WO2023038322A1 - Polyamic acid composition and polyimide prepared therefrom - Google Patents
Polyamic acid composition and polyimide prepared therefrom Download PDFInfo
- Publication number
- WO2023038322A1 WO2023038322A1 PCT/KR2022/012452 KR2022012452W WO2023038322A1 WO 2023038322 A1 WO2023038322 A1 WO 2023038322A1 KR 2022012452 W KR2022012452 W KR 2022012452W WO 2023038322 A1 WO2023038322 A1 WO 2023038322A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- polyamic acid
- acid composition
- mol
- dianhydride
- monomer component
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Ceased
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
- C08G73/06—Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
- C08G73/10—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/03—Use of materials for the substrate
Definitions
- polyimide (PI) resin refers to a highly heat-resistant resin prepared by solution polymerization of aromatic dianhydride and aromatic diamine or aromatic diisocyanate to prepare a polyamic acid derivative, followed by imidization by curing. refers to
- Polyimide is a polymer material with thermal stability based on a rigid aromatic main chain, and has mechanical properties such as excellent strength, chemical resistance, weather resistance and heat resistance based on the chemical stability of the imide ring.
- polyimide is in the limelight as a high-functional polymer material applicable to a wide range of industries such as electronics, communication, and optics due to its excellent electrical properties such as insulating properties and low permittivity.
- An object of the present invention is to provide a polyamic acid composition and a polyimide film having excellent thermal properties such as dimensional stability and heat resistance while having high transparency.
- the present invention can provide a polyamic acid composition and polyimide having excellent processability, excellent mechanical properties, as well as low weight loss and low expansion coefficient against heat due to a high glass transition temperature while having high transparency.
- Polyimide (PI) resin is prepared by polymerization of aromatic dianhydride and aromatic diamine or aromatic diisocyanate to prepare a polyamic acid derivative, followed by imidization by curing.
- Polyimide has excellent thermal stability based on a rigid aromatic backbone.
- the transparency is so low that there is a limit to use in the electronic material field, especially in the display field requiring high transparency.
- the present invention includes a compound having a special type of aromaticity in addition to a compound having 1 to 2 aromatic rings as a part of the dianhydride monomer component and / or diamine component constituting the polyimide, and by optimizing their content, A polyamic acid composition and polyimide having high transparency and excellent thermal properties can be provided.
- the present invention is based on the glass transition temperature (Tg), which can predict thermal properties and also reflect mechanical properties. noticed.
- the polyimide precursor may mean dianhydride and diamine excluding the solvent in the polyamic acid composition.
- the present invention relates to a polyamic acid composition.
- the polyamic acid composition includes a polyamic acid having a polymerization unit derived from a dianhydride monomer component and a diamine monomer component, and a solvent.
- the fluorene skeleton may not generate a resonance effect due to electron transfer with the main chain of the dianhydride monomer component and/or the diamine monomer component.
- the dianhydride monomer component may include a compound having a fluorene skeleton, and the compound having a fluorene skeleton among the dianhydride monomer components is 9,9-bis(3,4-dicarboxyphenyl) Can be fluorene dianhydride (BPAF) or 4,4'-(9H-fluorene-9,9 diyl)bis(4,1-phenylene))bis(4-aminobenzamide) (FDA-ADA) there is.
- BPAF fluorene dianhydride
- FDA-ADA 4,4'-(9H-fluorene-9,9 diyl)bis(4,1-phenylene))bis(4-aminobenzamide)
- the upper limit of the content of the compound having a fluorene skeleton is less than 24 mol%, less than 23 mol%, less than 22 mol%, less than 21 mol%, less than 20 mol% with respect to the total dianhydride monomer component and diamine monomer component Less than 19 mol%, less than 18 mol%, less than 17 mol%, less than 16 mol%, less than 15 mol%, less than 14 mol%, less than 13 mol%, less than 12 mol%, less than 11 mol%, 10 mol% less than 9 mol%, less than 8 mol% or less than 7 mol%, with lower limits greater than 0.01 mol%, greater than 0.05 mol%, greater than 0.9 mol%, greater than 1 mol%, greater than 2 mol%, greater than 3 mol% or greater than 4 mol%.
- the compound having a fluorene skeleton is 0.5 mol% to 30 mol%, 0.6 mol% to 25 mol%, 0.7 mol% to 23 mol%, 3 mol% to 10 mol%, 3 mol% to 10 mol%, based on the total polyimide precursor. mol % to 9 mol % or 3 mol % to 7 mol %.
- the content of the compound having a fluorene skeleton in the dianhydride monomer component may be less than 15 mol%, for example, the upper limit of the content of the compound having a fluorene skeleton in the dianhydride monomer component is less than 14 mol%, less than 13 mol%, less than 12 mol%, less than 11 mol%, less than 10 mol%, less than 9 mol%, less than 8 mol%, less than 7 mol% or less than 6 mol%, with lower limits greater than 0.01 mol% and 0.05 mol%.
- the compound having a fluorene skeleton among the dianhydride monomer components is 1 mol% to 10 mol%, 3 mol% to 10 mol%, 3 mol% to 9 mol%, or 3 mol% to 3 mol% with respect to the polyimide precursor 7 mol%.
- the compound having a fluorene skeleton among the diamine monomer components is 1 mol% to 10 mol%, 3 mol% to 10 mol%, 3 mol% to 9 mol%, or 3 mol% to 7 mol% based on the polyimide precursor may be %.
- a compound having a fluorene skeleton can contribute to high transparency of polyimide after curing, but weakens mechanical strength and thermal properties. Specifically, when the content of the compound having a fluorene skeleton in the polyamic acid composition increases, the mechanical strength and thermal expansion coefficient of the cured polyamide decrease, and the thermal decomposition temperature decreases, resulting in deterioration in mechanical and thermal properties. Therefore, in the present invention, by limiting the content of the compound having a fluorene skeleton to the above range, it is possible to prevent deterioration of mechanical strength and thermal properties while having high transparency.
- the rigidity and crosslinking density of the aromatic main chain which can prevent a rapid decrease in glass transition temperature, can be maintained, so that after curing, mechanical strength and thermal properties are lowered can be minimized.
- the glass transition temperature as described above it is possible to minimize deterioration in mechanical strength and thermal properties after curing of the polyamic acid composition, minimize flowability due to thermal deformation, and thus improve processability.
- the dianhydride monomer component and the diamine monomer component other than the compound having a fluorene skeleton may each include a compound having one or two or more benzene rings.
- the dianhydride monomer component and the diamine monomer component other than the compound having a fluorene skeleton may each include a compound having one or two benzene rings.
- dianhydride monomer components compounds having one or two benzene rings are pyromellitic dianhydride (PMDA), 3,3',4,4'-biphenyltetracarboxylic dianhydride (s- BPDA), 2,3,3',4'-biphenyltetracarboxylic dianhydride (a-BPDA), 3,3',4,4'-benzophenonetetracarboxylic dianhydride (BTDA) , It may be at least one selected from the group consisting of oxydiphthalic dianhydride (ODPA) and 4,4-(hexafluoroisopropylidene)diphthalic anhydride (6-FDA).
- PMDA pyromellitic dianhydride
- s- BPDA 3,3',4,4'-biphenyltetracarboxylic dianhydride
- a-BPDA 2,3,3',4'-biphenyltetracarboxylic dian
- the dianhydride monomer component other than the compound having a fluorene skeleton may include a compound having two benzene rings, and the compound having two benzene rings as the dianhydride monomer component is 3,3' ,4,4'-biphenyltetracarboxylic dianhydride (s-BPDA), 2,3,3',4'-biphenyltetracarboxylic dianhydride (a-BPDA), 3,3' ,4,4'-benzophenonetetracarboxylic dianhydride (BTDA), oxydiphthalic dianhydride (ODPA) and 4,4-(hexafluoroisopropylidene)diphthalic anhydride (6-FDA) It may be at least one selected from the group consisting of.
- s-BPDA 3,3' ,4,4'-biphenyltetracarboxylic dianhydride
- a-BPDA 2,3,3',4'-biphenyl
- the dianhydride monomer component having one or two benzene rings may be included in an amount of 80 mol% or more of the dianhydride monomer component.
- the lower limit of the ratio of the dianhydride monomer component having one or two benzene rings among the dianhydride monomer components may be 82 mol% or more, 84 mol% or more, 86 mol% or more, or 88 mol% or more, The upper limit may be 99.9 mol% or less, 99.5 mol% or less, 99 mol% or less, or 98 mol% or less.
- Compounds having one or two benzene rings among the diamine monomer components are 1,4-diaminobenzene (PPD), 1,3-diaminobenzene (MPD), 2,4-diaminotoluene, 2,6 -Diaminotoluene, 4,4'-diaminodiphenyl ether (ODA), 4,4-diaminobenzanilide (4,4-DABA), 2,2-dimethylbenzidine (M-TOLIDINE), 3, It may be at least one selected from the group consisting of 3-dimethylbenzidine (O-TOLIDINE) and 2,2'-bistrifluoromethylbenzidine (TFMB).
- PPD 1,4-diaminobenzene
- MPD 1,3-diaminobenzene
- ODA 4,4'-diaminodiphenyl ether
- 4,4-DABA 4,4-diaminobenzanilide
- M-TOLIDINE 2,2-d
- the diamine monomer component having one or two benzene rings may be included in an amount of 80 mol% or more of the diamine monomer component.
- the lower limit of the ratio of the diamine monomer component having one or two benzene rings among the diamine monomer components may be 82 mol% or more, 84 mol% or more, 86 mol% or more, or 88 mol% or more, and the upper limit is 99.9 mol%. % or less, 99.5 mol% or less, 99 mol% or less, or 98 mol% or less.
- the polyamic acid composition according to the present invention includes a solvent, and the solvent may be an organic solvent.
- Solvents compatible with the polyimide precursor include N,N-diethylacetamide (DEAC), N,N-dimethylpropionamide (DMPA), 3-methoxy-N,N-dimethylpropanamide (KJCMPA)
- NMP N-methyl-2-pyrrolidone
- the solvent may be an organic solvent.
- the solvent of the polyamic acid composition according to the present invention may have a boiling point of 150°C or higher.
- the solvent of the polyamic acid composition may have a boiling point of 160°C or higher or 170°C or higher.
- the lower limit of the boiling point of the solvent may be, for example, 155 ° C, 160 ° C, 165 ° C, 170 ° C, 175 ° C, 180 ° C, 185 ° C, 190 ° C, 195 ° C, 200 ° C or 201 ° C or higher
- the upper limit may be, for example, 500°C, 450°C, 300°C, 280°C, 270°C, 250°C, 240°C, 230°C, 220°C, 210°C or 205°C or less.
- the polyamic acid composition according to the present invention may have a solid content in the range of 5 to 30% by weight.
- the solid content may be 7% by weight or more, 9% by weight or more, 10% by weight or more, 12% by weight or more, 14% by weight or more, or 15% by weight or more, and the upper limit is, for example, 30% by weight or less, 25% by weight or less % or less, 20% or less, 18% or less, 17% or less or 15% or less.
- the present application can implement the desired physical properties and viscosity within the above range.
- a conventional polyimide precursor polymerization method such as solution polymerization may be used.
- the thermal expansion coefficient may be measured at 100 to 400 °C.
- the CTE can use TA's thermomechanical analyzer Q400 model, and after manufacturing polyimide into a film, cutting it into a width of 2 mm and a length of 10 mm, applying a tension of 0.05 N in a nitrogen atmosphere, 10 ° C / After raising the temperature from room temperature to 500 ° C at a rate of min, the slope of the 100 ° C to 400 ° C section can be measured while cooling again at a rate of 10 ° C / min.
