WO2024158104A1 - Plasma treatment container, and treatment apparatus and method - Google Patents

Abstract

Provided is a plasma treatment container, and treatment apparatus and method comprising same, the plasma treatment container according to one embodiment of the present invention, used to accommodate therein an object to be treated for plasma treatment, comprising: a first main body that can accommodate an object to be treated; and a floating electrode connected to the first main body, wherein the floating electrode is electrically insulated from the exterior of the first main body.

Description

Plasma processing vessel, processing device and method

The present invention relates to a plasma processing container, a processing device, and a method, and more specifically, to a plasma processing container, a processing device, and a method capable of generating a uniform plasma discharge inside a processing container in which an object to be treated is accommodated. .

In general, plasma processing is used for various purposes in several industries, including semiconductor, display, agriculture, and medical industries.

In particular, plasma surface treatment is used on biomaterials for human skin restoration (skin graft), which are used for replacement, restoration, and reconstruction of human tissues and organs such as skin (dermal, cutaneous) in the medical industry. This has the effect of improving biocompatibility and implantation characteristics.

Plasma surface treatment technology has developed from the perspective of structure and process operation for plasma discharge focused on the surface treatment object. In accordance with the purpose of surface treatment of such objects, technologies for preventing filament discharge and glow discharge have been developed.

Conventional technologies for glow discharge or plasma discharge for object surface treatment have limitations that are effective only for objects with a specific shape and size, and there is a problem in that uniform discharge is not achieved throughout the entire interior of the container in which the object to be treated is stored. .

The technical problem to be achieved by the present invention is to provide a plasma treatment vessel capable of uniformly treating an object to be treated during plasma surface treatment, and a plasma treatment apparatus and treatment method including the same.

According to one embodiment of the present invention, a plasma processing vessel used for plasma processing of an object to be treated contained therein, comprising: a first body portion capable of accommodating the object to be treated; and a floating electrode connected to the first body, wherein the floating electrode is electrically insulated from the outside of the first body.

According to one embodiment of the present invention, a plasma processing vessel in which an object to be treated is accommodated; a housing portion in which the plasma processing vessel can be placed; a pressure adjusting unit installed in the housing, connected to the plasma processing vessel to enable fluid flow, and adjusting the pressure of the internal space of the plasma processing vessel; and a processing unit that receives power from the outside and forms an electric field to generate a plasma discharge in the internal space of the plasma processing container, wherein the plasma processing container includes: a first body portion capable of accommodating the object to be treated; and a floating electrode connected to the first body, wherein the floating electrode is electrically insulated from the outside of the first body.

According to an embodiment of the present invention, a plasma processing method for treating the surface of an object to be treated includes the steps of inserting a processing container containing the object to be treated into a housing portion; attaching the processing container to a processing unit installed in the housing unit; adjusting the pressure of the internal space of the processing vessel; Generating plasma in the internal space of the processing vessel by receiving power from the outside, wherein the processing vessel includes: a first body portion capable of accommodating the object to be treated; and a floating electrode connected to the first body, wherein the floating electrode is electrically insulated from the outside of the first body.

The plasma treatment vessel according to embodiments of the present invention is provided with a floating electrode, and can change the shape, distribution, and intensity of the electric field formed inside the treatment vessel, and through this, the surface of the object to be treated is uniformly plasma treated. There is an effect that can be done.

In addition, because the electric field is uniformly formed in the inner space of the processing vessel by the floating electrode, plasma surface treatment of the object to be treated is possible even at a relatively low voltage, so the electric field is concentrated in a specific area, causing damage to the object to be treated. It has the effect of preventing this from happening.

1 is a diagram schematically showing a plasma processing apparatus according to an embodiment of the present invention.

Figure 2 is a diagram showing a state in which the pressure of a plasma processing vessel is adjusted in a plasma processing apparatus according to an embodiment of the present invention.

Figure 3 is a diagram showing a state in which an object to be treated is plasma discharge treated in a plasma processing apparatus according to an embodiment of the present invention.

Figure 4 is a perspective view showing a plasma processing vessel according to the first embodiment of the present invention.

Figure 5 is an exploded view showing a plasma processing vessel according to the first embodiment of the present invention.

FIG. 6 is a cross-sectional view based on line II′ of FIG. 4.

FIG. 7 is a cross-sectional view based on line II-II′ of FIG. 4.

Figure 8 is a perspective view showing a plasma processing vessel according to a second embodiment of the present invention.

Figure 9 is an exploded view showing a plasma processing vessel according to a second embodiment of the present invention.

FIG. 10 is a cross-sectional view taken along line III-III′ of FIG. 8.

FIG. 11 is a cross-sectional view based on line IV-IV′ of FIG. 8.

Figure 12 is a perspective view showing a plasma processing vessel according to a third embodiment of the present invention.

Figure 13 is an exploded view showing a plasma processing vessel according to a third embodiment of the present invention.

FIG. 14 is a cross-sectional view based on line V-V′ of FIG. 12.

Figure 15 is an enlarged view of part A of Figure 14.

FIG. 16 is a cross-sectional view based on line VI-VI′ in FIG. 12.

17 to 19 are diagrams schematically showing a plasma processing apparatus according to another embodiment of the present invention.

Figure 20 is a flowchart showing a plasma processing method according to embodiments of the present invention.

According to one embodiment of the present invention, a plasma processing vessel used for plasma processing of an object to be treated contained therein, comprising: a first body portion capable of accommodating the object to be treated; and a floating electrode connected to the first body, wherein the floating electrode is electrically insulated from the outside of the first body.

In the present invention, a film portion covering the floating electrode may be further included.

In the present invention, the thickness of the film portion may be the same as the thickness of the first body portion or may be formed to be relatively thin.

In the present invention, the floating electrode may be formed in a structure that supports the inner surface of the first body to prevent deformation of the first body.

In the present invention, the floating electrode supports the inner surface of the first body to prevent shape deformation of the first body even if a pressure difference occurs inside and outside the first body during the plasma treatment of the object to be processed. It can be formed into a structure that does.

In the present invention, the floating electrode may be disposed along the inner peripheral surface of the first main body and may be formed in a structure where the starting point and the ending point are connected.

In the present invention, the floating electrode may be formed in a closed curve shape along the inner peripheral surface of the first body portion.

In the present invention, the floating electrode may be located in the center of the first main body based on the plasma processing direction.

In the present invention, a plurality of floating electrodes are provided, and the plurality of floating electrodes may be spaced apart at a preset interval.

In the present invention, the floating electrode may be formed of a conductive material.

In the present invention, a second body portion is hollow on the inside and the first body portion can be inserted and placed; and a cap portion that covers the second body portion and has a communication hole communicating with the internal space of the first body portion.

In the present invention, it may further include a flow limiting portion that covers the communication hole formed in the cap portion and restricts the flow of fluid between the inner space and the outer space of the first body portion.

In the present invention, the flow restrictor may only allow the flow of gas.

In the present invention, the flow restriction portion may be disposed between the cap portion and the first body portion.

In the present invention, the flow restriction part is formed in a film manner and can be coupled to the first body part.

According to one embodiment of the present invention, a plasma processing vessel in which an object to be treated is accommodated; a housing portion in which the plasma processing vessel can be placed; a pressure adjusting unit installed in the housing, connected to the plasma processing vessel to enable fluid flow, and adjusting the pressure of the internal space of the plasma processing vessel; and a processing unit that receives power from the outside and forms an electric field to generate a plasma discharge in the internal space of the plasma processing container, wherein the plasma processing container includes: a first body portion capable of accommodating the object to be treated; and a floating electrode connected to the first body, wherein the floating electrode is electrically insulated from the outside of the first body.

In the present invention, the processing unit includes a port portion disposed between the pressure adjusting unit and the processing container and capable of contacting the processing container; and an electrode portion disposed outside the processing container and receiving power to form an electric field.

In the present invention, a plurality of electrode units may be provided and may be respectively disposed on both sides of the plasma processing vessel.

According to an embodiment of the present invention, a plasma processing method for treating the surface of an object to be treated includes the steps of inserting a processing container containing the object to be treated into a housing portion; attaching the processing container to a processing unit installed in the housing unit; adjusting the pressure of the internal space of the processing vessel; Generating plasma in the internal space of the processing vessel by receiving power from the outside, wherein the processing vessel includes: a first body portion capable of accommodating the object to be treated; and a floating electrode connected to the first body, wherein the floating electrode is electrically insulated from the outside of the first body.

Hereinafter, the following embodiments will be described in detail with reference to the accompanying drawings. When describing with reference to the drawings, identical or corresponding components will be assigned the same reference numerals and duplicate descriptions thereof will be omitted.

Since the technical idea of the present invention can be subject to various changes and can have various embodiments, specific embodiments will be illustrated in the drawings and described in detail. However, this is not intended to limit the technical idea of the present invention to specific embodiments, and should be understood to include all changes, equivalents, and substitutes included in the scope of the technical idea of the present invention.

In explaining the technical idea of the present invention, if it is determined that a detailed description of related known technology may unnecessarily obscure the gist of the present invention, the detailed description will be omitted. In addition, numbers (eg, first, second, etc.) used in the description of this specification are merely identifiers to distinguish one component from another component.

In addition, in this specification, when a component is referred to as "connected" or "connected" to another component, the component may be directly connected or directly connected to the other component, but specifically Unless there is a contrary description, it should be understood that it may be connected or connected through another component in the middle.

In addition, terms such as “unit”, “unit”, “unit”, and “module” used in this specification refer to a unit that processes at least one function or operation, which refers to a processor, micro Processor (Micro Processer), Micro Controller, CPU (Central Processing Unit), GPU (Graphics Processing Unit), APU (Accelerate Processor Unit), DSP (Drive Signal Processor), ASIC (Application Specific Integrated Circuit), FPGA It may be implemented as hardware or software, such as a Field Programmable Gate Array, or a combination of hardware and software, and may also be implemented in a form combined with a memory that stores data necessary for processing at least one function or operation. .

