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WO2024219471A1 - Circuit board - Google Patents

Circuit board Download PDF

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Publication number
WO2024219471A1
WO2024219471A1 PCT/JP2024/015486 JP2024015486W WO2024219471A1 WO 2024219471 A1 WO2024219471 A1 WO 2024219471A1 JP 2024015486 W JP2024015486 W JP 2024015486W WO 2024219471 A1 WO2024219471 A1 WO 2024219471A1
Authority
WO
WIPO (PCT)
Prior art keywords
substrate
base material
protrusion
wiring board
wiring
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
PCT/JP2024/015486
Other languages
French (fr)
Japanese (ja)
Inventor
有平 松本
泉太郎 山元
晃彰 野々山
涼 西村
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kyocera Corp
Original Assignee
Kyocera Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kyocera Corp filed Critical Kyocera Corp
Publication of WO2024219471A1 publication Critical patent/WO2024219471A1/en
Anticipated expiration legal-status Critical
Pending legal-status Critical Current

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Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/12Mountings, e.g. non-detachable insulating substrates
    • H01L23/14Mountings, e.g. non-detachable insulating substrates characterised by the material or its electrical properties
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details

Definitions

  • the disclosed embodiment relates to a wiring board.
  • ceramics have been widely used as wiring boards for mounting various semiconductor elements such as LSIs. This is because ceramics have high rigidity and a thermal expansion coefficient close to that of semiconductor elements. For this reason, wiring boards that use highly rigid materials such as ceramics for the insulating layer are less likely to deform even when the semiconductor elements generate heat when they are operating, and they exhibit high mechanical and dynamic reliability.
  • the wiring board according to one aspect of the embodiment has a first substrate and a second substrate.
  • the first substrate contains any of the following materials: ceramic material, metal material, carbon material, and a composite of two or more of these materials.
  • the second substrate contains an organic resin as a main component, has copper foil wiring on its surface, and is laminated on the first substrate.
  • FIG. 1 is an exploded perspective view showing an example of a wiring board according to a first embodiment.
  • FIG. 2 is a perspective view illustrating an example of the wiring board according to the first embodiment.
  • FIG. 3 is a cross-sectional view taken along line AA of FIG.
  • FIG. 4 is a cross-sectional view taken along line BB of FIG.
  • FIG. 5 is a cross-sectional view showing an example of a wiring board according to the second embodiment.
  • FIG. 6 is a cross-sectional view showing an example of a wiring board according to the third embodiment.
  • FIG. 7 is a cross-sectional view showing an example of a wiring board according to the fourth embodiment.
  • FIG. 8 is a cross-sectional view showing an example of a wiring board according to the fifth embodiment.
  • FIG. 9 is a cross-sectional view showing an example of a wiring board according to the sixth embodiment.
  • FIG. 10 is a cross-sectional view illustrating an example of a wiring board according to the seventh embodiment.
  • wiring boards are being forced to increase the number of connection terminals and wiring formed on them. For this reason, wiring boards are increasingly being required to have finer wiring and narrower pitches.
  • Fig. 1 is an exploded perspective view showing an example of a multilayer substrate according to the first embodiment.
  • Fig. 2 is a perspective view showing an example of a wiring substrate according to the first embodiment.
  • Fig. 3 is a cross-sectional view taken along line A-A in Fig. 2. As shown in Figs. 1 to 3, the wiring substrate 1 according to the first embodiment has a first substrate 10 and a second substrate 20.
  • the first substrate 10 has a base portion 11.
  • the base portion 11 has a flat plate shape.
  • the outer shape of the base portion 11 is preferably rectangular, for example.
  • a rectangular shape is one that has a square or rectangular basic shape.
  • the second substrate 20 also has a flat plate shape and its outer shape is rectangular.
  • the second substrate 20 is layered on the first substrate 10. In other words, the first substrate 10 and the second substrate 20 form a laminate.
  • the first substrate 10 contains one of the following materials: a ceramic material, a metal material, a carbon material, or a composite of two or more of these materials.
  • the second substrate 20 contains an organic resin as a main component.
  • the second substrate 20 has copper foil wiring on its surface.
  • the wiring board 1 is a laminate in which a substrate (second substrate 20) made of organic resin, on which copper foil wiring can be easily formed, is layered and integrated with a substrate (first substrate 10) that is more rigid than the second substrate 20.
  • the wiring board 1 is a structure in which a second substrate 20 made of an organic resin, which is easy to adhere to copper foil that allows fine wiring to be formed, and a first substrate 10, which is more rigid than the second substrate 20, are laminated together, so that the rigidity of the second substrate 20 is compensated for by the first substrate 10.
  • the wiring board 1, which constitutes one aspect of the first embodiment has high rigidity and can achieve finer wiring and narrower pitches.
  • the wiring board 1 can also have the following configuration.
  • the first substrate 10 constituting the wiring board 1 may have a convex portion 12 on the first surface 111 when one surface of the base portion 11 is the first surface 111.
  • the convex portion 12 is disposed in the center of the first surface 111. In other words, it is preferable that the base portion 11 and the convex portion 12 are one piece.
  • the first substrate 10 may have a base portion 11 and a protruding portion 12.
  • the base portion 11 may be flat.
  • the convex portion 12 is located on the first surface 111 of the base portion 11.
  • the convex portion 12 may be an island-shaped structure located toward the center of the first surface 111, away from the outer edge 110 of the first surface 111.
  • the convex portion 12 has a mounting surface 121.
  • the mounting surface 121 is the upper surface of the convex portion 12 on which an electrical element can be mounted.
  • the upper surface of the convex portion 12 is an expression resulting from the fact that the upper surface faces in the positive direction of the Z axis, as shown in FIG. 1, for example.
  • the mounting surface 121 may also be expressed as the upper surface when the wiring board 1 in FIG. 1 is turned upside down. In other words, the mounting surface 121 may also be expressed as the upper surface when the mounting surface 121 of the convex portion 12 faces in the negative direction of the Z axis.
  • the first substrate 10 may be made of, for example, a ceramic material, a metal material, a carbon material, or a composite of two or more of these materials.
  • the ceramic material may be, for example, an aluminum oxide sintered body, an aluminum nitride sintered body, a mullite sintered body, a glass ceramic sintered body, a crystallized glass in which crystal components are precipitated in a glass matrix, or a microcrystalline sintered body such as mica or aluminum titanate.
  • the metal material may be, for example, copper, silver, palladium, gold, platinum, aluminum, chromium, nickel, cadmium-lead, selenium, manganese, tin, vanadium, lithium, cobalt, titanium, or the like.
  • the carbon material may be, for example, graphite.
  • the first substrate 10 preferably has a base portion 11 and a protruding portion 12 that are integrated together. For example, it is preferable that there is no lamination interface between the base portion 11 and the protruding portion 12. In addition, it is preferable that there is no material other than the material that constitutes the first substrate 10, such as an adhesive, between the base portion 11 and the protruding portion 12.
  • the second substrate 20 is laminated on the first surface 111 of the first substrate 10.
  • the second substrate 20 is flat, and has a second surface 201 and a third surface 202 located at both ends in the thickness direction.
  • the second surface 201 is the surface of the second substrate 20 facing in the same direction as the mounting surface 121 of the first substrate 10.
  • the third surface 202 is located on the opposite side to the second surface 201, and faces the first surface 111 of the first substrate 10.
  • the second substrate 20 has a through hole 21 that penetrates in the thickness direction.
  • the second substrate 20 contains an organic resin as a main component.
  • the organic resin may be, for example, an epoxy resin, an acrylic resin, a polycarbonate resin, a polyimide resin, an olefin resin, or a polyphenylene resin.
  • the organic resin may be, for example, polytetrafluoroethylene (PTFE) or other fluororesins or polyphenylene ether resins.
  • the second substrate 20 may contain components other than the organic resin.
  • the first substrate 10 and the second substrate 20 are positioned so that the through hole 21 of the second substrate 20 fits into the protrusion 12 of the first substrate 10.
  • the mounting surface 121 is located on the convex portion 12 formed on the first substrate 10, which has a higher rigidity than the second substrate 20, the electrical element mounted on the mounting surface 121 is less likely to deform.
  • the electrical element mounted on the mounting surface 121 is less likely to deform.
  • the copper foil wiring is provided on the second substrate 20, which has a lower rigidity than the first substrate 10, the accumulation of residual stress is small.
  • a wiring board 1 that is less likely to deform and allows for finer wiring and narrower pitch, for example, with a line width of 50 ⁇ m or less and a pitch of 100 ⁇ m (line distance of 50 ⁇ m) or less.
  • the mounting surface 121 of the convex portion 12 of the first substrate 10 and the second surface 201 located on the surface of the second substrate 20 may be flush with each other.
  • the second substrate 20 When the second substrate 20 is placed on the first substrate 10, there is no portion of the second substrate 20 that protrudes above the convex portion 12 of the first substrate 10, so that, for example, the portion of the second substrate 20 that deforms can be reduced. Also, for example, because the deformation of the second substrate 20 is stopped by the convex portion 12, the entire second substrate 20 is less likely to deform.
  • the length of the bonding wire extending from the electrical element mounted on the mounting surface 121 to the wiring (element terminal) on the second surface 201 can be the shortest distance or a length close to this. This makes it possible to reduce the inductance in the bonding wire.
  • first substrate 10 If, for example, a highly rigid metallic material is used as the first substrate 10, it becomes easier to make the mounting surface 121 and the second surface 201 flush.
  • FIG. 4 is a cross-sectional view taken along line B-B in FIG. 2.
  • the second substrate 20 has copper foil wiring 30 on its surface.
  • the wiring 30 located on the second surface 201 may be embedded in the surface portion of the second substrate 20.
  • a configuration in which the wiring 30 is disposed so as to protrude above the second surface 201 of the second substrate 20 makes it easier for the second substrate 20 and the wiring 30 to be subjected to mutual restraining forces. This makes the second substrate 20 less likely to deform.
  • the second substrate 20 is laminated in a manner that it is attached to the first substrate 10, which has greater rigidity than the second substrate 20, and the second substrate 20 is restrained by the first substrate 10.
  • the second substrate 20 is also restrained by the wiring 30 formed on its surface.
  • the second substrate 20 is also restrained by the convex portion 12 of the first substrate 10.
  • the area of the second substrate 20 close to the convex portion 12 is more susceptible to restraining forces in the planar direction than the peripheral area away from the convex portion 12.
  • the front surface 301 of the wiring 30 may be flush with the second surface 201, which is the surface of the second substrate 20. This makes the second substrate 20 even less susceptible to deformation.
  • the front surface 301 of the wiring 30 refers to the surface of the wiring 30 that is exposed from the second substrate 20 when the second substrate 20 is viewed in plan from a position above it.
  • the structure shown in FIG. 4 can be produced, for example, by transferring and pressurizing a copper foil wiring material that has been patterned in advance onto a PET film, onto a ceramic green sheet that will become the first substrate 10. If necessary, heating may be performed simultaneously with pressing.
  • Second Embodiment Fig. 5 is a cross-sectional view showing an example of a wiring board according to the second embodiment. Fig. 5 does not show the entire wiring board 1, but only occupies a portion close to the periphery of the protrusion 12 provided on the first base material 10. As shown in Fig. 5, the second surface 201 may be closer to the first surface 111 than the mounting surface 121.
  • the second substrate 20 Since the thickness of the second substrate 20 is thinner than the thickness of the first substrate 10 where the convex portion 12 is located, the second substrate 20 is more easily restrained by the convex portion 12 and the base portion 11 of the first substrate 10, and is less likely to deform.
  • the wiring board 1 makes it easy to recognize images, for example.
  • FIG. 5 shows a configuration in which the second substrate 20 has the same thickness over the entire area where it is in contact with the first surface 111 of the first substrate 10, but this is not limiting, and for example, at least a portion of the second substrate 20 close to the convex portion 12 may be closer to the first surface 111 than the mounting surface 121.
  • the second substrate 20 has the same thickness, for example, the bias in deformation of the second substrate 20 and the variation in the amount of deformation are reduced.
  • the configuration shown in Figure 5 can be produced, for example, by using a rubber mold on the upper side of the lamination machine that is easily deformed when it hits the product.
  • Third Embodiment 6 is a cross-sectional view showing an example of a wiring board according to the third embodiment.
  • the surface (second surface 201) of the second base material 20, which is a portion close to the protrusion 12 may be located higher than the upper surface (mounting surface 121) of the protrusion 12.
