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WO2023080007A1 - Polyimide production method, polyimide, polyimide resin composition, and cured product thereof - Google Patents

Polyimide production method, polyimide, polyimide resin composition, and cured product thereof Download PDF

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Publication number
WO2023080007A1
WO2023080007A1 PCT/JP2022/039608 JP2022039608W WO2023080007A1 WO 2023080007 A1 WO2023080007 A1 WO 2023080007A1 JP 2022039608 W JP2022039608 W JP 2022039608W WO 2023080007 A1 WO2023080007 A1 WO 2023080007A1
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Prior art keywords
polyimide
mass
bis
reaction
group
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French (fr)
Japanese (ja)
Inventor
一瀬恵子
青島健太
浅野到
荒木斉
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Toray Industries Inc
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Toray Industries Inc
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Priority to KR1020247005059A priority Critical patent/KR20240095156A/en
Priority to CN202280071046.5A priority patent/CN118139912A/en
Priority to JP2022567495A priority patent/JPWO2023080007A1/ja
Publication of WO2023080007A1 publication Critical patent/WO2023080007A1/en
Anticipated expiration legal-status Critical
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    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G73/00Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
    • C08G73/06Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
    • C08G73/10Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
    • C08G73/1003Preparatory processes
    • C08G73/1007Preparatory processes from tetracarboxylic acids or derivatives and diamines
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G73/00Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
    • C08G73/06Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
    • C08G73/10Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G73/00Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
    • C08G73/06Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
    • C08G73/10Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
    • C08G73/1003Preparatory processes
    • C08G73/1007Preparatory processes from tetracarboxylic acids or derivatives and diamines
    • C08G73/101Preparatory processes from tetracarboxylic acids or derivatives and diamines containing chain terminating or branching agents
    • C08G73/1017Preparatory processes from tetracarboxylic acids or derivatives and diamines containing chain terminating or branching agents in the form of (mono)amine
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L79/00Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen with or without oxygen or carbon only, not provided for in groups C08L61/00 - C08L77/00
    • C08L79/04Polycondensates having nitrogen-containing heterocyclic rings in the main chain; Polyhydrazides; Polyamide acids or similar polyimide precursors
    • C08L79/08Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/037Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polyamides or polyimides

