WO2021059971A1 - エポキシ樹脂、エポキシ樹脂硬化物及びエポキシ樹脂組成物 - Google Patents
エポキシ樹脂、エポキシ樹脂硬化物及びエポキシ樹脂組成物 Download PDFInfo
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- WO2021059971A1 WO2021059971A1 PCT/JP2020/034004 JP2020034004W WO2021059971A1 WO 2021059971 A1 WO2021059971 A1 WO 2021059971A1 JP 2020034004 W JP2020034004 W JP 2020034004W WO 2021059971 A1 WO2021059971 A1 WO 2021059971A1
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- 0 CC(C)(C1(C(*)(*)*1)C1(*)*)C(C)(C(*)(*)O)C(*)(*)C11OC1(*)* Chemical compound CC(C)(C1(C(*)(*)*1)C1(*)*)C(C)(C(*)(*)O)C(*)(*)C11OC1(*)* 0.000 description 3
- ARFGFVLMUWJUGC-UHFFFAOYSA-N C1OC1(c1ccccc1C12OC1)c1c2cccc1 Chemical compound C1OC1(c1ccccc1C12OC1)c1c2cccc1 ARFGFVLMUWJUGC-UHFFFAOYSA-N 0.000 description 1
- MQJKPEGWNLWLTK-UHFFFAOYSA-N Nc(cc1)ccc1S(c(cc1)ccc1N)(=O)=O Chemical compound Nc(cc1)ccc1S(c(cc1)ccc1N)(=O)=O MQJKPEGWNLWLTK-UHFFFAOYSA-N 0.000 description 1
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/20—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the epoxy compounds used
- C08G59/22—Di-epoxy compounds
- C08G59/24—Di-epoxy compounds carbocyclic
- C08G59/245—Di-epoxy compounds carbocyclic aromatic
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/20—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the epoxy compounds used
- C08G59/22—Di-epoxy compounds
- C08G59/24—Di-epoxy compounds carbocyclic
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/40—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the curing agents used
- C08G59/50—Amines
- C08G59/5033—Amines aromatic
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/40—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the curing agents used
- C08G59/50—Amines
- C08G59/504—Amines containing an atom other than nitrogen belonging to the amine group, carbon and hydrogen
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/40—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the curing agents used
- C08G59/62—Alcohols or phenols
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/40—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the curing agents used
- C08G59/62—Alcohols or phenols
- C08G59/621—Phenols
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L63/00—Compositions of epoxy resins; Compositions of derivatives of epoxy resins
Definitions
- the present invention relates to an epoxy resin, an epoxy resin cured product, and an epoxy resin composition.
- Epoxy resin has excellent heat resistance, mechanical properties, adhesiveness and electrical insulation, and is used in various fields such as adhesives, paints, and construction / civil engineering materials by utilizing these properties.
- On the other hand as its use expands to fields such as aircraft materials and semiconductor encapsulants, even higher heat resistance is required.
- attempts have been made to suppress microBrownian motion and improve physical heat resistance by introducing a rigid skeleton or a highly symmetric skeleton into the molecular structure (Non-Patent Document 1).
- Attempts have also been made to improve chemical heat resistance by increasing the concentration of aromatic ring structures and alicyclic structures that are not easily thermally decomposed in the molecular structure (Non-Patent Document 2).
- alicyclic epoxy resins that do not contain a glycidyl ether structure, but since such epoxy resins have substituents on both carbons of the epoxy ring, they can be used with curing agents such as polyfunctional amines and polyfunctional phenols. Is low in reactivity. Further, since the alicyclic epoxy resin is produced by an oxidation reaction of an olefin using a peroxide, there is a concern about safety during production.
- an object of the present invention to provide an epoxy resin, an epoxy resin cured product, and an epoxy resin composition having good heat resistance when made into a cured product.
- the present invention is an epoxy resin represented by any one of the following formulas (1) to (8) and (30) to (32) on one side.
- R 1 to R 116 are independent of each other, hydrogen atom, halogen atom, hydroxy group, alkoxy group, aralkyloxy group, aryloxy, respectively.
- X 1 and X 2 are independent of each other, such as a carbonyl group, an oxygen atom, an amino group (-N ⁇ ), a sulfur atom, a sulfoxide group, a sulfonyl group, or a hydrocarbon having 1 to 12 carbon atoms. It is a group.
- the present invention is an epoxy resin cured product obtained by curing the epoxy resin of the present invention.
- the present invention is an epoxy resin cured product obtained by curing the epoxy resin of the present invention with a curing agent represented by the following formula (9). (In equation (9), n is a positive integer.)
- the present invention is an epoxy resin cured product obtained by curing the epoxy resin of the present invention with a curing agent represented by the following formula (10).
- the present invention is an epoxy resin cured product obtained by curing the epoxy resin of the present invention with a curing agent represented by the following formula (11).
- the present invention is an epoxy resin cured product obtained by curing the epoxy resin of the present invention with a curing agent represented by the following formula (36).
- a curing agent represented by the following formula (36).
- X is a benzene ring, a naphthalene ring, a benzene ring or a naphthalene ring, which is nuclear-substituted with an alkyl group having 1 to 4 carbon atoms, a biphenyl group
- Y is a benzene ring, a naphthalene ring, and 1 to 4 carbon atoms.
- a benzene ring or naphthalene ring substituted with an alkyl group Z is an alkyl group having 1 to 4 carbon atoms, k represents 0 or 1, and n is an average of 0.25 to 3.0 in repeating units. is there.)
- the present invention is an epoxy resin composition containing an epoxy resin represented by any one of the formulas (1) to (8) and (30) to (32) and a curing agent. is there.
- the curing agent is at least one of the compounds represented by the formulas (9) to (11) and (36).
- an epoxy resin an epoxy resin cured product, and an epoxy resin composition having good heat resistance when made into a cured product.
- epoxy resin of the present invention is represented by any one of the following formulas (1) to (8) and (30) to (32).
- R 1 to R 116 are independent of each other, hydrogen atom, halogen atom, hydroxy group, alkoxy group, aralkyloxy group, aryloxy group, respectively. , Nitro group, amino group, amide group, carboxy group, alkyloxycarbonyl group, aryloxycarbonyl group, formyl group, cyano group, alkyl group, cycloalkyl group, aralkyl group or aryl group.
- R 1 to R 116 are hydrogen atoms, alkyl groups or cycloalkyl groups, respectively.
- X 1 and X 2 are independent of each other and have a carbonyl group, an oxygen atom, an amino group (-N ⁇ ), a sulfur atom, a sulfoxide group, a sulfonyl group, or a carbon number of 1.
- ⁇ 12 hydrocarbon groups The hydrocarbon group having 1 to 12 carbon atoms may be an alkylene group (-(CR 117 R 118 ) n- ).
- R 117 and R 118 can each have the same groups as those of R 1 to R 116.
- n is a positive integer.
- the hydrocarbon group having 1 to 12 carbon atoms may be an arylene group, a cyclohexylene group or the like.
- X 1 and X 2 are methylene groups or oxygen atoms, respectively.
- R 1 to R 116 are hydrogen atoms independently of each other, and X 1 and X 2 are each other. Epoxy resins with two CHs are shown independently.
