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WO2025171949A1 - Procédé de métrologie et dispositif de métrologie associé - Google Patents

Procédé de métrologie et dispositif de métrologie associé

Info

Publication number
WO2025171949A1
WO2025171949A1 PCT/EP2025/050280 EP2025050280W WO2025171949A1 WO 2025171949 A1 WO2025171949 A1 WO 2025171949A1 EP 2025050280 W EP2025050280 W EP 2025050280W WO 2025171949 A1 WO2025171949 A1 WO 2025171949A1
Authority
WO
WIPO (PCT)
Prior art keywords
interest
metrology
plane
illumination
diffraction orders
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
PCT/EP2025/050280
Other languages
English (en)
Inventor
Eibert Gerjan VAN PUTTEN
Patricius Aloysius Jacobus Tinnemans
Willem Marie Julia Marcel COENE
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ASML Netherlands BV
Original Assignee
ASML Netherlands BV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from EP24157507.5A external-priority patent/EP4603909A1/fr
Application filed by ASML Netherlands BV filed Critical ASML Netherlands BV
Publication of WO2025171949A1 publication Critical patent/WO2025171949A1/fr
Pending legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70605—Workpiece metrology
    • G03F7/70616—Monitoring the printed patterns
    • G03F7/70633—Overlay, i.e. relative alignment between patterns printed by separate exposures in different layers, or in the same layer in multiple exposures or stitching
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70605—Workpiece metrology
    • G03F7/706843—Metrology apparatus
    • G03F7/706847—Production of measurement radiation, e.g. synchrotron, free-electron laser, plasma source or higher harmonic generation [HHG]
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70605—Workpiece metrology
    • G03F7/706843—Metrology apparatus
    • G03F7/706851—Detection branch, e.g. detector arrangements, polarisation control, wavelength control or dark/bright field detection

Definitions

  • a lithographic apparatus is a machine constructed to apply a desired pattern onto a substrate.
  • a lithographic apparatus can be used, for example, in the manufacture of integrated circuits (ICs).
  • a lithographic apparatus may, for example, project a pattern (also often referred to as “design layout” or “design”) at a patterning device (e.g., a mask) onto a layer of radiation-sensitive material (resist) provided on a substrate (e.g., a wafer).
  • a patterning device e.g., a mask
  • a layer of radiation-sensitive material resist
  • a substrate e.g., a wafer
  • a lithographic apparatus may use electromagnetic radiation. The wavelength of this radiation determines the minimum size of features which can be formed on the substrate. Typical wavelengths currently in use are 365 nm (i-line), 248 nm, 193 nm and 13.5 nm.
  • a lithographic apparatus which uses extreme ultraviolet (EUV) radiation, having a wavelength within the range 4-20 nm, for example 6.7 nm or 13.5 nm, may be used to form smaller features on a substrate than a lithographic apparatus which uses, for example, radiation with a wavelength of 193 nm.
  • EUV extreme ultraviolet
  • Low-k 1 lithography may be used to process features with dimensions smaller than the classical resolution limit of a lithographic apparatus.
  • ⁇ the wavelength of radiation employed
  • NA the numerical aperture of the projection optics in the lithographic apparatus
  • CD the “critical dimension” (generally the smallest feature size printed, but in this case half-pitch)
  • k1 is an empirical resolution factor.
  • the smaller k 1 the more difficult it becomes to reproduce the pattern on the substrate that resembles the shape and dimensions planned by a circuit designer in order to achieve particular electrical functionality and performance.
  • sophisticated fine-tuning steps may be applied to the lithographic projection apparatus and/or design layout.
  • RET resolution enhancement techniques
  • OPC optical proximity correction
  • RET resolution enhancement techniques
  • tight control loops for Company Secret controlling a stability of the lithographic apparatus may be used to improve reproduction of the pattern at low k1.
  • a general term to refer to such tools may be metrology apparatuses or inspection apparatuses.
  • Holography tools enable this, however they require a reference beam and very stringent operation to ensure interference between the reference beam and measurement radiation beam.
  • Other phase retrieval methods may comprise an iterative retrieval of phase, however these are computationally demanding,
  • a metrology method comprising: obtaining metrology data relating to a measurement obtained by illuminating a periodic structure comprising at least one pitch with partial coherent illumination comprising a wavelength and capturing the resultant scattered radiation from said periodic structure at a detection plane, said scattered radiation passing through at least one angularly resolved plane between said periodic structure and detection plane, said angularly resolved plane comprising at least one mask edge; non-iteratively reconstructing a field of said scattered radiation; using said reconstructed field to determine a parameter of interest of the structure; and in an initial step: selecting said wavelength and a maximum of said at least one pitch such that the wavelength-over-pitch ratio is greater than a first distance in said angularly resolved plane, said first distance comprising the distance between said at least one mask edge and a furthest extent of at least one specular component of the scattered radiation with respect to said mask edge.
  • the terms “radiation” and “beam” are used to encompass all types of electromagnetic radiation, including ultraviolet radiation (e.g. with a wavelength of 365, 248, 193, 157 or 126 nm) and EUV (extreme ultra-violet radiation, e.g. having a wavelength in the range of about 5- 100 nm).
  • the term “reticle”, “mask” or “patterning device” as employed in this text may be broadly interpreted as referring to a generic patterning device that can be used to endow an incoming radiation Company Secret beam with a patterned cross-section, corresponding to a pattern that is to be created in a target portion of the substrate.
  • FIG. 1 schematically depicts a lithographic apparatus LA.
  • the lithographic apparatus LA includes an illumination system (also referred to as illuminator) IL configured to condition a radiation beam B (e.g., UV radiation, DUV radiation or EUV radiation), a mask support (e.g., a mask table) MT constructed to support a patterning device (e.g., a mask) MA and connected to a first positioner PM configured to accurately position the patterning device MA in accordance with certain parameters, a substrate support (e.g., a wafer table) WT constructed to hold a substrate (e.g., a resist coated wafer) W and connected to a second positioner PW configured to accurately position the substrate support in accordance with certain parameters, and a projection system (e.g., a refractive projection lens system) PS configured to project a pattern imparted to the radiation beam B by patterning device MA onto a target portion C (e.g., comprising one or more dies) of the substrate W.