Definitions

  • the present invention relates to a method for producing a polyimide that can reduce the amount of organic solvent used and is suitable for surface protective films of electronic parts, interlayer insulating films, etc., the polyimide, a resin composition containing the polyimide, and a cured product thereof.
  • polyimide Due to its high heat resistance and excellent mechanical and electrical properties, polyimide is used for surface protective films and interlayer insulating films of electronic parts. Along with the recent demand for high performance electronic components, polyimide has improved reproducibility of pattern formation after development, high transmittance and neutral color appearance when made into a film, and cure shrinkage on the coated substrate. Small things are required.
  • NMP N-methyl-2-pyrrolidone
  • Patent Document 1 in order to efficiently remove NMP, a low boiling point solvent such as ethyl acetate and water are added to the NMP reaction solution of polyimide to separate it into an organic layer and an aqueous layer, and then the aqueous layer is removed.
  • a method for producing a polyimide precursor a method is disclosed in which the operation of removing NMP by rinsing is repeated about three times.
  • Patent Documents 2 to 5 as a method for producing polyimide that reduces the amount of organic solvent used, surface protective films and interlayer insulation of electronic parts are produced by reacting at a temperature exceeding 100 ° C. under high pressure in a water solvent. Techniques have been disclosed for polymerizing thermoplastic polyimides that are not intended for membranes.
  • Patent Document 1 discloses a method of preparing a nylon salt-type monomer from a tetracarboxylic acid and a diamine in a solvent and subjecting it to solid phase polymerization to obtain a polyimide.
  • Patent No. 6503341 Japanese Patent Application Laid-Open No. 2001-181389 Japanese Patent Application Laid-Open No. 2001-270945 Patent No. 4050458 Patent No. 6994946 JP 2015-98573 A
  • Non-Patent Document 1 and Patent Document 6 require higher temperature and longer time than the reaction using a solvent because the movement of molecules is controlled. It is considered that this is because the resulting polyimide has strong intermolecular interactions. Therefore, the obtained polyimide tends to have high crystallinity, and there is a problem that an insoluble and non-melting portion tends to occur.
  • the method for producing polyimide of the present invention has the following configuration. i.e. [1] Tetracarboxylic acid and/or tetracarboxylic dianhydride (a) and diamine (b) are mixed in a reaction solvent containing 60 to 100% by mass of water with respect to 100% by mass of the total reaction solvent, A method for producing a polyimide, comprising a step (2) of chain extension of the obtained polyimide after the step (1) of obtaining a polyimide by reacting it at a temperature range of 80 ° C. or more and 250 ° C.
  • R 5 and R 12 each independently represent an oxygen atom, C(CH 3 ) 2 , C(CF 3 ) 2 or SO 2 , R 6 and R 7 each independently , a hydrogen atom, a hydroxyl group, a sulfonic acid group or a thiol group, and R 8 , R 9 , R 10 , R 11 , R 13 and R 14 each independently represent a hydrogen atom, a hydroxyl group, a sulfonic acid group, a thiol group or Indicates an alkyl group having 1 to 6 carbon atoms.
  • a reaction solvent containing 60 to 100% by mass of water with respect to 100% by mass of the total reaction solvent a tetracarboxylic dianhydride (d) with a purity of 98% by mass or more and a A method for producing a polyimide, comprising the step (3) of reacting a diamine (e) in a temperature range of 100° C.
  • the polyimide of the present invention has the following constitution. i.e. [10] It has a structural unit represented by formula (2), contains an organic solvent of 1% by mass or less, has a yellowness of 0 to 3.0, and has a weight average molecular weight of 5,000 to 100. ,000 polyimide,
  • R 1 represents a 4- to 14-valent organic group having 5 to 40 carbon atoms
  • R 2 represents a 2- to 12-valent organic group having 5 to 40 carbon atoms
  • R 3 and R 4 are Each independently represents a hydroxyl group, a sulfonic acid group, a thiol group or an organic group having 1 to 20 carbon atoms
  • ⁇ and ⁇ each independently represents an integer from 0 to 10 satisfying ⁇ + ⁇ 1.
  • the polyimide resin composition of the present invention has the following constitution. i.e. [14] A polyimide resin composition containing the polyimide according to any one of [10] to [13], a photosensitizer and a solvent.
  • the cured product of the present invention has the following constitution. i.e. [15] A cured product obtained by curing the polyimide resin composition according to [14] above.
  • the present invention can reduce the amount of organic solvent used, has excellent solvent solubility, and has a low yellowness, and a method for producing a polyimide suitable for a surface protective film of an electronic component, an interlayer insulating film, etc., the polyimide, and the polyimide and a cured film formed from the resin composition.
  • the method for producing polyimide of the present invention has either the following first aspect or second aspect. i.e. Tetracarboxylic acid and/or tetracarboxylic dianhydride (a) and diamine (b) are heated at 80° C. or higher in a reaction solvent containing 60 to 100% by mass of water with respect to 100% by mass of the total reaction solvent.
  • a method for producing a polyimide comprising a step (1) of obtaining a polyimide by reaction in a temperature range of 250° C.
  • a step (2) of chain extension of the obtained polyimide or In a reaction solvent containing 60 to 100% by mass of water with respect to 100% by mass of the total reaction solvent, a tetracarboxylic dianhydride (d) with a purity of 98% by mass or more and a diamine (e) with a purity of 98% by mass or more ) in a temperature range of 100° C. or higher and 370° C. or lower to obtain a polyimide (3).
  • the polyimide referred to in the present invention is, for example, a structural unit derived from a tetracarboxylic acid and/or a tetracarboxylic dianhydride by reacting a tetracarboxylic acid and/or a tetracarboxylic dianhydride with a diamine.
  • Examples of the tetracarboxylic acid and/or tetracarboxylic dianhydride used in the method for producing a polyimide of the present invention include aromatic tetracarboxylic acid, alicyclic tetracarboxylic acid, and dianhydrides thereof. , but not limited to. Moreover, these may be used individually or in combination of 2 or more types.
  • tetracarboxylic acid and/or tetracarboxylic dianhydride (a) include 4- to 14-valent tetracarboxylic acids and tetracarboxylic dianhydrides having 5 to 40 carbon atoms, such as pyromellit acid, 3,3′,4,4′-biphenyltetracarboxylic acid, 2,3,3′,4′-biphenyltetracarboxylic acid, 2,2′,3,3′-biphenyltetracarboxylic acid, 3,3 ',4,4'-benzophenonetetracarboxylic acid, 2,2',3,3'-benzophenonetetracarboxylic acid, 2,2-bis(3,4-dicarboxyphenyl)propane, 2,2-bis(2 ,3-dicarboxyphenyl)propane, 1,1-bis(3,4-dicarboxyphenyl)ethane, 1,1-bis(2,3-dica
  • the tetracarboxylic dianhydride preferably contains one or more selected from the group consisting of the compounds represented by formula (1).
  • R 5 and R 12 each independently represent an oxygen atom, C(CH 3 ) 2 , C(CF 3 ) 2 or SO 2
  • R 6 and R 7 each independently represents a hydrogen atom , a hydroxyl group, a sulfonic acid group or a thiol group ; It represents an alkyl group of numbers 1-6.
  • pyromellitic dianhydride bis(3,4-dicarboxyphenyl)sulfone dianhydride, 4,4′-oxydiphthalic anhydride, 2,2-bis(3,4-dicarboxyphenyl)hexafluoro propane dianhydride, 4-(2,5-dioxotetrahydrofuran-3-yl)-1,2,3,4-tetrahydronaphthalene-1,2-dicarboxylic dianhydride or an alkyl group on the aromatic ring thereof or a halogen atom-substituted compound is particularly preferred. These are used alone or in combination of two or more.
  • diamines used in the production method of the present invention include, but are not limited to, aromatic diamines and alicyclic diamines. Moreover, these may be used individually or in combination of 2 or more types.
  • diamine (b) examples include diamines having 5 to 40 carbon atoms to 12-valent diamines, such as 3,4'-diaminodiphenyl ether, 4,4'-diaminodiphenyl ether, 3,4'-diamino Diphenylmethane, 4,4'-diaminodiphenylmethane, 4,4'-diaminodiphenylmethane, 3,4'-diaminodiphenyl sulfone, 4,4'-diaminodiphenyl sulfone, 3,4'-diaminodiphenyl sulfide, 4,4'- Diaminodiphenyl sulfide, 1,4-bis(4-aminophenoxy)benzene, benzine, m-phenylenediamine, p-phenylenediamine, 1,5-naphthalenediamine, 2,6-naphthalenediamine, bis(4-aminophen
  • the diamine contains one or more selected from the group consisting of compounds represented by formula (3).
  • R 15 represents an oxygen atom, C(CH 3 ) 2 , C(CF 3 ) 2 or SO 2
  • R 16 and R 17 each independently represents a hydrogen atom, a hydroxyl group, a sulfonic acid or a thiol group, especially when it is a hydroxyl group, the resulting polyimide is easily dissolved in an alkaline aqueous solution, and the dissolution rate in the alkaline aqueous solution, which is the developer used for development, increases, and the cured portion of the resin composition coating film and It is preferable because the dissolution contrast of the uncured portion is increased and fine pattern workability can be easily obtained.
  • the monoamine (c) is further reacted in the step (1).
  • the ends of the polymer main chain can be end-capped with monoamines. End capping can be achieved, for example, by substituting a monoamine for a portion of the diamine.
  • monoamines include, but are not limited to, aromatic monoamines and alicyclic monoamines. Moreover, these may be used individually or in combination of 2 or more types.
  • monoamines include 5-amino-8-hydroxyquinoline, 1-hydroxy-7-aminonaphthalene, 1-hydroxy-6-aminonaphthalene, 1-hydroxy-5-aminonaphthalene, 1-hydroxy -4-aminonaphthalene, 2-hydroxy-7-aminonaphthalene, 2-hydroxy-6-aminonaphthalene, 2-hydroxy-5-aminonaphthalene, 1-carboxy-7-aminonaphthalene, 1-carboxy-6-aminonaphthalene , 1-carboxy-5-aminonaphthalene, 2-carboxy-7-aminonaphthalene, 2-carboxy-6-aminonaphthalene, 2-carboxy-5-aminonaphthalene, 2-aminobenzoic acid, 3-aminobenzoic acid, 4 -aminobenzoic acid, 4-aminosalicylic acid, 5-aminosalicylic acid, 6-aminosalicylic acid, 3-amino-4,6-dihydroxypyrimidine,
  • the monoamine (c) preferably has one or more substituents selected from the group consisting of hydroxyl groups, sulfonic acid groups and thiol groups.
  • the resin composition containing the polyimide of the present invention tends to exhibit excellent storage stability and good workability, which is preferable.
  • the process includes a step (1) of reacting anhydride (a) and diamine (b) in a temperature range of 80° C. or higher and 250° C. or lower to obtain a polyimide.
  • the reaction solvent used in step (1) of the present invention and step (3) described later contains 60 to 100% by mass of water with respect to 100% by mass of the reaction solvent as a whole.
  • a reaction solvent for example, alcohols such as ethanol, methanol, isopropyl alcohol and tert-butyl alcohol, glycols such as ethylene glycol, diethylene glycol, propylene glycol, polyethylene glycol and ethylene glycol ether, tetrahydrofuran, diethyl ether, dioxane, Ethers such as propylene glycol monomethyl ether, polar aprotic solvents such as ⁇ -butyrolactone, ketones such as acetone, methyl ethyl ketone, diisobutyl ketone, and diacetone alcohol, esters such as ethyl acetate, propylene glycol monomethyl ether acetate, and ethyl lactate.
  • Organic solvents such as aromatic hydrocarbons such as toluene and
  • polyimide is produced via polyamic acid, which is a polyimide precursor.
  • polyamic acid which is a polyimide precursor.
  • tetracarboxylic acid and/or tetracarboxylic dianhydride and diamine form a salt in the reaction solvent without going through the polyamic acid, and dehydration polycondensation takes place from this monomer salt. It is believed that it proceeds to produce polyimide.
  • the reaction solvent In order for the polyimide polymerization reaction to proceed without passing through the polyamic acid of the present invention, the reaction solvent must contain 60% by mass or more of water, preferably 70% by mass or more, more preferably 80% by mass or more, and further.
  • the organic solvent contained in the reaction solvent is less than 40% by mass, the organic solvent hardly remains in the polyimide obtained by the production method of the present invention. From this viewpoint, the organic solvent contained in the reaction solvent is less than 40% by mass, preferably less than 30% by mass, more preferably less than 20% by mass, even more preferably less than 10% by mass, and most preferably 0% by mass.
  • the total amount of tetracarboxylic acid and/or tetracarboxylic dianhydride, diamine, and monoamine, which are reaction raw materials used in step (1) and step (3) described later, is the reaction solvent, tetracarboxylic acid and/or tetracarboxylic acid, and Based on the total amount of 100% by mass of the acid dianhydride, diamine and monoamine, it is preferably 1% by mass or more from the viewpoint of easiness of the imide bond generation reaction, and more preferably 5% by mass or more. 10% by mass or more is more preferable. From the viewpoint of suppressing undesirable side reactions occurring during the reaction, the content is preferably 50% by mass or less, more preferably 40% by mass or less, and more preferably 35% by mass or less.
  • a catalyst may be used in step (1) of the present invention and step (3) described later.
  • the catalyst here is not particularly limited as long as it is a compound that has the effect of promoting the progress of the dehydration polycondensation reaction or suppressing the progress of side reactions such as cross-linking and oxidation.
  • Examples include organic base catalysts and acid catalysts. be done.
  • Organic base catalysts include triethylamine, tributylamine, tripentylamine, N,N-dimethylaniline, N,N-diethylaniline, pyridine, ⁇ -picoline, ⁇ -picoline, ⁇ -picoline, 2,4-lutidine, 2 ,6-lutidine, quinoline, isoquinoline and the like.
  • Acid catalysts include inorganic acids such as hydrochloric acid, hydrogen bromide, hydrogen iodide, sulfuric acid, sulfuric anhydride, nitric acid, phosphoric acid, phosphorous acid, phosphotungstic acid, and phosphomolybdic acid, as well as methanesulfonic acid, ethanesulfonic acid, and trifluoromethane.
  • inorganic acids such as hydrochloric acid, hydrogen bromide, hydrogen iodide, sulfuric acid, sulfuric anhydride, nitric acid, phosphoric acid, phosphorous acid, phosphotungstic acid, and phosphomolybdic acid, as well as methanesulfonic acid, ethanesulfonic acid, and trifluoromethane.
  • Sulfonic acids such as sulfonic acid, benzenesulfonic acid and p-toluenesulfonic acid; carboxylic acids such as acetic acid and oxalic acid; and halogenated carboxylic acids such as chloroacetic acid, dichloroacetic acid, trichloroacetic acid, fluoroacetic acid, difluoroacetic acid and trifluoroacetic acid. etc. can be exemplified. These catalysts may be used alone or in combination of two or more.
  • the reaction temperature in step (1) of the present invention must be a temperature at which the tetracarboxylic acid and/or tetracarboxylic dianhydride used in the reaction and the diamine react to form an imide bond, so the lower limit is 80°C. is.
  • the temperature is preferably 100° C. or higher, more preferably 120° C. or higher, from the viewpoint that a polyimide having a sufficiently high molecular weight can be obtained.
  • the upper limit of the reaction temperature is 250° C. in order to avoid progress of cross-linking and decomposition of the monomer. Since it is necessary to cope with the vapor pressure of the reaction solvent, which increases as the reaction temperature rises, the temperature is preferably 230° C.
  • the temperature is more preferably 200° C. or lower, still more preferably 160° C. or lower, and most preferably 140° C. or lower, from the viewpoint that the yellowness degree can easily be adjusted to the preferred range.
  • the reaction pressure is adjusted from the viewpoint that the tetracarboxylic acid and/or tetracarboxylic dianhydride used in the reaction and the diamine are likely to react to form an imide bond.
  • the reaction pressure it is preferably 20 MPa or less, more preferably 10 MPa or less, from the viewpoint of the pressure resistance of the reaction vessel and the handleability of the reaction.
  • the reaction time depends on the type and amount of raw materials used or the reaction temperature, and cannot be generally defined, but is preferably 0.1 hour or longer. , more preferably 0.5 hours or longer, and more preferably 1 hour or longer. When the time is longer than this preferable time, there is a tendency that unreacted raw material components can be sufficiently reduced. On the other hand, there is no particular upper limit to the reaction time, but the reaction proceeds sufficiently within 40 hours, preferably within 20 hours, and more preferably within 10 hours.
  • step (1) for producing a polyimide by the preferred method described above and the step (3) described later there are no particular restrictions on the method and order of adding the reaction raw materials and solvent, and if necessary, the catalyst, etc. to the reaction vessel, but each They may be added all at once, or the reaction raw materials soluble in the reaction solvent may be dissolved in the reaction solvent in advance and then added.
  • the method of carrying out the reaction is not particularly limited, but it is preferably carried out under stirring conditions.
  • the atmosphere in step (1) and step (3) to be described later is preferably a non-oxidizing atmosphere, preferably an atmosphere of an inert gas such as nitrogen, helium, and argon, which is economical and easy to handle. It is preferable to carry out in a nitrogen atmosphere.
  • the first aspect of the method for producing polyimide of the present invention includes step (2) for chain extension of the polyimide obtained in step (1).
  • the chain extension step referred to in the present invention is a step for increasing the molecular weight of the polyimide, and the weight average molecular weight of the polyimide obtained in the step (1) is higher than the weight average molecular weight of the polyimide obtained in the step (1) after the step (2).
  • the weight average molecular weight of the obtained polyimide becomes larger.
  • the weight average molecular weight is measured by a gel permeation chromatography method (GPC method) and calculated in terms of polystyrene.
  • reaction solvent containing 60 to 100% by mass of water with respect to the solid phase polymerization step (2a) and the total 100% by mass of the reaction solvent is more than the step (1).
  • a step (2b) of obtaining a polyimide by reaction at a high temperature can be preferably used.
  • the atmosphere in the solid phase polymerization step (2a) is preferably a non-oxidizing atmosphere or a reduced pressure.
  • non-oxidizing atmosphere refers to an atmosphere having an oxygen concentration of 5% by volume or less, preferably 2% by volume or less, more preferably substantially free of oxygen in the gas phase in contact with the polyimide to be subjected to solid phase polymerization, i.e. nitrogen, It refers to an atmosphere of an inert gas such as helium or argon, and among these, a nitrogen atmosphere is particularly preferable from the viewpoint of economy and ease of handling.
  • the pressure-reduced condition means that the pressure in the reaction system is lower than the atmospheric pressure, and the upper limit is preferably 50 kPa or less, more preferably 20 kPa or less, and even more preferably 10 kPa or less. As a lower limit, 0.1 Pa or more can be exemplified. This tends to suppress the occurrence of undesirable side reactions such as cross-linking reaction and decomposition reaction of polyimide.
  • the temperature in step (2a) is not particularly limited as long as it is a temperature at which the polyimide obtained in step (1) is increased in molecular weight. Carrying out the reaction at 80° C. or higher facilitates sufficiently increasing the molecular weight, which is preferable. It is more preferably 100° C. or higher, still more preferably 120° C. or higher, particularly preferably 150° C. or higher, and most preferably 180° C. or higher.
  • the solid polyimide obtained in step (1) maintains a substantially solid state and is performed at a temperature at which the shape does not change. . It is more preferably 280° C. or lower, still more preferably 260° C. or lower, and most preferably 250° C. or lower.
  • the time in step (2a) is not particularly limited as long as the polyimide obtained in step (1) is sufficiently high in molecular weight.
  • the above is preferable, and 72 hours or less is preferable from the viewpoint that undesirable side reactions such as cross-linking reaction and decomposition reaction can be suppressed. It is more preferably 5 hours or more and 48 hours or less, still more preferably 10 hours or more and 36 hours or less, and most preferably 12 hours or more and 24 hours or less.
  • step (2b) of obtaining a polyimide by reacting it in the reaction solvent at a temperature higher than that in the step (1) after recovering the polyimide obtained in the step (1) from the reaction solvent, adding it again to the reaction solvent, the step It is also possible to carry out the reaction at a higher temperature than in (1), and it is also possible to carry out the reaction at a higher temperature without recovering or cooling the polyimide after step (1). From the viewpoint of simplicity of the process, it is preferable to continue the reaction at elevated temperature without recovering or cooling the polyimide after the process (1).
  • the reaction temperature in step (2b) is higher than in step (1), preferably 10° C. or higher and 200° C. or lower, more preferably 20° C. or higher and 180° C. or lower than the reaction temperature in step (1), It is more preferably 30°C or higher and 150°C or lower, and most preferably 50°C or higher and 120°C or lower.
  • the reaction time is preferably 0.1 hours or longer, more preferably 0.5 hours or longer, and even more preferably 1 hour or longer.
  • the time is longer than this preferable time, there is a tendency that the molecular weight is sufficiently increased.
  • there is no upper limit to the reaction time but the reaction proceeds sufficiently within 40 hours, preferably within 20 hours, more preferably within 10 hours.
  • the method of carrying out the reaction is not particularly limited, but it is preferably carried out under stirring conditions.
  • the atmosphere in step (2b) is desirably a non-oxidizing atmosphere, preferably under an inert gas atmosphere such as nitrogen, helium, and argon, and from the viewpoint of economic efficiency and ease of handling, it is preferable to carry out under a nitrogen atmosphere. is preferred.
  • a tetracarboxylic dianhydride having a purity of 98% by mass or more in a reaction solvent containing 60 to 100% by mass of water with respect to 100% by mass of the total reaction solvent. and a step (3) of reacting the substance (d) with a diamine (e) having a purity of 98% by mass or more in a temperature range of 100° C. or higher and 370° C. or lower to obtain a polyimide.
  • the tetracarboxylic dianhydride used in the step (3) of the present invention includes, but is not limited to, the same compounds as the tetracarboxylic dianhydride described above in the explanation of step (1).
  • the structure of the tetracarboxylic dianhydride is not particularly limited, it has a purity of 98% by mass or more, preferably a purity of 99% by mass or more, and more preferably a purity of 99.5% by mass or more.
  • a tetracarboxylic dianhydride with a purity of 98% by mass or more a polyimide with reduced yellowness can be obtained.
  • the purity is less than 98% by mass, the resulting polyimide has a high degree of yellowness.
  • the yellowness referred to here means that a polyimide solution in which polyimide is dissolved in an organic solvent is applied onto a substrate, and the solvent is removed by drying to prepare a polyimide film having a thickness of 10 ⁇ m. Shows a value calculated by measuring with a spectrophotometer.
  • Purity can be determined by, for example, high performance liquid chromatography analysis, gas chromatography analysis, and 1 H-NMR analysis.
  • the peak area attributed to the main component in the sample is the peak area attributed to the sample-derived peak when the sample is divided into components by high-performance liquid chromatography equipped with a UV detector. It can be calculated as a percentage.
  • the qualitative properties of each peak obtained by component separation by high-performance liquid chromatography can be performed by separating each peak by preparative liquid chromatography and performing absorption spectrum and mass spectrometry in infrared spectroscopic analysis.
  • Impurities contained in the tetracarboxylic dianhydride (d) having a purity of 98% by mass or more used in the present invention mainly originate from the production of the tetracarboxylic dianhydride, such as raw material carboxylic acids and carboxylic acid esters, Catalysts such as lower carboxylic acids (eg, formic acid, acetic acid, propionic acid, etc.), acetic anhydride, p-toluenesulfonic acid, sulfonic acid-type ion exchange resins, etc., and hydrolysates of tetracarboxylic dianhydrides.
  • the tetracarboxylic dianhydride such as raw material carboxylic acids and carboxylic acid esters, Catalysts such as lower carboxylic acids (eg, formic acid, acetic acid, propionic acid, etc.), acetic anhydride, p-toluenesulfonic acid, s
  • the diamine used in the step (3) of the present invention includes the same compounds as the diamine described in the explanation of the step (1), but is not limited to these.
  • the diamine (e) having a purity of 98% by mass or more contains one or more selected from the group consisting of compounds represented by formula (3).
  • R 15 represents an oxygen atom, C(CH 3 ) 2 , C(CF 3 ) 2 or SO 2
  • R 16 and R 17 each independently represents a hydrogen atom, a hydroxyl group, a sulfonic acid or a thiol group.
  • the obtained polyimide is easily dissolved in an alkaline aqueous solution, the dissolution rate in the alkaline aqueous solution which is the developer used for development increases, and the dissolution contrast between the cured part and the uncured part of the resin composition coating film is improved. It is preferable because it becomes large and fine pattern workability is easily obtained.
  • the structure of the diamine is not particularly limited, it has a purity of 98% by mass or more, preferably a purity of 99% by mass or more, and more preferably a purity of 99.5% by mass or more.
  • a diamine having a purity of 98% by mass or more a polyimide with suppressed yellow coloration can be obtained. If the purity is less than 98% by mass, the resulting polyimide tends to have a high degree of yellowness.
  • Impurities contained in the diamine (e) with a purity of 98% by mass or more used in the present invention include mainly compounds derived from the production of the diamine.
  • a monoamine (f) having a purity of 97% by weight or more is further reacted in the step (3).
  • the ends of the polymer main chain can be end-capped with monoamines. End capping can be achieved, for example, by substituting a monoamine for a portion of the diamine.
  • monoamines include, but are not limited to, aromatic monoamines and alicyclic monoamines. Moreover, these may be used individually or in combination of 2 or more types.
  • monoamines include, but are not limited to, compounds similar to those described above in the description of step (1).
  • two or more of these monoamines may be used in combination.
  • the structure of the monoamine is not particularly limited, but preferably has a purity of 97% by mass or more, more preferably a purity of 98% by mass or more, still more preferably a purity of 99% by mass or more, and particularly preferably a purity of 99.5% by mass or more. is.
  • a diamine having a purity of 97% by mass or more a polyimide with suppressed yellow coloration can be obtained.
  • Impurities contained in the monoamine (f) with a purity of 97% by mass or more used in the present invention include mainly compounds derived from the production of the monoamine.
  • a tetracarboxylic dianhydride (d) having a purity of 98% by mass or more in a reaction solvent containing 60 to 100% by mass of water with respect to 100% by mass of the total reaction solvent A step of reacting a diamine (e) having a purity of 98% by mass or more in a temperature range of 100° C. or higher and 370° C. or lower to produce a polyimide.
  • the reaction temperature in the second aspect of the method for producing a polyimide of the present invention must be a temperature at which the tetracarboxylic dianhydride and diamine used in the reaction react to form an imide bond, so the lower limit is 100°C. be.
  • the temperature is preferably 110° C. or higher, more preferably 120° C. or higher, still more preferably 160° C. or higher, and most preferably 180° C. or higher.
  • the upper limit of the reaction temperature is 370° C. in order to avoid progress of cross-linking and decomposition of the monomer.
  • the vapor pressure of the reaction solvent that increases as the reaction temperature rises it is preferably 310° C. or lower, more preferably 250° C. or lower, and still more preferably 250° C. or lower, from the viewpoint of the pressure resistance of the reaction vessel and the handleability of the reaction. is below 230°C.
  • the polyimide of the present invention is a polyimide having a structural unit represented by formula (2).
  • R 1 represents a 4- to 14-valent organic group having 5 to 40 carbon atoms
  • R 2 represents a 2- to 12-valent organic group having 5 to 40 carbon atoms
  • R 3 and R 4 are Each independently represents a hydroxyl group, a sulfonic acid group, a thiol group, or an organic group having 1 to 20 carbon atoms
  • ⁇ and ⁇ are integers from 0 to 10 that satisfy ⁇ + ⁇ 1.
  • R 1 in formula (2) represents a residue derived from a tetracarboxylic dianhydride, which is a tetravalent to 14valent organic group having 5 to 40 carbon atoms.
  • R 2 represents a residue derived from a diamine, and the diamine is a divalent to 14-valent organic group having 5 to 40 carbon atoms.
  • Any one of R 1 and R 2 preferably contains at least one group selected from 1,1,1,3,3,3-hexafluoropropyl group, ether group, thioether group and SO 2 group, Both R 1 and R 2 may be contained.
  • both R 1 and R 2 preferably have at least one group selected from 1,1,1,3,3,3-hexafluoropropyl group, ether group, thioether group and SO 2 group.
  • R 3 and R 4 each independently represent a hydroxyl group, a sulfonic acid group, a thiol group or an organic group having 1 to 20 carbon atoms, and ⁇ and ⁇ are integers from 0 to 10 satisfying ⁇ + ⁇ 1 indicates From the viewpoint of imparting solvent solubility to the resulting polyimide, it is particularly preferred that R 3 and R 4 are hydroxyl groups.
  • R 1 in formula (2) is a residue derived from a tetracarboxylic acid dianhydride having 5 to 40 carbon atoms and 4 to 14 valences.
  • tetracarboxylic dianhydride residues include pyromellitic dianhydride, 3,3′,4,4′-biphenyltetracarboxylic dianhydride, 2,3,3′,4′-biphenyltetracarboxylic dianhydride, Carboxylic dianhydride, 2,2',3,3'-biphenyltetracarboxylic dianhydride, 3,3',4,4'-benzophenonetetracarboxylic dianhydride, 2,2',3,3 '-benzophenonetetracarboxylic dianhydride, 2,2-bis(3,4-dicarboxyphenyl)propane dianhydride, 2,2-bis(2,3-dicarboxyphenyl)propane dianhydride, 1, 1-bis
  • R 2 in formula (2) is a residue derived from a diamine to 12-valent diamine having 5 to 40 carbon atoms.
  • Diamine residues include, for example, 3,4′-diaminodiphenyl ether, 4,4′-diaminodiphenyl ether, 3,4′-diaminodiphenylmethane, 4,4′-diaminodiphenylmethane, 4,4′-diaminodiphenylmethane, 3, 4'-diaminodiphenyl sulfone, 4,4'-diaminodiphenyl sulfone, 3,4'-diaminodiphenyl sulfide, 4,4'-diaminodiphenyl sulfide, 1,4-bis(4-aminophenoxy)benzene, benzine, m -phenylenediamine, p-phenylenediamine, 1,5-naphthalenediamine, 2,6-
  • At least one of the main chain ends of the polyimide of the present invention preferably contains a structure blocked with a terminal blocking agent.
  • a residue derived from monoamine can be preferably exemplified.
  • Monoamine residues include, for example, 5-amino-8-hydroxyquinoline, 1-hydroxy-7-aminonaphthalene, 1-hydroxy-6-aminonaphthalene, 1-hydroxy-5-aminonaphthalene, 1-hydroxy-4- aminonaphthalene, 2-hydroxy-7-aminonaphthalene, 2-hydroxy-6-aminonaphthalene, 2-hydroxy-5-aminonaphthalene, 1-carboxy-7-aminonaphthalene, 1-carboxy-6-aminonaphthalene, 1- Carboxy-5-aminonaphthalene, 2-carboxy-7-aminonaphthalene, 2-carboxy-6-aminonaphthalene, 2-carboxy-5-aminonaphthalene, 2-aminobenzoic acid
  • the introduction ratio of the terminal blocking agent to the polyimide terminal is in the range of 0.1 to 60 mol% with respect to the total amine component when converted to the primary monoamine component of the terminal blocking agent, which is the original component. It is preferably 5 to 50 mol %, more preferably 5 to 50 mol %.
  • an aliphatic compound having a siloxane structure in R 1 and R 2 in the formula (3) is used within a range that does not reduce the heat resistance.
  • the groups may be copolymerized.
  • Specific examples of the diamine component include those obtained by copolymerizing 1 to 10 mol % of bis(3-aminopropyl)tetramethyldisiloxane, bis(p-amino-phenyl)octamethylpentasiloxane, or the like.
  • the polyimide of the present invention preferably has a weight average molecular weight of 1,000 or more and 200,000 or less, more preferably 5,000 or more and 100,000 or less, and 10,000 or more and 50,000 or less. is more preferred. Within this range, good workability, mechanical properties, and heat resistance can be obtained.
  • the weight average molecular weight is measured by a gel permeation chromatography method (GPC method) and calculated in terms of polystyrene.
  • the polyimide of the present invention is preferably solvent-soluble.
  • Alkali-soluble is particularly preferred.
  • the solvent-soluble resin as used herein refers to a resin that dissolves at 25° C. in an amount of 0.1 g or more in 100 g of an organic solvent or an alkaline aqueous solution.
  • Organic solvents include ⁇ -butyrolactone, ⁇ -valerolactone, ⁇ -valerolactone, dimethylsulfoxide, tetrahydrofuran, dioxane, propylene glycol monomethyl ether, propylene glycol monoethyl ether, acetone, methyl ethyl ketone, cyclopentanone, cyclohexanone, ethyl acetate, Butyl acetate, isobutyl acetate, propyl acetate, propylene glycol monomethyl ether acetate, 3-methyl-3-methoxybutyl acetate, methyl lactate, ethyl lactate, diacetone alcohol, 3-methyl-3-methoxybutanol, toluene, xylene, N- methyl-2-pyrrolidone, N-ethyl-2-pyrrolidone, N,N-dimethylformamide, N,N-dimethylacetamide, 1,
  • alkaline aqueous solutions include tetramethylammonium hydroxide (TMAH), diethanolamine, diethylaminoethanol, sodium hydroxide, potassium hydroxide, sodium carbonate, potassium carbonate, triethylamine, diethylamine, methylamine, dimethylamine, dimethylaminoethyl acetate, dimethylamino Aqueous solutions of ethanol, dimethylaminoethyl methacrylate, cyclohexylamine, ethylenediamine, hexamethylenediamine and the like can be mentioned.
  • TMAH tetramethylammonium hydroxide
  • diethanolamine diethylaminoethanol
  • sodium hydroxide sodium hydroxide
  • potassium hydroxide sodium carbonate
  • potassium carbonate potassium carbonate
  • triethylamine diethylamine
  • methylamine dimethylamine
  • dimethylaminoethyl acetate dimethylamino Aqueous solutions of ethanol, dimethylaminoe
  • the polyimide is solvent-soluble
  • a photosensitive resin composition using a polyimide solution in which the polyimide is dissolved can be developed, and from the viewpoint that an alkaline solution can be used as a developer, it is particularly alkali-soluble.
  • an alkaline solution can be used as a developer, it is particularly alkali-soluble.
  • the polyimide of the present invention preferably has a hydroxyl group, a sulfonic acid group, a thiol group, or an organic group having 1 to 20 carbon atoms as described above, and the dissolution rate in an alkaline aqueous solution as a developer is A hydroxyl group is particularly preferable from the viewpoint that it becomes larger, the dissolution contrast between the cured portion and the uncured portion of the resin composition coating film increases, and fine pattern workability can be easily obtained.
  • the polyimide of the present invention preferably has a light transmittance of 90% or more, more preferably 95% or more, and even more preferably 99% or more at a wavelength of 365 nm per 1 ⁇ m film thickness. Within this range, fine pattern workability can be expressed even in a thick film of 20 ⁇ m or more when the photosensitive resin composition is formed.
  • the polyimide of the present invention has a yellowness in the range of 0 to 3.0. If the yellowness is out of this range, the transparency will be impaired and the appearance will be poor, making it unsuitable for use in semiconductor devices and circuit boards.
  • the yellowness referred to here means that a polyimide solution in which polyimide is dissolved in an organic solvent is applied onto a substrate, and the solvent is removed by drying to prepare a polyimide film, and the obtained film is measured by a C light source color meter. Indicates a value calculated by measurement.
  • the yellowness index preferably ranges from 0 to 2.8, more preferably from 0 to 2.5.
  • the polyimide of the present invention has an organic solvent content of 1% by mass or less and does not substantially contain an organic solvent.
  • the content is preferably 0.1% by mass or less, and more preferably 0% by mass.
  • 0% by mass means that the organic solvent is not contained at all.
  • the content of organic solvents can be calculated by high-performance liquid chromatography, gas chromatography, and measuring the total organic carbon concentration (TOC).
  • TOC total organic carbon concentration
  • water-soluble components are extracted from polyimide obtained by polymerization using distilled water, and the concentration of extracted organic carbon is measured to calculate the content of organic solvent in the sample.
  • the polyimide resin composition of the present invention contains the polyimide represented by the formula (2), a photosensitizer and a solvent.
  • a photoacid generator As the photosensitizer, a photoacid generator, a photobase generator, a photopolymerization initiator, etc. can be used.
  • a photoacid generator When a photoacid generator is used, an acid is generated in the light-irradiated portion of the resin composition, and the solubility of the light-irradiated portion in an alkaline developer increases, so that a positive pattern in which the light-irradiated portion dissolves is obtained. be able to.
  • a photopolymerization initiator When a photopolymerization initiator is used, radicals are generated in the light-irradiated portion of the resin composition, radical polymerization proceeds, and the resin composition becomes insoluble in an alkaline developer, thereby forming a negative pattern. .
  • UV curing during exposure is accelerated, and sensitivity can be improved.
  • a quinonediazide compound can be exemplified as the photoacid generator, and a compound in which a sulfonic acid of naphthoquinonediazide is bonded to a compound having a phenolic hydroxyl group via an ester is preferable.
  • Examples of compounds having a phenolic hydroxyl group used here include Bis-Z, BisOC-Z, BisOPP-Z, BisP-CP, Bis26X-Z, BisOTBP-Z, BisOCHP-Z, BisOCR-CP, and BisP-MZ.
  • BisP-EZ Bis26X-CP, BisP-PZ, BisP-IPZ, BisCR-IPZ, BisOCP-IPZ, BisOIPP-CP, Bis26X-IPZ, BisOTBP-CP, TekP-4HBPA (tetrakis P-DO-BPA), TrisP -HAP, TrisP-PA, BisOFP-Z, BisRS-2P, BisPG-26X, BisRS-3P, BisOC-OCHP, BisPC-OCHP, Bis25X-OCHP, Bis26X-OCHP, BisOCHP-OC, Bis236T-OCHP, methylene tris- FR-CR, BisRS-26X, BisRS-OCHP (trade names, manufactured by Honshu Chemical Industry Co., Ltd.), BIR-OC, BIP-PC, BIR-PC, BIR-PTBP, BIR-PCHP, BIP-BIOC- F, 4PC, BIR-BIPC-F, TEP-BIP-A (trade names, manufactured by Asahi Organic
  • Preferable examples are those obtained by introducing 4-naphthoquinonediazide sulfonic acid or 5-naphthoquinone diazide sulfonic acid into these compounds having a phenolic hydroxyl group via an ester bond, and compounds other than these can also be used.
  • Photopolymerization initiators include compounds containing polymerizable unsaturated functional groups. Examples include unsaturated triple bond functional groups such as propargyl, and among these, conjugated vinyl groups, acryloyl groups, and methacryloyl groups are preferred from the standpoint of polymerizability.
  • the number of functional groups contained is preferably 1 to 4 from the standpoint of stability, and the groups do not have to be the same. Further, the compound referred to herein means one having a molecular weight of 30-800.
  • benzophenones such as benzophenone, Michler's ketone, 4,4,-bis(diethylamino)benzophenone, 3,3,4,4,-tetra(t-butylperoxycarbonyl)benzophenone, and 3,5- benzylidenes such as bis(diethylaminobenzylidene)-N-methyl-4-piperidone, 3,5-bis(diethylaminobenzylidene)-N-ethyl-4-piperidone, 7-diethylamino-3-thenonylcoumarin, 4,6- dimethyl-3-ethylaminocoumarin, 3,3-carbonylbis(7-diethylaminocoumarin), 7-diethylamino-3-(1-methylmethylbenzimidazolyl)coumarin, 3-(2-benzothiazolyl)-7-diethylaminocoumarin, etc.
  • benzophenones such as benzophenone, Michler's ketone, 4,4,-bis(
  • anthraquinones such as 2-t-butylanthraquinone, 2-ethylanthraquinone, 1,2-benzanthraquinone, benzoins such as benzoin methyl ether, benzoin ethyl ether, and benzoin isopropyl ether, 2,4-dimethylthioxanthone, 2 Thioxanthones such as ,4-diethylthioxanthone, 2,4-diisopropylthioxanthone, 2-isopropylthioxanthone, ethylene glycol di(3-mercaptopropionate), 2-mercaptobenzthiazole, 2-mercaptobenzoxazole, 2-mercapto mercaptos such as benzimidazole, glycines such as N-phenylglycine, N-methyl-N-phenylglycine, N-ethyl-N-(p-chlorophenyl)g
  • the content of the photosensitizer is not particularly limited, but is preferably 0.1 parts by mass or more, more preferably 0.5 parts by mass or more, and 0.7 parts by mass with respect to 100 parts by mass of the polyimide in the resin composition.
  • the above is more preferable, and 1 part by mass or more is particularly preferable.
  • the content of the photosensitive agent is preferably 25 parts by mass or less, more preferably 20 parts by mass or less, still more preferably 17 parts by mass or less, with respect to 100 parts by mass of the polyimide in the resin composition.
  • the resolution after development can be improved as content of a photosensitive agent is in the said range.
  • Solvents contained in the polyimide resin composition of the present invention include, for example, ⁇ -butyrolactone, ⁇ -valerolactone, ⁇ -valerolactone, dimethylsulfoxide, tetrahydrofuran, dioxane, propylene glycol monomethyl ether, propylene glycol monoethyl ether, acetone, methyl ethyl ketone.
  • cyclopentanone cyclohexanone, ethyl acetate, butyl acetate, isobutyl acetate, propyl acetate, propylene glycol monomethyl ether acetate, 3-methyl-3-methoxybutyl acetate, methyl lactate, ethyl lactate, diacetone alcohol, 3-methyl-3 -methoxybutanol, toluene, xylene, N-methyl-2-pyrrolidone, N-ethyl-2-pyrrolidone, N,N-dimethylformamide, N,N-dimethylacetamide, 1,3-dimethyl-2-imidazolidinone, N,N'-dimethylpropylene urea, 1,3-dimethylisobutyramide, methoxy-N,N-dimethylpropionamide, butoxy-N,N-dimethylpropionamide, dimethylsulfoxide, and the like, but are not limited to these.
  • solvents that pose health or environmental concerns specifically solvents that are subject to regulations in each country such as REACH regulations, N-methyl-2-pyrrolidone, N,N-dimethylformamide, For example, N,N-dimethylacetamide is not used.
  • the polyimide resin composition of the present invention contains 0% by mass of solvents that pose health and environmental concerns that are subject to regulations in various countries such as REACH regulations. be.
  • 0% by mass means that no organic solvent is contained.
  • the content of the solvent is not particularly limited, it is preferably 100 parts by mass or more and 10,000 parts by mass or less, more preferably 100 parts by mass or more and 5,000 parts by mass or less, relative to 100 parts by mass of the polyimide in the resin composition. 100 parts by mass or more and 2,000 parts by mass or less is particularly preferable.
  • the content of the solvent is preferable in terms of being able to form a coating film having a thickness of 1 ⁇ m or more with excellent coatability and flatness of the coating film.
  • the polyimide resin composition of the present invention can also contain additives such as cross-linking agents, cross-linking accelerators, sensitizers, dissolution modifiers, surfactants, stabilizers and antifoaming agents, if necessary.
  • the cured product of the present invention is a cured product obtained by curing the polyimide resin composition.
  • the method for obtaining the cured product of the present invention includes the steps of applying a polyimide resin composition on a substrate and drying to form a polyimide resin film on the substrate, exposing the photosensitive resin film, and the polyimide
  • a method including a step of removing an unexposed portion of the resin film with a developer and developing the film, and a step of heat-treating the polyimide resin film after the development to obtain a cured product can be exemplified.
  • the step of applying the polyimide resin composition onto a substrate and drying to form a polyimide resin film on the substrate includes, for example, applying the polyimide resin composition to a spin coater, a spray coater, a screen coater, a blade coater, and a die coater. , calendar coater, meniscus coater, bar coater, roll coater, comma roll coater, gravure coater, slit die coater, etc., and dried at a temperature of 50 ° C or higher and 150 ° C or lower for 1 minute or more and several hours or less.
  • Polyimide Examples include, but are not limited to, a step of forming a resin film.
  • 365 nm i-line, 405 nm h-line, and 432 nm g-line of a high pressure mercury lamp are exposed at 50 mJ or more and 3,000 mJ or less. but not limited to this.
  • the polyimide resin film exposed by the above process may be baked after exposure. Post-exposure baking is preferably performed at 50° C. or higher from the viewpoint of curability and adhesion to the substrate, and preferably at 150° C. or lower from the viewpoint of resolution.
  • the step of removing the unexposed portion of the polyimide resin film with a developer for development includes, for example, spraying the developer onto the surface of the polyimide resin film, heaping the developer onto the film surface, immersing the film in the developer, Alternatively, a process of immersing and applying ultrasonic waves may be mentioned, but is not limited to these.
  • Developing conditions such as the developing time and the temperature of the developer in the developing step may be any conditions as long as the exposed portion can be removed and the pattern can be formed.
  • an alkali developer when an alkali developer is used, an aqueous solution of tetramethylammonium, diethanolamine, diethylaminoethanol, sodium hydroxide, potassium hydroxide, sodium carbonate, potassium carbonate, triethylamine, diethylamine, methylamine, dimethylamine, dimethylamino acetate.
  • Aqueous solutions of alkaline compounds such as ethyl, dimethylaminoethanol, dimethylaminoethyl methacrylate, cyclohexylamine, ethylenediamine and hexamethylenediamine are preferred.
  • the developer at this time includes N-methyl-2-pyrrolidone, N-acetyl-2-pyrrolidone, N,N-dimethylacetamide, N,N-dimethylformamide, dimethylsulfoxide, hexa
  • a polar solvent such as methyl phosphortriamide alone or in combination with methanol, ethanol, isopropyl alcohol, xylene, water, methyl carbitol, ethyl carbitol, or the like can be used.
  • alcohols such as ethanol and isopropyl alcohol, and esters such as ethyl lactate and propylene glycol monomethyl ether acetate may be added to water for rinsing.
  • esters such as ethyl lactate and propylene glycol monomethyl ether acetate
  • an alcohol such as ethanol or isopropyl alcohol, ethyl lactate, propylene glycol monomethyl ether acetate, or the like may be added to water for rinsing.
  • the heat treatment is performed at a temperature of 150° C. or higher and 500° C. or lower for 5 minutes or more and 5 hours or less to advance the thermal cross-linking reaction. but not limited thereto.
  • a method of selecting a temperature and increasing the temperature stepwise or a method of selecting a certain temperature range and increasing the temperature continuously can be selected.
  • the former includes, for example, a method of heat-treating at 130° C. and 200° C. for 30 minutes each, but is not limited to this.
  • the latter includes, but is not limited to, a method of linearly increasing the temperature from room temperature to 400° C. over 2 hours.
  • the resin composition was applied on a copper substrate using a spin coater (1H-360S manufactured by Mikasa Co., Ltd.), and a hot plate (SCW manufactured by Dainippon Screen Co., Ltd.) -636) and dried by heating at 100° C. for 3 minutes to form a coating film of 10 ⁇ m.
  • TMAH tetramethylammonium hydroxide
  • the patterned portion was observed using an FPD microscope (MX61, manufactured by Olympus Corporation) to determine the minimum pattern size free from abnormalities such as development residues, and fine pattern processability was evaluated based on the following criteria. It was determined that the smaller the minimum pattern size, the better the pattern workability.
  • Viscosity increase rate is less than 5%
  • B Viscosity increase rate is 5% or more and less than 10%
  • C Viscosity increase rate is 10% or more.
  • Purity is the ratio of the peak area attributed to the main component in the sample to the peak area attributed to the sample-derived peak when the components are divided.
  • Purity main component weight / (main component weight + impurity weight ).
  • ODPA-1 4,4'-oxydiphthalic anhydride purity 98% by mass
  • ODPA-2 4,4'-oxydiphthalic anhydride purity 95% by mass
  • ODPA-2 4-(2,5-dioxotetrahydrofuran-3-yl)-1,2,3,4-tetrahydronaphthalene-1,2-dicarboxylic dianhydride purity 99 mass%
  • TDA-1 Bis (3,4-dicarboxyphenyl) sulfonic acid dianhydride purity 98% by mass
  • BAHF-1 2,2-bis (3-amino-4-hydroxyphenyl) hexafluoropropane purity 95 mass%
  • BAHF-2) 1,3-bis(3-aminopropyl)tetramethyld
  • Example 1 31.02 g (0.1 mol) of 4,4′-oxydiphthalic anhydride (ODPA-2) and 2,2-bis(3-amino-4-hydroxyphenyl)hexanone were placed in a stainless steel autoclave equipped with a stirrer. 36.63 g (0.1 mol) of fluoropropane (BAHF-1) and 255 g of deionized water were charged. After the reaction vessel was sealed under nitrogen gas at room temperature and normal pressure, the temperature was raised from room temperature to 100° C. while stirring at 150 rpm. The pressure in the reaction system at this stage was 0.1 MPa in gauge pressure. After being held at 100° C. for 10 hours, it was allowed to cool to around room temperature.
  • ODPA-2 4,4′-oxydiphthalic anhydride
  • BAHF-1 fluoropropane
  • the resulting content was filtered using a filter paper with a pore size of 1 ⁇ m to recover the solid content.
  • the obtained solid content was subjected to vacuum drying at 50° C. for 12 hours to obtain polyimide (P1).
  • P1 was measured by infrared absorption spectrum, absorption peaks of an imide structure due to polyimide were detected near 1,780 cm ⁇ 1 and 1,377 cm ⁇ 1 . Moreover, the weight average molecular weight was 6,000.
  • the obtained P1 was placed in a heat dryer, and after a reduced pressure atmosphere (133 Pa), the temperature was raised to 180°C. After being held at 180° C. for 12 hours, it was allowed to cool to around room temperature to obtain polyimide (P1′).
  • P1′ was measured by an infrared absorption spectrum, absorption peaks of an imide structure due to polyimide were detected near 1,780 cm ⁇ 1 and 1,377 cm ⁇ 1 .
  • the obtained P1′ was evaluated according to the evaluation methods (1), (2), (3) and (4) above.
  • a resin composition was prepared by pressure filtration using a 1 ⁇ m filter. The prepared resin composition was evaluated according to the evaluation methods (5) and (6) above.
  • Example 2 31.02 g (0.1 mol) of ODPA-2, 30.03 g (0.082 mol) of BAHF-1 and 1,3-bis(3-aminopropyl)tetramethyl are placed in a stainless steel autoclave equipped with a stirrer. 1.24 g (0.005 mol) of disiloxane (SiDA-1), 2.73 (0.025 mol) of 3-aminophenol (MAP-1) and 255 g of deionized water were charged. After the reaction vessel was sealed under nitrogen gas at room temperature and normal pressure, the temperature was raised from room temperature to 120° C. while stirring at 150 rpm. The pressure in the reaction system at this stage was 0.2 MPa in gauge pressure. After being held at 120° C.
  • the obtained P2 was placed in a heat dryer and heated to 220° C. under a nitrogen stream. After being held at 220° C. for 10 hours, it was allowed to cool to around room temperature to obtain polyimide (P2′).
  • P2′ was measured by an infrared absorption spectrum, absorption peaks of an imide structure due to polyimide were detected near 1,780 cm ⁇ 1 and 1,377 cm ⁇ 1 .
  • the resulting P2' was evaluated according to the evaluation methods (1), (2), (3) and (4) above.
  • a resin composition was prepared in the same manner as in Example 1, except that P2' was used instead of P1'.
  • the prepared resin composition was evaluated according to the evaluation methods (5) and (6) above.
  • Example 3 A stainless steel autoclave equipped with a stirrer was charged with 31.02 g (0.1 mol) of ODPA-2, 32.96 g (0.09 mol) of BAHF-1, and 1.0 g of p-aminobenzoic acid (AA-1). 51 g (0.01 mol) and 255 g of deionized water were charged. After the reaction vessel was sealed under nitrogen gas at room temperature and normal pressure, the temperature was raised from room temperature to 160° C. while stirring at 150 rpm. The pressure in the reaction system at this stage was 0.6 MPa in gauge pressure. After being held at 160° C. for 4 hours, it was allowed to cool to near room temperature.
  • the obtained contents were separated by filtration using filter paper with a pore size of 1 ⁇ m, and the solid content was recovered.
  • the obtained solid content was subjected to vacuum drying at 50° C. for 12 hours to obtain polyimide (P3).
  • P3 was measured by an infrared absorption spectrum, absorption peaks of an imide structure due to polyimide were detected near 1,780 cm ⁇ 1 and 1,377 cm ⁇ 1 .
  • the weight average molecular weight was 10,300.
  • the obtained P3 was placed in a heat dryer, and after a reduced pressure atmosphere (133 Pa), the temperature was raised to 120°C. After being held at 120° C. for 24 hours, it was allowed to cool to around room temperature to obtain polyimide (P3′).
  • P3′ was measured by an infrared absorption spectrum, absorption peaks of an imide structure due to polyimide were detected near 1,780 cm ⁇ 1 and 1,377 cm ⁇ 1 .
  • the resulting P3' was evaluated according to the evaluation methods (1), (2), (3) and (4) above.
  • a resin composition was prepared in the same manner as in Example 1, except that P3' was used instead of P1'.
  • the prepared resin composition was evaluated according to the evaluation methods (5) and (6) above.
  • Example 4 A stainless steel autoclave equipped with a stirrer was charged with 35.83 g (0.1 mol) of bis(3,4-dicarboxyphenyl)sulfonic dianhydride (BCSA-1) and 30.03 g (0.1 mol) of BAHF-1. 085 mol), 2.33 g (0.025 mol) of aniline (A-1), and 255 g of deionized water were charged. After the inside of the reaction vessel was replaced with nitrogen gas at room temperature and normal pressure, the temperature was raised from room temperature to 180° C. while stirring at 150 rpm. The pressure in the reaction system at this stage was 1.0 MPa in gauge pressure. After being held at 180° C. for 4 hours, it was allowed to cool to around room temperature.
  • BCSA-1 bis(3,4-dicarboxyphenyl)sulfonic dianhydride
  • the obtained contents were separated by filtration using filter paper with a pore size of 1 ⁇ m, and the solid content was recovered.
  • the obtained solid content was subjected to vacuum drying at 50° C. for 12 hours to obtain polyimide (P4).
  • P4 was measured by an infrared absorption spectrum, absorption peaks of an imide structure due to polyimide were detected near 1,780 cm ⁇ 1 and 1,377 cm ⁇ 1 . Moreover, the weight average molecular weight was 13,400.
  • the obtained P4 was placed in a heat dryer, and after a reduced pressure atmosphere (133 Pa), the temperature was raised to 240°C. After being held at 240° C. for 5 hours, it was allowed to cool to around room temperature to obtain polyimide (P4′).
  • a resin composition was prepared in the same manner as in Example 1, except that P4' was used instead of P1'.
  • the prepared resin composition was evaluated according to the evaluation methods (5) and (6) above.
  • Example 5 4-(2,5-dioxotetrahydrofuran-3-yl)-1,2,3,4-tetrahydronaphthalene-1,2-dicarboxylic dianhydride (TDA-1) was placed in a stainless steel autoclave equipped with a stirrer. 30.03 g (0.1 mol) of , 32.96 g (0.09 mol) of BAHF-1, 2.18 g (0.02 mol) of MAP-1, and 255 g of deionized water were charged. After the reaction vessel was sealed under nitrogen gas at room temperature and normal pressure, the temperature was raised from room temperature to 150° C. while stirring at 150 rpm. The pressure in the reaction system at this stage was 0.5 MPa in gauge pressure.
  • TDA-1 4-(2,5-dioxotetrahydrofuran-3-yl)-1,2,3,4-tetrahydronaphthalene-1,2-dicarboxylic dianhydride
  • P5′ polyimide
  • P5′ was measured by an infrared absorption spectrum, absorption peaks of an imide structure due to polyimide were detected near 1,780 cm ⁇ 1 and 1,377 cm ⁇ 1 .
  • the resulting P5' was evaluated according to the evaluation methods (1), (2), (3) and (4) above.
  • a resin composition was prepared in the same manner as in Example 1, except that P5' was used instead of P1'.
  • the prepared resin composition was evaluated according to the evaluation methods (5) and (6) above.
  • Example 6 A stainless steel autoclave equipped with a stirrer was charged with 31.02 g (0.1 mol) of ODPA-2, 33.43 g (0.1 mol) of BAHF-1, and 255 g of deionized water. After the reaction vessel was sealed under nitrogen gas at room temperature and normal pressure, the temperature was raised from room temperature to 120° C. while stirring at 150 rpm. The pressure in the reaction system at this stage was 0.2 MPa in gauge pressure. After being held at 120° C. for 4 hours, it was allowed to cool to around room temperature. The obtained contents were separated by filtration using filter paper with a pore size of 1 ⁇ m, and the solid content was recovered. The obtained solid content was subjected to vacuum drying at 50° C.
  • polyimide (P6).
  • P6 was measured by an infrared absorption spectrum, absorption peaks of an imide structure due to polyimide were detected near 1,780 cm ⁇ 1 and 1,377 cm ⁇ 1 . Moreover, the weight average molecular weight was 12,000.
  • the obtained P6 was placed in a heat dryer and heated to 180° C. under a nitrogen stream. After being held at 180° C. for 12 hours, it was allowed to cool to around room temperature to obtain polyimide (P6′).
  • P6′ was measured by an infrared absorption spectrum, absorption peaks of an imide structure due to polyimide were detected near 1,780 cm ⁇ 1 and 1,377 cm ⁇ 1 .
  • the resulting P6' was evaluated according to the evaluation methods (1), (2), (3) and (4) above.
  • a resin composition was prepared in the same manner as in Example 1, except that P6' was used instead of P1'.
  • the prepared resin composition was evaluated according to the evaluation methods (5) and (6) above.
  • Example 7 31.02 g (0.1 mol) of ODPA-2, 28.41 g (0.085 mol) of BAHF-1, and 2.33 g (0.025 mol) of A-1 in a stainless steel autoclave equipped with a stirrer , 255 g of ion-exchanged water was charged. After the reaction vessel was sealed under nitrogen gas at room temperature and normal pressure, the temperature was raised from room temperature to 160° C. while stirring at 150 rpm. The pressure in the reaction system at this stage was 0.6 MPa in gauge pressure. After being held at 160° C. for 4 hours, it was allowed to cool to near room temperature. The obtained contents were separated by filtration using filter paper with a pore size of 1 ⁇ m, and the solid content was recovered.
  • the obtained solid content was subjected to vacuum drying at 50° C. for 12 hours to obtain polyimide (P7).
  • P7 was measured by an infrared absorption spectrum, absorption peaks of an imide structure due to polyimide were detected near 1,780 cm ⁇ 1 and 1,377 cm ⁇ 1 .
  • the weight average molecular weight was 11,500.
  • the obtained P7 was placed in a heat dryer and heated to 180° C. under a nitrogen stream. After being held at 180° C. for 24 hours, it was allowed to cool to around room temperature to obtain polyimide (P7′).
  • P7′ was measured by an infrared absorption spectrum, absorption peaks of an imide structure due to polyimide were detected near 1,780 cm ⁇ 1 and 1,377 cm ⁇ 1 .
  • the resulting P7' was evaluated according to the evaluation methods (1), (2), (3) and (4) above.
  • a resin composition was prepared in the same manner as in Example 1, except that P7' was used instead of P1'.
  • the prepared resin composition was evaluated according to the evaluation methods (5) and (6) above.
  • Example 8 31.02 g (0.1 mol) of ODPA-2, 28.41 g (0.085 mol) of BAHF-1, and 2.73 g (0.025 mol) of MAP-1 in a stainless steel autoclave equipped with a stirrer , 255 g of ion-exchanged water was charged. After the reaction vessel was sealed under nitrogen gas at room temperature and normal pressure, the temperature was raised from room temperature to 160° C. while stirring at 150 rpm. The pressure in the reaction system at this stage was 0.6 MPa in gauge pressure. After being held at 160° C. for 4 hours, it was allowed to cool to around room temperature. The obtained contents were separated by filtration using filter paper with a pore size of 1 ⁇ m, and the solid content was recovered.
  • the obtained solid content was subjected to vacuum drying at 50° C. for 12 hours to obtain polyimide (P8).
  • P8 was measured by an infrared absorption spectrum, absorption peaks of an imide structure due to polyimide were detected near 1,780 cm ⁇ 1 and 1,377 cm ⁇ 1 .
  • the weight average molecular weight was 10,800.
  • the obtained P8 was placed in a heat dryer and heated to 180° C. under a nitrogen stream. After holding at 180° C. for 24 hours, it was allowed to cool to around room temperature to obtain polyimide (P8′).
  • P8′ was measured by an infrared absorption spectrum, absorption peaks of an imide structure due to polyimide were detected near 1,780 cm ⁇ 1 and 1,377 cm ⁇ 1 .
  • the resulting P8' was evaluated according to the evaluation methods (1), (2), (3) and (4) above.
  • a resin composition was prepared in the same manner as in Example 1, except that P8' was used instead of P1'.
  • the prepared resin composition was evaluated according to the evaluation methods (5) and (6) above.
  • Example 9 31.02 g (0.1 mol) of ODPA-2, 28.41 g (0.085 mol) of BAHF-1, and 3-aniline sulfonic acid (AS-1) were placed in a stainless steel autoclave equipped with a stirrer. 33 g (0.025 mol) and 255 g of deionized water were charged. After the reaction vessel was sealed under nitrogen gas at room temperature and normal pressure, the temperature was raised from room temperature to 160° C. while stirring at 150 rpm. The pressure in the reaction system at this stage was 0.6 MPa in gauge pressure. After being held at 160° C. for 4 hours, it was allowed to cool to around room temperature.
  • the obtained contents were separated by filtration using filter paper with a pore size of 1 ⁇ m, and the solid content was recovered.
  • the obtained solid content was subjected to vacuum drying at 50° C. for 12 hours to obtain a polyimide (P9).
  • P9 was measured by an infrared absorption spectrum, absorption peaks of an imide structure due to polyimide were detected near 1,780 cm ⁇ 1 and 1,377 cm ⁇ 1 .
  • the weight average molecular weight was 9,500.
  • the obtained P9 was placed in a heat dryer and heated to 180° C. under a nitrogen stream. After being held at 180° C. for 24 hours, it was allowed to cool to around room temperature to obtain polyimide (P9′).
  • P9′ was measured by an infrared absorption spectrum, absorption peaks of an imide structure due to polyimide were detected near 1,780 cm ⁇ 1 and 1,377 cm ⁇ 1 .
  • the resulting P9' was evaluated according to the evaluation methods (1), (2), (3) and (4) above.
  • a resin composition was prepared in the same manner as in Example 1, except that P9' was used instead of P1'.
  • the prepared resin composition was evaluated according to the evaluation methods (5) and (6) above.
  • Example 10 31.02 g (0.1 mol) of ODPA, 28.41 g (0.085 mol) of BAHF-1, 3.13 g (AB-1) of 3-aminobenzenethiol (AB-1) were added to a stainless steel autoclave equipped with a stirrer. 0.025 mol) and 255 g of ion-exchanged water were charged. After the reaction vessel was sealed under nitrogen gas at room temperature and normal pressure, the temperature was raised from room temperature to 160° C. while stirring at 150 rpm. The pressure in the reaction system at this stage was 0.6 MPa in gauge pressure. After being held at 160° C. for 4 hours, it was allowed to cool to around room temperature.
  • the obtained contents were separated by filtration using filter paper with a pore size of 1 ⁇ m, and the solid content was recovered.
  • the obtained solid content was subjected to vacuum drying at 50° C. for 12 hours to obtain polyimide (P10).
  • P10 was measured by an infrared absorption spectrum, absorption peaks of an imide structure due to polyimide were detected near 1,780 cm ⁇ 1 and 1,377 cm ⁇ 1 .
  • the weight average molecular weight was 10,800.
  • the obtained P10 was placed in a heat dryer and heated to 180° C. under a nitrogen stream. After holding at 180° C. for 24 hours, it was allowed to cool to around room temperature to obtain polyimide (P10′).
  • P10′ was measured by an infrared absorption spectrum, absorption peaks of an imide structure due to polyimide were detected near 1,780 cm ⁇ 1 and 1,377 cm ⁇ 1 .
  • the obtained P10′ was evaluated according to the evaluation methods (1), (2), (3) and (4) above.
  • a resin composition was prepared in the same manner as in Example 1, except that P10' was used instead of P1'.
  • the prepared resin composition was evaluated according to the evaluation methods (5) and (6) above.
  • Example 11 31.02 g (0.1 mol) of ODPA-2, 30.03 g (0.082 mol) of BAHF-1, and 1.24 g (0.005 mol) of SiDA-1 in a stainless steel autoclave equipped with a stirrer , 2.73 (0.025 mol) of MAP-1, 204 g of deionized water, and 51 g of methanol were charged. After the reaction vessel was sealed under nitrogen gas at room temperature and normal pressure, the temperature was raised from room temperature to 120° C. while stirring at 150 rpm. The pressure in the reaction system at this stage was 0.3 MPa in gauge pressure. After being held at 120° C. for 4 hours, it was allowed to cool to near room temperature.
  • the obtained contents were separated by filtration using filter paper with a pore size of 1 ⁇ m, and the solid content was recovered.
  • the obtained solid content was subjected to vacuum drying at 50° C. for 12 hours to obtain polyimide (P11).
  • P11 was measured by an infrared absorption spectrum, absorption peaks of an imide structure due to polyimide were detected near 1,780 cm ⁇ 1 and 1,377 cm ⁇ 1 . Moreover, the weight average molecular weight was 7,000.
  • the obtained P11 was placed in a heat dryer, and after a reduced pressure atmosphere (133 Pa), the temperature was raised to 180°C. After holding at 180° C. for 12 hours, it was allowed to cool to around room temperature to obtain polyimide (P11′).
  • P11′ was measured by an infrared absorption spectrum, absorption peaks of an imide structure due to polyimide were detected near 1,780 cm ⁇ 1 and 1,377 cm ⁇ 1 .
  • the obtained P11′ was evaluated according to the evaluation methods (1), (2), (3) and (4) above.
  • a resin composition was prepared in the same manner as in Example 1, except that P11' was used instead of P1'.
  • the prepared resin composition was evaluated according to the evaluation methods (5) and (6) above.
  • Example 12 A stainless steel autoclave equipped with a stirrer was charged with 31.02 g (0.1 mol) of ODPA-2, 36.63 g (0.1 mol) of BAHF-1, and 255 g of deionized water. After the reaction vessel was sealed under nitrogen gas at room temperature and normal pressure, the temperature was raised from room temperature to 80° C. while stirring at 150 rpm. The pressure in the reaction system at this stage was 0.0 MPa in gauge pressure. After being held at 80° C. for 10 hours, it was allowed to cool to near room temperature. The obtained contents were separated by filtration using filter paper with a pore size of 1 ⁇ m, and the solid content was recovered. The obtained solid content was subjected to vacuum drying at 50° C.
  • polyimide (P12).
  • P12 was measured by an infrared absorption spectrum, absorption peaks of an imide structure due to polyimide were detected near 1,780 cm ⁇ 1 and 1,377 cm ⁇ 1 . Moreover, the weight average molecular weight was 4,000.
  • the obtained P12 was placed in a heat dryer, and after a reduced pressure atmosphere (133 Pa), the temperature was raised to 180°C. After holding at 180° C. for 12 hours, it was allowed to cool to around room temperature to obtain polyimide (P12′).
  • P12′ was measured by an infrared absorption spectrum, absorption peaks of an imide structure due to polyimide were detected near 1,780 cm ⁇ 1 and 1,377 cm ⁇ 1 .
  • the resulting P12' was evaluated according to the evaluation methods (1), (2), (3) and (4) above.
  • a resin composition was prepared in the same manner as in Example 1, except that P12' was used instead of P1'.
  • the prepared resin composition was evaluated according to the evaluation methods (5) and (6) above.
  • Example 13 31.02 g (0.1 mol) of ODPA-2, 30.03 g (0.082 mol) of BAHF-1, and 1.24 g (0.005 mol) of SiDA-1 in a stainless steel autoclave equipped with a stirrer , 2.73 (0.025 mol) of MAP-1 and 255 g of deionized water were charged. After the reaction vessel was sealed under nitrogen gas at room temperature and normal pressure, the temperature was raised from room temperature to 100° C. while stirring at 150 rpm. The pressure in the reaction system at this stage was 0.0 MPa in gauge pressure. After being held at 100° C. for 5 hours, it was allowed to cool to around room temperature.
  • the obtained contents were separated by filtration using filter paper with a pore size of 1 ⁇ m, and the solid content was recovered.
  • the obtained solid content was subjected to vacuum drying at 50° C. for 12 hours to obtain polyimide (P13).
  • P13 was measured by an infrared absorption spectrum, absorption peaks of an imide structure due to polyimide were detected near 1,780 cm ⁇ 1 and 1,377 cm ⁇ 1 .
  • the weight average molecular weight was 5,7000.
  • a resin composition was prepared in the same manner as in Example 1, except that P13' was used instead of P1'.
  • the prepared resin composition was evaluated according to the evaluation methods (5) and (6) above.
  • the obtained P14 was placed in a heat dryer and heated to 220° C. under a nitrogen stream. After holding at 220° C. for 24 hours, it was allowed to cool to around room temperature to obtain polyimide (P14′).
  • P14′ was measured by an infrared absorption spectrum, absorption peaks of an imide structure due to polyimide were detected near 1,780 cm ⁇ 1 and 1,377 cm ⁇ 1 .
  • the resulting P14' was evaluated according to the evaluation methods (1), (2), (3) and (4) above.
  • the obtained contents were separated by filtration using filter paper with a pore size of 1 ⁇ m, and the solid content was recovered.
  • the obtained solid content was subjected to vacuum drying at 50° C. for 12 hours to obtain polyimide (P15).
  • P15 polyimide
  • absorption peaks of an imide structure due to polyimide were detected near 1,780 cm ⁇ 1 and 1,377 cm ⁇ 1 .
  • the weight average molecular weight was 23,500.
  • the obtained P15 was placed in a heat dryer, and after a reduced pressure atmosphere (133 Pa), the temperature was raised to 180°C. After being held at 180° C. for 12 hours, it was allowed to cool to around room temperature to obtain polyimide (P15′).
  • P15′ was measured by an infrared absorption spectrum, absorption peaks of an imide structure due to polyimide were detected near 1,780 cm ⁇ 1 and 1,377 cm ⁇ 1 .
  • the obtained P15′ was evaluated according to the evaluation methods (1), (2), (3) and (4) above.
  • a resin composition was prepared in the same manner as in Example 1, except that P15' was used instead of P1'.
  • the prepared resin composition was evaluated according to the evaluation methods (5) and (6) above.
  • the reaction solution was poured into 3 L of ion-exchanged water, and the precipitate was collected by filtration using a filter paper with a pore size of 1 ⁇ m. After the collected precipitate was washed with water three times, it was subjected to vacuum drying at 50° C. for 12 hours to obtain polyimide (P16).
  • P16 was measured by infrared absorption spectrum, absorption peaks of an imide structure due to polyimide were detected near 1,780 cm ⁇ 1 and 1,377 cm ⁇ 1 . Moreover, the weight average molecular weight was 13,100.
  • the obtained P16 was placed in a heat dryer and heated to 180° C. under a nitrogen stream. After holding at 180° C. for 12 hours, it was allowed to cool to around room temperature to obtain polyimide (P16′).
  • P16′ was measured by an infrared absorption spectrum, absorption peaks of an imide structure due to polyimide were detected near 1,780 cm ⁇ 1 and 1,377 cm ⁇ 1 .
  • the resulting P16' was evaluated according to the evaluation methods (1), (2), (3) and (4) above.
  • a resin composition was prepared in the same manner as in Example 1, except that P16' was used instead of P1'.
  • the prepared resin composition was evaluated according to the evaluation methods (5) and (6) above.
  • the obtained solid content was subjected to vacuum drying at 50° C. for 12 hours to obtain a product (P17).
  • P17 was measured by infrared absorption spectrum, absorption peaks of an imide structure due to polyimide were detected near 1,780 cm ⁇ 1 and 1,377 cm ⁇ 1 .
  • the weight average molecular weight was 1,000.
  • the obtained P17 was placed in a heat dryer and heated to 220° C. under a nitrogen stream. After being kept at 220° C. for 24 hours, it was allowed to cool to around room temperature to obtain a polyimide (P17′).
  • P17′ was measured by an infrared absorption spectrum, absorption peaks of an imide structure due to polyimide were detected near 1,780 cm ⁇ 1 and 1,377 cm ⁇ 1 .
  • the resulting P17' was evaluated according to the evaluation methods (1), (2), (3) and (4) above.
  • Table 1 shows the evaluation results of Examples 1 to 13 and Comparative Examples 1 to 4.
  • Example 14 A stainless steel autoclave equipped with a stirrer was charged with ODPA-1 (31.02 g, 0.1 mol), BAHF-1 (36.63 g, 0.1 mol), and 255 g of deionized water. After the reaction vessel was sealed under nitrogen gas at room temperature and normal pressure, the temperature was raised from room temperature to 195° C. over about 1.5 hours while stirring at 150 rpm. The pressure in the reaction system at this stage was 1.5 MPa in gauge pressure. After being held at 195° C. for 4 hours, it was allowed to cool to around room temperature. The obtained contents were separated by filtration using filter paper with a pore size of 1 ⁇ m, and the solid content was recovered. The obtained solid content was subjected to vacuum drying at 80° C.
  • P18 polyimide
  • P18 was measured by an infrared absorption spectrum, absorption peaks of an imide structure due to polyimide were detected near 1,780 cm ⁇ 1 and 1,377 cm ⁇ 1 . Moreover, the weight average molecular weight was 27,500.
  • the obtained P18 was evaluated according to the evaluation methods (2), (3) and (4) above.
  • ODPA-1 31.02 g, 0.1 mol
  • BAHF-1 (30.03 g, 0.082 mol)
  • SiDA-1 1.24 g, 0.005 mol
  • MAP-1 2.73 g, 0.025 mol
  • 255 g of deionized water were charged.
  • the temperature was raised from room temperature to 210° C. over about 1.5 hours while stirring at 150 rpm.
  • the pressure in the reaction system at this stage was 2.0 MPa in gauge pressure. After being held at 210° C. for 4 hours, it was allowed to cool to near room temperature.
  • the obtained contents were separated by filtration using filter paper with a pore size of 1 ⁇ m, and the solid content was recovered.
  • the obtained solid content was subjected to vacuum drying at 80° C. for 12 hours to obtain a polyimide (P19).
  • P19 was measured by an infrared absorption spectrum, absorption peaks of an imide structure due to polyimide were detected near 1,780 cm ⁇ 1 and 1,377 cm ⁇ 1 . Moreover, the weight average molecular weight was 29,300.
  • the obtained P19 was evaluated according to the evaluation methods (2), (3) and (4) above.
  • the obtained contents were separated by filtration using filter paper with a pore size of 1 ⁇ m, and the solid content was recovered.
  • the obtained solid content was subjected to vacuum drying at 80° C. for 12 hours to obtain polyimide (P20).
  • P20 was measured by infrared absorption spectrum, absorption peaks of an imide structure due to polyimide were detected near 1,780 cm ⁇ 1 and 1,377 cm ⁇ 1 .
  • the weight average molecular weight was 32,400.
  • the obtained P20 was evaluated according to the evaluation methods (2), (3) and (4) above.
  • TDA-1 (30.03 g, 0.1 mol), BAHF-1 (32.96 g, 0.09 mol), MAP-1 (2.18 g, 0.02 mol) were placed in a stainless steel autoclave equipped with a stirrer. , and charged with 255 g of ion-exchanged water. After the reaction vessel was sealed under nitrogen gas at room temperature and normal pressure, the temperature was raised from room temperature to 190° C. over about 1.5 hours while stirring at 150 rpm. The pressure in the reaction system at this stage was 1.2 MPa in gauge pressure. After being held at 190° C. for 4 hours, it was allowed to cool to near room temperature.
  • the obtained contents were separated by filtration using filter paper with a pore size of 1 ⁇ m, and the solid content was recovered.
  • the obtained solid content was subjected to vacuum drying at 80° C. for 12 hours to obtain polyimide (P21).
  • P21 was measured by an infrared absorption spectrum, absorption peaks of an imide structure due to polyimide were detected near 1,780 cm ⁇ 1 and 1,377 cm ⁇ 1 .
  • the weight average molecular weight was 24,400.
  • the obtained P21 was evaluated according to the evaluation methods (2), (3) and (4) above.
  • the reaction solution was poured into 3 L of ion-exchanged water, and the precipitate was collected by filtration using a filter paper with a pore size of 1 ⁇ m. After the collected precipitate was washed with water three times, it was subjected to vacuum drying at 80° C. for 12 hours to obtain polyimide (P22).
  • P22 was measured by an infrared absorption spectrum, absorption peaks of an imide structure due to polyimide were detected near 1,780 cm ⁇ 1 and 1,377 cm ⁇ 1 . Moreover, the weight average molecular weight was 28,800.
  • the obtained P22 was evaluated according to the evaluation methods (2), (3) and (4) above.
  • the obtained contents were separated by filtration using filter paper with a pore size of 1 ⁇ m, and the solid content was recovered.
  • the obtained solid content was subjected to vacuum drying at 80° C. for 12 hours to obtain polyimide (P23).
  • P23 was measured by an infrared absorption spectrum, absorption peaks of an imide structure due to polyimide were detected near 1,780 cm ⁇ 1 and 1,377 cm ⁇ 1 . Moreover, the weight average molecular weight was 29,300.
  • the obtained P23 was evaluated according to the evaluation methods (2), (3) and (4) above.
  • Table 2 shows the evaluation results of Examples 14 to 17 and Comparative Examples 5 and 6.
  • a cured product obtained by curing a polyimide resin composition containing polyimide obtained by the present invention can be suitably used as an insulating film or a protective film constituting electronic parts. Furthermore, since it does not substantially contain solvents that pose health and environmental concerns, it can greatly contribute to the provision of sustainable industrial products.
  • electronic components include active components having semiconductors such as transistors, diodes, integrated circuits (ICs) and memories, and passive components such as resistors, capacitors and inductors.
  • the electronic components also include packages sealed for the purpose of improving the durability of these components, and modules in which a plurality of components are integrated.
  • An electronic component using a semiconductor is also called a semiconductor device or a semiconductor package.
  • a touch sensor panel etc. are mentioned.
  • cured products in electronic components include passivation films for semiconductors, surface protective films for semiconductor elements or TFTs (Thin Film Transistors), and interlayer insulation between rewiring in multilayer wiring for high-density mounting of 2 to 10 layers. It is suitably used for applications such as interlayer insulating films such as films, interlayer insulating films for passive components such as thin film capacitors, piezoelectric elements, and signal filters, insulating films for touch panels, and protective films.
  • the cured product of the present invention can be used for each member of an image display device such as an organic EL display and a liquid crystal display.
  • a planarizing layer a wiring planarizing layer, a TFT protective layer, an electrode protective layer, a wiring protective layer, a gate insulating layer, a color filter, a black matrix, or a black column spacer. It is not limited to this, and can be used for various purposes.

