[go: up one dir, main page]

WO2020145266A1 - Dispositif d'exposition à la lumière, dispositif d'imagerie et dispositif de traitement laser - Google Patents

Dispositif d'exposition à la lumière, dispositif d'imagerie et dispositif de traitement laser Download PDF

Info

Publication number
WO2020145266A1
WO2020145266A1 PCT/JP2020/000162 JP2020000162W WO2020145266A1 WO 2020145266 A1 WO2020145266 A1 WO 2020145266A1 JP 2020000162 W JP2020000162 W JP 2020000162W WO 2020145266 A1 WO2020145266 A1 WO 2020145266A1
Authority
WO
WIPO (PCT)
Prior art keywords
light
irradiation device
light irradiation
ports
interval
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/JP2020/000162
Other languages
English (en)
Japanese (ja)
Inventor
拓夫 種村
太一郎 福井
義昭 中野
大之 山下
亮汰 田之村
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
University of Tokyo NUC
Original Assignee
University of Tokyo NUC
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by University of Tokyo NUC filed Critical University of Tokyo NUC
Publication of WO2020145266A1 publication Critical patent/WO2020145266A1/fr
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Images

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
    • B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
    • B23K26/064—Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
    • B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
    • B23K26/067—Dividing the beam into multiple beams, e.g. multifocusing
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/03—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on ceramics or electro-optical crystals, e.g. exhibiting Pockels effect or Kerr effect
    • G02F1/035—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on ceramics or electro-optical crystals, e.g. exhibiting Pockels effect or Kerr effect in an optical waveguide structure
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/29—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the position or the direction of light beams, i.e. deflection
    • G02F1/295—Analog deflection from or in an optical waveguide structure]