  • a radiation beam B e.g., UV radiation, D
  • the illumination system IL receives a radiation beam from a radiation source SO, e.g. via a beam delivery system BD.
  • the illumination system IL may include various types of optical components, such as refractive, reflective, magnetic, electromagnetic, electrostatic, and/or other types of optical components, or any combination thereof, for directing, shaping, and/or controlling radiation.
  • the illuminator IL may be used to condition the radiation beam B to have a desired spatial and angular intensity distribution in its cross section at a plane of the patterning device MA.
  • projection system PS used herein should be broadly interpreted as encompassing various types of projection system, including refractive, reflective, catadioptric, anamorphic, magnetic, electromagnetic and/or electrostatic optical systems, or any combination thereof, as appropriate for the exposure radiation being used, and/or for other factors such as the use of an immersion liquid or the use of a vacuum. Any use of the term “projection lens” herein may be considered as synonymous with the more general term “projection system” PS.
  • the lithographic apparatus LA may be of a type wherein at least a portion of the substrate may be covered by a liquid having a relatively high refractive index, e.g., water, so as to fill a space between the projection system PS and the substrate W – which is also referred to as immersion lithography. More information on immersion techniques is given in US6952253, which is incorporated herein by reference.
  • the lithographic apparatus LA may also be of a type having two or more substrate supports WT (also named “dual stage”).
  • the substrate supports WT may be used in parallel, and/or steps in preparation of a subsequent exposure of the substrate W may be carried out on the substrate W located on one of the substrate support WT while another substrate W on the other substrate support WT is being used for exposing a pattern on the other substrate W.
  • Company Secret [00020]
  • the lithographic apparatus LA may comprise a measurement stage.
  • the measurement stage is arranged to hold a sensor and/or a cleaning device.
  • the sensor may be arranged to measure a property of the projection system PS or a property of the radiation beam B.
  • the measurement stage may hold multiple sensors.
  • the cleaning device may be arranged to clean part of the lithographic apparatus, for example a part of the projection system PS or a part of a system that provides the immersion liquid.
  • the measurement stage may move beneath the projection system PS when the substrate support WT is away from the projection system PS.
  • the radiation beam B is incident on the patterning device, e.g. mask, MA which is held on the mask support MT, and is patterned by the pattern (design layout) present on patterning device MA. Having traversed the mask MA, the radiation beam B passes through the projection system PS, which focuses the beam onto a target portion C of the substrate W.
  • the substrate support WT can be moved accurately, e.g., so as to position different target portions C in the path of the radiation beam B at a focused and aligned position.
  • the first positioner PM and possibly another position sensor may be used to accurately position the patterning device MA with respect to the path of the radiation beam B.
  • Patterning device MA and substrate W may be aligned using mask alignment marks M1, M2 and substrate alignment marks P1, P2.
  • the substrate alignment marks P1, P2 as illustrated occupy dedicated target portions, they may be located in spaces between target portions.
  • Substrate alignment marks P1, P2 are known as scribe-lane alignment marks when these are located between the target portions C.
  • the devices in the lithocell which are often also collectively referred to as the track, are typically under the control of a track control unit TCU that in itself may be controlled by a supervisory control system SCS, which may also control the lithographic apparatus LA, e.g. via lithography control unit LACU.
  • a supervisory control system SCS which may also control the lithographic apparatus LA, e.g. via lithography control unit LACU.
  • inspection tools may be included in the lithocell LC.
  • the inspection apparatus may measure the properties on a latent image (image in a resist layer after the exposure), or on a semi-latent image (image in a resist layer after a post-exposure bake step PEB), or on a developed resist image (in which the exposed or unexposed parts of the resist have been removed), or even on an etched image (after a pattern transfer step such as etching).
  • a latent image image in a resist layer after the exposure
  • PEB post-exposure bake step
  • a developed resist image in which the exposed or unexposed parts of the resist have been removed
  • an etched image after a pattern transfer step such as etching.
  • the patterning process in a lithographic apparatus LA is one of the most critical steps in the processing which requires high accuracy of dimensioning and placement of structures on the substrate W.
  • three systems may be combined in a so called “holistic” control environment as schematically depicted in Figure 3.
  • the lithographic apparatus LA which is (virtually) connected to a metrology tool MET (a second system) and to a computer system CL (a third system).
  • the key of such “holistic” environment is to optimize the cooperation between these three systems to enhance the overall process window and provide tight control loops to ensure that the patterning performed by the lithographic apparatus LA stays within a process window.
  • the process window defines a range of process parameters (e.g. dose, focus, overlay) within which a specific manufacturing process yields a defined result (e.g. a functional semiconductor device) – typically within which the process parameters in the lithographic process or patterning process are allowed to vary.
  • the computer system CL may use (part of) the design layout to be patterned to predict which resolution enhancement techniques to use and to perform computational lithography simulations and calculations to determine which mask layout and lithographic apparatus settings achieve the largest overall process window of the patterning process (depicted in Figure 3 by the double arrow in the first scale SC1).
  • the resolution enhancement techniques are arranged to match the patterning possibilities of the lithographic apparatus LA.
  • the computer system CL may also be used to detect where within the process window the lithographic apparatus LA is currently operating (e.g. using input from the metrology tool MET) to predict whether defects may be present due to e.g. sub-optimal processing (depicted in Figure 3 by the arrow pointing “0” in the second scale SC2).
  • the metrology tool MET may provide input to the computer system CL to enable accurate simulations and predictions, and may provide feedback to the lithographic apparatus LA to identify possible drifts, e.g. in a calibration status of the lithographic apparatus LA (depicted in Figure 3 by the multiple arrows in the third scale SC3).
