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WO2020012651A1 - Procédé de fabrication de rouleau de film photosensible pour dispositif de détection, et rouleau de film photosensible pour dispositif de détection - Google Patents

Procédé de fabrication de rouleau de film photosensible pour dispositif de détection, et rouleau de film photosensible pour dispositif de détection Download PDF

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Publication number
WO2020012651A1
WO2020012651A1 PCT/JP2018/026575 JP2018026575W WO2020012651A1 WO 2020012651 A1 WO2020012651 A1 WO 2020012651A1 JP 2018026575 W JP2018026575 W JP 2018026575W WO 2020012651 A1 WO2020012651 A1 WO 2020012651A1
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WO
WIPO (PCT)
Prior art keywords
photosensitive
photosensitive film
film
resin layer
film roll
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/JP2018/026575
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English (en)
Japanese (ja)
Inventor
智紀 寺脇
田仲　裕之
雅彦 海老原
征志 南
匠 渡邊
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Resonac Corp
Original Assignee
Hitachi Chemical Co Ltd
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Filing date
Publication date
Application filed by Hitachi Chemical Co Ltd filed Critical Hitachi Chemical Co Ltd
Priority to PCT/JP2018/026575 priority Critical patent/WO2020012651A1/fr
Publication of WO2020012651A1 publication Critical patent/WO2020012651A1/fr
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/11—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/044—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means

Definitions

  • the present invention relates to a method for manufacturing a photosensitive film roll for a sensing device and a photosensitive film roll for a sensing device.
  • a liquid crystal display element and a touch panel are used.
  • a projected capacitive touch panel a plurality of X electrodes and a plurality of Y electrodes orthogonal to the X electrodes are formed in order to represent two-dimensional coordinates by an X axis and a Y axis.
  • ITO Indium-Tin-Oxide, indium tin oxide
  • the frame region of the touch panel is a region where the touch position cannot be detected, reducing the area of the frame region is an important factor for improving the product value.
  • metal wiring such as copper is formed in the frame area to transmit a detection signal of a touch position.
  • a corrosive component such as moisture or salt may enter the sensing area from the inside.
  • a corrosive component enters the inside of the touch panel, the metal wiring is corroded, and there is a risk of an increase in electrical resistance between the electrode and the driving circuit or a disconnection.
  • a method of forming a protective film on a substrate for a touch panel using a photosensitive resin composition is known.
  • a method of providing a protective film for example, a resist film
  • a method of providing a photosensitive resin layer containing a photosensitive resin composition on a predetermined substrate, and exposing and developing the photosensitive resin layer is known.
  • the photosensitive resin layer is laminated on a substrate using a photosensitive element (photosensitive film) including a support film and a photosensitive resin layer made of a photosensitive resin composition provided on the support film.
  • a known method is known (for example, see Patent Document 1 below).
  • the photosensitive film is generally stored and used in the form of a roll (photosensitive film roll) in which a long photosensitive film is wound around a core.
  • a roll photosensitive film roll
  • a dent may be formed on the photosensitive resin layer.
  • the photosensitive film roll is wound around the core with a certain amount of tension so as not to cause a winding deviation.At this time, foreign matter such as resin chips is caught between the photosensitive films, and the foreign matter is exposed to light. It is considered that a dent is formed in the photosensitive resin layer by digging into the photosensitive film and making a press mark. In particular, as the photosensitive film is wound closer to the core, the tightening force is more likely to be applied, so that a dent is likely to occur in the photosensitive resin layer.
  • dents in the photosensitive resin layer have not been regarded as a problem. In view of the above, the presence of a dent in the photosensitive resin layer is a serious problem.
  • the present invention has been made in view of the above-mentioned problems of the related art, and can suppress the occurrence of a dent and a winding shift, a method of manufacturing a photosensitive film roll used for a sensing device such as a touch panel, and Another object of the present invention is to provide a photosensitive film roll used for a sensing device.
  • the present invention provides a long photosensitive comprising a support film, a photosensitive resin layer disposed on the support film, and a protective film disposed on the photosensitive resin layer.
  • a method for manufacturing a photosensitive film roll for a sensing device comprising winding the photosensitive film into a roll, comprising a winding step of winding the photosensitive film around a core to obtain a photosensitive film roll,
  • the total thickness of the film and the protective film is less than 100 ⁇ m, and the length L1 of the photosensitive film for 100 turns from the core measured by unwinding the photosensitive film roll, and the diameter of the core
  • Provided is a method for manufacturing a photosensitive film roll, wherein the winding in the winding step is performed so that the ratio (L1 / D1) to D1 is 250 to 320.
  • the photosensitive film in which the total thickness of the support film and the protective film is less than 100 ⁇ m is wound in the winding step such that the ratio (L1 / D1) is 250 to 320.
  • the ratio (L1 / D1) is 250 to 320.
  • the length L2 of the photosensitive film for 100 turns outside the photosensitive film roll measured by unwinding the photosensitive film roll, and the position of the 100th turn from the outside of the photosensitive film roll It is preferable to perform winding in the above winding step so that the ratio (L2 / D2) to the diameter D2 becomes 250 to 350.
  • the number of turns of the photosensitive film roll may be 500 to 1000 turns.
  • the effects of the present invention are more effectively exhibited.
  • the photosensitive film may further include a second resin layer containing metal oxide particles disposed between the photosensitive resin layer and the protective film. Even when the photosensitive film including the second resin layer is wound into a roll, the occurrence of dents and winding deviation can be sufficiently suppressed. The difference in optical reflection characteristics between the part where the transparent electrode pattern is formed and the part where the transparent electrode pattern is not formed increases the color difference, and when the module is modularized, the transparent electrode pattern is reflected on the screen, so-called ⁇ bone view '' There is a problem of "phenomenon". According to the photosensitive film, the problem of the bone appearance phenomenon can be improved by providing the second resin layer.
  • the present invention also provides a long photosensitive film comprising a support film, a photosensitive resin layer disposed on the support film, and a protective film disposed on the photosensitive resin layer, and a roll around a core.
  • a photosensitive film roll for a sensing device wound in a shape, wherein the total thickness of the support film and the protective film is less than 100 ⁇ m, and the core is measured by unwinding the photosensitive film roll.
