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WO2025094596A1 - Charge-transporting composition - Google Patents

Charge-transporting composition Download PDF

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Publication number
WO2025094596A1
WO2025094596A1 PCT/JP2024/035741 JP2024035741W WO2025094596A1 WO 2025094596 A1 WO2025094596 A1 WO 2025094596A1 JP 2024035741 W JP2024035741 W JP 2024035741W WO 2025094596 A1 WO2025094596 A1 WO 2025094596A1
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group
groups
charge
carbon atoms
formula
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Japanese (ja)
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駿 山口
亮一 芦澤
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Nissan Chemical Corp
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Nissan Chemical Corp
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    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G73/00Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
    • C08G73/06Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
    • C08G73/10Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00Use of organic ingredients
    • C08K5/55Boron-containing compounds
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L79/00Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen with or without oxygen or carbon only, not provided for in groups C08L61/00 - C08L77/00
    • C08L79/04Polycondensates having nitrogen-containing heterocyclic rings in the main chain; Polyhydrazides; Polyamide acids or similar polyimide precursors
    • C08L79/08Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K30/00Organic devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation
    • H10K30/40Organic devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation comprising a p-i-n structure, e.g. having a perovskite absorber between p-type and n-type charge transport layers
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K30/00Organic devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation
    • H10K30/50Photovoltaic [PV] devices
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K30/00Organic devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation
    • H10K30/80Constructional details
    • H10K30/84Layers having high charge carrier mobility
    • H10K30/86Layers having high hole mobility, e.g. hole-transporting layers or electron-blocking layers
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K85/00Organic materials used in the body or electrodes of devices covered by this subclass
    • H10K85/10Organic polymers or oligomers
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K85/00Organic materials used in the body or electrodes of devices covered by this subclass
    • H10K85/50Organic perovskites; Hybrid organic-inorganic perovskites [HOIP], e.g. CH3NH3PbI3
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K85/00Organic materials used in the body or electrodes of devices covered by this subclass
    • H10K85/60Organic compounds having low molecular weight
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00Energy generation through renewable energy sources
    • Y02E10/50Photovoltaic [PV] energy
    • Y02E10/549Organic PV cells

