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WO2025073428A1 - Système de configuration de spectre de rayonnement - Google Patents

Système de configuration de spectre de rayonnement Download PDF

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Publication number
WO2025073428A1
WO2025073428A1 PCT/EP2024/074925 EP2024074925W WO2025073428A1 WO 2025073428 A1 WO2025073428 A1 WO 2025073428A1 EP 2024074925 W EP2024074925 W EP 2024074925W WO 2025073428 A1 WO2025073428 A1 WO 2025073428A1
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WO
WIPO (PCT)
Prior art keywords
radiation
transducers
optical fiber
substrate
wavelength
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Application number
PCT/EP2024/074925
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English (en)
Inventor
Robin Daniel BUIJS
Amir Abdolvand
Federico Belli
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ASML Netherlands BV
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ASML Netherlands BV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from EP23201188.2A external-priority patent/EP4535071A1/fr
Application filed by ASML Netherlands BV filed Critical ASML Netherlands BV
Publication of WO2025073428A1 publication Critical patent/WO2025073428A1/fr
Pending legal-status Critical Current
Anticipated expiration legal-status Critical

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Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/35—Non-linear optics
    • G02F1/365—Non-linear optics in an optical waveguide structure
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/11—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on acousto-optical elements, e.g. using variable diffraction by sound or like mechanical waves
    • G02F1/125—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on acousto-optical elements, e.g. using variable diffraction by sound or like mechanical waves in an optical waveguide structure
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/35—Non-linear optics
    • G02F1/3528—Non-linear optics for producing a supercontinuum

Definitions

  • the present invention relates to a radiation spectrum configuration system.
  • the radiation spectrum configuration system may form part of a radiation source.
  • the radiation source may form part of a metrology tool.
  • a lithographic apparatus is a machine constructed to apply a desired pattern onto a substrate.
  • a lithographic apparatus can be used, for example, in the manufacture of integrated circuits (ICs).
  • a lithographic apparatus may, for example, project a pattern (also often referred to as “design layout” or “design”) at a patterning device (e.g., a mask) onto a layer of radiation-sensitive material (resist) provided on a substrate (e.g., a wafer).
  • Metrology tools such as a scatterometer, topography measurement system, or position measurement system are used to measure properties of substrates.
  • the measurements may be performed after exposure of a substrate.
  • the measurements may be used to adjust operation of the lithographic apparatus that exposed the substrate to improve pattern reproduction. Adjustments may include modifying the illumination scheme and/or, adjusting the projection optics.
  • the properties of the radiation used by a metrology tool may affect the type and quality of measurements that may be performed.
  • the different wavelengths may for example be provided as a sequence of different wavelengths (i.e. a series of wavelengths). Different radiation wavelengths may also be able to interrogate and discover different properties of a metrology target.
  • Broadband radiation may be useful in metrology systems such as for example level sensors, alignment mark measurement systems, scatterometry tools, or inspection tools.
  • a radiation spectrum configuration system comprising a hollow optical waveguide containing a gas medium and one or more transducers configured to generate an acoustic mode in the gas medium.
  • the use of an acoustic mode provides a modulation of the wavelength of radiation output from the system. This allows a desired wavelength to be selected using an optical switch which is synchronized with the acoustic mode.
  • At least four glass rods may be provided.
  • the radiation source may further comprise an optical switch configured to selectively transmit an output radiation beam provided from the radiation spectrum configuration system, the optical switch being synchronized with the one or more transducers.
  • Figure 1 depicts a schematic overview of a lithographic apparatus
  • Figure 2 depicts a schematic overview of a lithographic cell
  • Figure 3 depicts a schematic representation of holistic lithography, representing a cooperation between three key technologies to optimize semiconductor manufacturing
  • Figure 4 depicts a schematic representation of a scatterometer which may include a radiation source according to an embodiment of the invention
  • Figure 5 depicts a schematic representation of a level sensor which may include a radiation source according to an embodiment of the invention
  • Figure 6 depicts an alignment sensor which may include a radiation source according to an embodiment of the invention
  • Figure 7 depicts a schematic representation of an radiation spectrum configuration system according to an embodiment of the invention.
  • Figure 8 depicts a schematic representation of a radiation source according to an embodiment of the invention.
  • Figure 9 depicts a schematic representation of an acoustic mode of an optical fiber of the radiation source
  • Figure 10 is a graph which shows different output spectra provided from the radiation source
  • Figure 11 is a graph which shows time-averaged intensity of radiation provided from the radiation source
  • Figure 12 depicts a schematic representation of another radiation spectrum configuration system according to an embodiment of the invention.
  • Figure 13 depicts a schematic representation of a radiation spectrum configuration system according to an alternative embodiment of the invention.
  • a lithographic apparatus may use electromagnetic radiation.
  • the wavelength of this radiation determines the minimum size of features which can be formed on the substrate. Typical wavelengths currently in use are 365 nm (i-line), 248 nm, 193 nm and 13.5 nm.
  • a lithographic apparatus which uses extreme ultraviolet (EUV) radiation, having a wavelength within the range 4-20 nm, for example 6.7 nm or 13.5 nm, may be used to form smaller features on a substrate than a lithographic apparatus which uses, for example, radiation with a wavelength of 193 nm.
