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WO2025198044A1 - Adhesive sheet, method for manufacturing same, and method for peeling object from adhesive sheet - Google Patents

Adhesive sheet, method for manufacturing same, and method for peeling object from adhesive sheet

Info

Publication number
WO2025198044A1
WO2025198044A1 PCT/JP2025/011193 JP2025011193W WO2025198044A1 WO 2025198044 A1 WO2025198044 A1 WO 2025198044A1 JP 2025011193 W JP2025011193 W JP 2025011193W WO 2025198044 A1 WO2025198044 A1 WO 2025198044A1
Authority
WO
WIPO (PCT)
Prior art keywords
adhesive layer
adhesive sheet
energy ray
meth
acrylic acid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
PCT/JP2025/011193
Other languages
French (fr)
Japanese (ja)
Inventor
友郁 加藤
健太 西嶋
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Lintec Corp
Original Assignee
Lintec Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Lintec Corp filed Critical Lintec Corp
Publication of WO2025198044A1 publication Critical patent/WO2025198044A1/en
Pending legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J133/00Adhesives based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Adhesives based on derivatives of such polymers
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J133/00Adhesives based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Adhesives based on derivatives of such polymers
    • C09J133/04Homopolymers or copolymers of esters
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J201/00Adhesives based on unspecified macromolecular compounds
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J201/00Adhesives based on unspecified macromolecular compounds
    • C09J201/02Adhesives based on unspecified macromolecular compounds characterised by the presence of specified groups, e.g. terminal or pendant functional groups
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J5/00Adhesive processes in general; Adhesive processes not provided for elsewhere, e.g. relating to primers
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J7/00Adhesives in the form of films or foils
    • C09J7/20Adhesives in the form of films or foils characterised by their carriers
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J7/00Adhesives in the form of films or foils
    • C09J7/30Adhesives in the form of films or foils characterised by the adhesive composition
    • C09J7/38Pressure-sensitive adhesives [PSA]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping

