WO2022184131A1 - Circuit board assembly and manufacturing method therefor, and electronic device - Google Patents
Circuit board assembly and manufacturing method therefor, and electronic device Download PDFInfo
- Publication number
- WO2022184131A1 WO2022184131A1 PCT/CN2022/079026 CN2022079026W WO2022184131A1 WO 2022184131 A1 WO2022184131 A1 WO 2022184131A1 CN 2022079026 W CN2022079026 W CN 2022079026W WO 2022184131 A1 WO2022184131 A1 WO 2022184131A1
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- Prior art keywords
- circuit board
- chip
- layer
- board assembly
- conductive
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/48—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
- H01L23/488—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
- H01L23/498—Leads, i.e. metallisations or lead-frames on insulating substrates, e.g. chip carriers
- H01L23/49838—Geometry or layout
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/50—Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the groups H01L21/18 - H01L21/326 or H10D48/04 - H10D48/07 e.g. sealing of a cap to a base of a container
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/48—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
- H01L23/488—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
- H01L23/498—Leads, i.e. metallisations or lead-frames on insulating substrates, e.g. chip carriers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/02—Bonding areas; Manufacturing methods related thereto
- H01L2224/023—Redistribution layers [RDL] for bonding areas
- H01L2224/0237—Disposition of the redistribution layers
- H01L2224/02377—Fan-in arrangement
Definitions
- the present application relates to the field of chip board level interconnection, and in particular, to a circuit board assembly, a manufacturing method thereof, and an electronic device.
- Electronic equipment such as communication equipment includes circuit board assemblies.
- the package substrate carrying the chip in the circuit board assembly is usually fixed to the circuit board by a surface mount process.
- the size of the package substrate in the prior art is relatively large, and the larger size of the package substrate is prone to warping in the surface mount process engineering, which has a large arc surface impact on the surface mount process and reduces the surface mount quality of workmanship.
- Embodiments of the present application provide a circuit board assembly, an electronic device including the circuit board assembly, and a manufacturing method of the circuit board assembly, aiming to reduce the risk of warpage of the circuit board assembly.
- the present application provides a circuit board assembly.
- the circuit board assembly includes a circuit board, a transfer layer and a packaged chip, the transfer layer includes M conductive paths with first ends and second ends, the M conductive paths are arranged at intervals, and the first conductive paths of all the conductive paths are arranged at intervals.
- the ends are in the same direction, the second ends of all the conductive paths are in the same direction, each of the first ends is electrically connected to the circuit board, and each of the second ends is electrically connected to the packaged chip; M number of the second ends
- the area of the arrangement regions of the ends is smaller than the area of the arrangement regions of the M first ends, where M is an integer greater than or equal to 2.
- the M first ends can be arranged in various forms, for example, the M first ends can be arranged in an array form or a non-array form.
- the arrangement forms of the M second ends are various, for example, the M second ends may be arranged in an array form or a non-array form.
- the circuit board assembly includes a first reference plane and a second reference plane, the end surfaces of the M first ends are all located on the first reference plane, and the end surfaces of the M second ends are all located on the second reference plane.
- the arrangement area of the M first ends is, on the first reference plane, an area surrounded by several first ends located at the outermost periphery among the M first ends.
- the arrangement area of the M second ends is, on the second reference plane, an area surrounded by several second ends located at the outermost periphery among the M second ends.
- the explanation of the "arrangement area" that appears below is the same as the above description, and will not be repeated.
- the packaged chip of the circuit board assembly in the related art is directly arranged on the circuit board.
- the circuit board assembly in this embodiment realizes the transfer between the package chip and the circuit board through the transfer layer.
- the first end of the transfer layer is electrically connected to the circuit board, the second end is electrically connected to the package chip, and M second ends are electrically connected to the circuit board.
- the area of the arrangement area of the ends is smaller than the area of the arrangement area of the M first ends.
- the transition layer is a fan-in type transition layer, that is, the fan-in type transition layer realizes the fan-in from the circuit board to the packaged chip.
- the size of the packaged chip on the circuit board can be made smaller, for example, the size of the packaged chip is reduced from 100*100mm to 80*80mm, so that the circuit board components will warp and crack the solder joints during packaging, welding and other processing. Less risk and improved reliability of circuit board assemblies.
- the reduced size of the packaged chip can increase the layout area of other components on the circuit board, or can reduce the size of the circuit board, which is beneficial to the miniaturization of circuit board components.
- the area of the arrangement area of the second end is less than or equal to 80% of the area of the arrangement area of the first end, that is, the size of the packaged chip can be reduced to 80% or Smaller, when the size of the packaged chip is reduced to 80% or less, the risk of warpage and solder joint cracking of the circuit board assembly can be effectively reduced, and the reliability of the circuit board assembly can be improved.
- the area of the arrangement regions of the M second ends may also be smaller than the area of the arrangement regions of the M first ends by other values.
- the thermal expansion coefficient of the transition layer is smaller than the thermal expansion coefficient of the circuit board and greater than the thermal expansion coefficient of the packaged chip.
- the transition layer buffers the thermal expansion coefficient difference between the circuit board and the packaged chip, which can effectively reduce the risk of mismatch between the two, reduce the risk of warping and cracking of the circuit board components, and improve the reliability of the circuit board components.
- the transition layer further includes a buffer function layer, the conductive path runs through the buffer function layer, and the first end and the second end respectively expose two of the buffer function layer. opposite surfaces.
- the buffer function layer is used to fix the conductive path, and on the other hand, the buffer function layer can buffer heat and mechanical stress when the packaged chip is fixed on the transfer layer, thereby reducing the risk of warpage and cracking of the solder joints of the circuit board assembly.
- the buffer functional layer adopts an insulating material.
- the insulating material can be various, such as polypropylene, polyimide and other dielectric materials.
- the elastic modulus of the buffer functional layer is greater than or equal to 200 MPa, which can effectively buffer thermal and mechanical stress, and reduce the risk of warping and cracking of solder joints in the circuit board assembly.
- the packaged chip further includes a plurality of solder balls, and each of the solder balls is electrically connected to the second terminal in a one-to-one correspondence.
- the circuit board assembly further includes a conductive layer, the conductive layer is located between the transfer layer and the packaged chip, the conductive layer includes a buffer layer and a The conductive medium of the buffer layer is electrically connected between the second end and the package chip.
- the packaged chip is connected with the transition layer through the conductive layer, and multiple components in the circuit board assembly are fixed into a package. Reduce the risk of warping and cracked solder joints in circuit board assemblies.
- the circuit board assembly further includes a plurality of first pads placed on the circuit board and a plurality of second pads placed on the packaged chip, and the The first end is connected to the corresponding first pad, and the second end of the conductive path is connected to the corresponding second pad.
- the packaged chip includes a chip and a package substrate, the chip is mounted on the package substrate, and the package substrate includes a conductive surface facing away from the chip, the conductive surface is connected to the package substrate. The second end is electrically connected.
- the present application also provides a method for manufacturing a circuit board assembly.
- the manufacturing method includes:
- a transfer layer is formed on the mounting surface of the circuit board, wherein the transfer layer includes M conductive paths with a first end and a second end, the M is an integer greater than or equal to 2, and the M conductive paths of the second ends
- the area of the arrangement area is smaller than the area of the arrangement area of the M first ends, and the first ends are electrically connected to the circuit board;
- the packaged chip is fixed to the side of the transfer layer facing away from the circuit board and electrically connected to the second end.
- a transfer layer is formed between the circuit board and the package chip, and the area of the M second ends that are electrically connected between the transfer layer and the circuit board is smaller than the area where the transfer layer is electrically connected to the package chip.
- the area of the arrangement area of the M first ends it can be understood that the transition layer is a fan-in type transition layer, that is, the fan-in type transition layer realizes the fan-in from the circuit board to the packaged chip.
- the chip is directly fixed on the circuit board, and the size of the packaged chip fixed on the circuit board through the transfer layer can be made smaller, so that the risk of warpage and solder joint cracking of the circuit board assembly during packaging, welding and other processing is smaller. , improve the reliability of circuit board components.
- the reduced size of the packaged chip can increase the layout area of other components on the circuit board, or can reduce the size of the circuit board, which is beneficial to the miniaturization of circuit board components.
- the method for forming the transition layer includes: forming a first buffer base layer on the mounting surface of the circuit board; forming a first opening exposing the circuit board on the first buffer base layer; A conductive path having a first end and a second end is formed in the first opening.
- the buffer function layer is used to fix the conductive path, and on the other hand, the buffer function layer can buffer heat and mechanical stress when the packaged chip is fixed on the transfer layer, thereby reducing the risk of warpage and cracking of the solder joints of the circuit board assembly.
- the elastic modulus of the first buffer base layer is greater than or equal to 200 MPa, which can effectively buffer thermal and mechanical stress, and reduce the risk of warping and cracking of solder joints of the circuit board assembly.
- the manufacturing method before the package chip is electrically connected to the second end, the manufacturing method further includes: forming a connection with the second end on the side of the transition layer facing away from the circuit board. A conductive layer connected to the terminal; the package chip is electrically connected to the second end including the package chip and the conductive layer being bonded and fixed.
- the packaged chip is connected with the transition layer through the conductive layer, and multiple components in the circuit board assembly are fixed into a package. Reduce the risk of warping and cracked solder joints in circuit board assemblies.
- the method for forming the conductive layer includes: forming a second buffer base layer on the side of the transition layer facing away from the circuit board; A second opening at two ends; a conductive medium conductively connected to the second end is formed in the second opening; the bonding and fixing of the packaged chip and the conductive layer includes the packaged chip and the conductive layer The conductive medium is fixed by bonding.
- the area of the arrangement area of the second end is less than or equal to 80% of the area of the arrangement area of the first end, that is, the size of the packaged chip can be reduced to 80% or Smaller, when the size of the packaged chip is reduced to 80% or less, the risk of warpage and solder joint cracking of the circuit board assembly can be effectively reduced, and the reliability of the circuit board assembly can be improved.
- the area of the arrangement regions of the M second ends may also be smaller than the area of the arrangement regions of the M first ends by other values.
- the thermal expansion coefficient of the transition layer is smaller than the thermal expansion coefficient of the circuit board and greater than the thermal expansion coefficient of the packaged chip.
- the transition layer buffers the thermal expansion coefficient difference between the circuit board and the packaged chip, which can effectively reduce the risk of mismatch between the two, reduce the risk of warping and cracking of the circuit board components, and improve the reliability of the circuit board components.
- the present application also provides a method for manufacturing a circuit board assembly.
- the manufacturing method includes:
- a transfer layer is formed on the packaged chip, wherein the transfer layer includes M conductive paths with a first end and a second end, the M is an integer greater than or equal to 2, and the arrangement of the M second ends The area of the area is smaller than the area of the arrangement area of the M first ends, and the second ends are electrically connected to the package chip;
- the side of the transition layer facing away from the packaged chip is fixed to the circuit board, and the first end is electrically connected to the circuit board.
- a transfer layer is formed between the circuit board and the package chip, and the area of the M second ends that are electrically connected between the transfer layer and the circuit board is smaller than the area where the transfer layer is electrically connected to the package chip.
- the area of the arrangement area of the M first ends it can be understood that the transition layer is a fan-in type transition layer, that is, the fan-in type transition layer realizes the fan-in from the circuit board to the packaged chip.
- the chip is directly fixed on the circuit board, and the size of the packaged chip fixed on the circuit board through the transfer layer can be made smaller, so that the risk of warpage and solder joint cracking of the circuit board assembly during packaging, welding and other processing is smaller. , improve the reliability of circuit board components.
- the reduced size of the packaged chip can increase the layout area of other components on the circuit board, or can reduce the size of the circuit board, which is beneficial to the miniaturization of circuit board components.
- the present application further provides an electronic device.
- the electronic device includes the above-mentioned circuit board assembly.
- the electronic device is, for example, a communication device or an electronic device with a circuit board assembly related to information and communication technology.
- FIG. 1 is a schematic structural diagram of an electronic device provided by an embodiment of the present application.
- FIG. 2 is a schematic structural diagram of a circuit board assembly of the electronic device shown in FIG. 1;
- FIG. 3 is a schematic diagram of the comparison between the circuit board assembly shown in FIG. 2 and the circuit board assembly of the related art
- FIG. 4 is a schematic diagram of the warpage risk of the two circuit board assemblies shown in FIG. 3;
- FIG. 5 is a schematic structural diagram of another embodiment of the circuit board assembly shown in FIG. 2;
- FIG. 6 is a schematic structural diagram of another embodiment of the circuit board assembly shown in FIG. 2;
- FIG. 7 is a schematic structural diagram of another embodiment of the circuit board assembly shown in FIG. 2;
- FIG. 8 is a schematic structural diagram of another embodiment of the circuit board assembly shown in FIG. 7;
- FIG. 9 is a schematic structural diagram of another embodiment of the circuit board assembly shown in FIG. 2;
- FIG. 10 is a schematic flowchart of a method for manufacturing a circuit board assembly provided by an embodiment of the present application.
- Fig. 11 is a specific process schematic diagram of the manufacturing method shown in Fig. 10;
- FIG. 12 is a schematic flowchart of another method for manufacturing a circuit board assembly provided by an embodiment of the present application.
- Fig. 13 is the concrete process schematic diagram of the manufacturing method shown in Fig. 12;
- FIG. 14 is a schematic flowchart of another method for manufacturing a circuit board assembly provided by an embodiment of the present application.
- Fig. 15 is a specific process schematic diagram of the manufacturing method shown in Fig. 14;
- FIG. 16 is a schematic flowchart of another method for manufacturing a circuit board assembly provided by an embodiment of the present application.
- Fig. 17 is the specific process schematic diagram of the manufacturing method shown in Fig. 16;
- FIG. 18 is a specific process schematic diagram of another embodiment of the circuit board assembly shown in FIG. 17;
- FIG. 19 is a specific process schematic diagram of another embodiment of the circuit board assembly shown in FIG. 17 .
- connection may be detachable connection, or It is a non-removable connection; it can be a direct connection or an indirect connection through an intermediate medium.
- fixed connection refers to connection with each other and the relative positional relationship after connection remains unchanged.
- CTE Coefficient of thermal expansion
- Fan-in wafer-level packaging is mainly divided into two types: fan-in and fan-out. Fan-in can combine multiple logic devices, analog devices and memory. The chip is integrated into the circuit board, which can reduce the overall package area.
- FIG. 1 is a schematic structural diagram of an electronic device provided by an embodiment of the present application.
- the embodiment of the present application provides an electronic device 100.
- the electronic device 100 includes a casing 10 and a circuit board assembly 20.
- the circuit board assembly 20 is arranged inside the casing 10.
- the circuit board assembly 20 can be understood as having electronic components such as chips and circuit boards. Stacked circuit board assemblies.
- the circuit board assembly 20 is used to implement functions such as processing, storage, control, and operation of the electronic device 100 .
- the electronic device 100 may be various types of electronic devices having circuit board assemblies 20 , such as communication devices, electronic devices related to information and communication technology, mobile phones, tablets, computers, and other types of network devices.
- FIG. 2 is a schematic structural diagram of the circuit board assembly 20 of the electronic device 100 shown in FIG. 1 .
- the circuit board assembly 20 includes a circuit board 21 , a transfer layer 22 and a packaged chip 23 .
- the transfer layer 22 is arranged on the mounting surface 211 of the circuit board 21
- the package chip 23 is arranged on the side of the transfer layer 22 that faces away from the circuit board 21 , that is, the transfer layer 22 is connected between the circuit board 21 and the package chip 23 . between.
- the transition layer 22 includes M conductive paths 221, and the conductive paths 221 include a first end 221a, a middle section 221b and a second end 221c which are connected in sequence.
- the M conductive paths 221 are arranged at intervals, and the first ends 221a of all the conductive paths 221 face the same direction, and the second ends 221c of all the conductive paths 221 face the same direction.
- Each first end 221a is electrically connected to the circuit board 21, and each The two terminals 221c are electrically connected to the packaged chip 23 .
- the area of the arrangement area of the M second ends 221c is smaller than the area of the arrangement area of the M first ends 221a, where M is an integer greater than or equal to 2.
- the M first ends 221a can be arranged in various forms, for example, the M first ends 221a can be arranged in an array form or a non-array form.
- the arrangement forms of the M second ends 221c are various, for example, the M second ends 221c may be arranged in an array form or a non-array form.
- the circuit board assembly 20 includes a first reference plane and a second reference plane, the end faces of the M first ends 221a are all located on the first reference plane, and the end faces of the M second ends 221c are all located on the second reference plane.
- the arrangement area of the M first ends 221a is, on the first reference plane, an area surrounded by several first ends 221a located at the outermost periphery among the M first ends 221a.
- the arrangement area of the M second ends 221c is, on the second reference plane, an area surrounded by several second ends 221c located at the outermost periphery among the M second ends 221c.
- the "arrangement area” that appears below is the same as the above explanation, and will not be repeated.