Definitions

  • the present invention relates to a light irradiation device that emits light whose phase is controlled from a plurality of light guide paths, and an imaging device and a laser processing device that incorporate the light irradiation device.
  • OPA optical phased array
  • the spatial frequency component originating between the light emitting points with a short distance becomes dominant in the light beam pattern, and the light emitting points are compared with the number of light emitting points.
  • the beam pattern resolution cannot be increased.
  • Non-Patent Document 2 Regarding antennas for receiving radio waves, as an array of linear arrays, an array is being considered to reduce redundancy and uniformize sensitivity by spatial frequency (Non-Patent Document 2).
  • An object of the present invention is to provide a light irradiation device capable of increasing the resolution of a light beam pattern according to the number of light emitting points, and an imaging device and a laser processing device incorporating the light irradiation device.
  • the light irradiation device includes a plurality of light guide portions that respectively pass light, and a phase that adjusts the phase of light emitted from a plurality of emission ports provided in the plurality of light guide portions. And a plurality of injection ports are arranged at a minimum redundant interval.
  • the plurality of emission ports provided in the plurality of light guide portions are arranged at the minimum redundant interval, the light emitted from the plurality of emission ports can be suppressed while suppressing an increase in the number of emission ports.
  • the resolution of the combined light beam pattern can be increased.
  • light is emitted from a plurality of emission ports simultaneously in parallel.
  • light beam components corresponding to a plurality of combinations selected from a plurality of emission ports can be formed in parallel, and light beams having various patterns can be formed.
  • the interval or the set of interval vectors of the pair of injection ports obtained by extracting all the combinations of the pair of injection ports selectable from the plurality of injection ports has a substantially uniform overlap. Is set in degrees. In this case, it is possible to achieve a substantially uniform spatial frequency distribution with respect to the light beams emitted from the plurality of emission ports, so that it is possible to effectively increase the resolution while suppressing an increase in the number of emission ports.
  • the arrangement of the plurality of injection ports maximizes the spatial autocorrelation with a substantially uniform density when the number of the plurality of injection ports is fixed.
  • the light beam pattern can be formed with the maximum number of resolvable points that can be achieved while minimizing the number of emission ports.
  • the plurality of injection ports are arranged one-dimensionally so as to form a Golomb ruler.
  • the Golomb ruler array is designed to minimize spacing redundancy.
  • the plurality of injection ports are arranged two-dimensionally so as to form a Costas arrangement.
  • the Costas array minimizes the redundancy of the interval vector.
  • the plurality of light guide sections are a plurality of waveguides.
  • the integrated circuit type light irradiation device can be easily manufactured, and the size of the light irradiation device can be reduced and the structure can be simplified.
  • a light source unit and a light branching unit that splits light from the light source unit and makes the light incident on a plurality of light guide units are further provided.
  • the light irradiation device can be operated by a single light source.
  • a control device which outputs a control signal to the phase adjustment unit to control a combined state of lights emitted from the plurality of emission ports.
  • the intensity pattern of the light beam output from the light irradiation device can be brought into a desired state under the control of the control device.
  • the light source unit has a continuous wave laser or a pulse laser.
  • the light beam pattern output from the light irradiation device can be switched at high speed to perform illumination, display, processing, etc. as a series of processing.
  • an imaging device includes a light irradiation device described above, a measurement sensor that detects the intensity of measurement light from a target illuminated by light emitted from the light irradiation device, and a measurement sensor. And an information processing unit that performs a process of extracting an image relating to the state of the target from the detection information obtained by.
  • the above-mentioned imaging device uses a simple but high-resolution light irradiation device, and it is possible to perform highly accurate measurement and the like by means of simplified processing.
  • an illumination image sensor that detects an irradiation intensity distribution of light emitted from the light irradiation device is further provided, and the light irradiation device is an illumination light having a random phase distribution. Inject.
  • a laser processing apparatus controls a combined state of light emitted from a plurality of emission ports by outputting a control signal to the light irradiation apparatus and the phase adjusting unit described above. And a control device.
  • the laser processing device uses a simple but high-resolution light irradiation device, and can perform high-precision processing with simplified processing.
  • the laser processing apparatus further includes a light source unit and a light branching unit that splits the light from the light source unit and causes the light to enter the plurality of light guide units.
  • FIG. 1A is a conceptual block diagram for explaining the light irradiation device of the first embodiment
  • FIG. 1B is a conceptual plan view for explaining an optical phased array incorporated in the light irradiation device shown in FIG. 1A
  • .. 2A is a conceptual diagram illustrating an array of emission ports of the optical phased array illustrated in FIG. 1B
  • FIG. 2B is a diagram illustrating autocorrelation of the array illustrated in FIG. 2A
  • FIG. 2C is a diagram illustrating an array of injection ports of a comparative example
  • FIG. 2D is a diagram illustrating autocorrelation of an array of injection ports of a comparative example.
  • FIG. 4A is a diagram illustrating an injection port that is one-dimensionally arranged so as to form an array of Golomb rulers that realize a minimum redundant interval
  • FIG. 4B is two-dimensionally arranged so as to form a Costas array. It is a figure explaining the injection port which exists. It is a mounting example of a phased array, and is a plan view explaining a specific one-dimensional array of injection ports. It is a mounting example of a phased array, and is a plan view explaining a specific two-dimensional array of injection ports.
  • FIG. 4A is a diagram illustrating an injection port that is one-dimensionally arranged so as to form an array of Golomb rulers that realize a minimum redundant interval
  • FIG. 4B is two-dimensionally arranged so as to form a Costas array. It is a figure explaining the injection port which exists. It is a mounting example of a phased array, and is a plan view explaining a specific one-dimensional array of injection ports. It is a mounting example of a phased
  • FIG. 7C shows an autocorrelation function in the case of an array
  • FIG. 7C shows an autocorrelation function in the case of a random array.
  • FIG. 8B is a diagram for explaining achievement of the number of resolution points according to the concrete example.
  • FIG. 9C shows a comparison in which the emission ports are two-dimensionally arranged at equal intervals.
  • FIG. It is a figure explaining formation of the light beam of (case).
  • It is a conceptual block diagram explaining the phased array etc. incorporated in the light irradiation apparatus of 2nd Embodiment.
  • It is a conceptual block diagram explaining the phased array etc. incorporated in the light irradiation apparatus of 3rd Embodiment.
  • FIG. 15B is a one-dimensional image reconstruction by ghost imaging. It is a figure explaining a structure.
  • FIG. 9 is a diagram illustrating formation of a random pattern in the case of. It is a conceptual block diagram explaining the light irradiation apparatus of 6th Embodiment.
  • the light irradiation device 100 of the first embodiment shown in FIG. 1A receives a laser light B1 from the light source unit 20 that generates a laser light B1, and forms and emits irradiation light B2 having a desired wavefront state by receiving the laser light B1 from the light source unit 20.
