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WO2025089959A1 - Procédé et système de commande d'épaisseur de couche in situ pendant l'impression - Google Patents

Procédé et système de commande d'épaisseur de couche in situ pendant l'impression Download PDF

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Publication number
WO2025089959A1
WO2025089959A1 PCT/NL2024/050592 NL2024050592W WO2025089959A1 WO 2025089959 A1 WO2025089959 A1 WO 2025089959A1 NL 2024050592 W NL2024050592 W NL 2024050592W WO 2025089959 A1 WO2025089959 A1 WO 2025089959A1
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WIPO (PCT)
Prior art keywords
residual layer
layer thickness
determined
roller
resin
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PCT/NL2024/050592
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English (en)
Inventor
Mariana Victoria BALLOTTIN
Jules Theodorus Antonius KIERKELS
Jan Matthijs Ter Meulen
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Morphotonics Holding BV
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Morphotonics Holding BV
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Publication of WO2025089959A1 publication Critical patent/WO2025089959A1/fr
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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70605—Workpiece metrology
    • G03F7/70616—Monitoring the printed patterns
    • G03F7/70625—Dimensions, e.g. line width, critical dimension [CD], profile, sidewall angle or edge roughness

Definitions

  • the invention relates to a method for in situ layer thickness control during imprinting, in particular nanoimprinting.
  • the invention also relates to a system for in situ layer thickness control during imprinting, in particular nanoimprinting.
  • Residual layer thickness (RLT) and residual layer thickness variation are important parameters for texturized surfaces obtained via imprinting, in particular nanoimprinting.
  • the thickness of the residual layer residing in between the imprinted texture and the substrate can affect the efficiency of the devices using the intended texture and RLT variation can result in optical variation over a device.
  • a variation of the residual layer thickness can affect the settings to be used in post-processing of imprinted plates, such as etching. It is therefore highly desired to efficiently reach the intended residual layer thickness and maintain it as constant as possible in a production line.
  • the residual layer thickness of the final product is determined and the data can be taken into account for postprocessing steps.
  • the invention provides thereto a method for in situ layer thickness control during imprinting, in particular nanoimprinting, comprising the steps of: a) providing at least one substrate which is to be imprinted; b) providing at least one substantially flexible stamp comprising at least one textured area and at least one roller configured for exerting pressure onto at least one substantially flexible stamp and/or at least one substrate; c) applying at least one resin onto at least one substantially flexible stamp and/or at least one substrate; d) imprinting at least part of the resin with at least one substantially flexible stamp, such that an imprinted texture on top of a residual layer upon the substrate is obtained; e) curing at least part of the resin; and f) optionally separating at least one substantially flexible stamp and at least one substrate; wherein at least after step d), and/or after step e), and/or after step f), the residual layer thickness of the residual layer is determined and wherein based upon the determined residual layer thickness at least one imprinting parameter in particular of at least one roller, and more in particular the rotational speed,
  • the method according to the present invention provides a solution for controlling the residual layer thickness of an imprinted substrate, or product.
  • the method according to the present invention in particular enables that an intended residual layer thickness can be obtained and that the residual layer thickness can be maintained constant during several imprinting cycles.
  • the residual layer thickness of an imprinted product can vary due to several factors, which can for example be process factors and/or external factors.
  • (nano)imprinting is typically performed in a cleanroom.
  • the imprinting parameters also play an important role in the quality and consistency of the imprint. Important imprinting parameters are the imprint speed, or the rotational speed of the roller, the pressure applied and the temperature.
  • the texture itself as well as the surface properties like surface tension can influence resin flow. And a further important factor of the residual layer thickness is the viscosity of the resin.
  • the viscosity of the resin can also be affected and/or adjusted by imprinting parameters and/or environmental parameters, such as temperature.
  • the method according to the present invention provides an imprinting process during which the residual layer thickness is -in situ- determined and controlled. Determining the (uncured) residual layer thickness after step d) and/or the (cured) residual layer thickness after step e), provides useful information about the product which is produced. Early detection of a deficiency of the (desired) residual layer thickness is enabled and adjustment of at least one imprint parameter, in order to steer the process, can be initiated.
  • the present invention provides for in-line, and direct, non-destructive measurement, monitoring and/or determining of the residual layer thickness of a (nano)imprinting process and uses the obtained data in an advanced feedback loop to directly adjust at least one imprinting parameter in order to closely match the desired residual layer thickness and/or to reduce variations in residual layer thickness.