- FIG. 3 is a schematic diagram of a comparison between the circuit board assembly shown in FIG. 2 and the circuit board assembly of the related art.
- FIG. 4 is a schematic diagram of the warpage risk of the two circuit board assemblies shown in FIG. 3 .
- FIG. 4 only represents a schematic diagram of the warping effect of the two circuit board assemblies, not the actual structure of the two circuit board assemblies.
- the packaged chip 33 of the circuit board assembly 30 in the related art is directly disposed on the circuit board 31.
- the circuit board assembly 20 in this embodiment realizes the transfer between the package chip 23 and the circuit board 21 through the transfer layer 22.
- the first end 221a of the transfer layer 22 is electrically connected to the circuit board 21, and the second end 221c is connected to the package.
- the chips 23 are electrically connected, and the area of the arrangement area of the M second ends 221c is smaller than the area of the arrangement area of the M first ends 221a.
- the transition layer 22 is a fan-in type transition layer, that is, the fan-in type transition layer 22 realizes the fan-in from the circuit board 21 to the package chip 23 , compared to the package chip 33 that is directly fixed to the circuit board 31 .
- the size of the packaged chip 23 fixed on the circuit board 21 through the transition layer 22 can be made smaller, for example, the size of the packaged chip 23 is reduced from 100*100mm to 80*80mm, so that the circuit board assembly 20 is packaged, welded, etc. There is less risk of warping and cracking of solder joints during processing, and the reliability of the circuit board assembly 20 is improved.
- the reduced size of the packaged chip 23 can increase the layout area of other components on the circuit board 21 , or can reduce the size of the circuit board 21 , which is beneficial to the miniaturization of the circuit board assembly 20 .
- the circuit board 21 includes a plurality of first pads 212 , and the plurality of first pads 212 are arranged on the mounting surface 211 of the circuit board 21 .
- the surface of the surface 211 may also be embedded in the mounting surface 211 .
- the plurality of first pads 212 are used for electrical connection with the corresponding first ends 221 a to realize the electrical connection between the circuit board 21 and the transition layer 22 .
- the packaged chip 23 also includes a plurality of second bonding pads 235 , and the plurality of second bonding pads 235 are used to connect with the corresponding second ends 221 c to realize the electrical connection between the packaged chip 23 and the transfer layer 22 .
- the spacing between the plurality of second pads 235 of the packaged chip 23 can be made smaller, so that the packaged chip 23 can be made smaller, the spacing between the plurality of first bonding pads 212 on the circuit board 21 cannot be made smaller. As small as the spacing between the plurality of second pads 235 of the packaged chip 23 .
- the transfer layer 22 between the circuit board 21 and the packaged chip 23 to be transferred between the two, it is possible to realize the stacking of the packaged chip 23 and the circuit board 21 with a smaller size, for example, a plurality of second
- the spacing between the pads 235 is reduced from 1.0 mm to 0.8 mm, which reduces the risk of warping and cracking of the solder joints of the circuit board assembly 20 and improves the reliability of the circuit board assembly 20 .
- the thermal expansion coefficient of the transition layer 22 is smaller than the thermal expansion coefficient of the circuit board 21 and greater than the thermal expansion coefficient of the package chip 23 . It can be understood that the difference between the thermal expansion coefficient of the circuit board 21 and the thermal expansion coefficient of the packaged chip 23 is relatively large. For example, the thermal expansion coefficient of the circuit board 21 is about 20 ppm, and the thermal expansion coefficient of the packaged chip 23 is between 10 ppm and 15 ppm.
- a transfer layer 22 with a thermal expansion coefficient located therebetween is disposed between the circuit board 21 and the package chip 23, and the thermal expansion coefficient of the transfer layer 22 is between 15 ppm and 20 ppm. Since the thermal expansion coefficient of the transfer layer 22 is not much different from the thermal expansion coefficient of the circuit board 21 , the thermal expansion coefficient of the transfer layer 22 and the thermal expansion coefficient of the packaged chip 23 are not much different.
- the transfer layer 22 buffers the circuit board 21 and the packaged chip.
- the difference in thermal expansion coefficient between 23 can effectively reduce the risk of mismatch between the transition layer 22 and the circuit board 21 and the packaged chip 23, that is, reduce the risk of mismatch between the circuit board 21 and the packaged chip 23, and reduce the circuit board assembly. The risk of warping and cracking of the solder joints 20 occurs, and the reliability of the circuit board assembly 20 is improved.
- the transition layer 22 further includes a buffer function layer 222 , the conductive path 221 runs through the buffer function layer 222 , the middle section 221 b is located in the buffer function layer 222 , and the first end 221 a and the second end 221 c expose the buffer function layer 222 respectively. opposite surfaces. Both the first reference plane and the second reference plane are parallel to two opposite surfaces of the buffer function layer 222 .
- the buffer function layer 222 is used to fix the conductive path 221 on the one hand, and on the other hand, the buffer function layer 222 can also buffer heat and mechanical stress when the package chip 23 is fixed on the transition layer 22 , thereby reducing the occurrence of the circuit board assembly 20 . Risk of warping and cracking of solder joints.
- the buffer function layer 222 includes a first surface and a second surface that are opposite to each other.
- the plurality of first ends 221a are arranged on the first surface, and the plurality of second ends 221c are arranged on the second surface.
- the plurality of first ends 221a may be embedded in the first surface, or may be disposed on the first surface.
- the plurality of second ends 221c can be embedded in the second surface, or can be disposed on the second surface.
- the buffer function layer 222 is made of insulating materials, such as polypropylene (Polypropylene, PP), polyimide (Polyimide, PI) and other dielectric materials.
- the buffer function layer 222 has low thermal expansion coefficient and high elasticity, its thermal expansion coefficient is less than or equal to 15ppm, and its elastic modulus is greater than or equal to 200MPa. In some processes of the manufacturing stacking process, the buffer function layer 222 can effectively buffer thermal and mechanical stress, reduce circuit The board assembly 20 is at risk of warping and solder joint cracking.
- the thermal expansion coefficient and elasticity of the buffer function layer 222 are not limited to the above description, as long as the buffer function layer 222 can reduce the risk of warpage and solder joint cracking of the circuit board assembly 20 .
- the conductive path 221 is formed of a conductive material, and the conductive material may be one or more of copper, tin, nickel, aluminum, titanium, stainless steel, beryllium, molybdenum, tungsten, silicon carbide and tungsten carbide.
- the materials of the first end 221a, the middle section 221b and the second end 221c in the conductive path 221 may be the same or different.
- the area of the arrangement area of the M second ends 221c is less than or equal to 80% of the area of the arrangement area of the M first ends 221a, that is, the size of the packaged chip 23 can be reduced to 80% or smaller, when the size of the packaged chip 23 is reduced to 80% or smaller, the risk of warpage and solder joint cracking of the circuit board assembly 20 can be effectively reduced, and the reliability of the circuit board assembly 20 can be improved.
- the area of the arrangement area of the M second ends 221c may also be smaller than the area of the arrangement area of the M first ends 221a by other values.
- the packaged chip may be a single chip, or may be a chip structure formed by integrating multiple chips on a package substrate.
- the packaged chip is a single chip
- the single chip is electrically connected to the second terminal.
- the packaged chip is a chip structure formed by integrating multiple chips and a package substrate
- the package substrate is electrically connected to the second end to realize electrical connection between the multiple chips and the fan-in via layer 22 .
- the packaged chip 23 is a chip structure formed by integrating a plurality of chips on a package substrate.
- the packaged chip 23 includes a chip 231, a chip transfer layer 232, a package substrate 233 and solder balls 234.
- the chip 231 is mounted on the package substrate 233 through the chip transfer layer 232 , that is, the package substrate 233 , the chip transfer layer 232 and the chip 231 are stacked in sequence.
- the number of chips 231 may be one or more.
- Other electronic components may also be arranged on the package substrate 233 .
- the package substrate 233 includes a conductive surface 2331 facing away from the chip 231 , the second pad 235 is provided on the conductive surface 2331 , and the solder balls 234 are provided on the conductive surface 2331 of the package substrate 233 and are conductively connected to the second pad 235 .
- the number of solder balls 34 is multiple, and the plurality of solder balls 234 are electrically connected to the second end 221c in one-to-one correspondence, so that the package substrate 233 and the transition layer are realized. 22 electrical connections between.
- the packaged chip may further include a chip, a package substrate and a solder ball. That is to say, a chip transfer layer may not be provided between the chip and the package substrate.
- the packaged chip may also be connected to the second end through other connection structures other than solder balls.
- the size of the packaged chip 23 becomes smaller, the size of the solder balls 234 of the packaged chip 23 is also reduced accordingly.
- distance between circuit boards 21 In this embodiment, the distance between the packaged chip 23 and the circuit board 21 is less than or equal to 300 mm, which effectively reduces the transmission path between the chip 231 and the circuit board 21 , reduces link loss, and improves signal quality.
- FIG. 5 is a schematic structural diagram of another embodiment of the circuit board assembly shown in FIG. 2 .
- the circuit board assembly 20 includes a circuit board 21 , a transfer layer 22 and a package chip 23 .
- the packaged chip 23 includes a chip 231 , a package substrate 233 and a chip transfer layer 232 , and the chip 231 is fixed on the package substrate 233 through the chip transfer layer 232 .
- the first end 221 a of the fan-in transition layer 22 is electrically connected to the corresponding first pad 212 of the circuit board 21 through solder balls, and the second end 221 c of the fan-in transition layer 22 is connected to the second pad 235 of the package substrate 233 . electrical connection.
- FIG. 6 is a schematic structural diagram of another embodiment of the circuit board assembly shown in FIG. 2 .
- the circuit board assembly 20 includes a circuit board 21 , a transfer layer 22 and a package chip 23 .
- the packaged chip 23 includes a chip 231 , a package substrate 233 and a chip transfer layer 232 , and the chip 231 is fixed on the package substrate 233 through the chip transfer layer 232 .
- the first end 221 a of the fan-in transition layer 22 is electrically connected to the corresponding first pad 212 of the circuit board 21
- the second end 221 c of the fan-in transition layer 22 is electrically connected to the second pad 235 of the package substrate 233 .
- the first end 221a may be connected and fixed to the first pad 212 by bonding, eutectic, etc.
- the second end 211c may be connected and fixed to the second pad 235 by bonding, eutectic, or the like.
- the circuit board assembly may further include two transfer layers, for example, one transfer layer is formed on the circuit board, one transfer layer is formed on the packaged chip, and the two transfer layers are formed by solder balls or conductors.
- the connection layer realizes the electrical connection.
- the circuit board assembly may also include multiple interposer layers.
- FIG. 7 is a schematic structural diagram of another embodiment of the circuit board assembly shown in FIG. 2 .
- the circuit board assembly 20 in this embodiment includes a conductive layer 24 , and the conductive layer 24 replaces the solder balls to realize the connection between the package substrate 233 and the second end 221 c electrical connection.
- the conductive layer 24 is located between the transfer layer 22 and the package chip 23 , and the conductive layer 24 includes a buffer layer 241 and a conductive medium 242 embedded in the buffer layer 241 , and the conductive medium 242 is electrically connected to the second end 221c and between the second pads 235 of the packaged chip 23 .
- the package chip 23 is connected with the transition layer 22 through the conductive layer 24, and the multiple components in the circuit board assembly 20 are fixed into a package. Both are enhanced, effectively reducing the risk of warpage and solder joint cracking of the circuit board assembly 20 .
- the buffer layer 241 adopts an insulating material, such as a dielectric material such as polypropylene (Polypropylene, PP), polyimide (Polyimide, PI).
- the buffer layer 241 can be cured at room temperature or high temperature or UV after liquid coating, or it can be laminated with a film material.
- the buffer layer 241 has low thermal expansion coefficient and high elasticity, its thermal expansion coefficient is less than or equal to 15ppm, and the elastic modulus is greater than or equal to 200MPa. In some processes of manufacturing the circuit board assembly 20, the buffer layer 241 can effectively buffer thermal and mechanical stress, reduce The circuit board assembly 20 is at risk of warping and solder joint cracking.
- the material of the buffer layer 241 may be the same as or different from that of the buffer function layer 222 .
- the conductive medium 242 is made of pure metal or metal mixture materials including but limited to copper, silver, tin, or a mixture of metals and non-metals.
- the shape of the conductive medium 242 may be spherical, columnar, needle-like, cone-like, or the like.
- the size of the conductive medium 242 in this embodiment is smaller than the size of the solder balls 234 shown in FIG. 2 , which can shorten the link length between the package chip 23 and the circuit board 21 to a certain extent, improve the signal quality, and also This reduces the risk of warpage and solder joint cracking of the circuit board assembly 20 .
- FIG. 8 is a schematic structural diagram of another embodiment of the circuit board assembly shown in FIG. 7 .
- This embodiment is substantially the same as the embodiment shown in FIG. 7 , except that the conductive layer 24 in this embodiment is connected between the transition layer 22 and the circuit board 21 , and the conductive medium 242 of the conductive layer 24 is electrically connected to the circuit board 21 . between the first pad 212 and the first end 221a.
- the packaged chip 23 is disposed on the side of the transfer layer 22 facing away from the conductor layer 24 , and the second pad 235 of the packaged chip 23 is electrically connected to the second end 221 c of the transfer layer 22 .
- FIG. 9 is a schematic structural diagram of another embodiment of the circuit board assembly shown in FIG. 2 .
- This embodiment is substantially the same as the embodiment shown in FIG. 8 , the difference is that the electrical connection between the circuit board 21 and the package chip 23 is achieved through the conductive layer 24 in this embodiment, that is, the circuit in this embodiment
- the board assembly 20 does not include a transfer layer, and the conductive layer 24 replaces the traditional solder balls to realize the electrical connection between the circuit board 21 and the packaged chip 23 .
- the size of the conductive medium 242 in the conductive layer 24 is smaller than that of the solder ball, which can shorten the link between the package chip 23 and the circuit board 21 and improve the signal quality.
- the buffer layer 241 of the conductive layer 24 has a low thermal expansion coefficient and high elasticity, its thermal expansion coefficient is less than or equal to 15ppm, and its elastic modulus is greater than or equal to 200MPa.
- the buffer layer 241 can effectively buffer Thermal, mechanical stress, reliability and stress are all enhanced, effectively reducing the risk of warpage and solder joint cracking of the circuit board assembly 20 .
- FIG. 10 is a schematic flowchart of a method for manufacturing a circuit board assembly provided by an embodiment of the present application.
- the manufacturing method is used to manufacture the circuit board assembly shown in FIG. 2 .
- the manufacturing method of the circuit board assembly includes the following S110 to S120 .
- a circuit board 21 is fabricated.
- the circuit board 21 may be formed by processes such as pressing, drilling, electroplating, patterning, solder resist, and surface treatment.
- the circuit board 21 includes a mounting surface 211 , and the plurality of first pads 212 of the circuit board 21 are exposed from the mounting surface 211 .
- a transition layer 22 is formed on the mounting surface 211 of the circuit board 21 .
- forming the transition layer 22 on the mounting surface 211 of the circuit board 21 can be implemented in two ways.
- the transition layer 22 is directly formed on the mounting surface 211 of the circuit board 21 .
- a press-fitted first buffer base layer is formed on the mounting surface 211 of the circuit board 21 , wherein the first buffer base layer can be formed by pressing or coating.
- a first sub-opening (not shown) exposing the circuit board 21 is formed on the first buffer base layer by laser or mechanical drilling.
- the first sub-opening has M, where M is an integer greater than or equal to 2, and a plurality of first The sub-openings expose a plurality of first pads 212 of the circuit board 21 in a one-to-one correspondence, and M first ends 221a are formed in the first sub-openings by methods such as chemical copper/electroplating copper, and the plurality of first ends 221a correspond to the corresponding The first pads 212 of the circuit board 21 are electrically connected.
- first sub-openings are formed in the first buffer base layer, and the first sub-openings expose a plurality of first sub-openings. end 221a, and then a middle section 221b electrically connected to the first end 221a is formed in the first sub-opening.
- the first end 221a, the middle section 221b and the second end 221c connected in sequence form the conductive path 221, and the multi-layer first buffer base layer is processed to form the buffer function layer 222.
- the plurality of first sub-openings form a first opening (not shown).
- the conductive path 221 is formed of a conductive material, and the conductive material may be one or more of copper, tin, nickel, aluminum, titanium, stainless steel, beryllium, molybdenum, tungsten, silicon carbide and tungsten carbide.
- the materials of the first end 221a, the middle section 221b and the second end 221c in the conductive path 221 may be the same or different.
- the first buffer base layer adopts insulating material, such as polypropylene (Polypropylene, PP), polyimide (Polyimide, PI) and other dielectric materials.
- the first buffer base layer has low thermal expansion coefficient and high elasticity, its thermal expansion coefficient is less than or equal to 15ppm, and its elastic modulus is greater than or equal to 200MPa.
- the buffer function layer 222 can effectively buffer thermal and mechanical stress, and reduce the occurrence of circuit board assembly 20. Risk of warping and cracking of solder joints.
