WO2024262339A1 - Composition, film, optical filter, solid-state imaging element, image display device, infrared sensor, camera module, and compound - Google Patents

Abstract

This composition contains: a compound represented by formula (1); a curable compound; and a solvent. The present invention also pertains to a film, an optical filter, a solid-state imaging element, an image display device, an infrared sensor, and a camera module, in each of which said composition is used.

Description

Composition, film, optical filter, solid-state imaging device, image display device, infrared sensor, camera module and compound

The present invention relates to a squarylium compound and a composition containing the squarylium compound. The present invention also relates to a film, an optical filter, a solid-state imaging device, an image display device, an infrared sensor, and a camera module that use a composition containing the squarylium compound.

　Video cameras, digital still cameras, mobile phones with cameras, and other devices use solid-state color image sensors such as CCDs (charge-coupled devices) and CMOS (complementary metal-oxide semiconductors). These solid-state image sensors use silicon photodiodes that are sensitive to infrared light in their light receiving section. For this reason, infrared-cut filters are sometimes used to correct visibility.

Infrared cut filters are manufactured using a composition that contains an infrared absorbing agent. Known examples of infrared absorbing agents include squarylium compounds.

Patent Document 1 describes the production of infrared cut filters and the like using a composition containing a specific squarylium compound.

JP 2022-189736 A

However, squarylium compounds tend to have low heat resistance. For this reason, there is room for further improvement in the heat resistance of films obtained using compositions containing these compounds.

Therefore, an object of the present invention is to provide a composition capable of forming a film having excellent heat resistance. In addition, the present invention is to provide a film, an optical filter, a solid-state imaging device, an image display device, an infrared sensor, a camera module, and a compound.

The present invention provides the following:

<1> A composition comprising a compound represented by formula (1), a curable compound, and a solvent;
In formula (1), R ¹ represents -OR _a , -NR _b R _c or -SR _d ;
R _a and R _d each independently represent an alkyl group having a steric substituent constant -Es' of 0.40 or more, a cycloalkyl group having a steric substituent constant -Es' of 0.40 or more, an aryl group having a steric substituent constant -Es' of 0.40 or more, or a heteroaryl group having a steric substituent constant -Es' of 0.40 or more;
R _b and R _c each independently represent a hydrogen atom, an alkyl group, a cycloalkyl group, an aryl group, or a heteroaryl group, and R _b and R _c may be bonded to form a ring; provided that at least one of R _b and R _c is an alkyl group having a steric substituent constant -Es' of 0.40 or more, a cycloalkyl group having a steric substituent constant -Es' of 0.40 or more, an aryl group having a steric substituent constant -Es' of 0.40 or more, or a heteroaryl group having a steric substituent constant -Es' of 0.40 or more;
Het ¹ and Het ² each independently represent a heterocyclic group;
^R2 and ^R3 each independently represent a hydrogen atom or a substituent;
An represents a monovalent anion.
<2> The composition according to <1>, wherein when either R _b or R _c is a hydrogen atom, the other is an alkyl group having a steric substituent constant -Es' of 1.05 or more, a cycloalkyl group having a steric substituent constant -Es' of 0.40 or more, an aryl group having a steric substituent constant -Es' of 2.50 or more, or a heteroaryl group having a steric substituent constant -Es' of 2.50 or more.
<3> The composition according to <1>, wherein the compound represented by formula (1) is a compound represented by formula (2);
In formula (2), R ¹ represents -OR _a , -NR _b R _c or -SR _d ;
R _a and R _d each independently represent an alkyl group having a steric substituent constant -Es' of 0.40 or more, a cycloalkyl group having a steric substituent constant -Es' of 0.40 or more, an aryl group having a steric substituent constant -Es' of 0.40 or more, or a heteroaryl group having a steric substituent constant -Es' of 0.40 or more;
R _b and R _c each independently represent a hydrogen atom, an alkyl group, a cycloalkyl group, an aryl group, or a heteroaryl group, and R _b and R _c may be bonded to form a ring; provided that at least one of R _b and R _c is an alkyl group having a steric substituent constant -Es' of 0.40 or more, a cycloalkyl group having a steric substituent constant -Es' of 0.40 or more, an aryl group having a steric substituent constant -Es' of 0.40 or more, or a heteroaryl group having a steric substituent constant -Es' of 0.40 or more;
X ¹ and X ² each independently represent O, NR ^x , S, Se, or Te, where R ^x represents a hydrogen atom or a substituent;
R ² to R ¹⁵ each independently represent a hydrogen atom or a substituent, and adjacent two of R ⁴ to R ¹⁵ may be bonded to form a ring;
An represents a monovalent anion.
<4> The composition according to any one of <1> to <3>, further comprising at least one selected from the group consisting of an antioxidant and an ultraviolet absorber.
<5> A film obtained by using the composition according to any one of <1> to <4>.
<6> An optical filter having the film according to <5>.
<7> A solid-state imaging device having the film according to <5>.
<8> An image display device having the film according to <5>.
<9> An infrared sensor having the film according to <5>.
<10> A camera module having the film according to <5>.
<11> A compound represented by formula (1a);
In formula (1a), R ¹ represents -OR _a , -NR _b R _c or -SR _d ;
R _a and R _d each independently represent an alkyl group having a steric substituent constant -Es' of 0.40 or more, a cycloalkyl group having a steric substituent constant -Es' of 0.40 or more, an aryl group having a steric substituent constant -Es' of 0.40 or more, or a heteroaryl group having a steric substituent constant -Es' of 0.40 or more;
R _b and R _c each independently represent a hydrogen atom, an alkyl group, a cycloalkyl group, an aryl group, or a heteroaryl group, and R _b and R _c may be bonded to form a ring; provided that at least one of R _b and R _c is an alkyl group having a steric substituent constant -Es' of 0.40 or more, a cycloalkyl group having a steric substituent constant -Es' of 0.40 or more, an aryl group having a steric substituent constant -Es' of 0.40 or more, or a heteroaryl group having a steric substituent constant -Es' of 0.40 or more, and when one of R _b and R _c is a hydrogen atom, the other is an alkyl group having a steric substituent constant -Es' of 1.05 or more, a cycloalkyl group having a steric substituent constant -Es' of 0.40 or more, an aryl group having a steric substituent constant -Es' of 2.50 or more, or a heteroaryl group having a steric substituent constant -Es' of 2.50 or more;
Het ¹ and Het ² each independently represent a heterocyclic group;
^R2 and ^R3 each independently represent a hydrogen atom or a substituent;
An represents a monovalent anion.

The present invention can provide a composition capable of forming a film with excellent heat resistance. The present invention can also provide a film, an optical filter, a solid-state imaging device, an image display device, an infrared sensor, a camera module, and a compound.

FIG. 1 is a schematic diagram illustrating an embodiment of an infrared sensor.

The present invention will be described in detail below.
In this specification, the use of "to" means that the numerical values before and after it are included as the lower limit and upper limit.
In the description of groups (atomic groups) in this specification, when there is no indication of whether they are substituted or unsubstituted, the term encompasses both unsubstituted groups (atomic groups) and substituted groups (atomic groups). For example, the term "alkyl group" encompasses not only alkyl groups that have no substituents (unsubstituted alkyl groups) but also alkyl groups that have substituents (substituted alkyl groups).
In this specification, unless otherwise specified, the term "exposure" includes not only exposure using light but also drawing using particle beams such as electron beams and ion beams. Examples of light used for exposure include the bright line spectrum of a mercury lamp, far ultraviolet light represented by an excimer laser, extreme ultraviolet light (EUV light), X-rays, active rays or radiation such as electron beams.
In this specification, "(meth)acrylate" refers to both or either of acrylate and methacrylate, "(meth)acrylic" refers to both or either of acrylic and methacrylic, and "(meth)acryloyl" refers to both or either of acryloyl and methacryloyl.
In this specification, the weight average molecular weight and the number average molecular weight are defined as values calculated in terms of polystyrene as measured by gel permeation chromatography (GPC).
In this specification, Me in the chemical formulae represents a methyl group, Et represents an ethyl group, Bu represents a butyl group, and Ph represents a phenyl group.
In this specification, infrared rays refer to light (electromagnetic waves) with wavelengths of 700 to 2500 nm.
In this specification, the total solids content refers to the total mass of all components of the composition excluding the solvent.
In this specification, the term "process" refers not only to an independent process, but also to a process that cannot be clearly distinguished from other processes, as long as the intended effect of the process is achieved.

<Composition>
The composition of the present invention is characterized by containing a compound represented by formula (1) and a curable compound.

The compound represented by formula (1) contained in the composition of the present invention has excellent heat resistance, and the composition of the present invention containing such a compound can form a film that has excellent heat resistance and exhibits little change in spectral characteristics even after heat treatment.

It is presumed that the compound represented by formula (1) contained in the composition of the present invention can sterically protect the squaric acid moiety (the moiety of the structure shown below) of the compound represented by formula (1) by virtue of R ¹ being a specific group, and can suppress decomposition of the compound originating from the squaric acid moiety during heating. Therefore, by using the composition of the present invention, a film having excellent heat resistance and small fluctuation in spectroscopic properties even after heat treatment can be formed.

In addition, the compound represented by formula (1) has excellent visible light transmittance and infrared shielding properties, and these properties remain excellent even after heat treatment at high temperatures.

The composition of the present invention can be used as a composition for an optical filter. Types of optical filters include infrared cut filters and infrared transmission filters. Since the compound represented by formula (1) has excellent visible light transmittance and infrared shielding properties, the composition of the present invention is particularly preferably used as a composition for an infrared cut filter.

The components used in the composition of the present invention are explained below.

<<Specific Compound (Compound Represented by Formula (1)>>
The composition of the present invention contains a compound represented by formula (1). Hereinafter, the compound represented by formula (1) is also referred to as a specific compound.

In formula (1), R ¹ represents -OR _a , -NR _b R _c or -SR _d ;
R _a and R _d each independently represent an alkyl group having a steric substituent constant -Es' of 0.40 or more, a cycloalkyl group having a steric substituent constant -Es' of 0.40 or more, an aryl group having a steric substituent constant -Es' of 0.40 or more, or a heteroaryl group having a steric substituent constant -Es' of 0.40 or more;
R _b and R _c each independently represent a hydrogen atom, an alkyl group, a cycloalkyl group, an aryl group, or a heteroaryl group, and R _b and R _c may be bonded to form a ring; provided that at least one of R _b and R _c is an alkyl group having a steric substituent constant -Es' of 0.40 or more, a cycloalkyl group having a steric substituent constant -Es' of 0.40 or more, an aryl group having a steric substituent constant -Es' of 0.40 or more, or a heteroaryl group having a steric substituent constant -Es' of 0.40 or more;
Het ¹ and Het ² each independently represent a heterocyclic group;
^R2 and ^R3 each independently represent a hydrogen atom or a substituent;
An represents a monovalent anion.

-About An-
Examples of the monovalent anion represented by An in formula (1) include a fluorine anion, a chlorine anion, a bromine anion, an iodine anion, a cyanide ion, a perchlorate anion, and an anion represented by any one of formulas (BZ-1) to (BZ-9), of which an anion represented by any one of formulas (BZ-1) to (BZ-3) is preferable, and an anion represented by formula (BZ-1) is more preferable.

In formula (BZ-1), R ¹¹¹ represents -SO ₂ -R ²⁰¹ or -CO-R ²⁰¹ , R ¹¹² represents an alkyl group, an aryl group, -SO ₂ -R ²⁰² or -CO-R ²⁰² , R ²⁰¹ and R ²⁰² each independently represent a halogen atom, an alkyl group or an aryl group, and R ¹¹¹ and R ¹¹² may be bonded to form a ring.

The number of carbon atoms in the alkyl group represented by R ^{112 , R 201 and R 202 is preferably 1 to 10, and more preferably 1 to 6. The alkyl group represented by R 112 , R 201 and} R ²⁰² is preferably an alkyl group having a halogen atom as a substituent, and more preferably an alkyl group having a fluorine atom as a substituent.
The number of carbon atoms in the aryl group represented by R ¹¹² , R ²⁰¹ and R ^{202 is preferably 6 to 20, and more preferably 6 to 12. The aryl group represented by R 112 , R 201 and R 202 is preferably an} aryl group having a halogen atom as a substituent, and more preferably an aryl group having a fluorine atom as a substituent.
Examples of the halogen atom represented by R ²⁰¹ and R ²⁰² include a fluorine atom, a chlorine atom and a bromine atom, and a fluorine atom is preferable.
In formula (BZ-1), R ¹¹¹ and R ¹¹² may be bonded to form a ring. The ring thus formed is preferably a 5- or 6-membered ring.

In formula (BZ-1), R ¹¹¹ is preferably —SO ₂ —R ²⁰¹ , and R ¹¹² is preferably —SO ₂ —R ^202. Furthermore, R ²⁰¹ and R ²⁰² are each preferably independently a fluorine atom, an alkyl group having a fluorine atom as a substituent, or an aryl group having a fluorine atom as a substituent, more preferably a fluorine atom or an alkyl group having a fluorine atom as a substituent, and further preferably an alkyl group having a fluorine atom as a substituent.

In formula (BZ-2), R ¹¹³ represents -SO ₂ -R ²⁰³ or -CO-R ²⁰³ ; R ¹¹⁴ and R ¹¹⁵ each independently represent -SO ₂ -R ²⁰⁴ , -CO-R ²⁰⁴ or a cyano group; R ²⁰³ and R ²⁰⁴ each independently represent a halogen atom, an alkyl group or an aryl group; and R ¹¹³ and R ¹¹⁴ or R ¹¹⁵ may be bonded to form a ring.

The carbon number of the alkyl group represented by R ²⁰³ and R ²⁰⁴ is preferably 1 to 10, and more preferably 1 to 6. The alkyl group represented by R ²⁰³ and R ²⁰⁴ is preferably an alkyl group having a halogen atom as a substituent, and more preferably an alkyl group having a fluorine atom as a substituent.
The number of carbon atoms of the aryl group represented by R ²⁰³ and R ²⁰⁴ is preferably 6 to 20, and more preferably 6 to 12. The aryl group represented by R ²⁰³ and R ²⁰⁴ is preferably an aryl group having a halogen atom as a substituent, and more preferably an aryl group having a fluorine atom as a substituent.
Examples of the halogen atom represented by R ²⁰³ and R ²⁰⁴ include a fluorine atom, a chlorine atom and a bromine atom, and a fluorine atom is preferable.
In formula (BZ-2), R ¹¹³ and R ¹¹⁴ or R ¹¹⁵ may be bonded to form a ring. The ring thus formed is preferably a 5- or 6-membered ring.

In formula (BZ-2), R ¹¹³ is preferably -SO ₂ -R ^{203. R 114} and R ¹¹⁵ are each preferably independently -SO ₂ -R ²⁰⁴ or -CO-R ²⁰⁴ , more preferably -SO ₂ -R ^204. Furthermore, R ²⁰³ and R ²⁰⁴ are each preferably independently a fluorine atom, an alkyl group having a fluorine atom as a substituent, or an aryl group having a fluorine atom as a substituent, more preferably a fluorine atom or an alkyl group having a fluorine atom as a substituent, and even more preferably an alkyl group having a fluorine atom as a substituent.

In formula (BZ-3), R ¹¹⁶ to R ¹¹⁹ each independently represent a halogen atom, an alkyl group, an aryl group, an alkoxy group, an aryloxy group, or a cyano group. Examples of the halogen atom include a fluorine atom, a chlorine atom, and a bromine atom, and a fluorine atom is preferable. The alkyl group, the aryl group, the alkoxy group, and the aryloxy group may have a substituent or may be unsubstituted. When a substituent is present, it is preferable that the substituent is a halogen atom or an alkyl group substituted with a halogen atom, and it is more preferable that the substituent is a fluorine atom or an alkyl group substituted with a fluorine atom.

In formula (BZ-3), it is preferable that at least one of R to R ¹¹⁹ is a cyano ^group , a fluorine atom, an alkyl group having a fluorine atom as a substituent, an aryl group having a fluorine atom as a substituent, or an aryl group having an alkyl group substituted with a fluorine atom as a substituent, it is more preferable that all ^{of R to R 119 are} a cyano group, a fluorine atom, an alkyl group having a fluorine atom as a substituent, or an aryl group having a fluorine atom as a substituent, and it is even more preferable that they are fluorine atoms.

In formula (BZ-4), R ¹²⁰ represents an alkyl group or an aryl group. The number of carbon atoms of the alkyl group represented by R ¹²⁰ is preferably 1 to 10, and more preferably 1 to 6. The alkyl group represented by R ¹²⁰ may have a substituent. Examples of the substituent include a halogen atom, an alkoxy group, an aryl group, an aryloxy group, an acyl group, and an acyloxy group. The number of carbon atoms of the aryl group represented by R ¹²⁰ is preferably 6 to 20, and more preferably 6 to 12. The aryl group represented by R ¹²⁰ may have a substituent. Examples of the substituent include a halogen atom, an alkyl group, an alkoxy group, an aryl group, an aryloxy group, an acyl group, and an acyloxy group.

In formula (BZ-5), R ¹²¹ represents an alkyl group or an aryl group. The number of carbon atoms of the alkyl group represented by R ¹²¹ is preferably 1 to 10, and more preferably 1 to 6. The alkyl group represented by R ¹²¹ may have a substituent. Examples of the substituent include a halogen atom, an alkoxy group, an aryl group, an aryloxy group, an acyl group, and an acyloxy group. The number of carbon atoms of the aryl group represented by R ¹²¹ is preferably 6 to 20, and more preferably 6 to 12. The aryl group represented by R ¹²¹ may have a substituent. Examples of the substituent include a halogen atom, an alkyl group, an alkoxy group, an aryl group, an aryloxy group, an acyl group, and an acyloxy group.

In formula (BZ-6), R ¹²² represents an alkyl group or an aryl group, and R ¹²³ represents a hydrogen atom, an alkyl group, or an aryl group. The number of carbon atoms of the alkyl group represented by R ¹²² and R ¹²³ is preferably 1 to 10, more preferably 1 to 6. The alkyl group represented by R ¹²² and R ¹²³ may have a substituent. Examples of the substituent include a halogen atom, an alkoxy group, an aryl group, an aryloxy group, an acyl group, and an acyloxy group. The number of carbon atoms of the aryl group represented by ^{R 122} and R ¹²³ is preferably 6 to 20, more preferably 6 to 12. The aryl group represented by R ¹²² and R ¹²³ may have a substituent. Examples of the substituent include a halogen atom, an alkyl group, an alkoxy group, an aryl group, an aryloxy group, an acyl group, and an acyloxy group.

In formula (BZ-7), R ¹²⁴ to R ¹²⁹ each independently represent a halogen atom or a halogenated hydrocarbon group. Examples of the halogen atom represented by R ¹²⁴ to R ¹²⁹ include a fluorine atom, a chlorine atom, and a bromine atom, and a fluorine atom is preferable. The halogenated hydrocarbon group represented by R ¹²⁴ to R ¹²⁹ is preferably an alkyl group having a halogen atom as a substituent, and more preferably an alkyl group having a fluorine atom as a substituent. The number of carbon atoms in the halogenated hydrocarbon group is preferably 1 to 10, and more preferably 1 to 6.

In formula (BZ-8), R ¹³⁰ to R ¹³⁵ each independently represent a halogen atom or a halogenated hydrocarbon group. Examples of the halogen atom represented by R ¹³⁰ to R ¹³⁵ include a fluorine atom, a chlorine atom, and a bromine atom, and a fluorine atom is preferable. The halogenated hydrocarbon group represented by R ¹³⁰ to R ¹³⁵ is preferably an alkyl group having a halogen atom as a substituent, and more preferably an alkyl group having a fluorine atom as a substituent. The number of carbon atoms in the halogenated hydrocarbon group is preferably 1 to 10, and more preferably 1 to 6.

