WO2021111909A1 - Boron nitride particles and method for manufacturing same - Google Patents
Boron nitride particles and method for manufacturing same Download PDFInfo
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- WO2021111909A1 WO2021111909A1 PCT/JP2020/043466 JP2020043466W WO2021111909A1 WO 2021111909 A1 WO2021111909 A1 WO 2021111909A1 JP 2020043466 W JP2020043466 W JP 2020043466W WO 2021111909 A1 WO2021111909 A1 WO 2021111909A1
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- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B21/00—Nitrogen; Compounds thereof
- C01B21/06—Binary compounds of nitrogen with metals, with silicon, or with boron, or with carbon, i.e. nitrides; Compounds of nitrogen with more than one metal, silicon or boron
- C01B21/064—Binary compounds of nitrogen with metals, with silicon, or with boron, or with carbon, i.e. nitrides; Compounds of nitrogen with more than one metal, silicon or boron with boron
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- C—CHEMISTRY; METALLURGY
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- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K3/00—Use of inorganic substances as compounding ingredients
- C08K3/38—Boron-containing compounds
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L101/00—Compositions of unspecified macromolecular compounds
Definitions
- the present invention relates to boron nitride particles and a method for producing the same.
- a heat radiating member having high thermal conductivity is used together with such an electronic component.
- boron nitride particles have high thermal conductivity and high insulating properties, and are therefore widely used as fillers in heat radiating members.
- Patent Document 1 is characterized by having an average particle size of 0.01 to 1.0 ⁇ m, an orientation index of 1 to 15, a boron nitride purity of 98.0% by mass or more, and an average circularity of 0.80 or more. Spherical boron nitride fine particles and a method for producing the same are disclosed.
- the boron nitride particles when used as a filler for primary sealing of electronic parts as described above, the boron nitride particles not only have a small average particle size but also have a small average particle size. It is also important that the variation in particle size is small.
- one aspect of the present invention is to obtain boron nitride particles having a small variation in particle size.
- One aspect of the present invention is to introduce a first gas containing borate ester and a second gas containing ammonia into the reactor separately from one end surface of the tubular reactor, and inside the reactor.
- a reaction step of reacting borate ester and ammonia at 750 ° C. or higher to obtain a precursor of boron nitride particles and a heating step of heating the precursor of boron nitride particles at 1000 ° C. or higher to obtain boron nitride particles.
- the first gas is introduced so that the side surface of the reactor is located on an extension line in the first direction for introducing the first gas into the reactor.
- tan ⁇ 1 When the angle formed by the extending direction extending from one end surface to the other end surface of the reactor and the first direction is ⁇ 1 , tan ⁇ 1 may be 1.2 or more. When the angle formed by the extending direction extending from one end surface to the other end surface of the reactor and the second direction is ⁇ 2 , tan ⁇ 2 may be 1.2 or more.
- Another aspect of the present invention is the boron nitride particles having an average particle size of 1 ⁇ m or less and a difference between the 10% cumulative particle size and the 100% cumulative particle size of 5 ⁇ m or less in a volume-based particle size distribution. Is.
- the average circularity of the boron nitride particles may be 0.8 or more.
- Another aspect of the present invention is a resin composition containing a resin and the above-mentioned boron nitride particles.
- boron nitride particles having a small variation in particle size can be obtained.
- FIG. 1 It is a perspective view which shows an example of the reactor used in the manufacturing method of the boron nitride particle which concerns on one Embodiment.
- (A) is a side view of the reactor viewed from the first introduction tube side
- (b) is a side view of the reactor viewed from the second introduction tube side.
- One embodiment of the present invention comprises a reaction step of reacting boric acid ester and ammonia at 750 ° C. or higher to obtain a precursor of boron nitride particles, and heating the precursor of boron nitride particles at 1000 ° C. or higher to obtain boron nitride particles.
- a method for producing boron nitride particles which comprises a heating step for obtaining the particles.
- the first gas containing boric acid ester and the second gas containing ammonia are separately introduced into the reactor.
- FIG. 1 is a perspective view showing an example of a reactor.
- the reactor 1 has, for example, a cylindrical shape in which both ends are open (both ends are open surfaces), and is located between one end surface 1a and the other end surface 1b. It has an internal space S.
- the length of the reactor 1 may be, for example, 1000 mm or more and 1600 mm or less.
- the inner diameter of the reactor 1 may be, for example, 30 mm or more, and may be 100 mm or less.
- Both ends of the reactor 1 are held by the holding member 2 so that the outside and the internal space S of the reactor 1 can be blocked (so that the internal space S can be a closed system if necessary).
- the reactor 1 is installed so that the heating portion H is located in a resistance heating furnace (not shown) in order to heat only a part (hereinafter referred to as “heating portion”) H between both end faces 1a and 1b.
- the length of the heating portion H (the length in the longitudinal direction of the reactor 1) may be, for example, 500 mm or more and 900 mm or less.
- the temperature of the heating unit H may be, for example, 750 ° C. or higher, and may be 1500 ° C. or lower.
- FIG. 2A is a side view of the reactor 1 as viewed from the side of the first introduction pipe 3.
- FIG. 2B is a side view of the reactor 1 as viewed from the side of the second introduction pipe 4.
- the first introduction pipe 3 has, for example, a shape in which a cylindrical tip is bent in a predetermined direction.
- the first introduction pipe 3 extends substantially parallel to the extending direction D extending from one end surface 1a of the reactor 1 to the other end surface 1b (extending direction extending from one end surface 1a toward the other end surface 1b). , It is introduced into the internal space S from the outside of the reactor 1, and at a position in the internal space S where the distance from one end surface 1a is, for example, 10 to 40 mm, the angle formed by the extending direction D of the reactor 1 is It bends and extends in the bending direction d1 where ⁇ 1 is formed.
- the bending direction d1 of the first introduction pipe 3 is defined as a direction perpendicular to the tip surface 3a of the first introduction pipe 3.
- the second introduction pipe 4 has, for example, a shape in which a cylindrical tip is bent in a predetermined direction.
- the second introduction tube 4 is introduced into the internal space S from the outside of the reactor 1 so as to extend substantially parallel to the extending direction D of the reactor 1, and is a distance from one end surface 1a in the internal space S.
- the reactor 1 bends and extends in the bending direction d2 where the angle formed by the extending direction D of the reactor 1 is ⁇ 2.
- the bending direction d1 of the second introduction pipe 4 is defined as a direction perpendicular to the tip surface 4a of the second introduction pipe 4.
- the side surface (side surface along the extension direction D; the same applies hereinafter) 1c of the reactor 1 is located on the extension line of the bending direction d1 of the first introduction pipe 3 (first introduction pipe 3).
- the extension line of the bending direction d1 intersects the side surface 1c of the reactor 1).
- the side surface (side surface along the extending direction D) 1c of the reactor 1 is located on the extension line of the bending direction d2 of the second introduction pipe 4 (of the second introduction pipe 4).
- the angle is such that the extension line of the bending direction d2 intersects the side surface 1c of the reactor 1).
- the first gas containing the borate ester is introduced into the internal space S from the outside of the reactor 1 through the first introduction tube 3, and the second gas containing ammonia is contained separately from the first gas. Gas is introduced into the internal space S from the outside of the reactor 1 through the second introduction pipe 4.
- the first gas is obtained, for example, by passing an inert gas through a liquid boric acid ester.
- the first gas is a gas composed of a boric acid ester and an inert gas.
- the borate ester may be, for example, an alkyl borate ester, preferably trimethyl borate.
- the inert gas include rare gases such as helium, neon and argon, and nitrogen gas.
- the second gas is, for example, a gas composed of ammonia.
- the molar ratio of the amount of ammonia introduced to the amount of boric acid introduced may be, for example, 1 or more and 10 or less.
- the boric acid ester and ammonia introduced into the reactor 1 react in the heated reactor 1 to produce a precursor (white powder) of boron nitride particles.
- a part of the precursor of the generated boron nitride particles adheres to the inside of the reactor 1, but most of the precursors of the boron nitride particles are on the other end surface 1b side of the reactor 1 due to the inert gas or unreacted ammonia gas. It is sent to a collection container (not shown) attached to and collected.
- the reaction time for reacting the boric acid ester with ammonia is preferably 30 seconds or less from the viewpoint of easily reducing the particle size of the obtained boron nitride particles.
- the reaction time is the time during which the borate ester and ammonia stay in the heating portion H of the reactor 1, and is adjusted by the gas flow rate when the first gas and the second gas are introduced and the length of the heating portion H. can do.
- the first introduction pipe 3 since the first introduction pipe 3 is bent in the bending direction d1 at the angle ⁇ 1 as described above, the first gas is also in the extending direction D of the reactor 1. It is introduced in the first introduction direction (first direction) d1 where the angle formed is ⁇ 1.
- the second introduction pipe 4 since the second introduction pipe 4 is bent in the bending direction d2 at the angle ⁇ 2 as described above, the angle formed by the second gas with the extending direction D of the reactor 1 is ⁇ . It is introduced in the second introduction direction (second direction) d2 which becomes 2. That is, the side surface 1c of the reactor 1 is located on the extension line of the first gas introduction direction d1 and on the extension line of the second gas introduction direction d2.
