WO2019111758A1 - Feuille pour usinage de pièces, et procédé de fabrication de pièces usinées - Google Patents
Feuille pour usinage de pièces, et procédé de fabrication de pièces usinées Download PDFInfo
- Publication number
- WO2019111758A1 WO2019111758A1 PCT/JP2018/043551 JP2018043551W WO2019111758A1 WO 2019111758 A1 WO2019111758 A1 WO 2019111758A1 JP 2018043551 W JP2018043551 W JP 2018043551W WO 2019111758 A1 WO2019111758 A1 WO 2019111758A1
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- WO
- WIPO (PCT)
- Prior art keywords
- work
- sheet
- adhesive layer
- pressure
- sensitive adhesive
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J7/00—Adhesives in the form of films or foils
- C09J7/20—Adhesives in the form of films or foils characterised by their carriers
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J133/00—Adhesives based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Adhesives based on derivatives of such polymers
- C09J133/04—Homopolymers or copolymers of esters
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J2203/00—Applications of adhesives in processes or use of adhesives in the form of films or foils
- C09J2203/326—Applications of adhesives in processes or use of adhesives in the form of films or foils for bonding electronic components such as wafers, chips or semiconductors
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J2301/00—Additional features of adhesives in the form of films or foils
- C09J2301/30—Additional features of adhesives in the form of films or foils characterized by the chemical, physicochemical or physical properties of the adhesive or the carrier
- C09J2301/312—Additional features of adhesives in the form of films or foils characterized by the chemical, physicochemical or physical properties of the adhesive or the carrier parameters being the characterizing feature
Definitions
- the present invention relates to a work processing sheet that can be suitably used for dicing, and a method of manufacturing a processed work using the work processing sheet.
- semiconductor wafers such as silicon and gallium arsenide and various packages (hereinafter, these may be collectively referred to as "objects to be cut") are manufactured in a large diameter state, and these are element chips (hereinafter, “elements” After being cut (diced) into chips and separated (picked up) individually, they are transferred to the next step, the mounting step.
- a workpiece such as a semiconductor wafer is subjected to dicing, cleaning, drying, expanding, pickup and mounting steps in a state of being attached to a work processing sheet provided with a base material and an adhesive layer. Ru.
- the dicing blade, the workpiece and the work processing sheet are heated by the frictional heat generated between the rotating dicing blade and the workpiece or the work processing sheet.
- a cut piece may be generated from a workpiece or a sheet for processing a work, which may adhere to the workpiece.
- Patent Document 1 discloses that the contact angle to pure water of the surface of the pressure-sensitive adhesive layer on the side opposite to the base material before ultraviolet irradiation is 82 ° to 114 ° for the purpose of promoting the removal of the cutting pieces by the flowing water. There is disclosed a work processing sheet having a contact angle of 44 ° to 64 ° to methylene iodide and a peak value of probe tack test of 294 to 578 kPa in the pressure-sensitive adhesive layer before ultraviolet irradiation. .
- water may infiltrate into the interface between the work processing sheet and the workpiece or the interface between the work processing sheet and the obtained chip due to the supply of flowing water at the time of dicing. . Such ingress of water may cause chipping or chipping.
- the present invention has been made in view of such a situation, and it is possible to suppress the infiltration of water at the interface between the work processing sheet and the workpiece or at the interface between the work processing sheet and the obtained chip.
- a work processing sheet capable of favorably removing the adhesive derived from the pressure-sensitive adhesive layer attached to the object to be cut during processing of the object to be cut such as a semiconductor wafer from the object to be cut with flowing water;
- An object of the present invention is to provide a method of manufacturing a processed work using the work processing sheet.
- the present invention is a sheet for processing a work comprising a substrate and an adhesive layer laminated on one side of the substrate, wherein the adhesive layer is active
- the silicon wafer of the work processing sheet comprising an energy ray curable adhesive, wherein the water contact angle of the surface of the adhesive layer opposite to the base is 50 ° or more and 80 ° or less
- the adhesive strength to the adhesive was F1
- the work processing sheet was immersed in distilled water at 23 ° C for 12 hours and further dried at 23 ° C for 24 hours, and the adhesion of the work processing sheet to the silicon wafer was F2.
- Decreasing rate of adhesion (%) ⁇ (F1-F2) / F1 ⁇ ⁇ 100
- the reduction rate of the adhesive strength calculated from the above is 20% or more and 50% or less.
- the work contact sheet and the object to be cut by the above-described water contact angle being in the above range and the reduction rate of the above adhesive strength being in the above range.
- the water contact angle mentioned above is in the above-mentioned range
- the pressure-sensitive adhesive constituting the pressure-sensitive adhesive layer has a predetermined affinity to water, and the reduction rate of the above-mentioned adhesion is in the above-mentioned range
- the adhesive force of the adhesive attached to the object to be cut is appropriately reduced by contact with water, whereby the adhesive attached to the object to be cut can be removed well by flowing water. It becomes possible.
- the said adhesive force F1 is 1000 mN / 25 mm or more and 10000 mN / 25 mm or less (invention 2).
- the said adhesive force F2 is 900 mN / 25 mm or more and 8000 mN / 25 mm or less (invention 3).
- the active energy ray-curable pressure-sensitive adhesive comprises methyl acrylate, 2-methoxyethyl (meth) acrylate, ethyl (meth) acrylate carbide as monomer units constituting a polymer.
- the pressure-sensitive adhesive is preferably formed from a pressure-sensitive adhesive composition containing an acrylic copolymer containing at least one selected from tall and methoxyethylene glycol (meth) acrylate (Invention 4).
- the present invention provides a bonding step of bonding a work with the surface of the pressure-sensitive adhesive layer opposite to the base in the work processing sheet (inventions 1 to 5), and the work processing A processing step of obtaining a processed work laminated on the work processing sheet by processing the work on a sheet, and irradiating the pressure-sensitive adhesive layer with an active energy ray, the pressure-sensitive adhesive layer And a separation step of separating the processed work from the work processing sheet after irradiation with an active energy ray, and curing the work processing sheet to lower the adhesion of the work processing sheet to the processed work.