In addition, it is intended to be clear that the division of components in this specification is merely a division according to the main function each component is responsible for. That is, two or more components, which will be described below, may be combined into one component, or one component may be divided into two or more components for more detailed functions. In addition to the main functions it is responsible for, each of the components described below may additionally perform some or all of the functions handled by other components, and some of the main functions handled by each component may be performed by other components. Of course, it can also be carried out in full charge by .

1 is a diagram schematically showing a plasma processing apparatus according to an embodiment of the present invention. Figure 2 is a diagram showing a state in which the pressure of a plasma processing vessel is adjusted in a plasma processing apparatus according to an embodiment of the present invention. Figure 3 is a diagram showing a state in which an object to be treated is plasma discharge treated in a plasma processing apparatus according to an embodiment of the present invention.

1 to 3, the plasma processing apparatus 1 according to an embodiment of the present invention includes a plasma processing vessel 10 (hereinafter referred to as 'processing vessel'), a housing unit 20, and a pressure adjustment unit. (30) and may include a processing unit (40).

Referring to FIGS. 1 to 3, the plasma processing apparatus 1 according to an embodiment of the present invention includes a processing vessel 10 in which an object to be treated (OB) is accommodated and a floating electrode 13 is provided. It can be used for plasma surface treatment of the object to be treated (OB).

Referring to FIGS. 1 to 3, the processing container 10 accommodates the object to be treated (OB), can be accommodated in the housing portion 20, and can be in close contact with and connected to the processing portion 40, which will be described later. .

Depending on the embodiment, the processing container 10 may refer to various types of devices or containers used to plasma surface treat the object OB. The processing container 10 may be a storage container for plasma surface treatment of the object OB, or may be a connection jig for a plasma processing device.

In this specification, the 'object to be treated (OB)' is a crown to cover a human tooth, etc., or bone that can be accommodated in an internal container such as a syringe or vial when an implant procedure is performed in a medical procedure or dentistry. It refers to biomaterials for human skin restoration (skin graft) used for replacement, restoration, and reconstruction of human tissues and organs, such as graft materials and skin (dermal, cutaneous).

In FIGS. 1 to 3, the object to be treated (OB) is schematically shown in a square shape for convenience of explanation. However, the treatment containers 10, 10', and 10' according to the first to third embodiments, which will be described later, are shown in FIGS. The object to be plasma treated by `) can be formed into various shapes to suit the purpose and placed inside the processing container 10, 10`, 10``.

A plasma discharge (PD) is generated by the plasma processing device 1 while the object to be treated according to embodiments of the present invention is accommodated inside the processing container 10, 10`, 10``, and the plasma causes It has the effect of enabling surface treatment of the object to be treated (OB).

Referring to FIGS. 1 to 4, the processing container 10 according to embodiments of the present invention accommodates an object to be treated (OB) therein, and includes a first body portion 11, a floating electrode 13, It may include a film portion.

Referring to Figures 1 to 3, the processing container 10 according to embodiments of the present invention may be placed inside the housing portion 20 and faces the processing portion 40, specifically the electrode portion 45. It can be placed by looking at it. The electrode unit 45 may include a first electrode 45a and a second electrode 45b that face each other and are spaced apart, and the processing container 10 includes the first electrode 45a and the second electrode 45b. It can be placed in between.

Referring to FIGS. 1 to 3, the first body portion 11 is hollow on the inside to accommodate the object to be treated (OB), and a floating electrode 13 can be disposed, and the first body portion 11 ) A communication hole portion 11h may be formed that communicates the inner space and the outer space of the gas G and provides a flow path for the gas G.

4 to 16 relate to processing containers (10, 10`, 10``) according to the first to third embodiments of the present invention. The housing unit 20, pressure adjustment unit 30, and processing unit 40 will be explained in detail later.

Referring to FIGS. 1 to 3, due to the communication hole portion 11h being formed in the processing container 10, specifically the first body portion 11, air and This has the effect of enabling the flow of the same gas (G).

In addition, due to the flow of gas G, a pressure difference occurs between the internal space and the external space of the first main body 11, and after the above pressure difference occurs, the processing vessel 10 is formed in a relatively low pressure state. There is an effect that plasma treatment of the object to be treated (OB) disposed in the internal space of is possible.

Referring to FIG. 1, the communication hole portion 11h may be formed in a preset area on the outer peripheral surface of the first body portion 11. The communication hole portion 11h may have a plurality of holes and may be formed to penetrate the outer peripheral surface of the first body portion 11 to communicate with the internal space in which the object OB is accommodated.

As an optional embodiment, the communication hole portion 11h may be formed on one side (left side in FIG. 1) facing the processing portion 40, specifically the port portion 41, which will be described later.

Referring to FIGS. 1 to 3 , the first body portion 11 may be accommodated in the housing portion 20 with the object to be treated (OB) accommodated therein. While accommodated in the housing unit 20, it can be subjected to plasma discharge (PD) treatment by the processing unit 40.

The above-described processing container 10 describes common contents of the processing containers 10, 10`, and 10`` according to the embodiments of the present invention, and is a processing container according to the first to third embodiments of the present invention. The composition, operating principle, and effects of the treatment containers (10, 10`, 10``) will be explained in detail later.

Referring to FIGS. 1 to 3 , the housing portion 20 according to an embodiment of the present invention accommodates the processing container 10 and may be formed as a component of the plasma processing apparatus 1.

A processing container 10 in which an object to be treated (OB) is accommodated is disposed in the housing portion 20 according to an embodiment of the present invention, and the processing portion 40 may be partially or entirely disposed in the housing portion 20. .

The processing container 10 is stored in the housing portion 20, and the processing container 10 is fixedly placed in a preset position, thereby preventing the position of the processing container 10 from changing and stably processing plasma. It has the effect of making it possible.

As an optional embodiment, the housing unit 20 may be formed to be movable along a preset direction by receiving power from a driving unit (not shown) such as a motor.

For example, after the processing container 10 is placed in the housing unit 20, power is transmitted from the driving unit to the processing unit 40, specifically between the first electrode 45a and the second electrode 45b. 20) can be positioned.

As an optional embodiment, the housing part 20 may be provided with a door part (not shown), and the inner space of the housing part 20 can be opened and closed by the door part, and the housing part 20 can be opened and closed in an open state. The processing container 10 is placed inside, and the internal space of the housing unit 20 is closed with the door, thereby spatially blocking the internal space and external space of the housing unit 20.

As an optional embodiment, the housing portion 20 may be arranged to be movable in a sliding manner.

As a result, the processing container 10 is placed in the first position formed in the housing portion 20, and power is transmitted from the outside to move the processing container 10 to the second position away from the first position, and then the processing unit 40 ), various modifications such as plasma treatment are possible.

As an optional embodiment, various modifications are possible, such as the pressure adjustment unit 30 and the power supply unit 47 being disposed inside the housing unit 20.

Referring to FIGS. 1 to 3, the pressure adjusting unit 30 according to an embodiment of the present invention is connected to the processing container 10 to allow fluid to flow, and can adjust the internal pressure of the processing container 10. .

Referring to FIG. 2, the pressure adjusting unit 30 may adjust the internal pressure of the processing container 10 by flowing fluid from the inside of the processing container 10 to the outside.

Specifically, by discharging a fluid, specifically a gas (G) such as air, from the inside of the processing vessel 10 to the outside, the internal space of the processing vessel 10 can be brought into a relatively low pressure atmosphere (LPA) state. there is.

Referring to Figures 1 to 3, the pressure adjusting unit 30 according to an embodiment of the present invention may be connected to a processing unit 40 that can be in close contact with the processing container 10, specifically the port unit 41, and the port unit Through (41), air (G) can be discharged to the outside from the internal space formed inside the processing container 10 and where the object to be treated (OB) is accommodated.

As the pressure adjusting unit 30 according to an embodiment of the present invention is driven, gas (G) such as air in the inner space of the processing container 10 is discharged to the outside, and the object to be treated (OB) is accommodated. A low pressure environment (LPA) for plasma generation may be created inside the container 10, specifically the first main body 11, and a vacuum area may be formed.

Referring to Figures 1 to 3, the pressure adjusting unit 30 according to an embodiment of the present invention is formed by a pump method, and the air inside the processing container 10, specifically the first main body 11 ( G) is discharged to the outside, but is not limited to this, and various modifications are possible within the technical idea of forming the internal pressure of the processing vessel 10 into a low pressure state (LPA).

Although not shown in the drawing, the pressure adjusting unit 30 may include a valve unit and a filter.

Referring to Figures 1 and 2, the processing unit 40 according to an embodiment of the present invention forms an electric field to generate a plasma discharge (PD) inside the processing container 10, and the processing unit 40 The electric field formed by the electric field may change in intensity, spatial shape, or distribution by the floating electrode 13, and the changed electric field has spatially uniform intensity, distribution, or shape inside the processing vessel 10 in which the object to be treated is accommodated. can have

Referring to Figures 1 and 2, the processing unit 40 according to an embodiment of the present invention may be in close contact with the processing container 10, specifically the first main body 11. The processing unit 40 can receive power from the outside and form an electric field to generate plasma discharge (PD) in the internal space of the first main body 11.

Referring to FIGS. 1 to 3 , the processing unit 40 according to an embodiment of the present invention may include a port unit 41, an electrode unit 45, and a power source unit 47. The port portion 41 is disposed between the pressure adjustment unit 30 and the processing container 10 and is capable of contacting the processing container 10.

Referring to FIGS. 1 to 3, the port portion 41 according to an embodiment of the present invention is fixed in position on the housing portion 20 and is in close contact with one side (left side in FIG. 1) of the processing container 10. can be connected A communication hole 11h may be formed on one surface of the first main body 11 connected to the port 41.

The port portion 41 according to an embodiment of the present invention is connected to the pressure adjusting unit 30, and as the pressure adjusting unit 30 is driven, the air (G) accommodated in the internal space of the first body portion 11 is When discharging to the outside, a discharge path for air (G) can be provided.

