WO2020080131A1 - Layered film - Google Patents
Layered film Download PDFInfo
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- WO2020080131A1 WO2020080131A1 PCT/JP2019/039259 JP2019039259W WO2020080131A1 WO 2020080131 A1 WO2020080131 A1 WO 2020080131A1 JP 2019039259 W JP2019039259 W JP 2019039259W WO 2020080131 A1 WO2020080131 A1 WO 2020080131A1
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- WIPO (PCT)
- Prior art keywords
- film
- layer
- laminated film
- resin
- laminated
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B15/00—Layered products comprising a layer of metal
- B32B15/04—Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material
- B32B15/08—Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin
- B32B15/09—Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin comprising polyesters
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B27/00—Layered products comprising a layer of synthetic resin
- B32B27/36—Layered products comprising a layer of synthetic resin comprising polyesters
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65D—CONTAINERS FOR STORAGE OR TRANSPORT OF ARTICLES OR MATERIALS, e.g. BAGS, BARRELS, BOTTLES, BOXES, CANS, CARTONS, CRATES, DRUMS, JARS, TANKS, HOPPERS, FORWARDING CONTAINERS; ACCESSORIES, CLOSURES, OR FITTINGS THEREFOR; PACKAGING ELEMENTS; PACKAGES
- B65D65/00—Wrappers or flexible covers; Packaging materials of special type or form
- B65D65/38—Packaging materials of special type or form
- B65D65/40—Applications of laminates for particular packaging purposes
Definitions
- the present invention relates to a laminated film used in the field of packaging foods, pharmaceuticals, industrial products and the like. More specifically, it is a laminated film consisting of a laminated film having an inorganic thin film layer or a metal foil on a base material layer and a sealant layer, instead of using a laminated film of a polyester film and a nylon film as the base material layer.
- the present invention also relates to a laminated film having excellent puncture resistance and bag puncture resistance even when a single layer of polybutylene terephthalate (hereinafter abbreviated as PBT) film is substituted, and having excellent self-supporting property for a standing pouch.
- PBT polybutylene terephthalate
- BACKGROUND ART in order to prevent deterioration of contents such as foods, packaging materials in which various plastic films, papers, base materials such as metal foils are laminated have been developed. In general, a heat-sealing layer is provided on the innermost layer of these packaging materials, and a bag is made into various forms by stacking and sealing them. Next, the packaged product in the final form is completed by filling the contents from the opening and heat-sealing them. Particularly in food applications, retort pouches are widely known as a packaging form that can be stored for a long period of time, and have already been put to practical use in all fields.
- the structure of the retort pouch itself is self-supporting so that it can be displayed at the store as it is without putting it in the outer box for the purpose of reducing the packaging material that becomes waste after use.
- Standing pouches that have been used are becoming popular.
- the basic performance required for retort packaging materials is safety, tasteless and odorless, hot water resistance, light shielding property, aroma retention, discoloration resistance, various gas barrier properties, strength against pressure, impact, puncture, etc. , Flex resistance, and hermeticity, etc.
- an optimal laminate structure is designed according to the conditions of heat treatment, the type of contents, the internal capacity, and the like.
- biaxially oriented polyethylene terephthalate film hereinafter abbreviated as OPET
- impact resistance, pinhole resistance, and puncture resistance to impart hot water resistance, waist (self-supporting), gloss, printability, and aroma retention.
- Biaxially stretched nylon film (hereinafter abbreviated as ONy) to impart heat resistance, aluminum foil or aluminum vapor deposition film or gas barrier coating layer to block light, oxygen and water vapor, and unstretched polypropylene film to impart heat sealability.
- a polyethylene film or the like (hereinafter abbreviated as CPP) is selected, and a retort packaging material is obtained by laminating these materials by dry lamination or the like.
- a typical structure is a stack of the above. (See Patent Document 1, Patent Document 2, Patent Document 3, and Patent Document 4).
- OPET and ONy are generally used as the base material layer of the packaging material for retort, OPET has the advantage of high hot water resistance, but has the weak point of low impact strength, puncture strength, and pinhole resistance.
- ONy has high impact strength and puncture strength, since the film itself has hygroscopicity, it has a drawback that when contacted with hot water, the strength is lowered by hydrolysis. From the above viewpoints, particularly under severe retort conditions of 130 ° C. or higher, or when high compressive strength and impact resistance are required, in order to compensate for the disadvantages of both base materials, OPET and ONy are used as base material layers. Are used together.
- Patent Documents 6 and 7 disclose biaxially stretched films containing PBT. According to such a technique, since it is excellent in impact resistance and puncture resistance, and can withstand severe heat treatment such as retort treatment, a configuration in which OPET and ONy are used in combination can be replaced with a single-layer film. there is a possibility.
- a packaging bag such as a standing pouch
- the waist feeling of the laminated film is insufficient, and thus the standing pouch lacks independence. There was a problem.
- the present invention has been made against the background of such problems of the conventional technology. That is, the problem of the present invention, it is possible to reduce the packaging material, excellent bag puncture resistance, it is possible to ensure sufficient independence when used as a standing pouch, in packaging such as retort food. It is to provide a suitable laminated film.
- the inventors of the present invention set the rigidity of a laminated film obtained by laminating a film base material layer containing polybutylene terephthalate (PBT) as a main component and a sealant layer to a specific range so that even a single base material layer has high water resistance. It has been found that it has excellent impact resistance and can maintain the self-supporting property when processed into a standing pouch.
- PBT polybutylene terephthalate
- the present invention has the following configurations.
- the base material layer is a biaxially stretched polyester film having a thickness of 9 ⁇ m to 25 ⁇ m and containing 70% by mass or more of polybutylene terephthalate,
- the piercing strength of the laminated film is 9.0 N or more,
- C A laminated film having a numerical value X (mN / 25 mm) of loop stiffness of the laminated film of 80 or more.
- the present invention it is possible to reduce the amount of packaging material, it is excellent in bag puncture resistance, and a laminated film suitable for liquid packaging such as retort foods that can ensure sufficient self-supporting even when used as a standing pouch. And it has become possible to provide a packaging bag.
- Storage part 2 Side seal part 3: Top seal part 4: Bottom part 5: Length 6: Width 7: Bottom part fold
- the base material layer used in the present invention a film containing PBT as a main component is used.
- the content of PBT in the base material layer is preferably 60% by mass or more, and more preferably 70% by mass or more. If it is less than 60% by mass, the impact strength or the pinhole resistance will be deteriorated and the film characteristics will not be sufficient.
- the PBT used as the main constituent component of the base material layer preferably contains 90 mol% or more of terephthalic acid as a dicarboxylic acid component, more preferably 95 mol% or more, and further preferably 98 mol% or more. It is preferably 100 mol%.
- 1,4-butanediol is preferably 90 mol% or more, more preferably 95 mol% or more, further preferably 97 mol% or more, and most preferably 1,4-butane at the time of polymerization. This means that it does not contain any byproducts other than those produced by the ether bond of the diol.
- the base material layer used in the present invention may contain a polyester resin other than PBT for the purpose of adjusting the film-forming property during stretching and the mechanical properties of the obtained film.
- Polyester resins other than PBT include polyethylene terephthalate (hereinafter abbreviated as PET), polyethylene naphthalate, polybutylene naphthalate and polypropylene terephthalate, and isophthalic acid, orthophthalic acid, naphthalenedicarboxylic acid, biphenyldicarboxylic acid, cyclohexanedicarboxylic acid, adipic acid.
- the upper limit of the amount of polyester resin other than PBT added is 40% by mass or less, preferably 30% by mass or less. If the addition amount of the polyester resin other than PBT exceeds 40% by mass, the mechanical properties as PBT will be impaired, and impact strength, pinhole resistance, or bag-breaking resistance will be insufficient, and transparency and gas barrier properties will be insufficient. May decrease.
- the lower limit of the intrinsic viscosity of the PBT resin used in the present invention is preferably 0.9 dl / g, more preferably 0.95 dl / g, and further preferably 1.0 dl / g.
- the upper limit of the intrinsic viscosity of the PBT resin is preferably 1.3 dl / g. If it exceeds the above range, the stress during stretching becomes too high, and the film formability may deteriorate.
- the PBT resin may contain conventionally known additives such as lubricants, stabilizers, colorants, antistatic agents, and ultraviolet absorbers, if necessary.
- organic lubricants are preferable, silica and calcium carbonate are more preferable, and silica is particularly preferable in view of reducing haze. By these, transparency and slipperiness can be exhibited.
- the lower limit of the concentration of the lubricant is preferably 100 ppm, more preferably 500 ppm, further preferably 800 ppm. When it is less than the above range, the slipperiness of the base layer film may decrease.
- the upper limit of the concentration of the lubricant is preferably 20000 ppm, more preferably 10000 ppm, and further preferably 1800 ppm. If it exceeds the above range, the transparency may decrease.
- the substrate layer film in the present invention preferably has a resin of the same composition over the entire area of the film.
- the lower limit of the thickness of the substrate layer film in the present invention is preferably 3 ⁇ m, more preferably 5 ⁇ m, and further preferably 8 ⁇ m. When the thickness is 3 ⁇ m or more, the strength of the base material layer film is sufficient.
- the upper limit of the thickness of the base layer film is preferably 100 ⁇ m, more preferably 75 ⁇ m, and further preferably 50 ⁇ m. When it is 100 ⁇ m or less, the processing for the purpose of the present invention becomes easier.
- the method for producing the base layer film used in the present invention will be specifically described. It is not limited to these.
- the film raw material is vacuum dried or hot air dried.
- the raw materials are weighed and mixed, supplied to an extruder, heated and melted, and melt cast into a sheet.
- the molten resin sheet is brought into close contact with a cooling roll (casting roll) by an electrostatic application method to be cooled and solidified to obtain an unstretched sheet.
- the electrostatic application method in the vicinity of the resin sheet in a molten state is in contact with the rotating metal roll, by applying a voltage to the electrode installed in the vicinity of the opposite surface of the surface of the resin sheet in contact with the rotating metal roll, In this method, the resin sheet is charged and the resin sheet and the rotating cooling roll are brought into close contact with each other.
- the lower limit of the heating and melting temperature of the resin is preferably 200 ° C, more preferably 250 ° C, and further preferably 260 ° C. If it is less than the above, ejection may be unstable.
- the upper limit of the resin melting temperature is preferably 280 ° C, more preferably 270 ° C. When it exceeds the above range, the decomposition of the resin proceeds and the film becomes brittle.
- the method for forming the molten raw material resin into multiple layers is not particularly limited, but a static mixer and / or a multi-layer feed block is preferable from the viewpoint of facility simplicity and maintainability.
- the number of layers is preferably 60 or more. It is more preferably 500. If the number of laminated layers is too small, the distance between layer interfaces becomes long and the crystal size becomes too large, the difference in crystallinity in the width direction and the crystallinity near both ends of the sheet increase, and the film formation becomes unstable.
- the upper limit of the number of layers is not particularly limited, but it is preferably 100,000, more preferably 10,000, and further preferably 7,000. Even if the theoretical number of layers is extremely increased, the effect may be saturated.
- the theoretical number of layers can be adjusted by selecting the number of elements in the static mixer.
- the static mixer is generally known as a static mixer (line mixer) having no driving unit, and the fluid that has entered the mixer is sequentially stirred and mixed by the elements.
- the high-viscosity fluid is passed through the static mixer, the high-viscosity fluid is divided and laminated, and a laminated fluid is formed.
- the upper limit of the cooling roll temperature when the molten polyester resin is cast on the extrusion cooling roll is preferably 40 ° C. If it exceeds the above range, the crystallinity becomes too high, and stretching may be difficult.
- the upper limit of the cooling roll temperature is preferably 25 ° C. When the temperature of the cooling roll is set within the above range, it is preferable to reduce the humidity of the environment near the cooling roll in order to prevent dew condensation. It is preferable to reduce the temperature difference in the width direction of the cooling roll surface.
- the lower limit of the cooling roll temperature is preferably -10 ° C. If it is less than the above, the effect of suppressing crystallization may be saturated.
- the thickness of the unstretched sheet is preferably in the range of 15 to 2500 ⁇ m.
- the stretching method can be simultaneous biaxial stretching or sequential biaxial stretching, but in order to increase the puncture strength, it is necessary to increase the degree of plane orientation, and in addition, the film forming speed is high and the productivity is high. In the above, sequential biaxial stretching is the most preferable.
- the lower limit of the stretching temperature in the longitudinal stretching direction is preferably 55 ° C, more preferably 60 ° C. If the temperature is 55 ° C. or higher, breakage hardly occurs. Further, since the degree of longitudinal orientation of the film does not become too strong, shrinkage stress at the time of heat setting treatment can be suppressed, and a film with little distortion of molecular orientation in the width direction can be obtained.
- the upper limit of the stretching temperature in the longitudinal stretching direction is preferably 100 ° C, more preferably 95 ° C. When the temperature is 100 ° C. or lower, the orientation of the film does not become too weak and the mechanical properties of the film do not deteriorate.
- the lower limit of the stretching ratio in the longitudinal stretching direction is preferably 2.8 times, particularly preferably 3.0 times. When it is 2.8 times or more, the plane orientation degree becomes large, the piercing strength of the film is improved, and the thickness accuracy of the film is improved.
- the upper limit of the stretching ratio in the longitudinal stretching direction is preferably 4.3 times, more preferably 4.0 times, and particularly preferably 3.8 times. When it is 4.3 times or less, the degree of orientation in the lateral direction of the film does not become too strong, the shrinkage stress at the time of heat setting treatment does not become too large, and the distortion of the molecular orientation in the lateral direction of the film becomes small. As a result, the straight-line tearability in the vertical direction is improved. In addition, the effect of improving mechanical strength and thickness unevenness is saturated in this range.
- the lower limit of the stretching temperature in the transverse stretching direction is preferably 60 ° C, and if it is 60 ° C or more, breakage may be difficult to occur.
- the upper limit of the stretching temperature in the transverse stretching direction is preferably 100 ° C., and when it is 100 ° C. or less, the degree of orientation in the transverse direction becomes large and the mechanical properties are improved.
- the lower limit of the stretching ratio in the transverse stretching direction is preferably 3.5 times, more preferably 3.6 times, and particularly preferably 3.7 times. If it is 3.5 times or more, the degree of orientation in the lateral direction does not become too weak, and the mechanical characteristics and thickness unevenness are improved.
- the upper limit of the stretching ratio in the transverse stretching direction is preferably 5 times, more preferably 4.5 times, and particularly preferably 4.0 times. When it is 5.0 times or less, the effect of improving mechanical strength and thickness unevenness becomes maximum (saturated) even in this range.
- the lower limit of the heat setting temperature in the heat setting step is preferably 195 ° C, more preferably 200 ° C.
- the upper limit of the heat setting temperature is preferably 220 ° C., and when it is 220 ° C. or less, the base film layer does not melt and becomes hard to be brittle.
- Thermal relaxation process in base layer film production After the heat setting step, heat relaxation treatment is performed for the purpose of improving thermal dimensional stability.
- the lower limit of the temperature in the thermal relaxation step is preferably 180 ° C, more preferably 200 ° C. When the temperature is 180 ° C. or higher, the heat shrinkage rate of the film becomes small, and the inorganic thin film layer is less likely to be damaged even after the retort treatment, so that the gas barrier property is improved.
- the upper limit of the temperature of the heat relaxation step is preferably 220 ° C., and when it is 220 ° C. or less, the base film layer does not melt and becomes hard to be brittle.
- the lower limit of the relaxation rate in the heat relaxation step is preferably 0.5%.
- the upper limit of the relaxation rate is preferably 10%. When it is 10% or less, the shrinkage in the longitudinal direction during heat setting becomes small, and as a result, the distortion of the molecular orientation at the end of the film becomes small and the straight-line tearability is improved. In addition, sagging of the film is less likely to occur, and uneven thickness is less likely to occur.
- the temperature of the surface of the end portion of the polyester film is preferably 80 ° C. or lower. If the temperature of the end portion of the film after passing through the cooling step exceeds 80 ° C., the end portion is stretched by the tension applied when the film is wound, and as a result, the heat shrinkage ratio in the longitudinal direction of the end portion becomes high. As a result, the heat shrinkage distribution in the width direction of the roll becomes uneven, and when such a roll is heated and transported to perform vapor deposition processing, streak-like wrinkles occur and the gas barrier finally obtained. The physical properties of the film may become uneven in the width direction.
- the cooling step as a method for controlling the surface temperature of the film end portion to 80 ° C. or less, the temperature and air flow rate in the cooling step are adjusted, and a shield plate is provided on the center side in the width direction of the cooling zone to select the end portion. It is possible to use a method of cooling the film or a method of locally blowing cold air to the end portion of the film.
- the lower limit of the degree of orientation ( ⁇ Nx) in the MD direction of the substrate layer film in the present invention is preferably 0.04, more preferably 0.045, and further preferably 0.05. If it is less than the above range, the orientation is weak, so that sufficient impact strength as a substrate layer film cannot be obtained, and the bag breaking resistance is deteriorated. Further, when the inorganic thin film layer and the protective layer are provided on the substrate layer film to form a laminated film, the tensile strength and temperature applied during the formation of the protective film facilitates elongation, and the inorganic thin film layer is cracked. May decrease.
- the upper limit of the degree of orientation ( ⁇ Nx) in the MD direction of the substrate film in the present invention is preferably 0.09, more preferably 0.085, and further preferably 0.08. Within the above range, the mechanical properties and linear tearability of the base layer film will be more preferable.
- the upper limit of the haze per thickness of the substrate layer film in the present invention is preferably 0.66% / ⁇ m, more preferably 0.60% / ⁇ m, and further preferably 0.53% / ⁇ m.
- the base layer film in the present invention may be subjected to corona discharge treatment, glow discharge treatment, flame treatment, surface roughening treatment, as long as the object of the present invention is not impaired, and a known anchor. It may be coated, printed, decorated, or the like.
- An easy-adhesion layer can be provided on the base layer film used for the laminated film of the present invention. Particularly when an inorganic thin film layer is formed on the base material layer film, it is preferable to provide an easy adhesion layer between the base material layer film and the inorganic thin film layer in order to secure gas barrier properties and laminate strength after retort treatment. .
- the easy-adhesion layer provided on the substrate layer film urethane-based, polyester-based, acrylic-based, titanium-based, isocyanate-based, imine-based, polybutadiene-based resins, etc., epoxy-based, isocyanate-based, melamine-based curing agents, etc.
- the solvent examples include aromatic solvents such as benzene and toluene; alcohol solvents such as methanol and ethanol; ketone solvents such as acetone and methyl ethyl ketone; ester solvents such as ethyl acetate and butyl acetate; ethylene glycol monomethyl ether. And other polyhydric alcohol derivatives.
- the resin composition used for these adhesion layers preferably contains a silane coupling agent having at least one organic functional group. Examples of the organic functional group include an alkoxy group, an amino group, an epoxy group and an isocyanate group. The addition of the silane coupling agent further improves the laminate strength after the retort treatment.
- the resin compositions used for the easy-adhesion layer it is preferable to use a mixture of a resin containing an oxazoline group, an acrylic resin and a urethane resin.
- the oxazoline group has a high affinity with the inorganic thin film, and can react with the oxygen deficiency part of the inorganic oxide generated during the formation of the inorganic thin film layer and the metal hydroxide, and exhibits a strong adhesiveness with the inorganic thin film layer.
- the unreacted oxazoline group present in the easy-adhesion layer can react with the carboxylic acid terminal generated by the hydrolysis of the base layer film and the easy-adhesion layer to form a crosslink.
- a conventionally known method such as a coating method can be adopted.
- the offline coating method and the in-line coating method can be mentioned as suitable methods.
- the conditions of drying and heat treatment during coating depend on the coat thickness and the conditions of the apparatus, but immediately after coating, the film is sent to the stretching process in the perpendicular direction. Drying is preferably carried out in the preheating zone or the stretching zone of the stretching step, and in such a case, it is preferable that the temperature is usually about 50 to 250 ° C.
- a gas barrier layer can be provided on the base material layer of the laminated film of the present invention.
- the inorganic thin film layer and its forming method will be described.
- the inorganic thin film layer is a thin film made of metal or inorganic oxide.
- the material forming the inorganic thin film layer is not particularly limited as long as it can be formed into a thin film, but from the viewpoint of gas barrier properties, inorganic oxides such as silicon oxide (silica), aluminum oxide (alumina), and a mixture of silicon oxide and aluminum oxide. The thing is preferably mentioned. In particular, a composite oxide of silicon oxide and aluminum oxide is preferable from the viewpoint of achieving both flexibility and denseness of the thin film layer.
- the mixing ratio of silicon oxide and aluminum oxide is preferably in the range of 20 to 70% by mass of Al in terms of the mass ratio of metal components. If the Al concentration is less than 20% by mass, the water vapor barrier property may decrease. On the other hand, if it exceeds 70% by mass, the inorganic thin film layer tends to become hard, and the film may be destroyed during secondary processing such as printing or laminating, and the gas barrier property may deteriorate.
- the silicon oxide mentioned here is various silicon oxides such as SiO and SiO 2 or a mixture thereof
- the aluminum oxide is various aluminum oxides such as AlO and Al 2 O 3 or a mixture thereof.
