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WO2025187619A1 - Thermally conductive silicone composition - Google Patents

Thermally conductive silicone composition

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Publication number
WO2025187619A1
WO2025187619A1 PCT/JP2025/007452 JP2025007452W WO2025187619A1 WO 2025187619 A1 WO2025187619 A1 WO 2025187619A1 JP 2025007452 W JP2025007452 W JP 2025007452W WO 2025187619 A1 WO2025187619 A1 WO 2025187619A1
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Prior art keywords
component
parts
mass
components
groups
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Pending
Application number
PCT/JP2025/007452
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French (fr)
Japanese (ja)
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WO2025187619A8 (en
Inventor
貴大 山口
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Shin Etsu Chemical Co Ltd
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Shin Etsu Chemical Co Ltd
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Publication of WO2025187619A1 publication Critical patent/WO2025187619A1/en
Publication of WO2025187619A8 publication Critical patent/WO2025187619A8/en
Pending legal-status Critical Current
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    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00Use of inorganic substances as compounding ingredients
    • C08K3/01Use of inorganic substances as compounding ingredients characterized by their specific function
    • C08K3/013Fillers, pigments or reinforcing additives
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00Use of inorganic substances as compounding ingredients
    • C08K3/02Elements
    • C08K3/08Metals
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00Use of inorganic substances as compounding ingredients
    • C08K3/18Oxygen-containing compounds, e.g. metal carbonyls
    • C08K3/20Oxides; Hydroxides
    • C08K3/22Oxides; Hydroxides of metals
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00Use of organic ingredients
    • C08K5/54Silicon-containing compounds
    • C08K5/541Silicon-containing compounds containing oxygen
    • C08K5/5415Silicon-containing compounds containing oxygen containing at least one Si—O bond
    • C08K5/5419Silicon-containing compounds containing oxygen containing at least one Si—O bond containing at least one Si—C bond
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L83/00Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon only; Compositions of derivatives of such polymers
    • C08L83/04Polysiloxanes

