WO2024203145A1 - Curable resin composition and cured product thereof - Google Patents
Curable resin composition and cured product thereof Download PDFInfo
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- WO2024203145A1 WO2024203145A1 PCT/JP2024/008940 JP2024008940W WO2024203145A1 WO 2024203145 A1 WO2024203145 A1 WO 2024203145A1 JP 2024008940 W JP2024008940 W JP 2024008940W WO 2024203145 A1 WO2024203145 A1 WO 2024203145A1
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/02—Polycondensates containing more than one epoxy group per molecule
- C08G59/04—Polycondensates containing more than one epoxy group per molecule of polyhydroxy compounds with epihalohydrins or precursors thereof
- C08G59/06—Polycondensates containing more than one epoxy group per molecule of polyhydroxy compounds with epihalohydrins or precursors thereof of polyhydric phenols
- C08G59/08—Polycondensates containing more than one epoxy group per molecule of polyhydroxy compounds with epihalohydrins or precursors thereof of polyhydric phenols from phenol-aldehyde condensates
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/40—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the curing agents used
- C08G59/62—Alcohols or phenols
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G8/00—Condensation polymers of aldehydes or ketones with phenols only
- C08G8/04—Condensation polymers of aldehydes or ketones with phenols only of aldehydes
- C08G8/06—Condensation polymers of aldehydes or ketones with phenols only of aldehydes of furfural
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J5/00—Manufacture of articles or shaped materials containing macromolecular substances
- C08J5/04—Reinforcing macromolecular compounds with loose or coherent fibrous material
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L63/00—Compositions of epoxy resins; Compositions of derivatives of epoxy resins
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/28—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
- H01L23/29—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the material, e.g. carbon
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/28—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
- H01L23/31—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/03—Use of materials for the substrate
Definitions
- the present invention relates to a curable resin composition containing a specific epoxy resin and a specific phenolic resin, and a cured product thereof, which is suitable for use in sealing materials for semiconductor elements, electrical and electronic components such as printed wiring boards and build-up laminates, lightweight, high-strength materials such as carbon fiber reinforced plastics and glass fiber reinforced plastics, 3D printing applications, and in the field of adhesives.
- Epoxy resins are widely used in fields such as electrical and electronic parts, structural materials, adhesives, and paints due to their workability and the excellent electrical properties, heat resistance, adhesiveness, and moisture resistance (water resistance) of the cured products.
- electrical and electronic fields there has been a demand for further improvements in the properties of resins, such as heat resistance, low dielectric constant, and low dielectric tangent.
- structural materials there is a demand for lightweight materials with excellent mechanical properties for aerospace materials and leisure and sports equipment applications.
- Furfural is known as a compound derived from biomass
- Patent Document 1 discloses an epoxy resin that uses furfural as a raw material.
- the epoxy resin composition is made by mixing an epoxy resin made from furfural as a raw material with a phenol novolac resin, which is a petrochemical-derived hardener, so the biomass content of the composition is low.
- the present invention was made in consideration of the above situation, and aims to provide a curable resin composition with a high biomass content, high heat resistance, low dielectric properties, and excellent mechanical properties, as well as a cured product thereof.
- a curable resin composition comprising an epoxy resin represented by the following formula (1) and a phenol resin represented by the following formula (2):
- n is the average number of repetitions and is a real number between 1 and 15.
- the present invention relates to a curable resin composition that has a high biomass content and has high heat resistance, low dielectric properties, and excellent mechanical properties. Therefore, the present invention is useful for insulating materials for electric and electronic components (highly reliable semiconductor encapsulation materials, etc.), laminates (printed wiring boards, build-up boards, etc.), various composite materials including CFRP, adhesives, etc.
- 1 shows a GPC chart of Synthesis Example 1.
- 2 shows a GPC chart of Synthesis Example 2.
- the curable resin composition of this embodiment contains an epoxy resin represented by the following formula (1) and a phenolic resin represented by the following formula (2).
- n is the average number of repetitions and is a real number between 1 and 15.
- n is the average number of repetitions and is a real number in the range 1 ⁇ n ⁇ 15.
- n can be calculated from the number average molecular weight determined by measuring the epoxy resin by gel permeation chromatography (GPC, detector: RI) or from the area ratio of each of the separated peaks.
- n is preferably a real number in the range of 1 ⁇ n ⁇ 15, more preferably 1 ⁇ n ⁇ 10, and particularly preferably 1 ⁇ n ⁇ 5.
- the phenolic resin represented by the formula (2) can also be used as a raw material for the epoxy resin represented by the formula (1).
- the epoxy resin represented by the formula (1) can be obtained by reacting the phenolic resin represented by the formula (2) with epihalohydrin.
- the epihalohydrin is readily available on the market.
- the amount of epihalohydrin used is preferably 2.0 to 10 moles per mole of hydroxyl groups in the raw phenol mixture, more preferably 3.0 to 8.0 moles, and even more preferably 3.5 to 6.0 moles.
- an alkali metal hydroxide can be used as a catalyst for promoting the epoxidation step.
- alkali metal hydroxides that can be used include sodium hydroxide, potassium hydroxide, etc., and a solid or an aqueous solution thereof can be used. In this embodiment, however, it is particularly preferable to use a solid formed into a flake shape in terms of solubility and handling.
- the amount of the alkali metal hydroxide used is preferably 0.90 to 1.5 mol, more preferably 0.95 to 1.25 mol, and even more preferably 0.99 to 1.15 mol, per mol of hydroxyl groups in the raw phenol mixture.
- quaternary ammonium salt such as tetramethylammonium chloride, tetramethylammonium bromide, or trimethylbenzylammonium chloride may be added as a catalyst.
- the amount of quaternary ammonium salt used is preferably 0.1 to 15 g, more preferably 0.2 to 10 g, per mole of hydroxyl groups in the raw phenol mixture.
- the reaction temperature is preferably 30 to 90° C., more preferably 35 to 80° C.
- the reaction temperature is preferably 50° C. or higher, and particularly preferably 60° C. or higher.
- the reaction time is preferably 0.5 to 10 hours, more preferably 1 to 8 hours, and particularly preferably 1 to 3 hours. If the reaction time is short, the reaction does not proceed to completion, and if the reaction time is long, by-products are produced, which are not preferred.
- the reaction product of these epoxidation reactions is washed with water or heated under reduced pressure to remove epihalohydrin and solvent.
- the recovered epoxy resin can be dissolved in a ketone compound having 4 to 7 carbon atoms (e.g., methyl isobutyl ketone, methyl ethyl ketone, cyclopentanone, cyclohexanone, etc.) as a solvent, and an aqueous solution of an alkali metal hydroxide such as sodium hydroxide or potassium hydroxide is added to carry out the reaction to ensure ring closure.
- a ketone compound having 4 to 7 carbon atoms e.g., methyl isobutyl ketone, methyl ethyl ketone, cyclopentanone, cyclohexanone, etc.
- an alkali metal hydroxide such as sodium hydroxide or potassium hydroxide
- the amount of the alkali metal hydroxide used is preferably 0.01 to 0.3 mol, more preferably 0.05 to 0.2 mol, per mol of hydroxyl groups in the raw material phenol mixture used in the epoxidation.
- the reaction temperature is preferably 50 to 120° C., and the reaction time is preferably 0.5 to 2 hours.
- the salt formed is removed by filtration, washing with water, etc., and the solvent is then distilled off under heating and reduced pressure to obtain the epoxy resin represented by formula (1).
- the amount of the phenol is preferably 1.5 to 20 moles, and more preferably 3 to 10 moles, per mole of furfural.
- Solvents include, but are not limited to, methanol, ethanol, propanol, isopropanol, toluene, xylene, etc., and may be used alone or in combination of two or more.
- the amount used is preferably 5 to 500 parts by weight, more preferably 10 to 300 parts by weight, per 100 parts by weight of phenol.
- base catalysts include alkali metal hydroxides such as lithium hydroxide, sodium hydroxide, and potassium hydroxide, alkaline earth metal hydroxides such as magnesium hydroxide and calcium hydroxide, alkali metal alkoxides such as sodium methoxide, sodium ethoxide, potassium methoxide, potassium ethoxide, and potassium tert-butoxide, and alkaline earth metal alkoxides such as magnesium methoxide and magnesium ethoxide, but the invention is not limited to these, and the catalyst may be used alone or in combination of two or more kinds.
- the amount of catalyst used is preferably 0.005 to 2.0 times the moles of phenol, and more preferably 0.01 to 1.1 times the moles.
- the phenolic resin represented by formula (2) is preferably present in an amount of 0.7 to 1.2 equivalents per equivalent of epoxy group in the epoxy resin represented by formula (1). If the amount is less than 0.7 equivalents per equivalent of epoxy group, or if the amount exceeds 1.2 equivalents, curing may be incomplete and good cured physical properties may not be obtained.
- the biomass degree of the epoxy resin represented by the formula (1) is preferably 20% or more, and more preferably 25% or more.
- the biomass degree of the phenol resin represented by the formula (2) is preferably 20% or more, and more preferably 30% or more.
- the biomass degree of the curable resin composition of this embodiment is preferably 20% or more, and more preferably 25% or more.
- a high biomass degree can also reduce the amount of fossil resource-based materials such as petroleum used, and is therefore meaningful in terms of sustainable use of resources.
- the biomass content of each material and curable resin composition can be determined by accelerator gravimetric analysis in accordance with ASTM D6866-21.
- the epoxy resin represented by formula (1) may be used alone or in combination with other epoxy resins.
- the proportion of the epoxy resin represented by formula (1) in the total epoxy resin is preferably 5 to 95% by weight, more preferably 10 to 95% by weight, and even more preferably 15 to 95% by weight. If the amount added is small, sufficient heat resistance may not be achieved.
- epoxy resins that can be used in combination with the epoxy resin represented by formula (1) include polycondensates of bisphenols (bisphenol A, bisphenol F, bisphenol S, biphenol, bisphenol AD, etc.) or phenols (phenol, alkyl-substituted phenol, aromatic-substituted phenol, naphthol, alkyl-substituted naphthol, dihydroxybenzene, alkyl-substituted dihydroxybenzene, dihydroxynaphthalene, etc.) with various aldehydes (formaldehyde, acetaldehyde, alkyl aldehyde, benzaldehyde, alkyl-substituted benzaldehyde, hydroxybenzaldehyde, naphthaldehyde, glutaraldehyde, phthalaldehyde, crotonaldehyde, cinnamaldehyde, etc.); polycondensates of the phenols (
- epoxy resins containing plant-derived components include compounds obtained by epoxidizing polycondensates obtained by polycondensing various aldehydes with cardanol derived from cashew oil as the phenol, and compounds obtained by epoxidizing linseed oil or soybean oil. There is no limitation to these, as long as they are commonly used epoxy resins. These may be used alone or in combination with two or more kinds. In particular, it is preferable to use them in combination with epoxy resins containing plant-derived components, as this can increase the biomass ratio.
- the curable resin composition of this embodiment may be used in combination with a curing agent other than the phenolic resin represented by formula (2).
- a curing agent other than the phenolic resin represented by formula (2).
- examples include acid anhydride compounds, amine compounds, amide compounds, phenolic compounds, and active ester compounds.