  • the second surface 201 may be located at a greater distance from the first surface 111 than the mounting surface 121.
  • the second substrate 20 Since the second substrate 20 is thick and the second surface 201 of the second substrate 20 is farther from the first surface 111 than the mounting surface 121 of the convex portion 12, the second substrate 20 has, for example, a portion that protrudes above the mounting surface 121 of the convex portion 12.
  • the second substrate 20 has a portion in the thickness direction of the first substrate 10 that is close to the first surface 111 of the first substrate 10 and is easily constrained by the first substrate 10, and a portion that is far from the first surface 111 or the mounting surface 121 of the convex portion 12 and is not easily constrained by the first substrate 10.
  • the portion of the second substrate 20 above the mounting surface 121 of the protrusion 12 serves as a part that relieves the stress that occurs when, for example, a bending load is applied to the wiring substrate 1, and can withstand both tensile stress and compressive stress. As a result, for example, even when a mechanical load is applied to the wiring substrate 1, damage to the substrate material and wiring is less likely to occur.
  • the bonding wire (not shown) that connects between the electrical element (not shown) mounted on the mounting surface 121 and the connection terminal (not shown) formed on the second substrate 20 can be made linear, which leads to a reduction in inductance.
  • FIG. 6 shows a configuration in which the second substrate 20 has the same thickness over the entire area where it contacts the first surface 111 of the first substrate 10, but this is not limiting.
  • at least a portion of the second substrate 20 close to the convex portion 12 may be at a greater distance from the first surface 111 than the mounting surface 121.
  • the bias in deformation of the second substrate 20 and the variation in the amount of deformation are reduced.
  • the configuration shown in Figure 6 can be produced, for example, by using an inverted convex mold/rubber mold.
  • the protruding portion 12 when the surface of the protruding portion 12 constituting the first base material 10 that faces the same direction as the first surface 111 of the first base material 10 is defined as the upper surface (mounting surface 121), the protruding portion 12 has a side surface 122 that intersects with the upper surface (mounting surface 121) and a ridge portion 123A that connects the side surface 122 and the upper surface (mounting surface 121).
  • the second base material 20 is preferably configured such that the inner wall 20A of the second base material 20 that faces the through hole 21 contacts the protruding portion 12 from the side surface 122 to the ridge portion 123A.
  • FIG. 7 is a cross-sectional view showing an example of a wiring board according to the fourth embodiment.
  • the wiring board 1 may have a so-called chamfered shape at the ridge portion 123A (see FIG. 3) connecting the side surface 122 of the convex portion 12 to the upper surface (mounting surface 121).
  • the wiring board 1 may have rounded corners where the side surface 122 and the upper surface (mounting surface 121) of the convex portion 12 intersect.
  • the wiring board 1 shown in FIG. 7 may have a curved surface at the corner (corresponding to the ridge portion 123A) connecting the side surface 122 of the convex portion 12 to the upper surface (mounting surface 121).
  • first R-chamfered portion 123 is the curved surface of the corner that connects side surface 122 to top surface (mounting surface 121) of protrusion 12.
  • the protrusion 12 may have a side surface 122 and a first R-chamfered portion 123.
  • the side surface 122 is a surface that intersects with the mounting surface 121.
  • the first R-chamfered portion 123 is located on the ridge where the side surface 122 and the mounting surface 121 intersect, and is a portion that is curved in a convex shape.
  • the second substrate 20 may have an inner wall of the through hole 21 in contact with the side surface 122 of the convex portion 12 from the first R chamfered portion 123. Since the convex portion 12 of the first substrate 10 has the first R chamfered portion 123, the contact area between the inner wall of the through hole 21 of the second substrate 20 and the first substrate 10 is larger than when the ridge portion of the convex portion 12 is simply angular without the first R chamfered portion 123. This increases the fixing force of the second substrate 20 to the first substrate 10, making it less likely to deform. Therefore, according to the wiring board 1 of this embodiment, for example, the surface portion of the second substrate 20 on the mounting surface 121 side is less likely to peel off.
  • FIG. 8 is a cross-sectional view showing an example of a wiring board according to the fifth embodiment.
  • this wiring board 1 has a corner portion 124A where the first surface 111 of the first substrate 10 and the side surface 122 of the protrusion 12 are connected. It is preferable that the second substrate 20 contacts the corner portion 124A.
  • the wiring board 1 may have a corner 124A (see FIG. 3) that connects from the first surface 111 to the side surface 122 of the convex portion 12, which is curved concavely from the first surface 111 to the side surface 122 of the convex portion 12.
  • the wiring board 1 may have a rounded corner 124A where the first surface 111 and the side surface 122 of the convex portion 12 intersect.
  • the corner portion 124A may be disposed so as to extend in the direction of the depth of the paper on which FIG. 8 is drawn.
  • the portion of the corner portion 124A where the first surface 111 and the side surface 122 of the protrusion 12 intersect and which is rounded in a concave shape will be referred to as the second R-chamfered portion 124.
  • the protrusion 12 may have a side surface 122 and a second R-chamfered portion 124.
  • the side surface 122 is a surface that intersects with the mounting surface 121.
  • the second R-chamfered portion 124 is located at the corner where the side surface 122 and the first surface 111 intersect, and is a concavely curved portion.
  • the second substrate 20 may have the inner wall of the through hole 21 in contact with the side surface 122 of the convex portion 12 from the second R chamfered portion 124. Since the convex portion 12 of the first substrate 10 has the second R chamfered portion 124, the contact area between the inner wall of the through hole 21 of the second substrate 20 and the first substrate 10 is larger than when the corner of the convex portion 12 is simply angular and does not have the second R chamfered portion 124. This increases the fixing force of the second substrate 20 to the first substrate 10, making it less likely to deform.
  • the first substrate 10 shown in Figures 7 and 8 can be formed, for example, by producing a ceramic sintered body using a green sheet formed using a dedicated mold.
  • the protrusion 12 may have a side surface 122, a first R-chamfered portion 123, and a second R-chamfered portion 124.
  • the side surface 122 is a surface that intersects with the mounting surface 121.
  • the first R-chamfered portion 123 is a portion that is located at a ridge where the side surface 122 and the mounting surface 121 intersect, and is curved in a convex shape.
  • the second R-chamfered portion 124 is a portion that is located at a corner where the side surface 122 and the first surface 111 intersect, and is curved in a concave shape.
  • the second substrate 20 may have the inner wall of the through hole 21 in contact with the side surface 122 of the protrusion 12 from the first R chamfered portion 123 to the second R chamfered portion 124.
  • the contact area between the inner wall of the through hole 21 of the second substrate 20 and the first substrate 10 is larger than when the ridge portion of the convex portion 12 is simply angular without the first R chamfered portion 123. Also, since the convex portion 12 of the first substrate 10 has the second R chamfered portion 124, the contact area between the inner wall of the through hole 21 of the second substrate 20 and the first substrate 10 is larger than when the corner of the convex portion 12 is simply angular without the second R chamfered portion 124. This increases the fixing force of the second substrate 20 to the first substrate 10, making it less likely to deform.
  • Fig. 10 is a cross-sectional view showing an example of a wiring board according to the seventh embodiment.
  • the protrusion 12 has a side surface 122 intersecting with a mounting surface 121.
  • the inner wall facing the through hole 21 of the second base material 20 and the side surface 122 may be spaced apart.
  • the configuration shown in FIG. 10 can be produced, for example, by forming holes (through holes) larger than the protrusions 12 in advance in a hybrid sheet, which is the material of the second substrate 20, and maintaining this gap by elastic pressing. Also, before the second substrate 20 is superimposed on the first substrate 10, a silicone-based release agent, for example, may be applied to the side surface 122 of the protrusions 12 of the first substrate 10. The first substrate 10 to which the release agent has been applied may be less likely to shrink than the second substrate 20 when cooled after being pressurized and heated. This effect may be utilized to produce the wiring board 1 according to this embodiment.
  • the first substrate 10 may have a conductor.
  • the first substrate 10 may have, as the conductor, for example, a via conductor extending in the thickness direction of the first substrate 10, wiring formed on at least one of the surface and the inside of the first substrate 10, a pad, or the like.
  • the material of the first substrate 10 may be a ceramic material.
  • a green sheet was prepared.
  • a mold was used to apply pressure to the green sheet, and a molded body was produced in which the protrusions were integrated on the base.
  • a green sheet containing alumina particles and having a thickness of 800 ⁇ m was prepared, and a conductive paste was printed on a portion of the surface of each of the green sheets and the green sheet having the protrusions, at the portion that would become the joint of the electric element, to form a wiring ceramic sheet.
  • the conductive paste used contained copper powder and tungsten powder as metal components.
  • the firing conditions were a reducing atmosphere, a maximum temperature of 1600°C, and a holding temperature of 2 hours.
  • the copper foil wiring pattern used in the transfer method was made by attaching solid copper foil to a PET film and then etching it to create a pattern.
  • the prepared wiring organic sheet was placed on top of the wiring ceramic sheet and pressurized and heated.
  • the pressurized and heated conditions were, for example, a temperature of 200°C, a pressure of 0.1 MPa, and a heating time of 5 hours.
  • the base body of the wiring board 1 was prepared.
  • the base body was cut to a specified size to obtain the wiring board 1.
  • a molded body was produced in which the thickness of the green sheet and the height of the convex portion were adjusted. Furthermore, for the wiring substrate in which the inner wall facing the through hole of the second substrate is located away from the side, a method was adopted in which a silicone-based release agent was applied to the surface of the convex portion and the wiring organic sheet was laminated in this state.
  • All of the wiring boards produced in this manner are highly rigid, and are capable of achieving finer wiring and narrower pitches. It has been confirmed that all of these wiring boards exhibit the above-mentioned effects, regardless of differences in the shapes of the convex portions and wiring organic sheets. This was confirmed by microscopic observation of the wiring, solder heat resistance tests, temperature cycle tests, and electrical property evaluations. These evaluations confirmed that the boards are at a level suitable for practical use, such as for driving semiconductor elements.
  • the wiring board has a first substrate and a second substrate
  • the first substrate includes any one of a ceramic material, a metal material, a carbon material, and a composite material obtained by combining two or more of these materials
  • the second base material contains an organic resin as a main component, has copper foil wiring on its surface, and is laminated on the first base material.
  • the first substrate integrally includes a base portion and a protruding portion that is island-shaped and located toward the center of the first surface away from an outer edge of the first surface when one surface of the base portion is defined as a first surface
  • the second base material has a through hole penetrating in a thickness direction, The second base material may be disposed such that the through hole fits into the protrusion of the first base material.
  • the protrusion when a surface of the protrusion that faces the same direction as the first surface of the first base material is defined as an upper surface, the protrusion has a side surface intersecting the upper surface and a ridge portion connecting the side surface and the upper surface, An inner wall of the second base material facing the through hole may be in contact with a range extending from the side surface of the protrusion to the ridge portion.
  • the ridge portion may be chamfered.
  • the protrusion when a surface of the protrusion that faces the same direction as the first surface of the first base material is defined as an upper surface, The protrusion has a side surface intersecting with the upper surface, the first base material has a corner portion where the first surface and the side surface of the protrusion are connected, The second substrate may be in contact with the corner.
  • the corner portion may have a concave curved shape from the first surface to the side surface of the protruding portion.
  • the protruding portion has a side surface intersecting with the top surface, a first R-chamfered portion located at a ridge where the side surface intersects with the top surface, and a second R-chamfered portion located at a corner where the side surface intersects with the first surface and curved concavely,
  • An inner wall of the second base material facing the through hole may be in contact with an area extending from the side surface of the protrusion to the first R-chamfered portion and the second R-chamfered portion.
  • the wiring may be embedded in a surface portion of the second substrate.
  • the front surface of the wiring may be flush with the surface of the second substrate.