  • the photosensitive film roll since the total thickness of the support film and the protective film is less than 100 ⁇ m and the ratio (L1 / D1) is 250 to 320, the occurrence of dents and misalignment occurs. Is sufficiently suppressed. In particular, in the vicinity of the core where a dent is likely to occur in the photosensitive resin layer, the occurrence of a dent is suppressed while the occurrence of a winding shift is suppressed.
  • the photosensitive film roll has a length L2 of the photosensitive film corresponding to 100 turns outside the photosensitive film roll measured by unwinding the photosensitive film roll, and the 100th turn from the outside of the photosensitive film roll. It is preferable that the ratio (L2 / D2) to the diameter D2 at the position is 250 to 350.
  • the number of turns of the photosensitive film roll may be 500 to 1000 turns. In the photosensitive film roll having the number of windings within the above range, the effects of the present invention are more effectively exhibited.
  • the photosensitive film may further include a second resin layer containing metal oxide particles disposed between the photosensitive resin layer and the protective film. Even in a photosensitive film roll obtained by winding a photosensitive film having such a second resin layer into a roll, the occurrence of dents and winding deviation is sufficiently suppressed. Further, according to the photosensitive film having the second resin layer, the problem of the bone appearance phenomenon can be improved.
  • production of a dent and a winding gap are provided. be able to.
  • FIG. 1 is a perspective view schematically illustrating a photosensitive film roll according to an embodiment of the present disclosure.
  • FIG. 2 is a schematic cross-sectional view showing one embodiment of a photosensitive film constituting a photosensitive film roll.
  • FIG. 9 is a schematic cross-sectional view illustrating another embodiment of the photosensitive film constituting the photosensitive film roll. It is a schematic top view which shows one Embodiment of a touch panel.
  • FIG. 3 is a diagram illustrating a dent formed on a photosensitive resin layer.
  • (meth) acrylic acid means acrylic acid or methacrylic acid
  • (meth) acrylate means acrylate or methacrylate corresponding thereto.
  • a or B may include one of A and B, and may include both.
  • the term “layer” also includes a partially formed structure in addition to a partially formed structure when observed as a plan view.
  • step is used not only for an independent step but also for the case where the intended action of the step is achieved even if it cannot be clearly distinguished from other steps. included.
  • the numerical range indicated by using “to” indicates a range including the numerical values described before and after “to” as the minimum value and the maximum value, respectively.
  • the content of each component in the composition when there are a plurality of substances corresponding to each component in the composition, unless otherwise specified, the total of the plurality of substances present in the composition Means quantity.
  • the exemplified materials may be used alone or in combination of two or more.
  • the upper limit or lower limit of the numerical range of a certain stage may be replaced with the upper limit or lower limit of the numerical range of another stage.
  • the upper limit or the lower limit of the numerical range may be replaced with the value shown in the embodiment.
  • FIG. 1 is a perspective view schematically illustrating a photosensitive film roll according to an embodiment of the present disclosure.
  • the photosensitive film roll 100 according to the present embodiment is a roll formed by winding the photosensitive film 1 around a core 50.
  • the photosensitive film roll 100 is obtained by winding the photosensitive film 1 around the core 50 by 100 turns or more.
  • the photosensitive film roll 100 has a ratio (L1 / D1) of the length L1 of the photosensitive film 1 corresponding to 100 turns from the core 50 measured by unwinding the roll to the diameter D1 of the core 50 (L1 / D1) of 250 to 100. 320.
  • R1 in FIG. 1 indicates the 100th round from the winding core 50.
  • the length L1 is the length in the winding direction from the photosensitive film 1 to the core 50 in the 100th round R1 from the core 50 when the photosensitive film 1 is completely unwound from the photosensitive film roll 100. It was done. Since the photosensitive film 1 is wound with a certain degree of tension, it may contract in the winding direction after being unwound. In this case, the length L1 is a length measured after the unwound photosensitive film 1 shrinks.
  • the photosensitive film 1 When the ratio (L1 / D1) is 250 or more, the photosensitive film 1 is wound in a state in which the tightening force is reduced, and even when a foreign substance is mixed between the photosensitive films 1. In addition, the force with which the foreign matter is pressed against the photosensitive resin layer by the tightening of the winding is sufficiently reduced, and the occurrence of dents on the photosensitive resin layer can be suppressed. Further, in the photosensitive film roll 100, the closer to the winding core 50, the more easily the tightening force is applied to the photosensitive film 1 and the more easily a dent is formed. (L1 / D1) obtained from the diameter D1 of the core 50 must be 250 or more.
  • the ratio (L1 / D1) is preferably 260 or more, or 270 or more.
  • the ratio (L1 / D1) is 320 or less, the photosensitive film 1 is in a state of being wound with sufficient tension, and it is possible to sufficiently suppress the occurrence of a winding deviation.
  • the photosensitive film 1 wound thereafter tends to cause a winding shift in a chain.
  • (L1 / D1) obtained from the length L1 of the photosensitive film 1 for the circumference and the diameter D1 of the winding core 50 needs to be 320 or less.
  • the ratio (L1 / D1) is preferably 300 or less, or 290 or less.
  • the photosensitive film roll 100 has a length L2 of the photosensitive film 1 corresponding to 100 turns outside the photosensitive film roll 100 measured by unwinding the photosensitive film roll 100, and a position of the 100th turn R2 from the outside of the photosensitive film roll 100.
  • the ratio (L2 / D2) to the diameter D2 is preferably 250 to 350.
  • the length L2 is the length in the winding direction of the photosensitive film 1 for the outer 100 turns when the photosensitive film 1 is unwound 100 times or more from the outside of the photosensitive film roll 100 from the photosensitive film roll 100. Is measured. Note that the length L2 is a length measured after the unwinding photosensitive film 1 shrinks, similarly to the length L1.
  • the diameter D2 is a diameter measured on the photosensitive film roll after unwinding the photosensitive film 1 for the outer 100 turns.
  • the diameter D2 may be measured in a state of the photosensitive film roll 100 before unwinding the photosensitive film 1 for the outer 100 turns. There is almost no change in the diameter D2 before and after unwinding the photosensitive film 1 for the outer 100 turns.
  • the ratio (L2 / D2) is 250 or more, the occurrence of dents on the photosensitive resin layer can be more sufficiently suppressed.
