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WO2022138000A1 - Electroconductive film and display device - Google Patents

Electroconductive film and display device Download PDF

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Publication number
WO2022138000A1
WO2022138000A1 PCT/JP2021/043671 JP2021043671W WO2022138000A1 WO 2022138000 A1 WO2022138000 A1 WO 2022138000A1 JP 2021043671 W JP2021043671 W JP 2021043671W WO 2022138000 A1 WO2022138000 A1 WO 2022138000A1
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WO
WIPO (PCT)
Prior art keywords
light
resin
region
conductive film
transmitting
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/JP2021/043671
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French (fr)
Japanese (ja)
Inventor
浩 新開
大介 園田
祥久 玉川
康正 張原
智之 五井
謙一 手塚
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TDK Corp
Original Assignee
TDK Corp
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Filing date
Publication date
Application filed by TDK Corp filed Critical TDK Corp
Priority to JP2022572020A priority Critical patent/JP7623404B2/en
Publication of WO2022138000A1 publication Critical patent/WO2022138000A1/en
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00—Layered products comprising a layer of synthetic resin
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B5/00—Non-insulated conductors or conductive bodies characterised by their form
    • H01B5/14—Non-insulated conductors or conductive bodies characterised by their form comprising conductive layers or films on insulating-supports

Definitions

  • the present invention relates to a conductive film and a display device.
  • a conductive member having a conductor portion having a pattern including an opening formed by a thin metal wire may be used.
  • a mesh-like pattern as a dummy member is provided in addition to the conductor portion that actually functions as a conductor.
  • the thin metal wire to be formed is provided over the entire image display area (for example, Patent Document 1).
  • a conductive film having a film-like base material and a conductor portion having a pattern including an opening, and not provided with a thin metal wire as a dummy member in a region other than the conductor portion It is considered effective to incorporate the above into the display device.
  • a conductive film further having an insulating resin portion that fills the opening of the conductor portion is expected to be easy to manufacture.
  • the optical path length differs between the light transmitted through the insulating resin portion and the light transmitted through the other portions, mainly due to the difference between the refractive index of the insulating resin portion and the refractive index of air. Therefore, it may interfere with normal image display.
  • the present invention provides a conductive film that suppresses the occurrence of moire in a displayed image and easily secures a highly uniform optical path length when incorporated in a display device.
  • the present invention comprises a film-shaped light-transmitting substrate, a conductive layer provided on a first region occupying a part of one main surface of the light-transmitting substrate, and the light-transmitting group.
  • a conductive film comprising one main surface of a material, a light-transmitting resin layer provided so as to cover the entire second region including a region other than the first region.
  • the conductive layer includes a conductor portion including a portion extending in the in-plane direction of the main surface of the light transmissive base material and having a pattern including an opening, and an insulating resin portion filling the inside of the opening of the conductor portion.
  • the conductive film is provided with a light-transmitting resin layer in the entire second region including a region other than the first region in which the conductive layer including the insulating resin portion is provided, this is incorporated into the display device. At the same time, the generation of moire caused by the dummy member is suppressed, and it is easy to secure a highly uniform optical path length for the light for displaying the image.
  • the area of the first region may be smaller than the area of the second region.
  • the conductor portion can be provided while reducing the influence on the image display.
  • the pattern including the opening of the conductor portion may be a mesh-like pattern.
  • the conductor portion of the portion having the mesh-like pattern can function well as, for example, a radiating element of an antenna.
  • the transparent resin layer and the insulating resin portion may be a cured product of a curable resin composition.
  • a conductive film having a cured product of a curable resin composition as a transparent resin layer and an insulating resin portion tends to have good light transmittance and is easy to manufacture.
  • the transparent resin layer and the insulating resin portion may be formed of the same resin. Since the transparent resin layer and the insulating resin portion formed of the same resin have the same refractive index, the optical path length transmitted through the conductive film can be further stabilized. From the same viewpoint, the conductor portion, the insulating resin portion, and the light-transmitting resin layer may have substantially the same thickness.
  • the difference between the refractive index of the light-transmitting substrate and the refractive index of the light-transmitting resin layer may be 0.1 or less. This makes it easier to ensure good visibility of the displayed image.
  • Another aspect of the present invention provides a display device provided with the above conductive film.
  • the conductive film according to one aspect of the present invention can suppress the occurrence of moire in the displayed image and ensure high uniformity of the optical path length when incorporated in the display device.
  • FIG. 1 is a plan view showing an embodiment of a conductive film
  • FIG. 2 is a cross-sectional view taken along the line II-II of FIG.
  • the conductive film 20 shown in FIGS. 1 and 2 is formed on a first region SA that occupies a part of a film-shaped light-transmitting base material 1 and one main surface 1S of the light-transmitting base material 1.
  • a light-transmitting resin layer provided so as to cover the entire second region SB including a region other than the first region SA in the provided conductive layer 5 and one main surface 1S of the light-transmitting base material 1. It is equipped with 7B.
  • the conductive layer 5 fills the inside of the conductor portion 3 including the portion of the main surface 1S of the light transmissive base material 1 extending in the in-plane direction and having a pattern including a plurality of openings 3a, and the inside of the openings 3a of the conductor portion 3. It has an insulating resin portion 7A.
  • the first region SA is a portion of the main surface 1S of the light transmissive base material 1 corresponding to the range shown by A in FIG. 2, and the conductive layer 5 is provided here.
  • the second region SB is a portion of the main surface 1S of the light transmissive base material 1 corresponding to the range shown by B in FIG. 2, and the light transmissive resin layer 7B is provided here.
  • One closed line of the conductor portion 3 along the outermost side surface when viewed from the direction perpendicular to the main surface 1S can be regarded as the outer edge of the first region SA.
  • the light transmissive resin layer 7B may be adjacent to the side surface of the conductor portion 3 located on the outer edge of the first region SA.
  • the entire portion of the main surface 1S of the light transmissive substrate 1 excluding the first region SA is the second region SB, and the second region SB.
  • a light-transmitting resin layer 7B is provided so as to cover the whole.
  • the main surface 1S of the light transmissive base material 1 may include a portion other than the first region SA and the second region SB, that is, a region in which the conductive layer 5 and the light transmissive resin layer 7B are not provided.
  • the second region SB may include a region corresponding to an image display region of the display device when the conductive film 20 is incorporated in the display device.
  • the total ratio of the first region SA and the second region SB in the main surface 1S of the light transmissive substrate 1 is, for example, 80 to 100 area%, 90 to 100 area%, 95 to 100 area%, or 100 area. May be%.
  • the area of the first region SA may be smaller than the area of the second region SB.
  • the conductive layer 5 can be provided while reducing the influence on the image display.
  • the ratio of the area of the first region SA that is, the area of the conductive layer 5 to the area of the main surface 1S of the light transmissive substrate 1 is 30 area% or less, 20 area% or less, and 10 area%. Below, it may be 5 area% or less, or it may be 1 area% or more.
  • the position of the first region SA on the main surface 1S of the light transmissive base material 1 is not particularly limited, but as illustrated in FIGS. 1 and 2, the first region SA is arranged near the outer edge of the main surface 1S, and the first region SA is arranged.
  • the two-region SB may include the central portion of the main surface 1S.
  • the light-transmitting base material 1 has a degree of light-transmitting property required when the conductive film 20 is incorporated in a display device. Specifically, the total light transmittance of the light-transmitting substrate 1 may be 90 to 100%. The haze of the light transmissive substrate 1 may be 0 to 5%.
  • the light-transmitting substrate 1 may be, for example, a transparent resin film, for example, polyethylene terephthalate (PET), polycarbonate (PC), polyethylene naphthalate (PEN), cycloolefin polymer (COP), or polyimide. (PI) film can be mentioned.
  • the light-transmitting base material 1 may be a glass substrate.
  • the light-transmitting base material 1 may be a laminate having a light-transmitting support film and a base layer provided on the support film.
  • the support film can be the transparent resin film.
  • the base layer is a layer provided for forming the conductor portion 3 by electroless plating or the like. When the conductor portion 3 is formed by another method, the base layer does not necessarily have to be provided.
  • the thickness of the light transmissive base material 1 or the support film constituting the same may be 10 ⁇ m or more, 20 ⁇ m or more, or 35 ⁇ m or more, and may be 500 ⁇ m or less, 200 ⁇ m or less, or 100 ⁇ m or less.
  • the base layer may be a layer containing a catalyst and a resin.
  • the resin may be a cured product of the curable resin composition.
  • the curable resin contained in the curable resin composition include amino resin, cyanate resin, isocyanate resin, polyimide resin, epoxy resin, oxetane resin, polyester, allyl resin, phenol resin, benzoxazine resin, xylene resin, and ketone.
  • Resins furan resins, COPNA resins, silicon resins, diclopentadiene resins, benzocyclobutene resins, episulfide resins, en-thiol resins, polyazomethine resins, polyvinylbenzyl ether compounds, acenaphthylene, and unsaturated double bonds, as well as cyclic ethers.
  • examples thereof include an ultraviolet curable resin containing a functional group that causes a polymerization reaction with ultraviolet rays such as vinyl ether.
  • a resin layer for improving the adhesion between the light-transmitting base material 1 and the base layer may be provided between the base layer containing the catalyst and the resin and the light-transmitting base material 1.
  • the catalyst contained in the base layer may be an electroless plating catalyst.