  • implementation of the present invention will significantly increase the quality and yield of imprinted products in particular in a roll-to-plate nanoimprinting process.
  • Imprinting of at least part of the resin upon at least one substrate via at least one substantially flexible stamp results typically in that an imprinted texture on top of a residual (resin) layer upon the substrate is obtained.
  • the resin layer upon the substrate typically consists of a residual (resin) layer and an imprinted texture. Determining the residual layer thickness after step d), thus after at least part of the resin is imprinted via at least one substantially flexible stamp, means in practise that the resin layer is still uncured.
  • the method can include the step of determining the uncured residual layer thickness after step d) and based upon the determined uncured residual layer thickness at least one imprinting parameter of at least one side of at least one roller, and in particular the rotational speed, the imprint pressure and/or the temperature of at least one roller, can be controlled and/or adjusted.
  • Another imprint parameter could be the height and/or position of at least one roller. With the height and/or position of the roller, the gap height between the roller and the substrate which is to be imprinted, can be meant.
  • the method includes that after step d) and before step e) the residual layer thickness of the residual layer is determined and based upon the determined residual layer thickness at least one imprinting parameter of at least one roller is controlled and/or adjusted.
  • the residual layer will be substantially uncured. It is also imaginable that after step e) and before step f) the residual layer thickness of the residual layer is determined and that based upon the determined residual layer thickness at least one imprinting parameter of at least one roller is controlled and/or adjusted. In such embodiment, at least part of the residual layer will be cured. It is also imaginable that the residual layer thickness is determined at several different stages of the imprinting process. Determining the residual layer thickness is preferably performed at a critical area of the imprinted substrate, such as the textured area.
  • At least one imprinting parameter of at least one roller includes the rotational speed, the imprint pressure and/or the temperature in particular of at least one roller.
  • These imprinting parameters were found to be of relevance for the characteristics of the residual layer thickness of the residual layer upon the imprinted substrate. It is also imaginable that the method includes that multiple imprinting parameters are controlled and/or adjusted based upon the determined residual layer thickness.
  • the rotational speed, or imprinting speed, of at least one roller is decreased if the determined residual layer thickness is larger than a predetermined reference thickness and/or the rotational speed, or imprinting speed, of at least one roller is increased if the determined residual layer thickness is smaller than a predetermined reference thickness.
  • a higher rotational speed of the roller(s), or imprinting speed, will result in that the residual layer thickness will increase.
  • a lower rotational speed of the roller(s), or imprinting speed will result in that the residual layer thickness will decrease.
  • Adjusting the rotational speed of at least one roller can for example be done by making use of at least one actuator.
  • the change in rotational speed of the at least one roller can be a direct result, adjusting the speed of the motor driving the roller, or an indirect result where the roller is following the speed of other adjusted movements like the movement of the stamp.
  • Adapting the rotational speed will have an immediate effect on the produced product, wherefore adapting the rotational speed is a preferred imprinting parameter to base the steering process on.
  • the residual layer thickness equals a predetermined reference thickness. The deviation thereof is for example considered allowable if it is at most 20%, preferably at most 5% and more preferably at most 1% from the predetermined reference thickness.
  • the residual layer thickness differs per batch of imprinted products and/or that the residual layer thickness of a batch made in the morning substantially differs, for example over 20%, from a batch made in the evening. This affects the quality of the products and can cause difficulties in the subsequent post-processing of the imprinted product, for example during etching.
  • the imprint pressure exerted by at least one roller is increased if the determined residual layer thickness is larger than a predetermined reference thickness and/or that the imprint pressure exerted by at least one roller is decreased if the determined residual layer thickness is smaller than a predetermined reference thickness. Increasing the imprinting pressure will result in the residual layer thickness to decrease, whereas decreasing the imprinting pressure will result in the residual layer thickness to increase.
  • the pressure applied by at least one roller, or multiple rollers, can have a direct effect on the residual layer which is produced.
  • the pressure applied is determined based upon different parameters, such as the texture which is to be imprinted, the materials of the (flexible) stamp and substrate which is to be imprinted, the resin composition, the temperature of the roller, and/or the desired residual layer thickness.
  • the pressure can be a useful imprinting parameter for controlling the imprinting process and in particular for the control of the formation of the residual layer and the thickness thereof.
