WO2022105378A1 - Glass plate, manufacturing method, housing, and electronic device - Google Patents

Abstract

Provided are a glass plate, a manufacturing method, a housing, and an electronic device. The glass plate comprises: a base. A surface of one side of the base has a moiré pattern; the moiré pattern at least comprises multiple first portions and multiple second portions; the first portions have a first height; the second portions have a second height; the moiré pattern further has junction portions; the junction portions are in junction areas; the junction areas are junctions of the extension direction of the first portions and the extension direction of the second portions; two adjacent first portions on a same straight line are connected by means of the corresponding junction portion, and two adjacent second portions on a same straight line are connected by means of the corresponding junction portion.

Description

Glass sheet and preparation method, housing and electronic device

priority information

The present disclosure claims priority and the benefit of patent application No. 202011287954.7, filed with the State Intellectual Property Office of China on November 17, 2020, and incorporated herein by reference in its entirety.

technical field

The present disclosure relates to the field of electronic devices, and in particular, the present disclosure relates to glass sheets and preparation methods, housings and electronic devices.

Background technique

In order to adapt to the advent of the 5G era, structures such as casings designed based on 3G/4G communication in the current electronic equipment also need to be improved according to the 5G communication method. Materials currently widely used in electronic equipment housings mainly include metals, plastics, ceramics and glass. Although plastic can meet the radio frequency requirements of 5G transmission, the texture of plastic is poor and it is not resistant to scratches; ceramics not only meet the requirements of radio frequency, but also have a beautiful and unique ceramic texture, but the current processing is difficult and the cost remains high; in comparison, glass It can meet the requirements of radio frequency, can achieve bright texture, mature processing technology, controllable cost, and the extremely high transmittance of glass can meet the diversified design of product appearance (such as CMF, color, material and finishing,). However, the current glass mostly relies on the lamination of polymer membranes with micro-nano textures to bring cool light and shadow effects. However, the polymer membranes inevitably undergo aging and deformation during long-term use, and the micro-nano textures on the membranes are seriously deformed and cracked. Affects appearance. To solve this problem, micro-nano textures can be etched on the glass surface to replace the micro-nano textures on the diaphragm to achieve similar light and shadow effects.

However, the current glass sheets and preparation methods, housings and electronic devices still need to be improved.

public content

The present disclosure aims to solve one of the technical problems in the related art at least to a certain extent.

In view of this, in one aspect of the present disclosure, the present disclosure proposes a glass sheet. The glass plate includes: a base body, a surface of one side of the base body has moiré stripes, the moiré stripes at least include a plurality of first parts and a plurality of second parts, and the plurality of first parts all extend along a first direction, Each of the plurality of second portions extends in a second direction, the first direction and the second direction intersect, the first portion has a first height, the second portion has a second height, and the molar The stripes also have a border, the border is located in a border area, the border area is the border of the extension direction of the first section and the extension direction of the second section, and is located on the same straight line and adjacent to the two. The first parts are connected by the boundary part, and two adjacent second parts located on the same straight line are connected by the boundary part.

In another aspect of the present disclosure, the present disclosure provides a method for preparing the aforementioned glass sheet, the method includes forming moiré fringes on a surface of one side of a substrate, and the operation of forming the moiré fringes includes: an etching mask and a second etching mask, the moiré fringes are formed on the surface of the substrate side by at least two etching processes, and the first part of the moiré stripes is formed based on the first etching process, based on The second etching process forms the second portion and the boundary portion of the moiré fringes, and before the second etching process is performed, further includes an operation of removing the first etching mask.

In yet another aspect of the present disclosure, the present disclosure proposes a housing. At least a portion of the housing is formed from the previously described glass sheet.

In yet another aspect of the present disclosure, the present disclosure proposes an electronic device. The electronic device comprises: the aforementioned casing, the casing defines an accommodating space, moiré stripes are located on the side of the casing away from the accommodating space, a mainboard and a display screen, the mainboard and the display The screen is electrically connected and located inside the accommodating space.

Description of drawings

FIG. 1 shows a schematic structural diagram of a glass plate according to an example of the present disclosure;

FIG. 2 shows a schematic cross-sectional structure diagram of a glass sheet at different positions according to an example of the present disclosure;

FIG. 3 shows a schematic cross-sectional structure of a glass sheet at different positions according to another example of the present disclosure;

FIG. 4 shows a schematic flowchart of a method for preparing a glass sheet according to an example of the present disclosure;

5a-5d show a schematic flow chart of a method for preparing a glass sheet according to an example of the present disclosure;

6a-6e show schematic flowcharts of a method for preparing a glass sheet according to another example of the present disclosure;

7a-7c are schematic flowcharts showing part of a method for preparing a glass sheet according to another example of the present disclosure;

FIG. 8 shows a schematic structural diagram of a housing according to an example of the present disclosure;

FIG. 9 shows a schematic structural diagram of an electronic device according to an example of the present disclosure;

FIG. 10 shows a schematic structural diagram of a striped pattern according to an example of the present disclosure;

11 shows a schematic diagram of a coordinate system representing moiré fringes according to an example of the present disclosure;

FIG. 12 shows a schematic structural diagram of the first stripe pattern, the second stripe pattern and the moiré pattern according to an example of the present disclosure.

Description of reference numbers:

100: substrate; 110: moiré; 10: first part; 20: second part; 50: junction; 30: third part; 40: fourth part; 200: first etching mask; 300: first Two etching masks; 1100: housing; 1000: electronic equipment.

Detailed ways

Embodiments of the present disclosure are described in detail below, examples of which are illustrated in the accompanying drawings, wherein the same or similar reference numerals refer to the same or similar elements or elements having the same or similar functions throughout. The embodiments described below with reference to the accompanying drawings are exemplary and are only used to explain the present disclosure and should not be construed as a limitation of the present disclosure.

In the present disclosure, unless otherwise expressly specified and limited, the terms "connected", "connected", "connected" and other terms should be interpreted in a broad sense, for example, they may be directly connected or indirectly connected through intermediate media or components. For those of ordinary skill in the art, the specific meanings of the above terms in the present disclosure can be understood according to specific situations, as long as the structural relationships according to the embodiments of the present disclosure are satisfied.