  • the electroless plating catalyst may be a metal selected from Pd, Cu, Ni, Co, Au, Ag, Pd, Rh, Pt, In, and Sn, and may be Pd.
  • the catalyst may be used alone or in combination of two or more. Normally, the catalyst is dispersed in the resin as catalyst particles.
  • the content of the catalyst in the base layer may be 3% by mass or more, 4% by mass or more, or 5% by mass or more, based on the total amount of the base layer, and may be 50% by mass or less, 40% by mass or less, or 25% by mass. It may be less than or equal to%.
  • the thickness of the base layer may be 10 nm or more, 20 nm or more, or 30 nm or more, and may be 500 nm or less, 300 nm or less, or 150 nm or less.
  • the conductor portion 3 constituting the conductive layer 5 includes a portion having a pattern including the opening 3a.
  • the pattern including the openings 3a may be a mesh-like pattern including a plurality of regularly arranged openings 3a formed by a plurality of linear portions intersecting each other.
  • the conductor portion 3 having a mesh-like pattern can function well, for example, as a radiating element of an antenna.
  • the conductor portion 3 may have a portion corresponding to a conductive member such as a ground terminal and a feeding terminal, in addition to a portion having a pattern including the opening 3a.
  • the conductor portion 3 may contain metal.
  • the conductor portion 3 may contain at least one metal selected from copper, nickel, cobalt, palladium, silver, gold, platinum and tin, and may contain copper.
  • the conductor portion 3 may be metal plating formed by a plating method.
  • the conductor portion 3 may further contain a non-metal element such as phosphorus as long as appropriate conductivity is maintained.
  • the insulating resin portion 7A is provided so as to fill the opening 3a of the conductor portion 3, and a flat surface may be formed by the insulating resin portion 7A and the conductor portion 3.
  • the light-transmitting resin layer 7B is formed of a light-transmitting resin.
  • the total light transmittance of the light-transmitting resin layer 7B may be 90 to 100%.
  • the haze of the light-transmitting resin layer 7B may be 0 to 5%.
  • the difference between the light-transmitting base material 1 (or the refractive index of the support film constituting the light-transmitting base material 1) and the refractive index of the light-transmitting resin layer 7B may be 0.1 or less. This makes it easier to ensure good visibility of the displayed image.
  • the refractive index (nd25) of the light-transmitting resin layer 7B may be, for example, 1.0 or more, 1.7 or less, 1.6 or less, or 1.5 or less.
  • the refractive index can be measured by a reflection spectroscopic film thickness meter.
  • the resin forming the insulating resin portion 7A and the light-transmitting resin layer 7B may be a cured product of a curable resin composition (photocurable resin composition or thermosetting resin composition).
  • the curable resin composition forming the insulating resin portion 7A and / or the light-transmitting resin layer 7B contains a curable resin, and examples thereof include acrylic resin, amino resin, cyanate resin, isocyanate resin, polyimide resin, and epoxy.
  • Resin oxetane resin, polyester, allyl resin, phenol resin, benzoxazine resin, xylene resin, ketone resin, furan resin, COPNA resin, silicon resin, diclopentadiene resin, benzocyclobutene resin, episulfide resin, en-thiol resin, poly Examples thereof include azomethine resins, polyvinylbenzyl ether compounds, acenaphthylene, and ultraviolet curable resins containing functional groups that undergo a polymerization reaction with ultraviolet rays such as unsaturated double bonds, cyclic ethers and vinyl ethers.
  • the resin forming the insulating resin portion 7A and the resin forming the light transmissive resin layer 7B may be the same. Since the insulating resin portion 7A and the light transmissive resin layer 7B formed of the same resin have the same refractive index, the uniformity of the optical path length transmitted through the conductive film 20 can be further improved.
  • the resin forming the insulating resin portion 7A and the resin forming the light transmissive resin layer 7B are the same, for example, the insulating resin portion 7A is formed by forming a pattern from one curable resin layer by an imprint method or the like. And the light-transmitting resin layer 7B can be easily formed collectively.
  • the conductor portion 3, the insulating resin portion 7A, and the light transmissive resin layer 7B may have substantially the same thickness.
  • the thickness of the conductor portion 3, the insulating resin portion 7A and the light transmitting resin layer 7B is relative to T. It may be within ⁇ 3 ⁇ m, within ⁇ 2 ⁇ m, within ⁇ 1 ⁇ m, within ⁇ 0.5 ⁇ m, or within ⁇ 0.3 ⁇ m.
  • the thickness of the conductor portion 3, the insulating resin portion 7A, and the light transmissive resin layer 7B may be 0.8 ⁇ m or more, 1.0 ⁇ m or more, or 1.2 ⁇ m or more, and may be 5 ⁇ m or less, 4 ⁇ m or less, or 3 ⁇ m or less. May be.
  • FIG. 3 is a plan view showing an example of the conductive layer.
  • the conductive layer 5 shown in FIG. 3 has a conductor portion 3, an insulating resin portion 7A, and a feeding terminal 8.
  • the conductor portion 3 has a mesh-like pattern including a plurality of linear portions, and has a wiring portion 31 including a radiating element, a ground electrode 33, and a terminal portion 6.
  • the terminal portion 6 includes two ground terminals 32 and a terminal pattern portion 80 which is a conductor portion 3 extending toward the outside of the wiring portion 31.
  • the ground electrode 33 is provided between the two ground terminals 32 while surrounding the radiating element of the wiring portion 31.
  • the width and shape of the linear portion constituting the ground electrode 33 can be the same as the width and shape of the linear portion constituting the wiring portion 31.
  • the power feeding terminal 8 extends in a plane so as to cover a part of the terminal pattern portion 80.
  • the power feeding terminal 8 is a conductor layer having a solid form.
  • the outer edge of the power feeding terminal 8 may be located inside the outer edge of the terminal pattern portion 80 (conductor portion 3). In this case, it is possible to prevent the outer edge of the power feeding terminal 8 from protruding from the outer edge of the conductor portion 3, thereby preventing the wiring portion 31 from short-circuiting with other terminal portions adjacent to the terminal portion 6. Further, it is possible to prevent the visibility of the conductive film from being improved due to the feeding terminal 8 protruding from the electrode side.
  • the terminal pattern portion 80 (conductor portion 3) covered by the feeding terminal 8 may have a mesh-like pattern similar to that of the conductor portion 3 not covered by the feeding terminal 8.
  • FIG. 4 is an enlarged cross-sectional view showing a portion of the conductive layer 5 of FIG. 3 in which the feeding terminal 8 is provided.
  • the power feeding terminal 8 shown in FIGS. 3 and 4 is formed so as to cover the surface of the terminal pattern portion 80 (conductor portion 3) and the surface of the insulating resin portion 7A that fills the opening of the terminal pattern portion 80.
  • the power feeding terminal 8 is integrally formed without a gap in the region surrounded by the outer edge thereof.
  • the power feeding terminal 8 may be divided into a plurality of regions, and the terminal pattern portion 80 (conductor portion 3) and the insulating resin portion 7A may be exposed in a slit shape between the divided regions.
  • the height of the terminal pattern portion 80 (conductor portion 3) of the portion covered by the feeding terminal 8 from the main surface 1S of the light transmissive base material 1 is the height of the insulating resin portion 7A. It may be larger than the height from the main surface 1S.
  • the surface 8S on the side opposite to the conductor portion 3 of the power feeding terminal 8 may be roughened. In other words, the surface roughness of the surface 8S may be larger than the surface roughness of the conductor portion 3.
  • the surface roughness here may be, for example, an arithmetic mean roughness Ra.
  • the thickness of the power feeding terminal 8 may be larger than the thickness of the conductor portion 3.
  • the ground terminal may be provided separately from the conductor portion extending on the main surface of the base material.
  • the ground terminal may be a conductor layer having a solid shape and extending in a plane so as to cover the terminal pattern portion as a terminal portion having a pattern including an opening.
  • the outer edge of the ground terminal may be located inside the outer edge of the terminal pattern portion (terminal portion, conductor portion) located below the ground terminal.
  • the terminal pattern portion covered with the ground terminal having a solid shape may have a mesh-like pattern similar to the conductor portion of the portion not covered with the ground terminal.
  • the conductive film has a power supply terminal having a solid form covering the terminal portion (terminal pattern portion), a ground terminal having a solid form covering the terminal portion (terminal pattern portion), or both of them. You may have.
  • the conductive film 20 can be manufactured by, for example, a method including pattern formation by an imprint method.
  • An example of a method for producing the conductive film 20 is to prepare a light-transmitting base material 1 having a support film and a base layer containing a catalyst provided on one main surface of the support film, and light.
  • a curable resin layer is formed on the main surface 1S on the base layer side of the permeable base material 1, and a trench in which the base layer is exposed is formed by an imprint method using a mold having a convex portion.
  • the present invention includes forming the conductor portion 3 for filling the trench by a electroless plating method in which metal plating is grown from the base layer.
  • the insulating resin portion 7A and the light-transmitting resin layer 7B having a pattern including an opening having an inverted shape of the convex portion of the mold are formed. Formed together.
  • the method for forming the insulating resin portion 7A having a pattern including an opening is not limited to the imprint method, and any method such as photolithography can be applied.
  • FIG. 5 is a cross-sectional view showing an embodiment of a display device incorporating a conductive film.
  • the display device 100 shown in FIG. 5 includes an image display unit 10 having an image display area 10S, a conductive film 20, a polarizing plate 30, and a cover glass 40.
  • the conductive film 20, the polarizing plate 30, and the cover glass 40 are laminated in this order from the image display unit 10 side on the image display area 10S side of the image display unit 10.
  • the configuration of the display device is not limited to the form shown in FIG. 5, and can be appropriately changed as needed.
  • the polarizing plate 30 may be provided between the image display unit 10 and the conductive film 20.
  • the image display unit 10 may be, for example, a liquid crystal display unit.
  • the polarizing plate 30 and the cover glass 40 those usually used in a display device can be used.
  • the polarizing plate 30 and the cover glass 40 do not necessarily have to be provided.
  • the light for displaying an image emitted from the image display area 10S of the image display unit 10 passes through a path having a highly uniform optical path length including the conductive film 20. As a result, it is possible to display a good image with high uniformity in which moire is suppressed.