In formula (BZ-9), R ¹³⁶ to R ¹⁴⁰ each independently represent a halogen atom, an alkyl group, an aryl group, or a cyano group. Examples of the halogen atom include a fluorine atom, a chlorine atom, and a bromine atom, and a fluorine atom is preferable. The alkyl group and the aryl group may have a substituent or may be unsubstituted. When the alkyl group and the aryl group have a substituent, the substituent is preferably a halogen atom or an alkyl group substituted with a halogen atom, and more preferably a fluorine atom or an alkyl group substituted with a fluorine atom.

In formula (BZ-9), it is preferable that at least one of R ¹³⁶ to R ¹⁴⁰ is a cyano group, a fluorine atom, an alkyl group having a fluorine atom as a substituent, an aryl group having a fluorine atom as a substituent, or an aryl group having an alkyl group substituted with a fluorine atom as a substituent, and it is more preferable that R ¹³⁶ to R ¹⁴⁰ are each independently a cyano group, a fluorine atom, an alkyl group having a fluorine atom as a substituent, or an aryl group having a fluorine atom as a substituent, and further preferably a cyano group.

- Regarding Het ¹ and Het ² -
In formula (1), Het ¹ and Het ² each independently represent a heterocyclic group.
The heterocyclic group represented by Het ¹ and Het ² is preferably a 5-membered or 6-membered heterocyclic group. The heterocyclic group is preferably a monocyclic heterocyclic group or a heterocyclic group having a condensed ring with a number of 2 to 8, more preferably a monocyclic heterocyclic group or a heterocyclic group having a condensed ring with a number of 2 to 4, and even more preferably a monocyclic heterocyclic group or a heterocyclic group having a condensed ring with a number of 2 or 3. The heteroatom constituting the ring of the heterocyclic group is preferably a nitrogen atom, an oxygen atom, or a sulfur atom. The number of heteroatoms constituting the ring of the heterocyclic group is preferably 1 to 3, more preferably 1 to 2. The number of carbon atoms constituting the ring of the heterocyclic group is preferably 1 to 30, more preferably 1 to 18, and even more preferably 1 to 12. The heterocyclic group may have a substituent. Examples of the substituent include the substituent T described below, and are preferably a halogen atom, an alkyl group, a cycloalkyl group, an alkoxy group, an aryl group, a halogen atom, an amino group, a sulfo group, a cyano group, a nitro group, a carboxy group, a phosphate group, an alkylthio group, an alkylsulfonyl group, an alkylsulfoxide group, an alkylcarbonyl group, or an alkyloxycarbonyl group, and more preferably a halogen atom, an alkyl group, a cycloalkyl group, an alkoxy group, an aryl group, a halogen atom, or an amino group.

-About ^R1-
In formula (1), R ¹ represents -OR _a , -NR _b R _c or -SR _d .

R _a and R _d each independently represent an alkyl group having a steric substituent constant -Es' of 0.40 or more, a cycloalkyl group having a steric substituent constant -Es' of 0.40 or more, an aryl group having a steric substituent constant -Es' of 0.40 or more, or a heteroaryl group having a steric substituent constant -Es' of 0.40 or more.
R _b and R _c each independently represent a hydrogen atom, an alkyl group, a cycloalkyl group, an aryl group or a heteroaryl group, and R _b and R _c may be bonded to form a ring; provided that at least one of R _b and R _c is an alkyl group having a steric substituent constant -Es' of 0.40 or more, a cycloalkyl group having a steric substituent constant -Es' of 0.40 or more, an aryl group having a steric substituent constant -Es' of 0.40 or more, or a heteroaryl group having a steric substituent constant -Es' of 0.40 or more.

The steric substituent constant -Es' (hereinafter referred to as -Es' value) is a parameter representing the steric bulkiness of a substituent, and the larger the -Es' value of a substituent, the bulkier the substituent is. The -Es' value of a substituent is shown in a literature (J.A.Macphee, et al, Tetrahedron, Vol.34, Issue.24, pp3553-3562). The -Es' value of a substituent not described in the above literature can be calculated, for example, by the method described in the above literature, using the following formula from the ratio of the reaction rate constant to that of a methyl group.
Es'=log(k/ _kMe )

It can also be inferred from the closest structure described in the above document. For example, in the case of a 2,4,6-trimethylphenyl group, the -Es' value is assumed to exceed 2.82 since the number of substituents at the o-position increases relative to a 2-tolyl group (-Es' value = 2.82), resulting in a sterically larger group. In addition, for example, when R _b and R _c are bonded to each other and R ¹ is an unsubstituted piperidine group, R _b and R _c are each a primary alkyl group, which is approximately equal to an n-pentyl group (-Es' value = 0.31), and the -Es' value is less than 0.40.

Examples of the substituent having an -Es' value of 0.40 or more include the groups shown below. In the following formulae, the wavy lines represent bonds.

The -Es' value of the alkyl group represented by R _a and R _d is 0.40 or more, preferably 1.05 or more, and more preferably 1.40 or more. The alkyl group represented by R _a and R _d is preferably a branched alkyl group. The number of carbon atoms of the alkyl group represented by _{R a} and R _d is preferably 1 to 30. The lower limit is preferably 1 or more, and more preferably 3 or more. The upper limit is preferably 20 or less. The alkyl group may have a substituent. Examples of the substituent include a halogen atom, a cycloalkyl group, an aryl group, an alkyloxy group, an alkylthio group, an alkylcarbonyl group, and an alkyloxycarbonyl group.
The -Es' value of the cycloalkyl group represented by R _a and R _d is 0.40 or more, preferably 0.60 or more, and more preferably 1.05 or more. The number of carbon atoms of the cycloalkyl group represented by R _a and R _d is preferably 3 or 5 to 10, and more preferably 3 or 6 to 10. The cycloalkyl group may have a substituent. Examples of the substituent include a halogen atom, an alkyl group, an aryl group, an alkyloxy group, an alkylthio group, an alkylcarbonyl group, and an alkyloxycarbonyl group.
The -Es' value of the aryl group represented by R _a and R _d is 0.40 or more, preferably 2.50 or more, and more preferably 2.60 or more. The aryl group may have a substituent. Examples of the substituent include a halogen atom, an alkyl group, a cycloalkyl group, an aryl group, an alkyloxy group, an alkylthio group, an alkylcarbonyl group, and an alkyloxycarbonyl group.
The -Es' value of the heteroaryl group represented by R _a and R _d is 0.40 or more, preferably 2.50 or more, and more preferably 2.60 or more. The heteroaryl group may have a substituent. Examples of the substituent include a halogen atom, an alkyl group, a cycloalkyl group, an aryl group, an alkyloxy group, an alkylthio group, an alkylcarbonyl group, and an alkyloxycarbonyl group.

R _a and R _d are each preferably an alkyl group having an -Es' value of 0.40 or more, more preferably an alkyl group having an -Es' value of 1.05 or more, and even more preferably an alkyl group having an -Es' value of 1.50 or more.

R _b and R _c each independently represent a hydrogen atom, an alkyl group, a cycloalkyl group, an aryl group or a heteroaryl group, and R _b and R _c may be bonded to form a ring; provided that at least one of R _b and R _c is an alkyl group having an -Es' value of 0.40 or more, a cycloalkyl group having an -Es' value of 0.40 or more, an aryl group having an -Es' value of 0.40 or more, or a heteroaryl group having an -Es' value of 0.40 or more.

The -Es' value of the alkyl group represented by R _b and R _c is preferably 0.40 or more, more preferably 1.05 or more, and even more preferably 1.40 or more. The alkyl group represented by R _b and R _c is preferably a branched alkyl group. The number of carbon atoms of the alkyl group represented by R _b and R _c is preferably 1 to 30. The lower limit is preferably 3 or more. The upper limit is preferably 20 or less. The alkyl group may have a substituent. Examples of the substituent include a halogen atom, a cycloalkyl group, an aryl group, an alkyloxy group, an alkylthio group, an alkylcarbonyl group, and an alkyloxycarbonyl group.
The -Es' value of the cycloalkyl group represented by R _b and R _c is 0.40 or more, preferably 0.60 or more, and more preferably 1.05 or more. The number of carbon atoms of the cycloalkyl group represented by R _b and R _c is preferably 3 and 5 to 10, and more preferably 3 and 6 to 10. The cycloalkyl group may have a substituent. Examples of the substituent include a halogen atom, an alkyl group, an aryl group, an alkyloxy group, an alkylthio group, an alkylcarbonyl group, and an alkyloxycarbonyl group.
The -Es' value of the aryl group represented by _Rb and _Rc is 0.40 or more, preferably 2.50 or more, and more preferably 2.60 or more. The aryl group may have a substituent. Examples of the substituent include a halogen atom, an alkyl group, a cycloalkyl group, an aryl group, an alkyloxy group, an alkylthio group, an alkylcarbonyl group, and an alkyloxycarbonyl group.
The -Es' value of the heteroaryl group represented by _Rb and _Rc is 0.40 or more, preferably 2.50 or more, and more preferably 2.60 or more. The heteroaryl group may have a substituent. Examples of the substituent include a halogen atom, an alkyl group, a cycloalkyl group, an aryl group, an alkyloxy group, an alkylthio group, an alkylcarbonyl group, and an alkyloxycarbonyl group.

When either R _b or R _c is a hydrogen atom, the other is preferably an alkyl group having an -Es' value of 1.05 or more, a cycloalkyl group having an -Es' value of 0.40 or more, an aryl group having an -Es' value of 2.50 or more, or a heteroaryl group having an -Es' value of 2.50 or more, more preferably an alkyl group having an -Es' value of 1.05 or more, and even more preferably an alkyl group having an -Es' value of 1.50 or more.

It is also preferred that R _b and R _c are each independently an alkyl group having an -Es' value of 0.40 or more, a cycloalkyl group having an -Es' value of 0.40 or more, an aryl group having an -Es' value of 0.40 or more, or a heteroaryl group having an -Es' value of 0.40 or more. In this embodiment, it is preferred that R _b and R _c are each independently an alkyl group having an -Es' value of 1.05 or more, a cycloalkyl group having an -Es' value of 0.40 or more, an aryl group having an -Es' value of 2.50 or more, or a heteroaryl group having an -Es' value of 2.50 or more, more preferably an alkyl group having an -Es' value of 1.05 or more, and even more preferably an alkyl group having an -Es' value of 1.40 or more.

R _b and R _c may be bonded to form a ring, but when a ring is formed, the conformation is fixed, and the bulkiness is reduced compared to when no ring is formed. For this reason, it is preferable that R _b and R _c are not bonded to form a ring, because the squaric acid moiety of the compound represented by formula (1) can be more sterically protected. When R _b and R _c are bonded to form a ring, the ring formed is preferably a 5-membered ring or a 6-membered ring.

R ¹ in formula (1) is preferably --OR _a or --NR _b R _c , and more preferably --NR _b R _c , because this can increase the steric hindrance around the squaric acid.

- Regarding ^R2 and ^R3 -
^R2 and ^R3 in formula (1) each independently represent a hydrogen atom or a substituent. Examples of the substituent T include those described below, and are preferably a halogen atom or an alkyl group, and more preferably an alkyl group. The number of carbon atoms in the alkyl group is preferably 1 to 5, and more preferably 1 to 3. The alkyl group is particularly preferably a methyl group.
In formula (1), ^R2 and ^R3 each independently represent preferably a hydrogen atom or an alkyl group, and more preferably a hydrogen atom or a methyl group.

The specific compound is preferably a compound represented by formula (2) because it has excellent visible light transmittance and infrared shielding properties.
In formula (2), R ¹ represents -OR _a , -NR _b R _c or -SR _d ;
R _a and R _d each independently represent an alkyl group having a steric substituent constant -Es' of 0.40 or more, a cycloalkyl group having a steric substituent constant -Es' of 0.40 or more, an aryl group having a steric substituent constant -Es' of 0.40 or more, or a heteroaryl group having a steric substituent constant -Es' of 0.40 or more;
R _b and R _c each independently represent a hydrogen atom, an alkyl group, a cycloalkyl group, an aryl group, or a heteroaryl group, and R _b and R _c may be bonded to form a ring; provided that at least one of R _b and R _c is an alkyl group having a steric substituent constant -Es' of 0.40 or more, a cycloalkyl group having a steric substituent constant -Es' of 0.40 or more, an aryl group having a steric substituent constant -Es' of 0.40 or more, or a heteroaryl group having a steric substituent constant -Es' of 0.40 or more;
X ¹ and X ² each independently represent O, NR ^x , S, Se, or Te, where R ^x represents a hydrogen atom or a substituent;
R ² to R ¹⁵ each independently represent a hydrogen atom or a substituent, and adjacent two of R ⁴ to R ¹⁵ may be bonded to form a ring;
An represents a monovalent anion.

R ¹ to R ³ and An in formula (2) have the same meanings as R ¹ to R ³ and An in formula (1).

^X1 and ^X2 in formula (2) each independently represent O, ^NRx , S, Se or Te, and ^Rx represents a hydrogen atom or a substituent.Rx represents a substituent, and includes an alkyl group and an aryl group, and is preferably an alkyl group.X1 and ^X2 are preferably O or S because ^they have excellent visible ^light transmittance and infrared shielding properties.

R ⁴ to R ¹⁵ in formula (2) each independently represent a hydrogen atom or a substituent. Examples of the substituent include the substituent T described below, and are preferably a halogen atom, an alkyl group, a cycloalkyl group, an alkoxy group, an aryl group, a halogen atom, an amino group, a sulfo group, a cyano group, a nitro group, a carboxy group, a phosphoric acid group, an alkylthio group, an alkylsulfonyl group, an alkylsulfoxide group, an alkylcarbonyl group, or an alkyloxycarbonyl group, and more preferably a halogen atom, an alkyl group, a cycloalkyl group, an alkoxy group, an aryl group, a halogen atom, or an amino group.

Two adjacent ones of R ⁴ to R ¹⁵ in formula (2) may be bonded to form a ring. The ring formed is preferably a 5-membered or 6-membered ring, more preferably a benzene ring. The ring formed may have a substituent. Examples of the substituent include the substituent T described below, which is preferably a halogen atom, an alkyl group, a cycloalkyl group, an alkoxy group, an aryl group, a halogen atom, an amino group, a sulfo group, a cyano group, a nitro group, a carboxy group, a phosphoric acid group, an alkylthio group, an alkylsulfonyl group, an alkylsulfoxide group, an alkylcarbonyl group, or an alkyloxycarbonyl group, more preferably a halogen atom, an alkyl group, a cycloalkyl group, an alkoxy group, an aryl group, a halogen atom, or an amino group.

-Regarding the Substituent T-
Examples of the substituent T include the following groups: a halogen atom (e.g., a fluorine atom, a chlorine atom, a bromine atom, an iodine atom), an alkyl group (preferably an alkyl group having 1 to 30 carbon atoms), a cycloalkyl group (preferably a cycloalkyl group having 5 to 30 carbon atoms), an alkenyl group (preferably an alkenyl group having 2 to 30 carbon atoms), an alkynyl group (preferably an alkynyl group having 2 to 30 carbon atoms), an aryl group (preferably an aryl group having 6 to 30 carbon atoms), a heterocyclic group (preferably a heterocyclic group having 1 to 30 carbon atoms), an amino group (preferably an amino group having 0 to 30 carbon atoms), an alkoxy group (preferably an alkoxy group having 1 to 30 carbon atoms), an aryloxy group (preferably an aryloxy group having 6 to 30 carbon atoms), a heterocyclic oxy group (preferably a heterocyclic oxy group having 1 to 30 carbon atoms), an acyl group (preferably an acyl group having 2 to 30 carbon atoms), an alkoxy group (preferably an alkoxy ... dicarbonyl group (preferably an alkoxycarbonyl group having 2 to 30 carbon atoms), aryloxycarbonyl group (preferably an aryloxycarbonyl group having 7 to 30 carbon atoms), heterocyclic oxycarbonyl group (preferably a heterocyclic oxycarbonyl group having 2 to 30 carbon atoms), acyloxy group (preferably an acyloxy group having 2 to 30 carbon atoms), acylamino group (preferably an acylamino group having 2 to 30 carbon atoms), aminocarbonylamino group (preferably an aminocarbonylamino group having 2 to 30 carbon atoms), alkoxycarbonylamino group (preferably an alkoxycarbonylamino group having 2 to 30 carbon atoms), aryloxycarbonylamino group (preferably an aryloxycarbonylamino group having 7 to 30 carbon atoms), sulfamoyl group (preferably a sulfamoyl group having 0 to 30 carbon atoms), A sulfamoylamino group (preferably a sulfamoylamino group having 0 to 30 carbon atoms), a carbamoyl group (preferably a carbamoyl group having 1 to 30 carbon atoms), an alkylthio group (preferably an alkylthio group having 1 to 30 carbon atoms), an arylthio group (preferably an arylthio group having 6 to 30 carbon atoms), a heterocyclic thio group (preferably a heterocyclic thio group having 1 to 30 carbon atoms), an alkylsulfonyl group (preferably an alkylsulfonyl group having 1 to 30 carbon atoms), an alkylsulfonylamino group (preferably an alkylsulfonylamino group having 1 to 30 carbon atoms), an arylsulfonyl group (preferably an arylsulfonyl group having 6 to 30 carbon atoms), an arylsulfonylamino group (preferably an arylsulfonylamino group having 6 to 30 carbon atoms), a heterocyclic sulfonyl group (preferably a heterocyclic sulfonyl group having 1 to 30 carbon atoms), a phenyl group), a heterocyclic sulfonylamino group (preferably a heterocyclic sulfonylamino group having 1 to 30 carbon atoms), an alkylsulfinyl group (preferably an alkylsulfinyl group having 1 to 30 carbon atoms), an arylsulfinyl group (preferably an arylsulfinyl group having 6 to 30 carbon atoms), a heterocyclic sulfinyl group (preferably a heterocyclic sulfinyl group having 1 to 30 carbon atoms), an ureido group (preferably an ureido group having 1 to 30 carbon atoms), a hydroxy group, a nitro group, a carboxy group, a sulfo group, a phosphoric acid group, a carboxylic acid amide group, a sulfonic acid amide group, an imido group, a phosphino group, a mercapto group, a cyano group, an alkylsulfino group, an arylsulfino group, an aryl azo group, a heterocyclic azo group, a phosphinyl group, a phosphinyloxy group, a phosphinylamino group, a silyl group, a hydrazino group, and an imino group. When these groups are further substitutable groups, they may further have a substituent. Examples of the substituent include the groups described above for the substituent T.

Specific examples of specific compounds include compounds A-1 to A-41 described in the Examples below.

The maximum absorption wavelength of the specific compound is more preferably in the wavelength range of 650 to 1300 nm, even more preferably in the wavelength range of 660 to 1200 nm, and particularly preferably in the wavelength range of 660 to 1000 nm.

The specific compound is preferably used as an infrared absorber.

The content of the specific compound (compound represented by formula (1)) in the total solid content of the composition is preferably 0.1 mass% or more, more preferably 0.5 mass% or more, and even more preferably 1 mass% or more. The upper limit of the content of the specific compound is preferably 50 mass% or less, more preferably 40 mass% or less, and even more preferably 30 mass% or less. The composition of the present invention may contain only one type of specific compound, or may contain two or more types. When two or more types are contained, it is preferable that the total amount thereof is within the above range.

<<Curable compound>>
The composition of the present invention contains a curable compound. Examples of the curable compound include a polymerizable compound and a resin. The resin is a non-polymerizable resin (a resin having no polymerizable group). The polymerizable resin may be a resin having a polymerizable group, or may be a polymerizable resin (a resin having a polymerizable group). Examples of the polymerizable group include an ethylenically unsaturated bond-containing group, a cyclic ether group, a methylol group, and an alkoxymethyl group. Examples of the ethylenically unsaturated bond-containing group include a vinyl group, a vinylphenyl group, a (meth)allyl group, a (meth)acryloyl group, a (meth)acryloyloxy group, and a (meth)acryloylamide group. Allyl, (meth)acryloyl and (meth)acryloyloxy groups are preferred, and (meth)acryloyloxy groups are more preferred. Examples of the cyclic ether group include an epoxy group and an oxetanyl group, and an epoxy group is preferred.