Referring to Figures 1 to 3, the port portion 41 according to an embodiment of the present invention may include a port main body 411 and a port sealing portion 413. The port body 411 is connected to the pressure adjusting unit 30 and can provide a path for air to flow from the internal space of the processing vessel 10 to the pressure adjusting unit 30.

The port sealing part 413 according to an embodiment of the present invention is coupled to the port main body 411, and has one end of the port main body 411 facing the processing container 10, specifically the first main body 11. Can be combined with wealth.

Specifically, the port sealing portion 413 is disposed between the port main body 411 and the first main body 11, and one side may be in close contact with the first main body 11, and the other side opposite to the port main body 411 is disposed between the port main body 411 and the first main body 11. It can be in close contact with (411).

The port sealing portion 413 according to an embodiment of the present invention may be disposed in close contact with the first body portion 11 and the port body 411, respectively, along the circumference. The port sealing portion 413 may be formed of a material capable of elastic deformation.

Since the port sealing unit 413 is formed of a material capable of elastic deformation, as the pressure adjusting unit 30 is driven, the pressure adjusting unit ( 30), the shape of the port sealing portion 413 is deformed (compressed) due to pressure changes, and the inner space formed by being surrounded by the port body 411 and the first body portion 11 is sealed. , confidentiality can be improved.

In addition, since the port sealing part 413 is arranged in close contact with the port main body 411 and the first main body 11, respectively, foreign substances are prevented from flowing in from the outside of the first main body 11 and the port main body 411. can be blocked.

In addition, the internal space and external space surrounded by the first main body 11 and the port main body 411 are spatially separated, and the flow of gas G is blocked so that the pressure adjusting unit 30 efficiently adjusts the pressure. There is an effect that can be controlled.

Due to the operation of the pressure adjusting unit 30, air may flow from the inner space of the processing container 10, specifically the first main body 11, to the pressure adjusting unit 30 through the inner space of the port portion 41. , Accordingly, the internal space of the first body portion 11 where the object to be treated (OB) is accommodated creates a low pressure environment in which plasma discharge (PD) for surface treatment of the object to be treated (OB) can be generated, By forming a vacuum area, there is an effect that plasma generation can be concentrated in the internal space where the object to be treated (OB) is accommodated.

Referring to FIGS. 1 to 3 , the electrode unit 45 according to an embodiment of the present invention is disposed on the outside of the processing container 10 and may be disposed on the inside of the housing unit 20 . The electrode unit 45 may receive power from the outside and form an electric field for generating plasma in the internal space of the first body unit 11 surrounding the object OB.

The processing unit 40 may generate plasma discharge (PD) in the internal space of the first main body 11, which is a sealed area, through dielectric barrier discharge (DBD). As an optional embodiment, the processing unit 40 may generate vacuum plasma using low-frequency alternating current power.

As an alternative embodiment, the dielectric barrier may be formed by providing the plasma processing device 1 with a dielectric portion (not shown).

As an optional embodiment, the dielectric barrier may be formed by providing at least a portion of the processing vessel 10 that accommodates the object OB with a dielectric material.

Referring to Figures 1 to 3, the electrode unit 45 according to an embodiment of the present invention may include a first electrode 45a and a second electrode 45b. The first electrode 45a and the second electrode 45b are electrically connected to the power supply unit 47 and can receive power from the power supply unit 47.

When power is applied to the electrode unit 45, plasma is generated in the internal space of the first body unit 11 where the object to be treated (OB) is accommodated by the voltage difference between the first electrode 45a and the second electrode 45b. can be formed. The first electrode 45a may be formed as a high voltage electrode, and the second electrode 45b may be a ground electrode to which no voltage is applied and may maintain ground (OV).

As an optional embodiment, the first electrode 45a may be connected to the port portion 41, and the second electrode 45b may be fixed to the housing portion 20.

The electrode unit 45 according to an embodiment of the present invention may be disposed outside the processing container 10 in which the object to be treated (OB) is accommodated, and the electrode unit 45 may be connected to a high voltage power source from the power supply unit 47. Plasma can be generated inside the processing container 10, specifically the first main body 11, by receiving and forming an electric field.

Referring to FIGS. 1 and 2, a floating electrode 13 may be disposed in contact with the inner surface of the first body portion 11 according to an embodiment of the present invention, and the floating electrode 13 may be connected to the power supply unit 47. It can be placed spaced apart from the electrode unit 45 without receiving power.

As a result, when an electric field is formed by the electrode portion 45, the outside of the floating electrode 13, specifically between the floating electrode 13 and the first electrode 45a, the floating electrode 13 and the second electrode 45b Due to the induction of (+) or (-) charges therebetween, the electric field is concentrated inside the floating electrode 13 and the processing container 10 and has the effect of being uniformly formed throughout the processing container 10.

That is, the intensity, spatial distribution, or shape of the electric field formed between the electrode portions 45 changes due to the floating electrode 13 located between the first electrode 45a and the second electrode 45b. As a result, the electric field formed between the electrode portions 45 is concentrated inside the processing container 10 where the actual object to be treated is accommodated, and is formed uniformly.

Therefore, there is an effect that plasma discharge (PD) can easily occur in the internal space of the first body portion 11 that accommodates the object to be treated (OB).

In addition, due to the floating electrode 13, the intensity, spatial distribution, or shape of the electric field formed between the electrode parts 45 can be changed and concentrated, so plasma discharge (PD) can be generated even at a relatively low voltage. , It has the effect of preventing damage to the object to be treated (OB).

Referring to FIG. 3, when an electric field is formed according to the present invention, a low pressure environment (LPA) and a vacuum area are formed and a plasma discharge (PD) is generated in the internal space of the first body portion 11 that accommodates the object to be processed (OB). ) can be generated uniformly, plasma is generated in the internal space, and plasma surface treatment of the object to be treated (OB) can be performed.

Although not shown in the drawing, the processing unit 40 may include a sensor unit, and the sensor unit may detect whether the port unit 41 and the processing container 10 are in contact or connected.

The sensor unit detects whether the entire area where the processing container 10 and the port portion 41 are in contact is properly contacted, so that the entire area where the port portion 41 and the processing container 10 are connected is in close contact with the pressure adjusting unit ( There is an effect of adjusting the pressure inside the processing vessel 10 by driving 30).

After adjusting the internal pressure of the first body unit 11, the electrode unit 45 can receive power from the power supply unit 47 so that an electric field is formed between the plurality of electrode units 45.

Referring to FIG. 3, when an electric field is formed by the electrode unit 45 according to an embodiment of the present invention, a low pressure environment and a vacuum area are formed and the first body unit 11 accommodating the object to be treated (OB) Plasma may be generated in the internal space of , plasma is generated in the internal space, and plasma surface treatment of the object OB disposed in the internal space of the first body portion 11 may be performed.

As a result, the electrode unit 45 to which high voltage power is applied is prevented from being exposed to the outside, and an electric field can be formed in a sealed state in the space formed by the port unit 41 and the internal space of the processing vessel 10. there is.

*101 Referring to Figures 1 to 3, the power supply unit 47 according to an embodiment of the present invention is electrically connected to the electrode unit 45, and can generate power and transmit it to the electrode unit 45.

The first electrode 45a is disposed on the outside of the first body 11 where the object to be treated (OB) is accommodated by applying power from the power source 47 to the electrode part 45 according to an embodiment of the present invention. , an electric field may be formed between the second electrodes 45b.

Referring to FIGS. 1 and 2, a floating electrode 13 is coupled to the inner surface of the first body portion 11 disposed between a plurality of electrodes, specifically the first electrode 45a and the second electrode 45b. The intensity, spatial distribution, or shape of the electric field formed between the first electrode 45a and the second electrode 45b may be changed due to the floating electrode 13.

In other words, the electric field is concentrated in the space formed between the plurality of electrode parts 45 and the floating electrode 13 due to the floating electrode 13, and the object to be treated is disposed in the inner space of the first main body 11. When treating the surface of (OB), plasma processing efficiency can be improved.

Hereinafter, the processing container 10 according to the first to third embodiments of the present invention will be described in detail.

<First embodiment of processing container>

Figure 4 is a perspective view showing a plasma processing vessel according to the first embodiment of the present invention. Figure 5 is an exploded view showing a plasma processing vessel according to the first embodiment of the present invention. FIG. 6 is a cross-sectional view based on line II′ of FIG. 4. FIG. 7 is a cross-sectional view based on line II-II′ of FIG. 4.

Referring to FIGS. 4 to 7, the processing container 10 is used for plasma processing of the object to be treated (OB) accommodated therein, and includes a first body portion 11, a floating electrode 13, and a film portion. (15), a sealing part 17, and a flow restriction part (not shown) may be included.

Referring to FIGS. 5 to 7 , the first body portion 11 is capable of accommodating an object to be treated (OB) and may include a first body 111, a cap portion 115, and a sealing portion 17. .

The object to be treated (OB) accommodated in the processing container 10 according to the first embodiment of the present invention can be formed as a full crown that can be installed and completely or partially covers the teeth of the human body. there is.

The object to be treated (OB) accommodated in the processing container 10 according to the first embodiment of the present invention may have a curved section formed in a 'U' shape, and the object to be treated may be inside the first body 111. A crossing protrusion (reference numeral not set) may be formed to protrude so as to span the curved section of (OB).

Referring to FIGS. 4 and 5, the first body 111 has a hollow interior to accommodate the object to be treated (OB), and can be combined with the cap portion 115, which will be described later.

Referring to FIGS. 4 and 6, a communication hole 11h may be formed through one surface of the first body 111. There may be a plurality of communication hole portions 11h, and the communication hole portion 11h is formed so that air flows between the inner space surrounded by the first body 111 and the cap portion 115 and the outer space of the processing container 10. There is an effect that allows the flow of gas (G) as follows.