  • the ratio (L2 / D2) is more preferably 280 or more, or 300 or more.
  • the ratio (L2 / D2) is 350 or less, it is possible to sufficiently suppress the occurrence of winding deviation.
  • the ratio (L2 / D2) is more preferably 340 or less.
  • L1, L2, D1 and D2 are all the same unit.
  • the magnitude relationship between the ratio (L1 / D1) and the ratio (L2 / D2) is not particularly limited, but even if the ratio (L1 / D1) is smaller than the ratio (L2 / D2). Good.
  • the ratio (L1 / D1) is smaller, the vicinity of the winding core becomes tighter than the vicinity of the outermost periphery of the photosensitive film roll 100, and the occurrence of a winding deviation near the winding core is further suppressed. Can be.
  • the number of turns of the photosensitive film roll 100 is 100 or more rounds in order to obtain the ratio (L1 / D1), but may be 200 or more rounds or 500 to 1000 rounds.
  • the number of windings is within the above range, the effect of suppressing the occurrence of dents and winding deviation is more effectively exhibited.
  • the number of windings is less than 200 turns, in the photosensitive film roll 100, the area of the photosensitive film 1 for 100 turns from the winding core 50 and the area of the photosensitive film 1 for the outer 100 turns are one. Copies may be duplicated. That is, in FIG. 1, the 100th round R2 from the outside may be located on the inner side (the core 50 side) from the 100th round R1 from the core 50.
  • FIG. 2 is a schematic cross-sectional view showing one embodiment of the photosensitive film constituting the photosensitive film roll.
  • FIG. 3 is a schematic sectional view showing another embodiment of the photosensitive film constituting the photosensitive film roll.
  • the photosensitive film 1 constituting the photosensitive film roll 100 includes a support film 10, a photosensitive resin layer 20 disposed on the support film 10, and a photosensitive resin layer 20 disposed on the photosensitive resin layer 20. And a protective film 40.
  • the photosensitive film 1 of the present embodiment can be used as a transfer type photosensitive film.
  • the photosensitive film includes a support film 10, a photosensitive resin layer 20 disposed on the support film 10, and metal oxide particles disposed on the photosensitive resin layer 20.
  • a photosensitive film (photosensitive refractive index adjusting film) 2 including a second resin layer 30 to be formed and a protective film 40 disposed on the second resin layer 30 may be used. That is, in the photosensitive film roll 100 shown in FIG. 1, a photosensitive refractive index adjusting film 2 may be used instead of the photosensitive film 1.
  • the photosensitive refractive index adjusting film 2 of the present embodiment can be used as a transfer type photosensitive refractive index adjusting film.
  • a cured film having a function of protecting a metal wiring in a frame of a touch panel or a transparent electrode of the touch panel can be formed.
  • the photosensitive refractive index adjusting film 2 for example, a function of protecting a metal wiring in a frame of the touch panel or a transparent electrode of the touch panel, and a function of making the transparent electrode pattern invisible or improving the visibility of the touch screen are provided.
  • a cured film that satisfies the conditions can be formed at a time.
  • a polymer film As the support film 10, a polymer film can be used.
  • the material of the polymer film include polyethylene terephthalate, polycarbonate, polyethylene, polypropylene, polyethersulfone, and cycloolefin polymer.
  • the thickness of the support film 10 is preferably from 5 to 70 ⁇ m, and more preferably from 10 to 70 ⁇ m, from the viewpoint of ensuring coverage and suppressing a decrease in resolution when irradiating active light through the support film 10. More preferably, it is more preferably 15 to 40 ⁇ m, and particularly preferably 15 to 35 ⁇ m.
  • the photosensitive resin layer (first resin layer) 20 includes (A) a binder polymer (hereinafter also referred to as a component (A)), (B) a photopolymerizable compound (hereinafter also referred to as a component (B)), Photosensitive resin composition containing (C) a photopolymerization initiator (hereinafter also referred to as component (C)) and (E) a phosphoric ester having an ethylenically unsaturated bond (hereinafter also referred to as component (E)). It is preferably formed from an object.
  • a binder polymer having a carboxyl group is preferably used from the viewpoint of enabling patterning by alkali development.
  • the component (A) is preferably a copolymer having a structural unit derived from (meth) acrylic acid and an alkyl (meth) acrylate.
  • the copolymer may contain, in a structural unit, another monomer copolymerizable with the (meth) acrylic acid or the alkyl (meth) acrylate. Specific examples include glycidyl (meth) acrylate, benzyl (meth) acrylate, and styrene.
  • Component (A) may have an ethylenically unsaturated group.
  • the component (A) having an ethylenically unsaturated group is not included in the component (B) in this specification.
  • alkyl (meth) acrylate examples include methyl (meth) acrylate, ethyl (meth) acrylate, butyl (meth) acrylate, 2-ethylhexyl (meth) acrylate, and (meth) acryl. Acid hydroxyl ethyl ester and the like.
  • the component (A) includes (meth) acrylic acid, glycidyl (meth) acrylate, benzyl (meth) acrylate, and styrene from the viewpoint of alkali developability (particularly with respect to an aqueous inorganic alkali solution), patterning properties, and transparency.
  • a structural unit derived from at least one compound selected from the group consisting of, methyl (meth) acrylate, ethyl (meth) acrylate, butyl (meth) acrylate and 2-ethylhexyl (meth) acrylate Is preferred.
  • the component (A) preferably has a weight average molecular weight of 10,000 to 200,000, more preferably 15,000 to 150,000, and more preferably 30,000 to 150,000, from the viewpoint of resolution. More preferably, it is particularly preferably from 30,000 to 100,000, and most preferably from 40,000 to 100,000.
  • the weight average molecular weight can be measured by the gel permeation chromatography method described in the examples of the present specification.
  • the acid value of the component (A) is preferably at least 75 mgKOH / g from the viewpoint of easily forming a cured film (protective film) having a desired shape by alkali development.
  • the acid value of the component (A) is preferably from 75 to 200 mgKOH / g, and more preferably from 75 to 150 mgKOH / g, from the viewpoint of achieving both easy control of the cured film shape and rust prevention of the cured film. More preferably, it is more preferably 75 to 120 mgKOH / g.