- the thickness of the inorganic thin film layer is usually 1 to 100 nm, preferably 5 to 50 nm.
- the film thickness of the inorganic thin film layer is less than 1 nm, it may be difficult to obtain a satisfactory gas barrier property.
- the inorganic thin film layer exceeds 100 nm and is excessively thick, a corresponding gas barrier property improving effect is obtained. Therefore, it is rather disadvantageous in terms of bending resistance and manufacturing cost.
- the method for forming the inorganic thin film layer is not particularly limited, and known vapor deposition methods such as vacuum vapor deposition method, sputtering method, physical vapor deposition method (PVD method) such as ion plating method, or chemical vapor deposition method (CVD method) are known.
- the method may be adopted as appropriate.
- a typical method of forming an inorganic thin film layer will be described by taking a silicon oxide / aluminum oxide thin film as an example.
- a mixture of SiO 2 and Al 2 O 3, a mixture of SiO 2 and Al, or the like is preferably used as a vapor deposition material. Particles are usually used as these vapor deposition raw materials.
- the size of each particle is preferably such that the pressure during vapor deposition does not change, and the preferable particle diameter is 1 mm to 5 mm.
- heating methods such as resistance heating, high frequency induction heating, electron beam heating, and laser heating can be adopted. It is also possible to introduce oxygen, nitrogen, hydrogen, argon, carbon dioxide gas, water vapor or the like as a reaction gas, or to adopt reactive vapor deposition using means such as ozone addition or ion assist.
- film forming conditions can be arbitrarily changed, such as applying a bias to the object to be vapor-deposited (laminated film to be subjected to vapor deposition), heating or cooling the object to be vapor-deposited.
- the vapor deposition material, the reaction gas, the bias of the object to be vapor-deposited, the heating / cooling and the like can be similarly changed when the sputtering method or the CVD method is adopted.
- a protective layer can be further provided thereon.
- the protective layer and the method for forming the protective layer will be described.
- the gas barrier layer is an inorganic thin film layer such as a metal oxide layer
- the inorganic thin film is not a completely dense film, and minute defects are scattered.
- the resin in the protective layer resin composition penetrates into the defective portion of the inorganic thin film layer, resulting in The effect of stabilizing the gas barrier property is obtained.
- the gas barrier performance of the laminated film can be greatly improved.
- the protective layer examples include urethane-based resins, polyester-based resins, acrylic-based resins, titanate-based resins, isocyanate-based resins, imine-based resins, polybutadiene-based resins, epoxy-based curing agents, isocyanate-based curing agents, and melamine.
- the solvent for the resin include aromatic solvents such as benzene and toluene, alcohol solvents such as methanol and ethanol, ketone solvents such as acetone and methyl ethyl ketone, ester solvents such as ethyl acetate and butyl acetate, and ethylene glycol.
- the urethane resin has a polar group of urethane bond interacting with the inorganic thin film layer and also has flexibility due to the presence of the amorphous portion, so that it is possible to suppress damage to the inorganic thin film layer even when a bending load is applied. Therefore, it is preferable.
- the acid value of the urethane resin is preferably in the range of 10 to 60 mgKOH / g. It is more preferably within the range of 15 to 55 mgKOH / g, and even more preferably within the range of 20 to 50 mgKOH / g.
- the acid value of the urethane resin is within the above range, the liquid stability is improved when it is made into an aqueous dispersion, and the protective layer can be uniformly deposited on the highly polar inorganic thin film, resulting in a good coat appearance.
- the urethane resin has a glass transition temperature (Tg) of preferably 80 ° C. or higher, more preferably 90 ° C. or higher. By setting Tg to 80 ° C. or higher, it is possible to reduce swelling of the protective layer due to molecular motion in the wet heat treatment process (temperature increase-heat retention-temperature decrease).
- the urethane resin it is more preferable to use a urethane resin containing an aromatic diisocyanate or an araliphatic diisocyanate as a main constituent from the viewpoint of improving gas barrier properties. Among them, it is particularly preferable to contain the metaxylylene diisocyanate component.
- the proportion of aromatic diisocyanate or araliphatic diisocyanate in the urethane resin is preferably in the range of 50 to 100 mol% in 100 mol% of the polyisocyanate component.
- the ratio of the total amount of aromatic diisocyanate or araliphatic diisocyanate is preferably 60 to 100 mol%, more preferably 70 to 100 mol%, and further preferably 80 to 100 mol%.
- "Takelac (registered trademark) WPB" series commercially available from Mitsui Chemicals, Inc. can be preferably used.
- the urethane resin preferably has a carboxylic acid group (carboxyl group) from the viewpoint of improving the affinity with the inorganic thin film layer.
- a carboxylic acid (salt) group for example, a polyol compound having a carboxylic acid group such as dimethylolpropionic acid and dimethylolbutanoic acid may be introduced as a copolymer component.
- the urethane resin of the water dispersion can be obtained by synthesizing the carboxylic acid group-containing urethane resin and then neutralizing it with a salt forming agent.
- the salt forming agent include ammonia, trimethylamine, triethylamine, triisopropylamine, tri-n-propylamine, tri-n-butylamine and other trialkylamines, N-methylmorpholine, N-ethylmorpholine and other N -N-dialkylalkanolamines such as -alkylmorpholines, N-dimethylethanolamine, N-diethylethanolamine and the like can be mentioned. These may be used alone or in combination of two or more.
- the upper limit of the heat shrinkage rate after heating the base material layer of the present invention in the MD direction (longitudinal stretching direction) at 150 ° C. for 15 minutes is preferably 4.0%, more preferably 3.0%, and further preferably Is 2%. If the upper limit is exceeded, the inorganic thin film layer may crack due to the dimensional change of the base layer film that occurs in the protective film forming step or high temperature treatment such as retort sterilization treatment, and not only the gas barrier property may deteriorate, but also printing etc. Pitch deviation may occur due to dimensional changes during processing.
- the lower limit of the heat shrinkage rate after heating the base material layer in the MD direction at 150 ° C. for 15 minutes in the present invention is preferably 1%. If it is less than the above, the tension tends to increase due to the tension applied in the protective film forming step after forming the inorganic thin film layer, and the gas barrier property may be deteriorated. Further, it may be mechanically brittle.
- the upper limit of the heat shrinkage ratio after heating the base material layer in the present invention in the TD direction (transverse stretching direction) at 150 ° C. for 15 minutes is preferably 3.0%, more preferably 2.0%, and It is preferably 1%. If the upper limit is exceeded, the inorganic thin film layer may crack due to the dimensional change of the base layer film that occurs in the protective film forming step or high temperature treatment such as retort sterilization treatment, and not only the gas barrier property may deteriorate, but also printing etc. Pitch deviation may occur due to dimensional changes during processing.
- the lower limit of the heat shrinkage ratio after heating the base material layer in the TD direction of the present invention at 150 ° C. for 15 minutes in the TD direction is preferably ⁇ 1.0%. If it is less than the above, the improvement effect cannot be further obtained. Further, it may be mechanically brittle.
- the laminated film of the present invention is a laminated film including at least a base layer film and a sealant layer. That is, it is a film in which a heat-sealable resin layer called a sealant is laminated on a base material layer film.
- the heat-sealable resin layer is usually laminated on the substrate layer film by an extrusion laminating method or a dry laminating method.
- the heat-sealable resin layer is usually provided on the upper side of the inorganic thin film layer, but it may be provided on the outer side of the base material layer film (the surface opposite to the inorganic thin film layer side).
- the thermoplastic polymer that forms the heat-sealable resin layer may be any polymer that can sufficiently exhibit heat-sealability, such as high-density polyethylene (abbreviated as HDPE), low-density polyethylene (abbreviated as LDPE), and linear A polyethylene resin such as low density polyethylene (abbreviated as LLDPE), a polypropylene resin, an ethylene-vinyl acetate copolymer, an ethylene- ⁇ -olefin random copolymer, an ionomer resin or the like can be used.
- HDPE high-density polyethylene
- LDPE low-density polyethylene
- LLDPE linear A polyethylene resin
- LLDPE low density polyethylene
- a polypropylene resin an ethylene-vinyl acetate copolymer
- ethylene- ⁇ -olefin random copolymer ethylene- ⁇ -olefin random copolymer
- ionomer resin or the like can be used.
- the laminated film of the present invention may have at least one or more printed layers, other plastic base materials and / or paper base materials, and metal foils laminated on the outside and / or between the layers.
- the printing ink for forming the printing layer water-based and solvent-based resin-containing printing inks can be preferably used.
- the resin used in the printing ink here include acrylic resins, urethane resins, polyester resins, vinyl chloride resins, vinyl acetate copolymer resins, and mixtures thereof.
- Printing inks include antistatic agents, light blocking agents, ultraviolet absorbers, plasticizers, lubricants, fillers, colorants, stabilizers, lubricants, defoamers, crosslinkers, antiblocking agents, antioxidants, etc.
- the additive may be included.
- the printing method for providing the printing layer is not particularly limited, and known printing methods such as an offset printing method, a gravure printing method and a screen printing method can be used.
- known drying methods such as hot air drying, hot roll drying and infrared ray drying can be used.
- the lower limit of the numerical value X (mN / 25 mm) of loop stiffness of the laminated film of the present invention is preferably 80, more preferably 90, and most preferably 100.
- the loop stiffness refers to the repulsive force of the loop measured by forming a loop using a film cut into a strip of a predetermined size and crushing the loop in the radial direction by a predetermined amount, and the rigidity of the film. Is an index representing. If the loop stiffness of the laminated film is less than the above, it is not possible to secure the self-sustainability of the standing pouch even when the internal capacity is small, and problems such as crushing during display at the store occur. The higher the loop stiffness value, the higher the rigidity of the laminated film. The method for measuring loop stiffness will be described later.
- packaging bags such as standing pouches, which were conventionally made of a laminated film using a base film obtained by laminating OPET and ONy, can be made of a laminated film made of a single layer of the base film, so that it can be used for retort or electronic applications. It can be widely applied as a food packaging material for heating in a microwave oven.
- one end of the cylindrical film was fixed to the outer periphery of a disk-shaped fixed head of a Gelbo flex tester (manufactured by Rigaku Kogyo Co., Ltd., NO.901 type) (in accordance with the standard of MIL-B-131C), and the cylindrical film was formed.
- the other end of was fixed to the outer circumference of the disk-shaped movable head of the tester facing the fixed head with a distance of 17.8 cm (7 inches).
- the movable head is rotated 440 ° while approaching the fixed head in the direction of 7.6 cm (3.5 inches) along the axes of the two heads facing each other in parallel, and then is rotated 6.4 cm (without rotating).
- FIGS. 1 and 2 A standing pouch having the shape shown in FIGS. 1 and 2 was prepared using the laminated films shown in Examples, Comparative Examples and Reference Examples described later.
- the outer dimensions of the standing pouch body corresponded to the volume of water to be filled and were set to the dimensions shown in Table 1.
- the heat seal part on the bottom has a warp curved part on the upper part like the normal standing pouch, the lower side of the curved part is heat-sealed, and at the bottom of the curved part, the length of the pouch to the lower end is 5 mm.
- the bottom portion was formed by heat-sealing with a pattern having a seal portion, and the body portion was formed by heat-sealing the left and right sides of the pouch with a heat-sealing width of 5 mm.
- the unsealed upper part was opened as an opening for filling the contents.
- each of the unsealed upper openings was filled with water having the volume shown in Table 1 as a content, and then the openings were degassed and sealed to seal the pouches, thereby producing standing pouches for self-supporting evaluation.
- the temperature at the time of heat sealing when producing a standing pouch was 160 ° C. ⁇ 1 second for LLDPE and 200 ° C. ⁇ 1 second for an unstretched polypropylene film.
- PBT resin 1100-211XG (manufactured by CHANG CHUN PLASTICS CO., LTD., Intrinsic viscosity 1.28 dl / g) was used as the PBT resin used in the film production of the base layer films A1 to A3 described later.
- PET resin PET resin having a specific viscosity of 0.62 dl / g, manufactured by Toyobo Co., Ltd. was used as the PET resin used in the film production of the substrate layer films A1 to A3 described later.
- Resin (A) having an oxazoline group for the easy-adhesion layer As a resin having an oxazoline group, a commercially available water-soluble oxazoline group-containing acrylate (“Epocros (registered trademark) WS-300” manufactured by Nippon Shokubai Co., Ltd .; solid content) 10%) was prepared. The amount of oxazoline groups in this resin was 7.7 mmol / g.
- Acrylic resin (B) for the easy-adhesion layer As the acrylic resin, a commercially available 25 mass% emulsion of an acrylic acid ester copolymer (“Movinyl (registered trademark) 7980” manufactured by Nichigo Movinyl Co., Ltd.) was prepared. The acid value (theoretical value) of the acrylic resin (B) was 4 mgKOH / g.
- Urethane resin (C) for easy-adhesion layer As a urethane resin, a commercially available polyester urethane resin dispersion (“Takelac (registered trademark) W605” manufactured by Mitsui Chemicals, Inc .; solid content: 30%) was prepared. The acid value of this urethane resin was 25 mgKOH / g, and the glass transition temperature (Tg) measured by DSC was 100 ° C. . The ratio of aromatic diisocyanate or araliphatic diisocyanate to the whole polyisocyanate component measured by 1H-NMR was 55 mol%.
- Urethane resin (D) for protective layer As a urethane resin, a commercially available dispersion of a metaxylylene group-containing urethane resin (“Takelac (registered trademark) WPB341” manufactured by Mitsui Chemicals, Inc .; solid content: 30%) was prepared. . The acid value of this urethane resin was 25 mgKOH / g, and the glass transition temperature (Tg) measured by DSC was 130 ° C. The ratio of aromatic diisocyanate or araliphatic diisocyanate to the total polyisocyanate component measured by 1 H-NMR was 85 mol%.
- Coating liquid 1 (coat 1) used for the easy-adhesion layer Each material was mixed in the following blending ratio to prepare a coating liquid (resin composition for easy-adhesion layer).
- Coating liquid 2 used for the protective layer
- the following coating materials were mixed to prepare coating liquid 2.
- the mass ratio of the urethane resin (E) in terms of solid content is as shown in.
- the resin composition for easy-adhesion layer (coating liquid 1) was applied by the fountain bar coating method after stretching in the MD direction. Then, it was introduced into a tenter while being dried, stretched in the TD direction under the above-mentioned film forming conditions, heat-treated and relaxed to obtain a laminated film A1 in which an easily adhesive layer was formed on one surface of a PBT film having a thickness of 15 ⁇ m.
- the discharge amount when casting the molten resin from the T-die was adjusted to obtain a PBT film having a thickness of 20 ⁇ m.
- the resin composition for easy-adhesion layer (coating liquid 1) was applied by the fountain bar coating method after stretching in the MD direction. Then, it was introduced into a tenter while being dried, and stretched in the TD direction, heat-treated and relaxed under the above-mentioned film forming conditions to obtain a laminated film A2 in which an easy-adhesion layer was formed on one surface of a PBT film having a thickness of 20 ⁇ m.
- the longitudinally stretched film was forcibly cooled by a cooling roll set to a surface temperature of 25 ° C., then passed through a tenter and stretched 4.0 times in the TD direction at 90 ° C. for 3 seconds at 210 ° C.
- the grip portions at both ends were cut and removed by 10% to obtain a mill roll of a PBT film having a thickness of 15 ⁇ m.
- Table 1 shows film forming conditions, physical properties and evaluation results of the obtained film.
- the resin composition for easy-adhesion layer (coating liquid 1) was applied by the fountain bar coating method after stretching in the MD direction. Then, it was introduced into a tenter while being dried, stretched in the TD direction under the above-mentioned film forming conditions, heat-treated and relaxed to obtain a laminated film A1 in which an easily adhesive layer was formed on one surface of a PBT film having a thickness of 15 ⁇ m.
- the film thickness of the inorganic thin film layer (SiO 2 / A1 2 O 3 composite oxide layer) in the film (inorganic thin film layer / easy-adhesion layer-containing film) thus obtained was 13 nm.
- the inorganic thin film layer M2 aluminum oxide was vapor-deposited on the base material layer films A-1 and OPET of the comparative example.
- the film is set on the unwinding side of a continuous vacuum vapor deposition machine and is run through a cooling metal drum to wind up the film.
- the continuous vacuum vapor deposition machine was depressurized to 10 ⁇ 4 Torr or less, and aluminum alumina crucible was charged with metallic aluminum having a purity of 99.99% from the lower part of the cooling drum to evaporate the metallic aluminum by heating and vaporize it.
- Oxygen was supplied to carry out an oxidation reaction to deposit and deposit on the film to form an aluminum oxide film having a thickness of 30 nm.
- the coating liquid 2 was applied on the inorganic thin film layer formed on the base material layer film by a wire bar coating method and dried at 200 ° C. for 15 seconds to obtain a protective layer.
- the coating amount after drying was 0.19 g / m 2 (Dry).
- a gas barrier laminate film having an easily adhesive layer / inorganic thin film layer / protective layer on the substrate layer film was produced.
- Example 1 On the above-prepared base film A-1, coat 1 as an easy-adhesion layer, M1 as an inorganic vapor deposition layer, and coat 2 as a protective layer were laminated in this order to produce a gas barrier film.
- an adhesive (“TM569” manufactured by Toyo Morton Co., Ltd.), a curing agent “CAT-10L”, and ethyl acetate 33.6: 4.0: 62.4 ( (Mass ratio) (blended) and a polyethylene film (“L4102” manufactured by Toyobo Co., Ltd.) having a thickness of 60 ⁇ m is attached as a sealant layer by a dry laminating method, and aging is performed at 40 ° C. for 4 days.
- the laminated film of Example 1 was obtained.
- the thickness of the adhesive layer formed of the urethane-based two-component curable adhesive after drying was 4 ⁇ m.
- Example 2 Lamination of Example 2 in the same manner as in Example 1 except that in the laminated film of Example 1 described above, A-3 was used as the base material and an LLDPE film (Evolew SP2020 made by Prime Polymer, thickness 130 ⁇ m) was used as the sealant layer. I got a film. The thickness of the adhesive layer formed of the urethane-based two-component curable adhesive after drying was 4 ⁇ m.
- Example 3 On the above-prepared base film A-1, coat 1 as an easy-adhesion layer, M1 as an inorganic vapor deposition layer, and coat 2 as a protective layer were laminated in this order to produce a gas barrier film.
- a urethane-based two-component curable adhesive (“Takelac (registered trademark) A525S” and “Takenate (registered trademark) A50” manufactured by Mitsui Chemicals, Inc. in a ratio of 13.5: 1 (mass ratio) is used.
- Example 3 by adhering a 70 ⁇ m thick CPP (“P1147” manufactured by Toyobo Co., Ltd.) as a heat-sealable resin layer by a dry laminating method using a blending ratio) and aging at 40 ° C. for 4 days. A laminated film of was obtained. The thickness of the adhesive layer formed of the urethane-based two-component curable adhesive after drying was 4 ⁇ m.
- Example 4 In the laminated film of Example 3 described above, a laminated film of Example 4 was obtained in the same manner as in Example 1 except that the base film was A-2. The thickness of the adhesive layer formed of the urethane-based two-component curable adhesive after drying was 4 ⁇ m.
- Example 5 On the base film A-1 obtained above, an aluminum foil (8079 material, thickness 7 ⁇ m) is used as a urethane two-component curing adhesive (“Takelac (registered trademark) A525S” and “Takenate” manufactured by Mitsui Chemicals, Inc. (Registered trademark) A50 "was blended in a ratio of 13.5: 1 (mass ratio)) to dry-laminate the substrate film / aluminum foil laminate.
- the same adhesive as above was used, and a CPP having a thickness of 50 ⁇ m as a heat-sealable resin layer (“P1147” manufactured by Toyobo Co., Ltd.). Were laminated and aged at 40 ° C. for 4 days to obtain a laminated film of Example 5.
- the thickness of the adhesive layer formed of the urethane-based two-component curable adhesive after drying was 4 ⁇ m in all cases.
- Example 6 The laminated film of Example 6 was the same as Example 5 except that the heat-sealing resin layer was an unstretched polypropylene film having a thickness of 60 ⁇ m (“P1147” manufactured by Toyobo Co., Ltd.). I got a film. The thickness of the adhesive layer formed of the urethane-based two-component curable adhesive after drying was 4 ⁇ m in all cases.
- Comparative Example 1 Comparative Example 1 was repeated in the same manner as in Example 1 except that the inorganic vapor deposition layer was M2 and the sealant layer was a polyethylene film having a thickness of 40 ⁇ m (“L4102” manufactured by Toyobo Co., Ltd.). A laminated film was obtained.
- Comparative Example 2 In the laminated film of Comparative Example 1 described above, a laminated film of Comparative Example 2 was obtained in the same manner as Comparative Example 1 except that the substrate film was OPET having a thickness of 12 ⁇ m (“E5102” manufactured by Toyobo Co., Ltd.).