  • the light beam forming unit 30 and the control device 70 that comprehensively controls the operations of the light source unit 20 and the light beam forming unit 30 are provided.
  • the light irradiation device 100 shown in FIG. 1A can be used as, for example, a projector that projects a desired light pattern, and can also be used as a laser processing device that processes an object using the irradiation light pattern.
  • the light source unit 20 is composed of a coherent light source 21 such as a semiconductor laser, and is accompanied by a light source drive unit 22 which is a light source drive circuit. From the light source unit 20, laser light B1 set in various wavelength regions such as an infrared region and a visible region is emitted as a pulse wave or a continuous wave, for example.
  • the coherent light source 21 is a pulsed laser
  • the pulsed laser light B1 can be emitted from the light source unit 20 at precise timing.
  • the light beam forming unit 30 has an optical phased array (OPA) 31 and an OPA driving unit 32.
  • OPA optical phased array
  • the optical phased array 31 is an optical waveguide type integrated circuit, includes a light branching section 31a and a phase adjusting section 31b on a substrate 31s, and receives the laser beam B1 from the light source section 20.
  • An input unit 31c and a light output unit 31d that outputs the irradiation light B2 are provided.
  • the output of the optical phased array 31 can be switched in a short time of, for example, several tens of ⁇ s or less, and illumination and processing that operate at high speed can be performed.
  • the optical branching unit 31a branches the laser light B1 into M channels and guides the laser beams B1 to M waveguides 36 that are M light guiding units.
  • M 8 as an example, but the value M can be set to an arbitrary natural number of 3 or more.
  • the waveguides (light guide portions) 36 extend in one Z direction parallel to the XZ plane in which the substrate 31s extends and are arranged in the X direction orthogonal to the Z direction.
  • a star coupler having a slab waveguide, a combination of multi-stage directional couplers, or the like can be used.
  • the phase adjustment unit 31b includes M electrodes 37a that apply, for example, an electric field to the waveguides (light guide units) 36 of M channels, and a wiring 37b that enables voltage supply to each electrode 37a. ..
  • the electrode 37a is formed over a predetermined width along the M waveguides 36. That is, M electrodes 37a are arranged in the X direction.
  • the voltage supplied to the wiring 37b is adjusted by the OPA driving unit 32 shown in FIG. 1A so that it can be switched at high speed. By adjusting the voltage applied to each wiring 37b, the phase state of the laser beam B1 passing through each waveguide 36 can be individually controlled.
  • the element lights whose phase states have been adjusted are simultaneously emitted in parallel from the respective emission ports 38 of the optical phased array 31 that have passed through the phase adjustment unit 31b, and the light output unit 31d illuminates the individual element lights combined.
  • the light B2 is emitted. That is, the illumination light B2 is a light beam having a desired phase distribution or wavefront distribution in the ⁇ X directions.
  • the illumination light B2 becomes a light beam that travels in a direction that forms a desired angle with respect to the Z axis, and the illumination beam B2 is a light beam with respect to the Z axis. Scanning in the XZ plane is also possible by increasing or decreasing the angle.
  • the phase adjuster 31b is not limited to the electro-optic effect type modulation that adjusts the phase by the electric field strength applied to the waveguide 36, but also the carrier effect type modulation and the waveguide that adjusts the phase by injecting current into the waveguide section.
  • Thermo-optical effect type modulation or the like in which the phase is adjusted by heating can be used.
  • the phase adjusting unit 31b can be made small and inexpensive, the reliability can be improved, and the phase switching can be speeded up.
  • the lens 100c is arranged so as to face the light output unit 31d of the optical phased array 31.
  • the lens 100c has a predetermined focal length. For example, if the light output unit 31d is arranged at the front focal position of the lens 100c, the rear focal position of the lens 100c becomes a Fourier transform surface, and the rear focal point is With the position as the irradiation surface, a far-field illumination pattern corresponding to the far wavefront pattern of the illumination light B2 emitted from the light output unit 31d can be formed on the irradiation surface.
  • the control device 70 has an information processing unit 71, an interface unit 72, and a storage unit 73.
  • the information processing unit 71 operates the optical phased array 31 and the like via the interface unit 72, the OPA driving unit 32, and the light source driving unit 22 based on data including drive information, control information, and the like stored in the storage unit 73. Then, the illumination light B2 having a predetermined phase distribution is emitted as a predetermined pattern.
  • the input/output unit 91 presents various kinds of information regarding the operating conditions and operating states of the light irradiation device 100 to the operator. The operator inputs an instruction to the control device 70 via the input/output unit 91.
  • the controller 70 cooperates with the OPA driver 32 to output a control signal to the phase adjuster 31b of the optical phased array 31 to control the combined state of the lights emitted from the plurality of emission ports 38. At the same time, the composite pattern can be changed at high speed.
  • the surface of the target can be laser-processed by irradiating the target with laser light in a desired irradiation pattern. Further, by operating the light irradiation device 100 under the control of the control device 70, it is possible to illuminate the surface or the like of the target with a desired irradiation pattern.
  • the light output unit 31d shown in FIG. 2A is a partial extraction of the light output unit 31d shown in FIG. 1B.
  • the horizontal axis represents the distance ⁇ x corresponding to the amount of parallel displacement
  • the vertical axis represents the value of autocorrelation.
  • FIG. 2C is a diagram illustrating an optical output unit 31d of the optical phased array 231 of the comparative example.
  • Waveguides are aligned and arranged.
  • the places where the waveguides are aligned and arranged gradually decrease.
  • the autocorrelation has a narrow band non-flat characteristic with respect to the positional deviation, and the autocorrelation is narrowly biased. It can be said that it has become.
  • FIG. 3 is a diagram for explaining the arrangement of the minimum redundant intervals realized in the light output section 31d of the optical phased array 31 shown in FIG. 1B from another aspect.
  • the intensity distribution P1 of the near-field output I NFP (x) corresponding to the pattern of the illumination light B2 emitted from the plurality of emission ports 38 provided in the light output unit 31d reflects the arrangement of the emission ports 38 and has the minimum redundancy interval. It corresponds to the array of.
  • the intensity distribution P2 of the hyperopic output IFFP (x') on the irradiation surface at the rear focal position by the lens 100c reflects the emission angle of the illumination light B2 from the emission port 38.
  • the distribution shape P3 of the spatial spectrum S FFP (k) obtained by Fourier transforming the intensity distribution P2 of the hyperopic output I FFP (x′) corresponds to the autocorrelation in FIG. 2C. That is, by arranging the injection ports 38 at the minimum redundant interval, the distribution shape P3 of the spatial spectrum can be spread to the maximum wide band with uniform density. As a result, the light beam pattern can be formed so as to maximize the number of resolution points that can be achieved under the condition that the number of the emission ports 38 is limited. For example, under a situation where the number of injection ports 38 and the irradiation possible range (FSR: free spectral range) are fixed, finer patterns can be imaged and the spatial resolution can be efficiently improved.
  • FSR free spectral range
  • Arranging the plurality of emission ports 38 constituting the light output unit 31d one-dimensionally at the minimum redundant interval is to extract all combinations of the pair of emission ports 38, 38 that can be selected from the plurality of emission ports 38.