  • the acid value can be measured by a neutralization titration method based on JIS K0070.
  • An example of a specific measurement method is shown below.
  • the binder polymer solution is heated at 130 ° C. for 1 hour to remove volatile components and obtain a solid component.
  • 30 g of acetone is added to the binder polymer and uniformly dissolved to obtain a resin solution.
  • an appropriate amount of phenolphthalein as an indicator is added to the resin solution, and neutralization titration is performed using a 0.1 mol / L aqueous solution of potassium hydroxide.
  • the acid value is calculated by the following equation.
  • Acid value 0.1 ⁇ V ⁇ f1 ⁇ 56.1 / (Wp ⁇ I / 100)
  • V is the titer (mL) of the 0.1 mol / L aqueous potassium hydroxide solution used for titration
  • f1 is the factor (concentration conversion coefficient) of the 0.1 mol / L aqueous potassium hydroxide solution
  • Wp is the measured resin solution.
  • I represents the ratio (% by mass) of the nonvolatile content in the resin solution measured.
  • a photopolymerizable compound having an ethylenically unsaturated group can be used.
  • the photopolymerizable compound having an ethylenically unsaturated group include, for example, a monofunctional vinyl monomer having one polymerizable ethylenically unsaturated group in a molecule, and having two polymerizable ethylenically unsaturated groups in a molecule.
  • Examples include bifunctional vinyl monomers or polyfunctional vinyl monomers having at least three polymerizable ethylenically unsaturated groups in the molecule.
  • Examples of the monofunctional vinyl monomer having one polymerizable ethylenically unsaturated group in the molecule include those exemplified as monomers used in the synthesis of a copolymer which is a preferred example of the component (A). No.
  • the bifunctional vinyl monomer having two polymerizable ethylenically unsaturated groups in the molecule may include a compound having a tricyclodecane skeleton or a tricyclodecene skeleton.
  • a di (meth) acrylate compound represented by the following general formula (1) it is preferable to include a di (meth) acrylate compound represented by the following general formula (1) as a compound having a tricyclodecane skeleton or a tricyclodecene skeleton.
  • R 31 and R 32 each independently represent a hydrogen atom or a methyl group
  • X represents a tricyclodecane skeleton or a divalent group having a tricyclodecene skeleton
  • R 33 and R 33 R 34 each independently represents an alkylene group having 1 to 4 carbon atoms
  • n and m each independently represent an integer of 0 to 2
  • p and q each independently represent an integer of 0 or more
  • p + q 0 to 10.
  • the divalent group having a tricyclodecane skeleton or a tricyclodecene skeleton contained in X has a bulky structure, so that the cured film has low moisture permeability. And the corrosion inhibition of the metal wiring and the transparent electrode can be improved.
  • the “tricyclodecane skeleton” and “tricyclodecene skeleton” in the present specification refer to the following structures, respectively (the bond is an arbitrary position).
  • a compound having a tricyclodecane skeleton or a tricyclodecene skeleton a compound having a tricyclodecane skeleton such as tricyclodecane dimethanol di (meth) acrylate is preferable from the viewpoint of low moisture permeability of the obtained cured film pattern.
  • These are available as DCP and A-DCP (both manufactured by Shin-Nakamura Chemical Co., Ltd.).
  • Examples of the bifunctional vinyl monomer having two polymerizable ethylenically unsaturated groups in the molecule other than the compound having a tricyclodecane skeleton or a tricyclodecene skeleton include polyethylene glycol di (meth) acrylate and trimethylolpropane. Examples thereof include di (meth) acrylate, polypropylene glycol di (meth) acrylate, 2,2-bis (4- (meth) acryloxypolyethoxypolypropoxyphenyl) propane, and bisphenol A diglycidyl ether di (meth) acrylate.
  • the polyfunctional vinyl monomer having at least three polymerizable ethylenically unsaturated groups in the molecule a conventionally known polyfunctional vinyl monomer can be used without any particular limitation.
  • the polyfunctional vinyl monomer may be a (meth) acrylate compound having a skeleton derived from trimethylolpropane such as trimethylolpropane tri (meth) acrylate; tetramethylolmethane (Meth) acrylate compounds having a skeleton derived from tetramethylolmethane such as tri (meth) acrylate and tetramethylolmethanetetra (meth) acrylate; derived from pentaerythritol such as pentaerythritol tri (meth) acrylate and pentaerythritol tetra (meth) acrylate (Meth) acrylate compounds having
  • a bifunctional vinyl monomer having a saturated group is used in combination, the ratio is not particularly limited, but from the viewpoint of preventing photocuring and electrode corrosion, at least three polymerizable ethylenically unsaturated groups in the molecule.
  • the content of the component (A) and the component (B) is preferably 35 to 85 parts by mass, more preferably 40 to 50 parts by mass based on 100 parts by mass of the total of the components (A) and (B).
  • the amount is more preferably 80 parts by mass, further preferably 50 to 70 parts by mass, and particularly preferably 55 to 65 parts by mass.
  • the component (A) is preferably 35 parts by mass or more based on 100 parts by mass of the total amount of the components (A) and (B). , 40 parts by mass or more, more preferably 50 parts by mass or more, particularly preferably 55 parts by mass or more.
  • a conventionally known photopolymerization initiator can be used without any particular limitation, but it is preferable to use a highly transparent photopolymerization initiator.
  • the component (C) preferably contains an oxime ester compound and / or a phosphine oxide compound from the viewpoint of forming a resin cured film pattern with sufficient resolution even on a base material even if the thickness is 10 ⁇ m or less.
  • the phosphine oxide compound include 2,4,6-trimethylbenzoyl-diphenyl-phosphine oxide.
  • R 11 and R 12 each independently represent an alkyl group having 1 to 12 carbon atoms, a cycloalkyl group having 4 to 10 carbon atoms, a phenyl group or a tolyl group;
  • An alkyl group, a cycloalkyl group having 4 to 6 carbon atoms, a phenyl group or a tolyl group is preferable, and an alkyl group having 1 to 4 carbon atoms, a cycloalkyl group having 4 to 6 carbon atoms, a phenyl group or a tolyl group is preferable. More preferably, it is a methyl group, a cyclopentyl group, a phenyl group or a tolyl group.
