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WO2022230295A1 - Thermal diffusion device - Google Patents

Thermal diffusion device Download PDF

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Publication number
WO2022230295A1
WO2022230295A1 PCT/JP2022/005061 JP2022005061W WO2022230295A1 WO 2022230295 A1 WO2022230295 A1 WO 2022230295A1 JP 2022005061 W JP2022005061 W JP 2022005061W WO 2022230295 A1 WO2022230295 A1 WO 2022230295A1
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WO
WIPO (PCT)
Prior art keywords
capillary structure
wick
housing
wall surface
heat
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/JP2022/005061
Other languages
French (fr)
Japanese (ja)
Inventor
竜宏 沼本
慶次郎 小島
剛 向井
誠士 森上
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Murata Manufacturing Co Ltd
Original Assignee
Murata Manufacturing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Murata Manufacturing Co Ltd filed Critical Murata Manufacturing Co Ltd
Priority to CN202290000379.4U priority Critical patent/CN221123118U/en
Publication of WO2022230295A1 publication Critical patent/WO2022230295A1/en
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

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Classifications

    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F28HEAT EXCHANGE IN GENERAL
    • F28DHEAT-EXCHANGE APPARATUS, NOT PROVIDED FOR IN ANOTHER SUBCLASS, IN WHICH THE HEAT-EXCHANGE MEDIA DO NOT COME INTO DIRECT CONTACT
    • F28D15/00Heat-exchange apparatus with the intermediate heat-transfer medium in closed tubes passing into or through the conduit walls ; Heat-exchange apparatus employing intermediate heat-transfer medium or bodies
    • F28D15/02Heat-exchange apparatus with the intermediate heat-transfer medium in closed tubes passing into or through the conduit walls ; Heat-exchange apparatus employing intermediate heat-transfer medium or bodies in which the medium condenses and evaporates, e.g. heat pipes
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F28HEAT EXCHANGE IN GENERAL
    • F28DHEAT-EXCHANGE APPARATUS, NOT PROVIDED FOR IN ANOTHER SUBCLASS, IN WHICH THE HEAT-EXCHANGE MEDIA DO NOT COME INTO DIRECT CONTACT
    • F28D15/00Heat-exchange apparatus with the intermediate heat-transfer medium in closed tubes passing into or through the conduit walls ; Heat-exchange apparatus employing intermediate heat-transfer medium or bodies
    • F28D15/02Heat-exchange apparatus with the intermediate heat-transfer medium in closed tubes passing into or through the conduit walls ; Heat-exchange apparatus employing intermediate heat-transfer medium or bodies in which the medium condenses and evaporates, e.g. heat pipes
    • F28D15/04Heat-exchange apparatus with the intermediate heat-transfer medium in closed tubes passing into or through the conduit walls ; Heat-exchange apparatus employing intermediate heat-transfer medium or bodies in which the medium condenses and evaporates, e.g. heat pipes with tubes having a capillary structure
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/34Arrangements for cooling, heating, ventilating or temperature compensation ; Temperature sensing arrangements
    • H01L23/42Fillings or auxiliary members in containers or encapsulations selected or arranged to facilitate heating or cooling
    • H01L23/427Cooling by change of state, e.g. use of heat pipes
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K7/00Constructional details common to different types of electric apparatus
    • H05K7/20Modifications to facilitate cooling, ventilating, or heating

