WO2020215512A1 - Vacuum drying device - Google Patents
Vacuum drying device Download PDFInfo
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- WO2020215512A1 WO2020215512A1 PCT/CN2019/098164 CN2019098164W WO2020215512A1 WO 2020215512 A1 WO2020215512 A1 WO 2020215512A1 CN 2019098164 W CN2019098164 W CN 2019098164W WO 2020215512 A1 WO2020215512 A1 WO 2020215512A1
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- porous
- vacuum drying
- distribution density
- rectifying plate
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J11/00—Devices or arrangements of selective printing mechanisms, e.g. ink-jet printers or thermal printers, for supporting or handling copy material in sheet or web form
- B41J11/0015—Devices or arrangements of selective printing mechanisms, e.g. ink-jet printers or thermal printers, for supporting or handling copy material in sheet or web form for treating before, during or after printing or for uniform coating or laminating the copy material before or after printing
Definitions
- the present invention relates to a drying equipment, in particular to a vacuum drying equipment.
- Inkjet printing Ink Jet printing, IJP
- IJP Ink Jet printing
- the key is to adjust the thickness of each film layer, because the uniformity of the film layer thickness (or morphology) directly affects the life of the device.
- the vacuum pump 12 and the exhaust outlet valve 13 are both arranged under the cavity 14 (as shown in FIG. 1A).
- the air flow 15 formed when the air is sucked can affect the ink surface.
- the thickness or morphology of the film surface 16 located in the middle portion 11A of the substrate 11 is uniform (as shown in FIG. 1B)
- the airflow 15 will cause the film surface 16 located in the edge portion 11B of the substrate 11 to be uniform.
- the uneven thickness or topography of the surface 16 further affects the uniformity of the film surface of the substrate 11 (as shown in FIG. 1C).
- the present invention provides a vacuum drying equipment to solve the problem of insufficient film surface uniformity caused by the existing vacuum drying equipment.
- An object of the present invention is to provide a vacuum drying equipment, which can make the inkjet film surface on the inkjet printed substrate have excellent film surface uniformity after vacuum drying.
- an embodiment of the present invention provides a vacuum drying equipment, wherein the vacuum drying equipment includes: a cavity, a carrier, a ceramic porous rectifier plate, a porous temperature adjustment device and a Gas extraction device.
- the cavity has an accommodation space.
- the carrier is arranged in the accommodating space.
- the ceramic porous rectifying plate is arranged in the accommodating space and located above the carrier, wherein the lower surface of the ceramic porous rectifying plate faces the carrier, and the ceramic porous rectifying plate includes from A pore distribution density whose center decreases toward the outside, wherein the pore distribution density decreases continuously from the center of the ceramic porous rectifying plate toward the outside.
- the porous temperature adjusting device is arranged in the containing space and contacts an upper surface of the ceramic porous rectifying plate.
- the gas extraction device is arranged above the porous temperature adjustment device and communicates with the containing space of the cavity.
- the porous temperature adjusting device is a porous condensing plate.
- a temperature adjustment range of the porous condensing plate is between 2 and 30°C.
- the gas extraction device includes at least one of a mechanical pump and a molecular pump.
- the porous rectifying plate includes a plurality of regions distributed from the center to the outside, and the plurality of regions includes: a first region, a second region, and a third region.
- the first area is located in the center of the porous rectifying plate and has a first hole distribution density.
- the second area is adjacent to the first area and has a second hole distribution density, wherein the second hole distribution density is smaller than the first hole distribution density.
- the third area is adjacent to the second area and has a third hole distribution density, wherein the third hole distribution density is smaller than the second hole distribution density.
- each of the plurality of regions has an area, wherein the area of the plurality of regions decreases from the center to the outside.
- an embodiment of the present invention provides a vacuum drying equipment, wherein the vacuum drying equipment includes: a cavity, a carrier, a porous rectifier plate, a porous temperature adjustment device and a Gas extraction device.
- the cavity has an accommodation space.
- the carrier is arranged in the accommodating space.
- the porous rectifying plate is arranged in the accommodating space and located above the carrier, wherein the lower surface of the porous rectifying plate faces the carrier, and the porous rectifying plate includes Reduced distribution density of a hole.
- the porous temperature adjusting device is arranged in the containing space and contacts an upper surface of the porous rectifying plate.
- the gas extraction device is arranged above the porous temperature adjustment device and communicates with the containing space of the cavity.
- a material of the porous rectifying plate includes ceramics.
- the pore distribution density decreases continuously from the center of the porous rectifying plate toward the outside.
- the pore distribution density gradually decreases from the center of the porous rectifying plate toward the outside.
- the porous temperature adjusting device is a porous condensing plate.
- a temperature adjustment range of the porous condensing plate is between 2 and 30°C.
- the gas extraction device includes at least one of a mechanical pump and a molecular pump.
- the porous rectifying plate includes a plurality of regions distributed from the center to the outside, and the plurality of regions includes: a first region, a second region, and a third region.