  • R 13 represents —H, —OH, —COOH, —O (CH 2 ) OH, —O (CH 2 ) 2 OH, —COO (CH 2 ) OH or —COO (CH 2 ) 2 OH; H, —O (CH 2 ) OH, —O (CH 2 ) 2 OH, —COO (CH 2 ) OH, or —COO (CH 2 ) 2 OH, preferably —H, —O (CH 2) ) 2 OH or —COO (CH 2 ) 2 OH.
  • R 14 each independently represent an alkyl group having 1 to 6 carbon atoms, preferably a propyl group.
  • R 15 represents NO 2 or ArCO (where Ar represents an aryl group), and Ar is preferably a tolyl group.
  • R 16 and R 17 each independently represent an alkyl group having 1 to 12 carbon atoms, a phenyl group, or a tolyl group, and is preferably a methyl group, a phenyl group, or a tolyl group.
  • R 18 represents an alkyl group having 1 to 6 carbon atoms, and is preferably an ethyl group.
  • R 19 is an organic group having an acetal bond.
  • R 20 and R 21 each independently represent an alkyl group having 1 to 12 carbon atoms, a phenyl group or a tolyl group, preferably a methyl group, a phenyl group or a tolyl group, and more preferably a methyl group.
  • R 22 represents a hydrogen atom or an alkyl group.
  • the compound represented by the general formula (2) is available as IRGACURE OXE 01 (product name, manufactured by BASF Corporation).
  • the compound represented by the general formula (4) is available, for example, as ADEKA OPTOMER N-1919 (product name, manufactured by ADEKA Corporation).
  • the content of the component (C) is preferably 0.1 to 10 parts by mass with respect to 100 parts by mass of the total amount of the components (A) and (B) from the viewpoint of excellent photosensitivity and resolution.
  • the amount is more preferably from 5 to 5 parts by mass, further preferably from 1 to 3 parts by mass, particularly preferably from 1 to 2 parts by mass.
  • the photosensitive resin composition according to the present embodiment has a triazole compound having a mercapto group, a tetrazole compound having a mercapto group, a thiadiazole compound having a mercapto group, and an amino group, from the viewpoint of further improving the rust resistance of the cured film. It is preferable that the composition further contains at least one compound selected from the group consisting of a triazole compound and a tetrazole compound having an amino group (hereinafter, also referred to as a component (D)).
  • the triazole compound having a mercapto group include 3-mercapto-triazole (manufactured by Wako Pure Chemical Industries, Ltd., product name: 3MT).
  • Examples of the thiadiazole compound having a mercapto group include 2-amino-5-mercapto-1,3,4-thiadiazole (product name: ATT, manufactured by Wako Pure Chemical Industries, Ltd.).
  • triazole compound having an amino group examples include benzotriazole, 1H-benzotriazole-1-acetonitrile, benzotriazole-5-carboxylic acid, 1H-benzotriazole-1-methanol, carboxybenzotriazole, and the like, in which the amino group is substituted.
  • tetrazole compound having an amino group examples include 5-amino-1H-tetrazole, 1-methyl-5-amino-tetrazole, 1-methyl-5-mercapto-1H-tetrazole, 1-carboxymethyl-5-amino- Tetrazole and the like.
  • These tetrazole compounds may be water-soluble salts thereof. Specific examples include sodium, potassium and lithium alkali metal salts of 1-methyl-5-amino-tetrazole.
  • the content is preferably 0.05 to 5.0 parts by mass based on 100 parts by mass of the total of the components (A) and (B).
  • the amount is more preferably 0.1 to 2.0 parts by mass, further preferably 0.2 to 1.0 part by mass, and particularly preferably 0.3 to 0.8 part by mass.
  • the photosensitive resin composition according to the present embodiment preferably contains (E) a phosphate ester containing an ethylenically unsaturated bond from the viewpoint of improving adhesion to a substrate.
  • a phosphate ester containing an ethylenically unsaturated bond is treated as a component (E) instead of a component (B).
  • the content of the component (E) is from 0.1 to 5.0 parts by mass based on 100 parts by mass of the total amount of the components (A) and (B) from the viewpoint of improving the adhesion to the substrate and suppressing the generation of the development residue.
  • the amount is preferably 0 parts by mass, more preferably 0.2 to 3.0 parts by mass.
  • an adhesion imparting agent such as a silane coupling agent, a rust preventive, a leveling agent, and a plasticizer.
  • the content can be about 01 to 20 parts by mass.
  • the above-mentioned "resin composition forming a photosensitive resin layer” refers to a composition not containing a solvent described below, and the content of each component is a content relative to the total amount of components other than the solvent described below. is there.
  • the refractive index of the photosensitive resin layer 20 at a wavelength of 633 nm is usually 1.40 to 1.49.
  • the thickness of the photosensitive resin layer 20 is sufficiently effective as a protective film, and is preferably 15 ⁇ m or less in terms of thickness after drying, in order to sufficiently embed steps on the surface of the substrate with a transparent electrode pattern, The thickness is more preferably 2 to 10 ⁇ m, and still more preferably 3 to 8 ⁇ m. Further, the thickness of the photosensitive resin layer 20 after curing is preferably within the above range.
  • the second resin layer (refractive index adjusting layer) 30 is a layer containing metal oxide particles.
  • the second resin layer 30 can have a relatively higher refractive index than the photosensitive resin layer 20 by containing the metal oxide particles.
  • the refractive index of the second resin layer 30 at 633 nm is preferably in the range of 1.40 to 1.90, more preferably 1.50 to 1.90, and preferably 1.53 to 1.85. Is more preferably 1.55 to 1.75.
  • the refractive index of the second resin layer at 633 nm after curing is preferably within the above range.
  • the refractive index at 633 nm of the second resin layer 30 is within the above range, when a cured film pattern is provided on a transparent electrode pattern such as ITO, various members used on the cured film pattern (for example, a module) Between the cover glass used to form the transparent electrode pattern and the refractive index of the transparent electrode pattern (OCA), which is the optical value between the portion where the transparent electrode pattern such as ITO is formed and the portion where the transparent electrode pattern is not formed. The color difference due to reflection can be reduced, and the bone appearance phenomenon can be prevented. Further, it is possible to reduce the intensity of the reflected light on the entire screen, and it is possible to suppress a decrease in transmittance on the screen.
