% or less, 26% or less, 25% or less, 24% or less, 23% or less, 22% or less, 21% or less, 20% or less, 19% or less, and 18% or less.

 LiOは、イオン交換により表面圧縮応力を形成させる成分であり、析出結晶の構成成分ともなり得る。LiOの含有量は0.01%以上が好ましく、以下段階的に0.05%以上、0.1%以上、0.5%以上、1.0%以上、1.5%以上、2.0%以上、2.5%以上、3.0%以上、3.5%以上、4.0%以上が好ましい。また、LiOの含有量は4.5%以上であってもよく、5.0%以上であってもよく、5.5%以上であってもよく、6.0%以上であってもよく、6.5%以上であってもよい。一方、ガラスを安定にするためにLiOの含有量は13.0%以下が好ましく、以下段階的に12.0%以下、11.0%以下、10.5%以下、10.0%以下、9.0%以下、8.0%以下、7.0%以下、6.5%以下、6.0%以下、5.5%以下、5.0%以下が好ましい。 Li 2 O is a component that forms surface compressive stress by ion exchange, and can also be a component of precipitated crystals. The content of Li 2 O is preferably 0.01% or more, and is preferably 0.05% or more, 0.1% or more, 0.5% or more, 1.0% or more, 1.5% or more, 2.0% or more, 2.5% or more, 3.0% or more, 3.5% or more, and 4.0% or more in the following stepwise manner. The content of Li 2 O may be 4.5% or more, 5.0% or more, 5.5% or more, 6.0% or more, or 6.5% or more. On the other hand, in order to stabilize the glass, the content of Li 2 O is preferably 13.0% or less, and thereafter, stepwise, preferably, 12.0% or less, 11.0% or less, 10.5% or less, 10.0% or less, 9.0% or less, 8.0% or less, 7.0% or less, 6.5% or less, 6.0% or less, 5.5% or less, and 5.0% or less.

 NaOは、ガラスの溶融性を向上させる成分である。NaOの含有量を含有する場合の含有量は、0.2%以上が好ましく、以下段階的に0.3%以上、0.4%以上、0.5%以上、0.6%以上、0.7%以上、0.8%以上、0.9%以上、1.0%以上が好ましい。NaOは多すぎると結晶が析出しにくくなったり、または化学強化特性が低下したりするため、18%以下が好ましく、以下段階的に10%以下、5%以下、4%以下、3%以下、2%以下、1.5%以下、1.3%以下、1.2%以下、1.1%以下、1.0%以下が好ましい。 Na 2 O is a component that improves the melting property of glass. When Na 2 O is contained, the content is preferably 0.2% or more, and is preferably 0.3% or more, 0.4% or more, 0.5% or more, 0.6% or more, 0.7% or more, 0.8% or more, 0.9% or more, and 1.0% or more in the following stepwise manner. If Na 2 O is too much, crystals are difficult to precipitate or the chemical strengthening properties are reduced, so it is preferably 18% or less, and is preferably 10% or less, 5% or less, 4% or less, 3% or less, 2% or less, 1.5% or less, 1.3% or less, 1.2% or less, 1.1% or less, and 1.0% or less in the following stepwise manner.

 KOは、NaOと同じくガラスの溶融温度を下げる成分であり、含有してもよい。KOを含有する場合の含有量は、好ましくは0.1%以上であり、より好ましくは0.2%以上、さらに好ましくは0.3%以上、特に好ましくは0.4%以上、最も好ましくは0.5%以上である。KOは多すぎると化学強化特性が低下する、または化学的耐久性が低下するため、8.0%以下が好ましく、以下段階的に、5.0%以下、3.0%以下、2.0%以下、1.5%以下、1.3%以下、1.2%以下、1.1%以下、1.0%以下が好ましい。 K 2 O is a component that lowers the melting temperature of glass like Na 2 O, and may be contained. When K 2 O is contained, the content is preferably 0.1% or more, more preferably 0.2% or more, even more preferably 0.3% or more, particularly preferably 0.4% or more, and most preferably 0.5% or more. If K 2 O is too much, the chemical strengthening properties are reduced or the chemical durability is reduced, so 8.0% or less is preferable, and the following stepwise are preferable: 5.0% or less, 3.0% or less, 2.0% or less, 1.5% or less, 1.3% or less, 1.2% or less, 1.1% or less, and 1.0% or less.

 本実施形態に係るガラス板は、NaOとKOとの合計含有量NaO+KOは0%以上3.0%以下であることが好ましい。ガラスの溶融性を向上させる観点から、NaO+KOはより好ましくは0.2%以上であり、さらに好ましくは0.4%以上、よりさらに好ましくは0.6%以上、特に好ましくは0.7%以上、最も好ましくは0.8%以上である。また、NaO+KOが高すぎると化学強化特性が低下する、または化学的耐久性が低下するため、2.7%以下がより好ましく、さらに好ましくは2.5%以下、よりさらに好ましくは2.3%以下、特に好ましくは2.2%以下、最も好ましくは2.1%以下である。 In the glass plate according to this embodiment, the total content Na 2 O and K 2 O (Na 2 O + K 2 O) is preferably 0% or more and 3.0% or less. From the viewpoint of improving the melting property of the glass, Na 2 O + K 2 O is more preferably 0.2% or more, even more preferably 0.4% or more, even more preferably 0.6% or more, particularly preferably 0.7% or more, and most preferably 0.8% or more. In addition, if Na 2 O + K 2 O is too high, the chemical strengthening properties are reduced or the chemical durability is reduced, so it is more preferably 2.7% or less, even more preferably 2.5% or less, even more preferably 2.3% or less, particularly preferably 2.2% or less, and most preferably 2.1% or less.

 本実施形態に係るガラス板は、LiO、NaO及びKOの合計含有量LiO+NaO+KOをROとして、ROは4.5%以上16%以下であることが好ましい。ガラスの溶融性を向上させる観点から、ROはより好ましくは5.0%以上、さらに好ましくは6.0%以上、特に好ましくは6.5%以上、最も好ましくは7.0%以上である。また、化学強化特性及び化学的耐久性を高める観点から、ROは15%以下が好ましく、以下段階的に14%以下、13%以下、12%以下、11%以下、10%以下、9%以下、8%以下、7%以下が好ましい。 In the glass plate according to this embodiment, the total content of Li 2 O, Na 2 O and K 2 O (Li 2 O + Na 2 O + K 2 O) is R 2 O, and R 2 O is preferably 4.5% or more and 16% or less. From the viewpoint of improving the meltability of glass, R 2 O is more preferably 5.0% or more, further preferably 6.0% or more, particularly preferably 6.5% or more, and most preferably 7.0% or more. In addition, from the viewpoint of improving chemical strengthening characteristics and chemical durability, R 2 O is preferably 15% or less, and is preferably 14% or less, 13% or less, 12% or less, 11% or less, 10% or less, 9% or less, 8% or less, and 7% or less in a stepwise manner.

 本実施形態に係るガラス板は、化学強化特性及び化学的耐久性を高める観点から、KO/ROは0.20以下であることが好ましく、より好ましくは0.15以下、さらに好ましくは0.13以下、特に好ましくは0.12以下、最も好ましくは0.11以下である。KO/ROの下限は特に制限されないが、例えば0.003以上であってもよく、0.01以上であってもよく、0.03以上であってもよく、0.05以上であってもよく、0.10以上であってもよい。 In the glass plate according to this embodiment, from the viewpoint of enhancing chemical strengthening properties and chemical durability, K 2 O/R 2 O is preferably 0.20 or less, more preferably 0.15 or less, even more preferably 0.13 or less, particularly preferably 0.12 or less, and most preferably 0.11 or less. The lower limit of K 2 O/R 2 O is not particularly limited, but may be, for example, 0.003 or more, 0.01 or more, 0.03 or more, 0.05 or more, or 0.10 or more.

 ZrOは、結晶化処理に際して、結晶核を構成し得る成分であり、含有してもよい。ZrOの含有量は0.1%以上であることが好ましく、以下段階的に0.5%以上、1.0%以上、1.5%以上、2.0%以上、2.5%以上であることが好ましい。また、ZrOの含有量は3.0%以上であってもよい。一方、溶融時の失透を抑制するために、ZrOの含有量は6.0%以下であることが好ましく、以下段階的に5.5%以下、5.0%以下、4.5%以下、4.2%以下、4.0%以下、3.5%以下、3.0%以下が好ましい。 ZrO2 is a component that can form a crystal nucleus during crystallization treatment, and may be contained. The content of ZrO2 is preferably 0.1% or more, and is preferably 0.5% or more, 1.0% or more, 1.5% or more, 2.0% or more, and 2.5% or more in a stepwise manner. The content of ZrO2 may be 3.0% or more. On the other hand, in order to suppress devitrification during melting, the content of ZrO2 is preferably 6.0% or less, and is preferably 5.5% or less, 5.0% or less, 4.5% or less, 4.2% or less, 4.0% or less, 3.5% or less, and 3.0% or less in a stepwise manner.

 また、LiO、NaO及びKOの合計含有量LiO+NaO+KOをROとして、ZrO/ROは、化学的耐久性を高くする観点から、0.1以上が好ましく、0.2以上がより好ましい。結晶化後の透明性を高くする観点から、ZrO/ROは、0.8以下が好ましく、0.6以下がより好ましい。 In addition, when the total content of Li2O , Na2O and K2O ( Li2O + Na2O + K2O ) is R2O , ZrO2 / R2O is preferably 0.1 or more, more preferably 0.2 or more, from the viewpoint of improving chemical durability. From the viewpoint of improving transparency after crystallization, ZrO2 / R2O is preferably 0.8 or less, more preferably 0.6 or less.

 Yは化学強化ガラスが破壊した時に破片が飛散しにくくする成分であり、含有させてもよい。Yの含有量は1.0%以上であることが好ましく、より好ましくは1.3%以上、さらに好ましくは1.6%以上、特に好ましくは1.9%以上、最も好ましくは2.1%以上である。一方、溶融時の失透を抑制するために、Yの含有量は9.0%以下であることが好ましく、より好ましくは8.0%以下、さらに好ましくは7.0%以下、特に好ましくは6.0%以下、最も好ましくは5.0%以下である。 Y 2 O 3 is a component that makes it difficult for fragments to scatter when the chemically strengthened glass is broken, and may be contained. The content of Y 2 O 3 is preferably 1.0% or more, more preferably 1.3% or more, even more preferably 1.6% or more, particularly preferably 1.9% or more, and most preferably 2.1% or more. On the other hand, in order to suppress devitrification during melting, the content of Y 2 O 3 is preferably 9.0% or less, more preferably 8.0% or less, even more preferably 7.0% or less, particularly preferably 6.0% or less, and most preferably 5.0% or less.