  • EUV extreme ultraviolet
  • Low-ki lithography may be used to process features with dimensions smaller than the classical resolution limit of a lithographic apparatus.
  • X is the wavelength of radiation employed
  • NA is the numerical aperture of the projection optics in the lithographic apparatus
  • CD is the “critical dimension” (generally the smallest feature size printed, but in this case half-pitch)
  • ki is an empirical resolution factor.
  • sophisticated fine-tuning steps may be applied to the lithographic projection apparatus and/or design layout.
  • RET resolution enhancement techniques
  • the terms “radiation” and “beam” are used to encompass all types of electromagnetic radiation, including ultraviolet radiation (e.g. with a wavelength of 365, 248, 193, 157 or 126 nm) and EUV (extreme ultra-violet radiation, e.g. having a wavelength in the range of about 5-100 nm).
  • reticle may be broadly interpreted as referring to a generic patterning device that can be used to endow an incoming radiation beam with a patterned cross-section, corresponding to a pattern that is to be created in a target portion of the substrate.
  • the term “light valve” can also be used in this context.
  • examples of other such patterning devices include a programmable mirror array and a programmable LCD array.
  • FIG. 1 schematically depicts a lithographic apparatus LA.
  • the lithographic apparatus LA includes an illumination system (also referred to as illuminator) IL configured to condition a radiation beam B (e.g., UV radiation, DUV radiation or EUV radiation), a mask support (e.g., a mask table) MT constructed to support a patterning device (e.g., a mask) MA and connected to a first positioner PM configured to accurately position the patterning device MA in accordance with certain parameters, a substrate support (e.g., a wafer table) WT constructed to hold a substrate (e.g., a resist coated wafer) W and connected to a second positioner PW configured to accurately position the substrate support in accordance with certain parameters, and a projection system (e.g., a refractive projection lens system) PS configured to project a pattern imparted to the radiation beam B by patterning device MA onto a target portion C (e.g., comprising one or more dies) of the substrate W.
  • the illumination system IL receives a radiation beam from a radiation source SO, e.g. via a beam delivery system BD.
  • the illumination system IL may include various types of optical components, such as refractive, reflective, magnetic, electromagnetic, electrostatic, and/or other types of optical components, or any combination thereof, for directing, shaping, and/or controlling radiation.
  • the illuminator IL may be used to condition the radiation beam B to have a desired spatial and angular intensity distribution in its cross section at a plane of the patterning device MA.
  • projection system PS used herein should be broadly interpreted as encompassing various types of projection system, including refractive, reflective, catadioptric, anamorphic, magnetic, electromagnetic and/or electrostatic optical systems, or any combination thereof, as appropriate for the exposure radiation being used, and/or for other factors such as the use of an immersion liquid or the use of a vacuum. Any use of the term “projection lens” herein may be considered as synonymous with the more general term “projection system” PS.
  • the lithographic apparatus LA may be of a type wherein at least a portion of the substrate may be covered by a liquid having a relatively high refractive index, e.g., water, so as to fdl a space between the projection system PS and the substrate W - which is also referred to as immersion lithography. More information on immersion techniques is given in US6952253, which is incorporated herein by reference.
  • the lithographic apparatus LA may also be of a type having two or more substrate supports WT (also named “dual stage”).
  • the substrate supports WT may be used in parallel, and/or steps in preparation of a subsequent exposure of the substrate W may be carried out on the substrate W located on one of the substrate support WT while another substrate W on the other substrate support WT is being used for exposing a pattern on the other substrate W.
  • the lithographic apparatus LA may comprise a measurement stage.
  • the measurement stage is arranged to hold a sensor and/or a cleaning device.
  • the sensor may be arranged to measure a property of the projection system PS or a property of the radiation beam B.
  • the measurement stage may hold multiple sensors.
  • the cleaning device may be arranged to clean part of the lithographic apparatus, for example a part of the projection system PS or a part of a system that provides the immersion liquid.
  • the measurement stage may move beneath the projection system PS when the substrate support WT is away from the projection system PS.
  • the radiation beam B is incident on the patterning device, e.g.
  • the mask MA which is held on the mask support MT, and is patterned by the pattern (design layout) present on patterning device MA.
  • the radiation beam B passes through the projection system PS, which focuses the beam onto a target portion C of the substrate W.
  • the substrate support WT can be moved accurately, e.g., so as to position different target portions C in the path of the radiation beam B at a focused and aligned position.
  • the first positioner PM and possibly another position sensor may be used to accurately position the patterning device MA with respect to the path of the radiation beam B.
  • Patterning device MA and substrate W may be aligned using mask alignment marks Ml, M2 and substrate alignment marks Pl, P2. Although the substrate alignment marks Pl, P2 as illustrated occupy dedicated target portions, they may be located in spaces between target portions. Substrate alignment marks Pl, P2 are known as scribe-lane alignment marks when these are located between the target portions C.
  • the lithographic apparatus LA may form part of a lithographic cell LC, also sometimes referred to as a lithocell or (litho)cluster, which often also includes apparatus to perform pre- and post-exposure processes on a substrate W.
  • a lithographic cell LC also sometimes referred to as a lithocell or (litho)cluster
  • these include spin coaters SC to deposit resist layers, developers DE to develop exposed resist, chill plates CH and bake plates BK, e.g. for conditioning the temperature of substrates W e.g. for conditioning solvents in the resist layers.