- Comparative Example 3 As a base film, ONy having a thickness of 15 ⁇ m (“N1102” manufactured by Toyobo Co., Ltd.), an adhesive (“TM569” manufactured by Toyo Morton Co., Ltd.), a curing agent “CAT-10L”, and ethyl acetate 33.6: 4. A polyethylene film (“L4102” manufactured by Toyobo Co., Ltd.) having a thickness of 60 ⁇ m was stuck as a sealant layer by a dry lamination method using 0: 62.4 (mass ratio), and aged at 40 ° C. for 4 days. By performing the above, a laminated film of Comparative Example 3 was obtained. The thickness of the adhesive layer formed of the urethane-based two-component curable adhesive after drying was 4 ⁇ m.
- Comparative Example 4 As a base film, ONy having a thickness of 15 ⁇ m (“N1102” manufactured by Toyobo Co., Ltd.), an adhesive (“TM569” manufactured by Toyo Morton Co., Ltd.), a curing agent “CAT-10L”, and ethyl acetate 33.6: 4. A LLDPE film (Evolue SP2020 made by Prime Polymer, thickness 130 ⁇ m) as a sealant layer is stuck by a dry lamination method using 0: 62.4 (mass ratio), and aged at 40 ° C. for 4 days. Thereby, a laminated film of Comparative Example 4 was obtained. The thickness of the adhesive layer formed of the urethane-based two-component curable adhesive after drying was 4 ⁇ m.
- an adhesive (“TM569” manufactured by Toyo Morton Co., Ltd.), a curing agent “CAT-10L”, and ethyl acetate 33.6: 4.0: 62. 4 (mass ratio)
- a polyethylene film having a thickness of 40 ⁇ m (“L4102” manufactured by Toyobo Co., Ltd.) was stuck as a sealant layer, and aged for 4 days at 40 ° C.
- a laminated film was obtained.
- the thickness of the adhesive layer formed of the urethane-based two-component curable adhesive after drying was 4 ⁇ m.
- Reference Example 2 A laminated film of Reference Example 2 was obtained in the same manner as in Reference Example 1 except that the sealant layer in Reference Example 1 was an LLDPE film (Evolew SP2020 made by Prime Polymer, thickness 130 ⁇ m).
- LLDPE film Evolew SP2020 made by Prime Polymer, thickness 130 ⁇ m.
- aluminum foil 8079 material, thickness 7 ⁇ m
- a urethane two-component curing adhesive (“Takelac (registered trademark) A525S” manufactured by Mitsui Chemicals, Inc.).
- "Takenate (registered trademark) A50” was dry-laminated using 13.5: 1 (mass ratio) to prepare an OPET / ONy / aluminum foil laminate.
- the packaging material can be reduced in weight and the piercing strength is excellent. It was possible to obtain 0.0 N or more, excellent pinhole resistance, and the standing pouch made from it was able to secure sufficient independence.
- Comparative Example 1 since the thickness of the laminated film and the numerical values of the loop stiffness were out of the range of the present invention, the prepared standing pouch was insufficient in self-supporting property.
- Comparative Example 2 since only the conventional OPET film was used as the base material layer, the piercing strength and the pinhole resistance were poor. Further, since the numerical value of the loop stiffness does not satisfy the range of the present invention, the self-reliance as a standing pouch was insufficient.
- Comparative Example 3 since only the conventional ONy was used as the base material layer, although the piercing strength and the pinhole resistance were good, the loop stiffness value did not satisfy the range of the present invention, so that it was used as a standing pouch. Was lacking in independence.
- Reference Examples 1 to 4 show the evaluation results when OPET and ONy, which are excellent in impact resistance and puncture resistance and can withstand heat treatment such as retort treatment, are used as a substrate film by laminating them. It was Comparing the reference example with the example, the laminated film of the present invention of the example is equivalent to the laminated film using two layers of OPET and ONy as the substrate layer, though the substrate layer is one layer. Had performance.
- the present invention it is possible to reduce the amount of packaging material, it is excellent in bag puncture resistance, and it is possible to secure sufficient independence even when used as a standing pouch, suitable for liquid packaging such as retort foods.
- Laminated film can be obtained.
- INDUSTRIAL APPLICABILITY it is possible to provide a laminated film having excellent puncture strength, bag puncture resistance, and bending resistance even after subjected to moist heat treatment.
- a packaging bag such as a standing pouch, which was conventionally made of a laminated film using a base film obtained by laminating OPET and ONy, can be made of a laminated film made of a single layer of the base film. Widely applicable as.
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Abstract
Description
本発明は、食品、医薬品、工業製品等の包装分野に用いられる積層フィルムに関する。更に詳しくは、基材層の上に無機薄膜層や金属箔を有してなる積層フィルムとシーラント層からなる積層フィルムであって、基材層としてポリエステルフィルムとナイロンフィルムの積層フィルムを使用する代わりにポリブチレンテレフタレート(以下PBTと略す)フィルム1層で代替する場合においても、耐突刺し性や耐破袋性に優れ、かつ、スタンディングパウチ用として優れた自立性を有した積層フィルムに関する。 The present invention relates to a laminated film used in the field of packaging foods, pharmaceuticals, industrial products and the like. More specifically, it is a laminated film consisting of a laminated film having an inorganic thin film layer or a metal foil on a base material layer and a sealant layer, instead of using a laminated film of a polyester film and a nylon film as the base material layer. The present invention also relates to a laminated film having excellent puncture resistance and bag puncture resistance even when a single layer of polybutylene terephthalate (hereinafter abbreviated as PBT) film is substituted, and having excellent self-supporting property for a standing pouch.
従来、食品などの内容物の劣化を防ぐために、各種プラスチックフィルム、紙、金属箔等の基材が積層された包装用材料が開発されてきた。一般に、これらの包材の最内層にはヒートシール層が設けられており、それらを重ね合わせてシールすることにより種々の形態に製袋される。次いで開口部から、内容物を充填、ヒートシールして密閉することにより、最終形態の包装製品が完成する。特に食品用途において、長期間保存可能な包装形態として、レトルトパウチが広く知られており、すでにあらゆる分野で実用化されている。
さらに近年では上記のようなレトルトパウチの中でも、使用後に廃棄物となる包装材料の低減を目的として、外箱には入れずにそのまま店頭で陳列できるよう、レトルトパウチそのものが自立性を有した構造をしているスタンディングパウチが多く用いられるようになってきた。
BACKGROUND ART Conventionally, in order to prevent deterioration of contents such as foods, packaging materials in which various plastic films, papers, base materials such as metal foils are laminated have been developed. In general, a heat-sealing layer is provided on the innermost layer of these packaging materials, and a bag is made into various forms by stacking and sealing them. Next, the packaged product in the final form is completed by filling the contents from the opening and heat-sealing them. Particularly in food applications, retort pouches are widely known as a packaging form that can be stored for a long period of time, and have already been put to practical use in all fields.
Furthermore, in recent years, among the above-mentioned retort pouches, the structure of the retort pouch itself is self-supporting so that it can be displayed at the store as it is without putting it in the outer box for the purpose of reducing the packaging material that becomes waste after use. Standing pouches that have been used are becoming popular.
一方、レトルト用包材に必要な基本的な性能としては、安全性、無味無臭、耐熱水性、遮光性、保香性、耐変色性、種々のガスバリア性、耐圧、衝撃、突刺し等の強度、耐屈曲性、及び密閉性等が挙げられ、加熱処理の条件や内容物の種類、内容量等に応じて最適なラミネート構成が設計される。
例えば、耐熱水性や腰(自立性)、光沢や印刷適性、保香性を付与するには二軸延伸ポリエチレンテレフタレートフィルム(以下OPETと略す)、耐衝撃性や耐ピンホール性、耐突刺し性を付与するには二軸延伸ナイロンフィルム(以下ONyと略す)、光、酸素、水蒸気を遮断するにはアルミニウム箔あるいはアルミ蒸着膜やガスバリアコーティング層、ヒートシール性を付与するには未延伸ポリプロピレンフィルム(以下CPPと略す)やポリエチレンフィルム等が選定され、これらの材料をドライラミネート等で積層することによりレトルト用包材が得られる。
On the other hand, the basic performance required for retort packaging materials is safety, tasteless and odorless, hot water resistance, light shielding property, aroma retention, discoloration resistance, various gas barrier properties, strength against pressure, impact, puncture, etc. , Flex resistance, and hermeticity, etc., and an optimal laminate structure is designed according to the conditions of heat treatment, the type of contents, the internal capacity, and the like.
For example, biaxially oriented polyethylene terephthalate film (hereinafter abbreviated as OPET), impact resistance, pinhole resistance, and puncture resistance to impart hot water resistance, waist (self-supporting), gloss, printability, and aroma retention. Biaxially stretched nylon film (hereinafter abbreviated as ONy) to impart heat resistance, aluminum foil or aluminum vapor deposition film or gas barrier coating layer to block light, oxygen and water vapor, and unstretched polypropylene film to impart heat sealability. A polyethylene film or the like (hereinafter abbreviated as CPP) is selected, and a retort packaging material is obtained by laminating these materials by dry lamination or the like.
レトルト用包材のラミネート構成に関して、例えば、外側からOPET//ONy//CPP、OPET//AL//CPP、OPET//ONy//AL//CPP、OPET//AL//ONy//CPP等を積層したものが代表的な構成として挙げられる。(特許文献1、特許文献2、特許文献3、及び特許文献4を参照)。
レトルト用包材の基材層としてはOPETやONyが一般に用いられているが、OPETは耐熱水性が高いという長所がある半面、衝撃強度や突刺し強度、耐ピンホール性が低いという弱点があった。一方、ONyは衝撃強度や突刺し強度が高いものの、フィルム自体が吸湿性を有するため、熱水と接触すると加水分解により強度低下を招くという欠点があった。以上の観点から、特に130℃以上の過酷なレトルト条件の場合や高い耐圧強度、耐衝撃性が要求される場合は、両基材の短所を相互に補うために、基材層としてOPETとONyが併用されている。
Regarding the laminate structure of the retort packaging material, for example, OPET // ONy // CPP, OPET // AL // CPP, OPET // ONy // AL // CPP, OPET // AL // ONy // CPP A typical structure is a stack of the above. (See
Although OPET and ONy are generally used as the base material layer of the packaging material for retort, OPET has the advantage of high hot water resistance, but has the weak point of low impact strength, puncture strength, and pinhole resistance. It was On the other hand, although ONy has high impact strength and puncture strength, since the film itself has hygroscopicity, it has a drawback that when contacted with hot water, the strength is lowered by hydrolysis. From the above viewpoints, particularly under severe retort conditions of 130 ° C. or higher, or when high compressive strength and impact resistance are required, in order to compensate for the disadvantages of both base materials, OPET and ONy are used as base material layers. Are used together.
しかしながら、両基材を併用することにより、省資源や環境負荷への影響の点で問題があった。また、ラミネート工程が多くなるため作業性の面でも改善の余地があった。
そこで近年、上記のようなOPETとONyが積層された構成を1層のフィルムで補う試みがなされている。
例えば、特許文献6、特許文献7ではPBTを含む二軸延伸フィルムが開示されている。かかる技術によれば、耐衝撃性や耐突き刺し性に優れ、さらにはレトルト処理のような過酷な加熱処理にも耐えることができるため、OPETとONyを併用した構成を1層のフィルムで代替できる可能性がある。
しかしながら、基材層を1層にしてシーラント層と積層したフィルムをスタンディングパウチなどの包装袋に加工した場合、積層フィルムとしての腰感が不足するため、スタンディングパウチの自立性が不足してしまうといった問題があった。
However, by using both base materials together, there were problems in terms of resource saving and impact on environmental load. Further, there is room for improvement in terms of workability because the number of laminating processes increases.
Therefore, in recent years, attempts have been made to supplement the above-mentioned laminated structure of OPET and ONy with a single-layer film.
For example,
However, when the film laminated with the sealant layer with the base material layer as one layer is processed into a packaging bag such as a standing pouch, the waist feeling of the laminated film is insufficient, and thus the standing pouch lacks independence. There was a problem.
本発明は、かかる従来技術の課題を背景になされたものである。すなわち、本発明の課題は、包装材料の減量化が可能であり、耐破袋性に優れ、スタンディングパウチとして使用した際にも十分な自立性を確保することができる、レトルト食品などの包装に適した積層フィルムを提供することである。 The present invention has been made against the background of such problems of the conventional technology. That is, the problem of the present invention, it is possible to reduce the packaging material, excellent bag puncture resistance, it is possible to ensure sufficient independence when used as a standing pouch, in packaging such as retort food. It is to provide a suitable laminated film.
本発明者らは、ポリブチレンテレフタレート(PBT)を主成分としたフィルム基材層とシーラント層をラミネートした積層フィルムの剛性を特定の範囲にすることで、基材層が1層でも耐熱水性と耐衝撃性に優れ、かつスタンディングパウチに加工した時に自立性を確保できることを見出した。 The inventors of the present invention set the rigidity of a laminated film obtained by laminating a film base material layer containing polybutylene terephthalate (PBT) as a main component and a sealant layer to a specific range so that even a single base material layer has high water resistance. It has been found that it has excellent impact resistance and can maintain the self-supporting property when processed into a standing pouch.
すなわち本発明は、以下の構成からなる。
(1)少なくとも基材層とシーラント層からなる総厚み59~160μmの積層フィルムであって、
(a)基材層がポリブチレンテレフタレートを70質量%以上含む厚み9μm~25μmの二軸延伸ポリエステルフィルムであり、
(b)積層フィルムの突き刺し強度が9.0N以上であり、
(c)積層フィルムのループスティフネスの数値X(mN/25mm)が80以上であることを特徴とする積層フィルム。
(2)前記基材層の少なくとも片面に無機薄膜層を有していることを特徴とする(1)に記載の積層フィルム。
(3)前記無機薄膜層が酸化ケイ素及び/又は酸化アルミニウムの酸化物からなる層であることを特徴とする(2)記載の積層フィルム。
(4)前記基材層と前記無機薄膜層との間に密着層を有することを特徴とする(2)又は(3)に記載の積層フィルム。
(5)前記無機薄膜層の上に保護層を有することを特徴とする(2)~(4)いずれかに記載の積層フィルム。
(6)前記(1)~(5)いずれかに記載の積層フィルムからなる包装袋。
(7)スタンディングパウチとして使用されることを特徴とする前記(6)に記載の包装袋。
(8)積層フィルムのループスティフネスの数値をXとしたとき、スタンディングパウチの内容量Y(g)が、下記式(1)を満たすことを特徴とする(7)に記載の包装袋。
1.8X ≦ Y ≦3.8X 式(1)
(9)レトルト用に使用されることを特徴とする(6)~(8)いずれかに記載の包装袋。
(10)電子レンジ加熱用に使用されることを特徴とする(6)~(8)いずれかに記載の包装袋。
That is, the present invention has the following configurations.
(1) A laminated film having a total thickness of 59 to 160 μm, comprising at least a base material layer and a sealant layer,
(A) the base material layer is a biaxially stretched polyester film having a thickness of 9 μm to 25 μm and containing 70% by mass or more of polybutylene terephthalate,
(B) The piercing strength of the laminated film is 9.0 N or more,
(C) A laminated film having a numerical value X (mN / 25 mm) of loop stiffness of the laminated film of 80 or more.
(2) The laminated film as described in (1), which has an inorganic thin film layer on at least one surface of the base material layer.
(3) The laminated film as described in (2), wherein the inorganic thin film layer is a layer made of an oxide of silicon oxide and / or aluminum oxide.
(4) The laminated film as described in (2) or (3), which has an adhesion layer between the base material layer and the inorganic thin film layer.
(5) The laminated film according to any one of (2) to (4), which has a protective layer on the inorganic thin film layer.
(6) A packaging bag comprising the laminated film according to any one of (1) to (5) above.
(7) The packaging bag according to (6), which is used as a standing pouch.
(8) The packaging bag according to (7), wherein the content Y (g) of the standing pouch satisfies the following formula (1), where X is a numerical value of the loop stiffness of the laminated film.
1.8X ≤ Y ≤ 3.8X Formula (1)
(9) The packaging bag according to any one of (6) to (8), which is used for a retort.
(10) The packaging bag according to any one of (6) to (8), which is used for heating a microwave oven.
本発明によって、包装材料の減量化が可能であり、耐破袋性に優れ、スタンディングパウチとして使用した際にも十分な自立性を確保することができるレトルト食品などの液体包装に適した積層フィルム及び包装袋を提供することが可能となった。 According to the present invention, it is possible to reduce the amount of packaging material, it is excellent in bag puncture resistance, and a laminated film suitable for liquid packaging such as retort foods that can ensure sufficient self-supporting even when used as a standing pouch. And it has become possible to provide a packaging bag.
1:収納部
2:サイドシール部
3:トップシール部
4:底部
5:長さ
6:幅
7:底部折込
1: Storage part 2: Side seal part 3: Top seal part 4: Bottom part 5: Length 6: Width 7: Bottom part fold
以下、本発明について詳細に説明する。
[基材層フィルム]
本発明に用いる基材層としては、PBTを主たる構成成分とするフィルムを用いる。
基材層のPBTの含有率は60質量%以上が好ましく、さらには70質量%以上が好ましい。60質量%未満であると衝撃強度又は耐ピンホール性が低下してしまい、フィルム特性としては十分なものでなくなってしまう。
基材層の主たる構成成分として用いるPBTは、ジカルボン酸成分として、テレフタル酸が90モル%以上であることが好ましく、より好ましくは95モル%以上であり、さらに好ましくは98モル%以上であり最も好ましくは100モル%である。グリコール成分として1,4-ブタンジオールが90モル%以上であることが好ましく、より好ましくは95モル%以上であり、さらに好ましくは97モル%以上であり、最も好ましくは重合時に1,4-ブタンジオールのエーテル結合により生成する副生物以外は含まれないことである。
Hereinafter, the present invention will be described in detail.
[Substrate layer film]
As the base material layer used in the present invention, a film containing PBT as a main component is used.
The content of PBT in the base material layer is preferably 60% by mass or more, and more preferably 70% by mass or more. If it is less than 60% by mass, the impact strength or the pinhole resistance will be deteriorated and the film characteristics will not be sufficient.
The PBT used as the main constituent component of the base material layer preferably contains 90 mol% or more of terephthalic acid as a dicarboxylic acid component, more preferably 95 mol% or more, and further preferably 98 mol% or more. It is preferably 100 mol%. As the glycol component, 1,4-butanediol is preferably 90 mol% or more, more preferably 95 mol% or more, further preferably 97 mol% or more, and most preferably 1,4-butane at the time of polymerization. This means that it does not contain any byproducts other than those produced by the ether bond of the diol.
本発明に用いる基材層には、延伸時の製膜性や得られたフィルムの力学特性を調整する目的でPBT以外のポリエステル樹脂を含有することができる。
PBT以外のポリエステル樹脂としては、ポリエチレンテレフタレート(以下PETと略す)、ポリエチレンナフタレート、ポリブチレンナフタレート及びポリプロピレンテレフタレート、及びイソフタル酸、オルソフタル酸、ナフタレンジカルボン酸、ビフェニルジカルボン酸、シクロヘキサンジカルボン酸、アジピン酸、アゼライン酸及びセバシン酸からなる群から選ばれる少なくとも1種のジカルボン酸が共重合されたPBT樹脂、エチレングリコール、1,3-プロピレングリコール、1,2-プロピレングリコール、ネオペンチルグリコール、1,5-ペンタンジオール、1,6-ヘキサンジオール、ジエチレングリコール、シクロヘキサンジオール、ポリエチレングリコール、ポリテトラメチレングリコール及びポリカーボネートジオールからなる群から選ばれる少なくとも1種のジオール成分が共重合されたPBT樹脂が挙げられる。
The base material layer used in the present invention may contain a polyester resin other than PBT for the purpose of adjusting the film-forming property during stretching and the mechanical properties of the obtained film.
Polyester resins other than PBT include polyethylene terephthalate (hereinafter abbreviated as PET), polyethylene naphthalate, polybutylene naphthalate and polypropylene terephthalate, and isophthalic acid, orthophthalic acid, naphthalenedicarboxylic acid, biphenyldicarboxylic acid, cyclohexanedicarboxylic acid, adipic acid. , PBT resin copolymerized with at least one dicarboxylic acid selected from the group consisting of azelaic acid and sebacic acid, ethylene glycol, 1,3-propylene glycol, 1,2-propylene glycol, neopentyl glycol, 1,5 -Pentanediol, 1,6-hexanediol, diethylene glycol, cyclohexanediol, polyethylene glycol, polytetramethylene glycol and polycarbonate At least one diol component selected from the group consisting of diol is copolymerized PBT resin.
PBT以外のポリエステル樹脂の添加量の上限は、40質量%以下であり、好ましくは30質量%以下である。PBT以外のポリエステル樹脂の添加量が40質量%を超えると、PBTとしての力学特性が損なわれ、衝撃強度、耐ピンホール性、又は耐破袋性が不十分となるほか、透明性やガスバリア性が低下するなどが起こることがある。 The upper limit of the amount of polyester resin other than PBT added is 40% by mass or less, preferably 30% by mass or less. If the addition amount of the polyester resin other than PBT exceeds 40% by mass, the mechanical properties as PBT will be impaired, and impact strength, pinhole resistance, or bag-breaking resistance will be insufficient, and transparency and gas barrier properties will be insufficient. May decrease.