As the curable compound, it is preferable to use one that contains at least a resin. Furthermore, when the composition of the present invention is used as a composition for photolithography, it is preferable to use a resin and a polymerizable compound (preferably a polymerizable monomer that is a monomer-type polymerizable compound) as the curable compound, and it is more preferable to use a resin and a polymerizable monomer having an ethylenically unsaturated bond-containing group (a monomer-type polymerizable compound).

(Polymerizable compound)
The polymerizable compound may include a compound having an ethylenically unsaturated bond-containing group, a compound having a cyclic ether group, a compound having a methylol group, a compound having an alkoxymethyl group, etc. The compound having an ethylenically unsaturated bond-containing group can be preferably used as a radical polymerizable compound. In addition, the compound having a cyclic ether group can be preferably used as a cationic polymerizable compound.

Examples of resin-type polymerizable compounds include resins that contain repeating units with polymerizable groups.

The molecular weight of the monomer-type polymerizable compound (polymerizable monomer) is preferably less than 2000, and more preferably 1500 or less. The lower limit of the molecular weight of the polymerizable monomer is preferably 100 or more, and more preferably 200 or more. The weight average molecular weight (Mw) of the resin-type polymerizable compound is preferably 2000 to 2,000,000. The upper limit of the weight average molecular weight is preferably 1,000,000 or less, and more preferably 500,000 or less. The lower limit of the weight average molecular weight is preferably 3,000 or more, and more preferably 5,000 or more.

The compound having an ethylenically unsaturated bond-containing group as a polymerizable monomer is preferably a 3-15 functional (meth)acrylate compound, and more preferably a 3-6 functional (meth)acrylate compound. Specific examples include the compounds described in paragraphs 0075-0083 of WO 2022/065215 and the compounds described in Taiwan Patent Publication No. 201832008.

Compounds having an ethylenically unsaturated bond-containing group include dipentaerythritol tri(meth)acrylate (commercially available product: KAYARAD D-330; manufactured by Nippon Kayaku Co., Ltd.), dipentaerythritol tetra(meth)acrylate (commercially available product: KAYARAD D-320; manufactured by Nippon Kayaku Co., Ltd.), and dipentaerythritol penta(meth)acrylate (commercially available product: KAYARAD D-310; manufactured by Nippon Kayaku Co., Ltd.). , dipentaerythritol hexa(meth)acrylate (commercially available products include KAYARAD DPHA manufactured by Nippon Kayaku Co., Ltd., and NK Ester A-DPH-12E manufactured by Shin-Nakamura Chemical Co., Ltd.), and compounds in which the (meth)acryloyl groups of these compounds are bonded via ethylene glycol and/or propylene glycol residues (e.g., SR454 and SR499, commercially available from Sartomer Corporation). Examples of compounds having an ethylenically unsaturated bond-containing group include diglycerol EO (ethylene oxide) modified (meth)acrylate (commercially available product is M-460; manufactured by Toagosei Co., Ltd.), pentaerythritol tetraacrylate (NK Ester A-TMMT, manufactured by Shin-Nakamura Chemical Co., Ltd.), 1,6-hexanediol diacrylate (KAYARAD HDDA, manufactured by Nippon Kayaku Co., Ltd.), RP-1040 (manufactured by Nippon Kayaku Co., Ltd.), and Aronix TO-2349. (manufactured by Toagosei Co., Ltd.), NK Oligo UA-7200 (manufactured by Shin-Nakamura Chemical Co., Ltd.), DPHA-40H (manufactured by Nippon Kayaku Co., Ltd.), UA-306H, UA-306T, UA-306I, AH-600, T-600, AI-600, LINC-202UA (manufactured by Kyoeisha Chemical Co., Ltd.), 8UH-1006, 8UH-1012 (all manufactured by Taisei Fine Chemical Co., Ltd.), Light Acrylate POB-A0 (manufactured by Kyoeisha Chemical Co., Ltd.), etc. can also be used.

As compounds having an ethylenically unsaturated bond-containing group, it is also preferable to use trifunctional (meth)acrylate compounds such as trimethylolpropane tri(meth)acrylate, trimethylolpropane propylene oxide modified tri(meth)acrylate, trimethylolpropane ethylene oxide modified tri(meth)acrylate, isocyanuric acid ethylene oxide modified tri(meth)acrylate, and pentaerythritol tri(meth)acrylate. Commercially available trifunctional (meth)acrylate compounds include ARONIX M-309, M-310, M-321, M-350, M-360, M-313, M-315, M-306, M-305, M-303, M-452, and M-450 (manufactured by Toagosei Co., Ltd.), NK Ester A9300, A-GLY-9E, A-GLY-20E, A-TMM-3, A-TMM-3L, A-TMM-3LM-N, A-TMPT, and TMPT (manufactured by Shin-Nakamura Chemical Co., Ltd.), KAYARAD GPO-303, TMPTA, THE-330, TPA-330, and PET-30 (manufactured by Nippon Kayaku Co., Ltd.).

As a compound having an ethylenically unsaturated bond-containing group, a compound having an acid group such as a carboxyl group, a sulfo group, or a phosphate group can also be used. Commercially available products of such compounds include Aronix M-305, M-510, M-520, and Aronix TO-2349 (manufactured by Toagosei Co., Ltd.).

As a compound having an ethylenically unsaturated bond-containing group, a compound having a caprolactone structure can also be used. For compounds having a caprolactone structure, the description in paragraphs 0042 to 0045 of JP 2013-253224 A can be referred to, the contents of which are incorporated herein by reference. Examples of compounds having a caprolactone structure include DPCA-20, DPCA-30, DPCA-60, and DPCA-120, which are commercially available from Nippon Kayaku Co., Ltd. as the KAYARAD DPCA series.

As a compound having an ethylenically unsaturated bond-containing group, a compound having an ethylenically unsaturated bond-containing group and an alkyleneoxy group can also be used. Such a compound is preferably a compound having an ethylenically unsaturated bond-containing group and an ethyleneoxy group and/or a propyleneoxy group, more preferably a compound having an ethylenically unsaturated bond-containing group and an ethyleneoxy group, and even more preferably a trifunctional to hexafunctional (meth)acrylate compound having 4 to 20 ethyleneoxy groups. Examples of commercially available products include SR-494, a tetrafunctional (meth)acrylate having four ethyleneoxy groups manufactured by Sartomer, and KAYARAD TPA-330, a trifunctional (meth)acrylate having three isobutyleneoxy groups manufactured by Nippon Kayaku Co., Ltd.

As a compound having an ethylenically unsaturated bond-containing group, a polymerizable compound having a fluorene skeleton can also be used. Commercially available products include OGSOL EA-0200 and EA-0300 (manufactured by Osaka Gas Chemicals Co., Ltd., (meth)acrylate monomers having a fluorene skeleton).

As a compound having an ethylenically unsaturated bond-containing group, it is also preferable to use a compound that is substantially free of environmentally restricted substances such as toluene. Commercially available products of such compounds include KAYARAD DPHA LT and KAYARAD DPEA-12 LT (manufactured by Nippon Kayaku Co., Ltd.).

Examples of compounds having a cyclic ether group include compounds having an epoxy group and compounds having an oxetanyl group, and it is preferable that the compound has an epoxy group. Examples of compounds having an epoxy group include compounds having 1 to 100 epoxy groups in one molecule. The upper limit of the number of epoxy groups can be, for example, 10 or less, or 5 or less. The lower limit of the number of epoxy groups is preferably 2 or more.

The compound having a cyclic ether group may be a low molecular weight compound (e.g., molecular weight less than 1000) or a high molecular weight compound (macromolecule) (e.g., molecular weight 1000 or more, in the case of a polymer, weight average molecular weight 1000 or more). The weight average molecular weight of the cyclic ether group is preferably 200 to 100,000, more preferably 500 to 50,000. The upper limit of the weight average molecular weight is preferably 10,000 or less, more preferably 5,000 or less, and even more preferably 3,000 or less.

As compounds having a cyclic ether group, the compounds described in JP2013-011869A, paragraphs 0034 to 0036, the compounds described in JP2014-043556A, paragraphs 0147 to 0156, the compounds described in JP2014-089408A, paragraphs 0085 to 0092, and the compounds described in JP2017-179172 can also be used.

Commercially available compounds with cyclic ether groups include Denacol EX-212L, EX-212, EX-214L, EX-214, EX-216L, EX-216, EX-321L, EX-321, EX-850L, and EX-850 (all manufactured by Nagase ChemteX Corporation), ADEKA RESIN EP-4000S, EP-4003S, EP-4010S, and EP-4011S (all manufactured by ADEKA Corporation), NC-2000, NC -3000, NC-7300, XD-1000, EPPN-501, EPPN-502 (all manufactured by ADEKA Corporation), CELLOXIDE 2021P, CELLOXIDE 2081, CELLOXIDE 2083, CELLOXIDE 2085, EHPE3150, EPOLEAD PB 3600, PB 4700 (all manufactured by Daicel Corporation), CYCLOMER P ACA 200M, ACA 230AA, ACA Z250, ACA Z251, ACA Z30 0, ACA Z320 (all manufactured by Daicel Corporation), jER1031S, jER157S65, jER152, jER154, jER157S70 (all manufactured by Mitsubishi Chemical Corporation), Aron Oxetane OXT-121, OXT-221, OX-SQ, PNOX (all manufactured by Toagosei Co., Ltd.), ADEKA GLYCILOR ED-505 (manufactured by ADEKA Corporation, epoxy group-containing monomer), MARPROOF G-0150M, G-0105SA, G-0 Examples include 130SP, G-0250SP, G-1005S, G-1005SA, G-1010S, G-2050M, G-01100, and G-01758 (epoxy group-containing polymers manufactured by NOF Corporation), OXT-101, OXT-121, OXT-212, and OXT-221 (oxetanyl group-containing monomers manufactured by Toagosei Co., Ltd.), and OXE-10 and OXE-30 (oxetanyl group-containing monomers manufactured by Osaka Organic Chemical Industry Co., Ltd.).

Examples of compounds having a methylol group (hereinafter also referred to as methylol compounds) include compounds in which a methylol group is bonded to a nitrogen atom or a carbon atom forming an aromatic ring. Examples of compounds having an alkoxymethyl group (hereinafter also referred to as alkoxymethyl compounds) include compounds in which an alkoxymethyl group is bonded to a nitrogen atom or a carbon atom forming an aromatic ring. Examples of compounds in which an alkoxymethyl group or a methylol group is bonded to a nitrogen atom include alkoxymethylated melamine, methylolated melamine, alkoxymethylated benzoguanamine, methylolated benzoguanamine, alkoxymethylated glycoluril, methylolated glycoluril, alkoxymethylated urea, and methylolated urea. Compounds described in paragraphs 0134 to 0147 of JP 2004-295116 A and paragraphs 0095 to 0126 of JP 2014-089408 A can also be used.

(resin)
The composition of the present invention can use a resin as a curable compound. It is preferable to use a curable compound that contains at least a resin. The resin is blended, for example, for dispersing pigments in the composition or for use as a binder. In addition, a resin that is mainly used to disperse pigments in the composition is also called a dispersant. However, such uses of the resin are only examples, and the resin can also be used for purposes other than such uses. In addition, a resin having a polymerizable group also falls under the category of a polymerizable compound.

The weight average molecular weight of the resin is preferably 3,000 to 2,000,000. The upper limit is preferably 1,000,000 or less, and more preferably 500,000 or less. The lower limit is preferably 4,000 or more, and more preferably 5,000 or more.

The resins include (meth)acrylic resins, epoxy resins, ene-thiol resins, polycarbonate resins, polyether resins, polyarylate resins, polysulfone resins, polyethersulfone resins, polyphenylene resins, polyarylene ether phosphine oxide resins, polyimide resins, polyamide resins, polyamideimide resins, polyolefin resins, cyclic olefin resins, polyester resins, styrene resins, vinyl acetate resins, polyvinyl alcohol resins, polyvinyl acetal resins, polyurethane resins, and polyurea resins. One of these resins may be used alone, or two or more may be mixed and used. As the cyclic olefin resin, norbornene resin is preferred from the viewpoint of improving heat resistance. Commercially available norbornene resins include, for example, the ARTON series (e.g., ARTON F4520) manufactured by JSR Corporation. Further, as the resin, there are resins described in paragraphs 0091 to 0099 of WO 2022/065215, block polyisocyanate resins described in JP 2016-222891 A, resins described in JP 2020-122052 A, resins described in JP 2020-111656 A, resins described in JP 2020-139021 A, resins having a ring structure in the main chain and a biphenyl group in the side chain described in JP 2017-138503 A, resins described in paragraphs 0199 to 0233 of JP 2020-186373 A, The alkali-soluble resin described in JP-A-186325, the resin represented by formula 1 described in Korean Patent Publication No. 10-2020-0078339, the copolymer containing an epoxy group and an acid group described in WO 2022/030445, the resin described in paragraphs 0199 to 0233 of JP-A-2020-186373, the alkali-soluble resin described in JP-A-2020-186325, the resin represented by formula 1 described in Korean Patent Publication No. 10-2020-0078339, the resin described in JP-A-2021-134350, and the copolymer described in JP-A-2020-041046 can also be used. In addition, as the resin, a resin having a fluorene skeleton can also be preferably used. Examples of the resin having a fluorene skeleton include the resins described in U.S. Patent Application Publication No. 2017/0102610.

It is preferable to use a resin having an acid group as the resin. Examples of the acid group include a carboxy group, a phosphate group, a sulfo group, and a phenolic hydroxy group. These acid groups may be of only one type or of two or more types. The resin having an acid group can also be used as a dispersant. The acid value of the resin having an acid group is preferably 30 to 500 mgKOH/g. The lower limit is preferably 50 mgKOH/g or more, and more preferably 70 mgKOH/g or more. The upper limit is preferably 400 mgKOH/g or less, more preferably 200 mgKOH/g or less, even more preferably 150 mgKOH/g or less, and most preferably 120 mgKOH/g or less.

As the resin, it is also preferable to use a resin having a polymerizable group. The polymerizable group is preferably an ethylenically unsaturated bond-containing group or a cyclic ether group, and more preferably an ethylenically unsaturated bond-containing group.

The resin preferably contains a resin as a dispersant. Examples of dispersants include acidic dispersants (acidic resins) and basic dispersants (basic resins). Here, the acidic dispersant (acidic resin) refers to a resin in which the amount of acid groups is greater than the amount of basic groups. The acidic dispersant (acidic resin) is preferably a resin in which the amount of acid groups is 70 mol% or more when the total amount of the acid groups and the basic groups is 100 mol%. The acid group possessed by the acidic dispersant (acidic resin) is preferably a carboxy group. The acid value of the acidic dispersant (acidic resin) is preferably 10 to 105 mgKOH/g. The basic dispersant (basic resin) refers to a resin in which the amount of basic groups is greater than the amount of acid groups. The basic dispersant (basic resin) is preferably a resin in which the amount of basic groups is greater than the amount of acid groups when the total amount of the acid groups and the basic groups is 100 mol%. The basic group possessed by the basic dispersant is preferably an amino group.

It is also preferable that the resin used as the dispersant is a graft resin. For details on graft resins, please refer to the description in paragraphs 0025 to 0094 of JP 2012-255128 A, the contents of which are incorporated herein by reference.

The resin used as the dispersant is preferably a polyimine-based dispersant containing nitrogen atoms in at least one of the main chain and side chain. The polyimine-based dispersant is preferably a resin having a main chain with a partial structure having a functional group with a pKa of 14 or less, a side chain with 40 to 10,000 atoms, and having a basic nitrogen atom in at least one of the main chain and side chain. There are no particular restrictions on the basic nitrogen atom, so long as it is a nitrogen atom that exhibits basicity. For details of polyimine-based dispersants, please refer to the description in paragraphs 0102 to 0166 of JP 2012-255128 A, the contents of which are incorporated herein by reference.

The resin used as the dispersant is preferably one having a structure in which multiple polymer chains are bonded to a core portion. Examples of such resins include dendrimers (including star-shaped polymers). Specific examples of dendrimers include polymer compounds C-1 to C-31 described in paragraphs 0196 to 0209 of JP 2013-043962 A.

The resin used as the dispersant is also preferably a resin containing a repeating unit having an ethylenically unsaturated bond-containing group in the side chain. The content of the repeating unit having an ethylenically unsaturated bond-containing group in the side chain is preferably 10 mol % or more of the total repeating units of the resin, more preferably 10 to 80 mol %, and even more preferably 20 to 70 mol %.

As dispersants, resins described in JP 2018-087939 A, block copolymers (EB-1) to (EB-9) described in paragraphs 0219 to 0221 of Japanese Patent No. 6,432,077 A, polyethyleneimine having a polyester side chain described in WO 2016/104803 A, block copolymers described in WO 2019/125940 A, block polymers having an acrylamide structural unit described in JP 2020-066687 A, block polymers having an acrylamide structural unit described in JP 2020-066688 A, dispersants described in WO 2016/104803 A, and the like can also be used.

Dispersants are also available as commercially available products, and specific examples include the DISPERBYK series manufactured by BYK-Chemie, the SOLSPERSE series manufactured by Lubrizol Nippon, the Efka series manufactured by BASF, and the AJISPER series manufactured by Ajinomoto Fine-Techno Co., Ltd. In addition, the products described in paragraph 0129 of JP2012-137564A and the products described in paragraph 0235 of JP2017-194662A can also be used as dispersants.

The content of the curable compound in the total solid content of the composition is preferably 1 to 95% by mass. The lower limit is preferably 2% by mass or more, more preferably 5% by mass or more, even more preferably 7% by mass or more, and particularly preferably 10% by mass or more. The upper limit is preferably 94% by mass or less, more preferably 90% by mass or less, even more preferably 85% by mass or less, and particularly preferably 80% by mass or less.

When the composition of the present invention contains a polymerizable compound as a curable compound, the content of the polymerizable compound in the total solid content of the composition is preferably 1 to 85 mass%. The lower limit is preferably 2 mass% or more, more preferably 3 mass% or more, and even more preferably 5 mass% or more. The upper limit is preferably 80 mass% or less, and more preferably 70 mass% or less.

When the composition of the present invention contains a polymerizable monomer as a curable compound, the content of the polymerizable monomer in the total solid content of the composition is preferably 1 to 50 mass%. The lower limit is preferably 2 mass% or more, more preferably 3 mass% or more, and even more preferably 5 mass% or more. The upper limit is preferably 30 mass% or less, and more preferably 20 mass% or less.

When the composition of the present invention contains a compound having an ethylenically unsaturated bond-containing group as a curable compound, the content of the compound having an ethylenically unsaturated bond-containing group in the total solid content of the composition is preferably 1 to 70 mass%. The lower limit is preferably 2 mass% or more, more preferably 3 mass% or more, and even more preferably 5 mass% or more. The upper limit is preferably 65 mass% or less, and more preferably 60 mass% or less.

When the composition of the present invention contains a compound having a cyclic ether group as a curable compound, the content of the compound having a cyclic ether group in the total solid content of the composition is preferably 1 to 95 mass%. The lower limit is preferably 2 mass% or more, more preferably 3 mass% or more, and even more preferably 5 mass% or more. The upper limit is preferably 80 mass% or less, more preferably 70 mass% or less, and even more preferably 60 mass% or less.

When the composition of the present invention contains a resin as a curable compound, the content of the resin in the total solid content of the composition is preferably 1 to 85 mass%. The lower limit is preferably 2 mass% or more, more preferably 5 mass% or more, even more preferably 7 mass% or more, and particularly preferably 10 mass% or more. The upper limit is preferably 80 mass% or less, more preferably 75 mass% or less, even more preferably 70 mass% or less, and particularly preferably 40 mass% or less.