  • the method includes that the temperature of at least one roller is increased if the determined residual layer thickness is larger than a predetermined reference thickness and/or that the temperature of at least one roller is decreased if the determined residual layer thickness is smaller than a predetermined reference thickness. Adjusting the temperature of at least one roller will have an effect on the viscosity of the resin. A higher temperature will result in a less viscous resin, which will subsequently result in a thinner residual layer and thus a smaller residual layer thickness. On the other hand, a lower temperature will result in a more viscous resin, which will result in a thicker residual layer and thus a larger residual layer thickness.
  • the temperature of the roller(s) typically affects the temperature of the substantially flexible stamp which co-acts with at least one roller and thus also of the resin which is imprinted. Hence, heating or cooling of at least one roller will cause a local temperature change within the system which will affect the characteristics of the resin, and thus also the characteristics of the residual layer thickness. In this way, temperature control based upon determined residual layer thickness can further improve the imprinting process. Control and/or change of the temperature of the deposited resin is also a possibility to steer the residual layer thickness. In this case the time to imprinting and cooling of the resin has to be carefully controlled.
  • the amount of resin applied is controlled and/or adjusted based on the determined residual layer thickness. It is for example imaginable that the amount of resin applied is increased or decreased based upon the determined residual layer thickness. In case the residual layer thickness is too thin the amount of resin applied could be increased. It is also imaginable that the amount of resin applied and/or the position where the resin is applied is controlled based on the outflow of resin. It is also imaginable that the invention, and in particular the method and/or system, includes resin outflow control. Within the context of the present invention, resin outflow is defined as the (final) position to where the resin flows as a result of the imprint process. During imprinting, it is desired that a certain pattern area is fully imprinted with resin.
  • the applied amount of resin is more than a defined minimum amount.
  • a small excess of resin is typically applied to ensure that the pattern area can be fully imprinted.
  • the amount of excess resin can be based on theoretical and/or experimental data, and is preferably within a predetermined range or limit. While continuously determining the residual layer thickness it is also possible to detect the position where the outflow of imprinted resin ends since an abrupt end and/or an optical transition could be detected. In an embodiment, this optical transition could be observed from a reflection at the resin outflow edge due to a sudden change in refractive index between the area where resin is present and the surrounding area where no resin is present.
  • Resin outflow can for example also be determined based upon the area and/or volume of outflown resin in particular next to the imprint. In case the determined area and/or volume of outflown resin is over or under a threshold value, the amount of resin applied could be adjusted accordingly. If the position of the end of the resin outflow deviates more than a specific value from the desired value, then a correction in the amount of resin applied can be made. In this way, it can be made certain that the area that needs to be imprinted is always covered by a resin during the imprint. Analogously, the amount of applied resin can be limited to make certain that the resin outflow does not reach unwanted positions.
  • the resin outflow deviates more than a specific value from the desired value, it can also be decided to make a correction in the process settings.
  • the residual layer thickness is indirectly determined by determining the resin outflow. It is imaginable that with a constant amount of resin applied, a longer resin outflow means a thinner residual layer thickness. Resin outflow can for example be determined with at least one sensor and/or further optical measurements.
  • resin outflow textures are added next to the active area.
  • at least one flexible stamp could comprise at least one outflow texture adjacent to the at least one textured area.
  • the reflection and/or transmission of the resin outflow textures will alter based on the presence of resin.
  • the resin outflow and as a derivative the residual layer thickness can be determined.
  • the residual layer thickness is determined based upon the resin outflow and/or resin outflow texture, it is preferred that an excess of resin is applied during step c) of the method.
  • the method according to the invention comprises an inspection step wherein the texture of the imprint is inspected.
  • the imprinted texture is incorrect and/or incomplete the amount of resin applied could be adjusted, for example be increased.
  • at least one imprinting parameter of at least one roller is controlled and/or adjusted, for example the rotational speed, the imprint pressure, the height and/or the temperature of at least one roller can be controlled and/or adjusted based upon at least one inspection step of the imprinted texture.
  • Such embodiment could further contribute to the provision of consistent products which fulfil a high quality standard.
  • the imprinted texture could for example be inspected by making use of a scanner, for example a contact scanner, determining the surface roughness and/or surface profile of the texture.
