WO2023159785A1 - Conductive apparatus for coating and coating machine - Google Patents
Conductive apparatus for coating and coating machine Download PDFInfo
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- WO2023159785A1 WO2023159785A1 PCT/CN2022/094873 CN2022094873W WO2023159785A1 WO 2023159785 A1 WO2023159785 A1 WO 2023159785A1 CN 2022094873 W CN2022094873 W CN 2022094873W WO 2023159785 A1 WO2023159785 A1 WO 2023159785A1
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- Prior art keywords
- conductive
- coating
- conductive roller
- coated product
- plating solution
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/38—Electroplating: Baths therefor from solutions of copper
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/02—Cleaning by the force of jets or sprays
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/54—Electroplating of non-metallic surfaces
- C25D5/56—Electroplating of non-metallic surfaces of plastics
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E60/00—Enabling technologies; Technologies with a potential or indirect contribution to GHG emissions mitigation
- Y02E60/10—Energy storage using batteries
Definitions
- the invention relates to the technical field of electroplating thin films, in particular to a conductive device and a coating machine for coating.
- Electroplating is an important process in the production of composite current collector copper film.
- the rectifier is connected with the conductive roller and the titanium basket.
- the current flows from the positive pole of the rectifier through the titanium basket, and flows through the plating solution, the conductive mechanism and the negative pole of the rectifier, so that the entire electroplating system forms a complete circuit, so as to form a thin film on the coated product.
- the conductive roller is usually a tubular structure with the same diameter.
- the conductive roller will also directly or indirectly contact the plating solution (copper solution), forming a back-plated copper or copper on the conductive roller.
- the plating solution copper solution
- the copper slag or copper thorns formed on the conductive roller will scratch the copper film deposited on the surface of the coated product, seriously affecting the electroplating quality of the copper film on the surface of the coated product.
- the copper crystal layer on the conductive roller accumulates too thick, it will also affect the chromaticity and uniformity of the copper film on the surface of the coated product.
- a conductive device for coating and a coating machine are provided.
- a conductive device for coating, used for electroplating thin films on the surface of coated products comprising:
- a frame the frame is provided with a plating tank for containing the plating solution
- the conductive mechanisms include conductive rollers, titanium baskets and rectifiers, and the rectifiers
- the positive pole is electrically connected to the titanium basket
- the negative pole of the rectifier is electrically connected to the conductive roller
- the titanium basket is at least partially immersed in the plating solution, and one side of the conductive roller along its radial direction is immersed in the In the plating solution, the other side is exposed outside the plating solution, and the cross-section of the conductive roller in its axial direction is I-shaped;
- one side of the film-coated product is in contact with one of the two conductive rollers, and the other side is in contact with the other conductive roller.
- the above conductive device for coating has a plating tank on the frame, which can be used to accommodate the plating solution, and the two conductive mechanisms are fixed on the frame to realize the fixed connection between the two conductive mechanisms and the frame.
- the positive electrode of the rectifier is electrically connected to the titanium basket
- the negative electrode of the rectifier is electrically connected to the conductive roller
- the titanium basket is at least partially immersed in the plating solution
- one side of the conductive roller along its radial direction is immersed in the plating solution
- the rectifier, titanium basket, conductive roller and plating solution form a complete current loop.
- the coated product passes through the conductive mechanism, one side of the coated product contacts one of the two conductive rollers, and The other side of the coated product is in contact with the other of the two conductive rollers to electroplate thin films on both surfaces of the coated product to achieve double-sided coating of the coated product and improve the electroplating efficiency on the surface of the coated product.
- the cross-section of the conductive roller in its axial direction is I-shaped.
- the middle part of the conductive roller is neither in contact with the plating solution nor with the middle part of the coated product, so as to prevent the middle part of the conductive roller from directly or indirectly contacting
- Contact with the plating solution reduces the phenomenon of copper replating or copper deposition on the conductive roller, reduces the risk of the conductive roller scratching the deposited film on the surface of the coated product, and significantly improves the coating quality of the coated product.
- the diameters of both ends of the conductive roller are 5cm-20cm, and the middle position of the conductive roller is recessed by 1cm-3cm compared to the end positions.
- the conductive roller is a hollow tubular structure.
- the conductive roller is made of one of 304 stainless steel and 316 stainless steel.
- the conductive mechanism further includes an auxiliary anode, and the positive pole of the rectifier is electrically connected to the auxiliary anode.
- the auxiliary anode is made of titanium metal, and its surface is uniformly coated with an iridium metal layer.
- a coating machine comprising an unwinding mechanism, a winding mechanism, and a conductive device for coating according to any one of the above technical solutions, the unwinding mechanism and the winding mechanism are fixed on the frame, and The intervals are arranged on the conveying path of the coated products.
- the cross-section of the conductive roller in its axial direction is I-shaped.
- the middle part of the conductive roller is neither in contact with the plating solution nor with the middle part of the coated product, preventing the conductive roller from being directly or Indirect contact with the plating solution, copper replating or copper deposition occurs on the conductive roller, which prevents the conductive roller from scratching the deposited film on the surface of the coated product, and significantly improves the coating quality of the coated product.
- a plurality of tensioning elements are further included, and the plurality of tensioning elements are all fixed on the frame and evenly distributed between the unwinding mechanism and the winding mechanism.
- it also includes two spray elements, both of which are fixed on the frame, and the spray elements have spray ports, and one of the two spray ports One faces one of the two conductive rollers, and the other faces the other of the two conductive rollers.
- a heating element is further included, and the heating element is fixed on the frame.
- Fig. 1 is the top view of the conductive device for coating provided by the present invention
- Fig. 2 is the front view of the coating machine provided by the present invention.
- first and second are used for descriptive purposes only, and cannot be understood as indicating or implying relative importance or implicitly specifying the quantity of indicated technical features.
- the features defined as “first” and “second” may explicitly or implicitly include at least one of these features.
- “plurality” means at least two, such as two, three, etc., unless otherwise specifically defined.
- the first feature may be in direct contact with the first feature or the first and second feature may be in direct contact with the second feature through an intermediary. touch.
- “above”, “above” and “above” the first feature on the second feature may mean that the first feature is directly above or obliquely above the second feature, or simply means that the first feature is higher in level than the second feature.
- “Below”, “beneath” and “beneath” the first feature may mean that the first feature is directly below or obliquely below the second feature, or simply means that the first feature is less horizontally than the second feature.
- the present invention provides a conductive device 100 for coating.
- the conductive device 100 for coating includes a frame 110 and two conductive mechanisms 120.
- the conductive device 100 for coating is used for electroplating a film on the surface of a coated product 200 .
- the frame 110 is provided with a plating tank (not shown in the figure), which can accommodate a plating solution, which can be used for forming a thin film on the coated product 200 and for conducting current.
- the frame 110 can be integrally formed with a plating tank through casting, molding, etc., to simplify the molding process of the frame 110 and save the manufacturing cost of the frame 110;
- the tool is created separately.
- the plating solution can be copper liquid, iron liquid, etc., which can form a thin film on the surface of the coating product 200. In this embodiment, only copper liquid is used as a representative.
