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WO2025054266A1 - Soupape de régulation de débit dotée d'une rétroaction de mouvement de diaphragme - Google Patents

Soupape de régulation de débit dotée d'une rétroaction de mouvement de diaphragme Download PDF

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Publication number
WO2025054266A1
WO2025054266A1 PCT/US2024/045310 US2024045310W WO2025054266A1 WO 2025054266 A1 WO2025054266 A1 WO 2025054266A1 US 2024045310 W US2024045310 W US 2024045310W WO 2025054266 A1 WO2025054266 A1 WO 2025054266A1
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WO
WIPO (PCT)
Prior art keywords
diaphragm
sensor
flow
pressure
flow control
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
PCT/US2024/045310
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English (en)
Inventor
Jeffrey Dean JENNINGS
Anthony Alan BLACK
David A. Reed
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Equilibar LLC
Original Assignee
Equilibar LLC
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Equilibar LLC filed Critical Equilibar LLC
Publication of WO2025054266A1 publication Critical patent/WO2025054266A1/fr
Pending legal-status Critical Current
Anticipated expiration legal-status Critical

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Classifications

    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
    • F16K37/00—Special means in or on valves or other cut-off apparatus for indicating or recording operation thereof, or for enabling an alarm to be given
    • F16K37/0025—Electrical or magnetic means
    • F16K37/0041—Electrical or magnetic means for measuring valve parameters
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
    • F16K31/00—Actuating devices; Operating means; Releasing devices
    • F16K31/12—Actuating devices; Operating means; Releasing devices actuated by fluid
    • F16K31/36—Actuating devices; Operating means; Releasing devices actuated by fluid in which fluid from the circuit is constantly supplied to the fluid motor
    • F16K31/365—Actuating devices; Operating means; Releasing devices actuated by fluid in which fluid from the circuit is constantly supplied to the fluid motor the fluid acting on a diaphragm
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
    • F16K37/00—Special means in or on valves or other cut-off apparatus for indicating or recording operation thereof, or for enabling an alarm to be given
    • F16K37/0025—Electrical or magnetic means
    • F16K37/005—Electrical or magnetic means for measuring fluid parameters
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
    • G05D7/00—Control of flow
    • G05D7/06—Control of flow characterised by the use of electric means
    • G05D7/0617—Control of flow characterised by the use of electric means specially adapted for fluid materials
    • G05D7/0629—Control of flow characterised by the use of electric means specially adapted for fluid materials characterised by the type of regulator means
    • G05D7/0635—Control of flow characterised by the use of electric means specially adapted for fluid materials characterised by the type of regulator means by action on throttling means

