WO2024162343A1 - Single-layer phase difference material and phase difference film - Google Patents
Single-layer phase difference material and phase difference film Download PDFInfo
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- WO2024162343A1 WO2024162343A1 PCT/JP2024/002860 JP2024002860W WO2024162343A1 WO 2024162343 A1 WO2024162343 A1 WO 2024162343A1 JP 2024002860 W JP2024002860 W JP 2024002860W WO 2024162343 A1 WO2024162343 A1 WO 2024162343A1
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/30—Polarising elements
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/26—Esters containing oxygen in addition to the carboxy oxygen
- C08F220/30—Esters containing oxygen in addition to the carboxy oxygen containing aromatic rings in the alcohol moiety
Definitions
- the present invention relates to a single-layer retardation material obtained from a composition containing a polymer. More specifically, the present invention relates to a material having optical properties suitable for applications such as display devices and recording materials, in particular, a single-layer retardation material obtained from a composition containing a liquid crystal polymer that can be suitably used for optical compensation films such as polarizing plates and retardation plates for liquid crystal displays and organic EL (Electro Luminescence) display devices, and a retardation film made from the single-layer retardation material.
- a single-layer retardation material obtained from a composition containing a liquid crystal polymer that can be suitably used for optical compensation films such as polarizing plates and retardation plates for liquid crystal displays and organic EL (Electro Luminescence) display devices, and a retardation film made from the single-layer retardation material.
- the demand for improved display quality and lighter weight for liquid crystal displays and organic EL displays has led to an increased demand for polymer films with controlled internal molecular orientation structures as optical compensation films such as polarizing plates and retardation plates.
- films that utilize the optical anisotropy of polymerizable liquid crystal compounds are being developed.
- the polymerizable liquid crystal compounds used here are generally liquid crystal compounds that have a polymerizable group and a liquid crystal structural portion (a structural portion having a spacer portion and a mesogen portion), and acrylic groups are commonly used as the polymerizable group.
- Such polymerizable liquid crystal compounds are generally made into polymers (films) by polymerizing them through exposure to radiation such as ultraviolet light.
- radiation such as ultraviolet light.
- a method is known in which a specific polymerizable liquid crystal compound having an acrylic group is supported between aligned supports, and this compound is irradiated with radiation while maintained in a liquid crystal state to obtain a polymer (Patent Document 1), and a method is known in which a photopolymerization initiator is added to a mixture of two types of polymerizable liquid crystal compounds having an acrylic group, or to a composition in which this mixture is mixed with chiral liquid crystal, and then ultraviolet light is irradiated to obtain a polymer (Patent Document 2).
- Patent Documents 3 and 4 various single-layer coating-type alignment films have been reported, such as alignment films using polymerizable liquid crystal compounds or polymers that do not require a liquid crystal alignment film (Patent Documents 3 and 4), and alignment films using polymers that contain photocrosslinking sites (Patent Documents 5 and 6).
- the present invention has been made in consideration of the above problems, and aims to provide a single-layer retardation material and a retardation film obtained from a polymer composition that enables the production of a single-layer retardation material that does not cause cracks during transfer through a simpler process.
- the present invention provides a single-layer retardation material obtained from the following polymer composition.
- the side chain having the photoreactive site is a side chain having a photoreactive site and a hydrogen-bonding functional group.
- n1 and n2 are each independently 0, 1, 2, or 3.
- L is a single bond or an alkylene group having 1 to 12 carbon atoms, and some or all of the hydrogen atoms of the alkylene group may be substituted with halogen atoms.
- T 1 is a single bond or an alkylene group having 1 to 12 carbon atoms, and some or all of the hydrogen atoms of the alkylene group may be substituted with halogen atoms.
- a 1 , A 2 , and D 1 are each independently a single bond, -O-, -CH 2 -, -C( ⁇ O)-O-, -O-C( ⁇ O)-, -C( ⁇ O)-NH-, or -NH-C( ⁇ O)-.
- T 1 is a single bond
- a 2 is also a single bond.
- Y 1 and Y P 1 , Q 1 and Q 2 are each independently a single bond, a phenylene group or a divalent alicyclic hydrocarbon group having 5 to 8 carbon atoms, and some or all of the hydrogen atoms of the phenylene group may be substituted with a cyano group , a halogen atom , an alkyl group having 1 to 5 carbon atoms, an alkylcarbonyl group having 2 to 6 carbon atoms, or an alkoxy group having 1 to 5 carbon atoms.
- each Q 1 may be the same or different from the others, and when the number of Q 2s is 2, each Q 2 may be the same or different from each other.
- R is a hydrogen atom, a cyano group, a halogen atom, a carboxy group, an alkyl group having 1 to 5 carbon atoms, an alkylcarbonyl group having 2 to 6 carbon atoms, a cycloalkyl group having 3 to 7 carbon atoms, or an alkoxy group having 1 to 5 carbon atoms.
- each X 1 may be the same or different from each other, and when the number of X 2 is 2, each X 2 may be the same or different from each other.
- Z 1a and Z Each of 2a is independently a hydrogen atom, a halogen atom, a cyano group, or an alkyl group having 1 to 3 carbon atoms, and some or all of the hydrogen atoms of this alkyl group may be substituted with fluorine atoms.
- Each of G 1 and G 2 is independently N or CH.
- Q 1 is a single bond, a phenylene group or a divalent alicyclic hydrocarbon group having 5 to 8 carbon atoms, and some or all of the hydrogen atoms of the phenylene group may be substituted with a cyano group, a halogen atom, an alkyl group having 1 to 5 carbon atoms, an alkylcarbonyl group having 2 to 6 carbon atoms, or an alkoxy group having 1 to 5 carbon atoms.
- each Q 1 may be the same or different.
- X When the number of X 1 is 2, each X 1 may be the same or different.
- Y 1 is a phenylene group or a naphthylene group.
- Z 1a and Z 2a are each independently a hydrogen atom, a halogen atom, a cyano group, or an alkyl group having 1 to 3 carbon atoms, and some or all of the hydrogen atoms of this alkyl group may be substituted with fluorine atoms.
- R is a hydrogen atom.
- adjacent -CH 2 -'s are not substituted with these groups at the same time.
- R4 is an aromatic group, a polycyclic aromatic group, an alicyclic group, a phenylenecyclohexylene group, a heterocyclic group, or a fused ring group.
- R 6 is an alkylene group having 1 to 10 carbon atoms, and one or more hydrogen atoms of the alkylene group may be substituted with a fluorine atom or an organic group.
- -CH 2 - in R 6 may be substituted with a group selected from the group consisting of -O-, -NH-, and -C( ⁇ O)-. Adjacent -CH 2 - may also be substituted with these groups at the same time.
- a hydrogen atom in the ring structure in formula (b) may be substituted with a substituent selected from an alkyl group having 1 to 6 carbon atoms, a haloalkyl group having 1 to 6 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, a haloalkoxy group having 1 to 6 carbon atoms, a halogen group, a cyano group, and a nitro group.
- d is 0, 1 or 2.
- e is 0 or 1.
- f is 0 or 1.
- the dashed lines represent bonds.
- the present invention makes it possible to provide a single-layer retardation material and retardation film that do not crack during transfer.
- the polymer composition (composition for retardation film) used in the preparation of the single-layer retardation material of the present invention has a photosensitive side-chain polymer (hereinafter, also simply referred to as a side-chain polymer) capable of expressing liquid crystallinity, and the coating film obtained using the polymer composition is a film having a photosensitive side-chain polymer capable of expressing liquid crystallinity.
- This coating film is subjected to an orientation treatment by polarized light irradiation without rubbing treatment.
- the side-chain polymer film is heated to become a film (single-layer retardation material) to which optical anisotropy has been imparted.
- the slight anisotropy expressed by the polarized light irradiation becomes a driving force, and the liquid crystal side-chain polymer itself is efficiently reoriented by self-organization.
- a highly efficient orientation treatment is realized as a single-layer retardation material, and a single-layer retardation material to which high optical anisotropy has been imparted can be obtained.
- the side chain type polymer has a side chain with a self-crosslinking site, which causes a crosslinking reaction and increases the strength of the film. Note that these include the inventor's views on the mechanism of the present invention and do not restrict the present invention.
- the polymer composition used in the present invention contains (A) a polymer having a side chain having a photoreactive site, a side chain having a non-photoreactive hydrogen-bonding functional group, and a side chain having a self-crosslinking site (hereinafter also referred to as a side chain type polymer); and (B) an organic solvent.
- the coating film obtained from the above composition is oriented by polarized light irradiation without rubbing. After the polarized light irradiation, the side chain type polymer film is heated to form a film (single-layer retardation film) with optical anisotropy.
- the slight anisotropy developed by the polarized light irradiation becomes a driving force, and the side chain type polymer itself is efficiently reoriented by self-organization.
- a highly efficient orientation process is realized as a single-layer retardation film, and a single-layer retardation film with high optical anisotropy can be obtained.
- photoreactivity refers to the property of causing either (A-1) a photocrosslinking (photodimerization) reaction, (A-2) a photoisomerization, or (A-3) a photo-Fries rearrangement reaction; or a combination of these reactions.
- the above side chain type polymer preferably has a side chain that causes (A-1) a photocrosslinking reaction or (A-2) a photoisomerization reaction.
- the side chain polymer is (i) a polymer that exhibits liquid crystallinity in a specific temperature range and has a photoreactive side chain.
- the side chain polymer is (ii) preferably reacts to light in the wavelength range of 200 to 400 nm, preferably 240 to 400 nm, and exhibits liquid crystallinity in the temperature range of 50 to 300°C.
- the side chain polymer is (iii) preferably has a photoreactive side chain that reacts to light in the wavelength range of 200 to 400 nm, preferably 240 to 400 nm, particularly polarized ultraviolet light.
- the side chain polymer is (iv) preferably has a mesogen group to exhibit liquid crystallinity in the temperature range of 50 to 300°C.
- the side chain polymer has a photoreactive side chain having photoreactivity as described above.
- the structure of the side chain is not particularly limited, but has a structure that causes the reactions shown in (A-1), (A-2) and/or (A-3) above, and in particular, it is preferable that the side chain has a structure that causes the (A-1) photocrosslinking reaction and/or the (A-2) photoisomerization reaction.
- the (A-1) structure that causes the photocrosslinking reaction is preferable in that the structure after the reaction can stably maintain the orientation of the side chain polymer for a long period of time even if it is exposed to external stress such as heat.
- the (A-2) structure that causes the photoisomerization reaction is preferable in that it allows orientation treatment with a lower exposure amount compared to photocrosslinking and photofleece transition, and can increase production efficiency when manufacturing retardation films.
- the side chain structure of the side chain type polymer preferably has a rigid mesogen component, since this stabilizes the alignment of the liquid crystal.
- mesogen components include, but are not limited to, a biphenyl group, a terphenyl group, a phenylcyclohexyl group, a phenylbenzoate group, etc.
- the side chain having a photoreactive site that undergoes a photoreaction with ultraviolet light (hereinafter also referred to as side chain a) contained in the above polymer is preferably one represented by any of the following formulas (a1) to (a6): From the viewpoint of solubility in a solvent, the number of benzene rings in one side chain a is preferably 3 or less.
- n1 and n2 are each independently 0, 1, 2, or 3.
- L is a single bond or an alkylene group having 1 to 12 carbon atoms, and some or all of the hydrogen atoms of the alkylene group may be substituted with halogen atoms.
- T 1 is a single bond or an alkylene group having 1 to 12 carbon atoms, and some or all of the hydrogen atoms of the alkylene group may be substituted with halogen atoms.
- a 1 , A 2 , and D 1 are each independently a single bond, -O-, -CH 2 -, -C( ⁇ O)-O-, -O-C( ⁇ O)-, -C( ⁇ O)-NH-, or -NH-C( ⁇ O)-.
- a 2 is also a single bond.
- Y 1 and Y P 1 , Q 1 and Q 2 are each independently a single bond, a phenylene group or a divalent alicyclic hydrocarbon group having 5 to 8 carbon atoms, and some or all of the hydrogen atoms of the phenylene group may be substituted with a cyano group , a halogen atom , an alkyl group having 1 to 5 carbon atoms, an alkylcarbonyl group having 2 to 6 carbon atoms, or an alkoxy group having 1 to 5 carbon atoms.
- each Q 1 may be the same or different from the others, and when the number of Q 2s is 2, each Q 2 may be the same or different from each other.
- R is a hydrogen atom, a cyano group, a halogen atom, a carboxy group, an alkyl group having 1 to 5 carbon atoms, an alkylcarbonyl group having 2 to 6 carbon atoms, a cycloalkyl group having 3 to 7 carbon atoms, or an alkoxy group having 1 to 5 carbon atoms.
- each X 1 may be the same or different from each other, and when the number of X 2 is 2, each X 2 may be the same or different from each other.
- Z 1a and Z Each of 2a is independently a hydrogen atom, a halogen atom, a cyano group, or an alkyl group having 1 to 3 carbon atoms, and some or all of the hydrogen atoms of this alkyl group may be substituted with fluorine atoms.
- Each of G 1 and G 2 is independently N or CH. The dashed lines represent bonds.
- the alkylene group having 1 to 12 carbon atoms may be linear, branched, or cyclic, and specific examples include methylene, ethylene, propane-1,3-diyl, butane-1,4-diyl, pentane-1,5-diyl, hexane-1,6-diyl, heptane-1,7-diyl, octane-1,8-diyl, nonane-1,9-diyl, and decane-1,10-diyl.
- halogen atoms include fluorine atoms, chlorine atoms, bromine atoms, iodine atoms, etc.
- the alkyl group having 1 to 5 carbon atoms may be either linear or branched, and specific examples include a methyl group, an ethyl group, an n-propyl group, an isopropyl group, an n-butyl group, a tert-butyl group, and an n-pentyl group.
- alkylcarbonyl group having 2 to 6 carbon atoms include a methylcarbonyl (acetyl) group, an ethylcarbonyl group, an n-propylcarbonyl group, an n-butylcarbonyl group, and an n-pentylcarbonyl group.
- alkoxy group having 1 to 5 carbon atoms include a methoxy group, an ethoxy group, an n-propoxy group, an isopropoxy group, an n-butoxy group, and an n-pentyloxy group.
- divalent alicyclic hydrocarbon group having 5 to 8 carbon atoms examples include a cyclopentanediyl group, a cyclohexanediyl group, a cycloheptanediyl group, and a cyclooctanediyl group.
- cycloalkyl group having 3 to 7 carbon atoms include a cyclopropyl group, a cyclobutyl group, a cyclopentyl group, and a cyclohexyl group.
- the alkyl group having 1 to 3 carbon atoms may be either linear or branched, and specific examples include a methyl group, an ethyl group, an n-propyl group, and an isopropyl group.
- the side chain a is more preferably one represented by the following formula (a1-1), (a1-2), (a2-1), (a3-1), (a4-1), (a5-1) or (a6-1).
- a1-1 formula
- a1-2 a1-2
- a2-1 a3-1
- a4-1 a5-1
- a6-1 formula
- L, A1 , A2 , Y1 , Y2 , P1 , Q1 , T1 , R, X1 , Z1a , Z2a , Cou, E, G1 , G2 , n1 and the dashed line are the same as above.
- the side chain represented by formula (a1-1) is preferably a side chain represented by the following formula (a1-1-1), and the side chain represented by formula (a1-2) is preferably a side chain represented by formula (a1-2-1).
- n1, L, Q 1 , X 1 , R and the dashed line are the same as above.
- the side chain represented by formula (a2-1) is preferably a side chain represented by the following formula (a2-1-1). (In the formula, L, A2 , Q1 , T1 , R and the dashed line are the same as above.)
- the side chain represented by formula (a3-1) is preferably a side chain represented by the following formula (a3-1-1), (a3-1-2) or (a3-1-3). (In the formula, L, Cou and the dashed line are the same as above.)
- the side chain represented by formula (a4-1) is preferably a side chain represented by the following formula (a4-1-1), (a4-1-2), (a4-1-3) or (a4-1-4). (In the formula, L, R and the dashed line are the same as above.)
- the side chain represented by formula (a5-1) is preferably a side chain represented by the following formula (a5-1-1) or (a5-1-2). (In the formula, L, R and the dashed line are the same as above.)
- the side chain represented by formula (a6-1) is preferably a side chain represented by the following formula (a6-1-1), (a6-1-2) or (a6-1-3). (In the formula, L, R and the dashed line are the same as above.)
- a terminal COOH side chain in which R is H in the side chain represented by (a1-2) above is preferred, and among these, a side chain in which Y 1 is a 1,4-phenylene group is more preferred.
- the side chain polymer preferably reacts to light in the wavelength range of 250 to 400 nm and exhibits liquid crystallinity in the temperature range of 100 to 300°C.
- the side chain polymer preferably has a photosensitive side chain that reacts to light in the wavelength range of 250 to 400 nm.
- (A) Side-chain polymers have photosensitive side chains bonded to their main chains, and can undergo crosslinking or isomerization reactions in response to light.
- the structure of the photosensitive side-chain polymer capable of expressing liquid crystallinity is not particularly limited as long as it satisfies such characteristics, but it is preferable for the side-chain structure to have a rigid mesogen component.
- the above-mentioned side-chain polymer is used as a single-layer retardation material, stable optical anisotropy can be obtained.
- a more specific example of a photosensitive side-chain polymer structure capable of exhibiting liquid crystallinity is preferably a structure having a main chain composed of at least one selected from the group consisting of radical polymerizable groups such as (meth)acrylate, itaconate, fumarate, maleate, ⁇ -methylene- ⁇ -butyrolactone, styrene, vinyl, maleimide, norbornene, and siloxane, and a side chain a.
- radical polymerizable groups such as (meth)acrylate, itaconate, fumarate, maleate, ⁇ -methylene- ⁇ -butyrolactone, styrene, vinyl, maleimide, norbornene, and siloxane
- the polymer (A) has a side chain having a non-photoreactive hydrogen-bonding functional group as well as a side chain having a photo-alignable moiety represented by the above formula (a).
- the side chain having a non-photoreactive hydrogen-bonding functional group preferably has a side chain b, which is a carboxylic acid side chain represented by the following formula (b).
- R 1 is an alkylene group having 1 to 30 carbon atoms, and one or more hydrogen atoms of the alkylene group may be substituted with a fluorine atom or an organic group.
- adjacent -CH 2 -'s are not substituted with these groups at the same time.
- R4 is an aromatic group, a polycyclic aromatic group, an alicyclic group, a phenylcyclohexyl group, a heterocyclic group, or a fused ring group.
- R 6 is an alkylene group having 1 to 10 carbon atoms, and one or more hydrogen atoms of the alkylene group may be substituted with a fluorine atom or an organic group.
- -CH 2 - in R 6 may be substituted with a group selected from the group consisting of -O-, -NH-, and -C( ⁇ O)-. Adjacent -CH 2 - may also be substituted with these groups at the same time.
- a hydrogen atom in the ring structure in formula (b) may be substituted with a substituent selected from an alkyl group having 1 to 6 carbon atoms, a haloalkyl group having 1 to 6 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, a haloalkoxy group having 1 to 6 carbon atoms, a halogen group, a cyano group, and a nitro group.
- d is 0, 1 or 2.
- e is 0 or 1.
- f is 0 or 1.
- the dashed lines represent bonds.
- the number of ring structures in the side chain represented by the above formula (b) is preferably 3 or less.
- the ring structure of a condensed ring is counted as one. That is, there is one ring structure in a phenylene group or naphthylene group, and there are two ring structures in a biphenylylene group or cyclohexanediyl group.
- the side chain b is preferably, for example, one represented by the following formula (b1).
- R 1 , R 4 to R 6 , d and f are the same as above.
- the number of ring structures in formula (b1) is 3 or less.
- the hydrogen atom in the benzene ring in formula (b1) may be substituted with a substituent selected from an alkyl group having 1 to 6 carbon atoms, a haloalkyl group having 1 to 6 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, a haloalkoxy group having 1 to 6 carbon atoms, a halogen group, a cyano group and a nitro group.
- the dashed lines represent bonds.
- the (A) side chain type polymer exhibits liquid crystallinity in the temperature range of 100 to 300°C, and can further have a side chain that only exhibits liquid crystallinity (hereinafter also referred to as side chain c).
- side chain c a side chain that only exhibits liquid crystallinity
- exhibiting only liquid crystallinity here means that a polymer having only side chain c does not exhibit photoalignment and only exhibits liquid crystallinity during the process for producing the retardation material of the present invention (i.e., steps (I) to (III) described below).
- the side chain c is preferably any one or two liquid crystalline side chains selected from the group consisting of the following formulae (1) to (6).
- a 1 and A 2 are each independently a single bond, -O-, -CH 2 -, -C( ⁇ O)-O-, -O-C( ⁇ O)-, -C( ⁇ O)-NH-, or -NH-C( ⁇ O)-.
- R 11 is -NO 2 , -CN, a halogen atom, a phenyl group, a naphthyl group, a biphenylyl group, a furanyl group, a monovalent nitrogen-containing heterocyclic group, a monovalent alicyclic hydrocarbon group having 5 to 8 carbon atoms, an alkyl group having 1 to 12 carbon atoms, or an alkyloxy group having 1 to 12 carbon atoms.
- R 12 is a group selected from the group consisting of a phenyl group, a naphthyl group, a biphenylyl group, a furanyl group, a monovalent nitrogen-containing heterocyclic group, a monovalent alicyclic hydrocarbon group having 5 to 8 carbon atoms, and groups obtained by combining these groups, and a hydrogen atom bonded to these is -NO 2 , -CN, a halogen atom, an alkyl group having 1 to 5 carbon atoms, or an alkoxy group having 1 to 5 carbon atoms.
- R 13 is a hydrogen atom, -NO 2 , -CN, a halogen atom, a phenyl group, a naphthyl group, a biphenylyl group, a furanyl group, a monovalent nitrogen-containing heterocyclic group, a monovalent alicyclic hydrocarbon group having 5 to 8 carbon atoms, an alkyl group having 1 to 12 carbon atoms, or an alkoxy group having 1 to 12 carbon atoms.
- E 1 is -C( ⁇ O)-O- or -O-C( ⁇ O)-.
- d is an integer of 1 to 12.
- k1 to k5 are each independently an integer of 0 to 2, but the sum of k1 to k5 is 2 or more.
- k6 and k7 are each independently an integer of 0 to 2, but the sum of k6 and k7 is 1 or more.
- m1 and m2 are each independently an integer of 1 to 3.
- n is 0 or 1.
- the dashed lines represent bonds.
- the side chain type polymer (A) has a self-crosslinking moiety.
- the self-crosslinking moiety include trialkoxysilyl groups, blocked isocyanate groups, epoxy groups, oxetane groups, groups having an oxazoline ring, N-alkoxymethylamide groups, N-hydroxymethylamide groups, and vinyl groups.
- These side chains having self-crosslinking moieties react with each other or with the COOH groups and OH groups of the polymer, which is component (A), to form a crosslinked structure. As a result, the strength of the resulting retardation material can be increased.
- Examples of the combination of the side chain having a photoreactive moiety (side chain a) and the side chain having a self-crosslinking moiety (side chain d) that the side chain type polymer (A) has are as follows: a side chain having a photoreactive site and a hydrogen-bonding functional group, and a side chain having a trialkoxysilyl group; a side chain having a photoreactive site and a hydrogen-bonding functional group, and a side chain having a blocked isocyanate group; a side chain having a photoreactive site and a hydrogen-bonding functional group, and a side chain having an epoxy group; a side chain having a photoreactive site and a hydrogen-bonding functional group, and a side chain having an oxetane group; a side chain having a photoreactive site and a hydrogen-bonding functional group, and a side chain having an oxazoline ring; a side chain having a photoreactive site and a hydrogen-bonding functional group
- the side chain type polymer may have a side chain having a hydroxyalkyl group (hereinafter also referred to as side chain e).
- the side chain having a hydroxyalkyl group has an alcoholic hydroxy group, and thus can induce a crosslinking reaction with side chain d when the self-crosslinking site of side chain d is an N-alkoxymethylamide site or an N-hydroxymethylamide site.