- the present invention provides a method of manufacturing a processed work characterized by
- the sheet for processing a work according to the present invention cuts a semiconductor wafer or the like while suppressing the infiltration of water at the interface between the sheet for processing the work and the workpiece or at the interface between the sheet for processing the work and the obtained chip.
- the pressure-sensitive adhesive derived from the pressure-sensitive adhesive layer attached to the object to be cut during processing of the object can be favorably removed from the object to be cut by flowing water.
- the work processing sheet according to the present embodiment includes a base, and a pressure-sensitive adhesive layer laminated on one side of the base.
- the water contact angle of the surface on the side opposite to the substrate in the pressure-sensitive adhesive layer (hereinafter sometimes referred to as “pressure-sensitive surface”) is 50 °. Above, it is 80 degrees or less.
- a water contact angle means what was measured before an active energy ray is irradiated with respect to the sheet
- the pressure-sensitive adhesive layer exhibits an affinity to water excessively, and the penetration of water can not be suppressed. Chipping occurs.
- the water contact angle exceeds 80 ° the affinity of the pressure-sensitive adhesive forming the pressure-sensitive adhesive layer to water is insufficient, and the pressure-sensitive adhesive attached to the material to be cut can not be sufficiently removed by running water. It becomes.
- the water contact angle is preferably 55 ° or more, and particularly preferably 60 ° or more.
- the water contact angle is preferably 75 ° or less, and more preferably 70 ° or less.
- the detail of the measuring method of the water contact angle mentioned above is as having described in the test example mentioned later.
- the adhesion of the work processing sheet to the silicon wafer is F1
- the work processing sheet is immersed in distilled water at 23 ° C. for 12 hours, and further dried at 23 ° C. for 24 hours
- the adhesive force of the work processing sheet to the silicon wafer is F2
- the following formula (1) Decreasing rate of adhesion (%) ⁇ (F1-F2) / F1 ⁇ ⁇ 100
- the decrease rate of the adhesive strength calculated from the above is 20% or more and 50% or less.
- each of the adhesive force F1 and the adhesive force F2 is an adhesive force measured before the work processing sheet is irradiated with an active energy ray.
- the reduction rate of the adhesive strength described above is less than 20%, even after the adhesive derived from the adhesive layer is exposed to running water, the adhesive strength of the adhesive to the object to be cut is maintained.
- the adhesive adhering to the cut material can not be sufficiently removed by running water.
- the reduction rate of the adhesive strength exceeds 50%, the adhesive strength of the pressure-sensitive adhesive layer to the cut object is excessively reduced, and the cut object and the obtained chip are favorably held on the pressure-sensitive adhesive layer.
- the chip can not be removed, peeling of the material to be cut may occur, and chipping and chipping may occur during dicing.
- the reduction rate of the above-mentioned adhesive force is 23% or more. Moreover, it is preferable that the reduction rate of the adhesive force mentioned above is 40% or less.
- the above-mentioned adhesive force F1 is preferably 1000 mN / 25 mm or more, particularly preferably 2000 mN / 25 mm or more, and further preferably 3000 mN / 25 mm or more . Further, the adhesive force F1 is preferably 10000 mN / 25 mm or less, and particularly preferably 7000 mN / 25 mm or less.
- the above-mentioned adhesive force F2 is preferably 900 mN / 25 mm or more, particularly preferably 1500 mN / 25 mm or more, and further preferably 2000 mN / 25 mm or more. Is preferred. Further, the adhesive force F2 is preferably 8000 mN / 25 mm or less, and particularly preferably 5000 mN / 25 mm or less.
- the base material exerts a desired function in the process of using the work processing sheet, and preferably, the adhesive layer is cured There is no particular limitation as long as it exhibits good permeability to the active energy ray irradiated.
- the substrate is preferably a resin film mainly composed of a resin material, and as a specific example thereof, an ethylene-vinyl acetate copolymer film; an ethylene- (meth) acrylic acid copolymer film, Ethylene-based copolymer films such as ethylene- (meth) acrylate copolymer film and other ethylene- (meth) acrylate copolymer films; polyethylene film, polypropylene film, polybutene film, polybutadiene film, polymethylpentene Films, ethylene-norbornene copolymer films, polyolefin films such as norbornene resin film; polyvinyl chloride films such as polyvinyl chloride film, vinyl chloride copolymer film; polyethylene terephthalate film, polybutylene tere (Meth) acrylic acid ester copolymer film; polyurethane film; polyimide film; polystyrene films; polycarbonate films; tallate film, polyester films such as
- polyethylene films examples include low density polyethylene (LDPE) films, linear low density polyethylene (LLDPE) films, high density polyethylene (HDPE) films, and the like.
- modified films such as these crosslinked films and ionomer films are also used.
- the base material may be a laminated film in which a plurality of the films described above are laminated. In this laminated film, the materials constituting each layer may be the same or different.
- (meth) acrylic acid in this specification means both acrylic acid and methacrylic acid. The same applies to other similar terms.
- the substrate may contain various additives such as a flame retardant, a plasticizer, an antistatic agent, a lubricant, an antioxidant, a colorant, an infrared absorber, an ultraviolet absorber, an ion scavenger and the like.
- a flame retardant such as a flame retardant, a plasticizer, an antistatic agent, a lubricant, an antioxidant, a colorant, an infrared absorber, an ultraviolet absorber, an ion scavenger and the like.
- the content of these additives is not particularly limited, but it is preferable to set the range in which the substrate exhibits a desired function.
- the surface of the base on which the pressure-sensitive adhesive layer is to be laminated may be subjected to surface treatment such as primer treatment, corona treatment, plasma treatment, etc., in order to enhance adhesion with the pressure-sensitive adhesive layer.
