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WO2025104823A1 - Electrochemical cell - Google Patents

Electrochemical cell Download PDF

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Publication number
WO2025104823A1
WO2025104823A1 PCT/JP2023/040980 JP2023040980W WO2025104823A1 WO 2025104823 A1 WO2025104823 A1 WO 2025104823A1 JP 2023040980 W JP2023040980 W JP 2023040980W WO 2025104823 A1 WO2025104823 A1 WO 2025104823A1
Authority
WO
WIPO (PCT)
Prior art keywords
layer
current collecting
hydrogen electrode
overlapping region
thickness direction
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
PCT/JP2023/040980
Other languages
French (fr)
Japanese (ja)
Inventor
一博 水木
大也 小林
至貢 岩崎
真司 藤崎
誠 大森
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NGK Insulators Ltd
Original Assignee
NGK Insulators Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NGK Insulators Ltd filed Critical NGK Insulators Ltd
Priority to PCT/JP2023/040980 priority Critical patent/WO2025104823A1/en
Publication of WO2025104823A1 publication Critical patent/WO2025104823A1/en
Pending legal-status Critical Current
Anticipated expiration legal-status Critical

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    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B1/00—Electrolytic production of inorganic compounds or non-metals
    • C25B1/01—Products
    • C25B1/02—Hydrogen or oxygen
    • C25B1/04—Hydrogen or oxygen by electrolysis of water
    • C25B1/042—Hydrogen or oxygen by electrolysis of water by electrolysis of steam
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B9/00—Cells or assemblies of cells; Constructional parts of cells; Assemblies of constructional parts, e.g. electrode-diaphragm assemblies; Process-related cell features
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B9/00—Cells or assemblies of cells; Constructional parts of cells; Assemblies of constructional parts, e.g. electrode-diaphragm assemblies; Process-related cell features
    • C25B9/60—Constructional parts of cells
    • C25B9/63—Holders for electrodes; Positioning of the electrodes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01M—PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
    • H01M8/00—Fuel cells; Manufacture thereof
    • H01M8/02—Details
    • H01M8/0202—Collectors; Separators, e.g. bipolar separators; Interconnectors
    • H01M8/023—Porous and characterised by the material
    • H01M8/0232—Metals or alloys
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01M—PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
    • H01M8/00—Fuel cells; Manufacture thereof
    • H01M8/02—Details
    • H01M8/0202—Collectors; Separators, e.g. bipolar separators; Interconnectors
    • H01M8/023—Porous and characterised by the material
    • H01M8/0236—Glass; Ceramics; Cermets
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01M—PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
    • H01M8/00—Fuel cells; Manufacture thereof
    • H01M8/02—Details
    • H01M8/0202—Collectors; Separators, e.g. bipolar separators; Interconnectors
    • H01M8/023—Porous and characterised by the material
    • H01M8/0241—Composites
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01M—PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
    • H01M8/00—Fuel cells; Manufacture thereof
    • H01M8/02—Details
    • H01M8/0202—Collectors; Separators, e.g. bipolar separators; Interconnectors
    • H01M8/0247—Collectors; Separators, e.g. bipolar separators; Interconnectors characterised by the form
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01M—PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
    • H01M8/00—Fuel cells; Manufacture thereof
    • H01M8/10—Fuel cells with solid electrolytes
    • H01M8/12—Fuel cells with solid electrolytes operating at high temperature, e.g. with stabilised ZrO2 electrolyte
    • H01M8/1213—Fuel cells with solid electrolytes operating at high temperature, e.g. with stabilised ZrO2 electrolyte characterised by the electrode/electrolyte combination or the supporting material
    • H01M8/1226—Fuel cells with solid electrolytes operating at high temperature, e.g. with stabilised ZrO2 electrolyte characterised by the electrode/electrolyte combination or the supporting material characterised by the supporting layer
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01M—PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
    • H01M8/00—Fuel cells; Manufacture thereof
    • H01M8/10—Fuel cells with solid electrolytes
    • H01M8/12—Fuel cells with solid electrolytes operating at high temperature, e.g. with stabilised ZrO2 electrolyte

