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WO2020179426A1 - Dispositif de production d'eau pure et procédé de fonctionnement d'un dispositif de production d'eau pure - Google Patents

Dispositif de production d'eau pure et procédé de fonctionnement d'un dispositif de production d'eau pure Download PDF

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Publication number
WO2020179426A1
WO2020179426A1 PCT/JP2020/006169 JP2020006169W WO2020179426A1 WO 2020179426 A1 WO2020179426 A1 WO 2020179426A1 JP 2020006169 W JP2020006169 W JP 2020006169W WO 2020179426 A1 WO2020179426 A1 WO 2020179426A1
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Prior art keywords
pure water
water production
water
production apparatus
subsystem
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Ceased
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PCT/JP2020/006169
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English (en)
Japanese (ja)
Inventor
中馬　高明
加藤　俊正
加藤　晃久
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Kurita Water Industries Ltd
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Kurita Water Industries Ltd
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Publication of WO2020179426A1 publication Critical patent/WO2020179426A1/fr
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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D19/00—Degasification of liquids
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D61/00—Processes of separation using semi-permeable membranes, e.g. dialysis, osmosis or ultrafiltration; Apparatus, accessories or auxiliary operations specially adapted therefor
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D61/00—Processes of separation using semi-permeable membranes, e.g. dialysis, osmosis or ultrafiltration; Apparatus, accessories or auxiliary operations specially adapted therefor
    • B01D61/02—Reverse osmosis; Hyperfiltration ; Nanofiltration
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D61/00—Processes of separation using semi-permeable membranes, e.g. dialysis, osmosis or ultrafiltration; Apparatus, accessories or auxiliary operations specially adapted therefor
    • B01D61/14—Ultrafiltration; Microfiltration
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D61/00—Processes of separation using semi-permeable membranes, e.g. dialysis, osmosis or ultrafiltration; Apparatus, accessories or auxiliary operations specially adapted therefor
    • B01D61/42—Electrodialysis; Electro-osmosis ; Electro-ultrafiltration; Membrane capacitive deionization
    • B01D61/44—Ion-selective electrodialysis
    • B01D61/46—Apparatus therefor
    • B01D61/48—Apparatus therefor having one or more compartments filled with ion-exchange material, e.g. electrodeionisation
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D61/00—Processes of separation using semi-permeable membranes, e.g. dialysis, osmosis or ultrafiltration; Apparatus, accessories or auxiliary operations specially adapted therefor
    • B01D61/58—Multistep processes
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/30—Treatment of water, waste water, or sewage by irradiation
    • C02F1/32—Treatment of water, waste water, or sewage by irradiation with ultraviolet light
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/42—Treatment of water, waste water, or sewage by ion-exchange
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/44—Treatment of water, waste water, or sewage by dialysis, osmosis or reverse osmosis
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/46—Treatment of water, waste water, or sewage by electrochemical methods
    • C02F1/469—Treatment of water, waste water, or sewage by electrochemical methods by electrochemical separation, e.g. by electro-osmosis, electrodialysis, electrophoresis