- the first area is located in the center of the porous rectifying plate and has a first hole distribution density.
- the second area is adjacent to the first area and has a second hole distribution density, wherein the second hole distribution density is smaller than the first hole distribution density.
- the third area is adjacent to the second area and has a third hole distribution density, wherein the third hole distribution density is smaller than the second hole distribution density.
- each of the plurality of regions has an area, wherein the area of the plurality of regions decreases from the center to the outside.
- a vacuum drying device which includes a cavity, a carrier, a ceramic porous rectifying plate, a porous condensing plate, and a gas extraction device.
- the cavity has an accommodation space.
- the carrier is arranged in the accommodating space.
- the ceramic porous rectifying plate is arranged in the accommodating space and located above the carrier, wherein the lower surface of the ceramic porous rectifying plate faces the carrier, and the ceramic porous rectifying plate includes The distribution density of a hole decreases from the center to the outside.
- the porous condensing plate is arranged in the containing space and contacts an upper surface of the ceramic porous rectifying plate.
- the gas extraction device is arranged above the porous condensing plate and communicates with the containing space of the cavity.
- the pore distribution density decreases continuously from the center of the ceramic porous rectifying plate toward the outside.
- the pore distribution density gradually decreases from the center of the ceramic porous rectifying plate toward the outside.
- a temperature adjustment range of the porous condensing plate is between 2 and 30°C.
- the gas extraction device includes at least one of a mechanical pump and a molecular pump.
- the vacuum drying equipment of the present invention mainly uses a porous rectifier plate and a porous temperature adjustment device to adjust the airflow changes and temperature changes during pumping, so as to make the inkjet film on the inkjet printed substrate
- the surface has excellent film surface uniformity after vacuum drying.
- Fig. 1A is a schematic diagram of an existing vacuum drying equipment.
- FIG. 1B is a schematic diagram of the film surface of the middle part of the substrate after the substrate is dried by the existing vacuum drying equipment.
- FIG. 1C is a schematic diagram of the film surface of the edge portion of the substrate after the substrate is dried by the existing vacuum drying equipment.
- FIG. 2 is a schematic cross-sectional view of a vacuum drying equipment according to an embodiment of the present invention.
- the vacuum drying equipment 20 of an embodiment of the present invention includes a cavity 21, a carrier 22, a porous rectifying plate 23, a porous temperature adjusting device 24 and a gas extraction device 25.
- the cavity 21 has an accommodating space 211, and the accommodating space 211 can be used to accommodate the stage 22, the porous rectifying plate 23 and the porous temperature adjusting device 24.
- the stage 22 of the vacuum drying equipment 20 is provided in the containing space 211, and the stage 22 is mainly used to carry a substrate 90.
- the substrate 90 is, for example, a substrate 90 having undried ink on a surface after an inkjet printing step.
- the stage 22 may have a fixing device (not shown), such as a vacuum suction method to fix the substrate.
- the porous rectifying plate 23 of the vacuum drying equipment 20 is arranged in the accommodating space 211 and above the carrier 22, wherein the lower surface 23A of the porous rectifying plate 23 faces the
- the carrier 22 and the porous rectifying plate 23 include a hole distribution density that decreases from the center to the outside.
- the position of the porous rectifying plate 23 corresponds to the position of the substrate on the carrier 22.
- the porous rectifying plate 23 has a pore distribution density that decreases from the center to the outside, most of the airflow will flow to the central part of the porous rectifying plate 23 during the vacuum drying step of the substrate. A small part of the airflow flows to the outer part of the porous rectifying plate 23.
- a material of the porous rectifying plate 23 includes ceramics.
- the porous rectifying plate 23 is a ceramic porous rectifying plate.
- the pore distribution density decreases continuously or in stages from the center of the porous rectifying plate 23 toward the outside.
- the pore distribution density at the center of the porous rectifying plate 23 is, for example, 70% by volume, and continuously decreases to 1% by volume as it moves away from the center.
- the pore distribution density at the center of the porous rectifying plate 23 is, for example, 70 volume percent, and gradually decreases to 65, 60, 55, 50, 45, 40, 35, 30, 25, 20, 15, 10, 5 or 1 volume percentage.
- the porous rectifying plate 23 includes a plurality of regions 231 distributed from the center to the outside, and the plurality of regions 231 include: a first region 231A, a second region 231B, and a third region 231C.
- the first area 231A is located in the center of the porous rectifying plate 23 and has a first hole distribution density.
- the second area 231B is adjacent to the first area 231A and has a second hole distribution density, wherein the second hole distribution density is smaller than the first hole distribution density.
- the third area 231C is adjacent to the second area 231B and has a third hole distribution density, wherein the third hole distribution density is smaller than the second hole distribution density.
- the edge of the substrate can have excellent film surface uniformity.
- the plurality of regions 231 may have more than three regions, for example, four, five, or more than six, and the smaller the hole distribution is as the distance from the first region 231A is density.