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  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Laminated Bodies (AREA)
  • Shielding Devices Or Components To Electric Or Magnetic Fields (AREA)

Abstract

Disclosed is an electroconductive film comprising: a film-form optically transparent substrate; an electroconductive layer that is provided in a first region occupying a portion of one principal surface of the optically transparent substrate; and an optically transparent resin layer provided so as to cover the entirety of a second region, which includes a region on the one principal surface of the optically transparent substrate other than the first region. The electrically conductive layer has a conductor part that extends inward in the planar direction of the principal surface of the optically transparent substrate and that includes a patterned portion including an opening, and an insulation resin part that buries the opening in the conductor part.

Description

導電性フィルム、及び表示装置Conductive film and display device

　本発明は、導電性フィルム、及び表示装置に関する。 The present invention relates to a conductive film and a display device.

　液晶表示装置等の表示装置において、金属細線によって形成された、開口を含むパターンを有する導体部を有する導電部材が用いられることがある。その場合、導体部が設けられた部分と導体部が設けられない部分との境界が視認されることを防ぐために、実際に導体として機能する導体部以外に、ダミー部材としてのメッシュ状のパターンを形成する金属細線が画像表示領域全体にわたって設けられることが一般的である（例えば特許文献１）。 In a display device such as a liquid crystal display device, a conductive member having a conductor portion having a pattern including an opening formed by a thin metal wire may be used. In that case, in order to prevent the boundary between the portion provided with the conductor portion and the portion not provided with the conductor portion from being visually recognized, a mesh-like pattern as a dummy member is provided in addition to the conductor portion that actually functions as a conductor. Generally, the thin metal wire to be formed is provided over the entire image display area (for example, Patent Document 1).

国際公開第２０１９／０９３０４９号International Publication No. 2019/093049

　ダミー部材としてのメッシュ状のパターンを形成する金属細線が画像表示部全体にわたって設けられると、金属細線と表示装置の画素との干渉に起因して、表示画像にモアレが発生することがある。そのため、モアレ抑制の観点からは、フィルム状の基材と、開口を含むパターンを有する導体部とを有し、当該導体部以外の領域においてダミー部材としての金属細線が設けられていない導電性フィルムを、表示装置に組み込むことが有効であると考えられる。特に、導体部の開口を埋める絶縁樹脂部を更に有する導電性フィルムは、その製造が容易であることが期待される。ところがその場合、主に絶縁樹脂部の屈折率と空気の屈折率との差異に起因して、絶縁樹脂部を透過する光と、それ以外の部分を透過する光とで光路長に差異が生じ、そのために正常な画像表示に支障をきたすことがある。 If metal thin lines forming a mesh-like pattern as a dummy member are provided over the entire image display unit, moire may occur in the display image due to interference between the metal thin lines and the pixels of the display device. Therefore, from the viewpoint of suppressing moire, a conductive film having a film-like base material and a conductor portion having a pattern including an opening, and not provided with a thin metal wire as a dummy member in a region other than the conductor portion. It is considered effective to incorporate the above into the display device. In particular, a conductive film further having an insulating resin portion that fills the opening of the conductor portion is expected to be easy to manufacture. However, in that case, the optical path length differs between the light transmitted through the insulating resin portion and the light transmitted through the other portions, mainly due to the difference between the refractive index of the insulating resin portion and the refractive index of air. Therefore, it may interfere with normal image display.

　そこで、本発明は、表示装置に組み込まれたときに、表示画像のモアレの発生を抑制するとともに、均一性の高い光路長を確保し易い導電性フィルムを提供する。 Therefore, the present invention provides a conductive film that suppresses the occurrence of moire in a displayed image and easily secures a highly uniform optical path length when incorporated in a display device.

　本発明は、フィルム状の光透過性基材と、前記光透過性基材の一方の主面のうちの一部を占める第一領域上に設けられた導電性層と、前記光透過性基材の一方の主面のうち前記第一領域以外の領域を含む第二領域の全体を覆うように設けられた光透過性樹脂層と、を備える導電性フィルムを提供する。前記導電性層は、前記光透過性基材の主面の面内方向に延在し開口を含むパターンを有する部分を含む導体部と、前記導体部の開口内を埋める絶縁樹脂部と、を有する。 The present invention comprises a film-shaped light-transmitting substrate, a conductive layer provided on a first region occupying a part of one main surface of the light-transmitting substrate, and the light-transmitting group. Provided is a conductive film comprising one main surface of a material, a light-transmitting resin layer provided so as to cover the entire second region including a region other than the first region. The conductive layer includes a conductor portion including a portion extending in the in-plane direction of the main surface of the light transmissive base material and having a pattern including an opening, and an insulating resin portion filling the inside of the opening of the conductor portion. Have.