 Pは、必須ではないが、ガラスの分相を促して結晶化を促進する効果があり、含有してもよい。Pを含有する場合の含有量は0.2%以上であることが好ましく、以下段階的に0.4%以上、0.6%以上、0.8%以上、1.0%以上、1.5%以上、2.0%以上、2.5%以上が好ましい。一方、Pの含有量が多すぎると、溶融時に分相しやすくなり、また耐酸性が著しく低下する。Pの含有量は5.0%以下であることが好ましく、より好ましくは4.5%以下、さらに好ましくは4.0%以下、特に好ましくは3.7%以下、最も好ましくは3.5%以下である。 P 2 O 5 is not essential, but may be contained since it has the effect of promoting the phase separation of glass and promoting crystallization. When P 2 O 5 is contained, the content is preferably 0.2% or more, and is preferably 0.4% or more, 0.6% or more, 0.8% or more, 1.0% or more, 1.5% or more, 2.0% or more, and 2.5% or more in a stepwise manner. On the other hand, if the content of P 2 O 5 is too high, phase separation occurs easily during melting, and acid resistance is significantly reduced. The content of P 2 O 5 is preferably 5.0% or less, more preferably 4.5% or less, even more preferably 4.0% or less, particularly preferably 3.7% or less, and most preferably 3.5% or less.

 TiOは結晶化処理に際して、結晶核を構成し得る成分であり、含有してもよい。TiOは必須ではないが、含有する場合は0.01以上が好ましく、以下段階的に0.05%以上、0.08%以上、0.10%以上、0.15%以上、0.20%以上が好ましい。TiOの含有量は、1.0%以上であってもよく、1.5%以上であってもよい。一方、溶融時の失透を抑制するために、またガラスへの着色を与えることから、TiOの含有量は、3.0%以下が好ましく、以下段階的に0.8%以下、0.6%以下、0.5%以下、0.4%以下、0.3%以下、0.2%以下、0.15%以下が好ましい。 TiO 2 is a component that can form a crystal nucleus during crystallization treatment, and may be contained. TiO 2 is not essential, but if it is contained, it is preferably 0.01% or more, and is preferably 0.05% or more, 0.08% or more, 0.10% or more, 0.15% or more, and 0.20% or more in the following stepwise manner. The content of TiO 2 may be 1.0% or more, or may be 1.5% or more. On the other hand, in order to suppress devitrification during melting and to give color to the glass, the content of TiO 2 is preferably 3.0% or less, and is preferably 0.8% or less, 0.6% or less, 0.5% or less, 0.4% or less, 0.3% or less, 0.2% or less, and 0.15% or less in the following stepwise manner.

 Bは、必須ではないが、化学強化用ガラスまたは化学強化ガラスのチッピング耐性を向上させ、また溶融性を向上させる成分であり、含有してもよい。Bを含有する場合の含有量は、好ましくは0%以上3.0%以下である。Bの含有量は、溶融性をより向上させる観点から、より好ましくは0.2%以上、さらに好ましくは0.4%以上、特に好ましくは0.6%以上、最も好ましくは0.8%以上である。一方、溶融時の脈理が発生するのを抑制するとともに、分相し易くなり化学強化用ガラスの品質が低下するのを防ぐため、Bの含有量は、より好ましくは2.0%以下、さらに好ましくは1.5%以下、特に好ましくは1.0%以下、最も好ましくは0.8%以下である。 Although B 2 O 3 is not essential, it is a component that improves the chipping resistance of the chemically strengthened glass or chemically strengthened glass and improves the meltability, and may be contained. When B 2 O 3 is contained, the content is preferably 0% or more and 3.0% or less. From the viewpoint of further improving the meltability, the content of B 2 O 3 is more preferably 0.2% or more, even more preferably 0.4% or more, particularly preferably 0.6% or more, and most preferably 0.8% or more. On the other hand, in order to suppress the occurrence of striae during melting and to prevent the quality of the chemically strengthened glass from being easily separated, the content of B 2 O 3 is more preferably 2.0% or less, even more preferably 1.5% or less, particularly preferably 1.0% or less, and most preferably 0.8% or less.

 BaO、SrO、MgO、CaO及びZnOはガラスの溶融性を向上する成分であり含有してもよい。これらの成分を含有させる場合、BaO、SrO、MgO、CaO及びZnOの合計含有量BaO+SrO+MgO+CaO+ZnOは、好ましくは0%超3.0%以下である。ガラスの溶融性をより向上させる観点から、BaO+SrO+MgO+CaO+ZnOは、より好ましくは0.1%以上、さらに好ましくは0.2%以上、特に好ましくは0.3%以上、最も好ましくは0.5%以上である。一方、イオン交換速度の低下を抑制する観点から、BaO+SrO+MgO+CaO+ZnOは、2.5%以下が好ましく、以下段階的に2.0%以下、1.8%以下、1.5%以下、1.0%以下、0.8%以下、0.6%以下、0.4%以下、0.2%以下が好ましい。 BaO, SrO, MgO, CaO and ZnO are components that improve the meltability of glass and may be contained. When these components are contained, the total content of BaO, SrO, MgO, CaO and ZnO, BaO+SrO+MgO+CaO+ZnO, is preferably more than 0% and 3.0% or less. From the viewpoint of further improving the meltability of glass, BaO+SrO+MgO+CaO+ZnO is more preferably 0.1% or more, even more preferably 0.2% or more, particularly preferably 0.3% or more, and most preferably 0.5% or more. On the other hand, from the viewpoint of suppressing a decrease in the ion exchange rate, BaO+SrO+MgO+CaO+ZnO is preferably 2.5% or less, and thereafter, in steps, 2.0% or less, 1.8% or less, 1.5% or less, 1.0% or less, 0.8% or less, 0.6% or less, 0.4% or less, and 0.2% or less are preferable.

 前記成分のうちBaO、SrO及びZnOは、残留ガラスの屈折率を向上させて析出結晶相に近づけることにより結晶化ガラスの光透過率を向上して、ヘーズ値を下げるために含有してもよい。その場合、合計含有量BaO+SrO+ZnOは、0%以上1.0%以下が好ましい。BaO+SrO+ZnOは、より好ましくは0.05%以上、さらに好ましくは0.10%以上、特に好ましくは0.20%以上、最も好ましくは0.30%以上である。一方で、これらの成分は、イオン交換速度を低下させる場合がある。化学強化特性を良くする観点から、BaO+SrO+ZnOは、より好ましくは0.8%以下、さらに好ましくは0.6%以下、特に好ましくは0.5%以下である。また、BaO+SrO+ZnOは、0.4%以下であってもよい。 Among the above components, BaO, SrO and ZnO may be contained to improve the refractive index of the residual glass and bring it closer to the precipitated crystal phase, thereby improving the light transmittance of the crystallized glass and reducing the haze value. In this case, the total content of BaO+SrO+ZnO is preferably 0% or more and 1.0% or less. BaO+SrO+ZnO is more preferably 0.05% or more, even more preferably 0.10% or more, particularly preferably 0.20% or more, and most preferably 0.30% or more. On the other hand, these components may reduce the ion exchange rate. From the viewpoint of improving the chemical strengthening characteristics, BaO+SrO+ZnO is more preferably 0.8% or less, even more preferably 0.6% or less, and particularly preferably 0.5% or less. BaO+SrO+ZnO may also be 0.4% or less.

 CeOはガラスを酸化する効果があり、着色を抑える場合があり、含有させてもよい。CeOを含有する場合の含有量は、好ましくは0%以上1.0%以下である。CeOの含有量は、より好ましくは0.1%以上、さらに好ましくは0.2%以上、特に好ましくは0.3%以上、最も好ましくは0.4%以上である。CeOを酸化剤として用いる場合には、CeOの含有量は、透明性を高くするために、より好ましくは0.8%以下、さらに好ましくは0.7%以下、特に好ましくは0.6%以下、最も好ましくは0.5%以下である。 CeO2 has the effect of oxidizing glass and may suppress coloring, so it may be contained. When CeO2 is contained, the content is preferably 0% or more and 1.0% or less. The content of CeO2 is more preferably 0.1% or more, even more preferably 0.2% or more, particularly preferably 0.3% or more, and most preferably 0.4% or more. When CeO2 is used as an oxidizing agent, the content of CeO2 is more preferably 0.8% or less, even more preferably 0.7% or less, particularly preferably 0.6% or less, and most preferably 0.5% or less in order to increase transparency.

 ガラスを着色して使用する際は、所望の化学強化特性の達成を阻害しない範囲において着色成分を添加してもよい。着色成分としては、例えば、CoO、Co、MnO、MnO、FeO、Fe、NiO、CuO、CuO、Cr、V、Bi、SeO、Se、Er、Nd、Eu、Pr11が好適なものとして挙げられる。着色成分の含有量は、合計で1.0%以下の範囲が好ましい。より好ましくは0.8%以下、さらに好ましくは0.6%以下、最も好ましくは0.4%以下である。ガラスの可視光透過率をより高くしたい場合は、これらの成分は実質的に含有しないことが好ましい。 When the glass is colored and used, coloring components may be added within a range that does not inhibit the achievement of the desired chemical strengthening characteristics. Suitable examples of coloring components include CoO, Co3O4 , MnO, MnO2 , FeO, Fe2O3 , NiO, CuO , Cu2O , Cr2O3 , V2O5 , Bi2O3 , SeO2 , Se , Er2O3 , Nd2O3 , Eu2O3 , and Pr6O11 . The total content of the coloring components is preferably 1.0 % or less. More preferably, it is 0.8% or less, even more preferably 0.6 % or less, and most preferably 0.4% or less. If it is desired to increase the visible light transmittance of the glass, it is preferable that these components are not substantially contained.

 ガラスの溶融の際の清澄剤として、SO、塩化物、フッ化物などを適宜含有してもよい。Asは含有しないことが好ましい。Asを含有する場合は、0.3%以下が好ましく、0.1%以下がより好ましく、含有しないことが最も好ましい。 As a fining agent for melting the glass, SO 3 , chlorides, fluorides, etc. may be appropriately contained. It is preferable that As 2 O 3 is not contained. When As 2 O 3 is contained, it is preferably 0.3% or less, more preferably 0.1% or less, and most preferably not contained.