  • a substrate handler, or robot, RO picks up substrates W from input/output ports I/Ol, I/O2, moves them between the different process apparatus and delivers the substrates W to the loading bay LB of the lithographic apparatus LA.
  • the devices in the lithocell which are often also collectively referred to as the track, are typically under the control of a track control unit TCU that in itself may be controlled by a supervisory control system SCS, which may also control the lithographic apparatus LA, e.g. via lithography control unit LACU.
  • a supervisory control system SCS which may also control the lithographic apparatus LA, e.g. via lithography control unit LACU.
  • inspection tools may be included in the lithocell LC. If errors are detected, adjustments, for example, may be made to exposures of subsequent substrates or to other processing steps that are to be performed on the substrates W, especially if the inspection is done before other substrates W of the same batch or lot are still to be exposed or processed.
  • An inspection apparatus which may also be referred to as a metrology tool, is used to determine properties of the substrates W, and in particular, how properties of different substrates W vary or how properties associated with different layers of the same substrate W vary from layer to layer.
  • the inspection apparatus may alternatively be constructed to identify defects on the substrate W and may, for example, be part of the lithocell LC, or may be integrated into the lithographic apparatus LA, or may even be a stand-alone device.
  • the inspection apparatus may measure the properties on a latent image (image in a resist layer after the exposure), or on a semi-latent image (image in a resist layer after a post-exposure bake step PEB), or on a developed resist image (in which the exposed or unexposed parts of the resist have been removed), or even on an etched image (after a pattern transfer step such as etching).
  • the patterning process in a lithographic apparatus LA is one of the most critical steps in the processing which requires high accuracy of dimensioning and placement of structures on the substrate W.
  • three systems may be combined in a so called “holistic” control environment as schematically depicted in Fig. 3.
  • One of these systems is the lithographic apparatus LA which is (virtually) connected to a metrology tool MT (a second system) and to a computer system CL (a third system).
  • the key of such “holistic” environment is to optimize the cooperation between these three systems to enhance the overall process window and provide tight control loops to ensure that the patterning performed by the lithographic apparatus LA stays within a process window.
  • the process window defines a range of process parameters (e.g. dose, focus, overlay) within which a specific manufacturing process yields a defined result (e.g. a functional semiconductor device) - typically within which the process parameters in the lithographic process or patterning process are allowed to vary.
  • the position measurement system PMS may comprise an interferometer system.
  • An interferometer system is known from, for example, United States patent US6, 020, 964, fded on July 13, 1998, hereby incorporated by reference.
  • the interferometer system may comprise a beam splitter, a mirror, a reference mirror and a sensor.
  • a beam of radiation is split by the beam splitter into a reference beam and a measurement beam.
  • the measurement beam propagates to the mirror and is reflected by the mirror back to the beam splitter.
  • the reference beam propagates to the reference mirror and is reflected by the reference mirror back to the beam splitter.
  • the measurement beam and the reference beam are combined into a combined radiation beam.
  • the combined radiation beam is incident on the sensor.
  • methods and apparatus for configuring a spectrum of radiation may use a fiber for confining input radiation, and for confining output radiation.
  • the fiber may be a hollow core fiber, and may comprise internal structures to achieve effective guiding and confinement of radiation in the fiber.
  • the fiber may be a hollow core photonic crystal fiber (42-PCF), which is particularly suitable for strong radiation confinement, predominantly inside the hollow core of the fiber, achieving high radiation intensities.
  • the hollow core of the fiber may be filled with a gas acting as a medium that is pumped by pump radiation.
  • a gas acting as a medium that is pumped by pump radiation.
  • Such a fiber and gas arrangement may be used to create a desired radiation spectrum configuration (e.g. a desired wavelength of output radiation).
  • Radiation input to the fiber may be electromagnetic radiation, for example radiation in one or more of the infrared, visible, UV, and extreme UV spectra.
  • the optical fiber may be a hollow-core, photonic crystal fiber of a type comprising anti- resonant structures for confinement of radiation.
  • Such fibers comprising anti-resonant structures are known in the art as anti-resonant fibers, tubular fibers, single-ring fibers, negative curvature fibers or inhibited coupling fibers.
  • the optical fiber may be photonic bandgap fibers (42-PBFs, for example a Kagome fiber).
  • 42-PCFs A number of types of 42-PCFs can be engineered, each based on a different physical guidance mechanism.
  • Two such 42-PCFs include: hollow-core photonic bandgap fibers (42-PBFs) and hollow-core anti-resonant reflecting fibers (42-ARFs).
  • 42-PBFs hollow-core photonic bandgap fibers
  • 42-ARFs hollow-core anti-resonant reflecting fibers
  • the optical fiber 24 comprises an elongate body, which is longer in one dimension compared to the other two dimensions of the fiber. This longer dimension may be referred to as an axial direction and may define an axis of the optical fiber 24. The two other dimensions define a plane which may be referred to as a transverse plane.
  • Figure 7 shows a cross-section of the optical fiber 24 in this transverse plane (i.e. perpendicular to the axis), which is labelled as the x-y plane.
  • the transverse crosssection of the optical fiber 24 may be substantially constant along the fiber axis.
  • the optical fiber 24 and the transducers 26 may have some degree of flexibility.
