WO2025018204A1 - Adhesive sheet for workpieces and method for producing same - Google Patents
Adhesive sheet for workpieces and method for producing same Download PDFInfo
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- WO2025018204A1 WO2025018204A1 PCT/JP2024/024578 JP2024024578W WO2025018204A1 WO 2025018204 A1 WO2025018204 A1 WO 2025018204A1 JP 2024024578 W JP2024024578 W JP 2024024578W WO 2025018204 A1 WO2025018204 A1 WO 2025018204A1
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- Prior art keywords
- adhesive
- sheet
- adhesive layer
- workpiece
- adhesive sheet
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J201/00—Adhesives based on unspecified macromolecular compounds
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J7/00—Adhesives in the form of films or foils
- C09J7/30—Adhesives in the form of films or foils characterised by the adhesive composition
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J7/00—Adhesives in the form of films or foils
- C09J7/30—Adhesives in the form of films or foils characterised by the adhesive composition
- C09J7/38—Pressure-sensitive adhesives [PSA]
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J7/00—Adhesives in the form of films or foils
- C09J7/40—Adhesives in the form of films or foils characterised by release liners
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
Definitions
- the present invention relates to an adhesive sheet for workpieces and a method for manufacturing the same.
- the workpiece is first prepared.
- the workpiece is then processed to form the electronic device.
- Patent Document 1 JP Patent Publication No. 2021-40099 discloses a composite sheet for forming a protective film having a specific configuration and which is attached to the back surface of a semiconductor wafer.
- the object of the present invention is to provide a technology that can improve carbon dioxide emissions from work adhesive sheets that are attached to workpieces for electronic devices.
- the inventors focused on the release sheet included in the work adhesive sheet. They discovered that carbon dioxide emissions can be reduced by using dust-free paper as such a release sheet, which led to the invention.
- the adhesive sheet for a workpiece comprises an adhesive layer configured to be attached to a workpiece for an electronic device, and a release sheet disposed on the adhesive layer and capable of being peeled off from the adhesive layer.
- the release sheet comprises dust-free paper.
- the present invention provides a technology that can improve carbon dioxide emissions from work adhesive sheets that are attached to electronic device workpieces.
- FIG. 1 is a schematic cross-sectional view showing an adhesive sheet according to an embodiment.
- FIG. 2 is a schematic diagram showing an example of a method of using the adhesive sheet.
- the adhesive sheet for workpieces according to this embodiment is an adhesive sheet that is attached to workpieces for electronic devices when used. Details will be described later, but a workpiece for an electronic device refers to a workpiece used in the manufacture of an electronic device. In other words, a workpiece for an electronic device is processed to manufacture an electronic device.
- the adhesive sheet according to this embodiment is attached to a workpiece for an electronic device when used at any stage in the manufacturing process of the electronic device.
- the "adhesive sheet for work” may simply be referred to as the "adhesive sheet.”
- the "work for electronic device” may simply be referred to as the "work.”
- Fig. 1 is a schematic cross-sectional view showing an adhesive sheet 1 according to this embodiment.
- the adhesive sheet 1 has an adhesive layer 2, a release sheet 3, and a support film 4. These are laminated in the following order: support film 4, adhesive layer 2, and release sheet 3.
- the adhesive layer 2 is configured to be attached to the workpiece. That is, the adhesive layer 2 is attached to the workpiece at some stage in the manufacturing process of the electronic device.
- the release sheet 3 is placed on the adhesive layer 2 for the purpose of protecting the adhesive layer 2.
- the release sheet 3 can be peeled off from the adhesive layer 2. There is no particular limitation on the timing at which the release sheet 3 is peeled off.
- the release sheet 3 is peeled off from the adhesive layer 2 at any time during the manufacturing process of the electronic device.
- the support film 4 is provided to support the adhesive layer 2.
- the support film 4 is not an essential component.
- the support film 4 may be omitted.
- the support film 4 may be laminated inseparably with the adhesive layer 2, or if the adhesive sheet is an adhesive sheet for joining parts or a film for covering the back surface of a workpiece, as described below, the support film 4 may be separable from the adhesive layer 2 and peeled off from the adhesive layer 2 at any time during the manufacturing process of the electronic device.
- the core layer 6 and the second adhesive layer 2' may be laminated between the adhesive layer 2 and the support film 4, in that order from the adhesive layer 2 side, so that the adhesive sheet 1 has a so-called double-sided adhesive sheet configuration. In this case, the support film 4 laminated with the second adhesive layer 2' is separable from the second adhesive layer 2' and peeled off from the adhesive layer 2 at any time during the manufacturing process of the electronic device.
- the release sheet 3 has dust-free paper. More specifically, the release sheet 3 is made of dust-free paper. Dust-free paper emits less carbon dioxide than the resin films that are commonly used as the release sheet 3. For example, dust-free paper can be achieved with approximately one-quarter the amount of carbon dioxide emissions compared to polyethylene terephthalate film. According to this embodiment, because dust-free paper is used as the release sheet 3, the carbon dioxide emissions of the entire adhesive sheet 1 can be reduced.
- the support film 4 When the support film 4 is laminated so as not to be separated from the adhesive layer 2, it is realized by, for example, a resin film (such as a PET film).
- the support film 4 When the support film 4 can be separated from the adhesive layer 2, the support film 4 may be an adhesive layer supporting adhesive sheet 4' having an adhesive layer for holding the adhesive layer 2, or a second release sheet 3' having the same function as the release sheet 3.
- the adhesive sheet 1 has a core material layer 6 and a second adhesive layer 2' and has a so-called double-sided adhesive sheet configuration
- the support film 4 is usually a second release sheet 3'.
- the second release sheet 3' does not need to have dust-free paper, but from the viewpoint of reducing carbon dioxide emissions in the entire adhesive sheet 1, it is preferable that the second release sheet 3' has dust-free paper like the release sheet 3. In other words, it is preferable that both the release sheet 3 and the second release sheet 3' have dust-free paper.
- adhesive sheets that are applied to workpieces for electronic devices must generate minimal amounts of foreign matter (dust, dirt). By using dust-free paper, such requirements can be met.
- the method of using the adhesive sheet according to this embodiment includes an exposing step of exposing at least one surface of the adhesive layer as an exposed surface, an attaching step of attaching a workpiece to the exposed surface of the adhesive layer, and a peeling step of peeling the release sheet from the adhesive layer.
- the peeling step may be performed at any stage.
- the exposing step may be realized by the peeling step. That is, at least one surface of the adhesive layer may be exposed by peeling the release sheet from the adhesive layer.
- the peeling step may be performed after the attaching step. That is, the adhesive layer may be attached to the workpiece with the release sheet, and then the release sheet may be peeled off.
- FIG. 2 is a schematic diagram showing an example of a method of using the adhesive sheet 1.
- the release sheet 3 is peeled off from the adhesive layer 2. This exposes one side of the adhesive layer 2.
- the workpiece 5 is attached to the exposed surface of the adhesive layer 2.
- the necessary processing is performed.
- the above is an example of a method of using the adhesive sheet 1.
- the adhesive layer 2 may be finally removed from the workpiece 5.
- the adhesive layer 2 may remain attached to the workpiece 5 as part of the final product. In any case, as in the example shown in FIG. 2, it is preferable to peel off the release sheet 3 before attaching the workpiece 5.
- the adhesive sheet 1 has the second release sheet 3'
- the release sheet 3 is peeled off before the workpiece 5 is attached, and the second release sheet 3' is peeled off after the workpiece 5 is attached, so that the adhesive sheet 1 can be easily handled from the time the release sheet 3 is peeled off until the workpiece 5 is attached to the adhesive layer 2.
- the second release sheet 3' does not have dust-free paper, the above-mentioned effect that foreign matter originating from the dust-free paper is less likely to adhere to the workpiece 5 can be obtained.
- both the release sheet 3 and the second release sheet 3' have dust-free paper, which makes it possible to further reduce carbon dioxide emissions from the adhesive sheet 1 as a whole.
- the exposure process the process of peeling off the second release sheet 3' instead of the release sheet 3 to expose one side of the adhesive layer 2 as an exposed surface for attachment to the workpiece 5
- the peeling process the process of peeling off the release sheet 3
- the workpiece for electronic devices is a workpiece for manufacturing electronic devices.
- the workpiece for electronic devices include circuit boards and workpieces for semiconductor devices.
- Examples of the workpiece for semiconductor devices include semiconductor wafers, semiconductor chips, semiconductor packages, and chip encapsulants produced by a fan-out packaging process.
- Examples of the workpiece for electronic devices include workpieces processed by a processing method similar to the manufacturing process of semiconductor devices (e.g., lithography processing, etc.).
- a workpiece for MEMS and a wafer for forming LED chips (sapphire wafer, etc.) as the workpiece for electronic devices.
- a workpiece for semiconductor devices or a workpiece processed by a processing method similar to the manufacturing process of semiconductor devices is preferable.
- the thickness of the workpiece for electronic devices is not particularly limited, but in recent years, as electronic devices have become thinner, thinner workpieces for electronic devices have been adopted than before, for example, about 5 to 100 ⁇ m, and preferably about 10 to 70 ⁇ m. If the adhesive sheet is a backgrind sheet described below, it is preferable that the thickness of the back surface of the workpiece after grinding is within the above range.
- the adhesive sheet according to the present embodiment may be used by being attached to a workpiece during the manufacture of an electronic device, and its specific use is not particularly limited.
- the adhesive sheet may be at least one of an adhesive sheet for processing a workpiece, an adhesive sheet for supporting a workpiece, an adhesive sheet for joining components, a film for covering the back surface of a workpiece, a film for reinforcing bumps, and an interlayer insulating material for forming a build-up layer.
- the "adhesive sheet for workpiece processing” is an adhesive sheet that is attached to a workpiece when the workpiece is processed.
- adhesive sheets for workpiece processing include dicing sheets, back grinding sheets, and sheets for chip sealing processes.
- a dicing sheet is a sheet for supporting a workpiece such as a semiconductor wafer when the workpiece is diced.
- the adhesive layer is exposed and then the workpiece is attached to the exposed surface.
- the workpiece is then diced, thereby forming multiple chips. After dicing, each chip is picked up from the adhesive layer.
- the workpiece may be diced using mechanical means such as a blade, or the workpiece may be cut using means such as a laser or plasma.
- the backgrind sheet is a sheet used to protect the circuit-forming surface of a workpiece (such as a semiconductor wafer) when grinding the back surface (the surface opposite to the circuit-forming surface) of the workpiece having a circuit-forming surface.
- a backgrind sheet When used as a backgrind sheet, the adhesive layer is exposed, and then the circuit-forming surface of the workpiece is attached to the exposed surface. The back surface of the workpiece is then ground. If necessary, the adhesive layer is then removed from the workpiece.
- the backgrind sheet may be used in a method of singulating a workpiece (a so-called pre-dicing method) in which the workpiece is a semiconductor wafer and the semiconductor wafer is singulated into multiple semiconductor chips by grinding along planned division lines that are composed of grooves pre-formed on the circuit-forming surface of the semiconductor wafer or modified regions pre-formed inside the semiconductor wafer.
- the pre-dicing method is a method suitable for obtaining thin semiconductor chips, and the resulting semiconductor chips tend to be thin.
- the chip sealing process sheet is a sheet for obtaining a sealed body in which multiple chips are sealed by fixing multiple chips, which are workpieces, in a predetermined arrangement on the adhesive layer of an adhesive sheet, covering the multiple chips with a sealing material, and hardening the sealing material.
- the adhesive sheet which is a chip sealing sheet, may have a configuration of a double-sided adhesive sheet having a core material layer and a second adhesive layer, and the second adhesive layer may be attached to a support substrate such as a glass plate, and the multiple chips, which are the workpieces, may be fixed to the support substrate via the adhesive sheet.
- At least one of the adhesive layer, the core material layer, and the second adhesive layer may contain thermally expandable particles, and the adhesive strength of the adhesive sheet to the workpiece or support substrate may be reduced by heating.
- the "adhesive sheet for supporting a workpiece” is an adhesive sheet used to support a workpiece (such as a wafer or chip) during temporary storage or transportation.
- a workpiece such as a wafer or chip
- the adhesive layer is exposed and the workpiece is attached, after which the workpiece is temporarily stored or transported.
- an expansion process may be performed in which the spacing between the multiple chips is expanded by stretching the adhesive sheet for supporting a workpiece while the multiple chips are supported in a predetermined arrangement on the adhesive sheet for supporting a workpiece. The adhesive layer is then removed from the workpiece as necessary.
- a pressure-sensitive adhesive layer is usually used as the adhesive layer.
- the adhesive layer is usually supported by a support film. However, as mentioned above, if the adhesive layer is self-supporting, the support film may be omitted.
- an "adhesive sheet for joining parts” is a sheet used to join multiple parts. It is preferable that the adhesive sheet for joining parts is a curable adhesive sheet that has a curing property, so that a strong bond can be obtained by temporarily bonding the parts together with the curable adhesive sheet and then curing it.
- the adhesive sheet for joining parts is explained using a curable adhesive sheet as an example.