- curing agents that can be used in combination include acid anhydride compounds such as phthalic anhydride, trimellitic anhydride, pyromellitic anhydride, maleic anhydride, tetrahydrophthalic anhydride, methyltetrahydrophthalic anhydride, methylnadic anhydride, hexahydrophthalic anhydride, and methylhexahydrophthalic anhydride; amide compounds such as dicyandiamide, polyamide resins synthesized from a dimer of linoleic acid and ethylenediamine; o-phenylenediamine, m-phenylenediamine, p-phenylened
- the curable resin composition of this embodiment may be used in combination with a curing accelerator.
- the curing accelerator that can be used include imidazoles such as 2-methylimidazole, 2-ethylimidazole, 2-phenylimidazole, and 2-ethyl-4-methylimidazole; tertiary amines such as 2-(dimethylaminomethyl)phenol, triethylenediamine, triethanolamine, and 1,8-diazabicyclo[5,4,0]undecene-7; organic phosphines such as triphenylphosphine, diphenylphosphine, and tributylphosphine; metal compounds such as tin octylate; tetra-substituted phosphonium tetra-substituted borates such as tetraphenylphosphonium tetraphenylborate and tetraphenylphosphonium ethyltriphenylborate;
- the curable resin composition of this embodiment may contain an inorganic filler as needed.
- inorganic fillers include, but are not limited to, powders such as crystalline silica, fused silica, alumina, zircon, calcium silicate, calcium carbonate, silicon carbide, silicon nitride, boron nitride, zirconia, fosterite, steatite, spinel, titania, and talc, or beads obtained by shaping these into spherical form. These may be used alone or in combination of two or more.
- the amount of these inorganic fillers used varies depending on the application, but when used as an encapsulant for semiconductor elements, it is preferable to use the inorganic fillers in a proportion of 20% by weight or more in the curable resin composition in terms of the heat resistance, moisture resistance, mechanical properties, and flame retardancy of the cured product of the curable resin composition, more preferably 30% by weight or more, and more preferably 70 to 95% by weight in order to improve the linear expansion coefficient with the lead frame.
- the curable resin composition of this embodiment can be blended with a release agent to improve release from the mold during molding.
- a release agent to improve release from the mold during molding.
- Any of the conventionally known release agents can be used, including, for example, ester waxes such as carnauba wax and montan wax, fatty acids such as stearic acid and palmitic acid and their metal salts, and polyolefin waxes such as oxidized polyethylene and non-oxidized polyethylene. These may be used alone or in combination of two or more.
- the amount of these release agents blended is preferably 0.5 to 3% by weight of the total organic components. If it is less than this, release from the mold is poor, and if it is too much, adhesion to the lead frame and the like is poor.
- the curable resin composition of this embodiment can be blended with a coupling agent to improve adhesion between the inorganic filler and the resin component.
- a coupling agent to improve adhesion between the inorganic filler and the resin component.
- Any of the conventionally known coupling agents can be used, including, for example, various alkoxysilane compounds such as vinylalkoxysilane, epoxyalkoxysilane, styrylalkoxysilane, methacryloxyalkoxysilane, acryloxyalkoxysilane, aminoalkoxysilane, mercaptoalkoxysilane, and isocyanatoalkoxysilane, alkoxytitanium compounds, and aluminum chelates. These may be used alone or in combination of two or more.
- the coupling agent may be added by treating the surface of the inorganic filler with the coupling agent beforehand and then kneading it with the resin, or by mixing the coupling agent with the resin and then kneading the inorganic filler.
- the curable resin composition of this embodiment may contain known additives as necessary.
- additives include polybutadiene and modified products thereof, modified acrylonitrile copolymers, polyphenylene ether, polystyrene, polyethylene, polyimide, fluororesin, maleimide-based compounds, cyanate ester-based compounds, silicone gel, silicone oil, and colorants such as carbon black, phthalocyanine blue, and phthalocyanine green.
- the curable resin composition of this embodiment is obtained by uniformly mixing the above components.
- the obtained curable resin composition can be formed into various forms such as a resin sheet or a prepreg, depending on the molding method.
- a prepreg form can be obtained, for example, by heating and melting the curable resin composition and/or the resin sheet of this embodiment to reduce the viscosity and impregnating the composition into a fiber substrate.
- the curable resin composition of this embodiment can be dissolved in a solvent such as toluene, xylene, acetone, methyl ethyl ketone, methyl isobutyl ketone, dimethylformamide, dimethylacetamide, or N-methylpyrrolidone as necessary to form a varnish-like composition (hereinafter simply referred to as varnish), which can then be impregnated into a substrate such as glass fiber, carbon fiber, polyester fiber, polyamide fiber, alumina fiber, or paper, and dried by heating to produce a prepreg.
- the solvent used in this case is in an amount that occupies 10 to 70% by weight, preferably 15 to 70% by weight, of the mixture of the curable resin composition of this embodiment and the solvent.
- CFRP carbon fiber reinforced plastic
- CFRP can also be obtained by molding using known methods.
- resin transfer molding technology RTM method
- a carbon fiber substrate usually woven carbon fiber fabric
- preform a preliminary molded body before being impregnated with resin
- the preform is placed in a mold and the mold is closed, resin is injected to impregnate the preform and harden it, and the mold is then opened to remove the molded product.
- RTM method such as the VaRTM method, the SCRIMP (Seeman's Composite Resin Infusion Molding Process) method, or the CAPRI (Controlled Atmospheric Pressure Resin Infusion) method, which more appropriately controls the resin injection process, particularly the VaRTM method, by evacuating the resin supply tank described in JP-A-2005-527410 to a pressure lower than atmospheric pressure, using circulatory compression, and controlling the net molding pressure.
- VaRTM method such as the VaRTM method, the SCRIMP (Seeman's Composite Resin Infusion Molding Process) method, or the CAPRI (Controlled Atmospheric Pressure Resin Infusion) method, which more appropriately controls the resin injection process, particularly the VaRTM method, by evacuating the resin supply tank described in JP-A-2005-527410 to a pressure lower than atmospheric pressure, using circulatory compression, and controlling the net molding pressure.
- SCRIMP Seeman's Composite Resin Infusion Molding Process
- CAPRI Controlled Atmospheric Pressure Resin Infusion
- other methods that can be used include the film stacking method, in which the fiber substrate is sandwiched between resin sheets (films), the method of attaching powdered resin to the reinforced fiber substrate to improve impregnation, the molding method (Powder Impregnated Yarn) that uses a fluidized bed or fluid slurry method in the process of mixing the resin into the fiber substrate, and the method of blending resin fibers into the fiber substrate.
- Carbon fibers include acrylic, pitch, and rayon carbon fibers, with acrylic carbon fibers being preferred due to their high tensile strength.
- the carbon fibers can be in the form of twisted yarn, untwisted yarn, or non-twisted yarn, but untwisted yarn or non-twisted yarn is preferred due to the good balance between the formability and strength properties of the fiber-reinforced composite material.
- the cured product of the curable resin composition of this embodiment can be used for various applications other than the above-mentioned applications such as CFRP, such as adhesives, paints, coating agents, molding materials (including sheets, films, CFRP, etc.), encapsulants for semiconductor elements, encapsulants for liquid crystal display elements, encapsulants for organic EL elements, printed wiring boards (BGA substrates, build-up substrates, etc.), and other electric and electronic parts, 3D printing, as well as additives for other resins, etc.
- CFRP such as adhesives, paints, coating agents, molding materials (including sheets, films, CFRP, etc.)
- encapsulants for semiconductor elements encapsulants for liquid crystal display elements
- encapsulants for organic EL elements encapsulants for organic EL elements
- printed wiring boards BGA substrates, build-up substrates, etc.
- the adhesives include adhesives for civil engineering, construction, automotive, general office, and medical use, as well as adhesives for electronic materials.
- adhesives for electronic materials include interlayer adhesives for multilayer boards such as build-up boards, die bonding agents, semiconductor adhesives such as underfills, underfills for reinforcing BGAs, and mounting adhesives such as anisotropic conductive films (ACFs) and anisotropic conductive pastes (ACPs), and can be used for a variety of purposes.
- ACFs anisotropic conductive films
- ACPs anisotropic conductive pastes
- the curable resin composition of this embodiment When the curable resin composition of this embodiment is applied to an encapsulant for semiconductor elements, the curable resin composition of this embodiment is placed in a mold along with a lead frame equipped with a semiconductor element and a semiconductor package substrate, and molded by melt casting, transfer molding, injection molding, compression molding, or the like, and then heated at 80 to 200°C for 2 to 10 hours to obtain a cured product.
- Examples of semiconductor devices manufactured using this encapsulant include potting, dipping, and transfer mold encapsulation for capacitors, transistors, diodes, light-emitting diodes, ICs, and LSIs, potting encapsulation for COB, COF, TAB, and the like for ICs and LSIs, underfill for flip chips, and encapsulation (including reinforcing underfill) when mounting IC packages such as QFP, BGA, and CSP.
- a prepreg can be obtained by heating and melting the composition to reduce the viscosity and impregnating the composition into reinforcing fibers such as glass fibers and polyamide fibers.
- the composition include, but are not limited to, glass fibers such as E glass cloth, D glass cloth, S glass cloth, Q glass cloth, spherical glass cloth, NE glass cloth, and T glass cloth, and/or organic fibers.
- the shape of the substrate is not particularly limited, but examples include woven fabric, nonwoven fabric, roving, chopped strand mat, and the like.
- the weaving method of the woven fabric includes plain weave, saddle weave, twill weave, and the like, and these known methods can be appropriately selected and used depending on the intended application and performance.
- woven fabrics that have been opened and glass woven fabrics that have been surface-treated with a silane coupling agent are preferably used.
- the thickness of the substrate is not particularly limited, but is preferably about 0.01 to 0.4 mm.
- the varnish can be impregnated into reinforcing fibers and dried by heating to obtain a prepreg, which can then be used to create a copper clad laminate (CCL).
- the obtained prepreg and CCL can be hot-press molded to create a laminate using the curable resin composition of this embodiment.
- the laminate is not particularly limited as long as it has one or more prepregs, and may have any other layers.
- a sheet-like adhesive can be obtained by applying the varnish onto a release film, removing the solvent under heating, and performing B-stage formation.
- This sheet-like adhesive can be used as an interlayer insulating layer in a multilayer board or an adhesive sheet when mounting a semiconductor.
- the curable resin composition of this embodiment can also be used suitably for special board materials such as package boards (substrates) and HDIs (high density interconnects).
- Epoxy equivalent Measured by the method described in JIS K-7236, and the unit is g/eq.
- Softening point Measured according to a method in accordance with JIS K-7234, and the unit is °C.
- Melt Viscosity ICI melt viscosity (150° C.) was measured by the cone-plate method, and the unit is Pa ⁇ s.
- -Biomass content analysis (accelerator gravimetric analysis) The measurement was carried out in accordance with ASTM D6866-21 and the calculation was carried out in units of %.
- Synthesis Example 2 78 parts by weight of phenolic resin A obtained in Synthesis Example 1 was charged into a reaction vessel with 254 parts by weight of epichlorohydrin (ECH, hereinafter the same), 64 parts by weight of dimethyl sulfoxide (DMSO, hereinafter the same), and 13 parts by weight of water, and after heating, stirring, and dissolving, 23 parts by weight of flake-shaped sodium hydroxide was charged in portions over 2 hours while maintaining the temperature at 45°C. Thereafter, the reaction was further carried out at 45°C for 2 hours and at 70°C for 60 minutes.
- ECH epichlorohydrin
- DMSO dimethyl sulfoxide
- the epoxy equivalent was 214 g/eq., the softening point was 49°C, the ICI melt viscosity was 0.04 Pa s, the average number of repeats n was 2.1 from GPC, and the biomass degree was 25%.