　上記導電性フィルムは、絶縁樹脂部を含む導電性層が設けられた第一領域以外の領域を含む第二領域の全体に光透過性樹脂層が設けられていることから、これが表示装置に組み込まれたときに、ダミー部材に起因するモアレの発生が抑制されるとともに、画像を表示する光のための均一性の高い光路長が確保され易い。 Since the conductive film is provided with a light-transmitting resin layer in the entire second region including a region other than the first region in which the conductive layer including the insulating resin portion is provided, this is incorporated into the display device. At the same time, the generation of moire caused by the dummy member is suppressed, and it is easy to secure a highly uniform optical path length for the light for displaying the image.

　前記第一領域の面積が、前記第二領域の面積よりも小さくてもよい。第一領域の面積が相対的に小さいと、画像表示への影響をより小さくしながら、導体部を設けることができる。 The area of the first region may be smaller than the area of the second region. When the area of the first region is relatively small, the conductor portion can be provided while reducing the influence on the image display.

　前記導体部の開口を含むパターンが、メッシュ状のパターンであってもよい。メッシュ状のパターンを有する部分の導体部は、例えばアンテナの放射素子として良好に機能することができる。 The pattern including the opening of the conductor portion may be a mesh-like pattern. The conductor portion of the portion having the mesh-like pattern can function well as, for example, a radiating element of an antenna.

　前記透明樹脂層及び前記絶縁樹脂部が硬化性樹脂組成物の硬化物であってもよい。硬化性樹脂組成物の硬化物を透明樹脂層及び絶縁樹脂部として有する導電性フィルムは、良好な光透過性を有し易く、また、その製造も容易である。 The transparent resin layer and the insulating resin portion may be a cured product of a curable resin composition. A conductive film having a cured product of a curable resin composition as a transparent resin layer and an insulating resin portion tends to have good light transmittance and is easy to manufacture.

　前記透明樹脂層と前記絶縁樹脂部とが同じ樹脂によって形成されていてもよい。同じ樹脂によって形成された透明樹脂層及び絶縁樹脂部は屈折率が等しいことから、当該導電性フィルムを透過する光路長がより一層安定することができる。同様の観点から、前記導体部、前記絶縁樹脂部、及び前記光透過性樹脂層が実質的に同じ厚みを有していてもよい。 The transparent resin layer and the insulating resin portion may be formed of the same resin. Since the transparent resin layer and the insulating resin portion formed of the same resin have the same refractive index, the optical path length transmitted through the conductive film can be further stabilized. From the same viewpoint, the conductor portion, the insulating resin portion, and the light-transmitting resin layer may have substantially the same thickness.

　前記光透過性基材の屈折率と、前記光透過性樹脂層の屈折率との差が０．１以下であってもよい。これにより、表示画像の良好な視認性がより一層確保され易い。 The difference between the refractive index of the light-transmitting substrate and the refractive index of the light-transmitting resin layer may be 0.1 or less. This makes it easier to ensure good visibility of the displayed image.

　本発明の別の一側面は、上記導電性フィルムを具備する表示装置を提供する。 Another aspect of the present invention provides a display device provided with the above conductive film.

　本発明の一側面に係る導電性フィルムは、表示装置に組み込まれたときに、表示画像のモアレの発生を抑制するとともに、光路長の高い均一性を確保することができる。 The conductive film according to one aspect of the present invention can suppress the occurrence of moire in the displayed image and ensure high uniformity of the optical path length when incorporated in the display device.

導電性フィルムの一実施形態を示す平面図である。It is a top view which shows one Embodiment of a conductive film. 図１のＩＩ－ＩＩ線に沿う断面図である。It is sectional drawing which follows the II-II line of FIG. 導電性層の一例を示す平面図である。It is a top view which shows an example of a conductive layer. 導電性層の一例の一部を示す拡大断面図である。It is an enlarged sectional view which shows a part of an example of a conductive layer. 表示装置の一実施形態を示す断面図である。It is sectional drawing which shows one Embodiment of a display device.

　以下、本発明のいくつかの実施形態について詳細に説明する。ただし、本発明は以下の実施形態に限定されるものではない。 Hereinafter, some embodiments of the present invention will be described in detail. However, the present invention is not limited to the following embodiments.

　図１は導電性フィルムの一実施形態を示す平面図であり、図２は図１のＩＩ－ＩＩ線に沿う断面図である。図１及び図２に示される導電性フィルム２０は、フィルム状の光透過性基材１と、光透過性基材１の一方の主面１Ｓのうちの一部を占める第一領域ＳＡ上に設けられた導電性層５と、光透過性基材１の一方の主面１Ｓのうち第一領域ＳＡ以外の領域を含む第二領域ＳＢの全体を覆うように設けられた光透過性樹脂層７Ｂとを備える。導電性層５は、光透過性基材１の主面１Ｓの面内方向に延在し複数の開口３ａを含むパターンを有する部分を含む導体部３と、導体部３の開口３ａ内を埋める絶縁樹脂部７Ａとを有する。 FIG. 1 is a plan view showing an embodiment of a conductive film, and FIG. 2 is a cross-sectional view taken along the line II-II of FIG. The conductive film 20 shown in FIGS. 1 and 2 is formed on a first region SA that occupies a part of a film-shaped light-transmitting base material 1 and one main surface 1S of the light-transmitting base material 1. A light-transmitting resin layer provided so as to cover the entire second region SB including a region other than the first region SA in the provided conductive layer 5 and one main surface 1S of the light-transmitting base material 1. It is equipped with 7B. The conductive layer 5 fills the inside of the conductor portion 3 including the portion of the main surface 1S of the light transmissive base material 1 extending in the in-plane direction and having a pattern including a plurality of openings 3a, and the inside of the openings 3a of the conductor portion 3. It has an insulating resin portion 7A.

　第一領域ＳＡは、光透過性基材１の主面１Ｓのうち、図２においてＡで示される範囲に相当する部分であり、ここに導電性層５が設けられている。第二領域ＳＢは、光透過性基材１の主面１Ｓのうち、図２においてＢで示される範囲に相当する部分であり、ここに光透過性樹脂層７Ｂが設けられている。導体部３のうち、主面１Ｓに垂直な方向から見たときに最も外側に位置する側面に沿う閉じた１本の線を、第一領域ＳＡの外縁とみなすことができる。図２に示されるように、第一領域ＳＡの外縁上に位置する導体部３の側面に、光透過性樹脂層７Ｂが隣接していてもよい。 The first region SA is a portion of the main surface 1S of the light transmissive base material 1 corresponding to the range shown by A in FIG. 2, and the conductive layer 5 is provided here. The second region SB is a portion of the main surface 1S of the light transmissive base material 1 corresponding to the range shown by B in FIG. 2, and the light transmissive resin layer 7B is provided here. One closed line of the conductor portion 3 along the outermost side surface when viewed from the direction perpendicular to the main surface 1S can be regarded as the outer edge of the first region SA. As shown in FIG. 2, the light transmissive resin layer 7B may be adjacent to the side surface of the conductor portion 3 located on the outer edge of the first region SA.

　図１及び図２に例示される導電性フィルム２０の場合、光透過性基材１の主面１Ｓのうち第一領域ＳＡを除く部分の全体が第二領域ＳＢであり、第二領域ＳＢの全体を覆うように光透過性樹脂層７Ｂが設けられている。ただし、光透過性基材１の主面１Ｓは、第一領域ＳＡ及び第二領域ＳＢ以外の部分、すなわち導電性層５及び光透過性樹脂層７Ｂが設けられていない領域も含み得る。例えば、第二領域ＳＢの周囲に導電性層５及び光透過性樹脂層７Ｂが設けられていない領域があってもよい。第二領域ＳＢは、導電性フィルム２０が表示装置に組み込まれたときに、表示装置の画像表示領域に相当する領域を含んでいてもよい。光透過性基材１の主面１Ｓのうち、第一領域ＳＡ及び第二領域ＳＢの合計の割合が、例えば８０～１００面積％、９０～１００面積％、９５～１００面積％、又は１００面積％であってもよい。 In the case of the conductive film 20 exemplified in FIGS. 1 and 2, the entire portion of the main surface 1S of the light transmissive substrate 1 excluding the first region SA is the second region SB, and the second region SB. A light-transmitting resin layer 7B is provided so as to cover the whole. However, the main surface 1S of the light transmissive base material 1 may include a portion other than the first region SA and the second region SB, that is, a region in which the conductive layer 5 and the light transmissive resin layer 7B are not provided. For example, there may be a region around the second region SB in which the conductive layer 5 and the light transmissive resin layer 7B are not provided. The second region SB may include a region corresponding to an image display region of the display device when the conductive film 20 is incorporated in the display device. The total ratio of the first region SA and the second region SB in the main surface 1S of the light transmissive substrate 1 is, for example, 80 to 100 area%, 90 to 100 area%, 95 to 100 area%, or 100 area. May be%.