- a curable adhesive sheet usually has a support film in addition to an adhesive layer. The adhesive layer is separable from the support film.
- a curable adhesive sheet is a die attachment film.
- a die attachment film For example, when used as a die attachment film, at least one side of the adhesive layer is first exposed. Specifically, one side of the adhesive layer is exposed by peeling off one of the release sheet and the support film. Next, a workpiece (such as a semiconductor chip or a semiconductor wafer) is attached to the exposed side of the adhesive layer. After that, the other side of the adhesive layer is exposed. That is, the other side of the support film and the release sheet is peeled off to expose the other side. Next, the other side of the adhesive layer is attached to a substrate. The adhesive layer is then cured. This allows the workpiece to be bonded to the substrate via the adhesive layer.
- a workpiece such as a semiconductor chip or a semiconductor wafer
- a curable adhesive sheet is a non-conductive adhesive film (NCF) that is interposed between the bump-forming surface of a face-down type semiconductor chip and a substrate or the like to bond them together.
- NCF non-conductive adhesive film
- the adhesive layer is first exposed. Specifically, one of the release sheet and the support film is peeled off to expose one surface of the adhesive layer.
- the bump-forming surface of the face-down type semiconductor chip wafer which is the workpiece, is attached to the exposed surface of the adhesive layer. The attachment may be performed using a vacuum laminator or the like.
- the other surface of the adhesive layer is exposed. That is, the other surface is exposed by peeling off the other of the support film and the release sheet.
- the laminate of the adhesive sheet and the semiconductor wafer is diced to obtain a semiconductor chip with an NCF, and the other surface of the adhesive layer is attached to the substrate.
- the adhesive layer is then cured. This allows the workpiece to be bonded to the substrate via the adhesive layer.
- Thermal conductive material-containing sintering film can also be used as a component bonding sheet.
- the adhesive layer of the thermal conductive material-containing sintering film contains a thermal conductive material such as metal particles or boron nitride, preferably in the form of particles dispersed in the resin.
- Thermal conductive material-containing sintering film is usually used to fix power semiconductors. Specifically, one side of the adhesive layer is exposed by peeling off one of the release sheet and the support film. Then, a work (power semiconductor chip, power semiconductor wafer, etc.) is attached to the exposed side of the adhesive layer. Then, the other side of the adhesive layer is exposed. That is, the other side of the support film and the release sheet is peeled off to expose the other side.
- the other side of the adhesive layer is attached to another member such as a substrate.
- the adhesive layer is sintered, and the work and the other member are bonded by the layer made of a sintered body of the thermal conductive material.
- the layer made of a sintered body of the thermal conductive material functions as a thermal conduction path for the heat generated from the power semiconductor.
- a "film for covering the back surface of a workpiece” is a film for providing a covering layer of an adhesive layer on the back surface of a workpiece (such as a semiconductor wafer or semiconductor chip) that has a circuit-forming surface. Therefore, it is only attached to the workpiece as an adherend, and is not used to join the workpiece to other components.
- the back surface of the workpiece referred to here is the surface facing the opposite side to the circuit-forming surface.
- films for covering the back surface of a workpiece include protective sheets (called chip back surface protective tape) that are attached to the back surface of face-down type semiconductor chips, and sheets (called anti-warping sheets) that are attached to the back surface of an encapsulant that contains a semiconductor chip to prevent warping.
- the covering layer may be provided directly on the back surface of the workpiece, or may be provided via another layer.
- the backside of a semiconductor wafer is attached to the adhesive layer as a workpiece.
- the adhesive layer is then cured to form a coating layer.
- the semiconductor wafer is then diced using a dicing sheet as necessary, and divided into multiple semiconductor chips. This results in semiconductor chips whose backsides are protected by a coating layer.
- Each semiconductor chip is then picked up and mounted face-down on another substrate. If a support film is present on the adhesive sheet, the support film is removed at an appropriate time, for example after curing.
- the surface of the adhesive layer opposite the workpiece is left open, and does not adhere to other substrates.
- the adhesive layer when used as an anti-warping sheet, after the adhesive layer is exposed, the back surface of a semiconductor chip is attached to the exposed surface as a workpiece. Next, an encapsulating resin is supplied onto the adhesive layer so as to encapsulate the semiconductor chip. Next, the adhesive layer and encapsulating resin are cured. This results in an encapsulated body with reduced warping.
- the "bump reinforcing film” is a film for forming a reinforcing film on the bump-forming surface of a semiconductor wafer by attaching a curable reinforcing film-forming film to the bump-forming surface and curing the film for the purpose of reinforcing the bumps and the bumps.
- a curable reinforcing film-forming film for the purpose of reinforcing the bumps and the bumps.
- the bump reinforcing film first, at least one side of the adhesive layer is exposed. Specifically, one side of the adhesive layer is exposed by peeling off one of the release sheet and the support film. Next, the bump-forming surface of the workpiece, a semiconductor wafer on which bumps are formed, is attached to the exposed surface of the adhesive layer. The attachment may be performed using a vacuum laminator or the like.
- the other side of the adhesive layer is exposed. That is, the other side is exposed by peeling off the other of the support film and the release sheet.
- the adhesive layer is cured. This allows a reinforcing film to be formed on the bump-forming surface of the workpiece.
- the "interlayer insulating material for forming a build-up layer” is a film-like material used to form one build-up layer that constitutes a multilayer wiring board.
- an interlayer insulating material for forming a build-up layer first, at least one surface of the adhesive layer is exposed. Specifically, one of the release sheet and the support film is peeled off to expose one surface of the adhesive layer. Then, a circuit board, which is a workpiece, is attached to the exposed surface of the adhesive layer. At this time, a lamination process in which heat and pressure are applied to the adhesive layer may be performed through the other of the release sheet and support film that have not yet been peeled off. Then, the other surface of the adhesive layer is exposed.
- the formed build-up layer may be subjected to a drilling process in which holes are drilled in the build-up layer, a roughening process in which the build-up layer is roughened, a plating process in which a conductor layer is formed by plating on the roughened surface of the build-up layer, and a circuit formation process in which a circuit is formed on the conductor layer.
- the adhesive sheet is at least one selected from the group consisting of a dicing sheet, a backgrind sheet, a die attachment film, a chip backside protective tape, and an anti-warping sheet. Note that these uses may be combined.
- the adhesive sheet may have the functions of both a die attachment film and a dicing sheet.
- the adhesive layer 2 is ultimately removed from the workpiece 5, whereas in adhesive sheets for component bonding, films for covering the back surface of a workpiece, films for reinforcing bumps, and interlayer insulating materials for forming build-up boards, the adhesive layer 2 remains attached to the workpiece 5 as part of the final product.
- adhesive sheets for workpiece processing and adhesive sheets for workpiece support, from which the adhesive layer 2 is ultimately removed from the workpiece 5, are used in large quantities as indirect materials in the manufacturing process of electronic devices, and there is a strong demand for reducing carbon dioxide emissions.
- the form in which the adhesive sheet is provided will be described.
- the form of the adhesive sheet is not particularly limited.
- the adhesive sheet may be provided in a form in which a long sheet is wound around a core material (hereinafter, sometimes referred to as a roll form).
- the adhesive sheet may be provided in a form in which a plurality of individual sheets are stacked (hereinafter, sometimes referred to as an individual sheet stack form).
- the adhesive layer Next, the adhesive layer will be described.
- a resin layer is used as the adhesive layer.
- the specific structure of the adhesive layer is appropriately selected depending on the application.
- the adhesive layer 2 may be composed of a single layer, or may have a structure in which multiple layers are laminated.
- the adhesive layer is photocurable.
- photocuring can make it easier to peel off the workpiece.
- the adhesive sheet is a pressure-sensitive adhesive sheet such as a dicing sheet or a backgrind sheet
- the adhesive layer is first attached to the workpiece. Then, after the workpiece is processed, the adhesive layer is irradiated with light and a curing reaction is carried out. The adhesive strength between the adhesive layer and the workpiece is reduced by the curing. Therefore, the workpiece can be easily peeled off from the adhesive layer.
- the adhesive layer contains a photocurable compound.
- the adhesive layer contains a photopolymerization initiator.
- photocurable compounds include compounds having a group containing an unsaturated carbon bond, such as a methacryloyl group or an acryloyl group, and such compounds are preferably used in combination with a photoradical polymerization initiator.
- an adhesive layer using a compound having a cyclic ether group, such as an epoxy resin, and a photocationic polymerization initiator may be used as a photocurable adhesive layer. From the viewpoint of quickly progressing the photocuring reaction, it is preferable that the adhesive layer contains a compound having a group containing an unsaturated carbon bond and a photoradical polymerization initiator.
- Examples of compounds having a group containing an unsaturated carbon bond include compounds having two or more methacryloyl groups or acryloyl groups in one molecule, such as tricyclodecane dimethanol diacrylate, and examples of photoradical polymerization initiators include intramolecular cleavage type radical polymerization initiators such as ⁇ -hydroxyalkylphenone.
- the adhesive layer may also contain heat-expanding particles to facilitate peeling. If heat-expanding particles are included, the adhesive strength between the adhesive layer and the object to be peeled off (the workpiece or the supporting substrate) can be reduced by heating, making peeling easier.
- the adhesive sheet is a curable adhesive sheet such as a die attachment film
- the photocuring reaction can make it easier to peel the support film off from the adhesive layer.
- the adhesive layer of the die attachment film is photocurable
- the adhesive layer generally also contains a thermosetting compound in order to obtain adhesive strength after die bonding.
- the adhesive sheet is a film for covering the back surface of a workpiece
- the adhesive sheet after attaching the adhesive sheet to the workpiece, it is possible to obtain a hard covering layer by irradiating it with light to harden the adhesive layer.
- the adhesive layer may be configured to have photocurability depending on the application.
- the adhesive layer needs to be light-shielded during storage to prevent unintended photocuring reactions from proceeding.
- dust-free paper is used as the release sheet. Dust-free paper has light-shielding properties. Therefore, the adhesive sheet according to the present embodiment is also preferable from the viewpoint of light-shielding properties. Whether the adhesive sheet is in the form of a roll or a laminated sheet, the dust-free paper in the outermost layer suppresses the incidence of light into the adhesive layer.
- the adhesive sheet can be stored without using a light-shielding packaging material.
- the adhesive layer contains a compound having a group containing an unsaturated carbon bond and a photoradical polymerization initiator, the photocuring reaction is likely to proceed, so there is a high need to prevent unintended photocuring reactions from proceeding.
- the thickness of the adhesive layer is set according to the application and is not particularly limited.
- the thickness of the adhesive layer is 1 ⁇ m to 1000 ⁇ m.
- the adhesive layer When used as a dicing sheet, the adhesive layer has a thickness of, for example, 3 to 50 ⁇ m.
- the thickness of the adhesive layer When used as a backgrind sheet, the thickness of the adhesive layer is, for example, 3 to 500 ⁇ m.
- a third adhesive layer 2" for burying the bumps may be formed between the adhesive layer 2 and the support film 4. In this case, it is preferable that the total thickness of the adhesive layer 2 and the third adhesive layer 2" is within the above range.
- the thickness of the adhesive layer is, for example, 2 to 300 ⁇ m.
- the thickness of the second adhesive layer 3′ is, for example, 2 to 300 ⁇ m.
- the thickness of the adhesive layer is, for example, 3 to 50 ⁇ m.
- the adhesive layer has a thickness of, for example, 3 to 200 ⁇ m.
- the thickness of the adhesive layer is, for example, 5 to 150 ⁇ m.
- the thickness of the adhesive layer is, for example, 30 to 200 ⁇ m.
- the adhesive layer When used as a protective sheet (chip back surface protective tape) to be attached to the back surface of a face-down type semiconductor chip, the adhesive layer has a thickness of, for example, 5 to 200 ⁇ m.
- the adhesive layer When used as a sheet (called an anti-warping sheet) to be attached to the back surface of an encapsulant containing a semiconductor chip to prevent warping, the adhesive layer has a thickness of, for example, 5 to 200 ⁇ m.
- the adhesive layer When used as a bump reinforcing film, the adhesive layer has a thickness of, for example, 1 to 200 ⁇ m.
- the adhesive layer When used as an interlayer insulating material for forming a build-up layer, the adhesive layer has a thickness of, for example, 3 to 100 ⁇ m.
- Dust-free paper is paper that generates less dust than regular paper.
- dust-free paper that generates 2,000 or less floating dust particles of 0.3 ⁇ m or more per cubic foot in any of the dust generation tests according to the following rubbing, crumpling, and tearing tests can be used.
- Rubbing Prepare two A5 size test pieces (rectangles with long sides of 210 mm and short sides of 148 mm), overlap the front and back of the test paper, and rub them together for 200 seconds, three times every 10 seconds.
- Kneading An A5 size (rectangle with long sides of 210 mm and short sides of 148 mm) test piece is kneaded by hand for 200 seconds at a rate of once every 15 seconds.
- An A5 size (rectangle with long sides of 210 mm and short sides of 148 mm) test piece is torn at four points once every 5 seconds, and then kneaded for 180 seconds in the same manner as in the kneading test.
- the test is carried out in a clean bench, and the number of floating dust particles is measured using a light scattering particle counter.