- the two conductive mechanisms 120 are fixed on the frame 110 by screwing, welding, etc., so as to realize the fixed connection between the two conductive mechanisms 120 and the frame 110 . Moreover, the two conductive mechanisms 120 are arranged opposite to each other along the depth direction of the plating tank, that is, there is a gap between the two conductive mechanisms 120 . In this embodiment, the two conductive mechanisms 120 are arranged vertically at intervals.
- the conductive mechanism 120 includes a conductive roller 121, a titanium basket 122 and a rectifier 123, the conductive roller 121 and the titanium basket 122 are fixed on the frame 110, the positive pole of the rectifier 123 is electrically connected to the titanium basket 122, and the negative pole of the rectifier 123 is electrically connected to the conductive roller 121.
- the titanium basket 122 is at least partly immersed in the plating solution, and in the radial direction of the conductive roller 121, one side of the conductive roller 121 is immersed in the plating solution, and the other side of the conductive roller 121 is exposed outside the plating solution.
- the plating solution has conductivity, and the rectifier 123 , the titanium basket 122 , the conductive roller 121 and the plating solution form a complete current loop to provide the current for the coated product 200 .
- the cross-section of the conductive roller 121 in its axial direction is I-shaped, and the coated product 200 is in the electroplating process, and the middle part of the conductive roller 121 is neither in contact with the plating solution nor in contact with the middle part of the coated product 200, preventing the conductive roller 121 from The middle part is directly or indirectly in contact with the plating solution, which weakens the phenomenon of copper replating or copper deposition on the conductive roller 121, reduces the risk of the conductive roller 121 scratching the deposited film on the surface of the coated product 200, and significantly improves the coating quality of the coated product 200.
- the conductive roller 121 In order to make the cross section of the conductive roller 121 in its axial direction be I-shaped, a preferred embodiment, as shown in Fig. The central position is recessed by 1cm-3cm. In other words, the conductive roller 121 has a cylindrical structure with large ends and a small middle. Coated product 200 is in the electroplating process, and the middle part of conductive roller 121 is neither in contact with plating solution, nor contacts with the middle part of coated product 200, prevents the middle part of conductive roller 121 from being directly or indirectly contacted with plating solution, and weakens the appearance on conductive roller 121.
- the phenomenon of copper replating or copper deposition reduces the risk of the conductive roller 121 scratching the deposited film on the surface of the coated product 200 , and significantly improves the coating quality of the coated product 200 .
- the diameter at both ends of the conductive roller 121 can be one of 5cm, 10cm, 15cm, and 20cm.
- the diameter at the two ends of the conductive roller 121 is not limited to the above-mentioned range value, and can also be in the range of 5cm-20cm other values within.
- the diameters at both ends of the conductive roller 121 are not limited to the above diameter setting range, and the two ends of the conductive roller 121 can be specifically set according to the installation process or molding process of the conductive roller 121. diameter.
- the conductive roller 121 is a hollow tubular structure, the material required for the conductive roller 121 in the molding process is reduced, and the cost of the conductive roller 121 can be saved. manufacturing cost. Moreover, the requirements for the load-bearing strength of the frame 110 are relatively low, so that the lightweight design of the conductive device 100 for coating can be realized.
- the material of the conductive roller 121 is one of 304 stainless steel and 316 stainless steel. Because both 304 stainless steel and 316 stainless steel have excellent formability, it is convenient for the manufacture and molding of the conductive roller 121, and stainless steel also has excellent corrosion resistance, toughness, etc., which can significantly improve the service life of the conductive roller 121 and prevent the conductive roller 121. Defects such as deformation may occur during long-term use.
- the conductive roller 121 can also be made of other materials with excellent formability and conductivity, such as: 316L stainless steel.
- the present invention does not limit the specific material of the conductive roller 121. Specific selection of process requirements or budget costs.
- the conductive mechanism 120 further includes an auxiliary anode 124 , and the positive pole of the rectifier 123 is electrically connected to the auxiliary anode 124 .
- the conductive capacity of the middle position of the conductive roller 121 is relatively weak, and the rectifier 123, the auxiliary anode 124, the conductive roller 121 and the plating solution form a complete current loop, and the rectifier 123, the titanium basket 122, the conductive roller 121 and the current loop formed by the plating solution jointly enhance the conductivity of the conductive roller 121, make up for the small shortcoming of the current density in the middle of the conductive roller 121, and greatly improve the uniformity of the film formed on the surface of the coated product 200 property, to improve the coating quality of the coating product 200.
- the auxiliary anode 124 is made of titanium metal. Since titanium metal is insoluble in strong acid, it is not easy to deform and corrode when it contacts with the plating solution, which helps to prolong the service life of the auxiliary electrode. However, the conductivity of titanium metal is weak, so its surface is uniformly coated with an iridium metal layer, which can enhance the conductivity of the auxiliary anode 124, make up for the small shortcoming of the current density in the middle of the conductive roller 121, and greatly improve the coating product 200. The uniformity of the thin film formed on the surface can improve the coating quality of the coating product 200 .
- the present invention also provides a coating machine 300, the coating machine 300 includes an unwinding mechanism 310, a winding mechanism 320 and a conductive device 100 for coating according to any one of the above technical solutions,
- the unwinding mechanism 310 is fixed on the frame 110 by screwing, welding, etc.
- the winding mechanism 320 is also fixed on the frame 110 by screwing, welding, etc., to realize the installation of the unwinding mechanism 310 and the winding mechanism 320 fixed.
- the unwinding mechanism 310 and the winding mechanism 320 are arranged at intervals on the conveying path of the coated product 200.
- the unwinding mechanism 310 is used to automatically transport the coated product 200 before electroplating, and the winding mechanism 320 is used to automatically collect the coated product 200 after electroplating.
- conductive roller 121 is I-shaped in the cross-section of its axial direction, and coating product 200 is in electroplating process, and the middle part of conductive roller 121 neither contacts with plating solution, also does not contact with the middle part of coated product 200, Prevent the conductive roller 121 from being in direct or indirect contact with the plating solution, resulting in copper replating or copper deposition on the conductive roller 121, preventing the conductive roller 121 from scratching the film deposited on the surface of the coated product 200, and significantly improving the coating quality of the coated product 200.
- the coating machine 300 also includes a plurality of tension elements 330, and the plurality of tension elements 330 are all screwed, riveted, etc.
- the method is fixed on the frame 110 , and a plurality of tensioning elements 330 are evenly distributed between the unwinding mechanism 310 and the winding mechanism 320 , in other words, the plurality of tensioning elements 330 are evenly distributed on the conveying path of the coated product 200 .
- the tensioning element 330 can tension the coated product 200 to ensure the surface flatness of the coated product 200, further improve the uniformity of the film formed on the surface of the coated product 200, and improve the coating product. 200 surface coating quality.
- the tensioning element 330 is a tensioning wheel or a tensioning spring to ensure that when the coated product 200 passes through the tensioning element 330, the tensioning element 330 can tension the coated product 200 to ensure the surface smoothness of the coated product 200.
- the tensioning element 330 is not limited to the tensioning wheel or the tensioning spring provided above, and may also be other elements capable of tensioning the coated product 200 , and the specific type of the tensioning element 330 is not limited in the present invention.