Definitions

  • the present invention relates to a charge transport composition, and more specifically, to a charge transport composition for forming a charge transport thin film used in an organic photoelectric conversion element.
  • Organic solar cells are solar cell elements that use organic materials in the active layer or charge transport material, and well-known examples include the dye-sensitized solar cell developed by M. Graetzel and the organic thin-film solar cell developed by C. W. Tang (Non-Patent Documents 1 and 2). Both of these solar cells have features that differ from the currently mainstream inorganic solar cells, such as being lightweight, thin, and flexible, and being able to be produced on a roll-to-roll basis, and so are expected to create new markets.
  • Patent Document 1 describes a photoelectric conversion element and solar cell equipped with an active layer containing a perovskite semiconductor compound.
  • the present invention has been made in consideration of the above circumstances, and aims to provide a charge transport composition that is suitable for forming a charge transport thin film for a photoelectric conversion element, and in particular, when used as a hole collection layer for a perovskite solar cell, can greatly improve the photoelectric conversion efficiency (PCE) of the resulting element.
  • PCE photoelectric conversion efficiency
  • a charge transporting composition containing a charge transporting substance, an electron accepting dopant substance, and an organic solvent, and containing a polyimide-based polymer obtained by using a diamine component having a specific structure as the charge transporting substance is suitable for forming a charge transporting thin film in an organic photoelectric conversion element, and in particular, when used as a hole collection layer in a perovskite solar cell, it can greatly improve the PCE of the resulting element, thereby completing the present invention.
  • a charge transporting composition for forming a charge transporting thin film in an organic photoelectric conversion element comprising: A charge transporting material, an electron accepting dopant material, and an organic solvent are included,
  • the charge transporting material is a charge transporting composition comprising at least one polyimide polymer selected from the group consisting of a polyimide precursor obtained from a diamine component having a structure represented by any one of the following formulas (1) to (3) and a tetracarboxylic acid component, an ester of the polyimide precursor, and an imidized product of the polyimide precursor:
  • R1 represents a hydrogen atom or a monovalent organic group. * represents a bonding site to another group.
  • any hydrogen atom forming a benzene ring may be substituted with a monovalent organic group.
  • the electron-accepting dopant substance is a salt composed of an anion represented by the following formula (An1) and its counter cation: (In the formula, E represents an element belonging to Group 13 of the long form periodic table, and Ar a1 to Ar a4 each independently represent an aromatic hydrocarbon group which may have a substituent or an aromatic heterocyclic group which may have a substituent.)
  • the charge transporting composition of 2 wherein the salt is an onium salt.
  • the charge transporting composition of 2 wherein the content of the electron accepting dopant substance is 0.001 to 50 parts by mass per 1 part by mass of the charge transporting substance. 5.
  • R 1 is a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, a fluoroalkyl group having 1 to 5 carbon atoms, or a tert-butoxycarbonyl group.
  • the charge transporting composition of the present invention is suitable for forming a charge transporting thin film for a photoelectric conversion element, and in particular, when the charge transporting thin film is used as a hole collection layer for a perovskite photoelectric conversion element, a perovskite photoelectric conversion element having a high PCE can be obtained.
  • the charge transport composition of the present invention is a charge transport composition for forming a charge transport thin film in an organic photoelectric conversion element, and is characterized in that it comprises a charge transport substance, an electron accepting dopant substance, and an organic solvent, and the charge transport substance comprises at least one polyimide-based polymer selected from the group consisting of a polyimide precursor obtained from a diamine component having a structure represented by any one of the following formulas (1) to (3) and a tetracarboxylic acid component, an ester of the polyimide precursor, and an imidized product of the polyimide precursor:
  • the polyimide-based polymer has high heat resistance and excellent mechanical properties, and is widely used in the field of electronic devices.
  • the polyimide-based polymer has high mass productivity and is suitable as a material for constituting a charge transport thin film of an organic photoelectric conversion element, particularly a perovskite solar cell.
  • R1 represents a hydrogen atom or a monovalent organic group. * represents a bonding site to another group. Any hydrogen atom forming a benzene ring may be substituted with a monovalent organic group.
  • the diamines having the structures of formulas (1) to (3) may be referred to as “specific diamines.”
  • polymers containing the specific diamines of the present invention may be referred to as “specific polymers.”
  • the specific diamine has any of the structures represented by the following formulas (1) to (3).
  • R 1 represents a hydrogen atom or a monovalent organic group.
  • * represents a site for bonding to another group. Any hydrogen atom forming a benzene ring may be substituted with a monovalent organic group.
  • the monovalent organic group include an alkyl group having 1 to 10 carbon atoms, an alkenyl group having 2 to 10 carbon atoms, an alkoxy group having 1 to 10 carbon atoms, a fluoroalkyl group having 1 to 10 carbon atoms, a fluoroalkenyl group having 2 to 10 carbon atoms, a fluoroalkoxy group having 1 to 10 carbon atoms, and a tert-butoxycarbonyl group.
  • alkyl groups having 1 to 10 carbon atoms include methyl, ethyl, n-propyl, isopropyl, n-butyl, i-butyl, s-butyl, t-butyl, n-pentyl, n-hexyl, n-heptyl, n-octyl, n-nonyl, and n-decyl groups.
  • Alkenyl groups having 2 to 10 carbon atoms include ethenyl, n-1-propenyl, n-2-propenyl, 1-methylethenyl, n-1-butenyl, n-2-butenyl, n-3-butenyl, 2-methyl-1-propenyl, 2-methyl-2-propenyl, 1-ethylethenyl, 1-methyl-1-propenyl, 1-methyl-2-propenyl, n-1-pentenyl, and n-1-decenyl.
  • Alkoxy groups having 1 to 10 carbon atoms include methoxy, ethoxy, n-propoxy, i-propoxy, n-butoxy, i-butoxy, s-butoxy, t-butoxy, n-pentoxy, n-hexyloxy, n-heptyloxy, n-octyloxy, n-nonyloxy, and n-decyloxy.
  • the fluoroalkyl group having 1 to 10 carbon atoms is not particularly limited as long as it is an alkyl group having 1 to 10 carbon atoms in which at least one hydrogen atom on a carbon atom has been replaced with a fluorine atom, and specific examples include a fluoromethyl group, a difluoromethyl group, a perfluoromethyl group, a 1-fluoroethyl group, a 2-fluoroethyl group, a 1,2-difluoroethyl group, a 1,1-difluoroethyl group, a 2,2-difluoroethyl group, a 1,1,2-trifluoroethyl group, a 1,2,2-trifluoroethyl group, a 2,2,2-trifluoroethyl group, a 1,1,2,2-tetrafluoroethyl group, a 1,2,2,2-tetrafluoroethyl group, a perfluoroethy
  • the fluoroalkenyl group having 2 to 10 carbon atoms is not particularly limited as long as it is a fluoroalkenyl group having 2 to 10 carbon atoms in which at least one hydrogen atom on a carbon atom is replaced with a fluorine atom, and specific examples include a 2-fluoroethenyl group, a 2,2-difluoroethenyl group, a 2-fluoro-2-propenyl group, a 3,3-difluoro-2-propenyl group, a 2,3-difluoro-2-propenyl group, a 3,3-difluoro-2-methyl-2-propenyl group, a 3-fluoro-2-butenyl group, a perfluorovinyl group, a perfluoropropenyl group, and a perfluorobutenyl group.
  • the fluoroalkoxy group having 1 to 10 carbon atoms is not particularly limited as long as it is an alkoxy group having 1 to 10 carbon atoms in which at least one hydrogen atom on a carbon atom is replaced with a fluorine atom, and specific examples include a fluoromethoxy group, a difluoromethoxy group, a perfluoromethoxy group, a 1-fluoroethoxy group, a 2-fluoroethoxy group, a 1,2-difluoroethoxy group, a 1,1-difluoroethoxy group, a 2,2-difluoroethoxy group, and a 1,1,2-trifluoroethoxy group.
  • R 1 is preferably a hydrogen atom, an alkyl group having 1 to 3 carbon atoms, an alkenyl group having 2 to 3 carbon atoms, an alkoxy group having 1 to 3 carbon atoms, a fluoroalkyl group having 1 to 3 carbon atoms, a fluoroalkenyl group having 2 to 3 carbon atoms, a fluoroalkoxy group having 1 to 3 carbon atoms, or a tert-butoxycarbonyl group, more preferably a hydrogen atom or an alkyl group having 1 to 3 carbon atoms, and even more preferably a hydrogen atom or a methyl group.
  • the bonding position of the benzene ring to the pyrrole ring is preferably the carbon atom next to the nitrogen atom on the pyrrole ring, as shown in formula (1-1) below, in terms of charge transport properties.
  • a preferred example of a diamine having the structure of formula (1) above is a diamine represented by formula (1-2) below.
  • R 3 represents a divalent organic group selected from the group consisting of a single bond, -O-, -COO-, -OCO-, -(CH 2 ) i -, -O(CH 2 ) j O-, -CONH-, -NHCO-, -CON(CH 3 )-, -N(CH 3 )CO-, and -NR 1 -.
  • i represents an integer of 1 to 14
  • j represents an integer of 1 to 14.
  • R 1 is the same as in formula (1).
  • R 3 is preferably a single bond, -O-, -COO-, -OCO-, -CONH-, -NHCO-, and -N(CH 3 )-.
  • * 1 represents a site bonded to the benzene ring in formula (1-2).
  • * 2 represents a site bonded to the amino group in formula (1-2).
  • k1 is an integer of 1 to 3, and preferably 1 or 2.
  • formula (1-2) examples include those represented by the following formulas (1-2-1) to (1-2-17), but are not limited to these.
  • formula (1-2-1), formula (1-2-2), formula (1-2-3), formula (1-2-5), formula (1-2-8), formula (1-2-9), formula (1-2-10), formula (1-2-11), formula (1-2-12), formula (1-2-13), formula (1-2-14), formula (1-2-15), formula (1-2-16) and formula (1-2-17) are preferred, and formula (1-2-1), formula (1-2-2), formula (1-2-3), formula (1-2-11), formula (1-2-12), formula (1-2-13), formula (1-2-14), formula (1-2-15), formula (1-2-16) and formula (1-2-17) are more preferred.
  • x1 is an integer from 1 to 14.
  • Boc represents a tert-butoxycarbonyl group.
  • the bonding position of other groups to the carbazole ring is preferably bonded as shown in formula (2-1) in terms of steric hindrance.
  • R 1 is as defined above.
  • the specific diamines include those represented by the following formulas (2-2) to (2-7).
  • diamines represented by formulas (2-3) to (2-7) are preferred, and diamines represented by formulas (2-4) to (2-7) are more preferred.
  • R1 is the same as in the above formula (1)
  • R4 is independently a hydrogen atom or a monovalent organic group
  • R5 is independently a single bond or a divalent organic group
  • k2 is independently 2 or 3. Any hydrogen atom of the benzene ring may be substituted with a monovalent organic group.
  • R 4 is preferably a hydrogen atom, an alkyl group having 1 to 3 carbon atoms, an alkenyl group having 2 to 3 carbon atoms, an alkoxy group having 1 to 3 carbon atoms, a fluoroalkyl group having 1 to 3 carbon atoms, a fluoroalkenyl group having 2 to 3 carbon atoms, a fluoroalkoxy group having 1 to 3 carbon atoms, or a tert-butoxycarbonyl group, more preferably a hydrogen atom or an alkyl group having 1 to 3 carbon atoms, and even more preferably a hydrogen atom or a methyl group.
  • the divalent organic group for R5 includes a group having a structure of the following formula (2-8).
  • R 6 represents a divalent organic group selected from the group consisting of a single bond, -O-, -COO-, -OCO-, -(CH 2 ) r -, -O(CH 2 ) s O-, -NR 61 -, -CONR 61 -, and -NR 61 CO-, and k3 represents an integer of 1 to 5.
  • R 61 represents hydrogen or a monovalent organic group
  • r represents an integer of 1 to 5
  • s represents an integer of 1 to 5.
  • the monovalent organic group an alkyl group having 1 to 3 carbon atoms is preferable, and a methyl group is more preferable.
  • * 3 represents a site bonded to a benzene ring in formulas (2-3) to (2-7), and * 4 represents a site bonded to an amino group in formulas (2-3) to (2-7).
  • specific diamine examples include, but are not limited to, diamines represented by the following formulas (2-1-1) to (2-1-19). Among these, from the viewpoint of charge transport properties, formulas (2-1-1) to (2-1-7) and (2-1-10) to (2-1-17) are preferred, and formulas (2-1-1) to (2-1-7) and (2-1-15) to (2-1-17) are more preferred.
  • x2 is an integer from 1 to 14.
  • the bonding position of other groups to the benzene ring is preferably as shown in formula (3-1) in terms of steric hindrance.
  • R 1 is as defined above.
  • the specific diamines include those represented by the following formulas (3-2) to (3-7).
  • the diamines represented by the formulas (3-3) to (3-7) are preferred, and the diamines represented by the formulas (3-4) to (3-7) are more preferred.
  • R 1 is the same as in the above formula (1), R 7 is independently a hydrogen atom or a monovalent organic group, and R 8 is independently a single bond or a divalent organic group.
  • k4 is independently 2 or 3. Any hydrogen atom of the benzene ring may be substituted with a monovalent organic group.
  • R 7 is preferably a hydrogen atom, an alkyl group having 1 to 3 carbon atoms, an alkenyl group having 2 to 3 carbon atoms, an alkoxy group having 1 to 3 carbon atoms, a fluoroalkyl group having 1 to 3 carbon atoms, a fluoroalkenyl group having 2 to 3 carbon atoms, a fluoroalkoxy group having 1 to 3 carbon atoms, or a tert-butoxycarbonyl group, more preferably a hydrogen atom or an alkyl group having 1 to 3 carbon atoms, and even more preferably a hydrogen atom or a methyl group.
  • the divalent organic group for R 8 includes a group having a structure of the following formula (3-8).
  • R 9 represents a divalent organic group selected from the group consisting of a single bond, -O-, -COO-, -OCO-, -(CH 2 ) r -, -O(CH 2 ) s O-, -NR 91 -, -CONR 91 -, and -NR 91 CO-, and k5 represents an integer of 1 to 5.
  • R 91 represents hydrogen or a monovalent organic group
  • r represents an integer of 1 to 5
  • s represents an integer of 1 to 5.
  • the monovalent organic group an alkyl group having 1 to 3 carbon atoms is preferable, and a methyl group is more preferable.
  • * 5 represents a site bonded to a benzene ring in formulas (3-3) to (3-7), and * 6 represents a site bonded to an amino group in formulas (3-3) to (3-7).
  • specific diamine examples include, but are not limited to, diamines represented by the following formulas (3-1-1) to (3-1-19). Among these, from the viewpoint of charge transport properties, formulas (3-1-1) to (3-1-7) and (3-1-10) to (3-1-17) are preferred, and formulas (3-1-1) to (3-1-7) and (3-1-15) to (3-1-17) are more preferred.
  • x3 is an integer from 1 to 14.
  • the specific diamine may be synthesized by a known method and is not particularly limited.
  • the specific diamine may be synthesized by the method described in WO 2018/062197 or WO 2018/110354.
  • the diamine component for obtaining the specific polymer may contain other diamine components in addition to the specific diamines described above.
  • Examples of the other diamine components include those represented by the following formula (E1).
  • a 1 and A 2 each independently represent a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, an alkenyl group having 2 to 5 carbon atoms, or an alkynyl group having 2 to 5 carbon atoms, and Y 1 represents a divalent organic group.
  • alkyl groups having 1 to 5 carbon atoms include methyl, ethyl, n-propyl, isopropyl, n-butyl, i-butyl, s-butyl, t-butyl, and n-pentyl groups.
  • Alkenyl groups having 2 to 5 carbon atoms include ethenyl, n-1-propenyl, n-2-propenyl, 1-methylethenyl, n-1-butenyl, n-2-butenyl, n-3-butenyl, 2-methyl-1-propenyl, 2-methyl-2-propenyl, 1-ethylethenyl, 1-methyl-1-propenyl, 1-methyl-2-propenyl, and n-1-pentenyl.
  • Alkynyl groups having 2 to 5 carbon atoms include ethynyl, n-1-propynyl, n-2-propynyl, n-1-butynyl, n-2-butynyl, n-3-butynyl, 1-methyl-2-propynyl, n-1-pentynyl, n-2-pentynyl, n-3-pentynyl, n-4-pentynyl, 1-methyl-n-butynyl, 2-methyl-n-butynyl, 3-methyl-n-butynyl, 1,1-dimethyl-n-propynyl, etc.
  • a 1 and A 2 are preferably a hydrogen atom or a methyl group.
  • Examples of Y1 include groups represented by the following formulas (Y-1) to (Y-170).
  • x4 is an integer of 1 to 14, and where there is a preferred range, the range is noted. Where there is no description of the range of x4, an integer of 1 to 6 is preferred.
  • Me represents a methyl group
  • Boc represents a tert-butoxycarbonyl group.
  • the other diamines described above may be used alone or in combination of two or more.
  • the content of the specific diamine in the diamine component is preferably 10 to 100 mol%, more preferably 30 to 100 mol%, and even more preferably 50 to 100 mol%.
  • tetracarboxylic acid component examples include tetracarboxylic acid, tetracarboxylic dianhydride, tetracarboxylic acid dihalide, tetracarboxylic acid dialkyl ester, and tetracarboxylic acid dialkyl ester dihalide. In the present invention, these are collectively referred to as tetracarboxylic acid component.
  • tetracarboxylic acid component tetracarboxylic dianhydride and its derivatives, such as tetracarboxylic acid, tetracarboxylic dihalide, tetracarboxylic dialkyl ester, and tetracarboxylic dialkyl ester dihalide (collectively referred to as the first tetracarboxylic acid component) can also be used.
  • tetracarboxylic dianhydrides include aliphatic tetracarboxylic dianhydrides, alicyclic tetracarboxylic dianhydrides, and aromatic tetracarboxylic dianhydrides. Specific examples of these include those in the following groups [1] to [5].
  • Examples of aliphatic tetracarboxylic dianhydrides include 1,2,3,4-butanetetracarboxylic dianhydride.
  • Examples of alicyclic tetracarboxylic acid dianhydrides include acid dianhydrides such as those represented by the following formulas (X1-1) to (X1-13).
  • R 1a to R 21a each independently represent a hydrogen atom, a halogen atom, an alkyl group having 1 to 6 carbon atoms, an alkenyl group having 2 to 6 carbon atoms, an alkynyl group having 2 to 6 carbon atoms, a monovalent organic group having 1 to 6 carbon atoms containing a fluorine atom, or a phenyl group.
  • R M represents a hydrogen atom or a methyl group.
  • X a represents a tetravalent organic group represented by the following formulas (Xa-1) to (Xa-7).
  • aromatic tetracarboxylic dianhydrides include pyromellitic anhydride, 4,4'-(hexafluoroisopropylidene)diphthalic anhydride, 3,3',4,4'-diphenylsulfonetetracarboxylic dianhydride, and acid dianhydrides represented by the following formulas (X2-1) to (X2-10).
  • Examples include acid dianhydrides represented by the following formulas (X3-1) to (X3-9) and tetracarboxylic acid dianhydrides described in JP 2010-97188 A.
  • tetracarboxylic acid components described above may be used alone or in combination of two or more. Depending on the characteristics required for the organic light sensor element or charge transport layer, one may be used alone or two or more may be used in combination, and if two or more are used in combination, the ratio, etc., may be appropriately adjusted.
  • the specific polymer is obtained by a method of reacting a diamine component with a tetracarboxylic acid component.
  • the method includes a method of reacting a diamine component consisting of one or more diamines with at least one tetracarboxylic acid component selected from the group consisting of tetracarboxylic dianhydrides and derivatives of the tetracarboxylic acid to obtain a polyamic acid.
  • a method of polycondensing a primary or secondary diamine with a tetracarboxylic dianhydride to obtain a polyamic acid is used.
  • a method of polycondensing a tetracarboxylic acid in which the carboxylic acid group has been dialkyl esterified with a primary or secondary diamine is used, a method of polycondensing a tetracarboxylic acid dihalide in which the carboxylic acid group has been halogenated with a primary or secondary diamine is used, or a method of converting the carboxy group of a polyamic acid into an ester is used.
  • a method of ring-closing the above polyamic acid or polyamic acid alkyl ester to form a polyimide is used.
  • the reaction between the diamine component and the tetracarboxylic acid component is usually carried out in a solvent.
  • the solvent used is not particularly limited as long as it dissolves the polyimide precursor produced.
  • examples of the solvent include N-methyl-2-pyrrolidone, N-ethyl-2-pyrrolidone, ⁇ -butyrolactone, N,N-dimethylformamide, N,N-diethylformamide, N,N-dimethylacetamide, N,N-diethylacetamide, 3-methoxy-N,N-dimethylpropanamide, dimethylsulfoxide, 1,3-dimethyl-imidazolidinone, and the like.
  • methyl ethyl ketone, cyclohexanone, cyclopentanone, 4-hydroxy-4-methyl-2-pentanone, or solvents represented by the following formulas [s1] to [s3], and the like, can also be used.
  • D s1 represents an alkyl group having 1 to 3 carbon atoms.
  • D s2 represents an alkyl group having 1 to 3 carbon atoms.
  • D s3 represents an alkyl group having 1 to 4 carbon atoms.
  • alkyl groups having 1 to 4 carbon atoms include methyl, ethyl, n-propyl, isopropyl, n-butyl, i-butyl, s-butyl, and t-butyl groups.
  • alkyl groups having 1 to 3 carbon atoms include those having 1 to 3 carbon atoms among the above alkyl groups having 1 to 4 carbon atoms.
  • solvents may be used alone or in combination of two or more. Even if the solvent does not dissolve the polyimide precursor, it may be mixed with the above-mentioned solvents as long as the resulting polyimide precursor does not precipitate. Furthermore, moisture in the solvent inhibits the polymerization reaction and may even cause hydrolysis of the resulting polyimide precursor, so it is preferable to use a solvent that has been dehydrated and dried.
  • any of the following methods may be used: a solution in which the diamine component is dispersed or dissolved in a solvent is stirred, and the tetracarboxylic acid component is added as is or dispersed or dissolved in the solvent; conversely, the diamine component is added to a solution in which the tetracarboxylic acid component is dispersed or dissolved in a solvent; or the diamine component and the tetracarboxylic acid component are added alternately.
  • the temperature at which the diamine component and the tetracarboxylic acid component are polycondensed can be selected from -20 to 150°C, but is preferably in the range of -5 to 100°C.
  • the reaction can be carried out at any concentration, but if the concentration is too low it becomes difficult to obtain a high molecular weight polymer, and if the concentration is too high the viscosity of the reaction liquid becomes too high, making uniform stirring difficult. For this reason, the concentration is preferably 1 to 50% by mass, and more preferably 5 to 30% by mass.
  • the reaction can be carried out at a high concentration in the early stages, and then solvent can be added.
  • the ratio of the total number of moles of the diamine component to the total number of moles of the tetracarboxylic acid component is preferably 0.8 to 1.2. As with a normal polycondensation reaction, the closer this molar ratio is to 1.0, the higher the molecular weight of the resulting polyimide precursor will be.
  • Polyimide is obtained by ring-closing the polyimide precursor.
  • the ring-closure rate of the amic acid group also called the imidization rate
  • Methods for imidizing the polyimide precursor include thermal imidization, in which a solution of the polyimide precursor is heated as is, and catalytic imidization, in which a catalyst is added to a solution of the polyimide precursor.
  • the temperature for thermally imidizing the polyimide precursor in a solution is 100 to 400°C, preferably 120 to 250°C, and it is preferable to carry out the process while removing the water produced by the imidization reaction from the system.
  • Catalytic imidization of the polyimide precursor can be carried out by adding a basic catalyst and an acid anhydride to a solution of the polyimide precursor and stirring at -20 to 250°C, preferably 0 to 180°C.
  • the amount of the basic catalyst is 0.5 to 30 times the molar amount of the amide acid group, preferably 2 to 20 times the molar amount, and the amount of the acid anhydride is 1 to 50 times the molar amount of the amide acid group, preferably 3 to 30 times the molar amount.
  • the basic catalyst include pyridine, triethylamine, trimethylamine, tributylamine, trioctylamine, etc. Among them, pyridine is preferred because it has an appropriate basicity for promoting the reaction.
  • the acid anhydride include acetic anhydride, trimellitic anhydride, pyromellitic anhydride, etc. In particular, the use of acetic anhydride is preferred because it makes purification after the reaction is completed easier.
  • the imidization rate by catalytic imidization can be controlled by adjusting the amount of the catalyst, the reaction temperature, and the reaction time.
  • the reaction solution may be poured into a solvent to cause precipitation.
  • solvents used for precipitation include methanol, ethanol, isopropyl alcohol, acetone, hexane, butyl cellosolve, heptane, methyl ethyl ketone, methyl isobutyl ketone, toluene, benzene, and water.
  • the polymer precipitated by pouring into a solvent can be recovered by filtration, and then dried at normal or reduced pressure, or at room temperature or by heating.
  • the polymer precipitated and recovered can be redissolved in a solvent and the reprecipitation and recovery operation repeated 2 to 10 times to reduce impurities in the polymer.
  • solvents used in this case include alcohols, ketones, and hydrocarbons. It is preferable to use three or more types of solvents selected from these, as this further increases the efficiency of purification.
  • esterification reaction is a method in which, for example, polyamic acid is produced from a diamine component and a tetracarboxylic acid component, and its carboxyl group (COOH group) is subjected to a chemical reaction, i.e., an esterification reaction, to produce a polyamic acid alkyl ester.
  • the esterification reaction is a method in which a polyamic acid is reacted with an esterifying agent in the presence of a solvent at ⁇ 20 to 150° C. (preferably 0 to 50° C.) for 30 minutes to 24 hours (preferably 1 to 4 hours).
  • the above esterification agent is preferably one that can be easily removed after the esterification reaction, and examples of such agents include N,N-dimethylformamide dimethyl acetal, N,N-dimethylformamide diethyl acetal, N,N-dimethylformamide dipropyl acetal, N,N-dimethylformamide dineopentyl butyl acetal, N,N-dimethylformamide di-t-butyl acetal, 1-methyl-3-p-tolyltriazene, 1-ethyl-3-p-tolyltriazene, 1-propyl-3-p-tolyltriazene, and 4-(4,6-dimethoxy-1,3,5-triazin-2-yl)-4-methylmorpholinium chloride.
  • the amount of the esterification agent used is preferably 2 to 6 molar equivalents per mole of the repeating unit of polyamic acid. Of these, 2 to 4 molar equivalents are preferred.
  • the solvent used in the esterification reaction may be the same as that used in the reaction between the diamine component and the tetracarboxylic acid component, in terms of the solubility of the polyamic acid in the solvent.
  • N,N-dimethylformamide, N,N-diethylformamide, N-methyl-2-pyrrolidone, N-ethyl-2-pyrrolidone, N,N-dimethylacetamide, N,N-diethylacetamide, 3-methoxy-N,N-dimethylpropanamide, or ⁇ -butyrolactone is preferred.
  • These solvents may be used alone or in combination of two or more.
  • the concentration of polyamic acid in the solvent in the esterification reaction is preferably 1 to 30% by mass, in terms of the low precipitation of polyamic acid. Of these, 5 to 20% by mass is preferred.
  • a diamine component and a tetracarboxylic acid diester dichloride are reacted in the presence of a base and a solvent at ⁇ 20 to 150° C. (preferably 0 to 50° C.) for 30 minutes to 24 hours (preferably 1 to 4 hours).
  • a base pyridine, triethylamine, 4-dimethylaminopyridine, etc. can be used. Among them, pyridine is preferred because the reaction proceeds mildly.
  • the amount of the base used is preferably an amount that can be easily removed after the reaction, and is preferably 2 to 4 times the mol of the tetracarboxylic acid diester dichloride, and more preferably 2 to 3 times the mol.
  • the solvent may be any of the solvents used in the reaction between the diamine component and the tetracarboxylic acid component, from the viewpoint of the solubility of the resulting polymer, i.e., the polyamic acid alkyl ester, in the solvent.
  • the solvents may be used alone or in combination of two or more.
  • the concentration of the polyamic acid alkyl ester in the solvent in the reaction is preferably 1 to 30% by mass, since precipitation of the polyamic acid alkyl ester is unlikely to occur. Of these, 5 to 20% by mass is preferable.
  • the solvent used to prepare the polyamic acid alkyl ester is as dehydrated as possible. Furthermore, it is preferable to carry out the reaction in a nitrogen atmosphere to prevent the inclusion of outside air.
  • This method is, for example, a method in which a diamine component and a tetracarboxylic acid diester are subjected to a polycondensation reaction in the presence of a condensing agent, a base and a solvent at 0 to 150° C. (preferably 0 to 100° C.) for 30 minutes to 24 hours (preferably 3 to 15 hours).
  • Condensing agents that can be used include triphenyl phosphite, dicyclohexylcarbodiimide, 1-ethyl-3-(3-dimethylaminopropyl)carbodiimide hydrochloride, N,N'-carbonyldiimidazole, dimethoxy-1,3,5-triazinylmethylmorpholinium, O-(benzotriazol-1-yl)-N,N,N',N'-tetramethyluronium tetrafluoroborate, O-(benzotriazol-1-yl)-N,N,N',N'-tetramethyluronium hexafluorophosphate, and (2,3-dihydro-2-thioxo-3-benzoxazolyl)diphenylphosphonate.
  • the amount of the condensing agent used is preferably 2 to 3 times the molar amount of the tetracarboxylic acid diester, and more preferably 2
  • the base may be a tertiary amine such as pyridine or triethylamine.
  • the amount of base used is preferably an amount that can be easily removed after the polycondensation reaction, and is preferably 2 to 4 times by mole, more preferably 2 to 3 times by mole, relative to the diamine component.
  • the solvent used in the polycondensation reaction may be the solvent used in the reaction of the diamine component and the tetracarboxylic acid component.
  • N,N-dimethylformamide, N-methyl-2-pyrrolidone, N-ethyl-2-pyrrolidone, or ⁇ -butyrolactone is preferred.
  • These solvents may be used alone or in combination of two or more.
  • the reaction proceeds more efficiently by adding a Lewis acid as an additive.
  • a Lewis acid lithium halides such as lithium chloride and lithium bromide are preferred.
  • the amount of Lewis acid used is preferably 0.1 to 10 times the molar amount of the diamine component. Of these, 2.0 to 3.0 times the molar amount is preferred.
  • the reaction solution may be poured into a solvent to cause precipitation.
  • the solvent used for precipitation include water, methanol, ethanol, 2-propanol, hexane, butyl cellosolve, acetone, and toluene.
  • the polymer precipitated by pouring into the solvent is preferably washed multiple times with the above solvent in order to remove the additives and catalysts used above. After washing and filtration and recovery, the polymer can be dried under normal or reduced pressure, or at normal temperature or by heating.
  • the polymer precipitated and recovered can be redissolved in a solvent and the reprecipitation and recovery operation repeated 2 to 10 times to reduce impurities in the polymer.
  • the polyamic acid alkyl ester is preferably produced by the above method (2) or (3).
  • the charge transporting composition of the present invention may contain a conductive polymer such as polythiophene or polyaniline for the purpose of adjusting the charge transporting ability of the charge transport layer.
  • the charge transport composition of the present invention may contain an electron-accepting dopant substance (hereinafter, sometimes simply referred to as a "dopant substance") for the purpose of adjusting the ionization potential or improving the charge transport ability, depending on the application of the resulting thin film.
  • a dopant substance an electron-accepting dopant substance
  • the dopant substance so long as it dissolves in at least one solvent used in the charge transporting composition, and both inorganic and organic dopant substances can be used.
  • heteropolyacids are preferred, and specific examples include phosphomolybdic acid, silicomolybdic acid, phosphotungstic acid, phosphotungstomolybdic acid, and silicotungstic acid.
  • Heteropolyacids are polyacids formed by condensing isopolyacids, which are oxyacids of vanadium (V), molybdenum (Mo), tungsten (W), etc., with oxyacids of different elements, and have a structure in which a heteroatom is located at the center of the molecule, typically represented by the chemical structure of the Keggin type shown in formula (D1) or the Dawson type shown in formula (D2).
  • Examples of oxyacids of different elements include oxyacids of silicon (Si), phosphorus (P), and arsenic (As).
  • heteropolyacids include phosphomolybdic acid, silicomolybdic acid, phosphotungstic acid, silicotungstic acid, phosphotungstomolybdic acid, etc., which may be used alone or in combination of two or more.
  • the heteropolyacids used in the present invention are commercially available, or may be synthesized by known methods.
  • the one type of heteropolyacid is preferably phosphotungstic acid or phosphomolybdic acid, and most preferably phosphotungstic acid.
  • one of the two or more types of heteropolyacids is preferably phosphotungstic acid or phosphomolybdic acid, and more preferably phosphotungstic acid.
  • Heteropolyacids can be used in the present invention regardless of whether they contain a large or small number of elements in the structure represented by the general formula in quantitative analysis such as elemental analysis, as long as they are commercially available products or have been appropriately synthesized according to known synthesis methods.
  • phosphotungstic acid is generally represented by the chemical formula H3 ( PW12O40 ) nH2O
  • phosphomolybdic acid is represented by the chemical formula H3 ( PMo12O40 ) nH2O
  • P (phosphorus), O (oxygen), W (tungsten), or Mo (molybdenum) in this formula is large or small, they can be used in the present invention as long as they are commercially available or appropriately synthesized according to a known synthesis method.
  • the mass of the heteropolyacid specified in the present invention does not mean the mass of pure phosphotungstic acid (phosphotungstic acid content) in a synthesized product or a commercially available product, but means the total mass in a state including hydration water and other impurities in a form available as a commercially available product or in a form that can be isolated by a known synthesis method.
  • the content is preferably about 0.001 to 50 parts by mass per 1 part of the charge transport substance, more preferably about 0.05 to 10 parts, and even more preferably about 0.1 to 5.0 parts.
  • organic dopant substances include arylsulfonic acid, arylsulfonic acid esters, ionic compounds consisting of a specific anion and its counter cation, borane compounds represented by the formula (Bo1) described below, tetracyanoquinodimethane derivatives, and benzoquinone derivatives.
  • ionic compounds can be preferably used in view of the ease of doping the specific polymer.
  • arylsulfonic acid a compound represented by the following formula (As1) can be preferably used.
  • D1 represents a naphthalene ring or an anthracene ring
  • D2 represents a divalent to tetravalent perfluorobiphenyl group
  • j1 represents the number of sulfonic acid groups bonded to D1 and is an integer satisfying 1 ⁇ j1 ⁇ 4
  • j2 represents the number of bonds between D2 and oxygen atoms and is an integer satisfying 2 to 4.
  • An example of an arylsulfonic acid that can be suitably used in the present invention is the compound represented by the following formula (As1-1).
  • the arylsulfonic acid represented by formula (As1) can be synthesized by known methods, for example, by the method described in WO 2006/025342.
  • the charge transport composition of the present invention contains an arylsulfonic acid
  • the content thereof is preferably about 0.001 to 50 parts by mass, more preferably about 0.05 to 10 parts by mass, and even more preferably 0.1 to 5 parts by mass, per 1 part of the charge transport substance.
  • ionic compound examples include metal salts and onium salts composed of an anion represented by the following formula (An1) or Za and its counter cation.
  • E represents an element belonging to Group 13 of the long form periodic table
  • Ar a1 to Ar a4 each independently represent an aromatic hydrocarbon group which may have a substituent or an aromatic heterocyclic group which may have a substituent.
  • E is preferably boron or gallium, among the elements belonging to Group 13 of the long-form periodic table, and more preferably boron.
  • examples of the aromatic hydrocarbon group and aromatic heterocyclic group include monovalent groups derived from a 5- or 6-membered monocycle or 2- to 4-condensed rings.
  • monovalent groups derived from a benzene ring, a naphthalene ring, a pyridine ring, a pyrazine ring, a pyridazine ring, a pyrimidine ring, a triazine ring, a quinoline ring, and an isoquinoline ring are preferred.
  • At least one of the groups Ar a1 to Ar a4 has one or more fluorine or chlorine atoms as a substituent.
  • Ar a1 to Ar a4 are perfluoroaryl groups in which all of the hydrogen atoms are substituted with fluorine atoms.
  • perfluoroaryl groups include pentafluorophenyl, heptafluoro-2-naphthyl, and tetrafluoro-4-pyridyl groups.
  • Z a examples include an ion represented by the following formula (An2), a hydroxide ion, a fluoride ion, a chloride ion, a bromide ion, an iodide ion, a cyanide ion, a nitrate ion, a nitrite ion, a sulfate ion, a sulfite ion, a perchlorate ion, a perbromate ion, a periodate ion, a chlorate ion, a chlorite ion, a hypochlorite ion, a phosphate ion, a phosphite ion, a hypophosphite ion, a borate ion, an isocyanate ion, a hydrosulfide ion, a tetrafluoroborate ion, a hexafluoro
  • E2 represents an element belonging to Group 15 of the long form periodic table
  • Xn1 represents a halogen atom such as a fluorine atom, a chlorine atom, or a bromine atom.
  • E2 is preferably a phosphorus atom, an arsenic atom, or an antimony atom, and from the standpoint of compound stability, ease of synthesis and purification, and toxicity, a phosphorus atom is preferred.
  • X n1 is preferably a fluorine atom or a chlorine atom, and most preferably a fluorine atom.
  • a metal ion or an onium ion can be suitably used as the counter cation.
  • the metal ion is preferably a monovalent metal ion, such as Li + , Na + , K + or Ag + , with Ag + being particularly preferred.
  • the onium ion include an iodonium ion, a sulfonium ion, an ammonium ion, and a phosphonium ion.
  • an iodonium ion represented by the following formula (Ct1) is preferred.
  • R 101 and R 102 each independently represent an alkyl group having 1 to 12 carbon atoms, an alkenyl group having 2 to 12 carbon atoms, an alkynyl group having 2 to 12 carbon atoms, an aryl group having 6 to 20 carbon atoms, or a heteroaryl group having 2 to 20 carbon atoms, which may be substituted with a halogen atom, a cyano group, a nitro group, an alkyl group having 1 to 12 carbon atoms, an alkenyl group having 2 to 12 carbon atoms, an alkynyl group having 2 to 12 carbon atoms, an aryl group having 6 to 20 carbon atoms, or a heteroaryl group having 2 to 20 carbon atoms.
  • a 4 represents an element in the third period or later (third to sixth periods) of the periodic table, and an element belonging to group 16 of the long-form periodic table.
  • an element in the fifth period or earlier (third to fifth periods) of the periodic table is preferred. That is, A 4 is preferably any one of a sulfur atom, a selenium atom, and a tellurium atom, and more preferably a sulfur atom.
  • R 103 represents an organic group bonded to A 4 via a carbon atom, and R 104 and R 105 each independently represent any substituent. Two or more adjacent groups among R 103 to R 105 may be bonded to each other to form a ring.
  • R 103 is not particularly limited in type as long as it is an organic group having a carbon atom at the bonding portion with A 4 , as long as it does not go against the spirit of the present invention.
  • the molecular weight of R 103 including its substituent, is usually 1,000 or less, preferably 500 or less.
  • Preferred examples of R 103 include alkyl groups, alkenyl groups, alkynyl groups, aromatic hydrocarbon groups, and aromatic heterocyclic groups, from the viewpoint of delocalizing the positive charge. Among them, aromatic hydrocarbons or aromatic heterocyclic groups are preferred, since they delocalize the positive charge and are thermally stable.
  • Aromatic hydrocarbon groups are monovalent groups derived from a 5- or 6-membered single ring or 2- to 5-condensed rings, and can delocalize a positive charge on the group. Specific examples include monovalent groups derived from a benzene ring, a naphthalene ring, an anthracene ring, a phenanthrene ring, a perylene ring, a tetracene ring, a pyrene ring, a benzpyrene ring, a chrysene ring, a triphenylene ring, an acenaphthene ring, and a fluorene ring.
  • More specific examples include a phenyl group, a tolyl group, a 1-naphthyl group, a 2-naphthyl group, a 1-anthryl group, a 2-anthryl group, a 9-anthryl group, a 1-phenanthryl group, a 2-phenanthryl group, a 3-phenanthryl group, a 4-phenanthryl group, and a 9-phenanthryl group, with the phenyl group and the tolyl group being preferred, and the tolyl group being more preferred.
  • Aromatic heterocyclic groups include monovalent groups derived from a 5- or 6-membered single ring or 2-4 condensed rings, and groups that can delocalize a positive charge on the group.
  • Specific examples of such rings include monovalent groups derived from a furan ring, a benzofuran ring, a thiophene ring, a benzothiophene ring, a pyrrole ring, a pyrazole ring, a triazole ring, an imidazole ring, an oxadiazole ring, an indole ring, a carbazole ring, a pyrroloimidazole ring, a pyrrolopyrazole ring, a pyrrolopyrrole ring, a thienopyrrole ring, a thienothiophene ring, a furopyrrole ring, a furofuran ring, a thienofuran ring, a benz
  • the alkyl group may be linear, branched or cyclic, and typically has 1 or more carbon atoms and typically has 12 or less, preferably 6 or less. Specific examples include methyl, ethyl, n-propyl, 2-propyl, n-butyl, isobutyl, tert-butyl and cyclohexyl groups.
  • the alkenyl group typically has 2 or more carbon atoms, and typically has 12 or less carbon atoms, and preferably has 6 or less carbon atoms. Specific examples include vinyl groups, allyl groups, and 1-butenyl groups.
  • Alkynyl groups generally have 2 or more carbon atoms, and generally 12 or less, preferably 6 or less. Specific examples include ethynyl and propargyl groups.
  • R 104 and R 105 are not particularly limited as long as they are not contrary to the gist of the present invention.
  • the molecular weight of R 104 and R 105 is usually 1,000 or less, preferably 500 or less.
  • R 104 and R 105 include an alkyl group, an alkenyl group, an alkynyl group, an aromatic hydrocarbon group, an aromatic heterocyclic group, an amino group, an alkoxy group, an aryloxy group, an acyl group, an alkoxycarbonyl group, an aryloxycarbonyl group, an alkylcarbonyloxy group, an alkylthio group, an arylthio group, a sulfonyl group, an alkylsulfonyl group, an arylsulfonyl group, a cyano group, a hydroxyl group, a thiol group, and a silyl group.
  • an organic group having a carbon atom at the bond portion with A 4 is preferred from the viewpoint of high electron accepting property, similar to R 103 , and for example, an alkyl group, an alkenyl group, an alkynyl group, an aromatic hydrocarbon group, and an aromatic heterocyclic group are preferred.
  • aromatic hydrocarbon groups and aromatic heterocyclic groups are preferred because they have a large electron-accepting ability and are thermally stable.
  • alkyl group examples include those described above for R 103 .
  • Examples of the amino group include an alkylamino group, an arylamino group, and an acylamino group.
  • Examples of the alkylamino group include an alkylamino group having one or more alkyl groups, usually having one or more carbon atoms and usually having 12 or less, preferably 6 or less. Specific examples include a methylamino group, a dimethylamino group, a diethylamino group, and a dibenzylamino group.
  • Arylamino groups include arylamino groups having one or more aromatic hydrocarbon groups or aromatic heterocyclic groups, each of which usually has 3 or more carbon atoms, preferably 4 or more carbon atoms, and usually has 25 or less carbon atoms, preferably 15 or less carbon atoms. Specific examples include phenylamino groups, diphenylamino groups, tolylamino groups, pyridylamino groups, and thienylamino groups.
  • the acylamino group includes an acylamino group having one or more acyl groups, which usually has 2 or more carbon atoms and usually has 25 or less, preferably 15 or less carbon atoms. Specific examples include an acetylamino group and a benzoylamino group.
  • the alkoxy group typically has 1 or more carbon atoms and typically has 12 or less carbon atoms, preferably 6 or less carbon atoms. Specific examples include methoxy, ethoxy, and butoxy groups.
  • Aryloxy groups include aryloxy groups having an aromatic hydrocarbon group or aromatic heterocyclic group, usually having 3 or more carbon atoms, preferably 4 or more carbon atoms, and usually having 25 or less carbon atoms, preferably 15 or less carbon atoms. Specific examples include phenyloxy groups, naphthyloxy groups, pyridyloxy groups, and thienyloxy groups.
  • the acyl group typically has 1 or more carbon atoms and typically has 25 or less carbon atoms, preferably 15 or less carbon atoms. Specific examples include a formyl group, an acetyl group, and a benzoyl group.
  • alkoxycarbonyl groups include those having carbon atoms of typically 2 or more and typically 10 or less, and preferably 7 or less. Specific examples include methoxycarbonyl and ethoxycarbonyl groups.
  • Aryloxycarbonyl groups include those having an aromatic hydrocarbon group or aromatic heterocyclic group with a carbon number of typically 3 or more, preferably 4 or more, and typically 25 or less, preferably 15 or less. Specific examples include a phenoxycarbonyl group and a pyridyloxycarbonyl group.
  • alkylcarbonyloxy groups include alkylcarbonyloxy groups that typically have 2 or more carbon atoms and typically have 10 or less carbon atoms, preferably 7 or less carbon atoms. Specific examples include an acetoxy group and a trifluoroacetoxy group.
  • the alkylthio group typically has 1 or more carbon atoms and typically has 12 or less carbon atoms, preferably 6 or less carbon atoms. Specific examples include methylthio and ethylthio groups.
  • Arylthio groups include those having carbon atoms of typically 3 or more, preferably 4 or more, and typically 25 or less, preferably 14 or less. Specific examples include phenylthio groups, naphthylthio groups, and pyridylthio groups.
  • alkylsulfonyl groups and arylsulfonyl groups include mesyl groups and tosyl groups.
  • sulfonyloxy groups include mesyloxy and tosyloxy groups.
  • silyl groups include trimethylsilyl and triphenylsilyl groups.
  • the groups exemplified as R 103 , R 104 and R 105 above may be further substituted with other substituents as long as they do not go against the spirit of the present invention.
  • the type of the substituent is not particularly limited, and examples thereof include halogen atoms, cyano groups, thiocyano groups and nitro groups in addition to the groups exemplified as R 103 , R 104 and R 105 above. Among them, from the viewpoint of not interfering with the heat resistance and electron-accepting ability of the ionic compound (electron-accepting ionic compound), alkyl groups, alkenyl groups, alkynyl groups, alkoxy groups, aryloxy groups, aromatic hydrocarbon groups or aromatic heterocyclic groups are preferred.
  • ionic compounds that are combinations of anions and cations as shown in the following formulas (AC1) to (AC7) (see Patent No. 5381931) can be preferably used.
  • onium borate salts (which are electrically neutral salts) consisting of a monovalent or divalent anion represented by formula (An3) and a counter cation represented by formulas (Ct2) to (Ct6) can also be suitably used.
  • Ar's each independently represent an aryl group which may have a substituent or a heteroaryl group which may have a substituent
  • L represents an alkylene group, -NH-, an oxygen atom, a sulfur atom or -CN + -.
  • Aryl groups include aryl groups having 6 to 20 carbon atoms. Specific examples include phenyl, tolyl, 1-naphthyl, 2-naphthyl, 1-anthryl, 2-anthryl, 9-anthryl, 1-phenanthryl, 2-phenanthryl, 3-phenanthryl, 4-phenanthryl, and 9-phenanthryl groups, with phenyl, tolyl, and naphthyl groups being preferred.
  • substituents include halogen atoms, nitro groups, cyano groups, alkyl groups having 1 to 20 carbon atoms, alkenyl groups having 2 to 20 carbon atoms, and alkynyl groups having 2 to 20 carbon atoms.
  • Halogen atoms include fluorine atoms, chlorine atoms, bromine atoms, iodine atoms, etc., with fluorine atoms being preferred.
  • the alkyl group having 1 to 20 carbon atoms may be linear, branched, or cyclic. Specific examples include methyl, ethyl, n-propyl, isopropyl, n-butyl, isobutyl, s-butyl, t-butyl, n-pentyl, n-hexyl, n-heptyl, n-octyl, n-nonyl, n-decyl, n-undecyl, n-dodecyl, n-tridecyl, n-tetradecyl, n-pentadecyl, n-hexadecyl, n-heptadecyl, n-octadecyl, n-nonadecyl, and n-eicosanyl groups. However, alkyl groups having 1 to 18 carbon atoms are preferred, and alkyl groups
  • alkenyl groups having 2 to 20 carbon atoms include ethenyl, n-1-propenyl, n-2-propenyl, 1-methylethenyl, n-1-butenyl, n-2-butenyl, n-3-butenyl, 2-methyl-1-propenyl, 2-methyl-2-propenyl, 1-ethylethenyl, 1-methyl-1-propenyl, 1-methyl-2-propenyl, n-1-pentenyl, n-1-decenyl, and n-1-eicosenyl.
  • alkynyl groups having 2 to 20 carbon atoms include ethynyl, n-1-propynyl, n-2-propynyl, n-1-butynyl, n-2-butynyl, n-3-butynyl, 1-methyl-2-propynyl, n-1-pentynyl, n-2-pentynyl, n-3-pentynyl, n-4-pentynyl, 1-methyl-n-butynyl, 2-methyl-n-butynyl, 3-methyl-n-butynyl, 1,1-dimethyl-n-propynyl, n-1-hexynyl, n-1-decynyl, n-1-pentadecinyl, and n-1-eicosynyl.
  • the aryl group preferably has one or more electron-withdrawing groups.
  • the electron-withdrawing groups include halogen atoms, nitro groups, and cyano groups, with halogen atoms being preferred and fluorine atoms being particularly preferred.
  • Heteroaryl groups preferably include heteroaryl groups having 2 to 20 carbon atoms. Specific examples thereof include oxygen-containing heteroaryl groups such as 2-thienyl, 3-thienyl, 2-furanyl, 3-furanyl, 2-oxazolyl, 4-oxazolyl, 5-oxazolyl, 3-isoxazolyl, 4-isoxazolyl, and 5-isoxazolyl groups; sulfur-containing heteroaryl groups such as 2-thiazolyl, 4-thiazolyl, 5-thiazolyl, 3-isothiazolyl, 4-isothiazolyl, and 5-isothiazolyl groups; 2-imidazolyl, a aryl group, a 4-imidazolyl group, a 2-pyridyl group, a 3-pyridyl group, a 4-pyridyl group, a 2-pyrazyl group, a 3-pyrazyl group, a 5-pyrazyl group, a 6-pyrazyl group, a 2-pyrimidy
  • the substituents on the heteroaryl group include the same substituents as those exemplified for the aryl group.
  • L represents an alkylene group, --NH--, an oxygen atom, a sulfur atom or --CN.sup. + --, with --CN.sup. + -- being preferred.
  • the alkylene group may be linear, branched, or cyclic, and includes alkylene groups having 1 to 20 carbon atoms, preferably 1 to 10 carbon atoms. Specific examples include methylene, methylmethylene, dimethylmethylene, ethylene, trimethylene, propylene, tetramethylene, pentamethylene, and hexamethylene groups.
  • Anions of the above formula (An3) that can be suitably used in the present invention include, but are not limited to, those represented by formula (An3-1).
  • examples of counter cations include those represented by formulas (Ct2) to (Ct6).
  • the above onium borate salts may be used alone or in combination of two or more. If necessary, other known onium borate salts may be used in combination.
  • the onium borate salt can be synthesized by referring to the known method described in, for example, JP-A-2005-314682.
  • the onium borate salt may be dissolved in an organic solvent in advance in order to facilitate dissolution in the charge transporting composition.
  • organic solvents include carbonates such as propylene carbonate, ethylene carbonate, 1,2-butylene carbonate, dimethyl carbonate, and diethyl carbonate; ketones such as acetone, methyl ethyl ketone, cyclohexanone, methyl isoamyl ketone, and 2-heptanone; polyhydric alcohols and derivatives thereof such as ethylene glycol, ethylene glycol monoacetate, diethylene glycol, diethylene glycol monoacetate, propylene glycol, propylene glycol monoacetate, dipropylene glycol, and the monomethyl ether, monoethyl ether, monopropyl ether, monobutyl ether, and monophenyl ether of dipropylene glycol monoacetate; cyclic ethers such as dioxane; and formic acid.
  • esters examples include ethyl, methyl lactate, ethyl lactate, methyl acetate, ethyl acetate, butyl acetate, methyl pyruvate, methyl acetoacetate, ethyl acetoacetate, ethyl pyruvate, ethyl ethoxyacetate, methyl methoxypropionate, ethyl ethoxypropionate, methyl 2-hydroxypropionate, ethyl 2-hydroxypropionate, ethyl 2-hydroxy-2-methylpropionate, methyl 2-hydroxy-3-methylbutanoate, 3-methoxybutyl acetate, and 3-methyl-3-methoxybutyl acetate; and aromatic hydrocarbons such as toluene, xylene, 3-phenoxytoluene, 4-methoxytoluene, methyl benzoate, cyclohexylbenzene, tetralin, and isophorone
  • the content thereof is preferably about 0.001 to 50 parts by mass, more preferably about 0.05 to 10 parts by mass, and even more preferably about 0.1 to 5 parts by mass, per 1 part of the charge transport substance.
  • the borane compound represented by formula (Bo1) can be the compound represented by the following formula:
  • Ar b1 to Ar b3 each independently represent an aromatic hydrocarbon group which may have a substituent or an aromatic heterocyclic group which may have a substituent.
  • examples of the aromatic hydrocarbon group and aromatic heterocyclic group include the same as those exemplified in formula (An1). Furthermore, it is more preferable that at least one of the groups Ar b1 to Ar b3 has one or more fluorine or chlorine atoms as a substituent. In particular, it is most preferable that Ar b1 to Ar b3 are perfluoroaryl groups in which all of the hydrogen atoms are substituted with fluorine atoms. Specific examples of perfluoroaryl groups include a pentafluorophenyl group, a heptafluoro-2-naphthyl group, and a tetrafluoro-4-pyridyl group.
  • borane compounds represented by the above formula (Bo1) include, but are not limited to, those shown below.
  • the borane compound may be dissolved in an organic solvent in advance to facilitate dissolution in the charge transport composition.
  • organic solvents include carbonates such as propylene carbonate, ethylene carbonate, 1,2-butylene carbonate, dimethyl carbonate, and diethyl carbonate; ketones such as acetone, methyl ethyl ketone, cyclohexanone, methyl isoamyl ketone, and 2-heptanone; polyhydric alcohols and derivatives thereof such as ethylene glycol, ethylene glycol monoacetate, diethylene glycol, diethylene glycol monoacetate, propylene glycol, propylene glycol monoacetate, dipropylene glycol, and monomethyl ether, monoethyl ether, monopropyl ether, monobutyl ether, and monophenyl ether of dipropylene glycol monoacetate; cyclic ethers such as dioxane; and formic acid.
  • esters examples include ethyl, methyl lactate, ethyl lactate, methyl acetate, ethyl acetate, butyl acetate, methyl pyruvate, methyl acetoacetate, ethyl acetoacetate, ethyl pyruvate, ethyl ethoxyacetate, methyl methoxypropionate, ethyl ethoxypropionate, methyl 2-hydroxypropionate, ethyl 2-hydroxypropionate, ethyl 2-hydroxy-2-methylpropionate, methyl 2-hydroxy-3-methylbutanoate, 3-methoxybutyl acetate, and 3-methyl-3-methoxybutyl acetate; and aromatic hydrocarbons such as toluene, xylene, 3-phenoxytoluene, 4-methoxytoluene, methyl benzoate, cyclohexylbenzene, tetralin, and isophorone
  • the charge transport composition of the present invention contains a borane compound
  • the content thereof is preferably about 0.001 to 50 parts by mass, more preferably about 0.05 to 10 parts by mass, and even more preferably about 0.1 to 5 parts by mass, per 1 part of the charge transport substance.
  • tetracyanoquinodimethane derivative examples include tetracyanoquinodimethanes such as 7,7,8,8-tetracyanoquinodimethane (TCNQ), 2-fluoro-7,7,8,8-tetracyanoquinodimethane, and 2,5-difluoro-7,7,8,8-tetracyanoquinodimethane, and halotetracyanoquinodimethanes (haloTCNQs) such as tetrafluoro-7,7,8,8-tetracyanoquinodimethane.
  • TCNQ 7,7,8,8-tetracyanoquinodimethane
  • haloTCNQs halotetracyanoquinodimethanes
  • benzoquinone derivative examples include tetrafluoro-1,4-benzoquinone, tetrachloro-1,4-benzoquinone (chloranil), 2,3-dichloro-5,6-dicyano-1,4-benzoquinone (DDQ), and the like.
  • chloranil tetrafluoro-1,4-benzoquinone
  • DDQ 2,3-dichloro-5,6-dicyano-1,4-benzoquinone
  • halotetracyanoquinodimethane compounds include compounds represented by formula (Tq1).
  • R 1q to R 4q each independently represent a hydrogen atom or a halogen atom, at least one of them is a halogen atom, preferably at least two of them are halogen atoms, more preferably at least three of them are halogen atoms, and most preferably all of them are halogen atoms.
  • the halogen atom include the same as those mentioned above, but a fluorine atom or a chlorine atom is preferred, and a fluorine atom is more preferred.
  • halotetracyanoquinodimethane compounds include tetrafluorotetracyanoquinodimethane (F4TCNQ), tetrachlorotetracyanoquinodimethane, 2-fluorotetracyanoquinodimethane, 2-chlorotetracyanoquinodimethane, 2,5-difluorotetracyanoquinodimethane, and 2,5-dichlorotetracyanoquinodimethane, with F4TCNQ being the most suitable in the present invention.
  • F4TCNQ tetrafluorotetracyanoquinodimethane
  • F4TCNQ tetrafluorotetracyanoquinodimethane
  • 2-fluorotetracyanoquinodimethane 2-fluorotetracyanoquinodimethane
  • 2-chlorotetracyanoquinodimethane 2,5-difluorotetracyanoquinodimethane
  • 2,5-dichlorotetracyanoquinodimethane with
  • the charge transport composition of the present invention contains a halotetracyanoquinodimethane compound
  • the content thereof is preferably about 0.001 to 50 parts by mass, more preferably about 0.05 to 10 parts by mass, and even more preferably about 0.1 to 5 parts by mass, per 1 part of the charge transport substance.
  • the charge transporting composition generally takes the form of a coating liquid in order to form a uniform thin film.
  • the charge transporting composition of the present invention is also preferably a coating liquid containing the above-mentioned polymer component and an organic solvent capable of dissolving the polymer component.
  • the organic solvent contained in the charge transport composition is not particularly limited as long as it dissolves the polymer components uniformly.
  • Specific examples include N,N-dimethylformamide, N,N-dimethylacetamide, N-methyl-2-pyrrolidone, N-ethyl-2-pyrrolidone, dimethylsulfoxide, N,N-diethylformamide, N,N-diethylformamide, 3-methoxy-N,N-dimethylpropanamide, ⁇ -butyrolactone, 1,3-dimethyl-imidazolidinone, methyl ethyl ketone, cyclohexanone, cyclopentanone, etc.
  • the organic solvent contained in the charge transport composition of the present invention may also be a solvent that improves the coatability of the charge transport composition when applied and the surface smoothness of the coating film. Specific examples of such organic solvents are listed below, but are not limited to these.
  • ethanol isopropyl alcohol, 1-butanol, 2-butanol, isobutyl alcohol, tert-butyl alcohol, 1-pentanol, 2-pentanol, 3-pentanol, 2-methyl-1-butanol, isopentyl alcohol, tert-pentyl alcohol, 3-methyl-2-butanol, neopentyl alcohol, 1-hexanol, 2-methyl-1-pentanol, 2-methyl-2-pentanol, 2-ethyl-1-butanol, 1-heptanol ethanol, 2-heptanol, 3-heptanol, 1-octanol, 2-octanol, 2-ethyl-1-hexanol, cyclohexanol, 1-methylcyclohexanol, 2-methylcyclohexanol, 3-methylcyclohexanol, 2,6-dimethyl-4-heptanol, 1,2-ethane
  • organic solvents 1-hexanol, cyclohexanol, 1,2-ethanediol, 1,2-propanediol, propylene glycol monobutyl ether, diethylene glycol diethyl ether, 4-hydroxy-4-methyl-2-pentanone, ethylene glycol monobutyl ether (butyl cellosolve), or dipropylene glycol dimethyl ether.
  • organic solvents can be used alone or in combination of two or more.
  • the type and content of such organic solvents are appropriately selected depending on the coating device, coating conditions, coating environment, etc. of the charge transport composition.
  • the charge transport composition of the present invention may contain an organosilane compound to improve the stability of the resulting photoelectric conversion element.
  • alkoxysilane is preferred, and trialkoxysilane and tetraalkoxysilane are more preferred.
  • alkoxysilane include tetraethoxysilane (TEOS), tetramethoxysilane, tetraisopropoxysilane, phenyltriethoxysilane, phenyltrimethoxysilane, methyltriethoxysilane, methyltrimethoxysilane, 3,3,3-trifluoropropyltrimethoxysilane, dimethyldiethoxysilane, and dimethyldimethoxysilane.
  • TEOS, tetramethoxysilane, and tetraisopropoxysilane can be preferably used in the present invention.
  • These organic silane compounds can be used alone or in combination of two or more.
  • the content of the organosilane compound is preferably 0.1 to 10 times, more preferably 0.5 to 7 times, and even more preferably 1.0 to 5 times, the charge transport substance, or, if an electron-accepting dopant substance is included, the total amount of the charge transport substance and the electron-accepting dopant substance, in parts by mass.
  • composition of the present invention may contain other additives as long as the object of the present invention can be achieved.
  • the type of additive can be appropriately selected from known additives depending on the desired effect.
  • the solids concentration of the charge transport composition of the present invention is appropriately set taking into consideration the viscosity and surface tension of the composition and the thickness of the thin film to be produced, but is usually preferably about 0.1 to 20.0 mass%, more preferably 0.5 to 10.0 mass%, and even more preferably 1.0 to 5.0 mass%.
  • the solids in the solids concentration here refer to the components other than the solvent contained in the charge transport composition of the present invention.
  • the viscosity of the charge transport composition of the present invention is adjusted appropriately according to the coating method, taking into account the thickness of the thin film to be produced and the solids concentration, but is usually about 0.1 to 50 mPa ⁇ s at 25°C.
  • the charge transport composition of the present invention can be prepared by mixing the charge transport material, the electron accepting dopant material, and the organic solvent, and, if necessary, the organosilane compound and other additives, in any order, so long as the solid content is uniformly dissolved or dispersed in the solvent.
  • a method of dissolving a specific polymer as the charge transport material in an organic solvent and then dissolving the electron accepting dopant material in the solution a method of dissolving the electron accepting dopant material in an organic solvent and then dissolving the specific polymer in the solution, or a method of mixing the specific polymer and the electron accepting dopant material and then putting the mixture into a solvent to dissolve can all be used as long as the solid content is uniformly dissolved or dispersed in the solvent.
  • the charge transport composition is usually prepared in an inert gas atmosphere at room temperature and pressure, but it may be prepared in air (in the presence of oxygen) or with heating, as long as the compounds in the composition are not decomposed or the composition does not change significantly.
  • the hole collection layer of the present invention can be formed by applying and baking the charge transport composition described above onto the anode in the case of an inverted stacking type perovskite solar cell, or onto the active layer in the case of a normal stacking type perovskite solar cell.
  • the preferred embodiment of the present invention is the inverted stacking type.
  • the viscosity and surface tension of the composition, the desired thickness of the thin film, and the like may be taken into consideration, and an optimum method may be selected from various wet process methods such as drop casting, spin coating, blade coating, dip coating, roll coating, bar coating, die coating, inkjet printing, printing methods (relief printing, intaglio printing, planographic printing, screen printing, and the like).
  • the coating is carried out under an inert gas atmosphere at room temperature and normal pressure.
  • the coating may be carried out under air atmosphere (in the presence of oxygen) or while heating.
  • the film thickness is not particularly limited, but in any case, it is preferably about 0.1 to 500 nm, and more preferably about 1 to 100 nm.
  • Methods for changing the film thickness include changing the solids concentration in the composition and changing the amount of solution when applied.
  • Inverted stacking type perovskite solar cell A process of forming a layer of an anode material on the surface of a transparent substrate to manufacture a transparent electrode.
  • anode material inorganic oxides such as indium tin oxide (ITO) and indium zinc oxide (IZO), metals such as gold, silver, and aluminum, and highly charge transporting organic compounds such as polythiophene derivatives and polyaniline derivatives can be used.
  • ITO indium tin oxide
  • IZO indium zinc oxide
  • metals such as gold, silver, and aluminum
  • highly charge transporting organic compounds such as polythiophene derivatives and polyaniline derivatives
  • anode layer As the transparent substrate, a substrate made of glass or transparent resin can be used.
  • the method for forming the layer of the anode material is appropriately selected depending on the properties of the anode material. In general, in the case of a poorly soluble or poorly dispersible sublimable material, a dry process such as a vacuum deposition method or a sputtering method is selected, while in the case of a solution material or a dispersion material, an optimal method is selected from the above-mentioned various wet processes taking into consideration the viscosity and surface tension of the composition, the desired thickness of the thin film, and the like.
  • a commercially available transparent anode substrate can also be used, and in this case, from the viewpoint of improving the yield of the device, it is preferable to use a substrate that has been subjected to a smoothing treatment.
  • the method for producing a perovskite solar cell of the present invention does not include a step of forming an anode layer.
  • an inorganic oxide such as ITO as the anode material
  • a surface treatment such as UV ozone treatment or oxygen plasma treatment immediately before use.
  • the anode material is mainly composed of an organic substance, it is not necessary to perform the surface treatment.
  • an active layer containing a perovskite semiconductor compound is used as the active layer.
  • the perovskite semiconductor compound refers to a semiconductor compound having a perovskite structure.
  • a known compound can be used, and is not particularly limited, but examples thereof include those represented by the general formula A + M 2+ X - 3 and those represented by the general formula A + 2 M 2+ X - 4.
  • a + represents a monovalent cation
  • M 2+ represents a divalent cation
  • X - represents a monovalent anion.
  • Examples of the monovalent cation A + include cations containing elements of Groups 1 and 13 to 16 of the periodic table. Among these, a cesium ion, a rubidium ion, an ammonium ion which may have a substituent, or a phosphonium ion which may have a substituent is preferable.
  • the number of carbon atoms in the alkyl group contained in the alkylammonium ion is preferably 1 to 30, more preferably 1 to 20, and even more preferably 1 to 10.
  • the number of carbon atoms in the aryl group contained in the arylammonium ion is preferably 6 to 30, more preferably 6 to 20, and even more preferably 6 to 12.
  • the monovalent cation A + include methylammonium ion, ethylammonium ion, isopropylammonium ion, n-propylammonium ion, isobutylammonium ion, n-butylammonium ion, t-butylammonium ion, dimethylammonium ion, diethylammonium ion, phenylammonium ion, benzylammonium ion, phenethylammonium ion, guanidinium ion, formamidinium ion, acetamidinium ion, and imidazolium ion, etc.
  • the above cation A + can be used alone or in combination of two or more.
  • the divalent cation M 2+ is preferably a divalent metal cation or semimetal cation, and more preferably a cation of Group 14 of the periodic table.
  • Specific examples of the divalent cation M include lead cation (Pb 2+ ), tin cation (Sn 2+ ), germanium cation (Ge 2+ ), etc.
  • the above cation M 2+ can be used alone or in combination of two or more kinds.
  • Examples of the monovalent anion X ⁇ include a halide ion, an acetate ion, a nitrate ion, an acetylacetonate ion, a thiocyanate ion, and a 2,4-pentanedionate ion, and the like, with a halide ion being preferred.
  • the above anion X ⁇ can be used alone or in combination of two or more kinds.
  • Halide ions include chloride ions, bromide ions, iodide ions, and the like. In the present invention, it is preferable to include iodide ions in order to prevent the band gap of the semiconductor from becoming too wide.
  • perovskite semiconductor compound for example, an organic-inorganic perovskite semiconductor compound is preferable, and a halide-based organic-inorganic perovskite semiconductor compound is more preferable.
  • perovskite semiconductor compounds include MAPbI3, MAPbBr3 , MAPbCl3 , MASnI3 , MASnBr3 , MASnCl3 , MAPbI ( 3-x) Clx , MAPbI(3-x)Brx, MAPbBr (3-x) Clx , MAPb (1-y) SnyI3 , MAPb (1-y) SnyBr3 , MAPb (1-y) SnyCl3 , MAPb ( 1-y) SnyI ( 3 -x) Clx , MAPb (1-y) SnyI (3-x) Brx , MAPb (1-y) SnyBr (3-x) Clx , and FAP
  • MA represents methylammonium ( CH3NH3 + )
  • x represents an arbitrary number from 0 to 3
  • y represents an arbitrary number from 0 to 1.
  • the perovskite semiconductor compound having an energy band gap of 1.0 to 3.5 eV as the perovskite semiconductor compound.
  • the active layer may contain two or more kinds of perovskite semiconductor compounds.
  • the active layer may contain two or more kinds of perovskite semiconductor compounds that are different in at least one of A + , M 2+ , and X ⁇ .
  • the content of the perovskite semiconductor compound in the active layer is preferably 50% by mass or more, more preferably 70% by mass or more, and even more preferably 80% by mass or more, from the viewpoint of obtaining good photoelectric conversion characteristics. There is no particular upper limit, but it is usually 100% by mass or less.
  • the method for forming the active layer is determined by taking into consideration the viscosity and surface tension of the composition, the desired thickness of the thin film, etc., and selecting the most suitable method from the various wet process methods mentioned above.
  • Materials for forming the electron collection layer include fullerenes, lithium oxide (Li 2 O), magnesium oxide (MgO), alumina (Al 2 O 3 ), lithium fluoride (LiF), sodium fluoride (NaF), magnesium fluoride (MgF 2 ), strontium fluoride (SrF 2 ), cesium carbonate (Cs 2 CO 3 ), 8-quinolinol lithium salt (Liq), 8-quinolinol sodium salt (Naq), bathocuproine (BCP), 4,7-diphenyl-1,10-phenanthroline (BPhen), polyethyleneimine (PEI), ethoxylated polyethyleneimine (PEIE), etc.
  • fullerenes lithium oxide (Li 2 O), magnesium oxide (MgO), alumina (Al 2 O 3 ), lithium fluoride (LiF), sodium fluoride (NaF), magnesium fluoride (MgF 2 ), strontium fluoride (SrF 2 ), cesium carbonate
  • Fullerenes are preferably fullerenes and their derivatives, but are not particularly limited thereto. Specific examples include fullerenes and their derivatives having a basic skeleton of C60, C70, C76, C78, C84, etc. In fullerene derivatives, the carbon atoms in the fullerene skeleton may be modified with any functional group, and these functional groups may be bonded to each other to form a ring. Fullerene derivatives include fullerene-bonded polymers. Fullerene derivatives that have functional groups with high affinity to solvents and are highly soluble in solvents are preferred.
  • Functional groups in fullerene derivatives include, for example, hydrogen atoms, hydroxyl groups, halogen atoms such as fluorine atoms and chlorine atoms, alkyl groups such as methyl groups and ethyl groups, alkenyl groups such as vinyl groups, alkoxy groups such as cyano groups, methoxy groups and ethoxy groups, aromatic hydrocarbon groups such as phenyl groups and naphthyl groups, and aromatic heterocyclic groups such as thienyl groups and pyridyl groups.
  • Specific examples include hydrogenated fullerenes such as C60H36 and C70H36, oxide fullerenes such as C60 and C70, and fullerene metal complexes.
  • the various dry processes mentioned above are selected, and when it is a solution material or dispersion material, the viscosity and surface tension of the composition, the desired thin film thickness, etc. are taken into consideration and the optimum one is selected from the various wet process methods mentioned above.
  • cathode layer a step of forming a cathode layer on the formed electron collection layer.
  • cathode materials include metals such as aluminum, magnesium-silver alloy, aluminum-lithium alloy, lithium, sodium, potassium, cesium, calcium, barium, silver, and gold; inorganic oxides such as indium tin oxide (ITO) and indium zinc oxide (IZO); and organic compounds with high charge transport properties such as polythiophene derivatives and polyaniline derivatives.
  • ITO indium tin oxide
  • IZO indium zinc oxide
  • a plurality of cathode materials can be used by stacking or mixing them.
  • the various dry processes described above are selected, and when the cathode layer material is a solution material or dispersion material, an optimal one is adopted from the various wet processes described above, taking into consideration the viscosity and surface tension of the composition, the desired thickness of the thin film, and the like.
  • a carrier block layer may be provided between any layers for the purpose of controlling the rectification of photocurrent, etc.
  • a carrier block layer usually, an electron block layer is inserted between the active layer and the hole collecting layer or the anode, and a hole block layer is inserted between the active layer and the electron collecting layer or the cathode, but this is not limited thereto.
  • materials for forming the hole blocking layer include titanium oxide, zinc oxide, tin oxide, bathocuproine (BCP), and 4,7-diphenyl-1,10-phenanthroline (BPhen).
  • Examples of materials for forming the electron blocking layer include triarylamine-based materials such as N,N'-di(1-naphthyl)-N,N'-diphenylbenzidine ( ⁇ -NPD) and poly(triarylamine) (PTAA).
  • triarylamine-based materials such as N,N'-di(1-naphthyl)-N,N'-diphenylbenzidine ( ⁇ -NPD) and poly(triarylamine) (PTAA).
  • the various dry processes mentioned above are selected, and when it is a solution material or dispersion material, the viscosity and surface tension of the composition, the desired thin film thickness, etc. are taken into consideration and the optimum one is selected from the various wet process methods mentioned above.
  • cathode layer A step of forming a layer of a cathode material on the surface of a transparent substrate to manufacture a transparent cathode substrate.
  • the cathode material include fluorine-doped tin oxide (FTO).
  • the transparent substrate include those exemplified as the reverse stacking type anode materials above.
  • the method of forming the layer of the cathode material in the case of a poorly soluble or poorly dispersible sublimable material, the above-mentioned dry process is selected, and in the case of a solution material or dispersion material, an optimum one is adopted from among the various wet processes described above, taking into consideration the viscosity and surface tension of the composition, the desired thickness of the thin film, and the like.
  • a commercially available transparent cathode substrate can be suitably used, and from the viewpoint of improving the yield of the device, it is preferable to use a substrate that has been subjected to a smoothing treatment.
  • the method for producing a perovskite solar cell of the present invention does not include a step of forming a cathode layer.
  • the substrate may be subjected to the same cleaning treatment and surface treatment as in the case of the inversely laminated anode material.
  • Step of forming an electron collecting layer on the formed cathode If necessary, an electron collecting layer may be formed between the active layer and the cathode layer for the purpose of improving the efficiency of charge transfer, etc.
  • materials for forming the electron collection layer include zinc oxide (ZnO), titanium oxide (TiO), tin oxide (SnO), and the like, in addition to the above-mentioned examples of the inversely laminated type materials.
  • the above-mentioned dry process is selected, and in the case of a solution material or dispersion material, an optimum one is selected from the above-mentioned various wet process methods taking into consideration the viscosity and surface tension of the composition, the desired thickness of the thin film, etc.
  • a method can be used in which an inorganic oxide precursor layer is formed on the cathode using a wet process (particularly a spin coating method or a slit coating method), and then baked to form an inorganic oxide layer.
  • Step of forming an active layer on the formed electron-collecting layer An active layer containing the above-mentioned perovskite semiconductor compound is formed as the active layer.
  • the method for forming the active layer is the same as that described for the inverted laminate type active layer.
  • Formation of anode layer a step of forming an anode layer on the formed hole collection layer.
  • the anode material include the same materials as those for the above-mentioned reverse stack-type anode material, and the method for forming the anode layer is also the same as that for the reverse stack-type cathode layer.
  • a carrier block layer may be provided between any layers as necessary for the purpose of controlling the rectification of the photocurrent.
  • the materials for forming the hole blocking layer and the materials for forming the electron blocking layer are the same as those described above, and the method for forming the carrier blocking layer is also the same as above.
  • the perovskite solar cell element produced by the method exemplified above can be introduced back into the glove box and sealed in an inert gas atmosphere such as nitrogen to prevent element deterioration due to atmospheric air, and in the sealed state it can be allowed to function as a solar cell or the solar cell characteristics can be measured.
  • the sealing method include a method in which a concave glass substrate with a UV-curable resin attached to the edge is attached to the film-forming surface of the perovskite solar cell element in an inert gas atmosphere and the resin is cured by UV irradiation, and a method in which a film-sealing type sealing is performed by a technique such as sputtering in a vacuum.
  • the conditions for measuring the molecular weight of the polyimide precursor are as follows. Apparatus: Room temperature gel permeation chromatography (GPC) apparatus (SSC-7200) manufactured by Senshu Scientific Co., Ltd. Column: Shodex column (KD-803, KD-805) Column temperature: 50°C Eluent: N,N'-dimethylformamide (additives: lithium bromide hydrate (LiBr.H 2 O) 30 mmol/L, phosphoric acid anhydrous crystal (o-phosphoric acid) 30 mmol/L, tetrahydrofuran (THF) 10 ml/L) Flow rate: 1.0 ml/min.
  • GPC room temperature gel permeation chromatography
  • Standard samples for preparing calibration curves TSK standard polyethylene oxide (molecular weights: approximately 900,000, 150,000, 100,000, and 30,000) manufactured by Tosoh Corporation, and polyethylene glycol (molecular weights: approximately 12,000, 4,000, and 1,000) manufactured by Polymer Laboratory.
  • the conditions for measuring the viscosity of the polyimide precursor solution are as follows. The measurements were performed using an E-type viscometer TVE-22H (manufactured by Toki Sangyo Co., Ltd.) with a sample volume of 1.1 mL, a cone rotor TE-1 (1°34′, R24), and a temperature of 25° C.
  • Example 1-1 6 g of NEP and 2 g of BCS were added to 2 g of the polyamic acid solution (A1) obtained in Synthesis Example 1, and the mixture was stirred at 25° C. for 1 hour to obtain solution 1.
  • 200 mg of DP-1 was dissolved in a mixed solvent of 7.84 g of NEP and 1.96 g of BCS to obtain solution 2.
  • Solutions 1 and 2 were mixed so that the mass ratio of DP-1 to charge transporting substance 1 was 0.2, and the mixture was filtered through a syringe filter having a pore size of 0.45 ⁇ m to obtain a charge transporting composition (B1a) having a polyamic acid concentration of 2.0 mass %.
  • Examples 1-2 to 1-4 Charge transport compositions (B1b) to (B1d) were obtained in the same manner as in Example 1-1, except that the electron-accepting dopant substance DP-1 was changed to DP-2 to DP-4. The concentration of the polyamic acid in each charge transport composition was adjusted to 2.0% by mass.
  • Examples 2-1 to 8-4 The polyamic acid solution and the dopant substance were changed based on the composition shown in Table 1 below. Charge transporting compositions B2a to B8d were obtained in the same manner as in Example 1-1.
  • Preparation Example 3 2.5 mg of bathocuproine (manufactured by Tokyo Chemical Industry Co., Ltd.) was added to the vial, and 5,000 ⁇ L of 2-propanol (manufactured by Kanto Chemical Co., Ltd.) was further added and stirred for 1 hour to prepare coating solution 2 for charge collection layer.
  • Example 9-1 A 25 mm x 25 mm glass substrate on which an ITO transparent conductive layer serving as an anode was patterned into a 10 mm x 25 mm stripe shape was subjected to UV/ozone treatment for 15 minutes.
  • the charge transport composition B1a prepared in Example 1-1 was dropped onto this substrate and applied by spin coating (SC).
  • SC spin coating
  • a hole collection layer was formed by heating on a hot plate at 100°C for 10 minutes. The thickness of the hole collection layer was about 30 nm.
  • the substrate was introduced into a glove box, and the active layer precursor liquid 1 obtained in Preparation Example 1 was dropped onto the formed hole collection layer and applied by SC. Chlorobenzene was dropped onto the substrate in SC.
  • the obtained substrate was heated on a hot plate at 105° C. for 30 minutes to form an active layer.
  • the film thickness of the active layer was about 400 nm.
  • the coating liquid 1 for electron collection layer obtained in Preparation Example 2 was applied by SC onto the formed active layer.
  • the substrate was heated at 100° C. for 10 minutes on a hot plate.
  • the coating liquid 2 for electron collection layer obtained in Preparation Example 3 was further applied by SC onto the substrate to form an electron collection layer.
  • the thickness of the layer obtained from the coating liquid 1 for electron collection layer was about 30 nm, and the thickness of the layer obtained from the coating liquid 2 for electron collection layer was about 8 nm.
  • the substrate on which the above layers were laminated was placed in a vacuum deposition apparatus, and the apparatus was evacuated until the degree of vacuum inside the apparatus reached 1 x 10-3 Pa or less.
  • a silver layer to serve as the cathode was evaporated to a thickness of 100 nm using a resistance heating method, thereby producing a photoelectric conversion element D1a having an area of 8 mm x 3 mm at the intersection of the striped ITO layer and the silver layer.
  • Photoelectric conversion elements D1b to D8c and photoelectric conversion elements E1 to E9 were obtained in the same manner as in Example 9-1, except that the charge transporting composition B1a used in forming the hole collection layer was changed to charge transporting compositions B1b to B8c and charge transporting compositions C1 to C9, respectively.
  • Table 2 summarizes the photoelectric conversion elements D1a to D8c and the photoelectric conversion elements E1 to E9 and the charge transport compositions used.
  • the photoelectric conversion element using a charge transport composition containing an electron-accepting dopant substance exhibited a higher PCE than the photoelectric conversion element that did not. Furthermore, the charge transport composition of the present invention exhibited a higher PCE than PEDOT:PSS, a commonly used charge transport composition.