- the side chain polymer used in the present invention has a photosensitive side chain bonded to the main chain, and can undergo a crosslinking reaction, isomerization reaction, or Fries rearrangement in response to optimal light selected from a wavelength range of 200 to 400 nm, particularly light with wavelengths of 254 nm, 313 nm, and 365 nm.
- the structure of the photosensitive side chain polymer is not particularly limited as long as it satisfies such characteristics, but it is preferable for the side chain structure to have a rigid mesogen component. When the above side chain polymer is made into a single-layer retardation film, stable optical anisotropy can be obtained.
- a more specific example of the structure of the photosensitive side chain type polymer is preferably a structure having a main chain composed of at least one selected from the group consisting of radical polymerizable groups such as (meth)acrylate, itaconate, fumarate, maleate, ⁇ -methylene- ⁇ -butyrolactone, styrene, vinyl, maleimide, norbornene, and siloxane, and a side chain a.
- radical polymerizable groups such as (meth)acrylate, itaconate, fumarate, maleate, ⁇ -methylene- ⁇ -butyrolactone, styrene, vinyl, maleimide, norbornene, and siloxane
- the side chain polymer used in the present invention can be obtained by polymerizing a monomer that provides side chain a, a monomer that provides side chain b, a monomer that provides side chain d, and, if necessary, a monomer that provides side chain c and a monomer that provides side chain e.
- Examples of the monomer that provides the side chain a include compounds represented by the following formula (M1-1), (M1-2), (M2), (M3), (M4), (M5) or (M6).
- PG is a polymerizable group, and A1 , A2 , D1 , L, T1 , Y1 , Y2 , P1 , Q1 , Q2 , R, Cou, E, X1 , X2 , Z1a , Z2a , G1 , G2 , n1 and n2 are the same as above.
- PG is a polymerizable group, and is preferably a group represented by any one of the following formulae (PG1) to (PG8).
- PG1 an acrylic or methacrylic group represented by formula (PG1) is preferred.
- R is a hydrogen atom or a methyl group, and the dashed line is a bond to L.
- the compound represented by formula (M1-1) is preferably one represented by the following formula (M1-1-1), and the compound represented by formula (M1-2) is preferably one represented by the following formula (M1-2-1).
- PG, L, Q1 , X1 , Y1 , Z1a , Z2a , P1 and R are the same as above.
- the compound represented by formula (M2) is preferably one represented by the following formula (M2-1). (In the formula, PG, A2 , L, T1 , Y1 , Z1a , Z2a , P1 , Q1 and R are the same as above.)
- the compound represented by formula (M3) is preferably one represented by the following formula (M3-1). (In the formula, PG, A 1 , L, X 1 , Q 1 , Cou and n1 are the same as above.)
- the compound represented by formula (M4) is preferably one represented by the following formula (M4-1). (In the formula, PG, A1 , L, X1 , Y1 , Y2 , Q1 , E, R and n1 are the same as above.)
- the compound represented by formula (M5) is preferably one represented by the following formula (M5-1). (In the formula, PG, A1 , L, X1 , Y1 , Y2 , Q1 , R and n1 are the same as above.)
- the compound represented by formula (M6) is preferably one represented by the following formula (M6-1). (In the formula, PG, A1 , L, X1 , Y1 , Y2 , Q1 , G1 , G2 , R and n1 are the same as above.)
- the compound represented by formula (M1-1-1) is preferably one represented by the following formula (M1-1-2), and the compound represented by formula (M1-2-1) is preferably one represented by the following formula (M1-2-2).
- M1-1-2 the compound represented by formula (M1-2-1) is preferably one represented by the following formula (M1-2-2).
- PG, n1, L, Q1 , X1 and R are the same as above.
- the compound represented by formula (M2-1) is preferably one represented by the following formula (M2-2). (In the formula, PG, A2 , L, T1 , Q1 and R are the same as above.)
- the compound represented by formula (M3-1) is preferably one represented by the following formula (M3-2), (M3-3) or (M3-4). (In the formula, PG, L and Cou are the same as above.)
- the compound represented by formula (M4-1) is preferably one represented by the following formula (M4-2), (M4-3), (M4-4) or (M4-5). (In the formula, PG, L and R are the same as above.)
- the compound represented by formula (M5-1) is preferably one represented by the following formula (M5-2) or (M5-3). (In the formula, PG, L and R are the same as above.)
- the compound represented by formula (M6-1) is preferably one represented by the following formula (M6-2), (M6-3), or (M6-4). (In the formula, PG, L and R are the same as above.)
- Examples of the compound represented by formula (M1-1) include those represented by any of the following formulas (A-1-1-1) to (A-1-1-13).
- PG is a polymerizable group
- s1 represents the number of methylene groups and is an integer of 2 to 9
- R 11 is -H, -CH 3 , -OCH 3 , -C(CH 3 ) 3 , -C( ⁇ O)-CH 3 or -CN
- R 12 is -H, -CH 3 , -OCH 3 , -CN or -F.
- Examples of the compound represented by formula (M1-2) include those represented by any of the following formulae (A-1-2-1) to (A-1-2-4):
- PG is a polymerizable group
- s1 is the same as above.
- compounds represented by formula (M1-2) include 4-(6-methacryloxyhexyl-1-oxy)cinnamic acid, 4-(6-acryloxyhexyl-1-oxy)cinnamic acid, 4-(3-methacryloxypropyl-1-oxy)cinnamic acid, and 4-[4-(6-methacryloxyhexyl-1-oxy)benzoyloxy]cinnamic acid.
- Examples of compounds represented by formula (M2) include those represented by any of the following formulas (A-2-1) to (A-2-9).
- PG is a polymerizable group
- s1 and s2 represent the number of methylene groups and are each independently an integer of 2 to 9.
- R 21 is -CH 3 , -OCH 3 , -C(CH 3 ) 3 , -C( ⁇ O)-CH 3 , -CN or -F.
- Examples of the compound represented by formula (M3) include those represented by any of the following formulae (A-3-1) to (A-3-5):
- PG is a polymerizable group
- s1 is the same as above.
- Examples of the compound represented by formula (M4) include those represented by any of the following formulae (A-4-1) to (A-4-4):
- PG is a polymerizable group, and s1 is the same as above.
- Examples of the compound represented by formula (M5) include those represented by any of the following formulae (A-5-1) to (A-5-3):
- PG is a polymerizable group, and s1 is the same as above.
- Examples of the compound represented by formula (M6) include those represented by any of the following formulae (A-6-1) to (A-6-3):
- PG is a polymerizable group
- s1 is the same as above.
- the compound represented by (M1-2) above having a terminal COOH group in which R is H is preferred, and among these, the compound in which Y 1 is a 1,4-phenylene group is more preferred.
- PG is preferably any one of (PG1) to (PG5).
- Preferred examples of such monomers include those represented by the following formulas (M1-2-a1) to (M1-2-a6).
- PG is any one of (PG1) to (PG5) above, and p is an integer of 2 to 9.
- Examples of the monomer having the structure represented by formula (b) include a compound represented by the following formula (MB1).
- PG is any one of the above (PG1) to (PG5), and R 1 , R 4 to R 6 , d, e and f are the same as above.
- a hydrogen atom in the ring structure in the formula may be substituted with a substituent selected from an alkyl group having 1 to 6 carbon atoms, a haloalkyl group having 1 to 6 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, a haloalkoxy group having 1 to 6 carbon atoms, a halogen group, a cyano group and a nitro group.
- the monomer MB is preferably one represented by the following formula (MB1A).
- PG, R 1 , R 4 to R 6 , d and f are the same as above.
- a hydrogen atom in the benzene ring may be substituted with a substituent selected from an alkyl group having 1 to 6 carbon atoms, a haloalkyl group having 1 to 6 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, a haloalkoxy group having 1 to 6 carbon atoms, a halogen group, a cyano group and a nitro group.
- the monomers represented by the following MB1A-1 to MB1A-8 are preferred.
- PG is any one of (PG1) to (PG5) above, and p is an integer of 2 to 9.
- PG is preferably an acrylic or methacrylic group represented by formula (PG1) from the viewpoint of ease of control of the polymerization reaction and the stability of the polymer, and is more preferably an acrylic group from the viewpoint of crack resistance.
- a monomer having a structure that only expresses liquid crystallinity in side chain c (hereinafter also referred to as monomer MC) is a monomer that allows a polymer derived from the monomer to express liquid crystallinity.
- the mesogenic group in the side chain c is preferably a structure represented by any one of the following formulae (c1) to (c10).
- monomer MC include those having a polymerizable group derived from at least one selected from the group consisting of radical polymerizable groups such as hydrocarbons, (meth)acrylates, itaconates, fumarates, maleates, ⁇ -methylene- ⁇ -butyrolactone, styrene, vinyl, maleimides, and norbornenes, and siloxanes, and a structure consisting of at least one of the above formulas (c1) to (c10).
- monomer MC is preferably one having (meth)acrylate as the polymerizable group.
- Preferred examples of the monomer MC include those represented by the following formulae (MC-1) to (MC-6).
- PG is any one of (PG1) to (PG5) above, and p is an integer of 2 to 9.
- Examples of monomers having a self-crosslinking site in the side chain d include (meth)acrylamide compounds substituted with a hydroxymethyl group or an alkoxymethyl group, such as N-hydroxymethyl(meth)acrylamide, N-methoxymethyl(meth)acrylamide, N-ethoxymethyl(meth)acrylamide, and N-butoxymethyl(meth)acrylamide; monomers having a trialkoxysilyl group, such as 3-trimethoxysilylpropyl acrylate, 3-triethoxysilylpropyl acrylate, 3-trimethoxysilylpropyl methacrylate, and 3-triethoxysilylpropyl methacrylate; glycidyl acrylate, glycidyl monomers having a glycidyl group or an epoxycyclohexyl group, such as dimethyl methacrylate and 3,4-epoxycyclohexylmethyl methacrylate; monomers
- monomers that provide side chain e include 2-hydroxyethyl acrylate, 2-hydroxyethyl methacrylate, 2-hydroxypropyl acrylate, 2-hydroxypropyl methacrylate, 3-hydroxypropyl acrylate, 3-hydroxypropyl methacrylate, 4-hydroxybutyl acrylate, 4-hydroxybutyl methacrylate, 6-hydroxyhexyl acrylate, 6-hydroxyhexyl methacrylate, 8-hydroxyoctyl acrylate, 8-hydroxyoctyl methacrylate, 12-hydroxydodecyl acrylate, 12-hydroxydodecyl methacrylate, 2,3-dihydroxypropyl ...
- acryloyloxypropyl methacrylate examples include diethylene glycol monoacrylate, diethylene glycol monomethacrylate, caprolactone 2-(acryloyloxy)ethyl ester, caprolactone 2-(methacryloyloxy)ethyl ester, poly(ethylene glycol) ethyl ether acrylate, poly(ethylene glycol) ethyl ether methacrylate, 5-acryloyloxy-6-hydroxynorbornene-2-carboxylic-6-lactone, 5-methacryloyloxy-6-hydroxynorbornene-2-carboxylic-6-lactone(4-(hydroxymethyl)cyclohexyl)methyl acrylate, and compounds represented by the following formulae (ME-a1) to (ME-a3).
- a monomer MF can be copolymerized as a non-liquid crystal side chain f to the extent that the photoreactivity and/or liquid crystallinity is not impaired.
- the monomer MF include industrially available monomers capable of radical polymerization reactions. Specific examples include unsaturated carboxylic acids, acrylic acid ester compounds, methacrylic acid ester compounds, maleimide compounds, acrylonitrile, maleic anhydride, styrene compounds, vinyl compounds, acrylamide compounds, and methacrylamide compounds.
- unsaturated carboxylic acids include acrylic acid, methacrylic acid, itaconic acid, maleic acid, and fumaric acid.
- acrylic acid ester compounds include methyl acrylate, ethyl acrylate, isopropyl acrylate, benzyl acrylate, naphthyl acrylate, anthryl acrylate, anthryl methyl acrylate, phenyl acrylate, 2,2,2-trifluoroethyl acrylate, tert-butyl acrylate, cyclohexyl acrylate, isobornyl acrylate, 2-methoxyethyl acrylate, methoxytriethylene glycol acrylate, 2-ethoxyethyl acrylate, tetrahydrofurfuryl acrylate, 3-methoxybutyl acrylate, 2-methyl-2-adamantyl acrylate, 2-ethyl-2-adamantyl acrylate, and tetrahydrodicyclopentadienyl acrylate.
- methacrylic acid ester compounds include methyl methacrylate, ethyl methacrylate, isopropyl methacrylate, benzyl methacrylate, naphthyl methacrylate, anthryl methacrylate, anthryl methyl methacrylate, phenyl methacrylate, 2,2,2-trifluoroethyl methacrylate, tert-butyl methacrylate, cyclohexyl methacrylate, isobornyl methacrylate, 2-methoxyethyl methacrylate, methoxytriethylene glycol methacrylate, 2-ethoxyethyl methacrylate, tetrahydrofurfuryl methacrylate, 3-methoxybutyl methacrylate, 2-methyl-2-adamantyl methacrylate, 2-ethyl-2-adamantyl methacrylate, tetrahydrodicyclopentadienyl methacrylate, and 2-(meth
- maleimide compounds include N-benzylmaleimide, 4-maleimidobutyric acid, N-methoxycarbonylmaleimide, and N-cyclohexylmaleimide.
- styrene compounds include styrene, 4-methylstyrene, 4-vinylphenylboronic acid, 4-vinylbenzoic acid, trans-anethole, and 4-vinylpyridine.
- vinyl compounds include vinyl ether, methyl vinyl ether, benzyl vinyl ether, phenyl vinyl ether, and propyl vinyl ether.
- acrylamide compounds include acrylamide, N,N-dimethylacrylamide, N-isopropylacrylamide, N-propylacrylamide, and N-tert-butylacrylamide.
- methacrylamide compounds include N-methylmethacrylamide, N,N-dimethylmethacrylamide, and N-(4-hydroxyphenyl)methacrylamide.
- the content of side chain a in the side chain type polymer of the present invention is preferably 5 to 90 mol %, more preferably 5 to 80 mol %, and even more preferably 5 to 50 mol % from the viewpoint of photoreactivity. From the viewpoint of light resistance, 5 to 30 mol % is preferable.
- the content of side chain b in the side chain type polymer of the present invention is preferably 10 to 95 mol % from the viewpoint of retardation value.
- the content of side chain d in the side chain type polymer of the present invention is preferably 1 to 30 mol %, more preferably 1 to 20 mol %, from the viewpoint of increasing the strength of the film while not impairing the liquid crystallinity of the polymer.
- the side chain polymer of the present invention may contain side chain e.
- the content of side chain e is preferably 1 to 20 mol %, and more preferably 1 to 15 mol %, from the viewpoint of liquid crystallinity.
- the content of side chain c in the side chain type polymer of the present invention is the remaining portion when the total content of side chain a, side chain b, side chain d, and side chain e is less than 100 mol %.
- the side chain polymer of the present invention may contain side chain f, which is a non-liquid crystal component.
- side chain f is a non-liquid crystal component.
- the method for producing the side chain polymer of component (A) is not particularly limited, and a general-purpose method used industrially can be used. Specifically, it can be produced by radical polymerization, cationic polymerization, or anionic polymerization using the above-mentioned monomer MA, monomer MB, and optionally monomer MC, monomer MD, and optionally monomer ME, and optionally monomer MF. Of these, radical polymerization is particularly preferred from the viewpoint of ease of reaction control, etc.
- radical polymerization initiators Radical thermal polymerization initiators, radical photopolymerization initiators
- RAFT reversible addition-fragmentation chain transfer
- a radical thermal polymerization initiator is a compound that generates radicals when heated to a temperature above its decomposition temperature.
- radical thermal polymerization initiators include ketone peroxides (methyl ethyl ketone peroxide, cyclohexanone peroxide, etc.), diacyl peroxides (acetyl peroxide, benzoyl peroxide, etc.), hydroperoxides (hydrogen peroxide, tert-butyl hydroperoxide, cumene hydroperoxide, etc.), dialkyl peroxides (di-tert-butyl peroxide, dicumyl peroxide, dilauroyl peroxide, etc.), peroxyketals ( dibutylperoxycyclohexane, etc.), alkyl peresters (peroxyneodecanoic acid-tert-butyl ester, peroxypivalic acid-tert-butyl ester, peroxy 2-ethylcyclohex
- the radical photopolymerization initiator is not particularly limited as long as it is a compound that initiates radical polymerization by irradiation with light.
- examples of such radical photopolymerization initiators include benzophenone, Michler's ketone, 4,4'-bis(diethylamino)benzophenone, xanthone, thioxanthone, isopropylxanthone, 2,4-diethylthioxanthone, 2-ethylanthraquinone, acetophenone, 2-hydroxy-2-methylpropiophenone, 2-hydroxy-2-methyl-4'-isopropylpropiophenone, 1-hydroxycyclohexyl phenyl ketone, and isopropyl benzoin ether.
- the radical polymerization method is not particularly limited, and emulsion polymerization, suspension polymerization, dispersion polymerization, precipitation polymerization, bulk polymerization, solution polymerization, etc. can be used.
- the organic solvent used in the polymerization reaction is not particularly limited as long as it dissolves the produced polymer.
- Specific examples include tetrahydrofuran, cyclopentanone, cyclohexanone, N,N-dimethylformamide, N,N-dimethylacetamide, N,N-diethylformamide, N,N-dimethylacetamide, N-methyl-2-pyrrolidone, N-ethyl-2-pyrrolidone, N-methyl- ⁇ -caprolactam, dimethyl sulfoxide, tetramethylurea, dimethyl sulfone, hexamethyl sulfoxide, ⁇ -butyrolactone, methoxymethylpentanol, dipentene, ethyl amyl ketone, methyl nonyl ketone, methyl ethyl ketone, methyl isoamyl ketone, methyl isopropyl ketone, methyl cellosolve,
- the above organic solvents may be used alone or in combination of two or more. Furthermore, even if the solvent does not dissolve the polymer produced, it may be mixed with the above organic solvent to the extent that the polymer produced does not precipitate. In addition, since oxygen in the organic solvent in radical polymerization inhibits the polymerization reaction, it is preferable to use an organic solvent that has been degassed to the extent possible.
- the polymerization temperature during radical polymerization can be selected from any temperature between 30 and 150°C, but is preferably in the range of 50 to 100°C.
- the reaction can be carried out at any concentration, but if the concentration is too low it becomes difficult to obtain a polymer with a high molecular weight, and if the concentration is too high the viscosity of the reaction liquid becomes too high, making uniform stirring difficult, so the monomer concentration is preferably 1 to 50% by mass, more preferably 5 to 30% by mass.
- the reaction can be carried out at a high concentration in the early stages, and then an organic solvent can be added.
- the ratio of radical polymerization initiator to the monomer is high, the molecular weight of the resulting polymer will be small, and if the ratio is low, the molecular weight of the resulting polymer will be large, so the ratio of radical initiator to the monomer to be polymerized is preferably 0.1 to 15 mol %.
- various monomer components, solvents, initiators, etc. can also be added during polymerization.
- the reaction solution may be poured into a poor solvent to precipitate the polymers.
- poor solvents used for precipitation include methanol, acetone, hexane, heptane, butyl cellosolve, heptane, methyl ethyl ketone, methyl isobutyl ketone, ethanol, toluene, benzene, diethyl ether, methyl ethyl ether, and water.
- the polymer precipitated by pouring into the poor solvent can be recovered by filtration, and then dried at room temperature or by heating under normal or reduced pressure.
- the recovered polymer can be redissolved in an organic solvent and the reprecipitation recovery operation repeated 2 to 10 times to reduce the amount of impurities in the polymer.
- poor solvents include alcohols, ketones, and hydrocarbons. It is preferable to use three or more poor solvents selected from these because this further increases the efficiency of purification.
- the side chain polymer (A) of the present invention preferably has a weight average molecular weight measured by GPC (Gel Permeation Chromatography) of 2,000 to 2,000,000, more preferably 2,000 to 1,000,000, and even more preferably 5,000 to 200,000.
- GPC Gel Permeation Chromatography
- the polymer composition used in the present invention contains an organic solvent (good solvent).
- the organic solvent (good solvent) is not particularly limited as long as it is an organic solvent that dissolves the polymer component. Specific examples thereof include N,N-dimethylformamide, N,N-dimethylacetamide, N-methyl-2-pyrrolidone, N-methyl- ⁇ -caprolactam, 2-pyrrolidone, N-ethyl-2-pyrrolidone, N-vinyl-2-pyrrolidone, dimethylsulfoxide, tetramethylurea, pyridine, dimethylsulfone, hexamethylphosphoramide, ⁇ -butyrolactone, 3-methoxy-N,N-dimethylpropanamide, 3-ethoxy-N,N-dimethylpropanamide, 3-butoxy-N, Examples of the amines include N-dimethylpropanamide, 1,3-dimethyl-2-imidazolidinone, ethyl amyl
- the polymer composition used in the present invention may also contain a solvent (poor solvent) that improves the film thickness uniformity and surface smoothness when the polymer composition is applied.
- the poor solvent may be used alone or in combination of two or more.
- its content in the solvent is preferably 5 to 80% by mass, more preferably 10 to 60% by mass, so as not to significantly reduce the solubility of the polymer.
- the polymer composition used in the present invention may contain components other than (A) and (B).
- the components include, but are not limited to, a compound that accelerates a crosslinking reaction, a compound that improves the film thickness uniformity and surface smoothness when the polymer composition is applied, and a compound that improves the adhesion between the retardation material and the substrate.
- Compounds that promote the crosslinking reaction include acid catalysts (acid, thermal acid generator, photoacid generator), base catalysts (base, thermal base generator, photobase generator), and radical initiators that are activated by heat or light.
- acid catalysts include sulfonic acids such as hydrochloric acid, methanesulfonic acid, ethanesulfonic acid, p-toluenesulfonic acid, camphorsulfonic acid, and ethanedisulfonic acid, as well as their hydrates and salts.
- base catalysts include bases such as pyridine, 4-dimethylaminopyridine, and imidazole, as well as their hydrates and salts.
- thermal radical initiators include peroxide compounds, persulfates, and azo compounds.
- radical photopolymerization initiator There are no particular limitations on the radical photopolymerization initiator, so long as it is a compound that initiates radical polymerization by irradiation with light.
- radical photopolymerization initiators include benzophenone, Michler's ketone, and 4,4'-bis(diethylamino)benzophenone.
- the content of the compound that promotes the crosslinking reaction used in the present invention is preferably 0.01 to 10 parts by mass, more preferably 0.05 to 8 parts by mass, and even more preferably 0.1 to 6 parts by mass, per 100 parts by mass of the polymer (A), which is component (A).
- Compounds that improve film thickness uniformity and surface smoothness include fluorine-based surfactants, silicone-based surfactants, nonionic surfactants, etc. Specific examples of these include EFTOP (registered trademark) 301, EF303, EF352 (manufactured by Tochem Products), MEGAFAC (registered trademark) F171, F173, F560, F563, R-30, R-40, R-41 (manufactured by DIC Corporation), Fluorad FC430, FC431 (manufactured by 3M), Asahiguard (registered trademark) AG710 (manufactured by AGC), Surflon (registered trademark) S-382, SC101, SC102, SC103, SC104, SC105, SC106 (manufactured by AGC Seimi Chemical Co., Ltd.), BYK302, BYK331, BYK348, BYK360N, BYK381, BYK3441, and the like.
- the content of these surfactants
- Specific examples of compounds that improve adhesion between the retardation material and the substrate include functional silane-containing compounds.
- a phenoplast-based compound or an epoxy group-containing compound may be added to the polymer composition.
- the content is preferably 0.1 to 30 parts by mass, and more preferably 1 to 20 parts by mass, per 100 parts by mass of the polymer component contained in the polymer composition. If the content is less than 0.1 parts by mass, the effect of improving adhesion cannot be expected, and if it is more than 30 parts by mass, the alignment of the liquid crystal may deteriorate.
- a photosensitizer can also be used as an additive.
- a colorless sensitizer and a triplet sensitizer are preferred.