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Abstract

The present invention pertains to: a polyimide production method comprising a step (1) for obtaining a polyimide by causing a reaction between (b) a diamine and (a) a tetracarboxylic acid and/or a tetracarboxylic acid dianhydride in a temperature range of 80-250°C in a reaction solvent containing 60-100 mass% of water with respect to a total of 100 mass% of the reaction solvent, and a step (2) for performing chain extension of the obtained polyimide; or a polyimide production method comprising a step (3) for obtaining a polyimide by causing a reaction between (e) a diamine having a purity of 98 mass% or more and (d) a tetracarboxylic acid dianhydride having a purity of 98 mass% or more in a temperature range of 100-370°C in a reaction solvent containing 60-100 mass% of water with respect to a total of 100 mass% of the reaction solvent. Provided are: a method that is for producing a polyimide suitable for an interlayer insulation film and a surface protective film for electronic components, etc., and that enables the usage amount of organic solvents to be reduced; said polyimide, a resin composition containing said polyimide; and a cured product formed from the resin composition.

Description

ポリイミドの製造方法、ポリイミド、ポリイミド樹脂組成物およびその硬化物Method for producing polyimide, polyimide, polyimide resin composition and cured product thereof

 本発明は、有機溶媒使用量を少なくでき、電子部品の表面保護膜、層間絶縁膜などに適したポリイミドを製造する製造方法、該ポリイミド、該ポリイミドを含む樹脂組成物、およびその硬化物に関する。 The present invention relates to a method for producing a polyimide that can reduce the amount of organic solvent used and is suitable for surface protective films of electronic parts, interlayer insulating films, etc., the polyimide, a resin composition containing the polyimide, and a cured product thereof.

 ポリイミドは、高い耐熱性や優れた機械的性質、電気的性質から、電子部品の表面保護膜、層間絶縁膜などに使用されている。近年の電子部品の高性能化要求に伴い、ポリイミドには現像後のパターン形成の再現性向上や、フィルム化した場合の高い透過率とニュートラルな色外観、また塗布した基板上での硬化収縮が小さいことが求められている。 Due to its high heat resistance and excellent mechanical and electrical properties, polyimide is used for surface protective films and interlayer insulating films of electronic parts. Along with the recent demand for high performance electronic components, polyimide has improved reproducibility of pattern formation after development, high transmittance and neutral color appearance when made into a film, and cure shrinkage on the coated substrate. Small things are required.

 ポリイミドを製造するための一般的な製法として、N-メチル-2-ピロリドン(以下、NMP)を初めとするアミド系極性有機溶媒中で芳香族テトラカルボン酸無水物と芳香族ジアミンを反応させて、ポリアミド酸を経由してポリイミドを得る方法が知られている。しかし、近年、人の健康と環境の保護の観点から、NMPなどの化学物質が製品中に含まれることを忌避する動きが高まっており、よりクリーンかつ、製造過程における廃棄物の少ないポリイミドの製造方法が望まれている。これまでのポリイミドの製法では、製造に用いたアミド系極性有機溶媒を除くために、重合体回収プロセスにおいてポリイミド溶液を大量の水などの貧溶媒に再沈殿させる手法が知られている。特許文献1には、効率的にNMPを除くために、ポリイミドのNMP反応溶液に、酢酸エチルなどの低沸点溶媒と水を添加して有機層と水層に分離した後、水層を除去することでNMPを除く、という操作を3回程度繰り返し行う方法がポリイミド前駆体の製造方法として開示されている。また、特許文献2~5には、有機溶媒使用量を少なくするポリイミドの製造方法として、水溶媒中で100℃を超える温度で、高圧下において反応させることにより電子部品の表面保護膜や層間絶縁膜向けではない熱可塑性ポリイミドを重合する手法が開示されている。 As a general method for producing polyimide, an aromatic tetracarboxylic acid anhydride and an aromatic diamine are reacted in an amide-based polar organic solvent such as N-methyl-2-pyrrolidone (hereinafter, NMP). , a method of obtaining polyimide via polyamic acid is known. However, in recent years, from the perspective of protecting human health and the environment, there has been a growing movement to avoid the inclusion of chemical substances such as NMP in products. A method is desired. In the conventional method for producing polyimide, a method of reprecipitating the polyimide solution in a large amount of poor solvent such as water in the polymer recovery process is known in order to remove the amide-based polar organic solvent used in the production. In Patent Document 1, in order to efficiently remove NMP, a low boiling point solvent such as ethyl acetate and water are added to the NMP reaction solution of polyimide to separate it into an organic layer and an aqueous layer, and then the aqueous layer is removed. As a method for producing a polyimide precursor, a method is disclosed in which the operation of removing NMP by rinsing is repeated about three times. In Patent Documents 2 to 5, as a method for producing polyimide that reduces the amount of organic solvent used, surface protective films and interlayer insulation of electronic parts are produced by reacting at a temperature exceeding 100 ° C. under high pressure in a water solvent. Techniques have been disclosed for polymerizing thermoplastic polyimides that are not intended for membranes.

 また、NMPなどの有機溶媒を低減したポリイミドの製法として、テトラカルボン酸とジアミンとを溶媒を用いない、固相で重合する方法が知られている(非特許文献1)。また、テトラカルボン酸とジアミンとから溶媒中でナイロン塩型モノマーを作製し、これを固相重合に処すことでポリイミドを得る方法が、特許文献6に開示されている。 Also, as a method for producing polyimide with a reduced amount of organic solvents such as NMP, a method of polymerizing tetracarboxylic acid and diamine in a solid phase without using a solvent is known (Non-Patent Document 1). Further, Patent Document 6 discloses a method of preparing a nylon salt-type monomer from a tetracarboxylic acid and a diamine in a solvent and subjecting it to solid phase polymerization to obtain a polyimide.

特許第6503341号Patent No. 6503341 特開2001-181389号公報Japanese Patent Application Laid-Open No. 2001-181389 特開2001-270945号公報Japanese Patent Application Laid-Open No. 2001-270945 特許第4050458号Patent No. 4050458 特許第6994946号Patent No. 6994946 特開2015-98573号公報JP 2015-98573 A

「最新ポリイミド-基礎と応用-」,日本ポリイミド・芳香族系高分子研究会編,p23,2010"Latest Polyimide - Fundamentals and Applications -", edited by Japan Polyimide and Aromatic Polymer Study Group, p23, 2010

 しかし、特許文献1に記載の方法では、この多段階の洗浄工程を経ることで、ポリイミド中のNMPはガスクロマトグラフィー検出限界以下まで低減しているが、洗浄に用いた有機溶媒はポリイミド中に残存することになり、環境、安全性、及び健康に関する観点から望ましくない。また、特許文献2~5に記載の方法では水を80重量%以上含む重合溶媒中でポリイミドを合成しているが、得られるポリイミドの分子量は反応温度への依存性が高く、十分な重合度を得るためには高温・高圧が必須となる上、得られるポリイミドは原料に含まれる不純物に起因する着色を呈しやすく、その光学特性は現像工程を含む用途に適用するための特性を満たしたポリイミドを得ることに課題があった。 However, in the method described in Patent Document 1, the NMP in the polyimide is reduced to below the gas chromatography detection limit by going through this multi-step washing process, but the organic solvent used for washing is in the polyimide. This is undesirable from an environmental, safety and health standpoint. In addition, in the methods described in Patent Documents 2 to 5, polyimide is synthesized in a polymerization solvent containing 80% by weight or more of water, but the molecular weight of the polyimide obtained is highly dependent on the reaction temperature, and the degree of polymerization is sufficient. High temperature and high pressure are essential to obtain , and the resulting polyimide tends to be colored due to impurities contained in the raw materials, and its optical properties are polyimides that meet the characteristics for application to applications including the development process. There was a problem in obtaining

 さらに、非特許文献1や特許文献6に記載の方法では、分子の運動が制御されるため、溶媒を用いた反応よりも高温且つ長時間を要する。これは、得られるポリイミドが分子間で強固に相互作用するためと考えられる。そのため、得られるポリイミドは高結晶性となりやすく、不溶不融部が生じやすいという問題があった。 Furthermore, the methods described in Non-Patent Document 1 and Patent Document 6 require higher temperature and longer time than the reaction using a solvent because the movement of molecules is controlled. It is considered that this is because the resulting polyimide has strong intermolecular interactions. Therefore, the obtained polyimide tends to have high crystallinity, and there is a problem that an insoluble and non-melting portion tends to occur.

 上記課題を解決するため本発明のポリイミドの製造方法は、次の構成を有する。すなわち、
 [1]反応溶媒の全体100質量%に対して、水を60~100質量%含有する反応溶媒中で、テトラカルボン酸および/またはテトラカルボン酸二無水物(a)とジアミン(b)を、80℃以上250℃以下の温度範囲で反応させてポリイミドを得る工程(1)の後、得られたポリイミドの鎖延長工程(2)を含む、ポリイミドの製造方法、
 [2]前記鎖延長工程(2)が固相重合工程(2a)である、前記[1]に記載のポリイミドの製造方法、
 [3]前記鎖延長工程(2)が、前記工程(1)よりも高い温度で反応させてポリイミドを得る工程(2b)である、前記[1]に記載のポリイミドの製造方法、
 [4]前記工程(1)において、80℃以上140℃以下の温度範囲で反応させてポリイミドを得る、前記[1]~[3]のいずれかに記載のポリイミドの製造方法、
 [5]前記工程(2a)において、80℃以上250℃以下の温度範囲で固相重合する、前記[2]に記載のポリイミドの製造方法、
 [6]前記工程(1)において、さらにモノアミン(c)を反応させる、前記[1]~[5]のいずれかに記載のポリイミドの製造方法、
 [7]前記テトラカルボン酸および/またはテトラカルボン酸二無水物(a)が、式(1)で表される化合物からなる群より選択される1つ以上を含む、前記[1]~[6]のいずれかに記載のポリイミドの製造方法、
In order to solve the above problems, the method for producing polyimide of the present invention has the following configuration. i.e.
[1] Tetracarboxylic acid and/or tetracarboxylic dianhydride (a) and diamine (b) are mixed in a reaction solvent containing 60 to 100% by mass of water with respect to 100% by mass of the total reaction solvent, A method for producing a polyimide, comprising a step (2) of chain extension of the obtained polyimide after the step (1) of obtaining a polyimide by reacting it at a temperature range of 80 ° C. or more and 250 ° C. or less,
[2] The method for producing a polyimide according to [1] above, wherein the chain extension step (2) is a solid phase polymerization step (2a),
[3] The method for producing a polyimide according to [1] above, wherein the chain extension step (2) is a step (2b) of obtaining a polyimide by reacting at a temperature higher than that of the step (1),
[4] The method for producing a polyimide according to any one of [1] to [3], wherein in the step (1), the polyimide is obtained by reacting at a temperature range of 80° C. or higher and 140° C. or lower;
[5] The method for producing a polyimide according to [2] above, wherein in the step (2a), the solid state polymerization is performed at a temperature range of 80° C. or higher and 250° C. or lower.
[6] The method for producing a polyimide according to any one of [1] to [5], wherein the monoamine (c) is further reacted in the step (1).
[7] The tetracarboxylic acid and / or tetracarboxylic dianhydride (a) contains one or more selected from the group consisting of compounds represented by formula (1) [1] to [6 ] A method for producing a polyimide according to any one of

Figure JPOXMLDOC01-appb-C000003
Figure JPOXMLDOC01-appb-C000003

(式(1)中、RおよびR12は、それぞれ独立に、酸素原子、C(CH、C(CFまたはSOを示し、RおよびRは、それぞれ独立に、水素原子、水酸基、スルホン酸基またはチオール基を示し、R、R、R10、R11、R13およびR14は、それぞれ独立に、水素原子、水酸基、スルホン酸基、チオール基または炭素数1~6のアルキル基を示す。)
 [8]反応溶媒の全体100質量%に対して、水を60~100質量%含有する反応溶媒中、純度98質量%以上のテトラカルボン酸二無水物(d)と、純度98質量%以上のジアミン(e)を、100℃以上370℃以下の温度範囲で反応させてポリイミドを得る工程(3)を含む、ポリイミドの製造方法、
 [9]前記工程(3)において、さらに純度97質量%以上のモノアミン(f)を反応させる前記[8]に記載のポリイミドの製造方法、である。
(In formula (1), R 5 and R 12 each independently represent an oxygen atom, C(CH 3 ) 2 , C(CF 3 ) 2 or SO 2 , R 6 and R 7 each independently , a hydrogen atom, a hydroxyl group, a sulfonic acid group or a thiol group, and R 8 , R 9 , R 10 , R 11 , R 13 and R 14 each independently represent a hydrogen atom, a hydroxyl group, a sulfonic acid group, a thiol group or Indicates an alkyl group having 1 to 6 carbon atoms.)
[8] In a reaction solvent containing 60 to 100% by mass of water with respect to 100% by mass of the total reaction solvent, a tetracarboxylic dianhydride (d) with a purity of 98% by mass or more and a A method for producing a polyimide, comprising the step (3) of reacting a diamine (e) in a temperature range of 100° C. or higher and 370° C. or lower to obtain a polyimide,
[9] The method for producing a polyimide according to [8], wherein in the step (3), a monoamine (f) having a purity of 97% by mass or more is further reacted.

 本発明のポリイミドは、次の構成を有する。すなわち、
 [10]式(2)で表される構造単位を有し、有機溶媒の含有量が1質量%以下であり、黄色度が0~3.0であり、重量平均分子量が5,000~100,000であるポリイミド、
The polyimide of the present invention has the following constitution. i.e.
[10] It has a structural unit represented by formula (2), contains an organic solvent of 1% by mass or less, has a yellowness of 0 to 3.0, and has a weight average molecular weight of 5,000 to 100. ,000 polyimide,

Figure JPOXMLDOC01-appb-C000004
Figure JPOXMLDOC01-appb-C000004

 (式(2)中、Rは炭素数5~40の4~14価の有機基、Rは炭素数5~40の2~12価の有機基を示し、RおよびRは、それぞれ独立に、水酸基、スルホン酸基、チオール基または炭素数1から20の有機基を示し、αおよびβは、それぞれ独立に、α+β≧1を満たす、0から10までの整数を示す。)
 [11]有機溶媒の含有量が0.1重量%以下である、前記[10]に記載のポリイミド、
 [12]アルカリ可溶性である、前記[10]または[11]に記載のポリイミド、
 [13]前記ポリイミドの主鎖末端少なくとも1つが、末端封止剤により封止された構造を含む前記[10]~[12]のいずれかに記載のポリイミド、である。
(In formula (2), R 1 represents a 4- to 14-valent organic group having 5 to 40 carbon atoms, R 2 represents a 2- to 12-valent organic group having 5 to 40 carbon atoms, and R 3 and R 4 are Each independently represents a hydroxyl group, a sulfonic acid group, a thiol group or an organic group having 1 to 20 carbon atoms, and α and β each independently represents an integer from 0 to 10 satisfying α+β≧1.)
[11] The polyimide according to [10] above, wherein the content of the organic solvent is 0.1% by weight or less,
[12] The polyimide according to [10] or [11], which is alkali-soluble,
[13] The polyimide according to any one of [10] to [12], wherein at least one of the main chain terminals of the polyimide is blocked with a terminal blocker.

 本発明のポリイミド樹脂組成物は、次の構成を有する。すなわち、
 [14]前記[10]~[13]のいずれかに記載のポリイミドと、感光剤および溶剤を含有するポリイミド樹脂組成物、である。
The polyimide resin composition of the present invention has the following constitution. i.e.
[14] A polyimide resin composition containing the polyimide according to any one of [10] to [13], a photosensitizer and a solvent.

 本発明の硬化物は、次の構成を有する。すなわち、
 [15]前記[14]に記載のポリイミド樹脂組成物を硬化した硬化物、である。
The cured product of the present invention has the following constitution. i.e.
[15] A cured product obtained by curing the polyimide resin composition according to [14] above.

 本発明は、有機溶媒使用量を少なくでき、溶媒溶解性に優れ、低黄色度である、電子部品の表面保護膜、層間絶縁膜などに適したポリイミドを製造する製造方法および該ポリイミド、該ポリイミドを含む樹脂組成物、該樹脂組成物から形成された硬化膜を提供するものである。 The present invention can reduce the amount of organic solvent used, has excellent solvent solubility, and has a low yellowness, and a method for producing a polyimide suitable for a surface protective film of an electronic component, an interlayer insulating film, etc., the polyimide, and the polyimide and a cured film formed from the resin composition.

 以下、本発明を詳細に説明する。 The present invention will be described in detail below.

 本発明のポリイミドの製造方法は、次の第1の態様または第2の態様のいずれかの態様を有する。すなわち、
反応溶媒の全体100質量%に対して、水を60~100質量%含有する反応溶媒中で、テトラカルボン酸および/またはテトラカルボン酸二無水物(a)とジアミン(b)を、80℃以上250℃以下の温度範囲で反応させてポリイミドを得る工程(1)の後、得られたポリイミドの鎖延長工程(2)を含む、ポリイミドの製造方法、または、
反応溶媒の全体100質量%に対して、水を60~100質量%含有する反応溶媒中、純度98質量%以上のテトラカルボン酸二無水物(d)と、純度98質量%以上のジアミン(e)を、100℃以上370℃以下の温度範囲で反応させてポリイミドを得る工程(3)を含む、ポリイミドの製造方法、である。
The method for producing polyimide of the present invention has either the following first aspect or second aspect. i.e.
Tetracarboxylic acid and/or tetracarboxylic dianhydride (a) and diamine (b) are heated at 80° C. or higher in a reaction solvent containing 60 to 100% by mass of water with respect to 100% by mass of the total reaction solvent. A method for producing a polyimide, comprising a step (1) of obtaining a polyimide by reaction in a temperature range of 250° C. or less, followed by a step (2) of chain extension of the obtained polyimide, or
In a reaction solvent containing 60 to 100% by mass of water with respect to 100% by mass of the total reaction solvent, a tetracarboxylic dianhydride (d) with a purity of 98% by mass or more and a diamine (e) with a purity of 98% by mass or more ) in a temperature range of 100° C. or higher and 370° C. or lower to obtain a polyimide (3).

 本発明で言うポリイミドとは、例えば、テトラカルボン酸および/またはテトラカルボン酸二無水物と、ジアミンとを反応させることによって、テトラカルボン酸および/またはテトラカルボン酸二無水物に由来する構造単位とジアミンに由来する構造単位がイミド結合を介して結合した共重合体を言う。 The polyimide referred to in the present invention is, for example, a structural unit derived from a tetracarboxylic acid and/or a tetracarboxylic dianhydride by reacting a tetracarboxylic acid and/or a tetracarboxylic dianhydride with a diamine. A copolymer in which structural units derived from diamine are bonded via imide bonds.

 本発明のポリイミドの製造方法で用いるテトラカルボン酸および/またはテトラカルボン酸二無水物としては、例えば、芳香族テトラカルボン酸、脂環式テトラカルボン酸やこれらの二無水物を挙げることができるが、これらに限定されない。また、これらは単独で、または2種類以上を組み合わせて使用してもよい。 Examples of the tetracarboxylic acid and/or tetracarboxylic dianhydride used in the method for producing a polyimide of the present invention include aromatic tetracarboxylic acid, alicyclic tetracarboxylic acid, and dianhydrides thereof. , but not limited to. Moreover, these may be used individually or in combination of 2 or more types.

 テトラカルボン酸および/またはテトラカルボン酸二無水物(a)として具体的には、炭素数5~40の4~14価のテトラカルボン酸やテトラカルボン酸二無水物が挙げられ、例えば、ピロメリット酸、3,3’,4,4’-ビフェニルテトラカルボン酸、2,3,3’,4’-ビフェニルテトラカルボン酸、2,2’,3,3’-ビフェニルテトラカルボン酸、3,3’,4,4’-ベンゾフェノンテトラカルボン酸、2,2’,3,3’-ベンゾフェノンテトラカルボン酸、2,2-ビス(3,4-ジカルボキシフェニル)プロパン、2,2-ビス(2,3-ジカルボキシフェニル)プロパン、1,1-ビス(3,4-ジカルボキシフェニル)エタン、1,1-ビス(2,3-ジカルボキシフェニル)エタン、ビス(3,4-ジカルボキシフェニル)メタン、ビス(2,3-ジカルボキシフェニル)メタン、ビス(3,4-ジカルボキシフェニル)スルホン、4,4’-オキシジフタル酸、1,2,5,6-ナフタレンテトラカルボン酸、9,9-ビス(3,4-ジカルボキシフェニル)フルオレン酸、9,9-ビス{4-(3,4-ジカルボキシフェノキシ)フェニル}フルオレン酸、2,3,6,7-ナフタレンテトラカルボン酸、2,3,5,6-ピリジンテトラカルボン酸、3,4,9,10-ペリレンテトラカルボン酸、2,2-ビス(3,4-ジカルボキシフェニル)ヘキサフルオロプロパンなどの芳香族テトラカルボン酸、3,3’,4,4’-ジフェニルスルホンテトラカルボン酸、1,2,3,4-シクロブタンテトラカルボン酸、1,2,3,4-シクロペンタンテトラカルボン酸、1,2,4,5-シクロヘキサンテトラカルボン酸、5-(2,5-ジオキソテトラヒドロフリル)-3-メチル-3-シクロヘキセン-1,2-ジカルボン酸、2,3,5-トリカルボキシ-2-シクロペンタン酢酸、2,3,4,5-テトラヒドロフランテトラカルボン酸の残基や、4-(2,5-ジオキソテトラヒドロフラン-3-イル)-1,2,3,4-テトラヒドロナフタレン-1,2-ジカルボン酸、4-(2,5-ジオキソテトラヒドロフラン-3-イル)-4メチル-1,2,3,4-テトラヒドロナフタレン-1,2-ジカルボン酸、4-(2,5-ジオキソテトラヒドロフラン-3-イル)-7メチル-1,2,3,4-テトラヒドロナフタレン-1,2-ジカルボン酸、ノルボルナン-2-スピロ-2’-シクロペンタノン-5’-スピロ-2”-ノルボルナン-5,5”,6,6”-テトラカルボン酸、ノルボルナン-2-スピロ-2’-シクロヘキサノン-6’-スピロ-2”-ノルボルナン-5,5”,6,6”-テトラカルボン酸や、これらの芳香族環や炭化水素の水素原子の一部を、炭素数1~10のアルキル基やフルオロアルキル基、ハロゲン原子などで置換した化合物、またはこれらの二無水物を挙げることができるが、これらに限定されない。また、これら2種以上のテトラカルボン酸やテトラカルボン酸二無水物を組み合わせて使用してもよい。 Specific examples of the tetracarboxylic acid and/or tetracarboxylic dianhydride (a) include 4- to 14-valent tetracarboxylic acids and tetracarboxylic dianhydrides having 5 to 40 carbon atoms, such as pyromellit acid, 3,3′,4,4′-biphenyltetracarboxylic acid, 2,3,3′,4′-biphenyltetracarboxylic acid, 2,2′,3,3′-biphenyltetracarboxylic acid, 3,3 ',4,4'-benzophenonetetracarboxylic acid, 2,2',3,3'-benzophenonetetracarboxylic acid, 2,2-bis(3,4-dicarboxyphenyl)propane, 2,2-bis(2 ,3-dicarboxyphenyl)propane, 1,1-bis(3,4-dicarboxyphenyl)ethane, 1,1-bis(2,3-dicarboxyphenyl)ethane, bis(3,4-dicarboxyphenyl) ) methane, bis(2,3-dicarboxyphenyl)methane, bis(3,4-dicarboxyphenyl)sulfone, 4,4′-oxydiphthalic acid, 1,2,5,6-naphthalenetetracarboxylic acid, 9, 9-bis(3,4-dicarboxyphenyl)fluoric acid, 9,9-bis{4-(3,4-dicarboxyphenoxy)phenyl}fluoric acid, 2,3,6,7-naphthalenetetracarboxylic acid, Aromatic tetracarboxylic acids such as 2,3,5,6-pyridinetetracarboxylic acid, 3,4,9,10-perylenetetracarboxylic acid, and 2,2-bis(3,4-dicarboxyphenyl)hexafluoropropane , 3,3′,4,4′-diphenylsulfonetetracarboxylic acid, 1,2,3,4-cyclobutanetetracarboxylic acid, 1,2,3,4-cyclopentanetetracarboxylic acid, 1,2,4, 5-cyclohexanetetracarboxylic acid, 5-(2,5-dioxotetrahydrofuryl)-3-methyl-3-cyclohexene-1,2-dicarboxylic acid, 2,3,5-tricarboxy-2-cyclopentaneacetic acid, Residues of 2,3,4,5-tetrahydrofurantetracarboxylic acid and 4-(2,5-dioxotetrahydrofuran-3-yl)-1,2,3,4-tetrahydronaphthalene-1,2-dicarboxylic acid , 4-(2,5-dioxotetrahydrofuran-3-yl)-4methyl-1,2,3,4-tetrahydronaphthalene-1,2-dicarboxylic acid, 4-(2,5-dioxotetrahydrofuran-3 -yl)-7 methyl-1,2,3,4-tetrahydronaphthalene-1,2-dicarboxylic acid, norbornane-2-spiro-2′-cyclopentanone-5′-spiro-2″-norbornane-5, 5″,6,6″-tetracarboxylic acid, norbornane-2-spiro-2′-cyclohexanone-6′-spiro-2″-norbornane-5,5″,6,6″-tetracarboxylic acid, and these Some of the hydrogen atoms of the aromatic ring or hydrocarbon are substituted with an alkyl group having 1 to 10 carbon atoms, a fluoroalkyl group, a halogen atom, etc., or a dianhydride thereof. Not limited. Also, two or more of these tetracarboxylic acids and tetracarboxylic dianhydrides may be used in combination.

 これらのうち、前記テトラカルボン酸二無水物が、式(1)で表される化合物からなる群より選択される1つ以上を含むことが好ましい。 Among these, the tetracarboxylic dianhydride preferably contains one or more selected from the group consisting of the compounds represented by formula (1).

Figure JPOXMLDOC01-appb-C000005
Figure JPOXMLDOC01-appb-C000005

 式(1)中、RおよびR12は、それぞれ独立に、酸素原子、C(CH、C(CFまたはSOを示し、RおよびRは、それぞれ独立に、水素原子、水酸基、スルホン酸基またはチオール基を示し、R、R、R10、R11、R13およびR14は、それぞれ独立に、水素原子、水酸基、スルホン酸基、チオール基または炭素数1~6のアルキル基を示す。 In formula (1), R 5 and R 12 each independently represent an oxygen atom, C(CH 3 ) 2 , C(CF 3 ) 2 or SO 2 , R 6 and R 7 each independently represents a hydrogen atom , a hydroxyl group, a sulfonic acid group or a thiol group ; It represents an alkyl group of numbers 1-6.

 中でも、ピロメリット酸二無水物、ビス(3,4-ジカルボキシフェニル)スルホン二無水物、4,4’-オキシジフタル酸無水物、2,2-ビス(3,4-ジカルボキシフェニル)ヘキサフルオロプロパン二無水物、4-(2,5-ジオキソテトラヒドロフラン-3-イル)-1,2,3,4-テトラヒドロナフタレン-1,2-ジカルボン酸二無水物あるいはこれらの芳香族環にアルキル基やハロゲン原子で置換した化合物が特に好ましいものとして挙げられる。これらは単独で又は2種以上を組み合わせて使用される。 Among them, pyromellitic dianhydride, bis(3,4-dicarboxyphenyl)sulfone dianhydride, 4,4′-oxydiphthalic anhydride, 2,2-bis(3,4-dicarboxyphenyl)hexafluoro propane dianhydride, 4-(2,5-dioxotetrahydrofuran-3-yl)-1,2,3,4-tetrahydronaphthalene-1,2-dicarboxylic dianhydride or an alkyl group on the aromatic ring thereof or a halogen atom-substituted compound is particularly preferred. These are used alone or in combination of two or more.

 本発明の製造方法で用いるジアミンとしては、例えば、芳香族ジアミン、脂環式ジアミンを挙げることができるが、これらに限定されない。また、これらは単独で、または2種類以上を組み合わせて使用してもよい。 Examples of diamines used in the production method of the present invention include, but are not limited to, aromatic diamines and alicyclic diamines. Moreover, these may be used individually or in combination of 2 or more types.

 ジアミン(b)として具体的には、炭素数5~40の2~12価のジアミンが挙げられ、例えば、3,4’-ジアミノジフェニルエーテル、4,4’-ジアミノジフェニルエーテル、3,4’-ジアミノジフェニルメタン、4,4’-ジアミノジフェニルメタン、4,4’-ジアミノジフェニルメタン、3,4’-ジアミノジフェニルスルホン、4,4’-ジアミノジフェニルスルホン、3,4’-ジアミノジフェニルスルフィド、4,4’-ジアミノジフェニルスルフィド、1,4-ビス(4-アミノフェノキシ)ベンゼン、ベンジン、m-フェニレンジアミン、p-フェニレンジアミン、1,5-ナフタレンジアミン、2,6-ナフタレンジアミン、ビス(4-アミノフェノキシフェニル)スルホン、ビス(3-アミノフェノキシフェニル)スルホン、ビス(4-アミノフェノキシ)ビフェニル、ビス{4-(4-アミノフェノキシ)フェニル}エーテル、1,4-ビス(4-アミノフェノキシ)ベンゼン、1,3-ビス(4-アミノフェノキシ)ベンゼン、2,2’-ジメチル-4,4’-ジアミノビフェニル、2,2’-ジエチル-4,4’-ジアミノビフェニル、3,3’-ジメチル-4,4’-ジアミノビフェニル、3,3’-ジエチル-4,4’-ジアミノビフェニル、2,2’,3,3’-テトラメチル-4,4’-ジアミノビフェニル、3,3’,4,4’-テトラメチル-4,4’-ジアミノビフェニル、2,2’-ビス(トリフルオロメチル)-4,4’-ジアミノビフェニル、ビス(3-アミノ-4-ヒドロキシフェニル)エーテル、ビス(3-アミノ-4-ヒドロキシフェニル)メチレン、ビス[N-(3-アミノベンゾイル)-3-アミノ-4-ヒドロキシフェニル]スルホン、ビス[N-(4-アミノベンゾイル)-3-アミノ-4-ヒドロキシフェニル]スルホン、ビス(3-アミノ-4-ヒドロキシフェニル)スルホン、ビス(3-アミノ-4-ヒドロキシフェニル)プロパン、2,2’-ビス[N-(3-アミノベンゾイル)-3-アミノ-4-ヒドロキシフェニル]プロパン、2,2’-ビス[N-(4-アミノベンゾイル)-3-アミノ-4-ヒドロキシフェニル]プロパン、9,9-ビス(3-アミノ-4-ヒドロキシフェニル)フルオレン、9,9-ビス[N-(3-アミノベンゾイル)-3-アミノ-4-ヒドロキシフェニル]フルオレン、9,9-ビス[N-(4-アミノベンゾイル)-3-アミノ-4-ヒドロキシフェニル]フルオレン、N,N’-ビス(3-アミノベンゾイル)-2,5-ジアミノ-1,4-ジヒドロキシベンゼン、N,N’-ビス(4-アミノベンゾイル)-2,5-ジアミノ-1,4-ジヒドロキシベンゼン、N,N’-ビス(4-アミノベンゾイル)-4,4’-ジアミノ-3,3-ジヒドロキシビフェニル、N,N’-ビス(3-アミノベンゾイル)-3,3’-ジアミノ-4,4-ジヒドロキシビフェニル、N、N’-ビス(4-アミノベンゾイル)-3,3’-ジアミノ-4,4-ジヒドロキシビフェニル、3,3’-ジアミノ-4,4’-ビフェノール、ビス(3-アミノ-4-ヒドロキシフェニル)メタン、1,1-ビス(3-アミノ-4-ヒドロキシフェニル)エタン、2,2-ビス(3-アミノ-4-ヒドロキシフェニル)プロパン、2,2-ビス[4-(4-アミノフェノキシ)フェニル]ヘキサフルオロプロパン、2,2-ビス[4-(4-アミノフェノキシ)フェニル]プロパン、2,2-ビス(3-アミノ-4-ヒドロキシフェニル)ヘキサフルオロプロパン等の芳香族ジアミンや、これらの芳香族環や炭化水素の水素原子の一部を、炭素数1~10のアルキル基やフルオロアルキル基、ハロゲン原子などで置換した化合物などを挙げることができるが、これらに限定されない。また、本発明のポリイミドの製造方法は、これら2種以上のジアミンを組み合わせて使用してもよい。 Specific examples of the diamine (b) include diamines having 5 to 40 carbon atoms to 12-valent diamines, such as 3,4'-diaminodiphenyl ether, 4,4'-diaminodiphenyl ether, 3,4'-diamino Diphenylmethane, 4,4'-diaminodiphenylmethane, 4,4'-diaminodiphenylmethane, 3,4'-diaminodiphenyl sulfone, 4,4'-diaminodiphenyl sulfone, 3,4'-diaminodiphenyl sulfide, 4,4'- Diaminodiphenyl sulfide, 1,4-bis(4-aminophenoxy)benzene, benzine, m-phenylenediamine, p-phenylenediamine, 1,5-naphthalenediamine, 2,6-naphthalenediamine, bis(4-aminophenoxyphenyl) ) sulfone, bis(3-aminophenoxyphenyl)sulfone, bis(4-aminophenoxy)biphenyl, bis{4-(4-aminophenoxy)phenyl}ether, 1,4-bis(4-aminophenoxy)benzene, 1 , 3-bis(4-aminophenoxy)benzene, 2,2′-dimethyl-4,4′-diaminobiphenyl, 2,2′-diethyl-4,4′-diaminobiphenyl, 3,3′-dimethyl-4 ,4′-diaminobiphenyl, 3,3′-diethyl-4,4′-diaminobiphenyl, 2,2′,3,3′-tetramethyl-4,4′-diaminobiphenyl, 3,3′,4, 4'-tetramethyl-4,4'-diaminobiphenyl, 2,2'-bis(trifluoromethyl)-4,4'-diaminobiphenyl, bis(3-amino-4-hydroxyphenyl)ether, bis(3 -amino-4-hydroxyphenyl)methylene, bis[N-(3-aminobenzoyl)-3-amino-4-hydroxyphenyl]sulfone, bis[N-(4-aminobenzoyl)-3-amino-4-hydroxy phenyl]sulfone, bis(3-amino-4-hydroxyphenyl)sulfone, bis(3-amino-4-hydroxyphenyl)propane, 2,2'-bis[N-(3-aminobenzoyl)-3-amino- 4-hydroxyphenyl]propane, 2,2′-bis[N-(4-aminobenzoyl)-3-amino-4-hydroxyphenyl]propane, 9,9-bis(3-amino-4-hydroxyphenyl)fluorene , 9,9-bis[N-(3-aminobenzoyl)-3-amino-4-hydroxyphenyl]fluorene, 9,9-bis[N-(4-aminobenzoyl)-3-amino-4-hydroxyphenyl ] Fluorene, N,N′-bis(3-aminobenzoyl)-2,5-diamino-1,4-dihydroxybenzene, N,N′-bis(4-aminobenzoyl)-2,5-diamino-1, 4-dihydroxybenzene, N,N'-bis(4-aminobenzoyl)-4,4'-diamino-3,3-dihydroxybiphenyl, N,N'-bis(3-aminobenzoyl)-3,3'- diamino-4,4-dihydroxybiphenyl, N,N'-bis(4-aminobenzoyl)-3,3'-diamino-4,4-dihydroxybiphenyl, 3,3'-diamino-4,4'-biphenol, bis(3-amino-4-hydroxyphenyl)methane, 1,1-bis(3-amino-4-hydroxyphenyl)ethane, 2,2-bis(3-amino-4-hydroxyphenyl)propane, 2,2 -bis[4-(4-aminophenoxy)phenyl]hexafluoropropane, 2,2-bis[4-(4-aminophenoxy)phenyl]propane, 2,2-bis(3-amino-4-hydroxyphenyl) Aromatic diamines such as hexafluoropropane, and compounds in which some of the hydrogen atoms of these aromatic rings or hydrocarbons are substituted with alkyl groups having 1 to 10 carbon atoms, fluoroalkyl groups, halogen atoms, etc. can be, but are not limited to: In addition, in the method for producing a polyimide of the present invention, two or more of these diamines may be used in combination.