Specifically, the communication hole portion 11h formed in the first body 111 may be disposed facing the processing portion 40, specifically the port portion 41, which will be described later, and the internal space of the first body portion 11. Gas (G) may flow from the port portion 41 to the pressure adjusting portion 30.

Referring to FIGS. 4 to 7, the cap portion 115 covers the first body 111, and the object to be treated (OB) is accommodated in the internal space of the first body 111. ) can be combined with. Referring to FIGS. 4 and 5 , a cap protrusion 116 may be formed on one surface of the cap portion 115 facing the first body 111 to protrude toward the first body 111 .

Referring to FIG. 5 , a plurality of cap protrusions 116 may be provided and may be spaced apart along the circumference of the center of the cap portion 115 .

Referring to FIGS. 4 and 5, the first body 111 may have a preset depth so that the cap protrusion 116 spans, and the spanning groove 112 may be formed in the shape of a groove.

Referring to FIGS. 6 and 7, a protruding protrusion 116k may be formed to protrude inward at one end of the cap protrusion 116 (lower end in FIG. 6) facing the first body 111, and a straddling groove ( 112) It can be draped over a groove formed with a preset depth.

As a result, it is possible to prevent the cap portion 115 from being disconnected or separated from the first body 111 while it is coupled to the first body 111.

Referring to FIGS. 4 to 7 , the floating electrode 13 is installed in the first body portion 11 and may be made of a metal material. The floating electrode 13 may be connected to the first body 11, specifically the first body 111 and the cap portion 115.

Unlike the electrode unit 45, which will be explained later, the floating electrode 13 does not receive power from the power source 47 and is not grounded, so it is connected to the first body 11, specifically the first body 111, and the cap part ( 115).

Referring to FIGS. 4 to 7, the floating electrode 13 according to the first embodiment of the present invention may be disposed between a plurality of electrode units 45 that form an electric field inside the processing vessel 10, A strong electric field can be formed in the internal space of the processing vessel 10, specifically the first main body 11, between the floating electrode 13 and the electrode unit 45.

That is, there is an effect of concentrating the electric field formed by the plurality of electrode units 45 that receive power from the power source unit 47 into the internal space of the first body unit 11 where the object to be treated (OB) is accommodated. there is.

In addition, since the floating electrode 13 surrounds the object OB and is disposed on the outside, the electric field can be uniformly formed in the outer area of the object OB by modifying the intensity, spatial distribution, or shape of the electric field. It has the effect of allowing you to do so.

In addition, as the intensity, spatial distribution or shape of the electric field formed throughout the internal space of the first main body 11 is changed due to the floating electrode 13, the object to be processed located between the plurality of electrode parts 45 ( OB) has the effect of discharging a uniform plasma.

Referring to FIGS. 4 to 7 , the floating electrode 13 may be connected to the first body 111 and the cap portion 115, respectively.

A floating electrode 13 extending along a preset direction is formed in the first body 111 and the cap portion 115 along the outer circumference of the object to be processed (OB) accommodated in the internal space of the first body 11. A seating groove portion 111a may be formed on the inner surface of the first body 111 and the inner surface of the cap portion 115 so that the electrode can be placed along the inner surface of the cap portion 115, and the floating electrode 13 may be disposed in the seating groove portion 111a.

Referring to FIGS. 4 to 7 , the floating electrode 13 may be arranged to contact the inner surfaces of the first body 111 and the cap portion 115. As a result, the floating electrode 13 is disposed in the area where the plasma discharge (PD) occurs in the internal space of the first main body 11, and as a result, the electric field is formed uniformly in the area surrounded by the floating electrode 13. The intensity and shape of the electric field are modified, and the effect of concentrating the electric field can be achieved.

The floating electrode 13 may be formed in a structure that supports the inner surface of the first body 11 to prevent deformation of the first body 11.

Referring to FIGS. 5 to 7, the floating electrode 13 maintains the shape of the first body 11 even if a pressure difference occurs inside and outside the first body 11 during the plasma treatment of the object OB. It may be formed in a structure that supports the inner surface of the first body portion 11 to prevent deformation.

That is, when the floating electrode 13 secures rigidity and maintains its shape, the pressure adjusting unit 30 is driven, and gas such as air is discharged from the internal space of the first main body 11. This has the effect of preventing the internal space of the unit 11 from being reduced or deformed.

Referring to FIGS. 4 and 5, the floating electrode 13 is not disposed on the cap protrusion 116 formed on the cap portion 115, but is not limited to this and the groove is also formed on the cap protrusion 116, and the floating electrode 13 is not disposed on the cap protrusion 116 formed on the cap portion 115. Various modifications are possible, such as the electrode 13 being disposed.

The floating electrode 13 according to the first embodiment of the present invention may be electrically insulated. As a result, the floating electrode 13 may be blocked from receiving power from the power supply unit 47.

As an optional embodiment, the floating electrode 13 may be formed in a ring shape and form a closed section.

As an optional embodiment, the floating electrode 13 may be formed in a closed section, specifically a ring shape.

1 and 4, the floating electrode 13 according to an embodiment of the present invention includes an electrode unit 45, specifically a first electrode 45a and a second electrode 45b, which receive power from the power supply unit 47. When applied to form an electric field, it may be placed in the center of the first main body 11 based on the direction in which the electric field is formed (up and down direction based on FIG. 1).

Referring to FIG. 1, the communication hole portion 11h formed in the first body portion 11 and the floating electrode 13 are disposed in an overlapping position, but this is for schematic illustration only, as shown in FIGS. 4 to 7. Various modifications are possible, such as arranging the floating electrode 13 and the communication hole portion 11h to be spaced apart.

Referring to FIGS. 5 to 7 , the processing container 10 according to the first embodiment of the present invention may further include a film portion 15. The film portion 15 covers the floating electrode 13 and is coupled to the first body portion 11, and may be formed of an insulating material.

Since the film portion 15 is made of an insulating material, the floating electrode 13 can be maintained in an electrically insulated state.

In addition, because the film portion 15 covers the floating electrode 13, it prevents direct contact between the floating electrode 13 and the object OB, and prevents the object OB from being damaged during the plasma treatment process. It has the effect of preventing this.

As an optional embodiment, the film portion 15 covers the floating electrode 13 disposed in contact with the inner surfaces of the first body 111 and the cap portion 115 and may be coupled to the first body 11.

As an optional embodiment, the film portion surrounds the outer peripheral surface of the floating electrode 13 and may be disposed in the first body portion 11, specifically the first body 111 and the seating groove portion 111a formed in the cap portion 115. .

The film portion 15 is formed of an insulating material and covers the floating electrode 13, so that the floating electrode 13 does not receive power from the power supply portion 47 and the electric field formed between the plurality of electrode portions 45 is reduced. There is an effect of improving plasma discharge (PD) processing efficiency by concentrating it in a preset area.

In addition, the floating electrode 13 is disposed so that the electric field can be concentrated in the area formed between the electrode portion 45, specifically the first electrode 45a, the second electrode 45b, and the floating electrode 13. The electric field is concentrated around the object OB accommodated in the internal space of the first body 11, which has the effect of improving uniformity during plasma treatment of the surface of the object OB.

The thickness of the film portion 15 may be the same as that of the first body portion 11 or may be formed to be relatively thin. This has the effect of securing the insulation performance of the floating electrode 13.

Referring to Figures 5 to 7, the sealing part 17 according to the first embodiment is disposed between the first body 111 and the cap part 115, and may be formed of a material capable of elastic deformation. Referring to FIGS. 5 and 7 , the sealing portion 17 may be seated and disposed on the sealing groove portion 113 formed in the first body 111.

With the sealing portion 17 seated in the sealing groove portion 113, the first body 111 and the cap portion 115 are coupled, the sealing portion 17 is elastically deformed, and the first body 111 and the cap portion 115 are formed. ), there is an effect of improving the airtightness of the internal space of the first main body 11 surrounded by the first main body 111 and the cap part 115.

Referring to FIGS. 5 to 7, in the present invention, the sealing groove portion 113 is formed in the first body 111, but the sealing groove portion 113 is not limited to this and is formed in the cap portion 115, etc., and the sealing groove portion 17 is formed in the first body 111. (111), various modifications are possible within the technical idea of being in close contact with the cap portion 115 and improving airtightness.

Although not shown in the drawing, the flow limiting portion covers the communication hole portion 11h and is coupled to the first body portion 11, which limits the flow of fluid between the inner space and the outer space of the first body portion 11. You can.

As an alternative embodiment, the flow restrictor may only allow the flow of gas. As a result, it is possible to block fluids other than the gas (G) such as air, foreign substances, etc. from flowing into the first body portion 11 where the object to be treated (OB) is accommodated.

As an optional embodiment, the flow restriction portion may be coupled to the outer surface of the first body portion 11. However, it is not limited to this, and various modifications are possible, such as being coupled to the inner surface of the first main body 11 within the technical idea of covering the communication hole 11h and restricting the flow of fluid. The flow restriction portion is formed in a film manner and may be coupled to the outer or inner surface of the first body portion 11.

<Second embodiment of processing container>

Figure 8 is a perspective view showing a plasma processing vessel according to a second embodiment of the present invention. Figure 9 is an exploded view showing a plasma processing vessel according to a second embodiment of the present invention. FIG. 10 is a cross-sectional view taken along line III-III′ of FIG. 8. FIG. 11 is a cross-sectional view based on line IV-IV′ of FIG. 8.

Referring to FIGS. 8 to 11, the processing container 10' according to the second embodiment of the present invention is used for plasma processing of the object to be processed contained therein, and includes a first body portion 11', a floating It may include an electrode 13′, a film portion 15′, and a first body cap 14′.

Referring to FIGS. 8 to 11, the first main body 11' according to the second embodiment of the present invention is capable of receiving an object to be treated and includes a first main body 111' and a cap part 115'. can do.