In one aspect of the present disclosure, the present disclosure proposes a glass sheet. Referring to FIG. 1 , the glass plate includes a base body 100 and moiré fringes 110 on one side of the base body 100 . The moiré 110 at least includes a plurality of first parts 10 (10A and 10B shown in the figure) and a plurality of second parts 20 (20A and 20B shown in the figure). Each of the plurality of first portions 10 extends in the first direction, and each of the plurality of second portions extends in the second direction, as indicated by arrows in the figure. The first direction and the second direction intersect, that is, the first part 10 and the second part 20 are not arranged in parallel. The first portion has a first height and the second portion has a second height. The moiré fringe also has a boundary portion 50, and the boundary portion 50 is located in a boundary region, and the boundary region is the boundary between the extension direction of the first portion and the extension direction of the second portion, as shown by the dotted frame in the figure. The two adjacent first parts 10 located on the same straight line are connected by the boundary part 50 , and the two adjacent second parts 20 located on the same straight line are also connected by the boundary part 50 .

The glass plate has moiré fringes on one side surface that can obtain the visual effect of interference moiré, so on the one hand, the visual effect of the glass plate can be improved, and on the other hand, it also avoids the use of the appearance film due to the life of the film. Shorter and cause the texture effect of the glass sheet to be peeled off and broken after a period of use. In addition, the moiré fringes directly formed on the glass surface can also provide a textured feel to the glass sheet, thereby further improving the appearance and use effect of the glass sheet as an electronic device casing.

According to an example of the present disclosure, the above-mentioned first and second parts may be straight lines extending along a fixed direction (the first and second directions as described above), or may have an axis of symmetry, and the axis of symmetry is along the aforementioned Shapes such as wavy lines and broken lines extending in the first direction or the second direction. In the drawings of the present disclosure, only the first part and the second part are linear stripes for illustration, and the shapes shown in the drawings are only for the convenience of understanding, and should not be construed as a reference to the moiré stripes according to the examples of the present disclosure. shape restrictions.

According to some examples of the present disclosure, the aforementioned moiré fringes may be protrusions or depressions on the surface of the substrate. The moiré fringes can be integrally formed with the substrate, for example, can be formed by removing the glass material on one side of the substrate except the moiré fringes by a process including but not limited to etching. According to an example of the present disclosure, the moiré can be decomposed into a superposition of a first stripe pattern having a first height, a second stripe pattern having a second height, and a first stripe pattern and a second stripe pattern There are overlapping areas between the patterns. The overlapping area between the first stripe pattern and the second stripe pattern constitutes the boundary portion of the moiré stripes. For example, the moire fringes may be formed by etching the first stripe pattern on the surface of the substrate, and then forming the second stripe pattern, and the two stripe patterns together constitute the moiré fringes. Specifically, the first stripe pattern extends along the first direction, and the second stripe pattern extends along the second direction. The portion of the first stripe pattern that does not intersect with the second stripe pattern constitutes the above-mentioned first portion, and the portion of the second stripe pattern that does not intersect the first stripe pattern constitutes the above-mentioned second portion. The overlapping region between the first stripe pattern and the second stripe pattern constitutes a boundary portion. More specifically, when the first direction and the second direction are not perpendicular to each other, the interface part 50 may include the third part 30 and the fourth part 40 . The fourth portion has a fourth height, and the fourth height may be greater than or equal to the larger one of the first height and the second height. Both the third part 30 and the fourth part 40 are located in the boundary area (the area shown by the dotted line in the figure), and the boundary area is the boundary between the extension direction of the first part and the extension direction of the second part. And two adjacent first parts located on the same straight line and two adjacent second parts located on the same straight line are connected by at least one of the third part and the fourth part. In other words, one or both of the third and fourth parts are spaced between the two first parts located on the same line, and the third part and the fourth part are located between the two first parts located on the same line. At least one of the four parts is connected; two second parts located on the same line are also separated by one or two of the third part and the fourth part, and two second parts located on the same line are also spaced between Connected by at least one of the third part and the fourth part.

Specifically, referring to FIG. 2 , when the moiré stripes are convex, (a) in FIG. 2 can be a schematic cross-sectional view along the direction AA' in FIG. 1 , and (b) is a schematic diagram along the direction B-B in FIG. 1 . A schematic cross-sectional view in the ' direction, (c) is a schematic cross-sectional view along the CC' direction in FIG. 1 . At this time, the heights of the first part, the second part, the third part and the fourth part are the distances between the surface of each part away from the base body 100 and the base body 100 , that is, the height of each part protruding from the base body. The second portion 20 is formed of a second stripe pattern. The junction is formed by the intersection of the first stripe pattern and the second stripe pattern, that is, the intersection of the first stripe pattern and the second stripe pattern is first subjected to an etching process when the first stripe pattern is formed, and then at this position. The glass material also undergoes a second etching process when forming the second stripe pattern. Taking the case where the included angle between the first direction and the second direction shown in FIG. 1 is not 90 degrees as an example, referring to (b) and (c) in FIG. 2 , the junction part further includes a third part 30 and Fourth part 40. Therefore, at least part of the height of the interface portion will be greater than the first height, such as the aforementioned height h3 of the third portion 30 , and the height h4 of the fourth portion 40 may be greater than or equal to the second height h2 .

