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WO2025057765A1 - Projection optical system, image projection device, and eyepiece device - Google Patents

Projection optical system, image projection device, and eyepiece device Download PDF

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Publication number
WO2025057765A1
WO2025057765A1 PCT/JP2024/031128 JP2024031128W WO2025057765A1 WO 2025057765 A1 WO2025057765 A1 WO 2025057765A1 JP 2024031128 W JP2024031128 W JP 2024031128W WO 2025057765 A1 WO2025057765 A1 WO 2025057765A1
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WO
WIPO (PCT)
Prior art keywords
light
lens group
lens
light source
optical system
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PCT/JP2024/031128
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French (fr)
Japanese (ja)
Inventor
義仁 福島
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Sony Semiconductor Solutions Corp
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Sony Semiconductor Solutions Corp
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Publication of WO2025057765A1 publication Critical patent/WO2025057765A1/en
Pending legal-status Critical Current
Anticipated expiration legal-status Critical

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Classifications

    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00Optical objectives specially designed for the purposes specified below
    • G02B13/16Optical objectives specially designed for the purposes specified below for use in conjunction with image converters or intensifiers, or for use with projectors, e.g. objectives for projection TV
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/10Scanning systems
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/02Viewing or reading apparatus

Definitions

  • the technology disclosed herein (hereinafter also referred to as "the technology”) relates to a projection optical system, an image projection device, and an eyepiece device.
  • a technology has been developed that projects images by scanning a light beam from a light source in two dimensions using a deflection mirror.
  • Patent Document 1 discloses a technology relating to "a projection optical system comprising, in order from the light source side to the projection side along the optical axis, a first lens group having at least one lens and a positive focal length, which focuses light from the light source onto a primary image point which is an image of the light source, a deflector which scans the light from the first lens group, and a second lens group having at least one lens and a positive focal length, which focuses light from the deflector onto a secondary image point which is an image of the primary image point, the first lens group forming the primary image point between the first lens group and the second lens group along the optical axis.”
  • Patent document 1 explains that by shortening the distance between the deflection mirror and the primary image point, the effective diameter of the deflection mirror can be made smaller, which has the advantage of making the device more compact and preventing costs from increasing.
  • the size of the image projected by the projection optical system is generally larger than the lens group that makes up the projection optical system.
  • the image light emitted from this lens group often diverges as it travels. Therefore, the smaller the image size to be projected, the smaller the deflection mirror's angle tends to be. If the deflection mirror's angle becomes extremely small, there is a risk that the operation of the deflection mirror will become unstable. For this reason, it is necessary to ensure a certain degree of deflection angle.
  • the image light emitted from the lens group that constitutes the projection optical system may be converged.
  • the deflection angle of the deflection mirror becomes relatively large.
  • the area through which the chief ray of each light beam passes on the exit surface of this lens group becomes larger than the size of the image to be projected. This may result in an increase in the size of the projection optical system.
  • the main objective of this technology is to provide a projection optical system that achieves both stable operation of the deflection mirror and compactness of the device.
  • This technology is a first lens group having at least one lens and configured to focus light projected from a light source onto a position of a primary image point which is an image of the light source; a deflection mirror that scans the light from the first lens group; a second lens group having at least one lens and configured to focus the light from the deflection mirror at a secondary image point which is an image of the primary image point; There is provided a projection optical system, in which a focal point of the second lens group on the light source side is located near an emission position of a chief ray of light from the deflection mirror.
  • a distance from a focal point of the second lens group on the light source side to a light emission position on the deflection mirror may be ⁇ 1% or more and 2% or less of a focal length of the second lens group.
  • the first lens group may have a focal length of 2.0 mm or greater.
  • the focal length of the second lens group may be 24 mm or less.
  • the distance on the optical axis from the exit surface of the second lens group to the secondary image point may be 500 mm or less.
  • the chief rays of the respective light beams projected from the second lens group may be substantially parallel.
  • the first lens group may include a combination of a positive lens and a negative lens.
  • the second lens group may include a combination of a positive lens and a negative lens.
  • the light projected from the light source may be a laser light.
  • the light source is A first light source unit that projects light in a first wavelength band; A second light source unit that projects light in a second wavelength band; and a third light source unit that projects emission light in a third wavelength band.
  • the first wavelength band is a wavelength band corresponding to red
  • the second wavelength band is a wavelength band corresponding to green
  • the third wavelength band may be a wavelength band corresponding to blue color.
  • a projection optical system an eyepiece device disposed in front of an observer's eye
  • the projection optical system comprises: a first lens group having at least one lens and configured to focus light projected from a light source onto a position of a primary image point which is an image of the light source; a deflection mirror that scans the light from the first lens group; a second lens group having at least one lens and configured to focus the light from the deflection mirror at a secondary image point which is an image of the primary image point; a focal point of the second lens group on the light source side is located in the vicinity of an emission position of a chief ray of light on the deflection mirror,
  • An image projection apparatus is provided, wherein the eyepiece device projects light from the projection optical system onto the observer's retina.
  • the focal point on the light source side of the eyepiece device may be positioned at the position of the secondary image point.
  • the ocular device may be a contact lens type device.
  • this technology An eyepiece device disposed in front of an eye of an observer and projects light from a projection optical system onto a retina of the observer,
  • the projection optical system comprises: a first lens group having at least one lens and configured to focus light projected from a light source onto a position of a primary image point which is an image of the light source; a deflection mirror that scans the light from the first lens group; a second lens group having at least one lens and configured to focus the light from the deflection mirror at a secondary image point which is an image of the primary image point;
  • An eyepiece device is provided in which the focal point of the second lens group on the light source side is located near the exit position of the chief ray of light from the deflection mirror.
  • FIG. 1 is a schematic diagram showing an example of the configuration of a projection optical system 10 according to a comparative example of the present technology.
  • 1 is a schematic diagram showing an example of the configuration of a projection optical system 10 according to a comparative example of the present technology.
  • 1 is a schematic diagram illustrating an example of the configuration of a projection optical system 10 according to an embodiment of the present technology.
  • 2 is a schematic diagram showing a state of a light beam in the comparative example shown in FIG. 1 .
  • 3 is a schematic diagram showing a state of a light beam in the comparative example shown in FIG. 2 .
  • FIG. 4 is a schematic diagram showing the state of a light beam in the embodiment shown in FIG. 3.
  • FIG. 1 is a schematic diagram showing a configuration example of an eyepiece device 20 according to an embodiment of the present technology.
  • 11 is a graph showing a correlation between a focal length f3 of an eyepiece device 20 according to an embodiment of the present technology and a numerical aperture ⁇ of a light beam projected by the eyepiece device 20.
  • 11 is a graph showing a correlation between a distance D2 from a second lens group 2 to a secondary image plane P2 according to an embodiment of the present technology and a numerical aperture ⁇ of a light beam projected by an eyepiece device 20.
  • 1 is a graph showing paraxial calculations of the focal lengths of a first lens group 1 and a second lens group 2 according to an embodiment of the present technology.
  • 11 is a graph showing an example of a simulation result of the projection optical system 10 according to an embodiment of the present technology.
  • 11 is a graph showing an example of a simulation result of the projection optical system 10 according to an embodiment of the present technology.
  • 11 is a graph showing an example of a simulation result of the projection optical system 10 according to an embodiment of the present technology.
  • 11 is a graph showing an example of a simulation result of the projection optical system 10 according to an embodiment of the present technology.
  • 1 is a graph showing an example of a simulation result of the projection optical system 10 according to an embodiment of the present technology.
  • 1 is a schematic diagram illustrating an example of the configuration of an image projection device 100 according to an embodiment of the present technology.
  • 1 is a schematic diagram illustrating an example of the configuration of an image projection device 100 according to an embodiment of the present technology.
  • top means the upper direction or upper side in the drawing
  • bottom means the lower direction or lower side in the drawing
  • left means the left direction or left side in the drawing
  • right means the right direction or right side in the drawing.
  • the same or equivalent elements or members are given the same reference numerals, and duplicate explanations are omitted.
  • First embodiment of the present technology (example 1 of projection optical system) (1) Comparative Example (2) Overview of the Present Embodiment (3) Passage Area of Chief Ray (4) Direct Retinal Imaging (5) Simulation 2.
  • Second Embodiment of the Present Technology (Example 2 of Projection Optical System) 3.
  • Third embodiment of the present technology (example of image projection device) 4.
  • Fourth embodiment of the present technology (example of eyepiece device)
  • Fig. 1 is a schematic diagram showing an example of the configuration of a projection optical system 10 according to the comparative example of the present technology.
  • the projection optical system 10 includes a first lens group 12, a deflection mirror 3, and a second lens group 2. This projection optical system 10, together with a light source 4, constitutes an image projection device 100.
  • the light source 4 includes a light source section 41 and at least one lens (e.g., a collimator lens) 42.
  • a lens e.g., a collimator lens
  • the first lens group 12 has a positive focal length overall.
  • the first lens group 12 has at least one lens, and focuses the light projected from the light source 4 at the position of the primary image point P1, which is the image of the light source 4.
  • the first lens group 12 does not necessarily have to collect light at the position of the primary imaging point P1, and may collect light near the position of the primary imaging point P1.
  • the secondary imaging point P2 described below.
  • the deflection mirror 3 scans the light from the first lens group 12.
  • the deflection mirror 3 rotates or tilts around an axis.
  • the angle of the deflection mirror 3 is controlled to reflect the light in a specific direction.
  • the angle of the deflection mirror 3 the light can be scanned. For example, when the light is scanned horizontally by rotating the deflection mirror 3, the position of the light moves from left to right. Similarly, it can also be scanned vertically by tilting it.
  • An example of the deflection mirror 3 is a MEMS (Micro-Electro-Mechanical Systems Mirror) mirror.
  • a MEMS mirror is a mirror with a fine mechanical structure, and can be made to vibrate and rotate minutely using an electrical signal. This makes it possible to scan the emitted light and form an image.
  • the elements that make up the deflection mirror 3 are not limited to MEMS mirrors, but may be, for example, a galvanometer.
  • a galvanometer is a device that scans the emitted light by minutely vibrating a mirror using an electrical signal. By controlling the position of the mirror, the direction of the light can be changed, making it possible to scan the emitted light.
  • the second lens group 2 has a positive focal length overall.
  • the second lens group 2 has at least one lens (for example, lens 21) and focuses the light from the deflection mirror 3 at a secondary image point (secondary image plane) P2, which is an image of the primary image point P1.
  • the focal point P3 on the light source 4 side of the second lens group 2 and the emission position P4 of the chief ray L of light on the deflection mirror 3 are located apart. Specifically, the emission position P4 of the chief ray L of light on the deflection mirror 3 is located closer to the second lens group 2 than the focal point P3 on the light source 4 side of the second lens group 2.
  • each of the chief rays of the multiple light beams projected from the second lens group 2 is in a divergent state, expanding as it travels.
  • the deflection angle of the deflection mirror 3 In order to project a high-resolution image while stabilizing the operation of the deflection mirror 3, it is preferable to make the deflection angle of the deflection mirror 3 relatively large. If the deflection angle of the deflection mirror 3 is smaller than, for example, ⁇ 3 degrees, the operation of the deflection mirror 3 may become unstable.
  • FIG. 2 is a schematic diagram showing an example of the configuration of a projection optical system 10 according to a comparative example of this technology.
  • the focal point P3 on the light source 4 side of the second lens group 2 and the emission position P4 of the chief ray of light on the deflection mirror 3 are located apart. Specifically, the emission position P4 of the chief ray of light on the deflection mirror 3 is located farther from the second lens group 2 than the focal point P3 on the light source 4 side of the second lens group 2.
  • each of the chief rays of the multiple light beams projected from the second lens group 2 travels while converging.
  • the present technology provides a projection optical system in which the chief rays of each light beam projected from the second lens group are approximately parallel by specifying the positional relationship between the focal point on the light source side of the second lens group and the emission position of the chief ray of light on the deflection mirror.
  • this technology provides a projection optical system that includes a first lens group having at least one lens and focusing light projected from a light source at a position of a primary image point that is an image of the light source, a deflection mirror that scans the light from the first lens group, and a second lens group having at least one lens and focusing the light from the deflection mirror at a position of a secondary image point that is an image of the primary image point, the light source side focal point of the second lens group being located near the emission position of the chief ray of light on the deflection mirror.
  • FIG. 3 is a schematic diagram showing an example of the configuration of the projection optical system 10 according to one embodiment of the present technology.
  • the projection optical system 10 includes a first lens group 12, a deflection mirror 3, and a second lens group 2. Note that the contents of each component that were explained above with reference to FIG. 1 etc. will not be explained again.
  • the first lens group 12 preferably has a combination lens of a positive lens and a negative lens.
  • the chromatic aberration of each wavelength of the light source 4 can be corrected by using a combination lens of a positive lens and a negative lens for correcting chromatic aberration on the collecting side lens.
  • a combination of glass lenses with different Abbe numbers can be used for the positive and negative lenses.
  • the first lens group 12 may be composed of only multiple positive single lenses, and the on-axis chromatic aberration may be corrected by adjusting the distance between the light source 4 and the first lens group 12. In this case, costs can be reduced because a combination lens for correcting chromatic aberration is not used. In this case, the lenses in the first lens group 12 do not have to be made of glass; using plastic lenses, for example, would further reduce costs.
  • the second lens group 2 preferably has a combination lens of a positive lens and a negative lens.
  • chromatic aberration of magnification that occurs off-axis can be corrected.
  • the preferred configuration of the first lens group 12 described above it is possible to correct axial chromatic aberration, but it is difficult to correct chromatic aberration over the entire off-axis angle of view, so it is preferable to correct chromatic aberration in the second lens group 2.
  • chromatic aberration of each wavelength of the light source 4 can be corrected.
  • the projected image may be adjusted in a direction perpendicular to the optical axis by moving at least one of the lenses in the first lens group 12 and the second lens group 2 in a direction perpendicular to the optical axis. This allows the projected image to be moved in a plane perpendicular to the optical axis.
  • the chief rays of each light beam projected from the second lens group 2 become nearly parallel, so that a large swing angle of the deflection mirror 3 can be ensured even when the size of the projected image is small. This makes it possible to stabilize the operation of the deflection mirror 3. Furthermore, compared to the comparative example (see FIG. 2) in which the chief rays of the multiple light beams projected from the second lens group 2 each progress while converging, the device can be made more compact. In other words, it is possible to achieve both stabilization of the operation of the deflection mirror and miniaturization of the device. This effect also occurs in the other embodiments described below. Therefore, repeated description may be omitted in the explanation of the other embodiments.
  • FIG. 4 is a schematic diagram showing the state of light beams in the comparative example shown in FIG. 1.
  • FIG. 4A shows the state of the chief ray of the light beam that passes through the outermost part of the image light projected from the second lens group 2, among the multiple light beams contained in the image light projected from the second lens group 2.
  • the chief ray of each light beam projected from the second lens group 2 spreads as it travels.
  • the chief ray of each light beam is then refracted by the eyepiece device 20 placed in front of the observer's eye, and is guided to the eyeball E.
  • the dashed line indicates the pass area A1 of the chief ray of each light beam on the exit surface of the second lens group 2.
  • the pass area of each light beam is the sum of the pass area A1 of the chief ray of each light beam shown in the dashed line and the spread of the light beam passing through the outermost part of the image light.
  • the length of the pass area of each light beam is the sum of the diagonal length r1 of the pass area of the chief ray shown in the dashed line and the beam diameter r2 of the light beam passing through the outermost part of the image light.
  • the dashed line indicates the area A2 through which the chief ray of each light beam passes at the secondary image point (secondary image plane) P2.
  • the secondary image plane P2 At the secondary image plane P2, each light beam is in a condensed state. Therefore, the size of the area A2 through which the chief ray of each light beam passes is approximately the same as the size of the image projected by the projection optical system 10.
  • FIG. 6 is a schematic diagram showing the state of the light beams in the present embodiment shown in FIG. 3.
  • the chief rays of the multiple light beams projected from the second lens group 2 are each approximately parallel. Therefore, when the size of the image to be projected is fixed, as shown in FIGS. 6B and 6C, the passage area A1 of the chief ray of each light beam on the exit surface of the second lens group 2 is approximately the same size as the passage area A2 of the chief ray of each light beam at the secondary image point (secondary image plane) P2. This makes it possible to achieve both stable operation of the deflection mirror 3 and compactness of the device.
  • the projection optical system 10 according to this embodiment can be built into, for example, a wristwatch-type device.
  • the eyepiece device 20 according to this embodiment can be, for example, a contact lens-type device. Therefore, the distance (projection distance) D2 on the optical axis from the second lens group 2 constituting this wristwatch-type device to the secondary image plane P2 may exceed, for example, 500 mm.
  • the size of the image observed by the observer needs to be smaller than the size of the contact lens-type device.
  • the area through which the chief ray passes on the exit surface of the second lens group 2 needs to be smaller than the size of the contact lens-type device.
  • the length of the area through which the chief ray passes on the exit surface of the second lens group 2 needs to be 10 mm or less.
  • the distance on the optical axis from the exit surface of the second lens group 2 to the secondary image point P2 be 500 mm or less.
  • the present technology specifies the positional relationship between the focal point of the second lens group 2 on the light source 4 side and the emission position of the chief ray of light on the deflection mirror 3.
  • the inventor performed a simulation.
  • a paraxial calculation was performed on the focal lengths of the first lens group 12 and the second lens group 2 when the numerical aperture ⁇ of the light beam projected from the second lens group 2 is 0.010 and the projection distance is 200 mm or more and 500 mm or less.
  • the calculation result will be described with reference to FIG. 10.
  • FIG. 10 is a graph showing the paraxial calculation of the focal lengths of the first lens group 12 and the second lens group 2 according to an embodiment of the present technology.
  • the horizontal axis indicates the focal length f1 of the first lens group 12.
  • the vertical axis indicates the focal length f2 of the second lens group 2.
  • the legend on the right side of the graph indicates the projection distance [mm].
  • the focal length f1 values range from 1.5 to 6.5. If the focal length f1 value is reduced, the radius of curvature of each lens that makes up the first lens group 12 must be reduced. However, if the radius of curvature of the lenses is made extremely small, it becomes difficult to process each lens. To facilitate lens processing, it is preferable that the focal length f1 of the first lens group 12 is 2.0 mm or greater.
  • Figs. 11 and 12 are graphs showing an example of the simulation results of the projection optical system 10 according to one embodiment of the present technology.
  • the chief rays of each light beam projected from the second lens group 2 are approximately parallel.
  • the focal point P3 on the light source 4 side of the second lens group 2 coincides with the emission position P4 of the chief ray of light on the deflection mirror 3, as shown in Figure 3.
  • the value on the horizontal axis in Figure 11 is 0.
  • the distance D1 from the focal point P3 of the second lens group 2 on the light source 4 side to the emission position P4 of the chief ray of light on the deflection mirror 3 may be -1% to 2% of the focal length f2 of the second lens group 2. If it can be kept within this range of -1% to 2%, it is possible to keep the change within 1 degree from the swing angle of the deflection mirror 3 when the focal point P3 of the second lens group 2 on the light source 4 side and the emission position P4 of the chief ray of light on the deflection mirror 3 are aligned. This makes it possible to make the respective light beams projected from the second lens group 2 approximately parallel.
  • the horizontal axis represents the focal point P3 of the second lens group 2 on the light source 4 side, as in FIG. It is a value obtained by normalizing a distance D1 from the deflection mirror 3 to an emission position P4 of the chief ray of light on the deflection mirror 3 by the focal length f2 of the second lens group 2.
  • the direction from the deflection mirror 3 toward the second lens group 2 is defined as positive.
  • the vertical axis indicates the maximum value W of the length of the area through which the chief ray passes on the emission surface of the second lens group 2 when the center of the emission surface is used as a reference.
  • the distance from the focal point P3 on the light source 4 side of the second lens group 2 to the emission position P4 of the chief ray of light on the deflection mirror 3 is between -1% and 2% of the focal length of the second lens group 2. If it can be kept within this range of between -1% and 2%, the value on the vertical axis can be kept to about +1 mm from the state where the focal point P3 on the light source 4 side of the second lens group 2 and the emission position P4 of the chief ray of light on the deflection mirror 3 are aligned. This makes it possible to make the chief rays of each light beam projected from the second lens group 2 approximately parallel.
  • FIG. 13 is a graph showing an example of a simulation result of the projection optical system 10 according to an embodiment of the present technology.
  • the horizontal axis is the focal length f2 [mm] of the second lens group 2.
  • the vertical axis is the deflection angle ⁇ (one side) [deg] of the deflection mirror 3.
  • the legend on the right side of the graph indicates the projection distance [mm].
  • the numerical aperture ⁇ of the light beam projected from the second lens group 2 is set to 0.01 as a prerequisite, but the swing angle ⁇ of the deflection mirror 3 is not affected by this numerical aperture ⁇ .
  • the swing angle ⁇ of the deflection mirror 3 is affected by the focal length f2 of the second lens group 2 and the length of the area through which the chief ray passes on the secondary image plane P2.
  • the focal length f2 of the second lens group 2 is 24 mm or less, the swing angle ⁇ of the deflection mirror 3 will be ⁇ 3 degrees or more, and the operation of the deflection mirror 3 will be stable.
  • the length of the area through which the chief ray passes at the secondary image plane P2 will vary depending on the focal length of the eyepiece device 20 and the required angle of view.
  • the focal length f2 of the second lens group 2 is 24 mm or less, it is possible to keep the swing angle ⁇ of the deflection mirror 3 within a range that does not interfere with its operation.
  • the light source may include a first light source unit that projects an emission light of a first wavelength band, a second light source unit that projects an emission light of a second wavelength band, and a third light source unit that projects an emission light of a third wavelength band.
  • Fig. 14 is a schematic diagram showing a configuration example of a projection optical system 10 according to an embodiment of the present technology.
  • the light source 4 may include a first light source unit 41R that projects emitted light in a first wavelength band, a second light source unit 41G that projects emitted light in a second wavelength band, and a third light source unit 41B that projects emitted light in a third wavelength band.
  • the number of light source units is not particularly limited.
  • the first wavelength band may be a wavelength band corresponding to red
  • the second wavelength band may be a wavelength band corresponding to green
  • the third wavelength band may be a wavelength band corresponding to blue.
  • the wavelength band corresponding to red may be, for example, approximately 620 to 750 nm.
  • the wavelength band corresponding to green may be, for example, approximately 500 to 550 nm.
  • the wavelength band corresponding to blue may be, for example, approximately 430 to 500 nm.
  • the light source 4 further includes, for example, lenses 42R, 42G, and 42B.
  • the lens 42R makes the emitted light of the first wavelength band projected by the first light source unit 41R approximately parallel.
  • the lens 42G makes the emitted light of the second wavelength band projected by the second light source unit 41G approximately parallel.
  • the lens 42B makes the emitted light of the third wavelength band projected by the third light source unit 41B approximately parallel.
  • mirror 51 and dichroic mirrors 52 and 53 are used as a multiplexing optical system.
  • This multiplexing optical system multiplexes the emitted light of each wavelength band onto the same optical axis and emits it to the first lens group 12.
  • the mirror 51 is disposed on the optical axis of the first light source unit 41R and the lens 42R.
  • the mirror 51 reflects the light of the first wavelength band projected from the first light source unit 41R.
  • the dichroic mirror 52 is disposed on the optical axis of the second light source unit 41G and the lens 42G.
  • the dichroic mirror 52 transmits the light of the first wavelength band projected from the first light source unit 41R and reflects the light of the second wavelength band projected from the second light source unit 41G.
  • the dichroic mirror 53 is disposed on the optical axis of the third light source unit 41B and the lens 42B.
  • the dichroic mirror 53 reflects the light of the first wavelength band projected from the first light source unit 41R, reflects the light of the second wavelength band projected from the second light source unit 41G, and transmits the light of the third wavelength band projected from the third light source unit 41B.
  • the first lens group 12 focuses the approximately parallel light from the combining optical system at the position of the primary image point P1.
  • the focal point P3 on the light source 4 side of the second lens group 2 is located near the emission position P4 of the chief ray of light on the deflection mirror 3.
  • the light from the lens 21 is scanned two-dimensionally by the deflection mirror 3, passes through the second lens group 2, and is focused on the secondary image plane P2.
  • the elements that make up the combining optical system are not limited to these.
  • the combining optical system may be made up of a dichroic prism, a polarizing beam splitter (PBS), a polarizing beam combiner (PBC), a half mirror, an interference filter, etc.
  • the technology for emitting light in multiple wavelength bands to project a color image is not necessarily limited to this configuration.
  • the light source may be a single light source unit that emits light in multiple wavelength bands.
  • a laser diode array can be used to emit light in multiple wavelength bands from a single chip.
  • light in multiple wavelength bands can be generated from a single chip by introducing luminescent substances of different colors into a liquid or gas and exciting each of them to emit light.
  • Fig. 15 is a schematic diagram showing an example of the configuration of an image projection device 100 according to an embodiment of the present technology.
  • the image projection device 100 includes a projection optical system 10 and an eyepiece device 20 that is placed in front of the observer's eye.
  • the projection optical system 10 is built into a wristwatch-type device, which is an example of the image projection device 100.
  • the observer can change the image projected by the image projection device 100 via a display provided in the wristwatch-type device 100.
  • Each light beam projected from the projection optical system 10 is imaged at a secondary imaging point and then projected onto the eyepiece device 20 while expanding.
  • the eyepiece device 20 projects the light from the projection optical system 10 onto the observer's retina E1.
  • the eyepiece device 20 may be, for example, a glasses-type device, but is preferably a contact lens-type device. Glasses-type devices need to be adapted to the shape of each individual's face. On the other hand, contact lens-type devices do not require this, and can provide a comfortable fit and sensation to everyone.
  • the contact lens type eyepiece device 20 has lenses that are worn directly on the eye, so it can project light more directly onto the retina.
  • the frame and lens thickness may interfere, resulting in restrictions on light transmission.
  • the eyepiece device 20 may have, for example, a half mirror, a prism, a lens, an optical fiber, a diffraction element, etc.
  • the eyepiece device 20 may have a diffraction element, such as a holographic optical element, a Fresnel lens, a reflective diffraction grating, or a transmissive diffraction grating.
  • a diffraction element can diffuse or converge light by utilizing the diffraction effect of light.
  • the eyepiece device 20 can be simplified. Compared to other optical elements with complex optical configurations, such as lens arrays, a diffraction element can realize a simple and compact device design.
  • FIG. 16 is a schematic diagram showing an example of the configuration of the image projection device 100 according to one embodiment of the present technology.