- the polymer composition used in the present invention may contain dielectric or conductive substances for the purpose of changing the electrical properties of the phase difference material, such as the dielectric constant or conductivity, and may also contain crosslinking compounds for the purpose of increasing the hardness and density of the film when made into a phase difference material, as long as the effects of the present invention are not impaired.
- the polymer composition used in the present invention is preferably prepared as a coating solution suitable for forming a single-layer retardation material. That is, the polymer composition used in the present invention is preferably prepared as a solution in which the component (A) and the compound that promotes the crosslinking reaction described above, the solvent or compound that improves the film thickness uniformity and surface smoothness, the compound that improves the adhesion between the liquid crystal alignment film and the substrate, etc. are dissolved in the organic solvent of the component (B).
- the content of the component (A) is preferably 1 to 30% by mass in the composition of the present invention, more preferably 5 to 30% by mass.
- the polymer composition used in the present invention may contain other polymers in addition to the polymer of component (A) to the extent that the liquid crystal expression ability and photosensitive performance are not impaired.
- the content of the other polymers in the polymer component is preferably 0.5 to 80 mass %, more preferably 1 to 50 mass %.
- the other polymers include polymers that are not photosensitive side chain polymers capable of expressing liquid crystallinity, such as poly(meth)acrylate, polyamic acid, and polyimide.
- the single-layer retardation material of the present invention can be produced by a method including the following steps (I) to (III). (I) applying the composition of the present invention onto a substrate to form a coating film; (II) a step of irradiating the coating film with polarized ultraviolet light, and (III) a step of heating the coating film irradiated with ultraviolet light to obtain a retardation material.
- Step (I) is a step of applying the polymer composition used in the present invention onto a substrate to form a coating film. More specifically, the composition is applied onto a substrate (e.g., a silicon/silicon dioxide-coated substrate, a silicon nitride substrate, a substrate coated with a metal (e.g., aluminum, molybdenum, chromium, etc.), a glass substrate, a quartz substrate, an ITO substrate, etc.) or a film (e.g., a triacetyl cellulose (TAC) film, a cycloolefin polymer film, a polyethylene terephthalate film, an acrylic film, or other resin film) by a method such as bar coating, spin coating, flow coating, roll coating, slit coating, slit coating followed by spin coating, an inkjet method, or a printing method. After application, the solvent is evaporated at 30 to 200°C, preferably 40 to 150°C, by a heating means such
- step (II) the coating film obtained in step (I) is irradiated with polarized ultraviolet light.
- the polarized ultraviolet light is irradiated from a certain direction relative to the substrate through a polarizing plate.
- the ultraviolet light ultraviolet light having a wavelength in the range of 100 to 400 nm can be used.
- an optimal wavelength is selected through a filter or the like depending on the type of coating film used.
- ultraviolet light having a wavelength in the range of 290 to 400 nm can be selected and used so as to selectively induce a photocrosslinking reaction.
- the ultraviolet light for example, light emitted from a high-pressure mercury lamp can be used.
- the amount of polarized UV light to be irradiated depends on the coating film used.
- the amount of irradiation is preferably within the range of 1 to 70%, and more preferably within the range of 1 to 50%, of the amount of polarized UV light that achieves the maximum value of ⁇ A, which is the difference between the UV absorbance in the direction parallel to the polarization direction of the polarized UV light and the UV absorbance in the direction perpendicular to the polarization direction of the polarized UV light in the coating film.
- step (III) the coating film irradiated with the polarized ultraviolet light in step (II) is heated. By heating, it is possible to impart an orientation control ability to the coating film.
- the heating can be performed using a heating means such as a hot plate, a hot air circulation oven, or an IR (infrared) oven.
- the heating temperature can be determined taking into consideration the temperature at which the liquid crystallinity of the coating film to be used is expressed.
- the heating temperature is preferably within the temperature range at which the polymer of component (A) contained in the composition used in the present invention exhibits liquid crystallinity (hereinafter referred to as the liquid crystal appearance temperature).
- the liquid crystal appearance temperature of the coating film surface is expected to be lower than the liquid crystal appearance temperature when the polymer of component (A) is observed in bulk. For this reason, it is more preferable that the heating temperature is within the temperature range of the liquid crystal appearance temperature of the coating film surface.
- the temperature range of the heating temperature after irradiation with polarized ultraviolet light is preferably a temperature range with a lower limit of a temperature 10°C lower than the lower limit of the temperature range of the liquid crystal appearance temperature of the polymer of component (A) and an upper limit of a temperature 10°C lower than the upper limit of the liquid crystal temperature range. If the heating temperature is lower than the above temperature range, the effect of amplifying the anisotropy by heat in the coating film tends to be insufficient, and if the heating temperature is too high, the state of the coating film tends to become closer to an isotropic liquid state (isotropic phase), in which case it may be difficult to realign in one direction by self-organization.
- the liquid crystal manifestation temperature refers to a temperature that is equal to or higher than the liquid crystal transition temperature at which a phase transition occurs on the polymer or coating surface from a solid phase to a liquid crystal phase, and is equal to or lower than the isotropic phase transition temperature (Tiso) at which a phase transition occurs from a liquid crystal phase to an isotropic phase.
- isotropic phase transition temperature Tiso
- manifesting liquid crystallinity at 130°C or lower means that the liquid crystal transition temperature at which a phase transition occurs from a solid phase to a liquid crystal phase is 130°C or lower.
- the thickness of the coating film formed after heating can be appropriately selected taking into consideration the unevenness of the substrate used and the optical properties, and is preferably 0.5 to 10 ⁇ m, for example.
- the single-layer retardation material of the present invention obtained in this manner has optical properties suitable for applications such as display devices and recording materials, and is particularly suitable as an optical compensation film such as a polarizing plate and retardation plate for liquid crystal displays and organic electroluminescence (EL).
- an optical compensation film such as a polarizing plate and retardation plate for liquid crystal displays and organic electroluminescence (EL).
- the monomers used in the examples are MA-1 to MA-3 having a photoreactive group, MB-1 to MB-2 having a non-photoreactive hydrogen-bonding functional group, MD-1 to MD-8 having a self-crosslinking site, ME-1 having a hydroxyalkyl group, and MF-1 as another component.
- the side chains derived from MA-1 to MA-3 correspond to side chain a
- the side chains derived from MB-1 to MB-2 correspond to side chain b
- the side chains derived from MD-1 to MD-8 correspond to side chain d
- the side chains derived from ME-1 to ME-4 correspond to side chain e
- the side chain derived from MF-1 corresponds to side chain f.
- reagents used in this example are as follows: (Organic solvent) CPN: Cyclopentanone cPenOH: Cyclopentanol (polymerization initiator) V-601: 2,2'-azobis(2-methylpropionate)dimethyl (surfactant) F563: Megafac F-563 (manufactured by DIC) (Crosslinking catalyst) CAT-1: 1,2-ethanedisulfonic acid dihydrate
- MB-1 (6.13 g, 20.0 mmol), tyrosol (2.77 g, 20.0 mmol), N,N-dimethyl-4-aminopyridine (DMAP, 0.2 g), and methylene chloride (30 mL) were stirred, and 1-ethyl-3-(3-dimethylaminopropyl)carbodiimide hydrochloride (EDC, 4.79 g, 25.0 mmol) was added at 5 ° C. (ice water bath), and the mixture was stirred at room temperature for 96 hours.
- EDC 1-ethyl-3-(3-dimethylaminopropyl)carbodiimide hydrochloride
- ME-4-1 was synthesized with reference to JP-A-2005-162688.
- compositions of the polymers obtained in Synthesis Examples 1 to 16 are shown in Table 1.
- COP films S-2 to S-15 with retardation films were produced in the same manner as in Example 1, except that the type of polymer solution, film thickness, exposure conditions (type of cut filter, exposure amount), and main baking conditions were changed as shown in Table 3.
- 365BPF represents a 365 nm bandpass filter
- 300LWPF represents a 300 nm long wave length pass filter.
- Example 1 As shown in Table 3, the same procedure as in Example 1 was carried out except that the type of polymer solution, the film thickness, and the exposure conditions were changed, to produce a COP film R-1 with a retardation film.
- the retardation film of the retardation film-attached COP film (4 x 4 cm) was attached to a glass substrate (3.5 x 3.5 cm) with an adhesive layer using a roller.
- the adhesive layer was an optical double-sided adhesive sheet M3D49 manufactured by Mitate Imaging Co., Ltd.
- the excess retardation film-attached COP film was cut using a cutter, and the COP film was peeled off to obtain a glass substrate with a retardation film.
- the obtained glass substrate with a retardation film was visually observed to evaluate the presence or absence of cracks. When cracks were observed, it was evaluated as "x", and when no cracks were observed, it was evaluated as " ⁇ ".
- Comparative Example 1 which does not contain side chain d, caused cracks during transfer.
- Examples 1 to 15 contained side chain d, which is a self-crosslinking group, so cracks during transfer were suppressed and good phase difference values were shown.
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Abstract
Description
本発明は、重合体を含む組成物から得られる単層位相差材に関する。詳しくは、表示装置や記録材料等の用途に好適な光学特性を有する材料、特に、液晶ディスプレイや有機EL(Electro Luminescence)表示装置の偏光板及び位相差板等の光学補償フィルムに好適に利用できる液晶性重合体を含む組成物から得られる単層位相差材、及び単層位相差材から作製される位相差フィルムに関する。 The present invention relates to a single-layer retardation material obtained from a composition containing a polymer. More specifically, the present invention relates to a material having optical properties suitable for applications such as display devices and recording materials, in particular, a single-layer retardation material obtained from a composition containing a liquid crystal polymer that can be suitably used for optical compensation films such as polarizing plates and retardation plates for liquid crystal displays and organic EL (Electro Luminescence) display devices, and a retardation film made from the single-layer retardation material.
液晶表示装置や有機EL表示装置の表示品位の向上や軽量化等の要求から、偏光板や位相差板等の光学補償フィルムとして、内部の分子配向構造が制御された高分子フィルムの要求が高まっている。この要求に応えるべく、重合性液晶化合物が有する光学異方性を利用したフィルムの開発がなされている。ここで用いられる重合性液晶化合物は、一般に、重合性基と液晶構造部位(スペーサ部とメソゲン部とを有する構造部位)とを有する液晶化合物であり、この重合性基としてアクリル基が広く用いられている。 The demand for improved display quality and lighter weight for liquid crystal displays and organic EL displays has led to an increased demand for polymer films with controlled internal molecular orientation structures as optical compensation films such as polarizing plates and retardation plates. To meet this demand, films that utilize the optical anisotropy of polymerizable liquid crystal compounds are being developed. The polymerizable liquid crystal compounds used here are generally liquid crystal compounds that have a polymerizable group and a liquid crystal structural portion (a structural portion having a spacer portion and a mesogen portion), and acrylic groups are commonly used as the polymerizable group.
このような重合性液晶化合物は、一般的に、紫外線等の放射線を照射して重合する方法で重合体(フィルム)とされる。例えば、アクリル基を有する特定の重合性液晶化合物を配向処理された支持体間に担持し、この化合物を液晶状態に保持しつつ放射線を照射して重合体を得る方法(特許文献1)や、アクリル基を有する2種類の重合性液晶化合物の混合物又はこの混合物にカイラル液晶を混合した組成物に光重合開始剤を添加し、紫外線を照射して重合体を得る方法(特許文献2)が知られている。 Such polymerizable liquid crystal compounds are generally made into polymers (films) by polymerizing them through exposure to radiation such as ultraviolet light. For example, a method is known in which a specific polymerizable liquid crystal compound having an acrylic group is supported between aligned supports, and this compound is irradiated with radiation while maintained in a liquid crystal state to obtain a polymer (Patent Document 1), and a method is known in which a photopolymerization initiator is added to a mixture of two types of polymerizable liquid crystal compounds having an acrylic group, or to a composition in which this mixture is mixed with chiral liquid crystal, and then ultraviolet light is irradiated to obtain a polymer (Patent Document 2).
また、液晶配向膜を必要としない重合性液晶化合物や重合体を用いた配向フィルム(特許文献3、4)、光架橋部位を含む重合体を用いた配向フィルム(特許文献5、6)等、様々な単層塗布型配向フィルムが報告されてきた。 Also, various single-layer coating-type alignment films have been reported, such as alignment films using polymerizable liquid crystal compounds or polymers that do not require a liquid crystal alignment film (Patent Documents 3 and 4), and alignment films using polymers that contain photocrosslinking sites (Patent Documents 5 and 6).
一方、このような単層塗布型のフィルムは、基材から剥離して粘着フィルム等に転写することが効率的であるような場合があるため、工程によっては転写に耐えるものが求められているところ、転写時にクラック(ひび割れ)を生じる場合があることが明らかとなっている。 On the other hand, since it may be more efficient to peel such single-layer coating films from the substrate and transfer them to an adhesive film or the like, there is a demand for films that can withstand transfer depending on the process, but it has become clear that cracks may occur during transfer.
本発明は、上記問題に鑑みなされたものであり、より簡単なプロセスにより、転写時にクラックを生じない単層位相差材作製を可能とする重合体組成物から得られる単層位相差材及び位相差フィルムを提供することを目的とする。 The present invention has been made in consideration of the above problems, and aims to provide a single-layer retardation material and a retardation film obtained from a polymer composition that enables the production of a single-layer retardation material that does not cause cracks during transfer through a simpler process.
本発明者らは、上記課題を解決すべく鋭意検討を重ねた結果、特定の重合体を含む組成物を用いることで、転写時にクラックを生じない単層位相差材及び位相差フィルムが得られることを見出し、本発明を完成した。 As a result of extensive research into solving the above problems, the inventors discovered that by using a composition containing a specific polymer, it is possible to obtain a single-layer retardation material and retardation film that do not crack during transfer, and thus completed the present invention.
したがって、本発明は、下記重合体組成物から得られる単層位相差材を提供する。
<1>(A)光反応性部位を有する側鎖、非光反応水素結合性の官能基を有する側鎖及び自己架橋部位を有する側鎖を有する重合体;及び
(B)有機溶媒
を含有する重合体組成物から得られる単層位相差材。
<2>光反応性部位をする側鎖が、光反応性部位及び水素結合性の官能基を有する側鎖である<1>に記載の単層位相差材。
<3>光反応性部位を有する側鎖が、下記式(a1)~(a6)のいずれかで表される側鎖である<1>に記載の単層位相差材。
<4> 光反応性部位を有する側鎖が、下記式(a1-2)で表される上記<1>に記載の光反応性部位を有する側鎖を有する側鎖型重合体を含有する単層位相差材。
<5> Y1が1,4-フェニレン基である<4>に記載の単層位相差材。
<6> (A)成分である重合体が、さらにヒドロキシアルキル基を有する側鎖を有する上記<1>に記載の単層位相差材。
<7> (A)成分である重合体が、下記式(b)で表される部位を有する側鎖を有する上記<1>に記載の単層位相差材。
R4は、芳香族基、多環芳香族基、脂環族基、フェニレンシクロへキシレン基、複素環式基又は縮合環式基である。
R5は、-CH2-、-O-、-NH-、-C(=O)-、-C(=O)-O-、-O-C(=O)-、-CH=CH-C(=O)-O-、-C(=O)-NH-、-NH-C(=O)-又は-NH-C(=O)-NH-である。
R6は、炭素数1~10のアルキレン基であり、該アルキレン基の1つ又は複数の水素原子が、フッ素原子又は有機基で置換されていてもよい。また、R6中の-CH2-が、-O-、-NH-及び-C(=O)-からなる群から選ばれる基で置換されていてもよい。隣接する-CH2-が同時にこれらの基で置換されていてもよい。
式(b)中の環構造中の水素原子は、炭素数1~6のアルキル基、炭素数1~6のハロアルキル基、炭素数1~6のアルコキシ基、炭素数1~6のハロアルコキシ基、ハロゲン基、シアノ基及びニトロ基から選ばれる置換基で置換されていてもよい。
dは、0、1又は2である。
eは、0又は1である。
fは、0又は1である。
破線は、結合手である。)
<8> 上記式(b)で表される側鎖中の環構造が3個以下である、<7>に記載の単層位相差材。
<9> 側鎖型重合体が、液晶性を発現する<1>に記載の単層位相差材。
<10> <9>に記載の単層位相差材から得られる位相差フィルム。
Accordingly, the present invention provides a single-layer retardation material obtained from the following polymer composition.
<1> A single-layer retardation material obtained from a polymer composition containing: (A) a polymer having a side chain having a photoreactive site, a side chain having a non-photoreactive hydrogen-bonding functional group, and a side chain having a self-crosslinking site; and (B) an organic solvent.
<2> The single-layer retardation material according to <1>, wherein the side chain having the photoreactive site is a side chain having a photoreactive site and a hydrogen-bonding functional group.
<3> The single-layer retardation material according to <1>, wherein the side chain having a photoreactive site is a side chain represented by any one of the following formulas (a1) to (a6):
<4> A single-layer retardation material containing a side chain-type polymer having a side chain having a photoreactive site according to the above <1>, wherein the side chain having a photoreactive site is represented by the following formula (a1-2):
<5> The single-layer retardation material according to <4>, wherein Y 1 is a 1,4-phenylene group.
<6> The single-layer retardation material according to the above item <1>, wherein the polymer (A) further has a side chain having a hydroxyalkyl group.
<7> The single-layer retardation material according to the above <1>, wherein the polymer as the component (A) has a side chain having a moiety represented by the following formula (b):
R4 is an aromatic group, a polycyclic aromatic group, an alicyclic group, a phenylenecyclohexylene group, a heterocyclic group, or a fused ring group.
R5 is -CH2- , -O-, -NH-, -C(=O)-, -C(=O)-O-, -O-C(=O)-, -CH=CH-C(=O)-O-, -C(=O)-NH-, -NH-C(=O)- or -NH-C(=O)-NH-.
R 6 is an alkylene group having 1 to 10 carbon atoms, and one or more hydrogen atoms of the alkylene group may be substituted with a fluorine atom or an organic group. In addition, -CH 2 - in R 6 may be substituted with a group selected from the group consisting of -O-, -NH-, and -C(═O)-. Adjacent -CH 2 - may also be substituted with these groups at the same time.
A hydrogen atom in the ring structure in formula (b) may be substituted with a substituent selected from an alkyl group having 1 to 6 carbon atoms, a haloalkyl group having 1 to 6 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, a haloalkoxy group having 1 to 6 carbon atoms, a halogen group, a cyano group, and a nitro group.
d is 0, 1 or 2.
e is 0 or 1.
f is 0 or 1.
The dashed lines represent bonds.)
<8> The single-layer retardation material according to <7>, wherein the number of ring structures in the side chain represented by the formula (b) is three or less.
<9> The single-layer retardation material according to <1>, wherein the side chain polymer exhibits liquid crystallinity.
<10> A retardation film obtained from the single-layer retardation material according to <9>.
本発明により、転写時にクラックを生じない単層位相差材及び位相差フィルムを提供することができる。 The present invention makes it possible to provide a single-layer retardation material and retardation film that do not crack during transfer.
本発明者らは、鋭意研究を行った結果、以下の知見を得て本発明を完成するに至った。
本発明の単層位相差材の作製に用いる重合体組成物(位相差膜用組成物)は、液晶性を発現し得る感光性の側鎖型重合体(以下、単に側鎖型重合体ともいう。)を有しており、上記重合体組成物を用いて得られる塗膜は、液晶性を発現し得る感光性の側鎖型重合体を有する膜である。この塗膜にはラビング処理を行うこと無く、偏光照射によって配向処理を行う。そして、偏光照射の後、その側鎖型重合体膜を加熱する工程を経て、光学異方性が付与されたフィルム(単層位相差材)となる。このとき、偏光照射によって発現した僅かな異方性がドライビングフォースとなり、液晶性側鎖型重合体自体が自己組織化により効率的に再配向する。その結果、単層位相差材として高効率な配向処理が実現し、高い光学異方性が付与された単層位相差材を得ることができる。
As a result of intensive research, the present inventors have obtained the following findings and have completed the present invention.
The polymer composition (composition for retardation film) used in the preparation of the single-layer retardation material of the present invention has a photosensitive side-chain polymer (hereinafter, also simply referred to as a side-chain polymer) capable of expressing liquid crystallinity, and the coating film obtained using the polymer composition is a film having a photosensitive side-chain polymer capable of expressing liquid crystallinity. This coating film is subjected to an orientation treatment by polarized light irradiation without rubbing treatment. Then, after the polarized light irradiation, the side-chain polymer film is heated to become a film (single-layer retardation material) to which optical anisotropy has been imparted. At this time, the slight anisotropy expressed by the polarized light irradiation becomes a driving force, and the liquid crystal side-chain polymer itself is efficiently reoriented by self-organization. As a result, a highly efficient orientation treatment is realized as a single-layer retardation material, and a single-layer retardation material to which high optical anisotropy has been imparted can be obtained.
また、本発明における重合体組成物では、側鎖型重合体が自己架橋部位を有する側鎖を有することにより、架橋反応を起こして膜の強度を高めることができる。なお、これらは本発明のメカニズムに関する発明者の見解を含むものであり、本発明を拘束するものではない。 In addition, in the polymer composition of the present invention, the side chain type polymer has a side chain with a self-crosslinking site, which causes a crosslinking reaction and increases the strength of the film. Note that these include the inventor's views on the mechanism of the present invention and do not restrict the present invention.
以下、本発明の実施形態について詳しく説明する。
[重合体組成物]
本発明に用いられる重合体組成物は、(A)光反応性部位を有する側鎖、非光反応水素結合性の官能基を有する側鎖及び自己架橋性部位を有する側鎖を有する重合体(以下、側鎖型重合体ともいう);及び(B)有機溶媒を含有する。上記組成物から得られる塗膜には、ラビング処理を行うこと無く、偏光照射によって配向処理を行う。そして、偏光照射の後、その側鎖型重合体膜を加熱する工程を経て、光学異方性が付与されたフィルム(単層位相差膜)となる。このとき、偏光照射によって発現した僅かな異方性がドライビングフォースとなり、側鎖型重合体自体が自己組織化により効率的に再配向する。その結果、単層位相差膜として高効率な配向処理が実現し、高い光学異方性が付与された単層位相差膜を得ることができる。
Hereinafter, embodiments of the present invention will be described in detail.
[Polymer composition]
The polymer composition used in the present invention contains (A) a polymer having a side chain having a photoreactive site, a side chain having a non-photoreactive hydrogen-bonding functional group, and a side chain having a self-crosslinking site (hereinafter also referred to as a side chain type polymer); and (B) an organic solvent. The coating film obtained from the above composition is oriented by polarized light irradiation without rubbing. After the polarized light irradiation, the side chain type polymer film is heated to form a film (single-layer retardation film) with optical anisotropy. At this time, the slight anisotropy developed by the polarized light irradiation becomes a driving force, and the side chain type polymer itself is efficiently reoriented by self-organization. As a result, a highly efficient orientation process is realized as a single-layer retardation film, and a single-layer retardation film with high optical anisotropy can be obtained.
本発明において光反応性とは、(A-1)光架橋(光二量化)反応、(A-2)光異性化、又は(A-3)光フリース転位のいずれかの反応;もしくは複数の反応;を生じる性質をいう。上記側鎖型重合体は、好ましくは(A-1)光架橋反応又は(A-2)光異性化反応を生じる側鎖を有するのがよい。 In the present invention, photoreactivity refers to the property of causing either (A-1) a photocrosslinking (photodimerization) reaction, (A-2) a photoisomerization, or (A-3) a photo-Fries rearrangement reaction; or a combination of these reactions. The above side chain type polymer preferably has a side chain that causes (A-1) a photocrosslinking reaction or (A-2) a photoisomerization reaction.