  • the optical fiber 24 and transducers 26 may therefore be curved rather than straight (although a straight optical fiber and transducers may be used). In some instances therefore the direction of the axis may not, in general, be uniform along the length of the optical fiber.
  • the terms such as the optical axis, the transverse cross-section and the like will be understood to mean the local optical axis, the local transverse cross-section and so on.
  • components are described as being cylindrical or tubular these terms will be understood to encompass such shapes that may have been distorted as the optical fiber 24 is flexed.
  • the optical fiber 24 may have any length and it will be appreciated that the length of the optical fiber 24 may be dependent on the application.
  • the optical fiber 24 may have a length between 1 cm and 10 m, for example, the optical fiber 24 may have a length between 10 cm and 100 cm.
  • the optical fiber 24 comprises: a hollow core 28, a cladding portion 30 surrounding the hollow core; and a jacket portion 32 surrounding and supporting the cladding portion.
  • the cladding portion 30 guides radiation that propagates through the optical fiber 24 predominantly inside the hollow core 28.
  • the guided radiation may be in the form of a Gaussian mode.
  • the hollow core 28 of the optical fiber 24 may be disposed substantially in a central region of the optical fiber, so that the axis of the optical fiber may also define an axis of the hollow core of the optical fiber.
  • Figure 8 depicts a radiation source 40 according to an embodiment of the invention.
  • a pump radiation source 41 and a seed radiation source 43 are provided.
  • the pump radiation source 41 may be pulsed, and may be a laser that is capable of generating short pulses of a desired length and energy level.
  • the seed radiation source 43 may provide broadband radiation (e.g. with a bandwidth of 10 nm or more, e.g. 100 nm or more -which may be referred to as a supercontinuum).
  • Figure 8 also depicts the optical fiber 24 with hollow core 28 (described above in connection with Figure 7), and a gas working medium 42 disposed within the hollow core.
  • the transducers 26 are located on opposite sides of the optical fiber 24. As depicted, the transducers 26 may extend to ends of the optical fiber 24. In some embodiments the transducers may be shorter than the optical fiber 24. Operation of the transducers 26 is controlled by a controller 44.
  • the pump radiation source 41 is configured to provide a pump radiation beam 46.
  • the seed radiation source 43 is configured to provide a seed radiation beam 47.
  • the pump radiation beam 46 and seed radiation beam 47 are combined by a dichroic mirror 48 (or other beam combining apparatus).
  • the pump radiation beam 46 and the seed radiation beam 47 propagate coaxially and are both coupled into the hollow core 28 of the optical fiber 24.
  • the gas working medium 42 within the optical fiber receives energy from the pump radiation beam 46 (i.e. it is pumped by the pump radiation beam).
  • the gas working medium 42 releases that energy by emitting radiation.
  • the wavelength of radiation which is emitted by the gas working medium 42 is determined by the type of gas and the pressure of the gas.
  • a metastable energy state of the gas decays to a lower energy state and emits a photon with a wavelength that corresponds with the energy difference between the energy states. The energy difference of this photon-emitting transition depends on the type of gas and the pressure of the gas.
  • the seed radiation beam 47 has a broadband spectrum and includes the wavelength at which the gas working medium 42 will emit photons.
  • the seed radiation beam 47 stimulates emission of photons by the gas working medium 42 at that wavelength.
  • the emitted photons stimulate emission of more photons by the gas working medium 42 at that wavelength. In this way an output beam 50 at a wavelength is generated, the wavelength depending upon the type of gas and the pressure of the gas.
  • the seed radiation source 43 is omitted.
  • nonlinear interactions between the pump radiation and the gas working medium generate photons having a range of different energies (which correspond with different wavelengths). These nonlinear interactions may occur at or adjacent to an entrance of the hollow core 28 of the optical fiber 24.
  • Photons with an energy which corresponds with a photon-emitting transition of the gas working medium 42 stimulate emission of photons from the gas. These photons stimulate emission of more photons with that energy (which corresponds with a wavelength). In this way an output beam 50 at a wavelength is generated, the wavelength depending upon the type of gas and the pressure of the gas.
  • the radiation source 40 further comprises a reservoir 52.
  • the optical fiber 24 is disposed inside the reservoir 52.
  • the reservoir 52 may also be referred to as a housing, container or gas cell.
  • the reservoir 52 is configured to contain the gas working medium 42.
  • the reservoir 52 may comprise one or more features, known in the art, for controlling, regulating, and/or monitoring the composition of the gas working medium 42 inside the reservoir 52.
  • the reservoir 52 is provided with a first transparent window 54.
  • the optical fiber 24 is disposed inside the reservoir 52 such that the first transparent window 54 is located proximate to an input end 56 of the optical fiber 24.
  • the first transparent window 54 may form part of a wall of the reservoir 52.
  • the first transparent window 54 may be transparent for at least the received input radiation frequencies, so that received input radiation 46 (or at least a large portion thereof) may be coupled into the optical fiber 24 located inside reservoir 52. It will be appreciated that optics (not shown) may be provided for coupling the input radiation 46 into the optical fiber 24.
  • the reservoir 52 is provided with a second transparent window 56, forming part of a wall of the reservoir 52.
  • the second transparent window 56 is located proximate to an output end 58 of the optical fiber 24.