The part where the first stripe pattern and the second stripe pattern are completely overlapped is subjected to two etching processes to form the fourth part 40, which has a fourth height h4, then h4 can be greater than h1 and h2, and at least greater than or equal to h1 and h2 the larger one. When the first direction and the second direction are not perpendicular to each other, along the direction perpendicular to the first direction (that is, the direction in which the first part or the first stripe pattern extends), a part of the first stripe pattern is not connected to the second stripe pattern Intersection, the glass material in this part has only undergone one etching process, while the first stripe pattern in the other part intersects with the second stripe pattern, and this position has undergone two etching processes. That is, as shown in (b) of FIG. 2 , the glass material of this part constitutes the third part 30 , the third part 30 has a third height h3 , the third part 30 and the first part 10 and the second part 20 At least one of them is arranged adjacently, and the third height h3 may further constitute a stepped structure by the third portion, and specifically may constitute a stepped structure with at least one of the first portion 10 and the second portion 20 . It should be noted here that the drawings only show the case where the third part and the first part form a stepped structure, which should not be construed as a limitation of the present disclosure. As mentioned above, the first part and the second part are only to distinguish the two structures that form the moiré, so the third part and the second part can also form a stepped structure. Specifically, taking the glass plate as a rectangle as an example, the rectangle has two pairs of edges that are perpendicular to each other, one of which is the x-direction and the other is the y-direction. Taking the angle between the first direction and the y-direction as an acute angle as an example, refer to FIG. 1 and FIG. 2, the left half of the first texture at BB' shown in FIG. 1 and (b) in FIG. The part at the dotted frame along the BB' direction has undergone both the first etching treatment when the first stripe pattern is formed, and the second etching treatment when the second stripe is formed, Here, the height of the first part 10 adjacent to the dashed frame is h1, and the glass material along the BB' direction shown by the dashed frame is removed more, so that (b) in FIG. 2 can be formed. ) at the third section 30. It can be understood by those skilled in the art that (b) of FIG. 2 does not completely show the part of the second portion 20A along the B-B' direction. Similarly, when the moiré fringes are depressions on the surface of the substrate, referring to (a)-(c) in FIG. 3 , the glass material at the first and second fringe patterns can be removed by etching, for example. , forming concave stripes on specific parts of the substrate surface. The parts of the recessed first stripe pattern and the second stripe pattern that do not intersect each other constitute the recessed first part 10 and the second part 20, and the depth of the recess is the corresponding height of the first part and the second part. Similarly, (c) in FIG. 2 undergoes two etching processes to form a fourth portion 40 with a deeper depth. Part (b) in FIG. 2 has only undergone the etching process to form the first stripe pattern, which is the first part 10 , and the other part has been etched twice to form a deeper third part 30 .

It should be noted here that the height difference between the first part and the third part shown in FIGS. 2 and 3 is only for the purpose of understanding the positions of the first part and the third part, and should not be understood as the first part. and the relative height of the third part. That is to say, as long as the heights of the first part and the third part are different, the height of the first part may be higher, or the height of the third part may be higher. Similarly, h1-h4 shown in FIG. 2 are only for the purpose of distinguishing the heights of different parts constituting the moiré stripes, and cannot be understood as the specific heights of the first, second, third and fourth parts. limited. Specifically, the first part and the second part may have the same height, ie h1 may be equal to h2. Alternatively, the height of the first portion may be greater than that of the second portion, that is, h1 may be greater than h2. h4 is the height of the fourth part. Since the fourth part has been etched twice, the height of the fourth part can be greater than or equal to the larger of h1 and h2, or it can be both greater than the height h1 of the first part, or greater than the height of the first part. The height h2 of the second part.

According to some examples of the present disclosure, the third part may also form a step structure with the first part and the second part, that is, the third part may be located between the first part 10 and the second part 20 , which constitute two step structures. As mentioned above, the first stripe pattern and the second stripe pattern may be recesses formed on the surface of the substrate by etching and removing the glass material at the corresponding positions. Referring to FIGS. 6a-6e, when the first etching mask is used After the film 200 is formed with the first stripe pattern, referring to FIG. 6c, a second etch mask 300 may be disposed on the substrate having the first stripe pattern. Referring to (b) in FIG. 6d, it can be seen that only a part of the recessed portion located in the B-B' direction in FIG. 6c is covered by the second etching mask 300 at this time. In other words, therefore, when the etching is continued to form the second stripe pattern, the exposed portion at the position in the BB' direction in FIG. 6c is stepped as shown in (b) of FIG. 6d structure. Therefore, the depth of the part of the stepped structure continues to deepen when the second stripe pattern is formed by the second etching, thereby forming the third part and the second part. At this time, the third part 30 is located between the first part (the concave part covered by the second etching mask 300 in (b) in FIG. 6e ) and the second part 20 , and the three can form two stepped structures .

According to some examples of the present disclosure, the maximum height of the moiré fringes may not exceed 100 microns. That is, among the above-mentioned first, second, third and fourth parts, the height of the part with the largest height h is not more than 100 μm. Preferably, no more than 10 microns, more preferably no more than 6 microns. As mentioned above, the moiré fringes can be formed by etching glass material. Therefore, controlling the height of the moiré fringes not to exceed the above-mentioned value, especially not to exceed 6 microns, can ensure that the glass material after the etching treatment still has sufficient mechanical strength. Moreover, since the moiré fringes proposed in the present disclosure are formed by superimposing multiple patterns (such as the aforementioned fringe patterns), that is to say, the same side surface of the glass material needs to be etched multiple times (at least twice). Therefore, reasonable control of the height of the moiré fringes can ensure that the moiré fringes have a good visual effect of interference fringes, and can provide a certain uneven touch. It affects the strength of the formed glass sheet.

According to an embodiment of the present disclosure, the moire fringes, the first fringe pattern, and the second fringe pattern independently have a frequency vector f and a modulo f of the frequency vector, and the modulo f of the frequency vector is 1000 μm in a direction perpendicular to the fringe vector. The number of stripes in the length range, the moiré stripe has a vector f _mol , and in the polar coordinate system has f _mol = (f _mol , θ _mol ), the first stripe pattern has a vector f ₁ , and has f in the polar coordinate system ₁ =(f ₁ , θ ₁ ), θ ₁ =0, the second fringe pattern has a vector f ₂ , and f ₂ =(f ₂ , θ ₂ ) in polar coordinates, 0<θ ₂ ≤90, and η=f ₁ /f ₂ , θ is the angle between f ₁ and f ₂ , the moiré pattern, the first stripe pattern and the second stripe pattern satisfy the following conditions:

(1) The ranges of f ₁ and f ₂ are independently 5 to 1000;

(2) _0.1≤f ≤1000;

(3) 0° _≤θm≤90 °;

(4) 0.005≤η≤200;

(5) _θm = arctan(sinθ/(cosθ-η)),

Or _θM = arctan(sinθ/(cosθ+η)),

Moiré fringes that meet the above conditions have a good glare fringe effect on the one hand, that is, they will not cause dizziness because the fringes are too dense or messy, and will not cause precise interference due to improper fringe spacing. Moiré visual effect. Moreover, the moiré fringes satisfying the above conditions can be formed by a first stripe pattern and a second stripe pattern with proper spacing and width, so that the substrate of the glass sheet can still maintain a certain mechanical strength after etching.