- the first introduction direction d1 is defined as a direction perpendicular to the tip surface 3a of the first introduction pipe 3, similarly to the bending direction d1 of the first introduction pipe 3.
- the second introduction direction d2 is defined as a direction perpendicular to the tip surface 4a of the second introduction pipe 4, similarly to the bending direction d2 of the second introduction pipe 4.
- the angles ⁇ 1 and ⁇ 2 are preferably 50 ° or more, more preferably 60 ° or more, still more preferably 65 ° or more, and particularly preferably 65 ° or more, respectively, from the viewpoint of further reducing the variation in the particle size of the obtained boron nitride particles. It is 70 ° or more.
- the angles ⁇ 1 and ⁇ 2 are each less than 90 ° and may be, for example, 80 ° or less.
- tan ⁇ 1 and tan ⁇ 2 are preferably 1.2 or more, more preferably 1.7, respectively, from the viewpoint of further reducing the variation in the particle size of the obtained boron nitride particles.
- the above is more preferably 2.1 or more, and particularly preferably 2.7 or more.
- tan ⁇ 1 and tan ⁇ 2 may be, for example, 11.4 or less, respectively.
- the precursor of the boron nitride particles obtained in the reaction step is heated at 1000 ° C. or higher to obtain boron nitride particles.
- the heating steps include, for example, a first heating step of heating a precursor of boron nitride particles at 1000 to 1600 ° C. to obtain a first precursor, and a first heating step of heating the first precursor at 1000 to 1600 ° C. It may include a second heating step of obtaining the precursor of 2 and a third heating step of heating the second precursor at 1800 to 2200 ° C. to obtain boron nitride particles.
- the environmental temperature at which the first precursor is placed is once lowered to room temperature (10 to 30 ° C.).
- the first heating step may be omitted and the second heating step and the third heating step may be performed.
- the precursor of the boron nitride particles obtained in the reaction step is placed in another reaction tube (for example, an alumina tube) installed in the resistance heating furnace, and nitrogen gas and ammonia gas are separately charged. Introduce into the reaction tube.
- the gas introduced at this time may be only ammonia gas.
- the flow rates of nitrogen gas and ammonia gas may be appropriately adjusted so that the reaction time becomes a desired value, respectively. For example, the higher the flow rate of nitrogen gas and ammonia gas, the shorter the reaction time.
- reaction tube is heated to 1000 to 1600 ° C.
- the heating time may be, for example, 1 hour or more and 10 hours or less. This gives the first precursor.
- the power of the resistance heating furnace is turned off, the introduction of nitrogen gas and ammonia gas is stopped, and the temperature in the reaction tube is lowered to room temperature (10 to 30 ° C.). Allow the precursor to stand.
- the standing time may be, for example, 0.5 hours or more and 96 hours or less.
- nitrogen gas and ammonia gas are reintroduced into the reaction tube, and the reaction tube is heated again to 1000 to 1600 ° C.
- Examples of the flow rates of nitrogen gas and ammonia gas, and the heating time may be the same as those described in the first heating step.
- the conditions of the first heating step and the conditions of the second heating step may be the same as each other or may be different from each other. This gives a second precursor.
- the second precursor obtained in the second heating step is placed in a boron nitride rutsubo and heated to 1800 to 2200 ° C. in an induction heating furnace under a nitrogen atmosphere.
- the heating time may be, for example, 0.5 hours or more, and may be 10 hours or less. As a result, boron nitride particles are obtained.
- the average particle size is 1 ⁇ m or less, and the difference between the 10% cumulative particle size and the 100% cumulative particle size is 10 ⁇ m or less. Is obtained. That is, in another embodiment of the present invention, in the volume-based particle size distribution, the average particle size is 1 ⁇ m or less, and the difference between the 10% cumulative particle size (D10) and the 100% cumulative particle size (D100). (D100-D10) is a boron nitride particle having a size of 10 ⁇ m or less.
- the average particle size of the boron nitride particles is preferably 0.9 ⁇ m or less, 0.8 ⁇ m or less, or 0.9 ⁇ m or less from the viewpoint of lowering the dielectric constant of the heat radiating member containing the boron nitride particles (hereinafter, also simply referred to as “heat radiating member”). It may be 0.7 ⁇ m or less.
- the average particle size of the boron nitride particles is preferably 0.01 ⁇ m or more, 0.05 ⁇ m or more, 0.1 ⁇ m or more, 0.2 ⁇ m or more from the viewpoint of suppressing an increase in viscosity when the boron nitride particles and the resin are mixed. , 0.3 ⁇ m or more, or 0.4 ⁇ m or more.
- Boron nitride particles D100-D10 are preferably 5 ⁇ m or less, 4 ⁇ m or less, or 5 ⁇ m or less, from the viewpoint that the dielectric constant of the heat radiating member is lowered and the variation in particle size is suppressed, which is suitable for the primary sealing of electronic components. It may be 3 ⁇ m or less.
- the D100-D10 of the boron nitride particles may be, for example, 0.5 ⁇ m or more, 0.8 ⁇ m or more, or 1 ⁇ m or more.
- the average particle size and D100-D10 of the boron nitride particles are measured by the following procedure. Distilled water is used as a dispersion medium for dispersing the boron nitride particles, and sodium hexametaphosphate is used as a dispersant to prepare a 0.125 mass% sodium hexametaphosphate aqueous solution. Boron nitride particles are added to this aqueous solution at a ratio of 0.1 g / 80 mL, and ultrasonic dispersion is performed with an ultrasonic homogenizer (for example, manufactured by Nippon Seiki Seisakusho Co., Ltd., trade name: US-300E) at 80% AMPLITUDE (amplitude).
- an ultrasonic homogenizer for example, manufactured by Nippon Seiki Seisakusho Co., Ltd., trade name: US-300E
- a dispersion of boron nitride particles is prepared by performing this once every 1 minute and 30 seconds. This dispersion is separated while stirring at 60 rpm, and the volume-based particle size distribution is measured by a laser diffraction / scattering method particle size distribution measuring device (for example, manufactured by Beckman Coulter, trade name: LS-13 320). At this time, 1.33 is used as the refractive index of water, and 1.7 is used as the refractive index of the boron nitride particles. From the measurement results, the average particle size is calculated as the particle size (median diameter, d50) of the cumulative value of the cumulative particle size distribution of 50%, and the particle size of the cumulative value of the cumulative particle size distribution is 100%. D100-D10 is calculated as the value obtained by subtracting D10.
- Boron nitride particles preferably have a spherical shape or a shape close to a spherical shape from the viewpoint of improving the filling property when manufacturing the heat radiating member and making the characteristics (thermal conductivity, dielectric constant, etc.) of the heat radiating member isotropic. have. From the same viewpoint, the average circularity of the boron nitride particles may be preferably 0.8 or more, 0.82 or more, 0.84 or more, 0.86 or more, or 0.88 or more.
- the average circularity of the boron nitride particles is measured by the following procedure.
- Image analysis software for example, manufactured by Mountech, trade name: MacView
- SEM scanning electron microscope
- the projected area (S) and the peripheral length (L) of the boron nitride particles are calculated by image analysis using.
- Circularity 4 ⁇ S / L 2 Calculate the circularity according to.
- the average value of the circularity obtained for 100 arbitrarily selected boron nitride particles is defined as the average circularity.
- the boron nitride particles described above are suitably used for, for example, a heat radiating member.
- a heat radiating member having a low dielectric constant can be obtained.
- the boron nitride particles are used, for example, as a resin composition mixed with a resin. That is, another embodiment of the present invention is a resin composition containing the resin and the above-mentioned boron nitride particles.
- the content of the above-mentioned boron nitride particles is preferably 30% by volume or more, based on the total volume of the resin composition, from the viewpoint of improving the thermal conductivity of the resin composition and easily obtaining excellent heat dissipation performance. It is preferably 40% by volume or more, more preferably 50% by volume or more, and preferably 85% by volume or less, more preferably 85% by volume or less, from the viewpoint of suppressing the generation of voids during molding and the decrease in insulating property and mechanical strength. It is 80% by volume or less, more preferably 70% by volume or less.
- the resin examples include epoxy resin, silicone resin, silicone rubber, acrylic resin, phenol resin, melamine resin, urea resin, unsaturated polyester, fluororesin, polyolefin (polyethylene, etc.), polyimide, polyamideimide, polyetherimide, and poly.
- the content of the resin may be 15% by volume or more, 20% by volume or more, or 30% by volume or more, based on the total volume of the resin composition, and is 70% by volume or less, 60% by volume or less, or 50% by volume. It may be:
- the resin composition may further contain a curing agent that cures the resin.
- the curing agent is appropriately selected depending on the type of resin.
- examples of the curing agent include phenol novolac compounds, acid anhydrides, amino compounds, and imidazole compounds.
- the content of the curing agent may be, for example, 0.5 parts by mass or more or 1.0 part by mass or more, and may be 15 parts by mass or less or 10 parts by mass or less with respect to 100 parts by mass of the resin.