- the GPC chart of epoxy resin A is shown in Figure 2.
- Example 1 The epoxy resin A obtained in Synthesis Example 2 was used as the base resin, the phenol resin A obtained in Synthesis Example 1 was used as the curing agent, and TPP (triphenylphosphine) was used as the curing accelerator. These were mixed and kneaded in the weight ratio shown in the composition in Table 1, and cured at 180°C for 6 hours to produce a cured product. The biomass content of the cured product was 28.3%.
- Tg Heat resistance
- Dynamic viscoelasticity measuring instrument TA-instruments, DMA-Q800 Measurement temperature range: 25 to 300°C Temperature rise rate: 2° C./min.
- Tg The peak point of Tan ⁇ was taken as Tg.
- test pieces were clamped so that they had a length of 5 cm and were tensile measured in the 180° direction at the above test speed with a tensile speed of 0.5 mm/min.
- Example 1 has a high biomass content, high heat resistance, low dielectric properties, and excellent mechanical properties.
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Abstract
Description
本発明は、特定のエポキシ樹脂と特定のフェノール樹脂を含む硬化性樹脂組成物およびその硬化物に関するものであり、半導体素子用封止材、プリント配線板、ビルドアップ積層板などの電気・電子部品、炭素繊維強化プラスチック、ガラス繊維強化プラスチックなどの軽量高強度材料、3Dプリンティング用途、接着剤の分野で好適に使用される。 The present invention relates to a curable resin composition containing a specific epoxy resin and a specific phenolic resin, and a cured product thereof, which is suitable for use in sealing materials for semiconductor elements, electrical and electronic components such as printed wiring boards and build-up laminates, lightweight, high-strength materials such as carbon fiber reinforced plastics and glass fiber reinforced plastics, 3D printing applications, and in the field of adhesives.
エポキシ樹脂は作業性及びその硬化物の優れた電気特性、耐熱性、接着性、耐湿性(耐水性)等により電気・電子部品、構造用材料、接着剤、塗料等の分野で幅広く用いられている。そして、近年、特に電気・電子分野においてはその発展に伴い、耐熱性や低誘電率、低誘電正接等の樹脂の諸特性の一層の向上が求められている。また、構造材としては航空宇宙材料、レジャー・スポーツ器具用途などにおいて軽量で機械物性の優れた材料が求められている。 Epoxy resins are widely used in fields such as electrical and electronic parts, structural materials, adhesives, and paints due to their workability and the excellent electrical properties, heat resistance, adhesiveness, and moisture resistance (water resistance) of the cured products. In recent years, with the development of the electrical and electronic fields in particular, there has been a demand for further improvements in the properties of resins, such as heat resistance, low dielectric constant, and low dielectric tangent. In addition, as structural materials, there is a demand for lightweight materials with excellent mechanical properties for aerospace materials and leisure and sports equipment applications.
また、近年、環境問題の観点からカーボンニュートラルな資源としてバイオマス資源が注目されている。フルフラールはバイオマス由来の化合物として知られており、特許文献1にはフルフラールを原料として用いたエポキシ樹脂が開示されている。 In recent years, biomass resources have been attracting attention as a carbon-neutral resource from the perspective of environmental issues. Furfural is known as a compound derived from biomass, and Patent Document 1 discloses an epoxy resin that uses furfural as a raw material.
しかしながら、特許文献1はフルフラールを原料として用いたエポキシ樹脂と石化由来の硬化剤であるフェノールノボラック樹脂と混合してエポキシ樹脂組成物としているため、組成物としてのバイオマス度は低くなっていた。 However, in Patent Document 1, the epoxy resin composition is made by mixing an epoxy resin made from furfural as a raw material with a phenol novolac resin, which is a petrochemical-derived hardener, so the biomass content of the composition is low.
一般に、バイオマス度を高くしようとすると、硬化性樹脂組成物に求められる性能を維持することが難しくなることから、高いバイオマス度を有しつつ、要求特性を満足する硬化性樹脂組成物が求められていた。 Generally, when trying to increase the biomass content, it becomes difficult to maintain the performance required of the curable resin composition, so there has been a demand for a curable resin composition that has a high biomass content while still satisfying the required properties.
本発明は、上記状況を鑑みてなされたものであり、高いバイオマス度であって、高耐熱性、低誘電特性、機械特性に優れる硬化性樹脂組成物及びその硬化物を提供することを目的とする。 The present invention was made in consideration of the above situation, and aims to provide a curable resin composition with a high biomass content, high heat resistance, low dielectric properties, and excellent mechanical properties, as well as a cured product thereof.
すなわち本発明は、下記[1]~[8]に関する。なお、本発明において「(数値1)~(数値2)」は上下限値を含むことを示す。
[1]
下記式(1)で表されるエポキシ樹脂と下記式(2)で表されるフェノール樹脂とを含有する硬化性樹脂組成物。
That is, the present invention relates to the following [1] to [8]. Note that in the present invention, "(Numerical value 1) to (Numerical value 2)" indicates that the upper and lower limits are included.
[1]
A curable resin composition comprising an epoxy resin represented by the following formula (1) and a phenol resin represented by the following formula (2):
(式(1)中、nは繰り返し数の平均値であり、1<n<15の実数を示す。) (In formula (1), n is the average number of repetitions and is a real number between 1 and 15.)
(式(2)中、nは繰り返し数の平均値であり、1<n<15の実数を示す。)
[2]
前記フェノール樹脂のバイオマス度が20%以上である、前項[1]に記載の硬化性樹脂組成物。
[3]
前記エポキシ樹脂のICI粘度(150℃)が0.01~0.20Pa・sである、前項[1]または[2]に記載の硬化性樹脂組成物。
[4]
バイオマス度が20%以上である、前項[1]から[3]のいずれか一項に記載の硬化性樹脂組成物。
[5]
炭素繊維強化プラスチック用である、前項[1]から[4]のいずれか一項のいずれか一項に記載の硬化性樹脂組成物。
[6]
半導体素子封止材用である、前項[1]から[4]のいずれか一項に記載の硬化性樹脂組成物。
[7]
プリント配線板用である、前項[1]から[4]のいずれか一項に記載の硬化性樹脂組成物。
[8]
前項[1]から[7]のいずれか一項に記載の硬化性樹脂組成物を硬化してなる硬化物。
(In formula (2), n is the average number of repetitions and is a real number in the range of 1<n<15.)
[2]
The curable resin composition according to the above item [1], wherein the phenol resin has a biomass degree of 20% or more.
[3]
The curable resin composition according to the above item [1] or [2], wherein the epoxy resin has an ICI viscosity (150°C) of 0.01 to 0.20 Pa·s.
[4]
The curable resin composition according to any one of the above items [1] to [3], having a biomass ratio of 20% or more.
[5]
The curable resin composition according to any one of the above items [1] to [4], which is for carbon fiber reinforced plastics.
[6]
The curable resin composition according to any one of the above items [1] to [4], which is used for a semiconductor element encapsulation material.
[7]
The curable resin composition according to any one of the above items [1] to [4], which is for use in a printed wiring board.
[8]
A cured product obtained by curing the curable resin composition according to any one of the above items [1] to [7].
本発明は、高いバイオマス度であって、高耐熱性、低誘電特性、機械特性に優れる硬化性樹脂組成物に関するものである。このため、本発明は電気電子部品用絶縁材料(高信頼性半導体封止材料など)及び積層板(プリント配線板、ビルドアップ基板など)やCFRPを始めとする各種複合材料、接着剤等に有用である。 The present invention relates to a curable resin composition that has a high biomass content and has high heat resistance, low dielectric properties, and excellent mechanical properties. Therefore, the present invention is useful for insulating materials for electric and electronic components (highly reliable semiconductor encapsulation materials, etc.), laminates (printed wiring boards, build-up boards, etc.), various composite materials including CFRP, adhesives, etc.
本実施形態の硬化性樹脂組成物は、下記式(1)で表されるエポキシ樹脂と下記式(2)で表されるフェノール樹脂とを含有する。 The curable resin composition of this embodiment contains an epoxy resin represented by the following formula (1) and a phenolic resin represented by the following formula (2).
(式(1)中、nは繰り返し数の平均値であり、1<n<15の実数を示す。) (In formula (1), n is the average number of repetitions and is a real number between 1 and 15.)
(式(2)中、nは繰り返し数の平均値であり、1<n<15の実数を示す。) (In formula (2), n is the average number of repetitions and is a real number in the range 1<n<15.)
前記式(1)、(2)中、nの値はエポキシ樹脂のゲルパーミエーションクロマトグラフィー(GPC、検出器:RI)の測定により求められた数平均分子量、あるいは分離したピークの各々の面積比から算出することができる。nは1<n<15の実数であることが好ましく、1<n<10であることがさら好ましく、1<n<5であることが特に好ましい。 In the above formulas (1) and (2), the value of n can be calculated from the number average molecular weight determined by measuring the epoxy resin by gel permeation chromatography (GPC, detector: RI) or from the area ratio of each of the separated peaks. n is preferably a real number in the range of 1<n<15, more preferably 1<n<10, and particularly preferably 1<n<5.
前記式(2)で表されるフェノール樹脂は前記式(1)で表されるエポキシ樹脂の原料ともなる。すなわち、前記式(1)で表されるエポキシ樹脂は、前記式(2)で表されるフェノール樹脂とエピハロヒドリンを反応させて得ることができる。 The phenolic resin represented by the formula (2) can also be used as a raw material for the epoxy resin represented by the formula (1). In other words, the epoxy resin represented by the formula (1) can be obtained by reacting the phenolic resin represented by the formula (2) with epihalohydrin.
前記エピハロヒドリンは市場から容易に入手できる。エピハロヒドリンの使用量は原料フェノール混合物の水酸基1モルに対し2.0~10モルであることが好ましく、より好ましくは3.0~8.0モル、さらに好ましくは3.5~6.0モルである。 The epihalohydrin is readily available on the market. The amount of epihalohydrin used is preferably 2.0 to 10 moles per mole of hydroxyl groups in the raw phenol mixture, more preferably 3.0 to 8.0 moles, and even more preferably 3.5 to 6.0 moles.
上記反応において、エポキシ化工程を促進する触媒としてアルカリ金属水酸化物を使用することができる。使用しうるアルカリ金属水酸化物としては水酸化ナトリウム、水酸化カリウム等が挙げられ、固形物を利用してもよく、その水溶液を使用してもよいが、本実施形態においては特に、溶解性、ハンドリングの面からフレーク状に成型された固形物の使用が好ましい。
アルカリ金属水酸化物の使用量は原料フェノール混合物の水酸基1モルに対して0.90~1.5モルであることが好ましく、より好ましくは0.95~1.25モル、さらに好ましくは0.99~1.15モルである。
In the above reaction, an alkali metal hydroxide can be used as a catalyst for promoting the epoxidation step. Examples of alkali metal hydroxides that can be used include sodium hydroxide, potassium hydroxide, etc., and a solid or an aqueous solution thereof can be used. In this embodiment, however, it is particularly preferable to use a solid formed into a flake shape in terms of solubility and handling.
The amount of the alkali metal hydroxide used is preferably 0.90 to 1.5 mol, more preferably 0.95 to 1.25 mol, and even more preferably 0.99 to 1.15 mol, per mol of hydroxyl groups in the raw phenol mixture.