本発明に用いるPBT樹脂の固有粘度の下限は好ましくは0.9dl/gであり、より好ましくは0.95dl/gであり、更に好ましくは1.0dl/gである。
原料のPBT樹脂の固有粘度が0.9dl/g未満の場合、製膜して得られるフィルムの固有粘度が低下し、突き刺し強度、衝撃強度、耐ピンホール性、又は耐破袋性などが低下するとなることがある。
PBT樹脂の固有粘度の上限は好ましくは1.3dl/gである。上記を越えると延伸時の応力が高くなりすぎ、製膜性が悪化するとなることがある。固有粘度の高いPBTを使用した場合、樹脂の溶融粘度が高くなるため押出し温度を高温にする必要があるが、PBT樹脂をより高温で押出しすると分解物が出やすくなることがある。
The lower limit of the intrinsic viscosity of the PBT resin used in the present invention is preferably 0.9 dl / g, more preferably 0.95 dl / g, and further preferably 1.0 dl / g.
When the intrinsic viscosity of the raw material PBT resin is less than 0.9 dl / g, the intrinsic viscosity of the film obtained by film formation decreases, and the piercing strength, impact strength, pinhole resistance, or bag puncture resistance decreases. Then it may happen.
The upper limit of the intrinsic viscosity of the PBT resin is preferably 1.3 dl / g. If it exceeds the above range, the stress during stretching becomes too high, and the film formability may deteriorate. When PBT having a high intrinsic viscosity is used, the melt viscosity of the resin becomes high, so that it is necessary to raise the extrusion temperature to a high temperature. However, if the PBT resin is extruded at a higher temperature, a decomposed product may be easily generated.
前記PBT樹脂は必要に応じ、従来公知の添加剤、例えば、滑剤、安定剤、着色剤、静電防止剤、紫外線吸収剤等を含有していてもよい。 The PBT resin may contain conventionally known additives such as lubricants, stabilizers, colorants, antistatic agents, and ultraviolet absorbers, if necessary.
前記の滑剤の種類としては、シリカ、炭酸カルシウム、アルミナなどの無機系滑剤のほか、有機系滑剤が好ましく、シリカ、炭酸カルシウムがより好ましく、中でもシリカがヘイズを低減する点で特に好ましい。これらにより透明性と滑り性と発現することができる。 As the type of the above-mentioned lubricant, in addition to inorganic lubricants such as silica, calcium carbonate and alumina, organic lubricants are preferable, silica and calcium carbonate are more preferable, and silica is particularly preferable in view of reducing haze. By these, transparency and slipperiness can be exhibited.
前記滑剤の濃度の下限は好ましくは100ppmであり、より好ましくは500ppmであり、さらに好ましくは800ppmである。上記未満であると基材層フィルムの滑り性が低下することがある。滑剤の濃度の上限は好ましくは20000ppmであり、より好ましくは10000ppmであり、さらに好ましくは1800ppmである。上記を越えると透明性が低下となることがある。 The lower limit of the concentration of the lubricant is preferably 100 ppm, more preferably 500 ppm, further preferably 800 ppm. When it is less than the above range, the slipperiness of the base layer film may decrease. The upper limit of the concentration of the lubricant is preferably 20000 ppm, more preferably 10000 ppm, and further preferably 1800 ppm. If it exceeds the above range, the transparency may decrease.
本発明における基材層フィルムは、フィルム全域に亘って同一組成の樹脂があることが好ましい。
本発明における基材層フィルムの厚みの下限は好ましくは3μmであり、より好ましくは5μmであり、さらに好ましくは8μmである。3μm以上であると基材層フィルムとしての強度が十分となる。
基材層フィルムの厚みの上限は好ましくは100μmであり、より好ましくは75μmであり、さらに好ましくは50μmである。100μm以下であると本発明の目的における加工がより容易となる。
The substrate layer film in the present invention preferably has a resin of the same composition over the entire area of the film.
The lower limit of the thickness of the substrate layer film in the present invention is preferably 3 μm, more preferably 5 μm, and further preferably 8 μm. When the thickness is 3 μm or more, the strength of the base material layer film is sufficient.
The upper limit of the thickness of the base layer film is preferably 100 μm, more preferably 75 μm, and further preferably 50 μm. When it is 100 μm or less, the processing for the purpose of the present invention becomes easier.
次に、本発明に用いる基材層フィルムの製造方法を具体的に説明する。これらに限定されるものではない。
[基材層フィルム製造における未延伸シート成形工程]
まず、フィルム原料を真空乾燥あるいは熱風乾燥する。次いで、原料を計量、混合して押出機に供給し、加熱溶融して、シート状に溶融キャスティングを行う。
さらに、溶融状態の樹脂シートを、静電印加法を用いて冷却ロール(キャスティングロール)に密着させて冷却固化し、未延伸シートを得る。静電印加法とは、溶融状態の樹脂シートが回転金属ロールに接触する付近で、樹脂シートの回転金属ロールに接触した面の反対の面の近傍に設置した電極に電圧を印加することによって、樹脂シートを帯電させ、樹脂シートと回転冷却ロールを密着させる方法である。
Next, the method for producing the base layer film used in the present invention will be specifically described. It is not limited to these.
[Unstretched sheet forming step in base layer film production]
First, the film raw material is vacuum dried or hot air dried. Next, the raw materials are weighed and mixed, supplied to an extruder, heated and melted, and melt cast into a sheet.
Further, the molten resin sheet is brought into close contact with a cooling roll (casting roll) by an electrostatic application method to be cooled and solidified to obtain an unstretched sheet. The electrostatic application method, in the vicinity of the resin sheet in a molten state is in contact with the rotating metal roll, by applying a voltage to the electrode installed in the vicinity of the opposite surface of the surface of the resin sheet in contact with the rotating metal roll, In this method, the resin sheet is charged and the resin sheet and the rotating cooling roll are brought into close contact with each other.
樹脂の加熱溶融温度の下限は好ましくは200℃であり、より好ましくは250℃であり、さらに好ましくは260℃である。上記未満であると吐出が不安定となることがある。樹脂溶融温度の上限は好ましくは280℃であり、より好ましくは270℃である。上記を越えると樹脂の分解が進行し、フィルムが脆くなってしまう。 The lower limit of the heating and melting temperature of the resin is preferably 200 ° C, more preferably 250 ° C, and further preferably 260 ° C. If it is less than the above, ejection may be unstable. The upper limit of the resin melting temperature is preferably 280 ° C, more preferably 270 ° C. When it exceeds the above range, the decomposition of the resin proceeds and the film becomes brittle.
溶融したポリエステル樹脂を押出し冷却ロール上にキャスティングする時に、未延伸シートの幅方向の結晶化度の差を小さくすることが好ましい。このための具体的な方法としては、溶融したポリエステル樹脂を押出しキャスティングする時に溶融した原料樹脂を多層化してキャスティングすることと冷却ロール温度を低温とすることが挙げられる。 When casting a molten polyester resin on an extrusion cooling roll, it is preferable to reduce the difference in crystallinity in the width direction of the unstretched sheet. As a specific method for this, when the molten polyester resin is extruded and cast, the molten raw material resin is multilayered and cast, and the cooling roll temperature is set to a low temperature.
溶融した原料樹脂を多層化する方法は特に限定されないが、設備の簡便さや保守性の面から、スタティックミキサー及び/又は多層フィードブロックが好ましい。
溶融した原料樹脂を多層化は、積層数が60以上であることが好ましい。より好ましくは500である。積層数が少なすぎると層界面間距離が長くなって結晶サイズが大きくなりすぎ、幅方向の結晶化度の差やシート両端近傍での結晶化度が増大し、製膜が不安定となる。積層数の上限は特に限定されないが、好ましくは100000であり、より好ましくは10000であり、さらに好ましくは7000である。理論積層数を極端に大きくしてもその効果が飽和する場合がある。
The method for forming the molten raw material resin into multiple layers is not particularly limited, but a static mixer and / or a multi-layer feed block is preferable from the viewpoint of facility simplicity and maintainability.
When the molten raw material resin is formed into multiple layers, the number of layers is preferably 60 or more. It is more preferably 500. If the number of laminated layers is too small, the distance between layer interfaces becomes long and the crystal size becomes too large, the difference in crystallinity in the width direction and the crystallinity near both ends of the sheet increase, and the film formation becomes unstable. The upper limit of the number of layers is not particularly limited, but it is preferably 100,000, more preferably 10,000, and further preferably 7,000. Even if the theoretical number of layers is extremely increased, the effect may be saturated.
多層化をスタティックミキサーで行う場合、スタティックミキサーのエレメント数を選択することにより、理論積層数を調整することができる。スタティックミキサーは、一般的には駆動部のない静止型混合器(ラインミキサー)として知られており、ミキサー内に入った流体は、エレメントにより順次撹拌混合される。ところが、高粘度流体をスタティックミキサーに通過させると、高粘度流体の分割と積層が生じ、積層流体が形成される。スタティックミキサーの1エレメントを通過するごとに、高粘度流体は2分割され次いで合流し積層される。このため、高粘度流体をエレメント数nのスタティックミキサーに通過させると、理論積層数N=(2のn乗)の積層流体が形成される。 When performing multi-layering with a static mixer, the theoretical number of layers can be adjusted by selecting the number of elements in the static mixer. The static mixer is generally known as a static mixer (line mixer) having no driving unit, and the fluid that has entered the mixer is sequentially stirred and mixed by the elements. However, when the high-viscosity fluid is passed through the static mixer, the high-viscosity fluid is divided and laminated, and a laminated fluid is formed. Each time one element of the static mixer is passed, the high-viscosity fluid is divided into two and then merged and laminated. Therefore, when the high-viscosity fluid is passed through the static mixer having the number of elements n, the laminated fluid having the theoretical number of layers N = (2 to the n-th power) is formed.
溶融したポリエステル樹脂を押出し冷却ロール上にキャスティングする時の冷却ロール温度の上限は好ましくは40℃である。上記を越えると結晶化度が高くなりすぎて延伸が困難となることがある。冷却ロール温度の上限は好ましくは25℃である。また冷却ロールの温度を上記の範囲とする場合、結露防止のため冷却ロール付近の環境の湿度を下げておくことが好ましい。冷却ロール表面の幅方向の温度差は少なくすることが好ましい。冷却ロール温度の下限は好ましくは-10℃である。上記未満であると結晶化抑制の効果が飽和することがある。未延伸シートの厚みは15~2500μmの範囲が好適である。 The upper limit of the cooling roll temperature when the molten polyester resin is cast on the extrusion cooling roll is preferably 40 ° C. If it exceeds the above range, the crystallinity becomes too high, and stretching may be difficult. The upper limit of the cooling roll temperature is preferably 25 ° C. When the temperature of the cooling roll is set within the above range, it is preferable to reduce the humidity of the environment near the cooling roll in order to prevent dew condensation. It is preferable to reduce the temperature difference in the width direction of the cooling roll surface. The lower limit of the cooling roll temperature is preferably -10 ° C. If it is less than the above, the effect of suppressing crystallization may be saturated. The thickness of the unstretched sheet is preferably in the range of 15 to 2500 μm.
[基材層フィルム製造における縦延伸工程及び横延伸工程]
次に延伸方法について説明する。延伸方法は、同時二軸延伸でも逐次二軸延伸でも可能であるが、突き刺し強度を高めるためには、面配向度を高めておく必要があるほか、製膜速度が速く生産性が高いという点においては逐次二軸延伸が最も好ましい。
[Vertical Stretching Step and Horizontal Stretching Step in Manufacturing Base Layer Film]
Next, the stretching method will be described. The stretching method can be simultaneous biaxial stretching or sequential biaxial stretching, but in order to increase the puncture strength, it is necessary to increase the degree of plane orientation, and in addition, the film forming speed is high and the productivity is high. In the above, sequential biaxial stretching is the most preferable.
縦延伸方向の延伸温度の下限は好ましくは55℃であり、より好ましくは60℃である。55℃以上であると破断が起こりにくい。また、フィルムの縦配向度が強くなり過ぎないため、熱固定処理の際の収縮応力を抑えられ、幅方向の分子配向の歪みの少ないフィルムが得られる。縦延伸方向の延伸温度の上限は、好ましくは100℃であり、より好ましくは95℃である。100℃以下であるとフィルムの配向が弱くなり過ぎないためフィルムの力学特性が低下しない。 The lower limit of the stretching temperature in the longitudinal stretching direction is preferably 55 ° C, more preferably 60 ° C. If the temperature is 55 ° C. or higher, breakage hardly occurs. Further, since the degree of longitudinal orientation of the film does not become too strong, shrinkage stress at the time of heat setting treatment can be suppressed, and a film with little distortion of molecular orientation in the width direction can be obtained. The upper limit of the stretching temperature in the longitudinal stretching direction is preferably 100 ° C, more preferably 95 ° C. When the temperature is 100 ° C. or lower, the orientation of the film does not become too weak and the mechanical properties of the film do not deteriorate.
縦延伸方向の延伸倍率の下限は好ましくは2.8倍であり、特に好ましくは3.0倍である。2.8倍以上であると面配向度が大きくなり、フィルムの突き刺し強度が向上するほか、フィルムの厚み精度が向上する。
縦延伸方向の延伸倍率の上限は好ましくは4.3倍であり、より好ましくは4.0倍であり、特に好ましくは3.8倍である。4.3倍以下であると、フィルムの横方向の配向度が強くなり過ぎず、熱固定処理の際の収縮応力が大きくなり過ぎず、フィルムの横方向の分子配向の歪みが小さくなり、結果として縦方向の直進引裂き性が向上する。また、力学強度や厚みムラの改善の効果はこの範囲では飽和する。
The lower limit of the stretching ratio in the longitudinal stretching direction is preferably 2.8 times, particularly preferably 3.0 times. When it is 2.8 times or more, the plane orientation degree becomes large, the piercing strength of the film is improved, and the thickness accuracy of the film is improved.
The upper limit of the stretching ratio in the longitudinal stretching direction is preferably 4.3 times, more preferably 4.0 times, and particularly preferably 3.8 times. When it is 4.3 times or less, the degree of orientation in the lateral direction of the film does not become too strong, the shrinkage stress at the time of heat setting treatment does not become too large, and the distortion of the molecular orientation in the lateral direction of the film becomes small. As a result, the straight-line tearability in the vertical direction is improved. In addition, the effect of improving mechanical strength and thickness unevenness is saturated in this range.
横延伸方向の延伸温度の下限は好ましくは60℃であり、60度以上であると破断が起こりにくくなることがある。横延伸方向の延伸温度の上限は好ましくは100℃であり、100℃以下であると横方向の配向度が大きくなるため力学特性が向上する。 The lower limit of the stretching temperature in the transverse stretching direction is preferably 60 ° C, and if it is 60 ° C or more, breakage may be difficult to occur. The upper limit of the stretching temperature in the transverse stretching direction is preferably 100 ° C., and when it is 100 ° C. or less, the degree of orientation in the transverse direction becomes large and the mechanical properties are improved.
横延伸方向の延伸倍率の下限は好ましくは3.5倍であり、より好ましくは3.6倍であり、特に好ましくは3.7倍である。3.5倍以上であると横方向の配向度が弱くなり過ぎず、力学特性や厚みムラが向上する。横延伸方向の延伸倍率の上限は好ましくは5倍であり、より好ましくは4.5倍であり、特に好ましくは4.0倍である。5.0倍以下であると力学強度や厚みムラ改善の効果はこの範囲でも最大となる(飽和する)。 The lower limit of the stretching ratio in the transverse stretching direction is preferably 3.5 times, more preferably 3.6 times, and particularly preferably 3.7 times. If it is 3.5 times or more, the degree of orientation in the lateral direction does not become too weak, and the mechanical characteristics and thickness unevenness are improved. The upper limit of the stretching ratio in the transverse stretching direction is preferably 5 times, more preferably 4.5 times, and particularly preferably 4.0 times. When it is 5.0 times or less, the effect of improving mechanical strength and thickness unevenness becomes maximum (saturated) even in this range.
[基材層フィルム製造における熱固定工程]
熱固定工程での熱固定温度の下限は好ましくは195℃であり、より好ましくは200℃である。195℃以上であるとフィルムの熱収縮率を小さくなり、レトルト処理後においても、無機薄膜層がダメージを受けにくいため、ガスバリア性が向上する。熱固定温度の上限は好ましくは220℃であり、220度以下であると基材フィルム層が融けることがなく、脆くなり難い。
[Heat-setting step in base layer film production]
The lower limit of the heat setting temperature in the heat setting step is preferably 195 ° C, more preferably 200 ° C. When the temperature is 195 ° C. or higher, the heat shrinkage rate of the film becomes small and the inorganic thin film layer is less likely to be damaged even after the retort treatment, so that the gas barrier property is improved. The upper limit of the heat setting temperature is preferably 220 ° C., and when it is 220 ° C. or less, the base film layer does not melt and becomes hard to be brittle.
[基材層フィルム製造における熱緩和工程]
熱固定工程の後に熱寸法安定性を良くする目的などで、熱緩和処理を行う。
熱緩和工程での温度の下限は好ましくは好ましくは180℃であり、より好ましくは200℃である。180℃以上であるとフィルムの熱収縮率を小さくなり、レトルト処理後においても、無機薄膜層がダメージを受けにくいため、ガスバリア性が向上する。熱緩和工程の温度の上限は好ましくは220℃であり、220度以下であると基材フィルム層が融けることがなく、脆くなり難い。
熱緩和工程でのリラックス率の下限は好ましくは0.5%である。0.5%以上であると熱固定時に破断が起こりにくくなることがある。リラックス率の上限は好ましくは10%である。10%以下であると熱固定時の縦方向への収縮が小さくなる結果、フィルム端部の分子配向の歪みが小さくなり、直進引裂き性が向上する。また、フィルムのたるみなどが生じにくく、厚みムラが発生しにくい。
[Thermal relaxation process in base layer film production]
After the heat setting step, heat relaxation treatment is performed for the purpose of improving thermal dimensional stability.
The lower limit of the temperature in the thermal relaxation step is preferably 180 ° C, more preferably 200 ° C. When the temperature is 180 ° C. or higher, the heat shrinkage rate of the film becomes small, and the inorganic thin film layer is less likely to be damaged even after the retort treatment, so that the gas barrier property is improved. The upper limit of the temperature of the heat relaxation step is preferably 220 ° C., and when it is 220 ° C. or less, the base film layer does not melt and becomes hard to be brittle.
The lower limit of the relaxation rate in the heat relaxation step is preferably 0.5%. If it is 0.5% or more, fracture may be less likely to occur during heat setting. The upper limit of the relaxation rate is preferably 10%. When it is 10% or less, the shrinkage in the longitudinal direction during heat setting becomes small, and as a result, the distortion of the molecular orientation at the end of the film becomes small and the straight-line tearability is improved. In addition, sagging of the film is less likely to occur, and uneven thickness is less likely to occur.
[基材層フィルム製造における冷却工程]
熱緩和部工程でのリラックスを行った後の冷却工程において、ポリエステルフィルムの端部の表面の温度を80℃以下とすることが好ましい。
冷却工程通過後のフィルム端部の温度が80℃を超えていると、フィルムを巻き取る際にかかる張力により端部が引き伸ばされ、結果的に端部の縦方向の熱収縮率が高くなってしまうため、ロールの幅方向の熱収縮率分布が不均一となり、このようなロールを加熱搬送して蒸着加工などを行う際に、筋状のシワが発生してしまい、最終的に得られるガスバリアフィルムの物性が幅方向で不均一となってしまうことがある。
[Cooling process in base layer film production]
In the cooling step after performing the relaxation in the thermal relaxation section step, the temperature of the surface of the end portion of the polyester film is preferably 80 ° C. or lower.
If the temperature of the end portion of the film after passing through the cooling step exceeds 80 ° C., the end portion is stretched by the tension applied when the film is wound, and as a result, the heat shrinkage ratio in the longitudinal direction of the end portion becomes high. As a result, the heat shrinkage distribution in the width direction of the roll becomes uneven, and when such a roll is heated and transported to perform vapor deposition processing, streak-like wrinkles occur and the gas barrier finally obtained. The physical properties of the film may become uneven in the width direction.
前記冷却工程において、フィルム端部の表面温度を80℃以下とする方法としては、冷却工程の温度や風量を調整するほか、冷却ゾーンの幅方向における中央側に遮蔽板を設けて端部を選択的に冷却する方法や、フィルムの端部に対し局所的に冷風を吹き付けるといった方法を用いることができる。 In the cooling step, as a method for controlling the surface temperature of the film end portion to 80 ° C. or less, the temperature and air flow rate in the cooling step are adjusted, and a shield plate is provided on the center side in the width direction of the cooling zone to select the end portion. It is possible to use a method of cooling the film or a method of locally blowing cold air to the end portion of the film.
本発明における基材層フィルムのMD方向の配向度(ΔNx)の下限は、好ましくは0.04であり、より好ましくは0.045であり、さらに好ましくは0.05である。上記未満であると配向が弱いため、基材層フィルムとして十分な衝撃強度が得られず、耐破袋性が低下する。また、基材層フィルム上に無機薄膜層と保護層を設けて積層フィルムとした場合に、保護膜の形成時にかかる張力と温度によって伸び易くなり、無機薄膜層が割れてしまうために、ガスバリア性が低下することがある。 The lower limit of the degree of orientation (ΔNx) in the MD direction of the substrate layer film in the present invention is preferably 0.04, more preferably 0.045, and further preferably 0.05. If it is less than the above range, the orientation is weak, so that sufficient impact strength as a substrate layer film cannot be obtained, and the bag breaking resistance is deteriorated. Further, when the inorganic thin film layer and the protective layer are provided on the substrate layer film to form a laminated film, the tensile strength and temperature applied during the formation of the protective film facilitates elongation, and the inorganic thin film layer is cracked. May decrease.