Definitions

  • the present invention relates to an adhesive sheet, a method for manufacturing the same, and a method for peeling an object from the adhesive sheet, and particularly to the manufacture of semiconductor chips.
  • Adhesive sheets can be used to temporarily hold an object in place.
  • adhesive sheets can be used to transfer an object to a desired location.
  • Patent Document 1 discloses a configuration in which an electronic component is attached to a smooth first adhesive film and then irradiated with ultraviolet light, thereby reducing the adhesive strength of the film. In the method described in Patent Document 1, the electronic component is further pressed onto a second adhesive film, and then the first adhesive film is peeled off, thereby transferring the electronic component from the first adhesive film to the second adhesive film.
  • Patent Document 2 discloses an adhesive sheet that is expandable in the plane direction and has an adhesive layer with an uneven surface, configured to facilitate easier peeling of objects.
  • Adhesive sheets such as those disclosed in Patent Documents 1 and 2 are desired to have both the ability to hold an object in place and the ease with which the object can be removed from the adhesive sheet. In particular, when handling fragile objects such as thin semiconductor chips, it is necessary to reduce the force required to pick up the object.
  • the adhesive sheets disclosed in Patent Documents 1 and 2 leave room for improvement in terms of ease of removal.
  • One embodiment of the present invention makes it possible to pick up objects held on an adhesive sheet with an adhesive layer having an uneven surface with a gentler operation.
  • embodiments of the present invention relate to the following [1] to [14].
  • An adhesive sheet comprising a substrate and an adhesive layer having an uneven surface, wherein the adhesive layer contains an acrylic acid ester copolymer, and the copolymerization rate of an energy ray-curable group-containing monomer in the acrylic acid ester copolymer is 20% or more and 50% or less.
  • a method for producing a pressure-sensitive adhesive sheet comprising a substrate and a pressure-sensitive adhesive layer having an uneven surface, the method comprising: a preparation step of preparing a pressure-sensitive adhesive composition, the pressure-sensitive adhesive composition comprising a step of introducing an energy ray-curable group into an acrylic acid ester copolymer having a monomer capable of introducing an energy ray-curable group by reacting the monomer with an energy ray-curable group-introducing agent, and a formation step of forming the pressure-sensitive adhesive layer on the substrate using the pressure-sensitive adhesive composition, wherein the copolymerization rate of the monomer capable of introducing an energy ray-curable group in the acrylic acid ester copolymer is RA %, and in the preparation step, the energy ray-curable group-introducing agent is reacted in an amount equivalent to RB % with the monomer capable of introducing an energy ray-curable group, and the product of RA % and RB % is 23.0% or more and 50.
  • One embodiment of the present invention makes it possible to pick up objects held on an adhesive sheet with an adhesive layer having an uneven surface with a gentler operation.
  • FIG. 1 is a cross-sectional view of a pressure-sensitive adhesive sheet according to an embodiment.
  • FIG. 4 is a cross-sectional view showing an example of the unevenness of the adhesive layer before expansion.
  • FIG. 10 is a cross-sectional view showing an example of the unevenness of the adhesive layer after expansion.
  • FIG. 10 is a top view showing an example of the unevenness of the adhesive layer before expansion.
  • FIG. 10 is a top view showing an example of the unevenness of the adhesive layer after expansion.
  • FIG. 10 is a top view showing another example of the unevenness of the adhesive layer.
  • FIG. 3 is a cross-sectional view showing an example of the unevenness of the adhesive layer.
  • FIG. 3 is a cross-sectional view showing an example of the unevenness of the adhesive layer.
  • FIG. 3 is a cross-sectional view showing an example of the unevenness of the adhesive layer.
  • 10A to 10C are diagrams illustrating a method for expanding an adhesive sheet.
  • 10A to 10C are diagrams illustrating a method for expanding an adhesive sheet.
  • 3 is a flowchart of a method for manufacturing a pressure-sensitive adhesive sheet according to an embodiment.
  • 1 is a flowchart of a peeling method according to an embodiment.
  • the mass average molecular weight (Mw) and number average molecular weight (Mn) are values calculated as standard polystyrene as measured by size exclusion chromatography, specifically, values measured in accordance with JIS K7252-1: 2016.
  • (meth)acrylic acid is a term that refers to both "acrylic acid” and “methacrylic acid,” and the same applies to other similar terms.
  • An adhesive sheet according to one embodiment of the present invention comprises a substrate 120 and an adhesive layer 110 having an uneven surface.
  • the adhesive sheet can be used as a transfer sheet for temporarily holding an object and transferring it to a destination.
  • the adhesive sheet can be used to receive an object held on another holding substrate, temporarily hold the object, and transfer the object to a desired position on the destination.
  • the substrate 120 can support the adhesive layer 110. The configuration of such an adhesive sheet will be described below with reference to FIG. 1, which is a schematic diagram of an adhesive sheet according to one embodiment.
  • the substrate 120 functions as a support for supporting the adhesive layer 110.
  • the substrate 120 is located on the surface of the adhesive layer 110 opposite to the surface having the irregularities.
  • the adhesive sheet is expandable in the planar direction.
  • a flexible substrate can be used as the substrate 120.
  • using a flexible substrate as the substrate 120 can improve cushioning when holding an object, facilitate stacking of the adhesive sheet, or allow the adhesive sheet to be in a roll form.
  • a resin film can be used as the substrate 120.
  • a resin film is a film that uses a resin-based material as its main material, and may be made of a resin material, or may contain additives in addition to the resin material.
  • the resin film may be laser light transparent.
  • resin films include polyethylene films such as low-density polyethylene (LDPE) film, linear low-density polyethylene (LLDPE) film, and high-density polyethylene (HDPE) film; polyolefin films such as polypropylene film, polybutene film, polybutadiene film, poly(4-methyl-1-pentene) film, ethylene-norbornene copolymer film, and norbornene resin film; ethylene copolymer films such as ethylene-vinyl acetate copolymer film, ethylene-(meth)acrylic acid copolymer film, and ethylene-(meth)acrylic acid ester copolymer film; polyvinyl chloride films such as polyvinyl chloride film and vinyl chloride copolymer film; polyester films such as polyethylene terephthalate film and polybutylene terephthalate film; polyurethane film; polyimide film; polystyrene film; polycarbonate film; and fluororesin films.
  • Films containing a mixture of two or more materials, crosslinked films in which the resins forming these films are crosslinked, and modified films such as ionomer films may also be used.
  • the substrate 120 may be a laminate film in which two or more resin films are laminated.
  • the substrate 120 is preferably a polyolefin film or a vinyl chloride copolymer film.
  • polyolefin films include polyethylene film, polypropylene film, and copolymers containing unsubstituted olefins such as ethylene or propylene as structural units, such as ethylene copolymers containing ethylene-methacrylic acid copolymer (EMAA).
  • vinyl chloride copolymer films include vinyl chloride-vinylidene chloride copolymer film, vinyl chloride-vinyl acetate copolymer film, and vinyl chloride-ethylene copolymer film.
  • the form of such copolymers is not particularly limited and may be any of block copolymers, random copolymers, alternating copolymers, and graft copolymers. These films may also contain other resin components or additives.
  • the thickness of the substrate 120 is not particularly limited, but from the viewpoint of achieving both supportability and roll winding properties, it is preferably 10 ⁇ m or more, more preferably 25 ⁇ m or more, and even more preferably 40 ⁇ m or more, while it is preferably 500 ⁇ m or less, more preferably 200 ⁇ m or less, even more preferably 150 ⁇ m or less, even more preferably 150 ⁇ m or less, even more preferably 120 ⁇ m or less, and particularly preferably 90 ⁇ m or less.
  • the tensile modulus of the substrate 120 is preferably 50 MPa or more, more preferably 80 MPa or more, even more preferably 120 MPa or more, and preferably 2500 MPa or less, more preferably 1000 MPa or less, even more preferably 500 MPa or less.
  • the tensile modulus is measured in accordance with JIS K7161-1:2014.
  • the breaking elongation of the substrate 120 is preferably 105% or more, more preferably 110% or more, and even more preferably 115% or more.
  • breaking elongation is measured in accordance with JIS K 7127:1999.
  • the adhesive layer 110 is a layer having adhesive properties. As described above, the adhesive layer 110 has an uneven surface.
  • the adhesive sheet may have two or more adhesive layers 110.
  • the adhesive sheet may have a laminate of one type or two or more types of adhesive layers 110.
  • compositions of the adhesive layer 110 are not limited to those shown below.
  • the adhesive layer 110 may contain a resin.
  • the adhesive layer 110 may contain one type of resin, or two or more types of resins.
  • resins contained in the adhesive layer 110 include rubber-based resins such as polyisobutylene-based resins, polybutadiene-based resins, and styrene-butadiene-based resins, acrylic-based resins, urethane-based resins, polyester-based resins, olefin-based resins, silicone-based resins, and polyvinyl ether-based resins.
  • the adhesive layer may be heat-resistant, and examples of materials for the adhesive layer 110 that have such heat resistance include polyimide-based resins and silicone-based resins.
  • the adhesive layer 110 may contain a copolymer having two or more types of structural units.
  • the form of such a copolymer is not particularly limited, and may be any of a block copolymer, a random copolymer, an alternating copolymer, and a graft copolymer.
  • the resin contained in the adhesive layer 110 is preferably an adhesive resin that exhibits adhesive properties by itself.
  • the resin is a polymer having a mass average molecular weight (Mw) of 10,000 or more.
  • Mw mass average molecular weight
  • the mass average molecular weight (Mw) of the resin is preferably 10,000 or more, more preferably 70,000 or more, and even more preferably 140,000 or more.
  • Mn number average molecular weight of the resin is preferably 10,000 or more, more preferably 50,000 or more, and even more preferably 100,000 or more.
  • the mass average molecular weight (Mw) and number average molecular weight (Mn) of the adhesive layer 110 containing an energy ray-reactive resin refer to the mass average molecular weight (Mw) and number average molecular weight (Mn) before the crosslinking reaction due to energy ray irradiation, unless otherwise specified.
  • the glass transition temperature (Tg) of the resin is preferably -75°C or higher, more preferably -70°C or higher, and preferably 5°C or lower, more preferably -20°C or lower. If the resin has two or more types of structural units, the glass transition temperature (Tg) of the resin can be calculated using the Fox formula.
  • the Tg of the monomer from which the structural units are derived can be calculated using the value listed in the Polymer Data Handbook or the Adhesive Handbook.
  • the amount of resin contained in adhesive layer 110 relative to the total amount of components constituting adhesive layer 110 can be set appropriately depending on the desired adhesive strength of adhesive layer 110, but is preferably 30% by mass or more, more preferably 50% by mass or more, even more preferably 70% by mass or more, even more preferably 80% by mass or more, even more preferably 90% by mass or more, and is preferably 99.99% by mass or less, more preferably 99.95% by mass or less, even more preferably 99.90% by mass or less, even more preferably 99.80% by mass or less, even more preferably 99.50% by mass or less.
  • the resin contained in the adhesive layer 110 may include a thermoplastic resin.
  • a thermoplastic resin When a thermoplastic resin is used, it becomes easy to form irregularities in the adhesive layer 110 by heating and softening the resin, and it also becomes easy to maintain the irregular shape formed by cooling.
  • thermoplastic resins include rubber-based resins, acrylic-based resins, urethane-based resins, and olefin-based resins.
  • Examples include polybutadiene-based thermoplastic elastomers that use butadiene as a monomer, styrene-based thermoplastic elastomers that use styrene as a monomer, and acrylic-based thermoplastic elastomers that use (meth)acrylic acid or a (meth)acrylic acid ester as a monomer.
  • the adhesive layer 110 is energy ray reactive.
  • the adhesive layer 110 may contain an energy ray reactive component in addition to a resin.
  • the adhesive layer 110 may contain an energy ray reactive resin.
  • the adhesive layer 110 being energy ray reactive means that the storage modulus of the adhesive layer 110 is improved by irradiating it with energy rays.
  • the type of energy ray is not particularly limited, and examples include ultraviolet rays, electron beams, and ionizing radiation. Ultraviolet rays are preferred as the energy ray, and therefore the adhesive layer 110 is preferably ultraviolet ray reactive.
  • the energy ray-reactive component can be a compound into which a polymerizable functional group has been introduced.
  • a polymerizable functional group is a functional group that crosslinks upon irradiation with energy rays.
  • Examples of such polymerizable functional groups include multiple bond-containing groups, oxetanyl groups, and epoxy groups.
  • multiple bond-containing groups include alkenyl groups such as vinyl groups and allyl groups, and double bond-containing groups such as (meth)acryloyl groups.
  • Crosslinking of such polymerizable functional groups proceeds in the presence of an appropriate polymerization initiator or crosslinking agent.
  • the energy ray-reactive component may be a difunctional or polyfunctional monomer into which a polymerizable functional group such as those described above has been introduced.
  • monomers include polyfunctional (meth)acrylates such as difunctional (meth)acrylates.
  • polyfunctional (meth)acrylates include cycloalkyl di(meth)acrylates such as tricyclodecane dimethanol diacrylate.
  • An energy ray reactive resin refers to a resin whose storage modulus improves when irradiated with energy rays.
  • An energy ray reactive resin may be an energy ray curable resin. Note that in this specification, resins whose storage modulus has already improved through irradiation with energy rays and whose storage modulus does not improve even when further irradiated with energy rays (for example, ultraviolet curable resins after curing has been completed) are not included in the term energy ray reactive resin.
  • the energy ray reactive resin is, for example, a polymer having an energy ray curable group.
  • This polymer may be a copolymer. Furthermore, this polymer may have a side chain having an energy ray curable group.
  • the energy ray curable group include the above-mentioned multiple bond-containing groups, oxetanyl groups, and epoxy groups.
  • Preferred examples of the energy ray curable group include alkenyl groups such as vinyl groups and allyl groups, and carbon-carbon double bond-containing groups such as (meth)acryloyl groups.
  • the energy ray curable groups of the polymer can be crosslinked to each other.
  • the energy ray curable group is an ultraviolet ray curable group.
  • the storage modulus of the adhesive layer 110 is more likely to improve when irradiated with energy rays, compared to when the adhesive layer 110 contains a combination of a resin and an energy ray reactive component. It also becomes easier to achieve both the adhesive layer 110's ability to hold an object before energy ray irradiation and the adhesive layer 110's ability to easily peel an object after energy ray irradiation. Furthermore, by having the adhesive layer 110 contain an energy ray reactive resin, it becomes easier to maintain high adhesive strength before energy ray irradiation while improving the ability of the adhesive layer 110 to retain the uneven shape.
  • the main component of the adhesive layer 110 is an energy ray reactive resin.
  • the content of the polymer having an energy ray curable group relative to the total amount of components constituting the adhesive layer 110 is preferably 70% by mass or more, more preferably 80% by mass or more, and even more preferably 90% by mass or more, and is 100% by mass or less, more preferably 99% by mass or more, and even more preferably 98% by mass or less.
  • the adhesive layer 110 includes an acrylic acid ester copolymer.
  • the acrylic acid ester copolymer is a copolymer having a (meth)acrylic acid ester as a structural unit. This acrylic acid ester copolymer may have energy ray reactivity.
  • (Meth)acrylic acid esters include, for example, methyl (meth)acrylate, ethyl (meth)acrylate, n-propyl (meth)acrylate, isopropyl (meth)acrylate, n-butyl (meth)acrylate, isobutyl (meth)acrylate, sec-butyl (meth)acrylate, tert-butyl (meth)acrylate, pentyl (meth)acrylate, hexyl (meth)acrylate, heptyl (meth)acrylate, 2-ethylhexyl (meth)acrylate, isooctyl (meth)acrylate, n- (Meth)acrylic acid acrylates in which the alkyl group constituting the alkyl ester has a chain structure having 1 to 18 carbon atoms, such as octyl (meth)acrylate, n-nonyl (meth)acrylate, isononyl (me
  • (meth)acrylic acid cycloalkenyl esters such as dicyclopentenyl (meth)acrylate; (meth)acrylic acid cycloalkenyloxyalkyl esters such as dicyclopentenyloxyethyl (meth)acrylate; imide (meth)acrylate; glycidyl group-containing (meth)acrylic acid esters such as glycidyl (meth)acrylate; hydroxy group-containing (meth)acrylic acid esters such as hydroxymethyl (meth)acrylate, 2-hydroxyethyl (meth)acrylate, 2-hydroxypropyl (meth)acrylate, 3-hydroxypropyl (meth)acrylate, 2-hydroxybutyl (meth)acrylate, 3-hydroxybutyl (meth)acrylate, 4-hydroxybutyl (meth)acrylate; and substituted amino group-containing (meth)acrylic acid esters such as N-methylaminoethyl (meth)acrylate.
  • substituted amino group refers to a group having a structure in which one or two hydrogen atoms of an amino group have been substituted with a group other than a hydrogen atom.
  • the acrylic acid ester copolymer may be a copolymer of an acrylic acid ester and a methacrylic acid ester.
  • An acrylic acid ester copolymer having energy ray reactivity can have an energy ray-curable group-containing monomer as a constituent unit.
  • the acrylic acid ester copolymer may have a side chain having an energy ray-curable group as described above.
  • An example of an energy ray-curable group-containing monomer is a (meth)acrylic acid ester monomer having an energy ray-curable group.
  • An example of a (meth)acrylic acid ester monomer having an energy ray-curable group is a (meth)acrylic acid ester monomer having an energy ray-curable group, such as a carbon-carbon double bond-containing group, in the side chain via a hydroxy group.
  • the acrylic acid ester copolymer may be a copolymer of an acrylic acid ester having an energy ray-curable group, an acrylic acid ester not having an energy ray-curable group, and a methacrylic acid ester not having an energy ray-curable group.
  • the acrylic acid ester copolymer may be a cross-linked polymer.
  • the adhesive layer 110 has an uneven surface. For this reason, it is desirable that the adhesive layer 110 has a storage modulus that is sufficient to maintain the uneven surface even before energy beam irradiation.
  • a cross-linked polymer as the acrylic acid ester copolymer, it becomes easier to maintain the uneven surface of the adhesive layer 110.
  • an acrylic acid ester copolymer may have, as a structural unit, a monomer crosslinked with another monomer.
  • a (meth)acrylic acid ester monomer may be crosslinked with another (meth)acrylic acid ester monomer via a hydroxy group.
  • two (meth)acrylic acid ester monomers contained in an acrylic acid ester copolymer may be urethane-crosslinked with each other.
  • an acrylic acid ester copolymer may contain, in addition to an energy ray-curable group-containing (meth)acrylic acid ester monomer, a (meth)acrylic acid ester monomer crosslinked with another (meth)acrylic acid ester monomer.
  • a preferred example of an acrylic acid ester copolymer is a copolymer of an acrylic acid ester having an energy ray-curable group, an acrylic acid ester crosslinked with another acrylic acid ester monomer, and an alkyl (meth)acrylate ester.
  • the acrylic acid ester copolymer may contain (meth)acrylic acid ester monomers other than the energy ray-curable group-containing monomer and the monomer crosslinked with other monomers.
  • the acrylic acid ester copolymer may also contain monomers other than (meth)acrylic acid ester.
  • the acrylic acid ester copolymer may have, in addition to (meth)acrylic acid ester, one or more monomers selected from itaconic acid, vinyl acetate, acrylonitrile, styrene, N-methylolacrylamide, etc. as structural units.
  • the combination and ratio of monomers constituting the acrylic acid ester copolymer can be selected depending on the desired properties of the adhesive layer 110.
  • An acrylic ester copolymer having reactivity to energy rays can be prepared by a polymerization reaction using a monomer containing an energy ray-curable group.
  • an acrylic ester copolymer having reactivity to energy rays can be prepared by modifying the acrylic ester copolymer to introduce an energy ray-curable group.
  • the material to be modified can be an acrylic acid ester copolymer having a monomer into which an energy ray-curable group can be introduced.
  • the (meth)acrylic acid ester monomer into which an energy ray-curable group can be introduced can be, for example, a (meth)acrylic acid ester monomer having a specific functional group such as a hydroxy group.
  • the acrylic acid ester copolymer to be modified contains a hydroxy group-containing acrylic acid ester as a constituent unit.
  • the energy ray-curable group-introducing agent can be a compound having an energy ray-curable group and a functional group that forms a bond with a specific functional group.
  • the energy ray-curable group-introducing agent can be a compound having an isocyanate group and an energy ray-curable group, such as 2-isocyanatoethyl methacrylate.
  • the copolymerization rate of the monomer capable of introducing an energy ray-curable group in the acrylic ester copolymer is defined as RA %.
  • the copolymerization rate indicates the molar ratio of the monomer capable of introducing an energy ray-curable group to all monomers contained in the acrylic ester copolymer.
  • the equivalent of the energy ray-curable group-introducing agent relative to the monomer capable of introducing an energy ray-curable group is defined as RB %.
  • the equivalent indicates the molar ratio of the energy ray-curable group-introducing agent to be added relative to the substituent contained in the acrylic ester copolymer that reacts with the energy ray-curable group-introducing agent.
  • RB % indicates the molar ratio of the energy ray-curable group-introducing agent to be added relative to the monomer having a hydroxy group contained in the acrylic ester copolymer.
  • the upper limit of RB is 100%. That is, when an excess amount of the energy ray-curable group-introducing agent is used relative to the amount of the monomer capable of introducing an energy ray-curable group, R 2 B is defined as 100%.
  • the product of RA % and RB % indicates the copolymerization rate of the monomer into which the energy ray curable group has been introduced in the acrylic acid ester copolymer when the monomer capable of introducing an energy ray curable group and the energy ray curable group introducing agent have completely reacted.
  • the product of RA% and RB % is 23.0% or more, more preferably 24.0% or more, and even more preferably 25.0% or more.
  • the product of RA % and RB % is 50.0% or less, more preferably 40.0% or less, even more preferably 30.0% or less, and particularly preferably 27.0% or less.
  • RA % is preferably 10% or more, more preferably 15% or more, even more preferably 20% or more, and particularly preferably 25% or more.
  • RA % is preferably 50% or less, more preferably 40% or less, and even more preferably 30% or less.
  • R B % is preferably 50% or more, more preferably 65% or more, and even more preferably 75% or more. On the other hand, R B % is 100% or less.
  • cross-linked acrylic acid ester copolymers can be obtained by modifying the acrylic acid ester copolymer to cross-link its monomers.
  • the material to be modified can be an acrylic acid ester copolymer having a monomer capable of reacting with a cross-linking agent.
  • the monomer capable of reacting with the cross-linking agent can be, for example, a (meth)acrylic acid ester monomer having a specific functional group such as a hydroxy group.
  • crosslinking agent a compound having two or more functional groups that form bonds with specific functional groups can be used.
  • crosslinking agents include isocyanate-based crosslinking agents, epoxy-based crosslinking agents, aziridine-based crosslinking agents, and metal chelate-based crosslinking agents.
  • a thermal crosslinking agent that induces a crosslinking reaction by heat treatment may also be used as a crosslinking agent. These crosslinking agents may be used alone or in combination of two or more types.
  • isocyanate-based crosslinking agents are preferred from the viewpoints of increasing cohesive strength and maintaining the uneven shape, as well as ease of availability.
  • an isocyanate-based crosslinking agent it is possible to crosslink the hydroxy groups in the (meth)acrylic acid ester monomers.
  • isocyanate crosslinking agent examples include aromatic polyisocyanates such as tolylene diisocyanate, diphenylmethane diisocyanate, and xylylene diisocyanate; alicyclic polyisocyanates such as dicyclohexylmethane-4,4'-diisocyanate, bicycloheptane triisocyanate, cyclopentylene diisocyanate, cyclohexylene diisocyanate, methylcyclohexylene diisocyanate, methylenebis(cyclohexyl isocyanate), 3-isocyanatomethyl-3,5,5-trimethylcyclohexyl isocyanate, and hydrogenated xylylene diisocyanate; and polyvalent isocyanate compounds such as acyclic aliphatic polyisocyanates such as hexamethylene diisocyanate, trimethylhexamethylene diisocyanate, and lysine diisocyanate.
  • isocyanate-based crosslinking agents include trimethylolpropane adduct-type modified products of the polyisocyanate compounds, biuret-type modified products obtained by reacting them with water, and isocyanurate-type modified products containing an isocyanurate ring, such as isocyanurate-type hexamethylene diisocyanate.
  • the amount of crosslinking agent used in this case is not particularly limited, and may be, for example, an excess amount relative to the monomer capable of reacting with the crosslinking agent contained in the copolymer before modification.
  • the amount of isocyanate-based crosslinking agent per 100 parts by mass of the copolymer before modification is preferably 1.5 parts by mass or more, more preferably 2 parts by mass or more, and even more preferably 2.5 parts by mass or more, from the viewpoint of maintaining the uneven shape of the surface of the adhesive layer 110.
  • it is preferably 20 parts by mass or less, more preferably 15 parts by mass or less, and even more preferably 10 parts by mass or less.
  • an energy ray-reactive and crosslinked acrylic ester copolymer can be prepared by modifying an acrylic ester copolymer having a monomer into which an energy ray-curable group can be introduced and a monomer capable of reacting with a crosslinking agent.
  • an energy ray-reactive and crosslinked acrylic ester copolymer can be prepared by modifying an acrylic ester copolymer having a monomer into which an energy ray-curable group can be introduced and a monomer capable of reacting with a crosslinking agent.
  • an acrylic ester copolymer having a monomer into which an energy ray-curable group has been introduced and a monomer capable of reacting with a crosslinking agent can be prepared by first modifying the acrylic ester copolymer to introduce an energy ray-curable group into some of the monomers contained in the unmodified copolymer. Furthermore, an energy ray-reactive and crosslinked acrylic ester copolymer can be prepared by further modifying the acrylic ester copolymer to crosslink the other part of the monomers.
  • such an acrylic ester copolymer can be prepared by modifying an acrylic ester copolymer having a monomer with a hydroxy group.
  • some of the hydroxy groups can be modified using an isocyanate compound having a carbon-carbon double bond-containing group in an equivalent amount less than the hydroxy groups in the copolymer before modification.
  • another portion of the hydroxy groups can be urethane-crosslinked using an isocyanate-based crosslinking agent such as a polyisocyanate compound.
  • the hydroxy groups in some of the monomers have been modified to have a carbon-carbon double bond-containing group via a urethane bond.
  • the hydroxy groups in the other portion of the monomers have been modified to form urethane crosslinks.
  • the equivalent R B % of the energy ray-curable group introducing agent relative to the monomer capable of introducing an energy ray-curable group is preferably 50% or more, more preferably 65% or more, and even more preferably 75% or more from the viewpoint of sufficiently reducing the object retention force of the adhesive layer 110 after energy ray irradiation.
  • it is preferably 99% or less, more preferably 96% or less, and even more preferably 93% or less.
  • the adhesive layer 110 includes an acrylic ester copolymer.
  • the copolymerization rate of the energy ray-curable group-containing monomer is 23.0% or more and 50.0% or less.
  • the copolymerization rate of the energy ray-curable group-containing monomer in the acrylic ester copolymer is defined based on the raw material composition, and is specifically represented by the product of the above-mentioned RA % and RB %.
  • the preferred range of the copolymerization rate of the energy ray-curable group-containing monomer in the acrylic ester copolymer is the same as the preferred range of the product of RA % and RB % described above.
  • the reaction between the monomer capable of introducing an energy ray-curable group and the energy ray-curable group-introducing agent may not proceed completely, resulting in unreacted energy ray-curable group-introducing agent being contained in the adhesive layer 110.
  • the actual copolymerization rate of the energy ray-curable group-containing monomer in the acrylic ester copolymer is 23.0% or more and 50.0% or less. In one embodiment, from the viewpoint of sufficiently reducing the object-retaining force of the adhesive layer 110 after energy ray irradiation, the actual copolymerization rate is more preferably 24.0% or more, and even more preferably 25.0% or more.
  • the actual copolymerization rate is more preferably 40.0% or less, even more preferably 30.0% or less, and particularly preferably 27.0% or less.
  • the actual copolymerization rate of the energy ray-curable group-containing monomer in the acrylic ester copolymer refers to the molar ratio of the monomer having an energy ray-curable group to all the monomers contained in the acrylic ester copolymer. Such actual copolymerization ratio can be measured, for example, by NMR or pyrolysis GC/MS.
  • the mass average molecular weight (Mw) of the acrylic acid ester copolymer is preferably 10,000 or more, more preferably 70,000 or more, and even more preferably 140,000 or more. Furthermore, from the viewpoint of keeping the storage modulus below a predetermined value, it is preferably 2,000,000 or less, and even more preferably 1,200,000 or less. Furthermore, from the viewpoint of improving holding power, the number average molecular weight (Mn) of the resin is preferably 10,000 or more, more preferably 50,000 or more, and even more preferably 100,000 or more. Furthermore, from the viewpoint of keeping the storage modulus below a predetermined value, it is preferably 2,000,000 or less, more preferably 1,500,000 or less, and even more preferably 1,200,000 or less.
  • the content of the acrylic acid ester copolymer relative to the total amount of components constituting the adhesive layer 110 is preferably 70% by mass or more, more preferably 80% by mass or more, and even more preferably 90% by mass or more, from the viewpoint of sufficiently reducing the object retention force of the adhesive layer 110 after energy ray irradiation.
  • the content of the acrylic acid ester copolymer relative to the total amount of components constituting the adhesive layer 110 is 100% by mass or less, and may be 99% by mass or more, or 98% by mass or less.
  • the adhesive layer 110 may contain components other than resin, for example, the adhesive layer 110 may contain one or more of a crosslinking agent, a photopolymerization initiator, an antioxidant, and other additives.
  • crosslinking agents examples include isocyanate-based crosslinking agents, epoxy-based crosslinking agents, aziridine-based crosslinking agents, and metal chelate-based crosslinking agents. These crosslinking agents may be used alone or in combination of two or more.
  • the crosslinking agent can be selected according to the resin contained in the adhesive layer 110.
  • the crosslinking agent may be a crosslinking agent for the resin contained in the adhesive layer 110.
  • the crosslinking agent may be a crosslinking agent for an acrylic resin.
  • the crosslinking agent referred to here refers to unreacted crosslinking agent contained in the adhesive layer 110. Examples of crosslinking agents that can be used include those described above.
  • the adhesive layer 110 may contain one type of crosslinking agent, or may contain two or more types of crosslinking agents. From the viewpoint of properly carrying out the crosslinking reaction, the content of the crosslinking agent in the adhesive layer 110 is preferably 1% by mass or more, more preferably 1.5% by mass or more, even more preferably 2% by mass or more, and preferably 20% by mass or less, more preferably 15% by mass or less, even more preferably 10% by mass or less.
  • the photopolymerization initiator initiates a crosslinking reaction in response to irradiation with energy rays. If the adhesive layer 110 contains an energy reactive resin, the adhesive layer 110 can further contain a photopolymerization initiator, allowing the crosslinking reaction to proceed even with the application of relatively low energy.
  • photopolymerization initiators include 1-hydroxycyclohexyl phenyl ketone, benzoin, benzoin methyl ether, benzoin ethyl ether, benzoin propyl ether, benzyl phenyl sulfide, tetramethylthiuram monosulfide, azobisisobutyronitrile, dibenzyl, diacetyl, 8-chloroanthraquinone, 2,4,6-trimethylbenzoyldiphenylphosphine oxide, and bis(2,4,6-trimethylbenzoyl)phenylphosphine oxide.
  • the adhesive layer 110 may contain one type of polymerization initiator, or may contain two or more types of polymerization initiators.
  • the content of the photopolymerization initiator in the adhesive layer 110 is preferably 0.01% by mass or more, more preferably 0.1% by mass or more, even more preferably 0.2% by mass or more, and preferably 10% by mass or less, more preferably 5% by mass or less, even more preferably 2% by mass or less.
  • antioxidants include phenol-based compounds such as hindered phenol-based compounds, aromatic amine-based compounds, sulfur-based compounds, and phosphorus-based compounds such as phosphate ester compounds.
  • additives that may be contained in the adhesive layer 110 include, but are not limited to, ultraviolet absorbers such as benzotriazole-based compounds, oxazolic acid amide compounds, or benzophenone-based compounds; light stabilizers such as hindered amine-based, benzophenone-based, or benzotriazole-based; resin stabilizers such as imidazole-based resin stabilizers, dithiocarbamate-based resin stabilizers, phosphorus-based resin stabilizers, or sulfur ester-based resin stabilizers; fillers, pigments, extenders, and softeners.
  • ultraviolet absorbers such as benzotriazole-based compounds, oxazolic acid amide compounds, or benzophenone-based compounds
  • light stabilizers such as hindered amine-based, benzophenone-based, or benzotriazole-based
  • resin stabilizers such as imidazole-based resin stabilizers, dithiocarbamate-based resin stabilizers, phosphorus-based resin stabilizers,
  • the content of the additives in the adhesive layer 110 is preferably 0.0001% by mass or more, more preferably 0.01% by mass or more, particularly preferably 0.1% by mass or more, even more preferably 1% by mass or more, and preferably 20% by mass or less, more preferably 15% by mass or less, even more preferably 10% by mass or less.
  • the surface of the adhesive layer 110 has projections and depressions.
  • the adhesive layer 110 has a plurality of projections on its surface that are spaced apart and bounded by depressions. Each of the projections may be spaced apart by a depression that is continuous across the entire adhesive layer 110.
  • Figures 2A and 2B are side views showing the shape of adhesive layer 110
  • Figures 3A to 3C are top views showing the shape of adhesive layer 110.
  • Figures 2A and 3A show an example of adhesive layer 110 before expansion
  • Figures 2B and 3B show an example of adhesive layer 110' after expansion.
  • Figures 2A and 2B depict object 140 held by convex portions 111 of adhesive layer 110
  • Figures 3A to 3C omit the object 140 held by convex portions 111.
  • the convex portions 111 may be regularly arranged on the surface of the adhesive layer 110. Regularly arranged convex portions means that the convex portions are lined up in a straight line at regular intervals. On the other hand, the convex portions 111 may be arranged so that the intervals between them vary regularly. For example, the intervals between convex portions may be short in the center of the adhesive sheet and long in the periphery of the adhesive sheet. Furthermore, the convex portions may be arranged irregularly.
  • Figure 3C is a top view showing another shape of the adhesive layer 110.
  • stripe-shaped protrusions 111 may be provided on the surface of the adhesive layer 110.
  • line-shaped protrusions 111 having a constant width are arranged at regular intervals. The width or interval of these line-shaped protrusions 111 may vary regularly, or the line-shaped protrusions 111 may be arranged irregularly.
  • the pitch P of the convex portions 111 before expansion is preferably 1 ⁇ m or more, more preferably 5 ⁇ m or more, even more preferably 10 ⁇ m or more, and even more preferably 15 ⁇ m or more, from the viewpoint of adjusting the holding force.
  • this pitch P is preferably 100 ⁇ m or less, more preferably 75 ⁇ m or less, even more preferably 50 ⁇ m or less, even more preferably 35 ⁇ m or less, and even more preferably 25 ⁇ m or less.
  • the pitch P of the convex portions 111 refers to the distance between the center point of one arbitrarily selected convex portion 111 and the center point of another convex portion 111 closest to that convex portion 111.
  • the pitch P of the convex portions 111 represents the distance between the center point of the convex portion 111 on a straight line on which the convex portions 111 are arranged at regular intervals and the center point of another convex portion 111 closest to that convex portion 111.
  • the pitch P represents the distance between the center points of the convex portions on the line on which the convex portions 111 are arranged at the shortest pitch.
  • the spacing between the convex portions 111 means the spacing between the centers of the convex portions.
  • the specific shape of the convex portion 111 is not particularly limited.
  • the convex portion 111 may have a pillar shape. Specific examples include a cylindrical, prismatic, conical, pyramidal, spherical, or hemispherical shape.
  • the convex portion 111 may extend in a line shape, or may extend in a curved shape such as a wave shape.
  • these convex portions 111 may be tapered or inverted tapered.
  • Figure 4A shows a cross-sectional view of an adhesive layer 110 according to one embodiment, taken perpendicular to the surface of the adhesive layer 110 and passing through a convex portion 111.
  • the convex portion 111 shown in Figure 4A is tapered, i.e., the convex portion 111 is tapered.
  • the tip of the convex portion 111 may be curved. With this configuration, the impact when an object is held by the adhesive layer 110 is further alleviated, making it easier for the adhesive layer 110 to hold the object without it slipping.
  • the tip of the convex portion may be flat.
  • the surface of the adhesive layer 110 may have flat recesses and protruding portions 111 protruding from the recesses. In this manner, the adhesive layer 110 has multiple protruding portions 111 that are spaced apart from one another and may be bounded by the recesses.
  • the convex portion may be hemispherical or part of a sphere, as shown in FIG. 4B.
  • the convex portion 111 may be T-shaped, as shown in FIG. 4C.
  • the convex portion 111 may be in the shape of a collection of particles, mushroom-shaped, the surface of a lotus leaf, or needle-shaped.
  • the surface of the adhesive layer 110 may be rough or fibrous, and such a surface may also be said to have unevenness.
  • the width or diameter of each protrusion 111 is preferably 1 ⁇ m or more, more preferably 2 ⁇ m or more, even more preferably 5 ⁇ m or more, and even more preferably 10 ⁇ m or more.
  • it is preferably 100 ⁇ m or less, more preferably 50 ⁇ m or less, even more preferably 30 ⁇ m or less, and even more preferably 20 ⁇ m or less.
  • the width and diameter of the protrusion 111 refer to the minimum and maximum distances, respectively, between two parallel lines that contact the protrusion 111 from both sides on the surface of the recess (represented by W in Figure 4A).
  • the area of each protrusion 111 is preferably 10 ⁇ m2 or more, more preferably 20 ⁇ m2 or more, and even more preferably 30 ⁇ m2 or more.
  • the area is preferably 2000 ⁇ m2 or less, more preferably 1000 ⁇ m2 or less, and even more preferably 500 ⁇ m2 or less.
  • the area of the protrusion 111 means the area of the portion protruding from the surface of the recess (the area of a circle with a diameter W in the case of FIG. 4A ).
  • the height of each protrusion 111 is preferably 1 ⁇ m or more, more preferably 3 ⁇ m or more, and even more preferably 5 ⁇ m or more, from the viewpoint of increasing the ease of peeling an object.
  • the height of each protrusion 111 is preferably 20 ⁇ m or less, more preferably 15 ⁇ m or less, and even more preferably 10 ⁇ m or less. This makes it possible to change the holding power of an object.
  • the height of the protrusion 111 is represented by H in FIG. 4A.
  • the height of the multiple protrusions in the adhesive layer 110 is uniform.
  • the adhesive layer 110 may have a first multiple protrusions having a first uniform height and a second multiple protrusions having a different height.
  • the second multiple protrusions may have a second uniform height.
  • the protrusions 111 may be composed of such first protrusions and second protrusions.
  • the adhesive layer 110 may have multiple protrusions of random heights.
  • the total area of the convex portions 111 relative to the area of the adhesive layer 110 is preferably 1% or more, more preferably 5% or more, even more preferably 10% or more, even more preferably 18% or more, and even more preferably 40% or more.
  • the total area of the convex portions relative to the area of the adhesive layer 110 is preferably 95% or less, more preferably 75% or less, and even more preferably 60% or less.
  • the adhesive layer 110 is energy ray reactive. Therefore, by irradiating the adhesive layer 110 with energy rays, the storage modulus of the adhesive layer 110 increases. Furthermore, by irradiating the adhesive layer 110 with energy rays, the adhesive strength of the adhesive layer 110 decreases.
  • the temperature at which tan ⁇ stops increasing when the adhesive layer 110 is heated from 0°C after energy beam irradiation is greater than 55°C.
  • the temperature at which tan ⁇ stops increasing is preferably greater than 57°C, and more preferably greater than 59°C.
  • G' is the storage modulus.
  • G" is also the loss modulus.
  • the storage modulus and loss modulus of the adhesive layer 110 are measured using a torsional vibration method in accordance with JIS K7244-7:2007.
  • a cylindrical sample of the same material as the adhesive layer 110 1 mm thick and 8 mm in diameter, is prepared, and a dynamic viscoelasticity measuring device is used to apply a 10 Hz vibration and measure the sample while raising the sample's temperature from -30°C to 120°C. This allows the storage modulus and loss modulus of the adhesive layer 110 to be measured.
  • the adhesive layer 110 after irradiation with energy rays refers to the adhesive layer 110 after irradiation with an amount of energy rays that completes the crosslinking reaction.
  • the minimum X (X is a positive integer) at which the average value of tan ⁇ at temperatures between X - 2.5°C and X + 2.5°C is equal to or greater than the average value of tan ⁇ at temperatures between (X + 1) - 2.5°C and (X + 1) + 2.5°C is defined as the temperature at which the increase in tan ⁇ stops.
  • the present inventors have discovered that using an adhesive layer 110 in which the temperature at which tan ⁇ stops increasing is greater than 55°C makes it easier to pick up an object (especially a thin object) from the adhesive sheet. While not intending to limit the present invention, the present inventors believe the reason for this is as follows: Generally, an increase in tan ⁇ with increasing temperature reflects a decrease in the storage modulus. Therefore, by setting the temperature at which tan ⁇ stops increasing to greater than 55°C, it is expected that the storage modulus will be maintained at a stable high level in a normal environment, near room temperature. This is thought to make it more difficult for the convex portions of the adhesive layer 110 to follow the object when picking up the object, making it easier to pick up the object from the adhesive sheet.
  • the shear stress acting between the convex portions of the adhesive layer 110 and the object when the adhesive sheet is expanded is greater, making it more likely that the object will peel off from the adhesive layer 110. This is also thought to contribute to the effect of making it easier to pick up an object from the adhesive sheet.
  • the temperature of the adhesive layer 110 rises due to energy ray irradiation.
  • the cooling time of the adhesive layer 110 can be shortened, which is expected to improve productivity.
  • the adhesive layer 110 after energy ray irradiation has a value of (tan ⁇ at 50°C)/(tan ⁇ at 30°C) of 1.30 or greater.
  • the value of (tan ⁇ at 50°C)/(tan ⁇ at 30°C) is preferably 1.40 or greater, more preferably 1.50 or greater, and even more preferably 1.60 or greater.
  • the present inventors have discovered that using an adhesive layer 110 in which the value of (tan ⁇ at 50°C)/(tan ⁇ at 30°C) is 1.30 or greater makes it easier to pick up an object (particularly a thin object) from the adhesive sheet. While not intending to limit the present invention, the present inventors believe the reason for this is as follows: Generally, an increase in tan ⁇ with increasing temperature reflects a decrease in the storage modulus. Therefore, if tan ⁇ increases sharply with increasing temperature, it is expected that the storage modulus will be maintained stably at a high level in a normal environment near room temperature. For this reason, as described above, the holding force of the adhesive layer 110 on an object after irradiation with energy rays is reduced, making it easier to pick up an object from the adhesive sheet.
  • the adhesive layer 110 after irradiation with energy rays has a tan ⁇ value of 0.25 or less at 23°C.
  • the tan ⁇ value at 23°C is preferably 0.22 or less, and more preferably 0.18 or less.
  • the present inventors have discovered that using an adhesive layer 110 with a tan ⁇ value of 0.25 or less at 23°C makes it easier to pick up an object (particularly a thin object) from the adhesive sheet. While not intending to limit the present invention, the present inventors believe the reason for this is as follows: if the tan ⁇ value is sufficiently low near room temperature, which is a normal environment, it is expected that the storage modulus will be maintained stably high near this temperature. For this reason, as described above, the adhesive layer 110's ability to hold an object after irradiation with energy rays is reduced, making it easier to pick up an object from the adhesive sheet.
  • the storage modulus value at 23°C of the adhesive layer 110 after energy ray irradiation is preferably 0.80 GPa or more, more preferably 1.0 GPa or more, even more preferably 1.2 GPa or more, and even more preferably 1.5 GPa or more.
  • the storage modulus value at 23°C of the adhesive layer 110 after energy ray irradiation is preferably 10 GPa or less, more preferably 7.0 GPa or more, even more preferably 5.0 GPa or less, and even more preferably 3.0 GPa or more.
  • the storage modulus of the adhesive layer 110 at 23°C before irradiation with energy rays is preferably 100 MPa or less, more preferably 50 MPa or less, even more preferably 20 MPa or less, and particularly preferably 5.0 MPa or less.
  • the adhesive sheet according to one embodiment is expandable in the planar direction.
  • the adhesive layer 110 shown in FIGS. 2A and 3A is transformed into the adhesive layer 110' shown in FIGS. 2B and 3B by expanding the adhesive sheet.
  • the pitch P of the convex portions 111 in the adhesive layer 110' is increased due to expansion, and the number of convex portions 111 that hold one object 140 is reduced.
  • the adhesive layer 110' has a lower holding force for the object 140 via the convex portions 111 than the adhesive layer 110.
  • shear stress acts between the convex portions 111 and the object 140 due to expansion of the adhesive sheet.
  • the adhesive sheet according to one embodiment may be expandable by 1% or more in the planar direction (e.g., one direction or two orthogonal directions) or by 5% or more, from the viewpoint of sufficiently reducing the holding force for the object.
  • the pressure-sensitive adhesive sheet according to the present embodiment may also have a release sheet 150 in contact with the pressure-sensitive adhesive layer 110, as shown in Fig. 1.
  • Fig. 1 shows a state in which the pressure-sensitive adhesive layer 110 and the release sheet 150 are separated.
  • the release sheet 150 has an uneven surface that is complementary to the uneven surface of the pressure-sensitive adhesive layer 110.
  • the release sheet 150 has a release layer 160.
  • the release layer 160 is a layer that is easily peelable from the adhesive layer 110.
  • the release layer 160 may have an uneven surface that is complementary to the uneven surface of the adhesive layer 110. That is, the release layer 160 has recesses 161, and the recesses 161 have a shape that is complementary to the protrusions 111. However, it is not essential that the recesses 161 have a shape that is complementary to the protrusions 111.
  • the release sheet 150 may have a substrate 170 on the side that does not contact the adhesive layer 110. This substrate 170 may be designed similarly to the substrate 120, but does not need to have the same composition or structure as the substrate 120. In addition, the release sheet 150 may have an undercoat layer (not shown) between the release layer 160 and the substrate 170.
  • the above-mentioned sheet may have layers other than the substrate 120 and the adhesive layer 110.
  • an additional adhesive layer may be provided on the surface of the substrate 120 opposite the adhesive layer 110.
  • the sheet can be attached to another object via such an adhesive layer.
  • the type of the additional adhesive layer is not particularly limited, and the additional adhesive layer can be formed using, for example, a general adhesive.
  • Method for manufacturing pressure-sensitive adhesive sheet There are no particular limitations on the method for manufacturing the adhesive sheet and adhesive layer 110. An example of a method for manufacturing the adhesive sheet will be described below with reference to FIG.
  • a pressure-sensitive adhesive composition serving as a material for the pressure-sensitive adhesive layer 110 is prepared.
  • the pressure-sensitive adhesive composition can be prepared by adding an organic solvent to a raw material composition containing the above-described components of the pressure-sensitive adhesive layer 110.
  • the pressure-sensitive adhesive composition can contain, for example, the above-described energy ray-reactive acrylic acid ester copolymer.
  • an energy ray-curable group can be introduced into the energy ray-curable group-introducing monomer by reacting an energy ray-curable group-introducing agent with an acrylic acid ester copolymer having the energy ray-curable group-introducing monomer.
  • the process of preparing the pressure-sensitive adhesive composition may include a process of preparing an energy ray-reactive acrylic acid ester copolymer.
  • the copolymerization rate RA % of the energy ray-curable group-introducing monomer in the acrylic acid ester copolymer and the equivalent RB % of the energy ray-curable group-introducing agent to be reacted are as already described.
  • the adhesive composition may also contain the above-mentioned acrylic ester copolymer having a monomer into which an energy ray-curable group has been introduced and a monomer capable of reacting with a crosslinking agent.
  • the adhesive composition may also contain a crosslinking agent for crosslinking the monomers contained in the acrylic ester copolymer.
  • Examples of organic solvents used to prepare the pressure-sensitive adhesive composition include toluene, ethyl acetate, and methyl ethyl ketone.
  • Examples of methods for applying the solution include spin coating, spray coating, bar coating, knife coating, roll coating, roll knife coating, blade coating, die coating, gravure coating, and printing methods (e.g., screen printing and inkjet printing).
  • the adhesive composition prepared in S610 is used to form an adhesive layer having an uneven surface on substrate 120.
  • a layer of the adhesive composition is formed on substrate 120.
  • the adhesive composition is applied to substrate 120 to form a coating film, which is then dried, thereby providing a layer of the adhesive composition on substrate 120.
  • irregularities are formed on the surface of the adhesive composition layer thus formed.
  • irregularities can be formed on the surface of the layer using an imprinting method.
  • a mold with an irregular surface complementary to the irregularities to be formed can be used.
  • an adhesive layer 110 with an irregular surface is formed.
  • the adhesive composition layer is pressed with the mold, the layer is heated and maintained for a predetermined period of time, and then the material layer is cooled and the mold is removed.
  • the material layer can be heated to a temperature higher than the softening point of the adhesive composition layer.
  • a specific method for heating the material layer while pressing the layer with the mold is to vacuum laminate the adhesive composition layer provided on the substrate 120 and the mold.
  • a release sheet 150 having a release layer 160 with irregularities as described above may be used as the mold.
  • a crosslinking reaction of the resin contained in the adhesive composition may be carried out when forming the unevenness on the surface of the adhesive composition layer or after forming the unevenness.
  • the adhesive composition contains an acrylic acid ester copolymer having a monomer capable of reacting with a crosslinking agent
  • the monomers can be crosslinked with each other by reacting the acrylic acid ester copolymer with a crosslinking agent.
  • an adhesive layer 110 having an uneven surface can be formed by curing the adhesive composition layer while bringing the adhesive composition layer into contact with a mold having an uneven surface complementary to the unevenness.
  • the adhesive composition layer contains a copolymer before crosslinking and a thermal crosslinking agent
  • the crosslinking reaction proceeds by heating the material layer while pressing it with the mold, and an adhesive layer 110 containing a crosslinked copolymer is formed.
  • a crosslinking reaction due to heating in this way, unreacted energy ray-curable groups can be left in the adhesive layer 110.
  • an adhesive layer 110 having a rough surface can be provided by spray-coating an adhesive composition. Furthermore, an adhesive layer 110 having a rough or fibrous surface can be provided by adding a filler to the adhesive composition and coating such a solution. As yet another alternative method, an adhesive layer 110 having a textured shape can be provided directly on the substrate 120 by applying the adhesive composition according to the desired pattern using a printing method such as an inkjet method.
  • an adhesive layer 110 having an uneven surface may be formed on a release sheet 150.
  • the surface of the release sheet 150 may have an uneven surface that is complementary to the uneven surface of the adhesive layer 110.
  • an adhesive layer having an uneven surface i.e., the interface between the adhesive layer 110 and the release sheet 150
  • a substrate 120 can be attached to the surface of the adhesive layer 110 opposite the uneven surface.
  • the adhesive layer 110 may be formed on the substrate 120 by such a method.
  • the adhesive sheet according to this embodiment can be used to handle an object.
  • the adhesive sheet according to this embodiment can be used to temporarily hold an object.
  • the adhesive sheet according to this embodiment can also be used to transfer an object.
  • the adhesive sheet according to this embodiment can be used to transfer a semiconductor chip obtained by dicing to a desired position.
  • an object is held on the adhesive layer of the adhesive sheet according to this embodiment.
  • the type of object is not particularly limited.
  • the object may be, for example, an element.
  • elements include semiconductor chips such as LED chips, semiconductor chips with protective films, and semiconductor chips with die attach films (DAFs).
  • the element may also be a micro light-emitting diode, a mini light-emitting diode, a power device, a MEMS (Micro Electro Mechanical Systems), or a controller chip, or a component thereof.
  • the element may also be a singulated object such as a wafer, panel, or substrate.
  • the element may have a circuit surface on which an integrated circuit having circuit elements such as transistors, resistors, and capacitors is formed. The element is not necessarily limited to a singulated object, but may also be various unsingulated wafers or substrates.
  • the size of the object is not particularly limited.
  • the size of the object is preferably 100 ⁇ m 2 or more, more preferably 500 ⁇ m 2 or more, and even more preferably 1000 ⁇ m 2 or more.
  • the size of the object is preferably 100 mm 2 or less, more preferably 25 mm 2 or less, and even more preferably 1 mm 2 or less.
  • wafers examples include semiconductor wafers such as silicon wafers, silicon carbide (SiC) wafers, and compound semiconductor wafers (e.g., gallium phosphide (GaP) wafers, gallium arsenide (GaAs) wafers, indium phosphide (InP) wafers, and gallium nitride (GaN) wafers).
  • GaP gallium phosphide
  • GaAs gallium arsenide
  • InP indium phosphide
  • GaN gallium nitride
  • the size of the wafer is not particularly limited, but is preferably 6 inches (diameter approximately 150 mm) or larger, and more preferably 12 inches (diameter approximately 300 mm) or larger.
  • the shape of the wafer is not limited to circular, and may be angular, such as square or rectangular.
  • a panel is a fan-out type semiconductor package (e.g., FOWLP or FOPLP).
  • the workpiece may be a semiconductor package before or after singulation in fan-out type semiconductor package manufacturing technology.
  • the size of the panel is not particularly limited, but may be, for example, a rectangular substrate of approximately 300 to 700 mm.
  • substrates examples include glass substrates, sapphire substrates, and compound semiconductor substrates.
  • elements are transferred from a holding substrate to an adhesive sheet, and the adhesive sheet holds the transferred elements.
  • a semiconductor wafer can be attached to a wafer substrate, and the semiconductor wafer can then be diced.
  • the elements on the wafer substrate obtained by dicing can then be brought into close contact with adhesive layer 110 of the adhesive sheet. Thereafter, an external stimulus such as laser light can be applied to reduce the adhesion between the wafer substrate and the elements.
  • an external stimulus such as laser light can be applied to reduce the adhesion between the wafer substrate and the elements.
  • an external stimulus such as laser light
  • This process allows the elements to be transferred from the wafer substrate to the adhesive sheet.
  • elements obtained by dicing a semiconductor wafer can be transferred to a holding substrate, thereby obtaining a holding substrate with elements attached thereto.
  • the elements attached to the holding substrate can then be transferred to adhesive layer 110 of the adhesive sheet in a similar manner.
  • an external stimulus may be used to separate an element attached to a holding substrate from the holding substrate. Specifically, the element moves away from the holding substrate. Alternatively, the element moves closer to the adhesive sheet. Then, when the element comes into contact with the adhesive layer 110 of the adhesive sheet, the element is separated from the holding substrate and captured by the adhesive sheet.
  • the type of external stimulus is not particularly limited, but examples include application of energy, cooling, expansion of the holding substrate, and physical stimulation (e.g., pressing the back surface of the holding substrate with a pin, etc.). By using one or more of these external stimuli, the bonding force between the holding substrate and the element can be reduced, and the element can be separated from the holding substrate.
  • the element can be separated from the holding substrate by irradiation with laser light (laser lift-off method).
  • laser light laser lift-off method
  • the separated element approaches the adhesive layer 110, pressure is generated between the element and the adhesive layer 110.
  • the uneven surface of the adhesive layer 110 reduces the pressure generated between the element and the adhesive layer 110, making it easier to capture the element at the desired position on the adhesive sheet.
  • an object held on the adhesive layer 110 of the adhesive sheet can be processed.
  • the processing method is not particularly limited. For example, processing such as wiring formation, back metal formation, cleaning, plating, singulation, thinning, and sealing can be performed.
  • a semiconductor wafer can be attached to the adhesive layer 110 of the adhesive sheet. Then, elements can be formed by dicing the semiconductor wafer on the adhesive layer 110. This method also allows the adhesive sheet to hold elements.
  • S720 Adhesion reduction process
  • the adhesive strength of the adhesive layer 110 holding the object is reduced.
  • a treatment step of irradiating the adhesive layer 110 with energy rays and an expansion step of expanding the adhesive sheet in the planar direction can be performed.
  • the storage modulus of the adhesive layer 110 increases and the adhesive strength is reduced.
  • the holding strength of the adhesive layer 110 to the object is reduced as described above.
  • the amount of energy rays applied in the treatment step can be set depending on the type of adhesive layer 110 and the desired adhesive strength.
  • the amount of ultraviolet light is preferably 20 mJ/ cm2 or more, and more preferably 100 mJ/ cm2 or more, from the viewpoint of sufficiently reducing the adhesive strength.
  • the amount of ultraviolet light is preferably 1000 mJ/ cm2 or less, and more preferably 500 mJ/ cm2 or less, from the viewpoint of shortening the treatment time.
  • the adhesive sheet is expanded in the planar direction.
  • the method for expanding the adhesive sheet is not particularly limited.
  • the adhesive sheet may be expanded in one direction, two directions, or multiple other directions.
  • the expansion rate of the adhesive sheet is also not particularly limited.
  • the expansion rate of the adhesive sheet in one direction may be 1% or more, or 5% or more.
  • the expansion rate of the adhesive sheet in one direction may be 50% or less, or 20% or less.
  • the expansion rate of the adhesive sheet in two mutually perpendicular directions may be 1% or more, or 5% or more, or may be 50% or less, or 20% or less.
  • the adhesive sheet can be expanded by fixing the adhesive sheet to a frame and pressing a base against the adhesive sheet inside the frame.
  • Figure 5A shows a state in which the adhesive sheet holds objects 140a to 140d.
  • the outer periphery of the adhesive sheet can be fixed to frame 320.
  • the shape of frame 320 is not particularly limited.
  • frame 320 may be a circular or rectangular frame-shaped member with an opening.
  • a circular ring frame is used as the frame. Using a ring frame allows the adhesive sheet to expand in all directions.
  • the adhesive sheet fixed to frame 320 can then be expanded by contacting the base 310 with the base, and then displacing (pulling down) frame 320 toward base 310 as shown in FIG. 5B.
  • the configuration of base 310 is not particularly limited, and may be, for example, cylindrical or rectangular.
  • Base 310 may also be mesh-shaped or ring-shaped.
  • Frame 320 may be displaced relative to base 310 at a speed of, for example, 0.1 mm/sec or more, or 1 mm/sec or more.
  • the displacement amount of frame 320 i.e., the pull-down amount, may be, for example, 1 mm or more, or 5 mm or more, from the viewpoint of sufficiently reducing the object holding force.
  • the displacement amount of frame 320 may be 30 mm or less, or 20 mm or less, from the viewpoint of preventing damage to the adhesive sheet.
  • the object is peeled from the adhesive layer 110 of the adhesive sheet.
  • the object can be peeled from the adhesive layer 110 of the adhesive sheet after the treatment process and the expansion process have been performed.
  • the method for peeling the object is not particularly limited.
  • the method described above can be used to transfer an object attached to a holding substrate to an adhesive sheet.
  • the object can be peeled from the adhesive layer 110 of the adhesive sheet using an adsorption member such as a vacuum collet. The adsorbed object can then be moved to a desired transfer location.
  • the object can be peeled from the adhesive layer 110 of the adhesive sheet without applying a physical stimulus, such as pressure from the opposite side of the adhesive layer 110 using a pin or the like.
  • a physical stimulus such as pressure from the opposite side of the adhesive layer 110 using a pin or the like.
  • the object may also be peeled from the adhesive layer 110 of the adhesive sheet while applying a physical stimulus from the opposite side of the adhesive layer 110 of the adhesive sheet.
  • the handling method and adhesive sheet of this embodiment are suitable for handling thin objects.
  • the thickness of the object held by the adhesive sheet is preferably 50 ⁇ m or less, more preferably 30 ⁇ m or less, and even more preferably 10 ⁇ m or less.
  • an object can be transferred to any desired destination using an adhesive sheet.
  • One embodiment of the present invention relates to a method for peeling an object from an adhesive sheet holding the object on the adhesive layer.
  • Such a peeling method can include a step of reducing adhesive strength as in S720, and a step of peeling the object as in S730.
  • a method for manufacturing an article according to one embodiment of the present invention can include, in addition to the step of peeling an object from an adhesive sheet according to the above-described peeling method, a step of manufacturing the article by performing post-processing on the object.
  • a post-processing step is performed on the object.
  • the type of post-processing is not particularly limited. For example, processes such as wiring formation, backmetal formation, cleaning, plating, singulation, thinning, and sealing can be performed.
  • thermo Crosslinking Agent an isocyanurate type polyisocyanate derived from hexamethylene diisocyanate was used.
  • a pressure-sensitive adhesive composition was prepared by dissolving the acrylic acid ester copolymer (A1) or (A2) and the crosslinking agent (B) in toluene in the amounts shown in Table 1.
  • Table 1 shows the solid content parts by mass of each material.
  • This adhesive composition was applied to the release-treated surface of a release substrate (fine-embossed release sheet) with a concave pattern, and the resulting coating was dried at 100°C for 2 minutes to form an adhesive layer with a thickness of 25 ⁇ m.
  • the concave-convex pattern on the surface of the formed adhesive layer was a grid-like arrangement of pillars, similar to Figure 2A.
  • the pitch P between pillars on the adhesive sheet was 20 ⁇ m.
  • each pillar had a height (H) of 8 ⁇ m, a tip diameter (T) of 8 ⁇ m, and a base diameter (W) of 16 ⁇ m.
  • the release sheet used above had a concave pattern on its surface that was complementary to the concave-convex pattern.
  • An adhesive sheet was produced by laminating a substrate (ethylene methacrylic acid copolymer (EMAA) film, acid content 9% by mass, one surface embossed to give it a matte finish, thickness 80 ⁇ m, tensile modulus 160 MPa) onto the adhesive layer thus obtained.
  • a substrate ethylene methacrylic acid copolymer (EMAA) film, acid content 9% by mass, one surface embossed to give it a matte finish, thickness 80 ⁇ m, tensile modulus 160 MPa
  • a pressure-sensitive adhesive composition was prepared in the same manner as in Example 1, except that the amounts of acrylic acid ester copolymer (A3) and crosslinking agent (B) shown in Table 1 were dissolved in toluene to prepare the pressure-sensitive adhesive composition, and a pressure-sensitive adhesive sheet was produced.
  • the storage modulus and tan ⁇ of the adhesive layers in each Example and Comparative Example were measured as follows. Specifically, the adhesive composition used in each Example was applied, and the resulting coating was dried at 100°C for 2 minutes to form an adhesive layer with a thickness of 25 ⁇ m. The adhesive layers thus formed were laminated to a thickness of 1 mm. Then, using an ultraviolet irradiator (manufactured by Heraeus), the laminate was irradiated with ultraviolet light at an illuminance of 130 mW/ cm2 and a light dose of 210 mJ/ cm2 , thereby crosslinking the energy beam-curable groups in the adhesive layer. The resulting adhesive layer was punched into a cylindrical shape with a diameter of 8 mm to prepare a sample for dynamic viscoelasticity measurement.
  • an ultraviolet irradiator manufactured by Heraeus
  • Dynamic viscoelasticity measurements were performed on the obtained samples using the torsional vibration method in accordance with JIS K7244-7:2007. Specifically, a viscoelasticity measuring device (Rheometrics, device name "DYNAMIC ANALYZER RDAII”) was used to apply a 10 Hz vibration and measure the sample while raising its temperature from -30°C to 120°C, thereby measuring the storage modulus E' and loss modulus E'' at each temperature. The loss tangent tan ⁇ at each temperature is expressed as E''/E'.
  • the adhesive sheet obtained in each example and comparative example was attached to a ring frame (stainless steel, inner diameter 194 mm), and the adhesive sheet was cut to fit the outer diameter of the ring frame.
  • a wafer substrate ground silicon wafer, 6 inches, 150 ⁇ m or 50 ⁇ m thick
  • the wafer substrate was then diced into 8 mm x 8 mm squares to obtain multiple elements (silicon chips, element size 8 mm x 8 mm x 50 ⁇ m or 150 ⁇ m).
  • the resulting multiple elements were attached to the adhesive layer of the adhesive sheet in the center of the inner side of the ring frame, with the ground surface attached to the uneven surface of the adhesive layer.
  • Attachment was performed by lamination at room temperature (23°C).
  • the dicing tape was then peeled off, transferring the multiple elements from the dicing tape to the adhesive sheet.
  • an adhesive sheet with multiple elements mounted thereon and supported by a ring frame was obtained as an evaluation sample.
  • the obtained evaluation sample was irradiated with ultraviolet light at an illuminance of 130 mW/cm 2 and a light quantity of 210 mJ/cm 2 using an ultraviolet irradiator (manufactured by Heraeus).
  • the evaluation sample was placed in a pickup device (Canon Machinery Inc., product name "BESTEM-D510"). After expanding the adhesive sheet, an attempt was made to pick up the element using a vacuum suction collet.
  • the adhesive sheet was expanded as shown in Figures 5A and 5B. That is, with the element supported by base 310 over the adhesive sheet, ring frame 320 was pulled down 10 mm relative to base 310, expanding the adhesive sheet.
  • This evaluation also assessed whether the element could be picked up without poking the surface (substrate) of the adhesive sheet opposite the element to be picked up with a needle. If the element could be picked up without damage, it was evaluated as “pickup possible” (A). If the element was damaged during pickup, could not be picked up, or transfer of the element from the wafer substrate to the adhesive sheet failed, it was evaluated as "pickup impossible” (F).

