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WO2025023184A1 - Glass, near-infrared absorption cut-off filter, and solid-state imaging element - Google Patents

Glass, near-infrared absorption cut-off filter, and solid-state imaging element Download PDF

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Publication number
WO2025023184A1
WO2025023184A1 PCT/JP2024/025994 JP2024025994W WO2025023184A1 WO 2025023184 A1 WO2025023184 A1 WO 2025023184A1 JP 2024025994 W JP2024025994 W JP 2024025994W WO 2025023184 A1 WO2025023184 A1 WO 2025023184A1
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WIPO (PCT)
Prior art keywords
glass
mol
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content
viewpoint
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PCT/JP2024/025994
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French (fr)
Japanese (ja)
Inventor
貴尋 坂上
和孝 小野
朋美 安部
正理 渡邊
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AGC Inc
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Asahi Glass Co Ltd
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Publication of WO2025023184A1 publication Critical patent/WO2025023184A1/en
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Classifications

    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00Glass compositions
    • C03C3/12Silica-free oxide glass compositions
    • C03C3/16Silica-free oxide glass compositions containing phosphorus
    • C03C3/17Silica-free oxide glass compositions containing phosphorus containing aluminium or beryllium
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C4/00Compositions for glass with special properties
    • C03C4/08Compositions for glass with special properties for glass selectively absorbing radiation of specified wave lengths
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/20Filters
    • G02B5/22Absorbing filters