- the resin composition may further contain boron nitride particles other than the above-mentioned boron nitride particles (for example, known boron nitride particles such as massive boron nitride particles formed by aggregating scaly primary particles).
- boron nitride particles other than the above-mentioned boron nitride particles (for example, known boron nitride particles such as massive boron nitride particles formed by aggregating scaly primary particles).
- Boron nitride particles were prepared by the following procedure. First, in the reaction step, a cylindrical reactor (quartz tube, reactor length: 1300 mm, reactor inner diameter: 75 mm, located in the resistance heating furnace) installed in the resistance heating furnace as shown in FIG. The length of the portion to be heated: 800 mm) was heated to raise the temperature to 1150 ° C. On the other hand, the first gas obtained by passing nitrogen gas through trimethyl borate was introduced into the reactor from the first introduction tube. On the other hand, ammonia gas was introduced directly into the reactor.
- the distance from one end surface of the reactor is 25 mm, and the angle formed by the extending direction of the reactor is ⁇ 1, respectively.
- the one bent in the bending direction of ⁇ 2 was provided.
- the first gas and the second gas are arranged so that the angles formed by the introduction direction and the second introduction direction of the first introduction gas and the extension direction of the reactor are ⁇ 1 and ⁇ 2 , respectively. Introduced. Note that ⁇ 1 and ⁇ 2 were set so that tan ⁇ 1 and tan ⁇ 2 had the values shown in Table 1, respectively.
- the molar ratio of the amount of ammonia introduced to the amount of trimethyl borate introduced was 4.5.
- trimethyl borate was reacted with ammonia to obtain a precursor (white powder) of boron nitride particles.
- the reaction time was 10 seconds.
- the precursor of the boron nitride particles obtained in the reaction step is placed in another reaction tube (alumina tube) installed in the resistance heating furnace, and nitrogen gas and ammonia gas are separately charged at 10 L. It was introduced into the reaction tube at a flow rate of / min and 15 L / min. Then, the reaction tube was heated at 1500 ° C. for 2.5 hours. As a result, a first precursor was obtained (first heating step).
- alumina tube alumina tube
- the power of the resistance heating furnace was turned off, the introduction of nitrogen gas and ammonia gas was stopped, and the first precursor was allowed to stand for 2 hours in a state where the temperature in the reaction tube was lowered to 25 ° C.
- the second precursor obtained in the second heating step was placed in a boron nitride crucible and heated in an induction heating furnace at 2000 ° C. for 5 hours in a nitrogen atmosphere. As a result, boron nitride particles were obtained.
- Distilled water was used as a dispersion medium for dispersing the boron nitride particles, and sodium hexametaphosphate was used as a dispersant to prepare a 0.125 mass% sodium hexametaphosphate aqueous solution.
- Boron nitride particles are added to this aqueous solution at a ratio of 0.1 g / 80 mL, and ultrasonic dispersion is performed with an ultrasonic homogenizer (manufactured by Nippon Seiki Seisakusho, trade name: US-300E) at 80% AMPLITUDE (amplitude).
- a dispersion of boron nitride particles was prepared by performing this once every 1 minute and 30 seconds. This dispersion was separated while stirring at 60 rpm, and the volume-based particle size distribution was measured with a laser diffraction / scattering method particle size distribution measuring device (manufactured by Beckman Coulter, trade name: LS-13 320). At this time, 1.33 was used as the refractive index of water, and 1.7 was used as the refractive index of the boron nitride particles. From the measurement results, the average particle size is calculated as the particle size (median diameter, d50) of the cumulative value of the cumulative particle size distribution of 50%, and the particle size of the cumulative value of the cumulative particle size distribution is 100%. D100-D10 was calculated as the value obtained by subtracting D10.
- the dielectric constant of each of the obtained boron nitride particles was measured by the following method. The results are shown in Table 1. Boron nitride particles are kneaded with polyethylene (manufactured by Japan Polyethylene Corporation, trade name "Novatec HY540") in an amount that makes the amount of boron nitride particles 20% by volume, and sheet molding is performed to obtain a 0.2 mm thick sheet. Got Kneading and sheet forming were carried out using a twin-screw extruder under the condition of a temperature of 180 ° C. Using a measuring device of the cavity resonator method, the sheet obtained under the conditions of a frequency of 36 GHz and a temperature of 25 ° C. was measured, and the dielectric constant of the sheet was determined.
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Abstract
Description
本発明は、窒化ホウ素粒子及びその製造方法に関する。 The present invention relates to boron nitride particles and a method for producing the same.
トランジスタ、サイリスタ、CPU等の電子部品においては、使用時に発生する熱を効率良く放熱することが重要な問題となっている。そのため、このような電子部品と共に、高い熱伝導性を有する放熱部材が用いられる。一方、窒化ホウ素粒子は、高熱伝導性及び高絶縁性を有しているため、放熱部材における充填材として幅広く利用されている。 In electronic components such as transistors, thyristors, and CPUs, it is an important issue to efficiently dissipate heat generated during use. Therefore, a heat radiating member having high thermal conductivity is used together with such an electronic component. On the other hand, boron nitride particles have high thermal conductivity and high insulating properties, and are therefore widely used as fillers in heat radiating members.
例えば、窒化ホウ素粒子が電子部品を一次封止する際の充填材として用いられる場合、電子部品周辺の狭い隙間にも窒化ホウ素粒子が入り込めるように、比較的小さな粒子径を有する窒化ホウ素粒子が好適である。例えば特許文献1には、平均粒子径0.01~1.0μm、配向性指数1~15、窒化ホウ素純度98.0質量%以上、及び平均円形度0.80以上であることを特徴とする球状窒化ホウ素微粒子、及びその製造方法が開示されている。
For example, when boron nitride particles are used as a filler for primary sealing an electronic component, boron nitride particles having a relatively small particle diameter are preferable so that the boron nitride particles can enter even in a narrow gap around the electronic component. Is. For example,
本発明者らの検討によれば、窒化ホウ素粒子が、上述したように電子部品を一次封止する際の充填材として用いられる場合、窒化ホウ素粒子においては、平均粒子径が小さいだけでなく、粒子径のばらつきが小さいことも重要である。 According to the study by the present inventors, when the boron nitride particles are used as a filler for primary sealing of electronic parts as described above, the boron nitride particles not only have a small average particle size but also have a small average particle size. It is also important that the variation in particle size is small.
そこで、本発明の一側面は、粒子径のばらつきが小さい窒化ホウ素粒子を得ることを目的とする。 Therefore, one aspect of the present invention is to obtain boron nitride particles having a small variation in particle size.
本発明者らが検討したところ、ホウ酸エステル及びアンモニアから窒化ホウ素粒子を得る製造方法において、得られる窒化ホウ素粒子の粒子径のばらつきを低減させるためには、ホウ酸エステルを含むガス及びアンモニアを含むガスの反応器への導入方法が重要であることが見出された。 As examined by the present inventors, in the production method for obtaining boron nitride particles from boric acid ester and ammonia, in order to reduce the variation in the particle size of the obtained boron nitride particles, a gas containing boric acid ester and ammonia are used. It has been found that the method of introducing the contained gas into the reactor is important.
本発明の一側面は、ホウ酸エステルを含む第1のガスと、アンモニアを含む第2のガスとを、筒状の反応器の一端面からそれぞれ別個に反応器内に導入し、反応器内において、ホウ酸エステル及びアンモニアを750℃以上で反応させて窒化ホウ素粒子の前駆体を得る反応工程と、窒化ホウ素粒子の前駆体を1000℃以上で加熱して窒化ホウ素粒子を得る加熱工程と、を備える窒化ホウ素粒子の製造方法であって、反応工程において、第1のガスを反応器内に導入する第1の方向の延長線上に反応器の側面が位置するように、第1のガスを反応器内に導入すると共に、第2のガスを反応器内に導入する第2の方向の延長線上に反応器の側面が位置するように、第2のガスを反応器内に導入する、製造方法である。 One aspect of the present invention is to introduce a first gas containing borate ester and a second gas containing ammonia into the reactor separately from one end surface of the tubular reactor, and inside the reactor. In the above, a reaction step of reacting borate ester and ammonia at 750 ° C. or higher to obtain a precursor of boron nitride particles, and a heating step of heating the precursor of boron nitride particles at 1000 ° C. or higher to obtain boron nitride particles. In the reaction step, the first gas is introduced so that the side surface of the reactor is located on an extension line in the first direction for introducing the first gas into the reactor. Manufacture in which the second gas is introduced into the reactor so that the side surface of the reactor is located on the extension line of the second direction in which the second gas is introduced into the reactor while being introduced into the reactor. The method.
反応器の一端面から他端面へ延びる延在方向と第1の方向とのなす角度をθ1としたときに、tanθ1は1.2以上であってよい。反応器の一端面から他端面へ延びる延在方向と第2の方向とのなす角度をθ2としたときに、tanθ2は1.2以上であってよい。 When the angle formed by the extending direction extending from one end surface to the other end surface of the reactor and the first direction is θ 1 , tan θ 1 may be 1.2 or more. When the angle formed by the extending direction extending from one end surface to the other end surface of the reactor and the second direction is θ 2 , tan θ 2 may be 1.2 or more.