Definitions

  • the present invention relates to heat diffusion devices.
  • the vapor chamber has a structure in which a working medium and a wick that transports the working medium by capillary force are sealed inside the housing.
  • the working medium absorbs heat from the heating element in the evaporating portion that absorbs heat from the heating element, evaporates in the vapor chamber, moves in the vapor chamber, is cooled, and returns to the liquid phase.
  • the working medium that has returned to the liquid phase moves again to the evaporating portion on the heating element side by the capillary force of the wick, and cools the heating element.
  • the vapor chamber can operate independently without external power, and heat can be two-dimensionally diffused at high speed by utilizing the latent heat of vaporization and latent heat of condensation of the working medium.
  • Patent Literature 1 discloses a vapor chamber in which a peripheral fluid passage portion through which the working fluid flows is formed over the entire peripheral edge of the first metal sheet or the second metal sheet.
  • a liquid flow path portion (wick) through which the liquid working fluid passes is formed on the entire surface of the vapor chamber when viewed from above (see FIG. 4 of Patent Document 1). Further, the shape of the wick is shown on the premise that the shape of the vapor chamber when viewed from above is rectangular, and the heat source is positioned at the center of the rectangle (see each figure of Patent Document 1).
  • the wick is formed on the entire surface of the vapor chamber when viewed from above, the proportion of the vapor flow path through which the vapor of the working fluid passes is relatively reduced. A problem arises that the maximum heat transfer rate decreases when the percentage of the portion through which the steam passes is low. In addition, since the steam flow path is divided by the wick, there arises a problem that uniformity of heat is lowered. Furthermore, forming the wick on the entire surface also raises the problem that the cost associated with the formation of the wick increases.
  • the wick instead of forming the wick over the entire surface, it is being considered to form the wick only where it is considered necessary. This is the case where the wick is not formed on the entire surface, and the shape of the vapor chamber when viewed from above is not a rectangle, but a shape having first and second sides forming an interior angle of 180° or more (hereinafter also referred to as a deformed shape).
  • a liquid pool may occur near the first side or the second side. Liquid pools formed near the first side or the second side cannot be collected by the wick, so the amount of liquid transported is reduced, resulting in a problem of a decrease in the maximum heat transport amount.
  • the present invention has been made to solve the above problems, and provides a heat diffusion device that can increase the maximum heat transfer rate and heat uniformity by increasing the ratio of steam flow paths. for the purpose.
  • a heat diffusion device of the present invention comprises a housing having a first inner wall surface and a second inner wall surface facing each other in a thickness direction, a working medium enclosed in the internal space of the housing, and a and a wick disposed, the wick having a portion in contact with the first inner wall surface and the second inner wall surface of the housing along a direction perpendicular to the thickness direction, and A steam flow path is formed in the internal space, and the planar shape of the housing viewed from the thickness direction is a shape having first and second sides forming an interior angle of 180° or more,
  • the interior space of the housing further includes a capillary structure having a first portion adjacent to the first side or the second side and a second portion in contact with the wick.
  • FIG. 1 is a perspective view schematically showing an example of the heat diffusion device of the present invention.
  • FIG. 2A is a plan view schematically showing an example of the vapor chamber according to the first embodiment of the invention.
  • FIG. 2B is a cross-sectional view taken along line AA of FIG. 2A.
  • FIG. 2C is a cross-sectional view taken along line BB of FIG. 2A.
  • FIG. 2D is a cross-sectional view taken along line CC of FIG. 2A.
  • FIG. 3A is a plan view schematically showing an example of vapor chambers with different orientations of capillary structures.
  • FIG. 3B is a plan view schematically showing an example of vapor chambers with different orientations of capillary structures.
  • FIG. 3A is a plan view schematically showing an example of vapor chambers with different orientations of capillary structures.
  • FIG. 4 is a plan view schematically showing an example of a vapor chamber in which the second end of the capillary structure is in contact with multiple wicks.
  • FIG. 5A is a plan view schematically showing an example of a vapor chamber having a housing with a different planar shape.
  • FIG. 5B is a plan view schematically showing an example of a vapor chamber having a housing with a different planar shape.
  • FIG. 5C is a plan view schematically showing an example of a vapor chamber having a housing with a different planar shape.
  • FIG. 5D is a plan view schematically showing an example of a vapor chamber having a housing with a different planar shape.
  • FIG. 5A is a plan view schematically showing an example of a vapor chamber having a housing with a different planar shape.
  • FIG. 5B is a plan view schematically showing an example of a vapor chamber having a housing with a different planar shape.
  • FIG. 5C is a plan view
  • FIG. 5E is a plan view schematically showing an example of a vapor chamber having a housing with a different planar shape.
  • FIG. 6A is a cross-sectional view schematically showing an example in which microchannels have different cross-sectional shapes.
  • FIG. 6B is a cross-sectional view schematically showing an example in which microchannels have different cross-sectional shapes.
  • FIG. 6C is a cross-sectional view schematically showing an example in which the microchannel has a different cross-sectional shape.
  • FIG. 7 is a cross-sectional view schematically showing an example in which microchannels are provided on both the first inner wall surface and the second inner wall surface of the housing.
  • FIG. 8A is a perspective view schematically showing an example in which a space sandwiched by additional parts is used as a capillary structure.
  • FIG. 8B is a perspective view schematically showing an example in which a porous body has a capillary structure.
  • FIG. 9A is a plan view schematically showing an example of a vapor chamber in which pillars are provided inside a housing.
  • FIG. 9B is a cross-sectional view taken along line DD of FIG. 9A.
  • FIG. 10 is a plan view schematically showing an example of a vapor chamber in which the wick does not have a liquid phase flow path.
  • the heat diffusion device of the present invention will be described below.
  • the present invention is not limited to the following configurations, and can be appropriately modified and applied without changing the gist of the present invention. It should be noted that a combination of two or more of the individual preferred configurations of the invention described below is also the invention.
  • a heat diffusion device of the present invention comprises a housing having a first inner wall surface and a second inner wall surface facing each other in a thickness direction, a working medium enclosed in the internal space of the housing, and a and a wick disposed, the wick having a portion in contact with the first inner wall surface and the second inner wall surface of the housing along a direction perpendicular to the thickness direction, and the inside of the housing.
  • a steam flow path is formed in the space, and the planar shape of the housing viewed from the thickness direction is a shape having first and second sides forming an internal angle of 180° or more.
  • a vapor chamber will be described below as an example of an embodiment of the heat diffusion device of the present invention.
  • the heat diffusion device of the present invention can also be applied to heat diffusion devices such as heat pipes.
  • FIG. 1 is a perspective view schematically showing an example of the heat diffusion device of the present invention.
  • the vapor chamber 1 shown in FIG. 1 includes a hollow housing 10 that is hermetically sealed.
  • a heat source HS which is a heating element, is arranged on the outer wall surface of the housing 10 .
  • the heat source HS include electronic components of electronic equipment, such as a central processing unit (CPU).
  • the vapor chamber 1 is planar as a whole. That is, the housing 10 is planar as a whole.
  • the “planar shape” includes a plate shape and a sheet shape, and the dimension in the width direction X (hereinafter referred to as width) and the dimension in the length direction Y (hereinafter referred to as length) are the thickness direction Z
  • width width
  • length dimension in the length direction
  • Z It means a shape that is considerably large with respect to its dimensions (hereafter referred to as thickness or height). For example, it means a shape whose width and length are 10 times or more, preferably 100 times or more, the thickness.
  • the size of the vapor chamber 1, that is, the size of the housing 10 is not particularly limited.
  • the width and length of the vapor chamber 1 can be appropriately set according to the application.
  • the width and length of the vapor chamber 1 are, for example, 5 mm or more and 500 mm or less, 20 mm or more and 300 mm or less, or 50 mm or more and 200 mm or less.
  • the width and length of the vapor chamber 1 may be the same or different.
  • the width and length of the vapor chamber are defined as maximum values in the width direction and the length direction.
  • the housing 10 is preferably composed of a first sheet 11 and a second sheet 12 that face each other and whose outer edges are joined.
  • Materials for the first sheet 11 and the second sheet 12 are not particularly limited as long as they have properties suitable for use as a vapor chamber, such as thermal conductivity, strength, softness, and flexibility.
  • the material that constitutes the first sheet 11 and the second sheet 12 is preferably a metal, such as copper, nickel, aluminum, magnesium, titanium, iron, or an alloy containing them as a main component, and copper is particularly preferable. is.
  • the materials forming the first sheet 11 and the second sheet 12 may be the same or different, but are preferably the same.
  • the housing 10 is composed of the first sheet 11 and the second sheet 12
  • the first sheet 11 and the second sheet 12 are joined together at their outer edges.
  • Such bonding methods are not particularly limited, but laser welding, resistance welding, diffusion bonding, brazing, TIG welding (tungsten-inert gas welding), ultrasonic bonding, or resin sealing can be used, for example.
  • TIG welding tungsten-inert gas welding
  • ultrasonic bonding or resin sealing
  • resin sealing for example.
  • laser welding, resistance welding or brazing can be used.
  • the thicknesses of the first sheet 11 and the second sheet 12 are not particularly limited, but each is preferably 10 ⁇ m or more and 200 ⁇ m or less, more preferably 30 ⁇ m or more and 100 ⁇ m or less, still more preferably 40 ⁇ m or more and 60 ⁇ m or less.
  • the thicknesses of the first sheet 11 and the second sheet 12 may be the same or different. Further, the thickness of each sheet of the first sheet 11 and the second sheet 12 may be the same over the entire area, or may be thin in part.
  • first sheet 11 and the second sheet 12 are not particularly limited.
  • first sheet 11 may have a flat plate shape with a constant thickness
  • second sheet 12 may have a shape in which the outer edge portion is thicker than the portions other than the outer edge portion.
  • the first sheet 11 may have a flat plate shape with a constant thickness
  • the second sheet 12 may have a constant thickness and a portion other than the outer edge with respect to the outer edge may be convex outward. good.
  • a recess is formed in the outer edge of the housing 10 . Therefore, the concave portion of the outer edge can be used when mounting the vapor chamber. Also, other components can be placed in the recesses of the outer edge.
  • the thickness of the entire vapor chamber 1 is not particularly limited, it is preferably 50 ⁇ m or more and 500 ⁇ m or less.
  • the planar shape of the housing 10 as seen from the thickness direction Z is a shape having first and second sides forming an internal angle of 180° or more, and is preferably a polygonal shape.
  • the shape is not limited as long as it has vertices forming an interior angle of 180° or more.
  • it may be L-shaped, C-shaped (U-shaped), or stepped.
  • the housing 10 may have a space (through-hole) inside the planar figure.
  • the planar shape of the housing 10 may be a shape according to the use of the vapor chamber, the shape of the location where the vapor chamber is installed, and other parts existing nearby.
  • the angle formed by the first side and the second side may be 180° or more and less than 360°, for example, 225° or more and 315° or less. A specific example of the planar shape of the housing 10 will be described later.
  • the heat spreading device of the present invention further comprises a capillary structure in the inner space of the housing.
  • a first portion of the capillary structure is adjacent to the first side or the second side, and a second portion of the capillary structure is in contact with the wick.
  • the capillary structure has a first end and a second end and is shaped to extend from the first end to the second end.
  • the first end corresponds to the first part of the capillary structure and the second end corresponds to the second part of the capillary structure.
  • the capillary structure is a plurality of grooves provided on at least one of the first inner wall surface and the second inner wall surface of the housing.
  • the housing has an evaporator for evaporating the working medium, and the end of the wick is located in the evaporator.
  • the first side is positioned farther from the evaporator than the second side.
  • the capillary structure is shaped having a first end and a second end and extending from the first end to the second end. The first end corresponds to the first part of the capillary structure and the second end corresponds to the second part of the capillary structure.
  • the first end, which is the first part of the capillary structure, is in contact with the first side
  • the second end, which is the second part of the capillary structure is in contact with one wick.
  • the wick includes a first porous body and a second porous body.
  • a liquid phase flow path is formed by providing a space between the first porous body and the second porous body along the direction in which the first porous body and the second porous body extend.
  • the first porous body and the second porous body for example, metal porous membranes, meshes, non-woven fabrics, sintered bodies, and other porous bodies formed by etching or metal working are used.
  • the mesh that is the material of the wick may be composed of, for example, a metal mesh, a resin mesh, or a surface-coated mesh thereof, preferably a copper mesh, a stainless steel (SUS) mesh, or a polyester mesh.
  • the sintered body that is the material of the wick may be composed of, for example, a metal porous sintered body or a ceramic porous sintered body, preferably a porous sintered body of copper or nickel.
  • Other porous bodies used as wick materials may be composed of, for example, metal porous bodies, ceramic porous bodies, resin porous bodies, or the like.
  • a mesh, a nonwoven fabric, and a sintered body are also included in the porous body in this specification.
  • FIG. 2A is a plan view schematically showing an example of the vapor chamber according to the first embodiment of the invention.
  • FIG. 2B is a cross-sectional view along line AA of FIG. 2A
  • FIG. 2C is a cross-sectional view along line BB of FIG. 2A
  • FIG. 2D is a cross-sectional view along line CC of FIG. 2A.
  • any plan view of the vapor chamber as shown in FIG. 2A is a schematic diagram showing the internal structure of the vapor chamber, and is a diagram showing through either the first sheet or the second sheet. It can be said that there is.
  • the housing 10 has a first inner wall surface 11a and a second inner wall surface 12a facing each other in the thickness direction Z, as shown in FIGS.
  • the housing 10 is preferably constructed from opposed first and second sheets 11 and 12 joined at their outer edges.
  • the vapor chamber 1 is further arranged between the working medium 20 enclosed in the internal space of the housing 10 and the first inner wall surface 11a and the second inner wall surface 12a of the housing 10. and a wick 30 that
  • the wick 30 includes a first porous body 41 and a second porous body 42 .
  • These porous bodies function as wicks that transport the working medium 20 by capillary force.
  • the first porous body 41 and the second porous body 42 constituting the wick 30 have portions in contact with the first inner wall surface 11a and the second inner wall surface 12a of the housing 10 along the direction perpendicular to the thickness direction. .
  • the thickness of the first porous body 41 and the second porous body 42 that constitute the wick 30 is approximately the same as the thickness of the internal space of the housing.
  • FIGS. 2A and 2B show vapor flow paths 50 through which vapor-phase working medium 20 flows between adjacent wicks 30 .
  • the direction in which the first porous body 41 and the second porous body 42 extend in this embodiment, the length direction Y, the rightmost wick
  • a liquid phase flow path 51 is formed by providing an interval along the width direction X).
  • the liquid-phase channel 51 can be used as a channel through which the liquid-phase working medium 20 flows.
  • the housing 10 is provided with an evaporation portion EP for evaporating the enclosed working medium 20 .
  • a portion of the internal space of the housing 10 that is in the vicinity of the heat source HS and is heated by the heat source HS corresponds to the evaporating section EP.
  • the working medium 20 is not particularly limited as long as it can cause a gas-liquid phase change in the environment inside the housing 10.
  • water, alcohols, CFC alternatives, etc. can be used.
  • the working medium is an aqueous compound, preferably water.
  • the wick 30 extends from one end located in the evaporation part EP to the other end in plan view from the thickness direction Z. As shown in FIG. The other end of the wick is a portion away from the evaporator EP and serves as a condensing portion for condensing the evaporated working medium.
  • the planar shape of the housing 10 shown in FIG. 2A is a so-called L shape. Moreover, the planar shape of the housing 10 shown in FIG. 2A is a shape having a first side 61 and a second side 62 forming an internal angle of 180° or more. The internal angle between the first side 61 and the second side 62 is an angle indicated by ⁇ in FIG. 2A, which is 270° in this drawing. The first side 61 is a side located farther from the evaporating part EP than the second side 62 is. The wick 30 is not formed near the first side 61 and the second side 62 .
  • the wick 30 is not formed in the vicinity of the first side 61, and due to the shape of the housing 10, depending on the direction in which the vapor chamber is used (the direction with respect to the direction in which gravity is applied), liquid pools may form. It may occur near the first side 61 . Therefore, the capillary structure 70 exists in the inner space of the housing 10 close to the first side 61 . Due to the existence of the capillary structure 70 , it is possible to guide the liquid pool generated in the vicinity of the first side 61 to the wick 30 . As a result, the amount of liquid transported can be improved, and the maximum heat transport amount can be improved. Details of the capillary structure are described below.
  • the capillary structure 70 is a liquid channel through which the liquid-phase working medium 20 flows, but is different from the wick 30 . Since the wick 30 contacts both the first inner wall surface 11a and the second inner wall surface 12a, it is configured to divide the steam flow path. On the other hand, the capillary structure 70 is configured so as not to divide the vapor flow path.
  • Each capillary structure 70 has a first end 71 and a second end 72 .
  • a first end 71 of the capillary structure 70 is adjacent to the first side 61 .
  • Proximity here means that the first part (first end) of the capillary structure is positioned closer to the first side than the wick positioned closest to the first side.
  • the wick is positioned closer to the first side where the liquid pool is formed than the first part of the capillary structure, the liquid pool is absorbed by the wick instead of the capillary structure, so the capillary structure is provided. has no meaning. Therefore, the capillary structure should be positioned close to the first side.
  • the first end 71 of the capillary structure 70 may be in contact with the first side 61 .
  • the first end 71 of the capillary structure 70 is close to the first side 61 . It may be in contact with the second side 62 .
  • FIG. 2A shows a configuration in which the second end 72 of the capillary structure 70 contacts one wick 30 .
  • FIG. 2A shows an arrow F that introduces the liquid-phase working medium 20 existing near the first side 61 to the wick 30 through the capillary structure 70 .
  • the first end 71 of the capillary structure 70 is close to the first side 61 or the second side 62 and the second end 72 is in contact with the wick 30, the first side 61 Alternatively, it absorbs the liquid pool generated near the second side 62 .
  • the liquid-phase working medium 20 can be introduced into the wick 30 by using the inside of the capillary structure 70 as a liquid channel and allowing the liquid-phase working medium 20 to reach the second end 72 .
  • the liquid-phase working medium 20 introduced into the wick 30 is transported by the wick 30 to the evaporator EP. That is, it is possible to solve the problem that the maximum amount of heat transport is reduced due to the effect of the liquid pool generated at the position where the wick 30 is not formed.
  • the capillary structure may be a groove provided in at least one of the first inner wall surface and the second inner wall surface of the housing.
  • 2C and 2D show an example in which the capillary structure 70 is a groove provided in the second inner wall surface 12a of the housing 10.
  • FIG. Such a capillary structure, which is a groove provided on the inner wall surface of the housing, is also called a microchannel in this specification.
  • FIG. 2C shows the shape of the microchannel 70 in the portion where the wick 30 is absent.
  • FIG. 2D shows the shape of the microchannel 70 in the portion overlapping the wick 30 (second porous body 42).
  • the microchannel 70 is a groove formed by recessing the second sheet 12 forming the housing 10 in the thickness direction.
  • Methods for forming grooves in the second sheet 12 include methods such as etching, pressing, and machining, and the methods are not particularly limited.
  • the cross-sectional shape of the microchannel 70 shown in FIGS. 2C and 2D is rectangular, the shape of the microchannel may be other shapes. Examples of other shapes of microchannels will be described later.
  • the depth of the grooves of the microchannel 70 is not particularly limited, it is preferably 10 ⁇ m or more and 30 ⁇ m or less.
  • the width of the groove of the microchannel 70 is not particularly limited, but is preferably 30 ⁇ m or more and 100 ⁇ m or less.
  • the microchannel is preferably provided on the inner wall surface of the sheet on the side where the heat source HS is not arranged.
  • the heat source HS is arranged on the first sheet 11 side, so the microchannels 70 are preferably provided by forming grooves in the second sheet 12 .
  • the orientation of the capillary structure is different from that in the first embodiment.
  • the orientation of the capillary structure 70 is oblique with respect to the width direction X and the length direction Y of the vapor chamber, but the orientation of the capillary structure is different in the second embodiment.
  • 3A and 3B are plan views schematically showing examples of vapor chambers having different orientations of capillary structures.
  • the orientation of the capillary structure 70A is parallel to the width direction X of the vapor chamber.
  • a liquid flow path can be formed in which the distance from the vicinity of the first side (liquid pool in which the liquid-phase working medium 20 is accumulated) to the evaporator EP is the shortest, which is the combination of the capillary structure 70A and the wick 30. It's like That is, the orientation of the capillary structure 70A is not determined from the viewpoint of being parallel to the width direction X of the vapor chamber. The shorter the distance from the reservoir in which the liquid-phase working medium 20 is accumulated to the evaporator EP, the greater the maximum heat transfer amount.
  • the orientation of the capillary structure 70B is parallel to the longitudinal direction Y of the vapor chamber.
  • the length of the capillary structure 70B is the shortest. That is, the direction of the capillary structure 70B is determined so as to connect the vicinity of the first side (liquid reservoir in which the liquid-phase working medium 20 is accumulated) to the nearest wick 30 by the shortest path.
  • the orientation of the capillary structure 70A is not determined from the viewpoint of being parallel to the longitudinal direction Y of the vapor chamber.
  • the transport amount of the liquid-phase working medium by the capillary structure is smaller than that by the wick.
  • the capillary structure it is preferable to shorten the distance over which the liquid is transported by the capillary structure so that the liquid reaches the wick as quickly as possible.
  • the third embodiment of the present invention differs from the first embodiment in that the second end of the capillary structure is in contact with a plurality of wicks.
  • the second end 72 of the capillary structure 70 was in contact with one wick 30, whereas in the third embodiment the second end of the capillary structure is in contact with multiple wicks.
  • FIG. 4 is a plan view schematically showing an example of a vapor chamber in which the second end of the capillary structure is in contact with multiple wicks.
  • the second end 72 of the capillary structure 70C is in contact with a plurality of wicks, namely wick 30a, wick 30b and wick 30c.
  • the capillary structure 70C is in contact with all the wicks provided in the vapor chamber.
  • the second end (second portion) of the capillary structure shall mean the entire portion where the capillary structure is in contact with the plurality of wicks.
  • the liquid-phase working medium can be transported from the capillary structure to each wick, thereby improving heat uniformity.
  • the planar shape of the housing is different from that in the first embodiment.
  • the planar shape of the housing is L-shaped, but as the fourth embodiment, a housing having another shape is exemplified.
  • 5A, 5B, 5C, 5D, and 5E are plan views schematically showing examples of vapor chambers having different planar shapes of casings.
  • the planar shape of the housing 10A is partially stepped.
  • the vapor chamber 4A shown in FIG. 5A has a stepped shape at the lower right portion of the housing 10A.
  • the stepped portion has a first side and a second side, and the interior angle ⁇ between the first side 61A and the second side 62A and the interior angle ⁇ between the first side 61B and the second side 62B are both 270°. ing.
  • a capillary structure 70D is adjacent to the first side 61A, and a capillary structure 70E is adjacent to the first side 61B. Capillary structure 70D and capillary structure 70E are each in contact with the same wick 30d.
  • liquid pools may occur at multiple locations, so providing a capillary structure at each location can improve the maximum heat transfer amount.
  • a vapor chamber 4B shown in FIG. 5B has a T-shaped planar shape of a housing 10B.
  • the T-shape has a first side and a second side on the right side and the left side, respectively. are both 270°.
  • a capillary structure 70F is adjacent to the first side 61C, and a capillary structure 70G is adjacent to the first side 61D.
  • the capillary structure 70F is in contact with the wick 30e, and the capillary structure 70G is in contact with the wick 30f.
  • liquid pools may occur at multiple locations, so by providing a capillary structure at each location, the maximum amount of heat transport can be improved.
  • a vapor chamber 4C shown in FIG. 5C has a housing 10C with a planar shape having a space 13 in the plane, that is, a donut shape. Specifically, it is a shape having a quadrilateral space in a quadrilateral plane.
  • the upper side of the space 13 is the first side 61E
  • the right side is the second side 62E
  • the left side is the second side 62F.
  • the interior angle ⁇ between the first side 61E and the second side 62E and the interior angle ⁇ between the first side 61E and the second side 62F are both 270°.
  • a first portion 71' of the capillary structure 70H shown in FIG. 5C is a position close to the first side 61E and is not the end of the capillary structure 70H.
  • One end of the capillary structure 70H is in contact with the wick 30g, and the other end is in contact with the wick 30h.
  • Both the end portion of the capillary structure 70H contacting the wick 30g and the end portion of the capillary structure 70H contacting the wick 30h are the second portion 72' of the capillary structure 70H.
  • liquid pools may occur near the sides that make up the space. Heat transport can be improved.
  • a vapor chamber 4D shown in FIG. 5D has a C-shaped planar shape of a housing 10D.
  • the drawing shows a shape in which the corners of the C shape are right angles. It has a second side 62G at a position corresponding to the bottom (left side) of the C shape. It has a first side 61G on the upper side and a first side 61H on the lower side.
  • the internal angle between the upper first side 61G and the second side 62G and the internal angle between the lower first side 61H and the second side 62G are both 270°.
  • a capillary structure 70I is close to the first side 61G, and a capillary structure 70J is close to the first side 61H.
  • Capillary structure 70I and capillary structure 70J are in contact with the same wick 30i.
  • Capillary structure 70I contacts wick 30i on the upper side of wick 30i, and capillary structure 70J contacts wick 30i on the lower side of wick 30i.
  • the orientation of the capillary structure 70I is parallel to the width direction X of the vapor chamber, and the orientation of the capillary structure 70J is oblique to the width direction X and length direction Y of the vapor chamber.
  • the orientations of the plurality of capillary structures are different, but when the capillary structures are provided at a plurality of locations, the orientations may be the same or different. This also applies to other embodiments.
  • liquid pools may occur at a plurality of locations. By providing capillary structures at each location, the maximum amount of heat transport can be improved.
  • FIG. 5D the locations of the liquid pools differ depending on the orientation of the vapor chamber. Actually, in the vapor chamber shown in FIG. 5D, when the Y direction faces downward in the vertical direction, a liquid pool occurs near the first side 61G, but near the first side 61H. No liquid stagnant part occurs.
  • a vapor chamber 4E shown in FIG. 5E has a housing 10E whose planar shape is a crank shape.
  • both the internal angle between the first side 61I and the second side 62I and the internal angle between the first side 61J and the second side 62J are 270°.
  • the capillary structure 70K is close to the first side 61I, and the capillary structure 70L is close to the first side 61J. Capillary structure 70K is in contact with wick 30j and capillary structure 70L is in contact with wick 30k.
  • liquid pools may occur at a plurality of locations. By providing capillary structures at each location, the maximum amount of heat transport can be improved.
  • FIG. 5E the locations where the liquid pools are formed differ depending on the orientation of the vapor chamber. Actually, in the vapor chamber shown in FIG. 5E, when the Y direction faces vertically downward, a liquid pool occurs near the first side 61I, but the liquid accumulates near the first side 61J. No stagnant part occurs.
  • the cross-sectional shape of microchannels differs from that in the first embodiment.
  • the microchannel 70 has a rectangular cross-sectional shape, but the fifth embodiment exemplifies a microchannel of another shape.
  • 6A, 6B, and 6C are cross-sectional views schematically showing examples in which microchannels have different cross-sectional shapes. These figures show the shape of the microchannel in the portion overlapping with the wick 30 (second porous body 42), as in FIG. 2D.
  • FIG. 6A shows a microchannel 70a having a semicircular cross section.
  • FIG. 6B shows a microchannel 70b having a triangular cross section.
  • FIG. 6C shows a microchannel 70c having a trapezoidal cross section.
  • Each microchannel having such a shape is a groove formed by recessing the second sheet 12 forming the housing 10 in the thickness direction, and all of them act as liquid channels.
  • the depth of the groove in the microchannel having such a shape is the depth measured at the deepest position of the groove.
  • the depth of the groove is the radius of the circle, and in the case of the triangular shape shown in FIG. height).
  • the depth of the groove is the distance between the top and bottom sides.
  • the width of the groove is the width of the portion where the microchannel is exposed.
  • the width of the groove is the diameter of the circle, and in the case of the triangular shape shown in FIG. 6B, the width of the groove is the length of the base.
  • the width of the groove is the length of the lower side.
  • both the first inner wall surface and the second inner wall surface of the housing are provided with microchannels, which are grooves provided in the inner wall surface of the housing.
  • FIG. 7 is a cross-sectional view schematically showing an example in which microchannels are provided on both the first inner wall surface and the second inner wall surface of the housing. As in FIG. 2D, this figure shows the shape of the microchannel in the portion overlapping with the wick 30 (second porous body 42).
  • FIG. 7 shows an example in which microchannels 70a are provided on both the first inner wall surface 11a and the second inner wall surface 12a of the housing.
  • the microchannel 70a is a microchannel having a semicircular cross section shown in FIG. 6A.
  • the cross-sectional shape of the microchannel provided on the first inner wall surface 11a and the shape of the microchannel provided on the second inner wall surface 12a are the same semicircular shape, but they may be different shapes.
  • the number of microchannels is the same (five), but the number may be different.
  • the width and depth of the microchannel and the spacing between the microchannels are the same in FIG. 7, they may be different.
  • Each microchannel shown in the fifth and sixth embodiments is a groove formed by recessing the first sheet or the second sheet in the thickness direction.
  • Methods for forming grooves in the first sheet or the second sheet include etching, pressing, machining, and the like, and the method is not particularly limited.
  • the seventh embodiment of the present invention differs from the first embodiment in that the capillary structure is not a groove provided on the inner wall surface of the housing.
  • the seventh embodiment exemplifies a form in which the capillary structure is not a groove provided on the inner wall surface of the housing.
  • FIG. 8A is a perspective view schematically showing an example in which a space sandwiched by additional parts is used as a capillary structure.
  • FIG. 8B is a perspective view schematically showing an example in which a porous body has a capillary structure.
  • FIG. 8A shows a form in which a plurality of additional parts 81 of the housing are provided on the first inner wall surface 11 a of the first sheet 11 .
  • a plurality of additional portions 81 extend toward the wick 30 (the first porous body 41 is shown in FIG. 8A).
  • a predetermined space is provided between the adjacent additional portions 81 , and this space becomes the capillary structure 80 .
  • the capillary structure 80 has such a depth and width that it can function as a liquid channel through which the liquid-phase working medium 20 flows by capillary force.
  • the depth of the space is preferably 5 ⁇ m or more and 50 ⁇ m or less, and the width of the space is preferably 5 ⁇ m or more and 100 ⁇ m or less.
  • the additional portion 81 can be a portion in which the thickness of the first inner wall surface 11a of the first sheet 11 is increased by an additive method (pattern plating). Alternatively, it may be a portion that is locally increased in thickness by attaching some material to the first inner wall surface 11a of the first sheet 11 .
  • the additional portion formed by the additive method is preferably made of the same material as the housing, and preferably the housing is made of copper and the additional portion is also made of copper. If the additional portion 81 is too thick, the steam flow path will be divided, resulting in a decrease in heat uniformity. Therefore, the thickness of the additional portion 81 is preferably 30% or less of the thickness of the internal space.
  • FIG. 8B shows a mode in which a capillary structure 90 made of a porous material is provided on the first inner wall surface 11a of the first sheet 11.
  • FIG. One end (second end) of the capillary structure 90 is in contact with the wick 30 (the first porous body 41 is shown in FIG. 8A).
  • the capillary structure 90 is made of a porous body, and the same materials as those of the first and second porous bodies that constitute the wick can be used. If the capillary structure 90 is too thick, it cuts off the steam flow path, resulting in a decrease in heat uniformity. Therefore, the thickness of the capillary structure 90 is preferably 30% or less of the thickness of the internal space. Also, the capillary structure 90 is not in contact with both the first inner wall surface and the second inner wall surface of the housing. Therefore, it is distinguished from the first porous body and the second porous body that constitute the wick.
  • FIG. 8B shows one plate-like member as the capillary structure 90, it may have a structure in which a plurality of rod-like members are arranged, and its shape is not particularly limited. Also, the width of the capillary structure 90 is not limited.
  • a fiber bundle in which fibers are linearly bundled may be used as the capillary structure.
  • FIG. 9A is a plan view schematically showing an example of a vapor chamber in which pillars are provided inside a housing.
  • FIG. 9B is a cross-sectional view taken along line DD of FIG. 9A.
  • pillars 11b are provided inside the housing 10F.
  • the pillars 11 b are columns provided at predetermined intervals on the first inner wall surface 11 a of the first sheet 11 and may be integrated with the first sheet 11 . For example, it may be formed by etching the first inner wall surface 11 a of the first sheet 11 .
  • the gap between the first sheet 11 and the second sheet 12 can be maintained at the height of the pillars 11b or more, thereby preventing the internal space from becoming narrow (thin).
  • FIG. 9B shows an example in which a capillary structure 70 is provided on the second inner wall surface 12a of the second sheet 12. As shown in FIG.
  • the formation of the capillary structure and the formation of the pillar can be performed separately, which is advantageous in terms of the process. Forming the capillary structure and the pillars on the same sheet complicates the process.
  • a pillar is formed by etching a copper foil having a thickness similar to that of the internal space to be formed
  • the portion that was not etched can be removed.
  • another capillary structure is to be formed as a groove on the same copper foil, it is necessary to draw a separate groove pattern for the capillary structure so as not to interfere with the arrangement of the pillars. Only the groove portion needs to be etched to a different depth than the etching for forming the pillars. Therefore, the process becomes complicated.
  • pillars are provided on the inner wall surface of the first sheet, but unlike the above embodiment, pillars may be provided on the inner wall surface of the second sheet.
  • the capillary structure is preferably provided on the inner wall surface of the first sheet.
  • the ninth embodiment of the present invention differs from the first embodiment in the form of the wick. Another example of a wick will be described.
  • the wick includes a first porous body and a second porous body, and in the wick, between the first porous body and the second porous body, the direction in which the first porous body and the second porous body extend
  • the wick may have a form in which it does not have a liquid-phase flow path.
  • FIG. 10 is a plan view schematically showing an example of a vapor chamber in which the wick does not have a liquid phase flow path.
  • wick 130 is a single porous body and does not include first porous body 41 and second porous body . Therefore, in the vapor chamber 6 , the liquid channel 51 is not formed, but the liquid channel is formed by one porous body forming the wick 130 .
  • the wick in each embodiment is not limited to a porous body.
  • a fiber bundle obtained by linearly bundling fibers can be used as the wick.
  • a braided fiber bundle can be used as the fiber bundle.
  • the fibers for example, metal wires such as copper, aluminum, and stainless steel wires, and non-metal wires such as carbon fibers and glass fibers can be used. Among them, a metal wire is preferable because of its high thermal conductivity.
  • a fiber bundle can be obtained by bundling about 200 copper wires with a diameter of about 0.03 mm.
  • the heat diffusion device of the present invention can be mounted on electronic equipment for the purpose of heat dissipation. Therefore, it can be used as an electronic device comprising the heat diffusion device of the present invention and an electronic component attached to the outer wall surface of the housing constituting the heat diffusion device.
  • the heat diffusion device of the present invention operates independently without the need for external power, and utilizes the latent heat of vaporization and latent heat of condensation of the working medium to diffuse heat two-dimensionally and at high speed. Therefore, an electronic device equipped with the heat diffusion device of the present invention can effectively dissipate heat in a limited space inside the electronic device.
  • the electronic component corresponds to the heat source HS shown in FIG.
  • Examples of electronic devices include smartphones, tablet terminals, laptops, game machines, and wearable devices.
  • Electronic parts that are objects to be cooled include, for example, heat-generating elements such as central processing units (CPUs), light-emitting diodes (LEDs), and power semiconductors.
  • CPUs central processing units
  • LEDs light-emitting diodes
  • power semiconductors power semiconductors
  • the electronic components are preferably attached to the outer wall surface located on the opposite side of the first inner wall surface of the housing.
  • the housing has an evaporator on the first inner wall surface, and the electronic component is positioned in the evaporator when viewed from the thickness direction.
  • the electronic components may be attached directly to the outer wall surface of the housing, or may be attached via other members such as adhesives, sheets, and tapes with high thermal conductivity.
  • the heat diffusion device of the present invention can be used for a wide range of applications in fields such as personal digital assistants. For example, it can be used to lower the temperature of a heat source such as a CPU and extend the operating time of electronic equipment, and can be used in smartphones, tablet terminals, laptop computers, and the like.