- the epoxy resin of the present invention can be produced by a Corey-Chaykovsky reaction between a sulfur ylide generated from trimethylsulfonium bromide or trimethylsulfonium iodide and a polyfunctional aldehyde or ketone. According to such a manufacturing method, an epoxy resin having no -O-CH 2-site in the structure can be manufactured. In addition, since it is not necessary to produce by an oxidation reaction of an olefin using a peroxide, safety during production is improved. For the polyfunctional aldehyde or ketone, the aldehyde or ketone having an appropriate substituent or the like at an appropriate position is selected in consideration of the chemical formula of the desired epoxy resin.
- an organic solvent, water, and an alkali such as KOH are added to trimethylsulfonium bromide or trimethylsulfonium iodide, and the mixture is stirred.
- a solution in which 1,4-cyclohexanedione represented by the following formula (20) is dissolved in an organic solvent is added, and the mixture is stirred again to proceed the reaction according to the reaction formula represented by the following formula (21).
- the mixture is cooled to room temperature, suction filtered, and separated.
- the organic layer is washed, dried, filtered, concentrated and dried under reduced pressure to obtain an epoxy resin represented by the formula (12).
- reaction conditions may be appropriately determined, but for example, the reaction temperature is preferably 45 to 75 ° C, more preferably 55 to 65 ° C.
- the reaction time is preferably 4 to 8 hours, more preferably 5 to 6 hours.
- the organic solvent acetonitrile, dimethyl sulfoxide, tetrahydrofuran and the like can be used.
- the structure of the obtained epoxy resin is infrared absorption using 1H-nuclear magnetic resonance (NMR) spectrum method, 13C-NMR spectrum method, 19F-NMR spectrum method, Fourier transform infrared spectroscopy (FT-IR), or the like. It can be confirmed by a general organic analysis method such as IR) spectral method, mass spectrometry (MS) method, element analysis method, and X-ray crystal diffraction method.
- the epoxy resin cured product of the present invention is an epoxy resin cured product obtained by curing the epoxy resin of the present invention.
- a generally known curing agent for epoxy resin can be used as the curing agent used for curing the epoxy resin of the present invention.
- known curing agents for epoxy resins include acid anhydride-based compounds, phenol-based compounds, amine-based compounds, and active ester-based compounds.
- curing agent for the acid anhydride compound examples include phthalic anhydride, trimellitic anhydride, pyromellitic anhydride, maleic anhydride, polypropylene glycol maleic anhydride, tetrahydrophthalic anhydride, methyltetrahydrophthalic anhydride, and methylnadic anhydride. , Hexahydrophthalic anhydride, methylhexahydrophthalic anhydride and the like.
- Examples of the curing agent for phenol-based compounds include dicyclopentadienephenol-added resin, phenol aralkyl resin, naphthol aralkyl resin, triphenylol methane resin, tetraphenylol ethane resin, naphthol novolac resin, and naphthol-phenol co-condensed novolac resin. , Naftor-cresol co-condensed novolak resin, biphenyl-modified phenolic resin, aminotriazine-modified phenolic resin, modified products thereof and the like.
- any compound can be used regardless of whether it is an aliphatic amine or an aromatic amine.
- the curing agent for the amine-based compound include aliphatic polyamines such as ethylenediamine, propylenediamine, butylenediamine, hexamethylenediamine, polypropylene glycoldiamine, diethylenetriamine, triethylenetetramine and pentaethylenehexamine, and metaxylylenediamine and diaminodiphenylmethane.
- Aromatic polyamines such as diaminodiphenylsulfone and phenylenediamine, alicyclic polyamines such as 1,3-bis (aminomethyl) cyclohexane, isophoronediamine and norbornandiamine, and dicyandiamide.
- the active ester compound is not particularly limited, but generally contains an ester group having high reactive activity such as phenol esters, thiophenol esters, N-hydroxyamine esters, and esters of heterocyclic hydroxy compounds in one molecule.
- a compound having two or more is preferably used.
- the active ester resin is preferably obtained by a condensation reaction of a carboxylic acid compound and / or a thiocarboxylic acid compound with a hydroxy compound and / or a thiol compound.
- an active ester resin obtained from a carboxylic acid compound or a halide thereof and a hydroxy compound is preferable, and an active ester resin obtained from a carboxylic acid compound or a halide thereof and a phenol compound and / or a naphthol compound is preferable.
- the carboxylic acid compound include benzoic acid, acetic acid, succinic acid, maleic acid, itaconic acid, phthalic acid, isophthalic acid, terephthalic acid, pyromellitic acid and the like, or halides thereof.
- phenol compound or naphthol compound examples include hydroquinone, resorcin, bisphenol A, bisphenol F, bisphenol S, dihydroxydiphenyl ether, phenol phthalein, methylated bisphenol A, methylated bisphenol F, methylated bisphenol S, phenol, o-cresol, m.
- -Cresol p-cresol, catechol, ⁇ -naphthol, ⁇ -naphthol, 1,5-dihydroxynaphthalene, 1,6-dihydroxynaphthalene, 2,7-dihydroxynaphthalene, polyhydroxynaphthylene ether, dihydroxybenzophenone, trihydroxybenzophenone , Tetrahydroxybenzophenone, fluoroglucin, benzenetriol, dicyclopentadiene-phenol-added resin and the like.
- the active ester compound examples include an active ester resin containing a dicyclopentadiene-phenol addition structure, an active ester resin containing a naphthalene structure, an active ester resin which is an acetylated product of phenol novolac, and an activity which is a benzoyl product of phenol novolac.
- Ester resins and the like are preferable, and among them, an active ester resin containing a dicyclopentadiene-phenol addition structure and an active ester resin containing a naphthalene structure are more preferable in that they are excellent in improving peel strength.
- Specific examples of the active ester resin containing a dicyclopentadiene-phenol addition structure include compounds represented by the following formula (36).
- X is a benzene ring, a naphthalene ring, a benzene ring or a naphthalene ring, which is nuclear-substituted with an alkyl group having 1 to 4 carbon atoms, a biphenyl group
- Y is a benzene ring, a naphthalene ring, and 1 to 4 carbon atoms.
- Z is an alkyl group having 1 to 4 carbon atoms
- k represents 0 or 1
- n is an average of 0.25 to 3.0 in repeating units. is there.
- the epoxy resin cured product of the present invention may be one in which the epoxy resin of the present invention is repeatedly polymerized and cured, or may further contain a repeating unit derived from a curing agent.
- a cured product obtained by curing an epoxy resin represented by the formula (12) with a curing accelerator such as imidazole has a repeating unit represented by the following formula (22) or (23).
- n is a positive integer.
- the epoxy resin cured product of the present invention may be a cured product of the epoxy resin of the present invention cured with a curing agent (phenol novolac: PN) represented by the following formula (9).
- a curing agent phenol novolac: PN
- n is a positive integer.
- the epoxy resin cured product of the present invention produced by curing the epoxy resin represented by the formula (12) with the curing agent represented by the formula (9) is ideally a repeating unit represented by the formula (24). It becomes a cured product containing. However, some epoxy groups and phenolic OH groups may not react.
- the epoxy resin cured product of the present invention may be a cured product of the epoxy resin of the present invention cured with a curing agent (4,4'-diaminodiphenyl sulfone: DDS) represented by the following formula (10).
- a curing agent (4,4'-diaminodiphenyl sulfone: DDS) represented by the following formula (10).
- the epoxy resin cured product of the present invention produced by curing the epoxy resin represented by the formula (12) with the curing agent represented by the formula (10) is ideally a repeating unit represented by the formula (25). It becomes a cured product containing. However, some epoxy groups and amino groups may not react.
