[go: up one dir, main page]

WO2019235025A1 - Proton conductor and electrochemical device using same - Google Patents

Proton conductor and electrochemical device using same Download PDF

Info

Publication number
WO2019235025A1
WO2019235025A1 PCT/JP2019/011686 JP2019011686W WO2019235025A1 WO 2019235025 A1 WO2019235025 A1 WO 2019235025A1 JP 2019011686 W JP2019011686 W JP 2019011686W WO 2019235025 A1 WO2019235025 A1 WO 2019235025A1
Authority
WO
WIPO (PCT)
Prior art keywords
proton conductor
metal oxide
proton
atomic
electrochemical device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/JP2019/011686
Other languages
French (fr)
Japanese (ja)
Inventor
東麟 韓
哲也 宇田
陽平 野田
真嶋 正利
博匡 俵山
光靖 小川
千尋 平岩
孝浩 東野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Electric Industries Ltd
Kyoto University NUC
Original Assignee
Sumitomo Electric Industries Ltd
Kyoto University NUC
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Electric Industries Ltd, Kyoto University NUC filed Critical Sumitomo Electric Industries Ltd
Priority to JP2020523528A priority Critical patent/JP7167145B2/en
Publication of WO2019235025A1 publication Critical patent/WO2019235025A1/en
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Images

Classifications

    • CCHEMISTRY; METALLURGY
    • C04CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04BLIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B35/00Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
    • CCHEMISTRY; METALLURGY
    • C04CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04BLIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B35/00Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
    • C04B35/01Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics
    • C04B35/48Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on zirconium or hafnium oxides, zirconates, zircon or hafnates
    • CCHEMISTRY; METALLURGY
    • C04CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04BLIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B35/00Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
    • C04B35/50Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on rare-earth compounds
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01BCABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B1/00Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
    • H01B1/06Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors mainly consisting of other non-metallic substances
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01BCABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B1/00Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
    • H01B1/06Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors mainly consisting of other non-metallic substances
    • H01B1/08Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors mainly consisting of other non-metallic substances oxides
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E60/00Enabling technologies; Technologies with a potential or indirect contribution to GHG emissions mitigation
    • Y02E60/30Hydrogen technology
    • Y02E60/50Fuel cells