Definitions

  • the present invention relates to an electrochemical cell.
  • Patent Document 1 discloses an anode-supported fuel cell that includes a support substrate having multiple through-holes, multiple anodes embedded in each through-hole, an electrolyte layer disposed on the support substrate, and a cathode disposed on the electrolyte layer.
  • each anode is embedded in each through-hole of the support substrate, so not only is the supply of raw material gas to each anode easily hindered by the support substrate, but current concentration is also likely to occur at each anode.
  • the objective of the present invention is to provide an electrochemical cell that can improve performance.
  • the electrochemical cell device comprises a current collecting member and an electrochemical cell electrically connected to the current collecting member.
  • the electrochemical cell comprises a current collecting layer, a support substrate embedded within the current collecting layer and having a through hole, a first electrode layer disposed on the current collecting layer, a second electrode layer, and an electrolyte layer disposed between the first electrode layer and the second electrode layer.
  • the current collecting member includes an overlapping portion that overlaps with the through hole in the thickness direction, and a non-overlapping portion that does not overlap with the through hole in the thickness direction. The density of the overlapping portion is higher than the density of the non-overlapping portion.
  • the electrochemical cell according to the second aspect of the present invention relates to the first aspect, and the current collecting layer has a first surface on the current collecting member side.
  • the first surface includes a first overlapping region that overlaps with the through hole in the thickness direction, and a first non-overlapping region that does not overlap with the through hole in the thickness direction.
  • the first overlapping region protrudes towards the current collecting member, and the first non-overlapping region protrudes to the opposite side of the current collecting member.
  • the electrochemical cell according to the third aspect of the present invention relates to the first or second aspect, and the second electrode layer has a second surface opposite the current collecting member, and the second surface includes a second overlapping region that overlaps with the through hole in the thickness direction, and a second non-overlapping region that does not overlap with the through hole in the thickness direction.
  • the second overlapping region protrudes toward the current collecting member, and the second non-overlapping region protrudes to the opposite side of the current collecting member.
  • the electrochemical cell according to the fourth aspect of the present invention is the electrochemical cell according to the third aspect, in which the flatness of the second surface is less than the flatness of the first surface.
  • the present invention provides an electrochemical cell that can improve performance.
  • FIG. 1 is a cross-sectional view of an electrolysis cell device according to an embodiment.
  • FIG. 2 is a partially enlarged view of FIG.
  • FIG. 1 is a cross-sectional view showing the configuration of an electrolysis cell device 1 according to an embodiment.
  • the electrolytic cell device 1 includes an electrolytic cell 10, a separator 20, a current collecting member 25, and a sealing portion 30.
  • a cell stack (not shown) can be formed by stacking multiple electrolytic cell devices 1 in the Z-axis direction perpendicular to the X-axis direction and the Y-axis direction.
  • the electrolytic cell device 1 is an example of an "electrochemical cell device” according to the present invention.
  • the electrolytic cell 10 is an example of an "electrochemical cell” according to the present invention.
  • the electrolysis cell 10 includes a support substrate 12, a hydrogen electrode current collecting layer 13, a hydrogen electrode active layer 14, an electrolyte layer 15, a reaction prevention layer 16, and an oxygen electrode layer 17.
  • the hydrogen electrode current collecting layer 13, the hydrogen electrode active layer 14, the electrolyte layer 15, the reaction prevention layer 16, and the oxygen electrode layer 17 are stacked in this order in the Z-axis direction.
  • the hydrogen electrode current collecting layer 13 is an example of a "current collecting layer” according to the present invention.
  • the hydrogen electrode active layer 14 is an example of a "first electrode layer” according to the present invention.
  • the oxygen electrode layer 17 is an example of a "second electrode layer” according to the present invention.
  • the support substrate 12, hydrogen electrode current collecting layer 13, hydrogen electrode active layer 14, electrolyte layer 15, and oxygen electrode layer 17 are essential components, while the reaction prevention layer 16 is optional.
  • the support substrate 12 functions as a support for the electrolysis cell 10 together with the hydrogen electrode current collecting layer 13.
  • the support substrate 12 has a plurality of through holes 40, beam portions 50, and a frame portion 60.
  • Each through hole 40 penetrates the support substrate 12. Each through hole 40 extends along the thickness direction (Z-axis direction) of the support substrate 12. Each through hole 40 is formed between the beam portions 50 or between the beam portion 50 and the frame portion 60. A buried portion 70 (described later) of the hydrogen electrode current collecting layer 13 is buried in each through hole 40.
  • the beam portion 50 is embedded inside the hydrogen electrode current collecting layer 13. In other words, the beam portion 50 is not exposed on the surface of the hydrogen electrode current collecting layer 13. The outer peripheral surface of the beam portion 50 is covered by the hydrogen electrode current collecting layer 13.
  • the beam portion 50 is disposed inside the frame portion 60.
  • the beam portion 50 may be substantially integral with the frame portion 60.
  • the beam portion 50 is composed of multiple beam members 51. Each beam member 51 is formed in a rod shape. Each beam member 51 shown in FIG. 1 extends along the Y-axis direction. The ends of each beam member 51 are connected to the inner peripheral surface of the frame portion 60.
  • the beam portion 50 may further include one or more beam members extending along the X-axis direction in addition to the beam members 51 shown in FIG. 1. The number and positions of the beam members 51 may be changed as appropriate.
  • the beam portion 50 may be lattice-shaped as a whole.
  • each beam member 51 in this embodiment is rectangular, but the cross-sectional shape of each beam member 51 can be changed as appropriate.
  • the cross-sectional shapes of each beam member 51 may be the same or different.
  • the beam portion 50 can be made of, for example, forsterite (Mg 2 SiO 4 ), magnesium silicate (MgSiO 3 ), zirconia (ZrO 2 , including partially stabilized zirconia), magnesia (MgO), spinel (MgAl 2 O 4 , NiAl 2 O 4 ), yttria stabilized zirconia (YSZ), calcia stabilized zirconia (CSZ), nickel (Ni), nickel oxide (NiO), alumina (Al 2 O 3 ), nickel oxide-magnesia solid solution (Mg x Ni (1-x) O[0 ⁇ x ⁇ 1]), and a mixed material of two or more of these. These materials generally have low electronic conductivity.
  • the porosity of the beam portion 50 is not particularly limited, but can be, for example, 0.1% or more and 15% or less.
  • the porosity of the beam portion 50 may be lower than the porosity of the hydrogen electrode current collecting layer 13. It is preferable that the porosity of the beam portion 50 is 5% or less. This can improve the rigidity of the beam portion 50.
  • the electronic conductivity of the beam portion 50 is lower than the electronic conductivity of the hydrogen electrode current collecting layer 13.
  • the beam portion 50 may have electronic insulation.
  • the electronic conductivity of the beam portion 50 is not particularly limited, but can be, for example, 10 ⁇ 1 S/m or less at 800° C. or less.
  • the method for forming the beam portion 50 is not particularly limited, and methods such as extrusion molding, tape casting, printing lamination, casting, and dry pressing can be used.
  • the frame portion 60 is formed in an annular shape.
  • the frame portion 60 surrounds the beam portion 50 and the hydrogen electrode current collecting layer 13.
  • the frame portion 60 is disposed on the separator 20.
  • the frame portion 60 is positioned by the sealing portion 30.
  • the frame 60 can be made of, for example, forsterite (Mg 2 SiO 4 ), magnesium silicate (MgSiO 3 ), zirconia (including ZrO 2 and partially stabilized zirconia), magnesia (MgO), spinel (MgAl 2 O 4 , NiAl 2 O 4 ), yttria stabilized zirconia (YSZ), calcia stabilized zirconia (CSZ), nickel (Ni), nickel oxide (NiO), alumina (Al 2 O 3 ), nickel oxide-magnesia solid solution (Mg x Ni (1-x) O[0 ⁇ x ⁇ 1]), and a mixed material of two or more of these.
  • the frame 60 may be made of the same material as the beam 50. In this case, the frame 60 may be substantially integral with the beam 50.
  • the frame 60 may be made of a material different from that of the beam 50.
  • the porosity of the frame 60 can be, for example, 0.1% or more and 15% or less.
  • the porosity of the frame 60 may be lower than the porosity of the hydrogen electrode current collecting layer 13.
  • the porosity of the frame 60 is preferably 5% or less. This provides the frame 60 with gas sealing properties, thereby preventing the raw material gas supplied from the hydrogen electrode side space S1 to the hydrogen electrode current collecting layer 13 from returning to the hydrogen electrode side space S1 via the frame 60.
  • the electronic conductivity of the frame 60 is lower than the electronic conductivity of the hydrogen electrode current collecting layer 13.
  • the frame 60 may have electronic insulation properties.
  • the electronic conductivity of the frame 60 is not particularly limited, but can be, for example, 10 ⁇ 1 S/m or less at 800° C. or less.
  • the method for forming the frame portion 60 is not particularly limited, and methods such as extrusion molding, tape casting, printing lamination, casting, dry pressing, etc. can be used.
  • the hydrogen electrode current collecting layer 13 functions as a support for the electrolysis cell 10 together with the support substrate 12.
  • the hydrogen electrode current collecting layer 13 has a plurality of embedded portions 70, a first layer portion 80, and a second layer portion 90.
  • Each embedded portion 70 is embedded in each through hole 40 of the support substrate 12. Each embedded portion 70 is connected to the first layer portion 80. Each embedded portion 70 is connected to the second layer portion 90. Each embedded portion 70 is disposed between the first layer portion 80 and the second layer portion 90 in the thickness direction (Z-axis direction) of the support substrate 12.
  • the first layer portion 80 is disposed between each embedded portion 70 and the hydrogen electrode active layer 14.
  • the first layer portion 80 is formed in a layer shape so as to cover the entire beam portion 50.
  • the first layer portion 80 is formed integrally with each embedded portion 70.
  • the first layer portion 80 is disposed on the beam portion 50.
  • the first layer portion 80 covers the hydrogen electrode active layer 14 side of the beam portion 50 of the support substrate 12.
  • the second layer portion 90 is disposed on the opposite side of the first layer portion 80 with respect to each embedded portion 70.
  • the second layer portion 90 is formed in a layer shape so as to cover the entire beam portion 50.
  • the second layer portion 90 is formed integrally with each embedded portion 70.
  • the second layer portion 90 is disposed on the beam portion 50.
  • the second layer portion 90 covers the side of the support substrate 12 opposite the hydrogen electrode active layer 14 of the beam portion 50.
  • the hydrogen electrode current collecting layer 13 has a first surface T1 on the side of the current collecting member 25.
  • the detailed configuration of the first surface T1 will be described later.
  • the hydrogen electrode current collecting layer 13 is a porous body having electronic conductivity. In this embodiment, the electronic conductivity of the hydrogen electrode current collecting layer 13 is higher than that of the support substrate 12.
  • the hydrogen electrode current collecting layer 13 contains nickel (Ni).
  • Ni nickel
  • Ni also functions as a thermal catalyst that promotes the thermal reaction between the generated H 2 and CO 2 contained in the raw material gas to maintain an appropriate gas composition for methanation, reverse water gas shift reaction, etc.
  • Ni is basically present in the form of metal Ni, but may also be partially present in the form of nickel oxide (NiO).
  • the hydrogen electrode current collecting layer 13 contains a ceramic in addition to nickel (Ni).
  • the ceramic may have ion conductivity.
  • the ceramic that can be used include yttria (Y 2 O 3 ), magnesia (MgO), iron oxide (Fe 2 O 3 ), zirconia (ZrO 2 , including partially stabilized zirconia), yttria stabilized zirconia (YSZ), calcia stabilized zirconia (CSZ), scandia stabilized zirconia (ScSZ), gadolinium doped ceria (GDC), samarium doped ceria (SDC), and a mixed material of two or more of these.
  • the porosity of the hydrogen electrode current collecting layer 13 is not particularly limited, but can be, for example, 20% to 40%.
  • the thickness of the hydrogen electrode current collecting layer 13 is not particularly limited, but can be, for example, 150 ⁇ m to 1000 ⁇ m. In the Z-axis direction, the thickness of the hydrogen electrode current collecting layer 13 may be greater than the thickness of each of the hydrogen electrode active layer 14, the electrolyte layer 15, the reaction prevention layer 16, and the oxygen electrode layer 17.
  • the method for forming the hydrogen electrode current collecting layer 13 is not particularly limited, and tape casting, screen printing, casting, dry pressing, etc. can be used.
  • the first overlapping region 1a and the first non-overlapping region 1b described below can be formed by applying press processing (e.g., roll pressing) to the first surface T1 of the hydrogen electrode current collecting layer 13.
  • the hydrogen electrode active layer 14 functions as a cathode.
  • the hydrogen electrode active layer 14 is disposed on the hydrogen electrode current collecting layer 13.
  • the hydrogen electrode active layer 14 is covered with an electrolyte layer 15.
  • a source gas is supplied to the hydrogen electrode active layer 14 through the hydrogen electrode current collecting layer 13.
  • the source gas contains at least H2O .
  • the hydrogen electrode active layer 14 produces H 2 from the source gas in accordance with the electrochemical reaction of water electrolysis shown in the following formula (1).
  • Hydrogen electrode active layer 14 H2O+2e- ⁇ H2+O2-...(1)
  • the hydrogen electrode active layer 14 produces H 2 , CO, and O 2 ⁇ from the source gas in accordance with the co-electrochemical reactions shown in the following formulas (2), (3), and (4 ) .
  • ⁇ Hydrogen electrode active layer 14 CO 2 +H 2 O+4e ⁇ ⁇ CO+H 2 +2O 2 ⁇ (2) Electrochemical reaction of H 2 O: H 2 O + 2e ⁇ ⁇ H 2 + O 2 ⁇ (3) Electrochemical reaction of CO2 : CO2 + 2e- ⁇ CO + O2 -... (4)
  • the hydrogen electrode active layer 14 is a porous body having electronic conductivity.
  • the hydrogen electrode active layer 14 may have ion conductivity.
  • the hydrogen electrode active layer 14 may be composed of, for example, YSZ, CSZ, ScSZ, GDC, (SDC), (La, Sr) (Cr, Mn) O 3 , (La, Sr) TiO 3 , Sr 2 (Fe, Mo) 2 O 6 , (La, Sr) VO 3 , (La, Sr) FeO 3 , a mixed material of two or more of these, or a composite of one or more of these and NiO.
  • the porosity of the hydrogen electrode active layer 14 is not particularly limited, but can be, for example, 20% to 40%.
  • the thickness of the hydrogen electrode active layer 14 is not particularly limited, but can be, for example, 5 ⁇ m to 50 ⁇ m.
  • the method for forming the hydrogen electrode active layer 14 is not particularly limited, and tape casting, screen printing, casting, dry pressing, etc. can be used.
  • the electrolyte layer 15 is disposed between the hydrogen electrode active layer 14 and the oxygen electrode layer 17.
  • the reaction prevention layer 16 is disposed between the electrolyte layer 15 and the oxygen electrode layer 17, so that the electrolyte layer 15 is sandwiched between the hydrogen electrode active layer 14 and the reaction prevention layer 16.
  • the electrolyte layer 15 covers the hydrogen electrode active layer 14. As shown in FIG. 1, it is preferable that the electrolyte layer 15 covers the entire surface of the hydrogen electrode active layer 14. The outer periphery of the electrolyte layer 15 is connected to the frame portion 60.
  • the electrolyte layer 15 has a function of transmitting O 2- generated in the hydrogen electrode active layer 14 to the oxygen electrode layer 17.
  • the electrolyte layer 15 is a dense body that has ionic conductivity but no electronic conductivity.
  • the electrolyte layer 15 can be made of, for example, YSZ, GDC, ScSZ, SDC, lanthanum gallate (LSGM), or the like.
  • the porosity of the electrolyte layer 15 is not particularly limited, but can be, for example, 0.1% to 7%.
  • the thickness of the electrolyte layer 15 is not particularly limited, but can be, for example, 1 ⁇ m to 100 ⁇ m.
  • the method for forming the electrolyte layer 15 is not particularly limited, and tape casting, screen printing, casting, dry pressing, etc. can be used.
  • reaction prevention layer 16 The reaction prevention layer 16 is disposed between the electrolyte layer 15 and the oxygen electrode layer 17. The reaction prevention layer 16 is disposed on the opposite side of the electrolyte layer 15 to the hydrogen electrode active layer 14. The reaction prevention layer 16 prevents the constituent elements of the electrolyte layer 15 from reacting with the constituent elements of the oxygen electrode layer 17 to form a layer with high electrical resistance.
  • the reaction prevention layer 16 is made of an ion-conductive material.
  • the reaction prevention layer 16 can be made of GDC, SDC, etc.
  • the porosity of the reaction prevention layer 16 is not particularly limited, but can be, for example, 0.1% to 50%.
  • the thickness of the reaction prevention layer 16 is not particularly limited, but can be, for example, 1 ⁇ m to 50 ⁇ m.
  • the method for forming the reaction prevention layer 16 is not particularly limited, and tape casting, screen printing, casting, dry pressing, etc. can be used.
  • the oxygen electrode layer 17 functions as an anode.
  • the oxygen electrode layer 17 is disposed on the opposite side of the hydrogen electrode active layer 14 with respect to the electrolyte layer 15. In this embodiment, since the reaction prevention layer 16 is disposed between the electrolyte layer 15 and the oxygen electrode layer 17, the oxygen electrode layer 17 is connected to the reaction prevention layer 16. If the reaction prevention layer 16 is not disposed between the electrolyte layer 15 and the oxygen electrode layer 17, the oxygen electrode layer 17 is connected to the electrolyte layer 15.
  • the oxygen electrode layer 17 has a second surface T2 opposite the current collecting member 25.
  • the detailed configuration of the second surface T2 will be described later.
  • the oxygen electrode layer 17 generates O2 from O2- transferred from the hydrogen electrode active layer 14 through the electrolyte layer 15, according to the chemical reaction of the following formula (5).
  • the O2 generated in the oxygen electrode layer 17 is released into the oxygen electrode side space S2.
  • Oxygen electrode layer 17 2O 2 ⁇ ⁇ O 2 +4e ⁇ (5)
  • the oxygen electrode layer 17 is a porous body having ionic and electronic conductivity, and may be made of a composite material of one or more of (La,Sr)(Co,Fe) O3 , (La,Sr) FeO3 , La(Ni,Fe) O3 , (La,Sr) CoO3 , and (Sm,Sr) CoO3 and an ion conductive material (such as GDC).
  • the porosity of the oxygen electrode layer 17 is not particularly limited, but can be, for example, 20% or more and 60% or less.
  • the thickness of the oxygen electrode layer 17 is not particularly limited, but can be, for example, 1 ⁇ m or more and 100 ⁇ m or less.
  • the method for forming the oxygen electrode layer 17 is not particularly limited, and tape casting, screen printing, casting, dry pressing, etc. can be used.
  • the second overlapping region 2a and the second non-overlapping region 2b described below can be formed by applying press processing (e.g., roll pressing) to the second surface T2 of the oxygen electrode layer 17.
  • the separator 20 is electrically connected to the hydrogen electrode current collecting layer 13 via the current collecting member 25.
  • the separator 20 has a connection portion 20a that contacts the current collecting member 25.
  • the separator 20 is made of a metal material that has electronic conductivity.
  • the separator 20 can be made of an alloy material that contains Cr (chromium), for example. Examples of such alloy materials include Fe-Cr alloy steel (stainless steel, etc.) and Ni-Cr alloy steel.
  • the Cr content in the separator 20 is not particularly limited, but can be 4% by mass or more and 30% by mass or less.
  • the separator 20 may contain Ti (titanium) or Zr (zirconium).
  • the Ti content in the separator 20 is not particularly limited, but may be 0.01 mol% or more and 1.0 mol% or less.
  • the Al content in the separator 20 is not particularly limited, but may be 0.01 mol% or more and 0.4 mol% or less.
  • the separator 20 may contain Ti as TiO2 (titania) and Zr as ZrO2 (zirconia).
  • At least a portion of the surface of the separator 20 may be covered with an oxide film formed by oxidation of the constituent elements of the separator 20.
  • a typical example of the oxide film is a chromium oxide film.
  • the current collecting member 25 electrically connects the hydrogen electrode current collecting layer 13 and the connection portion 20a of the separator 20. As shown in FIG.
  • the current collecting member 25 contacts the first surface T1 of the hydrogen electrode current collecting layer 13. The detailed configuration of the current collecting member 25 will be described later.
  • the current collecting member 25 has electronic conductivity and breathability.
  • a porous conductive material such as nickel, a nickel alloy, or stainless steel can be used as the current collecting member 25.
  • the size, shape, and position of the current collecting member 25 can be changed as appropriate.
  • the current collecting member 25 is in contact with the hydrogen electrode current collecting layer 13 and the frame 60, but it does not have to be in contact with the frame 60.
  • the sealing portion 30 positions the frame portion 60 relative to the separator 20.
  • the sealing portion 30 is a dense body.
  • the sealing portion 30 seals the gap between the electrolysis cell 10 and the separator 20. This prevents gas from mixing between the hydrogen electrode side space S1 and the oxygen electrode side space S2.
  • the sealing portion 30 is connected to the electrolyte layer 15 and the frame portion 60 of the support substrate 12, but if the beam portion 50 does not have breathability, the sealing portion 30 does not need to be connected to the electrolyte layer 15.
  • the sealing portion 30 preferably has electronic insulation properties. This can prevent a short circuit from occurring between the hydrogen electrode current collecting layer 13 and the separator 20.
  • the sealing portion 30 can be made of, for example, glass, glass ceramics (crystallized glass), a composite of glass and ceramics, etc.
  • Fig. 2 is a partially enlarged view of Fig. 1.
  • Fig. 2 illustrates a cross section parallel to the Z-axis direction.
  • Fig. 2 illustrates the shapes of each member with emphasis. Therefore, the actual dimensions and ratios of each member can be changed as appropriate.
  • the current collecting member 25 has an overlapping portion 25a and a non-overlapping portion 25b.
  • the overlapping portion 25a is a region of the current collecting member 25 that overlaps with the through hole 40 of the support substrate 12 in the thickness direction.
  • the overlapping portion 25a does not overlap with the beam member 51 of the support substrate 12 in the thickness direction.
  • the non-overlapping portion 25b is a region of the current collecting member 25 that does not overlap with the through hole 40 of the support substrate 12 in the thickness direction.
  • the non-overlapping portion 25b overlaps with the beam member 51 of the support substrate 12 in the thickness direction.
  • the overlapping portion 25a and the non-overlapping portion 25b are connected to each other.
  • the overlapping portion 25a and the non-overlapping portion 25b may be integrally formed.
  • the overlapping portion 25a and the non-overlapping portion 25b each contact the first surface T1 of the hydrogen electrode current collecting layer 13.
  • the density of the overlapping portion 25a is higher than the density of the non-overlapping portion 25b. This improves the electrical connection between the overlapping portion 25a of the current collecting member 25 and the embedded portion 70 of the hydrogen electrode current collecting layer 13. This allows for effective use of the embedded portion 70 of the hydrogen electrode current collecting layer 13, which has higher electronic conductivity than the beam portion 50 of the support substrate 12, allowing current to flow more efficiently. This improves the performance of the electrolytic cell 10 compared to when the density of the current collecting member 25 is uniform.
  • the method for forming the relatively high-density overlapping portion 25a and the relatively low-density non-overlapping portion 25b is not particularly limited, but as described below, when the first surface T1 of the hydrogen electrode current collecting layer 13 has irregularities, the overlapping portion 25a and the non-overlapping portion 25b can be easily formed by pressing the hydrogen electrode current collecting layer 13 against the current collecting member 25.
  • the overlapping portion 25a and the non-overlapping portion 25b can be formed by connecting porous conductive materials of different densities in the planar direction.
  • the first surface T1 is provided on the side of the hydrogen electrode current collecting layer 13 facing the current collecting member 25.
  • the first surface T1 faces the hydrogen electrode side space S1.
  • the first surface T1 is a part of the surface of the electrolysis cell 10.
  • the first surface T1 includes a first overlapping region 1a and a first non-overlapping region 1b.
  • the first surface T1 has irregularities formed by the first overlapping region 1a and the first non-overlapping region 1b.
  • the first overlapping region 1a is a region of the first surface T1 that overlaps with the through hole 40 of the support substrate 12 in the thickness direction.
  • the first overlapping region 1a overlaps with the embedded portion 70 of the hydrogen electrode current collecting layer 13 in the thickness direction.
  • the first overlapping region 1a does not overlap with the beam member 51 of the support substrate 12 in the thickness direction.
  • the first overlapping region 1a contacts the overlapping portion 25a of the current collecting member 25.
  • the first overlapping region 1a is curved so as to protrude toward the current collecting member 25.
  • the first non-overlapping region 1b is connected to one end of the first overlapping region 1a in the surface direction.
  • the surface direction is the direction perpendicular to the thickness direction.
  • the first non-overlapping region 1b is a region of the first surface T1 that does not overlap with the through hole 40 of the support substrate 12 in the thickness direction.
  • the first overlapping region 1a does not overlap with the embedded portion 70 of the hydrogen electrode current collecting layer 13 in the thickness direction.
  • the first non-overlapping region 1b overlaps with the beam member 51 of the support substrate 12 in the thickness direction.
  • the first non-overlapping region 1b contacts the non-overlapping portion 25b of the current collecting member 25.
  • the first non-overlapping region 1b is curved so as to protrude to the opposite side of the current collecting member 25.
  • the first overlapping region 1a and the first non-overlapping region 1b may be provided corresponding to at least one beam member 51, but may also be provided corresponding to two or more adjacent beam members 51.
  • the first overlapping region 1a and the first non-overlapping region 1b are repeatedly arranged alternately in the surface direction. As a result, continuous irregularities are periodically formed on the first surface T1.
  • the second surface T2 is provided on the side of the oxygen electrode layer 17 opposite the current collecting member 25.
  • the second surface T2 is provided on the side opposite the first surface T1.
  • the second surface T2 faces the oxygen electrode side space S2.
  • the second surface T2 is part of the surface of the electrolysis cell 10.
  • the second surface T2 includes a second overlapping region 2a and a second non-overlapping region 2b.
  • the second surface T2 has irregularities formed by the second overlapping region 2a and the second non-overlapping region 2b. This allows the effective electrode area of the oxygen electrode layer 17 to be increased compared to when the second surface T2 is flat, thereby further improving the performance of the electrolysis cell 10.
  • the second overlap region 2a is a region of the second surface T2 that overlaps with the through hole 40 of the support substrate 12 in the thickness direction.
  • the second overlap region 2a overlaps with the embedded portion 70 of the hydrogen electrode current collecting layer 13 in the thickness direction.
  • the second overlap region 2a does not overlap with the beam member 51 of the support substrate 12 in the thickness direction.
  • the second non-overlapping region 2b is connected to one end of the second overlapping region 2a in the surface direction.
  • the second non-overlapping region 2b is a region of the second surface T2 that does not overlap with the through hole 40 of the support substrate 12 in the thickness direction.
  • the second overlapping region 2a does not overlap with the embedded portion 70 of the hydrogen electrode current collecting layer 13 in the thickness direction.
  • the second non-overlapping region 2b overlaps with the beam member 51 of the support substrate 12 in the thickness direction.
  • the flatness of the second surface T2 is preferably smaller than the flatness of the first surface T1. This makes it possible to prevent cracks from occurring in the oxygen electrode layer 17 formed on the layer with an uneven surface (in this embodiment, the reaction prevention layer 16) as shown in FIG. 2.
  • the hydrogen electrode current collecting layer 13 has a plurality of embedded portions 70, but the number of embedded portions 70 may be one or more.
  • the support substrate 12 has the frame portion 60 , but it does not have to have the frame portion 60 .
  • the hydrogen electrode current collecting layer 13 has a plurality of embedded portions 70, a first layer portion 80, and a second layer portion 90. However, it is not necessary for the hydrogen electrode current collecting layer 13 to have at least one of the first layer portion 80 and the second layer portion 90.
  • the hydrogen electrode active layer 14 functions as a cathode and the oxygen electrode layer 17 functions as an anode, but the hydrogen electrode active layer 14 may function as an anode and the oxygen electrode layer 17 may function as a cathode.
  • the constituent materials of the hydrogen electrode active layer 14 and the oxygen electrode layer 17 are switched, and a source gas is caused to flow on the outer surface of the hydrogen electrode active layer 14.
  • the hydrogen electrode current collecting layer 13 functions as an oxygen electrode current collecting layer, but the configuration and function of the oxygen electrode current collecting layer are the same as those of the hydrogen electrode current collecting layer 13 described in the above embodiment.
  • the electrolysis cell 10 has been described as an example of an electrochemical cell, but the electrochemical cell is not limited to an electrolysis cell.
  • An electrochemical cell is a general term for an element in which a pair of electrodes are arranged so that an electromotive force is generated from an overall oxidation-reduction reaction in order to convert electrical energy into chemical energy, and an element for converting chemical energy into electrical energy. Therefore, the electrochemical cell includes, for example, a fuel cell that uses oxide ions or protons as a carrier.
  • the electrolytic cell device 1 has been described as an example of an electrochemical cell device, but the electrochemical cell device is not limited to the electrolytic cell device.
  • An electrochemical cell device is a general term for a device that includes a current collecting member 25 and an electrochemical cell.
  • 1...electrolysis cell device 10...electrolysis cell, 12...support substrate, 13...hydrogen electrode current collecting layer, 14...hydrogen electrode active layer, 15...electrolyte layer, 16...reaction prevention layer, 17...oxygen electrode layer, 20...separator, 25...current collecting member, 25a...overlapping portion, 25b...non-overlapping portion, 30...sealing portion, 40...through hole, 50...beam portion, 51...beam member, T1...first surface, 1a...first overlapping region, 1b...first non-overlapping region, 2a...second overlapping region, 2b...second non-overlapping region, 60...frame portion, 70...embedded portion, 80...first layered portion, 90...second layered portion