- the coating machine 300 also includes two spray elements (not shown), the two Each spray element is fixed on the frame 110 by means of screwing, riveting and the like.
- the shower element has a spray port, one of the two spray ports faces one of the two conductive rollers 121 , and the other of the two spray ports faces the other of the two conductive rollers 121 .
- the cleaning medium ejected by the shower element cleans the conductive roller 121 to clean the plating solution remaining on the conductive roller 121, preventing the plating solution remaining on the conductive roller 121 from being exposed to the air for a long time. Copper replating or copper deposition occurs on 121.
- the shower element is a shower head to clean the plating solution remaining on the conductive roller 121 .
- the shower element is not limited to the above-mentioned shower head, and can also be other elements capable of cleaning the plating solution remaining on the conductive roller 121 , and the present invention does not limit the specific type of the shower element.
- the coating machine 300 also includes a heating element (not shown), the heating element is connected by screwing, Fixed on the frame 110 by welding or other means, the heating element can accelerate the forming rate of the film on the surface of the coated product 200 and improve the electroplating efficiency of the coating machine 300 on the coated product 200 .
- the heating element is an oven, and the heating element can accelerate the forming rate of the film on the surface of the coated product 200 .
- the heating element is not limited to the oven provided above, and can also be other elements capable of accelerating the forming rate of the film on the surface of the coated product 200, and the specific type of the heating element is not limited in the present invention.
- the square resistance uniformity and the surface hole morphology of the film are used to represent the coating quality of the coating product surface.
- the electroplated film is selected on the surface of the polypropylene film, the thickness of the polypropylene film is 6 ⁇ m, the conductive roller 121 is the existing conductive roller 121 , and the auxiliary anode 124 is not provided.
- Plating solution composition 130g/L copper sulfate, 140g/L sulfuric acid, 60mg/L hydrochloric acid, 8ml/L brightener.
- Antioxidant solution DP-A agent 5ml/L, DP-B agent 10ml/L, process temperature 20-30°C, pH 1.8-3.5.
- the conveying line speed of polypropylene film 2m/min.
- the total current of one side of the polypropylene film (replaced by A side below) is 1152A; the total current of the other side of the polypropylene film (replaced by B side below) is 1164A.
- Table 1 1200m polypropylene film surface A and B square resistance at different positions
- conduction roller 121 is the conduction roller 121 that the present invention uses (the cross section of conduction roller 121 along its axial direction is I-shaped), no auxiliary Anode 124.
- Plating solution composition 130g/L copper sulfate, 140g/L sulfuric acid, 60mg/L hydrochloric acid, 8ml/L brightener.
- Antioxidant solution DP-A agent 5ml/L, DP-B agent 10ml/L, process temperature 20-30°C, pH 1.8-3.5.
- the conveying line speed of polypropylene film 2m/min.
- the total current of the side A of the polypropylene film 1152A; the total current of the side B of the polypropylene film: 1164A.
- the polypropylene film within the range of 1200m is measured using a four-probe tester
- the square resistance uniformity of the polypropylene film A side was 12.2%
- the square resistance uniformity of the polypropylene film B side was 14.3%.
- a CCD camera was used to take pictures of the film formation on the surface of the polypropylene film within 1200 square meters after unfolding. The total number of holes was 492, and the diameter of the holes in each interval was relatively small.
- conduction roller 121 is the conduction roller 121 that the present invention uses (conduction roller 121 is I-shaped along the cross section of its axial direction), and is provided with Auxiliary anode 124.
- Plating solution composition 130g/L copper sulfate, 140g/L sulfuric acid, 60mg/L hydrochloric acid, 8ml/L brightener.
- Antioxidant solution DP-A agent 5ml/L, DP-B agent 10ml/L, process temperature 20-30°C, pH 1.8-3.5.
- the conveying line speed of polypropylene film 2m/min.
- the total current of the side A of the polypropylene film 1152A; the total current of the side B of the polypropylene film: 1164A.
- the total current of the auxiliary anode 124A surface 52A; the total current of the auxiliary anode 124B surface: 64A.
- the number of holes formed on the surface of the polypropylene film is significantly reduced, and the diameter of the holes in each interval Both are small, indicating that in the electroplating process of the coated product 200, the phenomenon of copper replating or copper deposition on the conductive roller 121 has been weakened, and the risk of the conductive film scratching the deposited film on the surface of the coated product 200 is reduced.
- the quality is significantly improved.
- the uniformity of the film formed on the surface of the coated product 200 is greatly improved due to the increase of the current density in the middle of the conductive roller 121 , and the coating quality of the coated product 200 is further improved.
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Abstract
Description
本发明涉及电镀薄膜技术领域,特别是涉及一种镀膜用导电装置及镀膜机。The invention relates to the technical field of electroplating thin films, in particular to a conductive device and a coating machine for coating.
电镀是复合集流体铜膜生产的一道重要工序,整流器与导电辊、钛篮相连接,电流从整流器正极经过钛篮,流经镀液、导电机构和整流器负极,使整个电镀系统形成一个完成的回路,从而实现在镀膜产品上形成薄膜。Electroplating is an important process in the production of composite current collector copper film. The rectifier is connected with the conductive roller and the titanium basket. The current flows from the positive pole of the rectifier through the titanium basket, and flows through the plating solution, the conductive mechanism and the negative pole of the rectifier, so that the entire electroplating system forms a complete circuit, so as to form a thin film on the coated product.
目前,导电辊通常为直径相同的管状结构,在镀膜过程中,导电辊与镀膜产品接触的同时,也会直接或间接与镀液(铜液)接触,在导电辊上形成返镀铜或铜沉积的现象,在长时间镀铜过程中,导电辊上的镀铜积累到一定程度后,会在其表面形成不规则形状的铜质结晶层,这层铜质结晶层在导电辊上分布极不均匀,导致导电辊局部位置形成铜渣或铜刺。镀膜产品在接触导电辊时,导电辊上形成的铜渣或铜刺会划伤镀膜产品表面沉积的铜膜,严重影响镀膜产品表面铜膜的电镀质量。并且,当导电辊上的铜质结晶层积累过厚时,还会影响镀膜产品表面铜膜的色度以及均匀性。At present, the conductive roller is usually a tubular structure with the same diameter. During the coating process, while the conductive roller is in contact with the coated product, it will also directly or indirectly contact the plating solution (copper solution), forming a back-plated copper or copper on the conductive roller. The phenomenon of deposition, in the long-term copper plating process, after the copper plating on the conductive roller accumulates to a certain extent, an irregular copper crystal layer will be formed on the surface, and this layer of copper crystal layer is extremely distributed on the conductive roller. Unevenness, resulting in the formation of copper slag or copper thorns in the local position of the conductive roller. When the coated product contacts the conductive roller, the copper slag or copper thorns formed on the conductive roller will scratch the copper film deposited on the surface of the coated product, seriously affecting the electroplating quality of the copper film on the surface of the coated product. Moreover, when the copper crystal layer on the conductive roller accumulates too thick, it will also affect the chromaticity and uniformity of the copper film on the surface of the coated product.