Definitions

  • the present invention relates to glass, near-infrared absorption cut filters, and solid-state imaging devices.
  • Luminance correction filters are used in imaging devices that use solid-state imaging elements such as CCDs (Charge Coupled Devices) mounted on mobile devices, personal computers, and cameras such as single-lens reflex cameras. These luminance correction filters can make the colors in photographs closer to the luminosity of humans.
  • CCDs Charge Coupled Devices
  • the above-mentioned visibility correction filter also known as a near-infrared absorbing filter, is required to have the spectral characteristics of absorbing light in the near-infrared range and transmitting light in the visible range. Therefore, the glass used in near-infrared absorbing cut filters often contains Cu ions to absorb light in the near-infrared range.
  • phosphate glass and fluorophosphate glass are examples of such glasses, but phosphate glass tends to have better spectral characteristics.
  • phosphate glass easily reacts with water, is prone to deterioration in high temperature and humidity, and has poor weather resistance. As a result, the film formed on the main surface of the glass is easily peeled off, and the element is easily deteriorated. This is because the P-O-P bonds contained in the phosphate glass are hydrolyzed by water molecules, and the released phosphoric acid floats to the surface of the glass.
  • Non-Patent Document 1 discloses that by adding Al 2 O 3 to phosphate glass, a stronger three-dimensional mesh structure is formed, improving weather resistance.
  • the present invention aims to provide a new glass, such as phosphate glass or fluorophosphate glass, that contains phosphorus and also contains a near-infrared absorbing component and has improved weather resistance, as well as a near-infrared absorbing cut filter and a solid-state imaging device made of the above glass.
  • a new glass such as phosphate glass or fluorophosphate glass, that contains phosphorus and also contains a near-infrared absorbing component and has improved weather resistance, as well as a near-infrared absorbing cut filter and a solid-state imaging device made of the above glass.
  • the present inventors have found that the above-mentioned problems can be solved by controlling the ratio of the H + concentration at the surface of a glass containing phosphorus and a near-infrared absorbing component to the H + concentration at a depth of 100 ⁇ m from the surface of the glass, and have thus completed the present invention.
  • the present invention relates to the following [1] to [14].
  • [1] In mole percent based on oxide, A glass containing 25% or more of P2O5 and 0.5% or more of near- infrared absorbing components in total, A glass in which the ratio of the H + concentration [H + A ] at the surface of the glass to the H + concentration [H + B ] at a depth of 100 ⁇ m from the surface of the glass, expressed as ⁇ [H + A ]/[H + B ] ⁇ , is 2 or less.
  • the near infrared absorbing component contains Cu, The glass according to any one of the above [1] to [6], containing 0.5% or more of CuO in mole percent on an oxide basis.
  • the content in mole percent based on oxide is: P2O5 : 25-80 %, Al 2 O 3 : 1 to 20%, ⁇ R 2 O: 0 to 35% (wherein R represents Li, Na, K, Rb, and Cs); ⁇ R′O: 0 to 30% (wherein R′ represents Mg, Ca, Sr, Ba, and Zn), and CuO: 0.5 to 30%;
  • the ⁇ R 2 O means the total content of Li 2 O, Na 2 O, K 2 O, Cs 2 O, and Rb 2 O;
  • the content in mole percent based on oxide is: P2O5 : 30-50 %, Al 2 O 3 : 1 to 10%, ⁇ R 2 O: 10 to 35% (wherein R represents Li, Na, K, Rb, and Cs); ⁇ R′O: 0 to 10% (wherein R′ means Mg, Ca, Sr, Ba and Zn), CuO: 1-15%, TiO2 : 0-10%, WO 3 : 0 to 10% and Nb 2 O 5 : 0 to 10% are satisfied;
  • the ⁇ R 2 O means the total content of Li 2 O, Na 2 O, K 2 O, Cs 2 O, and Rb 2 O;
  • a new glass having improved weather resistance can be obtained.
  • the weather resistance can be improved by controlling the ratio of the H + concentration at the surface to the H + concentration at a depth of 100 ⁇ m from the glass surface.
  • the glass according to this embodiment contains, in terms of mole percent on an oxide basis, 25% or more of P2O5 and 0.5% or more of near-infrared absorbing components in total.
  • the ratio of the H + concentration [H + A ] at the surface of the glass to the H + concentration [H + B ] at a depth of 100 ⁇ m from the surface of the glass, expressed as ⁇ [H + A ]/[H + B ] ⁇ , is 2 or less.
  • the present inventors have conducted studies to improve the weather resistance of glass containing phosphorus and a near-infrared absorbing component in addition to the addition of Al 2 O 3 , and have found that the weather resistance of the glass is improved by setting the ratio represented by ⁇ [H + A ]/[H + B ] ⁇ to 2 or less.
  • the present inventors have found a glass having a novel composition as described below, in which the ratio represented by ⁇ [H + A ]/[H + B ] ⁇ is equal to or less than 2.
  • the present inventors have found that even in the case of a glass having a conventionally known composition in which the ratio represented by ⁇ [H + A ]/[H + B ] ⁇ exceeds 2, the ratio can be reduced to equal to or less than 2 by carrying out post-treatment, thereby improving weather resistance.
  • the decrease in the transmittance in the near-infrared region and the increase in the transmittance in the visible region due to the change in the valence of this Cu ion are important phenomena, and this makes the glass according to this embodiment suitable for use as a near-infrared absorption cut filter.
  • the ratio represented by ⁇ [H + A ]/[H + B ] ⁇ of the glass according to this embodiment is not more than 2, preferably less than 1, more preferably not more than 0.8, and even more preferably not more than 0.5.
  • the lower limit of the ratio represented by ⁇ [H + A ]/[H + B ] ⁇ is not particularly limited, but is, for example, not less than 0.01.
  • [H + A ] and [H + B ] are determined by secondary ion mass spectrometry (SIMS). Specifically, the H + concentration (cps) is measured from the surface of the glass to a depth of at least 20 ⁇ m using SIMS. The curve obtained from the surface to a depth of 20 ⁇ m is then approximated with a sigmoid curve to obtain the H + concentration [H + A ] (cps) at the surface of the glass and the H + concentration [H + B ] (cps) at a depth of 100 ⁇ m from the surface of the glass. By using this measurement method, [H + B ] can be obtained even if the actual thickness of the glass is less than 100 ⁇ m.
  • SIMS secondary ion mass spectrometry
  • SIMS measurement conditions Equipment: ULVAC-PHI ADEPT1010 Primary ion species: Cs+ Acceleration voltage of primary ions: 5 kV Primary ion current value: 500 nA Incident angle of primary ions: 60° to the normal of the sample surface Primary ion raster size: 300 x 300 ⁇ m 2 Polarity of secondary ions: negative Secondary ion detection area: 60 x 60 ⁇ m 2 (4% of the raster size of primary ions) ESA Input Lens: 0 Use of neutralization gun: Yes Method of converting horizontal axis from sputtering time to depth: The depth of the analyzed crater is measured with a stylus surface profiler (Dektak150, manufactured by Veeco) to determine the sputtering rate of the primary ions.
  • a stylus surface profiler Dektak150, manufactured by Veeco
  • Field axis potential during 1H-detection The optimal value may vary depending on the device. The operator should carefully set the value so that the background is sufficiently cut.
  • the ⁇ -OH value of the glass according to this embodiment is preferably 1 mm ⁇ 1 or less, more preferably 0.8 mm ⁇ 1 or less, even more preferably 0.5 mm ⁇ 1 or less, and still more preferably 0.25 mm ⁇ 1 or less.
  • the ⁇ -OH value in this specification correlates with the amount of water in the glass, and is determined by dividing the absorbance at 3550 cm ⁇ 1 measured by Fourier transform infrared spectroscopy (FT-IR) by the thickness of the glass.
  • FT-IR Fourier transform infrared spectroscopy
  • ⁇ -OH value -(1/d) ⁇ (log 10 (T 1 /T 0 ))
  • the transmittance of the above glass at a wavelength of 550 nm is preferably 70% or more, more preferably 75% or more, even more preferably 80% or more, and even more preferably 85% or more.
  • the transmittance is preferably closer to 100%, but is usually 92% or less.
  • the transmittance of glass is the external transmittance including reflection loss on the front and back surfaces.
  • the transmittance is calculated based on a glass thickness of 0.2 mm.
  • the above conversion can be performed using the following formula.
  • T i2 T i1 t2/t1
  • T i1 the internal transmittance of the measured sample (transmittance excluding reflection loss on the front and back surfaces)
  • T i2 is the internal transmittance after conversion
  • t1 the thickness (mm) of the measured sample
  • t2 is the thickness to be converted, i.e., 0.2 mm in this specification.
  • the conversion from transmittance to internal transmittance is performed using the following formula, assuming that the reflection loss R on the front and back surfaces of the glass is 0.0454, respectively.
  • Internal transmittance external transmittance / ⁇ 100 ⁇ (1-R) 2 ⁇
  • the glass according to this embodiment When used as a near-infrared absorption cut filter, the glass according to this embodiment is required to have high absorption of light in the near-infrared region. Therefore, the transmittance of the above glass at a wavelength of 800 nm is preferably 30% or less, more preferably 25% or less, even more preferably 20% or less, even more preferably 15% or less, and most preferably 10% or less. In addition, the closer the transmittance is to 0%, the more preferable, but it is usually 0.01% or more.
  • the thickness of the glass according to this embodiment is preferably 0.03 to 1 mm. From the viewpoint of obtaining the strength necessary to prevent breakage during manufacture, transportation, installation into a solid-state imaging element, etc., the thickness is preferably 0.03 mm or more, more preferably 0.05 mm or more, even more preferably 0.07 mm or more, and particularly preferably 0.1 mm or more. Furthermore, from the viewpoint of responding to the miniaturization and thinning of devices and equipment incorporating glass, such as solid-state imaging elements, the thickness is preferably 1 mm or less, more preferably 0.8 mm or less, even more preferably 0.6 mm or less, particularly preferably 0.4 mm or less, and most preferably 0.3 mm or less.
  • the glass transition temperature (Tg) of the glass according to this embodiment is preferably 350 to 600°C.
  • the glass transition temperature is preferably 350°C or higher, more preferably 375°C or higher, even more preferably 400°C or higher, and even more preferably 425°C or higher.
  • the glass transition temperature is preferably 600°C or lower, more preferably 575°C or lower, even more preferably 550°C or lower, even more preferably 525°C or lower, and even more preferably 500°C or lower.
  • phosphorus (P) is a network-forming component and a main component necessary for vitrification. It is also a component that enhances the absorbency of light in the near-infrared region.
  • the content of P 2 O 5 in the above glass in terms of mole percent based on oxide is 25% or more, preferably 25 to 80%, and more preferably 30 to 50%.
  • the content of P 2 O 5 is preferably 25% or more, more preferably 28% or more, even more preferably 30% or more, even more preferably 35% or more, particularly preferably 40% or more, and even more preferably 45% or more.
  • the content of P 2 O 5 is preferably 80% or less, more preferably 75% or less, even more preferably 70% or less, even more preferably 65% or less, even more preferably 60% or less, and particularly preferably 50% or less.
  • the glass according to this embodiment contains a component that absorbs light in the near-infrared region, i.e., a near-infrared absorbing component, so that it can be suitably used in near-infrared absorption cut filters and the like.
  • a near-infrared absorbing component is a component whose maximum absorption wavelength is in the range of 700 to 1200 nm.
  • the total content of the near-infrared absorbing components is 0.5% or more, and preferably 0.5 to 30%. From the viewpoint of increasing the absorbency of light in the near-infrared region, the total content is preferably 0.5% or more, more preferably 1% or more, even more preferably 5% or more, and even more preferably 10% or more. From the viewpoint of preventing the precipitation of devitrification inclusions in the glass, the total content is preferably 30% or less, more preferably 26% or less, even more preferably 22% or less, and even more preferably 18% or less.
  • the near infrared absorbing component examples include Cu, Fe, V, etc., and one of these may be used alone or two or more of them may be used in combination. That is, the glass according to this embodiment preferably contains one or more elements selected from the group consisting of Cu, Fe, and V as a near-infrared absorbing component, and more preferably contains at least Cu from the viewpoint of efficiently absorbing light in the near-infrared region.
  • the CuO content expressed in mole percent on an oxide basis is preferably 0.5% or more, and more preferably 0.5 to 30%.
  • the CuO content is preferably 0.5% or more, more preferably 1% or more, even more preferably 5% or more, and even more preferably 10% or more.
  • the CuO content is preferably 30% or less, more preferably 26% or less, even more preferably 22% or less, and even more preferably 18% or less.
  • the ratio represented by ⁇ [H + A ]/[H + B ] ⁇ becomes 2 or less without post-treatment, but there are cases where the ratio does not become 2 or less without post-treatment. Even in such a case, the ratio can be made 2 or less by the post-treatment. Moreover, even in a composition where the ratio becomes 2 or less without post-treatment, the ratio can be made smaller by the post-treatment.
  • the glass according to this embodiment preferably contains one or more elements selected from the group consisting of Ti, W, and Nb.
  • the total content of TiO 2 , WO 3 and Nb 2 O 5 is preferably 5% or more, and more preferably 5 to 30%, expressed in mole % on an oxide basis.
  • the total content is preferably 5% or more, more preferably 7.5% or more, even more preferably 10% or more, and even more preferably 12.5% or more.
  • the total content is preferably 30% or less, more preferably 25% or less, and even more preferably 20% or less.
  • the composition of the glass according to this embodiment preferably satisfies the following contents in mole percent on an oxide basis.
  • P2O5 25-80 %
  • Al 2 O 3 1 to 20%
  • ⁇ R 2 O 0 to 35%
  • R represents Li, Na, K, Rb, and Cs
  • ⁇ R′O 0 to 30%
  • R′ represents Mg, Ca, Sr, Ba and Zn
  • CuO 0.5 to 30%.
  • the ⁇ R 2 O means the total content of Li 2 O, Na 2 O, K 2 O, Cs 2 O, and Rb 2 O
  • the ⁇ R′O means the total content of MgO, CaO, SrO, BaO, and ZnO.
  • the content expressed in mol % on an oxide basis satisfies the following: P2O5 : 30-50 %, Al 2 O 3 : 1 to 10%, ⁇ R 2 O: 10 to 35% (wherein R represents Li, Na, K, Rb, and Cs); ⁇ R′O: 0 to 10% (wherein R′ means Mg, Ca, Sr, Ba and Zn), CuO: 1-15%, TiO2 : 0-10%,
  • the content of WO 3 is 0 to 10%
  • the content of Nb 2 O 5 is 0 to 10%.
  • the ⁇ R 2 O means the total content of Li 2 O, Na 2 O, K 2 O, Cs 2 O, and Rb 2 O
  • the ⁇ R′O means the total content of MgO, CaO, SrO, BaO, and ZnO.
  • the P 2 O 5 , CuO which is one aspect of the near infrared absorbing component, and the total of TiO 2 , WO 3 and Nb 2 O 5 are as described above. The rest of the composition will be described below.
  • Al 2 O 3 is a component for improving weather resistance.
  • the content of Al 2 O 3 is preferably 1 to 20 mol%, more preferably 1 to 10 mol%.
  • the content of Al 2 O 3 is preferably 1 mol% or more, more preferably 2 mol% or more, and even more preferably 3 mol% or more.
  • the content of Al 2 O 3 is preferably 20 mol% or less, more preferably 17 mol% or less, even more preferably 15 mol% or less, and even more preferably 10 mol% or less.
  • R2O is a component that lowers the melting temperature of glass.
  • R represents Li, Na, K, Rb, and Cs
  • ⁇ R2O represents the total amount of Li2O , Na2O , K2O, Rb2O , and Cs2O .
  • ⁇ R 2 O is preferably 0 to 35 mol %, and more preferably 10 to 35 mol %. From the viewpoint of preferably obtaining the above-mentioned effects of R 2 O, when R 2 O is contained, ⁇ R 2 O is preferably 10 mol % or more, more preferably 12 mol % or more, and even more preferably 14 mol % or more. From the viewpoint of suppressing glass instability, ⁇ R 2 O is preferably 35 mol % or less, more preferably 33 mol % or less, and even more preferably 32 mol % or less.
  • R 2 O it is preferable to contain at least one selected from the group consisting of Li 2 O, Na 2 O, and K 2 O, it is more preferable to contain at least one of Li 2 O and Na 2 O, and it is even more preferable to contain Li 2 O. It is also more preferable to contain Li 2 O and Na 2 O.
  • the content of Li 2 O is preferably 0.1 to 15 mol %.
  • the content of Li 2 O when included is preferably 0.1 mol % or more, more preferably 2 mol % or more, even more preferably 4 mol % or more, and even more preferably 6 mol % or more.
  • the content of Li 2 O is preferably 15 mol % or less, more preferably 14 mol % or less, even more preferably 13 mol % or less, and even more preferably 12 mol % or less.
  • the content of Na 2 O is preferably 0.1 to 30 mol %.
  • the content of Na 2 O when included is preferably 0.1 mol % or more, more preferably 5 mol % or more, even more preferably 10 mol % or more, and even more preferably 15 mol % or more.
  • the content of Na 2 O is preferably 30 mol % or less, more preferably 28 mol % or less, even more preferably 26 mol % or less, and even more preferably 24 mol % or less.
  • the content of K 2 O is preferably 0.1 to 20 mol %.
  • the content of K 2 O when included is preferably 0.1 mol % or more, more preferably 4 mol % or more, further preferably 8 mol % or more, and even more preferably 10 mol % or more.
  • the content of K 2 O is preferably 20 mol % or less, more preferably 18 mol % or less, further preferably 16 mol % or less, and even more preferably 14 mol % or less.
  • R'O is a component for increasing the stability of glass and lowering the melting temperature of glass.
  • R' means Mg, Ca, Sr, Ba, and Zn
  • ⁇ R'O means the total amount of MgO, CaO, SrO, BaO, and ZnO.
  • ⁇ R'O is preferably 0 to 30 mol%, and more preferably 0 to 10 mol%.
  • ⁇ R'O in the case where R'O is contained is preferably 2 mol% or more, more preferably 4 mol% or more, and even more preferably 6 mol% or more.
  • ⁇ R'O is preferably 30 mol% or less, more preferably 20 mol% or less, and even more preferably 10 mol% or less.
  • MgO, CaO, and SrO have the effect of increasing the stability of the glass, but are also components that reduce the absorbency of light in the near infrared region.
  • the total content of these components is preferably 20 mol% or less, more preferably 15 mol% or less, and even more preferably 10 mol% or less, and may not be present.
  • BaO has the effect of lowering the melting temperature of the glass, but it is also a component that makes the glass unstable and reduces the absorbency of light in the near infrared region.
  • the BaO content is preferably 0 to 20 mol%.
  • the BaO content is preferably 5 mol% or more, more preferably 10 mol% or more, and even more preferably 15 mol% or more.
  • the BaO content is preferably 20 mol% or less, more preferably 10 mol% or less, and even more preferably 5 mol% or less, and may not be contained.
  • ZnO has the effect of lowering the melting temperature of glass, but is also a component that reduces the solubility of glass.
  • the ZnO content is preferably 0 to 20 mol%. From the viewpoint of suitably lowering the melting temperature of glass, the ZnO content is preferably 1 mol% or more, more preferably 3 mol% or more, and even more preferably 5 mol% or more.
  • the BaO content is preferably 20 mol% or less, more preferably 15 mol% or less, and even more preferably 10 mol% or less.
  • the glass according to this embodiment preferably contains CuO as a near-infrared absorbing component, but may contain a near-infrared absorbing component other than CuO, such as Fe 2 O 3 or V 2 O 5 .
  • the total content of the near-infrared absorbing components including CuO is preferably 0.5 to 30 mol%.
  • the total content is preferably 0.5 mol% or more, more preferably 5 mol% or more, even more preferably 7 mol% or more, and even more preferably 10 mol% or more.
  • the total content is preferably 30 mol% or less, more preferably 27 mol% or less, even more preferably 25 mol% or less, and even more preferably 23 mol% or less.
  • the content of Fe 2 O 3 is preferably 0.5 to 30 mol%.
  • the content of Fe 2 O 3 is preferably 0.5 mol% or more, more preferably 5 mol% or more, even more preferably 7 mol% or more, and even more preferably 10 mol% or more.
  • the content of Fe 2 O 3 is preferably 30 mol% or less, more preferably 27 mol% or less, even more preferably 25 mol% or less, and even more preferably 23 mol% or less.
  • the content of CuO which is a near-infrared absorbing component, is preferably greater than the content of at least one of Fe 2 O 3 and V 2 O 5 , and more preferably greater than the contents of both Fe 2 O 3 and V 2 O 5 .
  • the glass according to this embodiment preferably contains one or more selected from the group consisting of TiO 2 , WO 3 and Nb 2 O 5, from the viewpoint of suitably obtaining the effect of reducing the ratio represented by ⁇ [H + A ]/[H + B ] ⁇ by post-treatment.
  • the content of TiO2 is preferably 0 to 10 mol%.
  • the content of TiO2 is more preferably 1 mol% or more, even more preferably 2 mol% or more, and even more preferably 3 mol% or more.
  • the content of TiO2 is preferably 10 mol% or less, more preferably 9 mol% or less, even more preferably 8 mol% or less, and even more preferably 7 mol% or less.
  • the content of WO3 is preferably 0 to 10 mol%.
  • the content of WO3 is more preferably 1 mol% or more, even more preferably 2 mol% or more, and even more preferably 3 mol% or more.
  • the content of WO3 is preferably 10 mol% or less, more preferably 9 mol% or less, even more preferably 8 mol% or less, and even more preferably 7 mol% or less.
  • the content of Nb 2 O 5 is preferably 0 to 10 mol %. From the viewpoint of more easily obtaining the effect of the post-treatment, the content of Nb 2 O 5 is more preferably 1 mol % or more, even more preferably 2 mol % or more, and even more preferably 3 mol % or more. From the viewpoint of suppressing a decrease in the transmittance in the visible range, the content of Nb 2 O 5 is preferably 10 mol % or less, more preferably 9 mol % or less, even more preferably 8 mol % or less, and even more preferably 7 mol % or less.
  • the glass according to this embodiment may contain, in addition to P 2 O 5 , glass network-forming components such as B 2 O 3 and SiO 2 .
  • the total content of P 2 O 5 , B 2 O 3 and SiO 2 is preferably 25 to 90 mol %. From the viewpoint of suppressing a decrease in the strength of the glass, the total content is more preferably 30 mol % or more, even more preferably 35 mol % or more, and even more preferably 40 mol % or more. From the viewpoint of suppressing an increase in the melting temperature of the glass, the total content is preferably 90 mol % or less, more preferably 80 mol % or less, even more preferably 70 mol % or less, and even more preferably 60 mol % or less.
  • the content of B 2 O 3 is preferably 0 to 30 mol %. From the viewpoint of suppressing a decrease in glass strength, the content of B 2 O 3 is more preferably 1 mol % or more, even more preferably 5 mol % or more, and even more preferably 10 mol % or more. From the viewpoint of suppressing a decrease in weather resistance of the glass, the content of B 2 O 3 is preferably 30 mol % or less, more preferably 25 mol % or less, even more preferably 20 mol % or less, and even more preferably 15 mol % or less.
  • the content of SiO 2 is preferably 0 to 30 mol%.
  • the content of SiO 2 is more preferably 0.5 mol% or more, even more preferably 1 mol% or more, and even more preferably 2 mol% or more.
  • the content of SiO 2 is preferably 30 mol% or less, more preferably 25 mol% or less, even more preferably 20 mol% or less, even more preferably 15 mol% or less, and may not be contained.
  • the glass according to the present embodiment may be a glass containing fluoride, which is called fluorophosphate glass among phosphate glasses.
  • Fluorophosphate glass exhibits high weather resistance due to the inclusion of fluoride, but when the glass has the same composition, the weather resistance can be further improved by changing the ratio represented by ⁇ [H + A ]/[H + B ] ⁇ from more than 2 to 2 or less.
  • fluorophosphate glass is a glass with high weather resistance to begin with. Therefore, the degree of improvement in weather resistance by making the above ratio 2 or less is remarkable in the case of glass that does not contain fluoride. Even in the case of glass that contains fluoride but the content is so small that it does not contribute to improving weather resistance, the degree of improvement in weather resistance by making the above ratio 2 or less is remarkable.
  • the F content in the glass according to this embodiment is preferably 7% or less, more preferably 5% or less, even more preferably 3% or less, even more preferably 2% or less, and particularly preferably 1% or less, and may not be contained at all.
  • the F content in the glass according to this embodiment is expressed as an exclusive percentage, and is not included in the total content of the glass components expressed on an oxide basis.
  • the above-mentioned exclusive percentage means the F content when the glass composition other than F contained in the glass is taken as 100 mol %.
  • the glass according to this embodiment may contain other components within a range that does not impair the effects of the present invention.
  • other components include GeO 2 , ZrO 2 , SnO 2 , CeO 2 , Y 2 O 3 , La 2 O 3 , Gd 2 O 3 , and Yb 2 O 3 .
  • the total content is preferably 0 to 5 mol%.
  • the total content is more preferably 0.1 mol% or more, and even more preferably 0.2 mol% or more.
  • the total content is preferably 5 mol% or less, more preferably 4 mol% or less, and even more preferably 3 mol% or less.
  • the glass according to this embodiment contains substantially no PbO, As 2 O 3 , or GdF 3 .
  • PbO is a component that reduces the viscosity of glass and improves manufacturing workability.
  • As2O3 is a component that acts as an excellent clarifier that can generate clarified gas in a wide temperature range.
  • GdF3 is a component that stabilizes glass, the raw material is relatively expensive, which leads to increased costs, so it is preferable to avoid its inclusion as much as possible.
  • substantially not contained means that they are not intentionally used as raw materials, and the content of each component in the glass is 0.1 mol % or less.
  • the near-infrared absorption cut filter according to this embodiment includes the glass described above in “Glass.”
  • the preferred aspects of this glass are also similar to the preferred aspects described above in “Glass.”
  • the near-infrared absorption cut filter according to this embodiment may have an optical multilayer film provided on at least one main surface of glass formed into a predetermined shape.
  • optical multilayer films include IR cut films, UV/IR cut films (films that reflect ultraviolet and near infrared rays), UV cut films, anti-reflection films, etc.
  • the optical multilayer film can be formed by a conventionally known method, such as a vapor deposition method, a sputtering method, etc.
  • An adhesion-strengthening film may be provided between the glass and the optical multilayer film, which improves the adhesion between the glass and the optical multilayer film and prevents the film from peeling off.
  • the adhesion-strengthening film include silicon oxide (SiO 2 ), titanium oxide (TiO 2 ), lanthanum titanate (La 2 Ti 2 O 7 ), aluminum oxide (Al 2 O 3 ), a mixture of aluminum oxide and zirconium oxide (ZrO 2 ), magnesium fluoride (MgF 2 ), calcium fluoride (CaF 2 ), strontium fluoride (SrF 2 ), and fluorosilicone.
  • the adhesion-strengthening film may be a single layer or may be two or more layers. In the case of two or more layers, a combination of a plurality of materials may be used.
  • the near-infrared absorption cut filter according to this embodiment may have an absorption layer containing a near-infrared absorbing material having a maximum absorption wavelength in the near-infrared range on at least one of the main surfaces of the glass according to this embodiment.
  • the near-infrared absorption cut filter according to this embodiment is preferably made of a transparent resin selected from an acrylic resin, an epoxy resin, an ene-thiol resin, a polycarbonate resin, a polyether resin, a polyarylate resin, a polysulfone resin, a polyethersulfone resin, a polyparaphenylene resin, a polyarylene ether phosphine oxide resin, a polyimide resin, a polyamideimide resin, a polyolefin resin, a cyclic olefin resin, and a polyester resin, and is preferably made of one of these resins alone or a mixture of two or more of these resins, to which a near-infrared absorbing dye is added and contained in the absorption layer.
  • a transparent resin selected from an acrylic resin, an epoxy resin, an ene-thiol resin, a polycarbonate resin, a polyether resin, a polyarylate resin, a polysulfone resin, a
  • the near-infrared absorbing dye it is preferable to use a near-infrared absorbing material made of at least one dye selected from the group consisting of squarylium dyes, phthalocyanine dyes, cyanine dyes and diimmonium dyes.
  • the solid-state imaging device includes the near-infrared absorption cut filter described above in "Near-infrared absorption cut filter.” Preferred aspects of this near-infrared absorption cut filter are also similar to the preferred aspects described above in “Near-infrared absorption cut filter.”
  • the solid-state imaging element includes an imaging lens in addition to the near-infrared absorption cut filter.
  • the solid-state imaging element converts the input light into an electrical signal and outputs it to an image signal processing circuit.
  • Examples of solid-state imaging elements include a Charge Coupled Device (CCD) image sensor and a Complementary Metal Oxide Semiconductor (CMOS) image sensor.
  • CCD Charge Coupled Device
  • CMOS Complementary Metal Oxide Semiconductor
  • the imaging device using the solid-state imaging element may further include an imaging lens, and the near-infrared absorbing cut filter may be disposed between the imaging lens and the solid-state imaging element.
  • the near-infrared absorbing cut filter may be provided separately from the solid-state imaging element, and may be directly attached to an imaging lens or the like via an adhesive layer, for example.
  • the method for producing glass according to this embodiment includes the following steps.
  • Step 1 A step of weighing and mixing glass raw materials to obtain a raw material mixture.
  • Step 2 A step of heating and melting the raw material mixture obtained in step 1.
  • Step 3 A step of forming the melt obtained in step 2.
  • Step 1 may be carried out using a conventionally known material and employing a conventionally known method.
  • the content of the resulting glass in mole percent based on oxides is: P2O5 : 30-50 %, Al 2 O 3 : 1 to 10%, ⁇ R 2 O: 10-35%, ⁇ R'O: 0 ⁇ 10%, CuO: 1-15%, TiO2 : 0-10%, It is preferable to obtain a raw material mixture that satisfies WO 3 : 0-10% and Nb 2 O 5 : 0-10%, because this makes it easier to obtain a glass in which the ratio represented by ⁇ [H + A ]/[H + B ] ⁇ is 2 or less without going through step 4.
  • the heating and melting conditions in step 2 can also employ conventionally known methods and conditions, but the heating temperature is preferably 700 to 1450° C.
  • the heating temperature is preferably 700° C. or higher, more preferably 800° C. or higher, even more preferably 900° C. or higher, and even more preferably 1000° C. or higher.
  • the heating temperature is preferably 1450° C. or lower, more preferably 1400° C. or lower, even more preferably 1350° C. or lower, and even more preferably 1300° C. or lower.
  • Step 3 is a step of shaping the melt obtained in step 2. If necessary, an oxidizing agent may be added or clarification may be performed between steps 2 and 3.
  • Additives and fining agents include, for example, nitrate and sulfate compounds having glass-forming cations.
  • the oxidizing agent has the effect of increasing the proportion of Cu 2+ ions in the total amount of Cu in the glass, thereby improving the transmittance of light in the visible range and improving the absorbance of light in the near-infrared range.
  • the amount of nitrate compounds or sulfate compounds added is preferably 0.5 to 10 mass% based on the raw material mixture in terms of the total amount added. From the viewpoint of further improving the transmittance of light in the visible range, the amount added is preferably 0.5 mass% or more, more preferably 1 mass% or more, and even more preferably 3 mass% or more. Also, from the viewpoint of the effect of the addition reaching a plateau and from the viewpoint of glass formability, the amount added is preferably 10 mass% or less, more preferably 8 mass% or less, and even more preferably 6 mass% or less.
  • nitrate compounds include Al( NO3 ) 3 , LiNO3 , NaNO3 , KNO3 , Ca( NO3 ) 2 , Sr( NO3 ) 2 , Ba( NO3 ) 2 , Zn( NO3 ) 2 , and Cu( NO3 ) 2 .
  • sulfate compounds include Al2 ( SO4 ) 3.16H2O , Li2SO4 , Na2SO4 , K2SO4 , CaSO4 , SrSO4 , BaSO4 , ZnSO4 , and CuSO4 .
  • Step 4 is optional. However, when the ratio represented by ⁇ [H + A ]/[H + B ] ⁇ of the glass obtained in step 3 does not satisfy 2 or less, it is preferable to further include a step of performing a post-treatment as step 4.
  • the post-treatment method may be any method that reduces the H + concentration [H + A ] on the glass surface, and examples thereof include surface polishing treatment, heat treatment, chemical treatment, gas treatment, ion exchange treatment, and plasma treatment.
  • the heat treatment is preferably carried out at a temperature near the glass transition temperature (Tg) of the glass, and more preferably at a temperature in the range of (Tg ⁇ 100)°C.
  • the chemical used in the chemical treatment can be appropriately selected from acidic, neutral, and alkaline solutions to the extent that the glass surface is not deteriorated.
  • Examples 1 to 4 and Examples 6 to 16 are examples, and Example 5 is a comparative example.
  • Test Example Example 1 Glass raw materials were weighed and mixed to obtain a raw material mixture having the composition shown in Table 1. The raw material mixture was then heated and melted at 1100°C for 2 hours. The melt obtained was clarified and stirred, then poured into a mold and slowly cooled. Next, a glass having a size of 40 mm x 30 mm and a thickness of 0.21 mm was obtained by polishing. The glass transition temperature of this glass was 450°C. Further, as a post-treatment, a heat treatment was carried out in an air atmosphere at 450° C. for 12 hours. In addition, "-" in "Composition (mol %)" in Table 1 means that it was not intentionally added as a glass raw material. The same applies to Tables 2 and 3.
  • Example 2 Glass was obtained in the same manner as in Example 1, except that the obtained glass was subjected to a heat treatment at 450° C. for 12 hours in a nitrogen atmosphere as a post-treatment.
  • Example 3 A glass was obtained in the same manner as in Example 1, except that the obtained glass was not subjected to any post-treatment.
  • Example 4 Glass raw materials were weighed and mixed to obtain a raw material mixture having the composition shown in Table 1. The raw material mixture was then heated and melted at 1050°C for 2 hours. The melt obtained was clarified and stirred, then poured into a mold and slowly cooled. Next, a glass having a size of 40 mm x 30 mm and a thickness of 0.21 mm was obtained by polishing. The glass transition temperature of this glass was 460°C. Further, as a post-treatment, a heat treatment was carried out in an air atmosphere at 450° C. for 12 hours.
  • Example 5 A glass was obtained in the same manner as in Example 4, except that no post-treatment was carried out.
  • Example 6 Glass raw materials were weighed and mixed to obtain a raw material mixture having the composition shown in Table 2. The raw material mixture was then heated and melted at 1250° C. for 2 hours. The melt obtained was clarified and stirred, then poured into a mold and slowly cooled. Next, a glass having a size of 40 mm ⁇ 30 mm and a thickness of 0.21 mm was obtained by polishing. The glass transition temperature of this glass was not measured.
  • Example 7 Glass raw materials were weighed and mixed to obtain a raw material mixture having the composition shown in Table 2. The raw material mixture was then heated and melted at 1200°C for 2 hours. The melt obtained was clarified and stirred, then poured into a mold and slowly cooled. Next, a glass having a size of 40 mm x 30 mm and a thickness of 0.21 mm was obtained by polishing. The glass transition temperature of this glass was 433°C. Further, as a post-treatment, a heat treatment was carried out in an air atmosphere at 425° C. for 24 hours.
  • Example 8 A glass was obtained in the same manner as in Example 7, except that the obtained glass was subjected to a heat treatment at 440° C. for 48 hours in an air atmosphere as a post-treatment.
  • Example 9 Glass raw materials were weighed and mixed to obtain a raw material mixture having the composition shown in Table 2. The raw material mixture was then heated and melted at 1200°C for 2 hours. The melt obtained was clarified and stirred, then poured into a mold and slowly cooled. Next, a glass having a size of 40 mm x 30 mm and a thickness of 0.21 mm was obtained by polishing. The glass transition temperature of this glass was 438°C. Further, as a post-treatment, a heat treatment was carried out in an air atmosphere at 425° C. for 24 hours.
  • Example 10 A glass was obtained in the same manner as in Example 9, except that no post-treatment was carried out.
  • Example 11 Glass raw materials were weighed and mixed to obtain a raw material mixture having the composition shown in Table 3. The raw material mixture was then heated and melted at 1200°C for 2 hours. The melt obtained was clarified and stirred, then poured into a mold and slowly cooled. Next, a glass having a size of 40 mm x 30 mm and a thickness of 0.21 mm was obtained by polishing. The glass transition temperature of this glass was 433°C. Further, as a post-treatment, a heat treatment was carried out in an air atmosphere at 405° C. for 24 hours.
  • Example 12 A glass was obtained in the same manner as in Example 11, except that the obtained glass was subjected to a heat treatment at 420° C. for 48 hours in an air atmosphere as a post-treatment.
  • Example 13 Glass raw materials were weighed and mixed to obtain a raw material mixture having the composition shown in Table 3. The raw material mixture was then heated and melted at 1200°C for 2 hours. The melt obtained was clarified and stirred, then poured into a mold and slowly cooled. Next, a glass having a size of 40 mm x 30 mm and a thickness of 0.21 mm was obtained by polishing. The glass transition temperature of this glass was 401°C. Further, as a post-treatment, a heat treatment was carried out in an air atmosphere at 390° C. for 24 hours.
  • Example 14 Glass raw materials were weighed and mixed to obtain a raw material mixture having the composition shown in Table 3. The raw material mixture was then heated and melted at 1200°C for 2 hours. The melt obtained was clarified and stirred, then poured into a mold and slowly cooled. Next, a glass having a size of 40 mm x 30 mm and a thickness of 0.21 mm was obtained by polishing. The glass transition temperature of this glass was 399°C. Further, as a post-treatment, a heat treatment was carried out in an air atmosphere at 404° C. for 48 hours.
  • Example 15 Glass raw materials were weighed and mixed to obtain a raw material mixture having the composition shown in Table 3. The raw material mixture was then heated and melted at 1300°C for 2 hours. The melt obtained was clarified and stirred, then poured into a mold and slowly cooled. Next, a glass having a size of 40 mm x 30 mm and a thickness of 0.21 mm was obtained by polishing. The glass transition temperature of this glass was 408°C. Further, as a post-treatment, a heat treatment was carried out in an air atmosphere at 378° C. for 48 hours.
  • Example 16 A glass was obtained in the same manner as in Example 15, except that no post-treatment was carried out.
  • Field Axis Potential during 1H-detection The optimal value may vary depending on the device. The operator should carefully set the value so that the background is sufficiently cut.
  • the obtained glass was left to stand for 100 hours in an environment of 85°C and 85% RH, and the weather resistance was evaluated by visually checking for any changes in appearance. Specifically, glass surfaces with little deterioration after the test were rated as "good”, and glass components were eluted onto the surface, causing dripping, etc., and the degree of deterioration was evaluated as "poor”. If the glass was rated as "good", the weather resistance was judged to be good. Thereafter, the diffuse transmittance and the total light transmittance were measured using a haze meter (NDH5000, manufactured by Nippon Denshoku Industries Co., Ltd.). The value expressed as [diffuse transmittance/total light transmittance] was calculated as Haze (%).

