WO2025070069A1 - Surface treatment agent - Google Patents

Abstract

The purpose of the present disclosure is to provide a surface treatment agent capable of producing a film having good abrasion resistance.　A composition according to the present disclosure comprises: a silane compound (A) having a fluoropolyether group; and a compound (B) having a fluoropolyether group and an allyl ether group, wherein the compound (B) includes at least one compound represented by formula (3), (4), or (5) (provided that the compound (A) is different from the compound (B)). RF1 α-XA-[ARB1 δRB2 3-δ]β (3), [RB1 δRB2 3-δA]γ-XA-RF2-XA-[ARB1 δRB2 3-δ]γ (4), RSi γ-XA-RF2-XA-[ARB1 δRB2 3-δ]γ (5) [In the formula, As are each independently a C atom or a Si atom; RF1s are each independently Rf1-RF-Oq-; RF2 is -Rf2 p-RF-Oq-; Rf1s are each independently a C1-16 alkyl group that may be substituted with at least one fluorine atom; Rf2 is a C1-6 alkylene group that may be substituted with at least one fluorine atom; RFs are each independently a divalent fluoropolyether group; p is 0 or 1; qs are each independently 0 or 1; RB1 is -RB3-O-CH=CH-CH3; RB2s are each independently at least one selected from -RB3-O-CH2CH2CH2-SiRB4 εRB5 3-ε and a hydrogen atom; RB3s are each independently a single bond or a C1-20 alkylene group; RB4s are each independently a hydroxyl group or a hydrolyzable group; RB5s are each independently a hydrogen atom or a monovalent organic group; and RSis are each independently a Si atom-containing monovalent group having a hydroxyl group, a hydrolyzable group, a hydrogen atom, or a monovalent organic group bonded thereto; at least one RSi in formula (5) is a Si atom-containing monovalent group having a hydroxyl group or a hydrolyzable group bonded thereto; XAs are each independently a single bond or a divalent to decavalent organic group; α is an integer of 1-9; β is an integer of 1-9; γs are each independently an integer of 1-9; and δs are each independently an integer of 1-3. εs are each independently an integer of 1-3.]

Description

Surface Treatment Agents

This disclosure relates to a surface treatment agent.

It is known that certain fluoropolyether group-containing silane compounds can provide excellent water repellency, oil repellency, and stain resistance when used for surface treatment of substrates. A layer obtained from a surface treatment agent containing a fluoropolyether group-containing silane compound (hereinafter also referred to as a "surface treatment layer") is applied as a so-called functional thin film to a wide variety of substrates, such as glass, plastics, textiles, sanitary products, and building materials (Patent Document 1).

JP 2014-218639 A

The fluoropolyether group-containing silane compound described in Patent Document 1 can provide a surface treatment layer with excellent functionality, but there is a demand for a surface treatment layer with even greater durability.

The purpose of this disclosure is to provide a surface treatment agent that can produce a film with good abrasion resistance.

［式中：
　Ｒ^Ｆ１は、それぞれ独立して、Ｒｆ^１－Ｒ^Ｆ－Ｏ_ｑ－であり；
　Ｒ^Ｆ２は、－Ｒｆ^２ _ｐ－Ｒ^Ｆ－Ｏ_ｑ－であり；
　Ｒｆ^１は、それぞれ独立して、１個又はそれ以上のフッ素原子により置換されていてもよいＣ_１－１６アルキル基であり；
　Ｒｆ^２は、１個又はそれ以上のフッ素原子により置換されていてもよいＣ_１－６アルキレン基であり；
　Ｒ^Ｆは、それぞれ独立して、２価のフルオロポリエーテル基であり；
　ｐは、０又は１であり；
　ｑは、それぞれ独立して、０又は１であり；
　Ｒ^Ｓｉは、それぞれ独立して、水酸基、加水分解性基、水素原子又は１価の有機基が結合したＳｉ原子を含む１価の基であり；
　式（１）又は式（２）のそれぞれにおいて、少なくとも１つのＲ^Ｓｉは、水酸基又は加水分解性基が結合したＳｉ原子を含む１価の基であり；
　式（１）又は式（２）のそれぞれにおいて、Ｒ^Ｓｉは、アリルエーテル基を含まず；
　Ｘ^Ａは、それぞれ独立して、単結合又は２～１０価の有機基であり；
　αは、１～９の整数であり；
　βは、１～９の整数であり；
　γは、それぞれ独立して、１～９の整数である。］
で表される少なくとも１種の化合物を含む、［１］に記載の組成物。
［３］
　前記組成物に含まれるＲ^Ｓｉ及びＲ^Ｂ１の合計に対する、前記組成物に含まれるＲ^Ｂ１の割合が２５モル％以下である、［１］又は［２］に記載の組成物。
［４］　前記シラン化合物（Ａ）は、式（１ａ）：
Ｒ^Ｆ１－Ｘ^Ａ－Ｒ^Ｓｉ　　　（１ａ）
［式中：
　Ｒ^Ｆ１は、それぞれ独立して、Ｒｆ^１－Ｒ^Ｆ－Ｏ_ｑ－であり；
　Ｒｆ^１は、それぞれ独立して、１個又はそれ以上のフッ素原子により置換されていてもよいＣ_１－１６アルキル基であり；
　Ｒ^Ｆは、それぞれ独立して、２価のフルオロポリエーテル基であり；
　ｑは、それぞれ独立して、０又は１であり；
　Ｒ^Ｓｉは、それぞれ独立して、水酸基、加水分解性基、水素原子又は１価の有機基が結合したＳｉ原子を含む１価の基であり；
　式（１）において、少なくとも１つのＲ^Ｓｉは、水酸基又は加水分解性基が結合したＳｉ原子を含む１価の基であり；
　式（１）において、Ｒ^Ｓｉは、アリルエーテル基を含まず；
　Ｘ^Ａは、それぞれ独立して、単結合又は２～１０価の有機基である。］
において、Ｘ^Ａが、単結合又は下記式：
　　　－（Ｒ^５１）_ｐ５－（Ｘ^５１）_ｑ５－
［式中：
　Ｒ^５１は、単結合、－（ＣＨ_２）_ｓ５－又はｏ－、ｍ－もしくはｐ－フェニレン基を表し、好ましくは－（ＣＨ_２）_ｓ５－であり、
　ｓ５は、１～２０の整数、好ましくは１～６の整数、より好ましくは１～３の整数、さらにより好ましくは１又は２であり、
　Ｘ^５１は、－（Ｘ^５２）_ｌ５－を表し、
　Ｘ^５２は、それぞれ独立して、－Ｏ－、－Ｓ－、ｏ－、ｍ－もしくはｐ－フェニレン基、－Ｃ（Ｏ）Ｏ－、－Ｓｉ（Ｒ^５３）_２－、－（Ｓｉ（Ｒ^５３）_２Ｏ）_ｍ５－Ｓｉ（Ｒ^５３）_２－、－ＣＯＮＲ^５４－、－Ｏ－ＣＯＮＲ^５４－、－ＮＲ^５４－及び－（ＣＨ_２）_ｎ５－からなる群から選択される基を表し、
　Ｒ^５３は、それぞれ独立して、フェニル基、Ｃ_１－６アルキル基又はＣ_１－６アルコキシ基を表し、好ましくはフェニル基又はＣ_１－６アルキル基であり、より好ましくはメチル基であり、
　Ｒ^５４は、それぞれ独立して、水素原子、フェニル基又はＣ_１－６アルキル基（好ましくはメチル基）を表し、
　ｍ５は、、それぞれ独立して、１～１００の整数、好ましくは１～２０の整数であり、
　ｎ５は、、それぞれ独立して、１～２０の整数、好ましくは１～６の整数、より好ましくは１～３の整数であり、
　ｌ５は、１～１０の整数、好ましくは１～５の整数、より好ましくは１～３の整数であり、
　ｐ５は、０又は１であり、
　ｑ５は、０又は１であり、
　ここに、ｐ５及びｑ５の少なくとも一方は１であり、ｐ５又はｑ５を付して括弧でくくられた各繰り返し単位の存在順序は任意である。］
で表される基であり、
　Ｒ^Ｓｉが、下記式（Ｓ３）：
－ＳｉＲ^ａ１ _ｋ１Ｒ^ｂ１ _ｌ１Ｒ^ｃ１ _ｍ１　　　　（Ｓ３）
［式中、
　Ｒ^ａ１は、それぞれ独立して、－Ｚ^１－ＳｉＲ^２２ _ｑ１Ｒ^２３ _ｒ１を表し；
　Ｚ^１は、それぞれ独立して、酸素原子又は２価の有機基を表し、以下Ｚ^１として記載する構造は、右側が（ＳｉＲ^２２ _ｑ１Ｒ^２３ _ｒ１）に結合し；
　Ｒ^２２は、それぞれ独立して、水酸基又は加水分解性基を表し； 
　Ｒ^２３は、それぞれ独立して、水素原子又は１価の有機基を表し；
　ｑ１は、（ＳｉＲ^２２ _ｑ１Ｒ^２３ _ｒ１）単位毎にそれぞれ独立して、１～３の整数であり；
　Ｒ^ｂ１は、それぞれ独立して、水酸基又は加水分解性基を表し；
　Ｒ^ｃ１は、それぞれ独立して、水素原子又は１価の有機基を表し；
　ｋ１は、それぞれ独立して、０～３の整数であり、ｌ１は、それぞれ独立して、０～３の整数であり、ｍ１は、それぞれ独立して、０～３の整数であり、ｋ１、ｌ１とｍ１の合計は、（ＳｉＲ^ａ１ _ｋ１Ｒ^ｂ１ _ｌ１Ｒ^ｃ１ _ｍ１）単位において、３である。］で表される基である化合物を含み、
　前記化合物（Ｂ）は、式（３）：
Ｒ^Ｆ１ _α－Ｘ^Ａ－［ＡＲ^Ｂ１ _δＲ^Ｂ２ _３－δ］_β　　　　　（３）
［式中：
　Ａは、それぞれ独立して、Ｃ原子又はＳｉ原子であり；
　Ｒ^Ｆ１は、それぞれ独立して、Ｒｆ^１－Ｒ^Ｆ－Ｏ_ｑ－であり；
　Ｒｆ^１は、それぞれ独立して、１個又はそれ以上のフッ素原子により置換されていてもよいＣ_１－１６アルキル基であり；
　Ｒ^Ｆは、それぞれ独立して、２価のフルオロポリエーテル基であり；
　ｑは、それぞれ独立して、０又は１であり；
　Ｒ^Ｂ１は、－Ｒ^Ｂ３－Ｏ－ＣＨ＝ＣＨ－ＣＨ_３であり；
　Ｒ^Ｂ２は、それぞれ独立して、－Ｒ^Ｂ３－Ｏ－ＣＨ_２ＣＨ_２ＣＨ_２－ＳｉＲ^Ｂ４ _εＲ^Ｂ５ _３－ε及び水素原子から選ばれる１種又は２種以上であり；
　Ｒ^Ｂ３は、それぞれ独立して、単結合又はＣ_１－２０アルキレン基であり；
　Ｒ^Ｂ４は、それぞれ独立して、水酸基又は加水分解性基であり；
　Ｒ^Ｂ５は、それぞれ独立して、水素原子又は１価の有機基であり；
　Ｒ^Ｓｉは、それぞれ独立して、水酸基、加水分解性基、水素原子又は１価の有機基が結合したＳｉ原子を含む１価の基であり；
　Ｘ^Ａは、それぞれ独立して、単結合又は２～１０価の有機基であり；
　αは、１～９の整数であり；
　βは、１～９の整数であり；
　γは、それぞれ独立して、１～９の整数である。］
で表される化合物を含む、［１］～［３］のいずれか１つに記載の組成物。
［５］
　［１］～［４］のいずれか１つに記載の組成物を含む、表面処理剤。
［６］
　含フッ素オイル及びシリコーンオイルから選択される１種又はそれ以上の成分をさらに含む、［５］に記載の表面処理剤。
［７］
　防汚性コーティング剤又は防水性コーティング剤として使用される、［５］または［６］に記載の表面処理剤。
［８］
　基材と、該基材の表面に、［１］～［４］のいずれか１項に記載の組成物より形成された層とを含む物品。
［９］
　基材と、該基材の表面に、［５］～［７］のいずれか１つに記載の表面処理剤より形成された層とを含む物品。 The present disclosure includes the following aspects.
[1]
A silane compound (A) having a fluoropolyether group;
Compound (B) Having a Fluoropolyether Group and an Allyl Ether Group
and
The compound (B) is represented by the following formula (3), (4) or (5):
R ^F1 _α −X ^A −[AR ^B1 _δ R ^B2 _3−δ ] _β (3)
[R ^B1 _δ R ^B2 _3-δ A] _γ -X ^A -R ^F2 -X ^A -[AR ^B1 _δ R ^B2 _3-δ ] _γ (4)
R ^Si _γ −X ^A −R ^F2 −X ^A −[AR ^B1 _δ R ^B2 _3−δ ] _γ (5)
[Wherein:
Each A is independently a C atom or a Si atom;
Each R ^F1 is independently Rf ¹ -R ^F -O _q -;
R ^F2 is -Rf ² _p -R ^F -O _q -;
Each Rf ¹ is independently a C _1-16 alkyl group optionally substituted by one or more fluorine atoms;
Rf ² is a C _1-6 alkylene group optionally substituted by one or more fluorine atoms;
Each R ^F is independently a divalent fluoropolyether group;
p is 0 or 1;
Each q is independently 0 or 1;
R ^B1 is -R ^B3 -O-CH=CH-CH3 _;
R ^B2 each independently represents one or more groups selected from -R ^B3 -O-CH ₂ CH ₂ CH ₂ -SiR ^B4 _ε R ^B5 _3-ε and a hydrogen atom;
Each R ^B3 is independently a single bond or a C _1-20 alkylene group;
Each R ^B4 is independently a hydroxyl group or a hydrolyzable group;
Each R ^B5 is independently a hydrogen atom or a monovalent organic group;
R ^Si is each independently a hydroxyl group, a hydrolyzable group, a hydrogen atom, or a monovalent group containing a Si atom to which a monovalent organic group is bonded;
In formula (5), at least one R ^Si is a monovalent group containing a Si atom having a hydroxyl group or a hydrolyzable group bonded thereto;
Each ^XA is independently a single bond or a divalent to decavalent organic group;
α is an integer from 1 to 9;
β is an integer from 1 to 9;
Each γ is independently an integer from 1 to 9;
Each δ is independently an integer of 1 to 3.
Each ε is independently an integer from 1 to 3.
A composition comprising at least one compound represented by the formula (A) (wherein compound (A) and compound (B) are different).
[2]
The silane compound (A) having a fluoropolyether group is represented by the formula (1) or (2):