  • Company Secret [00028] In lithographic processes, it is desirable to make frequently measurements of the structures created, e.g., for process control and verification. Various tools for making such measurements are known, including scanning electron microscopes or various forms of metrology apparatuses, such as scatterometers.
  • Examples of known scatterometers often rely on provision of dedicated metrology targets, such as underfilled targets (a target, in the form of a simple grating or overlapping gratings in different layers, that is large enough that a measurement beam generates a spot that is smaller than the grating) or overfilled targets (whereby the illumination spot partially or completely contains the target).
  • underfilled targets a target, in the form of a simple grating or overlapping gratings in different layers, that is large enough that a measurement beam generates a spot that is smaller than the grating
  • overfilled targets whereby the illumination spot partially or completely contains the target.
  • the use of metrology tools for example an angular resolved scatterometer illuminating an underfilled target, such as a grating, allows the use of so-called reconstruction methods where the properties of the grating can be calculated by simulating interaction of scattered radiation with a mathematical model of the target structure and comparing the simulation results with those of a measurement.
  • Scatterometers are versatile instruments which allow measurements of the parameters of a lithographic process by having a sensor in the pupil or a conjugate plane with the pupil of the objective of the scatterometer, measurements usually referred as pupil based measurements, or by having the sensor in the image plane or a plane conjugate with the image plane, in which case the measurements are usually referred as image or field based measurements.
  • Such scatterometers and the associated measurement techniques are further described in patent applications US20100328655, US2011102753A1, US20120044470A, US20110249244, US20110026032 or EP1,628,164A, incorporated herein by reference in their entirety.
  • Aforementioned scatterometers ca measure in one image multiple targets from multiple gratings using light from soft x-ray and visible to near-IR wave range.
  • a metrology apparatus such as a scatterometer, is depicted in Figure 4. It comprises a broadband (white light) radiation projector 2 which projects radiation 5 onto a substrate W. The reflected or scattered radiation 10 is passed to a spectrometer detector 4, which measures a spectrum 6 (i.e. a measurement of intensity I as a function of wavelength ⁇ ) of the specular reflected radiation 10. From this data, the structure or profile 8 giving rise to the detected spectrum may be reconstructed by processing unit PU, e.g. by Rigorous Coupled Wave Analysis and non-linear regression or by comparison with a library of simulated spectra.
  • processing unit PU e.g. by Rigorous Coupled Wave Analysis and non-linear regression or by comparison with a library of simulated spectra.
  • the scatterometer MT is an angular resolved scatterometer.
  • reconstruction methods may be applied to the measured signal to reconstruct or calculate properties of the grating.
  • Such reconstruction may, for example, result from simulating interaction of Company Secret scattered radiation with a mathematical model of the target structure and comparing the simulation results with those of a measurement.
  • the scatterometer MT is an ellipsometric scatterometer.
  • the ellipsometric scatterometer allows for determining parameters of a lithographic process by measuring scattered radiation for each polarization states.
  • Such metrology apparatus emits polarized light (such as linear, circular, or elliptic) by using, for example, appropriate polarization filters in the illumination section of the metrology apparatus.
  • a source suitable for the metrology apparatus may provide polarized radiation as well.
  • the scatterometer MT is adapted to measure the overlay of two misaligned gratings or periodic structures by measuring asymmetry in the reflected spectrum and/or the detection configuration, the asymmetry being related to the extent of the overlay.
  • the two (typically overlapping) grating structures may be applied in two different layers (not necessarily consecutive layers), and may be formed substantially at the same position on the wafer.
  • the scatterometer may have a symmetrical detection configuration as described e.g. in co-owned patent application EP1,628,164A, such that any asymmetry is clearly distinguishable. This provides a straightforward way to measure misalignment in gratings. Further examples for measuring overlay error between the two layers containing periodic structures as target is measured through asymmetry of the periodic structures may be found in PCT patent application publication no. WO 2011/012624 or US patent application US 20160161863, incorporated herein by reference in its entirety. Other parameters of interest may be focus and dose.
  • Focus and dose may be determined simultaneously by scatterometry (or alternatively by scanning electron microscopy) as described in US patent application US2011- 0249244, incorporated herein by reference in its entirety.
  • the targets may be measured in an underfilled mode or in an overfilled mode. In the underfilled mode, the measurement beam generates a spot that is smaller than the overall target. In the overfilled mode, the measurement beam generates a spot that is larger than the overall target. In such overfilled mode, it may also be possible to measure different targets simultaneously, thus determining different processing parameters at the same time.
  • Company Secret [00036] Overall measurement quality of a lithographic parameter using a specific target is at least partially determined by the measurement recipe used to measure this lithographic parameter.
  • Figure 5(a) presents an embodiment of a metrology apparatus and, more specifically, a dark field scatterometer.
  • a target T and diffracted rays of measurement radiation used to illuminate the target are illustrated in more detail in Figure 5(b).
  • the metrology apparatus illustrated is of a type known as a dark field metrology apparatus.
  • the metrology apparatus may be a stand-alone device or incorporated in either the lithographic apparatus LA, e.g., at the measurement station, or the lithographic cell LC.
  • An optical axis, which has several branches throughout the apparatus, is represented by a dotted line O.
  • light emitted by source 11 is directed onto substrate W via a beam splitter 15 by an optical system comprising lenses 12, 11 and objective lens 16.
  • lenses 12, 11 and objective lens 16 are arranged in a double sequence of a 4F arrangement.
  • a different lens arrangement can be used, provided that it still provides a substrate image onto a detector, and simultaneously allows for access of an intermediate pupil-plane for spatial-frequency filtering. Therefore, the angular range at which the radiation is incident on the substrate can be selected by defining a spatial intensity distribution in a plane that presents the spatial spectrum of the substrate plane, here referred to as a (conjugate) pupil plane or angularly resolved plane.