发明内容Contents of the invention
基于此,有必要针对现有导电装置在镀膜过程中,导电辊会直接或间接与镀液接触,在其表面出现返镀铜或铜沉积的现象,严重影响镀膜产品表面铜膜的镀膜质量的问题,提供一种镀膜用导电装置及镀膜机。Based on this, it is necessary to address the problem that during the coating process of the existing conductive device, the conductive roller will directly or indirectly contact the plating solution, and copper replating or copper deposition will occur on the surface, which will seriously affect the coating quality of the copper film on the surface of the coated product. To solve the problem, a conductive device for coating and a coating machine are provided.
一种镀膜用导电装置,用于在镀膜产品表面电镀薄膜,包括:A conductive device for coating, used for electroplating thin films on the surface of coated products, comprising:
机架,所述机架开设有容纳镀液的镀槽;A frame, the frame is provided with a plating tank for containing the plating solution;
两个导电机构,两个所述导电机构均固定于所述机架上,且沿所述镀槽的深度方向间隔相对设置,所述导电机构包括导电辊、钛篮以及整流器,所述整流器的正极与所述钛篮电连接,所述整流器的负极与所述导电辊电连接,所述钛篮至少部分浸没于所述镀液内,所述导电辊沿其径向方向的一侧浸没于所述镀液内,其另一侧裸露于所述镀液外,所述导电辊在其轴向方向的横截面呈工字形;Two conductive mechanisms, both of which are fixed on the frame, are arranged opposite to each other along the depth direction of the plating tank. The conductive mechanisms include conductive rollers, titanium baskets and rectifiers, and the rectifiers The positive pole is electrically connected to the titanium basket, the negative pole of the rectifier is electrically connected to the conductive roller, the titanium basket is at least partially immersed in the plating solution, and one side of the conductive roller along its radial direction is immersed in the In the plating solution, the other side is exposed outside the plating solution, and the cross-section of the conductive roller in its axial direction is I-shaped;
当所述镀膜产品在通过所述导电机构时,所述镀膜产品的其中一面与两根所述导电辊中的其中一根接触,其另一面与另外一根所述导电辊接触。When the film-coated product passes through the conductive mechanism, one side of the film-coated product is in contact with one of the two conductive rollers, and the other side is in contact with the other conductive roller.
上述镀膜用导电装置,机架开设有镀槽,镀槽可用于容纳镀液,两个导电机构均固定于机架上,实现两个导电机构与机架的固定连接。整流器的正极与钛篮电连接,整流器的负极与导电辊电连接,钛篮至少部分浸没于镀液内,导电辊沿其径向方向的一侧浸没于镀液内,导电辊的另一侧裸露于镀液外,整流器、钛篮、导电辊以及镀液形成一完整的电流回路,当镀膜产品在通过导电机构时,镀膜产品的其中一面与两根导电辊中的其中一根接触,并且镀膜产品的另一面与两根导电辊中的另外一根接触,以在镀膜产品两个表面电镀薄膜,实现镀膜产品的双面镀膜,提高在镀膜产品表面的电镀效率。并且导电辊在其轴向方向的横截面呈工字形,镀膜产品在电镀过程中,导电辊的中部既不与镀液接触,也不与镀膜产品的中部接触,防止导电辊中部直接或间接与镀液接触,减弱在导电辊上出现返镀铜或铜沉积现象,降低导电辊划伤镀膜产品表面沉积薄膜的风险,显著提高镀膜产品的镀膜质量。The above conductive device for coating has a plating tank on the frame, which can be used to accommodate the plating solution, and the two conductive mechanisms are fixed on the frame to realize the fixed connection between the two conductive mechanisms and the frame. The positive electrode of the rectifier is electrically connected to the titanium basket, the negative electrode of the rectifier is electrically connected to the conductive roller, the titanium basket is at least partially immersed in the plating solution, one side of the conductive roller along its radial direction is immersed in the plating solution, and the other side of the conductive roller Barely exposed to the plating solution, the rectifier, titanium basket, conductive roller and plating solution form a complete current loop. When the coated product passes through the conductive mechanism, one side of the coated product contacts one of the two conductive rollers, and The other side of the coated product is in contact with the other of the two conductive rollers to electroplate thin films on both surfaces of the coated product to achieve double-sided coating of the coated product and improve the electroplating efficiency on the surface of the coated product. And the cross-section of the conductive roller in its axial direction is I-shaped. During the electroplating process of the coated product, the middle part of the conductive roller is neither in contact with the plating solution nor with the middle part of the coated product, so as to prevent the middle part of the conductive roller from directly or indirectly contacting Contact with the plating solution reduces the phenomenon of copper replating or copper deposition on the conductive roller, reduces the risk of the conductive roller scratching the deposited film on the surface of the coated product, and significantly improves the coating quality of the coated product.
在其中一个实施例中,所述导电辊两端的直径为5cm-20cm,所述导电辊中间位置相较于其端部位置下凹1cm-3cm。In one embodiment, the diameters of both ends of the conductive roller are 5cm-20cm, and the middle position of the conductive roller is recessed by 1cm-3cm compared to the end positions.
在其中一个实施例中,所述导电辊为内部中空的管状结构。In one embodiment, the conductive roller is a hollow tubular structure.
在其中一个实施例中,所述导电辊的材质为304不锈钢、316不锈钢中的其中一种。In one embodiment, the conductive roller is made of one of 304 stainless steel and 316 stainless steel.
在其中一个实施例中,所述导电机构还包括辅助阳极,所述整流器的正极与所述辅助阳极电连接。In one of the embodiments, the conductive mechanism further includes an auxiliary anode, and the positive pole of the rectifier is electrically connected to the auxiliary anode.
在其中一个实施例中,所述辅助阳极的材质为钛金属,且在其表面均匀涂覆有铱金属层。In one embodiment, the auxiliary anode is made of titanium metal, and its surface is uniformly coated with an iridium metal layer.
一种镀膜机,包括放卷机构、收卷机构以及如上述技术方案任一项所述的镀膜用导电装置,所述放卷机构与所述收卷机构均固定于所述机架上,且间隔设置于所述镀膜产品的输送路径上。A coating machine, comprising an unwinding mechanism, a winding mechanism, and a conductive device for coating according to any one of the above technical solutions, the unwinding mechanism and the winding mechanism are fixed on the frame, and The intervals are arranged on the conveying path of the coated products.
上述镀膜机,导电辊在其轴向方向的横截面呈工字形,镀膜产品在电镀过程中,导电辊的中部既不与镀液接触,也不与镀膜产品的中部接触,防止导电辊直接或间接与镀液接触,在导电辊上出现返镀铜或铜沉积现象,避免导电辊划伤镀膜产品表面沉积的薄膜,显著提高镀膜产品的镀膜质量。In the above-mentioned coating machine, the cross-section of the conductive roller in its axial direction is I-shaped. During the electroplating process of the coated product, the middle part of the conductive roller is neither in contact with the plating solution nor with the middle part of the coated product, preventing the conductive roller from being directly or Indirect contact with the plating solution, copper replating or copper deposition occurs on the conductive roller, which prevents the conductive roller from scratching the deposited film on the surface of the coated product, and significantly improves the coating quality of the coated product.