[Wherein:
Each R ^F1 is independently Rf ¹ -R ^F -O _q -;
R ^F2 is -Rf ² _p -R ^F -O _q -;
Each Rf ¹ is independently a C _1-16 alkyl group optionally substituted by one or more fluorine atoms;
Rf ² is a C _1-6 alkylene group optionally substituted by one or more fluorine atoms;
Each R ^F is independently a divalent fluoropolyether group;
p is 0 or 1;
Each q is independently 0 or 1;
R ^Si is each independently a hydroxyl group, a hydrolyzable group, a hydrogen atom, or a monovalent group containing a Si atom to which a monovalent organic group is bonded;
In each of formula (1) and formula (2), at least one R ^Si is a monovalent group containing a Si atom having a hydroxyl group or a hydrolyzable group bonded thereto;
In each of formula (1) and formula (2), R ^Si does not contain an allyl ether group;
Each ^XA is independently a single bond or a divalent to decavalent organic group;
α is an integer from 1 to 9;
β is an integer from 1 to 9;
Each γ is independently an integer from 1 to 9.
The composition according to [1], comprising at least one compound represented by the formula:
[3]
The composition according to [1] or [2], wherein the proportion of R ^B1 contained in the composition with respect to the total of R ^Si and R ^B1 contained in the composition is 25 mol % or less.
[4] The silane compound (A) is represented by the formula (1a):
R ^F1 -X ^A -R ^Si (1a)
[Wherein:
Each R ^F1 is independently Rf ¹ -R ^F -O _q -;
Each Rf ¹ is independently a C _1-16 alkyl group optionally substituted by one or more fluorine atoms;
Each R ^F is independently a divalent fluoropolyether group;
Each q is independently 0 or 1;
R ^Si is each independently a hydroxyl group, a hydrolyzable group, a hydrogen atom, or a monovalent group containing a Si atom to which a monovalent organic group is bonded;
In formula (1), at least one R ^Si is a monovalent group containing a Si atom having a hydroxyl group or a hydrolyzable group bonded thereto;
In formula (1), R ^Si does not contain an allyl ether group;
Each ^XA is independently a single bond or a divalent to decavalent organic group.
In the above formula, X ^A is a single bond or the following formula:
-(R ⁵¹ ) _p5 -(X ⁵¹ ) _q5 -
[Wherein:
R ⁵¹ represents a single bond, —(CH ₂ ) _s5 —, or an o-, m- or p-phenylene group, preferably —(CH ₂ ) _s5 —;
s5 is an integer from 1 to 20, preferably an integer from 1 to 6, more preferably an integer from 1 to 3, even more preferably 1 or 2;
X ⁵¹ represents -(X ⁵² ) _l5 -;
X ⁵² each independently represents a group selected from the group consisting of -O-, -S-, o-, m- or p-phenylene group, -C(O)O-, -Si(R ⁵³ ) ₂ -, -(Si(R ⁵³ ) ₂ O) _m5 -Si(R ⁵³ ) ₂ -, -CONR ⁵⁴ -, -O-CONR ⁵⁴ -, -NR ⁵⁴ - and -(CH ₂ ) _n5 -;
R ⁵³ each independently represents a phenyl group, a C _1-6 alkyl group, or a C _1-6 alkoxy group, preferably a phenyl group or a C _1-6 alkyl group, more preferably a methyl group;
R ⁵⁴ each independently represents a hydrogen atom, a phenyl group, or a C _1-6 alkyl group (preferably a methyl group);
m5 is independently an integer of 1 to 100, preferably an integer of 1 to 20;
n5 is independently an integer from 1 to 20, preferably an integer from 1 to 6, more preferably an integer from 1 to 3;
l5 is an integer from 1 to 10, preferably an integer from 1 to 5, more preferably an integer from 1 to 3;
p5 is 0 or 1;
q5 is 0 or 1;
Here, at least one of p5 and q5 is 1, and the order of the repeating units enclosed in parentheses with p5 or q5 is arbitrary.
is a group represented by
R ^Si is represented by the following formula (S3):
-SiR ^a1 _k1 R ^b1 _l1 R ^c1 _m1 (S3)
[Wherein,
Each R ^a1 independently represents -Z ¹ -SiR ²² _q1 R ²³ _r1 ;
Z ¹ 's each independently represent an oxygen atom or a divalent organic group, and in the structure hereinafter described as Z ¹ , the right side is bonded to (SiR ²² _q1 R ²³ _r1 );
R ²² each independently represents a hydroxyl group or a hydrolyzable group;
Each R ²³ independently represents a hydrogen atom or a monovalent organic group;
q1 is independently an integer of 1 to 3 for each (SiR ²² _q1 R ²³ _r1 ) unit;
Each R ^b1 independently represents a hydroxyl group or a hydrolyzable group;
Each R ^c1 independently represents a hydrogen atom or a monovalent organic group;
each k1 is independently an integer of 0 to 3, each l1 is independently an integer of 0 to 3, each m1 is independently an integer of 0 to 3, and the sum of k1, l1 and m1 is 3 in the (SiR ^a1 _k1 R ^b1 _l1 R ^c1 _m1 ) unit;
The compound (B) is represented by the formula (3):
R ^F1 _α −X ^A −[AR ^B1 _δ R ^B2 _3−δ ] _β (3)
[Wherein:
Each A is independently a C atom or a Si atom;
Each R ^F1 is independently Rf ¹ -R ^F -O _q -;
Each Rf ¹ is independently a C _1-16 alkyl group optionally substituted by one or more fluorine atoms;
Each R ^F is independently a divalent fluoropolyether group;
Each q is independently 0 or 1;
R ^B1 is -R ^B3 -O-CH=CH-CH3 _;
R ^B2 each independently represents one or more groups selected from -R ^B3 -O-CH ₂ CH ₂ CH ₂ -SiR ^B4 _ε R ^B5 _3-ε and a hydrogen atom;
Each R ^B3 is independently a single bond or a C _1-20 alkylene group;
Each R ^B4 is independently a hydroxyl group or a hydrolyzable group;
Each R ^B5 is independently a hydrogen atom or a monovalent organic group;
R ^Si is each independently a hydroxyl group, a hydrolyzable group, a hydrogen atom, or a monovalent group containing a Si atom to which a monovalent organic group is bonded;
Each ^XA is independently a single bond or a divalent to decavalent organic group;
α is an integer from 1 to 9;
β is an integer from 1 to 9;
Each γ is independently an integer from 1 to 9.
The composition according to any one of [1] to [3], comprising a compound represented by the following formula:
[5]
A surface treatment agent comprising the composition according to any one of [1] to [4].
[6]
The surface treatment agent according to [5], further comprising one or more components selected from fluorine-containing oils and silicone oils.
[7]
The surface treatment agent according to [5] or [6], which is used as an antifouling coating agent or a waterproof coating agent.
[8]
An article comprising a substrate and a layer formed on a surface of the substrate from the composition according to any one of items [1] to [4].
[9]
An article comprising a substrate and a layer formed on the surface of the substrate from the surface treatment agent according to any one of [5] to [7].

The present invention provides a surface treatment agent that can produce a film with good abrasion resistance.

The composition of the present disclosure contains a silane compound (A) having a fluoropolyether group and a compound (B) having a fluoropolyether group and an allyl ether group. Since the composition of the present disclosure contains the above-mentioned compound (A) and compound (B), a film with good abrasion resistance can be realized. However, compound (A) and compound (B) are different.

The use of silane compound (A) can provide a film with good abrasion resistance, particularly abrasion resistance against steel wool. According to the inventors' investigations, it has been found that by using compound (B) in addition to compound (A), a film can be obtained that is not only abrasion resistant against steel wool, but also has good abrasion resistance against softer materials, for example, resin-based materials such as erasers. Although the present disclosure should not be interpreted as being limited to a particular theory, compound (B) has a vinyl ether group at the end, and it is believed that such a group can act to suppress damage to the film when friction occurs with a soft material.

［式中：
　Ｒ^Ｆ１は、それぞれ独立して、Ｒｆ^１－Ｒ^Ｆ－Ｏ_ｑ－であり；
　Ｒ^Ｆ２は、－Ｒｆ^２ _ｐ－Ｒ^Ｆ－Ｏ_ｑ－であり；
　Ｒｆ^１は、それぞれ独立して、１個又はそれ以上のフッ素原子により置換されていてもよいＣ_１－１６アルキル基であり；
　Ｒｆ^２は、１個又はそれ以上のフッ素原子により置換されていてもよいＣ_１－６アルキレン基であり；
　Ｒ^Ｆは、それぞれ独立して、２価のフルオロポリエーテル基であり；
　ｐは、０又は１であり；
　ｑは、それぞれ独立して、０又は１であり；
　Ｒ^Ｓｉは、それぞれ独立して、水酸基、加水分解性基、水素原子又は１価の有機基が結合したＳｉ原子を含む１価の基であり；
　式（１）又は式（２）のそれぞれにおいて、少なくとも１つのＲ^Ｓｉは、水酸基又は加水分解性基が結合したＳｉ原子を含む１価の基であり；
　式（１）又は式（２）のそれぞれにおいて、Ｒ^Ｓｉは、アリルエーテル基を含まず；
　Ｘ^Ａは、それぞれ独立して、単結合又は２～１０価の有機基であり；
　αは、１～９の整数であり；
　βは、１～９の整数であり；
　γは、それぞれ独立して、１～９の整数である。］
で表される少なくとも１種の化合物を含むことが好ましい。 (Silane Compound (A) Having a Fluoropolyether Group)
The silane compound (A) having a fluoropolyether group may be a compound having a fluoropolyether group and a hydrolyzable silyl group, and preferably does not contain an allyl ether group. In a preferred embodiment, the compound (A) is represented by the following formula (1) or (2):

[Wherein:
Each R ^F1 is independently Rf ¹ -R ^F -O _q -;
R ^F2 is -Rf ² _p -R ^F -O _q -;
Each Rf ¹ is independently a C _1-16 alkyl group optionally substituted by one or more fluorine atoms;
^Rf2 is a C _1-6 alkylene group optionally substituted by one or more fluorine atoms;
Each R ^F is independently a divalent fluoropolyether group;
p is 0 or 1;
Each q is independently 0 or 1;
R ^Si is each independently a hydroxyl group, a hydrolyzable group, a hydrogen atom, or a monovalent group containing a Si atom to which a monovalent organic group is bonded;
In each of formula (1) and formula (2), at least one R ^Si is a monovalent group containing a Si atom having a hydroxyl group or a hydrolyzable group bonded thereto;
In each of formula (1) or formula (2), R ^Si does not contain an allyl ether group;
Each ^XA is independently a single bond or a divalent to decavalent organic group;
α is an integer from 1 to 9;
β is an integer from 1 to 9;
Each γ is independently an integer from 1 to 9.
It is preferable that the composition contains at least one compound represented by the following formula:

In the above formula (1), each R ^F1 is independently Rf ¹ -R ^F -O _q -.

In the above formula (2), R ^F2 is —Rf ² _p —R ^F —O _q —.

In the above formula, each Rf ¹ is independently a C _1-16 alkyl group optionally substituted with one or more fluorine atoms.

The "C _1-16 alkyl group" in the above-mentioned C _1-16 alkyl group optionally substituted by one or more fluorine atoms may be a straight chain or a branched chain, and is preferably a straight chain or branched chain C _1-6 alkyl group, particularly a straight chain or branched chain C _1-3 alkyl group, more preferably a straight chain C _1-6 alkyl group, particularly a straight chain C _1-3 alkyl group.

The above Rf ¹ is preferably a C _1-16 alkyl group substituted with one or more fluorine atoms, more preferably a CF ₂ H—C _1-15 perfluoroalkylene group, and even more preferably a C _1-16 perfluoroalkyl group.

The above C _1-16 perfluoroalkyl group may be linear or branched, and is preferably a linear or branched C _1-6 perfluoroalkyl group, in particular a C _1-3 perfluoroalkyl group, and more preferably a linear C _1-6 perfluoroalkyl group, in particular a C _1-3 perfluoroalkyl group, specifically -CF ₃ , -CF ₂ CF ₃ , or -CF ₂ CF ₂ CF ₃ .

In the above formula, ^Rf2 is a C _1-6 alkylene group optionally substituted with one or more fluorine atoms.

The "C _1-6 alkylene group" in the above-mentioned C _1-6 alkylene group optionally substituted by one or more fluorine atoms may be a straight chain or a branched chain, and is preferably a straight chain or branched chain C _1-3 alkylene group, and more preferably a straight chain C _1-3 alkylene group.

The above Rf ² is preferably a C _1-6 alkylene group substituted with one or more fluorine atoms, more preferably a C _1-6 perfluoroalkylene group, and even more preferably a C _1-3 perfluoroalkylene group.

The C _1-6 perfluoroalkylene group may be linear or branched, and is preferably a linear or branched C _1-3 perfluoroalkylene group, more preferably a linear C _1-3 perfluoroalkylene group, specifically, -CF ₂ -, -CF ₂ CF ₂ -, or -CF ₂ CF ₂ CF ₂ -.

In the above formula, p is 0 or 1. In one embodiment, p is 0. In another embodiment, p is 1.

In the above formula, each q is independently 0 or 1. In one embodiment, q is 0. In another embodiment, q is 1.

In the above formulas (1) and (2), each R 1 ^F is independently a divalent fluoropolyether group.

^RF is preferably of the formula:
-(OC ₆ F ₁₂ ) _a -(OC ₅ F ₁₀ ) _b -(OC ₄ F ₈ ) _c -(OC ₃ R ^Fa ₆ ) _d -(OC ₂ F ₄ ) _e -(OCF ₂ ) _f -
[Wherein:
Each R ^Fa is independently a hydrogen atom, a fluorine atom, or a chlorine atom;
a, b, c, d, e, and f are each independently an integer of 0 to 200, and the sum of a, b, c, d, e, and f is 1 or more. The order of occurrence of each repeating unit enclosed in parentheses with a, b, c, d, e, or f is arbitrary in the formula. However, when all R ^Fa are hydrogen atoms or chlorine atoms, at least one of a, b, c, e, and f is 1 or more.]
(hereinafter, also referred to as a group represented by "PFPE").

R ^Fa is preferably a hydrogen atom or a fluorine atom, more preferably a fluorine atom, provided that when all R ^Fa are hydrogen atoms or chlorine atoms, at least one of a, b, c, e and f is 1 or more.

A, b, c, d, e and f may each preferably be independently an integer from 0 to 100.

The sum of a, b, c, d, e and f is preferably 5 or more, more preferably 10 or more, and may be, for example, 15 or more or 20 or more. The sum of a, b, c, d, e and f is preferably 200 or less, more preferably 100 or less, and even more preferably 60 or less, and may be, for example, 50 or less or 30 or less.

These repeating units may be linear or branched, and may contain a ring structure. For example, -(OC ₆ F ₁₂ )- is -(OCF ₂ CF ₂ CF ₂ CF ₂ CF ₂ CF ₂ )-, -(OCF(CF ₃ )CF ₂ CF ₂ CF ₂ CF ₂ )-, -(OCF ₂ CF(CF ₃ )CF ₂ CF ₂ CF ₂ )-, -(OCF ₂ CF ₂ CF(CF ₃ )CF ₂ CF ₂ )-, -(OCF ₂ CF ₂ CF ₂ CF (CF ₃ )CF ₂ )-, -(OCF ₂ CF ₂ CF ₂ CF ₂ CF (CF ₃ ))-, etc. may be used. -(OC ₅ F ₁₀ )- is -(OCF ₂ CF ₂ CF ₂ CF ₂ CF ₂ )-, -(OCF(CF ₃ )CF ₂ CF ₂ CF ₂ )-, -(OCF ₂ CF(CF ₃ )CF ₂ CF ₂ )-, -(OCF ₂ CF ₂ CF(CF ₃ )CF ₂ )-, -(OCF ₂ CF ₂ CF ₂ CF(CF ₃ ))-, etc. may be used. -( _OC4F8 )- may be any _of -( _{OCF2CF2CF2CF2 )} -, -(OCF( _{CF3 ) CF2CF2} )-, -( _OCF2CF ( _CF3 ) _CF2 )-, -( _OCF2CF2CF ( _CF3 ))-, -(OC( _{CF3 ) 2CF2} )-, -(OCF2C( _CF3 ) ₂ )-, -( _{OCF ( CF3} )CF( _{CF3 )} )-, -(OCF( _{C2F5 ) CF2 )} - and - _{( OCF2CF} ( _C2F5 ))-. -(OC ₃ F ₆ )- (i.e., in the above formula, R ^Fa is a fluorine atom) may be any of -(OCF ₂ CF ₂ CF ₂ )-, -(OCF(CF ₃ )CF ₂ )-, and -(OCF ₂ CF(CF ₃ ))-. -(OC ₂ F ₄ )- may be any of -(OCF ₂ CF ₂ )- and -(OCF(CF ₃ ))-.

［式中、＊は、結合位置を示す。］ The ring structure may be a three-, four-, five-, or six-membered ring as described below.

[In the formula, * indicates the bond position.]

The ring structure may preferably be a four-membered ring, a five-membered ring, or a six-membered ring, more preferably a four-membered ring or a six-membered ring.

［式中、＊は、結合位置を示す。］ The repeating unit having a ring structure may preferably be the following unit.

[In the formula, * indicates the bond position.]

In one embodiment, the repeating unit is linear. By making the repeating unit linear, the surface slip properties, abrasion resistance, etc. of the film (surface treatment layer) can be improved.

In one embodiment, the repeating unit is a branched chain. By making the repeating unit a branched chain, the dynamic friction coefficient of the film (surface treatment layer) can be increased.