  • the second transparent window 56 may be transparent for at least the frequencies of the output radiation 50 of the apparatus 120.
  • a window may be transparent for a frequency if at least 50%, 75%, 85%, 90%, 95%, or 99% of incident radiation of that frequency on the window is transmitted through the window.
  • Both the first 54 and the second 56 transparent windows may form an airtight seal within the walls of the reservoir 52 so that the gas working medium 42 may be contained within the reservoir 52. It will be appreciated that the gas 48 may be contained within the reservoir 52 at a pressure different to the ambient pressure of the reservoir 52.
  • the gas working medium 42 may comprise a noble gas such as Argon, Krypton, and Xenon, a Raman active gas such as Hydrogen, Deuterium and Nitrogen, or a gas mixture such as an Argon/Hydrogen mixture, a Xenon/Deuterium mixture, a Krypton/Nitrogen mixture, or a Nitrogen/Hydrogen mixture.
  • a noble gas such as Argon, Krypton, and Xenon
  • a Raman active gas such as Hydrogen, Deuterium and Nitrogen
  • a gas mixture such as an Argon/Hydrogen mixture, a Xenon/Deuterium mixture, a Krypton/Nitrogen mixture, or a Nitrogen/Hydrogen mixture.
  • the nonlinear optical processes which may occur can include modulation instability (MI), soliton self-compression, soliton fission, Kerr effect, Raman effect and dispersive wave generation, details of which are described in WO2018/127266
  • An advantage of having a hollow core optical fiber 24 is that it may achieve high intensity radiation through strong spatial confinement of radiation propagating through the optical fiber (providing high localized radiation intensities).
  • the radiation intensity inside the optical fiber 24 may be high, for example due to high received input radiation intensity and/or due to strong spatial confinement of the radiation inside the optical fiber 24. This may facilitate a strong interaction between the pump radiation and the gas working medium 42.
  • An advantage of hollow core optical fibers is that they can guide radiation having a broader wavelength range than solid-core fibers and, in particular, hollow core optical fibers can guide radiation in both the ultraviolet and infrared ranges.
  • An advantage of using a hollow core optical fiber 24 may be that the majority of the radiation guided inside the optical fiber 24 is confined to the hollow core 28. Therefore, the majority of the interaction of the radiation inside the optical fiber 24 is with the gas working medium 42, which is provided inside the hollow core 28 of the optical fiber 24. As a result, the radiation spectrum configuration effect achieved via the gas working medium 42 may be increased.
  • the received pump radiation 46 may be electromagnetic radiation.
  • the pump radiation 46 may be received as pulsed radiation.
  • the pump radiation 46 may comprise ultrafast pulses, for example, generated by a laser.
  • the pump radiation 46 may be coherent radiation.
  • the pump radiation 46 may be collimated radiation, an advantage of which may be to facilitate and improve the efficiency of coupling the pump radiation 46 into the optical fiber 24.
  • the pump radiation 46 may comprise a single frequency, or a narrow range of frequencies.
  • the pump radiation 46 may be generated by a laser.
  • the output radiation 50 may be collimated and/or may be coherent.
  • the output beam 50 may have a desired wavelength (e.g. with an associated bandwidth of a few nanometers - e.g. at least 0.1 nm, e.g. up to 10 nm).
  • the output beam 50 may have a desired spectrum of radiation (e.g. a spectrum of 10 nm or more, e.g. up to 100 nm, centered around a desired wavelength). Both of these are examples of providing radiation with a desired configuration (the configuration of the radiation may be the wavelength of the radiation and may be a spectrum of the radiation).
  • the output beam 50 may be a broadband output beam (e.g. with a spectrum broader than 10 nm).
  • the broadband range of the output beam 50 may be a substantially continuous range, comprising a substantially continuous range of radiation frequencies.
  • a range of frequencies which includes very fine discrete spectral lines that are not visible to a conventional detector may be considered to be substantially continuous.
  • the output beam 50 may comprise supercontinuum radiation.
  • Continuous radiation may be beneficial for use in a number of applications, for example in metrology applications.
  • the continuous range of frequencies may be used to interrogate a large number of properties.
  • the continuous range of frequencies may for example be used to determine and/or eliminate a frequency dependency of a measured property.
  • Supercontinuum output beam radiation 50 may comprise for example electromagnetic radiation having a wavelength range of 100 nm or more.
  • the wavelength (or central wavelength of a spectrum) of the output beam 50 is tunable using an acoustic mode generated by the transducers 26, as explained further below.
  • the pump radiation 46 provided by the pulsed pump radiation source 41 may be pulsed.
  • the pump radiation 46 may comprise electromagnetic radiation of one or more frequencies between 200 nm and 2 pm.
  • the pump radiation 46 may for example comprise electromagnetic radiation with a wavelength of 1.03 pm.
  • the repetition rate of the pulsed pump radiation 46 may be of an order of magnitude of 1 kHz to 100 MHz.
  • the pulse energies may have an order of magnitude of 0.1 pj to 100 pj, for example 1 - 10 pj.
  • a pulse duration for the input radiation 46 may be between 10 fs and 10 ps, for example 300 fs.
  • the average power of pump radiation 46 may be between 100 mW to several 100 W.
  • the average power of pump radiation 46 may for example be 20 - 50 W.