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Abstract

As a charge-transporting composition that is suitable for forming a charge-transporting thin film of a photoelectric conversion element, and, in particular, is capable of significantly improving the photoelectric conversion efficiency of an obtained element when used as a hole-trapping layer of a perovskite-type solar cell, provided is a charge-transporting composition for forming a charge-transporting thin film in an organic photoelectric conversion element, the composition comprising a charge-transporting substance, an electron-accepting dopant substance, and an organic solvent, and the charge-transporting substance comprising at least one polyimide-based polymer selected from the group consisting of polyimide precursors obtained from a tetracarboxylic acid component and a diamine component having any structure represented by formulas (1)-(3), esters of the polyimide precursors, and imidized products of the polyimide precursors. (In the formulas, R1 represents a hydrogen atom or a monovalent organic group, and * indicates a site to be bonded to another group. Any hydrogen atom forming a benzene ring may be substituted with a monovalent organic group.)

Description

電荷輸送性組成物Charge transport composition

 本発明は、電荷輸送性組成物に関し、さらに詳述すると、有機光電変換素子において用いられる電荷輸送性薄膜を形成するための電荷輸送性組成物に関する。 The present invention relates to a charge transport composition, and more specifically, to a charge transport composition for forming a charge transport thin film used in an organic photoelectric conversion element.

 電子素子、特に、有機光電変換素子は、有機半導体を用いて光エネルギーを電気エネルギーに変換するデバイスであり、例えば有機太陽電池が挙げられる。
 有機太陽電池は、活性層や電荷輸送性物質に有機物を使用した太陽電池素子であり、M.グレッツェルによって開発された色素増感太陽電池と、C.W.タンによって開発された有機薄膜太陽電池とがよく知られている(非特許文献1,2)。
 いずれも軽量・薄膜で、フレキシブル化可能である点、ロール・トゥ・ロールでの生産が可能である点など、現在主流の無機系太陽電池とは異なる特長を持っていることから、新たな市場形成が期待されている。
Electronic elements, particularly organic photoelectric conversion elements, are devices that convert light energy into electrical energy using organic semiconductors, and examples thereof include organic solar cells.
Organic solar cells are solar cell elements that use organic materials in the active layer or charge transport material, and well-known examples include the dye-sensitized solar cell developed by M. Graetzel and the organic thin-film solar cell developed by C. W. Tang (Non-Patent Documents 1 and 2).
Both of these solar cells have features that differ from the currently mainstream inorganic solar cells, such as being lightweight, thin, and flexible, and being able to be produced on a roll-to-roll basis, and so are expected to create new markets.

 その一方で、近年、ペロブスカイト型結晶構造を有する化合物(以下、「ペロブスカイト半導体化合物」という。)として金属ハロゲン化物を用いた太陽電池が、比較的高い光電変換効率を達成できるとの研究成果が報告され、注目を集めている。例えば、特許文献1には、ペロブスカイト半導体化合物を含有する活性層を備えた光電変換素子および太陽電池が記載されている。 On the other hand, in recent years, research results have been reported showing that solar cells using metal halides as compounds having a perovskite crystal structure (hereinafter referred to as "perovskite semiconductor compounds") can achieve relatively high photoelectric conversion efficiency, and this has attracted attention. For example, Patent Document 1 describes a photoelectric conversion element and solar cell equipped with an active layer containing a perovskite semiconductor compound.

 そして、ペロブスカイト半導体化合物を活性層に用いた光電変換素子においては、素子特性をさらに向上させるために、当該活性層だけでなく、これに組み合わせられる他の層の条件についても、さらなる検討が進められている。 In addition, in photoelectric conversion elements that use perovskite semiconductor compounds in the active layer, further investigations are being conducted into the conditions of not only the active layer but also the other layers that are combined with it in order to further improve the device characteristics.

特開2016-178193号公報JP 2016-178193 A

Nature, vol.353, 737-740(1991)Nature, vol.353, 737-740(1991) Appl. Phys. Lett., Vol.48, 183-185 (1986)Appl. Phys. Lett., Vol.48, 183-185 (1986)

 本発明は、上記事情に鑑みてなされたものであり、光電変換素子の電荷輸送性薄膜の形成に好適であり、特に、ペロブスカイト型太陽電池の正孔捕集層として用いた場合には、得られる素子の光電変換効率(PCE)を大きく向上させ得る電荷輸送性組成物を提供することを目的とする。 The present invention has been made in consideration of the above circumstances, and aims to provide a charge transport composition that is suitable for forming a charge transport thin film for a photoelectric conversion element, and in particular, when used as a hole collection layer for a perovskite solar cell, can greatly improve the photoelectric conversion efficiency (PCE) of the resulting element.

 本発明者らは、上記目的を達成するために鋭意検討を重ねた結果、電荷輸送性物質と、電子受容性ドーパント物質と、有機溶媒とを含み、当該電荷輸送性物質として、特定の構造を有するジアミン成分を用いて得られるポリイミド系重合体を含む電荷輸送性組成物が、有機光電変換素子における電荷輸送性薄膜の形成に好適であり、特に、ペロブスカイト型太陽電池の正孔捕集層として用いた場合に、得られる素子のPCEを大きく向上させ得ることを見出し、本発明を完成させた。 As a result of extensive research conducted by the inventors in order to achieve the above object, they discovered that a charge transporting composition containing a charge transporting substance, an electron accepting dopant substance, and an organic solvent, and containing a polyimide-based polymer obtained by using a diamine component having a specific structure as the charge transporting substance, is suitable for forming a charge transporting thin film in an organic photoelectric conversion element, and in particular, when used as a hole collection layer in a perovskite solar cell, it can greatly improve the PCE of the resulting element, thereby completing the present invention.

 すなわち、本発明は、以下の電荷輸送性組成物を提供する。
1. 有機光電変換素子における電荷輸送性薄膜を形成するための電荷輸送性組成物であって、
電荷輸送性物質と、電子受容性ドーパント物質と、有機溶媒とを含み、
上記電荷輸送性物質が、下記式(1)~(3)で表されるいずれかの構造を有するジアミン成分と、テトラカルボン酸成分とから得られるポリイミド前駆体、上記ポリイミド前駆体のエステルおよび上記ポリイミド前駆体のイミド化物からなる群より選ばれる少なくとも1種のポリイミド系重合体を含む電荷輸送性組成物。

Figure JPOXMLDOC01-appb-C000003
(式中、R1は、水素原子または一価の有機基を表す。*は、他の基に結合する部位を表す。ベンゼン環を形成する任意の水素原子は一価の有機基で置換されていてもよい。)
2. 上記電子受容性ドーパント物質が、下記式(An1)で表されるアニオンと、その対カチオンとからなる塩である1の電荷輸送性組成物。
Figure JPOXMLDOC01-appb-C000004
(式中、Eは長周期型周期表の第13族に属する元素を表し、Ara1~Ara4は、互いに独立して、置換基を有してもよい芳香族炭化水素基または置換基を有してもよい芳香族複素環基を表す。)
3. 上記塩が、オニウム塩である2の電荷輸送性組成物。
4. 上記電子受容性ドーパント物質の含有量が、質量比で、電荷輸送性物質1に対して、0.001~50である2の電荷輸送性組成物。
5. 上記R1が、水素原子、炭素数1~5のアルキル基、炭素数1~5のフルオロアルキル基またはtert-ブトキシカルボニル基である1~4のいずれかの電荷輸送性組成物。
6. ペロブスカイト光電変換素子の正孔捕集層用である1~5のいずれかの電荷輸送性組成物。
7. 1~5のいずれかの電荷輸送性組成物から得られる電荷輸送性薄膜。
8. 上記電荷輸送性薄膜が、ペロブスカイト光電変換素子の正孔捕集層である7の電荷輸送性薄膜。
9. 8の電荷輸送性薄膜を備えるペロブスカイト光電変換素子。
10. 逆積層型である9のペロブスカイト光電変換素子。
11. 9のペロブスカイト光電変換素子を備える太陽電池。 That is, the present invention provides the following charge transport composition.
1. A charge transporting composition for forming a charge transporting thin film in an organic photoelectric conversion element, comprising:
A charge transporting material, an electron accepting dopant material, and an organic solvent are included,
The charge transporting material is a charge transporting composition comprising at least one polyimide polymer selected from the group consisting of a polyimide precursor obtained from a diamine component having a structure represented by any one of the following formulas (1) to (3) and a tetracarboxylic acid component, an ester of the polyimide precursor, and an imidized product of the polyimide precursor:
Figure JPOXMLDOC01-appb-C000003
(In the formula, R1 represents a hydrogen atom or a monovalent organic group. * represents a bonding site to another group. Any hydrogen atom forming a benzene ring may be substituted with a monovalent organic group.)
2. The charge transport composition of 1, wherein the electron-accepting dopant substance is a salt composed of an anion represented by the following formula (An1) and its counter cation:
Figure JPOXMLDOC01-appb-C000004
(In the formula, E represents an element belonging to Group 13 of the long form periodic table, and Ar a1 to Ar a4 each independently represent an aromatic hydrocarbon group which may have a substituent or an aromatic heterocyclic group which may have a substituent.)
3. The charge transporting composition of 2, wherein the salt is an onium salt.
4. The charge transporting composition of 2, wherein the content of the electron accepting dopant substance is 0.001 to 50 parts by mass per 1 part by mass of the charge transporting substance.
5. The charge transporting composition of any one of 1 to 4, wherein R 1 is a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, a fluoroalkyl group having 1 to 5 carbon atoms, or a tert-butoxycarbonyl group.
6. The charge transport composition according to any one of 1 to 5, which is for use in a hole collection layer of a perovskite photoelectric conversion element.
7. A charge transporting thin film obtained from any one of the charge transporting compositions 1 to 5.
8. The charge transporting thin film according to 7, wherein the charge transporting thin film is a hole collecting layer of a perovskite photoelectric conversion element.
9. A perovskite photoelectric conversion element comprising the charge transporting thin film of 8.
10. The perovskite photoelectric conversion element of 9, which is of an inverted stacking type.
11. A solar cell comprising 9 perovskite photoelectric conversion elements.

 本発明の電荷輸送性組成物は、光電変換素子の電荷輸送性薄膜の形成に好適であり、特に当該電荷輸送性薄膜をペロブスカイト光電変換素子の正孔捕集層として用いた場合には、高いPCEを有するペロブスカイト光電変換素子を得ることができる。 The charge transporting composition of the present invention is suitable for forming a charge transporting thin film for a photoelectric conversion element, and in particular, when the charge transporting thin film is used as a hole collection layer for a perovskite photoelectric conversion element, a perovskite photoelectric conversion element having a high PCE can be obtained.

 以下、本発明についてさらに詳しく説明する。
 本発明の電荷輸送性組成物は、有機光電変換素子における電荷輸送性薄膜を形成するための電荷輸送性組成物であって、電荷輸送性物質と、電子受容性ドーパント物質と、有機溶媒とを含み、上記電荷輸送性物質が、下記式(1)~(3)で表されるいずれかの構造を有するジアミン成分と、テトラカルボン酸成分とから得られるポリイミド前駆体、上記ポリイミド前駆体のエステルおよび上記ポリイミド前駆体のイミド化物からなる群より選ばれる少なくとも1種のポリイミド系重合体を含むことを特徴とする。
 なお、一般的に上記当該ポリイミド系重合体は、高い耐熱性や優れた機械特性を備えており、電子機器分野で幅広く用いられている。また、当該ポリイミド系重合体は量産性が高く、有機光電変換素子、特にペロブスカイト太陽電池の電荷輸送性薄膜を構成する材料として好適である。
The present invention will be described in further detail below.
The charge transport composition of the present invention is a charge transport composition for forming a charge transport thin film in an organic photoelectric conversion element, and is characterized in that it comprises a charge transport substance, an electron accepting dopant substance, and an organic solvent, and the charge transport substance comprises at least one polyimide-based polymer selected from the group consisting of a polyimide precursor obtained from a diamine component having a structure represented by any one of the following formulas (1) to (3) and a tetracarboxylic acid component, an ester of the polyimide precursor, and an imidized product of the polyimide precursor:
Generally, the polyimide-based polymer has high heat resistance and excellent mechanical properties, and is widely used in the field of electronic devices. In addition, the polyimide-based polymer has high mass productivity and is suitable as a material for constituting a charge transport thin film of an organic photoelectric conversion element, particularly a perovskite solar cell.

Figure JPOXMLDOC01-appb-C000005
(式中、R1は、水素原子または一価の有機基を表す。*は、他の基に結合する部位を表す。ベンゼン環を形成する任意の水素原子は一価の有機基で置換されていてもよい。)
Figure JPOXMLDOC01-appb-C000005
(In the formula, R1 represents a hydrogen atom or a monovalent organic group. * represents a bonding site to another group. Any hydrogen atom forming a benzene ring may be substituted with a monovalent organic group.)

 以下、式(1)~(3)の構造を有するジアミンを「特定ジアミン」と称する場合がある。また、本発明の特定ジアミンを含有させた重合体を「特定重合体」と称する場合がある。 Hereinafter, the diamines having the structures of formulas (1) to (3) may be referred to as "specific diamines." Furthermore, polymers containing the specific diamines of the present invention may be referred to as "specific polymers."

<特定ジアミン>
 特定ジアミンは、下記式(1)~(3)で表されるいずれかの構造を有する。
<Specific diamine>
The specific diamine has any of the structures represented by the following formulas (1) to (3).

Figure JPOXMLDOC01-appb-C000006
Figure JPOXMLDOC01-appb-C000006

 上記式(1)~(3)中、R1は、水素原子または一価の有機基を表す。*は、他の基に結合する部位を表す。ベンゼン環を形成する任意の水素原子は一価の有機基で置換されていてもよい。ここにおける一価の有機基としては、炭素数1~10のアルキル基、炭素数2~10のアルケニル基、炭素数1~10のアルコキシ基、炭素数1~10のフルオロアルキル基、炭素数2~10のフルオロアルケニル基、炭素数1~10のフルオロアルコキシ基、tert-ブトキシカルボニル基等が挙げられる。 In the above formulas (1) to (3), R 1 represents a hydrogen atom or a monovalent organic group. * represents a site for bonding to another group. Any hydrogen atom forming a benzene ring may be substituted with a monovalent organic group. Examples of the monovalent organic group include an alkyl group having 1 to 10 carbon atoms, an alkenyl group having 2 to 10 carbon atoms, an alkoxy group having 1 to 10 carbon atoms, a fluoroalkyl group having 1 to 10 carbon atoms, a fluoroalkenyl group having 2 to 10 carbon atoms, a fluoroalkoxy group having 1 to 10 carbon atoms, and a tert-butoxycarbonyl group.

 炭素数1~10のアルキル基としては、メチル基、エチル基、n-プロピル基、イソプロピル基、n-ブチル基、i-ブチル基、s-ブチル基、t-ブチル基、n-ペンチル基、n-ヘキシル基、n-ヘプチル基、n-オクチル基、n-ノニル基、n-デシル基等が挙げられる。 Examples of alkyl groups having 1 to 10 carbon atoms include methyl, ethyl, n-propyl, isopropyl, n-butyl, i-butyl, s-butyl, t-butyl, n-pentyl, n-hexyl, n-heptyl, n-octyl, n-nonyl, and n-decyl groups.

 炭素数2~10のアルケニル基としては、エテニル基、n-1-プロペニル基、n-2-プロペニル基、1-メチルエテニル基、n-1-ブテニル基、n-2-ブテニル基、n-3-ブテニル基、2-メチル-1-プロペニル基、2-メチル-2-プロペニル基、1-エチルエテニル基、1-メチル-1-プロペニル基、1-メチル-2-プロペニル基、n-1-ペンテニル基、n-1-デセニル基等が挙げられる。 Alkenyl groups having 2 to 10 carbon atoms include ethenyl, n-1-propenyl, n-2-propenyl, 1-methylethenyl, n-1-butenyl, n-2-butenyl, n-3-butenyl, 2-methyl-1-propenyl, 2-methyl-2-propenyl, 1-ethylethenyl, 1-methyl-1-propenyl, 1-methyl-2-propenyl, n-1-pentenyl, and n-1-decenyl.

 炭素数1~10のアルコキシ基としては、メトキシ基、エトキシ基、n-プロポキシ基、i-プロポキシ基、n-ブトキシ基、i-ブトキシ基、s-ブトキシ基、t-ブトキシ基、n-ペントキシ基、n-ヘキシルオキシ基、n-ヘプチルオキシ基、n-オクチルオキシ基、n-ノニルオキシ基、n-デシルオキシ基が挙げられる。 Alkoxy groups having 1 to 10 carbon atoms include methoxy, ethoxy, n-propoxy, i-propoxy, n-butoxy, i-butoxy, s-butoxy, t-butoxy, n-pentoxy, n-hexyloxy, n-heptyloxy, n-octyloxy, n-nonyloxy, and n-decyloxy.

 炭素数1~10のフルオロアルキル基としては、炭素原子上の少なくとも1個の水素原子がフッ素原子で置換された炭素数1~10のアルキル基であれば特に限定されないが、その具体例としては、フルオロメチル基、ジフルオロメチル基、パーフルオロメチル基、1-フルオロエチル基、2-フルオロエチル基、1,2-ジフルオロエチル基、1,1-ジフルオロエチル基、2,2-ジフルオロエチル基、1,1,2-トリフルオロエチル基、1,2,2-トリフルオロエチル基、2,2,2-トリフルオロエチル基、1,1,2,2-テトラフルオロエチル基、1,2,2,2-テトラフルオロエチル基、パーフルオロエチル基、1-フルオロプロピル基、2-フルオロプロピル基、3-フルオロプロピル基、1,1-ジフルオロプロピル基、1,2-ジフルオロプロピル基、1,3-ジフルオロプロピル基、2,2-ジフルオロプロピル基、2,3-ジフルオロプロピル基、3,3-ジフルオロプロピル基、1,1,2-トリフルオロプロピル基、1,1,3-トリフルオロプロピル基、1,2,3-トリフルオロプロピル基、1,3,3-トリフルオロプロピル基、2,2,3-トリフルオロプロピル基、2,3,3-トリフルオロプロピル基、3,3,3-トリフルオロプロピル基、1,1,2,2-テトラフルオロプロピル基、1,1,2,3-テトラフルオロプロピル基、1,2,2,3-テトラフルオロプロピル基、1,3,3,3-テトラフルオロプロピル基、2,2,3,3-テトラフルオロプロピル基、2,3,3,3-テトラフルオロプロピル基、1,1,2,2,3-ペンタフルオロプロピル基、1,2,2,3,3-ペンタフルオロプロピル基、1,1,3,3,3-ペンタフルオロプロピル基、1,2,3,3,3-ペンタフルオロプロピル基、2,2,3,3,3-ペンタフルオロプロピル基、パーフルオロプロピル基、パーフルオロブチル基、パーフルオロペンチル基、パーフルオロヘキシル基、パーフルオロヘプチル基、パーフルオロオクチル基等が挙げられる。 The fluoroalkyl group having 1 to 10 carbon atoms is not particularly limited as long as it is an alkyl group having 1 to 10 carbon atoms in which at least one hydrogen atom on a carbon atom has been replaced with a fluorine atom, and specific examples include a fluoromethyl group, a difluoromethyl group, a perfluoromethyl group, a 1-fluoroethyl group, a 2-fluoroethyl group, a 1,2-difluoroethyl group, a 1,1-difluoroethyl group, a 2,2-difluoroethyl group, a 1,1,2-trifluoroethyl group, a 1,2,2-trifluoroethyl group, a 2,2,2-trifluoroethyl group, a 1,1,2,2-tetrafluoroethyl group, a 1,2,2,2-tetrafluoroethyl group, a perfluoroethyl group, a 1-fluoropropyl group, a 2-fluoropropyl group, a 3-fluoropropyl group, a 1,1-difluoropropyl group, a 1,2-difluoropropyl group, a 1,3-difluoropropyl group, a 2,2-difluoropropyl group, a 2,3-difluoropropyl group, a 3,3-difluoropropyl group, a 1,1,2-trifluoropropyl group, group, 1,1,3-trifluoropropyl group, 1,2,3-trifluoropropyl group, 1,3,3-trifluoropropyl group, 2,2,3-trifluoropropyl group, 2,3,3-trifluoropropyl group, 3,3,3-trifluoropropyl group, 1,1,2,2-tetrafluoropropyl group, 1,1,2,3-tetrafluoropropyl group, 1,2,2,3-tetrafluoropropyl group, 1,3,3,3-tetrafluoropropyl group, 2,2,3,3-tetrafluoropropyl group , 2,3,3,3-tetrafluoropropyl group, 1,1,2,2,3-pentafluoropropyl group, 1,2,2,3,3-pentafluoropropyl group, 1,1,3,3,3-pentafluoropropyl group, 1,2,3,3,3-pentafluoropropyl group, 2,2,3,3,3-pentafluoropropyl group, perfluoropropyl group, perfluorobutyl group, perfluoropentyl group, perfluorohexyl group, perfluoroheptyl group, perfluorooctyl group, etc.

 炭素数2~10のフルオロアルケニル基としては、炭素原子上の少なくとも1個の水素原子がフッ素原子で置換された炭素数2~10のフルオロアルケニル基であれば特に限定されないが、その具体例としては、2-フルオロエテニル基、2,2-ジフルオロエテニル基、2-フルオロ-2-プロペニル基、3,3-ジフルオロ-2-プロペニル基、2,3-ジフルオロ-2-プロペニル基、3,3-ジフルオロ-2-メチル-2-プロペニル基、3-フルオロ-2-ブテニル基、パーフルオロビニル基、パーフルオロプロペニル基、パーフルオロブテニル基等が挙げられる。 The fluoroalkenyl group having 2 to 10 carbon atoms is not particularly limited as long as it is a fluoroalkenyl group having 2 to 10 carbon atoms in which at least one hydrogen atom on a carbon atom is replaced with a fluorine atom, and specific examples include a 2-fluoroethenyl group, a 2,2-difluoroethenyl group, a 2-fluoro-2-propenyl group, a 3,3-difluoro-2-propenyl group, a 2,3-difluoro-2-propenyl group, a 3,3-difluoro-2-methyl-2-propenyl group, a 3-fluoro-2-butenyl group, a perfluorovinyl group, a perfluoropropenyl group, and a perfluorobutenyl group.

 炭素数1~10のフルオロアルコキシ基としては、炭素原子上の少なくとも1個の水素原子がフッ素原子で置換された炭素数1~10のアルコキシ基であれば特に限定されないが、その具体例としては、フルオロメトキシ基、ジフルオロメトキシ基、パーフルオロメトキシ基、1-フルオロエトキシ基、2-フルオロエトキシ基、1,2-ジフルオロエトキシ基、1,1-ジフルオロエトキシ基、2,2-ジフルオロエトキシ基、1,1,2-トリフルオロエトキシ基、1,2,2-トリフルオロエトキシ基、2,2,2-トリフルオロエトキシ基、1,1,2,2-テトラフルオロエトキシ基、1,2,2,2-テトラフルオロエトキシ基、パーフルオロエトキシ基、1-フルオロプロポキシ基、2-フルオロプロポキシ基、3-フルオロプロポキシ基、1,1-ジフルオロプロポキシ基、1,2-ジフルオロプロポキシ基、1,3-ジフルオロプロポキシ基、2,2-ジフルオロプロポキシ基、2,3-ジフルオロプロポキシ基、3,3-ジフルオロプロポキシ基、1,1,2-トリフルオロプロポキシ基、1,1,3-トリフルオロプロポキシ基、1,2,3-トリフルオロプロポキシ基、1,3,3-トリフルオロプロポキシ基、2,2,3-トリフルオロプロポキシ基、2,3,3-トリフルオロプロポキシ基、3,3,3-トリフルオロプロポキシ基、1,1,2,2-テトラフルオロプロポキシ基、1,1,2,3-テトラフルオロプロポキシ基、1,2,2,3-テトラフルオロプロポキシ基、1,3,3,3-テトラフルオロプロポキシ基、2,2,3,3-テトラフルオロプロポキシ基、2,3,3,3-テトラフルオロプロポキシ基、1,1,2,2,3-ペンタフルオロプロポキシ基、1,2,2,3,3-ペンタフルオロプロポキシ基、1,1,3,3,3-ペンタフルオロプロポキシ基、1,2,3,3,3-ペンタフルオロプロポキシ基、2,2,3,3,3-ペンタフルオロプロポキシ基、パーフルオロプロポキシ基等が挙げられる。 The fluoroalkoxy group having 1 to 10 carbon atoms is not particularly limited as long as it is an alkoxy group having 1 to 10 carbon atoms in which at least one hydrogen atom on a carbon atom is replaced with a fluorine atom, and specific examples include a fluoromethoxy group, a difluoromethoxy group, a perfluoromethoxy group, a 1-fluoroethoxy group, a 2-fluoroethoxy group, a 1,2-difluoroethoxy group, a 1,1-difluoroethoxy group, a 2,2-difluoroethoxy group, and a 1,1,2-trifluoroethoxy group. groups, 1,2,2-trifluoroethoxy groups, 2,2,2-trifluoroethoxy groups, 1,1,2,2-tetrafluoroethoxy groups, 1,2,2,2-tetrafluoroethoxy groups, perfluoroethoxy groups, 1-fluoropropoxy groups, 2-fluoropropoxy groups, 3-fluoropropoxy groups, 1,1-difluoropropoxy groups, 1,2-difluoropropoxy groups, 1,3-difluoropropoxy groups, 2,2-difluoropropoxy groups, 2,3-difluoropropoxy groups, 3,3-difluoropropoxy group, 1,1,2-trifluoropropoxy group, 1,1,3-trifluoropropoxy group, 1,2,3-trifluoropropoxy group, 1,3,3-trifluoropropoxy group, 2,2,3-trifluoropropoxy group, 2,3,3-trifluoropropoxy group, 3,3,3-trifluoropropoxy group, 1,1,2,2-tetrafluoropropoxy group, 1,1,2,3-tetrafluoropropoxy group, 1,2,2,3-tetrafluoropropoxy group, Examples of such groups include 1,3,3,3-tetrafluoropropoxy groups, 2,2,3,3-tetrafluoropropoxy groups, 2,3,3,3-tetrafluoropropoxy groups, 1,1,2,2,3-pentafluoropropoxy groups, 1,2,2,3,3-pentafluoropropoxy groups, 1,1,3,3,3-pentafluoropropoxy groups, 1,2,3,3,3-pentafluoropropoxy groups, 2,2,3,3,3-pentafluoropropoxy groups, and perfluoropropoxy groups.

 上記R1としては、水素原子、炭素数1~3のアルキル基、炭素数2~3のアルケニル基、炭素数1~3のアルコキシ基、炭素数1~3のフルオロアルキル基、炭素数2~3のフルオロアルケニル基、炭素数1~3のフルオロアルコキシ基、tert-ブトキシカルボニル基が好ましく、水素原子および炭素数1~3のアルキル基がより好ましく、水素原子およびメチル基がより一層好ましい。 R 1 is preferably a hydrogen atom, an alkyl group having 1 to 3 carbon atoms, an alkenyl group having 2 to 3 carbon atoms, an alkoxy group having 1 to 3 carbon atoms, a fluoroalkyl group having 1 to 3 carbon atoms, a fluoroalkenyl group having 2 to 3 carbon atoms, a fluoroalkoxy group having 1 to 3 carbon atoms, or a tert-butoxycarbonyl group, more preferably a hydrogen atom or an alkyl group having 1 to 3 carbon atoms, and even more preferably a hydrogen atom or a methyl group.

 上記式(1)の構造において、ベンゼン環のピロール環に対する結合位置は、電荷輸送性の点から、下記式(1-1)に表すようにピロール環上の窒素原子の隣にある炭素原子であることが好ましい。 In the structure of formula (1) above, the bonding position of the benzene ring to the pyrrole ring is preferably the carbon atom next to the nitrogen atom on the pyrrole ring, as shown in formula (1-1) below, in terms of charge transport properties.

Figure JPOXMLDOC01-appb-C000007
(式中、R1および*は、式(1)の場合と同様である。)
Figure JPOXMLDOC01-appb-C000007
(In the formula, R1 and * are the same as in formula (1).)

 上記式(1)の構造を有するジアミンの好ましい例としては、下記式(1-2)で表されるジアミンを挙げることができる。 A preferred example of a diamine having the structure of formula (1) above is a diamine represented by formula (1-2) below.

Figure JPOXMLDOC01-appb-C000008
Figure JPOXMLDOC01-appb-C000008

 上記式(1-2)中、R1は、式(1)の場合と同様である。2つのR2は、互いに独立して、単結合または下記式(1-3)の構造を表す。なお、式(1)の場合と同様に、ベンゼン環を形成する任意の水素原子は一価の有機基で置換されていてもよい。 In the above formula (1-2), R 1 is the same as in formula (1). Two R 2s each independently represent a single bond or a structure of the following formula (1-3). As in the case of formula (1), any hydrogen atom forming a benzene ring may be substituted with a monovalent organic group.

Figure JPOXMLDOC01-appb-C000009
Figure JPOXMLDOC01-appb-C000009

 式(1-3)中、R3は、単結合、-O-、-COO-、-OCO-、-(CH2i-、-O(CH2jO-、-CONH-、-NHCO-、-CON(CH3)-、-N(CH3)CO-および-NR1-からなる群より選ばれる二価の有機基を表す。ここで、iは、1~14の整数を表し、jは、1~14の整数を表す。R1は、式(1)の場合と同様である。これらの中でも、電荷輸送性の観点から、R3は、単結合、-O-、-COO-、-OCO-、-CONH-、-NHCO-および-N(CH3)-が好ましい。また、*1は、式(1-2)中のベンゼン環と結合する部位を表す。*2は、式(1-2)中のアミノ基と結合する部位を表す。式(1-2)中のk1は、1~3の整数であり、好ましくは1または2である。 In formula (1-3), R 3 represents a divalent organic group selected from the group consisting of a single bond, -O-, -COO-, -OCO-, -(CH 2 ) i -, -O(CH 2 ) j O-, -CONH-, -NHCO-, -CON(CH 3 )-, -N(CH 3 )CO-, and -NR 1 -. Here, i represents an integer of 1 to 14, and j represents an integer of 1 to 14. R 1 is the same as in formula (1). Among these, from the viewpoint of charge transportability, R 3 is preferably a single bond, -O-, -COO-, -OCO-, -CONH-, -NHCO-, and -N(CH 3 )-. In addition, * 1 represents a site bonded to the benzene ring in formula (1-2). * 2 represents a site bonded to the amino group in formula (1-2). In the formula (1-2), k1 is an integer of 1 to 3, and preferably 1 or 2.

 上記式(1-2)の具体例としては、下記式(1-2-1)~(1-2-17)で表されるものが挙げられるが、これらに限定されない。これらの中でも、電荷輸送性の観点から、式(1-2-1)、式(1-2-2)、式(1-2-3)、式(1-2-5)、式(1-2-8)、式(1-2-9)、式(1-2-10)、式(1-2-11)、式(1-2-12)、式(1-2-13)、式(1-2-14)、式(1-2-15)、式(1-2-16)および式(1-2-17)が好ましく、式(1-2-1)、式(1-2-2)、式(1-2-3)、式(1-2-11)、式(1-2-12)、式(1-2-13)、式(1-2-14)、式(1-2-15)、式(1-2-16)および式(1-2-17)がより好ましい。なお、下記式(1-2-6)および(1-2-7)において、x1は、1~14の整数である。また、Bocは、tert-ブトキシカルボニル基を表す。 Specific examples of the above formula (1-2) include those represented by the following formulas (1-2-1) to (1-2-17), but are not limited to these. Among these, from the viewpoint of charge transportability, formula (1-2-1), formula (1-2-2), formula (1-2-3), formula (1-2-5), formula (1-2-8), formula (1-2-9), formula (1-2-10), formula (1-2-11), formula (1-2-12), formula (1-2-13), formula (1-2-14), formula (1-2-15), formula (1-2-16) and formula (1-2-17) are preferred, and formula (1-2-1), formula (1-2-2), formula (1-2-3), formula (1-2-11), formula (1-2-12), formula (1-2-13), formula (1-2-14), formula (1-2-15), formula (1-2-16) and formula (1-2-17) are more preferred. In the following formulas (1-2-6) and (1-2-7), x1 is an integer from 1 to 14. Also, Boc represents a tert-butoxycarbonyl group.

Figure JPOXMLDOC01-appb-C000010
Figure JPOXMLDOC01-appb-C000010

 上記式(2)の構造において、カルバゾール環に対して、他の基の結合位置は、立体障害の点から、式(2-1)のように結合していることが好ましい。 In the structure of formula (2) above, the bonding position of other groups to the carbazole ring is preferably bonded as shown in formula (2-1) in terms of steric hindrance.

Figure JPOXMLDOC01-appb-C000011
Figure JPOXMLDOC01-appb-C000011

 上記式(2-1)中、R1は、上記で定義したとおりである。 In the above formula (2-1), R 1 is as defined above.

