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WO2019189667A1 - Layered product for bonding, method for bonding two adherends, and method for producing bonded structure - Google Patents

Layered product for bonding, method for bonding two adherends, and method for producing bonded structure Download PDF

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Publication number
WO2019189667A1
WO2019189667A1 PCT/JP2019/013809 JP2019013809W WO2019189667A1 WO 2019189667 A1 WO2019189667 A1 WO 2019189667A1 JP 2019013809 W JP2019013809 W JP 2019013809W WO 2019189667 A1 WO2019189667 A1 WO 2019189667A1
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WIPO (PCT)
Prior art keywords
group
thermoplastic resin
resin layer
bonding
laminate
Prior art date
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PCT/JP2019/013809
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French (fr)
Japanese (ja)
Inventor
和恵 上村
宮田 壮
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Lintec Corp
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Lintec Corp
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Priority to KR1020207025273A priority Critical patent/KR102639338B1/en
Priority to JP2019570142A priority patent/JP6674594B2/en
Priority to CN201980023845.3A priority patent/CN111902509B/en
Publication of WO2019189667A1 publication Critical patent/WO2019189667A1/en
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

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    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J7/00Adhesives in the form of films or foils
    • C09J7/20Adhesives in the form of films or foils characterised by their carriers
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C65/00Joining or sealing of preformed parts, e.g. welding of plastics materials; Apparatus therefor
    • B29C65/02Joining or sealing of preformed parts, e.g. welding of plastics materials; Apparatus therefor by heating, with or without pressure
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C65/00Joining or sealing of preformed parts, e.g. welding of plastics materials; Apparatus therefor
    • B29C65/48Joining or sealing of preformed parts, e.g. welding of plastics materials; Apparatus therefor using adhesives, i.e. using supplementary joining material; solvent bonding
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C65/00Joining or sealing of preformed parts, e.g. welding of plastics materials; Apparatus therefor
    • B29C65/48Joining or sealing of preformed parts, e.g. welding of plastics materials; Apparatus therefor using adhesives, i.e. using supplementary joining material; solvent bonding
    • B29C65/52Joining or sealing of preformed parts, e.g. welding of plastics materials; Apparatus therefor using adhesives, i.e. using supplementary joining material; solvent bonding characterised by the way of applying the adhesive
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B37/00Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding
    • B32B37/12Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding characterised by using adhesives
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B37/00Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding
    • B32B37/14Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding characterised by the properties of the layers
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J201/00Adhesives based on unspecified macromolecular compounds
    • C09J201/02Adhesives based on unspecified macromolecular compounds characterised by the presence of specified groups, e.g. terminal or pendant functional groups
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J201/00Adhesives based on unspecified macromolecular compounds
    • C09J201/02Adhesives based on unspecified macromolecular compounds characterised by the presence of specified groups, e.g. terminal or pendant functional groups
    • C09J201/10Adhesives based on unspecified macromolecular compounds characterised by the presence of specified groups, e.g. terminal or pendant functional groups containing hydrolysable silane groups
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J5/00Adhesive processes in general; Adhesive processes not provided for elsewhere, e.g. relating to primers
    • C09J5/06Adhesive processes in general; Adhesive processes not provided for elsewhere, e.g. relating to primers involving heating of the applied adhesive
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J7/00Adhesives in the form of films or foils
    • C09J7/20Adhesives in the form of films or foils characterised by their carriers
    • C09J7/22Plastics; Metallised plastics
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J7/00Adhesives in the form of films or foils
    • C09J7/20Adhesives in the form of films or foils characterised by their carriers
    • C09J7/29Laminated material
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J7/00Adhesives in the form of films or foils
    • C09J7/30Adhesives in the form of films or foils characterised by the adhesive composition
    • C09J7/35Heat-activated
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J2301/00Additional features of adhesives in the form of films or foils
    • C09J2301/20Additional features of adhesives in the form of films or foils characterized by the structural features of the adhesive itself
    • C09J2301/208Additional features of adhesives in the form of films or foils characterized by the structural features of the adhesive itself the adhesive layer being constituted by at least two or more adjacent or superposed adhesive layers, e.g. multilayer adhesive