Definitions

  • the present invention relates to a proton conductor and an electrochemical device using the proton conductor.
  • a metal oxide having a perovskite structure is expected to be used in various applications because it exhibits good proton conductivity in a temperature range of 700 ° C. or lower.
  • a metal oxide having a perovskite structure for example, BZY (BaZr 0.8 Y 0.2 O 2.9 ) is known.
  • BZY has low sinterability. Therefore, in order to form BZY powder, it is usually necessary to fire at a high temperature of 1600 ° C. or more for 20 hours or more. At this time, Ba contained in BZY is easily evaporated as BaO. When BaO evaporates, Y 2 O 3 precipitates from BZY, and proton conductivity decreases.
  • the proton conductor according to one aspect of the present invention has a perovskite structure and has the following formula (1): A x B 1-y M y O 3- ⁇ (1) (However, the element A is at least one selected from the group consisting of Ba, Ca and Sr, the element B is at least one selected from the group consisting of Ce and Zr, and the element M is Y, Yb , Er, Ho, Tm, Gd, In, and Sc, satisfying 0.95 ⁇ x ⁇ 1, 0 ⁇ y ⁇ 0.5, and ⁇ is the amount of oxygen deficiency.
  • a proton conductor comprising: a metal oxide represented by :) and a copper element contained in the metal oxide, Ratio of copper element to total amount of element A, element B and element M: R Cu is 0.01 atomic% or more and 0.6 atomic% or less.
  • An electrochemical device is an electrochemical device comprising: a container having an internal space that forms a reducing atmosphere; and a proton conductor disposed in the internal space of the container,
  • the proton conductor has a perovskite structure and has the following formula (1): A x B 1-y M y O 3- ⁇ (1)
  • the element A is at least one selected from the group consisting of Ba, Ca and Sr
  • the element B is at least one selected from the group consisting of Ce and Zr
  • the element M is Y, Yb , Er, Ho, Tm, Gd, In, and Sc, satisfying 0.95 ⁇ x ⁇ 1, 0 ⁇ y ⁇ 0.5
  • is the amount of oxygen deficiency.
  • a copper element contained in the metal oxide is the amount of oxygen deficiency.
  • FIG. 1 is a cross-sectional view schematically showing an example of an electrochemical device according to an embodiment of the present invention.
  • FIG. 2 is a diagram showing the relationship between the proportion of Ni, Cu or Zn contained in the proton conductor according to one embodiment of the present invention and the proton conductivity (total conductivity) at 500 ° C. in a reducing atmosphere. is there.
  • FIG. 3 is a diagram showing the relationship between the ratio of Ni, Cu or Zn contained in the proton conductor according to one embodiment of the present invention and proton conductivity (total conductivity) at 600 ° C. in a reducing atmosphere. is there.
  • FIG. 1 is a cross-sectional view schematically showing an example of an electrochemical device according to an embodiment of the present invention.
  • FIG. 2 is a diagram showing the relationship between the proportion of Ni, Cu or Zn contained in the proton conductor according to one embodiment of the present invention and the proton conductivity (total conductivity) at 500 ° C. in a reducing atmosphere. is
  • FIG. 4 is a diagram showing the relationship between the proportion of Ni, Cu or Zn contained in the proton conductor according to one embodiment of the present invention and proton conductivity (total conductivity) at 700 ° C. in a reducing atmosphere. is there.
  • FIG. 5 is a diagram showing the relationship between the proportion of Ni, Cu or Zn contained in the proton conductor according to one embodiment of the present invention and proton conductivity (bulk conductivity) at 300 ° C. in a reducing atmosphere. is there.
  • FIG. 6 is a graph showing the relationship between the ratio of Ni, Cu or Zn contained in the proton conductor according to one embodiment of the present invention and proton conductivity (total conductivity) at 700 ° C. in an oxidizing atmosphere. is there.
  • the sintering aid for example, NiO, CuO, ZnO and the like are known. When these sintering aids are used, BZY can be fired at a temperature of less than 1600 ° C., for example. On the other hand, the addition of a sintering aid may decrease the proton conductivity of the obtained sintered body.
  • the proton conductor according to the present disclosure has excellent proton conductivity and sinterability.
  • a proton conductor according to an embodiment of the present invention has a perovskite structure, and has the formula (1): A x B 1-y M y O 3- ⁇ (wherein element A is Ba, At least one selected from the group consisting of Ca and Sr, the element B is at least one selected from the group consisting of Ce and Zr, and the element M is Y, Yb, Er, Ho, Tm, Gd, A metal oxide represented by at least one selected from the group consisting of In and Sc, 0.95 ⁇ x ⁇ 1, 0 ⁇ y ⁇ 0.5, and ⁇ is the amount of oxygen deficiency) And a copper conductor contained in the metal oxide, the ratio of the copper element to the total amount of the element A, the element B and the element M: R Cu is 0.01 atomic% As mentioned above, it is 0.6 atomic% or less.
  • This proton conductor has excellent proton conductivity and sinterability.
  • the ratio of the copper element: R Cu may be 0.15 atomic% or more and 0.4 atomic% or less. Thereby, proton conductivity further increases.
  • the element A may include Ba
  • the element B may include Zr
  • the element M may include Y. Even if it is a metal oxide containing Zr, the sinterability is improved.
  • An electrochemical device is an electrochemical device comprising: a container having an internal space forming a reducing atmosphere; and a proton conductor disposed in the internal space of the container.
  • the proton conductor has a perovskite structure and has the formula (1): A x B 1-y M y O 3- ⁇ (wherein the element A is selected from the group consisting of Ba, Ca, and Sr). At least one selected, element B is at least one selected from the group consisting of Ce and Zr, and element M is from the group consisting of Y, Yb, Er, Ho, Tm, Gd, In, and Sc. At least one selected, satisfying 0.95 ⁇ x ⁇ 1, 0 ⁇ y ⁇ 0.5, and ⁇ is an oxygen deficiency amount) in the metal oxide Containing copper element According to this electrochemical device, the electrochemical reaction proceeds rapidly.
  • the ratio of the copper element to the total amount of the element A, the element B and the element M: R Cu is 0.01 atomic% or more, 0.6 It may be at most atomic%.
  • the proton conductor includes a metal oxide having a perovskite structure (ABO 3 phase) and a copper element contained in the metal oxide.
  • the metal oxide is represented by the formula (1): A x B 1-y M y O 3- ⁇ .
  • the element A enters the A site and the element B (not indicating boron) enters the B site.
  • a part of the B site is substituted with the element M from the viewpoint of ensuring high proton conductivity.
  • the ratio x of the element A to the total of the elements B and M is preferably 0.95 ⁇ x ⁇ 1 from the viewpoint of ensuring high proton conductivity and ion transport number, and 0.98 ⁇ x ⁇ 1. More preferably.
  • y is preferably 0 ⁇ y ⁇ 0.5, and more preferably 0.1 ⁇ y ⁇ 0.3.
  • Element A is at least one selected from the group consisting of Ba (barium), Ca (calcium), and Sr (strontium). Especially, it is preferable that the element A contains Ba by the point from which the outstanding proton conductivity is obtained, and it is preferable that the ratio of Ba to the element A is 50 atomic% or more, and is 80 atomic% or more. Is more preferable. More preferably, the element A is composed only of Ba.
  • Element B is at least one selected from the group consisting of Ce (cerium) and Zr (zirconium).
  • the element B preferably contains Zr, and the proportion of Zr in the element B is preferably 50 atomic% or more, and more preferably 80 atomic% or more. More preferably, the element B is composed only of Zr.
  • the metal oxide containing Zr has particularly low sinterability, according to this embodiment, the sinterability can be improved.
  • the element M is selected from the group consisting of Y (yttrium), Yb (ytterbium), Er (erbium), Ho (holmium), Tm (thulium), Gd (gadolinium), In (indium), and Sc (scandium). At least one kind.
  • the element M is a dopant, which causes oxygen defects, and the metal oxide having a perovskite structure exhibits proton conductivity.
  • the oxygen deficiency amount ⁇ can be determined according to the amount of the element M, for example, 0 ⁇ ⁇ ⁇ 0.15.
  • the ratio of each element in the metal oxide can be determined using, for example, a high-frequency inductively coupled plasma emission spectroscopy (hereinafter referred to as ICP).
  • metal oxides having a perovskite structure include barium zirconate doped with yttrium [Ba x Zr 1-y Y y O 3- ⁇ (hereinafter referred to as BZY)], cerium doped with yttrium.
  • BZY barium zirconate doped with yttrium
  • BZCY cerium doped with yttrium.
  • the sintering aid a material having a melting point lower than that of the metal oxide to be sintered and hardly reacting with the metal oxide is used. During firing, the sintering aid melts to form a liquid phase between the metal oxide powders. This liquid phase fills the gaps in the metal oxide powder and densifies, whereby the sintering proceeds quickly. On the other hand, when the sintering aid is interposed between the metal oxide powders, the proton conductivity of the obtained sintered body tends to decrease.
  • the proton conductivity of the sintered body can be improved while improving the sinterability.
  • the proton conductor according to the present embodiment is obtained based on this finding.
  • Sinterability is the ease of sintering, and the firing temperature and firing time necessary to sinter the material are indicators thereof. For example, the lower the firing temperature and the shorter the firing time, the higher the sinterability. When the sinterability is high, firing proceeds at a low temperature in a short time, and thus evaporation of the element A contained in the metal oxide is suppressed. That is, the improvement of sinterability also contributes to the improvement of proton conductivity.
  • a sintering aid containing Cu is added to a metal oxide having a perovskite structure represented by the above formula (1) (hereinafter simply referred to as a metal oxide). It is a sintered body obtained by firing the molded product molded in this manner.
  • the sintering aid containing Cu is blended so that the ratio of Cu element contained in the proton conductor: R Cu is 0.01 atomic% or more and 0.6 atomic% or less.
  • R Cu is 0.01 atomic% or more and 0.6 atomic% or less.
  • the molded product is sintered at a low temperature for a short time, and the obtained proton conductor has excellent proton conductivity.
  • An example of the sintering aid containing Cu is CuO.
  • the resulting sintered bodies when adding NiO, CuO, and ZnO to the metal oxide as sintering aids, the resulting sintered bodies contain Ni, Cu, and Zn, respectively.
  • the proton conductivity of the sintered body containing Cu is the highest.
  • the proton conductor containing Cu of the present embodiment (hereinafter referred to as Cu proton conductor) can exhibit excellent proton conductivity even under conditions of about 300 ° C., for example.
  • the proton conductivity of the Cu proton conductor is high even at low temperatures.
  • the Cu proton conductor exhibits excellent proton conductivity regardless of the measurement temperature.
  • the reducing atmosphere is a case where the oxygen partial pressure in the reaction field is less than the equilibrium oxygen partial pressure P O2 of Cu 2 O at the operating temperature of the electrochemical device.
  • the oxygen partial pressure in the reaction field at 500 ° C. is smaller than the equilibrium oxygen partial pressure P O2 : 2.88 ⁇ 10 ⁇ 8 atm, the reducing atmosphere is assumed.
  • the Cu proton conductor According to Cu proton conductor, high proton conductivity is exhibited even in an oxidizing atmosphere. That is, regardless of the operating atmosphere, the Cu proton conductor can exhibit excellent proton conductivity. In particular, when operated at a relatively high temperature of about 700 ° C., the proton conductivity of the Cu proton conductor is high even in an oxidizing atmosphere.
  • R Cu is 0.01 atomic% or more and 0.6 atomic% or less.
  • R Cu may be 0.1 atomic% or more, or 0.15 atomic% or more. Further, R Cu may be 0.4 atomic% or less.
  • Wavelength dispersive X-ray analysis using an electron probe microanalyzer WDX Widelength Dispersive X-ray spectroscopy
  • XPS X-ray Photoelectron Spectroscopy
  • ESCA Electron Spectroscopy Spectroscopy
  • the Cu proton conductor can be obtained, for example, by forming a raw material containing a metal oxide powder and a CuO powder into a desired shape and then firing it.
  • the CuO powder is added in an amount of 0.1% by mass to 5% by mass with respect to the total amount of the metal oxide and CuO, for example.
  • the raw material preferably contains a binder from the viewpoint of moldability.
  • a binder known materials used for the production of ceramic materials, for example, cellulose derivatives such as ethyl cellulose (cellulose ether and the like), vinyl acetate resins (including saponified vinyl acetate resins such as provinyl alcohol), Examples thereof include polymer binders such as acrylic resins; waxes such as paraffin wax.
  • the amount of the binder is, for example, 1 to 20 parts by mass, particularly 1.5 to 15 parts by mass with respect to 100 parts by mass of the metal oxide.
  • the raw material may contain a dispersion medium such as water and an organic solvent (for example, hydrocarbon such as toluene; alcohol such as ethanol and isopropanol; carbitol such as butyl carbitol acetate) as necessary.
  • the raw material may contain various additives such as a surfactant and a peptizer (polycarboxylic acid or the like) as necessary.
  • the forming method is not particularly limited, and may be appropriately selected according to a desired shape.
  • the flat proton conductor can be formed using existing methods such as press molding, tape molding, screen printing, spray coating, spin coating, dip coating, and the like.
  • Calcination is performed by heating the obtained molded product in an oxygen-containing atmosphere.
  • the firing temperature of the molded product to which CuO is added may be, for example, less than 1600 ° C. or 1500 ° C. or less.
  • the firing time may be, for example, 20 hours or less, 15 hours or less, and 10 hours or less.
  • the oxygen content in the firing atmosphere is not particularly limited. Firing may be performed, for example, in an air atmosphere (oxygen content: about 20% by volume) or in pure oxygen (oxygen content: 100% by volume). Firing can be performed under normal pressure or under pressure.
  • the Cu proton conductor exhibits particularly excellent proton conductivity when used under specific conditions regardless of the Cu element ratio: R Cu .
  • the proton conductivity in the reducing atmosphere of the Cu proton conductor is compared with the proton conductivity in the reducing atmosphere of the proton conductor obtained by sintering only the metal oxide without adding a sintering aid. Not inferior.
  • the electrochemical device according to the present embodiment is based on this finding.
  • the electrochemical device includes a container having an internal space that forms a reducing atmosphere, and a Cu proton conductor disposed in the internal space of the container.
  • An electrochemical device is an apparatus that exchanges electrons between substances and causes a chemical reaction by the exchange of electrons.
  • the electrochemical device include a hydrogen separation device, a hydrogen pump, and a gas decomposition device.
  • the container is a reaction field where an electrochemical reaction occurs, and a reducing atmosphere is formed in the inner space of the container. If the internal space is a reducing atmosphere, the details are unknown, but the proton conductivity of the Cu proton conductor disposed in the internal space is improved, and the electrochemical reaction proceeds rapidly.
  • the operating condition of the electrochemical device may be 300 ° C. or higher, 500 ° C. or higher, 600 ° C. or higher, or 700 ° C. or higher.
  • the proton conductivity of the proton conductor generally improves as the operating temperature increases.
  • the Cu proton conductor exhibits excellent proton conductivity in a reducing atmosphere even at a relatively low temperature of about 300 ° C.
  • FIG. 1 is a cross-sectional view schematically showing an example of an electrochemical device according to this embodiment.
  • the electrochemical device 10 includes a container 4 and a Cu proton conductor 1 disposed in the internal space of the container 4. A reducing atmosphere is formed in the internal space.
  • Cu proton conductor 1 is sandwiched between, for example, a pair of electrodes (anode 2 and cathode 3).
  • the internal space of the container 4 is separated by the Cu proton conductor 1 into a space S1 on the anode 2 side and a space S2 on the cathode 3 side.
  • a gas containing hydrogen atoms (first gas G1) is supplied from the first supply port 4a to the space S1.
  • Protons are generated from the first gas G1 by an electrochemical reaction, and a second gas G2 (for example, hydrogen gas) is generated in the space S2.
  • the second gas G2 is discharged from the container 4 through the discharge port 4b.
  • the container 4 includes a second supply port 4c that supplies the third gas G3 to the space S2 as necessary.
  • the anode 2 undergoes a reaction that releases protons and electrons.
  • the released protons move from the first main surface of the Cu proton conductor 1 in contact with the anode 2 to the second main surface of the Cu proton conductor 1 in contact with the cathode 3.
  • Protons receive electrons again on the second main surface side and are discharged from the cathode 3 as hydrogen gas.
  • protons can react with the third gas G3 supplied to the cathode 3 to generate a new compound.
  • the hydrogen gas discharged from the cathode 3 can react with the third gas G3 supplied to the space S2 to generate a new compound. That is, the Cu proton conductor 1 can function as a membrane reactor.
  • At least the space on the anode side may be a reducing atmosphere.
  • the hydrogen separator separates and extracts hydrogen gas from a mixed gas containing hydrogen gas.
  • a voltage is applied between the anode 2 and the cathode 3 and a first gas G1 containing hydrogen gas is supplied to the space S1.
  • the first gas G1 comes into contact with the anode 2, and the hydrogen gas contained in the first gas G1 is decomposed at the anode 2. This produces protons and electrons. Protons that have moved through the Cu proton conductor 1 receive electrons from the cathode 3 and are isolated as pure hydrogen gas.
  • the anode has, for example, a proton conductive porous structure.
  • the material of the anode is not particularly limited.
  • the anode may be composed of, for example, a sintered body of the above metal oxide, or may be a platinum electrode.
  • the cathode has, for example, an ion conductive porous structure.
  • the material of the cathode is not particularly limited, and may be appropriately selected depending on the application.
  • the cathode may be an electrode made of, for example, platinum or an ion conductive oxide.
  • Example 1 to 4 (1) Production of Metal Oxide (BaZr 0.8 Y 0.2 O 2.9 ) Barium carbonate, zirconium oxide, and yttrium oxide, Ba ratio x is 1, Y ratio y is 0.2. In such a molar ratio, each was placed in a ball mill and mixed for 24 hours to obtain a mixture. The obtained mixture was calcined at 1000 ° C. for 10 hours. The pre-fired mixture was treated with a ball mill for 10 hours and uniaxially molded, and then fired at 1300 ° C. for 10 hours in an air atmosphere. The fired sample was pulverized with a mortar and then treated with a ball mill for 10 hours to obtain a metal oxide.
  • Metal Oxide BaZr 0.8 Y 0.2 O 2.9
  • Sintered bodies b1 to b4 were manufactured in the same manner as in Examples 1 to 4 except that NiO was added instead of CuO in “Preparation of sintered body and sample electrode (2)”.
  • the ratio of Ni contained in each of the sintered bodies b1 to b4 was about 0.39 at%, about 0.68 at%, about 1.25 at%, and about 2.13 at%, respectively.
  • Sintered bodies c1 to c4 were manufactured in the same manner as in Examples 1 to 4, except that ZnO was added instead of CuO in “Preparation of sintered body and sample electrode (2)”.
  • the ratio of Zn contained in each of the sintered bodies c1 to c4 was about 0.24 at%, about 0.52 at%, about 0.69 at%, and about 0.82 at%, respectively.
  • the proton conductor according to the embodiment of the present invention is excellent in sinterability and proton conductivity, it is suitable for various electrochemical devices.
  • Electrochemical device 1 Cu proton conductor 2: Anode 3: Cathode 4: Container 4a: First supply port 4b: Discharge port 4c: Second supply port

