WO2025105440A1 - Curable composition, prepreg, metal-clad laminate, printed wiring board, semiconductor package, and molded article - Google Patents
Curable composition, prepreg, metal-clad laminate, printed wiring board, semiconductor package, and molded article Download PDFInfo
- Publication number
- WO2025105440A1 WO2025105440A1 PCT/JP2024/040513 JP2024040513W WO2025105440A1 WO 2025105440 A1 WO2025105440 A1 WO 2025105440A1 JP 2024040513 W JP2024040513 W JP 2024040513W WO 2025105440 A1 WO2025105440 A1 WO 2025105440A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- curable composition
- compound
- group
- groups
- mass
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C13/00—Cyclic hydrocarbons containing rings other than, or in addition to, six-membered aromatic rings
- C07C13/28—Polycyclic hydrocarbons or acyclic hydrocarbon derivatives thereof
- C07C13/32—Polycyclic hydrocarbons or acyclic hydrocarbon derivatives thereof with condensed rings
- C07C13/45—Polycyclic hydrocarbons or acyclic hydrocarbon derivatives thereof with condensed rings with a bicyclo ring system containing nine carbon atoms
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F12/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K3/00—Use of inorganic substances as compounding ingredients
- C08K3/01—Use of inorganic substances as compounding ingredients characterized by their specific function
- C08K3/013—Fillers, pigments or reinforcing additives
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L101/00—Compositions of unspecified macromolecular compounds
- C08L101/02—Compositions of unspecified macromolecular compounds characterised by the presence of specified groups, e.g. terminal or pendant functional groups
Definitions
- This disclosure relates to curable compositions for prepregs, prepregs, metal-clad laminates, printed wiring boards, semiconductor packages, and molded products.
- Metal-clad laminates such as copper-clad laminates, prepregs that can be used with metal-clad laminates, and semiconductor packages that use metal-clad laminates are used in a wide variety of electronic devices, including mobile communication devices such as smartphones, base station equipment, servers, routers, large servers, and other network infrastructure devices, as well as large computers, personal computers, and industrial computers. They are also used in electronic devices installed in home appliances, automobiles, etc.
- circuit board materials with low transmission loss in the high frequency range are required.
- Resins with low dielectric constants and low dielectric tangents are used as circuit board materials to provide circuit boards with low transmission loss, but recent developments in communication technology have created a demand for the development of resins with even lower dielectric constants and dielectric tangents.
- Patent Document 1 discloses a compound having an indene ring structure with a vinylbenzyl group introduced therein as a curable vinylbenzyl compound that can be cured to produce a cured product with excellent dielectric properties, high heat resistance, and low water absorption.
- One of the objectives of this disclosure is to provide a curable composition, a prepreg, a metal-clad laminate, a printed wiring board, a semiconductor package, and a molded product that exhibit excellent long-term heat deterioration resistance of the cured product.
- One embodiment relates to a curable composition comprising a compound having a vinylbenzyl group, wherein the curable composition has a thermal history of being heated at 130°C for 10 minutes and has a minimum melt viscosity of 3,000 Pa s or less as measured in the range of 40 to 150°C.
- This disclosure makes it possible to provide curable compositions, prepregs, metal-clad laminates, printed wiring boards, semiconductor packages, and molded products that exhibit excellent long-term heat deterioration resistance in the cured products.
- a numerical range indicated using “to” indicates a range including the numerical values described before and after “to” as the minimum and maximum values, respectively.
- the upper limit or lower limit of a certain numerical range may be replaced with the upper limit or lower limit of another numerical range.
- the upper limit or lower limit of a numerical range described in the present disclosure may be replaced with a value shown in an example.
- each component may contain one or more corresponding substances.
- the content of each component in the curable composition means the total amount of the plurality of substances present in the curable composition, unless otherwise specified.
- the weight average molecular weight (Mw) and number average molecular weight (Mn) are values measured using the following procedure.
- the weight average molecular weight and number average molecular weight are converted from a calibration curve using standard polystyrene by gel permeation chromatography (GPC).
- the calibration curve is approximated by a cubic equation using a set of five standard polystyrene samples (PStQuick MP-H, PStQuick B [product name by Tosoh Corporation]).
- PStQuick MP-H standard polystyrene samples
- HCV-8320GPC High-speed GPC apparatus
- Detector Ultraviolet absorption detector
- UV-8320 product name, Tosoh Corporation
- Guard column TSKgel guardcolumn Super (HZ)-M+
- column TSKgel SuperMultipore HZ-M (2 columns)
- reference column TSKgel SuperH-RC (2 columns) (all product names of Tosoh Corporation)
- Column size 4.6 x 20 mm (guard column), 4.6 x 150 mm (column), 6.0 x 150 mm (reference column)
- Eluent tetrahydrofuran Sample concentration: 10 mg/1 mL Injection volume: 20 ⁇ L or 2 ⁇ L Flow rate: 0.35mL/min Measurement temperature: 40°C
- the curable composition according to one embodiment of the present disclosure is a curable composition that contains a compound having a vinylbenzyl group, and has a minimum melt viscosity of 3,000 Pa ⁇ s or less measured in the range of 40 to 150°C in a curable composition that has a thermal history of being heated at 130°C for 10 minutes.
- a curable composition having such characteristics exhibits the effect of excellent long-term heat deterioration resistance of the cured product.
- the long-term heat deterioration resistance of the cured product refers to the ability to maintain mechanical properties and the like, without deterioration even when the cured product is exposed to high temperature conditions for a long period of time, in applications such as prepregs, fiber-reinforced composite materials, and molding materials, in which the curable composition is impregnated into a fiber substrate or filled into a mold.
- a curable composition containing a compound having a vinylbenzyl group (hereinafter sometimes referred to as "compound A”) is heated at 130°C for 10 minutes, most or all of the volatile components such as the solvent evaporate, and some of the polymerizable groups of the vinylbenzyl group and optional components polymerize, resulting in a so-called B-staged state.
- the minimum melt viscosity measured for this B-staged product is 3,000 Pa ⁇ s or less
- the curable composition has excellent impregnation or wettability into fiber substrates, or excellent filling ability in a mold, and it is possible to obtain a cured product with low gas permeability.
- the thermal oxidative decomposition of the cured product under high temperature conditions is suppressed, and an effect of excellent long-term heat deterioration resistance is obtained.
- the present disclosure also provides a curable composition having excellent long-term heat deterioration resistance of the cured product, and as a secondary effect, provides a method for determining, by a simpler operation, whether or not the composition can be a curable composition having excellent long-term heat resistance of the cured product.
- the minimum melt viscosity in the range of 40 to 150°C of a curable composition having a thermal history of being heated at 130°C for 10 minutes is measured, and a determination based on the value becomes possible, which enables more efficient development compared to conventional evaluation tests in which a cured product is stored under high-temperature conditions for a long period of time.
- the present disclosure provides a method for evaluating a curable composition, in which the long-term heat resistance of a cured product is evaluated based on the value of the minimum melt viscosity measured in the range of 40 to 150°C for a curable composition having a thermal history of being heated at 130°C for 10 minutes.
- the minimum melt viscosity of the curable composition is a value measured for a curable composition having a thermal history of being heated at 130° C. for 10 minutes.
- the method of heating at 130° C. for 10 minutes is not particularly limited, and examples thereof include a method of holding the composition in a thermostatic machine such as an oven.
- the heating temperature setting may have a fluctuation of ⁇ 2° C. in part of the heating process.
- the heating time setting may have an error of ⁇ 10 seconds.
- the state of the curable composition during heating is not particularly limited, and examples of the method include a method of applying the curable composition onto a substrate, a method of putting the curable composition into a container such as a mold or a petri dish, and a method of impregnating a fiber substrate into the shape of a prepreg.
- the substrate include a metal plate, a metal film, a resin plate, and a resin film.
- the fiber substrate include glass cloth and carbon fiber.
- the film thickness when applying the curable composition onto the substrate and the liquid level when putting it into a container are not particularly limited, but in order to dry the coating uniformly and reduce the measurement error of the minimum melt viscosity, a range of 50 to 90 ⁇ m is preferable.
- the minimum melt viscosity can be measured with a measuring device such as a rheometer.
- a measuring device such as a rheometer.
- the curable composition having a thermal history of being heated at 130°C for 10 minutes can be processed into a shape suitable for the measuring device, if necessary, and used.
- the sample shape suitable for the measuring device is tablet-shaped, the curable composition having a thermal history can be crushed once and remolded into tablets for use.
- the minimum melt viscosity is measured in the range of 40 to 150° C.
- the heating rate is preferably in the range of 2 to 3° C./min.
- errors due to the accuracy of the measuring device are permissible.
- the conditions used in the examples are described below.
- Measuring equipment (rheometer) "DHR-20" manufactured by TA Instruments Japan Co., Ltd.
- Temperature range and heating conditions 40 to 150°C, 3°C/min.
- Sample shape tablet shape with a thickness of 1.0 to 1.5 mm (approximately 1.2 mm in the example) and a diameter of 20 mm
- the minimum melt viscosity of the curable composition measured in this manner is 3,000 Pa ⁇ s or less, the cured product has excellent long-term heat deterioration resistance.
- the specific reasons and mechanisms are as described above.
- the minimum melt viscosity is preferably 2,500 Pa ⁇ s or less, more preferably 2,000 Pa ⁇ s or less, and particularly preferably 1,500 Pa ⁇ s or less.
- the minimum melt viscosity may be 800 Pa ⁇ s or more, or may be 1,000 Pa ⁇ s or more.
- the minimum melt viscosity measured in the range of 40 to 150°C for a curable composition having a thermal history of being heated at 130°C for 10 minutes is preferably in the range of 800 to 3,000 Pa ⁇ s, for example.
- the curable composition preferably has a melt viscosity of 5,000 Pa ⁇ s or more at 60°C when the melt viscosity is measured in the range of 40 to 150°C in a curable composition having a thermal history of being heated at 130°C for 10 minutes.
- the melt viscosity at 60°C may be 6,000 Pa ⁇ s or more, or may be 7,000 Pa ⁇ s or more.
- the melt viscosity at 60°C may be 10,000 Pa ⁇ s or less, or may be 9,000 Pa ⁇ s or less.
- the curable composition may have a ratio (V 60 )/(V min ) of the melt viscosity value at 60° C. when the melt viscosity is measured in the range of 40 to 150° C. to the minimum melt viscosity value (V min ) measured in the range of 40 to 150° C. in a curable composition having a thermal history of being heated at 30 ° C. for 10 minutes, in the range of 3 to 10.
- the curable composition includes a compound having a vinylbenzyl group (compound A).
- compound A is one of the excellent materials in terms of excellent dielectric properties and heat resistance in the cured product.
- Compound A may have one or more vinylbenzyl groups.
- Compound A may be used alone or in combination of two or more types.
- compound A examples include a compound represented by the following general formula (1) (hereinafter, this may be referred to as “compound A1”), a prepolymer using compound A1 (hereinafter, this may be referred to as “prepolymer A2”), a compound represented by the following general formula (2-1) (hereinafter, this may be referred to as “compound A3”), a resin containing two or more compounds having different structures among the compounds represented by the following general formula (2-2), including at least one compound in which m is an integer of 1 or more and at least one compound in which n is an integer of 1 or more (hereinafter, this may be referred to as “resin A3”), a compound represented by the following general formula (3) (hereinafter, this may be referred to as “compound A4"), and a vinylbenzyl-modified phenolic resin (hereinafter, this may be referred to as "resin A5"). Note that these are merely some of the specific examples of compound A, and compounds that can be used
- Ar 1 represents an aromatic hydrocarbon structure which may have a substituent, and 1 is an integer of 1 or 2 or more.
- Ar2 represents an aromatic hydrocarbon structure which may have a substituent
- m is an integer of 1 or 2 or more
- Ar3 represents an aryl group other than a styryl group
- n is an integer of 1 or 2 or more.
- Ar2 represents an aromatic hydrocarbon structure which may have a substituent
- m is an integer of 0 or 1 or more
- Ar3 represents an aryl group other than a styryl group
- n is an integer of 0 or 1 or more.
- R 1 is an alkylene group having 1 to 10 carbon atoms
- R 2 is a hydrogen atom or a vinylbenzyl group.
- the vinylbenzyl group contained in compound A1 may be any of o-vinylbenzyl group, m-vinylbenzyl group, and p-vinylbenzyl group. Among these, p-vinylbenzyl group is preferable.
- the proportion of p-vinylbenzyl groups in all vinylbenzyl groups contained in the vinylbenzyl compound may be 10% or more, 20% or more, or 30% or more. It may also be 100% or less, 80% or less, or 70% or less. For example, it may be in the range of 10 to 100%. When the proportion of p-vinylbenzyl groups is less than 100%, the remaining vinylbenzyl groups may be m-vinylbenzyl groups.
- Ar 1 in the general formula (1) is an aromatic hydrocarbon structure which may have a substituent.
- aromatic hydrocarbons include benzene, indene, naphthalene, fluorene, anthracene, phenanthrene, tetracene, chrysene, pyrene, triphenylene, etc.
- benzene, indene, naphthalene, and fluorene are preferred, indene and fluorene are more preferred, and indene is particularly preferred.
- Ar 1 has a substituent
- specific examples thereof include alkyl groups such as methyl, ethyl, n-propyl, isopropyl, n-butyl, sec-butyl, isobutyl, and t-butyl; unsaturated bond-containing groups such as vinyl and allyl; aryl groups such as phenyl, tolyl, xylyl, mesityl, and naphthyl; aryloxy groups such as phenyloxy, tolyloxy, xylyloxy, mesityloxy, and naphthyloxy; aralkyl groups such as benzyl, ⁇ -methylbenzyl, triphenylmethyl, and naphthylmethyl; and aralkyloxy groups such as benzyloxy.
- Ar 1 may not have a substituent.
- l is an integer of 1 or more.
- the preferred number of l varies depending on the type of aromatic hydrocarbon structure represented by Ar 1 , but when Ar 1 is an indene ring structure, l is preferably an integer of 1 to 3.
- examples of compound A1 include compounds represented by the following general formula (4).
- R 3 , R 4 and R 5 are a vinylbenzyl group or a hydrogen atom, and at least one of R 3 , R 4 and R 5 is a vinylbenzyl group.
- compound A1 When a compound represented by general formula (4) is used as compound A1, one type may be used alone, or multiple types of compounds having different numbers of vinylbenzyl groups in one molecule may be used. In the latter case, since the compound has excellent curing properties, the average number of vinylbenzyl groups in one molecule is preferably in the range of 1.0 to 3.0, and more preferably in the range of 1.6 to 2.5.
- Compound A1 is a compound specified by its molecular structure, and its production method is not particularly limited.
- An example of the method for producing compound A1 is a method of reacting an aromatic compound corresponding to the Ar 1 group with a styrene having a halogenated methyl group in the presence of a basic compound.
- Examples of styrenes having a halogenated methyl group include o-chloromethylstyrene, m-chloromethylstyrene, and p-chloromethylstyrene.
- One type of styrene having a halogenated methyl group may be used alone, or two or more types may be used in combination.
- Examples of basic compounds include alkali metal hydroxides and alkali metal alkoxides. One type of basic compound may be used alone, or two or more types may be used in combination.
- phase transfer catalyst may be used in the above reaction.
- phase transfer catalysts include quaternary ammonium salts such as tetra-n-butylammonium chloride, tetra-n-butylammonium bromide (tetra-n-butylammonium bromide), tetraethylammonium chloride, tetraethylammonium bromide, tetrapropylammonium chloride, tetrapropylammonium bromide, benzyltrimethylammonium chloride, benzyltrimethylammonium bromide, benzyltributylammonium chloride, benzyltributylammonium bromide, benzyldimethyltetradecylammonium chloride, tricaprylmethylammonium chloride, tetradecyltrimethylammonium bromide, hexadecyltrimethylammonium bromide, triocty
- the reaction between the aromatic compound corresponding to the Ar 1 group and the styrene having a halogenated methyl group can be carried out by solution polymerization.
- the reaction may be carried out, for example, under heating and stirring conditions. If necessary, a polymerization inhibitor may be added to the reaction system.
- polymerization inhibitor examples include phenothiazine, 3,7-dioctylphenothiazine, 3,7-dicumylphenothiazine, 2,2,6,6-tetramethylpiperidine-1-oxyl, 4-hydroxy-2,2,6,6-tetramethylpiperidine-1-oxyl, 4-benzoyloxy-2,2,6,6-tetramethylpiperidine-1-oxyl, and bis(2,2,6,6-tetramethyl-1-piperidinyloxy-4-yl)sebacate.
- the obtained product may be purified by a known method such as concentration, reprecipitation, or washing.
- the obtained product may be a single compound or a mixture of two or more compounds.
- it may contain a compound in which l in the above general formula (1) is 0, and the mixture may be used as is in the curable composition.
- the average number of vinylbenzyl groups in one molecule in the mixture is preferably in the range of 1.0 to 3.0, and more preferably in the range of 1.6 to 2.5.
- prepolymer used in the present disclosure for the prepolymer (prepolymer A2) using compound A1 refers to a polymer in which some of the polymerizable reactive groups of the monomer, the raw material of the polymer, remain. Therefore, prepolymer A2 has unreacted vinylbenzyl groups derived from compound A1 and exhibits radical polymerization properties.
- Prepolymer A2 may be made by using compound A1 together with other monomers other than compound A1.
- the proportion of compound A1 in the total monomers constituting prepolymer A2 is preferably 50 to 100% by mass, more preferably 80 to 100% by mass, and particularly preferably 90 to 100% by mass.
- the method for producing prepolymer A2 is not particularly limited, and it can be produced by a method in which a monomer containing compound A1 is polymerized by a general method.
- a method in which a monomer containing compound A1 is polymerized by a general method is radical polymerization.
- the polymerization initiator used in the radical polymerization is not particularly limited, and examples thereof include azo-based polymerization initiators and organic peroxide-based polymerization initiators.
- azo-based polymerization initiators include 2,2'-azobis(2,4,4-trimethylpentane), dimethyl 2,2'-azobis(2-methylpropionate), 2,2'-azobis(N-butyl-2-methylpropionamide), 2,2'-azobis[N-(2-propenyl)-2-methylpropionamide], 1,1'-azobis(cyclohexane-1-carbonitrile), and dimethyl
- the azobis(1-cyclohexanecarboxylate examples include 2,2'-azobis(2,4,4-trimethylpentane), dimethyl 2,2'-azobis(2-methylpropionate), 2,2'-azobis(N-butyl-2-methylpropionamide), 2,2'-azobis[N-(2-propenyl)-2-methylpropionamide], 1,1'-azo
- organic peroxide polymerization initiators include dicumyl peroxide, dibenzoyl peroxide, 2-butanone peroxide, tert-butyl perbenzoate, di-tert-butyl peroxide, 2,5-dimethyl-2,5-di(t-butylperoxy)hexane, bis(tert-butylperoxyisopropyl)benzene, and tert-butyl hydroperoxide.
- the radical polymerization initiator may be used alone or in combination of two or more types.
- the amount of radical polymerization initiator used can be adjusted appropriately depending on the desired degree of polymerization, etc., but in order to facilitate reaction control, it is preferable to use a radical polymerization initiator in the range of 0.01 to 5 parts by mass per 100 parts by mass of the total of the monomers, which are the reaction raw materials.
- the polymerization reaction of prepolymer A2 may be carried out in a solvent.
- the solvent examples include toluene and xylene. These may be used alone or in the form of a mixed solvent of two or more types. There are no particular limitations on the amount of solvent used, but a range of 30 to 500 parts by mass per 100 parts by mass of the monomers, which are the raw materials for the reaction, is preferred in terms of making it easier to control the reaction.
- the weight average molecular weight (Mw) of prepolymer A2 is not particularly limited, but is preferably in the range of 50,000 to 400,000, for example, from the viewpoint of ease of production and ease of handling of the curable composition for prepreg.
- the weight average molecular weight (Mw) of prepolymer A2 may be 70,000 or more, 80,000 or more, or 100,000 or more. It may also be 300,000 or less, 250,000 or less, or 200,000 or less.
- the vinylbenzyl group contained in compound A3 and the vinylbenzyl group contained in resin A3 may be any of o-vinylbenzyl group, m-vinylbenzyl group, and p-vinylbenzyl group. Among these, p-vinylbenzyl group is preferred.
- the proportion of p-vinylbenzyl groups in all vinylbenzyl groups contained in the vinylbenzyl compound may be 10 mol% or more, 20 mol% or more, or 30 mol% or more. It may also be 100 mol% or less, 80 mol% or less, or 70 mol% or less. For example, it may be in the range of 10 to 100 mol%. When the proportion of p-vinylbenzyl groups is less than 100 mol%, the remaining vinylbenzyl groups may be m-vinylbenzyl groups.
- Ar3 is an aryl group other than a styryl group.
- the aryl group include a phenyl group, a tolyl group, a xylyl group, a mesityl group, and a naphthyl group.
- Ar2 in the general formula (2-1) and the general formula (2-2) is an aromatic hydrocarbon structure which may have a substituent.
- aromatic hydrocarbons include benzene, indene, naphthalene, fluorene, anthracene, phenanthrene, tetracene, chrysene, pyrene, triphenylene, and the like.
- benzene, indene, naphthalene, and fluorene are preferable, indene and fluorene are more preferable, and indene is particularly preferable.
- Ar2 has a substituent
- specific examples thereof include alkyl groups such as methyl, ethyl, n-propyl, isopropyl, n-butyl, sec-butyl, isobutyl, and t-butyl; unsaturated bond-containing groups such as vinyl and allyl; aryl groups such as phenyl, tolyl, xylyl, mesityl, and naphthyl; and aryloxy groups such as phenyloxy, tolyloxy, xylyloxy, mesityloxy, and naphthyloxy.
- Ar2 may have no substituent.
- m is an integer of 1 or 2 or more
- n is an integer of 1 or 2 or more.
- the preferred numbers of m and n vary depending on the type of aromatic hydrocarbon structure represented by Ar 2 , but when Ar 2 is an indene ring structure, it is preferred that m and n are each an integer of 1 to 3. Furthermore, it is more preferred that the sum of m and n is 2 or 3.
- examples of compound B1 include compounds represented by the following general formula (5-1), and the like.
- R 6 , R 7 and R 8 are either a vinylbenzyl group, an arylmethyl group or a hydrogen atom. At least one of R 6 , R 7 and R 8 is a vinylbenzyl group, and at least one is an arylmethyl group.
- compound A3 When a compound represented by general formula (5-1) is used as compound A3, one type may be used alone, or multiple types of compounds with different molecular structures may be used.
- m is 0 or an integer of 1 or more
- n is 0 or an integer of 1 or more.
- the preferred numbers of m and n vary depending on the type of aromatic hydrocarbon structure represented by Ar 2 , but when Ar 2 is an indene ring structure, it is preferable that m and n are each 0 or an integer of 1 to 3. Furthermore, the average value of the sum of m and n is more preferably in the range of 1.5 to 3.
- the resin A3 may be, for example, a resin containing two or more compounds having different structures among the compounds represented by the following general formula (5-2), in which at least one of R 6 , R 7 and R 8 present in the resin is a vinylbenzyl group, and at least one of R 6 , R 7 and R 8 present in the resin is an arylmethyl group other than a vinylbenzyl group.
- R 6 , R 7 and R 8 are either a vinylbenzyl group, an arylmethyl group or a hydrogen atom. At least one of R 6 , R 7 and R 8 present in the resin is a vinylbenzyl group, and at least one of R 6 , R 7 and R 8 present in the resin is an arylmethyl group other than a vinylbenzyl group.
- Resin A3 may include at least one of the following : a compound in which one of R 6 , R 7 and R 8 is a vinylbenzyl group, one is an arylmethyl group, and one is a hydrogen atom; a compound in which two of R 6 , R 7 and R 8 are vinylbenzyl groups and one is an arylmethyl group; a compound in which one of R 6 , R 7 and R 8 is a vinylbenzyl group and two are arylmethyl groups; a compound in which one to three of R 6 , R 7 and R 8 are vinylbenzyl groups and the others are hydrogen atoms; a compound in which one to three of R 6 , R 7 and R 8 are arylmethyl groups and the others are hydrogen atoms; and a compound in which R 6 , R 7 and R 8 are all hydrogen atoms.
- the arylmethyl groups may all be different, or some or all may be the same.
- Compound A3 and resin A3 are compounds that are specified by their molecular structures, and their manufacturing methods are not particularly limited.
- One example of a method for manufacturing compound A3 or resin A3 is, for example, a method in which an aromatic compound corresponding to Ar2 group, styrene having a halogenated methyl group, and an aromatic compound having a halogenated methyl group corresponding to Ar3 group are reacted in the presence of a basic compound.
- the details of the reaction conditions are the same as those described as the manufacturing method of compound A1.
- Examples of styrenes having a halogenated methyl group include o-chloromethylstyrene, m-chloromethylstyrene, and p-chloromethylstyrene.
- the styrenes having a halogenated methyl group may be used alone or in combination of two or more.
- Examples of aromatic compounds having a halogenated methyl group corresponding to the Ar 3 group include ⁇ -chlorotoluene and ⁇ -chloro-p-xylene.
- the aromatic compounds having a halogenated methyl group may be used alone or in combination of two or more.
- Examples of basic compounds include alkali metal hydroxides and alkali metal alkoxides. The basic compounds may be used alone or in combination of two or more.
- the obtained product may be a single compound or a mixture of two or more compounds.
- it may contain a compound in which either one or both of m and n in the above general formula (2-1) are 0, and the mixture may be used as it is in the curable composition.
- the reaction product may be purified, if necessary, by known methods such as concentration, reprecipitation, washing, etc.
- the vinylbenzyl group in compound B4 may be any of o-vinylbenzyl, m-vinylbenzyl, and p-vinylbenzyl groups. Among these, p-vinylbenzyl groups are preferred.
- the proportion of p-vinylbenzyl groups in all vinylbenzyl groups in the vinylbenzyl compound may be 10% or more, 20% or more, or 30% or more. It may also be 100% or less, 80% or less, or 70% or less. For example, it may be in the range of 10 to 100%. When the proportion of p-vinylbenzyl groups is less than 100%, the remaining vinylbenzyl groups may be m-vinylbenzyl groups.
- R 1 is an alkylene group having 1 to 10 carbon atoms.
- the alkylene group include a methylene group, a 1,2-dimethylene group, a 1,3-trimethylene group, a 1,4-tetramethylene group, a 1,5-pentamethylene group, and a 1,6-hexamethylene group.