According to some specific embodiments of the present disclosure, the moiré pattern, the first stripe pattern and the second stripe pattern may also satisfy the following conditions:

_0.25≤f ≤50;

0° _≤θMo≤90 °;

The ranges of f ₁ and f ₂ are independently 7 to 50;

0.5≤η≤2;

And θ ₂ satisfies 0°<θ ₂ ≦(arccosη/2)*180/π.

Therefore, the visual effect of the moiré fringes can be further improved, and the overall mechanical strength of the glass plate can be guaranteed not to be significantly reduced.

For the convenience of understanding, the above parameters of the first stripe pattern, the second stripe pattern and the moiré pattern will be described in detail below. As mentioned above, the moiré fringes can bring the visual effect of glare texture to the glass sheet, so it is required that the moire fringes on the glass sheet can realize interference fringes visible to the naked eye. Therefore, the shape, frequency, and the like of the moiré fringes according to the present disclosure need to satisfy certain conditions. Referring to FIG. 11 , in order to distinguish the moire fringes caused by aliasing interference with general waveforms, the simplest cosine grating in spectral information is used to simulate the generation process of moiré. Now define the angle between the vector direction of each frequency vector and the u-axis as θ, which is the angle of the frequency vector. The number of stripes within a length of 1000 μm perpendicular to the vector direction is the modulus f of the frequency vector, so the polar coordinate of the frequency vector f is (f, θ), which is converted to Cartesian coordinates as (f*cosθ, f*sinθ), In addition, the width of the stripes is L, that is, f=1000 μm/L. For example, the above two fringe patterns are superimposed, the first fringe pattern can be expressed as f ₁ =(f ₁ , θ ₁ ), and the second fringe pattern can be expressed as f ₂ =(f ₂ , θ ₂ ). For the convenience of description, the vector direction of f ₁ is now set as the y-axis as shown in Figure 11, whereby the vectors of the two fringe patterns can be simply expressed as:

f ₁ =(f ₁ ,0°),

f ₂ =(f ₂ ,θ ₂ ),

Define θ as the angle between f ₁ and f ₂ , that is, the superposition angle of the first stripe pattern and the second stripe pattern. η is the ratio of f ₁ and f ₂ , that is, η=f ₁ /f ₂ =L ₂ /L ₁ . Wherein L1 is the stripe width of the _first stripe pattern, and L2 is the stripe width of the _second stripe pattern. Therefore, the coordinates of f ₂ -f ₁ (f ₁ -f ₂ are the same, and will not be repeated here) can be obtained by simple calculation, and the Cartesian coordinates are:

(f ₂ cosθ-f ₁ ,f ₂ sinθ),

The polar coordinates are:

该摩尔条纹的强度为原始纹理(即第一条纹图案和第二条纹图案)强度的1/4。 That is, the moiré fringes satisfy θ _Mo = arctan(sinθ/(cosθ-η)),

The intensity of the moiré is 1/4 of the intensity of the original texture (ie, the first and second stripe patterns).

Similarly f ₁ +f ₂ or -f ₁ -f ₂ Moiré fringes satisfy:

_θMo = arctan(sinθ/(cosθ+η)),

At this time, the intensity of the moiré fringes is also 1/4 of the original texture intensity.

According to an embodiment of the present disclosure, referring to FIG. 10 , the moiré fringes may also be formed by superimposing three patterns. Specifically, a plurality of patterns including but not limited to lattice structures (the lattice patterns M, K and C as shown in the figure) can be rotated and superimposed at different angles, so that different molar patterns can be formed. Striped pattern. The fringe pattern of the superimposed part can have different visual effects according to the rotation angle of the dot matrix pattern. That is to say, the moiré stripe may further include a fifth part, the fifth part has a fifth height, and the fifth part is formed by superimposing at least three patterns. Those skilled in the art can understand that when the moiré has a fifth part, the fifth part may be located in the area where the three patterns overlap, that is, the glass material of the fifth part may be formed by etching three times.

It should be noted here that moiré fringes in the present disclosure should be understood in a broad sense, representing a pattern that can provide an interference moiré effect, rather than a pattern consisting of a plurality of parallel fringes. For example, the moiré fringes on the surface of the glass sheet proposed in the present disclosure may have a structure as shown in FIG. 10 .

According to some examples of the present disclosure, in order to further improve the appearance effect of the glass sheet, the side of the substrate without moiré fringes may further include at least one of a color layer, a coating layer and a bottom ink layer. That is to say, the glass sheet may further have one, two or three of a color layer, a coating layer and an undercoating ink layer. Wherein, when there are more than one color layer, coating layer and cover bottom ink layer, the color layer can be disposed on the side closest to the substrate, and the cover bottom ink layer can be disposed on the side farthest from the substrate. When the glass sheet has all of the color layer, the coating layer and the cover bottom ink layer, the color layer can be in contact with the substrate, the coating layer is located on the side of the color layer away from the substrate, and the cover bottom ink layer is located on the side of the coating layer away from the color layer . According to some examples of the present disclosure, the material for forming the color layer may include optical glue, such as OCO glue, and the thickness of the color layer may be 1-3 microns. The color layer can have a certain color, thereby improving the appearance effect of the glass plate. The coating layer may be formed by means including but not limited to PVD (Physical Vapor Deposition), specifically may include a plurality of sub-layers stacked in sequence, and provide metallic luster to the glass sheet. Specifically, the material for forming the coating layer may include metals and metal oxides, as well as inorganic oxides such as silicon dioxide. The cover bottom ink layer can be a layer of opaque ink, which can make the glass plate have an opaque effect, and then can be used to form the shell of the electronic device to prevent the main board, circuit or battery inside the electronic device from being damaged. directly observed by the user. Specifically, the transmittance of the bottom ink layer may not be higher than 10%.