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Abstract

The present invention relates to a glass containing, in mol% based on oxides, 25% or more of P2O5 and 0.5% or more in total of near-infrared absorbing components, wherein the ratio represented by {[H+ A]/[H+ B]} of the H+ concentration [H+ A] on the surface of the glass and the H+ concentration [H+ B] at a depth of 100 μm from the surface of the glass is 2 or less.

Description

ガラス、近赤外線吸収カットフィルタ及び固体撮像素子Glass, near-infrared absorbing cut filter and solid-state image pickup device

 本発明はガラス、近赤外線吸収カットフィルタ及び固体撮像素子に関する。 The present invention relates to glass, near-infrared absorption cut filters, and solid-state imaging devices.

 モバイル機器、パソコン、一眼レフ等のカメラに搭載されるCCD(Charge Coupled Device)等の固体撮像素子を用いた撮像装置には、視感度補正フィルタが使用されている。この視感度補正フィルタにより、写真の色味を人間の視感度に近いものとできる。  Luminance correction filters are used in imaging devices that use solid-state imaging elements such as CCDs (Charge Coupled Devices) mounted on mobile devices, personal computers, and cameras such as single-lens reflex cameras. These luminance correction filters can make the colors in photographs closer to the luminosity of humans.

 上記視感度補正フィルタは、近赤外線吸収フィルタとも称されるように、近赤外域の光を吸収し、かつ可視域の光を透過するといった分光特性が求められる。そこで、近赤外線吸収カットフィルタに用いられるガラスは、近赤外域の光を吸収するためにCuイオンを含むことが多い。 The above-mentioned visibility correction filter, also known as a near-infrared absorbing filter, is required to have the spectral characteristics of absorbing light in the near-infrared range and transmitting light in the visible range. Therefore, the glass used in near-infrared absorbing cut filters often contains Cu ions to absorb light in the near-infrared range.

 このようなガラスとして、一般的にはリン酸ガラスとフツリン酸ガラスが挙げられるが、分光特性はリン酸ガラスの方が優れる傾向にある。しかしながらリン酸ガラスは水と反応しやすく、高温高湿下で劣化しやすく、耐候性が低い。その結果、ガラスの主面上に形成した膜が剥がれる等して、素子が劣化しやすい。これは、リン酸ガラス中に含まれるP-O-P結合が水分子によって加水分解された結果、脱離したリン酸がガラス表面に浮き出すことによるものである。  Generally, phosphate glass and fluorophosphate glass are examples of such glasses, but phosphate glass tends to have better spectral characteristics. However, phosphate glass easily reacts with water, is prone to deterioration in high temperature and humidity, and has poor weather resistance. As a result, the film formed on the main surface of the glass is easily peeled off, and the element is easily deteriorated. This is because the P-O-P bonds contained in the phosphate glass are hydrolyzed by water molecules, and the released phosphoric acid floats to the surface of the glass.

 これに対し、非特許文献1では、リン酸ガラスにAlを添加することで、より強い三次元網目構造が形成され、耐候性が改善されることが開示されている。 In contrast, Non-Patent Document 1 discloses that by adding Al 2 O 3 to phosphate glass, a stronger three-dimensional mesh structure is formed, improving weather resistance.

N.J.Kreidl and W.A.Weyl,J.Am.Ceram.Soc.,24:372-378(1941)N. J. Kreidl and W. A. Weyl, J. Am. Ceram. Soc. , 24:372-378 (1941)

 しかしながら、ガラスにAlを添加すると溶解性が低下し、リン酸アルミニウムによる失透が発生しやすい。そこで上記失透を防ぐべくガラスの溶融温度を上げると、可視域の光透過率が低下する。これは、近赤外域の光を吸収するために存在していた2価のCuイオンの一部が1価になる等、近赤外線吸収成分の価数変化に起因するものと考えられる。そのため、ガラスにAlを過剰に添加することは適切ではない。 However, when Al 2 O 3 is added to glass, the solubility decreases, and devitrification due to aluminum phosphate is likely to occur. If the melting temperature of the glass is increased to prevent the devitrification, the light transmittance in the visible range decreases. This is thought to be due to a change in the valence of the near-infrared absorbing component, such as a part of the divalent Cu ions that existed to absorb light in the near-infrared range becoming monovalent. Therefore, it is not appropriate to add excessive Al 2 O 3 to glass.

 そこで本発明は、リン酸ガラスやフツリン酸ガラスのような、リンを含みかつ近赤外線吸収成分も含むガラスであって、耐候性が改善された新たなガラス、並びに、上記ガラスからなる近赤外線吸収カットフィルタ及び固体撮像素子の提供を目的とする。 The present invention aims to provide a new glass, such as phosphate glass or fluorophosphate glass, that contains phosphorus and also contains a near-infrared absorbing component and has improved weather resistance, as well as a near-infrared absorbing cut filter and a solid-state imaging device made of the above glass.

 本発明者らが鋭意検討を行った結果、リン及び近赤外線吸収成分を含有するガラスに対して、表面におけるH濃度と、ガラスの表面から100μmの深さにおけるH濃度との比を制御することにより、上記課題を解決できることを見出し、本発明を完成するに至った。 As a result of intensive research, the present inventors have found that the above-mentioned problems can be solved by controlling the ratio of the H + concentration at the surface of a glass containing phosphorus and a near-infrared absorbing component to the H + concentration at a depth of 100 μm from the surface of the glass, and have thus completed the present invention.

 すなわち、本発明は下記[1]~[14]に関するものである。
[1] 酸化物基準のモル%表記で、
 Pを25%以上、かつ
 近赤外線吸収成分を合計で0.5%以上含むガラスであって、
 前記ガラスの表面におけるH濃度[H ]と、前記ガラスの表面から100μmの深さにおけるH濃度[H ]との{[H ]/[H ]}で表される比が2以下であるガラス。
[2] β-OH値が1mm-1以下である、前記[1]に記載のガラス。
[3] 前記{[H ]/[H ]}で表される比が1未満である、前記[1]又は[2]に記載のガラス。
[4] 厚み0.2mmに換算した際の、波長550nmにおける透過率が70%以上である、前記[1]~[3]のいずれか1に記載のガラス。
[5] 厚み0.2mmに換算した際の、波長800nmにおける透過率が30%以下である、前記[1]~[4]のいずれか1に記載のガラス。
[6] 前記近赤外線吸収成分として、Cu、Fe、及びVからなる群より選ばれる1種以上を含有する、前記[1]~[5]のいずれか1に記載のガラス。
[7] 前記近赤外線吸収成分としてCuを含み、
 酸化物基準のモル%表記で、CuOを0.5%以上含む、前記[1]~[6]のいずれか1に記載のガラス。
[8] Ti、W及びNbからなる群より選ばれる1以上を含む、前記[1]~[7]のいずれか1に記載のガラス。
[9] 酸化物基準のモル%表記で、TiO、WO及びNbを合計で5%以上含む、前記[8]に記載のガラス。
[10] 酸化物基準のモル%表示での含有量が、
 P:25~80%、
 Al:1~20%、
 ΣRO:0~35%(但し、Rは、Li、Na、K、Rb、及びCsを意味する。)、
 ΣR’O:0~30%(但し、R’はMg、Ca、Sr、Ba及びZnを意味する。)、かつ
 CuO:0.5~30%を満たし、
 前記ΣROは、LiO、NaO、KO、CsO、及びRbOの合計の含有量を意味し、
 前記ΣR’Oは、MgO、CaO、SrO、BaO、及びZnOの合計の含有量を意味する、前記[1]~[9]のいずれか1に記載のガラス。
[11] 酸化物基準のモル%表示での含有量が、
 P:30~50%、
 Al:1~10%、
 ΣRO:10~35%(但し、Rは、Li、Na、K、Rb、及びCsを意味する。)、
 ΣR’O:0~10%(但し、R’はMg、Ca、Sr、Ba及びZnを意味する。)、
 CuO:1~15%、
 TiO:0~10%、
 WO:0~10%、かつ
 Nb:0~10%を満たし、
 前記ΣROは、LiO、NaO、KO、CsO、及びRbOの合計の含有量を意味し、
 前記ΣR’Oは、MgO、CaO、SrO、BaO、及びZnOの合計の含有量を意味する、前記[1]~[10]のいずれか1に記載のガラス。
[12] モル%表記でのFの含有量が、外割で7%以下である、前記[1]~[11]のいずれか1に記載のガラス。
[13] 前記[1]~[12]のいずれか1に記載のガラスからなる近赤外線吸収カットフィルタ。
[14] 前記[13]に記載の近赤外線吸収カットフィルタを含む、固体撮像素子。
That is, the present invention relates to the following [1] to [14].
[1] In mole percent based on oxide,
A glass containing 25% or more of P2O5 and 0.5% or more of near- infrared absorbing components in total,
A glass in which the ratio of the H + concentration [H + A ] at the surface of the glass to the H + concentration [H + B ] at a depth of 100 μm from the surface of the glass, expressed as {[H + A ]/[H + B ]}, is 2 or less.
[2] The glass according to [1] above, having a β-OH value of 1 mm −1 or less.
[3] The glass according to [1] or [2] above, wherein the ratio represented by {[H + A ]/[H + B ]} is less than 1.
[4] The glass according to any one of the above [1] to [3], which has a transmittance of 70% or more at a wavelength of 550 nm when converted into a glass with a thickness of 0.2 mm.
[5] The glass according to any one of the above [1] to [4], which has a transmittance of 30% or less at a wavelength of 800 nm when converted into a glass with a thickness of 0.2 mm.
[6] The glass according to any one of the above [1] to [5], containing one or more selected from the group consisting of Cu, Fe, and V as the near infrared absorbing component.
[7] The near infrared absorbing component contains Cu,
The glass according to any one of the above [1] to [6], containing 0.5% or more of CuO in mole percent on an oxide basis.
[8] The glass according to any one of the above [1] to [7], further comprising one or more elements selected from the group consisting of Ti, W, and Nb.
[9] The glass according to [8], containing, in terms of mole percent on an oxide basis, TiO 2 , WO 3 and Nb 2 O 5 in a total amount of 5% or more.
[10] The content in mole percent based on oxide is:
P2O5 : 25-80 %,
Al 2 O 3 : 1 to 20%,
ΣR 2 O: 0 to 35% (wherein R represents Li, Na, K, Rb, and Cs);
ΣR′O: 0 to 30% (wherein R′ represents Mg, Ca, Sr, Ba, and Zn), and CuO: 0.5 to 30%;
The ΣR 2 O means the total content of Li 2 O, Na 2 O, K 2 O, Cs 2 O, and Rb 2 O;
The glass according to any one of the above [1] to [9], wherein the ΣR′O represents the total content of MgO, CaO, SrO, BaO, and ZnO.
[11] The content in mole percent based on oxide is:
P2O5 : 30-50 %,
Al 2 O 3 : 1 to 10%,
ΣR 2 O: 10 to 35% (wherein R represents Li, Na, K, Rb, and Cs);
ΣR′O: 0 to 10% (wherein R′ means Mg, Ca, Sr, Ba and Zn),
CuO: 1-15%,
TiO2 : 0-10%,
WO 3 : 0 to 10% and Nb 2 O 5 : 0 to 10% are satisfied;
The ΣR 2 O means the total content of Li 2 O, Na 2 O, K 2 O, Cs 2 O, and Rb 2 O;
The glass according to any one of the above [1] to [10], wherein the ΣR′O represents the total content of MgO, CaO, SrO, BaO, and ZnO.
[12] The glass according to any one of the above [1] to [11], wherein the F content, expressed in mol%, is 7% or less by external proportion.
[13] A near-infrared absorption cut filter comprising the glass according to any one of [1] to [12] above.
[14] A solid-state imaging device comprising the near-infrared absorption cut filter according to [13].

 本発明によれば、耐候性が改善された新たなガラスが得られる。また、従来公知の組成であるガラスであっても、表面におけるH濃度と、ガラスの表面から100μmの深さにおけるH濃度との比を制御することにより、その耐候性を改善できる。
 その結果、耐候性に優れた好適な近赤外線吸収カットフィルタ、及び上記近赤外線吸収カットフィルタを含む固体撮像素子も提供できる。
According to the present invention, a new glass having improved weather resistance can be obtained. Moreover, even for a glass having a conventionally known composition, the weather resistance can be improved by controlling the ratio of the H + concentration at the surface to the H + concentration at a depth of 100 μm from the glass surface.
As a result, it is possible to provide a suitable near-infrared absorption cut filter having excellent weather resistance, and a solid-state imaging device including the near-infrared absorption cut filter.

 以下、本発明を詳細に説明するが、本発明は以下の実施形態に限定されるものではなく、本発明の要旨を逸脱しない範囲において、任意に変形して実施できる。また、数値範囲を示す「~」とは、その前後に記載された数値を下限値及び上限値として含む意味で使用される。 The present invention will be described in detail below, but the present invention is not limited to the following embodiments, and can be modified as desired without departing from the gist of the present invention. In addition, the use of "~" to indicate a numerical range means that the numerical values before and after it are included as the lower and upper limits.

《ガラス》
 本実施形態に係るガラスは、酸化物基準のモル%表記で、Pを25%以上、かつ近赤外線吸収成分を合計で0.5%以上含む。上記ガラスの表面におけるH濃度[H ]と、ガラスの表面から100μmの深さにおけるH濃度[H ]との{[H ]/[H ]}で表される比は2以下である。
Glass
The glass according to this embodiment contains, in terms of mole percent on an oxide basis, 25% or more of P2O5 and 0.5% or more of near-infrared absorbing components in total. The ratio of the H + concentration [H + A ] at the surface of the glass to the H + concentration [H + B ] at a depth of 100 μm from the surface of the glass, expressed as {[H + A ]/[H + B ]}, is 2 or less.

〈物性〉
 リン及び近赤外線吸収成分を含有するガラスは、その耐候性を上げるべくAlを過剰に添加し、かつ失透を防ぐべくガラスの溶融温度を上げると、可視域の光透過率が低下する。これは、近赤外域の光を吸収するために存在していた2価のCuイオンの一部が1価になる等、近赤外線吸収成分の価数変化に起因するものと考えられる。
Physical Properties
When excess Al 2 O 3 is added to glass containing phosphorus and a near-infrared absorbing component to improve its weather resistance and the melting temperature of the glass is raised to prevent devitrification, the light transmittance in the visible range decreases. This is thought to be due to a change in the valence of the near-infrared absorbing component, such as some of the divalent Cu ions that exist to absorb light in the near-infrared range becoming monovalent.

 そこで、本発明者らは、Alの添加以外に、リン及び近赤外線吸収成分を含有するガラスの耐候性を上げるべく検討を行った結果、{[H ]/[H ]}で表される比を2以下とすることにより、上記ガラスの耐候性が向上することを見出した。 Therefore, the present inventors have conducted studies to improve the weather resistance of glass containing phosphorus and a near-infrared absorbing component in addition to the addition of Al 2 O 3 , and have found that the weather resistance of the glass is improved by setting the ratio represented by {[H + A ]/[H + B ]} to 2 or less.

