WO2024248470A1 - Method for manufacturing aluminum nitride - Google Patents
Method for manufacturing aluminum nitride Download PDFInfo
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- WO2024248470A1 WO2024248470A1 PCT/KR2024/007293 KR2024007293W WO2024248470A1 WO 2024248470 A1 WO2024248470 A1 WO 2024248470A1 KR 2024007293 W KR2024007293 W KR 2024007293W WO 2024248470 A1 WO2024248470 A1 WO 2024248470A1
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- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B21/00—Nitrogen; Compounds thereof
- C01B21/06—Binary compounds of nitrogen with metals, with silicon, or with boron, or with carbon, i.e. nitrides; Compounds of nitrogen with more than one metal, silicon or boron
- C01B21/072—Binary compounds of nitrogen with metals, with silicon, or with boron, or with carbon, i.e. nitrides; Compounds of nitrogen with more than one metal, silicon or boron with aluminium
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- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2004/00—Particle morphology
- C01P2004/60—Particles characterised by their size
- C01P2004/62—Submicrometer sized, i.e. from 0.1-1 micrometer
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- the present invention relates to a method for producing aluminum nitride.
- the present invention provides a method capable of producing aluminum nitride at a low process temperature.
- Aluminum nitride is a solid nitride of aluminum. It has a thermal conductivity of up to 321 W/(m K), which is more than 10 times that of alumina, and an electrical conductivity of 10 -11 to 10 -13 ⁇ -1 ⁇ cm -1 . Because aluminum nitride has excellent thermal conductivity and electrical insulation, it is widely used as an electronic device material and a heat dissipation material.
- the carbothermal reduction method is a method in which Al2O3 , C( CH4 ), and N2 are reacted to produce AlN and CO
- the chemical vapor synthesis method is a method in which AlCl3 and NH3 are reacted using a chemical vapor method to produce AlN and NH4 Cl
- the plasma synthesis method is a method in which AlN is produced by striking the target aluminum metal with plasma in an ammonia or nitrogen atmosphere.
- All of the conventional manufacturing methods have the disadvantages of being difficult to meet process conditions and high manufacturing costs because they are all performed at temperatures close to or higher than 1000°C.
- 6345533 a prior art document, discloses a method for producing aluminum nitride by reducing alumina granules by a reduction method, but it is not suitable for obtaining high-purity aluminum nitride and has the same problem as the prior art in that it reacts by heating at a high temperature of 1580 to 1900°C.
- the purpose of the present invention is to provide a manufacturing method capable of manufacturing aluminum nitride at a low temperature.
- the present invention can produce high-purity, fine powder-form aluminum nitride.
- the present invention can reduce the amount of energy used and the amount of carbon generated when manufacturing aluminum nitride.
- the present invention can reduce manufacturing costs.
- a method for manufacturing aluminum nitride according to an embodiment of the present invention comprises the steps of: preparing AlH 3 powder; heating the AlH 3 powder to less than 1000° C. in an N 2 atmosphere; and cooling AlN powder formed by heating the AlH 3 powder.
- the heating temperature can be 600 to 900 °C.
- the above heating step can be performed in an N 2 atmosphere in which the concentration of moisture and oxygen is maintained at 100 ppm or less.
- the step of preparing AlH 3 powder may include a step of dissolving AlCl 3 and LiAlH 4 in a solvent and reacting them; a step of removing a precipitate produced by the reaction from the solution; and a step of producing AlH 3 powder while supplying an inert gas to the solution from which the precipitate has been removed.
- a method for producing aluminum nitride according to an embodiment of the present invention can produce aluminum nitride at a low temperature.
- the present invention can produce high-purity, fine powder-form aluminum nitride.
- the present invention can reduce the amount of energy used and the amount of carbon generated when manufacturing aluminum nitride.
- the present invention can reduce manufacturing costs.
- Figure 1 shows the results of XRD analysis of AlH 3 powder manufactured according to an embodiment of the present invention.
- Figures 2 to 4 show the XRD analysis results of AlN powder manufactured according to an embodiment of the present invention.
- Figure 5 is a SEM photograph of the AlN powder of Example 3.
- Figure 6 is the result of XRD analysis before heat treatment of Al powder, which is comparative example 1 of the present invention.
- Figure 7 shows the results of XRD analysis after heat treatment of Al powder, which is comparative example 1 of the present invention.
- Fig. 8(a) is a photograph of the AlN powder of Comparative Example 1 (after heat treatment)
- Fig. 8(b) is a SEM photograph of Comparative Example 1 (after heat treatment).
- a method for manufacturing aluminum nitride according to an embodiment of the present invention comprises the steps of: preparing AlH 3 powder; heating the AlH 3 powder to less than 1000° C. in an N 2 atmosphere; and cooling AlN powder formed by heating the AlH 3 powder.
- the AlH 3 powder prepared may be fine and high in purity.
- the AlH 3 powder may be prepared by solution reaction of AlCl 3 and LiAlH 4 .
- the AlH 3 powder may have an average particle size of several to several hundred ⁇ m, preferably 1 to 10 ⁇ m.
- the method for manufacturing AlH 3 powder in this step may include a step of dissolving AlCl 3 and LiAlH 4 in a solvent and reacting them; a step of removing a precipitate produced by the reaction from the solution; and a step of producing AlH 3 powder while supplying an inert gas to the solution from which the precipitate has been removed.
- AlCl 3 and LiAlH 4 are in powder form and can be added at a molar ratio of 1:3, and preferably, LiAlH 4 can be added so that the molar ratio of AlCl 3 exceeds 1:3.