- the thickness of the substrate can be appropriately set depending on the method in which the work processing sheet is used, in general, the thickness is preferably 20 ⁇ m or more, and particularly preferably 25 ⁇ m or more. The thickness is usually preferably 450 ⁇ m or less, particularly preferably 300 ⁇ m or less.
- the pressure-sensitive adhesive layer is made of an active energy ray-curable pressure-sensitive adhesive, and exerts a desired adhesion to a material to be cut
- the work processing sheet is not particularly limited as long as it can achieve the above-described reduction rate of water contact angle and adhesion.
- the pressure-sensitive adhesive layer is made of an active energy ray-curable pressure-sensitive adhesive, whereby when the object to be cut attached to the pressure-sensitive adhesive surface of the pressure-sensitive adhesive layer is separated from the adhesive surface, adhesion is performed by active energy ray irradiation.
- the agent layer can be cured to reduce the adhesion of the work processing sheet to the workpiece. This facilitates separation of the adhesive surface of the adhesive layer and the object to be cut.
- the active energy ray-curable pressure-sensitive adhesive constituting the pressure-sensitive adhesive layer may be a polymer having an active energy ray-curable property as a main component, or an active energy ray non-curable polymer (active energy ray-curable It may be based on a mixture of a polymer (not having a polymer) and a monomer and / or an oligomer having at least one active energy ray-curable group. In addition, it may be a mixture of a polymer having active energy ray curability and a non-active energy ray curable polymer. It may also be a mixture of a polymer having active energy ray curability and a monomer and / or oligomer having at least one or more active energy ray curable groups. Furthermore, it may be a mixture of a polymer having active energy ray curability, an active energy ray non-curable polymer, and a monomer and / or oligomer having at least one or more active energy ray curable groups.
- the active energy ray-curable adhesive is based on a polymer having an active energy ray-curable property.
- a polymer having active energy ray curability has a (meth) acrylic acid ester (co) polymer (A) (hereinafter referred to as) having a functional group (active energy ray curable group) having active energy ray curability in the side chain. It is preferable that it is "an active energy ray curable polymer (A)."
- the active energy ray-curable polymer (A) comprises an acrylic copolymer (a1) having a functional group-containing monomer unit and an unsaturated group-containing compound (a2) having a functional group to be bonded to the functional group. It is preferable that it is obtained by making it react.
- the acrylic copolymer (a1) may be referred to as a monomer for adjusting the hydrophilicity of the acrylic copolymer (a1) as a monomer unit constituting the polymer (hereinafter referred to as a "hydrophilic adjusting monomer".
- a monomer for adjusting the hydrophilicity of the acrylic copolymer (a1) as a monomer unit constituting the polymer hereinafter referred to as a "hydrophilic adjusting monomer”.
- the acrylic copolymer (a1) can be used as the monomer unit constituting the polymer, among the above-mentioned monomers, methyl acrylate, 2-methoxyethyl acrylate and methoxy acrylate. It is preferred to include at least one ethylene glycol.
- the content of methyl acrylate is preferably 10% by mass or more, and particularly preferably 20% by mass or more Is more preferable, and more preferably 30% by mass or more. Moreover, it is preferable that content of methyl acrylate is 85 mass% or less. It becomes easy to adjust the reduction rate of the water contact angle in the adhesive layer formed, and adhesive force by the range mentioned above by being these content.
- content (mass%) of the methyl acrylate mentioned above means content with respect to the all monomers which comprise an acryl-type copolymer (a1).
- the content (% by mass) of other monomers described later is also meant to be the content with respect to all the monomers constituting the acrylic copolymer (a1).
- the content of 2-methoxyethyl acrylate is preferably 10% by mass or more, In particular, the content is preferably 20% by mass or more, and more preferably 30% by mass or more. Further, the content of 2-methoxyethyl acrylate is preferably 85% by mass or less, particularly preferably 80% by mass or less, and further preferably 70% by mass or less. It becomes easy to adjust the reduction rate of the water contact angle in the adhesive layer formed, and adhesive force by the range mentioned above by being these content.
- the content of methyl acrylate and 2-methoxyethyl acrylate is The total value is preferably 10% by mass or more, particularly preferably 30% by mass or more, and further preferably 50% by mass or more. Moreover, it is preferable that the said sum total is 90 mass% or less, and it is preferable that it is especially 85 mass% or less. It becomes easy to adjust the reduction
- the acrylic copolymer (a1) contains methoxyethylene glycol acrylate as a monomer unit constituting a polymer
- the content of methoxyethylene glycol acrylate is preferably 10% by mass or more, and particularly preferably 30. It is preferable that it is mass% or more.
- the content of methoxyethylene glycol acrylate is preferably 85% by mass or less, and more preferably 80% by mass or less. It becomes easy to adjust the reduction rate of the water contact angle in the adhesive layer formed, and adhesive force by the range mentioned above by being these content.
- the acrylic copolymer (a1) preferably contains a constituent unit derived from a functional group-containing monomer and a constituent unit derived from a (meth) acrylic acid ester monomer or a derivative thereof, in addition to the above-mentioned hydrophilicity-adjusting monomer .
- the functional group-containing monomer as a constituent unit of the acrylic copolymer (a1) has, in its molecule, a polymerizable double bond and a functional group such as a hydroxy group, a carboxy group, an amino group, a substituted amino group or an epoxy group. It is preferable that it is a monomer which it has.
- hydroxy group-containing monomer examples include 2-hydroxyethyl (meth) acrylate, 2-hydroxypropyl (meth) acrylate, 3-hydroxypropyl (meth) acrylate, 2-hydroxybutyl (meth) acrylate, Examples thereof include 3-hydroxybutyl (meth) acrylate, 4-hydroxybutyl (meth) acrylate and the like, and these can be used alone or in combination of two or more.
- carboxy group-containing monomers examples include ethylenically unsaturated carboxylic acids such as acrylic acid, methacrylic acid, crotonic acid, maleic acid, itaconic acid, citraconic acid and the like. These may be used alone or in combination of two or more.