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Abstract

An electrolytic cell device (1) is provided with a current collector member (25) and an electrolytic cell (10) that is electrically connected to the current collector member (25). The electrolytic cell (10) is provided with a hydrogen electrode current collector layer (13), a support substrate (12) that is embedded within the hydrogen electrode current collector layer (13) and has through-holes (40), and a hydrogen electrode active layer (14) disposed on the hydrogen electrode current collector layer (13). The current collector member (25) includes overlapping parts (25a) that overlap the through-holes (40) in a thickness direction, and non-overlapping parts (25b) that do not overlap the through-holes (40) in the thickness direction. The density of the overlapping parts (25a) is greater than the density of the non-overlapping parts (25b).

Description

電気化学セルElectrochemical Cell

　本発明は、電気化学セルに関する。 The present invention relates to an electrochemical cell.

　特許文献１には、複数の貫通孔を有する支持基板と、各貫通孔に埋設された複数のアノードと、支持基板上に配置された電解質層と、電解質層上に配置されたカソードとを備えるアノード支持型の燃料電池セルが開示されている。 Patent Document 1 discloses an anode-supported fuel cell that includes a support substrate having multiple through-holes, multiple anodes embedded in each through-hole, an electrolyte layer disposed on the support substrate, and a cathode disposed on the electrolyte layer.

特開２０１３－２０１０６１号公報JP 2013-201061 A

　特許文献１に記載の燃料電池セルでは、各アノードが支持基板の各貫通孔に埋設されているため、各アノードへの原料ガスの供給が支持基板によって阻害されやすいだけでなく、各アノードに電流集中が生じやすい。 In the fuel cell described in Patent Document 1, each anode is embedded in each through-hole of the support substrate, so not only is the supply of raw material gas to each anode easily hindered by the support substrate, but current concentration is also likely to occur at each anode.

　そのため、燃料電池セルの性能を向上させるにも限界がある。この問題は、燃料電池セルに限らず、電解セルを含む電気化学セル全般で生じるものである。 As a result, there is a limit to how much the performance of fuel cells can be improved. This problem is not limited to fuel cells, but occurs in all electrochemical cells, including electrolysis cells.

　本発明の課題は、性能を向上可能な電気化学セルを提供することにある。 The objective of the present invention is to provide an electrochemical cell that can improve performance.

　本発明の第１の側面に係る電気化学セル装置は、集電部材と、前記集電部材と電気的に接続される電気化学セルとを備える。前記電気化学セルは、集電層と、前記集電層の内部に埋設され、貫通孔を有する支持基板と、前記集電層上に配置される第１電極層と、第２電極層と、前記第１電極層と前記第２電極層の間に配置される電解質層とを有する。前記集電部材は、厚み方向において前記貫通孔と重なる重畳部と、前記厚み方向において前記貫通孔と重ならない非重畳部とを含む。前記重畳部の密度は、前記非重畳部の密度より高い。 The electrochemical cell device according to the first aspect of the present invention comprises a current collecting member and an electrochemical cell electrically connected to the current collecting member. The electrochemical cell comprises a current collecting layer, a support substrate embedded within the current collecting layer and having a through hole, a first electrode layer disposed on the current collecting layer, a second electrode layer, and an electrolyte layer disposed between the first electrode layer and the second electrode layer. The current collecting member includes an overlapping portion that overlaps with the through hole in the thickness direction, and a non-overlapping portion that does not overlap with the through hole in the thickness direction. The density of the overlapping portion is higher than the density of the non-overlapping portion.

　本発明の第２の側面に係る電気化学セルは、第１の側面に係り、前記集電層は、前記集電部材側の第１表面を有する。前記第１表面は、厚み方向において前記貫通孔と重なる第１重畳領域と、前記厚み方向において前記貫通孔と重ならない第１非重畳領域とを含む。前記第１重畳領域は、前記集電部材側に突出し、前記第１非重畳領域は、前記集電部材の反対側に突出している。 The electrochemical cell according to the second aspect of the present invention relates to the first aspect, and the current collecting layer has a first surface on the current collecting member side. The first surface includes a first overlapping region that overlaps with the through hole in the thickness direction, and a first non-overlapping region that does not overlap with the through hole in the thickness direction. The first overlapping region protrudes towards the current collecting member, and the first non-overlapping region protrudes to the opposite side of the current collecting member.

　本発明の第３の側面に係る電気化学セルは、第１又は２の側面に係り、前記第２電極層は、前記集電部材と反対側の第２表面を有し、前記第２表面は、前記厚み方向において前記貫通孔と重なる第２重畳領域と、前記厚み方向において前記貫通孔と重ならない第２非重畳領域とを含む。前記第２重畳領域は、前記集電部材側に突出し、前記第２非重畳領域は、前記集電部材の反対側に突出している。 The electrochemical cell according to the third aspect of the present invention relates to the first or second aspect, and the second electrode layer has a second surface opposite the current collecting member, and the second surface includes a second overlapping region that overlaps with the through hole in the thickness direction, and a second non-overlapping region that does not overlap with the through hole in the thickness direction. The second overlapping region protrudes toward the current collecting member, and the second non-overlapping region protrudes to the opposite side of the current collecting member.