  • aperture plate 13 of suitable form between lenses 12 and 11, in a plane which is a back-projected image of the objective lens pupil plane.
  • aperture plate 13 has different forms, labeled 13N and 13S, allowing different illumination modes to be selected.
  • the illumination system in the present examples forms an off-axis illumination mode.
  • aperture plate 13N provides off-axis from a direction designated, for the sake of description only, as ‘north’.
  • aperture plate 13S is used to provide similar illumination, but from an opposite direction, labeled ‘south’.
  • Other modes of illumination are possible by using different apertures.
  • the aperture in plate 13 has a finite width (necessary to admit a useful quantity of light, the incident rays I will in fact occupy a range of angles, and the diffracted rays 0 and +1/-1 will be spread out somewhat. According to the point spread function of a small target, each order +1 and -1 will be further spread over a range of angles, not a single ideal ray as shown. Note that the grating pitches of the targets and the illumination angles can be designed or adjusted so that the first order rays entering the objective lens are closely aligned with the central optical axis. The rays illustrated in Figure 5(a) and 5(b) are shown somewhat off axis, purely to enable them to be more easily distinguished in the diagram.
  • both the first and second illumination modes are illustrated, by designating diametrically opposite apertures labeled as north (N) and south (S).
  • N north
  • S south
  • the incident ray I of measurement radiation is from the north side of the optical axis, that is when the first illumination mode is applied using aperture plate 13N
  • the +1 diffracted rays which are labeled +1(N)
  • the second illumination mode is applied using aperture plate 13S
  • the -1 diffracted rays (labeled 1(S)) are the ones which enter the lens 16.
  • a second beam splitter 17 divides the diffracted beams into two measurement branches.
  • optical system 18 forms a diffraction spectrum (pupil plane image) of the target on first sensor 19 (e.g. a CCD or CMOS sensor) using the zeroth and first order diffractive beams. Each diffraction order hits a different point on the sensor, so that image processing can compare and contrast orders.
  • the pupil plane image captured by sensor 19 can be used for focusing the metrology apparatus and/or normalizing intensity measurements of the first order beam.
  • the pupil plane image can also be used for many measurement purposes such as reconstruction.
  • optical system 20, 22 forms an image of the target T on sensor 23 (e.g.
  • an aperture stop 21 is provided in a plane that is conjugate to the pupil-plane.
  • Aperture stop 21 functions to block the zeroth order diffracted beam so that the image of the target formed on sensor 23 is formed only from the -1 or +1 first order beam.
  • the images captured by sensors 19 and 23 are output to processor PU which processes the image, the function of which will depend on the particular type of measurements being performed. Note that the term ‘image’ is used here in a broad sense. An image of the grating lines as such will not be formed, if only one of the -1 and +1 orders is present. [00042]
  • the particular forms of aperture plate 13 and field stop 21 shown in Figure 5 are purely examples.
  • the aperture plate 13 may comprise a number of aperture patterns formed around a disc, which rotates to bring a desired pattern into place. Note that aperture plate 13N or 13S can only be used to measure gratings oriented in one direction (X or Y depending on the set-up).
  • a metrology device may comprise a holographic microscope such as a digital holographic microscope (DHM) or digital dark-field holographic microscope.
  • a holographic microscope such as a digital holographic microscope (DHM) or digital dark-field holographic microscope.
  • light may be used to create an image (e.g., at one or both of an image plane or pupil plane/angularly resolved plane) of a structure on a substrate.
  • Such tools may measure the intensity or amplitude (or related measurement parameter such as diffraction efficiency) of the detected light, e.g., after having been scattered by the structure, and use this to determine one or more parameters of interest of the structure.
  • it may be beneficial to know the complex field (i.e., amplitude and phase) of the light scattered by the structure.
  • There are a number of present methods which enable the phase to be determined, in addition to the measured intensity/amplitude.
  • Another known method comprises performing multiple measurements under various conditions (e.g., different focus levels) and reconstructing the complex field of the scattered light using an iterative algorithm (e.g. as described in WO2021/121733, incorporated herein by reference).
  • an iterative algorithm e.g. as described in WO2021/121733, incorporated herein by reference.
  • such methods are computationally very demanding/expensive and can be slow as a consequence, particularly as the accuracy of the retrieved phase is required to be higher in metrology than for more conventional phase retrieval applications such as microscopy and which require only the formation of an image.
  • the (one-dimensional) Kramers-Kronig expression(s), expressed in terms of Fourier transforms, may be extended into a two-dimensional analysis; i.e., the two dimensions of the pupil plane/image plane.
  • Applying the Kramers-Kronig relationship to non-iteratively extract phase information, and therefore the full field requires applying the phase extraction algorithm to an intensity image which is the result of an optical field having a single-sided spectrum.
  • this may be achieved by filtering out one side of spectrum (e.g., with respect to the specular beam) using a physical mask within the pupil plane.
  • such Kramers-Kronig based methods are typically employed in combination with the use of coherent illumination, e.g., for performing microscopy.
  • coherent illumination e.g., for performing microscopy.
  • illumination which is not coherent, e.g., partial coherent radiation.
  • Figure 6 illustrates the difference between ( Figure 6(a)) using a coherent illumination beam 600 and ( Figure 6(b)) using a partial coherent illumination beam 620.
  • the proposed method comprises properly selecting wavelength and target pitch (e.g., ⁇ /p ratio) to enable suitable reconstruction of the electric field.
  • the concepts herein take advantage of the fact that diffraction based metrology techniques such as DBO/DBF do not require a faithful reconstruction of the full pupil, which is in contrast to microscopy. Misalignment of (part of) the illumination beam with respect to the mask, which is the case when a partial coherent illumination spot of finite size is used, is acceptable provided that the reconstruction error term that is introduced does not overlap in the pupil plane with the desired diffraction orders (i.e., does not overlap with the pupil region where the desired diffraction orders, e.g., +1/-1 orders, are located and where a region of interest may be defined).