In another aspect of the present disclosure, the present disclosure proposes a method of making the previously described glass sheet. The method includes the step of forming moiré fringes on the surface of one side of the substrate. The method will be described in detail below in the case that the moiré fringes can be formed by superimposing the first fringe pattern and the second fringe pattern. Referring to FIG. 4 , the operation of forming the moiré fringes may specifically include:

S100: Form the first part of the moiré fringes based on the first etching mask

In this step, the first portion of the moiré fringes is formed on the surface of the base body based on the first etching mask. As mentioned above, the first part of the moiré stripes may be formed based on the first etching mask, and the first etching mask may form a pattern consistent with the first stripe pattern, that is, a partial area of the first stripe pattern The first part of the moiré pattern is constituted, and the part of the first stripe pattern overlapping with the second stripe pattern in the subsequent steps constitutes a boundary part. The type and specific position of the etching mask are not particularly limited. For example, the etching mask may be made of photoresist, and the first etching mask covers a part of the surface of the substrate and exposes the remaining areas. The part covered by the first etch mask may be the part corresponding to the first stripe pattern, or the first etch mask may expose the part of the substrate surface and the part corresponding to the first stripe pattern. When the etching mask covers the area where the moiré fringes are located, the glass material in the portion not covered by the etching mask can be removed by etching, thereby forming raised moiré fringes. When the etch mask exposes the area where the moiré is located, a recessed moiré is formed.

S200 : forming the second portion of the moiré fringes based on the second etching mask

In this step, the second portion of the moiré fringes is formed on the surface of the base body based on the second etching mask. Similar to the first etch mask, the second etch mask may be used to form a second stripe pattern constituting moiré stripes. Thus, the second portion of the moiré fringes can be formed at the portion of the second etching mask that does not overlap the first etching mask, and the boundary portion can be formed at the overlapping portion of the two while forming the second portion.

The following describes the process of forming moiré fringes in detail according to some specific examples of the present disclosure:

Referring to FIGS. 5 a to 5 d , a first etching mask 200 and a second etching mask 300 may be simultaneously formed on the surface of the base body 100 . Taking the area covered by the etching mask and the moiré fringes as an example, Figure 5b shows a schematic diagram of the cross-sectional structure of the etching mask at different positions in Figure 5a, and (a) in Figure 5b is A in Figure 5a. - A schematic diagram of the cross-sectional structure of the etching mask in the A' region, (b) in Figure 5b is a schematic cross-sectional structure of the etching mask in the BB' region in Figure 5a, and Figure 5b (c) is a schematic diagram of the cross-sectional structure Schematic diagram of the cross-sectional structure of the etching mask in the CC' region in 5a. The material forming the first etch mask and the second etch mask is configured to remove the first etch mask and the second etch mask from the substrate in steps. That is to say, when the first etching mask is removed, the second etching mask on the substrate can be kept from being dissolved or removed. Similarly, the second etching mask on the substrate can also be retained when the second etching mask is removed. The etch mask is not dissolved or removed.

Subsequently, the base body 100 may be etched based on the first etching mask and the second etching mask, and then one of the first etching mask and the second etching mask may be removed, for example, as shown in FIG. 5c Otherwise, the second etching mask can be removed to keep the first etching mask 200 . At this time, after the etching process, the area of the surface of the base body that is not covered by the etching mask is removed, thereby forming protrusions having the same shape as the first etching mask and the second etching mask. After the second etching mask is removed, referring to (b) in FIG. 5 c , a part of the region for forming the interface is still covered by the first etching mask 200 , and the other part is exposed. Then, referring to FIG. 5d , the base body 100 is etched again based on the remaining first etching mask 200 . At this time, the base body 100 not covered by the first etching mask 200 in FIG. 5d is all etched to form the first part 10, the second part 20 and the fourth part 40, and the part at (b) in FIG. 5d is etched. Since only a partial area of the protrusion is covered by the first etching mask 200 , a stepped structure is formed, that is, a stepped structure formed by the first part 10 and the third part 30 . After the etching is completed, the first etching mask 200 is removed to form the aforementioned glass plate.

According to an embodiment of the present disclosure, both the first etch mask and the second etch mask may be formed of photoresist, but since they need to be removed in steps, a material for forming the second etch mask is required Insoluble in the first stripping solution, the material forming the first etching mask is soluble in the first stripping solution. Thus, the first etching mask can be removed by using the first stripping solution, while the second etching mask is retained. Similarly, the material for forming the second etching mask can also be dissolved in the second stripping solution, and the material for forming the first etching mask is insoluble in the second stripping solution. Therefore, the second etching mask can be removed first by using the second stripping solution, while the first etching mask is retained. Alternatively, the first etch mask may be formed of positive photoresist and the second etch mask may be formed of negative photoresist. Therefore, two kinds of etching masks with different textures can be formed on the glass surface by using negative photoresist and positive photoresist, and then after the first etching process, the positive photoresist is removed by exposure and development , retain the negative photoresist, and perform a second etching process. Then, the glass plate with moiré fringes formed on one side can be obtained by stripping.

It should be noted here that the first etching mask and the second etching mask are only used to distinguish the mask for forming the first stripe pattern and the mask for forming the second stripe pattern. The upper and lower positional relationship on the substrate is not particularly limited, and the overlapping sequence of the first etching mask and the second etching mask shown in the drawings shown in the present disclosure is only exemplary. Those skilled in the art can understand that, in order to maintain the integrity of the etch mask removed later, the etch mask located above (ie, the side away from the substrate) in the stacked relationship may be removed first.

Alternatively, referring to FIGS. 6 a to 6 e , the first etching mask and the second etching mask may also be formed on the substrate 100 successively, that is, the first etching mask and the second etching mask may be formed on the substrate 100 first. One of the second etching masks, and the other one of the first etching mask and the second etching mask is formed after the mask is removed. Referring specifically to FIG. 6a, a first etch mask 200 may be first formed on the substrate 100, and the first etch mask 200 may expose the substrate 100 where the first stripe pattern needs to be formed. An etching process is then performed based on the first etching mask 200 to form a cross-sectional structure as shown in FIG. 6b. Subsequently, the first etch mask 200 on the substrate 100 can be removed to form a second etch mask 300 exposing the substrate at the regions where the second stripe pattern needs to be formed, and a second etching process is performed. A schematic diagram of the cross-sectional structure of the second etching mask at different positions of the substrate is shown in FIG. 6d , and the cross-sectional structure of a partial area of the substrate surface after the second etching process is shown in FIG. 6e . 6d and 6e (a) are both schematic cross-sectional structural diagrams of the AA' region in Fig. 6c, and Fig. 6d and (b) in Fig. 6e are both the cross-sections of the BB' region in Fig. 6c Schematic diagrams of the structure, Fig. 6d and (c) in Fig. 6e are schematic diagrams of the cross-sectional structure of the CC' region in Fig. 6c. Thus, after removing the second etching mask 300, the aforementioned glass plate can be obtained.