- each of the plurality of regions 231 has an area, wherein the area of the plurality of regions 231 decreases from the center to the outside. For example, assuming that the total area of the porous rectifying plate 23 is 100%, the area of the first area 231A is 60%, the area of the second area 231B is 30%, and the third area 231C is 10%. In another embodiment, the area of the plurality of regions 231 is set according to the size of the substrate.
- the porous temperature adjusting device 24 of the vacuum drying equipment 20 is arranged in the containing space 211 and contacts an upper surface 23B of the porous rectifying plate 23.
- the porous temperature adjusting device 24 is, for example, a porous condensing plate, which can be used to control the temperature of the porous rectifying plate 23.
- the porous condensing plate may include a condensing tube, a cooling liquid, and a compressor.
- a temperature adjustment range of the porous condensing plate is between 2 and 30°C.
- the temperature can be adjusted to 3, 4, 5, 7, 10, 15, 20, 25, 27, 28 or 29°C, so that the ink on the substrate can have excellent film surface uniformity after the vacuum drying step.
- the ink can be condensed after volatilization, thereby adjusting the atmosphere near the membrane surface.
- the temperature of the plurality of regions 231 distributed from the center to the outside is continuously or stepwise reduced, so that the edges of the substrate have excellent film surface uniformity.
- the gas extraction device 25 of the vacuum drying equipment 20 is arranged above the porous temperature adjustment device 24 and communicates with the accommodation space 211 of the cavity 21.
- the gas extraction device 25 includes at least one of a mechanical pump and a molecular pump.
- the vacuum drying equipment 20 of an embodiment of the present invention extracts the gas in the cavity 21 through the gas extraction device 25, so that the airflow of the cavity 21 sequentially passes through the porous rectifying plate 23 (inner The hole 232) and the porous temperature adjusting device 24 (the inner hole (not shown)) flow out of the cavity 21.
- the vacuum drying equipment 20 of an embodiment of the present invention uses at least the porous rectifying plate 23 and the porous temperature adjusting device 24 to adjust the airflow changes and temperature changes during pumping, so as to make the inkjet printed on the substrate
- the ink film surface has excellent film surface uniformity after vacuum drying.
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Abstract
Description
本发明是有关于一种干燥设备，特别是有关于一种真空干燥设备。The present invention relates to a drying equipment, in particular to a vacuum drying equipment.
在有机发光器件的制作流程中，印刷显示技术(例如喷墨打印(Ink jet printing，IJP))发展迅速。喷墨打印具有材料利用率高，设备价格低等优点。在利用喷墨打印法制备有机发光器件中，关键在于各个膜层厚度的调节，因为膜层厚度(或者形貌)的均匀性会直接影响器件的寿命。In the production process of organic light-emitting devices, printing display technology (such as inkjet printing (Ink Jet printing, IJP)) has developed rapidly. Inkjet printing has the advantages of high material utilization rate and low equipment price. In the preparation of organic light-emitting devices by inkjet printing, the key is to adjust the thickness of each film layer, because the uniformity of the film layer thickness (or morphology) directly affects the life of the device.
然而，利用现有的真空干燥设备10对喷墨打印后的基板11进行干燥过程中，由于真空泵浦12和抽气出口阀门13都会设置于腔体14下方处(如图1A所示)，故抽气时形成的气流15会对墨水表面造成影响。虽然位在所述基板11的中间部分11A的膜面16的厚度或形貌是均匀的(如图1B所示)，但所述气流15会使得位在所述基板11的边缘部分11B的膜面16的厚度或形貌不均，进而影响所述基板11的膜面均匀性(如图1C所示)。However, in the process of using the existing vacuum drying equipment 10 to dry the inkjet printed substrate 11, the vacuum pump 12 and the exhaust outlet valve 13 are both arranged under the cavity 14 (as shown in FIG. 1A). The air flow 15 formed when the air is sucked can affect the ink surface. Although the thickness or morphology of the film surface 16 located in the middle portion 11A of the substrate 11 is uniform (as shown in FIG. 1B), the airflow 15 will cause the film surface 16 located in the edge portion 11B of the substrate 11 to be uniform. The uneven thickness or topography of the surface 16 further affects the uniformity of the film surface of the substrate 11 (as shown in FIG. 1C).
故，有必要提供一种真空干燥设备，以解决现有技术所存在的问题。Therefore, it is necessary to provide a vacuum drying equipment to solve the problems existing in the prior art.
有鉴于此，本发明提供一种真空干燥设备，以解决现有的真空干燥设备所导致的膜面均匀性不足的问题。In view of this, the present invention provides a vacuum drying equipment to solve the problem of insufficient film surface uniformity caused by the existing vacuum drying equipment.
本发明的一目的在于提供一种真空干燥设备，其可以使经喷墨打印的基板上的喷墨膜面在经过真空干燥后具备优良膜面均匀性。An object of the present invention is to provide a vacuum drying equipment, which can make the inkjet film surface on the inkjet printed substrate have excellent film surface uniformity after vacuum drying.