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Abstract

The present invention makes it possible for an object held on an adhesive sheet provided with protrusions and recesses on the surface thereof to be picked up by means of a milder operation. This adhesive sheet comprises a base material, and an adhesive layer that has protrusions and recesses on the surface thereof. The adhesive layer contains an acrylic acid ester copolymer, and the copolymerization ratio of an energy ray-curable group-containing monomer in the acrylic acid ester copolymer is 20%-50%.

Description

粘着シート及びその製造方法並びに粘着シートからの物体の剥離方法Adhesive sheet, manufacturing method thereof, and method for peeling an object from an adhesive sheet

 本発明は粘着シート及びその製造方法並びに粘着シートからの物体の剥離方法に関し、特に半導体チップの製造に関する。 The present invention relates to an adhesive sheet, a method for manufacturing the same, and a method for peeling an object from the adhesive sheet, and particularly to the manufacture of semiconductor chips.

 粘着シートは物体を一時的に保持するために用いることができる。例えば、物体を所望の位置に転写するために、このような粘着シートを用いることができる。 Adhesive sheets can be used to temporarily hold an object in place. For example, such adhesive sheets can be used to transfer an object to a desired location.

 一方で、生産効率を向上させるために、粘着シートからの物体の剥離を容易とすることも求められている。例えば、特許文献1には、平滑な第1粘着性フィルムに電子部品が貼り付けられた状態で、フィルムに紫外線を照射することにより、フィルムの粘着力を低下させる構成が開示されている。特許文献1に記載の方法では、電子部品をさらに第2粘着性フィルムに圧着させてから、第1粘着性フィルムを剥離することにより、第1粘着性フィルムから第2粘着性フィルムへと電子部品が転写される。また、特許文献2には、物体の剥離が容易となるように構成された、面方向に拡張可能であり、表面に凹凸を有する粘着層を備える粘着シートが開示されている。 On the other hand, to improve production efficiency, there is also a demand for easier peeling of objects from adhesive sheets. For example, Patent Document 1 discloses a configuration in which an electronic component is attached to a smooth first adhesive film and then irradiated with ultraviolet light, thereby reducing the adhesive strength of the film. In the method described in Patent Document 1, the electronic component is further pressed onto a second adhesive film, and then the first adhesive film is peeled off, thereby transferring the electronic component from the first adhesive film to the second adhesive film. Furthermore, Patent Document 2 discloses an adhesive sheet that is expandable in the plane direction and has an adhesive layer with an uneven surface, configured to facilitate easier peeling of objects.

特開2020-61529号公報Japanese Patent Application Laid-Open No. 2020-61529 国際公開第2024/063124号International Publication No. 2024/063124

 特許文献1及び2のような粘着シートは、粘着シートにおける物体保持力と、粘着シートからの物体の剥離容易性とを共に備えることが望まれる。特に、薄い半導体チップのような破損しやすい物体を取り扱う場合、物体をピックアップするために加えられる力をより小さくする必要がある。特許文献1及び2に開示された粘着シートは、剥離容易性の点で改善の余地を残していた。 Adhesive sheets such as those disclosed in Patent Documents 1 and 2 are desired to have both the ability to hold an object in place and the ease with which the object can be removed from the adhesive sheet. In particular, when handling fragile objects such as thin semiconductor chips, it is necessary to reduce the force required to pick up the object. The adhesive sheets disclosed in Patent Documents 1 and 2 leave room for improvement in terms of ease of removal.

 本発明の一実施形態は、表面に凹凸を有する粘着層を備える粘着シートに保持された物体を、よりマイルドな操作でピックアップすることを可能にする。 One embodiment of the present invention makes it possible to pick up objects held on an adhesive sheet with an adhesive layer having an uneven surface with a gentler operation.

 本発明者は、鋭意検討を重ねた結果、粘着シートの粘着層を適切に設計することにより、粘着シートからの物体のピックアップがより容易となり、こうして上記課題を解決できることを見出し、更に種々検討を重ね、本発明を完成するに至った。 After extensive research, the inventor discovered that by appropriately designing the adhesive layer of the adhesive sheet, it becomes easier to pick up objects from the adhesive sheet, thereby solving the above-mentioned problem. After further research, the inventors have completed the present invention.

 すなわち、本発明の実施形態は、下記[1]~[14]に関する。
[1]基材と、表面に凹凸を有する粘着層と、を備える粘着シートであって、前記粘着層はアクリル酸エステル共重合体を含み、前記アクリル酸エステル共重合体中の、エネルギー線硬化性基含有単量体の共重合率が20%以上50%以下である、粘着シート。
[2]前記アクリル酸エステル共重合体は、(メタ)アクリル酸エステル単量体である前記エネルギー線硬化性基含有単量体と、他の(メタ)アクリル酸エステル単量体と架橋された(メタ)アクリル酸エステル単量体と、を有する、[1]に記載の粘着シート。
[3]前記エネルギー線硬化性基含有単量体は、ヒドロキシ基を介して側鎖に炭素-炭素二重結合含有基を有する(メタ)アクリル酸エステル単量体である、[2]に記載の粘着シート。
[4]前記他の(メタ)アクリル酸エステル単量体と架橋された(メタ)アクリル酸エステル単量体は、ヒドロキシ基を介して前記他の(メタ)アクリル酸エステル単量体と架橋されている、[2]から[3]のいずれか1つに記載の粘着シート。
[5]前記粘着層を構成する成分の全量に対する、前記アクリル酸エステル共重合体の含有量が70~100質量%である、[1]から[4]のいずれか1つに記載の粘着シート。
[6]前記アクリル酸エステル共重合体の質量平均分子量が10000以上である、[1]から[5]のいずれか1つに記載の粘着シート。
[7]前記粘着シートは面方向に拡張可能である、[1]から[6]のいずれか1つに記載の粘着シート。
[8]前記粘着層が有する凸部の高さが1μm以上である、[1]から[7]のいずれか1つに記載の粘着シート。
[9]前記粘着層は、凹部によって境界が定められ、互いに離間している複数の凸部を有し、前記複数の凸部のピッチが1μm以上100μm以下である、[1]から[8]のいずれか1つに記載の粘着シート。
[10]前記粘着層は複数の凸部を有し、前記複数の凸部の高さが均一である、[1]から[9]のいずれか1つに記載の粘着シート。
[11]前記粘着層の凹凸面に相補的な凹凸面を備える剥離層をさらに備える、[1]から[10]のいずれか1つに記載の粘着シート。
[12]基材と、表面に凹凸を有する粘着層と、を備える粘着シートの製造方法であって、エネルギー線硬化性基を導入可能な単量体を有するアクリル酸エステル共重合体に対して、エネルギー線硬化性基導入剤を反応させることにより、前記エネルギー線硬化性基を導入可能な単量体にエネルギー線硬化性基を導入する工程を含む、粘着剤組成物を調製する調製工程と、前記粘着剤組成物を用いて前記基材上に前記粘着層を形成する形成工程と、を含み、前記アクリル酸エステル共重合体中の、前記エネルギー線硬化性基を導入可能な単量体の共重合率はR%であり、前記調製工程においては、前記エネルギー線硬化性基を導入可能な単量体に対して、R%当量のエネルギー線硬化性基導入剤を反応させ、R%とR%との積は23.0%以上50.0%以下である、製造方法。
[13]エネルギー線硬化性基を導入可能な(メタ)アクリル酸エステル単量体は、ヒドロキシ基を有する(メタ)アクリル酸エステル単量体であり、前記エネルギー線硬化性基導入剤は、炭素-炭素二重結合含有基を有するイソシアネート化合物である、[12]に記載の製造方法。
[14]粘着層に物体を保持している[1]から[11]のいずれか1つに記載の粘着シートからの前記物体の剥離方法であって、前記粘着層にエネルギー線を照射する照射工程と、前記粘着シートを面方向に拡張する拡張工程と、前記物体を前記粘着シートの前記粘着層から剥離する剥離工程と、を含む、剥離方法。
That is, embodiments of the present invention relate to the following [1] to [14].
[1] An adhesive sheet comprising a substrate and an adhesive layer having an uneven surface, wherein the adhesive layer contains an acrylic acid ester copolymer, and the copolymerization rate of an energy ray-curable group-containing monomer in the acrylic acid ester copolymer is 20% or more and 50% or less.
[2] The pressure-sensitive adhesive sheet described in [1], wherein the acrylic acid ester copolymer has the energy ray-curable group-containing monomer which is a (meth)acrylic acid ester monomer, and a (meth)acrylic acid ester monomer crosslinked with another (meth)acrylic acid ester monomer.
[3] The pressure-sensitive adhesive sheet according to [2], wherein the energy ray-curable group-containing monomer is a (meth)acrylic acid ester monomer having a carbon-carbon double bond-containing group in a side chain via a hydroxy group.
[4] The pressure-sensitive adhesive sheet according to any one of [2] to [3], wherein the (meth)acrylic acid ester monomer crosslinked with the other (meth)acrylic acid ester monomer is crosslinked with the other (meth)acrylic acid ester monomer via a hydroxy group.
[5] The pressure-sensitive adhesive sheet according to any one of [1] to [4], wherein the content of the acrylic ester copolymer relative to the total amount of components constituting the pressure-sensitive adhesive layer is 70 to 100 mass%.
[6] The pressure-sensitive adhesive sheet according to any one of [1] to [5], wherein the acrylic acid ester copolymer has a mass average molecular weight of 10,000 or more.
[7] The pressure-sensitive adhesive sheet according to any one of [1] to [6], wherein the pressure-sensitive adhesive sheet is expandable in the planar direction.
[8] The pressure-sensitive adhesive sheet according to any one of [1] to [7], wherein the height of the convex portions of the pressure-sensitive adhesive layer is 1 μm or more.
[9] The adhesive sheet according to any one of [1] to [8], wherein the adhesive layer has a plurality of convex portions spaced apart from each other and bounded by concave portions, and the pitch of the plurality of convex portions is 1 μm or more and 100 μm or less.
[10] The pressure-sensitive adhesive sheet according to any one of [1] to [9], wherein the pressure-sensitive adhesive layer has a plurality of convex portions, and the height of the plurality of convex portions is uniform.
[11] The pressure-sensitive adhesive sheet according to any one of [1] to [10], further comprising a release layer having an uneven surface complementary to the uneven surface of the pressure-sensitive adhesive layer.
[12] A method for producing a pressure-sensitive adhesive sheet comprising a substrate and a pressure-sensitive adhesive layer having an uneven surface, the method comprising: a preparation step of preparing a pressure-sensitive adhesive composition, the pressure-sensitive adhesive composition comprising a step of introducing an energy ray-curable group into an acrylic acid ester copolymer having a monomer capable of introducing an energy ray-curable group by reacting the monomer with an energy ray-curable group-introducing agent, and a formation step of forming the pressure-sensitive adhesive layer on the substrate using the pressure-sensitive adhesive composition, wherein the copolymerization rate of the monomer capable of introducing an energy ray-curable group in the acrylic acid ester copolymer is RA %, and in the preparation step, the energy ray-curable group-introducing agent is reacted in an amount equivalent to RB % with the monomer capable of introducing an energy ray-curable group, and the product of RA % and RB % is 23.0% or more and 50.0% or less.
[13] The production method according to [12], wherein the (meth)acrylic acid ester monomer capable of introducing an energy ray-curable group is a (meth)acrylic acid ester monomer having a hydroxy group, and the energy ray-curable group introducing agent is an isocyanate compound having a carbon-carbon double bond-containing group.
[14] A method for peeling an object from an adhesive sheet according to any one of [1] to [11], in which the object is held on an adhesive layer, the peeling method comprising an irradiation step of irradiating the adhesive layer with energy rays, an expansion step of expanding the adhesive sheet in the planar direction, and a peeling step of peeling the object from the adhesive layer of the adhesive sheet.

 本発明の一実施形態は、表面に凹凸を有する粘着層を備える粘着シートに保持された物体を、よりマイルドな操作でピックアップすることを可能にする。 One embodiment of the present invention makes it possible to pick up objects held on an adhesive sheet with an adhesive layer having an uneven surface with a gentler operation.

 本発明のその他の特徴及び利点は、添付図面を参照とした以下の説明により明らかになるであろう。なお、添付図面においては、同じ若しくは同様の構成には、同じ参照番号を付す。
 
Other features and advantages of the present invention will become apparent from the following description taken in conjunction with the accompanying drawings, in which the same or similar elements are designated by the same reference numerals.

 添付図面は明細書に含まれ、その一部を構成し、本発明の実施の形態を示し、その記述と共に本発明の原理を説明するために用いられる。
一実施形態に係る粘着シートの断面図。 拡張前の粘着層が有する凹凸の一例を示す断面図。 拡張後の粘着層が有する凹凸の一例を示す断面図。 拡張前の粘着層が有する凹凸の一例を示す上面図。 拡張後の粘着層が有する凹凸の一例を示す上面図。 粘着層が有する凹凸の別の例を示す上面図。 粘着層が有する凹凸の一例を示す断面図。 粘着層が有する凹凸の一例を示す断面図。 粘着層が有する凹凸の一例を示す断面図。 粘着シートの拡張方法について説明する図。 粘着シートの拡張方法について説明する図。 一実施形態に係る粘着シートの製造方法のフローチャート。 一実施形態に係る剥離方法のフローチャート。
The accompanying drawings, which are incorporated in and constitute a part of the specification, illustrate embodiments of the invention and, together with the description, serve to explain the principles of the invention.
FIG. 1 is a cross-sectional view of a pressure-sensitive adhesive sheet according to an embodiment. FIG. 4 is a cross-sectional view showing an example of the unevenness of the adhesive layer before expansion. FIG. 10 is a cross-sectional view showing an example of the unevenness of the adhesive layer after expansion. FIG. 10 is a top view showing an example of the unevenness of the adhesive layer before expansion. FIG. 10 is a top view showing an example of the unevenness of the adhesive layer after expansion. FIG. 10 is a top view showing another example of the unevenness of the adhesive layer. FIG. 3 is a cross-sectional view showing an example of the unevenness of the adhesive layer. FIG. 3 is a cross-sectional view showing an example of the unevenness of the adhesive layer. FIG. 3 is a cross-sectional view showing an example of the unevenness of the adhesive layer. 10A to 10C are diagrams illustrating a method for expanding an adhesive sheet. 10A to 10C are diagrams illustrating a method for expanding an adhesive sheet. 3 is a flowchart of a method for manufacturing a pressure-sensitive adhesive sheet according to an embodiment. 1 is a flowchart of a peeling method according to an embodiment.

 以下、添付図面を参照して実施形態を詳しく説明する。なお、以下の実施形態は特許請求の範囲に係る発明を限定するものではなく、また実施形態で説明されている特徴の組み合わせの全てが発明に必須のものとは限らない。実施形態で説明されている複数の特徴のうち二つ以上の特徴は任意に組み合わされてもよい。また、同一若しくは同様の構成には同一の参照番号を付し、重複した説明は省略する。 The following embodiments are described in detail with reference to the accompanying drawings. Note that the following embodiments do not limit the invention as defined in the claims, and not all combinations of features described in the embodiments are necessarily essential to the invention. Two or more of the multiple features described in the embodiments may be combined in any desired manner. Furthermore, the same reference numbers are used for identical or similar components, and duplicate descriptions will be omitted.

(定義)
 本明細書において、質量平均分子量(Mw)及び数平均分子量(Mn)は、サイズ排除クロマトグラフィー法で測定される標準ポリスチレン換算の値であり、具体的にはJIS K7252-1:2016に基づいて測定される値である。また、本明細書において、「(メタ)アクリル酸」は、「アクリル酸」と「メタクリル酸」の双方を指す用語であり、他の類似用語も同様である。
(definition)
In this specification, the mass average molecular weight (Mw) and number average molecular weight (Mn) are values calculated as standard polystyrene as measured by size exclusion chromatography, specifically, values measured in accordance with JIS K7252-1: 2016. Furthermore, in this specification, "(meth)acrylic acid" is a term that refers to both "acrylic acid" and "methacrylic acid," and the same applies to other similar terms.

 本明細書において、数値範囲(例えば含有量等の範囲)の1以上の下限値及び1以上の上限値が記載されている場合、その中の任意の下限値と上限値と組み合わせが記載されているものと理解できる。例えば、好ましくは1以上、より好ましくは2以上、さらに好ましくは3以上であり、好ましくは9以下、より好ましくは8以下、さらに好ましくは7以下であるとの記載は、数値範囲が、1以上9以下、1以上8以下、1以上7以下、2以上9以下、2以上8以下、2以上7以下、3以上9以下、3以上8以下、及び3以上7以下のいずれであってもよいことを明確に意味する。また、本明細書において、質量部及び質量%は、特に断りのない限り、固形分の質量に基づく割合を示す。 In this specification, when one or more lower limits and one or more upper limits of a numerical range (e.g., a range of content, etc.) are described, it can be understood that any combination of lower and upper limits therein is described. For example, a description such as "preferably 1 or more, more preferably 2 or more, even more preferably 3 or more, and preferably 9 or less, more preferably 8 or less, even more preferably 7 or less" clearly means that the numerical range may be any of 1 or more and 9 or less, 1 or more and 8 or less, 1 or more and 7 or less, 2 or more and 9 or less, 2 or more and 8 or less, 2 or more and 7 or less, 3 or more and 9 or less, 3 or more and 8 or less, and 3 or more and 7 or less. Furthermore, in this specification, parts by mass and % by mass indicate proportions based on the mass of the solid content, unless otherwise specified.

(粘着シートの構成)
 本発明の一実施形態に係る粘着シートは、基材120と、表面に凹凸を有する粘着層110とを備える。粘着シートは、物体を一時的に保持し、転写先に転写するための、転写用シートとして用いることができる。例えば、粘着シートは、他の保持基板に保持されている物体を受け取り、物体を一時的に保持し、転写先の所望の位置に物体を転写する用途で用いることができる。基材120は、粘着層110を支持することができる。以下、このような粘着シートの構成について、一実施形態に係る粘着シートの模式図である図1を参照しながら説明する。
(Configuration of adhesive sheet)
An adhesive sheet according to one embodiment of the present invention comprises a substrate 120 and an adhesive layer 110 having an uneven surface. The adhesive sheet can be used as a transfer sheet for temporarily holding an object and transferring it to a destination. For example, the adhesive sheet can be used to receive an object held on another holding substrate, temporarily hold the object, and transfer the object to a desired position on the destination. The substrate 120 can support the adhesive layer 110. The configuration of such an adhesive sheet will be described below with reference to FIG. 1, which is a schematic diagram of an adhesive sheet according to one embodiment.

(基材)
 基材120は、粘着層110を支持する支持体として機能する。基材120は、粘着層110の凹凸を有する面とは反対側の面に位置する。
(Base material)
The substrate 120 functions as a support for supporting the adhesive layer 110. The substrate 120 is located on the surface of the adhesive layer 110 opposite to the surface having the irregularities.

 一実施形態において、粘着シートは面方向に拡張可能である。このような観点から、基材120としてはフレキシブル基材を用いることができる。また、基材120としてフレキシブル基材を用いることにより、物体を保持する際のクッション性を向上させる、粘着シートの積層を容易とする、又は粘着シートをロール形態とすることができる。基材120としては、例えば樹脂フィルムを用いることができる。樹脂フィルムは、主材として樹脂系の材料が用いられているフィルムであり、樹脂材料からなっていてもよいし、樹脂材料に加えて添加剤を含んでいてもよい。樹脂フィルムは、レーザ光透過性を有していてもよい。 In one embodiment, the adhesive sheet is expandable in the planar direction. From this perspective, a flexible substrate can be used as the substrate 120. Furthermore, using a flexible substrate as the substrate 120 can improve cushioning when holding an object, facilitate stacking of the adhesive sheet, or allow the adhesive sheet to be in a roll form. For example, a resin film can be used as the substrate 120. A resin film is a film that uses a resin-based material as its main material, and may be made of a resin material, or may contain additives in addition to the resin material. The resin film may be laser light transparent.