 上記特定ジアミンとしては、下記式(2-2)~(2-7)で表されるジアミンを挙げることができ、特に電荷輸送性の点から、式(2-3)~(2-7)で表されるジアミンが好ましく、式(2-4)~(2-7)で表されるジアミンがより好ましい。 The specific diamines include those represented by the following formulas (2-2) to (2-7). In particular, from the viewpoint of charge transport properties, diamines represented by formulas (2-3) to (2-7) are preferred, and diamines represented by formulas (2-4) to (2-7) are more preferred.

Figure JPOXMLDOC01-appb-C000012
Figure JPOXMLDOC01-appb-C000012

 上記式中、R1の定義は、上記式(1)の場合と同様であり、R4は、互いに独立して、水素原子または一価の有機基であり、R5は、互いに独立して、単結合または二価の有機基である。k2は、互いに独立して、2または3を表す。ベンゼン環の任意の水素原子は、一価の有機基で置換されていてもよい。 In the above formula, the definition of R1 is the same as in the above formula (1), R4 is independently a hydrogen atom or a monovalent organic group, and R5 is independently a single bond or a divalent organic group. k2 is independently 2 or 3. Any hydrogen atom of the benzene ring may be substituted with a monovalent organic group.

 上記R4における一価の有機基としては、上記R1の説明において例示したものと同様のものが挙げられる。R4としては、水素原子、炭素数1~3のアルキル基、炭素数2~3のアルケニル基、炭素数1~3のアルコキシ基、炭素数1~3のフルオロアルキル基、炭素数2~3のフルオロアルケニル基、炭素数1~3のフルオロアルコキシ基、tert-ブトキシカルボニル基が好ましく、水素原子および炭素数1~3のアルキル基がより好ましく、水素原子およびメチル基がより一層好ましい。 Examples of the monovalent organic group in R 4 include the same as those exemplified in the description of R 1. R 4 is preferably a hydrogen atom, an alkyl group having 1 to 3 carbon atoms, an alkenyl group having 2 to 3 carbon atoms, an alkoxy group having 1 to 3 carbon atoms, a fluoroalkyl group having 1 to 3 carbon atoms, a fluoroalkenyl group having 2 to 3 carbon atoms, a fluoroalkoxy group having 1 to 3 carbon atoms, or a tert-butoxycarbonyl group, more preferably a hydrogen atom or an alkyl group having 1 to 3 carbon atoms, and even more preferably a hydrogen atom or a methyl group.

 R5における二価の有機基としては、下記式(2-8)の構造を有する基が挙げられる。 The divalent organic group for R5 includes a group having a structure of the following formula (2-8).

Figure JPOXMLDOC01-appb-C000013
Figure JPOXMLDOC01-appb-C000013

 上記式中、R6は、単結合、-O-、-COO-、-OCO-、-(CH2r-、-O(CH2sO-、-NR61-、-CONR61-および-NR61CO-からなる群より選ばれる二価の有機基を表し、k3は、1~5の整数を表す。なお、R61は、水素もしくは一価の有機基を表し、rは、1~5の整数を表し、sは、1~5の整数を表す。上記一価の有機基としては、炭素数1~3のアルキル基が好ましく、メチル基がより好ましい。*3は、式(2-3)~(2-7)中のベンゼン環と結合する部位を表し、*4は、式(2-3)~(2-7)中のアミノ基と結合する部位を表す。 In the above formula, R 6 represents a divalent organic group selected from the group consisting of a single bond, -O-, -COO-, -OCO-, -(CH 2 ) r -, -O(CH 2 ) s O-, -NR 61 -, -CONR 61 -, and -NR 61 CO-, and k3 represents an integer of 1 to 5. R 61 represents hydrogen or a monovalent organic group, r represents an integer of 1 to 5, and s represents an integer of 1 to 5. As the monovalent organic group, an alkyl group having 1 to 3 carbon atoms is preferable, and a methyl group is more preferable. * 3 represents a site bonded to a benzene ring in formulas (2-3) to (2-7), and * 4 represents a site bonded to an amino group in formulas (2-3) to (2-7).

 特定ジアミンの具体例としては、下記式(2-1-1)~(2-1-19)で表されるジアミンが挙げられるが、これらに限定されない。これらの中でも、電荷輸送性の点から、式(2-1-1)~(2-1-7)、(2-1-10)~(2-1-17)が好ましく、(2-1-1)~(2-1-7)、(2-1-15)~(2-1-17)がより好ましい。下記式において、x2は、1~14の整数である。 Specific examples of the specific diamine include, but are not limited to, diamines represented by the following formulas (2-1-1) to (2-1-19). Among these, from the viewpoint of charge transport properties, formulas (2-1-1) to (2-1-7) and (2-1-10) to (2-1-17) are preferred, and formulas (2-1-1) to (2-1-7) and (2-1-15) to (2-1-17) are more preferred. In the following formulas, x2 is an integer from 1 to 14.

Figure JPOXMLDOC01-appb-C000014
Figure JPOXMLDOC01-appb-C000014

Figure JPOXMLDOC01-appb-C000015
Figure JPOXMLDOC01-appb-C000015

 上記式(3)の構造において、ベンゼン環に対して、他の基の結合位置は、立体障害の点から、式(3-1)のように結合していることが好ましい。 In the structure of formula (3) above, the bonding position of other groups to the benzene ring is preferably as shown in formula (3-1) in terms of steric hindrance.

Figure JPOXMLDOC01-appb-C000016
Figure JPOXMLDOC01-appb-C000016

 上記式(3-1)中、R1は、上記で定義したとおりである。 In the above formula (3-1), R 1 is as defined above.

 上記特定ジアミンとしては、下記式(3-2)~(3-7)で表されるジアミンを挙げることができ、特に電荷輸送性の点から、式(3-3)~(3-7)で表されるジアミンが好ましく、式(3-4)~(3-7)で表されるジアミンがより好ましい。 The specific diamines include those represented by the following formulas (3-2) to (3-7). In particular, from the viewpoint of charge transport properties, the diamines represented by the formulas (3-3) to (3-7) are preferred, and the diamines represented by the formulas (3-4) to (3-7) are more preferred.

Figure JPOXMLDOC01-appb-C000017
Figure JPOXMLDOC01-appb-C000017

 上記式中、R1の定義は、上記式(1)の場合と同様であり、R7は、互いに独立して、水素原子または一価の有機基であり、R8は、互いに独立して、単結合または二価の有機基である。k4は、互いに独立して、2または3を表す。ベンゼン環の任意の水素原子は、一価の有機基で置換されていてもよい。 In the above formula, the definition of R 1 is the same as in the above formula (1), R 7 is independently a hydrogen atom or a monovalent organic group, and R 8 is independently a single bond or a divalent organic group. k4 is independently 2 or 3. Any hydrogen atom of the benzene ring may be substituted with a monovalent organic group.

 上記R7における一価の有機基としては、上記R1の説明において例示したものと同様のものが挙げられる。R7としては、水素原子、炭素数1~3のアルキル基、炭素数2~3のアルケニル基、炭素数1~3のアルコキシ基、炭素数1~3のフルオロアルキル基、炭素数2~3のフルオロアルケニル基、炭素数1~3のフルオロアルコキシ基、tert-ブトキシカルボニル基が好ましく、水素原子および炭素数1~3のアルキル基がより好ましく、水素原子およびメチル基がより一層好ましい。 Examples of the monovalent organic group in R 7 include the same as those exemplified in the description of R 1. R 7 is preferably a hydrogen atom, an alkyl group having 1 to 3 carbon atoms, an alkenyl group having 2 to 3 carbon atoms, an alkoxy group having 1 to 3 carbon atoms, a fluoroalkyl group having 1 to 3 carbon atoms, a fluoroalkenyl group having 2 to 3 carbon atoms, a fluoroalkoxy group having 1 to 3 carbon atoms, or a tert-butoxycarbonyl group, more preferably a hydrogen atom or an alkyl group having 1 to 3 carbon atoms, and even more preferably a hydrogen atom or a methyl group.

 R8における二価の有機基としては、下記式(3-8)の構造を有する基が挙げられる。 The divalent organic group for R 8 includes a group having a structure of the following formula (3-8).

Figure JPOXMLDOC01-appb-C000018
Figure JPOXMLDOC01-appb-C000018

 上記式中、R9は、単結合、-O-、-COO-、-OCO-、-(CH2r-、-O(CH2sO-、-NR91-、-CONR91-および-NR91CO-からなる群より選ばれる二価の有機基を表し、k5は、1~5の整数を表す。なお、R91は、水素もしくは一価の有機基を表し、rは、1~5の整数を表し、sは、1~5の整数を表す。上記一価の有機基としては、炭素数1~3のアルキル基が好ましく、メチル基がより好ましい。*5は、式(3-3)~(3-7)中のベンゼン環と結合する部位を表し、*6は、式(3-3)~(3-7)中のアミノ基と結合する部位を表す。 In the above formula, R 9 represents a divalent organic group selected from the group consisting of a single bond, -O-, -COO-, -OCO-, -(CH 2 ) r -, -O(CH 2 ) s O-, -NR 91 -, -CONR 91 -, and -NR 91 CO-, and k5 represents an integer of 1 to 5. R 91 represents hydrogen or a monovalent organic group, r represents an integer of 1 to 5, and s represents an integer of 1 to 5. As the monovalent organic group, an alkyl group having 1 to 3 carbon atoms is preferable, and a methyl group is more preferable. * 5 represents a site bonded to a benzene ring in formulas (3-3) to (3-7), and * 6 represents a site bonded to an amino group in formulas (3-3) to (3-7).

 特定ジアミンの具体例としては、下記式(3-1-1)~(3-1-19)で表されるジアミンが挙げられるが、これらに限定されない。これらの中でも、電荷輸送性の点から、式(3-1-1)~(3-1-7)、(3-1-10)~(3-1-17)が好ましく、(3-1-1)~(3-1-7)、(3-1-15)~(3-1-17)がより好ましい。下記式において、x3は、1~14の整数である。 Specific examples of the specific diamine include, but are not limited to, diamines represented by the following formulas (3-1-1) to (3-1-19). Among these, from the viewpoint of charge transport properties, formulas (3-1-1) to (3-1-7) and (3-1-10) to (3-1-17) are preferred, and formulas (3-1-1) to (3-1-7) and (3-1-15) to (3-1-17) are more preferred. In the following formulas, x3 is an integer from 1 to 14.

Figure JPOXMLDOC01-appb-C000019
Figure JPOXMLDOC01-appb-C000019

Figure JPOXMLDOC01-appb-C000020
Figure JPOXMLDOC01-appb-C000020

 <特定ジアミンの合成方法>
 上記特定ジアミンの合成方法は、公知の方法を採用し得、特に限定されない。例えば、国際公開第2018/062197号や国際公開第2018/110354号等に記載の方法で合成することができる。
<Method for synthesizing specific diamine>
The specific diamine may be synthesized by a known method and is not particularly limited. For example, the specific diamine may be synthesized by the method described in WO 2018/062197 or WO 2018/110354.

 <その他のジアミン:上記以外のジアミン>
 特定重合体を得るためのジアミン成分には、上記特定ジアミン以外のその他のジアミン成分が含まれていてもよい。その他のジアミン成分の例としては、下記式(E1)で表されるものが挙げられる。
<Other diamines: diamines other than those listed above>
The diamine component for obtaining the specific polymer may contain other diamine components in addition to the specific diamines described above. Examples of the other diamine components include those represented by the following formula (E1).

Figure JPOXMLDOC01-appb-C000021
Figure JPOXMLDOC01-appb-C000021

 上記式(E1)中、A1およびA2は、互いに独立して、水素原子、炭素数1~5のアルキル基、炭素数2~5のアルケニル基または炭素数2~5のアルキニル基を表し、Y1は、二価の有機基を表す。 In the above formula (E1), A 1 and A 2 each independently represent a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, an alkenyl group having 2 to 5 carbon atoms, or an alkynyl group having 2 to 5 carbon atoms, and Y 1 represents a divalent organic group.

 炭素数1~5のアルキル基としては、メチル基、エチル基、n-プロピル基、イソプロピル基、n-ブチル基、i-ブチル基、s-ブチル基、t-ブチル基、n-ペンチル基等が挙げられる。 Examples of alkyl groups having 1 to 5 carbon atoms include methyl, ethyl, n-propyl, isopropyl, n-butyl, i-butyl, s-butyl, t-butyl, and n-pentyl groups.

 炭素数2~5のアルケニル基としては、エテニル基、n-1-プロペニル基、n-2-プロペニル基、1-メチルエテニル基、n-1-ブテニル基、n-2-ブテニル基、n-3-ブテニル基、2-メチル-1-プロペニル基、2-メチル-2-プロペニル基、1-エチルエテニル基、1-メチル-1-プロペニル基、1-メチル-2-プロペニル基、n-1-ペンテニル基等が挙げられる。 Alkenyl groups having 2 to 5 carbon atoms include ethenyl, n-1-propenyl, n-2-propenyl, 1-methylethenyl, n-1-butenyl, n-2-butenyl, n-3-butenyl, 2-methyl-1-propenyl, 2-methyl-2-propenyl, 1-ethylethenyl, 1-methyl-1-propenyl, 1-methyl-2-propenyl, and n-1-pentenyl.

 炭素数2~5のアルキニル基としては、エチニル、n-1-プロピニル、n-2-プロピニル、n-1-ブチニル、n-2-ブチニル、n-3-ブチニル、1-メチル-2-プロピニル、n-1-ペンチニル、n-2-ペンチニル、n-3-ペンチニル、n-4-ペンチニル、1-メチル-n-ブチニル、2-メチル-n-ブチニル、3-メチル-n-ブチニル、1,1-ジメチル-n-プロピニル等が挙げられる。 Alkynyl groups having 2 to 5 carbon atoms include ethynyl, n-1-propynyl, n-2-propynyl, n-1-butynyl, n-2-butynyl, n-3-butynyl, 1-methyl-2-propynyl, n-1-pentynyl, n-2-pentynyl, n-3-pentynyl, n-4-pentynyl, 1-methyl-n-butynyl, 2-methyl-n-butynyl, 3-methyl-n-butynyl, 1,1-dimethyl-n-propynyl, etc.

 これらの中でも、モノマーの反応性の点から、A1およびA2は、水素原子またはメチル基が好ましい。 Among these, from the viewpoint of the reactivity of the monomer, A 1 and A 2 are preferably a hydrogen atom or a methyl group.

 Y1としては、下記式(Y-1)~(Y-170)で表される基が挙げられる。なお、下記式において、x4は、1~14の整数であるが、好適な範囲があるものについては、その範囲を付記した。また、x4の範囲の記載が無いものについては、1~6の整数が好ましい。また、下記式中、Meはメチル基を表し、Bocは、tert-ブトキシカルボニル基を表す。 Examples of Y1 include groups represented by the following formulas (Y-1) to (Y-170). In the following formulas, x4 is an integer of 1 to 14, and where there is a preferred range, the range is noted. Where there is no description of the range of x4, an integer of 1 to 6 is preferred. In the following formulas, Me represents a methyl group, and Boc represents a tert-butoxycarbonyl group.

Figure JPOXMLDOC01-appb-C000022
Figure JPOXMLDOC01-appb-C000022

Figure JPOXMLDOC01-appb-C000023
Figure JPOXMLDOC01-appb-C000023

Figure JPOXMLDOC01-appb-C000024
Figure JPOXMLDOC01-appb-C000024

Figure JPOXMLDOC01-appb-C000025
Figure JPOXMLDOC01-appb-C000025

Figure JPOXMLDOC01-appb-C000026
Figure JPOXMLDOC01-appb-C000026

Figure JPOXMLDOC01-appb-C000027
Figure JPOXMLDOC01-appb-C000027

Figure JPOXMLDOC01-appb-C000028
Figure JPOXMLDOC01-appb-C000028

Figure JPOXMLDOC01-appb-C000029
Figure JPOXMLDOC01-appb-C000029

Figure JPOXMLDOC01-appb-C000030
Figure JPOXMLDOC01-appb-C000030

Figure JPOXMLDOC01-appb-C000031
Figure JPOXMLDOC01-appb-C000031

Figure JPOXMLDOC01-appb-C000032
Figure JPOXMLDOC01-appb-C000032

Figure JPOXMLDOC01-appb-C000033
Figure JPOXMLDOC01-appb-C000033

Figure JPOXMLDOC01-appb-C000034
Figure JPOXMLDOC01-appb-C000034

Figure JPOXMLDOC01-appb-C000035
Figure JPOXMLDOC01-appb-C000035

Figure JPOXMLDOC01-appb-C000036
Figure JPOXMLDOC01-appb-C000036

Figure JPOXMLDOC01-appb-C000037
Figure JPOXMLDOC01-appb-C000037

Figure JPOXMLDOC01-appb-C000038
Figure JPOXMLDOC01-appb-C000038

Figure JPOXMLDOC01-appb-C000039
Figure JPOXMLDOC01-appb-C000039

Figure JPOXMLDOC01-appb-C000040
Figure JPOXMLDOC01-appb-C000040

Figure JPOXMLDOC01-appb-C000041
Figure JPOXMLDOC01-appb-C000041

Figure JPOXMLDOC01-appb-C000042
Figure JPOXMLDOC01-appb-C000042

Figure JPOXMLDOC01-appb-C000043
Figure JPOXMLDOC01-appb-C000043

 以上説明した、その他のジアミンは、1種を単独で用いても、2種以上を組み合わせて用いてもよい。上記ジアミン成分がその他のジアミンを含有する場合、ジアミン成分中における特定ジアミンの含有量は、好ましくは10~100モル%、より好ましくは30~100モル%、より一層好ましくは50~100モル%とすることができる。 The other diamines described above may be used alone or in combination of two or more. When the diamine component contains other diamines, the content of the specific diamine in the diamine component is preferably 10 to 100 mol%, more preferably 30 to 100 mol%, and even more preferably 50 to 100 mol%.

 <テトラカルボン酸成分>
 特定重合体を得るためのテトラカルボン酸成分としては、テトラカルボン酸、テトラカルボン酸二無水物、テトラカルボン酸ジハライド、テトラカルボン酸ジアルキルエステル、テトラカルボン酸ジアルキルエステルジハライド等が挙げられ、本発明では、これらを総称してテトラカルボン酸成分とも称する。
<Tetracarboxylic acid component>
Examples of the tetracarboxylic acid component for obtaining the specific polymer include tetracarboxylic acid, tetracarboxylic dianhydride, tetracarboxylic acid dihalide, tetracarboxylic acid dialkyl ester, and tetracarboxylic acid dialkyl ester dihalide. In the present invention, these are collectively referred to as tetracarboxylic acid component.

 テトラカルボン酸成分としては、テトラカルボン酸二無水物や、その誘導体である、テトラカルボン酸、テトラカルボン酸ジハライド、テトラカルボン酸ジアルキルエステル、およびテトラカルボン酸ジアルキルエステルジハライド(これらを総称して、第1のテトラカルボン酸成分と称する)を用いることもできる。 As the tetracarboxylic acid component, tetracarboxylic dianhydride and its derivatives, such as tetracarboxylic acid, tetracarboxylic dihalide, tetracarboxylic dialkyl ester, and tetracarboxylic dialkyl ester dihalide (collectively referred to as the first tetracarboxylic acid component) can also be used.

 テトラカルボン酸二無水物としては、脂肪族テトラカルボン酸二無水物、脂環式テトラカルボン酸二無水物、芳香族テトラカルボン酸二無水物等が挙げられる。これらの具体例としては、以下の[1]~[5]の群のもの等がそれぞれ挙げられる。 Examples of tetracarboxylic dianhydrides include aliphatic tetracarboxylic dianhydrides, alicyclic tetracarboxylic dianhydrides, and aromatic tetracarboxylic dianhydrides. Specific examples of these include those in the following groups [1] to [5].

[1] 脂肪族テトラカルボン酸二無水物として、例えば、1,2,3,4-ブタンテトラカルボン酸二無水物等が挙げられる。 [1] Examples of aliphatic tetracarboxylic dianhydrides include 1,2,3,4-butanetetracarboxylic dianhydride.

[2] 脂環式テトラカルボン酸二無水物として、例えば、下記式(X1-1)~(X1-13)等の酸二無水物が挙げられる。 [2] Examples of alicyclic tetracarboxylic acid dianhydrides include acid dianhydrides such as those represented by the following formulas (X1-1) to (X1-13).

Figure JPOXMLDOC01-appb-C000044
Figure JPOXMLDOC01-appb-C000044

Figure JPOXMLDOC01-appb-C000045
Figure JPOXMLDOC01-appb-C000045

 上記式(X1-1)~(X1-4)中、R1a~R21aは、互いに独立して、水素原子、ハロゲン原子、炭素数1~6のアルキル基、炭素数2~6のアルケニル基、炭素数2~6のアルキニル基、フッ素原子を含有する炭素数1~6の一価の有機基またはフェニル基を表す。RMは、水素原子またはメチル基を表す。また、上記式(X1-13)中、Xaは、下記式(Xa-1)~(Xa-7)で表される4価の有機基を表す。 In the above formulas (X1-1) to (X1-4), R 1a to R 21a each independently represent a hydrogen atom, a halogen atom, an alkyl group having 1 to 6 carbon atoms, an alkenyl group having 2 to 6 carbon atoms, an alkynyl group having 2 to 6 carbon atoms, a monovalent organic group having 1 to 6 carbon atoms containing a fluorine atom, or a phenyl group. R M represents a hydrogen atom or a methyl group. In addition, in the above formula (X1-13), X a represents a tetravalent organic group represented by the following formulas (Xa-1) to (Xa-7).

Figure JPOXMLDOC01-appb-C000046
Figure JPOXMLDOC01-appb-C000046

[3] 3-オキサビシクロ[3.2.1]オクタン-2,4-ジオン-6-スピロ-3’-(テトラヒドロフラン-2’,5’-ジオン)、3,5,6-トリカルボキシ-2-カルボキシメチルノルボルナン-2:3,5:6-二無水物、4,9-ジオキサトリシクロ[5.3.1.02,6]ウンデカン-3,5,8,10-テトラオン等が挙げられる。 [3] 3-oxabicyclo[3.2.1]octane-2,4-dione-6-spiro-3'-(tetrahydrofuran-2',5'-dione), 3,5,6-tricarboxy-2-carboxymethylnorbornane-2:3,5:6-dianhydride, 4,9-dioxatricyclo[5.3.1.02,6]undecane-3,5,8,10-tetraone, etc.

[4] 芳香族テトラカルボン酸二無水物として、例えば、ピロメリット酸無水物、4,4’-(ヘキサフルオロイソプロピリデン)ジフタル酸無水物、3,3’,4,4’-ジフェニルスルホンテトラカルボン酸二無水物、下記式(X2-1)~(X2-10)で表される酸二無水物等が挙げられる。 [4] Examples of aromatic tetracarboxylic dianhydrides include pyromellitic anhydride, 4,4'-(hexafluoroisopropylidene)diphthalic anhydride, 3,3',4,4'-diphenylsulfonetetracarboxylic dianhydride, and acid dianhydrides represented by the following formulas (X2-1) to (X2-10).

Figure JPOXMLDOC01-appb-C000047
Figure JPOXMLDOC01-appb-C000047

Figure JPOXMLDOC01-appb-C000048
Figure JPOXMLDOC01-appb-C000048

[5] 下記式(X3-1)~(X3-9)で表される酸二無水物、特開2010-97188号公報に記載のテトラカルボン酸二無水物等が挙げられる。 [5] Examples include acid dianhydrides represented by the following formulas (X3-1) to (X3-9) and tetracarboxylic acid dianhydrides described in JP 2010-97188 A.

Figure JPOXMLDOC01-appb-C000049
Figure JPOXMLDOC01-appb-C000049

Figure JPOXMLDOC01-appb-C000050
Figure JPOXMLDOC01-appb-C000050

 以上説明したテトラカルボン酸成分は、1種を単独で用いても、2種以上を混合して用いてもよい。有機光センサー素子や電荷輸送層に要求される特性に応じて、1種を単独で用いるか、2種以上を混合して用いるか、さらには、2種以上を混合して用いる場合には、その割合等を適宜調整することができる。 The tetracarboxylic acid components described above may be used alone or in combination of two or more. Depending on the characteristics required for the organic light sensor element or charge transport layer, one may be used alone or two or more may be used in combination, and if two or more are used in combination, the ratio, etc., may be appropriately adjusted.

<特定重合体の製造方法>
 特定重合体は、上記説明したとおり、ジアミン成分とテトラカルボン酸成分とを反応させる方法により得られる。該方法としては、例えば、1種または複数種のジアミンからなるジアミン成分と、テトラカルボン酸二無水物およびそのテトラカルボン酸の誘導体からなる群より選ばれる少なくとも1種のテトラカルボン酸成分と、を反応させ、ポリアミド酸を得る方法が挙げられる。具体的には、1級または2級のジアミンと、テトラカルボン酸二無水物と、を重縮合させてポリアミック酸を得る方法が用いられる。
<Method of Producing Specific Polymer>
As described above, the specific polymer is obtained by a method of reacting a diamine component with a tetracarboxylic acid component. For example, the method includes a method of reacting a diamine component consisting of one or more diamines with at least one tetracarboxylic acid component selected from the group consisting of tetracarboxylic dianhydrides and derivatives of the tetracarboxylic acid to obtain a polyamic acid. Specifically, a method of polycondensing a primary or secondary diamine with a tetracarboxylic dianhydride to obtain a polyamic acid is used.

 ポリアミド酸アルキルエステルを得るためには、カルボン酸基をジアルキルエステル化したテトラカルボン酸と1級または2級のジアミンとを重縮合させる方法、カルボン酸基をハロゲン化したテトラカルボン酸ジハライドと1級または2級のジアミンとを重縮合させる方法、またはポリアミド酸のカルボキシ基をエステルに変換する方法が用いられる。ポリイミドを得るには、上記のポリアミド酸またはポリアミド酸アルキルエステルを閉環させてポリイミドとする方法が用いられる。 In order to obtain a polyamic acid alkyl ester, a method of polycondensing a tetracarboxylic acid in which the carboxylic acid group has been dialkyl esterified with a primary or secondary diamine is used, a method of polycondensing a tetracarboxylic acid dihalide in which the carboxylic acid group has been halogenated with a primary or secondary diamine is used, or a method of converting the carboxy group of a polyamic acid into an ester is used. In order to obtain a polyimide, a method of ring-closing the above polyamic acid or polyamic acid alkyl ester to form a polyimide is used.

 ジアミン成分とテトラカルボン酸成分との反応は、通常、溶媒中で行う。その際に用いる溶媒としては、生成したポリイミド前駆体が溶解するものであれば特に限定されない。ここでの溶媒の例としては、N-メチル-2-ピロリドン、N-エチル-2-ピロリドンまたはγ-ブチロラクトン、N,N-ジメチルホルムアミド、N,N-ジエチルホルムアミド、N,N-ジメチルアセトアミド、N,N-ジエチルアセトアミド、3-メトキシ-N,N-ジメチルプロパンアミド、ジメチルスルホキシドまたは1,3-ジメチル-イミダゾリジノン等が挙げられる。また、ポリイミド前駆体の溶媒溶解性が高い場合、メチルエチルケトン、シクロヘキサノン、シクロペンタノン、4-ヒドロキシ-4-メチル-2-ペンタノンまたは下記式[s1]~[s3]で表される溶媒等を用いることもできる。 The reaction between the diamine component and the tetracarboxylic acid component is usually carried out in a solvent. The solvent used is not particularly limited as long as it dissolves the polyimide precursor produced. Examples of the solvent include N-methyl-2-pyrrolidone, N-ethyl-2-pyrrolidone, γ-butyrolactone, N,N-dimethylformamide, N,N-diethylformamide, N,N-dimethylacetamide, N,N-diethylacetamide, 3-methoxy-N,N-dimethylpropanamide, dimethylsulfoxide, 1,3-dimethyl-imidazolidinone, and the like. In addition, when the polyimide precursor has high solubility in the solvent, methyl ethyl ketone, cyclohexanone, cyclopentanone, 4-hydroxy-4-methyl-2-pentanone, or solvents represented by the following formulas [s1] to [s3], and the like, can also be used.

Figure JPOXMLDOC01-appb-C000051
Figure JPOXMLDOC01-appb-C000051

 式[s1]中、Ds1は炭素数1~3のアルキル基を表す。式[s2]中、Ds2は炭素数1~3のアルキル基を表す。式[s3]中、Ds3は炭素数1~4のアルキル基を表す。 In formula [s1], D s1 represents an alkyl group having 1 to 3 carbon atoms. In formula [s2], D s2 represents an alkyl group having 1 to 3 carbon atoms. In formula [s3], D s3 represents an alkyl group having 1 to 4 carbon atoms.

 炭素数1~4のアルキル基としては、メチル基、エチル基、n-プロピル基、イソプロピル基、n-ブチル基、i-ブチル基、s-ブチル基、t-ブチル基等が挙げられる。炭素数1~3のアルキル基としては、上記炭素数1~4のアルキル基のうち炭素数1~3のものが挙げられる。 Examples of alkyl groups having 1 to 4 carbon atoms include methyl, ethyl, n-propyl, isopropyl, n-butyl, i-butyl, s-butyl, and t-butyl groups. Examples of alkyl groups having 1 to 3 carbon atoms include those having 1 to 3 carbon atoms among the above alkyl groups having 1 to 4 carbon atoms.

 これらの溶媒は、1種を単独で用いても、2種以上を混合して用いてもよい。ポリイミド前駆体を溶解させない溶媒であっても、生成したポリイミド前駆体が析出しない範囲であれば、上記溶媒に混合して使用してもよい。また、溶媒中の水分は、重合反応を阻害し、さらには、生成したポリイミド前駆体を加水分解させる原因となるので、溶媒は脱水乾燥させたものを用いることが好ましい。 These solvents may be used alone or in combination of two or more. Even if the solvent does not dissolve the polyimide precursor, it may be mixed with the above-mentioned solvents as long as the resulting polyimide precursor does not precipitate. Furthermore, moisture in the solvent inhibits the polymerization reaction and may even cause hydrolysis of the resulting polyimide precursor, so it is preferable to use a solvent that has been dehydrated and dried.

 ジアミン成分とテトラカルボン酸成分とを溶媒中で反応させる際には、ジアミン成分を溶媒に分散、或いは溶解させた溶液を撹拌させ、テトラカルボン酸成分をそのまま、または溶媒に分散、或いは溶解させて添加する方法、逆にテトラカルボン酸成分を溶媒に分散、或いは溶解させた溶液にジアミン成分を添加する方法、ジアミン成分とテトラカルボン酸成分とを交互に添加する方法等が挙げられ、これらのいずれの方法を用いてもよい。また、ジアミン成分またはテトラカルボン酸成分を、それぞれ複数種用いて反応させる場合は、あらかじめ混合した状態で反応させてもよく、個別に順次反応させてもよく、さらに個別に反応させた低分子量体を混合反応させて重合体としてもよい。 When reacting the diamine component and the tetracarboxylic acid component in a solvent, any of the following methods may be used: a solution in which the diamine component is dispersed or dissolved in a solvent is stirred, and the tetracarboxylic acid component is added as is or dispersed or dissolved in the solvent; conversely, the diamine component is added to a solution in which the tetracarboxylic acid component is dispersed or dissolved in a solvent; or the diamine component and the tetracarboxylic acid component are added alternately. When reacting multiple diamine components or multiple tetracarboxylic acid components, they may be reacted in a premixed state, or may be reacted individually in sequence, or low molecular weight components that have been reacted individually may be mixed and reacted to form a polymer.

 ジアミン成分とテトラカルボン酸成分とを重縮合させる温度は、-20~150℃の任意の温度を選択することができるが、好ましくは-5~100℃の範囲である。反応は任意の濃度で行うことができるが、濃度が低すぎると高分子量の重合体を得ることが難しくなり、濃度が高すぎると反応液の粘性が高くなり過ぎて均一な撹拌が困難となる。そのため、好ましくは1~50質量%、より好ましくは5~30質量%である。反応初期は高濃度で行い、その後、溶媒を追加することもできる。 The temperature at which the diamine component and the tetracarboxylic acid component are polycondensed can be selected from -20 to 150°C, but is preferably in the range of -5 to 100°C. The reaction can be carried out at any concentration, but if the concentration is too low it becomes difficult to obtain a high molecular weight polymer, and if the concentration is too high the viscosity of the reaction liquid becomes too high, making uniform stirring difficult. For this reason, the concentration is preferably 1 to 50% by mass, and more preferably 5 to 30% by mass. The reaction can be carried out at a high concentration in the early stages, and then solvent can be added.

 ポリイミド前駆体の重合反応においては、ジアミン成分の合計モル数とテトラカルボン酸成分との合計モル数の比は、0.8~1.2であることが好ましい。通常の重縮合反応と同様に、このモル比が1.0に近いほど、生成するポリイミド前駆体の分子量は大きくなる。 In the polymerization reaction of the polyimide precursor, the ratio of the total number of moles of the diamine component to the total number of moles of the tetracarboxylic acid component is preferably 0.8 to 1.2. As with a normal polycondensation reaction, the closer this molar ratio is to 1.0, the higher the molecular weight of the resulting polyimide precursor will be.

 ポリイミドは、上記ポリイミド前駆体を閉環させて得られるポリイミドであり、このポリイミドにおいては、アミド酸基の閉環率(イミド化率ともいう)は、必ずしも100%である必要はなく、用途や目的に応じて任意に調整できる。ポリイミド前駆体をイミド化させる方法としては、ポリイミド前駆体の溶液をそのまま加熱する熱イミド化、またはポリイミド前駆体の溶液に触媒を添加する触媒イミド化が挙げられる。 Polyimide is obtained by ring-closing the polyimide precursor. In this polyimide, the ring-closure rate of the amic acid group (also called the imidization rate) does not necessarily have to be 100% and can be adjusted as desired depending on the application or purpose. Methods for imidizing the polyimide precursor include thermal imidization, in which a solution of the polyimide precursor is heated as is, and catalytic imidization, in which a catalyst is added to a solution of the polyimide precursor.

 ポリイミド前駆体を溶液中で熱イミド化させる場合の温度は、100~400℃、好ましくは120~250℃であり、イミド化反応により生成する水を系外に除きながら行う方法が好ましい。ポリイミド前駆体の触媒イミド化は、ポリイミド前駆体の溶液に、塩基性触媒と酸無水物とを添加し、-20~250℃、好ましくは0~180℃で撹拌することにより行うことができる。 The temperature for thermally imidizing the polyimide precursor in a solution is 100 to 400°C, preferably 120 to 250°C, and it is preferable to carry out the process while removing the water produced by the imidization reaction from the system. Catalytic imidization of the polyimide precursor can be carried out by adding a basic catalyst and an acid anhydride to a solution of the polyimide precursor and stirring at -20 to 250°C, preferably 0 to 180°C.

 塩基性触媒の量は、アミド酸基の0.5~30倍モル、好ましくは2~20倍モルであり、酸無水物の量は、アミド酸基の1~50倍モル、好ましくは3~30倍モルである。塩基性触媒としては、ピリジン、トリエチルアミン、トリメチルアミン、トリブチルアミン、トリオクチルアミン等が挙げられる。なかでも、ピリジンは、反応を進行させるのに適度な塩基性を持つので好ましい。酸無水物としては、無水酢酸、無水トリメリット酸、無水ピロメリット酸等が挙げられる。特に、無水酢酸を用いると反応終了後の精製が容易となるので好ましい。触媒イミド化によるイミド化率は、触媒量と反応温度、反応時間を調節することにより制御することができる。 The amount of the basic catalyst is 0.5 to 30 times the molar amount of the amide acid group, preferably 2 to 20 times the molar amount, and the amount of the acid anhydride is 1 to 50 times the molar amount of the amide acid group, preferably 3 to 30 times the molar amount. Examples of the basic catalyst include pyridine, triethylamine, trimethylamine, tributylamine, trioctylamine, etc. Among them, pyridine is preferred because it has an appropriate basicity for promoting the reaction. Examples of the acid anhydride include acetic anhydride, trimellitic anhydride, pyromellitic anhydride, etc. In particular, the use of acetic anhydride is preferred because it makes purification after the reaction is completed easier. The imidization rate by catalytic imidization can be controlled by adjusting the amount of the catalyst, the reaction temperature, and the reaction time.

 ポリイミド前駆体またはポリイミドの反応溶液から、生成したポリイミド前駆体またはポリイミドを回収する場合には、反応溶液を溶媒に投入して沈殿させればよい。沈殿に用いる溶媒としては、メタノール、エタノール、イソプロピルアルコール、アセトン、ヘキサン、ブチルセルソルブ、ヘプタン、メチルエチルケトン、メチルイソブチルケトン、トルエン、ベンゼン、水等が挙げられる。溶媒に投入して沈殿させたポリマーは、濾過して回収した後、常圧或いは減圧下で、または常温或いは加熱して乾燥することができる。また、沈殿回収した重合体を、溶媒に再溶解させ、再沈殿回収する操作を2~10回繰り返すと、重合体中の不純物を少なくすることができる。この際の溶媒として、例えば、アルコール類、ケトン類、炭化水素等が挙げられる。これら中から選ばれる3種類以上の溶媒を用いると、より一層精製の効率が上がるので好ましい。 When recovering the polyimide precursor or polyimide produced from a reaction solution of a polyimide precursor or polyimide, the reaction solution may be poured into a solvent to cause precipitation. Examples of solvents used for precipitation include methanol, ethanol, isopropyl alcohol, acetone, hexane, butyl cellosolve, heptane, methyl ethyl ketone, methyl isobutyl ketone, toluene, benzene, and water. The polymer precipitated by pouring into a solvent can be recovered by filtration, and then dried at normal or reduced pressure, or at room temperature or by heating. In addition, the polymer precipitated and recovered can be redissolved in a solvent and the reprecipitation and recovery operation repeated 2 to 10 times to reduce impurities in the polymer. Examples of solvents used in this case include alcohols, ketones, and hydrocarbons. It is preferable to use three or more types of solvents selected from these, as this further increases the efficiency of purification.

 本発明のポリアミド酸アルキルエステルを製造するための、より具体的な方法の例をそれぞれ、下記(1)~(3)に示す。 Specific examples of methods for producing the polyamic acid alkyl ester of the present invention are shown below in (1) to (3).

(1)ポリアミド酸のエステル化反応で製造する方法
 この方法は、例えば、ジアミン成分とテトラカルボン酸成分とからポリアミド酸を製造し、そのカルボキシ基(COOH基)に化学反応、すなわちエステル化反応を行い、ポリアミド酸アルキルエステルを製造する方法である。エステル化反応は、ポリアミド酸とエステル化剤を溶媒の存在下で、-20~150℃(好ましくは0~50℃)において、30分~24時間(好ましくは1~4時間)反応させる方法である。
(1) Production method by esterification reaction of polyamic acid This method is a method in which, for example, polyamic acid is produced from a diamine component and a tetracarboxylic acid component, and its carboxyl group (COOH group) is subjected to a chemical reaction, i.e., an esterification reaction, to produce a polyamic acid alkyl ester. The esterification reaction is a method in which a polyamic acid is reacted with an esterifying agent in the presence of a solvent at −20 to 150° C. (preferably 0 to 50° C.) for 30 minutes to 24 hours (preferably 1 to 4 hours).