- the epoxy resin cured product of the present invention may be a cured product of the epoxy resin of the present invention cured with a curing agent (m-phenylenediamine) represented by the formula (11).
- a curing agent m-phenylenediamine
- the epoxy resin cured product of the present invention produced by curing the epoxy resin represented by the formula (12) with the curing agent represented by the formula (11) is ideally a repeating product represented by the formula (26). It is a cured product containing units. However, some epoxy groups and amino groups may not react.
- the epoxy resin cured product of the present invention can be produced by curing the epoxy resin of the present invention.
- a generally known curing agent such as a curing accelerator (2E4MZ-CN) represented by the following formula (27) can be used.
- a method for producing a cured epoxy resin product obtained by curing the epoxy resin represented by the above formula (12) will be described.
- an organic solvent such as acetone is added to the epoxy resin represented by the formula (12) and the mixture is stirred.
- a curing agent represented by the formula (9), (10), or (11) is added, and the mixture is stirred again to react, concentrated and dried under reduced pressure, and then the epoxy resin represented by the formula (12) is obtained.
- a cured epoxy resin product is obtained.
- a curing accelerator may be used in addition to the curing agent.
- the curing accelerator those known as curing accelerators for epoxy resins can be used.
- the structure of the obtained cured epoxy resin can be confirmed by an infrared absorption (IR) spectral method using Fourier transform infrared spectroscopy (FT-IR) or the like, an elemental analysis method, an X-ray scattering method or the like.
- IR infrared absorption
- FT-IR Fourier transform infrared spectroscopy
- Epoxy resin composition contains an epoxy resin represented by any one of the above formulas (1) to (8) and (30) to (32), and a curing agent.
- the epoxy resin cured product of the present invention can be produced by further mixing and reacting the epoxy resin composition with a curing accelerator.
- the curing agent contained in the epoxy resin composition of the present invention a curing agent that can be used when producing the above-mentioned cured epoxy resin composition of the present invention can be used.
- the curing accelerator that can be used for the curing reaction of the epoxy resin composition of the present invention the curing accelerator that can be used when producing the above-mentioned cured epoxy resin composition of the present invention can be used.
- the epoxy resin composition of the present invention further comprises an epoxy resin (other epoxy resin) other than the epoxy resin represented by any one of the above formulas (1) to (8) and (30) to (32), and a filler.
- an epoxy resin other epoxy resin
- Fibrous substrate, dispersion medium, resins other than the above-mentioned various compounds, and the like may be included.
- each content will be specifically described in detail.
- the epoxy resin composition of the present invention is not limited to the epoxy resin represented by any one of the above formulas (1) to (8) and (30) to (32), as long as the effects of the present invention are not impaired. Other epoxy resins may be used in combination.
- the proportion of the epoxy resin represented by any one of the above formulas (1) to (8) and (30) to (32) in the epoxy resin composition of the present invention is the total epoxy resin. It is preferably 30% by mass or more, and particularly preferably 40% by mass or more.
- the epoxy resin that can be used in combination is not limited in any way.
- bisphenol A type epoxy resin bisphenol F type epoxy resin, bisphenol S type epoxy resin, bisphenol AD type epoxy resin, resorcin type epoxy resin, hydroquinone type epoxy resin.
- the blending amount of the epoxy resin and the curing agent in the epoxy resin composition of the present invention is not particularly limited, but is included in the total amount of the epoxy resin because the mechanical properties of the obtained cured product are good.
- the amount of the active group in the curing agent is preferably 0.7 to 1.5 equivalents with respect to the total 1 equivalent of the epoxy groups.
- the epoxy resin composition of the present invention may further contain a filler.
- the filler include an inorganic filler and an organic filler.
- the inorganic filler include inorganic fine particles.
- those having excellent heat resistance include alumina, magnesia, titania, zirconia, silica (quartz, fumed silica, precipitated silica, silicic acid anhydride, fused silica, crystalline silica, ultrafine powder amorphous silica, etc.).
- examples of those having excellent thermal conductivity include boron nitride, aluminum nitride, alumina oxide, titanium oxide, magnesium oxide, zinc oxide, silicon oxide, diamond and the like.
- a metal filler and / or a metal coating filler using a metal alone or an alloy for example, iron, copper, magnesium, aluminum, gold, silver, platinum, zinc, manganese, stainless steel, etc.
- a metal alone or an alloy for example, iron, copper, magnesium, aluminum, gold, silver, platinum, zinc, manganese, stainless steel, etc.
- minerals such as mica, clay, kaolin, talc, zeolite, wollastonite, smectite, potassium titanate, magnesium sulfate, sepiolite, zonolite, aluminum borate, calcium carbonate, titanium oxide, etc. Examples thereof include barium sulfate, zinc oxide and magnesium hydroxide.
- Examples of those having a high refractive index include barium titanate, zirconia oxide, and titanium oxide.
- Examples thereof include photocatalyst metals, composites of the metals, and oxides thereof.
- Examples of those having excellent wear resistance include metals such as silica, alumina, zirconia, and magnesium oxide, and composites and oxides thereof.
- examples of those having excellent conductivity include metals such as silver and copper, tin oxide, indium oxide and the like.
- examples of the material having excellent insulating properties include silica and the like.
- examples of those having excellent ultraviolet shielding properties include titanium oxide and zinc oxide.
- inorganic fine particles may be selected in a timely manner depending on the intended use, and may be used alone or in combination of multiple types. Further, since the inorganic fine particles have various properties other than the properties mentioned in the examples, they may be selected according to the timely application.
- silica fine particles such as powdered silica and colloidal silica can be used.
- Commercially available powdered silica fine particles include, for example, Aerosil 50, 200 manufactured by Nippon Aerosil Co., Ltd., Sildex H31, H32, H51, H52, H121, H122 manufactured by Asahi Glass Co., Ltd., and E220A manufactured by Nippon Silysia Chemical Ltd. , E220, SYLYSIA470 manufactured by Fuji Silysia Chemical Ltd., SG flakes manufactured by Nippon Plate Glass Co., Ltd., and the like.
- colloidal silica examples include methanol silica sol manufactured by Nissan Chemical Industries, Ltd., IPA-ST, MEK-ST, NBA-ST, XBA-ST, DMAC-ST, ST-UP, ST-OUP, etc. Examples thereof include ST-20, ST-40, ST-C, ST-N, ST-O, ST-50, ST-OL and the like.
- silica fine particles may be used.
- the silica fine particles are surface-treated with a reactive silane coupling agent having a hydrophobic group, or modified with a compound having a (meth) acryloyl group.
- a reactive silane coupling agent having a hydrophobic group or modified with a compound having a (meth) acryloyl group.
- Commercially available powdered silica modified with a compound having a (meth) acryloyl group includes Aerosil RM50, R711 manufactured by Nippon Aerosil Co., Ltd., and commercially available colloidal silica modified with a compound having a (meth) acryloyl group. MIBK-SD manufactured by Nissan Chemical Industry Co., Ltd. and the like can be mentioned.
- the shape of the silica fine particles is not particularly limited, and spherical, hollow, porous, rod-shaped, plate-shaped, fibrous, or indefinite shapes can be used.