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Abstract

A vapor chamber 1, which is an embodiment of this thermal diffusion device, comprises: a casing 10 having a first inner wall surface 11a and a second inner wall surface 12a that are opposed to each other in a thickness direction; an operating medium 20 enclosed in an inner space of the casing 10; and a wick 30 located in the inner space of the casing 10. The wick 30 extends in a direction perpendicular to the thickness direction and has a portion in contact with the first inner wall surface 11a and the second inner wall surface 12a of the casing 10. A vapor flow channel 50 is formed in the inner space of the casing 10. The planar shape of the casing 10 as viewed in the thickness direction has a first side 61 and a second side 62 that form an interior angle equal to or greater than 180 degrees. In the inner space of the casing 10, further provided is a capillary structure 70 having a first part 71 close to the first side 61 or to the second side 62, and a second part 72 in contact with the wick 30.

Description

熱拡散デバイスheat spreading device

 本発明は、熱拡散デバイスに関する。 The present invention relates to heat diffusion devices.

 近年、素子の高集積化及び高性能化による発熱量が増加している。また、製品の小型化が進むことで、発熱密度が増加するため、放熱対策が重要となっている。この状況はスマートフォン及びタブレットなどのモバイル端末の分野において特に顕著である。熱対策部材としては、グラファイトシートなどが用いられることが多いが、その熱輸送量は十分ではないため、様々な熱対策部材の使用が検討されている。中でも、非常に効果的に熱を拡散させることが可能である熱拡散デバイスとして、面状のヒートパイプであるベーパーチャンバーの使用の検討が進んでいる。 In recent years, the amount of heat generated has increased due to the high integration and high performance of devices. In addition, as products become smaller, heat generation density increases, so heat dissipation measures have become important. This situation is particularly pronounced in the field of mobile terminals such as smartphones and tablets. A graphite sheet or the like is often used as a heat countermeasure member, but its heat transfer capacity is not sufficient, so the use of various heat countermeasure members has been investigated. Among them, as a heat diffusion device capable of diffusing heat very effectively, the use of a vapor chamber, which is a planar heat pipe, is being studied.

 ベーパーチャンバーは、筐体の内部に、作動媒体と、毛細管力によって作動媒体を輸送するウィックとが封入された構造を有する。上記作動媒体は、発熱素子からの熱を吸収する蒸発部において発熱素子からの熱を吸収してベーパーチャンバー内で蒸発した後、ベーパーチャンバー内を移動し、冷却されて液相に戻る。液相に戻った作動媒体は、ウィックの毛細管力によって再び発熱素子側の蒸発部に移動し、発熱素子を冷却する。これを繰り返すことにより、ベーパーチャンバーは外部動力を有することなく自立的に作動し、作動媒体の蒸発潜熱及び凝縮潜熱を利用して、二次元的に高速で熱を拡散することができる。 The vapor chamber has a structure in which a working medium and a wick that transports the working medium by capillary force are sealed inside the housing. The working medium absorbs heat from the heating element in the evaporating portion that absorbs heat from the heating element, evaporates in the vapor chamber, moves in the vapor chamber, is cooled, and returns to the liquid phase. The working medium that has returned to the liquid phase moves again to the evaporating portion on the heating element side by the capillary force of the wick, and cools the heating element. By repeating this, the vapor chamber can operate independently without external power, and heat can be two-dimensionally diffused at high speed by utilizing the latent heat of vaporization and latent heat of condensation of the working medium.

 特許文献1には、第1金属シート又は第2金属シートの周縁の全周にわたって、作動液が通る周縁液流路部が形成されたベーパーチャンバーが開示されている。 Patent Literature 1 discloses a vapor chamber in which a peripheral fluid passage portion through which the working fluid flows is formed over the entire peripheral edge of the first metal sheet or the second metal sheet.

特開2019-66175号公報JP 2019-66175 A

 特許文献1に記載されたベーパーチャンバーでは、液状の作動液が通る液流路部(ウィック)が、ベーパーチャンバーを平面視した形状において全面に形成されている(特許文献1の図4参照)。
 また、ベーパーチャンバーを平面視した形状が長方形であり、熱源が長方形の中心に位置することを前提にしたウィックの形状が示されている(特許文献1の各図参照)。
In the vapor chamber described in Patent Document 1, a liquid flow path portion (wick) through which the liquid working fluid passes is formed on the entire surface of the vapor chamber when viewed from above (see FIG. 4 of Patent Document 1).
Further, the shape of the wick is shown on the premise that the shape of the vapor chamber when viewed from above is rectangular, and the heat source is positioned at the center of the rectangle (see each figure of Patent Document 1).

 ベーパーチャンバーを平面視した形状において、ウィックが全面に形成されていると、作動液の蒸気が通る蒸気流路の割合が相対的に低下してしまう。蒸気が通る部分の割合が低いと最大熱輸送量が低下するという問題が生じる。
 また、蒸気流路がウィックにより分断されるので均熱性が低下するという問題が生じる。さらに、ウィックを全面に形成すると、ウィックの形成に係るコストが増大するという問題も生じる。
If the wick is formed on the entire surface of the vapor chamber when viewed from above, the proportion of the vapor flow path through which the vapor of the working fluid passes is relatively reduced. A problem arises that the maximum heat transfer rate decreases when the percentage of the portion through which the steam passes is low.
In addition, since the steam flow path is divided by the wick, there arises a problem that uniformity of heat is lowered. Furthermore, forming the wick on the entire surface also raises the problem that the cost associated with the formation of the wick increases.

 そこで、ウィックを全面に形成するのではなく、必要と思われる部分だけにウィックを形成することが検討されている。
 ウィックを全面に形成しない場合であり、かつ、ベーパーチャンバーを平面視した形状が長方形ではなく、180°以上の内角を形成する第1辺と第2辺を有する形状(以下、異形形状ともいう)の場合を考える。この場合、ベーパーチャンバーが使用される際の向き(重力の加わる方向に対する向き)によっては、液溜まりが上記第1辺又は第2辺の近傍に生じてしまう。第1辺又は第2辺の近傍に生じた液溜まりはウィックにより回収できないので、液体の輸送量が少なくなり、最大熱輸送量が低下するという問題が生じる。
Therefore, instead of forming the wick over the entire surface, it is being considered to form the wick only where it is considered necessary.
This is the case where the wick is not formed on the entire surface, and the shape of the vapor chamber when viewed from above is not a rectangle, but a shape having first and second sides forming an interior angle of 180° or more (hereinafter also referred to as a deformed shape). Consider the case of In this case, depending on the direction in which the vapor chamber is used (orientation relative to the direction in which gravity is applied), a liquid pool may occur near the first side or the second side. Liquid pools formed near the first side or the second side cannot be collected by the wick, so the amount of liquid transported is reduced, resulting in a problem of a decrease in the maximum heat transport amount.

 なお、上記の問題は、ベーパーチャンバーに限らず、ベーパーチャンバーと同様の構成によって熱を拡散させることが可能な熱拡散デバイスに共通する問題である。 It should be noted that the above problem is not limited to vapor chambers, but is common to heat diffusion devices capable of diffusing heat with a configuration similar to that of vapor chambers.

 本発明は、上記の問題を解決するためになされたものであり、蒸気流路の割合を高くして、最大熱輸送量を高くし、均熱性も高くすることのできる熱拡散デバイスを提供することを目的とする。 The present invention has been made to solve the above problems, and provides a heat diffusion device that can increase the maximum heat transfer rate and heat uniformity by increasing the ratio of steam flow paths. for the purpose.

 本発明の熱拡散デバイスは、厚さ方向に対向する第1内壁面及び第2内壁面を有する筐体と、前記筐体の内部空間に封入された作動媒体と、前記筐体の内部空間に配置されたウィックと、を備え、前記ウィックは、前記厚さ方向に垂直な方向に沿い、前記筐体の前記第1内壁面及び前記第2内壁面に接する部分を有し、前記筐体の内部空間には、蒸気流路が形成されており、前記厚さ方向から見た前記筐体の平面形状は、180°以上の内角を形成する第1辺と第2辺を有する形状であり、前記筐体の内部空間には、前記第1辺又は前記第2辺に近接する第1部及び前記ウィックに接している第2部を有するキャピラリーストラクチャーをさらに備える。 A heat diffusion device of the present invention comprises a housing having a first inner wall surface and a second inner wall surface facing each other in a thickness direction, a working medium enclosed in the internal space of the housing, and a and a wick disposed, the wick having a portion in contact with the first inner wall surface and the second inner wall surface of the housing along a direction perpendicular to the thickness direction, and A steam flow path is formed in the internal space, and the planar shape of the housing viewed from the thickness direction is a shape having first and second sides forming an interior angle of 180° or more, The interior space of the housing further includes a capillary structure having a first portion adjacent to the first side or the second side and a second portion in contact with the wick.

 本発明によれば、蒸気流路の割合を高くして、最大熱輸送量を高くし、均熱性も高くすることのできる熱拡散デバイスを提供することができる。 According to the present invention, it is possible to provide a heat diffusion device that can increase the proportion of the steam flow path, increase the maximum heat transfer amount, and improve the heat uniformity.