 上記エステル化剤としては、エステル化反応後に、容易に除去できるものが好ましく、N,N-ジメチルホルムアミドジメチルアセタール、N,N-ジメチルホルムアミドジエチルアセタール、N,N-ジメチルホルムアミドジプロピルアセタール、N,N-ジメチルホルムアミドジネオペンチルブチルアセタール、N,N-ジメチルホルムアミドジ-t-ブチルアセタール、1-メチル-3-p-トリルトリアゼン、1-エチル-3-p-トリルトリアゼン、1-プロピル-3-p-トリルトリアゼン、4-(4,6-ジメトキシ-1,3,5-トリアジン-2-イル)-4-メチルモルホリニウムクロリド等が挙げられる。エステル化剤の使用量は、ポリアミド酸の繰り返し単位1モルに対して、2~6モル当量が好ましい。なかでも、2~4モル当量が好ましい。 The above esterification agent is preferably one that can be easily removed after the esterification reaction, and examples of such agents include N,N-dimethylformamide dimethyl acetal, N,N-dimethylformamide diethyl acetal, N,N-dimethylformamide dipropyl acetal, N,N-dimethylformamide dineopentyl butyl acetal, N,N-dimethylformamide di-t-butyl acetal, 1-methyl-3-p-tolyltriazene, 1-ethyl-3-p-tolyltriazene, 1-propyl-3-p-tolyltriazene, and 4-(4,6-dimethoxy-1,3,5-triazin-2-yl)-4-methylmorpholinium chloride. The amount of the esterification agent used is preferably 2 to 6 molar equivalents per mole of the repeating unit of polyamic acid. Of these, 2 to 4 molar equivalents are preferred.

 上記エステル化反応に用いる溶媒としては、ポリアミド酸の溶媒への溶解性の点から、上記ジアミン成分とテトラカルボン酸成分との反応に用いる溶媒が挙げられる。なかでも、N,N-ジメチルホルムアミド、N,N-ジエチルホルムアミド、N-メチル-2-ピロリドン、N-エチル-2-ピロリドン、N,N-ジメチルアセトアミド、N,N-ジエチルアセトアミド、3-メトキシ-N,N-ジメチルプロパンアミド、またはγ-ブチロラクトンが好ましい。これら溶媒は、1種を単独で用いても、2種以上を混合して用いてもよい。上記エステル化反応における溶媒中のポリアミド酸の濃度は、ポリアミド酸の析出が起こりにくい点から、1~30質量%が好ましい。なかでも、5~20質量%が好ましい。 The solvent used in the esterification reaction may be the same as that used in the reaction between the diamine component and the tetracarboxylic acid component, in terms of the solubility of the polyamic acid in the solvent. Of these, N,N-dimethylformamide, N,N-diethylformamide, N-methyl-2-pyrrolidone, N-ethyl-2-pyrrolidone, N,N-dimethylacetamide, N,N-diethylacetamide, 3-methoxy-N,N-dimethylpropanamide, or γ-butyrolactone is preferred. These solvents may be used alone or in combination of two or more. The concentration of polyamic acid in the solvent in the esterification reaction is preferably 1 to 30% by mass, in terms of the low precipitation of polyamic acid. Of these, 5 to 20% by mass is preferred.

(2)ジアミン成分とテトラカルボン酸ジエステルジクロリドとの反応で製造する方法
 この方法は、例えば、ジアミン成分とテトラカルボン酸ジエステルジクロリドとを、塩基と溶媒の存在下で、-20~150℃(好ましくは0~50℃)において、30分~24時間(好ましくは1~4時間)反応させる方法である。塩基は、ピリジン、トリエチルアミン、4-ジメチルアミノピリジン等を用いることができる。なかでも、反応が穏和に進行するため、ピリジンが好ましい。塩基の使用量は、反応後に、容易に除去できる量が好ましく、テトラカルボン酸ジエステルジクロリドに対して2~4倍モルが好ましく、2~3倍モルがより好ましい。
(2) Method of producing by reaction of diamine component with tetracarboxylic acid diester dichloride In this method, for example, a diamine component and a tetracarboxylic acid diester dichloride are reacted in the presence of a base and a solvent at −20 to 150° C. (preferably 0 to 50° C.) for 30 minutes to 24 hours (preferably 1 to 4 hours). As the base, pyridine, triethylamine, 4-dimethylaminopyridine, etc. can be used. Among them, pyridine is preferred because the reaction proceeds mildly. The amount of the base used is preferably an amount that can be easily removed after the reaction, and is preferably 2 to 4 times the mol of the tetracarboxylic acid diester dichloride, and more preferably 2 to 3 times the mol.

 溶媒には、得られる重合体、すなわちポリアミド酸アルキルエステルの溶媒への溶解性の点から、上記ジアミン成分とテトラカルボン酸成分との反応に用いる溶媒が挙げられる。なかでも、N,N-ジメチルホルムアミド、N,N-ジエチルホルムアミド、N-メチル-2-ピロリドン、N-エチル-2-ピロリドン、N,N-ジメチルアセトアミド、N,N-ジエチルアセトアミド、3-メトキシ-N,N-ジメチルプロパンアミド、またはγ-ブチロラクトン、が好ましい。これらの溶媒は、1種を単独で用いても、2種以上を混合して用いてもよい。 The solvent may be any of the solvents used in the reaction between the diamine component and the tetracarboxylic acid component, from the viewpoint of the solubility of the resulting polymer, i.e., the polyamic acid alkyl ester, in the solvent. Among these, N,N-dimethylformamide, N,N-diethylformamide, N-methyl-2-pyrrolidone, N-ethyl-2-pyrrolidone, N,N-dimethylacetamide, N,N-diethylacetamide, 3-methoxy-N,N-dimethylpropanamide, or γ-butyrolactone is preferred. These solvents may be used alone or in combination of two or more.

 反応における溶媒中のポリアミド酸アルキルエステルの濃度は、ポリアミド酸アルキルエステルの析出が起こりにくい点から、1~30質量%が好ましい。なかでも、5~20質量%が好ましい。また、テトラカルボン酸ジエステルジクロリドの加水分解を防ぐため、ポリアミド酸アルキルエステルの作製に用いる溶媒は、できるだけ脱水されていることが好ましい。さらに、反応は窒素雰囲気中で行い、外気の混入を防ぐのが好ましい。 The concentration of the polyamic acid alkyl ester in the solvent in the reaction is preferably 1 to 30% by mass, since precipitation of the polyamic acid alkyl ester is unlikely to occur. Of these, 5 to 20% by mass is preferable. In addition, in order to prevent hydrolysis of the tetracarboxylic acid diester dichloride, it is preferable that the solvent used to prepare the polyamic acid alkyl ester is as dehydrated as possible. Furthermore, it is preferable to carry out the reaction in a nitrogen atmosphere to prevent the inclusion of outside air.

(3)ジアミン成分とテトラカルボン酸ジエステルとの反応で製造する方法
 この方法は、例えば、ジアミン成分とテトラカルボン酸ジエステルとを、縮合剤、塩基および溶媒の存在下で、0~150℃(好ましくは0~100℃)において、30分~24時間(好ましくは3~15時間)重縮合反応させる方法である。
(3) Production method by reaction of a diamine component with a tetracarboxylic acid diester This method is, for example, a method in which a diamine component and a tetracarboxylic acid diester are subjected to a polycondensation reaction in the presence of a condensing agent, a base and a solvent at 0 to 150° C. (preferably 0 to 100° C.) for 30 minutes to 24 hours (preferably 3 to 15 hours).

 縮合剤には、トリフェニルホスファイト、ジシクロヘキシルカルボジイミド、1-エチル-3-(3-ジメチルアミノプロピル)カルボジイミド塩酸塩、N,N’-カルボニルジイミダゾール、ジメトキシ-1,3,5-トリアジニルメチルモルホリニウム、O-(ベンゾトリアゾール-1-イル)-N,N,N’,N’-テトラメチルウロニウムテトラフルオロボラート、O-(ベンゾトリアゾール-1-イル)-N,N,N’,N’-テトラメチルウロニウムヘキサフルオロホスファート、(2,3-ジヒドロ-2-チオキソ-3-ベンゾオキサゾリル)ホスホン酸ジフェニル等を用いることができる。縮合剤の使用量は、テトラカルボン酸ジエステルに対して、2~3倍モルが好ましく、特に、2~2.5倍モルが好ましい。 Condensing agents that can be used include triphenyl phosphite, dicyclohexylcarbodiimide, 1-ethyl-3-(3-dimethylaminopropyl)carbodiimide hydrochloride, N,N'-carbonyldiimidazole, dimethoxy-1,3,5-triazinylmethylmorpholinium, O-(benzotriazol-1-yl)-N,N,N',N'-tetramethyluronium tetrafluoroborate, O-(benzotriazol-1-yl)-N,N,N',N'-tetramethyluronium hexafluorophosphate, and (2,3-dihydro-2-thioxo-3-benzoxazolyl)diphenylphosphonate. The amount of the condensing agent used is preferably 2 to 3 times the molar amount of the tetracarboxylic acid diester, and more preferably 2 to 2.5 times the molar amount.

 塩基には、ピリジン、トリエチルアミン等の3級アミンを用いることができる。塩基の使用量は、重縮合反応後に、容易に除去できる量が好ましく、ジアミン成分に対して、2~4倍モルが好ましく、2~3倍モルがより好ましい。重縮合反応に用いる溶媒は、得られる重合体、すなわち、ポリアミド酸アルキルエステルの溶媒への溶解性の点から、上記ジアミン成分とテトラカルボン酸成分との反応に用いる溶媒が挙げられる。なかでも、N,N-ジメチルホルムアミド、N-メチル-2-ピロリドン、N-エチル-2-ピロリドンまたはγ-ブチロラクトンが好ましい。これら溶媒は、1種を単独で用いても、2種以上を混合して用いてもよい。 The base may be a tertiary amine such as pyridine or triethylamine. The amount of base used is preferably an amount that can be easily removed after the polycondensation reaction, and is preferably 2 to 4 times by mole, more preferably 2 to 3 times by mole, relative to the diamine component. From the viewpoint of the solubility of the resulting polymer, i.e., polyamic acid alkyl ester, in the solvent, the solvent used in the polycondensation reaction may be the solvent used in the reaction of the diamine component and the tetracarboxylic acid component. Among these, N,N-dimethylformamide, N-methyl-2-pyrrolidone, N-ethyl-2-pyrrolidone, or γ-butyrolactone is preferred. These solvents may be used alone or in combination of two or more.

 また、重縮合反応においては、ルイス酸を添加剤として加えることで、反応が効率的に進行する。ルイス酸としては、塩化リチウム、臭化リチウム等のハロゲン化リチウムが好ましい。ルイス酸の使用量は、ジアミン成分に対して、0.1~10倍モルが好ましい。なかでも、2.0~3.0倍モルが好ましい。 In addition, in the polycondensation reaction, the reaction proceeds more efficiently by adding a Lewis acid as an additive. As the Lewis acid, lithium halides such as lithium chloride and lithium bromide are preferred. The amount of Lewis acid used is preferably 0.1 to 10 times the molar amount of the diamine component. Of these, 2.0 to 3.0 times the molar amount is preferred.

 上記(1)~(3)の手法で得られたポリアミド酸アルキルエステルの溶液から、ポリアミド酸アルキルエステルを回収する場合には、反応溶液を溶媒に投入して沈殿させればよい。沈殿に用いる溶媒としては、水、メタノール、エタノール、2-プロパノール、ヘキサン、ブチルセロソルブ、アセトン、トルエン等が挙げられる。溶媒に投入して沈殿させた重合体は、上記で使用した添加剤、触媒類を除去することを目的に、上記溶媒で、複数回洗浄操作を行うことが好ましい。洗浄し、ろ過して回収した後、重合体は常圧或いは減圧下、または常温或いは加熱して乾燥することができる。また、沈殿回収した重合体を、溶媒に再溶解させ、再沈殿回収する操作を2~10回繰り返すことにより、重合体中の不純物を少なくすることができる。ポリアミド酸アルキルエステルは、上記(2)または(3)の製造方法が好ましい。 When recovering a polyamic acid alkyl ester from a solution of the polyamic acid alkyl ester obtained by the above methods (1) to (3), the reaction solution may be poured into a solvent to cause precipitation. Examples of the solvent used for precipitation include water, methanol, ethanol, 2-propanol, hexane, butyl cellosolve, acetone, and toluene. The polymer precipitated by pouring into the solvent is preferably washed multiple times with the above solvent in order to remove the additives and catalysts used above. After washing and filtration and recovery, the polymer can be dried under normal or reduced pressure, or at normal temperature or by heating. In addition, the polymer precipitated and recovered can be redissolved in a solvent and the reprecipitation and recovery operation repeated 2 to 10 times to reduce impurities in the polymer. The polyamic acid alkyl ester is preferably produced by the above method (2) or (3).

<その他の電荷輸送性物質>
 本発明の電荷輸送性組成物には、電荷輸送層の電荷輸送能を調整する目的で、ポリチオフェンやポリアニリン等の導電性高分子を含有してもよい。
<Other charge transporting substances>
The charge transporting composition of the present invention may contain a conductive polymer such as polythiophene or polyaniline for the purpose of adjusting the charge transporting ability of the charge transport layer.

[電子受容性ドーパント物質]
 本発明の電荷輸送性組成物においては、得られる薄膜の用途に応じ、そのイオン化ポテンシャルの調節や電荷輸送能の向上等を目的として電子受容性ドーパント物質(以下、単に「ドーパント物質」と表記することもある。)を含んでいてもよい。
 ドーパント物質としては、電荷輸送性組成物に使用する少なくとも一種の溶媒に溶解するものであれば特に限定されず、無機系のドーパント物質、有機系のドーパント物質のいずれも使用できる。
[Electron-accepting dopant material]
The charge transport composition of the present invention may contain an electron-accepting dopant substance (hereinafter, sometimes simply referred to as a "dopant substance") for the purpose of adjusting the ionization potential or improving the charge transport ability, depending on the application of the resulting thin film.
There are no particular limitations on the dopant substance, so long as it dissolves in at least one solvent used in the charge transporting composition, and both inorganic and organic dopant substances can be used.

 無機系のドーパント物質としては、ヘテロポリ酸が好ましく、その具体例としては、リンモリブデン酸、ケイモリブデン酸、リンタングステン酸、リンタングストモリブデン酸、ケイタングステン酸等が挙げられる。 As inorganic dopant substances, heteropolyacids are preferred, and specific examples include phosphomolybdic acid, silicomolybdic acid, phosphotungstic acid, phosphotungstomolybdic acid, and silicotungstic acid.

 ヘテロポリ酸とは、代表的に式(D1)で示されるKeggin型あるいは式(D2)で示されるDawson型の化学構造で示される、ヘテロ原子が分子の中心に位置する構造を有し、バナジウム(V)、モリブデン(Mo)、タングステン(W)等の酸素酸であるイソポリ酸と、異種元素の酸素酸とが縮合してなるポリ酸である。このような異種元素の酸素酸としては、主にケイ素(Si)、リン(P)、ヒ素(As)の酸素酸が挙げられる。 Heteropolyacids are polyacids formed by condensing isopolyacids, which are oxyacids of vanadium (V), molybdenum (Mo), tungsten (W), etc., with oxyacids of different elements, and have a structure in which a heteroatom is located at the center of the molecule, typically represented by the chemical structure of the Keggin type shown in formula (D1) or the Dawson type shown in formula (D2). Examples of oxyacids of different elements include oxyacids of silicon (Si), phosphorus (P), and arsenic (As).

Figure JPOXMLDOC01-appb-C000052
Figure JPOXMLDOC01-appb-C000052

 ヘテロポリ酸の具体例としては、リンモリブデン酸、ケイモリブデン酸、リンタングステン酸、ケイタングステン酸、リンタングストモリブデン酸等が挙げられ、これらは単独で用いてもよく、2種以上組み合わせて用いてもよい。なお、本発明で用いるヘテロポリ酸は、市販品として入手可能であり、また、公知の方法により合成することもできる。
 特に、1種類のヘテロポリ酸を用いる場合、その1種類のヘテロポリ酸は、リンタングステン酸またはリンモリブデン酸が好ましく、リンタングステン酸が最適である。また、2種類以上のヘテロポリ酸を用いる場合、その2種類以上のヘテロポリ酸の1つは、リンタングステン酸またはリンモリブデン酸が好ましく、リンタングステン酸がより好ましい。
Specific examples of heteropolyacids include phosphomolybdic acid, silicomolybdic acid, phosphotungstic acid, silicotungstic acid, phosphotungstomolybdic acid, etc., which may be used alone or in combination of two or more. The heteropolyacids used in the present invention are commercially available, or may be synthesized by known methods.
In particular, when one type of heteropolyacid is used, the one type of heteropolyacid is preferably phosphotungstic acid or phosphomolybdic acid, and most preferably phosphotungstic acid. When two or more types of heteropolyacids are used, one of the two or more types of heteropolyacids is preferably phosphotungstic acid or phosphomolybdic acid, and more preferably phosphotungstic acid.

 なお、ヘテロポリ酸は、元素分析等の定量分析において、一般式で示される構造から元素の数が多いもの、または少ないものであっても、それが市販品として入手したもの、あるいは、公知の合成方法にしたがって適切に合成したものである限り、本発明において用いることができる。 Heteropolyacids can be used in the present invention regardless of whether they contain a large or small number of elements in the structure represented by the general formula in quantitative analysis such as elemental analysis, as long as they are commercially available products or have been appropriately synthesized according to known synthesis methods.

 すなわち、例えば、一般的には、リンタングステン酸は化学式H3(PW1240)・nH2Oで、リンモリブデン酸は化学式H3(PMo1240)・nH2Oでそれぞれ示されるが、定量分析において、この式中のP(リン)、O(酸素)またはW(タングステン)もしくはMo(モリブデン)の数が多いもの、または少ないものであっても、それが市販品として入手したもの、あるいは、公知の合成方法にしたがって適切に合成したものである限り、本発明において用いることができる。この場合、本発明に規定されるヘテロポリ酸の質量とは、合成物や市販品中における純粋なリンタングステン酸の質量(リンタングステン酸含量)ではなく、市販品として入手可能な形態および公知の合成法にて単離可能な形態において、水和水やその他の不純物等を含んだ状態での全質量を意味する。 That is, for example, phosphotungstic acid is generally represented by the chemical formula H3 ( PW12O40 ) nH2O , and phosphomolybdic acid is represented by the chemical formula H3 ( PMo12O40 ) nH2O , but in quantitative analysis, even if the number of P (phosphorus), O (oxygen), W (tungsten), or Mo (molybdenum) in this formula is large or small, they can be used in the present invention as long as they are commercially available or appropriately synthesized according to a known synthesis method. In this case, the mass of the heteropolyacid specified in the present invention does not mean the mass of pure phosphotungstic acid (phosphotungstic acid content) in a synthesized product or a commercially available product, but means the total mass in a state including hydration water and other impurities in a form available as a commercially available product or in a form that can be isolated by a known synthesis method.

 本発明の電荷輸送性組成物にヘテロポリ酸が含まれる場合、その含有量は、質量比で、電荷輸送性物質1に対して0.001~50程度とすることが好ましく、より好ましくは0.05~10程度、より一層好ましくは0.1~5.0程度である。 When the charge transport composition of the present invention contains a heteropolyacid, the content is preferably about 0.001 to 50 parts by mass per 1 part of the charge transport substance, more preferably about 0.05 to 10 parts, and even more preferably about 0.1 to 5.0 parts.

 また、有機系のドーパント物質としては、アリールスルホン酸、アリールスルホン酸エステル、所定のアニオンとその対カチオンとからなるイオン化合物、後述の式(Bo1)で表されるボラン化合物、テトラシアノキノジメタン誘導体やベンゾキノン誘導体等が挙げられる。本発明では、上記特定重合体に対するドープのしやすさを考慮すると、イオン化合物を好適に使用することができる。 Also, examples of organic dopant substances include arylsulfonic acid, arylsulfonic acid esters, ionic compounds consisting of a specific anion and its counter cation, borane compounds represented by the formula (Bo1) described below, tetracyanoquinodimethane derivatives, and benzoquinone derivatives. In the present invention, ionic compounds can be preferably used in view of the ease of doping the specific polymer.

 アリールスルホン酸としては下記式(As1)で表される化合物を好適に使用し得る。 As the arylsulfonic acid, a compound represented by the following formula (As1) can be preferably used.

Figure JPOXMLDOC01-appb-C000053
(式中、D1は、ナフタレン環またはアントラセン環を表し、D2は、2~4価のパーフルオロビフェニル基を表し、j1は、D1に結合するスルホン酸基数を表し、1≦j1≦4を満たす整数であり、j2は、D2と酸素原子との結合数を示し、2~4を満たす整数である。)
Figure JPOXMLDOC01-appb-C000053
(In the formula, D1 represents a naphthalene ring or an anthracene ring, D2 represents a divalent to tetravalent perfluorobiphenyl group, j1 represents the number of sulfonic acid groups bonded to D1 and is an integer satisfying 1≦ j1 ≦4, and j2 represents the number of bonds between D2 and oxygen atoms and is an integer satisfying 2 to 4.)

 本発明において、好適に用いることができるアリールスルホン酸の例としては、下記式(As1-1)で表される化合物が挙げられる。 An example of an arylsulfonic acid that can be suitably used in the present invention is the compound represented by the following formula (As1-1).

Figure JPOXMLDOC01-appb-C000054
Figure JPOXMLDOC01-appb-C000054

 式(As1)で表されるアリールスルホン酸は、公知の方法により合成することができ、例えば、国際公開第2006/025342号に記載の方法により合成することができる。 The arylsulfonic acid represented by formula (As1) can be synthesized by known methods, for example, by the method described in WO 2006/025342.

 本発明の電荷輸送性組成物にアリールスルホン酸が含まれる場合、その含有量は、質量比で、電荷輸送性物質1に対し、好ましくは0.001~50程度、より好ましくは0.05~10程度、更に好ましくは0.1~5である。 When the charge transport composition of the present invention contains an arylsulfonic acid, the content thereof is preferably about 0.001 to 50 parts by mass, more preferably about 0.05 to 10 parts by mass, and even more preferably 0.1 to 5 parts by mass, per 1 part of the charge transport substance.

 イオン化合物としては、下記式(An1)またはZaで表されるアニオンと、その対カチオンとからなる金属塩やオニウム塩を挙げることができる。 Examples of the ionic compound include metal salts and onium salts composed of an anion represented by the following formula (An1) or Za and its counter cation.

Figure JPOXMLDOC01-appb-C000055
(式中、Eは長周期型周期表の第13族に属する元素を表し、Ara1~Ara4は、互いに独立して、置換基を有してもよい芳香族炭化水素基または置換基を有してもよい芳香族複素環基を表す。)
Figure JPOXMLDOC01-appb-C000055
(In the formula, E represents an element belonging to Group 13 of the long form periodic table, and Ar a1 to Ar a4 each independently represent an aromatic hydrocarbon group which may have a substituent or an aromatic heterocyclic group which may have a substituent.)

 式(An1)中、Eは長周期型周期表の第13族に属する元素の中でもホウ素、ガリウムが好ましく、ホウ素がより好ましい。 In formula (An1), E is preferably boron or gallium, among the elements belonging to Group 13 of the long-form periodic table, and more preferably boron.

 式(An1)中、芳香族炭化水素基、芳香族複素環基の例示としては、5または6員環の単環または2~4縮合環由来の1価の基が挙げられる。中でも、化合物の安定性、耐熱性の点から、ベンゼン環、ナフタレン環、ピリジン環、ピラジン環、ピリダジン環、ピリミジン環、トリアジン環、キノリン環、イソキノリン環由来の1価の基が好ましい。
 更に、Ara1~Ara4のうち少なくとも1つの基が、フッ素原子または塩素原子を置換基として1つまたは2つ以上有することがより好ましい。特に、Ara1~Ara4の水素原子がすべてフッ素原子で置換されたパーフルオロアリール基であることが最も好ましい。パーフルオロアリール基の具体例としては、ペンタフルオロフェニル基、ヘプタフルオロ-2-ナフチル基、テトラフルオロ-4-ピリジル基等が挙げられる。
In formula (An1), examples of the aromatic hydrocarbon group and aromatic heterocyclic group include monovalent groups derived from a 5- or 6-membered monocycle or 2- to 4-condensed rings. Among these, from the viewpoints of the stability and heat resistance of the compound, monovalent groups derived from a benzene ring, a naphthalene ring, a pyridine ring, a pyrazine ring, a pyridazine ring, a pyrimidine ring, a triazine ring, a quinoline ring, and an isoquinoline ring are preferred.
Furthermore, it is more preferable that at least one of the groups Ar a1 to Ar a4 has one or more fluorine or chlorine atoms as a substituent. In particular, it is most preferable that Ar a1 to Ar a4 are perfluoroaryl groups in which all of the hydrogen atoms are substituted with fluorine atoms. Specific examples of perfluoroaryl groups include pentafluorophenyl, heptafluoro-2-naphthyl, and tetrafluoro-4-pyridyl groups.

 Zaとしては、下記式(An2)で表されるイオン、水酸化物イオン、フッ化物イオン、塩化物イオン、臭化物イオン、ヨウ化物イオン、シアン化物イオン、硝酸イオン、亜硝酸イオン、硫酸イオン、亜硫酸イオン、過塩素酸イオン、過臭素酸イオン、過ヨウ素酸イオン、塩素酸イオン、亜塩素酸イオン、次亜塩素酸イオン、リン酸イオン、亜リン酸イオン、次亜リン酸イオン、ホウ酸イオン、イソシアン酸イオン、水硫化物イオン、テトラフルオロホウ酸イオン、ヘキサフルオロリン酸イオン、ヘキサクロロアンチモン酸イオン;酢酸イオン、トリフルオロ酢酸イオン、安息香酸イオン等のカルボン酸イオン;メタンスルホン酸、トリフルオロメタンスルホン酸イオン等のスルホン酸イオン;メトキシイオン、t-ブトキシイオン等のアルコキシイオンなどが挙げられる。 Examples of Z a include an ion represented by the following formula (An2), a hydroxide ion, a fluoride ion, a chloride ion, a bromide ion, an iodide ion, a cyanide ion, a nitrate ion, a nitrite ion, a sulfate ion, a sulfite ion, a perchlorate ion, a perbromate ion, a periodate ion, a chlorate ion, a chlorite ion, a hypochlorite ion, a phosphate ion, a phosphite ion, a hypophosphite ion, a borate ion, an isocyanate ion, a hydrosulfide ion, a tetrafluoroborate ion, a hexafluorophosphate ion, and a hexachloroantimonate ion; a carboxylate ion such as an acetate ion, a trifluoroacetate ion, and a benzoate ion; a sulfonate ion such as a methanesulfonic acid ion and a trifluoromethanesulfonate ion; and an alkoxy ion such as a methoxy ion and a t-butoxy ion.

Figure JPOXMLDOC01-appb-C000056
(式中、E2は、長周期型周期表の第15族に属する元素を表し、Xn1は、フッ素原子、塩素原子、臭素原子などのハロゲン原子を表す。)
Figure JPOXMLDOC01-appb-C000056
(In the formula, E2 represents an element belonging to Group 15 of the long form periodic table, and Xn1 represents a halogen atom such as a fluorine atom, a chlorine atom, or a bromine atom.)

 式(An2)中、E2は、リン原子、ヒ素原子、アンチモン原子が好ましく、化合物の安定性、合成および精製のし易さ、毒性の点から、リン原子が好ましい。
 Xn1は化合物の安定性、合成および精製のし易さの点からフッ素原子、塩素原子であることが好ましく、フッ素原子であることが最も好ましい。
In formula (An2), E2 is preferably a phosphorus atom, an arsenic atom, or an antimony atom, and from the standpoint of compound stability, ease of synthesis and purification, and toxicity, a phosphorus atom is preferred.
From the standpoint of compound stability and ease of synthesis and purification, X n1 is preferably a fluorine atom or a chlorine atom, and most preferably a fluorine atom.

 一方、対カチオンとしては、金属イオンおよびオニウムイオンを好適に用いることができる。
 上記金属イオンとしては、1価の金属イオンが好ましく、Li+、Na+、K+およびAg+等が挙げられるが、特に、Ag+が好ましい。
 上記オニウムイオンとしては、ヨードニウムイオン、スルホニウムイオン、アンモニウムイオンおよびホスホニウムイオン等が挙げられるが、特に、下記式(Ct1)で表されるヨードニウムイオンが好ましい。
On the other hand, as the counter cation, a metal ion or an onium ion can be suitably used.
The metal ion is preferably a monovalent metal ion, such as Li + , Na + , K + or Ag + , with Ag + being particularly preferred.
Examples of the onium ion include an iodonium ion, a sulfonium ion, an ammonium ion, and a phosphonium ion. In particular, an iodonium ion represented by the following formula (Ct1) is preferred.

Figure JPOXMLDOC01-appb-C000057
Figure JPOXMLDOC01-appb-C000057

 式(Ct1)中、R101およびR102は、互いに独立して、炭素数1~12のアルキル基、炭素数2~12のアルケニル基、炭素数2~12のアルキニル基、炭素数6~20のアリール基または炭素数2~20のヘテロアリール基を表し、ハロゲン原子、シアノ基、ニトロ基、炭素数1~12のアルキル基、炭素数2~12のアルケニル基、炭素数2~12のアルキニル基、炭素数6~20のアリール基または炭素数2~20のヘテロアリール基で置換されていてもよい。 In formula (Ct1), R 101 and R 102 each independently represent an alkyl group having 1 to 12 carbon atoms, an alkenyl group having 2 to 12 carbon atoms, an alkynyl group having 2 to 12 carbon atoms, an aryl group having 6 to 20 carbon atoms, or a heteroaryl group having 2 to 20 carbon atoms, which may be substituted with a halogen atom, a cyano group, a nitro group, an alkyl group having 1 to 12 carbon atoms, an alkenyl group having 2 to 12 carbon atoms, an alkynyl group having 2 to 12 carbon atoms, an aryl group having 6 to 20 carbon atoms, or a heteroaryl group having 2 to 20 carbon atoms.

 対カチオンとしては、更に下記式(Ct1’)で表されるイオンを用いることもできる。 As the counter cation, an ion represented by the following formula (Ct1') can also be used.

Figure JPOXMLDOC01-appb-C000058
Figure JPOXMLDOC01-appb-C000058

 式(Ct1’)中、A4は、周期表第3周期以降(第3~第6周期)の元素であって、長周期型周期表の第16族に属する元素を表す。本発明では、これらの中でも、電子受容性および入手容易性の観点から、周期表の第5周期以前(第3~第5周期)の元素が好ましい。即ち、A4としては、硫黄原子、セレン原子およびテルル原子のいずれかが好ましく、硫黄原子がより好ましい。 In formula (Ct1'), A 4 represents an element in the third period or later (third to sixth periods) of the periodic table, and an element belonging to group 16 of the long-form periodic table. Among these, in the present invention, from the viewpoints of electron accepting property and easy availability, an element in the fifth period or earlier (third to fifth periods) of the periodic table is preferred. That is, A 4 is preferably any one of a sulfur atom, a selenium atom, and a tellurium atom, and more preferably a sulfur atom.

 R103は、A4と炭素原子で結合する有機基を表し、R104およびR105は、互いに独立して、任意の置換基を表す。R103~R105のうち隣接する2以上の基が互いに結合して環を形成していてもよい。 R 103 represents an organic group bonded to A 4 via a carbon atom, and R 104 and R 105 each independently represent any substituent. Two or more adjacent groups among R 103 to R 105 may be bonded to each other to form a ring.

 R103は、A4との結合部分に炭素原子を有する有機基であれば、本発明の趣旨に反しない限り、その種類は特に限定されない。R103の分子量は、それぞれ、その置換基を含めた値で通常1,000以下、好ましくは500以下の範囲である。R103の好ましい例としては、正電荷を非局在化させる点から、アルキル基、アルケニル基、アルキニル基、芳香族炭化水素基および芳香族複素環基が挙げられる。中でも、正電荷を非局在化させるとともに熱的に安定であることから、芳香族炭化水素または芳香族複素環基が好ましい。 R 103 is not particularly limited in type as long as it is an organic group having a carbon atom at the bonding portion with A 4 , as long as it does not go against the spirit of the present invention. The molecular weight of R 103 , including its substituent, is usually 1,000 or less, preferably 500 or less. Preferred examples of R 103 include alkyl groups, alkenyl groups, alkynyl groups, aromatic hydrocarbon groups, and aromatic heterocyclic groups, from the viewpoint of delocalizing the positive charge. Among them, aromatic hydrocarbons or aromatic heterocyclic groups are preferred, since they delocalize the positive charge and are thermally stable.

 芳香族炭化水素基としては、5または6員環の単環または2~5縮合環由来の1価の基であり、正電荷を当該基上により非局在化させられる基が挙げられる。その具体例としては、ベンゼン環、ナフタレン環、アントラセン環、フェナントレン環、ペリレン環、テトラセン環、ピレン環、ベンズピレン環、クリセン環、トリフェニレン環、アセナフテン環およびフルオレン環等に由来する一価の基が挙げられる。より具体的には、フェニル基、トリル基、1-ナフチル基、2-ナフチル基、1-アントリル基、2-アントリル基、9-アントリル基、1-フェナントリル基、2-フェナントリル基、3-フェナントリル基、4-フェナントリル基、9-フェナントリル基等が挙げられ、フェニル基およびトリル基が好ましく、トリル基がより好ましい。 Aromatic hydrocarbon groups are monovalent groups derived from a 5- or 6-membered single ring or 2- to 5-condensed rings, and can delocalize a positive charge on the group. Specific examples include monovalent groups derived from a benzene ring, a naphthalene ring, an anthracene ring, a phenanthrene ring, a perylene ring, a tetracene ring, a pyrene ring, a benzpyrene ring, a chrysene ring, a triphenylene ring, an acenaphthene ring, and a fluorene ring. More specific examples include a phenyl group, a tolyl group, a 1-naphthyl group, a 2-naphthyl group, a 1-anthryl group, a 2-anthryl group, a 9-anthryl group, a 1-phenanthryl group, a 2-phenanthryl group, a 3-phenanthryl group, a 4-phenanthryl group, and a 9-phenanthryl group, with the phenyl group and the tolyl group being preferred, and the tolyl group being more preferred.

 芳香族複素環基としては、5または6員環の単環または2~4縮合環由来の1価の基であり、正電荷を当該基上に非局在化させられる基が挙げられる。その具体例としては、フラン環、ベンゾフラン環、チオフェン環、ベンゾチオフェン環、ピロール環、ピラゾール環、トリアゾール環、イミダゾール環、オキサジアゾール環、インドール環、カルバゾール環、ピロロイミダゾール環、ピロロピラゾール環、ピロロピロール環、チエノピロール環、チエノチオフェン環、フロピロール環、フロフラン環、チエノフラン環、ベンゾイソオキサゾール環、ベンゾイソチアゾール環、ベンゾイミダゾール環、ピリジン環、ピラジン環、ピリダジン環、ピリミジン環、トリアジン環、キノリン環、イソキノリン環、シノリン環、キノキサリン環、フェナントリジン環、ベンゾイミダゾール環、ピリミジン環、キナゾリン環、キナゾリノン環およびアズレン環等に由来する一価の基が挙げられる。 Aromatic heterocyclic groups include monovalent groups derived from a 5- or 6-membered single ring or 2-4 condensed rings, and groups that can delocalize a positive charge on the group. Specific examples of such rings include monovalent groups derived from a furan ring, a benzofuran ring, a thiophene ring, a benzothiophene ring, a pyrrole ring, a pyrazole ring, a triazole ring, an imidazole ring, an oxadiazole ring, an indole ring, a carbazole ring, a pyrroloimidazole ring, a pyrrolopyrazole ring, a pyrrolopyrrole ring, a thienopyrrole ring, a thienothiophene ring, a furopyrrole ring, a furofuran ring, a thienofuran ring, a benzisoxazole ring, a benzisothiazole ring, a benzimidazole ring, a pyridine ring, a pyrazine ring, a pyridazine ring, a pyrimidine ring, a triazine ring, a quinoline ring, an isoquinoline ring, a cinnoline ring, a quinoxaline ring, a phenanthridine ring, a benzimidazole ring, a pyrimidine ring, a quinazoline ring, a quinazolinone ring, and an azulene ring.

 アルキル基としては、直鎖状、分岐鎖状または環状のいずれでもよく、その炭素数が通常1以上、また、通常12以下、好ましくは6以下のものが挙げられる。具体例としては、メチル基、エチル基、n-プロピル基、2-プロピル基、n-ブチル基、イソブチル基、tert-ブチル基およびシクロヘキシル基等が挙げられる。 The alkyl group may be linear, branched or cyclic, and typically has 1 or more carbon atoms and typically has 12 or less, preferably 6 or less. Specific examples include methyl, ethyl, n-propyl, 2-propyl, n-butyl, isobutyl, tert-butyl and cyclohexyl groups.

 アルケニル基としては、炭素数が通常2以上、通常12以下、好ましくは6以下のものが挙げられる。具体例としては、ビニル基、アリル基および1-ブテニル基等が挙げられる。 The alkenyl group typically has 2 or more carbon atoms, and typically has 12 or less carbon atoms, and preferably has 6 or less carbon atoms. Specific examples include vinyl groups, allyl groups, and 1-butenyl groups.

 アルキニル基としては、炭素数が通常2以上、通常12以下、好ましくは6以下のものが挙げられる。具体例としては、エチニル基およびプロパルギル基等が挙げられる。 Alkynyl groups generally have 2 or more carbon atoms, and generally 12 or less, preferably 6 or less. Specific examples include ethynyl and propargyl groups.