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  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Power Engineering (AREA)
  • Structure Of Printed Boards (AREA)

Abstract

This circuit board has a first substrate and a second substrate. The first substrate includes a ceramic material, a metal material, a carbon material, and a composite that combines two or more thereof. The second substrate includes an organic resin as a main component, has a copper foil wiring on the surface thereof, and is laminated on the first substrate.

Description

配線基板Wiring Board

 開示の実施形態は、配線基板に関する。 The disclosed embodiment relates to a wiring board.

 従来、LSIなど各種の半導体素子を搭載するための配線基板としてセラミックス製のものが多用されてきている。これは、セラミックスが高い剛性を有し、熱膨張率が半導体素子の熱膨張率に近いことに起因している。このため、セラミックスなど剛性の高い素材を絶縁層に用いた配線基板は、半導体素子が駆動時に発熱しても配線基板が変形しにくく、機械的、力学的な点で高い信頼性を示すものとなっている。  Traditionally, ceramics have been widely used as wiring boards for mounting various semiconductor elements such as LSIs. This is because ceramics have high rigidity and a thermal expansion coefficient close to that of semiconductor elements. For this reason, wiring boards that use highly rigid materials such as ceramics for the insulating layer are less likely to deform even when the semiconductor elements generate heat when they are operating, and they exhibit high mechanical and dynamic reliability.

特開2017-188581号公報JP 2017-188581 A

 実施形態の一態様に係る配線基板は、第1基材と、第2基材とを有する。第1基材は、セラミック材料、金属材料、炭素材料およびこれらの材料を2種以上組み合わせた複合体のうちいずれかの材料を含む。第2基材は、有機樹脂を主成分として含み、その表面に銅箔製の配線を有し、第1基材上に積層されている。 The wiring board according to one aspect of the embodiment has a first substrate and a second substrate. The first substrate contains any of the following materials: ceramic material, metal material, carbon material, and a composite of two or more of these materials. The second substrate contains an organic resin as a main component, has copper foil wiring on its surface, and is laminated on the first substrate.

図1は、第1実施形態に係る配線基板の一例を示す分解斜視図である。FIG. 1 is an exploded perspective view showing an example of a wiring board according to a first embodiment. 図2は、第1実施形態に係る配線基板の一例を示す斜視図である。FIG. 2 is a perspective view illustrating an example of the wiring board according to the first embodiment. 図3は、図2のA-A断面図である。FIG. 3 is a cross-sectional view taken along line AA of FIG. 図4は、図2のB-B断面図である。FIG. 4 is a cross-sectional view taken along line BB of FIG. 図5は、第2実施形態に係る配線基板の一例を示す断面図である。FIG. 5 is a cross-sectional view showing an example of a wiring board according to the second embodiment. 図6は、第3実施形態に係る配線基板の一例を示す断面図である。FIG. 6 is a cross-sectional view showing an example of a wiring board according to the third embodiment. 図7は、第4実施形態に係る配線基板の一例を示す断面図である。FIG. 7 is a cross-sectional view showing an example of a wiring board according to the fourth embodiment. 図8は、第5実施形態に係る配線基板の一例を示す断面図である。FIG. 8 is a cross-sectional view showing an example of a wiring board according to the fifth embodiment. 図9は、第6実施形態に係る配線基板の一例を示す断面図である。FIG. 9 is a cross-sectional view showing an example of a wiring board according to the sixth embodiment. 図10は、第7実施形態に係る配線基板の一例を示す断面図である。FIG. 10 is a cross-sectional view illustrating an example of a wiring board according to the seventh embodiment.

 近年、LSIなどの各種半導体素子は、演算の高速化に加えて、通信容量の増加などの性能向上に対応させるために、石(素子)1個に形成されるトランジスタ数およびゲート数が増加してきている。 In recent years, the number of transistors and gates formed in each element of various semiconductor elements such as LSIs has been increasing in order to accommodate performance improvements such as faster calculations and increased communication capacity.

 半導体素子のこのような状況の変化に対応するために、配線基板もこれに形成される接続端子および配線数の増加を余儀なくされている。このため、配線基板は、配線の微細化とともに狭ピッチ化がますます要求されている。 In order to keep up with these changes in semiconductor elements, wiring boards are being forced to increase the number of connection terminals and wiring formed on them. For this reason, wiring boards are increasingly being required to have finer wiring and narrower pitches.

 そこで、上記したセラミックス製の配線基板のように剛性が高いことに加えて、配線の微細化および狭ピッチ化を実現することができる配線基板の提供が期待されている。 Therefore, there is a demand for wiring boards that are highly rigid like the ceramic wiring boards mentioned above, and that also enable finer wiring and narrower pitches.

 以下に、本開示による多層基板を実施するための形態(以下、「実施形態」と記載する)について図面を参照しつつ詳細に説明する。なお、この実施形態により本開示による配線基板が限定されるものではない。また、各実施形態は、処理内容を矛盾させない範囲で適宜組み合わせることが可能である。 Below, a detailed description will be given of a form for implementing a multilayer board according to the present disclosure (hereinafter, referred to as an "embodiment") with reference to the drawings. Note that the wiring board according to the present disclosure is not limited to this embodiment. Furthermore, each embodiment can be appropriately combined as long as the processing content is not contradictory.

 以下において、同一または類似の構成については同一の符号を付し、詳細な説明を省略する。なお、以下参照する各図面では、説明を分かりやすくするために、互いに直交するX軸方向、Y軸方向およびZ軸方向を規定し、Z軸正方向を鉛直上向き方向とする直交座標系に由来する表現を用いる場合がある。 In the following, identical or similar components are given the same reference numerals, and detailed explanations are omitted. In order to make the explanation easier to understand, the drawings referred to below may use expressions derived from an orthogonal coordinate system that defines mutually orthogonal X-axis, Y-axis, and Z-axis directions, with the positive Z-axis direction being the vertically upward direction.

(第1実施形態)
 図1は、第1実施形態に係る多層基板の一例を示す分解斜視図である。図2は、第1実施形態に係る配線基板の一例を示す斜視図である。図3は、図2のA-A断面図である。図1~図3に示すように、第1実施形態に係る配線基板1は、第1基材10と、第2基材20とを有する。
First Embodiment
Fig. 1 is an exploded perspective view showing an example of a multilayer substrate according to the first embodiment. Fig. 2 is a perspective view showing an example of a wiring substrate according to the first embodiment. Fig. 3 is a cross-sectional view taken along line A-A in Fig. 2. As shown in Figs. 1 to 3, the wiring substrate 1 according to the first embodiment has a first substrate 10 and a second substrate 20.

 ここで、第1基材10は、ベース部11を有している。ベース部11は、その形状が平板状である。ベース部11の外形は、例えば、矩形状であるのがよい。矩形状とは、正方形または長方形を基本形とするものである。 Here, the first substrate 10 has a base portion 11. The base portion 11 has a flat plate shape. The outer shape of the base portion 11 is preferably rectangular, for example. A rectangular shape is one that has a square or rectangular basic shape.

 第2基材20も、平板状を成す形状であり、その外形は矩形状である。そして、第2基材20は第1基材10上に積層されている。言い換えると、第1基材10と第2基材20は積層体を成している。 The second substrate 20 also has a flat plate shape and its outer shape is rectangular. The second substrate 20 is layered on the first substrate 10. In other words, the first substrate 10 and the second substrate 20 form a laminate.

 第1基材10は、セラミック材料、金属材料、炭素材料およびこれらの材料を2種以上組み合わせた複合体のうちいずれかの材料を含む。一方、第2基材20は、有機樹脂を主成分として含む。 The first substrate 10 contains one of the following materials: a ceramic material, a metal material, a carbon material, or a composite of two or more of these materials. On the other hand, the second substrate 20 contains an organic resin as a main component.

 配線基板1は、第2基材20がその表面に銅箔製の配線を有する。配線基板1は、銅箔製の配線を形成しやすい有機樹脂製の基材(第2基材20)を、この第2基材20よりも剛性の高い基材(第1基材10)に重ねて一体化した積層体である。 In the wiring board 1, the second substrate 20 has copper foil wiring on its surface. The wiring board 1 is a laminate in which a substrate (second substrate 20) made of organic resin, on which copper foil wiring can be easily formed, is layered and integrated with a substrate (first substrate 10) that is more rigid than the second substrate 20.

 つまり、配線基板1は、微細な配線形成が可能な銅箔を接着しやすい有機樹脂製の第2基材20と、第2基材20よりも剛性の高い第1基材10とを積層させることで、第2基材20の剛性を第1基材10で補うかたちの構造体である。こうして、第1実施形態の一態様を成す配線基板1によれば、剛性が高く、配線の微細化および狭ピッチ化を実現できる。 In other words, the wiring board 1 is a structure in which a second substrate 20 made of an organic resin, which is easy to adhere to copper foil that allows fine wiring to be formed, and a first substrate 10, which is more rigid than the second substrate 20, are laminated together, so that the rigidity of the second substrate 20 is compensated for by the first substrate 10. Thus, the wiring board 1, which constitutes one aspect of the first embodiment, has high rigidity and can achieve finer wiring and narrower pitches.

 次に、この配線基板1は、以下に示す構成をとることもできる。まず、配線基板1を構成する第1基材10は、ベース部11の片方の面を第1面111としたときに、第1面111上に凸部12を有してもよい。その凸部12は、第1面111の中央の位置に配置されている。言い換えると、ベース部11と凸部12とは一体物であるのがよい。 Next, the wiring board 1 can also have the following configuration. First, the first substrate 10 constituting the wiring board 1 may have a convex portion 12 on the first surface 111 when one surface of the base portion 11 is the first surface 111. The convex portion 12 is disposed in the center of the first surface 111. In other words, it is preferable that the base portion 11 and the convex portion 12 are one piece.