The object to be treated accommodated in the treatment container 10', specifically the first main body 11' according to the second embodiment of the present invention, is a bone graft material, such as a syringe (OB1) or a vial (OB2). ) can be accommodated in an internal container such as

The object to be treated is accommodated in the inner space of the syringe DHK (OB1) and the vial (OB2) and can be plasma treated.

Due to this, rather than placing the object to be treated, such as bone graft material, separately into the syringe (OB1) and vial (OB2) after plasma treatment, the object to be treated is accommodated in a container like the syringe (OB1) and vial (OB2). It has the effect of being immediately plasma treated.

Referring to FIGS. 8 to 11, the first body 111 ` accommodates an internal container such as a syringe OB1 and a vial OB2 in which the object to be treated is accommodated, and one side (upper side in FIG. 9) has an opening. It can be.

Referring to FIGS. 9 to 11, the first body 111 ` has a hollow interior so as to accommodate the object to be treated and the internal containers OB1 and OB2 in which the object to be treated are accommodated, and the cap portion 115 to be described later. `) can be combined.

Referring to Figures 9 to 11, the first body 111' according to the second embodiment of the present invention has a preset depth so that the floating electrode 13' can be seated along the inner peripheral surface and has a seating groove ( 111`a) may be formed in the shape of a groove.

As a result, the outer peripheral surface of the floating electrode 13' is located on the same plane as the inner peripheral surface of the first body 111', and the floating electrode 13' is prevented from being separated from the first body 111'. There is.

Referring to Figure 9, a crossing groove 112' may be formed at one end of the first body 111' (upper part based on Figure 9) with a preset depth, and the crossing groove 112' may be formed as described later. The cap protrusion 116 ′ formed on the cap portion 115 ′ may be overlaid.

As an optional embodiment, the cap protrusion 116' may be coupled to the spanning groove 112' in a fitting manner.

Referring to FIGS. 9 to 11, the first body 111' has an internal container in which the object to be treated is accommodated, specifically a first container that is formed as a hollow hole so that a syringe (OB1) and a vial (OB2) can be inserted. A portion 113`a and a second receiving portion 113`b may be formed.

The first accommodating part 113`a may have an inner circumferential surface formed to correspond to the shape of the syringe OB1, and the second accommodating part 113`b may have an inner circumferential surface formed to correspond to the shape of the vial OB2.

Referring to FIGS. 9 and 10, one surface of the first body 111` (top surface in FIG. 9) has at least one fixing part 114` on the outside based on the center of the first accommodating part 113`a. may be formed to protrude in an outward direction.

The plurality of fixing parts 114` may be arranged equiangularly along the circumferential direction based on the center of the first receiving part 113`a.

Referring to FIG. 10, the syringe OB1 is inserted into the first receiving part 113`a, and one side of the syringe OB1 (based on FIG. 10) is disposed inside the plurality of fixing parts 114`. , there is an effect of blocking the syringe OB1 from rotating clockwise or counterclockwise inside the first accommodating part 113`a and fixing its position.

Referring to Figures 8 to 11, the cap portion 115' covers the first body 111', and the internal containers OB1 and OB2 in which the object to be treated are accommodated are inside the first body 111'. It can be combined with the first body 111' while accommodated in space.

Referring to FIGS. 8 to 10 , a cap protrusion 116 ′ may be formed on one side of the cap portion 115 ′ facing the first body 111 ′ to protrude toward the first body 111 ′.

Referring to FIG. 10 , a plurality of cap protrusions 116 ′ may be provided and may be spaced apart along the circumference of the center of the cap portion 115 ′.

Referring to FIGS. 8 to 10 , the first body 111 ′ has a preset depth so that the cap protrusion 116 ′ extends, and the spanning groove 112 ′ may be formed in the shape of a groove.

As a result, it is possible to prevent the cap portion 115' from being uncoupled or separated from the first body 111' while it is coupled to the first body 111'.

Referring to Figures 8 to 11, unlike the processing container 10 according to the first embodiment of the present invention, the processing container 10' according to the second embodiment has a communication hole portion 11' in the cap portion 115'. h) may be formed through. The communication hole portion 11`h may be provided with a plurality of hole portions, and the communication hole portion 11`h is formed so that the object to be treated is accommodated and an inner container OB1 inserted into the first body 111` is placed. This has the effect of allowing the flow of gas (G) such as air between the inner space of OB2) and the outer space of the processing container (10').

Specifically, the communication hole portion 11′h formed in the cap portion 115′ may be disposed facing the processing portion 40, specifically the port portion 41, and is accommodated in the first body 111′ and is subject to processing. A gas (G) such as air may flow from the internal space of the internal containers (OB1, OB2) containing water to the pressure adjusting unit (30) through the port unit (41).

Referring to Figure 10, the inner surface of the cap portion 115' according to the second embodiment of the present invention, specifically, one surface facing the first body cap 14' is pressed in the direction toward the first body cap 14'. The portion 117` may be formed to protrude.

The pressing portion 117` may contact and pressurize one surface (upper surface in FIG. 10) of the first body cap 14` and may be formed to extend along the circumferential direction on the inner surface of the cap portion 115`.

Because the pressing portion 117` contacts and pressurizes one surface of the first body cap 14′, the inner region surrounded by the pressing portion 117` can be spatially separated from the outer region of the pressing portion 117`. There is an effect of improving the airtightness and sealing of the inner area.

Referring to Figures 8 to 11, the floating electrode 13' is installed in the first body 111' and may be made of a metal material.

Unlike the electrode unit 45, the floating electrode 13' may be connected to the first body 111' without receiving power from the power source 47 or being grounded, and specifically, the first body 111'. It is placed in the seating groove portion 111`a formed on the inner surface of and can be fixed in position.

Referring to Figures 8 to 11, the floating electrode 13' may be arranged to contact the inner surface of the first body 111'. As a result, the floating electrode 13′ is disposed surrounding the area where the plasma discharge (PD) occurs in the internal space of the first body portion 111′, and the electric field is concentrated around the floating electrode 13′, An electric field may be formed uniformly throughout the first body 111`.

The floating electrode 13' may be formed in a structure that supports the inner surface of the first body 11', specifically the first body 111', to prevent deformation of the first body 111'. .

Referring to FIGS. 9 to 11 , the floating electrode 13 ′ maintains the pressure of the first body 111 ′ even if a pressure difference occurs inside and outside the first body 111 ′ during the plasma treatment of the object OB. It may be formed in a structure that supports the inner surface of the first body 111' to prevent shape deformation.

That is, the floating electrode 13' secures rigidity and maintains its shape, so that when the pressure adjusting unit 30 is driven, gas such as air is discharged from the internal space of the first body 11'. There is an effect of preventing the internal space of the first main body 11`, specifically the first main body 111`, from being reduced or deformed.

Referring to FIG. 8, the floating electrode 13' is an electrode portion 45 that forms an electric field inside the processing container 10', specifically a first electrode 45a and a second electrode 45b disposed facing each other. ) and may be located in the center of the first body 111' based on the plasma processing direction (up and down direction based on FIG. 8).

As a result, the processing container 10′ between the floating electrode 13′ and the electrode unit 45, specifically the syringe OB1 for receiving the object to be treated such as bone graft material in the first body 111′, and the vial A strong electric field can be formed in the internal space (IS1, IS2) of (OB2).

In other words, there is an effect of concentrating the electric field formed by the electrode unit 45 receiving power from the power supply unit 47 into the internal space of the internal containers OB1 and OB2 where the object to be treated is accommodated.

In addition, since the floating electrode 13' surrounds the object to be treated and is disposed on the outside, it has the effect of allowing an electric field to be uniformly formed in the outer area of the object to be treated.

In addition, as the intensity, spatial distribution, or shape of the electric field formed throughout the internal space of the inner containers (OB1, OB2) is changed due to the floating electrode (13'), the electrode portion (45), specifically the facing first electrode ( 45a), there is an effect of uniformly discharging plasma to the object to be treated located between the second electrodes 45b.

The floating electrode 13' may be electrically insulated. As a result, the floating electrode 13' may be blocked from receiving power from the power supply unit 47.

As an optional embodiment, the floating electrode 13' may be formed in a ring shape and form a closed section.

As an optional embodiment, the floating electrode 13' may be formed in a closed section, specifically a ring shape.

Referring to Figures 9 to 11, the first body cap 14` covers the first accommodating portion 113`a and the second accommodating portion 113`b formed in the first body 111`. It is coupled to the first body 111′ and may be disposed between the first body 111′ and the cap portion 115′.

Referring to Figures 9 to 11, a through-hole portion 14'h may be formed through the first body cap 14', and the through-hole portion 14'h may be a communication hole formed in the cap portion 115'. It can be connected to (11`h).

The passage hole part 14`h communicates with the communication hole part 11`h on one side (upper side in FIG. 10), and on the other side opposite to it (lower side in FIG. 10), there is an inside such as a syringe or vial in which the object to be treated is accommodated. It may communicate with the internal space of the containers OB1 and OB2.

As a result, as the pressure adjusting unit 30 is driven, the passage hole part 14'h, the communication hole part 11'h, and the processing part 40, specifically the port part 41, are removed from the inner space of the inner containers OB1 and OB2. The air is discharged to the outside, creating a low pressure environment (LPA).

Referring to Figures 9 to 11, contact portions 141' and 142' may be formed to protrude outward on one surface of the first body cap 14' facing the first body 111'.

The contact portions 141` and 142` may have at least one curved section and may be formed to protrude. The contact portions 141' and 142' may be formed of a material capable of elastic deformation. Referring to FIGS. 9 and 10, one contact portion 141′ may be disposed in close contact with the inner peripheral surface of the first body 111′, and the other contact portion 142′ may be an internal container such as a syringe ( It can be placed in close contact with the inner peripheral surface of OB1).

As a result, the communication hole portion 11`h formed in the cap portion 115`, the through hole portion 14`h formed in the first body cap 14`, and the interior of the internal containers OB1 and OB2 capable of communicating with them. It has the effect of improving the airtightness and airtightness of space.

