WO2025187577A1 - Sheet, copper-clad laminate, circuit board, and production method for sheet - Google Patents
Sheet, copper-clad laminate, circuit board, and production method for sheetInfo
- Publication number
- WO2025187577A1 WO2025187577A1 PCT/JP2025/007313 JP2025007313W WO2025187577A1 WO 2025187577 A1 WO2025187577 A1 WO 2025187577A1 JP 2025007313 W JP2025007313 W JP 2025007313W WO 2025187577 A1 WO2025187577 A1 WO 2025187577A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- sheet
- fluororesin
- mass
- silica
- filler
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B15/00—Layered products comprising a layer of metal
- B32B15/04—Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material
- B32B15/08—Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B15/00—Layered products comprising a layer of metal
- B32B15/20—Layered products comprising a layer of metal comprising aluminium or copper
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J5/00—Manufacture of articles or shaped materials containing macromolecular substances
- C08J5/18—Manufacture of films or sheets
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K3/00—Use of inorganic substances as compounding ingredients
- C08K3/01—Use of inorganic substances as compounding ingredients characterized by their specific function
- C08K3/013—Fillers, pigments or reinforcing additives
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K3/00—Use of inorganic substances as compounding ingredients
- C08K3/34—Silicon-containing compounds
- C08K3/36—Silica
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K7/00—Use of ingredients characterised by shape
- C08K7/16—Solid spheres
- C08K7/18—Solid spheres inorganic
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K9/00—Use of pretreated ingredients
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L27/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Compositions of derivatives of such polymers
- C08L27/02—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Compositions of derivatives of such polymers not modified by chemical after-treatment
- C08L27/12—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Compositions of derivatives of such polymers not modified by chemical after-treatment containing fluorine atoms
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L27/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Compositions of derivatives of such polymers
- C08L27/02—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Compositions of derivatives of such polymers not modified by chemical after-treatment
- C08L27/12—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Compositions of derivatives of such polymers not modified by chemical after-treatment containing fluorine atoms
- C08L27/18—Homopolymers or copolymers or tetrafluoroethene
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B3/00—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties
- H01B3/18—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of organic substances
- H01B3/30—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of organic substances plastics; resins; waxes
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/03—Use of materials for the substrate
Definitions
- This disclosure relates to a sheet, a copper clad laminate, a circuit board, and a method for manufacturing the sheet.
- Patent Document 1 High-frequency printed wiring boards with low transmission loss are in demand.
- Patent Document 1 The use of fluororesin film in such high-frequency printed wiring boards is known (see, for example, Patent Document 1).
- Patent Documents 2 and 3 describe the use of fluororesin containing filler as a wiring board material.
- Patent Document 4 discloses the use of a fluororesin composition in which spherical silica particles are blended with a fluororesin for circuit boards.
- Patent Publication No. 2015-8260 Japanese Patent Application Publication No. 63-259907 Special Publication No. 2022-510017 International Publication No. 2020/145133
- the objective of this disclosure is to provide a sheet that exhibits a small rate of change in dielectric tangent upon water absorption.
- the present disclosure provides a sheet containing a fluororesin and a filler, and having a specific gravity of 2.05 or more and 2.19 or less.
- the fluororesin is preferably a polytetrafluoroethylene resin.
- the filler is preferably silica.
- the silica is preferably spherical silica.
- the silica preferably has a particle size of 0.1 to 3 ⁇ m.
- the silica content is preferably 20 to 80% by mass based on the sheet weight.
- the surface of the silica is preferably treated with a surface treatment agent.
- the fluororesin is a polytetrafluoroethylene resin having a standard specific gravity of 2.0 to 2.3
- the filler is spherical silica
- the particle size of the spherical silica is 0.5 to 2.1 ⁇ m
- the content of the polytetrafluoroethylene resin is 40 to 60 mass % relative to the sheet weight
- the content of the spherical silica is 40 to 60 mass % relative to the sheet weight.
- the present disclosure also relates to a sheet containing 20 to 80% by mass of polytetrafluoroethylene resin relative to the sheet weight and surface-treated spherical silica with a particle size of 0.1 to 3 ⁇ m, the silica content being 20 to 80% by mass relative to the sheet weight, and having a specific gravity of 2.05 or more and 2.19 or less.
- the sheet preferably has a water absorption rate of 0.10% or less.
- the sheet is obtained by a manufacturing process that includes a densification step that increases the specific gravity of the sheet by 1% or more.
- the rate of change in the dielectric loss tangent of the sheet before and after water absorption is compared, it is preferable that the rate of change in the dielectric loss tangent after densification is lower than that before densification.
- the sheet preferably has a linear expansion coefficient of 120 ppm/K or less.
- the sheet preferably has a thickness of 0.1 to 2 mm.
- the sheet is preferably an insulating material for a circuit board.
- the present disclosure also relates to a metal clad laminate having a metal layer and the above-mentioned sheet as essential layers.
- the metal layer is preferably a copper foil.
- the present disclosure also provides a circuit board comprising the sheet and a metal layer.
- the metal constituting the metal layer is preferably copper.
- the copper is preferably rolled copper or electrolytic copper.
- the circuit board is preferably a printed circuit board, a laminated circuit board, or a high-frequency board.
- the present disclosure also provides a method for producing the above-mentioned sheet, comprising: a step (1) of mixing the above-mentioned fluororesin and the filler and rolling the mixture into a sheet; and a step (2) of densifying the rolled sheet obtained by the step (1).
- the rolled sheet is pressurized so that the specific gravity of the rolled sheet increases by 1% or more, the fluororesin is polytetrafluoroethylene resin having a standard specific gravity of 2.0 to 2.3, the filler is spherical silica having a particle size of 0.5 to 2.1 ⁇ m, the polytetrafluoroethylene resin content is 40 to 60 mass% relative to the sheet weight, and the spherical silica content is 40 to 60 mass% relative to the sheet weight.
- the fluororesin is polytetrafluoroethylene resin having a standard specific gravity of 2.0 to 2.3
- the filler is spherical silica having a particle size of 0.5 to 2.1 ⁇ m
- the polytetrafluoroethylene resin content is 40 to 60 mass% relative to the sheet weight
- the spherical silica content is 40 to 60 mass% relative to the sheet weight.
- the sheet disclosed herein has a small rate of change in dielectric tangent when absorbing water.
- compositions containing fluororesins and fillers have been conducted. Meanwhile, in the field of high-frequency printed wiring boards, increasingly high levels of performance, such as low dielectric constant, low loss, and low expansion, are being demanded in recent years.
- the electrochemical properties of the sheet must be stable and unaffected by the surrounding environment.
- sheets made of filler and fluororesin are prone to change in dielectric tangent when they absorb water. Since sheets containing fluororesin are required to have low dielectric constant and low loss, in order to achieve stable low loss, it is preferable that the sheet containing fluororesin has low water absorption. Low water absorption makes it possible to reduce the rate of change in dielectric tangent when water is absorbed.
- the density is increased to reduce the rate of change in the dielectric tangent upon water absorption.
- the density is increased to reduce the rate of change in the dielectric tangent upon water absorption.
- Resin compositions containing large amounts of filler are prone to gaps at the interface between the resin and filler, and when formed into a sheet using a conventional molding method, voids are likely to form. Furthermore, voids are generated when the molding aid is removed from the fluororesin. It is believed that this allows water to enter the voids, causing the above-mentioned problems.
- this problem can be solved by reducing these voids and creating a high-density sheet, for example by performing a densification process after molding.
- the sheet of the present disclosure contains a fluororesin and a filler, and has a specific gravity of 2.05 or more and 2.19 or less.
- the specific gravity in this disclosure is a value measured by the density and specific gravity measurement method according to JIS Z 8807 (Method for measuring density and specific gravity of solids) 8, submerged weighing method.
- the lower limit of the specific gravity is more preferably 2.05.
- the upper limit of the specific gravity is preferably 2.18, more preferably 2.17, and even more preferably 2.16.
- a sheet having such a specific gravity has a low porosity, which provides the above-mentioned effects.
- the sheet of the present disclosure preferably has a water absorption rate of 0.10% or less, more preferably 0.08% or less, and even more preferably 0.06% or less.
- the sheet of the present disclosure has a low porosity. It is preferable to reduce the porosity and achieve the water absorption rate described above.
- a water absorption rate of the above value is preferable in that it can effectively achieve the goal of reducing the rate of change in dielectric tangent upon water absorption.
- the water absorption rate is determined by drying a 50 x 50 (mm) sheet at 110°C for 1 hour, cooling it to 23°C in a desiccator, and then immersing it in water at 23°C for 24 hours.
- the water absorption rate is calculated from the weight before and after immersion in water.
- the water absorption rate is more preferably 0.08% or less, and even more preferably 0.07% or less. Since a low water absorption rate does not pose any particular problems, the lower limit is not particularly limited and may be 0%. The lower limit is preferably 0.001%.
- the sheet of the present disclosure preferably has a linear expansion coefficient of 120 ppm/K or less. Having such a linear expansion coefficient is preferable in that it results in a dielectric sheet with low shrinkage and excellent dimensional stability.
- the linear expansion coefficient is more preferably 70 ppm/K or less, and even more preferably 50 ppm/K or less.
- linear expansion coefficient there is no particular lower limit for the linear expansion coefficient, but it is more preferably 5 ppm/K, and even more preferably 10 ppm/K.
- the linear expansion coefficient in this specification was determined by performing TMA measurements in tension mode using a TMA-7100 (Hitachi High-Tech Science Corporation). A sample piece was cut out of a sheet measuring 20 mm in length, 5 mm in width, and 150 ⁇ m in thickness. The distance between the chucks was set to 10 mm, and a load of 49 mN was applied at a heating rate of 2°C/min. The change in sample length was determined from the amount of change in sample length from -10 to 160°C.
- the sheet of the present disclosure preferably has a film thickness of 0.03 to 2 mm. By achieving a film thickness within this range, the sheet becomes suitable for applications such as those described in detail below in this disclosure.
- the lower limit is more preferably 0.05 mm, and even more preferably 0.1 mm.
- the upper limit is more preferably 1 mm, and even more preferably 0.5 mm.
- the film thicknesses in this disclosure are values measured using a film thickness gauge.
- the sheet of the present disclosure preferably has a rate of change in relative dielectric constant in the temperature range of -50 to 150°C of 0.025 or less, more preferably 0.023 or less, and even more preferably 0.021 or less.
- a sheet within this range is preferred in that it minimizes temperature-related changes in electrical properties and provides stable performance when used in high-frequency printed circuit boards.
- the sheet of the present disclosure contains a fluororesin and a filler.
- a sheet containing these has a low dielectric constant and therefore low transmission loss, making it particularly suitable for use as a printed wiring board.
- the composition of the present disclosure contains a fluororesin, which has low dielectric properties and can therefore be suitably used for the purposes of the present disclosure.
- Fluororesins that can be used in the present disclosure are not particularly limited, but examples include polytetrafluoroethylene (PTFE), tetrafluoroethylene [TFE]/hexafluoropropylene [HFP] copolymer [FEP], TFE/alkyl vinyl ether copolymer [PFA], TFE/HFP/alkyl vinyl ether copolymer [EPA], TFE/chlorotrifluoroethylene [CTFE] copolymer, TFE/ethylene copolymer [ETFE], polyvinylidene fluoride [PVdF], and tetrafluoroethylene with a molecular weight of 300,000 or less [LMW-PTFE]. They may be used alone or in combination of two or more.
- PTFE polytetrafluoroethylene
- TFE tetrafluoroethylene
- HFP hexafluoropropylene
- FEP tetrafluoroethylene
- PFA TFE/alkyl vinyl
- PTFE polytetrafluoroethylene resin
- Fibrillar PTFE refers to PTFE that can be paste-extruded as unsintered polymer powder.
- the PTFE may be modified polytetrafluoroethylene (hereinafter referred to as modified PTFE), homopolytetrafluoroethylene (hereinafter referred to as homoPTFE), or a mixture of modified PTFE and homoPTFE.
- modified PTFE polytetrafluoroethylene
- homoPTFE homopolytetrafluoroethylene
- the content of modified PTFE in the polymeric PTFE is preferably 10% by mass or more and 98% by mass or less, and more preferably 50% by mass or more and 95% by mass or less.
- the homo-PTFE is not particularly limited, and homo-PTFE disclosed in JP-A-53-60979, JP-A-57-135, JP-A-61-16907, JP-A-62-104816, JP-A-62-190206, JP-A-63-137906, JP-A-2000-143727, JP-A-2002-201217, WO 2007/046345 pamphlet, WO 2007/119829 pamphlet, WO 2009/001894 pamphlet, WO 2010/113950 pamphlet, WO 2013/027850 pamphlet, etc. can be suitably used.
- homo-PTFE which has high stretchability and is disclosed in JP 57-135 A, JP 63-137906 A, JP 2000-143727 A, JP 2002-201217 A, WO 2007/046345, WO 2007/119829, WO 2010/113950, etc., is preferred.
- Modified PTFE is composed of TFE and a monomer other than TFE (hereinafter referred to as the modified monomer).
- Modified PTFE includes, but is not limited to, PTFE that is uniformly modified with the modified monomer, PTFE that is modified at the beginning of the polymerization reaction, and PTFE that is modified at the end of the polymerization reaction.
- the modified PTFE is preferably a TFE copolymer obtained by polymerizing a small amount of a monomer other than TFE together with TFE, within a range that does not significantly impair the properties of the TFE homopolymer.
- the modified PTFE can be suitably used, for example, those disclosed in JP-A-60-42446, JP-A-61-16907, JP-A-62-104816, JP-A-62-190206, JP-A-64-1711, JP-A-2-261810, JP-A-11-240917, JP-A-11-240918, WO 2003/033555 pamphlet, WO 2005/061567 pamphlet, WO 2007/005361 pamphlet, WO 2011/055824 pamphlet, WO 2013/027850 pamphlet, etc.
- modified PTFE with high stretchability disclosed in JP 61-16907 A, JP 62-104816 A, JP 64-1711 A, JP 11-240917 A, WO 2003/033555 A, WO 2005/061567 A, WO 2007/005361 A, WO 2011/055824 A, etc. are preferred.
- Modified PTFE contains TFE units based on TFE and modified monomer units based on modified monomers.
- the modified monomer units are part of the molecular structure of the modified PTFE and are derived from the modified monomers.
- the modified PTFE preferably contains modified monomer units in an amount of 0.001 to 0.500 mass% of the total monomer units, and more preferably 0.01 to 0.30 mass%.
- the total monomer units are the portions derived from all monomers in the molecular structure of the modified PTFE.
- the modifying monomer is not particularly limited as long as it is copolymerizable with TFE, and examples include perfluoroolefins such as hexafluoropropylene (HFP); chlorofluoroolefins such as chlorotrifluoroethylene (CTFE); hydrogen-containing fluoroolefins such as trifluoroethylene and vinylidene fluoride (VDF); perfluorovinyl ether; perfluoroalkylethylene (PFAE), ethylene, etc.
- perfluoroolefins such as hexafluoropropylene (HFP); chlorofluoroolefins such as chlorotrifluoroethylene (CTFE); hydrogen-containing fluoroolefins such as trifluoroethylene and vinylidene fluoride (VDF); perfluorovinyl ether; perfluoroalkylethylene (PFAE), ethylene, etc.
- HFP hexafluoropropylene
- the perfluorovinyl ether is not particularly limited, and examples thereof include perfluorounsaturated compounds represented by the following general formula (1).
- CF 2 CF-ORf...(1)
- Rf represents a perfluoroorganic group.
- a perfluoroorganic group is an organic group in which all hydrogen atoms bonded to carbon atoms are substituted with fluorine atoms.
- the perfluoroorganic group may also have an ether oxygen.
- perfluorovinyl ether is perfluoro(alkyl vinyl ether) (PAVE), where Rf in the above general formula (1) is a perfluoroalkyl group having 1 to 10 carbon atoms. The number of carbon atoms in the perfluoroalkyl group is preferably 1 to 5.
- perfluoroalkyl groups in PAVE include perfluoromethyl, perfluoroethyl, perfluoropropyl, perfluorobutyl, perfluoropentyl, and perfluorohexyl groups.
- Preferred PAVEs are perfluoropropyl vinyl ether (PPVE) and perfluoromethyl vinyl ether (PMVE).
- the perfluoroalkylethylene is not particularly limited, and examples include perfluorobutylethylene (PFBE), perfluorohexylethylene (PFHE), etc.
- the modifying monomer in the modified PTFE is preferably at least one (e.g., 1 to 6) selected from the group consisting of HFP, CTFE, VDF, PAVE, PFAE, and ethylene.
- Non-melt-moldable means that the resin does not have sufficient fluidity even when heated above its melting point, and cannot be molded using melt-molding techniques commonly used for resins. PTFE falls into this category.
- the PTFE preferably has an SSG of 2.0 to 2.3. Using such PTFE makes it easier to obtain a PTFE membrane with high strength (cohesion and puncture strength per unit thickness).
- PTFE with a large molecular weight has long molecular chains, making it difficult to form a structure with regularly arranged molecular chains. In this case, the length of the amorphous portion increases, and the degree of entanglement between molecules increases. When the degree of entanglement between molecules is high, the PTFE membrane is less likely to deform under an applied load and is thought to exhibit excellent mechanical strength.
- using PTFE with a large molecular weight makes it easier to obtain a PTFE membrane with a small average pore size.
- the lower limit of the SSG is more preferably 2.05, and even more preferably 2.1.
- the upper limit of the SSG is more preferably 2.25, and even more preferably 2.2.
- Standard specific gravity is measured by preparing a sample in accordance with ASTM D-4895-89 and measuring the specific gravity of the resulting sample using the water displacement method.
- the molecular weight (number average molecular weight) of the PTFE constituting the PTFE powder is, for example, in the range of 2 million to 12 million.
- the lower limit of the molecular weight of PTFE may be 3 million or 4 million.
- the upper limit of the molecular weight of PTFE may be 10 million.
- the method for determining it from the standard specific gravity can be performed using a sample molded in accordance with ASTM D-4895 98 and the water displacement method in accordance with ASTM D-792.
- the dynamic viscoelasticity measurement method is explained, for example, by S. Wu in Polymer Engineering & Science, 1988, Vol. 28, 538, and the same publication, 1989, Vol. 29, 273.
- the refractive index of the PTFE is preferably in the range of 1.2 to 1.6. Having such a refractive index is preferable in that it has low dielectric constant.
- the refractive index can be adjusted to fall within the above range by adjusting the polarizability or the flexibility of the main chain.
- the lower limit of the refractive index is more preferably 1.25, more preferably 1.30, and most preferably 1.32.
- the upper limit of the refractive index is more preferably 1.55, more preferably 1.50, and most preferably 1.45.
- the above refractive index was measured using a refractometer (Abbemat 300).
- the maximum endothermic peak temperature (crystalline melting point) of the above-mentioned PTFE is 340 ⁇ 7°C.
- the PTFE may be low-melting-point PTFE, with a maximum peak temperature of 338°C or less on the endothermic curve of the crystalline melting curve measured with a differential scanning calorimeter, or high-melting-point PTFE, with a maximum peak temperature of 342°C or more on the endothermic curve of the crystalline melting curve measured with a differential scanning calorimeter.
- the low-melting-point PTFE is a powder produced by emulsion polymerization, and preferably has the above-mentioned maximum endothermic peak temperature (crystalline melting point), a dielectric constant ( ⁇ ) of 2.08 to 2.2, and a dielectric dissipation factor (tan ⁇ ) of 1.9 ⁇ 10 -4 to 4.0 ⁇ 10 -4 .
- Commercially available products include Polyflon Fine Powder F201, F203, F205, F301, and F302 manufactured by Daikin Industries, Ltd.; CD090 and CD076 manufactured by Asahi Glass Industry Co., Ltd.; and TF6C, TF62, and TF40 manufactured by DuPont.
- High-melting-point PTFE powder is also a powder produced by emulsion polymerization, has the above-mentioned maximum endothermic peak temperature (crystalline melting point), and has a generally low dielectric constant ( ⁇ ) of 2.0 to 2.1 and a dielectric dissipation factor (tan ⁇ ) of 1.6 ⁇ 10 -4 to 2.2 ⁇ 10 -4 .