- the solvent can be used in an amount that AlCl 3 and LiAlH 4 can sufficiently dissolve.
- the solvent is not particularly limited as long as it can dissolve AlCl 3 and LiAlH 4 , and preferably, it can be an organic solvent.
- the solvent can be dibutyl ether.
- This step can be performed by various mixers, stirrers, etc., and can be performed at room temperature. In this step, AlCl 3 and LiAlH 4 react to generate AlH 3 and LiCl, and LiCl can be precipitated as a solid.
- the step of removing the precipitate produced by the reaction from the above solution is a step of removing LiCl and other byproducts. Filtering in this step can apply various filtering or precipitation methods used in the relevant field and is not particularly limited. In one embodiment, this step can be performed by passing the solution through a filter made of paper or fiber.
- the step of producing the above AlH 3 powder can be performed by various processes, but can be performed while supplying an inert gas such as N 2 or Ar in order to produce high-purity AlH 3 powder.
- an inert gas such as N 2 or Ar
- the inert gas can be supplied heated to a temperature of 200° C. or lower, preferably 30 to 50° C.
- the temperature of the inert gas exceeds 200° C., some of the produced AlH 3 powder is decomposed into Al and H 2 again, which causes a problem in that the purity of the AlH 3 powder is lowered.
- the produced AlH 3 powder can be obtained through filtering.
- the step of generating the AlH 3 powder can be performed by placing the solution in which AlH 3 is generated into a reactor, and a condenser can be installed in the reactor to prevent AlH 3 in the solution from being evaporated and lost or from being exposed to the external environment and reacting.
- the inert gas can be supplied in the form of bubbles to the solution in which AlH 3 is generated, and the average particle size of the bubbles can be supplied in the form of microbubbles or nanobubbles having a size of several tens of nanometers to several hundred micrometers. Through this, the bubbles can be evenly distributed throughout the solution in which AlH 3 is generated.
- a step of heating the prepared AlH 3 powder to less than 1000°C in a N 2 atmosphere is performed.
- This step causes the Al nucleus produced during the decomposition process of AlH 3 to react with N 2 , and causes the H 2 produced together during the decomposition process to first react with trace amounts of oxygen and moisture that may exist in the surroundings, thereby synthesizing high-purity AlN.
- the heating temperature in this step may be preferably 600 to 900°C, and more preferably 850 to 950°C.
- Al has very good reactivity with oxygen (O 2 ) and moisture (H 2 O)
- oxygen (O 2 ) and moisture (H 2 O) there is a problem that Al 2 O 3 and Al(OH) 3 compounds are formed even at room temperature if oxygen or moisture is present during the decomposition process of AlH 3 in the solution.
- an inert gas particularly a nitrogen (N 2 ) atmosphere
- N 2 nitrogen
- H 2 first reacts with a trace amount of oxygen or moisture contained in the supplied nitrogen (N 2 ) gas to prevent the Al nuclei from being oxidized or hydroxylated, and allows the Al nuclei to react with nitrogen (N 2 ) to synthesize high-purity AlN.
- the oxygen and moisture concentrations of the N 2 atmosphere in this step can be 100 ppm or less.
- AlH3 is decomposed in the process of being heated below 1000°C, generating Al nuclei and H2 .
- the Al nuclei are very small in size and have a large surface area, so that a reaction with the surrounding environment can occur very quickly. This can increase the reaction efficiency with N2 even at low temperatures, and thus dramatically reduce the amount of energy used in the production of AlN.
- N2 gas can be supplied at a flow rate of 0.5 to 2 l/min, the heating rate can be 3 to 10 °C/min, and the heating temperature can be maintained for 1 to 3 hours after reaching the temperature.
- the heated reactant can be cooled to obtain AlN.
- the cooling process can be performed by placing the heated reactant in a furnace and slowly cooling it, and is not particularly limited.
- Aluminum nitride manufactured through the above method is in powder form and may have an average particle diameter of several tens nm to several ⁇ m, and preferably, the average particle diameter of the powder may be 1 ⁇ m or less.
- the solution was poured onto a filter paper in a nitrogen chamber where the oxygen and moisture concentrations were maintained at 100 ppm or less, and the precipitated reactant was obtained.
- Isopropyl ether was poured onto the obtained precipitate to remove residual dibutyl ether, and the precipitate was washed and dried to obtain AlH 3 powder.
- the XRD of the AlH 3 powder manufactured in the manufacturing example was measured using X'pert pro MPD, and the results are shown in Fig. 1. Referring to Fig. 1, it can be confirmed that high-purity AlH 3 powder was manufactured.
- Example 1 1 g of the previously manufactured AlH 3 powder was placed in a ceramic container and placed in a heat treatment furnace capable of atmosphere control. N 2 gas was supplied to the heat treatment furnace at a rate of 1.0 ml/min, and the internal temperature was increased to 700°C at a rate of 5°C/min. After maintaining it in that state for 2 hours, the heat treatment furnace was allowed to cool gradually to cool the product, AlN.
- Example 2 AlN was manufactured in the same manner as in Example 1, except that the temperature of the heat treatment furnace was increased to 800°C.
- Example 3 AlN was manufactured in the same manner as in Example 1, except that the temperature of the heat treatment furnace was increased to 900°C.
- Comparative Example 1 AlN was manufactured in the same manner as in Example 3, except that Al powder having an average particle size of 5 ⁇ m was used instead of the previously manufactured AlH 3 powder.