 ガラスの組成としては特に限定されないが、具体的には例えば、以下のガラス組成が挙げられる。
(1)酸化物基準の質量%表示で、SiOを60~66%、Alを18.0~23%、LiOを4.5~9.0%、SnOを1.50~2.5%を含むガラス
(2)酸化物基準の質量%表示で、SiOを60~66%、Alを7.0~18%、LiOを7~11.0%、SnOを1.00~2.5%を含むガラス
(3)酸化物基準の質量%表示で、SiOを65~75%、Alを8.0~13%、LiOを7~11.0%、SnOを1.50~2.5%を含むガラス
(4)酸化物基準の質量%表示で、SiOを65~75%、Alを18.0~23%、LiOを4.5~9.0%、SnOを0.10~2.5%を含むガラス
(5)酸化物基準の質量%表示で、SiOを60~66%、Alを12.0~18%、LiOを4.5~9.0%、SnOを0.50~1.5%を含むガラス
(6)酸化物基準の質量%表示で、SiOを60~66%、Alを23~27%、LiOを3.5~5.0%、NaOを1.0~2.0%、KOを0.1~0.5%、TiOを0.01~0.2%、ZrOを2.5~3.5%、SnOを0.4~1.0%、含むガラス
(7)酸化物基準の質量%表示で、SiOを60~66%、Alを18~24%、LiOを4.0~6.0%、NaOを0.5~1.5%、KOを0.1~1.5%、TiOを0.01~0.2%、ZrOを2.0~3.5%、SnOを1.5~3.0%、含むガラス
(8)酸化物基準の質量%表示で、SiOを56~60%、Alを25~29%、LiOを4.5~7.0%、NaOを0.3~1.0%、KOを0.1~0.5%、TiOを0.01~0.2%、ZrOを2.5~3.5%、SnOを1.5~3.0%、含むガラス
(9)酸化物基準の質量%表示で、SiOを60~64%、Alを20~24%、LiOを3.5~5.5%、NaOを0.8~1.5%、KOを0.5~1.0%、TiOを0.01~0.2%、ZrOを2.5~3.5%、SnOを1.5~3.0%、含むガラス
(10)酸化物基準の質量%表示で、SiOを58~62%、Alを21~25%、LiOを3.5~5.5%、NaOを0.5~1.5%、KOを0.3~1.5%、TiOを0.01~0.2%、ZrOを2.0~3.0%含むガラス
(11)酸化物基準の質量%表示で、SiOを58~62%、Alを21~25%、LiOを3.5~5.5%、NaOを0.5~1.5%、KOを0.3~1.5%、TiOを0.01~0.2%、ZrOを2.0~3.5%、SnOを1.5~3.0%、含むガラス
The glass composition is not particularly limited, but specific examples include the following glass compositions.
(1) Glass containing, in mass % on an oxide basis, 60-66% SiO2 , 18.0-23 % Al2O3 , 4.5-9.0% Li2O , and 1.50-2.5% SnO2 . (2) Glass containing, in mass % on an oxide basis, 60-66% SiO2 , 7.0-18% Al2O3 , 7-11.0% Li2O , and 1.00-2.5 % SnO2 . (3) Glass containing, in mass % on an oxide basis, 65-75% SiO2 , 8.0-13% Al2O3 , 7-11.0% Li2O, and 1.50-2.5% SnO2 . (4) Glass containing, in mass % on an oxide basis, 65-75% SiO2 , 8.0-13% Al2O3 , 7-11.0% Li2O , and 1.50-2.5% SnO2 . (5) Glass containing, in mass % on an oxide basis, 60-66% SiO2 , 12.0-18% Al2O3 , 4.5-9.0% Li2O , and 0.50-1.5% SnO2 . (6) Glass containing, in mass % on an oxide basis, 60-66% SiO2 , 23-27 % Al2O3 , 3.5-5.0 % Li2O , 1.0-2.0% Na2O , 0.1-0.5% K2O , 0.01-0.2 % TiO2 , 2.5-3.5 % ZrO2 , and SnO (7) Glass containing, in mass % on an oxide basis, 60-66% SiO2 , 18-24% Al2O3 , 4.0-6.0% Li2O , 0.5-1.5% Na2O , 0.1-1.5% K2O , 0.01-0.2% TiO2 , 2.0-3.5% ZrO2 , and 1.5-3.0% SnO2 . (8) Glass containing, in mass % on an oxide basis, 56-60% SiO2 , 25-29 % Al2O3 , 4.5-7.0% Li2O , 0.3-1.0% Na2O , 0.1-0.5% K2O , and 1.5-3.0% TiO2 . Glass containing 0.01-0.2% SiO2 , 2.5-3.5% ZrO2 , and 1.5-3.0% SnO2 (9) Glass containing, in mass % on an oxide basis, 60-64% SiO2 , 20-24% Al2O3 , 3.5-5.5% Li2O , 0.8-1.5% Na2O , 0.5-1.0% K2O , 0.01-0.2% TiO2 , 2.5-3.5% ZrO2 , and 1.5-3.0% SnO2 (10) Glass containing, in mass % on an oxide basis, 58-62% SiO2 , 21-25 % Al2O3 , 3.5-5.5% Li2O , and 1.5-3.0% Na2O Glass containing 0.5-1.5% O, 0.3-1.5% K 2 O, 0.01-0.2% TiO 2 , and 2.0-3.0% ZrO 2 (11) Glass containing, in mass % on an oxide basis, 58-62% SiO 2 , 21-25% Al 2 O 3 , 3.5-5.5% Li 2 O, 0.5-1.5% Na 2 O, 0.3-1.5% K 2 O, 0.01-0.2% TiO 2, 2.0-3.5% ZrO 2 , and 1.5-3.0% SnO 2 .

(可視光透過率)
 本実施形態に係るガラス板は、可視光透過率が、厚さ0.7mmに換算した場合に、好ましくは91.0%以上であることにより、ディスプレイ装置の保護部材に用いた場合に、ディスプレイの画面が見えやすい。可視光透過率は、91.2%以上がより好ましく、91.4%以上がさらに好ましい。可視光透過率は、高い程好ましいが、通常は92%以下である。なお、通常の非晶質ガラスの可視光透過率は90%程度である。可視光透過率は、JIS R3106(2019)に準拠した方法により測定できる。
(visible light transmittance)
The glass plate according to this embodiment has a visible light transmittance of preferably 91.0% or more when converted to a thickness of 0.7 mm, so that when used as a protective member for a display device, the display screen is easily visible. The visible light transmittance is more preferably 91.2% or more, and even more preferably 91.4% or more. The higher the visible light transmittance, the more preferable it is, but it is usually 92% or less. The visible light transmittance of ordinary amorphous glass is about 90%. The visible light transmittance can be measured by a method in accordance with JIS R3106 (2019).

(ヘーズ値)
 本実施形態に係るガラス板は、ヘーズ値が、厚さ0.7mmで測定した場合に、0.50%以下であることが好ましく、0.30%以下がより好ましく、0.20%以下がさらに好ましく、0.10%以下が特に好ましく、0.05%以下が最も好ましい。ヘーズ値はより小さい程好ましい。ヘーズ値はJIS K7136(2000年)にしたがい測定された値である。
(Haze value)
The glass plate according to this embodiment has a haze value of preferably 0.50% or less, more preferably 0.30% or less, even more preferably 0.20% or less, particularly preferably 0.10% or less, and most preferably 0.05% or less, when measured at a thickness of 0.7 mm. The smaller the haze value, the more preferable it is. The haze value is a value measured according to JIS K7136 (2000).

 なお、板厚t[mm]の結晶化ガラスの、全光線可視光透過率がT[%]、片面の表面反射率がR[%]であった場合、ランベルト・ベールの法則(Lambert-Beer
 law)を援用することにより、定数αを用いて、T/100=(1-R/100)×exp(-αt)の関係がある。
 ここからαをR、T、tで表し、t=0.7mmとすれば、Rは板厚によって変化しないので、0.7mm換算の全光線可視光透過率T0.7/100はT0.7/100=T/1000.7/t/(1-R/100)^(1.4/t-2)と計算できる。ただしX^YはXを表す。
In addition, when the total light visible light transmittance of a crystallized glass having a plate thickness t [mm] is T [%] and the surface reflectance of one side is R [%], the Lambert-Beer law
By using the law of t=1−R/100, the relationship T/100=(1−R/100) 2 ×exp(−αt) is established using a constant α.
If α is expressed as R, T, and t, and t = 0.7 mm, then R does not change with the plate thickness, so the total light visible light transmittance T0.7 /100 converted to 0.7 mm can be calculated as T0.7 /100 = T/1000.7 /t/(1-R /100)^(1.4/t-2), where X^Y represents XY .

(厚さ)
 本実施形態に係るガラス板の厚さは、0.30~1.00mmである。厚さは、好ましくは0.90mm以下であり、より好ましくは0.80mm以下であり、さらに好ましくは0.70mm以下であり、特に好ましくは0.65mm以下であり、最も好ましくは0.60mm以下である。また、より強度を高める観点から、厚さは、好ましくは0.35mm以上、より好ましくは0.40mm以上、さらに好ましくは0.45mm以上、特に好ましくは0.50mm以上である。
(Thickness)
The thickness of the glass plate according to this embodiment is 0.30 to 1.00 mm. The thickness is preferably 0.90 mm or less, more preferably 0.80 mm or less, even more preferably 0.70 mm or less, particularly preferably 0.65 mm or less, and most preferably 0.60 mm or less. From the viewpoint of further increasing the strength, the thickness is preferably 0.35 mm or more, more preferably 0.40 mm or more, even more preferably 0.45 mm or more, and particularly preferably 0.50 mm or more.

 本実施形態に係るガラス板の形状は、適用される製品や用途等に応じて、板状以外の形状でもよい。またガラス板は、外周の厚みが異なる縁取り形状などを有していてもよい。また、ガラス板の形態はこれに限定されず、例えば2つの主面は互いに平行でなくともよく、また、2つの主面の一方又は両方の全部又は一部が曲面であってもよい。より具体的には、ガラス板は、例えば、反りの無い平板状のガラス板であってもよく、また、湾曲した表面を有する曲面ガラス板であってもよい。 The shape of the glass plate according to this embodiment may be a shape other than a plate shape, depending on the product to which it is applied, its use, etc. The glass plate may also have a border shape with a different thickness around the periphery. The shape of the glass plate is not limited to this, and for example, the two main surfaces do not have to be parallel to each other, and one or both of the two main surfaces may be entirely or partially curved. More specifically, the glass plate may be, for example, a flat glass plate without warping, or a curved glass plate having a curved surface.

<<結晶化ガラス>>
 本実施形態に係るガラス板は、結晶化ガラスであることが好ましい。結晶化ガラスは、非晶質ガラスを加熱処理して結晶化することで得られる。結晶化ガラスのガラス組成は、結晶化前の非晶質ガラスの組成と同じである。すなわち、本実施形態に係る結晶化ガラスの母組成は、上述の本実施形態に係るガラス板の組成と同様であり、好ましい組成範囲も同様である。
<<Ceramics>>
The glass plate according to the present embodiment is preferably crystallized glass. The crystallized glass is obtained by heating and crystallizing amorphous glass. The glass composition of the crystallized glass is the same as the composition of the amorphous glass before crystallization. That is, the matrix composition of the crystallized glass according to the present embodiment is the same as the composition of the glass plate according to the present embodiment described above, and the preferred composition range is also the same.