 樹脂フィルムの具体例としては、低密度ポリエチレン(LDPE)フィルム、直鎖低密度ポリエチレン(LLDPE)フィルム、及び高密度ポリエチレン(HDPE)フィルム等のポリエチレンフィルム、ポリプロピレンフィルム、ポリブテンフィルム、ポリブタジエンフィルム、ポリ(4-メチル-1-ペンテン)フィルム、エチレン-ノルボルネン共重合体フィルム、並びにノルボルネン樹脂フィルム等のポリオレフィン系フィルム;エチレン-酢酸ビニル共重合体フィルム、エチレン-(メタ)アクリル酸共重合体フィルム、及びエチレン-(メタ)アクリル酸エステル共重合体フィルム等のエチレン系共重合体系フィルム;ポリ塩化ビニルフィルム及び塩化ビニル共重合体フィルム等のポリ塩化ビニル系フィルム;ポリエチレンテレフタレートフィルム及びポリブチレンテレフタレートフィルム等のポリエステル系フィルム;ポリウレタンフィルム;ポリイミドフィルム;ポリスチレンフィルム;ポリカーボネートフィルム;並びにフッ素樹脂フィルム等が挙げられる。また、2種類以上の材料の混合物を含むフィルム、これらのフィルムを形成する樹脂が架橋されている架橋フィルム、及びアイオノマーフィルムのような変性フィルムを用いてもよい。また、基材120は、2種類以上の樹脂フィルムが積層された積層フィルムであってもよい。 Specific examples of resin films include polyethylene films such as low-density polyethylene (LDPE) film, linear low-density polyethylene (LLDPE) film, and high-density polyethylene (HDPE) film; polyolefin films such as polypropylene film, polybutene film, polybutadiene film, poly(4-methyl-1-pentene) film, ethylene-norbornene copolymer film, and norbornene resin film; ethylene copolymer films such as ethylene-vinyl acetate copolymer film, ethylene-(meth)acrylic acid copolymer film, and ethylene-(meth)acrylic acid ester copolymer film; polyvinyl chloride films such as polyvinyl chloride film and vinyl chloride copolymer film; polyester films such as polyethylene terephthalate film and polybutylene terephthalate film; polyurethane film; polyimide film; polystyrene film; polycarbonate film; and fluororesin films. Films containing a mixture of two or more materials, crosslinked films in which the resins forming these films are crosslinked, and modified films such as ionomer films may also be used. Furthermore, the substrate 120 may be a laminate film in which two or more resin films are laminated.

 粘着シートの拡張を容易とする観点から、基材120は、ポリオレフィン系フィルム又は塩化ビニル共重合体フィルムであることが好ましい。ポリオレフィン系フィルムとしては、例えばポリエチレンフィルム、ポリプロピレンフィルム、及びエチレン-メタクリル酸共重合体(EMAA)を含むエチレン系共重合体のような、構成単位としてエチレン又はプロピレンのような無置換オレフィンを含む共重合体などが挙げられる。塩化ビニル共重合体フィルムとしては、例えば、塩化ビニル-塩化ビニリデン共重合体フィルム、塩化ビニル-酢酸ビニル共重合体フィルム、及び塩化ビニル-エチレン共重合体フィルムなどが挙げられる。このような共重合体の形態は特に限定されず、ブロック共重合体、ランダム共重合体、交互共重合体、及びグラフト共重合体のいずれであってもよい。なお、これらのフィルムには、他の樹脂成分又は添加剤が含まれていてもよい。 In order to facilitate expansion of the adhesive sheet, the substrate 120 is preferably a polyolefin film or a vinyl chloride copolymer film. Examples of polyolefin films include polyethylene film, polypropylene film, and copolymers containing unsubstituted olefins such as ethylene or propylene as structural units, such as ethylene copolymers containing ethylene-methacrylic acid copolymer (EMAA). Examples of vinyl chloride copolymer films include vinyl chloride-vinylidene chloride copolymer film, vinyl chloride-vinyl acetate copolymer film, and vinyl chloride-ethylene copolymer film. The form of such copolymers is not particularly limited and may be any of block copolymers, random copolymers, alternating copolymers, and graft copolymers. These films may also contain other resin components or additives.

 基材120の厚さは、特に限定されないが、支持性とロール巻回性の両立の観点から、好ましくは10μm以上、より好ましくは25μm以上、さらに好ましくは40μm以上であり、一方で好ましくは500μm以下、より好ましくは200μm以下、さらに好ましくは150μm以下、よりさらに好ましくは150μm以下、よりさらに好ましくは120μm以下、特に好ましくは90μm以下である。 The thickness of the substrate 120 is not particularly limited, but from the viewpoint of achieving both supportability and roll winding properties, it is preferably 10 μm or more, more preferably 25 μm or more, and even more preferably 40 μm or more, while it is preferably 500 μm or less, more preferably 200 μm or less, even more preferably 150 μm or less, even more preferably 150 μm or less, even more preferably 120 μm or less, and particularly preferably 90 μm or less.

 粘着シートの均一な拡張を容易とするため、基材120の引張弾性率は、好ましくは50MPa以上、より好ましくは80MPa以上、さらに好ましくは120MPa以上であり、好ましくは2500MPa以下、より好ましくは1000MPa以下、さらに好ましくは500MPa以下の範囲である。本明細書において、引張弾性率はJIS K7161-1:2014に従って測定される。 To facilitate uniform expansion of the adhesive sheet, the tensile modulus of the substrate 120 is preferably 50 MPa or more, more preferably 80 MPa or more, even more preferably 120 MPa or more, and preferably 2500 MPa or less, more preferably 1000 MPa or less, even more preferably 500 MPa or less. In this specification, the tensile modulus is measured in accordance with JIS K7161-1:2014.

 同様に、粘着シートの拡張を容易とするため、基材120の破断伸度は、好ましくは105%以上、より好ましくは110%以上、さらに好ましくは115%以上である。本明細書において、破断伸度は、JIS K 7127:1999に従って測定される。 Similarly, to facilitate expansion of the adhesive sheet, the breaking elongation of the substrate 120 is preferably 105% or more, more preferably 110% or more, and even more preferably 115% or more. In this specification, breaking elongation is measured in accordance with JIS K 7127:1999.

(粘着層)
 粘着層110は、粘着性を有する層である。前述のように、粘着層110はその表面に凹凸を有している。なお、粘着シートは、2層以上の粘着層110を有していてもよい。例えば、粘着シートは、1種類又は2種類以上の粘着層110の積層体を有していてもよい。
(adhesive layer)
The adhesive layer 110 is a layer having adhesive properties. As described above, the adhesive layer 110 has an uneven surface. The adhesive sheet may have two or more adhesive layers 110. For example, the adhesive sheet may have a laminate of one type or two or more types of adhesive layers 110.

 以下、粘着層110の組成例について説明する。もっとも、粘着層110の組成は以下に示すものには限定されない。 The following describes example compositions of the adhesive layer 110. However, the composition of the adhesive layer 110 is not limited to those shown below.

(樹脂)
 粘着層110は樹脂を含むことができる。粘着層110は、1種類の樹脂を含んでいてもよいし、2種類以上の樹脂を含んでいてもよい。粘着層110が含む樹脂の例としては、ポリイソブチレン系樹脂、ポリブタジエン系樹脂、及びスチレン・ブタジエン系樹脂等のゴム系樹脂、アクリル系樹脂、ウレタン系樹脂、ポリエステル系樹脂、オレフィン系樹脂、シリコーン系樹脂、及びポリビニルエーテル系樹脂等が挙げられる。粘着層は耐熱性を有していてもよく、このような耐熱性を有する粘着層110の材料としては、ポリイミド系樹脂及びシリコーン系樹脂が挙げられる。粘着層110は、2種類以上の構成単位を有する共重合体を含んでいてもよい。このような共重合体の形態は特に限定されず、ブロック共重合体、ランダム共重合体、交互共重合体、及びグラフト共重合体のいずれであってもよい。
(resin)
The adhesive layer 110 may contain a resin. The adhesive layer 110 may contain one type of resin, or two or more types of resins. Examples of resins contained in the adhesive layer 110 include rubber-based resins such as polyisobutylene-based resins, polybutadiene-based resins, and styrene-butadiene-based resins, acrylic-based resins, urethane-based resins, polyester-based resins, olefin-based resins, silicone-based resins, and polyvinyl ether-based resins. The adhesive layer may be heat-resistant, and examples of materials for the adhesive layer 110 that have such heat resistance include polyimide-based resins and silicone-based resins. The adhesive layer 110 may contain a copolymer having two or more types of structural units. The form of such a copolymer is not particularly limited, and may be any of a block copolymer, a random copolymer, an alternating copolymer, and a graft copolymer.

 粘着層110が含む樹脂は、単独で粘着性を有する粘着性樹脂であることが好ましい。一実施形態において、樹脂は、1万以上の質量平均分子量(Mw)を有する重合体である。樹脂の質量平均分子量(Mw)は、保持力向上の観点から、好ましくは1万以上、より好ましくは7万以上、さらに好ましくは14万以上である。また、貯蔵弾性率を所定値以下に抑える観点から、好ましくは200万以下、より好ましくは120万以下である。また、樹脂の数平均分子量(Mn)は、保持力向上の観点から、好ましくは1万以上、より好ましくは5万以上、さらに好ましくは10万以上である。また、貯蔵弾性率を所定値以下に抑える観点から、好ましくは200万以下、より好ましくは150万以下、さらに好ましくは120万以下である。本明細書において、エネルギー線反応性樹脂を含む粘着層110の質量平均分子量(Mw)及び数平均分子量(Mn)は、別記されていない限り、エネルギー線照射による架橋反応前の質量平均分子量(Mw)及び数平均分子量(Mn)を指す。 The resin contained in the adhesive layer 110 is preferably an adhesive resin that exhibits adhesive properties by itself. In one embodiment, the resin is a polymer having a mass average molecular weight (Mw) of 10,000 or more. From the viewpoint of improving holding power, the mass average molecular weight (Mw) of the resin is preferably 10,000 or more, more preferably 70,000 or more, and even more preferably 140,000 or more. From the viewpoint of maintaining the storage modulus at a predetermined value or less, it is preferably 2,000,000 or less, and more preferably 1,200,000 or less. From the viewpoint of improving holding power, the number average molecular weight (Mn) of the resin is preferably 10,000 or more, more preferably 50,000 or more, and even more preferably 100,000 or more. From the viewpoint of maintaining the storage modulus at a predetermined value or less, it is preferably 2,000,000 or less, more preferably 1,500,000 or less, and even more preferably 1,200,000 or less. In this specification, the mass average molecular weight (Mw) and number average molecular weight (Mn) of the adhesive layer 110 containing an energy ray-reactive resin refer to the mass average molecular weight (Mw) and number average molecular weight (Mn) before the crosslinking reaction due to energy ray irradiation, unless otherwise specified.

 また、樹脂のガラス転移温度(Tg)は、粘着層110による保持力向上の観点から、好ましくは-75℃以上、より好ましくは-70℃以上であり、好ましくは5℃以下、より好ましくは-20℃以下である。樹脂が2種以上の構成単位を有する場合には、その樹脂のガラス転移温度(Tg)は、Foxの式を用いて算出できる。このとき用いる、構成単位を誘導する単量体のTgとしては、高分子データ・ハンドブック、又は粘着ハンドブックに記載されている値を使用できる。 Furthermore, from the viewpoint of improving the holding power of the adhesive layer 110, the glass transition temperature (Tg) of the resin is preferably -75°C or higher, more preferably -70°C or higher, and preferably 5°C or lower, more preferably -20°C or lower. If the resin has two or more types of structural units, the glass transition temperature (Tg) of the resin can be calculated using the Fox formula. The Tg of the monomer from which the structural units are derived can be calculated using the value listed in the Polymer Data Handbook or the Adhesive Handbook.

 粘着層110を構成する成分の全量に対する、粘着層110が含む樹脂の量は、求められる粘着層110の粘着力に応じて適宜設定することができるが、好ましくは30質量%以上、より好ましくは50質量%以上、さらに好ましくは70質量%以上、さらに好ましくは80質量%以上、さらに好ましくは90質量%以上であり、好ましくは99.99質量%以下、より好ましくは99.95質量%以下、さらに好ましくは99.90質量%以下、さらに好ましくは99.80質量%以下、さらに好ましくは99.50質量%以下である。 The amount of resin contained in adhesive layer 110 relative to the total amount of components constituting adhesive layer 110 can be set appropriately depending on the desired adhesive strength of adhesive layer 110, but is preferably 30% by mass or more, more preferably 50% by mass or more, even more preferably 70% by mass or more, even more preferably 80% by mass or more, even more preferably 90% by mass or more, and is preferably 99.99% by mass or less, more preferably 99.95% by mass or less, even more preferably 99.90% by mass or less, even more preferably 99.80% by mass or less, even more preferably 99.50% by mass or less.

 一実施形態において、粘着層110が含む樹脂には、熱可塑性樹脂が含まれ得る。熱可塑性樹脂を用いる場合、加熱して樹脂を軟化させることにより粘着層110に凹凸を形成することが容易となり、また冷却により形成した凹凸形状を維持することが容易となる。熱可塑性樹脂の例としては、ゴム系樹脂、アクリル系樹脂、ウレタン系樹脂、及びオレフィン系樹脂等が挙げられる。一例としては、単量体としてブタジエンが用いられているポリブタジエン系熱可塑性エラストマー、単量体としてスチレンが用いられているスチレン系熱可塑性エラストマー、及び単量体として(メタ)アクリル酸又は(メタ)アクリル酸エステルが用いられているアクリル系熱可塑性エラストマーが挙げられる。 In one embodiment, the resin contained in the adhesive layer 110 may include a thermoplastic resin. When a thermoplastic resin is used, it becomes easy to form irregularities in the adhesive layer 110 by heating and softening the resin, and it also becomes easy to maintain the irregular shape formed by cooling. Examples of thermoplastic resins include rubber-based resins, acrylic-based resins, urethane-based resins, and olefin-based resins. Examples include polybutadiene-based thermoplastic elastomers that use butadiene as a monomer, styrene-based thermoplastic elastomers that use styrene as a monomer, and acrylic-based thermoplastic elastomers that use (meth)acrylic acid or a (meth)acrylic acid ester as a monomer.

 一実施形態において、粘着層110はエネルギー線反応性を有している。例えば、粘着層110は、樹脂に加えて、エネルギー線反応性の成分を有していてもよい。一方で、粘着層110は、エネルギー線反応性樹脂を含んでいてもよい。本明細書において、粘着層110がエネルギー線反応性を有しているとは、エネルギー線を照射することにより粘着層110の貯蔵弾性率が向上することを意味する。エネルギー線の種類は特に限定されず、例えば紫外線、電子線、又は電離放射線等が挙げられる。エネルギー線として好ましくは紫外線であり、すなわち粘着層110は好ましくは紫外線反応性を有している。 In one embodiment, the adhesive layer 110 is energy ray reactive. For example, the adhesive layer 110 may contain an energy ray reactive component in addition to a resin. Alternatively, the adhesive layer 110 may contain an energy ray reactive resin. In this specification, the adhesive layer 110 being energy ray reactive means that the storage modulus of the adhesive layer 110 is improved by irradiating it with energy rays. The type of energy ray is not particularly limited, and examples include ultraviolet rays, electron beams, and ionizing radiation. Ultraviolet rays are preferred as the energy ray, and therefore the adhesive layer 110 is preferably ultraviolet ray reactive.

 エネルギー線反応性の成分は、重合性官能基が導入された化合物でありうる。重合性官能基とは、エネルギー線の照射により架橋される官能基である。この重合性官能基としては、多重結合含有基、オキセタニル基、及びエポキシ基等が挙げられる。また、多重結合含有基の例としては、ビニル基及びアリル基等のアルケニル基、並びに(メタ)アクリロイル基のような二重結合含有基が挙げられる。このような重合性官能基の架橋は、適切な重合開始剤又は架橋剤の存在下で進行する。 The energy ray-reactive component can be a compound into which a polymerizable functional group has been introduced. A polymerizable functional group is a functional group that crosslinks upon irradiation with energy rays. Examples of such polymerizable functional groups include multiple bond-containing groups, oxetanyl groups, and epoxy groups. Examples of multiple bond-containing groups include alkenyl groups such as vinyl groups and allyl groups, and double bond-containing groups such as (meth)acryloyl groups. Crosslinking of such polymerizable functional groups proceeds in the presence of an appropriate polymerization initiator or crosslinking agent.

 エネルギー線反応性の成分は、上記のような重合性官能基が導入された、二官能性又は多官能性の単量体であってもよい。このような単量体の例としては、二官能(メタ)アクリレートのような多価(メタ)アクリレートが挙げられる。多価(メタ)アクリレートの具体的な例としては、トリシクロデカンジメタノールジアクリレートのような、シクロアルキルジ(メタ)アクリレートが挙げられる。 The energy ray-reactive component may be a difunctional or polyfunctional monomer into which a polymerizable functional group such as those described above has been introduced. Examples of such monomers include polyfunctional (meth)acrylates such as difunctional (meth)acrylates. Specific examples of polyfunctional (meth)acrylates include cycloalkyl di(meth)acrylates such as tricyclodecane dimethanol diacrylate.

 エネルギー線反応性樹脂は、エネルギー線を照射することにより貯蔵弾性率が向上する樹脂のことを指す。エネルギー線反応性樹脂は、エネルギー線硬化性樹脂でありうる。なお、本明細書において、エネルギー線を照射したことにより既に貯蔵弾性率が向上しており、さらにエネルギー線を照射しても貯蔵弾性率が向上しない樹脂(例えば、硬化完了後の紫外線硬化性樹脂)は、エネルギー線反応性樹脂には含まれない。 An energy ray reactive resin refers to a resin whose storage modulus improves when irradiated with energy rays. An energy ray reactive resin may be an energy ray curable resin. Note that in this specification, resins whose storage modulus has already improved through irradiation with energy rays and whose storage modulus does not improve even when further irradiated with energy rays (for example, ultraviolet curable resins after curing has been completed) are not included in the term energy ray reactive resin.

 エネルギー線反応性樹脂は、例えば、エネルギー線硬化性基を有する重合体である。この重合体は、共重合体であってもよい。また、この重合体は、エネルギー線硬化性基を有する側鎖を有していてもよい。エネルギー線硬化性基の例としては、上記の多重結合含有基、オキセタニル基、及びエポキシ基等が挙げられる。エネルギー線硬化性基の好ましい例としては、ビニル基及びアリル基等のアルケニル基、並びに(メタ)アクリロイル基のような炭素-炭素二重結合含有基が挙げられる。このようなエネルギー線反応性樹脂にエネルギー線を照射することにより、重合体のエネルギー線硬化性基を互いに架橋させることができる。一実施形態において、エネルギー線硬化性基は紫外線硬化性基である。 The energy ray reactive resin is, for example, a polymer having an energy ray curable group. This polymer may be a copolymer. Furthermore, this polymer may have a side chain having an energy ray curable group. Examples of the energy ray curable group include the above-mentioned multiple bond-containing groups, oxetanyl groups, and epoxy groups. Preferred examples of the energy ray curable group include alkenyl groups such as vinyl groups and allyl groups, and carbon-carbon double bond-containing groups such as (meth)acryloyl groups. By irradiating such an energy ray reactive resin with energy rays, the energy ray curable groups of the polymer can be crosslinked to each other. In one embodiment, the energy ray curable group is an ultraviolet ray curable group.

 このように、粘着層110がエネルギー線反応性樹脂を有する場合、粘着層110が樹脂とエネルギー線反応性成分との組み合わせを有する場合と比較して、エネルギー線を照射した際に粘着層110の貯蔵弾性率がより向上しやすくなる。また、エネルギー線照射前における粘着層110における物体の保持力と、エネルギー線照射後における粘着層110における物体の易剥離性とをともに達成することが容易となる。また、粘着層110がエネルギー線反応性樹脂を有することにより、粘着層110の凹凸形状の保持性を高めながら、エネルギー線照射前の粘着力を高く保つことがより容易となる。 In this way, when the adhesive layer 110 contains an energy ray reactive resin, the storage modulus of the adhesive layer 110 is more likely to improve when irradiated with energy rays, compared to when the adhesive layer 110 contains a combination of a resin and an energy ray reactive component. It also becomes easier to achieve both the adhesive layer 110's ability to hold an object before energy ray irradiation and the adhesive layer 110's ability to easily peel an object after energy ray irradiation. Furthermore, by having the adhesive layer 110 contain an energy ray reactive resin, it becomes easier to maintain high adhesive strength before energy ray irradiation while improving the ability of the adhesive layer 110 to retain the uneven shape.

 一実施形態において、粘着層110の主成分はエネルギー線反応性樹脂である。硬化後の粘着力を低下させる観点から、粘着層110を構成する成分の全量に対する、エネルギー線硬化性基を有する重合体の含有量は、70質量%以上であることが好ましく、80質量%であることがより好ましく、90質量%以上であることがさらに好ましく、一方で100質量%以下であり、99質量%以上であることがより好ましく、98質量%以下であることがさらに好ましい。 In one embodiment, the main component of the adhesive layer 110 is an energy ray reactive resin. From the viewpoint of reducing adhesive strength after curing, the content of the polymer having an energy ray curable group relative to the total amount of components constituting the adhesive layer 110 is preferably 70% by mass or more, more preferably 80% by mass or more, and even more preferably 90% by mass or more, and is 100% by mass or less, more preferably 99% by mass or more, and even more preferably 98% by mass or less.

(エネルギー線反応性を有するアクリル酸エステル共重合体)
 一実施形態において、粘着層110はアクリル酸エステル共重合体を含む。アクリル酸エステル共重合体とは、(メタ)アクリル酸エステルを構成単位として有する共重合体である。このアクリル酸エステル共重合体は、エネルギー線反応性を有することができる。
(Energy ray reactive acrylate copolymer)
In one embodiment, the adhesive layer 110 includes an acrylic acid ester copolymer. The acrylic acid ester copolymer is a copolymer having a (meth)acrylic acid ester as a structural unit. This acrylic acid ester copolymer may have energy ray reactivity.

 (メタ)アクリル酸エステルとしては、例えば、メチル(メタ)アクリレート、エチル(メタ)アクリレート、n-プロピル(メタ)アクリレート、イソプロピル(メタ)アクリレート、n-ブチル(メタ)アクリレート、イソブチル(メタ)アクリレート、sec-ブチル(メタ)アクリレート、tert-ブチル(メタ)アクリレート、ペンチル(メタ)アクリレート、ヘキシル(メタ)アクリレート、へプチル(メタ)アクリレート、2-エチルヘキシル(メタ)アクリレート、イソオクチル(メタ)アクリレート、n-オクチル(メタ)アクリレート、n-ノニル(メタ)アクリレート、イソノニル(メタ)アクリレート、デシル(メタ)アクリレート、ウンデシル(メタ)アクリレート、ラウリル(メタ)アクリレート、トリデシル(メタ)アクリレート、ミリスチル(メタ)アクリレート、ペンタデシル(メタ)アクリレート、パルミチル(メタ)アクリレート、へプタデシル(メタ)アクリレート、ステアリル(メタ)アクリレート等の、アルキルエステルを構成するアルキル基が、炭素数が1~18の鎖状構造である(メタ)アクリル酸アルキルエステル;イソボルニル(メタ)アクリレート、ジシクロペンタニル(メタ)アクリレート等の(メタ)アクリル酸シクロアルキルエステル;ベンジル(メタ)アクリレート等の(メタ)アクリル酸アラルキルエステル;ジシクロペンテニル(メタ)アクリレート等の(メタ)アクリル酸シクロアルケニルエステル;ジシクロペンテニルオキシエチル(メタ)アクリレート等の(メタ)アクリル酸シクロアルケニルオキシアルキルエステル;イミド(メタ)アクリレート;グリシジル(メタ)アクリレート等のグリシジル基含有(メタ)アクリル酸エステル;ヒドロキシメチル(メタ)アクリレート、2-ヒドロキシエチル(メタ)アクリレート、2-ヒドロキシプロピル(メタ)アクリレート、3-ヒドロキシプロピル(メタ)アクリレート、2-ヒドロキシブチル(メタ)アクリレート、3-ヒドロキシブチル(メタ)アクリレート、4-ヒドロキシブチル(メタ)アクリレート等のヒドロキシ基含有(メタ)アクリル酸エステル;N-メチルアミノエチル(メタ)アクリレート等の置換アミノ基含有(メタ)アクリル酸エステル等が挙げられる。ここで、「置換アミノ基」とは、アミノ基の1個又は2個の水素原子が水素原子以外の基で置換された構造を有する基を意味する。アクリル酸エステル共重合体が、アクリル酸エステルとメタクリル酸エステルとの共重合体であってもよい。 (Meth)acrylic acid esters include, for example, methyl (meth)acrylate, ethyl (meth)acrylate, n-propyl (meth)acrylate, isopropyl (meth)acrylate, n-butyl (meth)acrylate, isobutyl (meth)acrylate, sec-butyl (meth)acrylate, tert-butyl (meth)acrylate, pentyl (meth)acrylate, hexyl (meth)acrylate, heptyl (meth)acrylate, 2-ethylhexyl (meth)acrylate, isooctyl (meth)acrylate, n- (Meth)acrylic acid acrylates in which the alkyl group constituting the alkyl ester has a chain structure having 1 to 18 carbon atoms, such as octyl (meth)acrylate, n-nonyl (meth)acrylate, isononyl (meth)acrylate, decyl (meth)acrylate, undecyl (meth)acrylate, lauryl (meth)acrylate, tridecyl (meth)acrylate, myristyl (meth)acrylate, pentadecyl (meth)acrylate, palmityl (meth)acrylate, heptadecyl (meth)acrylate, and stearyl (meth)acrylate. (meth)acrylic acid cycloalkenyl esters such as dicyclopentenyl (meth)acrylate; (meth)acrylic acid cycloalkenyloxyalkyl esters such as dicyclopentenyloxyethyl (meth)acrylate; imide (meth)acrylate; glycidyl group-containing (meth)acrylic acid esters such as glycidyl (meth)acrylate; hydroxy group-containing (meth)acrylic acid esters such as hydroxymethyl (meth)acrylate, 2-hydroxyethyl (meth)acrylate, 2-hydroxypropyl (meth)acrylate, 3-hydroxypropyl (meth)acrylate, 2-hydroxybutyl (meth)acrylate, 3-hydroxybutyl (meth)acrylate, 4-hydroxybutyl (meth)acrylate; and substituted amino group-containing (meth)acrylic acid esters such as N-methylaminoethyl (meth)acrylate. Here, "substituted amino group" refers to a group having a structure in which one or two hydrogen atoms of an amino group have been substituted with a group other than a hydrogen atom. The acrylic acid ester copolymer may be a copolymer of an acrylic acid ester and a methacrylic acid ester.

 エネルギー線反応性を有するアクリル酸エステル共重合体は、エネルギー線硬化性基含有単量体を構成単位として有することができる。例えば、アクリル酸エステル共重合体は、上記のようなエネルギー線硬化性基を有する側鎖を有していてもよい。エネルギー線硬化性基含有単量体の例としては、エネルギー線硬化性基を有する(メタ)アクリル酸エステル単量体が挙げられる。エネルギー線硬化性基を有する(メタ)アクリル酸エステル単量体の例としては、ヒドロキシ基を介して、側鎖に炭素-炭素二重結合含有基のようなエネルギー線硬化性基を有する(メタ)アクリル酸エステル単量体が挙げられる。例えば、アクリル酸エステル共重合体が、エネルギー線硬化性基を有するアクリル酸エステルと、エネルギー線硬化性基を有さないアクリル酸エステルと、エネルギー線硬化性基を有さないメタクリル酸エステルとの共重合体であってもよい。 An acrylic acid ester copolymer having energy ray reactivity can have an energy ray-curable group-containing monomer as a constituent unit. For example, the acrylic acid ester copolymer may have a side chain having an energy ray-curable group as described above. An example of an energy ray-curable group-containing monomer is a (meth)acrylic acid ester monomer having an energy ray-curable group. An example of a (meth)acrylic acid ester monomer having an energy ray-curable group is a (meth)acrylic acid ester monomer having an energy ray-curable group, such as a carbon-carbon double bond-containing group, in the side chain via a hydroxy group. For example, the acrylic acid ester copolymer may be a copolymer of an acrylic acid ester having an energy ray-curable group, an acrylic acid ester not having an energy ray-curable group, and a methacrylic acid ester not having an energy ray-curable group.

 アクリル酸エステル共重合体は、架橋された重合体であってもよい。上述のように、粘着層110は表面に凹凸を有している。このため、粘着層110は、エネルギー線照射前においても、表面の凹凸を維持できる程度の貯蔵弾性率を有することが望ましい。アクリル酸エステル共重合体として架橋された重合体を用いることにより、粘着層110表面の凹凸を維持しやすくなる。 The acrylic acid ester copolymer may be a cross-linked polymer. As described above, the adhesive layer 110 has an uneven surface. For this reason, it is desirable that the adhesive layer 110 has a storage modulus that is sufficient to maintain the uneven surface even before energy beam irradiation. By using a cross-linked polymer as the acrylic acid ester copolymer, it becomes easier to maintain the uneven surface of the adhesive layer 110.

 例えば、アクリル酸エステル共重合体は、他の単量体と架橋された単量体を構成単位として有することができる。具体例として、(メタ)アクリル酸エステル単量体は、ヒドロキシ基を介して他の(メタ)アクリル酸エステル単量体と架橋されていてもよい。また、アクリル酸エステル共重合体が有する2つの(メタ)アクリル酸エステル単量体が互いにウレタン架橋されていてもよい。このように、アクリル酸エステル共重合体は、(メタ)アクリル酸エステル単量体であるエネルギー線硬化性基含有単量体に加えて、他の(メタ)アクリル酸エステル単量体と架橋された(メタ)アクリル酸エステル単量体を有していてもよい。アクリル酸エステル共重合体の好ましい例としては、エネルギー線硬化性基を有するアクリル酸エステルと、他のアクリル酸エステル単量体と架橋されたアクリル酸エステルと、(メタ)アクリル酸アルキルエステルとの共重合体が挙げられる。 For example, an acrylic acid ester copolymer may have, as a structural unit, a monomer crosslinked with another monomer. Specifically, a (meth)acrylic acid ester monomer may be crosslinked with another (meth)acrylic acid ester monomer via a hydroxy group. Furthermore, two (meth)acrylic acid ester monomers contained in an acrylic acid ester copolymer may be urethane-crosslinked with each other. Thus, an acrylic acid ester copolymer may contain, in addition to an energy ray-curable group-containing (meth)acrylic acid ester monomer, a (meth)acrylic acid ester monomer crosslinked with another (meth)acrylic acid ester monomer. A preferred example of an acrylic acid ester copolymer is a copolymer of an acrylic acid ester having an energy ray-curable group, an acrylic acid ester crosslinked with another acrylic acid ester monomer, and an alkyl (meth)acrylate ester.