　第一領域ＳＡの面積が、第二領域ＳＢの面積よりも小さくてもよい。第一領域ＳＡの面積が相対的に小さいと、画像表示への影響をより小さくしながら、導電性層５を設けることができる。同様の観点から、光透過性基材１の主面１Ｓの面積に対する、第一領域ＳＡの面積、すなわち導電性層５の面積の割合が、３０面積％以下、２０面積％以下、１０面積％以下、又は５面積％以下であってもよく、１面積％以上であってもよい。光透過性基材１の主面１Ｓにおける第一領域ＳＡの位置は特に制限されないが、図１及び図２に例示されるように主面１Ｓの外縁近傍に第一領域ＳＡが配置され、第二領域ＳＢが主面１Ｓの中央部を含んでいてもよい。 The area of the first region SA may be smaller than the area of the second region SB. When the area of the first region SA is relatively small, the conductive layer 5 can be provided while reducing the influence on the image display. From the same viewpoint, the ratio of the area of the first region SA, that is, the area of the conductive layer 5 to the area of the main surface 1S of the light transmissive substrate 1 is 30 area% or less, 20 area% or less, and 10 area%. Below, it may be 5 area% or less, or it may be 1 area% or more. The position of the first region SA on the main surface 1S of the light transmissive base material 1 is not particularly limited, but as illustrated in FIGS. 1 and 2, the first region SA is arranged near the outer edge of the main surface 1S, and the first region SA is arranged. The two-region SB may include the central portion of the main surface 1S.

　光透過性基材１は、導電性フィルム２０が表示装置に組み込まれたときに必要とされる程度の光透過性を有する。具体的には、光透過性基材１の全光線透過率が９０～１００％であってもよい。光透過性基材１のヘイズが０～５％であってもよい。 The light-transmitting base material 1 has a degree of light-transmitting property required when the conductive film 20 is incorporated in a display device. Specifically, the total light transmittance of the light-transmitting substrate 1 may be 90 to 100%. The haze of the light transmissive substrate 1 may be 0 to 5%.

　光透過性基材１は、例えば透明樹脂フィルムであってもよく、その例としては、ポリエチレンテレフタレート（ＰＥＴ）、ポリカーボネート（ＰＣ）、ポリエチレンナフタレート（ＰＥＮ）、シクロオレフィンポリマー（ＣＯＰ）、又はポリイミド（ＰＩ）のフィルムが挙げられる。あるいは、光透過性基材１がガラス基板であってもよい。 The light-transmitting substrate 1 may be, for example, a transparent resin film, for example, polyethylene terephthalate (PET), polycarbonate (PC), polyethylene naphthalate (PEN), cycloolefin polymer (COP), or polyimide. (PI) film can be mentioned. Alternatively, the light-transmitting base material 1 may be a glass substrate.

　光透過性基材１は、光透過性の支持フィルムと、支持フィルム上に設けられた下地層とを有する積層体であってもよい。支持フィルムは上記透明樹脂フィルムであることができる。下地層は無電解めっき等によって導体部３を形成するために設けられる層である。他の方法によって導体部３を形成する場合、下地層は必ずしも設けられなくてもよい。 The light-transmitting base material 1 may be a laminate having a light-transmitting support film and a base layer provided on the support film. The support film can be the transparent resin film. The base layer is a layer provided for forming the conductor portion 3 by electroless plating or the like. When the conductor portion 3 is formed by another method, the base layer does not necessarily have to be provided.

　光透過性基材１又はこれを構成する支持フィルムの厚みは、１０μｍ以上、２０μｍ以上、又は３５μｍ以上であってよく、５００μｍ以下、２００μｍ以下、又は１００μｍ以下であってよい。 The thickness of the light transmissive base material 1 or the support film constituting the same may be 10 μm or more, 20 μm or more, or 35 μm or more, and may be 500 μm or less, 200 μm or less, or 100 μm or less.

　下地層は、触媒及び樹脂を含有する層であってもよい。樹脂は、硬化性樹脂組成物の硬化物であってもよい。硬化性樹脂組成物に含まれる硬化性樹脂の例としては、アミノ樹脂、シアネート樹脂、イソシアネート樹脂、ポリイミド樹脂、エポキシ樹脂、オキセタン樹脂、ポリエステル、アリル樹脂、フェノール樹脂、ベンゾオキサジン樹脂、キシレン樹脂、ケトン樹脂、フラン樹脂、ＣＯＰＮＡ樹脂、ケイ素樹脂、ジクロペンタジエン樹脂、ベンゾシクロブテン樹脂、エピスルフィド樹脂、エン－チオール樹脂、ポリアゾメチン樹脂、ポリビニルベンジルエーテル化合物、アセナフチレン、及び不飽和二重結合、並びに、環状エーテル、ビニルエーテル等の紫外線で重合反応を起こす官能基を含む紫外線硬化樹脂が挙げられる。触媒及び樹脂を含有する下地層と、光透過性基材１との間に、光透過性基材１と下地層との密着性を向上させる樹脂層が設けられていてもよい。 The base layer may be a layer containing a catalyst and a resin. The resin may be a cured product of the curable resin composition. Examples of the curable resin contained in the curable resin composition include amino resin, cyanate resin, isocyanate resin, polyimide resin, epoxy resin, oxetane resin, polyester, allyl resin, phenol resin, benzoxazine resin, xylene resin, and ketone. Resins, furan resins, COPNA resins, silicon resins, diclopentadiene resins, benzocyclobutene resins, episulfide resins, en-thiol resins, polyazomethine resins, polyvinylbenzyl ether compounds, acenaphthylene, and unsaturated double bonds, as well as cyclic ethers. Examples thereof include an ultraviolet curable resin containing a functional group that causes a polymerization reaction with ultraviolet rays such as vinyl ether. A resin layer for improving the adhesion between the light-transmitting base material 1 and the base layer may be provided between the base layer containing the catalyst and the resin and the light-transmitting base material 1.

　下地層に含まれる触媒は、無電解めっき触媒であってもよい。無電解めっき触媒は、Ｐｄ、Ｃｕ、Ｎｉ、Ｃｏ、Ａｕ、Ａｇ、Ｐｄ、Ｒｈ、Ｐｔ、Ｉｎ、及びＳｎから選ばれる金属であってよく、Ｐｄであってもよい。触媒は、１種類単独若しくは２種類以上の組合せであってもよい。通常、触媒は触媒粒子として樹脂中に分散している。 The catalyst contained in the base layer may be an electroless plating catalyst. The electroless plating catalyst may be a metal selected from Pd, Cu, Ni, Co, Au, Ag, Pd, Rh, Pt, In, and Sn, and may be Pd. The catalyst may be used alone or in combination of two or more. Normally, the catalyst is dispersed in the resin as catalyst particles.

　下地層における触媒の含有量は、下地層全量を基準として、３質量％以上、４質量％以上、又は５質量％以上であってもよく、５０質量％以下、４０質量％以下、又は２５質量％以下であってもよい。 The content of the catalyst in the base layer may be 3% by mass or more, 4% by mass or more, or 5% by mass or more, based on the total amount of the base layer, and may be 50% by mass or less, 40% by mass or less, or 25% by mass. It may be less than or equal to%.