- the polyamic acid composition according to the present application may have a glass transition temperature of 430° C. or more after curing, and for example, the lower limit of the glass transition temperature is 440° C. or more, 445° C. or more, 450° C. or more, or 455° C. °C or higher or 460 °C or higher.
- the upper limit may be 600° C. or less.
- the glass transition temperature may be measured at 10 °C/min using TMA for polyimide prepared by curing the polyamic acid composition.
- the lower limit of the thermal decomposition temperature may be, for example, 550 °C or higher, 555 °C or higher, 560 °C or higher, or 565 °C or higher.
- the upper limit may be, for example, 800°C, 750°C, 700°C, 650°C or 630°C or less.
- the polyamic acid composition according to the present application may have light transmittance of 60% or more in a visible light region of 470 nm after curing.
- the light transmittance can be measured using a UV/Vis spectrophotometer.
- the light transmittance is 61% or more, 62% or more, 63% or more, 64% or more, 65% or more, 66% or more, 67% or more, 68% or more, 69% or more, 70% or more, 71% It may be 72% or more, 73% or more, 74% or more, 75% or more, 76% or more, 77% or more, or 80% or more, and the upper limit is not particularly limited, but may be 90% or less or 85% or less.
- the polyamic acid composition may have an elongation of 15% or more after curing, for example, 17% or more, 19% or more, 21% or more, 23% or more, or 25% or more.
- the upper limit is not particularly limited, but may be 40% or less.
- the elongation can be measured by the ASTM D-882 method using Instron 5564 UTM equipment after curing the polyamic acid composition into a polyimide film, cutting it into a width of 10 mm and a length of 40 mm.
- the polyamic acid composition may have a tensile strength of 230 MPa or more after curing.
- the lower limit of the tensile strength may be, for example, 240 MPa or more, 250 MPa or more, 260 MPa or more, 270 MPa or more, 280 MPa or more, 290 MPa or more or 300 MPa or more, and the upper limit may be, for example, 550 MPa or less or It may be 530 MPa or less.
- the elastic modulus and tensile strength were measured by the ASTM D-882 method using Instron 5564 UTM equipment after curing the polyamic acid composition to prepare a polyimide film, cutting it into a width of 10 mm and a length of 40 mm, and Tensile strength can be measured.
- the cross head speed at this time can be measured under the condition of 50 mm/min.
- the present invention provides a method for producing a polyimide, comprising forming a polyamic acid composition prepared according to the method for producing a polyamic acid composition on a support and drying to prepare a gel, and curing the gel.
- the method for producing a polyimide of the present invention may include forming a film of the polyamic acid composition on a support, drying the film to prepare a gel, and curing the gel.
- the polyamic acid composition formed on the support is dried at a temperature of 20 to 120 ° C for 5 to 60 minutes to prepare a gel film, and the gel film is heated from 1 to 8 ° C to 30 to 500 ° C. /min, heat treatment at 450 to 500 ° C for 5 to 60 minutes, and cooling to 20 to 120 ° C at a rate of 1 to 8 ° C / min.
- Curing the gel film may be performed at 30 to 500 °C.
- the step of curing the gel film is 30 to 400 ° C, 30 to 300 ° C, 30 to 200 ° C, 30 to 100 ° C, 100 to 500 ° C, 100 to 300 ° C, 200 to 500 ° C, or 400 to 500 ° C. may be performed at °C.
- the polyimide film may have a thickness of 5 to 20 ⁇ m.
- the polyimide film may have a thickness of 5 to 18 ⁇ m, 6 to 16 ⁇ m, 7 to 14 ⁇ m, 8 to 12 ⁇ m, or 9 to 11 ⁇ m.
- the polyimide according to the present invention has excellent transparency and excellent thermal properties, it can be usefully used as a substrate such as a substrate for a device or a cover substrate for a display, and a film such as an optical film, an adhesive film, a tape or a protective film for a disk. can be usefully used.
- the polyamic acid composition according to the present invention or the polyimide prepared using the same may be used as a transparent polyimide substrate for oxide TFT or a transparent polyimide substrate for LTPS.
- the present invention can provide a transparent polyimide substrate for an oxide TFT manufactured using the polyamic acid composition or polyimide described above.
- the present invention may provide a transparent polyimide substrate for LTPS manufactured using the polyamic acid composition or polyimide described above.
- the polyamic acid composition according to the present invention and the polyimide including the same have excellent thermal properties such as dimensional stability and heat resistance while having high transparency.
- the polyamic acid composition and the polyimide including the polyamic acid composition according to the present invention have high transparency and a high glass transition temperature, they have excellent mechanical properties and processability as well as low weight loss and low expansion coefficient with respect to heat.
- N,N-dimethylpropionamide (DMPA) was introduced as a solvent while nitrogen was injected into a 500 ml reactor equipped with a stirrer and a nitrogen injection discharge pipe.
- BPDA biphenyltetracarboxylic dianhydride
- PPD para-phenylene diamine
- 10 parts by weight of 9,9-bis (3,4-dicarboxyphenyl) fluorene dianhydride (9,9-Bis (3,4-dicarboxyphenyl) fluorene Dianhydride, BPAF) was divided into 3 times at 30 minute intervals. Then, stirring was continued for 120 minutes to prepare a polymerized polyamic acid composition.
- a polyamic acid solution was prepared in the same manner as in Example 1, except that the monomer components and content ratios were adjusted as shown in Table 1.
- a polyamic acid solution was prepared in the same manner as in Example 1, except that the monomers and content ratios were adjusted as shown in Table 1.
- Example 1 One 100 15 Example 2 97 3 100 15 Example 3 95 5 100 15 Example 4 93 7 100 15 Example 5 90 10 100 15 Example 6 90 10 90 10 15 Example 7 90 10 100 15 Example 8 90 10 90 10 15 Example 9 90 5 5 90 5 5 15 Example 10 100 90 10 15 Example 11 100 93 7 15 Example 12 100 97 3 15 Example 13 100 99 One 15 Comparative Example 1 100 100 15 Comparative Example 2 85 15 100 15 Comparative Example 3 85 15 100 15 Comparative Example 4 85 15 85 15 15 15 15 Comparative Example 5 85 15 15 15 Comparative Example 6 100 85 15 15 15 BPDA: biphenyltetracarboxylic dianhydride BPAF: 9,9-bis(3,4-dicarboxyphenyl)fluorene dianhydride FDA-ADA: 4,4'-(9H-fluorene-9,9di
- Air bubbles were removed from the polyamic acid compositions prepared in Examples and Comparative Examples by high-speed rotation of 1,500 rpm or more. Then, the degassed polyamic acid composition was applied to the glass substrate using a spin coater. Thereafter, a gel film was prepared by drying at a temperature of 120 ° C. for 30 minutes under a nitrogen atmosphere, and the gel film was heated at a rate of 2 ° C / min to 450 ° C. After heat treatment at 450 ° C. for 60 minutes, 30 ° C. It was cooled at a rate of 2° C./min to obtain a 10 ⁇ m polyimide film.
- the polyimide film was peeled from the glass substrate by dipping in distilled water.
- the physical properties of the prepared polyimide film were measured using the following method, and the results are shown in Table 2 below.
- Viscosity of the polyamic acid solutions prepared in Examples and Comparative Examples was measured using Haake's Rheostress 600 under conditions of a shear rate of 1/s, a temperature of 23° C., and a plate gap of 1 mm.
- thermomechanical analyzer Q400 model was used, and after cutting the polyimide film into a width of 2 mm and a length of 10 mm, it was heated from room temperature to 500 ° C at a rate of 10 ° C / min while applying a tension of 0.05 N in a nitrogen atmosphere. After the temperature was raised, the slope of the section from 100 °C to 400 °C was measured while cooling at a rate of 10 °C/min.
- the rapidly expanding point at 10 °C/min condition was measured as an on-set point using TMA.
- the elastic modulus and tensile strength were measured by ASTM D-882 method using Instron 5564 UTM equipment. can The cross head speed at this time can be measured under the condition of 50 mm/min.
- Example 1 3,300 66 3 460 568 28 468 9.0
- Example 2 4,200 70 3 460 568 28 397 8.1
- Example 3 4,100 72 4 455 565 25 342 7.9
- Example 4 3,000 74 4 455 563 23 303 7.8
- Example 5 3,000 77 10 450 563 22 275 7.1
- Example 6 3,500 83 14 455 558 20 263 7.0
- Example 7 3,100 76 8 460 560 25 301 6.9
- Example 8 3,800 79 12 460 555 20 265 7.0
- Example 9 5,200 76 12 450 553 22 290 7.3
- Example 10 4,800 75 13 450 558 25 334 7.5
- Example 11 4,400 73 10 455 560 25 340 7.5
- Example 12 3,500 71 5 460 565 26 378 8.0
- Example 13 3,500 66 3 460
Landscapes
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
- Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
Abstract
Description
본 발명은 폴리아믹산 조성물 및 이로부터 제조되는 폴리이미드에 관한 것이다.The present invention relates to a polyamic acid composition and a polyimide prepared therefrom.
일반적으로, 폴리이미드(polyimide, PI) 수지라 함은 방향족 디안하이드라이드와 방향족 디아민 또는 방향족 디이소시아네이트를 용액중합하여 폴리아믹산 유도체를 제조한 후, 경화에 의한 이미드화를 통해 제조되는 고내열성 수지를 일컫는다.In general, polyimide (PI) resin refers to a highly heat-resistant resin prepared by solution polymerization of aromatic dianhydride and aromatic diamine or aromatic diisocyanate to prepare a polyamic acid derivative, followed by imidization by curing. refers to
폴리이미드는 강직한 방향족 주쇄를 기본으로 하는 열적 안정성을 가진 고분자 물질로 이미드 고리의 화학적 안정성을 기초로 하여 우수한 강도, 내화학성, 내후성 및 내열성 등의 기계적 특성을 가진다. 뿐만 아니라 폴리이미드는 절연특성, 낮은 유전율과 같은 뛰어난 전기적 특성으로 전자, 통신, 광학 등 광범위한 산업 분야에 적용 가능한 고기능성 고분자 재료로 각광받고 있다.Polyimide is a polymer material with thermal stability based on a rigid aromatic main chain, and has mechanical properties such as excellent strength, chemical resistance, weather resistance and heat resistance based on the chemical stability of the imide ring. In addition, polyimide is in the limelight as a high-functional polymer material applicable to a wide range of industries such as electronics, communication, and optics due to its excellent electrical properties such as insulating properties and low permittivity.
최근에는 각종 전자기기가 박형화, 경량화 및 소형화 됨에 따라 가볍고 유연성이 우수한 박형의 폴리이미드 필름을 회로기판의 절연소재 또는 디스플레이용 유리기판을 대체할 수 있는 디스플레이 기판으로 사용하고자 하는 연구가 많이 진행되고 있다.In recent years, as various electronic devices have become thinner, lighter and smaller, many studies have been conducted to use thin polyimide films, which are lightweight and have excellent flexibility, as insulating materials for circuit boards or as display substrates that can replace glass substrates for displays. .
다만, 상기와 같은 전자재료 분야에 폴리이미드 필름을 활용하기 위해서는 가시광 영역에서의 높은 투명도가 요구되며, 기판 상 소자를 형성하는 공정에서 열이 가해지는 경우가 있으므로, 높은 내열성 및 치수안정성이 요구된다.However, in order to utilize the polyimide film in the field of electronic materials as described above, high transparency in the visible light region is required, and since heat may be applied in the process of forming an element on a substrate, high heat resistance and dimensional stability are required. .