Definitions

  • the present invention relates to pressure regulators and other fluid flow control devices, and more particularly to fluid flow control devices having diaphragm movement feedback.
  • valves and valve actuators to provide the flow restriction to accomplish flow control.
  • a flow meter is often used to provide the flow feedback, but in simpler systems a valve may be actuated to various positions to control the flow rate.
  • a typical example is a globe valve with rising stem, and a valve actuator with positioner.
  • the positioner is a device which increases the linearity of response of the valve actuator, and reduces the hysteresis, such that the valve stem travels in a linear fashion with the signal to the positioner.
  • Another form of flow control valve is that of a direct sealing diaphragm valve, typically with multiple orifices such as that provided by Equilibar of Fletcher, NC.
  • a variable fluid pressure typically air
  • the diaphragm blocks flow between the inlet port and multiple orifices leading to the outlet orifice.
  • Increasing air pressure on the dome corresponds to lowered flow rate
  • lowered pressure on the dome corresponds to increased flow rate.
  • flow is blocked until the process pressure approximately exceeds the dome pressure and further increases as the differential pressure increases. Conversely, once the process pressure exceeds the dome pressure by a certain amount, no further increase in flow rate can be expected by further differential pressure increases.
  • the key disadvantage of this direct sealing diaphragm control valve is that there is an irregular or non-linear relationship between the dome pressure and the resulting flow rate.
  • the first feature of irregularity is that the flow rate is highly correlated to the differential pressure between the inlet pressure and the dome pressure. So changes in the upstream pressure can have a very outsized influence on flow rate, greater than that of a traditional flow control valve.
  • the PID controller often takes time to find the right region of dome pressure to control in. For example, if the upstream process is 60 psig and we want to initiate flow from a no-flow condition, then the PID controller has to start ramping down from max pressure (100 psig, for example) and ramp steadily the dome pressure down until it sees the onset of flow from the flow meter. By the time the flow meter shows flow, the dome pressure is already well below 60 psig and the flow overshoots dramatically. Then the diaphragm is constrained against the upper boundary and there is no further effect of the controller action until the dome pressure rises to the inlet pressure.
  • FIG. 1 is a schematic cross-sectional view of an exemplary a flow control valve
  • FIG. 2 is a block diagram of a flow metering apparatus including a flow control valve
  • FIG. 3 is a schematic cross-sectional view of an alternative flow control valve
  • FIG. 4 is a schematic cross-sectional view of an alternative flow control valve
  • FIG. 5 is a schematic cross-sectional view of an alternative flow control valve
  • FIG. 6 is a schematic cross-sectional view of an alternative flow control valve
  • FIG. 7 is a schematic cross-sectional view of an alternative flow control valve
  • FIG. 8 is a block diagram of a flow metering apparatus including a flow control valve
  • FIG. 9 is a block diagram of a flow metering apparatus including a flow control valve
  • FIG. 10 is a block diagram of a flow metering apparatus including a flow control valve
  • FIG. 11 is a block diagram of a flow metering apparatus including a flow control valve.
  • aspects of the present invention provide for a sensor in the dome of a direct sealing diaphragm valve which detects movement or differential forces acting on diaphragm and provides some form of an analog feedback which provides one or more signals to a control system capable of enhanced control. Examples include: direction of diaphragm movement, degree of diaphragm movement, rate of diaphragm movement, or forces or pressure acting on the diaphragm, or diaphragm movement/sealing over specific orifices or clusters of orifices.
  • FIG. 1 illustrates an exemplary flow control valve 10 constructed according to one aspect of the present invention.
  • the flow control valve 10 includes a body 12, which may be cast, machined, or built-up from separate components.
  • the material of the body 12 is selected to suit a particular application based on requirements such as temperature, pressure, chemical compatibility, etc.
  • suitable materials which are chemical -resistant include 316 alloy stainless steel, brass, and high-strength polymers.
  • the body 12 includes a wall 14 whose first side defines a process surface 16.
  • An outlet chamber 18 is formed in the body 12. It extends between the second side of the wall 14 and an outlet port 20.
  • An inlet chamber 22 is formed in the body 12. It extends between the second side of the wall 14 and an inlet port 24.
  • the inlet chamber 22 and the outlet chamber 18 are separated by a bulkhead 26. In the illustrated example, the inlet and outlet chambers are closed off by a bottom plate 28. Other configurations are possible.
  • a diaphragm 30 is disposed adjacent the process surface 16.
  • the diaphragm 30 may be constructed from a material which is chemically inert and/or chemically resistant.
  • Non-limiting examples of such materials include PTFE, PEEK, polyimide, fiber reinforced PTFE sheeting, elastomer such as FKM (optionally reinforced), or metals.
  • FKM elastomer
  • the diaphragm 30 has opposed sides referred to as reference and process sides, with the process side facing the process surface 16. The perimeter of the diaphragm 30 is secured against the body 12.