本発明の他の一側面は、体積基準の粒度分布において、平均粒子径が1μm以下であり、かつ、10%累積粒子径と100%累積粒子径との差が5μm以下である、窒化ホウ素粒子である。 Another aspect of the present invention is the boron nitride particles having an average particle size of 1 μm or less and a difference between the 10% cumulative particle size and the 100% cumulative particle size of 5 μm or less in a volume-based particle size distribution. Is.
窒化ホウ素粒子の平均円形度は、0.8以上であってよい。 The average circularity of the boron nitride particles may be 0.8 or more.
本発明の他の一側面は、樹脂と、上記の窒化ホウ素粒子と、を含有する樹脂組成物である。 Another aspect of the present invention is a resin composition containing a resin and the above-mentioned boron nitride particles.
本発明の一側面によれば、粒子径のばらつきが小さい窒化ホウ素粒子を得ることができる。 According to one aspect of the present invention, boron nitride particles having a small variation in particle size can be obtained.
本発明の一実施形態は、ホウ酸エステルとアンモニアとを750℃以上で反応させて窒化ホウ素粒子の前駆体を得る反応工程と、窒化ホウ素粒子の前駆体を1000℃以上で加熱して窒化ホウ素粒子を得る加熱工程と、を備える、窒化ホウ素粒子の製造方法である。 One embodiment of the present invention comprises a reaction step of reacting boric acid ester and ammonia at 750 ° C. or higher to obtain a precursor of boron nitride particles, and heating the precursor of boron nitride particles at 1000 ° C. or higher to obtain boron nitride particles. A method for producing boron nitride particles, which comprises a heating step for obtaining the particles.
反応工程では、ホウ酸エステルを含む第1のガスと、アンモニアを含む第2のガスとをそれぞれ別個に反応器内に導入する。 In the reaction step, the first gas containing boric acid ester and the second gas containing ammonia are separately introduced into the reactor.
図1は、反応器の一例を示す斜視図である。図1に示すように、反応器1は、例えば、両端がそれぞれ開口している(両端面が開口面である)円筒状となっており、一端面1aと他端面1bとの間に位置する内部空間Sを有している。反応器1の長さは、例えば、1000mm以上であってよく、1600mm以下であってよい。反応器1の内径は、例えば、30mm以上であってよく、100mm以下であってよい。
FIG. 1 is a perspective view showing an example of a reactor. As shown in FIG. 1, the
反応器1の両端は、反応器1の外部と内部空間Sとを遮断可能なように(必要に応じて内部空間Sを閉鎖系にできるように)、その両端がそれぞれ保持部材2に保持されている。反応器1は、その両端面1a,1b間の一部(以下「加熱部」という)Hのみを加熱するために、加熱部Hが抵抗加熱炉(図示せず)内に位置するように設置されている。加熱部Hの長さ(反応器1の長手方向の長さ)は、例えば、500mm以上であってよく、900mm以下であってよい。反応器1の加熱部Hが加熱されることにより、加熱部Hにおいて、ホウ酸エステルとアンモニアとが反応する。加熱部Hの温度は、例えば、750℃以上であってよく、1500℃以下であってよい。
Both ends of the
反応器1の一端面1aには、反応器1の外部から内部空間Sへガスを導入可能なように、第1の導入管3及び第2の導入管4がそれぞれ別個に取り付けられている。図2(a)は、反応器1を第1の導入管3側から見た側面図である。図2(b)は、反応器1を第2の導入管4側から見た側面図である。
A
図1及び図2(a)に示すように、第1の導入管3は、例えば、円筒状の先端が所定の方向に折れ曲がった形状をしている。第1の導入管3は、反応器1の一端面1aから他端面1bへ延びる延在方向(一端面1aを起点として他端面1bへ向けて延びる延在方向)Dと略平行に延びるように、反応器1の外部から内部空間Sへ導入されると共に、内部空間S内において、一端面1aからの距離が例えば10~40mmの位置で、反応器1の延在方向Dとのなす角度がθ1となる折り曲げ方向d1へ向かって折れ曲がって延びている。第1の導入管3の折り曲げ方向d1は、第1の導入管3の先端面3aに垂直な方向として定義される。
As shown in FIGS. 1 and 2A, the
図1及び図2(b)に示すように、第2の導入管4は、例えば、円筒状の先端が所定の方向に折れ曲がった形状をしている。第2の導入管4は、反応器1の延在方向Dと略平行に延びるように反応器1の外部から内部空間Sへ導入されると共に、内部空間S内において、一端面1aからの距離が例えば10~40mmの位置で、反応器1の延在方向Dとのなす角がθ2となる折り曲げ方向d2へ向かって折れ曲がって延びている。第2の導入管4の折り曲げ方向d1は、第2の導入管4の先端面4aに垂直な方向として定義される。
As shown in FIGS. 1 and 2B, the
上記角度θ1は、第1の導入管3の折り曲げ方向d1の延長線上に反応器1の側面(延在方向Dに沿った側面。以下同様。)1cが位置する(第1の導入管3の折り曲げ方向d1の延長線が反応器1の側面1cに交わる)ような角度である。同様に、上記角度θ2は、第2の導入管4の折り曲げ方向d2の延長線上に反応器1の側面(延在方向Dに沿った側面)1cが位置する(第2の導入管4の折り曲げ方向d2の延長線が反応器1の側面1cに交わる)ような角度である。
At the angle θ 1 , the side surface (side surface along the extension direction D; the same applies hereinafter) 1c of the
反応工程では、ホウ酸エステルを含む第1のガスが第1の導入管3を通じて反応器1の外部から内部空間Sへ導入されると共に、第1のガスとは別個に、アンモニアを含む第2のガスが第2の導入管4を通じて反応器1の外部から内部空間Sへ導入される。
In the reaction step, the first gas containing the borate ester is introduced into the internal space S from the outside of the
第1のガスは、例えば、不活性ガスを液状のホウ酸エステルに通過させることにより得られる。この場合は、第1のガスは、ホウ酸エステル及び不活性ガスからなるガスである。ホウ酸エステルは、例えばアルキルホウ酸エステルであってよく、好ましくはホウ酸トリメチルである。不活性ガスとしては、例えば、ヘリウム、ネオン、アルゴンなどの希ガス、及び窒素ガスが挙げられる。第2のガスは、例えば、アンモニアからなるガスである。 The first gas is obtained, for example, by passing an inert gas through a liquid boric acid ester. In this case, the first gas is a gas composed of a boric acid ester and an inert gas. The borate ester may be, for example, an alkyl borate ester, preferably trimethyl borate. Examples of the inert gas include rare gases such as helium, neon and argon, and nitrogen gas. The second gas is, for example, a gas composed of ammonia.
ホウ酸エステルの導入量に対するアンモニアの導入量のモル比(アンモニア/ホウ酸エステル)は、例えば、1以上であってよく、10以下であってよい。 The molar ratio of the amount of ammonia introduced to the amount of boric acid introduced (ammonia / boric acid ester) may be, for example, 1 or more and 10 or less.