- amino group-containing monomer or substituted amino group-containing monomer examples include aminoethyl (meth) acrylate, n-butylaminoethyl (meth) acrylate and the like. These may be used alone or in combination of two or more.
- the acrylic copolymer (a1) preferably contains 1% by mass or more, particularly preferably 5% by mass or more, and further preferably 10% by mass or more of the structural unit derived from the functional group-containing monomer. It is preferable to do.
- the acrylic copolymer (a1) preferably contains 35% by mass or less, and particularly preferably 30% by mass or less, of the constituent unit derived from the functional group-containing monomer.
- (meth) acrylic acid ester monomer which comprises an acryl-type copolymer (a1), in addition to the (meth) acrylic-acid alkylester whose carbon number of an alkyl group is 1-20, for example, it is alicyclic in the molecule
- numerator A monomer having a structure (alicyclic structure-containing monomer) is preferably used.
- (meth) acrylic acid alkyl ester having, in particular, an alkyl group having 1 to 18 carbon atoms, such as methyl methacrylate, ethyl (meth) acrylate, propyl (meth) acrylate, N-butyl (meth) acrylate, 2-ethylhexyl (meth) acrylate and the like are preferably used.
- an alkyl group having 1 to 18 carbon atoms such as methyl methacrylate, ethyl (meth) acrylate, propyl (meth) acrylate, N-butyl (meth) acrylate, 2-ethylhexyl (meth) acrylate and the like are preferably used.
- One of these may be used alone, or two or more of these may be used in combination.
- Examples of the alicyclic structure-containing monomer include cyclohexyl (meth) acrylate, dicyclopentanyl (meth) acrylate, adamantyl (meth) acrylate, isobornyl (meth) acrylate, and dicyclopentenyl (meth) acrylate. And dicyclopentenyl oxyethyl (meth) acrylate are preferably used. One of these may be used alone, or two or more of these may be used in combination.
- the acrylic copolymer (a1) preferably contains 50% by mass or more, and particularly preferably 60% by mass or more of structural units derived from the (meth) acrylic acid ester monomer or its derivative. Furthermore, it is preferable to contain 70 mass% or more.
- the acrylic copolymer (a1) preferably contains a constituent unit derived from a (meth) acrylic acid ester monomer or a derivative thereof at 99% by mass or less, and particularly preferably at 95% by mass or less Preferably, the content is further 90% by mass or less.
- the acrylic copolymer (a1) is preferably obtained by copolymerizing the above-mentioned hydrophilicity adjusting monomer, a functional group-containing monomer, and a (meth) acrylic acid ester monomer or a derivative thereof in a conventional manner
- dimethyl acrylamide, vinyl formate, vinyl acetate, styrene or the like may be copolymerized.
- An active energy ray-curable polymer (A) can be reacted by reacting the acrylic copolymer (a1) having the functional group-containing monomer unit with the unsaturated group-containing compound (a2) having a functional group to be bonded to the functional group. A) is obtained.
- the functional group which an unsaturated group containing compound (a2) has can be suitably selected according to the kind of functional group of the functional group containing monomer unit which an acryl-type copolymer (a1) has.
- the functional group possessed by the acrylic copolymer (a1) is a hydroxy group, an amino group or a substituted amino group, an isocyanate group or an epoxy group is preferable as the functional group possessed by the unsaturated group-containing compound (a2).
- the functional group possessed by the copolymer (a1) is an epoxy group
- the functional group possessed by the unsaturated group-containing compound (a2) is preferably an amino group, a carboxy group or an aziridinyl group.
- the above unsaturated group-containing compound (a2) contains at least one, preferably 1 to 6, and more preferably 1 to 4 active energy ray-polymerizable carbon-carbon double bonds in one molecule. It is done.
- Specific examples of such unsaturated group-containing compound (a2) include 2-methacryloyloxyethyl isocyanate, meta-isopropenyl- ⁇ , ⁇ -dimethylbenzyl isocyanate, methacryloyl isocyanate, allyl isocyanate, 1,1- Bisacryloyloxymethyl) ethyl isocyanate; acryloyl monoisocyanate compound obtained by reaction of diisocyanate compound or polyisocyanate compound with hydroxyethyl (meth) acrylate; diisocyanate compound or polyisocyanate compound, polyol compound, (meth) acrylic acid Acryloyl monoisocyanate compounds obtained by reaction with hydroxyethyl acid; glycidyl (meth)
- the above-mentioned unsaturated group-containing compound (a2) is preferably at least 50 mol%, particularly preferably at least 60 mol%, more preferably with respect to the number of moles of the functional group-containing monomer of the acrylic copolymer (a1). It is used in the ratio of 70 mol% or more.
- the unsaturated group-containing compound (a2) is preferably 95 mol% or less, particularly preferably 93 mol% or less, based on the number of moles of the functional group-containing monomer of the acrylic copolymer (a1). Preferably, it is used in a proportion of 90 mol% or less.
- the functional group of the acrylic copolymer (a1) and the functional group of the unsaturated group-containing compound (a2) Depending on the combination, the reaction temperature, pressure, solvent, time, presence or absence of catalyst, and type of catalyst can be appropriately selected. Thereby, the functional group present in the acrylic copolymer (a1) and the functional group in the unsaturated group-containing compound (a2) react with each other, and the unsaturated group in the acrylic copolymer (a1) It is introduced into a side chain to obtain an active energy ray-curable polymer (A).
- the weight average molecular weight (Mw) of the active energy ray curable polymer (A) thus obtained is preferably 10,000 or more, particularly preferably 150,000 or more, and further preferably 200,000 or more. Preferably there. Further, the weight average molecular weight (Mw) is preferably 1.5 million or less, and particularly preferably 1 million or less. In addition, the weight average molecular weight (Mw) in this specification is a value of standard polystyrene conversion measured by the gel permeation chromatography method (GPC method).