  • the obtained set of intervals between the pair of injection ports 38, 38 (corresponding to a combination that realizes the discrete distance ⁇ x forming the horizontal axis in FIG. 2B) is set to have a substantially uniform degree of overlap.
  • a spatially uniform spatial frequency distribution can be achieved one-dimensionally with respect to the light beam formed by the illumination light B2 emitted from the plurality of emission ports 38, so that the resolution is improved while suppressing the increase in the number of emission ports 38. Can be increased.
  • the light output unit 31d forming the optical phased array 31 is one-dimensional in the X direction, and the illumination light B2 having a desired one-dimensional array phase distribution or pattern is emitted from the light output unit 31d.
  • an optical phased array having the same structure as the optical phased array 31 shown in FIG. 1B can be stacked in the Y direction. With such a laminated type optical phased array, it is possible to form and emit the illumination light B2 having a two-dimensional phase distribution in the XY directions.
  • the light output unit 31d includes a plurality of emission ports 38 that are two-dimensionally arranged in the XY direction (or the XZ direction when taken out in the direction perpendicular to the main surface of the substrate 38), the light output unit 31d is also included. Of the plurality of injection ports 38 are arranged two-dimensionally with a minimum redundancy interval.
  • the light output section 31d or the port array 131d is arranged within the full width of the array and the distance ⁇ x in the ⁇ X direction or ⁇ Y direction which is the arrangement direction.
  • the positional autocorrelations of the port array 131d before and after the translation are arranged so as to have a uniform density and a wide band as much as possible.
  • Strictly two-dimensionally arranging the plurality of emission ports 38 configuring the light output unit 31d at the minimum redundant interval extracts all combinations of the pair of emission ports 38, 38 selectable from the plurality of emission ports 38.
  • a spatially uniform spatial frequency distribution can be achieved two-dimensionally with respect to the light beam formed by the illumination light B2 emitted from the plurality of emission ports 38, so that the resolution can be effectively reduced while suppressing the increase in the number of emission ports 38. Can be increased.
  • FIG. 4A is a diagram illustrating a specific method of arranging a plurality of emission ports 38 forming the light output unit 31d one-dimensionally with a minimum redundancy interval.
  • the set of intervals of the pair of ejection ports 38, 38 obtained by extracting all the combinations of the pair of ejection ports 38, 38 that can be selected from the plurality of ejection ports 38 arranged one-dimensionally is the shortest interval.
  • the reference number is 1, 2, 3, 4, 5, and 6, and includes a sequence of gradually increasing elements, and an array with a minimum redundancy interval is realized.
  • the sequence shown in FIG. 4A corresponds to the sequence of the Golomb ruler.
  • the plurality of emission ports 38 forming the light output section 31d are arranged one-dimensionally so as to form a Golomb ruler with the minimum redundancy of intervals.
  • the array at the minimum redundant interval is not limited to the array of the strict Golomb ruler, and may be an array in which the interval between the pair of injection ports 38 is slightly overlapped or missing.
  • the set of intervals of the injection ports 38 is not basically based on a single sequence of numbers, but may be a sequence of two or more sequences in which the same value is evenly repeated. Things are also included in the array with the minimum redundancy interval.
  • the injection port 38 is not limited to a position that is an exact multiple of an integer with respect to the shortest interval, and a structure in which the injection port 38 is slightly shifted with respect to an integer multiple is an array with the minimum redundancy interval. include.
  • FIG. 4B is a diagram for explaining a specific example in which the plurality of emission ports 38 forming the light output unit 31d are two-dimensionally arranged at the minimum redundancy interval.
  • the array of the ejection ports 38 providing such a set of interval vectors realizes the array with the minimum redundant interval.
  • the sequence shown in FIG. 4B corresponds to the Costas sequence. That is, the plurality of emission ports 38 forming the light output unit 31d are two-dimensionally arranged so as to form a Costas array in which the redundancy of the interval vector is minimized.
  • the array at the minimum redundant interval is not limited to the array of the strict Costas ruler, but may be an array in which the interval vectors of the pair of injection ports 38 have some overlap, and the same interval vector is repeated twice. It may be composed of the above several sequences.
  • FIG. 5 is a plan view illustrating a specific implementation example of the optical phased array 31 including a plurality of emission ports 38 which are one-dimensionally arranged at the minimum redundant interval.
  • illustration of the optical branching unit 31a and the phase adjusting unit 31b is omitted.
  • FIG. 6 is a plan view illustrating a specific mounting example of the optical phased array 31 including a plurality of emission ports 38 that are two-dimensionally arranged at the minimum redundancy interval.
  • the density ⁇ x corresponding to the positional deviation amount is substantially uniform except the position where it is zero, or the density that is as uniform as possible (that is, a substantially uniform density that is recognized as conforming to the uniform density. It can be seen that the autocorrelation distribution over a wide range is achieved by ).
  • the distance ⁇ x is randomly arranged in the range of 0.5 to 1.5.
  • a non-uniform and narrow autocorrelation distribution is formed around the position where the distance ⁇ x corresponding to the positional deviation amount is zero.
  • FIG. 8A shows a result of performing a simulation for forming a light beam as the illumination light B2 emitted from the light irradiation device 100 shown in FIG. 1A.
  • the phase adjusting unit 31b is linearly driven to form the light beam.
  • the horizontal axis indicates the pixel position, and the vertical axis indicates the intensity.
  • 2 shows a combined beam when one-dimensionally arranged at equal intervals equal to the minimum interval of.
  • the beam width can be made extremely narrow and the resolution can be improved by arranging the injection ports 38 at the minimum redundant interval as shown by the solid line.
  • the noise level becomes high when they are arranged at the minimum redundancy interval shown by the solid line.
  • FIG. 8B is a diagram for explaining the relationship between the number of ejection ports and the number of resolution points.
  • the solid line indicates the number of resolution points that can be formed when the ejection ports are one-dimensionally arranged at the minimum redundancy interval corresponding to the Golomb ruler, and the broken line can be formed when the ejection ports are one-dimensionally arranged at equal intervals. Indicates the number of resolution points.
  • the number of resolution points indicated by the solid line increases in proportion to M 2
  • the number of resolution points indicated by the broken line increases in proportion to M.
  • the spot-shaped light beam having a small diameter is formed repeatedly at the FSR interval, and the beam scanning with high resolution is possible.
  • the spot-shaped light beam having a small diameter is formed repeatedly at the FSR interval, and the beam scanning with high resolution is possible.
  • the plurality of emission ports 38 provided in the plurality of waveguides (light guide portions) 36 are arranged at the minimum redundant interval, so that the number of emission ports 38 is reduced. While suppressing the increase, it is possible to improve the resolution of the light beam pattern that combines the lights emitted from the plurality of emission ports 38, and it is possible to increase the number of resolution points of the light beam pattern.
  • the light irradiation apparatus according to the second embodiment is a modification of the first embodiment, and parts that are not particularly described are the same as those in the first embodiment.