- Commercially available products include Polyflon Fine Powder F104 and F106 manufactured by Daikin Industries, Ltd.; CD1, CD141, and CD123 manufactured by Asahi Glass Co., Ltd.; and TF6 and TF65 manufactured by DuPont.
- Powdered PTFE that meets the above-mentioned parameters can be obtained using conventional manufacturing methods. For example, it can be produced by following the manufacturing methods described in International Publication Nos. 2015-080291 and 2012-086710.
- the filler that can be used in the present disclosure is not particularly limited, and examples thereof include organic fillers that are one or more selected from aramid fibers, polyphenyl esters, polyphenylene sulfide, polyimides, polyether ether ketones, polyphenylenes, polyamides, and wholly aromatic polyester resins, and inorganic fillers that are one or more selected from ceramics, talc, mica, aluminum oxide, zinc oxide, tin oxide, titanium oxide, silica, calcium carbonate, calcium oxide, magnesium oxide, potassium titanate, glass fibers, glass chips, glass beads, silicon carbide, calcium fluoride, boron nitride, barium sulfate, molybdenum disulfide, and potassium carbonate whiskers. Two or more of these may also be used in combination.
- the shape of the filler is not particularly limited, but spherical fillers are particularly preferred. Spherical shapes are preferred because they facilitate uniform processing during drilling, have a small specific surface area, and result in low transmission loss.
- silica it is particularly preferable to use silica, and it is most preferable to use spherical silica particles.
- the spherical silica particles mentioned above refer to particles whose shape is close to a perfect sphere.
- the sphericity is preferably 0.80 or higher, more preferably 0.85 or higher, even more preferably 0.90 or higher, and most preferably 0.95 or higher.
- the average value measured for 100 particles using an image processing device (Spectris Inc.: FPIA-3000) is used.
- the spherical silica particles used in this disclosure preferably have a D90/D10 of 2 or more (preferably 2.3 or more, or 2.5 or more) and a D50 of 10 ⁇ m or less, when integrating the volume from the smallest particle size. Furthermore, it is preferable that D90/D50 is 1.5 or more (even more preferably 1.6 or more). It is preferable that D50/D10 is 1.5 or more (even more preferably 1.6 or more). Furthermore, it is even more preferable that D50 is 5 ⁇ m or less. Since small-sized spherical silica particles can enter the gaps between larger-sized spherical silica particles, excellent filling properties and high fluidity can be achieved.
- the particle size distribution has a higher frequency on the small particle size side compared to a Gaussian curve.
- the particle size can be measured using a laser diffraction/scattering particle size distribution analyzer.
- coarse particles make it difficult to form a thin film sheet, it is preferable that coarse particles above a certain particle size have been removed using a filter or the like.
- the above-mentioned spherical silica particles preferably have a water absorption of 1.0% or less, and more preferably 0.5% or less. Water absorption is based on the mass of the silica particles when dry. Water absorption is measured by leaving a dry sample at 40°C and 80% RH for 1 hour, and then measuring and calculating the amount of water generated by heating to 200°C using a Karl Fischer moisture analyzer.
- the spherical silica particles can be measured using the above-mentioned methods after the fluororesin sheet is heated in an air atmosphere at 600°C for 30 minutes to burn off the fluororesin and the spherical silica particles are removed.
- the surface treatment is not particularly limited, and any known treatment can be used. Specific examples include treatment with a silane coupling agent such as an epoxy silane, amino silane, isocyanate silane, vinyl silane, acrylic silane, hydrophobic alkyl silane, phenyl silane, or fluorinated alkyl silane, which has a reactive functional group; plasma treatment; and fluorination treatment.
- a silane coupling agent such as an epoxy silane, amino silane, isocyanate silane, vinyl silane, acrylic silane, hydrophobic alkyl silane, phenyl silane, or fluorinated alkyl silane, which has a reactive functional group
- plasma treatment and fluorination treatment.
- silane coupling agent examples include epoxy silanes such as ⁇ -glycidoxypropyltriethoxysilane and ⁇ -(3,4-epoxycyclohexyl)ethyltrimethoxysilane, amino silanes such as aminopropyltriethoxysilane and N-phenylaminopropyltrimethoxysilane, isocyanate silanes such as 3-isocyanatepropyltrimethoxysilane, vinyl silanes such as vinyltrimethoxysilane, and acrylic silanes such as acryloxytrimethoxysilane.
- epoxy silanes such as ⁇ -glycidoxypropyltriethoxysilane and ⁇ -(3,4-epoxycyclohexyl)ethyltrimethoxysilane
- amino silanes such as aminopropyltriethoxysilane and N-phenylaminopropyltrimethoxysilane
- isocyanate silanes
- the spherical silica particles may be commercially available silica particles that satisfy the above-mentioned properties.
- Examples of commercially available silica particles include Denka Fused Silica FB Grade (manufactured by Denka Company Limited), Denka Fused Silica SFP Grade (manufactured by Denka Company Limited), Excelica (manufactured by Tokuyama Corporation), high-purity synthetic spherical silica particles Admafine (manufactured by Admatechs Co., Ltd.), Admanano (manufactured by Admatechs Co., Ltd.), and Admafuse (manufactured by Admatechs Co., Ltd.).
- the filler used in the present disclosure preferably has a ratio of (dielectric tangent of the filler measured at 10 GHz)/(surface area of the filler (m 2 /g)) of 0.00001 to 0.00035.
- Use of a filler that satisfies this relationship is preferred in that it allows for the production of a sheet with particularly excellent low dielectric constant, low loss, and low expansion.
- the value of (dielectric loss tangent of filler measured at 10 GHz)/(surface area of filler (m 2 /g)) can be adjusted by the shape and size of the filler, whether or not surface treatment is performed, and the like. More specifically, it is preferable to use spherical silica particles of a predetermined size as the above-mentioned spherical silica particles, which are further surface-treated. It is preferable that the surface of the silica is treated with a surface treatment agent. When surface treatment is performed, the type of surface treatment agent also affects the above parameter.
- the silica is surface-treated with aminopropyltriethoxysilane, aminosilane, vinylsilane, hydrophobic alkylsilane, phenylsilane, 3-mercaptopropylsilane, 3-acryloxypropylsilane, 3-methacryloxypropylsilane, p-styrylsilane, silylpropylsuccinic anhydride, 3-isocyanatopropylsilane, 2-(3,4-epoxycyclohexyl)ethylsilane, or the like.
- the polar functional groups present on the filler surface react, reducing the amount of polar functional groups, resulting in excellent electrical properties.
- the filler is preferably contained in an amount of 20 to 80% by mass relative to the sheet weight. This amount is preferable in that it achieves low thermal expansion while maintaining a low dielectric constant and low loss.
- the amount is more preferably 40% by mass or more, even more preferably 53% by mass or more, and even more preferably 56% by mass or more.
- the upper limit of the above (dielectric loss tangent of the filler measured at 10 GHz)/(surface area of the filler (m 2 /g)) is more preferably 0.00030, and even more preferably 0.00025.
- the dielectric loss tangent of the filler measured at 10 GHz was measured using a cylindrical cavity resonator and network analyzer.
- a filler powder sample was filled into a quartz tube and loaded into the resonator.
- the resonator's characteristics were obtained before and after inserting the sample, and the dielectric loss tangent was calculated from the results.
- This measurement method complies with Japanese Industrial Standard JIS 2565, Microwave Ferrite Core Test Method, and measurements were performed in an environment with a room temperature of 25°C and humidity of 40%.
- the dielectric loss tangent of the filler measured at 10 GHz is not particularly limited, but is preferably 0.0015 or less. This value is preferable in that it results in low loss for the fluororesin sheet.
- the upper limit is more preferably 0.0025, and even more preferably 0.002.
- the surface area (m 2 /g) of the filler is not particularly limited, but is preferably 1 to 10. Setting it within this range is preferable in that it achieves a good balance between low loss and low linear expansion of the fluororesin sheet.
- the lower limit is more preferably 1.2, and even more preferably 1.5.
- the upper limit is more preferably 9, and even more preferably 7.
- the surface area (m 2 /g) of the filler is a value based on the BET method, and can be measured using a specific surface area measuring device "Macsorb HM model-1208" (manufactured by MACSORB Co., Ltd.).
- Macsorb HM model-1208 manufactured by MACSORB Co., Ltd.
- the average particle size of the filler is preferably 0.1 ⁇ m or more, and more preferably 0.5 ⁇ m or more. In the present disclosure, the average particle size of the filler is preferably 250 ⁇ m or less, more preferably 100 ⁇ m or less, even more preferably 10 ⁇ m or less, even more preferably 3 ⁇ m or less, even more preferably 2.5 ⁇ m or less, and particularly preferably 2.1 ⁇ m or less.
- the filler may have an average particle size of 0.5 to 250 ⁇ m.
- the average particle size here is the D50 value measured using a laser analytical particle size distribution analyzer. If the average particle size is 0.5 ⁇ m or greater, the filler is less likely to aggregate, and sufficient effects tend to be obtained.
- the sheet of the present disclosure contains the above-described filler and fluororesin. If necessary, it may contain components other than the filler and fluororesin, or it may consist only of the filler and fluororesin.
- the content of components other than the filler and fluororesin is preferably 10% by mass or less (0% by mass, i.e., not contained, or greater than 0% by mass and 10% by mass or less).
- the total content of the fluororesin and filler is preferably, for example, 90% by mass or more and 100% by mass or less relative to the sheet weight.
- the ratio Wf/Wr of the mass of the filler Wf to the mass Wr of the fluororesin may be, for example, 0.6 to 1.5.
- the sheet of the present disclosure preferably has a fluororesin content of 20 to 80% by mass relative to the total amount of the sheet. Incorporating a filler in this range is preferable in that it reduces the linear expansion coefficient and makes the sheet easier to mold.
- the lower limit of the filler content is not particularly limited, but from the perspective of reducing the linear expansion coefficient, it is preferably 30% by mass, and more preferably 40% by mass.
- the upper limit is more preferably 75% by mass, even more preferably 70% by mass, even more preferably 65% by mass, and even more preferably 60% by mass.
- the method for manufacturing a sheet according to the present disclosure is not particularly limited, but an example thereof will be described.
- the method for manufacturing a sheet according to the present disclosure includes, for example, step (1) of mixing the fluororesin and the filler and rolling them into a sheet; and step (2) of densifying the rolled sheet obtained by step (1).
- the sheet according to the present disclosure can be obtained by mixing fluororesin particles and a filler to form a film in step (1), and then rolling the sheet obtained by the film formation in step (2). By rolling, the amount of voids in the sheet is reduced, thereby achieving high density.
- the method for forming the film on the sheet in step (1) is not limited, but can be performed by paste extrusion molding, powder rolling molding, or the like.
- powdered PTFE with a primary particle diameter of 0.05 to 10 ⁇ m.
- the primary particle diameter is a value measured in accordance with ASTM D 4895.
- the above-mentioned powdered PTFE preferably contains 50% by mass or more, and more preferably 80% by mass or more, of polytetrafluoroethylene resin with a secondary particle diameter of 500 ⁇ m or more. Having PTFE with a secondary particle diameter of 500 ⁇ m or more within this range has the advantage of allowing the production of a high-strength sheet. Using PTFE with a secondary particle diameter of 500 ⁇ m or more makes it possible to obtain a sheet with lower resistance and greater toughness.
- the lower limit of the secondary particle diameter is more preferably 300 ⁇ m, and even more preferably 350 ⁇ m.
- the upper limit of the secondary particle diameter is more preferably 700 ⁇ m or less, and even more preferably 600 ⁇ m or less.
- the secondary particle diameter can be determined, for example, by a sieving method.
- the powdered PTFE preferably has an average primary particle diameter of 50 nm or more, as this allows for the production of a sheet with higher strength and excellent homogeneity. It is more preferably 100 nm or more, even more preferably 150 nm or more, and particularly preferably 200 nm or more.
- the average primary particle diameter can be determined by creating a calibration curve between the transmittance of 550 nm incident light per unit length of an aqueous dispersion of PTFE obtained by polymerization, with the polymer concentration adjusted to 0.22% by mass, and the average primary particle diameter determined by measuring the unidirectional diameter in a transmission electron microscope photograph, and then measuring the transmittance for the aqueous dispersion to be measured, and then using the calibration curve.
- the PTFE used in this disclosure may have a core-shell structure.
- PTFE with a core-shell structure include modified polytetrafluoroethylene particles containing a core of high-molecular-weight polytetrafluoroethylene and a shell of lower-molecular-weight polytetrafluoroethylene or modified polytetrafluoroethylene.
- modified polytetrafluoroethylene include the polytetrafluoroethylene described in JP-A-2005-527652.
- step (1) The specific methods for paste extrusion molding and powder rolling molding in step (1) are not particularly limited, but general methods are described below.
- the method for producing the sheet may include the steps of: (1a) mixing the PTFE powder obtained using a hydrocarbon surfactant with an extrusion aid; (1b) paste-extrusion molding the resulting mixture; (1c) rolling the extrudate obtained by extrusion; (1d) drying the rolled sheet; and (1e) firing the dried sheet to obtain a molded product.
- the paste extrusion molding may also be carried out by adding conventionally known additives such as pigments and fillers to the PTFE powder.
- the extrusion aid is not particularly limited, and commonly known agents can be used. Examples include hydrocarbon oils.
- the sheet can also be formed by powder rolling.
- Powder rolling is a method of applying shear force to resin powder to fibrillate it and form it into a sheet. This method may include a subsequent step of firing the powder to obtain a molded product. More specifically, the method includes a step (1-1) of applying shear force while mixing a raw material composition containing a fluororesin and a filler. a step (1-2) of forming the mixture obtained in the step (1-1) into a bulk form, and a step (1-3) of rolling the bulk mixture obtained in the step (1-2) into a sheet form.
- the densification treatment is not particularly limited, and specific examples include pressing with a pressure roll or a pressure press.
- the densification treatment preferably increases the specific gravity of the sheet by 1% or more. More specifically, in step (2), the rolled sheet obtained in step (1) is preferably pressurized so that the specific gravity of the rolled sheet increases by 1% or more. Increasing the specific gravity in this manner allows the objectives of the present disclosure to be successfully achieved. To achieve such an increase rate, it is preferable to appropriately adjust the pressure, temperature, pressurization time, etc.
- the upper limit of the increase rate of specific gravity is not particularly limited, but is, for example, 10% or less.
- the densification treatment when comparing the rate of change in dielectric tangent before and after water absorption, the densification treatment preferably results in a lower rate of change in the dielectric tangent of the densified sheet compared to the sheet before densification. That is, the dielectric tangent of the sheet before densification treatment and the sheet after densification treatment are measured before and after water absorption. The rate of change in dielectric tangent due to water absorption is then calculated for each sheet before and after densification treatment. In this case, the densified sheet has a smaller rate of change in dielectric tangent. Note that water absorption here is measured using the same method as the water absorption rate measurement method described above.
- the ratio R2/R1 of the rate of change R2 of the dielectric tangent of the sheet before and after absorbing water to the rate of change R1 of the dielectric tangent of the sheet before and after absorbing water is preferably 0.8 or less, and more preferably 0.7 or less.
- the pressure roll comes into direct contact with the sheet passing through the pressing mechanism and applies pressure to it. This is particularly preferred because it increases the density of the sheet.
- the pressure roll is preferably a rubber roll, a resin roll, or a metal roll.
- a pair of rolls one of which is a metal roll and the other of which is a rubber-coated roll with a metal core, can be used to apply appropriate pressure.
- the material of the metal roll is not particularly limited, and examples include iron, stainless steel (SUS304, SUS430, SUS410, SUS403, etc.), copper, etc.
- the surface of the metal roll may be subjected to various surface treatments to improve durability and processability.
- Surface treatments are not particularly limited, and include plating treatments such as chrome plating, copper plating, nickel plating, or composite plating of these; mechanical treatments such as embossing and grooving; and treatments to improve release properties such as fluorine coating and silicone coating.
- the linear pressure applied to the sheet by the pressure roll is preferably 30 to 500 kg/cm. More preferably, it is 40 to 400 kg/cm. Even more preferably, it is 50 to 300 kg/cm. This range is preferable because it makes it easier to produce a sheet with the specified density described above.
- the electric furnace or the pressure roll itself may be heated.
- the temperature range of the sheet is preferably 10 to 250°C, more preferably 15 to 150°C, and even more preferably 20 to 100°C.
- the pressure rolls may have different diameters and rotation speeds on opposite sides. This design allows the shear force applied to the sheet to be varied.
- the pressure roll may be any known means for pressing. More specifically, examples include a pair of rolls as described in Japanese Patent No. 6590350, a two-high rolling mill as described in Japanese Patent No. 5087646, a cluster mill as described in International Publication No. 2020/204070, and a planetary rolling mill as described in Japanese Patent Application Laid-Open No. 62-275508.
- the pressure roll may be equipped with a cleaning mechanism.
- the cleaning mechanism is not particularly limited, and examples include an adhesive roll.
- the pressure press directly contacts the sheet with a press-fitting mechanism and applies pressure. This is particularly preferred because it increases the density of the sheet.
- the pressure press is preferably made of rubber, resin, or metal. Using a metal plate, in particular, allows for the application of appropriate pressure.
- the material of the metal plate is not particularly limited, and examples include iron, stainless steel (SUS304, SUS430, SUS410, SUS403, etc.), copper, etc.
- the plate surface may also be subjected to various surface treatments to improve durability and processability. Surface treatments are not particularly limited, and include plating treatments such as chrome plating, copper plating, nickel plating, or composite plating of these; mechanical treatments such as embossing and grooving; and treatments to improve release properties such as fluorine coating or silicone coating.
- the pressure applied by the pressure press is preferably 1 to 200 MPa. More preferably, it is 5 to 100 MPa. Even more preferably, it is 10 to 80 MPa. This range is preferable because it makes it easier to produce a sheet with the specified density described above.
- the electric furnace or pressure plate itself When applying pressure using the pressure press, the electric furnace or pressure plate itself may be heated.
- the temperature range of the sheets is preferably 10 to 250°C, more preferably 15 to 150°C, and even more preferably 20 to 100°C. By using these pressure conditions, the sheets can be more easily integrated, and the objectives of the present disclosure can be preferably achieved.
- the sheet-shaped resin composition of the present disclosure can be used by laminating it with other substrates as a sheet for printed wiring boards, i.e., it can be suitably used as an insulating material for circuit boards.
- the present disclosure also relates to a metal clad laminate having a metal layer and the above-described sheet as essential layers.
- the metal clad laminate of the present disclosure is, for example, a metal clad laminate characterized by having a metal layer adhered to one or both sides of the above-described sheet (e.g., a fluororesin film).
- a fluororesin film e.g., a fluororesin film.
- the fluororesin-containing film of the present disclosure is particularly suitable for use in printed wiring board applications, and can therefore be suitably used as such a metal clad laminate.
- examples of metal species constituting the metal layer include copper (e.g., rolled copper, electrolytic copper, etc.), aluminum, SUS, nickel, gold, etc. Alloys of these can also be used. From the perspective of conductivity and circuit processability, copper is preferably used. A heat-resistant layer (nickel plating, titanium plating, etc.) or an anti-rust layer (chromate treatment layer, etc.) may be formed on the copper surface. Furthermore, the surface may be chemically treated with a silane coupling agent. Among these, it is preferable to use copper foil as the metal layer.
- copper e.g., rolled copper, electrolytic copper, etc.
- aluminum e.g., SUS, nickel, gold, etc. Alloys of these can also be used. From the perspective of conductivity and circuit processability, copper is preferably used. A heat-resistant layer (nickel plating, titanium plating, etc.) or an anti-rust layer (chromate treatment layer, etc.) may be formed on the copper surface. Furthermore, the surface may
- the copper foil preferably has an Rz of 1.6 ⁇ m or less.
- the sheet of the present disclosure also has excellent adhesion to highly smooth copper foil with an Rz of 1.6 ⁇ m or less.
- the copper foil only needs to have an Rz of 1.6 ⁇ m or less on at least the surface that adheres to the fluororesin film; the Rz value of the other surface is not particularly limited.
- the Rz value is the sum of the highest point (maximum peak height: Rp) and the deepest point (maximum valley depth: Rv).
- the surface roughness is the ten-point average roughness specified in JIS-B0601. In this specification, the Rz value is measured using a surface roughness meter (product name: Surfcom 470A, manufactured by Tokyo Seiki Co., Ltd.) with a measurement length of 4 mm.