在其中一个实施例中,还包括多个张紧元件,多个所述张紧元件均固定于所述机架上,且均匀分布于所述放卷机构与所述收卷机构之间。In one embodiment, a plurality of tensioning elements are further included, and the plurality of tensioning elements are all fixed on the frame and evenly distributed between the unwinding mechanism and the winding mechanism.
在其中一个实施例中,还包括两个喷淋元件,两个所述喷淋元件均固定于所述机架上,所述喷淋元件具有喷淋口,两个所述喷淋口中的其中一个朝向两根所述导电辊中的其中一根,其另一个朝向两根所述导电辊中的另外一根。In one of the embodiments, it also includes two spray elements, both of which are fixed on the frame, and the spray elements have spray ports, and one of the two spray ports One faces one of the two conductive rollers, and the other faces the other of the two conductive rollers.
在其中一个实施例中,还包括加热元件,所述加热元件固定于所述机架上。In one of the embodiments, a heating element is further included, and the heating element is fixed on the frame.
图1为本发明提供的镀膜用导电装置的俯视图;Fig. 1 is the top view of the conductive device for coating provided by the present invention;
图2位本发明提供的镀膜机的主视图。Fig. 2 is the front view of the coating machine provided by the present invention.
附图标记:Reference signs:
100、镀膜用导电装置;100. Conductive device for coating;
110、机架;110. Rack;
120、导电机构;121、导电辊;122、钛篮;123、整流器;124、辅助阳极;120, conductive mechanism; 121, conductive roller; 122, titanium basket; 123, rectifier; 124, auxiliary anode;
200、镀膜产品;200. Coated products;
300、镀膜机;300. Coating machine;
310、放卷机构;320、收卷机构;330、张紧元件。310, unwinding mechanism; 320, winding mechanism; 330, tensioning element.
为使本发明的上述目的、特征和优点能够更加明显易懂,下面结合附图对本发明的具体实施方式做详细的说明。在下面的描述中阐述了很多具体细节以便于充分理解本发明。但是本发明能够以很多不同于在此描述的其它方式来实施,本领域技术人员可以在不违背本发明内涵的情况下做类似改进,因此本发明不受下面公开的具体实施例的限制。In order to make the above objects, features and advantages of the present invention more comprehensible, specific implementations of the present invention will be described in detail below in conjunction with the accompanying drawings. In the following description, numerous specific details are set forth in order to provide a thorough understanding of the present invention. However, the present invention can be implemented in many other ways different from those described here, and those skilled in the art can make similar improvements without departing from the connotation of the present invention, so the present invention is not limited by the specific embodiments disclosed below.
在本发明的描述中,需要理解的是,术语“中心”、“纵向”、“横向”、“长度”、“宽度”、“厚度”、“上”、“下”、“前”、“后”、“左”、“右”、“竖直”、“水平”、“顶”、“底”、“内”、“外”、“顺时针”、“逆时针”、“轴向”、“径向”、“周向”等指示的方位或位置关系为基于附图所示的方位或位置关系,仅是为了便于描述本发明和简化描述,而不是指示或暗示所指的装置或元件必须具有特定的方位、以特定的方位构造和操作,因此不能理解为对本发明的限制。In describing the present invention, it should be understood that the terms "center", "longitudinal", "transverse", "length", "width", "thickness", "upper", "lower", "front", " Back", "Left", "Right", "Vertical", "Horizontal", "Top", "Bottom", "Inner", "Outer", "Clockwise", "Counterclockwise", "Axial" , "radial", "circumferential" and other indicated orientations or positional relationships are based on the orientations or positional relationships shown in the drawings, which are only for the convenience of describing the present invention and simplifying the description, rather than indicating or implying the referred device or Elements must have certain orientations, be constructed and operate in certain orientations, and therefore should not be construed as limitations on the invention.
此外,术语“第一”、“第二”仅用于描述目的,而不能理解为指示或暗 示相对重要性或者隐含指明所指示的技术特征的数量。由此,限定有“第一”、“第二”的特征可以明示或者隐含地包括至少一个该特征。在本发明的描述中,“多个”的含义是至少两个,例如两个,三个等,除非另有明确具体的限定。In addition, the terms "first" and "second" are used for descriptive purposes only, and cannot be understood as indicating or implying relative importance or implicitly specifying the quantity of indicated technical features. Thus, the features defined as "first" and "second" may explicitly or implicitly include at least one of these features. In the description of the present invention, "plurality" means at least two, such as two, three, etc., unless otherwise specifically defined.
在本发明中,除非另有明确的规定和限定,术语“安装”、“相连”、“连接”、“固定”等术语应做广义理解,例如,可以是固定连接,也可以是可拆卸连接,或成一体;可以是机械连接,也可以是电连接;可以是直接相连,也可以通过中间媒介间接相连,可以是两个元件内部的连通或两个元件的相互作用关系,除非另有明确的限定。对于本领域的普通技术人员而言,可以根据具体情况理解上述术语在本发明中的具体含义。In the present invention, unless otherwise clearly specified and limited, terms such as "installation", "connection", "connection" and "fixation" should be understood in a broad sense, for example, it can be a fixed connection or a detachable connection , or integrated; it may be mechanically connected or electrically connected; it may be directly connected or indirectly connected through an intermediary, and it may be the internal communication of two components or the interaction relationship between two components, unless otherwise specified limit. Those of ordinary skill in the art can understand the specific meanings of the above terms in the present invention according to specific situations.
在本发明中,除非另有明确的规定和限定,第一特征在第二特征“上”或“下”可以是第一和第二特征直接接触,或第一和第二特征通过中间媒介间接接触。而且,第一特征在第二特征“之上”、“上方”和“上面”可是第一特征在第二特征正上方或斜上方,或仅仅表示第一特征水平高度高于第二特征。第一特征在第二特征“之下”、“下方”和“下面”可以是第一特征在第二特征正下方或斜下方,或仅仅表示第一特征水平高度小于第二特征。In the present invention, unless otherwise clearly specified and limited, the first feature may be in direct contact with the first feature or the first and second feature may be in direct contact with the second feature through an intermediary. touch. Moreover, "above", "above" and "above" the first feature on the second feature may mean that the first feature is directly above or obliquely above the second feature, or simply means that the first feature is higher in level than the second feature. "Below", "beneath" and "beneath" the first feature may mean that the first feature is directly below or obliquely below the second feature, or simply means that the first feature is less horizontally than the second feature.
需要说明的是,当元件被称为“固定于”或“设置于”另一个元件,它可以直接在另一个元件上或者也可以存在居中的元件。当一个元件被认为是“连接”另一个元件,它可以是直接连接到另一个元件或者可能同时存在居中元件。本文所使用的术语“垂直的”、“水平的”、“上”、“下”、“左”、“右”以及类似的表述只是为了说明的目的,并不表示是唯一的实施方式。It should be noted that when an element is referred to as being “fixed on” or “disposed on” another element, it may be directly on the other element or there may be an intervening element. When an element is referred to as being "connected to" another element, it can be directly connected to the other element or intervening elements may also be present. As used herein, the terms "vertical", "horizontal", "upper", "lower", "left", "right" and similar expressions are for the purpose of illustration only and do not represent the only embodiment.