  • the process surface 16 defines a lower constraint on movement of the diaphragm 30.
  • the diaphragm 30 is secured to the body 12 by a relatively rigid reference housing 32 which is attached to the body 12, for example using the illustrated bolts 34.
  • additional seals such as O-rings (not shown) may be provided between the diaphragm 30 and the body 12 and/or the diaphragm 30 and the reference housing 32.
  • a space defined between the diaphragm 30 and the reference housing 32 is referred to as a "dome" 34.
  • a reference port 36 is formed in the reference housing 32 and is disposed in fluid communication with the reference side of the diaphragm 30.
  • the interior of the reference housing 32 defines an upper constraint on movement of the diaphragm 30
  • At least one inlet orifice 38 is formed in the wall 14 and is disposed in fluid communication with the inlet port 24 and the process surface 16.
  • At least one outlet orifice 40 is formed in the wall 14 and is disposed in fluid communication with the outlet port 20 and the process surface 16.
  • the overall configuration of the flow control valve 10, wherein the diaphragm 30 seals against the inlet orifices 38 and the outlet orifices 40 may be generally referred to as a "direct sealing diaphragm" device.
  • the process surface 16 may be substantially coplanar with the plane of restraint of the diaphragm 30, or it may be positioned slightly above or below the plane of diaphragm constraint, in order to effect a slight closing or opening bias, respectively.
  • the flow control valve 10 is provided with a diaphragm sensor apparatus 42.
  • diaphragm sensor apparatus refers to a sensor or collection of sensors which is configured to directly or indirectly determine the position (or rate of movement) of the diaphragm 30 and produce a signal representative thereof.
  • the diaphragm sensor apparatus 42 comprises a sensor 44 that is attached to the reference side of the diaphragm and detects diaphragm flexing or diaphragm shape.
  • a sensor 44 also known as a flexible potentiometer
  • conductive ink sensors include conductive ink sensors, velostat-based sensors, piezoelectric ribbons, and fiber-optic flex sensors in which the bending of the diaphragm 30 reduces the amount of light that reaches a light dependent resistor (LDR).
  • LDR light dependent resistor
  • This type of sensor may produce a signal that is roughly proportional to deflection of the diaphragm 30 from a neutral position.
  • FIG. 2 is a schematic representation of a flow metering apparatus 100 incorporating the flow control valve 10.
  • a process which generates flow in a process fluid would be located upstream of the flow metering apparatus 100 and connected to the inlet port 24 of the flow control valve 10 by an inlet line 102.
  • the reference port 36 of the flow control valve 10 is connected to a pressure reference source 104 by a reference line 106.
  • the pressure reference source 104 comprises an electronic controller 108 such as a proportional-integral-derivative (PID) controller, and an electronic air pressure regulator ("EPR") 110.
  • PID proportional-integral-derivative
  • EPR electronic air pressure regulator
  • items 108 and 110 can be combined to offer a more simple package, but can also work as separate devices.
  • the electronic controller 108 may include one or more processors executing software instructions to receive input signals, implement control algorithms, and provide appropriate output signals.
  • Electronic controller 108 may be a general- purpose device or a purpose-built device.
  • the electronic controller 108 may include hardware and/or software features to enable it to implement closed-loop control such as feedback control.
  • the feedback control may include proportional, integral, or derivative components, or all three. This last is commonly known as PID control.
  • PID control As used herein, it will be understood that the term “ PID” or "PID controller” refers to the controller 108 generally even though the specific controller used may not implement all of proportional, integral, and derivative components.
  • An outlet line 112 is connected to the outlet port 20 of the flow control valve 10.
  • a flowmeter 114 operable to measure a fluid flow rate and produce a signal indicative thereof is coupled to the outlet line 112.
  • Various types of flowmeters are commercially available.
  • a signal line 116 connects the flowmeter 114 to the controller 108. Alternatively, the flowmeter 114 could be positioned upstream of the flow control valve 10.
  • the diaphragm 30 is drawn into a sealing relationship with the outlet orifices 40 due to the pressure differential between the process pressure and the reference pressure.
  • the process pressure exceeds the reference pressure the area of the diaphragm 30 between the outlet orifices 40 is persuaded away from the outlet orifices 40 thereby allowing flow through the outlet port 20.
  • Flow may be varied by modulating the reference pressure using feedback signals from the flowmeter 114. In operation, the flow control valve 10 would control against the prevailing pressure in the inlet line 102.
  • Output from the diaphragm sensor apparatus 42 is provided to the controller 108 through a line 118.
  • the flowmeter 114 functions to provide real-time updates to the controller 108, optionally with custom gain curves loaded.
  • the flow control valve 10 is used to provide high resolution and high rangeability flow control.
  • the electronic air pressure regulator 32 may be controlled by input current (I/P) or voltage (E/P) signal and may also include a high speed PID loop adapted with logic such as custom gain curves and other programming for providing highly resolute flow control.