- the thickness of the copper foil is not particularly limited, but is preferably in the range of 1 to 100 ⁇ m, more preferably in the range of 5 to 50 ⁇ m, and even more preferably in the range of 9 to 35 ⁇ m.
- the copper foil is not particularly limited, and specific examples include rolled copper foil and electrolytic copper foil.
- the copper foil with an Rz of 1.6 ⁇ m or less there are no particular limitations on the copper foil with an Rz of 1.6 ⁇ m or less, and commercially available products can be used.
- Examples of commercially available copper foil with an Rz of 1.6 ⁇ m or less include electrolytic copper foil CF-T9DA-SV-18 (thickness 18 ⁇ m/Rz 0.85 ⁇ m) (manufactured by Fukuda Metal Foil & Powder Co., Ltd.).
- the copper foil may be surface-treated to increase its adhesive strength with the fluororesin film of the present disclosure.
- the surface treatment is not particularly limited, but examples include silane coupling treatment, plasma treatment, corona treatment, UV treatment, and electron beam treatment.
- the reactive functional group of the silane coupling agent is not particularly limited, but from the perspective of adhesion to resin substrates, it is preferable for the silane coupling agent to have at least one (e.g., one to four) terminal group selected from amino groups, (meth)acrylic groups, mercapto groups, and epoxy groups.
- the hydrolyzable group is not particularly limited, but examples include alkoxy groups such as methoxy groups and ethoxy groups.
- the copper foil used in this disclosure may have an anti-corrosion layer (such as an oxide film such as chromate), a heat-resistant layer, etc. formed thereon.
- Surface-treated copper foil having a surface treatment layer made from the above-mentioned silane compound on the copper foil surface can be produced by preparing a solution containing the silane compound and then surface treating the copper foil with this solution.
- the copper foil may have a roughened layer on the surface from the viewpoint of improving adhesion to the resin substrate. If the roughening treatment is likely to degrade the performance required in the present disclosure, the amount of roughening particles electrodeposited on the copper foil surface may be reduced as needed, or the roughening treatment may not be performed at all.
- one or more layers selected from the group consisting of a heat-resistant treatment layer, a rust-proofing treatment layer, and a chromate treatment layer may be provided between the metal layer and the surface treatment layer. These layers may be a single layer or multiple layers.
- the metal-clad laminate of the present disclosure may further include a layer other than the metal layer and the fluororesin film.
- the layers other than the metal layer and the fluororesin film are preferably at least one type (e.g., 1 to 12 types) selected from the group consisting of polyimide, modified polyimide, liquid crystal polymer, polyphenylene sulfide, cycloolefin polymer, polystyrene, epoxy resin, bismaleimide, polyphenylene oxide, modified polyphenylene ether, polyphenylene ether, and polybutadiene.
- These layers other than the metal layer and fluororesin film are not particularly limited as long as they are made of the resins mentioned above. Furthermore, it is preferable that the thickness of the layers other than the copper foil and fluororesin film be within the range of 12.5 to 260 ⁇ m.
- the metal layer may be formed on one or both sides of the roll film.
- Methods for forming the metal layer include laminating (adhering) metal foil to the surface of the roll film, vapor deposition, and plating.
- Methods for laminating copper foil include heat pressing.
- the heat pressing temperature may be between the melting point of the dielectric film -150°C and the melting point of the dielectric film +40°C.
- the heat pressing time is, for example, 1 to 30 minutes.
- the laminate can be manufactured using a heat pressing pressure of 0.1 to 10 MPa.
- the present disclosure also relates to a circuit board characterized by having the above-mentioned sheet and a metal layer.
- the above-mentioned metal-clad laminate is not particularly limited in its application and is used as a circuit board.
- Examples of circuit boards include printed circuit boards, laminated circuit boards, and high-frequency boards.
- a printed circuit board is a plate-shaped component that electrically connects electronic components such as semiconductors and capacitor chips while also arranging and fixing them in a limited space. There are no particular restrictions on the configuration of a printed circuit board formed from this metal-clad laminate.
- the printed circuit board may be a rigid board, a flexible board, or a rigid-flexible board.
- the printed circuit board may be a single-sided board, a board, a double-sided board, or a multilayer board (such as a built-up board). It is particularly suitable for use as a flexible board or a rigid board. It is particularly suitable for use as a high-frequency printed circuit board of 10 GHz or more.
- the circuit board is not particularly limited and can be manufactured using the metal-clad laminate described above using a general method.
- a laminate for a circuit board is also a laminate characterized by having a metal layer, the above-mentioned fluororesin film, and a substrate layer.
- a metal layer there are no particular restrictions on the substrate layer, but it is preferable for it to have a fabric layer made of glass fiber and a resin film layer.
- the glass fiber fabric layer is a layer made of glass cloth, glass nonwoven fabric, or the like.
- Commercially available glass cloths can be used, preferably those treated with a silane coupling agent to enhance affinity with the fluororesin.
- Examples of glass cloth materials include E-glass, C-glass, A-glass, S-glass, D-glass, NE-glass, and low-dielectric-constant glass, with E-glass, S-glass, and NE-glass being preferred due to their ease of availability.
- the fiber weave may be plain or twill.
- the thickness of the glass cloth is typically 5 to 90 ⁇ m, preferably 10 to 75 ⁇ m, but it is preferable to use glass cloth that is thinner than the fluororesin film used.
- the laminate may also use a glass nonwoven fabric as a fabric layer made of glass fibers.
- Glass nonwoven fabric is made by bonding short glass fibers with a small amount of a binder compound (resin or inorganic material), or by entangling the short glass fibers without the use of a binder compound to maintain its shape.
- a binder compound resin or inorganic material
- Commercially available glass nonwoven fabrics can be used.
- the diameter of the short glass fibers is preferably 0.5 to 30 ⁇ m, and the fiber length is preferably 5 to 30 mm.
- binder compounds include resins such as epoxy resins, acrylic resins, cellulose, polyvinyl alcohol, and fluororesins, as well as inorganic materials such as silica compounds.
- the amount of binder compound used is typically 3 to 15% by mass of the short glass fibers.
- materials for the short glass fibers include E-glass, C-glass, A-glass, S-glass, D-glass, NE-glass, and low-dielectric-constant glass.
- the thickness of the glass nonwoven fabric is typically 50 to 1000 ⁇ m, preferably 100 to 900 ⁇ m.
- the thickness of the glass nonwoven fabric in this application refers to the value measured in accordance with JIS P8118:1998 using a digital gauge DG-925 (load 110 grams, face diameter 10 mm) manufactured by Ono Sokki Co., Ltd.
- the glass nonwoven fabric may be treated with a silane coupling agent to increase its affinity with the fluororesin.
- the glass fiber fabric layer may be a layer in which a glass cloth and a glass nonwoven fabric are laminated together, thereby combining the properties of both layers to obtain suitable properties.
- the glass fiber fabric layer may be in the form of a prepreg impregnated with a resin.
- the glass fiber fabric layer and the fluororesin film may be bonded at the interface, or the glass fiber fabric layer may be partially or entirely impregnated with the fluororesin film.
- a prepreg may be prepared by impregnating a fabric made of glass fiber with a fluororesin composition. The prepreg thus obtained may be further laminated with the fluororesin film of the present disclosure.
- the fluororesin composition used to prepare the prepreg is not particularly limited, and the fluororesin film of the present disclosure may also be used.
- the resin film used as the substrate layer is preferably a heat-resistant resin film or a thermosetting resin film.
- heat-resistant resin films include polyimide, modified polyimide, liquid crystal polymer, and polyphenylene sulfide.
- thermosetting resins include those containing epoxy resin, bismaleimide, polyphenylene oxide, modified polyphenylene ether, polyphenylene ether, and polybutadiene.
- the heat-resistant resin film and the thermosetting resin film may contain reinforcing fibers.
- the reinforcing fibers are not particularly limited, but for example, glass cloth, particularly low-dielectric type, is preferred.
- the dielectric properties, linear expansion coefficient, water absorption coefficient, and other properties of the heat-resistant resin film and the thermosetting resin film are not particularly limited, but for example, the dielectric constant at 20 GHz is preferably 3.8 or less, more preferably 3.4 or less, and even more preferably 3.0 or less.
- the dielectric loss tangent at 20 GHz is preferably 0.0030 or less, more preferably 0.0025 or less, and even more preferably 0.0020 or less.
- the linear expansion coefficient is preferably 100 ppm/°C or less, more preferably 70 ppm/°C or less, and even more preferably 40 ppm/°C or less.
- the water absorption is preferably 1.0% or less, more preferably 0.5% or less, and even more preferably 0.1% or less.
- PTFE PTFE having the following properties was used: Particle size: 500 ⁇ m Apparent density: 460g/L Standard specific gravity: 2.17 Melting point: 327°C
- Silica 1-6 Silica 1, 3 to 6 used were SC-6500SQ (particle size 2.1 ⁇ m, spherical) manufactured by Admatechs Co., Ltd. Silica 2 used was SC-2500SQ (particle size 0.5 ⁇ m, spherical) manufactured by Admatechs Co., Ltd. The silica was subjected to the following surface treatment. Silica 3: Aminopropyl, Treated at 1.0% Silica 4: Aminopropyl, treatment amount 0.2% Silica 5: Phenylamino, treatment amount 0.4% Silica 6: Isocyanate, treated amount 0.2%
- the treating agents used in the surface treatment are as follows: Aminopropyl: 3-aminopropyltriethoxysilane Phenylamino: N-phenyl-3-aminopropyltrimethoxysilane Isocyanate: 3-isocyanatopropyltriethoxysilane
- the mixture was mixed for 3 minutes, left in a thermostatic oven at 25°C for 2 hours, and then heated to 40°C using a mold with a flat outlet to extrude the mixture into a paste.
- the resulting sheet was rolled between two metal rolls to obtain a sample with a thickness of 125 ⁇ m, which was then dried at 200°C for 2 hours.
- the rate of change in the specific gravity of the sheet before and after densification was also calculated.
- the rate of change in the specific gravity of the sheet is The rate of change was calculated as follows: (specific gravity after densification - specific gravity before densification) * 100 / specific gravity before densification.
- TMA measurement was carried out in tension mode using a TMA-7100 (manufactured by Hitachi High-Tech Science Corporation). A sheet cut to a length of 20 mm, width of 5 mm, and thickness of 150 ⁇ m was used as a sample piece, and the distance between chucks was set to 10 mm. The sample was subjected to a load of 49 mN and the temperature was increased at a rate of 2°C/min from 0 to 150°C, and the displacement was determined from the amount of deformation.
- the sheets of the present disclosure are particularly suitable for use in high-frequency printed circuit boards.
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Abstract
Description
本開示は、シート、銅張積層体、回路基板及びシートの製造方法に関する。 This disclosure relates to a sheet, a copper clad laminate, a circuit board, and a method for manufacturing the sheet.
高周波用プリント配線板において、伝送損失が小さい高周波用プリント配線板が求められている。このような高周波用プリント配線板において、フッ素樹脂フィルムを使用することが公知である(特許文献1等)。また、配線基板材料としてフィラーを配合したフッ素樹脂を使用することについて、特許文献2、3に記載されている。 High-frequency printed wiring boards with low transmission loss are in demand. The use of fluororesin film in such high-frequency printed wiring boards is known (see, for example, Patent Document 1). Furthermore, Patent Documents 2 and 3 describe the use of fluororesin containing filler as a wiring board material.
さらに、特許文献4には、真球状シリカ粒子をフッ素樹脂に配合したフッ素樹脂組成物を回路用基板に使用することが開示されている。 Furthermore, Patent Document 4 discloses the use of a fluororesin composition in which spherical silica particles are blended with a fluororesin for circuit boards.
本開示は、吸水時の誘電正接の変化率が小さいシートを提供することを目的とする。 The objective of this disclosure is to provide a sheet that exhibits a small rate of change in dielectric tangent upon water absorption.
本開示は、フッ素樹脂と充填剤を含み、比重が2.05以上、2.19以下であることを特徴とするシートである。
上記フッ素樹脂は、ポリテトラフルオロエチレン樹脂であることが好ましい。
上記充填剤は、シリカであることが好ましい。
上記シリカは、球状シリカであることが好ましい。
上記シリカは、粒径が0.1~3μmであることが好ましい。
上記シリカは、含有量がシート重量に対して20~80質量%であることが好ましい。
上記シリカは、表面が表面処理剤で処理されていることが好ましい。
上記フッ素樹脂は、標準比重が2.0~2.3であるポリテトラフルオロエチレン樹脂であり、上記充填剤は、球状シリカであり、球状シリカの粒径は、0.5~2.1μmであり、ポリテトラフルオロエチレン樹脂の含有量は、シート重量に対して40~60質量%であり、球状シリカの含有量は、シート重量に対して40~60質量%であることが好ましい。
The present disclosure provides a sheet containing a fluororesin and a filler, and having a specific gravity of 2.05 or more and 2.19 or less.
The fluororesin is preferably a polytetrafluoroethylene resin.
The filler is preferably silica.
The silica is preferably spherical silica.
The silica preferably has a particle size of 0.1 to 3 μm.
The silica content is preferably 20 to 80% by mass based on the sheet weight.
The surface of the silica is preferably treated with a surface treatment agent.
It is preferred that the fluororesin is a polytetrafluoroethylene resin having a standard specific gravity of 2.0 to 2.3, the filler is spherical silica, the particle size of the spherical silica is 0.5 to 2.1 μm, the content of the polytetrafluoroethylene resin is 40 to 60 mass % relative to the sheet weight, and the content of the spherical silica is 40 to 60 mass % relative to the sheet weight.
本開示は、シート重量に対して20~80質量%のポリテトラフルオロエチレン樹脂及び粒径が0.1~3μmの表面処理された球状シリカを含有し、シリカは含有量がシート重量に対して20~80質量%であり、比重が2.05以上、2.19以下であることを特徴とするシートでもある。 The present disclosure also relates to a sheet containing 20 to 80% by mass of polytetrafluoroethylene resin relative to the sheet weight and surface-treated spherical silica with a particle size of 0.1 to 3 μm, the silica content being 20 to 80% by mass relative to the sheet weight, and having a specific gravity of 2.05 or more and 2.19 or less.
上記シートは、吸水率が0.10%以下であることが好ましい。
上記シートは、シートの比重を1%以上増加させる高密度化工程を有する製造工程によって得られたものであることが好ましい。
上記シートは、吸水前後の誘電正接の変化率を比較したとき、高密度化前に比べて、高密度化後の誘電正接の変化率が低下していることが好ましい。
The sheet preferably has a water absorption rate of 0.10% or less.
Preferably, the sheet is obtained by a manufacturing process that includes a densification step that increases the specific gravity of the sheet by 1% or more.
When the rate of change in the dielectric loss tangent of the sheet before and after water absorption is compared, it is preferable that the rate of change in the dielectric loss tangent after densification is lower than that before densification.
上記シートは、線膨張係数が120ppm/K以下であることが好ましい。
上記シートは、膜厚が0.1~2mmであることが好ましい。
上記シートは、回路基板の絶縁材料であることが好ましい。
The sheet preferably has a linear expansion coefficient of 120 ppm/K or less.
The sheet preferably has a thickness of 0.1 to 2 mm.
The sheet is preferably an insulating material for a circuit board.
本開示は、金属層及び上記シートを必須の層とする金属張積層体でもある。
金属層は、銅箔であることが好ましい。
本開示は、上記シートと、金属層とを有することを特徴とする回路基板でもある。
上記金属層を構成する金属は、銅であることが好ましい。
上記銅は、圧延銅又は電解銅であることが好ましい。
上記回路基板は、プリント基板、積層回路基板又は高周波基板であることが好ましい。
The present disclosure also relates to a metal clad laminate having a metal layer and the above-mentioned sheet as essential layers.
The metal layer is preferably a copper foil.
The present disclosure also provides a circuit board comprising the sheet and a metal layer.
The metal constituting the metal layer is preferably copper.
The copper is preferably rolled copper or electrolytic copper.
The circuit board is preferably a printed circuit board, a laminated circuit board, or a high-frequency board.
本開示は、上記フッ素樹脂及び前記充填剤を混合、圧延シート化する工程(1)及び工程(1)によって得られた圧延シートを高密度化する工程(2)を含むことを特徴とする上記シートの製造方法でもある。
上記高密度化する工程(2)において、圧延シートの比重が1%以上増加するように圧延シートが加圧され、フッ素樹脂は、標準比重が2.0~2.3であるポリテトラフルオロエチレン樹脂であり、充填剤は、球状シリカであり、球状シリカの粒径は、0.5~2.1μmであり、ポリテトラフルオロエチレン樹脂の含有量は、シート重量に対して40~60質量%であり、球状シリカの含有量は、シート重量に対して40~60質量%であることが好ましい。
The present disclosure also provides a method for producing the above-mentioned sheet, comprising: a step (1) of mixing the above-mentioned fluororesin and the filler and rolling the mixture into a sheet; and a step (2) of densifying the rolled sheet obtained by the step (1).
In the densification step (2), the rolled sheet is pressurized so that the specific gravity of the rolled sheet increases by 1% or more, the fluororesin is polytetrafluoroethylene resin having a standard specific gravity of 2.0 to 2.3, the filler is spherical silica having a particle size of 0.5 to 2.1 μm, the polytetrafluoroethylene resin content is 40 to 60 mass% relative to the sheet weight, and the spherical silica content is 40 to 60 mass% relative to the sheet weight.
本開示のシートは、吸水時の誘電正接の変化率が小さいものである。 The sheet disclosed herein has a small rate of change in dielectric tangent when absorbing water.
以下、本開示を詳細に説明する。
フッ素樹脂に充填剤を配合した組成物については多くの検討が行われている。一方、高周波用プリント配線板という分野においては、近年、ますます高水準の、低誘電率、低損失、低膨張という性能が要求されている。
The present disclosure will be described in detail below.
Many studies have been conducted on compositions containing fluororesins and fillers. Meanwhile, in the field of high-frequency printed wiring boards, increasingly high levels of performance, such as low dielectric constant, low loss, and low expansion, are being demanded in recent years.
このような用途においては、シートの電気化学的性質が周囲の環境に影響されず、安定したものであることが求められる。しかし、充填剤とフッ素樹脂からなるシートは、吸水したときに、誘電正接が変化しやすい。フッ素樹脂を含有するシートは、低誘電率、低損失という性質が求められることから、安定して低損失を得るためには、フッ素樹脂を含有するシートは吸水が小さいことが好ましい。吸水が小さくことで吸水時の誘電正接の変化率を小さくことが可能となる。 In such applications, the electrochemical properties of the sheet must be stable and unaffected by the surrounding environment. However, sheets made of filler and fluororesin are prone to change in dielectric tangent when they absorb water. Since sheets containing fluororesin are required to have low dielectric constant and low loss, in order to achieve stable low loss, it is preferable that the sheet containing fluororesin has low water absorption. Low water absorption makes it possible to reduce the rate of change in dielectric tangent when water is absorbed.
本開示においては、このような吸水時の誘電正接の変化率を小さくするために、密度を大きくしたものである。すなわち、樹脂シート中の空隙を低減させることで、吸水時の水のシート中への侵入を防ぎ、これによって上述した目的を達成した。 In this disclosure, the density is increased to reduce the rate of change in the dielectric tangent upon water absorption. In other words, by reducing the voids in the resin sheet, water is prevented from entering the sheet upon water absorption, thereby achieving the above-mentioned objective.
充填剤を多量に含む樹脂組成物は、樹脂と充填剤との界面において、隙間を生じやすく、通常の成形方法でシート化した場合は、空隙を生じやすく、また、フッ素樹脂から成形助剤が除去される際に空隙が発生する。このため、空隙中に水が入り込むことで上述した問題を生じていたと推測される。 Resin compositions containing large amounts of filler are prone to gaps at the interface between the resin and filler, and when formed into a sheet using a conventional molding method, voids are likely to form. Furthermore, voids are generated when the molding aid is removed from the fluororesin. It is believed that this allows water to enter the voids, causing the above-mentioned problems.
よって、例えば、成形後に高密度化処理を行う等の方法で、このような空隙を低減させ、密度が高いシートとすることで、このような問題を解決するものである。 Therefore, this problem can be solved by reducing these voids and creating a high-density sheet, for example by performing a densification process after molding.