Definitions

  • the present invention relates to a bonding laminate having a molecular adhesive layer (a layer formed using a molecular adhesive; hereinafter the same), a method of bonding two adherends using the bonding laminate, And it is related with the manufacturing method of a joining structure.
  • Patent Document 1 discloses a method of bonding a base A and a base B, a step of forming a molecular adhesive layer on the surface of the base A using a specific molecular adhesive, and the surface of the base A
  • a bonding method is described which includes a step of disposing the base B so as to face the molecular adhesive, and a step of bonding the base A and the base B by applying a force to the base A and the base B.
  • Patent Document 1 as a method for forming a molecular adhesive layer on the surface of a substrate, a molecular adhesive solution in which a molecular adhesive is dissolved or dispersed is prepared, and after the substrate is immersed in the molecular adhesive solution, A method is described in which a chemical bond is formed between a molecular adhesive and the surface of a substrate by irradiating the object with ultraviolet rays, thereby forming a molecular adhesive layer.
  • a double-sided adhesive sheet having molecular adhesive layers on both sides of a substrate can be efficiently obtained by immersing the substrate in a molecular adhesive solution.
  • Such a double-sided adhesive sheet is useful as a bonding material when two adherends are easily and firmly fixed.
  • a roll-to-roll method is employed to mass-produce such a double-sided adhesive sheet, it has been difficult to stably form molecular adhesive layers on both sides of the substrate by an immersion method. Therefore, there has been a demand for a method capable of firmly joining two adherends using an adhesive sheet having a molecular adhesive layer obtained by employing a roll-to-roll method.
  • the present inventors examined a method of joining two adherends using a joining laminate having a molecular adhesive layer only on one surface. As a result, two laminates for bonding having a molecular adhesive layer on the thermoplastic resin layer were prepared, each molecular adhesive layer was bonded to each adherend, and two thermoplastic resin layers were further bonded. It has been found that two adherends can be bonded firmly by heat welding.
  • thermoplastic resin layer may be greatly deformed depending on the conditions at which the two thermoplastic resin layers are thermally welded.
  • the molecular adhesive layer may be deformed or the molecular adhesive may be deformed. There was a possibility that the adhesive strength of the layer might be reduced.
  • the present invention was made for the purpose of solving this problem, and is a bonding laminate having a molecular adhesive layer and a thermoplastic resin layer, without adversely affecting the molecular adhesive layer. It is an object of the present invention to provide a laminate for bonding capable of performing a heat welding step, a method for bonding two adherends using the laminate for bonding, and a method for manufacturing a bonded structure.
  • thermoplastic resin layer is composed of a first thermoplastic resin layer and a second thermoplastic resin layer.
  • the following laminates for bonding (1) to (6), the method of bonding the two adherends of (7) to (9), and the bonding structure of (10) to (11) A method of manufacturing a body is provided.
  • a molecular adhesive layer containing a molecular adhesive (M), a first thermoplastic resin layer having a single layer structure, and a second thermoplastic resin layer having a single layer structure or a multilayer structure are provided in this order.
  • the molecular adhesive layer and the second thermoplastic resin layer are each a laminate for bonding that constitutes the outermost layer in use, and the molecular adhesive (M) is an amino group, an azide group, a mercapto At least one selected from the group consisting of at least one reactive group (Z ⁇ ) selected from the group consisting of a group, an isocyanate group, a ureido group, and an epoxy group, a silanol group, and a group that generates a silanol group by a hydrolysis reaction.
  • Z ⁇ ) and chemical bond A thermoplastic resin having formed may reactive moiety structure (Z ⁇ ) are those containing a (P 1), heat-sealable temperature of the first thermoplastic resin layer is T h1, the second thermoplastic resin layer When the heat-sealable temperature of Th2 is Th2 , the laminated body for joining which is Th1 > Th2 .
  • the reactive group (Z ⁇ ) of the molecular adhesive (M) is at least one selected from the group consisting of an amino group, a mercapto group, an isocyanate group, a ureido group, and an epoxy group, and a thermoplastic resin (
  • the reactive partial structure (Z ⁇ ) of P 1 ) is at least one selected from the group consisting of a hydroxy group, a carboxy group, an aldehyde group, and an amino group, or the reaction that the molecular adhesive (M) has
  • the reactive group (Z ⁇ ) of the thermoplastic resin (P 1 ) is a carbon-carbon single bond, a carbon-carbon double bond, and a carbon-hydrogen single bond.
  • the laminate for bonding according to (1) which is at least one selected from the group consisting of: (3)
  • the bonding laminate according to (1) or (2), wherein the molecular adhesive (M) is a compound represented by the following formula (1).
  • R 1 is a reactive group (Z ⁇ ) selected from the group consisting of an amino group, an azide group, a mercapto group, an isocyanate group, a ureido group and an epoxy group, or a monovalent group having one or more of these reactive groups.
  • Z ⁇ a reactive group selected from the group consisting of an amino group, an azide group, a mercapto group, an isocyanate group, a ureido group and an epoxy group, or a monovalent group having one or more of these reactive groups.
  • G represents a divalent organic group
  • X represents a hydroxy group, an alkoxy having 1 to 10 carbon atoms.
  • thermoplastic resin (P 1 ) is at least one selected from the group consisting of olefin resins, cycloolefin resins, acrylic resins, olefin-vinyl acetate resins, olefin ionomer resins, and polyester resins.
  • the second thermoplastic resin layer has an olefin resin, a cycloolefin resin, an acrylic resin, an olefin-vinyl acetate resin, an olefin ionomer resin on at least the surface opposite to the molecular adhesive layer.
  • Step (L1) Step of bonding the molecular adhesive layer (AM) of the bonding laminate (A) and the adherend (I)
  • Step (L2) Molecular adhesive of the bonding laminate (B) Step (L3) for bonding the layer (BM) and the adherend (II): the second thermoplastic resin layer (A-2) of the laminate obtained in the step (L1)
  • B) molecular adhesive layer of the laminate obtained in step (M1) Step (M3) for bonding (AM) and adherend (I): molecular adhesive layer (BM) and adherend (II) of the laminate obtained in step (M2)
  • step (N2) Adherend (I), bonding laminate (A), bonding laminate (B), and adherend (II) are stacked in this order (step (N2): obtained in step (N1) Are heated, the adhesion between the molecular adhesive layer (AM) and the adherend (I), the adhesion between the molecular adhesive layer (BM) and the adherend (II), the second (8) performing the thermal welding of the thermoplastic resin layer (A-2) and the second thermoplastic resin layer (B-2) at the same time (8) performing the process group including the steps (L1) to (L3); A method of joining the adherend (I) and the adherend (II),
  • step (L1) the temperature at which the molecular adhesive layer (AM) of the bonding laminate (A) and the adherend (I) are bonded is T L1 , and in the step (L2), the bonding laminate
  • T L2 the temperature at which the molecular adhesive layer (BM) of the body (B) and the adherend (II) are bonded
  • thermoplastic resin layer (A-1) No. 1 is Th1A
  • the heat-sealable temperature of the second thermoplastic resin layer (A-2) is Th2A
  • the heat-sealable temperature of the first thermoplastic resin layer (B-1) is T h1B
  • the heat-sealable temperature of the second thermoplastic resin layer (B-2) is Th2B .
  • the temperature at the time of heat welding is TN2
  • at least one of the following formulas (E-5) and (E-6) is satisfied: A method of joining the body (II).
  • a method for producing a bonded structure comprising bonding the adherend (I) and the adherend (II) using the method according to any one of (7) to (9).
  • the adherend (I) and the adherend (II) each independently include at least one selected from the group consisting of metals, inorganic substances, and thermosetting resins on the adherend surface.
  • the molecular adhesive refers to a compound having two or more reactive groups.
  • “Molecular adhesive containing” in the “molecular adhesive layer containing molecular adhesive” means “molecular adhesive and / or a compound derived from a molecular adhesive (for example, the structure of a reactive group has changed through a reaction).
  • Compound) ”.
  • “The first thermoplastic resin layer contains a thermoplastic resin having a reactive partial structure (Z ⁇ )” means “a thermoplastic resin having a reactive partial structure (Z ⁇ ) and / or derived from this thermoplastic resin. It includes a resin (for example, a resin that has undergone a reaction to change the structure of the reactive partial structure (Z ⁇ )).
  • the molecular adhesive layer and the second thermoplastic resin layer each constitute the outermost layer in use means that the molecular adhesive layer is adhered to the adherend or the second thermoplastic resin layers are bonded to each other. Each layer is the outermost layer when thermally welded. Therefore, the laminate for bonding may have a protective sheet or the like as the outermost layer after the laminate for manufacturing is used until it is used.
  • the “heat sealable temperature” of the thermoplastic resin layer is a temperature necessary for heat welding in order to achieve a sufficient heat seal strength. Specifically, according to the method described in the examples, heat seal Possible temperature can be determined.
  • thermoplastic resin layer and adherend are used when a heating press or the like is used.
  • a bonding laminate having a molecular adhesive layer and a thermoplastic resin layer capable of performing a heat welding step without adversely affecting the molecular adhesive layer
  • a method for bonding two adherends using the bonding laminate and a method for manufacturing a bonded structure are provided.
  • FIG. 5 is a schematic diagram showing an example of the manufacturing process of the laminated body for joining of this invention.
  • FIG. 5 is a schematic diagram showing a process group including processes (L1) to (L3).
  • FIG. 5 is a schematic diagram showing a process group including processes (M1) to (M3).
  • It is a schematic diagram showing the process group containing process (N1) and (N2).
  • the bonding laminate of the present invention has a molecular adhesive layer containing a molecular adhesive (M), a first thermoplastic resin layer having a single layer structure, and a single layer structure or a multilayer structure.
  • the molecular adhesive layer has a second thermoplastic resin layer in this order, and each of the molecular adhesive layer and the second thermoplastic resin layer constitutes an outermost layer at the time of use.
  • (M) is at least one reactive group (Z ⁇ ) selected from the group consisting of an amino group, an azido group, a mercapto group, an isocyanate group, a ureido group and an epoxy group, a silanol group, and a silanol group by hydrolysis reaction.
  • thermoplastic resin layer having at least one reactive group (Z ⁇ ) selected from the group consisting of groups that form a group
  • the first thermoplastic resin layer is at least on the surface in contact with the molecular adhesive layer
  • Molecular adhesion Those containing a thermoplastic resin (P 1) having a reactive group (M) reactive moieties capable of forming (Z ⁇ ) and the chemical bond (Z ⁇ ), heat-sealing of the first thermoplastic resin layer
  • T h1 the possible temperature
  • T h2 the heat-sealable temperature of the second thermoplastic resin layer
  • the molecular adhesive layer is a layer directly adjacent on the first thermoplastic resin layer.
  • the molecular adhesive layer is a layer constituting one of the outermost layers when the bonding laminate is used.
  • the molecular adhesive layer is used for adhesion to the adherend.
  • the molecular adhesive layer is a layer formed using the molecular adhesive (M) and includes the molecular adhesive (M). That is, the molecular adhesive layer in the bonding laminate is a reaction product of the molecular adhesive (M) (reactive group remaining) and the molecular adhesive (M) (reactive group structure changes). At least one of the above).
  • the molecular adhesive (M) includes at least one reactive group (Z ⁇ ) selected from the group consisting of an amino group, an azide group, a mercapto group, an isocyanate group, a ureido group, and an epoxy group, a silanol group, and a hydrolysis reaction.
  • Z ⁇ reactive group selected from the group consisting of an amino group, an azide group, a mercapto group, an isocyanate group, a ureido group, and an epoxy group, a silanol group, and a hydrolysis reaction.
  • Z ⁇ reactive group selected from the group consisting of an amino group, an azide group, a mercapto group, an isocyanate group, a ureido group, and an epoxy group, a silanol group, and a hydrolysis reaction.
  • the “amino group” of the reactive group (Z ⁇ ) includes an unsubstituted amino group, a mono-substituted amino group, a di-substituted amino group, a primary ammonium group, a secondary ammonium group, a tertiary ammonium group, and a quaternary ammonium group. Is included.
  • the reactive group (Z ⁇ ) in the molecular adhesive (M) is capable of forming a chemical bond with the reactive partial structure (Z ⁇ ) of the thermoplastic resin (P 1 ) in the first thermoplastic resin layer. .
  • the molecular adhesive (M) is chemically fixed to the surface of the first thermoplastic resin layer by this chemical bond.
  • Examples of the chemical bond at this time include a covalent bond, a hydrogen bond, an ionic bond, and an intermolecular force, and a covalent bond is preferable.
  • the reactive group (Z ⁇ ) in the molecular adhesive (M) is mainly used for forming a chemical bond with the adherend when the bonding laminate is bonded to the adherend. . Therefore, the laminate for bonding is preferably used for an adherend having a group having high reactivity with these groups on the surface.
  • Examples of the group that generates a silanol group by a hydrolysis reaction include a group having a partial structure represented by Si—X 1 .
  • X 1 is a hydrolyzable group such as an alkoxy group having 1 to 10 carbon atoms such as a methoxy group, an ethoxy group, an n-propoxy group or an isopropoxy group; a halogen atom such as a fluorine atom, a chlorine atom or a bromine atom; Can be mentioned.
  • Examples of the molecular adhesive (M) include a compound represented by the following formula (1).
  • R 1 represents a reactive group (Z ⁇ ) or a monovalent group having one or more reactive groups (Z ⁇ ) (excluding the reactive group (Z ⁇ ) itself), and G is a divalent group.
  • X represents a hydroxy group, an alkoxy group having 1 to 10 carbon atoms or a halogen atom
  • Y represents a hydrocarbon group having 1 to 20 carbon atoms
  • a represents an integer of 1 to 3 .
  • Examples of the monovalent group having one or more reactive groups (Z ⁇ ) for R 1 include groups represented by the following formulas (2) to (4).
  • R 2 represents a divalent hydrocarbon group having 1 to 10 carbon atoms, preferably a divalent hydrocarbon group having 2 to 6 carbon atoms.
  • Examples of the divalent hydrocarbon group for R 2 include alkylene groups such as ethylene group, trimethylene group and propylene group; and arylene groups such as o-phenylene group, m-phenylene group and p-phenylene group.
  • R 3 and R 4 each independently represents a hydrogen atom or a hydrocarbon group having 1 to 20 carbon atoms, preferably a hydrogen atom or a hydrocarbon group having 1 to 10 carbon atoms.
  • the hydrocarbon group for R 3 and R 4 include methyl group, ethyl group, n-propyl group, isopropyl group, n-butyl group, sec-butyl group, isobutyl group, t-butyl group, n-pentyl group, n Alkyl groups such as -hexyl group, n-heptyl group, n-octyl group, n-nonyl group, n-decyl group; vinyl group, 1-propenyl group, 2-propenyl group, isopropenyl group, 3-butenyl group, Alkenyl groups such as 4-pentenyl group and 5-hexenyl group; alkynyl groups such as ethynyl group, proparg
  • Z represents a single bond or a divalent group represented by —N (R 7 ) —.
  • R 7 represents a hydrogen atom or a hydrocarbon group having 1 to 20 carbon atoms. Examples of the hydrocarbon group for R 7 include the same as those shown as the hydrocarbon groups for R 3 and R 4 .
  • R 5 and R 6 are each independently a reactive group (Z ⁇ ) or a group represented by the above formula (2) (in this case, in formula (2), * is a bond with a carbon atom constituting an aromatic ring. Represents a hand.)
  • the divalent organic group for G has a substituent or an unsubstituted alkylene group having 1 to 20 carbon atoms, a substituent, or an unsubstituted alkenylene group having 2 to 20 carbon atoms, or a substituent. Or an unsubstituted alkynylene group having 2 to 20 carbon atoms, a substituted or unsubstituted arylene group having 6 to 20 carbon atoms, and the like.
  • Examples of the alkylene group having 1 to 20 carbon atoms of G include a methylene group, an ethylene group, a propylene group, a trimethylene group, a tetramethylene group, a pentamethylene group, and a hexamethylene group.
  • Examples of the alkenylene group having 2 to 20 carbon atoms of G include vinylene group, propenylene group, butenylene group, pentenylene group and the like.
  • Examples of the alkynylene group having 2 to 20 carbon atoms of G include an ethynylene group and a propynylene group.
  • Examples of the arylene group having 6 to 20 carbon atoms of G include o-phenylene group, m-phenylene group, p-phenylene group, 2,6-naphthylene group, 1,5-naphthylene group and the like.
  • Examples of the substituent for the alkylene group, alkenylene group, and alkynylene group include a halogen atom such as a fluorine atom and a chlorine atom; an alkoxy group such as a methoxy group and an ethoxy group; an alkylthio group such as a methylthio group and an ethylthio group; a methoxycarbonyl group; An alkoxycarbonyl group such as an ethoxycarbonyl group; and the like.
  • substituents for the arylene group include: a cyano group; a nitro group; a halogen atom such as a fluorine atom, a chlorine atom and a bromine atom; an alkyl group such as a methyl group and an ethyl group; an alkoxy group such as a methoxy group and an ethoxy group; And alkylthio groups such as ethylthio group; and the like.
  • substituents may be bonded to any position in a group such as an alkylene group, an alkenylene group, an alkynylene group and an arylene group.
  • a plurality of substituents may be bonded to a group such as an alkylene group, which are the same or different.
  • Examples of the alkoxy group having 1 to 10 carbon atoms of X include a methoxy group, an ethoxy group, an n-propoxy group, and an isopropoxy group.
  • Examples of the halogen atom for X include a fluorine atom, a chlorine atom, and a bromine atom.
  • Examples of the hydrocarbon group having 1 to 20 carbon atoms for Y include the same as those shown as the hydrocarbon groups for R 3 and R 4 .
  • molecular adhesive (M) examples include, but are not limited to, the following. 3-aminopropyltrimethoxysilane, 3-aminopropyltriethoxysilane, 3-aminopropyldimethoxymethylsilane, 3-aminopropyldiethoxymethylsilane, [3- (N, N-dimethylamino) propyl] trimethoxysilane, Molecules in which R 1 is an amino group such as [3- (phenylamino) propyl] trimethoxysilane, trimethyl [3- (triethoxysilyl) propyl] ammonium chloride, trimethyl [3- (trimethoxysilyl) propyl] ammonium chloride adhesive;
  • R 1 is an azide group, such as (11-azidoundecyl) trimethoxysilane, (11-azidoundecyl) triethoxysilane;
  • R 1 is a mercapto group, such as 3-mercaptopropyltrimethoxysilane, 3-mercaptopropyltriethoxysilane, 3-mercaptopropyldimethoxymethylsilane;
  • R 1 is an isocyanate group, such as 3- (trimethoxysilyl) propyl isocyanate, 3- (triethoxysilyl) propyl isocyanate;
  • R 1 is a ureido group, such as 3-ureidopropyltrimethoxysilane and 3-ureidopropyltriethoxysilane;
  • R 1 is an epoxy group such as 3-glycidoxypropyltrimethoxysilane, 3-glycidoxypropyltriethoxysilane, 3-glycidoxypropylmethyldimethoxysilane, 3-glycidoxypropylmethyldiethoxysilane adhesive;
  • R 1 is a monovalent group having one or more reactive groups (Z ⁇ ) such as (cyclohexyl) ethyltrimethoxysilane, compounds represented by the following formulas (5) to (13);
  • a molecular adhesive (M) can be used individually by 1 type or in combination of 2 or more types.
  • the compound represented by the formula (1) is preferably a compound in which R 1 is a group represented by the formula (4), more preferably the compounds represented by the formulas (5) to (13).
  • Compounds represented by formulas (5) to (10) are more preferable. These compounds have a triazine ring at R 1 .
  • the molecular adhesive (M) having a triazine ring tends to be more efficiently fixed on the first thermoplastic resin layer.
  • M a compound known as a silane coupling agent can be used.
  • R 1 is a group represented by the formula (4) is No. WO2012 / 046651, No. WO2012 / 043631, can be synthesized according to the method described in such as JP WO2013 / 186941.
  • the molecular adhesive layer may contain components other than the molecular adhesive (M).
  • components other than the molecular adhesive (M) include a catalyst.
  • the catalyst can be appropriately selected and used depending on the type of the reactive group (Z ⁇ ).
  • the content of the molecular adhesive (M) in the molecular adhesive layer is 50% on the basis of the whole molecular adhesive layer because the adhesive force of the molecular adhesive layer is reduced when a component not involved in adhesion is included. It is preferably at least mass%, more preferably at least 70 mass% and at most 100 mass%, further preferably at least 90 mass% and at most 100 mass%, particularly preferably at least 100 mass%.
  • the thickness of the molecular adhesive layer is preferably 200 nm or less, more preferably 150 nm or less, further preferably 100 nm or less, and particularly preferably 50 nm or less. Further, the thickness of the molecular adhesive layer is preferably 0.5 nm or more, and more preferably 1 nm or more.
  • the first thermoplastic resin layer is a layer adjacent to the molecular adhesive layer and plays a role of fixing the molecular adhesive (M).
  • the first thermoplastic resin layer has a single layer structure.
  • the first thermoplastic resin layer may have a uniform composition or a non-uniform composition.
  • the first thermoplastic resin layer may contain a lot of specific components near the surface of the layer, and the composition near the surface of the layer may be different from the composition inside the layer.
  • the first thermoplastic resin layer has at least a reactive partial structure (Z ⁇ ) capable of forming a chemical bond with the reactive group (Z ⁇ ) of the molecular adhesive (M) on the surface in contact with the molecular adhesive layer.
  • a thermoplastic resin (P 1 ) having That is, the first thermoplastic resin layer in the bonding laminate is a reaction product of the thermoplastic resin (P 1 ) (reactive partial structure (Z ⁇ ) remains) and the thermoplastic resin (P 1 ). And at least one of the products (reactive partial structures (Z ⁇ ) changed).
  • the surface on the side in contact with the molecular adhesive layer contains a thermoplastic resin (P 1 ) means that the surface of the first thermoplastic resin layer is thermoplastic before the molecular adhesive layer is formed.