- the primary particle size is preferably in the range of 5 to 200 nm. When it is 5 nm or more, the inorganic fine particles in the dispersion are sufficiently dispersed, and when the diameter is 200 nm or less, sufficient strength of the cured product can be easily maintained.
- titanium oxide fine particles not only extender pigments but also ultraviolet light-responsive photocatalysts can be used.
- anatase-type titanium oxide, rutile-type titanium oxide, brookite-type titanium oxide and the like can be used.
- particles designed to be made to respond to visible light by doping a different element into the crystal structure of titanium oxide can also be used.
- the element to be doped in titanium oxide anionic elements such as nitrogen, sulfur, carbon, fluorine and phosphorus, and cationic elements such as chromium, iron, cobalt and manganese are preferably used.
- a sol or slurry dispersed in a powder an organic solvent or water can be used.
- Examples of commercially available powdered titanium oxide fine particles include Aerosil P-25 manufactured by Nippon Aerosil Co., Ltd. and ATM-100 manufactured by TAYCA Corporation.
- Examples of commercially available slurry-like titanium oxide fine particles include TKD-701 manufactured by TAYCA CORPORATION.
- the epoxy resin composition of the present invention may further contain a fibrous substrate.
- the fibrous substrate is not particularly limited, but those used for fiber reinforced resins are preferable, and inorganic fibers and organic fibers can be mentioned.
- Inorganic fibers include carbon fibers, glass fibers, boron fibers, alumina fibers, silicon carbide fibers and other inorganic fibers, as well as carbon fibers, activated carbon fibers, graphite fibers, glass fibers, tungsten carbide fibers and silicon carbide fibers (silicon carbide fibers). ), Ceramic fibers, alumina fibers, natural fibers, mineral fibers such as genbuiwa, boron fibers, boron nitride fibers, boron carbide fibers, metal fibers and the like. Examples of the metal fiber include aluminum fiber, copper fiber, brass fiber, stainless fiber, and steel fiber.
- Organic fibers include synthetic fibers made of resin materials such as polybenzazole, aramid, PBO (polyparaphenylene benzoxazole), polyphenylene sulfide, polyester, acrylic, polyamide, polyolefin, polyvinyl alcohol, and polyarylate, cellulose, pulp, and the like.
- resin materials such as polybenzazole, aramid, PBO (polyparaphenylene benzoxazole), polyphenylene sulfide, polyester, acrylic, polyamide, polyolefin, polyvinyl alcohol, and polyarylate, cellulose, pulp, and the like.
- natural fibers such as cotton, wool and silk
- regenerated fibers such as proteins, polypeptides and alginic acid.
- carbon fiber and glass fiber are preferable because they have a wide range of industrial use. Of these, only one type may be used, or a plurality of types may be used at the same time.
- the fibrous substrate may be an aggregate of fibers, may be continuous or discontinuous, and may be woven or non-woven. Further, a fiber bundle in which fibers are arranged in one direction may be used, or a sheet in which fiber bundles are arranged may be used. Further, the aggregate of fibers may have a three-dimensional shape having a thickness.
- the epoxy resin composition of the present invention may use a dispersion medium for the purpose of adjusting the solid content and viscosity of the composition.
- the dispersion medium may be a liquid medium that does not impair the effects of the present invention, and examples thereof include various organic solvents and liquid organic polymers.
- organic solvent examples include ketones such as acetone, methyl ethyl ketone (MEK) and methyl isobutyl ketone (MIBK), cyclic ethers such as tetrahydrofuran (THF) and dioxolane, and esters such as methyl acetate, ethyl acetate and butyl acetate.
- ketones such as acetone, methyl ethyl ketone (MEK) and methyl isobutyl ketone (MIBK)
- cyclic ethers such as tetrahydrofuran (THF) and dioxolane
- esters such as methyl acetate, ethyl acetate and butyl acetate.
- Aromatic substances such as toluene and xylene, and alcohols such as carbitol, cellosolve, methanol, isopropanol, butanone and propylene glycol monomethyl ether.
- the liquid organic polymer is a liquid organic polymer that does not directly contribute to the curing reaction, and is, for example, a carboxyl group-containing polymer modified product (Floren G-900, NC-500: Kyoeisha), an acrylic polymer (Floren WK-20: Kyoeisha). , Amine salt of special modified phosphoric acid ester (HIPLAAD ED-251: Kusumoto Kasei), modified acrylic block copolymer (DISPERBYK2000; Big Chemie) and the like.
- a carboxyl group-containing polymer modified product Floren G-900, NC-500: Kyoeisha
- an acrylic polymer Floren WK-20: Kyoeisha
- Amine salt of special modified phosphoric acid ester HIPLAAD ED-251: Kusumoto Kasei
- modified acrylic block copolymer DISPERBYK2000; Big Chemie
- the epoxy resin composition of the present invention may have a resin other than the above-mentioned various compounds of the present invention.
- a known and commonly used resin may be blended as long as the effect of the present invention is not impaired, and for example, a thermosetting resin or a thermoplastic resin can be used.
- thermosetting resin is a resin having a property of being substantially insoluble and insoluble when cured by means such as heating or radiation or a catalyst.
- Specific examples thereof include phenol resin, urea resin, melamine resin, benzoguanamine resin, alkyd resin, unsaturated polyester resin, vinyl ester resin, diallyl terephthalate resin, silicone resin, urethane resin, furan resin, ketone resin, xylene resin, and heat.
- curable polyimide resin benzoxazine resin, active ester resin, aniline resin, cyanate ester resin, styrene / maleic anhydride (SMA) resin, and maleimide resin.
- SMA styrene / maleic anhydride
- Thermoplastic resin refers to a resin that can be melt-molded by heating. Specific examples thereof include polyethylene resin, polypropylene resin, polystyrene resin, rubber-modified polystyrene resin, acrylonitrile-butadiene-styrene (ABS) resin, acrylonitrile-styrene (AS) resin, polymethylmethacrylate resin, acrylic resin, and polyvinyl chloride resin.
- Polyvinylidene chloride resin polyethylene terephthalate resin, ethylene vinyl alcohol resin, cellulose acetate resin, ionomer resin, polyacrylonitrile resin, polyamide resin, polyacetal resin, polybutylene terephthalate resin, polylactic acid resin, polyphenylene ether resin, modified polyphenylene ether resin, polycarbonate Resin, polysulfone resin, polyphenylene sulfide resin, polyetherimide resin, polyether sulfone resin, polyarylate resin, thermoplastic polyimide resin, polyamideimide resin, polyether ether ketone resin, polyketone resin, liquid crystal polyester resin, fluororesin, Shinji Examples thereof include otakutic polystyrene resin and cyclic polyolefin resin. These thermoplastic resins can be used alone or in combination of two or more.
- the epoxy resin cured product and the epoxy resin composition of the present invention are excellent in both chemical heat resistance and physical heat resistance, and are useful in the following applications.
- the epoxy resin composition of the present invention has a fibrous substrate and the fibrous substrate is a reinforcing fiber
- the epoxy resin composition containing the fibrous substrate can be used as a fiber-reinforced resin.
- the method for incorporating the fibrous substrate into the composition is not particularly limited as long as the effects of the present invention are not impaired, and the fibrous substrate and the composition are kneaded, coated, impregnated, injected, pressure-bonded, etc. Examples thereof include a method of compounding by a method, which can be selected in a timely manner depending on the form of the fiber and the use of the fiber reinforced resin.