- the thermal expansion coefficient and elasticity of the buffer function layer 222 are not limited to the above description, as long as the buffer function layer 222 can reduce the risk of warpage and solder joint cracking of the circuit board assembly 20 .
- the area of the arrangement area of the M second ends 221c is smaller than the area of the arrangement area of the M first ends 221a, so that the size of the package chip 23 electrically connected to the second ends 221c in the subsequent process can be Therefore, the risk of warping and cracking of the solder joints of the circuit board assembly 20 during processing such as packaging and soldering is smaller, and the reliability of the circuit board assembly 20 is improved.
- the reduced size of the packaged chip 23 can increase the layout area of other components on the circuit board 21 , or can reduce the size of the circuit board 21 , which is beneficial to the miniaturization of the circuit board assembly 20 .
- the area of the arrangement area of the M second ends 221c is less than or equal to 80% of the area of the arrangement area of the M first ends 221a, that is, the size of the packaged chip 23 can be reduced to 80% or more
- the size of the packaged chip 23 is reduced to 80% or smaller, the risk of warping and cracking of the solder joints of the circuit board assembly 20 can be effectively reduced, and the reliability of the circuit board assembly 20 can be improved.
- the area of the arrangement area of the M second ends 221c may also be smaller than the area of the arrangement area of the M first ends 221a by other values.
- the transfer layer may be formed first, and then the transfer layer may be formed on the mounting surface of the circuit board through processes such as bonding and hot pressing.
- the packaged chip 23 is a chip 231 structure formed by integrating a plurality of chips 231 on a package substrate 233 .
- the packaged chip 23 includes a chip 231 , a chip transfer layer 232 , a package substrate 233 and solder balls 234 .
- the chip 231 is mounted on the package substrate 233 through the chip transfer layer 232 , that is, the package substrate 233 , the chip transfer layer 232 and the chip 231 are stacked in sequence.
- the number of chips 231 may be one or more.
- Other electronic components may also be arranged on the package substrate 233 .
- the package substrate 233 includes a conductive surface 2331 facing away from the chip 231 , the second pads 235 are provided on the conductive surface 2331 , and the solder balls 234 are provided on the conductive surface 2331 of the package substrate 233 and are conductively connected to the second pads 235 .
- Fixing the packaged chip 23 to the side of the transfer layer 22 facing away from the circuit board 21 is specifically, to set the packaged chip 23 on the surface of the transfer layer 22 facing away from the circuit board 21 , and the solder balls 234 and the second end of the packaged chip 23
- the solder balls 234 and the second end 221c of the packaged chip 23 are soldered and fixed through a reflow soldering process, so that the solder balls 234 and the second end 221c are electrically connected to realize the connection between the package substrate 233 and the transfer layer 22. Electrical connections between the two to form the circuit board assembly 20 .
- the thermal expansion coefficient of the transition layer 22 is smaller than the thermal expansion coefficient of the circuit board 21 and greater than the thermal expansion coefficient of the package chip 23 . It can be understood that the difference between the thermal expansion coefficient of the circuit board 21 and the thermal expansion coefficient of the packaged chip 23 is relatively large. For example, the thermal expansion coefficient of the circuit board 21 is about 20 ppm, and the thermal expansion coefficient of the packaged chip 23 is between 10 ppm and 15 ppm.
- a transfer layer 22 with a thermal expansion coefficient located between the circuit board 21 and the package chip 23 is arranged between the two, and the thermal expansion coefficient of the transfer layer 22 is between 15 ppm and 20 ppm. Since the thermal expansion coefficient of the transfer layer 22 is not much different from that of the circuit board 21 , and the thermal expansion coefficient of the transfer layer 22 and the thermal expansion coefficient of the packaged chip 23 are not much different, the transfer layer 22 buffers the circuit board 21 and the packaged chip.
- the difference in thermal expansion coefficient between 23 can effectively reduce the risk of mismatch between the transition layer 22 and the circuit board 21 and the packaged chip 23, that is, reduce the risk of mismatch between the circuit board 21 and the packaged chip 23, and reduce the circuit board assembly. The risk of warping and cracking of the solder joints 20 occurs, and the reliability of the circuit board assembly 20 is improved.
- the packaged chip may also be a single chip, and when the packaged chip is a single chip, the single chip is electrically connected to the second end.
- the packaged chip may further include a chip, a package substrate and solder balls. That is to say, a chip transfer layer may not be provided between the chip and the package substrate.
- the packaged chip may also be electrically connected to the via layer through other conductive structures other than solder balls.
- a buffer layer is also filled between the package substrate and the transfer layer.
- the bonding pads of the package substrate and the second end of the transfer layer are fixedly connected by means of bonding, eutectic or the like.
- the transfer layer 22 is formed between the circuit board 21 and the package chip 23 , and the area of the arrangement area of the M second ends 221 c electrically connected between the transfer layer 22 and the circuit board 21 is smaller than that of the transfer layer 22 .
- the fan-in from the board 21 to the packaged chip 23 can be made smaller than the packaged chip 23 is directly fixed on the circuit board 21.
- the size of the packaged chip 23 fixed on the circuit board 21 through the transition layer 22 can be made smaller, so that the circuit board assembly The risk of warpage and solder joint cracking during packaging, soldering and other processes is smaller, and the reliability of the circuit board assembly 20 is improved.
- the reduced size of the packaged chip 23 can increase the layout area of other components on the circuit board 21 , or can reduce the size of the circuit board 21 , which is beneficial to the miniaturization of the circuit board assembly 20 .
- FIG. 12 is a schematic flowchart of another method for manufacturing a circuit board assembly provided by an embodiment of the present application.
- the manufacturing method is used to manufacture the circuit board assembly shown in FIG. 7 .
- the manufacturing method of the circuit board assembly includes the following S210 to S220 .
- step S110 is the same as step S110, please refer to S110, and details are not repeated here.
- S220 Fix the packaged chip 23 to the side of the interposer layer 22 facing away from the circuit board 21 and electrically connect it to the second end 221c.
- the packaged chip 23 is a chip 231 structure formed by integrating a plurality of chips 231 on a package substrate 233 .
- the packaged chip 23 includes a chip 231 , a chip transfer layer 232 and a package substrate 233 .
- the chip 231 is mounted on the package substrate 233 through the chip transfer layer 232 , that is, the package substrate 233 , the chip transfer layer 232 and the chip 231 are stacked in sequence.
- the number of chips 231 may be one or more.
- Other electronic components may also be arranged on the package substrate 233 .
- the package substrate 233 includes a conductive surface 2331 facing away from the chip 231 , and the second pad 235 is disposed on the conductive surface 2331 .
- Fixing the packaged chip 23 to the side of the transition layer 22 facing away from the circuit board 21 is specifically: first, forming a conductive layer 24 on the side of the transition layer 22 facing away from the circuit board 21 that is conductively connected to the second end 221c;
- the method for forming the conductive layer 24 is as follows: forming a second buffer base layer on the side of the transition layer 22 facing away from the circuit board 21, and forming a second opening (not shown) on the second buffer base layer exposing the second end 221c.
- a buffer layer 241 forming a buffer layer 241; forming a conductive medium 242 connected to the second end 221c in the second opening, and the conductive medium 242 exposing the buffer layer 241; then, bonding and fixing the package chip 23 and the conductive layer 24, that is, The second pad 235 of the package chip 23 is bonded and fixed to the corresponding conductive medium 242 of the conductive layer 24 to realize electrical connection between the package chip 23 and the conductive layer 24 to form the circuit board assembly 20 .
- the package chip 23 and the transition layer 22 are connected to form an integrated structure through the conductive layer 24 .
- the reliability and stress are enhanced, and the warpage and solder joints of the circuit board assembly 20 are effectively reduced. risk of cracking.
- the buffer layer 241 adopts an insulating material, such as a dielectric material such as polypropylene (Polypropylene, PP), polyimide (Polyimide, PI).
- the buffer layer 241 can be cured at room temperature or high temperature or UV after liquid coating, or it can be laminated with a film material.
- the buffer layer 241 has low thermal expansion coefficient and high elasticity, its thermal expansion coefficient is less than or equal to 15ppm, and the elastic modulus is greater than or equal to 200MPa. In some processes of manufacturing the circuit board assembly 20, the buffer layer 241 can effectively buffer thermal and mechanical stress, reduce The circuit board assembly 20 is at risk of warping and solder joint cracking.
- the conductive medium 242 is made of pure metal or metal mixture materials including but limited to copper, silver, tin, or a mixture of metals and non-metals.
- the shape of the conductive medium 242 may be spherical, columnar, needle-like, cone-like, or the like.
- the size of the conductive medium 242 in this embodiment is smaller than the size of the solder balls 234 shown in FIG. 2 , which can shorten the link length between the package chip 23 and the circuit board 21 to a certain extent, improve the signal quality, and also This reduces the risk of warpage and solder joint cracking of the circuit board assembly 20 .
- a conductive layer may also be formed on the packaged chip, and then the conductive layer and the transfer layer are bonded and fixed, that is, the conductive medium of the conductive layer and the corresponding second terminal key to realize the electrical connection between the packaged chip and the transfer layer.
- the thermal expansion coefficient of the transition layer 22 is smaller than the thermal expansion coefficient of the circuit board 21 and greater than the thermal expansion coefficient of the package chip 23 . It can be understood that the difference between the thermal expansion coefficient of the circuit board 21 and the thermal expansion coefficient of the packaged chip 23 is relatively large. For example, the thermal expansion coefficient of the circuit board 21 is about 20 ppm, and the thermal expansion coefficient of the packaged chip 23 is between 10 ppm and 15 ppm.
- a transfer layer 22 with a thermal expansion coefficient located therebetween is disposed between the circuit board 21 and the package chip 23, and the thermal expansion coefficient of the transfer layer 22 is between 15 ppm and 20 ppm. Since the thermal expansion coefficient of the transfer layer 22 is not much different from the thermal expansion coefficient of the circuit board 21 , the thermal expansion coefficient of the transfer layer 22 and the thermal expansion coefficient of the packaged chip 23 are not much different.
- the transfer layer 22 buffers the circuit board 21 and the packaged chip.
- the difference in thermal expansion coefficient between 23 can effectively reduce the risk of mismatch between the transition layer 22 and the circuit board 21 and the packaged chip 23, that is, reduce the risk of mismatch between the circuit board 21 and the packaged chip 23, and reduce the circuit board assembly. The risk of warping and cracking of the solder joints 20 occurs, and the reliability of the circuit board assembly 20 is improved.
- the packaged chip may also be a single chip, and when the packaged chip is a single chip, the single chip is electrically connected to the second end.
- the packaged chip may further include a chip and a package substrate. That is to say, a chip transfer layer may not be provided between the chip and the package substrate.
- the packaged chip may also be electrically connected to the second end through other conductive structures such as solder balls.
- a buffer layer is also filled between the package substrate and the fan-in adhesive layer.
- the transfer layer 22 is formed between the circuit board 21 and the package chip 23, and the size of the package chip 23 fixed on the circuit board 21 through the transfer layer 22 can be made smaller, so that the circuit board The risk of warpage and cracking of solder joints in the assembly 20 during packaging, soldering and other processes is smaller, and the reliability of the circuit board assembly 20 is improved.
- the reduced size of the packaged chip 23 can increase the layout area of other components on the circuit board 21 , or can reduce the size of the circuit board 21 , which is beneficial to the miniaturization of the circuit board assembly 20 .
- the multiple components in the circuit board assembly 20 are fixed into a package as a whole, compared with the solution of realizing the connection through solder balls, reliability and stress Both are enhanced, effectively reducing the risk of warpage and solder joint cracking of the circuit board assembly 20 .
- FIG. 14 is a schematic flowchart of another method for manufacturing a circuit board assembly provided by an embodiment of the present application. This manufacturing method is used to manufacture a circuit board assembly as shown in FIG. 8 .
- the manufacturing method of the circuit board shown in FIG. 14 includes the following S310 to S320.
- the packaged chip 23 is a chip 231 structure formed by integrating a plurality of chips 231 on a package substrate 233 .
- the packaged chip 23 includes a chip 231 , a chip transfer layer 232 and a package substrate 233 .
- the chip 231 is mounted on the package substrate 233 through the chip transfer layer 232 , that is, the package substrate 233 , the chip transfer layer 232 and the chip 231 are stacked in sequence.
- the number of chips 231 may be one or more.
- Other electronic components may also be arranged on the package substrate 233 .
- the package substrate 233 includes a conductive surface 2331 facing away from the chip 231 , and the second pad 235 is disposed on the conductive surface 2331 .
- the transfer layer 22 is formed on the conductive surface 2331 of the package chip 23 , and the second end 221 c of the transfer layer 22 is electrically connected to the second pad 235 of the package chip 23 .
- forming the transfer layer 22 on the conductive surface 2331 of the packaged chip 23 includes two implementations.
- the transfer layer 22 is directly formed on the conductive surface 2331 of the packaged chip 23 .
- the operation steps of forming the transition layer 22 on the conductive surface 2331 of the package chip 23 are similar to the operation steps of forming the transition layer 22 on the circuit board 21 , and will not be repeated.
- the transfer layer 22 may be formed first, and then the transfer layer 22 may be formed on the conductive surface 2331 of the packaged chip 23 through processes such as bonding, hot pressing, etc., so that the second end of the transfer layer 22 is formed. 221c is electrically connected to the corresponding second pad 235 .
- the structure of the transition layer 22 is the same as that of the transition layer 22 in S210.
- the second end 221c of the transition layer 22 is electrically connected to the second pad 235 of the package chip 23, and the area of the arrangement area of the M second ends 221c is smaller than the area of the arrangement area of the M first ends 221a.
- the terminal 221a is used for electrical connection with the first pad 212 of the circuit board 21 in the subsequent process, and is connected between the circuit board 21 and the packaged chip 23 through the transition layer 22, so that the size of the packaged chip 23 can be made smaller, thereby
- the risk of warping and cracking of the solder joints of the circuit board assembly 20 during processing such as packaging and soldering is reduced, and the reliability of the circuit board assembly 20 is improved.
- the reduced size of the packaged chip 23 can increase the layout area of other components on the circuit board 21 , or can reduce the size of the circuit board 21 , which is beneficial to the miniaturization of the circuit board assembly 20 .
- the area of the arrangement area of the second end 221c is less than or equal to 80% of the area of the arrangement area of the first end 221a, that is, the size of the packaged chip 23 can be reduced to 80% or less.
- the size of the chip 23 is reduced to 80% or smaller, which can effectively reduce the risk of warping and cracking of the solder joints of the circuit board assembly 20 and improve the reliability of the circuit board assembly 20 .
- the arrangement area of the second end 221c may also be smaller than the area of the arrangement area of the first end 221a by other values.
- a conductive layer 24 is formed on the first end 221 a of the transfer layer 22 , so as to realize the electrical connection between the transfer layer 22 and the circuit board 21 through the conductive layer 24 in the subsequent process.
- solder balls may also be formed on the first end 221 a of the transition layer 22 .
- the packaged chip may also be a single chip, and when the packaged chip is a single chip, the single chip is electrically connected to the second end.
- the packaged chip may further include a chip and a package substrate. That is to say, a chip transfer layer may not be provided between the chip and the package substrate.
- the packaged chip may also be electrically connected to the second end through other conductive structures other than the conductive layer, such as solder balls.
- the side of the conductive layer 24 facing away from the packaged chip 23 is disposed on the surface of the circuit board 21 , and the conductive medium 242 of the conductive layer 24 is in one-to-one contact with the first pads 212 of the circuit board 21 . Then, the conductive medium 242 and the first pad 212 of the circuit board 21 are fixed by bonding, eutectic and other processes, so that the conductive medium 242 can realize the electrical connection between the transition layer 22 and the circuit board 21 .
- connection between the fan-in transfer layer and the circuit board may also be achieved by solder balls, and a buffer layer may also be filled between the transfer layer and the circuit board.
- the transfer layer can also be fixed to the circuit board by bonding, thermal pressing or other processes.
- a transition layer 22 is formed between the circuit board 21 and the package chip 23 .
- the transition layer 22 is a fan-in type transition layer, that is, the fan-in type transition layer 22 realizes The fan-in from the circuit board 21 to the packaged chip 23 is improved.
- the size of the packaged chip 23 fixed on the circuit board 21 through the transition layer 22 can be made smaller, so that the circuit The risk of warping and cracking of solder joints of the board assembly 20 during processing such as packaging and soldering is less, and the reliability of the circuit board assembly 20 is improved.
- the reduced size of the packaged chip 23 can increase the layout area of other components on the circuit board 21 , or can reduce the size of the circuit board 21 , which is beneficial to the miniaturization of the circuit board assembly 20 .
- FIG. 16 is a schematic flowchart of another method for manufacturing a circuit board assembly provided by an embodiment of the present application. This manufacturing method is used to manufacture a circuit board assembly as shown in FIG. 9 .
- the manufacturing method of the circuit board assembly shown in FIG. 16 includes the following S410 to S420.