 R104およびR105は、本発明の趣旨に反しない限り特に限定されない。R104およびR105の分子量はそれぞれ、その置換基を含めた値で、通常1,000以下、好ましくは500以下の範囲である。R104およびR105の例としては、アルキル基、アルケニル基、アルキニル基、芳香族炭化水素基、芳香族複素環基、アミノ基、アルコキシ基、アリールオキシ基、アシル基、アルコキシカルボニル基、アリールオキシカルボニル基、アルキルカルボニルオキシ基、アルキルチオ基、アリールチオ基、スルホニル基、アルキルスルホニル基、アリールスルホニル基、シアノ基、ヒドロキシ基、チオール基およびシリル基等が挙げられる。中でも、R103と同様、電子受容性が大きい点から、A4との結合部分に炭素原子を有する有機基が好ましく、例えば、アルキル基、アルケニル基、アルキニル基、芳香族炭化水素基および芳香族複素環基が好ましい。特に、電子受容性が大きいとともに熱的に安定であることから、芳香族炭化水素基または芳香族複素環基が好ましい。 R 104 and R 105 are not particularly limited as long as they are not contrary to the gist of the present invention. The molecular weight of R 104 and R 105 , including the value of its substituent, is usually 1,000 or less, preferably 500 or less. Examples of R 104 and R 105 include an alkyl group, an alkenyl group, an alkynyl group, an aromatic hydrocarbon group, an aromatic heterocyclic group, an amino group, an alkoxy group, an aryloxy group, an acyl group, an alkoxycarbonyl group, an aryloxycarbonyl group, an alkylcarbonyloxy group, an alkylthio group, an arylthio group, a sulfonyl group, an alkylsulfonyl group, an arylsulfonyl group, a cyano group, a hydroxyl group, a thiol group, and a silyl group. Among them, an organic group having a carbon atom at the bond portion with A 4 is preferred from the viewpoint of high electron accepting property, similar to R 103 , and for example, an alkyl group, an alkenyl group, an alkynyl group, an aromatic hydrocarbon group, and an aromatic heterocyclic group are preferred. In particular, aromatic hydrocarbon groups and aromatic heterocyclic groups are preferred because they have a large electron-accepting ability and are thermally stable.

 アルキル基、アルケニル基、アルキニル基、芳香族炭化水素基および芳香族複素環基としては、R103について先に説明したものと同様のものが挙げられる。 Examples of the alkyl group, alkenyl group, alkynyl group, aromatic hydrocarbon group and aromatic heterocyclic group include those described above for R 103 .

 アミノ基としては、アルキルアミノ基、アリールアミノ基およびアシルアミノ基等が挙げられる。アルキルアミノ基としては、炭素数が通常1以上、また、通常12以下、好ましくは6以下のアルキル基を1つ以上有するアルキルアミノ基が挙げられる。具体例としては、メチルアミノ基、ジメチルアミノ基、ジエチルアミノ基およびジベンジルアミノ基等が挙げられる。 Examples of the amino group include an alkylamino group, an arylamino group, and an acylamino group. Examples of the alkylamino group include an alkylamino group having one or more alkyl groups, usually having one or more carbon atoms and usually having 12 or less, preferably 6 or less. Specific examples include a methylamino group, a dimethylamino group, a diethylamino group, and a dibenzylamino group.

 アリールアミノ基としては、炭素数が通常3以上、好ましくは4以上、また、通常25以下、好ましくは15以下の芳香族炭化水素基または芳香族複素環基を1つ以上有するアリールアミノ基が挙げられる。具体例としては、フェニルアミノ基、ジフェニルアミノ基、トリルアミノ基、ピリジルアミノ基およびチエニルアミノ基等が挙げられる。 Arylamino groups include arylamino groups having one or more aromatic hydrocarbon groups or aromatic heterocyclic groups, each of which usually has 3 or more carbon atoms, preferably 4 or more carbon atoms, and usually has 25 or less carbon atoms, preferably 15 or less carbon atoms. Specific examples include phenylamino groups, diphenylamino groups, tolylamino groups, pyridylamino groups, and thienylamino groups.

 アシルアミノ基としては、炭素数が通常2以上、また、通常25以下、好ましくは15以下のアシル基を1つ以上有するアシルアミノ基が挙げられる。具体例としては、アセチルアミノ基およびベンゾイルアミノ基等が挙げられる。 The acylamino group includes an acylamino group having one or more acyl groups, which usually has 2 or more carbon atoms and usually has 25 or less, preferably 15 or less carbon atoms. Specific examples include an acetylamino group and a benzoylamino group.

 アルコキシ基としては、炭素数が通常1以上、また、通常12以下、好ましくは6以下のアルコキシ基が挙げられる。具体例としては、メトキシ基、エトキシ基およびブトキシ基等が挙げられる。 The alkoxy group typically has 1 or more carbon atoms and typically has 12 or less carbon atoms, preferably 6 or less carbon atoms. Specific examples include methoxy, ethoxy, and butoxy groups.

 アリールオキシ基としては、炭素数が通常3以上、好ましくは4以上、また、通常25以下、好ましくは15以下の芳香族炭化水素基または芳香族複素環基を有するアリールオキシ基が挙げられる。具体例としては、フェニルオキシ基、ナフチルオキシ基、ピリジルオキシ基およびチエニルオキシ基等が挙げられる。 Aryloxy groups include aryloxy groups having an aromatic hydrocarbon group or aromatic heterocyclic group, usually having 3 or more carbon atoms, preferably 4 or more carbon atoms, and usually having 25 or less carbon atoms, preferably 15 or less carbon atoms. Specific examples include phenyloxy groups, naphthyloxy groups, pyridyloxy groups, and thienyloxy groups.

 アシル基としては、炭素数が通常1以上、また、通常25以下、好ましくは15以下のアシル基が挙げられる。具体例としては、ホルミル基、アセチル基およびベンゾイル基等が挙げられる。 The acyl group typically has 1 or more carbon atoms and typically has 25 or less carbon atoms, preferably 15 or less carbon atoms. Specific examples include a formyl group, an acetyl group, and a benzoyl group.

 アルコキシカルボニル基としては、炭素数が通常2以上、また、通常10以下、好ましくは7以下のアルコキシカルボニル基が挙げられる。具体例としては、メトキシカルボニル基およびエトキシカルボニル基等が挙げられる。 Examples of alkoxycarbonyl groups include those having carbon atoms of typically 2 or more and typically 10 or less, and preferably 7 or less. Specific examples include methoxycarbonyl and ethoxycarbonyl groups.

 アリールオキシカルボニル基としては、炭素数が通常3以上、好ましくは4以上、また、通常25以下、好ましくは15以下の芳香族炭化水素基または芳香族複素環基を有するものが挙げられる。具体例としては、フェノキシカルボニル基およびピリジルオキシカルボニル基等が挙げられる。 Aryloxycarbonyl groups include those having an aromatic hydrocarbon group or aromatic heterocyclic group with a carbon number of typically 3 or more, preferably 4 or more, and typically 25 or less, preferably 15 or less. Specific examples include a phenoxycarbonyl group and a pyridyloxycarbonyl group.

 アルキルカルボニルオキシ基としては、炭素数が通常2以上、また、通常10以下、好ましくは7以下のアルキルカルボニルオキシ基が挙げられる。具体例としては、アセトキシ基およびトリフルオロアセトキシ基等が挙げられる。 Examples of alkylcarbonyloxy groups include alkylcarbonyloxy groups that typically have 2 or more carbon atoms and typically have 10 or less carbon atoms, preferably 7 or less carbon atoms. Specific examples include an acetoxy group and a trifluoroacetoxy group.

 アルキルチオ基としては、炭素数が通常1以上、また、通常12以下、好ましくは6以下のアルキルチオ基が挙げられる。具体例としては、メチルチオ基およびエチルチオ基等が挙げられる。 The alkylthio group typically has 1 or more carbon atoms and typically has 12 or less carbon atoms, preferably 6 or less carbon atoms. Specific examples include methylthio and ethylthio groups.

 アリールチオ基としては、炭素数が通常3以上、好ましくは4以上、また、通常25以下、好ましくは14以下のアリールチオ基が挙げられる。具体例としては、フェニルチオ基、ナフチルチオ基およびピリジルチオ基等が挙げられる。 Arylthio groups include those having carbon atoms of typically 3 or more, preferably 4 or more, and typically 25 or less, preferably 14 or less. Specific examples include phenylthio groups, naphthylthio groups, and pyridylthio groups.

 アルキルスルホニル基およびアリールスルホニル基の具体例としては、メシル基およびトシル基等が挙げられる。 Specific examples of alkylsulfonyl groups and arylsulfonyl groups include mesyl groups and tosyl groups.

 スルホニルオキシ基の具体例としては、メシルオキシ基およびトシルオキシ基等が挙げられる。 Specific examples of sulfonyloxy groups include mesyloxy and tosyloxy groups.

 シリル基の具体例としては、トリメチルシリル基およびトリフェニルシリル基など挙げられる。 Specific examples of silyl groups include trimethylsilyl and triphenylsilyl groups.

 以上、R103、R104およびR105として例示した基は、本発明の趣旨に反しない限りにおいて、更に他の置換基によって置換されていてもよい。置換基の種類は特に制限されないが、例えば、上記R103、R104およびR105としてそれぞれ例示した基のほか、ハロゲン原子、シアノ基、チオシアノ基およびニトロ基等が挙げられる。中でも、イオン化合物(電子受容性イオン化合物)の耐熱性および電子受容性の妨げにならない観点から、アルキル基、アルケニル基、アルキニル基、アルコキシ基、アリールオキシ基、芳香族炭化水素基または芳香族複素環基が好ましい。 The groups exemplified as R 103 , R 104 and R 105 above may be further substituted with other substituents as long as they do not go against the spirit of the present invention. The type of the substituent is not particularly limited, and examples thereof include halogen atoms, cyano groups, thiocyano groups and nitro groups in addition to the groups exemplified as R 103 , R 104 and R 105 above. Among them, from the viewpoint of not interfering with the heat resistance and electron-accepting ability of the ionic compound (electron-accepting ionic compound), alkyl groups, alkenyl groups, alkynyl groups, alkoxy groups, aryloxy groups, aromatic hydrocarbon groups or aromatic heterocyclic groups are preferred.

 上述した中でも、下記式(AC1)~(AC7)で示されるアニオンとカチオンの組み合わせであるイオン化合物(特許第5381931号参照)を好適に用いることができる。 Among the above, ionic compounds that are combinations of anions and cations as shown in the following formulas (AC1) to (AC7) (see Patent No. 5381931) can be preferably used.

Figure JPOXMLDOC01-appb-C000059
Figure JPOXMLDOC01-appb-C000059

Figure JPOXMLDOC01-appb-C000060
Figure JPOXMLDOC01-appb-C000060

 更に、式(An3)で表される1価または2価のアニオンと式(Ct2)~(Ct6)で表される対カチオンからなるオニウムボレート塩(ただし、電気的中性な塩である)も好適に用いることができる。 Furthermore, onium borate salts (which are electrically neutral salts) consisting of a monovalent or divalent anion represented by formula (An3) and a counter cation represented by formulas (Ct2) to (Ct6) can also be suitably used.

Figure JPOXMLDOC01-appb-C000061
Figure JPOXMLDOC01-appb-C000061

 式中、Arは、互いに独立して、置換基を有してもよいアリール基または置換基を有してもよいヘテロアリール基を表し、Lは、アルキレン基、-NH-、酸素原子、硫黄原子または-CN+-を表す。 In the formula, Ar's each independently represent an aryl group which may have a substituent or a heteroaryl group which may have a substituent, and L represents an alkylene group, -NH-, an oxygen atom, a sulfur atom or -CN + -.

 アリール基としては、炭素数6~20のアリール基等が挙げられる。その具体例としては、フェニル基、トリル基、1-ナフチル基、2-ナフチル基、1-アントリル基、2-アントリル基、9-アントリル基、1-フェナントリル基、2-フェナントリル基、3-フェナントリル基、4-フェナントリル基、9-フェナントリル基等が挙げられ、フェニル基、トリル基およびナフチル基が好ましい。 Aryl groups include aryl groups having 6 to 20 carbon atoms. Specific examples include phenyl, tolyl, 1-naphthyl, 2-naphthyl, 1-anthryl, 2-anthryl, 9-anthryl, 1-phenanthryl, 2-phenanthryl, 3-phenanthryl, 4-phenanthryl, and 9-phenanthryl groups, with phenyl, tolyl, and naphthyl groups being preferred.

 上記置換基としては、ハロゲン原子、ニトロ基、シアノ基、炭素数1~20のアルキル基、炭素数2~20のアルケニル基および炭素数2~20のアルキニル基等が挙げられる。 The above-mentioned substituents include halogen atoms, nitro groups, cyano groups, alkyl groups having 1 to 20 carbon atoms, alkenyl groups having 2 to 20 carbon atoms, and alkynyl groups having 2 to 20 carbon atoms.

 ハロゲン原子としては、フッ素原子、塩素原子、臭素原子、ヨウ素原子等が挙げられ、フッ素原子が好ましい。 Halogen atoms include fluorine atoms, chlorine atoms, bromine atoms, iodine atoms, etc., with fluorine atoms being preferred.

 炭素数1~20のアルキル基としては、直鎖状、分岐鎖状、環状のいずれでもよく、その具体例としては、メチル基、エチル基、n-プロピル基、イソプロピル基、n-ブチル基、イソブチル基、s-ブチル基、t-ブチル基、n-ペンチル基、n-ヘキシル基、n-ヘプチル基、n-オクチル基、n-ノニル基、n-デシル基、n-ウンデシル基、n-ドデシル基、n-トリデシル基、n-テトラデシル基、n-ペンタデシル基、n-ヘキサデシル基、n-ヘプタデシル基、n-オクタデシル基、n-ノナデシル基、n-エイコサニル基等が挙げられるが、炭素数1~18のアルキル基が好ましく、炭素数1~8のアルキル基がより好ましい。 The alkyl group having 1 to 20 carbon atoms may be linear, branched, or cyclic. Specific examples include methyl, ethyl, n-propyl, isopropyl, n-butyl, isobutyl, s-butyl, t-butyl, n-pentyl, n-hexyl, n-heptyl, n-octyl, n-nonyl, n-decyl, n-undecyl, n-dodecyl, n-tridecyl, n-tetradecyl, n-pentadecyl, n-hexadecyl, n-heptadecyl, n-octadecyl, n-nonadecyl, and n-eicosanyl groups. However, alkyl groups having 1 to 18 carbon atoms are preferred, and alkyl groups having 1 to 8 carbon atoms are more preferred.

 炭素数2~20のアルケニル基の具体例としては、エテニル基、n-1-プロペニル基、n-2-プロペニル基、1-メチルエテニル基、n-1-ブテニル基、n-2-ブテニル基、n-3-ブテニル基、2-メチル-1-プロペニル基、2-メチル-2-プロペニル基、1-エチルエテニル基、1-メチル-1-プロペニル基、1-メチル-2-プロペニル基、n-1-ペンテニル基、n-1-デセニル基、n-1-エイコセニル基等が挙げられる。 Specific examples of alkenyl groups having 2 to 20 carbon atoms include ethenyl, n-1-propenyl, n-2-propenyl, 1-methylethenyl, n-1-butenyl, n-2-butenyl, n-3-butenyl, 2-methyl-1-propenyl, 2-methyl-2-propenyl, 1-ethylethenyl, 1-methyl-1-propenyl, 1-methyl-2-propenyl, n-1-pentenyl, n-1-decenyl, and n-1-eicosenyl.

 炭素数2~20のアルキニル基の具体例としては、エチニル基、n-1-プロピニル基、n-2-プロピニル基、n-1-ブチニル基、n-2-ブチニル基、n-3-ブチニル基、1-メチル-2-プロピニル基、n-1-ペンチニル基、n-2-ペンチニル基、n-3-ペンチニル基、n-4-ペンチニル基、1-メチル-n-ブチニル基、2-メチル-n-ブチニル基、3-メチル-n-ブチニル基、1,1-ジメチル-n-プロピニル基、n-1-ヘキシニル基、n-1-デシニル基、n-1-ペンタデシニル基、n-1-エイコシニル基等が挙げられる。 Specific examples of alkynyl groups having 2 to 20 carbon atoms include ethynyl, n-1-propynyl, n-2-propynyl, n-1-butynyl, n-2-butynyl, n-3-butynyl, 1-methyl-2-propynyl, n-1-pentynyl, n-2-pentynyl, n-3-pentynyl, n-4-pentynyl, 1-methyl-n-butynyl, 2-methyl-n-butynyl, 3-methyl-n-butynyl, 1,1-dimethyl-n-propynyl, n-1-hexynyl, n-1-decynyl, n-1-pentadecinyl, and n-1-eicosynyl.

 また、上記アリール基は、上述した置換基の中でも、1または2以上の電子吸引性基を有するものが好ましい。上記電子吸引性基としては、ハロゲン原子、ニトロ基、シアノ基等が挙げられ、ハロゲン原子が好ましく、フッ素原子が特に好ましい。 Furthermore, among the above-mentioned substituents, the aryl group preferably has one or more electron-withdrawing groups. Examples of the electron-withdrawing groups include halogen atoms, nitro groups, and cyano groups, with halogen atoms being preferred and fluorine atoms being particularly preferred.

 ヘテロアリール基としては、好ましくは炭素数2~20のヘテロアリール基が挙げられる。その具体例としては、2-チエニル基、3-チエニル基、2-フラニル基、3-フラニル基、2-オキサゾリル基、4-オキサゾリル基、5-オキサゾリル基、3-イソオキサゾリル基、4-イソオキサゾリル基、5-イソオキサゾリル基等の含酸素ヘテロアリール基、2-チアゾリル基、4-チアゾリル基、5-チアゾリル基、3-イソチアゾリル基、4-イソチアゾリル基、5-イソチアゾリル基等の含硫黄ヘテロアリール基、2-イミダゾリル基、4-イミダゾリル基、2-ピリジル基、3-ピリジル基、4-ピリジル基、2-ピラジル基、3-ピラジル基、5-ピラジル基、6-ピラジル基、2-ピリミジル基、4-ピリミジル基、5-ピリミジル基、6-ピリミジル基、3-ピリダジル基、4-ピリダジル基、5-ピリダジル基、6-ピリダジル基、1,2,3-トリアジン-4-イル基、1,2,3-トリアジン-5-イル基、1,2,4-トリアジン-3-イル基、1,2,4-トリアジン-5-イル基、1,2,4-トリアジン-6-イル基、1,3,5-トリアジン-2-イル基、1,2,4,5-テトラジン-3-イル基、1,2,3,4-テトラジン-5-イル基、2-キノリニル基、3-キノリニル基、4-キノリニル基、5-キノリニル基、6-キノリニル基、7-キノリニル基、8-キノリニル基、1-イソキノリニル基、3-イソキノリニル基、4-イソキノリニル基、5-イソキノリニル基、6-イソキノリニル基、7-イソキノリニル基、8-イソキノリニル基、2-キノキサニル基、5-キノキサニル基、6-キノキサニル基、2-キナゾリニル基、4-キナゾリニル基、5-キナゾリニル基、6-キナゾリニル基、7-キナゾリニル基、8-キナゾリニル基、3-シンノリニル基、4-シンノリニル基、5-シンノリニル基、6-シンノリニル基、7-シンノリニル基、8-シンノリニル基等の含窒素ヘテロアリール基等が挙げられる。 Heteroaryl groups preferably include heteroaryl groups having 2 to 20 carbon atoms. Specific examples thereof include oxygen-containing heteroaryl groups such as 2-thienyl, 3-thienyl, 2-furanyl, 3-furanyl, 2-oxazolyl, 4-oxazolyl, 5-oxazolyl, 3-isoxazolyl, 4-isoxazolyl, and 5-isoxazolyl groups; sulfur-containing heteroaryl groups such as 2-thiazolyl, 4-thiazolyl, 5-thiazolyl, 3-isothiazolyl, 4-isothiazolyl, and 5-isothiazolyl groups; 2-imidazolyl, a aryl group, a 4-imidazolyl group, a 2-pyridyl group, a 3-pyridyl group, a 4-pyridyl group, a 2-pyrazyl group, a 3-pyrazyl group, a 5-pyrazyl group, a 6-pyrazyl group, a 2-pyrimidyl group, a 4-pyrimidyl group, a 5-pyrimidyl group, a 6-pyrimidyl group, a 3-pyridazyl group, a 4-pyridazyl group, a 5-pyridazyl group, a 6-pyridazyl group, a 1,2,3-triazin-4-yl group, a 1,2,3-triazin-5-yl group, a 1,2,4-triazin-3-yl group, a 1,2, 4-triazin-5-yl group, 1,2,4-triazin-6-yl group, 1,3,5-triazin-2-yl group, 1,2,4,5-tetrazin-3-yl group, 1,2,3,4-tetrazin-5-yl group, 2-quinolinyl group, 3-quinolinyl group, 4-quinolinyl group, 5-quinolinyl group, 6-quinolinyl group, 7-quinolinyl group, 8-quinolinyl group, 1-isoquinolinyl group, 3-isoquinolinyl group, 4-isoquinolinyl group, 5-isoquinolinyl group, 6-isoquinolinyl group, Examples of nitrogen-containing heteroaryl groups include isoquinolinyl group, 7-isoquinolinyl group, 8-isoquinolinyl group, 2-quinoxanyl group, 5-quinoxanyl group, 6-quinoxanyl group, 2-quinazolinyl group, 4-quinazolinyl group, 5-quinazolinyl group, 6-quinazolinyl group, 7-quinazolinyl group, 8-quinazolinyl group, 3-cinnolinyl group, 4-cinnolinyl group, 5-cinnolinyl group, 6-cinnolinyl group, 7-cinnolinyl group, and 8-cinnolinyl group.

 上記ヘテロアリール基が有する置換基としては、上記アリール基で例示したものと同様の置換基が挙げられる。 The substituents on the heteroaryl group include the same substituents as those exemplified for the aryl group.

 Lは、アルキレン基、-NH-、酸素原子、硫黄原子または-CN+-を表すが、-CN+-が好ましい。 L represents an alkylene group, --NH--, an oxygen atom, a sulfur atom or --CN.sup. + --, with --CN.sup. + -- being preferred.

 アルキレン基としては、直鎖、分岐、環状のいずれでもよく、炭素数1~20、好ましくは炭素数1~10のアルキレン基が挙げられる。その具体例としては、メチレン基、メチルメチレン基、ジメチルメチレン基、エチレン基、トリメチレン基、プロピレン基、テトラメチレン基、ペンタメチレン基、ヘキサメチレン基等が挙げられる。 The alkylene group may be linear, branched, or cyclic, and includes alkylene groups having 1 to 20 carbon atoms, preferably 1 to 10 carbon atoms. Specific examples include methylene, methylmethylene, dimethylmethylene, ethylene, trimethylene, propylene, tetramethylene, pentamethylene, and hexamethylene groups.

 本発明で好適に用いることのできる上記式(An3)のアニオンとしては、式(An3-1)で示されるものが挙げられるが、これに限定されるものではない。 Anions of the above formula (An3) that can be suitably used in the present invention include, but are not limited to, those represented by formula (An3-1).

Figure JPOXMLDOC01-appb-C000062
Figure JPOXMLDOC01-appb-C000062

 一方、対カチオンは、式(Ct2)~(Ct6)で表されるものが挙げられる。 On the other hand, examples of counter cations include those represented by formulas (Ct2) to (Ct6).

Figure JPOXMLDOC01-appb-C000063
Figure JPOXMLDOC01-appb-C000063

 本発明において、上記オニウムボレート塩は、1種単独で用いても、2種以上組み合わせて用いてもよい。
 また、必要に応じて公知のその他のオニウムボレート塩を併用してもよい。
 なお、上記オニウムボレート塩は、例えば、特開2005-314682号公報等に記載された公知の方法を参考に合成することができる。
In the present invention, the above onium borate salts may be used alone or in combination of two or more.
If necessary, other known onium borate salts may be used in combination.
The onium borate salt can be synthesized by referring to the known method described in, for example, JP-A-2005-314682.

 上記オニウムボレート塩は、電荷輸送性組成物への溶解を容易にするため、あらかじめ有機溶媒に溶かしておいてもよい。
 このような有機溶媒としては、プロピレンカーボネート、エチレンカーボネート、1,2-ブチレンカーボネート、ジメチルカーボネート、ジエチルカーボネート等のカーボネート類;アセトン、メチルエチルケトン、シクロヘキサノン、メチルイソアミルケトン、2-ヘプタノン等のケトン類;エチレングリコール、エチレングリコールモノアセテート、ジエチレングリコール、ジエチレングリコールモノアセテート、プロピレングリコール、プロピレングリコールモノアセテート、ジプロピレングリコール、ジプロピレングリコールモノアセテートのモノメチルエーテル、モノエチルエーテル、モノプロピルエーテル、モノブチルエーテルまたはモノフェニルエーテル等の多価アルコールおよびその誘導体類;ジオキサン等の環式エーテル類;蟻酸エチル、乳酸メチル、乳酸エチル、酢酸メチル、酢酸エチル、酢酸ブチル、ピルビン酸メチル、アセト酢酸メチル、アセト酢酸エチル、ピルビン酸エチル、エトキシ酢酸エチル、メトキシプロピオン酸メチル、エトキシプロピオン酸エチル、2-ヒドロキシプロピオン酸メチル、2-ヒドロキシプロピオン酸エチル、2-ヒドロキシ-2-メチルプロピオン酸エチル、2-ヒドロキシ-3-メチルブタン酸メチル、3-メトキシブチルアセテート、3-メチル-3-メトキシブチルアセテート等のエステル類;トルエン、キシレン、3-フェノキシトルエン、4-メトキシトルエン、安息香酸メチル、シクロヘキシルベンゼン、テトラリン、イソホロン等の芳香族炭化水素類等が挙げられ、これらは単独で用いても、2種以上組み合わせて用いてもよい。
 有機溶媒を使用する場合、その使用割合は、上記オニウムボレート塩100質量部に対して、15~1,000質量部が好ましく、30~500質量部がより好ましい。
The onium borate salt may be dissolved in an organic solvent in advance in order to facilitate dissolution in the charge transporting composition.
Examples of such organic solvents include carbonates such as propylene carbonate, ethylene carbonate, 1,2-butylene carbonate, dimethyl carbonate, and diethyl carbonate; ketones such as acetone, methyl ethyl ketone, cyclohexanone, methyl isoamyl ketone, and 2-heptanone; polyhydric alcohols and derivatives thereof such as ethylene glycol, ethylene glycol monoacetate, diethylene glycol, diethylene glycol monoacetate, propylene glycol, propylene glycol monoacetate, dipropylene glycol, and the monomethyl ether, monoethyl ether, monopropyl ether, monobutyl ether, and monophenyl ether of dipropylene glycol monoacetate; cyclic ethers such as dioxane; and formic acid. Examples of the esters include ethyl, methyl lactate, ethyl lactate, methyl acetate, ethyl acetate, butyl acetate, methyl pyruvate, methyl acetoacetate, ethyl acetoacetate, ethyl pyruvate, ethyl ethoxyacetate, methyl methoxypropionate, ethyl ethoxypropionate, methyl 2-hydroxypropionate, ethyl 2-hydroxypropionate, ethyl 2-hydroxy-2-methylpropionate, methyl 2-hydroxy-3-methylbutanoate, 3-methoxybutyl acetate, and 3-methyl-3-methoxybutyl acetate; and aromatic hydrocarbons such as toluene, xylene, 3-phenoxytoluene, 4-methoxytoluene, methyl benzoate, cyclohexylbenzene, tetralin, and isophorone. These may be used alone or in combination of two or more.
When an organic solvent is used, the proportion of the organic solvent used is preferably 15 to 1,000 parts by mass, and more preferably 30 to 500 parts by mass, per 100 parts by mass of the onium borate salt.

 また、本発明の電荷輸送性組成物にイオン化合物が含まれる場合、その含有量は、質量比で、電荷輸送性物質1に対し、好ましくは0.001~50程度、より好ましくは0.05~10程度、更に好ましくは0.1~5程度である。 In addition, when an ionic compound is contained in the charge transport composition of the present invention, the content thereof is preferably about 0.001 to 50 parts by mass, more preferably about 0.05 to 10 parts by mass, and even more preferably about 0.1 to 5 parts by mass, per 1 part of the charge transport substance.

 式(Bo1)で表されるボラン化合物としては、下記式で表される化合物を挙げることができる。 The borane compound represented by formula (Bo1) can be the compound represented by the following formula:

Figure JPOXMLDOC01-appb-C000064
(式中、Arb1~Arb3は、互いに独立して、置換基を有してもよい芳香族炭化水素基または置換基を有してもよい芳香族複素環基を表す。)
Figure JPOXMLDOC01-appb-C000064
(In the formula, Ar b1 to Ar b3 each independently represent an aromatic hydrocarbon group which may have a substituent or an aromatic heterocyclic group which may have a substituent.)

 式(Bo1)中、芳香族炭化水素基、芳香族複素環基の例示としては、式(An1)において例示したものと同様のものが挙げられる。
 さらに、Arb1~Arb3のうち少なくとも1つの基が、フッ素原子または塩素原子を置換基として1つまたは2つ以上有することがより好ましい。特に、Arb1~Arb3の水素原子がすべてフッ素原子で置換されたパーフルオロアリール基であることが最も好ましい。パーフルオロアリール基の具体例としては、ペンタフルオロフェニル基、ヘプタフルオロ-2-ナフチル基、テトラフルオロ-4-ピリジル基等が挙げられる。
In formula (Bo1), examples of the aromatic hydrocarbon group and aromatic heterocyclic group include the same as those exemplified in formula (An1).
Furthermore, it is more preferable that at least one of the groups Ar b1 to Ar b3 has one or more fluorine or chlorine atoms as a substituent. In particular, it is most preferable that Ar b1 to Ar b3 are perfluoroaryl groups in which all of the hydrogen atoms are substituted with fluorine atoms. Specific examples of perfluoroaryl groups include a pentafluorophenyl group, a heptafluoro-2-naphthyl group, and a tetrafluoro-4-pyridyl group.

 上記式(Bo1)で表されるボラン化合物の具体例としては、以下に示すものが挙げられるが、これらに限定されるものではない。 Specific examples of borane compounds represented by the above formula (Bo1) include, but are not limited to, those shown below.

Figure JPOXMLDOC01-appb-C000065
Figure JPOXMLDOC01-appb-C000065

 上記ボラン化合物は、電荷輸送性組成物への溶解を容易にするため、あらかじめ有機溶媒に溶かしておいてもよい。このような有機溶媒としては、プロピレンカーボネート、エチレンカーボネート、1,2-ブチレンカーボネート、ジメチルカーボネート、ジエチルカーボネート等のカーボネート類;アセトン、メチルエチルケトン、シクロヘキサノン、メチルイソアミルケトン、2-ヘプタノン等のケトン類;エチレングリコール、エチレングリコールモノアセテート、ジエチレングリコール、ジエチレングリコールモノアセテート、プロピレングリコール、プロピレングリコールモノアセテート、ジプロピレングリコール、ジプロピレングリコールモノアセテートのモノメチルエーテル、モノエチルエーテル、モノプロピルエーテル、モノブチルエーテルまたはモノフェニルエーテル等の多価アルコールおよびその誘導体類;ジオキサン等の環式エーテル類;蟻酸エチル、乳酸メチル、乳酸エチル、酢酸メチル、酢酸エチル、酢酸ブチル、ピルビン酸メチル、アセト酢酸メチル、アセト酢酸エチル、ピルビン酸エチル、エトキシ酢酸エチル、メトキシプロピオン酸メチル、エトキシプロピオン酸エチル、2-ヒドロキシプロピオン酸メチル、2-ヒドロキシプロピオン酸エチル、2-ヒドロキシ-2-メチルプロピオン酸エチル、2-ヒドロキシ-3-メチルブタン酸メチル、3-メトキシブチルアセテート、3-メチル-3-メトキシブチルアセテート等のエステル類;トルエン、キシレン、3-フェノキシトルエン、4-メトキシトルエン、安息香酸メチル、シクロヘキシルベンゼン、テトラリン、イソホロン等の芳香族炭化水素類等が挙げられ、これらは単独で用いても、2種以上組み合わせて用いてもよい。
 有機溶媒を使用する場合、その使用割合は、上記ボラン化合物100質量部に対して、15~1,000質量部が好ましく、30~500質量部がより好ましい。
The borane compound may be dissolved in an organic solvent in advance to facilitate dissolution in the charge transport composition. Examples of such organic solvents include carbonates such as propylene carbonate, ethylene carbonate, 1,2-butylene carbonate, dimethyl carbonate, and diethyl carbonate; ketones such as acetone, methyl ethyl ketone, cyclohexanone, methyl isoamyl ketone, and 2-heptanone; polyhydric alcohols and derivatives thereof such as ethylene glycol, ethylene glycol monoacetate, diethylene glycol, diethylene glycol monoacetate, propylene glycol, propylene glycol monoacetate, dipropylene glycol, and monomethyl ether, monoethyl ether, monopropyl ether, monobutyl ether, and monophenyl ether of dipropylene glycol monoacetate; cyclic ethers such as dioxane; and formic acid. Examples of the esters include ethyl, methyl lactate, ethyl lactate, methyl acetate, ethyl acetate, butyl acetate, methyl pyruvate, methyl acetoacetate, ethyl acetoacetate, ethyl pyruvate, ethyl ethoxyacetate, methyl methoxypropionate, ethyl ethoxypropionate, methyl 2-hydroxypropionate, ethyl 2-hydroxypropionate, ethyl 2-hydroxy-2-methylpropionate, methyl 2-hydroxy-3-methylbutanoate, 3-methoxybutyl acetate, and 3-methyl-3-methoxybutyl acetate; and aromatic hydrocarbons such as toluene, xylene, 3-phenoxytoluene, 4-methoxytoluene, methyl benzoate, cyclohexylbenzene, tetralin, and isophorone. These may be used alone or in combination of two or more.
When an organic solvent is used, the proportion of the organic solvent used is preferably 15 to 1,000 parts by mass, and more preferably 30 to 500 parts by mass, per 100 parts by mass of the borane compound.

 また、本発明の電荷輸送性組成物にボラン化合物が含まれる場合、その含有量は、質量比で、電荷輸送性物質1に対し、好ましくは0.001~50程度、より好ましくは0.05~10程度、さらに好ましくは0.1~5程度である。 In addition, when the charge transport composition of the present invention contains a borane compound, the content thereof is preferably about 0.001 to 50 parts by mass, more preferably about 0.05 to 10 parts by mass, and even more preferably about 0.1 to 5 parts by mass, per 1 part of the charge transport substance.

 テトラシアノキノジメタン誘導体の具体例としては、7,7,8,8-テトラシアノキノジメタン(TCNQ)や2-フルオロ-7,7,8,8-テトラシアノキノジメタン、2,5-ジフルオロ-7,7,8,8-テトラシアノキノジメタン等のテトラシアノキノジメタン類、テトラフルオロ-7,7,8,8-テトラシアノキノジメタン等のハロテトラシアノキノジメタン(ハロTCNQ)類等が挙げられる。
 ベンゾキノン誘導体の具体例としては、テトラフルオロ-1,4-ベンゾキノン、テトラクロロ-1,4-ベンゾキノン(クロラニル)、2,3-ジクロロ-5,6-ジシアノ-1,4-ベンゾキノン(DDQ)等が挙げられる。
 これら無機系および有機系のドーパント物質は、1種類単独で用いてもよく、2種類以上組み合わせて用いてもよい。
Specific examples of the tetracyanoquinodimethane derivative include tetracyanoquinodimethanes such as 7,7,8,8-tetracyanoquinodimethane (TCNQ), 2-fluoro-7,7,8,8-tetracyanoquinodimethane, and 2,5-difluoro-7,7,8,8-tetracyanoquinodimethane, and halotetracyanoquinodimethanes (haloTCNQs) such as tetrafluoro-7,7,8,8-tetracyanoquinodimethane.
Specific examples of the benzoquinone derivative include tetrafluoro-1,4-benzoquinone, tetrachloro-1,4-benzoquinone (chloranil), 2,3-dichloro-5,6-dicyano-1,4-benzoquinone (DDQ), and the like.
These inorganic and organic dopant substances may be used alone or in combination of two or more.

 また、ハロテトラシアノキノジメタン化合物としては、式(Tq1)で表される化合物が挙げられる。 Also, examples of halotetracyanoquinodimethane compounds include compounds represented by formula (Tq1).

Figure JPOXMLDOC01-appb-C000066
Figure JPOXMLDOC01-appb-C000066

 式中、R1q~R4qは、互いに独立して、水素原子またはハロゲン原子を表すが、少なくとも1つはハロゲン原子であり、少なくとも2つがハロゲン原子であることが好ましく、少なくとも3つがハロゲン原子であることがより好ましく、全てがハロゲン原子であることが最も好ましい。
 ハロゲン原子としては上記と同じものが挙げられるが、フッ素原子または塩素原子が好ましく、フッ素原子がより好ましい。
In the formula, R 1q to R 4q each independently represent a hydrogen atom or a halogen atom, at least one of them is a halogen atom, preferably at least two of them are halogen atoms, more preferably at least three of them are halogen atoms, and most preferably all of them are halogen atoms.
Examples of the halogen atom include the same as those mentioned above, but a fluorine atom or a chlorine atom is preferred, and a fluorine atom is more preferred.

 ハロテトラシアノキノジメタン化合物の具体例としては、テトラフルオロテトラシアノキノジメタン(F4TCNQ)、テトラクロロテトラシアノキノジメタン、2-フルオロテトラシアノキノジメタン、2-クロロテトラシアノキノジメタン、2,5-ジフルオロテトラシアノキノジメタン、2,5-ジクロロテトラシアノキノジメタン等が挙げられるが、本発明においては、F4TCNQが最適である。 Specific examples of halotetracyanoquinodimethane compounds include tetrafluorotetracyanoquinodimethane (F4TCNQ), tetrachlorotetracyanoquinodimethane, 2-fluorotetracyanoquinodimethane, 2-chlorotetracyanoquinodimethane, 2,5-difluorotetracyanoquinodimethane, and 2,5-dichlorotetracyanoquinodimethane, with F4TCNQ being the most suitable in the present invention.

 本発明の電荷輸送性組成物がハロテトラシアノキノジメタン化合物を含む場合、その含有量は、質量比で、電荷輸送性物質1に対し、好ましくは0.001~50程度、より好ましくは0.05~10程度、更に好ましくは0.1~5程度である。 When the charge transport composition of the present invention contains a halotetracyanoquinodimethane compound, the content thereof is preferably about 0.001 to 50 parts by mass, more preferably about 0.05 to 10 parts by mass, and even more preferably about 0.1 to 5 parts by mass, per 1 part of the charge transport substance.

[有機溶媒]
 電荷輸送性組成物は、均一な薄膜を形成させるという点から、一般的には塗布液の形態をとる。本発明の電荷輸送性組成物も、上記重合体成分と、この重合体成分を溶解させる有機溶媒とを含有する塗布液であることが好ましい。
[Organic solvent]
The charge transporting composition generally takes the form of a coating liquid in order to form a uniform thin film. The charge transporting composition of the present invention is also preferably a coating liquid containing the above-mentioned polymer component and an organic solvent capable of dissolving the polymer component.