- the method for molding the fiber-reinforced resin of the present invention is not particularly limited. If a plate-shaped product is to be manufactured, an extrusion molding method is common, but a flat press can also be used. In addition, an extrusion molding method, a blow molding method, a compression molding method, a vacuum forming method, an injection molding method and the like can be used. In addition to the melt extrusion method, a solution cast method can be used to manufacture film-like products. When the melt molding method is used, inflation film molding, cast molding, extrusion lamination molding, calendar molding, and sheet molding can be used. , Fiber molding, blow molding, injection molding, rotary molding, coating molding and the like.
- a cured product in the case of a resin that is cured by an active energy ray, a cured product can be produced by using various curing methods using the active energy ray.
- a thermosetting resin is used as the main component of the matrix resin
- a molding method in which the molding material is made into a prepreg and pressurized and heated by a press or an autoclave can be mentioned.
- RTM (Resin Transfer Molding) molding examples include VaRTM (Vaccum assist Resin Transfer Molding) molding, laminated molding, and hand lay-up molding.
- the fiber-reinforced resin of the present invention can form a state called an uncured or semi-cured prepreg. After the product is distributed in the state of prepreg, the final curing may be performed to form a cured product.
- the mass ratio of the composition to the fibrous substrate used at this time is not particularly limited, but it is usually preferable to adjust the resin content in the prepreg to be 20 to 60% by mass.
- the epoxy resin cured product using the epoxy resin composition has good chemical heat resistance and physical heat resistance, and can be used as a heat-resistant material and an electronic material.
- it can be suitably used for semiconductor encapsulants, circuit boards, build-up films, build-up boards, etc., adhesives and resist materials.
- it can be suitably used for a matrix resin of a fiber reinforced resin, and is particularly suitable as a prepreg having high heat resistance.
- the heat-resistant members and electronic members thus obtained can be suitably used for various purposes. For example, industrial mechanical parts, general mechanical parts, automobile / railroad / vehicle parts, space / aviation-related parts, electronic / electrical parts, etc. Building materials, container / packaging materials, daily necessities, sports / leisure products, wind power generation housing materials, etc. are included, but are not limited to these.
- the composition, a curing accelerator, and a compounding agent such as an inorganic filler are used as necessary in an extruder or knee.
- a method of sufficiently melting and mixing until the mixture becomes uniform using a da, roll or the like include a method of sufficiently melting and mixing until the mixture becomes uniform using a da, roll or the like.
- fused silica is usually used as the inorganic filler, but when used as a high thermal conductivity semiconductor encapsulant for power transistors and power ICs, crystalline silica, alumina, and nitride having higher thermal conductivity than fused silica are used.
- Highly filled silica such as silicon, molten silica, crystalline silica, alumina, silicon nitride or the like may be used. It is preferable to use an inorganic filler in the range of 30 to 95% by mass per 100 parts by mass of the epoxy resin composition, among which improvements in flame retardancy, moisture resistance and solder crack resistance, and a coefficient of linear expansion. In order to reduce the amount, 70 parts by mass or more is more preferable, and 80 parts by mass or more is further preferable.
- the semiconductor encapsulant material is cast or molded using a transfer molding machine, an injection molding machine, or the like, and further at 50 to 250 ° C. A method of heating for 2 to 10 hours can be mentioned.
- the above prepregs are laminated by a conventional method, copper foils are appropriately laminated, and 10 at 170 to 300 ° C. under a pressure of 1 to 10 MPa. Examples thereof include a method of heat-bonding for minutes to 3 hours.
- a method for obtaining a build-up substrate from the epoxy resin composition of the present invention includes, for example, the following steps. First, a step (step 1) of applying the above composition, which is appropriately blended with rubber, a filler, and the like, to a circuit board on which a circuit is formed by using a spray coating method, a curtain coating method, or the like, and then curing the composition. After that, if necessary, a predetermined through-hole portion or the like is drilled, treated with a roughening agent, and the surface thereof is washed with hot water to form irregularities, and a metal such as copper is plated (process). 2).
- a step of alternately building up and forming a resin insulating layer and a conductor layer having a predetermined circuit pattern by sequentially repeating such an operation as desired (step 3).
- the through-hole portion is drilled after the outermost resin insulating layer is formed.
- the build-up substrate of the present invention is roughened by heat-pressing a resin-containing copper foil obtained by semi-curing the resin composition on a copper foil onto a wiring board on which a circuit is formed at 170 to 300 ° C. It is also possible to produce a build-up substrate by omitting the steps of forming a chemical surface and plating.
- the above composition is applied to the surface of the support film (Y) which is a base material, and the composition is further heated or blown with hot air to make it organic. It can be produced by drying the solvent to form a layer (X) of the composition.
- organic solvent used here examples include ketones such as acetone, methyl ethyl ketone and cyclohexanone, acetates such as ethyl acetate, butyl acetate, cellosolve acetate, propylene glycol monomethyl ether acetate and carbitol acetate, cellosolve and butyl carbitol.
- ketones such as acetone, methyl ethyl ketone and cyclohexanone
- acetates such as ethyl acetate, butyl acetate, cellosolve acetate, propylene glycol monomethyl ether acetate and carbitol acetate, cellosolve and butyl carbitol.
- Carbitols, aromatic hydrocarbons such as toluene and xylene, dimethylformamide, dimethylacetamide, N-methylpyrrolidone and the like are preferably used, and the non-volatile content is 30 to
- the thickness of the formed layer (X) is usually equal to or greater than the thickness of the conductor layer. Since the thickness of the conductor layer of the circuit board is usually in the range of 5 to 70 ⁇ m, the thickness of the resin composition layer is preferably 10 to 100 ⁇ m.
- the layer (X) of the composition in the present invention may be protected by a protective film described later. By protecting with a protective film, it is possible to prevent dust and the like from adhering to the surface of the resin composition layer and scratches.
- the support film and protective film described above include polyolefins such as polyethylene, polypropylene and polyvinyl chloride, polyethylene terephthalate (hereinafter, may be abbreviated as "PET"), polyesters such as polyethylene naphthalate, polycarbonate, polyimide, and further release. Examples include metal foils such as paper patterns, copper foils, and aluminum foils.
- the support film and the protective film may be subjected to a mold release treatment in addition to the mud treatment and the corona treatment.
- the thickness of the support film is not particularly limited, but is usually 10 to 150 ⁇ m, and is preferably used in the range of 25 to 50 ⁇ m.
- the thickness of the protective film is preferably 1 to 40 ⁇ m.
- the above-mentioned support film (Y) is peeled off after being laminated on a circuit board or after forming an insulating layer by heat curing. If the support film (Y) is peeled off after the curable resin composition layer constituting the build-up film is heat-cured, it is possible to prevent the adhesion of dust and the like in the curing step. When peeling after curing, the support film is usually subjected to a mold release treatment in advance.
- a multilayer printed circuit board can be manufactured using the build-up film obtained as described above.
- the layer (X) is protected by a protective film
- the layer (X) is peeled off and then laminated on one or both sides of the circuit board so as to be in direct contact with the circuit board, for example, by a vacuum laminating method.
- the laminating method may be a batch method or a continuous method using a roll. If necessary, the build-up film and the circuit board may be preheated if necessary before laminating.
- the crimping temperature (lamination temperature) is preferably 70 to 140 ° C., and the crimping pressure is 1 to 11 kgf / cm 2 (9.8 ⁇ 10 4 to 107.9 ⁇ 10 4 N / m 2 ). It is preferable to laminate under a reduced air pressure of 20 mmHg (26.7 hPa) or less.