（式中、＊は、結合位置を示す。）
である。］；
　－（ＯＣ_６Ｆ_１２）_ａ－（ＯＣ_５Ｆ_１０）_ｂ－（ＯＣ_４Ｆ_８）_ｃ－（ＯＣ_３Ｆ_６）_ｄ－（ＯＣ_２Ｆ_４）_ｅ－（ＯＣＦ_２）_ｆ－　　　（ｆ５）
［式中、ｅは、１以上２００以下の整数であり、ａ、ｂ、ｃ、ｄ及びｆは、それぞれ独立して０以上２００以下の整数であって、また、ａ、ｂ、ｃ、ｄ、ｅ又はｆを付して括弧でくくられた各繰り返し単位の存在順序は式中において任意である。］
　－（ＯＣ_６Ｆ_１２）_ａ－（ＯＣ_５Ｆ_１０）_ｂ－（ＯＣ_４Ｆ_８）_ｃ－（ＯＣ_３Ｆ_６）_ｄ－（ＯＣ_２Ｆ_４）_ｅ－（ＯＣＦ_２）_ｆ－　　　（ｆ６）
［式中、ｆは、１以上２００以下の整数であり、ａ、ｂ、ｃ、ｄ及びｅは、それぞれ独立して０以上２００以下の整数であって、また、ａ、ｂ、ｃ、ｄ、ｅ又はｆを付して括弧でくくられた各繰り返し単位の存在順序は式中において任意である。］ In one embodiment, each R ^F is independently a group represented by any one of the following formulas (f1) to (f6).
-(OC ₃ F ₆ ) _d - (OC ₂ F ₄ ) _e - (f1)
[In the formula, d is an integer from 1 to 200, and e is 0 or 1.]
-(OC ₄ F ₈ ) _c - (OC ₃ R ^Fa ₆ ) _d - (OC ₂ F ₄ ) _e - (OCF ₂ ) _f - (f2)
[In the formula, each R ^Fa independently represents a hydrogen atom, a fluorine atom, or a chlorine atom, and is preferably a fluorine atom; each c and d independently represent an integer of 0 to 30; each e and f independently represent an integer of 1 to 200;
the sum of c, d, e, and f is 2 or more;
The order of occurrence of each repeat unit enclosed in parentheses with the subscript c, d, e, or f is arbitrary in the formula.
-(R ⁶ -R ⁷ ) _g - (f3)
[wherein ^R6 is _OCF2 or _{OC2F4 ,}
^R7 is a group selected from _OC2F4 , _{OC3F6 , OC4F8 , OC5F10 and OC6F12} , or a combination of two or _three groups independently selected from these groups _;
g is an integer from 2 to 100;
-(R ⁶ -R ⁷ ) _g -R ^r -(R ^7' -R ^6' ) _g' - (f4)
[wherein ^R6 is _OCF2 or _{OC2F4 ,}
^R7 is a group selected from _OC2F4 , _{OC3F6 , OC4F8 , OC5F10 and OC6F12} , or a combination of two or _three groups independently selected from these groups _;
R6 ^' is _OCF2 or _{OC2F4 ;}
R ^7′ is a group selected from OC ₂ F ₄ , OC ₃ F ₆ , OC ₄ F ₈ , OC ₅ F ₁₀ and OC ₆ F ₁₂ , or a combination of two or three groups independently selected from these groups;
g is an integer from 2 to 100;
g' is an integer from 2 to 100,
^Rr is

(In the formula, * indicates the bond position.)
is.];
-(OC ₆ F ₁₂ ) _a -(OC ₅ F ₁₀ ) _b -(OC ₄ F ₈ ) _c -(OC ₃ F ₆ ) _d -(OC ₂ F ₄ ) _e -(OCF ₂ ) _f - (f5)
[In the formula, e is an integer of 1 or more and 200 or less, a, b, c, d, and f are each independently an integer of 0 or more and 200 or less, and the order of the repeating units enclosed in parentheses with a, b, c, d, e, or f is arbitrary in the formula.]
- (OC ₆ F ₁₂ ) _a - (OC ₅ F ₁₀ ) _b - (OC ₄ F ₈ ) _c - (OC ₃ F ₆ ) _d - (OC ₂ F ₄ ) _e - (OCF ₂ ) _f - (f6)
[In the formula, f is an integer of 1 or more and 200 or less, a, b, c, d, and e are each independently an integer of 0 or more and 200 or less, and the order of the repeating units enclosed in parentheses with a, b, c, d, e, or f is arbitrary in the formula.]

In the above formula (f1), d is preferably an integer of 5 to 200, more preferably 10 to 100, further preferably 15 to 50, for example, 25 to 35. In the above formula (f1), OC ₃ F ₆ is preferably (OCF ₂ CF ₂ CF ₂ ), (OCF(CF ₃ )CF ₂ ) or (OCF ₂ CF(CF ₃ )), more preferably (OCF ₂ CF ₂ CF ₂ ). In the above formula (f1), (OC ₂ F ₄ ) is preferably (OCF ₂ CF ₂ ) or (OCF(CF ₃ )), more preferably (OCF ₂ CF ₂ ). In one embodiment, e is 0. In another embodiment, e is 1.

In the above formula (f2), e and f are each independently an integer of preferably 5 to 200, more preferably 10 to 200. The sum of c, d, e and f is preferably 5 or more, more preferably 10 or more, and may be, for example, 15 or more or 20 or more. In one embodiment, the above formula (f2) is preferably a group represented by -(OC ₄ F ₈ ) _c -(OC ₃ F ₆ ) _d -(OC ₂ F ₄ ) _e -(OCF ₂ ) _f -, more preferably a group represented by -(OCF ₂ CF ₂ CF ₂ CF ₂ ) _c -(OCF ₂ CF ₂ CF ₂ ) _d -(OCF ₂ CF ₂ ) _e -(OCF ₂ ) _f -. In another embodiment, formula (f2) may be a group represented by -(OC ₂ F ₄ ) _e -(OCF ₂ ) _f -. In yet another embodiment, formula (f2) may be -(OC ₄ F ₈ ) _c -(OCF ₂ CF ₂ (CR ^Fa ) ₂ ) _d10 -(OCF ₂ CF(CF ₃ )) _d11 -(OCF ₂ CF ₂ ) _e -(OCF ₂ ) _f -. d10 and d11 are each independently an integer of 0 to 200, preferably an integer of 5 to 200, more preferably an integer of 10 to 200. However, the sum of d10 and d11 is 0 to 200, preferably 5 to 200, more preferably 10 to 200.

In the above formula (f3), ^R6 is preferably _{OC2F4 ,} and in another embodiment,
In the _above (f3), R ⁷ is preferably a group selected from OC ₂ F ₄ , OC ₃ F ₆ and OC ₄ F ₈ , or a combination of two or three groups independently selected from these groups, and more preferably a group selected from OC ₃ F ₆ and OC ₄ F ₈ . The combination of two or three groups independently selected from OC ₂ F ₄ , OC ₃ F ₆ and OC ₄ F ₈ is not particularly limited, and examples thereof include -OC ₂ F ₄ OC ₃ F ₆ -, -OC ₂ F ₄ OC ₄ F ₈ -, -OC ₃ F 6 OC ₂ F ₄ -, -OC ₃ F ₆ OC ₃ F ₆ -, -OC ₃ F ₆ OC ₄ F ₈ -, -OC 4 F ₈ OC ₄ F ₈ -, -OC ₄ F ₈ OC ₃ F ₆ -, -OC ₄ F ₈ OC ₂ F ₄ -, -OC _{2 F 4} OC ₂ F ₄ OC ₃ F ₆ - _, -OC ₂ F ₄ OC ₂ F ₄ OC ₄ F ₈ -, -OC ₂ F ₄ OC ₃ F ₆ OC ₂ F ₄ -, -OC ₂ F ₄ OC ₃ F ₆ OC ₃ F ₆ -, -OC ₂ F ₄ OC ₄ F ₈ OC ₂ F ₄ -, -OC ₃ F ₆ OC ₂ F ₄ OC ₂ F ₄ -, -OC ₃ F ₆ OC ₂ F ₄ OC ₃ F ₆ -, -OC ₃ F ₆ OC ₃ F ₆ OC ₂ F ₄ -, and -OC ₄ F ₈ OC ₂ F ₄ OC ₂ Examples include F ₄ -. In the above formula (f3), g is preferably an integer of 3 or more, more preferably 5 or more. The above g is preferably an integer of 50 or less. In the above formula (f3), OC ₂ F ₄ , OC ₃ F ₆ , OC ₄ F ₈ , OC ₅ F ₁₀ and OC ₆ F ₁₂ may be either linear or branched, and are preferably linear. In this embodiment, the above formula (f3) is preferably -(OC ₂ F ₄ -OC ₃ F ₆ ) _g - or -(OC ₂ F ₄ -OC ₄ F ₈ ) _g -.

［式中、＊は、結合位置を示す。］
であり、より好ましくは

［式中、＊は、結合位置を示す。］
である。 In the above formula (f4), R ⁶ , R ⁷ and g have the same meanings as those described in the above formula (f3) and have the same embodiments. R ^{6 '} , R ^{7 '} and g ' have the same meanings as those described in the above formula (f3) and have the same embodiments. ^{R r} is preferably

[In the formula, * indicates the bond position.]
and more preferably

[In the formula, * indicates the bond position.]
It is.

In the above formula (f5), e is preferably an integer of 1 or more and 100 or less, more preferably an integer of 5 or more and 100 or less. The sum of a, b, c, d, e, and f is preferably 5 or more, more preferably 10 or more, for example, 10 or more and 100 or less.

In the above formula (f6), f is preferably an integer of 1 or more and 100 or less, more preferably an integer of 5 or more and 100 or less. The sum of a, b, c, d, e, and f is preferably 5 or more, more preferably 10 or more, for example, 10 or more and 100 or less.

In one embodiment, the R ^F is a group represented by the formula (f1).

In one embodiment, the ^RF is a group represented by the formula (f2).

In one embodiment, the R ^F is a group represented by the formula (f3).

In one embodiment, the R ^F is a group represented by the formula (f4).

In one embodiment, the R ^F is a group represented by the formula (f5).

In the above R ^F , the ratio of e to f (hereinafter referred to as "e/f ratio") is 0.1 to 10, preferably 0.2 to 5, more preferably 0.2 to 2, even more preferably 0.2 to 1.5, and even more preferably 0.2 to 0.85. By making the e/f ratio 10 or less, the slipperiness, wear resistance, and chemical resistance of the film (surface treatment layer) obtained from this compound are further improved. The smaller the e/f ratio, the more the slipperiness and wear resistance of the film are improved. On the other hand, by making the e/f ratio 0.1 or more, the stability of the compound can be further improved. The larger the e/f ratio, the more the stability of the compound is improved.

In the above fluoropolyether group-containing silane compound, the number average molecular weight of the ^RF1 and ^RF2 portions is not particularly limited, but is, for example, 500 to 30,000, preferably 1,500 to 30,000, and more preferably 2,000 to 10,000. In this specification, the number average molecular weights of ^RF1 and ^RF2 are values measured by ^19F -NMR.

In another embodiment, the number average molecular weight of the ^RF1 and ^RF2 portions may be from 500 to 30,000, preferably from 1,000 to 20,000, more preferably from 2,000 to 15,000, even more preferably from 2,000 to 10,000, for example, from 3,000 to 6,000.

In another embodiment, the number average molecular weight of the ^RF1 and ^RF2 portions can be from 4,000 to 30,000, preferably from 5,000 to 10,000, and more preferably from 6,000 to 10,000.

In the above formulas (1) and (2), R 3 ^Si is each independently a monovalent group containing a Si atom to which a hydroxyl group, a hydrolyzable group, a hydrogen atom, or a monovalent organic group is bonded, and at least one R 3 ^Si is a monovalent group containing a Si atom to which a hydroxyl group or a hydrolyzable group is bonded. R 3 ^Si contributes to adhesion to a substrate and may chemically react with the material of the substrate.

In a preferred embodiment, R 1 ^Si is a monovalent group containing a Si atom having a hydroxyl group or a hydrolyzable group bonded thereto.

で表される基である。 In a preferred embodiment, R ^Si is represented by the following formula (S3) or (S4):

It is a group represented by the following formula:

In the above formula, each R ^a1 is independently —Z ¹ —SiR ²² _q1 R ²³ _r1 .

The above Z1 ^'s are each independently an oxygen atom or a ^divalent organic group. In the structure hereinafter described as ^Z1 , the right side is bonded to ₍ ^SiR22q1R23r1 ) _.

In a preferred embodiment, ^Z1 is a divalent organic group.

In a preferred embodiment, Z ¹ does not include any that forms a siloxane bond with the Si atom to which Z ¹ is bonded. Preferably, in formula (S3), (Si-Z ¹ -Si) does not include a siloxane bond.

The above Z ¹ is preferably a C _1-6 alkylene group, -(CH ₂ ) _z1 -O-(CH ₂ ) _z2 - (wherein z1 is an integer of 0 to 6, for example an integer of 1 to 6, and z2 is an integer of 0 to 6, for example an integer of 1 to 6), or -(CH ₂ ) _z3 -phenylene-(CH ₂ ) _z4 - (wherein z3 is an integer of 0 to 6, for example an integer of 1 to 6, and z4 is an integer of 0 to 6, for example an integer of 1 to ₆ ). Such a C _1-6 alkylene group may be linear or branched, but is preferably linear. These groups may be substituted with one or more substituents selected from, for example, a fluorine atom, a C _1-6 alkyl group, a C 2-6 alkenyl group, and a C _2-6 alkynyl group, but are preferably unsubstituted.

In a preferred embodiment, Z ¹ is a C _1-6 alkylene group or -(CH ₂ ) _z3 -phenylene-(CH ₂ ) _z4 -, preferably -phenylene-(CH ₂ ) _z4 -. When Z ¹ is such a group, light resistance, particularly ultraviolet resistance, may be improved.

In another preferred embodiment, Z ¹ is a C _1-3 alkylene group. In one embodiment, Z ¹ can be -CH ₂ CH ₂ CH ₂ -. In another embodiment, Z ¹ can be -CH ₂ CH ₂ -.

The above R ^22s each independently represent a hydroxyl group or a hydrolyzable group.

Preferably, each R ²² is independently a hydrolyzable group.

R ²² is preferably, each independently, -OR ^j , -OCOR ^j , -O-N=CR ^j ₂ , -NR ^j ₂ , -NHR ^j , -NCO, or halogen (wherein R ^j represents a substituted or unsubstituted C _1-4 alkyl group), more preferably -OR ^j (i.e., an alkoxy group). R ^j includes unsubstituted alkyl groups such as a methyl group, an ethyl group, a propyl group, an isopropyl group, an n-butyl group, and an isobutyl group; and substituted alkyl groups such as a chloromethyl group. Among these, an alkyl group, particularly an unsubstituted alkyl group, is preferred, and a methyl group or an ethyl group is more preferred. In one embodiment, R ^j is a methyl group, and in another embodiment, R ^j is an ethyl group.

Each ^R23 is independently a hydrogen atom or a monovalent organic group. Such a monovalent organic group is a monovalent organic group excluding the hydrolyzable group.

In R ²³ , the monovalent organic group is preferably a C _1-20 alkyl group, more preferably a C _1-6 alkyl group, and even more preferably a methyl group.

Each q1 is independently an integer of 0 to 3, and each r1 is independently an integer of 0 to 3. The sum of q1 and r1 is 3 in the (SiR ²² _q1 R ²³ _r1 ) unit.

In one embodiment, q1 is independently an integer of 1 to 3, preferably an integer of 2 to 3, and more preferably 3 for each (SiR ²² _q1 R ²³ _r1 ) unit.

In one embodiment, q1 is independently an integer of 1 to 3, preferably an integer of 2 to 3, and more preferably 3, for each (SiR ²² _q1 R ²³ _r1 ) unit.

In the above formula, each R ^b1 is independently a hydroxyl group or a hydrolyzable group.

Preferably, each of the R ^b1 's is independently a hydrolyzable group.

Preferably, each R ^b1 is independently -OR ^j , -OCOR ^j , -O-N=CR ^j ₂ , -NR ^j ₂ , -NHR ^j , -NCO, or halogen (wherein R ^j is a substituted or unsubstituted C _1-4 alkyl group), and more preferably -OR ^j (i.e., an alkoxy group). Examples of R ^j include unsubstituted alkyl groups such as a methyl group, an ethyl group, a propyl group, an isopropyl group, an n-butyl group, and an isobutyl group; and substituted alkyl groups such as a chloromethyl group. Among these, an alkyl group, particularly an unsubstituted alkyl group, is preferred, and a methyl group or an ethyl group is more preferred. In one embodiment, R ^j is a methyl group, and in another embodiment, R ^j is an ethyl group.