 本明細書において「結晶化ガラス」とは、X線回折法(XRD:X-ray Diffraction)によって結晶を示す回折ピークが認められるガラスをいう。X線回折測定は、例えば、CuKα線を用いて2θが10°~80°の範囲を測定する方法で行える。結晶としては、例えば、リチウムを含む結晶ではβ-スポジュメン系の結晶、リチウムダイシリケート系の結晶、β-クォーツ系の結晶、メタケイ酸リチウム結晶、リン酸リチウム結晶が挙げられる。これらの結晶は固溶体を作り、さまざまな元素を固溶してもよい。特に固溶する元素はアルカリ金属(Na、K)、アルカリ土類金属(Mg、Ca、Sr、Ba)であるが、この限りである必要はない。また、リチウムを含まない結晶では、ZrOおよびその固溶体の結晶が挙げられる。固溶する元素はY、Snなどが挙げられるが、この限りである必要はない。
 結晶化ガラスは、結晶としてβ-スポジュメンを含有することが好ましい。β-スポジュメンは結晶構造がβ-石英固溶体に比べて緻密なので、化学強化のためのイオン交換処理によって析出結晶中のイオンがより大きいイオンに置換されたときに高い圧縮応力が発生し、化学強化の効果が高くなると考えられる。また、本結晶化ガラスはバージライト(Virgilite)を含んでいてもよい。バージライトはキータイト(Keatite)とも称され、β-スポジュメンと同様にLiAlSiと表される結晶であるが結晶構造が異なる。
In this specification, the term "crystallized glass" refers to glass in which a diffraction peak indicating crystallization is observed by X-ray diffraction (XRD). X-ray diffraction measurement can be performed, for example, by using CuKα radiation to measure the range of 2θ from 10° to 80°. Examples of the crystals include, for example, β-spodumene crystals, lithium disilicate crystals, β-quartz crystals, lithium metasilicate crystals, and lithium phosphate crystals, which are crystals containing lithium. These crystals may form solid solutions and dissolve various elements. In particular, the elements that dissolve are alkali metals (Na, K) and alkaline earth metals (Mg, Ca, Sr, Ba), but this is not necessarily the case. In addition, examples of crystals that do not contain lithium include ZrO 2 and solid solutions thereof. Examples of the elements that dissolve are Y, Sn, etc., but this is not necessarily the case.
The crystallized glass preferably contains β-spodumene as crystals. Since β-spodumene has a denser crystal structure than β-quartz solid solution, it is considered that when ions in the precipitated crystals are replaced with larger ions by ion exchange treatment for chemical strengthening, high compressive stress is generated, and the effect of chemical strengthening is enhanced. In addition, the crystallized glass may contain virgilite. Virgilite is also called keatite, and is a crystal expressed as LiAlSi 2 O 6 like β-spodumene, but has a different crystal structure.

 結晶化ガラスの結晶化率は、機械的強度を高くするために60%以上が好ましく、65%以上がより好ましく、70%以上がさらに好ましく、75%以上が特に好ましい。また、透明性を高くするために、90%以下が好ましく、85%以下がより好ましく、80%以下が特に好ましい。結晶化率が小さいことは、加熱して曲げ成形等しやすい点でも優れている。 The crystallization rate of the crystallized glass is preferably 60% or more to increase the mechanical strength, more preferably 65% or more, even more preferably 70% or more, and particularly preferably 75% or more. Also, to increase transparency, it is preferably 90% or less, more preferably 85% or less, and particularly preferably 80% or less. A small crystallization rate is also advantageous in that it is easier to heat and bend the glass.

 結晶化率は、X線回折強度からリートベルト法で算出できる。リートベルト法については、日本結晶学会「結晶解析ハンドブック」編集委員会編、「結晶解析ハンドブック」(協立出版 1999年刊、p492~499)に記載されている。 The crystallinity rate can be calculated from the X-ray diffraction intensity using the Rietveld method. The Rietveld method is described in the "Crystal Analysis Handbook" (Kyoritsu Shuppan, 1999, pp. 492-499), edited by the Editorial Committee for the "Crystal Analysis Handbook" of the Crystallographic Society of Japan.

 結晶化ガラスの析出結晶の平均粒径は、透明性を高くするために、150nm以下が好ましく、100nm以下がより好ましく、50nm以下がさらに好ましく、20nm以下が特に好ましい。析出結晶の平均粒径は、透過型電子顕微鏡(TEM)像から求められる。また走査型電子顕微鏡(SEM)像から、推定できる。 To increase transparency, the average particle size of the precipitated crystals in the crystallized glass is preferably 150 nm or less, more preferably 100 nm or less, even more preferably 50 nm or less, and particularly preferably 20 nm or less. The average particle size of the precipitated crystals can be determined from a transmission electron microscope (TEM) image. It can also be estimated from a scanning electron microscope (SEM) image.

<<化学強化ガラス>>
 本実施形態に係るガラス板は、化学強化ガラスであることが好ましい。本実施形態に係る化学強化ガラスは、上述の本実施形態に係るガラス板を化学強化して得られるものである。すなわち、本実施形態に係る化学強化ガラスの母組成は、上述の本実施形態に係るガラス板の組成と同様であり、好ましい組成範囲も同様である。
<<Chemically strengthened glass>>
The glass plate according to the present embodiment is preferably a chemically strengthened glass. The chemically strengthened glass according to the present embodiment is obtained by chemically strengthening the glass plate according to the present embodiment described above. That is, the base composition of the chemically strengthened glass according to the present embodiment is the same as the composition of the glass plate according to the present embodiment described above, and the preferred composition range is also the same.

 化学強化ガラスが板状である場合、厚さ方向の表層と中心とでアルカリ金属元素の含有割合が異なる。一方で、極端なイオン交換処理がされた場合を除いて、化学強化ガラスの表面から最も深い部分におけるガラス組成は、化学強化ガラスの母組成と同じである。化学強化ガラスが板状である場合、ガラス表面から最も深い部分とは、例えば板厚tの1/2の深さである。 When chemically strengthened glass is in plate form, the content of alkali metal elements differs between the surface and the center in the thickness direction. On the other hand, except in cases where extreme ion exchange treatment has been performed, the glass composition in the deepest part from the surface of the chemically strengthened glass is the same as the base composition of the chemically strengthened glass. When chemically strengthened glass is in plate form, the deepest part from the glass surface is, for example, a depth of 1/2 the plate thickness t.

(応力特性)
 本明細書において「圧縮応力層深さ(DOL)」は、圧縮応力値CSがゼロとなる深さである。表面圧縮応力値CSおよび圧縮応力層深さDOLは、表面応力計[例えば、折原製作所製表面応力計(FSM-6000)]を用いて測定できる。なお本実施形態に係る化学強化ガラスの好ましい板厚(t)や好ましい形状は上述の本実施形態に係るガラス板の好ましい板厚(t)や形状と同様である。
(Stress characteristics)
In this specification, "compressive stress layer depth (DOL)" is the depth at which the compressive stress value CS becomes zero. The surface compressive stress value CS 0 and the compressive stress layer depth DOL can be measured using a surface stress meter [for example, a surface stress meter (FSM-6000) manufactured by Orihara Seisakusho]. The preferred plate thickness (t) and preferred shape of the chemically strengthened glass according to this embodiment are the same as the preferred plate thickness (t) and shape of the glass plate according to this embodiment described above.

 本実施形態に係る化学強化ガラスは、表面圧縮応力値CSが300MPa以上であることが好ましく、350MPa以上がより好ましく、400MPa以上がさらに好ましく、450MPa以上がよりさらに好ましい。表面圧縮応力値CSの上限値は特に限定されないが、表面圧縮応力値CSは例えば1400MPa以下であってもよい。 The chemically strengthened glass according to this embodiment preferably has a surface compressive stress value CS 0 of 300 MPa or more, more preferably 350 MPa or more, even more preferably 400 MPa or more, and even more preferably 450 MPa or more. The upper limit of the surface compressive stress value CS 0 is not particularly limited, but the surface compressive stress value CS 0 may be, for example, 1400 MPa or less.

 本実施形態に係る化学強化ガラスの圧縮応力層深さDOLは、厚さt(mm)に対して大きすぎるとCTが大きくなり過ぎる場合があるので0.30t以下が好ましく、0.20t以下がより好ましい。また、強度を向上する観点から、DOLは0.10t以上であることが好ましく、0.15t以上がより好ましい。 If the compressive stress layer depth DOL of the chemically strengthened glass according to this embodiment is too large relative to the thickness t (mm), the CT may become too large, so it is preferably 0.30t or less, and more preferably 0.20t or less. From the viewpoint of improving strength, the DOL is preferably 0.10t or more, and more preferably 0.15t or more.

(反射率)
 本実施形態に係る化学強化ガラスは、第1主面における反射率が4.4%以下であることが好ましい。第1主面における反射率が4.4%以下であることにより、ガラスの板厚中心から第1主面を経て外部へと放出される光の取り出し効率を向上し得る。第1主面における反射率はより好ましくは4.3%以下、さらに好ましくは4.2%以下、特に好ましくは4.1%以下である。
(reflectance)
The chemically strengthened glass according to this embodiment preferably has a reflectance of 4.4% or less on the first main surface. By having a reflectance of 4.4% or less on the first main surface, the extraction efficiency of light emitted from the center of the thickness of the glass to the outside through the first main surface can be improved. The reflectance on the first main surface is more preferably 4.3% or less, even more preferably 4.2% or less, and particularly preferably 4.1% or less.

 本実施形態に係る化学強化ガラスは、第2主面における反射率が4.4%以上であることが好ましい。第2主面における反射率が4.4%以上であることにより、第2主面から板厚中心にかけて入ってくる光の取り込み効率をより高めることで、結果として第1主面からの光の取り出し効率をより向上し得る。第2主面における反射率はより好ましくは4.45%以上、さらに好ましくは4.50%以上、特に好ましくは4.55%以上である。 The chemically strengthened glass according to this embodiment preferably has a reflectance of 4.4% or more at the second principal surface. With a reflectance of 4.4% or more at the second principal surface, the efficiency of capturing light entering from the second principal surface toward the center of the plate thickness can be increased, resulting in a further improvement in the efficiency of extracting light from the first principal surface. The reflectance at the second principal surface is more preferably 4.45% or more, even more preferably 4.50% or more, and particularly preferably 4.55% or more.

 反射率は紫外可視分光光度計を用いて反射ユニットを設置することで測定できる(例えばパーキンエルマラムダ900及び自動角度可変ユニバーサル反射アクセサリーを用いる)。このときに片面のみの測定を行うために測定面の逆側の面からの反射をなくすことが必要である。その方法は、例えば表面をやすりで荒らしてもよく、プリズムを設置することで光を逃がしてもよい。 Reflectance can be measured using a UV-Visible spectrophotometer by installing a reflectance unit (e.g., a Perkin Elma Lambda 900 and an automatic angle variable universal reflectance accessory). In order to measure only one side, it is necessary to eliminate reflection from the surface opposite the measurement surface. This can be done, for example, by roughening the surface with a file or by installing a prism to allow light to escape.

<用途> <Application>

 本実施形態に係るガラス板は、携帯電話、スマートフォン、携帯情報端末(PDA)、タブレット端末等のモバイル電子機器に用いられるカバーガラスとして用い得る。携帯を目的としない、テレビ(TV)、パーソナルコンピュータ(PC)、タッチパネル等の電子機器のカバーガラスにも有用である。また、窓ガラス等の建築用資材、テーブルトップ、自動車や飛行機等の内装等やそれらのカバーガラス(例えば、車載用カバーガラス)としても有用である。 The glass plate according to this embodiment can be used as cover glass for mobile electronic devices such as mobile phones, smartphones, personal digital assistants (PDAs), and tablet terminals. It is also useful as cover glass for electronic devices that are not intended to be portable, such as televisions (TVs), personal computers (PCs), and touch panels. It is also useful as building materials such as window glass, table tops, and the interiors of automobiles and airplanes, as well as cover glass for these (for example, vehicle-mounted cover glass).

 本実施形態に係るガラス板は、化学強化の前または後に曲げ加工や成形をおこなって平板状以外の形状にできるので、曲面形状を有する筺体等の用途にも有用である。 The glass plate according to this embodiment can be bent or shaped before or after chemical strengthening to form it into a shape other than a flat plate, making it useful for applications such as enclosures with curved surfaces.