また、反応を促進するためにテトラメチルアンモニウムクロライド、テトラメチルアンモニウムブロマイド、トリメチルベンジルアンモニウムクロライド等の4級アンモニウム塩を触媒として添加してもかまわない。4級アンモニウム塩の使用量としては原料フェノール混合物の水酸基1モルに対し0.1~15gであることが好ましく、より好ましくは0.2~10gである。 Furthermore, to accelerate the reaction, a quaternary ammonium salt such as tetramethylammonium chloride, tetramethylammonium bromide, or trimethylbenzylammonium chloride may be added as a catalyst. The amount of quaternary ammonium salt used is preferably 0.1 to 15 g, more preferably 0.2 to 10 g, per mole of hydroxyl groups in the raw phenol mixture.
反応温度は30~90℃であることが好ましく、より好ましくは35~80℃である。特に本実施形態においては、より高純度なエポキシ化のために50℃以上が好ましく、特に60℃以上が好ましい。反応時間は0.5~10時間であることが好ましく、より好ましくは1~8時間、特に好ましくは1~3時間である。反応時間が短いと反応が進みきらず、反応時間が長くなると副生成物ができることから好ましくない。
これらのエポキシ化反応の反応物を水洗後、または水洗無しに加熱減圧下でエピハロヒドリンや溶媒等を除去する。また更に加水分解性ハロゲンの少ないエポキシ樹脂とするために、回収したエポキシ樹脂を炭素数4~7のケトン化合物(たとえば、メチルイソブチルケトン、メチルエチルケトン、シクロペンタノン、シクロヘキサノン等が挙げられる。)を溶剤として溶解し、水酸化ナトリウム、水酸化カリウムなどのアルカリ金属水酸化物の水溶液を加えて反応を行い、閉環を確実なものにすることもできる。この場合アルカリ金属水酸化物の使用量はエポキシ化に使用した原料フェノール混合物の水酸基1モルに対して0.01~0.3モルであることが好ましく、より好ましくは0.05~0.2モルである。反応温度は50~120℃であることが好ましく、反応時間は0.5~2時間であることが好ましい。
The reaction temperature is preferably 30 to 90° C., more preferably 35 to 80° C. In particular, in this embodiment, for higher purity epoxidation, the reaction temperature is preferably 50° C. or higher, and particularly preferably 60° C. or higher. The reaction time is preferably 0.5 to 10 hours, more preferably 1 to 8 hours, and particularly preferably 1 to 3 hours. If the reaction time is short, the reaction does not proceed to completion, and if the reaction time is long, by-products are produced, which are not preferred.
The reaction product of these epoxidation reactions is washed with water or heated under reduced pressure to remove epihalohydrin and solvent. Furthermore, in order to obtain an epoxy resin with a small amount of hydrolyzable halogen, the recovered epoxy resin can be dissolved in a ketone compound having 4 to 7 carbon atoms (e.g., methyl isobutyl ketone, methyl ethyl ketone, cyclopentanone, cyclohexanone, etc.) as a solvent, and an aqueous solution of an alkali metal hydroxide such as sodium hydroxide or potassium hydroxide is added to carry out the reaction to ensure ring closure. In this case, the amount of the alkali metal hydroxide used is preferably 0.01 to 0.3 mol, more preferably 0.05 to 0.2 mol, per mol of hydroxyl groups in the raw material phenol mixture used in the epoxidation. The reaction temperature is preferably 50 to 120° C., and the reaction time is preferably 0.5 to 2 hours.
反応終了後、生成した塩を濾過、水洗などにより除去し、更に加熱減圧下溶剤を留去することにより前記式(1)で表されるエポキシ樹脂が得られる。 After the reaction is complete, the salt formed is removed by filtration, washing with water, etc., and the solvent is then distilled off under heating and reduced pressure to obtain the epoxy resin represented by formula (1).
前記式(2)で表されるフェノール樹脂の合成法としては、フルフラールとフェノール類との反応(縮合)を行う場合、フェノール類の量はフルフラール1モルに対して好ましくは1.5~20モル、特に好ましくは3~10モルの範囲である。 In the synthesis method of the phenolic resin represented by formula (2), when furfural is reacted (condensed) with a phenol, the amount of the phenol is preferably 1.5 to 20 moles, and more preferably 3 to 10 moles, per mole of furfural.
フェノール類としては、2置換フェノールとしてカテコール、レゾルシノール、ハイドロキノン、1置換フェノールとしてフェノールが挙げられ、単独でも2種類以上を併用しても良い。 Phenols include catechol, resorcinol, and hydroquinone as disubstituted phenols, and phenol as monosubstituted phenols, and may be used alone or in combination of two or more types.
溶媒としては、メタノール、エタノール、プロパノール、イソプロパノール、トルエン、キシレンなどが挙げられるがこれらに限定される物ではなく、単独でも2種以上を併用してもよい。溶媒を使用する場合、その使用量はフェノール100重量部に対し、5~500重量部であることが好ましく、より好ましくは10~300重量部の範囲である。 Solvents include, but are not limited to, methanol, ethanol, propanol, isopropanol, toluene, xylene, etc., and may be used alone or in combination of two or more. When using a solvent, the amount used is preferably 5 to 500 parts by weight, more preferably 10 to 300 parts by weight, per 100 parts by weight of phenol.
上記縮合反応においては塩基触媒を用いるのが好ましい。酸性触媒でも重縮合は可能であるが、フルフラール同士の反応も起こり、副生成物が多くなる。また、有機金属化合物を用いる方法もあるが、コスト的に不利である。塩基性触媒の具体例としては、水酸化リチウム、水酸化ナトリウム、水酸化カリウム等のアルカリ金属水酸化物、水酸化マグネシウム、水酸化カルシウム等のアルカリ土類金属水酸化物、ナトリウムメトキシド、ナトリウムエトキシド、カリウムメトキシド、カリウムエトキシド、カリウム-tert-ブトキシド等のアルカリ金属アルコキシド、マグネシウムメトキシド、マグネシウムエトキシド等のアルカリ土類金属アルコキシド等が挙げられるが、これらに限定される物ではなく、単独でも2種以上を併用してもよい。触媒の使用量は、フェノール1モルに対し、0.005~2.0倍モルであることが好ましく、より好ましくは0.01~1.1倍モルである。 In the above condensation reaction, it is preferable to use a base catalyst. Polycondensation is possible with an acid catalyst, but reactions between furfurals occur, resulting in a large amount of by-products. There is also a method using an organometallic compound, but this is cost-inefficient. Specific examples of base catalysts include alkali metal hydroxides such as lithium hydroxide, sodium hydroxide, and potassium hydroxide, alkaline earth metal hydroxides such as magnesium hydroxide and calcium hydroxide, alkali metal alkoxides such as sodium methoxide, sodium ethoxide, potassium methoxide, potassium ethoxide, and potassium tert-butoxide, and alkaline earth metal alkoxides such as magnesium methoxide and magnesium ethoxide, but the invention is not limited to these, and the catalyst may be used alone or in combination of two or more kinds. The amount of catalyst used is preferably 0.005 to 2.0 times the moles of phenol, and more preferably 0.01 to 1.1 times the moles.
これら塩基触媒存在下の縮合反応は40~180℃の範囲で行われるのが好ましく、特に好ましくは80~165℃の範囲で行われ、反応時間は0.5~10時間の範囲で選定することが好ましい。こうして得られた反応物は系内が中性になるように中和を行ったり溶媒の存在下に水洗を繰り返したりしたのち、水を分離排水後、加熱減圧下、溶媒及び未反応物を除去することにより前記式(2)で表されるフェノール樹脂が得られる。 The condensation reaction in the presence of these base catalysts is preferably carried out in the range of 40 to 180°C, particularly preferably in the range of 80 to 165°C, and the reaction time is preferably selected in the range of 0.5 to 10 hours. The reaction product thus obtained is neutralized so that the system becomes neutral, or repeatedly washed with water in the presence of a solvent, and the water is separated and drained, and the solvent and unreacted materials are removed under heating and reduced pressure to obtain the phenolic resin represented by formula (2).
前記式(2)で表されるフェノール樹脂は、前記式(1)で表されるエポキシ樹脂のエポキシ基1当量に対して0.7~1.2当量が好ましい。エポキシ基1当量に対して0.7当量に満たない場合、或いは1.2当量を越える場合、いずれも硬化が不完全になり、良好な硬化物性が得られない恐れがある。 The phenolic resin represented by formula (2) is preferably present in an amount of 0.7 to 1.2 equivalents per equivalent of epoxy group in the epoxy resin represented by formula (1). If the amount is less than 0.7 equivalents per equivalent of epoxy group, or if the amount exceeds 1.2 equivalents, curing may be incomplete and good cured physical properties may not be obtained.
環境問題の観点から、前記式(1)で表されるエポキシ樹脂のバイオマス度は20%以上であることが好ましく、25%以上であることがさらに好ましい。前記式(2)で表されるフェノール樹脂のバイオマス度は20%以上であることが好ましく、30%以上であることがさらに好ましい。本実施形態の硬化性樹脂組成物のバイオマス度は20%以上であることが好ましく、25%以上であることがさらに好ましい。バイオマス度の上限は特に限定されず100%で良いが、硬化物性との兼ね合いから、60%であることが好ましく、40%であることがさらに好ましい。バイオマス度が高いことは、石油等に代表される化石資源系材料の使用量を低減することでもあり得るので、資源の持続的利用の点でも有意義である。 From the viewpoint of environmental issues, the biomass degree of the epoxy resin represented by the formula (1) is preferably 20% or more, and more preferably 25% or more. The biomass degree of the phenol resin represented by the formula (2) is preferably 20% or more, and more preferably 30% or more. The biomass degree of the curable resin composition of this embodiment is preferably 20% or more, and more preferably 25% or more. There is no particular limit to the upper limit of the biomass degree, and it may be 100%, but in consideration of the cured physical properties, it is preferably 60% and more preferably 40%. A high biomass degree can also reduce the amount of fossil resource-based materials such as petroleum used, and is therefore meaningful in terms of sustainable use of resources.
各材料や硬化性樹脂組成物のバイオマス度はASTM D6866-21に準拠して加速器重量分析法により求めることができる。 The biomass content of each material and curable resin composition can be determined by accelerator gravimetric analysis in accordance with ASTM D6866-21.
本実施形態の硬化性樹脂組成物において、前記式(1)で表されるエポキシ樹脂は単独、または他のエポキシ樹脂と併用して使用することができる。併用する場合、前記式(1)で表されるエポキシ樹脂が全エポキシ樹脂中に占める割合は5~95重量%が好ましく、10~95重量%がより好ましく、15~95重量%が更に好ましい。添加量が少ない場合、十分な耐熱性を発現できない場合がある。 In the curable resin composition of this embodiment, the epoxy resin represented by formula (1) may be used alone or in combination with other epoxy resins. When used in combination, the proportion of the epoxy resin represented by formula (1) in the total epoxy resin is preferably 5 to 95% by weight, more preferably 10 to 95% by weight, and even more preferably 15 to 95% by weight. If the amount added is small, sufficient heat resistance may not be achieved.