Similarly, when neither the first stripe pattern nor the second stripe pattern is raised, the first etching mask and the second etching mask may also be formed on the substrate 100 successively. Specifically, referring to FIGS. 7a-7c, a first etching mask 200 may be formed first, and the glass material in the uncovered part of the first etching mask may be removed by etching to form a first stripe pattern (not shown in the figure) , and then a second etching mask 300 is formed. At this time, referring to FIG. 7b, it can be seen that the cross-sectional structure at AA' in FIG. 7a is as shown in (a) of FIG. 7b, the first part 10 Although it is exposed to the outside, when the second etching mask 300 is used for etching, the first part 10 and the surrounding glass substrate 100 are both exposed. Therefore, after the second etching process, the The height of a 10 can be considered to remain substantially unchanged. And the height of the protrusion covered by the second etching mask 300 in (c) of FIG. 7b will increase after the second etching, thereby forming the fourth part 40 as shown in FIG. 7c, thereby , the height of the fourth part 40 will be greater than the height of the first part 10 , and since the top of the fourth part 40 is covered by the second etching mask 300 in the second etching process, the height of this part is the first The sum of the depths of the first etching and the second etching, so the height of the fourth portion 40 may be greater than that of the first portion 10 and the second portion 20 .

According to an example of the present disclosure, taking the moire fringes formed by the first stripe pattern and the second stripe pattern as an example, the method needs to undergo two etching processes to obtain the moiré fringes. For ease of understanding, the etching process performed for the first time is defined as the first etching process, and the etching process performed for the second time is defined as the second etching process as an example to describe the specific parameters of the etching process. Specifically, the first etching process and the second etching process may independently be wet etching. The immersion time of the wet etching may be not less than 30s. In this way, the problem of disconnection or incomplete etching of the etching stripes in the wet etching process can be largely avoided. The inventors found that the above-mentioned poor etching problem after the wet etching process is mainly due to the increase in the contact area between the exposed developer (the material forming the etching mask) and the etchant (mostly aqueous solutions), Insufficient wetting exists. Accordingly, the above-mentioned defects can be prevented or even avoided by appropriately extending the immersion time for etching.

In order to further improve the effect of the etching treatment, a pretreatment step may be further included before the wet etching is performed. Specifically, the pretreatment may include at least one of soaking treatment and plasma activation treatment. The soaking treatment may be pre soaking the substrate in an aqueous solution, and the soaking treatment time is not less than 1 minute. The time of the plasma activation treatment can be 2-10s, and those skilled in the art can adjust the time of the activation treatment according to the power of the plasma treatment.

The etching solution used in the first etching process and the second etching process is not particularly limited, for example, an acidic glass etching solution can be selected. The time of the etching process is not particularly limited, and the time of the first etching process and the time of the second etching process may be the same or different. The etching time affects the height of the first stripe pattern and the second stripe pattern formed, and those skilled in the art can adjust it according to the actual design and the thickness of the substrate 100, as long as the formed first stripe pattern and the second stripe pattern overlap. The thickness should not be too thick to affect the overall mechanical strength of the glass sheet.

According to some examples of the present disclosure, after the moiré stripes are formed, the method may further include an operation of forming at least one of a color layer, a coating layer and a bottom ink layer on the side of the substrate 100 where the moiré stripes are not provided. The setting positions and forming methods of the above structures have been described in detail above, and will not be repeated here.

In another aspect of the present disclosure, the present disclosure proposes a housing. Referring to Figure 8, at least a portion of the housing 1100 is formed from the glass sheet described above. Therefore, the casing has at least one of the advantages of good external texture effect and durability. Specifically, the moiré fringes on one side surface of the glass plate may be located on the side away from the accommodating space defined by the housing 1100 .

In another aspect of the present disclosure, the present disclosure proposes an electronic device. Referring to FIG. 9 , the electronic device includes the aforementioned housing 1100 , the housing 1100 defines an accommodation space to accommodate an electrically connected mainboard and a display screen (not shown in the figure), and the moiré stripes are located in the casing 1100 away from the accommodation One side of the space, the moiré, is on the side that can be touched by the user. Therefore, the electronic device can be provided with a better visual effect and a tactile feeling in hand.

According to an embodiment of the present disclosure, the aforementioned electronic device may be any one of various types of computer system devices that are mobile or portable and perform wireless communication. Specifically, the electronic device may be a mobile phone or smart phone (eg, iPhone TM based, Android TM based phone), portable gaming device (eg Nintendo DS TM, PlayStation Portable TM, Gameboy Advance TM, iPhone TM), laptop Computers, PDAs, portable Internet devices, music players, and data storage devices, other handheld devices and devices such as watches, in-ear headphones, pendants, headphones, etc., electronic devices can also be other wearable devices (for example, such as electronic glasses, electronic clothing, electronic bracelets, electronic necklaces, electronic tattoos or head-mounted devices (HMDs) for smart watches).

The present disclosure is described below through specific examples, and those skilled in the art can understand that the following specific examples are only for the purpose of illustration and do not limit the scope of the present disclosure in any way. In addition, in the following examples, unless otherwise specified, the materials and equipment employed are commercially available. If specific processing conditions and processing methods are not explicitly described in the following examples, conditions and methods known in the art can be used for processing.

Example 1

Material preparation: Two kinds of acid-resistant photoresists with different solubility in the stripping solution are used to form the first etching mask (hereinafter referred to as etching mask α) and the second etching mask (hereinafter referred to as etching mask) β), and select the first stripping solution (hereinafter referred to as stripping solution a) and the second stripping solution (hereinafter referred to as stripping solution b), the first stripping solution cannot remove the second etching mask. AG glass is used as the base material. The texture of the first etch mask is shown in (d) of FIG. 12 , where the frequency vector f ₁ =(8.9,0°) of the fringes. The texture of the second etch mask is shown in (e) of FIG. 12 , where the frequency vector f ₂ =(8.8, 17.5°) of the fringes. The frequency vector f of the formed moiré fringes can be expressed as f ₁ -f ₂ , as shown in (f) of FIG. 12 . The angles are all included angles with the y-axis.