下面结合附图介绍本发明实施例提供的技术方案。The technical solutions provided by the embodiments of the present invention are described below with reference to the accompanying drawings.
如图1所示,本发明提供了一种镀膜用导电装置100,镀膜用导电装置100包括机架110与两个导电机构120,镀膜用导电装置100用于在镀膜产品200表 面电镀薄膜。As shown in FIG. 1 , the present invention provides a
机架110开设有镀槽(图示未示出),镀槽能够容纳镀液,镀液既可用于在镀膜产品200上形成薄膜,也可用于电流的导通。其中,机架110可以通过铸造、模压等方式一体成型有镀槽,以简化机架110的成型工艺,节省机架110的制造成本;镀槽也可以是在机架110成型之后,通过其他辅助工具另外开设而成。镀液可以为铜液、铁液等可在镀膜产品200表面形成薄膜的流体介质,在本实施方式中仅以铜液为代表。The
两个导电机构120均通过螺接、焊接等方式固定于机架110上,以实现两个导电机构120与机架110的固定连接。并且两个导电机构120沿镀槽的深度方向间隔相对设置,即两个导电机构120之间具有间隙,在本实施方式,两个导电机构120在竖直方向上间隔设置。导电机构120包括导电辊121、钛篮122以及整流器123,导电辊121与钛篮122均固定于机架110上,整流器123的正极与钛篮122电连接,整流器123的负极与导电辊121电连接,钛篮122至少部分浸没于镀液内,在导电辊121的径向方向上,导电辊121的一侧浸没于镀液内,导电辊121的另一侧裸露于镀液外,由于镀液具有导电性,整流器123、钛篮122、导电辊121以及镀液形成一完整的电流回路,提供镀膜产品200过程中的电流。并且导电辊121在其轴向方向的横截面呈工字形,镀膜产品200在电镀过程中,导电辊121的中部既不与镀液接触,也不与镀膜产品200的中部接触,防止导电辊121中部直接或间接与镀液接触,减弱在导电辊121上出现返镀铜或铜沉积现象,降低导电辊121划伤镀膜产品200表面沉积薄膜的风险,显著提高镀膜产品200的镀膜质量。The two
当镀膜产品200在通过导电机构120时,镀膜产品200的其中一面与两根导电辊121中的其中一根接触,并且镀膜产品200的另一面与两根导电辊121 中的另外一根接触,以在镀膜产品200两个表面电镀薄膜,提高在镀膜产品200表面的电镀效率。When the
为了使导电辊121在其轴向方向的横截面呈工字形,一种优选实施方式,如图1所示,导电辊121两端的直径为5cm-20cm,导电辊121中间位置相较于其端部位置下凹1cm-3cm,换言之,导电辊121呈两端大、中间小的圆柱结构,即导电辊121中间位置的直径小于导电辊121两端位置的直径。镀膜产品200在电镀过程中,导电辊121的中部既不与镀液接触,也不与镀膜产品200的中部接触,防止导电辊121中部直接或间接与镀液接触,减弱在导电辊121上出现返镀铜或铜沉积现象,降低导电辊121划伤镀膜产品200表面沉积薄膜的风险,显著提高镀膜产品200的镀膜质量。In order to make the cross section of the
在具体设置时,导电辊121两端的直径可以为5cm、10cm、15cm、20cm中的一种,当然,导电辊121两端的直径并不局限于上述范围值,还可以为5cm-20cm这一范围内的其他数值。另外,对于导电辊121的不同安装工艺或成型工艺等,导电辊121两端的直径不局限于上述直径设置范围,可根据导电辊121的安装工艺或成型工艺等,具体设置导电辊121的两端直径。When setting specifically, the diameter at both ends of the
为了节省导电辊121的制造成本,一种优选实施方式,如图1所示,导电辊121为内部中空的管状结构,导电辊121在成型过程中所需的材料减少,可节省导电辊121的制造成本。并且对于机架110的承载强度要求较低,可实现镀膜用导电装置100的轻量化设计。In order to save the manufacturing cost of the
为了便于导电辊121的制造成型,一种优选实施方式,如图1所示,导电辊121的材质为304不锈钢、316不锈钢中的其中一种。由于304不锈钢与316不锈钢均具有优异的成型性,便于导电辊121的制造成型,并且不锈钢还具有优异的耐蚀性、强韧性等,可显著提高导电辊121的使用寿命,防止导电辊121 在长时间使用过程中产生变形等不良现象。In order to facilitate the manufacture and molding of the
当然,在其他实施方式中,导电辊121还可以为其他具有优异的成型性与导电性的材质制备而成,如:316L不锈钢,对于导电辊121的具体材质,本发明不做限制,可根据工艺需求或预算成本具体选择。Of course, in other embodiments, the
为了进一步提高镀膜产品200的镀膜质量,一种优选实施方式,如图1所示,导电机构120还包括辅助阳极124,整流器123的正极与辅助阳极124电连接。由于导电辊121沿其轴向方向的横截面为工字形,导致导电辊121中间位置的导电能力较弱,整流器123、辅助阳极124、导电辊121以及镀液形成一完整的电流回路,与整流器123、钛篮122、导电辊121以及镀液形成的电流回路共同增强导电辊121的导电能力,弥补了导电辊121中部的电流密度较小的缺点,大大提升了镀膜产品200表面形成薄膜的均匀性,以提高镀膜产品200的镀膜质量。In order to further improve the coating quality of the
其中,辅助阳极124的材质为钛金属,由于钛金属不溶于强酸,在与镀液接触时,不易发生变形、腐蚀等不良现象,有助于延长辅助电极的使用寿命。但是钛金属的导电性较弱,故在其表面均匀涂覆有铱金属层,能够增强辅助阳极124的导电性,弥补了导电辊121中部的电流密度较小的缺点,大大提升了镀膜产品200表面形成薄膜的均匀性,以提高镀膜产品200的镀膜质量。Wherein, the
另外,如图1与图2所示,本发明还提供了一种镀膜机300,镀膜机300包括放卷机构310、收卷机构320以及如上述技术方案任一项的镀膜用导电装置100,放卷机构310通过螺接、焊接等方式固定于机架110上,收卷机构320也通过螺接、焊接等方式固定于机架110上,以实现放卷机构310、收卷机构320的安装固定。放卷机构310、收卷机构320间隔设置于镀膜产品200的输送路径上,放卷机构310用于自动化输送电镀前的镀膜产品200,收卷机构320用于自 动化收取电镀后的镀膜产品200。In addition, as shown in Figures 1 and 2, the present invention also provides a
上述镀膜机300,导电辊121在其轴向方向的横截面呈工字形,镀膜产品200在电镀过程中,导电辊121的中部既不与镀液接触,也不与镀膜产品200的中部接触,防止导电辊121直接或间接与镀液接触,在导电辊121上出现返镀铜或铜沉积现象,避免导电辊121划伤镀膜产品200表面沉积的薄膜,显著提高镀膜产品200的镀膜质量。Above-mentioned
为了提高镀膜产品200表面的镀膜质量,一种优选实施方式,如图1与图2所示,镀膜机300还包括多个张紧元件330,多个张紧元件330均通过螺接、铆接等方式固定于机架110上,并且多个张紧元件330均匀分布于放卷机构310与收卷机构320之间,换言之,多个张紧元件330均匀分布于镀膜产品200的输送路径上。当镀膜产品200在经过张紧元件330时,张紧元件330可对镀膜产品200进行张紧,保证镀膜产品200的表面平整度,进一步提高镀膜产品200表面形成薄膜的均匀性,以提高镀膜产品200表面的镀膜质量。In order to improve the coating quality on the surface of the
其中,张紧元件330为张紧轮或张紧弹簧,以保证镀膜产品200在经过张紧元件330时,张紧元件330可对镀膜产品200进行张紧,保证镀膜产品200的表面平整度。当然,张紧元件330不局限于上述提供的张紧轮或张紧弹簧,还可以为其他能够张紧镀膜产品200的元件,对于张紧元件330的具体类型,本发明不做限制。Wherein, the