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Abstract

The present invention achieves both stabilization of operation of a deflection mirror and miniaturization of a device. The present art provides a projection optical system, etc., comprising a first lens group that has at least one lens and condenses light projected from a light source to a position of a primary imaging point that is an image of the light source, a deflection mirror that causes light to scan from the first lens group, and a second lens group that has at least one lens and forms an image of light from the deflection mirror at a position of a secondary image formation point that is an image of the primary image formation point, the focal point of the second lens group on the light source side being positioned in the vicinity of the emission position of a principal ray of light on the deflection mirror.

Description

投影光学系、画像投影装置、および接眼デバイスProjection optical system, image projection apparatus, and eyepiece device

 本開示に係る技術(以下「本技術」とも呼ぶ)は、投影光学系、画像投影装置、および接眼デバイスに関する。 The technology disclosed herein (hereinafter also referred to as "the technology") relates to a projection optical system, an image projection device, and an eyepiece device.

 光源からの光束を偏向ミラーによって2次元走査することで、画像を投影する技術が開発されている。 A technology has been developed that projects images by scanning a light beam from a light source in two dimensions using a deflection mirror.

 たとえば特許文献1では、「光軸に沿って光源側から投影側に向かって順に、少なくとも1枚のレンズを有し、正の焦点距離を持ち、前記光源からの光を、前記光源の像である1次結像点に集光させる第1レンズ群と、前記第1レンズ群からの光を走査する偏向器と、少なくとも1枚のレンズを有し、正の焦点距離を持ち、前記偏向器からの光を、前記1次結像点の像である2次結像点の位置に結像させる第2レンズ群とを備え、前記第1レンズ群は、前記光軸に沿って前記第1レンズ群と前記第2レンズ群との間に前記1次結像点を形成する投影光学系」に関する技術が開示されている。 For example, Patent Document 1 discloses a technology relating to "a projection optical system comprising, in order from the light source side to the projection side along the optical axis, a first lens group having at least one lens and a positive focal length, which focuses light from the light source onto a primary image point which is an image of the light source, a deflector which scans the light from the first lens group, and a second lens group having at least one lens and a positive focal length, which focuses light from the deflector onto a secondary image point which is an image of the primary image point, the first lens group forming the primary image point between the first lens group and the second lens group along the optical axis."

 この特許文献1では、偏向ミラーと1次結像点との距離を近くすることで、偏向ミラーの有効径を小さくすることができ、装置の小型化や、高コスト化を防ぐなどの利点があることが説明されている。 Patent document 1 explains that by shortening the distance between the deflection mirror and the primary image point, the effective diameter of the deflection mirror can be made smaller, which has the advantage of making the device more compact and preventing costs from increasing.

国際公開第2018/110448号International Publication No. 2018/110448

 投影光学系が投影する画像サイズは、投影光学系を構成するレンズ群より大きいことが一般的である。そのため、このレンズ群から出射される映像光は発散しながら進むことが多い。したがって、投影する画像サイズが小さくなればなるほど、偏向ミラーの振り角も小さくなる傾向にある。偏向ミラーの振り角が極端に小さくなると、偏向ミラーの動作が不安定になるおそれがある。そのため、ある程度の大きさの振り角を確保する必要がある。 The size of the image projected by the projection optical system is generally larger than the lens group that makes up the projection optical system. As a result, the image light emitted from this lens group often diverges as it travels. Therefore, the smaller the image size to be projected, the smaller the deflection mirror's angle tends to be. If the deflection mirror's angle becomes extremely small, there is a risk that the operation of the deflection mirror will become unstable. For this reason, it is necessary to ensure a certain degree of deflection angle.

 ある程度の大きさの振り角を確保するために、たとえば、投影光学系を構成するレンズ群から出射される映像光を収束させてよい。この場合、偏向ミラーの振り角は比較的大きくなる。 To ensure a certain degree of deflection angle, for example, the image light emitted from the lens group that constitutes the projection optical system may be converged. In this case, the deflection angle of the deflection mirror becomes relatively large.

 しかし、この場合、このレンズ群の出射面における各光束の主光線が通過する範囲は、投影する画像サイズよりも大きくなる。これにより、投影光学系の大型化を招くおそれがある。 However, in this case, the area through which the chief ray of each light beam passes on the exit surface of this lens group becomes larger than the size of the image to be projected. This may result in an increase in the size of the projection optical system.

 そこで、本技術は、偏向ミラーの動作の安定化と装置の小型化を両立させる投影光学系などを提供することを主目的とする。 The main objective of this technology is to provide a projection optical system that achieves both stable operation of the deflection mirror and compactness of the device.