Definitions

  • the present invention relates to a pure water production apparatus and an operation method of the pure water production apparatus, and more particularly to a pure water production apparatus used as raw water of ultrapure water and an operation method of the pure water production apparatus.
  • ultrapure water used in the field of electronics such as semiconductors should be treated with ultrapure water production equipment consisting of a pretreatment device, a primary pure water device, and a subsystem for processing the primary pure water. Manufactured by.
  • such an ultrapure water production apparatus is composed of a pretreatment apparatus 22, a primary pure water apparatus 23, and a subsystem (secondary pure water apparatus) 24, and such an ultrapure water production apparatus 21. Then, raw water (industrial water, city water, well water, etc.) W is treated to produce ultrapure water W3.
  • the roles of each device in FIG. 5 are as follows.
  • the pretreatment device 22 having a coagulation, pressure flotation (precipitation), filtration (film filtration) device, etc. removes suspended solids and colloidal substances in the raw water W. Further, in this process, it is possible to remove high molecular weight organic substances and hydrophobic organic substances.
  • the primary deionized water device 23 includes a tank 25 for pretreated water W1, a pump 26, an ultraviolet (UV) oxidation device 27, a regenerative ion exchange device (mixed bed type or four bed and five tower type) 28, and a membrane degassing device. It has 29 and.
  • the primary pure water device 23 removes most of the electrolytes, fine particles, viable bacteria, etc. in the pretreated water W1 and decomposes organic substances.
  • the subsystem 24 is an ultraviolet oxidizing device that processes a sub tank 31 that stores the primary pure water W2 produced by the primary pure water device 23 described above and a primary pure water W2 that is supplied from the sub tank 31 via a pump (not shown). It has 32, a platinum group metal catalyst resin tower 33, a membrane deaerator 34, a non-regenerative mixed bed ion exchange device 35, and an ultrafiltration (UF) membrane 36 as a membrane filtration device.
  • UF ultrafiltration
  • a trace amount of organic matter (TOC component) contained in the primary pure water W2 is oxidatively decomposed by ultraviolet rays by an ultraviolet oxidizing device 32, and hydrogen peroxide generated by the irradiation of the ultraviolet rays is converted into a platinum group metal catalyst resin tower.
  • the dissolved gas such as DO (dissolved oxygen) mixed in is removed by the membrane type deaerator 34 in the subsequent stage.
  • a non-regenerative mixed bed type ion exchange device 35 to remove residual carbonate ions, organic acids, anionic substances, and further metal ions and cationic substances by ion exchange.
  • fine particles are removed by an ultrafiltration (UF) membrane 36 to obtain ultrapure water (secondary pure water) W3, which is supplied to the use point (POU) 37, and the unused ultrapure water is discharged from the sub tank 31.
  • UF ultrafiltration
  • the composition of the elements in the ultrapure water W3 at the inlet of the ultrafiltration (UF) membrane 36 includes silica, a metal, and a carbon-based material as shown in FIG.
  • UF ultrafiltration
  • the water quality required for the ultrapure water W3 is becoming severer, and it is necessary to reduce the fine particles of the ultrapure water (the outlet water of the ultrafiltration (UF) membrane 36). It is desired that the silica concentration in the primary pure water (pure water) W2 produced by the primary pure water device (pure water production device) is always kept low.
  • the present invention has been made in view of the above problems, and an object of the present invention is to provide a pure water production apparatus for pure water and a method for operating the pure water production apparatus, which can always keep the silica concentration low.
  • the present invention is a pure water production apparatus for producing pure water by sequentially treating water to be treated by a reverse osmosis membrane separating apparatus and an electrodeionization apparatus, wherein the electrodesorption device is used.
  • a pure water production apparatus in which an ion apparatus is provided at the end of the pure water production apparatus (Invention 1).
  • the silica component contained in pure water (primary pure water) supplied from the pure water producing apparatus is for the following reasons. That is, the silica adsorbed on the ion exchange resin polymerizes in the ion exchange resin as the accumulated amount increases, and it becomes difficult to remove it by the regeneration treatment of the ion exchange resin. For this reason, it accumulated in the ion exchange resin with the passage of time, and eventually the ion exchange resin broke through to cause leakage of silica. Therefore, an electrodeionizer is provided at the end of the pure water production apparatus, and the treated water of the reverse osmosis membrane separator is treated by the electrodeionizer.
  • the desalting chamber of the electrodeionizer Even if the ion exchange resin inside adsorbs silica, it is ionized before the silica polymerizes, moves to the concentrated seed chamber and discharged, so that the ion exchange resin does not polymerize and accumulate, so pure water
  • the silica concentration in it can always be kept low.
  • the pure water production apparatus is a primary pure water apparatus of an ultrapure water production apparatus including a primary pure water apparatus and a subsystem (Invention 2).
  • the subsystem has an ultraviolet oxidizing device, a membrane degassing device, an ion exchange device, and a membrane filtration device (Invention 3).
  • the primary pure water (pure water) having a low silica concentration can be stably produced. Since it can be supplied to the subsystem, the load on the ion exchange device of the subsystem can be reduced, and the silica concentration and the number of fine particles of the ultrapure water treated by the membrane filtration device can be reduced.
  • the present invention is a method for operating a pure water production apparatus in which a reverse osmosis membrane separation device and an electrodeionization device are provided in order, and the electrodeionization device is provided at the end, wherein the water to be treated