- a circuit board 21 is fabricated.
- the circuit board 21 may be formed by processes such as pressing, drilling, electroplating, patterning, solder resist, and surface treatment.
- the circuit board 21 includes a mounting surface 211 , and the plurality of first pads 212 of the circuit board 21 are exposed from the mounting surface 211 .
- a conductive layer 24 is formed on the mounting surface 211 of the circuit board 21 .
- the method of forming the conductive layer 24 is as follows: after cleaning the circuit board 21 , a second buffer base layer is formed on the mounting surface 211 of the circuit board 21 , and the second buffer base layer can be formed by film pressing, slurry coating and other different methods. formed on the mounting surface 211 .
- the specific steps of laminating the film layers may be as follows: laminating the film material on the mounting surface 211 of the circuit board 21 , and then laminating the film layers to form the second buffer base layer.
- the specific steps of slurry coating may be as follows: coating the slurry on the mounting surface 211 of the circuit board 21 , and drying or curing the slurry to form the second buffer base layer.
- a second opening exposing the first pad 212 is formed, a buffer layer 241 is formed, and then a conductive medium 242 connected to the first pad 212 is formed in the second opening, and the conductive medium 242
- the conductive paste may be formed in the second opening by printing or printing, and then cured to form the conductive medium 242 to expose the buffer layer 241 .
- the buffer layer 241 adopts an insulating material, such as a dielectric material such as polypropylene (Polypropylene, PP), polyimide (Polyimide, PI).
- the buffer layer 241 can be cured at room temperature or high temperature or UV after liquid coating, or it can be laminated with a film material.
- the buffer layer 241 has low thermal expansion coefficient and high elasticity, its thermal expansion coefficient is less than or equal to 15ppm, and its elastic modulus is greater than or equal to 200MPa.
- the circuit board assembly 20 is at risk of warping and solder joint cracking.
- the conductive medium 242 is made of pure metal or metal mixture materials including but limited to copper, silver, tin, or a mixture of metals and non-metals.
- the shape of the conductive medium 242 may be spherical, columnar, needle-like, cone-like, or the like.
- the packaged chip 23 is a chip 231 structure formed by integrating a plurality of chips 231 on a package substrate 233 .
- the packaged chip 23 includes a chip 231 , a chip transfer layer 232 and a package substrate 233 .
- the chip 231 is mounted on the package substrate 233 through the chip transfer layer 232 , that is, the package substrate 233 , the chip transfer layer 232 and the chip 231 are stacked in sequence.
- the number of chips 231 may be one or more.
- Other electronic components may also be arranged on the package substrate 233 .
- the package substrate 233 includes a conductive surface 2331 facing away from the chip 231 , and the second pad 235 is disposed on the conductive surface 2331 .
- Fixing the packaged chip 23 to the side of the conductive layer 24 facing away from the circuit board 21 is specifically, to set the packaged chip 23 on the side of the conductive layer 24 facing away from the circuit board 21 , and the second pad 235 of the packaged chip 23 is connected to the side of the conductive layer 24 facing away from the circuit board 21 .
- the corresponding conductive medium 242 is in contact, and then the packaged chip 23 and the conductive layer 24 are bonded and fixed by pressing or bonding, that is, the second pad 235 of the packaged chip 23 and the conductive layer 24
- the medium 242 is bonded and fixed to realize the electrical connection between the packaged chip 23 and the conductive layer 24 .
- the package chip 23 and the transition layer 22 are connected to form an integrated structure through the conductive layer 24 .
- the reliability and stress are enhanced, and the warpage and solder joints of the circuit board assembly 20 are effectively reduced. risk of cracking.
- the thermal expansion coefficient of the conductive layer 24 is smaller than the thermal expansion coefficient of the circuit board 21 and greater than the thermal expansion coefficient of the package chip 23 . It can be understood that the difference between the thermal expansion coefficient of the circuit board 21 and the thermal expansion coefficient of the packaged chip 23 is relatively large. For example, the thermal expansion coefficient of the circuit board 21 is about 20 ppm, and the thermal expansion coefficient of the packaged chip 23 is between 10 ppm and 15 ppm.
- a conductive layer 24 with a thermal expansion coefficient located therebetween is provided between the circuit board 21 and the package chip 23 , and the thermal expansion coefficient of the conductive layer 24 is between 15 ppm and 20 ppm. Since the thermal expansion coefficient of the conductive layer 24 is not much different from the thermal expansion coefficient of the circuit board 21 , the thermal expansion coefficient of the conductive layer 24 and the thermal expansion coefficient of the packaged chip 23 are not significantly different, and the conductive layer 24 buffers the circuit board 21 and the packaged chip. The difference in thermal expansion coefficient between 23 can effectively reduce the risk of mismatch between the conductive layer 24 and the circuit board 21 and the packaged chip 23, that is, reduce the risk of mismatch between the circuit board 21 and the packaged chip 23, and reduce the circuit board assembly. The risk of warping and cracking of the solder joints 20 occurs, and the reliability of the circuit board assembly 20 is improved.
- the packaged chip may also be a single chip, and when the packaged chip is a single chip, the single chip is electrically connected to the conductive medium.
- the packaged chip may further include a chip and a package substrate. That is to say, a chip transfer layer may not be provided between the chip and the package substrate.
- FIG. 18 is a specific process schematic diagram of another implementation manner of the circuit board assembly shown in FIG. 17 .
- the circuit board 21 can be fabricated by inner layer patterning, lamination, drilling, chemical copper, electroplating copper, and the conductive medium 242 can be formed by dry film 1, exposure 1, development 1, etching, film removal, Dry film 2, exposure 2, development 2, bump plating, film removal, solder mask printing and surface treatment are formed.
- the conductive medium 242 may be formed by processes such as dry film 1, exposure 1, development 1, etching, solder mask, surface treatment, photoresist/dry film, exposure, development, bump metal evaporation, or sputtering and stripping.
- the buffer layer 241 is pre-attached, the packaged chip 23 is placed on the side of the buffer layer 241 that faces away from the circuit board 21, the second pad 235 of the packaged chip 23 is in contact with the corresponding conductive medium 242, and then the packaged chip 23 is thermally pressed.
- the package chip 23 and the conductive layer 24 are bonded and fixed by processes such as eutectic, that is, the second pad 235 of the package chip 23 is bonded and fixed with the corresponding conductive medium 242 of the conductive layer 24, so as to realize the bonding between the package chip 23 and the corresponding conductive medium 242 of the conductive layer 24. Electrical connection between the conductive layers 24 .
- FIG. 19 is a specific process schematic diagram of another implementation manner of the circuit board assembly shown in FIG. 17 .
- This embodiment is substantially the same as the embodiment shown in FIG. 18 , the difference is that the conductive medium 242 can be formed on the packaging substrate 233 of the packaging chip 23 in this embodiment, and the packaging substrate 233 is first fabricated (the same steps as those of fabricating the circuit board 21 ).
- a conductive medium 242 electrically connected to the second pad 235 on the packaging substrate 233 is formed on the packaging substrate 233;
- Devices such as the chip 231 are stacked on one side of the second pad 235; then the circuit board 21 is fabricated and a buffer layer 241 with a second opening is formed on the circuit board 21, and the second opening exposes the first pad 212; finally, the chip is packaged
- the conductive medium 242 on 23 is in contact with the first pad 212 in the corresponding second opening, and the conductive medium 242 is bonded and fixed with the corresponding first pad 212 through a process such as thermocompression eutectic.
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Abstract
Description
本申请要求于2021年03月03日提交中国专利局、申请号为202110233877.5、申请名称为“电路板组件及其制造方法和电子设备”的中国专利申请的优先权,其全部内容通过引用结合在本申请中。This application claims the priority of the Chinese patent application with the application number of 202110233877.5 and the application title of "circuit board assembly and its manufacturing method and electronic equipment", which was filed with the China Patent Office on March 3, 2021, the entire contents of which are incorporated by reference in in this application.
本申请涉及芯片板级互连领域,特别涉及一种电路板组件及其制造方法和电子设备。The present application relates to the field of chip board level interconnection, and in particular, to a circuit board assembly, a manufacturing method thereof, and an electronic device.
通讯设备等电子设备均包括电路板组件。电路板组件中承载芯片的封装基板通常通过表面贴装工艺固定于电路板上。但是,现有技术中的封装基板的尺寸较大,较大尺寸的封装基板在表面贴装工艺工程中容易发生翘曲,从而对表面贴装工艺产生较大的弧面影响,降低表面贴装工艺的质量。Electronic equipment such as communication equipment includes circuit board assemblies. The package substrate carrying the chip in the circuit board assembly is usually fixed to the circuit board by a surface mount process. However, the size of the package substrate in the prior art is relatively large, and the larger size of the package substrate is prone to warping in the surface mount process engineering, which has a large arc surface impact on the surface mount process and reduces the surface mount quality of workmanship.
发明内容SUMMARY OF THE INVENTION
本申请实施例提供一种电路板组件、包括所述电路板组件的电子设备、以及电路板组件的制造方法,旨在降低电路板组件发生翘曲的风险。Embodiments of the present application provide a circuit board assembly, an electronic device including the circuit board assembly, and a manufacturing method of the circuit board assembly, aiming to reduce the risk of warpage of the circuit board assembly.
第一方面,本申请提供一种电路板组件。所述电路板组件包括电路板、转接层和封装芯片,所述转接层包括M个具有第一端和第二端的导电通路,M个导电通路间隔排布,且所有导电通路的第一端朝向相同,所有导电通路的第二端朝向相同,每一个所述第一端与所述电路板电连接,每一个所述第二端与所述封装芯片电连接;M个所述第二端的排布区域的面积小于M个所述第一端的排布区域的面积,所述M为大于或等于2的整数。In a first aspect, the present application provides a circuit board assembly. The circuit board assembly includes a circuit board, a transfer layer and a packaged chip, the transfer layer includes M conductive paths with first ends and second ends, the M conductive paths are arranged at intervals, and the first conductive paths of all the conductive paths are arranged at intervals. The ends are in the same direction, the second ends of all the conductive paths are in the same direction, each of the first ends is electrically connected to the circuit board, and each of the second ends is electrically connected to the packaged chip; M number of the second ends The area of the arrangement regions of the ends is smaller than the area of the arrangement regions of the M first ends, where M is an integer greater than or equal to 2.
可以理解的是,M个第一端的排布形式为多种,例如M个第一端可以以阵列形式排布或非阵列形式排布。M个第二端的排布形式为多种,例如M个第二端可以以阵列形式排布或非阵列形式排布。It can be understood that, the M first ends can be arranged in various forms, for example, the M first ends can be arranged in an array form or a non-array form. The arrangement forms of the M second ends are various, for example, the M second ends may be arranged in an array form or a non-array form.
可以理解的是,电路板组件包括第一基准面和第二基准面,M个第一端的端面均位于第一基准面,M个第二端的端面均位于第二基准面。M个第一端的排布区域为,在第一基准面上,M个第一端中位于最外围的几个第一端围设形成的区域。M个第二端的排布区域为,在第二基准面上,M个第二端中位于最外围的几个第二端围设形成的区域。下文出现的“排布区域”的解释和上述描述一样,不再赘述。相关技术中的电路板组件的封装芯片直接设于电路板上,在封装、焊接等加工过程中会受材料、加工工艺等影响,热、机应力残留,导致翘曲的发生或焊点开裂的问题。本实施例中的电路板组件通过转接层实现封装芯片和电路板之间的转接,转接层的第一端与电路板电连接,第二端与封装芯片电连接,M个第二端的排布区域的面积小于M个第一端的排布区域的面积。可以理解的是,转接层为扇入型转接层,即扇入型转接层实现了电路板至封装芯片的扇入,相比于封装芯片直接固定于电路板,通过转接层固定于电路板上的封装芯片的尺寸可以做得更小,比如封装芯片的尺寸从100*100mm缩小到80*80mm,从而电路板组件在封装、焊接等加工过程中发生翘曲及焊点开裂的风险更小,提高电路板组件的可靠性。同时,封装芯片的尺寸缩小,可增加其他元器件在电路板上的布局面积,或能够缩小电路板的尺寸,有利于电路板组件的小型化。It can be understood that the circuit board assembly includes a first reference plane and a second reference plane, the end surfaces of the M first ends are all located on the first reference plane, and the end surfaces of the M second ends are all located on the second reference plane. The arrangement area of the M first ends is, on the first reference plane, an area surrounded by several first ends located at the outermost periphery among the M first ends. The arrangement area of the M second ends is, on the second reference plane, an area surrounded by several second ends located at the outermost periphery among the M second ends. The explanation of the "arrangement area" that appears below is the same as the above description, and will not be repeated. The packaged chip of the circuit board assembly in the related art is directly arranged on the circuit board. During the process of packaging, welding, etc., it will be affected by materials, processing technology, etc., and thermal and mechanical stress will remain, resulting in warpage or solder joint cracking. question. The circuit board assembly in this embodiment realizes the transfer between the package chip and the circuit board through the transfer layer. The first end of the transfer layer is electrically connected to the circuit board, the second end is electrically connected to the package chip, and M second ends are electrically connected to the circuit board. The area of the arrangement area of the ends is smaller than the area of the arrangement area of the M first ends. It can be understood that the transition layer is a fan-in type transition layer, that is, the fan-in type transition layer realizes the fan-in from the circuit board to the packaged chip. Compared with the packaged chip that is directly fixed to the circuit board, fixed through the transition layer. The size of the packaged chip on the circuit board can be made smaller, for example, the size of the packaged chip is reduced from 100*100mm to 80*80mm, so that the circuit board components will warp and crack the solder joints during packaging, welding and other processing. Less risk and improved reliability of circuit board assemblies. At the same time, the reduced size of the packaged chip can increase the layout area of other components on the circuit board, or can reduce the size of the circuit board, which is beneficial to the miniaturization of circuit board components.
一种可能的实现方式中,所述第二端的排布区域的面积小于或等于所述第一端的排布区域的面积的80%,也就是说,封装芯片的尺寸可以缩小到80%或更小,当封装芯片的尺寸缩小至80%或更小时,能够有效降低电路板组件发生翘曲及焊点开裂的风险,提高电路板组件的可靠性。当然,在其他实施例中,M个第二端的排布区域的面积还可以小于M个第一端的排布区域的面积的其他数值。In a possible implementation manner, the area of the arrangement area of the second end is less than or equal to 80% of the area of the arrangement area of the first end, that is, the size of the packaged chip can be reduced to 80% or Smaller, when the size of the packaged chip is reduced to 80% or less, the risk of warpage and solder joint cracking of the circuit board assembly can be effectively reduced, and the reliability of the circuit board assembly can be improved. Of course, in other embodiments, the area of the arrangement regions of the M second ends may also be smaller than the area of the arrangement regions of the M first ends by other values.
一种可能的实现方式中,所述转接层的热膨胀系数小于所述电路板的热膨胀系数且大于所述封装芯片的热膨胀系数。转接层缓冲了电路板和封装芯片之间的热膨胀系数差异,能有效降低两者发生失配的风险,降低电路板组件发生翘曲及焊点开裂的风险,提高电路板组件的可靠性。In a possible implementation manner, the thermal expansion coefficient of the transition layer is smaller than the thermal expansion coefficient of the circuit board and greater than the thermal expansion coefficient of the packaged chip. The transition layer buffers the thermal expansion coefficient difference between the circuit board and the packaged chip, which can effectively reduce the risk of mismatch between the two, reduce the risk of warping and cracking of the circuit board components, and improve the reliability of the circuit board components.
一种可能的实现方式中,所述转接层还包括缓冲功能层,所述导电通路贯穿所述缓冲功能层,所述第一端和所述第二端分别露出所述缓冲功能层两个相背的表面。缓冲功能层一方面用于固定导电通路,另一方面缓冲功能层在封装芯片固定于转接层时还能缓冲热、机应力,降低电路板组件发生翘曲及焊点开裂的风险。In a possible implementation manner, the transition layer further includes a buffer function layer, the conductive path runs through the buffer function layer, and the first end and the second end respectively expose two of the buffer function layer. opposite surfaces. On the one hand, the buffer function layer is used to fix the conductive path, and on the other hand, the buffer function layer can buffer heat and mechanical stress when the packaged chip is fixed on the transfer layer, thereby reducing the risk of warpage and cracking of the solder joints of the circuit board assembly.
一种可能的实现方式中,所述缓冲功能层采用绝缘材料。其中,绝缘材料可以为多种,聚丙烯、聚酰亚胺等介质材料。In a possible implementation manner, the buffer functional layer adopts an insulating material. Among them, the insulating material can be various, such as polypropylene, polyimide and other dielectric materials.
一种可能的实现方式中,所述缓冲功能层的弹性模量大于或等于200MPa,能够有效缓冲热、机应力,降低电路板组件发生翘曲及焊点开裂的风险。In a possible implementation manner, the elastic modulus of the buffer functional layer is greater than or equal to 200 MPa, which can effectively buffer thermal and mechanical stress, and reduce the risk of warping and cracking of solder joints in the circuit board assembly.