 本技術は、
 少なくとも1つのレンズを有しており、光源から投射された光を、前記光源の像である1次結像点の位置に集光させる第1レンズ群と、
 前記第1レンズ群からの光を走査する偏向ミラーと、
 少なくとも1つのレンズを有しており、前記偏向ミラーからの光を、前記1次結像点の像である2次結像点の位置に結像させる第2レンズ群と、を備えており、
 前記第2レンズ群の前記光源側の焦点が、前記偏向ミラーにおける光の主光線の出射位置の近傍に位置する、投影光学系を提供する。
 前記偏向ミラーから前記第2レンズ群に向かう方向を正とするとき、
 前記第2レンズ群の前記光源側の焦点から、前記偏向ミラーにおける光の出射位置までの距離が、前記第2レンズ群の焦点距離に対して-1%以上2%以下であってよい。
 前記第1レンズ群の焦点距離が2.0mm以上であってよい。
 前記第2レンズ群の焦点距離が24mm以下であってよい。
 前記第2レンズ群の出射面から前記2次結像点までの光軸上の距離が、500mm以下であってよい。
 前記第2レンズ群から投射されたそれぞれの光束の主光線が、略平行状態であってよい。
 前記第1レンズ群が、正レンズと負レンズとの組合せレンズを有してよい。
 前記第2レンズ群が、正レンズと負レンズとの組合せレンズを有してよい。
 前記光源から投射された光が、レーザ光であってよい。
 前記光源が、
 第1波長帯域の出射光を投射する第1光源部と、
 第2波長帯域の出射光を投射する第2光源部と、
 第3波長帯域の出射光を投射する第3光源部と、を含んでよい。
 前記第1波長帯域が、赤色に対応する波長帯域であり、
 前記第2波長帯域が、緑色に対応する波長帯域であり、
 前記第3波長帯域が、青色に対応する波長帯域であってよい。
 また、本技術は、
 投影光学系と、
 観察者の眼前に配置される接眼デバイスと、備えており、
 前記投影光学系が、
 少なくとも1つのレンズを有しており、光源から投射された光を、前記光源の像である1次結像点の位置に集光させる第1レンズ群と、
 前記第1レンズ群からの光を走査する偏向ミラーと、
 少なくとも1つのレンズを有しており、前記偏向ミラーからの光を、前記1次結像点の像である2次結像点の位置に結像させる第2レンズ群と、を備えており、
 前記第2レンズ群の前記光源側の焦点が、前記偏向ミラーにおける光の主光線の出射位置の近傍に位置しており、
 前記接眼デバイスが、前記投影光学系からの光を前記観察者の網膜に投射する、画像投影装置を提供する。
 前記接眼デバイスの光源側の焦点が、前記2次結像点の位置に配置されてよい。
 前記接眼デバイスが、コンタクトレンズ型デバイスであってよい。
 また、本技術は、
 観察者の眼前に配置されており、投影光学系からの光を前記観察者の網膜に投射する接眼デバイスであって、
 前記投影光学系が、
 少なくとも1つのレンズを有しており、光源から投射された光を、前記光源の像である1次結像点の位置に集光させる第1レンズ群と、
 前記第1レンズ群からの光を走査する偏向ミラーと、
 少なくとも1つのレンズを有しており、前記偏向ミラーからの光を、前記1次結像点の像である2次結像点の位置に結像させる第2レンズ群と、を備えており、
 前記第2レンズ群の前記光源側の焦点が、前記偏向ミラーにおける光の主光線の出射位置の近傍に位置する、接眼デバイスを提供する。
This technology is
a first lens group having at least one lens and configured to focus light projected from a light source onto a position of a primary image point which is an image of the light source;
a deflection mirror that scans the light from the first lens group;
a second lens group having at least one lens and configured to focus the light from the deflection mirror at a secondary image point which is an image of the primary image point;
There is provided a projection optical system, in which a focal point of the second lens group on the light source side is located near an emission position of a chief ray of light from the deflection mirror.
When the direction from the deflection mirror toward the second lens group is defined as positive,
A distance from a focal point of the second lens group on the light source side to a light emission position on the deflection mirror may be −1% or more and 2% or less of a focal length of the second lens group.
The first lens group may have a focal length of 2.0 mm or greater.
The focal length of the second lens group may be 24 mm or less.
The distance on the optical axis from the exit surface of the second lens group to the secondary image point may be 500 mm or less.
The chief rays of the respective light beams projected from the second lens group may be substantially parallel.
The first lens group may include a combination of a positive lens and a negative lens.
The second lens group may include a combination of a positive lens and a negative lens.
The light projected from the light source may be a laser light.
The light source is
A first light source unit that projects light in a first wavelength band;
A second light source unit that projects light in a second wavelength band;
and a third light source unit that projects emission light in a third wavelength band.
the first wavelength band is a wavelength band corresponding to red,
the second wavelength band is a wavelength band corresponding to green,
The third wavelength band may be a wavelength band corresponding to blue color.
In addition, this technology:
A projection optical system;
an eyepiece device disposed in front of an observer's eye,
The projection optical system comprises:
a first lens group having at least one lens and configured to focus light projected from a light source onto a position of a primary image point which is an image of the light source;
a deflection mirror that scans the light from the first lens group;
a second lens group having at least one lens and configured to focus the light from the deflection mirror at a secondary image point which is an image of the primary image point;
a focal point of the second lens group on the light source side is located in the vicinity of an emission position of a chief ray of light on the deflection mirror,
An image projection apparatus is provided, wherein the eyepiece device projects light from the projection optical system onto the observer's retina.
The focal point on the light source side of the eyepiece device may be positioned at the position of the secondary image point.
The ocular device may be a contact lens type device.
In addition, this technology:
An eyepiece device disposed in front of an eye of an observer and projects light from a projection optical system onto a retina of the observer,
The projection optical system comprises:
a first lens group having at least one lens and configured to focus light projected from a light source onto a position of a primary image point which is an image of the light source;
a deflection mirror that scans the light from the first lens group;
a second lens group having at least one lens and configured to focus the light from the deflection mirror at a secondary image point which is an image of the primary image point;
An eyepiece device is provided in which the focal point of the second lens group on the light source side is located near the exit position of the chief ray of light from the deflection mirror.

 本技術によれば、偏向ミラーの動作の安定化と装置の小型化を両立させることができる。なお、ここに記載された効果は、必ずしも限定されるものではなく、本開示中に記載されたいずれかの効果であってもよい。 This technology makes it possible to stabilize the operation of the deflection mirror while also miniaturizing the device. Note that the effects described here are not necessarily limited to those described herein, and may be any of the effects described in this disclosure.

本技術の比較例に係る投影光学系10の構成例を示す模式図である。1 is a schematic diagram showing an example of the configuration of a projection optical system 10 according to a comparative example of the present technology. 本技術の比較例に係る投影光学系10の構成例を示す模式図である。1 is a schematic diagram showing an example of the configuration of a projection optical system 10 according to a comparative example of the present technology. 本技術の一実施形態に係る投影光学系10の構成例を示す模式図である。1 is a schematic diagram illustrating an example of the configuration of a projection optical system 10 according to an embodiment of the present technology. 図1に示される比較例における光束の状態を示す模式図である。2 is a schematic diagram showing a state of a light beam in the comparative example shown in FIG. 1 . 図2に示される比較例における光束の状態を示す模式図である。3 is a schematic diagram showing a state of a light beam in the comparative example shown in FIG. 2 . FIG. 図3に示される本実施形態における光束の状態を示す模式図である。4 is a schematic diagram showing the state of a light beam in the embodiment shown in FIG. 3. 本技術の一実施形態に係る接眼デバイス20の構成例を示す模式図である。1 is a schematic diagram showing a configuration example of an eyepiece device 20 according to an embodiment of the present technology. 本技術の一実施形態に係る接眼デバイス20の焦点距離f3と、接眼デバイス20が投射する光束の開口数θとの相関関係を示すグラフである。11 is a graph showing a correlation between a focal length f3 of an eyepiece device 20 according to an embodiment of the present technology and a numerical aperture θ of a light beam projected by the eyepiece device 20. 本技術の一実施形態に係る第2レンズ群2から2次結像面P2までの距離D2と、接眼デバイス20が投射する光束の開口数θとの相関関係を示すグラフである。11 is a graph showing a correlation between a distance D2 from a second lens group 2 to a secondary image plane P2 according to an embodiment of the present technology and a numerical aperture θ of a light beam projected by an eyepiece device 20. 本技術の一実施形態に係る第1レンズ群1および第2レンズ群2のそれぞれの焦点距離を近軸計算したグラフである。1 is a graph showing paraxial calculations of the focal lengths of a first lens group 1 and a second lens group 2 according to an embodiment of the present technology. 本技術の一実施形態に係る投影光学系10のシミュレーション結果の一例を示すグラフである。11 is a graph showing an example of a simulation result of the projection optical system 10 according to an embodiment of the present technology. 本技術の一実施形態に係る投影光学系10のシミュレーション結果の一例を示すグラフである。11 is a graph showing an example of a simulation result of the projection optical system 10 according to an embodiment of the present technology. 本技術の一実施形態に係る投影光学系10のシミュレーション結果の一例を示すグラフである。11 is a graph showing an example of a simulation result of the projection optical system 10 according to an embodiment of the present technology. 本技術の一実施形態に係る投影光学系10の構成例を示す模式図である。1 is a schematic diagram illustrating an example of the configuration of a projection optical system 10 according to an embodiment of the present technology. 本技術の一実施形態に係る画像投影装置100の構成例を示す模式図である。1 is a schematic diagram illustrating an example of the configuration of an image projection device 100 according to an embodiment of the present technology. 本技術の一実施形態に係る画像投影装置100の構成例を示す模式図である。1 is a schematic diagram illustrating an example of the configuration of an image projection device 100 according to an embodiment of the present technology.

 以下、本技術を実施するための好適な実施形態について図面を参照して説明する。なお、以下に説明する実施形態は、本技術の代表的な実施形態の一例を示したものであり、これにより本技術の範囲が限定されることはない。また、本技術は、下記の実施例およびその変形例のいずれかを組み合わせることができる。 Below, a preferred embodiment for implementing the present technology will be described with reference to the drawings. Note that the embodiment described below is an example of a representative embodiment of the present technology, and does not limit the scope of the present technology. In addition, the present technology can be combined with any of the following examples and their variations.

 以下の実施形態の説明において、略平行、略直交のような「略」を伴った用語で構成を説明することがある。たとえば、略平行とは、完全に平行であることを意味するだけでなく、実質的に平行である、すなわち、完全に平行な状態からたとえば数%程度ずれた状態を含むことも意味する。他の「略」を伴った用語についても同様である。また、各図は模式図であり、必ずしも厳密に図示されたものではない。図面のスケールは、技術の特徴を分かり易くするために強調している。そのため、図面のスケールと実際のデバイスのスケールは必ずしも同一ではないことに留意すべきである。 In the following description of the embodiments, configurations may be described using terms that include "approximately", such as "approximately parallel" and "approximately perpendicular". For example, "approximately parallel" does not only mean completely parallel, but also means that it is substantially parallel, that is, it includes a state that is deviated from a completely parallel state by, for example, about a few percent. The same applies to other terms that include "approximately". In addition, each figure is a schematic diagram, and is not necessarily an accurate depiction. The scale of the drawings has been exaggerated to make the characteristics of the technology easier to understand. Therefore, it should be noted that the scale of the drawings and the scale of the actual device are not necessarily the same.

 特に断りがない限り、図面において、「上」とは図中の上方向または上側を意味し、「下」とは、図中の下方向または下側を意味し、「左」とは図中の左方向または左側を意味し、「右」とは図中の右方向または右側を意味する。また、図面については、同一または同等の要素または部材には同一の符号を付し、重複する説明は省略する。 Unless otherwise specified, in the drawings, "top" means the upper direction or upper side in the drawing, "bottom" means the lower direction or lower side in the drawing, "left" means the left direction or left side in the drawing, and "right" means the right direction or right side in the drawing. In addition, in the drawings, the same or equivalent elements or members are given the same reference numerals, and duplicate explanations are omitted.

 説明は以下の順序で行う。
 1.本技術の第1実施形態(投影光学系の例1)
 (1)比較例
 (2)本実施形態の概要
 (3)主光線の通過領域
 (4)網膜直描
 (5)シミュレーション
 2.本技術の第2実施形態(投影光学系の例2)
 3.本技術の第3実施形態(画像投影装置の例)
 4.本技術の第4実施形態(接眼デバイスの例)
The explanation will be given in the following order.
1. First embodiment of the present technology (example 1 of projection optical system)
(1) Comparative Example (2) Overview of the Present Embodiment (3) Passage Area of Chief Ray (4) Direct Retinal Imaging (5) Simulation 2. Second Embodiment of the Present Technology (Example 2 of Projection Optical System)
3. Third embodiment of the present technology (example of image projection device)
4. Fourth embodiment of the present technology (example of eyepiece device)

[1.本技術の第1実施形態(投影光学系の例1)]
[(1)比較例]
 本技術が解決しようとする課題を説明するために、まずは、本技術の比較例について図1を参照しつつ説明する。図1は、本技術の比較例に係る投影光学系10の構成例を示す模式図である。
[1. First embodiment of the present technology (example 1 of projection optical system)]
(1) Comparative Example
In order to describe the problem to be solved by the present technology, a comparative example of the present technology will be described first with reference to Fig. 1. Fig. 1 is a schematic diagram showing an example of the configuration of a projection optical system 10 according to the comparative example of the present technology.

 図1に示されるとおり、投影光学系10は、第1レンズ群12と、偏向ミラー3と、第2レンズ群2と、を備えている。この投影光学系10は、光源4とともに画像投影装置100を構成している。 As shown in FIG. 1, the projection optical system 10 includes a first lens group 12, a deflection mirror 3, and a second lens group 2. This projection optical system 10, together with a light source 4, constitutes an image projection device 100.

 光源4は、光源部41と、少なくとも1つのレンズ(たとえばコリメータレンズ)42と、を備えている。 The light source 4 includes a light source section 41 and at least one lens (e.g., a collimator lens) 42.

 第1レンズ群12は、全体として正の焦点距離を有する。第1レンズ群12は、少なくとも1つのレンズを有しており、光源4から投射された光を、光源4の像である1次結像点P1の位置に集光させる。 The first lens group 12 has a positive focal length overall. The first lens group 12 has at least one lens, and focuses the light projected from the light source 4 at the position of the primary image point P1, which is the image of the light source 4.

 なお、光学系によって光を集めたり拡散したりすると、光線の屈折や反射などが発生する。これにより、本来の理想的な結像点からのずれ(収差)が生じることがある。そのため、第1レンズ群12は、必ずしも1次結像点P1の位置に集光させなくてもよく、1次結像点P1の位置の近傍に集光させてもよい。後述する2次結像点P2についても同様である。 Note that when light is collected or diffused by an optical system, refraction and reflection of light rays occur. This can result in deviation (aberration) from the original ideal imaging point. For this reason, the first lens group 12 does not necessarily have to collect light at the position of the primary imaging point P1, and may collect light near the position of the primary imaging point P1. The same applies to the secondary imaging point P2 described below.

 偏向ミラー3は、第1レンズ群12からの光を走査する。偏向ミラー3は、軸を中心に回転または傾斜する。1次結像点P1を経由した光が偏向ミラー3に照射されると、偏向ミラー3の角度が制御されて、光が特定の方向に反射される。偏向ミラー3の角度を制御することで、光を走査することができる。たとえば、偏向ミラー3の回転により光が水平方向に走査されると、光の位置が左から右へ移動する。同様に、傾斜によって垂直方向にも走査できる。 The deflection mirror 3 scans the light from the first lens group 12. The deflection mirror 3 rotates or tilts around an axis. When light that has passed through the primary image point P1 is irradiated onto the deflection mirror 3, the angle of the deflection mirror 3 is controlled to reflect the light in a specific direction. By controlling the angle of the deflection mirror 3, the light can be scanned. For example, when the light is scanned horizontally by rotating the deflection mirror 3, the position of the light moves from left to right. Similarly, it can also be scanned vertically by tilting it.

 偏向ミラー3の一例として、たとえばMEMS(Micro-Electro-Mechanical Systems Mirror)ミラーなどが用いられることができる。MEMSミラーは、微細な機械構造を持つミラーであり、電気信号を用いてミラーを微小に振動・回転させることができる。これにより、出射光を走査し、画像を形成することができる。 An example of the deflection mirror 3 is a MEMS (Micro-Electro-Mechanical Systems Mirror) mirror. A MEMS mirror is a mirror with a fine mechanical structure, and can be made to vibrate and rotate minutely using an electrical signal. This makes it possible to scan the emitted light and form an image.

 偏向ミラー3を構成する要素はMEMSミラーに限られず、たとえばガルバノメーターであってもよい。ガルバノメーターは、電気信号を用いてミラーを微小に振動させることで出射光を走査する装置である。ミラーの位置を制御することで光の方向を変え、出射光を走査することができる。 The elements that make up the deflection mirror 3 are not limited to MEMS mirrors, but may be, for example, a galvanometer. A galvanometer is a device that scans the emitted light by minutely vibrating a mirror using an electrical signal. By controlling the position of the mirror, the direction of the light can be changed, making it possible to scan the emitted light.

 第2レンズ群2は、全体として正の焦点距離を有する。第2レンズ群2は、少なくとも1つのレンズ(たとえばレンズ21)を有しており、偏向ミラー3からの光を、1次結像点P1の像である2次結像点(2次結像面)P2の位置に結像させる。 The second lens group 2 has a positive focal length overall. The second lens group 2 has at least one lens (for example, lens 21) and focuses the light from the deflection mirror 3 at a secondary image point (secondary image plane) P2, which is an image of the primary image point P1.

 この比較例では、第2レンズ群2の光源4側の焦点P3と、偏向ミラー3における光の主光線Lの出射位置P4と、が離れて位置している。具体的には、偏向ミラー3における光の主光線Lの出射位置P4が、第2レンズ群2の光源4側の焦点P3よりも、第2レンズ群2に近い位置に配置されている。 In this comparative example, the focal point P3 on the light source 4 side of the second lens group 2 and the emission position P4 of the chief ray L of light on the deflection mirror 3 are located apart. Specifically, the emission position P4 of the chief ray L of light on the deflection mirror 3 is located closer to the second lens group 2 than the focal point P3 on the light source 4 side of the second lens group 2.

 これにより、第2レンズ群2から投射される複数の光束の主光線のそれぞれは、拡がりながら進む発散状態になる。これにより、投影光学系10を構成する第2レンズ群2のサイズは、投影光学系10が投影する画像サイズより小さくなる。その結果、投影光学系10を小型化しつつ、高解像度の画像を投影できる。 As a result, each of the chief rays of the multiple light beams projected from the second lens group 2 is in a divergent state, expanding as it travels. This makes the size of the second lens group 2 that constitutes the projection optical system 10 smaller than the size of the image projected by the projection optical system 10. As a result, it is possible to project a high-resolution image while miniaturizing the projection optical system 10.

