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WO2021182732A1 - Micro-ellipsomètre - Google Patents

Micro-ellipsomètre Download PDF

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Publication number
WO2021182732A1
WO2021182732A1 PCT/KR2020/019482 KR2020019482W WO2021182732A1 WO 2021182732 A1 WO2021182732 A1 WO 2021182732A1 KR 2020019482 W KR2020019482 W KR 2020019482W WO 2021182732 A1 WO2021182732 A1 WO 2021182732A1
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WO
WIPO (PCT)
Prior art keywords
polarization
sample
light source
light
detector
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/KR2020/019482
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English (en)
Korean (ko)
Inventor
박희재
최가람
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SNU R&DB Foundation
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Seoul National University R&DB Foundation
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Filing date
Publication date
Application filed by Seoul National University R&DB Foundation filed Critical Seoul National University R&DB Foundation
Publication of WO2021182732A1 publication Critical patent/WO2021182732A1/fr
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

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    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/21Polarisation-affecting properties
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01JMEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J4/00Measuring polarisation of light
    • G01J4/04Polarimeters using electric detection means
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/28Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for polarising
    • G02B27/283Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for polarising used for beam splitting or combining

Definitions

  • the present invention relates to a micro ellipsometer, in particular, by imaging the back focal plane of a beam reflected from a sample, simultaneously acquiring information about various incident angles, and simultaneously analyzing the polarization characteristics of the sample for each wavelength using a multi-wavelength light source And it relates to a micro ellipsometer that enables extraction of additional parameters for optical analysis of a sample by a phase retarder.
  • the present invention relates to an ellipsometer for measuring the thickness or optical properties of a thin film.
  • the incident surface of the light is defined by the incident path and the reflection path.
  • a wave parallel to the incident plane is called a P wave
  • a wave perpendicular to the incident plane is called an S wave.
  • P-wave and S-wave have amplitude and phase independent of each other.
  • the reflected light has elliptically polarized light.
  • Equipment that analyzes the parameters indicating the relative amplitude change ratio ( ⁇ ) and phase difference ( ⁇ ) of the P wave and the S wave, interprets the state of the elliptically polarized light, and measures the thickness or optical constant of the thin film by comparing it with the theoretical signal is an ellipsometer.
  • the oblique incidence ellipsometer since polarization analysis is required for a specific angle of incidence and reflection, as shown in FIG. 1 , there is an oblique incidence ellipsometer in which light is incident on a sample obliquely.
  • the oblique incidence ellipsometer has disadvantages in that it is impossible to measure a very small area because the size of the oblique incidence ellipsometer is larger than that of a coaxial optical system having a normal incidence structure, and the size of the measurement spot is increased.
  • a separate driving unit is provided to adjust the polarization state, but the driving unit takes a long time to measure and an error increases during operation of the driving unit.
  • micro-ellipsometer composed of a coaxial optical system
  • the micro ellipsometer constitutes a coaxial optical system
  • the conventional micro ellipsometer analyzes information on specific wavelengths, in order to analyze information on multiple wavelengths, measurement is performed by irradiating specific wavelengths, changing the wavelength of the light source, and then irradiating and measuring other wavelengths again. . Therefore, there is a disadvantage in that the measurement is cumbersome or the measurement time is excessive due to repeated operations.
  • the present invention has been devised to improve the above-described problems, particularly by imaging the back focal plane of the beam reflected from the sample to simultaneously acquire information on various incident angles, and using a multi-wavelength light source for each wavelength of the sample.
  • An object of the present invention is to provide a micro ellipsometer that simultaneously analyzes polarization characteristics and enables extraction of additional parameters for optical analysis of a sample by a phase retarder.