In the above formula, each R ^c1 is independently a hydrogen atom or a monovalent organic group. Such a monovalent organic group is a monovalent organic group excluding the above hydrolyzable groups.

In the above R ^c1 , the monovalent organic group is preferably a C _1-20 alkyl group, more preferably a C _1-6 alkyl group, and even more preferably a methyl group.

Each k1 is independently an integer of 0 to 3, each l1 is independently an integer of 0 to 3, and each m1 is independently an integer of 0 to 3. The sum of k1, l1 and m1 is 3 in the (SiR ^a1 _k1 R ^b1 _l1 R ^c1 _m1 ) unit.

In one embodiment, k1 is independently for each (SiR ^a1 _k1 R ^b1 _l1 R ^c1 _m1 ) unit an integer from 1 to 3, preferably 2 or 3, more preferably 3. In a preferred embodiment, k1 is 3.

In the above formulas (1) and (2), when R ^Si is a group represented by formula (S3), preferably, at least two Si atoms to which a hydroxyl group or a hydrolyzable group is bonded are present in the terminal portion of formula (1) and formula (2).

In a preferred embodiment, when R ^a1 is present in formula (S3), q1 is an integer of 1 to 3, preferably 2 or 3, and more preferably 3 in at least one, preferably all, R ^a1 .

In a preferred embodiment, in formula (S3), k1 is 2 or 3, preferably 3, and q1 is 2 or 3, preferably 3.

The above R ^e1 are each independently —Z ³ —SiR ³⁴ _n2 R ³⁵ _3-n2 .

The above ^Z3 's are each independently a single bond, an oxygen atom or a divalent organic group. In the structure hereinafter described as ^Z3 , the right side is bonded to (SiR ³⁴ _n2 R ³⁵ _3-n2 ).

In one embodiment, ^Z3 is an oxygen atom.

In one embodiment, ^Z3 is a divalent organic group.

Z ³ above is preferably a C _1-6 alkylene group, -(CH ₂ ) _z5" -O-(CH ₂ ) _z6" - (wherein z5" is an integer of 0 to 6, for example an integer of 1 to 6, and z6" is an integer of 0 to 6, for example an integer of 1 to 6), or -(CH ₂ ) _z7" -phenylene-(CH ₂ ) _z8" - (wherein z7" is an integer of 0 to 6, for example an integer of 1 to 6, and z8" is an integer of 0 to 6, for example an integer of 1 to 6). Such a C _1-6 alkylene group may be linear or branched, but is preferably linear. These groups may be substituted with one or more substituents selected from, for example, a fluorine atom, a C _1-6 alkyl group, a C _2-6 alkenyl group, and a C _2-6 alkynyl group, but are preferably unsubstituted.

In a preferred embodiment, Z ³ is a C _1-6 alkylene group or --(CH ₂ ) _z7" -phenylene-(CH ₂ ) _z8" --, preferably -phenylene-(CH ₂ ) _z8" --. When Z ³ is such a group, light resistance, particularly ultraviolet resistance, may be improved.

In another preferred embodiment, Z ³ is a C _1-3 alkylene group. In one embodiment, Z ³ can be -CH ₂ CH ₂ CH ₂ -. In another embodiment, Z ³ can be -CH ₂ CH ₂ -.

The above R ³⁴ s each independently represent a hydroxyl group or a hydrolyzable group.

Preferably, each R ³⁴ is independently a hydrolyzable group.

R ³⁴ is preferably, each independently, -OR ^j , -OCOR ^j , -O-N=CR ^j ₂ , -NR ^j ₂ , -NHR ^j , -NCO, or halogen (wherein R ^j represents a substituted or unsubstituted C _1-4 alkyl group), and more preferably -OR ^j (i.e., an alkoxy group). R ^j includes unsubstituted alkyl groups such as a methyl group, an ethyl group, a propyl group, an isopropyl group, an n-butyl group, and an isobutyl group; and substituted alkyl groups such as a chloromethyl group. Among these, an alkyl group, particularly an unsubstituted alkyl group, is preferred, and a methyl group or an ethyl group is more preferred. In one embodiment, R ^j is a methyl group, and in another embodiment, R ^j is an ethyl group.

Each R ³⁵ is independently a hydrogen atom or a monovalent organic group. Such a monovalent organic group is a monovalent organic group excluding the hydrolyzable group.

In the above R ³⁵ , the monovalent organic group is preferably a C _1-20 alkyl group, more preferably a C _1-6 alkyl group, and even more preferably a methyl group.

In the above formula, n2 is independently an integer from 0 to 3 for each (SiR ⁿ² R ³⁵ _3-n2 ) unit. However, when R ^Si is a group represented by formula (S4), at least one (SiR _n2 R ³⁵ _{3-n2 )} unit in which n2 is 1 to 3 is present in the terminal portion of formula (1) and formula (2). That is, in such terminal portion, all n2's do not become 0 at the same time. In other words, at least one Si atom to which a ^hydroxyl group or a hydrolyzable group is bonded is present in the terminal portion of formula (1) and formula (2).

n2 is preferably an integer of 1 to 3, more preferably 2 or 3, and further preferably 3, independently for each (SiR ³⁴ _n2 R ³⁵ _3-n2 ) unit.

Each R ^f1 is independently a hydrogen atom, a hydroxyl group, or a monovalent organic group. Such a monovalent organic group is a monovalent organic group excluding the above hydrolyzable groups.

In the above R ^f1 , the monovalent organic group is preferably a C _1-20 alkyl group or -(C _s H _2s ) _t1 -(O-C _s H _2s ) _t2 (wherein s is an integer of 1 to 6, preferably an integer of 2 to 4, t1 is 1 or 0, preferably 0, and t2 is an integer of 1 to 20, preferably an integer of 2 to 10, more preferably an integer of 2 to 6), more preferably a C _1-20 alkyl group, still more preferably a C _1-6 alkyl group, and particularly preferably a methyl group.

In one embodiment, R ^f1 is a hydroxyl group.

In another embodiment, R ^f1 is a monovalent organic group, preferably a C _1-20 alkyl group, more preferably a C _1-6 alkyl group.

In the above formulas (1) and (2), when R ^Si is a group represented by formula (S4), preferably, at least two Si atoms to which a hydroxyl group or a hydrolyzable group is bonded are present in the terminal portion of formula (1) and formula (2).

In one embodiment, when R ^Si is a group represented by formula (S4), the (SiR ⁿ² R ³⁵ _{3 -n2} ) units, where n2 is 1 to 3, preferably 2 or 3, and more preferably 3, are present in each terminal portion of formula (1) and formula (2) at 2 or more, for example 2 to 27, preferably 2 to 9, more preferably 2 to 6, even more preferably 2 to 3, and particularly preferably 3.

In a preferred embodiment, in formula (S4), when R ^e1 is present, n2 is an integer of 1 to 3, preferably 2 or 3, and more preferably 3, in at least one, preferably all, R ^e1 .

In a preferred embodiment, in formula (S4), l2 is 2 or 3, preferably 3, and n2 is 2 or 3, preferably 3.

In one embodiment, R ^Si is a group represented by formula (S3) or (S4). These compounds can have multiple hydrolyzable groups branched from one Si atom or C atom at one end, and therefore can form a film with even higher abrasion resistance.

In one embodiment, R 3 ^Si is a group represented by formula (S3).

In one embodiment, R 3 ^Si is a group represented by formula (S4).

Each ^XA may independently be a single bond or a divalent to decavalent organic group.

The divalent to decavalent organic group in ^XA is preferably a divalent to octavalent organic group. In one embodiment, the divalent to decavalent organic group is preferably a divalent to tetravalent organic group, more preferably a divalent organic group. In another embodiment, the divalent to decavalent organic group is preferably a trivalent to octavalent organic group, more preferably a trivalent to hexavalent organic group.

In one embodiment, X 1 ^A is a single bond or a divalent organic group, α is 1 and β is 1.

In one embodiment, X 1 ^A is a single bond or a divalent organic group and γ is 1.

In one embodiment, ^XA is a trivalent to hexavalent organic group, α is 1, and β is 2-5.

In one embodiment, ^XA is a trivalent to hexavalent organic group and γ is 2 to 5.

In one embodiment, X 1 ^A is a trivalent organic group, α is 1 and β is 2.

In one embodiment, ^XA is a trivalent organic group and γ is 2.

When ^XA is a single bond or a divalent organic group, formulas (1) and (2) are represented by the following formulas (1a) and (2a).

In each of formula (1a) and formula (2a), at least one R 1 ^Si is a monovalent group containing a Si atom having a hydroxyl group or a hydrolyzable group bonded thereto. In addition, in each of formula (1a) and formula (2a), R 1 ^Si does not contain an allyl ether group.

In one embodiment, ^XA is a single bond.

In another embodiment, ^XA is a divalent organic group.

In one embodiment, ^XA is, for example, a single bond or the following formula:
-(R ⁵¹ ) _p5 -(X ⁵¹ ) _q5 -
[Wherein:
R ⁵¹ represents a single bond, —(CH ₂ ) _s5 —, or an o-, m-, or p-phenylene group, and is preferably —(CH ₂ ) _s5 —;
s5 is an integer from 1 to 20, preferably an integer from 1 to 6, more preferably an integer from 1 to 3, even more preferably 1 or 2;
X ⁵¹ represents -(X ⁵² ) _l5 -;
X ⁵² each independently represents a group selected from the group consisting of -O-, -S-, o-, m- or p-phenylene group, -C(O)O-, -Si(R ⁵³ ) ₂ -, -(Si(R ⁵³ ) ₂ O) _m5 -Si(R ⁵³ ) ₂ -, -CONR ⁵⁴ -, -O-CONR ⁵⁴ -, -NR ⁵⁴ - and -(CH ₂ ) _n5 -;
R ⁵³ each independently represents a phenyl group, a C _1-6 alkyl group, or a C _1-6 alkoxy group, preferably a phenyl group or a C _1-6 alkyl group, more preferably a methyl group;
R ⁵⁴ each independently represents a hydrogen atom, a phenyl group, or a C _1-6 alkyl group (preferably a methyl group);
m5 is independently an integer of 1 to 100, preferably an integer of 1 to 20;
n5 is independently an integer from 1 to 20, preferably an integer from 1 to 6, more preferably an integer from 1 to 3;
l5 is an integer from 1 to 10, preferably an integer from 1 to 5, more preferably an integer from 1 to 3;
p5 is 0 or 1;
q5 is 0 or 1;
Here, at least one of p5 and q5 is 1, and the order of the repeating units enclosed in parentheses with p5 or q5 is arbitrary.
In this case, X ^A (typically a hydrogen atom of X ^A ) may be substituted with one or more substituents selected from a fluorine atom, a C _1-3 alkyl group, and a C _1-3 fluoroalkyl group. In a preferred embodiment, X ^A is not substituted with these groups.

In a preferred embodiment, each of the ^XA 's is independently -( ^R51 ) _p5- ( ^X51 ) _q5 - ^R52- . ^R52 represents a single bond, -( _CH2 ) _t5- or an o-, m- or p-phenylene group, and is preferably -( _CH2 ) _t5- . t5 is an integer of 1 to 20, preferably an integer of 2 to 6, and more preferably an integer of 2 to 3. Here, ^R52 (typically the hydrogen atom of ^R52 ) may be substituted with one or more substituents selected from a fluorine atom, a _C1-3 alkyl group, and a _C1-3 fluoroalkyl group. In a preferred embodiment, ^R56 is not substituted with these groups.

Preferably, each ^XA is independently
Single bond,
a C _1-20 alkylene group,
-R ⁵¹ -X ⁵³ -R ⁵² -, or -X ⁵⁴ -R ⁵² -
[In the formula, R ⁵¹ and R ⁵² are as defined above,
^X53 is
-O-,
-S-,
-C(O)O-,
-CONR ^54- ,
-O-CONR ⁵⁴ -,
-Si(R ⁵³ ) ₂ -,
-(Si(R ⁵³ ) ₂ O) _m5 -Si(R ⁵³ ) ₂ -,
-O-(CH ₂ ) _u5 -(Si(R ⁵³ ) ₂ O) _m5 -Si(R ⁵³ ) ₂ -,
-O-( _CH2 ) _u5 -Si( ^R53 ) ₂ -O-Si( ^R53 ) _2- CH2CH2 _{- Si} ( ^R53 ) ₂ -O-Si( ^R53 ) _2- ,
-O-(CH ₂ ) _u5 -Si(OCH ₃ ) ₂ OSi(OCH ₃ ) ₂ -,
^-CONR54- ( _CH2 ) _u5- (Si( ^R53 ) _2O ) _m5 -Si( ^R53 ) _2- ,
-CONR ⁵⁴ -(CH ₂ ) _u5 -N(R ⁵⁴ )-, or -CONR ⁵⁴ -(o-, m- or p-phenylene)-Si(R ⁵³ ) ₂ -
(In the formula, R ⁵³ , R ⁵⁴ and m5 are as defined above.)
u5 is an integer of 1 to 20, preferably an integer of 2 to 6, and more preferably an integer of 2 to 3;
^X54 is
-S-,
-C(O)O-,
-CONR ^54- ,
-O-CONR ⁵⁴ -,
^-CONR54- ( _CH2 ) _u5- (Si( ^R54 ) _2O ) _m5 -Si( ^R54 ) _2- ,
^-CONR54- ( _CH2 ) _u5 -N( ^R54 )-, or ^-CONR54- (o-, m- or p-phenylene)-Si( ^R54 ) _2-
(In the formula, each symbol has the same meaning as above.)
represents.]
It could be.

More preferably, each ^XA is independently
Single bond,
a C _1-20 alkylene group,
-(CH ₂ ) _s5 -X ⁵³ -,
-(CH ₂ ) _s5 -X ⁵³ -(CH ₂ ) _t5 -
^-X54- or ^-X54- ( _CH2 ) _t5-
[In the formula, X ⁵³ , X ⁵⁴ , s5 and t5 are as defined above.]
It is.

More preferably, each ^XA is independently
Single bond,
a C _1-20 alkylene group,
-(CH ₂ ) _s5 -X ⁵³ -(CH ₂ ) _t5 -, or -X ⁵⁴ -(CH ₂ ) _t5 -
[In the formula, each symbol has the same meaning as above.]
It could be.

In a preferred embodiment, each ^XA is independently
a single bond C _1-20 alkylene group,
-(CH ₂ ) _s5 -X ⁵³ - or -(CH ₂ ) _s5 -X ⁵³ -(CH ₂ ) _t5 -
[Wherein,
X ⁵³ is —O—, —CONR ⁵⁴ —, or —O—CONR ⁵⁴ —;
R ⁵⁴ each independently represents a hydrogen atom, a phenyl group, or a C _1-6 alkyl group;
s5 is an integer from 1 to 20,
t5 is an integer from 1 to 20.
It could be.

In a preferred embodiment, each ^XA is independently
-(CH ₂ ) _s5 -O-(CH ₂ ) _t5 -
-CONR ⁵⁴ -(CH ₂ ) _t5 -
[Wherein,
R ⁵⁴ each independently represents a hydrogen atom, a phenyl group, or a C _1-6 alkyl group;
s5 is an integer from 1 to 20,
t5 is an integer from 1 to 20.
It could be.

In one embodiment, each ^XA is independently
Single bond,
a C _1-20 alkylene group,
-(CH ₂ ) _s5 -O-(CH ₂ ) _t5 -,
-(CH ₂ ) _s5 -(Si(R ⁵³ ) ₂ O) _m5 -Si(R ⁵³ ) ₂ -(CH ₂ ) _t5 -,
-(CH ₂ ) _s5 -O-(CH ₂ ) _u5 -(Si(R ⁵³ ) ₂ O) _m5 -Si(R ⁵³ ) ₂ -(CH ₂ ) _t5 -, or -(CH ₂ ) _s5 -O-(CH ₂ ) _t5 -Si(R ⁵³ ) ₂ -(CH _{2 ) u5} -Si( ^R53 ) _2- ( _Cv5H2v5 )-
[In the formula, R ⁵³ , m5, s5, t5 and u5 are defined as above, and v5 is an integer of 1 to 20, preferably an integer of 2 to 6, and more preferably an integer of 2 to 3.]
It is.