为了减弱在导电辊121上出现返镀铜或铜沉积现象,一种优选实施方式,如图1与图2所示,镀膜机300还包括两个喷淋元件(图示未示出),两个喷淋元件均通过螺接、铆接等方式固定于机架110上。喷淋元件具有喷淋口,两个喷淋口中的其中一个朝向两根导电辊121中的其中一根,两个喷淋口中的另外一个朝向两根导电辊121中的另外一根。通过喷淋元件喷射出的清洗介质对 导电辊121进行清洗,以对残留于导电辊121上的镀液进行清洗,防止残留于导电辊121上的镀液长时间暴露于空气中,在导电辊121上出现返镀铜或铜沉积现象。In order to weaken the phenomenon of copper replating or copper deposition on the
其中,喷淋元件为喷淋头,以对残留于导电辊121上的镀液进行清洗。当然,喷淋元件不局限于上述提供的喷淋头,还可以为其他能够清洗残留于导电辊121上的镀液的元件,对于喷淋元件的具体类型,本发明不做限制。Wherein, the shower element is a shower head to clean the plating solution remaining on the
为了提高镀膜机300在镀膜产品200上的电镀效率,一种优选实施方式,如图1与图2所示,镀膜机300还包括加热元件(图示未示出),加热元件通过螺接、焊接等方式固定于机架110上,加热元件可加速镀膜产品200表面薄膜的成形速率,提高镀膜机300在镀膜产品200上的电镀效率。In order to improve the electroplating efficiency of the
其中,加热元件为烘箱,加热元件能够加速镀膜产品200表面薄膜的成形速率。当然,加热元件不局限于上述提供的烘箱,还可以为其他能够加速镀膜产品200表面薄膜成形速率的元件,对于加热元件的具体类型,本发明不做限制。Wherein, the heating element is an oven, and the heating element can accelerate the forming rate of the film on the surface of the
下面结合具体实施方式对本发明进行进一步的阐述。The present invention will be further elaborated below in combination with specific embodiments.
需要说明的是,实施例中均采用方阻均匀性与薄膜表面孔洞形貌来表现镀膜产品表面的镀膜质量。使用四探针测试仪测量镀膜产品200表面形成薄膜的电阻,
并且将电镀后的镀膜产品200展开,通过CCD相机(工业相机)对展开后的镀膜产品200表面形成的薄膜情况进行摄像,通过观测孔洞数量以及孔洞直径大小以表示镀膜产品200表面的镀膜质量。
It should be noted that, in the examples, the square resistance uniformity and the surface hole morphology of the film are used to represent the coating quality of the coating product surface. Use a four-probe tester to measure the resistance of the film formed on the surface of the coating product 200, And the
实施例1Example 1
选择在聚丙烯膜的表面进行电镀薄膜,聚丙烯膜的厚度为6μm,导电辊121 为现有导电辊121,未设置辅助阳极124。The electroplated film is selected on the surface of the polypropylene film, the thickness of the polypropylene film is 6 μm, the
镀液成分:130g/L硫酸铜,140g/L硫酸,60mg/L盐酸,8ml/L光亮剂。Plating solution composition: 130g/L copper sulfate, 140g/L sulfuric acid, 60mg/L hydrochloric acid, 8ml/L brightener.
抗氧化液:DP-A剂5ml/L,DP-B剂10ml/L,工艺温度20-30℃,PH 1.8-3.5。Antioxidant solution: DP-A agent 5ml/L, DP-B agent 10ml/L, process temperature 20-30℃, pH 1.8-3.5.
烘箱设置温度:80℃。Oven setting temperature: 80°C.
聚丙烯膜的输送线速度:2m/min。The conveying line speed of polypropylene film: 2m/min.
聚丙烯膜其中一面(以下均以A面替代)总电流:1152A;聚丙烯膜另外一面(以下均以B面替代)总电流:1164A。The total current of one side of the polypropylene film (replaced by A side below) is 1152A; the total current of the other side of the polypropylene film (replaced by B side below) is 1164A.
聚丙烯膜在输送过程中的张力:80N。Tension of polypropylene film during conveying: 80N.
结果见表1与表2:The results are shown in Table 1 and Table 2:
表1 1200m聚丙烯膜不同位置A面与B面方阻Table 1 1200m polypropylene film surface A and B square resistance at different positions
表2聚丙烯膜表面薄膜的孔洞检测数据Table 2 The hole detection data of the film on the surface of the polypropylene film
通过表1与表2可知,在未设置辅助阳极124的情况下,当使用现有导电辊121对聚丙烯膜进行电镀薄膜时,使用四探针测试仪测量1200m范围内的聚丙烯膜表面形成薄膜的电阻,聚丙烯膜A面的方阻均匀性为11.6%,聚丙烯膜B 面的方阻均匀性为11.6%。通过CCD相机对展开后1200㎡范围内的聚丙烯膜表面形成薄膜情况进行摄像,总孔洞个数为1752个,各区间内孔洞直径均偏大。As can be seen from Table 1 and Table 2, in the absence of an
实施例2Example 2
选择在聚丙烯膜的表面进行电镀薄膜,聚丙烯膜的厚度为6μm,导电辊121为本发明使用的导电辊121(导电辊121沿其轴向方向的横截面为工字形),未设置辅助阳极124。Select to carry out electroplating thin film on the surface of polypropylene film, the thickness of polypropylene film is 6 μ m,
镀液成分:130g/L硫酸铜,140g/L硫酸,60mg/L盐酸,8ml/L光亮剂。Plating solution composition: 130g/L copper sulfate, 140g/L sulfuric acid, 60mg/L hydrochloric acid, 8ml/L brightener.
抗氧化液:DP-A剂5ml/L,DP-B剂10ml/L,工艺温度20-30℃,PH 1.8-3.5。Antioxidant solution: DP-A agent 5ml/L, DP-B agent 10ml/L, process temperature 20-30℃, pH 1.8-3.5.
烘箱设置温度:80℃。Oven setting temperature: 80°C.
聚丙烯膜的输送线速度:2m/min。The conveying line speed of polypropylene film: 2m/min.
聚丙烯膜A面总电流:1152A;聚丙烯膜B面总电流:1164A。The total current of the side A of the polypropylene film: 1152A; the total current of the side B of the polypropylene film: 1164A.
聚丙烯膜在输送过程中的张力:80N。Tension of polypropylene film during conveying: 80N.