 投影する画像サイズが小さくなればなるほど、偏向ミラー3の振り角も小さくなる傾向にある。たとえば、投影光学系10からの映像光が観察者の網膜に投射される場合、画像サイズは非常に小さくなり、偏向ミラー3の振り角も非常に小さくなる。 The smaller the image size to be projected, the smaller the swing angle of the deflection mirror 3 tends to be. For example, when the image light from the projection optical system 10 is projected onto the observer's retina, the image size becomes very small and the swing angle of the deflection mirror 3 also becomes very small.

 偏向ミラー3の動作を安定させつつ、高解像度の映像を投影するためには、偏向ミラー3の振り角を比較的大きくすることが好ましい。偏向ミラー3の振り角がたとえば±3度より小さくなると、偏向ミラー3の動作が不安定になるおそれがある。 In order to project a high-resolution image while stabilizing the operation of the deflection mirror 3, it is preferable to make the deflection angle of the deflection mirror 3 relatively large. If the deflection angle of the deflection mirror 3 is smaller than, for example, ±3 degrees, the operation of the deflection mirror 3 may become unstable.

 偏向ミラー3の振り角を比較的大きくするために、投影光学系10が投射する複数の光束の主光線のそれぞれが収束しながら進むように、光学系を調整してもよい。このことについて、図2を参照しつつ説明する。図2は、本技術の比較例に係る投影光学系10の構成例を示す模式図である。 In order to make the deflection angle of the deflection mirror 3 relatively large, the optical system may be adjusted so that the chief rays of the multiple light beams projected by the projection optical system 10 each travel while converging. This will be explained with reference to FIG. 2. FIG. 2 is a schematic diagram showing an example of the configuration of a projection optical system 10 according to a comparative example of this technology.

 図2に示されるとおり、第2レンズ群2の光源4側の焦点P3と、偏向ミラー3における光の主光線の出射位置P4と、が離れて位置している。具体的には、偏向ミラー3における光の主光線の出射位置P4が、第2レンズ群2の光源4側の焦点P3よりも、第2レンズ群2から遠い位置に配置されている。 As shown in FIG. 2, the focal point P3 on the light source 4 side of the second lens group 2 and the emission position P4 of the chief ray of light on the deflection mirror 3 are located apart. Specifically, the emission position P4 of the chief ray of light on the deflection mirror 3 is located farther from the second lens group 2 than the focal point P3 on the light source 4 side of the second lens group 2.

 これにより、第2レンズ群2から投射される複数の光束の主光線のそれぞれは、収束しながら進む。その結果、偏向ミラー3の振り角を比較的大きく確保しつつ、第2レンズ群2よりも小さいサイズの画像を投影できる。 As a result, each of the chief rays of the multiple light beams projected from the second lens group 2 travels while converging. As a result, it is possible to project an image smaller in size than the second lens group 2 while maintaining a relatively large swing angle of the deflection mirror 3.

 しかし、この構成例では、第2レンズ群2の出射面における各光束の主光線が通過する範囲が、2次結像面P2における画像サイズよりも大きくなるおそれがある。これにより、第2レンズ群2のサイズが大きくなり、投影光学系10の大型化を招くおそれがある。 However, in this configuration example, there is a risk that the range through which the chief rays of each light beam pass on the exit surface of the second lens group 2 may be larger than the image size on the secondary image plane P2. This may result in a larger size of the second lens group 2, which may lead to an increase in the size of the projection optical system 10.

[(2)本実施形態の概要]
 そこで、本技術は、第2レンズ群の光源側の焦点と、偏向ミラーにおける光の主光線の出射位置と、の位置関係を特定することにより、第2レンズ群から投射されたそれぞれの光束の主光線が、略平行状態になる投影光学系を提供する。
(2) Overview of this embodiment
Therefore, the present technology provides a projection optical system in which the chief rays of each light beam projected from the second lens group are approximately parallel by specifying the positional relationship between the focal point on the light source side of the second lens group and the emission position of the chief ray of light on the deflection mirror.

 具体的には、本技術は、少なくとも1つのレンズを有しており、光源から投射された光を、前記光源の像である1次結像点の位置に集光させる第1レンズ群と、前記第1レンズ群からの光を走査する偏向ミラーと、少なくとも1つのレンズを有しており、前記偏向ミラーからの光を、前記1次結像点の像である2次結像点の位置に結像させる第2レンズ群と、を備えており、前記第2レンズ群の前記光源側の焦点が、前記偏向ミラーにおける光の主光線の出射位置の近傍に位置する、投影光学系を提供する。 Specifically, this technology provides a projection optical system that includes a first lens group having at least one lens and focusing light projected from a light source at a position of a primary image point that is an image of the light source, a deflection mirror that scans the light from the first lens group, and a second lens group having at least one lens and focusing the light from the deflection mirror at a position of a secondary image point that is an image of the primary image point, the light source side focal point of the second lens group being located near the emission position of the chief ray of light on the deflection mirror.

 本技術の一実施形態に係る投影光学系10の構成例について、図3を参照しつつ説明する。図3は、本技術の一実施形態に係る投影光学系10の構成例を示す模式図である。 An example of the configuration of the projection optical system 10 according to one embodiment of the present technology will be described with reference to FIG. 3. FIG. 3 is a schematic diagram showing an example of the configuration of the projection optical system 10 according to one embodiment of the present technology.

 図3に示されるとおり、投影光学系10は、第1レンズ群12と、偏向ミラー3と、第2レンズ群2と、を備えている。なお、それぞれの構成要素に対して、上記で図1等を参照しつつ説明した内容については、再度の説明を省略する。 As shown in FIG. 3, the projection optical system 10 includes a first lens group 12, a deflection mirror 3, and a second lens group 2. Note that the contents of each component that were explained above with reference to FIG. 1 etc. will not be explained again.

 第1レンズ群12は、正レンズと負レンズとの組合せレンズを有することが好ましい。光源4からの光を第1レンズ群12が集光するとき、集光側のレンズに色収差を補正するための正レンズと負レンズとの組合せレンズを使用することにより、光源4の各波長の色収差を補正できる。色収差を補正するために、たとえば正レンズと負レンズとで異なるアッベ数のガラスレンズの組合せを用いることができる。 The first lens group 12 preferably has a combination lens of a positive lens and a negative lens. When the first lens group 12 collects light from the light source 4, the chromatic aberration of each wavelength of the light source 4 can be corrected by using a combination lens of a positive lens and a negative lens for correcting chromatic aberration on the collecting side lens. To correct chromatic aberration, for example, a combination of glass lenses with different Abbe numbers can be used for the positive and negative lenses.

 また、第1レンズ群12を、複数の正の単レンズのみから構成し、光源4と第1レンズ群12との間隔を調整することによって、軸上の色収差を補正するようにしてもよい。この場合、色収差補正用の組合せレンズを用いないため、コストを削減できる。この場合、第1レンズ群12のレンズはガラス製でなくてもよく、たとえばプラスチック製のレンズを用いるとさらにコスト削減効果が大きくなる。 Alternatively, the first lens group 12 may be composed of only multiple positive single lenses, and the on-axis chromatic aberration may be corrected by adjusting the distance between the light source 4 and the first lens group 12. In this case, costs can be reduced because a combination lens for correcting chromatic aberration is not used. In this case, the lenses in the first lens group 12 do not have to be made of glass; using plastic lenses, for example, would further reduce costs.

 第2レンズ群2は、正レンズと負レンズとの組合せレンズを有することが好ましい。少なくとも1組の正レンズと負レンズとの組合せレンズを用いることで、軸外で発生する倍率の色収差を補正できる。上記した第1レンズ群12の好ましい構成では、軸上の色収差を補正することは可能だが、軸外の画角全体に亘って色収差を補正することは困難であるため、第2レンズ群2で色収差を補正することが好ましい。第2レンズ群2に少なくとも1組の正レンズと負レンズとの組合せレンズを使用すると、光源4の各波長の色収差を補正できる。 The second lens group 2 preferably has a combination lens of a positive lens and a negative lens. By using at least one combination lens of a positive lens and a negative lens, chromatic aberration of magnification that occurs off-axis can be corrected. With the preferred configuration of the first lens group 12 described above, it is possible to correct axial chromatic aberration, but it is difficult to correct chromatic aberration over the entire off-axis angle of view, so it is preferable to correct chromatic aberration in the second lens group 2. By using at least one combination lens of a positive lens and a negative lens in the second lens group 2, chromatic aberration of each wavelength of the light source 4 can be corrected.

 また、第2レンズ群2は、少なくとも1面以上の自由曲面形状の透過面を有することが好ましい。第2レンズ群2に軸対称なレンズを用いた場合、2次元走査した画像は歪みが発生するおそれがある。自由曲面形状のレンズを用いることにより、この歪みが光学的に補正されて、良好な画像が得られる。 Furthermore, it is preferable that the second lens group 2 has at least one transmitting surface having a free-form shape. If an axisymmetric lens is used for the second lens group 2, there is a risk that distortion will occur in the two-dimensionally scanned image. By using a lens having a free-form shape, this distortion is optically corrected, and a good image can be obtained.

 また、第1レンズ群12内のレンズおよび第2レンズ群2内のレンズのうち、少なくとも1つのレンズを光軸に垂直な方向に動かすことによって、投影像を光軸に垂直な方向に調整するようにしてもよい。これにより、投影像を光軸に垂直な面内で移動させることができる。 Also, the projected image may be adjusted in a direction perpendicular to the optical axis by moving at least one of the lenses in the first lens group 12 and the second lens group 2 in a direction perpendicular to the optical axis. This allows the projected image to be moved in a plane perpendicular to the optical axis.

 光源4は、画像データに基づいて強度変調された光を出射する。光源4から投射された光は、レーザ光であることが好ましい。レーザ光は、高い光の輝度と一定の波長特性を持つため、網膜上に鮮明で明るい映像を投影するのに適している。レーザ光の特長として、高いコントラスト比、広色域、高い解像度などがある。 The light source 4 emits light whose intensity is modulated based on image data. The light projected from the light source 4 is preferably laser light. Laser light has high light brightness and consistent wavelength characteristics, making it suitable for projecting clear, bright images onto the retina. Laser light has features such as a high contrast ratio, a wide color gamut, and high resolution.

 この構成例では、第2レンズ群2の光源4側の焦点P3が、偏向ミラー3における光の主光線の出射位置P4の近傍に位置している。これにより、第2レンズ群2から投射されたそれぞれの光束の主光線Lが、略平行状態になる。略平行状態になったそれぞれの光束の主光線は、たとえば観察者の眼前に配置される接眼デバイス(図示省略)により集光されて、観察者の網膜に投射される。 In this configuration example, the focal point P3 on the light source 4 side of the second lens group 2 is located near the emission position P4 of the chief ray of light on the deflection mirror 3. As a result, the chief ray L of each light beam projected from the second lens group 2 becomes approximately parallel. The chief ray of each light beam that is now approximately parallel is focused by, for example, an eyepiece device (not shown) placed in front of the observer's eye, and projected onto the observer's retina.

 本技術によれば、第2レンズ群2から投射されたそれぞれの光束の主光線が略平行状態になるため、投影する画像のサイズが小さい場合でも、偏向ミラー3の振り角を大きく確保できる。そのため、偏向ミラー3の動作の安定化を図ることができる。なおかつ、第2レンズ群2から投射される複数の光束の主光線のそれぞれが収束しながら進む比較例(図2参照)に比べて、装置が小型化できる。つまり、偏向ミラーの動作の安定化と装置の小型化を両立させることができる。なお、この効果は、後述する他の実施形態においても同様に生じる。そのため、他の実施形態の説明においては、再度の記載を省略することがある。 With this technology, the chief rays of each light beam projected from the second lens group 2 become nearly parallel, so that a large swing angle of the deflection mirror 3 can be ensured even when the size of the projected image is small. This makes it possible to stabilize the operation of the deflection mirror 3. Furthermore, compared to the comparative example (see FIG. 2) in which the chief rays of the multiple light beams projected from the second lens group 2 each progress while converging, the device can be made more compact. In other words, it is possible to achieve both stabilization of the operation of the deflection mirror and miniaturization of the device. This effect also occurs in the other embodiments described below. Therefore, repeated description may be omitted in the explanation of the other embodiments.

[(3)主光線の通過領域]
 上述した比較例および本実施形態のそれぞれにおける光束の状態について、図4~図6を参照しつつ説明する。
[(3) Area through which the chief ray passes]
The state of the light beam in each of the comparative example and this embodiment will be described with reference to FIGS.

 図4は、図1に示される比較例における光束の状態を示す模式図である。図4Aは、第2レンズ群2から投射された映像光に含まれる複数の光束のうち、映像光の最も外側を通る光束の主光線の状態を示している。図4Aに示されるとおり、第2レンズ群2から投射されたそれぞれの光束の主光線は、拡がりながら進む。そして、それぞれの光束の主光線は、観察者の眼前に配置される接眼デバイス20により屈折し、眼球Eへと導かれる。 FIG. 4 is a schematic diagram showing the state of light beams in the comparative example shown in FIG. 1. FIG. 4A shows the state of the chief ray of the light beam that passes through the outermost part of the image light projected from the second lens group 2, among the multiple light beams contained in the image light projected from the second lens group 2. As shown in FIG. 4A, the chief ray of each light beam projected from the second lens group 2 spreads as it travels. The chief ray of each light beam is then refracted by the eyepiece device 20 placed in front of the observer's eye, and is guided to the eyeball E.

 図4Bは、第2レンズ群2の出射面におけるそれぞれの光束の主光線の通過領域A1を破線部で示している。第2レンズ群2の出射面では、破線部で示すそれぞれの光束の主光線の通過領域A1と、映像光の最も外側を通過する光束の広がりと、を合わせた領域が、それぞれの光束の通過領域となる。つまり、それぞれの光束の通過領域の長さは、破線部で示している主光線の通過領域の対角線の長さr1と、映像光の最も外側を通過する光束のビーム径r2との和となる。 In Figure 4B, the dashed line indicates the pass area A1 of the chief ray of each light beam on the exit surface of the second lens group 2. On the exit surface of the second lens group 2, the pass area of each light beam is the sum of the pass area A1 of the chief ray of each light beam shown in the dashed line and the spread of the light beam passing through the outermost part of the image light. In other words, the length of the pass area of each light beam is the sum of the diagonal length r1 of the pass area of the chief ray shown in the dashed line and the beam diameter r2 of the light beam passing through the outermost part of the image light.

 図4Cは、2次結像点(2次結像面)P2におけるそれぞれの光束の主光線の通過領域A2を破線部で示している。2次結像面P2においては、それぞれの光束は集光されている状態となる。したがって、それぞれの光束の主光線の通過領域A2の大きさが、投影光学系10が投影する画像サイズと略同一となる。 In FIG. 4C, the dashed line indicates the area A2 through which the chief ray of each light beam passes at the secondary image point (secondary image plane) P2. At the secondary image plane P2, each light beam is in a condensed state. Therefore, the size of the area A2 through which the chief ray of each light beam passes is approximately the same as the size of the image projected by the projection optical system 10.

 図4Aに示されるとおり、この比較例では、第2レンズ群2から投射された複数の光束の主光線のそれぞれは、拡がりながら進む。そのため、図4Bおよび図4Cに示されるとおり、第2レンズ群2の出射面におけるそれぞれの光束の主光線の通過領域A1は、2次結像点(2次結像面)P2におけるそれぞれの光束の主光線の通過領域A2よりも小さくなる。 As shown in Figure 4A, in this comparative example, each of the chief rays of the multiple light beams projected from the second lens group 2 expands as it travels. Therefore, as shown in Figures 4B and 4C, the passage area A1 of the chief ray of each light beam on the exit surface of the second lens group 2 is smaller than the passage area A2 of the chief ray of each light beam at the secondary image point (secondary image plane) P2.

 上述したように、通過領域A2の大きさが、投影光学系10が投影する画像サイズと略同一となる。投影する画像サイズが小さくなればなるほど、第2レンズ群2の出射面における通過領域A1のサイズが小さくなり、偏向ミラー3の振り角も小さくなる傾向にある。偏向ミラー3の振り角が小さくなることにより、偏向ミラー3の動作が不安定になるおそれがある。 As described above, the size of the passing area A2 is approximately the same as the size of the image projected by the projection optical system 10. As the projected image size becomes smaller, the size of the passing area A1 at the exit surface of the second lens group 2 becomes smaller, and the swing angle of the deflection mirror 3 also tends to become smaller. As the swing angle of the deflection mirror 3 becomes smaller, there is a risk that the operation of the deflection mirror 3 will become unstable.