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Ceramic Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Materials Engineering (AREA)
  • Structural Engineering (AREA)
  • Organic Chemistry (AREA)
  • Composite Materials (AREA)
  • Conductive Materials (AREA)
  • Fuel Cell (AREA)

Abstract

A proton conductor which has a perovskite structure, and which contains a metal oxide represented by formula (1) AxB1-yMyO3-δ (wherein element A represents at least one element that is selected from the group consisting of Ba, Ca and Sr; element B represents at least one element that is selected from the group consisting of Ce and Zr; element M represents at least one element that is selected from the group consisting of Y, Yb, Er, Ho, Tm, Gd, In and Sc; x and y satisfy 0.95 ≤ x ≤ 1 and 0 < y ≤ 0.5; and δ represents the amount of oxygen deficiency) and elemental copper contained in the metal oxide. With respect to this proton conductor, the ratio of the elemental copper RCu to the total amount of the element A, the element B and the element M is from 0.01% by atom to 0.6% by atom (inclusive).

Description

プロトン伝導体およびそれを用いた電気化学デバイスProton conductor and electrochemical device using the same

 本発明は、プロトン伝導体およびそれを用いた電気化学デバイスに関する。
 本出願は、2018年6月5日出願の日本出願第2018-107909号に基づく優先権を主張し、前記日本出願に記載された全ての記載内容を援用するものである。
The present invention relates to a proton conductor and an electrochemical device using the proton conductor.
This application claims priority based on Japanese Patent Application No. 2018-107909 filed on Jun. 5, 2018, and incorporates all the description content described in the above Japanese application.

 ペロブスカイト型構造を有する金属酸化物は、700℃以下の温度域において良好なプロトン伝導性を示すことから、様々な用途に用いられることが期待されている。ペロブスカイト型構造を有する金属酸化物としては、例えば、BZY(BaZr0.80.22.9)が知られている。しかし、BZYは焼結性が低い。そのため、BZYの粉末を形成するには、通常、1600℃以上の高温で20時間以上、焼成する必要がある。このとき、BZYに含まれるBaは、BaOとなって蒸発し易い。BaOが蒸発すると、BZYからYが析出し、プロトン伝導性が低下する。 A metal oxide having a perovskite structure is expected to be used in various applications because it exhibits good proton conductivity in a temperature range of 700 ° C. or lower. As a metal oxide having a perovskite structure, for example, BZY (BaZr 0.8 Y 0.2 O 2.9 ) is known. However, BZY has low sinterability. Therefore, in order to form BZY powder, it is usually necessary to fire at a high temperature of 1600 ° C. or more for 20 hours or more. At this time, Ba contained in BZY is easily evaporated as BaO. When BaO evaporates, Y 2 O 3 precipitates from BZY, and proton conductivity decreases.

 そこで、焼成の際、BZYの成形物を、BaCOとBZYとの混合粉末に埋めることが行われている。また、BZYの粉末に焼結助剤を添加した後、粉末を成形して、この成形物を焼成する方法が提案されている(特許文献1および2、非特許文献1および2)。 Therefore, at the time of firing, a BZY molded product is buried in a mixed powder of BaCO 3 and BZY. In addition, a method has been proposed in which a sintering aid is added to a BZY powder, the powder is molded, and the molded product is fired (Patent Documents 1 and 2, Non-Patent Documents 1 and 2).

米国特許出願公開第2007/0278092号明細書US Patent Application Publication No. 2007/0278092 国際公開第2005/093130号明細書International Publication No. 2005/093130 Specification

Nikodemski, et al. “Solid-state reactive sintering mechanism for proton conducting ceramics” Solid State Ionics, 253 (2013) 201-210Nikodemski, et al. “Solid-state reactive sintering mechanism for proton conducting ceramics” Solid State Ionics, 253 (2013) 201-210 Sung Min Choi, et al. “Determination of proton transference number of Ba(Zr0.84Y0.15Cu0.01)O3-δ via electrochemical concentration cell test”, J Solid State Electrochem, (2013) 17:2833-2838Sung Min Choi, et al. “Determination of proton transference number of Ba (Zr0.84Y0.15Cu0.01) O3-δ via electrochemical concentration cell test”, J Solid State Electrochem, (2013) 17: 2833-2838

 本発明の一局面に係るプロトン伝導体は、ペロブスカイト型構造を有し、かつ下記式(1):
 A1-y3-δ     (1)
(ただし、元素Aは、Ba、CaおよびSrよりなる群から選択される少なくとも一種であり、元素Bは、CeおよびZrよりなる群から選択される少なくとも一種であり、元素Mは、Y、Yb、Er、Ho、Tm、Gd、InおよびScよりなる群から選択される少なくとも一種であり、0.95≦x≦1、0<y≦0.5を満たし、δは酸素欠損量である。)で表される金属酸化物と、前記金属酸化物中に含まれる銅元素と、を含むプロトン伝導体であって、
 前記元素A、前記元素Bおよび前記元素Mの総量に対する銅元素の割合:RCuは、0.01原子%以上、0.6原子%以下である。
The proton conductor according to one aspect of the present invention has a perovskite structure and has the following formula (1):
A x B 1-y M y O 3-δ (1)
(However, the element A is at least one selected from the group consisting of Ba, Ca and Sr, the element B is at least one selected from the group consisting of Ce and Zr, and the element M is Y, Yb , Er, Ho, Tm, Gd, In, and Sc, satisfying 0.95 ≦ x ≦ 1, 0 <y ≦ 0.5, and δ is the amount of oxygen deficiency. A proton conductor comprising: a metal oxide represented by :) and a copper element contained in the metal oxide,
Ratio of copper element to total amount of element A, element B and element M: R Cu is 0.01 atomic% or more and 0.6 atomic% or less.

 本発明の他の局面に係る電気化学デバイスは、還元雰囲気を形成する内部空間を有する容器と、前記容器の前記内部空間に配置されるプロトン伝導体と、を備える、電気化学デバイスであって、
 前記プロトン伝導体は、ペロブスカイト型構造を有し、かつ下記式(1):
 A1-y3-δ     (1)
(ただし、元素Aは、Ba、CaおよびSrよりなる群から選択される少なくとも一種であり、元素Bは、CeおよびZrよりなる群から選択される少なくとも一種であり、元素Mは、Y、Yb、Er、Ho、Tm、Gd、InおよびScよりなる群から選択される少なくとも一種であり、0.95≦x≦1、0<y≦0.5を満たし、δは酸素欠損量である。)で表される金属酸化物と、前記金属酸化物中に含まれる銅元素と、を含む。
An electrochemical device according to another aspect of the present invention is an electrochemical device comprising: a container having an internal space that forms a reducing atmosphere; and a proton conductor disposed in the internal space of the container,
The proton conductor has a perovskite structure and has the following formula (1):
A x B 1-y M y O 3-δ (1)
(However, the element A is at least one selected from the group consisting of Ba, Ca and Sr, the element B is at least one selected from the group consisting of Ce and Zr, and the element M is Y, Yb , Er, Ho, Tm, Gd, In, and Sc, satisfying 0.95 ≦ x ≦ 1, 0 <y ≦ 0.5, and δ is the amount of oxygen deficiency. And a copper element contained in the metal oxide.

図1は、本発明の一実施形態に係る電気化学デバイスの一例を模式的に示す断面図である。FIG. 1 is a cross-sectional view schematically showing an example of an electrochemical device according to an embodiment of the present invention. 図2は、本発明の一実施形態に係るプロトン伝導体に含まれるNi、CuあるいはZnの割合と、還元雰囲気下、500℃でのプロトン伝導度(全伝導度)との関係を示す図である。FIG. 2 is a diagram showing the relationship between the proportion of Ni, Cu or Zn contained in the proton conductor according to one embodiment of the present invention and the proton conductivity (total conductivity) at 500 ° C. in a reducing atmosphere. is there. 図3は、本発明の一実施形態に係るプロトン伝導体に含まれるNi、CuあるいはZnの割合と、還元雰囲気下、600℃でのプロトン伝導度(全伝導度)との関係を示す図である。FIG. 3 is a diagram showing the relationship between the ratio of Ni, Cu or Zn contained in the proton conductor according to one embodiment of the present invention and proton conductivity (total conductivity) at 600 ° C. in a reducing atmosphere. is there. 図4は、本発明の一実施形態に係るプロトン伝導体に含まれるNi、CuあるいはZnの割合と、還元雰囲気下、700℃でのプロトン伝導度(全伝導度)との関係を示す図である。FIG. 4 is a diagram showing the relationship between the proportion of Ni, Cu or Zn contained in the proton conductor according to one embodiment of the present invention and proton conductivity (total conductivity) at 700 ° C. in a reducing atmosphere. is there. 図5は、本発明の一実施形態に係るプロトン伝導体に含まれるNi、CuあるいはZnの割合と、還元雰囲気下、300℃でのプロトン伝導度(バルク伝導度)との関係を示す図である。FIG. 5 is a diagram showing the relationship between the proportion of Ni, Cu or Zn contained in the proton conductor according to one embodiment of the present invention and proton conductivity (bulk conductivity) at 300 ° C. in a reducing atmosphere. is there. 図6は、本発明の一実施形態に係るプロトン伝導体に含まれるNi、CuあるいはZnの割合と、酸化雰囲気下、700℃でのプロトン伝導度(全伝導度)との関係を示す図である。FIG. 6 is a graph showing the relationship between the ratio of Ni, Cu or Zn contained in the proton conductor according to one embodiment of the present invention and proton conductivity (total conductivity) at 700 ° C. in an oxidizing atmosphere. is there.