- Example 3 The AlN of Example 3 and Comparative Example 1 were observed by SEM and with the naked eye.
- Fig. 5 is an SEM photograph of Example 3
- Fig. 8 is a general photograph (a) and an SEM photograph (b) of Comparative Example 1.
- Example 3 it can be confirmed that it was manufactured as a powder having an average particle diameter of 100 nm or less, and no clumping was observed even when observed with the naked eye.
- Comparative Example 1 As seen in Fig. 8, it can be seen that clumps were formed rather than powder.
- XRD analysis was performed on Examples 1 to 3 using X’pert pro MPD, and the results are shown in Figs. 2 to 4, respectively.
- XRD analysis was performed on the Al powder used in Comparative Example 1 before and after heat treatment, and the results are shown in Figs. 6 and 7, respectively.
- Example 1 Al was observed together with AlN, but in Example 2, the Al peak decreased, and in Example 3, the Al peak was not observed.
- Example 2 Al was observed together with AlN, but in Example 2, the Al peak decreased, and in Example 3, the Al peak was not observed.
- Example 3 the Al peak was not observed.
- AlN is generated by heating at 700°C, if the heating process is performed at a higher temperature, AlN with higher purity can be generated.
- Comparative Example 1 it was confirmed that AlN, Al, and other materials were present after heat treatment.
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Abstract
Description
본 발명은 질화알루미늄 제조방법에 관한 것이다. 본 발명은 낮은 공정 온도에서 질화알루미늄을 제조할 수 있는 방법을 제공한다.The present invention relates to a method for producing aluminum nitride. The present invention provides a method capable of producing aluminum nitride at a low process temperature.
질화알루미늄(AlN)은 알루미늄의 고체 질화물로서, 열전도율이 최대 321 W/(m·K)로서 알루미나의 10배 이상이고 전기전도도는 10-11 내지 10-13 Ω-1·cm-1이다. 이와 같이 질화알루미늄은 우수한 열전도성 및 전기절연성을 가지기 때문에 전자 소자 재료 및 방열 재료로 널리 사용되고 있다.Aluminum nitride (AlN) is a solid nitride of aluminum. It has a thermal conductivity of up to 321 W/(m K), which is more than 10 times that of alumina, and an electrical conductivity of 10 -11 to 10 -13 Ω -1 ·cm -1 . Because aluminum nitride has excellent thermal conductivity and electrical insulation, it is widely used as an electronic device material and a heat dissipation material.
질화알루미늄을 제조하는 방법에는 열탄소환원법, 화학기상합성법, 플라즈마합성법 등이 있다. 열탄소환원법은 Al2O3, C(CH4) 및 N2를 반응시켜 AlN과 CO를 생성하는 방법이고, 화학기상합성법은 화학기상법을 이용하며 AlCl3 및 NH3를 반응시켜 AlN 및 NH4Cl을 생성하는 방법이고, 플라즈마합성법은 암모니아 또는 질소 분위기에서 타겟인 알루미늄 금속을 플라즈마로 타격하여 AlN을 생성하는 방법이다. 종래의 제조방법은 모두 1000 ℃에 가깝거나 보다 높은 온도에서 수행하기 때문에 공정 조건을 충족하기 어렵고 제조 비용이 높은 단점이 있다. 선행기술문헌인 일본 등록특허공보 제6345533호는 알루미나 과립을 환원법에 의해 환원하여 질화알루미늄을 제조하는 방법을 개시하고 있으나, 고순도의 질화알루미늄을 얻는 데 적합하지 않고 1580 내지 1900 ℃의 높은 온도로 가열하여 반응하는 바, 종래 기술과 동일한 문제를 가지고 있다.There are several methods for manufacturing aluminum nitride , including carbothermal reduction, chemical vapor synthesis, and plasma synthesis. The carbothermal reduction method is a method in which Al2O3 , C( CH4 ), and N2 are reacted to produce AlN and CO, the chemical vapor synthesis method is a method in which AlCl3 and NH3 are reacted using a chemical vapor method to produce AlN and NH4 Cl, and the plasma synthesis method is a method in which AlN is produced by striking the target aluminum metal with plasma in an ammonia or nitrogen atmosphere. All of the conventional manufacturing methods have the disadvantages of being difficult to meet process conditions and high manufacturing costs because they are all performed at temperatures close to or higher than 1000℃. Japanese Patent Publication No. 6345533, a prior art document, discloses a method for producing aluminum nitride by reducing alumina granules by a reduction method, but it is not suitable for obtaining high-purity aluminum nitride and has the same problem as the prior art in that it reacts by heating at a high temperature of 1580 to 1900°C.
본 발명은 낮은 온도에서 질화알루미늄을 제조할 수 있는 제조방법을 제공함을 목적으로 한다.The purpose of the present invention is to provide a manufacturing method capable of manufacturing aluminum nitride at a low temperature.
또한, 본 발명은 고순도의 미세한 분말 형태의 질화알루미늄을 제조할 수 있다.In addition, the present invention can produce high-purity, fine powder-form aluminum nitride.
또한, 본 발명은 질화알루미늄 제조시 사용하는 에너지량 및 발생하는 탄소량을 줄일 수 있다.In addition, the present invention can reduce the amount of energy used and the amount of carbon generated when manufacturing aluminum nitride.
또한, 본 발명은 제조 비용을 낮출 수 있다.Additionally, the present invention can reduce manufacturing costs.