Etching treatment: First, the first etching mask is obtained by photolithography on the substrate, and then the second etching mask is formed. The two etching surfaces are stacked on one side of the glass surface to obtain two kinds of photoresists The superimposed texture of , then the glass is etched in the etching solution. After the etching thickness reaches t ₁ , it is taken out and cleaned, and placed in the stripping solution b. After stripping the second etching mask, the glass is placed in the etching solution again. In the middle etching, after the total etching thickness reaches _t2 , take it out, wash it and place it in the stripping solution a to remove the first etching mask.

Where t ₂ >t ₁ , t ₁ is about 2 microns, and t ₂ is about 5 microns.

Forming the decorative layer: spray the OCO glue with color on the side of the substrate without texture, and the thickness is controlled at about 2μm to form a color layer. Subsequently, a coating layer is formed on the color layer, and a primer ink is printed.

Example 2:

Material preparation: prepare photoresists A, B, C, and strip solutions a, b, and c, respectively, to form etching masks α, β, and γ with three texture patterns. Among them, photoresist A is soluble in stripping solution a, but insoluble in stripping solutions b and c; photoresist B is soluble in stripping solution b and insoluble in stripping solutions a and c; photoresist C is soluble in stripping solution Solution c, insoluble in deplating solutions a and b; photoresists A, B and C are all resistant to etching solution corrosion without falling off and dissolving. The etched texture is shown in (a) of FIG. 10 .

Etching treatment: Etch masks α, β, and γ with three texture patterns are formed on the surface layer of one side of the substrate, that is, the three textures are stacked on one side of the glass surface layer. The glass is placed in the etching solution to be etched, and the etching thickness reaches t _1. Take out and wash it and place it in the stripping solution c. After stripping the photoresist C, the glass is placed in the etching solution for etching. After the total etching thickness reaches t ₂ Take out and wash and place in stripping solution b, remove the photoresist B and place the glass in etching solution again for etching, after the total etching thickness reaches _t3 , take out and wash and place in stripping solution a, and finally remove the photoresist After C, a three-layer texture with moiré fringes can be obtained on one side of the glass. where t ₃ >t ₂ >t ₁ . Wherein t ₁ ≤2μm, t ₂ ≤3μm, t ₃ ≤6μm.

Forming a decorative layer: The operation of this step is the same as that of Example 1, and will not be repeated here.

Example 3:

Material preparation: This step is the same as Example 1.

Etching treatment: firstly, an etching mask α is formed on the surface layer of the single surface of the glass product, and the glass is etched in an etching solution. After the etching thickness reaches t ₁ , it is taken out, washed and placed in a stripping solution to remove the etching mask α. Then an etching mask β is formed, the glass product is placed in the etching solution again, and taken out when the total etching thickness is _t2 . where t ₁ and t ₂ are the same as in Example 1.

Forming a decorative layer: The operation of this step is the same as that of Example 1, and will not be repeated here.

Example 4:

Material preparation: Negative photoresist A and positive photoresist B are prepared respectively, and the two photoresist masks formed are α and β. The rest of the parameters are the same as in Example 1.

Etching treatment: use negative photoresist A to obtain the etching mask α by photolithography on the single-side surface of the glass product, and use positive photoresist B to obtain the texture β by photolithography, and the two textures are stacked on one side of the glass surface. . Then the glass is etched in the etching solution, and the etching thickness reaches t ₁ , then it is taken out, washed, and exposed and developed again. After removing the positive photoresist B, the glass is placed in the etching solution for etching again, and the total etching thickness reaches t ₂ . Take it out, wash it and place it in the stripping solution to remove the photoresist A. where t ₁ and t ₂ are the same as in Example 1.

Forming a decorative layer: The operation of this step is the same as that of Example 1, and will not be repeated here.

100 pieces of glass plates were repeatedly prepared by the scheme shown in Example 1-Example 4, among which, good Moiré fringe interference effect could be obtained in Examples 1-Example 4. The surface of the glass plate was observed with an optical microscope, and the product averaged the residue of the etching mask. The glue area is less than 6% of the overall area of the board, and no glue residue is visible to the naked eye. The fringe breakage rates of the moiré fringes obtained in Examples 1-4 were observed under an optical microscope, and the average breakage rates of 100 samples were all less than 11%.

According to embodiments of the present disclosure, the electronic device may also be any one of a plurality of electronic devices, including but not limited to cellular phones, smart phones, other wireless communication devices, personal digital assistants, audio players, other media Players, Music Recorders, Video Recorders, Cameras, Other Media Recorders, Radios, Medical Equipment, Vehicle Transportation Instruments, Calculators, Programmable Remote Controls, Pagers, Laptops, Desktops, Printers, Netbooks, Personal Digital Assistants (PDAs), Portable Multimedia Players (PMPs), Moving Picture Experts Group (MPEG-1 or MPEG-2) Audio Layer 3 (MP3) players, portable medical devices and digital cameras and combinations thereof.

According to embodiments of the present disclosure, in some cases, an electronic device may perform various functions (eg, play music, display video, store pictures, and receive and send phone calls). If desired, the electronic device may be a portable device such as a cellular phone, media player, other handheld device, wristwatch device, pendant device, handset device, or other compact portable device.

In the description of this specification, description with reference to the terms "one embodiment," "another embodiment," etc. means that a particular feature, structure, material, or characteristic described in connection with the embodiment is included in at least one embodiment of the present disclosure . In this specification, schematic representations of the above terms are not necessarily directed to the same embodiment or example. Furthermore, the particular features, structures, materials or characteristics described may be combined in any suitable manner in any one or more embodiments or examples. Furthermore, those skilled in the art may combine and combine the different embodiments or examples described in this specification, as well as the features of the different embodiments or examples, without conflicting each other.