- the active energy ray-curable pressure-sensitive adhesive is mainly composed of an active energy ray-curable polymer such as an active energy ray-curable polymer (A)
- the active energy ray-curable pressure sensitive adhesive It may further contain a linear curable monomer and / or oligomer (B).
- active energy ray-curable monomer and / or oligomer (B) for example, an ester of polyhydric alcohol and (meth) acrylic acid can be used.
- Examples of such active energy ray curable monomers and / or oligomers (B) include monofunctional acrylic acid esters such as cyclohexyl (meth) acrylate and isobornyl (meth) acrylate, trimethylolpropane tri (meth) acrylate, Pentaerythritol tri (meth) acrylate, pentaerythritol tetra (meth) acrylate, dipentaerythritol hexa (meth) acrylate, 1,4-butanediol di (meth) acrylate, 1,6-hexanediol di (meth) acrylate, polyethylene Multifunctional acrylic acid esters such as glycol di (meth) acrylate and dimethylol tricyclodecane di (meth) acrylate, polyester oligo (meth) acrylate, polyurethane oligo ( Data) acrylate, and the like.
- monofunctional acrylic acid esters such as
- the active energy ray-curable monomer and / or oligomer (B) When an active energy ray-curable monomer and / or oligomer (B) is blended with the active energy ray-curable polymer (A), the active energy ray-curable monomer and / or in the active energy ray-curable adhesive
- the content of the oligomer (B) is preferably more than 0 parts by mass, particularly preferably 60 parts by mass or more, with respect to 100 parts by mass of the active energy ray-curable polymer (A). Further, the content is preferably 250 parts by mass or less, particularly preferably 200 parts by mass or less, with respect to 100 parts by mass of the active energy ray-curable polymer (A).
- photopolymerization initiator (C) examples include benzophenone, acetophenone, benzoin, benzoin methyl ether, benzoin ethyl ether, benzoin isopropyl ether, benzoin isobutyl ether, benzoin benzoic acid, methyl benzoin benzoate, benzoin dimethyl ketal, 2,4-diethylthioxanthone, 1-hydroxycyclohexyl phenyl ketone, benzyl diphenyl sulfide, tetramethyl thiuram monosulfide, azobisisobutyronitrile, benzyl, dibenzyl, diacetyl, ⁇ -chloroanthraquinone, (2,4, 6-trimethylbenzyl diphenyl) phosphine oxide, 2-benzothiazole-N, N-diethyldithiocarbamate, oligo ⁇ 2-hydroxy-2-me Le-1- [
- the photopolymerization initiator (C) is an active energy ray curable polymer (A) (when the active energy ray curable monomer and / or oligomer (B) is blended, the active energy ray curable polymer (A) And at least 0.1 part by weight, in particular at least 0.5 parts by weight, per 100 parts by weight of the total amount of 100 parts by weight of the monomer and / or oligomer (B). preferable.
- the photopolymerization initiator (C) is an active energy ray curable polymer (A) (in the case of blending an active energy ray curable monomer and / or oligomer (B), an active energy ray curable polymer It is preferably used in an amount of 10 parts by mass or less, particularly 6 parts by mass or less, based on 100 parts by mass of (A) and the total amount 100 parts by mass of the active energy ray curable monomer and / or oligomer (B).
- active energy ray-curable pressure-sensitive adhesive in addition to the above components, other components may be appropriately blended.
- an active energy ray non-hardening polymer component or oligomer component (D), a crosslinking agent (E) etc. are mentioned, for example.
- Examples of the active energy ray non-curable polymer component or oligomer component (D) include polyacrylic esters, polyesters, polyurethanes, polycarbonates, polyolefins and the like, and polymers having a weight average molecular weight (Mw) of 3,000 to 2,500,000 or Oligomers are preferred.
- Mw weight average molecular weight
- Oligomers are preferred.
- the compounding quantity of the said component (D) is not specifically limited, With respect to 100 mass parts of active energy ray curable polymers (A), it determines suitably in more than 0 mass part and 50 mass parts or less.
- the polyfunctional compound which has the reactivity with the functional group which the active energy ray curable polymer (A) etc. have can be used.
- examples of such polyfunctional compounds include isocyanate compounds, epoxy compounds, amine compounds, melamine compounds, aziridine compounds, hydrazine compounds, aldehyde compounds, oxazoline compounds, metal alkoxide compounds, metal chelate compounds, metal salts, ammonium salts, Reactive phenol resin etc. can be mentioned.
- the compounding amount of the crosslinking agent (E) is preferably 0.01 parts by mass or more, particularly preferably 3 parts by mass or more, per 100 parts by mass of the active energy ray-curable polymer (A).
- the amount of the crosslinking agent (E) is preferably 20 parts by mass or less, and more preferably 17 parts by mass or less, based on 100 parts by mass of the active energy ray-curable polymer (A).
- the active energy ray curable adhesive is based on a mixture of an active energy ray non-curable polymer component and a monomer and / or oligomer having at least one active energy ray curable group, It will be described below.
- the active energy ray non-curable polymer component for example, the same component as the acrylic copolymer (a1) described above can be used.
- the same one as the component (B) described above can be selected.
- the compounding ratio of the active energy ray non-curable polymer component to the monomer and / or oligomer having at least one or more active energy ray curable groups is at least 1 with respect to 100 parts by mass of the active energy ray non-curable polymer component. It is preferable that it is 1 mass part or more of a monomer and / or oligomer which has two or more active energy ray curable groups, and it is especially preferable that it is 60 mass parts or more.
- the compounding ratio is preferably 200 parts by mass or less of a monomer and / or oligomer having at least one or more active energy ray-curable groups with respect to 100 parts by mass of the active energy ray non-curable polymer component, In particular, the amount is preferably 160 parts by mass or less.
- the photopolymerization initiator (C) and the crosslinking agent (E) can be appropriately blended in the same manner as described above.
- the thickness of the pressure-sensitive adhesive layer is preferably 1 ⁇ m or more, and more preferably 5 ⁇ m or more.