図1は、本発明の熱拡散デバイスの一例を模式的に示す斜視図である。FIG. 1 is a perspective view schematically showing an example of the heat diffusion device of the present invention. 図2Aは、本発明の第1実施形態に係るベーパーチャンバーの一例を模式的に示す平面図である。FIG. 2A is a plan view schematically showing an example of the vapor chamber according to the first embodiment of the invention. FIG. 図2Bは、図2AのA-A線断面図である。FIG. 2B is a cross-sectional view taken along line AA of FIG. 2A. 図2Cは、図2AのB-B線断面図である。FIG. 2C is a cross-sectional view taken along line BB of FIG. 2A. 図2Dは、図2AのC-C線断面図である。FIG. 2D is a cross-sectional view taken along line CC of FIG. 2A. 図3Aは、キャピラリーストラクチャーの向きが異なるベーパーチャンバーの一例を模式的に示す平面図である。FIG. 3A is a plan view schematically showing an example of vapor chambers with different orientations of capillary structures. 図3Bは、キャピラリーストラクチャーの向きが異なるベーパーチャンバーの一例を模式的に示す平面図である。FIG. 3B is a plan view schematically showing an example of vapor chambers with different orientations of capillary structures. 図4は、キャピラリーストラクチャーの第2端部が複数のウィックに接しているベーパーチャンバーの一例を模式的に示す平面図である。FIG. 4 is a plan view schematically showing an example of a vapor chamber in which the second end of the capillary structure is in contact with multiple wicks. 図5Aは、筐体の平面形状が異なるベーパーチャンバーの一例を模式的に示す平面図である。FIG. 5A is a plan view schematically showing an example of a vapor chamber having a housing with a different planar shape. 図5Bは、筐体の平面形状が異なるベーパーチャンバーの一例を模式的に示す平面図である。FIG. 5B is a plan view schematically showing an example of a vapor chamber having a housing with a different planar shape. 図5Cは、筐体の平面形状が異なるベーパーチャンバーの一例を模式的に示す平面図である。FIG. 5C is a plan view schematically showing an example of a vapor chamber having a housing with a different planar shape. 図5Dは、筐体の平面形状が異なるベーパーチャンバーの一例を模式的に示す平面図である。FIG. 5D is a plan view schematically showing an example of a vapor chamber having a housing with a different planar shape. 図5Eは、筐体の平面形状が異なるベーパーチャンバーの一例を模式的に示す平面図である。FIG. 5E is a plan view schematically showing an example of a vapor chamber having a housing with a different planar shape. 図6Aは、マイクロ流路の断面形状が異なる例を模式的に示す断面図である。FIG. 6A is a cross-sectional view schematically showing an example in which microchannels have different cross-sectional shapes. 図6Bは、マイクロ流路の断面形状が異なる例を模式的に示す断面図である。FIG. 6B is a cross-sectional view schematically showing an example in which microchannels have different cross-sectional shapes. 図6Cは、マイクロ流路の断面形状が異なる例を模式的に示す断面図である。FIG. 6C is a cross-sectional view schematically showing an example in which the microchannel has a different cross-sectional shape. 図7は、マイクロ流路が筐体の第1内壁面及び第2内壁面の両方に設けられた例を模式的に示す断面図である。FIG. 7 is a cross-sectional view schematically showing an example in which microchannels are provided on both the first inner wall surface and the second inner wall surface of the housing. 図8Aは、追加部により挟まれた空間をキャピラリーストラクチャーとする例を模式的に示す斜視図である。FIG. 8A is a perspective view schematically showing an example in which a space sandwiched by additional parts is used as a capillary structure. 図8Bは、多孔体をキャピラリーストラクチャーとする例を模式的に示す斜視図である。FIG. 8B is a perspective view schematically showing an example in which a porous body has a capillary structure. 図9Aは、筐体内にピラーが設けられているベーパーチャンバーの一例を模式的に示す平面図である。FIG. 9A is a plan view schematically showing an example of a vapor chamber in which pillars are provided inside a housing. 図9Bは、図9AのD-D線断面図である。FIG. 9B is a cross-sectional view taken along line DD of FIG. 9A. 図10は、ウィックが液相流路を有さないベーパーチャンバーの一例を模式的に示す平面図である。FIG. 10 is a plan view schematically showing an example of a vapor chamber in which the wick does not have a liquid phase flow path.

 以下、本発明の熱拡散デバイスについて説明する。
 しかしながら、本発明は、以下の構成に限定されるものではなく、本発明の要旨を変更しない範囲において適宜変更して適用することができる。なお、以下において記載する本発明の個々の望ましい構成を2つ以上組み合わせたものもまた本発明である。
The heat diffusion device of the present invention will be described below.
However, the present invention is not limited to the following configurations, and can be appropriately modified and applied without changing the gist of the present invention. It should be noted that a combination of two or more of the individual preferred configurations of the invention described below is also the invention.

 本発明の熱拡散デバイスは、厚さ方向に対向する第1内壁面及び第2内壁面を有する筐体と、前記筐体の内部空間に封入された作動媒体と、前記筐体の内部空間に配置されたウィックと、を備え、前記ウィックは、前記厚さ方向に垂直な方向に沿い、前記筐体の前記第1内壁面及び前記第2内壁面に接する部分を有し、筐体の内部空間には、蒸気流路が形成されており、前記厚さ方向から見た前記筐体の平面形状は、180°以上の内角を形成する第1辺と第2辺を有する形状である。 A heat diffusion device of the present invention comprises a housing having a first inner wall surface and a second inner wall surface facing each other in a thickness direction, a working medium enclosed in the internal space of the housing, and a and a wick disposed, the wick having a portion in contact with the first inner wall surface and the second inner wall surface of the housing along a direction perpendicular to the thickness direction, and the inside of the housing. A steam flow path is formed in the space, and the planar shape of the housing viewed from the thickness direction is a shape having first and second sides forming an internal angle of 180° or more.

 以下では、本発明の熱拡散デバイスの一実施形態として、ベーパーチャンバーを例にとって説明する。本発明の熱拡散デバイスは、ヒートパイプ等の熱拡散デバイスにも適用可能である。 A vapor chamber will be described below as an example of an embodiment of the heat diffusion device of the present invention. The heat diffusion device of the present invention can also be applied to heat diffusion devices such as heat pipes.

 図1は、本発明の熱拡散デバイスの一例を模式的に示す斜視図である。 FIG. 1 is a perspective view schematically showing an example of the heat diffusion device of the present invention.

 図1に示すベーパーチャンバー1は、気密状態に密閉された中空の筐体10を備える。図1に示すように、筐体10の外壁面には、発熱素子である熱源(heat source)HSが配置される。熱源HSとしては、電子機器の電子部品、例えば中央処理装置(CPU)等が挙げられる。 The vapor chamber 1 shown in FIG. 1 includes a hollow housing 10 that is hermetically sealed. As shown in FIG. 1, a heat source HS, which is a heating element, is arranged on the outer wall surface of the housing 10 . Examples of the heat source HS include electronic components of electronic equipment, such as a central processing unit (CPU).

 ベーパーチャンバー1は、全体として面状である。すなわち、筐体10は、全体として面状である。ここで、「面状」とは、板状及びシート状を包含し、幅方向Xの寸法(以下、幅という)及び長さ方向Yの寸法(以下、長さという)が厚さ方向Zの寸法(以下、厚さ又は高さという)に対して相当に大きい形状を意味する。例えば、幅及び長さが、厚さの10倍以上、好ましくは100倍以上である形状を意味する。 The vapor chamber 1 is planar as a whole. That is, the housing 10 is planar as a whole. Here, the “planar shape” includes a plate shape and a sheet shape, and the dimension in the width direction X (hereinafter referred to as width) and the dimension in the length direction Y (hereinafter referred to as length) are the thickness direction Z It means a shape that is considerably large with respect to its dimensions (hereafter referred to as thickness or height). For example, it means a shape whose width and length are 10 times or more, preferably 100 times or more, the thickness.

 ベーパーチャンバー1の大きさ、すなわち、筐体10の大きさは、特に限定されない。ベーパーチャンバー1の幅及び長さは、用途に応じて適宜設定することができる。ベーパーチャンバー1の幅及び長さは、各々、例えば、5mm以上500mm以下、20mm以上300mm以下又は50mm以上200mm以下である。ベーパーチャンバー1の幅及び長さは、同じであってもよく、異なっていてもよい。
 ベーパーチャンバーが異形形状であるとき、ベーパーチャンバーの幅及び長さは、幅方向及び長さ方向における最大値として定める。
The size of the vapor chamber 1, that is, the size of the housing 10 is not particularly limited. The width and length of the vapor chamber 1 can be appropriately set according to the application. The width and length of the vapor chamber 1 are, for example, 5 mm or more and 500 mm or less, 20 mm or more and 300 mm or less, or 50 mm or more and 200 mm or less. The width and length of the vapor chamber 1 may be the same or different.
When the vapor chamber has an irregular shape, the width and length of the vapor chamber are defined as maximum values in the width direction and the length direction.

 筐体10は、外縁部が接合された対向する第1シート11及び第2シート12から構成されることが好ましい。第1シート11及び第2シート12を構成する材料は、ベーパーチャンバーとして用いるのに適した特性、例えば熱伝導性、強度、柔軟性、可撓性等を有するものであれば、特に限定されない。第1シート11及び第2シート12を構成する材料は、好ましくは金属であり、例えば銅、ニッケル、アルミニウム、マグネシウム、チタン、鉄、又はそれらを主成分とする合金等であり、特に好ましくは銅である。第1シート11及び第2シート12を構成する材料は、同じであってもよく、異なっていてもよいが、好ましくは同じである。 The housing 10 is preferably composed of a first sheet 11 and a second sheet 12 that face each other and whose outer edges are joined. Materials for the first sheet 11 and the second sheet 12 are not particularly limited as long as they have properties suitable for use as a vapor chamber, such as thermal conductivity, strength, softness, and flexibility. The material that constitutes the first sheet 11 and the second sheet 12 is preferably a metal, such as copper, nickel, aluminum, magnesium, titanium, iron, or an alloy containing them as a main component, and copper is particularly preferable. is. The materials forming the first sheet 11 and the second sheet 12 may be the same or different, but are preferably the same.

 筐体10が第1シート11及び第2シート12から構成される場合、第1シート11及び第2シート12は、これらの外縁部において互いに接合される。かかる接合の方法は、特に限定されないが、例えば、レーザー溶接、抵抗溶接、拡散接合、ロウ接、TIG溶接(タングステン-不活性ガス溶接)、超音波接合又は樹脂封止を用いることができる。好ましくはレーザー溶接、抵抗溶接又はロウ接を用いることができる。 When the housing 10 is composed of the first sheet 11 and the second sheet 12, the first sheet 11 and the second sheet 12 are joined together at their outer edges. Such bonding methods are not particularly limited, but laser welding, resistance welding, diffusion bonding, brazing, TIG welding (tungsten-inert gas welding), ultrasonic bonding, or resin sealing can be used, for example. Preferably laser welding, resistance welding or brazing can be used.

 第1シート11及び第2シート12の厚さは、特に限定されないが、各々、好ましくは10μm以上200μm以下、より好ましくは30μm以上100μm以下、さらに好ましくは40μm以上60μm以下である。第1シート11及び第2シート12の厚さは、同じであってもよく、異なっていてもよい。また、第1シート11及び第2シート12の各シートの厚さは、全体にわたって同じであってもよく、一部が薄くてもよい。 The thicknesses of the first sheet 11 and the second sheet 12 are not particularly limited, but each is preferably 10 μm or more and 200 μm or less, more preferably 30 μm or more and 100 μm or less, still more preferably 40 μm or more and 60 μm or less. The thicknesses of the first sheet 11 and the second sheet 12 may be the same or different. Further, the thickness of each sheet of the first sheet 11 and the second sheet 12 may be the same over the entire area, or may be thin in part.

 第1シート11及び第2シート12の形状は、特に限定されない。例えば、第1シート11は、厚みが一定の平板形状であり、第2シート12は、外縁部が外縁部以外の部分よりも厚い形状であってもよい。 The shapes of the first sheet 11 and the second sheet 12 are not particularly limited. For example, the first sheet 11 may have a flat plate shape with a constant thickness, and the second sheet 12 may have a shape in which the outer edge portion is thicker than the portions other than the outer edge portion.

 あるいは、第1シート11は、厚みが一定の平板形状であり、第2シート12は、厚みが一定で、かつ、外縁部に対して外縁部以外の部分が外側に凸の形状であってもよい。この場合、筐体10の外縁部に凹みが形成される。そのため、ベーパーチャンバーを搭載する際などに外縁部の凹みを利用することができる。また、外縁部の凹みに他の部品などを配置することができる。 Alternatively, the first sheet 11 may have a flat plate shape with a constant thickness, and the second sheet 12 may have a constant thickness and a portion other than the outer edge with respect to the outer edge may be convex outward. good. In this case, a recess is formed in the outer edge of the housing 10 . Therefore, the concave portion of the outer edge can be used when mounting the vapor chamber. Also, other components can be placed in the recesses of the outer edge.

 ベーパーチャンバー1全体の厚さは、特に限定されないが、好ましくは50μm以上500μm以下である。 Although the thickness of the entire vapor chamber 1 is not particularly limited, it is preferably 50 μm or more and 500 μm or less.

 厚さ方向Zから見た筐体10の平面形状は、180°以上の内角を形成する第1辺と第2辺を有する形状であり、多角形形状であることが好ましい。180°以上の内角を形成する頂点を有する限りその形状は限定されない。例えば、L字型、C字型(コの字型)、階段型などであってもよい。また、筐体10はその平面形状の図形の内部に空間(貫通口)を有してもよい。筐体10の平面形状は、ベーパーチャンバーの用途、ベーパーチャンバーの組み入れ箇所の形状、近傍に存在する他の部品に応じた形状であってもよい。
 また、第1辺と第2辺が形成する角度は180°以上、360°未満であればよく、例えば、225°以上、315°以下とすることができる。
 筐体10の平面形状の具体的な例については後述する。
The planar shape of the housing 10 as seen from the thickness direction Z is a shape having first and second sides forming an internal angle of 180° or more, and is preferably a polygonal shape. The shape is not limited as long as it has vertices forming an interior angle of 180° or more. For example, it may be L-shaped, C-shaped (U-shaped), or stepped. Further, the housing 10 may have a space (through-hole) inside the planar figure. The planar shape of the housing 10 may be a shape according to the use of the vapor chamber, the shape of the location where the vapor chamber is installed, and other parts existing nearby.
Also, the angle formed by the first side and the second side may be 180° or more and less than 360°, for example, 225° or more and 315° or less.
A specific example of the planar shape of the housing 10 will be described later.

 本発明の熱拡散デバイスは、筐体の内部空間にキャピラリーストラクチャーをさらに備える。
 キャピラリーストラクチャーの第1部が第1辺又は第2辺に近接し、キャピラリーストラクチャーの第2部がウィックに接している。
 キャピラリーストラクチャーは、第1端部と第2端部を有し、第1端部から第2端部に延びる形状であることが好ましい。第1端部がキャピラリーストラクチャーの第1部に相当し、第2端部がキャピラリーストラクチャーの第2部に相当することが好ましい。
The heat spreading device of the present invention further comprises a capillary structure in the inner space of the housing.
A first portion of the capillary structure is adjacent to the first side or the second side, and a second portion of the capillary structure is in contact with the wick.
Preferably, the capillary structure has a first end and a second end and is shaped to extend from the first end to the second end. Preferably, the first end corresponds to the first part of the capillary structure and the second end corresponds to the second part of the capillary structure.

 以下に、本発明の熱拡散デバイスの具体的な実施形態を示す。
 以下に示す各実施形態は例示であり、異なる実施形態で示した構成の部分的な置換又は組み合わせが可能であることは言うまでもない。第2実施形態以降では、第1実施形態と共通の事項についての記述は省略し、異なる点についてのみ説明する。特に、同様の構成による同様の作用効果については、実施形態毎には逐次言及しない。
Specific embodiments of the heat spreading device of the present invention are shown below.
Each embodiment shown below is an example, and it goes without saying that partial replacement or combination of configurations shown in different embodiments is possible. In the second and subsequent embodiments, descriptions of matters common to the first embodiment will be omitted, and only different points will be described. In particular, similar actions and effects due to similar configurations will not be mentioned sequentially for each embodiment.

 以下の説明において、各実施形態を特に区別しない場合、単に「本発明の熱拡散デバイス」という。 In the following description, when each embodiment is not particularly distinguished, it is simply referred to as "the heat diffusion device of the present invention".

 以下に示す図面は模式的なものであり、その寸法や縦横比の縮尺などは実際の製品とは異なる場合がある。 The drawings shown below are schematic, and their dimensions and aspect ratio may differ from the actual product.

[第1実施形態]
 本発明の第1実施形態では、キャピラリーストラクチャーが、筐体の第1内壁面及び第2内壁面の内の少なくとも一方の面に設けられた複数の溝である。
 筐体は、作動媒体を蒸発させる蒸発部を有し、ウィックの端部は蒸発部に位置している。また、第1辺が第2辺よりも蒸発部から遠くに位置している。
 キャピラリーストラクチャーは、第1端部と第2端部を有し、第1端部から第2端部に延びる形状である。第1端部がキャピラリーストラクチャーの第1部に相当し、第2端部がキャピラリーストラクチャーの第2部に相当する。
 キャピラリーストラクチャーの第1部である第1端部は、第1辺に接しており、キャピラリーストラクチャーの第2部である第2端部は1つのウィックに接している。
 また、ウィックは、第1多孔体及び第2多孔体を含む。ウィックにおいて、第1多孔体と第2多孔体との間には、第1多孔体及び第2多孔体が延びる方向に沿って間隔が設けられることにより液相流路が形成されている。
[First embodiment]
In the first embodiment of the present invention, the capillary structure is a plurality of grooves provided on at least one of the first inner wall surface and the second inner wall surface of the housing.
The housing has an evaporator for evaporating the working medium, and the end of the wick is located in the evaporator. Also, the first side is positioned farther from the evaporator than the second side.
The capillary structure is shaped having a first end and a second end and extending from the first end to the second end. The first end corresponds to the first part of the capillary structure and the second end corresponds to the second part of the capillary structure.
The first end, which is the first part of the capillary structure, is in contact with the first side, and the second end, which is the second part of the capillary structure, is in contact with one wick.
Also, the wick includes a first porous body and a second porous body. In the wick, a liquid phase flow path is formed by providing a space between the first porous body and the second porous body along the direction in which the first porous body and the second porous body extend.