Although not shown in the drawing, the flow restrictor covers the communication hole portion 11`h and is coupled to the first body portion 11`, which prevents the flow of fluid between the inner space and the outer space of the first body portion 11`. Flow may be restricted.

As an alternative embodiment, the flow restrictor may only allow the flow of gas. As a result, it is possible to block fluids other than the gas (G) such as air, foreign substances, etc. from flowing into the first body portion (11') where the object to be treated (OB) is accommodated.

As an optional embodiment, the flow restriction portion may be coupled to the outer surface of the first body portion 11′, specifically the cap portion 115′. However, it is not limited to this, and various modifications are possible, such as being coupled to the inner surface of the cap portion 115′ within the technical idea of covering the communication hole portion 11′h and restricting the flow of fluid.

The flow restriction portion is formed in a film manner and may be coupled to the outer or inner surface of the first body portion 11`.

As an optional embodiment, the flow restricting portion covers the through hole portion 14′h formed in the first body cap 14′ disposed between the cap portion 115′ and the first body 111′ and covers the first body cap 115′. It can be combined with the outer or inner surface of (14`).

The processing container 10' according to the second embodiment of the present invention may further include a film portion 15'. In relation to this, since the structure and effect are the same as those of the film portion 15 of the processing container 10 according to the first embodiment, detailed description will be omitted to the extent of overlap.

<Third embodiment of processing container>

Figure 12 is a perspective view showing a plasma processing vessel according to a third embodiment of the present invention. Figure 13 is an exploded view showing a plasma processing vessel according to a third embodiment of the present invention. FIG. 14 is a cross-sectional view based on line V-V′ of FIG. 12. Figure 15 is an enlarged view of part A of Figure 14. FIG. 16 is a cross-sectional view based on line VI-VI′ in FIG. 12.

Referring to FIGS. 12 to 16, the processing container 10`` according to the third embodiment of the present invention is used for plasma processing of the object to be treated (OB) accommodated therein, and has a container body portion (drawing) symbol not set), a floating electrode (13``), a film part (not shown), and a flow restriction part.

The 'container body portion' in the processing container 10`` according to the third embodiment of the present invention corresponds to the first body portion 11 in the processing container 10 according to the first embodiment of the present invention. , the terminology was changed to distinguish it from the first main body 11 according to the first embodiment.

Referring to FIGS. 12 to 16, the container body portion can accommodate the object to be treated (OB), and includes a first body portion (111″), a guide portion (112″), and a first body cap (113″). , a second main body (114``), and a cap part (115``).

The object to be treated (OB) accommodated in the processing container 10 ``, specifically the first main body 111 ``, according to the third embodiment of the present invention has a preset thickness and area, and the first main body 111 `` has a preset thickness and area. It can be accepted in section (111``).

A plasma discharge (PD) is generated by the plasma processing device 1 while the object OB is accommodated inside the first body 111``, and the surface of the object OB is generated due to the plasma. Processing is possible.

The object to be treated (OB) according to the third embodiment of the present invention is used in the medical industry and is used for human skin restoration, which is used for replacement, restoration, and reconstruction of human tissues and organs such as skin (dermal, cutaneous). It refers to biomaterial (skin graft).

Referring to FIGS. 13 to 16 , the first body portion 111 `` can accommodate the object to be treated OB and may have a hollow interior. A floating electrode 13`` is connected to the first body 111``, and the floating electrode 13`` may be disposed inside the first body 111``.

Referring to FIGS. 13 and 14, a first body rib 111``a may be formed to protrude from the inner surface of the first body portion 111``along the longitudinal direction (up and down direction based on FIG. 14). A plurality of first main body ribs 111``a may be provided, and a plurality of first main body ribs 111``a may be spaced apart from each other at a preset interval.

A plurality of first body ribs (111``a) are spaced apart from each other at preset intervals along the inner peripheral surface of the first body portion (111``), so that they are located on the inside of the first body rib (111``a). It is possible to prevent the disposed object OB from adhering to the inner surface of the first body portion 111``.

In addition, when the pressure adjusting unit 30 is driven through the space formed between the plurality of first main body ribs 111``a, the communication hole part 115``h is formed inside the first main body part 111``. It is possible to provide a flow path for gas (G) such as air that is discharged to the outside.

In addition, since the space formed between the plurality of first body ribs 111``a is formed uniformly along the inner peripheral surface of the first body portion 111``a, a low pressure environment (LPA) is created in the space. This has the effect of enabling uniform plasma surface treatment of the object to be treated (OB) during plasma discharge (PD).

Referring to FIG. 14, the first body rib 111``a protruding from the inner surface of the first body part 111`` is a guide rib protruding from the inner surface of the guide part 112`` to be described later. It can be connected to (112``a).

As a result, the space between the plurality of first body ribs 111``a and the space between the plurality of guide ribs 112``a can be communicated, and the processing container 10``, specifically the first main body. It has the effect of providing a flow and discharge path for air (G) from the internal space of the unit 111`` to the external space.

Referring to FIG. 14, a step portion 111``b may be formed to protrude inward on the inner surface of the first main body 111`` according to the third embodiment of the present invention.

The step portion 111``b protrudes inward so that the cross-sectional area of the first main body 111`` is formed differently along the longitudinal direction (up and down direction based on FIG. 14) of the first main body 111``. It can be formed to a preset length.

Referring to FIG. 14, in the first area where the step portion 111``b is formed to protrude from the first body part 111``, a plurality of first body ribs 111``a are formed in advance along the inner peripheral surface. They can be spaced apart at set intervals.

Referring to FIG. 14, the first body rib 111``a is protruded in the second area excluding the first area where the step part 111``b is formed to protrude from the first body 111``. It may not work.

Referring to FIG. 14, a floating electrode 13`` and a guide part 112`` to be explained later may be inserted and placed in the second area. Specifically, the floating electrode 13`` and the guide part 112`` may be arranged in a stacked manner in the second area.

This has the effect of allowing the floating electrode 13`` to be fixed in position within the first body 111``.

Referring to Figures 13 to 16, the guide part 112`` is inserted into the first body part 111``, and can be opened on both sides (upper and lower sides in Figure 14) along the length direction. A plurality of guide units 112`` may be provided and may be alternately arranged with a plurality of floating electrodes 13``.

Referring to FIG. 14, the guide part 112`` may be disposed on the upper side (based on FIG. 14) of the step part 111``b protruding from the inner surface of the first body part 111``.

Referring to FIGS. 14 to 16, a guide rib 112``a may be formed to protrude from the inner surface of the guide part 112``, and a plurality of guide ribs 112``a may be provided.

A plurality of guide ribs (112``a) may be connected to the first main body rib (111``a) formed in the first body portion (111``), and the first main body rib (111``a), the guide A flow path for air (G) may be provided along the ribs 112``a from the inner space of the processing vessel 10``, specifically the first main body 111``, to the external space.

Referring to Figures 13 to 15, the first body cap (113``) covers the first body part (111``) and is coupled to the first body part (111``), and the cover body (113``) ``a), and may include a cover sealing portion 113``b.

Referring to FIG. 13, the cover body 113``a is formed with a plurality of passage hole parts 113``h, and can communicate with the internal space of the first main body 111``. The cover sealing portion (113``b) is coupled to the cover body (113``a) and may be coupled along the outer peripheral surface of the cover body (113``a).

The cover sealing part 113``b may be formed of an elastically deformable material, and is disposed between the first body part 111`` and the cap part 115``, which will be described later, and the first body part ( In the internal space of 111``), air passes through the through hole part 113``h and the communication hole part 115``h and is discharged to the external space, so that the first body part 111`` and the cap part 115 ``) can improve the airtightness and sealing between

A groove (reference symbol not set) may be formed along the inner peripheral surface of the cover sealing portion (113``b), and the cover body (113``a) may be provided with a coupling protrusion (see drawing) so that it can be inserted into the groove along the outer peripheral surface. (sign not set) may be formed protrudingly.

As a result, the coupling force between the cover sealing portion (113``b) and the cover body (113``a) can be improved.

Referring to FIGS. 13 to 16, the second body portion 114″ is hollow on the inside, and the first body portion 111″ can be inserted and placed therein. The second body portion (114``) is combined with the cap part (115``), which will be explained later, and the first body part ( 111``), and the first body cap 113`` can be disposed.

Referring to FIGS. 13 to 15, a crossing groove 114``a may be formed at one end (upper part based on FIG. 13) of the second main body 114``, and has a preset depth, and the crossing groove 114``a may be formed. A cap protrusion (115``a) formed on the cap part (115``) may span over (114``a).

As an optional embodiment, the cap protrusion (115``a) may be coupled to the spanning groove part (114``a) in a fitting manner.

Referring to FIG. 16, a spaced portion 114``b may be formed to protrude in an outward direction on the inner surface of the second main body 114``, and a plurality of spaced parts 114``b may be provided. 2 It may be spaced apart along the inner circumference of the main body (114``).

The plurality of spaced portions 114``b are capable of contacting the outer peripheral surface of the first main body 111``, and are located in the inner space of the second main body 114``. The position can be guided, and a separation space is formed between the outer peripheral surface of the first body portion (111``) and the inner peripheral surface of the second main body portion (114``).

In the separation space formed between the outer circumferential surface of the first body portion 111 `` and the inner circumferential surface of the second main body 114 ``, air flows to the outside, unlike the inner space of the first main body 111 ``. There is no

As a result, a low pressure environment (LPA) is created by driving the pressure adjusting unit 30 only in the inner space of the first body 111 ``, where the object to be treated (OB) is accommodated, and the first body 111 `` ) has the effect of allowing plasma discharge processing to be concentrated only in the inner space of the device.

13 to 15, the cap portion 115`` according to the third embodiment of the present invention covers the second body part 114``, and is the first body in which the object to be treated OB is accommodated. The main body 111 `` can be coupled to the second main body 114 `` while being accommodated in the internal space of the second main body 114 ``.