前記式(1)で表されるエポキシ樹脂と併用しうるエポキシ樹脂の具体例としては、ビスフェノール類(ビスフェノールA、ビスフェノールF、ビスフェノールS、ビフェノール、ビスフェノールAD等)もしくはフェノール類(フェノール、アルキル置換フェノール、芳香族置換フェノール、ナフトール、アルキル置換ナフトール、ジヒドロキシベンゼン、アルキル置換ジヒドロキシベンゼン、ジヒドロキシナフタレン等)と各種アルデヒド(ホルムアルデヒド、アセトアルデヒド、アルキルアルデヒド、ベンズアルデヒド、アルキル置換ベンズアルデヒド、ヒドロキシベンズアルデヒド、ナフトアルデヒド、グルタルアルデヒド、フタルアルデヒド、クロトンアルデヒド、シンナムアルデヒド等)との重縮合物;前記フェノール類と各種ジエン化合物(ジシクロペンタジエン、テルペン類、ビニルシクロヘキセン、ノルボルナジエン、ビニルノルボルネン、テトラヒドロインデン、ジビニルベンゼン、ジビニルビフェニル、ジイソプロペニルビフェニル、ブタジエン、イソプレン等)との重合物;前記フェノール類とケトン類(アセトン、メチルエチルケトン、メチルイソブチルケトン、アセトフェノン、ベンゾフェノン等)との重縮合物;前記フェノール類と芳香族ジメタノール類(ベンゼンジメタノール、ビフェニルジメタノール等)との重縮合物;前記フェノール類と芳香族ジクロロメチル類(α,α’-ジクロロキシレン、ビスクロロメチルビフェニル等)との重縮合物;前記フェノール類と芳香族ビスアルコキシメチル類(ビスメトキシメチルベンゼン、ビスメトキシメチルビフェニル、ビスフェノキシメチルビフェニル等)との重縮合物;前記ビスフェノール類と各種アルデヒドの重縮合物またはアルコール類等をグリシジル化したグリシジルエーテル系エポキシ樹脂、脂環式エポキシ樹脂、グリシジルアミン系エポキシ樹脂、グリシジルエステル系エポキシ樹脂等が挙げられる。植物由来成分を含むエポキシ樹脂の具体例としては、上記フェノール類としてカシュー油由来のカルダノールを使用して各種アルデヒド類と重縮合させた重縮合物をエポキシ化した化合物や、亜麻仁油や大豆油をエポキシ化した化合物が挙げられる。通常用いられるエポキシ樹脂であればこれらに限定されるものではない。これらは単独で用いてもよく、2種以上を用いてもよい。特に植物由来成分を含むエポキシ樹脂と併用するとバイオマス度を高めることができ好ましい。 Specific examples of epoxy resins that can be used in combination with the epoxy resin represented by formula (1) include polycondensates of bisphenols (bisphenol A, bisphenol F, bisphenol S, biphenol, bisphenol AD, etc.) or phenols (phenol, alkyl-substituted phenol, aromatic-substituted phenol, naphthol, alkyl-substituted naphthol, dihydroxybenzene, alkyl-substituted dihydroxybenzene, dihydroxynaphthalene, etc.) with various aldehydes (formaldehyde, acetaldehyde, alkyl aldehyde, benzaldehyde, alkyl-substituted benzaldehyde, hydroxybenzaldehyde, naphthaldehyde, glutaraldehyde, phthalaldehyde, crotonaldehyde, cinnamaldehyde, etc.); polycondensates of the phenols and various diene compounds (dicyclopentadiene, terpenes, vinylcyclohexene, norbornadiene, vinylnorbornene, tetrahydroindene, divinylbenzaldehyde, etc.); polycondensates of the phenols and aromatic dimethanols (benzene dimethanol, biphenyl dimethanol, etc.); polycondensates of the phenols and aromatic dichloromethyls (α,α'-dichloroxylene, bischloromethylbiphenyl, etc.); polycondensates of the phenols and aromatic bisalkoxymethyls (bismethoxymethylbenzene, bismethoxymethylbiphenyl, bisphenoxymethylbiphenyl, etc.); polycondensates of the bisphenols and various aldehydes or alcohols, etc., glycidyl ether epoxy resins, alicyclic epoxy resins, glycidylamine epoxy resins, glycidyl ester epoxy resins, etc. Specific examples of epoxy resins containing plant-derived components include compounds obtained by epoxidizing polycondensates obtained by polycondensing various aldehydes with cardanol derived from cashew oil as the phenol, and compounds obtained by epoxidizing linseed oil or soybean oil. There is no limitation to these, as long as they are commonly used epoxy resins. These may be used alone or in combination with two or more kinds. In particular, it is preferable to use them in combination with epoxy resins containing plant-derived components, as this can increase the biomass ratio.
本実施形態の硬化性樹脂組成物は前記式(2)で表されるフェノール樹脂以外の硬化剤を併用しても良い。例えば、酸無水物化合物、アミン化合物、アミド系化合物、フェノール系化合物、活性エステル化合物などが挙げられる。併用しうる硬化剤の具体例としては、無水フタル酸、無水トリメリット酸、無水ピロメリット酸、無水マレイン酸、テトラヒドロ無水フタル酸、メチルテトラヒドロ無水フタル酸、無水メチルナジック酸、ヘキサヒドロ無水フタル酸、メチルヘキサヒドロ無水フタル酸等の酸無水物系化合物;ジシアンジアミド、リノレン酸の2量体とエチレンジアミンとにより合成されるポリアミド樹脂等のアミド系化合物;o-フェニレンジアミン、m-フェニレンジアミン、p-フェニレンジアミン、4,4’-ジアミノジフェニルスルホン、3,4’-ジアミノジフェニルスルホン、3,3’-ジアミノジフェニルスルホン、2,2’-ジアミノジフェニルスルホン、ジエチルトルエンジアミン、ジメチルチオトルエンジアミン、ジアミノジフェニルメタン、3,3’-ジメチル-4,4’-ジアミノジフェニルメタン、3,3’-ジエチル-4,4’-ジアミノジフェニルメタン、4,4’-ジアミノ-3,3’-ジエチル-5,5’-ジメチルジフェニルメタン、4,4’-ジアミノ-3,3’,5,5’-テトラメチルジフェニルメタン、4,4’-ジアミノ-3,3’,5,5’-テトラエチルジフェニルメタン、4,4’-ジアミノ-3,3’,5,5’-テトライソプロピルジフェニルメタン、4,4’-メチレンビス(N-メチルアニリン)、ビス(アミノフェニル)フルオレン、3,4’-ジアミノジフェニルエーテル、4,4’-ジアミノジフェニルエーテル、2,2’-ビス[4-(4-アミノフェノキシ)フェニル]プロパン、ビス[4-(4-アミノフェノキシ)フェニル]スルホン、1,3’-ビス(4-アミノフェノキシ)ベンゼン、1,4’-ビス(4-アミノフェノキシ)ベンゼン、1,4’-ビス(4-アミノフェノキシ)ビフェニル、4,4’-(1,3-フェニレンジイソプロピリデン)ビスアニリン、4,4’-(1,4-フェニレンジイソプロピリデン)ビスアニリン、ナフタレンジアミン、ベンジジン、ジメチルベンジジン等の芳香族アミン化合物、1,3-ビス(アミノメチル)シクロヘキサン、イソホロンジアミン、4,4’-メチレンビス(シクロヘキシルアミン)、ノルボルナンジアミン、エチレンジアミン、プロパンジアミン、テトラメチレンジアミン、ペンタメチレンジアミン、ヘキサメチレンジアミン、ダイマージアミン、トリエチレンテトラミン等の脂肪族アミン化合物;ビスフェノール類(ビスフェノールA、ビスフェノールF、ビスフェノールS、ビフェノール、ビスフェノールAD等)もしくはフェノール類(フェノール、アルキル置換フェノール、芳香族置換フェノール、ナフトール、アルキル置換ナフトール、ジヒドロキシベンゼン、アルキル置換ジヒドロキシベンゼン、ジヒドロキシナフタレン等)と各種アルデヒド(ホルムアルデヒド、アセトアルデヒド、アルキルアルデヒド、ベンズアルデヒド、アルキル置換ベンズアルデヒド、ヒドロキシベンズアルデヒド、ナフトアルデヒド、グルタルアルデヒド、フタルアルデヒド、クロトンアルデヒド、シンナムアルデヒド等)との重縮合物、または前記フェノール類と各種ジエン化合物(ジシクロペンタジエン、テルペン類、ビニルシクロヘキセン、ノルボルナジエン、ビニルノルボルネン、テトラヒドロインデン、ジビニルベンゼン、ジビニルビフェニル、ジイソプロペニルビフェニル、ブタジエン、イソプレン等)との重合物、または前記フェノール類とケトン類(アセトン、メチルエチルケトン、メチルイソブチルケトン、アセトフェノン、ベンゾフェノン等)との重縮合物、または前記フェノール類と芳香族ジメタノール類(ベンゼンジメタノール、ビフェニルジメタノール等)との重縮合物、または前記フェノール類と芳香族ジクロロメチル類(α,α’-ジクロロキシレン、ビスクロロメチルビフェニル等)との重縮合物、または前記フェノール類と芳香族ビスアルコキシメチル類(ビスメトキシメチルベンゼン、ビスメトキシメチルビフェニル、ビスフェノキシメチルビフェニル等)との重縮合物、または前記ビスフェノール類と各種アルデヒドの重縮合物、及びこれらの変性物等のフェノール系化合物;フェノールエステル類、チオフェノールエステル類、N-ヒドロキシアミンエステル類、複素環ヒドロキシ化合物のエステル類等の活性エステル化合物;などが挙げられるがこれらに限定されることはない。 The curable resin composition of this embodiment may be used in combination with a curing agent other than the phenolic resin represented by formula (2). Examples include acid anhydride compounds, amine compounds, amide compounds, phenolic compounds, and active ester compounds. Specific examples of curing agents that can be used in combination include acid anhydride compounds such as phthalic anhydride, trimellitic anhydride, pyromellitic anhydride, maleic anhydride, tetrahydrophthalic anhydride, methyltetrahydrophthalic anhydride, methylnadic anhydride, hexahydrophthalic anhydride, and methylhexahydrophthalic anhydride; amide compounds such as dicyandiamide, polyamide resins synthesized from a dimer of linoleic acid and ethylenediamine; o-phenylenediamine, m-phenylenediamine, p-phenylenediamine, 4,4'-diamidinosylamine, and the like. aminodiphenyl sulfone, 3,4'-diaminodiphenyl sulfone, 3,3'-diaminodiphenyl sulfone, 2,2'-diaminodiphenyl sulfone, diethyltoluenediamine, dimethylthiotoluenediamine, diaminodiphenylmethane, 3,3'-dimethyl-4,4'-diaminodiphenylmethane, 3,3'-diethyl-4,4'-diaminodiphenylmethane, 4,4'-diamino-3,3'-diethyl-5,5'-dimethyldiphenylmethane, 4,4'-diamino-3,3',5,5'-tetramethyl ethyldiphenylmethane, 4,4'-diamino-3,3',5,5'-tetraethyldiphenylmethane, 4,4'-diamino-3,3',5,5'-tetraisopropyldiphenylmethane, 4,4'-methylenebis(N-methylaniline), bis(aminophenyl)fluorene, 3,4'-diaminodiphenyl ether, 4,4'-diaminodiphenyl ether, 2,2'-bis[4-(4-aminophenoxy)phenyl]propane, bis[4-(4-aminophenoxy)phenyl]sulfone, 1,3'-bis Aromatic amine compounds such as (4-aminophenoxy)benzene, 1,4'-bis(4-aminophenoxy)benzene, 1,4'-bis(4-aminophenoxy)biphenyl, 4,4'-(1,3-phenylenediisopropylidene)bisaniline, 4,4'-(1,4-phenylenediisopropylidene)bisaniline, naphthalenediamine, benzidine, and dimethylbenzidine; 1,3-bis(aminomethyl)cyclohexane, isophoronediamine, 4,4'-methylenebis(cyclohexylamine), norborna aliphatic amine compounds such as diamine, ethylenediamine, propanediamine, tetramethylenediamine, pentamethylenediamine, hexamethylenediamine, dimer diamine, and triethylenetetramine; bisphenols (bisphenol A, bisphenol F, bisphenol S, biphenol, bisphenol AD, and the like) or phenols (phenol, alkyl-substituted phenols, aromatic substituted phenols, naphthol, alkyl-substituted naphthol, dihydroxybenzene, alkyl-substituted dihydroxybenzene, and the like); polycondensates of phenols and various diene compounds (dicyclopentadiene, terpenes, vinylcyclohexene, norbornadiene, vinylnorbornene, tetrahydroindene, etc.) with various aldehydes (formaldehyde, acetaldehyde, alkyl aldehydes, benzaldehyde, alkyl-substituted benzaldehyde, hydroxybenzaldehyde, naphthaldehyde, glutaraldehyde, phthalaldehyde, crotonaldehyde, cinnamaldehyde, etc.); phenolic compounds such as polymers of the phenols and ketones (acetone, methyl ethyl ketone, methyl isobutyl ketone, acetophenone, benzophenone, etc.), polycondensates of the phenols and aromatic dimethanols (benzene dimethanol, biphenyl dimethanol, etc.), polycondensates of the phenols and aromatic dichloromethyls (α,α'-dichloroxylene, bischloromethylbiphenyl, etc.), polycondensates of the phenols and aromatic bisalkoxymethyls (bismethoxymethylbenzene, bismethoxymethylbiphenyl, bisphenoxymethylbiphenyl, etc.), polycondensates of the bisphenols and various aldehydes, and modified products thereof; active ester compounds such as phenol esters, thiophenol esters, N-hydroxyamine esters, and esters of heterocyclic hydroxy compounds; and the like, but are not limited to these.