上記側鎖型重合体は、(i)所定の温度範囲で液晶性を発現する高分子であって、光反応性側鎖を有する高分子である。上記側鎖型重合体は、(ii)200~400nm、好ましくは240~400nmの波長範囲の光で反応し、かつ50~300℃の温度範囲で液晶性を示すのがよい。上記側鎖型重合体は、(iii)200~400nm、好ましくは240~400nmの波長範囲の光、特に偏光紫外線に反応する光反応性側鎖を有することが好ましい。上記側鎖型重合体は、(iv)50~300℃の温度範囲で液晶性を示すためメソゲン基を有することが好ましい。 The side chain polymer is (i) a polymer that exhibits liquid crystallinity in a specific temperature range and has a photoreactive side chain. The side chain polymer is (ii) preferably reacts to light in the wavelength range of 200 to 400 nm, preferably 240 to 400 nm, and exhibits liquid crystallinity in the temperature range of 50 to 300°C. The side chain polymer is (iii) preferably has a photoreactive side chain that reacts to light in the wavelength range of 200 to 400 nm, preferably 240 to 400 nm, particularly polarized ultraviolet light. The side chain polymer is (iv) preferably has a mesogen group to exhibit liquid crystallinity in the temperature range of 50 to 300°C.
上記側鎖型重合体は、前述のように、光反応性を有する光反応性側鎖を有する。該側鎖の構造は、特に限定されないが、上記(A-1)、(A-2)及び/又は(A-3)に示す反応を生じる構造を有し、特に、(A-1)光架橋反応及び/又は(A-2)光異性化反応を生じる構造を有することが好ましい。なお、(A-1)光架橋反応を生じる構造は、その反応後の構造が、熱などの外部ストレスに曝されたとしても側鎖型重合体の配向性を長期間安定に保持できる点で好ましい。また、(A-2)光異性化反応を生じる構造は、光架橋や光フリース転移と比較して低露光量での配向処理が可能となり、位相差フィルム製造時の生産効率を上げられる点で好ましい。 The side chain polymer has a photoreactive side chain having photoreactivity as described above. The structure of the side chain is not particularly limited, but has a structure that causes the reactions shown in (A-1), (A-2) and/or (A-3) above, and in particular, it is preferable that the side chain has a structure that causes the (A-1) photocrosslinking reaction and/or the (A-2) photoisomerization reaction. The (A-1) structure that causes the photocrosslinking reaction is preferable in that the structure after the reaction can stably maintain the orientation of the side chain polymer for a long period of time even if it is exposed to external stress such as heat. The (A-2) structure that causes the photoisomerization reaction is preferable in that it allows orientation treatment with a lower exposure amount compared to photocrosslinking and photofleece transition, and can increase production efficiency when manufacturing retardation films.
上記側鎖型重合体の側鎖の構造は、剛直なメソゲン成分を有する方が、液晶の配向が安定するため好ましい。メソゲン成分として、ビフェニル基、ターフェニル基、フェニルシクロヘキシル基、フェニルベンゾエート基等が挙げられるが、これらに限定されない。 The side chain structure of the side chain type polymer preferably has a rigid mesogen component, since this stabilizes the alignment of the liquid crystal. Examples of mesogen components include, but are not limited to, a biphenyl group, a terphenyl group, a phenylcyclohexyl group, a phenylbenzoate group, etc.
上記重合体に含まれる紫外線で光反応する光反応性部位を有する側鎖(以下、側鎖aともいう。)としては、下記式(a1)~(a6)のいずれかで表されるものが好ましい。なお、溶媒への溶解性の観点から、1つの側鎖aが有するベンゼン環の数は、3つ以内が好ましい。
上記炭素数1~12のアルキレン基は、直鎖状、分岐状、環状のいずれでもよく、その具体例としては、メチレン基、エチレン基、プロパン-1,3-ジイル基、ブタン-1,4-ジイル基、ペンタン-1,5-ジイル基、ヘキサン-1,6-ジイル基、ヘプタン-1,7-ジイル基、オクタン-1,8-ジイル基、ノナン-1,9-ジイル基、デカン-1,10-ジイル基等が挙げられる。 The alkylene group having 1 to 12 carbon atoms may be linear, branched, or cyclic, and specific examples include methylene, ethylene, propane-1,3-diyl, butane-1,4-diyl, pentane-1,5-diyl, hexane-1,6-diyl, heptane-1,7-diyl, octane-1,8-diyl, nonane-1,9-diyl, and decane-1,10-diyl.
上記ハロゲン原子としては、フッ素原子、塩素原子、臭素原子、ヨウ素原子等が挙げられる。 The above halogen atoms include fluorine atoms, chlorine atoms, bromine atoms, iodine atoms, etc.
上記炭素数1~5のアルキル基は、直鎖状、分岐状のいずれでもよく、その具体例としては、メチル基、エチル基、n-プロピル基、イソプロピル基、n-ブチル基、tert-ブチル基、n-ペンチル基等が挙げられる。 The alkyl group having 1 to 5 carbon atoms may be either linear or branched, and specific examples include a methyl group, an ethyl group, an n-propyl group, an isopropyl group, an n-butyl group, a tert-butyl group, and an n-pentyl group.
上記炭素数2~6のアルキルカルボニル基の具体例としては、メチルカルボニル(アセチル)基、エチルカルボニル基、n-プロピルカルボニル基、n-ブチルカルボニル基、n-ペンチルカルボニル基等が挙げられる。 Specific examples of the alkylcarbonyl group having 2 to 6 carbon atoms include a methylcarbonyl (acetyl) group, an ethylcarbonyl group, an n-propylcarbonyl group, an n-butylcarbonyl group, and an n-pentylcarbonyl group.
上記炭素数1~5のアルコキシ基の具体例としては、メトキシ基、エトキシ基、n-プロポキシ基、イソプロポキシ基、n-ブトキシ基、n-ペンチルオキシ基等が挙げられる。 Specific examples of the alkoxy group having 1 to 5 carbon atoms include a methoxy group, an ethoxy group, an n-propoxy group, an isopropoxy group, an n-butoxy group, and an n-pentyloxy group.
上記炭素数5~8の2価の脂環式炭化水素基の具体例としては、シクロペンタンジイル基、シクロヘキサンジイル基、シクロヘプタンジイル基、シクロオクタンジイル基が挙げられる。 Specific examples of the divalent alicyclic hydrocarbon group having 5 to 8 carbon atoms include a cyclopentanediyl group, a cyclohexanediyl group, a cycloheptanediyl group, and a cyclooctanediyl group.
上記炭素数3~7のシクロアルキル基の具体例としては、シクロプロピル基、シクロブチル基、シクロペンチル基、シクロヘキシル基等が挙げられる。 Specific examples of the cycloalkyl group having 3 to 7 carbon atoms include a cyclopropyl group, a cyclobutyl group, a cyclopentyl group, and a cyclohexyl group.
上記炭素数1~3のアルキル基は、直鎖状、分岐状のいずれでもよく、その具体例としては、メチル基、エチル基、n-プロピル基、イソプロピル基が挙げられる。 The alkyl group having 1 to 3 carbon atoms may be either linear or branched, and specific examples include a methyl group, an ethyl group, an n-propyl group, and an isopropyl group.
側鎖aとしては、下記式(a1-1)、(a1-2)、(a2-1)、(a3-1)、(a4-1)、(a5-1)又は(a6-1)で表されるものがより好ましい。
式(a1-1)で表される側鎖としては、下記式(a1-1-1)で表される側鎖が好ましく、式(a1-2)で表される側鎖としては、式(a1-2-1)で表される側鎖が好ましい。
式(a2-1)で表される側鎖としては、下記式(a2-1-1)で表される側鎖が好ましい。
式(a3-1)で表される側鎖としては、下記式(a3-1-1)、(a3-1-2)又は(a3-1-3)で表される側鎖が好ましい。
式(a4-1)で表される側鎖としては、下記式(a4-1-1)、(a4-1-2)、(a4-1-3)又は(a4-1-4)で表される側鎖が好ましい。
式(a5-1)で表される側鎖としては、下記式(a5-1-1)又は(a5-1-2)で表される側鎖が好ましい。
式(a6-1)で表される側鎖としては、下記式(a6-1-1)、(a6-1-2)又は(a6-1-3)で表される側鎖が好ましい。
光反応性部位を有する側鎖としては、上記(a1-2)で表される側鎖においてRがHである末端COOHの側鎖が好ましく、そのなかでもY1が1,4-フェニレン基である側鎖がさらに好ましい。 As the side chain having a photoreactive site, a terminal COOH side chain in which R is H in the side chain represented by (a1-2) above is preferred, and among these, a side chain in which Y 1 is a 1,4-phenylene group is more preferred.
(A)側鎖型重合体は、250~400nmの波長範囲の光で反応し、かつ100~300℃の温度範囲で液晶性を示すものが好ましい。(A)側鎖型重合体は、250~400nmの波長範囲の光に反応する感光性側鎖を有することが好ましい。 (A) The side chain polymer preferably reacts to light in the wavelength range of 250 to 400 nm and exhibits liquid crystallinity in the temperature range of 100 to 300°C. (A) The side chain polymer preferably has a photosensitive side chain that reacts to light in the wavelength range of 250 to 400 nm.
(A)側鎖型重合体は、主鎖に感光性を有する側鎖が結合しており、光に感応して架橋反応又は異性化反応を起こすことができる。液晶性を発現し得る感光性の側鎖型重合体の構造は、そうした特性を満足するものであれば特に限定されないが、側鎖構造に剛直なメソゲン成分を有することが好ましい。上記側鎖型重合体を単層位相差材とした際に、安定な光学異方性を得ることができる。 (A) Side-chain polymers have photosensitive side chains bonded to their main chains, and can undergo crosslinking or isomerization reactions in response to light. The structure of the photosensitive side-chain polymer capable of expressing liquid crystallinity is not particularly limited as long as it satisfies such characteristics, but it is preferable for the side-chain structure to have a rigid mesogen component. When the above-mentioned side-chain polymer is used as a single-layer retardation material, stable optical anisotropy can be obtained.
液晶性を発現し得る感光性の側鎖型重合体の構造のより具体的な例としては、(メタ)アクリレート、イタコネート、フマレート、マレエート、α-メチレン-γ-ブチロラクトン、スチレン、ビニル、マレイミド、ノルボルネン等のラジカル重合性基及びシロキサンからなる群から選択される少なくとも1種から構成された主鎖と、側鎖aとを有する構造であることが好ましい。 A more specific example of a photosensitive side-chain polymer structure capable of exhibiting liquid crystallinity is preferably a structure having a main chain composed of at least one selected from the group consisting of radical polymerizable groups such as (meth)acrylate, itaconate, fumarate, maleate, α-methylene-γ-butyrolactone, styrene, vinyl, maleimide, norbornene, and siloxane, and a side chain a.
(A)成分である重合体は、上記式(a)で表される光配向性部位を有する側鎖とともに、非光反応水素結合性の官能基を有する側鎖を有する。非光反応水素結合性の官能基を有する側鎖としては、下記式(b)で表されるカルボン酸側鎖である側鎖bを有することが好ましい。
R4は、芳香族基、多環芳香族基、脂環族基、フェニルシクロヘキシル基、複素環式基又は縮合環式基である。
R5は、-CH2-、-O-、-NH-、-C(=O)-、-C(=O)-O-、-O-C(=O)-、-CH=CH-C(=O)-O-、-C(=O)-NH-、-NH-C(=O)-又は-NH-C(=O)-NH-である。
R6は、炭素数1~10のアルキレン基であり、該アルキレン基の1つ又は複数の水素原子が、フッ素原子又は有機基で置換されていてもよい。また、R6中の-CH2-が、-O-、-NH-及び-C(=O)-からなる群から選ばれる基で置換されていてもよい。隣接する-CH2-が同時にこれらの基で置換されていてもよい。
式(b)中の環構造中の水素原子は、炭素数1~6のアルキル基、炭素数1~6のハロアルキル基、炭素数1~6のアルコキシ基、炭素数1~6のハロアルコキシ基、ハロゲン基、シアノ基及びニトロ基から選ばれる置換基で置換されていてもよい。
dは、0、1又は2である。
eは、0又は1である。
fは、0又は1である。
破線は、結合手である。)
The polymer (A) has a side chain having a non-photoreactive hydrogen-bonding functional group as well as a side chain having a photo-alignable moiety represented by the above formula (a). The side chain having a non-photoreactive hydrogen-bonding functional group preferably has a side chain b, which is a carboxylic acid side chain represented by the following formula (b).
R4 is an aromatic group, a polycyclic aromatic group, an alicyclic group, a phenylcyclohexyl group, a heterocyclic group, or a fused ring group.
R5 is -CH2- , -O-, -NH-, -C(=O)-, -C(=O)-O-, -O-C(=O)-, -CH=CH-C(=O)-O-, -C(=O)-NH-, -NH-C(=O)- or -NH-C(=O)-NH-.
R 6 is an alkylene group having 1 to 10 carbon atoms, and one or more hydrogen atoms of the alkylene group may be substituted with a fluorine atom or an organic group. In addition, -CH 2 - in R 6 may be substituted with a group selected from the group consisting of -O-, -NH-, and -C(═O)-. Adjacent -CH 2 - may also be substituted with these groups at the same time.
A hydrogen atom in the ring structure in formula (b) may be substituted with a substituent selected from an alkyl group having 1 to 6 carbon atoms, a haloalkyl group having 1 to 6 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, a haloalkoxy group having 1 to 6 carbon atoms, a halogen group, a cyano group, and a nitro group.
d is 0, 1 or 2.
e is 0 or 1.
f is 0 or 1.
The dashed lines represent bonds.)
上記式(b)で表される側鎖中の環構造の個数は好ましくは3個以下である。ここにおいて、縮合環の環構造は1個として数える。すなわち、フェニレン基やナフチレン基中の環構造は1個であり、ビフェニリレン基やシクロヘキサンジイル基中の環構造は2個である。 The number of ring structures in the side chain represented by the above formula (b) is preferably 3 or less. Here, the ring structure of a condensed ring is counted as one. That is, there is one ring structure in a phenylene group or naphthylene group, and there are two ring structures in a biphenylylene group or cyclohexanediyl group.
側鎖bとしては、例えば、下記式(b1)で表されるものが好ましい。
(A)側鎖型重合体は、100~300℃の温度範囲で液晶性を示すため、更に液晶性のみを発現する側鎖(以下、側鎖cともいう。)を有することができる。なお、ここで「液晶性のみを発現する」とは、側鎖cのみを有するポリマーは、本発明の位相差材の作製プロセス(すなわち、後述する工程(I)~(III))中に、光配向性を示さず、液晶性のみを発現するという意味である。 The (A) side chain type polymer exhibits liquid crystallinity in the temperature range of 100 to 300°C, and can further have a side chain that only exhibits liquid crystallinity (hereinafter also referred to as side chain c). Note that "exhibiting only liquid crystallinity" here means that a polymer having only side chain c does not exhibit photoalignment and only exhibits liquid crystallinity during the process for producing the retardation material of the present invention (i.e., steps (I) to (III) described below).
側鎖cとしては、下記式(1)~(6)からなる群から選ばれるいずれか1種又は2種の液晶性側鎖が好ましい。
(A)側鎖型重合体は、自己架橋性部位を有する。自己架橋性部位としては、トリアルコキシシリル基、ブロックイソシアネート基、エポキシ基、オキセタン基、オキサゾリン環を有する基、N-アルコキシメチルアミド基、N-ヒドロキシメチルアミド基、及びビニル基等が挙げられる。これらの自己架橋性部位を有する側鎖(以下、側鎖dともいう。)は、それ同士が反応するか、(A)成分である重合体が有するCOOH基及びOH基と反応して、架橋構造を形成する。その結果、得られる位相差材の強度を高めることができる。 The side chain type polymer (A) has a self-crosslinking moiety. Examples of the self-crosslinking moiety include trialkoxysilyl groups, blocked isocyanate groups, epoxy groups, oxetane groups, groups having an oxazoline ring, N-alkoxymethylamide groups, N-hydroxymethylamide groups, and vinyl groups. These side chains having self-crosslinking moieties (hereinafter also referred to as side chain d) react with each other or with the COOH groups and OH groups of the polymer, which is component (A), to form a crosslinked structure. As a result, the strength of the resulting retardation material can be increased.
(A)側鎖型重合体が有する、光反応性部位を有する側鎖(側鎖a)と自己架橋性部位を有する側鎖(側鎖d)の組み合わせとしては、以下のものが挙げられる。
光反応性部位及び水素結合性の官能基を有する側鎖とトリアルコキシシリル基を有する側鎖;光反応性部位及び水素結合性の官能基を有する側鎖とブロックイソシアネート基を有する側鎖;光反応性部位及び水素結合性の官能基を有する側鎖とエポキシ基を有する側鎖;光反応性部位及び水素結合性の官能基を有する側鎖とオキセタン基を有する側鎖;光反応性部位及び水素結合性の官能基を有する側鎖とオキサゾリン環を有する側鎖;光反応性部位及び水素結合性の官能基を有する側鎖とN-アルコキシメチルアミド基を有する側鎖;光反応性部位及び水素結合性の官能基を有する側鎖とN-ヒドロキシメチルアミド基を有する側鎖;光反応性部位及び水素結合性の官能基を有する側鎖とビニル基を有する側鎖;
光反応性部位及び末端に非水素結合性の官能基を有する側鎖とトリアルコキシシリル基を有する側鎖;光反応性部位及び末端に非水素結合性の官能基を有する側鎖とブロックイソシアネート基を有する側鎖;光反応性部位及び末端に非水素結合性の官能基を有する側鎖とエポキシ基を有する側鎖;光反応性部位及び末端に非水素結合性の官能基を有する側鎖とオキセタン基を有する側鎖;光反応性部位及び末端に非水素結合性の官能基を有する側鎖とオキサゾリン環を有する側鎖;光反応性部位及び末端に非水素結合性の官能基を有する側鎖とN-アルコキシメチルアミド基を有する側鎖;光反応性部位及び末端に非水素結合性の官能基を有する側鎖とN-ヒドロキシメチルアミド基を有する側鎖;光反応性部位及び末端に非水素結合性の官能基を有する側鎖とビニル基を有する側鎖。
Examples of the combination of the side chain having a photoreactive moiety (side chain a) and the side chain having a self-crosslinking moiety (side chain d) that the side chain type polymer (A) has are as follows:
a side chain having a photoreactive site and a hydrogen-bonding functional group, and a side chain having a trialkoxysilyl group; a side chain having a photoreactive site and a hydrogen-bonding functional group, and a side chain having a blocked isocyanate group; a side chain having a photoreactive site and a hydrogen-bonding functional group, and a side chain having an epoxy group; a side chain having a photoreactive site and a hydrogen-bonding functional group, and a side chain having an oxetane group; a side chain having a photoreactive site and a hydrogen-bonding functional group, and a side chain having an oxazoline ring; a side chain having a photoreactive site and a hydrogen-bonding functional group, and a side chain having an N-alkoxymethylamide group; a side chain having a photoreactive site and a hydrogen-bonding functional group, and a side chain having an N-hydroxymethylamide group; a side chain having a photoreactive site and a hydrogen-bonding functional group, and a side chain having a vinyl group;
a side chain having a photoreactive site, a non-hydrogen-bonding functional group at its terminal, and a side chain having a trialkoxysilyl group; a side chain having a photoreactive site, a non-hydrogen-bonding functional group at its terminal, and a blocked isocyanate group; a side chain having a photoreactive site, a non-hydrogen-bonding functional group at its terminal, and a side chain having an epoxy group; a side chain having a photoreactive site, a non-hydrogen-bonding functional group at its terminal, and a side chain having an oxetane group; a side chain having a photoreactive site, a non-hydrogen-bonding functional group at its terminal, and a side chain having an oxazoline ring; a side chain having a photoreactive site, a non-hydrogen-bonding functional group at its terminal, and a side chain having an N-alkoxymethylamide group; a side chain having a photoreactive site, a non-hydrogen-bonding functional group at its terminal, and a N-hydroxymethylamide group; a side chain having a photoreactive site, a non-hydrogen-bonding functional group at its terminal, and a side chain having a vinyl group.
(A)側鎖型重合体は、ヒドロキシアルキル基を有する側鎖(以下、側鎖eともいう。)を有していてもよい。ヒドロキシアルキル基を有する側鎖は、アルコール性ヒドロキシ基を有することにより、側鎖dの自己架橋性部位がN‐アルコキシメチルアミド部位又はN‐ヒドロキシメチルアミド部位であった際の側鎖dとの架橋反応を誘起することができる。 (A) The side chain type polymer may have a side chain having a hydroxyalkyl group (hereinafter also referred to as side chain e). The side chain having a hydroxyalkyl group has an alcoholic hydroxy group, and thus can induce a crosslinking reaction with side chain d when the self-crosslinking site of side chain d is an N-alkoxymethylamide site or an N-hydroxymethylamide site.
本発明で用いる側鎖型重合体は、主鎖に感光性を有する側鎖が結合しており、波長200~400nmから選択された最適な光、特に、波長254nm、313nm及び365nmの光に感応して架橋反応、異性化反応又はフリース転位を起こすことができる。感光性の側鎖型重合体の構造は、そのような特性を満足するものであれば特に限定されないが、側鎖構造に剛直なメソゲン成分を有することが好ましい。上記側鎖型重合体を単層位相差膜とした際に、安定な光学異方性を得ることができる。 The side chain polymer used in the present invention has a photosensitive side chain bonded to the main chain, and can undergo a crosslinking reaction, isomerization reaction, or Fries rearrangement in response to optimal light selected from a wavelength range of 200 to 400 nm, particularly light with wavelengths of 254 nm, 313 nm, and 365 nm. The structure of the photosensitive side chain polymer is not particularly limited as long as it satisfies such characteristics, but it is preferable for the side chain structure to have a rigid mesogen component. When the above side chain polymer is made into a single-layer retardation film, stable optical anisotropy can be obtained.
感光性の側鎖型重合体の構造のより具体的な例としては、(メタ)アクリレート、イタコネート、フマレート、マレエート、α-メチレン-γ-ブチロラクトン、スチレン、ビニル、マレイミド、ノルボルネン等のラジカル重合性基及びシロキサンからなる群から選択される少なくとも1種から構成された主鎖と、側鎖aとを有する構造が好ましい。 A more specific example of the structure of the photosensitive side chain type polymer is preferably a structure having a main chain composed of at least one selected from the group consisting of radical polymerizable groups such as (meth)acrylate, itaconate, fumarate, maleate, α-methylene-γ-butyrolactone, styrene, vinyl, maleimide, norbornene, and siloxane, and a side chain a.
本発明で用いる側鎖型重合体は、側鎖aを与えるモノマー、側鎖bを与えるモノマー、側鎖dを与えるモノマー、及び必要に応じて側鎖cを与えるモノマー、側鎖eを与えるモノマーを重合して得ることができる。 The side chain polymer used in the present invention can be obtained by polymerizing a monomer that provides side chain a, a monomer that provides side chain b, a monomer that provides side chain d, and, if necessary, a monomer that provides side chain c and a monomer that provides side chain e.