  • the invention provides a method for operating a pure water production apparatus, in which pure water is produced by continuously passing water through a reverse osmosis membrane separator and an electric deionization apparatus (Invention 4).
  • an electrodeionizer is provided at the end of the pure water production apparatus, and the treated water of the reverse osmosis membrane separator is treated by the electrodeionizer. Even if the ion exchange resin in the desalination chamber of the electrodeionizer adsorbs silica, it is ionized before the silica is polymerized and moved to the concentrated seed chamber and discharged, so that the ion exchange resin is polymerized and accumulated. Since there is no such thing, the silica concentration in pure water can always be kept low.
  • the pure water producing apparatus is a primary pure water apparatus of an ultrapure water producing apparatus including a primary pure water apparatus and a subsystem, and the subsystem is an ultraviolet oxidizer and a membrane deionizer. It is preferable that an ultrapure water is produced by continuously supplying water to be treated to the primary deionized water device and the subsystem by including a gas device, an ion exchange device and a membrane type filtration device (invention 5).
  • invention 5 by using it as a primary pure water device of an ultrapure water production device, primary pure water (pure water) having a low silica concentration can be stably supplied to the subsystem. It is possible to reduce the load on the ion exchange device of the subsystem and reduce the silica concentration and the number of fine particles in the ultrapure water treated by the membrane filtration device.
  • the silica concentration of the ultrapure water obtained above can be set to 0.1 ⁇ g/L or less (Invention 6). Further, in the above inventions (Inventions 5 and 6), the number of fine particles of 50 nm or more in the obtained ultrapure water can be 100 / L or less (Invention 7).
  • a pure water production device provided with a reverse osmosis membrane separation device and an electrodeionization device in this order and provided with the electrodeionization device at the end is used as primary pure water.
  • the silica concentration can be reduced to 0.1 ⁇ g / L or less, and as a result, the number of fine particles of 50 nm or more is 100 / L or less. Can be manufactured stably.
  • the electrodeionizer since the electrodeionizer is provided at the end of the pure water production apparatus, silica does not accumulate by treating the treated water of the reverse osmosis membrane separator with the electrodeionizer. , Pure water having a low silica concentration can be constantly produced.
  • FIG. 3 is an NMR chart showing the difference between the amount of silica adsorbed on the ion exchange resin and the structure of the adsorbed silica.
  • 3 is an NMR chart showing the difference between the amount of silica adsorbed and the structure of adsorbed silica depending on the degree of crosslinking of the ion exchange resin.
  • 6 is an NMR chart showing the difference between the amount of silica adsorbed on the ion exchange resin and the structure of the adsorbed silica before and after the regeneration of the ion exchange resin.
  • FIG. 3 is a flow diagram showing an ultrapure water production system using the pure water production system according to one embodiment of the present invention. It is a flowchart which shows the ultrapure water production apparatus using the conventional pure water production apparatus. It is a graph which shows the composition of the element in the ultrapure water W at the inlet and the outlet of the ultrafiltration (UF) membrane in the ultrapure water production apparatus shown in FIG.
  • UF ultrafiltration
  • the present inventors have found the behavior of silica adsorbed on an ion exchange resin based on the characteristics of silica, and have reached it based on this.
  • the characteristics of silica and the behavior of silica adsorbed on the ion exchange resin will be described below.
  • Silica (SiO 2 ) includes silicon (Q 0 ), which is bonded to four hydroxyl groups, silicon (Q 1 ), which is bonded to three hydroxyl groups and one atom of neutral oxygen, and two silicon (Q 1 ), as shown in the following chemical formula group.
  • silicas (SiO 2 ) move from Q 0 to Q 4 as the polymerization progresses.
  • FIG. 1 shows the results of NMR analysis by the present inventors of the adsorption amount (concentration) of Si(OH) 3 ⁇ in the ion exchange resin and the abundances of five types of silica, Q 0 to Q 4 .
  • the silica is found to be in accordance with adsorption to the ion exchange resin is increased, going up the peak intensity of silicon Q 3 structure.
  • the ion exchange reaction in the ion exchange resin is an equilibrium reaction, it can be inferred that as the amount of polymerized silica in the ion exchange resin increases, the amount of polymerized silica leaking from the ion exchange resin increases due to the equilibrium reaction.
  • the present inventors prepare four types of ion exchange resins having different degrees of cross-linking (ion exchange resins A, B, C, and D in order from the one having the highest degree of cross-linking of the ion exchange resins), and have a predetermined silica adsorption amount.
  • the abundance ratios of the five kinds of silica, Q 0 to Q 4 , in the respective ion-exchange resins in Example 1 were analyzed by NMR. The results are shown in FIG. As is clear from FIG.
  • silica has a broader peak of silica as the degree of cross-linking of the ion-exchange resin is lower, and therefore the polymer of silica is complicated, and if the ion-exchange resin is flexible, it is adsorbed. It can be seen that the polymerization proceeds between the parts that have been cross-linked.
  • FIG. 4 is a flow chart showing an ultrapure water production system using the pure water production system according to an embodiment of the present invention.
  • the ultrapure water production device 1 is composed of a pretreatment device 2, a primary pure water device 3 for pure water production, and a secondary pure water device (subsystem) 4.
  • Ultrapure water W3 is produced by treating raw water (industrial water, city water, well water, etc.) W.