  • thermoplastic resin (P 1) In the stage before forming the molecular adhesive layer, by a thermoplastic resin (P 1) is exposed on the surface of the first thermoplastic resin layer, the reactive moiety of the thermoplastic resin (P 1) ( Z ⁇ ) can efficiently react with the reactive group (Z ⁇ ) of the molecular adhesive (M).
  • thermoplastic resin (P 1 ) examples include olefin resins, cycloolefin resins, acrylic resins, olefin-vinyl acetate resins, olefin ionomer resins, and polyester resins.
  • olefin resin examples include low density polyethylene, linear low density polyethylene, high density polyethylene, ethylene-propylene copolymer, polypropylene, propylene- ⁇ -olefin copolymer, poly (4-methyl-1-pentene), etc. Is mentioned.
  • cycloolefin resins include cycloolefin addition polymers, copolymers of cycloolefins and ⁇ -olefins, and ring-opening polymers of norbornene monomers.
  • examples of the cycloolefin include cyclopentene, cyclooctene, and norbornene monomers.
  • examples of the ⁇ -olefin include ethylene and propylene.
  • acrylic resins homopolymers of (meth) acrylic monomers, copolymers of (meth) acrylic monomers, (meth) acrylic monomers, and single quantities copolymerizable therewith And a copolymer with the body.
  • (Meth) acrylic monomers include methyl (meth) acrylate, ethyl (meth) acrylate, n-propyl (meth) acrylate, n-butyl (meth) acrylate, 2-hydroxyethyl (meth) acrylate, 2- (Meth) acrylic acid esters such as ethylhexyl (meth) acrylate; (meth) acrylic acid; and the like.
  • Monomers copolymerizable with (meth) acrylic monomers include ethylene; aromatic vinyl monomers such as styrene, ⁇ -methylstyrene and chlorostyrene; cyano group-containing ethylene such as acrylonitrile and methacrylonitrile. Unsaturated monomers; (meth) acrylamide monomers such as (meth) acrylamide, N-methylol (meth) acrylamide, and N-butoxymethyl (meth) acrylamide;
  • (meth) acrylic acid means “acrylic acid or methacrylic acid”. The same applies to the same description of “(meth) acrylic acid ester”, “(meth) acrylic”, “(meth) acrylate”, and the like.
  • olefin-vinyl acetate resin examples include ethylene-vinyl acetate copolymers.
  • Examples of the olefinic ionomer resin include a copolymer having a repeating unit derived from an olefinic monomer and a repeating unit derived from a carboxy group-containing monomer, and a resin having an ionic cross-linking that links the copolymer chains. It is done.
  • Examples of the olefin monomer include ethylene and propylene.
  • Examples of the carboxy group-containing monomer include acrylic acid, methacrylic acid, maleic acid, maleic anhydride, maleic acid monomethyl ester, and maleic acid monoethyl ester.
  • the ionic crosslinking of the olefin ionomer resin is composed of a carboxylate ion generated by deprotonation of the carboxy group of the carboxy group-containing monomer and a metal ion.
  • Metal ions include sodium (I) ion, potassium (I) ion, lithium (I) ion, calcium (II) ion, magnesium (II) ion, zinc (II) ion, copper (I) ion, copper (II) ) Ion, cobalt (II) ion, cobalt (III) ion, nickel (II) ion, manganese (II) ion, aluminum (III) ion and the like.
  • polyester resin examples include those obtained by a polycondensation reaction of a polyvalent carboxylic acid and a polyhydric alcohol.
  • polyvalent carboxylic acid examples include terephthalic acid, isophthalic acid, phthalic acid, succinic acid, adipic acid, suberic acid, azelaic acid, sebacic acid, decanoic acid, 1,4-cyclohexanedicarboxylic acid, 1,4-naphthalenedicarboxylic acid, Examples include 2,6-naphthalenedicarboxylic acid, 1,8-naphthalenedicarboxylic acid, trimellitic acid, and the like.
  • polyhydric alcohols examples include ethylene glycol, propylene glycol, 1,4-butanediol, 2-methyl-1,3-propanediol, 1,5-pentanediol, neopentyl glycol, 3-methyl-1,5-pentane.
  • an amorphous polyester resin refers to a polyester resin that does not show a clear crystallization or crystal melting peak by DSC (differential scanning calorimetry).
  • Amorphous polyester resins include glycol-modified polyethylene terephthalate (PETG), glycol-modified poly (1,4-cyclohexanedimethylene terephthalate) (PCTG), acid-modified poly (1,4-cyclohexanedimethylene terephthalate) (PCTA), etc. Is mentioned.
  • thermoplastic resin (P 1) can be used in combination singly or two or more.
  • thermoplastic resin (P 1 ) has a reactive partial structure (Z ⁇ ) that can form a chemical bond with the reactive group (Z ⁇ ) of the molecular adhesive (M). Since the thermoplastic resin (P 1 ) has the reactive partial structure (Z ⁇ ), the molecular adhesive (M) can be efficiently fixed.
  • Examples of the reactive partial structure (Z ⁇ ) of the thermoplastic resin (P 1 ) include a hydroxy group, a carboxy group, an aldehyde group, an amino group, a carbon-carbon single bond, a carbon-carbon double bond, and a carbon-hydrogen single bond. Is mentioned. As described later, these can be appropriately selected according to the reactive group (Z ⁇ ) in the molecular adhesive (M).
  • thermoplastic resin (P 1 ) is a thermoplastic resin (P 1 ′) having a functional group such as a hydroxy group, a carboxy group, an aldehyde group, and an amino group as a reactive partial structure (Z ⁇ ),
  • a functional group such as a hydroxy group, a carboxy group, an aldehyde group, and an amino group as a reactive partial structure (Z ⁇ )
  • Z ⁇ ′ reactive partial structure
  • thermoplastic resin (P 1 ) having a reactive partial structure (Z ⁇ ′) is obtained by using a monomer having a functional group such as a hydroxy group, a carboxy group, an aldehyde group, or an amino group. ') Can be manufactured.
  • the polymer obtained by carrying out the polymerization reaction without using these monomers may be subjected to a modification treatment such as maleic anhydride modification to cause heat having a reactive partial structure (Z ⁇ ′).
  • a plastic resin (P 1 ′) can be produced.
  • the thermoplastic resin (P 1 ′) obtained by these methods as a molding material, the first thermoplastic resin layer can be efficiently formed.
  • thermoplastic resin layer that does not contain the thermoplastic resin (P 1 ′)
  • surface treatment is performed on the thermoplastic resin layer, thereby generating hydroxy groups or carboxy groups on the surface of the layer. May be. That is, by performing this surface treatment, the thermoplastic resin layer satisfies the requirements necessary for the first thermoplastic resin layer.
  • the surface treatment is not particularly limited as long as it generates a hydroxy group or a carboxy group. Examples of the surface treatment include corona treatment, plasma treatment, ultraviolet irradiation treatment, electron beam irradiation treatment, ozone treatment, excimer ultraviolet treatment, acid treatment, and base treatment. These surface treatments can be performed according to known methods.
  • the first thermoplastic resin layer may contain components other than the thermoplastic resin (P 1 ) as long as the adhesion with the molecular adhesive layer is not inhibited.
  • components other than the thermoplastic resin (P 1 ) include ultraviolet absorbers, light stabilizers, antioxidants, antistatic agents, slip agents, antiblocking agents, and colorants. These contents can be appropriately determined according to the purpose.
  • the content of the thermoplastic resin (P 1 ) in the first thermoplastic resin layer is usually 50 to 100% by mass, preferably 80 to 100% by mass.
  • the thickness of the first thermoplastic resin layer is usually 5 to 150 ⁇ m, preferably 10 to 120 ⁇ m, more preferably 15 to 80 ⁇ m. It can fully suppress that the performance of a molecular adhesive layer falls by the heating in a heat welding process because the thickness of a 1st thermoplastic resin layer is 5 micrometers or more. Moreover, a junction part (between adherends) can be made thin because the thickness of a 1st thermoplastic resin layer is 80 micrometers or less.
  • the heat-sealable temperature of the first thermoplastic resin layer is usually 100 to 200 ° C., preferably 120 to 180 ° C.
  • the heat-sealable temperature of the first thermoplastic resin layer is 100 ° C. or higher, it is possible to suppress a change in the shape of the first thermoplastic resin layer when performing heat welding.
  • the heat-sealable temperature of the first thermoplastic resin layer is 200 ° C. or less, the influence on the molecular adhesive layer during heat welding can be suppressed.
  • the heat-sealable temperature of the first thermoplastic resin layer is the type of thermoplastic resin, the molecular weight of the thermoplastic resin, the content of the thermoplastic resin, the type of additive, the content of additive, the first thermoplastic resin
  • the characteristics are influenced by the crystallinity of the layer, the density of the first thermoplastic resin layer, and the like. Therefore, for example, after determining the thermoplastic resin to be used, the first thermoplastic resin layer having the target heat-sealable temperature can be formed by adjusting the type and amount of the additive.
  • the second thermoplastic resin layer is a layer adjacent to the first thermoplastic resin layer, and constitutes one of the outermost layers when the bonding laminate is used. Note that an adhesive layer may exist between the first thermoplastic resin layer and the second thermoplastic resin layer. As will be described later, the second thermoplastic resin layer is used for thermal welding with the second thermoplastic resin layer of the other laminate for bonding.
  • the second thermoplastic resin layer may have a single layer structure or a multilayer structure. Even if the composition of the second thermoplastic resin layer when the second thermoplastic resin layer has a single-layer structure and each layer when the second thermoplastic resin layer has a multilayer structure are uniform, The composition may not be uniform. For example, these layers may contain many specific components near the surface of the layer, and the composition near the surface of the layer may be different from the composition at the center of the layer.
  • the second thermoplastic resin layer is a thermoplastic resin (hereinafter referred to as “thermoplastic resin”) that can be melted at a relatively low temperature and solidified in a short time on at least the surface opposite to the first thermoplastic resin layer. (It may be referred to as (P 2 ) ”).
  • thermoplastic resin thermoplastic resin
  • the thermoplastic resin (P 2 ) is included on the surface opposite to the first thermoplastic resin layer means that the thermoplastic resin (P 2 ) is on the surface opposite to the first thermoplastic resin layer. It means being exposed.
  • thermoplastic resin (P 2 ) examples include olefin resins, cycloolefin resins, acrylic resins, olefin-vinyl acetate resins, olefin ionomer resins, and polyester resins. Specific examples of these thermoplastic resins include the same as those shown as the thermoplastic resin (P 1 ). Thermoplastic resin (P 2) can be used in combination singly or two or more.
  • the second thermoplastic resin layer may contain components other than the thermoplastic resin (P 2 ) as long as it does not hinder the heat weldability.
  • components other than the thermoplastic resin (P 2 ) include ultraviolet absorbers, light stabilizers, antioxidants, antistatic agents, slip agents, antiblocking agents, and colorants. These contents can be appropriately determined according to the purpose.
  • the second thermoplastic resin layer may be a uniform layer containing a thermoplastic resin (P 2 ) or at least the first thermoplastic resin.
  • a non-uniform layer containing a thermoplastic resin (P 2 ) on the surface opposite to the resin layer can be mentioned.
  • the content of the thermoplastic resin (P 2 ) in the second thermoplastic resin layer having a single layer structure is usually 50 to 100% by mass, preferably 80 to 100% by mass.
  • the thickness of the second thermoplastic resin layer having a single layer structure is usually 5 to 150 ⁇ m, preferably 10 to 120 ⁇ m, more preferably 15 to 80 ⁇ m.
  • the thickness of the second thermoplastic resin layer having a single layer structure is 5 ⁇ m or more, thermal welding can be sufficiently performed. Moreover, a junction part (between adherends) can be made thin because the thickness of this 2nd thermoplastic resin layer is 150 micrometers or less.
  • the second thermoplastic resin layer is the outermost layer on the side opposite to the first thermoplastic resin layer (second heat having a multilayer structure).
  • the outermost layer that is not in contact with the first thermoplastic resin layer has a thermoplastic resin (P 2 ) on the surface opposite to the first thermoplastic resin layer.
  • a layer having a multilayer structure the content of the thermoplastic resin (P 2 ) contained in the outermost layer opposite to the first thermoplastic resin layer is based on the entire outermost layer. The amount is usually 50 to 100% by mass, preferably 80 to 100% by mass.
  • the total thickness of the second thermoplastic resin layer having a multilayer structure is usually 3 to 150 ⁇ m, preferably 10 to 120 ⁇ m, and more preferably 15 to 80 ⁇ m.
  • the thickness of the entire second thermoplastic resin layer having a multilayer structure is 3 ⁇ m or more, thermal welding can be sufficiently performed.
  • a junction part (between adherends) can be made thin because the thickness of this 2nd thermoplastic resin layer is 150 micrometers or less.
  • the number of layers is not particularly limited.
  • the number of the second thermoplastic resin layers having a multilayer structure is usually 2 to 10, and preferably 2 to 5.
  • the heat-sealable temperature of the second thermoplastic resin layer is usually 50 to 180 ° C., preferably 70 to 150 ° C.
  • the handleability at normal temperature is improved.
  • the heat-sealable temperature of the second thermoplastic resin layer is 180 ° C. or less, when the laminate for bonding of the present invention is used, the interlayer between the second thermoplastic resin layers is firmly bonded. It is possible to bond the two adherends more firmly.
  • the heat-sealable temperature of the second thermoplastic resin layer can be adjusted by the same method as the method for adjusting the heat-sealable temperature of the first thermoplastic resin layer.
  • the heat-sealable temperature of the second thermoplastic resin layer is the heat of the outermost layer on the side opposite to the first thermoplastic resin layer. The temperature that can be sealed.
  • the bonding laminate is a first heat of a laminate composed of a first thermoplastic resin layer and a second thermoplastic resin layer (hereinafter sometimes referred to as “laminate ( ⁇ )”). It can be produced by forming a molecular adhesive layer directly on the plastic resin layer.
  • the 1st thermoplastic resin layer (1) of the laminated body (3) comprised by the 1st thermoplastic resin layer (1) and the 2nd thermoplastic resin layer (2).
  • a laminated body (5) for bonding is obtained by directly forming a molecular adhesive layer (4) thereon.
  • the first thermoplastic resin layer (1) includes the thermoplastic resin (P 1 ) on the surface (6) in contact with the molecular adhesive layer (4).
  • the second thermoplastic resin layer (2) of the laminate (3) contains a thermoplastic resin (P 2 ) on the surface (7) opposite to the first thermoplastic resin layer (1). Is preferred.
  • the manufacturing method of a laminated body ((eta)) is not specifically limited.
  • a coextruded multilayer film obtained by melting a pellet containing a thermoplastic resin (P 1 ) and a pellet containing a thermoplastic resin (P 2 ) and extruding them simultaneously from a multilayer die is used as a laminate. It can be used as ( ⁇ ).
  • a resin film containing a thermoplastic resin (P 1), the multi-layer film obtained by pasting a resin film containing a thermoplastic resin (P 2) can be used as a laminate (eta) .
  • thermoplastic resin layer containing a thermoplastic resin (P 1) (resin film)
  • a coating solution containing a thermoplastic resin (P 2) was applied, and drying the resulting coating film Forming a second thermoplastic resin layer, or applying a coating solution containing the thermoplastic resin (P 1 ) on the second thermoplastic resin layer (resin film) containing the thermoplastic resin (P 2 ).
  • a multilayer film obtained by coating and drying the obtained coating film to form the first thermoplastic resin layer can be used as the laminate ( ⁇ ).
  • thermoplastic resin layer a resin film in which other layers are not yet formed
  • second thermoplastic resin layer a resin film in which other layers are not yet formed
  • the components of each layer are adjusted so that the heat-sealable temperature of the first thermoplastic resin layer is higher than the heat-sealable temperature of the second thermoplastic resin layer. decide. That is, when the heat-sealable temperature of the first thermoplastic resin layer is Th1 and the heat-sealable temperature of the second thermoplastic resin layer is Th2 in the bonding laminate of the present invention, Th1 > T h2 . As will be described later, when two adherends are bonded using the bonding laminate of the present invention, the heat-sealable temperature of the first thermoplastic resin layer is set to the heat-sealable temperature of the second thermoplastic resin layer. By making it higher than this, the heat welding step can be performed without adversely affecting the molecular adhesive layer.
  • the molecular adhesive (M) used when forming the molecular adhesive layer is composed of the reactive group (Z ⁇ ) and the reactive partial structure (Z ⁇ ) of the thermoplastic resin (P 1 ) in the first thermoplastic resin layer. ) Can be selected as appropriate. Of these, the reactive group (Z ⁇ ) and the reactive partial structure (Z ⁇ ) preferably satisfy the following requirement (Q1).
  • the reactive group (Z ⁇ ) of the molecular adhesive (M) is at least one selected from the group consisting of an amino group, a mercapto group, an isocyanate group, a ureido group, and an epoxy group, and the thermoplastic resin (P 1 ).
  • the reactive partial structure (Z ⁇ ) of is at least one selected from the group consisting of a hydroxy group, a carboxy group, an aldehyde group, and an amino group, or
  • the reactive group (Z ⁇ ) of the molecular adhesive (M) is an azide group
  • the reactive partial structure (Z ⁇ ) of the thermoplastic resin (P 1 ) is a carbon-carbon single bond, carbon-carbon two At least one selected from the group consisting of a heavy bond and a carbon-hydrogen single bond.
  • the reactive group (Z ⁇ ) of the molecular adhesive (M) and the reactive partial structure (Z ⁇ ) of the thermoplastic resin (P 1 ) form a chemical bond, It is considered that the adhesive (M) is fixed to the first thermoplastic resin layer. It is considered that this chemical bond can be efficiently formed by satisfying the above requirement (Q1).
  • the reactive group (Z ⁇ ) is at least one selected from the group consisting of an amino group, a mercapto group, an isocyanate group, a ureido group and an epoxy group
  • the reactive group (Z ⁇ ) and the reactive partial structure (Z ⁇ ) Preferred combinations [reactive group (Z ⁇ ) / reactive partial structure (Z ⁇ )] include (amino group / hydroxy group), (amino group / carboxy group), (isocyanate group / hydroxy group), and (isocyanate group / carboxy group). Group), (hydroxy group / carboxy group) and the like.
  • the reactive group (Z ⁇ ) is an azide group
  • the azide group is activated by irradiation with light as described later.
  • nitrene as a reaction intermediate can react with a carbon-carbon single bond, a carbon-carbon double bond, and a carbon-hydrogen single bond, so that the reactive partial structure (Z ⁇ ) of the thermoplastic resin (P 1 ).
  • a thermoplastic resin usually contains at least one of a carbon-carbon single bond, a carbon-carbon double bond, and a carbon-hydrogen single bond. Therefore, when the molecular adhesive (M) having an azide group is used, the type of the thermoplastic resin (P 1 ) is not particularly limited.
  • the method for forming the molecular adhesive layer is not particularly limited.
  • a molecular adhesive solution containing the molecular adhesive (M) is prepared, this solution is applied onto the first thermoplastic resin layer, and then the obtained coating film is subjected to a drying treatment or molecular adhesive (
  • a molecular adhesive layer can be formed by performing a process of fixing M) to the first thermoplastic resin layer.
  • the solvent used when preparing the molecular adhesive solution is not particularly limited.
  • the solvent include alcohol solvents such as methanol, ethanol, isopropanol, ethylene glycol, and diethylene glycol; ketone solvents such as acetone and methyl ethyl ketone; ester solvents such as ethyl acetate and butyl acetate; halogen-containing compound solvents such as methylene chloride; Aliphatic hydrocarbon solvents such as butane and hexane; Ether solvents such as tetrahydrofuran and butyl ether; Aromatic solvents such as benzene and toluene; Amides solvents such as N, N-dimethylformamide and N-methylpyrrolidone; Water And the like. These can be used alone or in combination of two or more.
  • the concentration of the molecular adhesive (M) in the molecular adhesive solution is not particularly limited.
  • the concentration is preferably 0.005 to 1.000 mol / L, more preferably 0.050 to 0.500 mol / L.
  • the application method of the molecular adhesive solution is not particularly limited, and a known application method can be used.
  • the coating method include spin coating, spray coating, bar coating, knife coating, roll knife coating, roll coating, blade coating, dip coating, curtain coating, die coating, and gravure coating.
  • the bar coating method and the gravure coating method are preferable.
  • drying mechanism for example, a batch-type drying mechanism such as an air oven, a heat roll, a hot air through mechanism (a drying target moves and passes through an open drying furnace, and is heated and dried while receiving air. A continuous drying mechanism, etc.).
  • the drying temperature adjusted by the drying mechanism is usually 20 to 250 ° C., preferably 25 to 200 ° C., more preferably 30 to 150 ° C., and particularly preferably 35 to 120 ° C.
  • the drying time is usually 1 second to 120 minutes, preferably 10 seconds to 10 minutes, more preferably 20 seconds to 5 minutes, and particularly preferably 30 seconds to 3 minutes.
  • a process of fixing the molecular adhesive (M) to the first thermoplastic resin layer (hereinafter sometimes referred to as a fixing process) is usually performed.
  • the fixing treatment can be appropriately selected according to the characteristics of the reactive group (Z ⁇ ) of the molecular adhesive (M).
  • a chemical bond is generated by applying the molecular adhesive (M) onto the first thermoplastic resin layer, and the generation of the chemical bond is promoted by heating. It is preferable from the viewpoint of improvement.
  • the heating temperature is usually 40 to 250 ° C, preferably 60 to 200 ° C, more preferably 80 to 120 ° C.
  • the heating time is usually 1 second to 120 minutes, preferably 1 to 60 minutes, more preferably 1 to 30 minutes. It does not specifically limit as a heating method, The mechanism and apparatus similar to the above-mentioned drying mechanism can be used.
  • the reactive group (Z ⁇ ) has photoreactivity, such as an azide group
  • a light irradiation process is performed as the fixing process.
  • the irradiation light ultraviolet rays are usually used.
  • Ultraviolet irradiation can be performed using an ultraviolet irradiation device using a light source such as a mercury lamp, a metal halide lamp, an ultraviolet LED, or an electrodeless lamp.
  • the treatment conditions for the light irradiation treatment are not particularly limited as long as the target photoreaction can be performed.
  • the application of the molecular adhesive solution, the drying process, and the fixing process may be repeated a plurality of times.