13 to 15, on one side of the cap portion 115`` facing the second main body 114``, a cap protrusion 115``a is formed toward the second main body 114``. A protrusion may be formed.

Referring to FIG. 14, a plurality of cap protrusions 115``a may be provided and may be spaced apart along the circumference of the center of the cap part 115``a.

Referring to FIGS. 13 to 15, the second body portion 114`` has a preset depth so that the cap protrusion 115``a extends, and the spanning groove 114``a is formed in the shape of a groove. It can be.

As a result, it is possible to prevent the cap portion 115 `` from being uncoupled or separated from the second body 114 `` while it is coupled to the second main body 114 ``.

Referring to FIGS. 13 to 15, the processing container 10″ according to the third embodiment of the present invention may have a communication hole 115″h formed through the cap portion 115″.

There may be a plurality of communication hole parts 115``h, and the communication hole part 115``h is formed to form an internal space of the first body part 111`` where the object to be treated (OB) is accommodated, and This has the effect of allowing the flow of gas such as air between the external spaces of the processing container (10``).

Specifically, the communication hole portion 115″h formed in the cap portion 115″ may be disposed facing the processing portion 40, specifically the port portion 41, and may be disposed to accommodate the object to be treated (OB). A passage hole portion (113``h) formed in the first body cap (113``) in the internal space of the first body part (111``), and a communication hole part (115``h) formed in the cap part (115``). And a gas (G) such as air may flow to the pressure adjustment unit 30 through the port unit 41.

Referring to FIGS. 14 and 15, the inner surface of the cap portion 115″ according to the third embodiment of the present invention, specifically, the first body cap 113` on one side facing the first body cap 113″. `) The pressing portion 115``b may be formed to protrude in the lateral direction.

The pressing portion 115``b can contact and pressurize one surface (upper surface in FIG. 15) of the first body cap 113``, and extends along the circumferential direction on the inner surface of the cap part 115``. It can be.

As the pressurizing part 115``b contacts and pressurizes one surface of the first body cap 113``, the inner area surrounded by the pressurizing part 115``b is the outer side of the pressurizing part 115``b. It can be spatially separated from the area, and has the effect of improving the airtightness and sealing of the inner area.

Referring to Figures 13 to 16, the floating electrode 13`` is connected to the first body 111``, and may be electrically insulated from the outside of the first body 111``. The floating electrode 13`` may be formed of a metal material.

Unlike the electrode unit 45, the floating electrode 13`` may be connected to the first body unit 111`` without receiving power from the power source 47 or being grounded, and the floating electrode 13`` ) may be formed as a structure that supports the inner surface of the first body portion 111`` to prevent deformation of the first body part 111``.

Referring to FIGS. 13, 14, and 16, the floating electrode 13 `` maintains the first electrode 13 `` even if a pressure difference occurs inside and outside the first body 111 `` during the plasma treatment of the object OB. It may be formed in a structure that supports the inner surface of the first body portion 111`` to prevent shape deformation of the main body portion 111``.

Referring to FIGS. 13 and 16 , the floating electrode 13 `` may be disposed along the inner peripheral surface of the first body 111 `` and may be formed in a structure where the start point and the end point are connected.

As an optional embodiment, the floating electrode 13 `` may be formed in a closed curve shape along the inner peripheral surface of the first body 111 ``.

As a result, air is discharged from the internal space of the first body 111 ``, where the object to be treated (OB) is accommodated, to the external space, and when a low pressure environment (LPA) is created, the floating electrode 13 `` is set in advance. This has the effect of securing rigidity, maintaining the shape, and preventing the internal space of the first body portion 111`` from shrinking.

Referring to FIGS. 13, 14, and 16, the floating electrode 13″ is an electrode portion 45, specifically the first electrode 45a, the first electrode 45a, which forms an electric field inside the processing container 10″. It may be disposed between the two electrodes 45b, and may be located in the center of the first body portion 111″ based on the plasma processing direction (up and down direction based on FIG. 13).

As a result, the processing vessel (10``) between the floating electrode (13``) and the electrode unit (45), specifically, the internal space of the first body part (111``) in which the object to be treated (OB) is accommodated. A uniform and strong electric field can be formed.

In other words, there is an effect of concentrating the electric field formed by the electrode unit 45 that receives power from the power supply unit 47 into the internal space of the first body unit 111`` where the object to be treated (OB) is accommodated. there is.

In addition, since the floating electrode 13`` surrounds the object OB and is disposed on the outside, it has the effect of allowing an electric field to be uniformly formed in the outer area of the object OB.

That is, as the intensity, spatial distribution, or shape of the electric field formed throughout the internal space of the first body 111 `` is changed due to the floating electrode 13 ``, the electrode unit 45, specifically the opposing electrode unit 45, is formed. There is an effect of discharging a uniform plasma to the object OB located between the first electrode 45a and the second electrode 45b.

The floating electrode 13`` may be electrically insulated. As a result, the floating electrode 13`` may be blocked from receiving power from the power supply unit 47.

Although not shown in the drawings, the processing container 10`` according to the third embodiment of the present invention may further include a film portion. In relation to this, since the composition and effect are the same as those of the film portions 15, 15' of the processing containers 10, 10' according to the first and second embodiments, detailed description will be omitted to the extent of overlap.

Although not shown in the drawing, the flow restricting part covers the communication hole part (115``h) and is coupled to the container main part, specifically the cap part (115``), so that the fluid flows between the inner space of the container main part and the outer space. can be limited.

As an alternative embodiment, the flow restrictor may only allow the flow of gas. As a result, it is possible to block fluids other than the gas (G) such as air, foreign substances, etc. from flowing into the container body part where the object to be treated (OB) is accommodated, specifically the first main body part (111``).

As an optional embodiment, it may be coupled to the flow restriction portion, specifically the outer surface of the cap portion (115``). However, it is not limited to this, and various modifications are possible, such as being coupled to the inner surface of the cap part (115``) within the technical idea of covering the communication hole part (115``h) and restricting the flow of fluid.

As an optional embodiment, the flow restriction portion may be formed in a film manner and may be coupled to the container body portion.

As an optional embodiment, the flow restriction portion is formed on the first body cap (113``) disposed between the cap part (115``) and the first body (111``), specifically the cover body (113``a). It covers the through hole portion (113``h) and can be coupled to the outer or inner surface of the cover body (113``a).

Hereinafter, the configuration, operating principle, and effects of the plasma processing system 2 according to another embodiment of the present invention will be described.

Referring to FIGS. 17 to 19, the plasma processing system 2 according to another embodiment of the present invention includes a processing vessel 10 in which an object to be treated (OB) is accommodated and a floating electrode 13 is provided. It is used for storing and plasma processing the object to be treated (OB), and may include a housing unit 20, a pressure adjusting unit 30, and a processing unit 40.

Since the plasma processing system 2 according to another embodiment of the present invention has a difference in the configuration of the processing unit 40 compared to the plasma processing device 1 according to an embodiment of the present invention, the differences will be described in detail below. Let me explain.

17 to 19, the processing unit 40 according to another embodiment of the present invention forms an electric field to form a plasma discharge (PD) inside the processing container 10, and includes a port unit 41, It may include a processing housing 43, an electrode unit 45, and a power supply unit 47.

Referring to FIGS. 17 to 19, the port portion 41 is disposed between the pressure adjustment unit 30 and the processing vessel 10, and may be disposed outside the processing vessel 10. That is, the port portion 41 can be disposed in a non-contact manner with the processing container 10.

Referring to FIG. 17, the port portion 41 may be installed in the processing housing 43 forming a closed space, and may communicate with the internal space of the processing housing 43 and the external space.

As a result, as the pressure adjusting unit 30 is driven, gas (G) such as air accommodated in the internal space of the processing vessel 10 is discharged into the internal space of the processing housing 43 through the communication hole portion 11h, and the port As it flows into the pressure adjusting unit 30 through the unit 41, the internal space of the processing vessel 10 and the processing housing 43 may be formed into a low pressure environment (LPA).

Referring to FIGS. 17 to 19, the processing housing 43 according to an embodiment of the present invention is disposed inside the housing portion 20 and can accommodate the processing container 10. A port portion 41 and an electrode portion 45 may be installed in the processing housing 43.

Unlike the processing unit 40 according to one embodiment of the present invention, the processing unit 40 according to another embodiment of the present invention may have a processing container 10 disposed inside the processing housing 43, and a port portion 41. ) may have a structure that does not directly contact the processing housing 43.

As a result, without direct contact between the port portion 41 and the processing container 10, air is discharged from the inner space of the processing housing 43 and the processing container 10 through the port portion 41 by driving the pressure adjusting unit 30. The gas G can be discharged to the outside, and the internal space of the processing vessel 10 can be formed into a low pressure environment (LPA).

Referring to FIG. 18, air (G) may be discharged from the internal space of the processing housing 43 and the processing container 10 due to the operation of the pressure adjusting unit 30.

Referring to FIG. 19, the electrode unit 45 receives power from the power supply unit 47 to form an electric field, and generates a plasma discharge (PD) in the internal space of the processing housing 43 to generate a plasma discharge (PD) in the processing container 10. Plasma treatment is possible on the surface of the object to be treated (OB) accommodated in the internal space of .

In the plasma processing system 2 according to another embodiment of the present invention, the processing unit 40 includes a processing housing 43, except that the port unit 41 and the processing container 10 do not directly contact each other. Processing containers (10, 10`, 10``) according to the first to third embodiments of the present invention may be provided, and a housing portion ( 20), Since the configuration, operating principle, and effect of the pressure adjustment unit 30 are the same, detailed description will be omitted to the extent of overlap.

Hereinafter, a plasma processing method according to embodiments of the present invention will be described.

Figure 20 is a flowchart showing a plasma processing method according to embodiments of the present invention.

Referring to FIG. 20, the plasma processing method includes inserting a processing container containing an object to be treated into a housing unit (S10), attaching the processing container to the processing unit (S20), and adjusting the internal pressure of the processing container. (S30) and generating plasma in the internal space of the processing vessel (S40).