本開示のシートは、上述した観点から、フッ素樹脂と充填剤を含み、比重が2.05以上、2.19以下というものである。
本開示における比重は、JIS Z 8807(固体の密度及び比重の測定方法)8 液中ひょう量法による密度及び比重の測定方法で測定した値である。
In view of the above, the sheet of the present disclosure contains a fluororesin and a filler, and has a specific gravity of 2.05 or more and 2.19 or less.
The specific gravity in this disclosure is a value measured by the density and specific gravity measurement method according to JIS Z 8807 (Method for measuring density and specific gravity of solids) 8, submerged weighing method.
上記比重が2.05未満であると、上述したような、吸水時の誘電正接の変化率が低いという課題を充分に達成できない。更に、比重が2.19を超えると、比誘電率が高くなるという点で好ましくない。 If the specific gravity is less than 2.05, the aforementioned problem of a low rate of change in dielectric tangent upon water absorption cannot be fully achieved. Furthermore, if the specific gravity exceeds 2.19, the relative dielectric constant becomes too high, which is undesirable.
上記比重の下限は、2.05であることがより好ましい。上記比重の上限は、2.18であることが好ましく、2.17であることがより好ましく、2.16であることが更に好ましい。
このような比重を有するシートは、空隙率が低いものであり、これによって、上述した効果が得られる。
The lower limit of the specific gravity is more preferably 2.05. The upper limit of the specific gravity is preferably 2.18, more preferably 2.17, and even more preferably 2.16.
A sheet having such a specific gravity has a low porosity, which provides the above-mentioned effects.
本開示のシートは、吸水率が0.10%以下であることが好ましく、0.08%以下であることがより好ましく、0.06%以下であることが更に好ましい。本開示のシートは、比重が上記範囲内とすることで、シートの空隙率が低いものである。空隙率が低くして、上述したような吸水率とすることが好ましい。吸水率が上述した値であると、吸水時の誘電正接の変化率が低いという課題を好適に達成できるという点で好ましい。 The sheet of the present disclosure preferably has a water absorption rate of 0.10% or less, more preferably 0.08% or less, and even more preferably 0.06% or less. By setting the specific gravity within the above range, the sheet of the present disclosure has a low porosity. It is preferable to reduce the porosity and achieve the water absorption rate described above. A water absorption rate of the above value is preferable in that it can effectively achieve the goal of reducing the rate of change in dielectric tangent upon water absorption.
本開示において、吸水率は、50×50(mm)のシートを110℃、1時間乾燥させ、デシケーター内で23℃まで冷却し、冷却後23℃の水に24時間含侵させ、水の含侵前後の重量から吸水率を算出した値である。 In this disclosure, the water absorption rate is determined by drying a 50 x 50 (mm) sheet at 110°C for 1 hour, cooling it to 23°C in a desiccator, and then immersing it in water at 23°C for 24 hours. The water absorption rate is calculated from the weight before and after immersion in water.
上記吸水率は、0.08%以下であることがより好ましく、0.07%以下であることが更に好ましい。なお、吸水率が低いことによって特段の問題を生じることはないため、下限は特に限定されず0%であってもよい。下限は好ましくは、0.001%である。 The water absorption rate is more preferably 0.08% or less, and even more preferably 0.07% or less. Since a low water absorption rate does not pose any particular problems, the lower limit is not particularly limited and may be 0%. The lower limit is preferably 0.001%.
本開示のシートは、線膨張係数が120ppm/K以下であることが好ましい。このような線膨張係数のものとすることで、低収縮で寸法安定性に優れた誘電体シートとなるという点で好ましい。上記線膨張係数は、70ppm/K以下であることがより好ましく、50ppm/K以下であることが更に好ましい。 The sheet of the present disclosure preferably has a linear expansion coefficient of 120 ppm/K or less. Having such a linear expansion coefficient is preferable in that it results in a dielectric sheet with low shrinkage and excellent dimensional stability. The linear expansion coefficient is more preferably 70 ppm/K or less, and even more preferably 50 ppm/K or less.
上記線膨張係数は、下限を特に限定するものではないが、5ppm/Kであることがより好ましく、10ppm/Kであることが更に好ましい。 There is no particular lower limit for the linear expansion coefficient, but it is more preferably 5 ppm/K, and even more preferably 10 ppm/K.
本明細書における線膨張係数は、TMA-7100(株式会社日立ハイテクサイエンス社製)を用いたTMA測定を引張モードで行い、サンプル片として、長さ20mm、幅5mm、厚み150μmに切出したシートを用いて、チャック間を10mmに設定し、49mNの荷重をかけながら昇温速度2℃/分で-10~160℃でのサンプル長の変位量から求めた。 The linear expansion coefficient in this specification was determined by performing TMA measurements in tension mode using a TMA-7100 (Hitachi High-Tech Science Corporation). A sample piece was cut out of a sheet measuring 20 mm in length, 5 mm in width, and 150 μm in thickness. The distance between the chucks was set to 10 mm, and a load of 49 mN was applied at a heating rate of 2°C/min. The change in sample length was determined from the amount of change in sample length from -10 to 160°C.
本開示のシートは、膜厚が0.03~2mmことが好ましい。上記範囲内のものとすることで、本開示の以下で詳述するような用途に適したシートとなる。上記下限は、0.05mmであることがより好ましく、0.1mmであることが更に好ましい。上記上限は、1mmであることがより好ましく、0.5mmであることが更に好ましい。 The sheet of the present disclosure preferably has a film thickness of 0.03 to 2 mm. By achieving a film thickness within this range, the sheet becomes suitable for applications such as those described in detail below in this disclosure. The lower limit is more preferably 0.05 mm, and even more preferably 0.1 mm. The upper limit is more preferably 1 mm, and even more preferably 0.5 mm.
本開示の膜厚は膜厚計で測定した値である。 The film thicknesses in this disclosure are values measured using a film thickness gauge.
本開示のシートは、-50~150℃の温度範囲の比誘電率の変化率が、0.025以下であることが好ましく、より好ましくは0.023以下であり、更に好ましくは0.021以下であることが好ましい。このような範囲内のものとすると、温度による電気的性質の変化が少なく、高周波プリント基板に使用した場合に安定した性能が得られる点で好ましい。 The sheet of the present disclosure preferably has a rate of change in relative dielectric constant in the temperature range of -50 to 150°C of 0.025 or less, more preferably 0.023 or less, and even more preferably 0.021 or less. A sheet within this range is preferred in that it minimizes temperature-related changes in electrical properties and provides stable performance when used in high-frequency printed circuit boards.
本開示のシートは、上述したように、フッ素樹脂及び充填剤を含有するものである。これらを含有するシートは、低誘電率であることから、伝送損失が少なく、特に、プリント配線基板として好適に使用することができるものである。
本開示のシートを構成するこれらの成分について、以下詳述する。
As described above, the sheet of the present disclosure contains a fluororesin and a filler. A sheet containing these has a low dielectric constant and therefore low transmission loss, making it particularly suitable for use as a printed wiring board.
These components that make up the sheets of the present disclosure are described in detail below.
(フッ素樹脂)
本開示の組成物は、フッ素樹脂を含有するものである。フッ素樹脂は、低誘電性を有するものであることから、本開示の目的において好適に使用することができる。
(Fluorine resin)
The composition of the present disclosure contains a fluororesin, which has low dielectric properties and can therefore be suitably used for the purposes of the present disclosure.
本開示において使用することができるフッ素樹脂は特に限定されるものではないが、例えば、ポリテトラフルオロエチレン(PTFE)、テトラフルオロエチレン〔TFE〕/ヘキサフルオロプロピレン〔HFP〕共重合体〔FEP〕、TFE/アルキルビニルエーテル共重合体〔PFA〕、TFE/HFP/アルキルビニルエーテル共重合体〔EPA〕、TFE/クロロトリフルオロエチレン〔CTFE〕共重合体、TFE/エチレン共重合体〔ETFE〕、ポリフッ化ビニリデン〔PVdF〕、分子量30万以下のテトラフルオロエチレン〔LMW-PTFE〕等が挙げられる。一種類で使用してもよいし、二種類以上を混合しても良い。低誘電性という観点から、ポリテトラフルオロエチレン樹脂(PTFE)であることが特に好ましい。PTFEはフィブリル性を有するものが好ましい。フィブリル性を有するPTFEとは未焼成のポリマー粉末をペースト押出できるPTFEを意味する。 Fluororesins that can be used in the present disclosure are not particularly limited, but examples include polytetrafluoroethylene (PTFE), tetrafluoroethylene [TFE]/hexafluoropropylene [HFP] copolymer [FEP], TFE/alkyl vinyl ether copolymer [PFA], TFE/HFP/alkyl vinyl ether copolymer [EPA], TFE/chlorotrifluoroethylene [CTFE] copolymer, TFE/ethylene copolymer [ETFE], polyvinylidene fluoride [PVdF], and tetrafluoroethylene with a molecular weight of 300,000 or less [LMW-PTFE]. They may be used alone or in combination of two or more. From the perspective of low dielectric constant, polytetrafluoroethylene resin (PTFE) is particularly preferred. PTFE that has fibrillar properties is preferred. Fibrillar PTFE refers to PTFE that can be paste-extruded as unsintered polymer powder.
PTFEは、変性ポリテトラフルオロエチレン(以下、変性PTFEという)であってもよいし、ホモポリテトラフルオロエチレン(以下、ホモPTFEという)であってもよいし、変性PTFEとホモPTFEの混合物であってもよい。なお、高分子PTFEにおける変性PTFEの含有割合は、ポリテトラフルオロエチレンの成形性を良好に維持させる観点から、10質量%以上98質量%以下であることが好ましく、50質量%以上95質量%以下であることがより好ましい。ホモPTFEは、特に限定されず、特開昭53-60979号公報、特開昭57-135号公報、特開昭61-16907号公報、特開昭62-104816号公報、特開昭62-190206号公報、特開昭63-137906号公報、特開2000-143727号公報、特開2002-201217号公報、国際公開第2007/046345号パンフレット、国際公開第2007/119829号パンフレット、国際公開第2009/001894号パンフレット、国際公開第2010/113950号パンフレット、国際公開第2013/027850号パンフレット等で開示されているホモPTFEを好適に使用できる。中でも、高い延伸特性を有する特開昭57-135号公報、特開昭63-137906号公報、特開2000-143727号公報、特開2002-201217号公報、国際公開第2007/046345号パンフレット、国際公開第2007/119829号パンフレット、国際公開第2010/113950号パンフレット等で開示されているホモPTFEが好ましい。 The PTFE may be modified polytetrafluoroethylene (hereinafter referred to as modified PTFE), homopolytetrafluoroethylene (hereinafter referred to as homoPTFE), or a mixture of modified PTFE and homoPTFE. From the perspective of maintaining good moldability of polytetrafluoroethylene, the content of modified PTFE in the polymeric PTFE is preferably 10% by mass or more and 98% by mass or less, and more preferably 50% by mass or more and 95% by mass or less. The homo-PTFE is not particularly limited, and homo-PTFE disclosed in JP-A-53-60979, JP-A-57-135, JP-A-61-16907, JP-A-62-104816, JP-A-62-190206, JP-A-63-137906, JP-A-2000-143727, JP-A-2002-201217, WO 2007/046345 pamphlet, WO 2007/119829 pamphlet, WO 2009/001894 pamphlet, WO 2010/113950 pamphlet, WO 2013/027850 pamphlet, etc. can be suitably used. Among these, homo-PTFE, which has high stretchability and is disclosed in JP 57-135 A, JP 63-137906 A, JP 2000-143727 A, JP 2002-201217 A, WO 2007/046345, WO 2007/119829, WO 2010/113950, etc., is preferred.
変性PTFEは、TFEと、TFE以外のモノマー(以下、変性モノマーという)とからなる。変性PTFEには、変性モノマーにより均一に変性されたもの、重合反応の初期に変性されたもの、重合反応の終期に変性されたものなどが挙げられるが、特にこれらに限定されない。変性PTFEは、TFE単独重合体の性質を大きく損なわない範囲内で、TFEとともに微量のTFE以外の単量体をも重合に供することにより得られるTFE共重合体であることが好ましい。変性PTFEは、例えば、特開昭60-42446号公報、特開昭61-16907号公報、特開昭62-104816号公報、特開昭62-190206号公報、特開昭64-1711号公報、特開平2-261810号公報、特開平11-240917、特開平11-240918、国際公開第2003/033555号パンフレット、国際公開第2005/061567号パンフレット、国際公開第2007/005361号パンフレット、国際公開第2011/055824号パンフレット、国際公開第2013/027850号パンフレット等で開示されているものを好適に使用できる。中でも、高い延伸特性を有する特開昭61-16907号公報、特開昭62-104816号公報、特開昭64-1711号公報、特開平11-240917、国際公開第2003/033555号パンフレット、国際公開第2005/061567号パンフレット、国際公開第2007/005361号パンフレット、国際公開第2011/055824号パンフレット等で開示されている変性PTFEが好ましい。 Modified PTFE is composed of TFE and a monomer other than TFE (hereinafter referred to as the modified monomer). Modified PTFE includes, but is not limited to, PTFE that is uniformly modified with the modified monomer, PTFE that is modified at the beginning of the polymerization reaction, and PTFE that is modified at the end of the polymerization reaction. The modified PTFE is preferably a TFE copolymer obtained by polymerizing a small amount of a monomer other than TFE together with TFE, within a range that does not significantly impair the properties of the TFE homopolymer. The modified PTFE can be suitably used, for example, those disclosed in JP-A-60-42446, JP-A-61-16907, JP-A-62-104816, JP-A-62-190206, JP-A-64-1711, JP-A-2-261810, JP-A-11-240917, JP-A-11-240918, WO 2003/033555 pamphlet, WO 2005/061567 pamphlet, WO 2007/005361 pamphlet, WO 2011/055824 pamphlet, WO 2013/027850 pamphlet, etc. Among these, modified PTFE with high stretchability disclosed in JP 61-16907 A, JP 62-104816 A, JP 64-1711 A, JP 11-240917 A, WO 2003/033555 A, WO 2005/061567 A, WO 2007/005361 A, WO 2011/055824 A, etc. are preferred.
変性PTFEは、TFEに基づくTFE単位と、変性モノマーに基づく変性モノマー単位とを含む。変性モノマー単位は、変性PTFEの分子構造の一部分であって変性モノマーに由来する部分である。変性PTFEは、変性モノマー単位が全単量体単位の0.001~0.500質量%含まれることが好ましく、好ましくは、0.01~0.30質量%含まれる。全単量体単位は、変性PTFEの分子構造における全ての単量体に由来する部分である。 Modified PTFE contains TFE units based on TFE and modified monomer units based on modified monomers. The modified monomer units are part of the molecular structure of the modified PTFE and are derived from the modified monomers. The modified PTFE preferably contains modified monomer units in an amount of 0.001 to 0.500 mass% of the total monomer units, and more preferably 0.01 to 0.30 mass%. The total monomer units are the portions derived from all monomers in the molecular structure of the modified PTFE.
変性モノマーは、TFEとの共重合が可能なものであれば特に限定されず、例えば、ヘキサフルオロプロピレン(HFP)等のパーフルオロオレフィン;クロロトリフルオロエチレン(CTFE)等のクロロフルオロオレフィン;トリフルオロエチレン、フッ化ビニリデン(VDF)等の水素含有フルオロオレフィン;パーフルオロビニルエーテル;パーフルオロアルキルエチレン(PFAE)、エチレン等が挙げられる。用いられる変性モノマーは1種であってもよいし、複数種であってもよい。 The modifying monomer is not particularly limited as long as it is copolymerizable with TFE, and examples include perfluoroolefins such as hexafluoropropylene (HFP); chlorofluoroolefins such as chlorotrifluoroethylene (CTFE); hydrogen-containing fluoroolefins such as trifluoroethylene and vinylidene fluoride (VDF); perfluorovinyl ether; perfluoroalkylethylene (PFAE), ethylene, etc. One or more types of modifying monomers may be used.
パーフルオロビニルエーテルは、特に限定されず、例えば、下記一般式(1)で表されるパーフルオロ不飽和化合物等が挙げられる。
CF2=CF-ORf・・・(1)
The perfluorovinyl ether is not particularly limited, and examples thereof include perfluorounsaturated compounds represented by the following general formula (1).
CF 2 =CF-ORf...(1)
式中、Rfは、パーフルオロ有機基を表す。 In the formula, Rf represents a perfluoroorganic group.
本明細書において、パーフルオロ有機基は、炭素原子に結合する水素原子が全てフッ素原子に置換されてなる有機基である。上記パーフルオロ有機基は、エーテル酸素を有していてもよい。 In this specification, a perfluoroorganic group is an organic group in which all hydrogen atoms bonded to carbon atoms are substituted with fluorine atoms. The perfluoroorganic group may also have an ether oxygen.
パーフルオロビニルエーテルとしては、例えば、上記一般式(1)において、Rfが炭素数1~10のパーフルオロアルキル基であるパーフルオロ(アルキルビニルエーテル)(PAVE)が挙げられる。パーフルオロアルキル基の炭素数は、好ましくは1~5である。PAVEにおけるパーフルオロアルキル基としては、例えば、パーフルオロメチル基、パーフルオロエチル基、パーフルオロプロピル基、パーフルオロブチル基、パーフルオロペンチル基、パーフルオロヘキシル基等が挙げられる。PAVEとしては、パーフルオロプロピルビニルエーテル(PPVE)、パーフルオロメチルビニルエーテル(PMVE)が好ましい。 An example of a perfluorovinyl ether is perfluoro(alkyl vinyl ether) (PAVE), where Rf in the above general formula (1) is a perfluoroalkyl group having 1 to 10 carbon atoms. The number of carbon atoms in the perfluoroalkyl group is preferably 1 to 5. Examples of perfluoroalkyl groups in PAVE include perfluoromethyl, perfluoroethyl, perfluoropropyl, perfluorobutyl, perfluoropentyl, and perfluorohexyl groups. Preferred PAVEs are perfluoropropyl vinyl ether (PPVE) and perfluoromethyl vinyl ether (PMVE).
上記パーフルオロアルキルエチレン(PFAE)は、特に限定されず、例えば、パーフルオロブチルエチレン(PFBE)、パーフルオロヘキシルエチレン(PFHE)等が挙げられる。 The perfluoroalkylethylene (PFAE) is not particularly limited, and examples include perfluorobutylethylene (PFBE), perfluorohexylethylene (PFHE), etc.
変性PTFEにおける変性モノマーとしては、HFP、CTFE、VDF、PAVE、PFAE及びエチレンからなる群より選択される少なくとも1種(例えば1種~6種)であることが好ましい。 The modifying monomer in the modified PTFE is preferably at least one (e.g., 1 to 6) selected from the group consisting of HFP, CTFE, VDF, PAVE, PFAE, and ethylene.
上記フッ素樹脂は、溶融成形不可能であることが好ましい。溶融成形不可能であるとは、融点以上に加熱しても、樹脂が十分な流動性を有さず、樹脂において一般的に使用される溶融成形の手法によって成型することができない樹脂を意味する。PTFEがこれに該当する。 The above-mentioned fluororesin is preferably non-melt-moldable. "Non-melt-moldable" means that the resin does not have sufficient fluidity even when heated above its melting point, and cannot be molded using melt-molding techniques commonly used for resins. PTFE falls into this category.
本開示においては、このような溶融成形不可能であるようなフッ素樹脂を使用し、これをフィブリル化するような成形方法によってフッ素時樹脂シートとするものであることが好ましい。当該成型方法については、後述する。 In the present disclosure, it is preferable to use such fluororesin that cannot be melt-molded and turn it into a fluororesin sheet using a molding method that fibrillates it. This molding method will be described later.