폴리이미드의 투명도를 향상하기 위한 방법으로는 할로겐, 황 또는 산소를 포함하는 비교적 전기음성도가 강한 치환기를 반복 사슬 내에 도입하여 전자 밀도를 감소시키는 방법이 있었으나, 치수안정성 및 내열성과 같은 열적 특성이 크게 저하되는 문제가 있었다.As a method for improving the transparency of polyimide, there has been a method of reducing the electron density by introducing a relatively electronegative substituent including halogen, sulfur, or oxygen into the repeating chain, but thermal properties such as dimensional stability and heat resistance have been There was a problem with a significant drop.
따라서, 높은 투명도를 가지면서도 치수안정성 및 내열성과 같은 열적 특성이 우수한 폴리이미드의 개발이 요구된다.Therefore, it is required to develop a polyimide having excellent thermal properties such as dimensional stability and heat resistance while having high transparency.
본 발명은 높은 투명도를 가지면서도 치수안정성 및 내열성과 같은 열적 특성이 우수한 폴리아믹산 조성물 및 폴리이미드 필름을 제공하는 것을 목적으로 한다. An object of the present invention is to provide a polyamic acid composition and a polyimide film having excellent thermal properties such as dimensional stability and heat resistance while having high transparency.
특히, 본 발명은 높은 투명도를 가지면서도 유리전이온도가 높기 때문에 열에 대한 중량 감소 및 팽창 계수가 낮음은 물론 기계적 물성이 뛰어나고, 공정성이 우수한 폴리아믹산 조성물 및 폴리이미드를 제공할 수 있다.In particular, the present invention can provide a polyamic acid composition and polyimide having excellent processability, excellent mechanical properties, as well as low weight loss and low expansion coefficient against heat due to a high glass transition temperature while having high transparency.
폴리이미드(polyimide, PI) 수지는 방향족 디안하이드라이드와 방향족 디아민 또는 방향족 디이소시아네이트를 중합하여 폴리아믹산 유도체를 제조한 후, 경화에 의한 이미드화를 통해 제조된다.Polyimide (PI) resin is prepared by polymerization of aromatic dianhydride and aromatic diamine or aromatic diisocyanate to prepare a polyamic acid derivative, followed by imidization by curing.
폴리이미드는 강직한 방향족 주쇄를 기본으로 하여 우수한 열적 안정성 가진다. 다만, 이러한 방향족 주쇄에 의한 높은 열적 안정성의 반대 급부로서 투명성은 그만큼 떨어져 전자재료 분야, 특히 높은 투명성을 요구하는 디스플레이 분야에 사용하기에는 한계가 있다. Polyimide has excellent thermal stability based on a rigid aromatic backbone. However, as a counterweight to the high thermal stability due to the aromatic main chain, the transparency is so low that there is a limit to use in the electronic material field, especially in the display field requiring high transparency.
본 발명은 폴리이미드를 구성하는 디안하이드라이드 단량체 성분 및/또는 디아민 성분의 일부로서 방향족 고리를 1 내지 2개 가지는 화합물 이외에 특수한 형태의 방향족성을 가지는 화합물을 포함하고, 이들의 함량을 최적화함으로써, 투명도가 높으면서도 열적 특성이 우수한 폴리아믹산 조성물 및 폴리이미드를 제공할 수 있다.The present invention includes a compound having a special type of aromaticity in addition to a compound having 1 to 2 aromatic rings as a part of the dianhydride monomer component and / or diamine component constituting the polyimide, and by optimizing their content, A polyamic acid composition and polyimide having high transparency and excellent thermal properties can be provided.
또한, 본 발명은 폴리이미드 전구체와 상용성이 우수하면서도 친환경적이고, 분산성이 우수한 용매를 사용함으로써, 공정성이 우수한 효과를 가진다.In addition, the present invention has an effect of excellent processability by using a solvent having excellent compatibility with the polyimide precursor, being environmentally friendly, and having excellent dispersibility.
특히, 본 발명은 폴리이미드의 열적 특성을 판단하는 기준으로 주로 이용되는 열팽창 계수(CTE) 및 열분해 온도(Td) 외에도 열적 특성을 예측할 수 있으면서도 기계적 특성 또한 담도할 수 있는 유리전이온도(Tg)에 주목하였다.In particular, in addition to the coefficient of thermal expansion (CTE) and thermal decomposition temperature (Td), which are mainly used as criteria for determining the thermal properties of polyimide, the present invention is based on the glass transition temperature (Tg), which can predict thermal properties and also reflect mechanical properties. noticed.
본 발명은 유리전이온도가 폴리이미드를 구성하는 방향족 주쇄의 강직성과 가교 밀도에 영향을 받는다는 것을 이용하여 유리전이온도를 높은 수준으로 유지하여 열적 특성 및 기계적 특성의 큰 감소 없이도 높은 투명성을 가지는 폴리아믹산 조성물 및 폴리이미드를 제공할 수 있다. The present invention maintains the glass transition temperature at a high level by taking advantage of the fact that the glass transition temperature is affected by the rigidity and crosslinking density of the aromatic main chain constituting the polyimide, thereby maintaining high transparency of the polyamic acid without significant reduction in thermal and mechanical properties. compositions and polyimides can be provided.
본 발명에서 폴리이미드 전구체는 폴리아믹산 조성물 중 용매를 제외한 디안하이드라이드 및 디아민을 의미할 수 있다.In the present invention, the polyimide precursor may mean dianhydride and diamine excluding the solvent in the polyamic acid composition.
본 발명은 폴리아믹산 조성물에 관한 것이다. 상기 폴리아믹산 조성물은 디안하이드라이드 단량체 성분과 디아민 단량체 성분으로부터 유도된 중합 단위를 갖는 폴리아믹산 및 용매를 포함한다.The present invention relates to a polyamic acid composition. The polyamic acid composition includes a polyamic acid having a polymerization unit derived from a dianhydride monomer component and a diamine monomer component, and a solvent.
이때, 상기 디안하이드라이드 단량체 성분 및 디아민 단량체 성분 중 적어도 하나의 단량체 성분은 플루오렌 골격을 갖는 화합물을 포함할 수 있다. At this time, at least one of the dianhydride monomer component and the diamine monomer component may include a compound having a fluorene skeleton.
상기 플루오렌 골격은 디안하이드라이드 단량체 성분 및/또는 디아민 단량체 성분의 주쇄와 전자의 이동에 의한 공명효과가 발생하지 않는 것일 수 있다. The fluorene skeleton may not generate a resonance effect due to electron transfer with the main chain of the dianhydride monomer component and/or the diamine monomer component.
구체적으로, 상기 디안하이드라이드 단량체 성분은 플루오렌 골격을 갖는 화합물을 포함할 수 있으며, 디안하이드라이드 단량체 성분 중 플루오렌 골격을 갖는 화합물은, 9,9-비스(3,4-디카르복시페닐)플루오렌 디안하이드라이드(BPAF) 또는 4,4'-(9H-플루오렌-9,9 디일)비스(4,1-페닐렌))비스(4-아미노벤즈아미드)(FDA-ADA)일 수 있다. Specifically, the dianhydride monomer component may include a compound having a fluorene skeleton, and the compound having a fluorene skeleton among the dianhydride monomer components is 9,9-bis(3,4-dicarboxyphenyl) Can be fluorene dianhydride (BPAF) or 4,4'-(9H-fluorene-9,9 diyl)bis(4,1-phenylene))bis(4-aminobenzamide) (FDA-ADA) there is.
또한, 상기 디아민 단량체 성분은 플루오렌 골격을 갖는 화합물을 포함할 수 있으며, 디아민 단량체 성분 중 플루오렌 골격을 갖는 화합물은 9,9'-비스(4-아미노페닐)플루오렌(BAFL) 또는 9,9-비스(4-아미노-3플루오르페닐)플루오렌(FFDA)일 수 있다.In addition, the diamine monomer component may include a compound having a fluorene skeleton, and among the diamine monomer components, the compound having a fluorene skeleton is 9,9'-bis(4-aminophenyl)fluorene (BAFL) or 9, 9-bis(4-amino-3fluorophenyl)fluorene (FFDA).
본 발명은 상기 디안하이드라이드 단량체 성분 및 디아민 단량체 성분 중 적어도 하나의 단량체 성분으로 플루오렌 골격을 갖는 화합물을 포함함으로써, 높은 투명도를 가질 수 있다. 이는 플루오렌 골격을 갖는 화합물의 도입에 의해 두께방향의 위상차가 감소함에 따라 높은 투명도를 가지는 것일 수 있다. 또한, 상기 플루오렌 골격은 디안하이드라이드 단량체 성분 및/또는 디아민 단량체 성분의 주쇄와 전자의 이동(또는 여기)에 의한 공명효과가 발생하지 않고 이에 따라, 폴리이미드 전구체 전체 공명효과가 낮아지는 것에 의해 투명도가 증가하는 것일 수 있다. The present invention can have high transparency by including a compound having a fluorene skeleton as at least one of the dianhydride monomer component and the diamine monomer component. This may have high transparency as the retardation in the thickness direction is reduced by the introduction of a compound having a fluorene skeleton. In addition, the fluorene skeleton does not generate a resonance effect due to the transfer (or excitation) of electrons with the main chain of the dianhydride monomer component and/or the diamine monomer component, and thus, the overall resonance effect of the polyimide precursor is lowered. It may be that the transparency increases.
상기 플루오렌 골격을 갖는 화합물은 폴리이미드 전구체에 대하여 30몰% 미만일 수 있다. 바람직하게, 상기 플루오렌 골격을 갖는 화합물은 디안하이드라이드 단량체 성분 및 디아민 단량체 성분 전체에 대하여 25몰% 미만일 수 있다. 예를 들어, 상기 플루오렌 골격을 갖는 화합물의 함량 상한은 디안하이드라이드 단량체 성분 및 디아민 단량체 성분 전체에 대하여 24몰% 미만, 23몰% 미만, 22몰% 미만, 21몰% 미만, 20 몰% 미만, 19몰% 미만, 18몰% 미만, 17몰% 미만, 16몰% 미만, 15몰% 미만, 14몰% 미만, 13몰% 미만, 12몰% 미만, 11몰% 미만, 10몰% 미만, 9몰% 미만, 8몰% 미만 또는 7몰% 미만일 수 있으며, 하한은 0.01몰% 초과, 0.05몰% 초과, 0.9몰% 초과, 1몰% 초과, 2몰% 초과, 3몰% 초과 또는 4몰% 초과일 수 있다. 구체적으로, 상기 플루오렌 골격을 갖는 화합물은 폴리이미드 전구체 전체에 대하여 0.5몰% 내지 30몰%, 0.6몰% 내지 25몰%, 0.7몰% 내지 23몰%, 3몰% 내지 10몰%, 3몰% 내지 9몰% 또는 3몰% 내지 7몰%일 수 있다.The amount of the compound having a fluorene skeleton may be less than 30 mol% with respect to the polyimide precursor. Preferably, the amount of the compound having a fluorene skeleton may be less than 25 mol% based on the total amount of the dianhydride monomer component and the diamine monomer component. For example, the upper limit of the content of the compound having a fluorene skeleton is less than 24 mol%, less than 23 mol%, less than 22 mol%, less than 21 mol%, less than 20 mol% with respect to the total dianhydride monomer component and diamine monomer component Less than 19 mol%, less than 18 mol%, less than 17 mol%, less than 16 mol%, less than 15 mol%, less than 14 mol%, less than 13 mol%, less than 12 mol%, less than 11 mol%, 10 mol% less than 9 mol%, less than 8 mol% or less than 7 mol%, with lower limits greater than 0.01 mol%, greater than 0.05 mol%, greater than 0.9 mol%, greater than 1 mol%, greater than 2 mol%, greater than 3 mol% or greater than 4 mol%. Specifically, the compound having a fluorene skeleton is 0.5 mol% to 30 mol%, 0.6 mol% to 25 mol%, 0.7 mol% to 23 mol%, 3 mol% to 10 mol%, 3 mol% to 10 mol%, based on the total polyimide precursor. mol % to 9 mol % or 3 mol % to 7 mol %.