  • the wavelength of the radiation output from the optical fiber 24 may be determined in part by properties of the optical fiber such as optical fiber length, size and shape of the hollow core 101. These properties are fixed for a given optical fiber 24 and thus are not modified to change the wavelength of radiation output from the optical fiber.
  • the wavelength of the radiation output from the optical fiber 24 may be adjusted by adjusting the type of gas in the optical fiber 24. However, changing the type of gas is a slow process.
  • the output radiation 50 provided by the radiation source 40 may have an average output power of at least 1 W.
  • the average output power may be at least 5 W.
  • the average output power may be at least 10 W.
  • the output radiation 50 may be pulsed radiation.
  • the output radiation 50 may have a power spectral density in the entire wavelength band of the output radiation of at least 0.01 mW/nm.
  • the power spectral density in the entire wavelength band of the output radiation may be at least 3 mW/nm.
  • the wavelength of the output radiation 50 provided by the radiation source 40 can be adjusted by changing the pressure of the gas working medium 42 in the hollow core 28 of the optical fiber 24.
  • the pressure of the gas working medium is changed using an acoustic mode. In the embodiment depicted in Figures 7 and 8 this is achieved by generating an acoustic mode in the gas working medium 42 in the hollow core 28.
  • Figure 9 depicts in cross section the fundamental acoustic mode of the hollow core 28 of the optical fiber 24.
  • the hollow core of the fiber is an example of a hollow optical waveguide within which an acoustic mode in a gas working medium may be generated. Embodiments of the invention may use other forms of hollow optical waveguide.
  • Figure 9 is in greyscale rather than color, labels have been added to identify the minimum and maximum pressures of the gas.
  • Figure 9 depicts the pressure of the gas in the hollow core 28 when the fundamental acoustic mode is excited. In Figure 9, the pressure of the gas is at a maximum at the center of the fiber follow core 28 and is at a minimum at a periphery of the fiber hollow core.
  • the pressure of the gas 42 in the fiber hollow core 28 will vary at the acoustic frequency (which in this embodiment may be of the order of MHz).
  • the acoustic frequency which in this embodiment may be of the order of MHz.
  • the pressure at the periphery of the fiber hollow core 28 varies between the minimum and the maximum, varying with the acoustic frequency.
  • the pressure of the gas at the node may be the pressure that would exist if the acoustic mode was not excited. This pressure, which corresponds with the pressure of gas 42 in the reservoir 52, may be referred to as the background gas pressure.
  • Figure 10 depicts an example of wavelengths of output radiation 50 that can be provided from the radiation source 40.
  • the horizontal axis of the graph in Figure 10 is wavelength in nm and the vertical axis is the normalized parametric gain (i.e. power of the output radiation 50 relative to the power of the input pump radiation 46 (see Figure 8)).
  • the scale of the vertical axis is logarithmic.
  • Five outputs 60-64 are depicted. Each output 60-64 has a full width half maximum (FWHM) of around 80 nm.
  • the output may have a FWHM of up to 10 nm (e.g. 0.1 nm or more).
  • the output may have a FWHM of more than lOnm, e.g. 100 nm or more.
  • a central output 62 is emitted when the acoustic mode has no effect upon the pressure of gas 42 in the fiber hollow core 28.
  • the pressure of gas across the fiber hollow core is substantially flat (at the background gas pressure).
  • a right-hand peak 64 shows the output when the acoustic mode has increased the pressure of gas at the center of the fiber hollow core 28 to be 20% more than the background gas pressure. As may be seen, this increase of gas pressure has increased a central wavelength of the output from around 880 nm to around 1120 nm.
  • a left-hand output 60 is the output when the pressure of gas in the fiber hollow core 28 is 20% less than the background gas pressure. As can be seen, a central wavelength of this output is around 660 nm.
  • Additional outputs 61, 63 are also depicted for the gas pressure at the centre of the fiber hollow core 28 being 10% below the background pressure and 10% above the background pressure.
  • the acoustic mode causes a central wavelength of the output radiation 50 to vary over a wavelength range of around 450 nm. As noted above, this variation of the output takes place at the frequency of the acoustic mode (e.g. of the order of MHz).
  • the acoustic mode provides a maximum of gas pressure at the centre of the fiber hollow core 28, a minimum of gas pressure is present at the periphery of the fiber hollow core.
  • the effect of the central maximum and peripheral minimum of gas pressures upon the output radiation is not equal.
  • the pump radiation 46 (see Figure 8) has a Gaussian profde (or other peaked profile) within the fiber hollow core 28.
  • the intensity of radiation at the centre of the fiber hollow core 28 is much higher than the intensity of radiation at the periphery of the fiber hollow core.
  • the at least part of the radiation spectrum configuration provided by the gas working medium 42 is a non-linear process which is driven by the intensity of the pump radiation.
  • the output radiation 50 provided from the radiation source 40 depends upon the pressure of the gas in the vicinity of the centre of the fiber hollow core 28 and is not significantly affected by the pressure of gas at the periphery of the fiber hollow core.
  • the controller 44 provides a modulated output signal which causes the transducers 26 to vibrate at a frequency which generates the fundamental acoustic mode. That is, the transducers are modulated at a frequency which corresponds with the frequency of the fundamental acoustic mode.