  • I/P or E/P device is an industry standard electro-pneumatic device that receives an electrical signal to control an incoming air supply to a desired output pressure.
  • a capacitance sensor can be used to determine the aggregate capacitance between the reference housing 32 and a conductive layer applied to the top of the diaphragm 30.
  • the capacitance could be sensed between the process surface 16 and a conductive layer applied to the top of a non-conductive diaphragm 30.
  • a capacitive sensor 144 is provided which measures the distance from the reference housing 32 to the reference side of the diaphragm 30.
  • a sensor 146 could be mounted in the reference housing 32 and used to measure the distance from the sensor 146 to the diaphragm 30, either directly or using a diaphragm-mounted target.
  • sensors suitable for this purpose include inductive sensors, ultrasonic sensors, laser sensors, or light sensors.
  • distance can be measured using a Hall effect sensor 148 mounted to the diaphragm 30 and an associated magnet 150 mounted to the reference housing 32 Alternatively, the magnet 150 could be disposed on the diaphragm 30 and the sensor on the reference housing 32.
  • the position of the diaphragm 30 could be inferred or measured indirectly by measuring changes in the fluid volume within the dome 34.
  • a flow sensor 152 preferably a dP cell orifice
  • a flow sensor 152 would be used to measure fluid movement in or out of the dome 34 across some form of restricting orifice or frictional length of tubing to generate dP .
  • the dome pressure is being ramped up or downward by the EPR, some flow into or out from the dome is to be expected according to the Ideal Gas Law. Therefore, an advanced algorithm would take into account flow signals into or out of the dome that deviate from those suggested by the EPR pressure signal and the Ideal Gas Law.
  • a diaphragm movement sensor is used instead of a position sensor, the onset of flow outside of the dome can be considered analogous to a rising diaphragm movement, and vice versa..
  • Various sensors placed on the diaphragm 30 could be arranged in a way that they are measuring the movement of the diaphragm 30 over different orifices/features of the BPR. For instance, separate flex sensors could be put on the areas of the diaphragm 30 covering the inlet and outlet orifices respectively. Or by having multiple flex sensors covering different areas of the diaphragm 30 it would be possible to map the changes in diaphragm topology.
  • the software running in the controller will be able to receive indication that the flow control valve 10 is near the onset of flow and reduce the ramp rate as the controller nears to the range where flow might be expected to onset.
  • the diaphragm 30 will flex further until it reaches its upper most boundary, whereby further decreases in pressure will not be useful.
  • the dome pressure reference pressure
  • the dome pressure will be prevented from uselessly winding down too far past the diaphragm's maximum upward position when flow overshoots, and the dome pressure will be prevented from uselessly winding up too far past the diaphragm's lower constraint (process surface) when the flow undershoots.
  • the flow metering apparatus 100 could utilize a type of master/slave cascade PID scheme, with the diaphragm position serving as a type of inner loop controller and the flow meter serving as a type of outer loop. This would allow immediate response to an upstream pressure change or even a blockage in downstream flow restriction prior to the flow meter sensing and relaying this information, approaches could be used to provide a bias or transform to the normal PID flow loop, wherein a more traditional PID loop with the flow meter is the main function, but short-term disruptions provided by the diaphragm movement could allow for biasing of the dome pressure even before the PID had a chance to react. More detailed examples of flow control strategies are described below.
  • the presence of the diaphragm sensor apparatus 42 would aid in speeding up the reaction to a start-up or major disruption.
  • the controller would be able to ramp the dome pressure in the reactive direction at a very high speed until the diaphragm sensor apparatus 42 relayed that the onset of flow (or, alternatively, the restriction of flow) was imminent.
  • the dome pressure control can be adjusted in a more controlled manner to avoid overshoot.
  • the senor could be located with the diaphragm on the bottom constraint (process surface). This would ideally be located away from the inlet orifices and also away from the outlet orifices, in a portion of the diaphragm relatively undisturbed by the movement related to those orifices.
  • a force or pressure sensor (example: dP cell) could be situated against the diaphragm while the diaphragm is in a neutral position or a position against or near the process surface..
  • the control algorithm could know the degree of "overpressure" (Inlet - Ref) that the unit was working with. When the Ref > Inlet, no force would be registered. In a situation where starting condition is no-flow and ReMnlet pressure, the Ref pressure could be rapidly decreased until the point where the dP sensor indicated an upward force (indicating the wetted fluid exceeded the Ref pressure). Having this information would allow a much faster movement into the active window of flow control.
  • a force or pressure sensor may be located to sense when the diaphragm rises to contact the top of the diaphragm constraint surface. The presence of upward force towards the top of the constraint would suggest that the diaphragm had moved upward, providing more specific information about the relative location of the flow curve.