 第1多孔体及び第2多孔体としては、例えば、エッチング加工又は金属加工により形成される金属多孔膜、メッシュ、不織布、焼結体、その他の多孔体などが用いられる。ウィックの材料となるメッシュは、例えば、金属メッシュ、樹脂メッシュ、もしくは表面コートしたそれらのメッシュから構成されるものであってよく、好ましくは銅メッシュ、ステンレス(SUS)メッシュ又はポリエステルメッシュから構成される。ウィックの材料となる焼結体は、例えば、金属多孔質焼結体、セラミックス多孔質焼結体から構成されるものであってよく、好ましくは銅又はニッケルの多孔質焼結体から構成される。
 ウィックの材料となるその他の多孔体は、例えば、金属多孔体、セラミックス多孔体、樹脂多孔体から構成されるもの等であってもよい。
 なお、メッシュ、不織布及び焼結体も、本明細書においては多孔体に含まれる。
As the first porous body and the second porous body, for example, metal porous membranes, meshes, non-woven fabrics, sintered bodies, and other porous bodies formed by etching or metal working are used. The mesh that is the material of the wick may be composed of, for example, a metal mesh, a resin mesh, or a surface-coated mesh thereof, preferably a copper mesh, a stainless steel (SUS) mesh, or a polyester mesh. . The sintered body that is the material of the wick may be composed of, for example, a metal porous sintered body or a ceramic porous sintered body, preferably a porous sintered body of copper or nickel. .
Other porous bodies used as wick materials may be composed of, for example, metal porous bodies, ceramic porous bodies, resin porous bodies, or the like.
A mesh, a nonwoven fabric, and a sintered body are also included in the porous body in this specification.

 図2Aは、本発明の第1実施形態に係るベーパーチャンバーの一例を模式的に示す平面図である。図2Bは図2AのA-A線断面図であり、図2Cは図2AのB-B線断面図であり、図2Dは図2AのC-C線断面図である。
 本明細書において、図2Aに示すようなベーパーチャンバーの平面図は、いずれもベーパーチャンバーの内部構造を示す模式図であり、第1シート及び第2シートのいずれかを透過して示した図であるといえる。
 筐体10は、図2B、図2C及び図2Dに示すように、厚さ方向Zに対向する第1内壁面11a及び第2内壁面12aを有する。図1において説明したように、筐体10は、外縁部が接合された対向する第1シート11及び第2シート12から構成されることが好ましい。図2Bに示すように、ベーパーチャンバー1は、さらに、筐体10の内部空間に封入される作動媒体20と、筐体10の第1内壁面11aと第2内壁面12aとの間に配置されるウィック30と、を備える。
FIG. 2A is a plan view schematically showing an example of the vapor chamber according to the first embodiment of the invention. FIG. 2B is a cross-sectional view along line AA of FIG. 2A, FIG. 2C is a cross-sectional view along line BB of FIG. 2A, and FIG. 2D is a cross-sectional view along line CC of FIG. 2A.
In this specification, any plan view of the vapor chamber as shown in FIG. 2A is a schematic diagram showing the internal structure of the vapor chamber, and is a diagram showing through either the first sheet or the second sheet. It can be said that there is.
The housing 10 has a first inner wall surface 11a and a second inner wall surface 12a facing each other in the thickness direction Z, as shown in FIGS. 2B, 2C and 2D. As illustrated in FIG. 1, the housing 10 is preferably constructed from opposed first and second sheets 11 and 12 joined at their outer edges. As shown in FIG. 2B, the vapor chamber 1 is further arranged between the working medium 20 enclosed in the internal space of the housing 10 and the first inner wall surface 11a and the second inner wall surface 12a of the housing 10. and a wick 30 that

 ウィック30は、第1多孔体41と第2多孔体42とを含む。これらの多孔体は、毛細管力によって作動媒体20を輸送するウィックとして機能する。
 また、ウィック30を構成する第1多孔体41及び第2多孔体42は、厚さ方向に垂直な方向に沿い、筐体10の第1内壁面11a及び第2内壁面12aに接する部分を有する。これらの多孔体を筐体10の内部空間に配置することにより、筐体10の機械的強度を確保しつつ、筐体10外部からの衝撃を吸収することができる。
 ウィック30を構成する第1多孔体41及び第2多孔体42の厚さは、筐体の内部空間の厚さとほぼ同じである。
The wick 30 includes a first porous body 41 and a second porous body 42 . These porous bodies function as wicks that transport the working medium 20 by capillary force.
In addition, the first porous body 41 and the second porous body 42 constituting the wick 30 have portions in contact with the first inner wall surface 11a and the second inner wall surface 12a of the housing 10 along the direction perpendicular to the thickness direction. . By arranging these porous bodies in the internal space of the housing 10, the mechanical strength of the housing 10 can be ensured and the impact from the outside of the housing 10 can be absorbed.
The thickness of the first porous body 41 and the second porous body 42 that constitute the wick 30 is approximately the same as the thickness of the internal space of the housing.

 筐体の内部空間には、蒸気流路が形成されている。
 図2A及び図2Bには、隣り合うウィック30の間に、気相の作動媒体20が流通する蒸気流路50を示している。
 各々のウィック30において、第1多孔体41と第2多孔体42との間には、第1多孔体41及び第2多孔体42が延びる方向(本実施形態では長さ方向Y、右端のウィックではさらに幅方向X)に沿って間隔が設けられることにより液相流路51が形成されている。液相流路51は、液相の作動媒体20が流通する流路として利用することができる。第1多孔体41又は第2多孔体42を挟んで液相流路と蒸気流路とを交互に配置することにより、熱輸送効率を向上させることができる。
A steam flow path is formed in the internal space of the housing.
FIGS. 2A and 2B show vapor flow paths 50 through which vapor-phase working medium 20 flows between adjacent wicks 30 .
In each wick 30, between the first porous body 41 and the second porous body 42, the direction in which the first porous body 41 and the second porous body 42 extend (in this embodiment, the length direction Y, the rightmost wick Further, a liquid phase flow path 51 is formed by providing an interval along the width direction X). The liquid-phase channel 51 can be used as a channel through which the liquid-phase working medium 20 flows. By alternately arranging the liquid phase channels and the vapor channels with the first porous body 41 or the second porous body 42 interposed therebetween, the heat transport efficiency can be improved.

 筐体10には、図2Aに示すように、封入した作動媒体20を蒸発させる蒸発部(evaporation portion)EPが設定されている。筐体10の内部空間のうち、熱源HSの近傍であって熱源HSによって加熱される部分が、蒸発部EPに相当する。 As shown in FIG. 2A, the housing 10 is provided with an evaporation portion EP for evaporating the enclosed working medium 20 . A portion of the internal space of the housing 10 that is in the vicinity of the heat source HS and is heated by the heat source HS corresponds to the evaporating section EP.

 作動媒体20は、筐体10内の環境下において気-液の相変化を生じ得るものであれば特に限定されず、例えば、水、アルコール類、代替フロン等を用いることができる。例えば、作動媒体は水性化合物であり、好ましくは水である。 The working medium 20 is not particularly limited as long as it can cause a gas-liquid phase change in the environment inside the housing 10. For example, water, alcohols, CFC alternatives, etc. can be used. For example, the working medium is an aqueous compound, preferably water.

 ウィック30は、図2Aに示すように、厚さ方向Zからの平面視で、蒸発部EPに位置する一方の端部から他方の端部まで延びている。ウィックの他方の端部は蒸発部EPから離れた部分であり、蒸発した作動媒体を凝縮させる凝縮部となる。 As shown in FIG. 2A, the wick 30 extends from one end located in the evaporation part EP to the other end in plan view from the thickness direction Z. As shown in FIG. The other end of the wick is a portion away from the evaporator EP and serves as a condensing portion for condensing the evaporated working medium.

 図2Aに示す筐体10の平面形状は、いわゆるL字形状である。
 また、図2Aに示す筐体10の平面形状は、180°以上の内角を形成する第1辺61と第2辺62を有する形状である。第1辺61と第2辺62の内角は図2Aでθで示す角度であり、この図面では270°である。
 第1辺61は第2辺62よりも蒸発部EPから遠くに位置する辺である。
 第1辺61及び第2辺62の近傍にはウィック30が形成されていない。
The planar shape of the housing 10 shown in FIG. 2A is a so-called L shape.
Moreover, the planar shape of the housing 10 shown in FIG. 2A is a shape having a first side 61 and a second side 62 forming an internal angle of 180° or more. The internal angle between the first side 61 and the second side 62 is an angle indicated by θ in FIG. 2A, which is 270° in this drawing.
The first side 61 is a side located farther from the evaporating part EP than the second side 62 is.
The wick 30 is not formed near the first side 61 and the second side 62 .

 ここで、第1辺61の近傍にはウィック30が形成されておらず、筐体10の形状から、ベーパーチャンバーが使用される際の向き(重力の加わる方向に対する向き)によっては、液溜まりが第1辺61の近傍に生じることがある。
 そこで、筐体10の内部空間には、キャピラリーストラクチャー70が第1辺61に近接して存在している。キャピラリーストラクチャー70が存在することにより、第1辺61の近傍に生じた液溜まりをウィック30まで導くことができる。その結果、液体の輸送量を向上させて、最大熱輸送量を向上させることができる。
 以下に、キャピラリーストラクチャーの詳細について説明する。
Here, the wick 30 is not formed in the vicinity of the first side 61, and due to the shape of the housing 10, depending on the direction in which the vapor chamber is used (the direction with respect to the direction in which gravity is applied), liquid pools may form. It may occur near the first side 61 .
Therefore, the capillary structure 70 exists in the inner space of the housing 10 close to the first side 61 . Due to the existence of the capillary structure 70 , it is possible to guide the liquid pool generated in the vicinity of the first side 61 to the wick 30 . As a result, the amount of liquid transported can be improved, and the maximum heat transport amount can be improved.
Details of the capillary structure are described below.

 キャピラリーストラクチャー70は、液相の作動媒体20が流通する液体流路であるが、ウィック30とは異なる。ウィック30は第1内壁面11a及び第2内壁面12aの両方に接するため、蒸気流路を分断する構成である。一方、キャピラリーストラクチャー70は蒸気流路を分断しない構成である。 The capillary structure 70 is a liquid channel through which the liquid-phase working medium 20 flows, but is different from the wick 30 . Since the wick 30 contacts both the first inner wall surface 11a and the second inner wall surface 12a, it is configured to divide the steam flow path. On the other hand, the capillary structure 70 is configured so as not to divide the vapor flow path.

 図2Aには、キャピラリーストラクチャー70を5本示している。
 各キャピラリーストラクチャー70は、第1端部71と第2端部72を有する。
 キャピラリーストラクチャー70の第1端部71は、第1辺61に近接している。
 ここでいう近接とは、キャピラリーストラクチャーの第1部(第1端部)が、第1辺に対して最も近くに位置するウィックよりも、第1辺に対してより近くに位置していることを意味する。液溜まりが生じている第1辺に対してキャピラリーストラクチャーの第1部よりもウィックの方が近くに位置するのであれば、液溜まりはキャピラリーストラクチャーではなくウィックにより吸収されるので、キャピラリーストラクチャーを設ける意味がない。そのため、キャピラリーストラクチャーが第1辺に対して近くに位置している必要がある。
 また、キャピラリーストラクチャー70の第1端部71は第1辺61に接していてもよい。
Five capillary structures 70 are shown in FIG. 2A.
Each capillary structure 70 has a first end 71 and a second end 72 .
A first end 71 of the capillary structure 70 is adjacent to the first side 61 .
Proximity here means that the first part (first end) of the capillary structure is positioned closer to the first side than the wick positioned closest to the first side. means If the wick is positioned closer to the first side where the liquid pool is formed than the first part of the capillary structure, the liquid pool is absorbed by the wick instead of the capillary structure, so the capillary structure is provided. has no meaning. Therefore, the capillary structure should be positioned close to the first side.
Also, the first end 71 of the capillary structure 70 may be in contact with the first side 61 .

 また、ここではキャピラリーストラクチャー70の第1端部71が第1辺61に対して近接している場合について説明したが、キャピラリーストラクチャー70の第1端部71が第2辺62に対して近接していてもよく、第2辺62と接していてもよい。 Also, although the case where the first end 71 of the capillary structure 70 is close to the first side 61 has been described here, the first end 71 of the capillary structure 70 is close to the second side 62 . It may be in contact with the second side 62 .

 キャピラリーストラクチャー70の第2端部72は、ウィック30に接している。
 図2Aには、キャピラリーストラクチャー70の第2端部72が1つのウィック30に接している形態を示している。
 図2Aには、キャピラリーストラクチャー70を通じて、第1辺61の近傍に存在する液相の作動媒体20をウィック30まで導入する矢印Fを示している。
 キャピラリーストラクチャー70の第1端部71が第1辺61又は第2辺62に近接しており、第2端部72がウィック30に接していると、第1端部71において、第1辺61又は第2辺62の近傍に生じた液溜まりを吸収する。
 そして、キャピラリーストラクチャー70内を液体流路として使用し、液相の作動媒体20を第2端部72まで到達させることによって、液相の作動媒体20をウィック30に導入することができる。ウィック30に導入された液相の作動媒体20は、ウィック30により蒸発部EPまで輸送される。
 すなわち、ウィック30を形成しない位置に生じた液溜まりの影響により最大熱輸送量が低下するという問題を解決することができる。
A second end 72 of capillary structure 70 abuts wick 30 .
FIG. 2A shows a configuration in which the second end 72 of the capillary structure 70 contacts one wick 30 .
FIG. 2A shows an arrow F that introduces the liquid-phase working medium 20 existing near the first side 61 to the wick 30 through the capillary structure 70 .
When the first end 71 of the capillary structure 70 is close to the first side 61 or the second side 62 and the second end 72 is in contact with the wick 30, the first side 61 Alternatively, it absorbs the liquid pool generated near the second side 62 .
The liquid-phase working medium 20 can be introduced into the wick 30 by using the inside of the capillary structure 70 as a liquid channel and allowing the liquid-phase working medium 20 to reach the second end 72 . The liquid-phase working medium 20 introduced into the wick 30 is transported by the wick 30 to the evaporator EP.
That is, it is possible to solve the problem that the maximum amount of heat transport is reduced due to the effect of the liquid pool generated at the position where the wick 30 is not formed.

 キャピラリーストラクチャーは、筐体の第1内壁面及び第2内壁面の内の少なくとも一方の面に設けられた溝であってもよい。
 図2C及び図2Dには、キャピラリーストラクチャー70が筐体10の第2内壁面12aに設けられた溝である例を示している。
 このような、筐体の内壁面に設けられた溝であるキャピラリーストラクチャーを、本明細書ではマイクロ流路とも呼ぶ。
 図2Cにはウィック30が無い部分におけるマイクロ流路70の形状を示している。
 図2Dにはウィック30(第2多孔体42)と重なる部分におけるマイクロ流路70の形状を示している。
The capillary structure may be a groove provided in at least one of the first inner wall surface and the second inner wall surface of the housing.
2C and 2D show an example in which the capillary structure 70 is a groove provided in the second inner wall surface 12a of the housing 10. FIG.
Such a capillary structure, which is a groove provided on the inner wall surface of the housing, is also called a microchannel in this specification.
FIG. 2C shows the shape of the microchannel 70 in the portion where the wick 30 is absent.
FIG. 2D shows the shape of the microchannel 70 in the portion overlapping the wick 30 (second porous body 42).

 マイクロ流路70は、筐体10を構成する第2シート12を厚さ方向に凹ませることによって形成された溝である。第2シート12に溝を形成する方法としては、エッチング、プレス、機械加工等の方法が挙げられ、その方法は特に限定されるものではない。
 図2C及び図2Dに示すマイクロ流路70の断面形状は長方形であるが、マイクロ流路の形状は他の形状であってもよい。マイクロ流路が他の形状である場合の例については後述する。
The microchannel 70 is a groove formed by recessing the second sheet 12 forming the housing 10 in the thickness direction. Methods for forming grooves in the second sheet 12 include methods such as etching, pressing, and machining, and the methods are not particularly limited.
Although the cross-sectional shape of the microchannel 70 shown in FIGS. 2C and 2D is rectangular, the shape of the microchannel may be other shapes. Examples of other shapes of microchannels will be described later.