In the above formula, --(C _v H _2v )-- may be a straight chain or a branched chain, for example, --CH ₂ CH ₂ --, --CH ₂ CH ₂ CH ₂ --, --CH(CH ₃ )--, or --CH(CH ₃ )CH ₂ --.

Each of the X 1 ^A may be independently substituted with one or more substituents selected from a fluorine atom, a C _1-3 alkyl group, and a C _1-3 fluoroalkyl group (preferably a C _1-3 perfluoroalkyl group). In one embodiment, X 1 ^A is unsubstituted.

In addition, the left side of each formula of ^XA above is bonded to R ^F1 or R ^F2 , and the right side is bonded to R ^Si .

In one embodiment, each X 1 ^A may independently be other than an —O—C _1-6 alkylene group.

［式中、Ｒ^４１は、それぞれ独立して、水素原子、フェニル基、Ｃ_１－６アルキル基、又はＣ_１－６アルコキシ基、好ましくはメチル基であり；
　Ｄは、
－ＣＨ_２Ｏ（ＣＨ_２）_２－、
－ＣＨ_２Ｏ（ＣＨ_２）_３－、
－ＣＦ_２Ｏ（ＣＨ_２）_３－、
－（ＣＨ_２）_２－、
－（ＣＨ_２）_３－、
－（ＣＨ_２）₄－、
－ＣＯＮＨ－（ＣＨ_２）_３－、
－ＣＯＮ（ＣＨ_３）－（ＣＨ_２）_３－、
－ＣＯＮ（Ｐｈ）－（ＣＨ_２）_３－（式中、Ｐｈはフェニルを意味する）、及び

（式中、Ｒ^４２は、それぞれ独立して、水素原子、Ｃ_１－６のアルキル基又はＣ_１－６のアルコキシ基、好ましくはメチル基又はメトキシ基、より好ましくはメチル基を表す。）
から選択される基であり、
　Ｅは、－（ＣＨ_２）_ｎ－（ｎは２～６の整数）であり、
　Ｄは、分子主鎖のＲ^Ｆ１又はＲ^Ｆ２に結合し、Ｅは、Ｒ^Ｓｉに結合する。］ In another embodiment, ^XA includes, for example, the following groups:

[In the formula, each R ⁴¹ independently represents a hydrogen atom, a phenyl group, a C _1-6 alkyl group, or a C _1-6 alkoxy group, preferably a methyl group;
D is
-CH ₂ O(CH ₂ ) ₂ -,
-CH ₂ O(CH ₂ ) ₃ -,
-CF ₂ O(CH ₂ ) ₃ -,
-(CH ₂ ) ₂ -,
-(CH ₂ ) ₃ -,
-( _CH2 ) _4- ,
-CONH-(CH ₂ ) ₃ -,
-CON( _CH3 )-( _CH2 ) _3- ,
-CON(Ph)-(CH ₂ ) ₃ - (wherein Ph means phenyl), and

(In the formula, each R ⁴² independently represents a hydrogen atom, a C _1-6 alkyl group or a C _1-6 alkoxy group, preferably a methyl group or a methoxy group, more preferably a methyl group.)
is a group selected from
E is -(CH ₂ ) _n - (n is an integer from 2 to 6);
D bonds to ^RF1 or ^RF2 of the molecular main chain, and E bonds to ^RSi .

などが挙げられる。 Specific examples of the above ^XA include:
Single bond,
-CH ₂ OCH ₂ -,
-CH ₂ O(CH ₂ ) ₂ -,
-CH ₂ O(CH ₂ ) ₃ -,
-CH ₂ O(CH ₂ ) ₄ -,
-CH ₂ O(CH ₂ ) ₅ -,
-CH ₂ O(CH ₂ ) ₆ -,
-CH ₂ O(CH ₂ ) ₃ Si(CH ₃ ) ₂ OSi(CH ₃ ) ₂ (CH ₂ ) ₂ -,
-CH ₂ O(CH ₂ ) ₃ Si(CH ₃ ) ₂ OSi(CH ₃ ) ₂ OSi(CH ₃ ) ₂ (CH ₂ ) ₂ -,
-CH ₂ O(CH ₂ ) ₃ Si(CH ₃ ) ₂ O(Si(CH ₃ ) ₂ O) ₂ Si(CH ₃ ) ₂ (CH ₂ ) ₂ -,
-CH ₂ O(CH ₂ ) ₃ Si(CH ₃ ) ₂ O(Si(CH ₃ ) ₂ O) ₃ Si(CH ₃ ) ₂ (CH ₂ ) ₂ -,
-CH ₂ O(CH ₂ ) ₃ Si(CH ₃ ) ₂ O(Si(CH ₃ ) ₂ O) ₁₀ Si(CH ₃ ) ₂ (CH ₂ ) ₂ -,
-CH ₂ O(CH ₂ ) ₃ Si(CH ₃ ) ₂ O(Si(CH ₃ ) ₂ O) ₂₀ Si(CH ₃ ) ₂ (CH ₂ ) ₂ -,
-CH ₂ OCF ₂ CHFOCF ₂ -,
-CH ₂ OCF ₂ CHFOCF ₂ CF ₂ -,
-CH ₂ OCF ₂ CHFOCF ₂ CF ₂ CF ₂ -,
-CH ₂ OCH ₂ CF ₂ CF ₂ OCF ₂ -,
-CH ₂ OCH ₂ CF ₂ CF ₂ OCF ₂ CF ₂ -,
-CH ₂ OCH ₂ CF ₂ CF ₂ OCF ₂ CF ₂ CF ₂ -,
_{-CH2OCH2CF2CF2OCF ( CF3 ) CF2OCF2- , ​}
-CH ₂ OCH ₂ CF ₂ CF ₂ OCF (CF ₃ )CF ₂ OCF ₂ CF ₂ -,
_{-CH2OCH2CF2CF2OCF ( CF3 ) CF2OCF2CF2CF2- , ​ ​ ​}
-CH ₂ OCH ₂ CHFCF ₂ OCF ₂ -,
-CH ₂ OCH ₂ CHFCF ₂ OCF ₂ CF ₂ -,
-CH ₂ OCH ₂ CHFCF ₂ OCF ₂ CF ₂ CF ₂ -,
-CH ₂ OCH ₂ CHFCF ₂ OCF (CF ₃ )CF ₂ OCF ₂ -,
-CH ₂ OCH ₂ CHFCF ₂ OCF (CF ₃ ) CF ₂ OCF ₂ CF ₂ -,
_{-CH2OCH2CHFCF2OCF ( CF3 ) CF2OCF2CF2CF2- , ​ ​}
-CH ₂ OCF ₂ CHFOCF ₂ CF ₂ CF ₂ -C(O)NH-CH ₂ -,
_-CH2OCH2 ( _CH2 ) _{7CH2Si (} OCH3) _{2OSi ( OCH3} ) ₂ ( _{CH2 ) 2Si} ( _OCH3 ) _2OSi ( _OCH3 ) ₂ (CH2 _{) 2-} ,
-CH ₂ OCH ₂ CH ₂ CH ₂ Si(OCH ₃ ) ₂ OSi(OCH ₃ ) ₂ (CH ₂ ) ₃ -,
-CH ₂ OCH ₂ CH ₂ CH ₂ Si(OCH ₂ CH ₃ ) ₂ OSi(OCH ₂ CH ₃ ) ₂ (CH ₂ ) ₃ -,
-CH ₂ OCH ₂ CH ₂ CH ₂ Si(OCH ₃ ) ₂ OSi(OCH ₃ ) ₂ (CH ₂ ) ₂ -,
-CH ₂ OCH ₂ CH ₂ CH ₂ Si(OCH ₂ CH ₃ ) ₂ OSi(OCH ₂ CH ₃ ) ₂ (CH ₂ ) ₂ -,
-(CH ₂ ) ₂ -Si(CH ₃ ) ₂ -(CH ₂ ) ₂ -,
_-CH2- ,
-(CH ₂ ) ₂ -,
-(CH ₂ ) ₃ -,
-(CH ₂ ) ₄ -,
-(CH ₂ ) ₅ -,
-(CH ₂ ) ₆ -,
-CO-,
-CONH-,
-CONH-CH ₂ -,
-CONH-(CH ₂ ) ₂ -,
-CONH-(CH ₂ ) ₃ -,
-CONH-(CH ₂ ) ₄ -,
-CONH-(CH ₂ ) ₅ -,
-CONH-(CH ₂ ) ₆ -,
-CON( _CH3 ) _-CH2- ,
-CON( _CH3 )-( _CH2 ) _2- ,
-CON( _CH3 )-( _CH2 ) _3- ,
-CON( _CH3 )-( _CH2 ) _4- ,
-CON( _CH3 )-( _CH2 ) _5- ,
-CON( _CH3 )-( _CH2 ) _6- ,
-CON(Ph)-CH ₂ - (wherein Ph means phenyl),
-CON(Ph)-(CH ₂ ) ₂ - (wherein Ph means phenyl);
-CON(Ph)-(CH ₂ ) ₃ - (wherein Ph means phenyl);
-CON(Ph)-(CH ₂ ) ₄ - (wherein Ph means phenyl);
-CON(Ph)-(CH ₂ ) ₅ - (wherein Ph means phenyl);
-CON(Ph)-(CH ₂ ) ₆ - (wherein Ph means phenyl);
-CONH-(CH ₂ ) ₂ NH(CH ₂ ) ₃ -,
-CONH-(CH ₂ ) ₆ NH(CH ₂ ) ₃ -,
-CH ₂ O-CONH-(CH ₂ ) ₃ -,
-CH ₂ O-CONH-(CH ₂ ) ₆ -,
-S-(CH ₂ ) ₃ -,
-(CH ₂ ) ₂ S(CH ₂ ) ₃ -,
-CONH-(CH ₂ ) ₃ Si(CH ₃ ) ₂ OSi(CH ₃ ) ₂ (CH ₂ ) ₂ -,
-CONH-( _CH2 ) _3Si ( _CH3 ) _2OSi ( _CH3 ) _2OSi ( _CH3 ) ₂ ( _CH2 ) _2- ,
-CONH-(CH ₂ ) ₃ Si(CH ₃ ) ₂ O(Si(CH ₃ ) ₂ O) ₂ Si(CH ₃ ) ₂ (CH ₂ ) ₂ -,
-CONH-(CH ₂ ) ₃ Si(CH ₃ ) ₂ O(Si(CH ₃ ) ₂ O) ₃ Si(CH ₃ ) ₂ (CH ₂ ) ₂ -,
-CONH-(CH ₂ ) ₃ Si(CH ₃ ) ₂ O(Si(CH ₃ ) ₂ O) ₁₀ Si(CH ₃ ) ₂ (CH ₂ ) ₂ -,
-CONH-(CH ₂ ) ₃ Si(CH ₃ ) ₂ O(Si(CH ₃ ) ₂ O) ₂₀ Si(CH ₃ ) ₂ (CH ₂ ) ₂ -,
-C(O)O-(CH ₂ ) ₃ -,
-C(O)O-(CH ₂ ) ₆ -,
-CH ₂ -O-(CH ₂ ) ₃ -Si(CH ₃ ) ₂ -(CH ₂ ) ₂ -Si(CH ₃ ) ₂ -(CH ₂ ) ₂ -,
-CH ₂ -O-(CH ₂ ) ₃ -Si(CH ₃ ) ₂ -(CH ₂ ) ₂ -Si(CH ₃ ) ₂ -CH(CH ₃ )-,
-CH ₂ -O-(CH ₂ ) ₃ -Si(CH ₃ ) ₂ -(CH ₂ ) ₂ -Si(CH ₃ ) ₂ -(CH ₂ ) ₃ -,
-CH2 _- O-( _CH2 ) ₃ -Si( _CH3 ) _2- (CH2)2 _- Si( _{CH3 ) 2} -CH( _CH3 ) _-CH2- ,
_-OCH2- ,
-O(CH ₂ ) ₃ -,
_-OCFHCF2- ,

etc.

In yet another embodiment, ^XA is each independently a group represented by the formula: -(R ¹⁶ ) _x1 -(CFR ¹⁷ ) _y1 -(CH ₂ ) _z1 -, where x1, y1 and z1 are each independently an integer of 0 to 10, the sum of x1, y1 and z1 is 1 or more, and the order of occurrence of each repeat unit enclosed in parentheses in the formula is arbitrary.

In the above formula, R ¹⁶ is each independently an oxygen atom, phenylene, carbazolylene, -NR ¹⁸ - (wherein R ¹⁸ represents a hydrogen atom or an organic group) or a divalent organic group. Preferably, R ¹⁸ is an oxygen atom or a divalent polar group.

The above-mentioned "divalent polar group" is not particularly limited, but includes -C(O)-, -C(=NR ¹⁹ )-, and -C(O)NR ¹⁹ - (wherein R ¹⁹ represents a hydrogen atom or a lower alkyl group). The "lower alkyl group" is, for example, a C _1-6 alkyl group, such as methyl, ethyl, or n-propyl, which may be substituted with one or more fluorine atoms.

In the above formula, R ¹⁷ is each independently a hydrogen atom, a fluorine atom or a lower fluoroalkyl group, preferably a fluorine atom. The "lower fluoroalkyl group" is, for example, a C _1-6 , preferably a C _1-3 fluoroalkyl group, preferably a C _1-3 perfluoroalkyl group, more preferably a trifluoromethyl group or a pentafluoroethyl group, and even more preferably a trifluoromethyl group.

［式中、
　Ｒ^４１は、それぞれ独立して、水素原子、フェニル基、Ｃ_１－６アルキル基、又はＣ_１－６アルコキシ基好ましくはメチル基であり；
　各Ｘ^Ａ基において、Ｔのうち任意のいくつかは、分子主鎖のＲ^Ｆ１又はＲ^Ｆ２に結合する以下の基：
－ＣＨ_２Ｏ（ＣＨ_２）_２－、
－ＣＨ_２Ｏ（ＣＨ_２）_３－、
－ＣＦ_２Ｏ（ＣＨ_２）_３－、
－（ＣＨ_２）_２－、
－（ＣＨ_２）_３－、
－（ＣＨ_２）₄－、
－ＣＯＮＨ－（ＣＨ_２）_３－、
－ＣＯＮ（ＣＨ_３）－（ＣＨ_２）_３－、
－ＣＯＮ（Ｐｈ）－（ＣＨ_２）_３－（式中、Ｐｈはフェニルを意味する）、又は

［式中、Ｒ^４２は、それぞれ独立して、水素原子、Ｃ_１－６のアルキル基又はＣ_１－６のアルコキシ基、好ましくはメチル基又はメトキシ基、より好ましくはメチル基を表す。］
であり、別のＴのいくつかは、分子主鎖のＲ^Ｓｉに結合し、存在する場合、残りのＴは、それぞれ独立して、メチル基、フェニル基、Ｃ_１－６アルコキシ基又はラジカル捕捉基又は紫外線吸収基である。 In yet another embodiment, examples of ^XA include the following groups:

[Wherein,
R ⁴¹ is each independently a hydrogen atom, a phenyl group, a C _1-6 alkyl group, or a C _1-6 alkoxy group, preferably a methyl group;
In each ^XA group, any one of T's may be the following group bonded to ^RF1 or ^RF2 of the molecular backbone:
-CH ₂ O(CH ₂ ) ₂ -,
-CH ₂ O(CH ₂ ) ₃ -,
-CF ₂ O(CH ₂ ) ₃ -,
-(CH ₂ ) ₂ -,
-(CH ₂ ) ₃ -,
-( _CH2 ) _4- ,
-CONH-(CH ₂ ) ₃ -,
-CON( _CH3 )-( _CH2 ) _3- ,
-CON(Ph)-(CH ₂ ) ₃ -, where Ph is phenyl, or

[In the formula, each R ⁴² independently represents a hydrogen atom, a C _1-6 alkyl group or a C _1-6 alkoxy group, preferably a methyl group or a methoxy group, more preferably a methyl group.]
and some of the other T's are bonded to R 1 ^Si's in the molecular backbone, and the remaining T's, if present, are each independently a methyl group, a phenyl group, a C _1-6 alkoxy group, or a radical scavenger group or an ultraviolet absorbing group.