[本開示が解決しようとする課題]
 焼結助剤としては、例えば、NiO、CuO、ZnO等が知られている。これら焼結助剤を使用すると、BZYは、例えば、1600℃未満の温度でも焼成可能である。一方、焼結助剤の添加によって、得られる焼結体のプロトン伝導性が低下する場合がある。
[Problems to be solved by the present disclosure]
As the sintering aid, for example, NiO, CuO, ZnO and the like are known. When these sintering aids are used, BZY can be fired at a temperature of less than 1600 ° C., for example. On the other hand, the addition of a sintering aid may decrease the proton conductivity of the obtained sintered body.

[本開示の効果]
 本開示に係るプロトン伝導体は、優れたプロトン伝導性および焼結性を有する。
[Effects of the present disclosure]
The proton conductor according to the present disclosure has excellent proton conductivity and sinterability.

[実施形態の説明]
 最初に本発明の実施形態を列記して説明する。
(1)本発明の一実施形態に係るプロトン伝導体は、ペロブスカイト型構造を有し、かつ式(1):A1-y3-δ(ただし、元素Aは、Ba、CaおよびSrよりなる群から選択される少なくとも一種であり、元素Bは、CeおよびZrよりなる群から選択される少なくとも一種であり、元素Mは、Y、Yb、Er、Ho、Tm、Gd、InおよびScよりなる群から選択される少なくとも一種であり、0.95≦x≦1、0<y≦0.5を満たし、δは酸素欠損量である。)で表される金属酸化物と、前記金属酸化物中に含まれる銅元素と、を含むプロトン伝導体であって、前記元素A、前記元素Bおよび前記元素Mの総量に対する銅元素の割合:RCuは、0.01原子%以上、0.6原子%以下である。このプロトン伝導体は、優れたプロトン伝導性および焼結性を有する。
[Description of Embodiment]
First, embodiments of the present invention will be listed and described.
(1) A proton conductor according to an embodiment of the present invention has a perovskite structure, and has the formula (1): A x B 1-y M y O 3-δ (wherein element A is Ba, At least one selected from the group consisting of Ca and Sr, the element B is at least one selected from the group consisting of Ce and Zr, and the element M is Y, Yb, Er, Ho, Tm, Gd, A metal oxide represented by at least one selected from the group consisting of In and Sc, 0.95 ≦ x ≦ 1, 0 <y ≦ 0.5, and δ is the amount of oxygen deficiency) And a copper conductor contained in the metal oxide, the ratio of the copper element to the total amount of the element A, the element B and the element M: R Cu is 0.01 atomic% As mentioned above, it is 0.6 atomic% or less. This proton conductor has excellent proton conductivity and sinterability.

(2)また、前述の(1)のプロトン伝導体においては、前記銅元素の割合:RCuは、0.15原子%以上、0.4原子%以下であってもよい。これにより、プロトン伝導性はさらに高まる。 (2) Further, in the proton conductor of (1) described above, the ratio of the copper element: R Cu may be 0.15 atomic% or more and 0.4 atomic% or less. Thereby, proton conductivity further increases.

(3)また、前述の(1)又は(2)のプロトン伝導体においては、元素AはBaを含み、元素BはZrを含み、元素MはYを含んでもよい。Zrを含む金属酸化物であっても、焼結性は向上する。 (3) In the proton conductor of (1) or (2) described above, the element A may include Ba, the element B may include Zr, and the element M may include Y. Even if it is a metal oxide containing Zr, the sinterability is improved.

(4)本発明の一実施形態に係る電気化学デバイスは、還元雰囲気を形成する内部空間を有する容器と、前記容器の前記内部空間に配置されるプロトン伝導体と、を備える、電気化学デバイスであって、前記プロトン伝導体は、ペロブスカイト型構造を有し、かつ式(1):A1-y3-δ(ただし、元素Aは、Ba、CaおよびSrよりなる群から選択される少なくとも一種であり、元素Bは、CeおよびZrよりなる群から選択される少なくとも一種であり、元素Mは、Y、Yb、Er、Ho、Tm、Gd、InおよびScよりなる群から選択される少なくとも一種であり、0.95≦x≦1、0<y≦0.5を満たし、δは酸素欠損量である。)で表される金属酸化物と、前記金属酸化物中に含まれる銅元素と、を含む。この電気化学デバイスによれば、電気化学的反応が速やかに進行する。 (4) An electrochemical device according to an embodiment of the present invention is an electrochemical device comprising: a container having an internal space forming a reducing atmosphere; and a proton conductor disposed in the internal space of the container. The proton conductor has a perovskite structure and has the formula (1): A x B 1-y M y O 3-δ (wherein the element A is selected from the group consisting of Ba, Ca, and Sr). At least one selected, element B is at least one selected from the group consisting of Ce and Zr, and element M is from the group consisting of Y, Yb, Er, Ho, Tm, Gd, In, and Sc. At least one selected, satisfying 0.95 ≦ x ≦ 1, 0 <y ≦ 0.5, and δ is an oxygen deficiency amount) in the metal oxide Containing copper element According to this electrochemical device, the electrochemical reaction proceeds rapidly.

(5)また、前述の(4)の電気化学デバイスにおいては、前記元素A、前記元素Bおよび前記元素Mの総量に対する銅元素の割合:RCuは、0.01原子%以上、0.6原子%以下であってもよい。 (5) Moreover, in the electrochemical device of the above-mentioned (4), the ratio of the copper element to the total amount of the element A, the element B and the element M: R Cu is 0.01 atomic% or more, 0.6 It may be at most atomic%.

[実施形態の詳細]
 本発明の実施形態の具体例を、適宜図面を参照しつつ以下に説明する。なお、本発明はこれらの例示に限定されるものではなく、添付の請求の範囲によって示され、請求の範囲と均等の意味および範囲内での全ての変更が含まれることが意図される。
[Details of the embodiment]
Specific examples of embodiments of the present invention will be described below with reference to the drawings as appropriate. In addition, this invention is not limited to these illustrations, is shown by the attached claim, and it is intended that all the changes within the meaning and range equivalent to a claim are included.

[プロトン伝導体]
 プロトン伝導体は、ペロブスカイト型構造(ABO相)を有する金属酸化物と、金属酸化物中に含まれる銅元素と、を含む。金属酸化物は、式(1):A1-y3-δで表される。
[Proton conductor]
The proton conductor includes a metal oxide having a perovskite structure (ABO 3 phase) and a copper element contained in the metal oxide. The metal oxide is represented by the formula (1): A x B 1-y M y O 3-δ .

 Aサイトには、元素Aが入り、Bサイトには、元素B(ホウ素を示すものではない)が入る。Bサイトの一部は、高いプロトン伝導性を確保する観点から、元素Mで置換されている。元素Bおよび元素Mの合計に対する元素Aの比率xは、高いプロトン伝導性とイオン輸率を確保する観点から、0.95≦x≦1であることが好ましく、0.98≦x≦1であることがより好ましい。yは、プロトン伝導性を確保する観点から、0<y≦0.5であることが好ましく、0.1<y≦0.3であることがより好ましい。 The element A enters the A site and the element B (not indicating boron) enters the B site. A part of the B site is substituted with the element M from the viewpoint of ensuring high proton conductivity. The ratio x of the element A to the total of the elements B and M is preferably 0.95 ≦ x ≦ 1 from the viewpoint of ensuring high proton conductivity and ion transport number, and 0.98 ≦ x ≦ 1. More preferably. From the viewpoint of ensuring proton conductivity, y is preferably 0 <y ≦ 0.5, and more preferably 0.1 <y ≦ 0.3.

 元素Aは、Ba(バリウム)、Ca(カルシウム)およびSr(ストロンチウム)よりなる群から選択される少なくとも一種である。なかでも、優れたプロトン伝導性が得られる点で、元素AはBaを含むことが好ましく、元素Aに占めるBaの比率は、50原子%以上であることが好ましく、80原子%以上であることがより好ましい。元素AはBaのみで構成されることが更に好ましい。 Element A is at least one selected from the group consisting of Ba (barium), Ca (calcium), and Sr (strontium). Especially, it is preferable that the element A contains Ba by the point from which the outstanding proton conductivity is obtained, and it is preferable that the ratio of Ba to the element A is 50 atomic% or more, and is 80 atomic% or more. Is more preferable. More preferably, the element A is composed only of Ba.

 元素Bは、Ce(セリウム)およびZr(ジルコニウム)よりなる群から選択される少なくとも一種である。なかでも、耐久性の観点から、元素BはZrを含むことが好ましく、元素Bに占めるZrの比率は、50原子%以上であることが好ましく、80原子%以上であることがより好ましい。元素BはZrのみで構成されることが更に好ましい。Zrを含む金属酸化物は特に焼結性が低いが、本実施形態によれば、焼結性を向上することができる。 Element B is at least one selected from the group consisting of Ce (cerium) and Zr (zirconium). Among these, from the viewpoint of durability, the element B preferably contains Zr, and the proportion of Zr in the element B is preferably 50 atomic% or more, and more preferably 80 atomic% or more. More preferably, the element B is composed only of Zr. Although the metal oxide containing Zr has particularly low sinterability, according to this embodiment, the sinterability can be improved.

 元素Mは、Y(イットリウム)、Yb(イッテルビウム)、Er(エルビウム)、Ho(ホルミウム)、Tm(ツリウム)、Gd(ガドリニウム)、In(インジウム)およびSc(スカンジウム)よりなる群から選択される少なくとも一種である。元素Mはドーパントであって、これにより酸素欠陥が生じ、ペロブスカイト型構造を有する金属酸化物はプロトン伝導性を発現する。 The element M is selected from the group consisting of Y (yttrium), Yb (ytterbium), Er (erbium), Ho (holmium), Tm (thulium), Gd (gadolinium), In (indium), and Sc (scandium). At least one kind. The element M is a dopant, which causes oxygen defects, and the metal oxide having a perovskite structure exhibits proton conductivity.

 式(1)において、酸素欠損量δは、元素Mの量に応じて決定でき、例えば、0≦δ≦0.15である。金属酸化物における各元素の比率は、例えば、高周波誘導結合プラズマ発光分光分析法(Inductively Coupled Plasma Atomic Emission Spectroscopy、以下ICPと称する。)を用いて求めることができる。 In the formula (1), the oxygen deficiency amount δ can be determined according to the amount of the element M, for example, 0 ≦ δ ≦ 0.15. The ratio of each element in the metal oxide can be determined using, for example, a high-frequency inductively coupled plasma emission spectroscopy (hereinafter referred to as ICP).