 第1基材10は、ベース部11と凸部12とを有してもよい。ベース部11は、平板状であってもよい。 The first substrate 10 may have a base portion 11 and a protruding portion 12. The base portion 11 may be flat.

 凸部12は、ベース部11の第1面111上に位置している。凸部12は、第1面111の外辺110から離れた第1面111の中央寄りで島状をなす構造体であってもよい。凸部12は、搭載面121を有する。搭載面121は、電気素子が搭載可能な凸部12の上面である。ここで、凸部12の上面とは、例えば、図1に示すように、その上面がZ軸の正の方向に向いていることに起因した表現である。図1における配線基板1の向きを上下で反対にした場合も搭載面121を上面と表現する場合がある。言い換えると、凸部12の搭載面121をZ軸の負の方向に向かせた場合も搭載面121を上面と表現する場合がある。 The convex portion 12 is located on the first surface 111 of the base portion 11. The convex portion 12 may be an island-shaped structure located toward the center of the first surface 111, away from the outer edge 110 of the first surface 111. The convex portion 12 has a mounting surface 121. The mounting surface 121 is the upper surface of the convex portion 12 on which an electrical element can be mounted. Here, the upper surface of the convex portion 12 is an expression resulting from the fact that the upper surface faces in the positive direction of the Z axis, as shown in FIG. 1, for example. The mounting surface 121 may also be expressed as the upper surface when the wiring board 1 in FIG. 1 is turned upside down. In other words, the mounting surface 121 may also be expressed as the upper surface when the mounting surface 121 of the convex portion 12 faces in the negative direction of the Z axis.

 第1基材10は、例えば、セラミック材料、金属材料、炭素材料およびこれらの材料を2種以上組み合わせた複合体のうちいずれかで構成することができる。セラミック材料は、例えば、酸化アルミニウム質焼結体、窒化アルミニウム質焼結体、ムライト質焼結体、ガラスセラミック焼結体、ガラス母材中に結晶成分を析出させた結晶化ガラス、及び、雲母若しくはチタン酸アルミニウム等の微結晶焼結体であってもよい。金属材料は、例えば、銅、銀、パラジウム、金、白金、アルミニウム、クロム、ニッケル、カドミウム鉛、セレン、マンガン、錫、バナジウム、リチウム、コバルト、及び、チタン等であってもよい。炭素材料は、例えば、グラファイトであってもよい。 The first substrate 10 may be made of, for example, a ceramic material, a metal material, a carbon material, or a composite of two or more of these materials. The ceramic material may be, for example, an aluminum oxide sintered body, an aluminum nitride sintered body, a mullite sintered body, a glass ceramic sintered body, a crystallized glass in which crystal components are precipitated in a glass matrix, or a microcrystalline sintered body such as mica or aluminum titanate. The metal material may be, for example, copper, silver, palladium, gold, platinum, aluminum, chromium, nickel, cadmium-lead, selenium, manganese, tin, vanadium, lithium, cobalt, titanium, or the like. The carbon material may be, for example, graphite.

 第1基材10は、ベース部11と凸部12とが一体化しているのがよい。例えば、ベース部11と凸部12との間には、積層界面を有しない方がよい。また、ベース部11と凸部12との間には、例えば、接着材など、第1基材10を構成する材料以外の材料が含まれない方がよい。 The first substrate 10 preferably has a base portion 11 and a protruding portion 12 that are integrated together. For example, it is preferable that there is no lamination interface between the base portion 11 and the protruding portion 12. In addition, it is preferable that there is no material other than the material that constitutes the first substrate 10, such as an adhesive, between the base portion 11 and the protruding portion 12.

 第2基材20は、第1基材10の第1面111上に積層されている。第2基材20は、平板状であり、厚み方向の両端に位置する第2面201および第3面202を有する。第2面201は、第1基材10の搭載面121と同じ方向を向く第2基材20の表面である。第3面202は、第2面201とは反対側に位置しており、第1基材10の第1面111と向かい合って位置している。 The second substrate 20 is laminated on the first surface 111 of the first substrate 10. The second substrate 20 is flat, and has a second surface 201 and a third surface 202 located at both ends in the thickness direction. The second surface 201 is the surface of the second substrate 20 facing in the same direction as the mounting surface 121 of the first substrate 10. The third surface 202 is located on the opposite side to the second surface 201, and faces the first surface 111 of the first substrate 10.

 第2基材20は、厚み方向に貫通する貫通孔21を有する。 The second substrate 20 has a through hole 21 that penetrates in the thickness direction.

 第2基材20は、有機樹脂を主成分として含む。有機樹脂は、例えば、エポキシ樹脂、アクリル樹脂、ポリカーボネート樹脂、ポリイミド樹脂、オレフィン樹脂、ポリフェニレン樹脂であってもよい。有機樹脂は、例えばポリテトラフルオロエチレン(PTFE)その他のフッ素樹脂またはポリフェニレンエーテル樹脂であってもよい。第2基材20は、有機樹脂以外の成分を含んでもよい。 The second substrate 20 contains an organic resin as a main component. The organic resin may be, for example, an epoxy resin, an acrylic resin, a polycarbonate resin, a polyimide resin, an olefin resin, or a polyphenylene resin. The organic resin may be, for example, polytetrafluoroethylene (PTFE) or other fluororesins or polyphenylene ether resins. The second substrate 20 may contain components other than the organic resin.

 第1基材10および第2基材20は、第2基材20の貫通孔21が、第1基材10の凸部12に嵌まるように位置している。 The first substrate 10 and the second substrate 20 are positioned so that the through hole 21 of the second substrate 20 fits into the protrusion 12 of the first substrate 10.

 例えば、第2基材20と比較して剛性の高い第1基材10で形成された凸部12に搭載面121が位置することから、搭載面121に搭載された電気素子が変形しにくい。特に、第2基材20の第2面201に位置する配線の材料として銅箔を用いることにより、配線の微細化および狭ピッチ化が可能となる。さらに、銅箔製の配線が、第1基材10と比較して剛性の低い第2基材20に設けられる構成であることから、残留応力の蓄積が小さい。したがって、本実施形態によれば、変形しにくく、例えば、線幅50μm以下、ピッチ100μm(線間距離50μm)以下といった、配線の微細化と狭ピッチ化が可能な配線基板1を得ることができる。 For example, since the mounting surface 121 is located on the convex portion 12 formed on the first substrate 10, which has a higher rigidity than the second substrate 20, the electrical element mounted on the mounting surface 121 is less likely to deform. In particular, by using copper foil as the material for the wiring located on the second surface 201 of the second substrate 20, it is possible to make the wiring finer and narrower in pitch. Furthermore, since the copper foil wiring is provided on the second substrate 20, which has a lower rigidity than the first substrate 10, the accumulation of residual stress is small. Therefore, according to this embodiment, it is possible to obtain a wiring board 1 that is less likely to deform and allows for finer wiring and narrower pitch, for example, with a line width of 50 μm or less and a pitch of 100 μm (line distance of 50 μm) or less.

 また、図3に示すように、第1基材10の凸部12が有する搭載面121と第2基材20の表面に位置する第2面201とが面一であってもよい。第2基材20が第1基材10上に配置されたときに、第1基材10の凸部12より上側に第2基材20がはみ出る部分が無いことから、例えば、第2基材20の中で変形する部分を少なくできる。また、例えば、第2基材20の変形が凸部12によって止められることになるため、第2基材20の全体が変形しにくくなる。 Also, as shown in FIG. 3, the mounting surface 121 of the convex portion 12 of the first substrate 10 and the second surface 201 located on the surface of the second substrate 20 may be flush with each other. When the second substrate 20 is placed on the first substrate 10, there is no portion of the second substrate 20 that protrudes above the convex portion 12 of the first substrate 10, so that, for example, the portion of the second substrate 20 that deforms can be reduced. Also, for example, because the deformation of the second substrate 20 is stopped by the convex portion 12, the entire second substrate 20 is less likely to deform.

 搭載面121と第2面201とが面一であると、例えば、搭載面121と第2面201との間を例えばワイヤボンディング接続したときに、搭載面121に搭載した電気素子から第2面201の配線(素子用端子)へ伸びるボンディングワイヤの長さを最短距離またはこれに近い長さにすることができる。これにより、ボンディングワイヤにおけるインダクタンスを低減することが可能になる。 If the mounting surface 121 and the second surface 201 are flush with each other, for example, when the mounting surface 121 and the second surface 201 are connected by wire bonding, the length of the bonding wire extending from the electrical element mounted on the mounting surface 121 to the wiring (element terminal) on the second surface 201 can be the shortest distance or a length close to this. This makes it possible to reduce the inductance in the bonding wire.

 なお、第1基材10として、例えば、剛性の高い金属製の材料を用いると、搭載面121と第2面201とを面一にしやすくなる。 If, for example, a highly rigid metallic material is used as the first substrate 10, it becomes easier to make the mounting surface 121 and the second surface 201 flush.

 図4は、図2のB-B断面図である。第2基材20は、表面に銅箔製の配線30を有する。 FIG. 4 is a cross-sectional view taken along line B-B in FIG. 2. The second substrate 20 has copper foil wiring 30 on its surface.

 第2面201に位置する配線30は、第2基材20の表面部に埋設されていてもよい。例えば、配線30が第2基材20の第2面201上に突出するように配置されている構成と比較して、第2基材20の中に配線30が埋設されている構成は、第2基材20と配線30との間で相互に拘束力を受けやすくなる。これにより、第2基材20は変形しにくくなる。 The wiring 30 located on the second surface 201 may be embedded in the surface portion of the second substrate 20. For example, compared to a configuration in which the wiring 30 is disposed so as to protrude above the second surface 201 of the second substrate 20, a configuration in which the wiring 30 is embedded in the second substrate 20 makes it easier for the second substrate 20 and the wiring 30 to be subjected to mutual restraining forces. This makes the second substrate 20 less likely to deform.

 このように、配線基板1において、第2基材20は、当該第2基材20よりも剛性の大きい第1基材10に貼り付くかたちで積層されることにより、第2基材20は第1基材10によって拘束される。また、第2基材20は、その表面部に形成された配線30からも拘束される。さらに、第2基材20は、第1基材10の凸部12によっても拘束される。第2基材20のうち、凸部12に近い領域は、凸部12から離れた周辺部に比較して平面方向の拘束力を受けやすい。 In this way, in the wiring board 1, the second substrate 20 is laminated in a manner that it is attached to the first substrate 10, which has greater rigidity than the second substrate 20, and the second substrate 20 is restrained by the first substrate 10. The second substrate 20 is also restrained by the wiring 30 formed on its surface. Furthermore, the second substrate 20 is also restrained by the convex portion 12 of the first substrate 10. The area of the second substrate 20 close to the convex portion 12 is more susceptible to restraining forces in the planar direction than the peripheral area away from the convex portion 12.