为达成本发明的前述目的，本发明一实施例提供一种真空干燥设备，其中所述真空干燥设备包含：一腔体、一载台、一陶瓷多孔整流板、一多孔温度调节装置及一气体抽取装置。所述腔体具有一容置空间。所述载台设在所述容置空间内。所述陶瓷多孔整流板设在所述容置空间内且位在所述载台的上方，其中所述陶瓷多孔整流板的一下表面面对所述载台，以及所述陶瓷多孔整流板包含从中心朝外部减少的一孔分布密度，其中所述孔分布密度从所述陶瓷多孔整流板的中心朝外部是连续的渐减。所述多孔温度调节装置设在所述容置空间内且接触所述陶瓷多孔整流板的一上表面。所述气体抽取装置设在所述多孔温度调节装置的上方且连通所述腔体的容置空间。In order to achieve the foregoing objective of the present invention, an embodiment of the present invention provides a vacuum drying equipment, wherein the vacuum drying equipment includes: a cavity, a carrier, a ceramic porous rectifier plate, a porous temperature adjustment device and a Gas extraction device. The cavity has an accommodation space. The carrier is arranged in the accommodating space. The ceramic porous rectifying plate is arranged in the accommodating space and located above the carrier, wherein the lower surface of the ceramic porous rectifying plate faces the carrier, and the ceramic porous rectifying plate includes from A pore distribution density whose center decreases toward the outside, wherein the pore distribution density decreases continuously from the center of the ceramic porous rectifying plate toward the outside. The porous temperature adjusting device is arranged in the containing space and contacts an upper surface of the ceramic porous rectifying plate. The gas extraction device is arranged above the porous temperature adjustment device and communicates with the containing space of the cavity.
在本发明的一实施例中，所述多孔温度调节装置是一多孔冷凝板。In an embodiment of the present invention, the porous temperature adjusting device is a porous condensing plate.
在本发明的一实施例中，所述多孔冷凝板的一温度调整范围介于2至30℃之间。In an embodiment of the present invention, a temperature adjustment range of the porous condensing plate is between 2 and 30°C.
在本发明的一实施例中，所述气体抽取装置包含一机械泵浦及一分子泵浦中的至少一种。In an embodiment of the present invention, the gas extraction device includes at least one of a mechanical pump and a molecular pump.
在本发明的一实施例中，所述多孔整流板包含从中心朝外部分布的多个区域，所述多个区域包含：一第一区域、一第二区域及一第三区域。所述第一区域位在所述多孔整流板的中心且具有一第一孔分布密度。所述第二区域邻接所述第一区域且具有一第二孔分布密度，其中所述第二孔分布密度小于所述第一孔分布密度。所述第三区域邻接所述第二区域且具有一第三孔分布密度，其中所述第三孔分布密度小于所述第二孔分布密度。In an embodiment of the present invention, the porous rectifying plate includes a plurality of regions distributed from the center to the outside, and the plurality of regions includes: a first region, a second region, and a third region. The first area is located in the center of the porous rectifying plate and has a first hole distribution density. The second area is adjacent to the first area and has a second hole distribution density, wherein the second hole distribution density is smaller than the first hole distribution density. The third area is adjacent to the second area and has a third hole distribution density, wherein the third hole distribution density is smaller than the second hole distribution density.
在本发明的一实施例中，所述多个区域各具有一面积，其中所述多个区域的面积从中心朝外部是减少的。In an embodiment of the present invention, each of the plurality of regions has an area, wherein the area of the plurality of regions decreases from the center to the outside.
为达成本发明的前述目的，本发明一实施例提供一种真空干燥设备，其中所述真空干燥设备包含：一腔体、一载台、一多孔整流板、一多孔温度调节装置及一气体抽取装置。所述腔体具有一容置空间。所述载台设在所述容置空间内。所述多孔整流板设在所述容置空间内且位在所述载台的上方，其中所述多孔整流板的一下表面面对所述载台，以及所述多孔整流板包含从中心朝外部减少的一孔分布密度。所述多孔温度调节装置设在所述容置空间内且接触所述多孔整流板的一上表面。所述气体抽取装置设在所述多孔温度调节装置的上方且连通所述腔体的容置空间。In order to achieve the foregoing object of the present invention, an embodiment of the present invention provides a vacuum drying equipment, wherein the vacuum drying equipment includes: a cavity, a carrier, a porous rectifier plate, a porous temperature adjustment device and a Gas extraction device. The cavity has an accommodation space. The carrier is arranged in the accommodating space. The porous rectifying plate is arranged in the accommodating space and located above the carrier, wherein the lower surface of the porous rectifying plate faces the carrier, and the porous rectifying plate includes Reduced distribution density of a hole. The porous temperature adjusting device is arranged in the containing space and contacts an upper surface of the porous rectifying plate. The gas extraction device is arranged above the porous temperature adjustment device and communicates with the containing space of the cavity.
在本发明的一实施例中，所述多孔整流板的一材质包含陶瓷。In an embodiment of the present invention, a material of the porous rectifying plate includes ceramics.