　下地層の厚みは、１０ｎｍ以上、２０ｎｍ以上、又は３０ｎｍ以上であってもよく、５００ｎｍ以下、３００ｎｍ以下、又は１５０ｎｍ以下であってもよい。 The thickness of the base layer may be 10 nm or more, 20 nm or more, or 30 nm or more, and may be 500 nm or less, 300 nm or less, or 150 nm or less.

　導電性層５を構成する導体部３は、開口３ａを含むパターンを有する部分を含む。開口３ａを含むパターンは、互いに交差する複数の線状部によって形成された、規則的に配置された複数の開口３ａを含むメッシュ状のパターンであってもよい。メッシュ状のパターンを有する導体部３は、例えばアンテナの放射素子として良好に機能することができる。導体部３は、開口３ａを含むパターンを有する部分の他に、グランド端子、給電端子等の導電部材に相当する部分を有していてもよい。 The conductor portion 3 constituting the conductive layer 5 includes a portion having a pattern including the opening 3a. The pattern including the openings 3a may be a mesh-like pattern including a plurality of regularly arranged openings 3a formed by a plurality of linear portions intersecting each other. The conductor portion 3 having a mesh-like pattern can function well, for example, as a radiating element of an antenna. The conductor portion 3 may have a portion corresponding to a conductive member such as a ground terminal and a feeding terminal, in addition to a portion having a pattern including the opening 3a.

　導体部３は、金属を含んでいてもよい。導体部３は、銅、ニッケル、コバルト、パラジウム、銀、金、白金及びスズから選ばれる少なくとも１種の金属を含んでいてもよく、銅を含んでいてもよい。導体部３は、めっき法によって形成された金属めっきであってもよい。導体部３は、適切な導電性が維持される範囲で、リン等の非金属元素を更に含んでいてもよい。 The conductor portion 3 may contain metal. The conductor portion 3 may contain at least one metal selected from copper, nickel, cobalt, palladium, silver, gold, platinum and tin, and may contain copper. The conductor portion 3 may be metal plating formed by a plating method. The conductor portion 3 may further contain a non-metal element such as phosphorus as long as appropriate conductivity is maintained.

　絶縁樹脂部７Ａは、導体部３の開口３ａを埋めるように設けられており、絶縁樹脂部７Ａと導体部３とで平坦な表面が形成されていてもよい。 The insulating resin portion 7A is provided so as to fill the opening 3a of the conductor portion 3, and a flat surface may be formed by the insulating resin portion 7A and the conductor portion 3.

　光透過性樹脂層７Ｂは、光透過性を有する樹脂によって形成されている。光透過性樹脂層７Ｂの全光線透過率が９０～１００％であってもよい。光透過性樹脂層７Ｂのヘイズが０～５％であってもよい。 The light-transmitting resin layer 7B is formed of a light-transmitting resin. The total light transmittance of the light-transmitting resin layer 7B may be 90 to 100%. The haze of the light-transmitting resin layer 7B may be 0 to 5%.

　光透過性基材１（又は光透過性基材１を構成する支持フィルムの屈折率）と、光透過性樹脂層７Ｂの屈折率との差が０．１以下であってもよい。これにより、表示画像の良好な視認性がより一層確保され易い。光透過性樹脂層７Ｂの屈折率（ｎｄ２５）は、例えば、１．０以上であってもよく、１．７以下、１．６以下、又は１．５以下であってよい。屈折率は、反射分光膜厚計により測定することができる。 The difference between the light-transmitting base material 1 (or the refractive index of the support film constituting the light-transmitting base material 1) and the refractive index of the light-transmitting resin layer 7B may be 0.1 or less. This makes it easier to ensure good visibility of the displayed image. The refractive index (nd25) of the light-transmitting resin layer 7B may be, for example, 1.0 or more, 1.7 or less, 1.6 or less, or 1.5 or less. The refractive index can be measured by a reflection spectroscopic film thickness meter.

　絶縁樹脂部７Ａ及び光透過性樹脂層７Ｂを形成する樹脂は、硬化性樹脂組成物（光硬化性樹脂組成物又は熱硬化性樹脂組成物）の硬化物であってもよい。絶縁樹脂部７Ａ及び／又は光透過性樹脂層７Ｂを形成する硬化性樹脂組成物は、硬化性樹脂を含み、その例としては、アクリル樹脂、アミノ樹脂、シアネート樹脂、イソシアネート樹脂、ポリイミド樹脂、エポキシ樹脂、オキセタン樹脂、ポリエステル、アリル樹脂、フェノール樹脂、ベンゾオキサジン樹脂、キシレン樹脂、ケトン樹脂、フラン樹脂、ＣＯＰＮＡ樹脂、ケイ素樹脂、ジクロペンタジエン樹脂、ベンゾシクロブテン樹脂、エピスルフィド樹脂、エン－チオール樹脂、ポリアゾメチン樹脂、ポリビニルベンジルエーテル化合物、アセナフチレン、並びに、不飽和二重結合、環状エーテル及びビニルエーテル等の紫外線で重合反応を起こす官能基を含む紫外線硬化樹脂が挙げられる。 The resin forming the insulating resin portion 7A and the light-transmitting resin layer 7B may be a cured product of a curable resin composition (photocurable resin composition or thermosetting resin composition). The curable resin composition forming the insulating resin portion 7A and / or the light-transmitting resin layer 7B contains a curable resin, and examples thereof include acrylic resin, amino resin, cyanate resin, isocyanate resin, polyimide resin, and epoxy. Resin, oxetane resin, polyester, allyl resin, phenol resin, benzoxazine resin, xylene resin, ketone resin, furan resin, COPNA resin, silicon resin, diclopentadiene resin, benzocyclobutene resin, episulfide resin, en-thiol resin, poly Examples thereof include azomethine resins, polyvinylbenzyl ether compounds, acenaphthylene, and ultraviolet curable resins containing functional groups that undergo a polymerization reaction with ultraviolet rays such as unsaturated double bonds, cyclic ethers and vinyl ethers.

　絶縁樹脂部７Ａを形成する樹脂と光透過性樹脂層７Ｂを形成する樹脂とが同じであってもよい。同じ樹脂によって形成された絶縁樹脂部７Ａ及び光透過性樹脂層７Ｂは屈折率が等しいことから、導電性フィルム２０を透過する光路長の均一性がより一層向上することができる。絶縁樹脂部７Ａを形成する樹脂と光透過性樹脂層７Ｂを形成する樹脂とが同じである場合、例えば１層の硬化性樹脂層からインプリント法等によってパターン形成することによって、絶縁樹脂部７Ａ及び光透過性樹脂層７Ｂを容易に一括して形成することができる。 The resin forming the insulating resin portion 7A and the resin forming the light transmissive resin layer 7B may be the same. Since the insulating resin portion 7A and the light transmissive resin layer 7B formed of the same resin have the same refractive index, the uniformity of the optical path length transmitted through the conductive film 20 can be further improved. When the resin forming the insulating resin portion 7A and the resin forming the light transmissive resin layer 7B are the same, for example, the insulating resin portion 7A is formed by forming a pattern from one curable resin layer by an imprint method or the like. And the light-transmitting resin layer 7B can be easily formed collectively.

　光路長の均一性の観点から、導体部３、絶縁樹脂部７Ａ、及び光透過性樹脂層７Ｂが実質的に同じ厚みを有していてもよい。例えば、導体部３、絶縁樹脂部７Ａ及び光透過性樹脂層７Ｂの厚みの平均値がＴであるとき、導体部３、絶縁樹脂部７Ａ及び光透過性樹脂層７Ｂの厚みが、Ｔに対して±３μｍ以内、±２μｍ以内、±１μｍ以内、±０．５μｍ以内、又は±０．３μｍ以内であってもよい。導体部３、絶縁樹脂部７Ａ、及び光透過性樹脂層７Ｂの厚みが、０．８μｍ以上、１．０μｍ以上、又は１．２μｍ以上であってもよく、５μｍ以下、４μｍ以下、又は３μｍ以下であってもよい。 From the viewpoint of the uniformity of the optical path length, the conductor portion 3, the insulating resin portion 7A, and the light transmissive resin layer 7B may have substantially the same thickness. For example, when the average value of the thicknesses of the conductor portion 3, the insulating resin portion 7A and the light transmitting resin layer 7B is T, the thickness of the conductor portion 3, the insulating resin portion 7A and the light transmitting resin layer 7B is relative to T. It may be within ± 3 μm, within ± 2 μm, within ± 1 μm, within ± 0.5 μm, or within ± 0.3 μm. The thickness of the conductor portion 3, the insulating resin portion 7A, and the light transmissive resin layer 7B may be 0.8 μm or more, 1.0 μm or more, or 1.2 μm or more, and may be 5 μm or less, 4 μm or less, or 3 μm or less. May be.