Definitions

  • the present invention relates to a thermally conductive silicone composition, specifically an addition-curable silicone composition that forms a cured product with excellent cold resistance. Specifically, the present invention relates to a thermally conductive silicone composition that forms a cured product with better cold resistance when used in low-temperature environments than the cured product of a typical thermally conductive silicone composition.
  • thermally conductive grease is particularly suitable because it is amorphous and exhibits high thermal conductivity by adhering to the substrate after curing.
  • a thermally conductive material is a heat-dissipating adhesive that is silicone-based and contains zinc oxide, aluminum, or alumina powder.
  • thermoelectrically conductive filler In order to create a silicone-based thermally conductive material with high thermal conductivity, it is necessary to highly fill it with thermally conductive filler. However, simply attempting to fill it highly will significantly reduce the fluidity of the thermoelectrically conductive material, making it difficult to work with, for example, in terms of application (dispensability, screen printing), and will also cause problems such as an inability to conform to the fine irregularities on the surfaces of electronic components and heat sinks. To solve this problem, a known method is to surface treat the thermally conductive filler with a wetter (dispersant) and disperse it into the silicone base polymer, thereby maintaining the fluidity of the thermally conductive material.
  • a wetter disperse it into the silicone base polymer
  • typical silicone materials exhibit a thermal expansion trend that deviates from a constant rate of increase around -40°C, generating stress at the interface of the heat-dissipating material, especially when the temperature is repeatedly changed between low and high temperatures. This causes the interface to deteriorate when the temperature is repeatedly changed between low and high temperatures, resulting in reduced heat dissipation performance.
  • the object of the present invention is to provide a thermally conductive silicone composition that cures into a stable product even in low-temperature environments.
  • the object is to provide a thermally conductive silicone composition that exhibits a constant rate of thermal expansion change at temperatures around -40°C without showing any tendency to deviate from a constant rate of increase, and that can relieve stress on the substrate.
  • the silicone composition described below exhibits a constant rate of expansion at around -40°C without any tendency to deviate from a constant rate of increase, and that it does not experience changes in thickness in the low temperature range compared to conventional thermally conductive silicone compositions, thereby completing the present invention. That is, the present invention provides the following thermally conductive silicone composition.
  • a thermally conductive silicone composition comprising the following components (A), (B), (C), (D), (E), (F), (G), and (H): (A) Organopolysiloxanes having per molecule a silicon atom to which at least two aliphatic unsaturated hydrocarbon groups are bonded, and one or more silicon atoms in the molecular chain having an aromatic hydrocarbon group, and having a kinematic viscosity at 25°C of 50 to 100,000 mm 2 /s.
  • R1 is a monovalent hydrocarbon group having 1 to 20 carbon atoms which may have a substituent, and R1 's may be the same or different.
  • R2 is an alkyl group having 1 to 20 carbon atoms which may have a substituent or a cycloalkyl group having 3 to 20 carbon atoms which may have a substituent, and R2 's may be the same or different.
  • a is a number from 1 to 3.
  • Inorganic filler having an average particle size of more than 3 ⁇ m to 150 ⁇ m or less The total amount of components (G) and (H) is 300 to 3,000 parts by mass per 100 parts by mass of the total amount of components (A) and (B).
  • composition according to [1], wherein component (G) is zinc oxide powder.
  • component (H) is aluminum powder.
  • component (F) is a reaction inhibitor selected from an acetylene compound, a nitrogen compound, an organic phosphorus compound, an oxime compound, and an organic chloro compound.
  • thermally conductive silicone composition of the present invention By using the thermally conductive silicone composition of the present invention, it is possible to obtain a cured product in which the expansion at around -40°C does not deviate from a constant rate of increase, but rather shows a constant change, and in which thickness does not change in the low temperature range compared to conventional thermally conductive silicone compositions.
  • this silicone composition heat generated by electrical and electronic components in extremely low temperature environments can be released without placing stress on the substrate.
  • 1 is a graph (vertical axis: displacement, horizontal axis: temperature) showing an example of the TMA measurement results of a cold-resistant composition.
  • 1 is a graph (vertical axis: displacement, horizontal axis: temperature) showing an example of the TMA measurement results of a composition that does not have cold resistance.
  • Component (A) is an organopolysiloxane having, per molecule, at least two silicon atoms bonded to aliphatic unsaturated hydrocarbon groups, one or more silicon atoms bearing an aromatic hydrocarbon group in the molecular chain, and a kinematic viscosity at 25°C of 50 to 100,000 mm2 /s.
  • the number of silicon atoms bonded to aliphatic unsaturated hydrocarbon groups in the organopolysiloxane is two or more, preferably 2 to 100, and more preferably 2 to 50.
  • the organopolysiloxane has one or more silicon atoms bearing an aromatic hydrocarbon group in the molecular chain. Furthermore, the proportion of aromatic hydrocarbon groups in side chains in the molecular chain of the organopolysiloxane is preferably 1 to 20%, more preferably 2 to 10%, and particularly preferably 3 to 7%, based on the total number of non-terminal silicon atoms (100%) in the molecular chain. If there is less than one silicon atom bearing an aromatic hydrocarbon group in the molecular chain, sufficient cold resistance may not be obtained.
  • the aliphatic unsaturated hydrocarbon group is preferably a monovalent hydrocarbon group having an aliphatic unsaturated bond and having 2 to 8 carbon atoms, more preferably 2 to 6 carbon atoms, and is more preferably an alkenyl group.
  • alkenyl groups such as vinyl, allyl, propenyl, isopropenyl, butenyl, hexenyl, cyclohexenyl, and octenyl. Of these, vinyl groups are particularly preferred.
  • the aliphatic unsaturated hydrocarbon group may be bonded to either a silicon atom at the end of the molecular chain, a silicon atom in the middle of the molecular chain, or both.
  • the organic group other than aliphatic unsaturated hydrocarbons bonded to the silicon atoms of the organopolysiloxane is an unsubstituted or substituted monovalent hydrocarbon group having 1 to 18 carbon atoms, preferably 1 to 10 carbon atoms, and more preferably 1 to 8 carbon atoms, and containing at least one aromatic hydrocarbon group.
  • organic groups other than aliphatic unsaturated hydrocarbons include alkyl groups such as methyl, ethyl, propyl, isopropyl, butyl, isobutyl, tert-butyl, pentyl, neopentyl, hexyl, cyclohexyl, octyl, nonyl, and decyl; aromatic hydrocarbon groups such as phenyl, tolyl, xylyl, and naphthyl; aralkyl groups such as benzyl, phenylethyl, and phenylpropyl; and groups in which some or all of the hydrogen atoms of these groups have been substituted with halogen atoms such as fluorine, bromine, or chlorine, or with cyano groups, such as chloromethyl, chloropropyl, bromoethyl, trifluoropropyl, and cyanoethyl.
  • the organopolysiloxane has a kinematic viscosity of 50 to 100,000 mm 2 /s, preferably 100 to 30,000 mm 2 /s, at 25° C. If the kinematic viscosity is less than 50 mm 2 /s, the physical properties of the silicone composition will be impaired, and if it exceeds 100,000 mm 2 /s, the extensibility of the silicone composition will be poor.
  • kinematic viscosity is the value measured at 25°C using an Ubbelohde-Ostwald viscometer (the same applies hereinafter).
  • the molecular structure of the organosiloxane is not particularly limited as long as it has the above properties.
  • the molecular structure include a linear structure, a branched structure, and a linear structure having a partially branched or cyclic structure. Those having such a molecular structure are particularly preferred, with the main chain consisting of repeating diorganosiloxane units and a linear structure in which both ends of the molecular chain are capped with triorganosiloxy groups.
  • Organopolysiloxanes having such a linear structure may also have a partially branched or cyclic structure.
  • the organopolysiloxane of component (A) may use either a single compound, or a combination of two or more different compounds.
  • the content of component (A) in the entire composition of the present invention is preferably 0.5 to 7.0 mass %, and more preferably 0.9 to 6.8 mass %.
  • Component (B) is an organopolysiloxane having one silicon atom bonded to an aliphatic unsaturated hydrocarbon group per molecule, one or more silicon atoms bearing an aromatic hydrocarbon group in the molecular chain, and a kinematic viscosity at 25°C of 50 to 100,000 mm2 /s.
  • this organopolysiloxane there is one silicon atom bonded to an aliphatic unsaturated hydrocarbon group.
  • the organopolysiloxane also has one or more silicon atoms bearing an aromatic hydrocarbon group in the molecular chain.
  • the proportion of aromatic hydrocarbon groups in side chains in the molecular chain of the organopolysiloxane is preferably 1 to 20%, more preferably 2 to 10%, and particularly preferably 3 to 7%, based on the total number of silicon atoms (100%) at non-terminal positions in the molecular chain. If there is less than one silicon atom bearing an aromatic hydrocarbon group in the molecular chain, sufficient cold resistance may not be achieved.
  • the aliphatic unsaturated hydrocarbon group is preferably a monovalent hydrocarbon group having an aliphatic unsaturated bond and having 2 to 8 carbon atoms, more preferably 2 to 6 carbon atoms, and is more preferably an alkenyl group.
  • alkenyl groups such as vinyl, allyl, propenyl, isopropenyl, butenyl, hexenyl, cyclohexenyl, and octenyl. Of these, vinyl groups are particularly preferred.
  • the aliphatic unsaturated hydrocarbon group may be bonded to a silicon atom at the end of the molecular chain, a silicon atom in the middle of the molecular chain, or both.
  • the organic group other than aliphatic hydrocarbons bonded to the silicon atoms of the organopolysiloxane is an unsubstituted or substituted monovalent hydrocarbon group having 1 to 18 carbon atoms, preferably 1 to 10 carbon atoms, and more preferably 1 to 8 carbon atoms, and containing at least one aromatic hydrocarbon group.
  • organic groups other than aliphatic hydrocarbons include alkyl groups such as methyl, ethyl, propyl, isopropyl, butyl, isobutyl, tert-butyl, pentyl, neopentyl, hexyl, cyclohexyl, octyl, nonyl, and decyl; aromatic hydrocarbon groups such as phenyl, tolyl, xylyl, and naphthyl; aralkyl groups such as benzyl, phenylethyl, and phenylpropyl; and groups in which some or all of the hydrogen atoms of these groups have been substituted with halogen atoms such as fluorine, bromine, or chlorine, or with cyano groups, such as chloromethyl, chloropropyl, bromoethyl, trifluoropropyl, and cyanoethyl. Methyl and phenyl groups are particularly preferred
  • the organopolysiloxane has a kinematic viscosity of 50 to 100,000 mm 2 /s, preferably 100 to 30,000 mm 2 /s, at 25° C. If the kinematic viscosity is less than 50 mm 2 /s, the physical properties of the silicone composition will be impaired, and if it exceeds 100,000 mm 2 /s, the extensibility of the silicone composition will be poor.
  • the molecular structure of the organosiloxane is not particularly limited as long as it has the above properties.
  • the molecular structure include a linear structure, a branched structure, and a linear structure having a partially branched or cyclic structure. Those having such a molecular structure are particularly preferred, with the main chain consisting of repeating diorganosiloxane units and a linear structure in which both ends of the molecular chain are capped with triorganosiloxy groups.
  • Organopolysiloxanes having such a linear structure may also have a partially branched or cyclic structure.
  • Component (C) is an organohydrogenpolysiloxane having at least two silicon-bonded hydrogen atoms (SiH groups) per molecule, particularly preferably 2 to 100, and even more preferably 2 to 50. Any organohydrogenpolysiloxane may be used as long as the SiH groups in the molecule can undergo an addition reaction with the aliphatic unsaturated hydrocarbon groups in components (A) and (B) described above in the presence of a platinum group metal catalyst, component (E) described below, to form a crosslinked structure.
  • SiH groups silicon-bonded hydrogen atoms
  • the molecular structure of the organohydrogenpolysiloxane is not particularly limited as long as it has the above properties.
  • Examples of the molecular structure include a linear structure, a branched structure, a cyclic structure, and a linear structure having a partially branched or cyclic structure.
  • a linear or cyclic structure is preferred as the molecular structure.
  • the organohydrogenpolysiloxane preferably has a kinematic viscosity at 25° C. of 1 to 1,000 mm 2 /s, and more preferably 10 to 300 mm 2 /s. If the kinematic viscosity is 1 mm 2 /s or higher, there is no risk of the physical properties of the silicone composition being reduced, and if it is 1,000 mm 2 /s or lower, there is no risk of the silicone composition having poor extensibility.
  • the organic group bonded to the silicon atom of the organohydrogenpolysiloxane may be an unsubstituted or substituted monovalent hydrocarbon group other than an aliphatic unsaturated hydrocarbon group.
  • organic groups include alkyl groups such as methyl, ethyl, propyl, butyl, hexyl, and dodecyl; aryl groups such as phenyl; aralkyl groups such as 2-phenylethyl and 2-phenylpropyl; and groups in which some or all of the hydrogen atoms have been substituted with halogen atoms such as fluorine, bromine, and chlorine; cyano groups; and epoxy ring-containing organic groups (glycidyl or glycidyloxy-substituted alkyl groups), such as chloromethyl, chloropropyl, cyanoethyl, 2-glycidoxyethyl, 3-glycidoxypropyl, and 4-glycidoxybutyl.
  • the methyl group and 3-glycidoxypropyl group are preferred.
  • the organohydrogenpolysiloxane of component (C) may be used alone or in combination of two or more different compounds.
  • the amount of organohydrogenpolysiloxane of component (C) to be blended is an amount such that the ratio of the number of SiH groups in component (C) to the total number of aliphatic unsaturated hydrocarbon groups in components (A) and (B) is 0.4 to 5, preferably 0.7 to 4.5, and more preferably 0.9 to 4. If the amount of component (C) is less than the lower limit of 0.4, the addition reaction may not proceed sufficiently, resulting in insufficient crosslinking and poor curing, whereas if the amount exceeds the upper limit of 5, the crosslinked structure may become non-uniform and the shelf life of the composition may be significantly reduced.
  • the component (D) is an organosilane represented by the following general formula (1).
  • R 1 a Si(OR 2 ) 4-a (1) (In formula (1), R1 is a monovalent hydrocarbon group having 1 to 20 carbon atoms which may have a substituent, and R1 's may be the same or different.
  • R2 is an alkyl group having 1 to 20 carbon atoms which may have a substituent or a cycloalkyl group having 3 to 20 carbon atoms which may have a substituent, and R2 's may be the same or different.
  • a is a number from 1 to 3.
  • Component (D) is used as a wetter (dispersant).
  • Components (A) and (B) have poor wettability with fillers, and sufficient loading cannot be achieved without adding a wetter before mixing.
  • Adding the organosilane of formula (1) above has the effect of significantly increasing the loading of the fillers of components (G) and (H), described below.
  • R 1 is a monovalent hydrocarbon group having 1 to 20 carbon atoms, and is preferably an alkyl group.
  • R2 is an alkyl group having 1 to 20 carbon atoms which may have a substituent or a cycloalkyl group having 3 to 20 carbon atoms which may have a substituent, an alkyl group having 1 to 6 carbon atoms is preferred, and a methyl group or an ethyl group is particularly preferred.
  • a is 1, 2 or 3, and is preferably 1.
  • organosilanes represented by the above general formula (1) include the following: C n H 2n+1 SiX 3 (1-1) C n H 2n+1 Si(CH 3 )X 2 (1-2) C n H 2n+1 Si(CH 3 ) 2 X (1-3)
  • X is a methoxy group (CH 3 O) or an ethoxy group (C 2 H 5 O)
  • n is a number from 1 to 20.
  • the amount of organosilane (component (D)) blended is in the range of 0.01 to 100 parts by mass, preferably 0.1 to 70 parts by mass, and more preferably 1 to 30 parts by mass, per 100 parts by mass of the total of components (A) and (B). Less than 0.01 parts by mass results in poor wettability and may increase the modulus of elasticity when exposed to high temperatures. Blending more than 100 parts by mass does not increase the effect and is uneconomical, and may cause voids to form at high temperatures.
  • Component (E) is a platinum group metal catalyst that promotes the addition reaction between the above-mentioned components (A) and (B) and component (C).
  • Conventional platinum group metal catalysts used in addition reactions can be used.
  • platinum group metal catalysts include platinum-based, palladium-based, and rhodium-based catalysts, with platinum or platinum compounds being preferred, as they are relatively readily available.
  • platinum or platinum compounds include platinum itself, platinum black, chloroplatinic acid, platinum-olefin complexes, platinum-alcohol complexes, and platinum coordination compounds. Platinum group metal catalysts may be used alone or in combination of two or more.
  • the amount of component (E) blended should be an effective amount as a catalyst, i.e., an amount necessary to promote the addition reaction and cure the thermally conductive silicone composition of the present invention.
  • This effective amount is preferably 0.1 to 500 ppm, more preferably 1 to 200 ppm, and even more preferably 10 to 100 ppm, by mass, converted into platinum group metal atoms in the composition. If the amount of catalyst is less than the lower limit above, the catalytic effect may not be achieved. Furthermore, exceeding the upper limit above does not increase the catalytic effect, and is therefore uneconomical and undesirable.
  • Component (F) is a reaction inhibitor that suppresses the progress of the hydrosilylation reaction at room temperature, thereby extending shelf life and pot life.
  • This reaction inhibitor can be any of the conventional reaction inhibitors used in addition-curable silicone compositions.
  • reaction inhibitors include acetylene compounds such as acetylene alcohols (e.g., ethynylmethyldecylcarbinol, 1-ethynyl-1-cyclohexanol, 3,5-dimethyl-1-hexyn-3-ol), nitrogen compounds such as tributylamine, tetramethylethylenediamine, and benzotriazole, organophosphorus compounds such as triphenylphosphine, oxime compounds, and organochloro compounds.
  • acetylene alcohols e.g., ethynylmethyldecylcarbinol, 1-ethynyl-1-cyclohexanol, 3,5-dimethyl-1-hexyn-3-ol
  • nitrogen compounds such as tributylamine, tetramethylethylenediamine, and benzotriazole
  • organophosphorus compounds such as triphenylphosphine, oxime compounds, and organochloro compounds
  • the amount of component (F) blended is 0.05 to 5 parts by mass, preferably 0.1 to 2 parts by mass, per 100 parts by mass of the total of components (A) and (B). If the amount of reaction inhibitor is less than 0.05 parts by mass, the desired shelf life and pot life may not be achieved, and if it is more than 5 parts by mass, the curability of the silicone composition may be reduced.
  • reaction inhibitor may be diluted with a conventional organo(poly)siloxane, toluene, or the like to improve dispersibility in the silicone composition.
  • Component (G) is an inorganic filler with an average particle size of 3 ⁇ m or less, and is preferably at least one inorganic filler selected from the group consisting of metals, metal oxides, metal hydroxides, metal nitrides, metal carbides, and carbon allotropes.
  • Component (G) preferably has a thermal conductivity of 10 W/mK or more. This is because if the thermal conductivity of the inorganic filler is 10 W/mK or more, the thermal conductivity of the thermally conductive silicone composition itself will be high.
  • inorganic fillers examples include aluminum powder, copper powder, iron powder, nickel powder, gold powder, metal silicon powder, aluminum nitride powder, boron nitride powder, alumina powder, diamond powder, carbon powder, indium powder, gallium powder, and zinc oxide powder.
  • Any inorganic filler with a thermal conductivity of 10 W/mK or more may be used, and one or a combination of two or more types may be used.
  • component (G) is preferably aluminum powder, alumina powder, or zinc oxide powder, more preferably aluminum powder and/or zinc oxide powder, and even more preferably zinc oxide powder.
  • the average particle size of component (G) is 3 ⁇ m or less, preferably in the range of 0.1 to 3 ⁇ m. If the average particle size is 0.1 ⁇ m or more, the resulting composition will be grease-like and have good extensibility, while if it is 3 ⁇ m or less, the ratio with component (H) will result in close packing, which will reduce the thermal resistance of the thermal grease and reduce the risk of a decrease in thermal performance.
  • the average particle size can be measured using a laser diffraction/scattering particle size distribution analyzer, such as the Microtrac MT3300EX manufactured by Nikkiso Co., Ltd., and is the volume-average diameter based on volume.
  • Component (G) may be of any shape, including amorphous and spherical.
  • the amount of component (G) filled is preferably in the range of 30 to 700 parts by mass, more preferably 40 to 600 parts by mass, and especially more preferably 50 to 500 parts by mass, per 100 parts by mass of the total of components (A) and (B).
  • Component (H) is an inorganic filler with an average particle size of more than 3 ⁇ m and less than 150 ⁇ m, and is at least one thermally conductive filler selected from the group consisting of metals, metal oxides, metal hydroxides, metal nitrides, metal carbides, and carbon allotropes. It is preferable to use component (H) with a thermal conductivity of 10 W/mK or higher. This is because if the thermal conductivity of the inorganic filler is 10 W/mK or higher, the thermal conductivity of the thermally conductive silicone composition itself will be high.
  • inorganic fillers examples include aluminum powder, copper powder, iron powder, nickel powder, gold powder, metal silicon powder, aluminum nitride powder, boron nitride powder, alumina powder, diamond powder, carbon powder, indium powder, gallium powder, and zinc oxide powder.
  • Any inorganic filler with a thermal conductivity of 10 W/mK or higher may be used, and one or a combination of two or more types may be used.
  • component (H) is preferably aluminum powder, alumina powder, or zinc oxide powder, more preferably aluminum powder and/or zinc oxide powder, and even more preferably aluminum powder.
  • the average particle size of component (H) is in the range of more than 3 ⁇ m to 150 ⁇ m, preferably more than 3 ⁇ m to 100 ⁇ m, and more preferably more than 3 ⁇ m to 80 ⁇ m. If the average particle size is more than 3 ⁇ m, the resulting silicone composition will be grease-like and have good extensibility, while if it is 150 ⁇ m or less, the thermal resistance of the heat-dissipating grease will be high, reducing the risk of a decrease in thermal performance.
  • the average particle size can be measured using a laser diffraction/scattering particle size distribution analyzer, such as the Microtrac MT3300EX manufactured by Nikkiso Co., Ltd., and is the volume-average diameter based on volume.
  • Component (H) may be of any shape, including amorphous and spherical.
  • the amount of component (H) filled is preferably in the range of 270 to 2,300 parts by mass, more preferably 360 to 900 parts by mass, and particularly preferably 500 to 2,500 parts by mass, per 100 parts by mass of the total of components (A) and (B).
  • the total amount of components (G) and (H) filled is preferably in the range of 300 to 3,000 parts by mass, more preferably 400 to 2,800 parts by mass, and particularly preferably 500 to 2,500 parts by mass, per 100 parts by mass of the total of components (A) and (B). If the amount is less than the lower limit of 300 parts by mass, the thermal conductivity of the composition will be low, while if it exceeds the upper limit of 3,000 parts by mass, the viscosity of the composition will increase, resulting in poor extensibility.
  • the thermally conductive silicone composition of the present invention may further contain one or more thermally conductive inorganic fillers other than components (G) and (H).
  • thermally conductive inorganic fillers other than components (G) and (H).
  • hydrolyzable organopolysiloxanes, various modified silicones, hydrolyzable organosilanes, etc. may be blended.
  • a solvent may be blended to adjust the viscosity of the composition.
  • a conventionally known antioxidant such as 2,6-di-tert-butyl-4-methylphenol, may be added as needed.
  • dyes, pigments, flame retardants, anti-settling agents, thixotropy improvers, etc. may be blended as needed.
  • the thermally conductive silicone composition of the present invention may also be mixed while being heated. While there are no particular restrictions on the heating conditions, the temperature is typically 25 to 220°C, preferably 40 to 200°C, and more preferably 50 to 200°C, and the heating time is typically 3 minutes to 24 hours, preferably 5 minutes to 12 hours, and more preferably 10 minutes to 6 hours. Degassing may also be performed during heating.
  • the thermally conductive silicone composition of the present invention obtained in this manner should have a viscosity measured at 25°C in the range of 100 to 1,000 Pa ⁇ s, preferably 150 to 800 Pa ⁇ s, and more preferably 200 to 600 Pa ⁇ s. If the viscosity is at or above the lower limit of the above range, there is little risk of the thermally conductive filler settling over time during storage, which could result in poor workability. If the viscosity is below the upper limit of the above range, there is little risk of poor extensibility and poor workability.
  • the thermally conductive silicone composition of the present invention has a thermal conductivity of 0.5 to 10 W/mK.
  • the thermally conductive silicone composition of the present invention is, for example, heat-cured at 125°C for 90 minutes to produce a 2 mm thick sheet, and then the elongation at break after curing, as measured by creating a No. 2 dumbbell shape as specified in JIS K6251, is preferably 50% or more, more preferably 65% or more, and even more preferably 80% or more. If the elongation at break is above the above lower limit, peeling is less likely to occur during high-temperature storage, and there is little risk of deterioration in thermal resistance.
  • the thermally conductive silicone composition of the present invention preferably contains no voids after, for example, sandwiching it between glass plates, applying pressure at room temperature for 15 minutes, heating at 150°C for 60 minutes, cooling it to room temperature, and then heating at 260°C for 5 minutes, which is repeated five times.
  • Such a thermally conductive silicone composition can maintain its heat dissipation performance even under the above conditions.
  • the present invention will be explained in detail below with examples (synthesis examples, formulation examples) and comparative examples, but the present invention is not limited to the following examples.
  • the kinematic viscosity is the value measured at 25°C using an Ubbelohde-type Ostwald viscometer.
  • the average particle size is the median diameter D50 measured using a laser diffraction/scattering particle size analyzer (LA-750: manufactured by Horiba, Ltd.).
  • Parts means "parts by mass," Vi represents vinyl groups, and Ph represents phenyl groups.
  • Component B-1 Diphenyl dimethylpolysiloxane represented by the following formula (B-1), one end of which is capped with a dimethylvinylsilyl group (vinyl group amount: 0.0047 mol/100 g) and the other end of which is capped with a trimethylsilyl group, and which has a kinematic viscosity at 25°C of 700 mm 2 /s.
  • Component C-1 An organohydrogenpolysiloxane (Si—H group amount: 0.0010 mol/g) represented by the following formula (C-1) and having a kinematic viscosity of 33 mm 2 /s at 25° C.
  • C-2 An organohydrogenpolysiloxane (Si—H group amount: 0.0014 mol/g) represented by the following formula (C-2) and having a kinematic viscosity of 36 mm 2 /s at 25° C.
  • Component E-1 A solution (platinum atom content: 1 mass % as platinum atoms) of a platinum-divinyltetramethyldisiloxane complex dissolved in dimethylpolysiloxane having a kinematic viscosity of 600 mm 2 /s at 25°C and both ends capped with dimethylvinylsilyl groups.
  • Component G-1 Zinc oxide powder with an average particle size of 0.3 ⁇ m (thermal conductivity of zinc oxide is 25 W/mK)
  • Component (H) H-1 Aluminum powder with an average particle size of 10 ⁇ m (thermal conductivity of aluminum is 236 W/mK)
  • Silicone compositions were prepared by blending the components (A) to (H) in the amounts shown in Tables 1 and 2 using the method described below. Note that SiH/SiVi (number ratio) is the ratio of the total number of SiH groups in component (C) to the total number of aliphatic unsaturated hydrocarbon groups in components (A) and (B). Components (A), (B), (D), (G), and (H) were placed in a 5-liter planetary mixer (manufactured by Inoue Seisakusho Co., Ltd.) and mixed for 1 hour at 70°C. After cooling to 40°C or below, components (F), (E), and (C) were added and mixed until uniform, to prepare each silicone composition.
  • a 5-liter planetary mixer manufactured by Inoue Seisakusho Co., Ltd.
  • Example 4 a silicone composition was prepared in the same manner as in Comparative Example 1, except that dimethylpolysiloxane was used.
  • Example 7 a silicone composition was prepared in the same manner as in Comparative Example 1, except that dimethylpolysiloxane was used.
  • Example 8 a silicone composition was prepared in the same manner as in Comparative Example 1, except that dimethylpolysiloxane was used.
  • Each silicone composition was wrapped in plastic wrap in its uncured state, and the thermal conductivity of each composition was measured at 25°C using a thermal property measuring device (in this example, a TPS-2500S manufactured by Kyoto Electronics Manufacturing Co., Ltd.) that utilizes the hot disk method.
  • a thermal property measuring device in this example, a TPS-2500S manufactured by Kyoto Electronics Manufacturing Co., Ltd.
  • compositions in which this phenomenon can be confirmed are considered to be non-cold-resistant.
  • An example of this determination is shown below. Since the CTE values are measured on the order of several ⁇ m, the absolute values vary for each measurement and depending on the composition of the sample. Therefore, the absolute values are not discussed, and cold resistance was determined based on whether the tendency of change shown in FIGS. 1 and 2 was observed from ⁇ 80 to 0° C.
  • thermally conductive silicone compositions of Comparative Examples 1 to 4 in Table 2 lacked cold resistance at temperatures around -40°C. This means that reliability is reduced when operating in low-temperature environments when mounted in electronic component packages or power modules.
  • the thermally conductive silicone composition of the present invention when used in low-temperature environments, it is possible to expect improved cold resistance as it suppresses rapid expansion that occurs with temperature increases. Because of these properties, it is particularly suitable for use as a thermal grease for electronic component packages and power modules that operate in low-temperature environments.