 電荷輸送性組成物に含有される有機溶媒は、重合体成分が均一に溶解するものであれば特に限定されない。具体例を挙げるならば、N,N-ジメチルホルムアミド、N,N-ジメチルアセトアミド、N-メチル-2-ピロリドン、N-エチル-2-ピロリドン、ジメチルスルホキシド、N,N-ジエチルホルムアミド、N,N-ジエチルホルムアミド、3-メトキシ-N,N-ジメチルプロパンアミド、γ-ブチロラクトン、1,3-ジメチル-イミダゾリジノン、メチルエチルケトン、シクロヘキサノン、シクロペンタノン等である。なかでも、N-メチル-2-ピロリドン、N-エチル-2-ピロリドン、3-メトキシ-N,N-ジメチルプロパンアミド、またはγ-ブチロラクトンを用いることが好ましい。 The organic solvent contained in the charge transport composition is not particularly limited as long as it dissolves the polymer components uniformly. Specific examples include N,N-dimethylformamide, N,N-dimethylacetamide, N-methyl-2-pyrrolidone, N-ethyl-2-pyrrolidone, dimethylsulfoxide, N,N-diethylformamide, N,N-diethylformamide, 3-methoxy-N,N-dimethylpropanamide, γ-butyrolactone, 1,3-dimethyl-imidazolidinone, methyl ethyl ketone, cyclohexanone, cyclopentanone, etc. Among these, it is preferable to use N-methyl-2-pyrrolidone, N-ethyl-2-pyrrolidone, 3-methoxy-N,N-dimethylpropanamide, or γ-butyrolactone.

 また、本発明の電荷輸送性組成物に含有される有機溶媒は、上記溶媒に加えて、電荷輸送性組成物を塗布する際の塗布性や塗膜の表面平滑性を向上させる溶媒を用いることもできる。かかる有機溶媒の具体例を下記に挙げるが、これらに限定されない。 In addition to the above-mentioned solvents, the organic solvent contained in the charge transport composition of the present invention may also be a solvent that improves the coatability of the charge transport composition when applied and the surface smoothness of the coating film. Specific examples of such organic solvents are listed below, but are not limited to these.

 例えば、エタノール、イソプロピルアルコール、1-ブタノール、2-ブタノール、イソブチルアルコール、tert-ブチルアルコール、1-ペンタノール、2-ペンタノール、3-ペンタノール、2-メチル-1-ブタノール、イソペンチルアルコール、tert-ペンチルアルコール、3-メチル-2-ブタノール、ネオペンチルアルコール、1-ヘキサノール、2-メチル-1-ペンタノール、2-メチル-2-ペンタノール、2-エチル-1-ブタノール、1-ヘプタノール、2-ヘプタノール、3-ヘプタノール、1-オクタノール、2-オクタノール、2-エチル-1-ヘキサノール、シクロヘキサノール、1-メチルシクロヘキサノール、2-メチルシクロヘキサノール、3-メチルシクロヘキサノール、2,6-ジメチル-4-ヘプタノール、1,2-エタンジオール、1,2-プロパンジオール、1,3-プロパンジオール、1,2-ブタンジオール、1,3-ブタンジオール、1,4-ブタンジオール、2,3-ブタンジオール、1,5-ペンタンジオール、2-メチル-2,4-ペンタンジオール、2-エチル-1,3-ヘキサンジオール、ジイソプロピルエーテル、ジプロピルエーテル、ジブチルエーテル、ジヘキシルエーテル、ジオキサン、エチレングリコールジメチルエーテル、エチレングリコールジエチルエーテル、エチレングリコールジブチルエーテル、1,2-ブトキシエタン、ジエチレングリコールジメチルエーテル、ジエチレングリコールジエチルエーテル、4-ヒドロキシ-4-メチル-2-ペンタノン、ジエチレングリコールメチルエチルエーテル、ジエチレングリコールジブチルエーテル、2-ペンタノン、3-ペンタノン、2-ヘキサノン、2-ヘプタノン、4-ヘプタノン、2,6-ジメチル-4-ヘプタノン、4,6-ジメチル-2-ヘプタノン、3-エトキシブチルアセタート、1-メチルペンチルアセタート、2-エチルブチルアセタート、2-エチルヘキシルアセタート、エチレングリコールモノアセタート、エチレングリコールジアセタート、プロピレンカーボネート、エチレンカーボネート、2-(メトキシメトキシ)エタノール、エチレングリコールモノブチルエーテル(ブチルセロソルブ)、エチレングリコールモノイソアミルエーテル、エチレングリコールモノヘキシルエーテル、2-(ヘキシルオキシ)エタノール、フルフリルアルコール、ジエチレングリコール、プロピレングリコール、プロピレングリコールモノブチルエーテル、1-(ブトキシエトキシ)プロパノール、プロピレングリコールモノメチルエーテルアセタート、ジプロピレングリコール、ジエチレングリコールモノエチルエーテル、ジエチレングリコールモノメチルエーテル、ジプロピレングリコールモノメチルエーテル、ジプロピレングリコールモノエチルエーテル、ジプロピレングリコールジメチルエーテル、トリプロピレングリコールモノメチルエーテル、エチレングリコールモノメチルエーテルアセタート、エチレングリコールモノエチルエーテルアセタート、エチレングリコールモノブチルエーテルアセタート、エチレングリコールモノアセタート、エチレングリコールジアセタート、ジエチレングリコールモノエチルエーテルアセタート、ジエチレングリコールモノブチルエーテルアセタート、2-(2-エトキシエトキシ)エチルアセタート、ジエチレングリコールアセタート、トリエチレングリコール、トリエチレングリコールモノメチルエーテル、トリエチレングリコールモノエチルエーテル、乳酸メチル、乳酸エチル、酢酸メチル、酢酸エチル、酢酸n-ブチル、酢酸プロピレングリコールモノエチルエーテル、ピルビン酸メチル、ピルビン酸エチル、3-メトキシプロピオン酸メチル、3-エトキシプロピオン酸エチル、3-エトキシプロピオン酸メチルエチル、3-メトキシプロピオン酸エチル、3-エトキシプロピオン酸、3-メトキシプロピオン酸、3-メトキシプロピオン酸プロピル、3-メトキシプロピオン酸ブチル、乳酸メチルエステル、乳酸エチルエステル、乳酸n-プロピルエステル、乳酸n-ブチルエステル、乳酸イソアミルエステル等が挙げられる。 For example, ethanol, isopropyl alcohol, 1-butanol, 2-butanol, isobutyl alcohol, tert-butyl alcohol, 1-pentanol, 2-pentanol, 3-pentanol, 2-methyl-1-butanol, isopentyl alcohol, tert-pentyl alcohol, 3-methyl-2-butanol, neopentyl alcohol, 1-hexanol, 2-methyl-1-pentanol, 2-methyl-2-pentanol, 2-ethyl-1-butanol, 1-heptanol ethanol, 2-heptanol, 3-heptanol, 1-octanol, 2-octanol, 2-ethyl-1-hexanol, cyclohexanol, 1-methylcyclohexanol, 2-methylcyclohexanol, 3-methylcyclohexanol, 2,6-dimethyl-4-heptanol, 1,2-ethanediol, 1,2-propanediol, 1,3-propanediol, 1,2-butanediol, 1,3-butanediol, 1,4-butanediol, 2,3-butanediol, 1, 5-pentanediol, 2-methyl-2,4-pentanediol, 2-ethyl-1,3-hexanediol, diisopropyl ether, dipropyl ether, dibutyl ether, dihexyl ether, dioxane, ethylene glycol dimethyl ether, ethylene glycol diethyl ether, ethylene glycol dibutyl ether, 1,2-butoxyethane, diethylene glycol dimethyl ether, diethylene glycol diethyl ether, 4-hydroxy-4-methyl-2-pentanone, diethylene glycol methyl ethyl ether, diethylene glycol dibutyl ether, 2-pentanone, 3-pentanone, 2-hexanone, 2-heptanone, 4-heptanone, 2,6-dimethyl-4-heptanone, 4,6-dimethyl-2-heptanone, 3-ethoxybutyl acetate, 1-methylpentyl acetate, 2-ethylbutyl acetate, 2-ethylhexyl acetate, ethylene glycol monoacetate, ethylene glycol diacetate, propylene Carbonate, ethylene carbonate, 2-(methoxymethoxy)ethanol, ethylene glycol monobutyl ether (butyl cellosolve), ethylene glycol monoisoamyl ether, ethylene glycol monohexyl ether, 2-(hexyloxy)ethanol, furfuryl alcohol, diethylene glycol, propylene glycol, propylene glycol monobutyl ether, 1-(butoxyethoxy)propanol, propylene glycol monomethyl ether acetate, dipropylene glycol, diethylene glycol monoethyl ether, diethylene glycol monomethyl ether, dipropylene glycol monomethyl ether, dipropylene glycol monoethyl ether, dipropylene glycol dimethyl ether, tripropylene glycol monomethyl ether, ethylene glycol monomethyl ether acetate, ethylene glycol monoethyl ether acetate, ethylene glycol monobutyl ether acetate, ethylene glycol Examples of the lactic acid lactate include glycerol monoacetate, ethylene glycol diacetate, diethylene glycol monoethyl ether acetate, diethylene glycol monobutyl ether acetate, 2-(2-ethoxyethoxy)ethyl acetate, diethylene glycol acetate, triethylene glycol, triethylene glycol monomethyl ether, triethylene glycol monoethyl ether, methyl lactate, ethyl lactate, methyl acetate, ethyl acetate, n-butyl acetate, propylene glycol monoethyl ether acetate, methyl pyruvate, ethyl pyruvate, methyl 3-methoxypropionate, ethyl 3-ethoxypropionate, methyl ethyl 3-ethoxypropionate, ethyl 3-methoxypropionate, 3-ethoxypropionic acid, 3-methoxypropionic acid, propyl 3-methoxypropionate, butyl 3-methoxypropionate, methyl lactate, ethyl lactate, n-propyl lactate, n-butyl lactate, and isoamyl lactate.

 なかでも、有機溶媒は、1-ヘキサノール、シクロヘキサノール、1,2-エタンジオール、1,2-プロパンジオール、プロピレングリコールモノブチルエーテル、ジエチレングリコールジエチルエーテル、4-ヒドロキシ-4-メチル-2-ペンタノン、エチレングリコールモノブチルエーテル(ブチルセロソルブ)またはジプロピレングリコールジメチルエーテルを用いることが好ましい。 Among these, it is preferable to use the following organic solvents: 1-hexanol, cyclohexanol, 1,2-ethanediol, 1,2-propanediol, propylene glycol monobutyl ether, diethylene glycol diethyl ether, 4-hydroxy-4-methyl-2-pentanone, ethylene glycol monobutyl ether (butyl cellosolve), or dipropylene glycol dimethyl ether.

 これらの有機溶媒は、1種を単独で、または2種以上を組み合わせて用いることができる。このような有機溶媒の種類および含有量は、電荷輸送性組成物の塗布装置、塗布条件、塗布環境等に応じて適宜選択される。 These organic solvents can be used alone or in combination of two or more. The type and content of such organic solvents are appropriately selected depending on the coating device, coating conditions, coating environment, etc. of the charge transport composition.

 本発明の電荷輸送性組成物には、得られる光電変換素子の安定性を向上させるために、有機シラン化合物を含有していてもよい。 The charge transport composition of the present invention may contain an organosilane compound to improve the stability of the resulting photoelectric conversion element.

 有機シラン化合物としては、アルコキシシランが好ましく、トリアルコキシシランおよびテトラアルコキシシランがより好ましい。上記アルコキシシランとしては、テトラエトキシシラン(TEOS)、テトラメトキシシラン、テトライソプロポキシシラン、フェニルトリエトキシシラン、フェニルトリメトキシシラン、メチルトリエトキシシラン、メチルトリメトキシシラン、3,3,3-トリフルオロプロピルトリメトキシシラン、ジメチルジエトキシシラン、ジメチルジメトキシシラン等を挙げることができる。本発明では、これらの中でも、TEOS、テトラメトキシシラン、テトライソプロポキシシランを好適に使用し得る。これらの有機シラン化合物は、1種を単独で、または2種以上を組み合わせて用いることができる。 As the organic silane compound, alkoxysilane is preferred, and trialkoxysilane and tetraalkoxysilane are more preferred. Examples of the alkoxysilane include tetraethoxysilane (TEOS), tetramethoxysilane, tetraisopropoxysilane, phenyltriethoxysilane, phenyltrimethoxysilane, methyltriethoxysilane, methyltrimethoxysilane, 3,3,3-trifluoropropyltrimethoxysilane, dimethyldiethoxysilane, and dimethyldimethoxysilane. Among these, TEOS, tetramethoxysilane, and tetraisopropoxysilane can be preferably used in the present invention. These organic silane compounds can be used alone or in combination of two or more.

 有機シラン化合物の含有量は、上記電荷輸送性物質に対し、また、電子受容性ドーパント物質を含む場合は、電荷輸送性物質および電子受容性ドーパント物質の総量に対し、質量部で0.1~10倍が好ましく、0.5~7倍がより好ましく、1.0~5倍がより一層好ましい。有機シラン化合物の配合量を上記範囲とすることで、得られる光電変換素子の安定性を向上させることができる。 The content of the organosilane compound is preferably 0.1 to 10 times, more preferably 0.5 to 7 times, and even more preferably 1.0 to 5 times, the charge transport substance, or, if an electron-accepting dopant substance is included, the total amount of the charge transport substance and the electron-accepting dopant substance, in parts by mass. By setting the amount of the organosilane compound within the above range, the stability of the resulting photoelectric conversion element can be improved.

 なお、本発明の組成物には、本発明の目的を達成し得る限り、その他の添加剤を配合してもよい。
 添加剤の種類としては、所望の効果に応じて公知のものから適宜選択して用いることができる。
The composition of the present invention may contain other additives as long as the object of the present invention can be achieved.
The type of additive can be appropriately selected from known additives depending on the desired effect.

 本発明の電荷輸送性組成物の固形分濃度は、組成物の粘度および表面張力等や、作製する薄膜の厚み等を勘案して適宜設定されるものであるが、通常、0.1~20.0質量%程度が好ましく、より好ましくは0.5~10.0質量%、より一層好ましくは1.0~5.0質量%である。なお、ここでいう固形分濃度の固形分とは、本発明の電荷輸送性組成物に含まれる溶媒以外の成分を意味する。 The solids concentration of the charge transport composition of the present invention is appropriately set taking into consideration the viscosity and surface tension of the composition and the thickness of the thin film to be produced, but is usually preferably about 0.1 to 20.0 mass%, more preferably 0.5 to 10.0 mass%, and even more preferably 1.0 to 5.0 mass%. The solids in the solids concentration here refer to the components other than the solvent contained in the charge transport composition of the present invention.

 そして、本発明の電荷輸送性組成物の粘度は、作製する薄膜の厚み等や固形分濃度を考慮し、塗布方法に応じて適宜調節されるものであるが、通常25℃で0.1~50mPa・s程度である。 The viscosity of the charge transport composition of the present invention is adjusted appropriately according to the coating method, taking into account the thickness of the thin film to be produced and the solids concentration, but is usually about 0.1 to 50 mPa·s at 25°C.

 本発明の電荷輸送性組成物は、固形分が溶媒に均一に溶解または分散する限り、電荷輸送性物質、電子受容性ドーパント物質および有機溶媒、必要に応じて、有機シラン化合物、その他の添加剤等を任意の順序で混合することより調製することができる。すなわち、例えば、有機溶媒に電荷輸送性物質として特定重合体を溶解させた後、その溶液に電子受容性ドーパント物質を溶解させる方法、有機溶媒に電子受容性ドーパント物質を溶解させた後、その溶液に特定重合体を溶解させる方法、特定重合体と電子受容性ドーパント物質とを混合した後、その混合物を溶媒に投入して溶解させる方法のいずれも、固形分が溶媒に均一に溶解または分散する限り、採用することができる。 The charge transport composition of the present invention can be prepared by mixing the charge transport material, the electron accepting dopant material, and the organic solvent, and, if necessary, the organosilane compound and other additives, in any order, so long as the solid content is uniformly dissolved or dispersed in the solvent. That is, for example, a method of dissolving a specific polymer as the charge transport material in an organic solvent and then dissolving the electron accepting dopant material in the solution, a method of dissolving the electron accepting dopant material in an organic solvent and then dissolving the specific polymer in the solution, or a method of mixing the specific polymer and the electron accepting dopant material and then putting the mixture into a solvent to dissolve can all be used as long as the solid content is uniformly dissolved or dispersed in the solvent.

 また、通常、電荷輸送性組成物の調製は、常温、常圧の不活性ガス雰囲気下で行われるが、組成物中の化合物が分解したり、組成が大きく変化したりしない限り、大気雰囲気下(酸素存在下)で行ってもよく、加熱しながら行ってもよい。 The charge transport composition is usually prepared in an inert gas atmosphere at room temperature and pressure, but it may be prepared in air (in the presence of oxygen) or with heating, as long as the compounds in the composition are not decomposed or the composition does not change significantly.

 以上説明した電荷輸送性組成物を、逆積層型ペロブスカイト太陽電池の場合は陽極上に、順積層型ペロブスカイト太陽電池の場合は活性層上に塗布して焼成することで、本発明の正孔捕集層を形成できるが、本発明における好ましい態様としては逆積層型である。
 塗布にあたっては、組成物の粘度と表面張力、所望する薄膜の厚さ等を考慮し、ドロップキャスト法、スピンコート法、ブレードコート法、ディップコート法、ロールコート法、バーコート法、ダイコート法、インクジェット法、印刷法(凸版、凹版、平版、スクリーン印刷等)等といった各種ウェットプロセス法の中から最適なものを採用すればよい。
 また、通常、塗布は、常温、常圧の不活性ガス雰囲気下で行われるが、組成物中の化合物が分解したり、組成が大きく変化したりしない限り、大気雰囲気下(酸素存在下)で行ってもよく、加熱しながら行ってもよい。
The hole collection layer of the present invention can be formed by applying and baking the charge transport composition described above onto the anode in the case of an inverted stacking type perovskite solar cell, or onto the active layer in the case of a normal stacking type perovskite solar cell. The preferred embodiment of the present invention is the inverted stacking type.
For application, the viscosity and surface tension of the composition, the desired thickness of the thin film, and the like may be taken into consideration, and an optimum method may be selected from various wet process methods such as drop casting, spin coating, blade coating, dip coating, roll coating, bar coating, die coating, inkjet printing, printing methods (relief printing, intaglio printing, planographic printing, screen printing, and the like).
Generally, the coating is carried out under an inert gas atmosphere at room temperature and normal pressure. However, as long as the compounds in the composition are not decomposed or the composition is not significantly changed, the coating may be carried out under air atmosphere (in the presence of oxygen) or while heating.

 膜厚は、特に限定されないが、いずれの場合も0.1~500nm程度が好ましく、更には1~100nm程度が好ましい。膜厚を変化させる方法としては、組成物中の固形分濃度を変化させたり、塗布時の溶液量を変化させたりする等の方法がある。 The film thickness is not particularly limited, but in any case, it is preferably about 0.1 to 500 nm, and more preferably about 1 to 100 nm. Methods for changing the film thickness include changing the solids concentration in the composition and changing the amount of solution when applied.

 以下、本発明の電荷輸送性組成物を正孔捕集層形成用組成物として用いたペロブスカイト太陽電池の製造方法について説明するが、これらに限定されるものではない。
(1)逆積層型ペロブスカイト太陽電池[陽極層の形成]:透明基板の表面に陽極材料の層を形成し、透明電極を製造する工程
 陽極材料としては、インジウム錫酸化物(ITO)、インジウム亜鉛酸化物(IZO)等の無機酸化物や、金、銀、アルミニウム等の金属、ポリチオフェン誘導体、ポリアニリン誘導体等の高電荷輸送性有機化合物を用いることができる。これらの中ではITOが最も好ましい。また、透明基板としては、ガラスあるいは透明樹脂からなる基板を用いることができる。
 陽極材料の層(陽極層)の形成方法は、陽極材料の性質に応じて適宜選択される。通常、難溶性、難分散性昇華性材料の場合には真空蒸着法やスパッタ法等のドライプロセスが選択され、溶液材料あるいは分散液材料の場合には、組成物の粘度と表面張力、所望する薄膜の厚さ等を考慮し、上述した各種ウェットプロセス法の中から最適なものが採用される。
Hereinafter, a method for producing a perovskite solar cell using the charge transporting composition of the present invention as a composition for forming a hole collection layer will be described, but the present invention is not limited thereto.
(1) Inverted stacking type perovskite solar cell [Formation of anode layer]: A process of forming a layer of an anode material on the surface of a transparent substrate to manufacture a transparent electrode. As the anode material, inorganic oxides such as indium tin oxide (ITO) and indium zinc oxide (IZO), metals such as gold, silver, and aluminum, and highly charge transporting organic compounds such as polythiophene derivatives and polyaniline derivatives can be used. Among these, ITO is the most preferable. As the transparent substrate, a substrate made of glass or transparent resin can be used.
The method for forming the layer of the anode material (anode layer) is appropriately selected depending on the properties of the anode material. In general, in the case of a poorly soluble or poorly dispersible sublimable material, a dry process such as a vacuum deposition method or a sputtering method is selected, while in the case of a solution material or a dispersion material, an optimal method is selected from the above-mentioned various wet processes taking into consideration the viscosity and surface tension of the composition, the desired thickness of the thin film, and the like.

 また、市販の透明陽極基板を用いることもでき、この場合、素子の歩留りを向上させる観点からは、平滑化処理がされている基板を用いることが好ましい。市販の透明陽極基板を用いる場合、本発明のペロブスカイト太陽電池の製造方法は、陽極層を形成する工程を含まない。
 ITO等の無機酸化物を陽極材料として用いて透明陽極基板を形成する場合、上層を積層する前に、洗剤、アルコール、純水等で洗浄してから使用することが好ましい。更に、使用直前にUVオゾン処理、酸素-プラズマ処理等の表面処理を施すことが好ましい。陽極材料が有機物を主成分とする場合、表面処理を行わなくともよい。
A commercially available transparent anode substrate can also be used, and in this case, from the viewpoint of improving the yield of the device, it is preferable to use a substrate that has been subjected to a smoothing treatment. When a commercially available transparent anode substrate is used, the method for producing a perovskite solar cell of the present invention does not include a step of forming an anode layer.
When forming a transparent anode substrate using an inorganic oxide such as ITO as the anode material, it is preferable to wash the substrate with detergent, alcohol, pure water, etc. before laminating an upper layer. Furthermore, it is preferable to perform a surface treatment such as UV ozone treatment or oxygen plasma treatment immediately before use. When the anode material is mainly composed of an organic substance, it is not necessary to perform the surface treatment.

[正孔捕集層の形成]:形成された陽極材料の層上に正孔捕集層を形成する工程
 上記方法に従い、陽極材料の層上に、本発明の電荷輸送性組成物を用いて正孔捕集層を形成する。
[Formation of hole-collecting layer]: Step of forming a hole-collecting layer on the formed layer of anode material According to the above-mentioned method, a hole-collecting layer is formed on the layer of anode material using the charge-transporting composition of the present invention.

[活性層の形成]:形成された正孔捕集層上に活性層を形成する工程
 本発明では、活性層として、ペロブスカイト半導体化合物を含有する活性層を用いる。
 ペロブスカイト半導体化合物とは、ペロブスカイト構造を有する半導体化合物のことを指す。ペロブスカイト半導体化合物としては、公知の化合物を使用し得、特に制限されるものではないが、例えば、一般式A+2+- 3で表されるもの、または、一般式A+ 22+- 4で表されるものが挙げられる。ここで、A+は1価のカチオンを、M2+は2価のカチオンを、X-は1価のアニオンを表す。
[Formation of Active Layer]: Step of forming an active layer on the formed hole-collecting layer In the present invention, an active layer containing a perovskite semiconductor compound is used as the active layer.
The perovskite semiconductor compound refers to a semiconductor compound having a perovskite structure. As the perovskite semiconductor compound, a known compound can be used, and is not particularly limited, but examples thereof include those represented by the general formula A + M 2+ X - 3 and those represented by the general formula A + 2 M 2+ X - 4. Here, A + represents a monovalent cation, M 2+ represents a divalent cation, and X - represents a monovalent anion.

 1価のカチオンA+としては、例えば、周期表第1族および第13族~第16族元素を含むカチオンが挙げられる。これらの中でも、セシウムイオン、ルビジウムイオン、置換基を有していてもよいアンモニウムイオン、または、置換基を有していてもよいホスホニウムイオンが好ましい。 Examples of the monovalent cation A + include cations containing elements of Groups 1 and 13 to 16 of the periodic table. Among these, a cesium ion, a rubidium ion, an ammonium ion which may have a substituent, or a phosphonium ion which may have a substituent is preferable.

 置換基を有していてもよいアンモニウムイオンとしては、例えば、第1級アンモニウムイオンまたは第2級アンモニウムイオンが挙げられる。上記置換基には特に制限はないが、アルキルアンモニウムイオンまたはアリールアンモニウムイオンが好ましい。特に、立体障害を避けるために、3次元の結晶構造となるモノアルキルアンモニウムイオンがより好ましい。上記アルキルアンモニウムイオンに含まれるアルキル基の炭素数は、1~30が好ましく、1~20がより好ましく、1~10が更に好ましい。上記アリールアンモニウムイオンに含まれるアリール基の炭素数は、6~30が好ましく、6~20がより好ましく、6~12が更に好ましい。 Examples of ammonium ions that may have a substituent include primary ammonium ions and secondary ammonium ions. There are no particular limitations on the substituents, but alkylammonium ions and arylammonium ions are preferred. In particular, monoalkylammonium ions that form a three-dimensional crystal structure are more preferred in order to avoid steric hindrance. The number of carbon atoms in the alkyl group contained in the alkylammonium ion is preferably 1 to 30, more preferably 1 to 20, and even more preferably 1 to 10. The number of carbon atoms in the aryl group contained in the arylammonium ion is preferably 6 to 30, more preferably 6 to 20, and even more preferably 6 to 12.

 1価のカチオンA+の具体例としては、メチルアンモニウムイオン、エチルアンモニウムイオン、イソプロピルアンモニウムイオン、n-プロピルアンモニウムイオン、イソブチルアンモニウムイオン、n-ブチルアンモニウムイオン、t-ブチルアンモニウムイオン、ジメチルアンモニウムイオン、ジエチルアンモニウムイオン、フェニルアンモニウムイオン、ベンジルアンモニウムイオン、フェネチルアンモニウムイオン、グアニジウムイオン、ホルムアミジニウムイオン、アセトアミジニウムイオンおよびイミダゾリウムイオン等が挙げられる。上記カチオンA+は、1種を単独で、または2種以上を組み合わせて用いることができる。 Specific examples of the monovalent cation A + include methylammonium ion, ethylammonium ion, isopropylammonium ion, n-propylammonium ion, isobutylammonium ion, n-butylammonium ion, t-butylammonium ion, dimethylammonium ion, diethylammonium ion, phenylammonium ion, benzylammonium ion, phenethylammonium ion, guanidinium ion, formamidinium ion, acetamidinium ion, and imidazolium ion, etc. The above cation A + can be used alone or in combination of two or more.

 2価のカチオンM2+としては、2価の金属カチオンまたは半金属カチオンであることが好ましく、周期表第14族元素のカチオンがより一層好ましい。2価のカチオンMの具体例としては、鉛カチオン(Pb2+)、スズカチオン(Sn2+)、ゲルマニウムカチオン(Ge2+)等が挙げられる。本発明では、安定性に優れる光電変換素子を得る観点から、鉛カチオンを含むことが好ましい。上記カチオンM2+は、1種を単独で、または2種以上を組み合わせて用いることができる。 The divalent cation M 2+ is preferably a divalent metal cation or semimetal cation, and more preferably a cation of Group 14 of the periodic table. Specific examples of the divalent cation M include lead cation (Pb 2+ ), tin cation (Sn 2+ ), germanium cation (Ge 2+ ), etc. In the present invention, it is preferable to include a lead cation from the viewpoint of obtaining a photoelectric conversion element with excellent stability. The above cation M 2+ can be used alone or in combination of two or more kinds.

 1価のアニオンX-としては、ハロゲン化物イオン、酢酸イオン、硝酸イオン、アセチルアセトナートイオン、チオシアン酸イオンおよび2,4-ペンタンジオナトイオン等が挙げられ、ハロゲン化物イオンが好ましい。上記アニオンX-は、1種を単独で、または2種以上を組み合わせて用いることができる。 Examples of the monovalent anion X include a halide ion, an acetate ion, a nitrate ion, an acetylacetonate ion, a thiocyanate ion, and a 2,4-pentanedionate ion, and the like, with a halide ion being preferred. The above anion X can be used alone or in combination of two or more kinds.

 ハロゲン化物イオンとしては、塩化物イオン、臭化物イオンおよびヨウ化物イオン等が挙げられる。本発明においては、半導体のバンドギャップを広げすぎないようにする観点から、ヨウ化物イオンを含むことが好ましい。 Halide ions include chloride ions, bromide ions, iodide ions, and the like. In the present invention, it is preferable to include iodide ions in order to prevent the band gap of the semiconductor from becoming too wide.

 ペロブスカイト半導体化合物としては、例えば、有機-無機ペロブスカイト半導体化合物が好ましく、ハライド系有機-無機ペロブスカイト半導体化合物がより好ましい。ペロブスカイト半導体化合物の具体例としては、MAPbI3、MAPbBr3、MAPbCl3、MASnI3、MASnBr3、MASnCl3、MAPbI(3-x)Clx、MAPbI(3-x)Brx、MAPbBr(3-x)Clx、MAPb(1-y)Sny3、MAPb(1-y)SnyBr3、MAPb(1-y)SnyCl3、MAPb(1-y)Sny(3-x)Clx、MAPb(1-y)Sny(3-x)Brx、MAPb(1-y)SnyBr(3-x)Clx、FAPbI3,FAPbBr3,FAPbI(3-x)Brx,FA(1-V)MAVPbI(3-x)Brx,Cs(1-W-V)FAwMAVPbI(3-x)Brxが挙げられる。なお、MAは、メチルアンモニウム(CH3NH3 +)を表し、FAは、ホルムアミジニウム(NH=CHNH2 +)を表す。また、xは0~3、yは0~1の任意の数を示す。 As the perovskite semiconductor compound, for example, an organic-inorganic perovskite semiconductor compound is preferable, and a halide-based organic-inorganic perovskite semiconductor compound is more preferable. Specific examples of perovskite semiconductor compounds include MAPbI3, MAPbBr3 , MAPbCl3 , MASnI3 , MASnBr3 , MASnCl3 , MAPbI ( 3-x) Clx , MAPbI(3-x)Brx, MAPbBr (3-x) Clx , MAPb (1-y) SnyI3 , MAPb (1-y) SnyBr3 , MAPb (1-y) SnyCl3 , MAPb ( 1-y) SnyI ( 3 -x) Clx , MAPb (1-y) SnyI (3-x) Brx , MAPb (1-y) SnyBr (3-x) Clx , and FAPbI3 . , FAPbBr3 , FAPbI (3-x) Brx , FA (1-V) MAVPbI (3-x) Brx , Cs (1-WV) FAwMAVPbI (3-x) Brx . In addition, MA represents methylammonium ( CH3NH3 + ), and FA represents formamidinium (NH= CHNH2 + ). In addition, x represents an arbitrary number from 0 to 3, and y represents an arbitrary number from 0 to 1.

 光電変換効率を向上させる観点から、ペロブスカイト半導体化合物としては、1.0~3.5eVのエネルギーバンドギャップを有する半導体化合物を用いることが好ましい。 From the viewpoint of improving photoelectric conversion efficiency, it is preferable to use a semiconductor compound having an energy band gap of 1.0 to 3.5 eV as the perovskite semiconductor compound.

 活性層には、2種類以上のペロブスカイト半導体化合物を含有していてもよい。例えば、上記A+、M2+およびX-のうちの少なくとも1つが異なる2種類以上のペロブスカイト半導体化合物が活性層に含まれていてもよい。 The active layer may contain two or more kinds of perovskite semiconductor compounds. For example, the active layer may contain two or more kinds of perovskite semiconductor compounds that are different in at least one of A + , M 2+ , and X .

 活性層におけるペロブスカイト半導体化合物の含有量は、良好な光電変換特性を得る観点から、50質量%以上が好ましく、70質量%以上がより好ましく、80質量%以上がより一層好ましい。上限については、特に制限はないが、通常100質量%以下である。 The content of the perovskite semiconductor compound in the active layer is preferably 50% by mass or more, more preferably 70% by mass or more, and even more preferably 80% by mass or more, from the viewpoint of obtaining good photoelectric conversion characteristics. There is no particular upper limit, but it is usually 100% by mass or less.

 活性層の形成方法も、上記と同様、組成物の粘度と表面張力、所望する薄膜の厚さ等を考慮し、上述した各種ウェットプロセス法の中から最適なものが採用される。 As with the above, the method for forming the active layer is determined by taking into consideration the viscosity and surface tension of the composition, the desired thickness of the thin film, etc., and selecting the most suitable method from the various wet process methods mentioned above.

[電子捕集層の形成]:形成された活性層上に電子捕集層を形成する工程
 必要に応じて、電荷の移動を効率化すること等を目的として、活性層と陰極層の間に電子捕集層を形成してもよい。
 電子捕集層を形成する材料としては、フラーレン類、酸化リチウム(Li2O)、酸化マグネシウム(MgO)、アルミナ(Al23)、フッ化リチウム(LiF)、フッ化ナトリウム(NaF)、フッ化マグネシウム(MgF2)、フッ化ストロンチウム(SrF2)、炭酸セシウム(Cs2CO3)、8-キノリノールリチウム塩(Liq)、8-キノリノールナトリウム塩(Naq)、バソクプロイン(BCP)、4,7-ジフェニル-1,10-フェナントロリン(BPhen)、ポリエチレンイミン(PEI)、エトキシ化ポリエチレンイミン(PEIE)等が挙げられる。
[Formation of Electron Collecting Layer]: Step of Forming an Electron Collecting Layer on the Formed Active Layer If necessary, an electron collecting layer may be formed between the active layer and the cathode layer for the purpose of improving the efficiency of charge transfer, etc.
Materials for forming the electron collection layer include fullerenes, lithium oxide (Li 2 O), magnesium oxide (MgO), alumina (Al 2 O 3 ), lithium fluoride (LiF), sodium fluoride (NaF), magnesium fluoride (MgF 2 ), strontium fluoride (SrF 2 ), cesium carbonate (Cs 2 CO 3 ), 8-quinolinol lithium salt (Liq), 8-quinolinol sodium salt (Naq), bathocuproine (BCP), 4,7-diphenyl-1,10-phenanthroline (BPhen), polyethyleneimine (PEI), ethoxylated polyethyleneimine (PEIE), etc.

 フラーレン類としては、フラーレンおよびその誘導体が好ましいが、特に限定されるものではない。具体的には、C60、C70、C76、C78、C84等を基本骨格とするフラーレンおよびその誘導体が挙げられる。フラーレン誘導体は、フラーレン骨格における炭素原子が任意の官能基で修飾されていてもよく、この官能基同士が互いに結合して環を形成していてもよい。フラーレン誘導体には、フラーレン結合ポリマーが含まれる。溶媒に親和性の高い官能基を有し、溶媒への可溶性が高いフラーレン誘導体が好ましい。 Fullerenes are preferably fullerenes and their derivatives, but are not particularly limited thereto. Specific examples include fullerenes and their derivatives having a basic skeleton of C60, C70, C76, C78, C84, etc. In fullerene derivatives, the carbon atoms in the fullerene skeleton may be modified with any functional group, and these functional groups may be bonded to each other to form a ring. Fullerene derivatives include fullerene-bonded polymers. Fullerene derivatives that have functional groups with high affinity to solvents and are highly soluble in solvents are preferred.

 フラーレン誘導体における官能基としては、例えば、水素原子、ヒドロキシ基、フッ素原子、塩素原子等のハロゲン原子、メチル基、エチル基等のアルキル基、ビニル基等のアルケニル基、シアノ基、メトキシ基、エトキシ基等のアルコキシ基、フェニル基、ナフチル基等の芳香族炭化水素基、チエニル基、ピリジル基等の芳香族複素環基等が挙げられる。具体的には、C60H36、C70H36等の水素化フラーレン、C60、C70等のオキサイドフラーレン、フラーレン金属錯体等が挙げられる。フラーレン誘導体としては、[6,6]-フェニルC61酪酸メチルエステル([60]PCBM)や[6,6]-フェニルC71酪酸メチルエステル([70]PCBM)を使用することがより好ましい。 Functional groups in fullerene derivatives include, for example, hydrogen atoms, hydroxyl groups, halogen atoms such as fluorine atoms and chlorine atoms, alkyl groups such as methyl groups and ethyl groups, alkenyl groups such as vinyl groups, alkoxy groups such as cyano groups, methoxy groups and ethoxy groups, aromatic hydrocarbon groups such as phenyl groups and naphthyl groups, and aromatic heterocyclic groups such as thienyl groups and pyridyl groups. Specific examples include hydrogenated fullerenes such as C60H36 and C70H36, oxide fullerenes such as C60 and C70, and fullerene metal complexes. As fullerene derivatives, it is more preferable to use [6,6]-phenyl C61 butyric acid methyl ester ([60]PCBM) or [6,6]-phenyl C71 butyric acid methyl ester ([70]PCBM).

 電子捕集層の形成方法も、上記と同様、電子捕集材料が難溶性昇華性材料の場合には上述した各種ドライプロセスが選択され、溶液材料あるいは分散液材料の場合には、組成物の粘度と表面張力、所望する薄膜の厚さ等を考慮し、上述した各種ウェットプロセス法の中から最適なものが採用される。 As for the method of forming the electron collection layer, similarly to the above, when the electron collection material is a sparingly soluble sublimable material, the various dry processes mentioned above are selected, and when it is a solution material or dispersion material, the viscosity and surface tension of the composition, the desired thin film thickness, etc. are taken into consideration and the optimum one is selected from the various wet process methods mentioned above.

[陰極層の形成]:形成された電子捕集層の上に陰極層を形成する工程
 陰極材料としては、アルミニウム、マグネシウム-銀合金、アルミニウム-リチウム合金、リチウム、ナトリウム、カリウム、セシウム、カルシウム、バリウム、銀、金等の金属や、インジウム錫酸化物(ITO)、インジウム亜鉛酸化物(IZO)等の無機酸化物や、ポリチオフェン誘導体、ポリアニリン誘導体等の高電荷輸送性有機化合物が挙げられ、複数の陰極材料を積層したり、混合したりして使用することができる。
 陰極層の形成方法も、上記と同様、陰極層材料が難溶性、難分散性昇華性材料の場合には上述した各種ドライプロセスが選択され、溶液材料あるいは分散液材料の場合には、組成物の粘度と表面張力、所望する薄膜の厚さ等を考慮し、上述した各種ウェットプロセス法の中から最適なものが採用される。
[Formation of cathode layer]: a step of forming a cathode layer on the formed electron collection layer. Examples of cathode materials include metals such as aluminum, magnesium-silver alloy, aluminum-lithium alloy, lithium, sodium, potassium, cesium, calcium, barium, silver, and gold; inorganic oxides such as indium tin oxide (ITO) and indium zinc oxide (IZO); and organic compounds with high charge transport properties such as polythiophene derivatives and polyaniline derivatives. A plurality of cathode materials can be used by stacking or mixing them.
As for the method of forming the cathode layer, similarly to the above, when the cathode layer material is a poorly soluble or poorly dispersible sublimable material, the various dry processes described above are selected, and when the cathode layer material is a solution material or dispersion material, an optimal one is adopted from the various wet processes described above, taking into consideration the viscosity and surface tension of the composition, the desired thickness of the thin film, and the like.