本発明における基材層フィルムのMD方向の配向度(ΔNx)の上限は、好ましくは0.09であり、より好ましくは0.085であり、さらに好ましくは0.08である。上記範囲内であると基材層フィルムの力学特性、直進引裂き性がより好ましいものとなる。
なお、MD方向の配向度(ΔNx)は、アッベ屈折計でMD方向の屈折率Nx、TD方向の屈折率Ny、厚み方向の屈折率Nzを測定し、ΔNx=Nx-(Ny+Nz)/2 の式で計算される。
The upper limit of the degree of orientation (ΔNx) in the MD direction of the substrate film in the present invention is preferably 0.09, more preferably 0.085, and further preferably 0.08. Within the above range, the mechanical properties and linear tearability of the base layer film will be more preferable.
The degree of orientation (ΔNx) in the MD direction is ΔNx = Nx− (Ny + Nz) / 2 by measuring the refractive index Nx in the MD direction, the refractive index Ny in the TD direction, and the refractive index Nz in the thickness direction with an Abbe refractometer. Calculated by the formula.
本発明における基材層フィルムの厚みあたりのヘイズの上限は好ましくは0.66%/μmであり、より好ましくは0.60%/μmであり、更に好ましくは0.53%/μmである。0.66%/μm以下である基材フィルムに印刷を施した際に、印刷された文字や画像の品位が向上する。 The upper limit of the haze per thickness of the substrate layer film in the present invention is preferably 0.66% / μm, more preferably 0.60% / μm, and further preferably 0.53% / μm. When printing is performed on a substrate film having a density of 0.66% / μm or less, the quality of printed characters and images is improved.
また、本発明における基材層フィルムには、本発明の目的を損なわない限りにおいて、コロナ放電処理、グロー放電処理、火炎処理、表面粗面化処理が施されてもよく、また、公知のアンカーコート処理、印刷、装飾などが施されてもよい。 Further, the base layer film in the present invention may be subjected to corona discharge treatment, glow discharge treatment, flame treatment, surface roughening treatment, as long as the object of the present invention is not impaired, and a known anchor. It may be coated, printed, decorated, or the like.
[易接着層及びその形成方法]
本発明の積層フィルムに用いる基材層フィルム上には易接着層を設けることができる。特に基材層フィルムに無機薄膜層を形成する場合には、レトルト処理後のガスバリア性やラミネート強度を確保するために基材層フィルムと無機薄膜層との間に易接着層を設けることが好ましい。
基材層フィルム上に設ける易接着層としては、ウレタン系、ポリエステル系、アクリル系、チタン系、イソシアネート系、イミン系、ポリブタジエン系等の樹脂に、エポキシ系、イソシアネート系、メラミン系等の硬化剤を添加したものが挙げられる。前記溶剤としては、例えば、ベンゼン、トルエン等の芳香族系溶剤;メタノール、エタノール等のアルコール系溶剤;アセトン、メチルエチルケトン等のケトン系溶剤;酢酸エチル、酢酸ブチル等のエステル系溶剤;エチレングリコールモノメチルエーテル等の多価アルコール誘導体等が挙げられる。これらの密着層に用いる樹脂組成物は、有機官能基を少なくとも1種類以上有するシランカップリング剤を含有することが好ましい。前記有機官能基としては、アルコキシ基、アミノ基、エポキシ基、イソシアネート基等が挙げられる。前記シランカップリング剤の添加によって、レトルト処理後のラミネート強度がより向上する。
[Easy adhesion layer and method for forming the same]
An easy-adhesion layer can be provided on the base layer film used for the laminated film of the present invention. Particularly when an inorganic thin film layer is formed on the base material layer film, it is preferable to provide an easy adhesion layer between the base material layer film and the inorganic thin film layer in order to secure gas barrier properties and laminate strength after retort treatment. .
As the easy-adhesion layer provided on the substrate layer film, urethane-based, polyester-based, acrylic-based, titanium-based, isocyanate-based, imine-based, polybutadiene-based resins, etc., epoxy-based, isocyanate-based, melamine-based curing agents, etc. The thing which added is mentioned. Examples of the solvent include aromatic solvents such as benzene and toluene; alcohol solvents such as methanol and ethanol; ketone solvents such as acetone and methyl ethyl ketone; ester solvents such as ethyl acetate and butyl acetate; ethylene glycol monomethyl ether. And other polyhydric alcohol derivatives. The resin composition used for these adhesion layers preferably contains a silane coupling agent having at least one organic functional group. Examples of the organic functional group include an alkoxy group, an amino group, an epoxy group and an isocyanate group. The addition of the silane coupling agent further improves the laminate strength after the retort treatment.
前記易接着層に用いる樹脂組成物の中でも、オキサゾリン基を含有する樹脂とアクリル系樹脂及びウレタン系樹脂の混合物を用いることが好ましい。オキサゾリン基は無機薄膜との親和性が高く、また無機薄膜層形成時に発生する無機酸化物の酸素欠損部分や金属水酸化物とが反応することができ、無機薄膜層と強固な密着性を示す。また易接着層中に存在する未反応のオキサゾリン基は、基材層フィルム及び易接着層の加水分解により発生したカルボン酸末端と反応し、架橋を形成することができる。 Among the resin compositions used for the easy-adhesion layer, it is preferable to use a mixture of a resin containing an oxazoline group, an acrylic resin and a urethane resin. The oxazoline group has a high affinity with the inorganic thin film, and can react with the oxygen deficiency part of the inorganic oxide generated during the formation of the inorganic thin film layer and the metal hydroxide, and exhibits a strong adhesiveness with the inorganic thin film layer. . The unreacted oxazoline group present in the easy-adhesion layer can react with the carboxylic acid terminal generated by the hydrolysis of the base layer film and the easy-adhesion layer to form a crosslink.
前記易接着層を形成する方法としては、例えばコート法など従来公知の方法を採用することができる。コート法の中でも好適な方法としては、オフラインコート法、インラインコート法を挙げることができる。例えば基材層フィルムを製造する工程で行うインラインコート法の場合、コート時の乾燥や熱処理の条件は、コート厚みや装置の条件にもよるが、コート後直ちに直角方向の延伸工程に送入し延伸工程の予熱ゾーンあるいは延伸ゾーンで乾燥させることが好ましく、そのような場合には通常50~250℃程度の温度とすることが好ましい。 As a method of forming the easily adhesive layer, a conventionally known method such as a coating method can be adopted. Among the coating methods, the offline coating method and the in-line coating method can be mentioned as suitable methods. For example, in the case of the in-line coating method performed in the process of manufacturing the base material layer film, the conditions of drying and heat treatment during coating depend on the coat thickness and the conditions of the apparatus, but immediately after coating, the film is sent to the stretching process in the perpendicular direction. Drying is preferably carried out in the preheating zone or the stretching zone of the stretching step, and in such a case, it is preferable that the temperature is usually about 50 to 250 ° C.
[無機薄膜層及びその形成方法]
本発明の積層フィルムの基材層上にガスバリア層を設けることができる。無機薄膜層及びその形成方法を説明する。
無機薄膜層は金属または無機酸化物からなる薄膜である。無機薄膜層を形成する材料は、薄膜にできるものなら特に制限はないが、ガスバリア性の観点から、酸化ケイ素(シリカ)、酸化アルミニウム(アルミナ)、酸化ケイ素と酸化アルミニウムとの混合物等の無機酸化物が好ましく挙げられる。特に、薄膜層の柔軟性と緻密性を両立できる点からは、酸化ケイ素と酸化アルミニウムとの複合酸化物が好ましい。この複合酸化物において、酸化ケイ素と酸化アルミニウムとの混合比は、金属分の質量比でAlが20~70質量%の範囲であることが好ましい。Al濃度が20質量%未満であると、水蒸気バリア性が低くなる場合がある。一方、70質量%を超えると、無機薄膜層が硬くなる傾向があり、印刷やラミネートといった二次加工の際に膜が破壊されてガスバリア性が低下することがある。なお、ここでいう酸化ケイ素とはSiOやSiO2等の各種珪素酸化物又はそれらの混合物であり、酸化アルミニウムとは、AlOやAl2O3等の各種アルミニウム酸化物又はそれらの混合物である。
[Inorganic thin film layer and method for forming the same]
A gas barrier layer can be provided on the base material layer of the laminated film of the present invention. The inorganic thin film layer and its forming method will be described.
The inorganic thin film layer is a thin film made of metal or inorganic oxide. The material forming the inorganic thin film layer is not particularly limited as long as it can be formed into a thin film, but from the viewpoint of gas barrier properties, inorganic oxides such as silicon oxide (silica), aluminum oxide (alumina), and a mixture of silicon oxide and aluminum oxide. The thing is preferably mentioned. In particular, a composite oxide of silicon oxide and aluminum oxide is preferable from the viewpoint of achieving both flexibility and denseness of the thin film layer. In this composite oxide, the mixing ratio of silicon oxide and aluminum oxide is preferably in the range of 20 to 70% by mass of Al in terms of the mass ratio of metal components. If the Al concentration is less than 20% by mass, the water vapor barrier property may decrease. On the other hand, if it exceeds 70% by mass, the inorganic thin film layer tends to become hard, and the film may be destroyed during secondary processing such as printing or laminating, and the gas barrier property may deteriorate. The silicon oxide mentioned here is various silicon oxides such as SiO and SiO 2 or a mixture thereof, and the aluminum oxide is various aluminum oxides such as AlO and Al 2 O 3 or a mixture thereof.
無機薄膜層の膜厚は、通常1~100nm、好ましくは5~50nmである。無機薄膜層の膜厚が1nm未満であると、満足のいくガスバリア性が得られ難くなる場合があり、一方、100nmを超えて過度に厚くしても、それに相当するガスバリア性の向上効果は得られず、耐屈曲性や製造コストの点でかえって不利となる。 The thickness of the inorganic thin film layer is usually 1 to 100 nm, preferably 5 to 50 nm. When the film thickness of the inorganic thin film layer is less than 1 nm, it may be difficult to obtain a satisfactory gas barrier property. On the other hand, even if the inorganic thin film layer exceeds 100 nm and is excessively thick, a corresponding gas barrier property improving effect is obtained. Therefore, it is rather disadvantageous in terms of bending resistance and manufacturing cost.
無機薄膜層を形成する方法としては、特に制限はなく、例えば真空蒸着法、スパッタリング法、イオンプレーティング法等の物理蒸着法(PVD法)、あるいは化学蒸着法(CVD法)等、公知の蒸着法を適宜採用すればよい。以下、無機薄膜層を形成する典型的な方法を、酸化ケイ素・酸化アルミニウム系薄膜を例に説明する。例えば、真空蒸着法を採用する場合は、蒸着原料としてSiO2とAl2O3の混合物、あるいはSiO2とAlの混合物等が好ましく用いられる。これら蒸着原料としては通常粒子が用いられるが、その際、各粒子の大きさは蒸着時の圧力が変化しない程度の大きさであることが望ましく、好ましい粒子径は1mm~5mmである。加熱には、抵抗加熱、高周波誘導加熱、電子ビーム加熱、レーザー加熱などの方式を採用することができる。また、反応ガスとして酸素、窒素、水素、アルゴン、炭酸ガス、水蒸気等を導入したり、オゾン添加、イオンアシスト等の手段を用いた反応性蒸着を採用することも可能である。さらに、被蒸着体(蒸着に供する積層フィルム)にバイアスを印加したり、被蒸着体を加熱もしくは冷却するなど、成膜条件も任意に変更することができる。このような蒸着材料、反応ガス、被蒸着体のバイアス、加熱・冷却等は、スパッタリング法やCVD法を採用する場合にも同様に変更可能である。 The method for forming the inorganic thin film layer is not particularly limited, and known vapor deposition methods such as vacuum vapor deposition method, sputtering method, physical vapor deposition method (PVD method) such as ion plating method, or chemical vapor deposition method (CVD method) are known. The method may be adopted as appropriate. Hereinafter, a typical method of forming an inorganic thin film layer will be described by taking a silicon oxide / aluminum oxide thin film as an example. For example, when the vacuum vapor deposition method is adopted, a mixture of SiO 2 and Al 2 O 3, a mixture of SiO 2 and Al, or the like is preferably used as a vapor deposition material. Particles are usually used as these vapor deposition raw materials. At this time, the size of each particle is preferably such that the pressure during vapor deposition does not change, and the preferable particle diameter is 1 mm to 5 mm. For heating, methods such as resistance heating, high frequency induction heating, electron beam heating, and laser heating can be adopted. It is also possible to introduce oxygen, nitrogen, hydrogen, argon, carbon dioxide gas, water vapor or the like as a reaction gas, or to adopt reactive vapor deposition using means such as ozone addition or ion assist. Furthermore, film forming conditions can be arbitrarily changed, such as applying a bias to the object to be vapor-deposited (laminated film to be subjected to vapor deposition), heating or cooling the object to be vapor-deposited. The vapor deposition material, the reaction gas, the bias of the object to be vapor-deposited, the heating / cooling and the like can be similarly changed when the sputtering method or the CVD method is adopted.
[保護層及びその形成方法]
本発明の積層フィルムの基材層フィルム上にガスバリア層を設ける場合に、更にその上に保護層を設けることができる。保護層及びその形成方法を説明する。
ガスバリア層が金属酸化物層などの無機薄膜層の場合、無機薄膜が完全に密な膜ではなく、微小な欠損部分が点在している。無機薄膜層上に後述する特定の保護層用樹脂組成物を塗工して保護層を形成することにより、無機薄膜層の欠損部分に保護層用樹脂組成物中の樹脂が浸透し、結果としてガスバリア性が安定するという効果が得られる。加えて、保護層そのものもガスバリア性を持つ材料を使用することで、積層フィルムのガスバリア性能を大きく向上できる。
[Protective layer and method for forming the same]
When the gas barrier layer is provided on the base layer film of the laminated film of the present invention, a protective layer can be further provided thereon. The protective layer and the method for forming the protective layer will be described.
When the gas barrier layer is an inorganic thin film layer such as a metal oxide layer, the inorganic thin film is not a completely dense film, and minute defects are scattered. By forming a protective layer by coating a specific protective layer resin composition described below on the inorganic thin film layer, the resin in the protective layer resin composition penetrates into the defective portion of the inorganic thin film layer, resulting in The effect of stabilizing the gas barrier property is obtained. In addition, by using a material having a gas barrier property for the protective layer itself, the gas barrier performance of the laminated film can be greatly improved.
前記保護層としては、ウレタン系樹脂、ポリエステル系樹脂、アクリル系樹脂、チタンネート系樹脂、イソシアネート系樹脂、イミン系樹脂、ポリブタジエン系樹脂等の樹脂に、エポキシ系硬化剤、イソシアネート系硬化剤、メラミン系硬化剤等の硬化剤を添加したものが挙げられる。前記樹脂の溶剤としては、例えば、ベンゼン、トルエン等の芳香族系溶剤、メタノール、エタノール等のアルコール系溶剤、アセトン、メチルエチルケトン等のケトン系溶剤、酢酸エチル、酢酸ブチル等のエステル系溶剤、エチレングリコールモノメチルエーテル等の多価アルコール誘導体系の溶剤等が挙げられる。
ウレタン樹脂はウレタン結合の極性基が無機薄膜層と相互作用するとともに、非晶部分の存在により柔軟性をも有するため、屈曲負荷がかかった際にも無機薄膜層へのダメージを抑えることができるため好ましい。
Examples of the protective layer include urethane-based resins, polyester-based resins, acrylic-based resins, titanate-based resins, isocyanate-based resins, imine-based resins, polybutadiene-based resins, epoxy-based curing agents, isocyanate-based curing agents, and melamine. Examples include those to which a curing agent such as a system curing agent is added. Examples of the solvent for the resin include aromatic solvents such as benzene and toluene, alcohol solvents such as methanol and ethanol, ketone solvents such as acetone and methyl ethyl ketone, ester solvents such as ethyl acetate and butyl acetate, and ethylene glycol. Examples thereof include polyhydric alcohol derivative-based solvents such as monomethyl ether.
The urethane resin has a polar group of urethane bond interacting with the inorganic thin film layer and also has flexibility due to the presence of the amorphous portion, so that it is possible to suppress damage to the inorganic thin film layer even when a bending load is applied. Therefore, it is preferable.
ウレタン樹脂の酸価は10~60mgKOH/gの範囲内であるのが好ましい。より好ましくは15~55mgKOH/gの範囲内、さらに好ましくは20~50mgKOH/gの範囲内である。ウレタン樹脂の酸価が前記範囲であると、水分散液とした際に液安定性が向上し、また保護層は高極性の無機薄膜上に均一に堆積することができるため、コート外観が良好となる。
ウレタン樹脂は、ガラス転移温度(Tg)が80℃以上であることが好ましく、より好ましくは90℃以上である。Tgを80℃以上にすることで、湿熱処理過程(昇温~保温~降温)における分子運動による保護層の膨潤を低減できる。
The acid value of the urethane resin is preferably in the range of 10 to 60 mgKOH / g. It is more preferably within the range of 15 to 55 mgKOH / g, and even more preferably within the range of 20 to 50 mgKOH / g. When the acid value of the urethane resin is within the above range, the liquid stability is improved when it is made into an aqueous dispersion, and the protective layer can be uniformly deposited on the highly polar inorganic thin film, resulting in a good coat appearance. Becomes
The urethane resin has a glass transition temperature (Tg) of preferably 80 ° C. or higher, more preferably 90 ° C. or higher. By setting Tg to 80 ° C. or higher, it is possible to reduce swelling of the protective layer due to molecular motion in the wet heat treatment process (temperature increase-heat retention-temperature decrease).
ウレタン樹脂は、ガスバリア性向上の面から、芳香族ジイソシアネートまたは芳香脂肪族ジイソシアネートを主な構成成分として含有するウレタン樹脂を用いることがより好ましい。
その中でも、メタキシリレンジイソシアネート成分を含有することが特に好ましい。上記樹脂を用いることで、芳香環同士のスタッキング効果によりウレタン結合の凝集力を一層高めることができ、結果として良好なガスバリア性が得られる。
As the urethane resin, it is more preferable to use a urethane resin containing an aromatic diisocyanate or an araliphatic diisocyanate as a main constituent from the viewpoint of improving gas barrier properties.
Among them, it is particularly preferable to contain the metaxylylene diisocyanate component. By using the above resin, the cohesive force of the urethane bond can be further increased by the stacking effect of aromatic rings, and as a result, good gas barrier properties can be obtained.
本発明においては、ウレタン樹脂中の芳香族ジイソシアネートまたは芳香脂肪族ジイソシアネートの割合を、ポリイソシアネート成分100モル%中、50~100モル%の範囲とすることが好ましい。芳香族ジイソシアネートまたは芳香脂肪族ジイソシアネートの合計量の割合は、60~100モル%が好ましく、より好ましくは70~100モル%、さらに好ましくは80~100モル%である。このような樹脂として、三井化学株式会社から市販されている「タケラック(登録商標)WPB」シリーズは好適に用いることができる。芳香族ジイソシアネートまたは芳香脂肪族ジイソシアネートの合計量の割合が50モル%未満であると、良好なガスバリア性が得られない可能性がある。 In the present invention, the proportion of aromatic diisocyanate or araliphatic diisocyanate in the urethane resin is preferably in the range of 50 to 100 mol% in 100 mol% of the polyisocyanate component. The ratio of the total amount of aromatic diisocyanate or araliphatic diisocyanate is preferably 60 to 100 mol%, more preferably 70 to 100 mol%, and further preferably 80 to 100 mol%. As such a resin, "Takelac (registered trademark) WPB" series commercially available from Mitsui Chemicals, Inc. can be preferably used. When the ratio of the total amount of the aromatic diisocyanate or the araliphatic diisocyanate is less than 50 mol%, good gas barrier properties may not be obtained.