结果见表3与表4:The results are shown in Table 3 and Table 4:
表3 1200m聚丙烯膜不同位置A面与B面方阻Table 3 1200m polypropylene film surface A and B square resistance at different positions
表4聚丙烯膜表面薄膜的孔洞检测数据Table 4 Pore detection data of polypropylene film surface film
通过表3与表4可知,在未设置辅助阳极124的情况下,当使用本发明使用的导电辊121对聚丙烯膜进行电镀薄膜时,使用四探针测试仪测量1200m范围内的聚丙烯膜表面形成薄膜的电阻,聚丙烯膜A面的方阻均匀性为12.2%,聚丙烯膜B面的方阻均匀性为14.3%。通过CCD相机对展开后1200㎡范围内的聚丙烯膜表面形成薄膜情况进行摄像,总孔洞个数为492个,各区间内孔洞直径均偏小。As can be seen from Table 3 and Table 4, in the absence of an
实施例3Example 3
选择在聚丙烯膜的表面进行电镀薄膜,聚丙烯膜的厚度为6μm,导电辊121为本发明使用的导电辊121(导电辊121沿其轴向方向的横截面为工字形),并设置有辅助阳极124。Select to carry out electroplating thin film on the surface of polypropylene film, the thickness of polypropylene film is 6 μ m,
镀液成分:130g/L硫酸铜,140g/L硫酸,60mg/L盐酸,8ml/L光亮剂。Plating solution composition: 130g/L copper sulfate, 140g/L sulfuric acid, 60mg/L hydrochloric acid, 8ml/L brightener.
抗氧化液:DP-A剂5ml/L,DP-B剂10ml/L,工艺温度20-30℃,PH 1.8-3.5。Antioxidant solution: DP-A agent 5ml/L, DP-B agent 10ml/L, process temperature 20-30℃, pH 1.8-3.5.
烘箱设置温度:80℃。Oven setting temperature: 80°C.
聚丙烯膜的输送线速度:2m/min。The conveying line speed of polypropylene film: 2m/min.
聚丙烯膜A面总电流:1152A;聚丙烯膜B面总电流:1164A。The total current of the side A of the polypropylene film: 1152A; the total current of the side B of the polypropylene film: 1164A.
辅助阳极124A面总电流:52A;辅助阳极124B面总电流:64A。The total current of the auxiliary anode 124A surface: 52A; the total current of the auxiliary anode 124B surface: 64A.
聚丙烯膜在输送过程中的张力:80N。Tension of polypropylene film during conveying: 80N.
结果见表5与表6:The results are shown in Table 5 and Table 6:
表5 1200m聚丙烯膜不同位置A面与B面方阻Table 5 1200m polypropylene film different position A surface and B surface resistance
表6聚丙烯膜表面薄膜的孔洞检测数据Table 6 The hole detection data of the film on the surface of the polypropylene film
通过表5与表6可知,在设置有辅助阳极124的情况下,当使用本发明使用的导电辊121对聚丙烯膜进行电镀薄膜时,使用四探针测试仪测量1200m范围内的聚丙烯膜表面形成薄膜的电阻,聚丙烯膜A面的方阻均匀性为7.3%,聚丙烯膜B面的方阻均匀性为7.3%。通过CCD相机对展开后1200㎡范围内的聚丙烯膜表面形成薄膜情况进行摄像,总孔洞个数为456个,各区间内孔洞直径显著减小。It can be seen from Table 5 and Table 6 that, in the case where the
综上所述,当使用本发明的导电辊121(导电辊121沿其轴向方向的横截面为工字形时),聚丙烯膜表面形成薄膜的孔洞数量明显减小,并且各区间内孔洞直径均偏小,表明镀膜产品200在电镀过程中,导电辊121上出现返镀铜或铜沉积的现象已得到减弱,导电膜对镀膜产品200表面沉积薄膜划伤的风险降低,镀膜产品200的镀膜质量显著提高。另外,当设置有辅助阳极124时,由于导电辊121中部的电流密度增加,大大提升了镀膜产品200表面形成薄膜的均匀性,进一步提高了镀膜产品200的镀膜质量。In summary, when using the
以上所述实施例的各技术特征可以进行任意的组合,为使描述简洁,未对上述实施例中的各个技术特征所有可能的组合都进行描述,然而,只要这些技 术特征的组合不存在矛盾,都应当认为是本说明书记载的范围。The technical features of the above-mentioned embodiments can be combined arbitrarily. To make the description concise, all possible combinations of the technical features in the above-mentioned embodiments are not described. However, as long as there is no contradiction in the combination of these technical features, should be considered as within the scope of this specification.
以上所述实施例仅表达了本发明的几种实施方式,其描述较为具体和详细,但并不能因此而理解为对发明专利范围的限制。应当指出的是,对于本领域的普通技术人员来说,在不脱离本发明构思的前提下,还可以做出若干变形和改进,这些都属于本发明的保护范围。因此,本发明专利的保护范围应以所附权利要求为准。The above-mentioned embodiments only express several implementation modes of the present invention, and the descriptions thereof are relatively specific and detailed, but should not be construed as limiting the patent scope of the invention. It should be noted that, for those skilled in the art, several modifications and improvements can be made without departing from the concept of the present invention, and these all belong to the protection scope of the present invention. Therefore, the protection scope of the patent for the present invention should be based on the appended claims.
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2023
- 2023-02-24 JP JP2024600145U patent/JP3250096U/en active Active
- 2023-02-24 WO PCT/CN2023/078076 patent/WO2023160642A1/en not_active Ceased
Patent Citations (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1675411A (en) * | 2002-06-17 | 2005-09-28 | 东丽株式会社 | Method for manufacturing plated film, cathode roll for plating, and method for manufacturing circuit board |
| JP2010181464A (en) * | 2009-02-03 | 2010-08-19 | Seiko Epson Corp | Conductive roller and image forming apparatus |
| CN113015824A (en) * | 2018-12-18 | 2021-06-22 | 株式会社杰希优 | Plating apparatus and plating method |
| CN112626581A (en) * | 2020-12-10 | 2021-04-09 | 厦门海辰新材料科技有限公司 | Electroplating device and coating method of conductive base film |
| CN214782231U (en) * | 2021-05-21 | 2021-11-19 | 重庆金美新材料科技有限公司 | A segmented conductive roller |
| CN113699578A (en) * | 2021-08-02 | 2021-11-26 | 重庆金美新材料科技有限公司 | Electroplating system for double-sided coating |
| CN113755917A (en) * | 2021-08-02 | 2021-12-07 | 重庆金美新材料科技有限公司 | Electroplating system |
| TWM621082U (en) * | 2021-08-11 | 2021-12-11 | 大陸商常州欣盛半導體技術股份有限公司 | Cathode roll |
| CN216998623U (en) * | 2022-02-24 | 2022-07-19 | 江阴纳力新材料科技有限公司 | Conductive device for coating and coating machine |
Also Published As
| Publication number | Publication date |
|---|---|
| WO2023160642A1 (en) | 2023-08-31 |
| CN114574909B (en) | 2025-02-14 |
| CN114574909A (en) | 2022-06-03 |
| JP3250096U (en) | 2025-02-10 |
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