The radical scavenging group is not particularly limited as long as it can capture radicals generated by light irradiation, but examples include residues of benzophenones, benzotriazoles, benzoic acid esters, phenyl salicylates, crotonic acids, malonic acid esters, organoacrylates, hindered amines, hindered phenols, or triazines.

The ultraviolet absorbing group is not particularly limited as long as it can absorb ultraviolet light, but examples include residues of benzotriazoles, hydroxybenzophenones, esters of substituted and unsubstituted benzoic acid or salicylic acid compounds, acrylates or alkoxycinnamates, oxamides, oxanilides, benzoxazinones, and benzoxazoles.

In a preferred embodiment, preferred radical scavenging groups or UV absorbing groups include groups represented by the following formula:

In this embodiment, each X 1 ^A may independently be a trivalent to decavalent organic group.

［式中、Ｒ^２５、Ｒ^２６及びＲ^２７は、それぞれ独立して２～６価の有機基であり、
　Ｒ^２５は、少なくとも１つのＲ^Ｆ１に結合し、Ｒ^２６及びＲ^２７は、それぞれ、少なくとも１つのＲ^Ｓｉに結合する。］ In yet another embodiment, examples of ^XA include the following groups:

[In the formula, R ²⁵ , R ²⁶ and R ²⁷ each independently represent a divalent to hexavalent organic group,
R ²⁵ is bonded to at least one R ^F1 , and R ²⁶ and R ²⁷ are each bonded to at least one R ^Si .

In one embodiment, R ²⁵ is a single bond, a C _1-20 alkylene group, a C _3-20 cycloalkylene group, a C _5-20 arylene group, -R ⁵⁷ -X ⁵⁸ -R ⁵⁹ -, -X ⁵⁸ -R ⁵⁹ -, or -R ⁵⁷ -X ⁵⁸ -. R ⁵⁷ and R ⁵⁹ are each independently a single bond, a C _1-20 alkylene group, a C _3-20 cycloalkylene group, or a C _5-20 arylene group. X ⁵⁸ is -O-, -S-, -CO-, -O-CO-, or -COO-.

In one embodiment, R ²⁶ and R ²⁷ are each independently a hydrocarbon or a group having at least one atom selected from N, O and S at the end or in the main chain of the hydrocarbon, preferably a C _1-6 alkyl group, -R ³⁶ -R ³⁷ -R ³⁶ -, -R ³⁶ -CHR ³⁸ ₂ -, etc. Here, R ³⁶ is each independently a single bond or a C _1-6 alkyl group, preferably a C _1-6 alkyl group. R ³⁷ is N, O or S, preferably N or O. R ³⁸ is -R ⁴⁵ -R ⁴⁶ -R ⁴⁵ -, -R ⁴⁶ -R ⁴⁵ - or -R ⁴⁵ -R ⁴⁶ -. Here, R ⁴⁵ is each independently a C _1-6 alkyl group. R ⁴⁶ is N, O or S, preferably O.

The compound may have an average molecular weight of 5 x 10 ² to 1 x 10 ⁵ , but is not particularly limited thereto. Among these, from the viewpoint of UV resistance and friction durability, it is preferable that the compound has an average molecular weight of preferably 2,000 to 30,000, more preferably 2,500 to 12,000. In this disclosure, the "average molecular weight" refers to a number average molecular weight, and the "average molecular weight" is a value measured by ¹⁹ F-NMR.

In one embodiment, compound (A) may be preferably a compound represented by formula (1), more preferably a compound represented by formula (1a), and even more preferably a compound represented by formula (1b), and in another embodiment, compound (A) may be preferably a compound represented by formula (2), more preferably a compound represented by formula (2a), and even more preferably a compound represented by formula (2b).

The fluoropolyether group-containing silane compound represented by the above formula (1) or formula (2) may have an average molecular weight of 5 x 10 ² to 1 x 10 ⁵ , but is not particularly limited thereto. Within this range, it is preferable from the viewpoint of wear resistance that the average molecular weight is 2,000 to 32,000, more preferably 2,500 to 12,000. Note that the "average molecular weight" refers to a number average molecular weight, and the "average molecular weight" is a value measured by ¹⁹ F-NMR.

The total content of the compounds represented by formula (1) or (2) in compound (A) may be preferably 80% by mass or more and 100% by mass or less, more preferably 90% by mass or more and 100% by mass or less, and even more preferably 95% by mass or more and 100% by mass or less.

(Compound (B) Having a Fluoropolyether Group and an Allyl Ether Group)
The compound (B) having a fluoropolyether group and an allyl ether group has a fluoropolyether group and an allyl ether group, and in a preferred embodiment, is represented by the following formula (3), (4) or (5):
R ^F1 _α −X ^A −[AR ^B1 _δ R ^B2 _3−δ ] _β (3)
[R ^B1 _δ R ^B2 _3-δ A] _γ -X ^A -R ^F2 -X ^A -[AR ^B1 _δ R ^B2 _3-δ ] _γ (4)
R ^Si _γ −X ^A −R ^F2 −X ^A −[AR ^B1 _δ R ^B2 _3−δ ] _γ (5)
and a compound (B) represented by the formula:
[Wherein:
Each A is independently a C atom or a Si atom;
Each R ^F1 is independently Rf ¹ -R ^F -O _q -;
R ^F2 is -Rf ² _p -R ^F -O _q -;
Each Rf ¹ is independently a C _1-16 alkyl group optionally substituted by one or more fluorine atoms;
^Rf2 is a C _1-6 alkylene group optionally substituted by one or more fluorine atoms;
Each R ^F is independently a divalent fluoropolyether group;
p is 0 or 1;
Each q is independently 0 or 1;
R ^B1 is -R ^B3 -O-CH=CH-CH3 _;
R ^B2 each independently represents one or more groups selected from -R ^B3 -O-CH ₂ CH ₂ CH ₂ -SiR ^B4 _ε R ^B5 _3-ε and a hydrogen atom;
Each R ^B3 is independently a single bond or a C _1-20 alkylene group;
Each R ^B4 is independently a hydroxyl group or a hydrolyzable group;
Each R ^B5 is independently a hydrogen atom or a monovalent organic group;
R ^Si is each independently a hydroxyl group, a hydrolyzable group, a hydrogen atom, or a monovalent group containing a Si atom to which a monovalent organic group is bonded;
In formula (5), at least one R ^Si is a monovalent group containing a Si atom having a hydroxyl group or a hydrolyzable group bonded thereto;
Each ^XA is independently a single bond or a divalent to decavalent organic group;
α is an integer from 1 to 9;
β is an integer from 1 to 9;
Each γ is independently an integer from 1 to 9;
Each δ is independently an integer from 1 to 3;
Each ε is independently an integer from 1 to 3.
The compound includes at least one compound represented by the formula:

By including the above compounds, a film with good abrasion resistance can be achieved.

In the above formulas (3), (4) and (5), ^RF1 , ^RF2 , ^RSi , ^XA , α, β and γ are as defined above.

A is, independently of one another, a C atom or a Si atom. In one embodiment, A is a C atom. In another embodiment, A is a Si atom. A is preferably a Si atom.

Each R ^B1 is independently —R ^B3 —O—CH═CH— _CH3 .

Each R ^B2 is independently one or more selected from -R ^B3 -O-CH ₂ CH ₂ CH ₂ -SiR ^B4 _ε R ^B5 _3-ε and a hydrogen atom. In one embodiment, R ^B2 can be -R ^B3 -O-CH ₂ CH ₂ CH ₂ -SiR ^B4 _ε R ^B5 _3-ε . In another embodiment, R ^B2 can be a hydrogen atom.

The above R ^B3 are each independently a single bond or a C _1-20 alkylene group. In one embodiment, R ^B3 may preferably be a single bond. In another embodiment, R ^B3 may preferably be a C _1-20 alkylene group, more preferably a C _1-6 alkylene group.

Each R ^B4 is independently a hydroxyl group or a hydrolyzable group.

Preferably, each R ^B4 is independently a hydrolyzable group.

R ^B4 is preferably, each independently, -OR ^j , -OCOR ^j , -O-N=CR ^j ₂ , -NR ^j ₂ , -NHR ^j , -NCO, or halogen (wherein R ^j represents a substituted or unsubstituted C _1-4 alkyl group), more preferably -OR ^j (i.e., an alkoxy group). R ^j includes unsubstituted alkyl groups such as a methyl group, an ethyl group, a propyl group, an isopropyl group, an n-butyl group, and an isobutyl group; and substituted alkyl groups such as a chloromethyl group. Among these, an alkyl group, particularly an unsubstituted alkyl group, is preferred, and a methyl group or an ethyl group is more preferred. In one embodiment, R ^j is a methyl group, and in another embodiment, R ^j is an ethyl group.

Each R ^B5 is independently a hydrogen atom or a monovalent organic group. Such a monovalent organic group is a monovalent organic group excluding the hydrolyzable group.

In R ^B5 , the monovalent organic group is preferably a C _1-20 alkyl group, more preferably a C _1-6 alkyl group, and even more preferably a methyl group.

In one embodiment, ε is independently an integer from 1 to 3, preferably an integer from 2 to 3, and more preferably 3 for each (SiR ^B4 _ε R ^B5 _3-ε ) unit.

In one embodiment, δ is independently an integer of 1 to 3, preferably an integer of 2 to 3, and more preferably 3 for each (AR ^B1 _δ R ^B2 _3-δ ) unit.

The compound (B) represented by the above formula (3), formula (4) or formula (5) may have an average molecular weight of, but is not particularly limited to, 5 x 10 ² to 1 x 10 ^5. Within this range, it is preferable from the viewpoint of wear resistance that the compound (B) has an average molecular weight of 2,000 to 32,000, more preferably 2,500 to 12,000.

In the above composition, the ratio of R ^B1 contained in the above composition to the total of R ^Si and R ^B1 contained in the above composition is preferably 25 mol% or less, more preferably 20 mol% or less, even more preferably 10 mol% or less, and may be, for example, 0.1 mol% or more, even 1 mol% or more. By being in this range, it can be easy to provide a film with better abrasion resistance, especially abrasion resistance against soft materials (for example, resin-based materials such as erasers).

The content of compound (B) represented by formula (3), formula (4) or formula (5) above may be preferably 0.1% by mass or more and 25% by mass or less, more preferably 1% by mass or more and 20% by mass or less, based on 100% by mass of the total of compound (A) and compound (B) above. When the content is within this range, it may be easier to provide a film with better abrasion resistance, particularly abrasion resistance against soft materials (e.g., resin-based materials such as erasers).

In the composition, the total content of the compound (A) and the compound (B) may be preferably 80% by mass or more and 100% by mass or less, more preferably 90% by mass or more and 100% by mass or less, and even more preferably 95% by mass or more and 100% by mass or less.

(Surface treatment agent)
The surface treatment agent of the present disclosure includes the above composition. The total content of the above compound (A) and the above compound (B) may be preferably 0.02 to 40.0 mass%, more preferably 0.02 to 30.0 mass%, even more preferably 0.04 to 25.0 mass%, and particularly preferably 0.05 to 20.0 mass% in 100 mass% of the surface treatment agent. By setting the content of the fluoropolyether group-containing silane compound within the above range, higher water and oil repellency can be obtained.
In the composition of the present disclosure, the non-volatile content may be the portion excluding the solvent from the total amount of the composition.

(Other ingredients)
The surface treatment agent of the present disclosure may further contain a (non-reactive) fluoropolyether compound that can be understood as a fluorine-containing oil, preferably a perfluoro(poly)ether compound (hereinafter collectively referred to as "fluorine-containing oil"), a (non-reactive) silicone compound that can be understood as a silicone oil (hereinafter referred to as "silicone oil"), alcohols, catalysts, surfactants, polymerization inhibitors, sensitizers, etc. The other components are components different from the above-mentioned compound (A) and compound (B).
In a preferred embodiment, the surface treatment agent of the present disclosure further contains one or more components selected from fluorine-containing oils and silicone oils.

The fluorine-containing oil is not particularly limited, but examples thereof include compounds represented by the following general formula (6) (perfluoro(poly)ether compounds).
Rf ⁵ - (OC ₄ F ₈ ) _a" - (OC ₃ F ₆ ) _b" - (OC ₂ F ₄ ) _c" - (OCF ₂ ) _{d" -} Rf ⁶ ... (6)
In the formula, Rf ⁵ represents a C _1-16 alkyl group (preferably a C 1-16 perfluoroalkyl group) optionally substituted by one or more fluorine atoms, Rf ⁶ represents a C _1-16 alkyl group (preferably a C _{1-16 perfluoroalkyl} group) optionally substituted by one or more fluorine atoms, a fluorine atom or a hydrogen atom, and Rf ⁵ and Rf ⁶ are more preferably each independently a C _1-3 perfluoroalkyl group.
a", b", c" and d" respectively represent the number of four types of repeating units of perfluoro(poly)ether constituting the main skeleton of the polymer and are each independently an integer of 0 to 300, and the sum of a", b", c" and d" is greater than 30, preferably 40 to 300, and more preferably 50 to 300. The order of occurrence of each repeating unit enclosed in parentheses with the subscript a", b", c" or d" is arbitrary in the formula. Among these repeating units, -(OC ₄ F ₈ )- may be any of -(OCF ₂ CF ₂ CF ₂ CF ₂ )-, -(OCF(CF ₃ )CF ₂ CF ₂ )-, -(OCF ₂ CF(CF ₃ )CF ₂ )-, -(OCF ₂ CF ₂ CF(CF ₃ ))-, -(OC(CF ₃ ) ₂ CF ₂ )-, -(OCF ₂ C(CF ₃ ) ₂ )-, -(OCF(CF ₃ )CF(CF ₃ ))-, -(OCF(C ₂ F ₅ )CF ₂ )- and (OCF ₂ CF(C ₂ F ₅ ))-, preferably -(OCF ₂ -(OC ₃ F ₆ )- may be any of - ₍ OCF ₂ CF ₂ CF ₂ )-, -(OCF( _{CF 3 )} CF ₂ )-, and (OCF ₂ CF(CF _{3 )} )-, and is preferably -(OCF ₂ CF ₂ CF ₂ )-. -(OC ₂ F ₄ )- may be any of -(OCF ₂ CF ₂ )- and (OCF(CF ₃ ))-, and is preferably -(OCF ₂ CF ₂ )-.

Examples of the perfluoro(poly)ether compound represented by the above general formula (6) include compounds represented by the following general formulas (6a) and (6b) (which may be one type or a mixture of two or more types):
Rf ⁵ - (OCF ₂ CF ₂ CF ₂ ) _{b" -} Rf ⁶ ... (6a)
Rf ⁵ - (OCF ₂ CF ₂ CF ₂ CF ₂ ) _a" - (OCF ₂ CF ₂ CF ₂ ) _b" - (OCF ₂ CF ₂ ) _c" - (OCF ₂ ) _{d" -} Rf ⁶ ... (6b)
In these formulas, ^Rf5 and ^Rf6 are as defined above; in formula (6a), b" is an integer of 1 or more and 100 or less; in formula (6b), a" and b" are each independently an integer of 0 or more and 30 or less, and c" and d" are each independently an integer of 1 or more and 300 or less. The order of occurrence of each repeating unit enclosed in parentheses with the subscripts a", b", c", and d" is arbitrary in the formula.

From another viewpoint, the fluorine-containing oil may be a compound represented by the general formula Rf ³ -F (wherein Rf ³ is a C _5-16 perfluoroalkyl group), or may be a chlorotrifluoroethylene oligomer.

The fluorine-containing oil may have a number average molecular weight of preferably 1000 or more, more preferably 1500 or more, and even more preferably 2000 or more. The fluorine-containing oil may also have a number average molecular weight of preferably 30000 or less, more preferably 20000 or less, and even more preferably 10000 or less. The molecular weight of the fluorine-containing oil may be measured using GPC.

The fluorine-containing oil may be contained in an amount of, for example, 0 to 50% by mass, preferably 0 to 30% by mass, and more preferably 0 to 5% by mass, relative to the surface treatment agent. In one embodiment, the surface treatment agent of the present disclosure is substantially free of fluorine-containing oil. "Substantially free of fluorine-containing oil" means that the surface treatment agent does not contain any fluorine-containing oil, or may contain a very small amount of fluorine-containing oil.