[キャリアブロック層の形成]
 必要に応じて、光電流の整流性をコントロールすること等を目的として、任意の層間にキャリアブロック層を設けてもよい。キャリアブロック層を設ける場合、通常、活性層と、正孔捕集層または陽極との間に電子ブロック層を、活性層と、電子捕集層または陰極との間に正孔ブロック層を挿入する場合が多いが、この限りではない。
 正孔ブロック層を形成する材料としては、酸化チタン、酸化亜鉛、酸化スズ、バソクプロイン(BCP)、4,7-ジフェニル1,10-フェナントロリン(BPhen)等が挙げられる。
 電子ブロック層を形成する材料としては、N,N′-ジ(1-ナフチル)-N,N′-ジフェニルベンジジン(α-NPD)、ポリ(トリアリールアミン)(PTAA)等のトリアリールアミン系材料等が挙げられる。
[Formation of Carrier Block Layer]
If necessary, a carrier block layer may be provided between any layers for the purpose of controlling the rectification of photocurrent, etc. When a carrier block layer is provided, usually, an electron block layer is inserted between the active layer and the hole collecting layer or the anode, and a hole block layer is inserted between the active layer and the electron collecting layer or the cathode, but this is not limited thereto.
Examples of materials for forming the hole blocking layer include titanium oxide, zinc oxide, tin oxide, bathocuproine (BCP), and 4,7-diphenyl-1,10-phenanthroline (BPhen).
Examples of materials for forming the electron blocking layer include triarylamine-based materials such as N,N'-di(1-naphthyl)-N,N'-diphenylbenzidine (α-NPD) and poly(triarylamine) (PTAA).

 キャリアブロック層の形成方法も、上記と同様、キャリアブロック層材料が難溶性、難分散性昇華性材料の場合には上述した各種ドライプロセスが選択され、溶液材料あるいは分散液材料の場合には、組成物の粘度と表面張力、所望する薄膜の厚さ等を考慮し、上述した各種ウェットプロセス法の中から最適なものが採用される。 As for the method of forming the carrier block layer, similarly to the above, when the carrier block layer material is a poorly soluble or poorly dispersible sublimable material, the various dry processes mentioned above are selected, and when it is a solution material or dispersion material, the viscosity and surface tension of the composition, the desired thin film thickness, etc. are taken into consideration and the optimum one is selected from the various wet process methods mentioned above.

(2)順積層型ペロブスカイト太陽電池
[陰極層の形成]:透明基板の表面に陰極材料の層を形成し、透明陰極基板を製造する工程
 陰極材料としては、上記逆積層型の陽極材料で例示したものに加え、フッ素ドープ酸化錫(FTO)が挙げられ、透明基板としては、上記逆積層型の陽極材料で例示したものが挙げられる。
 陰極材料の層(陰極層)の形成方法も、難溶性、難分散性昇華性材料の場合には上述したドライプロセスが選択され、溶液材料あるいは分散液材料の場合には、組成物の粘度と表面張力、所望する薄膜の厚さ等を考慮し、上述した各種ウェットプロセス法の中から最適なものが採用される。
 また、この場合も市販の透明陰極基板を好適に用いることができ、素子の歩留を向上させる観点からは、平滑化処理がされている基板を用いることが好ましい。市販の透明陰極基板を用いる場合、本発明のペロブスカイト太陽電池の製造方法は、陰極層を形成する工程を含まない。
 無機酸化物を陰極材料として使用して透明陰極基板を形成する場合、逆積層型の陽極材料と同様の洗浄処理や、表面処理を施してもよい。
(2) Normal stacking type perovskite solar cell [Formation of cathode layer]: A step of forming a layer of a cathode material on the surface of a transparent substrate to manufacture a transparent cathode substrate. In addition to those exemplified as the reverse stacking type anode materials above, examples of the cathode material include fluorine-doped tin oxide (FTO). Examples of the transparent substrate include those exemplified as the reverse stacking type anode materials above.
As for the method of forming the layer of the cathode material (cathode layer), in the case of a poorly soluble or poorly dispersible sublimable material, the above-mentioned dry process is selected, and in the case of a solution material or dispersion material, an optimum one is adopted from among the various wet processes described above, taking into consideration the viscosity and surface tension of the composition, the desired thickness of the thin film, and the like.
In this case, a commercially available transparent cathode substrate can be suitably used, and from the viewpoint of improving the yield of the device, it is preferable to use a substrate that has been subjected to a smoothing treatment. When a commercially available transparent cathode substrate is used, the method for producing a perovskite solar cell of the present invention does not include a step of forming a cathode layer.
When an inorganic oxide is used as the cathode material to form a transparent cathode substrate, the substrate may be subjected to the same cleaning treatment and surface treatment as in the case of the inversely laminated anode material.

[電子捕集層の形成]:形成された陰極上に電子捕集層を形成する工程
 必要に応じて、電荷の移動を効率化すること等を目的として、活性層と陰極層の間に電子捕集層を形成してもよい。
 電子捕集層を形成する材料としては、上記逆積層型の材料で例示したものに加え、酸化亜鉛(ZnO)、酸化チタン(TiO)、酸化スズ(SnO)等が挙げられる。
 電子捕集層の形成方法も、難溶性、難分散性昇華性材料の場合には上述したドライプロセスが選択され、溶液材料あるいは分散液材料の場合には、組成物の粘度と表面張力、所望する薄膜の厚さ等を考慮し、上述した各種ウェットプロセス法の中から最適なものが採用される。また、無機酸化物の前駆体層をウェットプロセス(特にスピンコート法かスリットコート法)を用いて陰極上に形成し、焼成して無機酸化物の層を形成する方法を採用することもできる。
[Formation of Electron Collecting Layer]: Step of forming an electron collecting layer on the formed cathode If necessary, an electron collecting layer may be formed between the active layer and the cathode layer for the purpose of improving the efficiency of charge transfer, etc.
Examples of materials for forming the electron collection layer include zinc oxide (ZnO), titanium oxide (TiO), tin oxide (SnO), and the like, in addition to the above-mentioned examples of the inversely laminated type materials.
As for the method of forming the electron collection layer, in the case of a poorly soluble or poorly dispersible sublimable material, the above-mentioned dry process is selected, and in the case of a solution material or dispersion material, an optimum one is selected from the above-mentioned various wet process methods taking into consideration the viscosity and surface tension of the composition, the desired thickness of the thin film, etc. Also, a method can be used in which an inorganic oxide precursor layer is formed on the cathode using a wet process (particularly a spin coating method or a slit coating method), and then baked to form an inorganic oxide layer.

[活性層の形成]:形成された電子捕集層上に活性層を形成する工程
 活性層として、上述したペロブスカイト半導体化合物を含有する活性層を形成する。
 活性層の形成方法も、上記逆積層型の活性層で説明した方法と同様である。
[Formation of Active Layer]: Step of forming an active layer on the formed electron-collecting layer An active layer containing the above-mentioned perovskite semiconductor compound is formed as the active layer.
The method for forming the active layer is the same as that described for the inverted laminate type active layer.

[正孔捕集層の形成]:形成された活性層材料の層上に正孔捕集層を形成する工程
 上記方法に従い、活性層材料の層上に、本発明の組成物を用いて正孔捕集層を形成する。
[Formation of hole-collecting layer]: Step of forming a hole-collecting layer on the layer of active layer material formed According to the above-mentioned method, a hole-collecting layer is formed on the layer of active layer material using the composition of the present invention.

[陽極層の形成]:形成された正孔捕集層の上に陽極層を形成する工程
 陽極材料としては、上記逆積層型の陽極材料と同様のものが挙げられ、陽極層の形成方法としても、逆積層型の陰極層と同様である。
[Formation of anode layer]: a step of forming an anode layer on the formed hole collection layer. Examples of the anode material include the same materials as those for the above-mentioned reverse stack-type anode material, and the method for forming the anode layer is also the same as that for the reverse stack-type cathode layer.

[キャリアブロック層の形成]
 逆積層型の素子と同様、必要に応じて、光電流の整流性をコントロールすること等を目的として、任意の層間にキャリアブロック層を設けてもよい。
 正孔ブロック層を形成する材料および電子ブロック層を形成する材料としては、上記と同様のものが挙げられ、キャリアブロック層の形成方法も上記と同様である。
[Formation of Carrier Block Layer]
As in the inverted stack type element, a carrier block layer may be provided between any layers as necessary for the purpose of controlling the rectification of the photocurrent.
The materials for forming the hole blocking layer and the materials for forming the electron blocking layer are the same as those described above, and the method for forming the carrier blocking layer is also the same as above.

 上記で例示した方法によって作製されたペロブスカイト太陽電池素子は、大気による素子劣化を防ぐために、再度グローブボックス内に導入して窒素等の不活性ガス雰囲気下で封止操作を行い、封止された状態で太陽電池としての機能を発揮させたり、太陽電池特性の測定を行ったりすることができる。
 封止法としては、端部にUV硬化樹脂を付着させた凹型ガラス基板を、不活性ガス雰囲気下、ペロブスカイト太陽電池素子の成膜面側に付着させ、UV照射によって樹脂を硬化させる方法や、真空下、スパッタリング等の手法によって膜封止タイプの封止を行う方法などが挙げられる。
The perovskite solar cell element produced by the method exemplified above can be introduced back into the glove box and sealed in an inert gas atmosphere such as nitrogen to prevent element deterioration due to atmospheric air, and in the sealed state it can be allowed to function as a solar cell or the solar cell characteristics can be measured.
Examples of the sealing method include a method in which a concave glass substrate with a UV-curable resin attached to the edge is attached to the film-forming surface of the perovskite solar cell element in an inert gas atmosphere and the resin is cured by UV irradiation, and a method in which a film-sealing type sealing is performed by a technique such as sputtering in a vacuum.

 以下、実施例および比較例を挙げて、本発明をより具体的に説明するが、本発明は下記の実施例に限定されるものではない。 The present invention will be explained in more detail below with reference to examples and comparative examples, but the present invention is not limited to the following examples.

 電荷輸送性組成物の調製で用いた略号は以下のとおりである。
<ポリイミド前駆体の合成>
<テトラカルボン酸二無水物>
 下記式MS-1~MS-5で表されるテトラカルボン酸二無水物

Figure JPOXMLDOC01-appb-C000067
<ジアミン>
 下記式DA-1~DA-4で表されるジアミン化合物
Figure JPOXMLDOC01-appb-C000068
<溶媒>
 NEP:N-エチル-2-ピロリドン
 BCS:ブチルセロソルブ
<電子受容性ドーパント物質>
 下記式DP-1~DP-4で表される電子受容性ドーパント物質
Figure JPOXMLDOC01-appb-C000069
The abbreviations used in the preparation of the charge transport composition are as follows.
<Synthesis of polyimide precursor>
<Tetracarboxylic acid dianhydride>
Tetracarboxylic acid dianhydrides represented by the following formulae MS-1 to MS-5
Figure JPOXMLDOC01-appb-C000067
<Diamine>
Diamine compounds represented by the following formulae DA-1 to DA-4
Figure JPOXMLDOC01-appb-C000068
<Solvent>
NEP: N-ethyl-2-pyrrolidone BCS: Butyl cellosolve <electron-accepting dopant substance>
Electron-accepting dopant substances represented by the following formulas DP-1 to DP-4
Figure JPOXMLDOC01-appb-C000069

 ポリイミド前駆体(ポリアミック酸)の分子量測定条件は、以下のとおりである。
装置:(株)センシュー科学製 常温ゲル浸透クロマトグラフィー(GPC)装置(SSC-7200)
カラム:Shodex社製カラム(KD-803、KD-805)
カラム温度:50℃
溶離液:N,N’-ジメチルホルムアミド(添加剤として、臭化リチウム-水和物(LiBr・H2O)が30mmol/L、リン酸・無水結晶(o-リン酸)が30mmol/L、テトラヒドロフラン(THF)が10ml/L)
流速:1.0ml/分
検量線作成用標準サンプル:東ソー(株)製 TSK 標準ポリエチレンオキサイド(分子量約900,000、150,000、100,000、30,000)、および、ポリマーラボラトリー社製 ポリエチレングリコール(分子量 約12,000、4,000、1,000)。
The conditions for measuring the molecular weight of the polyimide precursor (polyamic acid) are as follows.
Apparatus: Room temperature gel permeation chromatography (GPC) apparatus (SSC-7200) manufactured by Senshu Scientific Co., Ltd.
Column: Shodex column (KD-803, KD-805)
Column temperature: 50°C
Eluent: N,N'-dimethylformamide (additives: lithium bromide hydrate (LiBr.H 2 O) 30 mmol/L, phosphoric acid anhydrous crystal (o-phosphoric acid) 30 mmol/L, tetrahydrofuran (THF) 10 ml/L)
Flow rate: 1.0 ml/min. Standard samples for preparing calibration curves: TSK standard polyethylene oxide (molecular weights: approximately 900,000, 150,000, 100,000, and 30,000) manufactured by Tosoh Corporation, and polyethylene glycol (molecular weights: approximately 12,000, 4,000, and 1,000) manufactured by Polymer Laboratory.

 ポリイミド前駆体溶液(ポリアミック酸溶液)の粘度測定条件は、以下のとおりである。
 E型粘度計TVE-22H(東機産業(株)製)を用い、サンプル量1.1mL、コーンロータTE-1(1°34’、R24)、温度25℃で測定した。
The conditions for measuring the viscosity of the polyimide precursor solution (polyamic acid solution) are as follows.
The measurements were performed using an E-type viscometer TVE-22H (manufactured by Toki Sangyo Co., Ltd.) with a sample volume of 1.1 mL, a cone rotor TE-1 (1°34′, R24), and a temperature of 25° C.

[合成例1]
 MS-1(3.36g、13.4mmol)、DA-1(6.63g、14mmol)をNEP(89.94g)中で溶解し、40℃で20時間反応させポリアミック酸溶液(A1)を得た。
 得られたポリアミック酸溶液の粘度は72mPa・sであり、このポリアミック酸の数平均分子量は9,500、重量平均分子量は42,300であった。
[Synthesis Example 1]
MS-1 (3.36 g, 13.4 mmol) and DA-1 (6.63 g, 14 mmol) were dissolved in NEP (89.94 g) and reacted at 40° C. for 20 hours to obtain a polyamic acid solution (A1).
The viscosity of the resulting polyamic acid solution was 72 mPa·s, and the number average molecular weight of this polyamic acid was 9,500 and the weight average molecular weight was 42,300.

[合成例2]
 MS-1(3.53g、14.1mmol)、DA-2(6.32g、15mmol)をNEP(88.66g)中で溶解し、40℃で20時間反応させポリアミック酸溶液(A2)を得た。
 得られたポリアミック酸溶液の粘度は101mPa・sであり、このポリアミック酸の数平均分子量は10,100、重量平均分子量は52,200であった。
[Synthesis Example 2]
MS-1 (3.53 g, 14.1 mmol) and DA-2 (6.32 g, 15 mmol) were dissolved in NEP (88.66 g) and reacted at 40° C. for 20 hours to obtain a polyamic acid solution (A2).
The viscosity of the resulting polyamic acid solution was 101 mPa·s, and the number average molecular weight of this polyamic acid was 10,100 and the weight average molecular weight was 52,200.

[合成例3]
 MS-1(4.71g、 18.8mmol)、DA-3(3.98g、20mmol)をNEP(78.2g)中で溶解し、40℃で24時間反応させポリアミック酸溶液(A3)を得た。
 得られたポリアミック酸溶液の粘度は86.3mPa・sであり、このポリアミック酸の数平均分子量は10,120、重量平均分子量は26,357であった。
[Synthesis Example 3]
MS-1 (4.71 g, 18.8 mmol) and DA-3 (3.98 g, 20 mmol) were dissolved in NEP (78.2 g) and reacted at 40° C. for 24 hours to obtain a polyamic acid solution (A3).
The viscosity of the resulting polyamic acid solution was 86.3 mPa·s, and the number average molecular weight of this polyamic acid was 10,120 and the weight average molecular weight was 26,357.

[合成例4]
 MS-1(4.70g、16.3mmol)、DA-4(4.27g、20mmol)をNEP(80.73g)中で溶解し、40℃で24時間反応させポリアミック酸溶液(A4)を得た。
 得られたポリアミック酸溶液の粘度は100mPa・sであり、このポリアミック酸の数平均分子量は9,442、重量平均分子量は38,736あった。
[Synthesis Example 4]
MS-1 (4.70 g, 16.3 mmol) and DA-4 (4.27 g, 20 mmol) were dissolved in NEP (80.73 g) and reacted at 40° C. for 24 hours to obtain a polyamic acid solution (A4).
The viscosity of the resulting polyamic acid solution was 100 mPa·s, and the number average molecular weight of this polyamic acid was 9,442 and the weight average molecular weight was 38,736.

[合成例5]
 MS-2(9.41g、47.51mmol)、DA-3(9.96g、50mmol)をNEP(77.50g)中で溶解し、25℃で6時間反応させポリアミック酸溶液(A5)を得た。
 得られたポリアミック酸溶液の粘度は1,350mPa・sであり、このポリアミック酸の数平均分子量は7,831、重量平均分子量は16,975であった。
[Synthesis Example 5]
MS-2 (9.41 g, 47.51 mmol) and DA-3 (9.96 g, 50 mmol) were dissolved in NEP (77.50 g) and reacted at 25° C. for 6 hours to obtain a polyamic acid solution (A5).
The viscosity of the resulting polyamic acid solution was 1,350 mPa·s, and the number average molecular weight of this polyamic acid was 7,831 and the weight average molecular weight was 16,975.

[合成例6]
 MS-3(3.61g、18.4mmol)、DA-3(3.99g、20mmol)をNEP(87.32g)中で溶解し、25℃で4時間反応させポリアミック酸溶液(A6)を得た。
 得られたポリアミック酸溶液の粘度は56.5mPa・sであり、このポリアミック酸の数平均分子量は7,984、重量平均分子量は20,233であった。
[Synthesis Example 6]
MS-3 (3.61 g, 18.4 mmol) and DA-3 (3.99 g, 20 mmol) were dissolved in NEP (87.32 g) and reacted at 25° C. for 4 hours to obtain a polyamic acid solution (A6).
The viscosity of the resulting polyamic acid solution was 56.5 mPa·s, and the number average molecular weight of this polyamic acid was 7,984 and the weight average molecular weight was 20,233.

[合成例7]
 MS-4(4.01g、18.4mmol)、DA-3(3.99g、20mmol)をNEP(91.98g)中で溶解し、25℃で6時間反応させポリアミック酸溶液(A7)を得た。
 得られたポリアミック酸溶液の粘度は80.4mPa・sであり、このポリアミック酸の数平均分子量は7,631、重量平均分子量は16,587であった。
[Synthesis Example 7]
MS-4 (4.01 g, 18.4 mmol) and DA-3 (3.99 g, 20 mmol) were dissolved in NEP (91.98 g) and reacted at 25° C. for 6 hours to obtain a polyamic acid solution (A7).
The viscosity of the resulting polyamic acid solution was 80.4 mPa·s, and the number average molecular weight of this polyamic acid was 7,631 and the weight average molecular weight was 16,587.

[合成例8]
 MS-5(4.42g、14.1mmol)、DA-3(2.99g、15mmol)をNEP(83.60g)中で溶解し、25℃で6時間反応させポリアミック酸溶液(A8)を得た。
 得られたポリアミック酸溶液の粘度は29.7mPa・sであり、このポリアミック酸の数平均分子量は5,240、重量平均分子量は10,625であった。
[Synthesis Example 8]
MS-5 (4.42 g, 14.1 mmol) and DA-3 (2.99 g, 15 mmol) were dissolved in NEP (83.60 g) and reacted at 25° C. for 6 hours to obtain a polyamic acid solution (A8).
The viscosity of the resulting polyamic acid solution was 29.7 mPa·s, and the number average molecular weight of this polyamic acid was 5,240 and the weight average molecular weight was 10,625.

<電荷輸送性組成物の調製>
[実施例1-1]
 合成例1で得られたポリアミック酸溶液(A1)2gにNEP 6g、BCS 2gを加え、25℃で1時間撹拌し、溶液1を得た。これとは別に、NEP 7.84g、BCS 1.96gの混合溶媒に200mgのDP-1を溶解させ、溶液2を得た。質量比で、DP-1が電荷輸送性物質1に対し、0.2になるように溶液1と2を混合し、孔径0.45μmのシリンジフィルターで濾過することで、ポリアミック酸濃度2.0質量%の電荷輸送性組成物(B1a)を得た。
<Preparation of Charge Transport Composition>
[Example 1-1]
6 g of NEP and 2 g of BCS were added to 2 g of the polyamic acid solution (A1) obtained in Synthesis Example 1, and the mixture was stirred at 25° C. for 1 hour to obtain solution 1. Separately, 200 mg of DP-1 was dissolved in a mixed solvent of 7.84 g of NEP and 1.96 g of BCS to obtain solution 2. Solutions 1 and 2 were mixed so that the mass ratio of DP-1 to charge transporting substance 1 was 0.2, and the mixture was filtered through a syringe filter having a pore size of 0.45 μm to obtain a charge transporting composition (B1a) having a polyamic acid concentration of 2.0 mass %.

[実施例1-2~1-4]
 電子受容性ドーパント物質DP-1を、DP-2~DP-4に変更した以外は、実施例1-1と同様の方法により電荷輸送性組成物(B1b)~(B1d)を得た。各電荷輸送性組成物中のポリアミック酸の濃度は2.0質量%となるように調製した。
[Examples 1-2 to 1-4]
Charge transport compositions (B1b) to (B1d) were obtained in the same manner as in Example 1-1, except that the electron-accepting dopant substance DP-1 was changed to DP-2 to DP-4. The concentration of the polyamic acid in each charge transport composition was adjusted to 2.0% by mass.

[実施例2-1~8-4]
 下記表1に示す組成に基づいて、ポリアミック酸溶液およびドーパント物質を変更し、
実施例1-1と同様の方法により電荷輸送性組成物B2a~B8dを得た。
[Examples 2-1 to 8-4]
The polyamic acid solution and the dopant substance were changed based on the composition shown in Table 1 below.
Charge transporting compositions B2a to B8d were obtained in the same manner as in Example 1-1.

[比較例1]
 合成例1で得られたポリアミック酸溶液(A1)2gにNEP 6g、BCS 2gを加え、25℃で1時間撹拌した。孔径0.45μmのシリンジフィルターで濾過することで、ポリアミック酸濃度2.0質量%の電荷輸送性組成物(C1)を得た。
[Comparative Example 1]
6 g of NEP and 2 g of BCS were added to 2 g of the polyamic acid solution (A1) obtained in Synthesis Example 1, and the mixture was stirred for 1 hour at 25° C. The mixture was filtered through a syringe filter having a pore size of 0.45 μm to obtain a charge transporting composition (C1) having a polyamic acid concentration of 2.0 mass %.

[比較例1~8]
 ポリアミック酸溶液(A1)を、それぞれ合成例2~8で得られたポリアミック酸溶液(A2)~(A8)に変更した以外は、比較例1と同様の方法により電荷輸送性組成物(C2)~(C8)を得た。
[Comparative Examples 1 to 8]
Charge transport compositions (C2) to (C8) were obtained in the same manner as in Comparative Example 1, except that the polyamic acid solution (A1) was changed to the polyamic acid solutions (A2) to (A8) obtained in Synthesis Examples 2 to 8, respectively.

[比較例9]
 Clevios P(ヘレウス(株)製のPEDOT:PSS水溶液、1.3質量%水溶液)1.92gに純水を2.48gを加え、25℃で1時間攪拌した。孔径0.45μmのシリンジフィルターで濾過することで、濃度0.50質量%の電荷輸送性組成物(C9)を得た。
[Comparative Example 9]
2.48 g of pure water was added to 1.92 g of Clevios P (a 1.3 mass% aqueous solution of PEDOT:PSS manufactured by Heraeus Corporation), and the mixture was stirred for 1 hour at 25° C. The mixture was filtered through a syringe filter having a pore size of 0.45 μm to obtain a charge transport composition (C9) having a concentration of 0.50 mass%.

 下記表1に、電荷輸送性組成物B1a~B8dおよび電荷輸送性組成物C1~C9のインク組成をまとめる。 The ink compositions of charge transport compositions B1a to B8d and charge transport compositions C1 to C9 are summarized in Table 1 below.

Figure JPOXMLDOC01-appb-T000070
Figure JPOXMLDOC01-appb-T000070

<有機光電変換素子の作製>
 使用した装置は以下のとおりである。
(1)グローブボックス:山八物産(株)製、VACグローブボックスシステム
(2)蒸着装置:アオヤマエンジニアリング(株)製、真空蒸着装置
(3)ソーラーシミュレーター:分光計器(株)製、OTENTOSUN-III、AM1.5Gフィルター、放射強度:100mW/cm2
(4)ソースメジャーユニット:ケースレーインスツルメンツ(株)製、2612A
<Preparation of organic photoelectric conversion element>
The equipment used is as follows:
(1) Glove box: VAC glove box system manufactured by Yamahachi Bussan Co., Ltd. (2) Evaporation equipment: Vacuum deposition equipment manufactured by Aoyama Engineering Co., Ltd. (3) Solar simulator: OTENTOSUN-III, AM1.5G filter manufactured by Bunkoukeiki Co., Ltd., radiation intensity: 100 mW/cm 2
(4) Source measure unit: Keithley Instruments, Inc., 2612A

[活性層用前駆体液の調製]
[調製例1]
 グローブボックス中でバイアル瓶に、ホルムアミジニウムヨージドを504mg、メチルアンモニウムブロミドを65mg、ヨウ化鉛(II)を1,487mg、臭化鉛(II)を214mg加えた。次に、ジメチルスルホキシド(DMSO)を2,346μL,N,N-ジメチルホルムアミドを586μL加え、70℃15分加熱攪拌することで溶解した。さらに、1.5mоl/LとなるようにDMSOで溶解したヨウ化セシウム溶液を134μL加えることで、活性層用前駆体液1を調製した。
[Preparation of active layer precursor liquid]
[Preparation Example 1]
In a glove box, 504 mg of formamidinium iodide, 65 mg of methylammonium bromide, 1,487 mg of lead (II) iodide, and 214 mg of lead (II) bromide were added to a vial. Next, 2,346 μL of dimethyl sulfoxide (DMSO) and 586 μL of N,N-dimethylformamide were added, and the mixture was heated and stirred at 70° C. for 15 minutes to dissolve the mixture. Furthermore, 134 μL of a cesium iodide solution dissolved in DMSO to a concentration of 1.5 mol/L was added to prepare active layer precursor liquid 1.

[電子捕集層用塗布液の調製]
[調製例2]
 バイアル瓶に[6,6]-フェニル-C61-酢酸メチル(フロンティアカーボン(株)製)を150mg加えた。さらにクロロベンゼンを5,000μL加え、15分攪拌することで、電荷捕集層用塗布液1を調製した。
[Preparation of Coating Solution for Electron Collection Layer]
[Preparation Example 2]
150 mg of [6,6]-phenyl-C 61 -methyl acetate (manufactured by Frontier Carbon Co., Ltd.) was added to a vial, and 5,000 μL of chlorobenzene was further added and stirred for 15 minutes to prepare coating solution 1 for the charge collection layer.

[調製例3]
 バイアル瓶にバソクプロイン(東京化成工業(株)製)を2.5mg加えた。さらに2-プロパノール(関東化学(株)製)を5,000μL加え、1時間攪拌することで、電荷捕集層用塗布液2を調製した。
[Preparation Example 3]
2.5 mg of bathocuproine (manufactured by Tokyo Chemical Industry Co., Ltd.) was added to the vial, and 5,000 μL of 2-propanol (manufactured by Kanto Chemical Co., Ltd.) was further added and stirred for 1 hour to prepare coating solution 2 for charge collection layer.

[光電変換素子の作製]
[実施例9-1]
 陽極となるITO透明導電層を10mm×25mmのストライプ状にパターニングした25mm×25mmのガラス基板を15分間UV/オゾン処理した。この基板に、実施例1-1で調製した電荷輸送性組成物B1aを滴下し、スピンコート法(SC)により塗布した。ホットプレート上にて100℃で10分間加熱することで、正孔捕集層を形成した。正孔捕集層の膜厚は約30nmであった。
 基板をグローブボックスに導入し、形成した正孔捕集層上に調製例1で得た活性層用前駆体液1を滴下しSCにより塗布した。SC中の基板にクロロベンゼンを滴下した。得られた基板をホットプレート上にて105℃で30分間加熱することで、活性層を形成した。活性層の膜厚は約400nmであった。
 形成した活性層上に調製例2で得た電子捕集層用塗布液1をSCにより塗布した。ホットプレート上にて100℃で10分間加熱した。さらに、この基板に調製例3で得た電子捕集層用塗布液2をSCにより塗布することで、電子捕集層を形成した。電子捕集層用塗布液1より得られた層の膜厚は約30nm、電子捕集層用塗布液2より得られた層の膜厚は約8nmであった、
 最後に、上記各層を積層した基板を真空蒸着装置内に設置して、装置内の真空度が1×10-3Pa以下になるまで排気し、抵抗加熱法によって、陰極となる銀層を100nmの厚さに蒸着することで、ストライプ状のITO層と銀層とが交差する部分の面積が8mm×3mmである光電変換素子D1aを作製した。
[Fabrication of photoelectric conversion element]
[Example 9-1]
A 25 mm x 25 mm glass substrate on which an ITO transparent conductive layer serving as an anode was patterned into a 10 mm x 25 mm stripe shape was subjected to UV/ozone treatment for 15 minutes. The charge transport composition B1a prepared in Example 1-1 was dropped onto this substrate and applied by spin coating (SC). A hole collection layer was formed by heating on a hot plate at 100°C for 10 minutes. The thickness of the hole collection layer was about 30 nm.
The substrate was introduced into a glove box, and the active layer precursor liquid 1 obtained in Preparation Example 1 was dropped onto the formed hole collection layer and applied by SC. Chlorobenzene was dropped onto the substrate in SC. The obtained substrate was heated on a hot plate at 105° C. for 30 minutes to form an active layer. The film thickness of the active layer was about 400 nm.
The coating liquid 1 for electron collection layer obtained in Preparation Example 2 was applied by SC onto the formed active layer. The substrate was heated at 100° C. for 10 minutes on a hot plate. The coating liquid 2 for electron collection layer obtained in Preparation Example 3 was further applied by SC onto the substrate to form an electron collection layer. The thickness of the layer obtained from the coating liquid 1 for electron collection layer was about 30 nm, and the thickness of the layer obtained from the coating liquid 2 for electron collection layer was about 8 nm.
Finally, the substrate on which the above layers were laminated was placed in a vacuum deposition apparatus, and the apparatus was evacuated until the degree of vacuum inside the apparatus reached 1 x 10-3 Pa or less. A silver layer to serve as the cathode was evaporated to a thickness of 100 nm using a resistance heating method, thereby producing a photoelectric conversion element D1a having an area of 8 mm x 3 mm at the intersection of the striped ITO layer and the silver layer.

[実施例9-2~16-3、比較例10~18]
 正孔捕集層の形成に用いた電荷輸送性組成物B1aを、それぞれ電荷輸送性組成物B1b~B8cおよび電荷輸送性組成物C1~C9に変更した以外は、実施例9-1と同様の方法により光電変換素子D1b~D8cおよび光電変換素子E1~E9を得た。
[Examples 9-2 to 16-3, Comparative Examples 10 to 18]
Photoelectric conversion elements D1b to D8c and photoelectric conversion elements E1 to E9 were obtained in the same manner as in Example 9-1, except that the charge transporting composition B1a used in forming the hole collection layer was changed to charge transporting compositions B1b to B8c and charge transporting compositions C1 to C9, respectively.

 下記表2に、光電変換素子D1a~D8cおよび光電変換素子E1~E9と使用した電荷輸送性組成物をまとめる。 Table 2 below summarizes the photoelectric conversion elements D1a to D8c and the photoelectric conversion elements E1 to E9 and the charge transport compositions used.

<素子特性評価>
 上記で作製した光電変換素子D1a~D8dおよびE1~E9について、短絡電流密度(Jsc〔mA/cm2〕)、開放電圧(Voc〔V〕)、曲線因子(FF)、および変換効率(PCE〔%〕)を測定した。各光電変換素子のPCE〔%〕の結果を表2に示す。なおPCE〔%〕は、下式により算出した。
PCE〔%〕=Jsc〔mA/cm2〕×Voc〔V〕×FF÷入射光強度(100〔mW/cm2〕)×100
<Element characteristic evaluation>
The short-circuit current density (Jsc [mA/ cm2 ]), open circuit voltage (Voc [V]), fill factor (FF), and conversion efficiency (PCE [%]) were measured for the photoelectric conversion elements D1a to D8d and E1 to E9 prepared above. The PCE [%] results for each photoelectric conversion element are shown in Table 2. The PCE [%] was calculated using the following formula:
PCE [%] = Jsc [mA/cm 2 ] × Voc [V] × FF ÷ Incident light intensity (100 [mW/cm 2 ]) × 100

Figure JPOXMLDOC01-appb-T000071
Figure JPOXMLDOC01-appb-T000071

 各光電変換素子のPCEを比較すると、電子受容性ドーパント物質を含む電荷輸送性組成物を使用した光電変換素子は、含まない光電変換素子よりも高いPCEを示した。さらに、本発明の電荷輸送性組成物は、汎用的な電荷輸送性組成物であるPEDOT:PSSよりも高いPCEを示した。 When comparing the PCE of each photoelectric conversion element, the photoelectric conversion element using a charge transport composition containing an electron-accepting dopant substance exhibited a higher PCE than the photoelectric conversion element that did not. Furthermore, the charge transport composition of the present invention exhibited a higher PCE than PEDOT:PSS, a commonly used charge transport composition.

 電子受容性ドーパント物質の添加によるPCE向上の理由は定かではないが、ポリアミック酸中の2級もしくは3級アミンと電子受容性ドーパント物質の相互作用により、電荷輸送性組成物中のキャリア密度が増加したことが要因と推測する。キャリア密度の増加により、活性層で生成された正孔の効率的な取り出しを実現し、PCEが向上したと考えらえる。 The reason for the improvement in PCE due to the addition of an electron-accepting dopant substance is unclear, but it is speculated that this is due to an increase in carrier density in the charge transport composition caused by interaction between the secondary or tertiary amine in the polyamic acid and the electron-accepting dopant substance. The increase in carrier density is thought to have enabled the efficient extraction of holes generated in the active layer, improving the PCE.

Claims (11)

 有機光電変換素子における電荷輸送性薄膜を形成するための電荷輸送性組成物であって、
電荷輸送性物質と、電子受容性ドーパント物質と、有機溶媒とを含み、
上記電荷輸送性物質が、下記式(1)~(3)で表されるいずれかの構造を有するジアミン成分と、テトラカルボン酸成分とから得られるポリイミド前駆体、上記ポリイミド前駆体のエステルおよび上記ポリイミド前駆体のイミド化物からなる群より選ばれる少なくとも1種のポリイミド系重合体を含む電荷輸送性組成物。
Figure JPOXMLDOC01-appb-C000001
(式中、R1は、水素原子または一価の有機基を表す。*は、他の基に結合する部位を表す。ベンゼン環を形成する任意の水素原子は一価の有機基で置換されていてもよい。)
A charge transporting composition for forming a charge transporting thin film in an organic photoelectric conversion element, comprising:
A charge transporting material, an electron accepting dopant material, and an organic solvent are included,
The charge transporting material is a charge transporting composition comprising at least one polyimide polymer selected from the group consisting of a polyimide precursor obtained from a diamine component having a structure represented by any one of the following formulas (1) to (3) and a tetracarboxylic acid component, an ester of the polyimide precursor, and an imidized product of the polyimide precursor:
Figure JPOXMLDOC01-appb-C000001
(In the formula, R1 represents a hydrogen atom or a monovalent organic group. * represents a bonding site to another group. Any hydrogen atom forming a benzene ring may be substituted with a monovalent organic group.)
 上記電子受容性ドーパント物質が、下記式(An1)で表されるアニオンと、その対カチオンとからなる塩である請求項1記載の電荷輸送性組成物。
Figure JPOXMLDOC01-appb-C000002
(式中、Eは長周期型周期表の第13族に属する元素を表し、Ara1~Ara4は、互いに独立して、置換基を有してもよい芳香族炭化水素基または置換基を有してもよい芳香族複素環基を表す。)
2. The charge transporting composition according to claim 1, wherein the electron accepting dopant substance is a salt comprising an anion represented by the following formula (An1) and its counter cation:
Figure JPOXMLDOC01-appb-C000002
(In the formula, E represents an element belonging to Group 13 of the long form periodic table, and Ar a1 to Ar a4 each independently represent an aromatic hydrocarbon group which may have a substituent or an aromatic heterocyclic group which may have a substituent.)
 上記塩が、オニウム塩である請求項2記載の電荷輸送性組成物。 The charge transport composition according to claim 2, wherein the salt is an onium salt.  上記電子受容性ドーパント物質の含有量が、質量比で、電荷輸送性物質1に対して、0.001~50である請求項2記載の電荷輸送性組成物。 The charge transport composition according to claim 2, wherein the content of the electron-accepting dopant substance is 0.001 to 50 parts by mass per 1 part by mass of the charge transport substance.  上記R1が、水素原子、炭素数1~5のアルキル基、炭素数1~5のフルオロアルキル基またはtert-ブトキシカルボニル基である請求項1記載の電荷輸送性組成物。 2. The charge transporting composition according to claim 1, wherein R 1 is a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, a fluoroalkyl group having 1 to 5 carbon atoms, or a tert-butoxycarbonyl group.  ペロブスカイト光電変換素子の正孔捕集層用である請求項1~5のいずれか1項記載の電荷輸送性組成物。 The charge transport composition according to any one of claims 1 to 5, which is used for a hole collection layer of a perovskite photoelectric conversion element.  請求項1~5のいずれか1項記載の電荷輸送性組成物から得られる電荷輸送性薄膜。 A charge transporting thin film obtained from the charge transporting composition according to any one of claims 1 to 5.  上記電荷輸送性薄膜が、ペロブスカイト光電変換素子の正孔捕集層である請求項7記載の電荷輸送性薄膜。 The charge transport thin film according to claim 7, wherein the charge transport thin film is a hole collection layer of a perovskite photoelectric conversion element.  請求項8記載の電荷輸送性薄膜を備えるペロブスカイト光電変換素子。 A perovskite photoelectric conversion element comprising the charge transport thin film according to claim 8.  逆積層型である請求項9記載のペロブスカイト光電変換素子。 The perovskite photoelectric conversion element according to claim 9, which is of the inverted stacking type.  請求項9記載のペロブスカイト光電変換素子を備える太陽電池。 A solar cell comprising the perovskite photoelectric conversion element according to claim 9.
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