<<ガラス板の製造方法>>
 本実施形態に係るガラス板の製造方法は、少なくとも下記工程(1)を含むことが好ましく、工程(1)加えて下記工程(2)及び(3)の少なくとも一方を含むことがより好ましく、下記工程(1)~(3)を含むことがさらに好ましい。(1)非晶質ガラスを作製する工程(2)ガラスを加熱処理して結晶化ガラスを得る工程(3)ガラスをイオン交換処理して化学強化ガラスを得る工程
 以下、各工程について説明する。
<<Method of manufacturing glass sheet>>
The method for producing a glass plate according to the present embodiment preferably includes at least the following step (1), more preferably includes at least one of the following steps (2) and (3) in addition to the step (1), and further preferably includes the following steps (1) to (3): (1) Step of producing amorphous glass (2) Step of heat-treating glass to obtain crystallized glass (3) Step of ion-exchange-treating glass to obtain chemically strengthened glass Each step will be described below.

(1)非晶質ガラスを作製する工程
 非晶質ガラスは、例えば、以下の方法で製造できる。好ましい組成のガラスが得られるようにガラス原料を調合し、ガラス溶融窯で加熱溶融する。その後、バブリング、撹拌、清澄剤の添加等により溶融ガラスを均質化し、公知の成形法により所定の厚さのガラス板に成形し、徐冷する。
(1) Step of Producing Amorphous Glass Amorphous glass can be produced, for example, by the following method. Glass raw materials are mixed so as to obtain glass of a desired composition, and heated and melted in a glass melting furnace. The molten glass is then homogenized by bubbling, stirring, adding a fining agent, etc., and formed into a glass plate of a predetermined thickness by a known forming method, and slowly cooled.

 成形法としては、フロート法が好ましい。フロート法とは、溶融ガラスを溶融金属浴上に流入させて板状に成形する方法をさす。本明細書において、溶融金属浴の上流とは溶融ガラスが流入する側を、下流とはリボン状に成形されたガラスが搬出される側をいう。 The preferred forming method is the float method. The float method refers to a method in which molten glass is poured onto a molten metal bath and formed into a sheet. In this specification, the upstream side of the molten metal bath refers to the side where the molten glass flows in, and the downstream side refers to the side where the glass formed into a ribbon shape is discharged.

 図3にフロート法によるガラスの製造装置の概略図を示す。図3に示すように、フロート法によるガラスの製造装置は、溶融炉10と、フロートバス20と、徐冷炉(レアー)30とを有する。フロート法によるガラスの製造においては、まず溶融炉10でガラス原料を溶融して溶融ガラスを得る。溶融炉10は、溶融窯11を有し、溶融窯11において、投入されたガラス原料1が溶融されて溶融ガラス2が得られる。より詳細には、溶融窯11は、上流側の溶解槽12と、下流側の冷却槽13とを備え、これらがネック14(またはスロート)により接続された構成を有し、上流側(すなわち溶解槽)においてガラス原料1が溶融されて溶融ガラス2となり、下流側では溶融ガラス2の温度が調整される。 Figure 3 shows a schematic diagram of a glass manufacturing apparatus using the float method. As shown in Figure 3, the glass manufacturing apparatus using the float method has a melting furnace 10, a float bath 20, and an annealing furnace (lehr) 30. In manufacturing glass using the float method, glass raw materials are first melted in the melting furnace 10 to obtain molten glass. The melting furnace 10 has a melting kiln 11, in which the glass raw materials 1 charged are melted to obtain molten glass 2. More specifically, the melting kiln 11 has a melting tank 12 on the upstream side and a cooling tank 13 on the downstream side, which are connected by a neck 14 (or throat), and the glass raw materials 1 are melted on the upstream side (i.e., the melting tank) to become molten glass 2, and the temperature of the molten glass 2 is adjusted on the downstream side.

 次に、フロートバス20に貯留された溶融金属浴21の表面に、上流側から溶融ガラス2を連続的に供給してガラスリボン3を成形する。そして、フロートバス20の下流側端部から成形後のガラスリボン3を引き出し、徐冷炉(レアー)30に導入して徐冷することで板状のガラスが製造される。レアー30内に導入されたガラスリボン3は、ローラーコンベア等の搬送手段によって徐冷炉(図示せず)に搬送されながら徐冷される。溶融金属浴21上の溶融ガラス2とレアー30内のガラスリボン3は連続しているので、レアー30内における搬送速度(レアー速度)は、溶融金属浴21上を溶融ガラス2が上流から下流へと流れる速度に依存する。レアー30内のガラスリボン3は固化しているが、溶融ガラス2は流動するので、溶融ガラス2の速度はレアー速度より遅く、溶融金属浴21上の溶融ガラス2の速度は、下流ほど速い傾向がある。溶融金属の種類は特に限定はされないが、例えば、溶融錫が挙げられる。 Next, molten glass 2 is continuously supplied from the upstream side onto the surface of the molten metal bath 21 stored in the float bath 20 to form a glass ribbon 3. The formed glass ribbon 3 is then drawn out from the downstream end of the float bath 20 and introduced into an annealing furnace (lehr) 30 for annealing, thereby producing sheet glass. The glass ribbon 3 introduced into the lehr 30 is annealed while being transported to an annealing furnace (not shown) by a transport means such as a roller conveyor. Since the molten glass 2 on the molten metal bath 21 and the glass ribbon 3 in the lehr 30 are continuous, the transport speed (lehr speed) in the lehr 30 depends on the speed at which the molten glass 2 flows from upstream to downstream on the molten metal bath 21. Although the glass ribbon 3 in the lehr 30 is solidified, the molten glass 2 flows, so the speed of the molten glass 2 is slower than the lehr speed, and the speed of the molten glass 2 on the molten metal bath 21 tends to be faster downstream. The type of molten metal is not particularly limited, but molten tin is an example.

 上述したように、本実施形態において、ガラス板におけるSnO濃度分布は、フロート法による成形時における、1)レアー速度、2)空気中の水素濃度、3)溶融金属浴の温度及び4)ガラス組成(例えば、SnOの含有量)等により調整し得る。下記に各項目について説明する。 As described above, in this embodiment, the SnO2 concentration distribution in the glass sheet can be adjusted by 1) the lee speed, 2) the hydrogen concentration in the air, 3) the temperature of the molten metal bath, and 4) the glass composition (e.g., the SnO2 content) during forming by the float method. Each item will be explained below.

1)フロート成形時におけるレアー速度
 レアー速度は好ましくは20m/h以上、より好ましくは100m/h以上、さらに好ましくは200m/h以上、特に好ましくは300m/h以上、最も好ましくは400m/h以上である。レアー速度は、大きすぎるとガラスの品質が悪化しやすいので、1200m/h以下が好ましく、より好ましくは1000m/h以下、さらに好ましくは900m/h以下、特に好ましくは850m/h以下、最も好ましくは800m/h以下である。
1) Rare speed during float forming The rare speed is preferably 20 m/h or more, more preferably 100 m/h or more, even more preferably 200 m/h or more, particularly preferably 300 m/h or more, and most preferably 400 m/h or more. If the rare speed is too high, the quality of the glass is likely to deteriorate, so the rare speed is preferably 1200 m/h or less, more preferably 1000 m/h or less, even more preferably 900 m/h or less, particularly preferably 850 m/h or less, and most preferably 800 m/h or less.

2)フロート成形時における雰囲気中の水素濃度
 フロート成形時における雰囲気中の水素濃度は、フロート成形時にガラスに供給される還元性ガスや酸化性ガス等のガスの濃度、吹き付け量、吹き付ける主面、処理温度及び時間等により調整できる。該ガスの供給としては、例えば、溶融金属浴21と間隔をおいて配置される天井の孔からの供給、徐冷炉におけるガラス板に対するガスの吹付けが挙げられる。
2) Hydrogen Concentration in the Atmosphere During Float Forming The hydrogen concentration in the atmosphere during float forming can be adjusted by the concentration of gas such as reducing gas or oxidizing gas supplied to the glass during float forming, the amount of gas sprayed, the main surface to be sprayed, the treatment temperature and time, etc. Examples of the gas supply include supply from a hole in the ceiling disposed at an interval from the molten metal bath 21, and spraying the gas against the glass sheet in an annealing furnace.

 還元性ガスとしては、例えば、窒素ガス、水素ガス、一酸化炭素ガス又はこれらの混合ガスが挙げられる。還元性ガスは、キャリアーガスとして、空気、窒素又はアルゴンなどの不活性ガスを含んでもよい。還元性ガスは、例えば、溶融金属浴21と間隔をおいて配置される天井の孔から供給できる。還元性ガスの処理条件としては、具体的には例えば、混合ガスを0.1~100cc/min、処理温度を600~1200℃とする条件等が挙げられる。前記混合ガスは、例えば窒素ガスと水素ガスとの混合ガスであり、窒素ガスを80体積%~99.5体積%、水素ガスを0.5体積%~20体積%含んでいる。 The reducing gas may be, for example, nitrogen gas, hydrogen gas, carbon monoxide gas, or a mixture of these. The reducing gas may contain an inert gas such as air, nitrogen, or argon as a carrier gas. The reducing gas may be supplied, for example, from a hole in the ceiling spaced apart from the molten metal bath 21. Specific examples of the reducing gas treatment conditions include a mixed gas of 0.1 to 100 cc/min and a treatment temperature of 600 to 1200°C. The mixed gas is, for example, a mixed gas of nitrogen gas and hydrogen gas, containing 80% to 99.5% by volume of nitrogen gas and 0.5% to 20% by volume of hydrogen gas.

 酸化性ガスとしては、例えば、亜硫酸ガス(SOガス)、フッ酸ガス若しくは酸素ガス又はこれらの混合ガスが挙げられる。酸化性ガスは、キャリアーガスとして、空気、窒素又はアルゴンなどの不活性ガスを含んでもよい。酸化性ガスが水蒸気をさらに含んでもよい。酸化性ガスは、例えば、徐冷炉においてガラス板の主面(好ましくは少なくともトップ面、具体的には例えば、第1主面のみ又は第1主面及び第2主面の両面)に吹き付ける。酸化性ガスの処理条件としては、具体的には例えば、混合ガスを0.1~100cc/min、処理温度を600~1200℃、とする条件等が挙げられる。前記混合ガスは、例えば酸素含有量を0.5体積%~10体積%またはそれよりも高い範囲で変動し得る。幾つかの態様において、前記混合ガスは、最大で100体積%となる酸素ガスであってよい。 Examples of the oxidizing gas include sulfur dioxide gas ( SO2 gas), hydrofluoric acid gas, oxygen gas, or a mixture thereof. The oxidizing gas may contain an inert gas such as air, nitrogen, or argon as a carrier gas. The oxidizing gas may further contain water vapor. The oxidizing gas is, for example, sprayed onto the main surface of the glass plate (preferably at least the top surface, specifically, for example, only the first main surface or both the first main surface and the second main surface) in an annealing furnace. Specific examples of the treatment conditions for the oxidizing gas include a mixed gas of 0.1 to 100 cc/min and a treatment temperature of 600 to 1200°C. The mixed gas may vary, for example, in an oxygen content range of 0.5% by volume to 10% by volume or higher. In some embodiments, the mixed gas may be oxygen gas with a maximum of 100% by volume.