  • the method according to the present invention could also comprise the step of controlling the viscosity of at least one resin upon application.
  • the viscosity applied is controlled and/or adjusted based upon the determined residual layer thickness.
  • at least one imprinting parameter and the viscosity of the applied resin are both controlled based upon the determined residual layer thickness.
  • the method could focus on an embodiment wherein only the viscosity of the applied resin is adjusted based upon the determined residual layer thickness.
  • the steps as described in the method according to the present invention are in particular subsequent steps. It is imaginable that the residual layer thickness of the residual layer is continuously determined during the imprinting process.
  • the (inline and) continuously determined residual layer thickness can form an input parameter for the imprinting parameters as applied during imprinting.
  • the method can include a control loop wherein the continuously determined values of the residual layer thickness are taken into account for the applied imprinting settings and/or imprinting parameters.
  • the residual layer thickness of the residual layer is determined at at least two different positions in particular of the same residual layer.
  • the residual layer thickness can be determined (or measured) at at least two different regions of the residual layer. It is for example possible that the residual layer thickness is determined at multiple positions parallel to the axis of at least one roller.
  • At least one imprinting parameter can be controlled and/or adjusted based upon at least two determined values of the residual layer thickness, or based upon multiple determined values of the residual layer thickness. It is for example conceivable that the residual layer thickness is determined after step d) and/or after step e) and/or after step f) and that at least one imprinting parameter is controlled and/or adjusted based upon at least two determined values of the residual layer thickness.
  • the residual layer thickness is determined at multiple positions upon the imprinted substrate. It is for example imaginable that the determined residual layer thickness is an average value of multiple determined values. The average value taken into account could be either the mathematical average or a 'non-linear' average. Possibly, the determined residual layer thickness which is taken into account for controlling and/or adjusting at least one imprinting parameter of at least one roller is an average value based upon at least two independently determined residual layer thicknesses of the same imprinted substrate and/or the same residual layer. It is imaginable that the uncured residual layer thickness is determined at multiple positions of the imprinted substrate and/or that the cured residual layer thickness is determined at multiple positions of the imprinted substrate. The use of multiple measurements or multiple determination steps can further enhance the reliability of the determined value and subsequently the accuracy of the adjustment of at least one imprinting parameter which is to be done.
  • the uniformity of the residual layer thickness of the residual layer is determined.
  • at least one imprinting parameter of at least one roller can be controlled and/or adjusted. It is for example imaginable that the residual layer thickness is determined at different positions and/or at different steps in the process. In case a non-uniformity in the residual layer thickness is determined, for example a difference between a first side and a second side of the residual layer, at least one imprinting parameter could be adjusted non-symmetrically.
  • the pressure, height and/or temperature of at least one roller is adjusted such that the non-uniformity of the residual layer thickness can be overcome. It is for example possible that if it is determined that the residual layer thickness on a first side of the residual layer is too thin, but on a second side within a target range, the temperature of a first part of the roller, corresponding to the first side, is decreased and/or that the pressure applied on the first side, or the corresponding distal end, is decreased.
  • At least one imprinting parameter of at least one roller is adjustable in a non-symmetrical fashion.
  • the method and system according to the present invention preferably include the ability of non-symmetrical adjustment of at imprinting parameters.
  • at least one roller comprises multiple temperature zones wherein the temperature of at least one zone, and preferably of each zone can be individually adjusted and/or controlled.
  • At least one roller can for example comprise heating and/or cooling zones in the roller.
  • the system enables independent pressure control of both distal ends of the roller, in particular such that the applied pressure can be non- symmetrically adjusted.
  • at least the imprinting speed of at least one roller is kept constant over the entire roller.
  • the imprinting parameters can be dynamically adjusted during the imprint process, wherefore they are typically dependent on imprint location. For example, at the leading edge, the imprinting speed could be somewhat lower to compensate for the presence of a slightly higher amount of resin. In combination with a slightly higher imprinting speed at the end of the substrate this could compensate for a possible residual layer thickness decrease over the imprint position along the length of the substrate. For a relatively long substrate it might be possible to dynamically change at least one imprinting parameter using the feedback loop. Dynamic control of imprinting parameters can improve further control of the residual layer thickness and the residual layer thickness variation.