 中でも前記ジアミンが、式(3)で表される化合物からなる群より選択される1つ以上を含むことが好ましい。 Above all, it is preferable that the diamine contains one or more selected from the group consisting of compounds represented by formula (3).

Figure JPOXMLDOC01-appb-C000006
Figure JPOXMLDOC01-appb-C000006

 式(3)中、R15は、酸素原子、C(CH、C(CFまたはSOを示し、R16およびR17は、それぞれ独立に、水素原子、水酸基、スルホン酸基またはチオール基を示し、特に水酸基である場合、得られるポリイミドがアルカリ水溶液へ溶解し易く、現像に用いる現像液であるアルカリ水溶液への溶解速度が大きくなり、樹脂組成物塗膜の硬化部と未硬化部の溶解コントラストが大きくなり微細パターン加工性が得られやすくなるため好ましい。 In formula (3), R 15 represents an oxygen atom, C(CH 3 ) 2 , C(CF 3 ) 2 or SO 2 , R 16 and R 17 each independently represents a hydrogen atom, a hydroxyl group, a sulfonic acid or a thiol group, especially when it is a hydroxyl group, the resulting polyimide is easily dissolved in an alkaline aqueous solution, and the dissolution rate in the alkaline aqueous solution, which is the developer used for development, increases, and the cured portion of the resin composition coating film and It is preferable because the dissolution contrast of the uncured portion is increased and fine pattern workability can be easily obtained.

 これらのうち、3,4’-ジアミノジフェニルエーテル、4,4’-ジアミノジフェニルエーテル、3,4’-ジアミノジフェニルスルホン、4,4’-ジアミノジフェニルスルホン、3,4’-ジアミノジフェニルスルフィド、4,4’-ジアミノジフェニルスルフィド、ビス(4-アミノフェノキシフェニル)スルホン、ビス(3-アミノフェノキシフェニル)スルホン、ビス(4-アミノフェノキシ)ビフェニル、ビス{4-(4-アミノフェノキシ)フェニル}エーテル、1,4-ビス(4-アミノフェノキシ)ベンゼン、1,3-ビス(4-アミノフェノキシ)ベンゼン、2,2-ビス[4-(4-アミノフェノキシ)フェニル]ヘキサフルオロプロパン、2,2-ビス[4-(4-アミノフェノキシ)フェニル]プロパン、2,2-ビス(3-アミノ-4-ヒドロキシフェニル)ヘキサフルオロプロパンあるいはこれらの芳香族環にアルキル基やハロゲン原子で置換した化合物などが特に好ましいものとして挙げられる。これらは単独で又は2種以上を組み合わせて使用される。 Among these, 3,4′-diaminodiphenyl ether, 4,4′-diaminodiphenyl ether, 3,4′-diaminodiphenyl sulfone, 4,4′-diaminodiphenyl sulfone, 3,4′-diaminodiphenyl sulfide, 4,4 '-diaminodiphenyl sulfide, bis(4-aminophenoxyphenyl)sulfone, bis(3-aminophenoxyphenyl)sulfone, bis(4-aminophenoxy)biphenyl, bis{4-(4-aminophenoxy)phenyl}ether, 1 ,4-bis(4-aminophenoxy)benzene, 1,3-bis(4-aminophenoxy)benzene, 2,2-bis[4-(4-aminophenoxy)phenyl]hexafluoropropane, 2,2-bis [4-(4-aminophenoxy)phenyl]propane, 2,2-bis(3-amino-4-hydroxyphenyl)hexafluoropropane, and compounds in which the aromatic rings of these are substituted with alkyl groups or halogen atoms, etc. It is mentioned as a preferable one. These are used alone or in combination of two or more.

 また、本発明のポリイミドの製造方法は、前記工程(1)において、さらにモノアミン(c)を反応させることが好ましい。このように反応させることで、ポリマー主鎖の末端を、モノアミンで末端封止することができる。末端封止は、例えばジアミンの一部をモノアミンに置き換えることで可能である。モノアミンとしては芳香族モノアミン、脂環式モノアミンを挙げることができるが、これらに限定されない。また、これらは単独で、または2種類以上を組み合わせて使用してもよい。 In addition, in the method for producing a polyimide of the present invention, it is preferable that the monoamine (c) is further reacted in the step (1). By reacting in this manner, the ends of the polymer main chain can be end-capped with monoamines. End capping can be achieved, for example, by substituting a monoamine for a portion of the diamine. Examples of monoamines include, but are not limited to, aromatic monoamines and alicyclic monoamines. Moreover, these may be used individually or in combination of 2 or more types.

 モノアミンの具体的な例としては、例えば、5-アミノ-8-ヒドロキシキノリン、1-ヒドロキシ-7-アミノナフタレン、1-ヒドロキシ-6-アミノナフタレン、1-ヒドロキシ-5-アミノナフタレン、1-ヒドロキシ-4-アミノナフタレン、2-ヒドロキシ-7-アミノナフタレン、2-ヒドロキシ-6-アミノナフタレン、2-ヒドロキシ-5-アミノナフタレン、1-カルボキシ-7-アミノナフタレン、1-カルボキシ-6-アミノナフタレン、1-カルボキシ-5-アミノナフタレン、2-カルボキシ-7-アミノナフタレン、2-カルボキシ-6-アミノナフタレン、2-カルボキシ-5-アミノナフタレン、2-アミノ安息香酸、3-アミノ安息香酸、4-アミノ安息香酸、4-アミノサリチル酸、5-アミノサリチル酸、6-アミノサリチル酸、3-アミノ-4,6-ジヒドロキシピリミジン、2-アミノフェノール、3-アミノフェノール、4-アミノフェノール、2-アミノチオフェノール、3-アミノチオフェノール、4-アミノチオフェノール、2-アニリンスルホン酸、3-アニリンスルホン酸、4-アニリンスルホン酸や、これらの芳香族環や炭化水素の水素原子の一部を、炭素数1~10のアルキル基やフルオロアルキル基、ハロゲン原子などで置換した化合物などを挙げることができるが、これらに限定されない。また、本発明のポリイミドの製造方法は、これら2種以上のモノアミンを組み合わせて使用してもよい。 Specific examples of monoamines include 5-amino-8-hydroxyquinoline, 1-hydroxy-7-aminonaphthalene, 1-hydroxy-6-aminonaphthalene, 1-hydroxy-5-aminonaphthalene, 1-hydroxy -4-aminonaphthalene, 2-hydroxy-7-aminonaphthalene, 2-hydroxy-6-aminonaphthalene, 2-hydroxy-5-aminonaphthalene, 1-carboxy-7-aminonaphthalene, 1-carboxy-6-aminonaphthalene , 1-carboxy-5-aminonaphthalene, 2-carboxy-7-aminonaphthalene, 2-carboxy-6-aminonaphthalene, 2-carboxy-5-aminonaphthalene, 2-aminobenzoic acid, 3-aminobenzoic acid, 4 -aminobenzoic acid, 4-aminosalicylic acid, 5-aminosalicylic acid, 6-aminosalicylic acid, 3-amino-4,6-dihydroxypyrimidine, 2-aminophenol, 3-aminophenol, 4-aminophenol, 2-aminothio Phenol, 3-aminothiophenol, 4-aminothiophenol, 2-anilinesulfonic acid, 3-anilinesulfonic acid, 4-anilinesulfonic acid, and some of the hydrogen atoms of these aromatic rings and hydrocarbons Examples include, but are not limited to, compounds substituted with an alkyl group of number 1 to 10, a fluoroalkyl group, a halogen atom, or the like. Moreover, in the method for producing a polyimide of the present invention, two or more of these monoamines may be used in combination.

 中でも前記モノアミン(c)が、水酸基、スルホン酸基およびチオール基からなる群より選択される1つ以上の置換基を有することが好ましい。これらモノアミンを用いることで、本発明のポリイミドを含有する樹脂組成物が優れた保存安定性や良好な加工性を示しやすく、好ましい。 Above all, the monoamine (c) preferably has one or more substituents selected from the group consisting of hydroxyl groups, sulfonic acid groups and thiol groups. By using these monoamines, the resin composition containing the polyimide of the present invention tends to exhibit excellent storage stability and good workability, which is preferable.

 本発明のポリイミドの製造方法の第1の態様においては、反応溶媒の全体100質量%に対して、水を60~100質量%含有する反応溶媒中で、テトラカルボン酸および/またはテトラカルボン酸二無水物(a)とジアミン(b)を、80℃以上250℃以下の温度範囲で反応させてポリイミドを得る工程(1)を含む。 In the first aspect of the method for producing a polyimide of the present invention, in a reaction solvent containing 60 to 100% by mass of water with respect to 100% by mass of the total reaction solvent, tetracarboxylic acid and / or tetracarboxylic acid di The process includes a step (1) of reacting anhydride (a) and diamine (b) in a temperature range of 80° C. or higher and 250° C. or lower to obtain a polyimide.

 本発明の工程(1)および後述する工程(3)で用いる反応溶媒は、反応溶媒の全体100質量%に対して、水を60~100質量%含む。また、反応溶媒として共に、例えばエタノール、メタノール、イソプロピルアルコール、tert-ブチルアルコールなどのアルコールや、エチレングリコール、ジエチレングリコール、プロピレングリコール、ポリエチレングリコール、エチレングリコールエーテルなどのグリコール類、テトラヒドロフラン、ジエチルエーテル、ジオキサン、プロピレングリコールモノメチルエーテルなどのエーテル類、γ-ブチロラクトンなどの極性の非プロトン性溶媒、アセトン、メチルエチルケトン、ジイソブチルケトン、ジアセトンアルコールなどのケトン類、酢酸エチル、プロピレングリコールモノメチルエーテルアセテート、乳酸エチルなどのエステル類、トルエン、キシレンなどの芳香族炭化水素類などの有機溶媒を用いることができる。 The reaction solvent used in step (1) of the present invention and step (3) described later contains 60 to 100% by mass of water with respect to 100% by mass of the reaction solvent as a whole. In addition, as a reaction solvent, for example, alcohols such as ethanol, methanol, isopropyl alcohol and tert-butyl alcohol, glycols such as ethylene glycol, diethylene glycol, propylene glycol, polyethylene glycol and ethylene glycol ether, tetrahydrofuran, diethyl ether, dioxane, Ethers such as propylene glycol monomethyl ether, polar aprotic solvents such as γ-butyrolactone, ketones such as acetone, methyl ethyl ketone, diisobutyl ketone, and diacetone alcohol, esters such as ethyl acetate, propylene glycol monomethyl ether acetate, and ethyl lactate. Organic solvents such as aromatic hydrocarbons such as toluene and xylene can be used.

 一般的な有機溶媒中でのポリイミド重合反応では、ポリイミド前駆体であるポリアミック酸を経由してポリイミドが生成される。一方、本発明のポリイミドの重合反応では、ポリアミック酸を経由せず、テトラカルボン酸および/またはテトラカルボン酸二無水物とジアミンが反応溶媒中で塩を形成してこのモノマー塩から脱水重縮合が進行してポリイミドが生成されると考えられる。この本発明のポリアミック酸を経由しないポリイミド重合反応の進行のためには、反応溶媒中に水を60質量%以上含む必要があり、好ましくは70質量%以上、より好ましくは80質量%以上、さらに好ましくは90質量%、もっとも好ましくは100質量%である。また、反応溶媒に含まれる有機溶媒が40質量%未満であるため、本発明の製造方法により得られるポリイミドには有機溶媒が残存し難い。この観点から、反応溶媒中に含まれる有機溶媒は40質量%未満であり、30質量%未満が好ましく、20質量%未満がより好ましく、10質量%未満がさらに好ましく、0質量%がもっとも好ましい。 In a general polyimide polymerization reaction in an organic solvent, polyimide is produced via polyamic acid, which is a polyimide precursor. On the other hand, in the polymerization reaction of the polyimide of the present invention, tetracarboxylic acid and/or tetracarboxylic dianhydride and diamine form a salt in the reaction solvent without going through the polyamic acid, and dehydration polycondensation takes place from this monomer salt. It is believed that it proceeds to produce polyimide. In order for the polyimide polymerization reaction to proceed without passing through the polyamic acid of the present invention, the reaction solvent must contain 60% by mass or more of water, preferably 70% by mass or more, more preferably 80% by mass or more, and further. It is preferably 90% by mass, most preferably 100% by mass. Moreover, since the organic solvent contained in the reaction solvent is less than 40% by mass, the organic solvent hardly remains in the polyimide obtained by the production method of the present invention. From this viewpoint, the organic solvent contained in the reaction solvent is less than 40% by mass, preferably less than 30% by mass, more preferably less than 20% by mass, even more preferably less than 10% by mass, and most preferably 0% by mass.

 また、工程(1)および後述する工程(3)で用いる反応原料であるテトラカルボン酸および/またはテトラカルボン酸二無水物やジアミン、モノアミンの総量は、反応溶媒、テトラカルボン酸および/またはテトラカルボン酸二無水物、ジアミン並びにモノアミンの総量100質量%に対して、1質量%以上であることが、イミド結合の生成反応の進行のし易さの観点から好ましく、5質量%以上がより好ましく、10質量%以上がさらに好ましい。また、反応中に起きる好ましくない副反応の抑制の観点から、50質量%以下が好ましく、40質量%以下がさらに好ましく、35質量%以下がより好ましい。 In addition, the total amount of tetracarboxylic acid and/or tetracarboxylic dianhydride, diamine, and monoamine, which are reaction raw materials used in step (1) and step (3) described later, is the reaction solvent, tetracarboxylic acid and/or tetracarboxylic acid, and Based on the total amount of 100% by mass of the acid dianhydride, diamine and monoamine, it is preferably 1% by mass or more from the viewpoint of easiness of the imide bond generation reaction, and more preferably 5% by mass or more. 10% by mass or more is more preferable. From the viewpoint of suppressing undesirable side reactions occurring during the reaction, the content is preferably 50% by mass or less, more preferably 40% by mass or less, and more preferably 35% by mass or less.

 また、本発明の工程(1)および後述する工程(3)においては、触媒を使用してもよい。ここでの触媒は、脱水重縮合反応の進行を促進するか、架橋や酸化等の副反応の進行を抑制する効果のある化合物であれば特に制限はなく、例えば有機塩基触媒または酸触媒が挙げられる。有機塩基触媒としては、トリエチルアミン、トリブチルアミン、トリペンチルアミン、N,N-ジメチルアニリン、N,N-ジエチルアニリン、ピリジン、α-ピコリン、β-ピコリン、γ-ピコリン、2,4-ルチジン、2,6-ルチジン、キノリン、イソキノリンなどが例示できる。酸触媒としては塩酸、臭化水素、ヨウ化水素、硫酸、無水硫酸、硝酸、りん酸、亜りん酸、りんタングステン酸、りんモリブデン酸などの無機酸類やメタンスルホン酸、エタンスルホン酸、トリフルオロメタンスルホン酸、ベンゼンスルホン酸、p-トルエンスルホン酸などのスルホン酸類、酢酸、しゅう酸などのカルボン酸類、クロロ酢酸、ジクロロ酢酸、トリクロロ酢酸、フルオロ酢酸、ジフルオロ酢酸、トリフルオロ酢酸などのハロゲン化カルボン酸類などが例示できる。これらの触媒は単独で用いてもよいし、2種類以上を組み合わせて用いてもよい。 In addition, a catalyst may be used in step (1) of the present invention and step (3) described later. The catalyst here is not particularly limited as long as it is a compound that has the effect of promoting the progress of the dehydration polycondensation reaction or suppressing the progress of side reactions such as cross-linking and oxidation. Examples include organic base catalysts and acid catalysts. be done. Organic base catalysts include triethylamine, tributylamine, tripentylamine, N,N-dimethylaniline, N,N-diethylaniline, pyridine, α-picoline, β-picoline, γ-picoline, 2,4-lutidine, 2 ,6-lutidine, quinoline, isoquinoline and the like. Acid catalysts include inorganic acids such as hydrochloric acid, hydrogen bromide, hydrogen iodide, sulfuric acid, sulfuric anhydride, nitric acid, phosphoric acid, phosphorous acid, phosphotungstic acid, and phosphomolybdic acid, as well as methanesulfonic acid, ethanesulfonic acid, and trifluoromethane. Sulfonic acids such as sulfonic acid, benzenesulfonic acid and p-toluenesulfonic acid; carboxylic acids such as acetic acid and oxalic acid; and halogenated carboxylic acids such as chloroacetic acid, dichloroacetic acid, trichloroacetic acid, fluoroacetic acid, difluoroacetic acid and trifluoroacetic acid. etc. can be exemplified. These catalysts may be used alone or in combination of two or more.

 本発明の工程(1)における反応温度は、反応に用いるテトラカルボン酸および/またはテトラカルボン酸二無水物とジアミンが反応してイミド結合を形成する温度である必要があるため、下限は80℃である。十分に高分子量化したポリイミドが得られるとの観点から、好ましくは100℃以上、より好ましくは120℃以上である。また、架橋の進行やモノマーの分解などを避けるため、反応温度の上限は250℃である。反応温度の上昇に伴い上昇する反応溶媒の蒸気圧に対応する必要があるため、反応容器の耐圧力や反応のハンドリング性の観点から、好ましくは230℃以下である。工程(1)においては黄色度を好ましい範囲にし易いとの観点から、より好ましくは200℃以下、さらに好ましくは160℃以下、最も好ましくは140℃以下である。 The reaction temperature in step (1) of the present invention must be a temperature at which the tetracarboxylic acid and/or tetracarboxylic dianhydride used in the reaction and the diamine react to form an imide bond, so the lower limit is 80°C. is. The temperature is preferably 100° C. or higher, more preferably 120° C. or higher, from the viewpoint that a polyimide having a sufficiently high molecular weight can be obtained. In addition, the upper limit of the reaction temperature is 250° C. in order to avoid progress of cross-linking and decomposition of the monomer. Since it is necessary to cope with the vapor pressure of the reaction solvent, which increases as the reaction temperature rises, the temperature is preferably 230° C. or less from the viewpoint of the pressure resistance of the reaction vessel and the handleability of the reaction. In the step (1), the temperature is more preferably 200° C. or lower, still more preferably 160° C. or lower, and most preferably 140° C. or lower, from the viewpoint that the yellowness degree can easily be adjusted to the preferred range.

 また、工程(1)および後述する工程(3)においては、反応圧力は反応に用いるテトラカルボン酸および/またはテトラカルボン酸二無水物とジアミンが反応してイミド結合を形成しやすいとの観点から、0.1MPa以上であることが好ましく、0.2MPa以上であることがより好ましく、0.4MPa以上であることがさらに好ましい。反応圧力に上限は特にないが、反応容器の耐圧力や反応のハンドリング性の観点から、20MPa以下であることが好ましく、10MPa以下がより好ましい。 Further, in step (1) and step (3) described later, the reaction pressure is adjusted from the viewpoint that the tetracarboxylic acid and/or tetracarboxylic dianhydride used in the reaction and the diamine are likely to react to form an imide bond. , is preferably 0.1 MPa or more, more preferably 0.2 MPa or more, further preferably 0.4 MPa or more. Although there is no particular upper limit to the reaction pressure, it is preferably 20 MPa or less, more preferably 10 MPa or less, from the viewpoint of the pressure resistance of the reaction vessel and the handleability of the reaction.

 また、工程(1)および後述する工程(3)においては、反応時間は使用した原料の種類や量、あるいは反応温度に依存するため一概に規定することはできないが、0.1時間以上が好ましく、0.5時間以上がより好ましく、1時間以上がさらに好ましい。この好ましい時間以上とすることで、未反応の原料成分を十分に減少できる傾向にある。一方、反応時間に特に上限はないが、40時間以内でも十分に反応が進行し、好ましくは20時間以内、より好ましくは10時間以内も採用できる。 In addition, in step (1) and step (3) described later, the reaction time depends on the type and amount of raw materials used or the reaction temperature, and cannot be generally defined, but is preferably 0.1 hour or longer. , more preferably 0.5 hours or longer, and more preferably 1 hour or longer. When the time is longer than this preferable time, there is a tendency that unreacted raw material components can be sufficiently reduced. On the other hand, there is no particular upper limit to the reaction time, but the reaction proceeds sufficiently within 40 hours, preferably within 20 hours, and more preferably within 10 hours.

 また、上記好ましい方法によりポリイミドを製造する工程(1)および後述する工程(3)において、反応原料および溶媒、必要に応じて触媒などを反応容器に加える方法および順序に特に制限はないが、それぞれ一括に加えてもよいし、反応溶媒に可溶な反応原料は予め反応溶媒に溶解させてから加えることもできる。また、反応を行う方法に特に制限はないが、撹拌条件下に行うことが好ましい。さらに、工程(1)および後述する工程(3)における雰囲気は非酸化性雰囲気下が望ましく、窒素、ヘリウム、およびアルゴンなどの不活性ガス雰囲気下で行うことが好ましく、経済性および取り扱いの容易さから窒素雰囲気下で行うことが好ましい。 In addition, in the step (1) for producing a polyimide by the preferred method described above and the step (3) described later, there are no particular restrictions on the method and order of adding the reaction raw materials and solvent, and if necessary, the catalyst, etc. to the reaction vessel, but each They may be added all at once, or the reaction raw materials soluble in the reaction solvent may be dissolved in the reaction solvent in advance and then added. The method of carrying out the reaction is not particularly limited, but it is preferably carried out under stirring conditions. Furthermore, the atmosphere in step (1) and step (3) to be described later is preferably a non-oxidizing atmosphere, preferably an atmosphere of an inert gas such as nitrogen, helium, and argon, which is economical and easy to handle. It is preferable to carry out in a nitrogen atmosphere.

 本発明のポリイミドの製造方法の第1の態様においては、前記工程(1)で得られたポリイミドの鎖延長工程(2)を含む。 The first aspect of the method for producing polyimide of the present invention includes step (2) for chain extension of the polyimide obtained in step (1).

 本発明で言う鎖延長工程とは、ポリイミドを高分子量化するための工程であり、工程(1)で得られたポリイミドの重量平均分子量よりも、工程(1)の後に工程(2)を経て得られたポリイミドの重量平均分子量の方が大きくなる。なお、重量平均分子量は、ゲル浸透クロマトグラフィー法(GPC法)によって測定され、ポリスチレン換算で算出される。 The chain extension step referred to in the present invention is a step for increasing the molecular weight of the polyimide, and the weight average molecular weight of the polyimide obtained in the step (1) is higher than the weight average molecular weight of the polyimide obtained in the step (1) after the step (2). The weight average molecular weight of the obtained polyimide becomes larger. The weight average molecular weight is measured by a gel permeation chromatography method (GPC method) and calculated in terms of polystyrene.

 上記工程(2)の鎖延長工程には、固相重合工程(2a)や反応溶媒の全体100質量%に対して、水を60~100質量%含有する反応溶媒中で工程(1)よりも高い温度で反応させてポリイミドを得る工程(2b)が好ましく用いることができる。 In the chain extension step of the step (2), the reaction solvent containing 60 to 100% by mass of water with respect to the solid phase polymerization step (2a) and the total 100% by mass of the reaction solvent is more than the step (1). A step (2b) of obtaining a polyimide by reaction at a high temperature can be preferably used.

 上記固相重合工程(2a)における雰囲気は非酸化性雰囲気下または減圧下であることが好ましい。非酸化性雰囲気下とは、固相重合に処すポリイミドが接する気相における、酸素濃度が5体積%以下、好ましくは2体積%以下、更に好ましくは酸素を実質的に含有しない雰囲気、即ち窒素、ヘリウム、アルゴン等の不活性ガス雰囲気であることを指し、この中でも特に経済性及び取扱いの容易さの面からは窒素雰囲気が好ましい。また、減圧条件下とは反応を行う系内が大気圧よりも低いことを指し、上限として50kPa以下が好ましく、20kPa以下がより好ましく、10kPa以下が更に好ましい。下限としては0.1Pa以上が例示できる。これによりポリイミドの架橋反応や分解反応等の好ましくない副反応の発生を抑制できる傾向にある。 The atmosphere in the solid phase polymerization step (2a) is preferably a non-oxidizing atmosphere or a reduced pressure. The term "non-oxidizing atmosphere" refers to an atmosphere having an oxygen concentration of 5% by volume or less, preferably 2% by volume or less, more preferably substantially free of oxygen in the gas phase in contact with the polyimide to be subjected to solid phase polymerization, i.e. nitrogen, It refers to an atmosphere of an inert gas such as helium or argon, and among these, a nitrogen atmosphere is particularly preferable from the viewpoint of economy and ease of handling. The pressure-reduced condition means that the pressure in the reaction system is lower than the atmospheric pressure, and the upper limit is preferably 50 kPa or less, more preferably 20 kPa or less, and even more preferably 10 kPa or less. As a lower limit, 0.1 Pa or more can be exemplified. This tends to suppress the occurrence of undesirable side reactions such as cross-linking reaction and decomposition reaction of polyimide.

 また、工程(2a)における温度は、工程(1)で得られたポリイミドの高分子量化が進行する温度であれば特に制限はないが、通常、80℃以上で行う。80℃以上で行うことで、十分な高分子量化が進行し易く、好ましい。より好ましくは100℃以上、さらに好ましくは120℃以上、特に好ましくは150℃以上、もっとも好ましくは180℃以上である。また、工程(1)で得られた固体状のポリイミドが実質的に固体状態を維持し、形状が変化しない温度以下で行い、300℃以下では加熱による架橋や分解などの副反応が起きにくく好ましい。より好ましくは280℃以下であり、さらに好ましくは260℃以下、もっとも好ましくは250℃以下である。 The temperature in step (2a) is not particularly limited as long as it is a temperature at which the polyimide obtained in step (1) is increased in molecular weight. Carrying out the reaction at 80° C. or higher facilitates sufficiently increasing the molecular weight, which is preferable. It is more preferably 100° C. or higher, still more preferably 120° C. or higher, particularly preferably 150° C. or higher, and most preferably 180° C. or higher. In addition, the solid polyimide obtained in step (1) maintains a substantially solid state and is performed at a temperature at which the shape does not change. . It is more preferably 280° C. or lower, still more preferably 260° C. or lower, and most preferably 250° C. or lower.

 また、工程(2a)における時間は、工程(1)で得られたポリイミドの高分子量化が進行する時間であれば特に制限はないが、十分な高分子量化が進行するとの観点から、1時間以上が好ましく、架橋反応や分解反応等の好ましくない副反応の発生を抑制できるとの観点から72時間以下が好ましい。より好ましくは5時間以上48時間以下であり、さらに好ましくは10時間以上36時間以下であり、最も好ましくは12時間以上24時間以下である。 In addition, the time in step (2a) is not particularly limited as long as the polyimide obtained in step (1) is sufficiently high in molecular weight. The above is preferable, and 72 hours or less is preferable from the viewpoint that undesirable side reactions such as cross-linking reaction and decomposition reaction can be suppressed. It is more preferably 5 hours or more and 48 hours or less, still more preferably 10 hours or more and 36 hours or less, and most preferably 12 hours or more and 24 hours or less.

 上記反応溶媒中で工程(1)よりも高い温度で反応させてポリイミドを得る工程(2b)は、工程(1)で得られたポリイミドを反応溶媒から回収後、再度反応溶媒に加えて、工程(1)よりも高い温度で反応させることも可能であるし、工程(1)の後にポリイミドの回収や冷却を行わずにそのまま継続して温度を高くして反応させることも可能である。工程の簡便さから、工程(1)の後にポリイミドの回収や冷却を行わずにそのまま継続して温度を高くして反応させることが好ましい。 In the step (2b) of obtaining a polyimide by reacting it in the reaction solvent at a temperature higher than that in the step (1), after recovering the polyimide obtained in the step (1) from the reaction solvent, adding it again to the reaction solvent, the step It is also possible to carry out the reaction at a higher temperature than in (1), and it is also possible to carry out the reaction at a higher temperature without recovering or cooling the polyimide after step (1). From the viewpoint of simplicity of the process, it is preferable to continue the reaction at elevated temperature without recovering or cooling the polyimide after the process (1).

 工程(2b)における反応温度は、工程(1)よりも高い温度であり、好ましくは工程(1)における反応温度よりも10℃以上200℃以下であり、より好ましくは20℃以上180℃以下、さらに好ましくは30℃以上150℃以下、最も好ましくは50℃以上120℃以下である。 The reaction temperature in step (2b) is higher than in step (1), preferably 10° C. or higher and 200° C. or lower, more preferably 20° C. or higher and 180° C. or lower than the reaction temperature in step (1), It is more preferably 30°C or higher and 150°C or lower, and most preferably 50°C or higher and 120°C or lower.

 また、工程(2b)においては、反応時間は0.1時間以上が好ましく、0.5時間以上がより好ましく、1時間以上がさらに好ましい。この好ましい時間以上とすることで、十分な高分子量化が進行する傾向にある。一方、反応時間に特に上限はないが、40時間以内でも十分に反応が進行し、好ましくは20時間以内、より好ましくは10時間以内である。 In addition, in step (2b), the reaction time is preferably 0.1 hours or longer, more preferably 0.5 hours or longer, and even more preferably 1 hour or longer. When the time is longer than this preferable time, there is a tendency that the molecular weight is sufficiently increased. On the other hand, there is no upper limit to the reaction time, but the reaction proceeds sufficiently within 40 hours, preferably within 20 hours, more preferably within 10 hours.

 また、上記好ましい方法によりポリイミドを製造する工程(2b)において、反応を行う方法に特に制限はないが、撹拌条件下に行うことが好ましい。さらに、工程(2b)における雰囲気は非酸化性雰囲気下が望ましく、窒素、ヘリウム、およびアルゴンなどの不活性ガス雰囲気下で行うことが好ましく、経済性および取り扱いの容易さから窒素雰囲気下で行うことが好ましい。 In addition, in the step (2b) of producing polyimide by the preferred method described above, the method of carrying out the reaction is not particularly limited, but it is preferably carried out under stirring conditions. Furthermore, the atmosphere in step (2b) is desirably a non-oxidizing atmosphere, preferably under an inert gas atmosphere such as nitrogen, helium, and argon, and from the viewpoint of economic efficiency and ease of handling, it is preferable to carry out under a nitrogen atmosphere. is preferred.

 本発明のポリイミドの製造方法の第2の態様においては、反応溶媒の全体100質量%に対して、水を60~100質量%含有する反応溶媒中、純度98質量%以上のテトラカルボン酸二無水物(d)と純度98質量%以上のジアミン(e)を100℃以上370℃以下の温度範囲で反応させてポリイミドを得る工程(3)を含む。 In the second aspect of the method for producing a polyimide of the present invention, a tetracarboxylic dianhydride having a purity of 98% by mass or more in a reaction solvent containing 60 to 100% by mass of water with respect to 100% by mass of the total reaction solvent. and a step (3) of reacting the substance (d) with a diamine (e) having a purity of 98% by mass or more in a temperature range of 100° C. or higher and 370° C. or lower to obtain a polyimide.

 本発明の前記工程(3)で用いられるテトラカルボン酸二無水物は、工程(1)の説明において前記したテトラカルボン酸二無水物と同様の化合物を挙げることができるが、これらに限定されない。 The tetracarboxylic dianhydride used in the step (3) of the present invention includes, but is not limited to, the same compounds as the tetracarboxylic dianhydride described above in the explanation of step (1).

 また、テトラカルボン酸二無水物の構造は特に限定されないが、純度98質量%以上であり、好ましくは純度99質量%以上、より好ましくは純度99.5質量%以上である。純度が98質量%以上のテトラカルボン酸二無水物を用いることにより、黄色度が低減したポリイミドが得られる。純度が98質量%未満の場合、得られるポリイミドの黄色度が高くなる。ここで言う黄色度とは、ポリイミドを有機溶媒に溶解したポリイミド溶液を、基材上に塗布し、溶媒を乾燥除去させることにより膜厚10μmのポリイミドフィルムを作製し、得られたフィルムをC光源の分光測色計により測定することで算出した値を示す。 Although the structure of the tetracarboxylic dianhydride is not particularly limited, it has a purity of 98% by mass or more, preferably a purity of 99% by mass or more, and more preferably a purity of 99.5% by mass or more. By using a tetracarboxylic dianhydride with a purity of 98% by mass or more, a polyimide with reduced yellowness can be obtained. When the purity is less than 98% by mass, the resulting polyimide has a high degree of yellowness. The yellowness referred to here means that a polyimide solution in which polyimide is dissolved in an organic solvent is applied onto a substrate, and the solvent is removed by drying to prepare a polyimide film having a thickness of 10 μm. Shows a value calculated by measuring with a spectrophotometer.

 本発明で言う純度とは、試料総量に対して主成分の質量比であり、純度=主成分質量/(主成分質量+不純物質量)で表される。純度は例えば、高速液体クロマトグラフィー分析やガスクロマトグラフィー分析、H-NMR分析から求めることができる。高速液体クロマトグラフィー分析では、UV検出器を具備した高速液体クロマトグラフィーで試料を成分分割した際に試料由来のピークとして帰属されるピーク面積に対して、試料中主成分に帰属されるピーク面積の割合として求めることができる。なお、この高速液体クロマトグラフィーで成分分割された各ピークの定性は、各ピークを分取液体クロマトグラフィーで分取し、赤外分光分析における吸収スペクトルや質量分析を行うことで可能である。 The purity referred to in the present invention is the mass ratio of the main component to the total amount of the sample, and is expressed by purity=mass of main component/(mass of main component+mass of impurities). Purity can be determined by, for example, high performance liquid chromatography analysis, gas chromatography analysis, and 1 H-NMR analysis. In high-performance liquid chromatography analysis, the peak area attributed to the main component in the sample is the peak area attributed to the sample-derived peak when the sample is divided into components by high-performance liquid chromatography equipped with a UV detector. It can be calculated as a percentage. The qualitative properties of each peak obtained by component separation by high-performance liquid chromatography can be performed by separating each peak by preparative liquid chromatography and performing absorption spectrum and mass spectrometry in infrared spectroscopic analysis.

 本発明で用いる純度98質量%以上のテトラカルボン酸二無水物(d)に含まれる不純物としては主にテトラカルボン酸二無水物の製造に由来する、例えば原料となるカルボン酸やカルボン酸エステル、低級カルボン酸(例えば、ギ酸、酢酸、プロピオン酸等)、無水酢酸、p-トルエンスルホン酸、スルホン酸型イオン交換樹脂などの触媒などやテトラカルボン酸二無水物の加水分解物などが挙げられる。 Impurities contained in the tetracarboxylic dianhydride (d) having a purity of 98% by mass or more used in the present invention mainly originate from the production of the tetracarboxylic dianhydride, such as raw material carboxylic acids and carboxylic acid esters, Catalysts such as lower carboxylic acids (eg, formic acid, acetic acid, propionic acid, etc.), acetic anhydride, p-toluenesulfonic acid, sulfonic acid-type ion exchange resins, etc., and hydrolysates of tetracarboxylic dianhydrides.

 本発明の前記工程(3)で用いられるジアミンは工程(1)の説明において前記したジアミンと同様の化合物を挙げることができるが、これらに限定されない。 The diamine used in the step (3) of the present invention includes the same compounds as the diamine described in the explanation of the step (1), but is not limited to these.

 中でも前記純度98質量%以上のジアミン(e)が、式(3)で表される化合物からなる群より選択される1つ以上を含むことが好ましい。 Above all, it is preferable that the diamine (e) having a purity of 98% by mass or more contains one or more selected from the group consisting of compounds represented by formula (3).

Figure JPOXMLDOC01-appb-C000007
Figure JPOXMLDOC01-appb-C000007

 式(3)中、R15は、酸素原子、C(CH、C(CFまたはSOを示し、R16およびR17は、それぞれ独立に、水素原子、水酸基、スルホン酸基またはチオール基を示す。特に水酸基である場合、得られるポリイミドがアルカリ水溶液へ溶解し易く、現像に用いる現像液であるアルカリ水溶液への溶解速度が大きくなり、樹脂組成物塗膜の硬化部と未硬化部の溶解コントラストが大きくなり微細パターン加工性が得られやすくなるため好ましい。 In formula (3), R 15 represents an oxygen atom, C(CH 3 ) 2 , C(CF 3 ) 2 or SO 2 , R 16 and R 17 each independently represents a hydrogen atom, a hydroxyl group, a sulfonic acid or a thiol group. Especially when it is a hydroxyl group, the obtained polyimide is easily dissolved in an alkaline aqueous solution, the dissolution rate in the alkaline aqueous solution which is the developer used for development increases, and the dissolution contrast between the cured part and the uncured part of the resin composition coating film is improved. It is preferable because it becomes large and fine pattern workability is easily obtained.