 図5は、図2に示される比較例における光束の状態を示す模式図である。図5Aに示されるとおり、この比較例では、第2レンズ群2から投射された複数の光束の主光線のそれぞれは、収束しながら進む。そのため、投影する画像サイズが確定している場合、図5Bおよび図5Cに示されるとおり、第2レンズ群2の出射面におけるそれぞれの光束の主光線の通過領域A1は、2次結像点(2次結像面)P2におけるそれぞれの光束の主光線の通過領域A2よりも大きくなる。これにより、投影光学系10が大型化するおそれがある。 FIG. 5 is a schematic diagram showing the state of light beams in the comparative example shown in FIG. 2. As shown in FIG. 5A, in this comparative example, the chief rays of the multiple light beams projected from the second lens group 2 each travel while converging. Therefore, when the size of the image to be projected is fixed, as shown in FIGS. 5B and 5C, the passage area A1 of the chief ray of each light beam on the exit surface of the second lens group 2 is larger than the passage area A2 of the chief ray of each light beam at the secondary image point (secondary image plane) P2. This may result in the projection optical system 10 becoming larger.

 図6は、図3に示される本実施形態における光束の状態を示す模式図である。図6Aに示されるとおり、本実施形態では、第2レンズ群2から投射された複数の光束の主光線のそれぞれは、略平行状態となる。そのため、投影する画像サイズが確定している場合、図6Bおよび図6Cに示されるとおり、第2レンズ群2の出射面におけるそれぞれの光束の主光線の通過領域A1は、2次結像点(2次結像面)P2におけるそれぞれの光束の主光線の通過領域A2と略同一の大きさとなる。これにより、偏向ミラー3の動作の安定化と装置の小型化を両立させることができる。 FIG. 6 is a schematic diagram showing the state of the light beams in the present embodiment shown in FIG. 3. As shown in FIG. 6A, in this embodiment, the chief rays of the multiple light beams projected from the second lens group 2 are each approximately parallel. Therefore, when the size of the image to be projected is fixed, as shown in FIGS. 6B and 6C, the passage area A1 of the chief ray of each light beam on the exit surface of the second lens group 2 is approximately the same size as the passage area A2 of the chief ray of each light beam at the secondary image point (secondary image plane) P2. This makes it possible to achieve both stable operation of the deflection mirror 3 and compactness of the device.

[(4)網膜直描]
 本実施形態に係る投影光学系10は、たとえば網膜直描型の画像投影装置に用いられることができる。網膜直描型の画像投影装置は、マクスウェル視による画像投影装置とも呼ばれる。
[(4) Direct Retinal Imaging]
The projection optical system 10 according to this embodiment can be used, for example, in a retinal imaging type image projection device, which is also called an image projection device based on Maxwellian vision.

 瞳孔に入射した光が網膜に到達すると、網膜の内部にある視細胞が光を感知し、神経信号に変換する。この神経信号は、視神経を通じて脳に送られ、脳がその信号を解釈して、我々が見ている景色や物体を認識することができる。 When light enters the pupil and reaches the retina, photoreceptor cells inside the retina detect the light and convert it into nerve signals. These nerve signals are sent via the optic nerve to the brain, where the brain interprets them to help us recognize the scenes and objects we see.

 観察者に画像を観察させるために、網膜投影型の画像投影装置では、画像を観察者の網膜に投影して、この網膜上で結像させる。網膜上で結像させるために、観察者の眼前に接眼デバイスが配置されることが多い。図6Aに示されるように、第2レンズ群2から投射されたそれぞれの光束の主光線が略平行状態である場合、それぞれの光束の主光線は、接眼デバイスの焦点位置に屈折される。 In order to allow an observer to view an image, a retinal projection type image projector projects an image onto the observer's retina and forms an image on the retina. To form an image on the retina, an eyepiece device is often placed in front of the observer's eye. As shown in FIG. 6A, when the chief rays of each light beam projected from the second lens group 2 are approximately parallel, the chief rays of each light beam are refracted to the focal position of the eyepiece device.

 接眼デバイス20の例として、たとえば、レンズ、ハーフミラー、プリズム、光ファイバ、回折素子などが挙げられる。本実施形態では、接眼デバイス20は、コンタクトレンズ型デバイスでありうる。コンタクトレンズ型デバイスは、眼球の表面に直接装着する、薄い透明なレンズである。コンタクトレンズ型デバイスは、たとえば回折格子やホログラムレンズなどを有しており、光の回折や干渉などの原理を利用して、投影光学系10からの光を観察者の網膜に投射する。 Examples of the eyepiece device 20 include a lens, a half mirror, a prism, an optical fiber, and a diffraction element. In this embodiment, the eyepiece device 20 can be a contact lens type device. A contact lens type device is a thin, transparent lens that is attached directly to the surface of the eyeball. A contact lens type device has, for example, a diffraction grating or a hologram lens, and projects light from the projection optical system 10 onto the observer's retina by utilizing principles such as light diffraction and interference.

 特に、網膜投影型の画像投影装置では、モノを直接見る場合とは異なり、接眼デバイスによって観察者の網膜上に結像する。そのため、接眼デバイスの網膜側の焦点位置を水晶体の近傍に配置する必要がある。つまり、接眼デバイスの焦点距離を数mm程度と短くする必要がある。 In particular, unlike when viewing an object directly, retinal projection image projection devices form an image on the observer's retina using an eyepiece device. For this reason, the focal position on the retina side of the eyepiece device needs to be located near the crystalline lens. In other words, the focal length of the eyepiece device needs to be short, on the order of a few mm.

 この接眼デバイスについて、図7を参照しつつ説明する。図7は、本技術の一実施形態に係る接眼デバイス20の構成例を示す模式図である。 This eyepiece device will be described with reference to FIG. 7. FIG. 7 is a schematic diagram showing an example configuration of an eyepiece device 20 according to one embodiment of the present technology.

 図7に示されるとおり、第2レンズ群2から投射されたそれぞれの光束は、2次結像点P2で結像された後、拡がりながら接眼デバイス20に投射される。接眼デバイス20は、たとえばレンズの作用を持ち、それぞれの光束を瞳孔E1および網膜E2に導く。 As shown in FIG. 7, each light beam projected from the second lens group 2 is focused at a secondary image point P2, and then projected onto the eyepiece device 20 while expanding. The eyepiece device 20 acts, for example, as a lens, and guides each light beam to the pupil E1 and retina E2.

 このとき、接眼デバイス20の光源側の焦点が、2次結像点P2の位置に配置されることが好ましい。これにより、接眼デバイス20は、それぞれの光束を略平行状態で瞳孔E1に導くことができる。瞳孔E1に導かれたそれぞれの光束は、水晶体で屈折され、網膜E2上で結像される。なお、接眼デバイス20の焦点の位置は、2次結像点P2の位置と必ずしも一致していなくてもよく、多少のずれが生じていてもよい。 At this time, it is preferable that the focal point on the light source side of the eyepiece device 20 is located at the position of the secondary image point P2. This allows the eyepiece device 20 to guide each light beam to the pupil E1 in a substantially parallel state. Each light beam guided to the pupil E1 is refracted by the crystalline lens and forms an image on the retina E2. Note that the position of the focal point of the eyepiece device 20 does not necessarily have to coincide with the position of the secondary image point P2, and some deviation is acceptable.

 映像の解像度は、網膜上に結像されるそれぞれの光束の集光度合いで決まる。それぞれの光束の集光度合いを高めることにより、映像の解像度を高めることができる。この網膜上の集光度合いを高めるためには、眼球に投射するそれぞれの光束のビーム径(射出瞳)を大きくすることが好ましい。このビーム径を大きくするためには、開口数θを大きくすることが好ましい。 The resolution of an image is determined by the degree to which each light beam is focused on the retina. The resolution of an image can be increased by increasing the degree to which each light beam is focused. In order to increase the degree to which the light beam is focused on the retina, it is preferable to increase the beam diameter (exit pupil) of each light beam projected onto the eyeball. In order to increase this beam diameter, it is preferable to increase the numerical aperture θ.

 眼球に投射されるそれぞれの光束のビーム径は、第2レンズ群2から投射されたそれぞれの光束の開口数θと、接眼デバイス20の焦点距離で決定される。接眼レンズの焦点距離をfとすると、接眼デバイス20から投射された光束のビーム径は、おおよそ2fθとなる。 The beam diameter of each light beam projected onto the eyeball is determined by the numerical aperture θ of each light beam projected from the second lens group 2 and the focal length of the eyepiece device 20. If the focal length of the eyepiece lens is f, then the beam diameter of the light beam projected from the eyepiece device 20 is approximately 2fθ.

 上述したように、接眼デバイス20の網膜側の焦点位置を水晶体の近傍に配置する必要がある。そのため、接眼デバイス20がたとえばコンタクトレンズ型デバイスである場合、接眼デバイス20から水晶体までの距離が短くなるため、接眼デバイス20の焦点距離は必然的に小さくなる。 As mentioned above, the focal position on the retina side of the ocular device 20 needs to be located near the crystalline lens. Therefore, if the ocular device 20 is, for example, a contact lens type device, the distance from the ocular device 20 to the crystalline lens is short, and therefore the focal length of the ocular device 20 is inevitably short.

 ここで、接眼デバイス20の焦点距離と、接眼デバイス20が投射する光束の開口数θとの関係について、図8を参照しつつ説明する。図8は、本技術の一実施形態に係る接眼デバイス20の焦点距離f3と、接眼デバイス20が投射する光束の開口数θとの相関関係を示すグラフである。 Here, the relationship between the focal length of the eyepiece device 20 and the numerical aperture θ of the light beam projected by the eyepiece device 20 will be described with reference to FIG. 8. FIG. 8 is a graph showing the correlation between the focal length f3 of the eyepiece device 20 according to one embodiment of the present technology and the numerical aperture θ of the light beam projected by the eyepiece device 20.

 図8において、横軸は、接眼デバイス20の焦点距離f3を示す。縦軸は、接眼デバイス20が投射する光束の開口数θを示す。グラフの右側に示されている凡例は、接眼デバイス20が投射する光束のビーム径(射出瞳)を示す。 In FIG. 8, the horizontal axis indicates the focal length f3 of the eyepiece device 20. The vertical axis indicates the numerical aperture θ of the light beam projected by the eyepiece device 20. The legend on the right side of the graph indicates the beam diameter (exit pupil) of the light beam projected by the eyepiece device 20.

 ビーム径が0.15mm以下になると、映像の解像度が大きく低下する。そのため、ビーム径が0.15mm以上であることが好ましい。接眼デバイス20がコンタクトレンズ型デバイスである場合、その焦点距離が8mm程度となりうる。このとき、高解像度の映像を観察者に観察させるためには、開口数θが0.01以上である必要があることが、このグラフから読み取れる。 When the beam diameter is 0.15 mm or less, the image resolution drops significantly. Therefore, it is preferable that the beam diameter is 0.15 mm or more. When the eyepiece device 20 is a contact lens type device, its focal length can be about 8 mm. In this case, it can be seen from this graph that in order to allow the observer to view a high-resolution image, the numerical aperture θ needs to be 0.01 or more.

 開口数θを0.01以上にするためには、第2レンズ群2から投射されるそれぞれの光束のビーム径を大きくする必要がある。特に、第2レンズ群2から2次結像面P2までの光軸上の距離(投射距離)を長く設定する場合、高解像度の映像光を投射するためには、第2レンズ群2から投射されるそれぞれの光束のビーム径を大きくする必要がある。このことについて、図9を参照しつつ説明する。図9は、本技術の一実施形態に係る第2レンズ群2から2次結像面P2までの距離D2と、接眼デバイス20が投射する光束の開口数θとの相関関係を示すグラフである。 In order to set the numerical aperture θ to 0.01 or more, it is necessary to increase the beam diameter of each light beam projected from the second lens group 2. In particular, when the distance on the optical axis from the second lens group 2 to the secondary image plane P2 (projection distance) is set long, in order to project high-resolution image light, it is necessary to increase the beam diameter of each light beam projected from the second lens group 2. This will be explained with reference to FIG. 9. FIG. 9 is a graph showing the correlation between the distance D2 from the second lens group 2 to the secondary image plane P2 and the numerical aperture θ of the light beam projected by the eyepiece device 20 according to one embodiment of the present technology.

 図9において、横軸は、第2レンズ群2から2次結像面P2までの光軸上の距離(投射距離)D2を示す。縦軸は、接眼デバイス20が投射する光束の開口数θを示す。グラフの右側に示されている凡例は、第2レンズ群2の出射面における主光線の通過領域の最大値[mm]を示す。 In FIG. 9, the horizontal axis indicates the distance (projection distance) D2 on the optical axis from the second lens group 2 to the secondary image plane P2. The vertical axis indicates the numerical aperture θ of the light beam projected by the eyepiece device 20. The legend on the right side of the graph indicates the maximum value [mm] of the area through which the chief ray passes on the exit surface of the second lens group 2.

 本実施形態に係る投影光学系10は、たとえば腕時計型デバイスに内蔵されることができる。本実施形態に係る接眼デバイス20は、たとえばコンタクトレンズ型デバイスでありうる。そのため、この腕時計型デバイスを構成する第2レンズ群2から2次結像面P2までの光軸上の距離(投射距離)D2は、たとえば500mmを超える場合がある。さらに、観察者に観察させる画像サイズは、コンタクトレンズ型デバイスのサイズより小さくする必要がある。つまり、第2レンズ群2の出射面における主光線の通過領域は、コンタクトレンズ型デバイスのサイズより小さくする必要がある。具体例を挙げると、第2レンズ群2の出射面における主光線の通過領域の長さは、10mm以下にする必要がある。 The projection optical system 10 according to this embodiment can be built into, for example, a wristwatch-type device. The eyepiece device 20 according to this embodiment can be, for example, a contact lens-type device. Therefore, the distance (projection distance) D2 on the optical axis from the second lens group 2 constituting this wristwatch-type device to the secondary image plane P2 may exceed, for example, 500 mm. Furthermore, the size of the image observed by the observer needs to be smaller than the size of the contact lens-type device. In other words, the area through which the chief ray passes on the exit surface of the second lens group 2 needs to be smaller than the size of the contact lens-type device. As a specific example, the length of the area through which the chief ray passes on the exit surface of the second lens group 2 needs to be 10 mm or less.

 図9に示されるとおり、投射距離D2が500mmを超えると、第2レンズ群2の出射面における主光線の通過領域を10mm以下に抑えつつ、縦軸の開口数θを0.01以上にすることが難しくなる。したがって、観察者に高解像度の映像を観察させつつ、偏向ミラーの動作の安定化と装置の小型化を両立させるためには、第2レンズ群2の出射面から2次結像点P2までの光軸上の距離は、500mm以下であることが好ましい。 As shown in Figure 9, when the projection distance D2 exceeds 500 mm, it becomes difficult to keep the area through which the chief ray passes at the exit surface of the second lens group 2 to 10 mm or less while setting the numerical aperture θ on the vertical axis to 0.01 or more. Therefore, in order to achieve both stable operation of the deflection mirror and compactness of the device while allowing the observer to view a high-resolution image, it is preferable that the distance on the optical axis from the exit surface of the second lens group 2 to the secondary image point P2 be 500 mm or less.

[(5)シミュレーション]
 上述したように、本技術は、第2レンズ群2の光源4側の焦点と、偏向ミラー3における光の主光線の出射位置と、の位置関係を特定する。偏向ミラー3の好ましい配置位置を確認するために、発明者はシミュレーションを行った。まず、シミュレーションの前提条件を決定するために、第2レンズ群2から投射される光束の開口数θが0.010であり、投射距離が200mm以上500mm以下であるときの、第1レンズ群12および第2レンズ群2のそれぞれの焦点距離を近軸計算した。この計算結果について、図10を参照しつつ説明する。図10は、本技術の一実施形態に係る第1レンズ群12および第2レンズ群2のそれぞれの焦点距離を近軸計算したグラフである。
(5) Simulation
As described above, the present technology specifies the positional relationship between the focal point of the second lens group 2 on the light source 4 side and the emission position of the chief ray of light on the deflection mirror 3. In order to confirm the preferred arrangement position of the deflection mirror 3, the inventor performed a simulation. First, in order to determine the preconditions for the simulation, a paraxial calculation was performed on the focal lengths of the first lens group 12 and the second lens group 2 when the numerical aperture θ of the light beam projected from the second lens group 2 is 0.010 and the projection distance is 200 mm or more and 500 mm or less. The calculation result will be described with reference to FIG. 10. FIG. 10 is a graph showing the paraxial calculation of the focal lengths of the first lens group 12 and the second lens group 2 according to an embodiment of the present technology.

 図10において、横軸は、第1レンズ群12の焦点距離f1を示す。縦軸は、第2レンズ群2の焦点距離f2を示す。グラフの右側に示されている凡例は、投射距離[mm]である。 In FIG. 10, the horizontal axis indicates the focal length f1 of the first lens group 12. The vertical axis indicates the focal length f2 of the second lens group 2. The legend on the right side of the graph indicates the projection distance [mm].