- a particle counter manufactured by Rion Co., Ltd. may be used as such a particle counter.
- the number of floating dust particles of 0.3 ⁇ m or more generated in the above dust generation test is preferably 1,000 or less particles per cubic foot, and more preferably 300 or less particles per cubic foot.
- the material for the dust-free paper paper having a plant fiber layer and impregnated with an impregnating resin can be used.
- the impregnation with the impregnating resin prevents the fibers from scattering, realizing the function of the dust-free paper.
- dust-free paper using plant fibers is more suitable because it produces particularly low carbon dioxide emissions.
- plant fibers include pulp, and such plant fibers are generally composed of polysaccharides such as cellulose and have a structure rich in hydrophilic groups such as hydroxyl groups, so that they have relatively low electrical resistance and can prevent the release sheet from becoming charged.
- a water-based binder that has the potential to further reduce carbon dioxide emissions is preferable, and an example of such a water-based binder is a combination of an acrylic resin and an ethylene vinyl acetate copolymer.
- dust-free paper can reduce the carbon dioxide emissions of the entire adhesive sheet.
- dust-free paper is also preferable in terms of preventing blocking and reducing the amount of static electricity.
- the release sheet comes into contact with the member of the adjacent layer (for example, the support film, or, if there is no support film, the adhesive layer of the adjacent layer) on the side opposite the adhesive layer.
- the release sheet is unwound while being peeled off from the member of the adjacent layer. At this time, blocking and peeling static electricity may occur.
- dust-free paper has a moderate unevenness on its surface.
- the contact area between the dust-free paper and the member of the adjacent layer that is to be peeled off is relatively small. As a result, blocking is prevented. In addition, peeling static electricity during unwinding is also suppressed.
- the arithmetic mean roughness Ra of the surface of dust-free paper is usually about 0.5 to 5 ⁇ m.
- the impregnating resin contains an antistatic agent. If an antistatic agent is contained, peeling static electricity can be further suppressed. If a resin film is used as the release sheet, it is necessary to form an antistatic coating layer on the resin film to impart antistatic functionality. In contrast, according to this embodiment, by adding an antistatic agent to the impregnating resin, it is possible to easily impart antistatic functionality to the dust-free paper used as a release sheet.
- a release layer is provided as the outermost layer on the release surface (the surface in contact with the adhesive layer) of the dust-free paper.
- the release layer allows the release sheet to be easily peeled off from the adhesive layer laminated on the release sheet.
- the release agent may be at least one selected from the group consisting of silicone-based release agents, alkyd-based release agents, polyolefin-based release agents, and urethane-based release agents.
- the thickness of the release layer is usually about 0.01 ⁇ m to 1 ⁇ m, and preferably 0.01 ⁇ m to 0.2 ⁇ m.
- a smoothing layer is provided on the release surface of the dust-free paper.
- the surface of dust-free paper has a moderate amount of unevenness.
- the unevenness will be transferred to the adhesive layer, and the smoothness of the adhesive layer surface will be lost. Therefore, in applications where a uniform thickness of the adhesive layer is required due to reasons such as the thinness of the workpiece (for example, applications in which it is attached to a workpiece for a semiconductor device or a MEMS workpiece), it is preferable that a smoothing layer is provided on the release surface.
- the smoothing layer can be formed, for example, by coating the surface of the dust-free paper with a resin.
- the resin to be coated may contain, for example, an energy ray-curable compound, and may be cured by irradiating energy rays after application. Examples of energy rays include electron beams and ultraviolet rays.
- the smoothing layer can be realized by laminating a resin film (for example, a thin polyethylene film with a thickness of 5 ⁇ m or less) on the surface of the dust-free paper.
- the surface of the smoothing layer usually has an arithmetic mean roughness Ra of less than 500 nm.
- the arithmetic mean roughness Ra of the surface of the smoothing layer is preferably 3 to 300 nm, and more preferably 5 to 200 nm. Furthermore, when the release surface of the dust-free paper has both a smoothing layer and a release layer, the arithmetic mean roughness Ra of the surface of the release layer is preferably 1 to 200 nm, and more preferably 3 to 100 nm.
- the adhesive layer may contain high-boiling point solvents such as naphtha. Therefore, to prevent the dust-free paper from absorbing such solvents and changing its quality, a solvent-resistant layer may be provided on the release surface of the dust-free paper.
- the solvent-resistant layer can be provided by coating the surface of the dust-free paper with a resin, in the same way as the smoothing layer, and the smoothing layer may also serve as the solvent-resistant layer.
- the thickness of the dust-free paper is not particularly limited, but is, for example, 30 to 300 ⁇ m, and preferably 50 to 200 ⁇ m.
- the method for producing the adhesive sheet is not particularly limited, but a preferred example of the method for producing the adhesive sheet will be described below.
- dust-free paper is prepared as a release sheet.
- a composition in which the release agent is diluted with a solvent is applied onto the prepared dust-free paper, and the composition is dried by heating to volatilize the solvent, thereby obtaining a release layer.
- an adhesive composition containing a substance that will be a precursor of the adhesive layer is applied onto the release layer.
- the adhesive composition is dried by heating.
- the composition in which the release agent is diluted with a solvent or the adhesive composition is dried in an oven. This forms an adhesive layer.
- a support film is attached to the adhesive layer as necessary, and an adhesive sheet according to this embodiment is obtained.
- the above-mentioned manufacturing method is preferable in terms of productivity, etc.
- a resin film is used as the release sheet, the resin film may shrink due to heat when the adhesive composition is heated and dried.
- dust-free paper generally has higher heat resistance than resin film.
- dust-free paper having a plant fiber layer such as pulp is used as the release sheet, dust-free paper with high heat resistance is obtained. Therefore, by using dust-free paper with high heat resistance as the release sheet, it is possible to prevent the release sheet from shrinking when the adhesive composition is heated and dried. This makes it possible to suppress wrinkles and make it easier to obtain an adhesive sheet of the desired width. In addition, it becomes possible to dry the adhesive composition at a higher temperature, which improves the productivity of the adhesive sheet.
- An adhesive sheet for a workpiece comprising an adhesive layer configured to be affixed to a workpiece for an electronic device, and a release sheet disposed on the adhesive layer and removable from the adhesive layer, the release sheet having dust-free paper.
- the adhesive sheet for a workpiece according to claim 1 which is at least one selected from the group consisting of an adhesive sheet for joining components, a film for covering the rear surface of a workpiece, a film for reinforcing bumps, and an interlayer insulating material for forming a build-up layer; Adhesive sheet for work.
- Appendix 3 3. An adhesive sheet for a workpiece according to claim 1 or 2, wherein the adhesive layer has photocuring properties.
- Appendix 8 A method for producing an adhesive sheet for a workpiece according to any one of Appendices 1 to 7, comprising the steps of: preparing dust-free paper; applying an adhesive composition containing a substance that is a precursor of an adhesive layer onto the dust-free paper; and, after the application step, drying the adhesive composition by heating to form an adhesive layer.
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Abstract
Description
本発明は、ワーク用接着シート及びその製造方法に関する。 The present invention relates to an adhesive sheet for workpieces and a method for manufacturing the same.
半導体装置などの電子デバイスの製造にあたっては、まず、ワークが準備される。そして、ワークが加工され、電子デバイスが形成される。 When manufacturing electronic devices such as semiconductor devices, the workpiece is first prepared. The workpiece is then processed to form the electronic device.
電子デバイスの製造時には、様々な目的で、ワークに接着シートが貼付されることがある。そのような接着シートに関して、特許文献1(特開2021-40099号公報)には、特定の構成を有し、半導体ウエハの裏面に貼付される保護膜形成用複合シートが開示されている。 When manufacturing electronic devices, adhesive sheets are sometimes attached to workpieces for various purposes. With regard to such adhesive sheets, Patent Document 1 (JP Patent Publication No. 2021-40099) discloses a composite sheet for forming a protective film having a specific configuration and which is attached to the back surface of a semiconductor wafer.
ところで、近年、持続可能な世界の実現のために二酸化炭素排出量を低減することが求められている。本発明者らは、電子デバイスの製造時にワークに貼付される接着シートについても、接着シート製造時における二酸化炭素排出量の点で改善できないかと考えた。 In recent years, there has been a demand to reduce carbon dioxide emissions in order to realize a sustainable world. The inventors wondered whether it would be possible to improve the amount of carbon dioxide emissions emitted during the manufacture of adhesive sheets, which are attached to workpieces during the manufacture of electronic devices.
そこで、本発明の目的は、電子デバイス用ワークに貼付されるワーク用接着シートについて、二酸化炭素排出量を改善することができる技術を提供することにある。 The object of the present invention is to provide a technology that can improve carbon dioxide emissions from work adhesive sheets that are attached to workpieces for electronic devices.
本発明者らは、ワーク用接着シートに含まれる剥離シートに着目した。そして、そのような剥離シートとして無塵紙を用いることにより、二酸化炭素排出量を低減できることを見出し、本発明に至った。 The inventors focused on the release sheet included in the work adhesive sheet. They discovered that carbon dioxide emissions can be reduced by using dust-free paper as such a release sheet, which led to the invention.
すなわち、一態様において、本発明に係るワーク用接着シートは、電子デバイス用ワークに貼付されるように構成された接着剤層と、接着剤層上に配置され、接着剤層から剥離可能である、剥離シートとを備える。剥離シートは、無塵紙を有する。 In other words, in one embodiment, the adhesive sheet for a workpiece according to the present invention comprises an adhesive layer configured to be attached to a workpiece for an electronic device, and a release sheet disposed on the adhesive layer and capable of being peeled off from the adhesive layer. The release sheet comprises dust-free paper.
本発明によれば、電子デバイス用ワークに接着されるワーク用接着シートについて、二酸化炭素排出量を改善することができる技術が提供される。 The present invention provides a technology that can improve carbon dioxide emissions from work adhesive sheets that are attached to electronic device workpieces.
以下、本発明の実施形態に係るワーク用接着シートについて説明する。 The following describes the adhesive sheet for workpieces according to an embodiment of the present invention.
本実施形態に係るワーク用接着シートは、電子デバイス用ワークに貼付されて使用される接着シートである。詳細は後述するが、電子デバイス用ワークとは、電子デバイスの製造に用いられるワークを指す。すなわち、電子デバイス用ワークが加工され、電子デバイスが製造される。本実施形態に係る接着シートは、電子デバイスの製造過程におけるいずれかの段階において、電子デバイス用ワークに貼付されて使用されるものである。 The adhesive sheet for workpieces according to this embodiment is an adhesive sheet that is attached to workpieces for electronic devices when used. Details will be described later, but a workpiece for an electronic device refers to a workpiece used in the manufacture of an electronic device. In other words, a workpiece for an electronic device is processed to manufacture an electronic device. The adhesive sheet according to this embodiment is attached to a workpiece for an electronic device when used at any stage in the manufacturing process of the electronic device.
なお、以下の説明において、「ワーク用接着シート」が、単に、「接着シート」と称される場合がある。また、「電子デバイス用ワーク」が、単に、「ワーク」と称される場合がある。 In the following description, the "adhesive sheet for work" may simply be referred to as the "adhesive sheet." Also, the "work for electronic device" may simply be referred to as the "work."
(概略)
図1は、本実施形態に係る接着シート1を示す概略断面図である。図1に示されるように、接着シート1は、接着剤層2、剥離シート3、及び支持フィルム4を有している。これらは、支持フィルム4、接着剤層2及び剥離シート3の順に積層されている。
(Summary)
Fig. 1 is a schematic cross-sectional view showing an
接着剤層2は、ワークに貼付されるように構成されている。すなわち、接着剤層2は、電子デバイスの製造過程におけるいずれかの段階で、ワークに貼付される。
The
剥離シート3は、接着剤層2の保護などを目的として、接着剤層2上に配置されている。剥離シート3は、接着剤層2から剥離可能である。剥離シート3を剥離するタイミングは、特に限定されない。剥離シート3は、電子デバイスの製造過程におけるいずれかのタイミングで、接着剤層2から剥離される。
The
支持フィルム4は、接着剤層2を支持するために設けられている。なお、支持フィルム4は必須の構成ではない。例えば接着剤層2が自立性を有している場合、支持フィルム4は省略されてもよい。支持フィルム4は、接着剤層2と分離不能に積層されていてもよいし、接着シートが、後述する部品接合用接着シート、又はワーク裏面被覆用フィルム等である場合には、支持フィルム4が接着剤層2から分離可能であり、電子デバイスの製造過程におけるいずれかのタイミングで、接着剤層2から剥離されるものであってもよい。また、接着剤層2と支持フィルム4の間に、接着剤層2側から順に、芯材層6、第2の接着剤層2’が積層され、接着シート1がいわゆる両面接着シートの構成を有していてもよい。この場合には、第2の接着剤層2’と積層された支持フィルム4は、第2の接着剤層2’から分離可能であり、電子デバイスの製造過程におけるいずれかのタイミングで、接着剤層2から剥離される。
The
ここで、本実施形態においては、剥離シート3が、無塵紙を有している。より詳細には、剥離シート3は無塵紙により構成されている。無塵紙は、剥離シート3として一般的に使用されている樹脂フィルムに比べて、二酸化炭素排出量が少ない。例えば、無塵紙は、ポリエチレンテレフタレートフィルムと比べて、約4分の1程度の二酸化炭素排出量により実現できる。本実施形態によれば、無塵紙が剥離シート3として使用されているので、接着シート1全体における二酸化炭素排出量を低減することができる。
Here, in this embodiment, the
支持フィルム4は、接着剤層2から分離不能に積層されている場合には、例えば樹脂フィルム(PETフィルムなど)により、実現される。支持フィルム4が接着剤層2から分離できる場合には、支持フィルム4が、接着剤層2を保持するための粘着剤層を有する接着剤層支持用粘着シート4’であってもよいし、剥離シート3と同様の機能を有する第2の剥離シート3’であってもよい。接着シート1が芯材層6、第2の接着剤層2’を有し、いわゆる両面接着シートの構成を有する場合には、支持フィルム4は、通常、第2の剥離シート3’である。接着シート1が第2の剥離シート3’を有する場合、第2の剥離シート3’は無塵紙を有していなくてもよいが、接着シート1全体における二酸化炭素排出量を低減する観点からは、剥離シート3と同様に無塵紙を有することが好ましい。すなわち、剥離シート3と第2の剥離シート3’のいずれもが、無塵紙を有することが好ましい。
When the
また、電子デバイス用ワークに貼付される接着シートに対しては、異物(粉塵、塵埃)の発生が少ないことが要求される。無塵紙を使用することにより、そのような要求にも応えることができる。 In addition, adhesive sheets that are applied to workpieces for electronic devices must generate minimal amounts of foreign matter (dust, dirt). By using dust-free paper, such requirements can be met.