상기 디안하이드라이드 단량체 성분 중 플루오렌 골격을 갖는 화합물의 함량은 15몰% 미만일 수 있으며, 예를 들어, 상기 디안하이드라이드 단량체 성분 중 플루오렌 골격을 갖는 화합물의 함량의 상한은 14몰% 미만, 13몰% 미만, 12몰% 미만, 11몰% 미만, 10몰% 미만, 9몰% 미만, 8몰% 미만, 7몰% 미만 또는 6몰% 미만일 수 있으며, 하한은 0.01몰% 초과, 0.05몰% 초과, 0.9몰 % 초과, 1몰% 초과, 2몰% 초과, 3몰% 초과 또는 4몰% 초과일 수 있다. 구체적으로, 상기 디안하이드라이드 단량체 성분 중 플루오렌 골격을 갖는 화합물은 폴리이미드 전구체에 대하여 1몰% 내지 10몰%, 3몰% 내지 10몰%, 3몰% 내지 9몰% 또는 3몰% 내지 7몰%일 수 있다.The content of the compound having a fluorene skeleton in the dianhydride monomer component may be less than 15 mol%, for example, the upper limit of the content of the compound having a fluorene skeleton in the dianhydride monomer component is less than 14 mol%, less than 13 mol%, less than 12 mol%, less than 11 mol%, less than 10 mol%, less than 9 mol%, less than 8 mol%, less than 7 mol% or less than 6 mol%, with lower limits greater than 0.01 mol% and 0.05 mol%. greater than mol %, greater than 0.9 mol %, greater than 1 mol %, greater than 2 mol %, greater than 3 mol % or greater than 4 mol %. Specifically, the compound having a fluorene skeleton among the dianhydride monomer components is 1 mol% to 10 mol%, 3 mol% to 10 mol%, 3 mol% to 9 mol%, or 3 mol% to 3 mol% with respect to the polyimide precursor 7 mol%.
상기 디아민 단량체 성분 중 플루오렌 골격을 갖는 화합물의 함량은 15몰% 미만일 수 있으며, 예를 들어, 상기 디아민 단량체 성분 중 플루오렌 골격을 갖는 화합물의 함량의 상한은 14몰% 미만, 13몰% 미만, 12몰% 미만, 11몰% 미만, 10몰% 미만, 9몰% 미만, 8몰% 미만, 7몰% 미만 또는 6몰% 미만일 수 있으며, 하한은 0.01몰% 초과, 0.05몰% 초과, 1몰% 초과, 2몰% 초과, 3몰% 초과 또는 4몰% 초과일 수 있다. 구체적으로, 상기 디아민 단량체 성분 중 플루오렌 골격을 갖는 화합물은 폴리이미드 전구체에 대하여 1몰% 내지 10몰%, 3몰% 내지 10몰%, 3몰% 내지 9몰% 또는 3몰% 내지 7몰%일 수 있다.The content of the compound having a fluorene skeleton in the diamine monomer component may be less than 15 mol%, for example, the upper limit of the content of the compound having a fluorene skeleton in the diamine monomer component is less than 14 mol%, less than 13 mol% , less than 12 mol%, less than 11 mol%, less than 10 mol%, less than 9 mol%, less than 8 mol%, less than 7 mol% or less than 6 mol%, with lower limits greater than 0.01 mol%, greater than 0.05 mol%, It may be greater than 1 mol%, greater than 2 mol%, greater than 3 mol% or greater than 4 mol%. Specifically, the compound having a fluorene skeleton among the diamine monomer components is 1 mol% to 10 mol%, 3 mol% to 10 mol%, 3 mol% to 9 mol%, or 3 mol% to 7 mol% based on the polyimide precursor may be %.
플루오렌 골격을 갖는 화합물은 경화 후 폴리이미드의 높은 투명도에 기여할 수 있으나, 기계적 강도 및 열적 특성을 약화시킨다. 구체적으로, 폴리아믹산 조성물에서 플루오렌 골격을 갖는 화합물의 함량이 증가하면, 경화된 폴리아미드는 기계적 강도가 저하되고, 열팽창 계수가 높아지며 열분해 온도가 낮아져 기계적 및 열적 특성이 저하된다. 따라서, 본 발명은 플루오렌 골격을 갖는 화합물의 함량을 상기 범위와 같이 제한함으로써, 높은 투명성을 가지면서도 기계적 강도 및 열적 특성이 저하되는 것을 방지할 수 있다. 특히, 플루오렌 골격을 갖는 화합물의 함량이 상기 범위를 가지는 경우, 유리전이온도의 급격한 저하를 방지할 수 있는 방향족 주쇄의 강직성과 가교 밀도를 유지할 수 있기 때문에, 경화 후 기계적 강도 및 열적 특성의 저하를 최소화할 수 있다. A compound having a fluorene skeleton can contribute to high transparency of polyimide after curing, but weakens mechanical strength and thermal properties. Specifically, when the content of the compound having a fluorene skeleton in the polyamic acid composition increases, the mechanical strength and thermal expansion coefficient of the cured polyamide decrease, and the thermal decomposition temperature decreases, resulting in deterioration in mechanical and thermal properties. Therefore, in the present invention, by limiting the content of the compound having a fluorene skeleton to the above range, it is possible to prevent deterioration of mechanical strength and thermal properties while having high transparency. In particular, when the content of the compound having a fluorene skeleton is within the above range, the rigidity and crosslinking density of the aromatic main chain, which can prevent a rapid decrease in glass transition temperature, can be maintained, so that after curing, mechanical strength and thermal properties are lowered can be minimized.
구체적으로, 본 발명에 따른 폴리아믹산 조성물의 경화 후 유리전이온도는 430℃이상이다. 예를 들어, 본 발명에 따른 폴리아믹산 조성물의 경화 후 유리전이 온도는 435℃이상, 440℃이상, 445℃이상, 450℃이상, 455℃이상, 460℃이상, 465℃이상 또는 470℃이상일 수 있으며, 상한은 특별히 제한되지 않으나, 600℃이하 또는 500℃이하일 수 있다.Specifically, the glass transition temperature after curing of the polyamic acid composition according to the present invention is 430 °C or higher. For example, the glass transition temperature of the polyamic acid composition according to the present invention after curing may be 435 ° C or higher, 440 ° C or higher, 445 ° C or higher, 450 ° C or higher, 455 ° C or higher, 460 ° C or higher, 465 ° C or higher or 470 ° C or higher. And, the upper limit is not particularly limited, but may be 600 ℃ or less or 500 ℃ or less.
본 발명은 상기와 같은 유리전이온도를 가짐으로써, 폴리아믹산 조성물의 경화 후 기계적 강도 및 열적 특성의 저하를 최소화할 수 있으며, 열 변형에 의한 유동성이 최소화되며, 이에 따라 공정성이 향상될 수 있다. In the present invention, by having the glass transition temperature as described above, it is possible to minimize deterioration in mechanical strength and thermal properties after curing of the polyamic acid composition, minimize flowability due to thermal deformation, and thus improve processability.
상기 플루오렌 골격을 갖는 화합물 이외의 디안하이드라이드 단량체 성분 및 디아민 단량체 성분은 각각 벤젠고리를 1개 또는 2개 이상 갖는 화합물을 포함하는 것일 수 있다. 구체적으로, 상기 플루오렌 골격을 갖는 화합물 이외의 디안하이드라이드 단량체 성분 및 디아민 단량체 성분은 각각 벤젠고리를 1개 또는 2개 갖는 화합물을 포함하는 것일 수 있다.The dianhydride monomer component and the diamine monomer component other than the compound having a fluorene skeleton may each include a compound having one or two or more benzene rings. Specifically, the dianhydride monomer component and the diamine monomer component other than the compound having a fluorene skeleton may each include a compound having one or two benzene rings.
디안하이드라이드 단량체 성분 중 벤젠고리를 1개 또는 2개 갖는 화합물은, 피로멜리틱 디안하이드라이드(PMDA), 3,3',4,4'-바이페닐테트라카르복실릭 디안하이드라이드(s-BPDA), 2,3,3',4'-바이페닐테트라카르복실릭 디안하이드라이드(a-BPDA), 3,3',4,4'-벤조페논테트라카르복실릭 디안하이드라이드(BTDA), 옥시디프탈릭 디안하이드라이드(ODPA) 및 4,4-(헥사플루오르이소프로필리덴)디프탈릭 안하이드라이드(6-FDA)로 이루어진 군에서 선택된 적어도 하나일 수 있다.Among the dianhydride monomer components, compounds having one or two benzene rings are pyromellitic dianhydride (PMDA), 3,3',4,4'-biphenyltetracarboxylic dianhydride (s- BPDA), 2,3,3',4'-biphenyltetracarboxylic dianhydride (a-BPDA), 3,3',4,4'-benzophenonetetracarboxylic dianhydride (BTDA) , It may be at least one selected from the group consisting of oxydiphthalic dianhydride (ODPA) and 4,4-(hexafluoroisopropylidene)diphthalic anhydride (6-FDA).
구체적으로, 상기 플루오렌 골격을 갖는 화합물 이외의 디안하이드라이드 단량체 성분은 벤젠고리를 2개 갖는 화합물을 포함할 수 있으며, 디안하이드라이드 단량체 성분으로 벤젠고리를 2개 갖는 화합물은, 3,3',4,4'-바이페닐테트라카르복실릭 디안하이드라이드(s-BPDA), 2,3,3',4'-바이페닐테트라카르복실릭 디안하이드라이드(a-BPDA), 3,3',4,4'-벤조페논테트라카르복실릭 디안하이드라이드(BTDA), 옥시디프탈릭 디안하이드라이드(ODPA) 및 4,4-(헥사플루오르이소프로필리덴)디프탈릭 안하이드라이드(6-FDA)로 이루어진 군에서 선택된 적어도 하나일 수 있다.Specifically, the dianhydride monomer component other than the compound having a fluorene skeleton may include a compound having two benzene rings, and the compound having two benzene rings as the dianhydride monomer component is 3,3' ,4,4'-biphenyltetracarboxylic dianhydride (s-BPDA), 2,3,3',4'-biphenyltetracarboxylic dianhydride (a-BPDA), 3,3' ,4,4'-benzophenonetetracarboxylic dianhydride (BTDA), oxydiphthalic dianhydride (ODPA) and 4,4-(hexafluoroisopropylidene)diphthalic anhydride (6-FDA) It may be at least one selected from the group consisting of.
플루오렌 골격을 갖는 화합물 이외의 디안하이드라이드 단량체 성분으로 벤젠고리를 2개 갖는 화합물을 포함함으로써, 폴리아믹산 조성물의 경화 후 투명도를 향상시킬 수 있으며, 상기 플루오렌 골격을 갖는 화합물과의 우수한 상용성으로 용매 분산성이 향상될 수 있다. 또한, 벤젠고리를 2개 포함함으로써 유리전이온도의 급격한 저하를 방지할 수 있다.By including a compound having two benzene rings as a dianhydride monomer component other than a compound having a fluorene skeleton, transparency after curing of the polyamic acid composition can be improved, and excellent compatibility with the compound having the fluorene skeleton As a result, solvent dispersibility can be improved. In addition, by including two benzene rings, it is possible to prevent a rapid decrease in glass transition temperature.