- resin A5 is specifically a resin in which the phenolic hydroxyl groups of various phenolic hydroxyl group-containing resins have been vinylbenzyl-etherified.
- the vinylbenzyl group in resin B5 may be any of o-vinylbenzyl, m-vinylbenzyl, and p-vinylbenzyl groups. Among these, p-vinylbenzyl groups are preferred.
- the proportion of p-vinylbenzyl groups in the total vinylbenzyl groups in the vinylbenzyl compound may be 10 mol% or more, 20 mol% or more, or 30 mol% or more.
- the remaining vinylbenzyl groups may be m-vinylbenzyl groups.
- the weight average molecular weight (Mw) of Resin A5 is not particularly limited, but from the viewpoint of ease of handling, it is preferably 300 or more, more preferably 500 or more, and particularly preferably 1,000 or more. It is also preferably 50,000 or less, more preferably 30,000 or less, and particularly preferably 10,000.
- the weight average molecular weight (Mw) of Resin A5 may be, for example, in the range of 300 to 50,000.
- resin A5 examples include those represented by the following general formula (6):
- each Z is independently a divalent hydrocarbon group.
- p is an integer of 1 or more.
- Z in general formula (6) is independently a divalent hydrocarbon group.
- divalent hydrocarbon groups include alkylene groups having 1 to 5 carbon atoms, alkylidene groups having 2 to 5 carbon atoms, divalent alicyclic hydrocarbon groups having 5 to 12 carbon atoms, arylene groups having 6 to 12 carbon atoms, and divalent groups combining these.
- alkylene groups having 1 to 5 carbon atoms include methylene, 1,2-dimethylene, 1,3-trimethylene, 1,4-tetramethylene, and 1,5-pentamethylene.
- alkylidene groups having 2 to 5 carbon atoms include ethylidene, propylidene, isopropylidene, butylidene, isobutylidene, pentylidene, and isopentylidene.
- divalent alicyclic hydrocarbon groups having 5 to 12 carbon atoms include divalent groups that are generated by removing two hydrogen atoms bonded to two different carbon atoms from alicyclic hydrocarbon compounds such as norbornane, decalin, bicycloundecane, and saturated dicyclopentadiene.
- arylene groups having 6 to 12 carbon atoms include phenylene groups, naphthylene groups, and biphenylene groups.
- Z is preferably a divalent group resulting from the loss of two hydrogen atoms bonded to two different carbon atoms in a saturated dicyclopentadiene, or a group combining an alkylene group having 1 to 5 carbon atoms and an arylene group having 6 to 12 carbon atoms.
- An example of a group combining an alkylene group having 1 to 5 carbon atoms and an arylene group having 6 to 12 carbon atoms is the group represented by the following general formula (7).
- R 9 is independently an alkylene group having 1 to 5 carbon atoms.
- Ar 4 is an arylene group having 6 to 12 carbon atoms.
- a methylene group is preferable.
- arylene groups having 6 to 12 carbon atoms represented by Ar 4 a phenylene group or a biphenylene group is preferable.
- the phenylene group is preferably a 1,4-phenylene group
- the biphenylene group is preferably a 4,4'-biphenylene group.
- p is an integer of 1 or more. p may be an integer from 1 to 50, an integer from 1 to 30, or an integer from 1 to 20.
- Resin A5 may be produced by any method, and the method of production is not particularly limited. As an example, it can be produced by reacting a base phenolic resin with a vinyl benzylating agent such as chloromethylstyrene in the presence of a basic compound. The details of the reaction conditions are the same as those described as the method of producing compound A1.
- prepolymer A2 is preferred because it produces a curable composition that exhibits excellent long-term heat deterioration resistance in the cured product.
- the ratio of prepolymer A2 to the total compound A may be 30% by mass or more, 50% by mass or more, or 80% by mass or more. It may also be 100% by mass or less, 90% by mass or less, or 80% by mass or less.
- the curable composition may contain a compound having a radical polymerizable group other than compound A (hereinafter, this may be referred to as "compound B").
- compound B include a compound having a maleimide group, a polyphenylene ether compound having a radical polymerizable group, styrene, divinylbenzene, triallyl isocyanurate, etc.
- Examples of compounds having a maleimide group include compounds having one or more N-substituted maleimide groups and derivatives thereof. Compounds having a maleimide group may be used alone or in combination of two or more types.
- Examples of compounds having one or more N-substituted maleimide groups include aromatic maleimide compounds, which are compounds having an N-substituted maleimide group directly bonded to an aromatic ring; aromatic bismaleimide compounds, which are compounds having two N-substituted maleimide groups directly bonded to an aromatic ring; aromatic polymaleimide compounds, which are compounds having three or more N-substituted maleimide groups directly bonded to an aromatic ring; and aliphatic maleimide compounds, which are compounds having an N-substituted maleimide group directly bonded to an aliphatic hydrocarbon.
- compounds having one or more N-substituted maleimide groups include N,N'-ethylene bismaleimide, N,N'-hexamethylene bismaleimide, N,N'-(1,3-phenylene) bismaleimide, N,N'-[1,3-(2-methylphenylene)] bismaleimide, N,N'-[1,3-(4-methylphenylene)] bismaleimide, N,N'-(1,4-phenylene) bismaleimide, bis(4-maleimidophenyl)methane, bis(3-methyl-4-maleimidophenyl)methane, and bis(4-maleimidophenyl)methane.
- An example of a derivative of a compound having one or more N-substituted maleimide groups is an aminomaleimide compound that contains a structural unit derived from the compound having one or more N-substituted maleimide groups described above and a structural unit derived from a diamine compound.
- the total proportion of compound A in all compounds having a radical polymerizable group in the curable composition may be 50% by mass or more, 70% by mass or more, or 80% by mass or more. It may also be 100% by mass or less, 90% by mass or less, or 70% by mass or less.
- the curable composition may contain other components in addition to compounds A and B, as necessary.
- other components include thermosetting compounds other than compounds A and B, elastomers, compounds having a phenolic hydroxyl group (excluding those having a radically polymerizable group), fillers, curing accelerators, flame retardants, heat stabilizers, antistatic agents, UV absorbers, pigments, colorants, lubricants, solvents, etc.
- Each of the other components may be used alone or in combination of two or more types.
- thermosetting compounds include, for example, epoxy resins, phenolic resins, cyanate resins, benzoxazine resins, oxetane resins, amino resins, silicone resins, triazine resins, and melamine resins.
- the ratio of compound A to the total mass of the curable components in the curable composition may be 30 mass% or more, 50 mass% or more, or 80 mass% or more. It may also be 100 mass% or less, 90 mass% or less, or 80 mass% or less.
- the ratio of compound B to the total mass of the curable components in the curable composition may be, for example, in the range of 30 to 100 mass%.
- the curable components in the curable composition more specifically refer to compounds A, B, and other thermosetting compounds.
- elastomer examples include polyether-based elastomers, styrene-based elastomers, conjugated diene-based elastomers, urethane-based elastomers, polyester-based elastomers, polyamide-based elastomers, acrylic-based elastomers, and silicone-based elastomers.
- One type of elastomer may be used alone, or two or more types may be used in combination.
- the weight average molecular weight (Mw) of the elastomer is not particularly limited, and may be, for example, 100,000 or less, 60,000 or less, or 30,000 or less. It may also be 1,000 or more, 3,000 or more, or 5,000 or more.
- the weight average molecular weight (Mw) of the elastomer may be, for example, in the range of 1,000 to 100,000.
- styrene-based elastomers include copolymers of styrene and other polymerizable compounds.
- examples of other polymerizable compounds that can be copolymerized with styrene include ⁇ -olefin compounds, cyclic olefin compounds, aromatic monovinyl compounds other than styrene, and polyvinyl compounds.
- the other polymerizable compounds that can be copolymerized with styrene may be used alone or in combination of two or more types.
- Examples of the ⁇ -olefin compounds include those having 2 to 20 carbon atoms, such as ethylene, propylene, 1-butene, 1-hexene, 1-octene, 1-decane, 1-dodecane, 4-methyl-1-pentene, and 3,5,5-trimethyl-1-hexene.
- Examples of the cyclic olefin compounds include norbornene and cyclopentene.
- Examples of the aromatic vinyl compounds include alkylstyrenes such as methylstyrene and isobutylstyrene, vinylnaphthalene, and vinylanthracene.
- polyvinyl compounds examples include divinylbenzene, divinylnaphthalene, divinylanthracene, divinylbiphenyl, and alkylenebisstyrenes such as ethylenebisstyrene.
- the elastomer may be a styrene- ⁇ -olefin compound-polyvinyl compound copolymer.
- the ratio of styrene to the total mass of the copolymerization components may be in the range of 30 to 70 mass%.
- the ratio of the ⁇ -olefin compound to the total mass of the copolymerization components may be in the range of 10 to 70 mass%.
- the ratio of the polyvinyl compound to the total mass of the copolymerization components may be in the range of 0.05 to 10 mass% from the viewpoint of the balance between the performance as an elastomer and the heat resistance of the cured product of the resin composition.
- the content of the styrene structural unit of the styrene- ⁇ -olefin compound-polyvinyl compound copolymer may be 30 to 70 mass%.
- the content of the ⁇ -olefin compound structural unit may be in the range of 10 to 70 mass%.
- the content of the polyvinyl compound structural unit may be in the range of 0.05 to 10 mass%.
- the content of the elastomer may be 1 part by mass or more, 5 parts by mass or more, or 10 parts by mass or more per 100 parts by mass of the total of the curable components and elastomer of the curable composition. It may also be 80 parts by mass or less, 50 parts by mass or less, or 30 parts by mass or less.
- the compound having a phenolic hydroxyl group (hereinafter sometimes referred to as "compound C”) is not particularly limited in its specific structure, but by adding a compound in which the ortho position of the phenolic hydroxyl group is a hydrogen atom to the curable composition, the effect of excellent long-term heat deterioration resistance of the cured product becomes more pronounced.
- compound C acts as a mild radical scavenger that does not inhibit the curing of the curable composition, thereby delaying the increase in melt viscosity in the B-stage product, and as a result, the effect of excellent long-term heat deterioration resistance is obtained through the mechanism described above.
- Compound C may be used alone or in combination of two or more types.
- the number of phenolic hydroxyl groups in one molecule of compound C may be either 1 or 2 or more. Of these, 1 or 2 is preferred, and 1 is more preferred, as this provides superior long-term heat deterioration resistance in the cured product.
- Compound C is preferably a compound having a molecular weight of 500 or less, since it has excellent solvent solubility, etc.
- the molecular weight of compound C may be 140 or more, 150 or more, or 170 or more. It may also be 450 or less, or 400 or less.
- the aromatic ring to which the phenolic hydroxyl group is bonded is not particularly limited, and may be an aromatic hydrocarbon or a heteroaromatic ring.
- aromatic hydrocarbons such as benzene, indene, naphthalene, fluorene, anthracene, phenanthrene, tetracene, chrysene, pyrene, and triphenylene
- heteroaromatic rings such as furan, thiophene, pyrrole, pyrazole, imidazole, pyridine, pyridazine, pyrimidine, and pyrazine.
- Compound C may also be a compound containing multiple aromatic rings, and specifically may be a compound containing two or more benzene, naphthalene, or a combination thereof.
- compound C include compounds represented by any of the following general formulas (8) to (12).
- [X in general formulas (8) to (12) represents a monovalent organic group other than a hydroxyl group, or a hydrogen atom. Multiple Xs in the formula may all be the same, or some or all of them may be different.
- Y in general formulas (10) to (12) represents a direct bond or a divalent organic group. In general formulas (11) and (12), Y may be bonded to any carbon atom forming a naphthalene ring.
- X in formulas (8) to (12) is a monovalent organic group other than a hydroxyl group or a hydrogen atom.
- monovalent organic groups other than a hydroxyl group include, for example, halogen atoms such as fluorine, chlorine, bromine, and iodine atoms, carboxy groups, aliphatic hydrocarbon groups (including those in which two Xs bonded to adjacent carbon atoms form an alicyclic structure), aliphatic hydrocarbon groups in which one or more carbon atoms are replaced by oxygen atoms, aliphatic hydrocarbon groups in which one or more carbon atoms are replaced by carbonyl groups, aryl groups, aryloxy groups, aralkyl groups, and aralkyloxy groups.
- the aliphatic hydrocarbon group may have any structure, such as a straight chain, a branched structure, or an alicyclic structure.
- the number of carbon atoms in the aliphatic hydrocarbon group is not particularly limited, and may be, for example, 1 or more and 8 or less.
- aliphatic hydrocarbon groups include alkyl groups such as methyl, ethyl, n-propyl, isopropyl, n-butyl, sec-butyl, isobutyl, t-butyl, n-pentyl, neopentyl, 1-methylbutyl, 3-methylbutyl, 1,1-dimethylpropyl, n-hexyl, isohexyl, n-heptyl, n-octyl, 2-ethylhexyl, and 1,1,3,3-tetramethylbutyl; alicyclic alkyl groups such as cyclohexyl; and alicyclic structures formed by two Xs bonded to adjacent carbon atoms, such as 5,6,7,8-tetrahydro-2-naphthol.
- Examples of aliphatic hydrocarbon groups in which one or more carbon atoms have been replaced with oxygen atoms include alkoxy groups such as methoxy and ethoxy groups; alkyloxyalkylene groups such as methoxymethyl groups; and structures containing multiple oxygen atoms such as methoxymethoxy groups.
- Examples of aliphatic hydrocarbon groups in which one or more carbon atoms have been replaced with a carbonyl group include acyl groups and 3-oxobutyl groups.
- aryl groups include phenyl, tolyl, xylyl, mesityl, and naphthyl groups.
- aryloxy groups include phenyloxy, tolyloxy, xylyloxy, mesityloxy, and naphthyloxy groups.
- aralkyl groups include benzyl groups, ⁇ -methylbenzyl groups, triphenylmethyl groups, naphthylmethyl groups, etc.
- aralkyloxy groups include benzyloxy groups, etc.
- the number of monovalent organic groups among the Xs present in the formula may be 0, 1 or 2, or may be 0 or 1.
- the number of monovalent organic groups among the Xs present on each aromatic ring may be 0, 1 or 2, or may be 0 or 1.
- the monovalent organic group may be any one of a carboxy group, an alkyl group, and an aryl group.
- compound A is a compound having a carboxy group
- the curable composition may have excellent long-term heat resistance of the cured product as well as excellent adhesion to metal foils such as copper foil.
- the monovalent organic group is an aryl group
- the curable composition may have even more excellent long-term heat resistance of the cured product.
- Y in the general formulas (10) to (12) is a direct bond or a divalent organic group.
- divalent organic groups include ether bonds; alkylene groups having 1 to 6 carbon atoms, such as a methylene group or an isopropylidene group; cycloalkylene groups, such as a cyclohexylene group; arylene groups, such as a phenylene group or a naphthylene group; and structural moieties represented by -O-Ar-O- (Ar represents an arylene group).
- Y in the general formulas (10) to (12) may be a direct bond.
- Compound C preferably contains a compound represented by general formula (8) or (9) because of its excellent solvent solubility.
- the total proportion of the compounds represented by general formula (8) or (9) in the entire compound C may be 50% by mass or more, 70% by mass or more, or 80% by mass or more. It may also be 100% by mass or less, 90% by mass or less, or 70% by mass or less.
- the amount of compound C added is such that the curable composition has excellent long-term heat deterioration resistance of the cured product as well as excellent curability and dielectric properties of the cured product, and therefore the ratio of compound C to the total mass of compounds having radical polymerizable groups is preferably 0.5 mass% or more, more preferably 1 mass% or more, and particularly preferably 1.5 mass% or more. Also, it is preferably 10 mass% or less, more preferably 8 mass% or less, and particularly preferably 6 mass% or less.
- the ratio of compound C to the total mass of compounds having radical polymerizable groups may be, for example, in the range of 0.5 to 10 mass%, may be in the range of 1 to 8 mass%, or may be in the range of 1.5 to 6 mass%.
- the amount of compound C added is preferably 0.5 mass% or more, more preferably 1 mass% or more, and particularly preferably 1.5 mass% or more, based on 100 mass parts in total of the curable components and elastomer in the curable composition. Also, it is preferably 10 mass% or less, more preferably 8 mass% or less, and particularly preferably 6 mass% or less.
- the ratio of compound C in the curable composition to 100 mass parts in total of the curable components and elastomer of the curable composition may be, for example, in the range of 0.5 to 10 mass%, may be in the range of 1 to 8 mass%, or may be in the range of 1.5 to 6 mass%.
- the filler can be either an organic filler or an inorganic filler, but is preferably an inorganic filler.
- inorganic fillers include silica (SiO 2 ), alumina (Al 2 O 3 ), titanium oxide, barium titanate, strontium titanate, potassium titanate, calcium titanate, aluminum carbonate, magnesium hydroxide, aluminum hydroxide, aluminum silicate, calcium carbonate, calcium silicate, magnesium silicate, silicon nitride, boron nitride, aluminum borate, silicon carbide, mica, beryllia, clay, and talc. From the viewpoint of dielectric properties, silica is preferred.
- the shape and size of the filler are not particularly limited.
- the average particle size of the filler may be, for example, 0.01 to 20 ⁇ m, or 0.1 to 10 ⁇ m.
- the average particle size of the filler is the particle size at the point corresponding to an accumulated value of 50% in the volume-based particle distribution measured by the laser diffraction scattering method.
- the amount of filler added is preferably adjusted so that the proportion of inorganic filler in 100 parts by mass of the curable composition after heating at 130°C for 10 minutes is in the range of 50 to 85% by mass.
- the amount of filler added to the curable composition may be in the range of 100 to 500 parts by mass per 100 parts by mass of the total of the curable components and elastomer of the curable composition.
- the curing accelerator may be, for example, a radical polymerization initiator.
- the radical polymerization initiator may be a thermal radical polymerization initiator or a photoradical polymerization initiator, but a thermal radical polymerization initiator is preferred.
- the radical polymerization initiator is not particularly limited, and examples thereof include azo-based polymerization initiators and organic peroxide-based polymerization initiators.
- azo-based polymerization initiators examples include 2,2'-azobis(2,4,4-trimethylpentane), dimethyl 2,2'-azobis(2-methylpropionate), 2,2'-azobis(N-butyl-2-methylpropionamide), 2,2'-azobis[N-(2-propenyl)-2-methylpropionamide], 1,1'-azobis(cyclohexane-1-carbonitrile), and dimethyl 1,1'-azobis(1-cyclohexanecarboxylate).
- organic peroxide polymerization initiators include dicumyl peroxide, dibenzoyl peroxide, 2-butanone peroxide, tert-butyl perbenzoate, di-tert-butyl peroxide, 2,5-dimethyl-2,5-di(t-butylperoxy)hexane, ⁇ , ⁇ '-di(t-butylperoxy)diisopropylbenzene, and tert-butyl hydroperoxide.
- the amount of the curing accelerator added may be in the range of 0.01 to 5 parts by mass per 100 parts by mass of the total of the curable components of the curable composition and the elastomer in the curable composition.
- the curable composition may be solvent-free or may contain a solvent.
- the solvent can adjust the viscosity of the curable composition to further improve the coatability.
- the solvent is preferably an organic solvent.
- organic solvents examples include alcohol-based solvents such as ethanol, propanol, butanol, methyl cellosolve, ethylene glycol monobutyl ether, and propylene glycol monomethyl ether; ketone-based solvents such as acetone, methyl ethyl ketone, methyl isobutyl ketone, and cyclohexanone; ether-based solvents such as tetrahydrofuran; aromatic hydrocarbon-based solvents such as toluene, xylene, and mesitylene; nitrogen-containing solvents such as dimethylformamide, dimethylacetamide, and N-methylpyrrolidone; sulfur-containing solvents such as dimethylsulfoxide; and ester-based solvents such as ⁇ -butyrolactone.
- alcohol-based solvents such as ethanol, propanol, butanol, methyl cellosolve, ethylene glycol monobutyl ether, and propylene glycol monomethyl ether
- the solid content of the curable composition is adjusted appropriately depending on the type of compound A and whether or not other compounds are contained.
- the ratio of the solid content to the total mass of the curable composition may be in the range of 30 to 95 mass %.
- the solid content of the curable composition refers to the components other than the solvent in the curable composition.
- the method for producing the curable composition is not particularly limited.
- One example of a method for producing the curable composition is a method in which compound A and any optional components used as needed are added and mixed. More specifically, for example, compound A and any optional components used as needed can be dissolved or dispersed in a solvent and mixed to obtain a curable composition.
- the mixing order, temperature, time, and other conditions for each component are not particularly limited, and may be appropriately adjusted depending on the type of raw material, production scale, production equipment, etc.
- a prepreg including a curable composition or a semi-cured product of the curable composition can be provided.
- the prepreg can be formed, for example, by using the curable composition and a fiber substrate.
- the curable composition can be the above-mentioned curable composition. Details of the curable composition are as described above.
- the prepreg contains the above-mentioned curable composition or a semi-cured product of the above-mentioned curable composition.
- the semi-cured product can be considered to be in the B-stage state in JIS K 6800 (1985) as one indicator of the semi-cured product.
- the prepreg may contain, for example, the curable composition or a semi-cured product of the curable composition and a fiber substrate such as a sheet-like fiber substrate.
- the curable composition may be in an uncured state, but the curable composition may be in a partially or entirely semi-cured state.
- the prepreg can be obtained, for example, by coating a fiber substrate with a curable composition and drying it.
- the prepreg can be obtained by impregnating and coating a fiber substrate with a curable composition and drying the fiber substrate impregnated with the curable composition. Drying is preferably performed at a temperature at which volatile components such as a solvent that may be contained in the curable composition are removed or higher, and may be performed at a temperature at which the thermosetting resin contained in the curable composition is semi-cured or higher depending on the application. In addition, drying is preferably adjusted so that the thermosetting resin contained in the curable composition is not completely cured. From this perspective, the drying temperature may be, for example, 80 to 200°C, and the drying time may be, for example, 1 to 30 minutes depending on the drying temperature, the drying device, and its scale.
- the fiber substrate may be any of woven fabric, knitted fabric, and nonwoven fabric.
- the fiber substrate may be provided in the form of chopped strand mat, roving, etc.
- the fiber material may be any of inorganic fibers and organic fibers.
- inorganic fibers include glass fibers and carbon fibers.
- glass fibers include E glass, NE glass, D glass, S glass, Q glass, etc.
- organic fibers include polyimide, polyester, tetrafluoroethylene, etc.
- the fiber substrate may be one of these fibers alone or two or more of these fibers in combination. From the viewpoints of dielectric properties and heat resistance, the material of the fiber substrate is preferably inorganic fiber, and more preferably glass fiber.
- the fiber substrate may be selected appropriately depending on the application of the prepreg, but a sheet-like fiber substrate is preferred.
- the sheet-like fiber substrate may be, for example, any of the various sheet-like fiber substrates used in known laminates for electrical insulating materials.
- the thickness of the sheet-like fiber substrate is not particularly limited, but is preferably, for example, 0.01 to 0.1 mm. Here, the thickness is determined by measuring the thickness at five points at equal distances over the entire surface of the sheet-like fiber substrate, and taking the arithmetic average value of the five points.
- a metal-clad laminate including a cured prepreg and a metal foil can be provided.
- the details of the curable composition and the prepreg are as described above.
- one index of the cured product is the C-stage state in JIS K 6800 (1985).
- the metal-clad laminate preferably includes a prepreg layer and metal foil disposed on at least one surface of the prepreg layer.
- the prepreg layer is a cured product of the prepreg described above.
- metal foil is disposed on at least one surface of the cured product of the prepreg, and more preferably, metal foil is disposed on both surfaces of the cured product of the prepreg.
- the metal-clad laminate may be manufactured by disposing metal foil on at least one surface of a single sheet-like prepreg, or may be manufactured by laminating two or more sheet-like prepregs and disposing metal foil on at least one surface of the outermost surface of the laminate.
- the metal-clad laminate may be manufactured by laminating two or more sheet-like prepregs and disposing metal foil on both surfaces of the laminate.
- two or more sheet-like prepregs are laminated to obtain a laminate.
- the two or more sheet-like prepregs may be identical to each other, or some or all of them may be different.
- at least one of the two or more sheet-like prepregs may be obtained using the curable composition for prepregs according to one embodiment.
- a metal foil is placed on at least one surface of this laminate.
- the laminate on which the metal foil is placed is heated and pressurized. This advances the curing reaction of the sheet-like prepreg, and a cured prepreg can be obtained.
- adjacent sheet-like prepregs can be fixed to each other.
- the heating and pressurizing conditions are not particularly limited, but may be, for example, a temperature of 100 to 300°C, a time of 10 to 300 minutes, and a pressure of 0.5 to 50 MPa.
- reheating may be performed to further advance the curing of the prepreg. In this case, the reheating temperature may be 100 to 300°C.
- a method for applying pressure for example, an autoclave molding machine, a multi-stage press machine, a multi-stage vacuum press machine, a continuous molding machine, etc. can be used.
- the metal of the metal foil is not particularly limited, and examples include copper, nickel, aluminum, gold, silver, platinum, molybdenum, ruthenium, tungsten, iron, titanium, chromium, and alloys containing two or more of these metal elements. Industrially, it is preferable to use the single metals copper, nickel, and aluminum. By using copper as the metal foil, it is possible to provide a copper-clad laminate.
- a printed wiring board including a cured product of a prepreg can be provided.
- the printed wiring board can be manufactured using a prepreg, a metal-clad laminate, or a combination thereof.
- a printed wiring board can be provided by forming wiring using a metal-clad laminate by a known method. The details of the prepreg and the metal-clad laminate are as described above.
- the printed wiring board may be either a single-layer printed wiring board or a multilayer printed wiring board.
- a semiconductor package including a printed wiring board and a semiconductor element can be provided. More specifically, for example, a semiconductor package including a printed wiring board including a cured product of a prepreg and a semiconductor element can be provided.
- the semiconductor package can be manufactured, for example, by mounting a semiconductor element, a memory, and the like on a printed wiring board by a known method.
- a curable composition containing a compound having a vinylbenzyl group wherein the curable composition has a thermal history of being heated at 130°C for 10 minutes and has a minimum melt viscosity of 3,000 Pa s or less as measured in the range of 40 to 150°C.
- ⁇ 2> The curable composition described in ⁇ 1> above, in which the melt viscosity at 60°C is 5,000 Pa ⁇ s or more when the curable composition has a thermal history of being heated at 130°C for 10 minutes and is measured in the range of 40 to 150°C.
- ⁇ 4> The curable composition according to any one of ⁇ 1> to ⁇ 3>, containing a resin having a weight average molecular weight (Mw) in the range of 50,000 to 400,000 as the compound having a vinylbenzyl group.