- the thickness is preferably 50 ⁇ m or less, more preferably 40 ⁇ m or less.
- the release sheet is laminated on the surface for the purpose of protecting the surface until the adhesive surface of the pressure-sensitive adhesive layer is attached to the object to be cut.
- the configuration of the release sheet is optional, and examples thereof include those obtained by release treatment of a plastic film with a release agent or the like.
- Specific examples of the plastic film include polyester films such as polyethylene terephthalate, polybutylene terephthalate and polyethylene naphthalate, and polyolefin films such as polypropylene and polyethylene.
- the release agent silicone type, fluorine type, long chain alkyl type and the like can be used, and among these, silicone type is preferable because inexpensive and stable performance can be obtained.
- the thickness of the release sheet is not particularly limited, but is usually 20 ⁇ m or more and 250 ⁇ m or less.
- an adhesive layer may be laminated on the adhesive surface of the adhesive layer.
- the work processing sheet according to the present embodiment can be used as a dicing / die bonding sheet by providing the adhesive layer as described above.
- a cut object is attached to the surface of the adhesive layer opposite to the pressure-sensitive adhesive layer, and the adhesive layer is singulated by dicing the adhesive layer together with the cut object.
- a chip on which the agent layer is laminated can be obtained. The chip can be easily fixed to an object on which the chip is mounted by the separated adhesive layer.
- thermosetting adhesive component As a material constituting the adhesive layer described above, a material containing a thermoplastic resin and a thermosetting adhesive component having a low molecular weight, a material containing a B-stage (semi-hardened) thermosetting adhesive component, etc. It is preferred to use.
- a protective film formation layer may be laminated
- the work processing sheet according to the present embodiment can be used as a protective film forming and dicing sheet.
- an object to be cut is attached to the surface of the protective film forming layer opposite to the adhesive layer, and the protective film forming layer is diced together with the object to be cut.
- stacked can be obtained.
- a protective film-forming layer is usually laminated on the side opposite to the side on which the circuit is formed.
- the protective film forming layer separated into pieces can be cured at a predetermined timing to form a protective film having sufficient durability on the chip.
- the protective film-forming layer preferably comprises an uncured curable adhesive.
- seat for work processing which concerns on this embodiment satisfy
- the adhesive bond layer or protective film formation layer mentioned above with respect to the adhesive layer is laminated
- the above-described water contact angle and adhesion may be satisfied.
- the method of manufacturing a sheet for processing of work according to the present embodiment is not particularly limited.
- the sheet for processing of work according to the present embodiment has a pressure-sensitive adhesive layer laminated on one side of a substrate. It is manufactured by doing.
- the lamination of the pressure-sensitive adhesive layer on one side of the substrate can be carried out by a known method.
- a pressure-sensitive adhesive composition constituting the pressure-sensitive adhesive layer, and, if desired, a coating liquid containing a solvent or a dispersion medium if desired may be called a release-treated surface (hereinafter referred to as "release surface").
- release surface a release-treated surface
- the above coating solution is applied on a die coater, curtain coater, spray coater, slit coater, knife coater or the like to form a coating film, and the coating film is dried to form a pressure-sensitive adhesive layer. be able to.
- the coating liquid is not particularly limited in its properties as long as it can be applied, and may contain a component for forming a pressure-sensitive adhesive layer as a solute or a dispersoid.
- the release sheet in this laminate may be released as a process material, or may be used to protect the adhesive surface of the pressure-sensitive adhesive layer until the work processing sheet is attached to a workpiece.
- the inside of the coating film can be obtained by changing the above-mentioned drying conditions (temperature, time, etc.) or by separately providing a heat treatment.
- the crosslinking reaction of the active energy ray curable polymer (A) or the active energy ray non-curable polymer and the crosslinking agent may be advanced to form a crosslinked structure at a desired density in the pressure-sensitive adhesive layer.
- the obtained work processing sheet is, for example, several days in an environment of 23 ° C. and 50% relative humidity. You may do the curing such as leaving still.
- the pressure-sensitive adhesive layer may be formed directly on the substrate.
- the coating liquid for forming the pressure-sensitive adhesive layer described above is applied to one side of the substrate to form a coating, and the coating is dried to form the pressure-sensitive adhesive layer.
- the sheet for processing a work according to the present embodiment can be used for processing a work (object to be cut). That is, after the adhesive surface of the work processing sheet according to the present embodiment is attached to the work, the work can be processed on the work processing sheet.
- seat for work processing which concerns on this embodiment can be used as a back grind sheet, a dicing sheet, an expand sheet, a pickup sheet etc.
- the object to be cut include a semiconductor wafer, a semiconductor member such as a semiconductor package, and a glass member such as a glass plate.
- seat for workpiece processing which concerns on this embodiment is equipped with the adhesive bond layer mentioned above, the said sheet
- the pressure-sensitive adhesive derived from the pressure-sensitive adhesive layer adheres to the object to be cut, the pressure-sensitive adhesive can be easily removed by flowing water, and It is suppressed that the water resulting from the said flowing water infiltrates into the interface of a sheet
- seat for work processing which concerns on this embodiment as a dicing sheet
- general conditions can be used as the conditions of dicing and the supply conditions of flowing water.
- the supply conditions of running water it is preferable to use pure water or the like as the water used.
- the amount of water supplied is preferably 0.5 L / min or more, and more preferably 1 L / min or more.
- the amount of water supplied is preferably 2.5 L / min or less, and more preferably 2 L / min or less.
- the temperature of water is not specifically limited, For example, it is preferable to set it as about room temperature.
- a bonding step of bonding a work to the surface of the pressure-sensitive adhesive layer of the work processing sheet described above opposite to the base, and work processing The processing step of obtaining the processed work stacked on the work processing sheet by processing the work on the work sheet, and irradiating the pressure-sensitive adhesive layer with an active energy ray to cure the pressure-sensitive adhesive layer And an irradiation step of reducing the adhesion of the work processing sheet to the processed work, and a separation step of separating the processed work from the work processing sheet after the active energy ray irradiation.