　図３は、導体性層の一例を示す平面図である。図３に示される導電性層５は、導体部３、絶縁樹脂部７Ａ、及び給電端子８を有する。導体部３は、複数の線状部を含むメッシュ状のパターンを有し、放射素子を含む配線部３１と、グランド電極３３と、端子部６とを有する。端子部６は、２つのグランド端子３２と、配線部３１の外側に向けて延出した導体部３である端子パターン部８０とを含む。グランド電極３３は、配線部３１の放射素子を囲みながら、２つのグランド端子３２の間にわたって設けられている。グランド電極３３を構成する線状部の幅及び形状は、配線部３１を構成する線状部の幅及び形状と同様であることができる。給電端子８は、端子パターン部８０の一部を覆うように平面状に延在する。給電端子８はベタの形態を有する導体層である。平面視において、給電端子８の外縁は、端子パターン部８０（導体部３）の外縁より内側に位置していてもよい。この場合、給電端子８の外縁が導体部３の外縁からはみ出ることが抑制され、それにより、配線部３１が端子部６に隣り合う他の端子部とショートすることを抑制できる。また、給電端子８が電極側にはみ出すことで導電性フィルムの視認性が向上してしまうことを抑制できる。給電端子８によって覆われた端子パターン部８０（導体部３）が、給電端子８によって覆われていない導体部３と同様のメッシュ状のパターンを有していてもよい。 FIG. 3 is a plan view showing an example of the conductive layer. The conductive layer 5 shown in FIG. 3 has a conductor portion 3, an insulating resin portion 7A, and a feeding terminal 8. The conductor portion 3 has a mesh-like pattern including a plurality of linear portions, and has a wiring portion 31 including a radiating element, a ground electrode 33, and a terminal portion 6. The terminal portion 6 includes two ground terminals 32 and a terminal pattern portion 80 which is a conductor portion 3 extending toward the outside of the wiring portion 31. The ground electrode 33 is provided between the two ground terminals 32 while surrounding the radiating element of the wiring portion 31. The width and shape of the linear portion constituting the ground electrode 33 can be the same as the width and shape of the linear portion constituting the wiring portion 31. The power feeding terminal 8 extends in a plane so as to cover a part of the terminal pattern portion 80. The power feeding terminal 8 is a conductor layer having a solid form. In a plan view, the outer edge of the power feeding terminal 8 may be located inside the outer edge of the terminal pattern portion 80 (conductor portion 3). In this case, it is possible to prevent the outer edge of the power feeding terminal 8 from protruding from the outer edge of the conductor portion 3, thereby preventing the wiring portion 31 from short-circuiting with other terminal portions adjacent to the terminal portion 6. Further, it is possible to prevent the visibility of the conductive film from being improved due to the feeding terminal 8 protruding from the electrode side. The terminal pattern portion 80 (conductor portion 3) covered by the feeding terminal 8 may have a mesh-like pattern similar to that of the conductor portion 3 not covered by the feeding terminal 8.

　図４は図３の導電性層５のうち給電端子８が設けられた部分を示す拡大断面図である。図３及び図４に示される給電端子８は、端子パターン部８０（導体部３）の表面、及び端子パターン部８０の開口を埋める絶縁樹脂部７Ａの表面を覆うように形成されている。図３及び図４に示す例では、給電端子８は、その外縁で囲まれる領域において隙間無く一体的に形成されている。給電端子８は、複数の領域に分割されてもよく、分割された領域間では、端子パターン部８０（導体部３）及び絶縁樹脂部７Ａがスリット状に露出してもよい。 FIG. 4 is an enlarged cross-sectional view showing a portion of the conductive layer 5 of FIG. 3 in which the feeding terminal 8 is provided. The power feeding terminal 8 shown in FIGS. 3 and 4 is formed so as to cover the surface of the terminal pattern portion 80 (conductor portion 3) and the surface of the insulating resin portion 7A that fills the opening of the terminal pattern portion 80. In the example shown in FIGS. 3 and 4, the power feeding terminal 8 is integrally formed without a gap in the region surrounded by the outer edge thereof. The power feeding terminal 8 may be divided into a plurality of regions, and the terminal pattern portion 80 (conductor portion 3) and the insulating resin portion 7A may be exposed in a slit shape between the divided regions.

　図４の断面図に示されるように、給電端子８によって覆われる部分の端子パターン部８０（導体部３）の光透過性基材１の主面１Ｓからの高さが、絶縁樹脂部７Ａの主面１Ｓからの高さよりも大きくてもよい。給電端子８の導体部３とは反対側の表面８Ｓが、粗面化されていてもよい。言い換えると、表面８Ｓの表面粗さが、導体部３の表面粗さよりも大きくてもよい。表面８Ｓが粗面化されていると、外部の接続端子との接続強度が向上され得る。ここでの表面粗さは、例えば、算術平均粗さ Ｒａであってもよい。給電端子８の厚みが、導体部３の厚みよりも大きくてもよい。 As shown in the cross-sectional view of FIG. 4, the height of the terminal pattern portion 80 (conductor portion 3) of the portion covered by the feeding terminal 8 from the main surface 1S of the light transmissive base material 1 is the height of the insulating resin portion 7A. It may be larger than the height from the main surface 1S. The surface 8S on the side opposite to the conductor portion 3 of the power feeding terminal 8 may be roughened. In other words, the surface roughness of the surface 8S may be larger than the surface roughness of the conductor portion 3. When the surface 8S is roughened, the connection strength with the external connection terminal can be improved. The surface roughness here may be, for example, an arithmetic mean roughness Ra. The thickness of the power feeding terminal 8 may be larger than the thickness of the conductor portion 3.

　グランド端子が、基材の主面上に延在する導体部とは別に設けられていてもよい。例えば、グランド端子が、開口を含むパターンを有する端子部としての端子パターン部を覆うように平面状に延在し、ベタの形態を有する導体層であってもよい。この場合、平面視において、グランド端子の外縁が、その下部に位置する端子パターン部（端子部、導体部）の外縁より内側に位置していてもよい。これにより、グランド端子が導体部の外縁からはみ出ることが抑制され、それにより、グランド端子が隣り合う他の端子部とショートすることを抑制できる。また、グランド端子が電極側にはみ出すことで導体部の視認性が向上してしまうことを抑制できる。ベタの形態を有するグランド端子によって覆われた端子パターン部が、グランド端子によって覆われていない部分の導体部と同様のメッシュ状のパターンを有していてもよい。導電性フィルムは、以上説明したような、端子部（端子パターン部）を覆うベタの形態を有する給電端子、端子部（端子パターン部）を覆うベタの形態を有するグランド端子、又はこれらの両方を有していてもよい。 The ground terminal may be provided separately from the conductor portion extending on the main surface of the base material. For example, the ground terminal may be a conductor layer having a solid shape and extending in a plane so as to cover the terminal pattern portion as a terminal portion having a pattern including an opening. In this case, in a plan view, the outer edge of the ground terminal may be located inside the outer edge of the terminal pattern portion (terminal portion, conductor portion) located below the ground terminal. As a result, it is possible to prevent the ground terminal from protruding from the outer edge of the conductor portion, thereby preventing the ground terminal from short-circuiting with other adjacent terminal portions. In addition, it is possible to prevent the visibility of the conductor portion from being improved due to the ground terminal protruding to the electrode side. The terminal pattern portion covered with the ground terminal having a solid shape may have a mesh-like pattern similar to the conductor portion of the portion not covered with the ground terminal. As described above, the conductive film has a power supply terminal having a solid form covering the terminal portion (terminal pattern portion), a ground terminal having a solid form covering the terminal portion (terminal pattern portion), or both of them. You may have.