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Abstract

Provided is a thermally conductive silicone composition that becomes a cured product having stability even in a low-temperature environment. The thermally conductive silicone composition comprises: (A) an organopolysiloxane having, in each molecule, a silicon atom to which two or more aliphatic unsaturated hydrocarbon groups are bonded; (B) an organopolysiloxane having, in each molecule, a silicon atom to which one aliphatic unsaturated hydrocarbon group is bonded; (C) an organohydrogen polysiloxane having two or more SiH groups in each molecule; (D) an organosilane represented by general formula (1) of R1 aSi(OR2)4-a (in formula (1), R1 is a monovalent hydrocarbon group, R2 is an alkyl group or a cycloalkyl group, and a is a number from 1 to 3); (E) a platinum group metal catalyst; (F) a reaction control agent; (G) an inorganic filler having an average particle diameter of 3 μm or less; and (H) an inorganic filler having an average particle diameter of from greater than 3 μm to 150 μm or less.

Description

熱伝導性シリコーン組成物Thermally conductive silicone composition

 本発明は、熱伝導性シリコーン組成物に関し、耐寒性に優れた硬化物となる付加硬化型シリコーン組成物に関する。具体的には、一般的な熱伝導性シリコーン組成物の硬化物よりも低温環境下での使用における耐寒性を有する硬化物となる熱伝導性シリコーン組成物に関する。 The present invention relates to a thermally conductive silicone composition, specifically an addition-curable silicone composition that forms a cured product with excellent cold resistance. Specifically, the present invention relates to a thermally conductive silicone composition that forms a cured product with better cold resistance when used in low-temperature environments than the cured product of a typical thermally conductive silicone composition.

 電子部品の多くは使用中に熱を発生させることから、その電子部品を適切に機能させるためには、熱を取り除くことが必要である。特に、パーソナルコンピューターやスマートフォンに使用されるCPU、GPU等の集積回路素子は、動作周波数の高速化やパッケージの微細化により発熱量が増大し続け、熱に対する対策や設計が重要な課題となっている。また、近年は自動車の電動化も進化しており、多くの電子部品が使われることにより、高温高湿環境下などより過酷な条件で電子部品が使用されることがある。 Many electronic components generate heat during use, and heat must be removed to ensure they function properly. In particular, integrated circuit elements such as CPUs and GPUs used in personal computers and smartphones are generating increasing amounts of heat due to faster operating frequencies and smaller packages, making heat countermeasures and design important issues. Furthermore, with the advancement of electrification in automobiles in recent years, the use of many electronic components means that electronic components are sometimes used in harsher conditions, such as high-temperature, high-humidity environments.

 この熱を除去する手段として多くの方法がある。特に発熱量の多い電子部品では、電子部品とヒートシンク等の部材との間に熱伝導性グリースや熱伝導性シートなどの熱伝導性材料を介在させて熱を逃がす方法が開示されている(特許文献1)。特に熱伝導性グリースは不定形で、硬化後に基材に密着することで高い熱伝導性を示すことから、好適に用いられる。また、このような熱伝導性材料としては、シリコーンをベースとし、酸化亜鉛、アルミニウム又はアルミナ粉末を配合した放熱接着剤が知られている。 There are many methods for removing this heat. For electronic components that generate a particularly large amount of heat, a method has been disclosed in which heat is released by placing a thermally conductive material such as thermally conductive grease or a thermally conductive sheet between the electronic component and a member such as a heat sink (Patent Document 1). Thermally conductive grease is particularly suitable because it is amorphous and exhibits high thermal conductivity by adhering to the substrate after curing. Another known example of such a thermally conductive material is a heat-dissipating adhesive that is silicone-based and contains zinc oxide, aluminum, or alumina powder.

 シリコーンをベースとして、高熱伝導性を有する熱伝導性材料とするためには、熱伝導性充填材を高充填することが必要である。しかし、ただ単に高充填しようとすると、熱電伝導性材料の流動性が著しく低下し、塗布性(ディスペンス性、スクリーンプリント性)等の作業性が悪くなり、さらには電子部品やヒートシンク表面の微細な凹凸に追従できなくなるという問題が生じる。そこで、この問題を解決するために、熱伝導性充填材をウェッター(分散剤)で表面処理してベースポリマーであるシリコーンに分散させ、熱伝導性材料の流動性を保つという方法が知られている。 In order to create a silicone-based thermally conductive material with high thermal conductivity, it is necessary to highly fill it with thermally conductive filler. However, simply attempting to fill it highly will significantly reduce the fluidity of the thermoelectrically conductive material, making it difficult to work with, for example, in terms of application (dispensability, screen printing), and will also cause problems such as an inability to conform to the fine irregularities on the surfaces of electronic components and heat sinks. To solve this problem, a known method is to surface treat the thermally conductive filler with a wetter (dispersant) and disperse it into the silicone base polymer, thereby maintaining the fluidity of the thermally conductive material.

 近年、自動車業界において電動化が進められており、寒冷仕様車においても、CPU、GPU等の集積回路素子、または発熱量が多い電子部品が極低温環境下で使用される場合が想定される。また、航空宇宙産業においても、低温環境下での材料の安定性を求められる。従って、一般的な熱伝導性シリコーン組成物の硬化物よりも、さらに低温環境下での使用における耐寒性を有する硬化物となるシリコーン組成物が求められている。一般的なシリコーン材料では-40℃付近に脆化点があり、シリコーン成分が結晶化する傾向にあり、材料硬度が上昇したり、分子の柔軟性が失われ、耐寒性が劣ることになる。また、一般的なシリコーン材料では、熱膨張に関して、-40℃付近で一定の上昇率から逸脱する上昇傾向を示す変化が起こり、特に低温と高温を繰り返す場合に、放熱材料界面でのストレスが発生する。このため低温と高温を繰り返す場合に界面の状態が悪化し、放熱性能が低下する。 In recent years, the automotive industry has been moving toward electrification, and even in cold-weather vehicles, it is expected that integrated circuit devices such as CPUs and GPUs, as well as electronic components that generate a lot of heat, will be used in extremely low-temperature environments. The aerospace industry also requires material stability in low-temperature environments. Therefore, there is a demand for silicone compositions that produce cured products with even greater cold resistance for use in low-temperature environments than the cured products of typical thermally conductive silicone compositions. Typical silicone materials have a brittle point around -40°C, which causes the silicone components to crystallize, increasing the material's hardness and reducing molecular flexibility, resulting in poor cold resistance. Furthermore, typical silicone materials exhibit a thermal expansion trend that deviates from a constant rate of increase around -40°C, generating stress at the interface of the heat-dissipating material, especially when the temperature is repeatedly changed between low and high temperatures. This causes the interface to deteriorate when the temperature is repeatedly changed between low and high temperatures, resulting in reduced heat dissipation performance.

特開2016-053140公報JP 2016-053140 A

 したがって、本発明は、低温環境下でも安定性を有する硬化物となる熱伝導性シリコーン組成物を提供することを目的とする。特に-40℃付近での熱膨張変化が一定の上昇率から逸脱する上昇傾向を示さずに一定の変化を示し、基材への応力を緩和できる熱伝導性シリコーン組成物を提供することを目的とする。 Therefore, the object of the present invention is to provide a thermally conductive silicone composition that cures into a stable product even in low-temperature environments. In particular, the object is to provide a thermally conductive silicone composition that exhibits a constant rate of thermal expansion change at temperatures around -40°C without showing any tendency to deviate from a constant rate of increase, and that can relieve stress on the substrate.

 本発明者は、上記目的を達成するために鋭意研究した結果、下記シリコーン組成物が、-40℃付近の膨張が一定の上昇率から逸脱する上昇傾向を示すことなく、一定の変化を示し、従来の熱伝導性シリコーン組成物に比べ低温領域における厚み変化を起こさないことを見い出し、本発明を完成した。
 すなわち、本発明は下記熱伝導性シリコーン組成物を提供するものである。
As a result of extensive research conducted by the present inventors in order to achieve the above-mentioned object, they discovered that the silicone composition described below exhibits a constant rate of expansion at around -40°C without any tendency to deviate from a constant rate of increase, and that it does not experience changes in thickness in the low temperature range compared to conventional thermally conductive silicone compositions, thereby completing the present invention.
That is, the present invention provides the following thermally conductive silicone composition.

[1]
 下記の(A)成分、(B)成分、(C)成分、(D)成分、(E)成分、(F)成分、(G)成分及び(H)成分を含有する熱伝導性シリコーン組成物。
(A)1分子中に少なくとも2個の脂肪族不飽和炭化水素基が結合したケイ素原子を有し、分子鎖中に芳香族炭化水素基を有するケイ素原子を1つ以上含有し、かつ、25℃での動粘度50~100,000mm2/sであるオルガノポリシロキサン
(B)1分子中に1個の脂肪族不飽和炭化水素基が結合したケイ素原子を有し、分子鎖中に芳香族炭化水素基を有するケイ素原子を1つ以上含有し、かつ、25℃での動粘度が50~100,000mm2/sであるオルガノポリシロキサン
(C)ケイ素原子に結合した水素原子(=SiH基)を1分子中に2個以上有するオルガノハイドロジェンポリシロキサン:(A)成分と(B)成分中の脂肪族不飽和炭化水素基の個数の合計に対する(C)成分中のSiHの個数が0.4~5となる量
(D)下記一般式(1)で示されるオルガノシラン:(A)成分と(B)成分の合計100質量部に対して0.01~100質量部
 R1 aSi(OR24-a   (1)
(式(1)中、R1は置換基を有してもよい炭素数1から20の一価炭化水素基であり、R1は同一であっても、異なっていてもよい。R2は置換基を有してもよい炭素数1から20のアルキル基または置換基を有してもよい炭素数3から20のシクロアルキル基であり、R2は同一であっても、異なっていてもよい。aは、1から3の数である。)
(E)白金族金属触媒:有効量
(F)反応制御剤:(A)成分と(B)成分の合計100質量部に対して0.05~5.0質量部
(G)平均粒径3μm以下の無機充填材
(H)平均粒径が3μm超から150μm以下である無機充填材:
(G)成分と(H)成分の合計が、(A)成分と(B)成分の合計100質量部に対して300~3,000質量部

[2]
 (G)成分が酸化亜鉛粉末である[1]に記載の組成物。

[3]
 (H)成分がアルミニウム粉末である[1]又は[2]に記載の組成物。

[4]
 (F)成分が、アセチレン化合物、窒素化合物、有機リン化合物、オキシム化合物及び有機クロロ化合物より選択される反応制御剤である[1]から[3]のいずれかに記載の組成物。