  • the method of joining two adherends of the present invention uses two laminates for joining, and uses adherend (I) and adherend (II).
  • the two laminates for bonding are each independently the laminate for bonding of the present invention, and the first laminate for bonding contains a molecular adhesive (M A ).
  • a bonding laminate (A) having this order
  • the second bonding laminate is composed of a molecular adhesive layer (BM) containing a molecular adhesive (M B ), a first layer having a single layer structure.
  • step (N2) Adherend (I), bonding laminate (A), bonding laminate (B), and adherend (II) are stacked in this order (step (N2): obtained in step (N1) Are heated, the adhesion between the molecular adhesive layer (AM) and the adherend (I), the adhesion between the molecular adhesive layer (BM) and the adherend (II), the second A step of simultaneously performing thermal welding between the thermoplastic resin layer (A-2) and the second thermoplastic resin layer (B-2).
  • the bonding laminate (A) includes a molecular adhesive layer (AM) containing a molecular adhesive (M A ), a first thermoplastic resin layer (A-1), and a second thermoplastic resin layer ( A laminated body for bonding having A-2) in this order.
  • the bonding laminate (A) is used for adhesion to the adherend (I).
  • the bonding laminate (B) includes a molecular adhesive layer (BM) containing a molecular adhesive (M B ), a first thermoplastic resin layer (B-1), and a second thermoplastic resin layer ( It is a laminated body (B) having B-2) in this order.
  • the bonding laminate (B) is used for adhesion to the adherend (II).
  • the laminated body for bonding (A) and the laminated body for bonding (B) may be the same or different.
  • the second thermoplastic resin layer (A-2) of the laminate for bonding (A) has a thermoplastic resin (P 2 ) (hereinafter referred to as “the first thermoplastic resin layer (A-1)” on the surface opposite to the first thermoplastic resin layer (A-1). 2), the thermoplastic resin (P 2 ) contained in the second thermoplastic resin layer (A-2) may be represented as “thermoplastic resin (P 2A )”.
  • the second thermoplastic resin layer (B-2) of the laminate (B) has a thermoplastic resin (P 2 ) (in the following, on the surface opposite to the first thermoplastic resin layer (B-1)).
  • thermoplastic resin (P 2 ) contained in the second thermoplastic resin layer (B-2) includes a “thermoplastic resin (P 2B )”)
  • thermoplastic resin (P 2A ) when the second thermoplastic resin layer (A-2) contains two or more thermoplastic resins (P 2A ), the content is the highest) and
  • the thermoplastic resin (P 2B ) (the one with the highest content when the second thermoplastic resin layer (B-2) contains two or more thermoplastic resins (P 2B )) must be the same Is preferred. Since the thermoplastic resin (P 2A ) and the thermoplastic resin (P 2B ) are the same, the two adherends can be bonded more firmly.
  • thermoplastic resin (P 2A ) (when the second thermoplastic resin layer (A-2) contains two or more kinds of thermoplastic resins (P 2A ), the content is the highest) and thermoplastic resin (P 2B ) (when the second thermoplastic resin layer (B-2) contains two or more thermoplastic resins (P 2B ), the content is the highest), these thermoplastic resins are crystalline. In the case of a functional resin, it is preferable that the difference between these melting points is small. By using a combination of a thermoplastic resin (P 2A ) and a thermoplastic resin (P 2B ) having close melting points, thermal welding can be performed more efficiently.
  • the difference between the melting point of the thermoplastic resin (P 2A ) and the melting point of the thermoplastic resin (P 2B ) is preferably 40 ° C. or less, more preferably 20 ° C. or less, and particularly preferably 0 ° C.
  • Thermoplastic resin (P 2A ) (when the second thermoplastic resin layer (A-2) contains two or more kinds of thermoplastic resins (P 2A ), the content is the highest) and thermoplastic resin (P 2B ) (if the second thermoplastic resin layer (B-2) contains two or more thermoplastic resins (P 2B ), the content is the highest), these Hansen solubility parameters It is preferable that the working distance Ra is small. By using a combination of a thermoplastic resin (P 2A ) and a thermoplastic resin (P 2B ) having a close interaction distance Ra of the Hansen solubility parameter, thermal welding can be performed more efficiently.
  • the interaction distance Ra between the Hansen solubility parameters of the thermoplastic resin (P 2A ) and the thermoplastic resin (P 2B ) is preferably 10 or less, more preferably 4.5 or less.
  • the interaction distance Ra of the Hansen solubility parameter is derived from the following equation.
  • ⁇ D A is a dispersive component of the Hansen solubility parameter of the thermoplastic resin (P 2A )
  • ⁇ D B is a dispersive component of the Hansen solubility parameter of the thermoplastic resin (P 2B )
  • ⁇ P A is a thermoplastic resin
  • ⁇ P B is the polar component of the Hansen solubility parameter of the thermoplastic resin (P 2B )
  • ⁇ H A is the hydrogen bonding component of the Hansen solubility parameter of the thermoplastic resin (P 2A )
  • ⁇ H B represents a hydrogen bonding component of the Hansen solubility parameter of the thermoplastic resin (P 2B ).
  • the molecular adhesive layer (AM) of the bonding laminate (A) is used for bonding to the adherend (I), and the molecular bonding of the bonding laminate (B).
  • the agent layer (BM) is used for adhesion to the adherend (II).
  • the adhesion between the molecular adhesive layer (AM) and the adherend (I) and the adhesion between the molecular adhesive layer (BM) and the adherend (II) are usually molecular adhesion.
  • the reactive group (Z ⁇ ) in the agent (M A ) or (M B ) reacts with the functional group in the compound constituting the adherend (I) or the adherend (II) to form a chemical bond. Is done. Therefore, usually, as the adherend (I) or the adherend (II), one having a group having reactivity with the reactive group (Z ⁇ ) on its surface is used.
  • Examples of such an adherend include a member containing a metal on the surface, a member containing an inorganic substance on the surface, and a member containing a silicone resin on the surface.
  • Examples of the metal include aluminum, chromium, manganese, iron, cobalt, nickel, copper, zinc, silver, and gold.
  • Examples of inorganic substances include glass and inorganic oxides (excluding glass). These members may be subjected to surface treatment. A member in which a hydroxy group, a carboxy group or the like is generated by the surface treatment is more preferably used as an adherend.
  • the member which contains a thermoplastic resin and a thermosetting resin on the surface can also be utilized as a to-be-adhered body by utilizing a surface treatment technique.
  • Examples of the surface treatment include corona treatment, plasma treatment, ultraviolet irradiation treatment, electron beam irradiation treatment, ozone treatment, excimer ultraviolet treatment, acid treatment, and base treatment. These surface treatments can be performed according to known methods.
  • a primer layer may be provided on the surface of the adherend as necessary.
  • FIG. 2 shows each step of the step group including steps (L1) to (L3).
  • the molecular adhesive layer (AM) (8), the first thermoplastic resin layer (A-1) (9), and the second thermoplastic resin layer (A-2) ( 10) Adhering the molecular adhesive layer (AM) (8) of the laminate (A) (11) for bonding and the adherend (I) (12) to obtain the laminate (13) [FIG. 2 (a)].
  • Process (L1) can be performed using, for example, a heating press machine, an autoclave apparatus, a vacuum bonding machine, a three-dimensional vacuum heating molding machine (TOM molding machine), a heating laminating apparatus, or the like.
  • a heating press machine for example, a heating press machine, an autoclave apparatus, a vacuum bonding machine, a three-dimensional vacuum heating molding machine (TOM molding machine), a heating laminating apparatus, or the like.
  • the pressure is usually 0.1 to 5 N / mm, preferably 0.2 to 3 N / mm, more preferably 0.3 to 1 N / mm.
  • the pressure is usually 0.1 to 10 MPa, preferably 0.2 to 5 MPa, more preferably 0.3 to 3 MPa, and further preferably 0.4 to 1 MPa.
  • the adhesion temperature in the step (L1) is usually 40 to 200 ° C., preferably 50 to 170 ° C., more preferably 60 to 140 ° C.
  • the treatment time in the step (L1) is usually 1 second to 1 hour, preferably 5 seconds to 30 minutes, more preferably 10 seconds to 10 minutes.
  • Step (L2) the molecular adhesive layer (BM) (14), the first thermoplastic resin layer (B-1) (15), and the second thermoplastic resin layer (B-2) ( 16) Adhering the molecular adhesive layer (BM) (14) and the adherend (II) (18) of the bonding laminate (B) (17) having the laminate 16) to obtain the laminate (19) [FIG. 2 (b)].
  • Step (L2) can be performed according to a method and conditions similar to those of step (L1).
  • the second thermoplastic resin layer (A-2) (10) of the laminate (13) obtained in the step (L1) and the laminate (19) obtained in the step (L2) are used.
  • the second thermoplastic resin layer (B-2) (16) are thermally welded to obtain a bonded structure (20) [FIG. 2 (c)].
  • the step (L3) can be performed using, for example, a heating press machine, an autoclave apparatus, a vacuum bonding machine, a three-dimensional vacuum heating molding machine (TOM molding machine), a heating laminating apparatus, or the like.
  • a linear pressure is applied in the step (L3), the pressure is usually 0.1 to 5 N / mm, preferably 0.2 to 3 N / mm, more preferably 0.3 to 1 N / mm.
  • the surface pressure is applied in the step (L3), the pressure is usually 0.05 to 10 MPa, preferably 0.1 to 5 MPa, more preferably 0.2 to 3 MPa.
  • the heat welding temperature in the step (L3) is usually 50 to 230 ° C., preferably 60 to 200 ° C., more preferably 80 to 170 ° C.
  • the treatment time in the step (L3) is usually 1 second to 1 minute, preferably 3 to 30 seconds.
  • the molecular adhesive layer (AM) of the bonding laminate (A) and the adherend (I) are bonded in the process (L1).
  • temperature T L1 of time, in step (L2), the temperature T L2 when the molecular adhesive layer (B-M) for adhering the adherend (II) of the bonded laminate for (B), step ( L3), the temperature at which the second thermoplastic resin layer (A-2) and the second thermoplastic resin layer (B-2) are thermally welded is T L3 , and the joining laminate (A)
  • the heat-sealable temperature of the first thermoplastic resin layer (A-1) is T h1A
  • the heat-sealable temperature of the second thermoplastic resin layer (A-2) is Th2A.
  • the heat-sealable temperature of the first thermoplastic resin layer (B-1) of B) is Th1B
  • the heat of the second thermoplastic resin layer (B-2) is
  • Th 2B both of the following formulas (E-1) and (E-2) are satisfied, and at least one of the following formulas (E-3) and (E-4) is satisfied It is preferable to satisfy.
  • the second thermoplastic resin layer (A-2) of the joining laminate (A) and the joining laminate (B) can be efficiently heat-welded. More efficiently heat-welding the second thermoplastic resin layer (A-2) of the bonding laminate (A) and the second thermoplastic resin layer (B-2) of the bonding laminate (B). Therefore, it is more preferable that both the formula (E-3) and the formula (E-4) are satisfied.
  • FIG. 3 shows each step in the step group including steps (M1) to (M3).
  • step (M1) the molecular adhesive layer (AM) (21), the first thermoplastic resin layer (A-1) (22), and the second thermoplastic resin layer (A-2) ( 23) the second thermoplastic resin layer (A-2) (23) of the laminate (A) (24) for bonding, the molecular adhesive layer (BM) (25), the first thermoplastic layer
  • Step (M1) can be performed according to a method and conditions similar to those of step (L3).
  • step (M2) the molecular adhesive layer (AM) (21) and the adherend (I) (30) of the laminate (29) obtained in the step (M1) are adhered, and the laminate (31) is obtained [FIG. 3 (b)].
  • step (M3) the molecular adhesive layer (BM) (25) and the adherend (II) (32) of the laminate (31) obtained in the step (M2) are bonded to each other to form a bonded structure. A body (33) is obtained [FIG. 3 (c)].
  • Step (M2) and step (M3) can be performed in the same manner and under the same conditions as in step (L1), respectively.
  • the step (M2) and The step (M3) can be performed simultaneously.
  • step (N2) the product (44) obtained in the step (N1) is heated to bond the molecular adhesive layer (AM) and the adherend (I), and the molecular adhesive layer ( BM) and adherend (II) are bonded together, and the second thermoplastic resin layer (A-2) and second thermoplastic resin layer (B-2) are simultaneously welded together.
  • a structure (45) is obtained [FIG. 4 (b)].
  • Step (N2) can be performed using, for example, a heating press machine, an autoclave apparatus, a vacuum bonding machine, a three-dimensional vacuum heating molding machine (TOM molding machine), a heating laminating apparatus, or the like.
  • a heating press machine for example, a heating press machine, an autoclave apparatus, a vacuum bonding machine, a three-dimensional vacuum heating molding machine (TOM molding machine), a heating laminating apparatus, or the like.
  • the pressure is usually 0.1 to 5 N / mm, preferably 0.2 to 3 N / mm, more preferably 0.3 to 1 N / mm.
  • the pressure is usually 0.1 to 10 MPa, preferably 0.2 to 5 MPa, more preferably 0.3 to 3 MPa, and further preferably 0.4 to 1 MPa.
  • the heat welding temperature in the step (N2) is usually 50 to 230 ° C., preferably 60 to 200 ° C., more preferably 80 to 170 ° C.
  • the treatment time in the step (N2) is usually 1 second to 1 hour, preferably 5 seconds to 30 minutes, more preferably 10 seconds to 10 minutes.
  • the heat-sealable temperature of the first thermoplastic resin layer (A-1) of the bonding laminate (A) is Th1A
  • the second thermoplasticity is Th2A
  • the heat-sealable temperature of the first thermoplastic resin layer (B-1) of the bonding laminate (B) is Th1B
  • second heat-sealable temperature of the thermoplastic resin layer (B-2) is a T H2B, in step (N2), when the temperature at the time of heat welding is T N2, the following equation (E-5) formula ( It is preferable to satisfy at least one of E-6).
  • the second thermoplastic resin layer (A-2) of the bonding laminate (A) and the bonding laminate (B) can be efficiently heat-welded. More efficiently heat-welding the second thermoplastic resin layer (A-2) of the bonding laminate (A) and the second thermoplastic resin layer (B-2) of the bonding laminate (B). Therefore, it is more preferable that both the formula (E-5) and the formula (E-6) are satisfied.
  • a process group including the steps (L1) to (L3) or a process group including the steps (N1) and (N2) is included. Preferably it is done.
  • the adhesion process between the molecular adhesive layer and the adherend is performed before the heat welding process. Therefore, since the adhesion treatment between the molecular adhesive layer and the adherend can be performed in a state where the thermoplastic resin layer is not thermally deformed due to the thermal welding treatment, the molecular adhesive layer and the adherend are It is possible to bond more firmly.
  • the adhesion process between the molecular adhesive layer and the adherend and the thermal welding process between the thermoplastic resin layers are performed simultaneously. Therefore, two adherends can be joined more efficiently.
  • the method for producing a bonded structure according to the present invention comprises an adherend (I) / laminate for joining (A) and a layer / adherent (II) derived from the laminate for joining (B). ), A bonded structure having a layer structure, wherein the adherend (I) and the adherend (II) are bonded using the bonding method of the present invention.
  • adherend (I) and the adherend (II) those shown in the invention of the method for joining two adherends can be used.
  • the adherend (I) and the adherend (II) are each independently at least one selected from the group consisting of metals, inorganic substances, and thermosetting resins on at least the adherend surface. The inclusion is preferred.
  • the adherends When the adherends have an adherend surface formed of a thermoplastic resin, the adherends can be directly heat welded and joined without using the bonding laminate of the present invention. There is. On the other hand, when a metal, an inorganic substance, or a thermosetting resin exists on the adherend surface of the adherend, it is difficult to firmly bond the adherends by this method.
  • the method for manufacturing a bonded structure according to the present invention uses the bonded laminate according to the present invention. Therefore, according to the method for manufacturing a bonded structure of the present invention, even when a metal, an inorganic substance, or a thermosetting resin is present on the adherend surface of the adherend, these adherends are firmly formed. A bonded structure obtained by bonding can be obtained.
  • the heat sealable temperature of each layer of the multilayer films (1) to (5) was determined by the following method. Two multilayer films (25 mm ⁇ 150 mm) were prepared, they were stacked so that the layers of the same component face each other, and these were thermally welded at 0.2 MPa for 1 second to obtain test pieces. At this time, the heat welding temperature was changed at intervals of 5 ° C. (for example, 140 ° C., 145 ° C., 150 ° C.) to obtain a plurality of test pieces.
  • test pieces were 300 mm using a tensile testing machine (manufactured by A & D Co., Ltd., product name “Tensilon Universal Material Testing Machine”) in an environment of 23 ° C. and 50% humidity (relative humidity).
  • a T-type peel test was performed under the conditions of / min and the respective adhesive strengths were measured.
  • the heat welding temperature of the test piece having the lowest heat welding temperature was defined as “heat sealable temperature”.
  • thermoplastic resin layer [polypropylene (PP) thickness 60 ⁇ m] / second thermoplastic resin layer [polypropylene (PP) thickness 50 ⁇ m]”.
  • Multilayer films (2) and (5) were obtained in the same manner as in Production Example 1 except that the molding materials listed in Table 1 were used.
  • thermoplastic resin layer [polyethylene (PE) thickness 25 ⁇ m] / second thermoplastic resin layer [nylon (Ny) thickness]
  • a multilayer film (3) having a layer structure of “30 ⁇ m / polyethylene (PE) thickness 25 ⁇ m]” was obtained.
  • the heat-sealable temperature of each layer was measured, the heat-sealable temperature of the first thermoplastic resin layer was 140 ° C., and the second thermoplastic resin layer (polyethylene layer) The heat sealable temperature of was 100 ° C.
  • thermoplastic resin layer [polyethylene (PE) thickness 100 ⁇ m] / second thermoplastic resin layer” is obtained.
  • the heat-sealable temperature of each layer was measured, the heat-sealable temperature of the first thermoplastic resin layer was 140 ° C., and the heat-sealable of the second thermoplastic resin layer was possible. The temperature was 110 ° C.
  • a laminate for bonding (1) was produced using the multilayer film (1) by the following method.
  • Corona treatment machine manufactured by Shinko Electric Measurement Co., Ltd., product name “Corona Scanner ASA-4”, output voltage: 9 kV (surface voltage), oscillation frequency for the first thermoplastic resin layer of the multilayer film (1) : 20 kHz).
  • the surface of the surface subjected to corona irradiation was coated with the molecular adhesive solution obtained in Production Example 6 with a Meyer bar (No. 12), and the obtained coating film was dried at 80 ° C. for 60 seconds.
  • this coating film is irradiated with UV light to perform fixing treatment, and the molecular adhesive layer and A laminate (1) for bonding composed of the first thermoplastic resin layer and the second thermoplastic resin layer (multilayer film (1)) was obtained.
  • the ultraviolet irradiation conditions are an illuminance of 84 mW / cm 2 and an amount of light of 29 mJ / cm 2 , and the illuminance and the amount of light are measured in the UVC region using an illuminance / light meter (product name “UV Power Pack II” manufactured by EIT). Illuminance and light intensity were measured.
  • Production Example 1 for the joining, in the same manner as Production Example 1, except that the multilayer films (2) to (5) shown in Table 2 were used instead of the multilayer film (1). Laminated bodies (2) to (5) were obtained.
  • Example 1 Two laminates for bonding (1) (10 mm ⁇ 10 mm) obtained in Production Example 1 and two adherends [plasma-treated glass plate (30 mm ⁇ 70 mm ⁇ 2 mm)] were prepared.
  • the bonding laminate (1) and the adherend (glass plate) are stacked so that the molecular adhesive layer of the bonding laminate (1) faces the plasma-treated surface of the glass plate.
  • Thermocompression bonding was performed for 5 minutes under the condition of 5 MPa (surface pressure) to obtain a laminate composed of an adherend / molecular adhesive layer / first thermoplastic resin layer / second thermoplastic resin layer. Separately from this operation, the same operation was performed using the remaining bonded laminate (1) and the adherend to obtain another laminate.
  • the second thermoplastic resin layers of the two obtained laminates were thermocompression bonded for 10 seconds under the conditions of 145 ° C. and 0.5 MPa (surface pressure) to obtain a bonded structure.
  • Example 2 Two laminates for bonding (2) (10 mm ⁇ 10 mm) obtained in Production Example 2 and two adherends [plasma-treated glass plate (30 mm ⁇ 70 mm ⁇ 2 mm)] were prepared. Each molecular adhesive layer of the two bonding laminates (2) faces the plasma processing surface of the glass plate, and the second thermoplastic resin layers of the two bonding laminates (2) face each other. Thus, the adherend, the laminate for bonding (2), the laminate for bonding (2), and the adherend are stacked in this order, and this is laminated at 145 ° C. and 0.5 MPa (surface pressure) for 5 minutes. A bonded structure was obtained by thermocompression bonding.
  • Examples 3 and 4 Comparative Example 1
  • a joined structure was obtained in the same manner as in Example 2 except that the joining laminate described in Table 3 and the production conditions were used.
  • Table 3 shows the following.
  • the test piece after the measurement of the adhesive strength is broken in the layer derived from the bonding laminate or broken at the interface between the layer derived from the bonding laminate and the adherend. It has not occurred. Therefore, it can be seen that in Examples 1 to 4, the two adherends are firmly joined.
  • the bonding laminate used in Comparative Example 1 has the same heat-sealable temperature of the first thermoplastic resin layer and the heat-sealable temperature of the second thermoplastic resin layer. For this reason, deformation occurred during thermocompression bonding.
  • the adherend and the multilayer film are not sufficiently bonded. Therefore, it is difficult to join the glass plates by this method.
  • First thermoplastic resin layer 2 Second thermoplastic resin layer 3: Laminate 4 composed of first thermoplastic resin layer and second thermoplastic resin layer 4: Molecular adhesive layer 5: Bonding Laminate 6: Surface 7 in contact with the molecular adhesive layer 7: Surface opposite to the first thermoplastic resin layer 8.21.34: Molecular adhesive layer (AM) 9.22.35: First thermoplastic resin layer (A-1) 10.23.36: Second thermoplastic resin layer (A-2) 11.24.37: Laminate for bonding (A) 12.30.42: adherend (I) 13: Laminate 14.25.38: molecular adhesive layer (BM) resulting from step (L1) 15.26.39: first thermoplastic resin layer (B-1) 16.27.40: second thermoplastic resin layer (B-2) 17.28.41: laminate for bonding (B) 18.32.43: adherend (II) 19: Laminated body 20.33.45 as a result of the step (L2): Bonded structure 29: Laminated body 31 as a result of the step (M1): Laminated body 44