以上が本実施形態に係る接着シート1の概略である。続いて、接着シート1の詳細について説明する。
The above is an overview of the
(接着シートの使用方法)
まず、接着シートの使用方法について説明する。本実施形態に係る接着シートの使用方法は、接着剤層の少なくとも一面を露出面として露出させる露出工程と、接着剤層の露出面にワークを貼付する貼付工程と、接着剤層から剥離シートを剥離する剥離工程を有している。なお、剥離工程は、既述のように、どの段階で実施されてもよい。例えば、剥離工程によって露出工程が実現されてもよい。すなわち、剥離シートを接着剤層から剥離することによって、接着剤層の少なくとも一面を露出させてもよい。一方で、剥離工程は、貼付工程の後に実施されてもよい。すなわち、剥離シートを有する状態でワークに接着剤層が貼付され、その後に、剥離シートが剥離されてもよい。
(How to use the adhesive sheet)
First, a method of using the adhesive sheet will be described. The method of using the adhesive sheet according to this embodiment includes an exposing step of exposing at least one surface of the adhesive layer as an exposed surface, an attaching step of attaching a workpiece to the exposed surface of the adhesive layer, and a peeling step of peeling the release sheet from the adhesive layer. As described above, the peeling step may be performed at any stage. For example, the exposing step may be realized by the peeling step. That is, at least one surface of the adhesive layer may be exposed by peeling the release sheet from the adhesive layer. On the other hand, the peeling step may be performed after the attaching step. That is, the adhesive layer may be attached to the workpiece with the release sheet, and then the release sheet may be peeled off.
以下に、図2を参照して、接着シートの使用方法の好ましい一例を説明する。 Below, a preferred example of how to use the adhesive sheet is described with reference to Figure 2.
図2は、接着シート1の使用方法の一例を示す概略図である。図2(a)に示すように、まず、剥離シート3が接着剤層2から剥離される。これにより、接着剤層2の一面が露出する。続いて、接着剤層2の露出面に、ワーク5が貼付される。その後、必要な処理が行われる。以上が、接着シート1の使用方法の一例である。なお、接着剤層2は、最終的にワーク5から除去されてもよい。一方で、接着剤層2は、最終製品の一部としてワーク5に貼付されたままであってもよい。いずれにせよ、図2に示す例のように、剥離シート3は、ワーク5の貼付前に剥離することが好ましい。無塵紙を用いることにより、異物の発生を抑制することができるものの、異物の発生を完全になくすことは困難である。ワーク5の貼付前に剥離シート3を剥離すれば、無塵紙由来の異物がワーク5により付着し難くなる。
FIG. 2 is a schematic diagram showing an example of a method of using the
接着シート1が、第2の剥離シート3’を有する場合には、剥離シート3をワーク5の貼付前に剥離し、第2の剥離シート3’をワーク5の貼付後に剥離することで、剥離シート3を剥離してから接着剤層2にワーク5を貼付するまでの間の接着シート1のハンドリング性が保たれる。また、第2の剥離シート3’が無塵紙を有しないものであれば、無塵紙由来の異物がワーク5により付着し難くなるという上述の効果を得ることができる。一方、第2の剥離シート3’をワーク5の貼付前に剥離し、剥離シート3をワーク5の貼付後に剥離する場合には、無塵紙由来の異物がワーク5により付着し難くなるという上述の効果は得られなくなる。しかしながら、剥離シート3と第2の剥離シート3’のいずれも、無塵紙を有するものとし、接着シート1全体における二酸化炭素排出量をより低減することが可能になるという利点がある。この場合には、露出工程(剥離シート3ではなく、第2の剥離シート3’を剥がして、ワーク5に貼付するための露出面として接着剤層2の一面を露出させる工程)と剥離工程(剥離シート3を剥がす工程)は別々に行われる。
If the
(電子デバイス用ワーク)
続いて、電子デバイス用ワークについて説明する。既述のように、電子デバイス用ワークとは、電子デバイスを製造するためのワークである。電子デバイス用ワークとして、例えば、回路基板、半導体装置用ワーク等が挙げられる。半導体装置用ワークとしては、例えば、半導体ウエハ、半導体チップ、半導体パッケージ、及びファンアウトパッケージングプロセスで作製されるチップ封止体等が挙げられる。また、電子デバイス用ワークとしては、半導体装置の製造プロセスと同様の加工方法(例えばリソグラフィ加工等)により加工されるワークを挙げることもできる。例えば、電子デバイス用ワークとして、MEMS用ワーク、及びLEDチップ形成用のウエハ(サファイアウエハ等)を用いることも可能である。これらの中でも、半導体装置用ワーク又は半導体装置の製造プロセスと同様の加工方法により加工されるワークが好ましい。
(Workpieces for electronic devices)
Next, the workpiece for electronic devices will be described. As described above, the workpiece for electronic devices is a workpiece for manufacturing electronic devices. Examples of the workpiece for electronic devices include circuit boards and workpieces for semiconductor devices. Examples of the workpiece for semiconductor devices include semiconductor wafers, semiconductor chips, semiconductor packages, and chip encapsulants produced by a fan-out packaging process. Examples of the workpiece for electronic devices include workpieces processed by a processing method similar to the manufacturing process of semiconductor devices (e.g., lithography processing, etc.). For example, it is also possible to use a workpiece for MEMS and a wafer for forming LED chips (sapphire wafer, etc.) as the workpiece for electronic devices. Among these, a workpiece for semiconductor devices or a workpiece processed by a processing method similar to the manufacturing process of semiconductor devices is preferable.
電子デバイス用ワークの厚さは特に限定されないが、近時、電子デバイスの薄型化に伴い、電子デバイス用ワークとして従来よりも薄いものが採用されるようになってきており、例えば、5~100μm程度であり、好ましくは10~70μm程度である。接着シートが後述するバックグラインドシートである場合、ワークの裏面の研削後の厚さが上記の範囲内にあることが好ましい。 The thickness of the workpiece for electronic devices is not particularly limited, but in recent years, as electronic devices have become thinner, thinner workpieces for electronic devices have been adopted than before, for example, about 5 to 100 μm, and preferably about 10 to 70 μm. If the adhesive sheet is a backgrind sheet described below, it is preferable that the thickness of the back surface of the workpiece after grinding is within the above range.
(用途)
本実施形態に係る接着シートは、電子デバイスの製造時にワークに貼付されて使用されるものであればよく、その具体的な用途は特に限定されない。例えば、接着シートは、ワーク加工用粘着シート、ワーク支持用粘着シート、部品接合用接着シート、ワーク裏面被覆用フィルム、バンプ補強用フィルム及びビルドアップ層形成用層間絶縁材料からなる少なくとも一種であり得る。
(Application)
The adhesive sheet according to the present embodiment may be used by being attached to a workpiece during the manufacture of an electronic device, and its specific use is not particularly limited. For example, the adhesive sheet may be at least one of an adhesive sheet for processing a workpiece, an adhesive sheet for supporting a workpiece, an adhesive sheet for joining components, a film for covering the back surface of a workpiece, a film for reinforcing bumps, and an interlayer insulating material for forming a build-up layer.
「ワーク加工用粘着シート」とは、ワークの加工時にワークに貼付される粘着シートである。ワーク加工用粘着シートとして、例えば、ダイシングシート、バックグラインドシート及びチップ封止プロセス用シート等を挙げることができる。 The "adhesive sheet for workpiece processing" is an adhesive sheet that is attached to a workpiece when the workpiece is processed. Examples of adhesive sheets for workpiece processing include dicing sheets, back grinding sheets, and sheets for chip sealing processes.
ダイシングシートは、半導体ウエハ等のワークをダイシングする際に、ワークを支持するためのシートである。ダイシングシートとして使用する場合には、接着剤層の露出後、露出面上にワークが貼付される。その後、ワークがダイシングされる。これにより、複数のチップが形成される。ダイシング後、各チップは、接着剤層からピックアップされる。ワークのダイシングは、ブレード等の機械的な手段により行われてもよいし、レーザー、プラズマ等の手段を用いてワークを切断してもよい。 A dicing sheet is a sheet for supporting a workpiece such as a semiconductor wafer when the workpiece is diced. When used as a dicing sheet, the adhesive layer is exposed and then the workpiece is attached to the exposed surface. The workpiece is then diced, thereby forming multiple chips. After dicing, each chip is picked up from the adhesive layer. The workpiece may be diced using mechanical means such as a blade, or the workpiece may be cut using means such as a laser or plasma.
バックグラインドシートとは、回路形成面を有するワーク(半導体ウエハ等)の裏面(回路形成面とは反対側の面)を研削する際に、回路形成面を保護するために使用されるシートである。バックグラインドシートとして使用する場合には、接着剤層の露出後、露出面上にワークの回路形成面が貼付される。その後、ワークの裏面が研削される。その後、必要に応じて、ワークから接着剤層が除去される。バックグラインドシートは、ワークが半導体ウエハであって、半導体ウエハの回路形成面に予め設けられた溝、又は半導体ウエハ内部に予め形成された改質領域から構成される分割予定ラインに沿って、研削により半導体ウエハが複数の半導体チップに個片化される、ワークの個片化方法(いわゆる先ダイシング法)に用いられるものであってもよい。先ダイシング法は、薄い半導体チップを得るのに適した方法であり、得られる半導体チップは薄いものとなる傾向がある。 The backgrind sheet is a sheet used to protect the circuit-forming surface of a workpiece (such as a semiconductor wafer) when grinding the back surface (the surface opposite to the circuit-forming surface) of the workpiece having a circuit-forming surface. When used as a backgrind sheet, the adhesive layer is exposed, and then the circuit-forming surface of the workpiece is attached to the exposed surface. The back surface of the workpiece is then ground. If necessary, the adhesive layer is then removed from the workpiece. The backgrind sheet may be used in a method of singulating a workpiece (a so-called pre-dicing method) in which the workpiece is a semiconductor wafer and the semiconductor wafer is singulated into multiple semiconductor chips by grinding along planned division lines that are composed of grooves pre-formed on the circuit-forming surface of the semiconductor wafer or modified regions pre-formed inside the semiconductor wafer. The pre-dicing method is a method suitable for obtaining thin semiconductor chips, and the resulting semiconductor chips tend to be thin.
チップ封止プロセス用シートとは、複数のチップであるワークを接着シートの接着剤層上に所定の配置で固定し、これらの複数のチップを封止材で覆い、封止材を硬化させることで複数のチップが封止された封止体を得るためのシートである。チップ封止用シートである接着シートが、芯材層及び第2の接着剤層を有する両面接着シートの構成を有し、第2の接着剤層がガラス板等の支持基板に接着され、ワークである複数のチップが接着シートを介して支持基板に固定されてもよい。接着シートからのワーク又は支持基板の剥離を容易とするために、接着剤層、芯材層及び第2の接着剤層の少なくとも一つが、熱膨張性粒子を含むものであり、接着シートのワーク又は支持基板に対する接着力が、加熱により低下するものであってもよい。 The chip sealing process sheet is a sheet for obtaining a sealed body in which multiple chips are sealed by fixing multiple chips, which are workpieces, in a predetermined arrangement on the adhesive layer of an adhesive sheet, covering the multiple chips with a sealing material, and hardening the sealing material. The adhesive sheet, which is a chip sealing sheet, may have a configuration of a double-sided adhesive sheet having a core material layer and a second adhesive layer, and the second adhesive layer may be attached to a support substrate such as a glass plate, and the multiple chips, which are the workpieces, may be fixed to the support substrate via the adhesive sheet. In order to facilitate peeling of the workpiece or support substrate from the adhesive sheet, at least one of the adhesive layer, the core material layer, and the second adhesive layer may contain thermally expandable particles, and the adhesive strength of the adhesive sheet to the workpiece or support substrate may be reduced by heating.