在本发明的一实施例中，所述孔分布密度从所述多孔整流板的中心朝外部是连续的渐减。In an embodiment of the present invention, the pore distribution density decreases continuously from the center of the porous rectifying plate toward the outside.
在本发明的一实施例中，所述孔分布密度从所述多孔整流板的中心朝外部是阶段式的渐减。In an embodiment of the present invention, the pore distribution density gradually decreases from the center of the porous rectifying plate toward the outside.
在本发明的一实施例中，所述多孔温度调节装置是一多孔冷凝板。In an embodiment of the present invention, the porous temperature adjusting device is a porous condensing plate.
在本发明的一实施例中，所述多孔冷凝板的一温度调整范围介于2至30℃之间。In an embodiment of the present invention, a temperature adjustment range of the porous condensing plate is between 2 and 30°C.
在本发明的一实施例中，所述气体抽取装置包含一机械泵浦及一分子泵浦中的至少一种。In an embodiment of the present invention, the gas extraction device includes at least one of a mechanical pump and a molecular pump.
在本发明的一实施例中，所述多孔整流板包含从中心朝外部分布的多个区域，所述多个区域包含：一第一区域、一第二区域及一第三区域。所述第一区域位在所述多孔整流板的中心且具有一第一孔分布密度。所述第二区域邻接所述第一区域且具有一第二孔分布密度，其中所述第二孔分布密度小于所述第一孔分布密度。所述第三区域邻接所述第二区域且具有一第三孔分布密度，其中所述第三孔分布密度小于所述第二孔分布密度。In an embodiment of the present invention, the porous rectifying plate includes a plurality of regions distributed from the center to the outside, and the plurality of regions includes: a first region, a second region, and a third region. The first area is located in the center of the porous rectifying plate and has a first hole distribution density. The second area is adjacent to the first area and has a second hole distribution density, wherein the second hole distribution density is smaller than the first hole distribution density. The third area is adjacent to the second area and has a third hole distribution density, wherein the third hole distribution density is smaller than the second hole distribution density.
在本发明的一实施例中，所述多个区域各具有一面积，其中所述多个区域的面积从中心朝外部是减少的。In an embodiment of the present invention, each of the plurality of regions has an area, wherein the area of the plurality of regions decreases from the center to the outside.
为达成本发明的前述目的，本发明另一实施例提供一种真空干燥设备，包含：一腔体、一载台、一陶瓷多孔整流板、一多孔冷凝板及一气体抽取装置。所述腔体具有一容置空间。所述载台设在所述容置空间内。所述陶瓷多孔整流板，设在所述容置空间内且位在所述载台的上方，其中所述陶瓷多孔整流板的一下表面面对所述载台，以及所述陶瓷多孔整流板包含从中心朝外部减少的一孔分布密度。所述多孔冷凝板设在所述容置空间内且接触所述陶瓷多孔整流板的一上表面。所述气体抽取装置设在所述多孔冷凝板的上方且连通所述腔体的容置空间。In order to achieve the foregoing objective of the present invention, another embodiment of the present invention provides a vacuum drying device, which includes a cavity, a carrier, a ceramic porous rectifying plate, a porous condensing plate, and a gas extraction device. The cavity has an accommodation space. The carrier is arranged in the accommodating space. The ceramic porous rectifying plate is arranged in the accommodating space and located above the carrier, wherein the lower surface of the ceramic porous rectifying plate faces the carrier, and the ceramic porous rectifying plate includes The distribution density of a hole decreases from the center to the outside. The porous condensing plate is arranged in the containing space and contacts an upper surface of the ceramic porous rectifying plate. The gas extraction device is arranged above the porous condensing plate and communicates with the containing space of the cavity.
在本发明的一实施例中，所述孔分布密度从所述陶瓷多孔整流板的中心朝外部是连续的渐减。In an embodiment of the present invention, the pore distribution density decreases continuously from the center of the ceramic porous rectifying plate toward the outside.
在本发明的一实施例中，所述孔分布密度从所述陶瓷多孔整流板的中心朝外部是阶段式的渐减。In an embodiment of the present invention, the pore distribution density gradually decreases from the center of the ceramic porous rectifying plate toward the outside.
在本发明的一实施例中，所述多孔冷凝板的一温度调整范围介于2至30℃之间。In an embodiment of the present invention, a temperature adjustment range of the porous condensing plate is between 2 and 30°C.
在本发明的一实施例中，所述气体抽取装置包含一机械泵浦及一分子泵浦中的至少一种。In an embodiment of the present invention, the gas extraction device includes at least one of a mechanical pump and a molecular pump.
与现有技术相比较，本发明的真空干燥设备，主要是通过多孔整流板及多孔温度调节装置来调整抽气时的气流变化及温度变化，进而使经喷墨打印的基板上的喷墨膜面在经过真空干燥后具备优良膜面均匀性。Compared with the prior art, the vacuum drying equipment of the present invention mainly uses a porous rectifier plate and a porous temperature adjustment device to adjust the airflow changes and temperature changes during pumping, so as to make the inkjet film on the inkjet printed substrate The surface has excellent film surface uniformity after vacuum drying.