3)フロート成形時における溶融金属浴の温度
 溶融金属浴の温度は、700℃以上が好ましく、より好ましくは800℃以上、さらに好ましくは850℃以上、特に好ましくは900℃以上である。金属錫の揮散の観点から、1300℃以下が好ましく、より好ましくは1250℃以下、さらに好ましくは1200℃以下、特に好ましくは1150℃以下である。
3) Temperature of the molten metal bath during float forming The temperature of the molten metal bath is preferably 700° C. or higher, more preferably 800° C. or higher, even more preferably 850° C. or higher, and particularly preferably 900° C. or higher. From the viewpoint of volatilization of metallic tin, the temperature is preferably 1300° C. or lower, more preferably 1250° C. or lower, even more preferably 1200° C. or lower, and particularly preferably 1150° C. or lower.

4)ガラス組成
 ガラス板におけるSnO濃度分布は、母組成のSnO濃度を調整することによっても調整し得る。母組成のSnO濃度の好ましい範囲などは、<ガラス板>(組成)の項において上述した範囲と同様である。
4) Glass composition The SnO2 concentration distribution in the glass sheet can also be adjusted by adjusting the SnO2 concentration of the matrix composition. The preferred range of the SnO2 concentration of the matrix composition is the same as the range described above in the section <Glass sheet> (composition).

(2)ガラスを加熱処理して結晶化ガラスを得る工程
 上記の手順で得られた非晶質ガラスを加熱処理(熱処理)することで結晶化ガラスが得られる。その場合の加熱処理としては、2段階以上の複数段階の熱処理を含む。複数段階の熱処理とは、所定の温度域で所定時間保持することを、温度域等を変化させて複数回行う熱処理のことをいう。複数段階の熱処理としては、具体的には例えば、室温から第一の処理温度まで昇温して一定時間保持した後、第一の処理温度より高温である第二の処理温度に一定時間保持する2段階の加熱処理が挙げられる。
(2) Step of Heating Glass to Obtain Crystallized Glass The amorphous glass obtained by the above procedure is heat-treated (thermal treatment) to obtain crystallized glass. In this case, the heat treatment includes a multi-stage heat treatment of two or more stages. The multi-stage heat treatment means a heat treatment in which a predetermined temperature range is held for a predetermined time, and the temperature range is changed and the like is held multiple times. Specifically, the multi-stage heat treatment can be, for example, a two-stage heat treatment in which the temperature is raised from room temperature to a first treatment temperature and held for a certain time, and then the second treatment temperature, which is higher than the first treatment temperature, is held for a certain time.

 2段階の加熱処理による場合、第一の処理温度は、そのガラス組成において結晶核生成速度が大きくなる温度域が好ましく、第二の処理温度は、そのガラス組成において結晶成長速度が大きくなる温度域が好ましい。また、第一の処理温度での保持時間は、充分な数の結晶核が生成するように長く保持することが好ましい。多数の結晶核が生成することで、各結晶の大きさが小さくなり、透明性の高い結晶化ガラスが得られる。 When using a two-stage heat treatment, the first treatment temperature is preferably in a temperature range where the crystal nucleation rate is high for that glass composition, and the second treatment temperature is preferably in a temperature range where the crystal growth rate is high for that glass composition. In addition, it is preferable to hold the first treatment temperature for a long time so that a sufficient number of crystal nuclei are generated. By generating a large number of crystal nuclei, the size of each crystal becomes small, and highly transparent crystallized glass is obtained.

 2段階の加熱処理による場合、第一の処理温度は、例えば550℃~800℃であり、第二の処理温度は、例えば850℃~1000℃であり、第一の処理温度で2時間~10時間保持した後、第二の処理温度で2時間~10時間保持する。 When using a two-stage heat treatment, the first treatment temperature is, for example, 550°C to 800°C, and the second treatment temperature is, for example, 850°C to 1000°C, and after being held at the first treatment temperature for 2 to 10 hours, it is held at the second treatment temperature for 2 to 10 hours.

 各段階の熱処理における昇温速度及び降温速度は5~120℃/分であることが好ましい。昇温速度及び降温速度が5℃/分以上であることで、材料内での結晶生成速度への追従が出来るため好ましい。一方で、昇温速度及び降温速度が120℃/分以下であることで、材料の変形を抑制できるため好ましい。 The heating and cooling rates in each stage of heat treatment are preferably 5 to 120°C/min. A heating and cooling rate of 5°C/min or more is preferable because it allows the rate to follow the rate of crystal formation within the material. On the other hand, a heating and cooling rate of 120°C/min or less is preferable because it allows the deformation of the material to be suppressed.

 溶融ガラスを均質化し、所定の厚さのガラス板に成形し、または、溶融ガラスをブロック状に成形し、引き続いて、連続的に結晶化処理を行ってもよい。上記手順で得られた結晶化ガラスを必要に応じて研削及び研磨処理して、結晶化ガラス板を形成する。 The molten glass is homogenized and formed into a glass plate of a specified thickness, or the molten glass is formed into a block shape, followed by a continuous crystallization process. The crystallized glass obtained by the above procedure is ground and polished as necessary to form a crystallized glass plate.

(3)ガラスをイオン交換処理して化学強化ガラスを得る工程
 本実施形態において、化学強化処理(イオン交換処理)は、例えば、360~600℃に加熱された硝酸カリウム等の溶融塩中に、ガラス板を0.1~500時間浸漬することによって行う。なお、溶融塩の加熱温度としては、375~500℃が好ましく、また、溶融塩中へのガラス板の浸漬時間は、0.3~200時間が好ましい。
(3) Step of Obtaining Chemically Strengthened Glass by Ion Exchange Treatment of Glass In this embodiment, the chemical strengthening treatment (ion exchange treatment) is performed by, for example, immersing the glass plate for 0.1 to 500 hours in a molten salt such as potassium nitrate heated to 360 to 600° C. The heating temperature of the molten salt is preferably 375 to 500° C., and the immersion time of the glass plate in the molten salt is preferably 0.3 to 200 hours.

 化学強化処理を行うための溶融塩としては、例えば、硝酸塩、硫酸塩、炭酸塩、塩化物などが挙げられる。このうち硝酸塩としては、例えば、硝酸リチウム、硝酸ナトリウム、硝酸カリウム、硝酸セシウム、硝酸銀などが挙げられる。硫酸塩としては、例えば、硫酸リチウム、硫酸ナトリウム、硫酸カリウム、硫酸セシウム、硫酸銀などが挙げられる。炭酸塩としては、例えば、炭酸リチウム、炭酸ナトリウム、炭酸カリウムなどが挙げられる。塩化物としては、例えば、塩化リチウム、塩化ナトリウム、塩化カリウム、塩化セシウム、塩化銀などが挙げられる。これらの溶融塩は単独で用いてもよいし、複数種を組み合わせて用いてもよい。 Examples of molten salts for carrying out chemical strengthening treatment include nitrates, sulfates, carbonates, and chlorides. Among these, examples of nitrates include lithium nitrate, sodium nitrate, potassium nitrate, cesium nitrate, and silver nitrate. Examples of sulfates include lithium sulfate, sodium sulfate, potassium sulfate, cesium sulfate, and silver sulfate. Examples of carbonates include lithium carbonate, sodium carbonate, and potassium carbonate. Examples of chlorides include lithium chloride, sodium chloride, potassium chloride, cesium chloride, and silver chloride. These molten salts may be used alone or in combination.

 本実施形態において、化学強化処理の処理条件は、化学強化用ガラスの特性・組成や溶融塩の種類、ならびに、最終的に得られる化学強化ガラスに所望される表面圧縮応力や圧縮応力層の深さ等の化学強化特性などを考慮して、適切な条件を選択すればよい。 In this embodiment, the processing conditions for the chemical strengthening treatment can be appropriately selected taking into consideration the properties and composition of the glass for chemical strengthening, the type of molten salt, and the chemical strengthening properties, such as the surface compressive stress and the depth of the compressive stress layer, desired for the final chemically strengthened glass.

 とくに、破壊靱性値が大きい非晶質ガラスまたは結晶化ガラスを長時間化学強化処理することが好ましい。長時間の化学強化処理によって、イオン交換反応が進むと、表層部に大きな圧縮応力が生じると同時に、構造緩和によって、主に表面付近で圧縮応力の減少が生じ、本実施形態の圧縮応力バランスが得られやすい。 In particular, it is preferable to perform a long-term chemical strengthening treatment on amorphous glass or crystallized glass, which has a large fracture toughness value. When an ion exchange reaction progresses due to a long-term chemical strengthening treatment, a large compressive stress is generated in the surface layer, and at the same time, a decrease in compressive stress occurs mainly near the surface due to structural relaxation, making it easier to achieve the compressive stress balance of this embodiment.

 また、本実施形態においては、化学強化処理を一回のみ行ってもよく、又は2以上の異なる条件で複数回の化学強化処理(多段強化)を行ってもよい。 In addition, in this embodiment, the chemical strengthening treatment may be performed only once, or multiple chemical strengthening treatments (multi-stage strengthening) may be performed under two or more different conditions.

<積層体>
 本実施形態に係る積層体は、上記した本実施形態に係るガラス板と、液晶ガラス板とを含む積層体であって、該ガラス板の第1主面が該積層体の最表面であり、該ガラス板における第2主面が該液晶ガラス板との積層面であり、該ガラス板における該第2主面のプリズムカプラーで測定した屈折率と、該液晶ガラス板のプリズムカプラーで測定した屈折率との差の絶対値が0.001~0.20である。
<Laminate>
The laminate according to this embodiment is a laminate including the glass plate according to the embodiment described above and a liquid crystal glass plate, wherein a first main surface of the glass plate is the outermost surface of the laminate, a second main surface of the glass plate is a lamination surface with the liquid crystal glass plate, and the absolute value of the difference between the refractive index of the second main surface of the glass plate measured with a prism coupler and the refractive index of the liquid crystal glass plate measured with a prism coupler is 0.001 to 0.20.

 本実施形態に係る積層体は、ガラス板における第2主面のプリズムカプラーで測定した屈折率と、液晶ガラス板のプリズムカプラーで測定した屈折率との差の絶対値が好ましくは0.001~0.20であることにより、液晶ガラス板からガラス板に光が入り易く、光の損失を抑制し得る。 In the laminate according to this embodiment, the absolute value of the difference between the refractive index measured with a prism coupler on the second main surface of the glass plate and the refractive index measured with a prism coupler on the liquid crystal glass plate is preferably 0.001 to 0.20, which allows light to easily enter the glass plate from the liquid crystal glass plate and suppresses light loss.

 本実施形態に係る積層体は、液晶ガラス板からガラス板に入光する光の損失をより抑制する観点から、ガラス板における第2主面のプリズムカプラーで測定した屈折率と、該液晶ガラス板のプリズムカプラーで測定した屈折率との差の絶対値が、0.10以下であることがより好ましく、さらに好ましくは0.050以下、よりさらに好ましくは0.030以下、特に好ましくは0.010以下である。 From the viewpoint of further suppressing the loss of light entering the glass plate from the liquid crystal glass plate, the laminate according to this embodiment preferably has an absolute value of the difference between the refractive index measured with a prism coupler of the second main surface of the glass plate and the refractive index measured with a prism coupler of the liquid crystal glass plate of 0.10 or less, more preferably 0.050 or less, even more preferably 0.030 or less, and particularly preferably 0.010 or less.