側鎖aを与えるモノマー(以下、モノマーMAともいう。)としては、下記式(M1-1)、(M1-2)、(M2)、(M3)、(M4)、(M5)又は(M6)で表される化合物が挙げられる。
式(M1-1)、(M1-2)、(M2)、(M3)、(M4)、(M5)及び(M6)中、PGは、重合性基であるが、下記式(PG1)~(PG8)のいずれかで表される基が好ましい。なかでも、重合反応の制御が容易であるという点及び重合体の安定性の観点から、式(PG1)で表されるアクリル基又はメタクリル基が好ましい。
式(M1-1)で表される化合物としては、下記式(M1-1-1)で表されるものが好ましく、式(M1-2)で表される化合物としては、下記式(M1-2-1)で表されるものが好ましい。
式(M2)で表される化合物としては、下記式(M2-1)で表されるものが好ましい。
式(M3)で表される化合物としては、下記式(M3-1)で表されるものが好ましい。
式(M4)で表される化合物としては、下記式(M4-1)で表されるものが好ましい。
式(M5)で表される化合物としては、下記式(M5-1)で表されるものが好ましい。
式(M6)で表される化合物としては、下記式(M6-1)で表されるものが好ましい。
式(M1-1-1)で表される化合物としては、下記式(M1-1-2)で表されるものが好ましく、式(M1-2-1)で表される化合物としては、下記式(M1-2-2)で表されるものが好ましい。
式(M2-1)で表される化合物としては、下記式(M2-2)で表されるものが好ましい。
式(M3-1)で表される化合物としては、下記式(M3-2)、(M3-3)又は(M3-4)で表されるものが好ましい。
式(M4-1)で表される化合物としては、下記式(M4-2)、(M4-3)、(M4-4)又は(M4-5)で表されるものが好ましい。
式(M5-1)で表される化合物としては、下記式(M5-2)又は(M5-3)で表されるものが好ましい。
式(M6-1)で表される化合物としては、下記式(M6-2)、(M6-3)、又は(M6-4)で表されるものが好ましい。
式(M1-1)で表される化合物としては、例えば、下記式(A-1-1-1)~(A-1-1-13)のいずれかで表されるものが挙げられる。下記式(A-1-1-1)~(A-1-1-13)中、PGは、重合性基であり、s1は、メチレン基の数を表し、2~9の整数である。R11は、-H、-CH3、-OCH3、-C(CH3)3、-C(=O)-CH3又は-CNであり、R12は、-H、-CH3、-OCH3、-CN又は-Fである。
式(M1-2)で表される化合物としては、例えば、下記式(A-1-2-1)~(A-1-2-4)のいずれかで表されるものが挙げられる。下記式中、PGは、重合性基であり、s1は、上記と同じである。
式(M1-2)で表される化合物の具体例としては、4-(6-メタクリルオキシヘキシル-1-オキシ)ケイ皮酸、4-(6-アクリルオキシヘキシル-1-オキシ)けい皮酸、4-(3-メタクリルオキシプロピル-1-オキシ)ケイ皮酸、4-[4-(6-メタクリルオキシヘキシル-1-オキシ)ベンゾイルオキシ]ケイ皮酸等が挙げられる。 Specific examples of compounds represented by formula (M1-2) include 4-(6-methacryloxyhexyl-1-oxy)cinnamic acid, 4-(6-acryloxyhexyl-1-oxy)cinnamic acid, 4-(3-methacryloxypropyl-1-oxy)cinnamic acid, and 4-[4-(6-methacryloxyhexyl-1-oxy)benzoyloxy]cinnamic acid.
式(M2)で表される化合物としては、例えば、下記式(A-2-1)~(A-2-9)のいずれかで表されるものが挙げられる。下記式(A-2-1)~(A-2-9)中、PGは、重合性基であり、s1及びs2は、メチレン基の数を表し、それぞれ独立に、2~9の整数である。R21は、-CH3、-OCH3、-C(CH3)3、-C(=O)-CH3、-CN又は-Fである。
式(M3)で表される化合物としては、例えば、下記式(A-3-1)~(A-3-5)のいずれかで表されるものが挙げられる。下記式中、PGは、重合性基であり、s1は、上記と同じである。
式(M4)で表される化合物としては、例えば、下記式(A-4-1)~(A-4-4)のいずれかで表されるものが挙げられる。下記式中、PGは、重合性基であり、s1は、上記と同じである。
式(M5)で表される化合物としては、例えば、下記式(A-5-1)~(A-5-3)のいずれかで表されるものが挙げられる。下記式中、PGは、重合性基であり、s1は、上記と同じである。
式(M6)で表される化合物としては、例えば、下記式(A-6-1)~(A-6-3)のいずれかで表されるものが挙げられる。下記式中、PGは、重合性基であり、s1は、上記と同じである。
上記各モノマーは、あるものは市販されており、あるものは、例えば国際公開第2015/002292号等に記載の方法で製造できる。 Some of the above monomers are commercially available, and others can be produced by methods described, for example, in WO 2015/002292.
側鎖aを与えるモノマーとしては、上記(M1-2)で表される化合物においてRがHである末端COOHの化合物が好ましく、そのなかでもY1が1,4-フェニレン基である化合物がさらに好ましい。また、PGとしては(PG1)~(PG5)のいずれかであるものが好ましい。 As the monomer that gives the side chain a, the compound represented by (M1-2) above having a terminal COOH group in which R is H is preferred, and among these, the compound in which Y 1 is a 1,4-phenylene group is more preferred. In addition, PG is preferably any one of (PG1) to (PG5).
このようなモノマーの好ましい例としては、下記式(M1-2-a1)~(M1-2-a6)で表されるものが挙げられる。
式(b)で表される構造を有するモノマー(以下、モノマーMBともいう。)としては、下記式(MB1)で表される化合物が挙げられる。
モノマーMBとしては、下記式(MB1A)で表されるものが好ましい。
モノマーMB1Aとしては、下記MB1A-1~MB1A-8で表されるモノマーが好ましい。
これらモノマーのうち、あるものは市販されており、あるものは公知物質から公知の製造方法にて製造することができる。 Some of these monomers are commercially available, and others can be produced from known substances using known production methods.
上記式(MB1A-1)~(MB1A-8)中、PGは、重合反応の制御が容易であるという点及び重合体の安定性の観点から、式(PG1)で表されるアクリル基又はメタクリル基が好ましく、クラック耐性の観点から、アクリル基がより好ましい。 In the above formulas (MB1A-1) to (MB1A-8), PG is preferably an acrylic or methacrylic group represented by formula (PG1) from the viewpoint of ease of control of the polymerization reaction and the stability of the polymer, and is more preferably an acrylic group from the viewpoint of crack resistance.
側鎖cの液晶性のみを発現する構造を有するモノマー(以下、モノマーMCともいう。)は、該モノマー由来のポリマーが液晶性を発現できるモノマーのことである。 A monomer having a structure that only expresses liquid crystallinity in side chain c (hereinafter also referred to as monomer MC) is a monomer that allows a polymer derived from the monomer to express liquid crystallinity.
側鎖cの有するメソゲン基としては、下記式(c1)~(c10)のいずれかで表される構造が好ましい。
モノマーMCのより具体的な例としては、炭化水素、(メタ)アクリレート、イタコネート、フマレート、マレエート、α-メチレン-γ-ブチロラクトン、スチレン、ビニル、マレイミド、ノルボルネン等のラジカル重合性基及びシロキサンからなる群から選択される少なくとも1種に由来する重合性基と、上記式(c1)~(c10)の少なくとも1種からなる構造を有する構造であることが好ましい。特に、モノマーMCは、重合性基として(メタ)アクリレートを有するものであるものが好ましい。 More specific examples of monomer MC include those having a polymerizable group derived from at least one selected from the group consisting of radical polymerizable groups such as hydrocarbons, (meth)acrylates, itaconates, fumarates, maleates, α-methylene-γ-butyrolactone, styrene, vinyl, maleimides, and norbornenes, and siloxanes, and a structure consisting of at least one of the above formulas (c1) to (c10). In particular, monomer MC is preferably one having (meth)acrylate as the polymerizable group.
モノマーMCの好ましい例としては、下記式(MC-1)~(MC-6)で表されるものが挙げられる。
側鎖dの自己架橋性部位を有するモノマー(以下、モノマーMDともいう。)としては、例えば、N-ヒドロキシメチル(メタ)アクリルアミド、N-メトキシメチル(メタ)アクリルアミド、N-エトキシメチル(メタ)アクリルアミド、N-ブトキシメチル(メタ)アクリルアミド等のヒドロキシメチル基又はアルコキシメチル基で置換された(メタ)アクリルアミド化合物;3-トリメトキシシリルプロピルアクリレート、3-トリエトキシシリルプロピルアクリレート、3-トリメトキシシリルプロピルメタクリレート、3-トリエトキシシリルプロピルメタクリレート等のトリアルコキシシリル基を有するモノマー;グリシジルアクリレート、グリシジルメタクリレート、3,4-エポキシシクロヘキシルメチルメタクリレート等のグリシジル基又はエポキシシクロヘキシル基を有するモノマー;アクリル酸アリル、メタクリル酸アリル等のビニル基を有するモノマー;メタクリル酸2-(0-(1’-メチルプロピリデンアミノ)カルボキシアミノ)エチル、メタクリル酸2-(3,5-ジメチルピラゾリル)カルボニルアミノ)エチル等のブロックイソシアネート基を有するモノマー;2-ビニル-2-オキサゾリン、2-イソプロペニル-2-オキサゾリン等のオキサゾリン環を含有するモノマー;メタクリル酸(3-エチルオキセタン-3-イル)メチル等のオキセタン基を有すモノマー等が挙げられる。なお、(メタ)アクリルアミドとは、アクリルアミドとメタクリルアミドの双方を意味する。 Examples of monomers having a self-crosslinking site in the side chain d (hereinafter also referred to as monomer MD) include (meth)acrylamide compounds substituted with a hydroxymethyl group or an alkoxymethyl group, such as N-hydroxymethyl(meth)acrylamide, N-methoxymethyl(meth)acrylamide, N-ethoxymethyl(meth)acrylamide, and N-butoxymethyl(meth)acrylamide; monomers having a trialkoxysilyl group, such as 3-trimethoxysilylpropyl acrylate, 3-triethoxysilylpropyl acrylate, 3-trimethoxysilylpropyl methacrylate, and 3-triethoxysilylpropyl methacrylate; glycidyl acrylate, glycidyl monomers having a glycidyl group or an epoxycyclohexyl group, such as dimethyl methacrylate and 3,4-epoxycyclohexylmethyl methacrylate; monomers having a vinyl group, such as allyl acrylate and allyl methacrylate; monomers having a blocked isocyanate group, such as 2-(0-(1'-methylpropylideneamino)carboxyamino)ethyl methacrylate and 2-(3,5-dimethylpyrazolyl)carbonylamino)ethyl methacrylate; monomers containing an oxazoline ring, such as 2-vinyl-2-oxazoline and 2-isopropenyl-2-oxazoline; and monomers having an oxetane group, such as (3-ethyloxetan-3-yl)methyl methacrylate. Note that (meth)acrylamide means both acrylamide and methacrylamide.
側鎖eを与えるモノマー(以下、モノマーMEともいう。)としては、例えば、2-ヒドロキシエチルアクリレート、2-ヒドロキシエチルメタクリレート、2-ヒドロキシプロピルアクリレート、2-ヒドロキシプロピルメタクリレート、3-ヒドロキシプロピルアクリレート、3-ヒドロキシプロピルメタクリレート、4-ヒドロキシブチルアクリレート、4-ヒドロキシブチルメタクリレート、6-ヒドロキシヘキシルアクリレート、6-ヒドロキシヘキシルメタクリレート、8-ヒドロキシオクチルアクリレート、8-ヒドロキシオクチルメタクリレート、12-ヒドロキシドデシルアクリレート、12-ヒドロキシドデシルメタクリレート、2,3-ジヒドロキシプロピルアクリレート、2,3-ジヒドロキシプロピルメタクリレート、ジエチレングリコールモノアクリレート、ジエチレングリコールモノメタクリレート、カプロラクトン2-(アクリロイルオキシ)エチルエステル、カプロラクトン2-(メタクリロイルオキシ)エチルエステル、ポリ(エチレングリコール)エチルエーテルアクリレート、ポリ(エチレングリコール)エチルエーテルメタクリレート、5-アクリロイルオキシ-6-ヒドロキシノルボルネン-2-カルボキシリック-6-ラクトン、5-メタクリロイルオキシ-6-ヒドロキシノルボルネン-2-カルボキシリック-6-ラクトン(4-(ヒドロキシメチル)シクロヘキシル)メチルアクリレート、下記式(ME-a1)~(ME-a3)で表される化合物等が挙げられる。
また、光反応性及び/又は液晶性の発現能を損なわない範囲で、非液晶性の側鎖fとしてモノマーMFを共重合することができる。モノマーMFとしては、例えば工業的に入手できるラジカル重合反応可能なモノマーが挙げられる。具体例としては、不飽和カルボン酸、アクリル酸エステル化合物、メタクリル酸エステル化合物、マレイミド化合物、アクリロニトリル、マレイン酸無水物、スチレン化合物、ビニル化合物、アクリルアミド化合物、メタクリルアミド化合物等が挙げられる。 In addition, a monomer MF can be copolymerized as a non-liquid crystal side chain f to the extent that the photoreactivity and/or liquid crystallinity is not impaired. Examples of the monomer MF include industrially available monomers capable of radical polymerization reactions. Specific examples include unsaturated carboxylic acids, acrylic acid ester compounds, methacrylic acid ester compounds, maleimide compounds, acrylonitrile, maleic anhydride, styrene compounds, vinyl compounds, acrylamide compounds, and methacrylamide compounds.
不飽和カルボン酸の具体例としてはアクリル酸、メタクリル酸、イタコン酸、マレイン酸、フマル酸等が挙げられる。 Specific examples of unsaturated carboxylic acids include acrylic acid, methacrylic acid, itaconic acid, maleic acid, and fumaric acid.
アクリル酸エステル化合物としては、例えば、メチルアクリレート、エチルアクリレート、イソプロピルアクリレート、ベンジルアクリレート、ナフチルアクリレート、アントリルアクリレート、アントリルメチルアクリレート、フェニルアクリレート、2,2,2-トリフルオロエチルアクリレート、tert-ブチルアクリレート、シクロヘキシルアクリレート、イソボルニルアクリレート、2-メトキシエチルアクリレート、メトキシトリエチレングリコールアクリレート、2-エトキシエチルアクリレート、テトラヒドロフルフリルアクリレート、3-メトキシブチルアクリレート、2-メチル-2-アダマンチルアクリレート、2-エチル-2-アダマンチルアクリレート、アクリル酸テトラヒドロジシクロペンタジエニル等が挙げられる。 Examples of acrylic acid ester compounds include methyl acrylate, ethyl acrylate, isopropyl acrylate, benzyl acrylate, naphthyl acrylate, anthryl acrylate, anthryl methyl acrylate, phenyl acrylate, 2,2,2-trifluoroethyl acrylate, tert-butyl acrylate, cyclohexyl acrylate, isobornyl acrylate, 2-methoxyethyl acrylate, methoxytriethylene glycol acrylate, 2-ethoxyethyl acrylate, tetrahydrofurfuryl acrylate, 3-methoxybutyl acrylate, 2-methyl-2-adamantyl acrylate, 2-ethyl-2-adamantyl acrylate, and tetrahydrodicyclopentadienyl acrylate.
メタクリル酸エステル化合物としては、例えば、メチルメタクリレート、エチルメタクリレート、イソプロピルメタクリレート、ベンジルメタクリレート、ナフチルメタクリレート、アントリルメタクリレート、アントリルメチルメタクリレート、フェニルメタクリレート、2,2,2-トリフルオロエチルメタクリレート、tert-ブチルメタクリレート、シクロヘキシルメタクリレート、イソボルニルメタクリレート、2-メトキシエチルメタクリレート、メトキシトリエチレングリコールメタクリレート、2-エトキシエチルメタクリレート、テトラヒドロフルフリルメタクリレート、3-メトキシブチルメタクリレート、2-メチル-2-アダマンチルメタクリレート、2-エチル-2-アダマンチルメタクリレート、メタクリル酸テトラヒドロジシクロペンタジエニル、イソニコチン酸2-(メタクリロイルオキシ)エチル等が挙げられる。 Examples of methacrylic acid ester compounds include methyl methacrylate, ethyl methacrylate, isopropyl methacrylate, benzyl methacrylate, naphthyl methacrylate, anthryl methacrylate, anthryl methyl methacrylate, phenyl methacrylate, 2,2,2-trifluoroethyl methacrylate, tert-butyl methacrylate, cyclohexyl methacrylate, isobornyl methacrylate, 2-methoxyethyl methacrylate, methoxytriethylene glycol methacrylate, 2-ethoxyethyl methacrylate, tetrahydrofurfuryl methacrylate, 3-methoxybutyl methacrylate, 2-methyl-2-adamantyl methacrylate, 2-ethyl-2-adamantyl methacrylate, tetrahydrodicyclopentadienyl methacrylate, and 2-(methacryloyloxy)ethyl isonicotinate.
マレイミド化合物としては、例えば、N-ベンジルマレイミド、4-マレイミド酪酸、N-メトキシカルボニルマレイミド、N-シクロヘキシルマレイミド等が挙げられる。 Examples of maleimide compounds include N-benzylmaleimide, 4-maleimidobutyric acid, N-methoxycarbonylmaleimide, and N-cyclohexylmaleimide.
スチレン化合物としては、例えば、スチレン、4-メチルスチレン、4-ビニルフェニルボロン酸、4-ビニル安息香酸、trans-アネトール、4-ビニルピリジン等が挙げられる。 Examples of styrene compounds include styrene, 4-methylstyrene, 4-vinylphenylboronic acid, 4-vinylbenzoic acid, trans-anethole, and 4-vinylpyridine.
ビニル化合物としては、例えば、ビニルエーテル、メチルビニルエーテル、ベンジルビニルエーテル、フェニルビニルエーテル、プロピルビニルエーテル等が挙げられる。 Examples of vinyl compounds include vinyl ether, methyl vinyl ether, benzyl vinyl ether, phenyl vinyl ether, and propyl vinyl ether.
アクリルアミド化合物としては、例えば、アクリルアミド、N,N-ジメチルアクリルアミド、N-イソプロピルアクリルアミド、N-プロピルアクリルアミド、N-tert-ブチルアクリルアミド等が挙げられる。 Examples of acrylamide compounds include acrylamide, N,N-dimethylacrylamide, N-isopropylacrylamide, N-propylacrylamide, and N-tert-butylacrylamide.
メタクリルアミド化合物としては、例えば、N-メチルメタクリルアミド、N,N-ジメチルメタクリルアミド、N-(4-ヒドロキシフェニル)メタクリルアミド等が挙げられる。 Examples of methacrylamide compounds include N-methylmethacrylamide, N,N-dimethylmethacrylamide, and N-(4-hydroxyphenyl)methacrylamide.
本発明の側鎖型重合体における側鎖aの含有量は、光反応性の点から、5~90モル%が好ましく、5~80モル%がより好ましく、5~50モル%が更に好ましい。耐光性の観点から、5~30モル%が好ましい。 The content of side chain a in the side chain type polymer of the present invention is preferably 5 to 90 mol %, more preferably 5 to 80 mol %, and even more preferably 5 to 50 mol % from the viewpoint of photoreactivity. From the viewpoint of light resistance, 5 to 30 mol % is preferable.
本発明の側鎖型重合体における側鎖bの含有量は、位相差値の観点から、10~95モル%が好ましい。 The content of side chain b in the side chain type polymer of the present invention is preferably 10 to 95 mol % from the viewpoint of retardation value.
本発明の側鎖型重合体における側鎖dの含有量は、膜の強度を高めつつ、重合体の液晶性を損なわない観点から、1~30モル%が好ましく、1~20モル%がより好ましい。 The content of side chain d in the side chain type polymer of the present invention is preferably 1 to 30 mol %, more preferably 1 to 20 mol %, from the viewpoint of increasing the strength of the film while not impairing the liquid crystallinity of the polymer.
本発明の側鎖型重合体は、上述したとおり、側鎖eを含んでいてもよい。本発明の側鎖型重合体が側鎖eを含む場合、側鎖eの含有量は、液晶性の観点から、1~20モル%が好ましく、1~15モル%がより好ましい。 As described above, the side chain polymer of the present invention may contain side chain e. When the side chain polymer of the present invention contains side chain e, the content of side chain e is preferably 1 to 20 mol %, and more preferably 1 to 15 mol %, from the viewpoint of liquid crystallinity.
本発明の側鎖型重合体における側鎖cの含有量は、側鎖a、側鎖b、側鎖d及び側鎖eの含有量の合計が100モル%に満たない場合に、その残りの部分である。 The content of side chain c in the side chain type polymer of the present invention is the remaining portion when the total content of side chain a, side chain b, side chain d, and side chain e is less than 100 mol %.
本発明の側鎖型重合体は、上述したとおり、非液晶性成分の側鎖fを含んでいてもよい。側鎖fの含有量は、側鎖a~eの含有量の合計が100モル%に満たない場合に、その残りの部分である。 As described above, the side chain polymer of the present invention may contain side chain f, which is a non-liquid crystal component. When the total content of side chains a to e is less than 100 mol %, the content of side chain f is the remaining portion.
(A)成分の側鎖型重合体の製造方法は、特に限定されるものではなく、工業的に扱われている汎用な方法が利用できる。具体的には、上述したモノマーMA、モノマーMB、所望によりモノマーMC、モノマーMD、所望によりモノマーME、及び所望によりモノマーMFを利用したラジカル重合、カチオン重合又はアニオン重合により製造することができる。これらの中では、反応制御のしやすさ等の観点からラジカル重合が特に好ましい。 The method for producing the side chain polymer of component (A) is not particularly limited, and a general-purpose method used industrially can be used. Specifically, it can be produced by radical polymerization, cationic polymerization, or anionic polymerization using the above-mentioned monomer MA, monomer MB, and optionally monomer MC, monomer MD, and optionally monomer ME, and optionally monomer MF. Of these, radical polymerization is particularly preferred from the viewpoint of ease of reaction control, etc.
ラジカル重合の重合開始剤としては、ラジカル重合開始剤(ラジカル熱重合開始剤、ラジカル光重合開始剤)や、可逆的付加-開裂型連鎖移動(RAFT)重合試薬等の公知の化合物を使用することができる。 As a polymerization initiator for radical polymerization, known compounds such as radical polymerization initiators (radical thermal polymerization initiators, radical photopolymerization initiators) and reversible addition-fragmentation chain transfer (RAFT) polymerization reagents can be used.
ラジカル熱重合開始剤は、分解温度以上に加熱することにより、ラジカルを発生させる化合物である。このようなラジカル熱重合開始剤としては、例えば、ケトンパーオキサイド類(メチルエチルケトンパーオキサイド、シクロヘキサノンパーオキサイド等)、ジアシルパーオキサイド類(アセチルパーオキサイド、ベンゾイルパーオキサイド等)、ハイドロパーオキサイド類(過酸化水素、tert-ブチルハイドパーオキサイド、クメンハイドロパーオキサイド等)、ジアルキルパーオキサイド類(ジ-tert-ブチルパーオキサイド、ジクミルパーオキサイド、ジラウロイルパーオキサイド等)、パーオキシケタール類(ジブチルパーオキシシクロヘキサン等)、アルキルパーエステル類(パーオキシネオデカン酸-tert-ブチルエステル、パーオキシピバリン酸-tert-ブチルエステル、パーオキシ2-エチルシクロヘキサン酸-tert-アミルエステル等)、過硫酸塩類(過硫酸カリウム、過硫酸ナトリウム、過硫酸アンモニウム等)、アゾ系化合物(アゾビスイソブチロニトリル、2,2’-ジ(2-ヒドロキシエチル)アゾビスイソブチロニトリル、2,2’-アゾビス(2-メチルプロピオン酸)ジメチル等)等が挙げられる。ラジカル熱重合開始剤は、1種単独で使用してもよく、2種以上を組み合わせて使用してもよい。 A radical thermal polymerization initiator is a compound that generates radicals when heated to a temperature above its decomposition temperature. Examples of such radical thermal polymerization initiators include ketone peroxides (methyl ethyl ketone peroxide, cyclohexanone peroxide, etc.), diacyl peroxides (acetyl peroxide, benzoyl peroxide, etc.), hydroperoxides (hydrogen peroxide, tert-butyl hydroperoxide, cumene hydroperoxide, etc.), dialkyl peroxides (di-tert-butyl peroxide, dicumyl peroxide, dilauroyl peroxide, etc.), peroxyketals ( dibutylperoxycyclohexane, etc.), alkyl peresters (peroxyneodecanoic acid-tert-butyl ester, peroxypivalic acid-tert-butyl ester, peroxy 2-ethylcyclohexanoic acid-tert-amyl ester, etc.), persulfates (potassium persulfate, sodium persulfate, ammonium persulfate, etc.), azo compounds (azobisisobutyronitrile, 2,2'-di(2-hydroxyethyl)azobisisobutyronitrile, 2,2'-azobis(2-methylpropionate)dimethyl, etc.), etc. Radical thermal polymerization initiators may be used alone or in combination of two or more.