本実施形態の硬化性樹脂組成物は、硬化促進剤を併用しても差し支えない。使用できる硬化促進剤としては、例えば、2-メチルイミダゾール、2-エチルイミダゾール、2-フェニルイミダゾール、2-エチル-4-メチルイミダゾール等のイミダゾール類、2-(ジメチルアミノメチル)フェノール、トリエチレンジアミン、トリエタノールアミン、1,8-ジアザビシクロ[5,4,0]ウンデセン-7等の第3級アミン類、トリフェニルホスフィン、ジフェニルホスフィン、トリブチルホスフィン等の有機ホスフィン類、オクチル酸スズなどの金属化合物、テトラフェニルホスホニウム・テトラフェニルボレート、テトラフェニルホスホニウム・エチルトリフェニルボレート等のテトラ置換ホスホニウム・テトラ置換ボレート、2-エチル-4-メチルイミダゾール・テトラフェニルボレート、N-メチルモルホリン・テトラフェニルボレート等のテトラフェニルボロン塩、安息香酸、フタル酸、イソフタル酸、テレフタル酸、ナフトエ酸、サリチル酸等のカルボン酸系化合物などが挙げられる。硬化促進剤は、エポキシ樹脂100重量部に対して0.01~15重量部が必要に応じて用いられる。 The curable resin composition of this embodiment may be used in combination with a curing accelerator. Examples of the curing accelerator that can be used include imidazoles such as 2-methylimidazole, 2-ethylimidazole, 2-phenylimidazole, and 2-ethyl-4-methylimidazole; tertiary amines such as 2-(dimethylaminomethyl)phenol, triethylenediamine, triethanolamine, and 1,8-diazabicyclo[5,4,0]undecene-7; organic phosphines such as triphenylphosphine, diphenylphosphine, and tributylphosphine; metal compounds such as tin octylate; tetra-substituted phosphonium tetra-substituted borates such as tetraphenylphosphonium tetraphenylborate and tetraphenylphosphonium ethyltriphenylborate; tetraphenylboron salts such as 2-ethyl-4-methylimidazole tetraphenylborate and N-methylmorpholine tetraphenylborate; and carboxylic acid compounds such as benzoic acid, phthalic acid, isophthalic acid, terephthalic acid, naphthoic acid, and salicylic acid. The curing accelerator is used as needed in an amount of 0.01 to 15 parts by weight per 100 parts by weight of epoxy resin.
本実施形態の硬化性樹脂組成物は、必要に応じて無機充填剤を添加することができる。無機充填剤としては、結晶シリカ、溶融シリカ、アルミナ、ジルコン、珪酸カルシウム、炭酸カルシウム、炭化ケイ素、窒化ケイ素、窒化ホウ素、ジルコニア、フォステライト、ステアタイト、スピネル、チタニア、タルク等の粉体またはこれらを球形化したビーズ等が挙げられるが、これらに限定されるものではない。これらは単独で用いてもよく、2種以上を用いてもよい。これら無機充填剤は、用途によりその使用量は異なるが、例えば半導体素子の封止剤用途に使用する場合は硬化性樹脂組成物の硬化物の耐熱性、耐湿性、力学的性質、難燃性などの面から硬化性樹脂組成物中で20重量%以上占める割合で使用するのが好ましく、より好ましくは30重量%以上であり、特にリードフレームとの線膨張率を向上させるために70~95重量%を占める割合で使用するのがより好ましい。 The curable resin composition of this embodiment may contain an inorganic filler as needed. Examples of inorganic fillers include, but are not limited to, powders such as crystalline silica, fused silica, alumina, zircon, calcium silicate, calcium carbonate, silicon carbide, silicon nitride, boron nitride, zirconia, fosterite, steatite, spinel, titania, and talc, or beads obtained by shaping these into spherical form. These may be used alone or in combination of two or more. The amount of these inorganic fillers used varies depending on the application, but when used as an encapsulant for semiconductor elements, it is preferable to use the inorganic fillers in a proportion of 20% by weight or more in the curable resin composition in terms of the heat resistance, moisture resistance, mechanical properties, and flame retardancy of the cured product of the curable resin composition, more preferably 30% by weight or more, and more preferably 70 to 95% by weight in order to improve the linear expansion coefficient with the lead frame.
本実施形態の硬化性樹脂組成物は成形時の金型との離型を良くするために離型剤を配合することができる。離型剤としては従来公知のものいずれも使用できるが、例えばカルナバワックス、モンタンワックスなどのエステル系ワックス、ステアリン酸、パルミチン酸などの脂肪酸およびこれらの金属塩、酸化ポリエチレン、非酸化ポリエチレンなどのポリオレフィン系ワックスなどが挙げられる。これらは単独で使用しても2種以上併用しても良い。これら離型剤の配合量は全有機成分に対して0.5~3重量%が好ましい。これより少なすぎると金型からの離型が悪く、多すぎるとリードフレームなどとの接着が悪くなる。 The curable resin composition of this embodiment can be blended with a release agent to improve release from the mold during molding. Any of the conventionally known release agents can be used, including, for example, ester waxes such as carnauba wax and montan wax, fatty acids such as stearic acid and palmitic acid and their metal salts, and polyolefin waxes such as oxidized polyethylene and non-oxidized polyethylene. These may be used alone or in combination of two or more. The amount of these release agents blended is preferably 0.5 to 3% by weight of the total organic components. If it is less than this, release from the mold is poor, and if it is too much, adhesion to the lead frame and the like is poor.
本実施形態の硬化性樹脂組成物は無機充填剤と樹脂成分との接着性を高めるためにカップリング剤を配合することができる。カップリング剤としては従来公知のものをいずれも使用できるが、例えばビニルアルコキシシラン、エポキシアルコキシシラン、スチリルアルコキシシラン、メタクリロキシアルコキシシラン、アクリロキシアルコキシシラン、アミノアルコキシシラン、メルカプトアルコキシシラン、イソシアナートアルコキシシランなどの各種アルコキシシラン化合物、アルコキシチタン化合物、アルミニウムキレート類などが挙げられる。これらは単独で使用しても2種以上併用しても良い。カップリング剤の添加方法は、カップリング剤であらかじめ無機充填剤表面を処理した後、樹脂と混練しても良いし、樹脂にカップリング剤を混合してから無機充填剤を混練しても良い。 The curable resin composition of this embodiment can be blended with a coupling agent to improve adhesion between the inorganic filler and the resin component. Any of the conventionally known coupling agents can be used, including, for example, various alkoxysilane compounds such as vinylalkoxysilane, epoxyalkoxysilane, styrylalkoxysilane, methacryloxyalkoxysilane, acryloxyalkoxysilane, aminoalkoxysilane, mercaptoalkoxysilane, and isocyanatoalkoxysilane, alkoxytitanium compounds, and aluminum chelates. These may be used alone or in combination of two or more. The coupling agent may be added by treating the surface of the inorganic filler with the coupling agent beforehand and then kneading it with the resin, or by mixing the coupling agent with the resin and then kneading the inorganic filler.
本実施形態の硬化性樹脂組成物には、必要に応じて公知の添加剤を配合することができる。用いうる添加剤の具体例としては、ポリブタジエン及びこの変性物、アクリロニトリル共重合体の変性物、ポリフェニレンエーテル、ポリスチレン、ポリエチレン、ポリイミド、フッ素樹脂、マレイミド系化合物、シアネートエステル系化合物、シリコーンゲル、シリコーンオイル、並びにカーボンブラック、フタロシアニンブルー、フタロシアニングリーン等の着色剤などが挙げられる。 The curable resin composition of this embodiment may contain known additives as necessary. Specific examples of additives that may be used include polybutadiene and modified products thereof, modified acrylonitrile copolymers, polyphenylene ether, polystyrene, polyethylene, polyimide, fluororesin, maleimide-based compounds, cyanate ester-based compounds, silicone gel, silicone oil, and colorants such as carbon black, phthalocyanine blue, and phthalocyanine green.
本実施形態の硬化性樹脂組成物は、上記各成分を均一に混合することにより得られる。本実施形態の硬化性樹脂組成物の製造方法は特に限定されないが、例えば、エポキシ樹脂に、硬化剤、硬化促進剤、無機充填剤、離型剤、シランカップリング剤、添加剤などを押出機、ニーダ、ロール、プラネタリーミキサー等を用いて均一になるまで充分に混合することにより得ることができる。 The curable resin composition of this embodiment is obtained by uniformly mixing the above components. There are no particular limitations on the method for producing the curable resin composition of this embodiment, but it can be obtained, for example, by thoroughly mixing the epoxy resin with a curing agent, a curing accelerator, an inorganic filler, a release agent, a silane coupling agent, additives, etc., using an extruder, kneader, roll, planetary mixer, etc. until the mixture is uniform.
得られた硬化性樹脂組成物はその成型方法により、樹脂シート、プリプレグなど各種形態を取ることができる。プリプレグの形態は、例えば、本実施形態の硬化性樹脂組成物および/または樹脂シートを加熱溶融して低粘度化して繊維基材に含浸させることにより得ることができる。 The obtained curable resin composition can be formed into various forms such as a resin sheet or a prepreg, depending on the molding method. A prepreg form can be obtained, for example, by heating and melting the curable resin composition and/or the resin sheet of this embodiment to reduce the viscosity and impregnating the composition into a fiber substrate.