이때, 상기 벤젠고리를 1개 또는 2개 갖는 디안하이드라이드 단량체 성분은 디안하이드라이드 단량체 성분 중 80몰% 이상의 비율로 포함할 수 있다. 예를 들어, 디안하이드라이드 단량체 성분 중 벤젠고리를 1개 또는 2개 갖는 디안하이드라이드 단량체 성분 비율의 하한은 82몰% 이상, 84몰% 이상, 86몰% 이상 또는 88몰% 이상일 수 있으며, 상한은 99.9몰% 이하, 99.5몰% 이하, 99몰% 이하 또는 98몰% 이하 일 수 있다.In this case, the dianhydride monomer component having one or two benzene rings may be included in an amount of 80 mol% or more of the dianhydride monomer component. For example, the lower limit of the ratio of the dianhydride monomer component having one or two benzene rings among the dianhydride monomer components may be 82 mol% or more, 84 mol% or more, 86 mol% or more, or 88 mol% or more, The upper limit may be 99.9 mol% or less, 99.5 mol% or less, 99 mol% or less, or 98 mol% or less.
상기 디아민 단량체 성분 중 벤젠고리를 1개 또는 2개 갖는 화합물은, 1,4-디아미노벤젠(PPD), 1,3-디아미노벤젠(MPD), 2,4-디아미노톨루엔, 2,6-디아미노톨루엔, 4,4'-디아미노디페닐에테르(ODA), 4,4-디아미노벤즈아닐라이드(4,4-DABA), 2,2-디메틸벤지딘(M-TOLIDINE), 3,3-디메틸벤지딘(O-TOLIDINE) 및 2,2'-비스트리플루오르메틸벤지딘(TFMB)으로 이루어진 군에서 선택된 적어도 하나일 수 있다.Compounds having one or two benzene rings among the diamine monomer components are 1,4-diaminobenzene (PPD), 1,3-diaminobenzene (MPD), 2,4-diaminotoluene, 2,6 -Diaminotoluene, 4,4'-diaminodiphenyl ether (ODA), 4,4-diaminobenzanilide (4,4-DABA), 2,2-dimethylbenzidine (M-TOLIDINE), 3, It may be at least one selected from the group consisting of 3-dimethylbenzidine (O-TOLIDINE) and 2,2'-bistrifluoromethylbenzidine (TFMB).
구체적으로, 상기 플루오렌 골격을 갖는 화합물 이외의 디아민 단량체 성분은 벤젠고리를 1개 갖는 화합물일 수 있으며, 디아민 단량체 성분으로 벤젠고리를 1개 갖는 화합물은, 1,4-디아미노벤젠(PPD), 1,3-디아미노벤젠(MPD), 2,4-디아미노톨루엔 및 2,6-디아미노톨루엔으로 이루어진 군에서 선택된 적어도 하나일 수 있다.Specifically, the diamine monomer component other than the compound having a fluorene skeleton may be a compound having one benzene ring, and the compound having one benzene ring as the diamine monomer component is 1,4-diaminobenzene (PPD) , It may be at least one selected from the group consisting of 1,3-diaminobenzene (MPD), 2,4-diaminotoluene and 2,6-diaminotoluene.
플루오렌 골격을 갖는 화합물 이외의 디아민 단량체 성분으로 벤젠고리를 1개 갖는 화합물을 포함함으로써, 폴리아믹산 조성물의 경화 후 투명도를 향상시킬 수 있으며, 상기 플루오렌 골격을 갖는 화합물과의 우수한 상용성으로 용매 분산성이 향상될 수 있다. 또한, 벤젠고리를 1개 포함함으로써 유리전이온도의 급격한 저하를 방지할 수 있다.By including a compound having one benzene ring as a diamine monomer component other than a compound having a fluorene skeleton, transparency after curing of the polyamic acid composition can be improved, and excellent compatibility with the compound having a fluorene skeleton makes it possible to use a solvent Dispersibility can be improved. In addition, by including one benzene ring, a rapid decrease in glass transition temperature can be prevented.
이때, 상기 벤젠고리를 1개 또는 2개 갖는 디아미 단량체 성분은 디아민 단량체 성분 중 80몰% 이상의 비율로 포함할 수 있다. 예를 들어, 디아민 단량체 성분 중 벤젠고리를 1개 또는 2개 갖는 디아민 단량체 성분 비율의 하한은 82몰% 이상, 84몰% 이상, 86몰% 이상 또는 88몰% 이상일 수 있으며, 상한은 99.9몰% 이하, 99.5몰% 이하, 99몰% 이하 또는 98몰% 이하 일 수 있다.In this case, the diamine monomer component having one or two benzene rings may be included in an amount of 80 mol% or more of the diamine monomer component. For example, the lower limit of the ratio of the diamine monomer component having one or two benzene rings among the diamine monomer components may be 82 mol% or more, 84 mol% or more, 86 mol% or more, or 88 mol% or more, and the upper limit is 99.9 mol%. % or less, 99.5 mol% or less, 99 mol% or less, or 98 mol% or less.
본 발명에 따른 폴리아믹산 조성물은 용매를 포함하며, 상기 용매는 유기 용매일 수 있다. 상기 폴리이미드 전구체와 상용성이 좋은 용매로는 N,N-디에틸아세트아미드(DEAC), N,N-디메틸프로피온아미드(DMPA), 3-메톡시-N,N-디메틸프로판아미드(KJCMPA) 또는 N-메틸-2-피롤리돈(NMP) 이들의 조합에서 선택된 적어도 하나를 선택할 수 있다.The polyamic acid composition according to the present invention includes a solvent, and the solvent may be an organic solvent. Solvents compatible with the polyimide precursor include N,N-diethylacetamide (DEAC), N,N-dimethylpropionamide (DMPA), 3-methoxy-N,N-dimethylpropanamide (KJCMPA) Alternatively, N-methyl-2-pyrrolidone (NMP) may be selected from at least one selected from combinations thereof.
또한, 본 발명에 따른 폴리아믹산 조성물의 용매는 끓는점이 150℃이상일 수 있다. 예를 들어, 폴리아믹산 조성물의 용매는 끓는점이 160℃이상 또는 170℃이상일 수 있다. 구체적으로, 상기 용매의 비점의 하한은 예를 들어, 155℃, 160℃, 165℃, 170℃, 175℃, 180℃, 185℃, 190℃, 195℃, 200℃ 또는 201℃ 이상일 수 있고, 상한은 예를 들어, 500℃, 450℃, 300℃, 280℃, 270℃, 250℃, 240℃, 230℃, 220℃, 210℃ 또는 205℃ 이하일 수 있다. 상기와 같은 비점을 가짐으로써, 경화 시 물과 용매의 분리가 용이할 수 있다. In addition, the solvent of the polyamic acid composition according to the present invention may have a boiling point of 150°C or higher. For example, the solvent of the polyamic acid composition may have a boiling point of 160°C or higher or 170°C or higher. Specifically, the lower limit of the boiling point of the solvent may be, for example, 155 ° C, 160 ° C, 165 ° C, 170 ° C, 175 ° C, 180 ° C, 185 ° C, 190 ° C, 195 ° C, 200 ° C or 201 ° C or higher, The upper limit may be, for example, 500°C, 450°C, 300°C, 280°C, 270°C, 250°C, 240°C, 230°C, 220°C, 210°C or 205°C or less. By having the boiling point as described above, separation of water and solvent may be facilitated during curing.
본 발명에 따른 폴리이미드 전구체는 플루오렌 골격을 갖는 화합물을 포함하므로, 특히 이와 상용성이 좋은 아마이드계 유기 용매인 N,N-디에틸아세트아미드(DEAC) 또는 N,N-디메틸프로피온아미드(DMPA)를 사용할 수 있다. 상기와 같은 용매를 사용함으로써, 백탁 현상을 최소화하고, 폴리이미드 전구체의 분산성을 향상시킬 수 있다. Since the polyimide precursor according to the present invention includes a compound having a fluorene skeleton, N,N-diethylacetamide (DEAC) or N,N-dimethylpropionamide (DMPA), an amide-based organic solvent that is particularly compatible therewith, ) can be used. By using the solvent as described above, it is possible to minimize cloudiness and improve the dispersibility of the polyimide precursor.
본 발명에 따른 폴리아믹산 조성물은 고형분이 5 내지 30중량%의 범위 내일 수 있다. 상기 고형분 함량은 7 중량% 이상, 9 중량% 이상, 10 중량% 이상, 12 중량% 이상, 14 중량% 이상, 또는 15 중량% 이상일 수 있고, 상한은 예를 들어, 30 중량% 이하, 25 중량% 이하, 20 중량% 이하, 18 중량% 이하, 17 중량% 이하 또는 15 중량% 이하일 수 있다. 본 출원은 상기 범위 내에서 목적하는 물성과 점도를 구현할 수 있다.The polyamic acid composition according to the present invention may have a solid content in the range of 5 to 30% by weight. The solid content may be 7% by weight or more, 9% by weight or more, 10% by weight or more, 12% by weight or more, 14% by weight or more, or 15% by weight or more, and the upper limit is, for example, 30% by weight or less, 25% by weight or less % or less, 20% or less, 18% or less, 17% or less or 15% or less. The present application can implement the desired physical properties and viscosity within the above range.
상기 디안하이드라이드 단량체 성분과 디아민 단량체 성분을 중합 하는 방법은 용액 중합 등 통상의 폴리이미드 전구체 중합 방법을 이용할 수 있다. As a method of polymerizing the dianhydride monomer component and the diamine monomer component, a conventional polyimide precursor polymerization method such as solution polymerization may be used.
예를 들어, (1) 디아민 단량체 전량을 용매 중에 넣고, 그 후 디안하이드라이드 단량체를 디아민 단량체와 실질적으로 등몰이 되도록 첨가하여 중합하는 방법;For example, (1) a method in which the entire amount of the diamine monomer is placed in a solvent, and then a dianhydride monomer is added so as to be substantially equimolar to the diamine monomer to polymerize;
(2) 디안하이드라이드 단량체 전량을 용매 중에 넣고, 그 후 디아민 단량체를 디안하이드라이드 단량체와 실질적으로 등몰이 되도록 첨가하여 중합하는 방법;(2) a method in which the entire amount of the dianhydride monomer is placed in a solvent, and then a diamine monomer is added so as to be substantially equimolar to the dianhydride monomer to polymerize;
(3) 디아민 단량체 중 일부 성분을 용매 중에 넣은 후, 반응 성분에 대해서 디안하이드라이드 단량체 중 일부 성분을 혼합한 후, 나머지 디아민 단량체 성분을 첨가하고 이에 연속해서 나머지 디안하이드라이드 단량체 성분을 첨가하여, 디아민 단량체 및 디안하이드라이드 단량체가 실질적으로 등몰이 되도록 하여 중합하는 방법;(3) After putting some components of the diamine monomers in a solvent, mixing some of the components of the dianhydride monomers with respect to the reaction components, adding the remaining diamine monomer components and subsequently adding the remaining dianhydride monomer components, a method of polymerizing the diamine monomer and the dianhydride monomer so that they are substantially equimolar;
(4) 디안하이드라이드 단량체를 용매 중에 넣은 후, 반응 성분에 대해서 디아민 화합물 중 일부 성분을 혼합한 후, 다른 디안하이드라이드 단량체 성분을 첨가하고 계속되어 나머지 디아민 단량체 성분을 첨가하여, 디아민 단량체 및 디안하이드라이드 단량체가 실질적으로 등몰이 되도록 하여 중합하는 방법 등을 들 수 있다.(4) After putting the dianhydride monomer in a solvent, mixing some components of the diamine compound with respect to the reaction components, adding other dianhydride monomer components, and then adding the remaining diamine monomer components, followed by diamine monomer and dianane. and a method of polymerizing the hydride monomers so that they are substantially equimolar.