- Conductive Paste As a method for obtaining a conductive paste from the epoxy resin composition of the present invention, for example, a method of dispersing conductive particles in the composition can be mentioned.
- the conductive paste can be a paste resin composition for circuit connection or an anisotropic conductive adhesive depending on the type of conductive particles used.
- the conventional polyfunctional phenol-curing epoxy resin is cured by curing the epoxy resin (DGEBA) with a curing agent (PN) and a curing accelerator (2E4MZ-CN) in the same procedure as in Test Example 2. I made a thing.
- a conventional polyfunctional amine-cured epoxy resin cured product was prepared by curing the epoxy resin (DGEBA) with a curing agent (MPDA) in the same procedure as in Test Example 3.
- thermogravimetric measurement TGA measurement
- DMA measurement dynamic viscoelasticity measurement
- thermogravimetric measurement TGA measurement
- DMA measurement dynamic viscoelasticity measurement
- thermosetting resin composition (Adjustment and evaluation of physical properties of thermosetting resin composition) [Test Examples 8 and 9] According to the equivalent composition shown in Table 3, as the epoxy resin, the epoxy resin (DCD) represented by the formula (12) obtained in Test Example 1 or the bisphenol A type liquid epoxy resin (“EPICLON” manufactured by DIC Co., Ltd. 850S ”, epoxy equivalent: 188 g / eq), and the active ester resin (active equivalent: 220 g / eq) obtained in Synthesis Example 1 below as a curing agent were melt-blended at 150 ° C., and dimethylaminopyridine 0 as a curing catalyst. It was adjusted by adding .5 phr.
- a cured product was prepared under the following conditions, and the dielectric loss tangent was evaluated by the following method.
- the evaluation results are shown in Table 3.
- Curing conditions In a mold, the mixture was cured at 180 ° C. for 2 hours, 200 ° C. for 2 hours, and 230 ° C. for 2 hours. Plate thickness after molding: 2 mm ⁇ Measurement of dielectric loss tangent> A test piece that conforms to JIS-C-2138 and is stored for 24 hours in a room at 23 ° C and 50% humidity after absolute drying by the open coaxial resonance type permittivity measuring device "ADMS01Oc1" manufactured by AET Co., Ltd. The dielectric loss tangent at 1 GHz was measured.
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Abstract
Description
(式(1)~(8)及び(30)~(32)中、R1~R116は、それぞれ、互いに独立して水素原子、ハロゲン原子、ヒドロキシ基、アルコキシ基、アラルキルオキシ基、アリールオキシ基、ニトロ基、アミノ基、アミド基、カルボキシ基、アルキルオキシカルボニル基、アリールオキシカルボニル基、ホルミル基、シアノ基、アルキル基、シクロアルキル基、アラルキル基またはアリール基である。式(7)及び(32)中、X1及びX2は、それぞれ、互いに独立してカルボニル基、酸素原子、アミノ基(-N<)、硫黄原子、スルホキシド基、スルホニル基、または炭素数1~12の炭化水素基である。)
本発明のエポキシ樹脂は、下記式(1)~(8)及び(30)~(32)のいずれか1つで表される。
次に、本発明のエポキシ樹脂の製造方法について詳述する。本発明のエポキシ樹脂は、トリメチルスルホニウムブロミドまたはトリメチルスルホニウムヨージドから発生させた硫黄イリドと多官能のアルデヒドまたはケトンとのCorey-Chaykovsky反応により製造することができる。このような製造方法によれば、構造中に-O-CH2-部位を有しないエポキシ樹脂を製造することができる。また、過酸化物を用いたオレフィンの酸化反応により製造する必要がないため、製造時の安全性が向上する。多官能のアルデヒドまたはケトンは、所望するエポキシ樹脂の化学式を考慮して、適切な置換基等を適切な位置に有するアルデヒドまたはケトンを選択する。
本発明のエポキシ樹脂硬化物は、本発明のエポキシ樹脂を硬化してなるエポキシ樹脂硬化物である。本発明のエポキシ樹脂の硬化に使用される硬化剤は、一般に公知なエポキシ樹脂の硬化剤を用いることができる。公知なエポキシ樹脂の硬化剤としては、例えば、酸無水物系化合物、フェノ-ル系化合物、アミン系化合物、活性エステル系化合物などが挙げられる。
次に、本発明のエポキシ樹脂硬化物の製造方法について詳述する。本発明のエポキシ樹脂硬化物は、本発明のエポキシ樹脂を硬化させることで製造することができる。硬化に使用する硬化剤は、下記式(27)で表される硬化促進剤(2E4MZ-CN)等、一般に公知の硬化剤を用いることができる。
本発明のエポキシ樹脂組成物は、前記式(1)~(8)及び(30)~(32)のいずれか1つで表されるエポキシ樹脂と、硬化剤とを含む。当該エポキシ樹脂組成物に、更に硬化促進剤を混合して反応させることで、本発明のエポキシ樹脂硬化物を作製することができる。
本発明のエポキシ樹脂組成物は、前記式(1)~(8)及び(30)~(32)のいずれか1つで表されるエポキシ樹脂以外に、本発明の効果を損なわない範囲において、その他のエポキシ樹脂を併用してもよい。このとき、本発明のエポキシ樹脂組成物中における前記式(1)~(8)及び(30)~(32)のいずれか1つで表されるエポキシ樹脂の使用割合としては、全エポキシ樹脂中30質量%以上であることが好ましく、特に40質量%以上であることが好ましい。