　本発明の第４の側面に係る電気化学セルは、第３の側面に係り、前記第２表面の平面度は、前記第１表面の平面度より小さい。 The electrochemical cell according to the fourth aspect of the present invention is the electrochemical cell according to the third aspect, in which the flatness of the second surface is less than the flatness of the first surface.

　本発明によれば、性能を向上可能な電気化学セルを提供することができる。 The present invention provides an electrochemical cell that can improve performance.

図１は、実施形態に係る電解セル装置の断面図である。FIG. 1 is a cross-sectional view of an electrolysis cell device according to an embodiment. 図２は、図１の部分拡大図である。FIG. 2 is a partially enlarged view of FIG.

　（電解セル装置１）
　図１は、実施形態に係る電解セル装置１の構成を示す断面図である。 (Electrolytic cell device 1)
FIG. 1 is a cross-sectional view showing the configuration of an electrolysis cell device 1 according to an embodiment.

　電解セル装置１は、電解セル１０、セパレータ２０、集電部材２５及び封止部３０を備える。Ｘ軸方向及びＹ軸方向に垂直なＺ軸方向に電解セル装置１を複数積層することによって、セルスタック（不図示）を形成することができる。 The electrolytic cell device 1 includes an electrolytic cell 10, a separator 20, a current collecting member 25, and a sealing portion 30. A cell stack (not shown) can be formed by stacking multiple electrolytic cell devices 1 in the Z-axis direction perpendicular to the X-axis direction and the Y-axis direction.

　電解セル装置１は、本発明に係る「電気化学セル装置」の一例である。電解セル１０は、本発明に係る「電気化学セル」の一例である。 The electrolytic cell device 1 is an example of an "electrochemical cell device" according to the present invention. The electrolytic cell 10 is an example of an "electrochemical cell" according to the present invention.

　（電解セル１０）
　図１に示すように、電解セル１０は、支持基板１２、水素極集電層１３、水素極活性層１４、電解質層１５、反応防止層１６、及び酸素極層１７を備える。水素極集電層１３、水素極活性層１４、電解質層１５、反応防止層１６、及び酸素極層１７は、Ｚ軸方向において、この順で積層されている。 (Electrolytic cell 10)
1, the electrolysis cell 10 includes a support substrate 12, a hydrogen electrode current collecting layer 13, a hydrogen electrode active layer 14, an electrolyte layer 15, a reaction prevention layer 16, and an oxygen electrode layer 17. The hydrogen electrode current collecting layer 13, the hydrogen electrode active layer 14, the electrolyte layer 15, the reaction prevention layer 16, and the oxygen electrode layer 17 are stacked in this order in the Z-axis direction.

　水素極集電層１３は、本発明に係る「集電層」の一例である。水素極活性層１４は、本発明に係る「第１電極層」の一例である。酸素極層１７は、本発明に係る「第２電極層」の一例である。 The hydrogen electrode current collecting layer 13 is an example of a "current collecting layer" according to the present invention. The hydrogen electrode active layer 14 is an example of a "first electrode layer" according to the present invention. The oxygen electrode layer 17 is an example of a "second electrode layer" according to the present invention.

　支持基板１２、水素極集電層１３、水素極活性層１４、電解質層１５、及び酸素極層１７は必須の構成であり、反応防止層１６は任意の構成である。 The support substrate 12, hydrogen electrode current collecting layer 13, hydrogen electrode active layer 14, electrolyte layer 15, and oxygen electrode layer 17 are essential components, while the reaction prevention layer 16 is optional.

　［支持基板１２］
　支持基板１２は、水素極集電層１３とともに電解セル１０の支持体として機能する。支持基板１２は、複数の貫通孔４０、梁部５０及び枠部６０を有する。 [Support substrate 12]
The support substrate 12 functions as a support for the electrolysis cell 10 together with the hydrogen electrode current collecting layer 13. The support substrate 12 has a plurality of through holes 40, beam portions 50, and a frame portion 60.

　各貫通孔４０は、支持基板１２を貫通する。各貫通孔４０は、支持基板１２の厚み方向（Ｚ軸方向）に沿って延びる。各貫通孔４０は、梁部５０どうしの間、又は、梁部５０と枠部６０の間に形成される。各貫通孔４０には水素極集電層１３のうち後述する埋設部７０が埋設される。 Each through hole 40 penetrates the support substrate 12. Each through hole 40 extends along the thickness direction (Z-axis direction) of the support substrate 12. Each through hole 40 is formed between the beam portions 50 or between the beam portion 50 and the frame portion 60. A buried portion 70 (described later) of the hydrogen electrode current collecting layer 13 is buried in each through hole 40.

　梁部５０は、水素極集電層１３の内部に埋設される。すなわち、梁部５０は、水素極集電層１３の表面に露出していない。梁部５０の外周面は水素極集電層１３によって覆われている。 The beam portion 50 is embedded inside the hydrogen electrode current collecting layer 13. In other words, the beam portion 50 is not exposed on the surface of the hydrogen electrode current collecting layer 13. The outer peripheral surface of the beam portion 50 is covered by the hydrogen electrode current collecting layer 13.

　梁部５０は、枠部６０の内側に配置される。梁部５０は、枠部６０と実質的に一体であってもよい。 The beam portion 50 is disposed inside the frame portion 60. The beam portion 50 may be substantially integral with the frame portion 60.

　梁部５０は、複数の梁部材５１によって構成されている。各梁部材５１は棒状に形成される。図１に図示された各梁部材５１は、Ｙ軸方向に沿って延びている。各梁部材５１の端部は、枠部６０の内周面に連結されている。 The beam portion 50 is composed of multiple beam members 51. Each beam member 51 is formed in a rod shape. Each beam member 51 shown in FIG. 1 extends along the Y-axis direction. The ends of each beam member 51 are connected to the inner peripheral surface of the frame portion 60.

　梁部５０は、図１に図示された各梁部材５１に加えてＸ軸方向に沿って延びる１以上の梁部材を更に含んでいてもよい。各梁部材５１の数及び位置は適宜変更可能である。梁部５０は、全体として格子状であってもよい。 The beam portion 50 may further include one or more beam members extending along the X-axis direction in addition to the beam members 51 shown in FIG. 1. The number and positions of the beam members 51 may be changed as appropriate. The beam portion 50 may be lattice-shaped as a whole.

　図１に示すように、本実施形態に係る各梁部材５１の断面形状は矩形であるが、各梁部材５１の断面形状は適宜変更可能である。各梁部材５１の断面形状は、同じであってもよいし異なっていてもよい。 As shown in FIG. 1, the cross-sectional shape of each beam member 51 in this embodiment is rectangular, but the cross-sectional shape of each beam member 51 can be changed as appropriate. The cross-sectional shapes of each beam member 51 may be the same or different.

　梁部５０は、例えば、フォルステライト（Ｍｇ２ＳｉＯ４）、ケイ酸マグネシウム（ＭｇＳｉＯ３）、ジルコニア（ＺｒＯ２，部分安定化ジルコニア含む）、マグネシア（ＭｇＯ）、スピネル（ＭｇＡｌ２Ｏ４、ＮｉＡｌ２Ｏ４）、イットリア安定化ジルコニア（ＹＳＺ）、カルシア安定化ジルコニア（ＣＳＺ）、ニッケル（Ｎｉ）、酸化ニッケル（ＮｉＯ）、アルミナ（Ａｌ２Ｏ３）、酸化ニッケル－マグネシア固溶体（ＭｇｘＮｉ（１－ｘ）Ｏ［０＜ｘ＜１］）及びこれらのうち２つ以上を組み合わせた混合材料などによって構成することができる。これらの材料は、総じて電子伝導性が低い。 The beam portion 50 can be made of, for example, forsterite (Mg 2 SiO 4 ), magnesium silicate (MgSiO 3 ), zirconia (ZrO 2 , including partially stabilized zirconia), magnesia (MgO), spinel (MgAl 2 O 4 , NiAl 2 O 4 ), yttria stabilized zirconia (YSZ), calcia stabilized zirconia (CSZ), nickel (Ni), nickel oxide (NiO), alumina (Al 2 O 3 ), nickel oxide-magnesia solid solution (Mg x Ni (1-x) O[0<x<1]), and a mixed material of two or more of these. These materials generally have low electronic conductivity.

　梁部５０の気孔率は特に限られないが、例えば０．１％以上１５％以下とすることができる。梁部５０の気孔率は、水素極集電層１３の気孔率より低くてもよい。梁部５０の気孔率は、５％以下であることが好ましい。これによって、梁部５０の剛性を向上させることができる。 The porosity of the beam portion 50 is not particularly limited, but can be, for example, 0.1% or more and 15% or less. The porosity of the beam portion 50 may be lower than the porosity of the hydrogen electrode current collecting layer 13. It is preferable that the porosity of the beam portion 50 is 5% or less. This can improve the rigidity of the beam portion 50.

　本実施形態において、梁部５０の電子伝導性は、水素極集電層１３の電子伝導性より低い。梁部５０は、電子絶縁性を有していてもよい。梁部５０の電子伝導率は特に制限されないが、例えば８００℃以下で１０－１Ｓ／ｍ以下とすることができる。 In this embodiment, the electronic conductivity of the beam portion 50 is lower than the electronic conductivity of the hydrogen electrode current collecting layer 13. The beam portion 50 may have electronic insulation. The electronic conductivity of the beam portion 50 is not particularly limited, but can be, for example, 10 −1 S/m or less at 800° C. or less.

　梁部５０の形成方法は特に制限されず、押出成形法、テープ成形法、印刷積層法、鋳込み法、乾式プレス法などを用いることができる。 The method for forming the beam portion 50 is not particularly limited, and methods such as extrusion molding, tape casting, printing lamination, casting, and dry pressing can be used.

　枠部６０は、環状に形成される。枠部６０は、梁部５０及び水素極集電層１３を取り囲む。本実施形態において、枠部６０は、セパレータ２０上に配置される。枠部６０は、封止部３０によって位置決めされている。 The frame portion 60 is formed in an annular shape. The frame portion 60 surrounds the beam portion 50 and the hydrogen electrode current collecting layer 13. In this embodiment, the frame portion 60 is disposed on the separator 20. The frame portion 60 is positioned by the sealing portion 30.

　枠部６０は、例えば、フォルステライト（Ｍｇ２ＳｉＯ４）、ケイ酸マグネシウム（ＭｇＳｉＯ３）、ジルコニア（ＺｒＯ２，部分安定化ジルコニア含む）、マグネシア（ＭｇＯ）、スピネル（ＭｇＡｌ２Ｏ４、ＮｉＡｌ２Ｏ４）、イットリア安定化ジルコニア（ＹＳＺ）、カルシア安定化ジルコニア（ＣＳＺ）、ニッケル（Ｎｉ）、酸化ニッケル（ＮｉＯ）、アルミナ（Ａｌ２Ｏ３）、酸化ニッケル－マグネシア固溶体（ＭｇｘＮｉ（１－ｘ）Ｏ［０＜ｘ＜１］）及びこれらのうち２つ以上を組み合わせた混合材料などによって構成することができる。枠部６０は、梁部５０と同じ材料によって構成されていてもよい。この場合、枠部６０は、梁部５０と実質的に一体であってもよい。枠部６０は、梁部５０と異なる材料によって構成されていてもよい。 The frame 60 can be made of, for example, forsterite (Mg 2 SiO 4 ), magnesium silicate (MgSiO 3 ), zirconia (including ZrO 2 and partially stabilized zirconia), magnesia (MgO), spinel (MgAl 2 O 4 , NiAl 2 O 4 ), yttria stabilized zirconia (YSZ), calcia stabilized zirconia (CSZ), nickel (Ni), nickel oxide (NiO), alumina (Al 2 O 3 ), nickel oxide-magnesia solid solution (Mg x Ni (1-x) O[0<x<1]), and a mixed material of two or more of these. The frame 60 may be made of the same material as the beam 50. In this case, the frame 60 may be substantially integral with the beam 50. The frame 60 may be made of a material different from that of the beam 50.

　枠部６０の気孔率は、例えば０．１％以上１５％以下とすることができる。枠部６０の気孔率は、水素極集電層１３の気孔率より低くてもよい。枠部６０の気孔率は、５％以下であることが好ましい。これによって、枠部６０にガス封止性を付与できるため、水素極側空間Ｓ１から水素極集電層１３に供給された原料ガスが枠部６０を介して水素極側空間Ｓ１に戻ることを抑制できる。 The porosity of the frame 60 can be, for example, 0.1% or more and 15% or less. The porosity of the frame 60 may be lower than the porosity of the hydrogen electrode current collecting layer 13. The porosity of the frame 60 is preferably 5% or less. This provides the frame 60 with gas sealing properties, thereby preventing the raw material gas supplied from the hydrogen electrode side space S1 to the hydrogen electrode current collecting layer 13 from returning to the hydrogen electrode side space S1 via the frame 60.