ラジカル光重合開始剤は、ラジカル重合を光照射によって開始する化合物であれば特に限定されない。このようなラジカル光重合開始剤としては、ベンゾフェノン、ミヒラーズケトン、4,4’-ビス(ジエチルアミノ)ベンゾフェノン、キサントン、チオキサントン、イソプロピルキサントン、2,4-ジエチルチオキサントン、2-エチルアントラキノン、アセトフェノン、2-ヒドロキシ-2-メチルプロピオフェノン、2-ヒドロキシ-2-メチル-4’-イソプロピルプロピオフェノン、1-ヒドロキシシクロヘキシルフェニルケトン、イソプロピルベンゾインエーテル、イソブチルベンゾインエーテル、2,2-ジエトキシアセトフェノン、2,2-ジメトキシ-2-フェニルアセトフェノン、カンファーキノン、ベンズアントロン、2-メチル-1-[4-(メチルチオ)フェニル]-2-モルホリノプロパン-1-オン、2-ベンジル-2-ジメチルアミノ-1-(4-モルホリノフェニル)-ブタノン-1、4-ジメチルアミノ安息香酸エチル、4-ジメチルアミノ安息香酸イソアミル、4,4’-ジ(tert-ブチルペルオキシカルボニル)ベンゾフェノン、3,4,4’-トリ(tert-ブチルペルオキシカルボニル)ベンゾフェノン、2,4,6-トリメチルベンゾイルジフェニルフォスフィンオキサイド、2-(4’-メトキシスチリル)-4,6-ビス(トリクロロメチル)-s-トリアジン、2-(3’,4’-ジメトキシスチリル)-4,6-ビス(トリクロロメチル)-s-トリアジン、2-(2’,4’-ジメトキシスチリル)-4,6-ビス(トリクロロメチル)-s-トリアジン、2-(2’-メトキシスチリル)-4,6-ビス(トリクロロメチル)-s-トリアジン、2-(4’-ペンチルオキシスチリル)-4,6-ビス(トリクロロメチル)-s-トリアジン、4-[p-N,N-ジ(エトキシカルボニルメチル)]-2,6-ジ(トリクロロメチル)-s-トリアジン、1,3-ビス(トリクロロメチル)-5-(2’-クロロフェニル)-s-トリアジン、1,3-ビス(トリクロロメチル)-5-(4’-メトキシフェニル)-s-トリアジン、2-(p-ジメチルアミノスチリル)ベンズオキサゾール、2-(p-ジメチルアミノスチリル)ベンズチアゾール、2-メルカプトベンゾチアゾール、3,3’-カルボニルビス(7-ジエチルアミノクマリン)、2-(o-クロロフェニル)-4,4’,5,5’-テトラフェニル-1,2’-ビイミダゾール、2,2’-ビス(2-クロロフェニル)-4,4’,5,5’-テトラキス(4-エトキシカルボニルフェニル)-1,2’-ビイミダゾール、2,2’-ビス(2,4-ジクロロフェニル)-4,4’,5,5’-テトラフェニル-1,2’-ビイミダゾール、2,2’ビス(2,4-ジブロモフェニル)-4,4’,5,5’-テトラフェニル-1,2’-ビイミダゾール、2,2’-ビス(2,4,6-トリクロロフェニル)-4,4’,5,5’-テトラフェニル-1,2’-ビイミダゾール、3-(2-メチル-2-ジメチルアミノプロピオニル)カルバゾール、3,6-ビス(2-メチル-2-モルホリノプロピオニル)-9-n-ドデシルカルバゾール、1-ヒドロキシシクロヘキシルフェニルケトン、ビス(5-2,4-シクロペンタジエン-1-イル)-ビス(2,6-ジフルオロ-3-(1H-ピロール-1-イル)-フェニル)チタニウム、3,3’,4,4’-テトラ(t-ブチルペルオキシカルボニル)ベンゾフェノン、3,3’,4,4’-テトラ(t-ヘキシルペルオキシカルボニル)ベンゾフェノン、3,3’-ジ(メトキシカルボニル)-4,4’-ジ(t-ブチルペルオキシカルボニル)ベンゾフェノン、3,4’-ジ(メトキシカルボニル)-4,3’-ジ(t-ブチルペルオキシカルボニル)ベンゾフェノン、4,4’-ジ(メトキシカルボニル)-3,3’-ジ(t-ブチルペルオキシカルボニル)ベンゾフェノン、2-(3-メチル-3H-ベンゾチアゾール-2-イリデン)-1-ナフタレン-2-イル-エタノン、2-(3-メチル-1,3-ベンゾチアゾール-2(3H)-イリデン)-1-(2-ベンゾイル)エタノン等が挙げられる。ラジカル光重合開始剤は、1種単独で使用してもよく、2種以上を混合して使用してもよい。 The radical photopolymerization initiator is not particularly limited as long as it is a compound that initiates radical polymerization by irradiation with light. Examples of such radical photopolymerization initiators include benzophenone, Michler's ketone, 4,4'-bis(diethylamino)benzophenone, xanthone, thioxanthone, isopropylxanthone, 2,4-diethylthioxanthone, 2-ethylanthraquinone, acetophenone, 2-hydroxy-2-methylpropiophenone, 2-hydroxy-2-methyl-4'-isopropylpropiophenone, 1-hydroxycyclohexyl phenyl ketone, and isopropyl benzoin ether. , isobutyl benzoin ether, 2,2-diethoxyacetophenone, 2,2-dimethoxy-2-phenylacetophenone, camphorquinone, benzanthrone, 2-methyl-1-[4-(methylthio)phenyl]-2-morpholinopropan-1-one, 2-benzyl-2-dimethylamino-1-(4-morpholinophenyl)-butanone-1, 4-dimethylaminobenzoic acid ethyl, 4-dimethylaminobenzoic acid isoamyl, 4,4'-di(tert-butylperoxycarbonyl) 1,4'-dimethoxystyryl)-4,6-bis(trichloromethyl)-s-triazine, 2-(3',4'-dimethoxystyryl)-4,6-bis(trichloromethyl)-s-triazine, 2-(2',4'-dimethoxystyryl)-4,6-bis(trichloromethyl)-s-triazine, 2-(2',4'-dimethoxystyryl)-4,6-bis(trichloromethyl)-s-triazine, 2-(2',4'-dimethoxystyryl)-4,6-bis(trichloromethyl)-s-triazine, 2-(2',4'-dimethoxystyryl)-4,6-bis(trichloromethyl)-s-triazine, -(2'-methoxystyryl)-4,6-bis(trichloromethyl)-s-triazine, 2-(4'-pentyloxystyryl)-4,6-bis(trichloromethyl)-s-triazine, 4-[p-N,N-di(ethoxycarbonylmethyl)]-2,6-di(trichloromethyl)-s-triazine, 1,3-bis(trichloromethyl)-5-(2'-chlorophenyl)-s-triazine, 1,3-bis(trichloromethyl)-5-(4'-methoxyphenyl)-s-triazine, 2-(p-dimethylaminostyryl)benzoxazole, 2-(p-dimethylaminostyryl)benzthiazole, 2-mercaptobenzothiazole, 3,3'-carbonylbis(7-diethylaminocoumarin), 2-(o-chlorophenyl)-4,4',5,5'-tetraphenyl-1,2'-biimidazole, 2,2'-bis(2-chlorophenyl)-4,4',5,5'-tetrakis(4-ethoxycarbonylphenyl)-1,2'-biimidazole, 2,2'-bis (2,4-dichlorophenyl)-4,4',5,5'-tetraphenyl-1,2'-biimidazole, 2,2'bis(2,4-dibromophenyl)-4,4',5,5'-tetraphenyl-1,2'-biimidazole, 2,2'-bis(2,4,6-trichlorophenyl)-4,4',5,5'-tetraphenyl-1,2'-biimidazole, 3-(2-methyl-2-dimethylaminopropionyl)carbazole, 3,6-bis(2-methyl-2-morpholinopropionyl)-9 -n-Dodecylcarbazole, 1-hydroxycyclohexyl phenyl ketone, bis(5-2,4-cyclopentadiene-1-yl)-bis(2,6-difluoro-3-(1H-pyrrol-1-yl)-phenyl)titanium, 3,3',4,4'-tetra(t-butylperoxycarbonyl)benzophenone, 3,3',4,4'-tetra(t-hexylperoxycarbonyl)benzophenone, 3,3'-di(methoxycarbonyl)-4,4'-di(t-butylperoxycarbonyl)benzophenone, Examples of the radical photopolymerization initiator include 3,4'-di(methoxycarbonyl)-4,3'-di(t-butylperoxycarbonyl)benzophenone, 4,4'-di(methoxycarbonyl)-3,3'-di(t-butylperoxycarbonyl)benzophenone, 2-(3-methyl-3H-benzothiazol-2-ylidene)-1-naphthalen-2-yl-ethanone, and 2-(3-methyl-1,3-benzothiazol-2(3H)-ylidene)-1-(2-benzoyl)ethanone. The radical photopolymerization initiator may be used alone or in combination of two or more.
ラジカル重合法としては、特に限定されるものではなく、乳化重合法、懸濁重合法、分散重合法、沈殿重合法、塊状重合法、溶液重合法等を用いることができる。 The radical polymerization method is not particularly limited, and emulsion polymerization, suspension polymerization, dispersion polymerization, precipitation polymerization, bulk polymerization, solution polymerization, etc. can be used.
重合反応に用いる有機溶媒としては、生成したポリマーが溶解するものであれば特に限定されない。その具体例としては、テトラヒドロフラン、シクロペンタノン、シクロヘキサノン、N,N-ジメチルホルムアミド、N,N-ジメチルアセトアミド、N,N-ジエチルホルムアミド、N,N-ジメエルアセトアミド、N-メチル-2-ピロリドン、N-エチル-2-ピロリドン、N-メチル-ε-カプロラクタム、ジメチルスルホキシド、テトラメチル尿素、ジメチルスルホン、ヘキサメチルスルホキシド、γ-ブチロラクトン、メトキシメチルペンタノール、ジペンテン、エチルアミルケトン、メチルノニルケトン、メチルエチルケトン、メチルイソアミルケトン、メチルイソプロピルケトン、メチルセロソルブ、エチルセロソルブ、メチルセロソルブアセテート、エチルセロソルブアセテート、ブチルカルビトール、エチルカルビトール、エチレングリコール、エチレングリコールモノアセテート、エチレングリコールモノイソプロピルエーテル、エチレングリコールモノブチルエーテル、プロピレングリコール、プロピレングリコールモノアセテート、プロピレングリコールモノメチルエーテル、プロピレングリコール-tert-ブチルエーテル、ジエチレングリコール、ジエチレングリコールモノアセテート、ジエチレングリコールジメチルエーテル、ジプロピレングリコールモノアセテートモノメチルエーテル、ジプロピレングリコールモノメチルエーテル、ジプロピレングリコールモノエチルエーテル、ジプロピレングリコールモノアセテートモノエチルエーテル、ジプロピレングリコールモノプロピルエーテル、ジプロピレングリコールモノアセテートモノプロピルエーテル、3-メチル-3-メトキシブチルアセテート、トリプロピレングリコールメチルエーテル、3-メチル-3-メトキシブタノール、ジイソプロピルエーテル、エチルイソブチルエーテル、ジイソブチレン、アミルアセテート、ブチルブチレート、ブチルエーテル、ジイソブチルケトン、メチルシクロへキセン、プロピルエーテル、ジヘキシルエーテル、1,4-ジオキサン、n-へキサン、n-ペンタン、n-オクタン、ジエチルエーテル、シクロヘキサノン、エチレンカーボネート、プロピレンカーボネート、乳酸メチル、乳酸エチル、酢酸メチル、酢酸エチル、酢酸n-ブチル、酢酸プロピレングリコールモノエチルエーテル、ピルビン酸メチル、ピルビン酸エチル、3-メトキシプロピオン酸メチル、3-エトキシプロピオン酸エチル、3-メトキシプロピオン酸エチル、3-エトキシプロピオン酸、3-メトキシプロピオン酸、3-メトキシプロピオン酸プロピル、3-メトキシプロピオン酸ブチル、ジグライム、4-ヒドロキシ-4-メチル-2-ペンタノン、3-メトキシ-N,N-ジメチルプロパンアミド、3-エトキシ-N,N-ジメチルプロパンアミド、3-ブトキシ-N,N-ジメチルプロパンアミド等が挙げられる。 The organic solvent used in the polymerization reaction is not particularly limited as long as it dissolves the produced polymer. Specific examples include tetrahydrofuran, cyclopentanone, cyclohexanone, N,N-dimethylformamide, N,N-dimethylacetamide, N,N-diethylformamide, N,N-dimethylacetamide, N-methyl-2-pyrrolidone, N-ethyl-2-pyrrolidone, N-methyl-ε-caprolactam, dimethyl sulfoxide, tetramethylurea, dimethyl sulfone, hexamethyl sulfoxide, γ-butyrolactone, methoxymethylpentanol, dipentene, ethyl amyl ketone, methyl nonyl ketone, methyl ethyl ketone, methyl isoamyl ketone, methyl isopropyl ketone, methyl cellosolve, ethyl cellosolve, methyl cellosolve a acetate, ethyl cellosolve acetate, butyl carbitol, ethyl carbitol, ethylene glycol, ethylene glycol monoacetate, ethylene glycol monoisopropyl ether, ethylene glycol monobutyl ether, propylene glycol, propylene glycol monoacetate, propylene glycol monomethyl ether, propylene glycol-tert-butyl ether, diethylene glycol, diethylene glycol monoacetate, diethylene glycol dimethyl ether, dipropylene glycol monoacetate monomethyl ether, dipropylene glycol monomethyl ether, dipropylene glycol monoethyl ether , dipropylene glycol monoacetate monoethyl ether, dipropylene glycol monopropyl ether, dipropylene glycol monoacetate monopropyl ether, 3-methyl-3-methoxybutyl acetate, tripropylene glycol methyl ether, 3-methyl-3-methoxybutanol, diisopropyl ether, ethyl isobutyl ether, diisobutylene, amyl acetate, butyl butyrate, butyl ether, diisobutyl ketone, methylcyclohexene, propyl ether, dihexyl ether, 1,4-dioxane, n-hexane, n-pentane, n-octane, diethyl ether, cyclohexanone, ethylene carbonate , propylene carbonate, methyl lactate, ethyl lactate, methyl acetate, ethyl acetate, n-butyl acetate, propylene glycol monoethyl ether acetate, methyl pyruvate, ethyl pyruvate, methyl 3-methoxypropionate, ethyl 3-ethoxypropionate, ethyl 3-methoxypropionate, 3-ethoxypropionic acid, 3-methoxypropionic acid, propyl 3-methoxypropionate, butyl 3-methoxypropionate, diglyme, 4-hydroxy-4-methyl-2-pentanone, 3-methoxy-N,N-dimethylpropanamide, 3-ethoxy-N,N-dimethylpropanamide, 3-butoxy-N,N-dimethylpropanamide, etc.
上記有機溶媒は、1種単独で使用してもよく、2種以上を混合して使用してもよい。さらに、生成するポリマーを溶解させない溶媒であっても、生成したポリマーが析出しない範囲で、上述した有機溶媒に混合して使用してもよい。また、ラジカル重合において有機溶媒中の酸素は重合反応を阻害する原因となるので、有機溶媒は可能な程度に脱気されたものを用いることが好ましい。 The above organic solvents may be used alone or in combination of two or more. Furthermore, even if the solvent does not dissolve the polymer produced, it may be mixed with the above organic solvent to the extent that the polymer produced does not precipitate. In addition, since oxygen in the organic solvent in radical polymerization inhibits the polymerization reaction, it is preferable to use an organic solvent that has been degassed to the extent possible.
ラジカル重合の際の重合温度は、30~150℃の任意の温度を選択することができるが、好ましくは50~100℃の範囲である。また、反応は任意の濃度で行うことができるが、濃度が低すぎると高分子量の重合体を得ることが難しくなり、濃度が高すぎると反応液の粘性が高くなり過ぎて均一な撹拌が困難となるので、モノマー濃度は、好ましくは1~50質量%、より好ましくは5~30質量%である。反応初期は高濃度で行い、その後、有機溶媒を追加することができる。 The polymerization temperature during radical polymerization can be selected from any temperature between 30 and 150°C, but is preferably in the range of 50 to 100°C. The reaction can be carried out at any concentration, but if the concentration is too low it becomes difficult to obtain a polymer with a high molecular weight, and if the concentration is too high the viscosity of the reaction liquid becomes too high, making uniform stirring difficult, so the monomer concentration is preferably 1 to 50% by mass, more preferably 5 to 30% by mass. The reaction can be carried out at a high concentration in the early stages, and then an organic solvent can be added.
上述したラジカル重合反応においては、ラジカル重合開始剤の比率がモノマーに対して多いと得られる高分子の分子量が小さくなり、少ないと得られる高分子の分子量が大きくなるので、ラジカル開始剤の比率は重合させるモノマーに対して0.1~15モル%であることが好ましい。また重合時には各種モノマー成分や溶媒、開始剤等を追加することもできる。 In the above-mentioned radical polymerization reaction, if the ratio of radical polymerization initiator to the monomer is high, the molecular weight of the resulting polymer will be small, and if the ratio is low, the molecular weight of the resulting polymer will be large, so the ratio of radical initiator to the monomer to be polymerized is preferably 0.1 to 15 mol %. In addition, various monomer components, solvents, initiators, etc. can also be added during polymerization.
上記反応により得られた反応溶液から生成したポリマーを回収するには、反応溶液を貧溶媒に投入して、それら重合体を沈殿させればよい。沈殿に用いる貧溶媒としては、メタノール、アセトン、ヘキサン、ヘプタン、ブチルセロソルブ、ヘプタン、メチルエチルケトン、メチルイソブチルケトン、エタノール、トルエン、ベンゼン、ジエチルエーテル、メチルエチルエーテル、水等が挙げられる。貧溶媒に投入して沈殿させた重合体は、濾過して回収した後、常圧あるいは減圧下で、常温あるいは加熱して乾燥させることができる。また、回収した重合体を有機溶媒に再溶解させ、再沈殿回収する操作を2~10回繰り返すと、重合体中の不純物を少なくすることができる。この際の貧溶媒として、例えば、アルコール類、ケトン類、炭化水素等が挙げられ、これらの中から選ばれる3種以上の貧溶媒を用いると、より一層精製の効率が上がるため好ましい。 To recover the polymers produced from the reaction solution obtained by the above reaction, the reaction solution may be poured into a poor solvent to precipitate the polymers. Examples of poor solvents used for precipitation include methanol, acetone, hexane, heptane, butyl cellosolve, heptane, methyl ethyl ketone, methyl isobutyl ketone, ethanol, toluene, benzene, diethyl ether, methyl ethyl ether, and water. The polymer precipitated by pouring into the poor solvent can be recovered by filtration, and then dried at room temperature or by heating under normal or reduced pressure. The recovered polymer can be redissolved in an organic solvent and the reprecipitation recovery operation repeated 2 to 10 times to reduce the amount of impurities in the polymer. Examples of poor solvents include alcohols, ketones, and hydrocarbons. It is preferable to use three or more poor solvents selected from these because this further increases the efficiency of purification.
本発明の(A)側鎖型重合体は、得られる塗膜の強度、塗膜形成時の作業性及び塗膜の均一性を考慮すると、GPC(Gel Permeation Chromatography)法で測定した重量平均分子量が、2,000~2,000,000であるものが好ましく、2,000~1,000,000であるものがより好ましく、5,000~200,000であるものがより一層好ましい。 In consideration of the strength of the resulting coating film, the workability during coating film formation, and the uniformity of the coating film, the side chain polymer (A) of the present invention preferably has a weight average molecular weight measured by GPC (Gel Permeation Chromatography) of 2,000 to 2,000,000, more preferably 2,000 to 1,000,000, and even more preferably 5,000 to 200,000.
[(B)有機溶媒]
本発明で用いる重合体組成物には、有機溶媒(良溶媒)を含む。上記有機溶媒(良溶媒)は、重合体成分を溶解させる有機溶媒であれば特に限定されない。その具体例としては、N,N-ジメチルホルムアミド、N,N-ジメチルアセトアミド、N-メチル-2-ピロリドン、N-メチル-ε-カプロラクタム、2-ピロリドン、N-エチル-2-ピロリドン、N-ビニル-2-ピロリドン、ジメチルスルホキシド、テトラメチル尿素、ピリジン、ジメチルスルホン、ヘキサメチルホスホルアミド、γ-ブチロラクトン、3-メトキシ-N,N-ジメチルプロパンアミド、3-エトキシ-N,N-ジメチルプロパンアミド、3-ブトキシ-N,N-ジメチルプロパンアミド、1,3-ジメチル-2-イミダゾリジノン、エチルアミルケトン、メチルノニルケトン、メチルエチルケトン、メチルイソアミルケトン、メチルイソプロピルケトン、シクロヘキサノン、シクロペンタノン、エチレンカーボネート、プロピレンカーボネート、ジグライム、4-ヒドロキシ-4-メチル-2-ペンタノン、テトラヒドロフラン、テトラヒドロフルフリルアルコール、1-メトキシ-2-プロパノール、1,3-ジオキソラン等が挙げられる。これらは1種単独で使用してもよく、2種以上を混合して使用してもよい。
[(B) Organic Solvent]
The polymer composition used in the present invention contains an organic solvent (good solvent). The organic solvent (good solvent) is not particularly limited as long as it is an organic solvent that dissolves the polymer component. Specific examples thereof include N,N-dimethylformamide, N,N-dimethylacetamide, N-methyl-2-pyrrolidone, N-methyl-ε-caprolactam, 2-pyrrolidone, N-ethyl-2-pyrrolidone, N-vinyl-2-pyrrolidone, dimethylsulfoxide, tetramethylurea, pyridine, dimethylsulfone, hexamethylphosphoramide, γ-butyrolactone, 3-methoxy-N,N-dimethylpropanamide, 3-ethoxy-N,N-dimethylpropanamide, 3-butoxy-N, Examples of the amines include N-dimethylpropanamide, 1,3-dimethyl-2-imidazolidinone, ethyl amyl ketone, methyl nonyl ketone, methyl ethyl ketone, methyl isoamyl ketone, methyl isopropyl ketone, cyclohexanone, cyclopentanone, ethylene carbonate, propylene carbonate, diglyme, 4-hydroxy-4-methyl-2-pentanone, tetrahydrofuran, tetrahydrofurfuryl alcohol, 1-methoxy-2-propanol, and 1,3-dioxolane. These may be used alone or in combination of two or more.
また、本発明で用いる重合体組成物は、溶媒として、重合体組成物を塗布した際の膜厚均一性や表面平滑性を向上させる溶媒(貧溶媒)を含んでいてもよい。 The polymer composition used in the present invention may also contain a solvent (poor solvent) that improves the film thickness uniformity and surface smoothness when the polymer composition is applied.