 なお、このグラフでは、焦点距離f1の値が1.5から6.5まで示されているが、焦点距離f1の値を小さくする場合、第1レンズ群12を構成するそれぞれのレンズの曲率半径を小さくする必要がある。しかし、レンズの曲率半径が極端に小さくする場合、それぞれのレンズの加工が困難になる。レンズの加工を容易にするためには、第1レンズ群12の焦点距離f1は2.0mm以上であることが好ましい。 In this graph, the focal length f1 values range from 1.5 to 6.5. If the focal length f1 value is reduced, the radius of curvature of each lens that makes up the first lens group 12 must be reduced. However, if the radius of curvature of the lenses is made extremely small, it becomes difficult to process each lens. To facilitate lens processing, it is preferable that the focal length f1 of the first lens group 12 is 2.0 mm or greater.

 この近軸計算の結果に基づいて、シミュレーションの前提条件を以下の通りとした。 Based on the results of this paraxial calculation, the simulation prerequisites were set as follows:

 <前提条件>
 (a)第2レンズ群2の出射面から2次結像面P2までの距離D2:500mm
 (b)第2レンズ群2から投射される光束の開口数θ:0.01
 (c)第1レンズ群12の焦点距離f1:2.3mm
 (d)第2レンズ群2の焦点距離f2:22.0mm
 (e)2次結像面P2における主光線の通過領域の長さ:5mm(片側2.5mm) (f)第1レンズ群12および第2レンズ群2のそれぞれの焦点には収差が生じない
<Prerequisites>
(a) Distance D2 from the exit surface of the second lens group 2 to the secondary image plane P2: 500 mm
(b) Numerical aperture θ of the light beam projected from the second lens group 2: 0.01
(c) Focal length f1 of the first lens group 12: 2.3 mm
(d) Focal length f2 of the second lens group 2: 22.0 mm
(e) Length of the area through which the chief ray passes on the secondary image plane P2: 5 mm (2.5 mm on each side); (f) No aberration occurs at the focal points of the first lens group 12 and the second lens group 2.

 この前提条件に基づいたシミュレーション結果について、図11および図12を参照しつつ説明する。図11および図12は、本技術の一実施形態に係る投影光学系10のシミュレーション結果の一例を示すグラフである。 The simulation results based on this precondition will be described with reference to Figs. 11 and 12. Figs. 11 and 12 are graphs showing an example of the simulation results of the projection optical system 10 according to one embodiment of the present technology.

 図11において、横軸は、第2レンズ群2の光源側の焦点から、偏向ミラー3における光の主光線の出射位置までの距離D1を、第2レンズ群2の焦点距離f2で規格化した値である。偏向ミラー3から第2レンズ群2に向かう方向を正としている。縦軸は、偏向ミラー3の振り角α(片側)[deg]である。 In FIG. 11, the horizontal axis represents the distance D1 from the focal point on the light source side of the second lens group 2 to the emission position of the chief ray of light on the deflection mirror 3, normalized by the focal length f2 of the second lens group 2. The direction from the deflection mirror 3 toward the second lens group 2 is considered positive. The vertical axis represents the deflection angle α (one side) [deg] of the deflection mirror 3.

 横軸の値が正(0より大きい)の場合、偏向ミラー3が反射したそれぞれの光束の主光線は、第2レンズ群2から投射される際に拡散する方向に進む。この場合、前提条件(e)の長さ(5mm)を確保するためには、偏向ミラー3の振り角αを小さくする必要がある。 When the value on the horizontal axis is positive (greater than 0), the chief ray of each light beam reflected by the deflection mirror 3 travels in a divergent direction when projected from the second lens group 2. In this case, in order to ensure the length (5 mm) of prerequisite condition (e), it is necessary to reduce the swing angle α of the deflection mirror 3.

 一方、横軸の値が負(0より小さい)の場合、横軸の値が小さくなるほど、偏向ミラー3の振り角αの変化量(振り角αの傾き)が大きくなっている。これは、第2レンズ群2の光源側の焦点から、偏向ミラー3における光の主光線の出射位置までの距離の摂動に対して、投影する画像サイズの変化が大きいことを示している。 On the other hand, when the horizontal axis value is negative (less than 0), the smaller the horizontal axis value, the greater the change in the swing angle α of the deflection mirror 3 (the inclination of the swing angle α). This indicates that there is a large change in the projected image size relative to a perturbation in the distance from the focal point on the light source side of the second lens group 2 to the emission position of the chief ray of light on the deflection mirror 3.

 上述したように、偏向ミラー3の動作の安定化と装置の小型化を両立させるためには、第2レンズ群2から投射されるそれぞれの光束の主光線が略平行状態であることが好ましい。第2レンズ群2から投射されるそれぞれの光束の主光線が略平行状態であるためには、図3に示されるとおり、第2レンズ群2の光源4側の焦点P3と、偏向ミラー3における光の主光線の出射位置P4と、が一致していることが好ましい。つまり、図11において、横軸の値が0であることが好ましい。 As mentioned above, in order to achieve both stable operation of the deflection mirror 3 and compactness of the device, it is preferable that the chief rays of each light beam projected from the second lens group 2 are approximately parallel. In order for the chief rays of each light beam projected from the second lens group 2 to be approximately parallel, it is preferable that the focal point P3 on the light source 4 side of the second lens group 2 coincides with the emission position P4 of the chief ray of light on the deflection mirror 3, as shown in Figure 3. In other words, it is preferable that the value on the horizontal axis in Figure 11 is 0.

 ただし、第2レンズ群2の光源4側の焦点P3と、偏向ミラー3における光の主光線の出射位置P4と、が必ずしも一致していなくてもよい。第2レンズ群2の光源4側の焦点P3が、偏向ミラー3における光の主光線の出射位置P4の近傍に位置していてもよい。 However, the focal point P3 on the light source 4 side of the second lens group 2 and the emission position P4 of the chief ray of light on the deflection mirror 3 do not necessarily have to coincide. The focal point P3 on the light source 4 side of the second lens group 2 may be located near the emission position P4 of the chief ray of light on the deflection mirror 3.

 具体的には、図11に示されるとおり、偏向ミラー3から第2レンズ群2に向かう方向を正とするとき、第2レンズ群2の光源4側の焦点P3から、偏向ミラー3における光の主光線の出射位置P4までの距離D1が、第2レンズ群2の焦点距離f2に対して-1%以上2%以下であってもよい。この-1%以上2%以下の範囲に抑えることができれば、第2レンズ群2の光源4側の焦点P3と、偏向ミラー3における光の主光線の出射位置P4と、が一致している場合の偏向ミラー3の振り角から1度以内の変化に抑えることができる。これにより、第2レンズ群2から投射されるそれぞれの光束を略平行状態にすることができる。 Specifically, as shown in FIG. 11, when the direction from the deflection mirror 3 toward the second lens group 2 is defined as positive, the distance D1 from the focal point P3 of the second lens group 2 on the light source 4 side to the emission position P4 of the chief ray of light on the deflection mirror 3 may be -1% to 2% of the focal length f2 of the second lens group 2. If it can be kept within this range of -1% to 2%, it is possible to keep the change within 1 degree from the swing angle of the deflection mirror 3 when the focal point P3 of the second lens group 2 on the light source 4 side and the emission position P4 of the chief ray of light on the deflection mirror 3 are aligned. This makes it possible to make the respective light beams projected from the second lens group 2 approximately parallel.

 続いて、図12について説明する。図12において、横軸は、図11と同様に、第2レンズ群2の光源4側の焦点P3
から、偏向ミラー3における光の主光線の出射位置P4までの距離D1を、第2レンズ群2の焦点距離f2で規格化した値である。偏向ミラー3から第2レンズ群2に向かう方向を正としている。縦軸は、第2レンズ群2の出射面において、出射面の中心を基準としたときの、主光線の通過領域の長さの最大値Wを示す。
Next, FIG. 12 will be described. In FIG. 12, the horizontal axis represents the focal point P3 of the second lens group 2 on the light source 4 side, as in FIG.
It is a value obtained by normalizing a distance D1 from the deflection mirror 3 to an emission position P4 of the chief ray of light on the deflection mirror 3 by the focal length f2 of the second lens group 2. The direction from the deflection mirror 3 toward the second lens group 2 is defined as positive. The vertical axis indicates the maximum value W of the length of the area through which the chief ray passes on the emission surface of the second lens group 2 when the center of the emission surface is used as a reference.

 図12において、横軸の値が負(0より小さい)の場合、偏向ミラー3が反射したそれぞれの光束の主光線は、第2レンズ群2から投射される際に収束する方向に進む。この場合、前提条件とした画像の長さ(5mm)を確保するためには、第2レンズ群2の出射面における主光線の通過領域を大きくする必要がある。 In Figure 12, when the value on the horizontal axis is negative (less than 0), the chief ray of each light beam reflected by the deflection mirror 3 travels in a converging direction when projected from the second lens group 2. In this case, to ensure the assumed image length (5 mm), it is necessary to increase the area through which the chief ray passes on the exit surface of the second lens group 2.

 偏向ミラー3から第2レンズ群2に向かう方向を正とするとき、第2レンズ群2の光源4側の焦点P3から、偏向ミラー3における光の主光線の出射位置P4までの距離が、第2レンズ群2の焦点距離に対して-1%以上2%以下であることが好ましい。この-1%以上2%以下の範囲に抑えることができれば、縦軸の値が、第2レンズ群2の光源4側の焦点P3と、偏向ミラー3における光の主光線の出射位置P4と、が一致している状態から+1mm程度の大きさに抑えることができる。これにより、第2レンズ群2から投射されるそれぞれの光束の主光線を略平行状態にすることができる。 When the direction from the deflection mirror 3 toward the second lens group 2 is defined as positive, it is preferable that the distance from the focal point P3 on the light source 4 side of the second lens group 2 to the emission position P4 of the chief ray of light on the deflection mirror 3 is between -1% and 2% of the focal length of the second lens group 2. If it can be kept within this range of between -1% and 2%, the value on the vertical axis can be kept to about +1 mm from the state where the focal point P3 on the light source 4 side of the second lens group 2 and the emission position P4 of the chief ray of light on the deflection mirror 3 are aligned. This makes it possible to make the chief rays of each light beam projected from the second lens group 2 approximately parallel.

 続いて、第2レンズ群2の光源4側の焦点P3と、偏向ミラー3における光の主光線の出射位置P4と、が一致している状態における、第2レンズ群2の焦点距離f2と偏向ミラー3の振り角αとの相関関係について、図13を参照しつつ説明する。図13は、本技術の一実施形態に係る投影光学系10のシミュレーション結果の一例を示すグラフである。 Next, the correlation between the focal length f2 of the second lens group 2 and the swing angle α of the deflection mirror 3 when the focal point P3 on the light source 4 side of the second lens group 2 coincides with the emission position P4 of the chief ray of light on the deflection mirror 3 will be described with reference to FIG. 13. FIG. 13 is a graph showing an example of a simulation result of the projection optical system 10 according to an embodiment of the present technology.

 このシミュレーションの前提条件として、第2レンズ群2から投射される光束の開口数θを0.01とし、2次結像面P2における主光線の通過領域の長さを5mm(片側2.5mm)としている。 The assumptions for this simulation are that the numerical aperture θ of the light beam projected from the second lens group 2 is 0.01, and the length of the area through which the chief ray passes on the secondary image plane P2 is 5 mm (2.5 mm on each side).

 図13において、横軸は、第2レンズ群2の焦点距離f2[mm]である。縦軸は、偏向ミラー3の振り角α(片側)[deg]である。グラフの右側に示されている凡例は、投射距離[mm]を示す。 In FIG. 13, the horizontal axis is the focal length f2 [mm] of the second lens group 2. The vertical axis is the deflection angle α (one side) [deg] of the deflection mirror 3. The legend on the right side of the graph indicates the projection distance [mm].

 図13に示されるとおり、投射距離(200、300、400、500、600)が異なっても、グラフはほぼ同じ曲線を描いている。つまり、偏向ミラー3の振り角αは、投射距離にはほぼ影響されず、横軸に示す第2レンズ群2の焦点距離f2に影響されることがわかる。 As shown in Figure 13, even if the projection distance (200, 300, 400, 500, 600) is different, the graph draws almost the same curve. In other words, it can be seen that the swing angle α of the deflection mirror 3 is almost not affected by the projection distance, but is affected by the focal length f2 of the second lens group 2 shown on the horizontal axis.

 また、このシミュレーションでは、前提条件として第2レンズ群2から投射される光束の開口数θを0.01としたが、偏向ミラー3の振り角αは、この開口数θにも影響されない。つまり、偏向ミラー3の振り角αは、第2レンズ群2の焦点距離f2と、2次結像面P2での主光線の通過領域の長さに影響される。この例では、第2レンズ群2の焦点距離f2が24mm以下であれば、偏向ミラー3の振り角αが±3度以上となり、偏向ミラー3の動作が安定化する。 In addition, in this simulation, the numerical aperture θ of the light beam projected from the second lens group 2 is set to 0.01 as a prerequisite, but the swing angle α of the deflection mirror 3 is not affected by this numerical aperture θ. In other words, the swing angle α of the deflection mirror 3 is affected by the focal length f2 of the second lens group 2 and the length of the area through which the chief ray passes on the secondary image plane P2. In this example, if the focal length f2 of the second lens group 2 is 24 mm or less, the swing angle α of the deflection mirror 3 will be ±3 degrees or more, and the operation of the deflection mirror 3 will be stable.

 もちろん、接眼デバイス20の焦点距離や、必要とする画角などによって、2次結像面P2での主光線の通過領域の長さは変わる。しかし、第2レンズ群2の焦点距離f2が24mm以下であれば、偏向ミラー3の振り角αを、その動作に支障がない範囲に保つことが可能となる。 Of course, the length of the area through which the chief ray passes at the secondary image plane P2 will vary depending on the focal length of the eyepiece device 20 and the required angle of view. However, if the focal length f2 of the second lens group 2 is 24 mm or less, it is possible to keep the swing angle α of the deflection mirror 3 within a range that does not interfere with its operation.

 本技術の第1実施形態に係る投影光学系について説明した上記の内容は、技術的な矛盾が特にない限り、本技術の他の実施形態に適用できる。 The above description of the projection optical system according to the first embodiment of the present technology can be applied to other embodiments of the present technology, unless there is a particular technical inconsistency.

[2.本技術の第2実施形態(投影光学系の例2)]
 カラー映像を投影するために、光源が、第1波長帯域の出射光を投射する第1光源部と、第2波長帯域の出射光を投射する第2光源部と、第3波長帯域の出射光を投射する第3光源部と、を含んでよい。このことについて、図14を参照しつつ説明する。図14は、本技術の一実施形態に係る投影光学系10の構成例を示す模式図である。
[2. Second embodiment of the present technology (example 2 of the projection optical system)]
In order to project a color image, the light source may include a first light source unit that projects an emission light of a first wavelength band, a second light source unit that projects an emission light of a second wavelength band, and a third light source unit that projects an emission light of a third wavelength band. This will be described with reference to Fig. 14. Fig. 14 is a schematic diagram showing a configuration example of a projection optical system 10 according to an embodiment of the present technology.

 図14に示されるとおり、光源4が、第1波長帯域の出射光を投射する第1光源部41Rと、第2波長帯域の出射光を投射する第2光源部41Gと、第3波長帯域の出射光を投射する第3光源部41Bと、を含んでいてよい。なお、光源部の数は特に限定されない。 As shown in FIG. 14, the light source 4 may include a first light source unit 41R that projects emitted light in a first wavelength band, a second light source unit 41G that projects emitted light in a second wavelength band, and a third light source unit 41B that projects emitted light in a third wavelength band. Note that the number of light source units is not particularly limited.

 より具体的には、第1波長帯域が、赤色に対応する波長帯域であり、第2波長帯域が、緑色に対応する波長帯域であり、第3波長帯域が、青色に対応する波長帯域であってよい。これにより、画像投影装置100は、フルカラーの画像を観察者に視認させることができる。赤色に対応する波長帯域は、たとえば、約620~750nmでありうる。緑色に対応する波長帯域は、たとえば、約500~550nmでありうる。青色に対応する波長帯域は、たとえば、約430~500nmでありうる。 More specifically, the first wavelength band may be a wavelength band corresponding to red, the second wavelength band may be a wavelength band corresponding to green, and the third wavelength band may be a wavelength band corresponding to blue. This allows the image projection device 100 to allow the observer to view a full-color image. The wavelength band corresponding to red may be, for example, approximately 620 to 750 nm. The wavelength band corresponding to green may be, for example, approximately 500 to 550 nm. The wavelength band corresponding to blue may be, for example, approximately 430 to 500 nm.