 アクリル酸エステル共重合体は、エネルギー線硬化性基含有単量体及び他の単量体と架橋された単量体以外の(メタ)アクリル酸エステル単量体を含んでいてもよい。また、アクリル酸エステル共重合体は、(メタ)アクリル酸エステル以外の単量体を含んでいてもよい。例えば、アクリル酸エステル共重合体は、(メタ)アクリル酸エステル以外に、イタコン酸、酢酸ビニル、アクリロニトリル、スチレン、及びN-メチロールアクリルアミド等から選択される1種又は2種以上の単量体を構成単位として有していてもよい。アクリル酸エステル共重合体を構成する単量体の組み合わせ及び比率は、求められる粘着層110の性質に応じて選択できる。 The acrylic acid ester copolymer may contain (meth)acrylic acid ester monomers other than the energy ray-curable group-containing monomer and the monomer crosslinked with other monomers. The acrylic acid ester copolymer may also contain monomers other than (meth)acrylic acid ester. For example, the acrylic acid ester copolymer may have, in addition to (meth)acrylic acid ester, one or more monomers selected from itaconic acid, vinyl acetate, acrylonitrile, styrene, N-methylolacrylamide, etc. as structural units. The combination and ratio of monomers constituting the acrylic acid ester copolymer can be selected depending on the desired properties of the adhesive layer 110.

 エネルギー線反応性を有するアクリル酸エステル共重合体は、エネルギー線硬化性基含有単量体を用いた重合反応により調製することができる。また、エネルギー線反応性を有するアクリル酸エステル共重合体は、アクリル酸エステル共重合体に対してエネルギー線硬化性基を導入する修飾を行うことにより調製することができる。 An acrylic ester copolymer having reactivity to energy rays can be prepared by a polymerization reaction using a monomer containing an energy ray-curable group. Alternatively, an acrylic ester copolymer having reactivity to energy rays can be prepared by modifying the acrylic ester copolymer to introduce an energy ray-curable group.

 例えば、修飾される材料として、エネルギー線硬化性基を導入可能な単量体を有するアクリル酸エステル共重合体を用いることができる。エネルギー線硬化性基を導入可能な(メタ)アクリル酸エステル単量体は、例えば、ヒドロキシ基のような特定の官能基を有する(メタ)アクリル酸エステル単量体でありうる。一実施形態において、修飾されるアクリル酸エステル共重合体は、構成単位としてヒドロキシ基含有アクリル酸エステルを含んでいる。 For example, the material to be modified can be an acrylic acid ester copolymer having a monomer into which an energy ray-curable group can be introduced. The (meth)acrylic acid ester monomer into which an energy ray-curable group can be introduced can be, for example, a (meth)acrylic acid ester monomer having a specific functional group such as a hydroxy group. In one embodiment, the acrylic acid ester copolymer to be modified contains a hydroxy group-containing acrylic acid ester as a constituent unit.

 このようなアクリル酸エステル共重合体に対してエネルギー線硬化性基導入剤を反応させることにより、(メタ)アクリル酸エステル単量体にエネルギー線硬化性基を導入することができる。エネルギー線硬化性基導入剤としては、特定の官能基と結合を形成する官能基と、エネルギー線硬化性基と、を有する化合物を用いることができる。例えば、エネルギー線硬化性基導入剤は、2-イソシアナトエチルメタクリレートのような、イソシアネート基及びエネルギー線硬化性基を有する化合物でありうる。このような化合物を用いることにより、(メタ)アクリル酸エステル単量体が有するヒドロキシ基を介して、(メタ)アクリル酸エステル単量体にエネルギー線硬化性基を導入することができる。 By reacting such an acrylic acid ester copolymer with an energy ray-curable group-introducing agent, it is possible to introduce an energy ray-curable group into the (meth)acrylic acid ester monomer. The energy ray-curable group-introducing agent can be a compound having an energy ray-curable group and a functional group that forms a bond with a specific functional group. For example, the energy ray-curable group-introducing agent can be a compound having an isocyanate group and an energy ray-curable group, such as 2-isocyanatoethyl methacrylate. By using such a compound, it is possible to introduce an energy ray-curable group into the (meth)acrylic acid ester monomer via the hydroxy group possessed by the (meth)acrylic acid ester monomer.

 ここで、アクリル酸エステル共重合体中の、エネルギー線硬化性基を導入可能な単量体の共重合率をR%とする。ここで、共重合率は、アクリル酸エステル共重合体が有する全単量体に対する、エネルギー線硬化性基を導入可能な単量体のモル比を示す。また、エネルギー線硬化性基を導入可能な単量体に対する、エネルギー線硬化性基導入剤の当量をR%とする。ここで、当量は、アクリル酸エステル共重合体が有する、エネルギー線硬化性基導入剤と反応する置換基に対する、添加するエネルギー線硬化性基導入剤のモル比を示す。エネルギー線硬化性基を導入可能な単量体が、エネルギー線硬化性基導入剤と反応する1つのヒドロキシ基を有する場合、R%は、アクリル酸エステル共重合体が有する、ヒドロキシ基を有する単量体に対する、添加するエネルギー線硬化性基導入剤のモル比を示す。ただし、本明細書において、Rの上限は100%とする。すなわち、エネルギー線硬化性基を導入可能な単量体に対して過剰量のエネルギー線硬化性基導入剤が用いられる場合、Rは100%と定義する。 Here, the copolymerization rate of the monomer capable of introducing an energy ray-curable group in the acrylic ester copolymer is defined as RA %. Here, the copolymerization rate indicates the molar ratio of the monomer capable of introducing an energy ray-curable group to all monomers contained in the acrylic ester copolymer. Furthermore, the equivalent of the energy ray-curable group-introducing agent relative to the monomer capable of introducing an energy ray-curable group is defined as RB %. Here, the equivalent indicates the molar ratio of the energy ray-curable group-introducing agent to be added relative to the substituent contained in the acrylic ester copolymer that reacts with the energy ray-curable group-introducing agent. When the monomer capable of introducing an energy ray-curable group has one hydroxy group that reacts with the energy ray-curable group-introducing agent, RB % indicates the molar ratio of the energy ray-curable group-introducing agent to be added relative to the monomer having a hydroxy group contained in the acrylic ester copolymer. However, in this specification, the upper limit of RB is 100%. That is, when an excess amount of the energy ray-curable group-introducing agent is used relative to the amount of the monomer capable of introducing an energy ray-curable group, R 2 B is defined as 100%.

 R%とR%との積は、エネルギー線硬化性基を導入可能な単量体と、エネルギー線硬化性基導入剤とが完全に反応した場合における、アクリル酸エステル共重合体中の、エネルギー線硬化性基が導入された単量体の共重合率を示す。一実施形態において、エネルギー線照射後の粘着層110における物体保持力を十分に低下させる観点から、R%とR%との積は23.0%以上であり、24.0%以上であることがより好ましく、25.0%以上であることがさらに好ましい。一方で、一実施形態において、エネルギー線照射後の粘着層110における物体の位置ずれを抑制する観点から、R%とR%との積は50.0%以下であり、40.0%以下であることがより好ましく、30.0%以下であることがさらに好ましく、27.0%以下であることが特に好ましい。 The product of RA % and RB % indicates the copolymerization rate of the monomer into which the energy ray curable group has been introduced in the acrylic acid ester copolymer when the monomer capable of introducing an energy ray curable group and the energy ray curable group introducing agent have completely reacted. In one embodiment, from the viewpoint of sufficiently reducing the object retention force in the adhesive layer 110 after energy ray irradiation, the product of RA% and RB % is 23.0% or more, more preferably 24.0% or more, and even more preferably 25.0% or more. On the other hand, in one embodiment, from the viewpoint of suppressing the positional displacement of the object in the adhesive layer 110 after energy ray irradiation, the product of RA % and RB % is 50.0% or less, more preferably 40.0% or less, even more preferably 30.0% or less, and particularly preferably 27.0% or less.

 ここで、エネルギー線照射後の粘着層110における物体保持力を十分に低下させる観点から、R%は10%以上であることが好ましく、15%以上であることがより好ましく、20%以上であることがさらに好ましく、25%以上であることが特に好ましい。一方で、エネルギー線照射前の粘着層110における物体保持力を十分に高める観点から、R%は50%以下であることが好ましく、40%以下であることがより好ましく、30%以下であることがさらに好ましい。 Here, from the viewpoint of sufficiently reducing the object retention force of the adhesive layer 110 after energy ray irradiation, RA % is preferably 10% or more, more preferably 15% or more, even more preferably 20% or more, and particularly preferably 25% or more. On the other hand, from the viewpoint of sufficiently increasing the object retention force of the adhesive layer 110 before energy ray irradiation, RA % is preferably 50% or less, more preferably 40% or less, and even more preferably 30% or less.

 また、エネルギー線照射後の粘着層110における物体保持力を十分に低下させる観点から、R%は50%以上であることが好ましく、65%以上であることがより好ましく、75%以上であることがさらに好ましい。一方で、R%は100%以下である。 Furthermore, from the viewpoint of sufficiently reducing the object-retaining force of the adhesive layer 110 after energy ray irradiation, R B % is preferably 50% or more, more preferably 65% or more, and even more preferably 75% or more. On the other hand, R B % is 100% or less.

 また、架橋されたアクリル酸エステル共重合体は、アクリル酸エステル共重合体の単量体同士を架橋する修飾を行うことにより得ることができる。例えば、修飾される材料として、架橋剤と反応可能な単量体を有するアクリル酸エステル共重合体を用いることができる。架橋剤と反応可能な単量体は、例えば、ヒドロキシ基のような特定の官能基を有する(メタ)アクリル酸エステル単量体でありうる。このようなアクリル酸エステル共重合体に対して架橋剤を反応させることにより、(メタ)アクリル酸エステル単量体同士を互いに架橋することができる。 Furthermore, cross-linked acrylic acid ester copolymers can be obtained by modifying the acrylic acid ester copolymer to cross-link its monomers. For example, the material to be modified can be an acrylic acid ester copolymer having a monomer capable of reacting with a cross-linking agent. The monomer capable of reacting with the cross-linking agent can be, for example, a (meth)acrylic acid ester monomer having a specific functional group such as a hydroxy group. By reacting such an acrylic acid ester copolymer with a cross-linking agent, the (meth)acrylic acid ester monomers can be cross-linked to each other.

 架橋剤としては、特定の官能基と結合を形成する官能基を2つ以上有する化合物を用いることができる。架橋剤の例としては、イソシアネート系架橋剤、エポキシ系架橋剤、アジリジン系架橋剤、及び金属キレート系架橋剤等が挙げられる。架橋剤として、熱処理により架橋反応を引き起こす熱架橋剤を用いてもよい。これらの架橋剤は、1種を単独で用いてもよく、2種以上を併用してもよい。 As a crosslinking agent, a compound having two or more functional groups that form bonds with specific functional groups can be used. Examples of crosslinking agents include isocyanate-based crosslinking agents, epoxy-based crosslinking agents, aziridine-based crosslinking agents, and metal chelate-based crosslinking agents. A thermal crosslinking agent that induces a crosslinking reaction by heat treatment may also be used as a crosslinking agent. These crosslinking agents may be used alone or in combination of two or more types.

 これらの架橋剤の中でも、凝集力を高めて凹凸形状を維持する観点、及び入手し易さ等の観点から、イソシアネート系架橋剤が好ましい。イソシアネート系架橋剤を用いることにより、(メタ)アクリル酸エステル単量体が有するヒドロキシ基同士を架橋することができる。イソシアネート系架橋剤としては、例えば、トリレンジイソシアネート、ジフェニルメタンジイソシアネート、キシリレンジイソシアネート等の芳香族ポリイソシアネート;ジシクロヘキシルメタン-4,4’-ジイソシアネート、ビシクロヘプタントリイソシアネート、シクロペンチレンジイソシアネート、シクロヘキシレンジイソシアネート、メチルシクロヘキシレンジイソシアネート、メチレンビス(シクロヘキシルイソシアネート)、3-イソシアネートメチル-3,5,5-トリメチルシクロヘキシルイソシアネート、水添キシリレンジイソシアネート等の脂環式ポリイソシアネート;ヘキサメチレンジイソシアネート、トリメチルヘキサメチレンジイソシアネート、リジンジイソシアネート等の非環式脂肪族ポリイソシアネート;等の多価イソシアネート化合物等が挙げられる。また、イソシアネート系架橋剤としては、当該多価イソシアネート化合物のトリメチロールプロパンアダクト型変性体、水と反応させたビュウレット型変性体、イソシアヌレート型のヘキサメチレンジイソシアネートのような、イソシアヌレート環を含むイソシアヌレート型変性体等も挙げられる。 Among these crosslinking agents, isocyanate-based crosslinking agents are preferred from the viewpoints of increasing cohesive strength and maintaining the uneven shape, as well as ease of availability. By using an isocyanate-based crosslinking agent, it is possible to crosslink the hydroxy groups in the (meth)acrylic acid ester monomers. Examples of the isocyanate crosslinking agent include aromatic polyisocyanates such as tolylene diisocyanate, diphenylmethane diisocyanate, and xylylene diisocyanate; alicyclic polyisocyanates such as dicyclohexylmethane-4,4'-diisocyanate, bicycloheptane triisocyanate, cyclopentylene diisocyanate, cyclohexylene diisocyanate, methylcyclohexylene diisocyanate, methylenebis(cyclohexyl isocyanate), 3-isocyanatomethyl-3,5,5-trimethylcyclohexyl isocyanate, and hydrogenated xylylene diisocyanate; and polyvalent isocyanate compounds such as acyclic aliphatic polyisocyanates such as hexamethylene diisocyanate, trimethylhexamethylene diisocyanate, and lysine diisocyanate. Further examples of isocyanate-based crosslinking agents include trimethylolpropane adduct-type modified products of the polyisocyanate compounds, biuret-type modified products obtained by reacting them with water, and isocyanurate-type modified products containing an isocyanurate ring, such as isocyanurate-type hexamethylene diisocyanate.

 この際に用いる架橋剤の量は特に限定されず、例えば修飾前の共重合体が有する架橋剤と反応可能な単量体に対して過剰量であってもよい。一実施形態において、修飾前の共重合体100質量部に対するイソシアネート系架橋剤の量は、粘着層110の表面の凹凸形状を維持する観点から、1.5質量部以上であることが好ましく、2質量部以上であることがより好ましく、2.5質量部以上であることがさらに好ましい。また、粘着層110による物体保持力を高める観点から、20質量部以下であることが好ましく、15質量部以下であることがより好ましく、10質量部以下であることがさらに好ましい。 The amount of crosslinking agent used in this case is not particularly limited, and may be, for example, an excess amount relative to the monomer capable of reacting with the crosslinking agent contained in the copolymer before modification. In one embodiment, the amount of isocyanate-based crosslinking agent per 100 parts by mass of the copolymer before modification is preferably 1.5 parts by mass or more, more preferably 2 parts by mass or more, and even more preferably 2.5 parts by mass or more, from the viewpoint of maintaining the uneven shape of the surface of the adhesive layer 110. Furthermore, from the viewpoint of increasing the object retention force of the adhesive layer 110, it is preferably 20 parts by mass or less, more preferably 15 parts by mass or less, and even more preferably 10 parts by mass or less.

 さらに、エネルギー線反応性を有し、かつ架橋されたアクリル酸エステル共重合体は、エネルギー線硬化性基を導入可能な単量体と、架橋剤と反応可能な単量体と、を有するアクリル酸エステル共重合体を修飾することにより作製することができる。また、エネルギー線反応性を有し、かつ架橋されたアクリル酸エステル共重合体は、エネルギー線硬化性基を導入可能であり、かつ架橋剤と反応可能な単量体を有するアクリル酸エステル共重合体を修飾することにより作製することができる。この場合、まず、修飾前の共重合体が有する単量体の一部にエネルギー線硬化性基を導入する修飾を行うことにより、エネルギー線硬化性基が導入された単量体と、架橋剤と反応可能な単量体と、を有するアクリル酸エステル共重合体を調製することができる。さらに、このアクリル酸エステル共重合体に対して、単量体の他の一部を架橋する修飾を行うことにより、エネルギー線反応性を有し、かつ架橋されたアクリル酸エステル共重合体を調製することができる。 Furthermore, an energy ray-reactive and crosslinked acrylic ester copolymer can be prepared by modifying an acrylic ester copolymer having a monomer into which an energy ray-curable group can be introduced and a monomer capable of reacting with a crosslinking agent. Also, an energy ray-reactive and crosslinked acrylic ester copolymer can be prepared by modifying an acrylic ester copolymer having a monomer into which an energy ray-curable group can be introduced and a monomer capable of reacting with a crosslinking agent. In this case, first, an acrylic ester copolymer having a monomer into which an energy ray-curable group has been introduced and a monomer capable of reacting with a crosslinking agent can be prepared by first modifying the acrylic ester copolymer to introduce an energy ray-curable group into some of the monomers contained in the unmodified copolymer. Furthermore, an energy ray-reactive and crosslinked acrylic ester copolymer can be prepared by further modifying the acrylic ester copolymer to crosslink the other part of the monomers.

 例えば、このようなアクリル酸エステル共重合体は、ヒドロキシ基を有する単量体を有するアクリル酸エステル共重合体を修飾することにより作製することができる。まず、修飾前の共重合体が有するヒドロキシ基よりも少ない当量の、炭素-炭素二重結合含有基を有するイソシアネート化合物を用いて、ヒドロキシ基の一部を修飾することができる。さらに、ポリイソシアネート化合物のようなイソシアネート系架橋剤を用いて、ヒドロキシ基の他の一部をウレタン架橋することができる。この場合、修飾後の共重合体において、単量体の一部が有するヒドロキシ基はウレタン結合を介して炭素-炭素二重結合含有基を有するように修飾されている。また、修飾後の共重合体において、単量体の他の一部が有するヒドロキシ基はウレタン架橋を形成するように修飾されている。 For example, such an acrylic ester copolymer can be prepared by modifying an acrylic ester copolymer having a monomer with a hydroxy group. First, some of the hydroxy groups can be modified using an isocyanate compound having a carbon-carbon double bond-containing group in an equivalent amount less than the hydroxy groups in the copolymer before modification. Furthermore, another portion of the hydroxy groups can be urethane-crosslinked using an isocyanate-based crosslinking agent such as a polyisocyanate compound. In this case, in the modified copolymer, the hydroxy groups in some of the monomers have been modified to have a carbon-carbon double bond-containing group via a urethane bond. Furthermore, in the modified copolymer, the hydroxy groups in the other portion of the monomers have been modified to form urethane crosslinks.

 この場合、エネルギー線硬化性基を導入可能な単量体に対する、エネルギー線硬化性基導入剤の当量R%は、エネルギー線照射後の粘着層110における物体保持力を十分に低下させる観点から、50%以上であることが好ましく、65%以上であることがより好ましく、75%以上であることがさらに好ましい。一方で、エネルギー線照射前の粘着層110の凹凸形状を維持しやすくする観点から、99%以下であることが好ましく、96%以下であることがより好ましく、93%以下であることがさらに好ましい。 In this case, the equivalent R B % of the energy ray-curable group introducing agent relative to the monomer capable of introducing an energy ray-curable group is preferably 50% or more, more preferably 65% or more, and even more preferably 75% or more from the viewpoint of sufficiently reducing the object retention force of the adhesive layer 110 after energy ray irradiation. On the other hand, from the viewpoint of easily maintaining the uneven shape of the adhesive layer 110 before energy ray irradiation, it is preferably 99% or less, more preferably 96% or less, and even more preferably 93% or less.

 上記のように、一実施形態において、粘着層110はアクリル酸エステル共重合体を含む。一実施形態に係るアクリル酸エステル共重合体中の、エネルギー線硬化性基含有単量体の共重合率は23.0%以上50.0%以下である。本明細書において、アクリル酸エステル共重合体中の、エネルギー線硬化性基含有単量体の共重合率は、原料組成に基づいて定義され、具体的には上述のR%とR%との積によって表される。アクリル酸エステル共重合体中の、エネルギー線硬化性基含有単量体の共重合率の好ましい範囲は、R%とR%との積の好ましい範囲として上述した通りである。 As described above, in one embodiment, the adhesive layer 110 includes an acrylic ester copolymer. In the acrylic ester copolymer according to one embodiment, the copolymerization rate of the energy ray-curable group-containing monomer is 23.0% or more and 50.0% or less. In this specification, the copolymerization rate of the energy ray-curable group-containing monomer in the acrylic ester copolymer is defined based on the raw material composition, and is specifically represented by the product of the above-mentioned RA % and RB %. The preferred range of the copolymerization rate of the energy ray-curable group-containing monomer in the acrylic ester copolymer is the same as the preferred range of the product of RA % and RB % described above.

 なお、エネルギー線硬化性基を導入可能な単量体と、エネルギー線硬化性基導入剤との反応が完全に進行せず、未反応のエネルギー線硬化性基導入剤が粘着層110に含まれる可能性がある。一実施形態において、アクリル酸エステル共重合体中の、エネルギー線硬化性基含有単量体の実際の共重合率は、23.0%以上50.0%以下である。一実施形態において、エネルギー線照射後の粘着層110における物体保持力を十分に低下させる観点から、実際の共重合率は24.0%以上であることがより好ましく、25.0%以上であることがさらに好ましい。一方で、エネルギー線照射後の粘着層110における物体の位置ずれを抑制する観点から、実際の共重合率は40.0%以下であることがより好ましく、30.0%以下であることがさらに好ましく、27.0%以下であることが特に好ましい。ここで、アクリル酸エステル共重合体中の、エネルギー線硬化性基含有単量体の実際の共重合率は、アクリル酸エステル共重合体が有する全単量体に対する、エネルギー線硬化性基を有する単量体のモル比を示す。このような実際の共重合率は、例えばNMR又は熱分解GC/MSにより測定することができる。 It is possible that the reaction between the monomer capable of introducing an energy ray-curable group and the energy ray-curable group-introducing agent may not proceed completely, resulting in unreacted energy ray-curable group-introducing agent being contained in the adhesive layer 110. In one embodiment, the actual copolymerization rate of the energy ray-curable group-containing monomer in the acrylic ester copolymer is 23.0% or more and 50.0% or less. In one embodiment, from the viewpoint of sufficiently reducing the object-retaining force of the adhesive layer 110 after energy ray irradiation, the actual copolymerization rate is more preferably 24.0% or more, and even more preferably 25.0% or more. On the other hand, from the viewpoint of suppressing object displacement in the adhesive layer 110 after energy ray irradiation, the actual copolymerization rate is more preferably 40.0% or less, even more preferably 30.0% or less, and particularly preferably 27.0% or less. Here, the actual copolymerization rate of the energy ray-curable group-containing monomer in the acrylic ester copolymer refers to the molar ratio of the monomer having an energy ray-curable group to all the monomers contained in the acrylic ester copolymer. Such actual copolymerization ratio can be measured, for example, by NMR or pyrolysis GC/MS.

 アクリル酸エステル共重合体の質量平均分子量(Mw)は、保持力向上の観点から、好ましくは1万以上、より好ましくは7万以上、さらに好ましくは14万以上である。また、貯蔵弾性率を所定値以下に抑える観点から、好ましくは200万以下、より好ましくは120万以下である。また、樹脂の数平均分子量(Mn)は、保持力向上の観点から、好ましくは1万以上、より好ましくは5万以上、さらに好ましくは10万以上である。また、貯蔵弾性率を所定値以下に抑える観点から、好ましくは200万以下、より好ましくは150万以下、さらに好ましくは120万以下である。 From the viewpoint of improving holding power, the mass average molecular weight (Mw) of the acrylic acid ester copolymer is preferably 10,000 or more, more preferably 70,000 or more, and even more preferably 140,000 or more. Furthermore, from the viewpoint of keeping the storage modulus below a predetermined value, it is preferably 2,000,000 or less, and even more preferably 1,200,000 or less. Furthermore, from the viewpoint of improving holding power, the number average molecular weight (Mn) of the resin is preferably 10,000 or more, more preferably 50,000 or more, and even more preferably 100,000 or more. Furthermore, from the viewpoint of keeping the storage modulus below a predetermined value, it is preferably 2,000,000 or less, more preferably 1,500,000 or less, and even more preferably 1,200,000 or less.

 粘着層110を構成する成分の全量に対する、アクリル酸エステル共重合体の含有量は、エネルギー線照射後の粘着層110における物体保持力を十分に低下させる観点から、70質量%以上であることが好ましく、80質量%であることがより好ましく、90質量%以上であることがさらに好ましい。一方で、粘着層110を構成する成分の全量に対する、アクリル酸エステル共重合体の含有量は、100質量%以下であり、99質量%以上であってもよく、98質量%以下であってもよい。 The content of the acrylic acid ester copolymer relative to the total amount of components constituting the adhesive layer 110 is preferably 70% by mass or more, more preferably 80% by mass or more, and even more preferably 90% by mass or more, from the viewpoint of sufficiently reducing the object retention force of the adhesive layer 110 after energy ray irradiation. On the other hand, the content of the acrylic acid ester copolymer relative to the total amount of components constituting the adhesive layer 110 is 100% by mass or less, and may be 99% by mass or more, or 98% by mass or less.

(粘着層の他の成分)
 粘着層110は、樹脂以外の成分を含んでいてもよい。例えば、粘着層110は、架橋剤、光重合開始剤、酸化防止剤、及びその他の添加剤のうちの1以上を含んでいてもよい。
(Other components of the adhesive layer)
The adhesive layer 110 may contain components other than resin, for example, the adhesive layer 110 may contain one or more of a crosslinking agent, a photopolymerization initiator, an antioxidant, and other additives.

 架橋剤としては、例えば、イソシアネート系架橋剤、エポキシ系架橋剤、アジリジン系架橋剤、金属キレート系架橋剤等が挙げられる。これらの架橋剤は、1種を単独で用いてもよく、2種以上を併用してもよい。架橋剤は、粘着層110が含有する樹脂に合わせて選択することができる。架橋剤は、粘着層110が含む樹脂用の架橋剤でありうる。例えば、架橋剤は、アクリル樹脂の架橋剤であってもよい。なお、ここでいう架橋剤は、粘着層110が含有する未反応の架橋剤のことをいう。架橋剤としては、例えば、上述したものを用いることができる。 Examples of crosslinking agents include isocyanate-based crosslinking agents, epoxy-based crosslinking agents, aziridine-based crosslinking agents, and metal chelate-based crosslinking agents. These crosslinking agents may be used alone or in combination of two or more. The crosslinking agent can be selected according to the resin contained in the adhesive layer 110. The crosslinking agent may be a crosslinking agent for the resin contained in the adhesive layer 110. For example, the crosslinking agent may be a crosslinking agent for an acrylic resin. Note that the crosslinking agent referred to here refers to unreacted crosslinking agent contained in the adhesive layer 110. Examples of crosslinking agents that can be used include those described above.

 粘着層110は、1種の架橋剤を含んでいてもよく、2種以上の架橋剤を含んでいてもよい。粘着層110中の架橋剤の含有量は、適切に架橋反応を行う観点から、好ましくは1質量%以上、より好ましくは1.5質量%以上、さらに好ましくは2質量%以上であり、好ましくは20質量%以下、より好ましくは15質量%以下、さらに好ましくは10質量%以下である。 The adhesive layer 110 may contain one type of crosslinking agent, or may contain two or more types of crosslinking agents. From the viewpoint of properly carrying out the crosslinking reaction, the content of the crosslinking agent in the adhesive layer 110 is preferably 1% by mass or more, more preferably 1.5% by mass or more, even more preferably 2% by mass or more, and preferably 20% by mass or less, more preferably 15% by mass or less, even more preferably 10% by mass or less.

 光重合開始剤は、エネルギー線の照射に応じて架橋反応を開始させる。粘着層110がエネルギー反応性樹脂を含む場合、粘着層110がさらに光重合開始剤を含むことにより、比較的低エネルギーのエネルギーの付与によっても架橋反応が進行する。 The photopolymerization initiator initiates a crosslinking reaction in response to irradiation with energy rays. If the adhesive layer 110 contains an energy reactive resin, the adhesive layer 110 can further contain a photopolymerization initiator, allowing the crosslinking reaction to proceed even with the application of relatively low energy.

 光重合開始剤としては、例えば、1-ヒドロキシシクロへキシルフェニルケトン、ベンゾイン、ベンゾインメチルエーテル、ベンゾインエチルエーテル、ベンゾインプロピルエーテル、ベンジルフェニルサルファイド、テトラメチルチウラムモノサルファイド、アゾビスイソブチロニトリル、ジベンジル、ジアセチル、8-クロロアントラキノン、2,4,6-トリメチルベンゾイルジフェニルホスフィンオキシド、及びビス(2,4,6-トリメチルベンゾイル)フェニルホスフィンオキシド等が挙げられる。 Examples of photopolymerization initiators include 1-hydroxycyclohexyl phenyl ketone, benzoin, benzoin methyl ether, benzoin ethyl ether, benzoin propyl ether, benzyl phenyl sulfide, tetramethylthiuram monosulfide, azobisisobutyronitrile, dibenzyl, diacetyl, 8-chloroanthraquinone, 2,4,6-trimethylbenzoyldiphenylphosphine oxide, and bis(2,4,6-trimethylbenzoyl)phenylphosphine oxide.