  • the light beam forming unit 30 or the optical phased array 231 incorporated in the light irradiation apparatus of the second embodiment includes a main body portion 230a having a structure similar to that of the optical phased array 31 shown in FIG. 1B, and a main body.
  • the optical coupling section 230b is disposed near the optical output section 31d of the portion 230a, and the multi-core bundle fiber 230c is disposed near the optical output section of the optical coupling section 230b.
  • the optical coupling part 230b is a three-dimensional optical circuit, and for example, a photonic lantern can be used.
  • the optical coupling section 230b receives the illumination light B21, which is a one-dimensional optical signal emitted from the optical output section 31d of the main body section 230a, at the light incident section, and receives the one-dimensional optical signal as a two-dimensional optical signal.
  • the light is converted to B22 and emitted from the light output unit.
  • the multi-core bundle fiber 230c receives the illumination light B22, which is a two-dimensional optical signal emitted from the emission part of the optical coupling part 230b, at the incident end 3a and extends from a plurality of incident ports formed at the incident end 3a.
  • the illumination light B2 which is a two-dimensional optical signal, is emitted from the emission end 3c.
  • the plurality of injection ports 238 formed in the ejection end 3c are two-dimensionally arranged with a minimum redundant interval, for example, with a second type minimum redundant interval in which a Golomb ruler is repeated vertically and horizontally. There is. In the case of the present embodiment, it is not necessary to arrange the emission ports 38 at the minimum redundant interval in the light output section 31d of the main body portion 230a, and they are arranged at equal intervals.
  • the light irradiation device according to the third embodiment is a modification of the first embodiment, and parts that are not particularly described are the same as those in the first embodiment.
  • the illumination light B2 having a two-dimensional phase distribution is formed using a one-dimensional optical phased array (OPA).
  • OPA optical phased array
  • the light beam forming unit 30 or the optical phased array 331 incorporated in the light irradiation device of the third embodiment has a main body portion 330a having a structure similar to that of the optical phased array 31 shown in FIG. 1B, and a main body.
  • the prism 330b which is a branching portion disposed on the light output portion 31d side of the portion 330a and extending along the arrangement direction of the light output portion 31d, is provided.
  • the illumination light B2 emitted from the light output unit 31d via the waveguide 36 has a phase distribution in the arrangement direction of the light output unit 31d.
  • the illumination light B2 is deflected through the prism 330b in the direction orthogonal to the arrangement direction of the light output units 31d, but at this time, the deflection angle differs depending on the wavelength component of the illumination light B2. Therefore, by sweeping the wavelength of the light source light B12, while scanning the beam in the direction orthogonal to the arrangement direction of the light emitting unit 31d, a desired beam is generated by the optical phased array 331 in the arrangement direction of the light emitting unit 31d. Can be formed. Alternatively, it is possible to form the illumination light B2 having a two-dimensional phase distribution divided into wavelength components by using a broadband light source.
  • a diffraction grating may be used instead of the prism 330b. Further, the same effect can be obtained by integrating a diffraction grating type coupler at the light output portion 31d and extracting light in a direction perpendicular to the substrate 31s. Further, instead of using a broadband light source as the light source unit 20, a wavelength variable light source may be used to sweep the wavelength over time.
  • the imaging device according to the fourth embodiment incorporates the light irradiation device of the first embodiment, and parts that are not particularly described are the same as those of the first embodiment.
  • the imaging apparatus 200 of the fourth embodiment is illuminated by the illumination optical system 40 for illumination and measurement and the illumination light B2 in addition to the light irradiation apparatus 100 having the structure shown in FIG. And a light receiving element 60 that detects the intensity of the measurement light B3 from the target OB.
  • the observation optical system 40 includes a branch mirror 43 and a plurality of lenses L1 and L2.
  • the branch mirror 43 is a half mirror having a uniform transmittance or reflectance.
  • the branch mirror 43 partially transmits the illumination light B2 from the optical phased array 31 to enter the object OB, and also reflects the measurement light B3 that is the return light reflected by the scattering on the surface OBa of the object OB. Lead to the light receiving element 60.
  • the lens L1 enables illumination in the far-field state while preventing divergence of the illumination light B2 emitted from the optical phased array 31.
  • the lens L2 forms an image of the measurement light B3 reflected by the target OB on the photosensitive portion 61 of the light receiving element 60.
  • the light receiving element 60 is a measurement sensor that detects the intensity of the measurement light from the illuminated target.
  • the light receiving element 60 has sensitivity to the wavelength of the light source unit 20 and can be provided with a wavelength selection filter.
  • the light receiving element 60 is driven by the light receiving element driving unit 82 to operate, and outputs the intensity signal of the measurement light B3 incident on the photosensitive unit 61. Note that, although FIG. 13 shows an example of a system that measures the reflected light from the target OB, imaging can be similarly performed by measuring the light that has transmitted through the target OB.
  • the light irradiation device 100 can operate the light beam forming unit 30 under the control of the control device 70 to two-dimensionally scan, for example, a spot-shaped light beam on the surface OBa of the target OB.
  • the light-receiving element 60 is driven by the light-receiving element driving unit 82 under the control of the control device 70, and measures the change with time of the pattern signal of the measurement light B3.
  • the light irradiation device 100 can measure the three-dimensional shape of the target OB from the scanning position and scanning timing of the spot-shaped light beam.
  • the imaging device according to the fifth embodiment incorporates the light irradiation device according to the first embodiment, and is a partial modification of the imaging device according to the fourth embodiment. Is the same as in the first or fourth embodiment.
  • an observation optical system 40 for illumination and measurement, and an irradiation state of the illumination light B2. Is included as a distribution, and a light receiving element 560 that detects the intensity of the measurement light B3 from the target OB illuminated by the illumination light B2.
  • the illumination light B2 controlled in the phase state having a random phase distribution is emitted from the light output unit 31d of the optical phased array 31 of the light irradiation device 100. Further, the illumination light B2 changes at high speed in time series, and the illumination light B2, which itself has a random phase distribution, is emitted as N different patterns. That is, each of these N patterns or N types of illumination light B2 has a random phase distribution and changes randomly in time series. In each pattern, the distribution range of the random phase is ⁇ 180°, and there is no bias.
  • the phase adjusting unit 31b forming the optical phased array 31 When the phase adjusting unit 31b forming the optical phased array 31 is one-dimensional in the X direction, the light output unit 31d emits the illumination light B2 having a one-dimensional random phase distribution or pattern. When the phase adjuster 31b is two-dimensional in the XY directions, the light output unit 31d can emit the illumination light B2 having a two-dimensional array of random phase distributions or patterns.
  • the observation optical system 40 includes a branch mirror 43 and a plurality of lenses L1, L22, L3.
  • the branch mirror 43 splits the illumination light B2 from the optical phased array 31 so that a part thereof is incident on the target OB and the rest is incident on the illumination image sensor 50.