本発明のエポキシ樹脂組成物は、更にフィラーを含有してもよい。フィラーとしては、無機フィラーと有機フィラーが挙げられる。無機フィラーとしては、例えば無機微粒子が挙げられる。
本発明のエポキシ樹脂組成物は、更に繊維質基質を含有してもよい。繊維質基質は、特に限定はないが、繊維強化樹脂に用いられるものが好ましく、無機繊維や有機繊維が挙げられる。
本発明のエポキシ樹脂組成物は、組成物の固形分量や粘度を調整する目的として、分散媒を使用してもよい。分散媒としては、本発明の効果を損ねることのない液状媒体であればよく、各種有機溶剤、液状有機ポリマー等が挙げられる。
また、本発明のエポキシ樹脂組成物は、本発明の前述した各種化合物以外の樹脂を有していてもよい。樹脂としては、本発明の効果を損なわない範囲であれば公知慣用の樹脂を配合すればよく、例えば熱硬化性樹脂や熱可塑性樹脂を用いることができる。
本発明のエポキシ樹脂硬化物及びエポキシ樹脂組成物は、化学的耐熱性及び物理的耐熱性の両方に優れており、以下の用途に有用である。
本発明のエポキシ樹脂組成物が繊維質基質を有し、該繊維質基質が強化繊維の場合、繊維質基質を含有するエポキシ樹脂組成物は、繊維強化樹脂として用いることができる。組成物に対し繊維質基質を含有させる方法は、本発明の効果を損なわない範囲であれば特に限定されず、繊維質基質と組成物とを、混練、塗布、含浸、注入、圧着、等の方法で複合化する方法が挙げられ、繊維の形態及び繊維強化樹脂の用途によって適時選択することができる。
本発明の繊維強化樹脂は、未硬化あるいは半硬化のプリプレグと呼ばれる状態を形成することができる。プリプレグの状態で製品を流通させた後、最終硬化をおこなって硬化物を形成してもよい。積層体を形成する場合は、プリプレグを形成した後、その他の層を積層してから最終硬化を行うことで、各層が密着した積層体を形成できるため、好ましい。
この時用いる組成物と繊維質基質の質量割合としては、特に限定されないが、通常、プリプレグ中の樹脂分が20~60質量%となるように調製することが好ましい。
本発明のエポキシ樹脂組成物は、それを用いたエポキシ樹脂硬化物が、化学的耐熱性及び物理的耐熱性のいずれも良好であり、耐熱材料および電子材料として使用可能である。特に、半導体封止材、回路基板、ビルドアップフィルム、ビルドアップ基板等や、接着剤やレジスト材料に好適に使用可能である。また、繊維強化樹脂のマトリクス樹脂にも好適に使用可能であり、高耐熱性のプリプレグとして特に適している。こうして得られる耐熱部材や電子部材は、各種用途に好適に使用可能であり、例えば、産業用機械部品、一般機械部品、自動車・鉄道・車両等部品、宇宙・航空関連部品、電子・電気部品、建築材料、容器・包装部材、生活用品、スポーツ・レジャー用品、風力発電用筐体部材等が挙げられるが、これらに限定される物ではない。
1.半導体封止材料
本発明のエポキシ樹脂組成物から半導体封止材料を得る方法としては、前記組成物、及び硬化促進剤、及び無機充填剤等の配合剤とを必要に応じて押出機、ニ-ダ、ロ-ル等を用いて均一になるまで充分に溶融混合する方法が挙げられる。その際、無機充填剤としては、通常、溶融シリカが用いられるが、パワートランジスタ、パワーIC用高熱伝導半導体封止材として用いる場合は、溶融シリカよりも熱伝導率の高い結晶シリカ、アルミナ、窒化珪素などの高充填化シリカ、または溶融シリカ、結晶性シリカ、アルミナ、窒化珪素などを用いるとよい。その充填率はエポキシ樹脂組成物100質量部当たり、無機充填剤を30~95質量%の範囲で用いることが好ましく、中でも、難燃性や耐湿性や耐ハンダクラック性の向上、線膨張係数の低下を図るためには、70質量部以上がより好ましく、80質量部以上であることがさらに好ましい。
本発明のエポキシ樹脂組成物から半導体装置を得る半導体パッケージ成形としては、上記半導体封止材料を注型、或いはトランスファー成形機、射出成形機などを用いて成形し、さらに50~250℃で2~10時間の間、加熱する方法が挙げられる。
本発明のエポキシ樹脂組成物からプリント配線基板を得る方法としては、上記プリプレグを、常法により積層し、適宜銅箔を重ねて、1~10MPaの加圧下に170~300℃で10分~3時間、加熱圧着させる方法が挙げられる。
本発明のエポキシ樹脂組成物からビルドアップ基板を得る方法は、例えば以下の工程が挙げられる。まず、ゴム、フィラーなどを適宜配合した上記組成物を、回路を形成した回路基板にスプレーコーティング法、カーテンコーティング法等を用いて塗布した後、硬化させる工程(工程1)。その後、必要に応じて所定のスルーホール部等の穴あけを行った後、粗化剤により処理し、その表面を湯洗することによって凹凸を形成させ、銅などの金属をめっき処理する工程(工程2)。このような操作を所望に応じて順次繰り返し、樹脂絶縁層及び所定の回路パターンの導体層を交互にビルドアップして形成する工程(工程3)。なお、スルーホール部の穴あけは、最外層の樹脂絶縁層の形成後に行う。また、本発明のビルドアップ基板は、銅箔上で当該樹脂組成物を半硬化させた樹脂付き銅箔を、回路を形成した配線基板上に、170~300℃で加熱圧着することで、粗化面を形成、メッキ処理の工程を省き、ビルドアップ基板を作製することも可能である。
本発明のエポキシ樹脂組成物からビルドアップフィルムを得る方法としては、基材である支持フィルム(Y)の表面に、上記組成物を塗布し、更に加熱、あるいは熱風吹きつけ等により有機溶剤を乾燥させて組成物の層(X)を形成させることにより製造することができる。
本発明のエポキシ樹脂組成物から導電性ペーストを得る方法としては、例えば、導電性粒子を該組成物中に分散させる方法が挙げられる。上記導電性ペーストは、用いる導電性粒子の種類によって、回路接続用ペースト樹脂組成物や異方性導電接着剤とすることができる。
[試験例1]
式(28)に示す反応スキームに基づいて、エポキシ樹脂の合成を行った。
[試験例2]
50mLナスフラスコに、試験例1で得られた式(12)で表されるエポキシ樹脂1.0153g(EEW=70.1g/eq.)、砕いた上記式(9)で表される硬化剤(PN)1.5063g(HEW=104g/eq.)とアセトンを加え、撹拌(r.t./40min)を行った。完全に溶解したことを確認した後、上記式(27)で表される硬化促進剤(2E4MZ-CN)0.0252gを全体に対して1phr加え、再度撹拌(r.t./30min)した。その後、エバポレーションで濃縮し、減圧乾燥(r.t./ovn.)を行うことで紅色粘性液体を得た。次に、当該紅色粘性液体を、80℃で溶融させながらシリコーン注型版に注型した。続いて、脱気(80℃/10min)した後、80℃で1時間、90℃で1時間、130℃で4時間、170℃で4時間及び200℃で5時間の加熱硬化処理をこの順で行うことで、黄色透明硬化物を得た。
[試験例3]
50mLナスフラスコに、試験例1で得られた式(12)で表されるエポキシ樹脂1.8257g(EEW=70.1g/eq.)、上記式(11)で表される硬化剤(MPDA)0.8074g(活性水素当量=31.0g/eq.)とアセトンを加え、撹拌(r.t./40min)を行った。完全に溶解したことを確認した後、エバポレーションで濃縮し、減圧乾燥(r.t./ovn.)を行うことで白色固体を得た。次に、当該白色固体を、70℃で溶融させながらシリコーン注型版に注型した。続いて、脱気(70℃/5min)した後、70℃で1時間、90℃で1時間、130℃で3時間、170℃で3時間、200℃で3時間及び230℃で3時間の加熱硬化処理をこの順で行うことで、黒褐色透明硬化物を得た。
従来の多官能フェノール硬化エポキシ樹脂硬化物として、以下のようにサンプルを作製した。まず、下記式(29)で表されるエポキシ樹脂(DGEBA:ビスフェノールAジグリシジルエーテル)(EEW=190g/eq.)を準備した。
従来の多官能アミン硬化エポキシ樹脂硬化物として、以下のようにサンプルを作製した。まず、式(29)で表されるエポキシ樹脂(DGEBA)(EEW=190g/eq.)を準備した。