In one embodiment, the number average molecular weight of the fluorine-containing oil may be smaller than the number average molecular weight of the fluorine-containing silane compound. By setting the average molecular weight in this manner, it is possible to form a cured product having high abrasion resistance and high surface slipperiness while suppressing the decrease in transparency of the surface treatment layer obtained from such a compound.

The fluorinated oil can contribute to improving the surface slipperiness of the layer formed by the surface treatment agent of the present disclosure.

As the silicone oil, for example, a linear or cyclic silicone oil having 2,000 or less siloxane bonds can be used. The linear silicone oil may be so-called straight silicone oil or modified silicone oil. Examples of straight silicone oil include dimethyl silicone oil, methylphenyl silicone oil, and methylhydrogen silicone oil. Examples of modified silicone oil include straight silicone oil modified with alkyl, aralkyl, polyether, higher fatty acid ester, fluoroalkyl, amino, epoxy, carboxyl, alcohol, etc. Examples of cyclic silicone oil include cyclic dimethylsiloxane oil, etc.

In the surface treatment agent of the present disclosure, such silicone oil can be contained in an amount of, for example, 0 to 300 parts by mass, preferably 50 to 200 parts by mass, per 100 parts by mass of the total of the fluorine-containing silane compounds of the present disclosure (if there are two or more types, the total of these, the same applies below).

Silicone oil can help improve the surface slipperiness of the surface treatment layer.

Examples of the alcohols include alcohols having 1 to 6 carbon atoms which may be substituted with one or more fluorine atoms, such as methanol, ethanol, isopropanol, tert-butanol, CF ₃ CH ₂ OH, CF ₃ CF ₂ CH ₂ OH, and (CF ₃ ) ₂ CHOH. Addition of these alcohols to the surface treatment agent improves the stability of the surface treatment agent and also improves the compatibility of the fluorine-containing silane compound with the solvent.

The alcohols are preferably contained in the surface treatment agent in an amount of 0.1 to 5 times, more preferably 0.5 to 3 times, and even more preferably 0.8 to 1.2 times the molar ratio of the metal compound. By setting the content ratio of the alcohols within the above range, the stability of the surface treatment layer can be further improved.

The catalyst may be an acid (e.g., acetic acid, trifluoroacetic acid, etc.), a base (e.g., ammonia, triethylamine, diethylamine, etc.), or a transition metal (e.g., Ti, Ni, Sn, etc.).

The catalyst promotes the hydrolysis and dehydration condensation of the fluorine-containing silane compound of the present disclosure, and promotes the formation of the layer formed by the surface treatment agent of the present disclosure.

Other components besides those mentioned above include, for example, tetraethoxysilane, methyltrimethoxysilane, 3-aminopropyltrimethoxysilane, 3-glycidoxypropyltrimethoxysilane, methyltriacetoxysilane, etc.

The surface treatment agent of the present disclosure can be impregnated into a porous material, such as a porous ceramic material, or a metal fiber, such as steel wool, and formed into pellets. The pellets can be used, for example, in vacuum deposition.

In addition to the components mentioned above, the surface treatment agent disclosed herein may contain trace amounts of impurities such as Pt, Rh, Ru, 1,3-divinyltetramethyldisiloxane, triphenylphosphine, NaCl, KCl, and silane condensates.

(Goods)
The articles of the present disclosure are described below.

The article of the present disclosure includes a substrate and a layer (surface treatment layer) formed on the surface of the substrate from the composition and/or surface treatment agent of the present disclosure. In one embodiment, the article of the present disclosure includes a substrate and a layer formed on the surface of the substrate from the composition of the present disclosure. In another embodiment, the article of the present disclosure includes a substrate and a layer formed on the surface of the substrate from the surface treatment agent of the present disclosure.

Substrates that can be used in the present disclosure may be composed of any suitable material, such as glass, resin (which may be a natural or synthetic resin, such as a common plastic material), metal, ceramics, semiconductors (silicon, germanium, etc.), fibers (woven fabrics, nonwoven fabrics, etc.), fur, leather, wood, ceramics, stone, etc., building materials, sanitary products, etc.

For example, when the article to be manufactured is an optical member, the material constituting the surface of the substrate may be a material for optical members, such as glass or transparent plastic. In addition, when the article to be manufactured is an optical member, some layer (or film), such as a hard coat layer or an anti-reflection layer, may be formed on the surface (outermost layer) of the substrate. The anti-reflection layer may be either a single-layer anti-reflection layer or a multi-layer anti-reflection layer. Examples of inorganic substances that can be used for the anti-reflection layer include SiO ₂ , SiO, ZrO ₂ , TiO ₂ , TiO, Ti ₂ O ₃ , Ti ₂ O ₅ , Al ₂ O ₃ , Ta ₂ O ₅ , Ta ₃ O ₅ , Nb ₂ O 5 , HfO ₂ , Si ₃ N ₄ , _{CeO 2 ,} MgO, Y ₂ O ₃ , SnO ₂ , MgF ₂ , WO ₃ and the like. These inorganic substances may be used alone or in combination of two or more of them (for example, as a mixture). When a multi-layer antireflection layer is used, it is preferable to use SiO ₂ and/or SiO 2 for the outermost layer. When the product to be manufactured is an optical glass part for a touch panel, a transparent electrode, for example, a thin film using indium tin oxide (ITO) or indium zinc oxide, may be provided on a part of the surface of the substrate (glass). In addition, the substrate may have an insulating layer, an adhesive layer, a protective layer, a decorative frame layer (I-CON), an atomizing film layer, a hard coating film layer, a polarizing film, a phase difference film, and a liquid crystal display module, depending on the specific specifications.

The shape of the substrate is not particularly limited and may be, for example, a plate, a film, or other shape. The surface region of the substrate on which the surface treatment layer is to be formed may be at least a part of the substrate surface, and may be appropriately determined depending on the application and specific specifications of the product to be manufactured.

In one embodiment, at least the surface portion of the substrate may be made of a material that originally has hydroxyl groups. Examples of such materials include glass, metals (particularly base metals), ceramics, semiconductors, etc., on whose surfaces natural oxide films or thermal oxide films are formed. Alternatively, in cases where the substrate has insufficient hydroxyl groups, such as resins, or where the substrate does not originally have hydroxyl groups, the substrate may be subjected to some pretreatment to introduce or increase the number of hydroxyl groups on the substrate surface. Examples of such pretreatment include plasma treatment (e.g., corona discharge) and ion beam irradiation. Plasma treatment can introduce or increase hydroxyl groups on the substrate surface, and can also be suitably used to clean the substrate surface (remove foreign matter, etc.). Another example of such pretreatment is a method in which an interfacial adsorbent having carbon-carbon unsaturated bond groups is formed in advance in the form of a monomolecular film on the substrate surface by the LB method (Langmuir-Blodgett method) or chemical adsorption method, and then the unsaturated bonds are cleaved in an atmosphere containing oxygen, nitrogen, etc.

In another embodiment, at least the surface portion of such a substrate may be made of a material containing another reactive group, such as a silicone compound having one or more Si-H groups, or an alkoxysilane.

In a preferred embodiment, the substrate is glass. Examples of such glass include sapphire glass, soda-lime glass, alkali aluminosilicate glass, borosilicate glass, alkali-free glass, crystal glass, and quartz glass, and particularly preferred are chemically strengthened soda-lime glass, chemically strengthened alkali aluminosilicate glass, and chemically bonded borosilicate glass.

The article of the present disclosure can be produced by forming a layer of the surface treatment agent of the present disclosure on the surface of the substrate, and then post-treating this layer as necessary, thereby forming a layer from the surface treatment agent of the present disclosure.

The formation of a layer of the surface treatment agent of the present disclosure can be carried out by applying the surface treatment agent to the surface of the substrate so as to coat the surface. The coating method is not particularly limited. For example, a wet coating method and a dry coating method can be used.

Examples of wet coating methods include dip coating, spin coating, flow coating, spray coating, roll coating, gravure coating, and similar methods.

Examples of dry coating methods include deposition (usually vacuum deposition), sputtering, CVD, and similar methods. Specific examples of deposition methods (usually vacuum deposition) include resistance heating, electron beam, high frequency heating such as using microwaves, ion beam, and similar methods. Specific examples of CVD methods include plasma-CVD, optical CVD, thermal CVD, and similar methods.

In addition, coating using atmospheric pressure plasma method is also possible.

When using a wet coating method, the surface treatment agent of the present disclosure may be diluted with a solvent and then applied to the substrate surface. From the viewpoint of the stability of the composition of the present disclosure and the volatility of the solvent, the following solvents are preferably used: perfluoroaliphatic hydrocarbons having 5 to 12 carbon atoms (e.g., perfluorohexane, perfluoromethylcyclohexane, and perfluoro-1,3-dimethylcyclohexane); polyfluoroaromatic hydrocarbons (e.g., bis(trifluoromethyl)benzene); polyfluoroaliphatic hydrocarbons (e.g., C ₆ F ₁₃ CH ₂ CH ₃ (e.g., Asahiklin (registered trademark) AC-6000 manufactured by Asahi Glass Co., Ltd.), 1,1,2,2,3,3,4-heptafluorocyclopentane (e.g., Zeorora (registered trademark) H manufactured by Zeon Corporation); hydrofluoroethers (HFEs) (e.g., perfluoropropyl methyl ether (C ₃ F ₇ OCH ₃ ) (e.g., Novec (trademark) 7000 manufactured by Sumitomo 3M Limited), perfluorobutyl methyl ether (C ₄ F ₉ OCH ₃ ) (e.g., Novec (trademark) 7100 manufactured by Sumitomo 3M Limited), perfluorobutyl ethyl ether (C ₄ F ₉ OC ₂ H ₅ ) (e.g., Novec (trademark) 7200 manufactured by Sumitomo 3M Limited), perfluorohexyl methyl ether (C ₂ F ₅ CF(OCH ₃ )C ₃ F ₇ ) (e.g., Novec (trademark) 7300 manufactured by Sumitomo 3M Limited), etc. alkyl perfluoroalkyl ethers (perfluoroalkyl groups and alkyl groups may be linear or branched), or CF ₃ CH ₂ OCF ₂ CHF ₂ (e.g., Asahiklin (registered trademark) AE-3000 manufactured by Asahi Glass Co., Ltd.). These solvents can be used alone or as a mixture of two or more kinds. Among them, hydrofluoroethers are preferred, and perfluorobutyl methyl ether (C ₄ F ₉ OCH ₃ ) and/or perfluorobutyl ethyl ether (C ₄ F ₉ OC ₂ H ₅ ) are particularly preferred.

When using the dry coating method, the surface treatment agent of the present disclosure may be subjected to the dry coating method as is, or may be diluted with the above-mentioned solvent and then subjected to the dry coating method.

The layer of the surface treatment agent is preferably formed so that the surface treatment agent of the present disclosure is present in the layer together with a catalyst for hydrolysis and dehydration condensation. Conveniently, in the case of the wet coating method, the surface treatment agent of the present disclosure may be diluted with a solvent, and then a catalyst may be added to the diluted solution of the surface treatment agent of the present disclosure immediately before application to the substrate surface. In the case of the dry coating method, the surface treatment agent of the present disclosure to which a catalyst has been added may be directly subjected to deposition (usually vacuum deposition) treatment, or a pellet-shaped material in which the surface treatment agent of the present disclosure to which a catalyst has been added is impregnated onto a metal porous body such as iron or copper may be used to perform deposition (usually vacuum deposition) treatment.

Any suitable acid or base can be used as the catalyst. Examples of acid catalysts that can be used include acetic acid, formic acid, and trifluoroacetic acid. Examples of base catalysts that can be used include ammonia and organic amines.

The surface treatment layer included in the article of the present disclosure has both high abrasion resistance and low wear resistance. In addition to high abrasion resistance, depending on the composition of the surface treatment agent used, the surface treatment layer may also have water repellency, oil repellency, stain resistance (preventing adhesion of stains such as fingerprints), waterproofing (preventing water from penetrating into electronic components, etc.), surface slipperiness (or lubricity, e.g. ease of wiping off stains such as fingerprints and excellent tactile feel against the fingers), chemical resistance, etc., and may be suitably used as a functional thin film.

Accordingly, the present disclosure also relates to an optical material having the above-mentioned surface treatment layer as the outermost layer.

As optical materials, in addition to optical materials related to displays such as those exemplified below, a wide variety of optical materials are preferably used: for example, displays such as cathode ray tubes (CRTs; e.g., personal computer monitors), liquid crystal displays, plasma displays, organic electroluminescent displays, inorganic thin-film electroluminescent dot matrix displays, rear projection displays, fluorescent display tubes (VFDs), field emission displays (FEDs; Field Emission Displays), or protective plates for such displays, or displays with anti-reflection coating applied to their surfaces.

The article of the present disclosure may be, but is not limited to, an optical component. Examples of optical components include the following: lenses for glasses and the like; front protection plates, anti-reflection plates, polarizing plates, and anti-glare plates for displays such as PDPs and LCDs; touch panel sheets for devices such as mobile phones and personal digital assistants; disc surfaces of optical discs such as Blu-ray (registered trademark) discs, DVD discs, CD-Rs, and MOs; optical fibers; the display surfaces of watches, etc.

The article of the present disclosure may also be a medical device or medical material.

The thickness of the layer is not particularly limited. In the case of optical components, the thickness of the layer is preferably in the range of 1 to 50 nm, 1 to 30 nm, and preferably 1 to 15 nm, from the viewpoints of optical performance, abrasion resistance, and antifouling properties.

The above describes the articles of the present disclosure in detail. Note that the articles and methods for manufacturing the articles of the present disclosure are not limited to those exemplified above.

The present invention will be explained in more detail with reference to the following examples, but the present invention is not limited thereto. Note that in these examples, the order of the repeating units constituting the fluoropolyether is arbitrary, and the chemical formula shown below shows the average composition.