一种可能的实现方式中,所述封装芯片还包括多个锡球,每一个所述锡球一一对应地与所述第二端电连接。In a possible implementation manner, the packaged chip further includes a plurality of solder balls, and each of the solder balls is electrically connected to the second terminal in a one-to-one correspondence.
一种可能的实现方式中,所述电路板组件还包括导接层,所述导接层位于所述转接层和所述封装芯片之间,所述导接层包括缓冲层和嵌设于所述缓冲层的导电介质,所述导电介质电连接在所述第二端和所述封装芯片之间。本实施例通过导接层将封装芯片和转接层连接,将电路板组件中的多个元件固定成一个封装整体,相比于通过锡球实现连接的方案,可靠性和应力均增强,有效降低电路板组件发生翘曲和焊点开裂的风险。In a possible implementation manner, the circuit board assembly further includes a conductive layer, the conductive layer is located between the transfer layer and the packaged chip, the conductive layer includes a buffer layer and a The conductive medium of the buffer layer is electrically connected between the second end and the package chip. In this embodiment, the packaged chip is connected with the transition layer through the conductive layer, and multiple components in the circuit board assembly are fixed into a package. Reduce the risk of warping and cracked solder joints in circuit board assemblies.
一种可能的实现方式中,所述电路板组件还包括置于所述电路板的多个第一焊盘和置于所述封装芯片的多个第二焊盘,所述导电通路的所述第一端与对应的所述第一焊盘连接,所述导电通路的所述第二端与对应的所述第二焊盘连接。In a possible implementation manner, the circuit board assembly further includes a plurality of first pads placed on the circuit board and a plurality of second pads placed on the packaged chip, and the The first end is connected to the corresponding first pad, and the second end of the conductive path is connected to the corresponding second pad.
一种可能的实现方式中,所述封装芯片包括芯片和封装基板,所述芯片安装于所述封装基板,所述封装基板包括背向所述芯片的导接面,所述导接面与所述第二端电连接。In a possible implementation manner, the packaged chip includes a chip and a package substrate, the chip is mounted on the package substrate, and the package substrate includes a conductive surface facing away from the chip, the conductive surface is connected to the package substrate. The second end is electrically connected.
第二方面,本申请还提供一种电路板组件的制造方法。所述制造方法包括:In a second aspect, the present application also provides a method for manufacturing a circuit board assembly. The manufacturing method includes:
在电路板的安装面形成转接层,其中,所述转接层包括M个具有第一端和第二端的导电通路,所述M为大于或等于2的整数,M个所述第二端的排布区域的面积小于M个所述第一端的排布区域的面积,所述第一端与所述电路板电连接;A transfer layer is formed on the mounting surface of the circuit board, wherein the transfer layer includes M conductive paths with a first end and a second end, the M is an integer greater than or equal to 2, and the M conductive paths of the second ends The area of the arrangement area is smaller than the area of the arrangement area of the M first ends, and the first ends are electrically connected to the circuit board;
将封装芯片固定至所述转接层背向所述电路板的一侧并与所述第二端电连接。The packaged chip is fixed to the side of the transfer layer facing away from the circuit board and electrically connected to the second end.
本实施例提供的制造方法通过在电路板和封装芯片之间形成转接层,转接层与电路板电连接的M个第二端的排布区域的面积小于转接层与封装芯片电连接的M个第一端的排布区域的面积,可以理解的是,转接层为扇入型转接层,即扇入型转接层实现了电路板至封装芯片的扇入,相比于封装芯片直接固定于电路板,通过转接层固定于电路板上的封装芯片的尺寸可以做得更小,从而电路板组件在封装、焊接等加工过程中发生翘曲及焊点开裂的风险更小,提高电路板组件的可靠性。同时,封装芯片的尺寸缩小,可增加其他元器件在电路板上的布局面积,或能够缩小电路板的尺寸,有利于电路板组件的小型化。In the manufacturing method provided in this embodiment, a transfer layer is formed between the circuit board and the package chip, and the area of the M second ends that are electrically connected between the transfer layer and the circuit board is smaller than the area where the transfer layer is electrically connected to the package chip. The area of the arrangement area of the M first ends, it can be understood that the transition layer is a fan-in type transition layer, that is, the fan-in type transition layer realizes the fan-in from the circuit board to the packaged chip. The chip is directly fixed on the circuit board, and the size of the packaged chip fixed on the circuit board through the transfer layer can be made smaller, so that the risk of warpage and solder joint cracking of the circuit board assembly during packaging, welding and other processing is smaller. , improve the reliability of circuit board components. At the same time, the reduced size of the packaged chip can increase the layout area of other components on the circuit board, or can reduce the size of the circuit board, which is beneficial to the miniaturization of circuit board components.
一种可能的实现方式中,形成所述转接层的方法包括:在所述电路板的安装面形成第一缓冲基层;在所述第一缓冲基层上形成露出电路板的第一开口;所述第一开口内形成具有第一端和第二端的导电通路。缓冲功能层一方面用于固定导电通路,另一方面缓冲功能层在封装芯片固定于转接层时还能缓冲热、机应力,降低电路板组件发生翘曲及焊点开裂的风险。In a possible implementation manner, the method for forming the transition layer includes: forming a first buffer base layer on the mounting surface of the circuit board; forming a first opening exposing the circuit board on the first buffer base layer; A conductive path having a first end and a second end is formed in the first opening. On the one hand, the buffer function layer is used to fix the conductive path, and on the other hand, the buffer function layer can buffer heat and mechanical stress when the packaged chip is fixed on the transfer layer, thereby reducing the risk of warpage and cracking of the solder joints of the circuit board assembly.
一种可能的实现方式中,所述第一缓冲基层的弹性模量大于或等于200MPa,能够有效缓冲热、机应力,降低电路板组件发生翘曲及焊点开裂的风险。In a possible implementation manner, the elastic modulus of the first buffer base layer is greater than or equal to 200 MPa, which can effectively buffer thermal and mechanical stress, and reduce the risk of warping and cracking of solder joints of the circuit board assembly.
一种可能的实现方式中,在所述封装芯片电连接所述第二端之前,所述制造方法还包括:在所述转接层背向所述电路板的一侧形成与所述第二端导接的导接层;所述封装芯片电连接所述第二端包括所述封装芯片与所述导接层键合固定。本实施例通过导接层将封装芯片和转接层连接,将电路板组件中的多个元件固定成一个封装整体,相比于通过锡球实现连接的方案,可靠性和应力均增强,有效降低电路板组件发生翘曲和焊点开裂的风险。In a possible implementation manner, before the package chip is electrically connected to the second end, the manufacturing method further includes: forming a connection with the second end on the side of the transition layer facing away from the circuit board. A conductive layer connected to the terminal; the package chip is electrically connected to the second end including the package chip and the conductive layer being bonded and fixed. In this embodiment, the packaged chip is connected with the transition layer through the conductive layer, and multiple components in the circuit board assembly are fixed into a package. Reduce the risk of warping and cracked solder joints in circuit board assemblies.
一种可能的实现方式中,形成所述导接层的方法包括:在所述转接层背向电路板的一侧形成第二缓冲基层;在所述第二缓冲基层上形成露出所述第二端的第二开口;在所述第二开口内形成与所述第二端导接的导电介质;所述封装芯片与所述导接层键合固定包括所述封装芯片与所述导接层的导电介质键合固定。In a possible implementation manner, the method for forming the conductive layer includes: forming a second buffer base layer on the side of the transition layer facing away from the circuit board; A second opening at two ends; a conductive medium conductively connected to the second end is formed in the second opening; the bonding and fixing of the packaged chip and the conductive layer includes the packaged chip and the conductive layer The conductive medium is fixed by bonding.
一种可能的实现方式中,所述第二端的排布区域的面积小于或等于所述第一端的排布区域的面积的80%,也就是说,封装芯片的尺寸可以缩小到80%或更小,当封装芯片的尺寸缩小至80%或更小时,能够有效降低电路板组件发生翘曲及焊点开裂的风险,提高电路板组件的可靠性。当然,在其他实施例中,M个第二端的排布区域的面积还可以小于M个第一端的排布区域的面积的其他数值。In a possible implementation manner, the area of the arrangement area of the second end is less than or equal to 80% of the area of the arrangement area of the first end, that is, the size of the packaged chip can be reduced to 80% or Smaller, when the size of the packaged chip is reduced to 80% or less, the risk of warpage and solder joint cracking of the circuit board assembly can be effectively reduced, and the reliability of the circuit board assembly can be improved. Of course, in other embodiments, the area of the arrangement regions of the M second ends may also be smaller than the area of the arrangement regions of the M first ends by other values.
一种可能的实现方式中,所述转接层的热膨胀系数小于所述电路板的热膨胀系数且大于所述封装芯片的热膨胀系数。转接层缓冲了电路板和封装芯片之间的热膨胀系数差异,能有效降低两者发生失配的风险,降低电路板组件发生翘曲及焊点开裂的风险,提高电路板组件的可靠性。In a possible implementation manner, the thermal expansion coefficient of the transition layer is smaller than the thermal expansion coefficient of the circuit board and greater than the thermal expansion coefficient of the packaged chip. The transition layer buffers the thermal expansion coefficient difference between the circuit board and the packaged chip, which can effectively reduce the risk of mismatch between the two, reduce the risk of warping and cracking of the circuit board components, and improve the reliability of the circuit board components.
第三方面,本申请还提供一种电路板组件的制造方法。所述制造方法包括:In a third aspect, the present application also provides a method for manufacturing a circuit board assembly. The manufacturing method includes:
在封装芯片上形成转接层,其中,所述转接层包括M个具有第一端和第二端的导电通路,所述M为大于或等于2的整数,M个所述第二端的排布区域的面积小于M个所述第一端的排布区域的面积,所述第二端与所述封装芯片电连接;A transfer layer is formed on the packaged chip, wherein the transfer layer includes M conductive paths with a first end and a second end, the M is an integer greater than or equal to 2, and the arrangement of the M second ends The area of the area is smaller than the area of the arrangement area of the M first ends, and the second ends are electrically connected to the package chip;
将转接层背向所述封装芯片的一侧固定至电路板,所述第一端与所述电路板电连接。The side of the transition layer facing away from the packaged chip is fixed to the circuit board, and the first end is electrically connected to the circuit board.
本实施例提供的制造方法通过在电路板和封装芯片之间形成转接层,转接层与电路板电连接的M个第二端的排布区域的面积小于转接层与封装芯片电连接的M个第一端的排布区域的面积,可以理解的是,转接层为扇入型转接层,即扇入型转接层实现了电路板至封装芯片的扇入,相比于封装芯片直接固定于电路板,通过转接层固定于电路板上的封装芯片的尺寸可以做得更小,从而电路板组件在封装、焊接等加工过程中发生翘曲及焊点开裂的风险更小,提高电路板组件的可靠性。同时,封装芯片的尺寸缩小,可增加其他元器件在电路板上的布局面积,或能够缩小电路板的尺寸,有利于电路板组件的小型化。In the manufacturing method provided in this embodiment, a transfer layer is formed between the circuit board and the package chip, and the area of the M second ends that are electrically connected between the transfer layer and the circuit board is smaller than the area where the transfer layer is electrically connected to the package chip. The area of the arrangement area of the M first ends, it can be understood that the transition layer is a fan-in type transition layer, that is, the fan-in type transition layer realizes the fan-in from the circuit board to the packaged chip. The chip is directly fixed on the circuit board, and the size of the packaged chip fixed on the circuit board through the transfer layer can be made smaller, so that the risk of warpage and solder joint cracking of the circuit board assembly during packaging, welding and other processing is smaller. , improve the reliability of circuit board components. At the same time, the reduced size of the packaged chip can increase the layout area of other components on the circuit board, or can reduce the size of the circuit board, which is beneficial to the miniaturization of circuit board components.
第四方面,本申请还提供一种电子设备。所述电子设备包括上述的电路板组件。其中,电子设备例如为通讯设备或者与信息通信技术相关的具有电路板组件的电子设备。In a fourth aspect, the present application further provides an electronic device. The electronic device includes the above-mentioned circuit board assembly. The electronic device is, for example, a communication device or an electronic device with a circuit board assembly related to information and communication technology.
为了更清楚地说明本申请实施例或背景技术中的技术方案,下面将对本申请实施例或背 景技术中所需要使用的附图进行说明。In order to more clearly illustrate the technical solutions in the embodiments of the present application or the background technology, the accompanying drawings that need to be used in the embodiments of the present application or the background technology will be described below.
图1是本申请实施例提供的一种电子设备的结构示意图;1 is a schematic structural diagram of an electronic device provided by an embodiment of the present application;
图2是图1所示的电子设备的电路板组件的结构示意图;2 is a schematic structural diagram of a circuit board assembly of the electronic device shown in FIG. 1;
图3是图2所示的电路板组件与相关技术的电路板组件的对比示意图;FIG. 3 is a schematic diagram of the comparison between the circuit board assembly shown in FIG. 2 and the circuit board assembly of the related art;
图4是图3所示的两个电路板组件的翘曲风险示意图;FIG. 4 is a schematic diagram of the warpage risk of the two circuit board assemblies shown in FIG. 3;
图5是图2所示的电路板组件的另一实施方式的结构示意图;5 is a schematic structural diagram of another embodiment of the circuit board assembly shown in FIG. 2;
图6是图2所示的电路板组件的另一实施方式的结构示意图;FIG. 6 is a schematic structural diagram of another embodiment of the circuit board assembly shown in FIG. 2;
图7是图2所示的电路板组件的另一实施例的结构示意图;FIG. 7 is a schematic structural diagram of another embodiment of the circuit board assembly shown in FIG. 2;
图8是图7所示的电路板组件的另一实施方式的结构示意图;FIG. 8 is a schematic structural diagram of another embodiment of the circuit board assembly shown in FIG. 7;
图9是图2所示的电路板组件的另一实施例的结构示意图;FIG. 9 is a schematic structural diagram of another embodiment of the circuit board assembly shown in FIG. 2;
图10是本申请实施例提供的一种电路板组件的制造方法的流程示意图;10 is a schematic flowchart of a method for manufacturing a circuit board assembly provided by an embodiment of the present application;
图11是图10所示的制造方法的具体工艺示意图;Fig. 11 is a specific process schematic diagram of the manufacturing method shown in Fig. 10;
图12是本申请实施例提供的另一种电路板组件的制造方法的流程示意图;12 is a schematic flowchart of another method for manufacturing a circuit board assembly provided by an embodiment of the present application;
图13是图12所示的制造方法的具体工艺示意图;Fig. 13 is the concrete process schematic diagram of the manufacturing method shown in Fig. 12;
图14是本申请实施例提供的另一种电路板组件的制造方法的流程示意图;14 is a schematic flowchart of another method for manufacturing a circuit board assembly provided by an embodiment of the present application;
图15是图14所示的制造方法的具体工艺示意图;Fig. 15 is a specific process schematic diagram of the manufacturing method shown in Fig. 14;
图16是本申请实施例提供的另一种电路板组件的制造方法的流程示意图;16 is a schematic flowchart of another method for manufacturing a circuit board assembly provided by an embodiment of the present application;
图17是图16所示的制造方法的具体工艺示意图;Fig. 17 is the specific process schematic diagram of the manufacturing method shown in Fig. 16;
图18是图17所示的电路板组件的另一种实施方式的具体工艺示意图;FIG. 18 is a specific process schematic diagram of another embodiment of the circuit board assembly shown in FIG. 17;
图19是图17所示的电路板组件的另一种实施方式的具体工艺示意图。FIG. 19 is a specific process schematic diagram of another embodiment of the circuit board assembly shown in FIG. 17 .
下面结合本申请实施例中的附图对本申请实施例进行描述。The embodiments of the present application will be described below with reference to the accompanying drawings in the embodiments of the present application.
在本申请实施例的描述中,需要说明的是,除非另有明确的规定和限定,术语“安装”、“连接”应做广义理解,例如,“连接”可以是可拆卸地连接,也可以是不可拆卸地连接;可以是直接连接,也可以通过中间媒介间接连接。其中,“固定连接”是指彼此连接且连接后的相对位置关系不变。本申请实施例中所提到的方位用语,例如,“上”、“下”、“内”、“外”等,仅是参考附图的方向,因此,使用的方位用语是为了更好、更清楚地说明及理解本申请实施例,而不是指示或暗指所指的装置或元件必须具有特定的方位、以特定的方位构造和操作,因此不能理解为对本申请实施例的限制。“多个”是指至少两个。In the description of the embodiments of the present application, it should be noted that, unless otherwise expressly specified and limited, the terms "installation" and "connection" should be understood in a broad sense. For example, "connection" may be detachable connection, or It is a non-removable connection; it can be a direct connection or an indirect connection through an intermediate medium. Wherein, "fixed connection" refers to connection with each other and the relative positional relationship after connection remains unchanged. Orientation terms mentioned in the embodiments of this application, such as "upper", "bottom", "inside", "outside", etc., only refer to the directions of the drawings. Therefore, the orientation terms used are for better, To clearly describe and understand the embodiments of the present application, rather than indicating or implying that the indicated devices or elements must have a specific orientation, be constructed and operate in a specific orientation, and therefore should not be construed as a limitation on the embodiments of the present application. "Plurality" means at least two.