 また、ジアミンの構造は特に限定されないが、純度98質量%以上であり、好ましくは純度99質量%以上、より好ましくは純度99.5質量%以上である。純度が98質量%以上のジアミンを用いることにより、黄色い着色の抑制されたポリイミドが得られる。純度が98質量%未満の場合、得られるポリイミドの黄色度が高くなりやすい。 Although the structure of the diamine is not particularly limited, it has a purity of 98% by mass or more, preferably a purity of 99% by mass or more, and more preferably a purity of 99.5% by mass or more. By using a diamine having a purity of 98% by mass or more, a polyimide with suppressed yellow coloration can be obtained. If the purity is less than 98% by mass, the resulting polyimide tends to have a high degree of yellowness.

 本発明で用いる純度98質量%以上のジアミン(e)に含まれる不純物としては主にジアミンの製造に由来する化合物が挙げられる。 Impurities contained in the diamine (e) with a purity of 98% by mass or more used in the present invention include mainly compounds derived from the production of the diamine.

 また、本発明のポリイミドの製造方法は、前記工程(3)において、さらに純度97重量質量%以上のモノアミン(f)を反応させることが好ましい。このように反応させることで、ポリマー主鎖の末端を、モノアミンで末端封止することができる。末端封止は、例えばジアミンの一部をモノアミンに置き換えることで可能である。モノアミンとしては芳香族モノアミン、脂環式モノアミンを挙げることができるが、これらに限定されない。また、これらは単独で、または2種類以上を組み合わせて使用してもよい。 In addition, in the method for producing a polyimide of the present invention, it is preferable that a monoamine (f) having a purity of 97% by weight or more is further reacted in the step (3). By reacting in this manner, the ends of the polymer main chain can be end-capped with monoamines. End capping can be achieved, for example, by substituting a monoamine for a portion of the diamine. Examples of monoamines include, but are not limited to, aromatic monoamines and alicyclic monoamines. Moreover, these may be used individually or in combination of 2 or more types.

 モノアミンの具体的な例としては、工程(1)の説明において前記した化合物と同様の化合物を挙げることができるが、これらに限定されない。また、本発明のポリイミドの製造方法においては、これら2種以上のモノアミンを組み合わせて使用してもよい。 Specific examples of monoamines include, but are not limited to, compounds similar to those described above in the description of step (1). Moreover, in the method for producing the polyimide of the present invention, two or more of these monoamines may be used in combination.

 また、モノアミンの構造は特に限定されないが、純度97質量%以上であるのが好ましく、より好ましくは純度98質量%以上、更に好ましくは純度99質量%以上、特に好ましくは純度99.5質量%以上である。純度が97質量%以上のジアミンを用いることにより、黄色い着色の抑制されたポリイミドが得られる。 The structure of the monoamine is not particularly limited, but preferably has a purity of 97% by mass or more, more preferably a purity of 98% by mass or more, still more preferably a purity of 99% by mass or more, and particularly preferably a purity of 99.5% by mass or more. is. By using a diamine having a purity of 97% by mass or more, a polyimide with suppressed yellow coloration can be obtained.

 本発明で用いる純度97質量%以上のモノアミン(f)に含まれる不純物としては主にモノアミンの製造に由来する化合物が挙げられる。 Impurities contained in the monoamine (f) with a purity of 97% by mass or more used in the present invention include mainly compounds derived from the production of the monoamine.

 本発明において、上記範囲の純度のテトラカルボン酸二無水物やジアミン、モノアミンを用いることで、黄色度の低減したポリイミドが得られる理由は定かではないが、水溶媒中で100℃以上の高温で反応を行うため、これら不純物に起因する副反応や不純物化合物の酸化が起き易く、これにより生成した着色物が得られるポリイミドの黄色度の増加の原因となると考えられる。このため、本発明の範囲の純度のテトラカルボン酸やジアミンを用いることで、このような着色物の生成が抑制され、黄色度の低いポリイミドが得られると考えている。 In the present invention, it is not clear why polyimides with reduced yellowness can be obtained by using tetracarboxylic dianhydrides, diamines, and monoamines with a purity within the above range. Since the reaction is carried out, side reactions caused by these impurities and oxidation of the impurity compounds are likely to occur, which is thought to cause an increase in the yellowness of the resulting colored polyimide. Therefore, it is believed that the use of a tetracarboxylic acid or diamine having a purity within the scope of the present invention suppresses the formation of such colored matter, resulting in a polyimide with a low degree of yellowness.

 本発明のポリイミドの製造方法では、反応溶媒の全体100質量%に対して、水を60~100質量%含有する反応溶媒中、純度98質量%以上のテトラカルボン酸二無水物(d)と、純度98質量%以上のジアミン(e)を、100℃以上370℃以下の温度範囲で反応させてポリイミドを製造する工程を含む。 In the method for producing a polyimide of the present invention, a tetracarboxylic dianhydride (d) having a purity of 98% by mass or more in a reaction solvent containing 60 to 100% by mass of water with respect to 100% by mass of the total reaction solvent, A step of reacting a diamine (e) having a purity of 98% by mass or more in a temperature range of 100° C. or higher and 370° C. or lower to produce a polyimide.

 本発明のポリイミドの製造方法の第2の態様における反応温度は、反応に用いるテトラカルボン酸二無水物とジアミンが反応してイミド結合を形成する温度である必要があるため、下限は100℃である。十分に高分子量化したポリイミドが得られるとの観点から、好ましくは110℃以上、より好ましくは120℃以上であり、更に好ましくは160℃以上であり、最も好ましくは180℃以上である。また、架橋の進行やモノマーの分解などを避けるため、反応温度の上限は370℃である。反応温度の上昇に伴い上昇する反応溶媒の蒸気圧に対応する必要があるため、反応容器の耐圧力や反応のハンドリング性の観点から、好ましくは310℃以下、より好ましくは250℃以下、さらに好ましくは230℃以下である。 The reaction temperature in the second aspect of the method for producing a polyimide of the present invention must be a temperature at which the tetracarboxylic dianhydride and diamine used in the reaction react to form an imide bond, so the lower limit is 100°C. be. From the viewpoint of obtaining a polyimide having a sufficiently high molecular weight, the temperature is preferably 110° C. or higher, more preferably 120° C. or higher, still more preferably 160° C. or higher, and most preferably 180° C. or higher. In addition, the upper limit of the reaction temperature is 370° C. in order to avoid progress of cross-linking and decomposition of the monomer. Since it is necessary to cope with the vapor pressure of the reaction solvent that increases as the reaction temperature rises, it is preferably 310° C. or lower, more preferably 250° C. or lower, and still more preferably 250° C. or lower, from the viewpoint of the pressure resistance of the reaction vessel and the handleability of the reaction. is below 230°C.

 本発明のポリイミドは式(2)で表される構造単位を有するポリイミドである。 The polyimide of the present invention is a polyimide having a structural unit represented by formula (2).

Figure JPOXMLDOC01-appb-C000008
Figure JPOXMLDOC01-appb-C000008

(式(2)中、Rは炭素数5~40の4~14価の有機基、Rは炭素数5~40の2~12価の有機基を示し、RおよびRは、それぞれ独立に、水酸基、スルホン酸基、チオール基または炭素数1から20の有機基を示し、αおよびβは、α+β≧1を満たす、0から10までの整数を示す。)
 式(2)中のRはテトラカルボン酸二無水物に由来する残基を表しており、この酸二無水物は炭素数5~40の4~14価の有機基である。また、Rは、ジアミンに由来する残基を表しており、このジアミンとしては、炭素数5~40の2~14価の有機基である。R、Rのいずれか一つが1,1,1,3,3,3-ヘキサフルオロプロピル基、エーテル基、チオエーテル基、SO基より選ばれる基を少なくとも一つ含有することが好ましく、R、Rの両方が含有していてもよい。特にRおよびRがともに1,1,1,3,3,3-ヘキサフルオロプロピル基、エーテル基、チオエーテル基、SO基より選ばれる基を少なくとも一つ有することが好ましい。
(In formula (2), R 1 represents a 4- to 14-valent organic group having 5 to 40 carbon atoms, R 2 represents a 2- to 12-valent organic group having 5 to 40 carbon atoms, and R 3 and R 4 are Each independently represents a hydroxyl group, a sulfonic acid group, a thiol group, or an organic group having 1 to 20 carbon atoms, and α and β are integers from 0 to 10 that satisfy α+β≧1.)
R 1 in formula (2) represents a residue derived from a tetracarboxylic dianhydride, which is a tetravalent to 14valent organic group having 5 to 40 carbon atoms. R 2 represents a residue derived from a diamine, and the diamine is a divalent to 14-valent organic group having 5 to 40 carbon atoms. Any one of R 1 and R 2 preferably contains at least one group selected from 1,1,1,3,3,3-hexafluoropropyl group, ether group, thioether group and SO 2 group, Both R 1 and R 2 may be contained. In particular, both R 1 and R 2 preferably have at least one group selected from 1,1,1,3,3,3-hexafluoropropyl group, ether group, thioether group and SO 2 group.

 また、RおよびRは、それぞれ独立に、水酸基、スルホン酸基、チオール基または炭素数1から20の有機基を示し、αおよびβは、α+β≧1を満たす、0から10までの整数を示す。得られるポリイミドに溶媒可溶性を付与するとの観点から、RおよびRは水酸基であることが特に好ましい。 R 3 and R 4 each independently represent a hydroxyl group, a sulfonic acid group, a thiol group or an organic group having 1 to 20 carbon atoms, and α and β are integers from 0 to 10 satisfying α+β≧1 indicates From the viewpoint of imparting solvent solubility to the resulting polyimide, it is particularly preferred that R 3 and R 4 are hydroxyl groups.

 式(2)中のRは炭素数5~40の4~14価のテトラカルボン酸二無水物に由来する残基である。テトラカルボン酸二無水物残基としては、例えば、ピロメリット酸二無水物、3,3’,4,4’-ビフェニルテトラカルボン酸二無水物、2,3,3’,4’-ビフェニルテトラカルボン酸二無水物、2,2’,3,3’-ビフェニルテトラカルボン酸二無水物、3,3’,4,4’-ベンゾフェノンテトラカルボン酸二無水物、2,2’,3,3’-ベンゾフェノンテトラカルボン酸二無水物、2,2-ビス(3,4-ジカルボキシフェニル)プロパン二無水物、2,2-ビス(2,3-ジカルボキシフェニル)プロパン二無水物、1,1-ビス(3,4-ジカルボキシフェニル)エタン二無水物、1,1-ビス(2,3-ジカルボキシフェニル)エタン二無水物、ビス(3,4-ジカルボキシフェニル)メタン二無水物、ビス(2,3-ジカルボキシフェニル)メタン二無水物、ビス(3,4-ジカルボキシフェニル)スルホン二無水物、4,4’-オキシジフタル酸無水物、1,2,5,6-ナフタレンテトラカルボン酸二無水物、9,9-ビス(3,4-ジカルボキシフェニル)フルオレン酸二無水物、9,9-ビス{4-(3,4-ジカルボキシフェノキシ)フェニル}フルオレン酸二無水物、2,3,6,7-ナフタレンテトラカルボン酸二無水物、2,3,5,6-ピリジンテトラカルボン酸二無水物、3,4,9,10-ペリレンテトラカルボン酸二無水物、2,2-ビス(3,4-ジカルボキシフェニル)ヘキサフルオロプロパン二無水物などの芳香族テトラカルボン酸二無水物、3,3’,4,4’-ジフェニルスルホンテトラカルボン酸二無水物、1,2,3,4-シクロブタンテトラカルボン酸二無水物、1,2,3,4-シクロペンタンテトラカルボン酸二無水物、1,2,4,5-シクロヘキサンテトラカルボン酸二無水物、5-(2,5-ジオキソテトラヒドロフリル)-3-メチル-3-シクロヘキセン-1,2-ジカルボン酸二無水物、2,3,5-トリカルボキシ-2-シクロペンタン酢酸二無水物、2,3,4,5-テトラヒドロフランテトラカルボン酸二無水物の残基や、4-(2,5-ジオキソテトラヒドロフラン-3-イル)-1,2,3,4-テトラヒドロナフタレン-1,2-ジカルボン酸二無水物、4-(2,5-ジオキソテトラヒドロフラン-3-イル)-4メチル-1,2,3,4-テトラヒドロナフタレン-1,2-ジカルボン酸二無水物、4-(2,5-ジオキソテトラヒドロフラン-3-イル)-7メチル-1,2,3,4-テトラヒドロナフタレン-1,2-ジカルボン酸二無水物、ノルボルナン-2-スピロ-2’-シクロペンタノン-5’-スピロ-2”-ノルボルナン-5,5”,6,6”-テトラカルボン酸二無水物、ノルボルナン-2-スピロ-2’-シクロヘキサノン-6’-スピロ-2”-ノルボルナン-5,5”,6,6”-テトラカルボン酸二無水物の残基や、これらの芳香族環や炭化水素の水素原子の一部を、炭素数1~10のアルキル基やフルオロアルキル基、ハロゲン原子などで置換した化合物の残基などを挙げることができるが、これらに限定されない。また、本発明のポリイミドは、これら2種以上のテトラカルボン酸二無水物残基を含有してもよい。 R 1 in formula (2) is a residue derived from a tetracarboxylic acid dianhydride having 5 to 40 carbon atoms and 4 to 14 valences. Examples of tetracarboxylic dianhydride residues include pyromellitic dianhydride, 3,3′,4,4′-biphenyltetracarboxylic dianhydride, 2,3,3′,4′-biphenyltetracarboxylic dianhydride, Carboxylic dianhydride, 2,2',3,3'-biphenyltetracarboxylic dianhydride, 3,3',4,4'-benzophenonetetracarboxylic dianhydride, 2,2',3,3 '-benzophenonetetracarboxylic dianhydride, 2,2-bis(3,4-dicarboxyphenyl)propane dianhydride, 2,2-bis(2,3-dicarboxyphenyl)propane dianhydride, 1, 1-bis(3,4-dicarboxyphenyl)ethane dianhydride, 1,1-bis(2,3-dicarboxyphenyl)ethane dianhydride, bis(3,4-dicarboxyphenyl)methane dianhydride , bis(2,3-dicarboxyphenyl)methane dianhydride, bis(3,4-dicarboxyphenyl)sulfone dianhydride, 4,4'-oxydiphthalic anhydride, 1,2,5,6-naphthalene Tetracarboxylic dianhydride, 9,9-bis(3,4-dicarboxyphenyl)fluoric dianhydride, 9,9-bis{4-(3,4-dicarboxyphenoxy)phenyl}fluoric dianhydride 2,3,6,7-naphthalenetetracarboxylic dianhydride, 2,3,5,6-pyridinetetracarboxylic dianhydride, 3,4,9,10-perylenetetracarboxylic dianhydride, aromatic tetracarboxylic dianhydrides such as 2,2-bis(3,4-dicarboxyphenyl)hexafluoropropane dianhydride, 3,3′,4,4′-diphenylsulfonetetracarboxylic dianhydride, 1,2,3,4-cyclobutanetetracarboxylic dianhydride, 1,2,3,4-cyclopentanetetracarboxylic dianhydride, 1,2,4,5-cyclohexanetetracarboxylic dianhydride, 5 -(2,5-dioxotetrahydrofuryl)-3-methyl-3-cyclohexene-1,2-dicarboxylic dianhydride, 2,3,5-tricarboxy-2-cyclopentaneacetic dianhydride, 2, Residues of 3,4,5-tetrahydrofurantetracarboxylic dianhydride and 4-(2,5-dioxotetrahydrofuran-3-yl)-1,2,3,4-tetrahydronaphthalene-1,2-dicarboxylic acid dianhydride, 4-(2,5-dioxotetrahydrofuran-3-yl)-4methyl-1,2,3,4-tetrahydronaphthalene-1,2-dicarboxylic dianhydride, 4-(2, 5-dioxotetrahydrofuran-3-yl)-7methyl-1,2,3,4-tetrahydronaphthalene-1,2-dicarboxylic dianhydride, norbornane-2-spiro-2'-cyclopentanone-5' -spiro-2″-norbornane-5,5″,6,6″-tetracarboxylic dianhydride, norbornane-2-spiro-2′-cyclohexanone-6′-spiro-2″-norbornane-5,5″ ,6,6″-Tetracarboxylic acid dianhydride residues and some of the hydrogen atoms of these aromatic rings and hydrocarbons are replaced with alkyl groups having 1 to 10 carbon atoms, fluoroalkyl groups, halogen atoms, etc. Examples include, but are not limited to, residues of substituted compounds and the like. Moreover, the polyimide of the present invention may contain two or more of these tetracarboxylic dianhydride residues.

 式(2)中のRは炭素数5~40の2~12価のジアミンに由来する残基である。ジアミン残基としては、例えば、3,4’-ジアミノジフェニルエーテル、4,4’-ジアミノジフェニルエーテル、3,4’-ジアミノジフェニルメタン、4,4’-ジアミノジフェニルメタン、4,4’-ジアミノジフェニルメタン、3,4’-ジアミノジフェニルスルホン、4,4’-ジアミノジフェニルスルホン、3,4’-ジアミノジフェニルスルフィド、4,4’-ジアミノジフェニルスルフィド、1,4-ビス(4-アミノフェノキシ)ベンゼン、ベンジン、m-フェニレンジアミン、p-フェニレンジアミン、1,5-ナフタレンジアミン、2,6-ナフタレンジアミン、ビス(4-アミノフェノキシフェニル)スルホン、ビス(3-アミノフェノキシフェニル)スルホン、ビス(4-アミノフェノキシ)ビフェニル、ビス{4-(4-アミノフェノキシ)フェニル}エーテル、1,4-ビス(4-アミノフェノキシ)ベンゼン、1,3-ビス(4-アミノフェノキシ)ベンゼン、2,2’-ジメチル-4,4’-ジアミノビフェニル、2,2’-ジエチル-4,4’-ジアミノビフェニル、3,3’-ジメチル-4,4’-ジアミノビフェニル、3,3’-ジエチル-4,4’-ジアミノビフェニル、2,2’,3,3’-テトラメチル-4,4’-ジアミノビフェニル、3,3’,4,4’-テトラメチル-4,4’-ジアミノビフェニル、2,2’-ビス(トリフルオロメチル)-4,4’-ジアミノビフェニル、ビス(3-アミノ-4-ヒドロキシフェニル)エーテル、ビス(3-アミノ-4-ヒドロキシフェニル)メチレン、ビス[N-(3-アミノベンゾイル)-3-アミノ-4-ヒドロキシフェニル]スルホン、ビス[N-(4-アミノベンゾイル)-3-アミノ-4-ヒドロキシフェニル]スルホン、ビス(3-アミノ-4-ヒドロキシフェニル)スルホン、ビス(3-アミノ-4-ヒドロキシフェニル)プロパン、2,2’-ビス[N-(3-アミノベンゾイル)-3-アミノ-4-ヒドロキシフェニル]プロパン、2,2’-ビス[N-(4-アミノベンゾイル)-3-アミノ-4-ヒドロキシフェニル]プロパン、9,9-ビス(3-アミノ-4-ヒドロキシフェニル)フルオレン、9,9-ビス[N-(3-アミノベンゾイル)-3-アミノ-4-ヒドロキシフェニル]フルオレン、9,9-ビス[N-(4-アミノベンゾイル)-3-アミノ-4-ヒドロキシフェニル]フルオレン、N,N’-ビス(3-アミノベンゾイル)-2,5-ジアミノ-1,4-ジヒドロキシベンゼン、N,N’-ビス(4-アミノベンゾイル)-2,5-ジアミノ-1,4-ジヒドロキシベンゼン、N,N’-ビス(4-アミノベンゾイル)-4,4’-ジアミノ-3,3-ジヒドロキシビフェニル、N,N’-ビス(3-アミノベンゾイル)-3,3’-ジアミノ-4,4-ジヒドロキシビフェニル、N,N’-ビス(4-アミノベンゾイル)-3,3’-ジアミノ-4,4-ジヒドロキシビフェニル、3,3’-ジアミノ-4,4’-ビフェノール、ビス(3-アミノ-4-ヒドロキシフェニル)メタン、1,1-ビス(3-アミノ-4-ヒドロキシフェニル)エタン、2,2-ビス(3-アミノ-4-ヒドロキシフェニル)プロパン、2,2-ビス[4-(4-アミノフェノキシ)フェニル]ヘキサフルオロプロパン、2,2-ビス[4-(4-アミノフェノキシ)フェニル]プロパン、2,2-ビス(3-アミノ-4-ヒドロキシフェニル)ヘキサフルオロプロパン等の芳香族ジアミンの残基や、これらの芳香族環や炭化水素の水素原子の一部を、炭素数1~10のアルキル基やフルオロアルキル基、ハロゲン原子などで置換した化合物の残基などを挙げることができるが、これらに限定されない。また、本発明のポリイミドは、これら2種以上のジアミン残基を含有してもよい。 R 2 in formula (2) is a residue derived from a diamine to 12-valent diamine having 5 to 40 carbon atoms. Diamine residues include, for example, 3,4′-diaminodiphenyl ether, 4,4′-diaminodiphenyl ether, 3,4′-diaminodiphenylmethane, 4,4′-diaminodiphenylmethane, 4,4′-diaminodiphenylmethane, 3, 4'-diaminodiphenyl sulfone, 4,4'-diaminodiphenyl sulfone, 3,4'-diaminodiphenyl sulfide, 4,4'-diaminodiphenyl sulfide, 1,4-bis(4-aminophenoxy)benzene, benzine, m -phenylenediamine, p-phenylenediamine, 1,5-naphthalenediamine, 2,6-naphthalenediamine, bis(4-aminophenoxyphenyl)sulfone, bis(3-aminophenoxyphenyl)sulfone, bis(4-aminophenoxy) Biphenyl, bis{4-(4-aminophenoxy)phenyl}ether, 1,4-bis(4-aminophenoxy)benzene, 1,3-bis(4-aminophenoxy)benzene, 2,2'-dimethyl-4 ,4'-diaminobiphenyl, 2,2'-diethyl-4,4'-diaminobiphenyl, 3,3'-dimethyl-4,4'-diaminobiphenyl, 3,3'-diethyl-4,4'-diamino biphenyl, 2,2',3,3'-tetramethyl-4,4'-diaminobiphenyl, 3,3',4,4'-tetramethyl-4,4'-diaminobiphenyl, 2,2'-bis (trifluoromethyl)-4,4'-diaminobiphenyl, bis(3-amino-4-hydroxyphenyl)ether, bis(3-amino-4-hydroxyphenyl)methylene, bis[N-(3-aminobenzoyl) -3-amino-4-hydroxyphenyl]sulfone, bis[N-(4-aminobenzoyl)-3-amino-4-hydroxyphenyl]sulfone, bis(3-amino-4-hydroxyphenyl)sulfone, bis(3 -amino-4-hydroxyphenyl)propane, 2,2'-bis[N-(3-aminobenzoyl)-3-amino-4-hydroxyphenyl]propane, 2,2'-bis[N-(4-amino benzoyl)-3-amino-4-hydroxyphenyl]propane, 9,9-bis(3-amino-4-hydroxyphenyl)fluorene, 9,9-bis[N-(3-aminobenzoyl)-3-amino- 4-hydroxyphenyl]fluorene, 9,9-bis[N-(4-aminobenzoyl)-3-amino-4-hydroxyphenyl]fluorene, N,N'-bis(3-aminobenzoyl)-2,5- diamino-1,4-dihydroxybenzene, N,N'-bis(4-aminobenzoyl)-2,5-diamino-1,4-dihydroxybenzene, N,N'-bis(4-aminobenzoyl)-4, 4'-diamino-3,3-dihydroxybiphenyl, N,N'-bis(3-aminobenzoyl)-3,3'-diamino-4,4-dihydroxybiphenyl, N,N'-bis(4-aminobenzoyl )-3,3′-diamino-4,4-dihydroxybiphenyl, 3,3′-diamino-4,4′-biphenol, bis(3-amino-4-hydroxyphenyl)methane, 1,1-bis(3 -amino-4-hydroxyphenyl)ethane, 2,2-bis(3-amino-4-hydroxyphenyl)propane, 2,2-bis[4-(4-aminophenoxy)phenyl]hexafluoropropane, 2,2 - Residues of aromatic diamines such as bis[4-(4-aminophenoxy)phenyl]propane and 2,2-bis(3-amino-4-hydroxyphenyl)hexafluoropropane, and aromatic rings and carbonization thereof Examples include, but are not limited to, residues of compounds in which a portion of the hydrogen atoms are substituted with an alkyl group having 1 to 10 carbon atoms, a fluoroalkyl group, a halogen atom, or the like. Moreover, the polyimide of the present invention may contain two or more of these diamine residues.

 また、本発明のポリイミドの主鎖末端の少なくとも1つは、末端封止剤により封鎖された構造を含むことが好ましい。封鎖された構造としては、特に限定されないが、モノアミンに由来する残基が好ましく例示できる。モノアミン残基としては、例えば、5-アミノ-8-ヒドロキシキノリン、1-ヒドロキシ-7-アミノナフタレン、1-ヒドロキシ-6-アミノナフタレン、1-ヒドロキシ-5-アミノナフタレン、1-ヒドロキシ-4-アミノナフタレン、2-ヒドロキシ-7-アミノナフタレン、2-ヒドロキシ-6-アミノナフタレン、2-ヒドロキシ-5-アミノナフタレン、1-カルボキシ-7-アミノナフタレン、1-カルボキシ-6-アミノナフタレン、1-カルボキシ-5-アミノナフタレン、2-カルボキシ-7-アミノナフタレン、2-カルボキシ-6-アミノナフタレン、2-カルボキシ-5-アミノナフタレン、2-アミノ安息香酸、3-アミノ安息香酸、4-アミノ安息香酸、4-アミノサリチル酸、5-アミノサリチル酸、6-アミノサリチル酸、3-アミノ-4,6-ジヒドロキシピリミジン、2-アミノフェノール、3-アミノフェノール、4-アミノフェノール、2-アミノチオフェノール、3-アミノチオフェノール、4-アミノチオフェノールの残基や、これらの芳香族環や炭化水素の水素原子の一部を、炭素数1~10のアルキル基やフルオロアルキル基、ハロゲン原子などで置換した化合物の残基などを挙げることができるが、これらに限定されない。また、本発明のポリイミドは、これら2種以上のモノアミン残基を含有してもよい。 In addition, at least one of the main chain ends of the polyimide of the present invention preferably contains a structure blocked with a terminal blocking agent. Although the blocked structure is not particularly limited, a residue derived from monoamine can be preferably exemplified. Monoamine residues include, for example, 5-amino-8-hydroxyquinoline, 1-hydroxy-7-aminonaphthalene, 1-hydroxy-6-aminonaphthalene, 1-hydroxy-5-aminonaphthalene, 1-hydroxy-4- aminonaphthalene, 2-hydroxy-7-aminonaphthalene, 2-hydroxy-6-aminonaphthalene, 2-hydroxy-5-aminonaphthalene, 1-carboxy-7-aminonaphthalene, 1-carboxy-6-aminonaphthalene, 1- Carboxy-5-aminonaphthalene, 2-carboxy-7-aminonaphthalene, 2-carboxy-6-aminonaphthalene, 2-carboxy-5-aminonaphthalene, 2-aminobenzoic acid, 3-aminobenzoic acid, 4-aminobenzoic acid acid, 4-aminosalicylic acid, 5-aminosalicylic acid, 6-aminosalicylic acid, 3-amino-4,6-dihydroxypyrimidine, 2-aminophenol, 3-aminophenol, 4-aminophenol, 2-aminothiophenol, 3 -Aminothiophenol, 4-aminothiophenol residues, and some of the hydrogen atoms of these aromatic rings and hydrocarbons are substituted with alkyl groups having 1 to 10 carbon atoms, fluoroalkyl groups, halogen atoms, etc. Examples include, but are not limited to, residues of compounds and the like. Moreover, the polyimide of the present invention may contain two or more of these monoamine residues.

 末端封止剤のポリイミド末端への導入割合は、その元成分である末端封止剤の1級モノアミン成分で換算すると、全アミン成分に対して0.1~60モル%の範囲であることが好ましく、より好ましくは5~50モル%である。 The introduction ratio of the terminal blocking agent to the polyimide terminal is in the range of 0.1 to 60 mol% with respect to the total amine component when converted to the primary monoamine component of the terminal blocking agent, which is the original component. It is preferably 5 to 50 mol %, more preferably 5 to 50 mol %.

 さらに、半導体素子や回路基板に用いた場合の基板との接着性を向上させるために、耐熱性を低下させない範囲で前記式(3)中のR、Rにシロキサン構造を有する脂肪族の基を共重合してもよい。具体的にはジアミン成分として、ビス(3-アミノプロピル)テトラメチルジシロキサン、ビス(p-アミノ-フェニル)オクタメチルペンタシロキサンなどを1~10モル%共重合したものなどが挙げられる。 Furthermore, in order to improve the adhesiveness to substrates when used for semiconductor elements or circuit boards, an aliphatic compound having a siloxane structure in R 1 and R 2 in the formula (3) is used within a range that does not reduce the heat resistance. The groups may be copolymerized. Specific examples of the diamine component include those obtained by copolymerizing 1 to 10 mol % of bis(3-aminopropyl)tetramethyldisiloxane, bis(p-amino-phenyl)octamethylpentasiloxane, or the like.

 本発明のポリイミドは、重量平均分子量が1,000以上200,000以下であることが好ましく、5,000以上100,000以下であることがより好ましく、10,000以上50,000以下であることがさらに好ましい。この範囲であることで、良好な加工性、機械特性、耐熱性を得ることができる。重量平均分子量は、ゲル浸透クロマトグラフィー法(GPC法)によって測定され、ポリスチレン換算で算出される。 The polyimide of the present invention preferably has a weight average molecular weight of 1,000 or more and 200,000 or less, more preferably 5,000 or more and 100,000 or less, and 10,000 or more and 50,000 or less. is more preferred. Within this range, good workability, mechanical properties, and heat resistance can be obtained. The weight average molecular weight is measured by a gel permeation chromatography method (GPC method) and calculated in terms of polystyrene.

 本発明のポリイミドは、溶媒可溶性であることが好ましい。特にアルカリ可溶性であることが好ましい。ここでいう溶媒可溶性樹脂とは、有機溶媒またはアルカリ水溶液100gに対して、25℃において0.1g以上溶解する樹脂を指す。 The polyimide of the present invention is preferably solvent-soluble. Alkali-soluble is particularly preferred. The solvent-soluble resin as used herein refers to a resin that dissolves at 25° C. in an amount of 0.1 g or more in 100 g of an organic solvent or an alkaline aqueous solution.

 有機溶媒としては、γ-ブチロラクトン、γ-バレロラクトン、δ-バレロラクトン、ジメチルスルホキシド、テトラヒドロフラン、ジオキサン、プロピレングリコールモノメチルエーテル、プロピレングリコールモノエチルエーテル、アセトン、メチルエチルケトン、シクロペンタノン、シクロヘキサノン、酢酸エチル、酢酸ブチル、酢酸イソブチル、酢酸プロピル、プロピレングリコールモノメチルエーテルアセテート、3-メチル-3-メトキシブチルアセテート、乳酸メチル、乳酸エチル、ジアセトンアルコール、3-メチル-3-メトキシブタノール、トルエン、キシレン、N-メチル-2-ピロリドン、N-エチル-2-ピロリドン、N,N-ジメチルホルムアミド、N,N-ジメチルアセトアミド、1,3-ジメチル-2-イミダゾリジノン、N,N’-ジメチルプロピレン尿素、1,3-ジメチルイソブチルアミド、メトキシ-N,N-ジメチルプロピオンアミド、ブトキシ-N,N-ジメチルプロピオンアミド等が挙げられる。 Organic solvents include γ-butyrolactone, γ-valerolactone, δ-valerolactone, dimethylsulfoxide, tetrahydrofuran, dioxane, propylene glycol monomethyl ether, propylene glycol monoethyl ether, acetone, methyl ethyl ketone, cyclopentanone, cyclohexanone, ethyl acetate, Butyl acetate, isobutyl acetate, propyl acetate, propylene glycol monomethyl ether acetate, 3-methyl-3-methoxybutyl acetate, methyl lactate, ethyl lactate, diacetone alcohol, 3-methyl-3-methoxybutanol, toluene, xylene, N- methyl-2-pyrrolidone, N-ethyl-2-pyrrolidone, N,N-dimethylformamide, N,N-dimethylacetamide, 1,3-dimethyl-2-imidazolidinone, N,N'-dimethylpropylene urea, 1 ,3-dimethylisobutyramide, methoxy-N,N-dimethylpropionamide, butoxy-N,N-dimethylpropionamide and the like.

 アルカリ水溶液としては、テトラメチルアンモニウムヒドロキシド(TMAH)、ジエタノールアミン、ジエチルアミノエタノール、水酸化ナトリウム、水酸化カリウム、炭酸ナトリウム、炭酸カリウム、トリエチルアミン、ジエチルアミン、メチルアミン、ジメチルアミン、酢酸ジメチルアミノエチル、ジメチルアミノエタノール、ジメチルアミノエチルメタクリレート、シクロヘキシルアミン、エチレンジアミン、ヘキサメチレンジアミン等の水溶液が挙げられる。 Examples of alkaline aqueous solutions include tetramethylammonium hydroxide (TMAH), diethanolamine, diethylaminoethanol, sodium hydroxide, potassium hydroxide, sodium carbonate, potassium carbonate, triethylamine, diethylamine, methylamine, dimethylamine, dimethylaminoethyl acetate, dimethylamino Aqueous solutions of ethanol, dimethylaminoethyl methacrylate, cyclohexylamine, ethylenediamine, hexamethylenediamine and the like can be mentioned.

 ポリイミドが溶媒可溶性であると、ポリイミドを溶解させたポリイミド溶液を用いた感光性樹脂組成物を現像することができる点で好ましく、現像液としてアルカリ溶液を用いることができる観点から、特にアルカリ可溶性であることが好ましい。溶媒可溶性を発現するために、本発明のポリイミドは上記した通り水酸基、スルホン酸基、チオール基または炭素数1から20の有機基を有することが好ましく、現像液であるアルカリ水溶液への溶解速度が大きくなり、樹脂組成物塗膜の硬化部と未硬化部の溶解コントラストが大きくなり微細パターン加工性が得られやすくなる観点から特に水酸基が好ましい。 When the polyimide is solvent-soluble, it is preferable in that a photosensitive resin composition using a polyimide solution in which the polyimide is dissolved can be developed, and from the viewpoint that an alkaline solution can be used as a developer, it is particularly alkali-soluble. Preferably. In order to exhibit solvent solubility, the polyimide of the present invention preferably has a hydroxyl group, a sulfonic acid group, a thiol group, or an organic group having 1 to 20 carbon atoms as described above, and the dissolution rate in an alkaline aqueous solution as a developer is A hydroxyl group is particularly preferable from the viewpoint that it becomes larger, the dissolution contrast between the cured portion and the uncured portion of the resin composition coating film increases, and fine pattern workability can be easily obtained.

 本発明のポリイミドは、1μmの膜厚あたりの365nmの波長に対する、光透過率が90%以上であることが好ましく、95%以上であることがより好ましく、99%以上であることがさらに好ましい。この範囲であることで、感光性樹脂組成物としたときに、20μm以上の厚膜においても微細なパターン加工性を発現できる。 The polyimide of the present invention preferably has a light transmittance of 90% or more, more preferably 95% or more, and even more preferably 99% or more at a wavelength of 365 nm per 1 μm film thickness. Within this range, fine pattern workability can be expressed even in a thick film of 20 μm or more when the photosensitive resin composition is formed.

 また、本発明のポリイミドは黄色度が0~3.0の範囲である。黄色度がこの範囲を外れると、透明性が損なわれ、外観が不良となり、半導体素子や回路基板に使用するのに適さない。ここで言う黄色度とは、ポリイミドを有機溶媒に溶解したポリイミド溶液を、基材上に塗布し、溶媒を乾燥除去させることによりポリイミドフィルムを作製し、得られたフィルムをC光源のカラーメーターにより測定することで算出した値を示す。黄色度は好ましくは0~2.8、より好ましくは0~2.5の範囲である。純度98質量%以上のテトラカルボン酸二無水物(a)および純度98質量%以上のジアミン(b)を用いることで、この範囲の黄色度のポリイミドが得られる。 In addition, the polyimide of the present invention has a yellowness in the range of 0 to 3.0. If the yellowness is out of this range, the transparency will be impaired and the appearance will be poor, making it unsuitable for use in semiconductor devices and circuit boards. The yellowness referred to here means that a polyimide solution in which polyimide is dissolved in an organic solvent is applied onto a substrate, and the solvent is removed by drying to prepare a polyimide film, and the obtained film is measured by a C light source color meter. Indicates a value calculated by measurement. The yellowness index preferably ranges from 0 to 2.8, more preferably from 0 to 2.5. By using a tetracarboxylic dianhydride (a) with a purity of 98% by mass or more and a diamine (b) with a purity of 98% by mass or more, a polyimide having a yellowness within this range can be obtained.

 また、本発明のポリイミドは有機溶媒の含有量が1質量%以下であり、実質的に有機溶媒を含まない。好ましくは0.1質量%以下であり、さらに好ましくは0質量%である場合が挙げられ、ここで、0質量%とは有機溶媒を一切含有しないことを言う。ポリイミド中の有機溶媒の含有量が前記範囲内であると、取り扱い時において有機溶媒に由来する人体への安全性が高まる。 In addition, the polyimide of the present invention has an organic solvent content of 1% by mass or less and does not substantially contain an organic solvent. The content is preferably 0.1% by mass or less, and more preferably 0% by mass. Here, 0% by mass means that the organic solvent is not contained at all. When the content of the organic solvent in the polyimide is within the above range, the safety to the human body derived from the organic solvent during handling increases.

 有機溶媒の含有量は、高速液体クロマトグラフィーやガスクロマトグラフィー、全有機炭素濃度(TOC)を測定することにより算出することができる。例えばTOC測定では、重合して得られたポリイミドから蒸留水用いて水溶性成分を抽出して、抽出された有機炭素濃度を測定することにより、サンプル中の有機溶媒の含有量が算出される。 The content of organic solvents can be calculated by high-performance liquid chromatography, gas chromatography, and measuring the total organic carbon concentration (TOC). For example, in TOC measurement, water-soluble components are extracted from polyimide obtained by polymerization using distilled water, and the concentration of extracted organic carbon is measured to calculate the content of organic solvent in the sample.