  • a diffraction based metrology setup such as illustrated in Figure 5(a)
  • the setup uses partial coherent illumination and the spatial pattern of the light propagating through the illumination and detection pupil planes can be controlled with apertures.
  • the target creates several diffraction orders, at least some of which may be used for parameter of interest inference (diffraction orders of interest).
  • the method may comprise defining a region of interest in a region at least partially comprising at least portions of each of the relevant diffraction orders in the detection pupil plane.
  • the region of interest may be a non-contiguous region (e.g., multiple sub-regions) defining a subset of the full available detection NA, such that the size of each of these sub-regions in the relevant dimension NA ⁇ .
  • the relevant direction means that the size of the sub-region in the ⁇ ⁇ direction for a Company Secret sub-region of interest comprising (at least a portion of) a diffraction order from an X-grating or X- oriented sub-target and size of the sub-region in the ⁇ ⁇ direction for a sub-region of interest comprising (at least a portion of) a diffraction order from a Y-grating or Y-oriented sub-target, where ⁇ , ⁇ is the pupil plane coordinate system corresponding to the substrate plane coordinate system X,Y).
  • the diffracted radiation i.e., the wanted diffracted orders
  • the relevant phase can be retrieved.
  • Misalignment of the specular beam with respect to the mask introduces (in general) a different type of error in the reconstructed field: it results in an error in the reconstructed part of the field which is localized in the pupil at the lower relative spatial frequencies
  • the region of interest is at a relative spatial frequency that is higher than the extent of this error, this part of the optical field can still be correctly reconstructed.
  • the reconstructed field there is an ambiguity of the global linear phase in the field plane. The reason for this is that there may be two fields that differ only by a global linear phase gradient and would result in the same intensity image.
  • the reconstruction effectively places the specular reflection on the center (origin) of the reconstructed pupil, with the diffraction orders at ⁇ / ⁇ away from the origin.
  • the reconstruction may be considered to be a reconstruction of ⁇ , ⁇ rather than ⁇ , ⁇ ; i.e., the pupil positions relative to the specular reflection.
  • This has the advantage that for partial coherent illumination, all different mutually incoherent regions in the illumination spot are mapped onto each other in the origin of the reconstruction and the resulting diffraction orders of each of the mutually incoherent regions all land at ⁇ / ⁇ .
  • Figures 7 and 8 illustrate this concept.
  • Figure 7(a) shows a schematic spectrum of an optical field ⁇ ! " and
  • Figure 7(b) shows the reconstructed field ⁇ #$% !
  • a mask may be applied (or more typically is already present) in detection pupil plane, having a position such that the maximum distance between the mask and any part of the specular reflection regions is ⁇ NA ⁇ / ⁇ .
  • This mask may be defined by the extent of the detection NA (i.e., a detection pupil stop and/or an edge (extent) of an optical directing element such as a quadrant edge of an optical four-fold wedge element).
  • the relevant mask edge for this definition may comprise the nearest mask edge to the (e.g., respective) specular component, e.g., in the relevant measurement direction (e.g., in the kx direction when measuring X oriented targets and/or in the k y direction when measuring Y oriented targets).
  • the 4 ratio should be sufficiently greater than the minimum ROI parameter
  • the target comprises multiple pitches (e.g., varies with the target length), ⁇ is the largest pitch.
  • a non-iterative phase retrieval is performed on the measured data to reconstruct an optical field ⁇ #$% ⁇ ⁇ " corresponding to the pupil plane.
  • the region of interest is cropped from the reconstructed field to create local reconstructed field ⁇ #89 #$% ⁇ " (e.g., comprising one or more, optionally non-contiguous, local reconstructed sub-fields).
  • the local reconstructed field ⁇ # # $ 8 % 9 ⁇ ⁇ " can then be manipulated as desired.
  • digital processing e.g., digital correction and/or filtering
  • Such digital processing may correct for optical aberration within the metrology optics.
  • such digital processing may correct for and/or reduce the impact of optical crosstalk from neighboring structures on the inferred parameter of interest.
  • the parameter of interest may be determined from the digitally processed local reconstructed field.
  • This step may comprise (digitally) reimaging the local reconstructed field ⁇ # # $ 8 % 9 ⁇ ⁇ " (e.g., comprising sub-fields corresponding to each diffraction order of interest, such as a pair of complementary diffraction orders, e.g., +1/-1 diffraction orders (optionally a pair of complementary diffraction orders per X and Y direction of the substrate plane)).
  • the parameter of interest may then be Company Secret determined (e.g., optionally per direction) from a comparison or difference of the diffraction order of each pair (e.g., comparing the +1 order and -1 order).
  • the region of interest may comprise multiple non-contiguous sub-regions of equal area, or at least the sub-regions corresponding to each diffraction order of each complementary pair of diffraction orders (i.e., sub-regions per measurement direction), may be of equal area. This may be beneficial as the parameter of interest may be inferred from a comparison of the diffraction orders of each complementary pair of diffraction orders. As an alternative, a single contiguous ROI may be defined which covers at least a portion of the diffraction orders of interest.
  • each sub region or the single contiguous region may comprise the same amount, or same area of each diffraction order of interest or of each diffraction order of interest per measurement direction (purely for example, each sub region may comprise a third, or a half of each diffraction order).
  • a contiguous region or each sub region may comprise corresponding portions of each diffraction order (further optionally only per measurement direction).
  • a different ROI may be defined for e.g. steps 950 and 960 above, with an additional filtering step included (e.g., as part of step 960) to reduce the ROI size.
  • Such a method may maximize the ROI in step 950, and apply additional digital filtering in step 960 to potentially reduce the ROI (e.g., reduce one or more of the sub-regions or reduce the amount of diffraction order covered for one or more of the diffraction orders of interest).