为方便理解,下面先对本申请所涉及的技术术语进行解释和描述。For the convenience of understanding, the technical terms involved in this application are explained and described below.
热膨胀系数(coefficient of thermal expansion,CTE),物体在温度升高时长度或体积发生的相对变化量,是物体由于温度改变而有胀缩现象。Coefficient of thermal expansion (CTE), the relative change in length or volume of an object when the temperature increases, is the phenomenon of expansion and contraction of an object due to temperature changes.
扇入型(Fan-in),晶圆级封装主要分为扇入型(Fan-in)和扇出型(Fan-out)两种,扇入型可以将多个逻辑器件,模拟器件和存储芯片集成到电路板中,能够降低整个封装面积。Fan-in, wafer-level packaging is mainly divided into two types: fan-in and fan-out. Fan-in can combine multiple logic devices, analog devices and memory. The chip is integrated into the circuit board, which can reduce the overall package area.
可以理解的是,此处所描述的具体实施例仅仅用于解释相关发明,而非对该发明的限定。另外还需要说明的是,为了便于描述,附图中仅示出了与发明相关的部分。It should be understood that the specific embodiments described herein are only used to explain the related invention, but not to limit the invention. In addition, it should be noted that, for the convenience of description, only the parts related to the invention are shown in the drawings.
下面将参考附图并结合实施例来详细说明本申请。The present application will be described in detail below with reference to the accompanying drawings and in conjunction with the embodiments.
请参阅图1,图1是本申请实施例提供的一种电子设备的结构示意图。Please refer to FIG. 1 , which is a schematic structural diagram of an electronic device provided by an embodiment of the present application.
本申请实施例提供一种电子设备100,电子设备100包括壳体10和电路板组件20,电路板组件20设于壳体10内部,电路板组件20可以理解为有芯片、电路板等电子元件堆叠形成 的电路板组件。电路板组件20用于实现电子设备100的处理、存储、控制、运行等功能。电子设备100可以是具有电路板组件20的各类电子设备,例如通信设备、与信息通信技术相关的电子设备、手机、平板、电脑及其他种类的网络类设备等。The embodiment of the present application provides an
请参阅图2,图2是图1所示的电子设备100的电路板组件20的结构示意图。Please refer to FIG. 2 , which is a schematic structural diagram of the
电路板组件20包括电路板21、转接层22和封装芯片23。转接层22设于电路板21的安装面211,封装芯片23设于转接层22背向电路板21的一侧,也就是说,转接层22连接于电路板21和封装芯片23之间。转接层22包括M个导电通路221,导电通路221包括依次连接的第一端221a、中间段221b和第二端221c。M个导电通路221间隔排布,且所有导电通路221的第一端221a朝向相同,所有导电通路221的第二端221c朝向相同,每一个第一端221a与电路板21电连接,每一个第二端221c与封装芯片23电连接。M个第二端221c的排布区域的面积小于M个第一端221a的排布区域的面积,M为大于或等于2的整数。The
可以理解的是,M个第一端221a的排布形式为多种,例如M个第一端221a可以以阵列形式排布或非阵列形式排布。M个第二端221c的排布形式为多种,例如M个第二端221c可以以阵列形式排布或非阵列形式排布。It can be understood that, the M first ends 221a can be arranged in various forms, for example, the M first ends 221a can be arranged in an array form or a non-array form. The arrangement forms of the M second ends 221c are various, for example, the M second ends 221c may be arranged in an array form or a non-array form.
可以理解的是,电路板组件20包括第一基准面和第二基准面,M个第一端221a的端面均位于第一基准面,M个第二端221c的端面均位于第二基准面。M个第一端221a的排布区域为,在第一基准面上,M个第一端221a中位于最外围的几个第一端221a围设形成的区域。M个第二端221c的排布区域为,在第二基准面上,M个第二端221c中位于最外围的几个第二端221c围设形成的区域。下文出现的“排布区域”和上述解释一样,不再赘述。It can be understood that the
请结合参阅图3和图4,图3是图2所示的电路板组件与相关技术的电路板组件的对比示意图。图4是图3所示的两个电路板组件的翘曲风险示意图。其中图4仅代表两个电路板组件翘曲的效果示意,并不是两个电路板组件的实际结构。Please refer to FIG. 3 and FIG. 4 in conjunction. FIG. 3 is a schematic diagram of a comparison between the circuit board assembly shown in FIG. 2 and the circuit board assembly of the related art. FIG. 4 is a schematic diagram of the warpage risk of the two circuit board assemblies shown in FIG. 3 . FIG. 4 only represents a schematic diagram of the warping effect of the two circuit board assemblies, not the actual structure of the two circuit board assemblies.
相关技术中的电路板组件30的封装芯片33直接设于电路板31上,在封装、焊接等加工过程中会受材料、加工工艺等影响,热、机应力残留,导致翘曲的发生或焊点开裂的问题。本实施例中的电路板组件20通过转接层22实现封装芯片23和电路板21之间的转接,转接层22的第一端221a与电路板21电连接,第二端221c与封装芯片23电连接,M个第二端221c的排布区域的面积小于M个第一端221a的排布区域的面积。可以理解的是,转接层22为扇入型转接层,即扇入型转接层22实现了电路板21至封装芯片23的扇入,相比于封装芯片33直接固定于电路板31,通过转接层22固定于电路板21上的封装芯片23的尺寸可以做得更小,比如封装芯片23的尺寸从100*100mm缩小到80*80mm,从而电路板组件20在封装、焊接等加工过程中发生翘曲及焊点开裂的风险更小,提高电路板组件20的可靠性。同时,封装芯片23的尺寸缩小,可增加其他元器件在电路板21上的布局面积,或能够缩小电路板21的尺寸,有利于电路板组件20的小型化。The packaged
可以理解的是,如图2,电路板21包括多个第一焊盘212,多个第一焊盘212排布于电路板21的安装面211,多个第一焊盘212可以设于安装面211的表面,也可以嵌设于安装面211。多个第一焊盘212用于与对应的第一端221a电连接,以实现电路板21与转接层22的电连接。封装芯片23也包括多个第二焊盘235,多个第二焊盘235用于与对应的第二端221c连接,以实现封装芯片23与转接层22的电连接。It can be understood that, as shown in FIG. 2 , the
虽然封装芯片23的多个第二焊盘235之间的间距可以做小,从而使封装芯片23做的更小,但是电路板21上的多个第一焊盘212之间的间距不能做的像封装芯片23的多个第二焊盘235之间的间距那样小。因此,本申请通过在电路板21和封装芯片23之间设置转接在两 者之间的转接层22,能够实现更小尺寸的封装芯片23与电路板21的堆叠,例如多个第二焊盘235之间的间距从1.0mm缩小到0.8mm,降低电路板组件20发生翘曲及焊点开裂的风险,提高电路板组件20的可靠性。Although the spacing between the plurality of
本实施例中,转接层22的热膨胀系数小于电路板21的热膨胀系数且大于封装芯片23的热膨胀系数。可以理解的是,由于电路板21的热膨胀系数和封装芯片23的热膨胀系数之间的差异比较大。例如,电路板21的热膨胀系数为20ppm左右,封装芯片23的热膨胀系数在10ppm~15ppm之间。In this embodiment, the thermal expansion coefficient of the
在此情况下,将电路板21和封装芯片23之间设置热膨胀系数位于两者之间的转接层22,转接层22的热膨胀系在15ppm~20ppm之间。由于转接层22的热膨胀系数与电路板21的热膨胀系数差异不大,转接层22的热膨胀系数和封装芯片23的热膨胀系数差异也不大,转接层22缓冲了电路板21和封装芯片23之间的热膨胀系数差异,能有效降低转接层22分别与电路板21和封装芯片23之间发生失配的风险,即降低电路板21与封装芯片23的失配风险,降低电路板组件20发生翘曲及焊点开裂的风险,提高电路板组件20的可靠性。In this case, a
如图2,转接层22还包括缓冲功能层222,导电通路221贯穿缓冲功能层222,中间段221b位于缓冲功能层222内,第一端221a和第二端221c分别露出缓冲功能层222两个相背的表面。第一基准面和第二基准面均与缓冲功能层222的两个相背的表面平行。As shown in FIG. 2 , the
本实施例中,缓冲功能层222一方面用于固定导电通路221,另一方面缓冲功能层222在封装芯片23固定于转接层22时还能缓冲热、机应力,降低电路板组件20发生翘曲及焊点开裂的风险。In this embodiment, the
具体的,缓冲功能层222包括相背设置的第一表面和第二表面。多个第一端221a排布于第一表面,多个第二端221c排布于第二表面。其中,多个第一端221a可以嵌设于第一表面,也可以设于第一表面上。多个第二端221c可以嵌设于第二表面,也可以设于第二表面上。Specifically, the
本实施例中,缓冲功能层222采用绝缘材料,例如聚丙烯(Polypropylene,PP)、聚酰亚胺(Polyimide,PI)等介质材料。缓冲功能层222具有低热膨胀系数和高弹性,其热膨胀系数小于或等于15ppm,弹性模量大于或等于200MPa,在制造堆叠过程的一些工艺中缓冲功能层222能够有效缓冲热、机应力,降低电路板组件20发生翘曲及焊点开裂的风险。In this embodiment, the
当然,在其他实施例中,缓冲功能层222的热膨胀系数和弹性不限于上述描述,只要能够缓冲功能层222能起到降低电路板组件20发生翘曲及焊点开裂的风险的作用即可。Of course, in other embodiments, the thermal expansion coefficient and elasticity of the
导电通路221采用导电材料形成,导电材料可以是铜、锡、镍、铝、钛、不锈钢、铍、钼、钨、碳化硅和碳化钨中的一种或多种。导电通路221中的第一端221a、中间段221b和第二端221c的材料可以相同或不同。The conductive path 221 is formed of a conductive material, and the conductive material may be one or more of copper, tin, nickel, aluminum, titanium, stainless steel, beryllium, molybdenum, tungsten, silicon carbide and tungsten carbide. The materials of the
本实施例中,M个第二端221c的排布区域的面积小于或等于M个第一端221a的排布区域的面积的80%,也就是说,封装芯片23的尺寸可以缩小到80%或更小,当封装芯片23的尺寸缩小至80%或更小时,能够有效降低电路板组件20发生翘曲及焊点开裂的风险,提高电路板组件20的可靠性。当然,在其他实施例中,M个第二端221c的排布区域的面积还可以小于M个第一端221a的排布区域的面积的其他数值。In this embodiment, the area of the arrangement area of the M second ends 221c is less than or equal to 80% of the area of the arrangement area of the M first ends 221a, that is, the size of the packaged
一些实施例中,封装芯片可以是单个芯片,也可以是多个芯片集成于封装基板形成的芯片结构。当封装芯片为单个芯片时,单个芯片电连接至第二端。当封装芯片为多个芯片集成与封装基板形成的芯片结构时,封装基板电连接第二端以实现多个芯片与扇入转接层22的电连接。In some embodiments, the packaged chip may be a single chip, or may be a chip structure formed by integrating multiple chips on a package substrate. When the packaged chip is a single chip, the single chip is electrically connected to the second terminal. When the packaged chip is a chip structure formed by integrating multiple chips and a package substrate, the package substrate is electrically connected to the second end to realize electrical connection between the multiple chips and the fan-in via
本实施例中,如图2,封装芯片23为多个芯片集成于封装基板形成的芯片结构。封装芯 片23包括芯片231、芯片转接层232、封装基板233和锡球234。芯片231通过芯片转接层232安装于封装基板233,也就是说,封装基板233、芯片转接层232和芯片231依次堆叠。其中,芯片231的数量可以是一个或多个。封装基板233上还可以设置其他电子元器件。封装基板233包括背向芯片231的导接面2331,第二焊盘235设于导接面2331,锡球234设于封装基板233的导接面2331,并与第二焊盘235导接,以与第二端221c电连接,即,具体的,锡球34的数量为多个,多个锡球234一一对应的与第二端221c电连接,以使实现封装基板233与转接层22之间的电连接。In this embodiment, as shown in FIG. 2 , the packaged
当然,其他实施例中,封装芯片还可以包括芯片、封装基板和锡球。也就是说,芯片和封装基板之间还可以不设置芯片转接层。或者,其他实施例中,封装芯片还可以通过除锡球以外的其他连接结构实现与第二端之间的导接。Of course, in other embodiments, the packaged chip may further include a chip, a package substrate and a solder ball. That is to say, a chip transfer layer may not be provided between the chip and the package substrate. Alternatively, in other embodiments, the packaged chip may also be connected to the second end through other connection structures other than solder balls.
本实施例中,由于封装芯片23的尺寸变小,封装芯片23的锡球234的尺寸也相应变小,比如锡球的直径从0.5mm缩小到0.3mm,也就减小了封装芯片23与电路板21之间的距离。本实施例中,封装芯片23与电路板21之间的距离小于或等于300mm,有效缩小芯片231与电路板21之间的传输路径,降低链路损耗,提升信号质量。In this embodiment, since the size of the packaged
请参阅图5,图5是图2所示的电路板组件的另一实施方式的结构示意图。Please refer to FIG. 5 , which is a schematic structural diagram of another embodiment of the circuit board assembly shown in FIG. 2 .
在本实施方式中,电路板组件20包括电路板21、转接层22和封装芯片23。封装芯片23包括芯片231、封装基板233和芯片转接层232,芯片231通过芯片转接层232固定于封装基板233上。扇入转接层22的第一端221a通过锡球电连接至对应的电路板21的第一焊盘212,扇入转接层22的第二端221c与封装基板233的第二焊盘235电连接。In this embodiment, the
请参阅图6,图6是图2所示的电路板组件的另一实施方式的结构示意图。Please refer to FIG. 6 , which is a schematic structural diagram of another embodiment of the circuit board assembly shown in FIG. 2 .
在本实施方式中,电路板组件20包括电路板21、转接层22和封装芯片23。封装芯片23包括芯片231、封装基板233和芯片转接层232,芯片231通过芯片转接层232固定于封装基板233上。扇入转接层22的第一端221a电连接至对应的电路板21的第一焊盘212,扇入转接层22的第二端221c与封装基板233的第二焊盘235电连接。第一端221a可以通过键合、共晶等方式与第一焊盘212连接固定,第二端211c可以通过键合、共晶等方式与第二焊盘235连接固定。In this embodiment, the
在其他实施例中,电路板组件还可以包括两个转接层,例如,一个转接层形成于电路板上,一个转接层形成于封装芯片上,两个转接层通过锡球或导接层实现电连接。或者,电路板组件还可以包括多个转接层。In other embodiments, the circuit board assembly may further include two transfer layers, for example, one transfer layer is formed on the circuit board, one transfer layer is formed on the packaged chip, and the two transfer layers are formed by solder balls or conductors. The connection layer realizes the electrical connection. Alternatively, the circuit board assembly may also include multiple interposer layers.
请参阅图7,图7是图2所示的电路板组件的另一实施例的结构示意图。Please refer to FIG. 7 , which is a schematic structural diagram of another embodiment of the circuit board assembly shown in FIG. 2 .
本实施例与图2所示的实施例大致相同,不同的是,本实施例中的电路板组件20包括导接层24,导接层24代替锡球实现封装基板233与第二端221c的电连接。具体的,导接层24位于转接层22和封装芯片23之间,导接层24包括缓冲层241和嵌设于缓冲层241的导电介质242,导电介质242电连接在第二端221c和封装芯片23的第二焊盘235之间。本实施例通过导接层24将封装芯片23和转接层22连接,将电路板组件20中的多个元件固定成一个封装整体,相比于通过锡球实现连接的方案,可靠性和应力均增强,有效降低电路板组件20发生翘曲和焊点开裂的风险。This embodiment is substantially the same as the embodiment shown in FIG. 2 , except that the
具体的,缓冲层241采用绝缘材料,例如聚丙烯(Polypropylene,PP)、聚酰亚胺(Polyimide,PI)等介质材料。缓冲层241可以是液态涂覆后常温或高温或UV固化,也可以是膜材压合。缓冲层241具有低热膨胀系数和高弹性,其热膨胀系数小于或等于15ppm,弹性模量大于或等于200MPa,在制造电路板组件20过程的一些工艺中缓冲层241能够有效缓冲热、机应力, 降低电路板组件20发生翘曲及焊点开裂的风险。本实施例中,缓冲层241的材料可以和缓冲功能层222相同或不同。Specifically, the
导电介质242采用包括但限于铜、银、锡等纯金属或金属混合物材料,或者金属与非金属的混合物材料。导电介质242的形状可以是球状、柱状、针状、锥状等。本实施例中导电介质242的尺寸相对于图2所示的锡球234的尺寸更小,能在一定程度上缩短封装芯片23和电路板21之间的链路长度,提高信号质量,还能起到降低电路板组件20发生翘曲和焊点开裂的风险。The
请参阅图8,图8是图7所示的电路板组件的另一实施方式的结构示意图。Please refer to FIG. 8 , which is a schematic structural diagram of another embodiment of the circuit board assembly shown in FIG. 7 .