  • Micro ellipsometry according to an embodiment of the present invention, a light source; a polarization generator for polarizing the light source; a light splitter for splitting the light source passing through the polarization generator; an objective lens for irradiating the beam passing through the optical splitter to the sample; a lens unit for focusing the beam reflected from the sample on a back focal plane formed through the objective lens; a polarization analyzer that analyzes the polarization of the beam passing through the back focal plane; a detector disposed at the rear end of the polarization analyzer to obtain an image of the rear focal plane; and a signal processing unit for signal processing the image acquired by the detector to extract physical information of the sample.
  • a multi-band filter provided between the light source and the detector to filter the plurality of short-wavelength lights from the light source, wherein the detector includes a plurality of sensor filters corresponding to each of the short-wavelength lights to detect the respective short-wavelength lights It is preferable to have
  • phase retarder provided between the polarization generator and the light splitter to delay the phase of the polarized beam.
  • the multi-band filter filters the light source into short-wavelength light of at least three wavelengths.
  • the polarization generator and the light splitter are integrated into a polarization beam splitter that simultaneously performs polarization and splitting of the light source.
  • the micro ellipsometer according to the present invention provides an effect of simultaneously acquiring information on various incident angles by imaging the back focal plane of a beam reflected from a sample.
  • a multi-wavelength light source when a multi-wavelength light source is simultaneously irradiated to the sample and the light source is reflected from the sample, it provides an effect of simultaneously analyzing the polarization characteristics of the sample for each wavelength.
  • phase retarder it is possible to extract additional parameters for optical analysis of the sample.
  • FIG. 1 is a diagram schematically showing a conventional ellipsometer
  • FIG. 2 is a conceptual diagram of a microellipsometer according to an embodiment of the present invention.
  • 3 is a diagram schematically showing the relationship between the position of the focal point and the angle of incidence in the back focal plane;
  • FIG. 4 is a view showing the polarization state of incident light and reflected light according to azimuth in a vertical optical system
  • Figure 6 is a diagram expressing the mathematical parameters constituting the reflected light as a graph in terms of wavelength and incident angle by Fourier transform
  • FIG. 7 is a diagram showing a state in which information on wavelength and incident angle is simultaneously acquired when Fourier transforms the image acquired by the image acquisition unit to show measured values for specific parameters.
  • FIG. 2 is a conceptual diagram of a microellipsometer according to an embodiment of the present invention
  • FIG. 3 is a diagram schematically illustrating a relationship between a focal point position and an incident angle in the rear focal plane.
  • 4 is a view showing polarization states of incident light and reflected light according to azimuth angles in a vertical optical system
  • FIG. 5 is a view illustrating a back focal plane image.
  • FIG. 6 is a diagram that Fourier transforms mathematical parameters constituting reflected light to graph wavelength and incident angle
  • FIG. 7 shows measured values for specific parameters by Fourier transforming the image acquired by the image acquisition unit. and a diagram showing a state in which information is simultaneously acquired at the angle of incidence.
  • Micro ellipsometry includes a light source 10, a polarization generator 20, a light splitter 30, an objective lens 40, a lens unit 50, a polarization analyzer, a detector 70, and and a signal processing unit 80 .
  • the light source 10 is provided to emit light.
  • the light source 10 is a white light source is used.
  • various sources such as a tungsten-halogen lamp and a Xe lamp may be used.
  • the polarization generator 20 is provided at the rear end of the light source 10 to polarize the light source 10 .
  • the polarization generator 20 polarizes the light source 10 to have a specific component. According to this embodiment, the light source 10 is linearly polarized by the polarization generator 20 .
  • the light splitter 30 is provided to divide the light source 10 and guide the light to the sample 200 . According to the present embodiment, the beam split by the light splitter 30 goes toward the sample 200 arranged vertically downward. Meanwhile, the polarization generator 20 and the light splitter 30 may be integrated and implemented by a polarizing beam splitter that simultaneously performs polarization and splitting of the light source.
  • the objective lens 40 irradiates the beam split by the light splitter 30 to the sample 200 .
  • the beam is irradiated to the sample 200 after passing through the objective lens 40, is reflected from the sample 200, passes through the objective lens 40 again, passes through the optical splitter 30, and then to the polarization analyzer 60. go in
  • the lens unit 50 focuses on a back focal plane (BP) formed by the beam reflected from the sample through the objective lens.