  • the controller 44 also provides a signal to an acousto-optic modulator 57 provided at an output of the radiation source 40.
  • the acousto-optic modulator 57 is configured to selectively transmit and block the output radiation beam 50 depending upon the signal received from the controller 44.
  • the signal provided by the controller 44 is synchronized with the signal driving the transducers 26.
  • the acousto-optic modulator 57 is used to select a spectrum of the output radiation 50.
  • controller 44 or other electronics adjusting a phase of the signal driving the acousto-optic modulator 57 (with respect to the signal driving the transducers 26).
  • controller 44 or other electronics adjusting a phase of the signal driving the acousto-optic modulator 57 (with respect to the signal driving the transducers 26).
  • any of the outputs 60-64 depicted in Figure 10 may be selected through a use of the acousto- optic modulator 57.
  • an acousto-optic modulator 59 may be provided between the pump radiation source 41 and the optical fiber 24.
  • the acousto-optic modulator 59 may receive an input signal from the controller 44 which is synchronized with the signal driving the transducers 26.
  • the phase of the signal provided to the acousto-optic modulator 59 may be selected such that the pump radiation only passes through the acousto-optic modulator and into the optical fiber 24 when the acoustic mode within the fiber hollow core 28 provides a desired output radiation spectrum.
  • An embodiment of this type may provide a longer lifetime of the optical fiber 24.
  • a modulated optical switch may be used to select an output from the radiation source 40.
  • the modulated optical switch may be an acousto-optic modulator, electro-optic modulator, or other form of modulator.
  • the modulated optical switch may be provided at an output of the radiation source 40, or positioned to block a pump radiation beam 46.
  • Figure 8 depicts two modulated optical switches, only one modulated optical switch is needed in practice.
  • a filter may be used to select a desired wavelength or range of wavelengths from the output radiation beam 50.
  • the filter may be adjustable (e.g. a rotatable reflective grating).
  • the pump radiation source 41 may include an optical switch which forms part of the pump radiation source, the optical switch being synchronized with the modulation of the transducers 26.
  • the pulsed pump radiation beam 46 may be synchronized with the modulation of the transducers.
  • the frequency of the acoustic mode of the hollow fiber capillary 28 may be of the order of MHz.
  • the signal provided by the controller 44 is of the order of MHz.
  • the repetition frequency of the pulsed pump beam 46 provided by the pump radiation source 41 may be significantly highly than this (e.g. tens of MHz or more). As a result, multiple pulses of pump radiation may pass through the fiber hollow core 28 for a given open period of the acousto-optic modulator 57, 59.
  • Figure 11 is a graph which depicts the time-averaged relative intensity of the output radiation beam 50 when the amplitude of the acoustic mode is selected to provide a wavelength range of 100 nm (peak-to-peak). As may be seen from Figure 11, this time-averaged spectrum is described by an arcsine distribution. Because gas pressure changes more slowly near the pressure extremes, the output spectrum spends more time at extreme pressure values. That is, more radiation is emitted near the extremes of the modulated wavelength band. From Figure 11 is may be understood that if a particular wavelength (e.g. a particular peak wavelength of a spectrum) is desired, the acoustic modulation amplitude may be selected such that the wavelength is provided at a maximum or a minimum of the acoustic mode.
  • a particular wavelength e.g. a particular peak wavelength of a spectrum
  • the transducers 26 are provided as a pair on opposite sides of the optical fiber 24.
  • the transducers 26 may be piezo-electric transducers.
  • the transducers 26 may be fixed to the optical fiber 24 (e.g. using adhesive).
  • the transducers 26 may be pressed against the optical fiber 24 by a clamp (not depicted).
  • a transducer e.g. piezo-electric
  • the transducer may surround the fiber.
  • the transducer(s) may be arranged such that they cause contraction and expansion of at least part of the optical fiber 24 (in a direction transverse to the axis of the fiber).
  • the contraction and expansion excites an acoustic mode of the gas in the optical fiber 24.
  • the contraction and expansion may overlap with a mechanical mode (e.g. a drum mode) of gas inside the optical fiber 24.
  • the fundamental acoustic mode of the optical fiber 24 is excited.
  • Other acoustic modes may be excited. Where higher order acoustic modes are excited, the distribution of pressure across the acoustic mode is more complex. As a result, the spectrum of the output radiation 50 may be broader and/or less tunable using an optical switch.
  • a wavelength selective filter may be used to select a wavelength or range of wavelengths of interest.
  • FIG. 12 schematically depicts in cross section a radiation spectrum configuration system 122 according to an alternative embodiment of the invention.
  • the radiation spectrum configuration system comprises an optical fiber 124 which comprises: a hollow core 128, a cladding portion 130 surrounding the hollow core, and anti-resonant structures 180.
  • the anti -resonant structures may be referred to as anti-resonant fibers.
  • Radiation propagates in a guided mode through the hollow core 128.
  • the guided radiation may be in the form of a Gaussian mode.
  • Transducers 126 are provided on opposite sides of the optical fiber 124. The transducers are configured to excite an acoustic mode in gas provided in the hollow core 128.
  • the radiation spectrum configuration system may form part of a radiation source (e.g.
  • Figure 13 schematically depicts in cross section a radiation spectrum configuration system 222 according to an alternative embodiment of the invention.