  • OCA refractive index of the transparent electrode pattern
  • the refractive index of a transparent electrode such as ITO is preferably from 1.80 to 2.10, more preferably from 1.85 to 2.05, and even more preferably from 1.90 to 2.00.
  • the refractive index of a member such as OCA is preferably from 1.45 to 1.55, more preferably from 1.47 to 1.53, even more preferably from 1.48 to 1.51. .
  • the second resin layer 30 has a minimum light transmittance of preferably at least 80%, more preferably at least 85%, even more preferably at least 90% in a wavelength range of 450 to 650 nm.
  • the minimum light transmittance of the second resin layer after curing in a wavelength region of 450 to 650 nm is preferably within the above range.
  • the second resin layer 30 can contain the component (A), the component (B) and the component (C). If necessary, the component (D) and / or the component (E) can be used. Further, it can be contained.
  • the second resin layer 30 does not necessarily need to contain a photopolymerization component such as the component (B) and the component (C), and utilizes the photopolymerization component that migrates from the adjacent resin layer by forming the layer to form the second resin layer.
  • the layers can also be photocured.
  • the second resin layer 30 contains metal oxide particles (hereinafter also referred to as component (F)).
  • the metal oxide particles preferably contain metal oxide particles having a refractive index of 1.50 or more at a wavelength of 633 nm. This makes it possible to improve the transparency of the second resin layer and the refractive index at a wavelength of 633 nm when the photosensitive refractive index adjusting film is prepared. Further, the developability can be improved while suppressing adsorption to the substrate.
  • the metal oxide particles include particles made of metal oxides such as zirconium oxide, titanium oxide, tin oxide, zinc oxide, indium tin oxide, indium oxide, aluminum oxide, and yttrium oxide. Among these, zirconium oxide or titanium oxide particles are preferable from the viewpoint of suppressing the bone appearance phenomenon.
  • the zirconium oxide particles when the material of the transparent electrode is ITO, it is preferable to use zirconium oxide nanoparticles from the viewpoint of improving the refractive index and adhesion between the ITO and the transparent substrate.
  • the particle size distribution Dmax is preferably 40 nm or less.
  • the second resin layer 30 may contain titanium oxide nanoparticles as the component (F). Further, among the titanium oxide nanoparticles, the particle size distribution Dmax is preferably 50 nm or less, more preferably 10 to 50 nm.
  • oxide particles or sulfide particles containing atoms such as Mg, Al, Si, Ca, Cr, Cu, Zn, and Ba can be used in addition to the metal oxide particles.
  • an organic compound such as a compound having a triazine ring, a compound having an isocyanuric acid skeleton, and a compound having a fluorene skeleton.
  • an organic compound such as a compound having a triazine ring, a compound having an isocyanuric acid skeleton, and a compound having a fluorene skeleton.
  • the thickness of the second resin layer 30 may be 0.01 to 1 ⁇ m, preferably 0.03 to 0.5 ⁇ m, more preferably 0.04 to 0.3 ⁇ m, The thickness is more preferably 0.05 to 0.25 ⁇ m, and particularly preferably 0.05 to 0.2 ⁇ m. When the thickness is 0.01 to 1 ⁇ m, it is possible to further reduce the above-described reflected light intensity of the entire screen. It is also preferable that the thickness of the second resin layer after curing is within the above range.
  • the second resin layer 30 is interposed between the base material and the photosensitive resin layer 20 because the photosensitive resin layer 20 has the specific composition described above. Even in such a case, the various effects described above can be obtained.
  • the refractive index of a single photosensitive resin layer can also be measured by the same method.
  • Examples of the protective film 40 include films of polyethylene, polypropylene, polyethylene terephthalate, polycarbonate, polyethylene-vinyl acetate copolymer, polyethylene-vinyl acetate copolymer, and laminated films of these films and polyethylene.
  • the total thickness of the support film 10 and the protective film 40 needs to be less than 100 ⁇ m, preferably 20 to 80 ⁇ m, and more preferably 30 to 70 ⁇ m. Is more preferable, and further preferably 40 to 60 ⁇ m. If the total thickness is larger than 100 ⁇ m, the value of the length L1 in the photosensitive film roll 100 becomes too large, and the ratio (L1 / D1) becomes too large. May be 250 or more, a dent may occur in the photosensitive resin layer. Therefore, the total thickness of the support film 10 and the protective film 40 needs to be less than 100 ⁇ m from the viewpoint of suppressing a dent and a winding deviation in the photosensitive film roll 100.
  • the minimum value of the total light transmittance (Tt) in the visible light region of a wavelength of 400 to 700 nm is preferably 90.00% or more, more preferably 90.50% or more, and 90.70. % Is more preferable. If the total light transmittance in the general visible light wavelength range of 400 to 700 nm is 90.00% or more, when protecting the transparent electrode in the sensing area of the touch panel (touch sensor), an image is displayed in the sensing area. It is possible to sufficiently suppress a decrease in quality, hue, and luminance.
  • a coating solution containing a photosensitive resin composition and a coating solution containing the second resin composition are prepared. These can be formed by applying and drying these on the support film 10 and the protective film 40, respectively. Then, the photosensitive refractive index adjusting film 2 is formed by combining the support film 10 on which the photosensitive resin layer 20 is formed and the protective film 40 on which the second resin layer 30 is formed with the photosensitive resin layer 20 and the second resin layer 30. It can be formed by bonding together in a state where the resin layer 30 faces the resin layer 30.
  • the photosensitive refractive index adjusting film 2 is formed by applying a coating solution containing a photosensitive resin composition on the support film 10 and drying it, and then containing the second resin composition on the photosensitive resin layer 20. It can also be formed by applying a coating solution to be applied, drying and applying a protective film 40.
  • the photosensitive film 1 without the second resin layer 30 is coated on the support film 10 with a coating solution containing the photosensitive resin composition, dried, and then protected on the photosensitive resin layer 20. It can be formed by attaching the film 40.
  • Application methods include doctor blade coating, Meyer bar coating, roll coating, screen coating, spinner coating, inkjet coating, spray coating, dip coating, gravure coating, curtain coating, and die coating. And the like.
  • the drying conditions are not particularly limited, but the drying temperature is preferably from 60 to 130 ° C, and the drying time is preferably from 0.5 to 30 minutes.