[5]
 [1]~[4]のいずれかに記載の組成物の硬化物。
[1]
A thermally conductive silicone composition comprising the following components (A), (B), (C), (D), (E), (F), (G), and (H):
(A) Organopolysiloxanes having per molecule a silicon atom to which at least two aliphatic unsaturated hydrocarbon groups are bonded, and one or more silicon atoms in the molecular chain having an aromatic hydrocarbon group, and having a kinematic viscosity at 25°C of 50 to 100,000 mm 2 /s. (B) Organopolysiloxanes having per molecule a silicon atom to which one aliphatic unsaturated hydrocarbon group is bonded, and one or more silicon atoms in the molecular chain having an aromatic hydrocarbon group, and having a kinematic viscosity at 25°C of 50 to 100,000 mm 2 /s. (C) an organohydrogenpolysiloxane having two or more silicon-bonded hydrogen atoms (SiH groups) per molecule: an amount such that the number of SiH groups in component (C) is 0.4 to 5 relative to the total number of aliphatic unsaturated hydrocarbon groups in components (A) and (B); (D) an organosilane represented by the following general formula (1): R 1 a Si(OR 2 ) 4- a (1): 0.01 to 100 parts by mass per 100 parts by mass of the total of components ( A ) and (B):
(In formula (1), R1 is a monovalent hydrocarbon group having 1 to 20 carbon atoms which may have a substituent, and R1 's may be the same or different. R2 is an alkyl group having 1 to 20 carbon atoms which may have a substituent or a cycloalkyl group having 3 to 20 carbon atoms which may have a substituent, and R2 's may be the same or different. a is a number from 1 to 3.)
(E) Platinum group metal catalyst: effective amount (F) Reaction inhibitor: 0.05 to 5.0 parts by mass per 100 parts by mass of the total of components (A) and (B) (G) Inorganic filler having an average particle size of 3 μm or less (H) Inorganic filler having an average particle size of more than 3 μm to 150 μm or less:
The total amount of components (G) and (H) is 300 to 3,000 parts by mass per 100 parts by mass of the total amount of components (A) and (B).

[2]
The composition according to [1], wherein component (G) is zinc oxide powder.

[3]
The composition according to [1] or [2], wherein component (H) is aluminum powder.

[4]
The composition according to any one of [1] to [3], wherein the component (F) is a reaction inhibitor selected from an acetylene compound, a nitrogen compound, an organic phosphorus compound, an oxime compound, and an organic chloro compound.

[5]
A cured product of the composition according to any one of [1] to [4].

 本発明の熱伝導性シリコーン組成物を用いることで、マイナス40℃付近の膨張が一定の上昇率から逸脱する上昇傾向を示すことなく、一定の変化を示し、従来の熱伝導性シリコーン組成物に比べ低温領域における厚み変化を起こさない硬化物を得えることができる。このシリコーン組成物を用いることで、極低温環境下で電気・電子部品から発生する熱を基材にストレスをかけることなく放出することができる。 By using the thermally conductive silicone composition of the present invention, it is possible to obtain a cured product in which the expansion at around -40°C does not deviate from a constant rate of increase, but rather shows a constant change, and in which thickness does not change in the low temperature range compared to conventional thermally conductive silicone compositions. By using this silicone composition, heat generated by electrical and electronic components in extremely low temperature environments can be released without placing stress on the substrate.

耐寒性のある組成物のTMA測定結果の一例を示すグラフ(縦軸:変位、横軸:温度)である。1 is a graph (vertical axis: displacement, horizontal axis: temperature) showing an example of the TMA measurement results of a cold-resistant composition. 耐寒性のない組成物のTMA測定結果の一例を示すグラフ(縦軸:変位、横軸:温度)である。1 is a graph (vertical axis: displacement, horizontal axis: temperature) showing an example of the TMA measurement results of a composition that does not have cold resistance.

 以下、本発明を更に詳細に説明する。 The present invention is described in further detail below.

(A)成分
 (A)成分は、1分子中に少なくとも2個の脂肪族不飽和炭化水素基が結合したケイ素原子を有し、分子鎖中に芳香族炭化水素基を有するケイ素原子を1つ以上含有し、かつ、25℃での動粘度50~100,000mm2/sであるオルガノポリシロキサンである。該オルガノポリシロキサンが有する、脂肪族不飽和炭化水素基が結合したケイ素原子は2個以上、好ましくは2~100個、より好ましくは2~50個である。2個より少ない場合、不飽和炭化水素基量とケイ素原子に結合した水素原子との比率が崩れ十分な硬化性、耐寒性が得られない場合がある。該オルガノポリシロキサンの分子鎖中に芳香族炭化水素基を有するケイ素原子が1つ以上有する。また、該オルガノポリシロキサンの分子鎖中の側鎖に芳香族炭化水素基を有する割合は、分子鎖非末端のケイ素原子全体(100%)に対して、1~20%が好ましく、2~10%がより好ましく、3~7%が特に好ましい。分子鎖中に芳香族炭化水素基を有するケイ素原子が1つより少ない場合、十分な耐寒性が得られない場合がある。
Component (A) Component (A) is an organopolysiloxane having, per molecule, at least two silicon atoms bonded to aliphatic unsaturated hydrocarbon groups, one or more silicon atoms bearing an aromatic hydrocarbon group in the molecular chain, and a kinematic viscosity at 25°C of 50 to 100,000 mm2 /s. The number of silicon atoms bonded to aliphatic unsaturated hydrocarbon groups in the organopolysiloxane is two or more, preferably 2 to 100, and more preferably 2 to 50. If there are fewer than two, the ratio between the number of unsaturated hydrocarbon groups and the hydrogen atoms bonded to silicon atoms will be disrupted, and sufficient curability and cold resistance may not be achieved. The organopolysiloxane has one or more silicon atoms bearing an aromatic hydrocarbon group in the molecular chain. Furthermore, the proportion of aromatic hydrocarbon groups in side chains in the molecular chain of the organopolysiloxane is preferably 1 to 20%, more preferably 2 to 10%, and particularly preferably 3 to 7%, based on the total number of non-terminal silicon atoms (100%) in the molecular chain. If there is less than one silicon atom bearing an aromatic hydrocarbon group in the molecular chain, sufficient cold resistance may not be obtained.

 脂肪族不飽和炭化水素基は、好ましくは、脂肪族不飽和結合を有する、炭素数2~8、さらに好ましくは炭素数2~6の1価炭化水素基であり、より好ましくはアルケニル基である。脂肪族不飽和炭化水素基としては、例えば、ビニル基、アリル基、プロぺニル基、イソプロぺニル基、ブレニル基、ヘキセニル基、シクロヘキセニル基、及び、オクテニル基等のアルケニル基が挙げられる。なかでも、ビニル基が特に好ましい。脂肪族不飽和炭化水素基は、分子鎖末端のケイ素原子、分子鎖途中のケイ素原子のいずれかに結合していてもよく、両者に結合していてもよい。 The aliphatic unsaturated hydrocarbon group is preferably a monovalent hydrocarbon group having an aliphatic unsaturated bond and having 2 to 8 carbon atoms, more preferably 2 to 6 carbon atoms, and is more preferably an alkenyl group. Examples of aliphatic unsaturated hydrocarbon groups include alkenyl groups such as vinyl, allyl, propenyl, isopropenyl, butenyl, hexenyl, cyclohexenyl, and octenyl. Of these, vinyl groups are particularly preferred. The aliphatic unsaturated hydrocarbon group may be bonded to either a silicon atom at the end of the molecular chain, a silicon atom in the middle of the molecular chain, or both.

 前記オルガノポリシロキサンのケイ素原子に結合する、脂肪族不飽和炭化水素以外の有機基としては、炭素数1~18、好ましくは炭素数1~10、さらに好ましくは炭素数1~8の、非置換又は置換の1価炭化水素基であり、少なくとも1つの芳香族炭化水素基が含有される。脂肪族不飽和炭化水素以外の有機基としては、例えば、メチル基、エチル基、プロピル基、イソプロピル基、ブチル基、イソブチル基、tert-ブチル基、ペンチル基、ネオペンチル基、ヘキシル基、シクロヘキシル基、オクチル基、ノニル基、デシル基等のアルキル基;フェニル基、トリル基、キシリル基、ナフチル基等の芳香族炭化水素基;ベンジル基、フェニルエチル基、フェニルプロピル基等のアラルキル基、又はこれらの基の水素原子の一部又は、全部をフッ素、臭素、塩素などのハロゲン原子、シアノ基等で置換したもの、例えば、クロロメチル基、クロロプロピル基、ブロモエチル基、トリフルオロプロピル基、シアノエチル基等が挙げられる。特にメチル基、フェニル基であることが好ましい。 The organic group other than aliphatic unsaturated hydrocarbons bonded to the silicon atoms of the organopolysiloxane is an unsubstituted or substituted monovalent hydrocarbon group having 1 to 18 carbon atoms, preferably 1 to 10 carbon atoms, and more preferably 1 to 8 carbon atoms, and containing at least one aromatic hydrocarbon group. Examples of organic groups other than aliphatic unsaturated hydrocarbons include alkyl groups such as methyl, ethyl, propyl, isopropyl, butyl, isobutyl, tert-butyl, pentyl, neopentyl, hexyl, cyclohexyl, octyl, nonyl, and decyl; aromatic hydrocarbon groups such as phenyl, tolyl, xylyl, and naphthyl; aralkyl groups such as benzyl, phenylethyl, and phenylpropyl; and groups in which some or all of the hydrogen atoms of these groups have been substituted with halogen atoms such as fluorine, bromine, or chlorine, or with cyano groups, such as chloromethyl, chloropropyl, bromoethyl, trifluoropropyl, and cyanoethyl. Methyl groups and phenyl groups are particularly preferred.

 前記オルガノポリシロキサンは、25℃での動粘度が、50~100,000mm2/s、好ましくは100~30,000mm2/sである。該動粘度が50mm2/s未満であると、シリコーン組成物の物理的特性が低下し、100,000mm2/sを超えると、シリコーン組成物の伸展性が乏しいものとなる。 The organopolysiloxane has a kinematic viscosity of 50 to 100,000 mm 2 /s, preferably 100 to 30,000 mm 2 /s, at 25° C. If the kinematic viscosity is less than 50 mm 2 /s, the physical properties of the silicone composition will be impaired, and if it exceeds 100,000 mm 2 /s, the extensibility of the silicone composition will be poor.

 本発明において、動粘度は、ウベローデ型オストワルド粘度計により測定した25℃における値である(以下、同じ)。 In the present invention, kinematic viscosity is the value measured at 25°C using an Ubbelohde-Ostwald viscometer (the same applies hereinafter).

 前記オルガノシロキサンは、上記性質を有するものであればその分子構造は特に限定されず、分子構造としては、直鎖状構造、分岐鎖状構造、一部分岐状構造又は環状構造を有する直鎖状構造等が挙げられる。該分子構造を有するものとしては、特には、主鎖がジオルガノシロキサン単位の繰り返しからなり、分子鎖両末端がトリオルガノシロキシ基で封鎖された直鎖状構造を有するものが好ましい。該直鎖状構造を有するオルガノポリシロキサンは、部分的に分岐状構造又は環状構造を有していてもよい。 The molecular structure of the organosiloxane is not particularly limited as long as it has the above properties. Examples of the molecular structure include a linear structure, a branched structure, and a linear structure having a partially branched or cyclic structure. Those having such a molecular structure are particularly preferred, with the main chain consisting of repeating diorganosiloxane units and a linear structure in which both ends of the molecular chain are capped with triorganosiloxy groups. Organopolysiloxanes having such a linear structure may also have a partially branched or cyclic structure.

 (A)成分のオルガノポリシロキサンは、1種単独で又は2種以上を組み合わせて使用することができる。
 本発明の組成物全体における(A)成分の含有量は、0.5~7.0質量%であることが好ましく、0.9~6.8質量%であることがより好ましい。
The organopolysiloxane of component (A) may use either a single compound, or a combination of two or more different compounds.
The content of component (A) in the entire composition of the present invention is preferably 0.5 to 7.0 mass %, and more preferably 0.9 to 6.8 mass %.

(B)成分
 (B)成分は、1分子中に1個の脂肪族不飽和炭化水素基が結合したケイ素原子を有し、分子鎖中に芳香族炭化水素基を有するケイ素原子を1つ以上含有し、かつ、25℃での動粘度が50~100,000mm2/sであるオルガノポリシロキサンである。該オルガノポリシロキサンにおいて、脂肪族不飽和炭化水素基が結合したケイ素原子は1個である。該オルガノポリシロキサンの分子鎖中に芳香族炭化水素基を有するケイ素原子を1つ以上有する。また、該オルガノポリシロキサンの分子鎖中の側鎖に芳香族炭化水素基を有する割合は、分子鎖非末端のケイ素原子全体(100%)に対して、1~20%が好ましく、2~10%がより好ましく、3~7%が特に好ましい。分子鎖中の芳香族炭化水素基を有するケイ素原子が1つより少ない場合、十分な耐寒性が得られない場合がある。
Component (B) Component (B) is an organopolysiloxane having one silicon atom bonded to an aliphatic unsaturated hydrocarbon group per molecule, one or more silicon atoms bearing an aromatic hydrocarbon group in the molecular chain, and a kinematic viscosity at 25°C of 50 to 100,000 mm2 /s. In this organopolysiloxane, there is one silicon atom bonded to an aliphatic unsaturated hydrocarbon group. The organopolysiloxane also has one or more silicon atoms bearing an aromatic hydrocarbon group in the molecular chain. Furthermore, the proportion of aromatic hydrocarbon groups in side chains in the molecular chain of the organopolysiloxane is preferably 1 to 20%, more preferably 2 to 10%, and particularly preferably 3 to 7%, based on the total number of silicon atoms (100%) at non-terminal positions in the molecular chain. If there is less than one silicon atom bearing an aromatic hydrocarbon group in the molecular chain, sufficient cold resistance may not be achieved.