본 발명에 따른 폴리아믹산 조성물은 경화 후 열팽창계수(CTE)가 20 ppm/℃ 이하의 범위를 가질 수 있다. 예를 들어, 상기 CTE의 상한은 20 ppm/℃, 18 ppm/℃, 16 ppm/℃, 14 ppm/℃, 12 ppm/℃, 10 ppm/℃ 또는 8 ppm/℃ 이하일 수 있고, 하한은 예를 들어, 0.1 ppm/℃, 1 ppm/℃, 2.0 ppm/℃, 2.6 ppm/℃, 2.8 ppm/℃, 3.5 ppm/℃ 또는 4 ppm/℃ 이상일 수 있다. 하나의 예에서, 상기 열팽창계수는 100 내지 400℃에서 측정한 것일 수 있다. 상기 CTE는 TA사 열기계 분석기(thermomechanical analyzer) Q400 모델을 사용할 수 있으며, 폴리이미드를 필름화 제조하여 폭 2 mm, 길이 10 mm로 자른 후 질소 분위기하에서 0.05 N의 장력을 가하면서, 10℃/min의 속도로 상온에서 500℃까지 승온 후 다시 10℃/min의 속도로 냉각하면서 100℃에서 400℃ 구간의 기울기를 측정할 수 있다.The polyamic acid composition according to the present invention may have a coefficient of thermal expansion (CTE) of 20 ppm/°C or less after curing. For example, the upper limit of the CTE may be 20 ppm/°C, 18 ppm/°C, 16 ppm/°C, 14 ppm/°C, 12 ppm/°C, 10 ppm/°C or 8 ppm/°C or less, and the lower limit may be, for example, For example, it may be at least 0.1 ppm/°C, 1 ppm/°C, 2.0 ppm/°C, 2.6 ppm/°C, 2.8 ppm/°C, 3.5 ppm/°C or 4 ppm/°C. In one example, the thermal expansion coefficient may be measured at 100 to 400 °C. The CTE can use TA's thermomechanical analyzer Q400 model, and after manufacturing polyimide into a film, cutting it into a width of 2 mm and a length of 10 mm, applying a tension of 0.05 N in a nitrogen atmosphere, 10 ° C / After raising the temperature from room temperature to 500 ° C at a rate of min, the slope of the 100 ° C to 400 ° C section can be measured while cooling again at a rate of 10 ° C / min.
본 출원에 따른 폴리아믹산 조성물은 일 예시에서, 경화 후의 유리전이온도가 430℃ 이상의 범위를 가질 수 있으며 예를 들어, 상기 유리전이온도의 하한은 440℃ 이상, 445℃ 이상, 450℃ 이상, 455℃ 이상 또는 460℃ 이상일 수 있다. 상한은 600℃ 이하일 수 있다. 상기 유리전이온도는 폴리아믹산 조성물을 경화하여 제조된 폴리이미드에 대해 TMA를 이용하여 10℃/min 조건에서 측정할 수 있다.In one example, the polyamic acid composition according to the present application may have a glass transition temperature of 430° C. or more after curing, and for example, the lower limit of the glass transition temperature is 440° C. or more, 445° C. or more, 450° C. or more, or 455° C. °C or higher or 460 °C or higher. The upper limit may be 600° C. or less. The glass transition temperature may be measured at 10 °C/min using TMA for polyimide prepared by curing the polyamic acid composition.
본 출원에 따른 폴리아믹산 조성물은 경화 후 1중량% 열분해온도가 540°C 이상일 수 있다. 상기 열분해온도는 TA사 열무게 분석(thermogravimetric analysis) Q50 모델을 사용하여 측정할 수 있다. 구체예에서, 상기 폴리아믹산을 경화한 폴리이미드를 질소 분위기하에서 10℃/분의 속도로 150℃까지 승온시킨 후 30 분간 등온을 유지하여 수분을 제거한다. 이후 10℃/분의 속도로 600℃까지 승온하여 1%의 중량 감소가 발생하는 온도를 측정할 수 있다. 상기 열분해온도의 하한은 예를 들어, 550℃ 이상, 555℃ 이상, 560℃ 이상 또는 565℃ 이상일 수 있다. 상한은 예를 들어, 800℃, 750℃, 700℃, 650℃ 또는 630℃ 이하일 수 있다.The polyamic acid composition according to the present application may have a thermal decomposition temperature of 1% by weight after curing of 540 ° C or higher. The thermal decomposition temperature can be measured using TA's thermogravimetric analysis Q50 model. In a specific embodiment, the polyimide obtained by curing the polyamic acid is heated to 150° C. at a rate of 10° C./min under a nitrogen atmosphere and maintained at an isothermal temperature for 30 minutes to remove moisture. Thereafter, the temperature may be raised to 600° C. at a rate of 10° C./min to measure the temperature at which a weight loss of 1% occurs. The lower limit of the thermal decomposition temperature may be, for example, 550 °C or higher, 555 °C or higher, 560 °C or higher, or 565 °C or higher. The upper limit may be, for example, 800°C, 750°C, 700°C, 650°C or 630°C or less.
또한, 본 출원에 따른 폴리아믹산 조성물은 경화 후 가시광선 영역인 470nm에서의 광투과도가 60% 이상일 수 있다. 상기 광투과도는 자외선/가시광선 분광광도계(UV-Vis Spectrophotometer)를 이용하여 측정할 수 있다. 예를 들어, 상기 광투과도는 61% 이상, 62% 이상, 63% 이상, 64% 이상, 65% 이상, 66% 이상, 67% 이상, 68% 이상, 69% 이상, 70% 이상, 71% 이상, 72% 이상, 73% 이상, 74% 이상, 75% 이상, 76% 이상, 77% 이상 또는 80% 이상일 수 있으며, 상한은 특별히 제한되지 않으나 90% 이하 또는 85% 이하일 수 있다.In addition, the polyamic acid composition according to the present application may have light transmittance of 60% or more in a visible light region of 470 nm after curing. The light transmittance can be measured using a UV/Vis spectrophotometer. For example, the light transmittance is 61% or more, 62% or more, 63% or more, 64% or more, 65% or more, 66% or more, 67% or more, 68% or more, 69% or more, 70% or more, 71% It may be 72% or more, 73% or more, 74% or more, 75% or more, 76% or more, 77% or more, or 80% or more, and the upper limit is not particularly limited, but may be 90% or less or 85% or less.
또한, 상기 폴리아믹산 조성물은 경화 후 신율(Elongation)이 15% 이상일 수 있고, 예를 들어, 17% 이상, 19% 이상, 21% 이상, 23% 이상 또는 25% 이상일 수 있다. 상한은 특별히 제한되지 않으나, 40% 이하일 수 있다. 상기 신율은 폴리아믹산 조성물을 폴리이미드 필름으로 경화하여, 폭 10 mm, 길이 40 mm로 자른 후 인스트론(Instron)사의 Instron5564 UTM 장비를 사용하여 ASTM D-882 방법으로 신율을 측정할 수 있다.In addition, the polyamic acid composition may have an elongation of 15% or more after curing, for example, 17% or more, 19% or more, 21% or more, 23% or more, or 25% or more. The upper limit is not particularly limited, but may be 40% or less. The elongation can be measured by the ASTM D-882 method using Instron 5564 UTM equipment after curing the polyamic acid composition into a polyimide film, cutting it into a width of 10 mm and a length of 40 mm.
또한, 본 출원의 폴리아믹산 조성물은 경화 후 탄성률이 6.9GPa 이상일 수 있다. 상기 탄성률의 하한은 예를 들어, 7.0 GPa 이상, 7.1 GPa 이상, 7.2 GPa 이상 또는 7.3 GPa 이상일 수 있다. 상한은 특별히 제한되지 않으나 15 GPa 이하일 수 있다. In addition, the polyamic acid composition of the present application may have an elastic modulus of 6.9 GPa or more after curing. The lower limit of the elastic modulus may be, for example, 7.0 GPa or more, 7.1 GPa or more, 7.2 GPa or more, or 7.3 GPa or more. The upper limit is not particularly limited, but may be 15 GPa or less.
또한, 폴리아믹산 조성물은 경화 후 인장 강도가 230MPa 이상일 수 있다. 상기 인장 강도의 하한은 예를 들어, 240 MPa 이상, 250 MPa 이상, 260 MPa 이상, 270 MPa 이상, 280 MPa 이상, 290 MPa 이상 또는 300 MPa 이상일 수 있고, 상한은 예를 들어, 550 MPa 이하 또는 530 MPa 이하일 수 있다. 상기 탄성률 및 인장 강도는 상기 폴리아믹산 조성물을 경화하여 폴리이미드 필름으로 제조 후, 폭 10 mm, 길이 40 mm로 자른 후 인스트론(Instron)사의 Instron5564 UTM 장비를 사용하여 ASTM D-882 방법으로 탄성률 및 인장 강도를 측정할 수 있다. 이때의 Cross Head Speed는 50 mm/min의 조건으로 측정할 수 있다.In addition, the polyamic acid composition may have a tensile strength of 230 MPa or more after curing. The lower limit of the tensile strength may be, for example, 240 MPa or more, 250 MPa or more, 260 MPa or more, 270 MPa or more, 280 MPa or more, 290 MPa or more or 300 MPa or more, and the upper limit may be, for example, 550 MPa or less or It may be 530 MPa or less. The elastic modulus and tensile strength were measured by the ASTM D-882 method using Instron 5564 UTM equipment after curing the polyamic acid composition to prepare a polyimide film, cutting it into a width of 10 mm and a length of 40 mm, and Tensile strength can be measured. The cross head speed at this time can be measured under the condition of 50 mm/min.
또한, 본 발명은 상기 폴리아믹산 조성물의 제조방법에 따라 제조된 폴리아믹산 조성물을 지지체에 제막하고 건조하여 겔을 제조하고, 상기 겔을 경화하는 단계를 포함하는, 폴리이미드의 제조방법을 제공한다.In addition, the present invention provides a method for producing a polyimide, comprising forming a polyamic acid composition prepared according to the method for producing a polyamic acid composition on a support and drying to prepare a gel, and curing the gel.
구체적으로, 본 발명의 폴리이미드의 제조방법은, 상기 폴리아믹산 조성물을 지지체에 제막하고 건조하여 필름 형태의 겔을 제조하고, 상기 겔을 경화하는 단계를 포함할 수 있다.Specifically, the method for producing a polyimide of the present invention may include forming a film of the polyamic acid composition on a support, drying the film to prepare a gel, and curing the gel.
상기 겔을 경화하는 단계는, 상기 지지체에 제막된 폴리아믹산 조성물을 20 내지 120℃의 온도에서 5 내지 60분 동안 건조하여 겔 필름을 제조하고, 상기 겔 필름을 30 내지 500℃까지 1 내지 8℃/분의 속도로 승온하고, 450 내지 500℃에서 5 내지 60분 동안 열처리하고, 20 내지 120℃까지 1 내지 8℃/분의 속도로 냉각하는 공정을 통해 수행될 수 있다.In the curing of the gel, the polyamic acid composition formed on the support is dried at a temperature of 20 to 120 ° C for 5 to 60 minutes to prepare a gel film, and the gel film is heated from 1 to 8 ° C to 30 to 500 ° C. /min, heat treatment at 450 to 500 ° C for 5 to 60 minutes, and cooling to 20 to 120 ° C at a rate of 1 to 8 ° C / min.