  • a reservoir 252 is formed by a housing 253.
  • a gas working medium 242 is provided within the reservoir.
  • Windows (not depicted) are located at either end of the reservoir.
  • Five glass rods 270 extend through the reservoir 252.
  • a separation between rods may for example may be of the order of microns.
  • acoustic transducers 226 Five acoustic transducers 226 are provided within the reservoir 252. To avoid complicating the figure not all rods and transducers are labelled. An acoustic transducer 226 is provided between each respective pairs of rods 270. In other embodiments, the number of transducers may be different from the number of rods. For example, the number of transducers may be less than the number of rods. A single transducer may be inefficient. Two or more transducers may provide efficient modulation of the gas 242.
  • the radiation spectrum configuration system 222 may form part of a radiation source (e.g. of the type depicted in Figure 8).
  • a pump radiation beam is coupled into the reservoir 252 and is guided through the reservoir by the glass rods 270.
  • the glass rods 270 thus form a hollow optical waveguide.
  • An example of a configuration of this type is described in more detail in APL Photonics 6, 061301 (2021).
  • the acoustic transducers 226 are modulated at a frequency which is selected to generate an acoustic mode in the portion of the reservoir 252 which is surrounded by the glass rods 270.
  • reservoir 152 acts as an acoustic resonator which has a larger cross-sectional area than the fiber hollow core.
  • the transducers 226 are able to excite a wider range of acoustic modes.
  • an acoustic mode may be excited which is relatively uniform across a cross-sectional area through which the pump radiation beam passes. This may provide a relatively uniform pressure profile (which changes with the acoustic frequency), and may provide a more uniform spectrum of output radiation.
  • rods 270 and five transducers 226 are depicted in Figure 13, other numbers of rods may be used. For example, 4 rods may be used, 5, 6, 7 or 8 rods may be used. Using more than 8 rods may generate a more complex acoustic mode, and thus may reduce a cross-sectional area of gas 242 which has a desired pressure.
  • Some described embodiments of the invention refer to a pulsed pump radiation source.
  • the pump radiation source does not have to be pulsed.
  • a continuous beam of radiation may be used.
  • the radiation source may be a pulsed laser, may be a continuous wave laser, may be a plasma source, etc.
  • a pulsed radiation source may be preferred because it provides a higher peak intensity of radiation.
  • Acoustic modes excited by the one or more transducers may be transverse acoustic modes.
  • the one or more transducers may be the same length as the optical waveguide.
  • the one or more transducers may be shorter than the optical waveguide.
  • Embodiments of the invention may advantageously provide a radiation source that is able to switch quickly between desired wavelengths (e.g. through the use of one or more automated fdters provided at an output of the radiation source).
  • a radiation spectrum configuration system comprising a hollow optical waveguide containing a gas medium and one or more transducers configured to generate an acoustic mode in the gas medium.
  • a radiation source comprising the radiation spectrum configuration system of any preceding clause, and further comprising a pump radiation source configured to provide pump radiation into the hollow optical waveguide.
  • the radiation source of clause 9 further comprising an optical switch configured to selectively transmit an output radiation beam provided from the radiation spectrum configuration system, the optical switch being synchronized with the one or more transducers.
  • a metrology tool comprising the radiation source of any of clauses 9 to 11.
  • a lithographic apparatus comprising the radiation source of any of clauses 9 to 11 or the metrology tool of clause 12. 14.
  • a method comprising directing a pump radiation beam into a hollow optical waveguide containing a gas medium configured to provide an output beam have a different wavelength from the pump radiation beam, the method further comprising using one or more transducers to generate an acoustic mode in the gas medium and thereby modify the wavelength of the output beam.
  • Embodiments of the invention may form part of a mask inspection apparatus, a metrology tool, or any apparatus that measures or processes an object such as a wafer (or other substrate) or mask (or other patterning device). These apparatus may be generally referred to as lithographic tools. Such a lithographic tool may use vacuum conditions or ambient (non- vacuum) conditions.
  • the inspection or metrology apparatus that comprises an embodiment of the invention may be used to determine characteristics of structures on a substrate or on a wafer.
  • the inspection apparatus or metrology apparatus that comprises an embodiment of the invention may be used to detect defects of a substrate or defects of structures on a substrate or on a wafer.
  • a characteristic of interest of the structure on the substrate may relate to defects in the structure, the absence of a specific part of the structure, or the presence of an unwanted structure on the substrate or on the wafer.

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  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
  • Spectrometry And Color Measurement (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

L'invention concerne une source de rayonnement, un outil de métrologie, un appareil lithographique et un procédé de génération d'un mode acoustique dans un milieu gazeux. Le système de configuration de spectre de rayonnement comprend un guide d'onde optique creux et un ou plusieurs transducteurs. Le guide d'onde optique creux contient un milieu gazeux. Le ou les transducteurs sont configurés pour générer un mode acoustique dans le milieu gazeux.
PCT/EP2024/074925 2023-10-02 2024-09-06 Système de configuration de spectre de rayonnement Pending WO2025073428A1 (fr)

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EP23201188.2A EP4535071A1 (fr) 2023-10-02 2023-10-02 Système d'élargissement de rayonnement
EP23201188.2 2023-10-02
EP23218665 2023-12-20
EP23218665.0 2023-12-20

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