 ペロブスカイト型構造を有する金属酸化物の具体例としては、イットリウムがドープされたジルコン酸バリウム[BaZr1-y3-δ(以下、BZYと称する)]、イットリウムがドープされたセリウム酸バリウム[BaCe1-y3-δ(BCY)]、イットリウムがドープされたジルコン酸バリウム/セリウム酸バリウムの混合酸化物[BaZr1-y-zCe3-δ(BZCY)]などが挙げられる。 Specific examples of metal oxides having a perovskite structure include barium zirconate doped with yttrium [Ba x Zr 1-y Y y O 3-δ (hereinafter referred to as BZY)], cerium doped with yttrium. Barium oxide [Ba x Ce 1-y Y y O 3-δ (BCY)], mixed oxide of barium zirconate / barium cerate doped with yttrium [Ba x Zr 1-yz Ce z Y y O 3-δ (BZCY)] and the like.

 焼結助剤としては、焼結させたい金属酸化物よりも融点が低く、かつ、金属酸化物と反応し難い材料が用いられる。焼成の際、焼結助剤は融解して金属酸化物の粉末間に液相を生じる。この液相が金属酸化物粉末の隙間を埋めて緻密化することにより、焼結は速やかに進行する。一方、焼結助剤が金属酸化物の粉末間に介在することにより、得られる焼結体のプロトン伝導性は低下しやすい。 As the sintering aid, a material having a melting point lower than that of the metal oxide to be sintered and hardly reacting with the metal oxide is used. During firing, the sintering aid melts to form a liquid phase between the metal oxide powders. This liquid phase fills the gaps in the metal oxide powder and densifies, whereby the sintering proceeds quickly. On the other hand, when the sintering aid is interposed between the metal oxide powders, the proton conductivity of the obtained sintered body tends to decrease.

 しかし、特定の焼結助剤を特定の量用いることにより、焼結性を向上させながら、焼結体のプロトン伝導性を向上することができる。本実施形態に係るプロトン伝導体は、この知見に基づいて得られる。焼結性とは、焼結のし易さであり、材料を焼結させるのに必要な焼成温度および焼成時間がその指標となる。例えば、焼成温度が低く焼成時間が短いほど、焼結性は高い。焼結性が高いと、低温かつ短時間で焼成が進むため、金属酸化物に含まれる元素Aの蒸発が抑制される。つまり、焼結性の向上は、プロトン伝導性の向上にも寄与する。 However, by using a specific amount of a specific sintering aid, the proton conductivity of the sintered body can be improved while improving the sinterability. The proton conductor according to the present embodiment is obtained based on this finding. Sinterability is the ease of sintering, and the firing temperature and firing time necessary to sinter the material are indicators thereof. For example, the lower the firing temperature and the shorter the firing time, the higher the sinterability. When the sinterability is high, firing proceeds at a low temperature in a short time, and thus evaporation of the element A contained in the metal oxide is suppressed. That is, the improvement of sinterability also contributes to the improvement of proton conductivity.

 すなわち、本実施形態に係るプロトン伝導体は、上記式(1)で表されるペロブスカイト型構造を有する金属酸化物(以下、単に金属酸化物と称す。)にCuを含む焼結助剤を添加して成形した成形物を、焼成することにより得られる焼結体である。Cuを含む焼結助剤は、プロトン伝導体に含まれるCu元素の割合:RCuが、0.01原子%以上、0.6原子%以下になるように配合されている。これにより、成形物は、低温かつ短時間で焼結されるとともに、得られるプロトン伝導体は、優れたプロトン伝導性を有する。Cuを含む焼結助剤としては、例えばCuOが挙げられる。 That is, in the proton conductor according to the present embodiment, a sintering aid containing Cu is added to a metal oxide having a perovskite structure represented by the above formula (1) (hereinafter simply referred to as a metal oxide). It is a sintered body obtained by firing the molded product molded in this manner. The sintering aid containing Cu is blended so that the ratio of Cu element contained in the proton conductor: R Cu is 0.01 atomic% or more and 0.6 atomic% or less. As a result, the molded product is sintered at a low temperature for a short time, and the obtained proton conductor has excellent proton conductivity. An example of the sintering aid containing Cu is CuO.

 焼結助剤として、例えば、それぞれNiO、CuO、ZnOを、金属酸化物に添加する場合、得られる焼結体には、それぞれNi、CuおよびZnが含まれる。焼結体に占めるこれら金属の原子%が同じである場合、Cuを含む焼結体のプロトン伝導性は最も高い。 For example, when adding NiO, CuO, and ZnO to the metal oxide as sintering aids, the resulting sintered bodies contain Ni, Cu, and Zn, respectively. When the atomic percent of these metals in the sintered body is the same, the proton conductivity of the sintered body containing Cu is the highest.

 本実施形態のCuを含むプロトン伝導体(以下、Cuプロトン伝導体と称す。)は、例えば、300℃程度の条件下であっても、優れたプロトン伝導性を発揮することができる。特に、還元雰囲気で測定すると、低温であっても、Cuプロトン伝導体のプロトン伝導性は高い。言い換えれば、Cuプロトン伝導体は、還元雰囲気で使用する場合、測定温度にかかわらず、優れたプロトン伝導性を発揮する。 The proton conductor containing Cu of the present embodiment (hereinafter referred to as Cu proton conductor) can exhibit excellent proton conductivity even under conditions of about 300 ° C., for example. In particular, when measured in a reducing atmosphere, the proton conductivity of the Cu proton conductor is high even at low temperatures. In other words, when used in a reducing atmosphere, the Cu proton conductor exhibits excellent proton conductivity regardless of the measurement temperature.

 還元雰囲気とは、例えば、電気化学デバイスとしてCuプロトン伝導体を用いる場合、反応場における酸素分圧が、その電気化学デバイスの動作温度におけるCuOの平衡酸素分圧PO2未満である場合をいう。例えば、500℃における反応場の酸素分圧が、平衡酸素分圧PO2:2.88×10-8atmより小さいとき、還元雰囲気にあるといる。600℃においては、反応場の酸素分圧が、平衡酸素分圧PO2:2.63×10-6atmより小さいとき、700℃においては、反応場の酸素分圧が、平衡酸素分圧PO2:9.46×10-5atmより小さいとき、それぞれ還元雰囲気にあるといえる。 For example, when a Cu proton conductor is used as an electrochemical device, the reducing atmosphere is a case where the oxygen partial pressure in the reaction field is less than the equilibrium oxygen partial pressure P O2 of Cu 2 O at the operating temperature of the electrochemical device. Say. For example, when the oxygen partial pressure in the reaction field at 500 ° C. is smaller than the equilibrium oxygen partial pressure P O2 : 2.88 × 10 −8 atm, the reducing atmosphere is assumed. At 600 ° C., when the oxygen partial pressure in the reaction field is smaller than the equilibrium oxygen partial pressure P O2 : 2.63 × 10 −6 atm, at 700 ° C., the oxygen partial pressure in the reaction field is equal to the equilibrium oxygen partial pressure P When O2 is less than 9.46 × 10 −5 atm, it can be said that each is in a reducing atmosphere.

 Cuプロトン伝導体によれば、酸化雰囲気であっても高いプロトン伝導性が示される。つまり、動作雰囲気にかかわらず、Cuプロトン伝導体は、優れたプロトン伝導性を発揮することができる。特に、700℃程度の比較的高温で動作させると、酸化雰囲気であっても、Cuプロトン伝導体のプロトン伝導性は高い。 According to Cu proton conductor, high proton conductivity is exhibited even in an oxidizing atmosphere. That is, regardless of the operating atmosphere, the Cu proton conductor can exhibit excellent proton conductivity. In particular, when operated at a relatively high temperature of about 700 ° C., the proton conductivity of the Cu proton conductor is high even in an oxidizing atmosphere.

 Cuプロトン伝導体において、元素A、元素Bおよび元素Mの総量に対するCu元素の割合:RCuは、0.01原子%以上、0.6原子%以下である。RCuは、0.1原子%以上であってもよく、0.15原子%以上であってもよい。また、RCuは、0.4原子%以下であってもよい。 In the Cu proton conductor, the ratio of Cu element to the total amount of element A, element B and element M: R Cu is 0.01 atomic% or more and 0.6 atomic% or less. R Cu may be 0.1 atomic% or more, or 0.15 atomic% or more. Further, R Cu may be 0.4 atomic% or less.

 電子プローブマイクロアナライザを使用した波長分散型X線分析 WDX(Wavelength Dispersive X-ray spectroscopy)、X線光電子分光法[XPS(X-ray Photoelectron Spectroscopy)またはESCA(Electron Spectroscopy for Chemical Analysis)]で元素A、元素B、元素MおよびCuの比率を求め、サンプル中のRCuは求めることができる。 Wavelength dispersive X-ray analysis using an electron probe microanalyzer WDX (Wavelength Dispersive X-ray spectroscopy), X-ray photoelectron spectroscopy (XPS (X-ray Photoelectron Spectroscopy) or ESCA (Electron Spectroscopy Spectroscopy) The ratio of element B, element M and Cu can be determined, and R Cu in the sample can be determined.

[プロトン伝導体の製造方法]
 Cuプロトン伝導体は、例えば、金属酸化物の粉末およびCuOの粉末を含む原料を所望の形状に成形した後、焼成することにより得られる。CuOの粉末は、例えば、金属酸化物およびCuOの合計量に対して、0.1質量%~5質量%添加される。
[Production method of proton conductor]
The Cu proton conductor can be obtained, for example, by forming a raw material containing a metal oxide powder and a CuO powder into a desired shape and then firing it. The CuO powder is added in an amount of 0.1% by mass to 5% by mass with respect to the total amount of the metal oxide and CuO, for example.

 原料は、成形性の観点から、バインダを含むことが好ましい。バインダとしては、セラミック材料の製造に使用される公知の材料、例えば、エチルセルロースなどのセルロース誘導体(セルロースエーテルなど)、酢酸ビニル系樹脂(プロビニルアルコールなどの酢酸ビニル系樹脂のケン化物も含む)、アクリル樹脂などのポリマーバインダー;パラフィンワックスなどのワックスなどが挙げられる。バインダの量は、金属酸化物100質量部に対して、例えば1~20質量部、特には1.5~15質量部である。 The raw material preferably contains a binder from the viewpoint of moldability. As the binder, known materials used for the production of ceramic materials, for example, cellulose derivatives such as ethyl cellulose (cellulose ether and the like), vinyl acetate resins (including saponified vinyl acetate resins such as provinyl alcohol), Examples thereof include polymer binders such as acrylic resins; waxes such as paraffin wax. The amount of the binder is, for example, 1 to 20 parts by mass, particularly 1.5 to 15 parts by mass with respect to 100 parts by mass of the metal oxide.