본 발명의 실시예를 따르는 질화알루미늄 제조방법은, AlH3 분말을 준비하는 단계; 상기 AlH3 분말을 N2 분위기에서 1000 ℃ 미만으로 가열하는 단계 및 상기 AlH3 분말을 가열하여 형성된 AlN 분말을 냉각하는 단계를 포함한다.A method for manufacturing aluminum nitride according to an embodiment of the present invention comprises the steps of: preparing AlH 3 powder; heating the AlH 3 powder to less than 1000° C. in an N 2 atmosphere; and cooling AlN powder formed by heating the AlH 3 powder.
상기 가열하는 단계에서 가열온도는 600 내지 900 ℃일 수 있다.In the above heating step, the heating temperature can be 600 to 900 ℃.
상기 가열하는 단계는 수분 및 산소의 농도가 100 ppm 이하로 유지되는 N2 분위기에서 수행할 수 있다.The above heating step can be performed in an N 2 atmosphere in which the concentration of moisture and oxygen is maintained at 100 ppm or less.
AlH3 분말을 준비하는 단계는, AlCl3 및 LiAlH4을 용매에 용해하여 반응하는 단계; 상기 용액으로부터 반응에 의해 생성된 석출물을 제거하는 단계; 및 상기 석출물이 제거된 용액에 불활성 가스를 공급하면서 AlH3 분말을 생성하는 단계;를 포함할 수 있다.The step of preparing AlH 3 powder may include a step of dissolving AlCl 3 and LiAlH 4 in a solvent and reacting them; a step of removing a precipitate produced by the reaction from the solution; and a step of producing AlH 3 powder while supplying an inert gas to the solution from which the precipitate has been removed.
본 발명의 실시예를 따르는 질화알루미늄의 제조방법은 낮은 온도에서 질화알루미늄을 제조할 수 있다.A method for producing aluminum nitride according to an embodiment of the present invention can produce aluminum nitride at a low temperature.
또한, 본 발명은 고순도의 미세한 분말 형태의 질화알루미늄을 제조할 수 있다.In addition, the present invention can produce high-purity, fine powder-form aluminum nitride.
또한, 본 발명은 질화알루미늄 제조시 사용하는 에너지량 및 발생하는 탄소량을 줄일 수 있다.In addition, the present invention can reduce the amount of energy used and the amount of carbon generated when manufacturing aluminum nitride.
또한, 본 발명은 제조 비용을 낮출 수 있다.Additionally, the present invention can reduce manufacturing costs.
도 1은 본 발명의 실시예에 따라 제조한 AlH3 분말의 XRD 분석 결과이다.Figure 1 shows the results of XRD analysis of AlH 3 powder manufactured according to an embodiment of the present invention.
도 2 내지 도 4는 본 발명의 실시예에 따라 제조한 AlN 분말 XRD 분석 결과이다.Figures 2 to 4 show the XRD analysis results of AlN powder manufactured according to an embodiment of the present invention.
도 5는 실시예3의 AlN 분말의 SEM 사진이다.Figure 5 is a SEM photograph of the AlN powder of Example 3.
도 6은 본 발명의 비교예1인 Al분말의 열처리 전 XRD 분석 결과이다.Figure 6 is the result of XRD analysis before heat treatment of Al powder, which is comparative example 1 of the present invention.
도 7은 본 발명의 비교예1인 Al분말의 열처리 후 XRD 분석 결과이다.Figure 7 shows the results of XRD analysis after heat treatment of Al powder, which is comparative example 1 of the present invention.
도 8(a)는 비교예1(열처리 후)의 AlN 분말의 사진이고, 도 8(b)는 비교예1(열처리후)의 SEM 사진이다.Fig. 8(a) is a photograph of the AlN powder of Comparative Example 1 (after heat treatment), and Fig. 8(b) is a SEM photograph of Comparative Example 1 (after heat treatment).
이하, 첨부된 도면을 참조하여 본 발명의 바람직한 실시 형태들을 다음과 같이 설명한다. 그러나, 본 발명의 실시 형태는 여러 가지 다른 형태로 변형될 수 있으며, 본 발명의 범위가 이하 설명하는 실시 형태로 한정되는 것은 아니다. 또한, 본 발명의 실시 형태는 당해 기술분야에서 평균적인 지식을 가진 자에게 본 발명을 더욱 완전하게 설명하기 위해서 제공되는 것이다. 명세서 전체에서 어떤 구성요소를 "포함"한다는 것은 특별히 반대되는 기재가 없는 한 다른 구성요소를 제외하는 것이 아니라 다른 구성요소를 더 포함할 수 있다는 것을 의미한다.Hereinafter, preferred embodiments of the present invention will be described with reference to the attached drawings. However, the embodiments of the present invention may be modified in various other forms, and the scope of the present invention is not limited to the embodiments described below. In addition, the embodiments of the present invention are provided so that a person having average knowledge in the relevant technical field can more completely explain the present invention. Throughout the specification, the term "including" a certain component does not exclude other components, but rather means that other components can be further included, unless specifically stated otherwise.
본 발명의 실시예를 따르는 질화알루미늄 제조방법은, AlH3 분말을 준비하는 단계; 상기 AlH3 분말을 N2 분위기에서 1000 ℃ 미만으로 가열하는 단계 및 상기 AlH3 분말을 가열하여 형성된 AlN 분말을 냉각하는 단계를 포함한다.A method for manufacturing aluminum nitride according to an embodiment of the present invention comprises the steps of: preparing AlH 3 powder; heating the AlH 3 powder to less than 1000° C. in an N 2 atmosphere; and cooling AlN powder formed by heating the AlH 3 powder.