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
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  • Laminated Bodies (AREA)
  • Adhesives Or Adhesive Processes (AREA)
  • Adhesive Tapes (AREA)

Abstract

The present invention relates to: a layered product for bonding which comprises, in the following order, a molecular-adhesive layer comprising a specific molecular adhesive (M), a first thermoplastic resin layer, which comprises a specific thermoplastic resin, and a second thermoplastic resin layer, the molecular-adhesive layer and the second thermoplastic resin layer serving as the outermost layers at the time of use, wherein, when the heat-sealable temperature of the first thermoplastic resin layer is expressed by Th1 and that of the second thermoplastic resin layer is expressed by Th2, then Th1>Th2; a method for bonding two adherends with this layered product for bonding; and a method for producing a bonded structure. Use of the layered product for bonding of the present invention makes it possible to conduct a thermal fusion-bonding step without adversely affecting the molecular-adhesive layer.

Description

接合用積層体、2つの被着体を接合する方法、及び、接合構造体の製造方法Laminated body for joining, method for joining two adherends, and method for producing joined structure

 本発明は、分子接着剤層(分子接着剤を用いて形成された層をいう。以下同じ)を有する接合用積層体、この接合用積層体を用いて2つの被着体を接合する方法、及び、接合構造体の製造方法に関する。 The present invention relates to a bonding laminate having a molecular adhesive layer (a layer formed using a molecular adhesive; hereinafter the same), a method of bonding two adherends using the bonding laminate, And it is related with the manufacturing method of a joining structure.

 2種以上の反応性基を有する化合物は、それぞれの反応性基の特性を利用して化学結合を形成し得ることから、分子接着剤として有用である。
 例えば、特許文献1には、基体Aと基体Bとを接合する方法であって、基体Aの表面に、特定の分子接着剤を用いて分子接着剤層を形成する工程と、この基体A表面の分子接着剤に対向して基体Bを配置する工程と、基体A及び基体Bに力を加えて、基体Aと基体Bとを接合する工程と、を有する接合方法が記載されている。
A compound having two or more types of reactive groups is useful as a molecular adhesive because it can form a chemical bond utilizing the characteristics of each reactive group.
For example, Patent Document 1 discloses a method of bonding a base A and a base B, a step of forming a molecular adhesive layer on the surface of the base A using a specific molecular adhesive, and the surface of the base A A bonding method is described which includes a step of disposing the base B so as to face the molecular adhesive, and a step of bonding the base A and the base B by applying a force to the base A and the base B.

 特許文献1には、基体の表面に分子接着剤層を形成する方法として、分子接着剤が溶解又は分散した分子接着剤液を調製し、基体をこの分子接着剤液に浸漬させた後、このものに紫外線を照射することにより、分子接着剤と基体の表面との間で化学結合を形成させ、分子接着剤層を形成する方法が記載されている。 In Patent Document 1, as a method for forming a molecular adhesive layer on the surface of a substrate, a molecular adhesive solution in which a molecular adhesive is dissolved or dispersed is prepared, and after the substrate is immersed in the molecular adhesive solution, A method is described in which a chemical bond is formed between a molecular adhesive and the surface of a substrate by irradiating the object with ultraviolet rays, thereby forming a molecular adhesive layer.

WO2012/043631号(US2013/177770 A1)WO2012 / 043631 (US2013 / 177770 A1)

 特許文献1に記載されるように、基体を分子接着剤液に浸漬させることにより、基体の両面に分子接着剤層を有する両面接着シートを効率よく得ることができる。このような両面接着シートは、2つの被着体を、容易に、かつ、強固に固定する際の接合材として有用である。
 しかしながら、そのような両面接着シートを量産するためにロールtoロール方式を採用する場合、浸漬法により、基体の両面に分子接着剤層を安定的に形成することは困難であった。
 したがって、ロールtoロール方式を採用して得られた、分子接着剤層を有する接着シートを用いて、2つの被着体を強固に接合し得る方法が要望されていた。
As described in Patent Document 1, a double-sided adhesive sheet having molecular adhesive layers on both sides of a substrate can be efficiently obtained by immersing the substrate in a molecular adhesive solution. Such a double-sided adhesive sheet is useful as a bonding material when two adherends are easily and firmly fixed.
However, when a roll-to-roll method is employed to mass-produce such a double-sided adhesive sheet, it has been difficult to stably form molecular adhesive layers on both sides of the substrate by an immersion method.
Therefore, there has been a demand for a method capable of firmly joining two adherends using an adhesive sheet having a molecular adhesive layer obtained by employing a roll-to-roll method.

 本発明者らは、一方の表面のみに分子接着剤層を有する接合用積層体を使用して2つの被着体を接合する方法について検討した。その結果、熱可塑性樹脂層上に分子接着剤層を有する接合用積層体を2つ用意し、それぞれの分子接着剤層をそれぞれの被着体と接着し、さらに、2つの熱可塑性樹脂層を熱溶着することにより、2つの被着体を強固に接合し得ることを見出した。 The present inventors examined a method of joining two adherends using a joining laminate having a molecular adhesive layer only on one surface. As a result, two laminates for bonding having a molecular adhesive layer on the thermoplastic resin layer were prepared, each molecular adhesive layer was bonded to each adherend, and two thermoplastic resin layers were further bonded. It has been found that two adherends can be bonded firmly by heat welding.

 しかしながら、この接合方法においては、2つの熱可塑性樹脂層を熱溶着する際の条件によっては熱可塑性樹脂層が大きく変形することがあり、その結果、分子接着剤層が変形したり、分子接着剤層の接着力が低下したりするおそれがあった。 However, in this joining method, the thermoplastic resin layer may be greatly deformed depending on the conditions at which the two thermoplastic resin layers are thermally welded. As a result, the molecular adhesive layer may be deformed or the molecular adhesive may be deformed. There was a possibility that the adhesive strength of the layer might be reduced.

 本発明は、この問題を解決することを目的になされたものであり、分子接着剤層と熱可塑性樹脂層とを有する接合用積層体であって、分子接着剤層に悪影響を与えることなく、熱溶着工程を行うことができる接合用積層体、この接合用積層体を用いて2つの被着体を接合する方法、及び、接合構造体の製造方法を提供することを目的とする。 The present invention was made for the purpose of solving this problem, and is a bonding laminate having a molecular adhesive layer and a thermoplastic resin layer, without adversely affecting the molecular adhesive layer. It is an object of the present invention to provide a laminate for bonding capable of performing a heat welding step, a method for bonding two adherends using the laminate for bonding, and a method for manufacturing a bonded structure.

 本発明者らは上記課題を解決すべく、分子接着剤層と熱可塑性樹脂層を有する接合用積層体を使用して2つの被着体を接合する方法について鋭意検討した。
 その結果、以下の要件(a)~(c)を満たす接合用積層体を用いることにより、分子接着剤層に悪影響を与えることなく、熱溶着工程を行い得ることを見出し、本発明を完成するに至った。
要件(a):熱可塑性樹脂層が、第1の熱可塑性樹脂層と第2の熱可塑性樹脂層で構成されている。
要件(b):分子接着剤層が、第1の熱可塑性樹脂層上に形成されている。
要件(c):第2の熱可塑性樹脂層が、第1の熱可塑性樹脂層よりも、より低い温度で熱溶着可能な層である。
In order to solve the above-mentioned problems, the present inventors diligently studied a method of joining two adherends using a joining laminate having a molecular adhesive layer and a thermoplastic resin layer.
As a result, it has been found that by using a laminate for bonding that satisfies the following requirements (a) to (c), a thermal welding process can be performed without adversely affecting the molecular adhesive layer, and the present invention is completed. It came to.
Requirement (a): The thermoplastic resin layer is composed of a first thermoplastic resin layer and a second thermoplastic resin layer.
Requirement (b): A molecular adhesive layer is formed on the first thermoplastic resin layer.
Requirement (c): The second thermoplastic resin layer is a layer that can be thermally welded at a lower temperature than the first thermoplastic resin layer.