  • the residual layer thickness of the residual layer is for example determined by making use of at least one sensor, in particular at least one optical sensor. At least one optical sensor could be configured to directly and/or indirectly determining the residual layer thickness. The residual layer thickness could for example be indirectly determined via the resin outflow. Several techniques could be applied to determine the residual layer thickness.
  • the residual layer thickness is preferably determined in a non-destructive manner. It is for example imaginable that the residual layer thickness is optically determined. It is for example possible that the optical determination step makes use of spectroscopy techniques while measuring the active area inside or outside of the active area at an additional flat or textured imprinted area. It is also imaginable that the residual layer thickness is determined via through-focus scanning optical microscopy (TSOM).
  • TSOM through-focus scanning optical microscopy
  • residual layer thickness could be determined by making use of ultrasound, radio wave absorption, Rbntgen scan, a mechanical contact scanner (AFM), capacitive and/or frequency resonance, a radioactive thickness scanner, surface plasma resonance (SPR), scatterometry and/or Mueller matrix polarimetry.
  • AFM mechanical contact scanner
  • SPR surface plasma resonance
  • Curing at least part of the resin is preferably performed during contact between at least one substantially flexible stamp and the resin. In this way, efficient and effective curing can be achieved wherein a good quality of the imprinted texture can be ensured.
  • the substantially flexible stamp and the substrate are typically separated.
  • a substrate having an imprinted resin layer is then obtained.
  • At least one substrate applied in the method according to the present invention is for example a glass substrate.
  • the substrate can be any type of substrate which is suitable for imprinting. Non-limiting examples are polymer and/or composite base substrates.
  • the substrate to be imprinted preferably has a substantially smooth upper surface. This could positively contribute to the provision of a consistent imprinted layer.
  • the substrate can be provided in a substantially flat configuration.
  • the substrate is preferably substantially flat. It is for example possible that the substrate has a substantially flat upper surface, which upper surface is intended to be imprinted. However, it is also imaginable that the substrate is at least partially curved.
  • the method according to the invention is in particular a roll-to-plate imprinting method.
  • the invention further relates to a system for in situ layer thickness control during imprinting, in particular nanoimprinting, preferably configured for applying of the method according to the present invention, said system comprising:
  • At least one carrier configured for carrying and/or supporting at least one substrate which is to be imprinted
  • At least one substantially flexible stamp comprising at least one textured area and at least one roller configured for exerting pressure onto at least one substantially flexible stamp and/or at least one substrate;
  • control unit for controlling and/or adjusting at least one imprinting parameter of at least one roller, and in particular the rotational speed, the height, the imprint pressure and/or the temperature of at least one roller, based upon the determined residual layer thickness.
  • the system according to the present invention has similar benefits as the method according to the present invention resulting in an improved quality and yield of imprinted products. Any of the described embodiments for the method could apply to the system too.
  • the system according to the present invention in particular benefits from the presence of a control unit configured to perform a feedback loop based on the obtained data based upon which direct adjustment of at least one imprinting parameter can be performed.
  • the system is in particular a roll-to-plate imprinting system.
  • At least one carrier if applied, is in particular configured for carrying and/or providing support to at least one substrate during imprinting.
  • at least one carrier could be formed by at least one (external) support roller.
  • the substantially flexible stamp can also be referred to as flexible substrate.
  • the substantially flexible stamp comprises at least one textured area.
  • the textured area can for example comprise a texture with dimensions typically in the range from 500 micrometer down to 25 nanometer.
  • the flexible stamp is in particular configured for nano-imprint lithography transfer processes. It is also imaginable that at least one flexible stamp is attached to at least one roller and/or that at least one flexible stamp is provided over at least one roller.
  • the roller can for example be at least partially covered with at least one flexible stamp.
  • the system is preferably configured such that at least one imprinting parameter of at least one roller is adjustable in a non-symmetrical fashion.
  • the system may further comprise at least one actuator for adjusting at least one imprinting parameter of at least one roller, for example the rotational speed and/or imprinting speed, the pressure and/or the temperature of at least one roller.
  • at least one control unit is configured to actuate at least one actuator.
  • at least one detection unit comprises at least one sensor, in particular at least one optical sensor. The detection unit is in particular configured for determining the residual layer thickness in a non-destructive manner.