[試験例6]
試験例2で得られた黄色透明硬化物(エポキシ樹脂硬化物)をFT-IRスペクトル分析(KBr)することで、式(12)で表されるエポキシ樹脂のエポキシ基の吸収と同位置の吸収が消失していることを確認した。また、当該エポキシ樹脂硬化物について、島津製作所製TGA-50によって熱重量測定(TGA測定)を実施した。加熱速度(Heating rate)は10℃/minとし、N2ガス雰囲気中で測定した。また、当該エポキシ樹脂硬化物について、SIIナノテクノロジー社製DMS6100を用いた動的粘弾性測定(DMA測定)を実施することにより、ガラス転移温度(Tg)を測定した。測定は、加熱速度5℃/min、周波数1.0Hzにて行った。さらに同様にして、試験例4で得られた従来のエポキシ樹脂硬化物の熱重量測定(TGA測定)及び動的粘弾性測定(DMA測定)を実施した。測定結果を表1、図1及び図2に示す。表1において、「Td5」はサンプルの5%重量が減少する温度を示し、「Td10」はサンプルの10%重量が減少する温度を示す。
[試験例7]
試験例3で得られた褐色透明硬化物(エポキシ樹脂硬化物)をFT-IRスペクトル分析(KBr)することで、式(12)で表されるエポキシ樹脂のエポキシ基の吸収と同位置の吸収が消失していることを確認した。また、当該エポキシ樹脂硬化物について、島津製作所製TGA-50によって熱重量測定(TGA測定)を実施した。加熱速度(Heating rate)は10℃/minとし、N2ガス雰囲気中で測定した。また、当該エポキシ樹脂硬化物について、SIIナノテクノロジー社製DMS6100を用いた動的粘弾性測定(DMA測定)を実施することによりガラス転移温度(Tg)を測定した。加熱速度は5℃/min、周波数1.0Hzにて測定を行った。さらに同様にして、試験例5で得られた従来のエポキシ樹脂硬化物の熱重量測定(TGA測定)および動的粘弾性測定(DMA測定)を実施した。測定結果を表2、図3及び図4に示す。表2において、「Td5」はサンプルの5%重量が減少する温度を示し、「Td10」はサンプルの10%重量が減少する温度を示す。
[試験例8、9]
表3に記載の当量配合に従い、エポキシ樹脂として、試験例1で得られた式(12)で表されるエポキシ樹脂(DCD)、または、ビスフェノールA型液状エポキシ樹脂(DIC(株)製「EPICLON 850S」、エポキシ当量:188g/eq)、硬化剤として下記合成例1で得られた活性エステル樹脂(活性当量:220g/eq)を150℃で溶融配合し、更に、硬化触媒としてジメチルアミノピリジン0.5phrを加えて調整した。
[合成例1]
温度計、滴下ロート、冷却管、分留管、撹拌器を取り付けたフラスコに、ジシクロペンタジエンとフェノールとの付加反応物(水酸基当量165g/当量、軟化点85℃)165g、1-ナフトール144g、及びトルエン1315gを仕込み、系内を減圧窒素置換しながら溶解させた。次いで、イソフタル酸クロライド200gを仕込み、系内を減圧窒素置換しながら溶解させた。窒素ガスパージを施しながら、系内を60℃以下に制御して、20%水酸化ナトリウム水溶液434gを3時間かけて滴下した。滴下終了後、そのまま1時間撹拌を続けて反応させた。反応終了後、反応混合物を静置して分液し、水層を取り除いた。残った有機層に水を加えて約15分間撹拌混合した後、混合物を静置して分液し、水層を取り除いた。水層のpHが7になるまでこの操作を繰り返した後、加熱減圧条件下でトルエン等を留去し、活性エステル樹脂(AE)を得た。活性エステル樹脂(AE)の官能基当量は220g/当量、JIS K7234に基づいて測定した軟化点は130℃であった。
<硬化物作製条件>
硬化条件:金型内で、180℃で2時間、200℃で2時間、230℃で2時間硬化させた。成型後板厚:2mm
<誘電正接の測定>
JIS-C-2138に準拠し、株式会社エーイーティー製の開放型同軸共振型誘電率測定装置「ADMS01Oc1」により、絶乾後23℃、湿度50%の室内に24時間保管した後の試験片の1GHzでの誘電正接を測定した。
Claims (8)
- 下記式(1)~(8)及び(30)~(32)のいずれか1つで表されるエポキシ樹脂。
(式(1)~(8)及び(30)~(32)中、R1~R116は、それぞれ、互いに独立して水素原子、ハロゲン原子、ヒドロキシ基、アルコキシ基、アラルキルオキシ基、アリールオキシ基、ニトロ基、アミノ基、アミド基、カルボキシ基、アルキルオキシカルボニル基、アリールオキシカルボニル基、ホルミル基、シアノ基、アルキル基、シクロアルキル基、アラルキル基またはアリール基である。式(7)及び(32)中、X1及びX2は、それぞれ、互いに独立してカルボニル基、酸素原子、アミノ基(-N<)、硫黄原子、スルホキシド基、スルホニル基、または炭素数1~12の炭化水素基である。) - 請求項1に記載のエポキシ樹脂を硬化してなるエポキシ樹脂硬化物。
- 下記式(1)~(8)及び(30)~(32)のいずれか1つで表されるエポキシ樹脂と、
硬化剤と、
を含むエポキシ樹脂組成物。
(式(1)~(8)及び(30)~(32)中、R1~R116は、それぞれ、互いに独立して水素原子、ハロゲン原子、ヒドロキシ基、アルコキシ基、アラルキルオキシ基、アリールオキシ基、ニトロ基、アミノ基、アミド基、カルボキシ基、アルキルオキシカルボニル基、アリールオキシカルボニル基、ホルミル基、シアノ基、アルキル基、シクロアルキル基、アラルキル基またはアリール基である。式(7)及び(32)中、X1及びX2は、それぞれ、互いに独立してカルボニル基、酸素原子、アミノ基(-N<)、硫黄原子、スルホキシド基、スルホニル基、または炭素数1~12の炭化水素基である。)
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| CN202080066457.6A CN114423802B (zh) | 2019-09-24 | 2020-09-08 | 环氧树脂、环氧树脂固化物和环氧树脂组合物 |
| JP2021548770A JP7205842B2 (ja) | 2019-09-24 | 2020-09-08 | エポキシ樹脂硬化物及びエポキシ樹脂組成物 |
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| JP2022135942A (ja) * | 2021-03-05 | 2022-09-15 | 国立大学法人横浜国立大学 | エポキシ樹脂、エポキシ樹脂硬化物、エポキシ樹脂硬化物の製造方法及びエポキシ樹脂組成物 |
| JP2023104228A (ja) * | 2022-01-17 | 2023-07-28 | 富士フイルム株式会社 | 硬化性組成物、熱伝導材料、熱伝導シート、熱伝導層付きデバイス |
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| JP2022135942A (ja) * | 2021-03-05 | 2022-09-15 | 国立大学法人横浜国立大学 | エポキシ樹脂、エポキシ樹脂硬化物、エポキシ樹脂硬化物の製造方法及びエポキシ樹脂組成物 |
| JP7749191B2 (ja) | 2021-03-05 | 2025-10-06 | 国立大学法人横浜国立大学 | エポキシ樹脂、エポキシ樹脂硬化物、エポキシ樹脂硬化物の製造方法及びエポキシ樹脂組成物 |
| JP2023104228A (ja) * | 2022-01-17 | 2023-07-28 | 富士フイルム株式会社 | 硬化性組成物、熱伝導材料、熱伝導シート、熱伝導層付きデバイス |
| JP7776995B2 (ja) | 2022-01-17 | 2025-11-27 | 富士フイルム株式会社 | 硬化性組成物、熱伝導材料、熱伝導シート、熱伝導層付きデバイス |
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| CN114423802A (zh) | 2022-04-29 |
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