 また、配線30のおもて面301は、第2基材20の表面である第2面201と面一であってもよい。これにより、第2基材20はさらに変形しにくくなる。ここで、配線30のおもて面301とは、配線30の面のうち、第2基材20をその上側の位置から平面視したときに、第2基材20から露出している面のことである。 Furthermore, the front surface 301 of the wiring 30 may be flush with the second surface 201, which is the surface of the second substrate 20. This makes the second substrate 20 even less susceptible to deformation. Here, the front surface 301 of the wiring 30 refers to the surface of the wiring 30 that is exposed from the second substrate 20 when the second substrate 20 is viewed in plan from a position above it.

 図4に示す構成は、例えば、PETフィルム上に、予めパターン加工した銅箔製の配線材料を第1基材10となるセラミックのグリーンシートに転写+加圧する方法により作製することができる。必要に応じて、加圧と同時に加熱してもよい。 The structure shown in FIG. 4 can be produced, for example, by transferring and pressurizing a copper foil wiring material that has been patterned in advance onto a PET film, onto a ceramic green sheet that will become the first substrate 10. If necessary, heating may be performed simultaneously with pressing.

(第2実施形態)
 図5は、第2実施形態に係る配線基板の一例を示す断面図である。ここで、図5は、かかる配線基板1の全体を示しているのではなく、第1基材10に設けた凸部12の周辺に近い部分を占めているにすぎない。図5に示すように、第2面201は、搭載面121よりも第1面111からの距離が小さくてもよい。
Second Embodiment
Fig. 5 is a cross-sectional view showing an example of a wiring board according to the second embodiment. Fig. 5 does not show the entire wiring board 1, but only occupies a portion close to the periphery of the protrusion 12 provided on the first base material 10. As shown in Fig. 5, the second surface 201 may be closer to the first surface 111 than the mounting surface 121.

 第2基材20の厚みが、凸部12の位置する第1基材10の厚みよりも薄いことから、第2基材20は、第1基材10の凸部12やベース部11に拘束されやすくなり、より変形しにくくなる。 Since the thickness of the second substrate 20 is thinner than the thickness of the first substrate 10 where the convex portion 12 is located, the second substrate 20 is more easily restrained by the convex portion 12 and the base portion 11 of the first substrate 10, and is less likely to deform.

 また、凸部12が第2基材20の第2面201よりも突出していることから、凸部12をカメラ認識する際に、凸部12の搭載面の辺となっている稜線とともに、凸部12の側面の一部が見えやすくなる。このため、本実施形態に係る配線基板1によれば、例えば、画像認識が容易になる。 In addition, because the convex portion 12 protrudes beyond the second surface 201 of the second substrate 20, when the convex portion 12 is recognized by a camera, a part of the side surface of the convex portion 12 is easily visible, along with the ridge line that forms the edge of the mounting surface of the convex portion 12. Therefore, the wiring board 1 according to this embodiment makes it easy to recognize images, for example.

 なお、図5では、第2基材20が、第1基材10の第1面111に接している部分の全域で、その厚みが同じである構成について示しているが、これに限らず、例えば、第2基材20のうち、少なくとも凸部12に近い部分が、搭載面121よりも第1面111からの距離が小さくてもよい。第2基材20の厚みが同じである場合、例えば、第2基材20の変形の偏り、変形量のばらつきが小さくなる。 Note that FIG. 5 shows a configuration in which the second substrate 20 has the same thickness over the entire area where it is in contact with the first surface 111 of the first substrate 10, but this is not limiting, and for example, at least a portion of the second substrate 20 close to the convex portion 12 may be closer to the first surface 111 than the mounting surface 121. When the second substrate 20 has the same thickness, for example, the bias in deformation of the second substrate 20 and the variation in the amount of deformation are reduced.

 図5に示す構成は、例えば、積層機の上側には製品にあたったときに変形しやすいゴム型などを用いることにより作製することができる。 The configuration shown in Figure 5 can be produced, for example, by using a rubber mold on the upper side of the lamination machine that is easily deformed when it hits the product.

(第3実施形態)
 図6は、第3実施形態に係る配線基板の一例を示す断面図である。図6に示すように、第2基材20の表面(第2面201)のうち、凸部12に近い部分の表面(第2面201)は、凸部12の上面(搭載面121)よりも高い位置にあってもよい。言い換えると、第2面201は、搭載面121よりも第1面111からの距離が大きくてもよい。
Third Embodiment
6 is a cross-sectional view showing an example of a wiring board according to the third embodiment. As shown in FIG. 6, the surface (second surface 201) of the second base material 20, which is a portion close to the protrusion 12, may be located higher than the upper surface (mounting surface 121) of the protrusion 12. In other words, the second surface 201 may be located at a greater distance from the first surface 111 than the mounting surface 121.

 第2基材20の厚みが厚く、第2基材20の第2面201が凸部12の搭載面121よりも第1面111から離れていることから、第2基材20は、例えば、凸部12の搭載面121から上の部分にはみ出た部分を有することとなる。 Since the second substrate 20 is thick and the second surface 201 of the second substrate 20 is farther from the first surface 111 than the mounting surface 121 of the convex portion 12, the second substrate 20 has, for example, a portion that protrudes above the mounting surface 121 of the convex portion 12.

 第2基材20は、第1基材10の第1面111に近く、第1基材10に拘束されやすい部分と、第1面111または凸部12の搭載面121から遠く、第1基材10に拘束されにくい部分とを、第1基材10の厚み方向に有する構成となる。 The second substrate 20 has a portion in the thickness direction of the first substrate 10 that is close to the first surface 111 of the first substrate 10 and is easily constrained by the first substrate 10, and a portion that is far from the first surface 111 or the mounting surface 121 of the convex portion 12 and is not easily constrained by the first substrate 10.

 第2基材20のうち、凸部12の搭載面121から上の部分は、例えば、配線基板1に曲がりの負荷がかかったときに、その際発生する応力を緩和してくれる部分となり、引っ張り応力、圧縮応力の両方に対抗できる。その結果、例えば、配線基板1に機械的な負荷がかかった際にも、基板材料や配線に損傷が発生しにくくなる。 The portion of the second substrate 20 above the mounting surface 121 of the protrusion 12 serves as a part that relieves the stress that occurs when, for example, a bending load is applied to the wiring substrate 1, and can withstand both tensile stress and compressive stress. As a result, for example, even when a mechanical load is applied to the wiring substrate 1, damage to the substrate material and wiring is less likely to occur.

 また、本構成では、例えば、搭載面121に実装される電気素子(不図示)と第2基材20上に形成される接続端子(不図示)との間を結線するボンディングワイヤ(不図示)を直線状の形状にできることから、インダクタンスの低減につながる。 In addition, in this configuration, for example, the bonding wire (not shown) that connects between the electrical element (not shown) mounted on the mounting surface 121 and the connection terminal (not shown) formed on the second substrate 20 can be made linear, which leads to a reduction in inductance.

 なお、図6では、第2基材20が、第1基材10の第1面111に接している部分の全域で、その厚みが同じである構成について示しているが、これに限らず、例えば、第2基材20のうち、少なくとも凸部12に近い部分において、搭載面121よりも第1面111からの距離が大きくてもよい。第2基材20の厚みが同じである場合、例えば、第2基材20の変形の偏り、変形量のばらつきが小さくなる。 Note that FIG. 6 shows a configuration in which the second substrate 20 has the same thickness over the entire area where it contacts the first surface 111 of the first substrate 10, but this is not limiting. For example, at least a portion of the second substrate 20 close to the convex portion 12 may be at a greater distance from the first surface 111 than the mounting surface 121. When the second substrate 20 has the same thickness, for example, the bias in deformation of the second substrate 20 and the variation in the amount of deformation are reduced.

 図6に示す構成は、例えば、逆凸状の金型/ゴム型などを用いることにより作製することができる。 The configuration shown in Figure 6 can be produced, for example, by using an inverted convex mold/rubber mold.

(第4実施形態)
 ここで、図3に示した配線基板1について、さらに言及すると、この配線基板1は、第1基材10を構成する凸部12のうち、第1基材10の第1面111と同じ方向を向く面を上面(搭載面121)としたときに、凸部12は上面(搭載面121)と交差する側面122と、この側面122と上面(搭載面121)とがつながる稜線部123Aとを有している。そして、第2基材20は、貫通孔21に面する第2基材20の内壁20Aが凸部12の側面122から稜線部123Aにかけて接しているのがよい。
Fourth Embodiment
3, when the surface of the protruding portion 12 constituting the first base material 10 that faces the same direction as the first surface 111 of the first base material 10 is defined as the upper surface (mounting surface 121), the protruding portion 12 has a side surface 122 that intersects with the upper surface (mounting surface 121) and a ridge portion 123A that connects the side surface 122 and the upper surface (mounting surface 121). The second base material 20 is preferably configured such that the inner wall 20A of the second base material 20 that faces the through hole 21 contacts the protruding portion 12 from the side surface 122 to the ridge portion 123A.

 図7は、第4実施形態に係る配線基板の一例を示す断面図である。図7に示すように、配線基板1は、凸部12の側面122から上面(搭載面121)につながる稜線部123A(図3参照)が、いわゆる、面取りされた形状を成していてもよい。言い換えると、図7に示すように、配線基板1は、凸部12の側面122と上面(搭載面121)とが交差する角部が丸みを帯びていてもよい。さらに言い換えると、図7に示す配線基板1は、凸部12の側面122から上面(搭載面121)につながる角部(稜線部123Aに相当)の表面が湾曲していてもよい。 FIG. 7 is a cross-sectional view showing an example of a wiring board according to the fourth embodiment. As shown in FIG. 7, the wiring board 1 may have a so-called chamfered shape at the ridge portion 123A (see FIG. 3) connecting the side surface 122 of the convex portion 12 to the upper surface (mounting surface 121). In other words, as shown in FIG. 7, the wiring board 1 may have rounded corners where the side surface 122 and the upper surface (mounting surface 121) of the convex portion 12 intersect. In other words, the wiring board 1 shown in FIG. 7 may have a curved surface at the corner (corresponding to the ridge portion 123A) connecting the side surface 122 of the convex portion 12 to the upper surface (mounting surface 121).

 図7において稜線部123Aは、図7の紙面の奥行の方向に延びるように配置されていてもよい。ここで、凸部12の側面122と上面(搭載面121)とが交差する角部が丸みを帯びている部分のことを、以下、第1R面取部123と表記する。言い換えると、第1R面取部123は、凸部12の側面122から上面(搭載面121)につながる角部の表面が湾曲している部分である。 In FIG. 7, ridge portion 123A may be disposed so as to extend in the direction into the depth of the paper on which FIG. 7 is drawn. Hereinafter, the rounded corner where side surface 122 and top surface (mounting surface 121) of protrusion 12 intersect is referred to as first R-chamfered portion 123. In other words, first R-chamfered portion 123 is the curved surface of the corner that connects side surface 122 to top surface (mounting surface 121) of protrusion 12.

 図7に示すように、凸部12は、側面122と、第1R面取部123とを有してもよい。側面122は、搭載面121と交差する面である。第1R面取部123は、側面122と搭載面121とが交差する稜線部に位置し、凸状に湾曲する部分である。 As shown in FIG. 7, the protrusion 12 may have a side surface 122 and a first R-chamfered portion 123. The side surface 122 is a surface that intersects with the mounting surface 121. The first R-chamfered portion 123 is located on the ridge where the side surface 122 and the mounting surface 121 intersect, and is a portion that is curved in a convex shape.