상기 AlH3 분말을 준비하는 단계에서 준비하는 AlH3 분말은 미세하고 순도가 높은 것일 수 있다. 일 실시예에서 AlH3 분말은 AlCl3 및 LiAlH4을 용액 반응하여 제조한 것일 수 있다. 이와 같이 제조한 AlH3 분말을 사용함으로써 낮은 온도에서도 고순도의 AlN 분말을 제조할 수 있다. 상기 AlH3 분말은 입자의 평균 입도가 수 내지 수백 µm, 바람직하게는 1 내지 10 µm일 수 있다.In the step of preparing the AlH 3 powder, the AlH 3 powder prepared may be fine and high in purity. In one embodiment, the AlH 3 powder may be prepared by solution reaction of AlCl 3 and LiAlH 4 . By using the AlH 3 powder prepared in this manner, high-purity AlN powder can be prepared even at a low temperature. The AlH 3 powder may have an average particle size of several to several hundred µm, preferably 1 to 10 µm.
본 단계에서 AlH3 분말을 제조하는 방법은 AlCl3 및 LiAlH4을 용매에 용해하여 반응하는 단계; 상기 용액으로부터 반응에 의해 생성된 석출물을 제거하는 단계; 및 상기 석출물이 제거된 용액에 불활성 가스를 공급하면서 AlH3 분말을 생성하는 단계;를 포함할 수 있다.The method for manufacturing AlH 3 powder in this step may include a step of dissolving AlCl 3 and LiAlH 4 in a solvent and reacting them; a step of removing a precipitate produced by the reaction from the solution; and a step of producing AlH 3 powder while supplying an inert gas to the solution from which the precipitate has been removed.
상기 AlCl3 및 LiAlH4을 용매에 용해하여 반응하는 단계에서 AlCl3 및 LiAlH4는 분말 형태이며 1:3의 몰비로 첨가될 수 있고, 바람직하게는 LiAlH4를 AlCl3에 대한 몰비가 1:3을 초과하도록 첨가할 수 있다. 용매는 AlCl3 및 LiAlH4가 충분히 용해될 수 있는 정도의 양을 사용할 수 있다. 상기 용매는 AlCl3 및 LiAlH4를 용해할 수 있는 것이면 특별히 제한하지 않으며, 바람직하게는 유기 용매일 수 있다. 일 실시예에서, 상기 용매는 디부틸에테르(Dibutyl ether)일 수 있다. 본 단계는 다양한 혼합기, 교반기 등에 의해 수행할 수 있으며, 상온에서 수행할 수 있다. 본 단계에서 AlCl3 및 LiAlH4가 반응함으로써 AlH3 및 LiCl이 생성되며, LiCl은 고형물로 석출될 수 있다.In the step of dissolving AlCl 3 and LiAlH 4 in a solvent and reacting them, AlCl 3 and LiAlH 4 are in powder form and can be added at a molar ratio of 1:3, and preferably, LiAlH 4 can be added so that the molar ratio of AlCl 3 exceeds 1:3. The solvent can be used in an amount that AlCl 3 and LiAlH 4 can sufficiently dissolve. The solvent is not particularly limited as long as it can dissolve AlCl 3 and LiAlH 4 , and preferably, it can be an organic solvent. In one embodiment, the solvent can be dibutyl ether. This step can be performed by various mixers, stirrers, etc., and can be performed at room temperature. In this step, AlCl 3 and LiAlH 4 react to generate AlH 3 and LiCl, and LiCl can be precipitated as a solid.
상기 용액으로부터 반응에 의해 생성된 석출물을 제거하는 단계는 LiCl 및 기타 부산물을 제거하는 단계이다. 본 단계에서 필터링은 해당 분야에서 사용하는 다양한 필터링 또는 석출법을 적용할 수 있으며 특별히 제한하지 않는다. 일 실시예에서, 본 단계는 종이 또는 섬유로 된 여과지에 상기 용액을 통과함으로써 수행할 수 있다.The step of removing the precipitate produced by the reaction from the above solution is a step of removing LiCl and other byproducts. Filtering in this step can apply various filtering or precipitation methods used in the relevant field and is not particularly limited. In one embodiment, this step can be performed by passing the solution through a filter made of paper or fiber.
상기 AlH3 분말을 생성하는 단계는 다양한 공정에 의해 수행할 수 있으나, 고순도의 AlH3 분말을 제조하기 위해 N2나 Ar 등의 불활성 가스를 공급하면서 수행할 수 있다. 이는 용매에 녹아 있는 AlH3가 수분 및 산소와 급격하게 반응할 수 있기 때문이다. 상기 불활성 가스는 200 ℃ 이하, 바람직하게는 30 내지 50 ℃의 온도로 가열된 것을 공급할 수 있다. 상기 불활성 가스의 온도가 200 ℃를 초과하는 경우에는 생성된 AlH3 분말 중 일부가 다시 Al 및 H2로 분해되어 AlH3 분말의 순도가 낮아지는 문제가 있다. 생성된 AlH3 분말은 필터링을 통해 수득할 수 있다.The step of producing the above AlH 3 powder can be performed by various processes, but can be performed while supplying an inert gas such as N 2 or Ar in order to produce high-purity AlH 3 powder. This is because AlH 3 dissolved in a solvent can react rapidly with moisture and oxygen. The inert gas can be supplied heated to a temperature of 200° C. or lower, preferably 30 to 50° C. When the temperature of the inert gas exceeds 200° C., some of the produced AlH 3 powder is decomposed into Al and H 2 again, which causes a problem in that the purity of the AlH 3 powder is lowered. The produced AlH 3 powder can be obtained through filtering.