反応器1内に導入されたホウ酸エステル及びアンモニアは、加熱された反応器1内で反応し、窒化ホウ素粒子の前駆体(白色粉末)を生成する。生成した窒化ホウ素粒子の前駆体の一部は反応器1内に付着するが、窒化ホウ素粒子の前駆体の多くは、不活性ガスや未反応のアンモニアガスにより、反応器1の他端面1b側に取り付けられた回収容器(図示せず)に送られて回収される。ホウ酸エステルとアンモニアとを反応させる反応時間は、得られる窒化ホウ素粒子の粒子径を小さくしやすい観点から、好ましくは、30秒間以内である。反応時間は、ホウ酸エステル及びアンモニアが反応器1の加熱部Hにとどまる時間であり、第1のガス及び第2のガスを導入する際のガス流量と、加熱部Hの長さとによって、調整することができる。
The boric acid ester and ammonia introduced into the
以上説明した反応工程において、第1の導入管3が、上述したような角度θ1で折り曲げ方向d1に折り曲がっていることから、第1のガスも、反応器1の延在方向Dとのなす角がθ1となる第1の導入方向(第1の方向)d1へ導入される。同様に、第2の導入管4が、上述したような角度θ2で折り曲げ方向d2に折り曲がっていることから、第2のガスも、反応器1の延在方向Dとのなす角がθ2となる第2の導入方向(第2の方向)d2へ導入される。つまり、第1のガスの導入方向d1の延長線上及び第2のガスの導入方向d2の延長線上には、反応器1の側面1cが位置している。なお、第1の導入方向d1は、第1の導入管3の折り曲げ方向d1と同様に、第1の導入管3の先端面3aに垂直な方向として定義される。第2の導入方向d2は、第2の導入管4の折り曲げ方向d2と同様に、第2の導入管4の先端面4aに垂直な方向として定義される。
In the reaction step described above, since the
このように、第1の導入方向d1へ第1のガスを導入すると共に、第2の導入方向d2へ第2のガスを導入することにより、得られる窒化ホウ素粒子の粒子径のばらつきを低減できる。その理由は定かではないが、第1のガス及び第2のガスをそれぞれ第1の導入方向d1及び第2の導入方向d2に導入することにより、第1のガス及び第2のガスのそれぞれが、反応器1の側面1cにぶつかりながら、反応器1の延在方向Dに対して角度をもって反応器1内を進むため、例えば、第1のガス及び第2のガスを反応器1の延在方向Dと平行に導入する場合に比べて、第1のガス及び第2のガスが互いに均一に混合しやすいことが理由であると推察される。
In this way, by introducing the first gas in the first introduction direction d1 and introducing the second gas in the second introduction direction d2, it is possible to reduce the variation in the particle size of the obtained boron nitride particles. .. The reason is not clear, but by introducing the first gas and the second gas in the first introduction direction d1 and the second introduction direction d2, respectively, the first gas and the second gas can be changed to each other. , While colliding with the
角度θ1及びθ2は、得られる窒化ホウ素粒子の粒子径のばらつきを更に低減できる観点から、それぞれ、好ましくは50°以上、より好ましくは60°以上、更に好ましくは65°以上、特に好ましくは70°以上である。角度θ1及びθ2は、それぞれ、90°未満であり、例えば80°以下であってよい。言い換えれば、角度θ1及びθ2について、tanθ1及びtanθ2は、得られる窒化ホウ素粒子の粒子径のばらつきを更に低減できる観点から、それぞれ、好ましくは1.2以上、より好ましくは1.7以上、更に好ましくは2.1以上、特に好ましくは2.7以上である。tanθ1及びtanθ2は、それぞれ、例えば11.4以下であってよい。 The angles θ 1 and θ 2 are preferably 50 ° or more, more preferably 60 ° or more, still more preferably 65 ° or more, and particularly preferably 65 ° or more, respectively, from the viewpoint of further reducing the variation in the particle size of the obtained boron nitride particles. It is 70 ° or more. The angles θ 1 and θ 2 are each less than 90 ° and may be, for example, 80 ° or less. In other words, with respect to the angles θ 1 and θ 2 , tan θ 1 and tan θ 2 are preferably 1.2 or more, more preferably 1.7, respectively, from the viewpoint of further reducing the variation in the particle size of the obtained boron nitride particles. The above is more preferably 2.1 or more, and particularly preferably 2.7 or more. tan θ 1 and tan θ 2 may be, for example, 11.4 or less, respectively.
加熱工程では、反応工程で得られた窒化ホウ素粒子の前駆体を1000℃以上で加熱して窒化ホウ素粒子を得る。加熱工程は、例えば、窒化ホウ素粒子の前駆体を1000~1600℃で加熱して第1の前駆体を得る第1の加熱工程と、第1の前駆体を1000~1600℃で加熱して第2の前駆体を得る第2の加熱工程と、第2の前駆体を1800~2200℃で加熱して窒化ホウ素粒子を得る第3の加熱工程と、を含んでいてよい。この場合、第1の加熱工程の終了後、第2の加熱工程の開始前に、第1の前駆体が置かれる環境温度を常温(10~30℃)まで一旦下げる。他の一実施形態では、加熱工程において、第1の加熱工程を省略して、第2の加熱工程及び第3の加熱工程を行ってもよい。 In the heating step, the precursor of the boron nitride particles obtained in the reaction step is heated at 1000 ° C. or higher to obtain boron nitride particles. The heating steps include, for example, a first heating step of heating a precursor of boron nitride particles at 1000 to 1600 ° C. to obtain a first precursor, and a first heating step of heating the first precursor at 1000 to 1600 ° C. It may include a second heating step of obtaining the precursor of 2 and a third heating step of heating the second precursor at 1800 to 2200 ° C. to obtain boron nitride particles. In this case, after the completion of the first heating step and before the start of the second heating step, the environmental temperature at which the first precursor is placed is once lowered to room temperature (10 to 30 ° C.). In another embodiment, in the heating step, the first heating step may be omitted and the second heating step and the third heating step may be performed.
第1の加熱工程では、反応工程で得られた窒化ホウ素粒子の前駆体を、抵抗加熱炉内に設置された別の反応管(例えばアルミナ管)に入れ、窒素ガス及びアンモニアガスをそれぞれ別々に反応管内に導入する。このとき導入するガスは、アンモニアガスのみであってもよい。窒素ガス及びアンモニアガスの流量は、それぞれ、反応時間が所望の値となるように適宜調整されればよい。例えば、窒素ガス及びアンモニアガスの流量が多いほど、反応時間が短くなる。 In the first heating step, the precursor of the boron nitride particles obtained in the reaction step is placed in another reaction tube (for example, an alumina tube) installed in the resistance heating furnace, and nitrogen gas and ammonia gas are separately charged. Introduce into the reaction tube. The gas introduced at this time may be only ammonia gas. The flow rates of nitrogen gas and ammonia gas may be appropriately adjusted so that the reaction time becomes a desired value, respectively. For example, the higher the flow rate of nitrogen gas and ammonia gas, the shorter the reaction time.
続いて、反応管を1000~1600℃に加熱する。加熱する時間は、例えば、1時間以上であってよく、10時間以下であってよい。これにより、第1の前駆体が得られる。 Subsequently, the reaction tube is heated to 1000 to 1600 ° C. The heating time may be, for example, 1 hour or more and 10 hours or less. This gives the first precursor.
第1の加熱工程が終了した後、抵抗加熱炉の電源を切り、窒素ガス及びアンモニアガスの導入を停止し、反応管内の温度を常温(10~30℃)まで下げた状態で、第1の前駆体を静置する。静置する時間は、例えば、0.5時間以上であってよく、96時間以下であってよい。 After the first heating step is completed, the power of the resistance heating furnace is turned off, the introduction of nitrogen gas and ammonia gas is stopped, and the temperature in the reaction tube is lowered to room temperature (10 to 30 ° C.). Allow the precursor to stand. The standing time may be, for example, 0.5 hours or more and 96 hours or less.
第2の加熱工程では、窒素ガス及びアンモニアガスを反応管内に再び導入すると共に、反応管を1000~1600℃に再び加熱する。窒素ガス及びアンモニアガスの流量、並びに加熱する時間の例は、第1の加熱工程で説明したものと同様であってよい。第1の加熱工程の条件と第2の加熱工程の条件は、互いに同一であってよく、互いに異なっていてもよい。これにより、第2の前駆体が得られる。 In the second heating step, nitrogen gas and ammonia gas are reintroduced into the reaction tube, and the reaction tube is heated again to 1000 to 1600 ° C. Examples of the flow rates of nitrogen gas and ammonia gas, and the heating time may be the same as those described in the first heating step. The conditions of the first heating step and the conditions of the second heating step may be the same as each other or may be different from each other. This gives a second precursor.
第3の加熱工程では、第2の加熱工程で得られた第2の前駆体を窒化ホウ素製ルツボに入れ、誘導加熱炉において、窒素雰囲気下で1800~2200℃に加熱する。加熱する時間は、例えば、0.5時間以上であってよく、10時間以下であってよい。これにより、窒化ホウ素粒子が得られる。 In the third heating step, the second precursor obtained in the second heating step is placed in a boron nitride rutsubo and heated to 1800 to 2200 ° C. in an induction heating furnace under a nitrogen atmosphere. The heating time may be, for example, 0.5 hours or more, and may be 10 hours or less. As a result, boron nitride particles are obtained.
以上説明した製造方法により、例えば、体積基準の粒度分布において、平均粒子径が1μm以下であり、かつ、10%累積粒子径と100%累積粒子径との差が10μm以下である、窒化ホウ素粒子が得られる。すなわち、本発明の他の一実施形態は、体積基準の粒度分布において、平均粒子径が1μm以下であり、かつ、10%累積粒子径(D10)と100%累積粒子径(D100)との差(D100-D10)が10μm以下である、窒化ホウ素粒子である。 According to the manufacturing method described above, for example, in the volume-based particle size distribution, the average particle size is 1 μm or less, and the difference between the 10% cumulative particle size and the 100% cumulative particle size is 10 μm or less. Is obtained. That is, in another embodiment of the present invention, in the volume-based particle size distribution, the average particle size is 1 μm or less, and the difference between the 10% cumulative particle size (D10) and the 100% cumulative particle size (D100). (D100-D10) is a boron nitride particle having a size of 10 μm or less.
窒化ホウ素粒子の平均粒子径は、窒化ホウ素粒子を含む放熱部材(以下、単に「放熱部材」ともいう)の誘電率を低くする観点から、好ましくは、0.9μm以下、0.8μm以下、又は0.7μm以下であってもよい。窒化ホウ素粒子の平均粒子径は、窒化ホウ素粒子と樹脂とを混合した際の粘度増加を抑制できる観点から、好ましくは、0.01μm以上、0.05μm以上、0.1μm以上、0.2μm以上、0.3μm以上、又は0.4μm以上であってもよい。 The average particle size of the boron nitride particles is preferably 0.9 μm or less, 0.8 μm or less, or 0.9 μm or less from the viewpoint of lowering the dielectric constant of the heat radiating member containing the boron nitride particles (hereinafter, also simply referred to as “heat radiating member”). It may be 0.7 μm or less. The average particle size of the boron nitride particles is preferably 0.01 μm or more, 0.05 μm or more, 0.1 μm or more, 0.2 μm or more from the viewpoint of suppressing an increase in viscosity when the boron nitride particles and the resin are mixed. , 0.3 μm or more, or 0.4 μm or more.