本実施形態の硬化性樹脂組成物は、必要に応じてトルエン、キシレン、アセトン、メチルエチルケトン、メチルイソブチルケトン、ジメチルホルムアミド、ジメチルアセトアミド、N-メチルピロリドン等の溶剤に溶解させてワニス状の組成物(以下、単にワニスともいう。)とし、ガラス繊維、カーボン繊維、ポリエステル繊維、ポリアミド繊維、アルミナ繊維、紙などの基材に含浸させて加熱乾燥してプリプレグを作成することもできる。この際の溶剤は、本実施形態の硬化性樹脂組成物と該溶剤の混合物中で10~70重量%、好ましくは15~70重量%を占める量を用いる。 The curable resin composition of this embodiment can be dissolved in a solvent such as toluene, xylene, acetone, methyl ethyl ketone, methyl isobutyl ketone, dimethylformamide, dimethylacetamide, or N-methylpyrrolidone as necessary to form a varnish-like composition (hereinafter simply referred to as varnish), which can then be impregnated into a substrate such as glass fiber, carbon fiber, polyester fiber, polyamide fiber, alumina fiber, or paper, and dried by heating to produce a prepreg. The solvent used in this case is in an amount that occupies 10 to 70% by weight, preferably 15 to 70% by weight, of the mixture of the curable resin composition of this embodiment and the solvent.
上記のプリプレグを所望の形に裁断、積層後、積層物にプレス成形法やオートクレーブ成形法、シートワインディング成形法などで圧力をかけながらエポキシ樹脂組成物を加熱硬化させることにより炭素繊維強化プラスチック(CFRP)を得ることができる。また、プリプレグの積層時に銅箔や有機フィルムを積層することもできる。 The above prepregs are cut into the desired shape and laminated, and then the laminate is subjected to pressure using a press molding method, autoclave molding method, sheet winding molding method, or other method while the epoxy resin composition is heated and cured to obtain carbon fiber reinforced plastic (CFRP). Copper foil or organic film can also be laminated when laminating the prepregs.
CFRPの成形方法は、上記の方法のほかに、公知の方法にて成形して得ることもできる。例えば、炭素繊維基材(通常、炭素繊維織物を使用)を裁断、積層、賦形してプリフォーム(樹脂を含浸する前の予備成形体)を作製、プリフォームを成形型内に配置して型を閉じ、樹脂を注入してプリフォームに含浸、硬化させた後、型を開いて成形品を取り出すレジントランスファー成形技術(RTM法)を用いることもできる。また、RTM法の一種である、例えば、VaRTM法、SCRIMP(Seeman’s Composite Resin Infusion Molding Process)法、特表2005-527410記載の樹脂供給タンクを大気圧よりも低い圧力まで排気し、循環圧縮を用い、かつ正味の成形圧力を制御することにとよって、樹脂注入プロセス、特にVaRTM法をより適切に制御するCAPRI(Controlled Atmospheric Pressure Resin Infusion)法なども用いることができる。さらに、繊維基材を樹脂シート(フィルム)で挟み込むフィルムスタッキング法や、含浸向上のため強化繊維基材にパウダー状の樹脂を付着させる方法、繊維基材に樹脂を混ぜる過程において流動層あるいは流体スラリー法を用いる成形方法(Powder Impregnated Yarn)、繊維基材に樹脂繊維を混繊させる方法も用いることができる。 In addition to the above-mentioned methods, CFRP can also be obtained by molding using known methods. For example, resin transfer molding technology (RTM method) can be used, in which a carbon fiber substrate (usually woven carbon fiber fabric) is cut, laminated, and shaped to create a preform (a preliminary molded body before being impregnated with resin), the preform is placed in a mold and the mold is closed, resin is injected to impregnate the preform and harden it, and the mold is then opened to remove the molded product. In addition, it is also possible to use a type of RTM method, such as the VaRTM method, the SCRIMP (Seeman's Composite Resin Infusion Molding Process) method, or the CAPRI (Controlled Atmospheric Pressure Resin Infusion) method, which more appropriately controls the resin injection process, particularly the VaRTM method, by evacuating the resin supply tank described in JP-A-2005-527410 to a pressure lower than atmospheric pressure, using circulatory compression, and controlling the net molding pressure. In addition, other methods that can be used include the film stacking method, in which the fiber substrate is sandwiched between resin sheets (films), the method of attaching powdered resin to the reinforced fiber substrate to improve impregnation, the molding method (Powder Impregnated Yarn) that uses a fluidized bed or fluid slurry method in the process of mixing the resin into the fiber substrate, and the method of blending resin fibers into the fiber substrate.
炭素繊維としては、アクリル系、ピッチ系、レーヨン系などの炭素繊維が挙げられ、なかでも引張強度の高いアクリル系の炭素繊維が好ましく用いられる。炭素繊維の形態としては、有撚糸、解撚糸および無撚糸等を使用することができるが、繊維強化複合材料の成形性と強度特性のバランスが良いため、解撚糸または無撚糸が好ましく用いられる。 Carbon fibers include acrylic, pitch, and rayon carbon fibers, with acrylic carbon fibers being preferred due to their high tensile strength. The carbon fibers can be in the form of twisted yarn, untwisted yarn, or non-twisted yarn, but untwisted yarn or non-twisted yarn is preferred due to the good balance between the formability and strength properties of the fiber-reinforced composite material.
本実施形態の硬化性樹脂組成物の硬化物は上述のCFRPなどの用途以外にも各種用途に使用でき、例えば、接着剤、塗料、コーティング剤、成形材料(シート、フィルム、CFRP等も含む)、半導体素子用封止材、液晶表示素子用封止材、有機EL素子用封止材、プリント配線板(BGA用基板、ビルドアップ基板など)等の電気・電子部品や3Dプリンティング等の他、他樹脂等への添加剤等が挙げられる。 The cured product of the curable resin composition of this embodiment can be used for various applications other than the above-mentioned applications such as CFRP, such as adhesives, paints, coating agents, molding materials (including sheets, films, CFRP, etc.), encapsulants for semiconductor elements, encapsulants for liquid crystal display elements, encapsulants for organic EL elements, printed wiring boards (BGA substrates, build-up substrates, etc.), and other electric and electronic parts, 3D printing, as well as additives for other resins, etc.
前記接着剤としては、土木用、建築用、自動車用、一般事務用、医療用の接着剤の他、電子材料用の接着剤が挙げられる。これらのうち電子材料用の接着剤としては、ビルドアップ基板等の多層基板の層間接着剤、ダイボンディング剤、アンダーフィル等の半導体用接着剤、BGA補強用アンダーフィル、異方性導電性フィルム(ACF)、異方性導電性ペースト(ACP)等の実装用接着剤等が挙げられ、様々な用途に適用可能である。 The adhesives include adhesives for civil engineering, construction, automotive, general office, and medical use, as well as adhesives for electronic materials. Among these, adhesives for electronic materials include interlayer adhesives for multilayer boards such as build-up boards, die bonding agents, semiconductor adhesives such as underfills, underfills for reinforcing BGAs, and mounting adhesives such as anisotropic conductive films (ACFs) and anisotropic conductive pastes (ACPs), and can be used for a variety of purposes.
本実施形態の硬化性樹脂組成物を半導体素子用封止材へ適用する場合、本実施形態の硬化性樹脂組成物を半導体素子が具備されたリードフレーム、半導体パッケージ基板を金型に設置し、溶融注型法あるいはトランスファー成型法やインジェクション成型法、圧縮成型法などによって成型し、更に80~200℃で2~10時間に加熱することにより硬化物を得ることができる。本封止材を用いて製造される半導体装置としては、コンデンサ、トランジスタ、ダイオード、発光ダイオード、IC、LSI用などのポッティング、ディッピング、トランスファーモールド封止、IC、LSI類のCOB、COF、TABなど用のといったポッティング封止、フリップチップ用のアンダーフィル、QFP、BGA、CSPなどのICパッケージ類実装時の封止(補強用アンダーフィルを含む)などを挙げることができる。 When the curable resin composition of this embodiment is applied to an encapsulant for semiconductor elements, the curable resin composition of this embodiment is placed in a mold along with a lead frame equipped with a semiconductor element and a semiconductor package substrate, and molded by melt casting, transfer molding, injection molding, compression molding, or the like, and then heated at 80 to 200°C for 2 to 10 hours to obtain a cured product. Examples of semiconductor devices manufactured using this encapsulant include potting, dipping, and transfer mold encapsulation for capacitors, transistors, diodes, light-emitting diodes, ICs, and LSIs, potting encapsulation for COB, COF, TAB, and the like for ICs and LSIs, underfill for flip chips, and encapsulation (including reinforcing underfill) when mounting IC packages such as QFP, BGA, and CSP.
本実施形態の硬化性樹脂組成物をプリント配線板用途へ適用する場合、加熱溶融し、低粘度化してガラス繊維、ポリアミド繊維などの強化繊維に含浸させることによりプリプレグを得ることもできる。その具体例としては、例えば、Eガラスクロス、Dガラスクロス、Sガラスクロス、Qガラスクロス、球状ガラスクロス、NEガラスクロス、及びTガラスクロス等のガラス繊維などおよび/または有機繊維が挙げられるが、これらに特に限定されない。基材の形状としては、特に限定されないが、例えば、織布、不織布、ロービング、チョップドストランドマットなどが挙げられる。また、織布の織り方としては、平織り、ななこ織り、綾織り等が知られており、これら公知のものから目的とする用途や性能により適宜選択して使用することができる。また、織布を開繊処理したものやシランカップリング剤などで表面処理したガラス織布が好適に使用される。基材の厚さは、特に限定されないが、好ましくは0.01~0.4mm程度である。また、前記ワニスを、強化繊維に含浸させて加熱乾燥させることによりプリプレグを得ることもでき、これを元に銅張積層板(CCL:Cupper Clad Laminate)の作成ができる。得られたプリプレグとCCLを熱プレス成形することにより、本実施形態の硬化性樹脂組成物を用いた積層板を作成することもできる。積層板はプリプレグを1枚以上備えるものであれば特に限定されず、他のいかなる層を有していてもよい。また、剥離フィルム上に前記ワニスを塗布し加熱下で溶剤を除去、Bステージ化を行うことによりシート状の接着剤を得ることができる。このシート状接着剤は多層基板などにおける層間絶縁層あるいは半導体を実装する際の接着シートとして使用することができる。また本実施形態の硬化性樹脂組成物は、パッケージ基板(サブストレート)やHDI(high density interconnect)などの特殊な基板材料にも好適に用いることができる。 When the curable resin composition of this embodiment is applied to a printed wiring board application, a prepreg can be obtained by heating and melting the composition to reduce the viscosity and impregnating the composition into reinforcing fibers such as glass fibers and polyamide fibers. Specific examples of the composition include, but are not limited to, glass fibers such as E glass cloth, D glass cloth, S glass cloth, Q glass cloth, spherical glass cloth, NE glass cloth, and T glass cloth, and/or organic fibers. The shape of the substrate is not particularly limited, but examples include woven fabric, nonwoven fabric, roving, chopped strand mat, and the like. In addition, the weaving method of the woven fabric includes plain weave, saddle weave, twill weave, and the like, and these known methods can be appropriately selected and used depending on the intended application and performance. In addition, woven fabrics that have been opened and glass woven fabrics that have been surface-treated with a silane coupling agent are preferably used. The thickness of the substrate is not particularly limited, but is preferably about 0.01 to 0.4 mm. In addition, the varnish can be impregnated into reinforcing fibers and dried by heating to obtain a prepreg, which can then be used to create a copper clad laminate (CCL). The obtained prepreg and CCL can be hot-press molded to create a laminate using the curable resin composition of this embodiment. The laminate is not particularly limited as long as it has one or more prepregs, and may have any other layers. In addition, a sheet-like adhesive can be obtained by applying the varnish onto a release film, removing the solvent under heating, and performing B-stage formation. This sheet-like adhesive can be used as an interlayer insulating layer in a multilayer board or an adhesive sheet when mounting a semiconductor. The curable resin composition of this embodiment can also be used suitably for special board materials such as package boards (substrates) and HDIs (high density interconnects).