为让本发明的上述内容能更明显易懂，下文特举优选实施例，并配合所附图式，作详细说明如下：In order to make the above-mentioned content of the present invention more obvious and understandable, the following is a detailed description of preferred embodiments in conjunction with the accompanying drawings:
图1A是现有的真空干燥设备的示意图。Fig. 1A is a schematic diagram of an existing vacuum drying equipment.
图1B是利用现有的真空干燥设备对基板进行干燥过程后，所述基板的中间部分的膜面的示意图。FIG. 1B is a schematic diagram of the film surface of the middle part of the substrate after the substrate is dried by the existing vacuum drying equipment.
图1C是利用现有的真空干燥设备对基板进行干燥过程后，所述基板的边缘部分的膜面的示意图。FIG. 1C is a schematic diagram of the film surface of the edge portion of the substrate after the substrate is dried by the existing vacuum drying equipment.
图2是本发明一实施例的真空干燥设备的剖面示意图。2 is a schematic cross-sectional view of a vacuum drying equipment according to an embodiment of the present invention.
以下各实施例的说明是参考附加的图式，用以例示本发明可用以实施的特定实施例。再者，本发明所提到的方向用语，例如上、下、顶、底、前、后、左、右、内、外、侧面、周围、中央、水平、横向、垂直、纵向、轴向、径向、最上层或最下层等，仅是参考附加图式的方向。因此，使用的方向用语是用以说明及理解本发明，而非用以限制本发明。The description of the following embodiments refers to the attached drawings to illustrate specific embodiments that the present invention can be implemented. Furthermore, the directional terms mentioned in the present invention, such as up, down, top, bottom, front, back, left, right, inside, outside, side, surrounding, center, horizontal, horizontal, vertical, vertical, axial, The radial direction, the uppermost layer or the lowermost layer, etc., are only the direction of reference to the attached drawings. Therefore, the directional terms used are used to describe and understand the present invention, rather than to limit the present invention.
请参照图2所示，本发明一实施例的真空干燥设备20包含一腔体21、一载台22、一多孔整流板23、一多孔温度调节装置24及一气体抽取装置25。所述腔体21具有一容置空间211，所述容置空间211可用于容置所述载台22、所述多孔整流板23与所述多孔温度调节装置24。Please refer to FIG. 2, the vacuum drying equipment 20 of an embodiment of the present invention includes a cavity 21, a carrier 22, a porous rectifying plate 23, a porous temperature adjusting device 24 and a gas extraction device 25. The cavity 21 has an accommodating space 211, and the accommodating space 211 can be used to accommodate the stage 22, the porous rectifying plate 23 and the porous temperature adjusting device 24.
本发明一实施例的真空干燥设备20的载台22设在所述容置空间211中，所述载台22主要用于承载一基板90。在一实施例中，所述基板90例如是经喷墨打印步骤后且一表面上具有未干燥墨水的基板90。在另一实施例中，所述载台22可具有一固定装置(未绘示)，例如通过真空吸引方式固定所述基板。The stage 22 of the vacuum drying equipment 20 according to an embodiment of the present invention is provided in the containing space 211, and the stage 22 is mainly used to carry a substrate 90. In one embodiment, the substrate 90 is, for example, a substrate 90 having undried ink on a surface after an inkjet printing step. In another embodiment, the stage 22 may have a fixing device (not shown), such as a vacuum suction method to fix the substrate.
本发明一实施例的真空干燥设备20的多孔整流板23设在所述容置空间211内且位在所述载台22的上方，其中所述多孔整流板23的一下表面23A面对所述载台22，以及所述多孔整流板23包含从中心朝外部减少的一孔分布密度。在一实施例中，所述多孔整流板23的位置对应位在所述载台22上的基板的位置。具体而言，由于所述多孔整流板23具有从中心朝外部减少的一孔分布密度，因此所述基板在进行真空干燥步骤时，大部分气流会流向所述多孔整流板23的中心部分，而小部分气流则是流向所述多孔整流板23的外部部分。通过上述方式，所述基板上的墨水在进行真空干燥步骤后可具有优良的膜面均匀性。The porous rectifying plate 23 of the vacuum drying equipment 20 according to an embodiment of the present invention is arranged in the accommodating space 211 and above the carrier 22, wherein the lower surface 23A of the porous rectifying plate 23 faces the The carrier 22 and the porous rectifying plate 23 include a hole distribution density that decreases from the center to the outside. In one embodiment, the position of the porous rectifying plate 23 corresponds to the position of the substrate on the carrier 22. Specifically, since the porous rectifying plate 23 has a pore distribution density that decreases from the center to the outside, most of the airflow will flow to the central part of the porous rectifying plate 23 during the vacuum drying step of the substrate. A small part of the airflow flows to the outer part of the porous rectifying plate 23. Through the above method, the ink on the substrate can have excellent film surface uniformity after the vacuum drying step.