窒化ホウ素粒子のD100-D10は、放熱部材の誘電率が低くなると共に、粒子径のばらつきが抑制されて電子部品の一次封止により好適である観点から、好ましくは、5μm以下、4μm以下、又は3μm以下であってもよい。窒化ホウ素粒子のD100-D10は、例えば、0.5μm以上、0.8μm以上、又は1μm以上であってもよい。 Boron nitride particles D100-D10 are preferably 5 μm or less, 4 μm or less, or 5 μm or less, from the viewpoint that the dielectric constant of the heat radiating member is lowered and the variation in particle size is suppressed, which is suitable for the primary sealing of electronic components. It may be 3 μm or less. The D100-D10 of the boron nitride particles may be, for example, 0.5 μm or more, 0.8 μm or more, or 1 μm or more.
窒化ホウ素粒子の平均粒子径及びD100-D10は、以下の手順により測定される。
窒化ホウ素粒子を分散させる分散媒として蒸留水を用い、分散剤としてヘキサメタリン酸ナトリウムを用い、0.125質量%ヘキサメタリン酸ナトリウム水溶液を調製する。この水溶液中に0.1g/80mLの比率で窒化ホウ素粒子を加え、超音波ホモジナイザー(例えば、日本精機製作所製、商品名:US-300E)により、AMPLITUDE(振幅)80%にて超音波分散を1分30秒間で1回行うことで、窒化ホウ素粒子の分散液を調製する。この分散液を60rpmで撹拌しながら分取し、レーザー回折散乱法粒度分布測定装置(例えば、ベックマンコールター社製、商品名:LS-13 320)により体積基準の粒度分布を測定する。このとき、水の屈折率として1.33を用い、窒化ホウ素粒子の屈折率として1.7を用いる。測定結果から、累積粒度分布の累積値50%の粒径(メジアン径、d50)として平均粒子径を算出すると共に、累積粒度分布の累積値100%の粒子径D100から累積値10%の粒子径D10を差し引いた値として、D100-D10を算出する。
The average particle size and D100-D10 of the boron nitride particles are measured by the following procedure.
Distilled water is used as a dispersion medium for dispersing the boron nitride particles, and sodium hexametaphosphate is used as a dispersant to prepare a 0.125 mass% sodium hexametaphosphate aqueous solution. Boron nitride particles are added to this aqueous solution at a ratio of 0.1 g / 80 mL, and ultrasonic dispersion is performed with an ultrasonic homogenizer (for example, manufactured by Nippon Seiki Seisakusho Co., Ltd., trade name: US-300E) at 80% AMPLITUDE (amplitude). A dispersion of boron nitride particles is prepared by performing this once every 1 minute and 30 seconds. This dispersion is separated while stirring at 60 rpm, and the volume-based particle size distribution is measured by a laser diffraction / scattering method particle size distribution measuring device (for example, manufactured by Beckman Coulter, trade name: LS-13 320). At this time, 1.33 is used as the refractive index of water, and 1.7 is used as the refractive index of the boron nitride particles. From the measurement results, the average particle size is calculated as the particle size (median diameter, d50) of the cumulative value of the cumulative particle size distribution of 50%, and the particle size of the cumulative value of the cumulative particle size distribution is 100%. D100-D10 is calculated as the value obtained by subtracting D10.
窒化ホウ素粒子は、放熱部材を作製する際の充填性を向上させ、放熱部材の特性(熱伝導性、誘電率など)を等方的にする観点から、好ましくは、球状、又は球状に近い形状を有している。同様の観点から、窒化ホウ素粒子の平均円形度は、好ましくは、0.8以上、0.82以上、0.84以上、0.86以上、又は0.88以上であってよい。 Boron nitride particles preferably have a spherical shape or a shape close to a spherical shape from the viewpoint of improving the filling property when manufacturing the heat radiating member and making the characteristics (thermal conductivity, dielectric constant, etc.) of the heat radiating member isotropic. have. From the same viewpoint, the average circularity of the boron nitride particles may be preferably 0.8 or more, 0.82 or more, 0.84 or more, 0.86 or more, or 0.88 or more.
窒化ホウ素粒子の平均円形度は、以下の手順で測定される。
走査型電子顕微鏡(SEM)を用いて撮影した窒化ホウ素粒子の像(倍率:10,000倍、画像解像度:1280×1024ピクセル)について、画像解析ソフト(例えば、マウンテック社製、商品名:MacView)を用いた画像解析により、窒化ホウ素粒子の投影面積(S)及び周囲長(L)を算出する。投影面積(S)及び周囲長(L)を用いて、以下に式:
円形度=4πS/L2
に従って円形度を求める。任意に選ばれた100個の窒化ホウ素粒子について求めた円形度の平均値を平均円形度と定義する。
The average circularity of the boron nitride particles is measured by the following procedure.
Image analysis software (for example, manufactured by Mountech, trade name: MacView) for images of boron nitride particles (magnification: 10,000 times, image resolution: 1280 x 1024 pixels) taken with a scanning electron microscope (SEM). The projected area (S) and the peripheral length (L) of the boron nitride particles are calculated by image analysis using. Using the projected area (S) and the perimeter (L), the following equation:
Circularity = 4πS / L 2
Calculate the circularity according to. The average value of the circularity obtained for 100 arbitrarily selected boron nitride particles is defined as the average circularity.
以上説明した窒化ホウ素粒子は、例えば、放熱部材に好適に用いられる。上記の窒化ホウ素粒子を用いることにより、低誘電率の放熱部材が得られる。窒化ホウ素粒子は、放熱部材に用いられる場合、例えば樹脂と共に混合された樹脂組成物として用いられる。すなわち、本発明の他の一実施形態は、樹脂と、上記の窒化ホウ素粒子とを含有する樹脂組成物である。 The boron nitride particles described above are suitably used for, for example, a heat radiating member. By using the above-mentioned boron nitride particles, a heat radiating member having a low dielectric constant can be obtained. When the boron nitride particles are used for a heat radiating member, they are used, for example, as a resin composition mixed with a resin. That is, another embodiment of the present invention is a resin composition containing the resin and the above-mentioned boron nitride particles.
上記の窒化ホウ素粒子の含有量は、樹脂組成物の全体積を基準として、樹脂組成物の熱伝導率を向上させ、優れた放熱性能が得られやすい観点から、好ましくは30体積%以上、より好ましくは40体積%以上であり、更に好ましくは50体積%以上であり、成形時に空隙の発生、並びに、絶縁性及び機械強度の低下を抑制できる観点から、好ましくは85体積%以下、より好ましくは80体積%以下、更に好ましくは70体積%以下である。 The content of the above-mentioned boron nitride particles is preferably 30% by volume or more, based on the total volume of the resin composition, from the viewpoint of improving the thermal conductivity of the resin composition and easily obtaining excellent heat dissipation performance. It is preferably 40% by volume or more, more preferably 50% by volume or more, and preferably 85% by volume or less, more preferably 85% by volume or less, from the viewpoint of suppressing the generation of voids during molding and the decrease in insulating property and mechanical strength. It is 80% by volume or less, more preferably 70% by volume or less.
樹脂としては、例えば、エポキシ樹脂、シリコーン樹脂、シリコーンゴム、アクリル樹脂、フェノール樹脂、メラミン樹脂、ユリア樹脂、不飽和ポリエステル、フッ素樹脂、ポリオレフィン(ポリエチレン等)、ポリイミド、ポリアミドイミド、ポリエーテルイミド、ポリブチレンテレフタレート、ポリエチレンテレフタレート、ポリフェニレンエーテル、ポリフェニレンスルフィド、全芳香族ポリエステル、ポリスルホン、液晶ポリマー、ポリエーテルスルホン、ポリカーボネート、マレイミド変性樹脂、ABS(アクリロニトリル-ブタジエン-スチレン)樹脂、AAS(アクリロニトリル-アクリルゴム・スチレン)樹脂、及びAES(アクリロニトリル・エチレン・プロピレン・ジエンゴム-スチレン)樹脂が挙げられる。 Examples of the resin include epoxy resin, silicone resin, silicone rubber, acrylic resin, phenol resin, melamine resin, urea resin, unsaturated polyester, fluororesin, polyolefin (polyethylene, etc.), polyimide, polyamideimide, polyetherimide, and poly. Butylene terephthalate, polyethylene terephthalate, polyphenylene ether, polyphenylene sulfide, total aromatic polyester, polysulfone, liquid crystal polymer, polyether sulfone, polycarbonate, maleimide-modified resin, ABS (acrylonitrile-butadiene-styrene) resin, AAS (acrylonitrile-acrylic rubber / styrene) ) Resin and AES (acrylonitrile / ethylene / propylene / diene rubber-styrene) resin.