本实施方式与图7所示的实施方式大致相同,不同在于,本实施方式中的导接层24连接在转接层22和电路板21之间,导接层24的导电介质242电连接在第一焊盘212和第一端221a之间。封装芯片23设于转接层22背向导接层24的一侧,且封装芯片23的第二焊盘235与转接层22的第二端221c电连接。This embodiment is substantially the same as the embodiment shown in FIG. 7 , except that the
请参阅图9,图9是图2所示的电路板组件的另一实施例的结构示意图。Please refer to FIG. 9 , which is a schematic structural diagram of another embodiment of the circuit board assembly shown in FIG. 2 .
本实施例与图8所示的实施例大致相同,不同的是,本实施例通过导接层24实现电路板21和封装芯片23之间的电连接,也就是说,本实施例中的电路板组件20不包括转接层,导接层24代替传统的锡球实现电路板21和封装芯片23之间的电连接。本实施例中,导接层24中的导电介质242的尺寸比锡球更小,能够缩短封装芯片23与电路板21之间的链路,提高信号质量。且导接层24的缓冲层241具有低热膨胀系数和高弹性,其热膨胀系数小于或等于15ppm,弹性模量大于或等于200MPa,在制造电路板组件20过程的一些工艺中缓冲层241能够有效缓冲热、机应力,可靠性和应力均增强,有效降低电路板组件20发生翘曲和焊点开裂的风险。This embodiment is substantially the same as the embodiment shown in FIG. 8 , the difference is that the electrical connection between the
请参阅图10,图10是本申请实施例提供的一种电路板组件的制造方法的流程示意图。该制造方法用于制造如图2所示的电路板组件,如图10所示,电路板组件的制造方法包括如下的S110~S120。Please refer to FIG. 10 . FIG. 10 is a schematic flowchart of a method for manufacturing a circuit board assembly provided by an embodiment of the present application. The manufacturing method is used to manufacture the circuit board assembly shown in FIG. 2 . As shown in FIG. 10 , the manufacturing method of the circuit board assembly includes the following S110 to S120 .
S110:在电路板21的安装面211形成转接层22。S110 : forming a
具体的,请参阅图11,首先制作电路板21,电路板21具体可以通过压合、钻孔、电镀、图形、阻焊和表面处理等工艺形成。电路板21包括安装面211,电路板21的多个第一焊盘212露出安装面211。然后在电路板21的安装面211形成转接层22。具体的,在电路板21的安装面211形成转接层22可以通过两种实施方式。Specifically, please refer to FIG. 11 . First, a
一种实施方式中,将转接层22直接做在电路板21的安装面211上。In one embodiment, the
具体的,首先在电路板21的安装面211形成压合第一缓冲基层,其中,第一缓冲基层可以通过压合或涂覆形成。接着在第一缓冲基层上通过激光或机械钻孔形成露出电路板21的第一子开口(图未示),第一子开口具有M个,M为大于或等于2的整数,多个第一子开口一一对应地露出电路板21的多个第一焊盘212,通过化学铜/电镀铜等方法在第一子开口内形成M个第一端221a,多个第一端221a与对应的电路板21的第一焊盘212电连接。Specifically, firstly, a press-fitted first buffer base layer is formed on the mounting
接着重复上述工艺,在第一端221a背向电路板21的一侧形成又一层第一缓冲基层,在该第一缓冲基层形成M个第一子开口,第一子开口露出多个第一端221a,接着在该第一子开口内形成与第一端221a电连接的中间段221b。Next, the above process is repeated to form another first buffer base layer on the side of the
接着再次重复上述工艺,在中间段221b背向电路板21的一侧形成再一层第一缓冲基层,然后在该第一缓冲基层形成M个第一子开口,第一子开口露出多个中间段221b,接着,在该第一子开口内形成与中间段221b电连接的第二端221c,最后通过阻焊及表面处理形成转接 层22。Next, the above process is repeated again to form another first buffer base layer on the side of the middle section 221b facing away from the
可以理解的是,依次连接的第一端221a、中间段221b和第二端221c形成导电通路221,多层第一缓冲基层经过加工后形成缓冲功能层222。多个第一子开口形成第一开口(图未示)。本实施例中,导电通路221采用导电材料形成,导电材料可以是铜、锡、镍、铝、钛、不锈钢、铍、钼、钨、碳化硅和碳化钨中的一种或多种。导电通路221中的第一端221a、中间段221b和第二端221c的材料可以相同或不同。It can be understood that the
第一缓冲基层采用绝缘材料,例如聚丙烯(Polypropylene,PP)、聚酰亚胺(Polyimide,PI)等介质材料。第一缓冲基层具有低热膨胀系数和高弹性,其热膨胀系数小于或等于15ppm,弹性模量大于或等于200MPa,在后续工艺中缓冲功能层222能够有效缓冲热、机应力,降低电路板组件20发生翘曲及焊点开裂的风险。The first buffer base layer adopts insulating material, such as polypropylene (Polypropylene, PP), polyimide (Polyimide, PI) and other dielectric materials. The first buffer base layer has low thermal expansion coefficient and high elasticity, its thermal expansion coefficient is less than or equal to 15ppm, and its elastic modulus is greater than or equal to 200MPa. In the subsequent process, the
当然,在其他实施例中,缓冲功能层222的热膨胀系数和弹性不限于上述描述,只要能够缓冲功能层222能起到降低电路板组件20发生翘曲及焊点开裂的风险的作用即可。Of course, in other embodiments, the thermal expansion coefficient and elasticity of the
本实施例中,M个第二端221c的排布区域的面积小于M个第一端221a的排布区域的面积,以使后续工艺中与第二端221c电连接的封装芯片23尺寸可以做得更小,从而电路板组件20在封装、焊接等加工过程中发生翘曲及焊点开裂的风险更小,提高电路板组件20的可靠性。同时,封装芯片23的尺寸缩小,可增加其他元器件在电路板21上的布局面积,或能够缩小电路板21的尺寸,有利于电路板组件20的小型化。In this embodiment, the area of the arrangement area of the M second ends 221c is smaller than the area of the arrangement area of the M first ends 221a, so that the size of the
示例的,M个第二端221c的排布区域的面积小于或等于M个第一端221a的排布区域的面积的80%,也就是说,封装芯片23的尺寸可以缩小到80%或更小,当封装芯片23的尺寸缩小至80%或更小时,能够有效降低电路板组件20发生翘曲及焊点开裂的风险,提高电路板组件20的可靠性。当然,在其他实施例中,M个第二端221c的排布区域的面积还可以小于M个第一端221a的排布区域的面积的其他数值。Exemplarily, the area of the arrangement area of the M second ends 221c is less than or equal to 80% of the area of the arrangement area of the M first ends 221a, that is, the size of the packaged
另一种实施方式中,可以先形成转接层,然后将转接层通过键合、热压等工艺形成于电路板的安装面上。In another embodiment, the transfer layer may be formed first, and then the transfer layer may be formed on the mounting surface of the circuit board through processes such as bonding and hot pressing.
S120:将封装芯片23固定至转接层22背向电路板21的一侧并与第二端221c电连接。S120 : Fix the packaged
具体的,如图11,本实施例中,封装芯片23为多个芯片231集成于封装基板233形成的芯片231结构。封装芯片23包括芯片231、芯片转接层232、封装基板233和锡球234。芯片231通过芯片转接层232安装于封装基板233,也就是说,封装基板233、芯片转接层232和芯片231依次堆叠。其中,芯片231的数量可以是一个或多个。封装基板233上还可以设置其他电子元器件。封装基板233包括背向芯片231的导接面2331,第二焊盘235设于导接面2331,锡球234设于封装基板233的导接面2331并与第二焊盘235导接。Specifically, as shown in FIG. 11 , in this embodiment, the packaged
将封装芯片23固定至转接层22背向电路板21的一侧具体为,将封装芯片23设于转接层22背向电路板21的表面,封装芯片23的锡球234和第二端221c一一对应接触,然后通过回流焊工艺将封装芯片23的锡球234和第二端221c焊接固定,以使锡球234与第二端221c电连接,实现封装基板233与转接层22之间的电连接,以形成电路板组件20。Fixing the packaged
本实施例中,转接层22的热膨胀系数小于电路板21的热膨胀系数且大于封装芯片23的热膨胀系数。可以理解的是,由于电路板21的热膨胀系数和封装芯片23的热膨胀系数之间的差异比较大。例如,电路板21的热膨胀系数为20ppm左右,封装芯片23的热膨胀系数在10ppm~15ppm之间。In this embodiment, the thermal expansion coefficient of the
在此情况下,将电路板21和封装芯片23之间设置热膨胀系数位于两者之间的转接层22,转接层22的热膨胀系在15ppm~20ppm之间。由于转接层22的热膨胀系数与电路板21的热 膨胀系数差异不大,转接层22的热膨胀系数和封装芯片23的热膨胀系数差异也不大,转接层22缓冲了电路板21和封装芯片23之间的热膨胀系数差异,能有效降低转接层22分别与电路板21和封装芯片23之间发生失配的风险,即降低电路板21与封装芯片23的失配风险,降低电路板组件20发生翘曲及焊点开裂的风险,提高电路板组件20的可靠性。In this case, a
当然,在其他实施例中,封装芯片还可以是单个芯片,当封装芯片为单个芯片时,单个芯片电连接至第二端。或者,封装芯片还可以包括芯片、封装基板和锡球。也就是说,芯片和封装基板之间还可以不设置芯片转接层。或者,封装芯片还可以通过除锡球以外的其他导电结构实现与转接层之间的电连接。或者,封装基板和转接层之间还填充有缓冲层。或者,封装基板的焊盘之间与转接层的第二端通过键合、共晶等方式固定连接。Of course, in other embodiments, the packaged chip may also be a single chip, and when the packaged chip is a single chip, the single chip is electrically connected to the second end. Alternatively, the packaged chip may further include a chip, a package substrate and solder balls. That is to say, a chip transfer layer may not be provided between the chip and the package substrate. Alternatively, the packaged chip may also be electrically connected to the via layer through other conductive structures other than solder balls. Alternatively, a buffer layer is also filled between the package substrate and the transfer layer. Alternatively, the bonding pads of the package substrate and the second end of the transfer layer are fixedly connected by means of bonding, eutectic or the like.
本实施例提供的制造方法通过在电路板21和封装芯片23之间形成转接层22,转接层22与电路板21电连接的M个第二端221c的排布区域的面积小于转接层22与封装芯片23电连接的M个第一端221a的排布区域的面积,可以理解的是,转接层22为扇入型转接层,即扇入型转接层22实现了电路板21至封装芯片23的扇入,相比于封装芯片23直接固定于电路板21,通过转接层22固定于电路板21上的封装芯片23的尺寸可以做得更小,从而电路板组件20在封装、焊接等加工过程中发生翘曲及焊点开裂的风险更小,提高电路板组件20的可靠性。同时,封装芯片23的尺寸缩小,可增加其他元器件在电路板21上的布局面积,或能够缩小电路板21的尺寸,有利于电路板组件20的小型化。In the manufacturing method provided in this embodiment, the
请参阅图12,图12是本申请实施例提供的另一种电路板组件的制造方法的流程示意图。该制造方法用于制造如图7所示的电路板组件,如图12所示,电路板组件的制造方法包括如下的S210~S220。Please refer to FIG. 12 . FIG. 12 is a schematic flowchart of another method for manufacturing a circuit board assembly provided by an embodiment of the present application. The manufacturing method is used to manufacture the circuit board assembly shown in FIG. 7 . As shown in FIG. 12 , the manufacturing method of the circuit board assembly includes the following S210 to S220 .
S210:在电路板21的安装面211形成转接层22。S210 : forming a
具体的,本步骤和步骤S110相同,请参阅S110,在此不再赘述。Specifically, this step is the same as step S110, please refer to S110, and details are not repeated here.
S220:将封装芯片23固定至转接层22背向电路板21的一侧并与第二端221c电连接。S220: Fix the packaged
具体的,如图13,本实施例中,封装芯片23为多个芯片231集成于封装基板233形成的芯片231结构。封装芯片23包括芯片231、芯片转接层232和封装基板233。芯片231通过芯片转接层232安装于封装基板233,也就是说,封装基板233、芯片转接层232和芯片231依次堆叠。其中,芯片231的数量可以是一个或多个。封装基板233上还可以设置其他电子元器件。封装基板233包括背向芯片231的导接面2331,第二焊盘235设于导接面2331。Specifically, as shown in FIG. 13 , in this embodiment, the packaged
将封装芯片23固定至转接层22背向电路板21的一侧具体为:首先,在转接层22背向电路板21的一侧形成与第二端221c导接的导接层24;形成导接层24的方法具体为,在转接层22背向电路板21的一侧形成第二缓冲基层,在第二缓冲基层上形成露出第二端221c的第二开口(图未示),形成缓冲层241;在第二开口内形成与第二端221c导接的导电介质242,导电介质242露出缓冲层241;然后,将封装芯片23与导接层24键合固定,也就是,封装芯片23的第二焊盘235与对应的导接层24的导电介质242键合固定,以实现封装芯片23与导接层24之间的电连接,形成电路板组件20。Fixing the packaged
本实施例中通过导接层24将封装芯片23和转接层22连接形成一体结构,相比于通过锡球连接,可靠性和应力均增强,有效降低电路板组件20发生翘曲和焊点开裂的风险。In this embodiment, the
具体的,缓冲层241采用绝缘材料,例如聚丙烯(Polypropylene,PP)、聚酰亚胺(Polyimide,PI)等介质材料。缓冲层241可以是液态涂覆后常温或高温或UV固化,也可以是膜材压合。缓冲层241具有低热膨胀系数和高弹性,其热膨胀系数小于或等于15ppm,弹性模量大于或等于200MPa,在制造电路板组件20过程的一些工艺中缓冲层241能够有效缓冲热、机应力, 降低电路板组件20发生翘曲及焊点开裂的风险。Specifically, the
导电介质242采用包括但限于铜、银、锡等纯金属或金属混合物材料,或者金属与非金属的混合物材料。导电介质242的形状可以是球状、柱状、针状、锥状等。本实施例中导电介质242的尺寸相对于图2所示的锡球234的尺寸更小,能在一定程度上缩短封装芯片23和电路板21之间的链路长度,提高信号质量,还能起到降低电路板组件20发生翘曲和焊点开裂的风险。The
当然,在其他实施例中,也可以在封装芯片上形成导接层,然后再将导接层与转接层键合固定,也就是,导接层的导接介质与对应的第二端键合固定,以实现封装芯片与转接层之间的电连接。Of course, in other embodiments, a conductive layer may also be formed on the packaged chip, and then the conductive layer and the transfer layer are bonded and fixed, that is, the conductive medium of the conductive layer and the corresponding second terminal key to realize the electrical connection between the packaged chip and the transfer layer.
本实施例中,转接层22的热膨胀系数小于电路板21的热膨胀系数且大于封装芯片23的热膨胀系数。可以理解的是,由于电路板21的热膨胀系数和封装芯片23的热膨胀系数之间的差异比较大。例如,电路板21的热膨胀系数为20ppm左右,封装芯片23的热膨胀系数在10ppm~15ppm之间。In this embodiment, the thermal expansion coefficient of the
在此情况下,将电路板21和封装芯片23之间设置热膨胀系数位于两者之间的转接层22,转接层22的热膨胀系在15ppm~20ppm之间。由于转接层22的热膨胀系数与电路板21的热膨胀系数差异不大,转接层22的热膨胀系数和封装芯片23的热膨胀系数差异也不大,转接层22缓冲了电路板21和封装芯片23之间的热膨胀系数差异,能有效降低转接层22分别与电路板21和封装芯片23之间发生失配的风险,即降低电路板21与封装芯片23的失配风险,降低电路板组件20发生翘曲及焊点开裂的风险,提高电路板组件20的可靠性。In this case, a
当然,在其他实施例中,封装芯片还可以是单个芯片,当封装芯片为单个芯片时,单个芯片电连接至第二端。或者,封装芯片还可以包括芯片和封装基板。也就是说,芯片和封装基板之间还可以不设置芯片转接层。或者,封装芯片还可以通过除锡球等其他导电结构实现与第二端之间的电连接。或者,封装基板和扇入粘接层之间还填充有缓冲层。Of course, in other embodiments, the packaged chip may also be a single chip, and when the packaged chip is a single chip, the single chip is electrically connected to the second end. Alternatively, the packaged chip may further include a chip and a package substrate. That is to say, a chip transfer layer may not be provided between the chip and the package substrate. Alternatively, the packaged chip may also be electrically connected to the second end through other conductive structures such as solder balls. Alternatively, a buffer layer is also filled between the package substrate and the fan-in adhesive layer.