  • the system may further comprise at least one applicator for applying resin to at least one substrate and/or at least one flexible stamp.
  • the applicator may further include at least one heating and/or cooling element for control of the viscosity of the applied resin.
  • Curing of the resin according to the present invention could for example be done via UV curing. It is for example imaginable that at least one resin applied is a crosslinkable resin, in particular crosslinkable upon UV curing.
  • the system could optionally also comprise at least one curing unit, in particular at least one UV curing unit.
  • Method for in situ layer thickness control during imprinting, in particular nanoimprinting comprising the steps of: a) providing at least one substrate which is to be imprinted; b) providing at least one substantially flexible stamp comprising at least one textured area and at least one roller configured for exerting pressure onto at least one substantially flexible stamp and/or at least one substrate; c) applying at least one resin onto at least one substantially flexible stamp and/or at least one substrate; d) imprinting at least part of the resin with at least one substantially flexible stamp, such that an imprinted texture on top of a residual layer upon the substrate is obtained; e) curing at least part of the resin; and f) separating at least one substantially flexible stamp and at least one substrate; wherein at least after step d) and/or after step e) the residual layer thickness of the residual layer is determined and wherein based upon the determined residual layer thickness at least one imprinting parameter of at least one roller is controlled and/or adjusted.
  • At least one imprinting parameter of at least one roller includes the rotational speed, the imprint pressure, the height and/or the temperature of at least one roller.
  • step d) and/or after step e) the uniformity of the residual layer thickness of the residual layer is determined, and wherein based upon the determined uniformity or nonuniformity of the residual layer thickness at least one imprinting parameter of at least one roller is controlled and/or adjusted.
  • System for in situ layer thickness control during imprinting, in particular nanoimprinting preferably configured for applying of the method according to any of the previous clauses, comprising:
  • At least one carrier configured for supporting at least one substrate which is to be imprinted;
  • at least one substantially flexible stamp comprising at least one textured area and at least one roller configured for exerting pressure onto at least one substantially flexible stamp and/or at least one substrate;
  • At least one control unit for controlling and/or adjusting at least one imprinting parameter of at least one roller, based upon the determined residual layer thickness.
  • At least one control unit is configured for controlling and/or adjusting the rotational speed, the imprint pressure, the height and/or the temperature of at least one roller based upon the determined residual layer thickness.
  • At least one detection unit comprises at least one sensor, in particular at least one optical sensor.
  • FIG. 1 shows a schematic representation of a system according to the present invention
  • FIG. 2 shows a block scheme wherein the invention is elucidated
  • FIG. 4 shows part of yet another system according to the present invention.
  • Figure 1 shows a schematic representation of a system 100 according to the present invention.
  • the system 100 as shown is a roll-to-plate imprinting system 100.
  • the system 100 is configured for in situ layer thickness control during imprinting, in particular nanoimprinting.
  • the system 100 is in particular configured for applying of the method according to the present invention.
  • the system 100 as shown comprises a carrier 101 configured for carrying at least one substrate 150 which is to be imprinted. It is also imaginable that the carrier does not form part of the system 100.
  • the system 100 further comprises a substantially flexible stamp
  • the system 100 comprises multiple rollers 103 and the substantially flexible stamp 102 is provided over said rollers 103.
  • the rotational direction of the rollers 103 and the imprinting direction of the imprinting process are indicated with arrows.
  • the system 100 further comprises an UV curing unit 107.
  • the system 100 further comprises at least one detection unit 104 for determining the residual layer thickness of the residual layer and an optional control unit 105 for controlling and/or adjusting at least one imprinting parameter of at least one roller
  • the system 100 also comprises an applicator 106 for applying resin R onto the substrate 150 and/or the substantially flexible stamp 102.
  • the applicator 106 can be a temperature controller.
  • a resin layer is formed upon the substrate 150 which is subsequently imprinted such that a texture inverse to the texture T of the substantially flexible stamp 102 is obtained upon the resin layer on the substrate.
  • the resin layer comprises, or basically consists of, a residual (resin) layer and an imprinted texture.
  • the maximum thickness TR of the resin layer is larger than the residual layer thickness (RLT) of the residual layer.
  • FIG. 2 shows a block scheme defining the invention.
  • the scheme shows the typical steps of the method according to the present invention.
  • the scheme shows a practical example of the feedback loop according to the present invention.
  • initial imprint settings or imprinting parameters are used, which include for example values of the rotational speed, pressure, and/or temperature of at least one roller.