樹脂の含有量は、樹脂組成物の全体積を基準として、15体積%以上、20体積%以上、又は30体積%以上であってよく、70体積%以下、60体積%以下、又は50体積%以下であってよい。 The content of the resin may be 15% by volume or more, 20% by volume or more, or 30% by volume or more, based on the total volume of the resin composition, and is 70% by volume or less, 60% by volume or less, or 50% by volume. It may be:
樹脂組成物は、樹脂を硬化させる硬化剤を更に含有していてよい。硬化剤は、樹脂の種類によって適宜選択される。例えば、樹脂がエポキシ樹脂である場合、硬化剤としては、フェノールノボラック化合物、酸無水物、アミノ化合物、及びイミダゾール化合物が挙げられる。硬化剤の含有量は、樹脂100質量部に対して、例えば、0.5質量部以上又は1.0質量部以上であってよく、15質量部以下又は10質量部以下であってよい。 The resin composition may further contain a curing agent that cures the resin. The curing agent is appropriately selected depending on the type of resin. For example, when the resin is an epoxy resin, examples of the curing agent include phenol novolac compounds, acid anhydrides, amino compounds, and imidazole compounds. The content of the curing agent may be, for example, 0.5 parts by mass or more or 1.0 part by mass or more, and may be 15 parts by mass or less or 10 parts by mass or less with respect to 100 parts by mass of the resin.
樹脂組成物は、上記の窒化ホウ素粒子以外の窒化ホウ素粒子(例えば、鱗片状の一次粒子が凝集してなる塊状窒化ホウ素粒子等の公知の窒化ホウ素粒子)を更に含有してもよい。 The resin composition may further contain boron nitride particles other than the above-mentioned boron nitride particles (for example, known boron nitride particles such as massive boron nitride particles formed by aggregating scaly primary particles).
以下、実施例により本発明をより具体的に説明する。ただし、本発明は下記の実施例に限定されるものではない。 Hereinafter, the present invention will be described in more detail with reference to Examples. However, the present invention is not limited to the following examples.
[製造例1]
以下の手順により、窒化ホウ素粒子を作製した。
まず、反応工程では、抵抗加熱炉内に設置された図1に示すような円筒状の反応器(石英管、反応器の長さ:1300mm、反応器の内径:75mm、抵抗加熱炉内に位置する部分の長さ:800mm)を加熱して、1150℃まで昇温した。一方、窒素ガスをホウ酸トリメチルに通過させることにより得た第1のガスを第1の導入管から反応器内に導入した。他方、アンモニアガスを反応器内に直接導入した。第1の導入管及び第2の導入管としては、反応器の内部空間内において、反応器の一端面からの距離が25mmの位置で、反応器の延在方向とのなす角度がそれぞれθ1及びθ2となる折り曲げ方向へ向かって折れ曲がったものを設けた。言い換えれば、第1の導入ガスの導入方向及び第2の導入方向と反応器の延在方向とのなす角がそれぞれθ1及びθ2となるように、第1のガス及び第2のガスを導入した。なお、θ1及びθ2は、それぞれtanθ1及びtanθ2が表1に示す値となるような角度とした。
[Manufacturing Example 1]
Boron nitride particles were prepared by the following procedure.
First, in the reaction step, a cylindrical reactor (quartz tube, reactor length: 1300 mm, reactor inner diameter: 75 mm, located in the resistance heating furnace) installed in the resistance heating furnace as shown in FIG. The length of the portion to be heated: 800 mm) was heated to raise the temperature to 1150 ° C. On the other hand, the first gas obtained by passing nitrogen gas through trimethyl borate was introduced into the reactor from the first introduction tube. On the other hand, ammonia gas was introduced directly into the reactor. As the first introduction tube and the second introduction tube, in the internal space of the reactor, the distance from one end surface of the reactor is 25 mm, and the angle formed by the extending direction of the reactor is θ 1, respectively. And the one bent in the bending direction of θ 2 was provided. In other words, the first gas and the second gas are arranged so that the angles formed by the introduction direction and the second introduction direction of the first introduction gas and the extension direction of the reactor are θ 1 and θ 2 , respectively. Introduced. Note that θ 1 and θ 2 were set so that tan θ 1 and tan θ 2 had the values shown in Table 1, respectively.
ホウ酸トリメチルの導入量に対するアンモニアの導入量のモル比(アンモニア/ホウ酸トリメチル)は、4.5とした。これにより、ホウ酸トリメチルとアンモニアとを反応させて、窒化ホウ素粒子の前駆体(白色粉末)を得た。なお、反応時間は10秒間とした。 The molar ratio of the amount of ammonia introduced to the amount of trimethyl borate introduced (ammonia / trimethyl borate) was 4.5. As a result, trimethyl borate was reacted with ammonia to obtain a precursor (white powder) of boron nitride particles. The reaction time was 10 seconds.
続いて、加熱工程では、反応工程で得られた窒化ホウ素粒子の前駆体を、抵抗加熱炉内に設置された別の反応管(アルミナ管)に入れ、窒素ガス及びアンモニアガスをそれぞれ別々に10L/分及び15L/分の流量で反応管内に導入した。そして、反応管を1500℃で2.5時間加熱した。これにより、第1の前駆体を得た(第1の加熱工程)。 Subsequently, in the heating step, the precursor of the boron nitride particles obtained in the reaction step is placed in another reaction tube (alumina tube) installed in the resistance heating furnace, and nitrogen gas and ammonia gas are separately charged at 10 L. It was introduced into the reaction tube at a flow rate of / min and 15 L / min. Then, the reaction tube was heated at 1500 ° C. for 2.5 hours. As a result, a first precursor was obtained (first heating step).
続いて、抵抗加熱炉の電源を切り、窒素ガス及びアンモニアガスの導入を停止し、反応管内の温度を25℃まで下げた状態で、第1の前駆体を2時間静置した。 Subsequently, the power of the resistance heating furnace was turned off, the introduction of nitrogen gas and ammonia gas was stopped, and the first precursor was allowed to stand for 2 hours in a state where the temperature in the reaction tube was lowered to 25 ° C.
続いて、第1の加熱工程と同じ条件で窒素ガス及びアンモニアガスの導入及び反応管内の加熱を行った。これにより、第2の前駆体を得た(第2の加熱工程)。 Subsequently, nitrogen gas and ammonia gas were introduced and the inside of the reaction tube was heated under the same conditions as in the first heating step. As a result, a second precursor was obtained (second heating step).
続いて、第2の加熱工程で得られた第2の前駆体を窒化ホウ素製ルツボに入れ、誘導加熱炉において、窒素雰囲気下、2000℃で5時間加熱した。これにより、窒化ホウ素粒子を得た。 Subsequently, the second precursor obtained in the second heating step was placed in a boron nitride crucible and heated in an induction heating furnace at 2000 ° C. for 5 hours in a nitrogen atmosphere. As a result, boron nitride particles were obtained.
[製造例2,3]
第1のガスの導入方向及び第2のガスの導入方向を、tanθ1及びtanθ2が表1に示す値となるような角度θ1及びθ2にそれぞれ変更した以外は、製造例1と同様にして窒化ホウ素粒子を作製した。
[Manufacturing Examples 2 and 3]
Same as in Production Example 1 except that the introduction direction of the first gas and the introduction direction of the second gas are changed to the angles θ 1 and θ 2 such that tan θ 1 and tan θ 2 are the values shown in Table 1, respectively. Boron nitride particles were prepared in this manner.
得られた各窒化ホウ素粒子について、平均粒子径、10%累積粒子径と100%累積粒子径との差(D100-D10)、及び平均円形度を以下の方法によりそれぞれ測定した。結果を表1に示す。 For each of the obtained boron nitride particles, the average particle size, the difference between the 10% cumulative particle size and the 100% cumulative particle size (D100-D10), and the average circularity were measured by the following methods. The results are shown in Table 1.