  • different sized sub-regions may be defined for the different measurement directions X, Y, or a single contiguous ROI may cover different sized regions of the X- diffraction orders of interest and the Y-diffraction orders of interest.
  • the dual-beam phase transfer function may be averaged over the angular range of the source size within the illumination NA. Where there is any such angular dependence of the 1st order response, the situation is more difficult, and requires some prior knowledge of the angular dependencies. Such corrections be impractical from a metrology point of view.
  • suitable algorithms for the phase retrieval at step 940 may be found in (or adapted from), for example, a number of publications such as, for example: Nakajima, N., and T. Asakura. Two- dimensional phase retrieval using the logarithmic Hilbert transform and the estimation technique of zero information.
  • the (averaged) electric phase may be reconstructed from its modulus
  • as: @ argDE ⁇ FG ⁇ #$% !H I ⁇ F Ksgn ⁇ "FN5 K@ ln
  • An illumination mode selector module is a form of spatial light modulation device or spatial light configuration device which enables control/configuration of the spatial pattern of the illumination pupil (i.e., the illumination configuration).
  • a four-fold wedge element may be used to split the field into four and direct radiation incident on each quadrant to a different part of the detector.
  • Such a four-fold wedge element is well known for enabling simultaneous acquisition of +1 and -1 diffraction orders for both X and Y directions from illumination in two opposite directions, in combination with illumination from two diagonally opposed quadrants, in present dark-field ⁇ DBO/DBF (micro-DBO/DBF) metrology.
  • Figure 10(a) shows a typical pupil arrangement for employing non-iterative phase retrieval (Kramers–Kronig phase retrieval) using such a metrology apparatus.
  • the illumination is such that the specular beams 1000 are aligned with the mask edge 1005 (i.e., the extent of the detection NA e.g., as defined by a detection pupil stop) such that half of each specular beam 1000 is blocked.
  • the mask edge 1005 i.e., the extent of the detection NA e.g., as defined by a detection pupil stop
  • One each of the +1X diffraction order 1010, -1X diffraction order 1015, +1Y diffraction order 1020 and -1Y diffraction order 1025 is captured within the detection NA 1005.
  • Such an arrangement requires coherent illumination.
  • FIG. 10(b) shows a possible detection pupil arrangement according to concepts disclosed herein.
  • the illumination may be configured such that the specular beams 1000’ are close to the pupil edge 1005, but fall (e.g., entirely) inside the detection NA.
  • Each illumination beam comprises multiple mutually incoherent regions, as indicated by the different shapes inside the specular beam 1000’ (two shapes per beam are shown being indicative of two arbitrary points per beam).
  • the furthest extent of each specular beam 1000’ from the pupil edge 1005 (note that an edge in this context may comprise the pupil edge and therefore may be curved) is at a distance ⁇ NA ⁇ / ⁇ .
  • an illumination configuration or aperture may be selected comprising openings correspondingly close to the edge of the illumination pupil as the specular beams are to the edge of detection pupil 1005.
  • a wedge optic with edges 1030, may be used to image each quadrant into a separate image on the camera. The distance between the illumination spot and the edges of the wedge optic defines an effective maximum NA ⁇ / ⁇ . Also shown are the diffraction orders of interest 1010’, 1015’, 1020’, 1025’, each shown with the corresponding (arbitrary) points indicated as its respective specular beam 1000’.
  • Figure 11 shows a representation of the reconstructed pupil for the combined two fields represented in Figure 10(b).
  • a sub-region of interest ROI having a dimension (second distance) NA ⁇ in the relevant measurement direction may be defined around each reconstructed diffraction order 1110’, 1115’ 1120’ 1125’ (corresponding respectively to diffraction orders 1010’, 1015’, 1020’, 1025’ in Figure 10(b)).
  • a lower limit of the wavelength-over-pitch ratio ⁇ /p may be defined as: ⁇ Company Secret or advantageously: ⁇ ⁇ > ⁇ NA ⁇ + NA ⁇ /2
  • an upper limit pitch ratio ⁇ /p may be defined to ensure that the desired diffraction orders 1010’, 1015’, 1020’, 1025’, including an associated sub-region of interest ROI fall inside the same quadrant within the detection pupil as the specular reflections 1000: ⁇ ⁇ ⁇ NA ⁇ or advantageously: ⁇ ⁇ ⁇ NA ⁇ ⁇ NA ⁇ /2 [00091]
  • NA ⁇ is the effective numerical aperture of the detection branch (taken into account any masking elements such as the wedge optic)
  • NA ⁇ is the extent of the respective sub-region of interest in the relevant measurement direction (e.g., kx for
  • each ROI sub-region may be chosen to be centered on its respective diffraction order such that
  • ⁇ NA ⁇ /2 ⁇ and
  • +NA ⁇ /2 ⁇ .
  • the wavelength-over-pitch ratio ⁇ /p range may be defined as: ⁇ ⁇ ⁇ ⁇ ⁇ NA + NA 2 ⁇ ⁇ ⁇ NA ⁇ ⁇ NA ⁇ /2 This range is represented as the area between the dotted circles on Figure 11.
  • the boundaries separating the quadrants of the four-fold wedge element may comprise a finite extent (or ‘dead-zone’) due to manufacturing and optical safety margins, which would result in some of the diffraction order radiation being blocked.
  • the illumination spots may be extended to be significantly wider than this ‘dead-zone’, such that the diffraction orders extend sufficiently outside of it.
  • the parameter ⁇ 67 ;,/; may differ from that illustrated in Figure 10(b), in that it may be reduced by half the width of the dead-zone (the dead-zone will be centered on each edge 1030), i.e., it will be the difference of the furthest extent of the partial coherent specular beam with respect to the beginning of this dead-zone (the beginning of the dead-zone being the effective mask edge).
  • these additional dark-field measurements may be used to complement the bright-field measurements which are the main subject of this specification, thereby increasing measurement robustness.