 第2基材20は、貫通孔21の内壁が凸部12の側面122から第1R面取部123にかけて接していてもよい。第1基材10は、凸部12が第1R面取部123を有することから、凸部12の稜線部が第1R面取部123を有しない単なる角状である場合と比較して、第2基材20の貫通孔21の内壁と第1基材10との接触面積が大きくなる。これにより、第2基材20は第1基材10に対して固定力が増し、より変形しにくくなる。したがって、本実施形態に係る配線基板1によれば、例えば、第2基材20のうちの搭載面121側の表面部がはがれにくくなる。 The second substrate 20 may have an inner wall of the through hole 21 in contact with the side surface 122 of the convex portion 12 from the first R chamfered portion 123. Since the convex portion 12 of the first substrate 10 has the first R chamfered portion 123, the contact area between the inner wall of the through hole 21 of the second substrate 20 and the first substrate 10 is larger than when the ridge portion of the convex portion 12 is simply angular without the first R chamfered portion 123. This increases the fixing force of the second substrate 20 to the first substrate 10, making it less likely to deform. Therefore, according to the wiring board 1 of this embodiment, for example, the surface portion of the second substrate 20 on the mounting surface 121 side is less likely to peel off.

(第5実施形態)
 図8は、第5実施形態に係る配線基板の一例を示す断面図である。
Fifth Embodiment
FIG. 8 is a cross-sectional view showing an example of a wiring board according to the fifth embodiment.

 ここで、図7の説明に引き続いて、図3に示した配線基板1について、さらに言及すると、この配線基板1は、第1基材10の第1面111と凸部12の側面122とがつながる隅部124Aを有している。そして、第2基材20は、隅部124Aに接しているのがよい。 Following the explanation of FIG. 7, referring further to the wiring board 1 shown in FIG. 3, this wiring board 1 has a corner portion 124A where the first surface 111 of the first substrate 10 and the side surface 122 of the protrusion 12 are connected. It is preferable that the second substrate 20 contacts the corner portion 124A.

 図8に示すように、配線基板1は、第1面111から凸部12の側面122につながる隅部124A(図3参照)が、第1面111から凸部12の側面122にかけて凹状に湾曲した形状を成していてもよい。言い換えると、図8に示すように、配線基板1は、第1面111と凸部12の側面122とが交差する隅部124Aが丸みを帯びていてもよい。 8, the wiring board 1 may have a corner 124A (see FIG. 3) that connects from the first surface 111 to the side surface 122 of the convex portion 12, which is curved concavely from the first surface 111 to the side surface 122 of the convex portion 12. In other words, as shown in FIG. 8, the wiring board 1 may have a rounded corner 124A where the first surface 111 and the side surface 122 of the convex portion 12 intersect.

 図8において隅部124Aは、図8の紙面の奥行の方向に延びるように配置されていてもよい。ここで、第1面111と凸部12の側面122とが交差する隅部124Aが凹状に丸みを帯びている部分のことを、以下、第2R面取部124と表記する。 In FIG. 8, the corner portion 124A may be disposed so as to extend in the direction of the depth of the paper on which FIG. 8 is drawn. Hereinafter, the portion of the corner portion 124A where the first surface 111 and the side surface 122 of the protrusion 12 intersect and which is rounded in a concave shape will be referred to as the second R-chamfered portion 124.

 図8に示すように、凸部12は、側面122と、第2R面取部124とを有してもよい。側面122は、搭載面121と交差する面である。第2R面取部124は、側面122と第1面111とが交差する隅部に位置し、凹状に湾曲する部分である。 As shown in FIG. 8, the protrusion 12 may have a side surface 122 and a second R-chamfered portion 124. The side surface 122 is a surface that intersects with the mounting surface 121. The second R-chamfered portion 124 is located at the corner where the side surface 122 and the first surface 111 intersect, and is a concavely curved portion.

 第2基材20は、貫通孔21の内壁が凸部12の側面122から第2R面取部124にかけて接していてもよい。第1基材10は、凸部12が第2R面取部124を有することから、凸部12の隅部が第2R面取部124を有しない単なる角状である場合と比較して、第2基材20の貫通孔21の内壁と第1基材10との接触面積が大きくなる。これにより、第2基材20は第1基材10に対して固定力が増し、より変形しにくくなる。 The second substrate 20 may have the inner wall of the through hole 21 in contact with the side surface 122 of the convex portion 12 from the second R chamfered portion 124. Since the convex portion 12 of the first substrate 10 has the second R chamfered portion 124, the contact area between the inner wall of the through hole 21 of the second substrate 20 and the first substrate 10 is larger than when the corner of the convex portion 12 is simply angular and does not have the second R chamfered portion 124. This increases the fixing force of the second substrate 20 to the first substrate 10, making it less likely to deform.

 なお、図7、図8に示す第1基材10は、例えば、セラミック焼結体を、専用の金型を用いて形成したグリーンシートを用いて作製することで形成できる。 The first substrate 10 shown in Figures 7 and 8 can be formed, for example, by producing a ceramic sintered body using a green sheet formed using a dedicated mold.

(第6実施形態)
 図9は、第6実施形態に係る配線基板の一例を示す断面図である。図9に示すように、凸部12は、側面122と、第1R面取部123と、第2R面取部124とを有してもよい。側面122は、搭載面121と交差する面である。第1R面取部123は、側面122と搭載面121とが交差する稜線部に位置し、凸状に湾曲する部分である。第2R面取部124は、側面122と第1面111とが交差する隅部に位置し、凹状に湾曲する部分である。
Sixth Embodiment
9 is a cross-sectional view showing an example of a wiring board according to the sixth embodiment. As shown in FIG. 9, the protrusion 12 may have a side surface 122, a first R-chamfered portion 123, and a second R-chamfered portion 124. The side surface 122 is a surface that intersects with the mounting surface 121. The first R-chamfered portion 123 is a portion that is located at a ridge where the side surface 122 and the mounting surface 121 intersect, and is curved in a convex shape. The second R-chamfered portion 124 is a portion that is located at a corner where the side surface 122 and the first surface 111 intersect, and is curved in a concave shape.

 第2基材20は、貫通孔21の内壁が凸部12の側面122から第1R面取部123および第2R面取部124にかけて接していてもよい。 The second substrate 20 may have the inner wall of the through hole 21 in contact with the side surface 122 of the protrusion 12 from the first R chamfered portion 123 to the second R chamfered portion 124.

 第1基材10は、凸部12が第1R面取部123を有することから、凸部12の稜線部が第1R面取部123を有しない単なる角状である場合と比較して、第2基材20の貫通孔21の内壁と第1基材10との接触面積が大きくなる。また、第1基材10は、凸部12が第2R面取部124を有することから、凸部12の隅部が第2R面取部124を有しない単なる角状である場合と比較して、第2基材20の貫通孔21の内壁と第1基材10との接触面積が大きくなる。これにより、第2基材20は第1基材10に対して固定力が増し、より変形しにくくなる。 Since the convex portion 12 of the first substrate 10 has the first R chamfered portion 123, the contact area between the inner wall of the through hole 21 of the second substrate 20 and the first substrate 10 is larger than when the ridge portion of the convex portion 12 is simply angular without the first R chamfered portion 123. Also, since the convex portion 12 of the first substrate 10 has the second R chamfered portion 124, the contact area between the inner wall of the through hole 21 of the second substrate 20 and the first substrate 10 is larger than when the corner of the convex portion 12 is simply angular without the second R chamfered portion 124. This increases the fixing force of the second substrate 20 to the first substrate 10, making it less likely to deform.

(第7実施形態)
 図10は、第7実施形態に係る配線基板の一例を示す断面図である。図10に示すように、凸部12は、搭載面121と交差する側面122を有している。この場合、第2基材20の貫通孔21に面する内壁と側面122とは離間していてもよい。
Seventh Embodiment
Fig. 10 is a cross-sectional view showing an example of a wiring board according to the seventh embodiment. As shown in Fig. 10, the protrusion 12 has a side surface 122 intersecting with a mounting surface 121. In this case, the inner wall facing the through hole 21 of the second base material 20 and the side surface 122 may be spaced apart.

 例えば、凸部12の搭載面121に高発熱性の電気素子を搭載する場合であっても、配線部を受け持つ第2基材20に電気素子からの熱が伝わりにくくなり、配線部の抵抗が温度によって変化するのを抑えることが可能になる。また、第2基材20の熱膨張による変形量を小さくできることから、配線30(図4参照)における伝送特性の安定化を図ることが可能になる。さらに、例えば搭載面121に電気素子を実装するときに用いる樹脂が、搭載面121から外に流れて広がった場合であっても、第2基材20の第2面201に樹脂が到達しにくいことから、配線基板1の出来栄え(外観)不良が発生しにくくなる。 For example, even when a highly heat-generating electrical element is mounted on the mounting surface 121 of the protrusion 12, heat from the electrical element is less likely to be transferred to the second substrate 20 that carries the wiring section, making it possible to suppress changes in the resistance of the wiring section due to temperature. In addition, since the amount of deformation due to thermal expansion of the second substrate 20 can be reduced, it is possible to stabilize the transmission characteristics of the wiring 30 (see FIG. 4). Furthermore, even if, for example, the resin used to mount the electrical element on the mounting surface 121 flows and spreads outward from the mounting surface 121, the resin is less likely to reach the second surface 201 of the second substrate 20, making it less likely that defects in the finish (appearance) of the wiring board 1 will occur.

 なお、図10に示す構成は、例えば、予め凸部12よりも大きな穴(貫通孔)を、第2基材20の材料であるHybridシートに形成しておき、弾性プレスによってこの隙間を維持することにより作製することができる。また、第2基材20を第1基材10上に重ねる前に、第1基材10の凸部12の側面122に、例えば、シリコーン系の離型剤を塗布してもよい。離型剤が塗布された第1基材10は、加圧加熱後の冷却時に第2基材20よりも収縮しにくくなる場合がある。この作用を利用して本実施形態に係る配線基板1を作製してもよい。 The configuration shown in FIG. 10 can be produced, for example, by forming holes (through holes) larger than the protrusions 12 in advance in a hybrid sheet, which is the material of the second substrate 20, and maintaining this gap by elastic pressing. Also, before the second substrate 20 is superimposed on the first substrate 10, a silicone-based release agent, for example, may be applied to the side surface 122 of the protrusions 12 of the first substrate 10. The first substrate 10 to which the release agent has been applied may be less likely to shrink than the second substrate 20 when cooled after being pressurized and heated. This effect may be utilized to produce the wiring board 1 according to this embodiment.

(その他の実施形態)
 上記した各実施形態において、第1基材10は、導体を有していてもよい。第1基材10は、導体として、例えば、第1基材10を厚み方向に延びるビア導体、第1基材10の表面および内部の少なくとも一方に形成された配線、パッド等を有していてもよい。かかる構成を有する場合、例えば、第1基材10の材料がセラミック材料であってもよい。
Other Embodiments
In each of the above-described embodiments, the first substrate 10 may have a conductor. The first substrate 10 may have, as the conductor, for example, a via conductor extending in the thickness direction of the first substrate 10, wiring formed on at least one of the surface and the inside of the first substrate 10, a pad, or the like. When having such a configuration, for example, the material of the first substrate 10 may be a ceramic material.