(平均粒子径及びD100-D10)
窒化ホウ素粒子を分散させる分散媒として蒸留水を用い、分散剤としてヘキサメタリン酸ナトリウムを用い、0.125質量%ヘキサメタリン酸ナトリウム水溶液を調製した。この水溶液中に0.1g/80mLの比率で窒化ホウ素粒子を加え、超音波ホモジナイザー(日本精機製作所製、商品名:US-300Eを使用)により、AMPLITUDE(振幅)80%にて超音波分散を1分30秒間で1回行うことで、窒化ホウ素粒子の分散液を調製した。この分散液を60rpmで撹拌しながら分取し、レーザー回折散乱法粒度分布測定装置(ベックマンコールター社製、商品名:LS-13 320)により体積基準の粒度分布を測定した。このとき、水の屈折率として1.33を用い、窒化ホウ素粒子の屈折率として1.7を用いた。測定結果から、累積粒度分布の累積値50%の粒径(メジアン径、d50)として平均粒子径を算出すると共に、累積粒度分布の累積値100%の粒子径D100から累積値10%の粒子径D10を差し引いた値として、D100-D10を算出した。
(Average particle size and D100-D10)
Distilled water was used as a dispersion medium for dispersing the boron nitride particles, and sodium hexametaphosphate was used as a dispersant to prepare a 0.125 mass% sodium hexametaphosphate aqueous solution. Boron nitride particles are added to this aqueous solution at a ratio of 0.1 g / 80 mL, and ultrasonic dispersion is performed with an ultrasonic homogenizer (manufactured by Nippon Seiki Seisakusho, trade name: US-300E) at 80% AMPLITUDE (amplitude). A dispersion of boron nitride particles was prepared by performing this once every 1 minute and 30 seconds. This dispersion was separated while stirring at 60 rpm, and the volume-based particle size distribution was measured with a laser diffraction / scattering method particle size distribution measuring device (manufactured by Beckman Coulter, trade name: LS-13 320). At this time, 1.33 was used as the refractive index of water, and 1.7 was used as the refractive index of the boron nitride particles. From the measurement results, the average particle size is calculated as the particle size (median diameter, d50) of the cumulative value of the cumulative particle size distribution of 50%, and the particle size of the cumulative value of the cumulative particle size distribution is 100%. D100-D10 was calculated as the value obtained by subtracting D10.
(平均円形度)
まず、走査型電子顕微鏡(SEM)を用いて撮影した窒化ホウ素粒子の像(倍率:10,000倍、画像解像度:1280×1024ピクセル)について、画像解析ソフト(例えば、マウンテック社製、商品名:MacView)を用いた画像解析により、窒化ホウ素粒子の投影面積(S)及び周囲長(L)を算出した。次に、投影面積(S)及び周囲長(L)を用いて、以下に式:
円形度=4πS/L2
に従って円形度を求めた。任意に選ばれた100個の窒化ホウ素粒子について求めた円形度の平均値を平均円形度として算出した。
(Average circularity)
First, for an image of boron nitride particles (magnification: 10,000 times, image resolution: 1280 x 1024 pixels) taken with a scanning electron microscope (SEM), image analysis software (for example, manufactured by Mountech Co., Ltd., trade name: The projected area (S) and peripheral length (L) of the boron nitride particles were calculated by image analysis using a MacView). Next, using the projected area (S) and the perimeter (L), the following equation:
Circularity = 4πS / L 2
The circularity was calculated according to. The average value of the circularity obtained for 100 arbitrarily selected boron nitride particles was calculated as the average circularity.
得られた各窒化ホウ素粒子を用いたときの誘電率を以下の方法により測定した。結果を表1に示す。
窒化ホウ素粒子が20体積%となる分量で、窒化ホウ素粒子とポリエチレン(日本ポリエチレン(株)製、商品名「ノバテックHY540」)とを混錬し、シート成形を行って、0.2mm厚のシートを得た。混錬及びシート成形は、二軸押し出し機を用い、温度180℃の条件で行った。空洞共振器法の測定装置を用いて、周波数36GHz、温度25℃の条件で得られたシートの測定を行い、シートの誘電率を求めた。
The dielectric constant of each of the obtained boron nitride particles was measured by the following method. The results are shown in Table 1.
Boron nitride particles are kneaded with polyethylene (manufactured by Japan Polyethylene Corporation, trade name "Novatec HY540") in an amount that makes the amount of boron nitride particles 20% by volume, and sheet molding is performed to obtain a 0.2 mm thick sheet. Got Kneading and sheet forming were carried out using a twin-screw extruder under the condition of a temperature of 180 ° C. Using a measuring device of the cavity resonator method, the sheet obtained under the conditions of a frequency of 36 GHz and a temperature of 25 ° C. was measured, and the dielectric constant of the sheet was determined.
1…反応器、1a…反応器の一端面、1b…反応器の他端面、1c…反応器の側面、2…保持部材、3…第1の導入管、3a…第1の導入管の先端面、4…第2の導入管、4a…第2の導入管の先端面、D…反応器の延在方向、S…反応器の内部空間、d1…第1のガスの導入方向、d2…第2のガスの導入方向。 1 ... Reactor, 1a ... One end surface of the reactor, 1b ... The other end surface of the reactor, 1c ... Side surface of the reactor, 2 ... Holding member, 3 ... First introduction tube, 3a ... Tip of the first introduction tube Surface, 4 ... 2nd introduction pipe, 4a ... Tip surface of 2nd introduction pipe, D ... Reactor extension direction, S ... Reactor internal space, d1 ... First gas introduction direction, d2 ... Second gas introduction direction.
Claims (6)
前記窒化ホウ素粒子の前駆体を1000℃以上で加熱して窒化ホウ素粒子を得る加熱工程と、
を備える窒化ホウ素粒子の製造方法であって、
前記反応工程において、前記第1のガスを前記反応器内に導入する第1の方向の延長線上に前記反応器の側面が位置するように、前記第1のガスを前記反応器内に導入すると共に、前記第2のガスを前記反応器内に導入する第2の方向の延長線上に前記反応器の側面が位置するように、前記第2のガスを前記反応器内に導入する、製造方法。 A first gas containing a borate ester and a second gas containing ammonia are separately introduced into the reactor from one end surface of the tubular reactor, and the boric acid is introduced in the reactor. A reaction step of reacting the ester and the ammonia at 750 ° C. or higher to obtain a precursor of boron nitride particles.
A heating step of heating the precursor of the boron nitride particles at 1000 ° C. or higher to obtain boron nitride particles,
A method for producing boron nitride particles comprising
In the reaction step, the first gas is introduced into the reactor so that the side surface of the reactor is located on an extension of the first direction in which the first gas is introduced into the reactor. A manufacturing method in which the second gas is introduced into the reactor so that the side surface of the reactor is located on an extension line in the second direction for introducing the second gas into the reactor. ..
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Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3469941A (en) * | 1967-09-05 | 1969-09-30 | Green Refractories | Ultrafine boron nitride and process of making same |
| JP2008038163A (en) * | 2006-08-01 | 2008-02-21 | Napura:Kk | Nano-spherical particles having a composite structure, powder, and manufacturing method thereof |
| JP2010180066A (en) * | 2009-02-03 | 2010-08-19 | National Institute For Materials Science | Boron nitride spherical nanoparticle and method of producing the same |
| JP2016531972A (en) * | 2013-07-08 | 2016-10-13 | ユニヴェルシテ ポール サバティエ トゥールーズ トロワUniversite Paul Sabatier Toulouse Iii | Electrically insulating composite material, method for producing the material, and method of using the material as an electrical insulator |
| CN107161960A (en) * | 2017-06-06 | 2017-09-15 | 哈尔滨工业大学深圳研究生院 | A kind of high pressure vapor prepares the method and apparatus of boron nitride spherical powder |
| JP2019085446A (en) * | 2017-11-01 | 2019-06-06 | デンカ株式会社 | Boron nitride containing resin composition |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3839539B2 (en) * | 1997-01-20 | 2006-11-01 | 修 山本 | Crystalline disordered layered boron nitride powder and method for producing the same |
| CN1173879C (en) * | 2002-02-07 | 2004-11-03 | 山东大学 | Method for preparing nitride superfine powder and nitride crystal under hydrothermal condition |
| WO2015122379A1 (en) * | 2014-02-12 | 2015-08-20 | 電気化学工業株式会社 | Spherical boron nitride particles and production method thereof |
| JP6683715B2 (en) * | 2015-08-26 | 2020-04-22 | デンカ株式会社 | Thermally conductive resin composition |
-
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Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3469941A (en) * | 1967-09-05 | 1969-09-30 | Green Refractories | Ultrafine boron nitride and process of making same |
| JP2008038163A (en) * | 2006-08-01 | 2008-02-21 | Napura:Kk | Nano-spherical particles having a composite structure, powder, and manufacturing method thereof |
| JP2010180066A (en) * | 2009-02-03 | 2010-08-19 | National Institute For Materials Science | Boron nitride spherical nanoparticle and method of producing the same |
| JP2016531972A (en) * | 2013-07-08 | 2016-10-13 | ユニヴェルシテ ポール サバティエ トゥールーズ トロワUniversite Paul Sabatier Toulouse Iii | Electrically insulating composite material, method for producing the material, and method of using the material as an electrical insulator |
| CN107161960A (en) * | 2017-06-06 | 2017-09-15 | 哈尔滨工业大学深圳研究生院 | A kind of high pressure vapor prepares the method and apparatus of boron nitride spherical powder |
| JP2019085446A (en) * | 2017-11-01 | 2019-06-06 | デンカ株式会社 | Boron nitride containing resin composition |
Non-Patent Citations (1)
| Title |
|---|
| TANG, C. ET AL.: "Synthetic routes and formation mechanisms of spherical boron nitride nanoparticles", ADVANCED FUNCTIONAL MATERIALS, vol. 18, 30 October 2008 (2008-10-30), pages 3653 - 3661, XP001517179, DOI: 10.1002/adfm.200800493 * |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2024106404A1 (en) * | 2022-11-14 | 2024-05-23 | デンカ株式会社 | Spherical boron nitride powder, resin filler, resin composition, and production method for spherical boron nitride powder |
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