 この理由は定かではないが、以下のように考えている。
 ガラスの表面におけるH濃度[H ]を、ガラスの表面から100μmの深さにおけるH濃度[H ]に対して2倍以下と少なくすることで、ガラス中のP-O-P結合が増加し、ガラスネットワークが強固となる。それにより、ガラス中への水分(HO)の侵入、拡散を抑制できる。これは、末端のリン酸基(P-OH)が少なくなることによる。その結果、ガラスの耐候性が向上し、例えば、近赤外線吸収カットフィルタとして好適に用いられるようになると考えている。
The reason for this is unclear, but it is thought to be as follows.
By reducing the H + concentration [H + A ] at the surface of the glass to less than twice the H + concentration [H + B ] at a depth of 100 μm from the surface of the glass, the P-O-P bonds in the glass are increased, and the glass network is strengthened. This makes it possible to suppress the intrusion and diffusion of moisture (H 2 O) into the glass. This is because the number of terminal phosphate groups (P-OH) is reduced. As a result, the weather resistance of the glass is improved, and it is believed that the glass will be suitable for use, for example, as a near-infrared absorption cut filter.

 本発明者らは、{[H ]/[H ]}で表される比が2以下であるガラスとして、後述するような新規組成のガラスを見出した。これに加えて、従来公知の組成のガラスであって、{[H ]/[H ]}で表される比が2超であっても、後処理を行うことにより上記比を2以下とでき、それにより耐候性を向上できることを見出したものである。 The present inventors have found a glass having a novel composition as described below, in which the ratio represented by {[H + A ]/[H + B ]} is equal to or less than 2. In addition, the present inventors have found that even in the case of a glass having a conventionally known composition in which the ratio represented by {[H + A ]/[H + B ]} exceeds 2, the ratio can be reduced to equal to or less than 2 by carrying out post-treatment, thereby improving weather resistance.

 そして、本発明者らのさらなる検討により、上記{[H ]/[H ]}で表される比を1未満とすることで、耐候性に加えて、可視域の光に対する透過性を向上できることが分かった。これは、ガラスの表面におけるH濃度[H ]が小さくなることに伴い、電荷補償のために高価数側のイオンであるCu2+等の近赤外域の光の吸収に寄与する成分が存在しやすくなり、低価数側のイオンであるCu等の可視域の吸収に寄与する成分の割合が減ることに起因するものと考えている。本実施形態に係るガラスでは、特に、このCuイオンの価数変化による近赤外線域の透過率の低下及び可視域の透過率の増加が重要な現象であり、これによって本実施形態に係るガラスは近赤外線吸収カットフィルタとして好適に用いられる。 Further studies by the present inventors have revealed that the transmittance of visible light can be improved in addition to weather resistance by making the ratio represented by the above {[H + A ]/[H + B ]} less than 1. This is believed to be due to the fact that, as the H + concentration [H + A ] on the surface of the glass decreases, components that contribute to the absorption of near-infrared light, such as Cu 2+ , which is an ion on the high valence side, tend to be present for charge compensation, and the proportion of components that contribute to the absorption of visible light, such as Cu +, which is an ion on the low valence side, decreases. In particular, in the glass according to this embodiment, the decrease in the transmittance in the near-infrared region and the increase in the transmittance in the visible region due to the change in the valence of this Cu ion are important phenomena, and this makes the glass according to this embodiment suitable for use as a near-infrared absorption cut filter.

 上記観点から、本実施形態に係るガラスの{[H ]/[H ]}で表される比は2以下であり、1未満が好ましく、0.8以下がより好ましく、0.5以下がさらに好ましい。{[H ]/[H ]}で表される比の下限は特に限定されないが、例えば0.01以上である。 From the above viewpoints, the ratio represented by {[H + A ]/[H + B ]} of the glass according to this embodiment is not more than 2, preferably less than 1, more preferably not more than 0.8, and even more preferably not more than 0.5. The lower limit of the ratio represented by {[H + A ]/[H + B ]} is not particularly limited, but is, for example, not less than 0.01.

 なお、本明細書における[H ]、[H ]は、二次イオン質量分析法(SIMS;Secondary Ion Mass Spectrometry)により求められる。
 具体的には、SIMSを用いて、ガラスの表面から少なくとも20μm深さまでのH濃度(cps)を測定する。そして、表面から20μmの深さまでの得られた曲線をシグモイド曲線で近似することにより、ガラスの表面におけるH濃度[H ](cps)及びガラスの表面から100μmの深さにおけるH濃度[H ](cps)を求める。この測定方法を用いることにより、実際のガラスの厚さが100μm未満であっても[H ]を求められる。
In this specification, [H + A ] and [H + B ] are determined by secondary ion mass spectrometry (SIMS).
Specifically, the H + concentration (cps) is measured from the surface of the glass to a depth of at least 20 μm using SIMS. The curve obtained from the surface to a depth of 20 μm is then approximated with a sigmoid curve to obtain the H + concentration [H + A ] (cps) at the surface of the glass and the H + concentration [H + B ] (cps) at a depth of 100 μm from the surface of the glass. By using this measurement method, [H + B ] can be obtained even if the actual thickness of the glass is less than 100 μm.

 SIMSの具体的な測定条件は下記とする。
〔SIMSの測定条件〕
装置:アルバック・ファイ社製 ADEPT1010
一次イオン種:Cs+
一次イオンの加速電圧:5kV
一次イオンの電流値:500nA
一次イオンの入射角:試料面の法線に対して60°
一次イオンのラスターサイズ:300×300μm
二次イオンの極性:マイナス
二次イオンの検出領域:60×60μm(一次イオンのラスターサイズの4%)
ESA Input Lens:0
中和銃の使用:有
横軸をスパッタ時間から深さへ変換する方法:分析クレータの深さを触針式表面形状測定器(Veeco社製、Dektak150)によって測定し、一次イオンのスパッタレートを求める。このスパッタレートを用いて、横軸をスパッタ時間から深さへ変換する。1H-検出時のField Axis Potential:装置ごとに最適値が変化する可能性がある。バックグラウンドが十分にカットされるように測定者が注意しながら値を設定する。
The specific measurement conditions for SIMS are as follows.
[SIMS measurement conditions]
Equipment: ULVAC-PHI ADEPT1010
Primary ion species: Cs+
Acceleration voltage of primary ions: 5 kV
Primary ion current value: 500 nA
Incident angle of primary ions: 60° to the normal of the sample surface
Primary ion raster size: 300 x 300 μm 2
Polarity of secondary ions: negative Secondary ion detection area: 60 x 60 μm 2 (4% of the raster size of primary ions)
ESA Input Lens: 0
Use of neutralization gun: Yes Method of converting horizontal axis from sputtering time to depth: The depth of the analyzed crater is measured with a stylus surface profiler (Dektak150, manufactured by Veeco) to determine the sputtering rate of the primary ions. Using this sputtering rate, the horizontal axis is converted from sputtering time to depth. Field axis potential during 1H-detection: The optimal value may vary depending on the device. The operator should carefully set the value so that the background is sufficiently cut.

 本実施形態に係るガラスのβ-OH値は、ガラスの耐候性をより向上させる観点から、1mm-1以下が好ましく、0.8mm-1以下がより好ましく、0.5mm-1以下がさらに好ましく、0.25mm-1以下がさらに一層好ましい。β-OH値の下限は特に限定されないが、例えば0.01mm-1以上である。
 なお、本明細書におけるβ-OH値は、ガラス中の水分量と相関があり、フーリエ変換赤外分光法(FT-IR)により測定される3550cm-1における吸光度をガラスの厚みで除することで求められる。
 具体的には、3650cm-1~4000cm-1における透過率の最大値をT、3550cm-1における透過率をT、ガラスの厚みをd(mm)としたとき、β-OH値は次の式であらわされる値である。
  β-OH値=-(1/d)・(log10(T/T))
From the viewpoint of further improving the weather resistance of the glass, the β-OH value of the glass according to this embodiment is preferably 1 mm −1 or less, more preferably 0.8 mm −1 or less, even more preferably 0.5 mm −1 or less, and still more preferably 0.25 mm −1 or less. There is no particular restriction on the lower limit of the β-OH value, but it is, for example, 0.01 mm −1 or more.
The β-OH value in this specification correlates with the amount of water in the glass, and is determined by dividing the absorbance at 3550 cm −1 measured by Fourier transform infrared spectroscopy (FT-IR) by the thickness of the glass.
Specifically, when the maximum transmittance between 3650 cm -1 and 4000 cm -1 is T 0 , the transmittance at 3550 cm -1 is T 1 , and the glass thickness is d (mm), the β-OH value is expressed by the following formula.
β-OH value = -(1/d)・(log 10 (T 1 /T 0 ))

 本実施形態に係るガラスは、近赤外線吸収カットフィルタとした際に、分光特性として可視域の光の高い透過性が求められる。そのため、上記ガラスの波長550nmにおける透過率は70%以上が好ましく、75%以上がより好ましく、80%以上がさらに好ましく、85%以上がさらに一層好ましい。また、上記透過率は100%に近いほどが好ましいが、通常92%以下である。なお、本明細書中において、ガラスの透過率は、表裏面の反射ロスを含んだ外部透過率である。 When the glass according to this embodiment is used as a near-infrared absorption cut filter, it is required to have high transmittance of light in the visible range as a spectral characteristic. Therefore, the transmittance of the above glass at a wavelength of 550 nm is preferably 70% or more, more preferably 75% or more, even more preferably 80% or more, and even more preferably 85% or more. In addition, the transmittance is preferably closer to 100%, but is usually 92% or less. In this specification, the transmittance of glass is the external transmittance including reflection loss on the front and back surfaces.

 なお、本明細書における透過率とは、ガラスの厚みが0.2mmである場合に換算した透過率である。上記換算は下記式により行える。
  Ti2=Ti1 t2/t1
 上記式において、Ti1は測定サンプルの内部透過率(表裏面の反射ロスを除いた透過率)であり、Ti2は換算後の内部透過率であり、t1は測定サンプルの厚み(mm)であり、t2は換算する厚み、すなわち本明細書においては0.2mmである。なお、透過率から内部透過率への変換は、ガラスの表裏面の反射損失Rをそれぞれ0.0454と仮定し、以下の式を用いて行う。
  内部透過率=外部透過率/{100×(1-R)
In this specification, the transmittance is calculated based on a glass thickness of 0.2 mm. The above conversion can be performed using the following formula.
T i2 = T i1 t2/t1
In the above formula, T i1 is the internal transmittance of the measured sample (transmittance excluding reflection loss on the front and back surfaces), T i2 is the internal transmittance after conversion, t1 is the thickness (mm) of the measured sample, and t2 is the thickness to be converted, i.e., 0.2 mm in this specification. Note that the conversion from transmittance to internal transmittance is performed using the following formula, assuming that the reflection loss R on the front and back surfaces of the glass is 0.0454, respectively.
Internal transmittance = external transmittance / {100×(1-R) 2 }

 本実施形態に係るガラスは、近赤外線吸収カットフィルタとした際に、近赤外域の光の高い吸収性が求められる。そのため、上記ガラスの波長800nmにおける透過率は30%以下が好ましく、25%以下がより好ましく、20%以下がさらに好ましく、15%以下がさらに一層好ましく、10%以下が最も好ましい。また、上記透過率は0%に近いほど好ましいが、通常0.01%以上である。 When used as a near-infrared absorption cut filter, the glass according to this embodiment is required to have high absorption of light in the near-infrared region. Therefore, the transmittance of the above glass at a wavelength of 800 nm is preferably 30% or less, more preferably 25% or less, even more preferably 20% or less, even more preferably 15% or less, and most preferably 10% or less. In addition, the closer the transmittance is to 0%, the more preferable, but it is usually 0.01% or more.

 本実施形態に係るガラスの厚みは0.03~1mmが好ましい。ここで、製造時や搬送時、固体撮像素子への組込時等における破損を防ぐための強度を得る観点から、上記厚みは0.03mm以上が好ましく、0.05mm以上がより好ましく、0.07mm以上がさらに好ましく、0.1mm以上が特に好ましい。また、固体撮像素子等、ガラスを搭載するデバイスや機器の小型化・薄型化への対応の観点から、上記厚みは1mm以下が好ましく、0.8mm以下がより好ましく、0.6mm以下がさらに好ましく、0.4mm以下が特に好ましく、0.3mm以下が最も好ましい。 The thickness of the glass according to this embodiment is preferably 0.03 to 1 mm. From the viewpoint of obtaining the strength necessary to prevent breakage during manufacture, transportation, installation into a solid-state imaging element, etc., the thickness is preferably 0.03 mm or more, more preferably 0.05 mm or more, even more preferably 0.07 mm or more, and particularly preferably 0.1 mm or more. Furthermore, from the viewpoint of responding to the miniaturization and thinning of devices and equipment incorporating glass, such as solid-state imaging elements, the thickness is preferably 1 mm or less, more preferably 0.8 mm or less, even more preferably 0.6 mm or less, particularly preferably 0.4 mm or less, and most preferably 0.3 mm or less.

 本実施形態に係るガラスのガラス転移温度(Tg)は350~600℃が好ましい。ここで、ガラスの安定性を高める観点から、上記ガラス転移温度は350℃以上が好ましく、375℃以上がより好ましく、400℃以上がさらに好ましく、425℃以上がよりさらに好ましい。また、ガラスの溶解温度上昇を抑制する観点から、上記ガラス転移温度は600℃以下が好ましく、575℃以下がより好ましく、550℃以下がさらに好ましく、525℃以下がよりさらに好ましく、500℃以下がさらに一層好ましい。 The glass transition temperature (Tg) of the glass according to this embodiment is preferably 350 to 600°C. From the viewpoint of enhancing the stability of the glass, the glass transition temperature is preferably 350°C or higher, more preferably 375°C or higher, even more preferably 400°C or higher, and even more preferably 425°C or higher. From the viewpoint of suppressing an increase in the melting temperature of the glass, the glass transition temperature is preferably 600°C or lower, more preferably 575°C or lower, even more preferably 550°C or lower, even more preferably 525°C or lower, and even more preferably 500°C or lower.

〈組成〉
 本実施形態に係るガラスにおいてリン(P)はネットワーク形成成分であり、ガラス化に必要な主成分である。また、近赤外域の光の吸収性を高める成分でもある。
 上記ガラスにおける酸化物基準のモル%表記でのPの含有量は25%以上であり、25~80%が好ましく、30~50%がより好ましい。ここで、ガラスとなるべくネットワークを形成し、かつ近赤外域の光を好適に吸収する観点から、上記Pの含有量は25%以上が好ましく、28%以上がより好ましく、30%以上がさらに好ましく、35%以上がよりさらに好ましく、40%以上がことさらに好ましく、さらに一層好ましくは45%以上である。また、ガラスを製造する際の溶融温度が高くなり過ぎることによる可視域の光の透過率低下を抑制する観点から、上記Pの含有量は80%以下が好ましく、75%以下がより好ましく、70%以下がさらにより好ましく、65%以下がよりさらに好ましく、さらに一層好ましくは60%以下であり、50%以下が特に好ましい。
<composition>
In the glass according to the present embodiment, phosphorus (P) is a network-forming component and a main component necessary for vitrification. It is also a component that enhances the absorbency of light in the near-infrared region.
The content of P 2 O 5 in the above glass in terms of mole percent based on oxide is 25% or more, preferably 25 to 80%, and more preferably 30 to 50%. Here, from the viewpoint of forming a network as much as possible to become glass and suitably absorbing light in the near infrared region, the content of P 2 O 5 is preferably 25% or more, more preferably 28% or more, even more preferably 30% or more, even more preferably 35% or more, particularly preferably 40% or more, and even more preferably 45% or more. In addition, from the viewpoint of suppressing a decrease in the transmittance of light in the visible region due to an excessively high melting temperature during the production of glass, the content of P 2 O 5 is preferably 80% or less, more preferably 75% or less, even more preferably 70% or less, even more preferably 65% or less, even more preferably 60% or less, and particularly preferably 50% or less.

 本実施形態に係るガラスは、近赤外線吸収カットフィルタ等に好適に用いられるために、近赤外域の光を吸収する成分、すなわち近赤外線吸収成分を含有する。ここで近赤外線吸収成分とは、最大吸収波長が700~1200nmの範囲にある成分である。 The glass according to this embodiment contains a component that absorbs light in the near-infrared region, i.e., a near-infrared absorbing component, so that it can be suitably used in near-infrared absorption cut filters and the like. Here, the near-infrared absorbing component is a component whose maximum absorption wavelength is in the range of 700 to 1200 nm.

 上記近赤外線吸収成分の、酸化物基準のモル%表記での合計の含有量は0.5%以上であり、0.5~30%が好ましい。ここで、近赤外域の光の吸収性を高める観点から、上記合計の含有量は0.5%以上が好ましく、1%以上がより好ましく、5%以上がさらに好ましく、10%以上がよりさらに好ましい。また、ガラス中における失透異物析出防止の観点から、上記合計の含有量は30%以下が好ましく、26%以下がより好ましく、22%以下がさらに好ましく、18%以下がよりさらに好ましい。 The total content of the near-infrared absorbing components, expressed in mole percent on an oxide basis, is 0.5% or more, and preferably 0.5 to 30%. From the viewpoint of increasing the absorbency of light in the near-infrared region, the total content is preferably 0.5% or more, more preferably 1% or more, even more preferably 5% or more, and even more preferably 10% or more. From the viewpoint of preventing the precipitation of devitrification inclusions in the glass, the total content is preferably 30% or less, more preferably 26% or less, even more preferably 22% or less, and even more preferably 18% or less.

 近赤外線吸収成分とは、例えば、Cu、Fe、V等が挙げられ、これらのうち1種を用いても、2種以上を併用してもよい。
 すなわち、本実施形態に係るガラスは近赤外線吸収成分として、Cu、Fe、及びVからなる群より選ばれる1種以上を含有することが好ましく、少なくともCuを含むことが近赤外域の光を効率良く吸収させる観点からより好ましい。
Examples of the near infrared absorbing component include Cu, Fe, V, etc., and one of these may be used alone or two or more of them may be used in combination.
That is, the glass according to this embodiment preferably contains one or more elements selected from the group consisting of Cu, Fe, and V as a near-infrared absorbing component, and more preferably contains at least Cu from the viewpoint of efficiently absorbing light in the near-infrared region.