上記PTFEは、SSGが2.0~2.3であることが好ましい。このようなPTFEを使用すると、高い強度(凝集力及び単位厚さあたりの突き刺し強度)を有するPTFE膜を得やすい。大きい分子量を有するPTFEは長い分子鎖を有するため、分子鎖が規則的に配列した構造を形成しにくい。この場合、非晶質部の長さが増加し、分子同士の絡み合いの度合いが増加する。分子同士の絡み合いの度合いが高い場合、PTFE膜は、加えられた負荷に対して変形しにくく、優れた機械的強度を示すと考えられる。また、大きい分子量を有するPTFEを使用すると、小さい平均孔径を有するPTFE膜を得やすい。 The PTFE preferably has an SSG of 2.0 to 2.3. Using such PTFE makes it easier to obtain a PTFE membrane with high strength (cohesion and puncture strength per unit thickness). PTFE with a large molecular weight has long molecular chains, making it difficult to form a structure with regularly arranged molecular chains. In this case, the length of the amorphous portion increases, and the degree of entanglement between molecules increases. When the degree of entanglement between molecules is high, the PTFE membrane is less likely to deform under an applied load and is thought to exhibit excellent mechanical strength. Furthermore, using PTFE with a large molecular weight makes it easier to obtain a PTFE membrane with a small average pore size.
上記SSGの下限は、2.05であることがより好ましく、2.1であることが更に好ましい。上記SSGの上限は、2.25であることがより好ましく、2.2であることが更に好ましい。 The lower limit of the SSG is more preferably 2.05, and even more preferably 2.1. The upper limit of the SSG is more preferably 2.25, and even more preferably 2.2.
標準比重〔SSG〕はASTM D-4895-89に準拠して試料を作製し、得られた試料の比重を水置換法によって測定したものである。 Standard specific gravity (SSG) is measured by preparing a sample in accordance with ASTM D-4895-89 and measuring the specific gravity of the resulting sample using the water displacement method.
本実施形態において、PTFE粉末を構成するPTFEの分子量(数平均分子量)は、例えば、200~1200万の範囲にある。PTFEの分子量の下限値は、300万であってもよく、400万であってもよい。PTFEの分子量の上限値は、1000万であってもよい。 In this embodiment, the molecular weight (number average molecular weight) of the PTFE constituting the PTFE powder is, for example, in the range of 2 million to 12 million. The lower limit of the molecular weight of PTFE may be 3 million or 4 million. The upper limit of the molecular weight of PTFE may be 10 million.
PTFEの数平均分子量の測定方法としては、標準比重(Standard Specific Gravity)から求める方法、及び、溶融時の動的粘弾性による測定法がある。標準比重から求める方法は、ASTM D-4895 98に準拠して成形されたサンプルを用い、ASTM D-792に準拠した水置換法によって実施することができる。動的粘弾性による測定法は、例えば、S.Wuによって、Polymer Engineering & Science, 1988, Vol.28, 538、及び、同文献1989, Vol.29, 273に説明されている。 There are two methods for measuring the number average molecular weight of PTFE: one is to determine it from the standard specific gravity, and the other is to measure it using dynamic viscoelasticity in the melt. The method for determining it from the standard specific gravity can be performed using a sample molded in accordance with ASTM D-4895 98 and the water displacement method in accordance with ASTM D-792. The dynamic viscoelasticity measurement method is explained, for example, by S. Wu in Polymer Engineering & Science, 1988, Vol. 28, 538, and the same publication, 1989, Vol. 29, 273.
上記PTFEは、屈折率が1.2~1.6の範囲内のものであることが好ましい。このような屈折率を有するものとすることで、低誘電であるという点で好ましい。屈折率を上記範囲内のものとすることは、分極率や主鎖の柔軟性を調整する方法等によって行うことができる。上記屈折率の下限は、1.25であることがより好ましく、1.30であることがより好ましく、1.32であることが最も好ましい。上記屈折率の上限は、1.55であることがより好ましく、1.50であることがより好ましく、1.45であることが最も好ましい。 The refractive index of the PTFE is preferably in the range of 1.2 to 1.6. Having such a refractive index is preferable in that it has low dielectric constant. The refractive index can be adjusted to fall within the above range by adjusting the polarizability or the flexibility of the main chain. The lower limit of the refractive index is more preferably 1.25, more preferably 1.30, and most preferably 1.32. The upper limit of the refractive index is more preferably 1.55, more preferably 1.50, and most preferably 1.45.
上記屈折率は、屈折計(Abbemat 300)を用いて測定した値である。 The above refractive index was measured using a refractometer (Abbemat 300).
また、上記PTFEは、最大吸熱ピーク温度(結晶融点)は340±7℃であることが好ましい。 Furthermore, it is preferable that the maximum endothermic peak temperature (crystalline melting point) of the above-mentioned PTFE is 340±7°C.
PTFEは示差走査熱量計で測定した結晶融解曲線上の吸熱カーブの最大ピーク温度が338℃以下の低融点PTFEと、示差走査熱量計で測定した結晶融解曲線上の吸熱カーブの最大ピーク温度が342℃以上の高融点PTFEであっても良い。 The PTFE may be low-melting-point PTFE, with a maximum peak temperature of 338°C or less on the endothermic curve of the crystalline melting curve measured with a differential scanning calorimeter, or high-melting-point PTFE, with a maximum peak temperature of 342°C or more on the endothermic curve of the crystalline melting curve measured with a differential scanning calorimeter.
低融点PTFEは、乳化重合法で重合し製造された粉末であり、前記の最大吸熱ピーク温度(結晶融点)を有し、誘電率(ε)は2.08~2.2、誘電正接(tan δ)は1.9×10-4~4.0×10-4であることが好ましい。市販品としては、たとえばダイキン工業(株)製のポリフロンファインパウダーF201、同F203、同F205、同F301、同F302;旭硝子工業(株)製のCD090、CD076;デュポン社製のTF6C、TF62、TF40などがあげられる。 The low-melting-point PTFE is a powder produced by emulsion polymerization, and preferably has the above-mentioned maximum endothermic peak temperature (crystalline melting point), a dielectric constant (ε) of 2.08 to 2.2, and a dielectric dissipation factor (tan δ) of 1.9 × 10 -4 to 4.0 × 10 -4 . Commercially available products include Polyflon Fine Powder F201, F203, F205, F301, and F302 manufactured by Daikin Industries, Ltd.; CD090 and CD076 manufactured by Asahi Glass Industry Co., Ltd.; and TF6C, TF62, and TF40 manufactured by DuPont.
高融点PTFE粉末も、乳化重合法で重合し製造された粉末であり、前記の最大吸熱ピーク温度(結晶融点)を有し、誘電率(ε)は2.0~2.1、誘電正接(tan δ)は1.6×10-4~2.2×10-4と全体的に低い。市販品としては、たとえばダイキン工業(株)製のポリフロンファインパウダーF104、F106;旭硝子工業(株)製のCD1、CD141、CD123;デュポン社製のTF6、TF65などがあげられる。 High-melting-point PTFE powder is also a powder produced by emulsion polymerization, has the above-mentioned maximum endothermic peak temperature (crystalline melting point), and has a generally low dielectric constant (ε) of 2.0 to 2.1 and a dielectric dissipation factor (tan δ) of 1.6 × 10 -4 to 2.2 × 10 -4 . Commercially available products include Polyflon Fine Powder F104 and F106 manufactured by Daikin Industries, Ltd.; CD1, CD141, and CD123 manufactured by Asahi Glass Co., Ltd.; and TF6 and TF65 manufactured by DuPont.
上述したような各パラメータを満たす粉末形状のPTFEは、従来の製造方法により得ることができる。例えば、国際公開第2015-080291号や国際公開第2012-086710号等に記載された製造方法に倣って製造すればよい。 Powdered PTFE that meets the above-mentioned parameters can be obtained using conventional manufacturing methods. For example, it can be produced by following the manufacturing methods described in International Publication Nos. 2015-080291 and 2012-086710.
(充填剤)
本開示において使用することができる充填剤としては特に限定されず、アラミド繊維、ポリフェニルエステル、ポリフェニレンサルファイド、ポリイミド、ポリエーテルエーテルケトン、ポリフェニレン、ポリアミド、全芳香族ポリエステル樹脂から選ばれる一種以上である有機充填材、セラミックス、タルク、マイカ、酸化アルミ、酸化亜鉛、酸化スズ、酸化チタン、シリカ、炭酸カルシウム、酸化カルシウム、酸化マグネシウム、チタン酸カリウム、ガラス繊維、ガラス片、ガラスビード、炭化ケイ素、弗化カルシウム、窒化ホウ素、硫酸バリウム、二硫化モリブデン及び炭酸カリウムウイスカから選ばれる一種以上である無機充填材などを挙げることができる。これらの2種以上を併用するものであってもよい。
(Filler)
The filler that can be used in the present disclosure is not particularly limited, and examples thereof include organic fillers that are one or more selected from aramid fibers, polyphenyl esters, polyphenylene sulfide, polyimides, polyether ether ketones, polyphenylenes, polyamides, and wholly aromatic polyester resins, and inorganic fillers that are one or more selected from ceramics, talc, mica, aluminum oxide, zinc oxide, tin oxide, titanium oxide, silica, calcium carbonate, calcium oxide, magnesium oxide, potassium titanate, glass fibers, glass chips, glass beads, silicon carbide, calcium fluoride, boron nitride, barium sulfate, molybdenum disulfide, and potassium carbonate whiskers. Two or more of these may also be used in combination.
上記充填剤は、その形状を特に限定されるものではないが、球状充填剤であることが特に好ましい。球状であると、穴あけ加工時に均一に加工しやすい、比表面積が少なく伝送損失が低いという点で好ましいものである。 The shape of the filler is not particularly limited, but spherical fillers are particularly preferred. Spherical shapes are preferred because they facilitate uniform processing during drilling, have a small specific surface area, and result in low transmission loss.
これらのなかでも、シリカを使用することが特に好ましく、球状シリカ粒子を使用することが最も好ましい。 Among these, it is particularly preferable to use silica, and it is most preferable to use spherical silica particles.
上記球状シリカ粒子は、その粒子形状が真球に近いものを意味しており、具体的には、球形度が0.80以上であることが好ましく、0.85以上であることがより好ましく、0.90以上がさらに好ましく、0.95以上が最も好ましい。球形度はSEMで写真を撮り、その観察される粒子の面積と周囲長から、(球形度)={4π×(面積)÷(周囲長)2}で算出される値として算出する。1に近づくほど真球に近い。具体的には画像処理装置(スペクトリス株式会社:FPIA-3000)を用いて100個の粒子について測定した平均値を採用する。 The spherical silica particles mentioned above refer to particles whose shape is close to a perfect sphere. Specifically, the sphericity is preferably 0.80 or higher, more preferably 0.85 or higher, even more preferably 0.90 or higher, and most preferably 0.95 or higher. Sphericity is calculated by taking a photograph with an SEM and using the area and perimeter of the observed particles, as follows: (sphericity) = {4π x (area) ÷ (perimeter)2}. The closer the value is to 1, the closer the particle is to a perfect sphere. Specifically, the average value measured for 100 particles using an image processing device (Spectris Inc.: FPIA-3000) is used.
本開示で使用する球状シリカ粒子は、粒径が小さい方から体積を積算したときにD90/D10が2以上(望ましくは2.3以上、2.5以上)、D50が10μm以下であることが好ましい。更に、D90/D50が1.5以上であることが好ましい(更に望ましくは1.6以上)。D50/D10が1.5以上であることが好ましい(更に望ましくは1.6以上)。更に、D50が5μm以下であることがより好ましい。粒径が大きな球状シリカ粒子の間隙に粒径が小さな球状シリカ粒子が入ることが可能になるため、充填性に優れ、且つ、流動性を高くすることができる。特に粒度分布としてはガウス曲線と比較して粒径が小さい側の頻度が大きいことが好ましい。粒径はレーザー回折散乱方式粒度分布測定装置により測定可能である。また、粗粒がシートの薄膜化を困難にするため、所定以上の粒径をもつ粗粒をフィルタなどで除去したものであることが好ましい。 The spherical silica particles used in this disclosure preferably have a D90/D10 of 2 or more (preferably 2.3 or more, or 2.5 or more) and a D50 of 10 μm or less, when integrating the volume from the smallest particle size. Furthermore, it is preferable that D90/D50 is 1.5 or more (even more preferably 1.6 or more). It is preferable that D50/D10 is 1.5 or more (even more preferably 1.6 or more). Furthermore, it is even more preferable that D50 is 5 μm or less. Since small-sized spherical silica particles can enter the gaps between larger-sized spherical silica particles, excellent filling properties and high fluidity can be achieved. In particular, it is preferable that the particle size distribution has a higher frequency on the small particle size side compared to a Gaussian curve. The particle size can be measured using a laser diffraction/scattering particle size distribution analyzer. Furthermore, because coarse particles make it difficult to form a thin film sheet, it is preferable that coarse particles above a certain particle size have been removed using a filter or the like.
上記球状シリカ粒子は、吸水性が1.0%以下であることが好ましく、0.5%以下であることが更に好ましい。吸水性は乾燥時のシリカ粒子の質量を基準とする。吸水性の測定は乾燥状態にある試料を40℃ 80%RHに1時間放置し、カールフィッシャー水分測定装置で200℃加熱により生成する水分を測定し、算出する。 The above-mentioned spherical silica particles preferably have a water absorption of 1.0% or less, and more preferably 0.5% or less. Water absorption is based on the mass of the silica particles when dry. Water absorption is measured by leaving a dry sample at 40°C and 80% RH for 1 hour, and then measuring and calculating the amount of water generated by heating to 200°C using a Karl Fischer moisture analyzer.
また上記球状シリカ粒子は、フッ素樹脂シートを600℃で30分間、大気雰囲気下で加熱することでフッ素樹脂を焼き飛ばし、球状シリカ粒子を取り出したのち、上述の方法を用いて上記各パラメータを測定することもできる。 Furthermore, the spherical silica particles can be measured using the above-mentioned methods after the fluororesin sheet is heated in an air atmosphere at 600°C for 30 minutes to burn off the fluororesin and the spherical silica particles are removed.
上記シリカ粒子は、表面処理が施されたものであることが好ましい。表面処理を予め施すことで、シリカ粒子の凝集を抑制することができ、樹脂組成物中にシリカ粒子を良好に分散させることができる点で好ましい。 It is preferable that the silica particles have been surface-treated. Pre-surface treatment is preferable because it can prevent the silica particles from aggregating and allow the silica particles to be well dispersed in the resin composition.
上記表面処理としては特に限定されるものではなく、公知の任意のものを使用することができる。具体的には例えば、反応性官能基を有するエポキシシラン、アミノシラン、イソシアネートシラン、ビニルシラン、アクリルシラン、疎水性のアルキルシラン、フェニルシラン、フッ素化アルキルシランなどのシランカップリング剤による処理、プラズマ処理、フッ素化処理等を挙げることができる。 The surface treatment is not particularly limited, and any known treatment can be used. Specific examples include treatment with a silane coupling agent such as an epoxy silane, amino silane, isocyanate silane, vinyl silane, acrylic silane, hydrophobic alkyl silane, phenyl silane, or fluorinated alkyl silane, which has a reactive functional group; plasma treatment; and fluorination treatment.
上記シランカップリング剤として、γ-グリシドキシプロピルトリエトキシシラン、β-(3,4-エポキシシクロヘキシル)エチルトリメトキシシラン等のエポキシシラン、アミノプロピルトリエトキシシラン、N-フェニルアミノプロピルトリメトキシシラン等のアミノシラン、3-イソシアネートプロピルトリメトキシシラン等のイソシアネートシラン、ビニルトリメトキシシラン等のビニルシラン、アクリロキシトリメトキシシラン等のアクリルシラン等が例示される。 Examples of the silane coupling agent include epoxy silanes such as γ-glycidoxypropyltriethoxysilane and β-(3,4-epoxycyclohexyl)ethyltrimethoxysilane, amino silanes such as aminopropyltriethoxysilane and N-phenylaminopropyltrimethoxysilane, isocyanate silanes such as 3-isocyanatepropyltrimethoxysilane, vinyl silanes such as vinyltrimethoxysilane, and acrylic silanes such as acryloxytrimethoxysilane.
上記球状シリカ粒子は、市販のシリカ粒子で上述した性質を満たすものを使用するものであってもよい。市販のシリカ粒子としては、例えば、デンカ溶融シリカ FBグレード(デンカ株式会社製)、デンカ溶融シリカ SFPグレード(デンカ株式会社製)、エクセリカ(株式会社トクヤマ製)、高純度合成球状シリカ粒子 アドマファイン(株式会社アドマテックス製)、アドマナノ(株式会社アドマテックス製)、アドマフューズ(株式会社アドマテックス製)、等を挙げることができる。 The spherical silica particles may be commercially available silica particles that satisfy the above-mentioned properties. Examples of commercially available silica particles include Denka Fused Silica FB Grade (manufactured by Denka Company Limited), Denka Fused Silica SFP Grade (manufactured by Denka Company Limited), Excelica (manufactured by Tokuyama Corporation), high-purity synthetic spherical silica particles Admafine (manufactured by Admatechs Co., Ltd.), Admanano (manufactured by Admatechs Co., Ltd.), and Admafuse (manufactured by Admatechs Co., Ltd.).
本開示において使用する充填剤は、(10GHzで測定した充填剤の誘電正接)/(充填剤の表面積(m2/g))の比が0.00001~0.00035であることが好ましい。このような関係を満たす充填剤を使用することで、特に優れた低誘電率、低損失、低膨張を有するシートを得ることができる点で好ましい。 The filler used in the present disclosure preferably has a ratio of (dielectric tangent of the filler measured at 10 GHz)/(surface area of the filler (m 2 /g)) of 0.00001 to 0.00035. Use of a filler that satisfies this relationship is preferred in that it allows for the production of a sheet with particularly excellent low dielectric constant, low loss, and low expansion.
(10GHzで測定した充填剤の誘電正接)/(充填剤の表面積(m2/g))の値は、充填剤形状、充填剤の大きさ、表面処理の有無、等によって調整することができる。より具体的には、上述した球状シリカ粒子として、所定の大きさのものを使用し、更に、表面処理を施したものとすることが好ましい。シリカは、表面が表面処理剤で処理されていることが好ましい。表面処理を行う場合の表面処理剤の種類も、上記パラメータに影響を与えるものとなる。より具体的には、アミノプロピルトリエトキシシラン、アミノシラン、ビニルシラン、疎水性のアルキルシラン、フェニルシラン、3-メルカプトプロピルシラン、3-アクリロキシプロピルシラン、3-メタクリロキシプロピルシラン、p-スチリルシラン、シリルプロピルコハク酸無水物、3-イソシアネートプロピルシラン、2-(3,4-エポキシシクロヘキシル)エチルシラン等によって表面処理を施したものであることが特に好ましい。これらのシランカップリング剤を用いて表面処理を施すことにより、充填剤表面に存在する極性官能基が反応し、極性官能基の量が低減するため電気特性に優れる。 The value of (dielectric loss tangent of filler measured at 10 GHz)/(surface area of filler (m 2 /g)) can be adjusted by the shape and size of the filler, whether or not surface treatment is performed, and the like. More specifically, it is preferable to use spherical silica particles of a predetermined size as the above-mentioned spherical silica particles, which are further surface-treated. It is preferable that the surface of the silica is treated with a surface treatment agent. When surface treatment is performed, the type of surface treatment agent also affects the above parameter. More specifically, it is particularly preferable that the silica is surface-treated with aminopropyltriethoxysilane, aminosilane, vinylsilane, hydrophobic alkylsilane, phenylsilane, 3-mercaptopropylsilane, 3-acryloxypropylsilane, 3-methacryloxypropylsilane, p-styrylsilane, silylpropylsuccinic anhydride, 3-isocyanatopropylsilane, 2-(3,4-epoxycyclohexyl)ethylsilane, or the like. By carrying out surface treatment with these silane coupling agents, the polar functional groups present on the filler surface react, reducing the amount of polar functional groups, resulting in excellent electrical properties.
上記充填剤は、シート重量に対して20~80質量%の割合で含まれることが好ましい。このような配合量とすることで、低誘電率、低損失を維持しながら低熱膨張になるという点で好ましい。上記配合量は、40質量%以上であることがより好ましく、53質量%以上であることが更に好ましく、56質量%以上であることが更に好ましい。充填剤の配合量の上限は特に限定されるものではないが、75質量%以下であることが好ましく、70質量%以下であることが更に好ましく、65質量%以下であることが一層好ましく、60質量%以下であることがなお一層好ましい。 The filler is preferably contained in an amount of 20 to 80% by mass relative to the sheet weight. This amount is preferable in that it achieves low thermal expansion while maintaining a low dielectric constant and low loss. The amount is more preferably 40% by mass or more, even more preferably 53% by mass or more, and even more preferably 56% by mass or more. There is no particular upper limit to the filler amount, but it is preferably 75% by mass or less, even more preferably 70% by mass or less, even more preferably 65% by mass or less, and even more preferably 60% by mass or less.
