WO2021007004A3 - Borophene-based two-dimensional heterostructures, fabricating methods and applications of same - Google Patents
Borophene-based two-dimensional heterostructures, fabricating methods and applications of same Download PDFInfo
- Publication number
- WO2021007004A3 WO2021007004A3 PCT/US2020/038075 US2020038075W WO2021007004A3 WO 2021007004 A3 WO2021007004 A3 WO 2021007004A3 US 2020038075 W US2020038075 W US 2020038075W WO 2021007004 A3 WO2021007004 A3 WO 2021007004A3
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- borophene
- same
- applications
- heterostructures
- fabricating methods
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Ceased
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/28—Vacuum evaporation by wave energy or particle radiation
- C23C14/30—Vacuum evaporation by wave energy or particle radiation by electron bombardment
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B32/00—Carbon; Compounds thereof
- C01B32/15—Nano-sized carbon materials
- C01B32/182—Graphene
- C01B32/184—Preparation
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B32/00—Carbon; Compounds thereof
- C01B32/15—Nano-sized carbon materials
- C01B32/182—Graphene
- C01B32/194—After-treatment
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0605—Carbon
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Carbon And Carbon Compounds (AREA)
- Nanotechnology (AREA)
- Inorganic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
Abstract
The invention relates to two dimensional (2D) heterostructures and methods of fabricating the same. The 2D hetero structures are integration of borophene with graphene and 2D lateral and vertical hetero structures with sharp and rotationally commensurate interfaces. The rich bonding configurations of boron indicate that borophene can be integrated into a diverse range of 2D heterostructures.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US17/617,367 US12202733B2 (en) | 2017-02-08 | 2020-06-17 | Borophene-based two-dimensional heterostructures, fabricating methods and applications of same |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201962866768P | 2019-06-26 | 2019-06-26 | |
| US62/866,768 | 2019-06-26 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| WO2021007004A2 WO2021007004A2 (en) | 2021-01-14 |
| WO2021007004A3 true WO2021007004A3 (en) | 2021-03-18 |
Family
ID=74113806
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| PCT/US2020/038075 Ceased WO2021007004A2 (en) | 2017-02-08 | 2020-06-17 | Borophene-based two-dimensional heterostructures, fabricating methods and applications of same |
Country Status (1)
| Country | Link |
|---|---|
| WO (1) | WO2021007004A2 (en) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2022159309A1 (en) * | 2021-01-20 | 2022-07-28 | Northwestern University | Borophane polymorphs and synthesis methods of same |
| US20240150185A1 (en) * | 2021-03-30 | 2024-05-09 | Northwestern University | Multi-layer borophene and method of synthesizing same |
| CN115138854B (en) * | 2021-03-30 | 2024-02-13 | 中国科学院大连化学物理研究所 | Preparation of metal nano-particles and metal nano-particles loaded on boron-graphene |
| CN114512656B (en) * | 2021-12-29 | 2024-08-27 | 清华大学 | Preparation method and preparation container of borane and graphene composite aerogel electrode sheet |
| CN114974439A (en) * | 2022-05-23 | 2022-08-30 | 电子科技大学 | Method for calculating and designing accurate boron-doped graphene based on first principle |
| CN115747698B (en) * | 2022-10-28 | 2024-09-10 | 深圳市深科达智能装备股份有限公司 | Wear-resistant corrosion-resistant self-lubricating coating and linear guide rail pair applying same |
| CN119943893B (en) * | 2024-12-17 | 2025-10-28 | 绍兴羽能新材料有限公司 | A boron-coated sodium ion battery positive electrode material and preparation method thereof |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2018011651A1 (en) * | 2016-07-15 | 2018-01-18 | Sabic Global Technologies B.V. | Multi-atomic layered materials |
| US9991122B2 (en) * | 2016-08-31 | 2018-06-05 | Micron Technology, Inc. | Methods of forming semiconductor device structures including two-dimensional material structures |
| US20190056654A1 (en) * | 2015-10-22 | 2019-02-21 | Asml Netherlands B.V. | Method of manufacturing a pellicle for a lithographic apparatus, a pellicle for a lithographic apparatus, a lithographic apparatus, a device manufacturing method, an apparatus for processing a pellicle, and a method for processing a pellicle |
-
2020
- 2020-06-17 WO PCT/US2020/038075 patent/WO2021007004A2/en not_active Ceased
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20190056654A1 (en) * | 2015-10-22 | 2019-02-21 | Asml Netherlands B.V. | Method of manufacturing a pellicle for a lithographic apparatus, a pellicle for a lithographic apparatus, a lithographic apparatus, a device manufacturing method, an apparatus for processing a pellicle, and a method for processing a pellicle |
| WO2018011651A1 (en) * | 2016-07-15 | 2018-01-18 | Sabic Global Technologies B.V. | Multi-atomic layered materials |
| US9991122B2 (en) * | 2016-08-31 | 2018-06-05 | Micron Technology, Inc. | Methods of forming semiconductor device structures including two-dimensional material structures |
Non-Patent Citations (2)
| Title |
|---|
| YANG JIE, QUHE RUGE, FENG SHENYAN, ZHANG QIAOXUAN, LEI MING, LU JING: "Interfacial properties of borophene contacts with two-dimensional semiconductors", PHYSICAL CHEMISTRY CHEMICAL PHYSICS, vol. 19, no. 35, 1 January 2017 (2017-01-01), pages 23982 - 23989, XP055790546, ISSN: 1463-9076, DOI: 10.1039/C7CP04570K * |
| ZAHRA JALALI, SEYED AKBAR JAFARI: "Kinked plasmon dispersion in borophene-borophene and borophene-graphene double layers", PHYSICAL REVIEW B, vol. 98, no. 23, 1 December 2018 (2018-12-01), pages 235430 - 235430-10, XP055790549, ISSN: 2469-9950 * |
Also Published As
| Publication number | Publication date |
|---|---|
| WO2021007004A2 (en) | 2021-01-14 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| NENP | Non-entry into the national phase |
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