일 실시예에서, 상기 AlH3 분말을 생성하는 단계는 AlH3이 생성된 용액을 반응기에 넣고 수행할 수 있고, 상기 반응기에는 응축기를 설치하여 용액 내의 AlH3가 증발하여 소실되거나 외부 환경에 노출되어 반응하는 것을 방지할 수 있다. 이 경우, 불활성 가스는 상기 AlH3이 생성된 용액에 기포 형태로 공급할 수 있으며, 기포의 평균 입경이 수십 나노 내지 수백 마이크로 크기의 마이크로 버블 또는 나노 버블 형태로 공급할 수 있다. 이를 통해 AlH3이 생성된 용액 전체에 고르게 기포를 분산할 수 있다.In one embodiment, the step of generating the AlH 3 powder can be performed by placing the solution in which AlH 3 is generated into a reactor, and a condenser can be installed in the reactor to prevent AlH 3 in the solution from being evaporated and lost or from being exposed to the external environment and reacting. In this case, the inert gas can be supplied in the form of bubbles to the solution in which AlH 3 is generated, and the average particle size of the bubbles can be supplied in the form of microbubbles or nanobubbles having a size of several tens of nanometers to several hundred micrometers. Through this, the bubbles can be evenly distributed throughout the solution in which AlH 3 is generated.
다음으로, 준비된 AlH3 분말을 N2 분위기에서 1000 ℃ 미만으로 가열하는 단계를 수행한다. 본 단계는 AlH3가 분해되는 과정에서 만들어지는 Al 핵이 N2와 반응하도록 하며, 분해과정에서 함께 생성되는 H2가 주변에 존재할 수 있는 미량의 산소 및 수분과 먼저 반응하도록 하여 높은 순도의 AlN이 합성되도록 한다. 본 단계에서 가열 온도는 바람직하게는 600 내지 900 ℃일 수 있고, 보다 바람직하게는 850 내지 950 ℃일 수 있다.Next, a step of heating the prepared AlH 3 powder to less than 1000°C in a N 2 atmosphere is performed. This step causes the Al nucleus produced during the decomposition process of AlH 3 to react with N 2 , and causes the H 2 produced together during the decomposition process to first react with trace amounts of oxygen and moisture that may exist in the surroundings, thereby synthesizing high-purity AlN. The heating temperature in this step may be preferably 600 to 900°C, and more preferably 850 to 950°C.
Al은 산소(O2)와 수분(H2O)와 반응성이 매우 좋기 때문에 상기 용액 상의 AlH3가 분해되는 과정에서 산소 또는 수분이 존재하면 상온에서도 각각 Al2O3 및 Al(OH)3 화합물을 형성하는 문제가 있다. 이 경우, 불활성 가스, 특히 질소(N2) 분위기를 형성하면 분해되는 과정에서 만들어진 Al 핵이 산소 또는 수분과 반응하지 않아 용액 상에 Al 핵과 H2로 존재하게 되며, 여기서 H2는 공급되는 질소(N2) 가스에 함유된 미량의 산소 내지 수분과 반응을 먼저 하여 Al 핵이 산화 내지 수산화되는 과정을 막아주고, Al 핵이 질소(N2)와 반응하여 높은 순도의 AlN이 합성되도록 할 수 있다. 바람직하게 본 단계에서 N2 분위기의 산소 및 수분 농도는 100 ppm 이하일 수 있다.Since Al has very good reactivity with oxygen (O 2 ) and moisture (H 2 O), there is a problem that Al 2 O 3 and Al(OH) 3 compounds are formed even at room temperature if oxygen or moisture is present during the decomposition process of AlH 3 in the solution. In this case, if an inert gas, particularly a nitrogen (N 2 ) atmosphere, is formed, the Al nucleus created during the decomposition process does not react with oxygen or moisture, so that it exists as Al nuclei and H 2 in the solution. Here, H 2 first reacts with a trace amount of oxygen or moisture contained in the supplied nitrogen (N 2 ) gas to prevent the Al nuclei from being oxidized or hydroxylated, and allows the Al nuclei to react with nitrogen (N 2 ) to synthesize high-purity AlN. Preferably, the oxygen and moisture concentrations of the N 2 atmosphere in this step can be 100 ppm or less.
본 단계에서의 반응을 보다 구체적으로 설명하면, AlH3은 1000℃ 이하로 가열되는 과정에서 분해되어 Al 핵과 H2가 생성된다. 상기 Al 핵은 크기가 매우 작고 표면적이 넓어 주변 환경과의 반응이 매우 빠르게 발생될 수 있다. 이를 통해 낮은 온도에서도 N2와의 반응 효율을 높일 수 있는 바, AlN의 제조에 사용되는 에너지양을 극적으로 절감할 수 있다.To explain the reaction in this step more specifically, AlH3 is decomposed in the process of being heated below 1000℃, generating Al nuclei and H2 . The Al nuclei are very small in size and have a large surface area, so that a reaction with the surrounding environment can occur very quickly. This can increase the reaction efficiency with N2 even at low temperatures, and thus dramatically reduce the amount of energy used in the production of AlN.
본 단계에서 N2 가스는 0.5 내지 2 l/min의 유량으로 공급할 수 있고, 승온 속도는 3 내지 10 ℃/min일 수 있으며, 가열 온도에 다다른 후 1 내지 3 시간동안 유지할 수 있다.At this stage, N2 gas can be supplied at a flow rate of 0.5 to 2 l/min, the heating rate can be 3 to 10 ℃/min, and the heating temperature can be maintained for 1 to 3 hours after reaching the temperature.