  • locating a force/pressure sensor over the outlet orifice field would have the presence of force in this location suggesting that the diaphragm had moved near its maximum open position (at least for that portion of the outlet orifices field), signaling to the controller that the valve is nearing its max-open position and signaling further Ref pressure reductions may not be useful.
  • the Ref pressure could be rapidly increased until this top-of-constraint sensor stopped indicating force, thereby signaling that the controller had entered the useful modulation range.
  • the control algorithms for the diaphragm pressure/force sensor is similar to that of the examples provided by the diaphragm movement sensor.
  • Each pressure/force sensor could provide information to narrow the range of Ref pressures to be included in the active control window.
  • An inner cascade loop on dP with one or more of these sensors could provide a faster means of feedback, with the flow meter signal externally providing the slower master cascade signal.
  • Other control algorithms could be developed to incorporate the improved understanding of dP by scanning the dP versus flow relationship, providing more linear transforms between these variables and enhancing the stability of the flow control.
  • EPR electronic pressure regulator
  • XT signal from diaphragm sensor/diaphragm position transducer / diaphragm movement sensor
  • One flow control strategy is accelerated adjustment of CO during disruption (back pressure, flow control). This would be a supplemental control strategy that is invoked during a start-up condition or a disruption condition. It includes the following steps:
  • the PV error is positively correlated with the indicated diaphragm limit (i.e. excessive flow with diaphragm on upper limit, or inadequate flow with diaphragm on lower limit),
  • the PID software would be customized to modify gain values at different times, or the CO may be defined to specific values or to ramp at preset patterns when certain (normally disruptive or start-up) criteria are met, as informed by the additional variable XT or diaphragm movement.
  • Another flow control strategy is high speed bias of CO or PV (flow control). This would be a supplemental control strategy that provides a limited bias to the CO based on a change in the position of the diaphragm position sensing signa . It includes the following steps:
  • a PI or PID control loop signal is modified by a limited biasing function (see FIG. 9).
  • the biasing function can add or subtract to the value of the CO by a limited amount.
  • the biasing value is proportional to a derivative of the filtered or unfiltered value of the diaphragm position signal or the rate of a diaphragm movement signal
  • a rising diaphragm biases the CO to increase the pressure in the dome by a limited amount
  • a falling diaphragm biases the CO to decrease the pressure in the dome by a limited amount
  • a similar strategy can be accomplished in a PID loop by artificially biasing the PV signal (instead of biasing the CO signal) and allowing the PID loop to accomplish the CO offset. See FIG. 10.
  • a rising diaphragm would bias the PV positively by a predetermined limited amount (causing the PID to anticipate increased flow before the flow meter detects it).
  • a falling diaphragm would bias the PV negatively by a predetermined limited amount.
  • Another flow control strategy is a cascade PID. As shown in FIG. 11, another method would be to utilize a cascade (2 -loop) PID using the flowmeter as the master (outer) PV2, and the diaphragm movement sensor XT as the inner PV1.
  • the flow control valve described above is natively capable of controlling back pressure such that the inlet pressure is regulated close to the dome pressure, however, this type of valve can be readily adapted to control flow rate by adapting the dome pressure in response to a flow meter signal as described above.
  • a pressure reducing valve PRR
  • PRR pressure reducing valve
  • a high speed closed-loop control system may be used to quickly adapt the dome pressure according to the pressure measured downstream of the valve. When the pressure is inadequate downstream, the dome pressure must be lowered until flow is initiated or increased.
  • the upstream pressure is typically not known by the controller, and therefore it is difficult for the controller to anticipate at what dome pressure flow will initiate, and at what dome pressure flow will cease.
  • Downstream system capacitances vary dramatically, from liquid systems where virtually no capacitance is present, to compressible gas systems and liquid systems with compressible elements. Systems with no capacitance or compressibility means that control system gain values must be incredibly fast responding, whereas systems with high compressibility and capacitance can be tuned more slowly.
  • FIG. 11 illustrates a cascade control loop (such as cascade PID loop) such that:
  • a downstream pressure signal (“PT2") is used as the PV for the master or outer control loop PID2, functioning as a type of flow control loop, wherein an inadequate PT2 requires higher flow and an excessive PT2 requires lower flow.
  • the CO (CO2) of this outer loop is sent as the SP (“SP1”) to an inner loop (PID1).
  • An inner (preferably faster acting) control loop uses a diaphragm position sensor (shown as XT) as a proxy for flow, such that a higher diaphragm position signal is desired when more flow is required, and a lower diaphragm position signal is desired when less flow is desired.
  • the CO (CO1) of this inner loop is the target dome pressure and sent to the EPR as its SP.