When the composition of the present invention contains a resin as a dispersant, the content of the resin as a dispersant in the total solid content of the composition is preferably 0.1 to 40 mass%. The upper limit is preferably 25 mass% or less, and more preferably 20 mass% or less. The lower limit is preferably 0.5 mass% or more, and more preferably 1 mass% or more. The content of the resin as a dispersant is preferably 1 to 100 mass parts per 100 mass parts of pigment. The upper limit is preferably 80 mass parts or less, and more preferably 75 mass parts or less. The lower limit is preferably 2.5 mass parts or more, and more preferably 5 mass parts or more.

The composition of the present invention may contain only one type of curable compound, or may contain two or more types. When two or more types of curable compounds are contained, it is preferable that the total amount thereof is within the above range.

<<Solvent>>
The composition of the present invention preferably contains a solvent. Examples of the solvent include water and organic solvents, and the solvent is preferably an organic solvent. Examples of the organic solvent include ester solvents, ketone solvents, alcohol solvents, amide solvents, ether solvents, and hydrocarbon solvents. For details of these, refer to paragraph 0223 of International Publication No. 2015/166779, the contents of which are incorporated herein by reference. In addition, ester solvents substituted with a cyclic alkyl group and ketone solvents substituted with a cyclic alkyl group can also be preferably used. Specific examples of organic solvents include polyethylene glycol monomethyl ether, dichloromethane, methyl 3-ethoxypropionate, ethyl 3-ethoxypropionate, ethyl cellosolve acetate, ethyl lactate, diethylene glycol dimethyl ether, butyl acetate, methyl 3-methoxypropionate, 2-heptanone, 2-pentanone, 3-pentanone, 4-heptanone, cyclohexanone, 2-methylcyclohexanone, 3-methylcyclohexanone, 4-methylcyclohexanone, cycloheptanone, cyclooctanone, cyclohexyl acetate, cyclopentanone, ethyl carbitol acetate, butyl carbitol acetate, propylene glycol monomethyl ether, propylene glycol dimethyl ether, butyl acetate ... Examples of the ethylene glycol monomethyl ether acetate include 3-methoxy-N,N-dimethylpropanamide, 3-butoxy-N,N-dimethylpropanamide, propylene glycol diacetate, 3-methoxybutanol, methyl ethyl ketone, gamma butyrolactone, sulfolane, anisole, 1,4-diacetoxybutane, diethylene glycol monoethyl ether acetate, butane-1,3-diyl diacetate, dipropylene glycol methyl ether acetate, diacetone alcohol (also known as diacetone alcohol and 4-hydroxy-4-methyl-2-pentanone), 2-methoxypropyl acetate, 2-methoxy-1-propanol, and isopropyl alcohol. However, there are cases where it is better to reduce the amount of aromatic hydrocarbons (benzene, toluene, xylene, ethylbenzene, etc.) used as organic solvents for environmental reasons, etc. (for example, the amount can be 50 ppm (parts per million) by mass or less, 10 ppm by mass or less, or 1 ppm by mass or less, relative to the total amount of organic solvents).

The metal content of the organic solvent is preferably low. The metal content of the organic solvent is preferably, for example, 10 parts per billion (ppb) by mass or less. If necessary, organic solvents with metal contents at the ppt (parts per trillion) by mass level may be used, and such organic solvents are provided, for example, by Toyo Gosei (The Chemical Daily, November 13, 2015).

Methods for removing impurities such as metals from organic solvents include, for example, distillation (molecular distillation, thin-film distillation, etc.) and filtration using a filter. The filter used for filtration preferably has a pore size of 10 μm or less, more preferably 5 μm or less, and even more preferably 3 μm or less. The filter material is preferably polytetrafluoroethylene, polyethylene, or nylon.

The organic solvent may contain isomers (compounds with the same number of atoms but different structures). In addition, the organic solvent may contain only one type of isomer, or multiple types of isomers.

The peroxide content in the organic solvent is preferably 0.8 mmol/L or less, and more preferably substantially free of peroxide.

The content of the solvent in the composition is preferably 10 to 97% by mass. The lower limit is preferably 30% by mass or more, more preferably 40% by mass or more, even more preferably 50% by mass or more, even more preferably 60% by mass or more, and particularly preferably 70% by mass or more. The upper limit is preferably 96% by mass or less, and more preferably 95% by mass or less. The composition may contain only one type of solvent, or may contain two or more types. When two or more types are contained, it is preferable that the total amount thereof is within the above range.

<<Other infrared absorbing agents>>
The composition of the present invention may contain an infrared absorbing agent (another infrared absorbing agent) other than the specific compound described above. By further containing another infrared absorbing agent, a film capable of shielding infrared rays in a wider wavelength range can be formed. The other infrared absorbing agent may be a dye or a pigment (particle). Examples of the other infrared absorbing agent include pyrrolopyrrole compounds, polymethine compounds, squarylium compounds, phthalocyanine compounds, naphthalocyanine compounds, quaterrylene compounds, merocyanine compounds, croconium compounds, oxonol compounds, iminium compounds, dithiol compounds, triarylmethane compounds, pyrromethene compounds, azomethine compounds, anthraquinone compounds, dibenzofuranone compounds, dithiolene metal complexes, metal oxides, metal borides, etc., and it is preferable that the other infrared absorbing agent is at least one selected from squarylium compounds and phthalocyanine compounds.

Examples of the pyrrolopyrrole compound include the compounds described in paragraphs 0016 to 0058 of JP-A-2009-263614, the compounds described in paragraphs 0037 to 0052 of JP-A-2011-068731, and the compounds described in paragraphs 0010 to 0033 of WO 2015/166873. Examples of squarylium compounds include compounds described in paragraphs 0044 to 0049 of JP 2011-208101 A, compounds described in paragraphs 0060 to 0061 of JP 6065169 A, compounds described in paragraph 0040 of WO 2016/181987 A, compounds described in JP 2015-176046 A, compounds described in paragraph 0072 of WO 2016/190162 A, and compounds described in JP 2016-07464 A. Compounds described in paragraphs 0196 to 0228 of JP-A-2017-067963, compounds described in paragraph 0124 of JP-A-2017-067963, compounds described in WO-A-2017/135359, compounds described in JP-A-2017-114956, compounds described in Japanese Patent No. 6197940, compounds described in WO-A-2016/120166, compounds described in Table 1 of the specification of U.S. Pat. No. 11261172, and the like. Examples of polymethine compounds include compounds described in paragraphs 0044 to 0045 of JP-A-2009-108267, compounds described in paragraphs 0026 to 0030 of JP-A-2002-194040, compounds described in JP-A-2015-172004, compounds described in JP-A-2015-172102, compounds described in JP-A-2008-088426, compounds described in paragraph 0090 of WO 2016/190162, compounds described in JP-A-2017-031394, compounds described in JP-A-2021-134350, compounds described in WO 2021/085372, and compounds described in paragraphs 0188 to 0192 of WO 2022/181422. Examples of the croconium compound include the compounds described in JP-A-2017-082029 and JP-A-2016-079331. Examples of the iminium compound include the compounds described in JP-T-2008-528706, JP-A-2012-012399, JP-A-2007-092060, and WO 2018/043564, paragraphs 0048 to 0063. Examples of the phthalocyanine compound include the compound described in paragraph 0093 of JP-A-2012-077153, the oxytitanium phthalocyanine described in JP-A-2006-343631, the compound described in paragraphs 0013 to 0029 of JP-A-2013-195480, the vanadium phthalocyanine compound described in JP-A-6081771, and the compound described in WO 2020/071470. Examples of the naphthalocyanine compound include the compound described in paragraph 0093 of JP-A-2012-077153, and the compound described in JP-A-2022-173080. Examples of the dithiolene metal complex include the compound described in JP-A-5733804. Examples of metal oxides include indium tin oxide, antimony tin oxide, zinc oxide, Al-doped zinc oxide, fluorine-doped tin dioxide, niobium-doped titanium dioxide, and tungsten oxide. For details of tungsten oxide, refer to paragraph 0080 of JP 2016-006476 A, the contents of which are incorporated herein by reference. Examples of metal borides include lanthanum boride. Examples of commercially available lanthanum boride include LaB ₆ -F (manufactured by Nippon Shinkinzoku Co., Ltd.). In addition, compounds described in International Publication No. 2017/119394 can also be used as metal borides. Examples of commercially available indium tin oxide include F-ITO (manufactured by Dowa Hightec Co., Ltd.).

Infrared absorbents include squarylium compounds described in JP 2017-197437 A, squarylium compounds described in JP 2017-025311 A, squarylium compounds described in WO 2016/154782 A, squarylium compounds described in Japanese Patent No. 5884953 A, squarylium compounds described in Japanese Patent No. 6036689 A, squarylium compounds described in Japanese Patent No. 5810604 A, and squarylium compounds described in paragraph number of WO 2017/213047 A. JP-A-2018-054760, paragraphs 0019 to 0075, pyrrole ring-containing compounds described in JP-A-2018-040955, paragraphs 0078 to 0082, pyrrole ring-containing compounds described in JP-A-2018-002773, paragraphs 0043 to 0069, squarylium compounds having an aromatic ring at the amide α-position described in JP-A-2018-041047, paragraphs 0024 to 0086 compounds, amide-linked squarylium compounds described in JP 2017-179131 A, compounds having a pyrrole bis-type squarylium skeleton or a croconium skeleton described in JP 2017-141215 A, dihydrocarbazole bis-type squarylium compounds described in JP 2017-082029 A, asymmetric compounds described in paragraphs 0027 to 0114 of JP 2017-068120 A, pyrrole ring-containing compounds described in JP 2017-067963 A Compounds having an organic acid (carbazole type), phthalocyanine compounds described in Japanese Patent No. 6251530, compounds described in Japanese Patent Publication No. 2019-127549, compounds described in International Publication No. 2022/059619, compounds described in Japanese Patent Publication No. 2022-151682, compounds described in Japanese Patent Publication No. 2022-188858, compounds described in Japanese Patent Publication No. 2022-184710, compounds described in Japanese Patent Publication No. 2022-189736, and the like can also be used.

As another infrared absorbing agent, tungsten oxide represented by the following formula described in paragraph 0025 of European Patent No. 3628645 can also be used.
M ¹ _a M ² _b W _c O _d (P(O) _n R _m ) _e
M ¹ and M ² each represent an ammonium cation or a metal cation, a is 0.01 to 0.5, b is 0 to 0.5, c is 1, d is 2.5 to 3, e is 0.01 to 0.75, n is 1, 2 or 3, m is 1, 2 or 3, and R represents a hydrocarbon group which may have a substituent.

The content of the other infrared absorbent is preferably 1 to 100 parts by mass, more preferably 3 to 60 parts by mass, and even more preferably 5 to 40 parts by mass, relative to 100 parts by mass of the specific compound.
The total content of the specific compound and the other infrared absorbent is preferably 1% by mass or more, more preferably 3% by mass or more, and even more preferably 5% by mass or more, based on the total solid content of the composition. The upper limit of the total content is preferably 50% by mass or less, more preferably 40% by mass or less, and even more preferably 30% by mass or less.

<<Pigment derivatives>>
The composition of the present invention may contain a pigment derivative. The pigment derivative is used as a dispersing aid. A dispersing aid is a material for enhancing the dispersibility of a pigment in a composition.

Pigment derivatives include compounds having at least one structure selected from the group consisting of a dye structure and a triazine structure, and an acid group or a basic group.

The above dye structures include squarylium dye structures, pyrrolopyrrole dye structures, diketopyrrolopyrrole dye structures, quinacridone dye structures, anthraquinone dye structures, dianthraquinone dye structures, benzoisoindole dye structures, thiazine indigo dye structures, azo dye structures, quinophthalone dye structures, phthalocyanine dye structures, naphthalocyanine dye structures, dioxazine dye structures, perylene dye structures, perinone dye structures, benzimidazolone dye structures, benzothiazole dye structures, benzimidazole dye structures, and benzoxazole dye structures. Squarylium dye structures, pyrrolopyrrole dye structures, diketopyrrolopyrrole dye structures, phthalocyanine dye structures, quinacridone dye structures, and benzimidazolone dye structures are preferred, and squarylium dye structures and pyrrolopyrrole dye structures are more preferred.

Examples of the acid group possessed by the pigment derivative include a carboxy group, a sulfo group, a phosphoric acid group, a boronic acid group, a carboxylic acid amide group, a sulfonic acid amide group, an imide acid group, and salts thereof. Examples of atoms or atomic groups constituting the salt include an alkali metal ion (Li ⁺ , Na ⁺ , K ^+, etc.), an alkaline earth metal ion (Ca ²⁺ , Mg ^2+, etc.), an ammonium ion, an imidazolium ion, a pyridinium ion, and a phosphonium ion. A preferred example of the carboxylic acid amide group is a group represented by -NHCOR ^X1 . A preferred example of the sulfonic acid amide group is a group represented by -NHSO ₂ R ^X2 . A preferred example of the imide acid group is a group represented by -SO ₂ NHSO ₂ R ^X3 , -CONHSO ₂ R ^X4 , -CONHCOR ^X5 , or -SO ₂ NHCOR ^X6 , and -SO ₂ NHSO ₂ R ^X3 is more preferred. R ^x1 to R ^x6 each independently represent an alkyl group or an aryl group. The alkyl group and aryl group represented by R ^x1 to R ^x6 may have a substituent. The substituent is preferably a halogen atom, more preferably a fluorine atom.

Basic groups contained in pigment derivatives include amino groups, pyridinyl groups and their salts, salts of ammonium groups, and phthalimidomethyl groups. Atoms or atomic groups that constitute the salts include hydroxide ions, halogen ions, carboxylate ions, sulfonate ions, and phenoxide ions.

Specific examples of pigment derivatives include the compounds described in paragraphs 0037 to 0054 of WO 2016/035695, the compounds described in paragraphs 0061 to 0086 of WO 2017/146092, the compounds described in paragraphs 0017 to 0068 of WO 2018/230387, the compounds described in paragraphs 0085 to 0099 of WO 2020/054718, the compounds described in paragraph 0099 of WO 2020/054718, the compounds described in paragraph 0124 of WO 2022/085485, the benzimidazolone compounds or salts thereof described in JP 2018-168244 A, and the compounds having an isoindoline skeleton described in general formula (1) of Japanese Patent No. 6,996,282.

The content of the pigment derivative is preferably 1 to 50 parts by mass relative to 100 parts by mass of the pigment. The lower limit is preferably 3 parts by mass or more, and more preferably 5 parts by mass or more. The upper limit is preferably 40 parts by mass or less, and more preferably 30 parts by mass or less. Only one type of pigment derivative may be used, or two or more types may be used. When two or more types are used, it is preferable that the total amount is within the above range.

<<Photopolymerization initiator>>
When the composition of the present invention contains a polymerizable compound, it is preferable that the composition of the present invention further contains a photopolymerization initiator.The photopolymerization initiator is not particularly limited and can be appropriately selected from known photopolymerization initiators.For example, a compound having photosensitivity to light rays in the ultraviolet range to the visible range is preferable.The photopolymerization initiator is preferably a photoradical polymerization initiator.

Photopolymerization initiators include halogenated hydrocarbon derivatives (e.g., compounds having a triazine skeleton, compounds having an oxadiazole skeleton, etc.), acylphosphine compounds, hexaarylbiimidazole compounds, oxime compounds, organic peroxides, thio compounds, ketone compounds, aromatic onium salts, α-hydroxyketone compounds, α-aminoketone compounds, etc. From the viewpoint of exposure sensitivity, the photopolymerization initiator is preferably a trihalomethyltriazine compound, a benzyl dimethyl ketal compound, an α-hydroxyketone compound, an α-aminoketone compound, an acylphosphine compound, a phosphine oxide compound, a metallocene compound, an oxime compound, a hexaarylbiimidazole compound, an onium compound, a benzothiazole compound, a benzophenone compound, an acetophenone compound, a cyclopentadiene-benzene-iron complex, a halomethyloxadiazole compound, or a 3-aryl substituted coumarin compound, more preferably a compound selected from an oxime compound, an α-hydroxyketone compound, an α-aminoketone compound, and an acylphosphine compound, and even more preferably an oxime compound. In addition, examples of the photopolymerization initiator include the compounds described in paragraphs 0065 to 0111 of JP 2014-130173 A, the compounds described in Japanese Patent No. 6301489 A, and the compounds described in MATERIAL STAGE 37 to 60p, vol. 19, No. 3,2019, a photopolymerization initiator described in WO 2018/221177, a photopolymerization initiator described in WO 2018/110179, a photopolymerization initiator described in JP 2019-043864 A, a photopolymerization initiator described in JP 2019-044030 A, a peroxide-based initiator described in JP 2019-167313 A, an aminoacetophenone-based initiator having an oxazolidine group described in JP 2020-055992 A, an oxime-based photopolymerization initiator described in JP 2013-190459 A, a polymer described in JP 2020-172619 A, a compound represented by formula 1 described in WO 2020/152120 A, JP 2021-181406 Compounds described in JP 2022-013379 A, photopolymerization initiators described in JP 2022-015747 A, compounds represented by formula (1) described in JP 2022-015747 A, fluorine-containing fluorene oxime ester photoinitiators described in JP 2021-507058 A, initiators described in China Patent Application Publication No. 110764367, initiators described in JP 2022-518535 A, initiators described in WO 2021/175855, compounds described in Taiwan Patent Application Publication No. 202200534, compounds described in JP 2022-078550 A, compounds described in Korean Patent Publication No. 10-2017-0087330, compounds described in WO 2022/075452, and the like.

Specific examples of hexaarylbiimidazole compounds include 2,2',4-tris(2-chlorophenyl)-5-(3,4-dimethoxyphenyl)-4,5-diphenyl-1,1'-biimidazole.

Commercially available α-hydroxyketone compounds include Omnirad 184, Omnirad 1173, Omnirad 2959, Omnirad 127 (all manufactured by IGM Resins B.V.), Irgacure 184, Irgacure 1173, Irgacure 2959, Irgacure 127 (all manufactured by BASF), etc. Commercially available α-aminoketone compounds include Omnirad 907, Omnirad 369, Omnirad 369E, Omnirad 379EG (all manufactured by IGM Resins B.V.), Irgacure 907, Irgacure 369, Irgacure 369E, Irgacure 379EG (all manufactured by BASF), etc. Commercially available acylphosphine compounds include Omnirad 819, Omnirad TPO (all manufactured by IGM Resins B.V.), Irgacure 819, Irgacure TPO (all manufactured by BASF), etc.

Examples of oxime compounds include the compounds described in paragraph 0142 of WO 2022/085485, the compounds described in Japanese Patent No. 5,430,746, the compounds described in Japanese Patent No. 5,647,738, the compounds represented by general formula (1) and the compounds described in paragraphs 0022 to 0024 of JP 2021-173858 A, the compounds represented by general formula (1) and the compounds described in paragraphs 0117 to 0120 of JP 2021-170089 A, the oxime ester compounds described in China Patent Application Publication No. 110066225, the compounds described in Korea Patent Publication No. 10-2022-0076157, and the compounds described in paragraphs 0042 to 0062 of WO 2019/013112 having a triarylamine or N-arylcarbazole skeleton. Specific examples of the oxime compound include 3-benzoyloxyiminobutan-2-one, 3-acetoxyiminobutan-2-one, 3-propionyloxyiminobutan-2-one, 2-acetoxyiminopentan-3-one, 2-acetoxyimino-1-phenylpropan-1-one, 2-benzoyloxyimino-1-phenylpropan-1-one, 3-(4-toluenesulfonyloxy)iminobutan-2-one, 2-ethoxycarbonyloxyimino-1-phenylpropan-1-one, 1-[4-(phenylthio)phenyl]-3-cyclohexyl-propane-1,2-dione-2-(O-acetyloxime), and the like. Commercially available products include Irgacure OXE01, Irgacure OXE02, Irgacure OXE03, and Irgacure OXE04 (all manufactured by BASF), TR-PBG-301, TR-PBG-304, and TR-PBG-327 (manufactured by TRONLY), and Adeka Optomer N-1919 (manufactured by ADEKA Corporation, photopolymerization initiator 2 described in JP 2012-014052 A). In addition, it is also preferable to use a compound that is not colorable or a compound that is highly transparent and does not easily discolor as the oxime compound. Commercially available products include Adeka Arcles NCI-730, NCI-831, and NCI-930 (all manufactured by ADEKA Corporation).