  • the branch mirror 43 also reflects the measurement light B3, which is the return light reflected by the scattering on the surface OBa of the target OB, and guides it to the light receiving element 560.
  • the lens L1 enables illumination in the far-field state while preventing divergence of the illumination light B2 emitted from the optical phased array 31.
  • the lens L22 reduces the luminous flux diameter of the measurement light B3 reflected by the target OB and makes it incident on the photosensitive portion 561 of the light receiving element 560 at once.
  • the lens L3 cooperates with the lens L1 to form a pattern of the illumination light B2 as a far-field image on the photosensitive surface 51 of the illumination image sensor 50.
  • the light receiving element 560 collectively detects the intensity of the measurement light reflected by the target OB
  • the illumination image sensor 50 detects the far-field image of the illumination light emitted from the optical phased array 31.
  • FIG. 14 shows an example of a system that measures the reflected light from the target OB, imaging can be performed in the same manner by measuring the light that has passed through the target OB.
  • the illumination image sensor 50 is a semiconductor image sensor such as CMOS or CCD.
  • the illumination image sensor 50 has sensitivity to the wavelength of the light source unit 20 and can be provided with a wavelength selection filter.
  • the illumination image sensor 50 detects the pattern of the illumination light B2 formed on the photosensitive surface 51 and captures it as a detection image. At this time, the intensity value of the illumination light B2 is detected for each pixel position. As described above, since the illumination light B2 is emitted in the N pattern by the optical phased array 31, N detection images of the illumination light B2 are also obtained.
  • the control device 70 operates the optical phased array 31 and the like via the interface unit 72 and the OPA drive unit 32 to emit the illumination light B2 having a random phase distribution in a plurality of patterns.
  • the information processing section 71 receives the detection image captured by the illumination image sensor 50 together with the timing information via the interface section 72.
  • the control device 70 receives the intensity of the measurement light B3 detected by the light receiving element 560 together with the timing information via the interface unit 72.
  • the information processing unit 71 temporarily stores the detection image of the illumination light B2 acquired from the illumination image sensor 50 and the intensity value of the measurement light B3 acquired from the light receiving element 560 in the storage unit 73, and also detects these detection image and intensity.
  • the state of the target OB obtained from the value is stored as a measurement result or a reconstructed image.
  • the information processing section 71 causes the position information on the illumination image sensor 50 (specifically, the coordinates corresponding to the X coordinate or the XY coordinate on the object OB shown in the figure and the coordinate corresponding to the Z axis on the illumination image sensor 50).
  • a value such as X is premised, and a reconstructed image is calculated from the detection information of the illumination image sensor 50 and the detection information of the light receiving element 560.
  • This reconstructed image represents the state of the target OB, such as the reflectance of the target OB.
  • the information processing section 71 changes the phase distribution of the illumination light B2 of the one-dimensional array from the optical phased array 31 of the one-dimensional structure N times, and the total signal intensity detected by the light receiving element 560,
  • the reconstructed image O(x) is calculated from the signal intensity at the target position on the illumination image sensor 50.
  • the value x corresponds to the X axis on the target OB in the apparatus configuration of FIG. 1, but corresponds to the Z axis on the illumination image sensor 50.
  • the value x on the illumination image sensor 50 is a discrete value corresponding to a pixel.
  • the value N indicates the number (natural number) of random patterns formed and output by the optical phased array 31.
  • the value S r represents the measurement value of the light receiving element 60, that is, the intensity value of the measurement light B3.
  • the value ⁇ S> indicates the average value of N values S r obtained by N times of measurements with the random pattern changed.
  • I r (x) represents the relationship between the coordinate value x on the illumination image sensor 50 and the intensity value at the pixel corresponding to this coordinate value x, that is, the detected brightness.
  • ⁇ means adding (S r ⁇ S>) ⁇ I r (x) while changing the variable r of the values S r and I r (x) from 1 to N.
  • This reconstructed image O(x) gives the brightness value of the reconstructed image to each coordinate value x.
  • Equation (1) above determines the reconstructed image O(x) with respect to the one-dimensional pixel array in the illumination image sensor 50, but the optical phased array 31 has a two-dimensional structure and the illumination image sensor 50
  • a process of determining the reconstructed image O(x, y) is performed on the two-dimensional pixel array.
  • the value y corresponds to the Y axis on the target OB, and also corresponds to the Y axis on the illumination image sensor 50.
  • the above formula (1) or formula (2) is an example of a method (ghost imaging) for obtaining a reconstructed image of the target OB from a random illumination pattern, and statistical processing, optimization processing, etc. may be added. Alternatively, another algorithm can obtain a reconstructed image of the target OB.
  • FIG. 15A and 15B are charts showing simulation results using the imaging apparatus 200 of the embodiment.
  • the horizontal axis represents the pixel position, and the vertical axis represents the irradiation intensity.
  • the broken line shows a one-dimensional random illumination pattern achieved by the conventional uniform arrangement, and the waveform is dull. It can be seen that the optical phased array 31 of the embodiment can form a one-dimensional random illumination pattern with extremely high precision.
  • the solid line corresponds to the solid line in FIG.
  • a constituent image is shown.
  • the dotted line shows the original waveform to be restored, and it can be seen that extremely precise image reconstruction is possible with the optical phased array 31 of the embodiment.
  • the dashed line corresponds to the dashed line in FIG. 15B and shows the reconstructed image obtained using the random illumination achieved by the conventional uniform array.
  • the imaging apparatus according to the sixth embodiment is a modification of the fifth embodiment, and parts that are not particularly described are the same as in the fifth embodiment.
  • the electrodes for operating the optical phased array (OPA) are simple.
  • the optical phased array 631 used in the imaging apparatus of the sixth embodiment operates M waveguides 36, which are a plurality of optical paths, with electrodes 33e to 33h smaller than this.
  • the seven waveguides 36 are operated by the four electrodes 33e to 33h.
  • the values of the voltages V1 to V4 applied to the electrodes 33e to 33h are randomly changed.
  • the illumination light B2 having a random phase distribution can be emitted from the light output unit 31d.
  • the optical phased array 631 is provided with a plurality of electrodes 33e to 33h for phase adjustment which are arranged over a plurality of waveguides 36 and have random shape patterns different from each other.
  • the illumination light B2 having a random phase distribution is emitted depending on the combination of the electrodes 33e to 33h.
  • the present invention has been described with reference to the above embodiments, the present invention is not limited to the above embodiments.
  • the illustrated array of injection ports 38 is merely exemplary, and various arrays with minimum redundant spacing are possible.
  • the waveguide 36 can be replaced with a light guide such as an optical fiber, and the phase adjuster 31b can be replaced with an optical phase modulator connected to the optical fiber.
  • the imaging device 200 of the embodiment that acquires a three-dimensional image can be used, for example, in the field of LIDAR (Light Detection and Ranging), and can be used to discriminate an object existing in front. Furthermore, the imaging device 200 of the embodiment can be used in fields such as barcode readers, biological imaging, and microscopes.
  • LIDAR Light Detection and Ranging