上記膜厚均一性や表面平滑性を向上させる溶媒(貧溶媒)の具体例としては、イソプロピルアルコール、メトキシメチルペンタノール、メチルセロソルブ、エチルセロソルブ、メチルセロソルブアセテート、エチルセロソルブアセテート、ブチルカルビトール、エチルカルビトール、エチルカルビトールアセテート、エチレングリコール、エチレングリコールモノアセテート、エチレングリコールモノイソプロピルエーテル、エチレングリコールモノブチルエーテル(ブチルセロソルブ)、プロピレングリコール、プロピレングリコールモノアセテート、プロピレングリコール-tert-ブチルエーテル、ジプロピレングリコールモノメチルエーテル、ジエチレングリコール、ジエチレングリコールモノアセテート、ジエチレングリコールジメチルエーテル、ジプロピレングリコールモノアセテートモノメチルエーテル、ジプロピレングリコールモノメチルエーテル、ジプロピレングリコールモノエチルエーテル、ジプロピレングリコールモノアセテートモノエチルエーテル、ジプロピレングリコールモノプロピルエーテル、ジプロピレングリコールモノアセテートモノプロピルエーテル、3-メチル-3-メトキシブチルアセテート、トリプロピレングリコールメチルエーテル、3-メチル-3-メトキシブタノール、ジイソプロピルエーテル、エチルイソブチルエーテル、ジイソブチレン、アミルアセテート、ブチルブチレート、ブチルエーテル、ジイソブチルケトン、メチルシクロへキセン、プロピルエーテル、ジヘキシルエーテル、1-ヘキサノール、n-へキサン、n-ペンタン、n-オクタン、ジエチルエーテル、乳酸メチル、乳酸エチル、乳酸n-プロピル、乳酸n-ブチル、乳酸イソアミル、酢酸メチル、酢酸エチル、酢酸プロピル、酢酸n-ブチル、酢酸アミル、酢酸プロピレングリコールモノエチルエーテル、ピルビン酸メチル、ピルビン酸エチル、3-メトキシプロピオン酸メチル、3-エトキシプロピオン酸エチル、3-メトキシプロピオン酸エチル、3-エトキシプロピオン酸、3-メトキシプロピオン酸、3-メトキシプロピオン酸プロピル、3-メトキシプロピオン酸ブチル、1-エトキシ-2-プロパノール、1-ブトキシ-2-プロパノール、1-フェノキシ-2-プロパノール、プロピレングリコールモノアセテート、プロピレングリコールジアセテート、プロピレングリコール-1-モノメチルエーテル-2-アセテート、プロピレングリコール-1-モノエチルエーテル-2-アセテート、ジプロピレングリコール、2-(2-エトキシプロポキシ)プロパノール、水、アニソール、n-へキサン、n-ペンタン、n-オクタン、シクロペンチルメチルエーテル、プロピルエーテル、ジイソプロピルエーテル、エチルイソブチルエーテル、ブチルエーテル、ジイソブチルケトン、メチルイソブチルケトン、1,4-シネオール、1,8-シネオール、プロピオン酸テトラヒドロフルフリル、2,2-ジ(2-テトラヒドロフリル)プロパン、2,5-ジメトキシテトラヒドロフラン等の溶媒が挙げられる。等の低表面張力を有する溶媒が挙げられる。 Specific examples of solvents (poor solvents) that improve the above-mentioned film thickness uniformity and surface smoothness include isopropyl alcohol, methoxymethyl pentanol, methyl cellosolve, ethyl cellosolve, methyl cellosolve acetate, ethyl cellosolve acetate, butyl carbitol, ethyl carbitol, ethyl carbitol acetate, ethylene glycol, ethylene glycol monoacetate, ethylene glycol monoisopropyl ether, ethylene glycol monobutyl ether (butyl cellosolve), propylene glycol, propylene glycol monoacetate, propylene glycol-tert-butyl ether, dipropylene glycol monomethyl ether, diethylene glycol, diethylene glycol monoacetate butyl ether, diethylene glycol dimethyl ether, dipropylene glycol monoacetate monomethyl ether, dipropylene glycol monomethyl ether, dipropylene glycol monoethyl ether, dipropylene glycol monoacetate monoethyl ether, dipropylene glycol monopropyl ether, dipropylene glycol monoacetate monopropyl ether, 3-methyl-3-methoxybutyl acetate, tripropylene glycol methyl ether, 3-methyl-3-methoxybutanol, diisopropyl ether, ethyl isobutyl ether, diisobutylene, amyl acetate, butyl butyrate, butyl ether, diisobutyl ketone, methylcyclohexene, propyl ether, di Hexyl ether, 1-hexanol, n-hexane, n-pentane, n-octane, diethyl ether, methyl lactate, ethyl lactate, n-propyl lactate, n-butyl lactate, isoamyl lactate, methyl acetate, ethyl acetate, propyl acetate, n-butyl acetate, amyl acetate, propylene glycol acetate monoethyl ether, methyl pyruvate, ethyl pyruvate, methyl 3-methoxypropionate, ethyl 3-ethoxypropionate, ethyl 3-methoxypropionate, 3-ethoxypropionic acid, 3-methoxypropionic acid, propyl 3-methoxypropionate, butyl 3-methoxypropionate, 1-ethoxy-2-propanol, 1-butoxy-2-propanol, 1-phenoxy-2-propanol, propylene glycol Examples of solvents include ethanol, propylene glycol diacetate, propylene glycol-1-monomethyl ether-2-acetate, propylene glycol-1-monoethyl ether-2-acetate, dipropylene glycol, 2-(2-ethoxypropoxy)propanol, water, anisole, n-hexane, n-pentane, n-octane, cyclopentyl methyl ether, propyl ether, diisopropyl ether, ethyl isobutyl ether, butyl ether, diisobutyl ketone, methyl isobutyl ketone, 1,4-cineole, 1,8-cineole, tetrahydrofurfuryl propionate, 2,2-di(2-tetrahydrofuryl)propane, and 2,5-dimethoxytetrahydrofuran. Examples of solvents having low surface tension include ethanol, propylene glycol diacetate ...
上記貧溶媒は、1種単独で使用してもよく、2種以上を混合して使用してもよい。貧溶媒を用いる場合、その含有量は、重合体の溶解性を著しく低下させることがないように、溶媒中5~80質量%が好ましく、10~60質量%がより好ましい。 The poor solvent may be used alone or in combination of two or more. When a poor solvent is used, its content in the solvent is preferably 5 to 80% by mass, more preferably 10 to 60% by mass, so as not to significantly reduce the solubility of the polymer.
[その他の成分]
本発明で用いる重合体組成物は、(A)及び(B)以外の成分を含んでもよい。その例としては、架橋反応を促進させる化合物、重合体組成物を塗布した際の膜厚均一性や表面平滑性を向上させる化合物、位相差材と基板との密着性を向上させる化合物等が挙げられるが、これらに限定されない。
[Other ingredients]
The polymer composition used in the present invention may contain components other than (A) and (B). Examples of the components include, but are not limited to, a compound that accelerates a crosslinking reaction, a compound that improves the film thickness uniformity and surface smoothness when the polymer composition is applied, and a compound that improves the adhesion between the retardation material and the substrate.
架橋反応を促進させる化合物としては、酸触媒(酸、熱酸発生剤、光酸発生剤)、塩基触媒(塩基、熱塩基発生剤、光塩基発生剤)、熱や光によるラジカル開始剤等が挙げられる。酸触媒としては、塩酸、メタンスルホン酸、エタンスルホン酸、p-トルエンスルホン酸、カンファスルホン酸、エタンジスルホン酸等のスルホン酸又はその水和物や塩等が挙げられる。塩基触媒としては、ピリジン、4-ジメチルアミノピリジン、イミダゾール等の塩基又はその水和物や塩等が挙げられる。熱ラジカル開始剤としては、パーオキサイド化合物、過硫酸塩類、アゾ系化合物等が挙げられる。ラジカル光重合開始剤は、ラジカル重合を光照射によって開始する化合物であれば特に限定されない。このようなラジカル光重合開始剤としては、ベンゾフェノン、ミヒラーズケトン、4,4’-ビス(ジエチルアミノ)ベンゾフェノン等が挙げられる。 Compounds that promote the crosslinking reaction include acid catalysts (acid, thermal acid generator, photoacid generator), base catalysts (base, thermal base generator, photobase generator), and radical initiators that are activated by heat or light. Examples of acid catalysts include sulfonic acids such as hydrochloric acid, methanesulfonic acid, ethanesulfonic acid, p-toluenesulfonic acid, camphorsulfonic acid, and ethanedisulfonic acid, as well as their hydrates and salts. Examples of base catalysts include bases such as pyridine, 4-dimethylaminopyridine, and imidazole, as well as their hydrates and salts. Examples of thermal radical initiators include peroxide compounds, persulfates, and azo compounds. There are no particular limitations on the radical photopolymerization initiator, so long as it is a compound that initiates radical polymerization by irradiation with light. Examples of such radical photopolymerization initiators include benzophenone, Michler's ketone, and 4,4'-bis(diethylamino)benzophenone.
本発明で用いる架橋反応を促進させる化合物の含有量は、(A)成分である重合体の100質量部に対して、好ましくは0.01~10質量部、より好ましくは0.05~8質量部、さらに好ましくは0.1~6質量部である。 The content of the compound that promotes the crosslinking reaction used in the present invention is preferably 0.01 to 10 parts by mass, more preferably 0.05 to 8 parts by mass, and even more preferably 0.1 to 6 parts by mass, per 100 parts by mass of the polymer (A), which is component (A).
膜厚均一性や表面平滑性を向上させる化合物としては、フッ素系界面活性剤、シリコーン系界面活性剤、ノ二オン系界面活性剤等が挙げられる。これらの具体例としては、エフトップ(登録商標)301、EF303、EF352(トーケムプロダクツ社製)、メガファック(登録商標)F171、F173、F560、F563、R-30、R-40、R-41(DIC社製)、フロラードFC430、FC431(スリーエム社製)、アサヒガード(登録商標)AG710(AGC社製)、サーフロン(登録商標)S-382、SC101、SC102、SC103、SC104、SC105、SC106(AGCセイミケミカル社製)、BYK302、BYK331、BYK348、BYK360N、BYK381,BYK3441等が挙げられる。これらの界面活性剤の含有量は、(A)成分100質量部に対し、0.01~5質量部が好ましく、0.01~3質量部がより好ましく、0.01~1質量部がより一層好ましい。 Compounds that improve film thickness uniformity and surface smoothness include fluorine-based surfactants, silicone-based surfactants, nonionic surfactants, etc. Specific examples of these include EFTOP (registered trademark) 301, EF303, EF352 (manufactured by Tochem Products), MEGAFAC (registered trademark) F171, F173, F560, F563, R-30, R-40, R-41 (manufactured by DIC Corporation), Fluorad FC430, FC431 (manufactured by 3M), Asahiguard (registered trademark) AG710 (manufactured by AGC), Surflon (registered trademark) S-382, SC101, SC102, SC103, SC104, SC105, SC106 (manufactured by AGC Seimi Chemical Co., Ltd.), BYK302, BYK331, BYK348, BYK360N, BYK381, BYK3441, and the like. The content of these surfactants is preferably 0.01 to 5 parts by mass, more preferably 0.01 to 3 parts by mass, and even more preferably 0.01 to 1 part by mass, per 100 parts by mass of component (A).
位相差材と基板との密着性を向上させる化合物の具体例としては、官能性シラン含有化合物等が挙げられる。 Specific examples of compounds that improve adhesion between the retardation material and the substrate include functional silane-containing compounds.
さらに、基板と位相差材の密着性の向上に加え、偏光板を構成した時のバックライトによる特性の低下等を防ぐ目的で、フェノプラスト系化合物やエポキシ基含有化合物を、重合体組成物に添加してもよい。 Furthermore, in order to improve the adhesion between the substrate and the retardation material, and to prevent deterioration of characteristics due to backlight when a polarizing plate is constructed, a phenoplast-based compound or an epoxy group-containing compound may be added to the polymer composition.
基板との密着性を向上させる化合物を使用する場合、その含有量は、重合体組成物に含まれる重合体成分100質量部に対し、0.1~30質量部が好ましく、1~20質量部がより好ましい。含有量が0.1質量部未満であると密着性向上の効果は期待できず、30質量部よりも多くなると液晶の配向性が悪くなる場合がある。 When a compound that improves adhesion to the substrate is used, the content is preferably 0.1 to 30 parts by mass, and more preferably 1 to 20 parts by mass, per 100 parts by mass of the polymer component contained in the polymer composition. If the content is less than 0.1 parts by mass, the effect of improving adhesion cannot be expected, and if it is more than 30 parts by mass, the alignment of the liquid crystal may deteriorate.
添加剤として、光増感剤を用いることもできる。光増感剤としては、無色増感剤及び三重項増感剤が好ましい。 A photosensitizer can also be used as an additive. As the photosensitizer, a colorless sensitizer and a triplet sensitizer are preferred.
本発明で用いる重合体組成物には、上述したもののほか、本発明の効果が損なわれない範囲であれば、位相差材の誘電率や導電性等の電気特性を変化させる目的で、誘電体や導電物質、さらには、位相差材にした際の膜の硬度や緻密度を高める目的で、架橋性化合物を添加してもよい。 In addition to the above, the polymer composition used in the present invention may contain dielectric or conductive substances for the purpose of changing the electrical properties of the phase difference material, such as the dielectric constant or conductivity, and may also contain crosslinking compounds for the purpose of increasing the hardness and density of the film when made into a phase difference material, as long as the effects of the present invention are not impaired.
[重合体組成物の調製]
本発明で用いる重合体組成物は、単層位相差材の形成に好適となるように塗布液として調製されることが好ましい。すなわち、本発明に用いられる重合体組成物は、(A)成分、及び上述した架橋反応を促進させる化合物、膜厚均一性や表面平滑性を向上させる溶媒や化合物、液晶配向膜と基板との密着性を向上させる化合物等が(B)成分の有機溶媒に溶解した溶液として調製されることが好ましい。ここで、(A)成分の含有量は、本発明の組成物中1~30質量%が好ましく、より好ましくは5~30質量%である。
[Preparation of polymer composition]
The polymer composition used in the present invention is preferably prepared as a coating solution suitable for forming a single-layer retardation material. That is, the polymer composition used in the present invention is preferably prepared as a solution in which the component (A) and the compound that promotes the crosslinking reaction described above, the solvent or compound that improves the film thickness uniformity and surface smoothness, the compound that improves the adhesion between the liquid crystal alignment film and the substrate, etc. are dissolved in the organic solvent of the component (B). Here, the content of the component (A) is preferably 1 to 30% by mass in the composition of the present invention, more preferably 5 to 30% by mass.
本発明で用いる重合体組成物は、(A)成分の重合体以外に、液晶発現能及び感光性能を損なわない範囲でその他の重合体が含まれていてもよい。その際、重合体成分中におけるその他の重合体の含有量は、好ましくは0.5~80質量%、より好ましくは1~50質量%である。その他の重合体は、例えば、ポリ(メタ)アクリレートやポリアミック酸やポリイミド等の、液晶性を発現し得る感光性の側鎖型重合体ではない重合体等が挙げられる。 The polymer composition used in the present invention may contain other polymers in addition to the polymer of component (A) to the extent that the liquid crystal expression ability and photosensitive performance are not impaired. In this case, the content of the other polymers in the polymer component is preferably 0.5 to 80 mass %, more preferably 1 to 50 mass %. Examples of the other polymers include polymers that are not photosensitive side chain polymers capable of expressing liquid crystallinity, such as poly(meth)acrylate, polyamic acid, and polyimide.
[単層位相差材]
本発明の単層位相差材は、下記工程(I)~(III)を含む方法によって製造することができる。
(I)本発明の組成物を、基板上に塗布して塗膜を形成する工程、
(II)上記塗膜に偏光した紫外線を照射する工程、及び
(III)上記紫外線を照射した塗膜を加熱して、位相差材を得る工程。
[Single-layer retardation material]
The single-layer retardation material of the present invention can be produced by a method including the following steps (I) to (III).
(I) applying the composition of the present invention onto a substrate to form a coating film;
(II) a step of irradiating the coating film with polarized ultraviolet light, and (III) a step of heating the coating film irradiated with ultraviolet light to obtain a retardation material.
[工程(I)]
工程(I)は、本発明で用いる重合体組成物を基板上に塗布して塗膜を形成する工程である。より具体的には、組成物を基板(例えば、シリコン/二酸化シリコン被覆基板、シリコンナイトライド基板、金属(例えば、アルミニウム、モリブデン、クロム等)が被覆された基板、ガラス基板、石英基板、ITO基板等)やフィルム(例えば、トリアセチルセルロース(TAC)フィルム、シクロオレフィンポリマーフィルム、ポリエチレンテレフタレートフィルム、アクリルフィルム等の樹脂フィルム)等の上に、バーコート、スピンコート、フローコート、ロールコート、スリットコート、スリットコートに続いたスピンコート、インクジェット法、印刷法等の方法によって塗布する。塗布した後、ホットプレート、熱循環型オーブン、IR(赤外線)型オーブン等の加熱手段により30~200℃、好ましくは40~150℃で溶媒を蒸発させて塗膜を得ることができる。
[Step (I)]
Step (I) is a step of applying the polymer composition used in the present invention onto a substrate to form a coating film. More specifically, the composition is applied onto a substrate (e.g., a silicon/silicon dioxide-coated substrate, a silicon nitride substrate, a substrate coated with a metal (e.g., aluminum, molybdenum, chromium, etc.), a glass substrate, a quartz substrate, an ITO substrate, etc.) or a film (e.g., a triacetyl cellulose (TAC) film, a cycloolefin polymer film, a polyethylene terephthalate film, an acrylic film, or other resin film) by a method such as bar coating, spin coating, flow coating, roll coating, slit coating, slit coating followed by spin coating, an inkjet method, or a printing method. After application, the solvent is evaporated at 30 to 200°C, preferably 40 to 150°C, by a heating means such as a hot plate, a heat circulation type oven, or an IR (infrared) type oven, to obtain a coating film.
[工程(II)]
工程(II)では、工程(I)で得られた塗膜に偏光した紫外線を照射する。塗膜の膜面に偏光した紫外線を照射する場合、基板に対して一定の方向から偏光板を介して偏光された紫外線を照射する。上記紫外線としては、波長100~400nmの範囲の紫外線を使用することができる。好ましくは、使用する塗膜の種類によりフィルター等を介して最適な波長を選択する。そして、例えば、選択的に光架橋反応を誘起できるように、波長290~400nmの範囲の紫外線を選択して使用することができる。紫外線としては、例えば、高圧水銀灯から放射される光を用いることができる。
[Step (II)]
In step (II), the coating film obtained in step (I) is irradiated with polarized ultraviolet light. When irradiating the film surface of the coating film with polarized ultraviolet light, the polarized ultraviolet light is irradiated from a certain direction relative to the substrate through a polarizing plate. As the ultraviolet light, ultraviolet light having a wavelength in the range of 100 to 400 nm can be used. Preferably, an optimal wavelength is selected through a filter or the like depending on the type of coating film used. Then, for example, ultraviolet light having a wavelength in the range of 290 to 400 nm can be selected and used so as to selectively induce a photocrosslinking reaction. As the ultraviolet light, for example, light emitted from a high-pressure mercury lamp can be used.
偏光した紫外線の照射量は、使用する塗膜に依存する。照射量は、該塗膜における、偏光した紫外線の偏光方向と平行な方向の紫外線吸光度と垂直な方向の紫外線吸光度との差であるΔAの最大値を実現する偏光紫外線の量の1~70%の範囲内とすることが好ましく、1~50%の範囲内とすることがより好ましい。 The amount of polarized UV light to be irradiated depends on the coating film used. The amount of irradiation is preferably within the range of 1 to 70%, and more preferably within the range of 1 to 50%, of the amount of polarized UV light that achieves the maximum value of ΔA, which is the difference between the UV absorbance in the direction parallel to the polarization direction of the polarized UV light and the UV absorbance in the direction perpendicular to the polarization direction of the polarized UV light in the coating film.
[工程(III)]
工程(III)では、工程(II)で偏光した紫外線を照射された塗膜を加熱する。加熱により、塗膜に配向制御能を付与することができる。
[Step (III)]
In step (III), the coating film irradiated with the polarized ultraviolet light in step (II) is heated. By heating, it is possible to impart an orientation control ability to the coating film.
加熱は、ホットプレート、熱風循環型オーブン、IR(赤外線)型オーブン等の加熱手段を用いることができる。加熱温度は、使用する塗膜の液晶性を発現させる温度を考慮して決めることができる。 The heating can be performed using a heating means such as a hot plate, a hot air circulation oven, or an IR (infrared) oven. The heating temperature can be determined taking into consideration the temperature at which the liquid crystallinity of the coating film to be used is expressed.
加熱温度は、本発明で用いる組成物に含まれる(A)成分の重合体が液晶性を発現する温度(以下、液晶発現温度という。)の温度範囲内であることが好ましい。塗膜のような薄膜表面の場合、塗膜表面の液晶発現温度は、(A)成分の重合体をバルクで観察した場合の液晶発現温度よりも低いことが予想される。このため、加熱温度は、塗膜表面の液晶発現温度の温度範囲内であることがより好ましい。すなわち、偏光紫外線照射後の加熱温度の温度範囲は、(A)成分の重合体の液晶発現温度の温度範囲の下限より10℃低い温度を下限とし、その液晶温度範囲の上限より10℃低い温度を上限とする範囲の温度であることが好ましい。加熱温度が、上記温度範囲よりも低いと、塗膜における熱による異方性の増幅効果が不十分となる傾向があり、また加熱温度が、上記温度範囲よりも高すぎると、塗膜の状態が等方性の液体状態(等方相)に近くなる傾向があり、この場合、自己組織化によって一方向に再配向することが困難になることがある。 The heating temperature is preferably within the temperature range at which the polymer of component (A) contained in the composition used in the present invention exhibits liquid crystallinity (hereinafter referred to as the liquid crystal appearance temperature). In the case of a thin film surface such as a coating film, the liquid crystal appearance temperature of the coating film surface is expected to be lower than the liquid crystal appearance temperature when the polymer of component (A) is observed in bulk. For this reason, it is more preferable that the heating temperature is within the temperature range of the liquid crystal appearance temperature of the coating film surface. In other words, the temperature range of the heating temperature after irradiation with polarized ultraviolet light is preferably a temperature range with a lower limit of a temperature 10°C lower than the lower limit of the temperature range of the liquid crystal appearance temperature of the polymer of component (A) and an upper limit of a temperature 10°C lower than the upper limit of the liquid crystal temperature range. If the heating temperature is lower than the above temperature range, the effect of amplifying the anisotropy by heat in the coating film tends to be insufficient, and if the heating temperature is too high, the state of the coating film tends to become closer to an isotropic liquid state (isotropic phase), in which case it may be difficult to realign in one direction by self-organization.
なお、液晶発現温度は、重合体又は塗膜表面が固体相から液晶相に相転移が起きる液晶転移温度以上であって、液晶相からアイソトロピック相(等方相)に相転移を起こすアイソトロピック相転移温度(Tiso)以下の温度をいう。例えば、130℃以下で液晶性を発現するとは、固体相から液晶相に相転移が起きる液晶転移温度が130℃以下であることを意味する。 The liquid crystal manifestation temperature refers to a temperature that is equal to or higher than the liquid crystal transition temperature at which a phase transition occurs on the polymer or coating surface from a solid phase to a liquid crystal phase, and is equal to or lower than the isotropic phase transition temperature (Tiso) at which a phase transition occurs from a liquid crystal phase to an isotropic phase. For example, manifesting liquid crystallinity at 130°C or lower means that the liquid crystal transition temperature at which a phase transition occurs from a solid phase to a liquid crystal phase is 130°C or lower.
加熱後に形成される塗膜の厚みは、使用する基板の段差や光学的性質を考慮して適宜選択することができ、例えば、0.5~10μmが好適である。 The thickness of the coating film formed after heating can be appropriately selected taking into consideration the unevenness of the substrate used and the optical properties, and is preferably 0.5 to 10 μm, for example.
このようにして得られた本発明の単層位相差材は、表示装置や記録材料等の用途に好適な光学特性を有する材料であり、特に、液晶ディスプレイや有機ELの偏光板及び位相差板等の光学補償フィルムとして好適である。 The single-layer retardation material of the present invention obtained in this manner has optical properties suitable for applications such as display devices and recording materials, and is particularly suitable as an optical compensation film such as a polarizing plate and retardation plate for liquid crystal displays and organic electroluminescence (EL).
以下、合成例、調製例、実施例及び比較例を挙げて、本発明をより具体的に説明するが、本発明は下記実施例に限定されない。 The present invention will be explained in more detail below with reference to synthesis examples, preparation examples, working examples and comparative examples, but the present invention is not limited to the following examples.