  • the method of manufacturing a photosensitive film roll according to the present embodiment includes a winding step of winding the long photosensitive film 1 around a core 50 to obtain a photosensitive film roll 100, and includes a support film 10 and a protective film. 40, the total thickness of which is less than 100 ⁇ m, and the ratio of the length L1 of the photosensitive film 1 for 100 turns from the core 50 measured by unwinding the photosensitive film roll 100 to the diameter D1 of the core.
  • This is a method in which winding is performed in a winding step so that (L1 / D1) is 250 to 320.
  • the photosensitive film 1 may be a photosensitive refractive index adjusting film 2.
  • the length of the photosensitive film 1 in the winding direction is not particularly limited, but it is necessary that the photosensitive film 1 can be wound 100 times or more around the winding core 50.
  • the length is preferably such that it can be wound, and more preferably the length that can be wound 500 to 1000 times around the winding core 50.
  • the specific length in the winding direction of the photosensitive film 1 is, for example, 100 to 1000 m, preferably 200 to 800 m, and more preferably 300 to 500 m. When the length of the photosensitive film 1 in the winding direction is within the above range, the effect of suppressing the occurrence of dents and winding deviation is more effectively achieved.
  • the width of the photosensitive film 1 (the length in the direction perpendicular to the winding direction) is not particularly limited, but is usually 10 to 1500 cm, preferably 20 to 500 cm, and more preferably 30 to 100 cm. When the width of the photosensitive film 1 is in the above range, the effect of suppressing the occurrence of dents and winding deviation is more effectively exhibited.
  • the diameter of the photosensitive film roll 100 in a state where the photosensitive film 1 is completely wound up is not particularly limited, but is usually 5 to 100 cm, preferably 10 to 50 cm, more preferably 15 to 30 cm. When the diameter of the photosensitive film roll 100 is within the above range, the effect of suppressing the occurrence of dents and winding deviation is more effectively achieved.
  • the core 50 is a cylindrical core.
  • the material of the core 50 include a paper tube, a wooden tube, a plastic tube, and a metal tube, but a metal tube is preferable from the viewpoint of being able to withstand the pressure during winding.
  • the material of the core is plastic
  • examples of the plastic include polyethylene resin, polypropylene resin, polystyrene resin, polyvinyl chloride resin, and ABS resin (acrylonitrile-butadiene-styrene copolymer).
  • the diameter D1 of the core 50 is not particularly limited, but is usually 1 to 50 cm, preferably 3 to 30 cm, and more preferably 5 to 10 cm. When the diameter D1 of the core 50 is within the above range, the effect of suppressing the occurrence of dents and winding deviation is more effectively achieved.
  • winding is performed so that the ratio (L1 / D1) becomes 250 to 320. Details of the ratio (L1 / D1) are as described in the description of the photosensitive film roll 100, and the preferable range is also as described above.
  • the winding step is performed by unwinding the photosensitive film roll 100 and measuring the length L2 of the photosensitive film 1 for 100 turns outside the photosensitive film roll 100 and 100 turns from the outside of the photosensitive film roll 100. Winding is preferably performed so that the ratio (L2 / D2) of the eye position to the diameter D2 is 250 to 350.
  • the details of the ratio (L2 / D2) are as described in the description of the photosensitive film roll 100, and the preferable range is also as described above.
  • the values of the ratio (L1 / D1) and the ratio (L2 / D2) are determined by, for example, a method of adjusting the winding tension at the time of winding and a method of adjusting the thickness and the material of the photosensitive film 1 or the like. It can be in a desired range.
  • the winding tension is preferably from 120 to 220 N / m, and more preferably from 140 to 200 N / m, from the viewpoint of setting the values of the ratio (L1 / D1) and the ratio (L2 / D2) within the above-described preferable ranges. Is more preferable, and it is still more preferable to be 160 to 180 N / m.
  • the winding tension is preferably controlled in accordance with the winding diameter so that the tension on the photosensitive film 1 from the start to the end of the winding is kept constant. However, the tension is changed during the winding. Is also good. When the tension is changed during winding, it is preferable that the winding tension before and after the change both fall within the above-described preferable range.
  • the support film 10 be on the outside and the protective film 40 be wound on the core 50 side.
  • an end face separator may be provided on the end face of the photosensitive film roll 100 from the viewpoint of end face protection.
  • the end face separator it is preferable to use a moisture-proof end face separator from the viewpoint of edge fusion resistance.
  • the obtained photosensitive film roll 100 is wrapped and stored in a black sheet having low moisture permeability.
  • the photosensitive film roll 100 according to the present embodiment is used for a sensing device such as a touch panel, and is used, for example, for forming a protective film for protecting a transparent electrode and a metal wiring of the sensing device. In these sensing devices, high visibility of the touch screen is required. However, since the photosensitive film roll 100 according to the present embodiment suppresses the occurrence of dents on the photosensitive resin layer 20, It is possible to suppress a decrease in visibility due to the above.
  • FIG. 4 is a schematic top view showing one embodiment of a touch panel on which a protective film is formed using the photosensitive film roll 100 according to the present embodiment.
  • FIG. 4 illustrates an example of a capacitive touch panel.
  • the touch panel shown in FIG. 4 has a touch screen 102 for detecting touch position coordinates on one surface of a transparent substrate 101, and a transparent electrode 103 and a transparent electrode 104 for detecting a change in capacitance in this area are transparent. It is provided on a substrate 101.
  • the transparent substrate 101 for example, a substrate such as a glass plate, a plastic plate, and a ceramic plate used for a touch panel (touch sensor) is exemplified.
  • an insulating layer or an index matching layer may be provided on the transparent base material 101 between the base material and the electrode.
  • the index matching layer may have a composition similar to that of the second resin layer 30 described above.