 本実施形態に係るガラスが近赤外線吸収成分としてCuを含有する場合の、酸化物基準のモル%表記でのCuOの含有量は0.5%以上が好ましく、0.5~30%がより好ましい。ここで、近赤外域の光を効率良く吸収させるとの観点、また、ガラスの強度や安定性を高めるとの観点から、上記CuOの含有量は0.5%以上が好ましく、1%以上がより好ましく、5%以上がさらに好ましく、10%以上がよりさらに好ましい。また、ガラスの可視透過率低下を抑制する観点から、上記CuOの含有量は30%以下が好ましく、26%以下がより好ましく、22%以下がさらに好ましく、18%以下がよりさらに好ましい。 When the glass according to this embodiment contains Cu as a near-infrared absorbing component, the CuO content expressed in mole percent on an oxide basis is preferably 0.5% or more, and more preferably 0.5 to 30%. From the viewpoint of efficiently absorbing light in the near-infrared range and from the viewpoint of increasing the strength and stability of the glass, the CuO content is preferably 0.5% or more, more preferably 1% or more, even more preferably 5% or more, and even more preferably 10% or more. Furthermore, from the viewpoint of suppressing a decrease in the visible transmittance of the glass, the CuO content is preferably 30% or less, more preferably 26% or less, even more preferably 22% or less, and even more preferably 18% or less.

 本実施形態に係るガラスは、ガラスの組成によっては、後処理をすることなく{[H ]/[H ]}で表される比が2以下となるが、後処理をしないと、上記比が2以下とならない場合がある。そのような場合であっても、上記後処理により上記比を2以下とできる。また、後処理をすることなく上記比が2以下となる組成であっても、後処理により、上記比をより小さくできる。 In the glass according to the present embodiment, depending on the glass composition, the ratio represented by {[H + A ]/[H + B ]} becomes 2 or less without post-treatment, but there are cases where the ratio does not become 2 or less without post-treatment. Even in such a case, the ratio can be made 2 or less by the post-treatment. Moreover, even in a composition where the ratio becomes 2 or less without post-treatment, the ratio can be made smaller by the post-treatment.

 上記後処理による効果がより得やすくなる観点から、本実施形態に係るガラスはTi、W及びNbからなる群より選ばれる1以上を含むことが好ましい。
 この場合、酸化物基準のモル%表記で、TiO、WO及びNbを合計で5%以上含むことがより好ましく、5~30%含むことがより好ましい。ここで、上記後処理による効果がより得やすくなる観点から、上記合計の含有量は5%以上が好ましく、7.5%以上がより好ましく、10%以上がさらに好ましく、12.5%以上がよりさらに好ましい。また、ガラスの可視透過率低下を抑制する観点から、上記合計の含有量は30%以下が好ましく、25%以下がより好ましく、20%以下がさらに好ましい。
From the viewpoint of making it easier to obtain the effects of the above-mentioned post-treatment, the glass according to this embodiment preferably contains one or more elements selected from the group consisting of Ti, W, and Nb.
In this case, the total content of TiO 2 , WO 3 and Nb 2 O 5 is preferably 5% or more, and more preferably 5 to 30%, expressed in mole % on an oxide basis. From the viewpoint of more easily obtaining the effects of the post-treatment, the total content is preferably 5% or more, more preferably 7.5% or more, even more preferably 10% or more, and even more preferably 12.5% or more. From the viewpoint of suppressing a decrease in the visible transmittance of the glass, the total content is preferably 30% or less, more preferably 25% or less, and even more preferably 20% or less.

 より具体的には、本実施形態に係るガラスの組成は、酸化物基準のモル%表示での含有量が下記を満たすことが好ましい。
 P:25~80%、
 Al:1~20%、
 ΣRO:0~35%(但し、Rは、Li、Na、K、Rb、及びCsを意味する。)、
 ΣR’O:0~30%(但し、R’はMg、Ca、Sr、Ba及びZnを意味する。)、かつ
 CuO:0.5~30%を満たす。
 上記ΣROは、LiO、NaO、KO、CsO、及びRbOの合計の含有量を意味し、上記ΣR’Oは、MgO、CaO、SrO、BaO、及びZnOの合計の含有量を意味する。
More specifically, the composition of the glass according to this embodiment preferably satisfies the following contents in mole percent on an oxide basis.
P2O5 : 25-80 %,
Al 2 O 3 : 1 to 20%,
ΣR 2 O: 0 to 35% (wherein R represents Li, Na, K, Rb, and Cs);
ΣR′O: 0 to 30% (wherein R′ represents Mg, Ca, Sr, Ba and Zn), and CuO: 0.5 to 30%.
The ΣR 2 O means the total content of Li 2 O, Na 2 O, K 2 O, Cs 2 O, and Rb 2 O, and the ΣR′O means the total content of MgO, CaO, SrO, BaO, and ZnO.

 特に、後処理の存否に関わらず{[H ]/[H ]}で表される比が2以下となるガラスとする場合の組成は、酸化物基準のモル%表示での含有量が下記を満たすことが好ましい。
 P:30~50%、
 Al:1~10%、
 ΣRO:10~35%(但し、Rは、Li、Na、K、Rb、及びCsを意味する。)、
 ΣR’O:0~10%(但し、R’はMg、Ca、Sr、Ba及びZnを意味する。)、
 CuO:1~15%、
 TiO:0~10%、
 WO:0~10%、かつ
 Nb:0~10%を満たす。
 上記ΣROは、LiO、NaO、KO、CsO、及びRbOの合計の含有量を意味し、上記ΣR’Oは、MgO、CaO、SrO、BaO、及びZnOの合計の含有量を意味する。
In particular, in the case of making a glass in which the ratio represented by {[H + A ]/[H + B ]} is 2 or less, regardless of the presence or absence of post-treatment, it is preferable that the content expressed in mol % on an oxide basis satisfies the following:
P2O5 : 30-50 %,
Al 2 O 3 : 1 to 10%,
ΣR 2 O: 10 to 35% (wherein R represents Li, Na, K, Rb, and Cs);
ΣR′O: 0 to 10% (wherein R′ means Mg, Ca, Sr, Ba and Zn),
CuO: 1-15%,
TiO2 : 0-10%,
The content of WO 3 is 0 to 10%, and the content of Nb 2 O 5 is 0 to 10%.
The ΣR 2 O means the total content of Li 2 O, Na 2 O, K 2 O, Cs 2 O, and Rb 2 O, and the ΣR′O means the total content of MgO, CaO, SrO, BaO, and ZnO.

 P、近赤外線吸収成分の一態様であるCuO、並びに、TiO、WO及びNbの合計については先述したとおりである。以下にそれ以外の組成について説明する。 The P 2 O 5 , CuO which is one aspect of the near infrared absorbing component, and the total of TiO 2 , WO 3 and Nb 2 O 5 are as described above. The rest of the composition will be described below.

 Alは、耐候性を高めるための成分である。Alの含有量は1~20モル%が好ましく、1~10モル%がより好ましい。ここで、ガラスの耐候性を高める観点から、Alの含有量は1モル%以上が好ましく、2モル%以上がより好ましく、3モル%以上がさらに好ましい。また、ガラスを製造する際の溶融温度が高くなり過ぎることによる、近赤外域の吸収性低下及び可視域の光の透過率低下を抑制する観点から、Alの含有量は、20モル%以下が好ましく、17モル%以下がより好ましく、15モル%以下がさらに好ましく、10モル%以下がよりさらに好ましい。 Al 2 O 3 is a component for improving weather resistance. The content of Al 2 O 3 is preferably 1 to 20 mol%, more preferably 1 to 10 mol%. Here, from the viewpoint of improving the weather resistance of the glass, the content of Al 2 O 3 is preferably 1 mol% or more, more preferably 2 mol% or more, and even more preferably 3 mol% or more. In addition, from the viewpoint of suppressing the decrease in absorbency in the near infrared region and the decrease in transmittance of light in the visible region due to the melting temperature becoming too high when producing the glass, the content of Al 2 O 3 is preferably 20 mol% or less, more preferably 17 mol% or less, even more preferably 15 mol% or less, and even more preferably 10 mol% or less.

 ROは、ガラスの溶融温度を低くする成分である。Rは、Li、Na、K、Rb、及びCsを意味し、ΣROはLiO、NaO、KO、RbO、及びCsOの合計量を意味する。
 ΣROは0~35モル%が好ましく、10~35モル%がより好ましい。ここで、ROによる上記効果を好適に得る観点から、ROを含有する場合のΣROは10モル%以上が好ましく、12モル%以上がより好ましく、14モル%以上がさらに好ましい。また、ガラスが不安定になるのを抑制する観点から、ΣROは35モル%以下が好ましく、33モル%以下がより好ましく、32モル%以下がさらに好ましい。
R2O is a component that lowers the melting temperature of glass. R represents Li, Na, K, Rb, and Cs, and ΣR2O represents the total amount of Li2O , Na2O , K2O, Rb2O , and Cs2O .
ΣR 2 O is preferably 0 to 35 mol %, and more preferably 10 to 35 mol %. From the viewpoint of preferably obtaining the above-mentioned effects of R 2 O, when R 2 O is contained, ΣR 2 O is preferably 10 mol % or more, more preferably 12 mol % or more, and even more preferably 14 mol % or more. From the viewpoint of suppressing glass instability, ΣR 2 O is preferably 35 mol % or less, more preferably 33 mol % or less, and even more preferably 32 mol % or less.

 ROとしてLiO、NaO及びKOからなる群より選ばれる少なくとも1以上を含むことが好ましく、LiO及びNaOの少なくとも一方を含むことがより好ましく、LiOを含むことがさらに好ましい。また、LiO及びNaOを含むこともさらに好ましい。 As R 2 O, it is preferable to contain at least one selected from the group consisting of Li 2 O, Na 2 O, and K 2 O, it is more preferable to contain at least one of Li 2 O and Na 2 O, and it is even more preferable to contain Li 2 O. It is also more preferable to contain Li 2 O and Na 2 O.

 ROとしてLiOを含む場合、LiOの含有量は0.1~15モル%が好ましい。ここで、LiOによる上記効果を好適に得る観点から、LiOを含む場合の含有量は0.1モル%以上が好ましく、2モル%以上がより好ましく、4モル%以上がさらに好ましく、6モル%以上がよりさらに好ましい。また、ガラスが不安定になるのを抑制する観点から、LiOの含有量は15モル%以下が好ましく、14モル%以下がより好ましく、13モル%以下がさらに好ましく、12モル%以下がよりさらに好ましい。 When Li 2 O is included as R 2 O, the content of Li 2 O is preferably 0.1 to 15 mol %. Here, from the viewpoint of suitably obtaining the above-mentioned effect of Li 2 O, the content of Li 2 O when included is preferably 0.1 mol % or more, more preferably 2 mol % or more, even more preferably 4 mol % or more, and even more preferably 6 mol % or more. Also, from the viewpoint of suppressing glass instability, the content of Li 2 O is preferably 15 mol % or less, more preferably 14 mol % or less, even more preferably 13 mol % or less, and even more preferably 12 mol % or less.

 ROとしてNaOを含む場合、NaOの含有量は0.1~30モル%が好ましい。ここで、NaOによる上記効果を好適に得る観点から、NaOを含む場合の含有量は0.1モル%以上が好ましく、5モル%以上がより好ましく、10モル%以上がさらに好ましく、15モル%以上がよりさらに好ましい。また、ガラスが不安定になるのを抑制する観点から、NaOの含有量は30モル%以下が好ましく、28モル%以下がより好ましく、26モル%以下がさらに好ましく、24モル%以下がよりさらに好ましい。 When Na 2 O is included as R 2 O, the content of Na 2 O is preferably 0.1 to 30 mol %. Here, from the viewpoint of suitably obtaining the above-mentioned effect of Na 2 O, the content of Na 2 O when included is preferably 0.1 mol % or more, more preferably 5 mol % or more, even more preferably 10 mol % or more, and even more preferably 15 mol % or more. Also, from the viewpoint of suppressing glass instability, the content of Na 2 O is preferably 30 mol % or less, more preferably 28 mol % or less, even more preferably 26 mol % or less, and even more preferably 24 mol % or less.

 ROとしてKOを含む場合、KOの含有量は0.1~20モル%が好ましい。ここで、KOによる上記効果を好適に得る観点から、KOを含む場合の含有量は0.1モル%以上が好ましく、4モル%以上よりが好ましく、8モル%以上がさらに好ましく、10モル%以上がよりさらに好ましい。また、ガラスが不安定になるのを抑制する観点から、KOの含有量は20モル%以下が好ましく、18モル%以下がより好ましく、16モル%以下がさらに好ましく、14モル%以下がよりさらに好ましい。 When K 2 O is included as R 2 O, the content of K 2 O is preferably 0.1 to 20 mol %. Here, from the viewpoint of suitably obtaining the above-mentioned effects of K 2 O, the content of K 2 O when included is preferably 0.1 mol % or more, more preferably 4 mol % or more, further preferably 8 mol % or more, and even more preferably 10 mol % or more. Also, from the viewpoint of suppressing glass instability, the content of K 2 O is preferably 20 mol % or less, more preferably 18 mol % or less, further preferably 16 mol % or less, and even more preferably 14 mol % or less.

 R’Oは、ガラスの安定性を高め、ガラスの溶融温度を低くするための成分である。R’はMg、Ca、Sr、Ba及びZnを意味し、ΣR’Oは、MgO、CaO、SrO、BaO及びZnOの合計量を意味する。
 ΣR’Oは0~30モル%が好ましく、0~10モル%がより好ましい。ここで、R’Oによる上記効果を好適に得る観点から、R’Oを含有する場合のΣR’Oは2モル%以上が好ましく、4モル%以上がより好ましく、6モル%以上がさらに好ましい。また、ガラスが不安定になるのを抑制する観点から、ΣR’Oは30モル%以下が好ましく、20モル%以下がより好ましく、10モル%以下がさらに好ましい。
R'O is a component for increasing the stability of glass and lowering the melting temperature of glass. R' means Mg, Ca, Sr, Ba, and Zn, and ΣR'O means the total amount of MgO, CaO, SrO, BaO, and ZnO.
ΣR'O is preferably 0 to 30 mol%, and more preferably 0 to 10 mol%. From the viewpoint of obtaining the above-mentioned effect of R'O, ΣR'O in the case where R'O is contained is preferably 2 mol% or more, more preferably 4 mol% or more, and even more preferably 6 mol% or more. From the viewpoint of suppressing the glass from becoming unstable, ΣR'O is preferably 30 mol% or less, more preferably 20 mol% or less, and even more preferably 10 mol% or less.

 R’OのうちMgO、CaO及びSrOは、ガラスの安定性を高める効果がある一方で、近赤外域の光の吸収性を低下させる成分である。これらの合計の含有量は20モル%以下が好ましく、15モル%以下がより好ましく、10モル%以下がさらに好ましく、含有しなくてもよい。 Among the R'O components, MgO, CaO, and SrO have the effect of increasing the stability of the glass, but are also components that reduce the absorbency of light in the near infrared region. The total content of these components is preferably 20 mol% or less, more preferably 15 mol% or less, and even more preferably 10 mol% or less, and may not be present.

 R’OのうちBaOは、ガラスの溶融温度を低くする効果がある一方で、ガラスが不安定となる、近赤外域の光の吸収性を低下させる成分である。BaOの含有量は0~20モル%が好ましい。ここで、ガラスの溶融温度を好適に低くする観点から、BaOの含有量は5モル%以上が好ましく、10モル%以上がより好ましく、15モル%以上がさらに好ましい。また、ガラスが不安定になるのを抑制する観点からは、BaOの含有量は20モル%以下が好ましく、10モル%以下がより好ましく、5モル%以下がさらに好ましく、含有しなくてもよい。 Among R'O, BaO has the effect of lowering the melting temperature of the glass, but it is also a component that makes the glass unstable and reduces the absorbency of light in the near infrared region. The BaO content is preferably 0 to 20 mol%. Here, from the viewpoint of suitably lowering the melting temperature of the glass, the BaO content is preferably 5 mol% or more, more preferably 10 mol% or more, and even more preferably 15 mol% or more. Furthermore, from the viewpoint of preventing the glass from becoming unstable, the BaO content is preferably 20 mol% or less, more preferably 10 mol% or less, and even more preferably 5 mol% or less, and may not be contained.

 R’OのうちZnOは、ガラスの溶融温度を低くする効果がある一方で、ガラスの溶解性を低下させる成分である。ZnOの含有量は0~20モル%が好ましい。ここで、ガラスの溶融温度を好適に低くする観点から、ZnOの含有量は1モル%以上が好ましく、3モル%以上がより好ましく、5モル%以上がさらに好ましい。また、ガラスの溶解性を維持する観点から、BaOの含有量は20モル%以下が好ましく、15モル%以下がより好ましく、10モル%以下がさらに好ましい。 Among R'O, ZnO has the effect of lowering the melting temperature of glass, but is also a component that reduces the solubility of glass. The ZnO content is preferably 0 to 20 mol%. From the viewpoint of suitably lowering the melting temperature of glass, the ZnO content is preferably 1 mol% or more, more preferably 3 mol% or more, and even more preferably 5 mol% or more. Furthermore, from the viewpoint of maintaining the solubility of glass, the BaO content is preferably 20 mol% or less, more preferably 15 mol% or less, and even more preferably 10 mol% or less.

 本実施形態に係るガラスは近赤外線吸収成分としてCuOを含むことが好ましいが、CuO以外の近赤外線吸収成分を含有していてもよく、例えば、Fe、V等が挙げられる。
 CuOを含む近赤外線吸収成分の合計の含有量は0.5~30モル%が好ましい。ここで、近赤外域の光の吸収性を高める観点から、上記合計の含有量は0.5モル%以上が好ましく、5モル%以上がより好ましく、7モル%以上がさらに好ましく、10モル%以上がよりさらに好ましい。また、可視域の光透過性が低下するのを抑制する観点から、上記合計の含有量は30モル%以下が好ましく、27モル%以下がより好ましく、25モル%以下がさらに好ましく、23モル%以下がよりさらに好ましい。
The glass according to this embodiment preferably contains CuO as a near-infrared absorbing component, but may contain a near-infrared absorbing component other than CuO, such as Fe 2 O 3 or V 2 O 5 .
The total content of the near-infrared absorbing components including CuO is preferably 0.5 to 30 mol%. Here, from the viewpoint of increasing the absorbency of light in the near-infrared region, the total content is preferably 0.5 mol% or more, more preferably 5 mol% or more, even more preferably 7 mol% or more, and even more preferably 10 mol% or more. Also, from the viewpoint of suppressing a decrease in light transmittance in the visible region, the total content is preferably 30 mol% or less, more preferably 27 mol% or less, even more preferably 25 mol% or less, and even more preferably 23 mol% or less.