 かくして本発明によれば、下記(1)~(6)の接合用積層体、(7)~(9)の2つの被着体を接合する方法、及び(10)~(11)の接合構造体の製造方法が提供される。 Thus, according to the present invention, the following laminates for bonding (1) to (6), the method of bonding the two adherends of (7) to (9), and the bonding structure of (10) to (11) A method of manufacturing a body is provided.

(1)分子接着剤(M)を含む分子接着剤層、単層構造を有する第1の熱可塑性樹脂層、及び単層構造又は多層構造を有する第2の熱可塑性樹脂層をこの順で有し、前記分子接着剤層と第2の熱可塑性樹脂層が、それぞれ使用時における最外層を構成する接合用積層体であって、前記分子接着剤(M)が、アミノ基、アジド基、メルカプト基、イソシアネート基、ウレイド基及びエポキシ基からなる群から選ばれる少なくとも1種の反応性基(Zα)と、シラノール基、及び加水分解反応によりシラノール基を生成させる基からなる群から選ばれる少なくとも1種の反応性基(Zβ)とを有する化合物であり、前記第1の熱可塑性樹脂層は、少なくとも、分子接着剤層と接する側の表面に、前記分子接着剤(M)の反応性基(Zα)と化学結合を形成し得る反応性部分構造(Zγ)を有する熱可塑性樹脂(P)を含むものであり、前記第1の熱可塑性樹脂層のヒートシール可能温度がTh1、前記第2の熱可塑性樹脂層のヒートシール可能温度がTh2であるときに、Th1>Th2である接合用積層体。
(2)前記分子接着剤(M)が有する反応性基(Zα)が、アミノ基、メルカプト基、イソシアネート基、ウレイド基及びエポキシ基からなる群から選ばれる少なくとも1種であり、熱可塑性樹脂(P)が有する反応性部分構造(Zγ)が、ヒドロキシ基、カルボキシ基、アルデヒド基、及びアミノ基からなる群から選ばれる少なくとも1種である、又は、前記分子接着剤(M)が有する反応性基(Zα)が、アジド基であり、熱可塑性樹脂(P)が有する反応性部分構造(Zγ)が、炭素-炭素単結合、炭素-炭素二重結合、及び炭素-水素単結合からなる群から選ばれる少なくとも1種である、(1)に記載の接合用積層体。
(3)前記分子接着剤(M)が、下記式(1)で示される化合物である、(1)又は(2)に記載の接合用積層体。
(1) A molecular adhesive layer containing a molecular adhesive (M), a first thermoplastic resin layer having a single layer structure, and a second thermoplastic resin layer having a single layer structure or a multilayer structure are provided in this order. The molecular adhesive layer and the second thermoplastic resin layer are each a laminate for bonding that constitutes the outermost layer in use, and the molecular adhesive (M) is an amino group, an azide group, a mercapto At least one selected from the group consisting of at least one reactive group (Zα) selected from the group consisting of a group, an isocyanate group, a ureido group, and an epoxy group, a silanol group, and a group that generates a silanol group by a hydrolysis reaction. A compound having a reactive group (Zβ) of the species, and the first thermoplastic resin layer has at least a reactive group (M) of the molecular adhesive (M) on the surface in contact with the molecular adhesive layer. Zα) and chemical bond A thermoplastic resin having formed may reactive moiety structure (Zγ) are those containing a (P 1), heat-sealable temperature of the first thermoplastic resin layer is T h1, the second thermoplastic resin layer When the heat-sealable temperature of Th2 is Th2 , the laminated body for joining which is Th1 > Th2 .
(2) The reactive group (Zα) of the molecular adhesive (M) is at least one selected from the group consisting of an amino group, a mercapto group, an isocyanate group, a ureido group, and an epoxy group, and a thermoplastic resin ( The reactive partial structure (Zγ) of P 1 ) is at least one selected from the group consisting of a hydroxy group, a carboxy group, an aldehyde group, and an amino group, or the reaction that the molecular adhesive (M) has The reactive group (Zγ) of the thermoplastic resin (P 1 ) is a carbon-carbon single bond, a carbon-carbon double bond, and a carbon-hydrogen single bond. The laminate for bonding according to (1), which is at least one selected from the group consisting of:
(3) The bonding laminate according to (1) or (2), wherein the molecular adhesive (M) is a compound represented by the following formula (1).

Figure JPOXMLDOC01-appb-C000004
Figure JPOXMLDOC01-appb-C000004

(Rは、アミノ基、アジド基、メルカプト基、イソシアネート基、ウレイド基及びエポキシ基からなる群から選ばれる反応性基(Zα)、又は、これらの反応性基を1以上有する1価の基(ただし、アミノ基、アジド基、メルカプト基、イソシアネート基、ウレイド基及びエポキシ基を除く。)を表し、Gは2価の有機基を表し、Xは、ヒドロキシ基、炭素数1~10のアルコキシ基又はハロゲン原子を表し、Yは、炭素数1~20の炭化水素基を表す。aは、1~3の整数を表す。)
(4)分子接着剤(M)の反応性基(Zα)と、熱可塑性樹脂(P)の反応性部分構造(Zγ)が化学結合を形成している、(1)~(3)のいずれかに記載の接合用積層体。
(5)前記熱可塑性樹脂(P)が、オレフィン系樹脂、シクロオレフィン系樹脂、アクリル系樹脂、オレフィン-酢酸ビニル系樹脂、オレフィン系アイオノマー樹脂、及びポリエステル樹脂からなる群から選ばれる少なくとも1種である、(1)~(4)のいずれかに記載の接合用積層体。
(6)前記第2の熱可塑性樹脂層は、少なくとも分子接着剤層とは逆側の表面に、オレフィン系樹脂、シクロオレフィン系樹脂、アクリル系樹脂、オレフィン-酢酸ビニル系樹脂、オレフィン系アイオノマー樹脂、及びポリエステル樹脂からなる群から選ばれる少なくとも1種を含むものである、(1)~(5)のいずれかに記載の接合用積層体。
(7)2つの接合用積層体を使用して、被着体(I)と被着体(II)とを接合する方法であって、前記2つの接合用積層体が、それぞれ独立して、(1)~(6)のいずれかに記載の接合用積層体であり、第1の接合用積層体を、分子接着剤(M)を含む分子接着剤層(A-M)、単層構造を有する第1の熱可塑性樹脂層(A-1)、及び単層構造又は多層構造を有する第2の熱可塑性樹脂層(A-2)をこの順で有する接合用積層体(A)と表し、第2の接合用積層体を、分子接着剤(M)を含む分子接着剤層(B-M)、単層構造を有する第1の熱可塑性樹脂層(B-1)、及び単層構造又は多層構造を有する第2の熱可塑性樹脂層(B-2)をこの順で有する接合用積層体(B)と表したときに、以下の工程(L1)~(L3)を含む工程群と、工程(M1)~(M3)を含む工程群と、工程(N1)、(N2)を含む工程群と、から選ばれるいずれかの工程群を行うことを特徴とする、被着体(I)と被着体(II)とを接合する方法。
工程(L1):接合用積層体(A)の分子接着剤層(A-M)と被着体(I)とを接着する工程
工程(L2):接合用積層体(B)の分子接着剤層(B-M)と被着体(II)とを接着する工程
工程(L3):工程(L1)で得られた積層体の第2の熱可塑性樹脂層(A-2)と、工程(L2)で得られた積層体の第2の熱可塑性樹脂層(B-2)とを熱溶着する工程
工程(M1):接合用積層体(A)の第2の熱可塑性樹脂層(A-2)と、接合用積層体(B)の第2の熱可塑性樹脂層(B-2)とを熱溶着する工程
工程(M2):工程(M1)で得られた積層体の分子接着剤層(A-M)と被着体(I)とを接着する工程
工程(M3):工程(M2)で得られた積層体の分子接着剤層(B-M)と被着体(II)とを接着する工程
工程(N1):接合用積層体(A)の第2の熱可塑性樹脂層(A-2)と、接合用積層体(B)の第2の熱可塑性樹脂層(B-2)が対向する配置で、被着体(I)、接合用積層体(A)、接合用積層体(B)、被着体(II)を、この順に重ねる工程
工程(N2):工程(N1)で得られたものを加熱して、分子接着剤層(A-M)と被着体(I)との接着と、分子接着剤層(B-M)と被着体(II)との接着と、第2の熱可塑性樹脂層(A-2)と第2の熱可塑性樹脂層(B-2)との熱溶着を同時に行う工程
(8)前記工程(L1)~(L3)を含む工程群を行う、被着体(I)と被着体(II)とを接合する方法であって、
 工程(L1)において、接合用積層体(A)の分子接着剤層(A-M)と被着体(I)とを接着する際の温度がTL1、工程(L2)において、接合用積層体(B)の分子接着剤層(B-M)と被着体(II)とを接着する際の温度がTL2、工程(L3)において、第2の熱可塑性樹脂層(A-2)と第2の熱可塑性樹脂層(B-2)とを熱溶着する際の温度がTL3、接合用積層体(A)の第1の熱可塑性樹脂層(A-1)のヒートシール可能温度がTh1A、第2の熱可塑性樹脂層(A-2)のヒートシール可能温度がTh2Aであり、接合用積層体(B)の第1の熱可塑性樹脂層(B-1)のヒートシール可能温度がTh1B、第2の熱可塑性樹脂層(B-2)のヒートシール可能温度がTh2Bであるときに、下記式(E-1)と式(E-2)のいずれも満たし、かつ、下記式(E-3)と式(E-4)の少なくとも一方を満たす、(7)に記載の、被着体(I)と被着体(II)とを接合する方法。
(R 1 is a reactive group (Zα) selected from the group consisting of an amino group, an azide group, a mercapto group, an isocyanate group, a ureido group and an epoxy group, or a monovalent group having one or more of these reactive groups. (However, an amino group, an azide group, a mercapto group, an isocyanate group, a ureido group and an epoxy group are excluded.) G represents a divalent organic group, X represents a hydroxy group, an alkoxy having 1 to 10 carbon atoms. And Y represents a hydrocarbon group having 1 to 20 carbon atoms, and a represents an integer of 1 to 3.)
(4) The reactive group (Zα) of the molecular adhesive (M) and the reactive partial structure (Zγ) of the thermoplastic resin (P 1 ) form a chemical bond, (1) to (3) The laminated body for bonding in any one.
(5) The thermoplastic resin (P 1 ) is at least one selected from the group consisting of olefin resins, cycloolefin resins, acrylic resins, olefin-vinyl acetate resins, olefin ionomer resins, and polyester resins. The bonding laminate according to any one of (1) to (4), wherein
(6) The second thermoplastic resin layer has an olefin resin, a cycloolefin resin, an acrylic resin, an olefin-vinyl acetate resin, an olefin ionomer resin on at least the surface opposite to the molecular adhesive layer. And a laminate for bonding according to any one of (1) to (5), comprising at least one selected from the group consisting of polyester resins.
(7) A method of bonding an adherend (I) and an adherend (II) using two bonding laminates, wherein the two bonding laminates are independently The bonding laminate according to any one of (1) to (6), wherein the first bonding laminate comprises a molecular adhesive layer (AM) containing a molecular adhesive (M A ), a single layer A bonding laminate (A) having a first thermoplastic resin layer (A-1) having a structure and a second thermoplastic resin layer (A-2) having a single layer structure or a multilayer structure in this order; A second bonding laminate, a molecular adhesive layer (BM) containing a molecular adhesive (M B ), a first thermoplastic resin layer (B-1) having a single-layer structure, and a single When the second thermoplastic resin layer (B-2) having a layer structure or a multilayer structure is expressed as a bonding laminate (B) having this order, the following steps (L1) to (L3) ), A process group including processes (M1) to (M3), and a process group including processes (N1) and (N2). A method for joining the adherend (I) and the adherend (II).
Step (L1): Step of bonding the molecular adhesive layer (AM) of the bonding laminate (A) and the adherend (I) Step (L2): Molecular adhesive of the bonding laminate (B) Step (L3) for bonding the layer (BM) and the adherend (II): the second thermoplastic resin layer (A-2) of the laminate obtained in the step (L1), and a step ( Step (M1) of heat-welding the second thermoplastic resin layer (B-2) of the laminate obtained in L2): the second thermoplastic resin layer (A- 2) and step (M2) of thermally welding the second thermoplastic resin layer (B-2) of the laminate for bonding (B): molecular adhesive layer of the laminate obtained in step (M1) Step (M3) for bonding (AM) and adherend (I): molecular adhesive layer (BM) and adherend (II) of the laminate obtained in step (M2) Process process ( 1) An arrangement in which the second thermoplastic resin layer (A-2) of the laminate for bonding (A) and the second thermoplastic resin layer (B-2) of the laminate for bonding (B) face each other. , Adherend (I), bonding laminate (A), bonding laminate (B), and adherend (II) are stacked in this order (step (N2): obtained in step (N1) Are heated, the adhesion between the molecular adhesive layer (AM) and the adherend (I), the adhesion between the molecular adhesive layer (BM) and the adherend (II), the second (8) performing the thermal welding of the thermoplastic resin layer (A-2) and the second thermoplastic resin layer (B-2) at the same time (8) performing the process group including the steps (L1) to (L3); A method of joining the adherend (I) and the adherend (II),
In step (L1), the temperature at which the molecular adhesive layer (AM) of the bonding laminate (A) and the adherend (I) are bonded is T L1 , and in the step (L2), the bonding laminate The temperature at which the molecular adhesive layer (BM) of the body (B) and the adherend (II) are bonded is T L2 , and in the step (L3), the second thermoplastic resin layer (A-2) The temperature at which the second thermoplastic resin layer (B-2) is thermally welded is T L3 , and the heat-sealable temperature of the first thermoplastic resin layer (A-1) of the laminate for joining (A) T h1A , the heat-sealable temperature of the second thermoplastic resin layer (A-2) is Th 2A , and the heat seal of the first thermoplastic resin layer (B-1) of the laminate for bonding (B) possible temperature T h1b, when the heat-sealable temperature of the second thermoplastic resin layer (B-2) is a T H2B, the following formula (E The adherend (I) according to (7), wherein both 1) and formula (E-2) are satisfied, and at least one of the following formulas (E-3) and (E-4) is satisfied: A method of joining the adherend (II).

Figure JPOXMLDOC01-appb-M000005
Figure JPOXMLDOC01-appb-M000005

(9)前記工程(N1)、(N2)を含む工程群を行う、被着体(I)と被着体(II)とを接合する方法であって、接合用積層体(A)の第1の熱可塑性樹脂層(A-1)のヒートシール可能温度がTh1A、第2の熱可塑性樹脂層(A-2)のヒートシール可能温度がTh2Aであり、接合用積層体(B)の第1の熱可塑性樹脂層(B-1)のヒートシール可能温度がTh1B、第2の熱可塑性樹脂層(B-2)のヒートシール可能温度がTh2Bであり、工程(N2)において、熱溶着する際の温度がTN2であるときに、下記式(E-5)と式(E-6)の少なくとも一方を満たす、(7)に記載の、被着体(I)と被着体(II)とを接合する方法。 (9) A method of joining the adherend (I) and the adherend (II), wherein the process group including the steps (N1) and (N2) is performed, and the joining laminate (A) The heat-sealable temperature of the thermoplastic resin layer (A-1) No. 1 is Th1A , the heat-sealable temperature of the second thermoplastic resin layer (A-2) is Th2A , and the laminate for bonding (B) In the step (N2), the heat-sealable temperature of the first thermoplastic resin layer (B-1) is T h1B , and the heat-sealable temperature of the second thermoplastic resin layer (B-2) is Th2B . When the temperature at the time of heat welding is TN2 , at least one of the following formulas (E-5) and (E-6) is satisfied: A method of joining the body (II).