다음으로, 가열된 반응물을 냉각하여 AlN을 수득할 수 있다. 상기 냉각 공정은 가열된 반응물을 가열로에서 두고 서서히 냉각하여 수행할 수 있으며, 특별히 제한하지 않는다.Next, the heated reactant can be cooled to obtain AlN. The cooling process can be performed by placing the heated reactant in a furnace and slowly cooling it, and is not particularly limited.
상기 방법을 통해 제조된 질화알루미늄은 분말 형태이며, 평균 입경이 수십 nm 내지 수 µm일 수 있으며, 바람직하게는 분말의 평균 입경이 1 µm 이하일 수 있다.Aluminum nitride manufactured through the above method is in powder form and may have an average particle diameter of several tens nm to several µm, and preferably, the average particle diameter of the powder may be 1 µm or less.
제조예: AlH3 분말의 제조Manufacturing Example: Manufacturing of AlH 3 Powder
디부틸에테르(Dibutyl ether) 300 ml에 AlCl3 및 LiAlH4을 각각 8 g 씩 첨가하여 상온에서 1 시간 동안 교반하였다. 교반을 완료한 후 부산물을 필터에 여과하여 제거하고 맑은 용액 부분만 취하였다. 상기 용액을 3구플라스크에 옮겨 담고 한쪽 입구에는 N2 가스 주입관을 연결하고, 다른 한쪽 입구에는 용매증발응축을 유도하는 환류냉각기를 연결하였고, 마지막 입구는 고무마게로 막았다. 3구플라스크에 40 ℃로 가열한 N2 가스를 100 ml/min의 속도로 주입하였고, 4 시간 동안 반응하였다. 반응이 완료된 후, 산소 및 수분 농도가 100 ppm 이하로 유지되는 질소 챔버 내에서 용액을 여과지에 부어 석출된 반응물을 수득하였다. 수득한 석출물에 이소프로필에테르(Iso-propyl ether)를 부어 잔류 디부틸에테르를 제거하였고, 석출물을 세척한 후 건조하여 AlH3 분말을 수득하였다.AlCl 3 and LiAlH 4 (8 g each) were added to 300 ml of dibutyl ether, and the mixture was stirred at room temperature for 1 hour. After stirring, the by-products were filtered out and only the clear solution was taken. The solution was transferred to a three-necked flask, and a N 2 gas inlet tube was connected to one inlet, a reflux condenser for inducing solvent evaporation and condensation was connected to the other inlet, and the final inlet was blocked with a rubber stopper. N 2 gas heated to 40 ℃ was injected at a rate of 100 ml/min into the three-necked flask, and the reaction was performed for 4 hours. After the reaction was completed, the solution was poured onto a filter paper in a nitrogen chamber where the oxygen and moisture concentrations were maintained at 100 ppm or less, and the precipitated reactant was obtained. Isopropyl ether was poured onto the obtained precipitate to remove residual dibutyl ether, and the precipitate was washed and dried to obtain AlH 3 powder.
실험예: AlH3 분말의 XRD 분석Experimental Example: XRD Analysis of AlH 3 Powder
X’pert pro MPD를 이용하여 제조예에서 제조한 AlH3 분말의 XRD를 측정하였고, 그 결과를 도 1에 도시하였다. 도 1을 참조하면, 고순도의 AlH3 분말이 제조된 것을 확인할 수 있다.The XRD of the AlH 3 powder manufactured in the manufacturing example was measured using X'pert pro MPD, and the results are shown in Fig. 1. Referring to Fig. 1, it can be confirmed that high-purity AlH 3 powder was manufactured.
제조예: AlN 분말의 제조Manufacturing Example: Manufacturing of AlN Powder
실시예1: 앞서 제조한 AlH3 분말 1 g을 세라믹 용기에 담고 분위기 제어가 가능한 열처리로에 넣었다. 상기 열처리로에 N2 가스를 1.0 ml/min의 속도로 공급하였고, 내부 온도를 5 ℃/min의 속도로 700 ℃까지 승온하였다. 그 상태로 2 시간을 유지한 후 상기 열처리로가 서서히 냉각하도록 두어 생성물인 AlN을 냉각하였다.Example 1: 1 g of the previously manufactured AlH 3 powder was placed in a ceramic container and placed in a heat treatment furnace capable of atmosphere control. N 2 gas was supplied to the heat treatment furnace at a rate of 1.0 ml/min, and the internal temperature was increased to 700°C at a rate of 5°C/min. After maintaining it in that state for 2 hours, the heat treatment furnace was allowed to cool gradually to cool the product, AlN.
실시예2: 열처리로의 온도를 800 ℃까지 승온한 것을 제외하고는 실시예1과 동일하게 AlN을 제조하였다.Example 2: AlN was manufactured in the same manner as in Example 1, except that the temperature of the heat treatment furnace was increased to 800°C.
실시예3: 열처리로의 온도를 900 ℃까지 승온한 것을 제외하고는 실시예1과 동일하게 AlN을 제조하였다.Example 3: AlN was manufactured in the same manner as in Example 1, except that the temperature of the heat treatment furnace was increased to 900°C.