  • the back focal plane BP is a plane where lights having the same incident angle are reflected back to the sample 200 and are gathered again. By imaging the back focal plane BP, data on the incident angle can be obtained.
  • the lens unit 50 is provided between the back focal plane BP and the detector 70, and the detector 70 can see the image of the back focal plane BP. works so as to
  • the polarization analyzer 60 is provided to analyze the polarization of the beam passing through the back focal plane BP.
  • the polarization analyzer 60 can use substantially the same polarizer as the polarization generator 20, and in terms of its function, the polarization generator 20 functions to generate polarized light, and the polarization analyzer 60 generates polarized light. interprets it.
  • the detector 70 is disposed at the rear end of the polarization analyzer 60 to obtain an image of the back focal plane BP.
  • the signal processing unit 80 is provided to extract the physical information of the sample 200 by signal processing the image acquired by the detector 70 .
  • the radial axis of the circle means the angle of incidence, and data may be obtained from 0 along the maximum angle of incidence according to the numerical aperture (NA) of the objective lens 40 . Accordingly, information on various polarization states and information on various incident angles may be obtained without a separate driving unit for rotating the polarizer to change the polarization state.
  • it further includes a multi-band filter 90 , a sensor filter 110 , and a phase delay unit 100 .
  • the multi-band filter 90 is provided between the light source 10 and the detector 70 to filter a plurality of short-wavelength lights from the light source 10 .
  • the multi-band filter 90 is provided between the light source 10 and the polarization generator 20 .
  • the position of the mass band filter 90 is not limited between the light source 10 and the polarization generator 20 . That is, it may be provided on a light path between the light source 10 and the detector 70 .
  • the light source 10 may be configured to pass through n narrow bandpass filters. According to this embodiment, it may be configured to obtain short-wavelength light of at least three wavelengths.
  • the light source 10 is filtered with short wavelengths corresponding to Red, Green, and Blue.
  • the light source 10 has a form in which three short-wavelength lights are synthesized after individually passing through the three band filters.
  • the sensor filter 110 is provided to detect each short-wavelength light generated through the multi-band filter 90 .
  • the sensor filter 110 is provided in plurality to correspond to the plurality of short-wavelength lights.
  • the sensor filter 110 is provided on the detector 70 so that the detector 70 can simultaneously acquire an image by each short-wavelength light.
  • the phase delay unit 100 is provided on the optical path passing through the polarization generator 20 and entering the polarization analyzer 60 to delay the phase of polarized light.
  • the phase delay unit 100 extracts a sin( ⁇ ) value given by the phase difference ( ⁇ ) between the polarized P wave and the S wave when the image received by the detector 70 is signal-processed to extract the sample 200. It is prepared to extract more detailed information about
  • the phase delay unit 100 is provided between the polarization generator 20 and the light splitter 30 .
  • the phase retarder 100 may be provided on an optical path passing through the polarization generator 20 and passing through the polarization analyzer 60 .
  • the phase delay unit 100 may be provided between the light splitter 30 and the polarization analyzer 60 .
  • At least one phase retarder 100 may be provided on a path from the polarization generator 20 to the polarization analyzer 60 .
  • two phase delay elements 100 may be provided. It may be provided between the polarization generator 20 and the light splitter 30 and between the light splitter 30 and the polarization analyzer 60 , respectively.
  • the light from the light source 10 is filtered into a plurality of short-wavelength lights while passing through the multi-band filter 90 , and enters the polarization generator 20 in the form of combining them.
  • the synthesized light of the short wavelengths passes through the phase delay unit 100 , and a phase delay of the P wave and the S wave occurs.
  • the phase-delayed light is reflected back to the sample 200 through the objective lens 40, the light splitter 30, the polarization analyzer 60, the lens unit 50 It enters the detector 70 via sequentially.
  • the detector 70 images the back focal plane BP by the lens unit 50 .
  • the image signal acquired by the detector 70 includes information about the sample 200 according to the wavelength and the incident angle.
  • the signal processing unit 80 Fourier transforms the image obtained by the detector 70 , and extracts physical information of the sample 200 using information about parameters expressed in the Fourier transform equation.
  • Equation 1 I is the intensity of the amount of light received by the detector 70
  • is the azimuth angle at which the light is incident on the sample 200