在一实施例中，所述多孔整流板23的一材质包含陶瓷。在一范例中，所述多孔整流板23是一陶瓷多孔整流板。在另一实施例中，所述孔分布密度从所述多孔整流板23的中心朝外部是连续的渐减或是阶段式的渐减。在一范例中，所述多孔整流板23的中心处的孔分布密度例如是70体积百分率，并且随着远离中心处而连续的渐减至1体积百分率。在另一范例中，所述多孔整流板23的中心处的孔分布密度例如是70体积百分率，并且随着远离中心处而阶段式的渐减为65、60、55、50、45、40、35、30、25、20、15、10、5或1体积百分率。In one embodiment, a material of the porous rectifying plate 23 includes ceramics. In an example, the porous rectifying plate 23 is a ceramic porous rectifying plate. In another embodiment, the pore distribution density decreases continuously or in stages from the center of the porous rectifying plate 23 toward the outside. In an example, the pore distribution density at the center of the porous rectifying plate 23 is, for example, 70% by volume, and continuously decreases to 1% by volume as it moves away from the center. In another example, the pore distribution density at the center of the porous rectifying plate 23 is, for example, 70 volume percent, and gradually decreases to 65, 60, 55, 50, 45, 40, 35, 30, 25, 20, 15, 10, 5 or 1 volume percentage.
在一实施例中，所述多孔整流板23包含从中心朝外部分布的多个区域231，所述多个区域231包含：一第一区域231A、一第二区域231B与一第三区域231C。所述第一区域231A位在所述多孔整流板23的中心且具有一第一孔分布密度。所述第二区域231B邻接所述第一区域231A且具有一第二孔分布密度，其中所述第二孔分布密度小于所述第一孔分布密度。所述第三区域231C，邻接所述第二区域231B且具有一第三孔分布密度，其中所述第三孔分布密度小于所述第二孔分布密度。在本实施例中，通过具有减少的孔分布密度(随着远离所述多孔整流板23的中心)，可使所述基板的边缘具有优良膜面均匀性。这边要提到的是，所述多个区域231可具有大于三个的区域，例如四个、五个、或六个以上，其中随着越远离第一区域231A而具有越小的孔分布密度。在另一实施例中，所述多个区域231各具有一面积，其中所述多个区域231的面积从中心朝外部是减少的。例如以所述多孔整流板23的总面积为100%计算，所述第一区域231A的面积是60%、所述第二区域231B是30%以及所述第三区域231C是10%。在另一实施例中，所述多个区域231的面积是根据基板尺寸所设定。In one embodiment, the porous rectifying plate 23 includes a plurality of regions 231 distributed from the center to the outside, and the plurality of regions 231 include: a first region 231A, a second region 231B, and a third region 231C. The first area 231A is located in the center of the porous rectifying plate 23 and has a first hole distribution density. The second area 231B is adjacent to the first area 231A and has a second hole distribution density, wherein the second hole distribution density is smaller than the first hole distribution density. The third area 231C is adjacent to the second area 231B and has a third hole distribution density, wherein the third hole distribution density is smaller than the second hole distribution density. In this embodiment, by having a reduced pore distribution density (as it moves away from the center of the porous rectifying plate 23), the edge of the substrate can have excellent film surface uniformity. It should be mentioned here that the plurality of regions 231 may have more than three regions, for example, four, five, or more than six, and the smaller the hole distribution is as the distance from the first region 231A is density. In another embodiment, each of the plurality of regions 231 has an area, wherein the area of the plurality of regions 231 decreases from the center to the outside. For example, assuming that the total area of the porous rectifying plate 23 is 100%, the area of the first area 231A is 60%, the area of the second area 231B is 30%, and the third area 231C is 10%. In another embodiment, the area of the plurality of regions 231 is set according to the size of the substrate.
本发明一实施例的真空干燥设备20的多孔温度调节装置24设在所述容置空间211内且接触所述多孔整流板23的一上表面23B。在一实施例中，所述多孔温度调节装置24例如是一多孔冷凝板，可用于控制所述多孔整流板23的温度。在一范例中，所述多孔冷凝板可包含有冷凝管、冷却液和压缩机。在另一范例中，所述多孔冷凝板的一温度调整范围介于2至30℃之间，例如温度可以根据气流的变化调整为3、4、5、7、10、15、20、25、27、28或29℃，以使所述基板上的墨水在进行真空干燥步骤后可具有优良的膜面均匀性。具体而言，通过降低所述的多孔整流板23的温度可使墨水挥发后被冷凝，进而调整膜面附近的气氛。例如，从中心朝外部分布的所述多个区域231的温度是连续的或阶段式减少，以使位在所述基板的边缘处具备优良的膜面均匀性。The porous temperature adjusting device 24 of the vacuum drying equipment 20 according to an embodiment of the present invention is arranged in the containing space 211 and contacts an upper surface 23B of the porous rectifying plate 23. In one embodiment, the porous temperature adjusting device 24 is, for example, a porous condensing plate, which can be used to control the temperature of the porous rectifying plate 23. In an example, the porous condensing plate may include a condensing tube, a cooling liquid, and a compressor. In another example, a temperature adjustment range of the porous condensing plate is between 2 and 30°C. For example, the temperature can be adjusted to 3, 4, 5, 7, 10, 15, 20, 25, 27, 28 or 29°C, so that the ink on the substrate can have excellent film surface uniformity after the vacuum drying step. Specifically, by lowering the temperature of the porous rectifying plate 23, the ink can be condensed after volatilization, thereby adjusting the atmosphere near the membrane surface. For example, the temperature of the plurality of regions 231 distributed from the center to the outside is continuously or stepwise reduced, so that the edges of the substrate have excellent film surface uniformity.