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  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Automation & Control Theory (AREA)
  • Flow Control (AREA)

Abstract

L'invention concerne un appareil de régulation de débit comprenant : une vanne de régulation de débit, comprenant : un corps définissant une surface de traitement, un orifice d'entrée, au moins un orifice d'entrée, un orifice d'élément et au moins un orifice de sortie ; un boîtier de référence comprenant un orifice de référence ; et un diaphragme disposé entre le corps et le boîtier de référence, le diaphragme étant mobile entre une première position en prise avec les orifices, et une seconde position dans laquelle le diaphragme n'est pas en prise avec au moins l'un des orifices, un dôme étant défini entre le boîtier de référence et le diaphragme ; un appareil de capteur de diaphragme configuré pour détecter une position du diaphragme et générer un signal représentatif de celle-ci ; et un dispositif de commande électronique configuré pour fournir une pression de référence à l'orifice de référence, l'appareil de capteur de diaphragme étant couplé de manière fonctionnelle au dispositif de commande électronique.
PCT/US2024/045310 2023-09-06 2024-09-05 Soupape de régulation de débit dotée d'une rétroaction de mouvement de diaphragme Pending WO2025054266A1 (fr)

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US202363580785P 2023-09-06 2023-09-06
US63/580,785 2023-09-06

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WO2025054266A1 true WO2025054266A1 (fr) 2025-03-13

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Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6761063B2 (en) * 2001-07-02 2004-07-13 Tobi Mengle True position sensor for diaphragm valves
US20050092079A1 (en) * 2003-10-03 2005-05-05 Ales Richard A. Diaphragm monitoring for flow control devices
US8141427B2 (en) * 2008-06-04 2012-03-27 Georgia Tech Research Corporation Piezoelectric and piezoresistive cantilever sensors
US9447890B2 (en) * 2011-06-24 2016-09-20 Equilibar, Llc Back pressure regulator with floating seal support
US20200284361A1 (en) * 2019-03-05 2020-09-10 Buerkert Werke Gmbh & Co. Kg Diaphragm control valve
US20210018940A1 (en) * 2018-03-26 2021-01-21 Hitachi Metals, Ltd. Flow controller
US20220011030A1 (en) * 2017-05-10 2022-01-13 Equilibar, Llc Dome-loaded back pressure regulator with setpoint pressure energized by process fluid
US20220057002A1 (en) * 2018-09-29 2022-02-24 Fujikin Incorporated Diaphragm valve and flow rate control device

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6761063B2 (en) * 2001-07-02 2004-07-13 Tobi Mengle True position sensor for diaphragm valves
US20050092079A1 (en) * 2003-10-03 2005-05-05 Ales Richard A. Diaphragm monitoring for flow control devices
US8141427B2 (en) * 2008-06-04 2012-03-27 Georgia Tech Research Corporation Piezoelectric and piezoresistive cantilever sensors
US9447890B2 (en) * 2011-06-24 2016-09-20 Equilibar, Llc Back pressure regulator with floating seal support
US20220011030A1 (en) * 2017-05-10 2022-01-13 Equilibar, Llc Dome-loaded back pressure regulator with setpoint pressure energized by process fluid
US20210018940A1 (en) * 2018-03-26 2021-01-21 Hitachi Metals, Ltd. Flow controller
US20220057002A1 (en) * 2018-09-29 2022-02-24 Fujikin Incorporated Diaphragm valve and flow rate control device
US20200284361A1 (en) * 2019-03-05 2020-09-10 Buerkert Werke Gmbh & Co. Kg Diaphragm control valve

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