Landscapes

  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Nonlinear Science (AREA)
  • Plasma & Fusion (AREA)
  • Mechanical Engineering (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Ceramic Engineering (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Optical Modulation, Optical Deflection, Nonlinear Optics, Optical Demodulation, Optical Logic Elements (AREA)
  • Laser Beam Processing (AREA)

Abstract

L'invention concerne : un dispositif d'exposition à la lumière pouvant augmenter la résolution d'un motif de faisceau lumineux en fonction du nombre de points d'émission de lumière ; ainsi qu'un dispositif d'imagerie et un dispositif de traitement laser qui le comprennent. Le dispositif d'exposition à la lumière (100) comprend : une pluralité de guides d'ondes (parties de guidage de lumière) (36) dans lesquels passe la lumière, respectivement ; et une unité d'ajustement de phase (31b) qui ajuste la phase de la lumière émise par une pluralité d'orifices d'émission (38) fournis dans la pluralité de guides d'ondes (36), la pluralité d'orifices d'émission (38) étant agencés à l'intervalle redondant minimal.
PCT/JP2020/000162 2019-01-07 2020-01-07 Dispositif d'exposition à la lumière, dispositif d'imagerie et dispositif de traitement laser Ceased WO2020145266A1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2019-000901 2019-01-07
JP2019000901A JP7281064B2 (ja) 2019-01-07 2019-01-07 光照射装置、イメージング装置、及びレーザー加工装置

Publications (1)

Publication Number Publication Date
WO2020145266A1 true WO2020145266A1 (fr) 2020-07-16

Family

ID=71521625

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2020/000162 Ceased WO2020145266A1 (fr) 2019-01-07 2020-01-07 Dispositif d'exposition à la lumière, dispositif d'imagerie et dispositif de traitement laser