- Mw weight average molecular weight
- ⁇ 5> The curable composition according to any one of ⁇ 1> to ⁇ 4>, which contains an inorganic filler and has a ratio of 50 to 85 mass% in 100 parts by mass of the curable composition after heating at 130°C for 10 minutes.
- a prepreg comprising the curable composition described in any one of ⁇ 1> to ⁇ 5> or a semi-cured product of the curable composition.
- a metal-clad laminate comprising the cured prepreg described in ⁇ 6> and a metal foil.
- a printed wiring board comprising the cured product of the prepreg described in ⁇ 6>.
- a semiconductor package comprising the printed wiring board described in ⁇ 8> and a semiconductor element.
- a molded article comprising a cured product of the curable composition described in any one of ⁇ 1> to ⁇ 5>.
- Measurement method of weight average molecular weight (Mw) and number average molecular weight (Mn) The weight average molecular weight and number average molecular weight were calculated from a calibration curve using standard polystyrene by gel permeation chromatography (GPC). The calibration curve was approximated by a third order equation using a set of five standard polystyrene samples (PStQuick MP-H, PStQuick B [product name, Tosoh Corporation]). The GPC conditions are shown below.
- HCV-8320GPC High-speed GPC apparatus
- Detector Ultraviolet absorption detector
- UV-8320 product name, Tosoh Corporation
- Guard column TSKgel guardcolumn Super (HZ)-M+
- column TSKgel SuperMultipore HZ-M (2 columns)
- reference column TSKgel SuperH-RC (2 columns) (all product names of Tosoh Corporation)
- Column size 4.6 x 20 mm (guard column), 4.6 x 150 mm (column), 6.0 x 150 mm (reference column)
- Eluent tetrahydrofuran Sample concentration: 10 mg/1 mL Injection volume: 20 ⁇ L or 2 ⁇ L Flow rate: 0.35mL/min Measurement temperature: 40°C
- CMS-P Chloromethylstyrene
- AGC Seimi Chemical Co., Ltd. a mixture of m- and p-isomers, with m-isomer content of approximately 50% by mass and p-isomer content of approximately 50% by mass.
- the obtained compound having a vinylbenzyl group was analyzed by 1 H-NMR, and a structure having a vinylbenzyl group directly bonded to the carbon atom at the 1st position, 3rd position, or a combination thereof of indene was confirmed. Furthermore, gel permeation chromatography (GPC) analysis revealed that the compound was a mixture of a compound having two vinylbenzyl groups and a compound having three vinylbenzyl groups. It was confirmed that the compound having three vinylbenzyl groups had two vinylbenzyl groups directly bonded to the carbon atom at the 1st position of the indene ring and one vinylbenzyl group directly bonded to the carbon atom at the 3rd position.
- the weight average molecular weight (Mw) of the vinylbenzyl monomer was 500. The weight average molecular weight (Mw) was measured by the above method.
- Production Example 2 Production of a prepolymer using a compound having a vinylbenzyl group
- the compound having a vinylbenzyl group obtained above was mixed with toluene to a solid content of 60% by mass.
- 4000 parts by mass of a toluene solution of a compound having a vinylbenzyl group (solid content 60% by mass) and 24 parts by mass of an azo-based polymerization initiator (*2) were placed in a separable flask and stirred at 200 rpm for 1 minute. Then, the mixture was heated at 110°C ⁇ 10°C while flowing nitrogen at 400 ml/min.
- the weight average molecular weight (Mw) of the reaction product was monitored, and when it reached about 150,000, heating was stopped and the mixture was cooled to obtain a toluene solution of a resin having a vinylbenzyl group.
- the weight average molecular weight (Mw) of the resin was 147,000.
- the weight average molecular weight (Mw) was measured by the above method.
- Examples 1 to 3 and Comparative Example 1 Production and Evaluation of Curable Compositions Each component was blended according to the blending amounts shown in Table 1, and stirred and mixed at 25°C to prepare a curable composition having a solid content concentration of about 75% by mass. The solid content concentration was adjusted by adding toluene. When the blending amounts in Table 1 are in the form of a solution, they refer to mass % converted into solid content. The obtained curable composition was subjected to various evaluation tests according to the following procedures. The results are shown in Table 1.
- Elastomer styrene-ethylene-butylene copolymer, number average molecular weight (Mn) about 10,000
- Inorganic filler Silica having an average particle size of 2.4 ⁇ m and silica having an average particle size of 1.0 ⁇ m mixed in a mass ratio of 8:2.
- Curing accelerator "Perbutyl P" manufactured by NOF Corporation, ⁇ , ⁇ '-di(t-butylperoxy)diisopropylbenzene
- a prepreg was obtained by impregnating and coating a 30 ⁇ m-thick glass cloth (manufactured by Asahi Kasei Corporation) with the curable composition and drying it by heating at 130° C. for 10 minutes.
- the content of solids derived from the curable composition in the prepreg was about 80% by mass.
- melt viscosity of the melt viscosity measurement sample obtained above was measured under the following conditions to obtain the melt viscosity at 60° C. (V 60 ) and the minimum melt viscosity (V min ).
- Copper etching solution 10% by weight ammonium persulfate solution (manufactured by Mitsubishi Gas Chemical Co., Ltd.)
- the double-sided copper-clad laminate obtained above was immersed in the copper etching solution described above (*3), and the copper foil was removed leaving a 3 mm wide band portion to prepare multiple test pieces.
- the test pieces were aged in a thermostatic chamber at 200°C to prepare test pieces with an aging time of 1000 hours.
- the band portion was peeled off in a 90° direction at a speed of 50 mm/min using a tensile tester (Shimadzu Corporation's "EZ Test") to measure the copper foil peel strength.
- the ratio (%) of the measured value of the aged test piece to the measured value of the unaged test piece was calculated and evaluated according to the following criteria.
- B 40% or more
- less than 60% C Less than 40%
- the double-sided copper-clad laminate obtained above was immersed in the copper etching solution described above (*3) to remove the copper foils on both sides, and a test piece of 100 mm x 40 mm was obtained.
- This test piece was dried at 105°C for 30 minutes and then left for 1 hour at an atmospheric temperature of 25 ⁇ 2°C and a humidity of 40 ⁇ 10% RH, after which the relative dielectric constant (Dk) and dielectric loss tangent (Df) were measured.
- the measurement was performed in accordance with the SPDR method (split post dielectric resonator) in the 10 GHz band at 25° C.
- the measurement device used was a “PNA Network Analyzer N5227A” (product name) from Agilent Technologies.
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Reinforced Plastic Materials (AREA)
Abstract
Description
本開示は、プリプレグ用硬化性組成物、プリプレグ、金属張積層板、プリント配線板、半導体パッケージ、及び成型品に関する。 This disclosure relates to curable compositions for prepregs, prepregs, metal-clad laminates, printed wiring boards, semiconductor packages, and molded products.
銅張積層板に代表される金属張積層板、金属張積層板に用いることが可能なプリプレグ、金属張積層板を用いる半導体パッケージ等は、スマートフォン等の移動体通信機器、その基地局装置、サーバー、ルーター、大型サーバー等のネットワークインフラ機器、大型コンピュータ、パーソナルコンピュータ、産業用コンピュータ等の多様な電子機器に用いられている。また、家電、自動車等に搭載される電子機器にも用いられている。 Metal-clad laminates, such as copper-clad laminates, prepregs that can be used with metal-clad laminates, and semiconductor packages that use metal-clad laminates are used in a wide variety of electronic devices, including mobile communication devices such as smartphones, base station equipment, servers, routers, large servers, and other network infrastructure devices, as well as large computers, personal computers, and industrial computers. They are also used in electronic devices installed in home appliances, automobiles, etc.
電子機器において、膨大なデータを高速で処理する場合、高周波数領域での伝送損失が少ない基板材料が求められる。基板材料には低誘電率及び低誘電正接の樹脂が用いられ、低伝送損失の基板が提供されるが、近年の通信技術の発展により、さらに低誘電率及び低誘電正接の樹脂の開発が求められている。 When processing huge amounts of data at high speed in electronic devices, circuit board materials with low transmission loss in the high frequency range are required. Resins with low dielectric constants and low dielectric tangents are used as circuit board materials to provide circuit boards with low transmission loss, but recent developments in communication technology have created a demand for the development of resins with even lower dielectric constants and dielectric tangents.
特許文献1には、誘電特性、高耐熱性、および低吸水性に優れた硬化物となり得る硬化性ビニルベンジル化合物として、ビニルベンジル基が導入されたインデン環構造を有する化合物が開示されている。 Patent Document 1 discloses a compound having an indene ring structure with a vinylbenzyl group introduced therein as a curable vinylbenzyl compound that can be cured to produce a cured product with excellent dielectric properties, high heat resistance, and low water absorption.
本開示は、硬化物の長期耐熱劣化性に優れる硬化性組成物、プリプレグ、金属張積層板、プリント配線板、半導体パッケージ及び成型品を提供することを課題の一つとする。 One of the objectives of this disclosure is to provide a curable composition, a prepreg, a metal-clad laminate, a printed wiring board, a semiconductor package, and a molded product that exhibit excellent long-term heat deterioration resistance of the cured product.
本開示は、以下の実施形態を含む。本開示は以下の実施形態に限定されない。
一実施形態は、ビニルベンジル基を有する化合物を含む硬化性組成物であって、130℃で10分加熱した熱履歴を有する硬化性組成物において40~150℃の範囲で測定される最低溶融粘度が3,000Pa・s以下である、硬化性組成物に関する。
The present disclosure includes the following embodiments. The present disclosure is not limited to the following embodiments.
One embodiment relates to a curable composition comprising a compound having a vinylbenzyl group, wherein the curable composition has a thermal history of being heated at 130°C for 10 minutes and has a minimum melt viscosity of 3,000 Pa s or less as measured in the range of 40 to 150°C.
本開示により、硬化物の長期耐熱劣化性に優れる硬化性組成物、プリプレグ、金属張積層板、プリント配線板、半導体パッケージ、及び成型品を提供することができる。 This disclosure makes it possible to provide curable compositions, prepregs, metal-clad laminates, printed wiring boards, semiconductor packages, and molded products that exhibit excellent long-term heat deterioration resistance in the cured products.
以下、本開示の実施形態について詳細に説明する。本開示は以下の実施形態に限定されない。 The following describes in detail the embodiments of the present disclosure. The present disclosure is not limited to the following embodiments.
本開示において、「~」を用いて示された数値範囲は、「~」の前後に記載される数値をそれぞれ最小値及び最大値として含む範囲を示す。本開示中に段階的に記載されている数値範囲において、ある数値範囲の上限値又は下限値は、別の数値範囲の上限値又は下限値に置き換えてもよい。また、本開示中に記載されている数値範囲の上限値又は下限値は、実施例に示されている値に置き換えてもよい。
本開示において、各成分には、特に断らない限り、該当する物質が、1種又は2種以上含まれていてもよい。
本開示において、硬化性組成物中の各成分の含有量は、硬化性組成物中に各成分に該当する物質が複数存在する場合、特に断らない限り、硬化性組成物中に存在する当該複数の物質の合計量を意味する。
In the present disclosure, a numerical range indicated using "to" indicates a range including the numerical values described before and after "to" as the minimum and maximum values, respectively. In the numerical ranges described in stages in the present disclosure, the upper limit or lower limit of a certain numerical range may be replaced with the upper limit or lower limit of another numerical range. In addition, the upper limit or lower limit of a numerical range described in the present disclosure may be replaced with a value shown in an example.
In the present disclosure, unless otherwise specified, each component may contain one or more corresponding substances.
In the present disclosure, when a plurality of substances corresponding to each component are present in the curable composition, the content of each component in the curable composition means the total amount of the plurality of substances present in the curable composition, unless otherwise specified.
本開示において、特に説明のない限り、重量平均分子量(Mw)及び数平均分子量(Mn)は次の手順にて測定する数値である。重量平均分子量及び数平均分子量は、ゲルパーミエーションクロマトグラフィー(GPC)により、標準ポリスチレンを用いた検量線から換算する。検量線は、標準ポリスチレンの5サンプルセット(PStQuick MP-H、PStQuick B[東ソー株式会社、商品名])を用いて3次式で近似する。GPCの条件を以下に示す。 In this disclosure, unless otherwise specified, the weight average molecular weight (Mw) and number average molecular weight (Mn) are values measured using the following procedure. The weight average molecular weight and number average molecular weight are converted from a calibration curve using standard polystyrene by gel permeation chromatography (GPC). The calibration curve is approximated by a cubic equation using a set of five standard polystyrene samples (PStQuick MP-H, PStQuick B [product name by Tosoh Corporation]). The GPC conditions are shown below.
装置:高速GPC装置「HLC-8320GPC」(東ソー株式会社、商品名)
検出器:紫外吸光検出器「UV-8320」(東ソー株式会社、商品名)
カラム:ガードカラム;TSKgel guardcolumn Super(HZ)-M+、カラム;TSKgel SuperMultipore HZ-M(2本)、リファレンスカラム;TSKgel SuperH-RC(2本)(すべて東ソー株式会社、商品名)
カラムサイズ:4.6×20mm(ガードカラム)、4.6×150mm(カラム)、6.0×150mm(リファレンスカラム)
溶離液:テトラヒドロフラン
試料濃度:10mg/1mL
注入量:20μL又は2μL
流量:0.35mL/分
測定温度:40℃
Apparatus: High-speed GPC apparatus "HLC-8320GPC" (product name, Tosoh Corporation)
Detector: Ultraviolet absorption detector "UV-8320" (product name, Tosoh Corporation)
Columns: Guard column: TSKgel guardcolumn Super (HZ)-M+, column: TSKgel SuperMultipore HZ-M (2 columns), reference column: TSKgel SuperH-RC (2 columns) (all product names of Tosoh Corporation)
Column size: 4.6 x 20 mm (guard column), 4.6 x 150 mm (column), 6.0 x 150 mm (reference column)
Eluent: tetrahydrofuran Sample concentration: 10 mg/1 mL
Injection volume: 20 μL or 2 μL
Flow rate: 0.35mL/min Measurement temperature: 40℃
本開示の一実施形態である硬化性組成物は、ビニルベンジル基を有する化合物を含む硬化性組成物であって、130℃で10分加熱した熱履歴を有する硬化性組成物において40~150℃の範囲で測定される最低溶融粘度が3,000Pa・s以下である、硬化性組成物である。この様な特徴を有する硬化性組成物は、硬化物の長期耐熱劣化性に優れる効果を奏する。本開示において硬化物の長期耐熱劣化性とは、プリプレグ、繊維強化複合材料及び成型材料等、硬化性組成物を繊維基材へ含侵させる或いは金型内へ充填させて用いるような用途において、硬化物を高温条件下に長期間さらした場合であっても劣化が生じ難く、機械物性等を維持し得る性能を指す。 The curable composition according to one embodiment of the present disclosure is a curable composition that contains a compound having a vinylbenzyl group, and has a minimum melt viscosity of 3,000 Pa·s or less measured in the range of 40 to 150°C in a curable composition that has a thermal history of being heated at 130°C for 10 minutes. A curable composition having such characteristics exhibits the effect of excellent long-term heat deterioration resistance of the cured product. In the present disclosure, the long-term heat deterioration resistance of the cured product refers to the ability to maintain mechanical properties and the like, without deterioration even when the cured product is exposed to high temperature conditions for a long period of time, in applications such as prepregs, fiber-reinforced composite materials, and molding materials, in which the curable composition is impregnated into a fiber substrate or filled into a mold.
特定の理論に拘束されるものではないが、ビニルベンジル基を有する化合物(以下これを「化合物A」と呼ぶことがある)を含む硬化性組成物は、130℃で10分加熱することにより、溶剤等の揮発性成分の大半又は全部が揮発するとともに、ビニルベンジル基及び任意成分が有する重合性基の一部が重合し、所謂Bステージ化された状態となる。このB-ステージ化物について測定される最低溶融粘度が3,000Pa・s以下であることにより、例えば、繊維基材への含侵性又は濡れ性、或いは金型内での充填性に優れる硬化性組成物となり、気体透過度の低い硬化物を得ることが可能となる。この結果、高温条件下での硬化物の熱酸化分解が抑制され、長期耐熱劣化性に優れる効果が得られるものと考えられる。 Without being bound by any particular theory, it is believed that when a curable composition containing a compound having a vinylbenzyl group (hereinafter sometimes referred to as "compound A") is heated at 130°C for 10 minutes, most or all of the volatile components such as the solvent evaporate, and some of the polymerizable groups of the vinylbenzyl group and optional components polymerize, resulting in a so-called B-staged state. When the minimum melt viscosity measured for this B-staged product is 3,000 Pa·s or less, the curable composition has excellent impregnation or wettability into fiber substrates, or excellent filling ability in a mold, and it is possible to obtain a cured product with low gas permeability. As a result, it is believed that the thermal oxidative decomposition of the cured product under high temperature conditions is suppressed, and an effect of excellent long-term heat deterioration resistance is obtained.
また、本開示は硬化物の長期耐熱劣化性に優れる硬化性組成物を提供するとともに、副次的な効果として、硬化物の長期耐熱性に優れる硬化性組成物となり得るか否かをより簡便な操作にて判断し得る手法を提供する。具体的には、硬化物の長期耐熱性に優れる硬化性組成物となり得るか否かの判断に資する指針の一つとして、130℃で10分加熱した熱履歴を有する硬化性組成物の40~150℃の範囲における最低溶融粘度を測定し、その値に基づく判断が可能となることにより、硬化物を高温条件下で長期間保管する従来の評価試験と比較して、より効率的な開発が可能となる。
すなわち、本開示は一実施形態として、硬化物の長期耐熱性について、130℃で10分加熱した熱履歴を有する硬化性組成物において40~150℃の範囲で測定される最低溶融粘度の値にて評価する、硬化性組成物の評価方法を提供する。
The present disclosure also provides a curable composition having excellent long-term heat deterioration resistance of the cured product, and as a secondary effect, provides a method for determining, by a simpler operation, whether or not the composition can be a curable composition having excellent long-term heat resistance of the cured product. Specifically, as one of the guidelines for determining whether or not the composition can be a curable composition having excellent long-term heat resistance of the cured product, the minimum melt viscosity in the range of 40 to 150°C of a curable composition having a thermal history of being heated at 130°C for 10 minutes is measured, and a determination based on the value becomes possible, which enables more efficient development compared to conventional evaluation tests in which a cured product is stored under high-temperature conditions for a long period of time.
That is, as one embodiment, the present disclosure provides a method for evaluating a curable composition, in which the long-term heat resistance of a cured product is evaluated based on the value of the minimum melt viscosity measured in the range of 40 to 150°C for a curable composition having a thermal history of being heated at 130°C for 10 minutes.
[硬化性組成物の最低溶融粘度]
一実施形態において硬化性組成物の最低溶融粘度は、130℃で10分加熱した熱履歴を有する硬化性組成物について測定される値である。130℃で10分加熱する方法は特に限定されず、例えば、オーブン等の恒温機の中に保持する方法が挙げられる。加熱温度設定に関して、加熱工程の一部で±2℃の振れが生じてもよい。また、加熱時間設定に関して、±10秒の誤差が生じてもよい。
[Minimum melt viscosity of curable composition]
In one embodiment, the minimum melt viscosity of the curable composition is a value measured for a curable composition having a thermal history of being heated at 130° C. for 10 minutes. The method of heating at 130° C. for 10 minutes is not particularly limited, and examples thereof include a method of holding the composition in a thermostatic machine such as an oven. The heating temperature setting may have a fluctuation of ±2° C. in part of the heating process. In addition, the heating time setting may have an error of ±10 seconds.
加熱時の硬化性組成物の状態は特に限定されず、例えば、硬化性組成物を基材上に塗布する方法、硬化性組成物を金型やシャーレ等の容器に入れる方法、繊維基材に含侵させてプリプレグの形状とする方法等が挙げられる。上記基材は、例えば、金属板、金属フィルム、樹脂板、樹脂フィルム等が挙げられる。上記繊維基材は、例えば、ガラスクロスや炭素繊維等が挙げられる。硬化性組成物を基材上に塗布する際の膜厚、容器に入れる際の液面高さは特に限定されないが、塗膜を均一に乾燥させ、最低溶融粘度の測定誤差を低減させる目的においては、50~90μmの範囲が好ましい。また、プリプレグの厚さは特に限定されないが、最低溶融粘度の測定誤差を低減させる目的においては、片面に塗布する樹脂の膜厚が50~90μmの範囲であることが好ましい。このとき、繊維基材の厚さは10~100μmの範囲であることが好ましく、プリプレグ全体の厚さとしては、100~200μmの範囲であることが好ましい。 The state of the curable composition during heating is not particularly limited, and examples of the method include a method of applying the curable composition onto a substrate, a method of putting the curable composition into a container such as a mold or a petri dish, and a method of impregnating a fiber substrate into the shape of a prepreg. Examples of the substrate include a metal plate, a metal film, a resin plate, and a resin film. Examples of the fiber substrate include glass cloth and carbon fiber. The film thickness when applying the curable composition onto the substrate and the liquid level when putting it into a container are not particularly limited, but in order to dry the coating uniformly and reduce the measurement error of the minimum melt viscosity, a range of 50 to 90 μm is preferable. In addition, the thickness of the prepreg is not particularly limited, but in order to reduce the measurement error of the minimum melt viscosity, the film thickness of the resin applied to one side is preferably in the range of 50 to 90 μm. In this case, the thickness of the fiber substrate is preferably in the range of 10 to 100 μm, and the thickness of the entire prepreg is preferably in the range of 100 to 200 μm.
最低溶融粘度はレオメーター等の測定機器にて測定することができる。最低溶融粘度を測定する際、130℃で10分加熱した熱履歴を有する硬化性組成物は、必要に応じて、測定機器に応じた形状に加工して用いることができる。例えば、測定機器に適したサンプル形状が錠剤状である場合には、熱履歴を有する硬化性組成物を一度破砕し、錠剤状に再成形して用いることができる。最低溶融粘度の測定誤差を低減させる目的においては、成形時には100℃以上での加熱処理を行わないことが好ましい。 The minimum melt viscosity can be measured with a measuring device such as a rheometer. When measuring the minimum melt viscosity, the curable composition having a thermal history of being heated at 130°C for 10 minutes can be processed into a shape suitable for the measuring device, if necessary, and used. For example, if the sample shape suitable for the measuring device is tablet-shaped, the curable composition having a thermal history can be crushed once and remolded into tablets for use. In order to reduce measurement errors of the minimum melt viscosity, it is preferable not to perform a heating treatment at 100°C or higher during molding.
最低溶融粘度の測定は、40~150℃の範囲で行う。昇温速度は2~3℃/分の範囲であることが好ましい。測定温度範囲及び昇温速度について、測定機器の精度に起因する誤差は許容される。最低溶融粘度の測定機器及び測定条件の一例として、実施例で用いた条件を以下に記す。
測定機器(レオメーター):ティー・エイ・インスツルメント・ジャパン株式会社製「DHR-20」
温度範囲及び昇温条件:40~150℃、3℃/分
サンプル形状:厚さ1.0~1.5mm(実施例では厚さ約1.2mmとした)、直径20mmの錠剤状
The minimum melt viscosity is measured in the range of 40 to 150° C. The heating rate is preferably in the range of 2 to 3° C./min. Regarding the measurement temperature range and heating rate, errors due to the accuracy of the measuring device are permissible. As an example of the measuring device and measuring conditions for the minimum melt viscosity, the conditions used in the examples are described below.
Measuring equipment (rheometer): "DHR-20" manufactured by TA Instruments Japan Co., Ltd.
Temperature range and heating conditions: 40 to 150°C, 3°C/min. Sample shape: tablet shape with a thickness of 1.0 to 1.5 mm (approximately 1.2 mm in the example) and a diameter of 20 mm
このようにして測定される硬化性組成物の最低溶融粘度が3,000Pa・s以下であることにより、硬化物の長期耐熱劣化性に優れる硬化性組成物となる。具体的な理由や機序については上述の通りである。最低溶融粘度は2,500Pa・s以下であることが好ましく、2,000Pa・s以下であることがより好ましく、1,500Pa・s以下であることが特に好ましい。また、最低溶融粘度は800Pa・s以上であってもよく、1,000Pa・s以上であってもよい。130℃で10分加熱した熱履歴を有する硬化性組成物において40~150℃の範囲で測定される最低溶融粘度は、例えば、800~3,000Pa・sの範囲であることが好ましい。 When the minimum melt viscosity of the curable composition measured in this manner is 3,000 Pa·s or less, the cured product has excellent long-term heat deterioration resistance. The specific reasons and mechanisms are as described above. The minimum melt viscosity is preferably 2,500 Pa·s or less, more preferably 2,000 Pa·s or less, and particularly preferably 1,500 Pa·s or less. The minimum melt viscosity may be 800 Pa·s or more, or may be 1,000 Pa·s or more. The minimum melt viscosity measured in the range of 40 to 150°C for a curable composition having a thermal history of being heated at 130°C for 10 minutes is preferably in the range of 800 to 3,000 Pa·s, for example.
硬化性組成物は、130℃で10分加熱した熱履歴を有する硬化性組成物において、40~150℃の範囲で溶融粘度を測定した際の60℃での溶融粘度が5,000Pa・s以上であることが好ましい。このような条件を満たすことにより、低温条件下における流動性が過度に高くならず、成形性に優れる硬化性組成物となる。60℃での溶融粘度は6,000Pa・s以上であってもよく、7,000Pa・s以上であってもよい。また、60℃での溶融粘度は10,000Pa・s以下であってよく、9,000Pa・s以下であってもよい。 The curable composition preferably has a melt viscosity of 5,000 Pa·s or more at 60°C when the melt viscosity is measured in the range of 40 to 150°C in a curable composition having a thermal history of being heated at 130°C for 10 minutes. By satisfying such conditions, the fluidity under low temperature conditions is not excessively high, resulting in a curable composition with excellent moldability. The melt viscosity at 60°C may be 6,000 Pa·s or more, or may be 7,000 Pa·s or more. In addition, the melt viscosity at 60°C may be 10,000 Pa·s or less, or may be 9,000 Pa·s or less.