상기 겔 필름을 경화하는 단계는 30 내지 500℃에서 수행될 수 있다. 예를 들어, 상기 겔 필름을 경화하는 단계는 30 내지 400℃, 30 내지 300℃, 30 내지 200℃, 30 내지 100℃, 100 내지 500℃, 100 내지 300℃, 200 내지 500℃ 또는 400 내지 500℃에서 수행될 수 있다.Curing the gel film may be performed at 30 to 500 °C. For example, the step of curing the gel film is 30 to 400 ° C, 30 to 300 ° C, 30 to 200 ° C, 30 to 100 ° C, 100 to 500 ° C, 100 to 300 ° C, 200 to 500 ° C, or 400 to 500 ° C. may be performed at °C.
상기 폴리이미드 필름의 두께는 5 내지 20 ㎛인 것을 특징으로 할 수 있다. 예를 들어, 상기 폴리이미드 필름의 두께는 5 내지 18 ㎛, 6 내지 16 ㎛, 7 내지 14 ㎛, 8 내지 12 ㎛ 또는 9 내지 11 ㎛일 수 있다.The polyimide film may have a thickness of 5 to 20 μm. For example, the polyimide film may have a thickness of 5 to 18 μm, 6 to 16 μm, 7 to 14 μm, 8 to 12 μm, or 9 to 11 μm.
상기 지지체는 예를 들어, 무기 기판일 수 있으며, 무기 기판으로는 유리 기판, 금속 기판을 들 수 있으나, 유리 기판을 사용하는 것이 바람직하며, 상기 유리 기판은 소다 석회 유리, 붕규산 유리, 무알칼리 유리 등이 사용될 수 있으나, 이것만으로 한정되는 것은 아니다.The support may be, for example, an inorganic substrate, and the inorganic substrate may include a glass substrate or a metal substrate, but it is preferable to use a glass substrate, and the glass substrate may be soda lime glass, borosilicate glass, or alkali-free glass. and the like may be used, but are not limited thereto.
본 발명에 따른 폴리이미드는 투명도가 우수하면서도 열적 특성이 뛰어나므로, 소자용 기판이나 디스플레이용 커버기판과 같은 기판으로 유용하게 사용할 수 있으며, 광학 필름, 접착 필름, 테이프 또는 디스크용 보호필름과 같은 필름으로 유용하게 사용할 수 있다. 구체적으로 본 발명에 따른 폴리아믹산 조성물 또는 이를 이용하여 제조되는 폴리이미드는 Oxide TFT용 투명 폴리이미드 기판 또는 LTPS용 투명 폴리이미드 기판으로 사용될 수 있다.Since the polyimide according to the present invention has excellent transparency and excellent thermal properties, it can be usefully used as a substrate such as a substrate for a device or a cover substrate for a display, and a film such as an optical film, an adhesive film, a tape or a protective film for a disk. can be usefully used. Specifically, the polyamic acid composition according to the present invention or the polyimide prepared using the same may be used as a transparent polyimide substrate for oxide TFT or a transparent polyimide substrate for LTPS.
이에 따라, 본 발명은 전술한 폴리아믹산 조성물 또는 폴리이미드를 이용하여 제조된 Oxide TFT용 투명 폴리이미드 기판을 제공할 수 있다.Accordingly, the present invention can provide a transparent polyimide substrate for an oxide TFT manufactured using the polyamic acid composition or polyimide described above.
또한, 본 발명은 전술한 폴리아믹산 조성물 또는 폴리이미드를 이용하여 제조된 LTPS용 투명 폴리이미드 기판을 제공할 수 있다.In addition, the present invention may provide a transparent polyimide substrate for LTPS manufactured using the polyamic acid composition or polyimide described above.
본 발명에 따른 폴리아믹산 조성물 및 이를 포함하는 폴리이미드는 높은 투명도를 가지면서도 치수안정성 및 내열성과 같은 열적 특성이 우수한 효과를 가진다. 특히, 본 발명에 따른 폴리아믹산 조성물 및 이를 포함하는 폴리이미드는 높은 투명도를 가지면서도 유리전이온도가 높기 때문에 열에 대한 중량 감소 및 팽창 계수가 낮음은 물론 기계적 물성이 뛰어나고, 공정성이 우수하다.The polyamic acid composition according to the present invention and the polyimide including the same have excellent thermal properties such as dimensional stability and heat resistance while having high transparency. In particular, since the polyamic acid composition and the polyimide including the polyamic acid composition according to the present invention have high transparency and a high glass transition temperature, they have excellent mechanical properties and processability as well as low weight loss and low expansion coefficient with respect to heat.
이하 본 발명에 따르는 실시예 및 본 발명에 따르지 않는 비교예를 통하여 본 발명을 보다 상세히 설명하나, 본 발명의 범위가 하기 제시된 실시예에 의해 제한되는 것은 아니다.Hereinafter, the present invention will be described in more detail through examples according to the present invention and comparative examples not according to the present invention, but the scope of the present invention is not limited by the examples presented below.
<폴리아믹산 조성물의 제조><Preparation of polyamic acid composition>
실시예 1Example 1
교반기 및 질소 주입 배출관을 구비한 500 ㎖ 반응기에 질소를 주입시키면서 용매로서 N,N-디메틸프로피온아미드(DMPA)를 투입하였다.N,N-dimethylpropionamide (DMPA) was introduced as a solvent while nitrogen was injected into a 500 ml reactor equipped with a stirrer and a nitrogen injection discharge pipe.
반응기의 온도를 25℃로 설정한 후 디안하이드라이드 단량체로서 바이페닐테트라카르복실릭 디안하이드라이드(BPDA)를 90중량부 투입하고, 디아민 단량체로서 파라-페닐렌 디아민(PPD)을 완전히 용해시켰다. 이후, 9,9-비스(3,4-디카르복시페닐)플루오렌 디안하이드라이드 (9,9-Bis(3,4-dicarboxyphenyl)fluorene Dianhydride, BPAF) 10 중량부를 30분 간격으로 3회 분할 투입하여 120분간 교반을 계속하여 중합된 폴리아믹산 조성물을 제조하였다. After setting the temperature of the reactor to 25 ° C., 90 parts by weight of biphenyltetracarboxylic dianhydride (BPDA) was added as a dianhydride monomer, and para-phenylene diamine (PPD) as a diamine monomer was completely dissolved. Thereafter, 10 parts by weight of 9,9-bis (3,4-dicarboxyphenyl) fluorene dianhydride (9,9-Bis (3,4-dicarboxyphenyl) fluorene Dianhydride, BPAF) was divided into 3 times at 30 minute intervals. Then, stirring was continued for 120 minutes to prepare a polymerized polyamic acid composition.
실시예 2 내지 13Examples 2 to 13
표 1과 같이 단량체 성분 및 함량 비율을 조절한 것을 제외하고는 실시예 1과 동일한 방법으로 폴리아믹산 용액을 제조하였다.A polyamic acid solution was prepared in the same manner as in Example 1, except that the monomer components and content ratios were adjusted as shown in Table 1.
비교예 1 내지 6Comparative Examples 1 to 6
표 1과 같이 단량체 및 함량 비율을 조절한 것을 제외하고는 실시예 1과 동일한 방법으로 폴리아믹산 용액을 제조하였다.A polyamic acid solution was prepared in the same manner as in Example 1, except that the monomers and content ratios were adjusted as shown in Table 1.
dianhydride
Diamine
(몰%)BPDA
(mole%)
(몰%)BPAF
(mole%)
(몰%)FDA-ADA
(mole%)
(몰%)PPD
(mole%)
(몰%)BAFL
(mole%)
(몰%)TFMB
(mole%)
BPAF: 9,9-비스(3,4-디카르복시페닐)플루오렌 디안하이드라이드
FDA-ADA: 4,4'-(9H-플루오렌-9,9디일)비스(4,1-페닐렌)비스(4-아미노벤즈아미드) (4,4'-(9H-fluorene-9,9 diyl)bis(4,1-phenylene)bis(4-aminobenzamide)
PPD: 파라-페닐렌 디아민
BAFL: 9,9-비스(4-아미노 페닐)플루오렌
TFMB: 2,2'-비스(트리플루오르메틸)벤지딘 BPDA: biphenyltetracarboxylic dianhydride
BPAF: 9,9-bis(3,4-dicarboxyphenyl)fluorene dianhydride
FDA-ADA: 4,4'-(9H-fluorene-9,9diyl)bis(4,1-phenylene)bis(4-aminobenzamide) (4,4'-(9H-fluorene-9, 9-diyl)bis(4,1-phenylene)bis(4-aminobenzamide)
PPD: para-phenylene diamine
BAFL: 9,9-bis (4-amino phenyl) fluorene
TFMB: 2,2'-bis(trifluoromethyl)benzidine
<물성 측정을 위한 폴리 이미드의 제조><Preparation of polyimide for measuring physical properties>
상기 실시예 및 비교예에서 제조된 폴리아믹산 조성물을 1,500 rpm 이상의 고속 회전을 통해 기포를 제거하였다. 이후 스핀 코터를 이용하여 유리 기판에 탈포된 폴리아믹산 조성물을 도포하였다. 이후 질소 분위기하에서 120℃의 온도로 30 분 동안 건조하여 겔 필름을 제조하고, 상기 겔 필름을 450°C까지 2℃/분의 속도로 승온하였으며, 450℃에서 60분 동안 열처리한 후, 30℃까지 2℃/분의 속도로 냉각하여 10㎛의 폴리이미드 필름을 수득하였다. Air bubbles were removed from the polyamic acid compositions prepared in Examples and Comparative Examples by high-speed rotation of 1,500 rpm or more. Then, the degassed polyamic acid composition was applied to the glass substrate using a spin coater. Thereafter, a gel film was prepared by drying at a temperature of 120 ° C. for 30 minutes under a nitrogen atmosphere, and the gel film was heated at a rate of 2 ° C / min to 450 ° C. After heat treatment at 450 ° C. for 60 minutes, 30 ° C. It was cooled at a rate of 2° C./min to obtain a 10 μm polyimide film.
이후 증류수에 디핑(dipping)하여 유리 기판에서 폴리이미드 필름을 박리시켰다. 제조된 폴리이미드 필름의 물성을 하기 방식을 이용하여 측정하고, 그 결과를 하기 표 2에 나타내었다.Thereafter, the polyimide film was peeled from the glass substrate by dipping in distilled water. The physical properties of the prepared polyimide film were measured using the following method, and the results are shown in Table 2 below.
실험예 1 - 점도Experimental Example 1 - Viscosity
실시예 및 비교예에서 제조된 폴리아믹산 용액에 대해, Haake 사의 Rheostress 600을 사용하여 1/s의 전단 속도, 23℃ 온도 및 1mm 플레이트 갭 조건에서 점도를 측정하였다.Viscosity of the polyamic acid solutions prepared in Examples and Comparative Examples was measured using Haake's Rheostress 600 under conditions of a shear rate of 1/s, a temperature of 23° C., and a plate gap of 1 mm.
실험예 2 - 광투과도Experimental Example 2 - Light Transmittance
실시예 및 비교예의 폴리아믹산 용액을 경화하여 제조된 10㎛의 폴리이미드 필름에 대해, 퍼킨앨머(Perkin Elmer)사의 자외선/가시광선 분광광도계(UV-Vis Spectrophotometer)로 Lambda 465 모델을 사용하여 투과율 모드로 470nm의 투과율을 측정하였다.For the polyimide films of 10 μm prepared by curing the polyamic acid solutions of Examples and Comparative Examples, Perkin Elmer's UV / Vis Spectrophotometer (UV-Vis Spectrophotometer) using Lambda 465 model in transmittance mode The transmittance at 470 nm was measured.