 原料は、必要に応じて、水、有機溶媒(例えば、トルエンなどの炭化水素;エタノール、イソプロパノールなどのアルコール;ブチルカルビトールアセテートなどのカルビトールなど)などの分散媒を含んでいてもよい。原料は、必要に応じて、界面活性剤、解膠剤(ポリカルボン酸など)などの各種添加剤を含んでいてもよい。 The raw material may contain a dispersion medium such as water and an organic solvent (for example, hydrocarbon such as toluene; alcohol such as ethanol and isopropanol; carbitol such as butyl carbitol acetate) as necessary. The raw material may contain various additives such as a surfactant and a peptizer (polycarboxylic acid or the like) as necessary.

 成形の方法は特に限定されず、所望の形状に応じて適宜選択すればよい。例えば、平板状のプロトン伝導体は、プレス成型、テープ成型、スクリーン印刷、スプレー塗布、スピンコート、ディップコート等、既存の方法を用いて成形することができる。 The forming method is not particularly limited, and may be appropriately selected according to a desired shape. For example, the flat proton conductor can be formed using existing methods such as press molding, tape molding, screen printing, spray coating, spin coating, dip coating, and the like.

 焼成は、得られた成形物を、酸素含有雰囲気下で加熱することにより行われる。CuOが添加された成形物の焼成温度は、例えば、1600℃未満でよく、1500℃以下でよい。焼成時間は、例えば、20時間以下でよく、15時間以下でよく、10時間以下でよい。焼成の雰囲気中の酸素含有量は、特に限定されない。焼成は、例えば大気雰囲気(酸素含有率:約20体積%)で行ってもよいし、純酸素(酸素含有率:100体積%)中で行ってもよい。焼成は、常圧下または加圧下で行うことができる。 Calcination is performed by heating the obtained molded product in an oxygen-containing atmosphere. The firing temperature of the molded product to which CuO is added may be, for example, less than 1600 ° C. or 1500 ° C. or less. The firing time may be, for example, 20 hours or less, 15 hours or less, and 10 hours or less. The oxygen content in the firing atmosphere is not particularly limited. Firing may be performed, for example, in an air atmosphere (oxygen content: about 20% by volume) or in pure oxygen (oxygen content: 100% by volume). Firing can be performed under normal pressure or under pressure.

[電気化学デバイス]
 ところで、Cuプロトン伝導体は、Cu元素の割合:RCuにかかわらず、特定の条件下で使用する場合に、特に優れたプロトン伝導性を発揮する。例えば、Cuプロトン伝導体の還元雰囲気におけるプロトン伝導性は、焼結助剤を添加せずに金属酸化物のみを焼結させて得られるプロトン伝導体の還元雰囲気におけるプロトン伝導性と比較して、遜色ない。本実施形態に係る電気化学デバイスは、この知見に基づくものである。
[Electrochemical devices]
Incidentally, the Cu proton conductor exhibits particularly excellent proton conductivity when used under specific conditions regardless of the Cu element ratio: R Cu . For example, the proton conductivity in the reducing atmosphere of the Cu proton conductor is compared with the proton conductivity in the reducing atmosphere of the proton conductor obtained by sintering only the metal oxide without adding a sintering aid. Not inferior. The electrochemical device according to the present embodiment is based on this finding.

 すなわち、本実施形態に係る電気化学デバイスは、還元雰囲気を形成する内部空間を有する容器と、容器の内部空間に配置されるCuプロトン伝導体と、を備える。電気化学デバイスは、物質間で電子の授受を行って、この電子の授受によって化学的反応を生じさせる装置である。 That is, the electrochemical device according to this embodiment includes a container having an internal space that forms a reducing atmosphere, and a Cu proton conductor disposed in the internal space of the container. An electrochemical device is an apparatus that exchanges electrons between substances and causes a chemical reaction by the exchange of electrons.

 電気化学デバイスとしては、具体的には、水素分離装置、水素ポンプ、ガス分解装置等が挙げられる。 Specific examples of the electrochemical device include a hydrogen separation device, a hydrogen pump, and a gas decomposition device.

 容器は、電気化学的反応が起こる反応場であり、容器の内部空間には還元雰囲気が形成される。内部空間が還元雰囲気であると、詳細は不明であるものの、その内部空間に配置されるCuプロトン伝導体のプロトン伝導性が向上し、電気化学的反応は速やかに進行する。 The container is a reaction field where an electrochemical reaction occurs, and a reducing atmosphere is formed in the inner space of the container. If the internal space is a reducing atmosphere, the details are unknown, but the proton conductivity of the Cu proton conductor disposed in the internal space is improved, and the electrochemical reaction proceeds rapidly.

 電気化学デバイスの動作条件は、300℃以上であればよく、500℃以上であってもよく、600℃以上であってもよく、700℃以上であってもよい。プロトン伝導体のプロトン伝導性は、一般的に、動作温度が高温であるほど向上する。Cuプロトン伝導体は、300℃程度の比較的低温の場合にも、還元雰囲気において優れたプロトン伝導性を発揮する。 The operating condition of the electrochemical device may be 300 ° C. or higher, 500 ° C. or higher, 600 ° C. or higher, or 700 ° C. or higher. The proton conductivity of the proton conductor generally improves as the operating temperature increases. The Cu proton conductor exhibits excellent proton conductivity in a reducing atmosphere even at a relatively low temperature of about 300 ° C.

 図1は、本実施形態に係る電気化学デバイスの一例を模式的に示す断面図である。
 電気化学デバイス10は、容器4と、容器4の内部空間に配置されるCuプロトン伝導体1と、を備える。内部空間には還元雰囲気が形成される。
FIG. 1 is a cross-sectional view schematically showing an example of an electrochemical device according to this embodiment.
The electrochemical device 10 includes a container 4 and a Cu proton conductor 1 disposed in the internal space of the container 4. A reducing atmosphere is formed in the internal space.

 Cuプロトン伝導体1は、例えば、一対の電極(アノード2およびカソード3)に挟持されている。容器4の内部空間は、Cuプロトン伝導体1により、アノード2側の空間S1およびカソード3側の空間S2に分離されている。水素原子を含むガス(第1のガスG1)は、第1の供給口4aから空間S1に供給される。第1のガスG1から、電気化学的反応によりプロトンが生成し、空間S2に第2のガスG2(例えば、水素ガス)を生じさせる。第2のガスG2は、排出口4bを通って容器4から排出される。容器4は、必要に応じて、第3のガスG3を空間S2に供給する第2の供給口4cを備える。 Cu proton conductor 1 is sandwiched between, for example, a pair of electrodes (anode 2 and cathode 3). The internal space of the container 4 is separated by the Cu proton conductor 1 into a space S1 on the anode 2 side and a space S2 on the cathode 3 side. A gas containing hydrogen atoms (first gas G1) is supplied from the first supply port 4a to the space S1. Protons are generated from the first gas G1 by an electrochemical reaction, and a second gas G2 (for example, hydrogen gas) is generated in the space S2. The second gas G2 is discharged from the container 4 through the discharge port 4b. The container 4 includes a second supply port 4c that supplies the third gas G3 to the space S2 as necessary.

 アノード2に第1のガスG1を接触させるとともに、電極間に電圧を印加すると、アノード2では、プロトンと電子とを放出する反応が生じる。放出されたプロトンは、アノード2に接しているCuプロトン伝導体1の第1主面から、カソード3に接しているCuプロトン伝導体1の第2主面へと移動する。プロトンは第2主面側で再び電子を受け取って、水素ガスとしてカソード3から排出される。あるいは、プロトンは、カソード3に供給された第3のガスG3と反応して、新たな化合物を生成し得る。また、カソード3から排出される水素ガスは、空間S2に供給された第3のガスG3と反応して、新たな化合物を生成し得る。つまり、Cuプロトン伝導体1は、メンブレンリアクタとしての機能を果たし得る。 When the first gas G1 is brought into contact with the anode 2 and a voltage is applied between the electrodes, the anode 2 undergoes a reaction that releases protons and electrons. The released protons move from the first main surface of the Cu proton conductor 1 in contact with the anode 2 to the second main surface of the Cu proton conductor 1 in contact with the cathode 3. Protons receive electrons again on the second main surface side and are discharged from the cathode 3 as hydrogen gas. Alternatively, protons can react with the third gas G3 supplied to the cathode 3 to generate a new compound. Further, the hydrogen gas discharged from the cathode 3 can react with the third gas G3 supplied to the space S2 to generate a new compound. That is, the Cu proton conductor 1 can function as a membrane reactor.

 図1のように、容器の内部空間がCuプロトン伝導体により分離されている場合、少なくともアノード側の空間を還元雰囲気にすればよい。 As shown in FIG. 1, when the internal space of the container is separated by the Cu proton conductor, at least the space on the anode side may be a reducing atmosphere.

 電気化学デバイスが水素分離装置である場合を例に挙げて説明する。
 水素分離装置は、水素ガスを含む混合ガスから、水素ガスを分離して取り出す。
 例えば、アノード2とカソード3との間に電圧を印加するとともに、空間S1に水素ガスを含む第1のガスG1を供給する。第1のガスG1はアノード2に接触し、第1のガスG1に含まれる水素ガスは、アノード2で分解される。これにより、プロトンおよび電子が生じる。Cuプロトン伝導体1内を移動したプロトンは、カソード3から電子を受け取って、純粋な水素ガスとして単離される。
A case where the electrochemical device is a hydrogen separator will be described as an example.
The hydrogen separator separates and extracts hydrogen gas from a mixed gas containing hydrogen gas.
For example, a voltage is applied between the anode 2 and the cathode 3 and a first gas G1 containing hydrogen gas is supplied to the space S1. The first gas G1 comes into contact with the anode 2, and the hydrogen gas contained in the first gas G1 is decomposed at the anode 2. This produces protons and electrons. Protons that have moved through the Cu proton conductor 1 receive electrons from the cathode 3 and are isolated as pure hydrogen gas.

(アノード)
 アノードは、例えば、プロトン伝導性の多孔質構造を有している。アノードの材料は特に限定されない。アノードは、例えば、上記の金属酸化物の焼結体から構成されてもよいし、白金電極であってもよい。
(anode)
The anode has, for example, a proton conductive porous structure. The material of the anode is not particularly limited. The anode may be composed of, for example, a sintered body of the above metal oxide, or may be a platinum electrode.