  • the method and system are in particular configured to compare the determined residual layer thickness with at least one predetermined reference thickness, possibly including a tolerance value. While the product is being imprinted, the residual layer thickness (RLT) is continuously determined preferably at different positions. The measured RLT values are then returned to the control unit. If they are within the defined tolerance, the control unit assumes that the desired RLT is achieved, and the initial settings or parameters continue to be used.
  • RLT residual layer thickness
  • any deviation from the desired RLT is identified and appropriate modifications can be made at all times.
  • These modifications are actions A and B and these are shown in figure 2.
  • three main imprinting parameters can be modified: rotational or imprinting speed, imprint pressure, and temperature. Any of these parameters can be chosen to be varied or a combination thereof. First, one of them should be chosen, and when this parameter reaches the limitation of the machine (considering stability and actual limitation), the next parameter must be varied, and so on.
  • actions A and B a listed, given by the feedback loop and performed by the control unit and/or an actuator for each of the imprinting parameters that can be varied.
  • Rotational speed of at least one roller and/or imprinting speed is a roller and/or imprinting speed
  • Action B decrease the temperature.
  • the modification step performed in actions A or B by at least one control unit and/or actuator is preferably as precise as possible, so the RLT correction is done with the least number of imprints as possible.
  • a model including the resin viscosity, imprint speed, imprint pressure and temperature could be used.
  • This model, that can be added to the feedback loop of the control unit, can be material dependent and it can be theoretical or empirical. If a model is not present, a percentage of the imprint speed, imprint pressure and/or temperature can be chosen as new settings or imprinting parameters, depending on the desired and achieved RLT.
  • Figures 3a and 3b show a schematic representation of part of a system 200 according to the present invention and applying of the method according to the present invention.
  • the figures show the presence of a substrate 250 which is to be imprinted.
  • the area 251 which is to be imprinted is indicated in figure 3a.
  • the system 200 comprises an applicator 206 for applying resin R onto the substrate 250 and/or the substantially flexible stamp (not shown).
  • the imprint direction is indicated with an arrow.
  • Figure 3a shows that droplets of resin R are provided on the substrate in the region of the area 251 which is to be imprinted.
  • Figure 3b shows the situation wherein the substrate 250 is imprinted and an imprinted texture 252 is obtained.
  • Figure 3b further shows that there is an excess of resin R after imprinting.
  • At least the indicated area 251 should be covered by resin R.
  • resin R At any position where resin R is present after imprinting outside of area 251 this is considered to be excess of resin Rin order to prevent an overflow of resin, it is imaginable that the amount of resin applied is controlled based on the determined outflow of resin. It is for example imaginable that the position to where the resin R flows as a result of the imprint process is indicated and/or determined.
  • Figure 3b shows the resin borders B1 , B2, B3, B4 which could be applied to determine the resin outflow.
  • At least one minimum border Bm1 , Bm2, Bm3, Bm4 is determined, and that in case the resin outflow does not reach at least one minimum border Bm1 , Bm2, Bm3, Bm4, the amount of resin applied has to be adjusted, in particular increased.
  • maximum borders could also be applied to indicate that the amount of resin should be decreased.
  • the resin borders B1 , B2, B3, B4 can for example be determined via optical analysis. Alternatively, and/or additionally it is also imaginable that the amount of resin outflow is determined based upon the area and/or volume of outflown resin outside the imprinted texture 252.
  • the amount of resin applied could be adjusted accordingly. It is also imaginable that the determined amount of resin outflow is used to determine the residual layer thickness. In case a constant amount of resin is applied and the further process conditions are unaltered, a change in resin borders B1 , B2, B3, B4 could mean that the residual layer thickness has changed.
  • Figure 3b further shows a detailed part of the outflown resin R. It can be seen that the substrate part 250 and the resin part R have a different colour intensity, wherefore the outflow could be determined based on reflectance and/or transmission measurement.
  • Figure 4 shows a schematic representation of part of a system 300 according to the present invention configured for applying the method according to the present invention.
  • the figures show the presence of a substrate 350 which is already imprinted.
  • the (desired) imprinted area 351 is indicated.
  • the imprint direction is indicated with an arrow.
  • the figure further shows that there is an excess of resin R.
  • the substrate 350 comprises measurement areas 353 for resin detection and in particular for residual layer thickness measurements. It is for example imaginable that the measurement areas 353 have the same texture as the imprinted area 351. In this way, the measurement areas 353 can be applied for determining the residual layer thickness of all imprinted areas, but outside the main imprinted area 351 such that the main imprinted area 351 will not be negatively affected. It is also imaginable that the measurement areas 353 comprise a texture which differs from the main imprinted area 351.
  • the measurement areas 353 can for example be optimised for determining the residual layer thickness.