Although the embodiments of the present disclosure have been shown and described above, it should be understood that the above-described embodiments are exemplary and should not be construed as limitations of the present disclosure, and those of ordinary skill in the art may interpret the above-described embodiments within the scope of the present disclosure. Embodiments are subject to variations, modifications, substitutions and variations.

Claims (21)

A glass sheet, comprising: a substrate, the surface of one side of the substrate has moiré fringes, The moiré at least includes a plurality of first parts and a plurality of second parts, the plurality of first parts all extend along the first direction, the plurality of second parts all extend along the second direction, the first The direction intersects with the second direction, the first part has a first height, the second part has a second height, and the moiré fringe also has a boundary part, the boundary part is located in the boundary area, the boundary area is the junction of the extending direction of the first part and the extending direction of the second part, And the two adjacent first parts located on the same straight line are connected by the junction part, and the two adjacent second parts located on the same straight line are connected by the junction part. The glass plate according to claim 1, wherein the moiré stripes are convex or concave, and the moiré stripes can be decomposed into a superposition of the first stripe pattern and the second stripe pattern, the first stripe pattern has a first height, the second stripe pattern has a second height, There is an overlapping area between the first stripe pattern and the second stripe pattern. The glass sheet of claim 2, wherein the moiré, the first fringe pattern, and the second fringe pattern each independently have a frequency vector f and a mode f of a frequency vector, the mode of the frequency vector f is the number of stripes in the length range of 1000 μm perpendicular to the stripe vector direction, The moiré fringes have a vector f _mol , and in the polar coordinate system there is f _mol = (f _mol , θ _mol ) The first fringe pattern has a vector f ₁ , and in the polar coordinate system, f ₁ =(f ₁ , θ ₁ ), θ ₁ =0; The second fringe pattern has a vector f ₂ , and in the polar coordinate system, f ₂ =(f ₂ , θ ₂ ), 0<θ ₂ ≤90; And η=f ₁ /f ₂ , θ is the angle between f ₁ and f ₂ , the moiré pattern, the first fringe pattern and the second fringe pattern satisfy the following conditions: The ranges of f ₁ and f ₂ are independently 5 to 1000; _{0.1≤fm≤1000} ; 0° _≤θMo≤90 °; 0.005≤η≤200; _θMo = arctan(sinθ/(cosθ-η)),

Or _θM = arctan(sinθ/(cosθ+η)),

The glass sheet according to claim 3, wherein the moiré, the first stripe pattern and the second stripe pattern satisfy the following conditions: _0.25≤f ≤50; 0° _≤θMo≤90 °; The ranges of f ₁ and f ₂ are independently 7 to 50; 0.5≤η≤2; And θ ₂ satisfies 0°<θ ₂ ≦(arccosη/2)*180/π. The glass sheet according to claim 1, wherein the interface portion includes a third portion and a fourth portion, and at least one of the first portion and the second portion and the third portion form a stepped structure , the fourth part has a fourth height, and the fourth height is greater than or equal to the larger one of the first height and the second height, And two adjacent first parts on the same straight line are connected by at least one of the third part and the fourth part, and two adjacent first parts on the same straight line are connected by at least one of the third part and the fourth part. The two parts are connected by at least one of the third part and the fourth part. The glass sheet of any one of claims 1-5, further comprising a fifth portion, the fifth portion having a fifth height. The glass sheet of claim 1, wherein the moiré fringes have a maximum height of no more than 100 microns. The glass sheet of claim 1, wherein the moiré fringes have a maximum height of no more than 10 microns. The glass sheet of claim 1, wherein the moiré fringes have a maximum height of no more than 6 microns. The glass plate according to claim 1, wherein, the side of the base without the moiré fringes further comprises at least one of the following structures: color layer; coating layer; and Cover the bottom ink layer. The glass sheet according to claim 10, wherein the glass sheet satisfies at least one of the following conditions: The material forming the color layer includes optical glue; The thickness of the color layer is 1-3 microns; The coating layer includes a plurality of sub-layers stacked in sequence; The transmittance of the cover bottom ink layer is not higher than 10%. A method for preparing the glass plate according to any one of claims 1-11, wherein the method comprises forming moiré fringes on the surface of one side of the substrate, and the operation of forming the moiré fringes comprises: Based on the first etching mask and the second etching mask, the moiré fringes are formed on the surface of the substrate side by at least two etching processes, and forming the first portion of the moiré fringes based on the first etching treatment, forming the second portion and the boundary portion of the moiré fringes based on the second etching treatment, And before the second etching process is performed, an operation of removing the first etching mask is further included. The method of claim 12, comprising: forming the first etching mask and the second etching mask in sequence on the base; performing the first etching process on the substrate having the first etching mask and the second etching mask; removing the first etching mask and retaining the second etching mask; The second etching process is performed on the base body having the second etching mask. The method of claim 12, comprising: forming the first etching mask on the substrate and performing the first etching process; The second etching mask is formed on the substrate subjected to the first etching process, and the second etching process is performed. 14. The method of claim 13 or 14, wherein the material forming the first etch mask and the second etch mask is configured such that the first etch mask and the second etch mask can be etched in steps The etch mask is removed from the substrate. The method according to claim 15, wherein the materials for forming the first etching mask and the second etching mask are both photoresist, and the material for forming the second etching mask is insoluble in the first etching mask A stripping solution, the material forming the first etching mask is soluble in the first stripping solution. 16. The method of claim 15, wherein the first etch mask is formed of positive photoresist and the second etch mask is formed of negative photoresist. The method according to claim 15, wherein the first etching process and the second etching process are independently wet etching, and the immersion time of the wet etching is not less than 30s. The method according to claim 18, wherein before performing the wet etching, further comprising a pretreatment, the pretreatment comprising at least one of the following steps: Infiltration treatment, the infiltration treatment is to place the substrate in an aqueous solution, and the time of the infiltration treatment is not less than 1 minute; Plasma activation treatment, the time of the plasma activation treatment is 2-10s. A casing, wherein at least a portion of the casing is formed of the glass sheet of any one of claims 1-11. An electronic device comprising: The casing of claim 20, wherein the casing defines an accommodation space, and the moiré stripes are located on a side of the casing away from the accommodation space, A mainboard and a display screen, the mainboard and the display screen are electrically connected and located inside the accommodating space.

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