(製造方法)
 以下、本開示の配線基板1の製造方法の一例を具体的に説明する。なお、本開示は以下の製造方法で作製された配線基板1に限定されるものではない。
(Production method)
An example of a method for manufacturing the wiring board 1 according to the present disclosure will be specifically described below. Note that the present disclosure is not limited to the wiring board 1 manufactured by the following manufacturing method.

[第1基材]
 まず、グリーンシートを用意した。また、このグリーンシートに対して金型を用いて加圧処理を行い、ベース部上に凸部が一体化した成形体を作製した。具体的には、例えば、アルミナ粒子を含む厚み800μmのグリーンシートを用意し、これらのグリーンシートおよび凸部を有するグリーンシートのそれぞれの表面の一部に、電気素子の接合部となる部分に導体ペーストを印刷して配線セラミックシートを形成した。導体ペーストには金属成分として銅粉末およびタングステン粉末を含むものを用いた。
[First substrate]
First, a green sheet was prepared. A mold was used to apply pressure to the green sheet, and a molded body was produced in which the protrusions were integrated on the base. Specifically, for example, a green sheet containing alumina particles and having a thickness of 800 μm was prepared, and a conductive paste was printed on a portion of the surface of each of the green sheets and the green sheet having the protrusions, at the portion that would become the joint of the electric element, to form a wiring ceramic sheet. The conductive paste used contained copper powder and tungsten powder as metal components.

 次に、作製したそれぞれの配線セラミックシートを焼成した。焼成は、還元雰囲気中、最高温度を1600℃とし、保持温度を2時間とする条件とした。 Next, each of the wiring ceramic sheets that had been produced was fired. The firing conditions were a reducing atmosphere, a maximum temperature of 1600°C, and a holding temperature of 2 hours.

[第2基材]
 まず、熱硬化性エポキシ樹脂にシリカ粉末を含む(複合材料)未硬化シートを準備した。シリカ粉末の添加量は、エポキシ樹脂100質量部に対して150質量部とした。
[Second substrate]
First, an uncured sheet (composite material) containing silica powder in a thermosetting epoxy resin was prepared. The amount of silica powder added was 150 parts by mass per 100 parts by mass of the epoxy resin.

 次に、作製した未硬化シートに銅箔製の配線を転写して配線有機シートを作製した。転写法に用いる銅箔製の配線パターンは、PETフィルムにベタの銅箔を貼り付けたものをエッチングによりパターン加工したものを用いた。 Next, copper foil wiring was transferred onto the uncured sheet to create a wiring organic sheet. The copper foil wiring pattern used in the transfer method was made by attaching solid copper foil to a PET film and then etching it to create a pattern.

 次いで、作製した配線有機シートを配線セラミックシートに重ねて加圧加熱を行った。加圧加熱は、例えば、温度200℃、圧力0.1MPa、加熱時間5時間の条件とした。このようにして、配線基板1の母体を作製した。次に、かかる母体を所定のサイズに切断して配線基板1を得た。 Then, the prepared wiring organic sheet was placed on top of the wiring ceramic sheet and pressurized and heated. The pressurized and heated conditions were, for example, a temperature of 200°C, a pressure of 0.1 MPa, and a heating time of 5 hours. In this way, the base body of the wiring board 1 was prepared. Next, the base body was cut to a specified size to obtain the wiring board 1.

[第1R面取部/第2R面取部]
 ここで、凸部12が第1R面取部123および/または第2R面取部124を有する構造体については、所望の形状に応じた専用の金型を用いることで作製した。
[First R-chamfered portion/Second R-chamfered portion]
Here, the structure in which the protrusion 12 has the first R-chamfered portion 123 and/or the second R-chamfered portion 124 was produced by using a dedicated mold corresponding to the desired shape.

 また、第2基材の表面のうち凸部に近い部分の表面が、凸部の上面よりも低い位置にある配線基板、第2基材の表面のうち凸部に近い部分の表面が、凸部の上面よりも高い位置にある配線基板、凸部が第1R面取部を有する配線基板、第1基材の隅部に第2R面取部を有する配線基板、凸部が第1R面取部を有し、かつ、第1基材の隅部に第2R面取部を有する配線基板については、それぞれに対して、グリーンシートの厚みと凸部の高さを調整した成形体を作製した。さらに、第2基材の貫通孔に面する内壁が側面から離間した位置にある構造の配線基板については、凸部の表面にシリコーン系の離型剤を塗布しておき、この状態で配線有機シートを積層する方法を採用した。 Furthermore, for the wiring board in which the surface of the second substrate near the convex portion is located lower than the upper surface of the convex portion, the wiring board in which the surface of the second substrate near the convex portion is located higher than the upper surface of the convex portion, the wiring board in which the convex portion has a first R chamfered portion, the wiring board in which the corner of the first substrate has a second R chamfered portion, and the wiring board in which the convex portion has a first R chamfered portion and a second R chamfered portion at the corner of the first substrate, a molded body was produced in which the thickness of the green sheet and the height of the convex portion were adjusted. Furthermore, for the wiring substrate in which the inner wall facing the through hole of the second substrate is located away from the side, a method was adopted in which a silicone-based release agent was applied to the surface of the convex portion and the wiring organic sheet was laminated in this state.

 以上のように作製した各配線基板は、いずれも剛性が高いことに加えて、配線の微細化および狭ピッチ化を実現することができる。これらの配線基板はいずれも、凸部および配線有機シートの形状の違いにかかわらず、上記した効果を発揮することが確認できた。その確認方法は、配線の顕微鏡観察、半田耐熱試験、温度サイクル試験、電気特性評価である。これらの評価により、半導体素子の駆動など実用上使用できるレベルにあることが確認できた。 All of the wiring boards produced in this manner are highly rigid, and are capable of achieving finer wiring and narrower pitches. It has been confirmed that all of these wiring boards exhibit the above-mentioned effects, regardless of differences in the shapes of the convex portions and wiring organic sheets. This was confirmed by microscopic observation of the wiring, solder heat resistance tests, temperature cycle tests, and electrical property evaluations. These evaluations confirmed that the boards are at a level suitable for practical use, such as for driving semiconductor elements.

 以上、本開示について詳細に説明したが、本開示は上述の実施の形態に限定されるものではなく、本開示の要旨を逸脱しない範囲内において、種々の変更、改良等が可能である。 The present disclosure has been described in detail above, but it is not limited to the above-described embodiment, and various modifications and improvements are possible without departing from the gist of the present disclosure.

 一実施形態において、(1)配線基板は、第1基材と、第2基材とを有し、
 前記第1基材は、セラミック材料、金属材料、炭素材料およびこれらの材料を2種以上組み合わせた複合体のうちいずれかの材料を含み、
 前記第2基材は、有機樹脂を主成分として含み、その表面に銅箔製の配線を有し、前記第1基材上に積層されている。
In one embodiment, (1) the wiring board has a first substrate and a second substrate,
The first substrate includes any one of a ceramic material, a metal material, a carbon material, and a composite material obtained by combining two or more of these materials;
The second base material contains an organic resin as a main component, has copper foil wiring on its surface, and is laminated on the first base material.

 (2)上記(1)の配線基板において、前記第1基材は、ベース部と、該ベース部の片方の面を第1面としたときに、前記第1面の外辺から離れた中央寄りに島状を成す凸部とを一体的に備えており、
 前記第2基材は、厚み方向に貫通する貫通孔を有しており、
 前記第2基材は、前記貫通孔が前記第1基材の前記凸部に嵌まるように配置されていてもよい。
(2) In the wiring board according to (1) above, the first substrate integrally includes a base portion and a protruding portion that is island-shaped and located toward the center of the first surface away from an outer edge of the first surface when one surface of the base portion is defined as a first surface,
The second base material has a through hole penetrating in a thickness direction,
The second base material may be disposed such that the through hole fits into the protrusion of the first base material.

 (3)上記(2)の配線基板において、前記凸部のうち、前記第1基材の前記第1面と同じ方向を向く面を上面としたときに、
 前記上面と、前記第2基材の前記表面とは面一であってもよい。
(3) In the wiring board according to (2), when a surface of the protrusion that faces the same direction as the first surface of the first base material is defined as an upper surface,
The upper surface and the front surface of the second base material may be flush with each other.

 (4)上記(2)の配線基板において、前記凸部のうち、前記第1基材の前記第1面と同じ方向を向く面を上面としたときに、
 前記第2基材の前記表面のうち、前記凸部に近い部分の前記表面は、前記凸部の前記上面よりも低い位置にあってもよい。
(4) In the wiring board according to (2) above, when a surface of the protrusion that faces the same direction as the first surface of the first base material is defined as an upper surface,
The surface of the second base member in a portion close to the protrusion may be located at a lower position than the upper surface of the protrusion.

 (5)上記(2)の配線基板において、前記凸部のうち、前記第1基材の前記第1面と同じ方向を向く面を上面としたときに、
 前記第2基材の前記表面のうち、前記凸部に近い部分の前記表面は、前記凸部の前記上面よりも高い位置にあってもよい。
(5) In the wiring board according to (2) above, when a surface of the protrusion that faces the same direction as the first surface of the first base material is defined as an upper surface,
A portion of the surface of the second base member that is close to the protrusion may be located higher than the upper surface of the protrusion.

 (6)上記(2)~(5)のいずれか1つの配線基板において、前記凸部のうち、前記第1基材の前記第1面と同じ方向を向く面を上面としたときに、
 前記凸部は、前記上面と交差する側面と、該側面と前記上面とがつながる稜線部とを有しており、
 前記第2基材の前記貫通孔に面する内壁は、前記凸部の前記側面から前記稜線部に及ぶ範囲にかけて接していてもよい。
(6) In the wiring substrate according to any one of (2) to (5) above, when a surface of the protrusion that faces the same direction as the first surface of the first base material is defined as an upper surface,
the protrusion has a side surface intersecting the upper surface and a ridge portion connecting the side surface and the upper surface,
An inner wall of the second base material facing the through hole may be in contact with a range extending from the side surface of the protrusion to the ridge portion.

 (7)上記(6)の配線基板において、前記稜線部が面取りされていてもよい。 (7) In the wiring board of (6) above, the ridge portion may be chamfered.

 (8)上記(2)~(5)のいずれか1つの配線基板において、前記凸部のうち、前記第1基材の前記第1面と同じ方向を向く面を上面としたときに、
 前記凸部は、前記上面と交差する側面を有し、
 前記第1基材は、前記第1面と前記凸部の前記側面とがつながる隅部を有しており、
 前記第2基材は、前記隅部に接していてもよい。
(8) In the wiring substrate according to any one of (2) to (5) above, when a surface of the protrusion that faces the same direction as the first surface of the first base material is defined as an upper surface,
The protrusion has a side surface intersecting with the upper surface,
the first base material has a corner portion where the first surface and the side surface of the protrusion are connected,
The second substrate may be in contact with the corner.

 (9)上記(8)の配線基板において、前記隅部は、前記第1面から凸部の前記側面にかけて凹状に湾曲した形状を成していてもよい。 (9) In the wiring board of (8) above, the corner portion may have a concave curved shape from the first surface to the side surface of the protruding portion.