As the photopolymerization initiator, an oxime compound having a fluorene ring, an oxime compound having a skeleton in which at least one benzene ring of a carbazole ring is replaced with a naphthalene ring, an oxime compound having a fluorine atom, an oxime compound having a nitro group, an oxime compound having a benzofuran skeleton, an oxime compound in which a substituent having a hydroxyl group is bonded to a carbazole skeleton, or a compound described in paragraphs 0143 to 0149 of WO 2022/085485 can also be used.

As a photopolymerization initiator, a compound represented by formula (OX-1) can also be used.

In formula (OX-1), X ^1a represents a divalent linking group containing at least one ring selected from the group consisting of an aromatic ring and a heterocycle;
R ^1a represents a hydrogen atom or an acyl group;
^R2a represents an alkyl group or an aryl group;
R ^3a and R ^4a each independently represent a hydrogen atom or an alkyl group;
Alk ¹ and Alk ² each independently represent an alkyl group;
R ^3a and R ^4a may be bonded to form a ring;
Alk ¹ and Alk ² may be linked to form a ring;
n represents 0 or 1.

Examples of the divalent linking group represented by X ^1a in formula (OX-1) include a divalent aromatic ring group, a divalent heterocyclic group, a divalent group in which two or more aromatic rings are bonded via a single bond or a linking group, a divalent group in which two or more heterocycles are bonded via a single bond or a linking group, and a divalent group in which an aromatic ring and a heterocycle are bonded via a single bond or a linking group. Examples of the linking group that bonds the above-mentioned aromatic rings, heterocyclic groups, or aromatic rings and heterocycles include -CH ₂ -, -O-, -CO-, -S-, -NR ^x -, and groups combining these. R ^x represents a hydrogen atom, an alkyl group, an alkenyl group, an alkynyl group, an aryl group, or a heterocyclic group.

X ¹ in formula (OX-1) is preferably a group represented by any one of formulas (X-1) to (X-13), more preferably a group represented by formula (X-1), formula (X-2), formula (X-4), formula (X-6) or formula (X-8), and further preferably a group represented by formula (X-2) or formula (X-6).
In the formula, R ^X1 to R ^X9 each independently represent a hydrogen atom, an alkyl group, an alkenyl group, an alkynyl group, an aryl group or a heterocyclic group.

The number of carbon atoms in the alkyl group represented by R ^X1 to R ^X9 is preferably 1 to 15, and more preferably 1 to 10. The alkyl group may be linear, branched, or cyclic. The alkyl group may have a substituent. Examples of the substituent include a halogen atom, an aryl group, and a heterocyclic group.

The number of carbon atoms in the alkenyl group represented by R ^X1 to R ^X9 is preferably 2 to 15, and more preferably 2 to 10. The alkenyl group may be linear, branched, or cyclic. The alkenyl group may have a substituent. Examples of the substituent include a halogen atom, an aryl group, and a heterocyclic group.

The number of carbon atoms in the alkynyl group represented by R ^X1 to R ^X9 is preferably 2 to 15, and more preferably 2 to 10. The alkynyl group may be linear, branched, or cyclic. The alkynyl group may have a substituent. Examples of the substituent include a halogen atom, an aryl group, and a heterocyclic group.

The number of carbon atoms in the aryl group represented by R ^X1 to R ^X9 is preferably 6 to 20, more preferably 6 to 12, still more preferably 6 to 10, and particularly preferably 6. The aryl group may have a substituent. Examples of the substituent include a halogen atom, an alkyl group, an alkenyl group, an alkynyl group, and a heterocyclic group.

The heterocyclic group represented by R ^X1 to R ^X9 is preferably a 5-membered or 6-membered ring. The heteroatoms contained in the heterocyclic group are preferably an oxygen atom, a nitrogen atom, or a sulfur atom. The number of heteroatoms contained in the heterocyclic group is preferably 1 to 3. The heterocyclic group may have a substituent. Examples of the substituent include a halogen atom, an alkyl group, an alkenyl group, an alkynyl group, and an aryl group.

In formula (OX-1), R ^1a represents a hydrogen atom or an acyl group, and is preferably an acyl group.
The acyl group represented by R ^1a is preferably a group represented by —C(O)—R ^101. R ¹⁰¹ represents an aryl group or a heterocyclic group, and is preferably an aryl group.

The number of carbon atoms of the aryl group represented by R ¹⁰¹ is preferably 6 to 20, and more preferably 6 to 12. The aryl group may have a substituent. Examples of the substituent include a halogen atom, an alkyl group, an alkenyl group, an alkynyl group, and a heterocyclic group. The aryl group represented by R ¹⁰¹ is preferably a phenyl group, a methylphenyl group, or a naphthyl group, and more preferably a methylphenyl group or a naphthyl group.

The heterocyclic group represented by R ¹⁰¹ is preferably a 5-membered or 6-membered ring. The heteroatoms contained in the heterocyclic group are preferably an oxygen atom, a nitrogen atom, or a sulfur atom. The number of heteroatoms contained in the heterocyclic group is preferably 1 to 3. The heterocyclic group may have a substituent. Examples of the substituent include a halogen atom, an alkyl group, an alkenyl group, an alkynyl group, and an aryl group.

R ^2a in formula (OX-1) represents an alkyl group or an aryl group, and is preferably an alkyl group because the reactivity of the generated radical is high.
The number of carbon atoms of the alkyl group represented by R ^2a is preferably 1 to 15, more preferably 1 to 10, even more preferably 1 to 5, and even more preferably 1 to 3. The alkyl group may be linear, branched, or cyclic, but is preferably linear or branched, and more preferably linear. The alkyl group may have a substituent, but is preferably an unsubstituted alkyl group. The alkyl group represented by R ^2a is preferably an unsubstituted linear or branched alkyl group, and more preferably an unsubstituted linear alkyl group.
The number of carbon atoms in the aryl group represented by R ^2a is preferably 6 to 20, more preferably 6 to 12, still more preferably 6 to 10, and particularly preferably 6. The aryl group may have a substituent, but is preferably an unsubstituted aryl group.

In formula (OX-1), R ^3a and R ^4a each independently represent a hydrogen atom or an alkyl group, and preferably a hydrogen atom.
The number of carbon atoms in the alkyl group represented by R ^3a and R ^4a is preferably 1 to 15, more preferably 1 to 10, even more preferably 1 to 5, and even more preferably 1 to 3. The alkyl group may be linear, branched, or cyclic, but is preferably linear or branched, and more preferably linear. The alkyl group may have a substituent, but is preferably an unsubstituted alkyl group.
^R3a and ^R4a may be bonded to form a ring. The ring formed is preferably a 5- or 6-membered ring, and more preferably a 5- or 6-membered aliphatic hydrocarbon ring.

In formula (OX-1), Alk ¹ and Alk ² each independently represent an alkyl group. The number of carbon atoms in the alkyl group is preferably 1 to 15, more preferably 1 to 10, even more preferably 1 to 5, and even more preferably 1 to 3. The alkyl group may be linear, branched, or cyclic, but is preferably linear or branched, and more preferably linear. The alkyl group may have a substituent, but is preferably an unsubstituted alkyl group.
^Alk1 and ^Alk2 may be bonded to form a ring, and preferably form a ring. The ring formed is preferably a 5- or 6-membered ring, more preferably a 5- or 6-membered aliphatic hydrocarbon ring, and more preferably a cyclopentane ring or a cyclohexane ring.

In formula (OX-1), n represents 0 or 1, and is preferably 0.

Specific examples of the compound represented by formula (OX-1) include the compounds described in paragraphs 0092 to 0096 of JP2012-113104A and the compounds described in paragraph 0041 of JP2012-189997A.

As a photopolymerization initiator, a compound represented by formula (OX-2) can also be used.

In formula (OX-2), R ^1b and R ^2b each independently represent a substituent, R ^3b to R ^7b each independently represent a hydrogen atom or a substituent, Ar ^1b represents an aromatic ring group or a heterocyclic group which may have a substituent, and n represents 0 or 1.

Examples of the substituent represented by R ^1b and R ^2b include an alkyl group and an aryl group, and an alkyl group is preferable. The number of carbon atoms of the alkyl group is preferably 1 to 15, and more preferably 1 to 10. The alkyl group may be linear, branched, or cyclic. The alkyl group may have a substituent. Examples of the substituent include a halogen atom, an aryl group, an alkenyl group, an alkynyl group, and a heterocyclic group. The number of carbon atoms of the aryl group is preferably 6 to 20, more preferably 6 to 12, still more preferably 6 to 10, and particularly preferably 6. The aryl group may have a substituent. Examples of the substituent include a halogen atom, an alkyl group, an alkenyl group, an alkynyl group, and a heterocyclic group.

The substituents represented by R ^3b to R ^7b include a halogen atom, an alkyl group and an aryl group, the alkyl group and the aryl group being as described above.
R ^3b to R ^7b are preferably hydrogen atoms.

Ar ^1b represents an aromatic ring group or a heterocyclic group which may have a substituent, and Ar ^1b is preferably an aromatic ring group which may have a substituent. The aromatic ring group is preferably a benzene ring group or a naphthalene ring group, and more preferably a benzene ring group. Examples of the substituent include a halogen atom, an alkyl group, an alkoxy group, an aryl group, an aryloxy group, an alkylthio group, an arylthio group, a nitro group, and an acyl group, and an acyl group is preferable. Examples of the acyl group include the acyl groups described above.

As a photopolymerization initiator, a compound represented by formula (OX-3) can also be used.

In formula (OX-3), Ar ^1c represents a (k+m+1)-valent aromatic ring group or a (k+m+1)-valent heterocyclic group;
Ar ^2c represents a (k+2)-valent aromatic ring group or a (k+2)-valent heterocyclic group;
R ^1c to R ^3c each independently represent a substituent;
L ^1c represents a single bond or CR ^11c R ^12c , and R ^11c and R ^12c each independently represent a hydrogen atom, an alkyl group, or an aryl group;
X ^1c represents -O- or -S-;
k represents 0 or 1; m represents an integer of 0 to 4; and n represents 0 or 1.

Examples of the substituent represented by R ^1c and R ^2c include an alkyl group and an aryl group, and an alkyl group is preferable. The number of carbon atoms of the alkyl group is preferably 1 to 15, and more preferably 1 to 10. The alkyl group may be linear, branched, or cyclic. The alkyl group may have a substituent. Examples of the substituent include a halogen atom, an aryl group, an alkenyl group, an alkynyl group, and a heterocyclic group. The number of carbon atoms of the aryl group is preferably 6 to 20, more preferably 6 to 12, even more preferably 6 to 10, and particularly preferably 6. The aryl group may have a substituent. Examples of the substituent include a halogen atom, an alkyl group, an alkenyl group, an alkynyl group, and a heterocyclic group.
R ^2c is preferably an alkyl group having a branched or cyclic structure.

Examples of the substituent represented by ^R3c include a halogen atom, an alkyl group, an alkoxy group, an aryl group, an aryloxy group, and an acyl group, and an acyl group is preferable. Examples of the acyl group include the acyl groups described above.

Ar ^1c represents a (k+m+1)-valent aromatic ring group or a (k+m+1)-valent heterocyclic group, and is preferably a (k+m+1)-valent aromatic ring group. The aromatic ring group is preferably a benzene ring group or a naphthalene ring group, and more preferably a benzene ring group.

^Ar2c represents a (k+2)-valent aromatic ring group or a (k+2)-valent heterocyclic group, and is preferably a (k+2)-valent aromatic ring group. The aromatic ring group is preferably a benzene ring group or a naphthalene ring group, and more preferably a benzene ring group.

k represents 0 or 1, and is preferably 0.

m represents an integer from 0 to 4, preferably 0 or 1, and more preferably 1.

Specific examples of oxime compounds that are preferably used in the present invention are shown below, but the present invention is not limited to these.

The oxime compound is preferably a compound having a maximum absorption wavelength in the wavelength range of 350 to 500 nm, and more preferably a compound having a maximum absorption wavelength in the wavelength range of 360 to 480 nm. From the viewpoint of sensitivity, the molar absorption coefficient of the oxime compound at a wavelength of 365 nm or 405 nm is preferably high, more preferably 1000 to 300,000, even more preferably 2000 to 300,000, and particularly preferably 5000 to 200,000. The molar absorption coefficient of the compound can be measured using a known method. For example, it is preferable to measure using a spectrophotometer (Varian Cary-5 spectrophotometer) at a concentration of 0.01 g/L using ethyl acetate as a solvent.

As the photopolymerization initiator, a bifunctional or trifunctional or higher functional photoradical polymerization initiator may be used. By using such a photoradical polymerization initiator, two or more radicals are generated from one molecule of the photoradical polymerization initiator, so good sensitivity can be obtained. In addition, when a compound with an asymmetric structure is used, the crystallinity decreases and the solubility in solvents and the like improves, making it less likely to precipitate over time, and improving the stability of the composition over time. Specific examples of bifunctional or trifunctional or higher functional photoradical polymerization initiators include the compounds described in paragraph 0148 of WO 2022/065215.

The content of the photopolymerization initiator in the total solid content of the composition is preferably 0.1 to 30 mass%. The lower limit is preferably 0.5 mass% or more, and more preferably 1% or more. The upper limit is preferably 25 mass% or less, more preferably 20 mass% or less, and even more preferably 15 mass% or less. The composition may contain only one type of photopolymerization initiator, or may contain two or more types. When two or more types are contained, it is preferable that the total amount thereof is within the above range.

<<Curing agent>>
When the composition of the present invention contains a compound having a cyclic ether group, the composition of the present invention preferably further contains a curing agent. Examples of the curing agent include amine compounds, acid anhydride compounds, amide compounds, phenol compounds, polycarboxylic acids, and thiol compounds. Specific examples of the curing agent include succinic acid, trimellitic acid, pyromellitic acid, N,N-dimethyl-4-aminopyridine, and pentaerythritol tetrakis (3-mercaptopropionate). The curing agent may be a compound described in paragraphs 0072 to 0078 of JP-A-2016-075720 or a compound described in JP-A-2017-036379. The content of the curing agent is preferably 0.01 to 20 parts by mass, more preferably 0.01 to 10 parts by mass, and even more preferably 0.1 to 6.0 parts by mass, relative to 100 parts by mass of the compound having a cyclic ether group.

<<Chromatic colorants>>
The composition of the present invention may contain a chromatic colorant. Examples of the chromatic colorant include a red colorant, a green colorant, a blue colorant, a yellow colorant, a purple colorant, and an orange colorant. The chromatic colorant may be a pigment or a dye. A pigment and a dye may be used in combination. The pigment may be either an inorganic pigment or an organic pigment. As the pigment, a material in which an inorganic pigment or an organic-inorganic pigment is partially substituted with an organic chromophore may also be used. By substituting an inorganic pigment or an organic-inorganic pigment with an organic chromophore, it is possible to easily design the hue.

The average primary particle diameter of the pigment is preferably 1 to 200 nm. The lower limit is preferably 5 nm or more, and more preferably 10 nm or more. The upper limit is preferably 180 nm or less, more preferably 150 nm or less, and even more preferably 100 nm or less. In this specification, the primary particle diameter of the pigment can be determined from an image photograph obtained by observing the primary particles of the pigment with a transmission electron microscope. Specifically, the projected area of the primary particles of the pigment is determined, and the corresponding circle equivalent diameter is calculated as the primary particle diameter of the pigment. In this specification, the average primary particle diameter is the arithmetic mean value of the primary particle diameters of 400 primary particles of the pigment. Furthermore, the primary particles of the pigment refer to independent particles that are not aggregated.

The crystallite size of the pigment, determined from the half-width of a peak derived from any crystal plane in the X-ray diffraction spectrum when CuKα radiation is used as the X-ray source, is preferably 0.1 to 100 nm, more preferably 0.5 to 50 nm, even more preferably 1 to 30 nm, and particularly preferably 5 to 25 nm.

The specific surface area of the pigment is preferably 1 to 300 m ² /g. The lower limit is preferably 10 m ² /g or more, more preferably 30 m ² /g or more. The upper limit is preferably 250 m ² /g or less, more preferably 200 m ² /g or less. The value of the specific surface area can be measured according to DIN 66131: determination of the specific surface area of solids by gas adsorption according to the BET (Brunauer, Emmett and Teller) method.

The chromatic colorant preferably contains a pigment. The content of the pigment in the chromatic colorant is preferably 50% by mass or more, more preferably 70% by mass or more, even more preferably 80% by mass or more, and particularly preferably 90% by mass or more. Examples of pigments include the following.

Color Index (C.I.) Pigment Yellow 1,2,3,4,5,6,10,11,12,13,14,15,16,17,18,20,24,31,32,34,35,35:1,36,36:1,37,37:1,40,42,43,53,55,60,61,62,63,65,73,74,7 7, 81, 83, 86, 93, 94, 95, 97, 98, 100, 101, 104, 106, 108, 109, 110, 113, 114, 115, 116, 117, 118, 119, 120, 123, 125, 126, 127, 128, 129, 137, 13 8, 139, 147, 148, 150, 151, 152, 153, 154, 155, 156, 161, 162, 164, 166, 167, 168, 169, 170, 171, 172, 173, 174, 175, 176, 177, 179, 180, 181, 182, 185, 187, 188, 193, 194, 199, 213, 214, 215, 228, 231, 232 (methine type), 233 (quinoline type), 234 (aminoketone type), 235 (aminoketone type), 236 (aminoketone type) etc. (all yellow pigments),
C.I. Pigment Orange 2,5,13,16,17:1,31,34,36,38,43,46,48,49,51,52,55,59,60,61,62,64,71,73, etc. (orange pigments)
C. I. Pigment Red 1,2,3,4,5,6,7,9,10,14,17,22,23,31,38,41,48:1,48:2,48:3,48:4,49,49:1,49:2,52:1,52:2,5 3:1, 57:1, 60:1, 63:1, 66, 67, 81:1, 81:2, 81:3, 83, 88, 90, 105, 112, 119, 122, 123, 144, 146, 149, 150, 155, 166, 168, 169, 170, 171, 172, 175, 176, 177, 178, 179, 184, 185, 187, 188, 190, 200, 202, 206, 207, 208, 209, 210, 216, 220, 224, 226, 242, 246, 254, 255, 264, 269, 270, 272, 279, 291, 294 (xanthene type, Organo Ultramarine, Bluish Red), 295 (monoazo type), 296 (diazo type), 297 (aminoketone type) and the like (all red pigments),
C.I. Pigment Green 7, 10, 36, 37, 58, 59, 62, 63, 64 (phthalocyanine type), 65 (phthalocyanine type), 66 (phthalocyanine type) etc. (all green pigments),
C.I. Pigment Violet 1, 19, 23, 27, 32, 37, 42, 60 (triarylmethane type), 61 (xanthene type) etc. (all purple pigments),
C. I. Pigment Blue 1, 2, 15, 15:1, 15:2, 15:3, 15:4, 15:6, 16, 22, 29, 60, 64, 66, 79, 80, 87 (monoazo type), 88 (methine type), etc. (all blue pigments).

As a green colorant, a halogenated zinc phthalocyanine pigment having an average of 10 to 14 halogen atoms, an average of 8 to 12 bromine atoms, and an average of 2 to 5 chlorine atoms in one molecule can also be used. Specific examples include the compounds described in WO 2015/118720. In addition, as a green colorant, a compound described in paragraph 0029 of WO 2022/085485, an aluminum phthalocyanine compound described in JP 2020-070426 A, a diarylmethane compound described in JP 2020-504758 A, and the like can also be used.

Aluminum phthalocyanine compounds having phosphorus atoms can also be used as blue colorants. Specific examples include the compounds described in paragraphs 0022 to 0030 of JP2012-247591A and paragraph 0047 of JP2011-157478A.