 マイクロ流路70の溝の深さは、特に限定されるものではないが、10μm以上、30μm以下であることが好ましい。
 また、マイクロ流路70の溝の幅は、特に限定されるものではないが、30μm以上、100μm以下であることが好ましい。
 また、マイクロ流路70となる溝は複数設けられていることが好ましい。
Although the depth of the grooves of the microchannel 70 is not particularly limited, it is preferably 10 μm or more and 30 μm or less.
Moreover, the width of the groove of the microchannel 70 is not particularly limited, but is preferably 30 μm or more and 100 μm or less.
Moreover, it is preferable that a plurality of grooves to be the microchannels 70 are provided.

 マイクロ流路は、熱源HSが配置されない側のシートの内壁面に設けることが好ましい。図1に示すベーパーチャンバー1では、熱源HSは第1シート11の側に配置されるので、マイクロ流路70は第2シート12に溝を形成することにより設けることが好ましい。 The microchannel is preferably provided on the inner wall surface of the sheet on the side where the heat source HS is not arranged. In the vapor chamber 1 shown in FIG. 1, the heat source HS is arranged on the first sheet 11 side, so the microchannels 70 are preferably provided by forming grooves in the second sheet 12 .

[第2実施形態]
 本発明の第2実施形態では、キャピラリーストラクチャーの向きが第1実施形態と異なる。
 第1実施形態では、キャピラリーストラクチャー70の向きがベーパーチャンバーの幅方向X及び長さ方向Yに対して斜めとなっていたが、第2実施形態ではキャピラリーストラクチャーの向きが異なる。
 図3A及び図3Bは、キャピラリーストラクチャーの向きが異なるベーパーチャンバーの一例を模式的に示す平面図である。
[Second embodiment]
In the second embodiment of the invention, the orientation of the capillary structure is different from that in the first embodiment.
In the first embodiment, the orientation of the capillary structure 70 is oblique with respect to the width direction X and the length direction Y of the vapor chamber, but the orientation of the capillary structure is different in the second embodiment.
3A and 3B are plan views schematically showing examples of vapor chambers having different orientations of capillary structures.

 図3Aに示すベーパーチャンバー2Aでは、キャピラリーストラクチャー70Aの向きはベーパーチャンバーの幅方向Xに平行となっている。
 この形態では、キャピラリーストラクチャー70Aとウィック30を合わせた、第1辺の近傍(液相の作動媒体20が溜まっている液溜まり)から蒸発部EPまでの距離が最も短くなる液体流路を形成できるようになっている。
 すなわち、キャピラリーストラクチャー70Aの向きはベーパーチャンバーの幅方向Xに平行という視点でキャピラリーストラクチャーの向きを定めたものではない。
 液相の作動媒体20が溜まっている液溜まりから蒸発部EPまでの距離が短いほど、最大熱輸送量が向上する。
In the vapor chamber 2A shown in FIG. 3A, the orientation of the capillary structure 70A is parallel to the width direction X of the vapor chamber.
In this form, a liquid flow path can be formed in which the distance from the vicinity of the first side (liquid pool in which the liquid-phase working medium 20 is accumulated) to the evaporator EP is the shortest, which is the combination of the capillary structure 70A and the wick 30. It's like
That is, the orientation of the capillary structure 70A is not determined from the viewpoint of being parallel to the width direction X of the vapor chamber.
The shorter the distance from the reservoir in which the liquid-phase working medium 20 is accumulated to the evaporator EP, the greater the maximum heat transfer amount.

 図3Bに示すベーパーチャンバー2Bでは、キャピラリーストラクチャー70Bの向きはベーパーチャンバーの長さ方向Yに平行となっている。
 この形態では、キャピラリーストラクチャー70Bの長さが最も短くなるようになっている。すなわち、第1辺の近傍(液相の作動媒体20が溜まっている液溜まり)から最も近いウィック30までを最短経路で結ぶようにキャピラリーストラクチャー70Bの向きが定められている。
 すなわち、キャピラリーストラクチャー70Aの向きはベーパーチャンバーの長さ方向Yに平行という視点でキャピラリーストラクチャーの向きを定めたものではない。
 キャピラリーストラクチャーによる液相の作動媒体の輸送量はウィックに比べると少ない。そのため、キャピラリーストラクチャーにより液体の輸送を行う距離は短くして、できるだけ早くに液体がウィックに到達するようにすることが好ましい。
 キャピラリーストラクチャーの長さが短く、ウィックにより液体の輸送を行う割合が高いほど、最大熱輸送量が向上する。
In the vapor chamber 2B shown in FIG. 3B, the orientation of the capillary structure 70B is parallel to the longitudinal direction Y of the vapor chamber.
In this form, the length of the capillary structure 70B is the shortest. That is, the direction of the capillary structure 70B is determined so as to connect the vicinity of the first side (liquid reservoir in which the liquid-phase working medium 20 is accumulated) to the nearest wick 30 by the shortest path.
In other words, the orientation of the capillary structure 70A is not determined from the viewpoint of being parallel to the longitudinal direction Y of the vapor chamber.
The transport amount of the liquid-phase working medium by the capillary structure is smaller than that by the wick. Therefore, it is preferable to shorten the distance over which the liquid is transported by the capillary structure so that the liquid reaches the wick as quickly as possible.
The shorter the length of the capillary structure and the higher the proportion of liquid transported by the wick, the higher the maximum heat transfer.

[第3実施形態]
 本発明の第3実施形態では、キャピラリーストラクチャーの第2端部は、複数のウィックに接している点で第1実施形態と異なる。
 第1実施形態では、キャピラリーストラクチャー70の第2端部72は1つのウィック30に接していたが、第3実施形態では、キャピラリーストラクチャーの第2端部は複数のウィックに接している。
 図4は、キャピラリーストラクチャーの第2端部が複数のウィックに接しているベーパーチャンバーの一例を模式的に示す平面図である。
[Third embodiment]
The third embodiment of the present invention differs from the first embodiment in that the second end of the capillary structure is in contact with a plurality of wicks.
In the first embodiment, the second end 72 of the capillary structure 70 was in contact with one wick 30, whereas in the third embodiment the second end of the capillary structure is in contact with multiple wicks.
FIG. 4 is a plan view schematically showing an example of a vapor chamber in which the second end of the capillary structure is in contact with multiple wicks.

 図4に示すベーパーチャンバー3では、キャピラリーストラクチャー70Cの第2端部72は複数のウィック、すなわちウィック30a、ウィック30b及びウィック30cに接している。
 図4に示すベーパーチャンバー3では、キャピラリーストラクチャー70Cは、ベーパーチャンバーが備える全てのウィックと接しているともいえる。
 キャピラリーストラクチャーが複数のウィックと接している場合、キャピラリーストラクチャーの第2端部(第2部)は、キャピラリーストラクチャーが複数のウィックと接している全体部分を意味するものとする。
In the vapor chamber 3 shown in FIG. 4, the second end 72 of the capillary structure 70C is in contact with a plurality of wicks, namely wick 30a, wick 30b and wick 30c.
In the vapor chamber 3 shown in FIG. 4, it can be said that the capillary structure 70C is in contact with all the wicks provided in the vapor chamber.
When the capillary structure is in contact with a plurality of wicks, the second end (second portion) of the capillary structure shall mean the entire portion where the capillary structure is in contact with the plurality of wicks.

 キャピラリーストラクチャーが複数のウィックと接していると、キャピラリーストラクチャーから各ウィックに対して液相の作動媒体を輸送することができるので、均熱性を向上させることができる。 When the capillary structure is in contact with a plurality of wicks, the liquid-phase working medium can be transported from the capillary structure to each wick, thereby improving heat uniformity.

[第4実施形態]
 本発明の第4実施形態では、筐体の平面形状が第1実施形態と異なる。
 第1実施形態では、筐体の平面形状がL字形状であったが、第4実施形態としては他の形状の筐体を例示する。
 図5A、図5B、図5C、図5D及び図5Eは、筐体の平面形状が異なるベーパーチャンバーの一例を模式的に示す平面図である。
[Fourth embodiment]
In the fourth embodiment of the present invention, the planar shape of the housing is different from that in the first embodiment.
In the first embodiment, the planar shape of the housing is L-shaped, but as the fourth embodiment, a housing having another shape is exemplified.
5A, 5B, 5C, 5D, and 5E are plan views schematically showing examples of vapor chambers having different planar shapes of casings.

 図5Aに示すベーパーチャンバー4Aは、筐体10Aの平面形状が、その一部において階段状となっている。図5Aに示すベーパーチャンバー4Aでは筐体10Aの右下部分において階段状となっている。
 階段状の部分に第1辺と第2辺を有しており、第1辺61Aと第2辺62Aの内角θ、第1辺61Bと第2辺62Bの内角θはいずれも270°となっている。
In the vapor chamber 4A shown in FIG. 5A, the planar shape of the housing 10A is partially stepped. The vapor chamber 4A shown in FIG. 5A has a stepped shape at the lower right portion of the housing 10A.
The stepped portion has a first side and a second side, and the interior angle θ between the first side 61A and the second side 62A and the interior angle θ between the first side 61B and the second side 62B are both 270°. ing.

 第1辺61Aにはキャピラリーストラクチャー70Dが近接しており、第1辺61Bにはキャピラリーストラクチャー70Eが近接している。
 キャピラリーストラクチャー70D及びキャピラリーストラクチャー70Eはそれぞれ同じウィック30dに接している。
A capillary structure 70D is adjacent to the first side 61A, and a capillary structure 70E is adjacent to the first side 61B.
Capillary structure 70D and capillary structure 70E are each in contact with the same wick 30d.

 筐体の平面形状が階段状である場合に、液溜まり部が複数箇所に生じることがあるので、それぞれの箇所にキャピラリーストラクチャーを備えることにより、最大熱輸送量を向上させることができる。 When the planar shape of the housing is stepped, liquid pools may occur at multiple locations, so providing a capillary structure at each location can improve the maximum heat transfer amount.

 図5Bに示すベーパーチャンバー4Bは、筐体10Bの平面形状が、T字状となっている。
 T字の右側及び左側にそれぞれ第1辺と第2辺を有しており、右側の第1辺61Cと第2辺62Cの内角θ、左側の第1辺61Dと第2辺62Dの内角θはいずれも270°となっている。
A vapor chamber 4B shown in FIG. 5B has a T-shaped planar shape of a housing 10B.
The T-shape has a first side and a second side on the right side and the left side, respectively. are both 270°.

 第1辺61Cにはキャピラリーストラクチャー70Fが近接しており、第1辺61Dにはキャピラリーストラクチャー70Gが近接している。
 キャピラリーストラクチャー70Fはウィック30eに接し、キャピラリーストラクチャー70Gはウィック30fに接している。
A capillary structure 70F is adjacent to the first side 61C, and a capillary structure 70G is adjacent to the first side 61D.
The capillary structure 70F is in contact with the wick 30e, and the capillary structure 70G is in contact with the wick 30f.

 筐体の平面形状がT字状である場合に、液溜まり部が複数箇所に生じることがあるので、それぞれの箇所にキャピラリーストラクチャーを備えることにより、最大熱輸送量を向上させることができる。 When the planar shape of the housing is T-shaped, liquid pools may occur at multiple locations, so by providing a capillary structure at each location, the maximum amount of heat transport can be improved.

 図5Cに示すベーパーチャンバー4Cは、筐体10Cの平面形状が、平面の中に空間13を有する形状、いわゆるドーナツ形状となっている。具体的には、四角形の平面の中に四角形の空間を有する形状である。
 空間13の上辺が第1辺61Eであり、右辺が第2辺62E、左辺が第2辺62Fである。
 第1辺61Eと第2辺62Eの内角θ、第1辺61Eと第2辺62Fの内角θはいずれも270°となっている。
A vapor chamber 4C shown in FIG. 5C has a housing 10C with a planar shape having a space 13 in the plane, that is, a donut shape. Specifically, it is a shape having a quadrilateral space in a quadrilateral plane.
The upper side of the space 13 is the first side 61E, the right side is the second side 62E, and the left side is the second side 62F.
The interior angle θ between the first side 61E and the second side 62E and the interior angle θ between the first side 61E and the second side 62F are both 270°.

 図5Cに示すキャピラリーストラクチャー70Hの第1部71´は、第1辺61Eに近接する位置であり、キャピラリーストラクチャー70Hの端部ではない位置である。
 キャピラリーストラクチャー70Hはその一方の端部でウィック30gに接し、他方の端部でウィック30hに接している。キャピラリーストラクチャー70Hがウィック30gに接する端部、及び、キャピラリーストラクチャー70Hがウィック30hに接する端部が共にキャピラリーストラクチャー70Hの第2部72´である。
A first portion 71' of the capillary structure 70H shown in FIG. 5C is a position close to the first side 61E and is not the end of the capillary structure 70H.
One end of the capillary structure 70H is in contact with the wick 30g, and the other end is in contact with the wick 30h. Both the end portion of the capillary structure 70H contacting the wick 30g and the end portion of the capillary structure 70H contacting the wick 30h are the second portion 72' of the capillary structure 70H.

 筐体の平面形状がドーナツ形状である場合に、空間を構成する辺に近接して液溜まり部が生じることがあるので、空間を構成する辺に近接する箇所にキャピラリーストラクチャーを備えることにより、最大熱輸送量を向上させることができる。 When the planar shape of the housing is donut-shaped, liquid pools may occur near the sides that make up the space. Heat transport can be improved.

 図5Dに示すベーパーチャンバー4Dは、筐体10Dの平面形状が、C字状となっている。図面には、C字状における角が直角の形状を示している。
 C字の底部(左辺)になる位置に第2辺62Gを有している。上側に第1辺61G、下側に第1辺61Hを有している。
 上側の第1辺61Gと第2辺62Gの内角、下側の第1辺61Hと第2辺62Gの内角はいずれも270°となっている。
A vapor chamber 4D shown in FIG. 5D has a C-shaped planar shape of a housing 10D. The drawing shows a shape in which the corners of the C shape are right angles.
It has a second side 62G at a position corresponding to the bottom (left side) of the C shape. It has a first side 61G on the upper side and a first side 61H on the lower side.
The internal angle between the upper first side 61G and the second side 62G and the internal angle between the lower first side 61H and the second side 62G are both 270°.

 第1辺61Gにはキャピラリーストラクチャー70Iが近接しており、第1辺61Hにはキャピラリーストラクチャー70Jが近接している。
 キャピラリーストラクチャー70Iとキャピラリーストラクチャー70Jは同じウィック30iに接している。
 キャピラリーストラクチャー70Iはウィック30iにウィック30iの上側で接し、キャピラリーストラクチャー70Jはウィック30iにウィック30iの下側で接している。
A capillary structure 70I is close to the first side 61G, and a capillary structure 70J is close to the first side 61H.
Capillary structure 70I and capillary structure 70J are in contact with the same wick 30i.
Capillary structure 70I contacts wick 30i on the upper side of wick 30i, and capillary structure 70J contacts wick 30i on the lower side of wick 30i.

 キャピラリーストラクチャー70Iの向きはベーパーチャンバーの幅方向Xに平行となっていて、キャピラリーストラクチャー70Jの向きはベーパーチャンバーの幅方向X及び長さ方向Yに対して斜めとなっている。
 この例では、複数のキャピラリーストラクチャーの向きが異なっているが、キャピラリーストラクチャーが複数箇所に設けられる場合に、その向きは同じであっても異なっていてもよい。これは他の実施形態においても同様である。
The orientation of the capillary structure 70I is parallel to the width direction X of the vapor chamber, and the orientation of the capillary structure 70J is oblique to the width direction X and length direction Y of the vapor chamber.
In this example, the orientations of the plurality of capillary structures are different, but when the capillary structures are provided at a plurality of locations, the orientations may be the same or different. This also applies to other embodiments.