前記ウレタン樹脂は、無機薄膜層との親和性向上の観点から、カルボン酸基(カルボキシル基)を有することが好ましい。ウレタン樹脂にカルボン酸(塩)基を導入するためには、例えば、ポリオール成分として、ジメチロールプロピオン酸、ジメチロールブタン酸等のカルボン酸基を有するポリオール化合物を共重合成分として導入すればよい。また、カルボン酸基含有ウレタン樹脂を合成後、塩形成剤により中和すれば、水分散体のウレタン樹脂を得ることができる。塩形成剤の具体例としては、アンモニア、トリメチルアミン、トリエチルアミン、トリイソプロピルアミン、トリ-n-プロピルアミン、トリ-n-ブチルアミン等のトリアルキルアミン類、N-メチルモルホリン、N-エチルモルホリン等のN-アルキルモルホリン類、N-ジメチルエタノールアミン、N-ジエチルエタノールアミン等のN-ジアルキルアルカノールアミン類等が挙げられる。これらは単独で使用してもよいし、2種以上を併用してもよい。 The urethane resin preferably has a carboxylic acid group (carboxyl group) from the viewpoint of improving the affinity with the inorganic thin film layer. In order to introduce a carboxylic acid (salt) group into the urethane resin, for example, a polyol compound having a carboxylic acid group such as dimethylolpropionic acid and dimethylolbutanoic acid may be introduced as a copolymer component. Further, the urethane resin of the water dispersion can be obtained by synthesizing the carboxylic acid group-containing urethane resin and then neutralizing it with a salt forming agent. Specific examples of the salt forming agent include ammonia, trimethylamine, triethylamine, triisopropylamine, tri-n-propylamine, tri-n-butylamine and other trialkylamines, N-methylmorpholine, N-ethylmorpholine and other N -N-dialkylalkanolamines such as -alkylmorpholines, N-dimethylethanolamine, N-diethylethanolamine and the like can be mentioned. These may be used alone or in combination of two or more.
本発明の基材層のMD方向(縦延伸方向)における150℃で15分間加熱後の熱収縮率の上限は好ましくは4.0%であり、より好ましくは3.0%であり、さらに好ましくは2%である。上限を越えると保護膜の形成工程や、レトルト殺菌処理のような高温処理において生じる基材層フィルムの寸法変化により無機薄膜層に割れが生じ、ガスバリア性が低下する恐れがあるばかりか、印刷などの加工時の寸法変化により、ピッチズレなどが起こるとなることがある。 The upper limit of the heat shrinkage rate after heating the base material layer of the present invention in the MD direction (longitudinal stretching direction) at 150 ° C. for 15 minutes is preferably 4.0%, more preferably 3.0%, and further preferably Is 2%. If the upper limit is exceeded, the inorganic thin film layer may crack due to the dimensional change of the base layer film that occurs in the protective film forming step or high temperature treatment such as retort sterilization treatment, and not only the gas barrier property may deteriorate, but also printing etc. Pitch deviation may occur due to dimensional changes during processing.
本発明における基材層のMD方向における150℃で15分間加熱後の熱収縮率の下限は好ましくは1%である。上記未満であると、無機薄膜層形成した後の保護膜形成工程でかかる張力により伸び易くなり、ガスバリア性が低下してしまう恐れがある。また、力学的に脆くなってしまうことがある。 The lower limit of the heat shrinkage rate after heating the base material layer in the MD direction at 150 ° C. for 15 minutes in the present invention is preferably 1%. If it is less than the above, the tension tends to increase due to the tension applied in the protective film forming step after forming the inorganic thin film layer, and the gas barrier property may be deteriorated. Further, it may be mechanically brittle.
本発明のおける基材層のTD方向(横延伸方向)における150℃で15分間加熱後の熱収縮率の上限は好ましくは3.0%であり、より好ましくは2.0%であり、さらに好ましくは1%である。上限を越えると保護膜の形成工程や、レトルト殺菌処理のような高温処理において生じる基材層フィルムの寸法変化により無機薄膜層に割れが生じ、ガスバリア性が低下する恐れがあるばかりか、印刷などの加工時の寸法変化により、ピッチズレなどが起こるとなることがある。 The upper limit of the heat shrinkage ratio after heating the base material layer in the present invention in the TD direction (transverse stretching direction) at 150 ° C. for 15 minutes is preferably 3.0%, more preferably 2.0%, and It is preferably 1%. If the upper limit is exceeded, the inorganic thin film layer may crack due to the dimensional change of the base layer film that occurs in the protective film forming step or high temperature treatment such as retort sterilization treatment, and not only the gas barrier property may deteriorate, but also printing etc. Pitch deviation may occur due to dimensional changes during processing.
本発明のおける基材層のTD方向における150℃で15分間加熱後の熱収縮率の下限は好ましくは-1.0%である。上記未満であってもと改善の効果がそれ以上得られない。また、力学的に脆くなってしまうことがある。 The lower limit of the heat shrinkage ratio after heating the base material layer in the TD direction of the present invention at 150 ° C. for 15 minutes in the TD direction is preferably −1.0%. If it is less than the above, the improvement effect cannot be further obtained. Further, it may be mechanically brittle.
[積層フィルム及びその形成方法]
本発明の積層フィルムは、少なくとも基材層フィルムとシーラント層からなる積層フィルムである。すなわち、シーラントと呼ばれるヒートシール性樹脂層が基材層フィルムに積層されているフィルムである。
ヒートシール性樹脂層は、通常押出しラミネート法あるいはドライラミネート法により基材層フィルムに積層される。
ヒートシール性樹脂層は通常、無機薄膜層上側に設けられるが、基材層フィルムの外側(無機薄膜層側の反対側の面)に設けることもある。
ヒートシール性樹脂層を形成する熱可塑性重合体としては、ヒートシール性が充分に発現できるものであればよく、高密度ポリエチレン(HDPEと略す)、低密度ポリエチレン(LDPEと略す)、直鎖状低密度ポリエチレン(LLDPEと略す)などのポリエチレン樹脂、ポリプロピレン樹脂、エチレン-酢酸ビニル共重合体、エチレン-α-オレフィンランダム共重合体、アイオノマー樹脂等を使用できる。
[Laminated film and method for forming the same]
The laminated film of the present invention is a laminated film including at least a base layer film and a sealant layer. That is, it is a film in which a heat-sealable resin layer called a sealant is laminated on a base material layer film.
The heat-sealable resin layer is usually laminated on the substrate layer film by an extrusion laminating method or a dry laminating method.
The heat-sealable resin layer is usually provided on the upper side of the inorganic thin film layer, but it may be provided on the outer side of the base material layer film (the surface opposite to the inorganic thin film layer side).
The thermoplastic polymer that forms the heat-sealable resin layer may be any polymer that can sufficiently exhibit heat-sealability, such as high-density polyethylene (abbreviated as HDPE), low-density polyethylene (abbreviated as LDPE), and linear A polyethylene resin such as low density polyethylene (abbreviated as LLDPE), a polypropylene resin, an ethylene-vinyl acetate copolymer, an ethylene-α-olefin random copolymer, an ionomer resin or the like can be used.
さらに、本発明の積層フィルムには、その外側及び/又は層間に印刷層や他のプラスチック基材及び/又は紙基材、金属箔を少なくとも1層以上積層していてもよい。 Furthermore, the laminated film of the present invention may have at least one or more printed layers, other plastic base materials and / or paper base materials, and metal foils laminated on the outside and / or between the layers.
印刷層を形成する印刷インクとしては、水性及び溶剤系の樹脂含有印刷インクが好ましく使用できる。ここで印刷インクに使用される樹脂としては、アクリル系樹脂、ウレタン系樹脂、ポリエステル系樹脂、塩化ビニル系樹脂、酢酸ビニル共重合樹脂及びこれらの混合物が例示される。印刷インクには、帯電防止剤、光線遮断剤、紫外線吸収剤、可塑剤、滑剤、フィラー、着色剤、安定剤、潤滑剤、消泡剤、架橋剤、耐ブロッキング剤、酸化防止剤等の公知の添加剤を含有させてもよい。印刷層を設けるための印刷方法としては、特に限定されず、オフセット印刷法、グラビア印刷法、スクリーン印刷法等の公知の印刷方法が使用できる。印刷後の溶剤の乾燥には、熱風乾燥、熱ロール乾燥、赤外線乾燥等公知の乾燥方法が使用できる。 As the printing ink for forming the printing layer, water-based and solvent-based resin-containing printing inks can be preferably used. Examples of the resin used in the printing ink here include acrylic resins, urethane resins, polyester resins, vinyl chloride resins, vinyl acetate copolymer resins, and mixtures thereof. Printing inks include antistatic agents, light blocking agents, ultraviolet absorbers, plasticizers, lubricants, fillers, colorants, stabilizers, lubricants, defoamers, crosslinkers, antiblocking agents, antioxidants, etc. The additive may be included. The printing method for providing the printing layer is not particularly limited, and known printing methods such as an offset printing method, a gravure printing method and a screen printing method can be used. For drying the solvent after printing, known drying methods such as hot air drying, hot roll drying and infrared ray drying can be used.
本発明の積層フィルムのループスティフネスの数値X(mN/25mm)の下限は、好ましくは80であり、より好ましくは90であり、最も好ましくは100である。
ここで、ループスティフネスとは、所定寸法の短冊状にカットしたフィルムを用いてループを形成し、このループを径方向に所定量だけ押しつぶした状態で測定したループの反発力をいい、フィルムの剛性を表す指標である。
積層フィルムのループスティフネスが上記未満であると、内容量が少ない場合であってもスタンディングパウチの自立性を確保することができず、店頭での陳列の際につぶれてしまうなどの不具合が生じる。ループスティフネスの値が大きいほど、積層フィルムの剛性が高くなる。ループスティフネスの測定方法については後述する。
The lower limit of the numerical value X (mN / 25 mm) of loop stiffness of the laminated film of the present invention is preferably 80, more preferably 90, and most preferably 100.
Here, the loop stiffness refers to the repulsive force of the loop measured by forming a loop using a film cut into a strip of a predetermined size and crushing the loop in the radial direction by a predetermined amount, and the rigidity of the film. Is an index representing.
If the loop stiffness of the laminated film is less than the above, it is not possible to secure the self-sustainability of the standing pouch even when the internal capacity is small, and problems such as crushing during display at the store occur. The higher the loop stiffness value, the higher the rigidity of the laminated film. The method for measuring loop stiffness will be described later.
また、本発明の積層フィルムのループスティフネスの数値Xに対してスタンディングパウチの内容量Y(g)を下記式(1)の範囲にすると、良好な自立性を有する包装袋を作製することができる。
1.8X ≦ Y ≦3.8X 式(1)
Further, when the content Y (g) of the standing pouch is set within the range of the following formula (1) with respect to the numerical value X of the loop stiffness of the laminated film of the present invention, a packaging bag having good self-standing can be manufactured. .
1.8X ≤ Y ≤ 3.8X Formula (1)
以上のとおり、本発明の積層フィルムを用いることにより、湿熱処理を施した後でも、突き刺し強度に優れ、耐破袋性、耐屈曲性を有し、且つスタンディングパウチとして使用した際にも十分な自立性を確保することができる。従来、OPETとONyを積層した基材フィルムを用いた積層フィルムで作製されていたスタンディングパウチなどの包装袋を1層の基材フィルムよりなる積層フィルムで作製できるようになるので、レトルト用途や電子レンジ加熱用などの食品包装用材料として広く適用できる。 As described above, by using the laminated film of the present invention, even after subjected to wet heat treatment, it has excellent piercing strength, bag puncture resistance, bending resistance, and is sufficient even when used as a standing pouch. Independence can be secured. Conventionally, packaging bags such as standing pouches, which were conventionally made of a laminated film using a base film obtained by laminating OPET and ONy, can be made of a laminated film made of a single layer of the base film, so that it can be used for retort or electronic applications. It can be widely applied as a food packaging material for heating in a microwave oven.
次に、実施例により本発明をさらに詳細に説明するが、本発明は以下の例に限定されるものではない。なお、フィルムの評価は次の測定法によって行った。 Next, the present invention will be described in more detail with reference to examples, but the present invention is not limited to the following examples. The film was evaluated by the following measuring methods.
[基材層フィルムの厚み]
JIS K7130-1999 A法に準拠し、ダイアルゲージを用いて測定した。
[Thickness of base layer film]
In accordance with JIS K7130-1999 A method, measurement was performed using a dial gauge.
[積層フィルムの耐ピンホール性]
後述で得られた積層フィルムを20.3cm(8インチ)×27.9cm(11インチ)の大きさに切断し、その切断後の長方形テストフィルムを、温度23℃の相対湿度50%の条件下に、24時間以上放置してコンディショニングした。しかる後、その長方形テストフィルムを巻架して長さ20.32cm(8インチ)の円筒状にする。そして、その円筒状フィルムの一端を、ゲルボフレックステスター(理学工業社製、NO.901型)(MIL-B-131Cの規格に準拠)の円盤状固定ヘッドの外周に固定し、円筒状フィルムの他端を、固定ヘッドと17.8cm(7インチ)隔てて対向したテスターの円盤状可動ヘッドの外周に固定した。
そして、可動ヘッドを固定ヘッドの方向に、平行に対向した両ヘッドの軸に沿って7.6cm(3.5インチ)接近させる間に440゜回転させ、続いて回転させることなく6.4cm(2.5インチ)直進させた後、それらの動作を逆向きに実行させて可動ヘッドを最初の位置に戻すという1サイクルの屈曲テストを、1分間あたり40サイクルの速度で、連続して2000サイクル繰り返した。実施は5℃で行った。
しかる後に、テストしたフィルムの固定ヘッド及び可動ヘッドの外周に固定した部分を除く17.8cm(7インチ)×27.9cm(11インチ)内の部分に生じたピンホール数を計測した(すなわち、497cm2 (77平方インチ)当たりのピンホール数を計測した)。
[Pinhole resistance of laminated film]
The laminated film obtained below was cut into a size of 20.3 cm (8 inches) × 27.9 cm (11 inches), and the rectangular test film after the cutting was subjected to a condition of a temperature of 23 ° C. and a relative humidity of 50%. Then, it was conditioned for 24 hours or more. Then, the rectangular test film is wound into a cylindrical shape having a length of 20.32 cm (8 inches). Then, one end of the cylindrical film was fixed to the outer periphery of a disk-shaped fixed head of a Gelbo flex tester (manufactured by Rigaku Kogyo Co., Ltd., NO.901 type) (in accordance with the standard of MIL-B-131C), and the cylindrical film was formed. The other end of was fixed to the outer circumference of the disk-shaped movable head of the tester facing the fixed head with a distance of 17.8 cm (7 inches).
Then, the movable head is rotated 440 ° while approaching the fixed head in the direction of 7.6 cm (3.5 inches) along the axes of the two heads facing each other in parallel, and then is rotated 6.4 cm (without rotating). 2.5-inch) Straight running, and then those operations are performed in the opposite direction to return the movable head to the initial position. A 1-cycle bending test is performed at a speed of 40 cycles per minute and 2000 cycles in succession. I repeated. Implementation was carried out at 5 ° C.
After that, the number of pinholes generated in a portion within 17.8 cm (7 inches) x 27.9 cm (11 inches) excluding the portions fixed to the outer periphery of the fixed head and the movable head of the tested film was measured (that is, The number of pinholes per 497 cm 2 (77 square inches) was measured).
[積層フィルムの突き刺し強度]
得られた積層フィルムを5cm角にサンプリングし、株式会社イマダ製デジタルフォースゲージ「ZTS-500N」、電動計測スタンド「MX2-500N」及び突き刺し治具「TKS-250N」を用いて、JIS Z1707に準じてフィルムの突き刺し強度を測定した。単位はNで示した。
[Puncture strength of laminated film]
The obtained laminated film was sampled into a 5 cm square, and a digital force gauge “ZTS-500N” manufactured by Imada Co., Ltd., a motorized measuring stand “MX2-500N” and a piercing jig “TKS-250N” were used in accordance with JIS Z1707. The puncture strength of the film was measured. The unit is indicated by N.
[積層フィルムのループスティフネス]
ループスティフネス測定用のサンプルとして、実施例及び比較例で作成した積層フィルムを、幅25.4mm、110mmの短冊状フィルムを切り出した。このとき、短冊状フィルムの長手方向が測定対象の方向に一致するようにした。切り出した短冊状フィルムを東洋精機社製ループスティフネステスタにセットし反発力を測定した。測定周波数は50Hzとした。測定で得られた反発力の値(mN)をループスティフネスとした。
[Loop stiffness of laminated film]
As a sample for loop stiffness measurement, a strip-shaped film having a width of 25.4 mm and a width of 110 mm was cut out from the laminated film prepared in Examples and Comparative Examples. At this time, the longitudinal direction of the strip-shaped film was made to coincide with the measurement target direction. The cut strip-shaped film was set on a loop stiffener tester manufactured by Toyo Seiki Co., Ltd., and the repulsive force was measured. The measurement frequency was 50 Hz. The repulsive force value (mN) obtained by the measurement was used as the loop stiffness.
[スタンディングパウチの自立性]
(1)スタンディングパウチの作製
後述する実施例、比較例及び参考例で示した積層フィルム用いて、図1及び図2に示した形状のスタンディングパウチを作製した。
スタンディングパウチ本体部の外形寸法は、充填する水の容量に対応し、各々表1に示した寸法とした。
底部のヒートシール部は、通常のスタンディングパウチと同様に、上部に下反りの湾曲部を有し、湾曲部の下側がヒートシールされ、湾曲部の底部ではパウチ下端までの長さが5mmのヒートシール部を有するパターンでヒートシールして底部を形成し、胴部はヒートシール幅5mmでパウチの左右両側をヒートシールして形成した。
尚、内容物充填用に未シールの上部を開口部として開口させた。
その後それぞれの未シールの上部開口部から、内容物として表1に示した容量の水を充填した後、開口部を脱気シールしてパウチを密封し、自立性評価用のスタンディングパウチを作製した。
また、スタンディングパウチを作製する際のヒートシール時の温度は、LLDPEでは160℃×1秒、無延伸ポリプロピレンフィルムの場合は200℃×1秒とした。
(2)自立性の評価
自立性の評価は下の基準の通り○、△、×で評価した。
・自立性
○:スタンディングパウチの底部が折れ曲がることなく、自立状態が維持された。
△:スタンディングパウチの底部が僅かに変形するものの、自立状態は維持された。
×:スタンディングパウチの底部が折れ曲がり、自立状態を維持できなかった。
[Standing pouch independence]
(1) Preparation of Standing Pouch A standing pouch having the shape shown in FIGS. 1 and 2 was prepared using the laminated films shown in Examples, Comparative Examples and Reference Examples described later.
The outer dimensions of the standing pouch body corresponded to the volume of water to be filled and were set to the dimensions shown in Table 1.
The heat seal part on the bottom has a warp curved part on the upper part like the normal standing pouch, the lower side of the curved part is heat-sealed, and at the bottom of the curved part, the length of the pouch to the lower end is 5 mm. The bottom portion was formed by heat-sealing with a pattern having a seal portion, and the body portion was formed by heat-sealing the left and right sides of the pouch with a heat-sealing width of 5 mm.
The unsealed upper part was opened as an opening for filling the contents.
After that, each of the unsealed upper openings was filled with water having the volume shown in Table 1 as a content, and then the openings were degassed and sealed to seal the pouches, thereby producing standing pouches for self-supporting evaluation. .
In addition, the temperature at the time of heat sealing when producing a standing pouch was 160 ° C. × 1 second for LLDPE and 200 ° C. × 1 second for an unstretched polypropylene film.
(2) Evaluation of independence The evaluation of independence was evaluated by ○, △, × according to the following criteria.
・ Independence ○: Independence was maintained without bending the bottom of the standing pouch.
Δ: The standing part was maintained, although the bottom part of the standing pouch was slightly deformed.
X: The bottom of the standing pouch was bent, and the self-supporting state could not be maintained.
以下に本実施例及び比較例で使用する原料樹脂及び塗工液の詳細を記する。
1)PBT樹脂:後述する基材層フィルムA1~A3のフィルム作製において使用するPBT樹脂は、1100-211XG(CHANG CHUN PLASTICS CO.,LTD.製、固有粘度1.28dl/g)を用いた。
2)PET樹脂:後述する基材層フィルムA1~A3のフィルム作製において使用するPET樹脂は東洋紡(株)製、固有粘度0.62dl/gのPET樹脂を用いた。
The details of the raw material resins and the coating liquids used in the examples and comparative examples are described below.
1) PBT resin: 1100-211XG (manufactured by CHANG CHUN PLASTICS CO., LTD., Intrinsic viscosity 1.28 dl / g) was used as the PBT resin used in the film production of the base layer films A1 to A3 described later.
2) PET resin: PET resin having a specific viscosity of 0.62 dl / g, manufactured by Toyobo Co., Ltd. was used as the PET resin used in the film production of the substrate layer films A1 to A3 described later.
3)易接着層用のオキサゾリン基を有する樹脂(A):オキサゾリン基を有する樹脂として、市販の水溶性オキサゾリン基含有アクリレート(日本触媒株式会社製「エポクロス(登録商標)WS-300」;固形分10%)を用意した。この樹脂のオキサゾリン基量は7.7mmol/gであった。 3) Resin (A) having an oxazoline group for the easy-adhesion layer: As a resin having an oxazoline group, a commercially available water-soluble oxazoline group-containing acrylate (“Epocros (registered trademark) WS-300” manufactured by Nippon Shokubai Co., Ltd .; solid content) 10%) was prepared. The amount of oxazoline groups in this resin was 7.7 mmol / g.
4)易接着層用のアクリル樹脂(B):アクリル樹脂として、市販のアクリル酸エステル共重合体の25質量%エマルジョン(ニチゴー・モビニール株式会社製「モビニール(登録商標)7980」を用意した。このアクリル樹脂(B)の酸価(理論値)は4mgKOH/gであった。 4) Acrylic resin (B) for the easy-adhesion layer: As the acrylic resin, a commercially available 25 mass% emulsion of an acrylic acid ester copolymer (“Movinyl (registered trademark) 7980” manufactured by Nichigo Movinyl Co., Ltd.) was prepared. The acid value (theoretical value) of the acrylic resin (B) was 4 mgKOH / g.