  • the primary deionized water device 3 has a tank 5 for pretreated water W1, a pump 6, a reverse osmosis membrane (RO membrane) separation device 7 and an electric deionization device 8, and the electric deionization device 8 is arranged at the end thereof. It is characterized by the fact that it is.
  • the subsystem 4 processes the same configuration as the subsystem 24 of the ultrapure water production apparatus 21 shown in FIG. 5, that is, the sub tank 31 and the primary pure water W2 supplied from the sub tank 31 via a pump (not shown). It has an ultraviolet oxidizing device 32, a platinum group metal catalyst resin tower 33, a film degassing device 34, a non-regenerative mixed bed ion exchange device 35, and an ultrafiltration (UF) membrane 36 as a film filtration device.
  • UF ultrafiltration
  • the raw water W is treated with a pretreatment system 2 having a coagulation, pressure flotation (precipitation), filtration (film filtration) device, etc. to remove suspended solids and colloidal substances in the raw water W and pretreated water. Get W1. Further, in this process, it is possible to remove high molecular weight organic substances and hydrophobic organic substances.
  • the primary pure water device 3 removes most of the electrolytes, fine particles, etc. in the pretreated water W1 to produce the primary pure water (pure water) W2.
  • the primary pure water device 3 of the present embodiment sequentially treats the pretreated water W1 by the reverse osmosis membrane (RO membrane) separation device 7 and the electrodeionization device 8, and is a non-regenerative ion exchange device. Does not have. Therefore, as described above, the silica contained in the treated water of the reverse osmosis membrane (RO membrane) separation device 7 does not undergo polymerization, and the electrodeionization device 8 repeatedly adsorbs and discharges the silica to the outside of the system. Therefore, primary pure water (pure water) W2 having a low silica concentration can be stably supplied.
  • the primary pure water W2 is supplied to the subsystem 4, and the ultraviolet oxidizing device 32 oxidatively decomposes a trace amount of organic matter (TOC component) contained in the primary pure water W2 by ultraviolet rays, and is generated by irradiation with the ultraviolet rays.
  • the ultraviolet rays are decomposed in the platinum group metal catalyst resin column 33, and the dissolved gas such as DO (dissolved oxygen) mixed in the film type degassing device 34 in the subsequent stage is removed.
  • DO dissolved oxygen
  • it is treated with a non-regenerative mixed bed type ion exchange device 35 to remove residual carbonate ions, organic acids, anionic substances, and further metal ions and cationic substances by ion exchange.
  • the fine particles are removed by the ultrafiltration (UF) membrane 36 to obtain ultrapure water W3, which is supplied to the use point (POU) 37, and the unused ultrapure water is refluxed to the sub tank 31.
  • UF ultrafiltration
  • the primary pure water (pure water) W2 having a low silica concentration can be stably supplied to the subsystem 4, so that the sub system 4 can be supplied.
  • the silica concentration of ultrapure water W3, which is the outlet water of the ultrafiltration (UF) membrane 36 can be reduced to 0.1 ⁇ g / L or less.
  • the proportion of fine particles in the outlet water of the ultrafiltration (UF) membrane 36 is high due to silica, the number of fine particles is reduced, and the number of fine particles of 50 nm or more is 100. It is possible to stably supply ultrapure water W3 of / L or less.
  • the pure water apparatus includes a reverse osmosis membrane separator and an electrodeionizer in order.
  • the electric deionization device is provided at the end of the pure water producing device, various modifications can be made.
  • the subsystem 4 may also be provided with a desalting means such as an RO membrane separator or an electric deionizer, and other various elements.
  • a pure water producing apparatus may be further provided in the preceding stage of the primary pure water apparatus 3 so that the pure water producing apparatus has a three-stage configuration.
  • the pure water production apparatus of the present invention is suitable as a primary pure water apparatus for an ultrapure water production apparatus, it does not have a subsystem 4 and is also used as a pure water production apparatus for simply producing pure water. You can
  • Ultrapure water W3 was produced by using the ultrapure water producing apparatus 1 having the apparatus configuration shown in FIG. 1, and the silica concentration in the outlet water (ultrapure water W3) of the ultrafiltration (UF) membrane 36 was changed every one week. The measurement was performed 5 times, and the number of fine particles of 50 nm or more was measured with a fine particle meter (K Ramic KS Kurita Industry Co., Ltd. product name). The results are shown in Table 1.
  • the subsystem 4 has the same configuration as that of the first embodiment, and constitutes an ultrapure water production system 21 as shown in FIG. 5 to produce ultrapure water W3, and the outlet water of the ultrafiltration (UF) membrane 36 (ultra pure water).
  • UF ultrafiltration
  • the silica concentration and the number of fine particles in water W3) were measured in the same manner. The results are also shown in Table 1.
  • Example 1 a pure water production device (primary pure water device) 3 having a reverse osmosis membrane separation device 7 and an electrodeionization device 8 in order and an electrodeionization device 8 provided at the end is used.
  • the silica concentration decreased from 0.08 ⁇ g / L to ⁇ 0.05 ⁇ g / L with time, and the number of fine particles of 50 nm or more was 100 / L or less.
  • the silica concentration was 0.1 ⁇ g / L or more, and the number of fine particles of 50 nm or more was 500 / L or more.
  • Ultrapure water production equipment Pretreatment equipment 3 Primary pure water equipment (pure water production equipment) 4 Secondary water purifier (subsystem) 5 Tank 6 Pump 7 Reverse Osmosis Membrane (RO Membrane) Separator 8 Electrodeionization Device 31 Sub-Tank 32 Ultraviolet Oxidation Device 33 Platinum Group Metal Catalyst Resin Tower 34 Membrane Deaeration Device 35 Non-Regenerative Mixed Bed Ion Exchange Device 36 Ultrafiltration (UF) Membrane W Raw water W1 Pretreated water W2 Primary pure water (pure water) W3 Ultra pure water (secondary pure water)