 脂肪族不飽和炭化水素基は、好ましくは、脂肪族不飽和結合を有する、炭素数2~8、さらに好ましくは炭素数2~6の1価炭化水素基であり、より好ましくはアルケニル基である。脂肪族不飽和炭化水素基としては、例えば、ビニル基、アリル基、プロぺニル基、イソプロペニル基、ブレニル基、ヘキセニル基、シクロヘキセニル基、及び、オクテニル基等のアルケニル基が挙げられる。なかでも、ビニル基が特に好ましい。脂肪族不飽和炭化水素基は、分子鎖末端のケイ素原子、分子鎖途中のケイ素原子のいずれかに結合していても良く、両者に結合していてもよい。 The aliphatic unsaturated hydrocarbon group is preferably a monovalent hydrocarbon group having an aliphatic unsaturated bond and having 2 to 8 carbon atoms, more preferably 2 to 6 carbon atoms, and is more preferably an alkenyl group. Examples of aliphatic unsaturated hydrocarbon groups include alkenyl groups such as vinyl, allyl, propenyl, isopropenyl, butenyl, hexenyl, cyclohexenyl, and octenyl. Of these, vinyl groups are particularly preferred. The aliphatic unsaturated hydrocarbon group may be bonded to a silicon atom at the end of the molecular chain, a silicon atom in the middle of the molecular chain, or both.

 前記オルガノポリシロキサンのケイ素原子に結合する、脂肪族炭化水素以外の有機基としては、炭素数1~18、好ましくは炭素数1~10、さらに好ましくは炭素数1~8の、非置換又は置換の1価炭化水素基であり、少なくとも1つの芳香族炭化水素基が含有される。脂肪族炭化水素以外の有機基としては、例えば、メチル基、エチル基、プロピル基、イソプロピル基、ブチル基、イソブチル基、tert-ブチル基、ペンチル基、ネオペンチル基、ヘキシル基、シクロヘキシル基、オクチル基、ノニル基、デシル基等のアルキル基;フェニル基、トリル基、キシリル基、ナフチル基等の芳香族炭化水素基;ベンジル基、フェニルエチル基、フェニルプロピル基等のアラルキル基、又はこれらの基の水素原子の一部又は、全部をフッ素、臭素、塩素などのハロゲン原子、シアノ基等で置換したもの、例えば、クロロメチル基、クロロプロピル基、ブロモエチル基、トリフルオロプロピル基、シアノエチル基等が挙げられる。特にメチル基、フェニル基であることが好ましい。 The organic group other than aliphatic hydrocarbons bonded to the silicon atoms of the organopolysiloxane is an unsubstituted or substituted monovalent hydrocarbon group having 1 to 18 carbon atoms, preferably 1 to 10 carbon atoms, and more preferably 1 to 8 carbon atoms, and containing at least one aromatic hydrocarbon group. Examples of organic groups other than aliphatic hydrocarbons include alkyl groups such as methyl, ethyl, propyl, isopropyl, butyl, isobutyl, tert-butyl, pentyl, neopentyl, hexyl, cyclohexyl, octyl, nonyl, and decyl; aromatic hydrocarbon groups such as phenyl, tolyl, xylyl, and naphthyl; aralkyl groups such as benzyl, phenylethyl, and phenylpropyl; and groups in which some or all of the hydrogen atoms of these groups have been substituted with halogen atoms such as fluorine, bromine, or chlorine, or with cyano groups, such as chloromethyl, chloropropyl, bromoethyl, trifluoropropyl, and cyanoethyl. Methyl and phenyl groups are particularly preferred.

 前記オルガノポリシロキサンは、25℃での動粘度が、50~100,000mm2/s、好ましくは100~30,000mm2/sである。該動粘度が50mm2/s未満であると、シリコーン組成物の物理的特性が低下し、100,000mm2/sを超えると、シリコーン組成物の伸展性が乏しいものとなる。 The organopolysiloxane has a kinematic viscosity of 50 to 100,000 mm 2 /s, preferably 100 to 30,000 mm 2 /s, at 25° C. If the kinematic viscosity is less than 50 mm 2 /s, the physical properties of the silicone composition will be impaired, and if it exceeds 100,000 mm 2 /s, the extensibility of the silicone composition will be poor.

 前記オルガノシロキサンは、上記性質を有するものであればその分子構造は特に限定されず、分子構造としては、直鎖状構造、分岐鎖状構造、一部分岐状構造又は環状構造を有する直鎖状構造等が挙げられる。該分子構造を有するものとしては、特には、主鎖がジオルガノシロキサン単位の繰り返しからなり、分子鎖両末端がトリオルガノシロキシ基で封鎖された直鎖状構造を有するものが好ましい。該直鎖状構造を有するオルガノポリシロキサンは、部分的に分岐状構造又は環状構造を有していてもよい。 The molecular structure of the organosiloxane is not particularly limited as long as it has the above properties. Examples of the molecular structure include a linear structure, a branched structure, and a linear structure having a partially branched or cyclic structure. Those having such a molecular structure are particularly preferred, with the main chain consisting of repeating diorganosiloxane units and a linear structure in which both ends of the molecular chain are capped with triorganosiloxy groups. Organopolysiloxanes having such a linear structure may also have a partially branched or cyclic structure.

 (B)成分のオルガノポリシロキサンは、1種単独で又は2種以上を組み合わせて使用することができる。
 (B)成分の配合量は、(A)成分100質量部に対して、40~900質量部であることが好ましく、60~250質量部であることがより好ましい。
The organopolysiloxane of component (B) may use either a single compound, or a combination of two or more different compounds.
The blend amount of component (B) is preferably 40 to 900 parts by mass, and more preferably 60 to 250 parts by mass, per 100 parts by mass of component (A).

(C)成分
 (C)成分は、ケイ素原子に結合した水素原子(SiH基)を1分子中に2個以上、特に好ましくは2~100個、さらに好ましくは2~50個有するオルガノハイドロジェンポリシロキサンである。該オルガノハイドロジェンポリシロキサンは分子中のSiH基が、上述した(A)成分及び(B)成分が有する脂肪族不飽和炭化水素基と後述の(E)成分の白金族金属触媒の存在下で付加反応し、架橋構造を形成できるものであればよい。
Component (C) is an organohydrogenpolysiloxane having at least two silicon-bonded hydrogen atoms (SiH groups) per molecule, particularly preferably 2 to 100, and even more preferably 2 to 50. Any organohydrogenpolysiloxane may be used as long as the SiH groups in the molecule can undergo an addition reaction with the aliphatic unsaturated hydrocarbon groups in components (A) and (B) described above in the presence of a platinum group metal catalyst, component (E) described below, to form a crosslinked structure.

 前記オルガノハイドロジェンポリシロキサンは、上記性質を有するものであればその分子構造は特に限定されず、分子構造としては、直鎖状構造、分岐鎖状構造、環状構造、一部分岐状構造又は環状構造を有する直鎖状構造等が挙げられる。分子構造としては、直鎖状構造又は環状構造が好ましい。 The molecular structure of the organohydrogenpolysiloxane is not particularly limited as long as it has the above properties. Examples of the molecular structure include a linear structure, a branched structure, a cyclic structure, and a linear structure having a partially branched or cyclic structure. A linear or cyclic structure is preferred as the molecular structure.

 該オルガノハイドロジェンポリシロキサンは、25℃での動粘度が、好ましくは1~1,000mm2/s、より好ましくは10~300mm2/sである。動粘度が1mm2/s以上であれば、シリコーン組成物の物理的特性が低下するおそれがなく、1,000mm2/sで以下であれば、シリコーン組成物の伸展性が乏しいものとなるおそれがない。 The organohydrogenpolysiloxane preferably has a kinematic viscosity at 25° C. of 1 to 1,000 mm 2 /s, and more preferably 10 to 300 mm 2 /s. If the kinematic viscosity is 1 mm 2 /s or higher, there is no risk of the physical properties of the silicone composition being reduced, and if it is 1,000 mm 2 /s or lower, there is no risk of the silicone composition having poor extensibility.

 前記オルガノハイドロジェンポリシロキサンのケイ素原子に結合した有機基としては、脂肪族不飽和炭化水素基以外の非置換または置換の1価炭化水素基が挙げられる。特には、炭素数1~12、好ましくは炭素数1~10の非置換又は置換の1価炭化水素基である。有機基としては、例えば、メチル基、エチル基、プロピル基、ブチル基、ヘキシル基、ドデシル基等のアルキル基、フェニル基等のアリール基、2-フェニルエチル基、2-フェニルプロピル基等のアラルキル基、これらの水素原子の一部又は全部をフッ素、臭素、塩素等のハロゲン原子、シアノ基、エポキシ環含有有機基(グリシジル基又はグリシジルオキシ基置換アルキル基)等で置換したもの、例えば、クロロメチル基、クロロプロピル基、シアノエチル基、2-グリシドキシエチル基、3-グリシドキシプロピル基、及び4-グリシドキシブチル基等が挙げられる。これらの中でも、メチル基、3-グリシドキシプロピル基が好ましい。 The organic group bonded to the silicon atom of the organohydrogenpolysiloxane may be an unsubstituted or substituted monovalent hydrocarbon group other than an aliphatic unsaturated hydrocarbon group. In particular, an unsubstituted or substituted monovalent hydrocarbon group having 1 to 12 carbon atoms, preferably 1 to 10 carbon atoms, is preferred. Examples of organic groups include alkyl groups such as methyl, ethyl, propyl, butyl, hexyl, and dodecyl; aryl groups such as phenyl; aralkyl groups such as 2-phenylethyl and 2-phenylpropyl; and groups in which some or all of the hydrogen atoms have been substituted with halogen atoms such as fluorine, bromine, and chlorine; cyano groups; and epoxy ring-containing organic groups (glycidyl or glycidyloxy-substituted alkyl groups), such as chloromethyl, chloropropyl, cyanoethyl, 2-glycidoxyethyl, 3-glycidoxypropyl, and 4-glycidoxybutyl. Among these, the methyl group and 3-glycidoxypropyl group are preferred.

 (C)成分のオルガノハイドロジェンポリシロキサンは、1種単独でも2種以上を組み合わせて使用してもよい。 The organohydrogenpolysiloxane of component (C) may be used alone or in combination of two or more different compounds.

 (C)成分のオルガノハイドロジェンポリシロキサンの配合量は、(A)成分と(B)成分中の脂肪族不飽和炭化水素基の個数の合計に対する(C)成分中のSiHの個数が、0.4~5となる量、好ましくは0.7~4.5となる量、より好ましくは0.9~4となる量である。
 (C)成分の量が上記下限値の0.4未満では、付加反応が十分に進行せず、架橋が不十分となり硬化不良となる場合がある。また、上記上限値の5超では、架橋構造が不均一となったり、組成物の保存性が著しく悪化したりする場合がある。
The amount of organohydrogenpolysiloxane of component (C) to be blended is an amount such that the ratio of the number of SiH groups in component (C) to the total number of aliphatic unsaturated hydrocarbon groups in components (A) and (B) is 0.4 to 5, preferably 0.7 to 4.5, and more preferably 0.9 to 4.
If the amount of component (C) is less than the lower limit of 0.4, the addition reaction may not proceed sufficiently, resulting in insufficient crosslinking and poor curing, whereas if the amount exceeds the upper limit of 5, the crosslinked structure may become non-uniform and the shelf life of the composition may be significantly reduced.

(D)成分
 (D)成分は、下記一般式(1)で示されるオルガノシランである。
 R1 aSi(OR24-a   (1)
(式(1)中、R1は置換基を有してもよい炭素数1から20の一価炭化水素基であり、R1は同一であっても、異なっていてもよい。R2は置換基を有してもよい炭素数1から20のアルキル基または置換基を有してもよい炭素数3から20のシクロアルキル基であり、R2は同一であっても、異なっていてもよい。aは、1から3の数である。)
Component (D) The component (D) is an organosilane represented by the following general formula (1).
R 1 a Si(OR 2 ) 4-a (1)
(In formula (1), R1 is a monovalent hydrocarbon group having 1 to 20 carbon atoms which may have a substituent, and R1 's may be the same or different. R2 is an alkyl group having 1 to 20 carbon atoms which may have a substituent or a cycloalkyl group having 3 to 20 carbon atoms which may have a substituent, and R2 's may be the same or different. a is a number from 1 to 3.)

 (D)成分は、ウェッター(分散剤)として用いられるものであり、上記(A)成分及び(B)成分は充填材との濡れ性が悪く、ウェッターを添加して混合しないと十分な充填量が得られない。上記式(1)のオルガノシランを添加することで、後述の(G)成分及び(H)成分の充填材の充填量を著しく上げる効果がある。 Component (D) is used as a wetter (dispersant). Components (A) and (B) have poor wettability with fillers, and sufficient loading cannot be achieved without adding a wetter before mixing. Adding the organosilane of formula (1) above has the effect of significantly increasing the loading of the fillers of components (G) and (H), described below.

 ここで、上記式(1)において、R1は炭素数1から20の一価炭化水素基であり、好ましくはアルキル基である。
 上記式(1)において、R2は置換基を有してもよい炭素数1から20のアルキル基または置換基を有してもよい炭素数3から20のシクロアルキル基であり、炭素数1~6のアルキル基が好ましく、メチル基、エチル基が特に好ましい。
 上記式(1)において、aは1、2又は3であり、好ましくは1である。
In the above formula (1), R 1 is a monovalent hydrocarbon group having 1 to 20 carbon atoms, and is preferably an alkyl group.
In the above formula (1), R2 is an alkyl group having 1 to 20 carbon atoms which may have a substituent or a cycloalkyl group having 3 to 20 carbon atoms which may have a substituent, an alkyl group having 1 to 6 carbon atoms is preferred, and a methyl group or an ethyl group is particularly preferred.
In the above formula (1), a is 1, 2 or 3, and is preferably 1.