上記(10GHzで測定した充填剤の誘電正接)/(充填剤の表面積(m2/g))の上限は、0.00030あることがより好ましく、0.00025であることが更に好ましい。 The upper limit of the above (dielectric loss tangent of the filler measured at 10 GHz)/(surface area of the filler (m 2 /g)) is more preferably 0.00030, and even more preferably 0.00025.
本開示において、10GHzで測定した充填剤の誘電正接は、円筒形空洞共振器とネットワークアナライザを用い、充填剤粉体試料を石英管に充填し、共振器内に装荷して測定した。試料挿入前後の共振器の特性(共振周波数とQ値)を取得し、その結果から誘電正接を算出した。本測定法は日本工業規格JIS2565マイクロ波用フェライト磁心試験方法に準拠するものであり、室温25℃、湿度40%の環境下測定を行った。 In this disclosure, the dielectric loss tangent of the filler measured at 10 GHz was measured using a cylindrical cavity resonator and network analyzer. A filler powder sample was filled into a quartz tube and loaded into the resonator. The resonator's characteristics (resonance frequency and Q value) were obtained before and after inserting the sample, and the dielectric loss tangent was calculated from the results. This measurement method complies with Japanese Industrial Standard JIS 2565, Microwave Ferrite Core Test Method, and measurements were performed in an environment with a room temperature of 25°C and humidity of 40%.
本開示において、10GHzで測定した充填剤の誘電正接は、特に限定されるものではないが、0.0015以下であることが好ましい。このような値とすることで、フッ素樹脂シートが低損失になるという点で好ましい。上記上限は、0.0025であることがより好ましく、0.002であることが更に好ましい。 In the present disclosure, the dielectric loss tangent of the filler measured at 10 GHz is not particularly limited, but is preferably 0.0015 or less. This value is preferable in that it results in low loss for the fluororesin sheet. The upper limit is more preferably 0.0025, and even more preferably 0.002.
本開示において、充填剤の表面積(m2/g)は、特に限定されるものではないが、1~10であることが好ましい。上記範囲内とすることで、フッ素樹脂シートの低損失と低線膨張のバランスが良いという点で好ましい。上記下限は、1.2であることがより好ましく、1.5であることが更に好ましい。上記上限は、9であることがより好ましく、7であることが更に好ましい。 In the present disclosure, the surface area (m 2 /g) of the filler is not particularly limited, but is preferably 1 to 10. Setting it within this range is preferable in that it achieves a good balance between low loss and low linear expansion of the fluororesin sheet. The lower limit is more preferably 1.2, and even more preferably 1.5. The upper limit is more preferably 9, and even more preferably 7.
本開示において、充填剤の表面積(m2/g)は、BET法に基づく値であり、比表面積測定機としては、「Macsorb HM model-1208」(MACSORB社製)を用いて測定することができる。なお、本開示のフッ素樹脂シートが、2種以上の充填剤を含有する場合は、配合した充填剤全体に対して測定した表面積が上述した範囲内となるものである。 In the present disclosure, the surface area (m 2 /g) of the filler is a value based on the BET method, and can be measured using a specific surface area measuring device "Macsorb HM model-1208" (manufactured by MACSORB Co., Ltd.). When the fluororesin sheet of the present disclosure contains two or more types of fillers, the surface area measured for all the blended fillers falls within the above-mentioned range.
本開示において充填剤の平均粒径は、0.1μm以上であることが好ましく、0.5μm以上であることがより好ましい。本開示において充填剤の平均粒径は、250μm以下であることが好ましく、100μm以下であることがより好ましく、10μn以下であることが更に好ましく、3μm以下であることが一層好ましく、2.5μm以下であることが更に一層好ましく、2.1μm以下であることが特に好ましい。 In the present disclosure, the average particle size of the filler is preferably 0.1 μm or more, and more preferably 0.5 μm or more. In the present disclosure, the average particle size of the filler is preferably 250 μm or less, more preferably 100 μm or less, even more preferably 10 μm or less, even more preferably 3 μm or less, even more preferably 2.5 μm or less, and particularly preferably 2.1 μm or less.
本開示において充填剤は、平均粒径が0.5~250μmであってもよい。なお、ここでの平均粒径は、レーザー解析式粒度分布計によって測定したD50の値である。平均粒径が0.5μm以上であると、充填剤の凝集が生じ難く、充分な効果が得られる傾向にある。 In the present disclosure, the filler may have an average particle size of 0.5 to 250 μm. Note that the average particle size here is the D50 value measured using a laser analytical particle size distribution analyzer. If the average particle size is 0.5 μm or greater, the filler is less likely to aggregate, and sufficient effects tend to be obtained.
(組成について)
本開示のシートは、上述した充填剤及びフッ素樹脂を含有するものである。必要に応じて、充填剤、フッ素樹脂以外の成分を含有するものであってもよいし、充填剤及びフッ素樹脂のみからなるものであってもよい。充填剤及びフッ素樹脂以外の成分の含有量は、10質量%以下(0質量%即ち非含有、又は0質量%超10質量%以下)であることが好ましい。換言すれば、フッ素樹脂及び充填剤の合計含有量は、例えば、シート重量に対して90質量%以上100質量%以下であることが好ましい。フッ素樹脂の質量Wrに対する充填剤Wfの質量の比率Wf/Wrは、例えば、0.6~1.5であってもよい。
(About the composition)
The sheet of the present disclosure contains the above-described filler and fluororesin. If necessary, it may contain components other than the filler and fluororesin, or it may consist only of the filler and fluororesin. The content of components other than the filler and fluororesin is preferably 10% by mass or less (0% by mass, i.e., not contained, or greater than 0% by mass and 10% by mass or less). In other words, the total content of the fluororesin and filler is preferably, for example, 90% by mass or more and 100% by mass or less relative to the sheet weight. The ratio Wf/Wr of the mass of the filler Wf to the mass Wr of the fluororesin may be, for example, 0.6 to 1.5.
本開示のシートは、シートの全量に対して、フッ素樹脂の含有量が20~80質量%であることが好ましい。このような範囲で充填剤を含有させることで、線膨張係数を低くでき、成形しやすいという点で好ましい。上記充填剤の配合量の下限は、特に限定されるものではないが、線膨張整数を低くできるという観点から、30質量%であることが好ましく、40質量%であることがより好ましい。上記上限は、75質量%であることがより好ましく、70質量%であることが更に好ましく、65質量%であることが一層好ましく、60質量%であることがなお一層好ましい。 The sheet of the present disclosure preferably has a fluororesin content of 20 to 80% by mass relative to the total amount of the sheet. Incorporating a filler in this range is preferable in that it reduces the linear expansion coefficient and makes the sheet easier to mold. The lower limit of the filler content is not particularly limited, but from the perspective of reducing the linear expansion coefficient, it is preferably 30% by mass, and more preferably 40% by mass. The upper limit is more preferably 75% by mass, even more preferably 70% by mass, even more preferably 65% by mass, and even more preferably 60% by mass.
(シートの製造方法)
本開示のシートの製造方法は特に限定されないが、その一例について説明する。本開示のシートの製造方法は、例えば、前記フッ素樹脂及び前記充填剤を混合、圧延シート化する工程(1);及び工程(1)によって得られた圧延シートを高密度化する工程(2);を含む。より具体的には、本開示のシートは、工程(1)においてフッ素樹脂粒子と充填剤を混合して成膜し、成膜して得られたシートを工程(2)において圧延することによって得ることができる。圧延することによって、シート中の空隙の量が低減され、これによって高密度化を図ることができる。工程(1)におけるシートへの成膜の方法を限定するものではないが、ペースト押出成形、粉体圧延成形等によって行うことができる。
(Sheet manufacturing method)
The method for manufacturing a sheet according to the present disclosure is not particularly limited, but an example thereof will be described. The method for manufacturing a sheet according to the present disclosure includes, for example, step (1) of mixing the fluororesin and the filler and rolling them into a sheet; and step (2) of densifying the rolled sheet obtained by step (1). More specifically, the sheet according to the present disclosure can be obtained by mixing fluororesin particles and a filler to form a film in step (1), and then rolling the sheet obtained by the film formation in step (2). By rolling, the amount of voids in the sheet is reduced, thereby achieving high density. The method for forming the film on the sheet in step (1) is not limited, but can be performed by paste extrusion molding, powder rolling molding, or the like.
上述したように、本開示のシートに使用するフッ素樹脂としては、溶融成形不可能であるフッ素樹脂を使用することが好ましい。このようなフッ素樹脂を使用した場合、これをシート状に成形する場合は、原料としての粉末状のPTFEをフィブリル化することで成形することが好ましい。 As mentioned above, it is preferable to use a fluororesin that cannot be melt-molded as the fluororesin used in the sheet of the present disclosure. When using such a fluororesin and molding it into a sheet, it is preferable to do so by fibrillating powdered PTFE as the raw material.
上記粉末状のPTFEは、一次粒子径が0.05~10μmのものを使用することが好ましい。このようなものを使用することで、成形性、分散性に優れるという利点がある。なお、ここでの一次粒子径は、ASTM D 4895に準拠し測定した値である。 It is preferable to use powdered PTFE with a primary particle diameter of 0.05 to 10 μm. Using such a material has the advantage of excellent moldability and dispersibility. The primary particle diameter here is a value measured in accordance with ASTM D 4895.
上記粉末状のPTFEは、二次粒子径が500μm以上のポリテトラフルオロエチレン樹脂を50質量%以上含むことが好ましく、80質量%以上含むことがより好ましい。二次粒子径が500μm以上のPTFEが当該範囲内のものであることによって、強度の高いシートを作製できるという点で利点を有する。二次粒子径が500μm以上のPTFEを用いることで、より抵抗が低く、靭性に富んだシートを得ることができる。 The above-mentioned powdered PTFE preferably contains 50% by mass or more, and more preferably 80% by mass or more, of polytetrafluoroethylene resin with a secondary particle diameter of 500 μm or more. Having PTFE with a secondary particle diameter of 500 μm or more within this range has the advantage of allowing the production of a high-strength sheet. Using PTFE with a secondary particle diameter of 500 μm or more makes it possible to obtain a sheet with lower resistance and greater toughness.
上記二次粒子径の下限は、300μmであることがより好ましく、350μmであることが更に好ましい。上記二次粒子径の上限は、700μm以下であることがより好ましく、600μm以下であることが更に好ましい。二次粒子径は例えばふるい分け法などで求めることができる。 The lower limit of the secondary particle diameter is more preferably 300 μm, and even more preferably 350 μm. The upper limit of the secondary particle diameter is more preferably 700 μm or less, and even more preferably 600 μm or less. The secondary particle diameter can be determined, for example, by a sieving method.
上記粉末状のPTFEは、より高強度でかつ均質性に優れるシートが得られることから、平均一次粒子径が50nm以上であることが好ましい。より好ましくは、100nm以上であり、更に好ましくは150nm以上であり、特に好ましくは200nm以上である。PTFEの平均一次粒子径が大きいほど、その粉末を用いてペースト押出成形をする際に、ペースト押出圧力の上昇を抑えられ、成形性にも優れる。上限は特に限定されないが500nmであってよい。重合工程における生産性の観点からは、350nmであることが好ましい。 The powdered PTFE preferably has an average primary particle diameter of 50 nm or more, as this allows for the production of a sheet with higher strength and excellent homogeneity. It is more preferably 100 nm or more, even more preferably 150 nm or more, and particularly preferably 200 nm or more. The larger the average primary particle diameter of PTFE, the more effectively it can suppress an increase in paste extrusion pressure when paste extrusion molding is performed using the powder, and the better the moldability. There is no particular upper limit, but it may be 500 nm. From the viewpoint of productivity in the polymerization process, a value of 350 nm is preferred.
上記平均一次粒子径は、重合により得られたPTFEの水性分散液を用い、ポリマー濃度を0.22質量%に調整した水性分散液の単位長さに対する550nmの投射光の透過率と、透過型電子顕微鏡写真における定方向径を測定して決定された平均一次粒子径との検量線を作成し、測定対象である水性分散液について、上記透過率を測定し、上記検量線をもとに決定できる。 The average primary particle diameter can be determined by creating a calibration curve between the transmittance of 550 nm incident light per unit length of an aqueous dispersion of PTFE obtained by polymerization, with the polymer concentration adjusted to 0.22% by mass, and the average primary particle diameter determined by measuring the unidirectional diameter in a transmission electron microscope photograph, and then measuring the transmittance for the aqueous dispersion to be measured, and then using the calibration curve.
本開示に使用するPTFEは、コアシェル構造を有していてもよい。コアシェル構造を有するPTFEとしては、例えば、粒子中に高分子量のポリテトラフルオロエチレンのコアと、より低分子量のポリテトラフルオロエチレンまたは変性のポリテトラフルオロエチレンのシェルとを含む変性ポリテトラフルオロエチレンが挙げられる。このような変性ポリテトラフルオロエチレンとしては、例えば、特表2005-527652号公報に記載されるポリテトラフルオロエチレンが挙げられる。 The PTFE used in this disclosure may have a core-shell structure. Examples of PTFE with a core-shell structure include modified polytetrafluoroethylene particles containing a core of high-molecular-weight polytetrafluoroethylene and a shell of lower-molecular-weight polytetrafluoroethylene or modified polytetrafluoroethylene. Examples of such modified polytetrafluoroethylene include the polytetrafluoroethylene described in JP-A-2005-527652.
工程(1)におけるペースト押出成形、粉体圧延成形の具体的な方法は特に限定されるものではないが、以下に一般的な方法を記載する。 The specific methods for paste extrusion molding and powder rolling molding in step (1) are not particularly limited, but general methods are described below.
(ペースト押出成形)
上記シートの製造方法は、炭化水素系界面活性剤を使用して得られたPTFE粉末と押出助剤とを混合する工程(1a)、得られた混合物をペースト押出成形する工程(1b)、押出成形で得られた押出物を圧延する工程(1c)、圧延後のシートを乾燥する工程(1d)、乾燥後のシートを焼成して成形体を得る工程(1e)を含むものであってよい。上記ペースト押出成形は、上記PTFE粉末に顔料や充填剤等の従来公知の添加剤を加えて行うこともできる。
(Paste extrusion molding)
The method for producing the sheet may include the steps of: (1a) mixing the PTFE powder obtained using a hydrocarbon surfactant with an extrusion aid; (1b) paste-extrusion molding the resulting mixture; (1c) rolling the extrudate obtained by extrusion; (1d) drying the rolled sheet; and (1e) firing the dried sheet to obtain a molded product. The paste extrusion molding may also be carried out by adding conventionally known additives such as pigments and fillers to the PTFE powder.
上記押出助剤としては特に限定されず、一般に公知のものを使用できる。例えば、炭化水素油等が挙げられる。 The extrusion aid is not particularly limited, and commonly known agents can be used. Examples include hydrocarbon oils.
(粉体圧延成形)
上記シートは、粉体圧延成形によって成形することもできる。粉体圧延成形は、樹脂粉体に剪断力を付与することで、フィブリル化させ、これによってシート状に成形する方法である。その後、焼成して成形体を得る工程を含むものであってよい。より具体的には、フッ素樹脂及び充填剤を含む原料組成物を混合しながら、剪断力を付与する工程(1-1)
前記工程(1-1)によって得られた混合物をバルク状に成形する工程(1-2)及び
前記工程(1-2)によって得られたバルク状の混合物をシート状に圧延する工程(1-3)
を有する製造方法によって得ることができる。なお、このような粉体圧延成形によってシートとする場合は、フッ素樹脂粒子と無機充填剤のみを混合して成形することが好ましい。
(Powder rolling molding)
The sheet can also be formed by powder rolling. Powder rolling is a method of applying shear force to resin powder to fibrillate it and form it into a sheet. This method may include a subsequent step of firing the powder to obtain a molded product. More specifically, the method includes a step (1-1) of applying shear force while mixing a raw material composition containing a fluororesin and a filler.
a step (1-2) of forming the mixture obtained in the step (1-1) into a bulk form, and a step (1-3) of rolling the bulk mixture obtained in the step (1-2) into a sheet form.
When a sheet is formed by such powder rolling molding, it is preferable to mix only the fluororesin particles and the inorganic filler and then mold the mixture.
(高密度化処理)
本開示のシートを得るためには、工程(2)において、上述した高密度化処理を行うことが好ましい。高密度化処理としては特に限定されず、具体的には例えば、加圧ロールや加圧プレスによる加圧等を挙げることができる。
(Densification process)
In order to obtain the sheet of the present disclosure, it is preferable to perform the above-mentioned densification treatment in step (2). The densification treatment is not particularly limited, and specific examples include pressing with a pressure roll or a pressure press.
上記高密度化処理は、シートの比重を1%以上増加させるものであることが好ましい。より具体的には、工程(2)において、工程(1)によって得られた圧延シートの比重が1%以上増加するように、圧延シートが加圧されることが好ましい。このように比重を増加させることで、本開示の目的を良好に達成できる。このような増加率とするため、圧力、温度、加圧時間等を適宜調整することが好ましい。比重の増加率は、その上限は特に限定されないが、例えば10%以下である。 The densification treatment preferably increases the specific gravity of the sheet by 1% or more. More specifically, in step (2), the rolled sheet obtained in step (1) is preferably pressurized so that the specific gravity of the rolled sheet increases by 1% or more. Increasing the specific gravity in this manner allows the objectives of the present disclosure to be successfully achieved. To achieve such an increase rate, it is preferable to appropriately adjust the pressure, temperature, pressurization time, etc. The upper limit of the increase rate of specific gravity is not particularly limited, but is, for example, 10% or less.
さらに、上記高密度化処理は、吸水前後の誘電正接の変化率を比較したとき、高密度化前のシートに比べて、高密度化後のシートの誘電正接の変化率が低下していることが好ましい。すなわち、高密度処理前のシートと、高密度処理後のシートとで、それぞれ吸水前、吸水後の誘電正接を測定する。そして、吸水による誘電正接の変化率を、高密度化処理前、高密度化処理後のシートそれぞれについて算出する。この場合、高密度化のシートのほうが誘電正接の変化率が小さいことを意味する。なお、ここでの吸水は、上述した吸水率の測定方法と同様の方法で行ったものである。 Furthermore, when comparing the rate of change in dielectric tangent before and after water absorption, the densification treatment preferably results in a lower rate of change in the dielectric tangent of the densified sheet compared to the sheet before densification. That is, the dielectric tangent of the sheet before densification treatment and the sheet after densification treatment are measured before and after water absorption. The rate of change in dielectric tangent due to water absorption is then calculated for each sheet before and after densification treatment. In this case, the densified sheet has a smaller rate of change in dielectric tangent. Note that water absorption here is measured using the same method as the water absorption rate measurement method described above.
高密度化処理による利点を十分に得るために、高密度化処理前のシートの吸水前後の誘電正接の変化率R1に対する、高密度化処理後のシートの吸水前後の誘電正接の変化率R2の比率R2/R1は、0.8以下であることが好ましく、0.7以下であることがより好ましい。比率R2/R1は、低い程好ましくその下限は特に限定されないが、例えば、0.0以上であってもよい。 To fully obtain the benefits of the densification treatment, the ratio R2/R1 of the rate of change R2 of the dielectric tangent of the sheet before and after absorbing water to the rate of change R1 of the dielectric tangent of the sheet before and after absorbing water, is preferably 0.8 or less, and more preferably 0.7 or less. The lower the ratio R2/R1, the better, and there is no particular lower limit, but it may be, for example, 0.0 or more.