  • ⁇ 2 is the real part parameter of the low frequency
  • ⁇ 4 is the real part of the high frequency. parameter.
  • ⁇ 2 is a low frequency imaginary part parameter
  • ⁇ 4 is a high frequency imaginary part parameter.
  • I DC ⁇ 1+ ⁇ 2 cos(2 ⁇ ) + ⁇ 4 cos(4 ⁇ ) + ⁇ 2 sin(2 ⁇ ) + ⁇ 4 sin(4 ⁇ ) ⁇
  • ⁇ 2 , ⁇ 4 , ⁇ 2 , and ⁇ 4 P is the angle of the polarization generator, C is the angle of the phase retarder, and A is the angle of the polarization analyzer.
  • M11, M12, M22, and M33 are components of the Muller matrix indicating the optical properties of the sample, that is, the values of the corresponding component values of the material matrix for the sample in which the Muller matrix of the sample is expressed as follows.
  • represents the amplitude ratio of the P wave and the S wave
  • represents the phase difference between the P wave and the S wave.
  • FIG. 7 is a graph of ⁇ 2 and ⁇ 2 by Fourier transforming the signal obtained by each pixel of the detector 70 with respect to the red, green, and blue wavelengths of the real sample 200 .
  • FIG. 7 since information according to an incident angle for each wavelength can be clearly obtained and obtained, a sensitivity for each wavelength according to an incident angle can be increased.
  • the signal processing unit 80 extracts parameter information through a Fourier transform as shown in FIG. 7 , and derives ? and ? measured therefrom. Physical information on the thickness and refractive index of the sample 200 may be calculated by comparing this with the modeled theoretical values.
  • the phase delay unit 100 functions to more accurately analyze the characteristics of the sample 200 .
  • the effect of the present invention will be described in more detail compared to the case where the detector 70 detects the effect of polarizing light of a single wavelength from the light source 10 and irradiating it to the sample 200 .
  • the intensity of the light detected by the detector 70 is given by Equation 3 below.
  • ⁇ 2 (4tan 2 ( ⁇ )-4)/(3tan 2 ( ⁇ )-2tan( ⁇ )cos( ⁇ )+3)
  • ⁇ 4 (tan 2 ( ⁇ )+2tan( ⁇ )cos( ⁇ )+1) / (3tan 2 ( ⁇ )-2tan( ⁇ )cos( ⁇ )+3)
  • the intensity of light sensed by the detector 70 after irradiating a multi-wavelength light source and passing through the polarization generator 20 is the same as Equation 1, in this case the phase retarder 100
  • ⁇ 4 and ⁇ 2 are the same as in Equation 2 above.
  • Equation 3 in a state in which the phase delay unit 100 is not passed, ⁇ 2 and ⁇ 4 are both given as functions of ⁇ and ⁇ , respectively, so the errors generated in ⁇ and ⁇ are both ⁇ 2 and ⁇ 4 , but referring to Equation 2 according to an embodiment of the present invention, ⁇ 2 is a function of ⁇ only, and ⁇ 4 can be expressed as a function of ⁇ . provides the effect of reducing
  • the optical properties of the sample 200 may be expressed as a Mueller matrix, wherein these matrices are expressed by an equation including ? and ? as shown below.
  • r p is the reflection coefficient of the P wave
  • r s is the reflection coefficient of the S wave
  • is the amplitude ratio of the P wave and the S wave
  • is the phase difference between the P wave and the S wave.
  • phase delay unit 100 when there is no effect of phase delay, only the components of the matrices indicated in the box are calculated, and only when there is a phase delay effect by the phase delayer 100, M43 and M34 (numbers are rows and columns) ) components are additionally calculated. Accordingly, when the phase delay unit 100 is used, a sin( ⁇ ) function for the phase difference can be obtained. The physical characteristics of the sample 200 can be more sensitively grasped by the sin( ⁇ ) function. If there is no phase delay 100, ⁇ information may be extracted using the inverse function of cos( ⁇ ). Accordingly, it provides the effect of simultaneously extracting cos( ⁇ ) and sin( ⁇ ) values.
  • has only a value of 180° or 0° depending on the angle of incidence.
  • cos( ⁇ ) the sensitivity of ⁇ to the sample becomes low.
  • the cos function does not change sensitively because the slope is close to 0 at 180° or around 0°.
  • sin( ⁇ ) has the largest slope around 180° or 0°, it is possible to sense the change of the deep arc in the sample more sensitively.
  • DC is expressed by an M11 component and an M33 component
  • ⁇ 2 and ⁇ 2 are expressed by an M12 component and an M34 component
  • ⁇ 4 and ⁇ 4 are expressed by M11 and M33. Therefore, all five components, that is, DC, ⁇ 2 , ⁇ 2 , ⁇ 4 and ⁇ 4 values, can be calculated using the phase delay, thereby providing the effect of perfectly acquiring the optical information of the sample.
  • the present invention provides a sample for obtaining physical information ( 200) provides the effect of magnifying the target.
  • the micro ellipsometer provides an effect of simultaneously acquiring information on various incident angles for each wavelength by imaging the back focal plane BP of the beam reflected from the sample 200 .
  • the phase retarder 100 it is possible to extract additional parameters for optical analysis of the sample 200 , thereby extracting more detailed information about the characteristics of the sample 200 .
  • Multi-band filter 100 Phase delay