Country Status (2)

Country Link
JP (1) JP7281064B2 (fr)
WO (1) WO2020145266A1 (fr)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20210095957A1 (en) * 2019-09-27 2021-04-01 Asml Holding N.V. Lithographic Apparatus, Metrology Systems, Phased Array Illumination Sources and Methods thereof
JP2022122284A (ja) * 2021-02-09 2022-08-22 國立臺灣科技大學 調整可能な光学移相器アレイ

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE112021005950T5 (de) * 2020-11-11 2023-09-07 Analog Photonics LLC Lichtlenkung mit optical phased array
US20240393658A1 (en) 2021-08-25 2024-11-28 The University Of Electro-Communications Wavefront control device and adaptive optics device
WO2025037413A1 (fr) 2023-08-17 2025-02-20 三菱電機株式会社 Dispositif de réglage de phase et élément intégré optique à semi-conducteur

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP3106828A1 (fr) * 2015-06-16 2016-12-21 Academisch Medisch Centrum Système d'interférométrie à faible cohérence intégré dans un trajet commun et procédé correspondant
US9557585B1 (en) * 2013-05-30 2017-01-31 Hrl Laboratories, Llc Stacked rows pseudo-randomly spaced two-dimensional phased array assembly
WO2018124285A1 (fr) * 2016-12-29 2018-07-05 国立大学法人東京大学 Dispositif d'imagerie et procédé d'imagerie

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9557585B1 (en) * 2013-05-30 2017-01-31 Hrl Laboratories, Llc Stacked rows pseudo-randomly spaced two-dimensional phased array assembly
EP3106828A1 (fr) * 2015-06-16 2016-12-21 Academisch Medisch Centrum Système d'interférométrie à faible cohérence intégré dans un trajet commun et procédé correspondant
WO2018124285A1 (fr) * 2016-12-29 2018-07-05 国立大学法人東京大学 Dispositif d'imagerie et procédé d'imagerie

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
DRAKAKIS ET AL.: "The Triple Autocorrelation of an m-Sequence is a Lampel Costas Array", IEEE TRANSACTIONS ON INFORMATION THEORY, vol. 58, no. 9, 13 June 2012 (2012-06-13), pages 6047 - 6053, XP011456455, DOI: 10.1109/TIT.2012.2204541 *

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20210095957A1 (en) * 2019-09-27 2021-04-01 Asml Holding N.V. Lithographic Apparatus, Metrology Systems, Phased Array Illumination Sources and Methods thereof
US11994808B2 (en) * 2019-09-27 2024-05-28 Asml Holding N.V. Lithographic apparatus, metrology systems, phased array illumination sources and methods thereof
JP2022122284A (ja) * 2021-02-09 2022-08-22 國立臺灣科技大學 調整可能な光学移相器アレイ
JP7292760B2 (ja) 2021-02-09 2023-06-19 國立臺灣科技大學 調整可能な光学移相器アレイ

Also Published As

Publication number Publication date
JP7281064B2 (ja) 2023-05-25
JP2020112582A (ja) 2020-07-27

Similar Documents

Publication Publication Date Title
WO2020145266A1 (fr) Dispositif d'exposition à la lumière, dispositif d'imagerie et dispositif de traitement laser
JP6765687B2 (ja) イメージング装置及び方法
JP6956964B2 (ja) 光偏向デバイスおよびライダー装置
US12429746B2 (en) Optical beam scanning based on waveguide switching and position-to-angle conversion of a lens and applications
CN108779905B (zh) 多模式照明模块和相关方法
CN114008474B (zh) 具有多模波导光电检测器的lidar系统
US9983395B2 (en) Confocal microscope with a pinhole arrangement
US11555926B2 (en) Optical device, measurement device, robot, electronic apparatus, mobile object, and shaping device
CN115039017B (zh) 用于组合相干激光射束的设备、激光系统和方法
CN112673273B (zh) 激光雷达装置
CN114981710B (zh) 用于组合相干激光射束的设备、激光系统和方法
CN114114202B (zh) 激光发射装置、包括其的激光雷达及探测方法
US9905987B2 (en) Laser radar system
US20160274439A1 (en) Random access stimulated emission depletion (STED) microscopy
US20150362714A1 (en) Beam splitter apparatus, scanning observation apparatus, laser-scanning microscope, and laser-scanning endoscope
KR20200094789A (ko) 레이저 빔의 편향을 위한 장치
JP2018180116A (ja) 光偏向デバイス、及びライダー装置
US20160231575A1 (en) Spatiotemporal focusing apparatus and method
CN111684346B (zh) 光束偏转装置
US11789250B2 (en) Optical detection device and method for operating an optical detection device
CN119845864B (zh) 一种显微成像系统
KR102751249B1 (ko) 광도파로 위상 제어 어레이를 이용한 빔 스캐닝 소자의 고속 빔포밍 방법
KR101686977B1 (ko) 가간섭성 방사선을 균질화하는 장치
RU2199729C1 (ru) Лазерное устройство для исследования поля микрообъектов с лучевым воздействием (варианты)
US20220146686A1 (en) Laser emission apparatus and lidar-based surround sensor having a laser emission apparatus

Legal Events

Date Code Title Description
121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 20738726

Country of ref document: EP

Kind code of ref document: A1

NENP Non-entry into the national phase

Ref country code: DE

122 Ep: pct application non-entry in european phase

Ref document number: 20738726

Country of ref document: EP

Kind code of ref document: A1