　本実施形態において、枠部６０の電子伝導性は、水素極集電層１３の電子伝導性より低い。枠部６０は、電子絶縁性を有していてもよい。枠部６０の電子伝導率は特に制限されないが、例えば８００℃以下で１０－１Ｓ／ｍ以下とすることができる。 In this embodiment, the electronic conductivity of the frame 60 is lower than the electronic conductivity of the hydrogen electrode current collecting layer 13. The frame 60 may have electronic insulation properties. The electronic conductivity of the frame 60 is not particularly limited, but can be, for example, 10 −1 S/m or less at 800° C. or less.

　枠部６０の形成方法は特に制限されず、押出成形法、テープ成形法、印刷積層法、鋳込み法、乾式プレス法などを用いることができる。 The method for forming the frame portion 60 is not particularly limited, and methods such as extrusion molding, tape casting, printing lamination, casting, dry pressing, etc. can be used.

　［水素極集電層１３］
　水素極集電層１３は、支持基板１２とともに電解セル１０の支持体として機能する。水素極集電層１３は、複数の埋設部７０、第１層状部８０及び第２層状部９０を有する。 [Hydrogen electrode current collecting layer 13]
The hydrogen electrode current collecting layer 13 functions as a support for the electrolysis cell 10 together with the support substrate 12. The hydrogen electrode current collecting layer 13 has a plurality of embedded portions 70, a first layer portion 80, and a second layer portion 90.

　各埋設部７０は、支持基板１２の各貫通孔４０に埋設される。各埋設部７０は、第１層状部８０に連なる。各埋設部７０は、第２層状部９０に連なる。各埋設部７０は、支持基板１２の厚み方向（Ｚ軸方向）において、第１層状部８０と第２層状部９０の間に配置される。 Each embedded portion 70 is embedded in each through hole 40 of the support substrate 12. Each embedded portion 70 is connected to the first layer portion 80. Each embedded portion 70 is connected to the second layer portion 90. Each embedded portion 70 is disposed between the first layer portion 80 and the second layer portion 90 in the thickness direction (Z-axis direction) of the support substrate 12.

　第１層状部８０は、各埋設部７０と水素極活性層１４の間に配置される。第１層状部８０は、梁部５０全体を覆うように層状に形成される。第１層状部８０は、各埋設部７０と一体的に形成される。第１層状部８０は、梁部５０上に配置される。第１層状部８０は、支持基板１２のうち梁部５０の水素極活性層１４側を覆っている。 The first layer portion 80 is disposed between each embedded portion 70 and the hydrogen electrode active layer 14. The first layer portion 80 is formed in a layer shape so as to cover the entire beam portion 50. The first layer portion 80 is formed integrally with each embedded portion 70. The first layer portion 80 is disposed on the beam portion 50. The first layer portion 80 covers the hydrogen electrode active layer 14 side of the beam portion 50 of the support substrate 12.

　第２層状部９０は、各埋設部７０を基準として第１層状部８０の反対側に配置される。第２層状部９０は、梁部５０全体を覆うように層状に形成される。第２層状部９０は、各埋設部７０と一体的に形成される。第２層状部９０は、梁部５０上に配置される。第２層状部９０は、支持基板１２のうち梁部５０の水素極活性層１４の反対側を覆っている。 The second layer portion 90 is disposed on the opposite side of the first layer portion 80 with respect to each embedded portion 70. The second layer portion 90 is formed in a layer shape so as to cover the entire beam portion 50. The second layer portion 90 is formed integrally with each embedded portion 70. The second layer portion 90 is disposed on the beam portion 50. The second layer portion 90 covers the side of the support substrate 12 opposite the hydrogen electrode active layer 14 of the beam portion 50.

　水素極集電層１３は、集電部材２５側の第１表面Ｔ１を有する。第１表面Ｔ１の詳細構成については後述する。 The hydrogen electrode current collecting layer 13 has a first surface T1 on the side of the current collecting member 25. The detailed configuration of the first surface T1 will be described later.

　水素極集電層１３は、電子伝導性を有する多孔体である。本実施形態において、水素極集電層１３の電子伝導性は、支持基板１２の電子伝導性より高い。水素極集電層１３は、ニッケル（Ｎｉ）を含有する。共電解の場合、Ｎｉは、生成されるＨ２と原料ガスに含まれるＣＯ２との熱的反応を促進してメタネーションや逆水性ガスシフト反応などに適切なガス組成を維持する熱触媒としても機能する。Ｎｉは、電解セル１０の作動中、基本的には金属Ｎｉの状態で存在しているが、一部は酸化ニッケル（ＮｉＯ）の状態で存在していてもよい。 The hydrogen electrode current collecting layer 13 is a porous body having electronic conductivity. In this embodiment, the electronic conductivity of the hydrogen electrode current collecting layer 13 is higher than that of the support substrate 12. The hydrogen electrode current collecting layer 13 contains nickel (Ni). In the case of co-electrolysis, Ni also functions as a thermal catalyst that promotes the thermal reaction between the generated H 2 and CO 2 contained in the raw material gas to maintain an appropriate gas composition for methanation, reverse water gas shift reaction, etc. During operation of the electrolysis cell 10, Ni is basically present in the form of metal Ni, but may also be partially present in the form of nickel oxide (NiO).

　水素極集電層１３は、ニッケル（Ｎｉ）以外にセラミックを含む。セラミックは、イオン伝導性を有していてもよい。セラミックとしては、例えば、イットリア（Ｙ２Ｏ３）、マグネシア（ＭｇＯ）、酸化鉄（Ｆｅ２Ｏ３）、ジルコニア（ＺｒＯ２，部分安定化ジルコニア含む）、イットリア安定化ジルコニア（ＹＳＺ）、カルシア安定化ジルコニア（ＣＳＺ）、スカンジア安定化ジルコニア（ＳｃＳＺ）、ガドリニウムドープセリア（ＧＤＣ）、サマリウムドープセリア（ＳＤＣ）、及びこれらのうち２つ以上を組み合わせた混合材料などを用いることができる。 The hydrogen electrode current collecting layer 13 contains a ceramic in addition to nickel (Ni). The ceramic may have ion conductivity. Examples of the ceramic that can be used include yttria (Y 2 O 3 ), magnesia (MgO), iron oxide (Fe 2 O 3 ), zirconia (ZrO 2 , including partially stabilized zirconia), yttria stabilized zirconia (YSZ), calcia stabilized zirconia (CSZ), scandia stabilized zirconia (ScSZ), gadolinium doped ceria (GDC), samarium doped ceria (SDC), and a mixed material of two or more of these.

　水素極集電層１３の気孔率は特に制限されないが、例えば２０％以上４０％以下とすることができる。水素極集電層１３の厚さは特に制限されないが、例えば１５０μｍ以上１０００μｍ以下とすることができる。Ｚ軸方向において、水素極集電層１３の厚みは、水素極活性層１４、電解質層１５、反応防止層１６及び酸素極層１７それぞれの厚みより大きくてもよい。 The porosity of the hydrogen electrode current collecting layer 13 is not particularly limited, but can be, for example, 20% to 40%. The thickness of the hydrogen electrode current collecting layer 13 is not particularly limited, but can be, for example, 150 μm to 1000 μm. In the Z-axis direction, the thickness of the hydrogen electrode current collecting layer 13 may be greater than the thickness of each of the hydrogen electrode active layer 14, the electrolyte layer 15, the reaction prevention layer 16, and the oxygen electrode layer 17.

　水素極集電層１３の形成方法は特に制限されず、テープ成形、スクリーン印刷、鋳込み成形、乾式プレス法などを用いることができる。なお、後述する第１重畳領域１ａ及び第１非重畳領域１ｂは、水素極集電層１３の第１表面Ｔ１にプレス加工（例えば、ロールプレス加工）を施すことによって形成することができる。 The method for forming the hydrogen electrode current collecting layer 13 is not particularly limited, and tape casting, screen printing, casting, dry pressing, etc. can be used. The first overlapping region 1a and the first non-overlapping region 1b described below can be formed by applying press processing (e.g., roll pressing) to the first surface T1 of the hydrogen electrode current collecting layer 13.

　［水素極活性層１４］
　水素極活性層１４は、カソードとして機能する。水素極活性層１４は、水素極集電層１３上に配置される。水素極活性層１４は、電解質層１５によって覆われる。 [Hydrogen electrode active layer 14]
The hydrogen electrode active layer 14 functions as a cathode. The hydrogen electrode active layer 14 is disposed on the hydrogen electrode current collecting layer 13. The hydrogen electrode active layer 14 is covered with an electrolyte layer 15.

　水素極活性層１４には、水素極集電層１３を介して原料ガスが供給される。本実施形態において、原料ガスは少なくともＨ２Ｏを含む。 A source gas is supplied to the hydrogen electrode active layer 14 through the hydrogen electrode current collecting layer 13. In this embodiment, the source gas contains at least H2O .

　原料ガスがＨ２Ｏのみを含む場合、水素極活性層１４は、下記（１）式に示す水電解の電気化学反応に従って、原料ガスからＨ２を生成する。 When the source gas contains only H 2 O, the hydrogen electrode active layer 14 produces H 2 from the source gas in accordance with the electrochemical reaction of water electrolysis shown in the following formula (1).

　・水素極活性層１４：Ｈ２Ｏ＋２ｅ－→Ｈ２＋Ｏ２－・・・（１） Hydrogen electrode active layer 14: H2O+2e-→H2+O2-...(1)

　原料ガスがＨ２Ｏに加えてＣＯ２を含む場合、水素極活性層１４は、下記（２）、（３）、（４）式に示す共電解の電気化学反応に従って、原料ガスからＨ２、ＣＯ及びＯ２－を生成する。 When the source gas contains CO 2 in addition to H 2 O, the hydrogen electrode active layer 14 produces H 2 , CO, and O 2− from the source gas in accordance with the co-electrochemical reactions shown in the following formulas (2), (3), and (4 ) .

　・水素極活性層１４：ＣＯ２＋Ｈ２Ｏ＋４ｅ－→ＣＯ＋Ｈ２＋２Ｏ２－・・・（２）
　・Ｈ２Ｏの電気化学反応：Ｈ２Ｏ＋２ｅ－→Ｈ２＋Ｏ２－・・・（３）
　・ＣＯ２の電気化学反応：ＣＯ２＋２ｅ－→ＣＯ＋Ｏ２－・・・（４） ・Hydrogen electrode active layer 14: CO 2 +H 2 O+4e − →CO+H 2 +2O 2− (2)
Electrochemical reaction of H 2 O: H 2 O + 2e − → H 2 + O 2− (3)
Electrochemical reaction of CO2 : CO2 + 2e- → CO + O2 -... (4)

　水素極活性層１４は、電子伝導性を有する多孔体である。水素極活性層１４は、イオン伝導性を有していてもよい。水素極活性層１４は、例えば、ＹＳＺ、ＣＳＺ、ＳｃＳＺ、ＧＤＣ、（ＳＤＣ）、（Ｌａ，Ｓｒ）（Ｃｒ，Ｍｎ）Ｏ３、（Ｌａ，Ｓｒ）ＴｉＯ３、Ｓｒ２（Ｆｅ,Ｍｏ）２Ｏ６、（Ｌａ，Ｓｒ）ＶＯ３、（Ｌａ，Ｓｒ）ＦｅＯ３、及びこれらのうち２つ以上を組み合わせた混合材料、或いは、これらのうち１つ以上とＮｉＯとの複合物によって構成することができる。 The hydrogen electrode active layer 14 is a porous body having electronic conductivity. The hydrogen electrode active layer 14 may have ion conductivity. The hydrogen electrode active layer 14 may be composed of, for example, YSZ, CSZ, ScSZ, GDC, (SDC), (La, Sr) (Cr, Mn) O 3 , (La, Sr) TiO 3 , Sr 2 (Fe, Mo) 2 O 6 , (La, Sr) VO 3 , (La, Sr) FeO 3 , a mixed material of two or more of these, or a composite of one or more of these and NiO.

　水素極活性層１４の気孔率は特に制限されないが、例えば２０％以上４０％以下とすることができる。水素極活性層１４の厚みは特に制限されないが、例えば５μｍ以上５０μｍ以下とすることができる。 The porosity of the hydrogen electrode active layer 14 is not particularly limited, but can be, for example, 20% to 40%. The thickness of the hydrogen electrode active layer 14 is not particularly limited, but can be, for example, 5 μm to 50 μm.

　水素極活性層１４の形成方法は特に制限されず、テープ成形、スクリーン印刷、鋳込み成形、乾式プレス法などを用いることができる。 The method for forming the hydrogen electrode active layer 14 is not particularly limited, and tape casting, screen printing, casting, dry pressing, etc. can be used.