硬化性組成物は、30℃で10分加熱した熱履歴を有する硬化性組成物において40~150℃の範囲で測定される最低溶融粘度の値(Vmin)に対する、40~150℃の範囲で溶融粘度を測定した際の60℃での溶融粘度の値(V60)の比(V60)/(Vmin)が3~10の範囲であってもよい。このような条件を満たすことにより、硬化物の長期耐熱劣化性に一層優れる硬化性組成物となる。 The curable composition may have a ratio (V 60 )/(V min ) of the melt viscosity value at 60° C. when the melt viscosity is measured in the range of 40 to 150° C. to the minimum melt viscosity value (V min ) measured in the range of 40 to 150° C. in a curable composition having a thermal history of being heated at 30 ° C. for 10 minutes, in the range of 3 to 10. By satisfying such conditions, a curable composition having even better long-term heat deterioration resistance of the cured product can be obtained.
[硬化性組成物]
一実施形態において、硬化性組成物はビニルベンジル基を有する化合物(化合物A)を含む。化合物Aは硬化物における誘電特性及び耐熱性に優れる点において優れた材料の一つである。化合物Aは一つ又は複数のビニルベンジル基を有するものであればよい。化合物Aは一種類を単独で用いてもよいし、二種類以上を併用してもよい。
[Curable composition]
In one embodiment, the curable composition includes a compound having a vinylbenzyl group (compound A). Compound A is one of the excellent materials in terms of excellent dielectric properties and heat resistance in the cured product. Compound A may have one or more vinylbenzyl groups. Compound A may be used alone or in combination of two or more types.
化合物Aの具体例としては、例えば、下記一般式(1)で表される化合物(以下、これを「化合物A1」と呼ぶことがある)、化合物A1を用いたプレポリマ(以下これを「プレポリマA2」と呼ぶことがある)、下記一般式(2-1)で表される化合物(以下これを「化合物A3」と呼ぶことがある)、下記一般式(2-2)で表される化合物のうち互いに構造が異なる化合物を2種類以上含み、mが1以上の整数である化合物の少なくとも一種と、nが1以上の整数である化合物の少なくとも一種を含む樹脂(以下これを「樹脂A3」と呼ぶことがある)、下記一般式(3)で表される化合物(以下これを「化合物A4」と呼ぶことがある)、ビニルベンジル変性フェノール性樹脂(以下これを「樹脂A5」と呼ぶことがある)等が挙げられる。なお、これらはあくまでも化合物Aの具体例の一部に過ぎず、本開示において化合物Aとして利用可能な化合物はこれらに限定されるものではない。 Specific examples of compound A include a compound represented by the following general formula (1) (hereinafter, this may be referred to as "compound A1"), a prepolymer using compound A1 (hereinafter, this may be referred to as "prepolymer A2"), a compound represented by the following general formula (2-1) (hereinafter, this may be referred to as "compound A3"), a resin containing two or more compounds having different structures among the compounds represented by the following general formula (2-2), including at least one compound in which m is an integer of 1 or more and at least one compound in which n is an integer of 1 or more (hereinafter, this may be referred to as "resin A3"), a compound represented by the following general formula (3) (hereinafter, this may be referred to as "compound A4"), and a vinylbenzyl-modified phenolic resin (hereinafter, this may be referred to as "resin A5"). Note that these are merely some of the specific examples of compound A, and compounds that can be used as compound A in this disclosure are not limited to these.
[一般式(1)中、Ar1は置換基を有していてもよい芳香族炭化水素構造を表し、lは1又は2以上の整数である。] [In general formula (1), Ar 1 represents an aromatic hydrocarbon structure which may have a substituent, and 1 is an integer of 1 or 2 or more.]
[一般式(2-1)中、Ar2は置換基を有していてもよい芳香族炭化水素構造を表し、mは1又は2以上の整数である。Ar3はスチリル基以外のアリール基を表し、nは1又は2以上の整数である。] [In the general formula (2-1), Ar2 represents an aromatic hydrocarbon structure which may have a substituent, m is an integer of 1 or 2 or more, Ar3 represents an aryl group other than a styryl group, and n is an integer of 1 or 2 or more.]
[一般式(2-2)中、Ar2は置換基を有していてもよい芳香族炭化水素構造を表し、mは0又は1以上の整数である。Ar3はスチリル基以外のアリール基を表し、nは0又は1以上の整数である。] [In the general formula (2-2), Ar2 represents an aromatic hydrocarbon structure which may have a substituent, m is an integer of 0 or 1 or more, Ar3 represents an aryl group other than a styryl group, and n is an integer of 0 or 1 or more.]
[一般式(3)中、R1は炭素原子数1~10のアルキレン基であり、R2は水素原子又はビニルベンジル基である。] [In the general formula (3), R 1 is an alkylene group having 1 to 10 carbon atoms, and R 2 is a hydrogen atom or a vinylbenzyl group.]
上記一般式(1)で表される化合物(化合物A1)について、化合物A1が有するビニルベンジル基は、o-ビニルベンジル基、m-ビニルベンジル基又はp-ビニルベンジル基のいずれであってもよい。中でも、p-ビニルベンジル基が好ましい。ビニルベンジル化合物が有する全ビニルベンジル基中のp-ビニルベンジル基の割合は10%以上であってよく、20%以上であってもよく、30%以上であってもよい。また、100%以下であってよく、80%以下であってもよく、70%以下であってもよい。例えば、10~100%の範囲であってもよい。p-ビニルベンジル基の割合が100%未満である場合、残りのビニルベンジル基はm-ビニルベンジル基であってよい。 In the compound represented by the above general formula (1) (compound A1), the vinylbenzyl group contained in compound A1 may be any of o-vinylbenzyl group, m-vinylbenzyl group, and p-vinylbenzyl group. Among these, p-vinylbenzyl group is preferable. The proportion of p-vinylbenzyl groups in all vinylbenzyl groups contained in the vinylbenzyl compound may be 10% or more, 20% or more, or 30% or more. It may also be 100% or less, 80% or less, or 70% or less. For example, it may be in the range of 10 to 100%. When the proportion of p-vinylbenzyl groups is less than 100%, the remaining vinylbenzyl groups may be m-vinylbenzyl groups.
一般式(1)中のAr1は置換基を有していてもよい芳香族炭化水素構造である。芳香族炭化水素の具体例としては、例えば、ベンゼン、インデン、ナフタレン、フルオレン、アントラセン、フェナントレン、テトラセン、クリセン、ピレン、トリフェニレン等が挙げられる。中でも、ベンゼン、インデン、ナフタレン、フルオレンが好ましく、インデン、フルオレンがより好ましく、インデンが特に好ましい。 Ar 1 in the general formula (1) is an aromatic hydrocarbon structure which may have a substituent. Specific examples of aromatic hydrocarbons include benzene, indene, naphthalene, fluorene, anthracene, phenanthrene, tetracene, chrysene, pyrene, triphenylene, etc. Among them, benzene, indene, naphthalene, and fluorene are preferred, indene and fluorene are more preferred, and indene is particularly preferred.
Ar1が置換基を有する場合、その具体例としては、例えば、メチル基、エチル基、n-プロピル基、イソプロピル基、n-ブチル基、sec-ブチル基、イソブチル基、t-ブチル基等のアルキル基;ビニル基、アリル基等の不飽和結合含有基;フェニル着、トリル基、キシリル基、メシチル基、ナフチル基等のアリール基;フェニルオキシ基、トリルオキシ基、キシリルオキシ基、メシチルオキシ基、ナフチルオキシ基等のアリールオキシ基;ベンジル基、α-メチルベンジル基、トリフェニルメチル基、ナフチルメチル基等のアラルキル基;ベンジルオキシ基等のアラルキルオキシ基等が挙げられる。Ar1は置換基を有さないものであってもよい。 When Ar 1 has a substituent, specific examples thereof include alkyl groups such as methyl, ethyl, n-propyl, isopropyl, n-butyl, sec-butyl, isobutyl, and t-butyl; unsaturated bond-containing groups such as vinyl and allyl; aryl groups such as phenyl, tolyl, xylyl, mesityl, and naphthyl; aryloxy groups such as phenyloxy, tolyloxy, xylyloxy, mesityloxy, and naphthyloxy; aralkyl groups such as benzyl, α-methylbenzyl, triphenylmethyl, and naphthylmethyl; and aralkyloxy groups such as benzyloxy. Ar 1 may not have a substituent.
一般式(1)中のlは1又は2以上の整数である。lの好ましい数はAr1で表される芳香族炭化水素構造の種類によっても異なるが、Ar1がインデン環構造である場合、lは1~3の整数であることが好ましい。Ar1がインデン環構造である場合、化合物A1は、例えば、下記一般式(4)で表される化合物等が挙げられる。 In general formula (1), l is an integer of 1 or more. The preferred number of l varies depending on the type of aromatic hydrocarbon structure represented by Ar 1 , but when Ar 1 is an indene ring structure, l is preferably an integer of 1 to 3. When Ar 1 is an indene ring structure, examples of compound A1 include compounds represented by the following general formula (4).
[一般式(4)中、R3、R4及びR5はビニルベンジル基又は水素原子であり、R3、R4及びR5の少なくとも1つはビニルベンジル基である。] [In the general formula (4), R 3 , R 4 and R 5 are a vinylbenzyl group or a hydrogen atom, and at least one of R 3 , R 4 and R 5 is a vinylbenzyl group.]
化合物A1として一般式(4)で表される化合物を用いる場合、一種類を単独で用いてもよいし、一分子中のビニルベンジル基の数が異なる化合物を複数種用いてもよい。後者の場合、硬化性に優れる化合物となることから、一分子中のビニルベンジル基の平均は1.0~3.0の範囲であることが好ましく、1.6~2.5の範囲であることがより好ましい。 When a compound represented by general formula (4) is used as compound A1, one type may be used alone, or multiple types of compounds having different numbers of vinylbenzyl groups in one molecule may be used. In the latter case, since the compound has excellent curing properties, the average number of vinylbenzyl groups in one molecule is preferably in the range of 1.0 to 3.0, and more preferably in the range of 1.6 to 2.5.
化合物A1は分子構造によって特定される化合物であり、その製法は特に限定されない。化合物A1を製造する方法の一例としては、例えば、Ar1基に対応する芳香族化合物と、ハロゲン化メチル基を有するスチレンとを塩基性化合物の存在下で反応させる方法が挙げられる。 Compound A1 is a compound specified by its molecular structure, and its production method is not particularly limited. An example of the method for producing compound A1 is a method of reacting an aromatic compound corresponding to the Ar 1 group with a styrene having a halogenated methyl group in the presence of a basic compound.
ハロゲン化メチル基を有するスチレンとしては、例えば、o-クロロメチルスチレン、m-クロロメチルスチレン、p-クロロメチルスチレン等が挙げられる。ハロゲン化メチル基を有するスチレンは一種類を単独で用いてもよいし、2種以上を併用してもよい。塩基性化合物としては、アルカリ金属水酸化物、アルカリ金属アルコキシド等が挙げられる。塩基性化合物は一種類を単独で用いてもよいし、二種類以上を併用してもよい。 Examples of styrenes having a halogenated methyl group include o-chloromethylstyrene, m-chloromethylstyrene, and p-chloromethylstyrene. One type of styrene having a halogenated methyl group may be used alone, or two or more types may be used in combination. Examples of basic compounds include alkali metal hydroxides and alkali metal alkoxides. One type of basic compound may be used alone, or two or more types may be used in combination.
上記反応には、相間移動触媒を用いてもよい。相間移動触媒としては、例えば、テトラ-n-ブチルアンモニウムクロリド、テトラ-n-ブチルアンモニウムブロミド(臭化テトラ-n-ブチルアンモニウム)、テトラエチルアンモニウムクロリド、テトラエチルアンモニウムブロミド、テトラプロピルアンモニウムクロリド、テトラプロピルアンモニウムブロミド、ベンジルトリメチルアンモニウムクロリド、ベンジルトリメチルアンモニウムブロミド、ベンジルトリブチルアンモニウムクロリド、ベンジルトリブチルアンモニウムブロミド、ベンジルジメチルテトラデシルアンモニウムクロリド、トリカプリルメチルアンモニウムクロリド、テトラデシルトリメチルアンモニウムブロミド、ヘキサデシルトリメチルアンモニウムブロミド、トリオクチルメチルアンモニウムクロリド、テトラ-n-ブチルアンモニウム硫酸水素塩等の第4級アンモニウム塩;テトラ-n-ブチルホスホニウムクロリド、テトラ-n-ブチルホスホニウムブロミド、テトラフェニルホスホニウムクロリド、テトラフェニルホスホニウムブロミド、ベンジルトリフェニルホスホニウムクロリド、ベンジルトリフェニルホスホニウムブロミド等の第4級ホスホニウム塩等が挙げられる。 A phase transfer catalyst may be used in the above reaction. Examples of phase transfer catalysts include quaternary ammonium salts such as tetra-n-butylammonium chloride, tetra-n-butylammonium bromide (tetra-n-butylammonium bromide), tetraethylammonium chloride, tetraethylammonium bromide, tetrapropylammonium chloride, tetrapropylammonium bromide, benzyltrimethylammonium chloride, benzyltrimethylammonium bromide, benzyltributylammonium chloride, benzyltributylammonium bromide, benzyldimethyltetradecylammonium chloride, tricaprylmethylammonium chloride, tetradecyltrimethylammonium bromide, hexadecyltrimethylammonium bromide, trioctylmethylammonium chloride, and tetra-n-butylammonium hydrogen sulfate; and quaternary phosphonium salts such as tetra-n-butylphosphonium chloride, tetra-n-butylphosphonium bromide, tetraphenylphosphonium chloride, tetraphenylphosphonium bromide, benzyltriphenylphosphonium chloride, and benzyltriphenylphosphonium bromide.
Ar1基に対応する芳香族化合物と、ハロゲン化メチル基を有するスチレンとの反応は溶液重合で行うことができる。反応は、例えば、加熱及び撹拌条件下で行ってもよい。必要に応じて、反応系に重合禁止剤を投与してもよい。重合禁止剤としては、例えば、フェノチアジン、3,7-ジオクチルフェノチアジン、3,7-ジクミルフェノチアジン、2,2,6,6-テトラメチルピぺリジン-1-オキシル、4-ヒドロキシ-2,2,6,6-テトラメチルピぺリジン-1-オキシル、4-ベンゾイルオキシ-2,2,6,6-テトラメチルピぺリジン-1-オキシル、ビス(2,2,6,6-テトラメチル-1-ピペリジニルオキシ-4-イル)セバケート等が挙げられる。得られた生成物は、必要に応じて、濃縮、再沈殿、洗浄等の公知の方法によって精製してもよい。 The reaction between the aromatic compound corresponding to the Ar 1 group and the styrene having a halogenated methyl group can be carried out by solution polymerization. The reaction may be carried out, for example, under heating and stirring conditions. If necessary, a polymerization inhibitor may be added to the reaction system. Examples of the polymerization inhibitor include phenothiazine, 3,7-dioctylphenothiazine, 3,7-dicumylphenothiazine, 2,2,6,6-tetramethylpiperidine-1-oxyl, 4-hydroxy-2,2,6,6-tetramethylpiperidine-1-oxyl, 4-benzoyloxy-2,2,6,6-tetramethylpiperidine-1-oxyl, and bis(2,2,6,6-tetramethyl-1-piperidinyloxy-4-yl)sebacate. If necessary, the obtained product may be purified by a known method such as concentration, reprecipitation, or washing.
得られた生成物は、単一の化合物であってもよいし、2種以上の化合物の混合物であってもよい。2種類以上の化合物の混合物である場合、上記一般式(1)におけるlが0である化合物を一部含んでいてもよく、当該混合物をそのまま硬化性組成物に用いてもよい。その場合、硬化性に優れる硬化性組成物となることから、混合物における一分子中のビニルベンジル基の平均は1.0~3.0の範囲であることが好ましく、1.6~2.5の範囲であることがより好ましい。 The obtained product may be a single compound or a mixture of two or more compounds. When it is a mixture of two or more compounds, it may contain a compound in which l in the above general formula (1) is 0, and the mixture may be used as is in the curable composition. In that case, since the curable composition has excellent curability, the average number of vinylbenzyl groups in one molecule in the mixture is preferably in the range of 1.0 to 3.0, and more preferably in the range of 1.6 to 2.5.
化合物A1を用いたプレポリマ(プレポリマA2)について、本開示においてプレポリマとは、ポリマのうち、ポリマの原料であるモノマが有する重合性反応基の一部が残存したものをいう。したがって、プレポリマA2は化合物A1に由来する未反応のビニルベンジル基を有し、ラジカル重合性を示す。 In this disclosure, the term "prepolymer" used in the present disclosure for the prepolymer (prepolymer A2) using compound A1 refers to a polymer in which some of the polymerizable reactive groups of the monomer, the raw material of the polymer, remain. Therefore, prepolymer A2 has unreacted vinylbenzyl groups derived from compound A1 and exhibits radical polymerization properties.
プレポリマA2は、化合物A1と併せて、化合物A1以外のその他のモノマを用いたものであってもよい。プレポリマA2を構成するモノマ全体に占める化合物A1の割合は50~100質量%となることが好ましく、80~100質量%となることがより好ましく、90~100質量%となることが特に好ましい。 Prepolymer A2 may be made by using compound A1 together with other monomers other than compound A1. The proportion of compound A1 in the total monomers constituting prepolymer A2 is preferably 50 to 100% by mass, more preferably 80 to 100% by mass, and particularly preferably 90 to 100% by mass.
プレポリマA2を製造する方法は特に限定されず、化合物A1を含むモノマを一般的な方法で重合反応させる方法にて製造することができる。その一例としては、ラジカル重合が挙げられる。 The method for producing prepolymer A2 is not particularly limited, and it can be produced by a method in which a monomer containing compound A1 is polymerized by a general method. One example is radical polymerization.
ラジカル重合に用いる重合開始剤は特に限定なく、例えば、アゾ系重合開始剤、有機過酸化物系重合開始剤等が挙げられるアゾ系重合開始剤としては、例えば、2,2’-アゾビス(2,4,4-トリメチルペンタン)、ジメチル2,2’-アゾビス(2-メチルプロピオネート)、2,2’-アゾビス(N-ブチル-2-メチルプロピオンアミド)、2,2’-アゾビス[N-(2-プロペニル)-2-メチルプロピオンアミド]、1,1’-アゾビス(シクロヘキサン-1-カルボニトリル)、ジメチル1,1’-アゾビス(1-シクロヘキサンカルボキシレート)、2,2’-アゾビス(イソブチロニトリル)、2,2’-アゾビス(2-メチルプロパンニトリル)、2,2’-アゾビス(2-メチルブチロニトリル)、2,2’-アゾビス(4-メトキシ-2,4-ジメチルバレロニトリル)、2,2’-アゾビス(2,4-ジメチルバレロニトリル)、4,4’-アゾビス(3,3,4,4,5,5,6,6,7,7,8,8,8-トリデカフルオロオクチル4-シアノペンタノアート)、等が挙げられる。有機過酸化物系重合開始剤としては、例えば、ジクミルパーオキサイド、ジベンゾイルパーオキサイド、2-ブタノンパーオキサイド、tert-ブチルパーベンゾエイト、ジ-tert-ブチルパーオキサイド、2,5-ジメチル-2,5-ジ(t-ブチルパーオキシ)ヘキサン、ビス(tert-ブチルパーオキシイソプロピル)ベンゼン、tert-ブチルヒドロパーオキシド等が挙げられる。 The polymerization initiator used in the radical polymerization is not particularly limited, and examples thereof include azo-based polymerization initiators and organic peroxide-based polymerization initiators. Examples of azo-based polymerization initiators include 2,2'-azobis(2,4,4-trimethylpentane), dimethyl 2,2'-azobis(2-methylpropionate), 2,2'-azobis(N-butyl-2-methylpropionamide), 2,2'-azobis[N-(2-propenyl)-2-methylpropionamide], 1,1'-azobis(cyclohexane-1-carbonitrile), and dimethyl Examples of the azobis(1-cyclohexanecarboxylate), azobis(isobutyronitrile), azobis(2-methylpropanenitrile), azobis(2-methylbutyronitrile), azobis(4-methoxy-2,4-dimethylvaleronitrile), azobis(2,4-dimethylvaleronitrile), azobis(3,3,4,4,5,5,6,6,7,7,8,8,8-tridecafluorooctyl 4-cyanopentanoate), and the like. Examples of organic peroxide polymerization initiators include dicumyl peroxide, dibenzoyl peroxide, 2-butanone peroxide, tert-butyl perbenzoate, di-tert-butyl peroxide, 2,5-dimethyl-2,5-di(t-butylperoxy)hexane, bis(tert-butylperoxyisopropyl)benzene, and tert-butyl hydroperoxide.
ラジカル重合開始剤は一種類を単独で用いてもよいし、二種類以上を併用してもよい。ラジカル重合開始剤の使用量は所望の重合度等に応じて適宜調節することができるが、反応制御が容易となる点から、反応原料であるモノマの合計100質量部に対し、0.01質量部~5質量部の範囲が好ましい。 The radical polymerization initiator may be used alone or in combination of two or more types. The amount of radical polymerization initiator used can be adjusted appropriately depending on the desired degree of polymerization, etc., but in order to facilitate reaction control, it is preferable to use a radical polymerization initiator in the range of 0.01 to 5 parts by mass per 100 parts by mass of the total of the monomers, which are the reaction raw materials.
プレポリマA2の重合反応は溶媒中で行ってもよい。用いる溶媒としては、例えば、トルエン、キシレン等が挙げられる。これらは一種類を単独で用いてもよいし、二種類以上の混合溶媒としてもよい。溶媒の使用量は特に限定されないが、反応制御が容易となる点から、反応原料であるモノマの合計100質量部に対し30~500質量部の範囲が好ましい。 The polymerization reaction of prepolymer A2 may be carried out in a solvent. Examples of the solvent that may be used include toluene and xylene. These may be used alone or in the form of a mixed solvent of two or more types. There are no particular limitations on the amount of solvent used, but a range of 30 to 500 parts by mass per 100 parts by mass of the monomers, which are the raw materials for the reaction, is preferred in terms of making it easier to control the reaction.
プレポリマA2の重量平均分子量(Mw)は特に限定されないが、例えば、製造のし易さ及びプリプレグ用硬化性組成物の扱い易さの観点から、50,000~400,000の範囲であることが好ましい。プレポリマA2の重量平均分子量(Mw)は70,000以上であってよく、80,000以上であってもよく、100,00以上であってもよい。また、300,000以下であってよく、250,000以下であってもよく、200,000以下であってもよい。 The weight average molecular weight (Mw) of prepolymer A2 is not particularly limited, but is preferably in the range of 50,000 to 400,000, for example, from the viewpoint of ease of production and ease of handling of the curable composition for prepreg. The weight average molecular weight (Mw) of prepolymer A2 may be 70,000 or more, 80,000 or more, or 100,000 or more. It may also be 300,000 or less, 250,000 or less, or 200,000 or less.
上記一般式(2-1)で表される化合物(化合物A3)、及び一般式(2-2)で表される化合物のうち互いに構造が異なる化合物を2種類以上含み、mが1以上の整数である化合物の少なくとも一種と、nが1以上の整数である化合物の少なくとも一種を含む樹脂(樹脂A3)について、化合物A3が有するビニルベンジル基及び樹脂A3が含むビニルベンジル基は、o-ビニルベンジル基、m-ビニルベンジル基又はp-ビニルベンジル基のいずれであってもよい。中でも、p-ビニルベンジル基が好ましい。ビニルベンジル化合物が有する全ビニルベンジル基中のp-ビニルベンジル基の割合は10モル%以上であってよく、20モル%以上であってもよく、30モル%以上であってもよい。また、100モル%以下であってよく、80モル%以下であってもよく、70モル%以下であってもよい。例えば、10~100モル%の範囲であってもよい。p-ビニルベンジル基の割合が100モル%未満である場合、残りのビニルベンジル基はm-ビニルベンジル基であってよい。 With respect to a compound (compound A3) represented by the above general formula (2-1) and a resin (resin A3) containing two or more compounds having different structures from each other among the compounds represented by general formula (2-2), and containing at least one compound in which m is an integer of 1 or more and at least one compound in which n is an integer of 1 or more, the vinylbenzyl group contained in compound A3 and the vinylbenzyl group contained in resin A3 may be any of o-vinylbenzyl group, m-vinylbenzyl group, and p-vinylbenzyl group. Among these, p-vinylbenzyl group is preferred. The proportion of p-vinylbenzyl groups in all vinylbenzyl groups contained in the vinylbenzyl compound may be 10 mol% or more, 20 mol% or more, or 30 mol% or more. It may also be 100 mol% or less, 80 mol% or less, or 70 mol% or less. For example, it may be in the range of 10 to 100 mol%. When the proportion of p-vinylbenzyl groups is less than 100 mol%, the remaining vinylbenzyl groups may be m-vinylbenzyl groups.
一般式(2-1)及び一般式(2-2)中のAr3はスチリル基以外のアリール基である。アリール基の具体例としては、例えば、フェニル着、トリル基、キシリル基、メシチル基、ナフチル基等が挙げられる。 In the general formula (2-1) and the general formula (2-2), Ar3 is an aryl group other than a styryl group. Specific examples of the aryl group include a phenyl group, a tolyl group, a xylyl group, a mesityl group, and a naphthyl group.
一般式(2-1)及び一般式(2-2)中のAr2は置換基を有していてもよい芳香族炭化水素構造である。芳香族炭化水素の具体例としては、例えば、ベンゼン、インデン、ナフタレン、フルオレン、アントラセン、フェナントレン、テトラセン、クリセン、ピレン、トリフェニレン等が挙げられる。中でも、ベンゼン、インデン、ナフタレン、フルオレンが好ましく、インデン、フルオレンがより好ましく、インデンが特に好ましい。 Ar2 in the general formula (2-1) and the general formula (2-2) is an aromatic hydrocarbon structure which may have a substituent. Specific examples of aromatic hydrocarbons include benzene, indene, naphthalene, fluorene, anthracene, phenanthrene, tetracene, chrysene, pyrene, triphenylene, and the like. Among them, benzene, indene, naphthalene, and fluorene are preferable, indene and fluorene are more preferable, and indene is particularly preferable.
Ar2が置換基を有する場合、その具体例としては、例えば、メチル基、エチル基、n-プロピル基、イソプロピル基、n-ブチル基、sec-ブチル基、イソブチル基、t-ブチル基等のアルキル基;ビニル基、アリル基等の不飽和結合含有基;フェニル着、トリル基、キシリル基、メシチル基、ナフチル基等のアリール基;フェニルオキシ基、トリルオキシ基、キシリルオキシ基、メシチルオキシ基、ナフチルオキシ基等のアリールオキシ基等が挙げられる。Ar2は置換基を有さないものであってもよい。 When Ar2 has a substituent, specific examples thereof include alkyl groups such as methyl, ethyl, n-propyl, isopropyl, n-butyl, sec-butyl, isobutyl, and t-butyl; unsaturated bond-containing groups such as vinyl and allyl; aryl groups such as phenyl, tolyl, xylyl, mesityl, and naphthyl; and aryloxy groups such as phenyloxy, tolyloxy, xylyloxy, mesityloxy, and naphthyloxy. Ar2 may have no substituent.