  • the concepts herein have been described in relation to bright-field metrology, the concepts described can be applied equally to dark-field metrology, where the specular radiation is blocked.
  • Using the concepts disclosed herein it is possible to perform non-iterative phase retrieval using partial coherent illumination. This opens the applicability of such methods to a broader range of light sources, such as the ones currently used in many metrology devices.
  • An additional benefit is that it provides for a more relaxed alignment condition of the specular reflection with respect to the mask, allowing for a more robust practical implementation of the technique.
  • FIG 12 is a block diagram that illustrates a computer system 1100 that may assist in implementing the methods and flows disclosed herein.
  • Computer system 1100 includes a bus 1102 or other communication mechanism for communicating information, and a processor 1104 (or multiple processors 1104 and 1105) coupled with bus 1102 for processing information.
  • Computer system 1100 also includes a main memory 1106, such as a random access memory (RAM) or other dynamic storage device, coupled to bus 1102 for storing information and instructions to be executed by processor 1104.
  • main memory 1106 such as a random access memory (RAM) or other dynamic storage device
  • Main memory 1106 also may be used for storing temporary variables or other intermediate information during execution of instructions to be executed by processor 1104.
  • Computer system 1100 further includes a read only memory (ROM) 1108 or other static storage device coupled to bus 1102 for storing static information and instructions for processor 1104.
  • ROM read only memory
  • a storage device 1110 such as a magnetic disk or optical disk, is provided and coupled to bus 1102 for storing information and instructions.
  • Computer system 1100 may be coupled via bus 1102 to a display 1112, such as a cathode ray tube (CRT) or flat panel or touch panel display for displaying information to a computer user.
  • An input device 1114 is coupled to bus 1102 for communicating information and command selections to processor 1104.
  • cursor control 1116 such as a mouse, a trackball, or cursor direction keys for communicating direction information and command selections to processor 1104 and for controlling cursor movement on display Company Secret 1112.
  • This input device typically has two degrees of freedom in two axes, a first axis (e.g., x) and a second axis (e.g., y), that allows the device to specify positions in a plane.
  • a touch panel (screen) display may also be used as an input device.
  • One or more of the methods as described herein may be performed by computer system 1100 in response to processor 1104 executing one or more sequences of one or more instructions contained in main memory 1106.
  • Such instructions may be read into main memory 1106 from another computer- readable medium, such as storage device 1110.
  • Execution of the sequences of instructions contained in main memory 1106 causes processor 1104 to perform the process steps described herein.
  • processors in a multi-processing arrangement may also be employed to execute the sequences of instructions contained in main memory 1106.
  • hard-wired circuitry may be used in place of or in combination with software instructions.
  • the description herein is not limited to any specific combination of hardware circuitry and software.
  • the term “computer-readable medium” as used herein refers to any medium that participates in providing instructions to processor 1104 for execution. Such a medium may take many forms, including but not limited to, non-volatile media, volatile media, and transmission media.
  • Non-volatile media include, for example, optical or magnetic disks, such as storage device 1110.
  • Volatile media include dynamic memory, such as main memory 1106.
  • Transmission media include coaxial cables, copper wire and fiber optics, including the wires that comprise bus 1102. Transmission media can also take the form of acoustic or light waves, such as those generated during radio frequency (RF) and infrared (IR) data communications.
  • RF radio frequency
  • IR infrared
  • Computer-readable media include, for example, a floppy disk, a flexible disk, hard disk, magnetic tape, any other magnetic medium, a CD-ROM, DVD, any other optical medium, punch cards, paper tape, any other physical medium with patterns of holes, a RAM, a PROM, and EPROM, a FLASH-EPROM, any other memory chip or cartridge, a carrier wave as described hereinafter, or any other medium from which a computer can read.
  • Various forms of computer readable media may be involved in carrying one or more sequences of one or more instructions to processor 1104 for execution. For example, the instructions may initially be borne on a magnetic disk of a remote computer.
  • the remote computer can load the instructions into its dynamic memory and send the instructions over a telephone line using a modem.
  • a modem local to computer system 1100 can receive the data on the telephone line and use an infrared transmitter to convert the data to an infrared signal.
  • An infrared detector coupled to bus 1102 can receive the data carried in the infrared signal and place the data on bus 1102.
  • Bus 1102 carries the data to main memory 1106, from which processor 1104 retrieves and executes the instructions.
  • the instructions received by main memory 1106 may optionally be stored on storage device 1110 either before or after execution by processor 1104.
  • Computer system 1100 also preferably includes a communication interface 1118 coupled to bus 1102.
  • Communication interface 1118 provides a two-way data communication coupling to a network link 1120 that is connected to a local network 1122.
  • communication interface Company Secret 1118 may be an integrated services digital network (ISDN) card or a modem to provide a data communication connection to a corresponding type of telephone line.
  • ISDN integrated services digital network
  • communication interface 1118 may be a local area network (LAN) card to provide a data communication connection to a compatible LAN.
  • LAN local area network
  • Wireless links may also be implemented.
  • communication interface 1118 sends and receives electrical, electromagnetic or optical signals that carry digital data streams representing various types of information.
  • Network link 1120 typically provides data communication through one or more networks to other data devices.
  • a metrology method comprising: obtaining metrology data relating to a measurement obtained by illuminating a periodic structure comprising at least one pitch with partial coherent illumination comprising a wavelength and capturing the resultant scattered radiation from said periodic structure at a detection plane, said scattered radiation passing through at least one angularly resolved plane between said periodic structure and detection plane, said angularly resolved plane comprising at least one mask edge; non-iteratively reconstructing a field of said scattered radiation; using said reconstructed field to determine a parameter of interest of the structure; and in an initial step: selecting said wavelength and a maximum of said at least one pitch such that the wavelength-over- pitch ratio is greater than a first distance in said angularly resolved plane, said first distance comprising the distance between said at least one mask edge and a furthest extent of at least one specular component of the scattered radiation with respect to said mask edge.