As yellow colorants, the compounds described in paragraphs 0031 to 0033 of WO 2022/085485, the methine dyes described in JP 2019-073695 A, and the methine dyes described in JP 2019-073696 A can be used.

As a red colorant, the compound described in paragraph 0034 of WO 2022/085485 and the brominated diketopyrrolopyrrole compound described in JP 2020-085947 A can also be used.

Dyes can also be used as chromatic colorants. There are no particular limitations on the dyes, and known dyes can be used. For example, pyrazole azo dyes, anilino azo dyes, triarylmethane dyes, anthraquinone dyes, anthrapyridone dyes, benzylidene dyes, oxonol dyes, pyrazolotriazole azo dyes, pyridone azo dyes, cyanine dyes, phenothiazine dyes, pyrrolopyrazole azomethine dyes, xanthene dyes, phthalocyanine dyes, benzopyran dyes, indigo dyes, pyrromethene dyes, and the like can be mentioned. In addition, the thiazole compounds described in JP-A-2012-158649, the azo compounds described in JP-A-2011-184493, and the azo compounds described in JP-A-2011-145540 can also be used as dyes.

As chromatic colorants, triarylmethane dye polymers described in Korean Patent Publication No. 10-2020-0028160, xanthene compounds described in Japanese Patent Publication No. 2020-117638, phthalocyanine compounds described in International Publication No. 2020/174991, isoindoline compounds or salts thereof described in Japanese Patent Publication No. 2020-160279, and Korean Patent Publication No. 10-2020-006944 Compounds represented by formula 1 described in Korean Patent Publication No. 10-2020-0069730, compounds represented by formula 1 described in Korean Patent Publication No. 10-2020-0069070, compounds represented by formula 1 described in Korean Patent Publication No. 10-2020-0069067, compounds represented by formula 1 described in Korean Patent Publication No. 10-2020-0069062, halogenated zinc phthalocyanine pigments described in Japanese Patent No. 6809649, isoindoline compounds described in JP 2020-180176, phenothiazine compounds described in JP 2021-187913, halogenated zinc phthalocyanines described in WO 2022/004261, halogenated zinc phthalocyanines described in WO 2021/250883, Korean Patent Publication No. 10-202 Quinophthalone compounds represented by formula 1 in Korean Patent Publication No. 0-0030759, polymer dyes described in Korean Patent Publication No. 10-2020-0061793, colorants described in JP-A-2022-029701, isoindoline compounds described in WO 2022/014635, aluminum phthalocyanine compounds described in WO 2022/024926, chemical compounds described in JP-A-2022-045895 Compounds described in WO 2022/050051, compounds described in JP 2020-090676 A, compounds described in JP 2020-055956 A, compounds described in JP 2021-031681 A, compounds described in JP 2022-056354 A, compounds described in U.S. Patent Application Publication No. 2021/0355327, compounds described in WO 2022/065357 compounds described in JP 2020-045436 A, compounds described in Korean Patent Publication No. 10-2021-0146726 A, compounds described in JP 2018-178039 A, compounds described in Chinese Patent Publication No. 113881244 A, compounds described in Chinese Patent Publication No. 113881245 A, compounds described in Chinese Patent Publication No. 113881246 A, compounds described in JP 2022 Compounds described in JP-104822 A, compounds described in JP-2022-096701 A, compounds described in JP-2020-023652 A, green pigments described on pages 80 to 84 of the Journal of the Color Materials Association (published in 2022), compounds described in JP-2022-143135 A, compounds described in JP-2022-140287 A, compounds described in WO 2022/136308 A, Chinese Patent Application Publication The perylene compound described in JP 113061349 A, the cyan pigment described in Korean Patent Publication No. 10-2017-0018993 A, the isoindoline compound described in JP 2020-180176 A, the compound described in JP 2023-013209 A, the compound described in JP 2023-013166 A, and the xanthene compound described in WO 2023/286526 A can also be used. The chromatic colorant may be a rotaxane, and the dye skeleton may be used in the cyclic structure of the rotaxane, in the rod-shaped structure, or in both structures.

When the composition of the present invention contains a chromatic colorant, the content of the chromatic colorant in the total solid content of the composition is preferably 1 to 50 mass %. When the composition of the present invention contains two or more chromatic colorants, the total amount thereof is preferably within the above range.

When the composition of the present invention is used as an infrared cut filter, it is preferable that the composition of the present invention is substantially free of chromatic colorants. Note that when the composition of the present invention is substantially free of chromatic colorants, this means that the content of chromatic colorants in the total solid content of the composition is 0.5 mass% or less, preferably 0.1 mass% or less, and more preferably free of chromatic colorants.

<<Coloring material that transmits infrared rays but blocks visible light>>
The composition of the present invention may also contain a coloring material that transmits infrared light and blocks visible light (hereinafter, also referred to as a coloring material that blocks visible light). A composition containing a coloring material that blocks visible light is preferably used as a composition for forming an infrared transmission filter.

The coloring material that blocks visible light is preferably a coloring material that absorbs light in the purple to red wavelength region. Also, the coloring material that blocks visible light is preferably a coloring material that blocks light in the wavelength region of 450 to 650 nm. Also, the coloring material that blocks visible light is preferably a coloring material that transmits light in the wavelength region of 900 to 1500 nm. The coloring material that blocks visible light preferably satisfies at least one of the following requirements (A) and (B).
(A): Two or more types of chromatic colorants are included, and black is formed by a combination of two or more types of chromatic colorants.
(B): Contains an organic black colorant.

Examples of chromatic colorants include those mentioned above. Examples of organic black colorants include bisbenzofuranone compounds, azomethine compounds, perylene compounds, and azo compounds, with bisbenzofuranone compounds and perylene compounds being preferred. Examples of bisbenzofuranone compounds include compounds described in JP-T-2010-534726, JP-T-2012-515233, and JP-T-2012-515234, and are available as "Irgaphor Black" manufactured by BASF. Examples of perylene compounds include compounds described in paragraphs 0016 to 0020 of JP-A-2017-226821, C.I. Pigment Black 31, 32, and the like. Examples of azomethine compounds include those described in JP-A-01-170601 and JP-A-02-034664, and are available as "Chromofine Black A1103" manufactured by Dainichi Seika Chemicals Co., Ltd.

When black is formed by combining two or more chromatic colorants, the combination of chromatic colorants may be, for example, the following embodiments (1) to (8).
(1) An embodiment containing a yellow colorant, a blue colorant, a purple colorant, and a red colorant.
(2) An embodiment containing a yellow colorant, a blue colorant, and a red colorant.
(3) An embodiment containing a yellow colorant, a purple colorant, and a red colorant.
(4) An embodiment containing a yellow colorant and a purple colorant.
(5) An embodiment containing a green colorant, a blue colorant, a purple colorant, and a red colorant.
(6) An embodiment containing a purple colorant and an orange colorant.
(7) An embodiment containing a green colorant, a purple colorant, and a red colorant.
(8) An embodiment containing a green colorant and a red colorant.

When the composition of the present invention contains a coloring material that blocks visible light, the content of the coloring material that blocks visible light in the total solid content of the composition is preferably 1 to 50 mass%. The lower limit is preferably 5 mass% or more, more preferably 10 mass% or more, even more preferably 20 mass% or more, and particularly preferably 30 mass% or more.

When the composition of the present invention is used as an infrared cut filter, it is preferable that the composition of the present invention does not substantially contain a coloring material that blocks visible light. Note that when the composition of the present invention does not substantially contain a coloring material that blocks visible light, this means that the content of the coloring material that blocks visible light in the total solid content of the composition is 0.5 mass % or less, preferably 0.1 mass % or less, and more preferably does not contain a coloring material that blocks visible light.

<<Surfactants>>
The composition of the present invention may contain a surfactant. As the surfactant, various surfactants such as fluorine-based surfactants, nonionic surfactants, cationic surfactants, anionic surfactants, and silicone-based surfactants may be used. The surfactant is preferably a silicone-based surfactant or a fluorine-based surfactant. For the surfactant, reference may be made to the surfactants described in paragraphs 0238 to 0245 of WO 2015/166779, the contents of which are incorporated herein by reference.

As fluorosurfactants, the compounds described in paragraphs 0167 to 0173 of WO 2022/085485 can be used.

Nonionic surfactants include the compounds described in paragraph 0174 of WO 2022/085485.

Examples of silicone surfactants include SH8400, SH8400 FLUID, FZ-2122, 67 Additive, 74 Additive, M Additive, and SF 8419. OIL (all manufactured by Dow Toray Co., Ltd.), TSF-4440, TSF-4300, TSF-4445, TSF-4460, TSF-4452 (all manufactured by Momentive Performance Materials, Inc.), KP-341, KF-6000, KF-6001, KF-6002, KF-6003 (all manufactured by Shin-Etsu Chemical Co., Ltd.), BYK-307, BYK-322, BYK-323, BYK-330, BYK-3760, BYK-UV3510 (all manufactured by BYK-Chemie), etc. As the silicone surfactant, a compound having the following structure can also be used.

The content of the surfactant in the total solid content of the composition is preferably 0.001 to 5 mass%. The lower limit is preferably 0.005 mass% or more. The upper limit is preferably 3 mass% or less, more preferably 1 mass% or less, even more preferably 0.5 mass% or less, and particularly preferably 0.2 mass% or less. The composition may contain only one type of surfactant, or may contain two or more types. When two or more types are contained, it is preferable that the total amount thereof is within the above range.

<<Polymerization inhibitor>>
The composition of the present invention may contain a polymerization inhibitor. Examples of the polymerization inhibitor include hydroquinone, p-methoxyphenol, di-tert-butyl-p-cresol, pyrogallol, tert-butylcatechol, benzoquinone, 4,4'-thiobis(3-methyl-6-tert-butylphenol), 2,2'-methylenebis(4-methyl-6-t-butylphenol), and N-nitrosophenylhydroxyamine salts (ammonium salts, cerous salts, etc.), with p-methoxyphenol being preferred. The content of the polymerization inhibitor in the total solid content of the composition is preferably 0.0001 to 5% by mass. The composition may contain only one type of polymerization inhibitor, or may contain two or more types. When two or more types are contained, it is preferable that the total amount thereof is within the above range.

<<Silane coupling agents>>
The composition of the present invention may contain a silane coupling agent. The silane coupling agent is preferably a silane compound having a hydrolyzable group, more preferably a silane compound having a hydrolyzable group and other functional groups. The hydrolyzable group refers to a substituent that is directly bonded to a silicon atom and can generate a siloxane bond by at least one of a hydrolysis reaction and a condensation reaction. Examples of the hydrolyzable group include a halogen atom, an alkoxy group, and an acyloxy group, and an alkoxy group is preferred. The silane coupling agent is preferably a compound having an alkoxysilyl group. In addition, examples of functional groups other than the hydrolyzable group include a vinyl group, a styryl group, a (meth)acryloyl group, a mercapto group, an epoxy group, an oxetanyl group, an amino group, a ureido group, a sulfide group, an isocyanate group, and a phenyl group, and a (meth)acryloyl group and an epoxy group are preferred. Examples of the silane coupling agent include the compound described in paragraph 0177 of International Publication No. 2022/085485 and the compound described in JP-A-2019-183020. The content of the silane coupling agent in the total solid content of the composition is preferably 0.1 to 15% by mass. The upper limit is preferably 10% by mass or less, more preferably 5% by mass or less. The lower limit is preferably 0.5% by mass or more, more preferably 1% by mass or more. The composition may contain only one type of silane coupling agent, or may contain two or more types. When two or more types are contained, it is preferable that the total amount thereof is within the above range.

<<Ultraviolet absorbing agent>>
The composition of the present invention may contain an ultraviolet absorbing agent, such as a conjugated diene compound, an aminodiene compound, a salicylate compound, a benzophenone compound, a benzotriazole compound, an acrylonitrile compound, a hydroxyphenyltriazine compound, an indole compound, a triazine compound, or a dibenzoyl compound. Specific examples of such compounds include the compounds described in paragraphs 0038 to 0052 of JP 2009-217221 A, 0052 to 0072 of JP 2012-208374 A, 0317 to 0334 of JP 2013-068814 A, 0061 to 0080 of JP 2016-162946 A, 0052 and 0074 of WO 2021/131355 A, and 0022 to 0024 of WO 2021/132247 A, the contents of which are incorporated herein. Commercially available ultraviolet absorbers include the Tinuvin series and Uvinul series manufactured by BASF Corporation. In addition, examples of the benzotriazole compound include the MYUA series (The Chemical Daily, February 1, 2016) manufactured by Miyoshi Oil & Fat. The ultraviolet absorber may be the compound described in the Examples described later, the compounds described in paragraphs 0049-0059 of Japanese Patent No. 6268967, and paragraphs 0059-0076 of International Publication No. 2016/181987. The content of the ultraviolet absorber in the total solid content of the composition is preferably 0.01 to 30% by mass. The lower limit is preferably 0.05% by mass or more. The upper limit is preferably 25% by mass or less, more preferably 20% by mass or less, even more preferably 10% by mass or less, and particularly preferably 5% by mass or less. The composition may contain only one type of ultraviolet absorber, or may contain two or more types. When two or more types are contained, it is preferable that the total amount thereof is within the above range.

<<Antioxidants>>
The composition of the present invention may contain an antioxidant. Examples of the antioxidant include phenol-based antioxidants, amine-based antioxidants, phosphorus-based antioxidants, and sulfur-based antioxidants. Examples of the phenol-based antioxidant include hindered phenol compounds. The phenol-based antioxidant is preferably a compound having a substituent at the site (ortho position) adjacent to the phenolic hydroxy group. The aforementioned substituent is preferably a substituted or unsubstituted alkyl group having 1 to 22 carbon atoms. The antioxidant is also preferably a compound having a phenol group and a phosphite ester group in the same molecule. Examples of phosphorus-based antioxidants include tris[2-[[2,4,8,10-tetrakis(1,1-dimethylethyl)dibenzo[d,f][1,3,2]dioxaphosphepin-6-yl]oxy]ethyl]amine, tris[2-[(4,6,9,11-tetra-tert-butyldibenzo[d,f][1,3,2]dioxaphosphepin-2-yl)oxy]ethyl]amine, ethyl bis(2,4-di-tert-butyl-6-methylphenyl)phosphite, and tris(2,4-di-tert-butylphenyl)phosphite. Examples of commercially available antioxidants include ADK STAB AO-20, ADK STAB AO-30, ADK STAB AO-40, ADK STAB AO-50, ADK STAB AO-50F, ADK STAB AO-60, ADK STAB AO-60G, ADK STAB AO-80, ADK STAB AO-330, ADK STAB AO-412S, ADK STAB 2112, ADK STAB PEP-36, ADK STAB HP-10 (all manufactured by ADEKA CORPORATION), and JP-650 (manufactured by Johoku Chemical Industry Co., Ltd.). The antioxidant may be a compound described in paragraphs 0023 to 0048 of Japanese Patent No. 6268967, a compound described in International Publication No. 2017/006600, a compound described in International Publication No. 2017/164024, or a compound described in Korean Patent Publication No. 10-2019-0059371. The content of the antioxidant in the total solid content of the composition is preferably 0.01 to 20% by mass. The lower limit is preferably 0.3% by mass or more, and more preferably 0.5% by mass or more. The upper limit is preferably 15% by mass or less, and more preferably 10% by mass or less. The composition may contain only one type of antioxidant, or may contain two or more types. When two or more types are contained, it is preferable that the total amount thereof is within the above range.

<<Other ingredients>>
The composition of the present invention may contain, as necessary, a sensitizer, a filler, a heat curing accelerator, a plasticizer, and other auxiliaries (e.g., conductive particles, defoamers, flame retardants, leveling agents, peeling accelerators, fragrances, surface tension regulators, chain transfer agents, latent antioxidants, etc.). By appropriately incorporating these components, properties such as film properties can be adjusted. As these components, the compounds described in paragraph 0182 of WO 2022/085485 can be used.

The composition of the present invention preferably has a free metal content of 100 ppm or less, more preferably 50 ppm or less. The free halogen content is preferably 100 ppm or less, more preferably 50 ppm or less. Methods for reducing free metals and halogens in the composition include washing with ion-exchanged water, filtration, ultrafiltration, and purification with ion-exchange resins.

From the viewpoint of environmental regulations, the use of perfluoroalkylsulfonic acid and its salts, and perfluoroalkylcarboxylic acid and its salts may be restricted. When the content of the above-mentioned compounds is reduced in the composition of the present invention, the content of perfluoroalkylsulfonic acid (particularly perfluoroalkylsulfonic acid having 6 to 8 carbon atoms in the perfluoroalkyl group) and its salts, and perfluoroalkylcarboxylic acid (particularly perfluoroalkylcarboxylic acid having 6 to 8 carbon atoms in the perfluoroalkyl group) and its salts is preferably in the range of 0.01 ppb to 1,000 ppb, more preferably in the range of 0.05 ppb to 500 ppb, and even more preferably in the range of 0.1 ppb to 300 ppb, based on the total solid content of the composition. The composition of the present invention may be substantially free of perfluoroalkylsulfonic acid and its salts, and perfluoroalkylcarboxylic acid and its salts. For example, a composition that is substantially free of perfluoroalkylsulfonic acid and its salts, and perfluoroalkylcarboxylic acid and its salts may be selected by using a compound that can be a substitute for perfluoroalkylsulfonic acid and its salts, and a compound that can be a substitute for perfluoroalkylcarboxylic acid and its salts. Examples of compounds that can be a substitute for regulated compounds include compounds that are excluded from regulation due to the difference in the number of carbon atoms in the perfluoroalkyl group. However, the above content does not prevent the use of perfluoroalkylsulfonic acid and its salts, and perfluoroalkylcarboxylic acid and its salts. The composition of the present invention may contain perfluoroalkylsulfonic acid and its salts, and perfluoroalkylcarboxylic acid and its salts, within the maximum allowable range.

<Containment container>
The container for storing the composition of the present invention is not particularly limited, and a known container can be used. In addition, the container described in paragraph 0187 of WO 2022/085485 can be used as the container.

<Method of preparing the composition>
The composition of the present invention can be prepared by mixing the above-mentioned components. When preparing the composition, all the components may be simultaneously dissolved or dispersed in a solvent to prepare the composition, or, if necessary, two or more solutions or dispersions in which the components are appropriately mixed may be prepared in advance, and these may be mixed at the time of use (at the time of application) to prepare the composition.

The preparation of the composition may include a process for dispersing the pigment. In the process for dispersing the pigment, mechanical forces used to disperse the pigment include compression, squeezing, impact, shear, and cavitation. Specific examples of these processes include bead mills, sand mills, roll mills, ball mills, paint shakers, microfluidizers, high-speed impellers, sand grinders, flow jet mixers, high-pressure wet atomization, and ultrasonic dispersion. In addition, when grinding pigments in a sand mill (bead mill), it is preferable to use small-diameter beads and increase the bead packing rate to perform processing under conditions that increase the grinding efficiency. In addition, it is preferable to remove coarse particles by filtration, centrifugation, or the like after the grinding process. In addition, the process and dispersing machine for dispersing the pigment may be suitably used as described in "Dispersion Technology Encyclopedia, published by Information Technology Co., Ltd., July 15, 2005" or "Dispersion Technology and Industrial Application Practice Focusing on Suspension (Solid/Liquid Dispersion System) - Comprehensive Data Collection, published by Management Development Center Publishing Department, October 10, 1978", and in paragraph number 0022 of JP 2015-157893 A. In addition, in the process for dispersing the pigment, the pigment may be subjected to a fine treatment in a salt milling process. For the materials, equipment, processing conditions, etc. used in the salt milling process, the descriptions in, for example, JP 2015-194521 A and JP 2012-046629 A may be referred to. Examples of materials for the beads used for dispersion include zirconia, agate, quartz, titania, tungsten carbide, silicon nitride, alumina, stainless steel, and glass. The beads may also be made of inorganic compounds with a Mohs hardness of 2 or more. The composition may contain 1 to 10,000 ppm of the beads.