本实施例提供的制造方法通过在电路板21和封装芯片23之间形成转接层22,通过转接层22固定于电路板21上的封装芯片23的尺寸可以做得更小,从而电路板组件20在封装、焊接等加工过程中发生翘曲及焊点开裂的风险更小,提高电路板组件20的可靠性。同时,封装芯片23的尺寸缩小,可增加其他元器件在电路板21上的布局面积,或能够缩小电路板21的尺寸,有利于电路板组件20的小型化。且通过到接触层实现封装芯片23与转接层22之间的连接,将电路板组件20中的多个元件固定成一个封装整体,相比于通过锡球实现连接的方案,可靠性和应力均增强,有效降低电路板组件20发生翘曲和焊点开裂的风险。In the manufacturing method provided by this embodiment, the
请参阅图14,图14是本申请实施例提供的另一种电路板组件的制造方法的流程示意图。该制造方法用于制造如图8所示的电路板组件。如图14所示电路板的制造方法包括如下的S310~S320。Please refer to FIG. 14. FIG. 14 is a schematic flowchart of another method for manufacturing a circuit board assembly provided by an embodiment of the present application. This manufacturing method is used to manufacture a circuit board assembly as shown in FIG. 8 . The manufacturing method of the circuit board shown in FIG. 14 includes the following S310 to S320.
S310:在封装芯片23上形成转接层22。S310 : forming the
具体的,如图15,本实施例中,封装芯片23为多个芯片231集成于封装基板233形成的芯片231结构。封装芯片23包括芯片231、芯片转接层232和封装基板233。芯片231通过芯片转接层232安装于封装基板233,也就是说,封装基板233、芯片转接层232和芯片231依次堆叠。其中,芯片231的数量可以是一个或多个。封装基板233上还可以设置其他电子元器件。封装基板233包括背向芯片231的导接面2331,第二焊盘235设于导接面2331。Specifically, as shown in FIG. 15 , in this embodiment, the packaged
在封装芯片23的导接面2331形成转接层22,转接层22的第二端221c与封装芯片23的第二焊盘235电连接。具体的,在封装芯片23的导接面2331形成转接层22包括两种实施 方式。The
一种实施方式中,将转接层22直接做在封装芯片23的导接面2331。具体的,将转接层22做在封装芯片23的导接面2331的操作步骤和将转接层22做在电路板21的操作步骤类似,不在赘述。In one embodiment, the
另一种实施方式中,可以先形成转接层22,然后将转接层22通过键合、热压等工艺形成于封装芯片23的导接面2331,以使转接层22的第二端221c与对应的第二焊盘235电连接。In another embodiment, the
本实施例中,转接层22的结构和S210中的转接层22的结构相同。转接层22的第二端221c与封装芯片23的第二焊盘235电连接,M个第二端221c的排布区域的面积小于M个第一端221a的排布区域的面积,第一端221a用于在后续工艺中与电路板21的第一焊盘212电连接,通过转接层22连接在电路板21和封装芯片23之间,从而封装芯片23尺寸可以做得更小,从而电路板组件20在封装、焊接等加工过程中发生翘曲及焊点开裂的风险更小,提高电路板组件20的可靠性。同时,封装芯片23的尺寸缩小,可增加其他元器件在电路板21上的布局面积,或能够缩小电路板21的尺寸,有利于电路板组件20的小型化。In this embodiment, the structure of the
示例的,第二端221c的排布区域的面积小于或等于第一端221a的排布区域的面积的80%,也就是说,封装芯片23的尺寸可以缩小到80%或更小,当封装芯片23的尺寸缩小至80%或更小时,能够有效降低电路板组件20发生翘曲及焊点开裂的风险,提高电路板组件20的可靠性。当然,在其他实施例中,第二端221c的排布区域的还可以小于第一端221a的排布区域的面积的其他数值。Exemplarily, the area of the arrangement area of the
最后,在转接层22的第一端221a形成导接层24,以便于后续工艺中通过导接层24实现转接层22与电路板21之间的电连接。当然,也可以在转接层22的第一端221a形成锡球。Finally, a
当然,在其他实施例中,封装芯片还可以是单个芯片,当封装芯片为单个芯片时,单个芯片电连接至第二端。或者,封装芯片还可以包括芯片和封装基板。也就是说,芯片和封装基板之间还可以不设置芯片转接层。或者,封装芯片还可以通过除导接层以外的其他导电结构,例如锡球,实现与第二端之间的电连接。Of course, in other embodiments, the packaged chip may also be a single chip, and when the packaged chip is a single chip, the single chip is electrically connected to the second end. Alternatively, the packaged chip may further include a chip and a package substrate. That is to say, a chip transfer layer may not be provided between the chip and the package substrate. Alternatively, the packaged chip may also be electrically connected to the second end through other conductive structures other than the conductive layer, such as solder balls.
S320:将转接层22背向封装芯片23的一侧固定至电路板21,第一端221a与电路板21电连接。S320 : Fix the side of the
具体的,如图15,将导接层24背向封装芯片23的一侧设于电路板21的表面,导接层24的导电介质242和电路板21的第一焊盘212一一对应接触,然后通过键合、共晶等工艺将导电介质242和电路板21的第一焊盘212固定,以使导电介质242实现转接层22与电路板21之间的电连接。Specifically, as shown in FIG. 15 , the side of the
在其他实施例中,扇入转接层和电路板之间还可以通过锡球实现连接,转接层和电路板之间还可以填充缓冲层。或者,转接层还可以通过键合、热压等工艺固定至电路板。In other embodiments, the connection between the fan-in transfer layer and the circuit board may also be achieved by solder balls, and a buffer layer may also be filled between the transfer layer and the circuit board. Alternatively, the transfer layer can also be fixed to the circuit board by bonding, thermal pressing or other processes.
本实施例提供的制造方法通过在电路板21和封装芯片23之间形成转接层22,可以理解的是,转接层22为扇入型转接层,即扇入型转接层22实现了电路板21至封装芯片23的扇入,相比于封装芯片23直接固定于电路板21,通过转接层22固定于电路板21上的封装芯片23的尺寸可以做得更小,从而电路板组件20在封装、焊接等加工过程中发生翘曲及焊点开裂的风险更小,提高电路板组件20的可靠性。同时,封装芯片23的尺寸缩小,可增加其他元器件在电路板21上的布局面积,或能够缩小电路板21的尺寸,有利于电路板组件20的小型化。In the manufacturing method provided in this embodiment, a
请参阅图16,图16是本申请实施例提供的另一种电路板组件的制造方法的流程示意图。 该制造方法用于制造如图9所示的电路板组件。如图16所示电路板组件的制造方法包括如下的S410~S420。Please refer to FIG. 16. FIG. 16 is a schematic flowchart of another method for manufacturing a circuit board assembly provided by an embodiment of the present application. This manufacturing method is used to manufacture a circuit board assembly as shown in FIG. 9 . The manufacturing method of the circuit board assembly shown in FIG. 16 includes the following S410 to S420.
S410:在电路板21的安装面211形成导接层24。S410 : forming the
具体的,请参阅图17,首先制作电路板21,电路板21具体可以通过压合、钻孔、电镀、图形、阻焊和表面处理等工艺形成。电路板21包括安装面211,电路板21的多个第一焊盘212露出安装面211。然后在电路板21的安装面211形成导接层24。Specifically, please refer to FIG. 17 . First, a
形成导接层24的方法具体为,对电路板21进行清洁后,在电路板21的安装面211形成第二缓冲基层,第二缓冲基层可以通过膜材压合、浆料涂布等不同方式形成于安装面211。膜层压合的具体步骤可以为,将膜材叠合于电路板21的安装面211,然后对膜层进行压合,形成第二缓冲基层。浆料涂布的具体步骤可以为,将浆料涂布于电路板21的安装面211,干燥或固化浆料以形成第二缓冲基层。接着对第二缓冲基层进行激光开口,形成露出第一焊盘212的第二开口,形成缓冲层241,接着在第二开口内形成与第一焊盘212导接的导电介质242,导电介质242可以通过导电浆料印刷或打印形成于第二开口内,然后固化形成,导电介质242露出缓冲层241。The method of forming the
具体的,缓冲层241采用绝缘材料,例如聚丙烯(Polypropylene,PP)、聚酰亚胺(Polyimide,PI)等介质材料。缓冲层241可以是液态涂覆后常温或高温或UV固化,也可以是膜材压合。缓冲层241具有低热膨胀系数和高弹性,其热膨胀系数小于或等于15ppm,弹性模量大于或等于200MPa,在制造电路板组件20过程的一些工艺中缓冲层241能够有效缓冲热、机应力,降低电路板组件20发生翘曲及焊点开裂的风险。Specifically, the
导电介质242采用包括但限于铜、银、锡等纯金属或金属混合物材料,或者金属与非金属的混合物材料。导电介质242的形状可以是球状、柱状、针状、锥状等。The
S420:将封装芯片23固定至导接层24背向电路板21的一侧并与导电介质242电连接。S420 : Fix the packaged
具体的,如图17,本实施例中,封装芯片23为多个芯片231集成于封装基板233形成的芯片231结构。封装芯片23包括芯片231、芯片转接层232和封装基板233。芯片231通过芯片转接层232安装于封装基板233,也就是说,封装基板233、芯片转接层232和芯片231依次堆叠。其中,芯片231的数量可以是一个或多个。封装基板233上还可以设置其他电子元器件。封装基板233包括背向芯片231的导接面2331,第二焊盘235设于导接面2331。Specifically, as shown in FIG. 17 , in this embodiment, the packaged
将封装芯片23固定至导接层24背向电路板21的一侧具体为,将封装芯片23设于导接层24背向电路板21的一侧,封装芯片23的第二焊盘235与对应的导电介质242接触,然后通过压合或键合等工艺将封装芯片23与导接层24键合固定,也就是,封装芯片23的第二焊盘235与对应的导接层24的导电介质242键合固定,以实现封装芯片23与导接层24之间的电连接。Fixing the packaged
本实施例中通过导接层24将封装芯片23和转接层22连接形成一体结构,相比于通过锡球连接,可靠性和应力均增强,有效降低电路板组件20发生翘曲和焊点开裂的风险。In this embodiment, the
本实施例中,导接层24的热膨胀系数小于电路板21的热膨胀系数且大于封装芯片23的热膨胀系数。可以理解的是,由于电路板21的热膨胀系数和封装芯片23的热膨胀系数之间的差异比较大。例如,电路板21的热膨胀系数为20ppm左右,封装芯片23的热膨胀系数在10ppm~15ppm之间。In this embodiment, the thermal expansion coefficient of the
在此情况下,将电路板21和封装芯片23之间设置热膨胀系数位于两者之间的导接层24,导接层24的热膨胀系在15ppm~20ppm之间。由于导接层24的热膨胀系数与电路板21的热膨胀系数差异不大,导接层24的热膨胀系数和封装芯片23的热膨胀系数差异也不大,导接 层24缓冲了电路板21和封装芯片23之间的热膨胀系数差异,能有效降低导接层24分别与电路板21和封装芯片23之间发生失配的风险,即降低电路板21与封装芯片23的失配风险,降低电路板组件20发生翘曲及焊点开裂的风险,提高电路板组件20的可靠性。In this case, a
当然,在其他实施例中,封装芯片还可以是单个芯片,当封装芯片为单个芯片时,单个芯片电连接至导电介质。或者,封装芯片还可以包括芯片和封装基板。也就是说,芯片和封装基板之间还可以不设置芯片转接层。Of course, in other embodiments, the packaged chip may also be a single chip, and when the packaged chip is a single chip, the single chip is electrically connected to the conductive medium. Alternatively, the packaged chip may further include a chip and a package substrate. That is to say, a chip transfer layer may not be provided between the chip and the package substrate.
请参阅图18,图18是图17所示的电路板组件的另一种实施方式的具体工艺示意图。Please refer to FIG. 18 , FIG. 18 is a specific process schematic diagram of another implementation manner of the circuit board assembly shown in FIG. 17 .
在本实施方式中,电路板21的制作可以通过内层图形、压合、钻孔、化学铜、电镀铜形成,导电介质242可以通过干膜1、曝光1、显影1、蚀刻、去膜、干膜2、曝光2、显影2、凸点电镀、去膜、阻焊喷印和表面处理等步骤形成。或者,导电介质242可以通过干膜1、曝光1、显影1、蚀刻、阻焊、表面处理、光刻胶/干膜、曝光、显影、凸点金属蒸发或溅射和去胶等工艺形成。然后通过对位,缓冲层241预贴,将封装芯片23设于缓冲层241背向电路板21的一侧,封装芯片23的第二焊盘235与对应的导电介质242接触,然后通过热压共晶等工艺将封装芯片23与导接层24键合固定,也就是,封装芯片23的第二焊盘235与对应的导接层24的导电介质242键合固定,以实现封装芯片23与导接层24之间的电连接。In this embodiment, the
请参阅图19,图19是图17所示的电路板组件的另一种实施方式的具体工艺示意图。Please refer to FIG. 19 . FIG. 19 is a specific process schematic diagram of another implementation manner of the circuit board assembly shown in FIG. 17 .
本实施方式与图18所示的实施方式大致相同,不同在于,本实施方式可以将导电介质242形成于封装芯片23的封装基板233上,首先制作封装基板233(与制作电路板21一样的步骤);接着在封装基板233上形成与封装基板233上第二焊盘235电连接的导电介质242;接着通过芯片231堆叠、对位、热压/键合和塑封等工艺,在封装基板233背向第二焊盘235的一侧堆叠芯片231等器件;然后制作电路板21及在电路板21上形成具有第二开口的缓冲层241,第二开口露出第一焊盘212;最后将封装芯片23上的导电介质242与对应的第二开口中的第一焊盘212接触,通过热压共晶等工艺将导电介质242与对应的第一焊盘212键合固定。This embodiment is substantially the same as the embodiment shown in FIG. 18 , the difference is that the
本申请中的保护范围不限于上述所有实施例,上述所有实施例中的任意组合也在本申请的保护范围内,也就是说,上述描述的多个实施例还可根据实际需要任意组合。The protection scope of the present application is not limited to all the above-mentioned embodiments, and any combination of all the above-mentioned embodiments is also within the protection scope of the present application, that is, the above-described multiple embodiments can also be arbitrarily combined according to actual needs.
以上,仅为本申请的部分实施例和实施方式,本申请的保护范围不局限于此,任何熟知本领域的技术人员在本申请揭露的技术范围内,可轻易想到变化或替换,都应涵盖在本申请的保护范围之内。因此,本申请的保护范围应以权利要求的保护范围为准。The above are only some examples and implementations of the present application, and the protection scope of the present application is not limited thereto. Any person skilled in the art can easily think of changes or replacements within the technical scope disclosed in the present application, and should cover within the scope of protection of this application. Therefore, the protection scope of the present application shall be subject to the protection scope of the claims.
Claims (16)
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| Application Number | Priority Date | Filing Date | Title |
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| CN202110233877.5A CN115020369A (en) | 2021-03-03 | 2021-03-03 | Circuit board assembly, method of manufacturing the same, and electronic apparatus |
| CN202110233877.5 | 2021-03-03 |
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| WO2022184131A1 true WO2022184131A1 (en) | 2022-09-09 |
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| CN114364124B (en) * | 2021-11-24 | 2024-09-24 | 华为技术有限公司 | Board-level architecture, packaging module, electronic device, and manufacturing method of board-level architecture |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102034718A (en) * | 2009-09-23 | 2011-04-27 | 新科金朋有限公司 | Semiconductor device and method of forming open cavity in TSV interposer to contain semiconductor die in WLCSMP |
| CN103681541A (en) * | 2012-09-20 | 2014-03-26 | 台湾积体电路制造股份有限公司 | Wafer Level Embedded Heat Spreader |
| US20180350762A1 (en) * | 2017-05-31 | 2018-12-06 | Futurewei Technologies, Inc. | Merged power pad for improving integrated circuit power delivery |
| CN112397474A (en) * | 2019-08-16 | 2021-02-23 | 矽品精密工业股份有限公司 | Electronic package, combined substrate thereof and manufacturing method |
-
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- 2021-03-03 CN CN202110233877.5A patent/CN115020369A/en active Pending
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- 2022-03-03 WO PCT/CN2022/079026 patent/WO2022184131A1/en not_active Ceased
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102034718A (en) * | 2009-09-23 | 2011-04-27 | 新科金朋有限公司 | Semiconductor device and method of forming open cavity in TSV interposer to contain semiconductor die in WLCSMP |
| CN103681541A (en) * | 2012-09-20 | 2014-03-26 | 台湾积体电路制造股份有限公司 | Wafer Level Embedded Heat Spreader |
| US20180350762A1 (en) * | 2017-05-31 | 2018-12-06 | Futurewei Technologies, Inc. | Merged power pad for improving integrated circuit power delivery |
| CN112397474A (en) * | 2019-08-16 | 2021-02-23 | 矽品精密工业股份有限公司 | Electronic package, combined substrate thereof and manufacturing method |
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