化合物A3について、一般式(2-1)中のmは1又は2以上の整数であり、nは1又は2以上の整数である。m、nの好ましい数はAr2で表される芳香族炭化水素構造の種類によっても異なるが、Ar2がインデン環構造である場合、m、nはそれぞれ1~3の整数であることが好ましい。更に、mとnとの和が2又は3であることがより好ましい。Ar2がインデン環構造である場合、化合物B1は、例えば、下記一般式(5-1)で表される化合物等が挙げられる。 Regarding compound A3, in general formula (2-1), m is an integer of 1 or 2 or more, and n is an integer of 1 or 2 or more. The preferred numbers of m and n vary depending on the type of aromatic hydrocarbon structure represented by Ar 2 , but when Ar 2 is an indene ring structure, it is preferred that m and n are each an integer of 1 to 3. Furthermore, it is more preferred that the sum of m and n is 2 or 3. When Ar 2 is an indene ring structure, examples of compound B1 include compounds represented by the following general formula (5-1), and the like.
[一般式(5-1)中、R6、R7及びR8はビニルベンジル基、アリールメチル基又は水素原子のいずれかである。R6、R7及びR8の少なくとも1つはビニルベンジル基であり、少なくとも1つはアリールメチル基である。] [In the general formula (5-1), R 6 , R 7 and R 8 are either a vinylbenzyl group, an arylmethyl group or a hydrogen atom. At least one of R 6 , R 7 and R 8 is a vinylbenzyl group, and at least one is an arylmethyl group.]
化合物A3として一般式(5-1)で表される化合物を用いる場合、一種類を単独で用いてもよいし、分子構造の異なる化合物を複数種用いてもよい。 When a compound represented by general formula (5-1) is used as compound A3, one type may be used alone, or multiple types of compounds with different molecular structures may be used.
樹脂A3について、一般式(2-2)中のmは0又は1以上の整数であり、nは0又は1以上の整数である。m、nの好ましい数はAr2で表される芳香族炭化水素構造の種類によっても異なるが、Ar2がインデン環構造である場合、m、nはそれぞれ0又は1~3の整数であることが好ましい。更に、mとnとの和の平均値は1.5~3の範囲であることがより好ましい。Ar2がインデン環構造である場合、樹脂A3は、例えば、下記一般式(5-2)で表される化合物のうち互いに構造が異なる化合物を2種類以上含み、樹脂中に存在するR6、R7及びR8のうちの少なくとも1つがビニルベンジル基であり、樹脂中に存在するR6、R7及びR8のうちの少なくとも1つがビニルベンジル基以外のアリールメチル基である樹脂等が挙げられる。 Regarding the resin A3, in the general formula (2-2), m is 0 or an integer of 1 or more, and n is 0 or an integer of 1 or more. The preferred numbers of m and n vary depending on the type of aromatic hydrocarbon structure represented by Ar 2 , but when Ar 2 is an indene ring structure, it is preferable that m and n are each 0 or an integer of 1 to 3. Furthermore, the average value of the sum of m and n is more preferably in the range of 1.5 to 3. When Ar 2 is an indene ring structure, the resin A3 may be, for example, a resin containing two or more compounds having different structures among the compounds represented by the following general formula (5-2), in which at least one of R 6 , R 7 and R 8 present in the resin is a vinylbenzyl group, and at least one of R 6 , R 7 and R 8 present in the resin is an arylmethyl group other than a vinylbenzyl group.
[一般式(5-2)中、R6、R7及びR8はビニルベンジル基、アリールメチル基又は水素原子のいずれかである。樹脂中に存在するR6、R7及びR8のうちの少なくとも1つはビニルベンジル基であり、樹脂中に存在するR6、R7及びR8のうちの少なくとも1つはビニルベンジル基以外のアリールメチル基である。] [In general formula (5-2), R 6 , R 7 and R 8 are either a vinylbenzyl group, an arylmethyl group or a hydrogen atom. At least one of R 6 , R 7 and R 8 present in the resin is a vinylbenzyl group, and at least one of R 6 , R 7 and R 8 present in the resin is an arylmethyl group other than a vinylbenzyl group.]
樹脂A3は、R6、R7及びR8のうちの一つがビニルベンジル基あり、一つがアリールメチル基であり、一つが水素原子である化合物、R6、R7及びR8のうちの二つがビニルベンジル基あり、一つがアリールメチル基である化合物、R6、R7及びR8のうちの一つがビニルベンジル基あり、二つがアリールメチル基である化合物、R6、R7及びR8のうち1~3つがビニルベンジル基であり他が水素原子である化合物、R6、R7及びR8のうち1~3つがアリールメチル基であり他が水素原子である化合物、R6、R7及びR8が全て水素原子である化合物のうちの少なくとも一種を含んでいてよい。一分子中にアリールメチル基を複数有する化合物において、アリールメチル基は全てが異なっていてもよいし、一部又は全部が同一であってもよい。 Resin A3 may include at least one of the following : a compound in which one of R 6 , R 7 and R 8 is a vinylbenzyl group, one is an arylmethyl group, and one is a hydrogen atom; a compound in which two of R 6 , R 7 and R 8 are vinylbenzyl groups and one is an arylmethyl group; a compound in which one of R 6 , R 7 and R 8 is a vinylbenzyl group and two are arylmethyl groups; a compound in which one to three of R 6 , R 7 and R 8 are vinylbenzyl groups and the others are hydrogen atoms; a compound in which one to three of R 6 , R 7 and R 8 are arylmethyl groups and the others are hydrogen atoms; and a compound in which R 6 , R 7 and R 8 are all hydrogen atoms. In a compound having a plurality of arylmethyl groups in one molecule, the arylmethyl groups may all be different, or some or all may be the same.
化合物A3及び樹脂A3は分子構造によって特定される化合物であり、その製法は特に限定されない。化合物A3又は樹脂A3を製造する方法の一例としては、例えば、Ar2基に対応する芳香族化合物、ハロゲン化メチル基を有するスチレン、及びAr3基に対応するハロゲン化メチル基を有する芳香族化合物を塩基性化合物の存在下で反応させる方法が挙げられる。反応条件の詳細は化合物A1の製造方法として記載したものと同様である。 Compound A3 and resin A3 are compounds that are specified by their molecular structures, and their manufacturing methods are not particularly limited. One example of a method for manufacturing compound A3 or resin A3 is, for example, a method in which an aromatic compound corresponding to Ar2 group, styrene having a halogenated methyl group, and an aromatic compound having a halogenated methyl group corresponding to Ar3 group are reacted in the presence of a basic compound. The details of the reaction conditions are the same as those described as the manufacturing method of compound A1.
ハロゲン化メチル基を有するスチレンとしては、例えば、o-クロロメチルスチレン、m-クロロメチルスチレン、p-クロロメチルスチレン等が挙げられる。ハロゲン化メチル基を有するスチレンは一種類を単独で用いてもよいし、2種以上を併用してもよい。Ar3基に対応するハロゲン化メチル基を有する芳香族化合物としては、例えば、α-クロロトルエン、α-クロロ-p-キシレン等が挙げられる。ハロゲン化メチル基を有する芳香族化合物は一種類を単独で用いてもよいし、2種以上を併用してもよい。塩基性化合物としては、アルカリ金属水酸化物、アルカリ金属アルコキシド等が挙げられる。塩基性化合物は一種類を単独で用いてもよいし、二種類以上を併用してもよい。 Examples of styrenes having a halogenated methyl group include o-chloromethylstyrene, m-chloromethylstyrene, and p-chloromethylstyrene. The styrenes having a halogenated methyl group may be used alone or in combination of two or more. Examples of aromatic compounds having a halogenated methyl group corresponding to the Ar 3 group include α-chlorotoluene and α-chloro-p-xylene. The aromatic compounds having a halogenated methyl group may be used alone or in combination of two or more. Examples of basic compounds include alkali metal hydroxides and alkali metal alkoxides. The basic compounds may be used alone or in combination of two or more.
化合物A3について、得られた生成物は単一の化合物であってもよいし、2種以上の化合物の混合物であってもよい。2種類以上の化合物の混合物である場合、上記一般式(2-1)におけるm、nのどちらか一方又は両方が0である化合物を一部含んでいてもよく、当該混合物をそのまま硬化性組成物に用いてもよい。 With regard to compound A3, the obtained product may be a single compound or a mixture of two or more compounds. When it is a mixture of two or more compounds, it may contain a compound in which either one or both of m and n in the above general formula (2-1) are 0, and the mixture may be used as it is in the curable composition.
樹脂A3について、反応生成物は、必要に応じて、濃縮、再沈殿、洗浄等の公知の方法によって精製してもよい。 For resin A3, the reaction product may be purified, if necessary, by known methods such as concentration, reprecipitation, washing, etc.
上記一般式(3)で表される化合物(化合物A4)について、化合物B4が有するビニルベンジル基は、o-ビニルベンジル基、m-ビニルベンジル基又はp-ビニルベンジル基のいずれであってもよい。中でも、p-ビニルベンジル基が好ましい。ビニルベンジル化合物が有する全ビニルベンジル基中のp-ビニルベンジル基の割合は10%以上であってよく、20%以上であってもよく、30%以上であってもよい。また、100%以下であってよく、80%以下であってもよく、70%以下であってもよい。例えば、10~100%の範囲であってもよい。p-ビニルベンジル基の割合が100%未満である場合、残りのビニルベンジル基はm-ビニルベンジル基であってよい。 In the compound represented by the above general formula (3) (compound A4), the vinylbenzyl group in compound B4 may be any of o-vinylbenzyl, m-vinylbenzyl, and p-vinylbenzyl groups. Among these, p-vinylbenzyl groups are preferred. The proportion of p-vinylbenzyl groups in all vinylbenzyl groups in the vinylbenzyl compound may be 10% or more, 20% or more, or 30% or more. It may also be 100% or less, 80% or less, or 70% or less. For example, it may be in the range of 10 to 100%. When the proportion of p-vinylbenzyl groups is less than 100%, the remaining vinylbenzyl groups may be m-vinylbenzyl groups.
一般式(3)中のR1は炭素原子数1~10のアルキレン基である。アルキレン基の具体例としては、例えば、メチレン基、1,2-ジメチレン基、1,3-トリメチレン基、1,4-テトラメチレン基、1,5-ペンタメチレン基、1,6-ヘキサメチレン基等が挙げられる。 In the general formula (3), R 1 is an alkylene group having 1 to 10 carbon atoms. Specific examples of the alkylene group include a methylene group, a 1,2-dimethylene group, a 1,3-trimethylene group, a 1,4-tetramethylene group, a 1,5-pentamethylene group, and a 1,6-hexamethylene group.
ビニルベンジル変性フェノール樹脂(樹脂A5)について、樹脂A5は、具体的には、各種のフェノール性水酸基含有樹脂のフェノール性水酸基をビニルベンジルエーテル化した樹脂である。樹脂B5が有するビニルベンジル基は、o-ビニルベンジル基、m-ビニルベンジル基又はp-ビニルベンジル基のいずれであってもよい。中でも、p-ビニルベンジル基が好ましい。ビニルベンジル化合物が有する全ビニルベンジル基中のp-ビニルベンジル基の割合は10モル%以上であってよく、20モル%以上であってもよく、30モル%以上であってもよい。また、100モル%以下であってよく、80%モル以下であってもよく、70モル%以下であってもよい。モルp-ビニルベンジル基の割合が100モル%未満である場合、残りのビニルベンジル基はm-ビニルベンジル基であってよい。 Regarding the vinylbenzyl-modified phenolic resin (resin A5), resin A5 is specifically a resin in which the phenolic hydroxyl groups of various phenolic hydroxyl group-containing resins have been vinylbenzyl-etherified. The vinylbenzyl group in resin B5 may be any of o-vinylbenzyl, m-vinylbenzyl, and p-vinylbenzyl groups. Among these, p-vinylbenzyl groups are preferred. The proportion of p-vinylbenzyl groups in the total vinylbenzyl groups in the vinylbenzyl compound may be 10 mol% or more, 20 mol% or more, or 30 mol% or more. It may also be 100 mol% or less, 80 mol% or less, or 70 mol% or less. When the proportion of p-vinylbenzyl groups is less than 100 mol%, the remaining vinylbenzyl groups may be m-vinylbenzyl groups.
樹脂A5の重量平均分子量(Mw)は、特に限定されないが、取り扱い性の観点から、300以上であることが好ましく、500以上であることがより好ましく、1,000以上であることが特に好ましい。また、50,000以下であることが好ましく、30,000以下であることがより好ましく、10,000であることが特に好ましい。樹脂A5の重量平均分子量(Mw)は、例えば、300~50,000の範囲であってもよい。 The weight average molecular weight (Mw) of Resin A5 is not particularly limited, but from the viewpoint of ease of handling, it is preferably 300 or more, more preferably 500 or more, and particularly preferably 1,000 or more. It is also preferably 50,000 or less, more preferably 30,000 or less, and particularly preferably 10,000. The weight average molecular weight (Mw) of Resin A5 may be, for example, in the range of 300 to 50,000.
樹脂A5は、例えば、下記一般式(6)で表されるもの等が挙げられる。 Examples of resin A5 include those represented by the following general formula (6):
[一般式(6)中のZはそれぞれ独立に2価の炭化水素基である。pは1以上の整数である。] [In general formula (6), each Z is independently a divalent hydrocarbon group. p is an integer of 1 or more.]
一般式(6)中のZはそれぞれ独立に2価の炭化水素基である。2価の炭化水素基としては、例えば、炭素原子数1~5のアルキレン基、炭素原子数2~5のアルキリデン基、炭素原子数5~12の2価の脂環式炭化水素基、炭素原子数6~12のアリ-レン基、これらを組み合わせた2価の基等が挙げられる。炭素原子数1~5のアルキレン基としては、例えば、メチレン基、1,2-ジメチレン基、1,3-トリメチレン基、1,4-テトラメチレン基、1,5-ペンタメチレン基等が挙げられる。炭素原子数2~5のアルキリデン基としては、例えば、エチリデン基、プロピリデン基、イソプロピリデン基、ブチリデン基、イソブチリデン基、ペンチリデン基、イソペンチリデン基等が挙げられる。炭素原子数5~12の2価の脂環式炭化水素基としては、ノルボルナン、デカリン、ビシクロウンデカン、飽和ジシクロペンタジエン等の脂環式炭化水素化合物から、異なる2個の炭素原子に結合する2個の水素原子が失われて生ずる2価の基が挙げられる。炭素原子数6~12のアリ-レン基としては、例えば、フェニレン基、ナフチレン基、ビフェニレン基等が挙げられる。 Z in general formula (6) is independently a divalent hydrocarbon group. Examples of divalent hydrocarbon groups include alkylene groups having 1 to 5 carbon atoms, alkylidene groups having 2 to 5 carbon atoms, divalent alicyclic hydrocarbon groups having 5 to 12 carbon atoms, arylene groups having 6 to 12 carbon atoms, and divalent groups combining these. Examples of alkylene groups having 1 to 5 carbon atoms include methylene, 1,2-dimethylene, 1,3-trimethylene, 1,4-tetramethylene, and 1,5-pentamethylene. Examples of alkylidene groups having 2 to 5 carbon atoms include ethylidene, propylidene, isopropylidene, butylidene, isobutylidene, pentylidene, and isopentylidene. Examples of divalent alicyclic hydrocarbon groups having 5 to 12 carbon atoms include divalent groups that are generated by removing two hydrogen atoms bonded to two different carbon atoms from alicyclic hydrocarbon compounds such as norbornane, decalin, bicycloundecane, and saturated dicyclopentadiene. Examples of arylene groups having 6 to 12 carbon atoms include phenylene groups, naphthylene groups, and biphenylene groups.
Zは、飽和ジシクロペンタジエン中の異なる2個の炭素原子に結合する2個の水素原子が失われて生ずる2価の基、又は、炭素原子数1~5のアルキレン基と炭素原子数6~12のアリ-レン基とを組み合わせた基であることが好ましい。炭素原子数1~5のアルキレン基と炭素原子数6~12のアリ-レン基とを組み合わせた基としては、例えば、下記一般式(7)で表される基が挙げられる。 Z is preferably a divalent group resulting from the loss of two hydrogen atoms bonded to two different carbon atoms in a saturated dicyclopentadiene, or a group combining an alkylene group having 1 to 5 carbon atoms and an arylene group having 6 to 12 carbon atoms. An example of a group combining an alkylene group having 1 to 5 carbon atoms and an arylene group having 6 to 12 carbon atoms is the group represented by the following general formula (7).
[一般式(7)中のR9はそれぞれ独立に炭素原子数1~5のアルキレン基である。Ar4は炭素原子数6~12のアリ-レン基である。] [In general formula (7), R 9 is independently an alkylene group having 1 to 5 carbon atoms. Ar 4 is an arylene group having 6 to 12 carbon atoms.]
一般式(7)中のR9が表す炭素原子数1~5のアルキレン基は、上記で挙げたものの中でも、メチレン基が好ましい。Ar4が表す炭素原子数6~12のアリ-レン基は、上記で挙げたものの中でも、フェニレン基、ビフェニレン基が好ましい。また、フェニレン基は1,4-フェニレン基が好ましく、ビフェニレン基は4,4’-ビフェニレン基が好ましい。 Among the above-mentioned alkylene groups having 1 to 5 carbon atoms represented by R 9 in general formula (7), a methylene group is preferable. Among the above-mentioned arylene groups having 6 to 12 carbon atoms represented by Ar 4 , a phenylene group or a biphenylene group is preferable. Furthermore, the phenylene group is preferably a 1,4-phenylene group, and the biphenylene group is preferably a 4,4'-biphenylene group.
一般式(6)中のpは、1以上の整数である。pは1~50の整数であってよく、1~30の整数であってもよく、1~20の整数であってもよい。 In general formula (6), p is an integer of 1 or more. p may be an integer from 1 to 50, an integer from 1 to 30, or an integer from 1 to 20.
樹脂A5はどのような方法にて製造されたものであってもよく、その製造方法は特に限定されない。一例としては、ベースとなるフェノール樹脂と、クロロメチルスチレン等のビニルベンジル化剤とを塩基性化合物の存在下で反応させる方法にて製造することができる。反応条件の詳細は化合物A1の製造方法として記載したものと同様である。 Resin A5 may be produced by any method, and the method of production is not particularly limited. As an example, it can be produced by reacting a base phenolic resin with a vinyl benzylating agent such as chloromethylstyrene in the presence of a basic compound. The details of the reaction conditions are the same as those described as the method of producing compound A1.
化合物Aの中でも、硬化物における長期耐熱劣化性に硬化物の長期耐熱劣化性に優れる硬化性組成物となることから、プレポリマA2が好ましい。 Among the compounds A, prepolymer A2 is preferred because it produces a curable composition that exhibits excellent long-term heat deterioration resistance in the cured product.
化合物A全体に対するプレポリマA2の割合は、30質量%以上であってよく、50質量%以上であってもよく、80質量%以上であってもよい。また、100質量%以下であってよく、90質量%以下であってもよく、80質量%以下であってもよい。 The ratio of prepolymer A2 to the total compound A may be 30% by mass or more, 50% by mass or more, or 80% by mass or more. It may also be 100% by mass or less, 90% by mass or less, or 80% by mass or less.
硬化性組成物は、化合物A以外のラジカル重合性基を有する化合物(以下これを「化合物B」呼ぶことがある)を含んでいてもよい。化合物Bの一例としては、例えば、マレイミド基を有する化合物、ラジカル重合性基を有するポリフェニレンエーテル化合物、スチレン、ジビニルベンゼン、トリアリルイソシアヌレート等が挙げられる。 The curable composition may contain a compound having a radical polymerizable group other than compound A (hereinafter, this may be referred to as "compound B"). Examples of compound B include a compound having a maleimide group, a polyphenylene ether compound having a radical polymerizable group, styrene, divinylbenzene, triallyl isocyanurate, etc.
マレイミド基を有する化合物は、例えば、N-置換マレイミド基を1個以上有する化合物、及びその誘導体が挙げられる。マレイミド基を有する化合物は一種類を単独で用いてもよいし、二種類以上を併用してもよい。 Examples of compounds having a maleimide group include compounds having one or more N-substituted maleimide groups and derivatives thereof. Compounds having a maleimide group may be used alone or in combination of two or more types.
N-置換マレイミド基を1個以上有する化合物としては、例えば、芳香環に直接結合するN-置換マレイミド基を有する化合物である芳香族マレイミド化合物、芳香環に直接結合するN-置換マレイミド基を2個有する化合物である芳香族ビスマレイミド化合物、芳香環に直接結合するN-置換マレイミド基を3個以上有する化合物である芳香族ポリマレイミド化合物、脂肪族炭化水素に直接結合するN-置換マレイミド基を有する化合物である脂肪族マレイミド化合物等が挙げられる。 Examples of compounds having one or more N-substituted maleimide groups include aromatic maleimide compounds, which are compounds having an N-substituted maleimide group directly bonded to an aromatic ring; aromatic bismaleimide compounds, which are compounds having two N-substituted maleimide groups directly bonded to an aromatic ring; aromatic polymaleimide compounds, which are compounds having three or more N-substituted maleimide groups directly bonded to an aromatic ring; and aliphatic maleimide compounds, which are compounds having an N-substituted maleimide group directly bonded to an aliphatic hydrocarbon.
N-置換マレイミド基を1個以上有する化合物の具体例としては、N,N’-エチレンビスマレイミド、N,N’-ヘキサメチレンビスマレイミド、N,N’-(1,3-フェニレン)ビスマレイミド、N,N’-[1,3-(2-メチルフェニレン)]ビスマレイミド、N,N’-[1,3-(4-メチルフェニレン)]ビスマレイミド、N,N’-(1,4-フェニレン)ビスマレイミド、ビス(4-マレイミドフェニル)メタン、ビス(3-メチル-4-マレイミドフェニル)メタン、3,3’-ジメチル-5,5’-ジエチル-4,4’-ジフェニルメタンビスマレイミド、ビス(4-マレイミドフェニル)エーテル、ビス(4-マレイミドフェニル)スルホン、ビス(4-マレイミドフェニル)スルフィド、ビス(4-マレイミドフェニル)ケトン、ビス(4-マレイミドシクロヘキシル)メタン、1,4-ビス(4-マレイミドフェニル)シクロヘキサン、1,4-ビス(マレイミドメチル)シクロヘキサン、1,4-ビス(マレイミドメチル)ベンゼン、1,3-ビス(4-マレイミドフェノキシ)ベンゼン、1,3-ビス(3-マレイミドフェノキシ)ベンゼン、ビス[4-(3-マレイミドフェノキシ)フェニル]メタン、ビス[4-(4-マレイミドフェノキシ)フェニル]メタン、1,1-ビス[4-(3-マレイミドフェノキシ)フェニル]エタン、1,1-ビス[4-(4-マレイミドフェノキシ)フェニル]エタン、1,2-ビス[4-(3-マレイミドフェノキシ)フェニル]エタン、1,2-ビス[4-(4-マレイミドフェノキシ)フェニル]エタン、2,2-ビス[4-(3-マレイミドフェノキシ)フェニル]プロパン、2,2-ビス[4-(4-マレイミドフェノキシ)フェニル]プロパン、2,2-ビス[4-(3-マレイミドフェノキシ)フェニル]ブタン、2,2-ビス[4-(4-マレイミドフェノキシ)フェニル]ブタン、2,2-ビス[4-(3-マレイミドフェノキシ)フェニル]-1,1,1,3,3,3-ヘキサフルオロプロパン、2,2-ビス[4-(4-マレイミドフェノキシ)フェニル]-1,1,1,3,3,3-ヘキサフルオロプロパン、4,4-ビス(3-マレイミドフェノキシ)ビフェニル、4,4-ビス(4-マレイミドフェノキシ)ビフェニル、ビス[4-(3-マレイミドフェノキシ)フェニル]ケトン、ビス[4-(4-マレイミドフェノキシ)フェニル]ケトン、ビス(4-マレイミドフェニル)ジスルフィド、ビス[4-(3-マレイミドフェノキシ)フェニル]スルフィド、ビス[4-(4-マレイミドフェノキシ)フェニル]スルフィド、ビス[4-(3-マレイミドフェノキシ)フェニル]スルホキシド、ビス[4-(4-マレイミドフェノキシ)フェニル]スルホキシド、ビス[4-(3-マレイミドフェノキシ)フェニル]スルホン、ビス[4-(4-マレイミドフェノキシ)フェニル]スルホン、ビス[4-(3-マレイミドフェノキシ)フェニル]エーテル、ビス[4-(4-マレイミドフェノキシ)フェニル]エーテル、1,4-ビス[4-(4-マレイミドフェノキシ)-α,α-ジメチルベンジル]ベンゼン、1,3-ビス[4-(4-マレイミドフェノキシ)-α,α-ジメチルベンジル]ベンゼン、1,4-ビス[4-(3-マレイミドフェノキシ)-α,α-ジメチルベンジル]ベンゼン、1,3-ビス[4-(3-マレイミドフェノキシ)-α,α-ジメチルベンジル]ベンゼン、1,4-ビス[4-(4-マレイミドフェノキシ)-3,5-ジメチル-α,α-ジメチルベンジル]ベンゼン、1,3-ビス[4-(4-マレイミドフェノキシ)-3,5-ジメチル-α,α-ジメチルベンジル]ベンゼン、1,4-ビス[4-(3-マレイミドフェノキシ)-3,5-ジメチル-α,α-ジメチルベンジル]ベンゼン、1,3-ビス[4-(3-マレイミドフェノキシ)-3,5-ジメチル-α,α-ジメチルベンジル]ベンゼン、ポリフェニルメタンマレイミド、インダン骨格を有する芳香族ビスマレイミド化合物、ビフェニルアラルキル型マレイミド化合物等が挙げられる。 Specific examples of compounds having one or more N-substituted maleimide groups include N,N'-ethylene bismaleimide, N,N'-hexamethylene bismaleimide, N,N'-(1,3-phenylene) bismaleimide, N,N'-[1,3-(2-methylphenylene)] bismaleimide, N,N'-[1,3-(4-methylphenylene)] bismaleimide, N,N'-(1,4-phenylene) bismaleimide, bis(4-maleimidophenyl)methane, bis(3-methyl-4-maleimidophenyl)methane, and bis(4-maleimidophenyl)methane. 4-maleimidophenyl)methane, 3,3'-dimethyl-5,5'-diethyl-4,4'-diphenylmethane bismaleimide, bis(4-maleimidophenyl)ether, bis(4-maleimidophenyl)sulfone, bis(4-maleimidophenyl)sulfide, bis(4-maleimidophenyl)ketone, bis(4-maleimidocyclohexyl)methane, 1,4-bis(4-maleimidophenyl)cyclohexane, 1,4-bis(maleimidomethyl)cyclohexane, 1,4-bis(maleimide methyl)benzene, 1,3-bis(4-maleimidophenoxy)benzene, 1,3-bis(3-maleimidophenoxy)benzene, bis[4-(3-maleimidophenoxy)phenyl]methane, bis[4-(4-maleimidophenoxy)phenyl]methane, 1,1-bis[4-(3-maleimidophenoxy)phenyl]ethane, 1,1-bis[4-(4-maleimidophenoxy)phenyl]ethane, 1,2-bis[4-(3-maleimidophenoxy)phenyl]ethane, 1,2 -bis[4-(4-maleimidophenoxy)phenyl]ethane, 2,2-bis[4-(3-maleimidophenoxy)phenyl]propane, 2,2-bis[4-(4-maleimidophenoxy)phenyl]propane, 2,2-bis[4-(3-maleimidophenoxy)phenyl]butane, 2,2-bis[4-(4-maleimidophenoxy)phenyl]butane, 2,2-bis[4-(3-maleimidophenoxy)phenyl]-1,1,1,3,3,3-hexafluoropropane, 2, 2-bis[4-(4-maleimidophenoxy)phenyl]-1,1,1,3,3,3-hexafluoropropane, 4,4-bis(3-maleimidophenoxy)biphenyl, 4,4-bis(4-maleimidophenoxy)biphenyl, bis[4-(3-maleimidophenoxy)phenyl]ketone, bis[4-(4-maleimidophenoxy)phenyl]ketone, bis(4-maleimidophenyl)disulfide, bis[4-(3-maleimidophenoxy)phenyl]sulfide, bis[ 4-(4-maleimidophenoxy)phenyl]sulfide, bis[4-(3-maleimidophenoxy)phenyl]sulfoxide, bis[4-(4-maleimidophenoxy)phenyl]sulfoxide, bis[4-(3-maleimidophenoxy)phenyl]sulfone, bis[4-(4-maleimidophenoxy)phenyl]sulfone, bis[4-(3-maleimidophenoxy)phenyl]ether, bis[4-(4-maleimidophenoxy)phenyl]ether, 1,4-bis[4- (4-maleimidophenoxy)-α,α-dimethylbenzyl]benzene, 1,3-bis[4-(4-maleimidophenoxy)-α,α-dimethylbenzyl]benzene, 1,4-bis[4-(3-maleimidophenoxy)-α,α-dimethylbenzyl]benzene, 1,3-bis[4-(3-maleimidophenoxy)-α,α-dimethylbenzyl]benzene, 1,4-bis[4-(4-maleimidophenoxy)-3,5-dimethyl-α,α-dimethylbenzyl]benzene, 1,3- Examples include bis[4-(4-maleimidophenoxy)-3,5-dimethyl-α,α-dimethylbenzyl]benzene, 1,4-bis[4-(3-maleimidophenoxy)-3,5-dimethyl-α,α-dimethylbenzyl]benzene, 1,3-bis[4-(3-maleimidophenoxy)-3,5-dimethyl-α,α-dimethylbenzyl]benzene, polyphenylmethane maleimide, aromatic bismaleimide compounds having an indane skeleton, and biphenylaralkyl-type maleimide compounds.