Figure JPOXMLDOC01-appb-M000006
Figure JPOXMLDOC01-appb-M000006

(10)被着体(I)/接合用積層体(A)と接合用積層体(B)由来の層/被着体(II)、の層構造を有する接合構造体の製造方法であって、(7)~(9)のいずれかに記載の方法を使用して、被着体(I)と被着体(II)を接合することを特徴とする、接合構造体の製造方法。
(11)被着体(I)と被着体(II)が、それぞれ独立して、金属、無機物、及び熱硬化性樹脂からなる群から選ばれる少なくとも1種を、少なくとも被接着面に含むものである、(10)に記載の接合構造体の製造方法。
(10) A method for producing a bonded structure having a layer structure of an adherend (I) / bonded laminate (A) and a layer derived from the bonded laminate (B) / adhered body (II). A method for producing a bonded structure comprising bonding the adherend (I) and the adherend (II) using the method according to any one of (7) to (9).
(11) The adherend (I) and the adherend (II) each independently include at least one selected from the group consisting of metals, inorganic substances, and thermosetting resins on the adherend surface. (10) The manufacturing method of the junction structure according to (10).

 本発明において、分子接着剤とは、2種以上の反応性基を有する化合物をいう。
 「分子接着剤を含む分子接着剤層」の「分子接着剤を含む」とは、「分子接着剤及び/又は分子接着剤由来の化合物(例えば、反応を経て、反応性基の構造が変化した化合物)を含む」を意味するものである。
 「第1の熱可塑性樹脂層が、反応性部分構造(Zγ)を有する熱可塑性樹脂を含む」とは、「反応性部分構造(Zγ)を有する熱可塑性樹脂及び/又はこの熱可塑性樹脂由来の樹脂(例えば、反応を経て、反応性部分構造(Zγ)の構造が変化したもの)を含む」を意味するものである。
 「分子接着剤層と第2の熱可塑性樹脂層が、それぞれ使用時における最外層を構成する」とは、分子接着剤層を被着体と接着したり、第2の熱可塑性樹脂層同士を熱溶着したりする際に、それぞれの層が最外層であることをいう。したがって、接合用積層体の製造後から使用するまでの間には、接合用積層体は保護シート等を最外層として有していてもよい。
 熱可塑性樹脂層の「ヒートシール可能温度」とは、十分なヒートシール強度を達成するために、熱溶着時に必要な温度であり、具体的には、実施例に記載の方法にしたがって、ヒートシール可能温度を求めることができる。
 「分子接着剤層と被着体とを接着する際の温度」や、「熱可塑性樹脂層と熱可塑性樹脂層とを熱溶着する際の温度」とは、加熱プレス機等を用いる場合は、その装置の圧着部材の表面温度のことをいう。
 なお、本明細書において温度の単位は「℃」である。
In the present invention, the molecular adhesive refers to a compound having two or more reactive groups.
“Molecular adhesive containing” in the “molecular adhesive layer containing molecular adhesive” means “molecular adhesive and / or a compound derived from a molecular adhesive (for example, the structure of a reactive group has changed through a reaction). Compound) ”.
“The first thermoplastic resin layer contains a thermoplastic resin having a reactive partial structure (Zγ)” means “a thermoplastic resin having a reactive partial structure (Zγ) and / or derived from this thermoplastic resin. It includes a resin (for example, a resin that has undergone a reaction to change the structure of the reactive partial structure (Zγ)).
“The molecular adhesive layer and the second thermoplastic resin layer each constitute the outermost layer in use” means that the molecular adhesive layer is adhered to the adherend or the second thermoplastic resin layers are bonded to each other. Each layer is the outermost layer when thermally welded. Therefore, the laminate for bonding may have a protective sheet or the like as the outermost layer after the laminate for manufacturing is used until it is used.
The “heat sealable temperature” of the thermoplastic resin layer is a temperature necessary for heat welding in order to achieve a sufficient heat seal strength. Specifically, according to the method described in the examples, heat seal Possible temperature can be determined.
"Temperature when adhering the molecular adhesive layer and adherend" and "Temperature when thermally welding the thermoplastic resin layer and the thermoplastic resin layer" are used when a heating press or the like is used. The surface temperature of the crimping member of the device.
In this specification, the unit of temperature is “° C.”.

 本発明によれば、分子接着剤層と熱可塑性樹脂層とを有する接合用積層体であって、分子接着剤層に悪影響を与えることなく、熱溶着工程を行うことができる接合用積層体、この接合用積層体を用いて2つの被着体を接合する方法、及び、接合構造体の製造方法が提供される。 According to the present invention, a bonding laminate having a molecular adhesive layer and a thermoplastic resin layer, the bonding laminate capable of performing a heat welding step without adversely affecting the molecular adhesive layer, A method for bonding two adherends using the bonding laminate and a method for manufacturing a bonded structure are provided.

本発明の接合用積層体の製造工程の一例を表す模式図である。It is a schematic diagram showing an example of the manufacturing process of the laminated body for joining of this invention. 工程(L1)~(L3)を含む工程群を表す模式図である。FIG. 5 is a schematic diagram showing a process group including processes (L1) to (L3). 工程(M1)~(M3)を含む工程群を表す模式図である。FIG. 5 is a schematic diagram showing a process group including processes (M1) to (M3). 工程(N1)、(N2)を含む工程群を表す模式図である。It is a schematic diagram showing the process group containing process (N1) and (N2).

 以下、本発明を、1)接合用積層体、2)2つの被着体を接合する方法、及び、3)接合構造体の製造方法、に項分けして詳細に説明する。 Hereinafter, the present invention will be described in detail by dividing into 1) a laminate for joining, 2) a method for joining two adherends, and 3) a method for producing a joined structure.

1)接合用積層体
 本発明の接合用積層体は、分子接着剤(M)を含む分子接着剤層、単層構造を有する第1の熱可塑性樹脂層、及び単層構造又は多層構造を有する第2の熱可塑性樹脂層をこの順で有し、前記分子接着剤層と第2の熱可塑性樹脂層が、それぞれ使用時における最外層を構成する接合用積層体であって、前記分子接着剤(M)が、アミノ基、アジド基、メルカプト基、イソシアネート基、ウレイド基及びエポキシ基からなる群から選ばれる少なくとも1種の反応性基(Zα)と、シラノール基、及び加水分解反応によりシラノール基を生成させる基からなる群から選ばれる少なくとも1種の反応性基(Zβ)とを有する化合物であり、前記第1の熱可塑性樹脂層は、少なくとも、分子接着剤層と接する側の表面に、前記分子接着剤(M)の反応性基(Zα)と化学結合を形成し得る反応性部分構造(Zγ)を有する熱可塑性樹脂(P)を含むものであり、前記第1の熱可塑性樹脂層のヒートシール可能温度がTh1、前記第2の熱可塑性樹脂層のヒートシール可能温度がTh2であるときに、Th1>Th2である接合用積層体である。
1) Bonding Laminate The bonding laminate of the present invention has a molecular adhesive layer containing a molecular adhesive (M), a first thermoplastic resin layer having a single layer structure, and a single layer structure or a multilayer structure. The molecular adhesive layer has a second thermoplastic resin layer in this order, and each of the molecular adhesive layer and the second thermoplastic resin layer constitutes an outermost layer at the time of use. (M) is at least one reactive group (Zα) selected from the group consisting of an amino group, an azido group, a mercapto group, an isocyanate group, a ureido group and an epoxy group, a silanol group, and a silanol group by hydrolysis reaction. Is a compound having at least one reactive group (Zβ) selected from the group consisting of groups that form a group, and the first thermoplastic resin layer is at least on the surface in contact with the molecular adhesive layer, Molecular adhesion Those containing a thermoplastic resin (P 1) having a reactive group (M) reactive moieties capable of forming (Zα) and the chemical bond (Zγ), heat-sealing of the first thermoplastic resin layer When the possible temperature is T h1 and the heat-sealable temperature of the second thermoplastic resin layer is T h2 , the laminated body for joining satisfying T h1 > T h2 .

〔分子接着剤層〕
 分子接着剤層は、第1の熱可塑性樹脂層上に直接隣接する層である。
 分子接着剤層は、接合用積層体の使用時において、最外層の一方を構成する層である。
 分子接着剤層は、被着体との接着に用いられる。
[Molecular adhesive layer]
The molecular adhesive layer is a layer directly adjacent on the first thermoplastic resin layer.
The molecular adhesive layer is a layer constituting one of the outermost layers when the bonding laminate is used.
The molecular adhesive layer is used for adhesion to the adherend.

 分子接着剤層は、分子接着剤(M)を用いて形成された層であって、分子接着剤(M)を含むものである。すなわち、接合用積層体中の分子接着剤層は、分子接着剤(M)(反応性基が残存しているもの)と分子接着剤(M)の反応生成物(反応性基の構造が変化したもの)の少なくとも一方を含むものである。 The molecular adhesive layer is a layer formed using the molecular adhesive (M) and includes the molecular adhesive (M). That is, the molecular adhesive layer in the bonding laminate is a reaction product of the molecular adhesive (M) (reactive group remaining) and the molecular adhesive (M) (reactive group structure changes). At least one of the above).

 分子接着剤(M)は、アミノ基、アジド基、メルカプト基、イソシアネート基、ウレイド基及びエポキシ基からなる群から選ばれる少なくとも1種の反応性基(Zα)と、シラノール基、及び加水分解反応によりシラノール基を生成させる基からなる群から選ばれる少なくとも1種の反応性基(Zβ)とを有する化合物である。なお、反応性基(Zα)の「アミノ基」には、無置換アミノ基、モノ置換アミノ基、ジ置換アミノ基、1級アンモニウム基、2級アンモニウム基、3級アンモニウム基、4級アンモニウム基が含まれるものとする。 The molecular adhesive (M) includes at least one reactive group (Zα) selected from the group consisting of an amino group, an azide group, a mercapto group, an isocyanate group, a ureido group, and an epoxy group, a silanol group, and a hydrolysis reaction. Is a compound having at least one reactive group (Zβ) selected from the group consisting of groups that generate silanol groups. The “amino group” of the reactive group (Zα) includes an unsubstituted amino group, a mono-substituted amino group, a di-substituted amino group, a primary ammonium group, a secondary ammonium group, a tertiary ammonium group, and a quaternary ammonium group. Is included.

 分子接着剤(M)中の反応性基(Zα)は、第1の熱可塑性樹脂層中の熱可塑性樹脂(P)の反応性部分構造(Zγ)と化学結合を形成し得るものである。
 接合用積層体においては、この化学結合により、分子接着剤(M)は第1の熱可塑性樹脂層の表面に化学的に固定されると考えられる。このときの化学結合としては、共有結合、水素結合、イオン結合、分子間力等が挙げられるが、共有結合が好ましい。
The reactive group (Zα) in the molecular adhesive (M) is capable of forming a chemical bond with the reactive partial structure (Zγ) of the thermoplastic resin (P 1 ) in the first thermoplastic resin layer. .
In the laminated body for joining, it is considered that the molecular adhesive (M) is chemically fixed to the surface of the first thermoplastic resin layer by this chemical bond. Examples of the chemical bond at this time include a covalent bond, a hydrogen bond, an ionic bond, and an intermolecular force, and a covalent bond is preferable.

 分子接着剤(M)中の反応性基(Zβ)は、接合用積層体を被着体と接着する際に、主に、被着体との間で化学結合を形成する際に利用される。したがって、接合用積層体は、これらの基との反応性が高い基を表面に有する被着体に対して好ましく用いられる。 The reactive group (Zβ) in the molecular adhesive (M) is mainly used for forming a chemical bond with the adherend when the bonding laminate is bonded to the adherend. . Therefore, the laminate for bonding is preferably used for an adherend having a group having high reactivity with these groups on the surface.

 加水分解反応によりシラノール基を生成させる基としては、Si-Xで表される部分構造を有する基が挙げられる。Xとしては、メトキシ基、エトキシ基、n-プロポキシ基、イソプロポキシ基等の炭素数1~10のアルコキシ基;フッ素原子、塩素原子、臭素原子等のハロゲン原子;等の加水分解性基が挙げられる。 Examples of the group that generates a silanol group by a hydrolysis reaction include a group having a partial structure represented by Si—X 1 . X 1 is a hydrolyzable group such as an alkoxy group having 1 to 10 carbon atoms such as a methoxy group, an ethoxy group, an n-propoxy group or an isopropoxy group; a halogen atom such as a fluorine atom, a chlorine atom or a bromine atom; Can be mentioned.

 分子接着剤(M)としては、下記式(1)で示される化合物が挙げられる。 Examples of the molecular adhesive (M) include a compound represented by the following formula (1).

Figure JPOXMLDOC01-appb-C000007
Figure JPOXMLDOC01-appb-C000007

(Rは、反応性基(Zα)、又は、反応性基(Zα)を1以上有する1価の基(ただし、反応性基(Zα)そのものを除く。)を表し、Gは2価の有機基を表し、Xは、ヒドロキシ基、炭素数1~10のアルコキシ基又はハロゲン原子を表し、Yは、炭素数1~20の炭化水素基を表す。aは、1~3の整数を表す。) (R 1 represents a reactive group (Zα) or a monovalent group having one or more reactive groups (Zα) (excluding the reactive group (Zα) itself), and G is a divalent group. Represents an organic group, X represents a hydroxy group, an alkoxy group having 1 to 10 carbon atoms or a halogen atom, Y represents a hydrocarbon group having 1 to 20 carbon atoms, a represents an integer of 1 to 3 .)

 Rの反応性基(Zα)を1以上有する1価の基としては、例えば、下記式(2)~(4)で表される基が挙げられる。 Examples of the monovalent group having one or more reactive groups (Zα) for R 1 include groups represented by the following formulas (2) to (4).

Figure JPOXMLDOC01-appb-C000008
Figure JPOXMLDOC01-appb-C000008

 式(2)~(4)中、*は、Gとの結合手を表す。
 Rは、炭素数1~10の2価の炭化水素基、好ましくは炭素数2~6の2価の炭化水素基を表す。Rの2価の炭化水素基としては、エチレン基、トリメチレン基、プロピレン基等のアルキレン基;o-フェニレン基、m-フェニレン基、p-フェニレン基等のアリーレン基;が挙げられる。
In the formulas (2) to (4), * represents a bond with G.
R 2 represents a divalent hydrocarbon group having 1 to 10 carbon atoms, preferably a divalent hydrocarbon group having 2 to 6 carbon atoms. Examples of the divalent hydrocarbon group for R 2 include alkylene groups such as ethylene group, trimethylene group and propylene group; and arylene groups such as o-phenylene group, m-phenylene group and p-phenylene group.