(カソード)
 カソードは、例えば、イオン伝導性の多孔質の構造を有している。カソードの材料も特に限定されず、用途に応じて適宜選択すればよい。カソードは、例えば、白金、イオン伝導性酸化物等からなる電極であってもよい。
(Cathode)
The cathode has, for example, an ion conductive porous structure. The material of the cathode is not particularly limited, and may be appropriately selected depending on the application. The cathode may be an electrode made of, for example, platinum or an ion conductive oxide.

 以下、実施例に基づき、本発明をより具体的に説明するが、以下の実施例は本発明を限定するものではない。 Hereinafter, the present invention will be described more specifically based on examples. However, the following examples do not limit the present invention.

[実施例1~4]
(1)金属酸化物(BaZr0.80.22.9)の作製
 炭酸バリウムと、酸化ジルコニウムと、酸化イットリウムとを、Baの比率xが1、Yの比率yが0.2になるようなモル比で、それぞれボールミルに入れて24時間混合し、混合物を得た。得られた混合物を、1000℃で10時間の仮焼成を行った。仮焼成された混合物をボールミルで10時間処理して、一軸成形した後、大気雰囲気において、1300℃で10時間焼成した。焼成した試料を乳鉢で粉砕した後、ボールミルで10時間処理することによって金属酸化物を得た。
[Examples 1 to 4]
(1) Production of Metal Oxide (BaZr 0.8 Y 0.2 O 2.9 ) Barium carbonate, zirconium oxide, and yttrium oxide, Ba ratio x is 1, Y ratio y is 0.2. In such a molar ratio, each was placed in a ball mill and mixed for 24 hours to obtain a mixture. The obtained mixture was calcined at 1000 ° C. for 10 hours. The pre-fired mixture was treated with a ball mill for 10 hours and uniaxially molded, and then fired at 1300 ° C. for 10 hours in an air atmosphere. The fired sample was pulverized with a mortar and then treated with a ball mill for 10 hours to obtain a metal oxide.

(2)焼結体およびサンプル電極の作製
 得られた金属酸化物に、CuOをそれぞれ0.2質量%、0.5質量%、1質量%、2質量%混合して、一軸成形してペレットを得た後、プレス成型法により成形した。成形物を、酸素雰囲気中、1500℃で、10時間の熱処理をすることにより焼結させ、金属酸化物とCuとを含む焼結体A1~A4を作製した。各焼結体A1~A4に含まれるCu元素の割合:RCuは、それぞれ約0.16at%、約0.33at%、約0.53at%、約0.81at%であった。「at%」は、原子%を意味する。
(2) Preparation of sintered body and sample electrode The obtained metal oxide was mixed with 0.2% by mass, 0.5% by mass, 1% by mass, and 2% by mass of CuO, respectively, and uniaxially formed into pellets. After being obtained, it was molded by a press molding method. The molded product was sintered by heat treatment at 1500 ° C. for 10 hours in an oxygen atmosphere to produce sintered bodies A1 to A4 containing metal oxide and Cu. The ratio of Cu element contained in each of the sintered bodies A1 to A4: R Cu was about 0.16 at%, about 0.33 at%, about 0.53 at%, and about 0.81 at%, respectively. “At%” means atomic%.

[比較例1]
 「焼結体およびサンプル電極の作製(2)」で、CuOを添加しなかったこと、および、プレス成型により得られた成形物を、BZYと炭酸バリウムとの混合粉末[BZY:BaCO=100:1(質量比)]中に埋めて、酸素雰囲気中、1600℃で、24時間の熱処理をすることにより焼結させたこと以外は、実施例1~4と同様にして、焼結体aを作製した。
[Comparative Example 1]
In “Preparation of sintered body and sample electrode (2)”, CuO was not added, and the molded product obtained by press molding was mixed powder of BZY and barium carbonate [BZY: BaCO 3 = 100. : 1 (mass ratio)], and sintered in the same manner as in Examples 1 to 4 except that it was sintered by heat treatment at 1600 ° C. for 24 hours in an oxygen atmosphere. Was made.

[比較例2~5]
 「焼結体およびサンプル電極の作製(2)」で、CuOに替えてNiOを添加したこと以外は、実施例1~4と同様にして、焼結体b1~b4を作製した。各焼結体b1~b4に含まれるNiの割合は、それぞれ約0.39at%、約0.68at%、約1.25at%、約2.13at%であった。
[Comparative Examples 2 to 5]
Sintered bodies b1 to b4 were manufactured in the same manner as in Examples 1 to 4 except that NiO was added instead of CuO in “Preparation of sintered body and sample electrode (2)”. The ratio of Ni contained in each of the sintered bodies b1 to b4 was about 0.39 at%, about 0.68 at%, about 1.25 at%, and about 2.13 at%, respectively.

[比較例6~9]
 「焼結体およびサンプル電極の作製(2)」で、CuOに替えてZnOを添加したこと以外は、実施例1~4と同様にして、焼結体c1~c4を作製した。各焼結体c1~c4に含まれるZnの割合は、それぞれ約0.24at%、約0.52at%、約0.69at%、約0.82at%であった。
[Comparative Examples 6 to 9]
Sintered bodies c1 to c4 were manufactured in the same manner as in Examples 1 to 4, except that ZnO was added instead of CuO in “Preparation of sintered body and sample electrode (2)”. The ratio of Zn contained in each of the sintered bodies c1 to c4 was about 0.24 at%, about 0.52 at%, about 0.69 at%, and about 0.82 at%, respectively.

[プロトン伝導性の評価1]
 実施例1~4、比較例1、比較例2~5および比較例6~9で得られた焼結体のそれぞれの両面にスパッタ法によりPt電極を形成して、サンプル電極を作製した。サンプル電極を以下の条件で処理した。
[Evaluation of proton conductivity 1]
Pt electrodes were formed on both surfaces of the sintered bodies obtained in Examples 1 to 4, Comparative Example 1, Comparative Examples 2 to 5, and Comparative Examples 6 to 9 by sputtering to prepare sample electrodes. The sample electrode was processed under the following conditions.

(A)酸化雰囲気での処理(1回目)
 Ptスパッタ後のサンプル電極を測定用のホルダーに取り付け、電気炉に入れ、500℃まで昇温した。酸素分圧が0.95atm(9.5×10Pa)、水蒸気分圧が0.05atm(0.5×10Pa)となるように、加湿した酸素を供給しながら、18時間処理した。
(A) Treatment in an oxidizing atmosphere (first time)
The sample electrode after Pt sputtering was attached to a measurement holder, placed in an electric furnace, and heated to 500 ° C. It was treated for 18 hours while supplying humidified oxygen so that the oxygen partial pressure was 0.95 atm (9.5 × 10 4 Pa) and the water vapor partial pressure was 0.05 atm (0.5 × 10 4 Pa). .

(B)還元雰囲気での処理
 処理(A)の後、水素分圧が0.95atm(9.5×10Pa)、水蒸気分圧が0.05atm(0.5×10Pa)となるように、加湿した水素を供給しながら、500℃で10時間処理した。
(B) Treatment in a reducing atmosphere After treatment (A), the hydrogen partial pressure becomes 0.95 atm (9.5 × 10 4 Pa) and the water vapor partial pressure becomes 0.05 atm (0.5 × 10 4 Pa). Thus, it processed at 500 degreeC for 10 hours, supplying humidified hydrogen.

(C)酸化雰囲気での処理(2回目)
 処理(B)の後、酸素分圧が0.95atm(9.5×10Pa)、水蒸気分圧が0.05atm(0.5×10Pa)となるように、再び加湿した酸素を供給しながら、500℃で10時間処理した。
(C) Treatment in an oxidizing atmosphere (second time)
After the treatment (B), oxygen which has been humidified again is adjusted so that the oxygen partial pressure is 0.95 atm (9.5 × 10 4 Pa) and the water vapor partial pressure is 0.05 atm (0.5 × 10 4 Pa). While supplying, it was treated at 500 ° C. for 10 hours.

 「還元雰囲気での処理(B)」の後、交流インピーダンス測定により全伝導度を求めた。結果を図2に示す。交流インピーダンス測定には、Solartron1260(Solartron Analytical社製)を使用した。 After the “treatment in a reducing atmosphere (B)”, the total conductivity was determined by measuring the AC impedance. The results are shown in FIG. Solartron 1260 (manufactured by Solartron-Analytical) was used for AC impedance measurement.

[プロトン伝導性の評価2]
 「酸化雰囲気での処理(1回目)(A)」、「還元雰囲気での処理(B)」および「酸化雰囲気での処理(2回目)(C)」において、処理温度を600℃にしたこと以外は、評価1と同様にして各サンプル電極を処理した。
 「還元雰囲気での処理(B)」の後、交流インピーダンス測定により全伝導度を求めた。結果を図3に示す。
[Evaluation of proton conductivity 2]
The processing temperature was set to 600 ° C. in “treatment in oxidizing atmosphere (first time) (A)”, “treatment in reducing atmosphere (B)” and “treatment in oxidizing atmosphere (second time) (C)”. Except for the above, each sample electrode was treated in the same manner as in Evaluation 1.
After “treatment in reducing atmosphere (B)”, the total conductivity was determined by AC impedance measurement. The results are shown in FIG.

[プロトン伝導性の評価3]
 「酸化雰囲気での処理(1回目)(A)」、「還元雰囲気での処理(B)」および「酸化雰囲気での処理(2回目)(C)」において、処理温度を700℃にしたこと以外は、評価1と同様にして各サンプル電極を処理した。
 「還元雰囲気での処理(B)」の後、交流インピーダンス測定により全伝導度を求めた。結果を図4に示す。
[Evaluation of proton conductivity 3]
The treatment temperature was set to 700 ° C. in “treatment in oxidizing atmosphere (first time) (A)”, “treatment in reducing atmosphere (B)” and “treatment in oxidizing atmosphere (second time) (C)”. Except for the above, each sample electrode was treated in the same manner as in Evaluation 1.
After “treatment in reducing atmosphere (B)”, the total conductivity was determined by AC impedance measurement. The results are shown in FIG.

[プロトン伝導性の評価4]
 「酸化雰囲気での処理(1回目)(A)」、「還元雰囲気での処理(B)」および「酸化雰囲気での処理(2回目)(C)」において、処理温度を300℃にしたこと以外は、評価1と同様にして各サンプル電極を処理した。
 「還元雰囲気での処理(B)」の後、交流インピーダンス測定によりバルク伝導度を求めた。結果を図5に示す。
[Evaluation of proton conductivity 4]
The treatment temperature was set to 300 ° C. in “treatment in oxidizing atmosphere (first time) (A)”, “treatment in reducing atmosphere (B)” and “treatment in oxidizing atmosphere (second time) (C)”. Except for the above, each sample electrode was treated in the same manner as in Evaluation 1.
After “treatment in reducing atmosphere (B)”, bulk conductivity was determined by AC impedance measurement. The results are shown in FIG.