「ワーク支持用粘着シート」とは、ワーク(ウエハ及びチップなど)の一時保管時や搬送時にワークを支持するために用いられる粘着シートである。ワーク支持用粘着シートとして使用する場合には、接着剤層の露出及びワークの貼付後、ワークの一時保管またはワークの搬送が行われる。また、ワークが複数のチップである場合に、ワーク支持用粘着シート上に所定の配置で複数のチップが支持された状態で、ワーク支持用粘着シートを伸張することにより、複数のチップ同士の間隔を拡張するエキスパンド処理が行われてもよい。その後、必要に応じて、ワークから接着剤層が除去される。 The "adhesive sheet for supporting a workpiece" is an adhesive sheet used to support a workpiece (such as a wafer or chip) during temporary storage or transportation. When used as an adhesive sheet for supporting a workpiece, the adhesive layer is exposed and the workpiece is attached, after which the workpiece is temporarily stored or transported. In addition, when the workpiece is multiple chips, an expansion process may be performed in which the spacing between the multiple chips is expanded by stretching the adhesive sheet for supporting a workpiece while the multiple chips are supported in a predetermined arrangement on the adhesive sheet for supporting a workpiece. The adhesive layer is then removed from the workpiece as necessary.
なお、上述の粘着シート(ワーク加工用粘着シート及びワーク支持用粘着シート)では、通常、接着剤層として感圧接着剤層が用いられる。また、接着剤層は、通常、支持フィルムによって支持される。ただし、既述のように、接着剤層に自立性がある場合には、支持フィルムが省略されてもよい。 In the above-mentioned adhesive sheets (adhesive sheets for workpiece processing and adhesive sheets for workpiece support), a pressure-sensitive adhesive layer is usually used as the adhesive layer. The adhesive layer is usually supported by a support film. However, as mentioned above, if the adhesive layer is self-supporting, the support film may be omitted.
「部品接合用接着シート」とは、複数の部品を接合するために使用されるシートである。部品接合用接着シートが硬化性を有する硬化性接着シートであることが好ましく、これにより、硬化性接着シートにより部品同士を仮接着した後に、硬化させることで強固な接合を得ることができる。以下、硬化性接着シートを例に取り、部品接合用接着シートについて説明する。硬化性接着シートは、通常、接着剤層に加えて支持フィルムを有する。接着剤層は支持フィルムから分離可能である。 An "adhesive sheet for joining parts" is a sheet used to join multiple parts. It is preferable that the adhesive sheet for joining parts is a curable adhesive sheet that has a curing property, so that a strong bond can be obtained by temporarily bonding the parts together with the curable adhesive sheet and then curing it. Below, the adhesive sheet for joining parts is explained using a curable adhesive sheet as an example. A curable adhesive sheet usually has a support film in addition to an adhesive layer. The adhesive layer is separable from the support film.
硬化性接着シートとしては、例えば、ダイアタッチメントフィルムを挙げることができる。例えば、ダイアタッチメントフィルムとして使用する場合には、まず、接着剤層における少なくとも一方の面を露出させる。具体的には、剥離シート及び支持フィルムの一方を剥離することにより、接着剤層における一方の面を露出させる。続いて、接着剤層の露出面に、ワーク(半導体チップ、及び、半導体ウエハ等)を貼付する。その後、接着剤層の他方の面を露出させる。すなわち、支持フィルム及び剥離シートの他方を剥離することにより、他方の面を露出させる。次いで、接着剤層の他方の面を、基板に貼付する。その後、接着剤層を硬化させる。これにより、基板上に接着剤層を介してワークを接合させることができる。 An example of a curable adhesive sheet is a die attachment film. For example, when used as a die attachment film, at least one side of the adhesive layer is first exposed. Specifically, one side of the adhesive layer is exposed by peeling off one of the release sheet and the support film. Next, a workpiece (such as a semiconductor chip or a semiconductor wafer) is attached to the exposed side of the adhesive layer. After that, the other side of the adhesive layer is exposed. That is, the other side of the support film and the release sheet is peeled off to expose the other side. Next, the other side of the adhesive layer is attached to a substrate. The adhesive layer is then cured. This allows the workpiece to be bonded to the substrate via the adhesive layer.
硬化性接着シートの他の例としては、フェイスダウン型の半導体チップのバンプ形成面と、基板等の間に介在させて、これらを接合する非導電性の接着フィルム(NCF)が挙げられる。例えば、NCFとして使用する場合には、まず、接着剤層における少なくとも一方の面を露出させる。具体的には、剥離シート及び支持フィルムの一方を剥離することにより、接着剤層における一方の面を露出させる。続いて、接着剤層の露出面に、ワークであるフェイスダウン型の半導体チップ用ウエハのバンプ形成面を貼付する。貼付は真空ラミネーター等を用いて行ってもよい。その後、接着剤層の他方の面を露出させる。すなわち、支持フィルム及び剥離シートの他方を剥離することにより、他方の面を露出させる。次いで、接着シートと半導体ウエハとの積層体をダイシングしてNCF付きの半導体チップを得て、接着剤層の他方の面を基板上に貼付する。その後、接着剤層を硬化させる。これにより、基板上に接着剤層を介してワークを接合させることができる。 Another example of a curable adhesive sheet is a non-conductive adhesive film (NCF) that is interposed between the bump-forming surface of a face-down type semiconductor chip and a substrate or the like to bond them together. For example, when used as an NCF, at least one surface of the adhesive layer is first exposed. Specifically, one of the release sheet and the support film is peeled off to expose one surface of the adhesive layer. Next, the bump-forming surface of the face-down type semiconductor chip wafer, which is the workpiece, is attached to the exposed surface of the adhesive layer. The attachment may be performed using a vacuum laminator or the like. Then, the other surface of the adhesive layer is exposed. That is, the other surface is exposed by peeling off the other of the support film and the release sheet. Next, the laminate of the adhesive sheet and the semiconductor wafer is diced to obtain a semiconductor chip with an NCF, and the other surface of the adhesive layer is attached to the substrate. The adhesive layer is then cured. This allows the workpiece to be bonded to the substrate via the adhesive layer.
部品接合用シートとして、熱伝導材含有焼成用フィルムも挙げることができる。熱伝導材含有焼成用フィルムの接着剤層は、金属粒子や窒化ホウ素等の熱伝導材を、好ましくは粒子状で樹脂中に分散された状態で含有する。熱伝導材含有焼成用フィルムは、通常、パワー半導体の固定に用いられる。具体的には、剥離シート及び支持フィルムの一方を剥離することにより、接着剤層における一方の面を露出させる。続いて、接着剤層の露出面に、ワーク(パワー半導体チップ、及び、パワー半導体ウエハ等)を貼付する。その後、接着剤層の他方の面を露出させる。すなわち、支持フィルム及び剥離シートの他方を剥離することにより、他方の面を露出させる。次いで、接着剤層の他方の面を、基板等の他の部材に貼付する。その後、接着剤層を焼成することで、熱伝導材の焼結体からなる層によりワークと他の部材が接合される。熱伝導材の焼結体からなる層は、パワー半導体から発せられる熱の熱伝導経路として機能する。 Thermal conductive material-containing sintering film can also be used as a component bonding sheet. The adhesive layer of the thermal conductive material-containing sintering film contains a thermal conductive material such as metal particles or boron nitride, preferably in the form of particles dispersed in the resin. Thermal conductive material-containing sintering film is usually used to fix power semiconductors. Specifically, one side of the adhesive layer is exposed by peeling off one of the release sheet and the support film. Then, a work (power semiconductor chip, power semiconductor wafer, etc.) is attached to the exposed side of the adhesive layer. Then, the other side of the adhesive layer is exposed. That is, the other side of the support film and the release sheet is peeled off to expose the other side. Then, the other side of the adhesive layer is attached to another member such as a substrate. Then, the adhesive layer is sintered, and the work and the other member are bonded by the layer made of a sintered body of the thermal conductive material. The layer made of a sintered body of the thermal conductive material functions as a thermal conduction path for the heat generated from the power semiconductor.
「ワーク裏面被覆用フィルム」とは、回路形成面を有するワーク(例えば半導体ウエハ及び半導体チップ等)の裏面に接着剤層による被覆層を設けるためのフィルムである。したがって、被着体としてワークのみに接着し、ワークと他の部品との接合には用いられない。ここでいうワークの裏面とは、回路形成面の反対側を向く面である。ワーク裏面被覆用フィルムとしては、例えば、フェイスダウン型の半導体チップの裏面に貼付される保護シート(チップ裏面保護テープという)、及び、反り防止のために半導体チップを含む封止体の裏面に貼付されるシート(反り防止シートという)などを挙げることができる。被覆層は、ワークの裏面に直接設けられてもよいし、他の層を介して設けられてもよい。 A "film for covering the back surface of a workpiece" is a film for providing a covering layer of an adhesive layer on the back surface of a workpiece (such as a semiconductor wafer or semiconductor chip) that has a circuit-forming surface. Therefore, it is only attached to the workpiece as an adherend, and is not used to join the workpiece to other components. The back surface of the workpiece referred to here is the surface facing the opposite side to the circuit-forming surface. Examples of films for covering the back surface of a workpiece include protective sheets (called chip back surface protective tape) that are attached to the back surface of face-down type semiconductor chips, and sheets (called anti-warping sheets) that are attached to the back surface of an encapsulant that contains a semiconductor chip to prevent warping. The covering layer may be provided directly on the back surface of the workpiece, or may be provided via another layer.
例えば、チップ裏面保護テープとして使用する場合には、接着剤層の露出後、接着剤層にワークとして半導体ウエハの裏面が貼付される。続いて、接着剤層が硬化させられ、被覆層が形成される。その後、必要に応じてダイシングシートを用いて、半導体ウエハがダイシングされ、複数の半導体チップに分割される。これにより、裏面が被覆層により保護された半導体チップが得られる。その後、各半導体チップがピックアップされ、フェイスダウン形式で他の基板などに実装される。なお、接着シートに支持フィルムが存在する場合、支持フィルムは、例えば硬化後等の適当なタイミングで除去される。また、接着剤層におけるワークとは反対側の面は解放されており、その他の被着体には接着しない。 For example, when used as a chip backside protection tape, after the adhesive layer is exposed, the backside of a semiconductor wafer is attached to the adhesive layer as a workpiece. The adhesive layer is then cured to form a coating layer. The semiconductor wafer is then diced using a dicing sheet as necessary, and divided into multiple semiconductor chips. This results in semiconductor chips whose backsides are protected by a coating layer. Each semiconductor chip is then picked up and mounted face-down on another substrate. If a support film is present on the adhesive sheet, the support film is removed at an appropriate time, for example after curing. The surface of the adhesive layer opposite the workpiece is left open, and does not adhere to other substrates.
例えば、反り防止シートとして使用する場合には、接着剤層の露出後、露出面上にワークとして半導体チップの裏面が貼付される。次いで、接着剤層上に、半導体チップが封止されるように、封止樹脂が供給される。次いで、接着剤層及び封止樹脂が硬化させられる。これにより、反りが抑制された封止体が得られる。 For example, when used as an anti-warping sheet, after the adhesive layer is exposed, the back surface of a semiconductor chip is attached to the exposed surface as a workpiece. Next, an encapsulating resin is supplied onto the adhesive layer so as to encapsulate the semiconductor chip. Next, the adhesive layer and encapsulating resin are cured. This results in an encapsulated body with reduced warping.
「バンプ補強用フィルム」は、半導体ウエハのバンプ形成面及びバンプを補強する目的で、硬化性の補強膜形成フィルムをバンプ形成面に貼付し、このフィルムを硬化させることによって、バンプ形成面に補強膜を形成するためのフィルムである。例えば、バンプ補強用フィルムとして使用する場合には、まず、接着剤層における少なくとも一方の面を露出させる。具体的には、剥離シート及び支持フィルムの一方を剥離することにより、接着剤層における一方の面を露出させる。続いて、接着剤層の露出面に、ワークである、バンプが形成された半導体ウエハのバンプ形成面を貼付する。貼付は真空ラミネーター等を用いて行ってもよい。その後、接着剤層の他方の面を露出させる。すなわち、支持フィルム及び剥離シートの他方を剥離することにより、他方の面を露出させる。次いで、接着剤層を硬化させる。これにより、ワークのバンプ形成面に補強膜を形成することができる。 The "bump reinforcing film" is a film for forming a reinforcing film on the bump-forming surface of a semiconductor wafer by attaching a curable reinforcing film-forming film to the bump-forming surface and curing the film for the purpose of reinforcing the bumps and the bumps. For example, when used as a bump reinforcing film, first, at least one side of the adhesive layer is exposed. Specifically, one side of the adhesive layer is exposed by peeling off one of the release sheet and the support film. Next, the bump-forming surface of the workpiece, a semiconductor wafer on which bumps are formed, is attached to the exposed surface of the adhesive layer. The attachment may be performed using a vacuum laminator or the like. After that, the other side of the adhesive layer is exposed. That is, the other side is exposed by peeling off the other of the support film and the release sheet. Next, the adhesive layer is cured. This allows a reinforcing film to be formed on the bump-forming surface of the workpiece.