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Water Supply & Treatment (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Hydrology & Water Resources (AREA)
  • Environmental & Geological Engineering (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Urology & Nephrology (AREA)
  • Nanotechnology (AREA)
  • Analytical Chemistry (AREA)
  • Molecular Biology (AREA)
  • Electrochemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Separation Using Semi-Permeable Membranes (AREA)
  • Treatment Of Water By Ion Exchange (AREA)
  • Degasification And Air Bubble Elimination (AREA)
  • Physical Water Treatments (AREA)
  • Water Treatment By Electricity Or Magnetism (AREA)

Abstract

Ce dispositif de production d'eau ultra pure 1 est configuré à partir de trois étages de dispositifs, à savoir un dispositif de prétraitement 2, un dispositif de purification d'eau primaire 3 pour la production d'eau pure, et un sous-système 4, l'eau brute W étant traitée pour produire de l'eau ultra pure W3. Le dispositif de purification d'eau primaire comprend un réservoir d'eau prétraitée, une pompe, un dispositif de séparation à membrane d'osmose inverse et un dispositif de désionisation électrique, le dispositif de désionisation électrique au niveau de l'extrémité. Le sous-système 4 comprend un sous-réservoir 31, un dispositif d'oxydation de rayons UV 32 qui traite l'eau pure primaire W2 alimentée à partir du sous-réservoir 31, une tour de résine de catalyseur métallique de groupe platine 33, un dispositif de désaération de type film 34, un dispositif d'échange d'ions de type lit mélangé non régénératif 35, et une membrane d'ultrafiltration 36 en tant que dispositif de filtration à membrane. Ce dispositif de production d'eau ultra pure permet toujours de maintenir la concentration de silice faible.
PCT/JP2020/006169 2019-03-05 2020-02-18 Dispositif de production d'eau pure et procédé de fonctionnement d'un dispositif de production d'eau pure Ceased WO2020179426A1 (fr)

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WO2023234415A1 (fr) * 2022-06-03 2023-12-07 東レ株式会社 Membrane semi-perméable composite et son procédé de fabrication

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JP6778591B2 (ja) * 2016-11-25 2020-11-04 野村マイクロ・サイエンス株式会社 超純水製造方法及び超純水製造システム

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Publication number Priority date Publication date Assignee Title
JPH0957271A (ja) * 1995-08-22 1997-03-04 Japan Organo Co Ltd 電気脱イオン法による被処理水の処理方法及びその方法に使用する装置
JP2010172806A (ja) * 2009-01-28 2010-08-12 Miura Co Ltd 純水製造システム
JP2017131846A (ja) * 2016-01-28 2017-08-03 栗田工業株式会社 超純水製造装置および超純水製造装置の運転方法
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JPWO2024014218A1 (fr) * 2022-07-14 2024-01-18
WO2024014218A1 (fr) * 2022-07-14 2024-01-18 栗田工業株式会社 Appareil de production d'eau ultrapure et procédé de fonctionnement d'un appareil de production d'eau ultrapure
JP7513213B2 (ja) 2022-07-14 2024-07-09 栗田工業株式会社 超純水製造装置及び超純水製造装置の運転方法

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