- the work processing sheet used in the method of manufacturing a processed work of the present embodiment can be used during work processing while suppressing the infiltration of water at the interface between the work processing sheet and the work or the work after processing.
- the adhesive adhering to the work can be removed well by running water. Therefore, according to the method of manufacturing a processed work of the present embodiment, it is possible to efficiently manufacture the processed work.
- the bonding of the work and the work processing sheet in the bonding process can be performed by a conventionally known method.
- the workpiece to be used may be a desired one according to the processed workpiece to be manufactured, and as a specific example, the above-mentioned one can be used.
- processing Step desired processing can be performed on the workpiece, and for example, back grinding, dicing, etc. can be performed. These processes can be performed by a conventionally known method.
- the processing in the present embodiment is preferably dicing, and particularly preferably blade dicing using a rotating blade.
- the conditions for irradiation of the active energy ray are not limited, and based on the conventionally known methods. It can be carried out.
- the type of active energy ray to be used include ionizing radiation, that is, X-rays, ultraviolet rays, electron beams, etc. Among them, ultraviolet rays which are relatively easy to introduce irradiation equipment are preferable.
- Separation step separation is performed according to the type of processing and the obtained processed workpiece. For example, when dicing is performed as processing and a chip in which the work is separated is obtained by the dicing, the obtained chips are individually obtained from the work processing sheet using a conventionally known pickup device. Pick up. Moreover, in order to make the said pickup easy, the sheet
- steps other than the above-described steps may be provided.
- a transport step of transporting the laminate of the obtained work and the work processing sheet to a predetermined position or a storage step of storing the laminate for a predetermined period.
- a mounting step or the like may be provided in which the obtained processed workpiece is mounted on a predetermined base or the like.
- another layer may be provided between the substrate and the pressure-sensitive adhesive layer, or on the surface of the substrate opposite to the pressure-sensitive adhesive layer.
- Example 1 Preparation of adhesive composition
- Acrylic copolymer obtained by copolymerizing 20 parts by mass of methyl acrylate, 60 parts by mass of 2-methoxyethyl acrylate, and 20 parts by mass of 2-hydroxyethyl acrylate
- the coalescence is reacted with 21.4 g (corresponding to 80 mol% based on the number of moles of 2-hydroxyethyl acrylate) of methacryloyloxyethyl isocyanate (MOI) with respect to 100 g of the acrylic copolymer.
- An active energy ray-curable polymer was obtained. It was 600,000 when the weight average molecular weight (Mw) of this active energy ray curable polymer was measured by the method mentioned later.
- the weight average molecular weight (Mw) mentioned above is a weight average molecular weight of standard polystyrene conversion measured (GPC measurement) using gel permeation chromatography (GPC).
- Examples 2 to 6 and Comparative Examples 1 to 4 A work processing sheet was produced in the same manner as in Example 1 except that the composition of the acrylic copolymer was changed as shown in Table 1, and the content of the crosslinking agent was changed as shown in Table 2.
- the release sheet was peeled off from the work processing sheet produced in the example and the comparative example, and the exposed surface of the exposed pressure-sensitive adhesive layer was immersed in distilled water at 23 ° C. for 12 hours, and then dried at 23 ° C. for 24 hours. Thereafter, the exposed surface was superposed on the mirror surface of a 6-inch silicon wafer mirror-finished, and a load of 2 kg was made to reciprocate by 1 reciprocation for bonding, and left for 20 minutes. Subsequently, the work processing sheet is peeled from the silicon wafer at a peeling speed of 300 mm / min and a peeling angle of 180 °, and the silicon wafer after the above immersion and drying is performed by the 180 ° peeling method according to JIS Z0237: 2009. The adhesive force F2 (mN / 25 mm) was measured. The results are shown in Table 3.
- the release sheet is peeled off from the work processing sheet manufactured in the example and the comparative example, and a tape mounter (product name: "Adwill RAD 2500 m / 12" manufactured by Lintec Corporation) is used on the exposed surface of the exposed adhesive layer.
- a tape mounter product name: "Adwill RAD 2500 m / 12" manufactured by Lintec Corporation
- the surface opposite to the surface to which the small piece of the 6-inch silicon wafer was attached was attached.
- a dicing apparatus manufactured by Disco, product name “DFD-6361”
- an operation simulating dicing performed from the 6-inch silicon wafer side while supplying flowing water to the cutting portion under the following operating conditions is performed. went.
- the work processing sheet of the present invention can be suitably used for dicing.
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Adhesive Tapes (AREA)
- Adhesives Or Adhesive Processes (AREA)
- Dicing (AREA)
- Polishing Bodies And Polishing Tools (AREA)
- Details Of Cutting Devices (AREA)
- Perforating, Stamping-Out Or Severing By Means Other Than Cutting (AREA)
Abstract
L'invention concerne une feuille pour usinage de pièces qui est équipée d'un matériau de base et d'une couche d'adhésif. Ladite couche d'adhésif est configurée par un adhésif durcissable par rayonnement d'énergie active. L'angle de contact avec l'eau de ladite couche d'adhésif est supérieur ou égal à 50° et inférieur ou égal à 80°. Le taux de réduction de la force d'adhésion calculé à partir de taux de réduction de force d'adhésion (%)={(F1-F2)/F1}×100 pour une force d'adhésion (F1) sur une tranche de silicium, et une force d'adhésion (F2) sur une tranche de silicium, après immersion pendant 12 heures de ladite feuille pour usinage de pièces dans une eau distillée à 23°C, et séchage pendant 24 heures à 23°C, est supérieur ou égal à 20% et inférieur ou égal à 50%. La feuille pour usinage de pièces de l'invention est telle que tout en permettant d'inhiber une infiltration d'eau à l'interface de la feuille pour usinage de pièces et d'un objet à découper ou d'une puce obtenue, il est possible de retirer de manière satisfaisante de l'objet à découper à l'eau courante un adhésif provenant de la couche d'adhésif en adhésion sur l'objet à découper lors de l'usinage d'un objet à découper pour une tranche semi-conductrice, ou similaire.