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Abstract

La présente invention concerne un micro-ellipsomètre. Le micro-ellipsomètre est caractérisé en ce qu'il comprend : une source de lumière ; un polariseur qui polarise la source de lumière ; un diviseur de lumière qui divise la source de lumière ayant traversé le polariseur ; une lentille d'objectif qui amène un faisceau ayant traversé le diviseur de lumière à être incident sur un échantillon ; une unité de lentille qui amène le point focal d'un faisceau ayant traversé la lentille d'objectif et réfléchi à partir de l'échantillon sur un plan focal arrière ; un analyseur de polarisation qui analyse la polarisation d'un faisceau ayant traversé le plan focal arrière ; un détecteur qui est disposé dans l'extrémité arrière de l'analyseur de polarisation et qui obtient une image du plan focal arrière ; et une unité de traitement de signal qui traite par signal l'image obtenue par le détecteur pour extraire des informations physiques de l'échantillon.
PCT/KR2020/019482 2020-03-11 2020-12-31 Micro-ellipsomètre Ceased WO2021182732A1 (fr)

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KR1020200030389A KR102289480B1 (ko) 2020-03-11 2020-03-11 마이크로 엘립소미터
KR10-2020-0030389 2020-03-11

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Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100917912B1 (ko) * 2007-11-13 2009-09-16 한국표준과학연구원 단일 편광자 초점 타원계측기
JP2014035257A (ja) * 2012-08-08 2014-02-24 National Institute Of Advanced Industrial & Technology ミューラー行列顕微エリプソメータ
KR20160144568A (ko) * 2015-06-08 2016-12-19 (재)한국나노기술원 매질 분석 장치 및 그 방법
KR20190118603A (ko) * 2017-02-08 2019-10-18 이섬 리서치 디벨로프먼트 컴퍼니 오브 더 히브루 유니버시티 오브 예루살렘 리미티드 높은 공간 해상도의 일립소메트리에서 사용하기 위한 시스템 및 방법
US20190353584A1 (en) * 2018-05-16 2019-11-21 Agency For Science, Technology And Research Differential Polarisation Imaging and Imaging Precision Ellipsometry

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100917912B1 (ko) * 2007-11-13 2009-09-16 한국표준과학연구원 단일 편광자 초점 타원계측기
JP2014035257A (ja) * 2012-08-08 2014-02-24 National Institute Of Advanced Industrial & Technology ミューラー行列顕微エリプソメータ
KR20160144568A (ko) * 2015-06-08 2016-12-19 (재)한국나노기술원 매질 분석 장치 및 그 방법
KR20190118603A (ko) * 2017-02-08 2019-10-18 이섬 리서치 디벨로프먼트 컴퍼니 오브 더 히브루 유니버시티 오브 예루살렘 리미티드 높은 공간 해상도의 일립소메트리에서 사용하기 위한 시스템 및 방법
US20190353584A1 (en) * 2018-05-16 2019-11-21 Agency For Science, Technology And Research Differential Polarisation Imaging and Imaging Precision Ellipsometry

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