Referring to FIGS. 1 to 3, 4, 13, and 17, the plasma processing apparatus 1 according to embodiments of the present invention includes a processing vessel 10, 10', and 10 provided with a floating electrode 13. ``) and is used for plasma treatment of the object to be treated (0B) accommodated inside the processing container (10, 10`, 10``), including a housing portion (20) and a pressure adjusting portion (30). , may include a processing unit 40.

Referring to FIGS. 1 and 20, in the step (S10) of inserting the processing container into the housing portion 20, the processing container 10, 10 according to embodiments of the present invention in which the object to be treated (OB) is accommodated therein. `, 10``) can be placed in the housing portion 20 to fix the position.

The object to be treated (0B) is accommodated in the inner space of the processing container (10, 10`, 10``), specifically the first body portion (11), and the floating electrode (13) is connected to the first body portion (11). It is connected and may be disposed outside the object to be treated (0B) accommodated in the internal space of the first main body 11.

The floating electrode 13 may be connected to the outer peripheral surface of the processing containers 10, 10', such as the processing containers 10, 10' according to the first and second embodiments of the present invention, and the third embodiment. Like the processing container 10``, it may be disposed between the inner surface of the first main body 11 and the object to be treated 0B.

Referring to FIGS. 1, 17, and 20, the step (S20) of bringing the processing container into close contact with the processing unit 40 involves bringing the processing container (10, 10`, 10``) into contact with the processing unit 40, and The processing containers (10, 10, 10, 10`, 10``) can be brought into close contact.

The processing containers (10, 10`, 10``) disposed in the housing part 20 may be formed with communication hole parts (11h, 11`h, 115``h), and communication hole parts (11h, 11`h, 115``h) allows the flow of a fluid, specifically a gas (G) such as air, between the internal space and the external space of the processing vessel (10, 10`, 10``).

Referring to FIG. 1, the processing container 10 is in contact with the port portion 41, and the processing container 10 and the port main body 411 are connected due to the port portion 41, specifically the port sealing portion 413. It can be closely adhered.

Referring to FIGS. 2 and 20, in the step (S30) of adjusting the internal pressure of the processing vessel, the processing vessel 10 is brought into close contact with the port portion 41, and then the pressure adjusting unit 30 receives power from the outside. It can be driven.

The pressure adjusting unit 30 is directly or indirectly connected to the processing vessel 10 and can adjust the internal pressure of the processing vessel 10.

As the pressure adjusting unit 30 is driven, gas G flows from the internal space of the processing container 10, specifically the first main body 11, to the external space of the first main body 11 through the communication hole 11h. may be emitted. The discharged gas (G) may pass through the communication hole portion (11h) and flow to the pressure adjusting portion (30) through the port portion (41).

As a gas (G) such as air is discharged from the internal space of the processing container 10 to the external space, a low pressure environment (LPA) may be created in the internal space where the object to be treated (0B) is accommodated.

Referring to FIGS. 3 and 20, in the step (S40) of generating plasma in the internal space of the processing vessel, power is applied from the power source unit 47 to the electrode unit 45, and both sides of the processing vessel 10 (FIG. An electric field is formed between the electrode portions 45 (3 reference upper and lower sides), specifically the first electrode 45a and the second electrode 45b, and plasma discharge (PD) can be generated.

1 to 3, the floating electrode 13 between the first electrode 45a and the second electrode 45b does not receive power from the power supply unit 47, and the first electrode 45a and the second electrode 45b do not receive power from the power supply unit 47. Due to being spaced apart from the electrode 45b, the intensity or shape of the electric field formed between the floating electrode 13 and the first electrode 45a and between the floating electrode 13 and the second electrode 45b can be changed.

That is, the intensity of the electric field can be increased by allowing the electric field to be concentrated between the floating electrode 13 and the first electrode 45a and the second electrode 45b.

As a result, when plasma treating the surface of the object 0B located inside the floating electrode 13, the electric field is concentrated in the inner space of the first body 11 where the object 0B is accommodated. Plasma discharge (PD) is generated and has the effect of improving plasma processing efficiency.

Referring to FIGS. 17 to 19, the plasma processing device 2 according to another embodiment of the present invention has a different configuration from the plasma processing device 1 according to one embodiment of the present invention and the processing housing 43. Of course, the above-described plasma processing method can be applied.

Above, the present invention has been described in detail with preferred embodiments, but the present invention is not limited to the above embodiments, and various modifications and changes can be made by those skilled in the art within the technical spirit and scope of the present invention. This is possible.

According to one embodiment of the present invention, a plasma processing vessel, a processing device, and a method are provided. Additionally, embodiments of the present invention can be applied to techniques for accommodating an object to be treated, sterilizing the object to be treated using plasma, or treating the surface of the object to be treated, etc.

Related national research and development projects

- Assignment identification number: 1415183008

- Assignment number: P0018200

- Ministry name: Ministry of Trade, Industry and Energy

- Project management (professional) organization name: Korea Institute for Advancement of Technology

- Research project name: Scale-up technology commercialization program (R&D)

- Research project title: Plasma sterilization and surface regeneration activation technology for medical implants

- Contribution rate: 1/1

- Name of project carrying out organization: Plasmap Co., Ltd.

- Research period: 2023.01.01 - 2023.12.31

- Assignment identification number: 1425171650

- Assignment number: S3301671

- Ministry name: Ministry of SMEs and Startups

- Project management (professional) organization name: Small and Medium Business Technology Information Promotion Agency

- Research project name: Purchase conditional new product development project (purchase linked type)

- Research project name: Development of a device that activates the regeneration of human skin tissue using plasma

- Contribution rate: 1/1

- Name of project carrying out organization: Plasmap Co., Ltd.

- Research period: 2023.01.01 - 2023.12.31

- Assignment identification number: 1425179511

- Assignment number: 00275019

- Ministry name: Ministry of SMEs and Startups

- Project management (professional) organization name: Small and Medium Business Technology Information Promotion Agency

- Research project name: Small and medium-sized enterprise technology innovation development project (export-oriented)

- Research project name: Medical 3D printing manufacturing process using plasma, development of medical devices

- Contribution rate: 1/1

- Name of project carrying out organization: Plasmap Co., Ltd.

- Research period: 2023.07.17 - 2023.12.31

Claims (19)

In a plasma treatment vessel used for plasma treatment of the object to be treated contained therein, a first body portion capable of accommodating the object to be treated; and It includes a floating electrode connected to the first body part, The floating electrode is electrically insulated from the outside of the first main body. According to paragraph 1, A plasma processing vessel further comprising a film portion covering the floating electrode. According to paragraph 2, A plasma processing vessel, characterized in that the thickness of the film portion is the same as or relatively thinner than the thickness of the first body portion. According to paragraph 1, The floating electrode is a plasma processing vessel characterized in that it is formed in a structure that supports the inner surface of the first main body to prevent deformation of the first main body. According to paragraph 4, The floating electrode is formed in a structure that supports the inner surface of the first body to prevent shape deformation of the first body even if a pressure difference occurs inside and outside the first body during the plasma treatment of the object to be treated. A plasma processing vessel characterized in that. According to paragraph 1, The floating electrode is disposed along the inner peripheral surface of the first main body and has a structure in which a start point and an end point are connected. According to clause 6, The floating electrode is a plasma processing vessel characterized in that it is formed in a closed curve shape along the inner peripheral surface of the first main body. According to paragraph 1, The floating electrode is a plasma processing vessel, characterized in that located in the center of the first main body based on the plasma processing direction. According to clause 8, A plasma processing vessel characterized in that the plurality of floating electrodes are provided, and the plurality of floating electrodes are spaced apart from each other at a preset interval. According to paragraph 1, A plasma processing vessel, characterized in that the floating electrode is formed of a conductive material. According to paragraph 1, a second body portion that is hollow on the inside and into which the first body portion can be inserted and placed; and A cap portion that covers the second body portion and has a communication hole communicating with the internal space of the first body portion. According to clause 11, A plasma processing container further comprising a flow limiting portion that covers the communication hole formed in the cap portion and restricts the flow of fluid between the inner space and the outer space of the first body portion. According to clause 12, A plasma processing vessel, characterized in that the flow restrictor allows only the flow of gas. According to clause 12, A plasma processing vessel, characterized in that the flow limiting part is disposed between the cap part and the first body part. According to clause 12, A plasma processing vessel, characterized in that the flow restriction portion is formed in a film manner and is coupled to the first body portion. A plasma treatment vessel in which the object to be treated is accommodated; a housing portion in which the plasma processing vessel can be placed; a pressure adjusting unit installed in the housing, connected to the plasma processing vessel to enable fluid flow, and adjusting the pressure of the internal space of the plasma processing vessel; and It includes a processing unit that receives power from the outside and forms an electric field to generate a plasma discharge in the internal space of the plasma processing vessel, The plasma processing vessel, a first body portion capable of accommodating the object to be treated; and It includes a floating electrode connected to the first body part, The floating electrode is electrically insulated from the outside of the first main body. According to clause 16, The processing unit, a port portion disposed between the pressure adjustment unit and the processing container and capable of contacting the processing container; and A plasma processing system comprising: an electrode portion disposed outside the processing vessel and receiving power to form an electric field. According to clause 17, A plasma processing device, wherein a plurality of electrode units are provided, each disposed on both sides of the plasma processing vessel. In a plasma treatment method for treating the surface of an object to be treated, Inserting a processing container containing the object to be treated into a housing portion; attaching the processing container to a processing unit installed in the housing unit; adjusting the pressure of the internal space of the processing vessel; Characterized by comprising: receiving power from the outside and generating plasma in the internal space of the processing vessel, The processing container includes a first body portion capable of receiving the object to be treated; It includes a floating electrode connected to the first body part, A plasma processing method, wherein the floating electrode is electrically insulated from the outside of the first main body.

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