　［電解質層１５］
　電解質層１５は、水素極活性層１４及び酸素極層１７の間に配置される。本実施形態では、電解質層１５及び酸素極層１７の間に反応防止層１６が配置されているので、電解質層１５は、水素極活性層１４及び反応防止層１６の間に挟まれている。 [Electrolyte layer 15]
The electrolyte layer 15 is disposed between the hydrogen electrode active layer 14 and the oxygen electrode layer 17. In this embodiment, the reaction prevention layer 16 is disposed between the electrolyte layer 15 and the oxygen electrode layer 17, so that the electrolyte layer 15 is sandwiched between the hydrogen electrode active layer 14 and the reaction prevention layer 16.

　電解質層１５は、水素極活性層１４を覆う。図１に示すように、電解質層１５は、水素極活性層１４の表面全体を覆っていることが好ましい。電解質層１５の外周部は、枠部６０に接続されている。 The electrolyte layer 15 covers the hydrogen electrode active layer 14. As shown in FIG. 1, it is preferable that the electrolyte layer 15 covers the entire surface of the hydrogen electrode active layer 14. The outer periphery of the electrolyte layer 15 is connected to the frame portion 60.

　電解質層１５は、水素極活性層１４において生成されたＯ２－を酸素極層１７側に伝達させる機能を有する。電解質層１５は、イオン伝導性を有し且つ電子伝導性を有さない緻密体である。電解質層１５は、例えば、ＹＳＺ、ＧＤＣ、ＳｃＳＺ、ＳＤＣ、ランタンガレート（ＬＳＧＭ）などによって構成することができる。 The electrolyte layer 15 has a function of transmitting O 2- generated in the hydrogen electrode active layer 14 to the oxygen electrode layer 17. The electrolyte layer 15 is a dense body that has ionic conductivity but no electronic conductivity. The electrolyte layer 15 can be made of, for example, YSZ, GDC, ScSZ, SDC, lanthanum gallate (LSGM), or the like.

　電解質層１５の気孔率は特に制限されないが、例えば０．１％以上７％以下とすることができる。電解質層１５の厚みは特に制限されないが、例えば１μｍ以上１００μｍ以下とすることができる。 The porosity of the electrolyte layer 15 is not particularly limited, but can be, for example, 0.1% to 7%. The thickness of the electrolyte layer 15 is not particularly limited, but can be, for example, 1 μm to 100 μm.

　電解質層１５の形成方法は特に制限されず、テープ成形、スクリーン印刷、鋳込み成形、乾式プレス法などを用いることができる。 The method for forming the electrolyte layer 15 is not particularly limited, and tape casting, screen printing, casting, dry pressing, etc. can be used.

　［反応防止層１６］
　反応防止層１６は、電解質層１５及び酸素極層１７の間に配置される。反応防止層１６は、電解質層１５を基準として水素極活性層１４の反対側に配置される。反応防止層１６は、電解質層１５の構成元素が酸素極層１７の構成元素と反応して電気抵抗の大きい層が形成されることを抑制する。 [Reaction prevention layer 16]
The reaction prevention layer 16 is disposed between the electrolyte layer 15 and the oxygen electrode layer 17. The reaction prevention layer 16 is disposed on the opposite side of the electrolyte layer 15 to the hydrogen electrode active layer 14. The reaction prevention layer 16 prevents the constituent elements of the electrolyte layer 15 from reacting with the constituent elements of the oxygen electrode layer 17 to form a layer with high electrical resistance.

　反応防止層１６は、イオン伝導性材料によって構成される。反応防止層１６は、ＧＤＣ、ＳＤＣなどによって構成することができる。 The reaction prevention layer 16 is made of an ion-conductive material. The reaction prevention layer 16 can be made of GDC, SDC, etc.

　反応防止層１６の気孔率は特に制限されないが、例えば０．１％以上５０％以下とすることができる。反応防止層１６の厚みは特に制限されないが、例えば１μｍ以上５０μｍ以下とすることができる。 The porosity of the reaction prevention layer 16 is not particularly limited, but can be, for example, 0.1% to 50%. The thickness of the reaction prevention layer 16 is not particularly limited, but can be, for example, 1 μm to 50 μm.

　反応防止層１６の形成方法は特に制限されず、テープ成形、スクリーン印刷、鋳込み成形、乾式プレス法などを用いることができる。 The method for forming the reaction prevention layer 16 is not particularly limited, and tape casting, screen printing, casting, dry pressing, etc. can be used.

　［酸素極層１７］
　酸素極層１７は、アノードとして機能する。酸素極層１７は、電解質層１５を基準として水素極活性層１４の反対側に配置される。本実施形態では、電解質層１５及び酸素極層１７の間に反応防止層１６が配置されているので、酸素極層１７は反応防止層１６に接続される。電解質層１５及び酸素極層１７の間に反応防止層１６が配置されない場合、酸素極層１７は電解質層１５に接続される。 [Oxygen electrode layer 17]
The oxygen electrode layer 17 functions as an anode. The oxygen electrode layer 17 is disposed on the opposite side of the hydrogen electrode active layer 14 with respect to the electrolyte layer 15. In this embodiment, since the reaction prevention layer 16 is disposed between the electrolyte layer 15 and the oxygen electrode layer 17, the oxygen electrode layer 17 is connected to the reaction prevention layer 16. If the reaction prevention layer 16 is not disposed between the electrolyte layer 15 and the oxygen electrode layer 17, the oxygen electrode layer 17 is connected to the electrolyte layer 15.

　酸素極層１７は、集電部材２５と反対側の第２表面Ｔ２を有する。第２表面Ｔ２の詳細構成については後述する。 The oxygen electrode layer 17 has a second surface T2 opposite the current collecting member 25. The detailed configuration of the second surface T2 will be described later.

　酸素極層１７は、下記（５）式の化学反応に従って、水素極活性層１４から電解質層１５を介して伝達されるＯ２－からＯ２を生成する。酸素極層１７において生成されたＯ２は、酸素極側空間Ｓ２に放出される。 The oxygen electrode layer 17 generates O2 from O2- transferred from the hydrogen electrode active layer 14 through the electrolyte layer 15, according to the chemical reaction of the following formula (5). The O2 generated in the oxygen electrode layer 17 is released into the oxygen electrode side space S2.

　・酸素極層１７：２Ｏ２－→Ｏ２＋４ｅ－・・・（５） Oxygen electrode layer 17: 2O 2− →O 2 +4e − (5)

　酸素極層１７は、イオン伝導性及び電子伝導性を有する多孔体である。酸素極層１７は、例えば（Ｌａ，Ｓｒ）（Ｃｏ，Ｆｅ）Ｏ３、（Ｌａ，Ｓｒ）ＦｅＯ３、Ｌａ（Ｎｉ，Ｆｅ）Ｏ３、（Ｌａ，Ｓｒ）ＣｏＯ３、及び（Ｓｍ，Ｓｒ）ＣｏＯ３のうち１つ以上とイオン伝導材料（ＧＤＣなど）との複合材料によって構成することができる。 The oxygen electrode layer 17 is a porous body having ionic and electronic conductivity, and may be made of a composite material of one or more of (La,Sr)(Co,Fe) O3 , (La,Sr) FeO3 , La(Ni,Fe) O3 , (La,Sr) CoO3 , and (Sm,Sr) CoO3 and an ion conductive material (such as GDC).

　酸素極層１７の気孔率は特に制限されないが、例えば２０％以上６０％以下とすることができる。酸素極層１７の厚みは特に制限されないが、例えば１μｍ以上１００μｍ以下とすることができる。 The porosity of the oxygen electrode layer 17 is not particularly limited, but can be, for example, 20% or more and 60% or less. The thickness of the oxygen electrode layer 17 is not particularly limited, but can be, for example, 1 μm or more and 100 μm or less.

　酸素極層１７の形成方法は特に制限されず、テープ成形、スクリーン印刷、鋳込み成形、乾式プレス法などを用いることができる。なお、後述する第２重畳領域２ａ及び第２非重畳領域２ｂは、酸素極層１７の第２表面Ｔ２にプレス加工（例えば、ロールプレス加工）を施すことによって形成することができる。 The method for forming the oxygen electrode layer 17 is not particularly limited, and tape casting, screen printing, casting, dry pressing, etc. can be used. The second overlapping region 2a and the second non-overlapping region 2b described below can be formed by applying press processing (e.g., roll pressing) to the second surface T2 of the oxygen electrode layer 17.

　（セパレータ２０）
　セパレータ２０は、集電部材２５を介して水素極集電層１３と電気的に接続される。セパレータ２０は、集電部材２５と接触する接続部２０ａを有する。 (Separator 20)
The separator 20 is electrically connected to the hydrogen electrode current collecting layer 13 via the current collecting member 25. The separator 20 has a connection portion 20a that contacts the current collecting member 25.

　セパレータ２０は、電子伝導性を有する金属材料によって構成される。セパレータ２０は、例えば、Ｃｒ（クロム）を含有する合金材料によって構成することができる。このような合金材料としては、Ｆｅ－Ｃｒ系合金鋼（ステンレス鋼など）やＮｉ－Ｃｒ系合金鋼などが挙げられる。セパレータ２０におけるＣｒの含有率は特に制限されないが、４質量％以上３０質量％以下とすることができる。 The separator 20 is made of a metal material that has electronic conductivity. The separator 20 can be made of an alloy material that contains Cr (chromium), for example. Examples of such alloy materials include Fe-Cr alloy steel (stainless steel, etc.) and Ni-Cr alloy steel. The Cr content in the separator 20 is not particularly limited, but can be 4% by mass or more and 30% by mass or less.

　セパレータ２０は、Ｔｉ（チタン）やＺｒ（ジルコニウム）を含有していてもよい。セパレータ２０におけるＴｉの含有率は特に制限されないが、０．０１ｍｏｌ％以上１．０ｍｏｌ％以下とすることができる。セパレータ２０におけるＡｌの含有率は特に制限されないが、０．０１ｍｏｌ％以上０．４ｍｏｌ％以下とすることができる。セパレータ２０は、ＴｉをＴｉＯ２（チタニア）として含有していてもよいし、ＺｒをＺｒＯ２（ジルコニア）として含有していてもよい。 The separator 20 may contain Ti (titanium) or Zr (zirconium). The Ti content in the separator 20 is not particularly limited, but may be 0.01 mol% or more and 1.0 mol% or less. The Al content in the separator 20 is not particularly limited, but may be 0.01 mol% or more and 0.4 mol% or less. The separator 20 may contain Ti as TiO2 (titania) and Zr as ZrO2 (zirconia).

　セパレータ２０の表面の少なくとも一部は、セパレータ２０の構成元素が酸化することによって形成される酸化皮膜によって覆われていてもよい。酸化皮膜としては、例えば酸化クロム膜が代表的である。 At least a portion of the surface of the separator 20 may be covered with an oxide film formed by oxidation of the constituent elements of the separator 20. A typical example of the oxide film is a chromium oxide film.

　（集電部材２５）
　集電部材２５は、水素極集電層１３とセパレータ２０の接続部２０ａを電気的に接続する。図１に示すように、集電部材２５は、水素極集電層１３とセパレータ２０の間の水素極側空間Ｓ１に配置される。 (Current collecting member 25)
The current collecting member 25 electrically connects the hydrogen electrode current collecting layer 13 and the connection portion 20a of the separator 20. As shown in FIG.

　集電部材２５は、水素極集電層１３の第１表面Ｔ１に接触する。集電部材２５の詳細構成については後述する。 The current collecting member 25 contacts the first surface T1 of the hydrogen electrode current collecting layer 13. The detailed configuration of the current collecting member 25 will be described later.

　集電部材２５は、電子伝導性及び通気性を有する。集電部材２５としては、例えば、ニッケルやニッケル合金、ステンレス等の多孔性導電材料を用いることができる。集電部材２５のサイズ、形状及び位置は適宜変更可能である。例えば、本実施形態において、集電部材２５は、水素極集電層１３及び枠部６０と接触しているが、枠部６０とは接触していなくてもよい。 The current collecting member 25 has electronic conductivity and breathability. For example, a porous conductive material such as nickel, a nickel alloy, or stainless steel can be used as the current collecting member 25. The size, shape, and position of the current collecting member 25 can be changed as appropriate. For example, in this embodiment, the current collecting member 25 is in contact with the hydrogen electrode current collecting layer 13 and the frame 60, but it does not have to be in contact with the frame 60.

　（封止部３０）
　封止部３０は、セパレータ２０に対して枠部６０を位置決めする。封止部３０は、緻密体である。封止部３０は、電解セル１０とセパレータ２０の隙間を封止する。これによって、水素極側空間Ｓ１と酸素極側空間Ｓ２の間におけるガスの混合が防止される。 (Sealing portion 30)
The sealing portion 30 positions the frame portion 60 relative to the separator 20. The sealing portion 30 is a dense body. The sealing portion 30 seals the gap between the electrolysis cell 10 and the separator 20. This prevents gas from mixing between the hydrogen electrode side space S1 and the oxygen electrode side space S2.