When preparing the composition, it is preferable to filter the composition with a filter for the purpose of removing foreign matter and reducing defects. Examples of the types of filters and filtration methods used for filtration include the filters and filtration methods described in paragraphs 0196 to 0199 of WO 2022/085485.

<Membrane>
Next, the film of the present invention will be described. The film of the present invention is obtained from the composition of the present invention described above. The film of the present invention can be preferably used as an optical filter. The use of the optical filter is not particularly limited, but examples thereof include an infrared cut filter and an infrared transmission filter. Examples of infrared cut filters include an infrared cut filter on the light receiving side of a solid-state imaging element (for example, an infrared cut filter for a wafer level lens), an infrared cut filter on the back side (opposite to the light receiving side) of a solid-state imaging element, and an infrared cut filter for an environmental light sensor (for example, an illuminance sensor that senses the illuminance and color tone of the environment in which an information terminal device is placed and adjusts the color tone of the display, and a color correction sensor that adjusts the color tone). In particular, it can be preferably used as an infrared cut filter on the light receiving side of a solid-state imaging element. Examples of infrared transmission filters include a filter that can block visible light and selectively transmit infrared rays of a specific wavelength or more.

The film of the present invention may have a pattern, or may be a film without a pattern (flat film). The film of the present invention may be laminated on a support, or may be peeled off from the support. Examples of the support include semiconductor substrates such as silicon substrates, and transparent substrates.

The semiconductor substrate used as the support may have a charge-coupled device (CCD), a complementary metal oxide semiconductor (CMOS), a photoelectric conversion layer, a transparent conductive film, etc. formed on it. In addition, a partition wall is formed on the semiconductor substrate to separate each pixel. Examples of the partition wall include metal, metal oxide, and black matrix. If necessary, a primer layer may be provided on the semiconductor substrate to improve adhesion with the upper layer, prevent diffusion of substances, or flatten the substrate surface.

The transparent substrate used as the support is not particularly limited as long as it is made of a material that can transmit at least visible light. For example, substrates made of materials such as glass and resin can be used. Examples of resins include polyester resins such as polyethylene terephthalate and polybutylene terephthalate, polyolefin resins such as polyethylene, polypropylene, and ethylene vinyl acetate copolymer, norbornene resin, acrylic resins such as polyacrylate and polymethyl methacrylate, urethane resin, vinyl chloride resin, fluororesin, polycarbonate resin, polyvinyl butyral resin, and polyvinyl alcohol resin. Examples of glass include soda lime glass, borosilicate glass, alkali-free glass, quartz glass, and glass containing copper. Examples of glass containing copper include phosphate glass containing copper and fluorophosphate glass containing copper. Commercially available glass containing copper can also be used. Commercially available glass containing copper includes NF-50 (manufactured by AGC Technoglass Co., Ltd.).

The thickness of the film of the present invention can be adjusted appropriately depending on the purpose. The thickness of the film can be 200 μm or less, 150 μm or less, 120 μm or less, 20 μm or less, 10 μm or less, or 5 μm or less. The lower limit of the film thickness is preferably 0.1 μm or more, and more preferably 0.2 μm or more.

When the film of the present invention is used as an infrared cut filter, it is preferred that the film of the present invention has a maximum absorption wavelength in the wavelength range of 650 to 1500 nm (preferably 660 to 1200 nm, more preferably 660 to 1000 nm).
Furthermore, the average transmittance in the wavelength range of 700 to 720 nm is preferably 10% or less, more preferably 7% or less, even more preferably 4% or less, and particularly preferably 2% or less.
The average transmittance in the wavelength range of 400 to 550 nm is preferably 86% or more, more preferably 89% or more, even more preferably 92% or more, and particularly preferably 95% or more. The transmittance in the entire wavelength range of 420 to 550 nm is preferably 50% or more, more preferably 70% or more, and even more preferably 80% or more.
In addition, the transmittance at at least one point in the wavelength range of 650 to 1500 nm (preferably a wavelength range of 660 to 1200 nm, more preferably a wavelength range of 660 to 1000 nm) is preferably 10% or less, more preferably 7% or less, even more preferably 4% or less, and particularly preferably 2% or less.
Furthermore, when the absorbance at the maximum absorption wavelength of the film of the present invention is taken as 1, the average absorbance in the wavelength range of 400 to 550 nm is preferably less than 0.030, and more preferably less than 0.025.

When the film of the present invention is used as an infrared transmission filter, the film of the present invention preferably has, for example, any one of the following spectral characteristics (i1) to (i3).
(i1): A filter having a maximum transmittance of 20% or less (preferably 15% or less, more preferably 10% or less) in the wavelength range of 400 to 850 nm, and a minimum transmittance of 70% or more (preferably 75% or more, more preferably 80% or more) in the wavelength range of 1000 to 1500 nm. A film having such spectral characteristics can block light in the wavelength range of 400 to 850 nm and transmit light with a wavelength of more than 950 nm.
(i2): A filter having a maximum transmittance of 20% or less (preferably 15% or less, more preferably 10% or less) in the wavelength range of 400 to 950 nm, and a minimum transmittance of 70% or more (preferably 75% or more, more preferably 80% or more) in the wavelength range of 1100 to 1500 nm. A film having such spectral characteristics can block light in the wavelength range of 400 to 950 nm and transmit light with a wavelength of more than 1050 nm.
(i3): A filter having a maximum transmittance of 20% or less (preferably 15% or less, more preferably 10% or less) in the wavelength range of 400 to 1050 nm, and a minimum transmittance of 70% or more (preferably 75% or more, more preferably 80% or more) in the wavelength range of 1200 to 1500 nm. A film having such spectral characteristics can block light in the wavelength range of 400 to 1050 nm and transmit light with a wavelength of more than 1150 nm.

The film of the present invention can also be used in combination with a color filter containing a chromatic colorant. The color filter can be manufactured using a coloring composition containing a chromatic colorant. When the film of the present invention is used as an infrared cut filter and is used in combination with the film of the present invention and a color filter, it is preferable that a color filter is arranged on the optical path of the film of the present invention. For example, it is preferable to use the film of the present invention and a color filter as a laminate by laminating them. In the laminate, the film of the present invention and the color filter may or may not be adjacent to each other in the thickness direction. When the film of the present invention and the color filter are not adjacent to each other in the thickness direction, the film of the present invention may be formed on a support other than the support on which the color filter is formed, and other members constituting a solid-state imaging device (e.g., microlenses, planarization layers, etc.) may be interposed between the film of the present invention and the color filter.

The film of the present invention can be used in various devices such as solid-state imaging devices such as CCDs (charge-coupled devices) and CMOSs (complementary metal-oxide semiconductors) (the imaging section can be made of compound semiconductors such as InGaAs, organic semiconductors, quantum dots, etc., in addition to Si), infrared sensors, light-emitting elements, optical communication elements (for both transmission and reception), and image display devices.

<Membrane manufacturing method>
The film of the present invention can be produced through a process of applying the composition of the present invention.

The support may be any of those mentioned above. A known method such as spin coating may be used as a method for applying the composition. For example, the application method described in paragraph 0207 of WO 2022/085485 may be used.

The composition layer formed by applying the composition may be dried (prebaked). When prebaking is performed, the prebaking temperature is preferably 150°C or less, more preferably 120°C or less, and even more preferably 110°C or less. The lower limit can be, for example, 50°C or more, and can also be 80°C or more. The prebaking time is preferably 10 seconds to 3000 seconds, more preferably 40 to 2500 seconds, and even more preferably 80 to 220 seconds. Drying can be performed using a hot plate, oven, etc.

The film manufacturing method may further include a step of forming a pattern. Examples of the pattern forming method include a pattern forming method using a photolithography method and a pattern forming method using a dry etching method, and a pattern forming method using a photolithography method is preferable. When the film of the present invention is used as a flat film, the step of forming a pattern does not need to be performed. The step of forming a pattern is described in detail below.

(When forming a pattern by photolithography)
The pattern forming method by photolithography preferably includes a step of exposing the composition layer formed by applying the composition of the present invention to light in a pattern (exposure step), and a step of developing and removing the composition layer in the unexposed area to form a pattern (development step). If necessary, a step of baking the developed pattern (post-baking step) may be provided. Each step will be described below.

In the exposure process, the composition layer is exposed to light in a pattern. For example, the composition layer can be exposed to light in a pattern by using a stepper exposure machine or a scanner exposure machine through a mask having a predetermined mask pattern. This allows the exposed parts to harden.

Radiation (light) that can be used for exposure includes g-line and i-line. Light with a wavelength of 300 nm or less (preferably light with a wavelength of 180 to 300 nm) can also be used. Examples of light with a wavelength of 300 nm or less include KrF line (wavelength 248 nm) and ArF line (wavelength 193 nm), with KrF line (wavelength 248 nm) being preferred. Long-wavelength light sources of 300 nm or more can also be used.

In addition, during exposure, light may be applied continuously or in pulses (pulse exposure). Pulse exposure is an exposure method in which light is applied and paused repeatedly in short cycles (e.g., milliseconds or less).

The irradiation amount (exposure amount) is, for example, preferably 0.03 to 2.5 J/cm ² , more preferably 0.05 to 1.0 J/cm ^2. The oxygen concentration during exposure can be appropriately selected, and in addition to being performed under air, exposure may be performed under a low-oxygen atmosphere with an oxygen concentration of 19 volume% or less (e.g., 15 volume%, 5 volume%, or substantially oxygen-free), or under a high-oxygen atmosphere with an oxygen concentration of more than 21 volume% (e.g., 22 volume%, 30 volume%, or 50 volume%). The exposure illuminance can be appropriately set, and can usually be selected from the range of 1000 W/m ² to 100,000 W/m ² (e.g., 5,000 W/m ² , 15,000 W/m ² , or 35,000 W/m ² ). The oxygen concentration and exposure illuminance may be appropriately combined. For example, the oxygen concentration can be 10% by volume and the illuminance can be 10,000 W/m ² , and the oxygen concentration can be 35% by volume and the illuminance can be 20,000 W/m ² .

Next, the unexposed portions of the composition layer after exposure are developed and removed to form a pattern. The unexposed portions of the composition layer can be developed and removed using a developer. As a result, the unexposed portions of the composition layer in the exposure step are dissolved into the developer, and only the photocured portions remain on the support. The temperature of the developer is preferably, for example, 20 to 30°C. The development time is preferably 20 to 180 seconds. In order to improve residue removal, the developer is shaken off every 60 seconds and new developer is supplied, and this process may be repeated several times.

The developer may be an organic solvent or an alkaline developer, with an alkaline developer being preferred. The developer and the washing (rinsing) method after development may be as described in paragraph 0214 of WO 2022/085485.

After development and drying, it is preferable to perform additional exposure processing or heating processing (post-baking). Additional exposure processing and post-baking are curing processing after development to complete curing. The heating temperature in post-baking is preferably, for example, 100 to 240°C, more preferably 200 to 240°C. Post-baking can be performed continuously or batchwise using a heating means such as a hot plate, a convection oven (hot air circulation dryer), or a high-frequency heater to heat the developed film to the above conditions. When additional exposure processing is performed, it is preferable that the light used for exposure has a wavelength of 400 nm or less. In addition, additional exposure processing may be performed by the method described in Korean Patent Publication No. 10-2017-0122130.

(When forming a pattern by dry etching)
The pattern formation by the dry etching method can be performed by a method in which the composition layer formed by applying the composition on a support is cured to form a cured layer, then a patterned photoresist layer is formed on the cured layer, and then the patterned photoresist layer is used as a mask to dry etch the cured layer using an etching gas. In forming the photoresist layer, it is preferable to perform a pre-bake treatment. For the pattern formation by the dry etching method, the description in paragraphs 0010 to 0067 of JP 2013-064993 A can be referred to, and the contents thereof are incorporated herein.

<Optical filter>
The optical filter of the present invention has the above-mentioned film of the present invention. Types of the optical filter include an infrared cut filter and an infrared transmission filter.

The optical filter of the present invention may further include a copper-containing layer, a dielectric multilayer film, an ultraviolet absorbing layer, etc., in addition to the above-mentioned film of the present invention. Examples of the ultraviolet absorbing layer include the absorbing layer described in paragraphs 0040 to 0070 and 0119 to 0145 of International Publication No. 2015/099060. Examples of the dielectric multilayer film include the dielectric multilayer film described in paragraphs 0255 to 0259 of JP 2014-041318 A. Examples of the copper-containing layer include a glass substrate (copper-containing glass substrate) made of glass containing copper, and a layer containing a copper complex (copper complex-containing layer). Examples of the copper-containing glass substrate include copper-containing phosphate glass and copper-containing fluorophosphate glass. Examples of commercially available copper-containing glass include NF-50 (manufactured by AGC Technoglass Co., Ltd.), BG-60, BG-61 (all manufactured by Schott Co., Ltd.), CD5000 (manufactured by HOYA Co., Ltd.), etc.

The optical filter of the present invention may be formed on a support. Examples of the support include the supports described above. Preferred substrates include transparent substrates made of materials such as glass and resin. Examples of resins include polyester resins such as polyethylene terephthalate and polybutylene terephthalate, polyolefin resins such as polyethylene, polypropylene, and ethylene-vinyl acetate copolymer, norbornene resins, acrylic resins such as polyacrylate and polymethyl methacrylate, urethane resins, vinyl chloride resins, fluororesins, polycarbonate resins, polyvinyl butyral resins, and polyvinyl alcohol resins. Examples of glass include soda-lime glass, borosilicate glass, alkali-free glass, quartz glass, and glass containing copper. The optical filter may also be formed directly on various elements.

<Solid-state imaging element>
The solid-state imaging device of the present invention has the above-mentioned film of the present invention. The configuration of the solid-state imaging device is not particularly limited as long as it has the film of the present invention and functions as a solid-state imaging device. For example, the following configurations can be mentioned.

　A configuration in which a plurality of photodiodes constituting the light receiving area of a solid-state imaging element and a transfer electrode made of polysilicon or the like are provided on a support, a light shielding film made of tungsten or the like with only the light receiving portion of the photodiodes opened on the photodiodes and the transfer electrodes is provided on the light shielding film, a device protection film made of silicon nitride or the like formed on the light shielding film so as to cover the entire light shielding film and the light receiving portion of the photodiodes, and the film of the present invention is provided on the device protection film. Furthermore, a configuration in which a light collecting means (e.g., a microlens, etc.; the same applies below) is provided on the device protection film and below the film of the present invention (on the side closer to the support), or a configuration in which a light collecting means is provided on the film of the present invention, etc. may be provided. In addition, the color filter may have a structure in which a film forming each pixel is embedded in a space partitioned, for example, in a lattice shape by partition walls. In this case, it is preferable that the partition walls have a lower refractive index than each pixel. Examples of imaging devices having such a structure include the devices described in JP 2012-227478 A and JP 2014-179577 A.

<Image display device>
The image display device of the present invention has the film of the present invention. Examples of the image display device include a liquid crystal display device and an organic electroluminescence (organic EL) display device. The definition and details of the image display device are described in, for example, "Electronic Display Devices (by Akio Sasaki, published by Kogyo Chosakai Co., Ltd. in 1990)" and "Display Devices (by Junsho Ibuki, published by Sangyo Tosho Co., Ltd. in 1989)". The liquid crystal display device is described in, for example, "Next Generation Liquid Crystal Display Technology (edited by Tatsuo Uchida, published by Kogyo Chosakai Co., Ltd. in 1994)". There is no particular limitation on the liquid crystal display device to which the present invention can be applied, and the present invention can be applied to various types of liquid crystal display devices described in the above-mentioned "Next Generation Liquid Crystal Display Technology". The image display device may have a white organic EL element. The white organic EL element is preferably a tandem structure. The tandem structure of the organic EL element is described in JP-A-2003-045676, and Akiyoshi Mikami, editor, "The Frontline of Organic EL Technology Development - High Brightness, High Precision, Long Life, Know-How Collection", Technical Information Association, pp. 326-328, 2008. The spectrum of white light emitted by the organic EL element preferably has strong maximum emission peaks in the blue region (430-485 nm), green region (530-580 nm), and yellow region (580-620 nm). In addition to these emission peaks, it is more preferable that the organic EL element has a maximum emission peak in the red region (650-700 nm). The film of the present invention can also be used as an infrared-transmitting film provided in an opening for infrared communication formed in the frame portion of a protective plate for a display device.

<Infrared sensor>
The infrared sensor of the present invention has the above-mentioned film of the present invention. The configuration of the infrared sensor is not particularly limited as long as it functions as an infrared sensor. Hereinafter, one embodiment of the infrared sensor of the present invention will be described with reference to the drawings.

In FIG. 1, reference numeral 110 denotes a solid-state imaging element. An infrared cut filter 111 and an infrared transmission filter 114 are disposed on the imaging region of the solid-state imaging element 110. A color filter 112 is disposed on the infrared cut filter 111. A microlens 115 is disposed on the incident light hν side of the color filter 112 and the infrared transmission filter 114. A planarization layer 116 is formed to cover the microlens 115.

The infrared cut filter 111 can be formed using the composition of the present invention. The color filter 112 is a color filter in which pixels that transmit and absorb light of specific wavelengths in the visible range are formed, and is not particularly limited, and a conventionally known color filter for forming pixels can be used. For example, a color filter in which red (R), green (G), and blue (B) pixels are formed can be used. For example, the description in paragraphs 0214 to 0263 of JP 2014-043556 A can be referred to, and the contents of this specification can be incorporated herein. The characteristics of the infrared transmission filter 114 are selected according to the emission wavelength of the infrared LED used. The infrared transmission filter 114 can be formed using the composition of the present invention.

In the infrared sensor shown in FIG. 1, an infrared cut filter (another infrared cut filter) other than the infrared cut filter 111 may be further disposed on the planarization layer 116. Examples of the other infrared cut filter include those having a copper-containing layer and/or a dielectric multilayer film. Details of these are as described above. Also, a dual bandpass filter may be used as the other infrared cut filter.

<Camera module>
The camera module of the present invention has the above-mentioned film of the present invention. The configuration of the camera module is not particularly limited as long as it has the film of the present invention and functions as a camera module. For example, the camera module may have a configuration having a solid-state image sensor, a lens, and a circuit for processing an image obtained from the solid-state image sensor. The lens used in the camera module and the circuit for processing an image obtained from the solid-state image sensor may be a known one. As examples of the camera module, the camera modules described in JP 2016-006476 A and JP 2014-197190 A can be referred to, and the contents of these are incorporated herein.

<Light Emitting Element>
The film of the present invention can also be used for a light-emitting element. The configuration of the light-emitting element is not particularly limited as long as it functions as a light-emitting element, and examples thereof include light-emitting diodes (LEDs), organic light-emitting diodes (OLEDs), quantum dot light-emitting diodes (QLEDs), and vertical cavity surface-emitting lasers (VISELs). The film of the present invention may be formed directly on the light-emitting element, or may be disposed on the path of light emission.

<Optical communication element>
The film of the present invention can also be used in an optical communication element. The configuration of the optical communication element is not particularly limited as long as it functions as an optical communication element, and may be a transmitting element or a receiving element. Examples of optical communication elements include infrared remote controls, infrared transceivers, optical interposers, and optical interconnections. The film of the present invention may be formed directly on a receiving element, or may be formed directly on a transmitting element, or may be disposed on a transmission/reception path.