(Synthesis Example 1)
A 100 mL four-neck flask equipped with a reflux condenser, thermometer and stirrer was charged with 20 _{g of a perfluoropolyether modified allyloxy derivative with the average composition CF3O(CF2CF2O)26(CF2O)26CF2CH2OCH2CH = CH2 ( note that the mixture also contains} compounds containing trace amounts of repeating units _{of ( CF2CF2CF2O} ) and/or ( _{CF2CF2CF2CF2O )} , but these are not taken into account as they are in extremely small amounts), 20 g of 1,3-bis( _{trifluoromethyl} )benzene and 1.36 g of trichlorosilane, and stirred for 30 minutes at 5°C under a nitrogen stream. Next, 0.094 mL of a xylene solution containing 2% Pt complex of 1,3-divinyl-1,1,3,3-tetramethyldisiloxane was added, and the temperature was raised to 60° C., and the mixture was stirred at this temperature for 5 hours. The reaction mixture was cooled to room temperature, and the volatile matter was distilled off under reduced pressure. Then, the mixture was dissolved in 5 g of 1,3-bis(trifluoromethyl)benzene, and charged into a short column packed with silica gel, and 40 g of 1,3-bis(trifluoromethyl)benzene was passed through as an eluent. The eluate was concentrated to obtain 8 g of a perfluoropolyether group-containing allyl compound (B1) having an allyl group at the end and represented by the following formula.
Perfluoropolyether group-containing allyl compound (B1):
CF ₃ O (CF ₂ CF ₂ O) ₂₆ (CF ₂ O) ₂₆ CF ₂ CH ₂ O CH=CHCH ₃

(Synthesis Example 2)
In a 100mL four-neck flask equipped with a reflux condenser, a thermometer and a stirrer, 20g of a perfluoropolyether-modified allyloxy compound represented by the average composition CF ₃ CF ₂ CF ₂ O(CF ₂ CF ₂ CF ₂ O) ₂₀ CF ₂ CF ₂ CH ₂ OCH ₂ CH=CH ₂ , 20g of 1,3-bis(trifluoromethyl)benzene, 0.06g of triacetoxymethylsilane and 1.36g of trichlorosilane were charged and stirred for 30 minutes at 5°C under a nitrogen stream. Then, 0.094ml of a xylene solution containing 2% of a Pt complex of 1,3-divinyl-1,1,3,3-tetramethyldisiloxane was added, and the mixture was heated to 60°C and stirred at this temperature for 5 hours. Then, volatile matter was distilled off under reduced pressure to obtain 19g of a perfluoropolyether group-containing silane compound (A1) of the following formula having trichlorosilane at the end.
Perfluoropolyether group-containing silane compound (A1):
CF ₃ CF ₂ CF ₂ O(CF ₂ CF ₂ CF ₂ O) ₂₀ CF ₂ CF ₂ CH ₂ OCH ₂ CH ₂ CH ₂ SiCl ₃

In a 100 mL four-neck flask equipped with a reflux condenser, a thermometer and a stirrer, 19 g of the perfluoropolyether group-containing trichlorosilane compound (A1) having trichlorosilane at the end and 20 g of 1,3-bis(trifluoromethyl)benzene were charged and stirred for 30 minutes at 5°C under a nitrogen stream. Then, 26.4 mL of a diethyl ether solution containing 0.7 mol/L of allyl magnesium bromide was added, and the temperature was raised to room temperature and stirred at this temperature for 10 hours. Then, the mixture was cooled to 5°C, 5 mL of methanol was added, and the mixture was heated to room temperature and insoluble matter was filtered. Then, the volatile matter was distilled off under reduced pressure, and the non-volatile matter was diluted with perfluorohexane, and a washing operation with methanol was performed three times in a separatory funnel (more specifically, an operation of maintaining fluoro-based compounds in the perfluorohexane phase (fluorous phase) and separating and removing non-fluoro-based compounds in the methanol phase (organic phase)). Subsequently, the volatile matter was distilled off under reduced pressure to obtain 20 g of the following perfluoropolyether group-containing allyl compound (A2) having an allyl group at the terminal.
Perfluoropolyether group-containing allyl compound (A2):
CF ₃ CF ₂ CF ₂ O(CF ₂ CF ₂ CF ₂ O) ₂₀ CF ₂ CF ₂ CH ₂ OCH ₂ CH ₂ CH ₂ Si(CH ₂ CH=CH ₂ ) ₃

A 100 mL four-neck flask equipped with a reflux condenser, a thermometer, and a stirrer was charged with 15 g of the perfluoropolyether group-containing allyl compound (A2) having an allyl group at the end, 15 g of 1,3-bis(trifluoromethyl)benzene, 0.05 g of triacetoxymethylsilane, and 3.15 g of trichlorosilane, and stirred for 30 minutes at 5°C under a nitrogen stream. Then, 0.141 ml of a xylene solution containing 2% Pt complex of 1,3-divinyl-1,1,3,3-tetramethyldisiloxane was added, and the mixture was heated to 60°C and stirred at this temperature for 5 hours. Thereafter, volatile matter was distilled off under reduced pressure to obtain 16 g of the following perfluoropolyether group-containing trichlorosilane compound (A3) having trichlorosilane at the end.
Perfluoropolyether group-containing trichlorosilane compound (A3):
CF ₃ CF ₂ CF ₂ O(CF ₂ CF ₂ CF ₂ O) ₂₀ CF ₂ CF ₂ CH ₂ OCH ₂ CH ₂ CH ₂ Si(CH ₂ CH ₂ CH ₂ SiCl ₃ ) ₃

In a 100 mL four-neck flask equipped with a reflux condenser, a thermometer, and a stirrer, 16 g of the perfluoropolyether group-containing trichlorosilane compound (A3) having trichlorosilane at the terminal and 15 g of 1,3-bis(trifluoromethyl)benzene were added, and the mixture was stirred at 50° C. for 30 minutes under a nitrogen stream. Then, a mixed solution of 0.78 g of methanol and 36 g of trimethyl orthoformate was added, and the mixture was heated to 65° C. and stirred at this temperature for 3 hours. Then, volatile matter was distilled off under reduced pressure to obtain 17 g of the following perfluoropolyether group-containing silane compound (A4) having trimethylsilyl groups at the terminal.
Perfluoropolyether group-containing silane compound (A4):
CF ₃ CF ₂ CF ₂ O(CF ₂ CF ₂ CF ₂ O) ₂₀ CF ₂ CF ₂ CH ₂ OCH ₂ CH ₂ CH ₂ Si[CH ₂ CH ₂ CH ₂ Si(OCH ₃ ) ₃ ] ₃

(Examples 1 to 6 and Comparative Example 1)
A composition was prepared by mixing compound (B1) obtained in Synthesis Example 1 and compound (A4) obtained in Synthesis Example 2 so that the ratio of compound (B1) was the value shown in Table 1. In the composition, the ratio (mol %) of compound (B1) corresponds to the ratio of R B1 to ^the total of R ^Si and R ^B1 .

The above composition was dissolved in hydrofluoroether (Novec HFE7200, manufactured by 3M) so that the concentration (total concentration of compound (B1) and compound (A4)) was 20 mass % to prepare a surface treatment agent.

The surface treatment agent prepared above was vacuum-deposited on chemically strengthened glass (Corning's "Gorilla" glass, thickness 0.7 mm). The vacuum deposition treatment conditions were a pressure of 3.0×10 ⁻³ Pa, and silicon dioxide was first deposited on the surface of this chemically strengthened glass to a thickness of 7 nm by electron beam deposition to form a silicon dioxide film, followed by deposition of 2 mg of the surface treatment agent (i.e., containing a total of 0.4 mg of compound (B1) and compound (A4)) per sheet of chemically strengthened glass (55 mm×100 mm). Thereafter, the chemically strengthened glass with the deposition film was left to stand for 24 hours in an atmosphere at a temperature of 20° C. and a humidity of 65%. As a result, the deposition film hardened to form a surface treatment layer.

The static contact angle of water was measured for the surface treatment layer formed on the substrate surface in the above examples and comparative examples. The static contact angle of water was measured using a contact angle measuring device (manufactured by Kyowa Interface Science Co., Ltd.) with 1 μL of water.
First, as an initial evaluation, the static contact angle of water was measured after the surface treatment layer was formed without touching the surface (friction count: zero). Then, as a friction durability evaluation, a steel wool friction durability evaluation was performed. Specifically, the substrate on which the surface treatment layer was formed was horizontally arranged, and steel wool (number #0000, dimensions 5 mm x 10 mm x 10 mm) was brought into contact with the exposed upper surface of the surface treatment layer, and a load of 1,000 gf was applied thereon, and then the steel wool was moved back and forth at a speed of 140 mm/sec while the load was applied. The static contact angle of water (degrees) was measured every 1,000 reciprocations, and the maximum number of reciprocations when the measured value of the contact angle was maintained at 100 degrees was used as an index of wear durability.
The results are shown in Tables 1 and 2.

Examples 1 to 6 are examples of the present disclosure, and it was confirmed that the films obtained from these compositions had good abrasion resistance.
Comparative Example 1 is an example that does not contain the compound (B). Although the initial water contact angle was good, the abrasion resistance was inferior to those of Examples 1-6.

The articles disclosed herein can be suitably used for a wide variety of applications, such as optical components for touch panels, etc.

Claims (9)

A silane compound (A) having a fluoropolyether group;
Compound (B) Having a Fluoropolyether Group and an Allyl Ether Group
and
The compound (B) is represented by the following formula (3), (4) or (5):
R ^F1 _α −X ^A −[AR ^B1 _δ R ^B2 _3−δ ] _β (3)
[R ^B1 _δ R ^B2 _3-δ A] _γ -X ^A -R ^F2 -X ^A -[AR ^B1 _δ R ^B2 _3-δ ] _γ (4)
R ^Si _γ −X ^A −R ^F2 −X ^A −[AR ^B1 _δ R ^B2 _3−δ ] _γ (5)
[Wherein:
Each A is independently a C atom or a Si atom;
Each R ^F1 is independently Rf ¹ -R ^F -O _q -;
R ^F2 is -Rf ² _p -R ^F -O _q -;
Each Rf ¹ is independently a C _1-16 alkyl group optionally substituted by one or more fluorine atoms;
^Rf2 is a C _1-6 alkylene group optionally substituted by one or more fluorine atoms;
Each R ^F is independently a divalent fluoropolyether group;
p is 0 or 1;
Each q is independently 0 or 1;
R ^B1 is -R ^B3 -O-CH=CH-CH3 _;
R ^B2 each independently represents one or more groups selected from -R ^B3 -O-CH ₂ CH ₂ CH ₂ -SiR ^B4 _ε R ^B5 _3-ε and a hydrogen atom;
Each R ^B3 is independently a single bond or a C _1-20 alkylene group;
Each R ^B4 is independently a hydroxyl group or a hydrolyzable group;
Each R ^B5 is independently a hydrogen atom or a monovalent organic group;
R ^Si is each independently a hydroxyl group, a hydrolyzable group, a hydrogen atom, or a monovalent group containing a Si atom to which a monovalent organic group is bonded;
In formula (5), at least one R ^Si is a monovalent group containing a Si atom having a hydroxyl group or a hydrolyzable group bonded thereto;
Each ^XA is independently a single bond or a divalent to decavalent organic group;
α is an integer from 1 to 9;
β is an integer from 1 to 9;
Each γ is independently an integer from 1 to 9;
Each δ is independently an integer of 1 to 3.
Each ε is independently an integer from 1 to 3.
A composition comprising at least one compound represented by the formula (A) (wherein compound (A) and compound (B) are different). The silane compound (A) having a fluoropolyether group is represented by the formula (1) or (2):

[Wherein:
Each R ^F1 is independently Rf ¹ -R ^F -O _q -;
R ^F2 is -Rf ² _p -R ^F -O _q -;
Each Rf ¹ is independently a C _1-16 alkyl group optionally substituted by one or more fluorine atoms;
^Rf2 is a C _1-6 alkylene group optionally substituted by one or more fluorine atoms;
Each R ^F is independently a divalent fluoropolyether group;
p is 0 or 1;
Each q is independently 0 or 1;
R ^Si is each independently a hydroxyl group, a hydrolyzable group, a hydrogen atom, or a monovalent group containing a Si atom to which a monovalent organic group is bonded;
In each of formula (1) and formula (2), at least one R ^Si is a monovalent group containing a Si atom having a hydroxyl group or a hydrolyzable group bonded thereto;
In each of formula (1) and formula (2), R ^Si does not contain an allyl ether group;
Each ^XA is independently a single bond or a divalent to decavalent organic group;
α is an integer from 1 to 9;
β is an integer from 1 to 9;
Each γ is independently an integer from 1 to 9.
The composition of claim 1 , comprising at least one compound represented by: The composition according to claim 1 or 2, wherein a ratio of R ^B1 contained in the composition to the total of R ^Si and R ^B1 contained in the composition is 25 mol % or less. The silane compound (A) is represented by the formula (1a):
R ^F1 -X ^A -R ^Si (1a)
[Wherein:
Each R ^F1 is independently Rf ¹ -R ^F -O _q -;
Each Rf ¹ is independently a C _1-16 alkyl group optionally substituted by one or more fluorine atoms;
Each R ^F is independently a divalent fluoropolyether group;
Each q is independently 0 or 1;
R ^Si is each independently a hydroxyl group, a hydrolyzable group, a hydrogen atom, or a monovalent group containing a Si atom to which a monovalent organic group is bonded;
In formula (1), at least one R ^Si is a monovalent group containing a Si atom having a hydroxyl group or a hydrolyzable group bonded thereto;
In formula (1), R ^Si does not contain an allyl ether group;
Each ^XA is independently a single bond or a divalent to decavalent organic group.
In the above, X ^A is a single bond or the following formula:
-(R ⁵¹ ) _p5 -(X ⁵¹ ) _q5 -
[Wherein:
R ⁵¹ represents a single bond, —(CH ₂ ) _s5 —, or an o-, m-, or p-phenylene group, and is preferably —(CH ₂ ) _s5 —;
s5 is an integer from 1 to 20, preferably an integer from 1 to 6, more preferably an integer from 1 to 3, even more preferably 1 or 2;
X ⁵¹ represents -(X ⁵² ) _l5 -;
X ⁵² each independently represents a group selected from the group consisting of -O-, -S-, o-, m- or p-phenylene group, -C(O)O-, -Si(R ⁵³ ) ₂ -, -(Si(R ⁵³ ) ₂ O) _m5 -Si(R ⁵³ ) ₂ -, -CONR ⁵⁴ -, -O-CONR ⁵⁴ -, -NR ⁵⁴ - and -(CH ₂ ) _n5 -;
R ⁵³ each independently represents a phenyl group, a C _1-6 alkyl group, or a C _1-6 alkoxy group, preferably a phenyl group or a C _1-6 alkyl group, more preferably a methyl group;
R ⁵⁴ each independently represents a hydrogen atom, a phenyl group, or a C _1-6 alkyl group (preferably a methyl group);
m5 is independently an integer of 1 to 100, preferably an integer of 1 to 20;
n5 is independently an integer from 1 to 20, preferably an integer from 1 to 6, more preferably an integer from 1 to 3;
l5 is an integer from 1 to 10, preferably an integer from 1 to 5, more preferably an integer from 1 to 3;
p5 is 0 or 1;
q5 is 0 or 1;
Here, at least one of p5 and q5 is 1, and the order of the repeating units enclosed in parentheses with p5 or q5 is arbitrary.
is a group represented by
R ^Si is represented by the following formula (S3):
-SiR ^a1 _k1 R ^b1 _l1 R ^c1 _m1 (S3)
[Wherein,
Each R ^a1 independently represents -Z ¹ -SiR ²² _q1 R ²³ _r1 ;
Z ¹ 's each independently represent an oxygen atom or a divalent organic group, and in the structure hereinafter described as Z ¹ , the right side is bonded to (SiR ²² _q1 R ²³ _r1 );
R ²² each independently represents a hydroxyl group or a hydrolyzable group;
Each R ²³ independently represents a hydrogen atom or a monovalent organic group;
q1 is independently an integer of 1 to 3 for each (SiR ²² _q1 R ²³ _r1 ) unit;
Each R ^b1 independently represents a hydroxyl group or a hydrolyzable group;
Each R ^c1 independently represents a hydrogen atom or a monovalent organic group;
Each k1 is independently an integer from 0 to 3, each l1 is independently an integer from 0 to 3, each m1 is independently an integer from 0 to 3, and the sum of k1, l1 and m1 is 3 in the (SiR ^a1 _k1 R ^b1 _l1 R ^c1 _m1 ) unit.
The compound is a group represented by
The compound (B) is represented by the formula (3):
R ^F1 _α −X ^A −[AR ^B1 _δ R ^B2 _3−δ ] _β (3)
[Wherein:
Each A is independently a C atom or a Si atom;
Each R ^F1 is independently Rf ¹ -R ^F -O _q -;
Each Rf ¹ is independently a C _1-16 alkyl group optionally substituted by one or more fluorine atoms;
Each R ^F is independently a divalent fluoropolyether group;
Each q is independently 0 or 1;
R ^B1 is -R ^B3 -O-CH=CH-CH3 _;
R ^B2 each independently represents one or more groups selected from -R ^B3 -O-CH ₂ CH ₂ CH ₂ -SiR ^B4 _ε R ^B5 _3-ε and a hydrogen atom;
Each R ^B3 is independently a single bond or a C _1-20 alkylene group;
Each R ^B4 is independently a hydroxyl group or a hydrolyzable group;
Each R ^B5 is independently a hydrogen atom or a monovalent organic group;
R ^Si is each independently a hydroxyl group, a hydrolyzable group, a hydrogen atom, or a monovalent group containing a Si atom to which a monovalent organic group is bonded;
Each ^XA is independently a single bond or a divalent to decavalent organic group;
α is an integer from 1 to 9;
β is an integer from 1 to 9;
Each γ is independently an integer from 1 to 9.
The composition according to any one of claims 1 to 3, comprising a compound represented by the formula: A surface treatment agent comprising the composition according to any one of claims 1 to 4. The surface treatment agent according to claim 5, further comprising one or more components selected from fluorine-containing oils and silicone oils. The surface treatment agent according to claim 5 or 6, which is used as an antifouling coating agent or a waterproof coating agent. An article comprising a substrate and a layer formed on the surface of the substrate from the composition according to any one of claims 1 to 4. An article comprising a substrate and a layer formed on the surface of the substrate from the surface treatment agent according to any one of claims 5 to 7.