「ビルドアップ層形成用層間絶縁材料」は、多層配線基板を構成する1層のビルドアップ層を形成するために使用されるフィルム状材料である。例えば、ビルドアップ層形成用層間絶縁材料として使用する場合には、まず、接着剤層における少なくとも一方の面を露出させる。具体的には、剥離シート及び支持フィルムの一方を剥離することにより、接着剤層における一方の面を露出させる。続いて、接着剤層の露出面に、ワークである回路基板を貼付する。この際、まだ剥離されていない剥離シート及び支持フィルムの他方を介して、接着剤層に加熱及び加圧を行うラミネート処理を行ってもよい。その後、接着剤層の他方の面を露出させる。すなわち、支持フィルム及び剥離シートの他方を剥離することにより、他方の面を露出させる。次いで、接着剤層を硬化させる。これにより、回路基板上にビルドアップ層が形成される。形成されたビルドアップ層には、ビルドアップ層に穴あけする穴あけ工程、ビルドアップ層を粗化処理する粗化工程、粗化されたビルドアップ層表面にメッキにより導体層を形成するメッキ工程、及び導体層に回路を形成する回路形成工程等が行われてもよい。 The "interlayer insulating material for forming a build-up layer" is a film-like material used to form one build-up layer that constitutes a multilayer wiring board. For example, when used as an interlayer insulating material for forming a build-up layer, first, at least one surface of the adhesive layer is exposed. Specifically, one of the release sheet and the support film is peeled off to expose one surface of the adhesive layer. Then, a circuit board, which is a workpiece, is attached to the exposed surface of the adhesive layer. At this time, a lamination process in which heat and pressure are applied to the adhesive layer may be performed through the other of the release sheet and support film that have not yet been peeled off. Then, the other surface of the adhesive layer is exposed. That is, the other surface is exposed by peeling off the other of the support film and the release sheet. Next, the adhesive layer is cured. As a result, a build-up layer is formed on the circuit board. The formed build-up layer may be subjected to a drilling process in which holes are drilled in the build-up layer, a roughening process in which the build-up layer is roughened, a plating process in which a conductor layer is formed by plating on the roughened surface of the build-up layer, and a circuit formation process in which a circuit is formed on the conductor layer.
好ましくは、接着シートは、ダイシングシート、バックグラインドシート、ダイアタッチメントフィルム、チップ裏面保護テープ、及び反り防止シートからなる群から選択される少なくとも一種である。なお、これらの用途は、複数の用途が組み合わされていてもよい。例えば、接着シートは、ダイアタッチメントフィルムとダイシングシートの機能を併せ持っていてもよい。 Preferably, the adhesive sheet is at least one selected from the group consisting of a dicing sheet, a backgrind sheet, a die attachment film, a chip backside protective tape, and an anti-warping sheet. Note that these uses may be combined. For example, the adhesive sheet may have the functions of both a die attachment film and a dicing sheet.
ワーク加工用粘着シート及びワーク支持用粘着シートにおいては、接着剤層2は、最終的にワーク5から除去されるものであり、部品接合用接着シート、ワーク裏面被覆用フィルム、バンプ補強用フィルム及びビルドアップ基板形成用層間絶縁材料においては、接着剤層2は、最終製品の一部としてワーク5に貼付されたままである。これらの中でも、接着剤層2が最終的にワーク5から除去されるワーク加工用粘着シート及びワーク支持用粘着シートは、電子デバイスの製造過程において間接材料として大量に使用されるものであり、二酸化炭素排出量の低減の要請が高い。
In the case of adhesive sheets for workpiece processing and adhesive sheets for workpiece support, the
(接着シートの形態)
続いて、接着シートの提供形態について説明する。接着シートの形態は特に限定されない。例えば、接着シートは、芯材に長尺状のシートが巻回された形態(以下、ロール状形態という場合がある)で提供され得る。あるいは、接着シートは、複数の枚葉式のシートが積層された形態(以下、枚葉シート積層形態という場合がある)で提供されてもよい。
(Form of adhesive sheet)
Next, the form in which the adhesive sheet is provided will be described. The form of the adhesive sheet is not particularly limited. For example, the adhesive sheet may be provided in a form in which a long sheet is wound around a core material (hereinafter, sometimes referred to as a roll form). Alternatively, the adhesive sheet may be provided in a form in which a plurality of individual sheets are stacked (hereinafter, sometimes referred to as an individual sheet stack form).
(接着剤層)
続いて、接着剤層について説明する。接着剤層としては、例えば、樹脂層が用いられる。接着剤層の具体的構成は、用途に応じて、適宜選択される。なお、接着剤層2は、単一層により構成されていてもよいが、複数の層が積層された構成を有していてもよい。
(Adhesive Layer)
Next, the adhesive layer will be described. For example, a resin layer is used as the adhesive layer. The specific structure of the adhesive layer is appropriately selected depending on the application. The
好ましい一態様において、接着剤層は、光硬化性を有している。 In a preferred embodiment, the adhesive layer is photocurable.
例えば、接着剤層からワークが剥離されるような用途に使用する場合、光硬化により、ワークを剥離しやすくすることができる。例えば、接着シートがダイシングシート及びバックグラインドシート等の粘着シートである場合には、まず、接着剤層にワークに貼付される。そして、ワークが加工された後に、接着剤層に光が照射され、硬化反応が行われる。硬化により、接着剤層とワークとの間の接着力が低下する。よって、接着剤層からワークを容易に剥離することができる。接着剤層に光硬化性を付与するため、通常、接着剤層が光硬化性の化合物を含有するものとすることが好ましい。また、この場合、接着剤層が光重合開始剤を含むことが好ましい。光硬化性の化合物としては、メタクリロイル基又はアクリロイル基等の不飽和炭素結合を含む基を有する化合物が挙げられ、このような化合物には、光ラジカル重合開始剤が好ましく併用される。また、エポキシ樹脂等の環状エーテル基を有する化合物と、光カチオン重合開始剤とを用いた接着剤層を、光硬化性の接着剤層としてもよい。光硬化反応を速やかに進行させる観点からは、接着剤層が不飽和炭素結合を含む基を有する化合物及び光ラジカル重合開始剤を含むことが好ましい。不飽和炭素結合を含む基を有する化合物としては、例えば、トリシクロデカンジメタノールジアクリレート等の、一分子に2つ以上のメタクリロイル基又はアクリロイル基を有する化合物が挙げられ、光ラジカル重合開始剤としては、α-ヒドロキシアルキルフェノン等の分子内開裂型のラジカル重合開始剤が挙げられる。 For example, when used in applications where a workpiece is peeled off from the adhesive layer, photocuring can make it easier to peel off the workpiece. For example, when the adhesive sheet is a pressure-sensitive adhesive sheet such as a dicing sheet or a backgrind sheet, the adhesive layer is first attached to the workpiece. Then, after the workpiece is processed, the adhesive layer is irradiated with light and a curing reaction is carried out. The adhesive strength between the adhesive layer and the workpiece is reduced by the curing. Therefore, the workpiece can be easily peeled off from the adhesive layer. In order to impart photocurability to the adhesive layer, it is usually preferable that the adhesive layer contains a photocurable compound. In addition, in this case, it is preferable that the adhesive layer contains a photopolymerization initiator. Examples of photocurable compounds include compounds having a group containing an unsaturated carbon bond, such as a methacryloyl group or an acryloyl group, and such compounds are preferably used in combination with a photoradical polymerization initiator. In addition, an adhesive layer using a compound having a cyclic ether group, such as an epoxy resin, and a photocationic polymerization initiator may be used as a photocurable adhesive layer. From the viewpoint of quickly progressing the photocuring reaction, it is preferable that the adhesive layer contains a compound having a group containing an unsaturated carbon bond and a photoradical polymerization initiator. Examples of compounds having a group containing an unsaturated carbon bond include compounds having two or more methacryloyl groups or acryloyl groups in one molecule, such as tricyclodecane dimethanol diacrylate, and examples of photoradical polymerization initiators include intramolecular cleavage type radical polymerization initiators such as α-hydroxyalkylphenone.
また、接着剤層には、剥離を容易とするために熱膨張性粒子が含まれていてもよい。熱膨張性粒子が含まれていれば、加熱により、接着剤層と剥離相手(ワーク、又は支持基板)との間の接着性を低下させることができ、容易に剥離を行うことができる。 The adhesive layer may also contain heat-expanding particles to facilitate peeling. If heat-expanding particles are included, the adhesive strength between the adhesive layer and the object to be peeled off (the workpiece or the supporting substrate) can be reduced by heating, making peeling easier.
あるいは、接着シートがダイアタッチメントフィルム等の硬化性接着シートであって、支持フィルムが接着剤層から剥離されることが想定されている場合には、光硬化反応によって、接着剤層から支持フィルムを剥離しやすくすることができる。なお、ダイアタッチメントフィルムの接着剤層が光硬化性を有する場合、ダイボンド後の接着強度を得るために、一般的に、接着剤層は、熱硬化性の化合物をも含む。 Alternatively, if the adhesive sheet is a curable adhesive sheet such as a die attachment film, and it is expected that the support film will be peeled off from the adhesive layer, the photocuring reaction can make it easier to peel the support film off from the adhesive layer. Note that if the adhesive layer of the die attachment film is photocurable, the adhesive layer generally also contains a thermosetting compound in order to obtain adhesive strength after die bonding.
あるいは、接着シートがワーク裏面被覆用フィルムである場合、ワークに接着シートを貼り付けた後に、光線を照射して接着剤層を硬化させることで、硬質の被覆層を得ることが可能である。 Alternatively, if the adhesive sheet is a film for covering the back surface of a workpiece, after attaching the adhesive sheet to the workpiece, it is possible to obtain a hard covering layer by irradiating it with light to harden the adhesive layer.
上述の通り、用途等に応じて、接着剤層は、光硬化性を有するように構成され得る。しかし、接着剤層が光硬化性を有する場合、保管時には、意図しない光硬化反応の進行防止のため、接着剤層が遮光されている必要がある。この点に関して、本実施形態によれば、剥離シートとして無塵紙が使用されている。無塵紙は、遮光性を有している。従って、本実施形態に係る接着シートは、遮光性の観点からも好ましい。接着シートの形態がロール状形態及び枚葉シート積層形態のいずれであったとしても、最外層における無塵紙により、接着剤層への光の入射が抑制される。例えば、本実施形態によれば、遮光性の梱包材を使用することなく、接着シートを保管することができる。あるいは、遮光性の梱包材を使用する場合であっても、開梱から使用までに時間がかかる場合がある。本実施形態によれば、開梱から使用までの間における光線への曝露を防ぐことができ、意図しない硬化の進行をより確実に防止できる。接着剤層が不飽和炭素結合を含む基を有する化合物及び光ラジカル重合開始剤を含む場合、光硬化反応が進行しやすいため、意図しない光硬化反応の進行を防止する必要性が高い。 As described above, the adhesive layer may be configured to have photocurability depending on the application. However, when the adhesive layer has photocurability, the adhesive layer needs to be light-shielded during storage to prevent unintended photocuring reactions from proceeding. In this regard, according to the present embodiment, dust-free paper is used as the release sheet. Dust-free paper has light-shielding properties. Therefore, the adhesive sheet according to the present embodiment is also preferable from the viewpoint of light-shielding properties. Whether the adhesive sheet is in the form of a roll or a laminated sheet, the dust-free paper in the outermost layer suppresses the incidence of light into the adhesive layer. For example, according to the present embodiment, the adhesive sheet can be stored without using a light-shielding packaging material. Alternatively, even if a light-shielding packaging material is used, it may take time from unpacking to use. According to the present embodiment, exposure to light between unpacking and use can be prevented, and unintended curing can be more reliably prevented. When the adhesive layer contains a compound having a group containing an unsaturated carbon bond and a photoradical polymerization initiator, the photocuring reaction is likely to proceed, so there is a high need to prevent unintended photocuring reactions from proceeding.