 粘着層110は、1種の重合開始剤を含んでいてもよいし、2種類以上の重合開始剤を含んでいてもよい。粘着層110中の光重合開始剤の含有量は、好ましくは0.01質量%以上、より好ましくは0.1質量%以上、さらに好ましくは0.2質量%以上であり、好ましくは10質量%以下、より好ましくは5質量%以下、さらに好ましくは2質量%以下である。 The adhesive layer 110 may contain one type of polymerization initiator, or may contain two or more types of polymerization initiators. The content of the photopolymerization initiator in the adhesive layer 110 is preferably 0.01% by mass or more, more preferably 0.1% by mass or more, even more preferably 0.2% by mass or more, and preferably 10% by mass or less, more preferably 5% by mass or less, even more preferably 2% by mass or less.

 酸化防止剤としては、例えば、ヒンダードフェノール系化合物のようなフェノール系、芳香族アミン系、硫黄系、若しくはリン酸エステル系化合物のようなリン系等が挙げられる。 Examples of antioxidants include phenol-based compounds such as hindered phenol-based compounds, aromatic amine-based compounds, sulfur-based compounds, and phosphorus-based compounds such as phosphate ester compounds.

 粘着層110が含んでいてもよいその他の添加剤は、特に限定されないが、例えば、ベンゾトリアゾール系化合物、オキサゾリックアシッドアミド化合物、又はベンゾフェノン系化合物等の紫外線吸収剤;ヒンダードアミン系、ベンゾフェノン系、若しくはベンゾトリアゾール系等の光安定剤;イミダゾール系樹脂安定剤、ジチオカルバミン酸塩系樹脂安定剤、リン系樹脂安定剤、若しくは硫黄エステル系樹脂安定剤等の樹脂安定剤;充填剤、顔料、増量剤、並びに軟化剤等が挙げられる。 Other additives that may be contained in the adhesive layer 110 include, but are not limited to, ultraviolet absorbers such as benzotriazole-based compounds, oxazolic acid amide compounds, or benzophenone-based compounds; light stabilizers such as hindered amine-based, benzophenone-based, or benzotriazole-based; resin stabilizers such as imidazole-based resin stabilizers, dithiocarbamate-based resin stabilizers, phosphorus-based resin stabilizers, or sulfur ester-based resin stabilizers; fillers, pigments, extenders, and softeners.

 粘着層110がこれらの添加剤を含有する場合、粘着層110中の添加剤の含有量は、好ましくは0.0001質量%以上、より好ましくは0.01質量%以上、特に好ましくは0.1質量%以上、さらに好ましくは1質量%以上であり、好ましくは20質量以下%、より好ましくは15質量%以下、さらに好ましくは10質量%以下である。 When the adhesive layer 110 contains these additives, the content of the additives in the adhesive layer 110 is preferably 0.0001% by mass or more, more preferably 0.01% by mass or more, particularly preferably 0.1% by mass or more, even more preferably 1% by mass or more, and preferably 20% by mass or less, more preferably 15% by mass or less, even more preferably 10% by mass or less.

(粘着層の形状)
 本実施形態に係る粘着層110の表面は凹凸を有している。一実施形態において、粘着層110は、その表面に、凹部によって境界が定められ、互いに離間している複数の凸部を有する。複数の凸部のそれぞれは、粘着層110の全体にわたって連続している凹部によって離間していてもよい。
(Shape of adhesive layer)
The surface of the adhesive layer 110 according to this embodiment has projections and depressions. In one embodiment, the adhesive layer 110 has a plurality of projections on its surface that are spaced apart and bounded by depressions. Each of the projections may be spaced apart by a depression that is continuous across the entire adhesive layer 110.

 図2A~2Bは、粘着層110の形状を示す側面図であり、図3A~3Cは粘着層110の形状を示す上面図である。図2A及び図3Aは、拡張前の粘着層110の例を示しており、図2B及び図3Bは拡張後の粘着層110’の例を示している。また、図2A~2Bでは粘着層110の凸部111により保持されている物体140が描写されている一方で、図3A~3Cにおいては凸部111により保持される物体140は省略されている。 Figures 2A and 2B are side views showing the shape of adhesive layer 110, and Figures 3A to 3C are top views showing the shape of adhesive layer 110. Figures 2A and 3A show an example of adhesive layer 110 before expansion, and Figures 2B and 3B show an example of adhesive layer 110' after expansion. Also, while Figures 2A and 2B depict object 140 held by convex portions 111 of adhesive layer 110, Figures 3A to 3C omit the object 140 held by convex portions 111.

 図2A及び図3Aに示すように、粘着層110の表面には凸部111が規則的に配列していてもよい。凸部が規則的に配列していることは、凸部が一定の間隔で直線上に並んでいることを意味する。一方で、凸部111は間隔が規則的に変動するように配列していてもよい。例えば、粘着シートの中心部では凸部間の間隔が短く、粘着シートの周辺部では凸部間の間隔が長くなっていてもよい。さらには、凸部は不規則に配置されていてもよい。 As shown in Figures 2A and 3A, the convex portions 111 may be regularly arranged on the surface of the adhesive layer 110. Regularly arranged convex portions means that the convex portions are lined up in a straight line at regular intervals. On the other hand, the convex portions 111 may be arranged so that the intervals between them vary regularly. For example, the intervals between convex portions may be short in the center of the adhesive sheet and long in the periphery of the adhesive sheet. Furthermore, the convex portions may be arranged irregularly.

 図3Cは、粘着層110の別の形状を示す上面図である。図3Cに示すように、粘着層110の表面にはストライプ状の凸部111が設けられていてもよい。図3Cにおいては一定の幅を有するライン状の凸部111が一定の間隔で並んでいる。このライン状の凸部111の幅又は間隔は規則的に変動していてもよいし、ライン状の凸部111が不規則に配列されていてもよい。 Figure 3C is a top view showing another shape of the adhesive layer 110. As shown in Figure 3C, stripe-shaped protrusions 111 may be provided on the surface of the adhesive layer 110. In Figure 3C, line-shaped protrusions 111 having a constant width are arranged at regular intervals. The width or interval of these line-shaped protrusions 111 may vary regularly, or the line-shaped protrusions 111 may be arranged irregularly.

 拡張前の凸部111のピッチPは、保持力を調節する観点から、好ましくは1μm以上、より好ましくは5μm以上、さらに好ましくは10μm以上、さらに好ましくは15μm以上である。一方で、このピッチPは、粘着層110と物体との接触面積を増やして保持力を高める観点から、好ましくは100μm以下、より好ましくは75μm以下、さらに好ましくは50μm以下、さらに好ましくは35μm以下、さらに好ましくは25μm以下である。ここで、凸部111のピッチPは、任意に選択した1つの凸部111の中心点と、その凸部111と最も近い別の凸部111の中心点との間の距離を意味する。例えば、図2Aの場合、凸部111のピッチPは、凸部111が一定の間隔で並ぶ直線上における凸部111の中心点と、その凸部111と最も近い別の凸部111の中心点との間の距離を表す。凸部111が複数の直線上に並んでいる場合、ピッチPは、最も短いピッチで凸部111が並んでいる直線上における凸部の中心点間の距離を表す。本明細書において、凸部111間の間隔とは、凸部の中心間の間隔を意味する。 The pitch P of the convex portions 111 before expansion is preferably 1 μm or more, more preferably 5 μm or more, even more preferably 10 μm or more, and even more preferably 15 μm or more, from the viewpoint of adjusting the holding force. On the other hand, from the viewpoint of increasing the contact area between the adhesive layer 110 and the object and thereby increasing the holding force, this pitch P is preferably 100 μm or less, more preferably 75 μm or less, even more preferably 50 μm or less, even more preferably 35 μm or less, and even more preferably 25 μm or less. Here, the pitch P of the convex portions 111 refers to the distance between the center point of one arbitrarily selected convex portion 111 and the center point of another convex portion 111 closest to that convex portion 111. For example, in the case of Figure 2A, the pitch P of the convex portions 111 represents the distance between the center point of the convex portion 111 on a straight line on which the convex portions 111 are arranged at regular intervals and the center point of another convex portion 111 closest to that convex portion 111. When the convex portions 111 are arranged on multiple straight lines, the pitch P represents the distance between the center points of the convex portions on the line on which the convex portions 111 are arranged at the shortest pitch. In this specification, the spacing between the convex portions 111 means the spacing between the centers of the convex portions.

 凸部111の具体的な形状は特に限定されない。例えば、凸部111はピラー(柱)形状を有していてもよい。具体例として、凸部111は円柱形状、角柱形状、円錐形状、角錐形状、球体形状、又は半球体形状を有していてもよい。また、上述のように凸部111がライン状に延びていてもよいし、波状などの曲線状に延びていてもよい。さらに、これらの凸部111にはテーパ又は逆テーパが設けられていてもよい。 The specific shape of the convex portion 111 is not particularly limited. For example, the convex portion 111 may have a pillar shape. Specific examples include a cylindrical, prismatic, conical, pyramidal, spherical, or hemispherical shape. As described above, the convex portion 111 may extend in a line shape, or may extend in a curved shape such as a wave shape. Furthermore, these convex portions 111 may be tapered or inverted tapered.

 図4Aは、一実施形態に係る粘着層110の、凸部111を通る、粘着層110の表面に垂直な断面図を示す。図4Aに示す凸部111にはテーパが設けられており、すなわち凸部111は先細りになっている。また、図4Bに示すように、凸部111の先端は曲面となっていてもよい。このような構成によれば、物体を粘着層110で保持する際の衝撃がより緩和されるため、粘着層110が物体をずれないように保持することが容易になる。一方で、凸部の先端は平面となっていてもよい。 Figure 4A shows a cross-sectional view of an adhesive layer 110 according to one embodiment, taken perpendicular to the surface of the adhesive layer 110 and passing through a convex portion 111. The convex portion 111 shown in Figure 4A is tapered, i.e., the convex portion 111 is tapered. Furthermore, as shown in Figure 4B, the tip of the convex portion 111 may be curved. With this configuration, the impact when an object is held by the adhesive layer 110 is further alleviated, making it easier for the adhesive layer 110 to hold the object without it slipping. On the other hand, the tip of the convex portion may be flat.

 図4Aに示すように、粘着層110の表面は、平坦な凹部と、凹部から突出した凸部111を有していてもよい。このように、粘着層110が有しており、互いに離間している複数の凸部111は、凹部によって境界が定められていてもよい。 As shown in FIG. 4A, the surface of the adhesive layer 110 may have flat recesses and protruding portions 111 protruding from the recesses. In this manner, the adhesive layer 110 has multiple protruding portions 111 that are spaced apart from one another and may be bounded by the recesses.

 別の例として、凸部は、図4Bに示すように半球状又は球の一部であってもよい。また、凸部111は、図4Cに示すようにT字状であってもよい。さらなる別の例として、凸部111は、複数の粒が集まっている形状、キノコ状、蓮の葉の表面状、又は針状であってもよい。さらなる別の例として、粘着層110の表面は粗面又は繊維状になっていてもよく、このような表面も凹凸を有しているといえる。 As another example, the convex portion may be hemispherical or part of a sphere, as shown in FIG. 4B. Furthermore, the convex portion 111 may be T-shaped, as shown in FIG. 4C. As yet another example, the convex portion 111 may be in the shape of a collection of particles, mushroom-shaped, the surface of a lotus leaf, or needle-shaped. As yet another example, the surface of the adhesive layer 110 may be rough or fibrous, and such a surface may also be said to have unevenness.

 それぞれの凸部111の幅又は径は、物体の保持力を維持する観点から、好ましくは1μm以上、より好ましくは2μm以上、さらに好ましくは5μm以上、さらに好ましくは10μm以上である。一方で、物体の剥離容易性を高める観点から、好ましくは100μm以下、より好ましくは50μm以下、さらに好ましくは30μm以下、さらに好ましくは20μm以下である。ここで、凸部111の幅及び径は、それぞれ、凹部の表面において凸部111の両側から接する二本の平行線の間の最小距離及び最大距離(図4AではWで表される)を意味する。 From the viewpoint of maintaining the holding power of the object, the width or diameter of each protrusion 111 is preferably 1 μm or more, more preferably 2 μm or more, even more preferably 5 μm or more, and even more preferably 10 μm or more. On the other hand, from the viewpoint of increasing the ease with which the object can be peeled off, it is preferably 100 μm or less, more preferably 50 μm or less, even more preferably 30 μm or less, and even more preferably 20 μm or less. Here, the width and diameter of the protrusion 111 refer to the minimum and maximum distances, respectively, between two parallel lines that contact the protrusion 111 from both sides on the surface of the recess (represented by W in Figure 4A).

 また、それぞれの凸部111の面積は、物体の保持力を維持する観点から、好ましくは10μm以上、より好ましくは20μm以上、さらに好ましくは30μm以上である。一方で、物体の剥離容易性を高める観点から、好ましくは2000μm以下、より好ましくは1000μm以下、さらに好ましくは500μm以下である。ここで、凸部111の面積は、凹部の表面から突出している部分の面積(図4Aの場合直径Wの円の面積)を意味する。 Furthermore, from the viewpoint of maintaining the holding force of the object, the area of each protrusion 111 is preferably 10 μm2 or more, more preferably 20 μm2 or more, and even more preferably 30 μm2 or more. On the other hand, from the viewpoint of increasing the ease with which the object can be peeled off, the area is preferably 2000 μm2 or less, more preferably 1000 μm2 or less, and even more preferably 500 μm2 or less. Here, the area of the protrusion 111 means the area of the portion protruding from the surface of the recess (the area of a circle with a diameter W in the case of FIG. 4A ).

 一実施形態において、それぞれの凸部111の高さは、物体の剥離容易性を高める観点から、好ましくは1μm以上、より好ましくは3μm以上、さらに好ましくは5μm以上である。一方で、物体の保持力を高める観点から、それぞれの凸部111の高さは、好ましくは20μm以下、より好ましくは15μm以下、さらに好ましくは10μm以下である。これにより、物体の保持力を変更することができる。ここで、凸部111の高さは、図4AではHで表されている。また、一実施形態において、粘着層110が有する複数の凸部の高さは均一である。別の実施形態において、粘着層110は、第1の均一な高さを有する第1の複数の凸部と、異なる高さを有する第2の複数の凸部と、を有していてもよい。ここで、第2の複数の凸部は第2の均一な高さを有していてもよい。例えば、凸部111は、このような第1の凸部及び第2の凸部からなっていてもよい。さらなる実施形態において、粘着層110は、ランダムな高さの複数の凸部を有していてもよい。 In one embodiment, the height of each protrusion 111 is preferably 1 μm or more, more preferably 3 μm or more, and even more preferably 5 μm or more, from the viewpoint of increasing the ease of peeling an object. On the other hand, from the viewpoint of increasing the holding power of an object, the height of each protrusion 111 is preferably 20 μm or less, more preferably 15 μm or less, and even more preferably 10 μm or less. This makes it possible to change the holding power of an object. Here, the height of the protrusion 111 is represented by H in FIG. 4A. Also, in one embodiment, the height of the multiple protrusions in the adhesive layer 110 is uniform. In another embodiment, the adhesive layer 110 may have a first multiple protrusions having a first uniform height and a second multiple protrusions having a different height. Here, the second multiple protrusions may have a second uniform height. For example, the protrusions 111 may be composed of such first protrusions and second protrusions. In a further embodiment, the adhesive layer 110 may have multiple protrusions of random heights.

 また、粘着層110の面積に対する凸部111の総面積は、物体の保持力を維持する観点から、好ましくは1%以上、より好ましくは5%以上、さらに好ましくは10%以上、さらに好ましくは18%以上、さらに好ましくは40%以上である。一方で、粘着層110の面積に対する凸部の総面積は、物体の剥離容易性を高める観点から、好ましくは95%以下、より好ましくは75%以下、さらに好ましくは60%以下である。 Furthermore, from the viewpoint of maintaining the holding power of the object, the total area of the convex portions 111 relative to the area of the adhesive layer 110 is preferably 1% or more, more preferably 5% or more, even more preferably 10% or more, even more preferably 18% or more, and even more preferably 40% or more. On the other hand, from the viewpoint of increasing the ease with which the object can be peeled off, the total area of the convex portions relative to the area of the adhesive layer 110 is preferably 95% or less, more preferably 75% or less, and even more preferably 60% or less.

(粘着層の特性)
 上記のように、一実施形態において、粘着層110はエネルギー線反応性を有している。このため、粘着層110に対してエネルギー線を照射することにより、粘着層110の貯蔵弾性率が増加する。また、粘着層110に対してエネルギー線を照射することにより、粘着層110の粘着力が低下する。
(Characteristics of adhesive layer)
As described above, in one embodiment, the adhesive layer 110 is energy ray reactive. Therefore, by irradiating the adhesive layer 110 with energy rays, the storage modulus of the adhesive layer 110 increases. Furthermore, by irradiating the adhesive layer 110 with energy rays, the adhesive strength of the adhesive layer 110 decreases.

 一実施形態において、エネルギー線照射後の粘着層110において、0℃から昇温した際にtanδの上昇が止まる温度は55℃より大きい。tanδの上昇が止まる温度は、好ましくは57℃より大きく、より好ましくは59℃より大きい。tanδは損失正接とも呼ばれ、tanδ=G’’/G’により表される。ここで、G’は貯蔵弾性率である。また、G’’は損失弾性率である。粘着層110の貯蔵弾性率及び損失弾性率は、JIS K7244-7:2007に従うねじり振動法により測定される。具体的には、厚さ1mm、直径8mmの円柱形状を有する粘着層110と同じ材料のサンプルを作製し、動的粘弾性測定装置を用いて、10Hzの振動を与え、-30℃から120℃までサンプルの温度を昇温させながら測定を行うことにより、サンプルの貯蔵弾性率及び損失弾性率を測定することができる。こうして、粘着層110の貯蔵弾性率及び損失弾性率を測定することができる。なお、本明細書において、エネルギー線照射後の粘着層110は、架橋反応の進行が完結する量のエネルギー線を照射した後の粘着層110を指す。tanδの測定値にノイズが含まれる可能性を考慮して、本明細書においては、0.2℃又はより細かい測定間隔でtanδを測定した場合に、X-2.5℃以上X+2.5℃未満におけるtanδの平均値が、(X+1)-2.5℃以上~(X+1)+2.5℃未満におけるtanδの平均値以上となる最小のX(Xは正の整数である)を、tanδの上昇が止まる温度と定義する。 In one embodiment, the temperature at which tan δ stops increasing when the adhesive layer 110 is heated from 0°C after energy beam irradiation is greater than 55°C. The temperature at which tan δ stops increasing is preferably greater than 57°C, and more preferably greater than 59°C. tan δ is also called the loss tangent and is expressed as tan δ = G"/G'. Here, G' is the storage modulus. G" is also the loss modulus. The storage modulus and loss modulus of the adhesive layer 110 are measured using a torsional vibration method in accordance with JIS K7244-7:2007. Specifically, a cylindrical sample of the same material as the adhesive layer 110, 1 mm thick and 8 mm in diameter, is prepared, and a dynamic viscoelasticity measuring device is used to apply a 10 Hz vibration and measure the sample while raising the sample's temperature from -30°C to 120°C. This allows the storage modulus and loss modulus of the adhesive layer 110 to be measured. In this specification, the adhesive layer 110 after irradiation with energy rays refers to the adhesive layer 110 after irradiation with an amount of energy rays that completes the crosslinking reaction. In consideration of the possibility that noise may be present in the measured value of tan δ, in this specification, when tan δ is measured at measurement intervals of 0.2°C or more, the minimum X (X is a positive integer) at which the average value of tan δ at temperatures between X - 2.5°C and X + 2.5°C is equal to or greater than the average value of tan δ at temperatures between (X + 1) - 2.5°C and (X + 1) + 2.5°C is defined as the temperature at which the increase in tan δ stops.

 本願発明者らは、tanδの上昇が止まる温度が55℃より大きくなる粘着層110を用いることにより、粘着シートから物体(特に薄い物体)をピックアップしやすくなることを見出した。本発明を限定する意図はないが、この理由について本願発明者らは以下のように考えている。すなわち、一般に、温度上昇に伴うtanδの上昇は、貯蔵弾性率の減少を反映している。したがって、tanδの上昇が止まる温度が55℃より大きいことにより、通常の環境である室温付近において貯蔵弾性率が安定して高く保たれることが期待される。このために、物体をピックアップする際に粘着層110の凸部が物体に追従しにくくなり、粘着シートから物体をピックアップしやすくなると考えられる。また、エネルギー線照射後の粘着シートを拡張してから物体をピックアップする場合、粘着シートを拡張する際に粘着層110の凸部と物体との間に働く剪断応力がより大きくなり、粘着層110からの物体の剥離が起こりやすくなると考えられる。このことも、粘着シートから物体をピックアップしやすくなる効果に寄与していると考えられる。さらに、室温付近において貯蔵弾性率が安定して高く保たれることにより、エネルギー線照射によって粘着層110の温度が上昇しても、粘着シートから物体をピックアップしやすくなることが期待される。あるいは、エネルギー線照射によって粘着層110の温度が大きく上昇した際に、粘着層110の冷却時間を短くすることができるため、生産性を向上できることが期待される。 The present inventors have discovered that using an adhesive layer 110 in which the temperature at which tan δ stops increasing is greater than 55°C makes it easier to pick up an object (especially a thin object) from the adhesive sheet. While not intending to limit the present invention, the present inventors believe the reason for this is as follows: Generally, an increase in tan δ with increasing temperature reflects a decrease in the storage modulus. Therefore, by setting the temperature at which tan δ stops increasing to greater than 55°C, it is expected that the storage modulus will be maintained at a stable high level in a normal environment, near room temperature. This is thought to make it more difficult for the convex portions of the adhesive layer 110 to follow the object when picking up the object, making it easier to pick up the object from the adhesive sheet. Furthermore, when the adhesive sheet is expanded after energy beam irradiation and then the object is picked up, the shear stress acting between the convex portions of the adhesive layer 110 and the object when the adhesive sheet is expanded is greater, making it more likely that the object will peel off from the adhesive layer 110. This is also thought to contribute to the effect of making it easier to pick up an object from the adhesive sheet. Furthermore, by maintaining a stable high storage modulus near room temperature, it is expected that objects will be easier to pick up from the adhesive sheet even if the temperature of the adhesive layer 110 rises due to energy ray irradiation. Alternatively, when the temperature of the adhesive layer 110 rises significantly due to energy ray irradiation, the cooling time of the adhesive layer 110 can be shortened, which is expected to improve productivity.

 一実施形態において、エネルギー線照射後の粘着層110において、(50℃でのtanδ)/(30℃でのtanδ)の値は1.30以上である。(50℃でのtanδ)/(30℃でのtanδ)の値は、1.40以上であることが好ましく、1.50以上であることがより好ましく、1.60以上であることがさらに好ましい。 In one embodiment, the adhesive layer 110 after energy ray irradiation has a value of (tan δ at 50°C)/(tan δ at 30°C) of 1.30 or greater. The value of (tan δ at 50°C)/(tan δ at 30°C) is preferably 1.40 or greater, more preferably 1.50 or greater, and even more preferably 1.60 or greater.

 本願発明者らは、(50℃でのtanδ)/(30℃でのtanδ)の値が1.30以上となる粘着層110を用いることにより、粘着シートから物体(特に薄い物体)をピックアップしやすくなることを見出した。本発明を限定する意図はないが、この理由について本願発明者らは以下のように考えている。すなわち、一般に、温度上昇に伴うtanδの上昇は、貯蔵弾性率の減少を反映している。したがって、温度上昇に伴ってtanδが急峻に上昇する場合、通常の環境である室温付近において貯蔵弾性率が安定して高く保たれることが期待される。このために、上述のように、エネルギー線照射後の粘着層110による物体の保持力が低くなり、粘着シートから物体をピックアップしやすくなると考えられる。 The present inventors have discovered that using an adhesive layer 110 in which the value of (tan δ at 50°C)/(tan δ at 30°C) is 1.30 or greater makes it easier to pick up an object (particularly a thin object) from the adhesive sheet. While not intending to limit the present invention, the present inventors believe the reason for this is as follows: Generally, an increase in tan δ with increasing temperature reflects a decrease in the storage modulus. Therefore, if tan δ increases sharply with increasing temperature, it is expected that the storage modulus will be maintained stably at a high level in a normal environment near room temperature. For this reason, as described above, the holding force of the adhesive layer 110 on an object after irradiation with energy rays is reduced, making it easier to pick up an object from the adhesive sheet.

 一実施形態において、エネルギー線照射後の粘着層110において、23℃でのtanδの値は0.25以下である。23℃でのtanδの値は、0.22以下であることが好ましく、0.18以下であることがより好ましい。 In one embodiment, the adhesive layer 110 after irradiation with energy rays has a tan δ value of 0.25 or less at 23°C. The tan δ value at 23°C is preferably 0.22 or less, and more preferably 0.18 or less.

 本願発明者らは、23℃でのtanδの値が0.25以下となる粘着層110を用いることにより、粘着シートから物体(特に薄い物体)をピックアップしやすくなることを見出した。本発明を限定する意図はないが、この理由について本願発明者らは以下のように考えている。すなわち、通常の環境である室温付近においてtanδの値が十分に低い場合、この温度付近において貯蔵弾性率が安定して高く保たれることが期待される。このために、上述のように、エネルギー線照射後の粘着層110による物体の保持力が低くなり、粘着シートから物体をピックアップしやすくなると考えられる。 The present inventors have discovered that using an adhesive layer 110 with a tan δ value of 0.25 or less at 23°C makes it easier to pick up an object (particularly a thin object) from the adhesive sheet. While not intending to limit the present invention, the present inventors believe the reason for this is as follows: if the tan δ value is sufficiently low near room temperature, which is a normal environment, it is expected that the storage modulus will be maintained stably high near this temperature. For this reason, as described above, the adhesive layer 110's ability to hold an object after irradiation with energy rays is reduced, making it easier to pick up an object from the adhesive sheet.

 粘着シートから物体(特に薄い物体)をピックアップしやすくする観点から、エネルギー線照射後の粘着層110において、23℃での貯蔵弾性率の値は、0.80GPa以上であることが好ましく、1.0GPa以上であることがより好ましく、1.2GPa以上であることがさらに好ましく、1.5GPa以上であることがよりさらに好ましい。一方で、エネルギー線照射後の物体の位置ずれを抑制する観点から、エネルギー線照射後の粘着層110において、23℃での貯蔵弾性率の値は、10GPa以下以上であることが好ましく、7.0GPa以上であることがより好ましく、5.0GPa以下であることがさらに好ましく、3.0GPa以上であることがよりさらに好ましい。 From the viewpoint of making it easier to pick up an object (especially a thin object) from the adhesive sheet, the storage modulus value at 23°C of the adhesive layer 110 after energy ray irradiation is preferably 0.80 GPa or more, more preferably 1.0 GPa or more, even more preferably 1.2 GPa or more, and even more preferably 1.5 GPa or more. On the other hand, from the viewpoint of suppressing displacement of an object after energy ray irradiation, the storage modulus value at 23°C of the adhesive layer 110 after energy ray irradiation is preferably 10 GPa or less, more preferably 7.0 GPa or more, even more preferably 5.0 GPa or less, and even more preferably 3.0 GPa or more.

 また、物体保持力を高める観点から、エネルギー線照射前の粘着層110において、23℃での貯蔵弾性率の値は、好ましくは100MPa以下、より好ましくは50MPa以下、さらに好ましくは20MPa以下、特に好ましくは5.0MPa以下である。 Furthermore, from the viewpoint of increasing the object retention force, the storage modulus of the adhesive layer 110 at 23°C before irradiation with energy rays is preferably 100 MPa or less, more preferably 50 MPa or less, even more preferably 20 MPa or less, and particularly preferably 5.0 MPa or less.

 また、一実施形態に係る粘着シートは、面方向に拡張可能である。図2A及び図3Aに示される粘着層110は、粘着シートを拡張することにより、図2B及び図3Bに示される粘着層110’へと変形している。粘着層110と粘着層110’とを比較すると、粘着層110’では拡張により凸部111ごとのピッチPが拡大されており、1つの物体140を保持する凸部111の個数が減少している。これにより、粘着層110’では、粘着層110と比較して、凸部111により物体140を保持する力が低下する。また、粘着シートの拡張により、凸部111と物体140との間に剪断応力が働く。このことも、凸部111による物体140の保持力の低下につながっていると、本願発明者らは考察している。一実施形態に係る粘着シートは、物体の保持力を十分に低下させる観点から、面方向(例えば1方向又は直交する2方向)に1%以上拡張可能であってもよく、5%以上拡張可能であってもよい。 Furthermore, the adhesive sheet according to one embodiment is expandable in the planar direction. The adhesive layer 110 shown in FIGS. 2A and 3A is transformed into the adhesive layer 110' shown in FIGS. 2B and 3B by expanding the adhesive sheet. Comparing the adhesive layer 110 and the adhesive layer 110', the pitch P of the convex portions 111 in the adhesive layer 110' is increased due to expansion, and the number of convex portions 111 that hold one object 140 is reduced. As a result, the adhesive layer 110' has a lower holding force for the object 140 via the convex portions 111 than the adhesive layer 110. Furthermore, shear stress acts between the convex portions 111 and the object 140 due to expansion of the adhesive sheet. The inventors of the present application believe that this also leads to a decrease in the holding force of the convex portions 111 to the object 140. The adhesive sheet according to one embodiment may be expandable by 1% or more in the planar direction (e.g., one direction or two orthogonal directions) or by 5% or more, from the viewpoint of sufficiently reducing the holding force for the object.