 (10)上記(2)~(5)のいずれか1つの配線基板において、前記凸部のうち、前記第1基材の前記第1面と同じ方向を向く面を上面としたときに、
 前記凸部は、前記上面と交差する側面と、該側面と前記上面とが交差する稜線部に位置する第1R面取部と、前記側面と前記第1面とが交差する隅部に位置し、凹状に湾曲する第2R面取部とを有しており、
 前記第2基材の前記貫通孔に面する内壁は、前記凸部の前記側面から前記第1R面取部および前記第2R面取部に及ぶ範囲にかけて接していてもよい。
(10) In the wiring substrate according to any one of (2) to (5) above, when a surface of the protrusion that faces the same direction as the first surface of the first base material is defined as an upper surface,
the protruding portion has a side surface intersecting with the top surface, a first R-chamfered portion located at a ridge where the side surface intersects with the top surface, and a second R-chamfered portion located at a corner where the side surface intersects with the first surface and curved concavely,
An inner wall of the second base material facing the through hole may be in contact with an area extending from the side surface of the protrusion to the first R-chamfered portion and the second R-chamfered portion.

 (11)上記(2)~(10)のいずれか1つの配線基板において、前記凸部のうち、前記第1基材の前記第1面と同じ方向を向く面を上面としたときに、
 前記凸部は、前記上面と交差する側面を有し、
 前記第2基材の前記貫通孔に面する内壁は、前記側面から離間した位置にあってもよい。
(11) In the wiring substrate according to any one of (2) to (10), when a surface of the protrusion that faces the same direction as the first surface of the first base material is defined as an upper surface,
The protrusion has a side surface intersecting with the upper surface,
An inner wall of the second base material facing the through hole may be located at a position spaced apart from the side surface.

 (12)上記(1)~(11)のいずれか1つの配線基板において、前記配線は、前記第2基材の表面部に埋設されていてもよい。 (12) In any one of the wiring boards (1) to (11) above, the wiring may be embedded in a surface portion of the second substrate.

 (13)上記(12)の配線基板において、前記配線のおもて面は、前記第2基材の表面と面一であってもよい。 (13) In the wiring board of (12) above, the front surface of the wiring may be flush with the surface of the second substrate.

 さらなる効果や他の態様は、当業者によって容易に導き出すことができる。このため、本開示のより広範な態様は、以上のように表しかつ記述した特定の詳細および代表的な実施形態に限定されるものではない。したがって、添付の請求の範囲およびその均等物によって定義される総括的な発明の概念の精神または範囲から逸脱することなく、様々な変更が可能である。 Further advantages and other aspects may be readily derived by those skilled in the art. Thus, the disclosure in its broader aspects is not limited to the specific details and representative embodiments shown and described above. Accordingly, various modifications may be made without departing from the spirit or scope of the general inventive concept as defined by the appended claims and equivalents thereof.

   1 配線基板
  10 第1基材
  11 ベース部
  12 凸部
  20 第2基材
  21 貫通孔
  30 配線
 111 第1面
 121 搭載面
 122 側面
 123 第1R面取部
 124 第2R面取部
 201 第2面
 202 第3面
REFERENCE SIGNS LIST 1 wiring substrate 10 first substrate 11 base portion 12 protruding portion 20 second substrate 21 through hole 30 wiring 111 first surface 121 mounting surface 122 side surface 123 first rounded chamfered portion 124 second rounded chamfered portion 201 second surface 202 third surface

Claims (13)

 第1基材と、第2基材とを有し、
 前記第1基材は、セラミック材料、金属材料、炭素材料およびこれらの材料を2種以上組み合わせた複合体のうちいずれかの材料を含み、
 前記第2基材は、有機樹脂を主成分として含み、その表面に銅箔製の配線を有し、前記第1基材上に積層されている
 配線基板。
A first substrate and a second substrate are included.
The first substrate includes any one of a ceramic material, a metal material, a carbon material, and a composite material obtained by combining two or more of these materials;
The second base material contains an organic resin as a main component, has copper foil wiring on a surface thereof, and is laminated on the first base material.
 前記第1基材は、ベース部と、該ベース部の片方の面を第1面としたときに、前記第1面の外辺から離れた中央寄りに島状を成す凸部とを一体的に備えており、
 前記第2基材は、厚み方向に貫通する貫通孔を有しており、
 前記第2基材は、前記貫通孔が前記第1基材の前記凸部に嵌まるように配置されている
 請求項1に記載の配線基板。
the first substrate integrally includes a base portion and a protruding portion that is in an island shape and is located toward the center of the first surface away from an outer edge of the first surface when one surface of the base portion is defined as a first surface,
The second base material has a through hole penetrating in a thickness direction,
The wiring board according to claim 1 , wherein the second base material is disposed such that the through hole fits into the protrusion of the first base material.
 前記凸部のうち、前記第1基材の前記第1面と同じ方向を向く面を上面としたときに、
 前記上面と、前記第2基材の前記表面とは面一である
 請求項2に記載の配線基板。
When a surface of the protrusion facing the same direction as the first surface of the first base material is defined as an upper surface,
The wiring board according to claim 2 , wherein the upper surface and the front surface of the second base material are flush with each other.
 前記凸部のうち、前記第1基材の前記第1面と同じ方向を向く面を上面としたときに、
 前記第2基材の前記表面のうち、前記凸部に近い部分の前記表面は、前記凸部の前記上面よりも低い位置にある
 請求項2に記載の配線基板。
When a surface of the protrusion facing the same direction as the first surface of the first base material is defined as an upper surface,
The wiring board according to claim 2 , wherein the surface of the second base member in a portion close to the protrusion is located at a lower position than the upper surface of the protrusion.
 前記凸部のうち、前記第1基材の前記第1面と同じ方向を向く面を上面としたときに、
 前記第2基材の前記表面のうち、前記凸部に近い部分の前記表面は、前記凸部の前記上面よりも高い位置にある
 請求項2に記載の配線基板。
When a surface of the protrusion facing the same direction as the first surface of the first base material is defined as an upper surface,
The wiring board according to claim 2 , wherein the surface of the second base member in a portion close to the protrusion is located at a higher position than the upper surface of the protrusion.
 前記凸部のうち、前記第1基材の前記第1面と同じ方向を向く面を上面としたときに、
 前記凸部は、前記上面と交差する側面と、該側面と前記上面とがつながる稜線部とを有しており、
 前記第2基材の前記貫通孔に面する内壁は、前記凸部の前記側面から前記稜線部に及ぶ範囲にかけて接している
 請求項2~5のいずれか1つに記載の配線基板。
When a surface of the protrusion facing the same direction as the first surface of the first base material is defined as an upper surface,
the protrusion has a side surface intersecting the upper surface and a ridge portion connecting the side surface and the upper surface,
6. The wiring board according to claim 2, wherein an inner wall of the second base material facing the through hole is in contact with an area extending from the side surface of the protrusion to the ridge line portion.
 前記稜線部が面取りされている
 請求項6に記載の配線基板。
The wiring board according to claim 6 , wherein the ridge portion is chamfered.
 前記凸部のうち、前記第1基材の前記第1面と同じ方向を向く面を上面としたときに、
 前記凸部は、前記上面と交差する側面を有し、
 前記第1基材は、前記第1面と前記凸部の前記側面とがつながる隅部を有しており、
 前記第2基材は、前記隅部に接している
 請求項2~5のいずれか1つに記載の配線基板。
When a surface of the protrusion facing the same direction as the first surface of the first base material is defined as an upper surface,
The protrusion has a side surface intersecting with the upper surface,
the first base material has a corner portion where the first surface and the side surface of the protrusion are connected,
The wiring board according to claim 2 , wherein the second base material is in contact with the corner portion.
 前記隅部は、前記第1面から凸部の前記側面にかけて凹状に湾曲した形状を成している
 請求項8に記載の配線基板。
The wiring board according to claim 8 , wherein the corner portion has a concave curved shape extending from the first surface to the side surface of the protruding portion.
 前記凸部のうち、前記第1基材の前記第1面と同じ方向を向く面を上面としたときに、
 前記凸部は、前記上面と交差する側面と、該側面と前記上面とが交差する稜線部に位置する第1R面取部と、前記側面と前記第1面とが交差する隅部に位置し、凹状に湾曲する第2R面取部とを有しており、
 前記第2基材の前記貫通孔に面する内壁は、前記凸部の前記側面から前記第1R面取部および前記第2R面取部に及ぶ範囲にかけて接している
 請求項2~5のいずれか1つに記載の配線基板。
When a surface of the protrusion facing the same direction as the first surface of the first base material is defined as an upper surface,
the protruding portion has a side surface intersecting with the top surface, a first R-chamfered portion located at a ridge where the side surface intersects with the top surface, and a second R-chamfered portion located at a corner where the side surface intersects with the first surface and curved concavely,
The wiring board according to any one of claims 2 to 5, wherein an inner wall of the second base material facing the through hole is in contact with an area extending from the side surface of the protrusion to the first R-chamfered portion and the second R-chamfered portion.
 前記凸部のうち、前記第1基材の前記第1面と同じ方向を向く面を上面としたときに、
 前記凸部は、前記上面と交差する側面を有し、
 前記第2基材の前記貫通孔に面する内壁は、前記側面から離間した位置にある
 請求項2~10のいずれか1つに記載の配線基板。
When a surface of the protrusion facing the same direction as the first surface of the first base material is defined as an upper surface,
The protrusion has a side surface intersecting with the upper surface,
11. The wiring board according to claim 2, wherein an inner wall of the second base material facing the through hole is located at a position spaced apart from the side surface.
 前記配線は、前記第2基材の表面部に埋設されている
 請求項1~11のいずれか1つに記載の配線基板。
The wiring board according to claim 1 , wherein the wiring is embedded in a surface portion of the second base material.
 前記配線のおもて面は、前記第2基材の表面と面一である
 請求項12に記載の配線基板。
The wiring board according to claim 12 , wherein a front surface of the wiring is flush with a surface of the second base material.
PCT/JP2024/015486 2023-04-18 2024-04-18 Circuit board Pending WO2024219471A1 (en)

Applications Claiming Priority (2)

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JP2023-067904 2023-04-18

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Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004327984A (en) * 2003-04-11 2004-11-18 Matsushita Electric Ind Co Ltd High heat dissipation resin substrate, method of manufacturing the same, and electronic equipment using the same
JP2008091814A (en) * 2006-10-05 2008-04-17 Taiyo Kogyo Co Ltd Circuit board and circuit board manufacturing method
JP2013532901A (en) * 2010-07-20 2013-08-19 エルジー イノテック カンパニー リミテッド Heat dissipation circuit board and manufacturing method thereof

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004327984A (en) * 2003-04-11 2004-11-18 Matsushita Electric Ind Co Ltd High heat dissipation resin substrate, method of manufacturing the same, and electronic equipment using the same
JP2008091814A (en) * 2006-10-05 2008-04-17 Taiyo Kogyo Co Ltd Circuit board and circuit board manufacturing method
JP2013532901A (en) * 2010-07-20 2013-08-19 エルジー イノテック カンパニー リミテッド Heat dissipation circuit board and manufacturing method thereof

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