  • Photopolymerizable compound pentaerythritol tetraacrylate (Shin-Nakamura Chemical Co., Ltd., product name: A-TMMT)
  • Photopolymerization initiator 1,2-octanedione, 1- [4- (phenylthio) phenyl-, 2- (O-benzoyloxime)] (BASF Corporation, product name: IRGACURE OXE 01)
  • Rust inhibitor 5-amino-1H-te
  • Example 1 Using a comma coater, the photosensitive resin composition was uniformly applied to a 16 ⁇ m-thick PET film (support film, product name: FB40, manufactured by Toray Industries, Inc.) and then heated at 100 ° C. using a hot air convection dryer. After drying for 3 minutes to remove the solvent, a photosensitive resin layer was formed. The thickness of the photosensitive resin layer after drying was 8 ⁇ m. Then, a 30 ⁇ m-thick polypropylene film (protective film, manufactured by Oji F-Tex Co., Ltd., product name: E-201F) is attached to the photosensitive resin layer, so that the support film, the photosensitive resin layer, and the protective film are in this order.
  • a 30 ⁇ m-thick polypropylene film (protective film, manufactured by Oji F-Tex Co., Ltd., product name: E-201F) is attached to the photosensitive resin layer, so that the support film, the photosensitive resin layer, and the protective film are in this order
  • Example 2 A long transfer type photosensitive film was obtained in the same manner as in Example 1 except that the protective film was changed to a PET film having a thickness of 16 ⁇ m (manufactured by Toray Industries, Inc., product name: FB40). The photosensitive film was wound around a core under the same conditions as in Example 1 to obtain a photosensitive film roll.
  • Example 4 A long transfer photosensitive film was obtained in the same manner as in Example 1 except that the thickness of the photosensitive resin layer after drying was 15 ⁇ m. The photosensitive film was wound around a core under the same conditions as in Example 1 to obtain a photosensitive film roll.
  • Example 3 The support film was changed to a 50 ⁇ m-thick PET film (manufactured by Toyobo Co., Ltd., product name: A4100), and the protective film was changed to a 50 ⁇ m-thick PET film (manufactured by Toyobo Co., product name: A4100).
  • a long transfer type photosensitive film was obtained in the same manner as in Example 1 except that the total length of the film was changed to 200 m.
  • the photosensitive film was wound around a core under the same conditions as in Example 1 to obtain a photosensitive film roll.
  • FIG. 5A is a laser microscope photograph of the dent
  • FIG. 5B is a graph showing the height (depth) and width of the dent and projection. Points a, b, and c in FIG. 5A and points a, b, and c in FIG. 5B respectively indicate the same point.
  • SYMBOLS 1 ... photosensitive film, 2 ... photosensitive refractive index adjustment film, 10 ... support film, 20 ... photosensitive resin layer, 30 ... second resin layer, 40 ... protective film, 50 ... core, 100 ... photosensitive film Roll, 101: Transparent substrate, 102: Sensing area, 103, 104: Transparent electrode, 105: Lead wiring, 106: Connection electrode, 107: Connection terminal, 123: Cured film pattern (cured film).

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Abstract

La présente invention concerne un procédé de fabrication d'un rouleau de film photosensible pour un dispositif de détection. Dans ce procédé, un film photosensible allongé est pourvu d'un film de support, d'une couche de résine photosensible disposée sur le film de support et d'un film protecteur disposé sur la couche de résine photosensible et enroulé sous une forme de rouleau. Le procédé comprend un processus d'enroulement servant à obtenir le rouleau de film photosensible en enroulant le film photosensible sur un noyau d'enroulement, l'épaisseur totale du film de support et du film de protection étant inférieure à 100 µm, et l'enroulement du processus d'enroulement étant effectué de telle sorte qu'un rapport (L1/D1) d'une longueur L1 de 100 tours du film photosensible à partir du noyau d'enroulement, mesurée par le déroulement du rouleau de film photosensible, jusqu'à un diamètre D1 du noyau d'enroulement est de 250 à 320.
PCT/JP2018/026575 2018-07-13 2018-07-13 Procédé de fabrication de rouleau de film photosensible pour dispositif de détection, et rouleau de film photosensible pour dispositif de détection Ceased WO2020012651A1 (fr)

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WO2022264275A1 (fr) * 2021-06-15 2022-12-22 昭和電工マテリアルズ株式会社 Élément photosensible et procédé de production d'élément photosensible

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WO2006011548A1 (fr) * 2004-07-30 2006-02-02 Hitachi Chemical Company, Ltd. Film photosensible, film stratifié photosensible et rouleau de film photosensible
JP2018506450A (ja) * 2014-12-30 2018-03-08 スリーエム イノベイティブ プロパティズ カンパニー マイクロスフェア処理した縁部を有するウェブ巻取りロール及びその作製方法
JP2018045126A (ja) * 2016-09-15 2018-03-22 日立化成株式会社 真空ラミネート用感光性フィルム、転写型感光性屈折率調整フィルム、及び硬化樹脂パターンの形成方法
JP6299940B1 (ja) * 2017-03-31 2018-03-28 日立化成株式会社 感光性エレメント及び感光性エレメントロール

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Publication number Priority date Publication date Assignee Title
WO2006011548A1 (fr) * 2004-07-30 2006-02-02 Hitachi Chemical Company, Ltd. Film photosensible, film stratifié photosensible et rouleau de film photosensible
JP2018506450A (ja) * 2014-12-30 2018-03-08 スリーエム イノベイティブ プロパティズ カンパニー マイクロスフェア処理した縁部を有するウェブ巻取りロール及びその作製方法
JP2018045126A (ja) * 2016-09-15 2018-03-22 日立化成株式会社 真空ラミネート用感光性フィルム、転写型感光性屈折率調整フィルム、及び硬化樹脂パターンの形成方法
JP6299940B1 (ja) * 2017-03-31 2018-03-28 日立化成株式会社 感光性エレメント及び感光性エレメントロール

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2022264275A1 (fr) * 2021-06-15 2022-12-22 昭和電工マテリアルズ株式会社 Élément photosensible et procédé de production d'élément photosensible
JPWO2022264275A1 (fr) * 2021-06-15 2022-12-22
KR20240021138A (ko) * 2021-06-15 2024-02-16 가부시끼가이샤 레조낙 감광성 엘리먼트 및 감광성 엘리먼트의 제조 방법
KR102798303B1 (ko) 2021-06-15 2025-04-22 가부시끼가이샤 레조낙 감광성 엘리먼트 및 감광성 엘리먼트의 제조 방법
JP7779315B2 (ja) 2021-06-15 2025-12-03 株式会社レゾナック 感光性エレメント及び感光性エレメントの製造方法

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