(剥離層)
 また、本実施形態に係る粘着シートは、図1に示すように、粘着層110と接する剥離シート150を有していてもよい。図1には、説明のために、粘着層110と剥離シート150とが分離された状態が示されている。図1に示すように、剥離シート150は、粘着層110の凹凸面に相補的な凹凸面を有している。
(Release layer)
The pressure-sensitive adhesive sheet according to the present embodiment may also have a release sheet 150 in contact with the pressure-sensitive adhesive layer 110, as shown in Fig. 1. For the sake of explanation, Fig. 1 shows a state in which the pressure-sensitive adhesive layer 110 and the release sheet 150 are separated. As shown in Fig. 1, the release sheet 150 has an uneven surface that is complementary to the uneven surface of the pressure-sensitive adhesive layer 110.

 剥離シート150は剥離層160を有する。剥離層160は粘着層110からの易剥離性を有する層である。剥離層160は、粘着層110の凹凸面に相補的な凹凸面を有していてもよい。すなわち、剥離層160は凹部161を有し、凹部161は凸部111と相補的な形状を有する。もっとも、凹部161が凸部111と相補的な形状を有することは必須ではない。 The release sheet 150 has a release layer 160. The release layer 160 is a layer that is easily peelable from the adhesive layer 110. The release layer 160 may have an uneven surface that is complementary to the uneven surface of the adhesive layer 110. That is, the release layer 160 has recesses 161, and the recesses 161 have a shape that is complementary to the protrusions 111. However, it is not essential that the recesses 161 have a shape that is complementary to the protrusions 111.

 剥離シート150は、粘着層110と接しない面に基材170を備えていてもよい。この基材170は、基材120と同様に設計することができるが、基材120と同じ組成又は構造を有する必要はない。また、剥離シート150は、剥離層160と基材170との間に不図示のアンダーコート層を備えていてもよい。 The release sheet 150 may have a substrate 170 on the side that does not contact the adhesive layer 110. This substrate 170 may be designed similarly to the substrate 120, but does not need to have the same composition or structure as the substrate 120. In addition, the release sheet 150 may have an undercoat layer (not shown) between the release layer 160 and the substrate 170.

(その他の層)
 上記のシートは、基材120及び粘着層110以外の層を有していてもよい。例えば、粘着層110と反対側の基材120上の面に、さらなる粘着層が設けられていてもよい。このような粘着層を介して、シートを別の物体に貼り付けることができる。さらなる粘着層の種類は特に限定されず、例えば一般的な粘着剤を用いてさらなる粘着層を形成することができる。
(Other layers)
The above-mentioned sheet may have layers other than the substrate 120 and the adhesive layer 110. For example, an additional adhesive layer may be provided on the surface of the substrate 120 opposite the adhesive layer 110. The sheet can be attached to another object via such an adhesive layer. The type of the additional adhesive layer is not particularly limited, and the additional adhesive layer can be formed using, for example, a general adhesive.

(粘着シートの製造方法)
 粘着シート及び粘着層110の製造方法に特に制限はない。以下では、図6を参照して、粘着シートの製造方法の一例について説明する。
(Method for manufacturing pressure-sensitive adhesive sheet)
There are no particular limitations on the method for manufacturing the adhesive sheet and adhesive layer 110. An example of a method for manufacturing the adhesive sheet will be described below with reference to FIG.

 S610では、粘着層110の材料となる粘着剤組成物を調製する。上述の粘着層110の各成分を含む原料組成物に有機溶媒を加えることで、粘着剤組成物を調製することができる。粘着剤組成物は、例えば、上記のエネルギー線反応性を有するアクリル酸エステル共重合体を含むことができる。既に説明したように、エネルギー線硬化性基を導入可能な単量体を有するアクリル酸エステル共重合体に対して、エネルギー線硬化性基導入剤を反応させることにより、エネルギー線硬化性基を導入可能な単量体にエネルギー線硬化性基を導入することができる。粘着剤組成物を調製する工程は、このようにエネルギー線反応性を有するアクリル酸エステル共重合体を調製する工程を含んでいてもよい。この場合における、アクリル酸エステル共重合体中の、エネルギー線硬化性基を導入可能な単量体の共重合率R%、及び反応させるエネルギー線硬化性基導入剤の当量R%は、既に説明したとおりである。 In S610, a pressure-sensitive adhesive composition serving as a material for the pressure-sensitive adhesive layer 110 is prepared. The pressure-sensitive adhesive composition can be prepared by adding an organic solvent to a raw material composition containing the above-described components of the pressure-sensitive adhesive layer 110. The pressure-sensitive adhesive composition can contain, for example, the above-described energy ray-reactive acrylic acid ester copolymer. As already described, an energy ray-curable group can be introduced into the energy ray-curable group-introducing monomer by reacting an energy ray-curable group-introducing agent with an acrylic acid ester copolymer having the energy ray-curable group-introducing monomer. The process of preparing the pressure-sensitive adhesive composition may include a process of preparing an energy ray-reactive acrylic acid ester copolymer. In this case, the copolymerization rate RA % of the energy ray-curable group-introducing monomer in the acrylic acid ester copolymer and the equivalent RB % of the energy ray-curable group-introducing agent to be reacted are as already described.

 また、粘着剤組成物は、上述した、エネルギー線硬化性基が導入された単量体と、架橋剤と反応可能な単量体と、を有するアクリル酸エステル共重合体を含んでいてもよい。また、粘着剤組成物は、アクリル酸エステル共重合体が有する単量体同士を架橋するための架橋剤を含んでいてもよい。 The adhesive composition may also contain the above-mentioned acrylic ester copolymer having a monomer into which an energy ray-curable group has been introduced and a monomer capable of reacting with a crosslinking agent. The adhesive composition may also contain a crosslinking agent for crosslinking the monomers contained in the acrylic ester copolymer.

 粘着剤組成物を調製するために用いる有機溶媒の例としては、トルエン、酢酸エチル、及びメチルエチルケトン等が挙げられる。溶液の塗布方法としては、例えば、スピンコート法、スプレーコート法、バーコート法、ナイフコート法、ロールコート法、ロールナイフコート法、ブレードコート法、ダイコート法、グラビアコート法、及び印刷法(例えばスクリーン印刷法及びインクジェット法)等が挙げられる。 Examples of organic solvents used to prepare the pressure-sensitive adhesive composition include toluene, ethyl acetate, and methyl ethyl ketone. Examples of methods for applying the solution include spin coating, spray coating, bar coating, knife coating, roll coating, roll knife coating, blade coating, die coating, gravure coating, and printing methods (e.g., screen printing and inkjet printing).

 S620及びS630では、S610で調製した粘着剤組成物を用いて、基材120上に、表面に凹凸を有する粘着層を形成する。まず、S620においては、基材120上に、粘着剤組成物の層を形成する。例えば、粘着剤組成物を基材120上に塗布して塗布膜を形成した後、乾燥させることにより、基材120上に粘着剤組成物の層を設けることができる。 In S620 and S630, the adhesive composition prepared in S610 is used to form an adhesive layer having an uneven surface on substrate 120. First, in S620, a layer of the adhesive composition is formed on substrate 120. For example, the adhesive composition is applied to substrate 120 to form a coating film, which is then dried, thereby providing a layer of the adhesive composition on substrate 120.

 S630では、こうして形成された粘着剤組成物の層の表面に凹凸が形成される。凹凸を設ける処理に特に制限はない。例えば、インプリント方式を用いて層の表面に凹凸を設けることができる。インプリント方式においては、設けようとする凹凸と相補的な凹凸面を有する型を用いることができる。こうして、表面に凹凸を有する粘着層110が形成される。具体的には、粘着剤組成物の層を型で押圧し、層を加温して所定時間維持し、その後材料層を冷却し、型を除去することができる。加温時には、例えば、粘着剤組成物の層の軟化点よりも高い温度に材料層を加温することができる。層を型で押圧しながら材料層を加温するための具体的な方法としては、基材120上に設けられた粘着剤組成物の層と型とを真空ラミネートする方法が挙げられる。また、型として、上記のように凹凸を有する剥離層160を備える剥離シート150が用いられてもよい。 In S630, irregularities are formed on the surface of the adhesive composition layer thus formed. There are no particular limitations on the process for forming the irregularities. For example, irregularities can be formed on the surface of the layer using an imprinting method. In the imprinting method, a mold with an irregular surface complementary to the irregularities to be formed can be used. In this way, an adhesive layer 110 with an irregular surface is formed. Specifically, the adhesive composition layer is pressed with the mold, the layer is heated and maintained for a predetermined period of time, and then the material layer is cooled and the mold is removed. During heating, for example, the material layer can be heated to a temperature higher than the softening point of the adhesive composition layer. A specific method for heating the material layer while pressing the layer with the mold is to vacuum laminate the adhesive composition layer provided on the substrate 120 and the mold. Alternatively, a release sheet 150 having a release layer 160 with irregularities as described above may be used as the mold.

 一方で、凹凸形状の維持性を高めるために、粘着剤組成物の層の表面に凹凸を形成する際又は凹凸を形成した後に、粘着剤組成物が含む樹脂に対する架橋反応を行ってもよい。既に説明したように、粘着剤組成物が架橋剤と反応可能な単量体を有するアクリル酸エステル共重合体を含む一実施形態においては、アクリル酸エステル共重合体に対して架橋剤を反応させることにより、単量体同士を互いに架橋することができる。このように粘着剤組成物の層における硬化反応を進行させることにより、粘着層110の貯蔵弾性率を増加させ、凹凸形状の維持性を高めることができる。具体例として、粘着剤組成物の層に対して凹凸と相補的な凹凸面を備える型を接触させた状態で、粘着剤組成物の層を硬化させることにより、表面に凹凸を有する粘着層110を形成することができる。粘着剤組成物の層が架橋前の共重合体及び熱架橋剤を含んでいる場合、型で押圧しながら材料層を加熱することにより、架橋反応が進行し、架橋された共重合体を含む粘着層110が形成される。このように加熱による架橋反応を用いることにより、粘着層110に未反応のエネルギー線硬化性基を残すことができる。 On the other hand, to improve the retention of the uneven shape, a crosslinking reaction of the resin contained in the adhesive composition may be carried out when forming the unevenness on the surface of the adhesive composition layer or after forming the unevenness. As already explained, in one embodiment in which the adhesive composition contains an acrylic acid ester copolymer having a monomer capable of reacting with a crosslinking agent, the monomers can be crosslinked with each other by reacting the acrylic acid ester copolymer with a crosslinking agent. By promoting the curing reaction in the adhesive composition layer in this way, the storage modulus of the adhesive layer 110 can be increased and the retention of the uneven shape can be improved. As a specific example, an adhesive layer 110 having an uneven surface can be formed by curing the adhesive composition layer while bringing the adhesive composition layer into contact with a mold having an uneven surface complementary to the unevenness. When the adhesive composition layer contains a copolymer before crosslinking and a thermal crosslinking agent, the crosslinking reaction proceeds by heating the material layer while pressing it with the mold, and an adhesive layer 110 containing a crosslinked copolymer is formed. By using a crosslinking reaction due to heating in this way, unreacted energy ray-curable groups can be left in the adhesive layer 110.

 別の方法として、粘着剤組成物をスプレー塗布することにより、粗面を有する粘着層110を設けることができる。さらには、粘着剤組成物にフィラーを加え、このような溶液を塗布することにより、粗面又は繊維状の表面を有する粘着層110を設けることもできる。さらなる別の方法として、インクジェット法のような印刷法を用いて、所望のパターンに従って粘着剤組成物を塗布することにより、基材120上に凹凸形状を有する粘着層110を直接設けることもできる。 As an alternative method, an adhesive layer 110 having a rough surface can be provided by spray-coating an adhesive composition. Furthermore, an adhesive layer 110 having a rough or fibrous surface can be provided by adding a filler to the adhesive composition and coating such a solution. As yet another alternative method, an adhesive layer 110 having a textured shape can be provided directly on the substrate 120 by applying the adhesive composition according to the desired pattern using a printing method such as an inkjet method.

 さらなる別の方法として、剥離シート150上に表面に凹凸を有する粘着層110を形成してもよい。上述のように、剥離シート150の表面は、粘着層110の凹凸面と相補的な凹凸面を有していてもよい。この場合、剥離シート150の凹凸面に粘着剤組成物の層を設けることにより、表面(すなわち粘着層110と剥離シート150との界面)に凹凸を有する粘着層を設けることができる。さらに、粘着層110の凹凸面と反対側の面に基材120を貼り付けることができる。このような方法により、基材120上に粘着層110を形成してもよい。 As yet another alternative method, an adhesive layer 110 having an uneven surface may be formed on a release sheet 150. As described above, the surface of the release sheet 150 may have an uneven surface that is complementary to the uneven surface of the adhesive layer 110. In this case, by providing a layer of an adhesive composition on the uneven surface of the release sheet 150, an adhesive layer having an uneven surface (i.e., the interface between the adhesive layer 110 and the release sheet 150) can be provided. Furthermore, a substrate 120 can be attached to the surface of the adhesive layer 110 opposite the uneven surface. The adhesive layer 110 may be formed on the substrate 120 by such a method.

(粘着シートの使用方法)
 本実施形態に係る粘着シートは、物体を取り扱うために用いることができる。例えば、本実施形態に係る粘着シートは、物体を一時的に保持するために用いることができる。また、本実施形態に係る粘着シートは、物体を転写するために用いることができる。具体例として、ダイシングにより得られた半導体チップを所望の位置に転写するために、本実施形態に係る粘着シートを用いることができる。
(How to use the adhesive sheet)
The adhesive sheet according to this embodiment can be used to handle an object. For example, the adhesive sheet according to this embodiment can be used to temporarily hold an object. The adhesive sheet according to this embodiment can also be used to transfer an object. As a specific example, the adhesive sheet according to this embodiment can be used to transfer a semiconductor chip obtained by dicing to a desired position.

 本実施形態に係る粘着シートを用いた物体の取り扱い方法について、図7のフローチャートを参照して説明する。 The method for handling an object using the adhesive sheet according to this embodiment will be described with reference to the flowchart in Figure 7.

(S710:物体の保持)
 S710において、本実施形態に係る粘着シートの粘着層に物体を保持させる。なお、物体の種類は特に限定されない。物体は、例えば素子であってもよい。素子の例としては、LEDチップなどの半導体チップ、保護膜付き半導体チップ、及びダイアタッチフィルム(DAF)付き半導体チップなどが挙げられる。また、素子は、マイクロ発光ダイオード、ミニ発光ダイオード、パワーデバイス、MEMS(Micro Electro Mechanical Systems)、又はコントローラチップであってもよいし、これらの構成要素であってもよい。また、素子は、ウエハ、パネル、又は基板等の個片化物であってもよい。素子は、例えば、トランジスタ、抵抗、及びコンデンサ等の回路物体を有する集積回路が形成されている回路面を有していてもよい。また、素子は、必ずしも個片化物には限定されず、個片化されていない各種ウエハ又は各種基板等であってもよい。
(S710: Holding an object)
In S710, an object is held on the adhesive layer of the adhesive sheet according to this embodiment. The type of object is not particularly limited. The object may be, for example, an element. Examples of elements include semiconductor chips such as LED chips, semiconductor chips with protective films, and semiconductor chips with die attach films (DAFs). The element may also be a micro light-emitting diode, a mini light-emitting diode, a power device, a MEMS (Micro Electro Mechanical Systems), or a controller chip, or a component thereof. The element may also be a singulated object such as a wafer, panel, or substrate. The element may have a circuit surface on which an integrated circuit having circuit elements such as transistors, resistors, and capacitors is formed. The element is not necessarily limited to a singulated object, but may also be various unsingulated wafers or substrates.

 また、物体のサイズも特に限定されない。物体のサイズは、例えば、好ましくは100μm以上、より好ましくは500μm以上、さらに好ましくは1000μm以上である。一方で、物体のサイズは、好ましくは100mm以下、より好ましくは25mm以下、さらに好ましくは1mm以下である。 The size of the object is not particularly limited. For example, the size of the object is preferably 100 μm 2 or more, more preferably 500 μm 2 or more, and even more preferably 1000 μm 2 or more. On the other hand, the size of the object is preferably 100 mm 2 or less, more preferably 25 mm 2 or less, and even more preferably 1 mm 2 or less.

 ウエハとしては、例えば、シリコンウエハ、シリコンカーバイド(SiC)ウエハ、化合物半導体ウエハ(例えば、リン化ガリウム(GaP)ウエハ、砒化ガリウム(GaAs)ウエハ、リン化インジウム(InP)ウエハ、窒化ガリウム(GaN)ウエハ)等の半導体ウエハが挙げられる。ウエハのサイズは、特に限定されないが、好ましくは6インチ(直径約150mm)以上、より好ましくは12インチ(直径約300mm)以上である。なお、ウエハの形状は、円形には限定されず、例えば正方形又は長方形等の角型であってもよい。 Examples of wafers include semiconductor wafers such as silicon wafers, silicon carbide (SiC) wafers, and compound semiconductor wafers (e.g., gallium phosphide (GaP) wafers, gallium arsenide (GaAs) wafers, indium phosphide (InP) wafers, and gallium nitride (GaN) wafers). The size of the wafer is not particularly limited, but is preferably 6 inches (diameter approximately 150 mm) or larger, and more preferably 12 inches (diameter approximately 300 mm) or larger. The shape of the wafer is not limited to circular, and may be angular, such as square or rectangular.

 パネルとしては、ファンアウト型の半導体パッケージ(例えばFOWLP又はFOPLP)が挙げられる。すなわち、被処理物は、ファンアウト型の半導体パッケージ製造技術における個片化前又は個片化後の半導体パッケージであってもよい。パネルのサイズは、特に限定されないが、例えば300から700mm程度の角型の基板であってもよい。 An example of a panel is a fan-out type semiconductor package (e.g., FOWLP or FOPLP). In other words, the workpiece may be a semiconductor package before or after singulation in fan-out type semiconductor package manufacturing technology. The size of the panel is not particularly limited, but may be, for example, a rectangular substrate of approximately 300 to 700 mm.

 基板としては、ガラス基板、サファイア基板、又は化合物半導体基板等が挙げられる。 Examples of substrates include glass substrates, sapphire substrates, and compound semiconductor substrates.

 一実施形態においては、保持基板から粘着シートへと素子が転写され、粘着シートは転写された素子を保持する。例えば、ウエハ基板上に半導体ウエハを貼り付け、さらに半導体ウエハをダイシングすることができる。そして、ダイシングにより得られたウエハ基板上の素子と粘着シートの粘着層110とを密着させることができる。その後、レーザ光等の外部刺激を与えることにより、ウエハ基板と素子との接着性を低下させることができる。このような工程により、素子をウエハ基板から粘着シートに転写することができる。別の方法として、半導体ウエハをダイシングすることにより得られた素子を、保持基板に転写することにより、素子が貼着されている保持基板を得ることができる。そして、保持基板に貼着されている素子を、同様の方法で粘着シートの粘着層110に転写することができる。 In one embodiment, elements are transferred from a holding substrate to an adhesive sheet, and the adhesive sheet holds the transferred elements. For example, a semiconductor wafer can be attached to a wafer substrate, and the semiconductor wafer can then be diced. The elements on the wafer substrate obtained by dicing can then be brought into close contact with adhesive layer 110 of the adhesive sheet. Thereafter, an external stimulus such as laser light can be applied to reduce the adhesion between the wafer substrate and the elements. This process allows the elements to be transferred from the wafer substrate to the adhesive sheet. As an alternative method, elements obtained by dicing a semiconductor wafer can be transferred to a holding substrate, thereby obtaining a holding substrate with elements attached thereto. The elements attached to the holding substrate can then be transferred to adhesive layer 110 of the adhesive sheet in a similar manner.

 別の実施形態においては、外部刺激により、保持基板に貼着されている素子を保持基板から分離させてもよい。具体的には、素子が保持基板に対して相対的に離れる。また、素子が粘着シートに対して相対的に近づく。そして、素子と粘着シートの粘着層110とが接触することにより、素子は保持基板から分離され粘着シートにおいて捕捉される。外部刺激の種類は特に限定されないが、例えば、エネルギー付与、冷却、保持基板の拡張、及び物理的刺激(例えば保持基板の裏面へのピン等を用いた押圧)等が挙げられる。これらの外部刺激のうちの1以上を用いることにより、保持基板と素子との結合力を低下させ、そして素子を保持基板から分離させることができる。例えば、レーザ光の照射により素子を保持基板から分離させることができる(レーザリフトオフ法)。このような実施形態においては、分離した素子が粘着層110に近づく際に、素子と粘着層110との間に圧力が生じる。しかしながら、粘着層110の表面が凹凸を有することにより、素子と粘着層110との間に生じる圧力が緩和されるため、素子を粘着シートの所望の位置において捕捉することがより容易になる。 In another embodiment, an external stimulus may be used to separate an element attached to a holding substrate from the holding substrate. Specifically, the element moves away from the holding substrate. Alternatively, the element moves closer to the adhesive sheet. Then, when the element comes into contact with the adhesive layer 110 of the adhesive sheet, the element is separated from the holding substrate and captured by the adhesive sheet. The type of external stimulus is not particularly limited, but examples include application of energy, cooling, expansion of the holding substrate, and physical stimulation (e.g., pressing the back surface of the holding substrate with a pin, etc.). By using one or more of these external stimuli, the bonding force between the holding substrate and the element can be reduced, and the element can be separated from the holding substrate. For example, the element can be separated from the holding substrate by irradiation with laser light (laser lift-off method). In such an embodiment, when the separated element approaches the adhesive layer 110, pressure is generated between the element and the adhesive layer 110. However, the uneven surface of the adhesive layer 110 reduces the pressure generated between the element and the adhesive layer 110, making it easier to capture the element at the desired position on the adhesive sheet.

 さらなる実施形態においては、粘着シートの粘着層110上に保持されている物体に対する処理を行うことができる。処理の方法は特に限定されない。例えば、配線の形成、バックメタル形成、洗浄、メッキ処理、個片化、薄膜化、及び封止などの処理を行うことができる。例えば、粘着シートの粘着層110に半導体ウエハを貼り付けてもよい。そして、粘着層110上の半導体ウエハをダイシングすることにより、素子を形成することができる。このような方法によっても、粘着シートは素子を保持することができる。 In a further embodiment, an object held on the adhesive layer 110 of the adhesive sheet can be processed. The processing method is not particularly limited. For example, processing such as wiring formation, back metal formation, cleaning, plating, singulation, thinning, and sealing can be performed. For example, a semiconductor wafer can be attached to the adhesive layer 110 of the adhesive sheet. Then, elements can be formed by dicing the semiconductor wafer on the adhesive layer 110. This method also allows the adhesive sheet to hold elements.

(S720:粘着力低下処理)
 S720においては、物体を保持している粘着層110の粘着力を低下させる。粘着力を低下させるためには、粘着層110に対してエネルギー線を照射する処理工程と、粘着シートを面方向に拡張する拡張工程と、を行うことができる。エネルギー線反応性の粘着層110に対してエネルギー線を照射することにより、粘着層110の貯蔵弾性率が増加し、粘着力は低下する。また、粘着シートを面方向に拡張することにより、上述のように粘着層110による物体の保持力が低下する。
(S720: Adhesion reduction process)
In S720, the adhesive strength of the adhesive layer 110 holding the object is reduced. To reduce the adhesive strength, a treatment step of irradiating the adhesive layer 110 with energy rays and an expansion step of expanding the adhesive sheet in the planar direction can be performed. By irradiating the energy ray-reactive adhesive layer 110 with energy rays, the storage modulus of the adhesive layer 110 increases and the adhesive strength is reduced. Furthermore, by expanding the adhesive sheet in the planar direction, the holding strength of the adhesive layer 110 to the object is reduced as described above.

 処理工程において付与するエネルギー線の量は、粘着層110の種類、及び所望の粘着力に応じて設定することができる。例えば、紫外線を照射する場合、紫外線の光量は、十分に粘着力を低下させる観点から、20mJ/cm以上であることが好ましく、100mJ/cm以上であることがより好ましい。また、紫外線の光量は、処理時間を短くする観点から、1000mJ/cm以下であることが好ましく、500mJ/cm以下であることがより好ましい。 The amount of energy rays applied in the treatment step can be set depending on the type of adhesive layer 110 and the desired adhesive strength. For example, when irradiating with ultraviolet light, the amount of ultraviolet light is preferably 20 mJ/ cm2 or more, and more preferably 100 mJ/ cm2 or more, from the viewpoint of sufficiently reducing the adhesive strength. Furthermore, the amount of ultraviolet light is preferably 1000 mJ/ cm2 or less, and more preferably 500 mJ/ cm2 or less, from the viewpoint of shortening the treatment time.

 拡張工程においては、粘着シートが面方向に拡張される。粘着シートの拡張方法は特に限定されない。例えば、粘着シートの拡張は1方向に行われてもよく、2方向に行われてもよく、その他複数方向に行われてもよい。粘着シートの拡張率も特に限定されない。例えば、物体の保持力を十分に低下させる観点から、粘着シートの1方向への拡張率は、1%以上であってもよく、5%以上であってもよい。また、粘着シートの破断を防ぐ観点から、粘着シートの1方向への拡張率は、50%以下であってもよく、20%以下であってもよい。同様の観点から、粘着シートの互いに直交する2方向への拡張率は、1%以上であってもよく、5%以上であってもよく、一方で50%以下であってもよく、20%以下であってもよい。 In the expansion process, the adhesive sheet is expanded in the planar direction. The method for expanding the adhesive sheet is not particularly limited. For example, the adhesive sheet may be expanded in one direction, two directions, or multiple other directions. The expansion rate of the adhesive sheet is also not particularly limited. For example, from the perspective of sufficiently reducing the holding force of the object, the expansion rate of the adhesive sheet in one direction may be 1% or more, or 5% or more. Furthermore, from the perspective of preventing the adhesive sheet from breaking, the expansion rate of the adhesive sheet in one direction may be 50% or less, or 20% or less. From a similar perspective, the expansion rate of the adhesive sheet in two mutually perpendicular directions may be 1% or more, or 5% or more, or may be 50% or less, or 20% or less.

 具体例として、粘着シートをフレームに固定し、フレーム内の粘着シートに台座を押し当てることにより、粘着シートを拡張することができる。このような例について図5A~5Bを参照して説明する。図5Aは、粘着シートが物体140a~140dを保持している状態を示す。図5Aに示すように、粘着シートの外周部をフレーム320に固定することができる。フレーム320の形状は特に限定されない。例えば、フレーム320は、開口部を有する、円形又は矩形の枠状部材であってもよい。一実施形態においては、フレームとして円形のリングフレームが用いられる。リングフレームを用いることにより、粘着シートを全方向に拡張することができる。 As a specific example, the adhesive sheet can be expanded by fixing the adhesive sheet to a frame and pressing a base against the adhesive sheet inside the frame. Such an example will be described with reference to Figures 5A and 5B. Figure 5A shows a state in which the adhesive sheet holds objects 140a to 140d. As shown in Figure 5A, the outer periphery of the adhesive sheet can be fixed to frame 320. The shape of frame 320 is not particularly limited. For example, frame 320 may be a circular or rectangular frame-shaped member with an opening. In one embodiment, a circular ring frame is used as the frame. Using a ring frame allows the adhesive sheet to expand in all directions.

 そして、フレーム320に固定された粘着シートを台座310に接触させ、さらに図5Bに示されるようにフレーム320を台座310側に変位させる(引き落とす)ことにより、粘着シートを拡張することができる。なお、台座310の構成は特に限定されず、例えば円筒形状又は直方体形状を有していてもよい。また、台座310はメッシュ状又はリング状であってもよい。フレーム320は、台座310に対して、例えば、0.1mm/sec以上の速さで変位してもよいし、1mm/sec以上の速さで変位してもよい。この場合、フレーム320の変位量、すなわち引き落とし量は、物体の保持力を十分に低下させる観点から、例えば、1mm以上でもよいし、5mm以上でもよい。一方で、フレーム320の変位量は、粘着シートの破損を抑制する観点から、30mm以下でもよいし、20mm以下でもよい。 The adhesive sheet fixed to frame 320 can then be expanded by contacting the base 310 with the base, and then displacing (pulling down) frame 320 toward base 310 as shown in FIG. 5B. The configuration of base 310 is not particularly limited, and may be, for example, cylindrical or rectangular. Base 310 may also be mesh-shaped or ring-shaped. Frame 320 may be displaced relative to base 310 at a speed of, for example, 0.1 mm/sec or more, or 1 mm/sec or more. In this case, the displacement amount of frame 320, i.e., the pull-down amount, may be, for example, 1 mm or more, or 5 mm or more, from the viewpoint of sufficiently reducing the object holding force. On the other hand, the displacement amount of frame 320 may be 30 mm or less, or 20 mm or less, from the viewpoint of preventing damage to the adhesive sheet.