실험예 3 - CTEExperimental Example 3 - CTE
TA사 열기계 분석기(thermomechanical analyzer) Q400 모델을 사용하였으며, 폴리이미드 필름을 폭 2mm, 길이 10mm로 자른 후 질소 분위기하에서 0.05N의 장력을 가하면서, 10℃/min의 속도로 상온에서 500℃까지 승온 후 다시 10℃/min의 속도로 냉각하면서 100℃에서 400℃ 온도까지의 구간의 기울기를 측정하였다.TA's thermomechanical analyzer Q400 model was used, and after cutting the polyimide film into a width of 2 mm and a length of 10 mm, it was heated from room temperature to 500 ° C at a rate of 10 ° C / min while applying a tension of 0.05 N in a nitrogen atmosphere. After the temperature was raised, the slope of the section from 100 °C to 400 °C was measured while cooling at a rate of 10 °C/min.
실험예 4 - 유리전이온도Experimental Example 4 - Glass Transition Temperature
실시예 및 비교예의 폴리아믹산 용액을 경화하여 제조된 폴리이미드 필름에 대해, TMA를 이용하여 10℃/min 조건에서 급격히 팽창하는 지점을 On-set point로 측정하였다.For the polyimide films prepared by curing the polyamic acid solutions of Examples and Comparative Examples, the rapidly expanding point at 10 °C/min condition was measured as an on-set point using TMA.
실험예 5 - 1 중량%의 열분해온도(Td)Experimental Example 5 - Thermal decomposition temperature (Td) of 1% by weight
TA사 열중량 분석(thermogravimetric analysis) Q50 모델을 사용하였으며, 폴리이미드 필름을 질소 분위기하에서 10℃/분의 속도로 150℃까지 승온시킨 후 30분간 등온을 유지하여 수분을 제거했다. 이후 10℃/분의 속도로 600℃까지 승온하여 1%의 중량 감소가 발생하는 온도를 측정하였다.TA's thermogravimetric analysis Q50 model was used, and the polyimide film was heated up to 150 °C at a rate of 10 °C/min under a nitrogen atmosphere, and then maintained at an isothermal temperature for 30 minutes to remove moisture. Thereafter, the temperature was raised to 600° C. at a rate of 10° C./min, and the temperature at which a weight loss of 1% occurred was measured.
실험예 6 - 신율 측정Experimental Example 6 - Measurement of elongation
실시예 및 비교예의 폴리아믹산 용액을 경화하여 제조된 폴리이미드 필름을 폭 10mm, 길이 40mm로 자른 후 인스트론(Instron)사의 Instron5564 UTM 장비를 사용하여 ASTM D-882 방법으로 신율을 측정할 수 있다.After cutting the polyimide films prepared by curing the polyamic acid solutions of Examples and Comparative Examples to a width of 10 mm and a length of 40 mm, the elongation can be measured by the ASTM D-882 method using Instron 5564 UTM equipment.
실험예 7 - 탄성률 및 인장 강도 측정Experimental Example 7 - Measurement of elastic modulus and tensile strength
실시예 및 비교예의 폴리아믹산 용액을 경화하여 제조된 폴리이미드 필름을 폭 10mm, 길이 40mm로 자른 후 인스트론(Instron)사의 Instron5564 UTM 장비를 사용하여 ASTM D-882 방법으로 탄성률 및 인장 강도를 측정할 수 있다. 이때의 Cross Head Speed는 50 mm/min의 조건으로 측정할 수 있다.After cutting the polyimide film prepared by curing the polyamic acid solution of Examples and Comparative Examples into a width of 10 mm and a length of 40 mm, the elastic modulus and tensile strength were measured by ASTM D-882 method using Instron 5564 UTM equipment. can The cross head speed at this time can be measured under the condition of 50 mm/min.
(cP)viscosity
(cP)
(%)permeability
(%)
(ppm/℃)CTE
(ppm/℃)
(℃)Tg
(℃)
(℃)Td
(℃)
(%)elongation
(%)
(MPa)tensile strength
(MPa)
(GPa)elastic modulus
(GPa)
Claims (19)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202280061248.1A CN117940486A (en) | 2021-09-09 | 2022-08-19 | Polyamic acid composition and polyimide prepared from same |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR1020210120406A KR102691096B1 (en) | 2021-09-09 | 2021-09-09 | Polyamic acid composition and polyimide prepared therefrom |
| KR10-2021-0120406 | 2021-09-09 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| WO2023038322A1 true WO2023038322A1 (en) | 2023-03-16 |
Family
ID=85506735
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| PCT/KR2022/012452 Ceased WO2023038322A1 (en) | 2021-09-09 | 2022-08-19 | Polyamic acid composition and polyimide prepared therefrom |
Country Status (4)
| Country | Link |
|---|---|
| KR (1) | KR102691096B1 (en) |
| CN (1) | CN117940486A (en) |
| TW (1) | TWI854296B (en) |
| WO (1) | WO2023038322A1 (en) |
Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20150007335A (en) * | 2012-05-11 | 2015-01-20 | 아크론 폴리머 시스템즈, 인코포레이티드 | Thermally stable, flexible substrates for electronic devices |
| CN111072964A (en) * | 2019-12-31 | 2020-04-28 | 阜阳欣奕华材料科技有限公司 | Polyimide precursor composition and preparation method and application thereof |
| KR102162042B1 (en) * | 2019-02-01 | 2020-10-06 | 윙고 테크놀로지 가부시키가이샤 | Polyimide compound and moldings containing the polyimide compound |
| KR20210010571A (en) * | 2018-06-22 | 2021-01-27 | 미쓰이 가가쿠 가부시키가이샤 | Polyamide acid and varnish containing the same, film, touch panel display, liquid crystal display, and organic EL display |
| US20210024699A1 (en) * | 2018-03-30 | 2021-01-28 | Kaneka Corporation | Polyamic acid, polyamic acid solution, polyimide, polyimide film, laminate and flexible device, and method for producing polyimide film |
| KR102271023B1 (en) * | 2016-09-29 | 2021-06-29 | 코오롱인더스트리 주식회사 | Polyamic acid, Polyimide, Polyimide Film and Display Device Comprising Thereof and mothod of preparing the Polyamic acid |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20150080221A (en) | 2013-12-31 | 2015-07-09 | 에스케이이노베이션 주식회사 | Polyamic acid resin composition, polyimide resin thereof, and polyimide substrate made therefrom |
-
2021
- 2021-09-09 KR KR1020210120406A patent/KR102691096B1/en active Active
-
2022
- 2022-08-19 WO PCT/KR2022/012452 patent/WO2023038322A1/en not_active Ceased
- 2022-08-19 CN CN202280061248.1A patent/CN117940486A/en active Pending
- 2022-09-08 TW TW111134114A patent/TWI854296B/en active
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20150007335A (en) * | 2012-05-11 | 2015-01-20 | 아크론 폴리머 시스템즈, 인코포레이티드 | Thermally stable, flexible substrates for electronic devices |
| KR102271023B1 (en) * | 2016-09-29 | 2021-06-29 | 코오롱인더스트리 주식회사 | Polyamic acid, Polyimide, Polyimide Film and Display Device Comprising Thereof and mothod of preparing the Polyamic acid |
| US20210024699A1 (en) * | 2018-03-30 | 2021-01-28 | Kaneka Corporation | Polyamic acid, polyamic acid solution, polyimide, polyimide film, laminate and flexible device, and method for producing polyimide film |
| KR20210010571A (en) * | 2018-06-22 | 2021-01-27 | 미쓰이 가가쿠 가부시키가이샤 | Polyamide acid and varnish containing the same, film, touch panel display, liquid crystal display, and organic EL display |
| KR102162042B1 (en) * | 2019-02-01 | 2020-10-06 | 윙고 테크놀로지 가부시키가이샤 | Polyimide compound and moldings containing the polyimide compound |
| CN111072964A (en) * | 2019-12-31 | 2020-04-28 | 阜阳欣奕华材料科技有限公司 | Polyimide precursor composition and preparation method and application thereof |
Also Published As
| Publication number | Publication date |
|---|---|
| KR102691096B1 (en) | 2024-08-05 |
| CN117940486A (en) | 2024-04-26 |
| TWI854296B (en) | 2024-09-01 |
| KR20230037273A (en) | 2023-03-16 |
| TW202311369A (en) | 2023-03-16 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| EP2342266A2 (en) | Polyimide film | |
| WO2012091232A1 (en) | Transparent polyimide film and preparation method thereof | |
| WO2018038309A1 (en) | Polyimide precursor resin composition with improved resin stability and heat resistance and having transparency, method for producing polyimide film using same, and polyimide film produced thereby | |
| WO2021060613A1 (en) | Polyamic acid composition, method for preparing same, and polyimide film comprising same | |
| WO2021095976A1 (en) | Highly elastic and heat-resistant polyimide film and method for producing same | |
| WO2020101383A1 (en) | Polyimide-based film, polyimide-based composition, and film manufacturing method using same | |
| WO2020226243A1 (en) | Method for producing polyimide film and polyimide film produced thereby | |
| WO2019132515A1 (en) | Method for preparing polyamic acid, and polyamic acid, polyimide resin, and polyimide film which are manufactured thereby | |
| WO2018216853A1 (en) | Method for manufacturing polyamic acid resin having easy laser separation property and high heat resistance and polyimide film manufactured using same | |
| WO2020101225A1 (en) | Polyimide precursor composition containing crosslinkable dianhydride-based compound and antioxidant, and polyimide film produced therefrom | |
| WO2018216852A1 (en) | Polyimide precursor resin composition having excellent light characteristics and phase retardation characteristics and high transparency, method for manufacturing polyimide film using same, and polyimide film manufactured thereby | |
| WO2022107969A1 (en) | Polyamic acid composition, and polyimide comprising same | |
| WO2020230969A1 (en) | Polyimide and manufacturing method therefor | |
| WO2021006427A1 (en) | Polyamic acid composition, preparation method for polyamic acid composition, and polyimide comprising same | |
| WO2021060616A1 (en) | Polyamic acid composition, method for preparing polyamic acid composition, and polyimide comprising same | |
| WO2021091013A1 (en) | Polyimide film having high heat resistance and low dielectric properties, and manufacturing method for same | |
| WO2024186087A1 (en) | Polyamic acid composition comprising fluorine and polyimide film prepared therefrom | |
| KR102030841B1 (en) | Polyimide Precursor Composition Comprising Aromatic Carboxylic Acid and Polyimide Film Prepared by Using the Same | |
| WO2016209060A1 (en) | Polyamide-imide precursor, polyamide-imide film, and display device comprising same | |
| WO2023038322A1 (en) | Polyamic acid composition and polyimide prepared therefrom | |
| WO2022107966A1 (en) | Polyamic acid composition, and polyimide comprising same | |
| WO2021060612A1 (en) | Polyamic acid composition, method for preparing same, and polyimide film comprising same | |
| WO2016129926A1 (en) | Polyamic acid, polyimide resin and polyimide film | |
| WO2021101078A1 (en) | Polyimide film manufacturing method and polyimide film manufactured thereby | |
| WO2023038321A1 (en) | Polyamic acid composition, and polyimide produced therefrom |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| 121 | Ep: the epo has been informed by wipo that ep was designated in this application |
Ref document number: 22867591 Country of ref document: EP Kind code of ref document: A1 |
|
| WWE | Wipo information: entry into national phase |
Ref document number: 202280061248.1 Country of ref document: CN |
|
| NENP | Non-entry into the national phase |
Ref country code: DE |
|
| 122 | Ep: pct application non-entry in european phase |
Ref document number: 22867591 Country of ref document: EP Kind code of ref document: A1 |