 上記一般式(1)で表されるオルガノシランの具体例としては、下記のものを挙げることができる。
  Cn2n+1SiX3   (1-1)
  Cn2n+1Si(CH3)X2   (1-2)
  Cn2n+1Si(CH32X   (1-3)
 式(1-1)、式(1-2)及び式(1-3)において、X=メトキシ基(CH3O)、またはエトキシ基(C25O)、n=1~20の数である。
Specific examples of organosilanes represented by the above general formula (1) include the following:
C n H 2n+1 SiX 3 (1-1)
C n H 2n+1 Si(CH 3 )X 2 (1-2)
C n H 2n+1 Si(CH 3 ) 2 X (1-3)
In the formulas (1-1), (1-2) and (1-3), X is a methoxy group (CH 3 O) or an ethoxy group (C 2 H 5 O), and n is a number from 1 to 20.

 (D)成分のオルガノシランの配合量は、(A)成分と(B)成分の合計100質量部に対し、0.01~100質量部の範囲であり、0.1~70質量部が好ましく、1~30質量部がより好ましい。0.01質量部より少ないと濡れ性が乏しく、高温にさらされると弾性率が上昇する場合があり、100質量部より多く配合しても効果が増大することはなく不経済であり、高温下でボイドが発生する場合がある。 The amount of organosilane (component (D)) blended is in the range of 0.01 to 100 parts by mass, preferably 0.1 to 70 parts by mass, and more preferably 1 to 30 parts by mass, per 100 parts by mass of the total of components (A) and (B). Less than 0.01 parts by mass results in poor wettability and may increase the modulus of elasticity when exposed to high temperatures. Blending more than 100 parts by mass does not increase the effect and is uneconomical, and may cause voids to form at high temperatures.

(E)成分
 (E)成分は、白金族金属触媒であり、上述した(A)成分及び(B)成分と、(C)成分との付加反応を促進する。白金族金属触媒は、付加反応に用いられる従来公知のものを使用することができる。該白金族金属触媒としては、例えば、白金系、パラジウム系、ロジウム系の触媒が挙げられるが、中でも比較的入手しやすい白金又は白金化合物が好ましい。白金又は白金化合物としては、例えば、白金の単体、白金黒、塩化白金酸、白金-オレフィン錯体、白金-アルコール錯体、白金配位化合物等が挙げられる。白金族金属触媒は1種単独でも2種以上を組み合わせて使用してもよい。
Component (E) Component (E) is a platinum group metal catalyst that promotes the addition reaction between the above-mentioned components (A) and (B) and component (C). Conventional platinum group metal catalysts used in addition reactions can be used. Examples of platinum group metal catalysts include platinum-based, palladium-based, and rhodium-based catalysts, with platinum or platinum compounds being preferred, as they are relatively readily available. Examples of platinum or platinum compounds include platinum itself, platinum black, chloroplatinic acid, platinum-olefin complexes, platinum-alcohol complexes, and platinum coordination compounds. Platinum group metal catalysts may be used alone or in combination of two or more.

 (E)成分の配合量は触媒としての有効量、即ち、付加反応を促進して本発明の熱伝導性シリコーン組成物を硬化させるために必要な有効量であればよい。該有効量は、組成物中、白金族金属原子に換算した質量基準で0.1~500ppmが好ましく、1~200ppmがより好ましく、10~100ppmがさらに好ましい。触媒の量が上記下限値より少ないと触媒としての効果が得られないことがある。また上記上限値を超えても触媒効果が増大することはなく、不経済であるため好ましくない。 The amount of component (E) blended should be an effective amount as a catalyst, i.e., an amount necessary to promote the addition reaction and cure the thermally conductive silicone composition of the present invention. This effective amount is preferably 0.1 to 500 ppm, more preferably 1 to 200 ppm, and even more preferably 10 to 100 ppm, by mass, converted into platinum group metal atoms in the composition. If the amount of catalyst is less than the lower limit above, the catalytic effect may not be achieved. Furthermore, exceeding the upper limit above does not increase the catalytic effect, and is therefore uneconomical and undesirable.

(F)成分
 (F)成分は室温でのヒドロシリル化反応の進行を抑える反応制御剤であり、シェルフライフ、ポットライフを延長させるものである。該反応制御剤は、付加硬化型シリコーン組成物に使用される従来公知の反応制御剤を使用することができる。該反応制御剤としては、例えば、アセチレンアルコール類(例えば、エチニルメチルデシルカルビノール、1-エチニル-1-シクロヘキサノール、3,5-ジメチル-1-ヘキシン-3-オール)等のアセチレン化合物、トリブチルアミン、テトラメチルエチレンジアミン、ベンゾトリアゾール等の窒素化合物、トリフェニルホスフィン等の有機リン化合物、オキシム化合物、有機クロロ化合物等が挙げられる。
Component (F) Component (F) is a reaction inhibitor that suppresses the progress of the hydrosilylation reaction at room temperature, thereby extending shelf life and pot life. This reaction inhibitor can be any of the conventional reaction inhibitors used in addition-curable silicone compositions. Examples of reaction inhibitors include acetylene compounds such as acetylene alcohols (e.g., ethynylmethyldecylcarbinol, 1-ethynyl-1-cyclohexanol, 3,5-dimethyl-1-hexyn-3-ol), nitrogen compounds such as tributylamine, tetramethylethylenediamine, and benzotriazole, organophosphorus compounds such as triphenylphosphine, oxime compounds, and organochloro compounds.

 (F)成分の配合量は、(A)成分と(B)成分の合計100質量部に対し、0.05~5質量部であり、0.1~2質量部が好ましい。反応制御剤の量が0.05質量部未満では、所望とする十分なシェルフライフ、ポットライフが得られないおそれがあり、また、5質量部より多い場合には、シリコーン組成物の硬化性が低下するおそれがある。 The amount of component (F) blended is 0.05 to 5 parts by mass, preferably 0.1 to 2 parts by mass, per 100 parts by mass of the total of components (A) and (B). If the amount of reaction inhibitor is less than 0.05 parts by mass, the desired shelf life and pot life may not be achieved, and if it is more than 5 parts by mass, the curability of the silicone composition may be reduced.

 なお、反応制御剤は、シリコーン組成物への分散性を良くするために、従来公知のオルガノ(ポリ)シロキサンやトルエン等で希釈して使用してもよい。 In addition, the reaction inhibitor may be diluted with a conventional organo(poly)siloxane, toluene, or the like to improve dispersibility in the silicone composition.

(G)成分
 (G)成分は、平均粒径3μm以下の無機充填材であって、金属、金属酸化物、金属水酸化物、金属窒化物、金属炭化物、炭素の同素体からなる群より選ばれる少なくとも1種の無機充填材であることが好ましい。(G)成分としては、熱伝導率が10W/mK以上のものが使用されることが好ましい。無機充填材のもつ熱伝導率が10W/mK以上であれば、熱伝導性シリコーン組成物の熱伝導率そのものが大きくなるためである。かかる無機充填材としては、アルミニウム粉末、銅粉末、鉄粉末、ニッケル粉末、金粉末、金属ケイ素粉末、窒化アルミニウム粉末、窒化ホウ素粉末、アルミナ粉末、ダイヤモンド粉末、カーボン粉末、インジウム粉末、ガリウム粉末、酸化亜鉛粉末などが挙げられる。10W/mK以上の熱伝導性無機充填材であれば如何なる無機充填材でもよく、1種類あるいは2種類以上を組み合わせたものでもよい。
Component (G) Component (G) is an inorganic filler with an average particle size of 3 μm or less, and is preferably at least one inorganic filler selected from the group consisting of metals, metal oxides, metal hydroxides, metal nitrides, metal carbides, and carbon allotropes. Component (G) preferably has a thermal conductivity of 10 W/mK or more. This is because if the thermal conductivity of the inorganic filler is 10 W/mK or more, the thermal conductivity of the thermally conductive silicone composition itself will be high. Examples of such inorganic fillers include aluminum powder, copper powder, iron powder, nickel powder, gold powder, metal silicon powder, aluminum nitride powder, boron nitride powder, alumina powder, diamond powder, carbon powder, indium powder, gallium powder, and zinc oxide powder. Any inorganic filler with a thermal conductivity of 10 W/mK or more may be used, and one or a combination of two or more types may be used.

 (G)成分は、熱伝導率、調達性の観点からアルミニウム粉末、アルミナ粉末、酸化亜鉛粉末が好ましく、アルミニウム粉末及び/又は酸化亜鉛粉末がより好ましく、さらに好ましくは酸化亜鉛粉末である。 In terms of thermal conductivity and availability, component (G) is preferably aluminum powder, alumina powder, or zinc oxide powder, more preferably aluminum powder and/or zinc oxide powder, and even more preferably zinc oxide powder.

 (G)成分の平均粒径は3μm以下であり、0.1~3μmの範囲が好ましい。該平均粒子径が0.1μm以上であれば、得られる組成物がグリース状になり伸展性の良好なものになり、3μm以下であれば、(H)成分との比率により最密充填となり放熱グリースの熱抵抗が小さくなって熱性能が低下するおそれが小さいためである。なお、本発明において、平均粒径はレーザー回折・散乱式粒度分布測定装置、例えば日機装(株)製マイクロトラックMT3300EXにより測定でき、体積基準の体積平均径である。(G)成分の形状は、不定形でも球形でも如何なる形状でもよい。 The average particle size of component (G) is 3 μm or less, preferably in the range of 0.1 to 3 μm. If the average particle size is 0.1 μm or more, the resulting composition will be grease-like and have good extensibility, while if it is 3 μm or less, the ratio with component (H) will result in close packing, which will reduce the thermal resistance of the thermal grease and reduce the risk of a decrease in thermal performance. In the present invention, the average particle size can be measured using a laser diffraction/scattering particle size distribution analyzer, such as the Microtrac MT3300EX manufactured by Nikkiso Co., Ltd., and is the volume-average diameter based on volume. Component (G) may be of any shape, including amorphous and spherical.

 (G)成分の充填量は、(A)成分と(B)成分の合計100質量部に対し、30~700質量部の範囲が好ましく、40~600質量部の範囲がより好ましく、50~500質量部の範囲が特により好ましい。 The amount of component (G) filled is preferably in the range of 30 to 700 parts by mass, more preferably 40 to 600 parts by mass, and especially more preferably 50 to 500 parts by mass, per 100 parts by mass of the total of components (A) and (B).

(H)成分
 (H)成分は、平均粒径が3μm超から150μm以下である無機充填材であって、金属、金属酸化物、金属水酸化物、金属窒化物、金属炭化物、炭素の同素体からなる群より選ばれる少なくとも1種の熱伝導性充填材である。(H)成分としては、熱伝導率が10W/mK以上のものが使用されることが好ましい。無機充填材のもつ熱伝導率が10W/mK以上であれば、熱伝導性シリコーン組成物の熱伝導率そのものが大きくなるためである。かかる無機充填材としては、アルミニウム粉末、銅粉末、鉄粉末、ニッケル粉末、金粉末、金属ケイ素粉末、窒化アルミニウム粉末、窒化ホウ素粉末、アルミナ粉末、ダイヤモンド粉末、カーボン粉末、インジウム粉末、ガリウム粉末、酸化亜鉛粉末などが挙げられる。10W/mK以上の熱伝導性無機充填材であれば如何なる無機充填材でもよく、1種類あるいは2種類以上を組み合わせたものでもよい。
Component (H) Component (H) is an inorganic filler with an average particle size of more than 3 μm and less than 150 μm, and is at least one thermally conductive filler selected from the group consisting of metals, metal oxides, metal hydroxides, metal nitrides, metal carbides, and carbon allotropes. It is preferable to use component (H) with a thermal conductivity of 10 W/mK or higher. This is because if the thermal conductivity of the inorganic filler is 10 W/mK or higher, the thermal conductivity of the thermally conductive silicone composition itself will be high. Examples of such inorganic fillers include aluminum powder, copper powder, iron powder, nickel powder, gold powder, metal silicon powder, aluminum nitride powder, boron nitride powder, alumina powder, diamond powder, carbon powder, indium powder, gallium powder, and zinc oxide powder. Any inorganic filler with a thermal conductivity of 10 W/mK or higher may be used, and one or a combination of two or more types may be used.

 (H)成分は熱伝導率、調達性の観点からアルミニウム粉末、アルミナ粉末、酸化亜鉛粉末が好ましく、アルミニウム粉末及び/又は酸化亜鉛粉末がより好ましく、さらに好ましくはアルミニウム粉末である。 In terms of thermal conductivity and availability, component (H) is preferably aluminum powder, alumina powder, or zinc oxide powder, more preferably aluminum powder and/or zinc oxide powder, and even more preferably aluminum powder.

 (H)成分の平均粒径は3μm超から150μm以下の範囲であり、好ましくは3μm超から100μm以下、より好ましくは3μm超から80μm以下である。該平均粒子径が3μm超であれば、得られるシリコーン組成物がグリース状になり伸展性の良好なものになり、150μm以下であれば、放熱グリースの熱抵抗が大きくなって熱性能が低下するおそれが小さいためである。なお、本発明において、平均粒径はレーザー回折・散乱式粒度分布測定装置、例えば日機装(株)製マイクロトラックMT3300EXにより測定でき、体積基準の体積平均径である。(H)成分の形状は、不定形でも球形でも如何なる形状でもよい。 The average particle size of component (H) is in the range of more than 3 μm to 150 μm, preferably more than 3 μm to 100 μm, and more preferably more than 3 μm to 80 μm. If the average particle size is more than 3 μm, the resulting silicone composition will be grease-like and have good extensibility, while if it is 150 μm or less, the thermal resistance of the heat-dissipating grease will be high, reducing the risk of a decrease in thermal performance. In the present invention, the average particle size can be measured using a laser diffraction/scattering particle size distribution analyzer, such as the Microtrac MT3300EX manufactured by Nikkiso Co., Ltd., and is the volume-average diameter based on volume. Component (H) may be of any shape, including amorphous and spherical.