実施例で使用した光反応性基を有するモノマーとしてMA-1~MA-3を、非光反応水素結合性の官能基を有するモノマーとしてMB-1~MB-2を、自己架橋性部位を有するモノマーとしてMD-1~MD-8を、ヒドロキシアルキル基を有するモノマーとしてME-1、その他成分としてMF-1を以下に示す。なお、MA-1~MA-3に由来する側鎖は側鎖aに該当し、MB-1~MB-2に由来する側鎖は側鎖bに該当し、MD-1~MD-8に由来する側鎖は側鎖dに該当し、ME-1~ME-4に由来する側鎖は側鎖e、MF-1に由来する側鎖は側鎖fに該当する。
その他、本実施例で用いた試薬の略号を以下に示す。
(有機溶媒)
CPN:シクロペンタノン
cPenOH:シクロペンタノール
(重合開始剤)
V-601:2,2’-アゾビス(2-メチルプロピオン酸)ジメチル
(界面活性剤)
F563:メガファックF-563(DIC社製)
(架橋触媒)
CAT-1:1,2-エタンジスルホン酸二水和物
The abbreviations of the reagents used in this example are as follows:
(Organic solvent)
CPN: Cyclopentanone cPenOH: Cyclopentanol (polymerization initiator)
V-601: 2,2'-azobis(2-methylpropionate)dimethyl (surfactant)
F563: Megafac F-563 (manufactured by DIC)
(Crosslinking catalyst)
CAT-1: 1,2-ethanedisulfonic acid dihydrate
(ポリマーの分子量測定)
ポリマーの分子量測定条件は、以下の通りである。
装置:島津製作所 Nexera GPC システム(Shimadzu SCL-40)
カラム:Shodex社製カラム(LF-804、KF-801)
カラム温度:40℃
溶離液:テトラヒドロフラン(HPLCグレード)
流速:1.0ml/分
検量線作成用標準サンプル:ポリスチレン(PStQuick E/PStQuick F)(東ソー社製)
(Polymer molecular weight measurement)
The conditions for measuring the molecular weight of the polymer are as follows.
Apparatus: Shimadzu Nexera GPC system (Shimadzu SCL-40)
Column: Shodex column (LF-804, KF-801)
Column temperature: 40°C
Eluent: Tetrahydrofuran (HPLC grade)
Flow rate: 1.0 ml/min. Standard sample for creating calibration curve: polystyrene (PStQuick E/PStQuick F) (manufactured by Tosoh Corporation)
[1]モノマーの合成
ME-2~ME-4は新規化合物であり、下記に合成法を示す。下記モノマー合成例に記載の生成物は1H-NMR分析により同定した(分析条件は下記の通り)。
[1] Synthesis of Monomers ME-2 to ME-4 are novel compounds, and their synthesis methods are shown below. The products described in the following Monomer Synthesis Examples were identified by 1 H-NMR analysis (analysis conditions are as follows).
(1H-NMRの測定)
装置:フーリエ変換型超伝導核磁気共鳴装置(FT-NMR)「AVANCE III」(BRUKER社製)500MHz
溶媒:重水素化ジメチルスルホキシド(DMSO-d6)又は重水素化クロロホルム(CDCl3)
標準物質:テトラメチルシラン(TMS)
( 1H -NMR Measurement)
Equipment: Fourier transform superconducting nuclear magnetic resonance (FT-NMR) "AVANCE III" (manufactured by BRUKER) 500MHz
Solvent: deuterated dimethylsulfoxide (DMSO-d 6 ) or deuterated chloroform (CDCl 3 )
Standard substance: tetramethylsilane (TMS)
<モノマー合成例1:ME-2の合成>
MB-1(6.13g、20.0mmol)、チロソール(2.77g、20.0mmol)、N,N-ジメチル-4-アミノピリジン(DMAP、0.2g)、及び塩化メチレン(30mL)を攪拌し、5℃(氷水バス)で1-エチル-3-(3-ジメチルアミノプロピル)カルボジイミド塩酸塩(EDC、4.79g、25.0mmol)を加えた後、室温にて96時間攪拌した。その後、減圧下で塩化メチレンを留去して、酢酸エチルを加え、純水100mlにて順次2回洗浄し、硫酸マグネシウムで乾燥後、減圧下で溶媒を留去して、黄色固体を得た。この固体をカラムクロマトグラフィー(ヘプタン/酢酸エチル、2/1⇒1/1)、及び再結晶(メタノール/純水、2/1)で精製することで、目的のME-2(5.50g、12.9mmol、収率:64%)を得た。
1H-NMR(CDCl3):δ(ppm)=1.48(m,4H),1.65(t,1H),1.73(m,2H),1.83(m,2H),1.95(s,3H),2.88(t,2H),3.86(m,2H),4.05(t,2H),4.17(t,2H),5.55(s,1H),6.10(s,1H),6.95(d,2H),7.13(d,2H),7.27(d,2H),8.12(d,2H).
MB-1 (6.13 g, 20.0 mmol), tyrosol (2.77 g, 20.0 mmol), N,N-dimethyl-4-aminopyridine (DMAP, 0.2 g), and methylene chloride (30 mL) were stirred, and 1-ethyl-3-(3-dimethylaminopropyl)carbodiimide hydrochloride (EDC, 4.79 g, 25.0 mmol) was added at 5 ° C. (ice water bath), and the mixture was stirred at room temperature for 96 hours. Thereafter, methylene chloride was distilled off under reduced pressure, ethyl acetate was added, and the mixture was washed twice with 100 ml of pure water, dried over magnesium sulfate, and the solvent was distilled off under reduced pressure to obtain a yellow solid. This solid was purified by column chromatography (heptane / ethyl acetate, 2/1 ⇒ 1/1) and recrystallization (methanol / pure water, 2/1) to obtain the desired ME-2 (5.50 g, 12.9 mmol, yield: 64%).
1 H-NMR (CDCl 3 ): δ (ppm) = 1.48 (m, 4H), 1.65 (t, 1H), 1.73 (m, 2H), 1.83 (m, 2H), 1.95 (s, 3H), 2.88 (t, 2H), 3.86 (m, 2H), 4.05 (t, 2H), 4.17 (t, 2H) H), 5.55 (s, 1H), 6.10 (s, 1H), 6.95 (d, 2H), 7.13 (d, 2H), 7.27 (d, 2H), 8.12 (d, 2H).
<モノマー合成例2:ME-3の合成>
4-[[6-(アクリロイルオキシ)ヘキシル]オキシ]安息香酸(14.6g、50.0mmol)、チロソール(6.91g、50.0mmol)、N,N-ジメチル-4-アミノピリジン(DMAP、0.6g)、及び塩化メチレン(30mL)を攪拌し、5℃(氷水バス)で1-エチル-3-(3-ジメチルアミノプロピル)カルボジイミド塩酸塩(EDC、10.5g、54.8mmol)を加えて72時間攪拌した。その後、減圧下で塩化メチレンを留去して、酢酸エチルを加え、純水(100mL)にて順次2回洗浄し、硫酸マグネシウムで乾燥後、減圧下で溶媒を留去して、黄色固体を得た。この固体をカラムクロマトグラフィー(ヘプタン/酢酸エチル、2/1⇒1/1)、及び再結晶(メタノール/純水、2/1)で精製することで、目的のME-3(10.2g、24.7mmol、収率:49%)を得た。
1H-NMR(DMSO-d6):δ(ppm)=1.40(m,4H),1.62(m,2H),1.75(m,2H),2.74(t,2H),3.61(m,2H),4.11(m,4H),4.65(t,1H),5.92(d,1H),6.16(m,1H),6.34(d,1H),7.09(d,2H),7.15(d,2H),7.28(d,2H),8.04(d,2H).
4-[[6-(acryloyloxy)hexyl]oxy]benzoic acid (14.6 g, 50.0 mmol), tyrosol (6.91 g, 50.0 mmol), N,N-dimethyl-4-aminopyridine (DMAP, 0.6 g), and methylene chloride (30 mL) were stirred, and 1-ethyl-3-(3-dimethylaminopropyl)carbodiimide hydrochloride (EDC, 10.5 g, 54.8 mmol) was added at 5°C (ice water bath), and the mixture was stirred for 72 hours. Thereafter, methylene chloride was distilled off under reduced pressure, ethyl acetate was added, and the mixture was washed twice with pure water (100 mL), dried over magnesium sulfate, and the solvent was distilled off under reduced pressure to obtain a yellow solid. This solid was purified by column chromatography (heptane/ethyl acetate, 2/1→1/1) and recrystallization (methanol/pure water, 2/1) to obtain the target ME-3 (10.2 g, 24.7 mmol, yield: 49%).
1 H-NMR (DMSO-d 6 ): δ (ppm) = 1.40 (m, 4H), 1.62 (m, 2H), 1.75 (m, 2H), 2.74 (t, 2H), 3.61 (m, 2H), 4.11 (m, 4H), 4.65 (t, 1H), 5.92 (d, 1H), 6.16 (m , 1H), 6.34 (d, 1H), 7.09 (d, 2H), 7.15 (d, 2H), 7.28 (d, 2H), 8.04 (d, 2H).
<モノマー合成例3:ME-4の合成>
<ME-4-1の合成>
ME-4-1は、特開2005-162688号公報を参考に合成した。
<Synthesis of ME-4-1>
ME-4-1 was synthesized with reference to JP-A-2005-162688.
<ME-4の合成>
MB-1(6.13g、20.0mmol)、ME-4-1(4.89g、20.0mmol)、N,N-ジメチル-4-アミノピリジン(DMAP、0.2g)、及び塩化メチレン(30mL)を攪拌し、5℃(氷水バス)で1-エチル-3-(3-ジメチルアミノプロピル)カルボジイミド塩酸塩(EDC、4.79g、25.0mmol)を加えて48時間攪拌した。その後、減圧下で塩化メチレンを留去して、酢酸エチルを加え、純水(100mL)にて順次2回洗浄し、硫酸マグネシウムで乾燥後、減圧下で溶媒を留去して、黄色固体を得た。この固体を再結晶(エタノール)で精製することで、目的のME-4(5.0g、9.39mmol、収率:47%)を得た。
1H-NMR(DMSO-d6):δ(ppm)=1.41(m,4H),1.44(m,2H),1.64(m,2H),1.88(m,5H),3.58(m,2H),4.09(m,6H),4.57(t,1H),5.66(s,1H),6.02(s,1H),7.02(d,2H),7.10(d,2H),7.30(d,2H),7.61(d,2H),7.69(d,2H),8.08(d,2H).
<Synthesis of ME-4>
MB-1 (6.13 g, 20.0 mmol), ME-4-1 (4.89 g, 20.0 mmol), N,N-dimethyl-4-aminopyridine (DMAP, 0.2 g), and methylene chloride (30 mL) were stirred, and 1-ethyl-3-(3-dimethylaminopropyl)carbodiimide hydrochloride (EDC, 4.79 g, 25.0 mmol) was added at 5° C. (ice water bath) and stirred for 48 hours. Thereafter, methylene chloride was distilled off under reduced pressure, ethyl acetate was added, and the mixture was washed twice with pure water (100 mL), dried over magnesium sulfate, and then the solvent was distilled off under reduced pressure to obtain a yellow solid. This solid was purified by recrystallization (ethanol) to obtain the target ME-4 (5.0 g, 9.39 mmol, yield: 47%).
1 H-NMR (DMSO-d 6 ): δ (ppm) = 1.41 (m, 4H), 1.44 (m, 2H), 1.64 (m, 2H), 1.88 (m, 5H), 3.58 (m, 2H), 4.09 (m, 6H), 4.57 (t, 1H), 5.66 (s, 1H), 6.02 (s , 1H), 7.02 (d, 2H), 7.10 (d, 2H), 7.30 (d, 2H), 7.61 (d, 2H), 7.69 (d, 2H), 8.08 (d, 2H).
[2]重合体の合成
<合成例1>
CPN(24.3g)中に、MA-1(1.50g、4.50mmol)、MB-1(5.51g、18.0mmol)、MB-2(1.98g、4.50mmol)、MD-1(0.600g、3.00mmol)及びV-601(0.207g、0.90mmol)を溶解させ、モノマー混合溶液を調製した。窒素雰囲気下、70℃で、CPN(10.4g)中にモノマー混合溶液を2時間かけて滴下した。滴下終了後、70℃で12時間反応させた。反応終了後、メタノール/純水混合溶媒中に反応液を注ぎ込み、析出したポリマーを濾別し、メタノールで洗浄することでポリマー粉体P-1(8.33g)を得た。P-1の数平均分子量は39,000、重量平均分子量は143,000であった。
[2] Polymer synthesis <Synthesis Example 1>
MA-1 (1.50 g, 4.50 mmol), MB-1 (5.51 g, 18.0 mmol), MB-2 (1.98 g, 4.50 mmol), MD-1 (0.600 g, 3.00 mmol) and V-601 (0.207 g, 0.90 mmol) were dissolved in CPN (24.3 g) to prepare a monomer mixed solution. Under a nitrogen atmosphere, the monomer mixed solution was dropped into CPN (10.4 g) over 2 hours at 70 ° C. After the dropwise addition was completed, the reaction was allowed to proceed at 70 ° C. for 12 hours. After the reaction was completed, the reaction solution was poured into a methanol / pure water mixed solvent, and the precipitated polymer was filtered and washed with methanol to obtain polymer powder P-1 (8.33 g). The number average molecular weight of P-1 was 39,000 and the weight average molecular weight was 143,000.
<合成例2~13>
表1に示すように、使用するモノマーの種類や量を変更した以外は、合成例1と同様に実施することで、ポリマー粉体P-2~P-16を得た。
<Synthesis Examples 2 to 13>
As shown in Table 1, polymer powders P-2 to P-16 were obtained in the same manner as in Synthesis Example 1, except that the types and amounts of the monomers used were changed.
合成例1~16で得られたポリマーの組成を表1に示す。 The compositions of the polymers obtained in Synthesis Examples 1 to 16 are shown in Table 1.
[3]位相差膜組成物の調製
<調製例1>
合成例1で得られたポリマー粉体P-1(1.80g)に、CPN(8.19g)、F563(9.0mg)を加えて23℃で撹拌した。ポリマーを溶解させた後、孔径5.0μmのフィルターで濾過することでポリマー溶液T-1を得た(ポリマー濃度:18質量%)。このポリマー溶液T-1は、そのまま位相差膜を形成するための材料とした。
[3] Preparation of retardation film composition <Preparation Example 1>
CPN (8.19 g) and F563 (9.0 mg) were added to the polymer powder P-1 (1.80 g) obtained in Synthesis Example 1, and the mixture was stirred at 23° C. After dissolving the polymer, the mixture was filtered through a filter with a pore size of 5.0 μm to obtain a polymer solution T-1 (polymer concentration: 18% by mass). This polymer solution T-1 was used as it is as a material for forming a retardation film.
<調製例2~16>
表2に示すように、使用するポリマー粉体の種類やF563の量、架橋触媒の添加有無を変更したこと以外は調製例1と同様に実施することで、ポリマー溶液T-2~T-16を得た(ポリマー濃度:18質量%)。このポリマー溶液T-2~T-16は、そのまま位相差膜を形成するための材料とした。
<Preparation Examples 2 to 16>
As shown in Table 2, polymer solutions T-2 to T-16 (polymer concentration: 18% by mass) were obtained by carrying out the same procedure as in Preparation Example 1, except that the type of polymer powder used, the amount of F563, and the presence or absence of addition of a crosslinking catalyst were changed. These polymer solutions T-2 to T-16 were used as materials for forming retardation films as they were.
表2中、溶媒の括弧内の数値は、ポリマー溶液に対する溶媒の比率(質量%)を表す。 In Table 2, the numbers in parentheses for the solvents indicate the ratio (mass %) of the solvent to the polymer solution.
[4]単層位相差膜の製造
<実施例1>
ポリマー溶液T-1をCOPフィルム(ゼオン社製、ZF16-100)上にバーコーターを用いて塗布した。この塗布フィルムを50℃の熱風循環オーブンで3分間乾燥させ、続いて、この基板に高圧水銀灯から300nmロングウェーブレングスパスフィルター及び偏光板を介して波長365nmの偏光紫外線を600mJ/cm2照射した。その後、120℃のIR式オーブンで5分間加熱し、位相差膜付きCOPフィルムS-1を作製した。S-1の位相差層膜厚をF20膜厚測定システム(フィルメトリクス株式会社)により計測した結果、3.5μmであった。
[4] Production of single-layer retardation film <Example 1>
The polymer solution T-1 was applied onto a COP film (Zeon Corporation, ZF16-100) using a bar coater. The applied film was dried in a hot air circulating oven at 50°C for 3 minutes, and then the substrate was irradiated with 600 mJ/ cm2 polarized ultraviolet light having a wavelength of 365 nm from a high-pressure mercury lamp through a 300 nm long wave length pass filter and a polarizing plate. After that, it was heated for 5 minutes in an IR oven at 120°C to prepare a COP film S-1 with a retardation film. The retardation layer thickness of S-1 was measured using an F20 film thickness measurement system (Filmetrics Inc.) and found to be 3.5 μm.
<実施例2~15>
表3に示すように、ポリマー溶液の種類、膜厚、露光条件(カットフィルターの種類、露光量)、本焼成条件を変えた以外は実施例1と同様に実施することで、位相差膜付きCOPフィルムS-2~S-15を作製した。表3の365BPFは365nmバンドパスフィルター、300LWPFは300nmロングウェーブレングスパスフィルターを表す。
<Examples 2 to 15>
COP films S-2 to S-15 with retardation films were produced in the same manner as in Example 1, except that the type of polymer solution, film thickness, exposure conditions (type of cut filter, exposure amount), and main baking conditions were changed as shown in Table 3. In Table 3, 365BPF represents a 365 nm bandpass filter, and 300LWPF represents a 300 nm long wave length pass filter.
<比較例1>
表3に示すように、ポリマー溶液の種類、膜厚、露光条件を変えた以外は実施例1と同様に実施することで、位相差膜付きCOPフィルムR-1を作製した。
<Comparative Example 1>
As shown in Table 3, the same procedure as in Example 1 was carried out except that the type of polymer solution, the film thickness, and the exposure conditions were changed, to produce a COP film R-1 with a retardation film.
上記実施例1~15及び比較例1で得られた位相差膜付きCOPフィルムS-1~S-15及びR-1について、下記方法により位相差値及びクラック耐性について評価した。 The retardation values and crack resistance of the retardation-coated COP films S-1 to S-15 and R-1 obtained in Examples 1 to 15 and Comparative Example 1 above were evaluated using the following method.
〔位相差値評価〕
Axometrics社製のAxoScanを用いて波長550nmにおける直線位相差を評価し、表3にまとめた。
[Evaluation of Phase Difference Value]
The linear phase difference at a wavelength of 550 nm was evaluated using an AxoScan manufactured by Axometrics, and the results are summarized in Table 3.
〔クラック耐性〕
位相差膜付きCOPフィルム(4×4cm)の位相差膜を、粘着層付きガラス基板(3.5×3.5cm)にローラーを用いて貼り合わせた。粘着層には、株式会社美舘イメージング製の光学両面粘着シートM3D49を用いた。続いて、カッターを用いて余剰分の位相差膜付きCOPフィルムを切り取り、COPフィルムを剥がすことで、位相差膜付きガラス基板を得た。得られた位相差膜付きガラス基板を目視で観察し、クラックの有無を評価した。クラックが見られた場合は「×」、クラックが見られなかった場合は「○」として評価した。
[Crack resistance]
The retardation film of the retardation film-attached COP film (4 x 4 cm) was attached to a glass substrate (3.5 x 3.5 cm) with an adhesive layer using a roller. The adhesive layer was an optical double-sided adhesive sheet M3D49 manufactured by Mitate Imaging Co., Ltd. Next, the excess retardation film-attached COP film was cut using a cutter, and the COP film was peeled off to obtain a glass substrate with a retardation film. The obtained glass substrate with a retardation film was visually observed to evaluate the presence or absence of cracks. When cracks were observed, it was evaluated as "x", and when no cracks were observed, it was evaluated as "○".
側鎖dを含まない比較例1は転写時にクラックが生じた。一方、実施例1~15は自己架橋性基である側鎖dを含むため、転写時のクラック発生が抑制されており、且つ、良好な位相差値を示した。 Comparative Example 1, which does not contain side chain d, caused cracks during transfer. On the other hand, Examples 1 to 15 contained side chain d, which is a self-crosslinking group, so cracks during transfer were suppressed and good phase difference values were shown.
Claims (10)
(B)有機溶媒
を含有する重合体組成物から得られる単層位相差材。 A single-layer retardation material obtained from a polymer composition containing: (A) a polymer having a side chain having a photoreactive site, a side chain having a non-photoreactive hydrogen-bonding functional group, and a side chain having a self-crosslinking site; and (B) an organic solvent.
R4は、芳香族基、多環芳香族基、脂環族基、フェニレンシクロへキシレン基、複素環式基又は縮合環式基である。
R5は、-CH2-、-O-、-NH-、-C(=O)-、-C(=O)-O-、-O-C(=O)-、-CH=CH-C(=O)-O-、-C(=O)-NH-、-NH-C(=O)-又は-NH-C(=O)-NH-である。
R6は、炭素数1~10のアルキレン基であり、該アルキレン基の1つ又は複数の水素原子が、フッ素原子又は有機基で置換されていてもよい。また、R6中の-CH2-が、-O-、-NH-及び-C(=O)-からなる群から選ばれる基で置換されていてもよい。隣接する-CH2-が同時にこれらの基で置換されていてもよい。
式(b)中の環構造中の水素原子は、炭素数1~6のアルキル基、炭素数1~6のハロアルキル基、炭素数1~6のアルコキシ基、炭素数1~6のハロアルコキシ基、ハロゲン基、シアノ基及びニトロ基から選ばれる置換基で置換されていてもよい。
dは、0、1又は2である。
eは、0又は1である。
fは、0又は1である。
破線は、結合手である。) 2. The single-layer retardation material according to claim 1, wherein the polymer (A) has a side chain having a moiety represented by the following formula (b):
R4 is an aromatic group, a polycyclic aromatic group, an alicyclic group, a phenylenecyclohexylene group, a heterocyclic group, or a fused ring group.
R5 is -CH2- , -O-, -NH-, -C(=O)-, -C(=O)-O-, -O-C(=O)-, -CH=CH-C(=O)-O-, -C(=O)-NH-, -NH-C(=O)- or -NH-C(=O)-NH-.
R 6 is an alkylene group having 1 to 10 carbon atoms, and one or more hydrogen atoms of the alkylene group may be substituted with a fluorine atom or an organic group. In addition, -CH 2 - in R 6 may be substituted with a group selected from the group consisting of -O-, -NH-, and -C(═O)-. Adjacent -CH 2 - may also be substituted with these groups at the same time.
A hydrogen atom in the ring structure in formula (b) may be substituted with a substituent selected from an alkyl group having 1 to 6 carbon atoms, a haloalkyl group having 1 to 6 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, a haloalkoxy group having 1 to 6 carbon atoms, a halogen group, a cyano group, and a nitro group.
d is 0, 1 or 2.
e is 0 or 1.
f is 0 or 1.
The dashed lines represent bonds.)
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| WO2016143860A1 (en) * | 2015-03-11 | 2016-09-15 | 日産化学工業株式会社 | Cured film-forming composition, alignment material and the phase difference material |
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| JP2008164925A (en) | 2006-12-28 | 2008-07-17 | Hayashi Telempu Co Ltd | Retardation film and method for producing the same |
| KR101090325B1 (en) | 2009-03-18 | 2011-12-07 | 동방에프티엘(주) | Method for manufacturing high purity olmesartan medoxyl wheat |
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| WO2016143865A1 (en) * | 2015-03-11 | 2016-09-15 | 日産化学工業株式会社 | Cured film-forming composition, alignment material and phase difference material |
| WO2016143860A1 (en) * | 2015-03-11 | 2016-09-15 | 日産化学工業株式会社 | Cured film-forming composition, alignment material and the phase difference material |
| WO2017170681A1 (en) * | 2016-03-30 | 2017-10-05 | 日産化学工業株式会社 | Liquid crystal alignment agent, liquid crystal alignment film, and liquid crystal display element |
| US20210221672A1 (en) * | 2019-01-14 | 2021-07-22 | Hefei Xinsheng Optoelectronics Technology Co., Ltd. | Actuator and Manufacture Method Thereof, Operation Method Thereof, and Movable Device |
| WO2020203631A1 (en) * | 2019-03-29 | 2020-10-08 | 日産化学株式会社 | Polymer composition and single-layer retardation material |
| WO2023171760A1 (en) * | 2022-03-10 | 2023-09-14 | 日産化学株式会社 | Phase difference film composition and single-layer phase difference material |
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