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)

Abstract

L'invention concerne un procédé et un système de commande d'épaisseur de couche in situ pendant l'impression, en particulier une nano-impression qui permettent la commande de l'épaisseur de couche résiduelle d'un produit imprimé. Le procédé comprend les étapes consistant à utiliser un substrat, un tampon sensiblement souple et un rouleau conçu pour exercer une pression sur le tampon souple et/ou le substrat, appliquer une résine sur le tampon et/ou le substrat, imprimer, durcir et séparer le tampon souple et le substrat, le procédé permettant une commande d'épaisseur de couche résiduelle.
PCT/NL2024/050592 2023-10-27 2024-10-25 Procédé et système de commande d'épaisseur de couche in situ pendant l'impression Pending WO2025089959A1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
NL2036140 2023-10-27
NL2036140A NL2036140B1 (en) 2023-10-27 2023-10-27 Method and system for in situ layer thickness control during imprinting

Publications (1)

Publication Number Publication Date
WO2025089959A1 true WO2025089959A1 (fr) 2025-05-01

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Application Number Title Priority Date Filing Date
PCT/NL2024/050592 Pending WO2025089959A1 (fr) 2023-10-27 2024-10-25 Procédé et système de commande d'épaisseur de couche in situ pendant l'impression

Country Status (3)

Country Link
NL (1) NL2036140B1 (fr)
TW (1) TW202532962A (fr)
WO (1) WO2025089959A1 (fr)

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2018027069A1 (fr) * 2016-08-03 2018-02-08 Board Of Regents, The University Of Texas System Lithographie par impression rouleau à rouleau de film programmable
US20180107109A1 (en) * 2016-10-14 2018-04-19 Samsung Display Co., Ltd. Press roller and imprint method using the same
WO2019145418A1 (fr) * 2018-01-26 2019-08-01 Morphotonics Holding B.V. Procédé et équipement de texturage de substrats discrets
WO2021094375A1 (fr) * 2019-11-12 2021-05-20 Morphotonics Holding B.V. Appareil pour un procédé d'impression rouleau-à-plaque comprenant un porte-plaque ayant une cavité

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2018027069A1 (fr) * 2016-08-03 2018-02-08 Board Of Regents, The University Of Texas System Lithographie par impression rouleau à rouleau de film programmable
US20180107109A1 (en) * 2016-10-14 2018-04-19 Samsung Display Co., Ltd. Press roller and imprint method using the same
WO2019145418A1 (fr) * 2018-01-26 2019-08-01 Morphotonics Holding B.V. Procédé et équipement de texturage de substrats discrets
WO2021094375A1 (fr) * 2019-11-12 2021-05-20 Morphotonics Holding B.V. Appareil pour un procédé d'impression rouleau-à-plaque comprenant un porte-plaque ayant une cavité

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NL2036140B1 (en) 2025-05-12

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