비교예1: 앞서 제조한 AlH3 분말 대신 평균 입경이 5 µm인 Al 분말을 이용한 것을 제외하고는 실시예3과 동일하게 AlN을 제조하였다.Comparative Example 1: AlN was manufactured in the same manner as in Example 3, except that Al powder having an average particle size of 5 µm was used instead of the previously manufactured AlH 3 powder.
실험예: AlN의 SEM 및 육안관찰Experimental Example: SEM and Visual Observation of AlN
실시예3 및 비교예1의 AlN을 SEM 및 육안으로 관찰하였다. 도 5는 실시예3의 SEM 사진이고, 도 8은 비교예1의 일반사진(a) 및 SEM 사진(b)이다. 실시예3의 경우 평균 입경이 100 nm이하인 분말로 제조된 것을 확인할 수 있으며, 육안으로 관찰시에도 뭉침이 관찰되지 않았다. 비교예1의 경우 도 8에서 보는 바와 같이 분말로 생성되지 않고 덩어리가 생성된 것을 알 수 있다.The AlN of Example 3 and Comparative Example 1 were observed by SEM and with the naked eye. Fig. 5 is an SEM photograph of Example 3, and Fig. 8 is a general photograph (a) and an SEM photograph (b) of Comparative Example 1. In the case of Example 3, it can be confirmed that it was manufactured as a powder having an average particle diameter of 100 nm or less, and no clumping was observed even when observed with the naked eye. In the case of Comparative Example 1, as seen in Fig. 8, it can be seen that clumps were formed rather than powder.
실험예: AlN의 XRD 분석Experimental Example: XRD Analysis of AlN
X’pert pro MPD를 이용하여 실시예1 내지 3에 대하여 XRD 분석을 수행하였으며, 그 결과를 각각 도 2 내지 4에 도시하였다. 또한, 비교예1로 사용된 Al분말에 대하여 열처리 전과 열처리 후에 대하여 XRD 분석을 수행하였으며, 그 결과를 각각 도 6 및 도 7에 도시하였다.XRD analysis was performed on Examples 1 to 3 using X’pert pro MPD, and the results are shown in Figs. 2 to 4, respectively. In addition, XRD analysis was performed on the Al powder used in Comparative Example 1 before and after heat treatment, and the results are shown in Figs. 6 and 7, respectively.
실시예1에서는 AlN과 함께 Al이 관찰되었으나, 실시예2에서 Al 피크(peak)가 감소하였고, 실시예3에서는 Al 피크가 관찰되지 않았다. 이를 통해 700 ℃에서 가열하여 AlN이 생성되지만, 온도가 보다 높은 가열공정을 진행하는 경우 보다 순도가 높은 AlN을 생성할 수 있음을 알 수 있다. 특히, 900 ℃로 가열하는 경우 AlN만을 수득할 수 있음을 알 수 있다. 비교예1의 경우 열처리 후에 AlN, Al 및 기타 물질이 존재함을 확인하였다.In Example 1, Al was observed together with AlN, but in Example 2, the Al peak decreased, and in Example 3, the Al peak was not observed. Through this, it can be seen that although AlN is generated by heating at 700°C, if the heating process is performed at a higher temperature, AlN with higher purity can be generated. In particular, it can be seen that only AlN can be obtained when heating to 900°C. In the case of Comparative Example 1, it was confirmed that AlN, Al, and other materials were present after heat treatment.
본 발명은 상술한 실시 형태 및 첨부된 도면에 의해 한정되는 것이 아니며 첨부된 청구범위에 의해 한정하고자 한다. 따라서, 청구범위에 기재된 본 발명의 기술적 사상을 벗어나지 않는 범위 내에서 해당 기술분야의 통상의 지식을 가진 자에 의해 다양한 형태의 치환, 변형 및 변경이 가능할 것이며, 이 또한 본 발명의 범위에 속한다고 할 것이다.The present invention is not limited to the above-described embodiments and the attached drawings, but is intended to be limited by the appended claims. Accordingly, various substitutions, modifications, and changes may be made by those skilled in the art within the scope that does not depart from the technical spirit of the present invention as described in the claims, and this will also fall within the scope of the present invention.
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| JPH0466807B2 (en) * | 1987-08-28 | 1992-10-26 | Tosoo Akuzo Kk | |
| JP2755961B2 (en) * | 1988-09-27 | 1998-05-25 | 東芝セラミックス株式会社 | Manufacturing method of aluminum nitride |
| EP1310455A1 (en) * | 2001-11-13 | 2003-05-14 | Ibaragi Laboratory Co., Ltd. | Process for producing aluminium nitride |
| KR20170105783A (en) * | 2016-03-10 | 2017-09-20 | 이건배 | A manufacturing method of aluminum nitride and an aluminum nitride prepared by the same |
| KR20210067666A (en) * | 2019-11-29 | 2021-06-08 | 국방과학연구소 | Alpha-aluminum hydride preparation method |
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| JPH0466807B2 (en) * | 1987-08-28 | 1992-10-26 | Tosoo Akuzo Kk | |
| JP2755961B2 (en) * | 1988-09-27 | 1998-05-25 | 東芝セラミックス株式会社 | Manufacturing method of aluminum nitride |
| EP1310455A1 (en) * | 2001-11-13 | 2003-05-14 | Ibaragi Laboratory Co., Ltd. | Process for producing aluminium nitride |
| KR20170105783A (en) * | 2016-03-10 | 2017-09-20 | 이건배 | A manufacturing method of aluminum nitride and an aluminum nitride prepared by the same |
| KR20210067666A (en) * | 2019-11-29 | 2021-06-08 | 국방과학연구소 | Alpha-aluminum hydride preparation method |
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