本发明一实施例的真空干燥设备20的气体抽取装置25设在所述多孔温度调节装置24的上方且连通所述腔体21的容置空间211。在一实施例中，所述气体抽取装置25包含一机械泵浦及一分子泵浦中的至少一种。本发明一实施例的真空干燥设备20通过所述气体抽取装置25进行所述腔体21内的气体的抽取，以使所述腔体21的气流依序通过所述多孔整流板23(内的孔洞232)、所述多孔温度调节装置24(内的孔洞(未绘示))而流通到所述腔体21之外。The gas extraction device 25 of the vacuum drying equipment 20 according to an embodiment of the present invention is arranged above the porous temperature adjustment device 24 and communicates with the accommodation space 211 of the cavity 21. In one embodiment, the gas extraction device 25 includes at least one of a mechanical pump and a molecular pump. The vacuum drying equipment 20 of an embodiment of the present invention extracts the gas in the cavity 21 through the gas extraction device 25, so that the airflow of the cavity 21 sequentially passes through the porous rectifying plate 23 (inner The hole 232) and the porous temperature adjusting device 24 (the inner hole (not shown)) flow out of the cavity 21.
由上可知，本发明一实施例的真空干燥设备20至少是通过多孔整流板23及多孔温度调节装置24来调整抽气时的气流变化及温度变化，进而使经喷墨打印的基板上的喷墨膜面在经过真空干燥后具备优良膜面均匀性。It can be seen from the above that the vacuum drying equipment 20 of an embodiment of the present invention uses at least the porous rectifying plate 23 and the porous temperature adjusting device 24 to adjust the airflow changes and temperature changes during pumping, so as to make the inkjet printed on the substrate The ink film surface has excellent film surface uniformity after vacuum drying.
在整个申请中，本发明在一范围形式中的可呈现各种实施例。但应当理解是，范围形式的描述仅仅是为了方便和简化，不应被解释为对本发明的范围的强行限制。因此，范围的描述应当被认为已经具体公开了所有可能的子范围以及范围内的单个数值。例如，范围的描述，从1至6应考虑到具有具体公开的子范围，如从1至3，从1至4，从1至5，从2至4，从2至6，从3至6等，以及个数在所述范围内，例如1，2，3，4，5及6，不论范围的宽度皆适用。Throughout this application, various embodiments of this invention may be presented in a range form. However, it should be understood that the description in range format is only for convenience and simplification, and should not be construed as an imposed limitation on the scope of the present invention. Therefore, the description of a range should be considered to have specifically disclosed all possible subranges and individual values within the range. For example, the description of the range from 1 to 6 should take into account that there are specific disclosed sub-ranges, such as from 1 to 3, from 1 to 4, from 1 to 5, from 2 to 4, from 2 to 6, from 3 to 6 Etc., and the number within the stated range, such as 1, 2, 3, 4, 5 and 6, regardless of the width of the range.
本发明已由上述相关实施例加以描述，然而上述实施例仅为实施本发明的范例。必需指出的是，已公开的实施例并未限制本发明的范围。相反地，包含于权利要求书的精神及范围的修改及均等设置均包括于本发明的范围内。The present invention has been described in the above-mentioned related embodiments, but the above-mentioned embodiments are only examples for implementing the present invention. It must be pointed out that the disclosed embodiments do not limit the scope of the present invention. On the contrary, modifications and equivalent arrangements included in the spirit and scope of the claims are all included in the scope of the present invention.
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| CN111873648B (en) * | 2019-08-16 | 2022-03-29 | 广东聚华印刷显示技术有限公司 | Inkjet printing vacuum drying device and inkjet printing method |
| CN110867529A (en) * | 2019-10-22 | 2020-03-06 | 深圳市华星光电半导体显示技术有限公司 | Vacuum cooling drying apparatus and display functional layer drying method |
| CN111452517A (en) * | 2020-04-15 | 2020-07-28 | Tcl华星光电技术有限公司 | Reduced pressure drying device and reduced pressure drying method |
| CN114122302B (en) * | 2021-11-15 | 2023-01-24 | 深圳市华星光电半导体显示技术有限公司 | Drying device |
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