 光源4は、たとえばレンズ42R,42G,42Bをさらに有する。レンズ42Rは、第1光源部41Rが投射する第1波長帯域の出射光を略平行状態にする。同様に、レンズ42Gは、第2光源部41Gが投射する第2波長帯域の出射光を略平行状態にする。レンズ42Bは、第3光源部41Bが投射する第3波長帯域の出射光を略平行状態にする。 The light source 4 further includes, for example, lenses 42R, 42G, and 42B. The lens 42R makes the emitted light of the first wavelength band projected by the first light source unit 41R approximately parallel. Similarly, the lens 42G makes the emitted light of the second wavelength band projected by the second light source unit 41G approximately parallel. The lens 42B makes the emitted light of the third wavelength band projected by the third light source unit 41B approximately parallel.

 本実施形態では、ミラー51とダイクロイックミラー52,53とを合波光学系として用いる。この合波光学系は、それぞれの波長帯域の出射光を同一光軸上に合波して、第1レンズ群12に出射する。 In this embodiment, mirror 51 and dichroic mirrors 52 and 53 are used as a multiplexing optical system. This multiplexing optical system multiplexes the emitted light of each wavelength band onto the same optical axis and emits it to the first lens group 12.

 ミラー51は、第1光源部41Rとレンズ42Rの光軸上に配置されている。ミラー51は、第1光源部41Rから投射される第1波長帯域の光を反射する。 The mirror 51 is disposed on the optical axis of the first light source unit 41R and the lens 42R. The mirror 51 reflects the light of the first wavelength band projected from the first light source unit 41R.

 ダイクロイックミラー52は、第2光源部41Gとレンズ42Gの光軸上に配置されている。ダイクロイックミラー52は、第1光源部41Rから投射される第1波長帯域の光を透過し、第2光源部41Gから投射される第2波長帯域の光を反射する。 The dichroic mirror 52 is disposed on the optical axis of the second light source unit 41G and the lens 42G. The dichroic mirror 52 transmits the light of the first wavelength band projected from the first light source unit 41R and reflects the light of the second wavelength band projected from the second light source unit 41G.

 ダイクロイックミラー53は、第3光源部41Bとレンズ42Bの光軸上に配置されている。ダイクロイックミラー53は、第1光源部41Rから投射される第1波長帯域の光を反射し、第2光源部41Gから投射される第2波長帯域の光を反射し、第3光源部41Bから投射される第3波長帯域の光を透過する。 The dichroic mirror 53 is disposed on the optical axis of the third light source unit 41B and the lens 42B. The dichroic mirror 53 reflects the light of the first wavelength band projected from the first light source unit 41R, reflects the light of the second wavelength band projected from the second light source unit 41G, and transmits the light of the third wavelength band projected from the third light source unit 41B.

 第1レンズ群12は、合波光学系からの略平行光を1次結像点P1の位置に集光させる。第2レンズ群2の光源4側の焦点P3が、偏向ミラー3における光の主光線の出射位置P4の近傍に位置している。レンズ21からの光は偏向ミラー3で2次元的に走査され、第2レンズ群2を通って2次結像面P2に集光される。 The first lens group 12 focuses the approximately parallel light from the combining optical system at the position of the primary image point P1. The focal point P3 on the light source 4 side of the second lens group 2 is located near the emission position P4 of the chief ray of light on the deflection mirror 3. The light from the lens 21 is scanned two-dimensionally by the deflection mirror 3, passes through the second lens group 2, and is focused on the secondary image plane P2.

 なお、合波光学系を構成する要素はこれに限定されない。たとえば、ダイクロイックプリズム、偏光ビームスプリッタ(Polarizing Beam Splitter:PBS)、偏光ビームコンバイナ(Polarization Beam Combiner:PBC)、ハーフミラー、干渉フィルタなどによって合波光学系が構成されていてもよい。 The elements that make up the combining optical system are not limited to these. For example, the combining optical system may be made up of a dichroic prism, a polarizing beam splitter (PBS), a polarizing beam combiner (PBC), a half mirror, an interference filter, etc.

 なお、カラー画像を投影するために、複数の波長帯域の光を出射する技術として、必ずしもこの構成に限定されることはない。たとえば、光源が、複数の波長帯域の光を出射する1つの光源部であってもよい。具体例を挙げると、レーザーダイオードのアレイを使用して、複数の波長帯域の光を1つのチップから発することができる。あるいは、液体またはガス中に異なる色の発光物質を導入し、それぞれを励起して光を発することで、複数の波長帯域の光を1つのチップから生成することもできる。 Note that the technology for emitting light in multiple wavelength bands to project a color image is not necessarily limited to this configuration. For example, the light source may be a single light source unit that emits light in multiple wavelength bands. As a specific example, a laser diode array can be used to emit light in multiple wavelength bands from a single chip. Alternatively, light in multiple wavelength bands can be generated from a single chip by introducing luminescent substances of different colors into a liquid or gas and exciting each of them to emit light.

 本技術の第2実施形態に係る投影光学系について説明した上記の内容は、技術的な矛盾が特にない限り、本技術の他の実施形態に適用できる。 The above description of the projection optical system according to the second embodiment of the present technology can be applied to other embodiments of the present technology, unless there is a particular technical contradiction.

[3.本技術の第3実施形態(画像投影装置の例)]
 本実施形態に係る画像投影装置について、図15を参照しつつ説明する。図15は、本技術の一実施形態に係る画像投影装置100の構成例を示す模式図である。
3. Third embodiment of the present technology (example of image projection device)
The image projection device according to this embodiment will be described with reference to Fig. 15. Fig. 15 is a schematic diagram showing an example of the configuration of an image projection device 100 according to an embodiment of the present technology.

 図15に示されるとおり、画像投影装置100は、投影光学系10と、観察者の眼前に配置される接眼デバイス20と、備えている。 As shown in FIG. 15, the image projection device 100 includes a projection optical system 10 and an eyepiece device 20 that is placed in front of the observer's eye.

 この構成例では、投影光学系10は、画像投影装置100の一例である腕時計型デバイスに内蔵されている。観察者は、腕時計型デバイス100が備えるディスプレイを介して、画像投影装置100が投影する画像を変更できる。 In this configuration example, the projection optical system 10 is built into a wristwatch-type device, which is an example of the image projection device 100. The observer can change the image projected by the image projection device 100 via a display provided in the wristwatch-type device 100.

 投影光学系10から投射されたそれぞれの光束は、2次結像点で結像された後、拡がりながら接眼デバイス20に投射される。接眼デバイス20は、投影光学系10からの光を観察者の網膜E1に投射する。 Each light beam projected from the projection optical system 10 is imaged at a secondary imaging point and then projected onto the eyepiece device 20 while expanding. The eyepiece device 20 projects the light from the projection optical system 10 onto the observer's retina E1.

 接眼デバイス20は、たとえば眼鏡型デバイスであってもよいが、コンタクトレンズ型デバイスであることが好ましい。眼鏡型デバイスは、個々の顔の形状によって合わせる必要がある。一方で、コンタクトレンズ型デバイスはその必要がなく、快適な装着感やフィット感を万人に与えることができる。 The eyepiece device 20 may be, for example, a glasses-type device, but is preferably a contact lens-type device. Glasses-type devices need to be adapted to the shape of each individual's face. On the other hand, contact lens-type devices do not require this, and can provide a comfortable fit and sensation to everyone.

 また、コンタクトレンズ型の接眼デバイス20は、レンズを目の上に直接装着するため、光をより直接的に網膜に投影することができる。一方、眼鏡型の場合、フレームやレンズの厚みなどが干渉する可能性があり、光の透過に制約が生じることがある。 In addition, the contact lens type eyepiece device 20 has lenses that are worn directly on the eye, so it can project light more directly onto the retina. On the other hand, in the case of glasses type devices, there is a possibility that the frame and lens thickness may interfere, resulting in restrictions on light transmission.

 なお、接眼デバイス20が眼鏡型デバイスであるとき、接眼デバイス20は、たとえば、ハーフミラー、プリズム、レンズ、光ファイバ、回折素子などを有していてよい。特に、接眼デバイス20、たとえば、ホログラフィック光学素子、フレネルレンズ、反射型回折格子、透過型回折格子などの回折素子を有していてよい。回折素子は、光の回折効果を利用して、光を拡散させたり収束させたりすることができる。回折素子を有していることにより、たとえば、接眼デバイス20を簡素化することができる。レンズアレイなど、複雑な光学構成を持つ他の光学素子に比べて、回折素子はシンプルでコンパクトなデバイス設計を実現することができる。 When the eyepiece device 20 is a glasses-type device, the eyepiece device 20 may have, for example, a half mirror, a prism, a lens, an optical fiber, a diffraction element, etc. In particular, the eyepiece device 20 may have a diffraction element, such as a holographic optical element, a Fresnel lens, a reflective diffraction grating, or a transmissive diffraction grating. A diffraction element can diffuse or converge light by utilizing the diffraction effect of light. By having a diffraction element, for example, the eyepiece device 20 can be simplified. Compared to other optical elements with complex optical configurations, such as lens arrays, a diffraction element can realize a simple and compact device design.

 本実施形態に係る画像投影装置100の構成例について図16を参照しつつ説明する。図16は、本技術の一実施形態に係る画像投影装置100の構成例を示す模式図である。 An example of the configuration of the image projection device 100 according to this embodiment will be described with reference to FIG. 16. FIG. 16 is a schematic diagram showing an example of the configuration of the image projection device 100 according to one embodiment of the present technology.

 図16に示されるとおり、画像投影装置100は、少なくとも投影光学系10と、光源4と、制御部30と、を備えている。 As shown in FIG. 16, the image projection device 100 includes at least a projection optical system 10, a light source 4, and a control unit 30.

 投影光学系10は、第1レンズ群12と、偏向ミラー3と、第2レンズ群2と、を備えている。 The projection optical system 10 includes a first lens group 12, a deflection mirror 3, and a second lens group 2.

 第1レンズ群12は、少なくとも1つのレンズを有しており、光源4から投射された光を、光源4の像である1次結像点P1の位置に集光させる。 The first lens group 12 has at least one lens and focuses the light projected from the light source 4 at the position of the primary image point P1, which is the image of the light source 4.

 偏向ミラー3は、第1レンズ群12からの光を走査する。 The deflection mirror 3 scans the light from the first lens group 12.

 第2レンズ群2は、少なくとも1つのレンズ(たとえばレンズ21)を有しており、偏向ミラー3からの光を、1次結像点P1の像である2次結像点P2の位置に結像させる。 The second lens group 2 has at least one lens (e.g., lens 21) and focuses the light from the deflection mirror 3 at the position of the secondary image point P2, which is an image of the primary image point P1.

 このとき、第2レンズ群2の光源4側の焦点が、偏向ミラー3における光の主光線の出射位置の近傍に位置している。 At this time, the focal point of the second lens group 2 on the light source 4 side is located near the emission position of the chief ray of light on the deflection mirror 3.

 制御部30は、光源制御部31と、走査制御部32と、を有している。光源制御部31は、画像データに基づいて光源4の発光を制御する。走査制御部32は、画像データに基づいて偏向ミラー3による走査方向および走査タイミングを制御する。制御部30として、たとえばマイクロコントローラ、ドライバ集積回路(Integrated Circuit:IC)、信号生成回路などを利用することができる。 The control unit 30 has a light source control unit 31 and a scanning control unit 32. The light source control unit 31 controls the light emission of the light source 4 based on image data. The scanning control unit 32 controls the scanning direction and scanning timing of the deflection mirror 3 based on image data. For example, a microcontroller, a driver integrated circuit (IC), a signal generation circuit, etc. can be used as the control unit 30.

 なお、投影光学系10を内蔵する画像投影装置100としては、図16に示される腕時計型デバイスに限定されない。 Note that the image projection device 100 incorporating the projection optical system 10 is not limited to the wristwatch type device shown in FIG. 16.

 本技術の第3実施形態に係る画像投影装置について説明した上記の内容は、技術的な矛盾が特にない限り、本技術の他の実施形態に適用できる。 The above description of the image projection device according to the third embodiment of the present technology can be applied to other embodiments of the present technology, unless there is a particular technical inconsistency.

[4.本技術の第4実施形態(接眼デバイスの例)]
 図15等に示されるとおり、本技術は、観察者の眼前に配置されており、投影光学系10からの光を観察者の網膜に投射する接眼デバイス20を提供する。
[4. Fourth embodiment of the present technology (example of eyepiece device)]
As shown in FIG. 15 etc., the present technology provides an eyepiece device 20 that is placed in front of the observer's eye and projects light from a projection optical system 10 onto the observer's retina.

 接眼デバイス20は、たとえば眼鏡型デバイスであってもよいが、コンタクトレンズ型デバイスであることが好ましい。眼鏡型デバイスは、個々の顔の形状によって合わせる必要がある。一方で、コンタクトレンズ型デバイスはその必要がなく、快適な装着感やフィット感を万人に与えることができる。 The eyepiece device 20 may be, for example, a glasses-type device, but is preferably a contact lens-type device. Glasses-type devices need to be adapted to the shape of each individual's face. On the other hand, contact lens-type devices do not require this, and can provide a comfortable fit and sensation to everyone.

 また、コンタクトレンズ型の接眼デバイス20は、レンズを目の上に直接装着するため、光をより直接的に網膜に投影することができる。一方、眼鏡型の場合、フレームやレンズの厚みなどが干渉する可能性があり、光の透過に制約が生じることがある。 In addition, the contact lens type eyepiece device 20 has lenses that are worn directly on the eye, so it can project light more directly onto the retina. On the other hand, in the case of glasses type devices, there is a possibility that the frame and lens thickness may interfere, resulting in restrictions on light transmission.

 なお、接眼デバイス20が眼鏡型デバイスであるとき、接眼デバイス20は、たとえば、ハーフミラー、プリズム、レンズ、光ファイバ、回折素子などを有していてよい。特に、接眼デバイス20、たとえば、ホログラフィック光学素子、フレネルレンズ、反射型回折格子、透過型回折格子などの回折素子を有していてよい。回折素子は、光の回折効果を利用して、光を拡散させたり収束させたりすることができる。回折素子を有していることにより、たとえば、接眼デバイス20を簡素化することができる。レンズアレイなど、複雑な光学構成を持つ他の光学素子に比べて、回折素子はシンプルでコンパクトなデバイス設計を実現することができる。 When the eyepiece device 20 is a glasses-type device, the eyepiece device 20 may have, for example, a half mirror, a prism, a lens, an optical fiber, a diffraction element, etc. In particular, the eyepiece device 20 may have a diffraction element, such as a holographic optical element, a Fresnel lens, a reflective diffraction grating, or a transmissive diffraction grating. A diffraction element can diffuse or converge light by utilizing the diffraction effect of light. By having a diffraction element, for example, the eyepiece device 20 can be simplified. Compared to other optical elements with complex optical configurations, such as lens arrays, a diffraction element can realize a simple and compact device design.

 図16等に示されるとおり、この接眼デバイス20に光を投射する投影光学系10は、第1レンズ群12と、偏向ミラー3と、第2レンズ群2と、を備えている。 As shown in FIG. 16 etc., the projection optical system 10 that projects light onto this eyepiece device 20 includes a first lens group 12, a deflection mirror 3, and a second lens group 2.

 第1レンズ群12は、少なくとも1つのレンズを有しており、光源4から投射された光を、光源4の像である1次結像点P1の位置に集光させる。 The first lens group 12 has at least one lens and focuses the light projected from the light source 4 at the position of the primary image point P1, which is the image of the light source 4.

 偏向ミラー3は、第1レンズ群12からの光を走査する。 The deflection mirror 3 scans the light from the first lens group 12.

 第2レンズ群2は、少なくとも1つのレンズ(たとえばレンズ21)を有しており、偏向ミラー3からの光を、1次結像点P1の像である2次結像点P2の位置に結像させる。 The second lens group 2 has at least one lens (e.g., lens 21) and focuses the light from the deflection mirror 3 at the position of the secondary image point P2, which is an image of the primary image point P1.

 このとき、第2レンズ群2の光源4側の焦点が、偏向ミラー3における光の主光線の出射位置の近傍に位置している。 At this time, the focal point of the second lens group 2 on the light source 4 side is located near the emission position of the chief ray of light on the deflection mirror 3.

 本技術の第4実施形態に係る接眼デバイスについて説明した上記の内容は、技術的な矛盾が特にない限り、本技術の他の実施形態に適用できる。 The above description of the eyepiece device according to the fourth embodiment of the present technology can be applied to other embodiments of the present technology, unless there is a particular technical inconsistency.

 なお、本技術に係る実施形態は、上述したそれぞれの実施形態に限定されるものではなく、本技術の要旨を逸脱しない範囲において種々の変更が可能である。それぞれの実施形態において記載した具体的な数値、形状、材料(組成を含む)等は一例であって、これらに限定されるものではない。 Note that the embodiments of this technology are not limited to the above-mentioned embodiments, and various modifications are possible without departing from the spirit of this technology. The specific values, shapes, materials (including compositions), etc. described in each embodiment are merely examples, and are not intended to be limiting.