 本発明のポリイミド樹脂組成物は、前記式(2)で表されるポリイミドと、感光剤および溶剤を含有する。 The polyimide resin composition of the present invention contains the polyimide represented by the formula (2), a photosensitizer and a solvent.

 感光剤としては、光酸発生剤、光塩基発生剤、光重合開始剤などを用いることができる。光酸発生剤を用いた場合は、樹脂組成物の光照射部に酸が発生し、光照射部のアルカリ現像液に対する溶解性が増大するため、光照射部が溶解するポジ型のパターンを得ることができる。光重合開始剤を用いた場合は、樹脂組成物の光照射部にラジカルが発生してラジカル重合が進行し、アルカリ現像液に対して不溶化することで、ネガ型のパターンを形成することができる。また、露光時のUV硬化が促進されて、感度を向上させることができる。 As the photosensitizer, a photoacid generator, a photobase generator, a photopolymerization initiator, etc. can be used. When a photoacid generator is used, an acid is generated in the light-irradiated portion of the resin composition, and the solubility of the light-irradiated portion in an alkaline developer increases, so that a positive pattern in which the light-irradiated portion dissolves is obtained. be able to. When a photopolymerization initiator is used, radicals are generated in the light-irradiated portion of the resin composition, radical polymerization proceeds, and the resin composition becomes insoluble in an alkaline developer, thereby forming a negative pattern. . In addition, UV curing during exposure is accelerated, and sensitivity can be improved.

 光酸発生剤としては、キノンジアジド化合物が例示でき、フェノール性水酸基を有する化合物にナフトキノンジアジドのスルホン酸がエステルで結合した化合物が好ましい。ここで用いられるフェノール性水酸基を有する化合物としては、例えば、Bis-Z、BisOC-Z、BisOPP-Z、BisP-CP、Bis26X-Z、BisOTBP-Z、BisOCHP-Z、BisOCR-CP、BisP-MZ、BisP-EZ、Bis26X-CP、BisP-PZ、BisP-IPZ、BisCR-IPZ、BisOCP-IPZ、BisOIPP-CP、Bis26X-IPZ、BisOTBP-CP、TekP-4HBPA(テトラキスP-DO-BPA)、TrisP-HAP、TrisP-PA、BisOFP-Z、BisRS-2P、BisPG-26X、BisRS-3P、BisOC-OCHP、BisPC-OCHP、Bis25X-OCHP、Bis26X-OCHP、BisOCHP-OC、Bis236T-OCHP、メチレントリス-FR-CR、BisRS-26X、BisRS-OCHP(以上、商品名、本州化学工業(株)製)、BIR-OC、BIP-PC、BIR-PC、BIR-PTBP、BIR-PCHP、BIP-BIOC-F、4PC、BIR-BIPC-F、TEP-BIP-A(以上、商品名、旭有機材工業(株)製)、4,4’-スルホニルジフェノール(和光純薬(株)社製)、BPFL(商品名、JFEケミカル(株)製)が挙げられる。これらフェノール性水酸基を有する化合物に4-ナフトキノンジアジドスルホン酸あるいは5-ナフトキノンジアジドスルホン酸をエステル結合で導入したものが好ましいものとして例示することができ、これ以外の化合物を使用することもできる。 A quinonediazide compound can be exemplified as the photoacid generator, and a compound in which a sulfonic acid of naphthoquinonediazide is bonded to a compound having a phenolic hydroxyl group via an ester is preferable. Examples of compounds having a phenolic hydroxyl group used here include Bis-Z, BisOC-Z, BisOPP-Z, BisP-CP, Bis26X-Z, BisOTBP-Z, BisOCHP-Z, BisOCR-CP, and BisP-MZ. , BisP-EZ, Bis26X-CP, BisP-PZ, BisP-IPZ, BisCR-IPZ, BisOCP-IPZ, BisOIPP-CP, Bis26X-IPZ, BisOTBP-CP, TekP-4HBPA (tetrakis P-DO-BPA), TrisP -HAP, TrisP-PA, BisOFP-Z, BisRS-2P, BisPG-26X, BisRS-3P, BisOC-OCHP, BisPC-OCHP, Bis25X-OCHP, Bis26X-OCHP, BisOCHP-OC, Bis236T-OCHP, methylene tris- FR-CR, BisRS-26X, BisRS-OCHP (trade names, manufactured by Honshu Chemical Industry Co., Ltd.), BIR-OC, BIP-PC, BIR-PC, BIR-PTBP, BIR-PCHP, BIP-BIOC- F, 4PC, BIR-BIPC-F, TEP-BIP-A (trade names, manufactured by Asahi Organic Chemicals Industry Co., Ltd.), 4,4'-sulfonyldiphenol (manufactured by Wako Pure Chemical Industries, Ltd.), BPFL (trade name, manufactured by JFE Chemical Co., Ltd.) can be mentioned. Preferable examples are those obtained by introducing 4-naphthoquinonediazide sulfonic acid or 5-naphthoquinone diazide sulfonic acid into these compounds having a phenolic hydroxyl group via an ester bond, and compounds other than these can also be used.

 光重合開始剤としては、重合性不飽和官能基を含有する化合物があり、その官能基としては例えば、ビニル基、アリル基、アクリロイル基、メタクリロイル基等の不飽和二重結合官能基および/またプロパルギル等の不飽和三重結合官能基が挙げられ、これらの中でも共役型のビニル基やアクリロイル基、メタクリロイル基が重合性の面で好ましい。またその官能基が含有される数としては安定性の点から1~4であることが好ましく、それぞれは同一の基でなくとも構わない。また、ここで言う化合物は、分子量30~800のものを示す。具体的には、例えば、ベンゾフェノン、ミヒラーズケトン、4,4,-ビス(ジエチルアミノ)ベンゾフェノン、3,3,4,4,-テトラ(t-ブチルパーオキシカルボニル)ベンゾフェノン等のベンゾフェノン類や3,5-ビス(ジエチルアミノベンジリデン)-N-メチル-4-ピペリドン、3,5-ビス(ジエチルアミノベンジリデン)-N-エチル-4-ピペリドン等のベンジリデン類、7-ジエチルアミノ-3-テノニルクマリン、4,6-ジメチル-3-エチルアミノクマリン、3,3,-カルボニルビス(7-ジエチルアミノクマリン)、7-ジエチルアミノ3-(1-メチルメチルベンゾイミダゾリル)クマリン、3-(2-ベンゾチアゾリル)-7-ジエチルアミノクマリン等のクマリン類、2-t-ブチルアントラキノン、2-エチルアントラキノン、1,2-ベンズアントラキノン等のアントラキノン類、ベンゾインメチルエーテル、ベンゾインエチルエーテル、ベンゾインイソプロピルエーテル等のベンゾイン類、2,4-ジメチルチオキサントン、2,4-ジエチルチオキサントン、2,4-ジイソプロピルチオキサントン、2-イソプロピルチオキサントン等のチオキサントン類、エチレングリコールジ(3-メルカプトプロピオネート)、2-メルカプトベンズチアゾール、2-メルカプトベンゾキサゾール、2-メルカプトベンズイミダゾール等のメルカプト類、N-フェニルグリシン、N-メチル-N-フェニルグリシン、N-エチル-N-(p-クロロフェニル)グリシン、N-(4-シアノフェニル)グリシン等のグリシン類、1-フェニル-1,2-ブタンジオン-2-(o-メトキシカルボニル)オキシム、1-フェニル-1,2-プロパンジオン-2-(o-メトキシカルボニル)オキシム、1-フェニル-1,2-プロパンジオン-2-(o-エトキシカルボニル)オキシム、1-フェニル-1,2-プロパンジオン-2-(o-ベンゾイル)オキシム、ビス(α-イソニトロソプロピオフェノンオキシム)イソフタル、1,2-オクタンジオン,1-[4-(フェニルチオ)フェニル]-,2-(o-ベンゾイルオキシム)等のオキシム類、2-ベンジル-2-ジメチルアミノ-1-(4-モルフォリノフェニル)-ブタノン-1、2-メチル-1[4-(メチルチオ)フェニル]-2-モリフォリノプロパン-1-オン等のα-アミノアルキルフェノン類、2,2’-ビス(o-クロロフェニル)-4,4’,5,5’-テトラフェニルビイミダゾールなどが挙げられる。これらは単独で又は2種類以上を組み合わせて使用される。 Photopolymerization initiators include compounds containing polymerizable unsaturated functional groups. Examples include unsaturated triple bond functional groups such as propargyl, and among these, conjugated vinyl groups, acryloyl groups, and methacryloyl groups are preferred from the standpoint of polymerizability. The number of functional groups contained is preferably 1 to 4 from the standpoint of stability, and the groups do not have to be the same. Further, the compound referred to herein means one having a molecular weight of 30-800. Specifically, for example, benzophenones such as benzophenone, Michler's ketone, 4,4,-bis(diethylamino)benzophenone, 3,3,4,4,-tetra(t-butylperoxycarbonyl)benzophenone, and 3,5- benzylidenes such as bis(diethylaminobenzylidene)-N-methyl-4-piperidone, 3,5-bis(diethylaminobenzylidene)-N-ethyl-4-piperidone, 7-diethylamino-3-thenonylcoumarin, 4,6- dimethyl-3-ethylaminocoumarin, 3,3-carbonylbis(7-diethylaminocoumarin), 7-diethylamino-3-(1-methylmethylbenzimidazolyl)coumarin, 3-(2-benzothiazolyl)-7-diethylaminocoumarin, etc. coumarins, anthraquinones such as 2-t-butylanthraquinone, 2-ethylanthraquinone, 1,2-benzanthraquinone, benzoins such as benzoin methyl ether, benzoin ethyl ether, and benzoin isopropyl ether, 2,4-dimethylthioxanthone, 2 Thioxanthones such as ,4-diethylthioxanthone, 2,4-diisopropylthioxanthone, 2-isopropylthioxanthone, ethylene glycol di(3-mercaptopropionate), 2-mercaptobenzthiazole, 2-mercaptobenzoxazole, 2-mercapto mercaptos such as benzimidazole, glycines such as N-phenylglycine, N-methyl-N-phenylglycine, N-ethyl-N-(p-chlorophenyl)glycine, N-(4-cyanophenyl)glycine, 1- Phenyl-1,2-butanedione-2-(o-methoxycarbonyl)oxime, 1-phenyl-1,2-propanedione-2-(o-methoxycarbonyl)oxime, 1-phenyl-1,2-propanedione- 2-(o-ethoxycarbonyl) oxime, 1-phenyl-1,2-propanedione-2-(o-benzoyl) oxime, bis(α-isonitrosopropiophenone oxime) isophthal, 1,2-octanedione, 1-[4-(phenylthio)phenyl]-, 2-(o-benzoyloxime) and other oximes, 2-benzyl-2-dimethylamino-1-(4-morpholinophenyl)-butanone-1,2- α-aminoalkylphenones such as methyl-1[4-(methylthio)phenyl]-2-morifolinopropan-1-one, 2,2′-bis(o-chlorophenyl)-4,4′,5, 5′-tetraphenylbiimidazole and the like. These are used alone or in combination of two or more.

 また、感光剤の含有量は特に限定されないが、樹脂組成物中のポリイミド100質量部に対して、0.1質量部以上が好ましく、0.5質量部以上がより好ましく、0.7質量部以上がさらに好ましく、1質量部以上が特に好ましい。感光剤の含有量が上記範囲内にあると、後述する露光時の感度を向上させることができる。一方、感光剤の含有量は、樹脂組成物中のポリイミド100質量部に対して、25質量部以下が好ましく、20質量部以下がより好ましく、17質量部以下がさらに好ましく、15質量部以下が特に好ましい。感光剤の含有量が上記範囲内であると、現像後の解像度を向上させることができる。 The content of the photosensitizer is not particularly limited, but is preferably 0.1 parts by mass or more, more preferably 0.5 parts by mass or more, and 0.7 parts by mass with respect to 100 parts by mass of the polyimide in the resin composition. The above is more preferable, and 1 part by mass or more is particularly preferable. When the content of the photosensitive agent is within the above range, the sensitivity during exposure, which will be described later, can be improved. On the other hand, the content of the photosensitive agent is preferably 25 parts by mass or less, more preferably 20 parts by mass or less, still more preferably 17 parts by mass or less, with respect to 100 parts by mass of the polyimide in the resin composition. Especially preferred. The resolution after development can be improved as content of a photosensitive agent is in the said range.

 本発明のポリイミド樹脂組成物が含有する溶剤は、例えば、γ―ブチロラクトン、γ―バレロラクトン、δ―バレロラクトン、ジメチルスルホキシド、テトラヒドロフラン、ジオキサン、プロピレングリコールモノメチルエーテル、プロピレングリコールモノエチルエーテル、アセトン、メチルエチルケトン、シクロペンタノン、シクロヘキサノン、酢酸エチル、酢酸ブチル、酢酸イソブチル、酢酸プロピル、プロピレングリコールモノメチルエーテルアセテート、3-メチル-3-メトキシブチルアセテート、乳酸メチル、乳酸エチル、ジアセトンアルコール、3-メチル-3-メトキシブタノール、トルエン、キシレン、N-メチル-2-ピロリドン、N-エチル-2-ピロリドン、N,N-ジメチルホルムアミド、N,N-ジメチルアセトアミド、1,3-ジメチル-2-イミダゾリジノン、N,N’-ジメチルプロピレン尿素、1,3-ジメチルイソブチルアミド、メトキシ-N,N-ジメチルプロピオンアミド、ブトキシ-N,N-ジメチルプロピオンアミド、ジメチルスルホキシド等が挙げられるが、これらに限定されない。 Solvents contained in the polyimide resin composition of the present invention include, for example, γ-butyrolactone, γ-valerolactone, δ-valerolactone, dimethylsulfoxide, tetrahydrofuran, dioxane, propylene glycol monomethyl ether, propylene glycol monoethyl ether, acetone, methyl ethyl ketone. , cyclopentanone, cyclohexanone, ethyl acetate, butyl acetate, isobutyl acetate, propyl acetate, propylene glycol monomethyl ether acetate, 3-methyl-3-methoxybutyl acetate, methyl lactate, ethyl lactate, diacetone alcohol, 3-methyl-3 -methoxybutanol, toluene, xylene, N-methyl-2-pyrrolidone, N-ethyl-2-pyrrolidone, N,N-dimethylformamide, N,N-dimethylacetamide, 1,3-dimethyl-2-imidazolidinone, N,N'-dimethylpropylene urea, 1,3-dimethylisobutyramide, methoxy-N,N-dimethylpropionamide, butoxy-N,N-dimethylpropionamide, dimethylsulfoxide, and the like, but are not limited to these.

 好ましくは、健康や環境へ懸念のある溶剤を使用しないことであり、具体的にはREACH規制など各国の規制対象となる溶剤であり、N-メチル-2-ピロリドン、N,N-ジメチルホルムアミド、N,N-ジメチルアセトアミドなどを使用しないことが挙げられる。 It is preferable not to use solvents that pose health or environmental concerns, specifically solvents that are subject to regulations in each country such as REACH regulations, N-methyl-2-pyrrolidone, N,N-dimethylformamide, For example, N,N-dimethylacetamide is not used.

 これによって、本発明のポリイミドは実質的に有機溶媒を含まないため、本発明のポリイミド樹脂組成物は、REACH規制など各国の規制対象となる健康や環境への懸念のある溶剤が0質量%である。ここで、0質量%とは有機溶媒を一切含有しないことを言う。 As a result, since the polyimide of the present invention does not substantially contain an organic solvent, the polyimide resin composition of the present invention contains 0% by mass of solvents that pose health and environmental concerns that are subject to regulations in various countries such as REACH regulations. be. Here, 0% by mass means that no organic solvent is contained.

 また、溶剤の含有量は特に限定されないが、樹脂組成物中のポリイミド100質量部に対して、100質量部以上10,000質量部以下が好ましく、100質量部以上5,000質量部以下がより好ましく、100質量部以上2,000質量部以下が特に好ましい。溶剤の含有量を上記範囲とすることで、塗布性と塗膜の平坦性に優れ、膜厚1μm以上の塗布膜を形成することができる点で好ましい。 In addition, although the content of the solvent is not particularly limited, it is preferably 100 parts by mass or more and 10,000 parts by mass or less, more preferably 100 parts by mass or more and 5,000 parts by mass or less, relative to 100 parts by mass of the polyimide in the resin composition. 100 parts by mass or more and 2,000 parts by mass or less is particularly preferable. By setting the content of the solvent within the above range, it is preferable in terms of being able to form a coating film having a thickness of 1 μm or more with excellent coatability and flatness of the coating film.

 本発明のポリイミド樹脂組成物は、必要に応じて架橋剤、架橋促進剤、増感剤、溶解調整剤、界面活性剤、安定剤、消泡剤などの添加剤を含有することもできる。 The polyimide resin composition of the present invention can also contain additives such as cross-linking agents, cross-linking accelerators, sensitizers, dissolution modifiers, surfactants, stabilizers and antifoaming agents, if necessary.

 本発明の硬化物は、前記ポリイミド樹脂組成物を硬化したことを特徴とする硬化物である。 The cured product of the present invention is a cured product obtained by curing the polyimide resin composition.

 本発明の硬化物を得る方法としては、ポリイミド樹脂組成物を基板上に塗布し、乾燥して基板上にポリイミド樹脂膜を形成する工程と、該感光性樹脂膜を露光する工程と、該ポリイミド樹脂膜の未露光部を現像液で除去して現像する工程、および現像後のポリイミド樹脂膜を加熱処理して硬化物とする工程とを含む方法が例示できる。 The method for obtaining the cured product of the present invention includes the steps of applying a polyimide resin composition on a substrate and drying to form a polyimide resin film on the substrate, exposing the photosensitive resin film, and the polyimide A method including a step of removing an unexposed portion of the resin film with a developer and developing the film, and a step of heat-treating the polyimide resin film after the development to obtain a cured product can be exemplified.

 前記ポリイミド樹脂組成物を基板上に塗布し、乾燥して基板上にポリイミド樹脂膜を形成する工程は、例えば、該ポリイミド樹脂組成物を、スピンコーター、スプレーコーター、スクリーンコーター、ブレードコーター、ダイコーター、カレンダーコーター、メニスカスコーター、バーコーター、ロールコーター、コンマロールコーター、グラビアコーター、スリットダイコーター等で基板上に塗布し、50℃以上150℃以下の範囲で1分以上数時間以下乾燥してポリイミド樹脂膜を形成する工程が挙げられるが、これに限定されない。 The step of applying the polyimide resin composition onto a substrate and drying to form a polyimide resin film on the substrate includes, for example, applying the polyimide resin composition to a spin coater, a spray coater, a screen coater, a blade coater, and a die coater. , calendar coater, meniscus coater, bar coater, roll coater, comma roll coater, gravure coater, slit die coater, etc., and dried at a temperature of 50 ° C or higher and 150 ° C or lower for 1 minute or more and several hours or less. Polyimide Examples include, but are not limited to, a step of forming a resin film.

 該感光性のポリイミド樹脂膜を露光する工程は、例えば、所望のパターンを有するマスクを通して、高圧水銀灯の365nmのi線、405nmのh線、432nmのg線で50mJ以上、3,000mJ以下で露光する工程が挙げられるがこれに限定されない。上記工程によって露光された該ポリイミド樹脂膜は、露光後ベークを行ってもよい。露光後ベークは、硬化性と基板との密着性の観点から、50℃以上であることが好ましく、解像度の観点から、150℃以下であることが好ましい。 In the step of exposing the photosensitive polyimide resin film, for example, through a mask having a desired pattern, 365 nm i-line, 405 nm h-line, and 432 nm g-line of a high pressure mercury lamp are exposed at 50 mJ or more and 3,000 mJ or less. but not limited to this. The polyimide resin film exposed by the above process may be baked after exposure. Post-exposure baking is preferably performed at 50° C. or higher from the viewpoint of curability and adhesion to the substrate, and preferably at 150° C. or lower from the viewpoint of resolution.

 該ポリイミド樹脂膜の未露光部を現像液で除去して現像する工程は、例えば現像液を該ポリイミド樹脂膜面にスプレーする、膜面に現像液を液盛りする、現像液中に浸漬する、あるいは浸漬して超音波をかける等の工程が挙げられるがこれらに限定されない。現像時間や現像ステップ現像液の温度などの現像条件は、露光部が除去されパターン形成が可能な条件であればよい。 The step of removing the unexposed portion of the polyimide resin film with a developer for development includes, for example, spraying the developer onto the surface of the polyimide resin film, heaping the developer onto the film surface, immersing the film in the developer, Alternatively, a process of immersing and applying ultrasonic waves may be mentioned, but is not limited to these. Developing conditions such as the developing time and the temperature of the developer in the developing step may be any conditions as long as the exposed portion can be removed and the pattern can be formed.

 現像液としては、アルカリ現像液で行う場合、テトラメチルアンモニウムの水溶液、ジエタノールアミン、ジエチルアミノエタノール、水酸化ナトリウム、水酸化カリウム、炭酸ナトリウム、炭酸カリウム、トリエチルアミン、ジエチルアミン、メチルアミン、ジメチルアミン、酢酸ジメチルアミノエチル、ジメチルアミノエタノール、ジメチルアミノエチルメタクリレート、シクロヘキシルアミン、エチレンジアミン、ヘキサメチレンジアミンなどのアルカリ性を示す化合物の水溶液が好ましい。有機溶媒で現像を行う場合、このときの現像液としては、N-メチル-2-ピロリドン、N-アセチル-2-ピロリドン、N,N-ジメチルアセトアミド、N,N-ジメチルホルムアミド、ジメチルスルホキシド、ヘキサメチルホスホルトリアミドなどの極性溶媒を単独あるいは、メタノール、エタノール、イソプロピルアルコール、キシレン、水、メチルカルビトール、エチルカルビトールなどと組み合わせた混合溶液が使用できる。 As a developer, when an alkali developer is used, an aqueous solution of tetramethylammonium, diethanolamine, diethylaminoethanol, sodium hydroxide, potassium hydroxide, sodium carbonate, potassium carbonate, triethylamine, diethylamine, methylamine, dimethylamine, dimethylamino acetate. Aqueous solutions of alkaline compounds such as ethyl, dimethylaminoethanol, dimethylaminoethyl methacrylate, cyclohexylamine, ethylenediamine and hexamethylenediamine are preferred. When developing with an organic solvent, the developer at this time includes N-methyl-2-pyrrolidone, N-acetyl-2-pyrrolidone, N,N-dimethylacetamide, N,N-dimethylformamide, dimethylsulfoxide, hexa A mixed solution of a polar solvent such as methyl phosphortriamide alone or in combination with methanol, ethanol, isopropyl alcohol, xylene, water, methyl carbitol, ethyl carbitol, or the like can be used.

 現像後は水にてリンス処理をしてよい。ここでもエタノール、イソプロピルアルコールなどのアルコール類、乳酸エチル、プロピレングリコールモノメチルエーテルアセテートなどのエステル類などを水に加えてリンス処理をしても良い。必要に応じて、水に、エタノール、イソプロピルアルコールなどのアルコール類、乳酸エチル、プロピレングリコールモノメチルエーテルアセテート等を加えてリンス処理をしてもよい。 You may rinse with water after development. Also here, alcohols such as ethanol and isopropyl alcohol, and esters such as ethyl lactate and propylene glycol monomethyl ether acetate may be added to water for rinsing. If necessary, an alcohol such as ethanol or isopropyl alcohol, ethyl lactate, propylene glycol monomethyl ether acetate, or the like may be added to water for rinsing.

 現像後のポリイミド樹脂膜を加熱処理して硬化物とする工程は、例えば、150℃以上500℃以下の範囲で5分以上5時間以下加熱処理して熱架橋反応を進行させることで、硬化物とする工程が挙げられるがこれに限定されない。前記加熱処理は、温度を選択して段階的に昇温する方法や、ある温度範囲を選択して連続的に昇温する方法を選択することができる。前者としては、例えば、130℃、200℃で各30分ずつ熱処理する方法が挙げられるが、これに限定されない。後者としては、室温から400℃まで、2時間かけて直線的に昇温する方法が挙げられるが、これに限定されない。 In the step of heat-treating the polyimide resin film after development to obtain a cured product, for example, the heat treatment is performed at a temperature of 150° C. or higher and 500° C. or lower for 5 minutes or more and 5 hours or less to advance the thermal cross-linking reaction. but not limited thereto. For the heat treatment, a method of selecting a temperature and increasing the temperature stepwise or a method of selecting a certain temperature range and increasing the temperature continuously can be selected. The former includes, for example, a method of heat-treating at 130° C. and 200° C. for 30 minutes each, but is not limited to this. The latter includes, but is not limited to, a method of linearly increasing the temperature from room temperature to 400° C. over 2 hours.

 以下、実施例を挙げて本発明を説明するが、本発明はこれらの例によって限定されるものではない。 The present invention will be described below with reference to examples, but the present invention is not limited to these examples.

 (1)溶媒不溶部の有無
 試料10mgにγ-ブチロラクトンを1g加え、撹拌しながら室温で5時間放置した後の不溶部の有無を確認した。
(1) Presence or Absence of Solvent-Insoluble Part 1 g of γ-butyrolactone was added to 10 mg of a sample, and the mixture was allowed to stand at room temperature for 5 hours with stirring, and then the presence or absence of an insoluble part was confirmed.

 (2)ポリイミド中の有機溶媒含有量の測定
 試料5.00gに蒸留水500mL加え、97℃で2時間撹拌した後、孔径0.45μmのフィルターを用いてろ過、ろ液を回収した。回収液中の全有機炭素濃度をTOC(全有機炭素濃度)計(TOC-Vwp;島津製作所製)を用いて測定し、試料中の全有機炭素濃度を算出した。
(2) Measurement of Organic Solvent Content in Polyimide 500 mL of distilled water was added to 5.00 g of a sample, stirred at 97° C. for 2 hours, filtered using a filter with a pore size of 0.45 μm, and the filtrate was collected. The total organic carbon concentration in the collected liquid was measured using a TOC (total organic carbon concentration) meter (TOC-Vwp; manufactured by Shimadzu Corporation) to calculate the total organic carbon concentration in the sample.

 (3)重量平均分子量測定
 GPC(ゲルパーミエーションクロマトグラフィー)装置(Waters2690-996;日本ウォーターズ(株)製)を用い、展開溶媒をテトラヒドロフランとして測定し、ポリスチレン換算で重量平均分子量(Mw)を算出した。
(3) Weight average molecular weight measurement Using a GPC (gel permeation chromatography) device (Waters 2690-996; manufactured by Nippon Waters Co., Ltd.), measurement was performed using tetrahydrofuran as a developing solvent, and the weight average molecular weight (Mw) was calculated in terms of polystyrene. bottom.

 (4)黄色度(YI)の測定
 ポリイミドの39%γ-ブチロラクトン溶液をスピンコーター(ミカサ(株)製1H-360S)を用いてガラス基板上に塗布した後、ホットプレート(大日本スクリーン(株)製SCW-636)を用いて120℃で3分間プリベークし、膜厚10μmの薄膜を作製した。C光源の分光測色計(日立製作所(株)製U2910)を用いて、得られたポリイミドの薄膜の黄色度を測定した。
(4) Measurement of yellowness index (YI) A 39% γ-butyrolactone solution of polyimide was applied onto a glass substrate using a spin coater (1H-360S manufactured by Mikasa Co., Ltd.), followed by a hot plate (Dainippon Screen Co., Ltd.). ) manufactured by SCW-636) was prebaked at 120° C. for 3 minutes to form a thin film having a thickness of 10 μm. Using a C light source spectrophotometer (U2910 manufactured by Hitachi Ltd.), the degree of yellowness of the resulting polyimide thin film was measured.

 (5)樹脂組成物の微細パターン加工性の評価
 樹脂組成物を銅基板上にスピンコーター(ミカサ(株)製1H-360S)を用いて塗布し、ホットプレート(大日本スクリーン(株)製SCW-636)を用いて100℃において3分間加熱乾燥して10μmの塗膜を形成した。この塗膜を形成した銅基板をアライナー(キヤノン(株)製PLA-501F)を用いて、L/S=30μm/30μmのパターン、20μm/20μmのパターン、15μm/15μmのパターンを有するフォトマスクを介して、超高圧水銀灯を光源として200mJ/cmで露光した。露光量は365nmの照度を測定し算出した。その後120℃で1分間加熱し、自動現像機(滝沢産業(株)製AD-1200)を用いて、2.38質量%の水酸化テトラメチルアンモニウム(TMAH)水溶液を現像液として、45秒2パドルで現像し純水で30秒リンスした。その後、パターン加工部をFPD顕微鏡(オリンパス(株)製MX61)を用いて観察し、現像残渣などの異常がない最小のパターンサイズを調べ、以下の基準に基づき、微細パターン加工性を評価した。最小のパターンサイズが小さいほど良好なパターン加工性を有していると判定した。
A:最小のパターンサイズが20μm以下
B:最小のパターンサイズが30μm
C:30μmのパターンが加工不可、または現像残渣が生じる。
(5) Evaluation of fine pattern processability of resin composition The resin composition was applied on a copper substrate using a spin coater (1H-360S manufactured by Mikasa Co., Ltd.), and a hot plate (SCW manufactured by Dainippon Screen Co., Ltd.) -636) and dried by heating at 100° C. for 3 minutes to form a coating film of 10 μm. Using an aligner (PLA-501F manufactured by Canon Inc.), a photomask having a pattern of L/S = 30 µm/30 µm, a pattern of 20 µm/20 µm, and a pattern of 15 µm/15 µm was formed on the copper substrate on which the coating film was formed. It was exposed to light at 200 mJ/cm 2 using an ultra-high pressure mercury lamp as a light source. The exposure amount was calculated by measuring the illuminance at 365 nm. After that, it is heated at 120° C. for 1 minute, and an automatic processor (AD-1200 manufactured by Takizawa Sangyo Co., Ltd.) is used as a developer with a 2.38% by mass tetramethylammonium hydroxide (TMAH) aqueous solution as a developer for 45 seconds 2. It was developed with a paddle and rinsed with pure water for 30 seconds. Thereafter, the patterned portion was observed using an FPD microscope (MX61, manufactured by Olympus Corporation) to determine the minimum pattern size free from abnormalities such as development residues, and fine pattern processability was evaluated based on the following criteria. It was determined that the smaller the minimum pattern size, the better the pattern workability.
A: The minimum pattern size is 20 μm or less B: The minimum pattern size is 30 μm
C: A pattern of 30 μm cannot be processed, or a development residue is generated.

 (6)保存安定性の評価
 樹脂組成物を調製した後、12時間経過後にE型粘度計(東機産業(株)製TVE-25)を用いて25℃における粘度を測定し、その値をVとした。その後樹脂組成物を密封し室温(23℃)で4週間保存した後に粘度を測定し、その値をVとした。粘度上昇率(%)を(V-V)/V×100として、以下の基準に基づき、保存安定性を評価した。粘度上昇率が小さいほど、保存安定性に優れると判定した。
A:粘度上昇率が5%未満
B:粘度上昇率が5%以上10%未満
C:粘度上昇率が10%以上。
(6) After preparing the storage stability evaluation resin composition, the viscosity at 25 ° C. was measured using an E-type viscometer (TVE-25 manufactured by Toki Sangyo Co., Ltd.) after 12 hours, and the value was It was set to V1 . After that, the resin composition was sealed and stored at room temperature (23° C.) for 4 weeks. Storage stability was evaluated based on the following criteria, with the viscosity increase rate (%) being (V 2 -V 1 )/V 1 ×100. It was determined that the smaller the viscosity increase rate, the better the storage stability.
A: Viscosity increase rate is less than 5% B: Viscosity increase rate is 5% or more and less than 10% C: Viscosity increase rate is 10% or more.

 (7)原料純度の算出
 試料の純度算出は高速液体クロマトグラフィーを用いて行った。測定条件を以下に示す。
装置:島津株式会社製 LC-10Avpシリーズ
カラム:Mightysil RP-18 GP150-4.6(5μm)
検出器:フォトダイオードアレイ検出器(UV=270nm)。
(7) Calculation of Raw Material Purity The purity of the sample was calculated using high performance liquid chromatography. Measurement conditions are shown below.
Apparatus: LC-10Avp series manufactured by Shimadzu Corporation Column: Mightysil RP-18 GP150-4.6 (5 μm)
Detector: Photodiode array detector (UV=270 nm).

 なお、純度は成分分割した際に試料由来のピークとして帰属されるピーク面積に対して、試料中主成分に帰属されるピーク面積の割合として、純度=主成分重量/(主成分重量+不純物重量)として算出した。
<原料>
 実施例1~17、比較例1~6では上記(7)に従って原料の純度測定を行った下記原料をポリイミドの合成に用いた。
4,4’-オキシジフタル酸無水物 純度98質量%(以下、ODPA-1)
4,4’-オキシジフタル酸無水物 純度95質量%(以下、ODPA-2)
4-(2,5-ジオキソテトラヒドロフラン-3-イル)-1,2,3,4-テトラヒドロナフタレン-1,2-ジカルボン酸二無水物 純度99質量%(以下、TDA-1)
ビス(3,4-ジカルボキシフェニル)スルホン酸二無水物 純度98質量%(以下、BCSA-1)
2,2-ビス(3-アミノ-4-ヒドロキシフェニル)ヘキサフルオロプロパン 純度98質量%(以下、BAHF-1)
2,2-ビス(3-アミノ-4-ヒドロキシフェニル)ヘキサフルオロプロパン 純度95質量%(以下、BAHF-2)
1,3-ビス(3-アミノプロピル)テトラメチルジシロキサン 純度98質量%(以下、SiDA-1)
2-アミノ安息香酸 純度98質量%(以下、AA-1)
3-アミノフェノール 純度98質量%(以下、MAP-1)
3-アミノフェノール 純度94質量%(以下、MAP-2)
アニリン 純度98質量%(以下、A-1)
3-アニリンスルホン酸 純度99質量%(以下、AS-1)
3-アミノベンゼンチオール 純度99質量%(以下、AB-1)
 以下、実施例および比較例で用いた化合物の名称を示す。
<溶剤>
GBL:γ―ブチロラクトン
EL:乳酸エチル
<光重合開始剤>
OXE02:Irgacure OXE02(BASFジャパン(株)製)
<ラジカル重合性化合物>
DCP-A:ライトアクリレートDCP-A(共栄社化学(株)製)
BP-6EM:ライトエステルBP-6EM(共栄社化学(株)製)
MOI-BP:カレンズMOI-BP(昭和電工(株)製)
<架橋剤>
MW-100LM:NIKALAC MW-100LM(三和ケミカル(株)製)
MX-270:NIKALAC MX-270(三和ケミカル(株)製)
<密着改良剤>
KBM403(信越化学工業(株)製)
<界面活性剤>
PF77:ポリフロー No.77(共栄社化学(株)製)。
Purity is the ratio of the peak area attributed to the main component in the sample to the peak area attributed to the sample-derived peak when the components are divided. Purity = main component weight / (main component weight + impurity weight ).
<raw materials>
In Examples 1 to 17 and Comparative Examples 1 to 6, the following raw materials whose purity was measured according to the above (7) were used for polyimide synthesis.
4,4'-oxydiphthalic anhydride purity 98% by mass (hereinafter referred to as ODPA-1)
4,4'-oxydiphthalic anhydride purity 95% by mass (hereinafter referred to as ODPA-2)
4-(2,5-dioxotetrahydrofuran-3-yl)-1,2,3,4-tetrahydronaphthalene-1,2-dicarboxylic dianhydride purity 99 mass% (hereinafter, TDA-1)
Bis (3,4-dicarboxyphenyl) sulfonic acid dianhydride purity 98% by mass (hereinafter, BCSA-1)
2,2-bis (3-amino-4-hydroxyphenyl) hexafluoropropane purity 98 mass% (hereinafter, BAHF-1)
2,2-bis (3-amino-4-hydroxyphenyl) hexafluoropropane purity 95 mass% (hereinafter, BAHF-2)
1,3-bis(3-aminopropyl)tetramethyldisiloxane purity 98% by mass (hereinafter, SiDA-1)
2-aminobenzoic acid purity 98% by mass (hereinafter, AA-1)
3-aminophenol purity 98% by mass (hereinafter, MAP-1)
3-aminophenol purity 94% by mass (hereinafter, MAP-2)
Aniline purity 98% by mass (hereinafter, A-1)
3-aniline sulfonic acid purity 99% by mass (hereinafter, AS-1)
3-aminobenzenethiol purity 99% by mass (hereinafter, AB-1)
The names of the compounds used in Examples and Comparative Examples are shown below.
<Solvent>
GBL: γ-butyrolactone EL: Ethyl lactate <photoinitiator>
OXE02: Irgacure OXE02 (manufactured by BASF Japan Ltd.)
<Radical polymerizable compound>
DCP-A: Light acrylate DCP-A (manufactured by Kyoeisha Chemical Co., Ltd.)
BP-6EM: Light ester BP-6EM (manufactured by Kyoeisha Chemical Co., Ltd.)
MOI-BP: Karenz MOI-BP (manufactured by Showa Denko K.K.)
<Crosslinking agent>
MW-100LM: NIKALAC MW-100LM (manufactured by Sanwa Chemical Co., Ltd.)
MX-270: NIKALAC MX-270 (manufactured by Sanwa Chemical Co., Ltd.)
<Adhesion improver>
KBM403 (manufactured by Shin-Etsu Chemical Co., Ltd.)
<Surfactant>
PF77: Polyflow No. 77 (manufactured by Kyoeisha Chemical Co., Ltd.).

 [実施例1]
 撹拌機を具備したステンレス製オートクレーブに4,4’-オキシジフタル酸無水物(ODPA-2)を31.02g(0.1モル)、2,2-ビス(3-アミノ-4-ヒドロキシフェニル)ヘキサフルオロプロパン(BAHF-1)を36.63g(0.1モル)、イオン交換水を255g仕込んだ。反応容器を室温・常圧下にて窒素ガス下に密封した後、150rpmで撹拌しながら、室温から100℃に昇温した。この段階での反応系内の圧力はゲージ圧で0.1MPaであった。100℃で10時間保持した後、室温近傍まで放冷した。得られた内容物を孔径1μmのろ紙を用いて濾別し、固形分を回収した。得られた固形分を50℃で12時間真空乾燥に処し、ポリイミド(P1)を得た。P1を赤外吸収スペクトルで測定したところ、1,780cm-1付近、1,377cm-1付近にポリイミドに起因するイミド構造の吸収ピークが検出された。また、重量平均分子量は6,000であった。
[Example 1]
31.02 g (0.1 mol) of 4,4′-oxydiphthalic anhydride (ODPA-2) and 2,2-bis(3-amino-4-hydroxyphenyl)hexanone were placed in a stainless steel autoclave equipped with a stirrer. 36.63 g (0.1 mol) of fluoropropane (BAHF-1) and 255 g of deionized water were charged. After the reaction vessel was sealed under nitrogen gas at room temperature and normal pressure, the temperature was raised from room temperature to 100° C. while stirring at 150 rpm. The pressure in the reaction system at this stage was 0.1 MPa in gauge pressure. After being held at 100° C. for 10 hours, it was allowed to cool to around room temperature. The resulting content was filtered using a filter paper with a pore size of 1 μm to recover the solid content. The obtained solid content was subjected to vacuum drying at 50° C. for 12 hours to obtain polyimide (P1). When P1 was measured by infrared absorption spectrum, absorption peaks of an imide structure due to polyimide were detected near 1,780 cm −1 and 1,377 cm −1 . Moreover, the weight average molecular weight was 6,000.