加圧ロールは、圧入機構を通過するシートと直接接触しさらに、加圧するものである。これによって、シートが高密度化される点で特に好ましい。上記加圧ロールは、ゴムロールや樹脂製ロール、金属ロールであることが好ましい。特に2本1対のロールから構成され、一方は金属製ロールであり、もう一方は金属製の軸芯に、ゴムを被覆して構成されたロールを使用することで、適度な加圧を加えることができる。金属ロールの材質としては特に限定されず、鉄、ステンレス(SUS304,SUS430、SUS410,SUS403等)、銅等を挙げることができる。また金属ロール表面には、耐久性や加工性を向上させるために、各種の表面処理を行っても良い。表面処理は特に限定されず、クロムめっき、銅めっき、ニッケルめっき、またはこれらの複合めっき等のめっき処理やエンボス、溝入れなどの機械的処理、フッ素コートやシリコンコート等の剥離性を改善させる処理を行っても良い。 The pressure roll comes into direct contact with the sheet passing through the pressing mechanism and applies pressure to it. This is particularly preferred because it increases the density of the sheet. The pressure roll is preferably a rubber roll, a resin roll, or a metal roll. In particular, a pair of rolls, one of which is a metal roll and the other of which is a rubber-coated roll with a metal core, can be used to apply appropriate pressure. The material of the metal roll is not particularly limited, and examples include iron, stainless steel (SUS304, SUS430, SUS410, SUS403, etc.), copper, etc. Furthermore, the surface of the metal roll may be subjected to various surface treatments to improve durability and processability. Surface treatments are not particularly limited, and include plating treatments such as chrome plating, copper plating, nickel plating, or composite plating of these; mechanical treatments such as embossing and grooving; and treatments to improve release properties such as fluorine coating and silicone coating.
上記加圧ロールによってシートに付与される線圧力は、30~500kg/cmであることが好ましい。より好ましくは40~400kg/cmである。更に好ましくは50~300kg/cmである。このような範囲であることで、上述した所定の密度を有するシートとすることが容易になる点で好ましい。 The linear pressure applied to the sheet by the pressure roll is preferably 30 to 500 kg/cm. More preferably, it is 40 to 400 kg/cm. Even more preferably, it is 50 to 300 kg/cm. This range is preferable because it makes it easier to produce a sheet with the specified density described above.
上記加圧ロールによる加圧は、電気炉または加圧ロール自体を加温してもよい。シートの温度範囲は10~250℃の範囲が好ましく、より好ましくは15~150℃の範囲が好ましく、更に好ましくは20~100℃の範囲である。このような加圧条件とすることで、より容易にシートは一体化させることができ、本開示の目的を好適に達成することができる。上記加圧ロールは、向かい合うロールの直径が異なってもよく、回転速度が異なっても良い。このような設計とすることで、シートに加えるせん断力を変化させることができる。 When applying pressure using the pressure roll, the electric furnace or the pressure roll itself may be heated. The temperature range of the sheet is preferably 10 to 250°C, more preferably 15 to 150°C, and even more preferably 20 to 100°C. By using such pressure conditions, the sheets can be more easily integrated, and the objectives of the present disclosure can be preferably achieved. The pressure rolls may have different diameters and rotation speeds on opposite sides. This design allows the shear force applied to the sheet to be varied.
上記加圧ロールによる圧入手段としては、公知のものを適用することができる。より具体的には、例えば、特許第6590350号に記載されたような2本1対のロールによるもの、特許第5087646号に記載されたような二段圧延機によるもの、国際公開2020/204070に記載されたようなクラスターミルによるもの、特開昭62-275508号に記載されたようなプラネタリー圧延機によるもの、等を例示することができる。上記加圧ロールはクリーニング機構を備えていても良い。クリーニング機構としては特に限定されず、例えば、粘着ロールによるもの等を挙げることができる。 The pressure roll may be any known means for pressing. More specifically, examples include a pair of rolls as described in Japanese Patent No. 6590350, a two-high rolling mill as described in Japanese Patent No. 5087646, a cluster mill as described in International Publication No. 2020/204070, and a planetary rolling mill as described in Japanese Patent Application Laid-Open No. 62-275508. The pressure roll may be equipped with a cleaning mechanism. The cleaning mechanism is not particularly limited, and examples include an adhesive roll.
加圧プレスは、圧入機構でシートを直接接触しさらに、加圧するものである。これによって、シートが高密度化される点で特に好ましい。上記加圧プレスは、ゴム板や樹脂製板、金属板であることが好ましい。特に金属板を使用することで、適度な加圧を加えることができる。金属板の材質としては特に限定されず、鉄、ステンレス(SUS304,SUS430、SUS410,SUS403等)、銅等を挙げることができる。また板表面には、耐久性や加工性を向上させるために、各種の表面処理を行っても良い。表面処理は特に限定されず、クロムめっき、銅めっき、ニッケルめっき、またはこれらの複合めっき等のめっき処理やエンボス、溝入れなどの機械的処理、フッ素コートやシリコンコート等の剥離性を改善させる処理を行っても良い。 The pressure press directly contacts the sheet with a press-fitting mechanism and applies pressure. This is particularly preferred because it increases the density of the sheet. The pressure press is preferably made of rubber, resin, or metal. Using a metal plate, in particular, allows for the application of appropriate pressure. The material of the metal plate is not particularly limited, and examples include iron, stainless steel (SUS304, SUS430, SUS410, SUS403, etc.), copper, etc. The plate surface may also be subjected to various surface treatments to improve durability and processability. Surface treatments are not particularly limited, and include plating treatments such as chrome plating, copper plating, nickel plating, or composite plating of these; mechanical treatments such as embossing and grooving; and treatments to improve release properties such as fluorine coating or silicone coating.
上記加圧プレスによって付与される圧力は、1~200MPaであることが好ましい。より好ましくは5~100MPaである。更に好ましくは10~80MPaである。このような範囲であることで、上述した所定の密度を有するシートとすることが容易になる点で好ましい。 The pressure applied by the pressure press is preferably 1 to 200 MPa. More preferably, it is 5 to 100 MPa. Even more preferably, it is 10 to 80 MPa. This range is preferable because it makes it easier to produce a sheet with the specified density described above.
上記加圧プレスによる加圧は、電気炉または加圧板自体を加温してもよい。シートの温度範囲は10~250℃の範囲が好ましく、より好ましくは15~150℃の範囲が好ましく、更に好ましくは20~100℃の範囲である。このような加圧条件とすることで、より容易にシートは一体化させることができ、本開示の目的を好適に達成することができる。 When applying pressure using the pressure press, the electric furnace or pressure plate itself may be heated. The temperature range of the sheets is preferably 10 to 250°C, more preferably 15 to 150°C, and even more preferably 20 to 100°C. By using these pressure conditions, the sheets can be more easily integrated, and the objectives of the present disclosure can be preferably achieved.
(積層体)
本開示のシート状樹脂組成物は、プリント配線基板用のシートとして、その他の基材と積層して使用することができる。すなわち、回路基板の絶縁材料として好適に使用することができる。
(Laminate)
The sheet-shaped resin composition of the present disclosure can be used by laminating it with other substrates as a sheet for printed wiring boards, i.e., it can be suitably used as an insulating material for circuit boards.
本開示は、金属層及び上述したシートを必須の層とする金属張積層体でもある。本開示の金属張積層体は、例えば、上述したシート(例えば、フッ素樹脂フィルム)の片面又は両面に金属層を接着させたことを特徴とする金属張積層体である。上述したように、本開示のフッ素樹脂を含むフィルムは、プリント配線基板用途において特に好適に使用することができるものであるから、このような金属張積層体として好適に使用することができる。 The present disclosure also relates to a metal clad laminate having a metal layer and the above-described sheet as essential layers. The metal clad laminate of the present disclosure is, for example, a metal clad laminate characterized by having a metal layer adhered to one or both sides of the above-described sheet (e.g., a fluororesin film). As described above, the fluororesin-containing film of the present disclosure is particularly suitable for use in printed wiring board applications, and can therefore be suitably used as such a metal clad laminate.
本開示において、金属層を構成する金属種としては、例えば、銅(例えば、圧延銅、電解銅等)、アルミニウム、SUS、ニッケル、金等を挙げることができる。これらの合金を使用することができる。導電性、回路加工性の観点から銅を使用することが好ましい。銅の表面には、耐熱層(ニッケルめっき、チタンめっき等)、防錆層(クロメート処理層等)、が形成されていても良い。さらにシランカップリング剤により表面が薬液処理されていても良い。なかでも金属層としては、銅箔を使用することが好ましい。 In the present disclosure, examples of metal species constituting the metal layer include copper (e.g., rolled copper, electrolytic copper, etc.), aluminum, SUS, nickel, gold, etc. Alloys of these can also be used. From the perspective of conductivity and circuit processability, copper is preferably used. A heat-resistant layer (nickel plating, titanium plating, etc.) or an anti-rust layer (chromate treatment layer, etc.) may be formed on the copper surface. Furthermore, the surface may be chemically treated with a silane coupling agent. Among these, it is preferable to use copper foil as the metal layer.
上記銅箔は、Rz1.6μm以下であることが好ましい。すなわち、本開示のシートは、Rz1.6μm以下という平滑性の高い銅箔への接着性も優れたものである。更に、銅箔は、少なくとも上述したフッ素樹脂フィルムと接着する面が1.6μm以下であればよく、他方の面は、Rz値を特に限定するものではない。上記Rzは、もっとも高い部分(最大山高さ:Rp)ともっとも深い部分(最大谷深さ:Rv)の和の値である。上記表面粗さはJIS-B0601に規定される十点平均粗さである。本明細書において、上記Rzは、測定長を4mmとして、表面粗さ計(商品名:サーフコム470A、東京精機社製)を用いて測定した値である。 The copper foil preferably has an Rz of 1.6 μm or less. In other words, the sheet of the present disclosure also has excellent adhesion to highly smooth copper foil with an Rz of 1.6 μm or less. Furthermore, the copper foil only needs to have an Rz of 1.6 μm or less on at least the surface that adheres to the fluororesin film; the Rz value of the other surface is not particularly limited. The Rz value is the sum of the highest point (maximum peak height: Rp) and the deepest point (maximum valley depth: Rv). The surface roughness is the ten-point average roughness specified in JIS-B0601. In this specification, the Rz value is measured using a surface roughness meter (product name: Surfcom 470A, manufactured by Tokyo Seiki Co., Ltd.) with a measurement length of 4 mm.
上記銅箔は、厚みは特に限定されないが、1~100μmの範囲であることが好ましく、5~50μmの範囲内であることがより好ましく、9~35μmがさらに好ましい。 The thickness of the copper foil is not particularly limited, but is preferably in the range of 1 to 100 μm, more preferably in the range of 5 to 50 μm, and even more preferably in the range of 9 to 35 μm.
上記銅箔は特に限定されるものではなく、具体的には例えば、圧延銅箔、電解銅箔等が挙げられる。 The copper foil is not particularly limited, and specific examples include rolled copper foil and electrolytic copper foil.
Rz1.6μm以下の銅箔としては特に限定されず、市販のものを使用することができる。市販のRz1.6μm以下の銅箔としては、例えば、電解銅箔CF-T9DA-SV-18(厚み18μm/Rz0.85μm)(福田金属箔粉工業株式会社製)等を挙げることができる。 There are no particular limitations on the copper foil with an Rz of 1.6 μm or less, and commercially available products can be used. Examples of commercially available copper foil with an Rz of 1.6 μm or less include electrolytic copper foil CF-T9DA-SV-18 (thickness 18 μm/Rz 0.85 μm) (manufactured by Fukuda Metal Foil & Powder Co., Ltd.).
上記銅箔は、本開示のフッ素樹脂フィルムとの接着強度を高めるために、表面処理を施したものであってもよい。 The copper foil may be surface-treated to increase its adhesive strength with the fluororesin film of the present disclosure.
上記表面処理は特に限定されないが、シランカップリング処理、プラズマ処理、コロナ処理、UV処理、電子線処理などであり、シランカップリング剤の反応性官能基としては、特に限定されないが、樹脂基材に対する接着性の観点から、アミノ基、(メタ)アクリル基、メルカプト基、及びエポキシ基から選択される少なくとも1種(例えば1種~4種)を末端に有することが好ましい。また、加水分解性基としては、特に限定されないが、メトキシ基、エトキシ基などのアルコキシ基などが挙げられる。本開示で使用する銅箔は、防錆層(クロメート等の酸化物皮膜等)、耐熱層等が形成されたものであってもよい。 The surface treatment is not particularly limited, but examples include silane coupling treatment, plasma treatment, corona treatment, UV treatment, and electron beam treatment. The reactive functional group of the silane coupling agent is not particularly limited, but from the perspective of adhesion to resin substrates, it is preferable for the silane coupling agent to have at least one (e.g., one to four) terminal group selected from amino groups, (meth)acrylic groups, mercapto groups, and epoxy groups. Furthermore, the hydrolyzable group is not particularly limited, but examples include alkoxy groups such as methoxy groups and ethoxy groups. The copper foil used in this disclosure may have an anti-corrosion layer (such as an oxide film such as chromate), a heat-resistant layer, etc. formed thereon.
上記シラン化合物による表面処理層を銅箔表面上に有する表面処理銅箔は、シラン化合物を含む溶液を調製した後、この溶液を用いて銅箔を表面処理することによって製造することができる。 Surface-treated copper foil having a surface treatment layer made from the above-mentioned silane compound on the copper foil surface can be produced by preparing a solution containing the silane compound and then surface treating the copper foil with this solution.
上記銅箔は、表面に、樹脂基材との接着性を高めるなどの観点から、粗化処理層を有するものであってもよい。
なお、粗化処理が本開示において要求される性能を低下させるおそれがある場合は、必要に応じて銅箔表面に電着させる粗化粒子を少なくしたり、粗化処理を行わない態様としたりすることもできる。
The copper foil may have a roughened layer on the surface from the viewpoint of improving adhesion to the resin substrate.
If the roughening treatment is likely to degrade the performance required in the present disclosure, the amount of roughening particles electrodeposited on the copper foil surface may be reduced as needed, or the roughening treatment may not be performed at all.
金属層と表面処理層との間には、各種特性を向上させる観点から、耐熱処理層、防錆処理層及びクロメート処理層からなる群から選択される1種以上の層を設けてもよい。これらの層は、単層であっても、複数層であってもよい。 In order to improve various properties, one or more layers selected from the group consisting of a heat-resistant treatment layer, a rust-proofing treatment layer, and a chromate treatment layer may be provided between the metal layer and the surface treatment layer. These layers may be a single layer or multiple layers.
本開示の金属張積層板は、更に、金属層およびフッ素樹脂フィルム以外の層を有するものであってもよい。
当該金属層およびフッ素樹脂フィルム以外の層は、ポリイミド、モディファイドポリイミド、液晶ポリマー、ポリフェニレンスルファイド、シクロオレフィンポリマー、ポリスチレン、エポキシ樹脂、ビスマレイミド、ポリフェニレンオキサイド、変性ポリフェニレンエーテル、ポリフェニレンエーテル、及び、ポリブタジエンからなる群から選択される少なくとも1種(例えば1種~12種)であることが好ましい。
The metal-clad laminate of the present disclosure may further include a layer other than the metal layer and the fluororesin film.
The layers other than the metal layer and the fluororesin film are preferably at least one type (e.g., 1 to 12 types) selected from the group consisting of polyimide, modified polyimide, liquid crystal polymer, polyphenylene sulfide, cycloolefin polymer, polystyrene, epoxy resin, bismaleimide, polyphenylene oxide, modified polyphenylene ether, polyphenylene ether, and polybutadiene.
これらの金属層およびフッ素樹脂フィルム以外の層は、上述した樹脂からなるものであれば特に限定されない。また、当該銅箔およびフッ素樹脂フィルム以外の層は、厚みが、12.5~260μmの範囲内のものであることが好ましい。 These layers other than the metal layer and fluororesin film are not particularly limited as long as they are made of the resins mentioned above. Furthermore, it is preferable that the thickness of the layers other than the copper foil and fluororesin film be within the range of 12.5 to 260 μm.
本開示の金属張積層板は、金属層を形成するのはロールフィルムの片面でも両面でも構わない。金属層を形成する方法としては、ロールフィルムの表面に金属箔を積層(粘着)する方法、蒸着法、めっき法などが挙げられる。銅箔を積層する方法としては、熱プレスによる方法が挙げられる。熱プレス温度は誘電体フィルムの融点-150℃~誘電体フィルムの融点+40℃が挙げられる。熱プレスの時間は例えば1~30分である。熱プレスの圧力は、0.1~10MPaという方法によって製造することができる。 In the metal-clad laminate of the present disclosure, the metal layer may be formed on one or both sides of the roll film. Methods for forming the metal layer include laminating (adhering) metal foil to the surface of the roll film, vapor deposition, and plating. Methods for laminating copper foil include heat pressing. The heat pressing temperature may be between the melting point of the dielectric film -150°C and the melting point of the dielectric film +40°C. The heat pressing time is, for example, 1 to 30 minutes. The laminate can be manufactured using a heat pressing pressure of 0.1 to 10 MPa.
本開示は、上述したシートと、金属層とを有することを特徴とする回路基板でもある。上述した金属張積層板は、その用途を特に限定されず、回路用基板として使用される。回路基板としては、例えば、プリント基板、積層回路基板、及び高周波基板が挙げられる。プリント基板とは半導体やコンデンサチップなどの電子部品を電気的に接続すると同時に、限られた空間内に配置し固定するための板状部品である。本金属張積層体から形成されるプリント基板の構成は特に制限はない。プリント基板は、リジッド基板、フレキシブル基板、リジッドフレキシブル基板のいずれであってもよい。プリント基板は、片面、基板、両面基板、多層基板(ブルドアップ基板等)のいずれであってもよい。特に、フレキシブル基板、リジット基板用に好適に使用することができる。特に10GHz以上の高周波用プリント基板として好適に使用することができる。 The present disclosure also relates to a circuit board characterized by having the above-mentioned sheet and a metal layer. The above-mentioned metal-clad laminate is not particularly limited in its application and is used as a circuit board. Examples of circuit boards include printed circuit boards, laminated circuit boards, and high-frequency boards. A printed circuit board is a plate-shaped component that electrically connects electronic components such as semiconductors and capacitor chips while also arranging and fixing them in a limited space. There are no particular restrictions on the configuration of a printed circuit board formed from this metal-clad laminate. The printed circuit board may be a rigid board, a flexible board, or a rigid-flexible board. The printed circuit board may be a single-sided board, a board, a double-sided board, or a multilayer board (such as a built-up board). It is particularly suitable for use as a flexible board or a rigid board. It is particularly suitable for use as a high-frequency printed circuit board of 10 GHz or more.
回路用基板としては特に限定されず、上述した金属張積層板を使用して、一般的な方法によって製造することができる。 The circuit board is not particularly limited and can be manufactured using the metal-clad laminate described above using a general method.
回路基板用の積層体は、金属層及び上述したフッ素樹脂フィルムおよび基材層を有することを特徴とする積層体でもある。基材層としては特に限定されないがガラス繊維からなる布帛層、樹脂フィルム層を有することが好ましい。 A laminate for a circuit board is also a laminate characterized by having a metal layer, the above-mentioned fluororesin film, and a substrate layer. There are no particular restrictions on the substrate layer, but it is preferable for it to have a fabric layer made of glass fiber and a resin film layer.
上記ガラス繊維からなる布帛層は、ガラスクロス、ガラス不織布等からなる層である。
ガラスクロスとしては市販のものが使用でき、フッ素樹脂との親和性を高めるためにシランカップリング剤処理を施されたものが好ましい。ガラスクロスの材質としてはEガラス、Cガラス、Aガラス、Sガラス、Dガラス、NEガラス、低誘電率ガラスなどが挙げられるが、入手が容易である点からEガラス、Sガラス、NEガラスが好ましい。繊維の織り方としては平織でも綾織でも構わない。ガラスクロスの厚さは通常5~90μmであり、好ましくは10~75μmであるが、使用するフッ素樹脂フィルムよりは薄いものを用いることが好ましい。
The glass fiber fabric layer is a layer made of glass cloth, glass nonwoven fabric, or the like.
Commercially available glass cloths can be used, preferably those treated with a silane coupling agent to enhance affinity with the fluororesin. Examples of glass cloth materials include E-glass, C-glass, A-glass, S-glass, D-glass, NE-glass, and low-dielectric-constant glass, with E-glass, S-glass, and NE-glass being preferred due to their ease of availability. The fiber weave may be plain or twill. The thickness of the glass cloth is typically 5 to 90 μm, preferably 10 to 75 μm, but it is preferable to use glass cloth that is thinner than the fluororesin film used.