 (H)成分の充填量は、(A)成分と(B)成分の合計100質量部に対し、270~2300質量部の範囲が好ましく、360~900質量部の範囲がより好ましく、500~2500質量部の範囲が特に好ましい。 The amount of component (H) filled is preferably in the range of 270 to 2,300 parts by mass, more preferably 360 to 900 parts by mass, and particularly preferably 500 to 2,500 parts by mass, per 100 parts by mass of the total of components (A) and (B).

 (G)成分と(H)成分の充填量の合計は、(A)成分と(B)成分の合計100質量部に対し、300~3000質量部の範囲であることが好ましく、400~2800質量部の範囲であることがより好ましく、500~2500質量部の範囲であることが特に好ましい。充填量が下限値の300質量部未満であると組成物の熱伝導率が低くなったり、上限値の3000質量部を超えると組成物の粘度が上昇し、伸展性の乏しいものとなる場合がある。 The total amount of components (G) and (H) filled is preferably in the range of 300 to 3,000 parts by mass, more preferably 400 to 2,800 parts by mass, and particularly preferably 500 to 2,500 parts by mass, per 100 parts by mass of the total of components (A) and (B). If the amount is less than the lower limit of 300 parts by mass, the thermal conductivity of the composition will be low, while if it exceeds the upper limit of 3,000 parts by mass, the viscosity of the composition will increase, resulting in poor extensibility.

その他の成分
 本発明の熱伝導性シリコーン組成物には、上記した(A)成分~(H)成分以外に、さらに、(G)成分及び(H)成分以外の熱伝導性無機充填材を1種類以上併用してもよい。さらに、熱伝導性無機充填材の充填性を向上する目的や、組成物に接着性を付与する目的で、加水分解性オルガノポリシロキサン、各種変性シリコーン、加水分解性オルガノシラン等を配合してもよい。さらに、組成物の粘度を調整するための溶剤を配合してもよい。さらに、シリコーン組成物の劣化を防ぐために、2,6-ジ-tret-ブチル-4-メチルフェノール等の、従来公知の酸化防止剤を必要に応じて含有してもよい。さらに、染料、顔料、難燃剤、沈降防止剤又はチクソ性向上剤等を、必要に応じて配合することができる。
Other Components In addition to the components (A) to (H) described above, the thermally conductive silicone composition of the present invention may further contain one or more thermally conductive inorganic fillers other than components (G) and (H). Furthermore, for the purpose of improving the filling ability of the thermally conductive inorganic filler or imparting adhesive properties to the composition, hydrolyzable organopolysiloxanes, various modified silicones, hydrolyzable organosilanes, etc. may be blended. Furthermore, a solvent may be blended to adjust the viscosity of the composition. Furthermore, to prevent deterioration of the silicone composition, a conventionally known antioxidant, such as 2,6-di-tert-butyl-4-methylphenol, may be added as needed. Furthermore, dyes, pigments, flame retardants, anti-settling agents, thixotropy improvers, etc. may be blended as needed.

[製造方法]
 本発明の熱伝導性シリコーン組成物の製造方法は特に制限されるものではないが、例えば、(A)成分~(H)成分、必要に応じてその他の成分をトリミックス、ツウィンミックス、プラネタリーミキサー(何れも井上製作所(株)製混合機の登録商標)、ウルトラミキサー(みづほ工業(株)製混合機の登録商標)、ハイビスディスパーミックス(特殊機化工業(株)製混合機の登録商標)等の混合機にて混合する方法を挙げることができる。
[Manufacturing method]
There are no particular limitations on the method for producing the thermally conductive silicone composition of the present invention, but examples include methods in which components (A) through (H), and, if necessary, other components, are mixed in a mixer such as a Trimix, Twinmix, or Planetary Mixer (all of which are registered trademarks of mixers manufactured by Inoue Seisakusho Co., Ltd.), an Ultra Mixer (a registered trademark of mixers manufactured by Mizuho Kogyo Co., Ltd.), or a Hivis Dispermix (a registered trademark of mixers manufactured by Tokushu Kika Kogyo Co., Ltd.).

 また、本発明の熱伝導性シリコーン組成物は、加熱しながら混合してもよく、加熱条件は特に制限されるものではないが、温度は通常25~220℃、好ましくは40~200℃、より好ましくは50~200℃であり、時間は通常3分~24時間、好ましくは5分~12時間、より好ましくは10分~6時間である。また加熱時に脱気を行ってもよい。 The thermally conductive silicone composition of the present invention may also be mixed while being heated. While there are no particular restrictions on the heating conditions, the temperature is typically 25 to 220°C, preferably 40 to 200°C, and more preferably 50 to 200°C, and the heating time is typically 3 minutes to 24 hours, preferably 5 minutes to 12 hours, and more preferably 10 minutes to 6 hours. Degassing may also be performed during heating.

[熱伝導性シリコーン組成物の特性]
 このようにして得られた本発明の熱伝導性シリコーン組成物は、25℃にて測定される粘度が、100~1,000Pa・sの範囲がよく、好ましくは150~800Pa・s、より好ましくは200~600Pa・sである。粘度が上記範囲の下限以上であれば、保存時に経時で熱伝導性充填材が沈降するなど、作業性が悪くなるおそれは小さい。また上記範囲の上限以下であれば、伸展性が乏しくなり作業性が悪化するおそれは小さい。
[Characteristics of the thermally conductive silicone composition]
The thermally conductive silicone composition of the present invention obtained in this manner should have a viscosity measured at 25°C in the range of 100 to 1,000 Pa·s, preferably 150 to 800 Pa·s, and more preferably 200 to 600 Pa·s. If the viscosity is at or above the lower limit of the above range, there is little risk of the thermally conductive filler settling over time during storage, which could result in poor workability. If the viscosity is below the upper limit of the above range, there is little risk of poor extensibility and poor workability.

 本発明の熱伝導性シリコーン組成物は0.5~10W/mKの熱伝導率を有する。 The thermally conductive silicone composition of the present invention has a thermal conductivity of 0.5 to 10 W/mK.

 本発明の熱伝導性シリコーン組成物は、例えば、125℃にて90分間加熱硬化して2mm厚シートを作製した後、JIS K6251に記載の2号ダンベルの形状を作製して測定される、硬化後の切断時伸びが好ましくは50%以上であり、65%以上がより好ましく、さらに好ましくは80%以上である。切断時伸びが上記下限以上であれば、高温保存時に剥離が発生しにくく、熱抵抗が悪化するおそれが小さい。 The thermally conductive silicone composition of the present invention is, for example, heat-cured at 125°C for 90 minutes to produce a 2 mm thick sheet, and then the elongation at break after curing, as measured by creating a No. 2 dumbbell shape as specified in JIS K6251, is preferably 50% or more, more preferably 65% or more, and even more preferably 80% or more. If the elongation at break is above the above lower limit, peeling is less likely to occur during high-temperature storage, and there is little risk of deterioration in thermal resistance.

 また、本発明の熱伝導性シリコーン組成物は、例えば、ガラスに挟み、室温にて15分間加圧し、150℃にて60分間加熱した後、室温まで冷却後に、260℃にて5分間加熱を5回繰り返した後にボイドを有さないものであることが好ましい。
 このような熱伝導性シリコーン組成物であれば、上記のような条件下でも放熱性能を維持できる。
Furthermore, the thermally conductive silicone composition of the present invention preferably contains no voids after, for example, sandwiching it between glass plates, applying pressure at room temperature for 15 minutes, heating at 150°C for 60 minutes, cooling it to room temperature, and then heating at 260°C for 5 minutes, which is repeated five times.
Such a thermally conductive silicone composition can maintain its heat dissipation performance even under the above conditions.

 以下、実施例(合成例、配合例)及び比較例を示し、本発明を具体的に説明するが、本発明は下記の実施例に制限されるものではない。なお、下記の例において、動粘度はウベローデ型オストワルド粘度計による25℃の値を示す。また、平均粒子径の値はレーザー回折/散乱式粒度測定装置(LA-750:(株)堀場製作所製)で測定したメジアン径D50である。「部」は「質量部」を意味し、Viはビニル基を示し、Phはフェニル基を示す。 The present invention will be explained in detail below with examples (synthesis examples, formulation examples) and comparative examples, but the present invention is not limited to the following examples. In the following examples, the kinematic viscosity is the value measured at 25°C using an Ubbelohde-type Ostwald viscometer. The average particle size is the median diameter D50 measured using a laser diffraction/scattering particle size analyzer (LA-750: manufactured by Horiba, Ltd.). "Parts" means "parts by mass," Vi represents vinyl groups, and Ph represents phenyl groups.

(A)成分
A-1:
 下記式(A-1)で示される両末端がジメチルビニル基(ビニル基量0.0071mol/100g)で封鎖された、25℃における動粘度が5000mm2/sのジフェニル・ジメチルポリシロキサン
(式中、a=18.7、b=320であり、a/(a+b)=0.055である。)
(A) Component A-1:
A diphenyl dimethylpolysiloxane represented by the following formula (A-1), both ends of which are capped with dimethylvinyl groups (vinyl group amount: 0.0071 mol/100 g), and having a kinematic viscosity at 25° C. of 5000 mm 2 /s:
(Wherein, a = 18.7, b = 320, and a/(a + b) = 0.055.)

A-2:
 下記式(A-2)で示される両末端がジメチルビニル基(ビニル基量0.0130mol/100g)で封鎖された、25℃における動粘度が1000mm2/sのジフェニル・ジメチルポリシロキサン
(式中、a=6.7、b=216.3であり、a/(a+b)=0.030である。)
A-2:
A diphenyl dimethylpolysiloxane represented by the following formula (A-2), both ends of which are capped with dimethylvinyl groups (vinyl group amount: 0.0130 mol/100 g), and having a kinematic viscosity at 25° C. of 1000 mm 2 /s:
(Wherein, a = 6.7, b = 216.3, and a/(a + b) = 0.030.)

 A-3:
 下記式(A-3)で示される両末端がジメチルビニル基(ビニル基量0.0037mol/100g)で封鎖された、25℃における動粘度が20000mm2/sのジフェニル・ジメチルポリシロキサン
(式中、a=31+b=1000であり、a/(a+b)=0.030である。)
A-3:
A diphenyl dimethylpolysiloxane represented by the following formula (A-3), both ends of which are capped with dimethylvinyl groups (vinyl group amount: 0.0037 mol/100 g), and having a kinematic viscosity at 25° C. of 20,000 mm 2 /s:
(Wherein, a = 31 + b = 1000, and a/(a + b) = 0.030.)

(B)成分
B-1:
 下記式(B-1)で示され、1つの片末端がジメチルビニルシリル基(ビニル基量0.0047mol/100g)で封鎖され、もう1つの片末端がトリメチルシリル基で封鎖されたものであって、25℃における動粘度が700mm2/sのジフェニル・ジメチルポリシロキサン
(式中、X+Y=2.0であり、c=7.5、d=141.6であり、c/(c+d)=0.050であり、Phはフェニル基を示す。)
(B) Component B-1:
Diphenyl dimethylpolysiloxane represented by the following formula (B-1), one end of which is capped with a dimethylvinylsilyl group (vinyl group amount: 0.0047 mol/100 g) and the other end of which is capped with a trimethylsilyl group, and which has a kinematic viscosity at 25°C of 700 mm 2 /s.
(In the formula, X+Y=2.0, c=7.5, d=141.6, c/(c+d)=0.050, and Ph represents a phenyl group.)

(C)成分
C-1:
 下記式(C-1)で示される25℃における動粘度が33mm2/sのオルガノハイドロジェンポリシロキサン(Si-H基量0.0010mol/g)
(C) Component C-1:
An organohydrogenpolysiloxane (Si—H group amount: 0.0010 mol/g) represented by the following formula (C-1) and having a kinematic viscosity of 33 mm 2 /s at 25° C.

C-2:
 下記式(C-2)で示される25℃における動粘度が36mm2/sのオルガノハイドロジェンポリシロキサン(Si-H基量0.0014mol/g)
C-2:
An organohydrogenpolysiloxane (Si—H group amount: 0.0014 mol/g) represented by the following formula (C-2) and having a kinematic viscosity of 36 mm 2 /s at 25° C.

(D)成分
D-1:
 下記式(D-1)で示されるオルガノシラン
(D) Component D-1:
An organosilane represented by the following formula (D-1):

(E)成分
E-1:
 白金-ジビニルテトラメチルジシロキサン錯体を、両末端がジメチルビニルシリル基で封鎖された、25℃における動粘度が600mm2/sのジメチルポリシロキサンに溶解した溶液(白金原子含有量:白金原子として1質量%)
(E) Component E-1:
A solution (platinum atom content: 1 mass % as platinum atoms) of a platinum-divinyltetramethyldisiloxane complex dissolved in dimethylpolysiloxane having a kinematic viscosity of 600 mm 2 /s at 25°C and both ends capped with dimethylvinylsilyl groups.

(F)成分
F-1:
 下記式(F-1)で示される1-エチニル-1-シクロヘキサノール
(F) Component F-1:
1-ethynyl-1-cyclohexanol represented by the following formula (F-1):

(G)成分
 G-1:平均粒子径が0.3μmの酸化亜鉛粉末(酸化亜鉛の熱伝導率が25W/mK)
(G) Component G-1: Zinc oxide powder with an average particle size of 0.3 μm (thermal conductivity of zinc oxide is 25 W/mK)

(H)成分
 H-1:平均粒子径が10μmのアルミニウム粉末(アルミニウムの熱伝導率が236W/mK)
Component (H) H-1: Aluminum powder with an average particle size of 10 μm (thermal conductivity of aluminum is 236 W/mK)

[実施例1~8]
シリコーン組成物の調製
 上記(A)成分~(H)成分を、下記表1及び2に示す配合量に従い、下記に示す方法で配合してシリコーン組成物を調製した。なお、SiH/SiVi(個数比)は(A)成分及び(B)成分中の脂肪族不飽和炭化水素基の個数の合計に対する(C)成分中のSiH基の個数の合計の比である。
 5リットルのプラネタリ―ミキサー(井上製作所(株)製)に、(A)成分、(B)成分、(D)成分、(G)成分、(H)成分を加え、70℃で1時間混合した。40℃以下になるまで冷却し、次に(F)成分、(E)成分及び(C)成分を加え、均一になるように混合し、各シリコーン組成物を調製した。
[Examples 1 to 8]
Preparation of Silicone Composition Silicone compositions were prepared by blending the components (A) to (H) in the amounts shown in Tables 1 and 2 using the method described below. Note that SiH/SiVi (number ratio) is the ratio of the total number of SiH groups in component (C) to the total number of aliphatic unsaturated hydrocarbon groups in components (A) and (B).
Components (A), (B), (D), (G), and (H) were placed in a 5-liter planetary mixer (manufactured by Inoue Seisakusho Co., Ltd.) and mixed for 1 hour at 70°C. After cooling to 40°C or below, components (F), (E), and (C) were added and mixed until uniform, to prepare each silicone composition.