 また、本技術は、以下のような構成をとることもできる。
[1]
 少なくとも1つのレンズを有しており、光源から投射された光を、前記光源の像である1次結像点の位置に集光させる第1レンズ群と、
 前記第1レンズ群からの光を走査する偏向ミラーと、
 少なくとも1つのレンズを有しており、前記偏向ミラーからの光を、前記1次結像点の像である2次結像点の位置に結像させる第2レンズ群と、を備えており、
 前記第2レンズ群の前記光源側の焦点が、前記偏向ミラーにおける光の主光線の出射位置の近傍に位置する、投影光学系。
[2]
 前記偏向ミラーから前記第2レンズ群に向かう方向を正とするとき、
 前記第2レンズ群の前記光源側の焦点から、前記偏向ミラーにおける光の出射位置までの距離が、前記第2レンズ群の焦点距離に対して-1%以上2%以下である、
 [1]に記載の投影光学系。
[3]
 前記第1レンズ群の焦点距離が2.0mm以上である、
 [1]または[2]に記載の投影光学系。
[4]
 前記第2レンズ群の焦点距離が24mm以下である、
 [1]から[3]のいずれか一つに記載の投影光学系。
[5]
 前記第2レンズ群の出射面から前記2次結像点までの光軸上の距離が、500mm以下である、
 [1]から[4]のいずれか一つに記載の投影光学系。
[6]
 前記第2レンズ群から投射されたそれぞれの光束の主光線が、略平行状態である、
 [1]から[5]のいずれか一つに記載の投影光学系。
[7]
 前記第1レンズ群が、正レンズと負レンズとの組合せレンズを有する、
 [1]から[6]のいずれか一つに記載の投影光学系。
[8]
 前記第2レンズ群が、正レンズと負レンズとの組合せレンズを有する、
 [1]から[7]のいずれか一つに記載の投影光学系。
[9]
 前記光源から投射された光が、レーザ光である、
 [1]から[8]のいずれか一つに記載の投影光学系。
[10]
 前記光源が、
 第1波長帯域の出射光を投射する第1光源部と、
 第2波長帯域の出射光を投射する第2光源部と、
 第3波長帯域の出射光を投射する第3光源部と、を含む、
 [1]から[9]のいずれか一つに記載の投影光学系。
[11]
 前記第1波長帯域が、赤色に対応する波長帯域であり、
 前記第2波長帯域が、緑色に対応する波長帯域であり、
 前記第3波長帯域が、青色に対応する波長帯域である、
 [10]に記載の投影光学系。
[12]
 前記光源が、複数の波長帯域の光を出射する1つの光源部である、
 [1]から[9]のいずれか一つに記載の投影光学系。
[13]
 投影光学系と、
 観察者の眼前に配置される接眼デバイスと、備えており、
 前記投影光学系が、
 少なくとも1つのレンズを有しており、光源から投射された光を、前記光源の像である1次結像点の位置に集光させる第1レンズ群と、
 前記第1レンズ群からの光を走査する偏向ミラーと、
 少なくとも1つのレンズを有しており、前記偏向ミラーからの光を、前記1次結像点の像である2次結像点の位置に結像させる第2レンズ群と、を備えており、
 前記第2レンズ群の前記光源側の焦点が、前記偏向ミラーにおける光の主光線の出射位置の近傍に位置しており、
 前記接眼デバイスが、前記投影光学系からの光を前記観察者の網膜に投射する、画像投影装置。
[14]
 前記接眼デバイスの光源側の焦点が、前記2次結像点の位置に配置される、
 [13]に記載の画像投影装置。
[15]
 前記接眼デバイスが、コンタクトレンズ型デバイスである、
 [13]または[14]に記載の画像投影装置。
[16]
 観察者の眼前に配置されており、投影光学系からの光を前記観察者の網膜に投射する接眼デバイスであって、
 前記投影光学系が、
 少なくとも1つのレンズを有しており、光源から投射された光を、前記光源の像である1次結像点の位置に集光させる第1レンズ群と、
 前記第1レンズ群からの光を走査する偏向ミラーと、
 少なくとも1つのレンズを有しており、前記偏向ミラーからの光を、前記1次結像点の像である2次結像点の位置に結像させる第2レンズ群と、を備えており、
 前記第2レンズ群の前記光源側の焦点が、前記偏向ミラーにおける光の主光線の出射位置の近傍に位置する、接眼デバイス。
The present technology can also be configured as follows.
[1]
a first lens group having at least one lens and configured to focus light projected from a light source at a position of a primary image point which is an image of the light source;
a deflection mirror that scans the light from the first lens group;
a second lens group having at least one lens and configured to focus the light from the deflection mirror at a secondary image point which is an image of the primary image point;
a focal point of the second lens group on the light source side is located near an emission position of a chief ray of light from the deflection mirror.
[2]
When the direction from the deflection mirror toward the second lens group is defined as positive,
a distance from a focal point of the second lens group on the light source side to a light emission position on the deflection mirror is equal to or greater than −1% and equal to or less than 2% of a focal length of the second lens group;
The projection optical system according to [1].
[3]
The focal length of the first lens group is 2.0 mm or more.
The projection optical system according to any one of claims 1 to 2.
[4]
The focal length of the second lens group is 24 mm or less.
The projection optical system according to any one of [1] to [3].
[5]
a distance on the optical axis from the exit surface of the second lens group to the secondary image point is 500 mm or less;
The projection optical system according to any one of [1] to [4].
[6]
The chief rays of the respective light beams projected from the second lens group are substantially parallel.
The projection optical system according to any one of [1] to [5].
[7]
the first lens group has a combination of a positive lens and a negative lens;
The projection optical system according to any one of [1] to [6].
[8]
the second lens group has a combination of a positive lens and a negative lens;
The projection optical system according to any one of [1] to [7].
[9]
The light projected from the light source is a laser light.
The projection optical system according to any one of [1] to [8].
[10]
The light source is
A first light source unit that projects light in a first wavelength band;
A second light source unit that projects light in a second wavelength band;
a third light source unit that projects emission light in a third wavelength band,
The projection optical system according to any one of [1] to [9].
[11]
the first wavelength band is a wavelength band corresponding to red,
the second wavelength band is a wavelength band corresponding to green,
The third wavelength band is a wavelength band corresponding to blue.
The projection optical system according to [10].
[12]
The light source is a single light source unit that emits light of multiple wavelength bands.
The projection optical system according to any one of [1] to [9].
[13]
A projection optical system;
an eyepiece device disposed in front of an observer's eye,
The projection optical system comprises:
a first lens group having at least one lens and configured to focus light projected from a light source onto a position of a primary image point which is an image of the light source;
a deflection mirror that scans the light from the first lens group;
a second lens group having at least one lens and configured to focus the light from the deflection mirror at a secondary image point which is an image of the primary image point;
a focal point of the second lens group on the light source side is located in the vicinity of an emission position of a chief ray of light on the deflection mirror,
An image projection apparatus, wherein the eyepiece device projects light from the projection optical system onto the observer's retina.
[14]
A focal point on the light source side of the eyepiece device is disposed at the position of the secondary image point.
The image projection device according to [13].
[15]
The ocular device is a contact lens type device.
The image projection device according to [13] or [14].
[16]
An eyepiece device disposed in front of an eye of an observer and projects light from a projection optical system onto a retina of the observer,
The projection optical system comprises:
a first lens group having at least one lens and configured to focus light projected from a light source onto a position of a primary image point which is an image of the light source;
a deflection mirror that scans the light from the first lens group;
a second lens group having at least one lens and configured to focus the light from the deflection mirror at a secondary image point which is an image of the primary image point;
An eyepiece device, wherein the focal point of the second lens group on the light source side is located near the emission position of the chief ray of light on the deflection mirror.

 100 画像投影装置
 10 投影光学系
 1 第1レンズ群
 2 第2レンズ群
 3 偏向ミラー
 4 光源
 41R 第1光源部
 41G 第2光源部
 41B 第3光源部
 20 接眼デバイス
 30 制御部
 31 光源制御部
 32 走査制御部
 P1 1次結像点
 P2 2次結像点
 P3 第2レンズ群の光源側の焦点
 P4 偏向ミラーにおける主光線の出射位置
 A1 第2レンズ群の出射面における主光線の通過領域
 A2 2次結像面における主光線の通過領域
 θ 開口数
 α 偏向ミラーの振り角
 f1 第1レンズ群の焦点距離
 f2 第2レンズ群の焦点距離
 f3 接眼デバイスの焦点距離
 E 眼球
 E1 瞳孔
 E2 網膜
100 Image projection device 10 Projection optical system 1 First lens group 2 Second lens group 3 Deflection mirror 4 Light source 41R First light source section 41G Second light source section 41B Third light source section 20 Eyepiece device 30 Control section 31 Light source control section 32 Scanning control section P1 Primary image point P2 Secondary image point P3 Focus of second lens group on the light source side P4 Emergence position of chief ray on deflection mirror A1 Passage area of chief ray on exit surface of second lens group A2 Passage area of chief ray on secondary image surface θ Numerical aperture α Swing angle of deflection mirror f1 Focal length of first lens group f2 Focal length of second lens group f3 Focal length of eyepiece device E Eyeball E1 Pupil E2 Retina

Claims (15)

 少なくとも1つのレンズを有しており、光源から投射された光を、前記光源の像である1次結像点の位置に集光させる第1レンズ群と、
 前記第1レンズ群からの光を走査する偏向ミラーと、
 少なくとも1つのレンズを有しており、前記偏向ミラーからの光を、前記1次結像点の像である2次結像点の位置に結像させる第2レンズ群と、を備えており、
 前記第2レンズ群の前記光源側の焦点が、前記偏向ミラーにおける光の主光線の出射位置の近傍に位置する、投影光学系。
a first lens group having at least one lens and configured to focus light projected from a light source onto a position of a primary image point which is an image of the light source;
a deflection mirror that scans the light from the first lens group;
a second lens group having at least one lens and configured to focus the light from the deflection mirror at a secondary image point which is an image of the primary image point;
a focal point of the second lens group on the light source side is located near an emission position of a chief ray of light from the deflection mirror.
 前記偏向ミラーから前記第2レンズ群に向かう方向を正とするとき、
 前記第2レンズ群の前記光源側の焦点から、前記偏向ミラーにおける光の出射位置までの距離が、前記第2レンズ群の焦点距離に対して-1%以上2%以下である、
 請求項1に記載の投影光学系。
When the direction from the deflection mirror toward the second lens group is defined as positive,
a distance from a focal point of the second lens group on the light source side to a light emission position on the deflection mirror is equal to or greater than −1% and equal to or less than 2% of a focal length of the second lens group;
The projection optical system according to claim 1 .
 前記第1レンズ群の焦点距離が2.0mm以上である、
 請求項1に記載の投影光学系。
The focal length of the first lens group is 2.0 mm or more.
The projection optical system according to claim 1 .
 前記第2レンズ群の焦点距離が24mm以下である、
 請求項1に記載の投影光学系。
The focal length of the second lens group is 24 mm or less.
The projection optical system according to claim 1 .
 前記第2レンズ群の出射面から前記2次結像点までの光軸上の距離が、500mm以下である、
 請求項1に記載の投影光学系。
a distance on the optical axis from the exit surface of the second lens group to the secondary image point is 500 mm or less;
The projection optical system according to claim 1 .
 前記第2レンズ群から投射されたそれぞれの光束の主光線が、略平行状態である、
 請求項1に記載の投影光学系。
The chief rays of the respective light beams projected from the second lens group are substantially parallel.
The projection optical system according to claim 1 .
 前記第1レンズ群が、正レンズと負レンズとの組合せレンズを有する、
 請求項1に記載の投影光学系。
the first lens group has a combination of a positive lens and a negative lens;
The projection optical system according to claim 1 .
 前記第2レンズ群が、正レンズと負レンズとの組合せレンズを有する、
 請求項1に記載の投影光学系。
the second lens group has a combination of a positive lens and a negative lens;
The projection optical system according to claim 1 .
 前記光源から投射された光が、レーザ光である、
 請求項1に記載の投影光学系。
The light projected from the light source is a laser light.
The projection optical system according to claim 1 .
 前記光源が、
 第1波長帯域の出射光を投射する第1光源部と、
 第2波長帯域の出射光を投射する第2光源部と、
 第3波長帯域の出射光を投射する第3光源部と、を含む、
 請求項1に記載の投影光学系。
The light source is
A first light source unit that projects light in a first wavelength band;
A second light source unit that projects light in a second wavelength band;
a third light source unit that projects emission light in a third wavelength band,
The projection optical system according to claim 1 .
 前記第1波長帯域が、赤色に対応する波長帯域であり、
 前記第2波長帯域が、緑色に対応する波長帯域であり、
 前記第3波長帯域が、青色に対応する波長帯域である、
 請求項10に記載の投影光学系。
the first wavelength band is a wavelength band corresponding to red,
the second wavelength band is a wavelength band corresponding to green,
The third wavelength band is a wavelength band corresponding to blue.
The projection optical system according to claim 10.
 投影光学系と、
 観察者の眼前に配置される接眼デバイスと、備えており、
 前記投影光学系が、
 少なくとも1つのレンズを有しており、光源から投射された光を、前記光源の像である1次結像点の位置に集光させる第1レンズ群と、
 前記第1レンズ群からの光を走査する偏向ミラーと、
 少なくとも1つのレンズを有しており、前記偏向ミラーからの光を、前記1次結像点の像である2次結像点の位置に結像させる第2レンズ群と、を備えており、
 前記第2レンズ群の前記光源側の焦点が、前記偏向ミラーにおける光の主光線の出射位置の近傍に位置しており、
 前記接眼デバイスが、前記投影光学系からの光を前記観察者の網膜に投射する、画像投影装置。
A projection optical system;
an eyepiece device disposed in front of an observer's eye,
The projection optical system comprises:
a first lens group having at least one lens and configured to focus light projected from a light source onto a position of a primary image point which is an image of the light source;
a deflection mirror that scans the light from the first lens group;
a second lens group having at least one lens and configured to focus the light from the deflection mirror at a secondary image point which is an image of the primary image point;
a focal point of the second lens group on the light source side is located in the vicinity of an emission position of a chief ray of light on the deflection mirror,
An image projection apparatus, wherein the eyepiece device projects light from the projection optical system onto the observer's retina.
 前記接眼デバイスの光源側の焦点が、前記2次結像点の位置に配置される、
 請求項12に記載の画像投影装置。
A focal point on the light source side of the eyepiece device is disposed at the position of the secondary image point.
The image projection device according to claim 12.
 前記接眼デバイスが、コンタクトレンズ型デバイスである、
 請求項12に記載の画像投影装置。
The ocular device is a contact lens type device.
The image projection device according to claim 12.
 観察者の眼前に配置されており、投影光学系からの光を前記観察者の網膜に投射する接眼デバイスであって、
 前記投影光学系が、
 少なくとも1つのレンズを有しており、光源から投射された光を、前記光源の像である1次結像点の位置に集光させる第1レンズ群と、
 前記第1レンズ群からの光を走査する偏向ミラーと、
 少なくとも1つのレンズを有しており、前記偏向ミラーからの光を、前記1次結像点の像である2次結像点の位置に結像させる第2レンズ群と、を備えており、
 前記第2レンズ群の前記光源側の焦点が、前記偏向ミラーにおける光の主光線の出射位置の近傍に位置する、接眼デバイス。
An eyepiece device disposed in front of an eye of an observer and projects light from a projection optical system onto a retina of the observer,
The projection optical system comprises:
a first lens group having at least one lens and configured to focus light projected from a light source onto a position of a primary image point which is an image of the light source;
a deflection mirror that scans the light from the first lens group;
a second lens group having at least one lens and configured to focus the light from the deflection mirror at a secondary image point which is an image of the primary image point;
An eyepiece device, wherein the focal point of the second lens group on the light source side is located near the emission position of the chief ray of light on the deflection mirror.
PCT/JP2024/031128 2023-09-14 2024-08-30 Projection optical system, image projection device, and eyepiece device Pending WO2025057765A1 (en)

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Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2018110448A1 (en) * 2016-12-12 2018-06-21 ソニーセミコンダクタソリューションズ株式会社 Projection optical system, image projection apparatus, and image projection system
WO2023157481A1 (en) * 2022-02-18 2023-08-24 ソニーグループ株式会社 Display device and display system

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2018110448A1 (en) * 2016-12-12 2018-06-21 ソニーセミコンダクタソリューションズ株式会社 Projection optical system, image projection apparatus, and image projection system
WO2023157481A1 (en) * 2022-02-18 2023-08-24 ソニーグループ株式会社 Display device and display system

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