 筐体の平面形状がC字状である場合に、液溜まり部が複数箇所に生じることがあるので、それぞれの箇所にキャピラリーストラクチャーを備えることにより、最大熱輸送量を向上させることができる。
 なお、図5Dには液溜まり部を2カ所に示しているが、ベーパーチャンバーの向きによって液溜まり部の生じる位置は異なる。実際には、図5Dに記載のベーパーチャンバーにおいて、Y方区が鉛直方向下側を向いている場合は、第1辺61Gの近傍に液溜まり部が生じるが、第1辺61Hの近傍には液溜まり部が生じない。
When the planar shape of the housing is C-shaped, liquid pools may occur at a plurality of locations. By providing capillary structures at each location, the maximum amount of heat transport can be improved.
Although two liquid pools are shown in FIG. 5D, the locations of the liquid pools differ depending on the orientation of the vapor chamber. Actually, in the vapor chamber shown in FIG. 5D, when the Y direction faces downward in the vertical direction, a liquid pool occurs near the first side 61G, but near the first side 61H. No liquid stagnant part occurs.

 図5Eに示すベーパーチャンバー4Eは、筐体10Eの平面形状が、クランク形状となっている。
 ベーパーチャンバー4Eでは、第1辺61Iと第2辺62Iの内角、第1辺61Jと第2辺62Jの内角はいずれも270°となっている。
A vapor chamber 4E shown in FIG. 5E has a housing 10E whose planar shape is a crank shape.
In the vapor chamber 4E, both the internal angle between the first side 61I and the second side 62I and the internal angle between the first side 61J and the second side 62J are 270°.

 第1辺61Iにはキャピラリーストラクチャー70Kが近接しており、第1辺61Jにはキャピラリーストラクチャー70Lが近接している。
 キャピラリーストラクチャー70Kはウィック30jに接し、キャピラリーストラクチャー70Lはウィック30kに接している。
The capillary structure 70K is close to the first side 61I, and the capillary structure 70L is close to the first side 61J.
Capillary structure 70K is in contact with wick 30j and capillary structure 70L is in contact with wick 30k.

 筐体の平面形状がクランク形状である場合に、液溜まり部が複数箇所に生じることがあるので、それぞれの箇所にキャピラリーストラクチャーを備えることにより、最大熱輸送量を向上させることができる。
 なお、図5Eには液溜まり部を2カ所に示しているが、ベーパーチャンバーの向きによって液溜まり部の生じる位置は異なる。実際には、図5Eに記載のベーパーチャンバーにおいて、Y方向が鉛直方向下側を向いている場合は、第1辺61Iの近傍に液溜まり部が生じるが、第1辺61Jの近傍には液溜まり部が生じない。
When the planar shape of the housing is crank-shaped, liquid pools may occur at a plurality of locations. By providing capillary structures at each location, the maximum amount of heat transport can be improved.
Although two liquid pools are shown in FIG. 5E, the locations where the liquid pools are formed differ depending on the orientation of the vapor chamber. Actually, in the vapor chamber shown in FIG. 5E, when the Y direction faces vertically downward, a liquid pool occurs near the first side 61I, but the liquid accumulates near the first side 61J. No stagnant part occurs.

[第5実施形態]
 本発明の第5実施形態では、筐体の内壁面に設けられた溝であるマイクロ流路の断面形状が第1実施形態と異なる。
 第1実施形態では、マイクロ流路70の断面形状は長方形であったが、第5実施形態としては他の形状のマイクロ流路を例示する。
 図6A、図6B及び図6Cは、マイクロ流路の断面形状が異なる例を模式的に示す断面図である。これらの図では、図2Dと同じく、ウィック30(第2多孔体42)と重なる部分におけるマイクロ流路の形状を示している。
[Fifth embodiment]
In the fifth embodiment of the present invention, the cross-sectional shape of microchannels, which are grooves provided on the inner wall surface of the housing, differs from that in the first embodiment.
In the first embodiment, the microchannel 70 has a rectangular cross-sectional shape, but the fifth embodiment exemplifies a microchannel of another shape.
6A, 6B, and 6C are cross-sectional views schematically showing examples in which microchannels have different cross-sectional shapes. These figures show the shape of the microchannel in the portion overlapping with the wick 30 (second porous body 42), as in FIG. 2D.

 図6Aには、断面が半円形状のマイクロ流路70aを示している。
 図6Bには、断面が三角形状のマイクロ流路70bを示している。
 図6Cには、断面が台形状のマイクロ流路70cを示している。
 このような形状の各マイクロ流路は、筐体10を構成する第2シート12を厚さ方向に凹ませることによって形成された溝であり、いずれも液体流路として作用する。
FIG. 6A shows a microchannel 70a having a semicircular cross section.
FIG. 6B shows a microchannel 70b having a triangular cross section.
FIG. 6C shows a microchannel 70c having a trapezoidal cross section.
Each microchannel having such a shape is a groove formed by recessing the second sheet 12 forming the housing 10 in the thickness direction, and all of them act as liquid channels.

 このような形状のマイクロ流路における溝の深さは、溝の深さが最も深くなる位置で計測した深さとする。図6Aに示す半円形状であれば溝の深さは円の半径であり、図6Bに示す三角形状であれば溝の深さは上の頂点から下に引いた垂線の長さ(三角形の高さ)である。図6Cに示す台形状であれば溝の深さは上辺と下辺の間の距離である。
 また、溝の幅は、マイクロ流路が露出する部分の幅とする。図6Aに示す半円形状であれば溝の幅は円の直径であり、図6Bに示す三角形状であれば溝の幅は底辺の長さである。図6Cに示す台形状であれば溝の幅は下辺の長さである。
The depth of the groove in the microchannel having such a shape is the depth measured at the deepest position of the groove. In the case of the semicircular shape shown in FIG. 6A, the depth of the groove is the radius of the circle, and in the case of the triangular shape shown in FIG. height). For the trapezoidal shape shown in FIG. 6C, the depth of the groove is the distance between the top and bottom sides.
The width of the groove is the width of the portion where the microchannel is exposed. In the case of the semicircular shape shown in FIG. 6A, the width of the groove is the diameter of the circle, and in the case of the triangular shape shown in FIG. 6B, the width of the groove is the length of the base. In the trapezoidal shape shown in FIG. 6C, the width of the groove is the length of the lower side.

[第6実施形態]
 本発明の第6実施形態では、筐体の第1内壁面及び第2内壁面の両方に、筐体の内壁面に設けられた溝であるマイクロ流路が設けられている。
 図7は、マイクロ流路が筐体の第1内壁面及び第2内壁面の両方に設けられた例を模式的に示す断面図である。この図では、図2Dと同じく、ウィック30(第2多孔体42)と重なる部分におけるマイクロ流路の形状を示している。
[Sixth embodiment]
In the sixth embodiment of the present invention, both the first inner wall surface and the second inner wall surface of the housing are provided with microchannels, which are grooves provided in the inner wall surface of the housing.
FIG. 7 is a cross-sectional view schematically showing an example in which microchannels are provided on both the first inner wall surface and the second inner wall surface of the housing. As in FIG. 2D, this figure shows the shape of the microchannel in the portion overlapping with the wick 30 (second porous body 42).

 図7には、筐体の第1内壁面11a及び第2内壁面12aの両方にマイクロ流路70aが設けられた例を示している。マイクロ流路70aは図6Aに示した断面が半円形状のマイクロ流路である。
 図7では、第1内壁面11aに設けられたマイクロ流路の断面形状と第2内壁面12aに設けられたマイクロ流路の形状は同じ半円形状であるが、異なる形状であってもよい。また、マイクロ流路の数も同じ(5本)としているが、数が異なっていてもよい。さらに、マイクロ流路の幅や深さ、複数のマイクロ流路間の間隔についても、図7では同じとしているが、それぞれが異なっていてもよい。
FIG. 7 shows an example in which microchannels 70a are provided on both the first inner wall surface 11a and the second inner wall surface 12a of the housing. The microchannel 70a is a microchannel having a semicircular cross section shown in FIG. 6A.
In FIG. 7, the cross-sectional shape of the microchannel provided on the first inner wall surface 11a and the shape of the microchannel provided on the second inner wall surface 12a are the same semicircular shape, but they may be different shapes. . Also, the number of microchannels is the same (five), but the number may be different. Furthermore, although the width and depth of the microchannel and the spacing between the microchannels are the same in FIG. 7, they may be different.

 第5実施形態及び第6実施形態に示す各マイクロ流路は、いずれも第1シート又は第2シートを厚さ方向に凹ませることによって形成された溝である。第1シート又は第2シートに溝を形成する方法としては、エッチング、プレス、機械加工等の方法が挙げられ、その方法は特に限定されるものではない。 Each microchannel shown in the fifth and sixth embodiments is a groove formed by recessing the first sheet or the second sheet in the thickness direction. Methods for forming grooves in the first sheet or the second sheet include etching, pressing, machining, and the like, and the method is not particularly limited.

[第7実施形態]
 本発明の第7実施形態では、キャピラリーストラクチャーが、筐体の内壁面に設けられた溝ではない形態である点で第1実施形態と異なる。
 第7実施形態ではキャピラリーストラクチャーが筐体の内壁面に設けられた溝ではない形態について例示する。
 図8Aは、追加部により挟まれた空間をキャピラリーストラクチャーとする例を模式的に示す斜視図である。図8Bは、多孔体をキャピラリーストラクチャーとする例を模式的に示す斜視図である。
[Seventh Embodiment]
The seventh embodiment of the present invention differs from the first embodiment in that the capillary structure is not a groove provided on the inner wall surface of the housing.
The seventh embodiment exemplifies a form in which the capillary structure is not a groove provided on the inner wall surface of the housing.
FIG. 8A is a perspective view schematically showing an example in which a space sandwiched by additional parts is used as a capillary structure. FIG. 8B is a perspective view schematically showing an example in which a porous body has a capillary structure.

 図8Aには、第1シート11の第1内壁面11aの上に筐体の追加部81を複数箇所設けた形態を示している。追加部81は複数本がウィック30(図8Aには第1多孔体41を示す)に向かって延びている。隣接する追加部81の間には所定の空間が設けられており、この空間がキャピラリーストラクチャー80となる。
 キャピラリーストラクチャー80は毛細管力により液相の作動媒体20を流通させる液体流路として機能できる程度の深さ及び幅を有している。
 その空間の深さは5μm以上、50μm以下とすることが好ましく、その空間の幅は5μm以上、100μm以下とすることが好ましい。
FIG. 8A shows a form in which a plurality of additional parts 81 of the housing are provided on the first inner wall surface 11 a of the first sheet 11 . A plurality of additional portions 81 extend toward the wick 30 (the first porous body 41 is shown in FIG. 8A). A predetermined space is provided between the adjacent additional portions 81 , and this space becomes the capillary structure 80 .
The capillary structure 80 has such a depth and width that it can function as a liquid channel through which the liquid-phase working medium 20 flows by capillary force.
The depth of the space is preferably 5 μm or more and 50 μm or less, and the width of the space is preferably 5 μm or more and 100 μm or less.

 追加部81は、第1シート11の第1内壁面11aに対して、アディティブ法(パターンめっき)によりその厚みを厚くした部分とすることができる。また、第1シート11の第1内壁面11aに対して何かの材料を貼り付けることで局所的に厚さを増した部分であってもよい。アディティブ法により形成される追加部は筐体と同じ材質であることが好ましく、筐体が銅であって追加部も銅であることが好ましい。
 追加部81が厚すぎると蒸気流路を分断してしまうために均熱性が低下する。そのため、追加部81の厚さは内部空間の厚さの30%以下とすることが好ましい。
The additional portion 81 can be a portion in which the thickness of the first inner wall surface 11a of the first sheet 11 is increased by an additive method (pattern plating). Alternatively, it may be a portion that is locally increased in thickness by attaching some material to the first inner wall surface 11a of the first sheet 11 . The additional portion formed by the additive method is preferably made of the same material as the housing, and preferably the housing is made of copper and the additional portion is also made of copper.
If the additional portion 81 is too thick, the steam flow path will be divided, resulting in a decrease in heat uniformity. Therefore, the thickness of the additional portion 81 is preferably 30% or less of the thickness of the internal space.

 図8Bには、第1シート11の第1内壁面11aの上に多孔体からなるキャピラリーストラクチャー90を設けた形態を示している。キャピラリーストラクチャー90はその一端(第2端部)がウィック30(図8Aには第1多孔体41を示す)に接している。
 キャピラリーストラクチャー90は多孔体からなり、ウィックを構成する第1多孔体及び第2多孔体と同様の材料を使用することができる。
 キャピラリーストラクチャー90が厚すぎると蒸気流路を分断してしまうために均熱性が低下する。そのため、キャピラリーストラクチャー90の厚さは内部空間の厚さの30%以下とすることが好ましい。
 また、キャピラリーストラクチャー90は、筐体の第1内壁面及び第2内壁面の両方に接してはいない。そのため、ウィックを構成する第1多孔体及び第2多孔体とは区別される。
FIG. 8B shows a mode in which a capillary structure 90 made of a porous material is provided on the first inner wall surface 11a of the first sheet 11. FIG. One end (second end) of the capillary structure 90 is in contact with the wick 30 (the first porous body 41 is shown in FIG. 8A).
The capillary structure 90 is made of a porous body, and the same materials as those of the first and second porous bodies that constitute the wick can be used.
If the capillary structure 90 is too thick, it cuts off the steam flow path, resulting in a decrease in heat uniformity. Therefore, the thickness of the capillary structure 90 is preferably 30% or less of the thickness of the internal space.
Also, the capillary structure 90 is not in contact with both the first inner wall surface and the second inner wall surface of the housing. Therefore, it is distinguished from the first porous body and the second porous body that constitute the wick.

 図8Bには、キャピラリーストラクチャー90としてひとつの板状の部材を示しているが、棒状の部材を複数本並べたような構成であってもよく、その形状は特に限定されるものではない。
 また、キャピラリーストラクチャー90の幅は限定されない。
Although FIG. 8B shows one plate-like member as the capillary structure 90, it may have a structure in which a plurality of rod-like members are arranged, and its shape is not particularly limited.
Also, the width of the capillary structure 90 is not limited.

 また、多孔体からなるキャピラリーストラクチャー90に代えて、繊維を線状に束ねた繊維束をキャピラリーストラクチャーとして使用してもよい。 Also, instead of the capillary structure 90 made of a porous material, a fiber bundle in which fibers are linearly bundled may be used as the capillary structure.

[第8実施形態]
 本発明の第8実施形態では、筐体の内部空間内に、筐体の形状を維持するためのピラーが設けられている。ピラーが設けられている場合のキャピラリーストラクチャーの位置について説明する。
 図9Aは、筐体内にピラーが設けられているベーパーチャンバーの一例を模式的に示す平面図である。
 図9Bは図9AのD-D線断面図である。
[Eighth embodiment]
In the eighth embodiment of the present invention, pillars are provided in the internal space of the housing for maintaining the shape of the housing. The position of the capillary structure when pillars are provided will be described.
FIG. 9A is a plan view schematically showing an example of a vapor chamber in which pillars are provided inside a housing.
FIG. 9B is a cross-sectional view taken along line DD of FIG. 9A.

 図9Aに示すベーパーチャンバー5では、筐体10F内にピラー11bが多数設けられている。ピラー11bは第1シート11の第1内壁面11aに所定の間隔で設けられた柱であり、第1シート11と一体であってもよい。例えば、第1シート11の第1内壁面11aをエッチング加工することにより形成されていてもよい。
 ピラー11bを設けることによって第1シート11と第2シート12の間隔をピラー11bの高さ以上に維持することができ、内部空間が狭く(薄く)なってしまうことが防止される。
In the vapor chamber 5 shown in FIG. 9A, many pillars 11b are provided inside the housing 10F. The pillars 11 b are columns provided at predetermined intervals on the first inner wall surface 11 a of the first sheet 11 and may be integrated with the first sheet 11 . For example, it may be formed by etching the first inner wall surface 11 a of the first sheet 11 .
By providing the pillars 11b, the gap between the first sheet 11 and the second sheet 12 can be maintained at the height of the pillars 11b or more, thereby preventing the internal space from becoming narrow (thin).

 筐体の内部空間内にピラーが設けられる場合に、キャピラリーストラクチャーはピラーが設けられていない側の内壁面に設けることが好ましい。
 図9Bには、第2シート12の第2内壁面12aにキャピラリーストラクチャー70を設けた例を示している。
When pillars are provided in the internal space of the housing, the capillary structure is preferably provided on the inner wall surface on the side where the pillars are not provided.
FIG. 9B shows an example in which a capillary structure 70 is provided on the second inner wall surface 12a of the second sheet 12. As shown in FIG.

 キャピラリーストラクチャーを、ピラーが設けられていないシートの内壁面に設けるようにすると、キャピラリーストラクチャーの形成とピラーの形成をそれぞれ分けて行うことができ、工程上のメリットがある。同じシートにキャピラリーストラクチャーとピラーを形成するようにすると工程が複雑になってしまう。 By providing the capillary structure on the inner wall surface of the sheet where the pillar is not provided, the formation of the capillary structure and the formation of the pillar can be performed separately, which is advantageous in terms of the process. Forming the capillary structure and the pillars on the same sheet complicates the process.