[プロトン伝導性の評価5]
 「酸化雰囲気での処理(1回目)(A)」、「還元雰囲気での処理(B)」および「酸化雰囲気での処理(2回目)(C)」において、処理温度を700℃にしたこと以外は、評価1と同様にして各サンプル電極を処理した。
 「酸化雰囲気での処理(2回目)(C)」の後、交流インピーダンス測定により全伝導度を求めた。結果を図6に示す。
[Evaluation of proton conductivity 5]
The processing temperature was set to 700 ° C. in “treatment in oxidizing atmosphere (first time) (A)”, “treatment in reducing atmosphere (B)” and “treatment in oxidizing atmosphere (second time) (C)”. Except for the above, each sample electrode was treated in the same manner as in Evaluation 1.
After “treatment in an oxidizing atmosphere (second time) (C)”, the total conductivity was determined by AC impedance measurement. The results are shown in FIG.

 本発明の実施形態に係るプロトン伝導体は、焼結性およびプロトン伝導性に優れるため、様々な電気化学デバイスに適している。 Since the proton conductor according to the embodiment of the present invention is excellent in sinterability and proton conductivity, it is suitable for various electrochemical devices.

10:電気化学デバイス
 1:Cuプロトン伝導体
 2:アノード
 3:カソード
 4:容器
  4a:第1の供給口
  4b:排出口
  4c:第2の供給口
 
10: Electrochemical device 1: Cu proton conductor 2: Anode 3: Cathode 4: Container 4a: First supply port 4b: Discharge port 4c: Second supply port

Claims (5)

 ペロブスカイト型構造を有し、かつ下記式(1):
 A1-y3-δ     (1)
(ただし、元素Aは、Ba、CaおよびSrよりなる群から選択される少なくとも一種であり、元素Bは、CeおよびZrよりなる群から選択される少なくとも一種であり、元素Mは、Y、Yb、Er、Ho、Tm、Gd、InおよびScよりなる群から選択される少なくとも一種であり、0.95≦x≦1、0<y≦0.5を満たし、δは酸素欠損量である。)
で表される金属酸化物と、
 前記金属酸化物中に含まれる銅元素と、を含むプロトン伝導体であって、
 前記元素A、前記元素Bおよび前記元素Mの総量に対する銅元素の割合:RCuは、0.01原子%以上、0.6原子%以下である、プロトン伝導体。
It has a perovskite structure and has the following formula (1):
A x B 1-y M y O 3-δ (1)
(However, the element A is at least one selected from the group consisting of Ba, Ca and Sr, the element B is at least one selected from the group consisting of Ce and Zr, and the element M is Y, Yb , Er, Ho, Tm, Gd, In, and Sc, satisfying 0.95 ≦ x ≦ 1, 0 <y ≦ 0.5, and δ is the amount of oxygen deficiency. )
A metal oxide represented by
A proton conductor containing copper element contained in the metal oxide,
Ratio of copper element with respect to total amount of element A, element B, and element M: R Cu is a proton conductor that is 0.01 atomic% or more and 0.6 atomic% or less.
 前記銅元素の割合:RCuは、0.15原子%以上、0.4原子%以下である、請求項1に記載のプロトン伝導体。 The ratio of the said copper element: The proton conductor of Claim 1 whose RCu is 0.15 atomic% or more and 0.4 atomic% or less.  前記元素AがBaを含み、
 前記元素BがZrを含み、
 前記元素MがYを含む、請求項1または請求項2に記載のプロトン伝導体。
The element A includes Ba;
The element B contains Zr;
The proton conductor according to claim 1 or 2, wherein the element M includes Y.
 還元雰囲気を形成する内部空間を有する容器と、
 前記容器の前記内部空間に配置されるプロトン伝導体と、を備える、電気化学デバイスであって、
 前記プロトン伝導体は、
 ペロブスカイト型構造を有し、かつ下記式(1):
 A1-y3-δ     (1)
(ただし、元素Aは、Ba、CaおよびSrよりなる群から選択される少なくとも一種であり、元素Bは、CeおよびZrよりなる群から選択される少なくとも一種であり、元素Mは、Y、Yb、Er、Ho、Tm、Gd、InおよびScよりなる群から選択される少なくとも一種であり、0.95≦x≦1、0<y≦0.5を満たし、δは酸素欠損量である。)
で表される金属酸化物と、
 前記金属酸化物中に含まれる銅元素と、を含む、電気化学デバイス。
A container having an internal space forming a reducing atmosphere;
An electrochemical device comprising: a proton conductor disposed in the internal space of the container;
The proton conductor is
It has a perovskite structure and has the following formula (1):
A x B 1-y M y O 3-δ (1)
(However, the element A is at least one selected from the group consisting of Ba, Ca and Sr, the element B is at least one selected from the group consisting of Ce and Zr, and the element M is Y, Yb , Er, Ho, Tm, Gd, In, and Sc, satisfying 0.95 ≦ x ≦ 1, 0 <y ≦ 0.5, and δ is the amount of oxygen deficiency. )
A metal oxide represented by
An electrochemical device comprising a copper element contained in the metal oxide.
 前記元素A、前記元素Bおよび前記元素Mの総量に対する銅元素の割合:RCuは、0.01原子%以上、0.6原子%以下である、請求項4に記載の電気化学デバイス。 The ratio of the copper element with respect to the total amount of the said element A, the said element B, and the said element M: RCu is an electrochemical device of Claim 4 which is 0.01 atomic% or more and 0.6 atomic% or less.
PCT/JP2019/011686 2018-06-05 2019-03-20 Proton conductor and electrochemical device using same Ceased WO2019235025A1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2020523528A JP7167145B2 (en) 2018-06-05 2019-03-20 Proton conductor and electrochemical device using it

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2018-107909 2018-06-05
JP2018107909 2018-06-05

Publications (1)

Publication Number Publication Date
WO2019235025A1 true WO2019235025A1 (en) 2019-12-12

Family

ID=68770200

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2019/011686 Ceased WO2019235025A1 (en) 2018-06-05 2019-03-20 Proton conductor and electrochemical device using same

Country Status (2)

Country Link
JP (1) JP7167145B2 (en)
WO (1) WO2019235025A1 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7603930B2 (en) 2021-03-12 2024-12-23 日産自動車株式会社 Hydrogen Storage Materials

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5382000A (en) * 1976-12-27 1978-07-19 Philips Nv Method of manufacturing dielectric having perovskite type structure
WO2017104806A1 (en) * 2015-12-18 2017-06-22 住友電気工業株式会社 Proton conductor, cell structure, methods for producing proton conductor and cell structure, fuel cell, and water electrolysis device

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7906006B2 (en) 2004-03-26 2011-03-15 The University Court Of The University Of St. Andrews Steam electrolysis

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5382000A (en) * 1976-12-27 1978-07-19 Philips Nv Method of manufacturing dielectric having perovskite type structure
WO2017104806A1 (en) * 2015-12-18 2017-06-22 住友電気工業株式会社 Proton conductor, cell structure, methods for producing proton conductor and cell structure, fuel cell, and water electrolysis device

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7603930B2 (en) 2021-03-12 2024-12-23 日産自動車株式会社 Hydrogen Storage Materials

Also Published As

Publication number Publication date
JPWO2019235025A1 (en) 2021-06-24
JP7167145B2 (en) 2022-11-08

Similar Documents

Publication Publication Date Title
Yi et al. Flame made nanoparticles permit processing of dense, flexible, Li+ conducting ceramic electrolyte thin films of cubic-Li 7 La 3 Zr 2 O 12 (c-LLZO)
KR101892909B1 (en) A method for manufacturing protonic ceramic fuel cells
JPWO2018230247A1 (en) Solid electrolyte member, solid oxide fuel cell, water electrolysis device, hydrogen pump, and method for manufacturing solid electrolyte member
JP2020129433A (en) Solid electrolyte member, solid oxide fuel cell, water electrolysis device, hydrogen pump, and method for manufacturing solid electrolyte member
Kim et al. Improving tubular protonic ceramic fuel cell performance by compensating Ba evaporation via a Ba-excess optimized proton conducting electrolyte synthesis strategy
JPH07149522A (en) Zirconia electrolyte powder and its production
KR101330173B1 (en) Cathode for Solid Oxide Fuel Cell, Method for Producing Thereof and Fuel Cell Comprising the Same
JP7167145B2 (en) Proton conductor and electrochemical device using it
JP3121982B2 (en) Conductive ceramics
JP3121993B2 (en) Method for producing conductive ceramics
KR101165124B1 (en) Ion conductor
JP2003123789A (en) Solid electrolyte material, method for producing the same, and solid electrolyte fuel cell using the same
US7625653B2 (en) Ionic conductor
JP2000044245A (en) Production of lscm/ysz composite powder and production of solid electrolyte type fuel cell using the powder
JP7267154B2 (en) Ion-conducting oxide, battery using the same, and method for producing ion-conducting oxide
JP3598956B2 (en) Gallate composite oxide solid electrolyte material and method for producing the same
JP2005139024A (en) Mixed conductive ceramic material and solid oxide fuel cell using this material
JP3091100B2 (en) Method for producing conductive ceramics
KR101840094B1 (en) Ceria electrolyte for low temperature sintering and solid oxide fuel cells using the same
JP3199546B2 (en) Current collector for solid oxide fuel cell and method for producing conductive ceramics
Tulasirao et al. Influence of Mg2+ doping on the oxide ion conductivity of layered ferroelectric SrBi2Ta2O9
JP3339936B2 (en) Method for producing conductive ceramics
JPWO2019171905A1 (en) Cell structure
JP3220320B2 (en) Fuel cell and method for producing conductive ceramics
JP2025129948A (en) Proton-electron mixed conductor, electrode, fuel battery cell, steam electrolysis cell and hydrogen permeable membrane

Legal Events

Date Code Title Description
121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 19814219

Country of ref document: EP

Kind code of ref document: A1

WWE Wipo information: entry into national phase

Ref document number: 2020523528

Country of ref document: JP

NENP Non-entry into the national phase

Ref country code: DE

122 Ep: pct application non-entry in european phase

Ref document number: 19814219

Country of ref document: EP

Kind code of ref document: A1