N-置換マレイミド基を1個以上有する化合物の誘導体としては、例えば、上記したN-置換マレイミド基を1個以上有する化合物由来の構造単位とジアミン化合物由来の構造単位とを含有するアミノマレイミド化合物が挙げられる。 An example of a derivative of a compound having one or more N-substituted maleimide groups is an aminomaleimide compound that contains a structural unit derived from the compound having one or more N-substituted maleimide groups described above and a structural unit derived from a diamine compound.
硬化性組成物中のラジカル重合性基を有する化合物全体に占める化合物Aの合計の割合は、50質量%以上であってよく、70質量%以上であってもよく、80質量%以上であってよい。また、100%以下であってよく、90質量%以下であってもよく、70質量%以下であってもよい。 The total proportion of compound A in all compounds having a radical polymerizable group in the curable composition may be 50% by mass or more, 70% by mass or more, or 80% by mass or more. It may also be 100% by mass or less, 90% by mass or less, or 70% by mass or less.
硬化性組成物は、必要に応じて化合物A、B以外のその他の成分を含んでいてもよい。その他の成分としては、例えば、化合物A、B以外のその他の熱硬化性化合物、エラストマ、フェノール性水酸基を有する化合物(ラジカル重合性基を有するものを除く)、充填材、硬化促進剤、難燃剤、熱安定剤、帯電防止剤、紫外線吸収剤、顔料、着色剤、滑剤、溶媒等が挙げられる。その他の成分は、各々について、一種類を単独で使用してもよいし、二種類以上を併用してもよい。 The curable composition may contain other components in addition to compounds A and B, as necessary. Examples of other components include thermosetting compounds other than compounds A and B, elastomers, compounds having a phenolic hydroxyl group (excluding those having a radically polymerizable group), fillers, curing accelerators, flame retardants, heat stabilizers, antistatic agents, UV absorbers, pigments, colorants, lubricants, solvents, etc. Each of the other components may be used alone or in combination of two or more types.
その他の熱硬化性化合物は、例えば、エポキシ樹脂、フェノール樹脂、シアネート樹脂、ベンゾオキサジン樹脂、オキセタン樹脂、アミノ樹脂、シリコーン樹脂、トリアジン樹脂、メラミン樹脂等が挙げられる。その他の熱硬化性化合物を用いる場合、硬化性組成物中の硬化性成分の総質量に対する化合物Aの割合は、30質量%以上であってよく、50質量%以上であってもよく、80質量%以上であってもよい。また、100質量%以下であってよく、90質量%以下であってもよく、80質量%以下であってもよい。硬化性組成物中の硬化性成分の総質量に対する化合物Bの割合は、例えば、30~100質量%の範囲であってよい。なお、硬化性組成物中の硬化性成分とは、より具体的には、化合物A、B、及びその他の熱硬化性化合物を指す。 Other thermosetting compounds include, for example, epoxy resins, phenolic resins, cyanate resins, benzoxazine resins, oxetane resins, amino resins, silicone resins, triazine resins, and melamine resins. When other thermosetting compounds are used, the ratio of compound A to the total mass of the curable components in the curable composition may be 30 mass% or more, 50 mass% or more, or 80 mass% or more. It may also be 100 mass% or less, 90 mass% or less, or 80 mass% or less. The ratio of compound B to the total mass of the curable components in the curable composition may be, for example, in the range of 30 to 100 mass%. The curable components in the curable composition more specifically refer to compounds A, B, and other thermosetting compounds.
エラストマは、例えば、ポリエーテル系エラストマ、スチレン系エラストマ、共役ジエン系エラストマ、ウレタン系エラストマ、ポリエステル系エラストマ、ポリアミド系エラストマ、アクリル系エラストマ、シリコーン系エラストマ等が挙げられる。エラストマは、1種を単独で用いてもよく、2種以上を併用してもよい。 Examples of the elastomer include polyether-based elastomers, styrene-based elastomers, conjugated diene-based elastomers, urethane-based elastomers, polyester-based elastomers, polyamide-based elastomers, acrylic-based elastomers, and silicone-based elastomers. One type of elastomer may be used alone, or two or more types may be used in combination.
エラストマの重量平均分子量(Mw)は特に限定されず、例えば、100,000以下であってよく、60,000以下であってもよく、30,000以下であってもよい。また、1,000以上であってもよく、3,000以上であってもよく、5,000以上であってもよい。エラストマの重量平均分子量(Mw)は、例えば、1,000~100,000の範囲であってよい。 The weight average molecular weight (Mw) of the elastomer is not particularly limited, and may be, for example, 100,000 or less, 60,000 or less, or 30,000 or less. It may also be 1,000 or more, 3,000 or more, or 5,000 or more. The weight average molecular weight (Mw) of the elastomer may be, for example, in the range of 1,000 to 100,000.
エラストマのうちスチレン系エラストマとしては、スチレンと他の重合性化合物との共重合物が挙げられる。スチレンと共重合させる他の重合性化合物としては、例えば、αオレフィン化合物、環状オレフィン化合物、スチレン以外の芳香族モノビニル化合物、ポリビニル化合物等が挙げられる。スチレンと共重合させる他の重合性化合物は1種類を単独で用いてもよいし、2種類以上を併用してもよい。 Among the elastomers, styrene-based elastomers include copolymers of styrene and other polymerizable compounds. Examples of other polymerizable compounds that can be copolymerized with styrene include α-olefin compounds, cyclic olefin compounds, aromatic monovinyl compounds other than styrene, and polyvinyl compounds. The other polymerizable compounds that can be copolymerized with styrene may be used alone or in combination of two or more types.
上記αオレフィン化合物は、例えば、エチレン、プロピレン、1-ブテン、1-ヘキセン、1-オクテン、1-デカン、1-ドデカン、4-メチル-1-ペンテン、3,5,5,-トリメチル-1-ヘキセン等、炭素原子数2~20のものが挙げられる。上記環状オレフィン化合物は、例えば、ノルボルネン、シクロペンテン等が挙げられる。上記芳香族ビニル化合物は、例えば、メチルスチレン、イソブチルスチレン等のアルキルスチレン、ビニルナフタレン、ビニルアントラセン等が挙げられる。上記ポリビニル化合物は、例えば、ジビニルベンゼン、ジビニルナフタレン、ジビニルアントラセン、ジビニルビフェニル、エチレンビススチレン等のアルキレンビススチレン等が挙げられる。エラストマは、スチレン-αオレフィン化合物-ポリビニル化合物共重合体であってもよい。 Examples of the α-olefin compounds include those having 2 to 20 carbon atoms, such as ethylene, propylene, 1-butene, 1-hexene, 1-octene, 1-decane, 1-dodecane, 4-methyl-1-pentene, and 3,5,5-trimethyl-1-hexene. Examples of the cyclic olefin compounds include norbornene and cyclopentene. Examples of the aromatic vinyl compounds include alkylstyrenes such as methylstyrene and isobutylstyrene, vinylnaphthalene, and vinylanthracene. Examples of the polyvinyl compounds include divinylbenzene, divinylnaphthalene, divinylanthracene, divinylbiphenyl, and alkylenebisstyrenes such as ethylenebisstyrene. The elastomer may be a styrene-α-olefin compound-polyvinyl compound copolymer.
エラストマは、スチレン-αオレフィン化合物-ポリビニル化合物共重合体である場合、共重合成分の総質量に対するスチレンの割合は30~70質量%の範囲であってもよい。共重合成分の総質量に対するαオレフィン化合物の割合は10~70質量%の範囲であってもよい。共重合成分の総質量に対する上記ポリビニル化合物の割合は、エラストマとしての性能と樹脂組成物の硬化物における耐熱性とのバランスの観点から、0.05~10質量%の範囲であってもよい。すなわち、スチレン-αオレフィン化合物-ポリビニル化合物共重合体のスチレン構造単位の含有率は30~70質量%であってもよい。また、αオレフィン化合物構造単位の含有率は10~70質量%の範囲であってもよい。ポリビニル化合物構造単位の含有率は0.05~10質量%の範囲であってもよい。 When the elastomer is a styrene-α-olefin compound-polyvinyl compound copolymer, the ratio of styrene to the total mass of the copolymerization components may be in the range of 30 to 70 mass%. The ratio of the α-olefin compound to the total mass of the copolymerization components may be in the range of 10 to 70 mass%. The ratio of the polyvinyl compound to the total mass of the copolymerization components may be in the range of 0.05 to 10 mass% from the viewpoint of the balance between the performance as an elastomer and the heat resistance of the cured product of the resin composition. That is, the content of the styrene structural unit of the styrene-α-olefin compound-polyvinyl compound copolymer may be 30 to 70 mass%. Also, the content of the α-olefin compound structural unit may be in the range of 10 to 70 mass%. The content of the polyvinyl compound structural unit may be in the range of 0.05 to 10 mass%.
硬化性組成物がエラストマを含む場合、エラストマの含有量は、硬化性組成物の硬化性成分とエラストマとの合計100質量部に対し、1質量部以上であってよく、5質量部以上であってもよく、10質量部以上であってもよい。また、80質量部以下であってよく、50質量部以下であってもよく、30質量部以下であってもよい。 When the curable composition contains an elastomer, the content of the elastomer may be 1 part by mass or more, 5 parts by mass or more, or 10 parts by mass or more per 100 parts by mass of the total of the curable components and elastomer of the curable composition. It may also be 80 parts by mass or less, 50 parts by mass or less, or 30 parts by mass or less.
フェノール性水酸基を有する化合物(以下これを「化合物C」と呼ぶことがある)について、その具体構造は特に限定されないが、フェノール性水酸基のオルト位が水素原子である化合物を硬化性組成物に添加することにより、硬化物の長期耐熱劣化性に優れる効果がより顕著となる。特定の理論に拘束されるものではないが、化合物Cが硬化性組成物の硬化阻害を生じない程度の穏和なラジカル捕獲剤として働き、それによりBステージ化物における溶融粘度の上昇が遅延される結果、前述のような機序により、長期耐熱劣化性に優れる効果が得られるものと考えられる。 The compound having a phenolic hydroxyl group (hereinafter sometimes referred to as "compound C") is not particularly limited in its specific structure, but by adding a compound in which the ortho position of the phenolic hydroxyl group is a hydrogen atom to the curable composition, the effect of excellent long-term heat deterioration resistance of the cured product becomes more pronounced. Without being bound by a particular theory, it is believed that compound C acts as a mild radical scavenger that does not inhibit the curing of the curable composition, thereby delaying the increase in melt viscosity in the B-stage product, and as a result, the effect of excellent long-term heat deterioration resistance is obtained through the mechanism described above.
化合物Cは一種類を単独で用いてもよいし、二種類以上を併用してもよい。化合物Cが一分子中に有するフェノール性水酸基の数は1又は2以上のいずれでもよい。中でも、硬化物における長期耐熱劣化性により優れることから1又は2であることが好ましく、1であることがより好ましい。 Compound C may be used alone or in combination of two or more types. The number of phenolic hydroxyl groups in one molecule of compound C may be either 1 or 2 or more. Of these, 1 or 2 is preferred, and 1 is more preferred, as this provides superior long-term heat deterioration resistance in the cured product.
化合物Cは、溶剤溶解性等に優れることから、分子量が500以下の化合物であることが好ましい。化合物Cの分子量は140以上であってよく、150以上であってもよく、170以上であってもよい。また、450以下であってよく、400以下であってもよい。 Compound C is preferably a compound having a molecular weight of 500 or less, since it has excellent solvent solubility, etc. The molecular weight of compound C may be 140 or more, 150 or more, or 170 or more. It may also be 450 or less, or 400 or less.
化合物Cにおいてフェノール性水酸基が結合している芳香環は特に限定なく、芳香族炭化水素の他、複素芳香環であってもよい。具体例としては、ベンゼン、インデン、ナフタレン、フルオレン、アントラセン、フェナントレン、テトラセン、クリセン、ピレン、トリフェニレン等の芳香族炭化水素、フラン、チオフェン、ピロール、ピラゾール、イミダゾール、ピリジン、ピリダジン、ピリミジン、ピラジン等の複素芳香環等が挙げられる。中でも、誘電特性に優れる硬化物が得られることから芳香族炭化水素が好ましく、ベンゼン、ナフタレンがより好ましい。また、化合物Cは芳香環を複数含む化合物であってもよく、具体的には、ベンゼン、ナフタレン、又はこれらの組み合わせを2つ以上含む化合物であってもよい。 In compound C, the aromatic ring to which the phenolic hydroxyl group is bonded is not particularly limited, and may be an aromatic hydrocarbon or a heteroaromatic ring. Specific examples include aromatic hydrocarbons such as benzene, indene, naphthalene, fluorene, anthracene, phenanthrene, tetracene, chrysene, pyrene, and triphenylene, and heteroaromatic rings such as furan, thiophene, pyrrole, pyrazole, imidazole, pyridine, pyridazine, pyrimidine, and pyrazine. Among these, aromatic hydrocarbons are preferred, and benzene and naphthalene are more preferred, since they provide a cured product with excellent dielectric properties. Compound C may also be a compound containing multiple aromatic rings, and specifically may be a compound containing two or more benzene, naphthalene, or a combination thereof.
化合物Cの具体例としては、例えば、下記一般式(8)~(12)のいずれかで表される化合物等が挙げられる。 Specific examples of compound C include compounds represented by any of the following general formulas (8) to (12).
[一般式(8)~(12)中のXは水酸基以外の1価の有機基、又は水素原子を示す。式中に複数存在するXは全てが同一であってもよいし、一部ないし全部が異なっていてもよい。一般式(10)~(12)中のYは直接結合又は2価の有機基である。一般式(11)、(12)においてYはナフタレン環を形成する何れの炭素原子と結合していてもよい。] [X in general formulas (8) to (12) represents a monovalent organic group other than a hydroxyl group, or a hydrogen atom. Multiple Xs in the formula may all be the same, or some or all of them may be different. Y in general formulas (10) to (12) represents a direct bond or a divalent organic group. In general formulas (11) and (12), Y may be bonded to any carbon atom forming a naphthalene ring.]
式(8)~(12)中のXは水酸基以外の1価の有機基又は水素原子である。水酸基以外の1価の有機基の具体例としては、例えば、フッ素原子、塩素原子、臭素原子、ヨウ素原子等のハロゲン原子、カルボキシ基、脂肪族炭化水素基(隣接する炭素原子に結合する2つのXで脂環構造を形成するものを含む)、脂肪族炭化水素基の炭素原子の1つ又は2つ以上が酸素原子に置き換わったもの、脂肪族炭化水素基の炭素原子の1つ又は2つ以上がカルボニル基に置き換わったもの、アリール基、アリールオキシ基、アラルキル基、アラルキルオキシ基等が挙げられる。 X in formulas (8) to (12) is a monovalent organic group other than a hydroxyl group or a hydrogen atom. Specific examples of monovalent organic groups other than a hydroxyl group include, for example, halogen atoms such as fluorine, chlorine, bromine, and iodine atoms, carboxy groups, aliphatic hydrocarbon groups (including those in which two Xs bonded to adjacent carbon atoms form an alicyclic structure), aliphatic hydrocarbon groups in which one or more carbon atoms are replaced by oxygen atoms, aliphatic hydrocarbon groups in which one or more carbon atoms are replaced by carbonyl groups, aryl groups, aryloxy groups, aralkyl groups, and aralkyloxy groups.
脂肪族炭化水素基は、直鎖のもの、分岐構造を有するもの、脂環構造を有するもの等、どのような構造を有するものであってもよい。脂肪族炭化水素基の炭素原子数は特に限定なく、例えば、1以上であってよく、8以下であってよい。脂肪族炭化水素基の具体例としては、例えば、メチル基、エチル基、n-プロピル基、イソプロピル基、n-ブチル基、sec-ブチル基、イソブチル基、t-ブチル基、n-ペンチル基、ネオペンチル基、1-メチルブチル基、3-メチルブチル基、1,1,-ジメチルプロピル基、n-ヘキシル基、イソヘキシル基、n-ヘプチル基、n-オクチル基、2-エチルヘキシル基、1,1,3,3-テトラメチルブチル等のアルキル基;シクロヘキシル基等の脂環式アルキル基;5,6,7,8-テトラヒドロ-2-ナフトール等、隣接する炭素原子に結合する2つのXで脂環構造を形成したもの等が挙げられる。 The aliphatic hydrocarbon group may have any structure, such as a straight chain, a branched structure, or an alicyclic structure. The number of carbon atoms in the aliphatic hydrocarbon group is not particularly limited, and may be, for example, 1 or more and 8 or less. Specific examples of aliphatic hydrocarbon groups include alkyl groups such as methyl, ethyl, n-propyl, isopropyl, n-butyl, sec-butyl, isobutyl, t-butyl, n-pentyl, neopentyl, 1-methylbutyl, 3-methylbutyl, 1,1-dimethylpropyl, n-hexyl, isohexyl, n-heptyl, n-octyl, 2-ethylhexyl, and 1,1,3,3-tetramethylbutyl; alicyclic alkyl groups such as cyclohexyl; and alicyclic structures formed by two Xs bonded to adjacent carbon atoms, such as 5,6,7,8-tetrahydro-2-naphthol.
脂肪族炭化水素基の炭素原子の1つ又は2つ以上が酸素原子に置き換わったものとしては、例えば、メトキシ基、エトキシ基等のアルコキシ基;メトキシメチル基等のアルキルオキシアルキレン基;メトキシメトキシ基等、酸素原子を複数含む構造等が挙げられる。 Examples of aliphatic hydrocarbon groups in which one or more carbon atoms have been replaced with oxygen atoms include alkoxy groups such as methoxy and ethoxy groups; alkyloxyalkylene groups such as methoxymethyl groups; and structures containing multiple oxygen atoms such as methoxymethoxy groups.
脂肪族炭化水素基の炭素原子の1つ又は2つ以上がカルボニル基に置き換わったものとしては、例えば、アシル基の他、3-オキソブチル基等が挙げられる。 Examples of aliphatic hydrocarbon groups in which one or more carbon atoms have been replaced with a carbonyl group include acyl groups and 3-oxobutyl groups.
アリール基としては、例えば、フェニル着、トリル基、キシリル基、メシチル基、ナフチル基等が挙げられる。アリールオキシ基としては、例えば、フェニルオキシ基、トリルオキシ基、キシリルオキシ基、メシチルオキシ基、ナフチルオキシ基等が挙げられる。 Examples of aryl groups include phenyl, tolyl, xylyl, mesityl, and naphthyl groups. Examples of aryloxy groups include phenyloxy, tolyloxy, xylyloxy, mesityloxy, and naphthyloxy groups.
アラルキル基としては、例えば、ベンジル基、α-メチルベンジル基、トリフェニルメチル基、ナフチルメチル基等が挙げられる。アラルキルオキシ基としては、例えば、ベンジルオキシ基等が挙げられる。 Examples of aralkyl groups include benzyl groups, α-methylbenzyl groups, triphenylmethyl groups, naphthylmethyl groups, etc. Examples of aralkyloxy groups include benzyloxy groups, etc.
一般式(8)、(9)において、式中に存在するXのうち、一価の有機基の数は0、1又は2であってよく、0又は1であってもよい。一般式(10)~(12)において、各芳香環上に存在するXのうち、一価の有機基の数は0、1又は2であってよく、0又は1であってもよい。 In general formulas (8) and (9), the number of monovalent organic groups among the Xs present in the formula may be 0, 1 or 2, or may be 0 or 1. In general formulas (10) to (12), the number of monovalent organic groups among the Xs present on each aromatic ring may be 0, 1 or 2, or may be 0 or 1.
一価の有機基は、カルボキシ基、アルキル基、アリール基のいずれかであってもよい。化合物Aがカルボキシ基を有する化合物である場合、硬化物の長期耐熱性に加え、銅箔等の金属箔密着性にも優れる硬化性組成物となり得る。また、一価の有機基がアリール基である場合、硬化物の長期耐熱性により優れる硬化性組成物となり得る。 The monovalent organic group may be any one of a carboxy group, an alkyl group, and an aryl group. When compound A is a compound having a carboxy group, the curable composition may have excellent long-term heat resistance of the cured product as well as excellent adhesion to metal foils such as copper foil. When the monovalent organic group is an aryl group, the curable composition may have even more excellent long-term heat resistance of the cured product.
一般式(10)~(12)中のYは直接結合又は2価の有機基である。2価の有機基としては、例えば、エーテル結合;メチレン基、イソプロピリデン基等、炭素原子数1~6のアルキレン基;シクロへキシレン基等のシクロアルキレン基;フェニレン基、ナフチレン基等のアリーレン基;-O-Ar-O-(Arはアリーレン基を表す)で表される構造部位等が挙げられる。一般式(10)~(12)中のYは直接結合であってもよい。 Y in the general formulas (10) to (12) is a direct bond or a divalent organic group. Examples of divalent organic groups include ether bonds; alkylene groups having 1 to 6 carbon atoms, such as a methylene group or an isopropylidene group; cycloalkylene groups, such as a cyclohexylene group; arylene groups, such as a phenylene group or a naphthylene group; and structural moieties represented by -O-Ar-O- (Ar represents an arylene group). Y in the general formulas (10) to (12) may be a direct bond.
一般式(8)~(12)のいずれかで表される化合物について、その一部を以下に例示するが、本開示における化合物Cはこれに限定されるものではない。なお、下記の構造式においてナフタレン環上の置換基はナフタレン環を形成する何れの炭素原子と結合していてもよい。ただし、フェノール性水酸基の2つのオルト位は水素原子である。 Some of the compounds represented by any of the general formulas (8) to (12) are exemplified below, but compound C in this disclosure is not limited to these. In the structural formula below, the substituent on the naphthalene ring may be bonded to any of the carbon atoms forming the naphthalene ring. However, the two ortho positions of the phenolic hydroxyl group are hydrogen atoms.
化合物Cは、溶剤溶解性等に優れることから、一般式(8)又は(9)で表される化合物を含むことが好ましい。化合物C全体に占める、一般式(8)又は(9)で表される化合物の合計の割合は、50質量%以上であってよく、70質量%以上であってもよく、80質量%以上であってよい。また、100%以下であってよく、90質量%以下であってもよく、70質量%以下であってもよい。 Compound C preferably contains a compound represented by general formula (8) or (9) because of its excellent solvent solubility. The total proportion of the compounds represented by general formula (8) or (9) in the entire compound C may be 50% by mass or more, 70% by mass or more, or 80% by mass or more. It may also be 100% by mass or less, 90% by mass or less, or 70% by mass or less.