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2019558148A JP7086102B2 (ja) | 2017-12-07 | 2018-11-27 | ワーク加工用シートおよび加工済みワークの製造方法 |
| KR1020207008250A KR102579051B1 (ko) | 2017-12-07 | 2018-11-27 | 워크 가공용 시트 및 가공된 워크의 제조방법 |
| CN201880063343.9A CN111164738B (zh) | 2017-12-07 | 2018-11-27 | 工件加工用片及已加工工件的制造方法 |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2017235375 | 2017-12-07 | ||
| JP2017-235375 | 2017-12-07 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| WO2019111758A1 true WO2019111758A1 (fr) | 2019-06-13 |
Family
ID=66750968
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| PCT/JP2018/043551 Ceased WO2019111758A1 (fr) | 2017-12-07 | 2018-11-27 | Feuille pour usinage de pièces, et procédé de fabrication de pièces usinées |
Country Status (5)
| Country | Link |
|---|---|
| JP (1) | JP7086102B2 (fr) |
| KR (1) | KR102579051B1 (fr) |
| CN (1) | CN111164738B (fr) |
| TW (1) | TWI791695B (fr) |
| WO (1) | WO2019111758A1 (fr) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2021061347A (ja) * | 2019-10-08 | 2021-04-15 | 積水化学工業株式会社 | 半導体加工用テープ及び半導体パッケージの製造方法 |
| WO2024029315A1 (fr) * | 2022-08-03 | 2024-02-08 | 株式会社レゾナック | Procédé de production de résine (méth)acrylique et procédé de production de composition adhésive |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP7409030B2 (ja) * | 2019-11-15 | 2024-01-09 | 株式会社レゾナック | ダイシング・ダイボンディング一体型フィルム及びその製造方法、並びに半導体装置の製造方法 |
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| JP2007220694A (ja) * | 2005-05-16 | 2007-08-30 | Nitto Denko Corp | ダイシング用粘着シート及びそれを用いた被加工物の加工方法 |
| WO2008133104A1 (fr) * | 2007-04-20 | 2008-11-06 | Nitto Denko Corporation | Feuille adhésive sensible à la pression pour découpage en dés au laser sous jet d'eau |
| JP2011184576A (ja) * | 2010-03-09 | 2011-09-22 | Hitachi Maxell Ltd | 放射線硬化性粘着剤組成物、それを用いたダイシング用粘着フィルム、及び切断片の製造方法 |
| WO2016140176A1 (fr) * | 2015-03-02 | 2016-09-09 | 古河電気工業株式会社 | Ruban adhésif pour protéger une surface de plaquette de semi-conducteur, et procédé de traitement d'une plaquette de semi-conducteur |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| JPS5352496Y2 (fr) | 1973-06-21 | 1978-12-15 | ||
| JP6390034B2 (ja) | 2014-08-01 | 2018-09-19 | リンテック株式会社 | 粘着シート |
| JP6464196B2 (ja) * | 2015-01-14 | 2019-02-06 | リンテック株式会社 | 樹脂膜形成用シート、樹脂膜形成用複合シート、及びシリコンウエハの再生方法 |
| JP6587811B2 (ja) * | 2015-02-24 | 2019-10-09 | 日東電工株式会社 | 熱剥離型粘着シート |
| TW201710426A (zh) * | 2015-09-15 | 2017-03-16 | Furukawa Electric Co Ltd | 半導體晶圓加工用黏著帶、該黏著帶之製造方法及半導體晶圓之加工方法 |
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2018
- 2018-11-27 WO PCT/JP2018/043551 patent/WO2019111758A1/fr not_active Ceased
- 2018-11-27 CN CN201880063343.9A patent/CN111164738B/zh active Active
- 2018-11-27 KR KR1020207008250A patent/KR102579051B1/ko active Active
- 2018-11-27 JP JP2019558148A patent/JP7086102B2/ja active Active
- 2018-11-30 TW TW107142908A patent/TWI791695B/zh active
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2007220694A (ja) * | 2005-05-16 | 2007-08-30 | Nitto Denko Corp | ダイシング用粘着シート及びそれを用いた被加工物の加工方法 |
| WO2008133104A1 (fr) * | 2007-04-20 | 2008-11-06 | Nitto Denko Corporation | Feuille adhésive sensible à la pression pour découpage en dés au laser sous jet d'eau |
| JP2011184576A (ja) * | 2010-03-09 | 2011-09-22 | Hitachi Maxell Ltd | 放射線硬化性粘着剤組成物、それを用いたダイシング用粘着フィルム、及び切断片の製造方法 |
| WO2016140176A1 (fr) * | 2015-03-02 | 2016-09-09 | 古河電気工業株式会社 | Ruban adhésif pour protéger une surface de plaquette de semi-conducteur, et procédé de traitement d'une plaquette de semi-conducteur |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2021061347A (ja) * | 2019-10-08 | 2021-04-15 | 積水化学工業株式会社 | 半導体加工用テープ及び半導体パッケージの製造方法 |
| WO2024029315A1 (fr) * | 2022-08-03 | 2024-02-08 | 株式会社レゾナック | Procédé de production de résine (méth)acrylique et procédé de production de composition adhésive |
Also Published As
| Publication number | Publication date |
|---|---|
| TW201929075A (zh) | 2019-07-16 |
| JP7086102B2 (ja) | 2022-06-17 |
| KR102579051B1 (ko) | 2023-09-15 |
| JPWO2019111758A1 (ja) | 2020-12-10 |
| TWI791695B (zh) | 2023-02-11 |
| CN111164738B (zh) | 2023-03-28 |
| KR20200094726A (ko) | 2020-08-07 |
| CN111164738A (zh) | 2020-05-15 |
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