 CuO以外の近赤外線吸収成分として、Feの含有量は0.5~30モル%が好ましい。ここで、近赤外域の光の吸収性を高める観点から、Feの含有量は0.5モル%以上が好ましく、5モル%以上がより好ましく、7モル%以上がさらに好ましく、10モル%以上がよりさらに好ましい。また、Fe3+として存在する割合の増加により可視域の光透過性が低下するのを抑制する観点から、Feの含有量は30モル%以下が好ましく、27モル%以下がより好ましく、25モル%以下がさらに好ましく、23モル%以下がよりさらに好ましい。
 近赤外域の光の吸収性を効率的に高める観点からは、近赤外線吸収成分であるCuOの含有量が、Fe及びVの少なくとも一方の含有量よりも多いことが好ましく、Fe及びVの双方の含有量よりも多いことがより好ましい。
As a near infrared absorbing component other than CuO, the content of Fe 2 O 3 is preferably 0.5 to 30 mol%. Here, from the viewpoint of increasing the absorbency of light in the near infrared region, the content of Fe 2 O 3 is preferably 0.5 mol% or more, more preferably 5 mol% or more, even more preferably 7 mol% or more, and even more preferably 10 mol% or more. In addition, from the viewpoint of suppressing the decrease in light transmittance in the visible region due to an increase in the proportion of Fe 3+ present, the content of Fe 2 O 3 is preferably 30 mol% or less, more preferably 27 mol% or less, even more preferably 25 mol% or less, and even more preferably 23 mol% or less.
From the viewpoint of efficiently increasing the absorbency of light in the near-infrared region, the content of CuO, which is a near-infrared absorbing component, is preferably greater than the content of at least one of Fe 2 O 3 and V 2 O 5 , and more preferably greater than the contents of both Fe 2 O 3 and V 2 O 5 .

 上記に加え、本実施形態に係るガラスは、TiO、WO及びNbからなる群より選ばれる1以上を含むことが、後処理による{[H ]/[H ]}で表される比を小さくする効果を好適に得られる観点から好ましい。 In addition to the above, the glass according to this embodiment preferably contains one or more selected from the group consisting of TiO 2 , WO 3 and Nb 2 O 5, from the viewpoint of suitably obtaining the effect of reducing the ratio represented by {[H + A ]/[H + B ]} by post-treatment.

 TiOの含有量は0~10モル%が好ましい。ここで、上記後処理による効果がより得やすくなる観点から、TiOの含有量は1モル%以上がより好ましく、2モル%以上がさらに好ましく、3モル%以上がさらに一層好ましい。また、可視域の透過率低下を抑制する観点から、TiOの含有量は10モル%以下が好ましく、9モル%以下がより好ましく、8モル%以下がさらに好ましく、7モル%以下がさらに一層好ましい。 The content of TiO2 is preferably 0 to 10 mol%. Here, from the viewpoint of making it easier to obtain the effects of the above-mentioned post-treatment, the content of TiO2 is more preferably 1 mol% or more, even more preferably 2 mol% or more, and even more preferably 3 mol% or more. Also, from the viewpoint of suppressing a decrease in the transmittance in the visible range, the content of TiO2 is preferably 10 mol% or less, more preferably 9 mol% or less, even more preferably 8 mol% or less, and even more preferably 7 mol% or less.

 WOの含有量は0~10モル%が好ましい。ここで、前記後処理による効果がより得やすくなる観点から、WOの含有量は1モル%以上がより好ましく、2モル%以上がさらに好ましく、3モル%以上がさらに一層好ましい。また、可視域の透過率低下を抑制する観点から、WOの含有量は10モル%以下が好ましく、9モル%以下がより好ましく、8モル%以下がさらに好ましく、7モル%以下がさらに一層好ましい。 The content of WO3 is preferably 0 to 10 mol%. Here, from the viewpoint of making it easier to obtain the effects of the post-treatment, the content of WO3 is more preferably 1 mol% or more, even more preferably 2 mol% or more, and even more preferably 3 mol% or more. Also, from the viewpoint of suppressing a decrease in the transmittance in the visible range, the content of WO3 is preferably 10 mol% or less, more preferably 9 mol% or less, even more preferably 8 mol% or less, and even more preferably 7 mol% or less.

 Nbの含有量は0~10モル%が好ましい。ここで、前記後処理による効果がより得やすくなる観点から、Nbの含有量は1モル%以上がより好ましく、2モル%以上がさらに好ましく、3モル%以上がさらに一層好ましい。また、可視域の透過率低下を抑制する観点から、Nbの含有量は10モル%以下が好ましく、9モル%以下がより好ましく、8モル%以下がさらに好ましく、7モル%以下がさらに一層好ましい。 The content of Nb 2 O 5 is preferably 0 to 10 mol %. From the viewpoint of more easily obtaining the effect of the post-treatment, the content of Nb 2 O 5 is more preferably 1 mol % or more, even more preferably 2 mol % or more, and even more preferably 3 mol % or more. From the viewpoint of suppressing a decrease in the transmittance in the visible range, the content of Nb 2 O 5 is preferably 10 mol % or less, more preferably 9 mol % or less, even more preferably 8 mol % or less, and even more preferably 7 mol % or less.

 本実施形態に係るガラスは、Pに加え、BやSiOといったガラスのネットワーク形成成分を含んでいてもよい。
 P、B及びSiOの合計の含有量は25~90モル%が好ましい。ここで、ガラスの強度低下を抑制する観点から、上記合計の含有量は30モル%以上がより好ましく、35モル%以上がさらに好ましく、40モル%以上がさらに一層好ましい。また、ガラスの溶解温度上昇を抑制する観点から、上記合計の含有量は90モル%以下が好ましく、80モル%以下がより好ましく、70モル%以下がさらに好ましく、60モル%以下がさらに一層好ましい。
The glass according to this embodiment may contain, in addition to P 2 O 5 , glass network-forming components such as B 2 O 3 and SiO 2 .
The total content of P 2 O 5 , B 2 O 3 and SiO 2 is preferably 25 to 90 mol %. From the viewpoint of suppressing a decrease in the strength of the glass, the total content is more preferably 30 mol % or more, even more preferably 35 mol % or more, and even more preferably 40 mol % or more. From the viewpoint of suppressing an increase in the melting temperature of the glass, the total content is preferably 90 mol % or less, more preferably 80 mol % or less, even more preferably 70 mol % or less, and even more preferably 60 mol % or less.

 Bの含有量は0~30モル%が好ましい。ここで、ガラス強度低下を抑制する観点から、Bの含有量は1モル%以上がより好ましく、5モル%以上がさらに好ましく、10モル%以上がさらに一層好ましい。また、ガラスの耐候性低下を抑制する観点から、Bの含有量は30モル%以下が好ましく、25モル%以下がより好ましく、20モル%以下がさらに好ましく、15モル%以下がさらに一層好ましい。 The content of B 2 O 3 is preferably 0 to 30 mol %. From the viewpoint of suppressing a decrease in glass strength, the content of B 2 O 3 is more preferably 1 mol % or more, even more preferably 5 mol % or more, and even more preferably 10 mol % or more. From the viewpoint of suppressing a decrease in weather resistance of the glass, the content of B 2 O 3 is preferably 30 mol % or less, more preferably 25 mol % or less, even more preferably 20 mol % or less, and even more preferably 15 mol % or less.

 SiOの含有量は0~30モル%が好ましい。ここで、ガラスの耐候性を改善する観点から、SiOの含有量は0.5モル%以上がより好ましく、1モル%以上がさらに好ましく、2モル%以上がさらに一層好ましい。また、ガラスの溶解温度上昇を抑制する観点から、SiOの含有量は30モル%以下が好ましく、25モル%以下がより好ましく、20モル%以下がさらに好ましく、15モル%以下がさらに一層好ましく、含有しなくてもよい。 The content of SiO 2 is preferably 0 to 30 mol%. Here, from the viewpoint of improving the weather resistance of the glass, the content of SiO 2 is more preferably 0.5 mol% or more, even more preferably 1 mol% or more, and even more preferably 2 mol% or more. Also, from the viewpoint of suppressing an increase in the melting temperature of the glass, the content of SiO 2 is preferably 30 mol% or less, more preferably 25 mol% or less, even more preferably 20 mol% or less, even more preferably 15 mol% or less, and may not be contained.

 本実施形態に係るガラスは、リン酸ガラスの中でもフツリン酸ガラスと称される、フッ化物を含有するガラスでもよい。フツリン酸ガラスはフッ化物を含有することで高い耐候性を示すが、同じ組成であった場合に、{[H ]/[H ]}で表される比を2超から2以下とすることで、その耐候性はさらに向上する。
 フツリン酸ガラスは、上述したように、そもそも耐候性が高いガラスである。そのため、上記比を2以下とすることによる耐候性向上の度合いは、フッ化物を含有しないガラスである場合に顕著である。また、フッ化物を含有していても、その含有量が少なく、耐候性向上に寄与しない程度であるガラスである場合にも、上記比を2以下とすることによる耐候性向上の度合いは顕著である。
The glass according to the present embodiment may be a glass containing fluoride, which is called fluorophosphate glass among phosphate glasses. Fluorophosphate glass exhibits high weather resistance due to the inclusion of fluoride, but when the glass has the same composition, the weather resistance can be further improved by changing the ratio represented by {[H + A ]/[H + B ]} from more than 2 to 2 or less.
As described above, fluorophosphate glass is a glass with high weather resistance to begin with. Therefore, the degree of improvement in weather resistance by making the above ratio 2 or less is remarkable in the case of glass that does not contain fluoride. Even in the case of glass that contains fluoride but the content is so small that it does not contribute to improving weather resistance, the degree of improvement in weather resistance by making the above ratio 2 or less is remarkable.

 上記観点、及び環境保全の観点から、本実施形態に係るガラスにおけるFのモル%表記での含有量は7%以下が好ましく、5%以下がより好ましく、3%以下がさらに好ましく、2%以下がさらに一層好ましく、1%以下が特に好ましく、含有しなくてもよい。なお、本実施形態に係るガラスにおけるFの含有量は、外割の表示とし、酸化物基準で表示するガラス成分の合計含有量に含まない。すなわち、上記外割とは、ガラス中に含まれるFの以外のガラス組成を100モル%としたときの、Fの含有量を意味する。 From the above viewpoints, and from the viewpoint of environmental conservation, the F content in the glass according to this embodiment, expressed as mol %, is preferably 7% or less, more preferably 5% or less, even more preferably 3% or less, even more preferably 2% or less, and particularly preferably 1% or less, and may not be contained at all. Note that the F content in the glass according to this embodiment is expressed as an exclusive percentage, and is not included in the total content of the glass components expressed on an oxide basis. In other words, the above-mentioned exclusive percentage means the F content when the glass composition other than F contained in the glass is taken as 100 mol %.

 本実施形態に係るガラスは、上記成分に加えて、本発明の効果を損なわない範囲において、他の成分を含有していてもよい。他の成分としては、例えば、GeO、ZrO、SnO、CeO、Y、La、Gd、Yb等が挙げられる。これら他の成分を含有する場合の合計の含有量は0~5モル%が好ましい。ここで、他の成分による効果を好適に得る観点から、上記合計の含有量は0.1モル%以上がより好ましく、0.2モル%以上がさらに好ましい。また、近赤外域の光の吸収性が悪化するのを抑制する観点から、上記合計の含有量は5モル%以下が好ましく、4モル%以下がより好ましく、3モル%以下がさらに好ましい。 In addition to the above components, the glass according to this embodiment may contain other components within a range that does not impair the effects of the present invention. Examples of other components include GeO 2 , ZrO 2 , SnO 2 , CeO 2 , Y 2 O 3 , La 2 O 3 , Gd 2 O 3 , and Yb 2 O 3 . When these other components are contained, the total content is preferably 0 to 5 mol%. Here, from the viewpoint of obtaining the effects of the other components in a favorable manner, the total content is more preferably 0.1 mol% or more, and even more preferably 0.2 mol% or more. In addition, from the viewpoint of suppressing deterioration of the absorbency of light in the near infrared region, the total content is preferably 5 mol% or less, more preferably 4 mol% or less, and even more preferably 3 mol% or less.

 また、本実施形態に係るガラスは、PbO、As、及びGdFのいずれも実質的に含有しないことが好ましい。
 PbOは、ガラスの粘度を下げ、製造作業性を向上させる成分である。また、Asは、幅広い温度域で清澄ガスを発生できる優れた清澄剤として作用する成分である。しかし、PbO及びAsは共に環境負荷物質であるため、できるだけ含有しないことが好ましい。
 GdFは、ガラスを安定化させる成分であるものの、原料が比較的高価であり、コストアップにつながることから、できるだけ含有しないことが好ましい。
 上記3成分について、「実質的に含有しない」とは、原料として意図して用いないことを意味しており、ガラス中の各成分の含有量がそれぞれ0.1モル%以下を意味する。
Moreover, it is preferable that the glass according to this embodiment contains substantially no PbO, As 2 O 3 , or GdF 3 .
PbO is a component that reduces the viscosity of glass and improves manufacturing workability. Also, As2O3 is a component that acts as an excellent clarifier that can generate clarified gas in a wide temperature range. However, since both PbO and As2O3 are environmentally hazardous substances, it is preferable to avoid their inclusion as much as possible.
Although GdF3 is a component that stabilizes glass, the raw material is relatively expensive, which leads to increased costs, so it is preferable to avoid its inclusion as much as possible.
With regard to the above three components, "substantially not contained" means that they are not intentionally used as raw materials, and the content of each component in the glass is 0.1 mol % or less.

《近赤外線吸収カットフィルタ》
 本実施形態に係る近赤外線吸収カットフィルタは、上記《ガラス》に記載のガラスを含む。このガラスの好適な態様も、上記《ガラス》に記載の好適な態様と同様である。
Near-infrared absorption cut filter
The near-infrared absorption cut filter according to this embodiment includes the glass described above in "Glass." The preferred aspects of this glass are also similar to the preferred aspects described above in "Glass."

 本実施形態に係る近赤外線吸収カットフィルタは、所定の形状に成形されたガラスの少なくとも一方の主面に光学多層膜が設けられていてもよい。
 光学多層膜としては、例えば、IRカット膜、UV/IRカット膜(紫外線及び近赤外線を反射する膜)、UVカット膜、反射防止膜等が挙げられる。光学多層膜は、従来公知の方法により形成できるが、例えば、蒸着法、スパッタリング法等が挙げられる。
The near-infrared absorption cut filter according to this embodiment may have an optical multilayer film provided on at least one main surface of glass formed into a predetermined shape.
Examples of optical multilayer films include IR cut films, UV/IR cut films (films that reflect ultraviolet and near infrared rays), UV cut films, anti-reflection films, etc. The optical multilayer film can be formed by a conventionally known method, such as a vapor deposition method, a sputtering method, etc.

 ガラスと光学多層膜の間には、密着強化膜が設けられていてもよい。これにより、ガラスと光学多層膜の密着性が向上し、膜剥がれを抑制できる。
 密着強化膜としては、例えば、酸化ケイ素(SiO)、酸化チタン(TiO)、ランタンチタン酸塩(LaTi)、酸化アルミニウム(Al)、酸化アルミニウムと酸化ジルコニウム(ZrO)との混合物、フッ化マグネシウム(MgF)、フッ化カルシウム(CaF)、フッ化ストロンチウム(SrF)、フッ素シリコーン等が挙げられる。
 フッ素又は酸素を含む物質であればより密着性が高く、特にフッ化マグネシウムや酸化チタンはガラスや膜との密着性が高くなるため好ましい。
 密着強化膜は、単層でもよく、2層以上でもよい。2層以上の場合、複数の物質を組み合わせてもよい。
An adhesion-strengthening film may be provided between the glass and the optical multilayer film, which improves the adhesion between the glass and the optical multilayer film and prevents the film from peeling off.
Examples of the adhesion-strengthening film include silicon oxide (SiO 2 ), titanium oxide (TiO 2 ), lanthanum titanate (La 2 Ti 2 O 7 ), aluminum oxide (Al 2 O 3 ), a mixture of aluminum oxide and zirconium oxide (ZrO 2 ), magnesium fluoride (MgF 2 ), calcium fluoride (CaF 2 ), strontium fluoride (SrF 2 ), and fluorosilicone.
Substances containing fluorine or oxygen have higher adhesion, and magnesium fluoride and titanium oxide are particularly preferred because they have higher adhesion to glass and films.
The adhesion-strengthening film may be a single layer or may be two or more layers. In the case of two or more layers, a combination of a plurality of materials may be used.

 本実施形態に係る近赤外線吸収カットフィルタは、本実施形態のガラスの少なくとも一方の主面に、近赤外域に最大吸収波長を有する近赤外線吸収材を含む吸収層を備えてもよい。このような構成とすることで、近赤外域の光の透過率をより低く抑えた光学フィルタを得ることができる。 The near-infrared absorption cut filter according to this embodiment may have an absorption layer containing a near-infrared absorbing material having a maximum absorption wavelength in the near-infrared range on at least one of the main surfaces of the glass according to this embodiment. By adopting such a configuration, it is possible to obtain an optical filter with a lower transmittance of light in the near-infrared range.

 本実施形態に係る近赤外線吸収カットフィルタは、アクリル樹脂、エポキシ樹脂、エン・チオール樹脂、ポリカーボネート樹脂、ポリエーテル樹脂、ポリアリレート樹脂、ポリサルホン樹脂、ポリエーテルサルホン樹脂、ポリパラフェニレン樹脂、ポリアリーレンエーテルフォスフィンオキシド樹脂、ポリイミド樹脂、ポリアミドイミド樹脂、ポリオレフィン樹脂、環状オレフィン樹脂、およびポリエステル樹脂から選択され、これらを1種で単独、もしくは2種以上を混合してなる透明性樹脂中に近赤外線吸収色素を添加して吸収層に含むことが好ましい。
 また、近赤外線吸収色素としては、スクアリリウム色素、フタロシアニン色素、シアニン色素およびジインモニウム色素からなる群より選択される少なくとも1種からなる近赤外線吸収材を用いることが好ましい。
The near-infrared absorption cut filter according to this embodiment is preferably made of a transparent resin selected from an acrylic resin, an epoxy resin, an ene-thiol resin, a polycarbonate resin, a polyether resin, a polyarylate resin, a polysulfone resin, a polyethersulfone resin, a polyparaphenylene resin, a polyarylene ether phosphine oxide resin, a polyimide resin, a polyamideimide resin, a polyolefin resin, a cyclic olefin resin, and a polyester resin, and is preferably made of one of these resins alone or a mixture of two or more of these resins, to which a near-infrared absorbing dye is added and contained in the absorption layer.
As the near-infrared absorbing dye, it is preferable to use a near-infrared absorbing material made of at least one dye selected from the group consisting of squarylium dyes, phthalocyanine dyes, cyanine dyes and diimmonium dyes.