　本実施形態において、封止部３０は、電解質層１５と支持基板１２の枠部６０とに接続されているが、梁部５０が通気性を有していなければ、封止部３０は電解質層１５に接続されていなくてもよい。 In this embodiment, the sealing portion 30 is connected to the electrolyte layer 15 and the frame portion 60 of the support substrate 12, but if the beam portion 50 does not have breathability, the sealing portion 30 does not need to be connected to the electrolyte layer 15.

　封止部３０は、電子絶縁性を有することが好ましい。これによって、水素極集電層１３とセパレータ２０の間に短絡が生じることを防止できる。封止部３０は、例えばガラス、ガラスセラミックス（結晶化ガラス）、ガラスとセラミックスの複合物などによって構成することができる。 The sealing portion 30 preferably has electronic insulation properties. This can prevent a short circuit from occurring between the hydrogen electrode current collecting layer 13 and the separator 20. The sealing portion 30 can be made of, for example, glass, glass ceramics (crystallized glass), a composite of glass and ceramics, etc.

　（集電部材２５の詳細構成）
　集電部材２５の詳細構成について、図２を参照しながら説明する。図２は、図１の部分拡大図である。図２では、Ｚ軸方向に平行な断面が図示されている。図２では、各部材の形状が強調して図示されている。従って、各部材の実際の寸法及び比率は適宜変更可能である。 (Detailed configuration of current collecting member 25)
The detailed configuration of the current collecting member 25 will be described with reference to Fig. 2. Fig. 2 is a partially enlarged view of Fig. 1. Fig. 2 illustrates a cross section parallel to the Z-axis direction. Fig. 2 illustrates the shapes of each member with emphasis. Therefore, the actual dimensions and ratios of each member can be changed as appropriate.

　図２に示すように、集電部材２５は、重畳部２５ａ及び非重畳部２５ｂを有する。 As shown in FIG. 2, the current collecting member 25 has an overlapping portion 25a and a non-overlapping portion 25b.

　重畳部２５ａは、集電部材２５のうち厚み方向において支持基板１２の貫通孔４０と重なる領域である。重畳部２５ａは、厚み方向において支持基板１２の梁部材５１と重ならない。 The overlapping portion 25a is a region of the current collecting member 25 that overlaps with the through hole 40 of the support substrate 12 in the thickness direction. The overlapping portion 25a does not overlap with the beam member 51 of the support substrate 12 in the thickness direction.

　非重畳部２５ｂは、集電部材２５のうち厚み方向において支持基板１２の貫通孔４０と重ならない領域である。非重畳部２５ｂは、厚み方向において支持基板１２の梁部材５１と重なる。 The non-overlapping portion 25b is a region of the current collecting member 25 that does not overlap with the through hole 40 of the support substrate 12 in the thickness direction. The non-overlapping portion 25b overlaps with the beam member 51 of the support substrate 12 in the thickness direction.

　重畳部２５ａと非重畳部２５ｂは、互いに連結されている。重畳部２５ａと非重畳部２５ｂは、一体的に形成されていてもよい。重畳部２５ａと非重畳部２５ｂは、それぞれ水素極集電層１３の第１表面Ｔ１と接触する。 The overlapping portion 25a and the non-overlapping portion 25b are connected to each other. The overlapping portion 25a and the non-overlapping portion 25b may be integrally formed. The overlapping portion 25a and the non-overlapping portion 25b each contact the first surface T1 of the hydrogen electrode current collecting layer 13.

　重畳部２５ａの密度は、非重畳部２５ｂの密度より高い。これによって、集電部材２５の重畳部２５ａと水素極集電層１３の埋設部７０との電気的接続性を向上させることができる。そのため、支持基板１２の梁部５０より電子伝導性の高い水素極集電層１３の埋設部７０を有効利用できるため効率的に電流を流すことができる。よって、集電部材２５の密度が均一である場合に比べて、電解セル１０の性能を向上させることができる。 The density of the overlapping portion 25a is higher than the density of the non-overlapping portion 25b. This improves the electrical connection between the overlapping portion 25a of the current collecting member 25 and the embedded portion 70 of the hydrogen electrode current collecting layer 13. This allows for effective use of the embedded portion 70 of the hydrogen electrode current collecting layer 13, which has higher electronic conductivity than the beam portion 50 of the support substrate 12, allowing current to flow more efficiently. This improves the performance of the electrolytic cell 10 compared to when the density of the current collecting member 25 is uniform.

　なお、相対的に密度の高い重畳部２５ａと相対的に密度の低い非重畳部２５ｂとを形成する手法は特に限られないが、後述するように水素極集電層１３の第１表面Ｔ１に凹凸が形成されている場合には、水素極集電層１３を集電部材２５に押し付けることによって重畳部２５ａと非重畳部２５ｂを簡便に形成することができる。或いは、密度の異なる多孔性導電材料を面方向に連ねることによっても重畳部２５ａと非重畳部２５ｂを形成することができる。 The method for forming the relatively high-density overlapping portion 25a and the relatively low-density non-overlapping portion 25b is not particularly limited, but as described below, when the first surface T1 of the hydrogen electrode current collecting layer 13 has irregularities, the overlapping portion 25a and the non-overlapping portion 25b can be easily formed by pressing the hydrogen electrode current collecting layer 13 against the current collecting member 25. Alternatively, the overlapping portion 25a and the non-overlapping portion 25b can be formed by connecting porous conductive materials of different densities in the planar direction.

　（水素極集電層１３の第１表面Ｔ１の詳細構成）
　水素極集電層１３の第１表面Ｔ１の詳細構成について、図２を参照しながら説明する。 (Detailed configuration of the first surface T1 of the hydrogen electrode current collecting layer 13)
The detailed configuration of the first surface T1 of the hydrogen electrode current collecting layer 13 will be described with reference to FIG.

　第１表面Ｔ１は、水素極集電層１３の集電部材２５側に設けられる。第１表面Ｔ１は、集電部材２５と対向する。第１表面Ｔ１は、水素極側空間Ｓ１に面している。第１表面Ｔ１は、電解セル１０の表面の一部である。 The first surface T1 is provided on the side of the hydrogen electrode current collecting layer 13 facing the current collecting member 25. The first surface T1 faces the hydrogen electrode side space S1. The first surface T1 is a part of the surface of the electrolysis cell 10.

　図２に示すように、第１表面Ｔ１は、第１重畳領域１ａ及び第１非重畳領域１ｂを含む。第１表面Ｔ１には、第１重畳領域１ａ及び第１非重畳領域１ｂによる凹凸が形成されている。 As shown in FIG. 2, the first surface T1 includes a first overlapping region 1a and a first non-overlapping region 1b. The first surface T1 has irregularities formed by the first overlapping region 1a and the first non-overlapping region 1b.

　第１重畳領域１ａは、第１表面Ｔ１のうち厚み方向において支持基板１２の貫通孔４０と重なる領域である。第１重畳領域１ａは、厚み方向において水素極集電層１３の埋設部７０と重なる。第１重畳領域１ａは、厚み方向において支持基板１２の梁部材５１と重ならない。 The first overlapping region 1a is a region of the first surface T1 that overlaps with the through hole 40 of the support substrate 12 in the thickness direction. The first overlapping region 1a overlaps with the embedded portion 70 of the hydrogen electrode current collecting layer 13 in the thickness direction. The first overlapping region 1a does not overlap with the beam member 51 of the support substrate 12 in the thickness direction.

　第１重畳領域１ａは、集電部材２５の重畳部２５ａに接触する。本実施形態では、図２に示すように、第１重畳領域１ａは、集電部材２５側に突出するように湾曲している。 The first overlapping region 1a contacts the overlapping portion 25a of the current collecting member 25. In this embodiment, as shown in FIG. 2, the first overlapping region 1a is curved so as to protrude toward the current collecting member 25.

　第１非重畳領域１ｂは、面方向において第１重畳領域１ａの一端に繋がる。面方向とは、厚み方向に垂直な方向である。第１非重畳領域１ｂは、第１表面Ｔ１のうち厚み方向において支持基板１２の貫通孔４０と重ならない領域である。第１重畳領域１ａは、厚み方向において水素極集電層１３の埋設部７０と重ならない。第１非重畳領域１ｂは、厚み方向において支持基板１２の梁部材５１と重なる。 The first non-overlapping region 1b is connected to one end of the first overlapping region 1a in the surface direction. The surface direction is the direction perpendicular to the thickness direction. The first non-overlapping region 1b is a region of the first surface T1 that does not overlap with the through hole 40 of the support substrate 12 in the thickness direction. The first overlapping region 1a does not overlap with the embedded portion 70 of the hydrogen electrode current collecting layer 13 in the thickness direction. The first non-overlapping region 1b overlaps with the beam member 51 of the support substrate 12 in the thickness direction.

　第１非重畳領域１ｂは、集電部材２５の非重畳部２５ｂに接触する。本実施形態では、図２に示すように、第１非重畳領域１ｂは、集電部材２５の反対側に突出するように湾曲している。 The first non-overlapping region 1b contacts the non-overlapping portion 25b of the current collecting member 25. In this embodiment, as shown in FIG. 2, the first non-overlapping region 1b is curved so as to protrude to the opposite side of the current collecting member 25.

　第１重畳領域１ａ及び第１非重畳領域１ｂは、少なくとも１つの梁部材５１に対応して設けられていればよいが、隣接する２以上の梁部材５１それぞれに対応して設けられていてもよい。この場合、第１重畳領域１ａ及び第１非重畳領域１ｂは、面方向において交互に繰り返し配置される。その結果、第１表面Ｔ１には連続した凹凸が周期的に形成される。 The first overlapping region 1a and the first non-overlapping region 1b may be provided corresponding to at least one beam member 51, but may also be provided corresponding to two or more adjacent beam members 51. In this case, the first overlapping region 1a and the first non-overlapping region 1b are repeatedly arranged alternately in the surface direction. As a result, continuous irregularities are periodically formed on the first surface T1.

　（酸素極層１７の第２表面Ｔ２の詳細構成）
　酸素極層１７の第２表面Ｔ２の詳細構成について、図２を参照しながら説明する。 (Detailed configuration of the second surface T2 of the oxygen electrode layer 17)
The detailed configuration of the second surface T2 of the oxygen electrode layer 17 will be described with reference to FIG.

　第２表面Ｔ２は、酸素極層１７の集電部材２５と反対側に設けられる。第２表面Ｔ２は、第１表面Ｔ１の反対側に設けられる。第２表面Ｔ２は、酸素極側空間Ｓ２に面している。第２表面Ｔ２は、電解セル１０の表面の一部である。 The second surface T2 is provided on the side of the oxygen electrode layer 17 opposite the current collecting member 25. The second surface T2 is provided on the side opposite the first surface T1. The second surface T2 faces the oxygen electrode side space S2. The second surface T2 is part of the surface of the electrolysis cell 10.

　図２に示すように、第２表面Ｔ２は、第２重畳領域２ａ及び第２非重畳領域２ｂを含む。第２表面Ｔ２には、第２重畳領域２ａ及び第２非重畳領域２ｂによる凹凸が形成されている。これによって、第２表面Ｔ２が平坦である場合に比べて、酸素極層１７の実効的な電極面積を増加させることができるため、電解セル１０の性能をより向上させることができる。 As shown in FIG. 2, the second surface T2 includes a second overlapping region 2a and a second non-overlapping region 2b. The second surface T2 has irregularities formed by the second overlapping region 2a and the second non-overlapping region 2b. This allows the effective electrode area of the oxygen electrode layer 17 to be increased compared to when the second surface T2 is flat, thereby further improving the performance of the electrolysis cell 10.

　第２重畳領域２ａは、第２表面Ｔ２のうち厚み方向において支持基板１２の貫通孔４０と重なる領域である。第２重畳領域２ａは、厚み方向において水素極集電層１３の埋設部７０と重なる。第２重畳領域２ａは、厚み方向において支持基板１２の梁部材５１と重ならない。 The second overlap region 2a is a region of the second surface T2 that overlaps with the through hole 40 of the support substrate 12 in the thickness direction. The second overlap region 2a overlaps with the embedded portion 70 of the hydrogen electrode current collecting layer 13 in the thickness direction. The second overlap region 2a does not overlap with the beam member 51 of the support substrate 12 in the thickness direction.

　第２非重畳領域２ｂは、面方向において第２重畳領域２ａの一端に繋がる。第２非重畳領域２ｂは、第２表面Ｔ２のうち厚み方向において支持基板１２の貫通孔４０と重ならない領域である。第２重畳領域２ａは、厚み方向において水素極集電層１３の埋設部７０と重ならない。第２非重畳領域２ｂは、厚み方向において支持基板１２の梁部材５１と重なる。 The second non-overlapping region 2b is connected to one end of the second overlapping region 2a in the surface direction. The second non-overlapping region 2b is a region of the second surface T2 that does not overlap with the through hole 40 of the support substrate 12 in the thickness direction. The second overlapping region 2a does not overlap with the embedded portion 70 of the hydrogen electrode current collecting layer 13 in the thickness direction. The second non-overlapping region 2b overlaps with the beam member 51 of the support substrate 12 in the thickness direction.