  • Company Secret 2 A metrology method as defined in clause 1, wherein the reconstructed field represents an average of individual fields from individual point sources within the partial coherent illumination. 3. A metrology method as defined in clause 1 or 2, wherein said selecting said wavelength and pitch further comprises: selecting an illumination configuration and therefore said first distance in addition to said wavelength and pitch such that the wavelength-over-pitch ratio is greater than the first distance in said angularly resolved plane. 4.
  • a metrology method as defined in any preceding clause comprising defining a region of interest within said angularly resolved plane, said region of interest comprising at least a portion of each diffraction order of a plurality of diffraction orders of interest comprised within said captured scattered radiation, said plurality of diffraction orders of interest comprising at least one complementary pair of diffraction orders. 5.
  • a metrology method as defined in clause 4 comprising: reimaging a local reconstructed field, the local reconstructed field comprising said reconstructed field cropped to correspond only to the region of interest; and determining said parameter of interest from the reimaged local reconstructed field. 6.
  • said digital processing comprises digital correction and/or filtering to correct for, reduce and/or remove optical aberration and/or correct for, reduce and/or remove the impact of optical crosstalk.
  • a metrology method as defined in any of clauses 5 to 8 comprising determining said parameter of interest from a comparison of reimaged diffraction orders of each of the at least one complementary pair of diffraction orders, as reimaged from said local reconstructed field. 10.
  • Company Secret 13 A metrology method as defined in clause 12, wherein said selecting step comprises selecting said wavelength and pitch such that the wavelength-over-pitch ratio is smaller than the difference of the available maximum numerical aperture and said second distance. 14.
  • said at least one mask edge comprises at least one edge of a detection pupil stop and/or extent of a detection numerical aperture.
  • said illumination comprises two beams, illumination said structure from two directions 19.
  • a computer program comprising program instructions operable to perform the method of any of clauses 1 to 21, when run on a suitable apparatus.
  • a non-transitory computer program carrier comprising the computer program of clause 23.
  • a processing device comprising: a processor; and the non-transitory computer program carrier of clause 24. 26.
  • a metrology apparatus being operable to perform the method of any of clauses 1 to 22.
  • a metrology apparatus as defined in clause 26 comprising: a substrate holder for holding a substrate; Company Secret projection optics for projecting illumination onto a substrate; a detector for detecting said scattered radiation at a detection plane; and a mask comprising at least one mask edge in an angularly resolved plane between the substrate holder and detector.
  • a metrology apparatus as defined in clause 27 or 28 comprising a detection pupil stop defining an extent of a detection numerical aperture, wherein said at least one mask edge comprises an edge of the detection pupil stop.
  • lithographic apparatus in the manufacture of ICs
  • the lithographic apparatus described herein may have other applications. Possible other applications include the manufacture of integrated optical systems, guidance and detection patterns for magnetic domain memories, flat-panel displays, liquid- crystal displays (LCDs), thin-film magnetic heads, etc.
  • embodiments of the invention may be used in other apparatus.
  • Embodiments of the invention may form part of a mask inspection apparatus, a lithographic apparatus, or any apparatus that measures or processes an object such as a wafer (or other substrate) or mask (or other patterning device).
  • the term “metrology apparatus” may also refer to an inspection apparatus or an inspection system.
  • the inspection apparatus that comprises an embodiment of the invention may be used to detect defects of a substrate or defects of structures on a substrate.
  • a characteristic of interest of the structure on the substrate may relate to defects in the structure, the absence of a specific part of the structure, or the presence of an unwanted structure on the substrate.
  • specific reference is made to “metrology apparatus / tool / system” or “inspection apparatus / tool / system” these terms may refer to the same or similar types of tools, apparatuses or systems.
  • the inspection or metrology apparatus that comprises an embodiment of the invention may be used to determine characteristics of structures on a substrate or on a wafer.
  • the inspection apparatus or metrology apparatus that comprises an embodiment of the invention may be used to detect defects of a substrate or defects of structures on a substrate or on a wafer.
  • a characteristic of interest of the structure on the substrate may relate to defects in the structure, the absence of a specific part of the structure, or the presence of an unwanted structure on the substrate or on the wafer.
  • targets or target structures are metrology target structures specifically designed and formed for the purposes of measurement
  • properties of interest may be measured on one or more structures which are functional parts of devices formed on the substrate.
  • Many devices have regular, grating-like structures.
  • the terms structure, target grating and target structure as used herein do not require that the structure has been provided specifically for the measurement being performed.
  • pitch P of the metrology targets may be close to the resolution limit of the optical system of the scatterometer or may be smaller, but may be much larger than the dimension of typical product features made by lithographic process in the target portions C.

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  • General Physics & Mathematics (AREA)
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Abstract

L'invention concerne un procédé de métrologie qui consiste à : obtenir des données de métrologie relatives à une mesure obtenue par l'illumination d'une structure périodique comprenant au moins un pas avec un éclairage cohérent partiel comprenant une longueur d'onde et capturer le rayonnement diffusé résultant provenant de ladite structure périodique au niveau d'un plan de détection, ledit rayonnement diffusé traversant au moins un plan résolu angulairement entre ladite structure périodique et ledit plan de détection, ledit plan résolu angulairement comprenant au moins un bord de masque ; procéder à la reconstruction non itérative d'un champ dudit rayonnement diffusé ; utiliser ledit champ reconstruit pour déterminer un paramètre d'intérêt de la structure ; et dans une étape initiale : sélectionner ladite longueur d'onde et un maximum dudit ou desdits pas de façon à ce que le rapport longueur d'onde sur pas soit supérieur à une première distance dans ledit plan résolu angulairement.
PCT/EP2025/050280 2024-02-14 2025-01-08 Procédé de métrologie et dispositif de métrologie associé Pending WO2025171949A1 (fr)

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