 本実施形態に係る積層体は、ガラス板における第2主面が液晶ガラス板との積層面であるが、ガラス板と液晶ガラス板との間に中間層を含んでいてもよい。中間層としては、例えば、粘着層、印刷層、機能層(例えば、光学フィルタ層、屈折率マッチング層)が挙げられる。本実施形態に係る積層体において、ガラス板の第1主面に機能層(例えば、防汚層、反射防止層)が積層されていてもよい。 In the laminate according to this embodiment, the second main surface of the glass plate is the lamination surface with the liquid crystal glass plate, but an intermediate layer may be included between the glass plate and the liquid crystal glass plate. Examples of intermediate layers include an adhesive layer, a printed layer, and a functional layer (e.g., an optical filter layer, a refractive index matching layer). In the laminate according to this embodiment, a functional layer (e.g., an anti-fouling layer, an anti-reflection layer) may be laminated on the first main surface of the glass plate.

<ディスプレイ装置>
 本実施形態に係るディスプレイ装置は、上記した本実施形態に係るガラス板又は上記した本実施形態に係る積層体を備える。本実施形態におけるディスプレイ装置としては、例えば、車載用のカーナビゲーションシステム等のディスプレイ装置、スマートフォン等の携帯用ディスプレイ装置が挙げられる。
<Display device>
The display device according to the present embodiment includes the glass plate according to the present embodiment or the laminate according to the present embodiment. Examples of the display device according to the present embodiment include a display device such as an in-vehicle car navigation system and a portable display device such as a smartphone.

 以下、実施例等を用いて本発明についてさらに詳しく説明するが、本発明はこれらに限定されない。例1~例20は実施例であり、例21~例31は比較例である。 The present invention will be described in more detail below using examples, but the present invention is not limited to these. Examples 1 to 20 are examples, and Examples 21 to 31 are comparative examples.

 <例1~例20:ガラスの製造>
 表1~3に酸化物基準の質量百分率表示で示す組成になるように、フロート法によりガラスを作製した。
 例4、例6~例8、例10、例12、例14については、表に示す条件で2段階の熱処理を行い、結晶化ガラスのガラス板を得た。
<Examples 1 to 20: Production of Glass>
Glasses were prepared by the float process so as to have the compositions shown in Tables 1 to 3 in terms of mass percentage based on oxides.
In Examples 4, 6 to 8, 10, 12, and 14, a two-stage heat treatment was carried out under the conditions shown in the table to obtain glass plates of crystallized glass.

 <例21~例31:ガラスの製造>
 表3及び4に酸化物基準の質量百分率表示で示す組成となるようにガラス原料を調合し、ガラスとして400gになるように秤量した。ついで、混合した原料を白金るつぼに入れ、1500~1700℃の電気炉に投入して3時間程度溶融し、脱泡し、均質化した。
 得られた溶融ガラスを金属型に流し込み、ガラス転移点より50℃程度高い温度に1時間保持した後、0.5℃/分の速度で室温まで冷却し、ガラスブロックを得た。得られたガラスブロックを切断、研削し、最後に両面を研磨して、厚さが0.7mmのガラス板を得た。
 例25、例27、例28については表4に示す条件で2段階の熱処理を行い、結晶化ガラスのガラス板を得た。
<Examples 21 to 31: Production of Glass>
Glass raw materials were mixed to obtain the compositions shown in Tables 3 and 4 in terms of mass percentage based on oxides, and weighed out to give 400 g of glass. The mixed raw materials were then placed in a platinum crucible and placed in an electric furnace at 1500 to 1700°C, melted for about 3 hours, degassed, and homogenized.
The molten glass thus obtained was poured into a metal mold and held at a temperature about 50° C. higher than the glass transition point for 1 hour, and then cooled to room temperature at a rate of 0.5° C./min to obtain a glass block. The obtained glass block was cut and ground, and finally both sides were polished to obtain a glass plate having a thickness of 0.7 mm.
For Examples 25, 27, and 28, a two-stage heat treatment was carried out under the conditions shown in Table 4 to obtain glass plates of crystallized glass.

<ガラスの評価>
 上記で得た各ガラス板について、下記に示す評価を行った。
 各ガラスについて、トップ面(第1主面)における表層近傍の酸化スズ濃度(SnOとボトム面(第2主面)における表層近傍の酸化スズ濃度(SnOを評価した。
 実施例及び比較例で用いたものと同じガラス板に対して、電子線プローブマイク口アナライザ(EPMA)とそれに装着した波長分散型X線検出器(WDX)を用い、酸化スズの濃度を測定した。具体的には、EPMA(JXA8600、日本電子株式会社製)によるWDX分析で行なった。その測定結果から、2価および4価で存在するSnを4価に換算した。その後トップ面から10μmまでの深さにおけるSnO換算の酸化スズ濃度を平均し、これをトップ面(第1主面)におけるSnO濃度(SnOとした。また、ボトム面から10μmまでの深さにおけるSnO換算の酸化スズ濃度を平均し、これをボトム面(第2主面)におけるSnO濃度(SnOとした。また、板厚中心のSnO換算の酸化スズ濃度も同様に測定し、これらの数値からΔ(SnO及びΔ(SnOを求めた。
<Glass evaluation>
Each of the glass plates obtained above was evaluated as follows.
For each glass, the tin oxide concentration (SnO 2 ) T near the surface layer on the top surface (first main surface) and the tin oxide concentration (SnO 2 ) B near the surface layer on the bottom surface (second main surface) were evaluated.
The concentration of tin oxide was measured for the same glass plate as that used in the examples and comparative examples using an electron probe microphone analyzer (EPMA) and a wavelength dispersive X-ray detector (WDX) attached thereto. Specifically, WDX analysis was performed using an EPMA (JXA8600, manufactured by JEOL Ltd.). From the measurement results, divalent and tetravalent Sn was converted to tetravalent. Then, the tin oxide concentration in terms of SnO 2 at a depth of 10 μm from the top surface was averaged, and this was taken as the SnO 2 concentration (SnO 2 ) T at the top surface (first main surface). In addition, the tin oxide concentration in terms of SnO 2 at a depth of 10 μm from the bottom surface was averaged, and this was taken as the SnO 2 concentration (SnO 2 ) B at the bottom surface (second main surface). The tin oxide concentration in terms of SnO2 at the center of the sheet thickness was also measured in the same manner, and Δ( SnO2 ) T and Δ( SnO2 ) B were calculated from these values.

 次に各ガラスのトップ面(第1主面)及びボトム面(第2主面)において、プリズムカプラー(633nm)で屈折率を測定した。結果を表1~4に示す。「結晶化条件」における「-」は、結晶化処理を行っていないことをさす。
Next, the refractive index of each glass was measured on the top surface (first main surface) and the bottom surface (second main surface) using a prism coupler (633 nm). The results are shown in Tables 1 to 4. The "-" in the "crystallization conditions" column indicates that no crystallization treatment was performed.

Figure JPOXMLDOC01-appb-T000001
Figure JPOXMLDOC01-appb-T000001

Figure JPOXMLDOC01-appb-T000002
Figure JPOXMLDOC01-appb-T000002

Figure JPOXMLDOC01-appb-T000003
Figure JPOXMLDOC01-appb-T000003

Figure JPOXMLDOC01-appb-T000004
Figure JPOXMLDOC01-appb-T000004

 結果として、実施例である例1~例20については、トップ面(第1主面)よりもボトム面(第2主面)の屈折率が大きくなっていた。このことから、ディスプレイのカバーガラスとして用いた場合に、ボトム面の屈折率を発光部材表面のガラスの屈折率に近づけることができるため液晶ガラス板から第2主面に光が入り易くなることが予想される。また、トップ面のガラス表層において屈折率分布を有するためガラスの板厚中心から第1主面を経て外部へと放出されやすくなることが予想される。すなわち、カバーガラスとして当該ガラス板のボトム面がディスプレイに面するようにして用いた場合に、光の取り出し効率をより向上できることが予想される。 As a result, in the working examples, Examples 1 to 20, the refractive index of the bottom surface (second main surface) was greater than that of the top surface (first main surface). From this, when used as cover glass for a display, it is expected that light will easily enter the second main surface from the liquid crystal glass plate because the refractive index of the bottom surface can be made closer to the refractive index of the glass on the surface of the light-emitting component. In addition, since the glass surface layer on the top surface has a refractive index distribution, it is expected that light will easily be emitted from the center of the glass thickness through the first main surface to the outside. In other words, when used as cover glass with the bottom surface of the glass plate facing the display, it is expected that the light extraction efficiency can be further improved.

 本発明を特定の態様を参照して詳細に説明したが、本発明の精神と範囲を離れることなく様々な変更および修正が可能であることは、当業者にとって明らかである。なお、本出願は、2023年12月6日付けで出願された日本特許出願(特願2023-206284)、2024年9月20日付けで出願された日本特許出願(特願2024-163789)、2024年7月17日付けで出願された日本特許出願(特願2024-114047)及び2024年7月17日付けで出願された日本特許出願(特願2024-114101)に基づいており、その全体が引用により援用される。また、ここに引用されるすべての参照は全体として取り込まれる。また、ここに引用されるすべての参照は全体として取り込まれる。 Although the present invention has been described in detail with reference to specific embodiments, it will be apparent to those skilled in the art that various changes and modifications can be made without departing from the spirit and scope of the present invention. This application is based on Japanese patent application (Patent Application No. 2023-206284) filed on December 6, 2023, Japanese patent application (Patent Application No. 2024-163789) filed on September 20, 2024, Japanese patent application (Patent Application No. 2024-114047) filed on July 17, 2024, and Japanese patent application (Patent Application No. 2024-114101) filed on July 17, 2024, and is incorporated by reference in its entirety. In addition, all references cited herein are incorporated by reference in their entirety. In addition, all references cited herein are incorporated by reference in their entirety.