 例えば、形成する内部空間と同程度の厚さを有する銅箔をエッチングしてピラーを形成する場合に、ピラーとなる部分をエッチングしないようにして他の部分をエッチングすれば、エッチングされなかった部分にピラーを形成できる。このとき、同じ銅箔に対してさらにキャピラリーストラクチャーを溝として形成しようとすると、ピラーの配置と干渉しないように、別にキャピラリーストラクチャーとなる溝のパターンを描く必要がある。
 そして、その溝の部分だけは、ピラーを形成するためのエッチングとは別に異なる深さでのエッチング処理を行う必要がある。そのため、工程が複雑になってしまう。
For example, when a pillar is formed by etching a copper foil having a thickness similar to that of the internal space to be formed, if the other portion is etched while not etching the portion that will become the pillar, the portion that was not etched can be removed. can form pillars in At this time, if another capillary structure is to be formed as a groove on the same copper foil, it is necessary to draw a separate groove pattern for the capillary structure so as not to interfere with the arrangement of the pillars.
Only the groove portion needs to be etched to a different depth than the etching for forming the pillars. Therefore, the process becomes complicated.

 なお、図9Aに示す形態では、第1シートの内壁面にピラーを設けているが、上記形態とは異なり、第2シートの内壁面にピラーを設けていてもよい。この場合、キャピラリーストラクチャーは第1シートの内壁面に設けられることが好ましい。 In the embodiment shown in FIG. 9A, pillars are provided on the inner wall surface of the first sheet, but unlike the above embodiment, pillars may be provided on the inner wall surface of the second sheet. In this case, the capillary structure is preferably provided on the inner wall surface of the first sheet.

[第9実施形態]
 本発明の第9実施形態では、ウィックの形態が第1実施形態と異なる。ウィックの他の例について説明する。
[Ninth Embodiment]
The ninth embodiment of the present invention differs from the first embodiment in the form of the wick. Another example of a wick will be described.

 第1実施形態では、ウィックが第1多孔体及び第2多孔体を含み、ウィックにおいて、第1多孔体と第2多孔体との間には、第1多孔体及び第2多孔体が延びる方向に沿って間隔が設けられることにより液相流路が形成されていたが、ウィックが液相流路を有さない形態であってもよい。
 図10は、ウィックが液相流路を有さないベーパーチャンバーの一例を模式的に示す平面図である。
 図10に示すベーパーチャンバー6では、図2Aに示すベーパーチャンバー1と異なり、ウィック130は、1本の多孔体であり、第1多孔体41と第2多孔体42とを含まない。そのため、ベーパーチャンバー6では、液相流路51は形成されないが、ウィック130を構成する1本の多孔体によって液体流路が形成される。
In the first embodiment, the wick includes a first porous body and a second porous body, and in the wick, between the first porous body and the second porous body, the direction in which the first porous body and the second porous body extend Although the liquid-phase flow path is formed by providing a gap along the wick, the wick may have a form in which it does not have a liquid-phase flow path.
FIG. 10 is a plan view schematically showing an example of a vapor chamber in which the wick does not have a liquid phase flow path.
In vapor chamber 6 shown in FIG. 10, unlike vapor chamber 1 shown in FIG. 2A, wick 130 is a single porous body and does not include first porous body 41 and second porous body . Therefore, in the vapor chamber 6 , the liquid channel 51 is not formed, but the liquid channel is formed by one porous body forming the wick 130 .

 また、これまで説明した各実施形態ではウィックが多孔体である例について説明したが、各実施形態においてウィックは多孔体に限定されるものではない。ウィックとして、多孔体の他には、繊維を線状に束ねた繊維束を使用することができる。
 繊維束としては、編み込み状の繊維束を使用することができる。
 繊維としては、例えば、銅、アルミニウム、ステンレスなどの金属線や、カーボン繊維、ガラス繊維などの非金属線を用いることができる。中でも、金属線は、熱伝導率が高いため好ましい。例えば、直径が0.03mm程度の銅線を200本程度束ねることで繊維束とすることができる。
Also, in each of the embodiments described so far, the example in which the wick is a porous body has been described, but the wick in each embodiment is not limited to a porous body. As the wick, in addition to the porous body, a fiber bundle obtained by linearly bundling fibers can be used.
A braided fiber bundle can be used as the fiber bundle.
As the fibers, for example, metal wires such as copper, aluminum, and stainless steel wires, and non-metal wires such as carbon fibers and glass fibers can be used. Among them, a metal wire is preferable because of its high thermal conductivity. For example, a fiber bundle can be obtained by bundling about 200 copper wires with a diameter of about 0.03 mm.

[熱拡散デバイスを備える電子機器]
 本発明の熱拡散デバイスは、放熱を目的として電子機器に搭載され得る。したがって、本発明の熱拡散デバイスと、上記熱拡散デバイスを構成する筐体の外壁面に取り付けられた電子部品と、を備える電子機器として使用することができる。
 本発明の熱拡散デバイスは上記のとおり、外部動力を必要とせず自立的に作動し、作動媒体の蒸発潜熱及び凝縮潜熱を利用して、二次元的に高速で熱を拡散することができる。そのため、本発明の熱拡散デバイスを備える電子機器により、電子機器内部の限られたスペースにおいて、放熱を効果的に実現することができる。
 電子部品は、図1に示す熱源HSに相当する。
[Electronic Equipment Equipped with Heat Diffusion Device]
The heat diffusion device of the present invention can be mounted on electronic equipment for the purpose of heat dissipation. Therefore, it can be used as an electronic device comprising the heat diffusion device of the present invention and an electronic component attached to the outer wall surface of the housing constituting the heat diffusion device.
As described above, the heat diffusion device of the present invention operates independently without the need for external power, and utilizes the latent heat of vaporization and latent heat of condensation of the working medium to diffuse heat two-dimensionally and at high speed. Therefore, an electronic device equipped with the heat diffusion device of the present invention can effectively dissipate heat in a limited space inside the electronic device.
The electronic component corresponds to the heat source HS shown in FIG.

 電子機器としては、例えばスマートフォン、タブレット端末、ノートパソコン、ゲーム機器、ウェアラブルデバイス等が挙げられる。また、冷却すべき対象物である電子部品としては、例えば中央処理装置(CPU)、発光ダイオード(LED)、パワー半導体等の発熱素子が挙げられる。 Examples of electronic devices include smartphones, tablet terminals, laptops, game machines, and wearable devices. Electronic parts that are objects to be cooled include, for example, heat-generating elements such as central processing units (CPUs), light-emitting diodes (LEDs), and power semiconductors.

 電子機器において、電子部品は、筐体の第1内壁面の反対側に位置する外壁面に取り付けられることが好ましい。この場合、筐体は、第1内壁面に蒸発部を有し、厚さ方向からの平面視で、電子部品は、蒸発部に位置する。 In the electronic device, the electronic components are preferably attached to the outer wall surface located on the opposite side of the first inner wall surface of the housing. In this case, the housing has an evaporator on the first inner wall surface, and the electronic component is positioned in the evaporator when viewed from the thickness direction.

 電子部品は、筐体の外壁面に直接取り付けられてもよく、あるいは、熱伝導性の高い粘着剤、シート、テープ等の他の部材を介して取り付けられてもよい。 The electronic components may be attached directly to the outer wall surface of the housing, or may be attached via other members such as adhesives, sheets, and tapes with high thermal conductivity.

 本発明の熱拡散デバイスは、携帯情報端末等の分野において、広範な用途に使用できる。例えば、CPU等の熱源の温度を下げ、電子機器の使用時間を延ばすために使用することができ、スマートフォン、タブレット端末、ノートパソコン等に使用することができる。 The heat diffusion device of the present invention can be used for a wide range of applications in fields such as personal digital assistants. For example, it can be used to lower the temperature of a heat source such as a CPU and extend the operating time of electronic equipment, and can be used in smartphones, tablet terminals, laptop computers, and the like.

 1、2A、2B、3、4A、4B、4C、4D、4E、5、6 ベーパーチャンバー
 10、10A、10B、10C、10D、10E、10F 筐体
 11 第1シート
 11a 第1内壁面
 11b ピラー
 12 第2シート
 12a 第2内壁面
 13 空間
 20 作動媒体
 30、30a、30b、30c、30d、30e、30f、30g、30h、30i、30j、30k、130 ウィック
 41 第1多孔体
 42 第2多孔体
 50 蒸気流路
 51 液相流路
 61、61A、61B、61C、61D、61E、61G、61H、61I、61J 第1辺
 62、62A、62B、62C、62D、62E、62F、62G、62I、62J 第2辺
 70、70a、70b、70c キャピラリーストラクチャー(マイクロ流路)
 70A、70B、70C、70D、70E、70F、70G、70H、70I、70J、70K、70L キャピラリーストラクチャー
 71 第1端部(第1部)
 71´ 第1部
 72 第2端部(第2部)
 72´ 第2部
 80 キャピラリーストラクチャー(空間)
 81 追加部
 90 キャピラリーストラクチャー(多孔体)
 HS 熱源
 EP 蒸発部
1, 2A, 2B, 3, 4A, 4B, 4C, 4D, 4E, 5, 6 vapor chamber 10, 10A, 10B, 10C, 10D, 10E, 10F housing 11 first sheet 11a first inner wall surface 11b pillar 12 Second sheet 12a Second inner wall surface 13 Space 20 Working medium 30, 30a, 30b, 30c, 30d, 30e, 30f, 30g, 30h, 30i, 30j, 30k, 130 Wick 41 First porous body 42 Second porous body 50 Steam channel 51 Liquid phase channel 61, 61A, 61B, 61C, 61D, 61E, 61G, 61H, 61I, 61J First side 62, 62A, 62B, 62C, 62D, 62E, 62F, 62G, 62I, 62J 2 sides 70, 70a, 70b, 70c capillary structure (microchannel)
70A, 70B, 70C, 70D, 70E, 70F, 70G, 70H, 70I, 70J, 70K, 70L capillary structure 71 first end (first part)
71' first part 72 second end (second part)
72' Part 2 80 Capillary structure (space)
81 additional part 90 capillary structure (porous body)
HS Heat source EP Evaporator

Claims (11)

 厚さ方向に対向する第1内壁面及び第2内壁面を有する筐体と、
 前記筐体の内部空間に封入された作動媒体と、
 前記筐体の内部空間に配置されたウィックと、を備え、
 前記ウィックは、前記厚さ方向に垂直な方向に沿い、前記筐体の前記第1内壁面及び前記第2内壁面に接する部分を有し、
 前記筐体の内部空間には、蒸気流路が形成されており、
 前記厚さ方向から見た前記筐体の平面形状は、180°以上の内角を形成する第1辺と第2辺を有する形状であり、
 前記筐体の内部空間には、前記第1辺又は前記第2辺に近接する第1部及び前記ウィックに接している第2部を有するキャピラリーストラクチャーをさらに備える、熱拡散デバイス。
a housing having a first inner wall surface and a second inner wall surface facing each other in the thickness direction;
a working medium enclosed in the internal space of the housing;
a wick arranged in the internal space of the housing,
The wick has a portion along a direction perpendicular to the thickness direction and in contact with the first inner wall surface and the second inner wall surface of the housing,
A steam flow path is formed in the internal space of the housing,
The planar shape of the housing viewed from the thickness direction is a shape having a first side and a second side forming an internal angle of 180° or more,
The heat spreading device further comprising a capillary structure in the interior space of the housing, the capillary structure having a first portion adjacent to the first side or the second side and a second portion contacting the wick.
 前記ウィックは、第1多孔体及び第2多孔体を含み、
 前記ウィックにおいて、前記第1多孔体と前記第2多孔体との間には、前記第1多孔体及び前記第2多孔体が延びる方向に沿って間隔が設けられることにより液相流路が形成されている、請求項1に記載の熱拡散デバイス。
The wick includes a first porous body and a second porous body,
In the wick, a gap is provided between the first porous body and the second porous body along the direction in which the first porous body and the second porous body extend, thereby forming a liquid phase flow path. The heat-spreading device of claim 1, wherein the heat-spreading device is
 前記キャピラリーストラクチャーの前記第1部は、前記第1辺又は前記第2辺に接している、請求項1又は2に記載の熱拡散デバイス。 The thermal diffusion device according to claim 1 or 2, wherein said first part of said capillary structure is in contact with said first side or said second side.  前記キャピラリーストラクチャーの前記第2部は、1つの前記ウィックに接している、請求項1~3のいずれか1項に記載の熱拡散デバイス。 The heat spreading device according to any one of claims 1 to 3, wherein said second part of said capillary structure is in contact with one said wick.  前記キャピラリーストラクチャーの前記第2部は、複数の前記ウィックに接している、請求項1~3のいずれか1項に記載の熱拡散デバイス。 The heat spreading device according to any one of claims 1 to 3, wherein said second part of said capillary structure is in contact with a plurality of said wicks.  前記キャピラリーストラクチャーは、前記筐体の前記第1内壁面及び前記第2内壁面の内の少なくとも一方の面に設けられた溝である請求項1~5のいずれか1項に記載の熱拡散デバイス。 The heat diffusion device according to any one of claims 1 to 5, wherein the capillary structure is a groove provided in at least one of the first inner wall surface and the second inner wall surface of the housing. .  前記溝の深さが10μm以上、30μm以下である請求項6に記載の熱拡散デバイス。 The heat diffusion device according to claim 6, wherein the groove has a depth of 10 µm or more and 30 µm or less.  前記溝の幅が30μm以上、100μm以下である請求項6又は7に記載の熱拡散デバイス。 The heat diffusion device according to claim 6 or 7, wherein the groove has a width of 30 µm or more and 100 µm or less.  前記キャピラリーストラクチャーは複数の前記溝からなる請求項6~8のいずれか1項に記載の熱拡散デバイス。 The thermal diffusion device according to any one of claims 6 to 8, wherein said capillary structure comprises a plurality of said grooves.  前記筐体は、前記作動媒体を蒸発させる蒸発部を有し、前記ウィックの端部は、前記蒸発部に位置する請求項1~9のいずれか1項に記載の熱拡散デバイス。 The heat diffusion device according to any one of claims 1 to 9, wherein the housing has an evaporator that evaporates the working medium, and the end of the wick is located in the evaporator.  前記筐体は、前記作動媒体を蒸発させる蒸発部を有し、前記第1辺は前記第2辺よりも前記蒸発部から遠くに位置しており、前記キャピラリーストラクチャーの前記第1部が前記第1辺に近接している請求項1~10のいずれか1項に記載の熱拡散デバイス。 The housing has an evaporating section that evaporates the working medium, the first side is located farther from the evaporating section than the second side, and the first section of the capillary structure extends from the first side. The heat spreading device according to any one of claims 1 to 10, adjacent to one side.
PCT/JP2022/005061 2021-04-28 2022-02-09 Thermal diffusion device Ceased WO2022230295A1 (en)

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Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08303971A (en) * 1995-04-28 1996-11-22 Fujikura Ltd Flat heat pipe for cooling portable personal computer and manufacturing method thereof
JP2008153423A (en) * 2006-12-18 2008-07-03 Yaskawa Electric Corp Vapor chamber and electronic device using the same
JP2011085311A (en) * 2009-10-15 2011-04-28 Sony Corp Heat transport device, method for manufacturing heat transport device and electronic device
JP2011226743A (en) * 2010-04-22 2011-11-10 Fujikura Ltd Flat heat pipe
JP2016023821A (en) * 2014-07-16 2016-02-08 株式会社フジクラ Flat heat pipe
US20170160017A1 (en) * 2015-12-04 2017-06-08 Intel Corporation Non-metallic vapor chambers
JP2018185110A (en) * 2017-04-26 2018-11-22 株式会社フジクラ heat pipe

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08303971A (en) * 1995-04-28 1996-11-22 Fujikura Ltd Flat heat pipe for cooling portable personal computer and manufacturing method thereof
JP2008153423A (en) * 2006-12-18 2008-07-03 Yaskawa Electric Corp Vapor chamber and electronic device using the same
JP2011085311A (en) * 2009-10-15 2011-04-28 Sony Corp Heat transport device, method for manufacturing heat transport device and electronic device
JP2011226743A (en) * 2010-04-22 2011-11-10 Fujikura Ltd Flat heat pipe
JP2016023821A (en) * 2014-07-16 2016-02-08 株式会社フジクラ Flat heat pipe
US20170160017A1 (en) * 2015-12-04 2017-06-08 Intel Corporation Non-metallic vapor chambers
JP2018185110A (en) * 2017-04-26 2018-11-22 株式会社フジクラ heat pipe

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