(S730:物体の剥離)
 粘着層110の粘着力を低下させた後に、S730では、粘着シートの粘着層110から物体を剥離する。例えば、処理工程及び拡張工程が行われた後に、粘着シートの粘着層110から物体を剥離することができる。物体の剥離方法は特に限定されない。例えば、保持基板に貼着されている物体を粘着シートに転写する方法として上述した方法を用いることができる。一例として、真空コレットのような吸着部材を用いて物体を粘着シートの粘着層110から剥離することができる。そして、吸着した物体を転写先の所望の位置へと移動させることができる。本実施形態のように粘着層110による保持力を低下させることにより、粘着シートの粘着層110の反対面からピン等を用いた押圧のような物理的刺激を加えることなく、物体を粘着シートの粘着層110から剥離することができる。もっとも、粘着シートの粘着層110の反対面から物理的刺激を加えながら、物体を粘着シートの粘着層110から剥離してもよい。
(S730: Peeling off the object)
After reducing the adhesive force of the adhesive layer 110, in S730, the object is peeled from the adhesive layer 110 of the adhesive sheet. For example, the object can be peeled from the adhesive layer 110 of the adhesive sheet after the treatment process and the expansion process have been performed. The method for peeling the object is not particularly limited. For example, the method described above can be used to transfer an object attached to a holding substrate to an adhesive sheet. As an example, the object can be peeled from the adhesive layer 110 of the adhesive sheet using an adsorption member such as a vacuum collet. The adsorbed object can then be moved to a desired transfer location. By reducing the holding force of the adhesive layer 110 as in this embodiment, the object can be peeled from the adhesive layer 110 of the adhesive sheet without applying a physical stimulus, such as pressure from the opposite side of the adhesive layer 110 using a pin or the like. However, the object may also be peeled from the adhesive layer 110 of the adhesive sheet while applying a physical stimulus from the opposite side of the adhesive layer 110 of the adhesive sheet.

 なお、本願発明者らの検討によれば、物体を粘着層110から剥離しようとする際に、粘着層110の保持力の高さに合わせて吸着力を増加させると、素子のような物体が破損しやすくなる。特に、素子などの薄い物体を剥離する際には、吸着力を増加させることにより物体がより破損しやすくなる。一方で、粘着層110の粘着力を低下させると、粘着層110における物体の保持力が低下する。例えば、ダイシングにより得られた素子をウエハ基板から粘着シートに転写する場合、粘着層110の粘着力が低いと、素子の一部がウエハ基板に残る可能性がある。本実施形態においては、粘着力を低下させる処理を用いることにより、粘着シートに物体を保持させる際における粘着層110の高い保持力と、粘着シートから物体を剥離する際における粘着層110の低い保持力と、をともに達成することができる。このような観点から、本実施形態の取り扱い方法、及び本実施形態の粘着シートは、薄い物体を取り扱うために適している。例えば、粘着シートが保持する物体の厚さは、50μm以下であることが好ましく、30μm以下であることがより好ましく、10μm以下であることがさらに好ましい。 According to the inventors' investigations, when attempting to peel an object from the adhesive layer 110, increasing the suction force in accordance with the holding power of the adhesive layer 110 makes the object, such as a device, more susceptible to damage. In particular, when peeling a thin object such as a device, increasing the suction force makes the object more susceptible to damage. On the other hand, decreasing the adhesive power of the adhesive layer 110 reduces the holding power of the object in the adhesive layer 110. For example, when transferring devices obtained by dicing from a wafer substrate to an adhesive sheet, if the adhesive power of the adhesive layer 110 is low, part of the device may remain on the wafer substrate. In this embodiment, by using a process that reduces the adhesive power, it is possible to achieve both high holding power of the adhesive layer 110 when holding an object on the adhesive sheet and low holding power of the adhesive layer 110 when peeling the object from the adhesive sheet. From this perspective, the handling method and adhesive sheet of this embodiment are suitable for handling thin objects. For example, the thickness of the object held by the adhesive sheet is preferably 50 μm or less, more preferably 30 μm or less, and even more preferably 10 μm or less.

 上記のような手順により、粘着シートを用いて、物体を任意の転写先へと転写することができる。また、本発明の一実施形態は、粘着層に物体を保持している粘着シートからの物体の剥離方法に関する。このような剥離方法は、S720のような粘着力を低下させる工程と、S730のような物体を剥離する工程と、を含むことができる。 By using the above-described procedure, an object can be transferred to any desired destination using an adhesive sheet. One embodiment of the present invention relates to a method for peeling an object from an adhesive sheet holding the object on the adhesive layer. Such a peeling method can include a step of reducing adhesive strength as in S720, and a step of peeling the object as in S730.

 また、このような剥離方法を用いて、素子を有する電子部品又は半導体装置を製造することができる。例えば、本発明の一実施形態に係る物品の製造方法は、上記の剥離方法に従って粘着シートから物体を剥離する工程に加えて、物体に対して後処理を行うことにより物品を製造する工程を含むことができる。図7の例では、S740において、物体に対する後処理工程が行われる。後処理の種類は特に限定されない。例えば、配線の形成、バックメタル形成、洗浄、メッキ処理、個片化、薄膜化、及び封止などの処理を行うことができる。 Furthermore, such a peeling method can be used to manufacture electronic components or semiconductor devices having elements. For example, a method for manufacturing an article according to one embodiment of the present invention can include, in addition to the step of peeling an object from an adhesive sheet according to the above-described peeling method, a step of manufacturing the article by performing post-processing on the object. In the example of Figure 7, in S740, a post-processing step is performed on the object. The type of post-processing is not particularly limited. For example, processes such as wiring formation, backmetal formation, cleaning, plating, singulation, thinning, and sealing can be performed.

 以下、実施例を挙げて本発明を更に詳細に説明する。ただし、本発明は、以下の実施例になんら限定されるものではない。 The present invention will be explained in more detail below using examples. However, the present invention is not limited to the following examples in any way.

 実施例及び比較例においては以下の化合物を使用した。
<(A)成分:アクリル酸エステル共重合体>
 アクリル酸エステル共重合体としては、以下のものを用いた。
(A1)ブチルアクリレート系樹脂(単量体質量比:ブチルアクリレート/メチルメタクリレート/2-ヒドロキシエチルアクリレート=52/20/28)に対して、2-ヒドロキシエチルアクリレートに対して90%当量の2-イソシアナトエチルメタクリレートを反応させることにより、ヒドロキシ基を介してポリマー側鎖にエネルギー線硬化性基を導入したもの(エネルギー線硬化性基含有単量体の共重合率:25.6%、質量平均分子量(Mw):520000、数平均分子量(Mn):155000)
(A2)ブチルアクリレート系樹脂(単量体質量比:ブチルアクリレート/メチルメタクリレート/2-ヒドロキシエチルアクリレート=62/10/28)に対して、2-ヒドロキシエチルアクリレートに対して80%当量の2-イソシアナトエチルメタクリレートを反応させることにより、ヒドロキシ基を介してポリマー側鎖にエネルギー線硬化性基を導入したもの(エネルギー線硬化性基含有単量体の共重合率:23.4%、質量平均分子量(Mw):715000、数平均分子量(Mn):139000)
(A3)2-エチルヘキシルアクリレート系樹脂(単量体質量比:2-エチルヘキシルアクリレート/2-ヒドロキシエチルアクリレート=80/20)に対して、2-ヒドロキシエチルアクリレートに対して80%当量の2-イソシアナトエチルメタクリレートを反応させることにより、ヒドロキシ基を介してポリマー側鎖にエネルギー線硬化性基を導入したもの(エネルギー線硬化性基含有単量体の共重合率:22.7%、数平均分子量(Mn):86400)
The following compounds were used in the examples and comparative examples.
<Component (A): Acrylic Ester Copolymer>
The following acrylic acid ester copolymers were used.
(A1) A butyl acrylate resin (monomer mass ratio: butyl acrylate/methyl methacrylate/2-hydroxyethyl acrylate=52/20/28) was reacted with 2-isocyanatoethyl methacrylate in an amount of 90% equivalent to the 2-hydroxyethyl acrylate, thereby introducing an energy ray-curable group into the polymer side chain via the hydroxy group (copolymerization rate of energy ray-curable group-containing monomer: 25.6%, mass average molecular weight (Mw): 520,000, number average molecular weight (Mn): 155,000).
(A2) A butyl acrylate resin (monomer mass ratio: butyl acrylate/methyl methacrylate/2-hydroxyethyl acrylate=62/10/28) was reacted with 2-isocyanatoethyl methacrylate in an amount of 80% equivalent to the 2-hydroxyethyl acrylate, thereby introducing an energy ray-curable group into the polymer side chain via the hydroxy group (copolymerization rate of energy ray-curable group-containing monomer: 23.4%, mass average molecular weight (Mw): 715,000, number average molecular weight (Mn): 139,000).
(A3) A 2-ethylhexyl acrylate resin (monomer mass ratio: 2-ethylhexyl acrylate/2-hydroxyethyl acrylate=80/20) was reacted with 2-isocyanatoethyl methacrylate in an amount of 80% equivalent to the 2-hydroxyethyl acrylate, thereby introducing an energy ray-curable group into the polymer side chain via the hydroxy group (copolymerization rate of energy ray-curable group-containing monomer: 22.7%, number average molecular weight (Mn): 86,400).

<(B)成分:熱架橋剤>
 架橋剤としては、ヘキサメチレンジイソシアネートから誘導されるイソシアヌレート型ポリイソシアネートを用いた。
<Component (B): Thermal Crosslinking Agent>
As the crosslinking agent, an isocyanurate type polyisocyanate derived from hexamethylene diisocyanate was used.

(実施例1~5)
 表1に示す量のアクリル酸エステル共重合体(A1)又は(A2)、並びに架橋剤(B)をトルエンに溶解することにより、粘着剤組成物を調製した。表1には各材料の固形分質量部が示されている。
Examples 1 to 5
A pressure-sensitive adhesive composition was prepared by dissolving the acrylic acid ester copolymer (A1) or (A2) and the crosslinking agent (B) in toluene in the amounts shown in Table 1. Table 1 shows the solid content parts by mass of each material.

 この粘着剤組成物を凹形状が形成された剥離基材(微細エンボス剥離シート)の剥離処理面に塗工し、得られた塗膜を100℃で2分間乾燥することにより、厚さ25μmの粘着層を形成した。形成された粘着層が表面に有する凹凸形状は、図2Aと同様にピラーが格子状に配置された形状であった。粘着シートにおけるピラー間のピッチPは20μmであった。また、図4Aに示される、それぞれのピラーの高さ(H)は8μm、先端部の直径(T)は8μm、基部の直径(W)は16μmであった。なお、上記剥離シートとしては、このような凹凸形状と相補的な凹形状を表面に有するものを使用した。 This adhesive composition was applied to the release-treated surface of a release substrate (fine-embossed release sheet) with a concave pattern, and the resulting coating was dried at 100°C for 2 minutes to form an adhesive layer with a thickness of 25 μm. The concave-convex pattern on the surface of the formed adhesive layer was a grid-like arrangement of pillars, similar to Figure 2A. The pitch P between pillars on the adhesive sheet was 20 μm. Furthermore, as shown in Figure 4A, each pillar had a height (H) of 8 μm, a tip diameter (T) of 8 μm, and a base diameter (W) of 16 μm. The release sheet used above had a concave pattern on its surface that was complementary to the concave-convex pattern.

 こうして得られた粘着層上に、基材(エチレンメタクリル酸共重合体(EMAA)フィルム、酸含有率9質量%、片方の表面をエンボス処理で梨地にしたもの、厚さ80μm、引張弾性率160MPa)を貼り合わせることにより、粘着シートを作製した。 An adhesive sheet was produced by laminating a substrate (ethylene methacrylic acid copolymer (EMAA) film, acid content 9% by mass, one surface embossed to give it a matte finish, thickness 80 μm, tensile modulus 160 MPa) onto the adhesive layer thus obtained.

(比較例1~2)
 表1に示す量のアクリル酸エステル共重合体(A3)及び架橋剤(B)をトルエンに溶解することにより、粘着剤組成物を調製したことを除き、実施例1と同様に粘着剤組成物を調製し、粘着シートを作製した。
(Comparative Examples 1 and 2)
A pressure-sensitive adhesive composition was prepared in the same manner as in Example 1, except that the amounts of acrylic acid ester copolymer (A3) and crosslinking agent (B) shown in Table 1 were dissolved in toluene to prepare the pressure-sensitive adhesive composition, and a pressure-sensitive adhesive sheet was produced.

(粘着層の弾性率測定方法)
 各実施例及び比較例に係る粘着層の貯蔵弾性率及びtanδの測定は以下のように行った。すなわち、各実施例で用いた粘着剤組成物を塗布し、得られた塗膜を100℃で2分間乾燥することにより、厚さ25μmの粘着層を形成した。このように形成された粘着層を厚さ1mmとなるように積層した。そして、紫外線照射機(へレウス社製)を用いて、照度:130mW/cm、光量:210mJ/cmで積層体に紫外線を照射することにより粘着層のエネルギー線硬化性基を架橋させた。得られた粘着層を直径8mmの円柱状に打ち抜くことにより、動的粘弾性測定用のサンプルを作製した。
(Method for measuring elastic modulus of adhesive layer)
The storage modulus and tan δ of the adhesive layers in each Example and Comparative Example were measured as follows. Specifically, the adhesive composition used in each Example was applied, and the resulting coating was dried at 100°C for 2 minutes to form an adhesive layer with a thickness of 25 μm. The adhesive layers thus formed were laminated to a thickness of 1 mm. Then, using an ultraviolet irradiator (manufactured by Heraeus), the laminate was irradiated with ultraviolet light at an illuminance of 130 mW/ cm2 and a light dose of 210 mJ/ cm2 , thereby crosslinking the energy beam-curable groups in the adhesive layer. The resulting adhesive layer was punched into a cylindrical shape with a diameter of 8 mm to prepare a sample for dynamic viscoelasticity measurement.

 得られたサンプルに対して、JIS K7244-7:2007に従うねじり振動法により動的粘弾性測定を行った。具体的には、粘弾性測定装置(Rheometrics社製、装置名「DYNAMIC ANALYZER RDAII」)を用い、10Hzの振動を与え、-30℃から120℃まで試料の温度を昇温させながら測定を行うことにより、各温度における貯蔵弾性率E’及び損失弾性率E’’を測定した。各温度における損失正接tanδは、E’’/E’により表される。 Dynamic viscoelasticity measurements were performed on the obtained samples using the torsional vibration method in accordance with JIS K7244-7:2007. Specifically, a viscoelasticity measuring device (Rheometrics, device name "DYNAMIC ANALYZER RDAII") was used to apply a 10 Hz vibration and measure the sample while raising its temperature from -30°C to 120°C, thereby measuring the storage modulus E' and loss modulus E'' at each temperature. The loss tangent tanδ at each temperature is expressed as E''/E'.

(ピックアップ性評価)
 各実施例及び比較例で得られた粘着シートに保持された物体のピックアップ性評価を以下のように行った。以下に示すように、物体としては、厚さ150μmのシリコンチップ及び厚さ50μmのシリコンチップのそれぞれを用いた。
(Pickup property evaluation)
The pickup properties of the objects held by the pressure-sensitive adhesive sheets obtained in each of the Examples and Comparative Examples were evaluated as follows: As shown below, the objects used were silicon chips having a thickness of 150 μm and silicon chips having a thickness of 50 μm.

 まず、各実施例及び比較例で得られた粘着シートをリングフレーム(ステンレス製、内径194mm)に貼着し、リングフレームの外径に合わせて粘着シートを裁断した。次に、ウエハ基板(研削したシリコンウエハ、6インチ、厚さ150μm又は50μm)を別途用意したダイシングテープに固定した。そして、ウエハ基板を8mm×8mmの正方形にダイシングすることにより、複数の素子(シリコンチップ、素子のサイズは8mm×8mm×50μm又は150μm)を得た。得られた複数の素子を、研削面が粘着層の凹凸面に貼着されるように、上記のリングフレームの内側の中央部分において粘着シートの粘着層に貼着した。貼着は、常温(23℃)でラミネートすることにより行われた。そして、ダイシングテープを剥離することにより、複数の素子をダイシングテープから粘着シートに転写した。こうして、評価用サンプルとして、複数の素子が載置され、リングフレームで支持されている粘着シートが得られた。 First, the adhesive sheet obtained in each example and comparative example was attached to a ring frame (stainless steel, inner diameter 194 mm), and the adhesive sheet was cut to fit the outer diameter of the ring frame. Next, a wafer substrate (ground silicon wafer, 6 inches, 150 μm or 50 μm thick) was fixed to separately prepared dicing tape. The wafer substrate was then diced into 8 mm x 8 mm squares to obtain multiple elements (silicon chips, element size 8 mm x 8 mm x 50 μm or 150 μm). The resulting multiple elements were attached to the adhesive layer of the adhesive sheet in the center of the inner side of the ring frame, with the ground surface attached to the uneven surface of the adhesive layer. Attachment was performed by lamination at room temperature (23°C). The dicing tape was then peeled off, transferring the multiple elements from the dicing tape to the adhesive sheet. In this way, an adhesive sheet with multiple elements mounted thereon and supported by a ring frame was obtained as an evaluation sample.

 得られた評価用サンプルに対して、紫外線照射機(へレウス社製)を用いて、照度130mW/cm、光量210mJ/cmで紫外線を照射した。 The obtained evaluation sample was irradiated with ultraviolet light at an illuminance of 130 mW/cm 2 and a light quantity of 210 mJ/cm 2 using an ultraviolet irradiator (manufactured by Heraeus).

 紫外線照射後の評価用サンプルをピックアップ装置(キヤノンマシナリー株式会社製、製品名「BESTEM-D510」)にセットした。粘着シートを拡張した後に、真空吸着コレットを用いた素子のピックアップを試みた。なお、粘着シートの拡張は、図5A~5Bに示すように行った。すなわち、粘着シート越しに素子を台座310で支えている状態で、リングフレームであるフレーム320を、台座310に対して10mm引き落とすことによって、粘着シートを拡張した。また、この評価においては、粘着シートの、吸着しようとする素子とは反対側の面(基材)をニードルで突くことなく、素子をピックアップできるか否かを評価した。素子を破損することなくピックアップできた場合には、ピックアップが可能であった(A)と評価した。ピックアップの際に素子が破損した、素子をピックアップできない、又はウエハ基板から粘着シートへの素子の転写に失敗した場合には、ピックアップできなかった(F)と評価した。 After UV irradiation, the evaluation sample was placed in a pickup device (Canon Machinery Inc., product name "BESTEM-D510"). After expanding the adhesive sheet, an attempt was made to pick up the element using a vacuum suction collet. The adhesive sheet was expanded as shown in Figures 5A and 5B. That is, with the element supported by base 310 over the adhesive sheet, ring frame 320 was pulled down 10 mm relative to base 310, expanding the adhesive sheet. This evaluation also assessed whether the element could be picked up without poking the surface (substrate) of the adhesive sheet opposite the element to be picked up with a needle. If the element could be picked up without damage, it was evaluated as "pickup possible" (A). If the element was damaged during pickup, could not be picked up, or transfer of the element from the wafer substrate to the adhesive sheet failed, it was evaluated as "pickup impossible" (F).

 これらの評価結果を表1に示す。
The evaluation results are shown in Table 1.

 表1に示すように、実施例1~5に係る粘着シートからは、厚さ50μmのような薄く破損しやすい素子をニードルを用いずにピックアップすることができた。一方で、ダイシングテープから実施例1~5に係る粘着シートへは全ての素子が転写され、実施例1~5に係る粘着シートが十分な粘着力を有していることが確認された。また、比較例1~2に係る粘着シートからは、素子を破損せずにピックアップすることができなかった。これは、比較例1~2に係る粘着シートは、紫外線照射後においても粘着力が高いため、ピックアップのために大きな吸着力を用いる必要があるためと考えられた。このように、粘着層が含むアクリル酸エステル共重合体中のエネルギー線硬化性基含有単量体の共重合率を23.0%以上とすることにより、紫外線照射による粘着力の低下を促進し、粘着シートからの物体のピックアップが容易になることが確認された。 As shown in Table 1, thin, easily breakable elements, such as those 50 μm thick, could be picked up from the adhesive sheets of Examples 1 to 5 without using a needle. Meanwhile, all elements were transferred from the dicing tape to the adhesive sheets of Examples 1 to 5, confirming that the adhesive sheets of Examples 1 to 5 have sufficient adhesive strength. Furthermore, elements could not be picked up from the adhesive sheets of Comparative Examples 1 and 2 without damaging them. This is thought to be because the adhesive sheets of Comparative Examples 1 and 2 have high adhesive strength even after UV irradiation, necessitating the use of a large adsorption force for pickup. Thus, it was confirmed that by setting the copolymerization rate of the energy beam-curable group-containing monomer in the acrylic acid ester copolymer contained in the adhesive layer to 23.0% or more, the decrease in adhesive strength due to UV irradiation is promoted, making it easier to pick up objects from the adhesive sheet.

 発明は上記の実施形態に制限されるものではなく、発明の要旨の範囲内で、種々の変形・変更が可能である。 The invention is not limited to the above-described embodiments, and various modifications and variations are possible within the scope of the invention.

 本願は、2024年3月22日提出の日本国特許出願特願2024-046979、2024年3月22日提出の日本国特許出願特願2024-046980、2024年3月22日提出の日本国特許出願特願2024-046981、2024年3月22日提出の日本国特許出願特願2024-046982、2024年9月30日提出の日本国特許出願特願2024-170363、及び2024年9月30日提出の日本国特許出願特願2024-170369を基礎として優先権を主張するものであり、その記載内容の全てを、ここに援用する。 This application claims priority based on Japanese Patent Application No. 2024-046979 filed on March 22, 2024, Japanese Patent Application No. 2024-046980 filed on March 22, 2024, Japanese Patent Application No. 2024-046981 filed on March 22, 2024, Japanese Patent Application No. 2024-046982 filed on March 22, 2024, Japanese Patent Application No. 2024-170363 filed on September 30, 2024, and Japanese Patent Application No. 2024-170369 filed on September 30, 2024, the entire contents of which are incorporated herein by reference.

Claims (14)

 基材と、表面に凹凸を有する粘着層と、を備える粘着シートであって、
 前記粘着層はアクリル酸エステル共重合体を含み、前記アクリル酸エステル共重合体中の、エネルギー線硬化性基含有単量体の共重合率が20%以上50%以下である、粘着シート。
A pressure-sensitive adhesive sheet comprising a substrate and a pressure-sensitive adhesive layer having an uneven surface,
The pressure-sensitive adhesive sheet, wherein the pressure-sensitive adhesive layer contains an acrylic ester copolymer, and the copolymerization rate of the energy ray-curable group-containing monomer in the acrylic ester copolymer is 20% or more and 50% or less.
 前記アクリル酸エステル共重合体は、(メタ)アクリル酸エステル単量体である前記エネルギー線硬化性基含有単量体と、他の(メタ)アクリル酸エステル単量体と架橋された(メタ)アクリル酸エステル単量体と、を有する、請求項1に記載の粘着シート。 The pressure-sensitive adhesive sheet of claim 1, wherein the acrylic ester copolymer comprises the energy ray-curable group-containing monomer, which is a (meth)acrylic ester monomer, and a (meth)acrylic ester monomer crosslinked with another (meth)acrylic ester monomer.  前記エネルギー線硬化性基含有単量体は、ヒドロキシ基を介して側鎖に炭素-炭素二重結合含有基を有する(メタ)アクリル酸エステル単量体である、請求項2に記載の粘着シート。 The pressure-sensitive adhesive sheet according to claim 2, wherein the energy ray-curable group-containing monomer is a (meth)acrylic acid ester monomer having a carbon-carbon double bond-containing group in the side chain via a hydroxy group.  前記他の(メタ)アクリル酸エステル単量体と架橋された(メタ)アクリル酸エステル単量体は、ヒドロキシ基を介して前記他の(メタ)アクリル酸エステル単量体と架橋されている、請求項2に記載の粘着シート。 The pressure-sensitive adhesive sheet according to claim 2, wherein the (meth)acrylic acid ester monomer crosslinked with the other (meth)acrylic acid ester monomer is crosslinked with the other (meth)acrylic acid ester monomer via a hydroxy group.  前記粘着層を構成する成分の全量に対する、前記アクリル酸エステル共重合体の含有量が70~100質量%である、請求項1に記載の粘着シート。 The adhesive sheet according to claim 1, wherein the content of the acrylic ester copolymer relative to the total amount of components constituting the adhesive layer is 70 to 100 mass%.  前記アクリル酸エステル共重合体の質量平均分子量が10000以上である、請求項1に記載の粘着シート。 The pressure-sensitive adhesive sheet according to claim 1, wherein the acrylic ester copolymer has a mass average molecular weight of 10,000 or more.  前記粘着シートは面方向に拡張可能である、請求項1に記載の粘着シート。 The adhesive sheet according to claim 1, wherein the adhesive sheet is expandable in the planar direction.  前記粘着層が有する凸部の高さが1μm以上である、請求項1に記載の粘着シート。 The adhesive sheet of claim 1, wherein the height of the convex portions of the adhesive layer is 1 μm or more.  前記粘着層は、凹部によって境界が定められ、互いに離間している複数の凸部を有し、前記複数の凸部のピッチが1μm以上100μm以下である、請求項1に記載の粘着シート。 The adhesive sheet of claim 1, wherein the adhesive layer has a plurality of protrusions spaced apart from one another and bounded by recesses, and the pitch of the plurality of protrusions is 1 μm or more and 100 μm or less.  前記粘着層は複数の凸部を有し、前記複数の凸部の高さが均一である、請求項1に記載の粘着シート。 The adhesive sheet of claim 1, wherein the adhesive layer has multiple convex portions, and the heights of the multiple convex portions are uniform.  前記粘着層の凹凸面に相補的な凹凸面を備える剥離層をさらに備える、請求項1に記載の粘着シート。 The adhesive sheet of claim 1, further comprising a release layer having an uneven surface complementary to the uneven surface of the adhesive layer.  基材と、表面に凹凸を有する粘着層と、を備える粘着シートの製造方法であって、
 エネルギー線硬化性基を導入可能な単量体を有するアクリル酸エステル共重合体に対して、エネルギー線硬化性基導入剤を反応させることにより、前記エネルギー線硬化性基を導入可能な単量体にエネルギー線硬化性基を導入する工程を含む、粘着剤組成物を調製する調製工程と、
 前記粘着剤組成物を用いて前記基材上に前記粘着層を形成する形成工程と、
 を含み、
 前記アクリル酸エステル共重合体中の、前記エネルギー線硬化性基を導入可能な単量体の共重合率はR%であり、
 前記調製工程においては、前記エネルギー線硬化性基を導入可能な単量体に対して、R%当量のエネルギー線硬化性基導入剤を反応させ、
 R%とR%との積は23.0%以上50.0%以下である、製造方法。
A method for producing a pressure-sensitive adhesive sheet comprising a substrate and a pressure-sensitive adhesive layer having an uneven surface, comprising:
a preparation step of preparing a pressure-sensitive adhesive composition, the step including a step of reacting an energy ray-curable group-introducing agent with an acrylic acid ester copolymer having a monomer capable of introducing an energy ray-curable group, thereby introducing an energy ray-curable group into the monomer capable of introducing an energy ray-curable group;
a forming step of forming the adhesive layer on the substrate using the adhesive composition;
Including,
the copolymerization rate of the monomer capable of introducing an energy ray-curable group in the acrylic acid ester copolymer is R A %,
In the preparation step, the monomer capable of introducing an energy ray-curable group is reacted with an energy ray-curable group-introducing agent in an amount equivalent to RB %;
The production method, wherein the product of R A % and R B % is 23.0% or more and 50.0% or less.
 エネルギー線硬化性基を導入可能な(メタ)アクリル酸エステル単量体は、ヒドロキシ基を有する(メタ)アクリル酸エステル単量体であり、
 前記エネルギー線硬化性基導入剤は、炭素-炭素二重結合含有基を有するイソシアネート化合物である、請求項12に記載の製造方法。
The (meth)acrylic acid ester monomer into which an energy ray-curable group can be introduced is a (meth)acrylic acid ester monomer having a hydroxy group,
The method according to claim 12, wherein the energy ray-curable group-introducing agent is an isocyanate compound having a carbon-carbon double bond-containing group.
 粘着層に物体を保持している請求項1から11のいずれか1項に記載の粘着シートからの前記物体の剥離方法であって、
 前記粘着層にエネルギー線を照射する照射工程と、
 前記粘着シートを面方向に拡張する拡張工程と、
 前記物体を前記粘着シートの前記粘着層から剥離する剥離工程と、
 を含む、剥離方法。
A method for peeling an object from the adhesive sheet according to any one of claims 1 to 11, wherein the adhesive layer holds the object, comprising:
an irradiation step of irradiating the adhesive layer with energy rays;
an expanding step of expanding the pressure-sensitive adhesive sheet in a surface direction;
a peeling step of peeling the object from the adhesive layer of the adhesive sheet;
A peeling method comprising:
PCT/JP2025/011193 2024-03-22 2025-03-21 Adhesive sheet, method for manufacturing same, and method for peeling object from adhesive sheet Pending WO2025198044A1 (en)

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JP2024-046980 2024-03-22
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