5)易接着層用のウレタン樹脂(C):ウレタン樹脂として、市販のポリエステルウレタン樹脂のディスパージョン(三井化学株式会社製「タケラック(登録商標)W605」;固形分30%)を用意した。このウレタン樹脂の酸価25mgKOH/gであり、DSCで測定したガラス転移温度(Tg)は100℃であった。。また、1H-NMRにより測定したポリイソシアネート成分全体に対する芳香族ジイソシアネートまたは芳香脂肪族ジイソシアネートの割合は、55モル%であった。 5) Urethane resin (C) for easy-adhesion layer: As a urethane resin, a commercially available polyester urethane resin dispersion (“Takelac (registered trademark) W605” manufactured by Mitsui Chemicals, Inc .; solid content: 30%) was prepared. The acid value of this urethane resin was 25 mgKOH / g, and the glass transition temperature (Tg) measured by DSC was 100 ° C. . The ratio of aromatic diisocyanate or araliphatic diisocyanate to the whole polyisocyanate component measured by 1H-NMR was 55 mol%.
6)保護層用のウレタン樹脂(D);:ウレタン樹脂として、市販のメタキシリレン基含有ウレタン樹脂のディスパージョン(三井化学株式会社製「タケラック(登録商標)WPB341」;固形分30%)を用意した。このウレタン樹脂の酸価25mgKOH/gであり、DSCで測定したガラス転移温度(Tg)は130℃であった。また、1H-NMRにより測定したポリイソシアネート成分全体に対する芳香族ジイソシアネートまたは芳香脂肪族ジイソシアネートの割合は、85モル%であった。 6) Urethane resin (D) for protective layer ;: As a urethane resin, a commercially available dispersion of a metaxylylene group-containing urethane resin (“Takelac (registered trademark) WPB341” manufactured by Mitsui Chemicals, Inc .; solid content: 30%) was prepared. . The acid value of this urethane resin was 25 mgKOH / g, and the glass transition temperature (Tg) measured by DSC was 130 ° C. The ratio of aromatic diisocyanate or araliphatic diisocyanate to the total polyisocyanate component measured by 1 H-NMR was 85 mol%.
7)易接着層に用いる塗工液1(コート1)
下記の配合比率で各材料を混合し、塗布液(易接着層用樹脂組成物)を作製した。
水 54.40質量%
イソプロパノール 25.00質量%
オキサゾリン基含有樹脂 (A) 15.00質量%
アクリル樹脂 (B) 3.60質量%
ウレタン樹脂 (C) 2.00質量%
7) Coating liquid 1 (coat 1) used for the easy-adhesion layer
Each material was mixed in the following blending ratio to prepare a coating liquid (resin composition for easy-adhesion layer).
Water 54.40 mass%
Isopropanol 25.00% by mass
Oxazoline group-containing resin (A) 15.00% by mass
Acrylic resin (B) 3.60% by mass
Urethane resin (C) 2.00% by mass
8)保護層に用いる塗工液2(コート2)
下記の塗剤を混合し、塗工液2を作製した。ここでウレタン樹脂(E)の固形分換算の質量比はに示す通りである。
水 60.00質量%
イソプロパノール 30.00質量%
ウレタン樹脂(D) 10.00質量%
8) Coating liquid 2 (coat 2) used for the protective layer
The following coating materials were mixed to prepare
Water 60.00 mass%
Isopropanol 30.00 mass%
Urethane resin (D) 10.00 mass%
以下に各実施例及び比較例で使用する基材層フィルムの作製方法を記す。
<基材層フィルムの作製;A-1>
一軸押出機を用い、PBT樹脂を80質量%ととPET樹脂を20質量%を混合したものに、不活性粒子として平均粒径2.4μmのシリカ粒子をシリカ濃度として混合樹脂に対して900ppmとなるように配合したものを290℃で溶融させた後、メルトラインを12エレメントのスタティックミキサーに導入した。これにより、溶融した樹脂の分割・積層を行い、同一の原料樹脂からなる多層溶融体を得た。265℃のT-ダイスからキャストし、15℃の冷却ロールに静電密着法により密着させて未延伸シートを得た。
次いで、60℃でMD方向に2.9倍ロール延伸した。その後、縦延伸したフィルムを、表面温度25℃に設定された冷却ロールによって強制的に冷却した、次いで、テンターに通して90℃でTD方向に4.0倍延伸し、200℃で3秒間の緊張熱処理と1秒間9%のTD方向の緩和処理を実施した後、両端の把持部を10%ずつ切断除去して厚みが15μmのPBTフィルムのミルロールを得た。得られたフィルムの製膜条件、物性及び評価結果を表1に示した。
基材層フィルムの二軸延伸フィルムの製膜工程において、MD方向延伸後に易接着層用樹脂組成物(塗布液1)をファウンテンバーコート法により塗布した。その後、乾燥しながらテンターに導き、上述した製膜条件にてTD方向に延伸、熱処理及びリラックスを行い、厚み15μmのPBTフィルムの片面に易接着層が形成された積層フィルムA1を得た。
The method for producing the base layer film used in each example and comparative example will be described below.
<Production of base material layer film; A-1>
Using a single-screw extruder, 80% by mass of PBT resin and 20% by mass of PET resin were mixed, and silica particles having an average particle size of 2.4 μm as inert particles were used as silica concentration of 900 ppm with respect to the mixed resin. After being melted at 290 ° C., the melt line was introduced into a 12-element static mixer. Thus, the molten resin was divided and laminated to obtain a multi-layered melt made of the same raw material resin. A non-stretched sheet was obtained by casting from a T-die at 265 ° C. and closely contacting it with a cooling roll at 15 ° C. by an electrostatic contact method.
Then, it was roll-stretched 2.9 times in the MD direction at 60 ° C. After that, the longitudinally stretched film was forcibly cooled by a cooling roll set to a surface temperature of 25 ° C., then passed through a tenter and stretched 4.0 times in the TD direction at 90 ° C. for 3 seconds at 200 ° C. After performing the tension heat treatment and the relaxation treatment in the TD direction of 9% for 1 second, the grip portions at both ends were cut and removed by 10% to obtain a mill roll of a PBT film having a thickness of 15 μm. Table 1 shows film forming conditions, physical properties and evaluation results of the obtained film.
In the film forming process of the biaxially stretched film of the substrate layer film, the resin composition for easy-adhesion layer (coating liquid 1) was applied by the fountain bar coating method after stretching in the MD direction. Then, it was introduced into a tenter while being dried, stretched in the TD direction under the above-mentioned film forming conditions, heat-treated and relaxed to obtain a laminated film A1 in which an easily adhesive layer was formed on one surface of a PBT film having a thickness of 15 μm.
<基材層フィルムの作製;A-2>
前述した基材フィルムA-1の製造方法において、溶融樹脂をT-ダイスからキャストする際の吐出量を調整し、厚み20μmのPBTフィルムを得た。
基材層フィルムの二軸延伸フィルムの製膜工程において、MD方向延伸後に易接着層用樹脂組成物(塗布液1)をファウンテンバーコート法により塗布した。その後、乾燥しながらテンターに導き、上述した製膜条件にてTD方向に延伸、熱処理及びリラックスを行い、厚み20μmのPBTフィルムの片面に易接着層が形成された積層フィルムA2を得た。
<Production of base material layer film; A-2>
In the method for producing the base material film A-1 described above, the discharge amount when casting the molten resin from the T-die was adjusted to obtain a PBT film having a thickness of 20 μm.
In the film forming process of the biaxially stretched film of the substrate layer film, the resin composition for easy-adhesion layer (coating liquid 1) was applied by the fountain bar coating method after stretching in the MD direction. Then, it was introduced into a tenter while being dried, and stretched in the TD direction, heat-treated and relaxed under the above-mentioned film forming conditions to obtain a laminated film A2 in which an easy-adhesion layer was formed on one surface of a PBT film having a thickness of 20 μm.
<基材層フィルムの作製;A-3>
一軸押出機を用い、PBT樹脂を80質量%ととPET樹脂を20質量%を混合したものに、不活性粒子として平均粒径2.4μmのシリカ粒子をシリカ濃度として混合樹脂に対して900ppmとなるように配合したものを290℃で溶融させた後、メルトラインを12エレメントのスタティックミキサーに導入した。これにより、溶融した樹脂の分割・積層を行い、同一の原料樹脂からなる多層溶融体を得た。265℃のT-ダイスからキャストし、15℃の冷却ロールに静電密着法により密着させて未延伸シートを得た。
次いで、60℃でMD方向に3.8倍ロール延伸した。その後、縦延伸したフィルムを、表面温度25℃に設定された冷却ロールによって強制的に冷却した、次いで、テンターに通して90℃でTD方向に4.0倍延伸し、210℃で3秒間の緊張熱処理と1秒間5%のTD方向の緩和処理を実施した後、両端の把持部を10%ずつ切断除去して厚みが15μmのPBTフィルムのミルロールを得た。得られたフィルムの製膜条件、物性及び評価結果を表1に示した。
基材層フィルムの二軸延伸フィルムの製膜工程において、MD方向延伸後に易接着層用樹脂組成物(塗布液1)をファウンテンバーコート法により塗布した。その後、乾燥しながらテンターに導き、上述した製膜条件にてTD方向に延伸、熱処理及びリラックスを行い、厚み15μmのPBTフィルムの片面に易接着層が形成された積層フィルムA1を得た。
<Production of base material layer film; A-3>
Using a single-screw extruder, 80% by mass of PBT resin and 20% by mass of PET resin were mixed, and silica particles having an average particle size of 2.4 μm as inert particles were used as silica concentration of 900 ppm with respect to the mixed resin. After being melted at 290 ° C., the melt line was introduced into a 12-element static mixer. Thus, the molten resin was divided and laminated to obtain a multi-layered melt made of the same raw material resin. A non-stretched sheet was obtained by casting from a T-die at 265 ° C. and closely contacting it with a cooling roll at 15 ° C. by an electrostatic contact method.
Then, it was roll-stretched 3.8 times in the MD direction at 60 ° C. After that, the longitudinally stretched film was forcibly cooled by a cooling roll set to a surface temperature of 25 ° C., then passed through a tenter and stretched 4.0 times in the TD direction at 90 ° C. for 3 seconds at 210 ° C. After performing the tension heat treatment and the 5% TD direction relaxation treatment for 1 second, the grip portions at both ends were cut and removed by 10% to obtain a mill roll of a PBT film having a thickness of 15 μm. Table 1 shows film forming conditions, physical properties and evaluation results of the obtained film.
In the film forming process of the biaxially stretched film of the substrate layer film, the resin composition for easy-adhesion layer (coating liquid 1) was applied by the fountain bar coating method after stretching in the MD direction. Then, it was introduced into a tenter while being dried, stretched in the TD direction under the above-mentioned film forming conditions, heat-treated and relaxed to obtain a laminated film A1 in which an easily adhesive layer was formed on one surface of a PBT film having a thickness of 15 μm.
以下に各実施例及び比較例での無機薄膜層の形成方法を記す。
<二酸化ケイ素と酸化アルミニウムの複合酸化物(SiO2/Al2O3)無機薄膜層M1の形成>
無機薄膜層M1として、実施例の基材フィルムA-1~A-3に、二酸化ケイ素と酸化アルミニウムの複合酸化物層を電子ビーム蒸着法で形成した。蒸着源としては、3mm~5mm程度の粒子状SiO2(純度99.9%)とA12O3(純度99.9%)とを用いた。このようにして得られたフィルム(無機薄膜層/易接着層含有フィルム)における無機薄膜層(SiO2/A12O3複合酸化物層)の膜厚は13nmであった。またこの複合酸化物層の組成は、SiO2/A12O3(質量比)=60/40であった。
The method for forming the inorganic thin film layer in each of Examples and Comparative Examples will be described below.
<Composite oxide of silicon and aluminum oxide dioxide formation (SiO 2 / Al 2 O 3 ) inorganic thin layer M1>
As the inorganic thin film layer M1, a composite oxide layer of silicon dioxide and aluminum oxide was formed on the base material films A-1 to A-3 of the example by an electron beam evaporation method. As the vapor deposition source, particulate SiO 2 (purity 99.9%) and A1 2 O 3 (purity 99.9%) of about 3 mm to 5 mm were used. The film thickness of the inorganic thin film layer (SiO 2 / A1 2 O 3 composite oxide layer) in the film (inorganic thin film layer / easy-adhesion layer-containing film) thus obtained was 13 nm. The composition of this composite oxide layer was SiO 2 / A1 2 O 3 (mass ratio) = 60/40.
<酸化アルミニウム(Al2O3)無機薄膜層M2の形成>
無機薄膜層M2として、比較例の基材層フィルムA-1及びOPET上に酸化アルミニウムの蒸着を行った。基材フィルムへの酸化アルミニウムを蒸着する方法は、フィルムを連続式真空蒸着機の巻出し側にセットし、冷却金属ドラムを介して走行させフィルムを巻き取る。この時、連続式真空蒸着機を10-4 Torr以下に減圧し、冷却ドラムの下部よりアルミナ製るつぼに純度99.99%の金属アルミニウムを装填し、金属アルミニウムを加熱蒸発させ、その蒸気中に酸素を供給し酸化反応させながらフィルム上に付着堆積させ、厚み30nmの酸化アルミニウム膜を形成した。
<Formation of Aluminum Oxide (Al 2 O 3 ) Inorganic Thin Film Layer M2>
As the inorganic thin film layer M2, aluminum oxide was vapor-deposited on the base material layer films A-1 and OPET of the comparative example. In the method of vapor-depositing aluminum oxide on a base film, the film is set on the unwinding side of a continuous vacuum vapor deposition machine and is run through a cooling metal drum to wind up the film. At this time, the continuous vacuum vapor deposition machine was depressurized to 10 −4 Torr or less, and aluminum alumina crucible was charged with metallic aluminum having a purity of 99.99% from the lower part of the cooling drum to evaporate the metallic aluminum by heating and vaporize it. Oxygen was supplied to carry out an oxidation reaction to deposit and deposit on the film to form an aluminum oxide film having a thickness of 30 nm.
<保護層の形成>
前記の基材層フィルムに形成された無機薄膜層上に、塗工液2をワイヤーバーコート法によって塗布し、200℃で15秒乾燥させ、保護層を得た。乾燥後の塗布量は0.19g/m2(Dry)であった。
以上のようにして、基材層フィルムの上に易接着層/無機薄膜層/保護層を備えたガスバリア性積層フィルムを作製した。
<Formation of protective layer>
The
As described above, a gas barrier laminate film having an easily adhesive layer / inorganic thin film layer / protective layer on the substrate layer film was produced.
<積層フィルムの形成>
[実施例1]
上記で作成した基材フィルムA-1の上に、易接着層としてコート1、無機蒸着層としてM1、保護層としてコート2をこの順に積層し、ガスバリアフィルムを作製した。ここで作製したガスバリアフィルムの保護層側に上に、接着剤(東洋モートン株式会社製「TM569」)と硬化剤「CAT-10L」、酢酸エチルを33.6:4.0:62.4(質量比)の割合で配合)を用いてドライラミネート法により、シーラント層として厚み60μmのポリエチレンフィルム(東洋紡株式会社製「L4102」)を貼り合わせ、40℃にて4日間エージングを施すことにより、実施例1の積層フィルムを得た。なお、ウレタン系2液硬化型接着剤で形成される接着剤層の乾燥後の厚みはいずれも4μmであった。
<Formation of laminated film>
[Example 1]
On the above-prepared base film A-1,
[実施例2]
上述した実施例1の積層フィルムにおいて、基材としてA-3、シーラント層としてLLDPEフィルム(プライムポリマー製 エボリュー SP2020、厚み130μm)とした以外は、実施例1と同様にして、実施例2の積層フィルムを得た。なお、ウレタン系2液硬化型接着剤で形成される接着剤層の乾燥後の厚みはいずれも4μmであった。
[Example 2]
Lamination of Example 2 in the same manner as in Example 1 except that in the laminated film of Example 1 described above, A-3 was used as the base material and an LLDPE film (Evolew SP2020 made by Prime Polymer, thickness 130 μm) was used as the sealant layer. I got a film. The thickness of the adhesive layer formed of the urethane-based two-component curable adhesive after drying was 4 μm.
[実施例3]
上記で作成した基材フィルムA-1の上に、易接着層としてコート1、無機蒸着層としてM1、保護層としてコート2をこの順に積層し、ガスバリアフィルムを作製した。ガスバリアフィルムの保護層側に、ウレタン系2液硬化型接着剤(三井化学株式会社製「タケラック(登録商標)A525S」と「タケネート(登録商標)A50」を13.5:1(質量比)の割合で配合)を用いてドライラミネート法により、ヒートシール性樹脂層として厚み70μmのCPP(東洋紡株式会社製「P1147」)を貼り合わせ、40℃にて4日間エージングを施すことにより、実施例3の積層フィルムを得た。なお、ウレタン系2液硬化型接着剤で形成される接着剤層の乾燥後の厚みはいずれも4μmであった。
[Example 3]
On the above-prepared base film A-1,
[実施例4]
上述した実施例3の積層フィルムにおいて、基材フィルムをA-2とした以外は、実施例1と同様にして、実施例4の積層フィルムを得た。なお、ウレタン系2液硬化型接着剤で形成される接着剤層の乾燥後の厚みはいずれも4μmであった。
[Example 4]
In the laminated film of Example 3 described above, a laminated film of Example 4 was obtained in the same manner as in Example 1 except that the base film was A-2. The thickness of the adhesive layer formed of the urethane-based two-component curable adhesive after drying was 4 μm.
[実施例5]
上記で得られた基材フィルムA-1の上に、アルミ箔(8079材、厚み7μm)をウレタン系2液硬化型接着剤(三井化学株式会社製「タケラック(登録商標)A525S」と「タケネート(登録商標)A50」を13.5:1(質量比)の割合で配合)を用いてドライラミネートし、基材フィルム/アルミ箔積層体を作製した。
次に、上記で得られた基材フィルム/アルミ箔積層体のアルミ箔側に、上記と同様の接着剤を用い、ヒートシール性樹脂層として厚み50μmのCPP(東洋紡株式会社製「P1147」)を貼り合わせ、40℃にて4日間エージングを施すことにより、実施例5の積層フィルムを得た。ウレタン系2液硬化型接着剤で形成される接着剤層の乾燥後の厚みはいずれも4μmであった。
[Example 5]
On the base film A-1 obtained above, an aluminum foil (8079 material,
Next, on the aluminum foil side of the base film / aluminum foil laminate obtained above, the same adhesive as above was used, and a CPP having a thickness of 50 μm as a heat-sealable resin layer (“P1147” manufactured by Toyobo Co., Ltd.). Were laminated and aged at 40 ° C. for 4 days to obtain a laminated film of Example 5. The thickness of the adhesive layer formed of the urethane-based two-component curable adhesive after drying was 4 μm in all cases.
[実施例6]
上述した実施例5の積層フィルムにおいて、ヒートシール性樹脂層として厚み60μmの無延伸ポリプロピレンフィルム(東洋紡株式会社製「P1147」)とした以外は、実施例5と同様にして、実施例6の積層フィルムを得た。ウレタン系2液硬化型接着剤で形成される接着剤層の乾燥後の厚みはいずれも4μmであった。
[Example 6]
The laminated film of Example 6 was the same as Example 5 except that the heat-sealing resin layer was an unstretched polypropylene film having a thickness of 60 μm (“P1147” manufactured by Toyobo Co., Ltd.). I got a film. The thickness of the adhesive layer formed of the urethane-based two-component curable adhesive after drying was 4 μm in all cases.
[比較例1]
上述した実施例1の積層フィルムにおいて、無機蒸着層をM2、シーラント層として厚み40μmのポリエチレンフィルム(東洋紡株式会社製「L4102」)とした以外は、実施例1と同様にして、比較例1の積層フィルムを得た。
[Comparative Example 1]
Comparative Example 1 was repeated in the same manner as in Example 1 except that the inorganic vapor deposition layer was M2 and the sealant layer was a polyethylene film having a thickness of 40 μm (“L4102” manufactured by Toyobo Co., Ltd.). A laminated film was obtained.
[比較例2]
上述した比較例1の積層フィルムにおいて、基材フィルムを厚み12μmのOPET(東洋紡株式会社製「E5102」)とした以外は比較例1と同様にして、比較例2の積層フィルムを得た。
[Comparative Example 2]
In the laminated film of Comparative Example 1 described above, a laminated film of Comparative Example 2 was obtained in the same manner as Comparative Example 1 except that the substrate film was OPET having a thickness of 12 μm (“E5102” manufactured by Toyobo Co., Ltd.).