 さらに得られたP1を加熱乾燥機の中に入れ、減圧雰囲気(133Pa)とした後に180℃に昇温した。180℃で12時間保持した後、室温近傍まで放冷してポリイミド(P1’)を得た。P1’を赤外吸収スペクトルで測定したところ、1,780cm-1付近、1,377cm-1付近にポリイミドに起因するイミド構造の吸収ピークが検出された。得られたP1’を上記(1)、(2)、(3)、(4)の評価法に従って評価を行った。 Further, the obtained P1 was placed in a heat dryer, and after a reduced pressure atmosphere (133 Pa), the temperature was raised to 180°C. After being held at 180° C. for 12 hours, it was allowed to cool to around room temperature to obtain polyimide (P1′). When P1′ was measured by an infrared absorption spectrum, absorption peaks of an imide structure due to polyimide were detected near 1,780 cm −1 and 1,377 cm −1 . The obtained P1′ was evaluated according to the evaluation methods (1), (2), (3) and (4) above.

 また、黄色灯下にて、P1’を3.5g、OXE02を0.5g、DCP-Aを0.5g、BP-6EMを1.5g、MOI-BPを0.5g、MW-100LMの50%EL溶液を1.0g、MX-270を0.5g、KBM403を0.25g、PF77の5%EL溶液を0.06g、GBLを2.1g、ELを2.6g混合し、保留粒子径1μmのフィルターを用いて加圧濾過して樹脂組成物を調製した。上記(5)、(6)の評価方法に従い、調製した樹脂組成物の評価を行った。 Also, under a yellow light, 3.5 g of P1', 0.5 g of OXE02, 0.5 g of DCP-A, 1.5 g of BP-6EM, 0.5 g of MOI-BP, 50 of MW-100LM 1.0 g of % EL solution, 0.5 g of MX-270, 0.25 g of KBM403, 0.06 g of 5% EL solution of PF77, 2.1 g of GBL, and 2.6 g of EL are mixed, and the retained particle size is A resin composition was prepared by pressure filtration using a 1 μm filter. The prepared resin composition was evaluated according to the evaluation methods (5) and (6) above.

 [実施例2]
 撹拌機を具備したステンレス製オートクレーブにODPA-2を31.02g(0.1モル)、BAHF-1を30.03g(0.082モル)、1,3-ビス(3-アミノプロピル)テトラメチルジシロキサン(SiDA-1)を1.24g(0.005モル)、3-アミノフェノール(MAP-1)を2.73(0.025モル)、イオン交換水を255g仕込んだ。反応容器を室温・常圧下にて窒素ガス下に密封した後、150rpmで撹拌しながら、室温から120℃に昇温した。この段階での反応系内の圧力はゲージ圧で0.2MPaであった。120℃で4時間保持した後、室温近傍まで放冷した。孔径1μmのろ紙を用いて得られた内容物を濾別し、固形分を回収した。得られた固形分を50℃で12時間真空乾燥に処し、ポリイミド(P2)を得た。P2を赤外吸収スペクトルで測定したところ、1,780cm-1付近、1,377cm-1付近にポリイミドに起因するイミド構造の吸収ピークが検出された。また、重量平均分子量は7,200であった。
[Example 2]
31.02 g (0.1 mol) of ODPA-2, 30.03 g (0.082 mol) of BAHF-1 and 1,3-bis(3-aminopropyl)tetramethyl are placed in a stainless steel autoclave equipped with a stirrer. 1.24 g (0.005 mol) of disiloxane (SiDA-1), 2.73 (0.025 mol) of 3-aminophenol (MAP-1) and 255 g of deionized water were charged. After the reaction vessel was sealed under nitrogen gas at room temperature and normal pressure, the temperature was raised from room temperature to 120° C. while stirring at 150 rpm. The pressure in the reaction system at this stage was 0.2 MPa in gauge pressure. After being held at 120° C. for 4 hours, it was allowed to cool to near room temperature. The obtained contents were separated by filtration using filter paper with a pore size of 1 μm, and the solid content was recovered. The obtained solid content was subjected to vacuum drying at 50° C. for 12 hours to obtain polyimide (P2). When P2 was measured by an infrared absorption spectrum, absorption peaks of an imide structure due to polyimide were detected near 1,780 cm −1 and 1,377 cm −1 . Moreover, the weight average molecular weight was 7,200.

 さらに得られたP2を加熱乾燥機の中に入れ、窒素気流下で220℃に昇温した。220℃で10時間保持した後、室温近傍まで放冷してポリイミド(P2’)を得た。P2’を赤外吸収スペクトルで測定したところ、1,780cm-1付近、1,377cm-1付近にポリイミドに起因するイミド構造の吸収ピークが検出された。得られたP2’を上記(1)、(2)、(3)、(4)の評価法に従って評価を行った。 The obtained P2 was placed in a heat dryer and heated to 220° C. under a nitrogen stream. After being held at 220° C. for 10 hours, it was allowed to cool to around room temperature to obtain polyimide (P2′). When P2′ was measured by an infrared absorption spectrum, absorption peaks of an imide structure due to polyimide were detected near 1,780 cm −1 and 1,377 cm −1 . The resulting P2' was evaluated according to the evaluation methods (1), (2), (3) and (4) above.

 また、P1’に代わりP2’を用いた他は実施例1に記載の方法と同様にして樹脂組成物を調製した。上記(5)、(6)の評価方法に従い、調製した樹脂組成物の評価を行った。 Also, a resin composition was prepared in the same manner as in Example 1, except that P2' was used instead of P1'. The prepared resin composition was evaluated according to the evaluation methods (5) and (6) above.

 [実施例3]
 撹拌機を具備したステンレス製オートクレーブにODPA-2を31.02g(0.1モル)、BAHF-1を32.96g(0.09モル)、p-アミノ安息香酸(AA-1)を1.51g(0.01モル)、イオン交換水を255g仕込んだ。反応容器を室温・常圧下にて窒素ガス下に密封した後、150rpmで撹拌しながら、室温から160℃に昇温した。この段階での反応系内の圧力はゲージ圧で0.6MPaであった。160℃で4時間保持した後、室温近傍まで放冷した。孔径1μmのろ紙を用いて得られた内容物を濾別し、固形分を回収した。得られた固形分を50℃で12時間真空乾燥に処し、ポリイミド(P3)を得た。P3を赤外吸収スペクトルで測定したところ、1,780cm-1付近、1,377cm-1付近にポリイミドに起因するイミド構造の吸収ピークが検出された。また、重量平均分子量は10,300であった。
[Example 3]
A stainless steel autoclave equipped with a stirrer was charged with 31.02 g (0.1 mol) of ODPA-2, 32.96 g (0.09 mol) of BAHF-1, and 1.0 g of p-aminobenzoic acid (AA-1). 51 g (0.01 mol) and 255 g of deionized water were charged. After the reaction vessel was sealed under nitrogen gas at room temperature and normal pressure, the temperature was raised from room temperature to 160° C. while stirring at 150 rpm. The pressure in the reaction system at this stage was 0.6 MPa in gauge pressure. After being held at 160° C. for 4 hours, it was allowed to cool to near room temperature. The obtained contents were separated by filtration using filter paper with a pore size of 1 μm, and the solid content was recovered. The obtained solid content was subjected to vacuum drying at 50° C. for 12 hours to obtain polyimide (P3). When P3 was measured by an infrared absorption spectrum, absorption peaks of an imide structure due to polyimide were detected near 1,780 cm −1 and 1,377 cm −1 . Moreover, the weight average molecular weight was 10,300.

 さらに得られたP3を加熱乾燥機の中に入れ、減圧雰囲気(133Pa)とした後に120℃に昇温した。120℃で24時間保持した後、室温近傍まで放冷してポリイミド(P3’)を得た。P3’を赤外吸収スペクトルで測定したところ、1,780cm-1付近、1,377cm-1付近にポリイミドに起因するイミド構造の吸収ピークが検出された。得られたP3’を上記(1)、(2)、(3)、(4)の評価法に従って評価を行った。 Further, the obtained P3 was placed in a heat dryer, and after a reduced pressure atmosphere (133 Pa), the temperature was raised to 120°C. After being held at 120° C. for 24 hours, it was allowed to cool to around room temperature to obtain polyimide (P3′). When P3′ was measured by an infrared absorption spectrum, absorption peaks of an imide structure due to polyimide were detected near 1,780 cm −1 and 1,377 cm −1 . The resulting P3' was evaluated according to the evaluation methods (1), (2), (3) and (4) above.

 また、P1’に代わりP3’を用いた他は実施例1に記載の方法と同様にして樹脂組成物を調製した。上記(5)、(6)の評価方法に従い、調製した樹脂組成物の評価を行った。 Also, a resin composition was prepared in the same manner as in Example 1, except that P3' was used instead of P1'. The prepared resin composition was evaluated according to the evaluation methods (5) and (6) above.

 [実施例4]
 撹拌機を具備したステンレス製オートクレーブにビス(3,4-ジカルボキシフェニル)スルホン酸二無水物(BCSA-1)を35.83g(0.1モル)、BAHF-1を30.03g(0.085モル)、アニリン(A-1)を2.33g(0.025モル)、イオン交換水を255g仕込んだ。反応容器内を室温・常圧下にて窒素ガス置換した後、150rpmで撹拌しながら、室温から180℃に昇温した。この段階での反応系内の圧力はゲージ圧で1.0MPaであった。180℃で4時間保持した後、室温近傍まで放冷した。孔径1μmのろ紙を用いて得られた内容物を濾別し、固形分を回収した。得られた固形分を50℃で12時間真空乾燥に処し、ポリイミド(P4)を得た。P4を赤外吸収スペクトルで測定したところ、1,780cm-1付近、1,377cm-1付近にポリイミドに起因するイミド構造の吸収ピークが検出された。また、重量平均分子量は13,400であった。
さらに得られたP4を加熱乾燥機の中に入れ、減圧雰囲気(133Pa)とした後に240℃に昇温した。240℃で5時間保持した後、室温近傍まで放冷してポリイミド(P4’)を得た。P4’を赤外吸収スペクトルで測定したところ、1,780cm-1付近、1,377cm-1付近にポリイミドに起因するイミド構造の吸収ピークが検出された。得られたP4’を上記(1)、(2)、(3)、(4)の評価法に従って評価を行った。
[Example 4]
A stainless steel autoclave equipped with a stirrer was charged with 35.83 g (0.1 mol) of bis(3,4-dicarboxyphenyl)sulfonic dianhydride (BCSA-1) and 30.03 g (0.1 mol) of BAHF-1. 085 mol), 2.33 g (0.025 mol) of aniline (A-1), and 255 g of deionized water were charged. After the inside of the reaction vessel was replaced with nitrogen gas at room temperature and normal pressure, the temperature was raised from room temperature to 180° C. while stirring at 150 rpm. The pressure in the reaction system at this stage was 1.0 MPa in gauge pressure. After being held at 180° C. for 4 hours, it was allowed to cool to around room temperature. The obtained contents were separated by filtration using filter paper with a pore size of 1 μm, and the solid content was recovered. The obtained solid content was subjected to vacuum drying at 50° C. for 12 hours to obtain polyimide (P4). When P4 was measured by an infrared absorption spectrum, absorption peaks of an imide structure due to polyimide were detected near 1,780 cm −1 and 1,377 cm −1 . Moreover, the weight average molecular weight was 13,400.
Further, the obtained P4 was placed in a heat dryer, and after a reduced pressure atmosphere (133 Pa), the temperature was raised to 240°C. After being held at 240° C. for 5 hours, it was allowed to cool to around room temperature to obtain polyimide (P4′). When P4′ was measured by an infrared absorption spectrum, absorption peaks of an imide structure due to polyimide were detected near 1,780 cm −1 and 1,377 cm −1 . The resulting P4' was evaluated according to the evaluation methods (1), (2), (3) and (4) above.

 また、P1’に代わりP4’を用いた他は実施例1に記載の方法と同様にして樹脂組成物を調製した。上記(5)、(6)の評価方法に従い、調製した樹脂組成物の評価を行った。 Also, a resin composition was prepared in the same manner as in Example 1, except that P4' was used instead of P1'. The prepared resin composition was evaluated according to the evaluation methods (5) and (6) above.

 [実施例5]
 撹拌機を具備したステンレス製オートクレーブに4-(2,5-ジオキソテトラヒドロフラン-3-イル)-1,2,3,4-テトラヒドロナフタレン-1,2-ジカルボン酸二無水物(TDA-1)を30.03g(0.1モル)、BAHF-1を32.96g(0.09モル)、MAP-1を2.18g(0.02モル)、イオン交換水を255g仕込んだ。反応容器を室温・常圧下にて窒素ガス下に密封した後、150rpmで撹拌しながら、室温から150℃に昇温した。この段階での反応系内の圧力はゲージ圧で0.5MPaであった。150℃で4時間保持した後、室温近傍まで放冷した。孔径1μmのろ紙を用いて得られた内容物を濾別し、固形分を回収した。得られた固形分を50℃で12時間真空乾燥に処し、ポリイミド(P5)を得た。P5を赤外吸収スペクトルで測定したところ、1,780cm-1付近、1,377cm-1付近にポリイミドに起因するイミド構造の吸収ピークが検出された。また、重量平均分子量は11,000であった。
さらに得られたP5を加熱乾燥機の中に入れ、窒素気流下で160℃に昇温した。160℃で12時間保持した後、室温近傍まで放冷してポリイミド(P5’)を得た。P5’を赤外吸収スペクトルで測定したところ、1,780cm-1付近、1,377cm-1付近にポリイミドに起因するイミド構造の吸収ピークが検出された。得られたP5’を上記(1)、(2)、(3)、(4)の評価法に従って評価を行った。
[Example 5]
4-(2,5-dioxotetrahydrofuran-3-yl)-1,2,3,4-tetrahydronaphthalene-1,2-dicarboxylic dianhydride (TDA-1) was placed in a stainless steel autoclave equipped with a stirrer. 30.03 g (0.1 mol) of , 32.96 g (0.09 mol) of BAHF-1, 2.18 g (0.02 mol) of MAP-1, and 255 g of deionized water were charged. After the reaction vessel was sealed under nitrogen gas at room temperature and normal pressure, the temperature was raised from room temperature to 150° C. while stirring at 150 rpm. The pressure in the reaction system at this stage was 0.5 MPa in gauge pressure. After being held at 150° C. for 4 hours, it was allowed to cool to near room temperature. The obtained contents were separated by filtration using filter paper with a pore size of 1 μm, and the solid content was recovered. The obtained solid content was subjected to vacuum drying at 50° C. for 12 hours to obtain polyimide (P5). When P5 was measured by an infrared absorption spectrum, absorption peaks of an imide structure due to polyimide were detected near 1,780 cm −1 and 1,377 cm −1 . Moreover, the weight average molecular weight was 11,000.
The obtained P5 was placed in a heat dryer and heated to 160° C. under a nitrogen stream. After being held at 160° C. for 12 hours, it was allowed to cool to around room temperature to obtain polyimide (P5′). When P5′ was measured by an infrared absorption spectrum, absorption peaks of an imide structure due to polyimide were detected near 1,780 cm −1 and 1,377 cm −1 . The resulting P5' was evaluated according to the evaluation methods (1), (2), (3) and (4) above.

 また、P1’に代わりP5’を用いた他は実施例1に記載の方法と同様にして樹脂組成物を調製した。上記(5)、(6)の評価方法に従い、調製した樹脂組成物の評価を行った。 Also, a resin composition was prepared in the same manner as in Example 1, except that P5' was used instead of P1'. The prepared resin composition was evaluated according to the evaluation methods (5) and (6) above.

 [実施例6]
 撹拌機を具備したステンレス製オートクレーブにODPA-2を31.02g(0.1モル)、BAHF-1を33.43g(0.1モル)、イオン交換水を255g仕込んだ。反応容器を室温・常圧下にて窒素ガス下に密封した後、150rpmで撹拌しながら、室温から120℃に昇温した。この段階での反応系内の圧力はゲージ圧で0.2MPaであった。120℃で4時間保持した後、室温近傍まで放冷した。孔径1μmのろ紙を用いて得られた内容物を濾別し、固形分を回収した。得られた固形分を50℃で12時間真空乾燥に処し、ポリイミド(P6)を得た。P6を赤外吸収スペクトルで測定したところ、1,780cm-1付近、1,377cm-1付近にポリイミドに起因するイミド構造の吸収ピークが検出された。また、重量平均分子量は12,000であった。
[Example 6]
A stainless steel autoclave equipped with a stirrer was charged with 31.02 g (0.1 mol) of ODPA-2, 33.43 g (0.1 mol) of BAHF-1, and 255 g of deionized water. After the reaction vessel was sealed under nitrogen gas at room temperature and normal pressure, the temperature was raised from room temperature to 120° C. while stirring at 150 rpm. The pressure in the reaction system at this stage was 0.2 MPa in gauge pressure. After being held at 120° C. for 4 hours, it was allowed to cool to around room temperature. The obtained contents were separated by filtration using filter paper with a pore size of 1 μm, and the solid content was recovered. The obtained solid content was subjected to vacuum drying at 50° C. for 12 hours to obtain polyimide (P6). When P6 was measured by an infrared absorption spectrum, absorption peaks of an imide structure due to polyimide were detected near 1,780 cm −1 and 1,377 cm −1 . Moreover, the weight average molecular weight was 12,000.

 さらに得られたP6を加熱乾燥機の中に入れ、窒素気流下で180℃に昇温した。180℃で12時間保持した後、室温近傍まで放冷してポリイミド(P6’)を得た。P6’を赤外吸収スペクトルで測定したところ、1,780cm-1付近、1,377cm-1付近にポリイミドに起因するイミド構造の吸収ピークが検出された。得られたP6’を上記(1)、(2)、(3)、(4)の評価法に従って評価を行った。 The obtained P6 was placed in a heat dryer and heated to 180° C. under a nitrogen stream. After being held at 180° C. for 12 hours, it was allowed to cool to around room temperature to obtain polyimide (P6′). When P6′ was measured by an infrared absorption spectrum, absorption peaks of an imide structure due to polyimide were detected near 1,780 cm −1 and 1,377 cm −1 . The resulting P6' was evaluated according to the evaluation methods (1), (2), (3) and (4) above.

 また、P1’に代わりP6’を用いた他は実施例1に記載の方法と同様にして樹脂組成物を調製した。上記(5)、(6)の評価方法に従い、調製した樹脂組成物の評価を行った。 Also, a resin composition was prepared in the same manner as in Example 1, except that P6' was used instead of P1'. The prepared resin composition was evaluated according to the evaluation methods (5) and (6) above.

 [実施例7]
 撹拌機を具備したステンレス製オートクレーブにODPA-2を31.02g(0.1モル)、BAHF-1を28.41g(0.085モル)、A-1を2.33g(0.025モル)、イオン交換水を255g仕込んだ。反応容器を室温・常圧下にて窒素ガス下に密封した後、150rpmで撹拌しながら、室温から160℃に昇温した。この段階での反応系内の圧力はゲージ圧で0.6MPaであった。160℃で4時間保持した後、室温近傍まで放冷した。孔径1μmのろ紙を用いて得られた内容物を濾別し、固形分を回収した。得られた固形分を50℃で12時間真空乾燥に処し、ポリイミド(P7)を得た。P7を赤外吸収スペクトルで測定したところ、1,780cm-1付近、1,377cm-1付近にポリイミドに起因するイミド構造の吸収ピークが検出された。また、重量平均分子量は11,500であった。
[Example 7]
31.02 g (0.1 mol) of ODPA-2, 28.41 g (0.085 mol) of BAHF-1, and 2.33 g (0.025 mol) of A-1 in a stainless steel autoclave equipped with a stirrer , 255 g of ion-exchanged water was charged. After the reaction vessel was sealed under nitrogen gas at room temperature and normal pressure, the temperature was raised from room temperature to 160° C. while stirring at 150 rpm. The pressure in the reaction system at this stage was 0.6 MPa in gauge pressure. After being held at 160° C. for 4 hours, it was allowed to cool to near room temperature. The obtained contents were separated by filtration using filter paper with a pore size of 1 μm, and the solid content was recovered. The obtained solid content was subjected to vacuum drying at 50° C. for 12 hours to obtain polyimide (P7). When P7 was measured by an infrared absorption spectrum, absorption peaks of an imide structure due to polyimide were detected near 1,780 cm −1 and 1,377 cm −1 . Moreover, the weight average molecular weight was 11,500.

 さらに得られたP7を加熱乾燥機の中に入れ、窒素気流下で180℃に昇温した。180℃で24時間保持した後、室温近傍まで放冷してポリイミド(P7’)を得た。P7’を赤外吸収スペクトルで測定したところ、1,780cm-1付近、1,377cm-1付近にポリイミドに起因するイミド構造の吸収ピークが検出された。得られたP7’を上記(1)、(2)、(3)、(4)の評価法に従って評価を行った。 The obtained P7 was placed in a heat dryer and heated to 180° C. under a nitrogen stream. After being held at 180° C. for 24 hours, it was allowed to cool to around room temperature to obtain polyimide (P7′). When P7′ was measured by an infrared absorption spectrum, absorption peaks of an imide structure due to polyimide were detected near 1,780 cm −1 and 1,377 cm −1 . The resulting P7' was evaluated according to the evaluation methods (1), (2), (3) and (4) above.

 また、P1’に代わりP7’を用いた他は実施例1に記載の方法と同様にして樹脂組成物を調製した。上記(5)、(6)の評価方法に従い、調製した樹脂組成物の評価を行った。 Also, a resin composition was prepared in the same manner as in Example 1, except that P7' was used instead of P1'. The prepared resin composition was evaluated according to the evaluation methods (5) and (6) above.

 [実施例8]
 撹拌機を具備したステンレス製オートクレーブにODPA-2を31.02g(0.1モル)、BAHF-1を28.41g(0.085モル)、MAP-1を2.73g(0.025モル)、イオン交換水を255g仕込んだ。反応容器を室温・常圧下にて窒素ガス下に密封した後、150rpmで撹拌しながら、室温から160℃に昇温した。この段階での反応系内の圧力はゲージ圧で0.6MPaであった。160℃で4時間保持した後、室温近傍まで放冷した。孔径1μmのろ紙を用いて得られた内容物を濾別し、固形分を回収した。得られた固形分を50℃で12時間真空乾燥に処し、ポリイミド(P8)を得た。P8を赤外吸収スペクトルで測定したところ、1,780cm-1付近、1,377cm-1付近にポリイミドに起因するイミド構造の吸収ピークが検出された。また、重量平均分子量は10,800であった。
[Example 8]
31.02 g (0.1 mol) of ODPA-2, 28.41 g (0.085 mol) of BAHF-1, and 2.73 g (0.025 mol) of MAP-1 in a stainless steel autoclave equipped with a stirrer , 255 g of ion-exchanged water was charged. After the reaction vessel was sealed under nitrogen gas at room temperature and normal pressure, the temperature was raised from room temperature to 160° C. while stirring at 150 rpm. The pressure in the reaction system at this stage was 0.6 MPa in gauge pressure. After being held at 160° C. for 4 hours, it was allowed to cool to around room temperature. The obtained contents were separated by filtration using filter paper with a pore size of 1 μm, and the solid content was recovered. The obtained solid content was subjected to vacuum drying at 50° C. for 12 hours to obtain polyimide (P8). When P8 was measured by an infrared absorption spectrum, absorption peaks of an imide structure due to polyimide were detected near 1,780 cm −1 and 1,377 cm −1 . Moreover, the weight average molecular weight was 10,800.

 さらに得られたP8を加熱乾燥機の中に入れ、窒素気流下で180℃に昇温した。180℃で24時間保持した後、室温近傍まで放冷してポリイミド(P8’)を得た。P8’を赤外吸収スペクトルで測定したところ、1,780cm-1付近、1,377cm-1付近にポリイミドに起因するイミド構造の吸収ピークが検出された。得られたP8’を上記(1)、(2)、(3)、(4)の評価法に従って評価を行った。 The obtained P8 was placed in a heat dryer and heated to 180° C. under a nitrogen stream. After holding at 180° C. for 24 hours, it was allowed to cool to around room temperature to obtain polyimide (P8′). When P8′ was measured by an infrared absorption spectrum, absorption peaks of an imide structure due to polyimide were detected near 1,780 cm −1 and 1,377 cm −1 . The resulting P8' was evaluated according to the evaluation methods (1), (2), (3) and (4) above.

 また、P1’に代わりP8’を用いた他は実施例1に記載の方法と同様にして樹脂組成物を調製した。上記(5)、(6)の評価方法に従い、調製した樹脂組成物の評価を行った。 Also, a resin composition was prepared in the same manner as in Example 1, except that P8' was used instead of P1'. The prepared resin composition was evaluated according to the evaluation methods (5) and (6) above.

 [実施例9]
 撹拌機を具備したステンレス製オートクレーブにODPA-2を31.02g(0.1モル)、BAHF-1を28.41g(0.085モル)、3-アニリンスルホン酸(AS-1)を4.33g(0.025モル)、イオン交換水を255g仕込んだ。反応容器を室温・常圧下にて窒素ガス下に密封した後、150rpmで撹拌しながら、室温から160℃に昇温した。この段階での反応系内の圧力はゲージ圧で0.6MPaであった。160℃で4時間保持した後、室温近傍まで放冷した。孔径1μmのろ紙を用いて得られた内容物を濾別し、固形分を回収した。得られた固形分を50℃で12時間真空乾燥に処し、ポリイミド(P9)を得た。P9を赤外吸収スペクトルで測定したところ、1,780cm-1付近、1,377cm-1付近にポリイミドに起因するイミド構造の吸収ピークが検出された。また、重量平均分子量は9,500であった。
[Example 9]
31.02 g (0.1 mol) of ODPA-2, 28.41 g (0.085 mol) of BAHF-1, and 3-aniline sulfonic acid (AS-1) were placed in a stainless steel autoclave equipped with a stirrer. 33 g (0.025 mol) and 255 g of deionized water were charged. After the reaction vessel was sealed under nitrogen gas at room temperature and normal pressure, the temperature was raised from room temperature to 160° C. while stirring at 150 rpm. The pressure in the reaction system at this stage was 0.6 MPa in gauge pressure. After being held at 160° C. for 4 hours, it was allowed to cool to around room temperature. The obtained contents were separated by filtration using filter paper with a pore size of 1 μm, and the solid content was recovered. The obtained solid content was subjected to vacuum drying at 50° C. for 12 hours to obtain a polyimide (P9). When P9 was measured by an infrared absorption spectrum, absorption peaks of an imide structure due to polyimide were detected near 1,780 cm −1 and 1,377 cm −1 . Moreover, the weight average molecular weight was 9,500.

 さらに得られたP9を加熱乾燥機の中に入れ、窒素気流下で180℃に昇温した。180℃で24時間保持した後、室温近傍まで放冷してポリイミド(P9’)を得た。P9’を赤外吸収スペクトルで測定したところ、1,780cm-1付近、1,377cm-1付近にポリイミドに起因するイミド構造の吸収ピークが検出された。得られたP9’を上記(1)、(2)、(3)、(4)の評価法に従って評価を行った。 The obtained P9 was placed in a heat dryer and heated to 180° C. under a nitrogen stream. After being held at 180° C. for 24 hours, it was allowed to cool to around room temperature to obtain polyimide (P9′). When P9′ was measured by an infrared absorption spectrum, absorption peaks of an imide structure due to polyimide were detected near 1,780 cm −1 and 1,377 cm −1 . The resulting P9' was evaluated according to the evaluation methods (1), (2), (3) and (4) above.

 また、P1’に代わりP9’を用いた他は実施例1に記載の方法と同様にして樹脂組成物を調製した。上記(5)、(6)の評価方法に従い、調製した樹脂組成物の評価を行った。 Also, a resin composition was prepared in the same manner as in Example 1, except that P9' was used instead of P1'. The prepared resin composition was evaluated according to the evaluation methods (5) and (6) above.

 [実施例10]
 撹拌機を具備したステンレス製オートクレーブにODPAを31.02g(0.1モル)、BAHF-1を28.41g(0.085モル)、3-アミノベンゼンチオール(AB-1)を3.13g(0.025モル)、イオン交換水を255g仕込んだ。反応容器を室温・常圧下にて窒素ガス下に密封した後、150rpmで撹拌しながら、室温から160℃に昇温した。この段階での反応系内の圧力はゲージ圧で0.6MPaであった。160℃で4時間保持した後、室温近傍まで放冷した。孔径1μmのろ紙を用いて得られた内容物を濾別し、固形分を回収した。得られた固形分を50℃で12時間真空乾燥に処し、ポリイミド(P10)を得た。P10を赤外吸収スペクトルで測定したところ、1,780cm-1付近、1,377cm-1付近にポリイミドに起因するイミド構造の吸収ピークが検出された。また、重量平均分子量は10,800であった。
[Example 10]
31.02 g (0.1 mol) of ODPA, 28.41 g (0.085 mol) of BAHF-1, 3.13 g (AB-1) of 3-aminobenzenethiol (AB-1) were added to a stainless steel autoclave equipped with a stirrer. 0.025 mol) and 255 g of ion-exchanged water were charged. After the reaction vessel was sealed under nitrogen gas at room temperature and normal pressure, the temperature was raised from room temperature to 160° C. while stirring at 150 rpm. The pressure in the reaction system at this stage was 0.6 MPa in gauge pressure. After being held at 160° C. for 4 hours, it was allowed to cool to around room temperature. The obtained contents were separated by filtration using filter paper with a pore size of 1 μm, and the solid content was recovered. The obtained solid content was subjected to vacuum drying at 50° C. for 12 hours to obtain polyimide (P10). When P10 was measured by an infrared absorption spectrum, absorption peaks of an imide structure due to polyimide were detected near 1,780 cm −1 and 1,377 cm −1 . Moreover, the weight average molecular weight was 10,800.

 さらに得られたP10を加熱乾燥機の中に入れ、窒素気流下で180℃に昇温した。180℃で24時間保持した後、室温近傍まで放冷してポリイミド(P10’)を得た。P10’を赤外吸収スペクトルで測定したところ、1,780cm-1付近、1,377cm-1付近にポリイミドに起因するイミド構造の吸収ピークが検出された。得られたP10’を上記(1)、(2)、(3)、(4)の評価法に従って評価を行った。 Further, the obtained P10 was placed in a heat dryer and heated to 180° C. under a nitrogen stream. After holding at 180° C. for 24 hours, it was allowed to cool to around room temperature to obtain polyimide (P10′). When P10′ was measured by an infrared absorption spectrum, absorption peaks of an imide structure due to polyimide were detected near 1,780 cm −1 and 1,377 cm −1 . The obtained P10′ was evaluated according to the evaluation methods (1), (2), (3) and (4) above.

 また、P1’に代わりP10’を用いた他は実施例1に記載の方法と同様にして樹脂組成物を調製した。上記(5)、(6)の評価方法に従い、調製した樹脂組成物の評価を行った。 Also, a resin composition was prepared in the same manner as in Example 1, except that P10' was used instead of P1'. The prepared resin composition was evaluated according to the evaluation methods (5) and (6) above.

 [実施例11]
 撹拌機を具備したステンレス製オートクレーブにODPA-2を31.02g(0.1モル)、BAHF-1を30.03g(0.082モル)、SiDA-1を1.24g(0.005モル)、MAP-1を2.73(0.025モル)、イオン交換水を204g、メタノールを51g仕込んだ。反応容器を室温・常圧下にて窒素ガス下に密封した後、150rpmで撹拌しながら、室温から120℃に昇温した。この段階での反応系内の圧力はゲージ圧で0.3MPaであった。120℃で4時間保持した後、室温近傍まで放冷した。孔径1μmのろ紙を用いて得られた内容物を濾別し、固形分を回収した。得られた固形分を50℃で12時間真空乾燥に処し、ポリイミド(P11)を得た。P11を赤外吸収スペクトルで測定したところ、1,780cm-1付近、1,377cm-1付近にポリイミドに起因するイミド構造の吸収ピークが検出された。また、重量平均分子量は7,000であった。
[Example 11]
31.02 g (0.1 mol) of ODPA-2, 30.03 g (0.082 mol) of BAHF-1, and 1.24 g (0.005 mol) of SiDA-1 in a stainless steel autoclave equipped with a stirrer , 2.73 (0.025 mol) of MAP-1, 204 g of deionized water, and 51 g of methanol were charged. After the reaction vessel was sealed under nitrogen gas at room temperature and normal pressure, the temperature was raised from room temperature to 120° C. while stirring at 150 rpm. The pressure in the reaction system at this stage was 0.3 MPa in gauge pressure. After being held at 120° C. for 4 hours, it was allowed to cool to near room temperature. The obtained contents were separated by filtration using filter paper with a pore size of 1 μm, and the solid content was recovered. The obtained solid content was subjected to vacuum drying at 50° C. for 12 hours to obtain polyimide (P11). When P11 was measured by an infrared absorption spectrum, absorption peaks of an imide structure due to polyimide were detected near 1,780 cm −1 and 1,377 cm −1 . Moreover, the weight average molecular weight was 7,000.

 さらに得られたP11を加熱乾燥機の中に入れ、減圧雰囲気(133Pa)とした後に180℃に昇温した。180℃で12時間保持した後、室温近傍まで放冷してポリイミド(P11’)を得た。P11’を赤外吸収スペクトルで測定したところ、1,780cm-1付近、1,377cm-1付近にポリイミドに起因するイミド構造の吸収ピークが検出された。得られたP11’を上記(1)、(2)、(3)、(4)の評価法に従って評価を行った。 Further, the obtained P11 was placed in a heat dryer, and after a reduced pressure atmosphere (133 Pa), the temperature was raised to 180°C. After holding at 180° C. for 12 hours, it was allowed to cool to around room temperature to obtain polyimide (P11′). When P11′ was measured by an infrared absorption spectrum, absorption peaks of an imide structure due to polyimide were detected near 1,780 cm −1 and 1,377 cm −1 . The obtained P11′ was evaluated according to the evaluation methods (1), (2), (3) and (4) above.

 また、P1’に代わりP11’を用いた他は実施例1に記載の方法と同様にして樹脂組成物を調製した。上記(5)、(6)の評価方法に従い、調製した樹脂組成物の評価を行った。 Also, a resin composition was prepared in the same manner as in Example 1, except that P11' was used instead of P1'. The prepared resin composition was evaluated according to the evaluation methods (5) and (6) above.

 [実施例12]
 撹拌機を具備したステンレス製オートクレーブにODPA-2を31.02g(0.1モル)、BAHF-1を36.63g(0.1モル)、イオン交換水を255g仕込んだ。反応容器を室温・常圧下にて窒素ガス下に密封した後、150rpmで撹拌しながら、室温から80℃に昇温した。この段階での反応系内の圧力はゲージ圧で0.0MPaであった。80℃で10時間保持した後、室温近傍まで放冷した。孔径1μmのろ紙を用いて得られた内容物を濾別し、固形分を回収した。得られた固形分を50℃で12時間真空乾燥に処し、ポリイミド(P12)を得た。P12を赤外吸収スペクトルで測定したところ、1,780cm-1付近、1,377cm-1付近にポリイミドに起因するイミド構造の吸収ピークが検出された。また、重量平均分子量は4,000であった。
[Example 12]
A stainless steel autoclave equipped with a stirrer was charged with 31.02 g (0.1 mol) of ODPA-2, 36.63 g (0.1 mol) of BAHF-1, and 255 g of deionized water. After the reaction vessel was sealed under nitrogen gas at room temperature and normal pressure, the temperature was raised from room temperature to 80° C. while stirring at 150 rpm. The pressure in the reaction system at this stage was 0.0 MPa in gauge pressure. After being held at 80° C. for 10 hours, it was allowed to cool to near room temperature. The obtained contents were separated by filtration using filter paper with a pore size of 1 μm, and the solid content was recovered. The obtained solid content was subjected to vacuum drying at 50° C. for 12 hours to obtain polyimide (P12). When P12 was measured by an infrared absorption spectrum, absorption peaks of an imide structure due to polyimide were detected near 1,780 cm −1 and 1,377 cm −1 . Moreover, the weight average molecular weight was 4,000.

 さらに得られたP12を加熱乾燥機の中に入れ、減圧雰囲気(133Pa)とした後に180℃に昇温した。180℃で12時間保持した後、室温近傍まで放冷してポリイミド(P12’)を得た。P12’を赤外吸収スペクトルで測定したところ、1,780cm-1付近、1,377cm-1付近にポリイミドに起因するイミド構造の吸収ピークが検出された。得られたP12’を上記(1)、(2)、(3)、(4)の評価法に従って評価を行った。 Further, the obtained P12 was placed in a heat dryer, and after a reduced pressure atmosphere (133 Pa), the temperature was raised to 180°C. After holding at 180° C. for 12 hours, it was allowed to cool to around room temperature to obtain polyimide (P12′). When P12′ was measured by an infrared absorption spectrum, absorption peaks of an imide structure due to polyimide were detected near 1,780 cm −1 and 1,377 cm −1 . The resulting P12' was evaluated according to the evaluation methods (1), (2), (3) and (4) above.

 また、P1’に代わりP12’を用いた他は実施例1に記載の方法と同様にして樹脂組成物を調製した。上記(5)、(6)の評価方法に従い、調製した樹脂組成物の評価を行った。 Also, a resin composition was prepared in the same manner as in Example 1, except that P12' was used instead of P1'. The prepared resin composition was evaluated according to the evaluation methods (5) and (6) above.