接着剤層の厚みは用途に応じて設定され、特に限定されない。例えば、接着剤層の厚みは、1μm~1000μmである。
ダイシングシートとして用いる場合、接着剤層の厚みは、例えば3~50μmである。
バックグラインドシートとして用いる場合、接着剤層の厚みは、例えば3~500μmである。バックグラインドシートが、バンプが形成されたワークのバンプ形成面に貼付される場合、接着剤層2と支持フィルム4の間に、バンプを埋没させるための第3接着剤層2”が形成されている場合があり、この場合には、接着剤層2と第3接着剤層2”の合計の厚みが上記の範囲内にあることが好ましい。
チップ封止プロセス用シートとして用いられる場合、接着剤層の厚みは、例えば2~300μmである。チップ封止プロセス用シートが芯材層6及び第2接着剤層3’を有する両面接着シートの構成を有する場合、第2接着剤層3’の厚みは、例えば2~300μmである。
ワークの一時保管又は搬送時にワーク支持用粘着シートとして用いる場合、接着剤層の厚みは、例えば3~50μmである。
ダイアタッチメントフィルムとして用いる場合、接着剤層の厚みは、例えば3~200μmである。
NCFとして用いられる場合、接着剤層の厚みは、例えば5~150μmである。
熱伝導材含有焼成用フィルムとして用いられる場合、接着剤層の厚みは、例えば30~200μmである。
フェイスダウン型の半導体チップの裏面に貼付される保護シート(チップ裏面保護テープ)として用いられる場合、接着剤層の厚みは、例えば5~200μmである。
反り防止のために半導体チップを含む封止体の裏面に貼付されるシート(反り防止シートという)として用いられる場合、接着剤層の厚みは、例えば5~200μmである。
バンプ補強用フィルムとして用いられる場合、接着剤層の厚みは、例えば1~200μmである。
ビルドアップ層形成用層間絶縁材料として用いられる場合、接着剤層の厚みは、例えば3~100μmである。
The thickness of the adhesive layer is set according to the application and is not particularly limited. For example, the thickness of the adhesive layer is 1 μm to 1000 μm.
When used as a dicing sheet, the adhesive layer has a thickness of, for example, 3 to 50 μm.
When used as a backgrind sheet, the thickness of the adhesive layer is, for example, 3 to 500 μm. When the backgrind sheet is attached to the bump-formed surface of a workpiece on which bumps are formed, a third
When used as a sheet for chip sealing process, the thickness of the adhesive layer is, for example, 2 to 300 μm. When the sheet for chip sealing process has a configuration of a double-sided adhesive sheet having a core layer 6 and a second
When used as an adhesive sheet for supporting a workpiece during temporary storage or transport of the workpiece, the thickness of the adhesive layer is, for example, 3 to 50 μm.
When used as a die attachment film, the adhesive layer has a thickness of, for example, 3 to 200 μm.
When used as an NCF, the thickness of the adhesive layer is, for example, 5 to 150 μm.
When used as a thermally conductive material-containing film for firing, the thickness of the adhesive layer is, for example, 30 to 200 μm.
When used as a protective sheet (chip back surface protective tape) to be attached to the back surface of a face-down type semiconductor chip, the adhesive layer has a thickness of, for example, 5 to 200 μm.
When used as a sheet (called an anti-warping sheet) to be attached to the back surface of an encapsulant containing a semiconductor chip to prevent warping, the adhesive layer has a thickness of, for example, 5 to 200 μm.
When used as a bump reinforcing film, the adhesive layer has a thickness of, for example, 1 to 200 μm.
When used as an interlayer insulating material for forming a build-up layer, the adhesive layer has a thickness of, for example, 3 to 100 μm.
(無塵紙)
続いて、無塵紙について説明する。無塵紙は、通常の紙に比べて発塵が少ない紙である。
(dust-free paper)
Next, the dust-free paper will be described. Dust-free paper is paper that generates less dust than regular paper.
例えば、無塵紙として、以下の擦り、揉み、引裂揉みの各試験に従う発塵試験のいずれにおいても、発生する0.3μm以上の浮遊塵が、1立方フィート当たり2,000個以下であるものを用いることができる。
・擦り:A5判(長辺210mm、短辺148mmの矩形)の試験片を2枚用意し、試験紙の表と裏を重ね合わせ、10秒間に3回の割合で200秒間擦り合わせる。
・揉み:A5判(長辺210mm、短辺148mmの矩形)の試験片を15秒間に1回の割合で200秒間、手で揉む。
・引裂揉み:A5判(長辺210mm、短辺148mmの矩形)の試験片4か所を5秒に1回引き裂き、その後揉み試験と同じ要領で180秒間揉む。
試験はクリーンベンチ内で行い、浮遊塵の個数の計測は、光散乱式のパーティクルカウンターにより行う。このようなパーティクルカウンターとして、例えば、リオン株式会社製のものを用いることができる。上記の発塵試験において発生する0.3μm以上の浮遊塵は、1立方フィート当たり1,000個以下であることが好ましく、1立方フィート当たり300個以下であることがより好ましい。
For example, dust-free paper that generates 2,000 or less floating dust particles of 0.3 μm or more per cubic foot in any of the dust generation tests according to the following rubbing, crumpling, and tearing tests can be used.
Rubbing: Prepare two A5 size test pieces (rectangles with long sides of 210 mm and short sides of 148 mm), overlap the front and back of the test paper, and rub them together for 200 seconds, three times every 10 seconds.
Kneading: An A5 size (rectangle with long sides of 210 mm and short sides of 148 mm) test piece is kneaded by hand for 200 seconds at a rate of once every 15 seconds.
- Tear and knead: An A5 size (rectangle with long sides of 210 mm and short sides of 148 mm) test piece is torn at four points once every 5 seconds, and then kneaded for 180 seconds in the same manner as in the kneading test.
The test is carried out in a clean bench, and the number of floating dust particles is measured using a light scattering particle counter. For example, a particle counter manufactured by Rion Co., Ltd. may be used as such a particle counter. The number of floating dust particles of 0.3 μm or more generated in the above dust generation test is preferably 1,000 or less particles per cubic foot, and more preferably 300 or less particles per cubic foot.
無塵紙の材質としては、植物繊維層を有し、当該植物繊維層に含浸樹脂が含浸されている紙を用いることができる。含浸樹脂が含浸していることにより、繊維の飛散が抑制され、無塵紙としての機能が実現される。また、植物繊維を使用した無塵紙は、二酸化炭素排出量が特に少なくなることから、より好適である。植物繊維としてはパルプ等が挙げられるが、このような植物繊維は、一般的にはセルロース等の多糖類から構成され、水酸基等の親水性基に富む構造を有しているため、比較的電気抵抗が低く、剥離シートの帯電を防止し得る。含浸樹脂としては、より二酸化炭素排出量を低減できる可能性がある水系バインダーが好ましく、例えば、アクリル系樹脂とエチレン酢酸ビニル共重合体を組み合わせた水系バインダーが挙げられる。 As the material for the dust-free paper, paper having a plant fiber layer and impregnated with an impregnating resin can be used. The impregnation with the impregnating resin prevents the fibers from scattering, realizing the function of the dust-free paper. Furthermore, dust-free paper using plant fibers is more suitable because it produces particularly low carbon dioxide emissions. Examples of plant fibers include pulp, and such plant fibers are generally composed of polysaccharides such as cellulose and have a structure rich in hydrophilic groups such as hydroxyl groups, so that they have relatively low electrical resistance and can prevent the release sheet from becoming charged. As the impregnating resin, a water-based binder that has the potential to further reduce carbon dioxide emissions is preferable, and an example of such a water-based binder is a combination of an acrylic resin and an ethylene vinyl acetate copolymer.
既述のように、無塵紙を用いることにより、接着シート全体の二酸化炭素排出量を減らすことができる。加えて、無塵紙は、ブロッキング防止及び帯電量低減の点においても好ましい。例えば接着シートがロール状形態で提供される場合、剥離シートは、接着剤層側とは逆側の面において、隣接する層の部材(例えば、支持フィルム、あるいは、支持フィルムが存在しない場合には隣接する層の接着剤層)と接触する。ここで、使用時には、剥離シートが、隣接する層の部材から剥がされつつ、巻き出される。この際、ブロッキングや剥離帯電が生じることがある。しかし、無塵紙は、表面に適度な凹凸を有している。そのため、無塵紙と剥離相手となる隣接する層の部材との間の接触面積は、比較的小さい。その結果、ブロッキングが防止される。また、巻き出し時の剥離帯電も抑制される。無塵紙の表面の算術平均粗さRaは、通常、0.5~5μm程度である。 As mentioned above, the use of dust-free paper can reduce the carbon dioxide emissions of the entire adhesive sheet. In addition, dust-free paper is also preferable in terms of preventing blocking and reducing the amount of static electricity. For example, when the adhesive sheet is provided in a rolled form, the release sheet comes into contact with the member of the adjacent layer (for example, the support film, or, if there is no support film, the adhesive layer of the adjacent layer) on the side opposite the adhesive layer. Here, when in use, the release sheet is unwound while being peeled off from the member of the adjacent layer. At this time, blocking and peeling static electricity may occur. However, dust-free paper has a moderate unevenness on its surface. Therefore, the contact area between the dust-free paper and the member of the adjacent layer that is to be peeled off is relatively small. As a result, blocking is prevented. In addition, peeling static electricity during unwinding is also suppressed. The arithmetic mean roughness Ra of the surface of dust-free paper is usually about 0.5 to 5 μm.
また、無塵紙が、含浸樹脂が含浸した植物繊維層を有する場合、含浸樹脂には帯電防止剤が含まれていることが好ましい。帯電防止剤が含まれていると、剥離帯電をより抑制することができる。仮に、剥離シートとして樹脂フィルムを用いた場合には、帯電防止機能を付与するために、樹脂フィルム上に帯電防止コート層を形成する必要がある。これに対して、本実施形態によれば、含浸樹脂に帯電防止剤を添加することで、剥離シートとしての無塵紙に帯電防止機能を容易に付与することが可能である。 In addition, when the dust-free paper has a plant fiber layer impregnated with an impregnating resin, it is preferable that the impregnating resin contains an antistatic agent. If an antistatic agent is contained, peeling static electricity can be further suppressed. If a resin film is used as the release sheet, it is necessary to form an antistatic coating layer on the resin film to impart antistatic functionality. In contrast, according to this embodiment, by adding an antistatic agent to the impregnating resin, it is possible to easily impart antistatic functionality to the dust-free paper used as a release sheet.
無塵紙の剥離面(接着剤層に接する面)上には、最表層に位置する離型層が設けられていることが好ましい。離型層が設けられていることで、剥離シートに積層された接着剤層から、剥離シートを容易に剥離することができる。離型剤としては、シリコーン系離型剤、アルキド系離型剤、ポリオレフィン系離型剤、ウレタン系離型剤からなる群から選択される少なくとも一種が挙げられる。離型層の厚みは、通常、0.01μm~1μm程度であり、好ましくは0.01μm~0.2μmである。 It is preferable that a release layer is provided as the outermost layer on the release surface (the surface in contact with the adhesive layer) of the dust-free paper. The release layer allows the release sheet to be easily peeled off from the adhesive layer laminated on the release sheet. The release agent may be at least one selected from the group consisting of silicone-based release agents, alkyd-based release agents, polyolefin-based release agents, and urethane-based release agents. The thickness of the release layer is usually about 0.01 μm to 1 μm, and preferably 0.01 μm to 0.2 μm.
また、無塵紙の剥離面には、平滑化層が設けられていることが好ましい。上述のとおり、無塵紙の表面は、適度な凹凸を有している。しかし、剥離面が凹凸を有していると、凹凸が接着剤層に転写され、接着剤層表面の平滑性が失われる。そのため、ワークの厚さが薄い等の理由により、接着剤層の厚さが均一であることが求められる用途(例えば、半導体装置用ワーク又はMEMS用ワークに貼付される用途)においては、剥離面に平滑化層が設けられていることが好ましい。 It is also preferable that a smoothing layer is provided on the release surface of the dust-free paper. As described above, the surface of dust-free paper has a moderate amount of unevenness. However, if the release surface has unevenness, the unevenness will be transferred to the adhesive layer, and the smoothness of the adhesive layer surface will be lost. Therefore, in applications where a uniform thickness of the adhesive layer is required due to reasons such as the thinness of the workpiece (for example, applications in which it is attached to a workpiece for a semiconductor device or a MEMS workpiece), it is preferable that a smoothing layer is provided on the release surface.
平滑化層は、例えば、無塵紙の表面に樹脂をコートすることにより、形成することができる。コートされる樹脂は、例えば、エネルギー線硬化性の化合物を含有し、塗布の後にエネルギー線が照射されて硬化するものであってもよい。エネルギー線としては、電子線や紫外線等の光線が挙げられる。あるいは、平滑化層は、無塵紙の表面に、樹脂フィルム(例えば厚みが5μm以下の薄いポリエチレンフィルム)をラミネートすることにより、実現することができる。平滑化層の表面は、通常、500nm未満の算術平均粗さRaを有している。平滑化層の表面の算術平均粗さRaは、3~300nmであることが好ましく、5~200nmであることがより好ましい。また、無塵紙の剥離面に、平滑化層及び離型層の両方を有する場合、離型層の表面の算術平均粗さRaは、1~200nmであることが好ましく、3~100nmであることがより好ましい。 The smoothing layer can be formed, for example, by coating the surface of the dust-free paper with a resin. The resin to be coated may contain, for example, an energy ray-curable compound, and may be cured by irradiating energy rays after application. Examples of energy rays include electron beams and ultraviolet rays. Alternatively, the smoothing layer can be realized by laminating a resin film (for example, a thin polyethylene film with a thickness of 5 μm or less) on the surface of the dust-free paper. The surface of the smoothing layer usually has an arithmetic mean roughness Ra of less than 500 nm. The arithmetic mean roughness Ra of the surface of the smoothing layer is preferably 3 to 300 nm, and more preferably 5 to 200 nm. Furthermore, when the release surface of the dust-free paper has both a smoothing layer and a release layer, the arithmetic mean roughness Ra of the surface of the release layer is preferably 1 to 200 nm, and more preferably 3 to 100 nm.