上記積層体は、ガラス不織布をガラス繊維からなる布帛層として使用するものであってもよい。ガラス不織布とは、ガラスの短繊維を少量のバインダー化合物(樹脂あるいは無機物)で固着したもの、あるいはバインダー化合物を使用せずにガラス短繊維を絡ませることによってその形状を維持しているものであり、市販のものが使用できる。ガラス短繊維の直径は好ましくは0.5~30μmであり、繊維長は好ましくは5~30mmである。バインダー化合物の具体例としては、エポキシ樹脂、アクリル樹脂、セルロース、ポリビニルアルコール、フッ素樹脂等の樹脂や、シリカ化合物等の無機物が挙げられる。バインダー化合物の使用量はガラス短繊維に対して通常3~15質量%である。ガラス短繊維の材質としてはEガラス、Cガラス、Aガラス、Sガラス、Dガラス、NEガラス、低誘電率ガラスなどが挙げられる。ガラス不織布の厚さは通常50μm乃至1000μmであり、100~900μmであることが好ましい。尚、本願におけるガラス不織布の厚さは、JIS P8118:1998に準じ、(株)小野測器製のデジタルゲージDG-925(荷重110グラム、面径10mm)を用いて測定した値を意味する。フッ素樹脂との親和性を高めるために、ガラス不織布にシランカップリング剤処理を施してもよい。 The laminate may also use a glass nonwoven fabric as a fabric layer made of glass fibers. Glass nonwoven fabric is made by bonding short glass fibers with a small amount of a binder compound (resin or inorganic material), or by entangling the short glass fibers without the use of a binder compound to maintain its shape. Commercially available glass nonwoven fabrics can be used. The diameter of the short glass fibers is preferably 0.5 to 30 μm, and the fiber length is preferably 5 to 30 mm. Specific examples of binder compounds include resins such as epoxy resins, acrylic resins, cellulose, polyvinyl alcohol, and fluororesins, as well as inorganic materials such as silica compounds. The amount of binder compound used is typically 3 to 15% by mass of the short glass fibers. Examples of materials for the short glass fibers include E-glass, C-glass, A-glass, S-glass, D-glass, NE-glass, and low-dielectric-constant glass. The thickness of the glass nonwoven fabric is typically 50 to 1000 μm, preferably 100 to 900 μm. The thickness of the glass nonwoven fabric in this application refers to the value measured in accordance with JIS P8118:1998 using a digital gauge DG-925 (load 110 grams, face diameter 10 mm) manufactured by Ono Sokki Co., Ltd. The glass nonwoven fabric may be treated with a silane coupling agent to increase its affinity with the fluororesin.
ガラス不織布の多くは空隙率が80%以上と非常に高いので、フッ素樹脂からなるシートより厚いものを使用し、圧力によって圧縮して用いることが好ましい。 Since most glass nonwoven fabrics have a very high porosity of over 80%, it is preferable to use a sheet that is thicker than a fluororesin sheet and compress it under pressure.
上記ガラス繊維からなる布帛層は、ガラスクロスとガラス不織布とを積層した層であってもよい。これによって、相互の性質が組み合わせられて、好適な性質を得ることができる。
上記ガラス繊維からなる布帛層は、樹脂を含浸させたプリプレグの状態であってもよい。
The glass fiber fabric layer may be a layer in which a glass cloth and a glass nonwoven fabric are laminated together, thereby combining the properties of both layers to obtain suitable properties.
The glass fiber fabric layer may be in the form of a prepreg impregnated with a resin.
上記積層体は、ガラス繊維からなる布帛層とフッ素樹脂フィルムが界面で接着していてもよく、ガラス繊維からなる布帛層にフッ素樹脂フィルムの一部もしくはすべてが含侵されていてもよい。
更に、ガラス繊維からなる布帛にフッ素樹脂組成物を含侵させてプリプレグを作成したものであってもよい。このようにして得られたプリプレグに対して、更に、本開示のフッ素樹フィルムを積層したものであってもよい。この場合、プリプレグを作成する際に使用するフッ素樹脂組成物としては特に限定されるものではなく、本開示のフッ素樹脂フィルムを使用することもできる。
In the laminate, the glass fiber fabric layer and the fluororesin film may be bonded at the interface, or the glass fiber fabric layer may be partially or entirely impregnated with the fluororesin film.
Furthermore, a prepreg may be prepared by impregnating a fabric made of glass fiber with a fluororesin composition. The prepreg thus obtained may be further laminated with the fluororesin film of the present disclosure. In this case, the fluororesin composition used to prepare the prepreg is not particularly limited, and the fluororesin film of the present disclosure may also be used.
上記基材層として用いる樹脂フィルムとしては、耐熱性樹脂フィルム、熱硬化性樹脂フィルムが好ましい。耐熱性樹脂フィルムとしては、ポリイミド、モディファイドポリイミド、液晶ポリマー、ポリフェニレンスルファイドなどが挙げられる。熱硬化性樹脂としては、エポキシ樹脂、ビスマレイミド、ポリフェニレンオキサイド、変性ポリフェニレンエーテル、ポリフェニレンエーテル、ポリブタジエンなどを含むものが挙げられる。
耐熱性樹脂フィルムおよび熱硬化性樹脂フィルムは強化繊維を含んでいても良い。強化繊維としては特に限定されないが、例えばガラスクロス、とくに低誘電タイプのものが好ましい。
耐熱性樹脂フィルムおよび熱硬化性樹脂フィルムの誘電特性、線膨張係数、吸水率などの特性は特に限定されないが、たとえば、20GHzにおける誘電率は3.8以下が好ましく、3.4以下がより好ましく、3.0以下が更に好ましい。20GHzにおける誘電正接は、0.0030以下が好ましく、0.0025以下がより好ましく、0.0020以下が更に好ましい。線膨張係数は100ppm/℃以下が好ましく、70ppm/℃以下がより好ましく、40ppm/℃以下が更に好ましい。吸水率は1.0%以下が好ましく、0.5%以下がより好ましく、0.1%以下が更に好ましい。
The resin film used as the substrate layer is preferably a heat-resistant resin film or a thermosetting resin film. Examples of heat-resistant resin films include polyimide, modified polyimide, liquid crystal polymer, and polyphenylene sulfide. Examples of thermosetting resins include those containing epoxy resin, bismaleimide, polyphenylene oxide, modified polyphenylene ether, polyphenylene ether, and polybutadiene.
The heat-resistant resin film and the thermosetting resin film may contain reinforcing fibers. The reinforcing fibers are not particularly limited, but for example, glass cloth, particularly low-dielectric type, is preferred.
The dielectric properties, linear expansion coefficient, water absorption coefficient, and other properties of the heat-resistant resin film and the thermosetting resin film are not particularly limited, but for example, the dielectric constant at 20 GHz is preferably 3.8 or less, more preferably 3.4 or less, and even more preferably 3.0 or less. The dielectric loss tangent at 20 GHz is preferably 0.0030 or less, more preferably 0.0025 or less, and even more preferably 0.0020 or less. The linear expansion coefficient is preferably 100 ppm/°C or less, more preferably 70 ppm/°C or less, and even more preferably 40 ppm/°C or less. The water absorption is preferably 1.0% or less, more preferably 0.5% or less, and even more preferably 0.1% or less.
以下、本開示を実施例に基づいて具体的に説明する。以下の実施例においては特に言及しない場合は、「部」「%」はそれぞれ「質量部」「質量%」を表す。 The present disclosure will now be described in detail based on examples. In the following examples, unless otherwise specified, "parts" and "%" represent "parts by mass" and "% by mass," respectively.
各原料は以下のものを示す。
PTFE:
以下の性質を有するPTFEを使用した。
粒径:500μm
見掛密度:460g/L
標準比重:2.17
融点:327℃
Each ingredient is as follows:
PTFE:
PTFE having the following properties was used:
Particle size: 500μm
Apparent density: 460g/L
Standard specific gravity: 2.17
Melting point: 327°C
シリカ1~6:
シリカ1,3~6はアドマテックス社製SC-6500SQ(粒径2.1μm、球状)を使用した。
シリカ2はアドマテックス社製SC-2500SQ(粒径0.5μm、球状)を使用した。
シリカは以下の表面処理を行った。
シリカ3:アミノプロピル、処理量1.0%
シリカ4:アミノプロピル、処理量0.2%
シリカ5:フェニルアミノ、処理量0.4%
シリカ6:イソシアネート、処理量0.2%
Silica 1-6:
Silica 1, 3 to 6 used were SC-6500SQ (particle size 2.1 μm, spherical) manufactured by Admatechs Co., Ltd.
Silica 2 used was SC-2500SQ (particle size 0.5 μm, spherical) manufactured by Admatechs Co., Ltd.
The silica was subjected to the following surface treatment.
Silica 3: Aminopropyl, Treated at 1.0%
Silica 4: Aminopropyl, treatment amount 0.2%
Silica 5: Phenylamino, treatment amount 0.4%
Silica 6: Isocyanate, treated amount 0.2%
なお、表面処理において使用した各処理剤は以下である。
アミノプロピル:3-アミノプロピルトリエトキシシラン
フェニルアミノ:N-フェニル-3-アミノプロピルトリメトキシシラン
イソシアネート:3-イソシアネートプロピルトリエトキシシラン
The treating agents used in the surface treatment are as follows:
Aminopropyl: 3-aminopropyltriethoxysilane Phenylamino: N-phenyl-3-aminopropyltrimethoxysilane Isocyanate: 3-isocyanatopropyltriethoxysilane
(シートの製造)
以下に詳述する製造方法にしたがって、表1の実施例、比較例の各シートを製造した。
上記PTFEとシリカを表1に示す配合割合となるように計量し、ドライアイス存在下、ミキサーで混合した。混合中の温度は-10℃以下であった。得られた粉体を室温で2時間放置後、ポリ容器に入れ、加工助剤である炭化水素油(商品名:IP2028、出光興産株式会社製)を19部(PTFE及びシリカの合計量100部に対し炭化水素油19部)加え、3分間混合し、2時間、25℃の恒温槽に放置した後、出口が平板形状の金型で40℃に加温しペースト押出した。得られたシートを二本の金属ロールで圧延し、膜厚125μmのサンプルを得、200℃、2時間乾燥した。
(Seat manufacturing)
According to the manufacturing method described in detail below, each sheet of the examples and comparative examples shown in Table 1 was manufactured.
The PTFE and silica were weighed out to the proportions shown in Table 1 and mixed in a mixer in the presence of dry ice. The temperature during mixing was −10°C or below. The resulting powder was left at room temperature for 2 hours, then placed in a plastic container, and 19 parts of a processing aid, hydrocarbon oil (product name: IP2028, manufactured by Idemitsu Kosan Co., Ltd.), were added (19 parts hydrocarbon oil per 100 parts of PTFE and silica combined). The mixture was mixed for 3 minutes, left in a thermostatic oven at 25°C for 2 hours, and then heated to 40°C using a mold with a flat outlet to extrude the mixture into a paste. The resulting sheet was rolled between two metal rolls to obtain a sample with a thickness of 125 μm, which was then dried at 200°C for 2 hours.
(シートの高密度化)
乾燥したシートを2本1対のロールから構成され、一方は金属製ロールであり、もう一方は金属製の軸芯に、ゴムを被覆して構成されたロールで室温下25℃において圧延した。さらに360℃で、15分焼成しシートを得た。得られたシートについて、以下の基準に従って評価を行った。結果を表1に示した。
(High density sheet)
The dried sheet was rolled at room temperature (25°C) using a pair of rolls, one of which was a metal roll and the other of which was a rubber-coated roll with a metal core. The sheet was then baked at 360°C for 15 minutes to obtain a sheet. The resulting sheet was evaluated according to the following criteria. The results are shown in Table 1.
(シートの比重)
JIS Z 8807(固体の密度及び比重の測定方法)8 液中ひょう量法による密度及び比重の測定方法により測定した。
(specific gravity of sheet)
JIS Z 8807 (Method for measuring density and specific gravity of solids) 8 Measurement was carried out according to the method for measuring density and specific gravity by the submerged weighing method.
さらに、高密度化前後のシートの比重の変化率も算出した。
シートの比重の変化率は、
変化率=(高密度化後の比重-高密度化前の比重)*100/高密度化前の比重
によって算出した。
Furthermore, the rate of change in the specific gravity of the sheet before and after densification was also calculated.
The rate of change in the specific gravity of the sheet is
The rate of change was calculated as follows: (specific gravity after densification - specific gravity before densification) * 100 / specific gravity before densification.
(吸水性試験)
シートを5cm×5cmの正方形に切り出す。このシート表面の汚れを拭きとった後、110℃で一時間乾燥した。乾燥後すぐにデシケータ中で自然冷却させた。サンプルが室温にまで下がったところで、重量を測定したこの重量をW1とする。次いで、常温の水に24時間浸漬して吸水させる。吸水後のシートの水分を拭きとったあとで、重量を測定した(W2)。
吸水率は、
吸水率=[(W2-W1)/W1]×100
で算出した。
(Water absorption test)
The sheet was cut into a 5 cm x 5 cm square. After wiping off any dirt on the surface of the sheet, it was dried at 110°C for one hour. Immediately after drying, it was allowed to cool naturally in a desiccator. When the sample had cooled to room temperature, it was weighed and this weight was designated W1. Next, it was immersed in water at room temperature for 24 hours to allow it to absorb water. After wiping off the moisture from the sheet after water absorption, its weight was measured (W2).
The water absorption rate is
Water absorption rate = [(W2-W1)/W1] x 100
was calculated as follows.
(誘電正接)
スプリットシリンダ式誘電率・誘電正接測定装置(EM lab社製)を用いて、25℃、10GHzのDfを測定した。
通常のシートと、上記吸水性試験と同条件での吸水を行った後のシートについて、誘電正接の測定を行った。さらに、吸水前後の誘電正接の変化率も算出した。
変化率は、
変化率=(吸水後の誘電正接-吸水前の誘電正接)*100/吸水前の誘電正接
によって算出した。
(dielectric tangent)
Df was measured at 25° C. and 10 GHz using a split cylinder type dielectric constant/dielectric loss tangent measuring device (manufactured by EM Lab).
The dielectric loss tangents of the normal sheet and the sheet after water absorption under the same conditions as in the water absorption test were measured. Furthermore, the rate of change in the dielectric loss tangent before and after water absorption was calculated.
The rate of change is
The change rate was calculated as follows: rate of change = (dielectric loss tangent after water absorption - dielectric loss tangent before water absorption) * 100 / dielectric loss tangent before water absorption.
(線膨張係数)
TMA―7100(株式会社日立ハイテクサイエンス製)を用いたTMA測定を引張モードで行い、サンプル片として、長さ20mm、幅5mm、厚み150μmに切出したシートを用いて、チャック間を10mmに設定し、49mNの荷重をかけながら昇温速度2℃/分で0~150℃でのサンプルの変位量から求めた。
(Coefficient of linear expansion)
TMA measurement was carried out in tension mode using a TMA-7100 (manufactured by Hitachi High-Tech Science Corporation). A sheet cut to a length of 20 mm, width of 5 mm, and thickness of 150 μm was used as a sample piece, and the distance between chucks was set to 10 mm. The sample was subjected to a load of 49 mN and the temperature was increased at a rate of 2°C/min from 0 to 150°C, and the displacement was determined from the amount of deformation.
本開示のシートは、特に、高周波プリント基板に好適に使用することができる。 The sheets of the present disclosure are particularly suitable for use in high-frequency printed circuit boards.
Claims (23)
前記充填剤は、球状シリカであり、前記球状シリカの粒径は、0.5~2.1μmであり、
前記ポリテトラフルオロエチレン樹脂の含有量は、シート重量に対して40~60質量%であり、
前記球状シリカの含有量は、シート重量に対して40~60質量%である、請求項1~7の何れか一項に記載のシート。 the fluororesin is a polytetrafluoroethylene resin having a standard specific gravity of 2.0 to 2.3;
the filler is spherical silica, and the particle size of the spherical silica is 0.5 to 2.1 μm;
The content of the polytetrafluoroethylene resin is 40 to 60 mass% based on the weight of the sheet,
The sheet according to any one of claims 1 to 7, wherein the content of the spherical silica is 40 to 60 mass% based on the weight of the sheet.
工程(1)によって得られた圧延シートを高密度化する工程(2)を含むことを特徴とする請求項1~15の何れか一項に記載のシートの製造方法。 The method for manufacturing a sheet according to any one of claims 1 to 15, comprising: a step (1) of mixing the fluororesin and the filler and rolling the mixture into a sheet; and a step (2) of densifying the rolled sheet obtained by the step (1).
前記フッ素樹脂は、標準比重が2.0~2.3であるポリテトラフルオロエチレン樹脂であり、
前記充填剤は、球状シリカであり、前記球状シリカの粒径は、0.5~2.1μmであり、
前記ポリテトラフルオロエチレン樹脂の含有量は、シート重量に対して40~60質量%であり、
前記球状シリカの含有量は、シート重量に対して40~60質量%である請求項22に記載のシートの製造方法。 In the densification step (2), the rolled sheet is pressed so that the specific gravity of the rolled sheet increases by 1% or more,
the fluororesin is a polytetrafluoroethylene resin having a standard specific gravity of 2.0 to 2.3;
the filler is spherical silica, and the particle size of the spherical silica is 0.5 to 2.1 μm;
The content of the polytetrafluoroethylene resin is 40 to 60 mass% based on the weight of the sheet,
The method for manufacturing a sheet according to claim 22, wherein the content of the spherical silica is 40 to 60 mass % based on the weight of the sheet.
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| WO2025187577A1 true WO2025187577A1 (en) | 2025-09-12 |
| WO2025187577A8 WO2025187577A8 (en) | 2025-10-02 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| PCT/JP2025/007313 Pending WO2025187577A1 (en) | 2024-03-08 | 2025-02-28 | Sheet, copper-clad laminate, circuit board, and production method for sheet |
Country Status (2)
| Country | Link |
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| JP (1) | JP2025137452A (en) |
| WO (1) | WO2025187577A1 (en) |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61207446A (en) * | 1985-03-11 | 1986-09-13 | Nitto Electric Ind Co Ltd | Porous polytetrafluoroethylene sheet and production thereof |
| WO1998056011A1 (en) * | 1997-06-06 | 1998-12-10 | Nippon Zeon Co., Ltd. | Insulating materials containing cycloolefinic polymers |
| JP2007129201A (en) * | 2005-11-04 | 2007-05-24 | Advanced Energy Technology Inc | Heat spreader with thermal vias |
| WO2014119158A1 (en) * | 2013-01-31 | 2014-08-07 | ダイキン工業株式会社 | Flame-retardant resin composition, master batch, molded article, electric wire, and jacket |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP7151140B2 (en) * | 2018-04-11 | 2022-10-12 | Agc株式会社 | Fluororesin sheet, laminate and method for producing the same |
| KR102482364B1 (en) * | 2019-01-11 | 2022-12-29 | 다이킨 고교 가부시키가이샤 | Fluororesin compositions, fluororesin sheets, laminates and substrates for circuits |
| CN115503316A (en) * | 2021-06-22 | 2022-12-23 | 大金氟化工(中国)有限公司 | Dielectric material and flexible copper clad laminate with same |
| CN119546678A (en) * | 2022-07-22 | 2025-02-28 | 大金工业株式会社 | Fluororesin long film strip, metal-clad laminate, and circuit board |
-
2025
- 2025-02-28 WO PCT/JP2025/007313 patent/WO2025187577A1/en active Pending
- 2025-02-28 JP JP2025031714A patent/JP2025137452A/en active Pending
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61207446A (en) * | 1985-03-11 | 1986-09-13 | Nitto Electric Ind Co Ltd | Porous polytetrafluoroethylene sheet and production thereof |
| WO1998056011A1 (en) * | 1997-06-06 | 1998-12-10 | Nippon Zeon Co., Ltd. | Insulating materials containing cycloolefinic polymers |
| JP2007129201A (en) * | 2005-11-04 | 2007-05-24 | Advanced Energy Technology Inc | Heat spreader with thermal vias |
| WO2014119158A1 (en) * | 2013-01-31 | 2014-08-07 | ダイキン工業株式会社 | Flame-retardant resin composition, master batch, molded article, electric wire, and jacket |
Also Published As
| Publication number | Publication date |
|---|---|
| WO2025187577A8 (en) | 2025-10-02 |
| JP2025137452A (en) | 2025-09-19 |
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