《固体撮像素子》
 本実施形態に係る固体撮像素子は、上記《近赤外線吸収カットフィルタ》に記載の近赤外線吸収カットフィルタを含む。この近赤外線吸収カットフィルタの好適な態様も、上記《近赤外線吸収カットフィルタ》に記載の好適な態様と同様である。
<<Solid-state imaging element>>
The solid-state imaging device according to this embodiment includes the near-infrared absorption cut filter described above in "Near-infrared absorption cut filter." Preferred aspects of this near-infrared absorption cut filter are also similar to the preferred aspects described above in "Near-infrared absorption cut filter."

 本実施形態に係る固体撮像素子は、上記近赤外線吸収カットフィルタの他に撮像レンズを含む。 The solid-state imaging element according to this embodiment includes an imaging lens in addition to the near-infrared absorption cut filter.

 固体撮像素子は、入力される光を電気信号に変換して、画像信号処理回路へ出力する。固体撮像素子は、例えば、Charge Coupled Device(CCD)イメージセンサやComplementary Metal Oxide Semiconductor(CMOS)イメージセンサ等が挙げられる。 The solid-state imaging element converts the input light into an electrical signal and outputs it to an image signal processing circuit. Examples of solid-state imaging elements include a Charge Coupled Device (CCD) image sensor and a Complementary Metal Oxide Semiconductor (CMOS) image sensor.

 上記固体撮像素子を用いた撮像装置は、さらに撮像レンズを含む。上記近赤外線吸収カットフィルタは、撮像レンズと固体撮像素子との間に配置されてもよい。
 また、近赤外線吸収カットフィルタは固体撮像素子から独立して設けられていてもよく、例えば、撮像レンズ等に粘着剤層を介して直接貼着されていてもよい。
The imaging device using the solid-state imaging element may further include an imaging lens, and the near-infrared absorbing cut filter may be disposed between the imaging lens and the solid-state imaging element.
The near-infrared absorbing cut filter may be provided separately from the solid-state imaging element, and may be directly attached to an imaging lens or the like via an adhesive layer, for example.

《ガラスの製造方法》
 上記《ガラス》に記載のガラスの製造方法の一態様を以下に説明する。ただし、製造方法は下記一態様に限定されない。
<Glass manufacturing method>
One embodiment of the method for producing the glass described above in the section "Glass" will be described below. However, the production method is not limited to the following embodiment.

 本実施形態に係るガラスの製造方法は以下の工程を含む。
 工程1:ガラス原料を秤量及び混合し、原料混合物を得る工程
 工程2:工程1で得られた原料混合物を加熱溶解する工程
 工程3:工程2で得られた溶解物を成形する工程
The method for producing glass according to this embodiment includes the following steps.
Step 1: A step of weighing and mixing glass raw materials to obtain a raw material mixture. Step 2: A step of heating and melting the raw material mixture obtained in step 1. Step 3: A step of forming the melt obtained in step 2.

 上記工程3で得られたガラスの{[H ]/[H ]}で表される比が2以下を満たさない場合には、工程4として、後処理する工程をさらに含むことが好ましい。 When the ratio represented by {[H + A ]/[H + B ]} of the glass obtained in the above step 3 does not satisfy 2 or less, it is preferable to further include a step 4 of post-treatment.

〈工程1〉
 工程1は従来公知のものを用い、従来公知の方法を採用して行えばよい。
 例えば、得られるガラスの酸化物基準のモル%表示での含有量が、
 P:30~50%、
 Al:1~10%、
 ΣRO:10~35%、
 ΣR’O:0~10%、
 CuO:1~15%、
 TiO:0~10%、
 WO:0~10%、かつ
 Nb:0~10%を満たすように原料混合物を得ることが、工程4を経ずとも{[H ]/[H ]}で表される比が2以下となるガラスが得やすいため好ましい。
<Step 1>
Step 1 may be carried out using a conventionally known material and employing a conventionally known method.
For example, the content of the resulting glass in mole percent based on oxides is:
P2O5 : 30-50 %,
Al 2 O 3 : 1 to 10%,
ΣR 2 O: 10-35%,
ΣR'O: 0~10%,
CuO: 1-15%,
TiO2 : 0-10%,
It is preferable to obtain a raw material mixture that satisfies WO 3 : 0-10% and Nb 2 O 5 : 0-10%, because this makes it easier to obtain a glass in which the ratio represented by {[H + A ]/[H + B ]} is 2 or less without going through step 4.

〈工程2〉
 工程2の加熱溶解条件も、従来公知の方法と条件を採用できるが、加熱温度は700~1450℃が好ましい。ここで、失透の発生を抑制する観点及び製造時間の短縮化の観点から、上記加熱温度は700℃以上が好ましく、800℃以上がより好ましく、900℃以上がさらに好ましく、1000℃以上がよりさらに好ましい。また、可視域の光の透過性低下を抑制する観点から、上記加熱温度は1450℃以下が好ましく、1400℃以下がより好ましく、1350℃以下がさらに好ましく、1300℃以下がよりさらに好ましい。
<Step 2>
The heating and melting conditions in step 2 can also employ conventionally known methods and conditions, but the heating temperature is preferably 700 to 1450° C. Here, from the viewpoint of suppressing the occurrence of devitrification and from the viewpoint of shortening the production time, the heating temperature is preferably 700° C. or higher, more preferably 800° C. or higher, even more preferably 900° C. or higher, and even more preferably 1000° C. or higher. In addition, from the viewpoint of suppressing a decrease in the transmittance of light in the visible range, the heating temperature is preferably 1450° C. or lower, more preferably 1400° C. or lower, even more preferably 1350° C. or lower, and even more preferably 1300° C. or lower.

〈工程3〉
 工程3は、工程2で得られた溶解物を成形する工程であるが、必要に応じて工程2と工程3の間に酸化剤の添加や、清澄を行う。
 添加剤や清澄剤としては、例えば、ガラスを形成する陽イオンを有する硝酸塩化合物や硫酸塩化合物が挙げられる。
 酸化剤は、ガラス中のCu全量におけるCu2+イオンの割合を増加させることで可視域の光の透過性向上や、近赤外域の光の吸収性向上の効果がある。
<Step 3>
Step 3 is a step of shaping the melt obtained in step 2. If necessary, an oxidizing agent may be added or clarification may be performed between steps 2 and 3.
Additives and fining agents include, for example, nitrate and sulfate compounds having glass-forming cations.
The oxidizing agent has the effect of increasing the proportion of Cu 2+ ions in the total amount of Cu in the glass, thereby improving the transmittance of light in the visible range and improving the absorbance of light in the near-infrared range.

 硝酸塩化合物や硫酸塩化合物の添加量は、原料混合物に対して、外割添加で0.5~10質量%が好ましい。可視域の光の透過性をより向上させる観点から、上記添加量は0.5質量%以上が好ましく、1質量%以上がより好ましく、3質量%以上がより好ましい。また、添加による効果が頭打ちとなる観点、及びガラスの形成性の観点から、上記添加量は10質量%以下が好ましく、8質量%以下がより好ましく、6質量%以下がさらに好ましい。 The amount of nitrate compounds or sulfate compounds added is preferably 0.5 to 10 mass% based on the raw material mixture in terms of the total amount added. From the viewpoint of further improving the transmittance of light in the visible range, the amount added is preferably 0.5 mass% or more, more preferably 1 mass% or more, and even more preferably 3 mass% or more. Also, from the viewpoint of the effect of the addition reaching a plateau and from the viewpoint of glass formability, the amount added is preferably 10 mass% or less, more preferably 8 mass% or less, and even more preferably 6 mass% or less.

 硝酸塩化合物としては、例えば、Al(NO、LiNO、NaNO、KNO、Ca(NO、Sr(NO、Ba(NO、Zn(NO、Cu(NO等が挙げられる。
 硫酸塩化合物としては、例えば、Al(SO・16HO、LiSO、NaSO、KSO、CaSO、SrSO、BaSO、ZnSO、CuSO等が挙げられる。
Examples of nitrate compounds include Al( NO3 ) 3 , LiNO3 , NaNO3 , KNO3 , Ca( NO3 ) 2 , Sr( NO3 ) 2 , Ba( NO3 ) 2 , Zn( NO3 ) 2 , and Cu( NO3 ) 2 .
Examples of sulfate compounds include Al2 ( SO4 ) 3.16H2O , Li2SO4 , Na2SO4 , K2SO4 , CaSO4 , SrSO4 , BaSO4 , ZnSO4 , and CuSO4 .

〈工程4〉
 工程4は任意であるが、工程3で得られたガラスの{[H ]/[H ]}で表される比が2以下を満たさない場合には、工程4として、後処理する工程をさらに含むことが好ましい。
 後処理方法は、ガラスの表面におけるH濃度[H ]が小さくなればよく、例えば表面研磨処理、熱処理、薬液処理、ガス処理、イオン交換処理、プラズマ処理等が挙げられる。
 熱処理は、例えばガラスのガラス転移温度(Tg)付近の温度で行うことが好ましく、(Tg±100)℃の範囲の温度で行うことがより好ましい。
 薬液処理で用いられる薬液は、ガラス表面が劣化しない程度に、酸性、中性、アルカリ性の溶液を適宜選択できる。
<Step 4>
Step 4 is optional. However, when the ratio represented by {[H + A ]/[H + B ]} of the glass obtained in step 3 does not satisfy 2 or less, it is preferable to further include a step of performing a post-treatment as step 4.
The post-treatment method may be any method that reduces the H + concentration [H + A ] on the glass surface, and examples thereof include surface polishing treatment, heat treatment, chemical treatment, gas treatment, ion exchange treatment, and plasma treatment.
The heat treatment is preferably carried out at a temperature near the glass transition temperature (Tg) of the glass, and more preferably at a temperature in the range of (Tg±100)°C.
The chemical used in the chemical treatment can be appropriately selected from acidic, neutral, and alkaline solutions to the extent that the glass surface is not deteriorated.

 以下に、実施例を挙げて本発明を具体的に説明するが、本発明はこれに限定されない。また、例1~例4、例6~16は実施例であり、例5は比較例である。 The present invention will be specifically explained below with reference to examples, but the present invention is not limited thereto. Examples 1 to 4 and Examples 6 to 16 are examples, and Example 5 is a comparative example.

《試験例》
〈例1〉
 表1の組成となるように、ガラス原料を秤量及び混合し、原料混合物を得た。次いで、原料混合物を1100℃で2時間加熱溶解した。得られた溶解物に対し、清澄、撹拌した後、モールドに鋳込み、徐冷を行った。次いで、研磨により40mm×30mm、厚み0.21mmのガラスを得た。このガラスのガラス転移温度は450℃であった。
 さらに後処理として大気雰囲気中、450℃で12時間の熱処理を行った。
 なお、表1中の「組成(モル%)」における「-」とは、ガラス原料として意識的に添加していないことを意味する。表2、表3においても同様である。
Test Example
Example 1:
Glass raw materials were weighed and mixed to obtain a raw material mixture having the composition shown in Table 1. The raw material mixture was then heated and melted at 1100°C for 2 hours. The melt obtained was clarified and stirred, then poured into a mold and slowly cooled. Next, a glass having a size of 40 mm x 30 mm and a thickness of 0.21 mm was obtained by polishing. The glass transition temperature of this glass was 450°C.
Further, as a post-treatment, a heat treatment was carried out in an air atmosphere at 450° C. for 12 hours.
In addition, "-" in "Composition (mol %)" in Table 1 means that it was not intentionally added as a glass raw material. The same applies to Tables 2 and 3.

〈例2〉
 得られたガラスに対し、後処理として窒素雰囲気中、450℃で12時間の熱処理を行った以外は例1と同様にしてガラスを得た。
Example 2:
Glass was obtained in the same manner as in Example 1, except that the obtained glass was subjected to a heat treatment at 450° C. for 12 hours in a nitrogen atmosphere as a post-treatment.

〈例3〉
 得られたガラスに対し、後処理を行わなかった以外は例1と同様にしてガラスを得た。
Example 3:
A glass was obtained in the same manner as in Example 1, except that the obtained glass was not subjected to any post-treatment.

〈例4〉
 表1の組成となるように、ガラス原料を秤量及び混合し、原料混合物を得た。次いで、原料混合物を1050℃で2時間加熱溶解した。得られた溶解物に対し、清澄、撹拌した後、モールドに鋳込み、徐冷を行った。次いで、研磨により40mm×30mm、厚み0.21mmのガラスを得た。このガラスのガラス転移温度は460℃であった。
 さらに後処理として大気雰囲気中、450℃で12時間の熱処理を行った。
Example 4:
Glass raw materials were weighed and mixed to obtain a raw material mixture having the composition shown in Table 1. The raw material mixture was then heated and melted at 1050°C for 2 hours. The melt obtained was clarified and stirred, then poured into a mold and slowly cooled. Next, a glass having a size of 40 mm x 30 mm and a thickness of 0.21 mm was obtained by polishing. The glass transition temperature of this glass was 460°C.
Further, as a post-treatment, a heat treatment was carried out in an air atmosphere at 450° C. for 12 hours.

〈例5〉
 後処理を行わなかった以外は例4と同様にしてガラスを得た。
Example 5:
A glass was obtained in the same manner as in Example 4, except that no post-treatment was carried out.

〈例6〉
 表2の組成となるように、ガラス原料を秤量及び混合し、原料混合物を得た。次いで、原料混合物を1250℃で2時間加熱溶解した。得られた溶解物に対し、清澄、撹拌した後、モールドに鋳込み、徐冷を行った。次いで、研磨により40mm×30mm、厚み0.21mmのガラスを得た。このガラスのガラス転移温度は測定をしていない。
Example 6:
Glass raw materials were weighed and mixed to obtain a raw material mixture having the composition shown in Table 2. The raw material mixture was then heated and melted at 1250° C. for 2 hours. The melt obtained was clarified and stirred, then poured into a mold and slowly cooled. Next, a glass having a size of 40 mm×30 mm and a thickness of 0.21 mm was obtained by polishing. The glass transition temperature of this glass was not measured.

〈例7〉
 表2の組成となるように、ガラス原料を秤量及び混合し、原料混合物を得た。次いで、原料混合物を1200℃で2時間加熱溶解した。得られた溶解物に対し、清澄、撹拌した後、モールドに鋳込み、徐冷を行った。次いで、研磨により40mm×30mm、厚み0.21mmのガラスを得た。このガラスのガラス転移温度は433℃であった。
 さらに後処理として大気雰囲気中、425℃で24時間の熱処理を行った。
Example 7:
Glass raw materials were weighed and mixed to obtain a raw material mixture having the composition shown in Table 2. The raw material mixture was then heated and melted at 1200°C for 2 hours. The melt obtained was clarified and stirred, then poured into a mold and slowly cooled. Next, a glass having a size of 40 mm x 30 mm and a thickness of 0.21 mm was obtained by polishing. The glass transition temperature of this glass was 433°C.
Further, as a post-treatment, a heat treatment was carried out in an air atmosphere at 425° C. for 24 hours.

〈例8〉
 得られたガラスに対し、後処理として大気雰囲気中、440℃で48時間の熱処理を行った以外は例7と同様にしてガラスを得た。
Example 8:
A glass was obtained in the same manner as in Example 7, except that the obtained glass was subjected to a heat treatment at 440° C. for 48 hours in an air atmosphere as a post-treatment.

〈例9〉
 表2の組成となるように、ガラス原料を秤量及び混合し、原料混合物を得た。次いで、原料混合物を1200℃で2時間加熱溶解した。得られた溶解物に対し、清澄、撹拌した後、モールドに鋳込み、徐冷を行った。次いで、研磨により40mm×30mm、厚み0.21mmのガラスを得た。このガラスのガラス転移温度は438℃であった。
 さらに後処理として大気雰囲気中、425℃で24時間の熱処理を行った。
Example 9:
Glass raw materials were weighed and mixed to obtain a raw material mixture having the composition shown in Table 2. The raw material mixture was then heated and melted at 1200°C for 2 hours. The melt obtained was clarified and stirred, then poured into a mold and slowly cooled. Next, a glass having a size of 40 mm x 30 mm and a thickness of 0.21 mm was obtained by polishing. The glass transition temperature of this glass was 438°C.
Further, as a post-treatment, a heat treatment was carried out in an air atmosphere at 425° C. for 24 hours.

〈例10〉
 後処理を行わなかった以外は例9と同様にしてガラスを得た。
Example 10:
A glass was obtained in the same manner as in Example 9, except that no post-treatment was carried out.

〈例11〉
 表3の組成となるように、ガラス原料を秤量及び混合し、原料混合物を得た。次いで、原料混合物を1200℃で2時間加熱溶解した。得られた溶解物に対し、清澄、撹拌した後、モールドに鋳込み、徐冷を行った。次いで、研磨により40mm×30mm、厚み0.21mmのガラスを得た。このガラスのガラス転移温度は433℃であった。
 さらに後処理として大気雰囲気中、405℃で24時間の熱処理を行った。
Example 11:
Glass raw materials were weighed and mixed to obtain a raw material mixture having the composition shown in Table 3. The raw material mixture was then heated and melted at 1200°C for 2 hours. The melt obtained was clarified and stirred, then poured into a mold and slowly cooled. Next, a glass having a size of 40 mm x 30 mm and a thickness of 0.21 mm was obtained by polishing. The glass transition temperature of this glass was 433°C.
Further, as a post-treatment, a heat treatment was carried out in an air atmosphere at 405° C. for 24 hours.

〈例12〉
 得られたガラスに対し、後処理として大気雰囲気中、420℃で48時間の熱処理を行った以外は例11と同様にしてガラスを得た。
Example 12
A glass was obtained in the same manner as in Example 11, except that the obtained glass was subjected to a heat treatment at 420° C. for 48 hours in an air atmosphere as a post-treatment.