 [実施例13]
 撹拌機を具備したステンレス製オートクレーブにODPA-2を31.02g(0.1モル)、BAHF-1を30.03g(0.082モル)、SiDA-1を1.24g(0.005モル)、MAP-1を2.73(0.025モル)、イオン交換水を255g仕込んだ。反応容器を室温・常圧下にて窒素ガス下に密封した後、150rpmで撹拌しながら、室温から100℃に昇温した。この段階での反応系内の圧力はゲージ圧で0.0MPaであった。100℃で5時間保持した後、室温近傍まで放冷した。孔径1μmのろ紙を用いて得られた内容物を濾別し、固形分を回収した。得られた固形分を50℃で12時間真空乾燥に処し、ポリイミド(P13)を得た。P13を赤外吸収スペクトルで測定したところ、1,780cm-1付近、1,377cm-1付近にポリイミドに起因するイミド構造の吸収ピークが検出された。また、重量平均分子量は5,7000であった。
[Example 13]
31.02 g (0.1 mol) of ODPA-2, 30.03 g (0.082 mol) of BAHF-1, and 1.24 g (0.005 mol) of SiDA-1 in a stainless steel autoclave equipped with a stirrer , 2.73 (0.025 mol) of MAP-1 and 255 g of deionized water were charged. After the reaction vessel was sealed under nitrogen gas at room temperature and normal pressure, the temperature was raised from room temperature to 100° C. while stirring at 150 rpm. The pressure in the reaction system at this stage was 0.0 MPa in gauge pressure. After being held at 100° C. for 5 hours, it was allowed to cool to around room temperature. The obtained contents were separated by filtration using filter paper with a pore size of 1 μm, and the solid content was recovered. The obtained solid content was subjected to vacuum drying at 50° C. for 12 hours to obtain polyimide (P13). When P13 was measured by an infrared absorption spectrum, absorption peaks of an imide structure due to polyimide were detected near 1,780 cm −1 and 1,377 cm −1 . Moreover, the weight average molecular weight was 5,7000.

 さらに残りの反応物を含む反応容器を室温・常圧下にて窒素ガス下に密封した後、150rpmで撹拌しながら、再度室温から200℃に昇温した。この段階での反応系内の圧力はゲージ圧で1.5MPaであった。200℃で2時間保持した後、室温近傍まで放冷してポリイミド(P13’)を得た。P13’を赤外吸収スペクトルで測定したところ、1,780cm-1付近、1,377cm-1付近にポリイミドに起因するイミド構造の吸収ピークが検出された。また、重量平均分子量は12,000であった。得られたP13を上記(1)、(2)、(3)、(4)の評価法に従って評価を行った。 Furthermore, after sealing the reaction vessel containing the remaining reactants under nitrogen gas at room temperature and normal pressure, the temperature was again raised from room temperature to 200°C while stirring at 150 rpm. The pressure in the reaction system at this stage was 1.5 MPa in gauge pressure. After being held at 200° C. for 2 hours, it was allowed to cool to around room temperature to obtain polyimide (P13′). When P13' was measured by an infrared absorption spectrum, absorption peaks of an imide structure due to polyimide were detected near 1,780 cm-1 and 1,377 cm-1. Moreover, the weight average molecular weight was 12,000. The obtained P13 was evaluated according to the evaluation methods (1), (2), (3) and (4) above.

 また、P1’に代わりP13’を用いた他は実施例1に記載の方法と同様にして樹脂組成物を調製した。上記(5)、(6)の評価方法に従い、調製した樹脂組成物の評価を行った。 Also, a resin composition was prepared in the same manner as in Example 1, except that P13' was used instead of P1'. The prepared resin composition was evaluated according to the evaluation methods (5) and (6) above.

 [比較例1]
 撹拌機、還流管を具備した1LセパラブルフラスコにODPA-2を31.02g(0.1モル)、BAHF-1を30.03g(0.082モル)、SiDA-1を1.24g(0.005モル)、MAP-1を2.73(0.025モル)、イオン交換水を255g仕込んだ。反応容器内を窒素ガス置換した後、常圧にて150rpmで撹拌しながら、室温から30℃に昇温した。30℃で8時間保持した後、孔径1μmのろ紙を用いて得られた内容物を濾別し、固形分を回収した。得られた固形分を50℃で12時間真空乾燥に処し、生成物(P14)を得た。P15を赤外吸収スペクトルで測定したところ、2,500~3,500cm-1付近にテトラカルボン酸とアミンからなる塩に由来すると考えられる、ブロードなピークが検出された。また、重量平均分子量は400であった。
[Comparative Example 1]
31.02 g (0.1 mol) of ODPA-2, 30.03 g (0.082 mol) of BAHF-1, 1.24 g (0.082 mol) of BAHF-1, and 1.24 g (0 005 mol), 2.73 (0.025 mol) of MAP-1, and 255 g of deionized water. After the inside of the reaction vessel was replaced with nitrogen gas, the temperature was raised from room temperature to 30° C. while stirring at 150 rpm under normal pressure. After holding at 30° C. for 8 hours, the obtained content was filtered using a filter paper with a pore size of 1 μm to recover the solid content. The obtained solid content was subjected to vacuum drying at 50° C. for 12 hours to obtain a product (P14). When P15 was measured by infrared absorption spectrum, a broad peak was detected around 2,500 to 3,500 cm −1 , which was considered to be derived from a salt composed of tetracarboxylic acid and amine. Moreover, the weight average molecular weight was 400.

 さらに得られたP14を加熱乾燥機の中に入れ、窒素気流下で220℃に昇温した。220℃で24時間保持した後、室温近傍まで放冷してポリイミド(P14’)を得た。P14’を赤外吸収スペクトルで測定したところ、1,780cm-1付近、1,377cm-1付近にポリイミドに起因するイミド構造の吸収ピークが検出された。得られたP14’を上記(1)、(2)、(3)、(4)の評価法に従って評価を行った。 The obtained P14 was placed in a heat dryer and heated to 220° C. under a nitrogen stream. After holding at 220° C. for 24 hours, it was allowed to cool to around room temperature to obtain polyimide (P14′). When P14′ was measured by an infrared absorption spectrum, absorption peaks of an imide structure due to polyimide were detected near 1,780 cm −1 and 1,377 cm −1 . The resulting P14' was evaluated according to the evaluation methods (1), (2), (3) and (4) above.

 なお、樹脂組成物を調製する際、不溶部が発生したため(5)、(6)の評価は実施できなかった。 It should be noted that the evaluation of (5) and (6) could not be carried out because an insoluble portion was generated when the resin composition was prepared.

 [比較例2]
 撹拌機を具備したステンレス製オートクレーブにODPA-2を31.02g(0.1モル)、BAHF-1を31.13g(0.085モル)、SiDA-1を1.24g(0.005モル)、MAP-1を2.18g(0.02モル)、イオン交換水を255g仕込んだ。反応容器を室温・常圧下にて窒素ガス下に密封した後、150rpmで撹拌しながら、室温から260℃に昇温した。この段階での反応系内の圧力はゲージ圧で2.0MPaであった。260℃で4時間保持した後、室温近傍まで放冷した。孔径1μmのろ紙を用いて得られた内容物を濾別し、固形分を回収した。得られた固形分を50℃で12時間真空乾燥に処し、ポリイミド(P15)を得た。P15赤外吸収スペクトルで測定したところ、1,780cm-1付近、1,377cm-1付近にポリイミドに起因するイミド構造の吸収ピークが検出された。また、重量平均分子量は23,500であった。
[Comparative Example 2]
31.02 g (0.1 mol) of ODPA-2, 31.13 g (0.085 mol) of BAHF-1, and 1.24 g (0.005 mol) of SiDA-1 in a stainless steel autoclave equipped with a stirrer , 2.18 g (0.02 mol) of MAP-1, and 255 g of deionized water were charged. After the reaction vessel was sealed under nitrogen gas at room temperature and normal pressure, the temperature was raised from room temperature to 260° C. while stirring at 150 rpm. The pressure in the reaction system at this stage was 2.0 MPa in gauge pressure. After being held at 260° C. for 4 hours, it was allowed to cool to around room temperature. The obtained contents were separated by filtration using filter paper with a pore size of 1 μm, and the solid content was recovered. The obtained solid content was subjected to vacuum drying at 50° C. for 12 hours to obtain polyimide (P15). When measured by P15 infrared absorption spectrum, absorption peaks of an imide structure due to polyimide were detected near 1,780 cm −1 and 1,377 cm −1 . Moreover, the weight average molecular weight was 23,500.

 さらに得られたP15を加熱乾燥機の中に入れ、減圧雰囲気(133Pa)とした後に180℃に昇温した。180℃で12時間保持した後、室温近傍まで放冷してポリイミド(P15’)を得た。P15’を赤外吸収スペクトルで測定したところ、1,780cm-1付近、1,377cm-1付近にポリイミドに起因するイミド構造の吸収ピークが検出された。得られたP15’を上記(1)、(2)、(3)、(4)の評価法に従って評価を行った。 Further, the obtained P15 was placed in a heat dryer, and after a reduced pressure atmosphere (133 Pa), the temperature was raised to 180°C. After being held at 180° C. for 12 hours, it was allowed to cool to around room temperature to obtain polyimide (P15′). When P15′ was measured by an infrared absorption spectrum, absorption peaks of an imide structure due to polyimide were detected near 1,780 cm −1 and 1,377 cm −1 . The obtained P15′ was evaluated according to the evaluation methods (1), (2), (3) and (4) above.

 また、P1’に代わりP15’を用いた他は実施例1に記載の方法と同様にして樹脂組成物を調製した。上記(5)、(6)の評価方法に従い、調製した樹脂組成物の評価を行った。 Also, a resin composition was prepared in the same manner as in Example 1, except that P15' was used instead of P1'. The prepared resin composition was evaluated according to the evaluation methods (5) and (6) above.

 [比較例3]
 乾燥窒素気流下、N-メチル-2-ピロリドン100gに、BAHF-1を30.03g(0.082モル)、SiDA-1を1.24g(0.05モル)、MAP-1を2.73g(0.025モル)を溶解させた。ここにODPA-2を31.02g(0.1モル)をN-メチル-2-ピロリドン30gとともに加えて、20℃で1時間反応させ、次いで50℃で4時間反応させた。その後、180℃で5時間撹拌した。撹拌終了後、反応溶液をイオン交換水3Lに投入して、孔径1μmのろ紙を用いて沈殿物を濾別して回収した。回収した沈殿物を水で3回洗浄した後、50℃で12時間真空乾燥に処し、ポリイミド(P16)を得た。P16を赤外吸収スペクトルで測定したところ、1,780cm-1付近、1,377cm-1付近にポリイミドに起因するイミド構造の吸収ピークが検出された。また、重量平均分子量は13,100であった。
[Comparative Example 3]
Under a dry nitrogen stream, 30.03 g (0.082 mol) of BAHF-1, 1.24 g (0.05 mol) of SiDA-1, and 2.73 g of MAP-1 were added to 100 g of N-methyl-2-pyrrolidone. (0.025 mol) was dissolved. 31.02 g (0.1 mol) of ODPA-2 was added thereto together with 30 g of N-methyl-2-pyrrolidone, reacted at 20° C. for 1 hour, and then reacted at 50° C. for 4 hours. After that, the mixture was stirred at 180° C. for 5 hours. After stirring, the reaction solution was poured into 3 L of ion-exchanged water, and the precipitate was collected by filtration using a filter paper with a pore size of 1 μm. After the collected precipitate was washed with water three times, it was subjected to vacuum drying at 50° C. for 12 hours to obtain polyimide (P16). When P16 was measured by infrared absorption spectrum, absorption peaks of an imide structure due to polyimide were detected near 1,780 cm −1 and 1,377 cm −1 . Moreover, the weight average molecular weight was 13,100.

 さらに得られたP16を加熱乾燥機の中に入れ、窒素気流下で180℃に昇温した。180℃で12時間保持した後、室温近傍まで放冷してポリイミド(P16’)を得た。P16’を赤外吸収スペクトルで測定したところ、1,780cm-1付近、1,377cm-1付近にポリイミドに起因するイミド構造の吸収ピークが検出された。得られたP16’を上記(1)、(2)、(3)、(4)の評価法に従って評価を行った。 The obtained P16 was placed in a heat dryer and heated to 180° C. under a nitrogen stream. After holding at 180° C. for 12 hours, it was allowed to cool to around room temperature to obtain polyimide (P16′). When P16′ was measured by an infrared absorption spectrum, absorption peaks of an imide structure due to polyimide were detected near 1,780 cm −1 and 1,377 cm −1 . The resulting P16' was evaluated according to the evaluation methods (1), (2), (3) and (4) above.

 また、P1’に代わりP16’を用いた他は実施例1に記載の方法と同様にして樹脂組成物を調製した。上記(5)、(6)の評価方法に従い、調製した樹脂組成物の評価を行った。 Also, a resin composition was prepared in the same manner as in Example 1, except that P16' was used instead of P1'. The prepared resin composition was evaluated according to the evaluation methods (5) and (6) above.

 [比較例4]
 撹拌機を具備したステンレス製オートクレーブにODPA-2を31.02g(0.1モル)、BAHF-1を36.63g(0.1モル)、N-メチル-2-ピロリドンを128g、イオン交換水を127g仕込んだ。反応容器を室温・常圧下にて窒素ガス下に密封した後、150rpmで撹拌しながら、室温から180℃に昇温した。この段階での反応系内の圧力はゲージ圧で0.5MPaであった。180℃で4時間保持した後、室温近傍まで放冷した。孔径1μmのろ紙を用いて得られた内容物を濾別し、固形分を回収した。得られた固形分を50℃で12時間真空乾燥に処し、生成物(P17)を得た。P17を赤外吸収スペクトルで測定したところ、1,780cm-1付近、1,377cm-1付近にポリイミドに起因するイミド構造の吸収ピークが検出された。また、重量平均分子量は1,000であった。
[Comparative Example 4]
31.02 g (0.1 mol) of ODPA-2, 36.63 g (0.1 mol) of BAHF-1, 128 g of N-methyl-2-pyrrolidone, and deionized water in a stainless steel autoclave equipped with a stirrer. 127 g of was charged. After the reaction vessel was sealed under nitrogen gas at room temperature and normal pressure, the temperature was raised from room temperature to 180° C. while stirring at 150 rpm. The pressure in the reaction system at this stage was 0.5 MPa in gauge pressure. After being held at 180° C. for 4 hours, it was allowed to cool to around room temperature. The obtained contents were separated by filtration using filter paper with a pore size of 1 μm, and the solid content was recovered. The obtained solid content was subjected to vacuum drying at 50° C. for 12 hours to obtain a product (P17). When P17 was measured by infrared absorption spectrum, absorption peaks of an imide structure due to polyimide were detected near 1,780 cm −1 and 1,377 cm −1 . Moreover, the weight average molecular weight was 1,000.

 さらに得られたP17を加熱乾燥機の中に入れ、窒素気流下で220℃に昇温した。220℃で24時間保持した後、室温近傍まで放冷してポリイミド(P17’)を得た。P17’を赤外吸収スペクトルで測定したところ、1,780cm-1付近、1,377cm-1付近にポリイミドに起因するイミド構造の吸収ピークが検出された。得られたP17’を上記(1)、(2)、(3)、(4)の評価法に従って評価を行った。 The obtained P17 was placed in a heat dryer and heated to 220° C. under a nitrogen stream. After being kept at 220° C. for 24 hours, it was allowed to cool to around room temperature to obtain a polyimide (P17′). When P17′ was measured by an infrared absorption spectrum, absorption peaks of an imide structure due to polyimide were detected near 1,780 cm −1 and 1,377 cm −1 . The resulting P17' was evaluated according to the evaluation methods (1), (2), (3) and (4) above.

 なお、樹脂組成物を調製する際、不溶部が発生したため(5)、(6)の評価は実施できなかった。 It should be noted that the evaluation of (5) and (6) could not be carried out because an insoluble portion was generated when the resin composition was prepared.

 実施例1~13および比較例1~4の評価結果を表1に示す。 Table 1 shows the evaluation results of Examples 1 to 13 and Comparative Examples 1 to 4.

Figure JPOXMLDOC01-appb-T000009
Figure JPOXMLDOC01-appb-T000009

 [実施例14]
 撹拌機を具備したステンレス製オートクレーブにODPA-1(31.02g、0.1モル)、BAHF-1(36.63g、0.1モル)、イオン交換水255gを仕込んだ。反応容器を室温・常圧下にて窒素ガス下に密封した後、150rpmで撹拌しながら、室温から195℃まで約1.5時間かけて昇温した。この段階での反応系内の圧力はゲージ圧で1.5MPaであった。195℃で4時間保持した後、室温近傍まで放冷した。孔径1μmのろ紙を用いて得られた内容物を濾別し、固形分を回収した。得られた固形分を80℃で12時間真空乾燥に処し、ポリイミド(P18)を得た。P18を赤外吸収スペクトルで測定したところ、1,780cm-1付近、1,377cm-1付近にポリイミドに起因するイミド構造の吸収ピークが検出された。また、重量平均分子量は27,500であった。得られたP18を上記(2)、(3)、(4)の評価法に従って評価を行った。
[Example 14]
A stainless steel autoclave equipped with a stirrer was charged with ODPA-1 (31.02 g, 0.1 mol), BAHF-1 (36.63 g, 0.1 mol), and 255 g of deionized water. After the reaction vessel was sealed under nitrogen gas at room temperature and normal pressure, the temperature was raised from room temperature to 195° C. over about 1.5 hours while stirring at 150 rpm. The pressure in the reaction system at this stage was 1.5 MPa in gauge pressure. After being held at 195° C. for 4 hours, it was allowed to cool to around room temperature. The obtained contents were separated by filtration using filter paper with a pore size of 1 μm, and the solid content was recovered. The obtained solid content was subjected to vacuum drying at 80° C. for 12 hours to obtain polyimide (P18). When P18 was measured by an infrared absorption spectrum, absorption peaks of an imide structure due to polyimide were detected near 1,780 cm −1 and 1,377 cm −1 . Moreover, the weight average molecular weight was 27,500. The obtained P18 was evaluated according to the evaluation methods (2), (3) and (4) above.

 [実施例15]
 撹拌機を具備したステンレス製オートクレーブにODPA-1(31.02g、0.1モル)、BAHF-1(30.03g、0.082モル)、SiDA-1(1.24g,0.005モル)、MAP-1(2.73g,0.025モル)、イオン交換水255gを仕込んだ。反応容器を室温・常圧下にて窒素ガス下に密封した後、150rpmで撹拌しながら、室温から210℃まで約1.5時間かけて昇温した。この段階での反応系内の圧力はゲージ圧で2.0MPaであった。210℃で4時間保持した後、室温近傍まで放冷した。孔径1μmのろ紙を用いて得られた内容物を濾別し、固形分を回収した。得られた固形分を80℃で12時間真空乾燥に処し、ポリイミド(P19)を得た。P19を赤外吸収スペクトルで測定したところ、1,780cm-1付近、1,377cm-1付近にポリイミドに起因するイミド構造の吸収ピークが検出された。また、重量平均分子量は29,300であった。得られたP19を上記(2)、(3)、(4)の評価法に従って評価を行った。
[Example 15]
ODPA-1 (31.02 g, 0.1 mol), BAHF-1 (30.03 g, 0.082 mol), SiDA-1 (1.24 g, 0.005 mol) were placed in a stainless steel autoclave equipped with a stirrer. , MAP-1 (2.73 g, 0.025 mol), and 255 g of deionized water were charged. After the reaction vessel was sealed under nitrogen gas at room temperature and normal pressure, the temperature was raised from room temperature to 210° C. over about 1.5 hours while stirring at 150 rpm. The pressure in the reaction system at this stage was 2.0 MPa in gauge pressure. After being held at 210° C. for 4 hours, it was allowed to cool to near room temperature. The obtained contents were separated by filtration using filter paper with a pore size of 1 μm, and the solid content was recovered. The obtained solid content was subjected to vacuum drying at 80° C. for 12 hours to obtain a polyimide (P19). When P19 was measured by an infrared absorption spectrum, absorption peaks of an imide structure due to polyimide were detected near 1,780 cm −1 and 1,377 cm −1 . Moreover, the weight average molecular weight was 29,300. The obtained P19 was evaluated according to the evaluation methods (2), (3) and (4) above.

 [実施例16]
 撹拌機を具備したステンレス製オートクレーブにBCSA-1(35.83g、0.1モル)、BAHF-1(30.03g、0.085モル)、SiDA-1(1.24g,0.005モル)、アニリン(純度98重量%)(2.33g,0.02モル)、イオン交換水255gを仕込んだ。反応容器を室温・常圧下にて窒素ガス下に密封した後、150rpmで撹拌しながら、室温から230℃まで約1.5時間かけて昇温した。この段階での反応系内の圧力はゲージ圧で2.8MPaであった。230℃で12時間保持した後、室温近傍まで放冷した。孔径1μmのろ紙を用いて得られた内容物を濾別し、固形分を回収した。得られた固形分を80℃で12時間真空乾燥に処し、ポリイミド(P20)を得た。P20を赤外吸収スペクトルで測定したところ、1,780cm-1付近、1,377cm-1付近にポリイミドに起因するイミド構造の吸収ピークが検出された。また、重量平均分子量は32,400であった。得られたP20を上記(2)、(3)、(4)の評価法に従って評価を行った。
[Example 16]
BCSA-1 (35.83 g, 0.1 mol), BAHF-1 (30.03 g, 0.085 mol), SiDA-1 (1.24 g, 0.005 mol) were placed in a stainless steel autoclave equipped with a stirrer. , aniline (purity 98% by weight) (2.33 g, 0.02 mol), and 255 g of ion-exchanged water were charged. After the reaction vessel was sealed under nitrogen gas at room temperature and normal pressure, the temperature was raised from room temperature to 230° C. over about 1.5 hours while stirring at 150 rpm. The pressure in the reaction system at this stage was 2.8 MPa in gauge pressure. After being held at 230° C. for 12 hours, it was allowed to cool to around room temperature. The obtained contents were separated by filtration using filter paper with a pore size of 1 μm, and the solid content was recovered. The obtained solid content was subjected to vacuum drying at 80° C. for 12 hours to obtain polyimide (P20). When P20 was measured by infrared absorption spectrum, absorption peaks of an imide structure due to polyimide were detected near 1,780 cm −1 and 1,377 cm −1 . Moreover, the weight average molecular weight was 32,400. The obtained P20 was evaluated according to the evaluation methods (2), (3) and (4) above.

 [実施例17]
 撹拌機を具備したステンレス製オートクレーブにTDA-1(30.03g、0.1モル)、BAHF-1(32.96g、0.09モル)、MAP-1(2.18g,0.02モル)、イオン交換水255gを仕込んだ。反応容器を室温・常圧下にて窒素ガス下に密封した後、150rpmで撹拌しながら、室温から190℃まで約1.5時間かけて昇温した。この段階での反応系内の圧力はゲージ圧で1.2MPaであった。190℃で4時間保持した後、室温近傍まで放冷した。孔径1μmのろ紙を用いて得られた内容物を濾別し、固形分を回収した。得られた固形分を80℃で12時間真空乾燥に処し、ポリイミド(P21)を得た。P21を赤外吸収スペクトルで測定したところ、1,780cm-1付近、1,377cm-1付近にポリイミドに起因するイミド構造の吸収ピークが検出された。また、重量平均分子量は24,400であった。得られたP21を上記(2)、(3)、(4)の評価法に従って評価を行った。
[Example 17]
TDA-1 (30.03 g, 0.1 mol), BAHF-1 (32.96 g, 0.09 mol), MAP-1 (2.18 g, 0.02 mol) were placed in a stainless steel autoclave equipped with a stirrer. , and charged with 255 g of ion-exchanged water. After the reaction vessel was sealed under nitrogen gas at room temperature and normal pressure, the temperature was raised from room temperature to 190° C. over about 1.5 hours while stirring at 150 rpm. The pressure in the reaction system at this stage was 1.2 MPa in gauge pressure. After being held at 190° C. for 4 hours, it was allowed to cool to near room temperature. The obtained contents were separated by filtration using filter paper with a pore size of 1 μm, and the solid content was recovered. The obtained solid content was subjected to vacuum drying at 80° C. for 12 hours to obtain polyimide (P21). When P21 was measured by an infrared absorption spectrum, absorption peaks of an imide structure due to polyimide were detected near 1,780 cm −1 and 1,377 cm −1 . Moreover, the weight average molecular weight was 24,400. The obtained P21 was evaluated according to the evaluation methods (2), (3) and (4) above.

 [比較例5]
 乾燥窒素気流下、BAHF-1(30.03g、0.082モル)、SiDA-1(1.24g、0.05モル)、MAP-1(2.73g、0.025モル)をN-メチル-2-ピロリドン100gに溶解させた。ここにODPA-1(31.02g、0.1モル)をN-メチル-2-ピロリドン30gとともに加えて、20℃で1時間反応させ、次いで50℃で4時間反応させた。その後、180℃で5時間撹拌した。撹拌終了後、反応溶液をイオン交換水3Lに投入して、孔径1μmのろ紙を用いて沈殿物を濾別して回収した。回収した沈殿物を水で3回洗浄した後、80℃で12時間真空乾燥に処し、ポリイミド(P22)を得た。P22を赤外吸収スペクトルで測定したところ、1,780cm-1付近、1,377cm-1付近にポリイミドに起因するイミド構造の吸収ピークが検出された。また、重量平均分子量は28,800であった。得られたP22を上記(2)、(3)、(4)の評価法に従って評価を行った。
[Comparative Example 5]
Under dry nitrogen stream, BAHF-1 (30.03 g, 0.082 mol), SiDA-1 (1.24 g, 0.05 mol), MAP-1 (2.73 g, 0.025 mol) was added to N-methyl -Dissolved in 100 g of 2-pyrrolidone. ODPA-1 (31.02 g, 0.1 mol) was added thereto together with 30 g of N-methyl-2-pyrrolidone, reacted at 20° C. for 1 hour, and then reacted at 50° C. for 4 hours. After that, the mixture was stirred at 180° C. for 5 hours. After stirring, the reaction solution was poured into 3 L of ion-exchanged water, and the precipitate was collected by filtration using a filter paper with a pore size of 1 μm. After the collected precipitate was washed with water three times, it was subjected to vacuum drying at 80° C. for 12 hours to obtain polyimide (P22). When P22 was measured by an infrared absorption spectrum, absorption peaks of an imide structure due to polyimide were detected near 1,780 cm −1 and 1,377 cm −1 . Moreover, the weight average molecular weight was 28,800. The obtained P22 was evaluated according to the evaluation methods (2), (3) and (4) above.

 [比較例6]
 撹拌機を具備したステンレス製オートクレーブにODPA-2(31.02g、0.1モル)、BAHF-2(31.13g、0.085モル)、SiDA-1(1.24g,0.005モル)、MAP-2(2.18g,0.02モル)、イオン交換水255gを仕込んだ。反応容器を室温・常圧下にて窒素ガス下に密封した後、150rpmで撹拌しながら、室温から210℃まで約1.5時間かけて昇温した。この段階での反応系内の圧力はゲージ圧で2.8MPaであった。230℃で4時間保持した後、室温近傍まで放冷した。孔径1μmのろ紙を用いて得られた内容物を濾別し、固形分を回収した。得られた固形分を80℃で12時間真空乾燥に処し、ポリイミド(P23)を得た。P23を赤外吸収スペクトルで測定したところ、1,780cm-1付近、1,377cm-1付近にポリイミドに起因するイミド構造の吸収ピークが検出された。また、重量平均分子量は29,300であった。得られたP23を上記(2)、(3)、(4)の評価法に従って評価を行った。
[Comparative Example 6]
ODPA-2 (31.02 g, 0.1 mol), BAHF-2 (31.13 g, 0.085 mol), SiDA-1 (1.24 g, 0.005 mol) were placed in a stainless steel autoclave equipped with a stirrer. , MAP-2 (2.18 g, 0.02 mol), and 255 g of deionized water were charged. After the reaction vessel was sealed under nitrogen gas at room temperature and normal pressure, the temperature was raised from room temperature to 210° C. over about 1.5 hours while stirring at 150 rpm. The pressure in the reaction system at this stage was 2.8 MPa in gauge pressure. After being held at 230° C. for 4 hours, it was allowed to cool to near room temperature. The obtained contents were separated by filtration using filter paper with a pore size of 1 μm, and the solid content was recovered. The obtained solid content was subjected to vacuum drying at 80° C. for 12 hours to obtain polyimide (P23). When P23 was measured by an infrared absorption spectrum, absorption peaks of an imide structure due to polyimide were detected near 1,780 cm −1 and 1,377 cm −1 . Moreover, the weight average molecular weight was 29,300. The obtained P23 was evaluated according to the evaluation methods (2), (3) and (4) above.

 実施例14~17、比較例5、6の評価結果を表2に示す。 Table 2 shows the evaluation results of Examples 14 to 17 and Comparative Examples 5 and 6.

Figure JPOXMLDOC01-appb-T000010
Figure JPOXMLDOC01-appb-T000010

 本発明により得られるポリイミドを含有するポリイミド樹脂組成物を硬化した硬化物は、電子部品を構成する絶縁膜、保護膜として好適に用いることが出来る。更には、健康や環境に懸念のある溶剤を実質的に含まないため、持続可能な工業製品の提供に大きく寄与できる。 A cured product obtained by curing a polyimide resin composition containing polyimide obtained by the present invention can be suitably used as an insulating film or a protective film constituting electronic parts. Furthermore, since it does not substantially contain solvents that pose health and environmental concerns, it can greatly contribute to the provision of sustainable industrial products.

 ここで、電子部品としては、トランジスタ、ダイオード、集積回路(IC)、メモリなどの半導体を有する能動部品、抵抗、キャパシタ、インダクタなどの受動部品が挙げられる。また、これらの部品の耐久性を向上させる目的で封止したパッケージや、複数の部品を一体化させたモジュールも、電子部品に含まれる。また、半導体を用いた電子部品を半導体装置または半導体パッケージとも称する。また、タッチセンサーパネルなども挙げられる。 Here, electronic components include active components having semiconductors such as transistors, diodes, integrated circuits (ICs) and memories, and passive components such as resistors, capacitors and inductors. The electronic components also include packages sealed for the purpose of improving the durability of these components, and modules in which a plurality of components are integrated. An electronic component using a semiconductor is also called a semiconductor device or a semiconductor package. Moreover, a touch sensor panel etc. are mentioned.

 電子部品内の硬化物の具体例としては、半導体のパッシベーション膜、半導体素子またはTFT(Thin Film Transistor)などの表面保護膜、2~10層の高密度実装用多層配線における再配線間の層間絶縁膜などの層間絶縁膜、薄膜キャパシタ、圧電素子、信号フィルターなどの受動部品向け層間絶縁膜、タッチパネルの絶縁膜、保護膜などの用途に好適に用いられる。さらに本発明の硬化物は、有機ELディスプレイや液晶ディスプレイ等の画像表示装置の各部材に用いることができ、画素分割層、電極絶縁層、配線絶縁層、層間絶縁層、TFT平坦化層、電極平坦化層、配線平坦化層、TFT保護層、電極保護層、配線保護層、ゲート絶縁層、カラーフィルタ、ブラックマトリックス、又はブラックカラムスペーサーなどの用途に好適に用いられる。これに制限されず、様々な用途に用いることができる。 Specific examples of cured products in electronic components include passivation films for semiconductors, surface protective films for semiconductor elements or TFTs (Thin Film Transistors), and interlayer insulation between rewiring in multilayer wiring for high-density mounting of 2 to 10 layers. It is suitably used for applications such as interlayer insulating films such as films, interlayer insulating films for passive components such as thin film capacitors, piezoelectric elements, and signal filters, insulating films for touch panels, and protective films. Furthermore, the cured product of the present invention can be used for each member of an image display device such as an organic EL display and a liquid crystal display. It is suitably used for applications such as a planarizing layer, a wiring planarizing layer, a TFT protective layer, an electrode protective layer, a wiring protective layer, a gate insulating layer, a color filter, a black matrix, or a black column spacer. It is not limited to this, and can be used for various purposes.

Claims (15)

反応溶媒の全体100質量%に対して、水を60~100質量%含有する反応溶媒中で、テトラカルボン酸および/またはテトラカルボン酸二無水物(a)とジアミン(b)を、80℃以上250℃以下の温度範囲で反応させてポリイミドを得る工程(1)の後、得られたポリイミドの鎖延長工程(2)を含む、ポリイミドの製造方法。 Tetracarboxylic acid and/or tetracarboxylic dianhydride (a) and diamine (b) are heated at 80° C. or higher in a reaction solvent containing 60 to 100% by mass of water with respect to 100% by mass of the total reaction solvent. A method for producing a polyimide, comprising a step (1) of obtaining a polyimide by reaction in a temperature range of 250° C. or less, and a step (2) of chain extension of the obtained polyimide. 前記鎖延長工程(2)が固相重合工程(2a)である、請求項1に記載のポリイミドの製造方法。 2. The method for producing a polyimide according to claim 1, wherein the chain extension step (2) is a solid state polymerization step (2a). 前記鎖延長工程(2)が、前記工程(1)よりも高い温度で反応させてポリイミドを得る工程(2b)である、請求項1に記載のポリイミドの製造方法。 2. The method for producing polyimide according to claim 1, wherein said chain extension step (2) is step (2b) of obtaining polyimide by reacting at a temperature higher than said step (1). 前記工程(1)において、80℃以上140℃以下の温度範囲で反応させてポリイミドを得る、請求項1~3のいずれかに記載のポリイミドの製造方法。 The method for producing a polyimide according to any one of claims 1 to 3, wherein in the step (1), the polyimide is obtained by reacting at a temperature range of 80°C or higher and 140°C or lower. 前記工程(2a)において、80℃以上250℃以下の温度範囲で固相重合する、請求項2に記載のポリイミドの製造方法。 3. The method for producing a polyimide according to claim 2, wherein in the step (2a), the solid state polymerization is carried out in a temperature range of 80[deg.] C. or higher and 250[deg.] C. or lower. 前記工程(1)において、さらにモノアミン(c)を反応させる、請求項1~5のいずれかに記載のポリイミドの製造方法。 The method for producing a polyimide according to any one of claims 1 to 5, wherein the monoamine (c) is further reacted in the step (1). 前記テトラカルボン酸および/またはテトラカルボン酸二無水物(a)が、式(1)で表される化合物からなる群より選択される1つ以上を含む、請求項1~6のいずれかに記載のポリイミドの製造方法。
Figure JPOXMLDOC01-appb-C000001
(式(1)中、RおよびR12は、それぞれ独立に、酸素原子、C(CH、C(CFまたはSOを示し、RおよびRは、それぞれ独立に、水素原子、水酸基、スルホン酸基またはチオール基を示し、R、R、R10、R11、R13およびR14は、それぞれ独立に、水素原子、水酸基、スルホン酸基、チオール基または炭素数1~6のアルキル基を示す。)
The tetracarboxylic acid and / or tetracarboxylic dianhydride (a) contains one or more selected from the group consisting of compounds represented by formula (1), according to any one of claims 1 to 6 method for producing polyimide.
Figure JPOXMLDOC01-appb-C000001
(In formula (1), R 5 and R 12 each independently represent an oxygen atom, C(CH 3 ) 2 , C(CF 3 ) 2 or SO 2 , R 6 and R 7 each independently , a hydrogen atom, a hydroxyl group, a sulfonic acid group or a thiol group, and R 8 , R 9 , R 10 , R 11 , R 13 and R 14 each independently represent a hydrogen atom, a hydroxyl group, a sulfonic acid group, a thiol group or Indicates an alkyl group having 1 to 6 carbon atoms.)
反応溶媒の全体100質量%に対して、水を60~100質量%含有する反応溶媒中、純度98質量%以上のテトラカルボン酸二無水物(d)と、純度98質量%以上のジアミン(e)を、100℃以上370℃以下の温度範囲で反応させてポリイミドを得る工程(3)を含む、ポリイミドの製造方法。 In a reaction solvent containing 60 to 100% by mass of water with respect to 100% by mass of the total reaction solvent, a tetracarboxylic dianhydride (d) with a purity of 98% by mass or more and a diamine (e) with a purity of 98% by mass or more ) in a temperature range of 100° C. or higher and 370° C. or lower to obtain a polyimide (3). 前記工程(3)において、さらに純度97質量%以上のモノアミン(f)を反応させる請求項8に記載のポリイミドの製造方法。 9. The method for producing a polyimide according to claim 8, wherein in the step (3), a monoamine (f) having a purity of 97% by mass or more is further reacted. 式(2)で表される構造単位を有し、有機溶媒の含有量が1質量%以下であり、黄色度が0~3.0であり、重量平均分子量が5,000~100,000であるポリイミド。
Figure JPOXMLDOC01-appb-C000002
 (式(2)中、Rは炭素数5~40の4~14価の有機基、Rは炭素数5~40の2~12価の有機基を示し、RおよびRは、それぞれ独立に、水酸基、スルホン酸基、チオール基または炭素数1から20の有機基を示し、αおよびβは、それぞれ独立に、α+β≧1を満たす、0から10までの整数を示す。)
It has a structural unit represented by formula (2), has an organic solvent content of 1% by mass or less, has a yellowness of 0 to 3.0, and has a weight average molecular weight of 5,000 to 100,000. some polyimide.
Figure JPOXMLDOC01-appb-C000002
(In formula (2), R 1 represents a 4- to 14-valent organic group having 5 to 40 carbon atoms, R 2 represents a 2- to 12-valent organic group having 5 to 40 carbon atoms, and R 3 and R 4 are Each independently represents a hydroxyl group, a sulfonic acid group, a thiol group or an organic group having 1 to 20 carbon atoms, and α and β each independently represents an integer from 0 to 10 satisfying α+β≧1.)
有機溶媒の含有量が0.1質量%以下である、請求項10に記載のポリイミド。 11. The polyimide according to claim 10, wherein the content of the organic solvent is 0.1% by mass or less. アルカリ可溶性である、請求項10または11に記載のポリイミド。 12. Polyimide according to claim 10 or 11, which is alkali-soluble. 前記ポリイミドの主鎖末端少なくとも1つが、末端封止剤により封止された構造を含む請求項10~12のいずれかに記載のポリイミド。 13. The polyimide according to any one of claims 10 to 12, wherein at least one main chain end of said polyimide comprises a structure blocked with a terminal blocking agent. 請求項10~13のいずれかに記載のポリイミドと、感光剤および溶剤を含有するポリイミド樹脂組成物。 A polyimide resin composition containing the polyimide according to any one of claims 10 to 13, a photosensitizer and a solvent. 請求項14に記載のポリイミド樹脂組成物を硬化した硬化物。 A cured product obtained by curing the polyimide resin composition according to claim 14 .
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