 1 ガラス原料;2 溶融ガラス;3 ガラスリボン;10 溶融炉;11 溶融窯;12 溶解槽;13 冷却槽;14 ネック;20 フロートバス;21 溶融金属浴;22 トップロール;23 リストリクター;30 徐冷炉(レアー) 1 Glass raw material; 2 Molten glass; 3 Glass ribbon; 10 Melting furnace; 11 Melting furnace; 12 Melting tank; 13 Cooling tank; 14 Neck; 20 Float bath; 21 Molten metal bath; 22 Top roll; 23 Restrictor; 30 Lehr (lehr)

Claims (17)

 第1主面と、前記第1主面に対向する第2主面と、を有し、
 厚さが0.30~1.00mmであり、 
 酸化物基準の質量百分率表示で、下記式(1)及び(2)を満たす、ガラス板。
 0.03≦(ΔSnO≦1.0 (1)
 0.20≦(ΔSnO≦1.5 (2)
(ΔSnO:[板厚中心におけるSnO濃度(%)]から[前記第1主面におけるSnO濃度(%)]を減じた値(%)
(ΔSnO:[前記第2主面におけるSnO濃度(%)]から[板厚中心におけるSnO濃度(%)]を減じた値(%)
A first main surface and a second main surface opposite to the first main surface,
The thickness is 0.30 to 1.00 mm,
A glass plate satisfying the following formulas (1) and (2) in terms of mass percentage based on oxides.
0.03≦(ΔSnO 2 ) T ≦1.0 (1)
0.20≦(ΔSnO 2 ) B ≦1.5 (2)
(ΔSnO 2 ) T : Value (%) obtained by subtracting [SnO 2 concentration (%) on the first main surface] from [SnO 2 concentration (%) on the sheet thickness center]
(ΔSnO 2 ) B : Value (%) obtained by subtracting [SnO 2 concentration (%) at the center of sheet thickness] from [SnO 2 concentration (%) at the second main surface]
 酸化物基準の質量百分率表示で、前記第1主面から深さ100μmにおけるSnO濃度(%)から、前記第1主面におけるSnO濃度(%)を減じた値が0~0.9%である、請求項1に記載のガラス板。 2. The glass plate according to claim 1, wherein the value obtained by subtracting the SnO 2 concentration (%) at the first main surface from the SnO 2 concentration (%) at a depth of 100 μm from the first main surface is 0 to 0.9%, expressed in mass percentage based on oxide.  酸化物基準の質量百分率表示で、前記第2主面におけるSnO濃度(%)から、前記第2主面から深さ100μmにおけるSnO濃度(%)を減じた値が0.15~1.4%である、請求項1に記載のガラス板。 2. The glass plate according to claim 1, wherein the SnO 2 concentration (%) at a depth of 100 μm from the second main surface is 0.15 to 1.4%, expressed in mass percentage based on oxides.  母組成が、酸化物基準の質量百分率表示で、
 SiOを55~75%、
 Alを7.0~30%、
 LiOを0.01~13.0%含有する、請求項1に記載のガラス板。
The matrix composition is expressed as a mass percentage based on oxides.
SiO2 55-75%,
7.0 to 30% Al 2 O 3 ,
2. The glass plate according to claim 1, containing 0.01 to 13.0% of Li 2 O.
 母組成が、酸化物基準の質量百分率表示で、
 SiOを55~75%、
 Alを7.0~30%、
 LiOを0.01~13.0%、
 NaOを0~18%、
 ZrOを0.1~6.0%、
 Yを1.0~9.0%、
 Pを0~5.0%含有する、請求項4に記載のガラス板。
The matrix composition is expressed as a mass percentage based on oxides.
SiO2 55-75%,
7.0 to 30% Al 2 O 3 ,
0.01 to 13.0% Li 2 O,
0-18% Na 2 O,
ZrO2 from 0.1 to 6.0%,
1.0 to 9.0% Y 2 O 3 ,
The glass plate according to claim 4, containing 0 to 5.0% of P 2 O 5 .
 母組成が、酸化物基準の質量百分率表示で、
 SiOを60~66%、
 Alを23~27%、
 LiOを3.5~5.0%、
 NaOを1.0~2.0%、
 KOを0.1~0.5%、
 TiOを0.01~0.2%、
 ZrOを2.5~3.5%、
 SnOを0.4~1.0%、含有する請求項4に記載のガラス板。
The matrix composition is expressed as a mass percentage based on oxides.
SiO2 60-66%,
23-27% Al 2 O 3 ,
3.5 to 5.0% Li 2 O,
1.0-2.0% Na 2 O,
K 2 O 0.1 to 0.5%,
TiO2 0.01-0.2%,
ZrO2 2.5-3.5%,
The glass plate according to claim 4, containing 0.4 to 1.0% SnO2 .
 母組成が、酸化物基準の質量百分率表示で、
 SiOを60~66%、
 Alを18~24%、
 LiOを4.0~6.0%、
 NaOを0.5~1.5%、
 KOを0.1~1.5%、
 TiOを0.01~0.2%、
 ZrOを2.0~3.5%、
 SnOを1.5~3.0%、含有する請求項4に記載のガラス板。
The matrix composition is expressed as a mass percentage based on oxides.
SiO2 60-66%,
18-24% Al 2 O 3 ,
4.0 to 6.0% Li 2 O,
0.5-1.5% Na 2 O,
K 2 O 0.1 to 1.5%,
TiO2 0.01-0.2%,
ZrO2 from 2.0 to 3.5%,
The glass plate according to claim 4, containing 1.5 to 3.0% SnO2 .
 母組成が、酸化物基準の質量百分率表示で、
 SiOを56~60%、
 Alを25~29%、
 LiOを4.5~7.0%、
 NaOを0.3~1.0%、
 KOを0.1~0.5%、
 TiOを0.01~0.2%、
 ZrOを2.5~3.5%、
 SnOを1.5~3.0%、含有する請求項4に記載のガラス板。
The matrix composition is expressed as a mass percentage based on oxides.
SiO2 56-60%,
25-29% Al 2 O 3 ,
4.5 to 7.0% Li 2 O,
0.3-1.0% Na 2 O,
K 2 O 0.1 to 0.5%,
TiO2 0.01-0.2%,
ZrO2 2.5-3.5%,
The glass plate according to claim 4, containing 1.5 to 3.0% SnO2 .
 母組成が、酸化物基準の質量百分率表示で、
 SiOを60~64%、
 Alを20~24%、
 LiOを3.5~5.5%、
 NaOを0.8~1.5%、
 KOを0.5~1.0%、
 TiOを0.01~0.2%、
 ZrOを2.5~3.5%、
 SnOを1.5~3.0%、含有する請求項4に記載のガラス板。
The matrix composition is expressed as a mass percentage based on oxides.
SiO2 60 to 64%,
20-24% Al 2 O 3 ,
3.5-5.5% Li 2 O,
0.8-1.5% Na 2 O,
K 2 O 0.5 to 1.0%,
TiO2 0.01-0.2%,
ZrO2 2.5-3.5%,
The glass plate according to claim 4, containing 1.5 to 3.0% SnO2 .
 母組成が、酸化物基準の質量百分率表示で、
 SiOを58~62%、
 Alを21~25%、
 LiOを3.5~5.5%、
 NaOを0.5~1.5%、
 KOを0.3~1.5%、
 TiOを0.01~0.2%、
 ZrOを2.0~3.0%、含有する請求項4に記載のガラス板。
The matrix composition is expressed as a mass percentage based on oxides.
SiO2 58-62%,
21-25% Al 2 O 3 ,
3.5-5.5% Li 2 O,
0.5-1.5% Na 2 O,
K 2 O 0.3 to 1.5%,
TiO2 0.01-0.2%,
The glass plate according to claim 4, containing 2.0 to 3.0% ZrO2 .
 母組成が、酸化物基準の質量百分率表示で、
 SiOを58~62%、
 Alを21~25%、
 LiOを3.5~5.5%、
 NaOを0.5~1.5%、
 KOを0.3~1.5%、
 TiOを0.01~0.2%、
 ZrOを2.0~3.5%、
 SnOを1.5~3.0%、含有する請求項4に記載のガラス板。
The matrix composition is expressed as a mass percentage based on oxides.
SiO2 58-62%,
21-25% Al 2 O 3 ,
3.5-5.5% Li 2 O,
0.5-1.5% Na 2 O,
K 2 O 0.3 to 1.5%,
TiO2 0.01-0.2%,
ZrO2 from 2.0 to 3.5%,
The glass plate according to claim 4, containing 1.5 to 3.0% SnO2 .
 結晶化ガラスである、請求項1に記載のガラス板。 The glass plate according to claim 1, which is glass-ceramic.  化学強化ガラスである、請求項1に記載のガラス板。 The glass plate according to claim 1, which is chemically strengthened glass.  フロートガラスである、請求項1に記載のガラス板。 The glass sheet according to claim 1, which is float glass.  厚さ0.7mmに換算した場合の可視光透過率が91.0%以上である、請求項1に記載のガラス板。 The glass plate according to claim 1, which has a visible light transmittance of 91.0% or more when converted to a thickness of 0.7 mm.  請求項1に記載のガラス板と、液晶ガラス板とを含む積層体であって、
 前記ガラス板における前記液晶ガラス板との積層面は前記第2主面であり、
 前記ガラス板における前記第2主面のプリズムカプラーで測定した屈折率と、前記液晶ガラス板のプリズムカプラーで測定した屈折率との差の絶対値が0.001~0.20である、積層体。
A laminate comprising the glass plate according to claim 1 and a liquid crystal glass plate,
The lamination surface of the glass plate with the liquid crystal glass plate is the second main surface,
a laminate, wherein an absolute value of a difference between a refractive index of the second main surface of the glass plate measured with a prism coupler and a refractive index of the liquid crystal glass plate measured with a prism coupler is 0.001 to 0.20.
 請求項1~15のいずれか1項に記載のガラス板又は請求項16に記載の積層体を含むディスプレイ装置。 A display device comprising the glass plate according to any one of claims 1 to 15 or the laminate according to claim 16.
PCT/JP2024/042957 2023-12-06 2024-12-04 Glass plate, laminate, and display device Pending WO2025121366A1 (en)

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Citations (8)

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JPS6194001A (en) * 1984-10-15 1986-05-12 Mitsubishi Electric Corp Optical elements and their manufacturing methods
JP2012506607A (en) * 2008-10-24 2012-03-15 サン−ゴバン グラス フランス Glass substrate with electrodes, especially substrate used for organic light-emitting diode elements
JP2012211051A (en) * 2011-03-31 2012-11-01 Asahi Glass Co Ltd Process for producing chemically strengthened glass
WO2015178254A1 (en) * 2014-05-19 2015-11-26 旭硝子株式会社 Glass plate for light guide plate
JP2016076478A (en) * 2014-10-03 2016-05-12 旭硝子株式会社 Glass plate for light guide plate
JP2017107738A (en) * 2015-12-09 2017-06-15 旭硝子株式会社 Glass plate for light guide plate
JP2018062449A (en) * 2016-10-13 2018-04-19 旭硝子株式会社 Glass for chemical strengthening
JP2019525418A (en) * 2016-08-11 2019-09-05 コーニング インコーポレイテッド Method and apparatus for stacked backlight unit

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6194001A (en) * 1984-10-15 1986-05-12 Mitsubishi Electric Corp Optical elements and their manufacturing methods
JP2012506607A (en) * 2008-10-24 2012-03-15 サン−ゴバン グラス フランス Glass substrate with electrodes, especially substrate used for organic light-emitting diode elements
JP2012211051A (en) * 2011-03-31 2012-11-01 Asahi Glass Co Ltd Process for producing chemically strengthened glass
WO2015178254A1 (en) * 2014-05-19 2015-11-26 旭硝子株式会社 Glass plate for light guide plate
JP2016076478A (en) * 2014-10-03 2016-05-12 旭硝子株式会社 Glass plate for light guide plate
JP2017107738A (en) * 2015-12-09 2017-06-15 旭硝子株式会社 Glass plate for light guide plate
JP2019525418A (en) * 2016-08-11 2019-09-05 コーニング インコーポレイテッド Method and apparatus for stacked backlight unit
JP2018062449A (en) * 2016-10-13 2018-04-19 旭硝子株式会社 Glass for chemical strengthening

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