〈例13〉
 表3の組成となるように、ガラス原料を秤量及び混合し、原料混合物を得た。次いで、原料混合物を1200℃で2時間加熱溶解した。得られた溶解物に対し、清澄、撹拌した後、モールドに鋳込み、徐冷を行った。次いで、研磨により40mm×30mm、厚み0.21mmのガラスを得た。このガラスのガラス転移温度は401℃であった。
 さらに後処理として大気雰囲気中、390℃で24時間の熱処理を行った。
Example 13
Glass raw materials were weighed and mixed to obtain a raw material mixture having the composition shown in Table 3. The raw material mixture was then heated and melted at 1200°C for 2 hours. The melt obtained was clarified and stirred, then poured into a mold and slowly cooled. Next, a glass having a size of 40 mm x 30 mm and a thickness of 0.21 mm was obtained by polishing. The glass transition temperature of this glass was 401°C.
Further, as a post-treatment, a heat treatment was carried out in an air atmosphere at 390° C. for 24 hours.

〈例14〉
 表3の組成となるように、ガラス原料を秤量及び混合し、原料混合物を得た。次いで、原料混合物を1200℃で2時間加熱溶解した。得られた溶解物に対し、清澄、撹拌した後、モールドに鋳込み、徐冷を行った。次いで、研磨により40mm×30mm、厚み0.21mmのガラスを得た。このガラスのガラス転移温度は399℃であった。
 さらに後処理として大気雰囲気中、404℃で48時間の熱処理を行った。
Example 14:
Glass raw materials were weighed and mixed to obtain a raw material mixture having the composition shown in Table 3. The raw material mixture was then heated and melted at 1200°C for 2 hours. The melt obtained was clarified and stirred, then poured into a mold and slowly cooled. Next, a glass having a size of 40 mm x 30 mm and a thickness of 0.21 mm was obtained by polishing. The glass transition temperature of this glass was 399°C.
Further, as a post-treatment, a heat treatment was carried out in an air atmosphere at 404° C. for 48 hours.

〈例15〉
 表3の組成となるように、ガラス原料を秤量及び混合し、原料混合物を得た。次いで、原料混合物を1300℃で2時間加熱溶解した。得られた溶解物に対し、清澄、撹拌した後、モールドに鋳込み、徐冷を行った。次いで、研磨により40mm×30mm、厚み0.21mmのガラスを得た。このガラスのガラス転移温度は408℃であった。
 さらに後処理として大気雰囲気中、378℃で48時間の熱処理を行った。
Example 15:
Glass raw materials were weighed and mixed to obtain a raw material mixture having the composition shown in Table 3. The raw material mixture was then heated and melted at 1300°C for 2 hours. The melt obtained was clarified and stirred, then poured into a mold and slowly cooled. Next, a glass having a size of 40 mm x 30 mm and a thickness of 0.21 mm was obtained by polishing. The glass transition temperature of this glass was 408°C.
Further, as a post-treatment, a heat treatment was carried out in an air atmosphere at 378° C. for 48 hours.

〈例16〉
 後処理を行わなかった以外は例15と同様にしてガラスを得た。
Example 16:
A glass was obtained in the same manner as in Example 15, except that no post-treatment was carried out.

《評価》
〈[H ]/[H ]〉
 得られたガラスに対し、二次イオン質量分析装置(アルバック・ファイ社製、ADEPT1010)を用いて、ガラスの表面から20μm深さまでのH濃度(cps)を測定した。測定条件は下記のとおりとした。・測定条件〔SIMSの測定条件〕一次イオン種:Cs+一次イオンの加速電圧:5kV一次イオンの電流値:500nA一次イオンの入射角:試料面の法線に対して60°一次イオンのラスターサイズ:300×300μm二次イオンの極性:マイナス二次イオンの検出領域:60×60μm(一次イオンのラスターサイズの4%)ESA Input Lens:0中和銃の使用:有横軸をスパッタ時間から深さへ変換する方法:分析クレータの深さを触針式表面形状測定器(Veeco社製、Dektak150)によって測定し、一次イオンのスパッタレートを求める。このスパッタレートを用いて、横軸をスパッタ時間から深さへ変換する。1H-検出時のField Axis Potential:装置ごとに最適値が変化する可能性がある。バックグラウンドが十分にカットされるように測定者が注意しながら値を設定する。
"evaluation"
<[H + A ]/[H + B ]>
The H + concentration (cps) from the surface of the glass to a depth of 20 μm was measured for the obtained glass using a secondary ion mass spectrometer (ADEPT1010, manufactured by ULVAC-PHI, Inc.). The measurement conditions were as follows. Measurement conditions [SIMS measurement conditions] Primary ion species: Cs+ Primary ion acceleration voltage: 5 kV Primary ion current value: 500 nA Primary ion incidence angle: 60° with respect to the normal line of the sample surface Primary ion raster size: 300 × 300 μm 2 Secondary ion polarity: negative Secondary ion detection area: 60 × 60 μm 2 (4% of the primary ion raster size) ESA Input Lens: 0 Use of neutralization gun: Yes Method of converting the horizontal axis from sputtering time to depth: Analysis The depth of the crater is measured using a stylus surface profiler (Dektak150, manufactured by Veeco), and the sputtering rate of the primary ions is obtained. Using this sputtering rate, the horizontal axis is converted from sputtering time to depth. Field Axis Potential during 1H-detection: The optimal value may vary depending on the device. The operator should carefully set the value so that the background is sufficiently cut.

 上記測定で得られた曲線をシグモイド曲線で近似することにより、ガラスの表面におけるH濃度[H ](cps)及びガラスの表面から100μmの深さにおけるH濃度[H ](cps)を求めた。結果を表1~3に示す。 The curves obtained by the above measurements were approximated with a sigmoid curve to determine the H + concentration [H + A ] (cps) on the surface of the glass and the H + concentration [H + B ] (cps) at a depth of 100 μm from the surface of the glass. The results are shown in Tables 1 to 3.

〈β-OH値〉
 得られたガラスに対し、フーリエ変換赤外分光装置(Thermo Fisher Scientific社製、Nic-plan/Nicolet 6700)を用いて400cm-1~4000cm-1における透過率を測定した。分解能:2cm-1、積算回数:16とし、検出器:TGS検出器を用いた。3650cm-1~4000cm-1における透過率の最大値をT、3550cm-1における透過率をT、ガラスの厚みをd(mm)としたとき、次の式で表される値をβ-OH値とした。
  β-OH値 = -(1/d)・(log10(T/T))
 得られたβ-OH値を表1~3に示す。
<β-OH value>
The transmittance of the obtained glass at 400 cm -1 to 4000 cm -1 was measured using a Fourier transform infrared spectrometer (Nic-plan/Nicolet 6700, manufactured by Thermo Fisher Scientific). The resolution was 2 cm -1 , the number of accumulations was 16, and the detector was a TGS detector. When the maximum value of the transmittance at 3650 cm -1 to 4000 cm -1 was T 0 , the transmittance at 3550 cm -1 was T 1 , and the thickness of the glass was d (mm), the value represented by the following formula was defined as the β-OH value.
β-OH value = -(1/d)・(log 10 (T 1 /T 0 ))
The obtained β-OH values are shown in Tables 1 to 3.

〈透過率〉
 得られたガラスに対し、波長400~1200nmの範囲における内部透過率を、分光光度計(日本分光社製、V-570)を用いて測定した。そして、上述したTi2=Ti1 t2/t1なる式に基づき、ガラスの厚みが0.2mmである場合の透過率に換算した。そのうち、波長550nm、800nm及び1200nmにおける透過率の結果を表1~3に示す。
<Transmittance>
The internal transmittance of the obtained glass in the wavelength range of 400 to 1200 nm was measured using a spectrophotometer (V-570, manufactured by JASCO Corporation). Then, based on the above-mentioned formula T i2 = T i1 t2/t1 , it was converted into the transmittance when the glass thickness was 0.2 mm. The results of the transmittance at wavelengths of 550 nm, 800 nm, and 1200 nm are shown in Tables 1 to 3.

〈耐候性〉
 得られたガラスを85℃、湿度85%RHの環境下に100時間静置した後、外観上の変化の有無を目視で確認することにより耐候性を評価した。具体的には、試験後にガラス表面の劣化の程度が小さかったものを「〇」、ガラス成分が表面に溶出し、液だれするなどして劣化の程度が大きかったものを「×」として評価し、「〇」であれば耐候性が良好であると判断した。
 その後、ヘイズメーター(日本電色工業社製、NDH5000)を用いて、拡散透過率及び全光線透過率を測定した。そして、〔拡散透過率/全光線透過率〕で表される値をHaze(%)として求めた。このHaze値は15%以下であれば耐候性が良好であると判断でき、その値は小さいほど好ましい。
 得られた耐候性評価の結果を表1~3に示す。なお、表2、3中、Haze値を測定していないものは「no data」としている。
Weather resistance
The obtained glass was left to stand for 100 hours in an environment of 85°C and 85% RH, and the weather resistance was evaluated by visually checking for any changes in appearance. Specifically, glass surfaces with little deterioration after the test were rated as "good", and glass components were eluted onto the surface, causing dripping, etc., and the degree of deterioration was evaluated as "poor". If the glass was rated as "good", the weather resistance was judged to be good.
Thereafter, the diffuse transmittance and the total light transmittance were measured using a haze meter (NDH5000, manufactured by Nippon Denshoku Industries Co., Ltd.). The value expressed as [diffuse transmittance/total light transmittance] was calculated as Haze (%). If the Haze value is 15% or less, it can be judged that the weather resistance is good, and the smaller the value, the more preferable.
The obtained results of the weather resistance evaluation are shown in Tables 1 to 3. In Tables 2 and 3, those for which the haze value was not measured are indicated as "no data."

Figure JPOXMLDOC01-appb-T000001
Figure JPOXMLDOC01-appb-T000001

Figure JPOXMLDOC01-appb-T000002
Figure JPOXMLDOC01-appb-T000002

Figure JPOXMLDOC01-appb-T000003
Figure JPOXMLDOC01-appb-T000003

 上記結果から、リン及び近赤外線吸収成分を含むガラスにおいて、{[H ]/[H ]}で表される比が2以下となることで、高温高湿下でのガラスの劣化が小さく、Hazeの値は小さくなり、耐候性が改善されることが分かった。
 また、{[H ]/[H ]}で表される比が2超となるガラスであっても、後処理を行い、上記比を2以下とすると、耐候性が改善されることが分かった。さらに、{[H ]/[H ]}で表される比が2以下となる組成のガラスに対して後処理を行うと、上記比はさらに小さくなり、耐候性のみならず、可視域の光の透過性が向上する傾向にあった。
From the above results, it has been found that in glass containing phosphorus and a near-infrared absorbing component, when the ratio represented by {[H + A ]/[H + B ]} is 2 or less, the glass undergoes little degradation under high temperature and high humidity conditions, the haze value is small, and the weather resistance is improved.
It was also found that even for glass in which the ratio represented by {[H + A ]/[H + B ]} exceeds 2, the weather resistance can be improved by performing post-treatment to set said ratio to 2 or less. Furthermore, when post-treatment is performed on glass having a composition in which the ratio represented by {[H + A ]/[H + B ]} is 2 or less, said ratio becomes even smaller, and not only the weather resistance but also the transmittance of visible light tends to improve.

 本発明を詳細に、また特定の実施態様を参照して説明したが、本発明の精神と範囲を逸脱することなく様々な変更や修正を加えることができることは当業者にとって明らかである。本出願は2023年7月24日出願の日本特許出願(特願2023-119934)に基づくものであり、その内容はここに参照として取り込まれる。 Although the present invention has been described in detail and with reference to specific embodiments, it will be apparent to those skilled in the art that various changes and modifications can be made without departing from the spirit and scope of the present invention. This application is based on a Japanese patent application (Patent Application No. 2023-119934) filed on July 24, 2023, the contents of which are incorporated herein by reference.

Claims (14)

 酸化物基準のモル%表記で、
 Pを25%以上、かつ
 近赤外線吸収成分を合計で0.5%以上含むガラスであって、
 前記ガラスの表面におけるH濃度[H ]と、前記ガラスの表面から100μmの深さにおけるH濃度[H ]との{[H ]/[H ]}で表される比が2以下であるガラス。
In mole percent based on oxide,
A glass containing 25% or more of P2O5 and 0.5% or more of near- infrared absorbing components in total,
A glass in which the ratio of the H + concentration [H + A ] at the surface of the glass to the H + concentration [H + B ] at a depth of 100 μm from the surface of the glass, expressed as {[H + A ]/[H + B ]}, is 2 or less.
 β-OH値が1mm-1以下である、請求項1に記載のガラス。 2. The glass of claim 1 having a β-OH value of 1 mm −1 or less.  前記{[H ]/[H ]}で表される比が1未満である、請求項1に記載のガラス。 2. The glass of claim 1, wherein the ratio represented by {[H + A ]/[H + B ]} is less than 1.  厚み0.2mmに換算した際の、波長550nmにおける透過率が70%以上である、請求項1に記載のガラス。 The glass according to claim 1, which has a transmittance of 70% or more at a wavelength of 550 nm when converted to a thickness of 0.2 mm.  厚み0.2mmに換算した際の、波長800nmにおける透過率が30%以下である、請求項1に記載のガラス。 The glass according to claim 1, which has a transmittance of 30% or less at a wavelength of 800 nm when converted to a thickness of 0.2 mm.  前記近赤外線吸収成分として、Cu、Fe、及びVからなる群より選ばれる1種以上を含有する、請求項1に記載のガラス。 The glass according to claim 1, containing one or more near-infrared absorbing components selected from the group consisting of Cu, Fe, and V.  前記近赤外線吸収成分としてCuを含み、
 酸化物基準のモル%表記で、CuOを0.5%以上含む、請求項1に記載のガラス。
The near infrared absorbing component contains Cu,
The glass according to claim 1 , containing, in mole percent on an oxide basis, 0.5% or more of CuO.
 Ti、W及びNbからなる群より選ばれる1以上を含む、請求項1に記載のガラス。 The glass according to claim 1, containing one or more elements selected from the group consisting of Ti, W, and Nb.  酸化物基準のモル%表記で、TiO、WO及びNbを合計で5%以上含む、請求項8に記載のガラス。 The glass according to claim 8, containing, in mole percent on an oxide basis, TiO2 , WO3, and Nb2O5 in a total amount of 5% or more.  酸化物基準のモル%表示での含有量が、
 P:25~80%、
 Al:1~20%、
 ΣRO:0~35%(但し、Rは、Li、Na、K、Rb、及びCsを意味する。)、
 ΣR’O:0~30%(但し、R’はMg、Ca、Sr、Ba及びZnを意味する。)、かつ
 CuO:0.5~30%を満たし、
 前記ΣROは、LiO、NaO、KO、CsO、及びRbOの合計の含有量を意味し、
 前記ΣR’Oは、MgO、CaO、SrO、BaO、及びZnOの合計の含有量を意味する、請求項1に記載のガラス。
The content in mole percent based on oxide is:
P2O5 : 25-80 %,
Al 2 O 3 : 1 to 20%,
ΣR 2 O: 0 to 35% (wherein R represents Li, Na, K, Rb, and Cs);
ΣR′O: 0 to 30% (wherein R′ represents Mg, Ca, Sr, Ba, and Zn), and CuO: 0.5 to 30%;
The ΣR 2 O means the total content of Li 2 O, Na 2 O, K 2 O, Cs 2 O, and Rb 2 O;
The glass according to claim 1 , wherein the ΣR′O represents the total content of MgO, CaO, SrO, BaO, and ZnO.
 酸化物基準のモル%表示での含有量が、
 P:30~50%、
 Al:1~10%、
 ΣRO:10~35%(但し、Rは、Li、Na、K、Rb、及びCsを意味する。)、
 ΣR’O:0~10%(但し、R’はMg、Ca、Sr、Ba及びZnを意味する。)、
 CuO:1~15%、
 TiO:0~10%、
 WO:0~10%、かつ
 Nb:0~10%を満たし、
 前記ΣROは、LiO、NaO、KO、CsO、及びRbOの合計の含有量を意味し、
 前記ΣR’Oは、MgO、CaO、SrO、BaO、及びZnOの合計の含有量を意味する、請求項1に記載のガラス。
The content in mole percent based on oxide is:
P2O5 : 30-50 %,
Al 2 O 3 : 1 to 10%,
ΣR 2 O: 10 to 35% (wherein R represents Li, Na, K, Rb, and Cs);
ΣR′O: 0 to 10% (wherein R′ means Mg, Ca, Sr, Ba and Zn),
CuO: 1-15%,
TiO2 : 0-10%,
WO 3 : 0 to 10% and Nb 2 O 5 : 0 to 10% are satisfied;
The ΣR 2 O means the total content of Li 2 O, Na 2 O, K 2 O, Cs 2 O, and Rb 2 O;
The glass according to claim 1 , wherein the ΣR′O represents the total content of MgO, CaO, SrO, BaO, and ZnO.
 モル%表記でのFの含有量が外割で7%以下である、請求項1に記載のガラス。 The glass according to claim 1, in which the F content, expressed as mole percent, is 7% or less.  請求項1~12のいずれか1項に記載のガラスからなる近赤外線吸収カットフィルタ。 A near-infrared absorption cut filter made of the glass according to any one of claims 1 to 12.  請求項13に記載の近赤外線吸収カットフィルタを含む、固体撮像素子。 A solid-state imaging device comprising the near-infrared absorbing cut filter according to claim 13.
PCT/JP2024/025994 2023-07-24 2024-07-19 Glass, near-infrared absorption cut-off filter, and solid-state imaging element Pending WO2025023184A1 (en)

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Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2017178632A (en) * 2016-03-28 2017-10-05 日本電気硝子株式会社 Near-infrared absorbing glass
WO2019221128A1 (en) * 2018-05-18 2019-11-21 Agc株式会社 Glass substrate and optical component
JP2019199391A (en) * 2018-05-18 2019-11-21 Agc株式会社 Glass substrate and manufacturing method of glass substrate
WO2020179516A1 (en) * 2019-03-06 2020-09-10 日本電気硝子株式会社 Near-infrared absorbing glass plate
WO2020195438A1 (en) * 2019-03-22 2020-10-01 日本電気硝子株式会社 Glass plate and production method therefor

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2017178632A (en) * 2016-03-28 2017-10-05 日本電気硝子株式会社 Near-infrared absorbing glass
WO2019221128A1 (en) * 2018-05-18 2019-11-21 Agc株式会社 Glass substrate and optical component
JP2019199391A (en) * 2018-05-18 2019-11-21 Agc株式会社 Glass substrate and manufacturing method of glass substrate
WO2020179516A1 (en) * 2019-03-06 2020-09-10 日本電気硝子株式会社 Near-infrared absorbing glass plate
WO2020195438A1 (en) * 2019-03-22 2020-10-01 日本電気硝子株式会社 Glass plate and production method therefor

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