化合物Cの添加量は、硬化物の長期耐熱劣化性に優れる他、硬化性及び硬化物の誘電特性にも優れる硬化性組成物となることから、ラジカル重合性基を有する化合物の総質量に対する化合物Cの割合が、0.5質量%以上であることが好ましく、1質量%以上であることがより好ましく、1.5質量%以上であることが特に好ましい。また、10質量%以下であることが好ましく、8質量%以下であることがより好ましく、6質量%以下であることが特に好ましい。ラジカル重合性基を有する化合物の総質量に対する化合物Cの割合は、例えば、0.5~10質量%の範囲であってよく、1~8質量%の範囲であってもよく、1.5~6質量%の範囲であってもよい。 The amount of compound C added is such that the curable composition has excellent long-term heat deterioration resistance of the cured product as well as excellent curability and dielectric properties of the cured product, and therefore the ratio of compound C to the total mass of compounds having radical polymerizable groups is preferably 0.5 mass% or more, more preferably 1 mass% or more, and particularly preferably 1.5 mass% or more. Also, it is preferably 10 mass% or less, more preferably 8 mass% or less, and particularly preferably 6 mass% or less. The ratio of compound C to the total mass of compounds having radical polymerizable groups may be, for example, in the range of 0.5 to 10 mass%, may be in the range of 1 to 8 mass%, or may be in the range of 1.5 to 6 mass%.
また、硬化性組成物が熱硬化性化合物又はエラストマ、或いはその両方を含む場合、化合物Cの添加量は、硬化性組成物中の硬化性成分とエラストマとの合計100質量部に対し、0.5質量%以上であることが好ましく、1質量%以上であることがより好ましく、1.5質量%以上であることが特に好ましい。また、10質量%以下であることが好ましく、8質量%以下であることがより好ましく、6質量%以下であることが特に好ましい。硬化性組成物中の硬化性組成物の硬化性成分とエラストマとの合計100質量部に対する化合物Cの割合は、例えば、0.5~10質量%の範囲であってよく、1~8質量%の範囲であってもよく、1.5~6質量%の範囲であってもよい In addition, when the curable composition contains a thermosetting compound or an elastomer, or both, the amount of compound C added is preferably 0.5 mass% or more, more preferably 1 mass% or more, and particularly preferably 1.5 mass% or more, based on 100 mass parts in total of the curable components and elastomer in the curable composition. Also, it is preferably 10 mass% or less, more preferably 8 mass% or less, and particularly preferably 6 mass% or less. The ratio of compound C in the curable composition to 100 mass parts in total of the curable components and elastomer of the curable composition may be, for example, in the range of 0.5 to 10 mass%, may be in the range of 1 to 8 mass%, or may be in the range of 1.5 to 6 mass%.
充填材は、有機充填材及び無機充填材のどちらも用いることができるが、無機充填材が好ましい。無機充填材としては、例えば、シリカ(SiO2)、アルミナ(Al2O3)、酸化チタン、チタン酸バリウム、チタン酸ストロンチウム、チタン酸カリウム、チタン酸カルシウム、炭酸アルミニウム、水酸化マグネシウム、水酸化アルミニウム、ケイ酸アルミニウム、炭酸カルシウム、ケイ酸カルシウム、ケイ酸マグネシウム、窒化ケイ素、窒化ホウ素、ホウ酸アルミニウム、炭化ケイ素、マイカ、ベリリア、クレー、タルク等が挙げられる。誘電特性の観点からシリカが好ましい。 The filler can be either an organic filler or an inorganic filler, but is preferably an inorganic filler. Examples of inorganic fillers include silica (SiO 2 ), alumina (Al 2 O 3 ), titanium oxide, barium titanate, strontium titanate, potassium titanate, calcium titanate, aluminum carbonate, magnesium hydroxide, aluminum hydroxide, aluminum silicate, calcium carbonate, calcium silicate, magnesium silicate, silicon nitride, boron nitride, aluminum borate, silicon carbide, mica, beryllia, clay, and talc. From the viewpoint of dielectric properties, silica is preferred.
充填材の形状及び大きさは特に限定されない。充填材の平均粒子径は、例えば、0.01~20μm、又は0.1~10μmであってもよい。ここで、充填材の平均粒子径は、レーザー回折散乱法による体積基準の粒子分布において、積算値50%に相当する点の粒子径である。 The shape and size of the filler are not particularly limited. The average particle size of the filler may be, for example, 0.01 to 20 μm, or 0.1 to 10 μm. Here, the average particle size of the filler is the particle size at the point corresponding to an accumulated value of 50% in the volume-based particle distribution measured by the laser diffraction scattering method.
硬化性組成物が充填材を含有する場合、充填材の添加量は、130℃で10分加熱した後の硬化性組成物100質量部中の無機充填材の割合が50~85質量%の範囲であるように調整されることが好ましい。例えば、硬化性組成物の充填材の添加量は、硬化性組成物の硬化性成分とエラストマとの合計100質量部に対し、100~500質量部の範囲であってよい。 When the curable composition contains a filler, the amount of filler added is preferably adjusted so that the proportion of inorganic filler in 100 parts by mass of the curable composition after heating at 130°C for 10 minutes is in the range of 50 to 85% by mass. For example, the amount of filler added to the curable composition may be in the range of 100 to 500 parts by mass per 100 parts by mass of the total of the curable components and elastomer of the curable composition.
硬化促進剤は、例えば、ラジカル重合開始剤を用いることができる。ラジカル重合開始剤としては、熱ラジカル重合開始剤であってもよいし、光ラジカル重合開始剤であってもよいが、熱ラジカル重合開始剤が好ましい。ラジカル重合開始剤は、特に限定されず、アゾ系重合開始剤、有機過酸化物系重合開始剤等が挙げられる。アゾ系重合開始剤としては、例えば、2,2’-アゾビス(2,4,4-トリメチルペンタン)、ジメチル2,2’-アゾビス(2-メチルプロピオネート)、2,2’-アゾビス(N-ブチル-2-メチルプロピオンアミド)、2,2’-アゾビス[N-(2-プロペニル)-2-メチルプロピオンアミド]、1,1’-アゾビス(シクロヘキサン-1-カルボニトリル)、ジメチル1,1’-アゾビス(1-シクロヘキサンカルボキシレート)、2,2’-アゾビス(イソブチロニトリル)、2,2’-アゾビス(2-メチルプロパンニトリル)、2,2’-アゾビス(2-メチルブチロニトリル)、2,2’-アゾビス(4-メトキシ-2,4-ジメチルバレロニトリル)、2,2’-アゾビス(2,4-ジメチルバレロニトリル)、4,4’-アゾビス(3,3,4,4,5,5,6,6,7,7,8,8,8-トリデカフルオロオクチル4-シアノペンタノアート)等が挙げられる。有機過酸化物系重合開始剤としては、例えば、ジクミルパーオキサイド、ジベンゾイルパーオキサイド、2-ブタノンパーオキサイド、tert-ブチルパーベンゾエイト、ジ-tert-ブチルパーオキサイド、2,5-ジメチル-2,5-ジ(t-ブチルパーオキシ)ヘキサン、α,α’-ジ(t-ブチルパーオキシ)ジイソプロピルベンゼン、及びtert-ブチルヒドロパーオキシド等が挙げられる。 The curing accelerator may be, for example, a radical polymerization initiator. The radical polymerization initiator may be a thermal radical polymerization initiator or a photoradical polymerization initiator, but a thermal radical polymerization initiator is preferred. The radical polymerization initiator is not particularly limited, and examples thereof include azo-based polymerization initiators and organic peroxide-based polymerization initiators. Examples of azo-based polymerization initiators include 2,2'-azobis(2,4,4-trimethylpentane), dimethyl 2,2'-azobis(2-methylpropionate), 2,2'-azobis(N-butyl-2-methylpropionamide), 2,2'-azobis[N-(2-propenyl)-2-methylpropionamide], 1,1'-azobis(cyclohexane-1-carbonitrile), and dimethyl 1,1'-azobis(1-cyclohexanecarboxylate). , 2,2'-azobis(isobutyronitrile), 2,2'-azobis(2-methylpropanenitrile), 2,2'-azobis(2-methylbutyronitrile), 2,2'-azobis(4-methoxy-2,4-dimethylvaleronitrile), 2,2'-azobis(2,4-dimethylvaleronitrile), 4,4'-azobis(3,3,4,4,5,5,6,6,7,7,8,8,8-tridecafluorooctyl 4-cyanopentanoate), and the like. Examples of organic peroxide polymerization initiators include dicumyl peroxide, dibenzoyl peroxide, 2-butanone peroxide, tert-butyl perbenzoate, di-tert-butyl peroxide, 2,5-dimethyl-2,5-di(t-butylperoxy)hexane, α,α'-di(t-butylperoxy)diisopropylbenzene, and tert-butyl hydroperoxide.
硬化性組成物が硬化促進剤を含有する場合、硬化促進剤の添加量は、硬化性組成物中の硬化性組成物の硬化性成分とエラストマとの合計100質量部に対し、0.01~5質量部の範囲であってよい。 When the curable composition contains a curing accelerator, the amount of the curing accelerator added may be in the range of 0.01 to 5 parts by mass per 100 parts by mass of the total of the curable components of the curable composition and the elastomer in the curable composition.
硬化性組成物は、無溶媒であってもよく、溶媒を含んでもよい。溶媒は、硬化性組成物の粘度を調節して塗工性をより改善することができる。溶媒としては有機溶剤が好ましい。 The curable composition may be solvent-free or may contain a solvent. The solvent can adjust the viscosity of the curable composition to further improve the coatability. The solvent is preferably an organic solvent.
有機溶剤としては、例えば、エタノール、プロパノール、ブタノール、メチルセロソルブ、エチレングリコールモノブチルエーテル、プロピレングリコールモノメチルエーテル等のアルコール系溶剤;アセトン、メチルエチルケトン、メチルイソブチルケトン、シクロヘキサノン等のケトン系溶剤;テトラヒドロフラン等のエーテル系溶剤;トルエン、キシレン、メシチレン等の芳香族炭化水素系溶剤;ジメチルホルムアミド、ジメチルアセトアミド、N-メチルピロリドン等の窒素原子含有溶剤;ジメチルスルホキシド等の硫黄原子含有溶剤;γ-ブチロラクトン等のエステル系溶剤などが挙げられる。中でも、沸点が120℃以下であるものが好ましい。有機溶剤を複数種用いた混合溶媒とする場合には、当該混合溶媒での沸点が120℃以下であることが好ましい。 Examples of organic solvents include alcohol-based solvents such as ethanol, propanol, butanol, methyl cellosolve, ethylene glycol monobutyl ether, and propylene glycol monomethyl ether; ketone-based solvents such as acetone, methyl ethyl ketone, methyl isobutyl ketone, and cyclohexanone; ether-based solvents such as tetrahydrofuran; aromatic hydrocarbon-based solvents such as toluene, xylene, and mesitylene; nitrogen-containing solvents such as dimethylformamide, dimethylacetamide, and N-methylpyrrolidone; sulfur-containing solvents such as dimethylsulfoxide; and ester-based solvents such as γ-butyrolactone. Among these, those with a boiling point of 120°C or less are preferred. When using multiple organic solvents to prepare a mixed solvent, it is preferred that the mixed solvent has a boiling point of 120°C or less.
硬化性組成物が溶媒を含む場合、硬化性組成物の固形分量は、化合物Aの種類、及びその他の化合物を含有するか否か等に応じて適宜調整される。例えば、硬化性組成物の全質量に対する固形分の割合は30~95質量%の範囲であってよい。なお、硬化性組成物の固形分量とは、硬化性組成物中の溶媒以外の成分を指す。 When the curable composition contains a solvent, the solid content of the curable composition is adjusted appropriately depending on the type of compound A and whether or not other compounds are contained. For example, the ratio of the solid content to the total mass of the curable composition may be in the range of 30 to 95 mass %. The solid content of the curable composition refers to the components other than the solvent in the curable composition.
硬化性組成物の製造方法は特に限定されない。硬化性組成物の製造方法の一例としては、化合物A及び必要に応じて用いる任意成分を加えて混合する方法が挙げられる。より詳しくは、例えば、化合物A及び必要に応じて用いる任意成分を溶媒に溶解又は分散させて混合し、硬化性組成物を得ることができる。各成分の混合順序、温度、時間等の条件は、特に限定されず、原料の種類、製造規模、製造装置等に応じて適宜調節すればよい。 The method for producing the curable composition is not particularly limited. One example of a method for producing the curable composition is a method in which compound A and any optional components used as needed are added and mixed. More specifically, for example, compound A and any optional components used as needed can be dissolved or dispersed in a solvent and mixed to obtain a curable composition. The mixing order, temperature, time, and other conditions for each component are not particularly limited, and may be appropriately adjusted depending on the type of raw material, production scale, production equipment, etc.
[プリプレグ]
一実施形態によれば、硬化性組成物又は硬化性組成物の半硬化物を含むプリプレグを提供することができる。このプリプレグは、例えば、硬化性組成物と繊維基材とを用いて形成することができる。硬化性組成物としては、上記した硬化性組成物を用いることができる。硬化性組成物の詳細については上記説明した通りである。
[Prepreg]
According to one embodiment, a prepreg including a curable composition or a semi-cured product of the curable composition can be provided. The prepreg can be formed, for example, by using the curable composition and a fiber substrate. The curable composition can be the above-mentioned curable composition. Details of the curable composition are as described above.
プリプレグは、上記した硬化性組成物又は上記した硬化性組成物の半硬化物を含む。半硬化物について、本開示では半硬化物の一つの指標として、JIS K 6800(1985)におけるB-ステージの状態を挙げることができる。プリプレグは、例えば、硬化性組成物又は硬化性組成物の半硬化物と、シート状繊維基材等の繊維基材と、を含有するものであってよい。プリプレグにおいて、硬化性組成物は未硬化状態であってもよいが、硬化性組成物は部分的又は全体的に半硬化の状態であってもよい。 The prepreg contains the above-mentioned curable composition or a semi-cured product of the above-mentioned curable composition. In this disclosure, the semi-cured product can be considered to be in the B-stage state in JIS K 6800 (1985) as one indicator of the semi-cured product. The prepreg may contain, for example, the curable composition or a semi-cured product of the curable composition and a fiber substrate such as a sheet-like fiber substrate. In the prepreg, the curable composition may be in an uncured state, but the curable composition may be in a partially or entirely semi-cured state.
プリプレグは、例えば、繊維基材に硬化性組成物を塗工し、乾燥させることで得ることができる。例えば、プリプレグは、繊維基材を硬化性組成物に含浸塗工させ、硬化性組成物が含浸された繊維基材を乾燥させることで得ることができる。乾燥は、硬化性組成物に含まれ得る溶媒等の揮発成分が除去される温度以上で行うことが好ましく、用途に応じて硬化性組成物に含まれる熱硬化性樹脂が半硬化する温度以上で行ってもよい。また、乾燥は、硬化性組成物に含まれる熱硬化性樹脂が完全に硬化されないように調節されるとよい。このような観点から、乾燥温度は、例えば、80~200℃であってよく、乾燥時間は、乾燥温度及び乾燥装置、その規模等に応じて、例えば、1~30分間であってよい。 The prepreg can be obtained, for example, by coating a fiber substrate with a curable composition and drying it. For example, the prepreg can be obtained by impregnating and coating a fiber substrate with a curable composition and drying the fiber substrate impregnated with the curable composition. Drying is preferably performed at a temperature at which volatile components such as a solvent that may be contained in the curable composition are removed or higher, and may be performed at a temperature at which the thermosetting resin contained in the curable composition is semi-cured or higher depending on the application. In addition, drying is preferably adjusted so that the thermosetting resin contained in the curable composition is not completely cured. From this perspective, the drying temperature may be, for example, 80 to 200°C, and the drying time may be, for example, 1 to 30 minutes depending on the drying temperature, the drying device, and its scale.
繊維基材は、織物、編物、及び不織布のいずれであってもよい。繊維基材は、チョップドストランドマット、ロービング等の形状で提供されてもよい。繊維の材質としては、無機繊維及び有機繊維のいずれであってもよい。無機繊維としては、ガラス繊維、炭素繊維等が挙げられる。ガラス繊維としては、Eガラス、NEガラス、Dガラス、Sガラス、Qガラス等が挙げられる。有機繊維としては、ポリイミド、ポリエステル、テトラフルオロエチレン等が挙げられる。繊維基材は、これらの繊維を1種単独で用いたものであってもよいし、これらの2種以上を組み合わせて用いたものであってもよい。繊維基材の材質は、誘電特性及び耐熱性の観点から、無機繊維が好ましく、ガラス繊維がより好ましい。 The fiber substrate may be any of woven fabric, knitted fabric, and nonwoven fabric. The fiber substrate may be provided in the form of chopped strand mat, roving, etc. The fiber material may be any of inorganic fibers and organic fibers. Examples of inorganic fibers include glass fibers and carbon fibers. Examples of glass fibers include E glass, NE glass, D glass, S glass, Q glass, etc. Examples of organic fibers include polyimide, polyester, tetrafluoroethylene, etc. The fiber substrate may be one of these fibers alone or two or more of these fibers in combination. From the viewpoints of dielectric properties and heat resistance, the material of the fiber substrate is preferably inorganic fiber, and more preferably glass fiber.
繊維基材は、プリプレグの用途に応じて適宜選択すればよいが、シート状繊維基材が好ましい。シート状繊維基材としては、例えば、公知の電気絶縁材料用積層板において用いられている各種のシート状繊維基材であってよい。シート状繊維基材の厚さは特に限定されないが、例えば、0.01~0.1mmが好ましい。ここで、厚さは、シート状繊維基材の全面において均等な距離で5点の厚さを測定し、5点の算術平均値とする。 The fiber substrate may be selected appropriately depending on the application of the prepreg, but a sheet-like fiber substrate is preferred. The sheet-like fiber substrate may be, for example, any of the various sheet-like fiber substrates used in known laminates for electrical insulating materials. The thickness of the sheet-like fiber substrate is not particularly limited, but is preferably, for example, 0.01 to 0.1 mm. Here, the thickness is determined by measuring the thickness at five points at equal distances over the entire surface of the sheet-like fiber substrate, and taking the arithmetic average value of the five points.
[金属張積層板]
一実施形態によれば、プリプレグの硬化物と金属箔とを含む金属張積層板を提供することができる。硬化性組成物及びプリプレグの詳細については上記説明した通りである。本開示において、硬化物の一つの指標として、JIS K 6800(1985)におけるC-ステージの状態を挙げることができる。
[Metal-clad laminate]
According to one embodiment, a metal-clad laminate including a cured prepreg and a metal foil can be provided. The details of the curable composition and the prepreg are as described above. In the present disclosure, one index of the cured product is the C-stage state in JIS K 6800 (1985).
金属張積層板は、プリプレグ層と、プリプレグ層の少なくとも一方の面に配置される金属箔とを含むことが好ましい。プリプレグ層は上記したプリプレグの硬化物である。例えば、金属張積層板において、プリプレグの硬化物の少なくとも一方の面に金属箔が配置され、より好ましくはプリプレグの硬化物の両面に金属箔が配置される。金属張積層板は、1枚のシート状プリプレグの少なくとも一方の面に金属箔が配置されて製造されるものであってもよく、2枚以上のシート状プリプレグを積層し、積層体の最外面の少なくとも一方の面に金属箔が配置されて製造されるものであってもよい。例えば、金属張積層板は、2枚以上のシート状プリプレグを積層し、この積層体の両面に金属箔が配置されて製造されるものであってよい。 The metal-clad laminate preferably includes a prepreg layer and metal foil disposed on at least one surface of the prepreg layer. The prepreg layer is a cured product of the prepreg described above. For example, in the metal-clad laminate, metal foil is disposed on at least one surface of the cured product of the prepreg, and more preferably, metal foil is disposed on both surfaces of the cured product of the prepreg. The metal-clad laminate may be manufactured by disposing metal foil on at least one surface of a single sheet-like prepreg, or may be manufactured by laminating two or more sheet-like prepregs and disposing metal foil on at least one surface of the outermost surface of the laminate. For example, the metal-clad laminate may be manufactured by laminating two or more sheet-like prepregs and disposing metal foil on both surfaces of the laminate.
以下、金属張積層板を製造する方法の具体例として、2枚以上のシート状プリプレグの積層体に金属箔を配置する方法を説明する。 Below, we will explain a specific example of a method for manufacturing a metal-clad laminate, in which metal foil is placed on a laminate of two or more sheet-like prepregs.
まず、2枚以上のシート状プリプレグを積層し、積層体を得る。この積層体において、2枚以上のシート状プリプレグは互いに同一であっても、一部又は全てが異なってもよい。積層体において、2枚以上のシート状プリプレグのうち少なくとも1枚が一実施形態によるプリプレグ用硬化性組成物を用いて得られたものであればよい。 First, two or more sheet-like prepregs are laminated to obtain a laminate. In this laminate, the two or more sheet-like prepregs may be identical to each other, or some or all of them may be different. In the laminate, at least one of the two or more sheet-like prepregs may be obtained using the curable composition for prepregs according to one embodiment.
次に、この積層体の少なくとも一方の面に金属箔を配置する。この金属箔が配置された積層体を加熱加圧する。これによってシート状プリプレグの硬化反応が進行して、プリプレグの硬化物を得ることができる。また、互いに隣接するシート状プリプレグを固着させることができる。加熱加圧条件は特に限定されないが、例えば、温度100~300℃、時間10~300分間、圧力0.5~50MPaとすることができる。また、加熱加圧の後に、プリプレグの硬化をより進行させるために、再加熱を行ってもよい。この場合の再加熱温度は100~300℃であってよい。
加圧方法としては、例えば、オートクレーブ成形機、多段プレス機、多段真空プレス機、連続成形機等を用いることができる。
Next, a metal foil is placed on at least one surface of this laminate. The laminate on which the metal foil is placed is heated and pressurized. This advances the curing reaction of the sheet-like prepreg, and a cured prepreg can be obtained. In addition, adjacent sheet-like prepregs can be fixed to each other. The heating and pressurizing conditions are not particularly limited, but may be, for example, a temperature of 100 to 300°C, a time of 10 to 300 minutes, and a pressure of 0.5 to 50 MPa. After heating and pressurizing, reheating may be performed to further advance the curing of the prepreg. In this case, the reheating temperature may be 100 to 300°C.
As a method for applying pressure, for example, an autoclave molding machine, a multi-stage press machine, a multi-stage vacuum press machine, a continuous molding machine, etc. can be used.
金属箔の金属としては、特に限定されず、例えば、銅、ニッケル、アルミニウム、金、銀、白金、モリブデン、ルテニウム、タングステン、鉄、チタン、クロム等、これらの金属元素を2種以上含む合金等が挙げられる。工業的に銅、ニッケル、アルミニウムの単体金属であるとよい。金属箔として銅を用いることで、銅張積層板を提供することができる。 The metal of the metal foil is not particularly limited, and examples include copper, nickel, aluminum, gold, silver, platinum, molybdenum, ruthenium, tungsten, iron, titanium, chromium, and alloys containing two or more of these metal elements. Industrially, it is preferable to use the single metals copper, nickel, and aluminum. By using copper as the metal foil, it is possible to provide a copper-clad laminate.
[プリント配線板]
一実施形態によれば、プリプレグの硬化物を含むプリント配線板を提供することができる。プリント配線板は、プリプレグ、金属張積層板、又はこれらの組み合わせを用いて製造することができる。例えば、金属張積層板を用いて、公知の方法により、配線を形成することで、プリント配線板を提供することができる。プリプレグ及び金属張積層板の詳細については上記説明した通りである。プリント配線板は、単層プリント配線板及び多層プリント配線板のいずれであってもよい。
[Printed wiring board]
According to one embodiment, a printed wiring board including a cured product of a prepreg can be provided. The printed wiring board can be manufactured using a prepreg, a metal-clad laminate, or a combination thereof. For example, a printed wiring board can be provided by forming wiring using a metal-clad laminate by a known method. The details of the prepreg and the metal-clad laminate are as described above. The printed wiring board may be either a single-layer printed wiring board or a multilayer printed wiring board.
[半導体パッケージ]
一実施形態によれば、プリント配線板と、半導体素子とを含む、半導体パッケージを提供することができる。より詳細には、例えば、プリプレグの硬化物を含むプリント配線板と、半導体素子とを含む、半導体パッケージを提供することができる。半導体パッケージは、例えば、プリント配線板に、公知の方法によって、半導体素子、メモリ等を搭載することによって製造することができる。
[Semiconductor package]
According to one embodiment, a semiconductor package including a printed wiring board and a semiconductor element can be provided. More specifically, for example, a semiconductor package including a printed wiring board including a cured product of a prepreg and a semiconductor element can be provided. The semiconductor package can be manufactured, for example, by mounting a semiconductor element, a memory, and the like on a printed wiring board by a known method.
[成形品]
一実施形態によれば、硬化性組成物の硬化物を含む成形品を提供することができる。当該成形品は、硬化性組成物を何かしらの形状に成形したものであり、その形状は特に限定されない。例えば、3次元の構造物の他、フィルム状、板状のものであってもよい。また、成形品は本開示の硬化性組成物以外の樹脂材料、強化繊維等を含む複合化物であってもよい。
[Molded product]
According to one embodiment, a molded article including a cured product of the curable composition can be provided. The molded article is obtained by molding the curable composition into some shape, and the shape is not particularly limited. For example, the molded article may be a three-dimensional structure, a film, or a plate. The molded article may also be a composite containing a resin material, reinforcing fiber, or the like other than the curable composition of the present disclosure.
実施形態の例を以下に挙げる。本発明は以下の実施形態に限定されない。
<1>ビニルベンジル基を有する化合物を含む硬化性組成物であって、130℃で10分加熱した熱履歴を有する硬化性組成物において40~150℃の範囲で測定される最低溶融粘度が3,000Pa・s以下である、硬化性組成物。
Examples of embodiments are given below. The present invention is not limited to the following embodiments.
<1> A curable composition containing a compound having a vinylbenzyl group, wherein the curable composition has a thermal history of being heated at 130°C for 10 minutes and has a minimum melt viscosity of 3,000 Pa s or less as measured in the range of 40 to 150°C.
<2>130℃で10分加熱した熱履歴を有する硬化性組成物において、40~150℃の範囲で溶融粘度を測定した際の60℃での溶融粘度が5,000Pa・s以上である、前記<1>に記載の硬化性組成物。 <2> The curable composition described in <1> above, in which the melt viscosity at 60°C is 5,000 Pa·s or more when the curable composition has a thermal history of being heated at 130°C for 10 minutes and is measured in the range of 40 to 150°C.