以下に合成例および実施例を挙げて本発明をさらに具体的に説明する。以下に示す材料、処理内容、処理手順等は、本発明の趣旨を逸脱しない限り適宜変更することができる。したがって、本発明の範囲は以下に示す具体例により限定的に解釈されるべきものではない。以下、特に断わりのない限り、部は重量部である。 The present invention will be explained in more detail below with reference to synthesis examples and working examples. The materials, processing contents, processing procedures, etc. shown below can be changed as appropriate without departing from the spirit of the present invention. Therefore, the scope of the present invention should not be interpreted as being limited by the specific examples shown below. Hereinafter, parts are parts by weight unless otherwise specified.
各種分析方法について以下の条件で行った。
・エポキシ当量
JIS K-7236に記載された方法で測定し、単位はg/eq.である。
・軟化点
JIS K-7234に準拠した方法で測定し、単位は℃である。
・溶融粘度
ICI溶融粘度(150℃)コーンプレート法で測定し、単位はPa・sである。
・バイオマス度分析(加速器重量分析法)
ASTM D6866-21に準拠して測定し、算出した。単位は%である。
Various analytical methods were carried out under the following conditions.
Epoxy equivalent: Measured by the method described in JIS K-7236, and the unit is g/eq.
Softening point: Measured according to a method in accordance with JIS K-7234, and the unit is °C.
Melt Viscosity: ICI melt viscosity (150° C.) was measured by the cone-plate method, and the unit is Pa·s.
-Biomass content analysis (accelerator gravimetric analysis)
The measurement was carried out in accordance with ASTM D6866-21 and the calculation was carried out in units of %.
[合成例1]
撹拌機、還流冷却管、撹拌装置を備えたフラスコに、フェノール254重量部、水63重量部、水酸化ナトリウム27重量部を仕込み、撹拌、溶解後、110℃へ加熱したところへ、フルフラール44重量部を2時間かけて滴下した。その後110℃で3時間反応させた後、145℃に昇温した。昇温の際、留出してきた水は系外へ除いた。145℃に到達したのち、4時間反応させた。ついで80℃まで冷却し、水63重量部を仕込み、リン酸4重量部、35%塩酸63重量部を加えて中和した。水洗を繰り返した後、加熱減圧下において、未反応フェノールを留去せしめて、前記式(2)で表されるフェノール樹脂A109重量部を得た。GPCから繰り返し数の平均値nは1.5、バイオマス度は34%であった。フェノール樹脂AのGPCチャートを図1に示す。
[Synthesis Example 1]
In a flask equipped with a stirrer, a reflux condenser, and a stirrer, 254 parts by weight of phenol, 63 parts by weight of water, and 27 parts by weight of sodium hydroxide were charged, stirred, dissolved, and then heated to 110°C, where 44 parts by weight of furfural was dropped over 2 hours. After that, the mixture was reacted at 110°C for 3 hours, and then heated to 145°C. During the temperature increase, the water distilled out was removed from the system. After reaching 145°C, the mixture was reacted for 4 hours. Then, the mixture was cooled to 80°C, 63 parts by weight of water was charged, and 4 parts by weight of phosphoric acid and 63 parts by weight of 35% hydrochloric acid were added to neutralize. After repeated washing with water, unreacted phenol was distilled off under reduced pressure by heating to obtain 109 parts by weight of phenolic resin A represented by the formula (2). From GPC, the average value n of the number of repetitions was 1.5, and the biomass degree was 34%. The GPC chart of phenolic resin A is shown in Figure 1.
[合成例2]
合成例1で得られたフェノール樹脂A78重量部に対してエピクロルヒドリン(ECH、以下同様)254重量部、ジメチルスルホキシド(DMSO、以下同様)64重量部、水13重量部を反応容器に仕込み、加熱、撹拌、溶解後、温度を45℃に保持しながら、フレーク状の水酸化ナトリウム23重量部を2時間かけて分割で仕込んだ。その後、45℃で2時間、70℃で60分更に反応を行った。ついで水洗を繰り返し、副生成塩とジメチルスルホキシドを除去した後、油層から加熱減圧下において過剰のエピクロルヒドリンを留去し、残留物に218重量部のメチルイソブチルケトンを添加し溶解した。このメチルイソブチルケトン溶液を70℃に加熱し30%水酸化ナトリウム水溶液7重量部を添加し、1時間反応させた後、反応液の水洗を洗浄液が中性となるまで繰り返した。ついで油層から加熱減圧下においてメチルイソブチルケトンを留去することにより前記式(1)で表されるエポキシ樹脂A97重量部を得た。エポキシ当量は214g/eq.、軟化点は49℃、ICI溶融粘度は0.04Pa・s、GPCから繰り返し数の平均値nは2.1、バイオマス度は25%であった。エポキシ樹脂AのGPCチャートを図2に示す。
[Synthesis Example 2]
78 parts by weight of phenolic resin A obtained in Synthesis Example 1 was charged into a reaction vessel with 254 parts by weight of epichlorohydrin (ECH, hereinafter the same), 64 parts by weight of dimethyl sulfoxide (DMSO, hereinafter the same), and 13 parts by weight of water, and after heating, stirring, and dissolving, 23 parts by weight of flake-shaped sodium hydroxide was charged in portions over 2 hours while maintaining the temperature at 45°C. Thereafter, the reaction was further carried out at 45°C for 2 hours and at 70°C for 60 minutes. Next, washing with water was repeated to remove by-product salts and dimethyl sulfoxide, and then excess epichlorohydrin was distilled off from the oil layer under heating and reduced pressure, and 218 parts by weight of methyl isobutyl ketone was added to the residue and dissolved. This methyl isobutyl ketone solution was heated to 70°C, 7 parts by weight of 30% aqueous sodium hydroxide solution was added, and the reaction was carried out for 1 hour, after which the reaction solution was repeatedly washed with water until the washing liquid became neutral. Next, methyl isobutyl ketone was distilled off from the oil layer under heating and reduced pressure to obtain 97 parts by weight of epoxy resin A represented by the above formula (1). The epoxy equivalent was 214 g/eq., the softening point was 49°C, the ICI melt viscosity was 0.04 Pa s, the average number of repeats n was 2.1 from GPC, and the biomass degree was 25%. The GPC chart of epoxy resin A is shown in Figure 2.
[実施例1]
合成例2で得られたエポキシ樹脂Aを主剤とし、硬化剤として合成例1で得られたフェノール樹脂A、硬化促進剤としてTPP(トリフェニルホスフィン)を表1の配合組成に示す重量比で配合混練し、180℃6時間の硬化条件で硬化させ、硬化物を作成した。硬化物のバイオマス度は28.3%であった。
[Example 1]
The epoxy resin A obtained in Synthesis Example 2 was used as the base resin, the phenol resin A obtained in Synthesis Example 1 was used as the curing agent, and TPP (triphenylphosphine) was used as the curing accelerator. These were mixed and kneaded in the weight ratio shown in the composition in Table 1, and cured at 180°C for 6 hours to produce a cured product. The biomass content of the cured product was 28.3%.
[比較例1]
合成例1で得られたエポキシ樹脂Aを主剤とし、硬化剤としてPN(フェノールノボラック樹脂、明和化成社製、水酸基当量103g/eq.)、硬化促進剤としてTPP(トリフェニルホスフィン)を表1の配合組成に示す重量比で配合混練し、180℃6時間の硬化条件で硬化させ、硬化物を作成した。硬化物のバイオマス度は16.6%であった。
[Comparative Example 1]
The epoxy resin A obtained in Synthesis Example 1 was used as the base resin, PN (phenol novolac resin, manufactured by Meiwa Chemical Industry Co., Ltd., hydroxyl equivalent 103 g/eq.) as a curing agent, and TPP (triphenylphosphine) as a curing accelerator were mixed and kneaded in the weight ratio shown in the composition in Table 1, and cured at 180°C for 6 hours to produce a cured product. The biomass degree of the cured product was 16.6%.
物性値の測定は以下の条件で測定した。
<耐熱性(Tg)測定条件>
動的粘弾性測定器:TA-instruments、DMA-Q800
測定温度範囲:25~300℃
昇温速度:2℃/分
Tg:Tanδのピーク点をTgとした。
<誘電率、誘電正接試験>
(株)AET社製の10GHz空洞共振器を用いて、25℃において空洞共振器摂動法にてテストを行った。サンプルサイズは幅2.5mm×長さ50mmとし、厚さは0.3mmで試験を行った。
<引張弾性率、引張最大点応力>
(株)島津製作所のオートグラフAGS-Xを用いて、引張速度0.5mm/min、試験片の長さが5cmになるように挟み、180°方向に上記の試験速度で引っ張り測定した。
The physical properties were measured under the following conditions.
<Heat resistance (Tg) measurement conditions>
Dynamic viscoelasticity measuring instrument: TA-instruments, DMA-Q800
Measurement temperature range: 25 to 300°C
Temperature rise rate: 2° C./min. Tg: The peak point of Tan δ was taken as Tg.
<Dielectric constant and dielectric tangent test>
The test was performed by a cavity resonator perturbation method at 25° C. using a 10 GHz cavity resonator manufactured by AET Co., Ltd. The sample size was 2.5 mm wide x 50 mm long, and the thickness was 0.3 mm.
<Tensile modulus, maximum tensile stress>
Using an Autograph AGS-X manufactured by Shimadzu Corporation, the test pieces were clamped so that they had a length of 5 cm and were tensile measured in the 180° direction at the above test speed with a tensile speed of 0.5 mm/min.
表1の結果より実施例1はバイオマス度が高く、高耐熱性、低誘電特性、機械特性に優れることが確認された。 The results in Table 1 confirm that Example 1 has a high biomass content, high heat resistance, low dielectric properties, and excellent mechanical properties.
Claims (8)
A cured product obtained by curing the curable resin composition according to claim 1 .
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Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2000319345A (en) * | 1999-05-14 | 2000-11-21 | Nippon Kayaku Co Ltd | Thermosetting resin composition and its cured product |
| JP2001064339A (en) * | 1999-08-25 | 2001-03-13 | Nippon Kayaku Co Ltd | Phenolic resin, epoxy resin, thermosetting resin composition, and production of resin |
| JP2014201639A (en) * | 2013-04-03 | 2014-10-27 | 日本化薬株式会社 | Epoxy resin composition and cured product of the same |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2000319345A (en) * | 1999-05-14 | 2000-11-21 | Nippon Kayaku Co Ltd | Thermosetting resin composition and its cured product |
| JP2001064339A (en) * | 1999-08-25 | 2001-03-13 | Nippon Kayaku Co Ltd | Phenolic resin, epoxy resin, thermosetting resin composition, and production of resin |
| JP2014201639A (en) * | 2013-04-03 | 2014-10-27 | 日本化薬株式会社 | Epoxy resin composition and cured product of the same |
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