[比較例3]
基材フィルムとして厚み15μmのONy(東洋紡株式会社製「N1102」の上に、接着剤(東洋モートン株式会社製「TM569」)と硬化剤「CAT-10L」、酢酸エチルを33.6:4.0:62.4(質量比)の割合で配合)を用いてドライラミネート法により、シーラント層として厚み60μmのポリエチレンフィルム(東洋紡株式会社製「L4102」)を貼り合わせ、40℃にて4日間エージングを施すことにより、比較例3の積層フィルムを得た。なお、ウレタン系2液硬化型接着剤で形成される接着剤層の乾燥後の厚みはいずれも4μmであった。
[Comparative Example 3]
As a base film, ONy having a thickness of 15 μm (“N1102” manufactured by Toyobo Co., Ltd.), an adhesive (“TM569” manufactured by Toyo Morton Co., Ltd.), a curing agent “CAT-10L”, and ethyl acetate 33.6: 4. A polyethylene film (“L4102” manufactured by Toyobo Co., Ltd.) having a thickness of 60 μm was stuck as a sealant layer by a dry lamination method using 0: 62.4 (mass ratio), and aged at 40 ° C. for 4 days. By performing the above, a laminated film of Comparative Example 3 was obtained. The thickness of the adhesive layer formed of the urethane-based two-component curable adhesive after drying was 4 μm.
[比較例4]
基材フィルムとして厚み15μmのONy(東洋紡株式会社製「N1102」の上に、接着剤(東洋モートン株式会社製「TM569」)と硬化剤「CAT-10L」、酢酸エチルを33.6:4.0:62.4(質量比)の割合で配合)を用いてドライラミネート法により、シーラント層としてLLDPEフィルム(プライムポリマー製 エボリュー SP2020、厚み130μm)を貼り合わせ、40℃にて4日間エージングを施すことにより、比較例4の積層フィルムを得た。なお、ウレタン系2液硬化型接着剤で形成される接着剤層の乾燥後の厚みはいずれも4μmであった。
[Comparative Example 4]
As a base film, ONy having a thickness of 15 μm (“N1102” manufactured by Toyobo Co., Ltd.), an adhesive (“TM569” manufactured by Toyo Morton Co., Ltd.), a curing agent “CAT-10L”, and ethyl acetate 33.6: 4. A LLDPE film (Evolue SP2020 made by Prime Polymer, thickness 130 μm) as a sealant layer is stuck by a dry lamination method using 0: 62.4 (mass ratio), and aged at 40 ° C. for 4 days. Thereby, a laminated film of Comparative Example 4 was obtained. The thickness of the adhesive layer formed of the urethane-based two-component curable adhesive after drying was 4 μm.
[比較例5]
上述した比較例2の積層フィルムにおいて、接着剤をウレタン系2液硬化型接着剤(三井化学株式会社製「タケラック(登録商標)A525S」と「タケネート(登録商標)A50」を13.5:1(質量比)の割合で配合)、、ヒートシール性樹脂層を厚み70μmの無延伸ポリプロピレンフィルム(東洋紡株式会社製「P1147」)とした以外は、比較例2と同様にして、比較例5の積層フィルムを得た。
[Comparative Example 5]
In the laminated film of Comparative Example 2 described above, the urethane-based two-component curing adhesive (“Takelac (registered trademark) A525S” and “Takenate (registered trademark) A50” manufactured by Mitsui Chemicals, Inc. was used as a 13.5: 1 adhesive. (Blended in the ratio of (mass ratio)), and the heat-sealable resin layer was a non-stretched polypropylene film having a thickness of 70 μm (“P1147” manufactured by Toyobo Co., Ltd.) A laminated film was obtained.
[比較例6]
上述した比較例3の積層フィルムにおいて、接着剤をウレタン系2液硬化型接着剤(三井化学株式会社製「タケラック(登録商標)A525S」と「タケネート(登録商標)A50」を13.5:1(質量比)の割合で配合)、、ヒートシール性樹脂層を厚み70μmの無延伸ポリプロピレンフィルム(東洋紡株式会社製「P1147」)とした以外は、比較例と同様にして、比較例6の積層フィルムを得た。
[Comparative Example 6]
In the laminated film of Comparative Example 3 described above, the urethane-based two-component curable adhesive (“Takelac (registered trademark) A525S” and “Takenate (registered trademark) A50” manufactured by Mitsui Chemicals, Inc. was used as a 13.5: 1 adhesive. (Blended in the ratio of (mass ratio)), and the heat-sealable resin layer was a non-stretched polypropylene film having a thickness of 70 μm (“P1147” manufactured by Toyobo Co., Ltd.), and laminated in Comparative Example 6 in the same manner as Comparative Example. I got a film.
[参考例1]
基材フィルムとして厚み12μmのOPET(東洋紡株式会社製「E5102」)を用い、その上に、厚み15μmのONy(東洋紡株式会社製「N1102」を接着剤(東洋モートン株式会社製「TM569」)と硬化剤「CAT-10L」、酢酸エチルを33.6:4.0:62.4(質量比)の割合で配合)を用いてドライラミネート法し、OPET/ONyの積層フィルムを得た。
上記で得られたOPET/ONy積層体のONy側に対し、接着剤(東洋モートン株式会社製「TM569」)と硬化剤「CAT-10L」、酢酸エチルを33.6:4.0:62.4(質量比)の割合で配合)を用い、シーラント層として厚み40μmのポリエチレンフィルム(東洋紡株式会社製「L4102」)を貼り合わせ、40℃にて4日間エージングを施すことにより、参考例1の積層フィルムを得た。なお、ウレタン系2液硬化型接着剤で形成される接着剤層の乾燥後の厚みはいずれも4μmであった。
[Reference Example 1]
As a base film, OPET having a thickness of 12 μm (“E5102” manufactured by Toyobo Co., Ltd.) was used, and ONy having a thickness of 15 μm (“N1102” manufactured by Toyobo Co., Ltd.) was used as an adhesive (“TM569” manufactured by Toyo Morton Co., Ltd.). The curing agent "CAT-10L" and ethyl acetate were mixed at a ratio of 33.6: 4.0: 62.4 (mass ratio) were used for dry lamination to obtain an OPET / ONy laminated film.
On the ONy side of the OPET / ONy laminate obtained above, an adhesive (“TM569” manufactured by Toyo Morton Co., Ltd.), a curing agent “CAT-10L”, and ethyl acetate 33.6: 4.0: 62. 4 (mass ratio)), a polyethylene film having a thickness of 40 μm (“L4102” manufactured by Toyobo Co., Ltd.) was stuck as a sealant layer, and aged for 4 days at 40 ° C. A laminated film was obtained. The thickness of the adhesive layer formed of the urethane-based two-component curable adhesive after drying was 4 μm.
[参考例2]
上記の参考例1において、シーラント層をLLDPEフィルム(プライムポリマー製 エボリュー SP2020、厚み130μm)とした以外は、参考例1と同様にして、参考例2の積層フィルムを得た。
[Reference example 2]
A laminated film of Reference Example 2 was obtained in the same manner as in Reference Example 1 except that the sealant layer in Reference Example 1 was an LLDPE film (Evolew SP2020 made by Prime Polymer, thickness 130 μm).
[参考例3]
上記の参考例2において、接着剤をウレタン系2液硬化型接着剤(三井化学株式会社製「タケラック(登録商標)A525S」と「タケネート(登録商標)A50」を13.5:1(質量比)の割合で配合)、、ヒートシール性樹脂層を厚み70μmの無延伸ポリプロピレンフィルム(東洋紡株式会社製「P1147」)とした以外は、参考例2と同様にして、参考例3の積層フィルムを得た。
[Reference Example 3]
In the above-mentioned Reference Example 2, the urethane-based two-component curing adhesive (“Takelac (registered trademark) A525S” and “Takenate (registered trademark) A50” manufactured by Mitsui Chemicals, Inc. was used as a 13.5: 1 (mass ratio). )), And the heat-sealable resin layer was a non-stretched polypropylene film having a thickness of 70 μm (“P1147” manufactured by Toyobo Co., Ltd.), and the laminated film of Reference Example 3 was prepared in the same manner as in Reference Example 2. Obtained.
[参考例4]
基材フィルムとして厚み12μmのOPET(東洋紡株式会社製「E5102」)を用い、その上に、厚み15μmのONy(東洋紡株式会社製「N1102」を接着剤(東洋モートン株式会社製「TM569」)と硬化剤「CAT-10L」、酢酸エチルを33.6:4.0:62.4(質量比)の割合で配合)を用いてドライラミネート法し、OPET/ONyの積層体を得た。
次いで、上記で得られたOPET/ONy積層体のONy側に、アルミ箔(8079材、厚み7μm)をウレタン系2液硬化型接着剤(三井化学株式会社製「タケラック(登録
商標)A525S」と「タケネート(登録商標)A50」を13.5:1(質量比)の割合で配合)を用いてドライラミネートし、OPET/ONy/アルミ箔積層体を作製した。
次に、上記で得られたOPET/ONy/アルミ箔積層体のアルミ箔側に、上記と同様の接着剤を用い、ヒートシール性樹脂層として厚み50μmの無延伸ポリプロピレンフィルム(東洋紡株式会社製「P1147」)を貼り合わせ、40℃にて4日間エージングを施すことにより、参考例4の積層フィルムを得た。ウレタン系2液硬化型接着剤で形成される接着剤層の乾燥後の厚みはいずれも4μmであった。
[Reference Example 4]
As a base film, OPET having a thickness of 12 μm (“E5102” manufactured by Toyobo Co., Ltd.) was used, and ONy having a thickness of 15 μm (“N1102” manufactured by Toyobo Co., Ltd.) was used as an adhesive (“TM569” manufactured by Toyo Morton Co., Ltd.). A curing agent "CAT-10L" and ethyl acetate were mixed at a ratio of 33.6: 4.0: 62.4 (mass ratio) were used for dry lamination to obtain an OPET / ONy laminate.
Then, on the ONy side of the OPET / ONy laminate obtained above, aluminum foil (8079 material,
Next, on the aluminum foil side of the OPET / ONy / aluminum foil laminate obtained above, the same adhesive as above was used, and a non-stretched polypropylene film having a thickness of 50 μm as a heat-sealable resin layer (manufactured by Toyobo Co., Ltd. P1147 ") was attached and aged at 40 ° C. for 4 days to obtain a laminated film of Reference Example 4. The thickness of the adhesive layer formed of the urethane-based two-component curable adhesive after drying was 4 μm in all cases.
実施例、比較例及び参考例で得られた積層フィルムの評価結果を表1、表2及び表3に示す。 The evaluation results of the laminated films obtained in Examples, Comparative Examples and Reference Examples are shown in Table 1, Table 2 and Table 3.
表1に示すように、本発明によって得られた実施例1~6の積層フィルムは、基材フィルムを1層にできるので包装材料の減量化が可能であり、且つ優れた突き刺し強度である9.0N以上を得ることができ、耐ピンホール性に優れ、更に、それから作製したスタンディングパウチは、十分な自立性を確保することができた。 As shown in Table 1, in the laminated films of Examples 1 to 6 obtained by the present invention, since the base film can be one layer, the packaging material can be reduced in weight and the piercing strength is excellent. It was possible to obtain 0.0 N or more, excellent pinhole resistance, and the standing pouch made from it was able to secure sufficient independence.
一方、比較例1においては、積層フィルムの厚みとループスティフネスの数値が本発明の範囲に無いため、作製したスタンディングパウチの自立性が不足していた。
比較例2においては、基材層として従来のOPETフィルムのみを用いているので、突き刺し強度や耐ピンホール性に劣っていた。また、ループスティフネスの数値が本発明の範囲を満たしていないので、スタンディングパウチとしての自立性も不足していた。
比較例3においては、基材層として従来のONyのみを用いているので、突き刺し強度や耐ピンホール性は良好なものの、ループスティフネスの数値が本発明の範囲を満たしていないので、スタンディングパウチとしての自立性が不足していた。
比較例4、6においては、基材層として従来のONyのみを用いているので、突き刺し強度や耐ピンホール性は良好であった。また、シーラント層の厚みを厚くしたことで、ループスティフネスの数値は高くなり、良好な自立性を有してた。しかし、基材フィルムが本発明とは異なるため、レトルト処理後の突き刺し強度が著しく低下する結果となった。
比較例5においては、シーラント層を厚くすることにより、ループスティフネスの数値は高く、スタンディングパウチの自立性は改善したが、基材層としてOPETを用いているので、突き刺し強度と耐ピンホール性に劣る結果となった。
On the other hand, in Comparative Example 1, since the thickness of the laminated film and the numerical values of the loop stiffness were out of the range of the present invention, the prepared standing pouch was insufficient in self-supporting property.
In Comparative Example 2, since only the conventional OPET film was used as the base material layer, the piercing strength and the pinhole resistance were poor. Further, since the numerical value of the loop stiffness does not satisfy the range of the present invention, the self-reliance as a standing pouch was insufficient.
In Comparative Example 3, since only the conventional ONy was used as the base material layer, although the piercing strength and the pinhole resistance were good, the loop stiffness value did not satisfy the range of the present invention, so that it was used as a standing pouch. Was lacking in independence.
In Comparative Examples 4 and 6, since only the conventional ONy was used as the base material layer, the puncture strength and the pinhole resistance were good. Further, by increasing the thickness of the sealant layer, the numerical value of the loop stiffness was increased, and it had good self-supporting property. However, since the base film is different from that of the present invention, the piercing strength after the retort treatment was significantly reduced.
In Comparative Example 5, by increasing the thickness of the sealant layer, the value of loop stiffness was high and the self-supporting property of the standing pouch was improved, but since OPET was used as the base material layer, the piercing strength and pinhole resistance were improved. The result was inferior.
参考例1~参考例4は、耐衝撃性や耐突き刺し性に優れ、且つレトルト処理など加熱処理にも耐えることができるOPETとONyを積層して基材フィルムに用いた場合の評価結果を示した。参考例と実施例を比較すると、実施例の本発明の積層フィルムは、基材層が1層であるにもかかわらず、基材層としてOPETとONyの2層を用いた積層フィルムを同等の性能を有していた。 Reference Examples 1 to 4 show the evaluation results when OPET and ONy, which are excellent in impact resistance and puncture resistance and can withstand heat treatment such as retort treatment, are used as a substrate film by laminating them. It was Comparing the reference example with the example, the laminated film of the present invention of the example is equivalent to the laminated film using two layers of OPET and ONy as the substrate layer, though the substrate layer is one layer. Had performance.
本発明によれば、包装材料の減量化が可能であり、耐破袋性に優れ、スタンディングパウチとして使用した際にも十分な自立性を確保することができる、レトルト食品などの液体包装に適した積層フィルムを得ることができる。
本発明により、湿熱処理を施した後でも、突き刺し強度に優れ、耐破袋性、耐屈曲性を有した積層フィルムを提供することができた。従来、OPETとONyを積層した基材フィルムを用いた積層フィルムで作製されていたスタンディングパウチなどの包装袋を1層の基材フィルムよりなる積層フィルムで作製できるようになるので、食品包装用材料として広く適用できる。
According to the present invention, it is possible to reduce the amount of packaging material, it is excellent in bag puncture resistance, and it is possible to secure sufficient independence even when used as a standing pouch, suitable for liquid packaging such as retort foods. Laminated film can be obtained.
INDUSTRIAL APPLICABILITY According to the present invention, it is possible to provide a laminated film having excellent puncture strength, bag puncture resistance, and bending resistance even after subjected to moist heat treatment. Conventionally, a packaging bag such as a standing pouch, which was conventionally made of a laminated film using a base film obtained by laminating OPET and ONy, can be made of a laminated film made of a single layer of the base film. Widely applicable as.
Claims (10)
(a)基材層がポリブチレンテレフタレートを70質量%以上含む厚み9μm~25μmの二軸延伸ポリエステルフィルムであり、
(b)ラミネート積層フィルムの突き刺し強度が9.0N以上であり、
(c)積層フィルムのループスティフネスの数値X(mN/25mm)が80以上であり、(e)総厚み59~160μmであることを特徴とする積層フィルム。 A laminated film comprising at least a base material layer and a sealant layer,
(A) the base material layer is a biaxially stretched polyester film having a thickness of 9 μm to 25 μm and containing 70% by mass or more of polybutylene terephthalate,
(B) The piercing strength of the laminated laminated film is 9.0 N or more,
(C) A laminated film characterized in that the numerical value X (mN / 25 mm) of loop stiffness of the laminated film is 80 or more, and (e) the total thickness is 59 to 160 μm.
1.8X ≦ Y ≦3.8X 式(1) The packaging bag according to claim 7, wherein the content Y (g) of the standing pouch satisfies the following formula (1), where X is a numerical value of the loop stiffness of the laminated film.
1.8X ≤ Y ≤ 3.8X Formula (1)
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| JP2019570586A JPWO2020080131A1 (en) | 2018-10-16 | 2019-10-04 | Laminated film |
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| JP2018195092 | 2018-10-16 | ||
| JP2018-195092 | 2018-10-16 |
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| Publication Number | Publication Date |
|---|---|
| WO2020080131A1 true WO2020080131A1 (en) | 2020-04-23 |
Family
ID=70283107
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| PCT/JP2019/039259 Ceased WO2020080131A1 (en) | 2018-10-16 | 2019-10-04 | Layered film |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JPWO2020080131A1 (en) |
| TW (1) | TW202019687A (en) |
| WO (1) | WO2020080131A1 (en) |
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPWO2020145254A1 (en) * | 2019-01-10 | 2021-11-25 | 東洋紡株式会社 | Laminated film |
| JP2021185093A (en) * | 2020-05-25 | 2021-12-09 | 凸版印刷株式会社 | Packaging bag |
| JP2023061529A (en) * | 2021-10-20 | 2023-05-02 | 東洋製罐株式会社 | Laminate film and packaging container |
| JP2023103333A (en) * | 2021-09-30 | 2023-07-26 | 東洋紡株式会社 | Multilayer film, multilayer body and package |
| JP2024041795A (en) * | 2018-03-28 | 2024-03-27 | 大日本印刷株式会社 | Packaging material and retort pouch or microwave pouch provided with packaging material |
| EP4439811A4 (en) * | 2021-12-24 | 2024-11-06 | LG Energy Solution, Ltd. | BAG FILM LAMINATE AND BATTERY CASING MADE THEREFROM |
| JP7673883B1 (en) * | 2023-07-19 | 2025-05-09 | Toppanホールディングス株式会社 | Laminate, packaging bag and packaging body |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH03155944A (en) * | 1989-11-15 | 1991-07-03 | Toray Ind Inc | Laminated polyester film |
| JP2016147715A (en) * | 2016-05-23 | 2016-08-18 | 凸版印刷株式会社 | Flexible package |
| WO2017126563A1 (en) * | 2016-01-22 | 2017-07-27 | 東洋紡株式会社 | Biaxially-stretched polyester film, laminate and packaging bag |
| WO2018052042A1 (en) * | 2016-09-15 | 2018-03-22 | 大日本印刷株式会社 | Pouch |
-
2019
- 2019-09-27 TW TW108135171A patent/TW202019687A/en unknown
- 2019-10-04 JP JP2019570586A patent/JPWO2020080131A1/en active Pending
- 2019-10-04 WO PCT/JP2019/039259 patent/WO2020080131A1/en not_active Ceased
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH03155944A (en) * | 1989-11-15 | 1991-07-03 | Toray Ind Inc | Laminated polyester film |
| WO2017126563A1 (en) * | 2016-01-22 | 2017-07-27 | 東洋紡株式会社 | Biaxially-stretched polyester film, laminate and packaging bag |
| JP2016147715A (en) * | 2016-05-23 | 2016-08-18 | 凸版印刷株式会社 | Flexible package |
| WO2018052042A1 (en) * | 2016-09-15 | 2018-03-22 | 大日本印刷株式会社 | Pouch |
Cited By (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2024041795A (en) * | 2018-03-28 | 2024-03-27 | 大日本印刷株式会社 | Packaging material and retort pouch or microwave pouch provided with packaging material |
| JPWO2020145254A1 (en) * | 2019-01-10 | 2021-11-25 | 東洋紡株式会社 | Laminated film |
| JP7574646B2 (en) | 2019-01-10 | 2024-10-29 | 東洋紡株式会社 | Laminated Film |
| JP2021185093A (en) * | 2020-05-25 | 2021-12-09 | 凸版印刷株式会社 | Packaging bag |
| JP7567203B2 (en) | 2020-05-25 | 2024-10-16 | Toppanホールディングス株式会社 | Packaging Bag |
| JP2023103333A (en) * | 2021-09-30 | 2023-07-26 | 東洋紡株式会社 | Multilayer film, multilayer body and package |
| JP7468747B2 (en) | 2021-09-30 | 2024-04-16 | 東洋紡株式会社 | Laminated film, laminate and packaging material |
| JP2023061529A (en) * | 2021-10-20 | 2023-05-02 | 東洋製罐株式会社 | Laminate film and packaging container |
| JP7727482B2 (en) | 2021-10-20 | 2025-08-21 | 東洋製罐株式会社 | Laminated films and packaging containers |
| EP4439811A4 (en) * | 2021-12-24 | 2024-11-06 | LG Energy Solution, Ltd. | BAG FILM LAMINATE AND BATTERY CASING MADE THEREFROM |
| JP7673883B1 (en) * | 2023-07-19 | 2025-05-09 | Toppanホールディングス株式会社 | Laminate, packaging bag and packaging body |
Also Published As
| Publication number | Publication date |
|---|---|
| JPWO2020080131A1 (en) | 2021-02-15 |
| TW202019687A (en) | 2020-06-01 |
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