　第２表面Ｔ２の平面度は、第１表面Ｔ１の平面度より小さいことが好ましい。これによって、図２に示すように表面に凹凸が形成された層（本実施形態では、反応防止層１６）上に形成される酸素極層１７にクラックが生じることを抑制できる。 The flatness of the second surface T2 is preferably smaller than the flatness of the first surface T1. This makes it possible to prevent cracks from occurring in the oxygen electrode layer 17 formed on the layer with an uneven surface (in this embodiment, the reaction prevention layer 16) as shown in FIG. 2.

　なお、平面度は、ＪＩＳＢ０６２１に準拠した方法で測定されるものとする。 Flatness shall be measured using a method conforming to JIS B0621.

　（水素極活性層１４及び電解質層１５の構成）
　図２に示すように、水素極活性層１４及び電解質層１５それぞれには連続的な起伏が形成されている。これによって、水素極活性層１４のうち水素極集電層１３側の第１表面Ｕ１が平坦である場合に比べて、水素極活性層１４の実効的な電極面積を増加させることができるため、電解セル１０の性能をより向上させることができる。同様に、水素極活性層１４のうち電解質層１５側の第２表面Ｕ２が平坦である場合に比べて、水素極活性層１４の実効的な電極面積を増加させることができるため、電解セル１０の性能を更に向上させることができる。 (Configuration of hydrogen electrode active layer 14 and electrolyte layer 15)
2, continuous undulations are formed on both the hydrogen electrode active layer 14 and the electrolyte layer 15. This increases the effective electrode area of the hydrogen electrode active layer 14 compared to when the first surface U1 of the hydrogen electrode active layer 14 that faces the hydrogen electrode current collecting layer 13 is flat, thereby further improving the performance of the electrolysis cell 10. Similarly, the effective electrode area of the hydrogen electrode active layer 14 can be increased compared to when the second surface U2 of the hydrogen electrode active layer 14 that faces the electrolyte layer 15 is flat, thereby further improving the performance of the electrolysis cell 10.

　（実施形態の変形例）
　以上、本発明の実施形態について説明したが、本発明はこれらに限定されるものではなく、本発明の趣旨を逸脱しない限りにおいて種々の変更が可能である。 (Modification of the embodiment)
Although the embodiments of the present invention have been described above, the present invention is not limited to these, and various modifications are possible without departing from the spirit of the present invention.

　［変形例１］
　上記実施形態において、水素極集電層１３は、複数の埋設部７０を有することとしたが、埋設部７０の数は１以上であればよい。 [Modification 1]
In the above embodiment, the hydrogen electrode current collecting layer 13 has a plurality of embedded portions 70, but the number of embedded portions 70 may be one or more.

　［変形例２］
　上記実施形態において、支持基板１２は、枠部６０を有することとしたが、枠部６０を有していなくてもよい。 [Modification 2]
In the above embodiment, the support substrate 12 has the frame portion 60 , but it does not have to have the frame portion 60 .

　［変形例３］
　上記実施形態において、水素極集電層１３は、複数の埋設部７０、第１層状部８０及び第２層状部９０を有することとしたが、第１層状部８０及び第２層状部９０のうち少なくとも一方を有していなくてもよい。 [Modification 3]
In the above embodiment, the hydrogen electrode current collecting layer 13 has a plurality of embedded portions 70, a first layer portion 80, and a second layer portion 90. However, it is not necessary for the hydrogen electrode current collecting layer 13 to have at least one of the first layer portion 80 and the second layer portion 90.

　［変形例４］
　上記実施形態において、水素極活性層１４はカソードとして機能し、酸素極層１７はアノードとして機能することとしたが、水素極活性層１４がアノードとして機能し、酸素極層１７がカソードとして機能してもよい。この場合、水素極活性層１４と酸素極層１７の構成材料を入れ替えるとともに、水素極活性層１４の外表面に原料ガスを流すことになる。なお、水素極集電層１３は、酸素極集電層として機能することになるが、酸素極集電層の構成及び機能は上記実施形態において説明した水素極集電層１３の構成及び機能と同じである。 [Modification 4]
In the above embodiment, the hydrogen electrode active layer 14 functions as a cathode and the oxygen electrode layer 17 functions as an anode, but the hydrogen electrode active layer 14 may function as an anode and the oxygen electrode layer 17 may function as a cathode. In this case, the constituent materials of the hydrogen electrode active layer 14 and the oxygen electrode layer 17 are switched, and a source gas is caused to flow on the outer surface of the hydrogen electrode active layer 14. The hydrogen electrode current collecting layer 13 functions as an oxygen electrode current collecting layer, but the configuration and function of the oxygen electrode current collecting layer are the same as those of the hydrogen electrode current collecting layer 13 described in the above embodiment.

　［変形例５］
　上記実施形態では、電気化学セルの一例として電解セル１０について説明したが、電気化学セルは電解セルに限られない。電気化学セルとは、電気エネルギーを化学エネルギーに変えるため、全体的な酸化還元反応から起電力が生じるように一対の電極が配置された素子と、化学エネルギーを電気エネルギーに変えるための素子との総称である。従って、電気化学セルには、例えば、酸化物イオン或いはプロトンをキャリアとする燃料電池セルが含まれる。 [Modification 5]
In the above embodiment, the electrolysis cell 10 has been described as an example of an electrochemical cell, but the electrochemical cell is not limited to an electrolysis cell. An electrochemical cell is a general term for an element in which a pair of electrodes are arranged so that an electromotive force is generated from an overall oxidation-reduction reaction in order to convert electrical energy into chemical energy, and an element for converting chemical energy into electrical energy. Therefore, the electrochemical cell includes, for example, a fuel cell that uses oxide ions or protons as a carrier.

　また、上記実施形態では、電気化学セル装置の一例として電解セル装置１について説明したが、電気化学セル装置は電解セル装置に限られない。電気化学セル装置とは、集電部材２５と電気化学セルとを備える装置の総称である。 In the above embodiment, the electrolytic cell device 1 has been described as an example of an electrochemical cell device, but the electrochemical cell device is not limited to the electrolytic cell device. An electrochemical cell device is a general term for a device that includes a current collecting member 25 and an electrochemical cell.

１…電解セル装置、１０…電解セル、１２…支持基板、１３…水素極集電層、１４…水素極活性層、１５…電解質層、１６…反応防止層、１７…酸素極層、２０…セパレータ、２５…集電部材、２５ａ…重畳部、２５ｂ…非重畳部、３０…封止部、４０…貫通孔、５０…梁部、５１…梁部材、Ｔ１…第１表面、１ａ…第１重畳領域、１ｂ…第１非重畳領域、２ａ…第２重畳領域、２ｂ…第２非重畳領域、６０…枠部、７０…埋設部、８０…第１層状部、９０…第２層状部 1...electrolysis cell device, 10...electrolysis cell, 12...support substrate, 13...hydrogen electrode current collecting layer, 14...hydrogen electrode active layer, 15...electrolyte layer, 16...reaction prevention layer, 17...oxygen electrode layer, 20...separator, 25...current collecting member, 25a...overlapping portion, 25b...non-overlapping portion, 30...sealing portion, 40...through hole, 50...beam portion, 51...beam member, T1...first surface, 1a...first overlapping region, 1b...first non-overlapping region, 2a...second overlapping region, 2b...second non-overlapping region, 60...frame portion, 70...embedded portion, 80...first layered portion, 90...second layered portion

Claims (4)

　集電部材と、
　前記集電部材と電気的に接続される電気化学セルと、
を備え、
　前記電気化学セルは、
　集電層と、
　前記集電層の内部に埋設され、貫通孔を有する支持基板と、
　前記集電層上に配置される第１電極層と、
　第２電極層と、
　前記第１電極層と前記第２電極層の間に配置される電解質層と、
を有し、
　前記集電部材は、厚み方向において前記貫通孔と重なる重畳部と、前記厚み方向において前記貫通孔と重ならない非重畳部とを含み、
　前記重畳部の密度は、前記非重畳部の密度より高い、
電気化学セル装置。 A current collecting member;
an electrochemical cell electrically connected to the current collecting member;
Equipped with
The electrochemical cell comprises:
A current collecting layer;
A support substrate embedded in the current collecting layer and having a through hole;
a first electrode layer disposed on the current collecting layer;
A second electrode layer;
an electrolyte layer disposed between the first electrode layer and the second electrode layer;
having
the current collecting member includes an overlapping portion that overlaps with the through hole in a thickness direction and a non-overlapping portion that does not overlap with the through hole in the thickness direction,
The density of the overlapping portion is higher than the density of the non-overlapping portion.
Electrochemical cell setup. 　前記集電層は、前記集電部材側の第１表面を有し、
　前記第１表面は、厚み方向において前記貫通孔と重なる第１重畳領域と、前記厚み方向において前記貫通孔と重ならない第１非重畳領域とを含み、
　前記第１重畳領域は、前記集電部材側に突出し、
　前記第１非重畳領域は、前記集電部材の反対側に突出している、
請求項１に記載の電気化学セル装置。 the current collecting layer has a first surface on the current collecting member side,
the first surface includes a first overlapping region that overlaps with the through hole in a thickness direction and a first non-overlapping region that does not overlap with the through hole in the thickness direction,
The first overlapping region protrudes toward the current collecting member,
The first non-overlapping region protrudes to the opposite side of the current collecting member.
2. The electrochemical cell device of claim 1. 　前記第２電極層は、前記集電部材と反対側の第２表面を有し、
　前記第２表面は、前記厚み方向において前記貫通孔と重なる第２重畳領域と、前記厚み方向において前記貫通孔と重ならない第２非重畳領域とを含み、
　前記第２重畳領域は、前記集電部材側に突出し、
　前記第２非重畳領域は、前記集電部材の反対側に突出している、
請求項１又は２に記載の電気化学セル装置。 the second electrode layer has a second surface opposite the current collecting member;
the second surface includes a second overlapping region that overlaps with the through hole in the thickness direction and a second non-overlapping region that does not overlap with the through hole in the thickness direction,
The second overlapping region protrudes toward the current collecting member,
The second non-overlapping region protrudes to the opposite side of the current collecting member.
3. An electrochemical cell device according to claim 1 or 2. 　前記第２表面の平面度は、前記第１表面の平面度より小さい、
請求項３に記載の電気化学セル装置。 The flatness of the second surface is less than the flatness of the first surface.
4. The electrochemical cell device of claim 3.
PCT/JP2023/040980 2023-11-14 2023-11-14 Electrochemical cell Pending WO2025104823A1 (en)

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Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02257571A (en) * 1989-03-30 1990-10-18 Nkk Corp Solid electrolyte type fuel cell and manufacture thereof
US20040072057A1 (en) * 2002-10-10 2004-04-15 Christopher Beatty Fuel cell assembly and method of making the same
JP2005347095A (en) * 2004-06-03 2005-12-15 Nissan Motor Co Ltd Solid oxide fuel cell substrate and solid oxide fuel cell
JP2006032239A (en) * 2004-07-21 2006-02-02 Nissan Motor Co Ltd Gas permeable substrate and solid oxide fuel cell using the same
JP2007035321A (en) * 2005-07-22 2007-02-08 Nissan Motor Co Ltd Solid oxide fuel cell
JP2008135360A (en) * 2006-10-24 2008-06-12 Ngk Insulators Ltd Thin plate for single cell of solid oxide fuel cell
JP2010073631A (en) * 2008-09-22 2010-04-02 Nissan Motor Co Ltd Fuel cell power generation unit and fuel cell stack
JP2013201061A (en) * 2012-03-26 2013-10-03 Miura Co Ltd Anode-supported solid oxide fuel cell unit cell and method for manufacturing the same
US20140234751A1 (en) * 2013-02-21 2014-08-21 Samsung Electro-Mechanics Co., Ltd. Solid oxide fuel cell and manufacturing method thereof

Patent Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02257571A (en) * 1989-03-30 1990-10-18 Nkk Corp Solid electrolyte type fuel cell and manufacture thereof
US20040072057A1 (en) * 2002-10-10 2004-04-15 Christopher Beatty Fuel cell assembly and method of making the same
JP2005347095A (en) * 2004-06-03 2005-12-15 Nissan Motor Co Ltd Solid oxide fuel cell substrate and solid oxide fuel cell
JP2006032239A (en) * 2004-07-21 2006-02-02 Nissan Motor Co Ltd Gas permeable substrate and solid oxide fuel cell using the same
JP2007035321A (en) * 2005-07-22 2007-02-08 Nissan Motor Co Ltd Solid oxide fuel cell
JP2008135360A (en) * 2006-10-24 2008-06-12 Ngk Insulators Ltd Thin plate for single cell of solid oxide fuel cell
JP2010073631A (en) * 2008-09-22 2010-04-02 Nissan Motor Co Ltd Fuel cell power generation unit and fuel cell stack
JP2013201061A (en) * 2012-03-26 2013-10-03 Miura Co Ltd Anode-supported solid oxide fuel cell unit cell and method for manufacturing the same
US20140234751A1 (en) * 2013-02-21 2014-08-21 Samsung Electro-Mechanics Co., Ltd. Solid oxide fuel cell and manufacturing method thereof

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