<3>130℃で10分加熱した熱履歴を有する硬化性組成物において40~150℃の範囲で測定される最低溶融粘度の値(Vmin)に対する、40~150℃の範囲で溶融粘度を測定した際の60℃での溶融粘度の値(V60)の比(V60)/(Vmin)が3~10の範囲である、前記<1>又は<2>に記載の硬化性組成物。 <3> The curable composition according to <1> or <2>, wherein the ratio (V 60 )/(V min ) of the melt viscosity value at 60°C when the melt viscosity is measured in the range of 40 to 150°C to the minimum melt viscosity value (V min ) measured in the range of 40 to 150 °C in a curable composition having a thermal history of being heated at 130 °C for 10 minutes is in the range of 3 to 10.
<4>前記ビニルベンジル基を有する化合物として、重量平均分子量(Mw)が50,000~400,000の範囲である樹脂を含む、前記<1>~<3>のいずれか1つに記載の硬化性組成物。 <4> The curable composition according to any one of <1> to <3>, containing a resin having a weight average molecular weight (Mw) in the range of 50,000 to 400,000 as the compound having a vinylbenzyl group.
<5>無機充填材を含み、130℃で10分加熱した後の硬化性組成物100質量部中の無機充填材の割合が50~85質量%の範囲である、前記<1>~<4>のいずれか1つに記載の硬化性組成物。 <5> The curable composition according to any one of <1> to <4>, which contains an inorganic filler and has a ratio of 50 to 85 mass% in 100 parts by mass of the curable composition after heating at 130°C for 10 minutes.
<6>前記<1>~<5>のいずれか一つに記載の硬化性組成物又は前記硬化性組成物の半硬化物を含む、プリプレグ。 <6> A prepreg comprising the curable composition described in any one of <1> to <5> or a semi-cured product of the curable composition.
<7>前記<6>に記載のプリプレグの硬化物と、金属箔とを含む、金属張積層板。 <7> A metal-clad laminate comprising the cured prepreg described in <6> and a metal foil.
<8>前記<6>に記載のプリプレグの硬化物を含む、プリント配線板。 <8> A printed wiring board comprising the cured product of the prepreg described in <6>.
<9>前記<8>に記載のプリント配線板と、半導体素子とを含む、半導体パッケージ。 <9> A semiconductor package comprising the printed wiring board described in <8> and a semiconductor element.
<10>前記<1>~<5>のいずれか一つに記載の硬化性組成物の硬化物を含む、成形品。 <10> A molded article comprising a cured product of the curable composition described in any one of <1> to <5>.
以下に、実施例により本発明を更に具体的に説明するが、本発明は以下の実施例に限定されるものではない。 The present invention will be explained in more detail below with reference to examples, but the present invention is not limited to the following examples.
重量平均分子量(Mw)及び数平均分子量(Mn)の測定方法
重量平均分子量及び数平均分子量は、ゲルパーミエーションクロマトグラフィー(GPC)により、標準ポリスチレンを用いた検量線から換算した。検量線は、標準ポリスチレンの5サンプルセット(PStQuick MP-H、PStQuick B[東ソー株式会社、商品名])を用いて3次式で近似した。GPCの条件を以下に示す。
Measurement method of weight average molecular weight (Mw) and number average molecular weight (Mn) The weight average molecular weight and number average molecular weight were calculated from a calibration curve using standard polystyrene by gel permeation chromatography (GPC). The calibration curve was approximated by a third order equation using a set of five standard polystyrene samples (PStQuick MP-H, PStQuick B [product name, Tosoh Corporation]). The GPC conditions are shown below.
装置:高速GPC装置「HLC-8320GPC」(東ソー株式会社、商品名)
検出器:紫外吸光検出器「UV-8320」(東ソー株式会社、商品名)
カラム:ガードカラム;TSKgel guardcolumn Super(HZ)-M+、カラム;TSKgel SuperMultipore HZ-M(2本)、リファレンスカラム;TSKgel SuperH-RC(2本)(すべて東ソー株式会社、商品名)
カラムサイズ:4.6×20mm(ガードカラム)、4.6×150mm(カラム)、6.0×150mm(リファレンスカラム)
溶離液:テトラヒドロフラン
試料濃度:10mg/1mL
注入量:20μL又は2μL
流量:0.35mL/分
測定温度:40℃
Apparatus: High-speed GPC apparatus "HLC-8320GPC" (product name, Tosoh Corporation)
Detector: Ultraviolet absorption detector "UV-8320" (product name, Tosoh Corporation)
Columns: Guard column: TSKgel guardcolumn Super (HZ)-M+, column: TSKgel SuperMultipore HZ-M (2 columns), reference column: TSKgel SuperH-RC (2 columns) (all product names of Tosoh Corporation)
Column size: 4.6 x 20 mm (guard column), 4.6 x 150 mm (column), 6.0 x 150 mm (reference column)
Eluent: tetrahydrofuran Sample concentration: 10 mg/1 mL
Injection volume: 20 μL or 2 μL
Flow rate: 0.35mL/min Measurement temperature: 40℃
製造例1:ビニルベンジル基を有する化合物の製造
撹拌装置、温度計、還流管及び窒素吹き込み口を備えた反応容器に、インデン35.6質量部、クロロメチルスチレン(*1)101.2質量部、相間移動触媒としてテトラ-n-ブチルアンモニウムブロミド(関東化学株式会社製)7.1質量部、重合禁止剤としてフェノチアジン0.1質量部、溶媒としてトルエン77.6質量部を仕込み、流量50ml/分で窒素を吹き込みながら、40℃で加熱撹拌した。
Production Example 1 Production of Compound Having a Vinylbenzyl Group A reaction vessel equipped with a stirrer, a thermometer, a reflux condenser, and a nitrogen inlet was charged with 35.6 parts by mass of indene, 101.2 parts by mass of chloromethylstyrene (*1), 7.1 parts by mass of tetra-n-butylammonium bromide (manufactured by Kanto Chemical Co., Ltd.) as a phase transfer catalyst, 0.1 parts by mass of phenothiazine as a polymerization inhibitor, and 77.6 parts by mass of toluene as a solvent, and the mixture was heated and stirred at 40° C. while blowing in nitrogen at a flow rate of 50 ml/min.
(*1)クロロメチルスチレン「CMS-P」:AGCセイミケミカル株式会社、m体とp体の混合物、m体含有量が約50質量%、p体含有量が約50質量%。 (*1) Chloromethylstyrene "CMS-P": AGC Seimi Chemical Co., Ltd., a mixture of m- and p-isomers, with m-isomer content of approximately 50% by mass and p-isomer content of approximately 50% by mass.
次いで、塩基性化合物として濃度48質量%の水酸化ナトリウム水溶液(関東化学株式会社製)46.5質量部を20分かけて低下した。その後、60℃で9時間撹拌した。なお、反応中は窒素の吹込みを継続させた。反応混合物を室温(25℃)まで冷却し、10%塩酸水溶液で中和した後、純水で2回洗浄した。トルエンを減圧条件下で留去した後、得られた粘稠液体をメタノールで洗浄し、真空乾燥することによりビニルベンジル基を有する化合物を得た。 Next, 46.5 parts by mass of a 48% by mass aqueous solution of sodium hydroxide (manufactured by Kanto Chemical Co., Ltd.) was added as a basic compound over a period of 20 minutes. The mixture was then stirred at 60°C for 9 hours. Nitrogen was continuously blown in during the reaction. The reaction mixture was cooled to room temperature (25°C), neutralized with a 10% aqueous solution of hydrochloric acid, and then washed twice with pure water. The toluene was distilled off under reduced pressure, and the resulting viscous liquid was washed with methanol and vacuum dried to obtain a compound having a vinylbenzyl group.
得られたビニルベンジル基を有する化合物について1H-NMR分析を行ったところ、インデンの1位、3位、又はこれらの組み合わせの炭素原子に直接結合するビニルベンジル基を有する構造が確認された。また、ゲルパーミエーションクロマトグラフィー(GPC)分析の結果、ビニルベンジル基を2個有する化合物と、3個有する化合物との混合物であることが分かった。ビニルベンジル基を3個有する化合物においては、インデン環の1位の炭素原子に直接結合する2個のビニルベンジル基と、3位の炭素原子に直接結合する1個のビニルベンジル基を有することが確認された。ビニルベンジルモノマの重量平均分子量(Mw)は500であった。重量平均分子量(Mw)は上記方法で測定した。 The obtained compound having a vinylbenzyl group was analyzed by 1 H-NMR, and a structure having a vinylbenzyl group directly bonded to the carbon atom at the 1st position, 3rd position, or a combination thereof of indene was confirmed. Furthermore, gel permeation chromatography (GPC) analysis revealed that the compound was a mixture of a compound having two vinylbenzyl groups and a compound having three vinylbenzyl groups. It was confirmed that the compound having three vinylbenzyl groups had two vinylbenzyl groups directly bonded to the carbon atom at the 1st position of the indene ring and one vinylbenzyl group directly bonded to the carbon atom at the 3rd position. The weight average molecular weight (Mw) of the vinylbenzyl monomer was 500. The weight average molecular weight (Mw) was measured by the above method.
製造例2:ビニルベンジル基を有する化合物を用いたプレポリマの製造
先で得たビニルベンジル基を有する化合物とトルエンとを混合し固形分60質量%とした。セパラブルフラスコに、ビニルベンジル基を有する化合物のトルエン溶液(固形分60質量%)4000質量部と、アゾ系重合開始剤(*2)24質量部を入れ、200rpmで1分間撹拌した。その後、窒素を400ml/分で流しながら加熱し、110℃±10℃で加熱した。反応生成物の重量平均分子量(Mw)をモニタリングし、150,000程度になったところで加熱を止めて冷却し、ビニルベンジル基を有する樹脂のトルエン溶液を得た。当該樹脂の重量平均分子量(Mw)は147,000であった。重量平均分子量(Mw)は上記方法で測定した。
Production Example 2: Production of a prepolymer using a compound having a vinylbenzyl group The compound having a vinylbenzyl group obtained above was mixed with toluene to a solid content of 60% by mass. 4000 parts by mass of a toluene solution of a compound having a vinylbenzyl group (solid content 60% by mass) and 24 parts by mass of an azo-based polymerization initiator (*2) were placed in a separable flask and stirred at 200 rpm for 1 minute. Then, the mixture was heated at 110°C ± 10°C while flowing nitrogen at 400 ml/min. The weight average molecular weight (Mw) of the reaction product was monitored, and when it reached about 150,000, heating was stopped and the mixture was cooled to obtain a toluene solution of a resin having a vinylbenzyl group. The weight average molecular weight (Mw) of the resin was 147,000. The weight average molecular weight (Mw) was measured by the above method.
(*2)2,2’-アゾビス(2,4,4-トリメチルペンタン):富士フイルム和光純薬株式会社製「VR-110」(商品名)、10時間半減期温度110℃ (*2) 2,2'-Azobis(2,4,4-trimethylpentane): Fujifilm Wako Pure Chemical Industries, Ltd. "VR-110" (product name), 10-hour half-life temperature 110℃
実施例1~3及び比較例1:硬化性組成物の製造と評価
表1に記載した配合量に従って各成分を配合し、25℃で撹拌及び混合して、固形分濃度が約75質量%の硬化性組成物を調製した。固形分濃度の調整はトルエンの追加により行った。表1中の配合量について、その成分が溶液の場合は、固形分換算の質量%を意味する。
得られた硬化性組成物につき、下記の手順で各種評価試験を行った。結果を表1に示す。
Examples 1 to 3 and Comparative Example 1: Production and Evaluation of Curable Compositions Each component was blended according to the blending amounts shown in Table 1, and stirred and mixed at 25°C to prepare a curable composition having a solid content concentration of about 75% by mass. The solid content concentration was adjusted by adding toluene. When the blending amounts in Table 1 are in the form of a solution, they refer to mass % converted into solid content.
The obtained curable composition was subjected to various evaluation tests according to the following procedures. The results are shown in Table 1.
表1に記載の各成分の詳細は下記の通りである。
エラストマ:スチレン-エチレン-ブチレン共重合体、数平均分子量(Mn)約10,000
無機充填材:平均粒子径2.4μmのシリカと平均粒子径1.0μmのシリカとを質量比8:2で配合したもの
硬化促進剤:日油株式会社製「パーブチルP」、α,α’-ジ(t-ブチルパーオキシ)ジイソプロピルベンゼン
Details of each component listed in Table 1 are as follows.
Elastomer: styrene-ethylene-butylene copolymer, number average molecular weight (Mn) about 10,000
Inorganic filler: Silica having an average particle size of 2.4 μm and silica having an average particle size of 1.0 μm mixed in a mass ratio of 8:2. Curing accelerator: "Perbutyl P" manufactured by NOF Corporation, α,α'-di(t-butylperoxy)diisopropylbenzene
プリプレグの製造
硬化性組成物を厚さ30μmのガラスクロス(旭化成株式会社製)に含浸塗工し、130℃で10分間加熱乾燥してプリプレグを得た。プリプレグ中の硬化性組成物由来の固形分の含有量は約80質量%とした。
A prepreg was obtained by impregnating and coating a 30 μm-thick glass cloth (manufactured by Asahi Kasei Corporation) with the curable composition and drying it by heating at 130° C. for 10 minutes. The content of solids derived from the curable composition in the prepreg was about 80% by mass.
溶融粘度測定用サンプルの製造
先で得たプリプレグから硬化性組成物部のみを粉状に粉砕して取り出し、厚さ約1.2mm、直径20mmの錠剤状に成形し、これを溶融粘度測定用サンプルとした。
Preparation of Sample for Melt Viscosity Measurement Only the curable composition portion was pulverized into powder form from the prepreg obtained above and molded into a tablet shape with a thickness of about 1.2 mm and a diameter of 20 mm to prepare a sample for melt viscosity measurement.
溶融粘度の測定
先で得た溶融粘度測定用サンプルについて、下記条件で溶融粘度を測定し、60℃での溶融粘度(V60)と最低溶融粘度(Vmin)の値を得た。
測定機器(レオメーター):ティー・エイ・インスツルメント・ジャパン株式会社製「DHR-20」
温度範囲及び昇温条件:40~150℃、3℃/分
Measurement of Melt Viscosity The melt viscosity of the melt viscosity measurement sample obtained above was measured under the following conditions to obtain the melt viscosity at 60° C. (V 60 ) and the minimum melt viscosity (V min ).
Measuring equipment (rheometer): "DHR-20" manufactured by TA Instruments Japan Co., Ltd.
Temperature range and temperature rise conditions: 40 to 150°C, 3°C/min
両面銅張積層板の製造
先で得たプリプレグの両面に、厚さ18μmの電解銅箔(三井金属鉱業株式会社製「SI-VSP-AM-3R」(商品名))をマット面がプリプレグ側になるように重ねた。これを、2.0MPaの真空プレス条件下、230℃で120分間加熱加圧することにより、両面銅張積層板を得た。
Manufacture of double-sided copper-clad laminates An electrolytic copper foil ("SI-VSP-AM-3R" (product name) manufactured by Mitsui Mining & Smelting Co., Ltd.) having a thickness of 18 μm was laminated on both sides of the prepreg obtained above, with the matte side facing the prepreg side. This was heated and pressed at 230° C. for 120 minutes under vacuum pressing conditions of 2.0 MPa to obtain a double-sided copper-clad laminate.
曲げ強度維持率の評価
先で得た両面銅張積層板を銅エッチング液(*3)の銅エッチング液に浸漬することによって両面の銅箔を除去し、40mm×25mmの試験片を用意した。試験片を200℃の恒温槽でエージングし、エージングタイムが500時間、1000時間である試験片をそれぞれ作製した。エージングをしなかった試験片及びエージング後の各試験片について、オートグラフ(株式会社島津製作所製「AG-1kNX」)を用い、試験速度0.05m/分、支点間距離1.6mmの条件にて三点曲げ試験を行った。
エージングしなかった試験片での測定値に対するエージング後の試験片の測定値の割合(%)を算出し、以下の基準で評価した。
A:60%以上、80%未満
B:40%以上、60%未満
C:40%未満
Evaluation of bending strength retention rate The double-sided copper-clad laminate obtained above was immersed in a copper etching solution (*3) to remove the copper foil on both sides, and a test piece of 40 mm x 25 mm was prepared. The test piece was aged in a thermostatic chamber at 200°C to prepare test pieces with aging times of 500 hours and 1000 hours, respectively. A three-point bending test was performed on the test pieces that were not aged and each test piece after aging using an autograph (Shimadzu Corporation "AG-1kNX") at a test speed of 0.05 m/min and a support distance of 1.6 mm.
The ratio (%) of the measured value of the aged test piece to the measured value of the unaged test piece was calculated and evaluated according to the following criteria.
A: 60% or more, less than 80% B: 40% or more, less than 60% C: Less than 40%
(*3)銅エッチング液:過硫酸アンモニウム(三菱ガス化学株式会社製)10質量%溶液 (*3) Copper etching solution: 10% by weight ammonium persulfate solution (manufactured by Mitsubishi Gas Chemical Co., Ltd.)
銅箔ピール強度維持率の測定
先で得た両面銅張積層板を上記(*3)の銅エッチング液に浸漬し、幅3mmの帯部分を残して銅箔を取り除いた試験片を複数用意した。試験片を200℃の恒温槽でエージングし、エージングタイムが1000時間である試験片を作成した。エージングをしなかった試験片及び、200℃の恒温槽で1000時間エージングした後の試験片について、引張り試験機(株式会社島津製作所製「EZ Test」)を用いて帯部分を50mm/分の速度で90°方向に引き剥がし、銅箔ピール強度を測定した。
エージングしなかった試験片での測定値に対するエージング後の試験片の測定値の割合(%)を算出し、以下の基準で評価した。
A:60%以上、80%未満
B:40%以上、60%未満
C:40%未満
Measurement of copper foil peel strength retention rate The double-sided copper-clad laminate obtained above was immersed in the copper etching solution described above (*3), and the copper foil was removed leaving a 3 mm wide band portion to prepare multiple test pieces. The test pieces were aged in a thermostatic chamber at 200°C to prepare test pieces with an aging time of 1000 hours. For the test pieces that were not aged and the test pieces that were aged in a thermostatic chamber at 200°C for 1000 hours, the band portion was peeled off in a 90° direction at a speed of 50 mm/min using a tensile tester (Shimadzu Corporation's "EZ Test") to measure the copper foil peel strength.
The ratio (%) of the measured value of the aged test piece to the measured value of the unaged test piece was calculated and evaluated according to the following criteria.
A: 60% or more, less than 80% B: 40% or more, less than 60% C: Less than 40%
誘電特性値の評価
先で得た両面銅張積層板を上記(*3)の銅エッチング液に浸漬することによって両面の銅箔を除去し、100mm×40mmの試験片を得た。この試験片を105℃で30分乾燥し、さらに雰囲気温度25±2℃、湿度40±10%RHで1時間放置した後、比誘電率(Dk)及び誘電正接(Df)を測定した。
測定はSPDR法(スプリットポスト誘電体共振器)に準拠して、10GHz帯で25℃にて測定した。測定装置には、agilent technologies社の「PNA Network Analyzer N5227A」(商品名)を用いた。
Evaluation of dielectric properties The double-sided copper-clad laminate obtained above was immersed in the copper etching solution described above (*3) to remove the copper foils on both sides, and a test piece of 100 mm x 40 mm was obtained. This test piece was dried at 105°C for 30 minutes and then left for 1 hour at an atmospheric temperature of 25±2°C and a humidity of 40±10% RH, after which the relative dielectric constant (Dk) and dielectric loss tangent (Df) were measured.
The measurement was performed in accordance with the SPDR method (split post dielectric resonator) in the 10 GHz band at 25° C. The measurement device used was a “PNA Network Analyzer N5227A” (product name) from Agilent Technologies.
表1に示されるように、130℃で10分加熱した熱履歴を有する硬化性組成物において40~150℃の範囲で測定される最低溶融粘度が3,000Pa・s以下である実施例1~3は、硬化物が長期耐熱劣化性に優れるものとなった。具体的には、エージングによる曲げ強度の低下が抑制された。 As shown in Table 1, in Examples 1 to 3, in which the curable composition had a thermal history of being heated at 130°C for 10 minutes and had a minimum melt viscosity of 3,000 Pa·s or less measured in the range of 40 to 150°C, the cured product had excellent long-term heat deterioration resistance. Specifically, the decrease in bending strength due to aging was suppressed.
本開示は、2023年11月16日に出願された特願2023-195165号に記載の主題と関連しており、それらのすべての開示内容は引用によりここに援用される。既に述べられたもの以外に、本開示の新規かつ有利な特徴から外れることなく、上記の実施形態に様々な修正や変更を加えてもよいことに注意すべきである。したがって、そのような全ての修正や変更は、添付の請求の範囲に含まれることが意図されている。 This disclosure relates to the subject matter described in Japanese Patent Application No. 2023-195165, filed on November 16, 2023, the entire disclosure of which is incorporated herein by reference. It should be noted that, in addition to what has already been described, various modifications and variations may be made to the above-described embodiments without departing from the novel and advantageous features of the present disclosure. Accordingly, all such modifications and variations are intended to be included within the scope of the appended claims.
Claims (10)
A molded article comprising a cured product of the curable composition according to any one of claims 1 to 5.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2023-195165 | 2023-11-16 | ||
| JP2023195165 | 2023-11-16 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| WO2025105440A1 true WO2025105440A1 (en) | 2025-05-22 |
Family
ID=95742790
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| PCT/JP2024/040513 Pending WO2025105440A1 (en) | 2023-11-16 | 2024-11-14 | Curable composition, prepreg, metal-clad laminate, printed wiring board, semiconductor package, and molded article |
Country Status (2)
| Country | Link |
|---|---|
| TW (1) | TW202528373A (en) |
| WO (1) | WO2025105440A1 (en) |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2003277440A (en) * | 2002-03-25 | 2003-10-02 | Showa Highpolymer Co Ltd | Curable vinylbenzyl compound and method for producing the same |
| WO2006059750A1 (en) * | 2004-11-30 | 2006-06-08 | Ajinomoto Co., Inc. | Curable resin composition |
| JP2007154200A (en) * | 2001-04-09 | 2007-06-21 | Showa Highpolymer Co Ltd | Curable polyvinylbenzyl compound and process for producing the same |
| JP2017057352A (en) * | 2015-09-18 | 2017-03-23 | 三菱瓦斯化学株式会社 | Prepreg |
-
2024
- 2024-11-14 WO PCT/JP2024/040513 patent/WO2025105440A1/en active Pending
- 2024-11-15 TW TW113144003A patent/TW202528373A/en unknown
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2007154200A (en) * | 2001-04-09 | 2007-06-21 | Showa Highpolymer Co Ltd | Curable polyvinylbenzyl compound and process for producing the same |
| JP2003277440A (en) * | 2002-03-25 | 2003-10-02 | Showa Highpolymer Co Ltd | Curable vinylbenzyl compound and method for producing the same |
| WO2006059750A1 (en) * | 2004-11-30 | 2006-06-08 | Ajinomoto Co., Inc. | Curable resin composition |
| JP2017057352A (en) * | 2015-09-18 | 2017-03-23 | 三菱瓦斯化学株式会社 | Prepreg |
Also Published As
| Publication number | Publication date |
|---|---|
| TW202528373A (en) | 2025-07-16 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| TWI706963B (en) | Soluble polyfunctional vinyl aromatic copolymer, its production method, hardenable composition and its application | |
| JP7762870B2 (en) | Resin composition, prepreg, resin-coated film, resin-coated metal foil, metal-clad laminate, and wiring board | |
| CN120289924A (en) | Resin composition, prepreg, metal foil-clad laminate, resin composite sheet and printed circuit board | |
| WO2025105440A1 (en) | Curable composition, prepreg, metal-clad laminate, printed wiring board, semiconductor package, and molded article | |
| WO2024242134A1 (en) | Resin composition, prepreg, resin film, metal-clad laminated plate, printed wiring board, and semiconductor package | |
| KR20250009960A (en) | Resin compositions, prepregs, laminates, resin films, printed wiring boards and semiconductor packages | |
| WO2025105439A1 (en) | Curable composition for prepreg, prepreg, metal-clad laminate, printed wiring board, and semiconductor package | |
| JP2024084377A (en) | Resin composition, prepreg, laminate, resin film, printed wiring board, and semiconductor package | |
| JP2024053355A (en) | Resin composition, prepreg, laminate, resin film, printed wiring board, and semiconductor package | |
| JP2025126594A (en) | Curable composition, prepreg, metal-clad laminate, printed wiring board and semiconductor package | |
| WO2025089252A1 (en) | Resin composition, prepreg, resin film, metal-clad laminated plate, printed wiring board, and semiconductor package | |
| WO2025243951A1 (en) | Curable composition, prepreg, resin film, metal-clad laminate, printed wiring board, semiconductor package, and acenaphthylene polymer | |
| WO2025262918A1 (en) | Arylalkyl-modified indene composition, curable resin material, prepreg, resin film, metal-clad laminate, printed wiring board, and semiconductor package | |
| WO2025263368A1 (en) | Arylalkyl-modified indene composition, curable resin material, prepreg, resin film, metal-clad laminate, printed wiring board, and semiconductor package | |
| JP7627379B2 (en) | Copolymer, composition, varnish, and cured product thereof | |
| CN121175346A (en) | Aralkyl-modified indene composition, curable resin material, prepreg, resin film, metal-clad laminate, printed wiring board, and semiconductor package | |
| JP2024179852A (en) | Resin composition, prepreg, resin film, metal-clad laminate, printed wiring board, and semiconductor package | |
| TW202502702A (en) | Compound, resin composition, prepreg, resin film, metal-clad laminate, printed wiring board, and semiconductor package | |
| WO2025263396A1 (en) | Method for producing aryl-alkylated indene composition, curable resin material, prepreg, resin film, metal-clad laminated plate, printed wiring board, and semiconductor package | |
| TW202502951A (en) | Resin composition, prepreg, resin film, metal-clad laminate, printed circuit board, semiconductor package, and acenaphthylene homopolymer | |
| JP2025018158A (en) | Resin composition, prepreg, resin film, metal-clad laminate, printed wiring board, and semiconductor package | |
| JP2025012890A (en) | Polymerizable unsaturated bond-containing resin, resin composition, prepreg, resin film, metal-clad laminate, printed wiring board, and semiconductor package | |
| JP2025035201A (en) | Compound, resin, curable composition, prepreg, resin film, metal-clad laminate, printed wiring board, and semiconductor package | |
| CN121039207A (en) | Resin composition, prepreg, laminate, resin film, printed wiring board, and semiconductor package | |
| WO2025089302A1 (en) | Resin composition, prepreg, laminate, resin film, printed wiring board, and semiconductor package |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| 121 | Ep: the epo has been informed by wipo that ep was designated in this application |
Ref document number: 24891476 Country of ref document: EP Kind code of ref document: A1 |