[比較例1]
 実施例1において、式(A-1)中、a=0、b=450.4であるジメチルポリシロキサン(a-1)を(A-1)成分の代わりに用いて、かつ、式(B-1)中、c=0、d=216.2であるジメチルポリシロキサン(b-1)を(B-1)成分の代わりに用いた以外、実施例1と同様の方法でシリコーン組成物を調製した。
[Comparative Example 1]
A silicone composition was prepared in the same manner as in Example 1, except that dimethylpolysiloxane (a-1) in which a = 0 and b = 450.4 in formula (A-1) was used in place of component (A-1), and dimethylpolysiloxane (b-1) in which c = 0 and d = 216.2 in formula (B-1) was used in place of component (B-1).

[比較例2]
 実施例4において、比較例1と同様に、ジメチルポリシロキサンを用いた以外は、実施例4と同様の方法でシリコーン組成物を調製した。
[Comparative Example 2]
In Example 4, a silicone composition was prepared in the same manner as in Comparative Example 1, except that dimethylpolysiloxane was used.

[比較例3]
 実施例7において、比較例1と同様に、ジメチルポリシロキサンを用いた以外は、実施例7と同様の方法でシリコーン組成物を調製した。
[Comparative Example 3]
In Example 7, a silicone composition was prepared in the same manner as in Comparative Example 1, except that dimethylpolysiloxane was used.

[比較例4]
 実施例8において、比較例1と同様に、ジメチルポリシロキサンを用いた以外は、実施例8と同様の方法でシリコーン組成物を調製した。
[Comparative Example 4]
In Example 8, a silicone composition was prepared in the same manner as in Comparative Example 1, except that dimethylpolysiloxane was used.

[粘度]
 各シリコーン組成物の絶対粘度は、マルコム粘度計(タイプPC-1TL)を用いて25℃で測定した。
[viscosity]
The absolute viscosity of each silicone composition was measured at 25° C. using a Malcom viscometer (type PC-1TL).

[熱伝導率]
 各シリコーン組成物を未硬化状態でラップに包み、各組成物の熱伝導率は、ホットディスク法を利用する熱物性測定装置(本実施例では、京都電子工業社製のTPS-2500S)により、いずれも25℃において測定した。
[Thermal conductivity]
Each silicone composition was wrapped in plastic wrap in its uncured state, and the thermal conductivity of each composition was measured at 25°C using a thermal property measuring device (in this example, a TPS-2500S manufactured by Kyoto Electronics Manufacturing Co., Ltd.) that utilizes the hot disk method.

硬化物の製造
 各シリコーン組成物を125℃で90分間加熱して2mm厚の硬化物を作製した。
Preparation of Cured Products Each silicone composition was heated at 125°C for 90 minutes to prepare a cured product having a thickness of 2 mm.

[耐寒性]
 各シリコーン組成物の硬化物を作製し(例えば厚み2mmサンプルで適したサイズにカットしたものを用意し)、NETZSCH社製TMA4000SEを用いて、-80℃から0℃におけるTMA(thermomechanical analysis)を実施した。耐寒性のある材料の場合は、一定の割合でTMAが上昇する、つまり低温領域において微結晶が生成されておらず、見かけの架橋密度が増大することがなく、値の急上昇が観測されない状態を耐寒性ありと判定する。一方で、耐寒性の無い材料は、冷却時に主ポリマー同士の接触が起こり、微結晶が生成され、見かけの架橋密度が増大する。これによって温度上昇時に値の急上昇が観測される(今回はこの現象を確認できる組成を耐寒性が無いものと判定する。)以下に、判定の一例を示す。CTEの値は数μオーダーの測定値のため、その絶対値は測定毎、組成サンプルによってばらつくため、絶対値の議論はせず、-80から0℃までで、図1及び図2に記載の変化の傾向が観察されるかによって耐寒性を判定した。
[Cold resistance]
Cured products of each silicone composition were prepared (for example, 2 mm thick samples cut to an appropriate size were prepared), and TMA (thermomechanical analysis) was performed at temperatures from -80°C to 0°C using a NETZSCH TMA4000SE. For cold-resistant materials, the TMA increases at a constant rate; that is, microcrystals are not formed in the low-temperature range, the apparent crosslink density does not increase, and no sudden increase in the value is observed. This is considered to be cold-resistant. On the other hand, for materials that are not cold-resistant, contact occurs between the main polymers upon cooling, microcrystals are formed, and the apparent crosslink density increases. This results in a sudden increase in the value when the temperature rises (in this case, compositions in which this phenomenon can be confirmed are considered to be non-cold-resistant). An example of this determination is shown below. Since the CTE values are measured on the order of several μm, the absolute values vary for each measurement and depending on the composition of the sample. Therefore, the absolute values are not discussed, and cold resistance was determined based on whether the tendency of change shown in FIGS. 1 and 2 was observed from −80 to 0° C.

 表1の結果より、実施例1~8の熱伝導性シリコーン組成物では、耐寒性を有することが明らかとなった。即ち、電子部品パッケージやパワーモジュール実装時、低温下での動作環境にて従来品と比べより高い信頼性が得られる。 The results in Table 1 clearly show that the thermally conductive silicone compositions of Examples 1 to 8 are cold-resistant. In other words, when mounted in electronic component packages or power modules, they offer higher reliability than conventional products in low-temperature operating environments.

 一方、表2の比較例1~4の熱伝導性シリコーン組成物では、マイナス40℃付近での耐寒性が無かった。即ち、電子部品パッケージやパワーモジュール実装時の低温環境下での動作において信頼性が低下する。 On the other hand, the thermally conductive silicone compositions of Comparative Examples 1 to 4 in Table 2 lacked cold resistance at temperatures around -40°C. This means that reliability is reduced when operating in low-temperature environments when mounted in electronic component packages or power modules.

 従って、本発明の熱伝導性シリコーン組成物は低温環境下で使用された場合、温度上昇に伴う急激な膨張が抑えられており、耐寒性の向上効果が期待できる。このような特性を有するため、低温環境下で動作する電子部品パッケージやパワーモジュールに使用される放熱グリースとして特に好適に利用することができる。 As a result, when the thermally conductive silicone composition of the present invention is used in low-temperature environments, it is possible to expect improved cold resistance as it suppresses rapid expansion that occurs with temperature increases. Because of these properties, it is particularly suitable for use as a thermal grease for electronic component packages and power modules that operate in low-temperature environments.

Claims (5)

 下記の(A)成分、(B)成分、(C)成分、(D)成分、(E)成分、(F)成分、(G)成分及び(H)成分を含有する熱伝導性シリコーン組成物。
(A)1分子中に少なくとも2個の脂肪族不飽和炭化水素基が結合したケイ素原子を有し、分子鎖中に芳香族炭化水素基を有するケイ素原子を1つ以上含有し、かつ、25℃での動粘度50~100,000mm2/sであるオルガノポリシロキサン
(B)1分子中に1個の脂肪族不飽和炭化水素基が結合したケイ素原子を有し、分子鎖中に芳香族炭化水素基を有するケイ素原子を1つ以上含有し、かつ、25℃での動粘度が50~100,000mm2/sであるオルガノポリシロキサン
(C)ケイ素原子に結合した水素原子(=SiH基)を1分子中に2個以上有するオルガノハイドロジェンポリシロキサン:(A)成分と(B)成分中の脂肪族不飽和炭化水素基の個数の合計に対する(C)成分中のSiHの個数が0.4~5となる量
(D)下記一般式(1)で示されるオルガノシラン:(A)成分と(B)成分の合計100質量部に対して0.01~100質量部
 R1 aSi(OR24-a   (1)
(式(1)中、R1は置換基を有してもよい炭素数1から20の一価炭化水素基であり、R1は同一であっても、異なっていてもよい。R2は置換基を有してもよい炭素数1から20のアルキル基または置換基を有してもよい炭素数3から20のシクロアルキル基であり、R2は同一であっても、異なっていてもよい。aは、1から3の数である。)
(E)白金族金属触媒:有効量
(F)反応制御剤:(A)成分と(B)成分の合計100質量部に対して0.05~5.0質量部
(G)平均粒径3μm以下の無機充填材
(H)平均粒径が3μm超から150μm以下である無機充填材:(G)成分と(H)成分の合計が、(A)成分と(B)成分の合計100質量部に対して300~3,000質量部
A thermally conductive silicone composition comprising the following components (A), (B), (C), (D), (E), (F), (G), and (H):
(A) Organopolysiloxanes having per molecule a silicon atom to which at least two aliphatic unsaturated hydrocarbon groups are bonded, and one or more silicon atoms in the molecular chain having an aromatic hydrocarbon group, and having a kinematic viscosity at 25°C of 50 to 100,000 mm 2 /s. (B) Organopolysiloxanes having per molecule a silicon atom to which one aliphatic unsaturated hydrocarbon group is bonded, and one or more silicon atoms in the molecular chain having an aromatic hydrocarbon group, and having a kinematic viscosity at 25°C of 50 to 100,000 mm 2 /s. (C) an organohydrogenpolysiloxane having two or more silicon-bonded hydrogen atoms (SiH groups) per molecule: an amount such that the number of SiH groups in component (C) is 0.4 to 5 relative to the total number of aliphatic unsaturated hydrocarbon groups in components (A) and (B); (D) an organosilane represented by the following general formula (1): R 1 a Si(OR 2 ) 4- a (1): 0.01 to 100 parts by mass per 100 parts by mass of the total of components (A) and (B):
(In formula (1), R1 is a monovalent hydrocarbon group having 1 to 20 carbon atoms which may have a substituent, and R1 's may be the same or different. R2 is an alkyl group having 1 to 20 carbon atoms which may have a substituent or a cycloalkyl group having 3 to 20 carbon atoms which may have a substituent, and R2 's may be the same or different. a is a number from 1 to 3.)
(E) Platinum group metal catalyst: effective amount (F) Reaction inhibitor: 0.05 to 5.0 parts by mass per 100 parts by mass of the total of components (A) and (B); (G) Inorganic filler having an average particle size of 3 μm or less; (H) Inorganic filler having an average particle size of more than 3 μm to 150 μm or less: the total of components (G) and (H) is 300 to 3,000 parts by mass per 100 parts by mass of the total of components (A) and (B);
 (G)成分が酸化亜鉛粉末である請求項1に記載の組成物。 The composition according to claim 1, wherein component (G) is zinc oxide powder.  (H)成分がアルミニウム粉末である請求項1に記載の組成物。 The composition according to claim 1, wherein component (H) is aluminum powder.  (F)成分が、アセチレン化合物、窒素化合物、有機リン化合物、オキシム化合物及び有機クロロ化合物より選択される反応制御剤である請求項1に記載の組成物。 The composition according to claim 1, wherein component (F) is a reaction inhibitor selected from acetylene compounds, nitrogen compounds, organic phosphorus compounds, oxime compounds, and organic chloro compounds.  請求項1~4のいずれか1項に記載の組成物の硬化物。 A cured product of the composition described in any one of claims 1 to 4.
PCT/JP2025/007452 2024-03-05 2025-03-03 Thermally conductive silicone composition Pending WO2025187619A1 (en)

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JPH05105814A (en) * 1991-01-24 1993-04-27 Shin Etsu Chem Co Ltd Curable silicone composition and cured product thereof
JPH11209618A (en) * 1998-01-27 1999-08-03 Matsushita Electric Works Ltd Heat-conductive silicone rubber composition
JP2016151010A (en) * 2015-02-19 2016-08-22 信越化学工業株式会社 Addition-curable silicone composition
JP2019001900A (en) * 2017-06-15 2019-01-10 信越化学工業株式会社 Thermally conducive silicone composition
WO2020080326A1 (en) * 2018-10-18 2020-04-23 ダウ・東レ株式会社 Curable organopolysiloxane composition having excellent cold resistance, pattern forming method, electronic components, etc.
JP2021147591A (en) * 2020-03-24 2021-09-27 信越化学工業株式会社 Heat softenable addition curing type thermally conductive silicone composition
WO2023189699A1 (en) * 2022-03-31 2023-10-05 株式会社タイカ Thermally conductive silicone composition

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05105814A (en) * 1991-01-24 1993-04-27 Shin Etsu Chem Co Ltd Curable silicone composition and cured product thereof
JPH11209618A (en) * 1998-01-27 1999-08-03 Matsushita Electric Works Ltd Heat-conductive silicone rubber composition
JP2016151010A (en) * 2015-02-19 2016-08-22 信越化学工業株式会社 Addition-curable silicone composition
JP2019001900A (en) * 2017-06-15 2019-01-10 信越化学工業株式会社 Thermally conducive silicone composition
WO2020080326A1 (en) * 2018-10-18 2020-04-23 ダウ・東レ株式会社 Curable organopolysiloxane composition having excellent cold resistance, pattern forming method, electronic components, etc.
JP2021147591A (en) * 2020-03-24 2021-09-27 信越化学工業株式会社 Heat softenable addition curing type thermally conductive silicone composition
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