<Compound>
The compound of the present invention is a compound represented by formula (1a).
In formula (1a), R ¹ represents -OR _a , -NR _b R _c or -SR _d ;
R _a and R _d each independently represent an alkyl group having a steric substituent constant -Es' of 0.40 or more, a cycloalkyl group having a steric substituent constant -Es' of 0.40 or more, an aryl group having a steric substituent constant -Es' of 0.40 or more, or a heteroaryl group having a steric substituent constant -Es' of 0.40 or more;
R _b and R _c each independently represent a hydrogen atom, an alkyl group, a cycloalkyl group, an aryl group, or a heteroaryl group, and R _b and R _c may be bonded to form a ring; provided that at least one of R _b and R _c is an alkyl group having a steric substituent constant -Es' of 0.40 or more, a cycloalkyl group having a steric substituent constant -Es' of 0.40 or more, an aryl group having a steric substituent constant -Es' of 0.40 or more, or a heteroaryl group having a steric substituent constant -Es' of 0.40 or more, and when one of R _b and R _c is a hydrogen atom, the other is an alkyl group having a steric substituent constant -Es' of 1.05 or more, a cycloalkyl group having a steric substituent constant -Es' of 0.40 or more, an aryl group having a steric substituent constant -Es' of 2.50 or more, or a heteroaryl group having a steric substituent constant -Es' of 2.50 or more;
Het ¹ and Het ² each independently represent a heterocyclic group;
^R2 and ^R3 each independently represent a hydrogen atom or a substituent;
An represents a monovalent anion.

Details of R ¹ to R ³ , Het ¹ , Het ² and An in formula (1a) are the same as those explained in formula (1) above.

The compound represented by formula (1a) is preferably a compound represented by formula (2a).
In formula (2), R ¹ represents -OR _a , -NR _b R _c or -SR _d ;
R _a and R _d each independently represent an alkyl group having a steric substituent constant -Es' of 0.40 or more, a cycloalkyl group having a steric substituent constant -Es' of 0.40 or more, an aryl group having a steric substituent constant -Es' of 0.40 or more, or a heteroaryl group having a steric substituent constant -Es' of 0.40 or more;
R _b and R _c each independently represent a hydrogen atom, an alkyl group, a cycloalkyl group, an aryl group, or a heteroaryl group, and R _b and R _c may be bonded to form a ring; provided that at least one of R _b and R _c is an alkyl group having a steric substituent constant -Es' of 0.40 or more, a cycloalkyl group having a steric substituent constant -Es' of 0.40 or more, an aryl group having a steric substituent constant -Es' of 0.40 or more, or a heteroaryl group having a steric substituent constant -Es' of 0.40 or more, and when one of R _b and R _c is a hydrogen atom, the other is an alkyl group having a steric substituent constant -Es' of 1.05 or more, a cycloalkyl group having a steric substituent constant -Es' of 0.40 or more, an aryl group having a steric substituent constant -Es' of 2.50 or more, or a heteroaryl group having a steric substituent constant -Es' of 2.50 or more;
X ¹ and X ² each independently represent O, NR ^x , S, Se, or Te, where R ^x represents a hydrogen atom or a substituent;
R ² to R ¹⁵ each independently represent a hydrogen atom or a substituent, and adjacent two of R ⁴ to R ¹⁵ may be bonded to form a ring;
An represents a monovalent anion.

Details of R ¹ to R ¹⁵ , Het ¹ , Het ² and An in formula (2a) are the same as those explained in formula (2a) above.

Specific examples of the compounds of the present invention include compounds A-1 to A-41 described in the Examples below.

The present invention will be explained in more detail below with reference to examples. The materials, amounts used, ratios, processing contents, processing procedures, etc. shown in the following examples can be changed as appropriate without departing from the spirit of the present invention.

<Specific compounds>
Compounds A-1 to A-41 and compounds A-c1 and A-c2 used in the following Examples and Comparative Examples are as follows: Compounds A-c1 and A-c2 are comparative compounds.

The abbreviations for the groups in the table above are as follows. In the formulas below, the wavy lines represent bonds.

(Regarding Het ¹ )

(For Het ² )

(Regarding ^R1 )

RN-10 and RN-r1 are groups having a structure in which R ^b and R ^c are bonded to form a ring. With regard to RN-10, one of R ^b and R ^c can be considered to be a group represented by formula (R-11) shown below (-Es' value = 1.43), and the other can be considered to be a group represented by formula (R-12) (-Es' value = 2.28). With regard to RN-r1, both R ^b and R ^c are primary alkyl groups, and at the most, can be considered to be an n-propyl group (-Es' value = 0.31).
Therefore, for RN-10, the -Es' values of R ^b and R ^c are both 1.43 or more, and for RN-r1, the -Es' values of R ^b and R ^c are both less than 0.4.

The groups described in the structure columns of R _a , R _b , R _c and R _d in the above table are as follows.

(Regarding An)

<Synthesis Example>
(Synthesis Example 1) Synthesis of Compound A-23 Compound A-23 was synthesized according to the following synthesis route with reference to JP-A-2022-189736.

In a 300 mL three-neck flask, 1 g of compound A-23-1 was dissolved in 200 mL of dichloromethane. The mixture was stirred at room temperature under a nitrogen stream, and 1.1 g of methyl trifluoromethanesulfonate was added dropwise thereto, followed by stirring at room temperature for 3 hours. After the reaction was completed, 50 mL of water was added, the mixture was separated, and the organic layer was dried over anhydrous sodium sulfate, after which the solvent was distilled off under reduced pressure. The crude product was recrystallized in a mixed solvent of dichloromethane/ethyl acetate, to obtain 1.1 g of red powder A-23-2. (Maldi-tof MS: 758)
Compound A-23-2 (1.1 g) was added to 200 mL of dichloromethane, and bis(1-ethyl-propyl)amine (1.0 g) was added dropwise under a nitrogen stream, followed by stirring at room temperature for 3 hours. After the reaction was completed, the precipitated solid was filtered off and washed with water and diethyl ether. The mixture was added to 100 mL of dichloromethane, and 100 mL of water and 0.84 g of lithium tetrakis(perfluorophenyl)borate were added, followed by stirring at room temperature for 1 hour. The aqueous layer was removed, the solvent was distilled off under reduced pressure, and recrystallization was performed with dichloromethane/methanol to obtain 1.5 g of compound A-23 (red powder).
Identification data of compound A-23: MALDI TOF-MASS (time-of-flight mass spectrometry) Calc. for C ₇₂ H ₆₄ BF ₂₀ NOS ₂ [M] ⁺ : 1414.4 found: 1414.4

<Preparation of Dispersion>
The pigments, resins, and solvents of the types shown in the table below were mixed in the amounts shown in the table below, and 117 parts by mass of zirconia beads with a diameter of 0.3 mm were added, and the mixture was dispersed for 5 hours using a paint shaker. The beads were then separated by filtration to produce a dispersion. The pigments used had been subjected to the following kneading and grinding treatment.

(Kneading and polishing treatment conditions)
10.6 parts by mass of pigment, 149.4 parts by mass of grinding agent and 28 parts by mass of binder were added to a Labo Plastomill (manufactured by Toyo Seiki Seisakusho, Ltd.) and the temperature of the kneaded material in the device was controlled to 70° C., and kneaded for 2 hours. Neutral anhydrous Glauber's salt E (average particle size (volume-based 50% diameter (D50)) = 20 μm, manufactured by Mitajiri Chemical Industry Co., Ltd.) was used as the grinding agent, and diethylene glycol was used as the binder. After kneading and polishing, the kneaded material was washed with 20 L of water at 24° C. to remove the grinding agent and binder, and then treated in a heating oven at 80° C. for 24 hours.

The materials listed in the table above are as follows:
(Pigment)
PR254: C.I. Pigment Red 254 (red pigment)
PB15:4: C.I. Pigment Blue 15:4 (blue pigment)
PB15:6: C.I. Pigment Blue 15:6 (blue pigment)
PG58: C.I. Pigment Green 58 (green pigment)
PY150: C.I. Pigment Yellow 150 (yellow pigment)

(resin)
B-9: Block resin having the following structure (the numbers attached to the main chain are the molar ratios of repeating units, weight average molecular weight 9800, amine value 50 mg KOH/g, quaternary ammonium salt value 20 mg KOH/g).

(solvent)
S-1: Propylene glycol monomethyl ether acetate (PGMEA)

<Production of Composition>
(Examples 1-1 to 1-41, Comparative Examples 1-1 and 1-2)
The materials other than the solvent shown in the table below were mixed in the ratios shown in the table below, and the solvent shown in the table below was added to adjust the solid content concentration to 7 mass %, followed by stirring and filtering through a nylon filter with a pore size of 0.45 μm (manufactured by Nippon Pall Co., Ltd.) to produce a composition. The solid content concentration of the composition was adjusted by the amount of the solvent added.

(Examples 2-1 to 2-52 and Comparative Examples 2-1 and 2-2)
The materials other than the solvent shown in the table below were mixed in the ratios shown in the table below, and the solvent shown in the table below was added to adjust the solid content concentration to 35 mass %, followed by stirring and filtering through a nylon filter with a pore size of 0.45 μm (manufactured by Nippon Pall Co., Ltd.) to produce a composition. The solid content concentration of the composition was adjusted by the amount of the solvent added.

(Examples 3-1 to 3-44, Comparative Examples 3-1 and 3-2)
The materials other than the solvent shown in the table below were mixed in the ratio shown in the table below, and the solvent shown in the table below was added to adjust the solid content concentration to 20 mass %, followed by stirring and filtering through a nylon filter with a pore size of 0.45 μm (manufactured by Nippon Pall Co., Ltd.) to produce a composition. The solid content concentration of the composition was adjusted by the amount of the solvent added.

Details of the materials indicated by the abbreviations in the table are as follows:

(Specific Compound)
A-1 to A-41, A-c1, A-c2: The above-mentioned compounds A-1 to A-41, A-c1, A-c2

(resin)
B-1: Resin having the following structure (the numbers attached to the main chain are molar ratios; weight average molecular weight 11,000, acid value 69.2 mgKOH/g)
B-2: Resin having the following structure (the numbers attached to the main chain are molar ratios. Weight average molecular weight: 21,000)
B-3: Resin having the following structure (the numbers attached to the main chain are molar ratios, and the numbers attached to the side chains are the numbers of repeating units. Weight average molecular weight: 16,000, acid value: 67 mgKOH/g)
B-4: Resin having the following structure (the numbers attached to the main chain are molar ratios, and the numbers attached to the side chains are the numbers of repeating units. Weight average molecular weight: 18,000, acid value: 82.1 mgKOH/g)
B-5: Resin having the following structure (the numbers added to the main chain are the molar ratios of repeating units, weight average molecular weight 10,000, dispersity 2.0)
B-6: Resin having the following structure (the numbers added to the main chain are the molar ratios of repeating units, weight average molecular weight 8000, dispersity 1.8)
B-7: ARTON F4520 (manufactured by JSR Corporation, cyclic polyolefin resin)
B-8: EPICLON NM-695 (novolac type epoxy resin, manufactured by DIC Corporation)
B-10: Resin having the following structure (the number added to the main chain is the molar ratio of the repeating unit, weight average molecular weight 30,000).

(Polymerizable Monomer)
M-1: Compound having the following structure
M-2: Compound having the following structure
M-3: KAYARAD DPHA (a mixture of dipentaerythritol pentaacrylate and dipentaerythritol hexaacrylate, manufactured by Nippon Kayaku Co., Ltd.)
M-4: Compound having the following structure
M-5: A mixture of compounds having the following structure (containing 55 mol% to 63 mol% of the compound on the left)
M-6: A compound having the following structure.

(Photopolymerization initiator)
I-1 to I-9: Compounds having the following structures

(Surfactant)
F-1: FTX-218D (manufactured by Neos Co., Ltd., fluorine-based surfactant)
F-2: Megafac F-554 (manufactured by DIC Corporation, fluorosurfactant)
F-3: KF-6001 (manufactured by Shin-Etsu Chemical Co., Ltd., silicone-based surfactant)

(Polymerization inhibitor)
G-1: p-Methoxyphenol

(Antioxidants)
U-1 to U-3: Compounds having the following structures

(Ultraviolet absorber)
UV-1: Compound having the following structure

(Additive coloring material)
D-Pc-1 to D-Pc-3: Compounds having the following structures (phthalocyanine compounds, infrared absorbers)
D-M-1 to D-M-3: Compounds having the following structures (pentamethine compounds, infrared absorbers)
D-M-4: Compound having the following structure (diimmonium compound, infrared absorber)
D-S-1 to D-S-4: Compounds having the following structures (squarylium compounds, infrared absorbers)

(solvent)
S-1: Propylene glycol monomethyl ether acetate (PGMEA)

<Membrane Production>
(Production Example 1) Production method of films using the compositions of Examples 1-1 to 1-41 and Comparative Examples 1-1 and 1-2 Each composition was applied onto a glass substrate by spin coating, and then heated at 100° C. for 2 minutes using a hot plate to produce a film having a thickness of 1.0 μm.

(Production Example 2) Method for producing a film using the compositions of Examples 2-1 to 2-52 and Comparative Examples 2-1 and 2-2 Each composition was applied onto a glass substrate by spin coating, and then heated at 100°C for 2 minutes using a hot plate to obtain a composition layer. The obtained composition layer was exposed to light at an exposure dose of 500 mJ/ ^cm2 using an i-line stepper exposure device FPA-3000i5+ (Canon Corporation). Next, the exposed composition layer was heated at 200°C for 5 minutes using a hot plate to produce a film having a thickness of 1.0 μm.

(Production Example 3) Production method of films using the compositions of Examples 3-1 to 3-44 and Comparative Examples 3-1 and 3-2 Each composition was applied onto a glass substrate by spin coating, heated on a hot plate at 100° C. for 2 minutes, and then heated at 200° C. for 8 minutes to produce a film having a thickness of 1.0 μm.

<Evaluation of Spectral Characteristics>
The transmittance of each film was measured in the wavelength range of 400 to 1000 nm, and when all wavelengths were normalized with the maximum absorbance in the wavelength range of 700 to 1000 nm being 1.7, the spectral characteristics were evaluated as follows: A for average absorbance of less than 0.05 in the wavelength range of 400 to 550 nm, B for 0.05 or more but less than 0.1, and C for 0.1 or more.

<Evaluation of heat resistance>
The obtained film was subjected to a heat treatment for 5 minutes using a hot plate at 230° C. The spectral transmittance of the film was measured before and after the heat treatment, and the spectral variation rate ΔT was calculated according to the following formula, and the heat resistance was evaluated according to the following criteria.
Spectral fluctuation rate ΔT = ((T01-T11)/T01) x 100
T01: Transmittance at the maximum absorption wavelength (λa nm) of the film before heat treatment T11: Transmittance of the film after heat treatment, which is the transmittance at the wavelength (λa nm) at which T01 was measured -Evaluation Criteria-
A: The spectral fluctuation rate ΔT is less than 5%. B: The spectral fluctuation rate ΔT is 5% or more and less than 7%. C: The spectral fluctuation rate ΔT is 7% or more and less than 10%. D: The spectral fluctuation rate ΔT is 10% or more.

As shown in the table above, the examples had excellent spectral characteristics and were rated as having better heat resistance than the comparative examples.

<Production of infrared absorbing composition> (Examples 4-1 to 4-4)
Compositions 4-1 to 4-4 were prepared by mixing the materials shown in the table below.

(Dispersion)
R1, G1, B1, B2, Y1: the above-mentioned dispersions R1, G1, B1, B2, Y1

Membranes were produced according to Production Example 2 using Examples 4-1 to 4-4. The resulting films blocked light with wavelengths in the visible light region and transmitted at least a portion of light with wavelengths in the infrared region (infrared light). The heat resistance of the resulting films was evaluated using the same method as above, and all were rated A.

110: Solid-state image sensor, 111: Infrared cut filter, 112: Color filter, 114: Infrared transmission filter, 115: Microlens, 116: Flattening layer

Claims (11)

A composition comprising a compound represented by formula (1), a curable compound, and a solvent;
In formula (1), R ¹ represents -OR _a , -NR _b R _c or -SR _d ;
R _a and R _d each independently represent an alkyl group having a steric substituent constant -Es' of 0.40 or more, a cycloalkyl group having a steric substituent constant -Es' of 0.40 or more, an aryl group having a steric substituent constant -Es' of 0.40 or more, or a heteroaryl group having a steric substituent constant -Es' of 0.40 or more;
R _b and R _c each independently represent a hydrogen atom, an alkyl group, a cycloalkyl group, an aryl group, or a heteroaryl group, and R _b and R _c may be bonded to form a ring; provided that at least one of R _b and R _c is an alkyl group having a steric substituent constant -Es' of 0.40 or more, a cycloalkyl group having a steric substituent constant -Es' of 0.40 or more, an aryl group having a steric substituent constant -Es' of 0.40 or more, or a heteroaryl group having a steric substituent constant -Es' of 0.40 or more;
Het ¹ and Het ² each independently represent a heterocyclic group;
^R2 and ^R3 each independently represent a hydrogen atom or a substituent;
An represents a monovalent anion. The composition according to claim 1, wherein when either R _b or R _c is a hydrogen atom, the other is an alkyl group having a steric substituent constant -Es' of 1.05 or more, a cycloalkyl group having a steric substituent constant -Es' of 0.40 or more, an aryl group having a steric substituent constant -Es' of 2.50 or more, or a heteroaryl group having a steric substituent constant -Es' of 2.50 or more. The composition according to claim 1, wherein the compound represented by formula (1) is a compound represented by formula (2):
In formula (2), R ¹ represents -OR _a , -NR _b R _c or -SR _d ;
R _a and R _d each independently represent an alkyl group having a steric substituent constant -Es' of 0.40 or more, a cycloalkyl group having a steric substituent constant -Es' of 0.40 or more, an aryl group having a steric substituent constant -Es' of 0.40 or more, or a heteroaryl group having a steric substituent constant -Es' of 0.40 or more;
R _b and R _c each independently represent a hydrogen atom, an alkyl group, a cycloalkyl group, an aryl group, or a heteroaryl group, and R _b and R _c may be bonded to form a ring; provided that at least one of R _b and R _c is an alkyl group having a steric substituent constant -Es' of 0.40 or more, a cycloalkyl group having a steric substituent constant -Es' of 0.40 or more, an aryl group having a steric substituent constant -Es' of 0.40 or more, or a heteroaryl group having a steric substituent constant -Es' of 0.40 or more;
X ¹ and X ² each independently represent O, NR ^x , S, Se, or Te, where R ^x represents a hydrogen atom or a substituent;
R ² to R ¹⁵ each independently represent a hydrogen atom or a substituent, and adjacent two of R ⁴ to R ¹⁵ may be bonded to form a ring;
An represents a monovalent anion. The composition according to claim 1 or 2, further comprising at least one selected from an antioxidant and an ultraviolet absorber. A film obtained using the composition according to claim 1 or 2. An optical filter having the film according to claim 5. A solid-state imaging device having the film according to claim 5. An image display device having the film according to claim 5. An infrared sensor having the film according to claim 5. A camera module having the film according to claim 5. A compound represented by formula (1a):
In formula (1a), R ¹ represents -OR _a , -NR _b R _c or -SR _d ;
R _a and R _d each independently represent an alkyl group having a steric substituent constant -Es' of 0.40 or more, a cycloalkyl group having a steric substituent constant -Es' of 0.40 or more, an aryl group having a steric substituent constant -Es' of 0.40 or more, or a heteroaryl group having a steric substituent constant -Es' of 0.40 or more;
R _b and R _c each independently represent a hydrogen atom, an alkyl group, a cycloalkyl group, an aryl group, or a heteroaryl group, and R _b and R _c may be bonded to form a ring; provided that at least one of R _b and R _c is an alkyl group having a steric substituent constant -Es' of 0.40 or more, a cycloalkyl group having a steric substituent constant -Es' of 0.40 or more, an aryl group having a steric substituent constant -Es' of 0.40 or more, or a heteroaryl group having a steric substituent constant -Es' of 0.40 or more, and when one of R _b and R _c is a hydrogen atom, the other is an alkyl group having a steric substituent constant -Es' of 1.05 or more, a cycloalkyl group having a steric substituent constant -Es' of 0.40 or more, an aryl group having a steric substituent constant -Es' of 2.50 or more, or a heteroaryl group having a steric substituent constant -Es' of 2.50 or more;
Het ¹ and Het ² each independently represent a heterocyclic group;
^R2 and ^R3 each independently represent a hydrogen atom or a substituent;
An represents a monovalent anion.