　導電性フィルム２０は、例えばインプリント法によるパターン形成を含む方法によって製造することができる。導電性フィルム２０を製造する方法の一例は、支持フィルムと支持フィルムの一方の主面上に設けられた、触媒を含有する下地層とを有する光透過性基材１を準備することと、光透過性基材１の下地層側の主面１Ｓ上に、硬化性樹脂層を形成させることと、凸部を有するモールドを用いたインプリント法により、下地層が露出するトレンチを形成させることと、トレンチを充填する導体部３を、下地層から金属めっきを成長させる無電解めっき法により形成することとを含む。硬化性樹脂層にモールドが押し込まれた状態で硬化性樹脂層を硬化させることにより、モールドの凸部の反転形状を有する開口を含むパターンを有する絶縁樹脂部７Ａと光透過性樹脂層７Ｂとが一括して形成される。開口を含むパターンを有する絶縁樹脂部７Ａを形成する方法は、インプリント法に限られず、フォトリソグラフィー等の任意の方法を適用できる。 The conductive film 20 can be manufactured by, for example, a method including pattern formation by an imprint method. An example of a method for producing the conductive film 20 is to prepare a light-transmitting base material 1 having a support film and a base layer containing a catalyst provided on one main surface of the support film, and light. A curable resin layer is formed on the main surface 1S on the base layer side of the permeable base material 1, and a trench in which the base layer is exposed is formed by an imprint method using a mold having a convex portion. The present invention includes forming the conductor portion 3 for filling the trench by a electroless plating method in which metal plating is grown from the base layer. By curing the curable resin layer with the mold pushed into the curable resin layer, the insulating resin portion 7A and the light-transmitting resin layer 7B having a pattern including an opening having an inverted shape of the convex portion of the mold are formed. Formed together. The method for forming the insulating resin portion 7A having a pattern including an opening is not limited to the imprint method, and any method such as photolithography can be applied.

　以上例示的に説明された導電性フィルムを、例えば平面状の透明アンテナとして表示装置に組み込むことができる。表示装置は、例えば、液晶表示装置、又は有機ＥＬ表示装置であってもよい。図５は、導電性フィルムが組み込まれた表示装置の一実施形態を示す断面図である。図５に示される表示装置１００は、画像表示領域１０Ｓを有する画像表示部１０と、導電性フィルム２０と、偏光板３０と、カバーガラス４０とを備える。導電性フィルム２０、偏光板３０、及びカバーガラス４０は、画像表示部１０の画像表示領域１０Ｓ側において、画像表示部１０側からこの順に積層されている。表示装置の構成は図５の形態に限られず、必要により適宜変更が可能である。例えば、偏光板３０が画像表示部１０と導電性フィルム２０との間に設けられてもよい。画像表示部１０は、例えば液晶表示部であってもよい。偏光板３０及びカバーガラス４０として、表示装置において通常用いられているものを用いることができる。偏光板３０及びカバーガラス４０は、必ずしも設けられなくてもよい。画像表示部１０の画像表示領域１０Ｓから出射される画像表示のための光が、導電性フィルム２０を含む均一性の高い光路長の経路を通過する。これにより、モワレが抑制された均一性の高い良好な画像表示が可能である。 The conductive film exemplified above can be incorporated into a display device as, for example, a flat transparent antenna. The display device may be, for example, a liquid crystal display device or an organic EL display device. FIG. 5 is a cross-sectional view showing an embodiment of a display device incorporating a conductive film. The display device 100 shown in FIG. 5 includes an image display unit 10 having an image display area 10S, a conductive film 20, a polarizing plate 30, and a cover glass 40. The conductive film 20, the polarizing plate 30, and the cover glass 40 are laminated in this order from the image display unit 10 side on the image display area 10S side of the image display unit 10. The configuration of the display device is not limited to the form shown in FIG. 5, and can be appropriately changed as needed. For example, the polarizing plate 30 may be provided between the image display unit 10 and the conductive film 20. The image display unit 10 may be, for example, a liquid crystal display unit. As the polarizing plate 30 and the cover glass 40, those usually used in a display device can be used. The polarizing plate 30 and the cover glass 40 do not necessarily have to be provided. The light for displaying an image emitted from the image display area 10S of the image display unit 10 passes through a path having a highly uniform optical path length including the conductive film 20. As a result, it is possible to display a good image with high uniformity in which moire is suppressed.

　１…光透過性基材、１Ｓ…基材の主面、３…導体部、３ａ…開口、５…導電性層、７Ａ…絶縁樹脂部、７Ｂ…光透過性樹脂層、２０…導電性フィルム、３０…偏光板、４０…カバーガラス、１００…表示装置、ＳＡ…第一領域、ＳＢ…第二領域。 1 ... Light-transmitting base material, 1S ... Main surface of base material, 3 ... Conductor part, 3a ... Opening, 5 ... Conductive layer, 7A ... Insulation resin part, 7B ... Light-transmitting resin layer, 20 ... Conductive film , 30 ... Polarizing plate, 40 ... Cover glass, 100 ... Display device, SA ... First region, SB ... Second region.

Claims (8)

　フィルム状の光透過性基材と、
　前記光透過性基材の一方の主面のうちの一部を占める第一領域上に設けられた導電性層と、
　前記光透過性基材の一方の主面のうち前記第一領域以外の領域を含む第二領域の全体を覆うように設けられた光透過性樹脂層と、
を備え、
　前記導電性層が、前記光透過性基材の主面の面内方向に延在し開口を含むパターンを有する部分を含む導体部と、前記導体部の開口内を埋める絶縁樹脂部と、を有する、
導電性フィルム。 A film-like light-transmitting substrate and
A conductive layer provided on the first region occupying a part of one main surface of the light transmissive substrate, and
A light-transmitting resin layer provided so as to cover the entire second region including a region other than the first region of one main surface of the light-transmitting base material,
Equipped with
A conductor portion in which the conductive layer extends in the in-plane direction of the main surface of the light transmissive base material and includes a portion having a pattern including an opening, and an insulating resin portion that fills the inside of the opening of the conductor portion. Have,
Conductive film. 　前記第一領域の面積が、前記第二領域の面積よりも小さい、請求項１に記載の導電性フィルム。 The conductive film according to claim 1, wherein the area of the first region is smaller than the area of the second region. 　前記導体部の開口を含むパターンが、メッシュ状のパターンである、請求項１又は２に記載の導電性フィルム。 The conductive film according to claim 1 or 2, wherein the pattern including the opening of the conductor portion is a mesh-like pattern. 　前記光透過性樹脂層及び前記絶縁樹脂部が硬化性樹脂組成物の硬化物である、請求項１～３のいずれか一項に記載の導電性フィルム。 The conductive film according to any one of claims 1 to 3, wherein the light-transmitting resin layer and the insulating resin portion are cured products of a curable resin composition. 　前記光透過性樹脂層と前記絶縁樹脂部とが同じ樹脂によって形成されている、請求項１～４のいずれか一項に記載の導電性フィルム。 The conductive film according to any one of claims 1 to 4, wherein the light-transmitting resin layer and the insulating resin portion are formed of the same resin. 　前記導体部、前記絶縁樹脂部、及び前記光透過性樹脂層が実質的に同じ厚みを有する、請求項１～５のいずれか一項に記載の導電性フィルム。 The conductive film according to any one of claims 1 to 5, wherein the conductor portion, the insulating resin portion, and the light transmissive resin layer have substantially the same thickness. 　前記光透過性基材の屈折率と、前記光透過性樹脂層の屈折率との差が０．１以下である、請求項１～６のいずれか一項に記載の導電性フィルム。 The conductive film according to any one of claims 1 to 6, wherein the difference between the refractive index of the light-transmitting substrate and the refractive index of the light-transmitting resin layer is 0.1 or less. 　請求項１～７のいずれか一項に記載の導電性フィルムを具備する表示装置。 A display device provided with the conductive film according to any one of claims 1 to 7.
PCT/JP2021/043671 2020-12-25 2021-11-29 Electroconductive film and display device Ceased WO2022138000A1 (en)

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