また、接着シートがビルドアップ層形成用層間絶縁材料のような用途に用いられる場合、接着剤層がナフサ等の高沸点溶媒を含有することがある。そのため、このような溶媒を無塵紙が吸収し、品質が変化しないように、無塵紙の剥離面に耐溶剤層が設けられていてもよい。耐溶剤層は、平滑化層と同様に無塵紙の表面に樹脂をコートすることにより設けることができ、平滑化層が耐溶剤層を兼ねていてもよい。 In addition, when the adhesive sheet is used for applications such as an interlayer insulating material for forming build-up layers, the adhesive layer may contain high-boiling point solvents such as naphtha. Therefore, to prevent the dust-free paper from absorbing such solvents and changing its quality, a solvent-resistant layer may be provided on the release surface of the dust-free paper. The solvent-resistant layer can be provided by coating the surface of the dust-free paper with a resin, in the same way as the smoothing layer, and the smoothing layer may also serve as the solvent-resistant layer.
無塵紙の厚さは、特に限定されないが、例えば30~300μm、好ましくは50~200μmである。 The thickness of the dust-free paper is not particularly limited, but is, for example, 30 to 300 μm, and preferably 50 to 200 μm.
(製造方法)
接着シートの製造方法は、特に限定されない。以下に、好ましい一例を挙げて接着シートの製造方法を説明する。
(Production method)
The method for producing the adhesive sheet is not particularly limited, but a preferred example of the method for producing the adhesive sheet will be described below.
まず、剥離シートとして無塵紙を準備する。そして、準備した無塵紙上に、離型剤を溶剤で希釈した組成物を無塵紙上に塗布し、加熱により乾燥して溶剤を揮発させることにより離型層を得る。さらに、離型層上に接着剤層の前駆体となる物質を含む接着剤組成物を塗布する。塗布後、接着剤組成物を加熱により乾燥させる。例えば、離型剤を溶剤で希釈した組成物又は接着剤組成物は、オーブンにより、乾燥させられる。これにより、接着剤層が形成される。その後、必要に応じて支持フィルムが接着剤層に貼り付けられ、本実施形態に係る接着シートが得られる。 First, dust-free paper is prepared as a release sheet. Then, a composition in which the release agent is diluted with a solvent is applied onto the prepared dust-free paper, and the composition is dried by heating to volatilize the solvent, thereby obtaining a release layer. Furthermore, an adhesive composition containing a substance that will be a precursor of the adhesive layer is applied onto the release layer. After application, the adhesive composition is dried by heating. For example, the composition in which the release agent is diluted with a solvent or the adhesive composition is dried in an oven. This forms an adhesive layer. Thereafter, a support film is attached to the adhesive layer as necessary, and an adhesive sheet according to this embodiment is obtained.
上述の製造方法は、生産性等の点から好ましい。仮に、剥離シートとして樹脂フィルムを用いた場合には、接着剤組成物の加熱乾燥時に樹脂フィルムが熱により収縮してしまうことがある。一方、無塵紙は、一般的に、樹脂フィルムよりも高い耐熱性を有している。例えば、無塵紙として、パルプに代表される植物繊維層を有するものを用いた場合、高い耐熱性を有する無塵紙が得られる。従って、剥離シートとして耐熱性が高い無塵紙を使用することにより、接着剤組成物の加熱乾燥時に、剥離シートの収縮を防ぐことができる。これにより、しわを抑制することができ、所望する幅の接着シートが得られやすくなる。また、より高い温度で接着剤組成物を乾燥させることが可能となり、接着シートの生産性を向上させることができる。 The above-mentioned manufacturing method is preferable in terms of productivity, etc. If a resin film is used as the release sheet, the resin film may shrink due to heat when the adhesive composition is heated and dried. On the other hand, dust-free paper generally has higher heat resistance than resin film. For example, when dust-free paper having a plant fiber layer such as pulp is used as the release sheet, dust-free paper with high heat resistance is obtained. Therefore, by using dust-free paper with high heat resistance as the release sheet, it is possible to prevent the release sheet from shrinking when the adhesive composition is heated and dried. This makes it possible to suppress wrinkles and make it easier to obtain an adhesive sheet of the desired width. In addition, it becomes possible to dry the adhesive composition at a higher temperature, which improves the productivity of the adhesive sheet.
(付記)
以上、本発明について実施形態を用いて説明した。以下に、本発明の代表的な構成について、付記として要約する。
(Additional Note)
The present invention has been described above using the embodiments. Representative configurations of the present invention will be summarized below as supplementary notes.
(付記1)
電子デバイス用ワークに貼付されるように構成された接着剤層と、接着剤層上に配置され、前記接着剤層から剥離可能である、剥離シートとを備え、剥離シートは、無塵紙を有する、ワーク用接着シート。
(付記2)
付記1に記載のワーク用接着シートであって、部品接合用接着シート、ワーク裏面被覆用フィルム、バンプ補強用フィルム及びビルドアップ層形成用層間絶縁材料からなる群から選択される少なくとも一種である、
ワーク用接着シート。
(付記3)
付記1又は2に記載のワーク用接着シートであって、接着剤層は、光硬化性を有している、ワーク用接着シート。
(付記4)
付記1~3のいずれかに記載のワーク用接着シートであって、無塵紙は、接着剤層側を向く剥離面を有しており、剥離面上に設けられた平滑化層を有している、ワーク用接着シート。
(付記5)
付記1~4のいずれかに記載のワーク用接着シートであって、無塵紙は、樹脂が含浸した植物性繊維層を有している、ワーク用接着シート。
(付記6)
付記5に記載のワーク用接着シートであって、樹脂は、帯電防止剤を含んでいる、ワーク用接着シート。
(付記7)
付記1又は2に記載のワーク用接着シートであって、剥離シートは、接着剤層が電子デバイス用ワークに貼付される前に剥離されるように構成されている、ワーク用接着シート。
(付記8)
付記1~7のいずれかに記載されたワーク用接着シートの製造方法であって、無塵紙を準備する工程と、無塵紙上に、接着剤層の前駆体となる物質を含む接着剤組成物を塗布する工程と、塗布する工程の後に、接着剤組成物を加熱により乾燥させ、接着剤層を形成する工程と、を備える、製造方法。
(Appendix 1)
An adhesive sheet for a workpiece comprising an adhesive layer configured to be affixed to a workpiece for an electronic device, and a release sheet disposed on the adhesive layer and removable from the adhesive layer, the release sheet having dust-free paper.
(Appendix 2)
The adhesive sheet for a workpiece according to
Adhesive sheet for work.
(Appendix 3)
3. An adhesive sheet for a workpiece according to
(Appendix 4)
An adhesive sheet for a workpiece according to any one of
(Appendix 5)
5. An adhesive sheet for a workpiece according to any one of
(Appendix 6)
6. An adhesive sheet for a workpiece according to
(Appendix 7)
3. An adhesive sheet for a workpiece according to
(Appendix 8)
A method for producing an adhesive sheet for a workpiece according to any one of
1 ワーク用接着シート
2 接着剤層
3 剥離シート
4 支持フィルム
5 電子デバイス用ワーク
REFERENCE SIGNS
Claims (8)
前記接着剤層上に配置され、前記接着剤層から剥離可能である、剥離シートと、
を備え、
前記剥離シートは、無塵紙を有する、
ワーク用接着シート。 An adhesive layer configured to be attached to a workpiece for an electronic device;
a release sheet disposed on the adhesive layer and releasable from the adhesive layer;
Equipped with
The release sheet comprises dust-free paper.
Adhesive sheet for work.
ワーク加工用粘着シート、ワーク支持用粘着シート、部品接合用接着シート、ワーク裏面被覆用フィルム、バンプ補強用フィルム及びビルドアップ層形成用層間絶縁材料からなる群から選択される少なくとも一種である、
ワーク用接着シート。 The adhesive sheet for a workpiece according to claim 1,
At least one selected from the group consisting of an adhesive sheet for processing a workpiece, an adhesive sheet for supporting a workpiece, an adhesive sheet for joining components, a film for covering the back surface of a workpiece, a film for reinforcing bumps, and an interlayer insulating material for forming a build-up layer;
Adhesive sheet for work.
前記接着剤層は、光硬化性を有している、
ワーク用接着シート。 The adhesive sheet for workpieces according to claim 1 or 2,
The adhesive layer has photocuring properties.
Adhesive sheet for work.
前記無塵紙は、前記接着剤層側を向く剥離面を有しており、前記剥離面上に設けられた平滑化層をさらに有する、
ワーク用接着シート。 The adhesive sheet for workpieces according to claim 1 or 2,
The dust-free paper has a release surface facing the adhesive layer, and further has a smoothing layer provided on the release surface.
Adhesive sheet for work.
前記無塵紙は、樹脂が含浸した植物性繊維層を有する、
ワーク用接着シート。 The adhesive sheet for workpieces according to claim 1 or 2,
The dust-free paper has a plant fiber layer impregnated with a resin.
Adhesive sheet for work.
前記樹脂は、帯電防止剤を含んでいる、
ワーク用接着シート。 The adhesive sheet for a workpiece according to claim 5,
The resin contains an antistatic agent.
Adhesive sheet for work.
前記剥離シートは、前記接着剤層が前記電子デバイス用ワークに貼付される前に剥離されるように構成されている、
ワーク用接着シート。 The adhesive sheet for workpieces according to claim 1 or 2,
The release sheet is configured to be peeled off before the adhesive layer is attached to the electronic device workpiece.
Adhesive sheet for work.
前記無塵紙を準備する工程と、
前記無塵紙上に、前記接着剤層の前駆体となる物質を含む接着剤組成物を塗布する工程と、
前記塗布する工程の後に、前記接着剤組成物を加熱により乾燥させ、前記接着剤層を形成する工程と、
を備える、
製造方法。 A method for producing the adhesive sheet for workpieces according to claim 1 or 2, comprising the steps of:
preparing the dust-free paper;
applying an adhesive composition onto the dust-free paper, the adhesive composition including a precursor material for the adhesive layer;
a step of drying the adhesive composition by heating after the applying step to form the adhesive layer;
Equipped with
Manufacturing method.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2023115806 | 2023-07-14 | ||
| JP2023-115806 | 2023-07-14 |
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| Publication Number | Publication Date |
|---|---|
| WO2025018204A1 true WO2025018204A1 (en) | 2025-01-23 |
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ID=94281897
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| PCT/JP2024/024578 Pending WO2025018204A1 (en) | 2023-07-14 | 2024-07-08 | Adhesive sheet for workpieces and method for producing same |
Country Status (2)
| Country | Link |
|---|---|
| TW (1) | TW202512396A (en) |
| WO (1) | WO2025018204A1 (en) |
Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2000282386A (en) * | 1999-03-31 | 2000-10-10 | Nippon Paper Industries Co Ltd | Paper with low dust development |
| JP2007268846A (en) * | 2006-03-31 | 2007-10-18 | Lintec Corp | Release sheet and its manufacturing process |
| WO2008139742A1 (en) * | 2007-05-07 | 2008-11-20 | Lintec Corporation | Pressure-sensitive adhesive sheet |
| WO2014069638A1 (en) * | 2012-11-05 | 2014-05-08 | リンテック株式会社 | Adhesive sheet |
| WO2015156389A1 (en) * | 2014-04-11 | 2015-10-15 | リンテック株式会社 | Base for back grind tapes, and back grind tape |
| WO2016063916A1 (en) * | 2014-10-23 | 2016-04-28 | リンテック株式会社 | Surface protective sheet |
| JP2019081258A (en) * | 2017-10-27 | 2019-05-30 | リンテック株式会社 | Release sheet |
-
2024
- 2024-07-08 WO PCT/JP2024/024578 patent/WO2025018204A1/en active Pending
- 2024-07-12 TW TW113126112A patent/TW202512396A/en unknown
Patent Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2000282386A (en) * | 1999-03-31 | 2000-10-10 | Nippon Paper Industries Co Ltd | Paper with low dust development |
| JP2007268846A (en) * | 2006-03-31 | 2007-10-18 | Lintec Corp | Release sheet and its manufacturing process |
| WO2008139742A1 (en) * | 2007-05-07 | 2008-11-20 | Lintec Corporation | Pressure-sensitive adhesive sheet |
| WO2014069638A1 (en) * | 2012-11-05 | 2014-05-08 | リンテック株式会社 | Adhesive sheet |
| WO2015156389A1 (en) * | 2014-04-11 | 2015-10-15 | リンテック株式会社 | Base for back grind tapes, and back grind tape |
| WO2016063916A1 (en) * | 2014-10-23 | 2016-04-28 | リンテック株式会社 | Surface protective sheet |
| JP2019081258A (en) * | 2017-10-27 | 2019-05-30 | リンテック株式会社 | Release sheet |
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| Publication number | Publication date |
|---|---|
| TW202512396A (en) | 2025-03-16 |
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