 R、Rは、それぞれ独立に、水素原子、又は炭素数1~20の炭化水素基を表し、水素原子、又は炭素数1~10の炭化水素基が好ましい。
 R、Rの炭化水素基としては、メチル基、エチル基、n-プロピル基、イソプロピル基、n-ブチル基、sec-ブチル基、イソブチル基、t-ブチル基、n-ペンチル基、n-ヘキシル基、n-ヘプチル基、n-オクチル基、n-ノニル基、n-デシル基等のアルキル基;ビニル基、1-プロペニル基、2-プロペニル基、イソプロペニル基、3-ブテニル基、4-ペンテニル基、5-ヘキセニル基等のアルケニル基;エチニル基、プロパルギル基、ブチニル基等のアルキニル基;フェニル基、1-ナフチル基、2-ナフチル基等のアリール基;等が挙げられる。
R 3 and R 4 each independently represents a hydrogen atom or a hydrocarbon group having 1 to 20 carbon atoms, preferably a hydrogen atom or a hydrocarbon group having 1 to 10 carbon atoms.
Examples of the hydrocarbon group for R 3 and R 4 include methyl group, ethyl group, n-propyl group, isopropyl group, n-butyl group, sec-butyl group, isobutyl group, t-butyl group, n-pentyl group, n Alkyl groups such as -hexyl group, n-heptyl group, n-octyl group, n-nonyl group, n-decyl group; vinyl group, 1-propenyl group, 2-propenyl group, isopropenyl group, 3-butenyl group, Alkenyl groups such as 4-pentenyl group and 5-hexenyl group; alkynyl groups such as ethynyl group, propargyl group and butynyl group; aryl groups such as phenyl group, 1-naphthyl group and 2-naphthyl group;

 Zは、単結合、又は、-N(R)-、で表される2価の基を表す。Rは、水素原子、又は炭素数1~20の炭化水素基を表す。Rの炭化水素基としては、R、Rの炭化水素基として示したものと同様のものが挙げられる。
 R、Rは、それぞれ独立に、反応性基(Zα)又は前記式(2)で示される基(この場合、式(2)中、*は、芳香環を構成する炭素原子との結合手を表す。)を表す。
Z represents a single bond or a divalent group represented by —N (R 7 ) —. R 7 represents a hydrogen atom or a hydrocarbon group having 1 to 20 carbon atoms. Examples of the hydrocarbon group for R 7 include the same as those shown as the hydrocarbon groups for R 3 and R 4 .
R 5 and R 6 are each independently a reactive group (Zα) or a group represented by the above formula (2) (in this case, in formula (2), * is a bond with a carbon atom constituting an aromatic ring. Represents a hand.)

 Gの2価の有機基としては、置換基を有する、又は無置換の炭素数1~20のアルキレン基、置換基を有する、又は無置換の炭素数2~20のアルケニレン基、置換基を有する、又は無置換の炭素数2~20のアルキニレン基、置換基を有する、又は無置換の炭素数6~20のアリーレン基;等が挙げられる。 The divalent organic group for G has a substituent or an unsubstituted alkylene group having 1 to 20 carbon atoms, a substituent, or an unsubstituted alkenylene group having 2 to 20 carbon atoms, or a substituent. Or an unsubstituted alkynylene group having 2 to 20 carbon atoms, a substituted or unsubstituted arylene group having 6 to 20 carbon atoms, and the like.

 Gの炭素数1~20のアルキレン基としては、メチレン基、エチレン基、プロピレン基、トリメチレン基、テトラメチレン基、ペンタメチレン基、ヘキサメチレン基等が挙げられる。
 Gの炭素数2~20のアルケニレン基としては、ビニレン基、プロペニレン基、ブテニレン基、ペンテニレン基等が挙げられる。
 Gの炭素数2~20のアルキニレン基としては、エチニレン基、プロピニレン基等が挙げられる。
 Gの炭素数6~20のアリーレン基としては、o-フェニレン基、m-フェニレン基、p-フェニレン基、2,6-ナフチレン基、1,5-ナフチレン基等が挙げられる。
Examples of the alkylene group having 1 to 20 carbon atoms of G include a methylene group, an ethylene group, a propylene group, a trimethylene group, a tetramethylene group, a pentamethylene group, and a hexamethylene group.
Examples of the alkenylene group having 2 to 20 carbon atoms of G include vinylene group, propenylene group, butenylene group, pentenylene group and the like.
Examples of the alkynylene group having 2 to 20 carbon atoms of G include an ethynylene group and a propynylene group.
Examples of the arylene group having 6 to 20 carbon atoms of G include o-phenylene group, m-phenylene group, p-phenylene group, 2,6-naphthylene group, 1,5-naphthylene group and the like.

 前記アルキレン基、アルケニレン基、及びアルキニレン基の置換基としては、フッ素原子、塩素原子等のハロゲン原子;メトキシ基、エトキシ基等のアルコキシ基;メチルチオ基、エチルチオ基等のアルキルチオ基;メトキシカルボニル基、エトキシカルボニル基等のアルコキシカルボニル基;等が挙げられる。 Examples of the substituent for the alkylene group, alkenylene group, and alkynylene group include a halogen atom such as a fluorine atom and a chlorine atom; an alkoxy group such as a methoxy group and an ethoxy group; an alkylthio group such as a methylthio group and an ethylthio group; a methoxycarbonyl group; An alkoxycarbonyl group such as an ethoxycarbonyl group; and the like.

 前記アリーレン基の置換基としては、シアノ基;ニトロ基;フッ素原子、塩素原子、臭素原子等のハロゲン原子;メチル基、エチル基等のアルキル基;メトキシ基、エトキシ基等のアルコキシ基;メチルチオ基、エチルチオ基等のアルキルチオ基;等が挙げられる。
 これらの置換基は、アルキレン基、アルケニレン基、アルキニレン基及びアリーレン基等の基において任意の位置に結合していてよい。また、同一若しくは相異なって複数個の置換基がアルキレン基等の基に結合していてもよい。
Examples of the substituent for the arylene group include: a cyano group; a nitro group; a halogen atom such as a fluorine atom, a chlorine atom and a bromine atom; an alkyl group such as a methyl group and an ethyl group; an alkoxy group such as a methoxy group and an ethoxy group; And alkylthio groups such as ethylthio group; and the like.
These substituents may be bonded to any position in a group such as an alkylene group, an alkenylene group, an alkynylene group and an arylene group. A plurality of substituents may be bonded to a group such as an alkylene group, which are the same or different.

 Xの炭素数1~10のアルコキシ基としては、メトキシ基、エトキシ基、n-プロポキシ基、イソプロポキシ基等が挙げられる。
 Xのハロゲン原子としては、フッ素原子、塩素原子、臭素原子等が挙げられる。
 Yの炭素数1~20の炭化水素基としては、R、Rの炭化水素基として示したものと同様のものが挙げられる。
Examples of the alkoxy group having 1 to 10 carbon atoms of X include a methoxy group, an ethoxy group, an n-propoxy group, and an isopropoxy group.
Examples of the halogen atom for X include a fluorine atom, a chlorine atom, and a bromine atom.
Examples of the hydrocarbon group having 1 to 20 carbon atoms for Y include the same as those shown as the hydrocarbon groups for R 3 and R 4 .

 分子接着剤(M)の具体例としては、次のものが挙げられるが、これらに限定されるものではない。
 3-アミノプロピルトリメトキシシラン、3-アミノプロピルトリエトキシシラン、3-アミノプロピルジメトキシメチルシラン、3-アミノプロピルジエトキシメチルシラン、[3-(N,N-ジメチルアミノ)プロピル]トリメトキシシラン、[3-(フェニルアミノ)プロピル]トリメトキシシラン、トリメチル[3-(トリエトキシシリル)プロピル]アンモニウムクロリド、トリメチル[3-(トリメトキシシリル)プロピル]アンモニウムクロリド等のRがアミノ基である分子接着剤;
Specific examples of the molecular adhesive (M) include, but are not limited to, the following.
3-aminopropyltrimethoxysilane, 3-aminopropyltriethoxysilane, 3-aminopropyldimethoxymethylsilane, 3-aminopropyldiethoxymethylsilane, [3- (N, N-dimethylamino) propyl] trimethoxysilane, Molecules in which R 1 is an amino group such as [3- (phenylamino) propyl] trimethoxysilane, trimethyl [3- (triethoxysilyl) propyl] ammonium chloride, trimethyl [3- (trimethoxysilyl) propyl] ammonium chloride adhesive;

 (11-アジドウンデシル)トリメトキシシラン、(11-アジドウンデシル)トリエトキシシラン等のRがアジド基である分子接着剤; Molecular adhesives in which R 1 is an azide group, such as (11-azidoundecyl) trimethoxysilane, (11-azidoundecyl) triethoxysilane;

 3-メルカプトプロピルトリメトキシシラン、3-メルカプトプロピルトリエトキシシラン、3-メルカプトプロピルジメトキシメチルシラン等のRがメルカプト基である分子接着剤; Molecular adhesives in which R 1 is a mercapto group, such as 3-mercaptopropyltrimethoxysilane, 3-mercaptopropyltriethoxysilane, 3-mercaptopropyldimethoxymethylsilane;

 3-(トリメトキシシリル)プロピルイソシアネート、3-(トリエトキシシリル)プロピルイソシアネート等のRがイソシアネート基である分子接着剤; Molecular adhesives in which R 1 is an isocyanate group, such as 3- (trimethoxysilyl) propyl isocyanate, 3- (triethoxysilyl) propyl isocyanate;

 3-ウレイドプロピルトリメトキシシラン、3-ウレイドプロピルトリエトキシシラン等のRがウレイド基である分子接着剤; Molecular adhesives in which R 1 is a ureido group, such as 3-ureidopropyltrimethoxysilane and 3-ureidopropyltriethoxysilane;

 3-グリシドキシプロピルトリメトキシシラン、3-グリシドキシプロピルトリエトキシシラン、3-グリシドキシプロピルメチルジメトキシシラン、3-グリシドキシプロピルメチルジエトキシシラン等のRがエポキシ基である分子接着剤; Molecules in which R 1 is an epoxy group such as 3-glycidoxypropyltrimethoxysilane, 3-glycidoxypropyltriethoxysilane, 3-glycidoxypropylmethyldimethoxysilane, 3-glycidoxypropylmethyldiethoxysilane adhesive;

 3-(2-アミノエチルアミノ)プロピルトリメトキシシラン、3-(2-アミノエチルアミノ)プロピルトリエトキシシラン、3-(2-アミノエチルアミノ)プロピルジメトキシメチルシラン、2-(3,4-エポキシシクロヘキシル)エチルトリメトキシシラン、下記式(5)~(13)で示される化合物等のRが反応性基(Zα)を1以上有する1価の基である分子接着剤; 3- (2-aminoethylamino) propyltrimethoxysilane, 3- (2-aminoethylamino) propyltriethoxysilane, 3- (2-aminoethylamino) propyldimethoxymethylsilane, 2- (3,4-epoxy A molecular adhesive in which R 1 is a monovalent group having one or more reactive groups (Zα) such as (cyclohexyl) ethyltrimethoxysilane, compounds represented by the following formulas (5) to (13);

Figure JPOXMLDOC01-appb-C000009
Figure JPOXMLDOC01-appb-C000009

 分子接着剤(M)は、1種単独で、あるいは2種以上を組み合わせて用いることができる。
 これらの化合物の中で、式(1)で示される化合物としては、Rが式(4)で示される基である化合物が好ましく、式(5)~(13)で示される化合物がより好ましく、式(5)~(10)で示される化合物がさらに好ましい。
 これらの化合物は、Rにトリアジン環を有する。トリアジン環を有する分子接着剤(M)は、第1の熱可塑性樹脂層上により効率よく固定される傾向がある。
A molecular adhesive (M) can be used individually by 1 type or in combination of 2 or more types.
Among these compounds, the compound represented by the formula (1) is preferably a compound in which R 1 is a group represented by the formula (4), more preferably the compounds represented by the formulas (5) to (13). Compounds represented by formulas (5) to (10) are more preferable.
These compounds have a triazine ring at R 1 . The molecular adhesive (M) having a triazine ring tends to be more efficiently fixed on the first thermoplastic resin layer.

 分子接着剤(M)としては、シランカップリング剤として公知の化合物を用いることができる。また、Rが式(4)で示される基である化合物は、WO2012/046651号、WO2012/043631号、WO2013/186941号等に記載の方法に従って合成することができる。 As the molecular adhesive (M), a compound known as a silane coupling agent can be used. Further, compounds wherein R 1 is a group represented by the formula (4) is No. WO2012 / 046651, No. WO2012 / 043631, can be synthesized according to the method described in such as JP WO2013 / 186941.

 分子接着剤層は、分子接着剤(M)以外の成分を含有するものであってもよい。分子接着剤(M)以外の成分としては、触媒等が挙げられる。
 触媒は、反応性基(Zα)の種類に応じて適宜選択して用いることができる。
The molecular adhesive layer may contain components other than the molecular adhesive (M). Examples of components other than the molecular adhesive (M) include a catalyst.
The catalyst can be appropriately selected and used depending on the type of the reactive group (Zα).

 分子接着剤層中の分子接着剤(M)の含有量は、接着に関与しない成分が含まれると、分子接着剤層の接着力が低下することから、分子接着剤層全体を基準として、50質量%以上であることが好ましく、70質量%以上100質量%以下であることがより好ましく、90質量%以上100質量%以下であることがさらに好ましく、100質量%が特に好ましい。 The content of the molecular adhesive (M) in the molecular adhesive layer is 50% on the basis of the whole molecular adhesive layer because the adhesive force of the molecular adhesive layer is reduced when a component not involved in adhesion is included. It is preferably at least mass%, more preferably at least 70 mass% and at most 100 mass%, further preferably at least 90 mass% and at most 100 mass%, particularly preferably at least 100 mass%.

 分子接着剤層の厚さは、200nm以下が好ましく、150nm以下がより好ましく、100nm以下がさらに好ましく、50nm以下が特に好ましい。また分子接着剤層の厚さは、0.5nm以上が好ましく、1nm以上がより好ましい。 The thickness of the molecular adhesive layer is preferably 200 nm or less, more preferably 150 nm or less, further preferably 100 nm or less, and particularly preferably 50 nm or less. Further, the thickness of the molecular adhesive layer is preferably 0.5 nm or more, and more preferably 1 nm or more.

〔第1の熱可塑性樹脂層〕
 第1の熱可塑性樹脂層は、分子接着剤層に隣接する層であって、分子接着剤(M)を固定する役割を担う層である。
 第1の熱可塑性樹脂層は、単層構造を有する。
 第1の熱可塑性樹脂層は、組成が均一であってもよいし、組成が均一でなくてもよい。例えば、第1の熱可塑性樹脂層は、層の表面付近に特定の成分を多く含有し、層の表面付近の組成と層の内部の組成が異なっていてもよい。
[First thermoplastic resin layer]
The first thermoplastic resin layer is a layer adjacent to the molecular adhesive layer and plays a role of fixing the molecular adhesive (M).
The first thermoplastic resin layer has a single layer structure.
The first thermoplastic resin layer may have a uniform composition or a non-uniform composition. For example, the first thermoplastic resin layer may contain a lot of specific components near the surface of the layer, and the composition near the surface of the layer may be different from the composition inside the layer.

 第1の熱可塑性樹脂層は、少なくとも、分子接着剤層と接する側の表面に、前記分子接着剤(M)の反応性基(Zα)と化学結合を形成し得る反応性部分構造(Zγ)を有する熱可塑性樹脂(P)を含むものである。すなわち、接合用積層体中の第1の熱可塑性樹脂層は、熱可塑性樹脂(P)(反応性部分構造(Zγ)が残存しているもの)と熱可塑性樹脂(P)の反応生成物(反応性部分構造(Zγ)が変化したもの)の少なくとも一方を含むものである。
 なお、「分子接着剤層と接する側の表面に熱可塑性樹脂(P)を含む」とは、分子接着剤層を形成する前の段階において、第1の熱可塑性樹脂層の表面に熱可塑性樹脂(P)が露出している状態を表すものである。
 分子接着剤層を形成する前の段階において、第1の熱可塑性樹脂層の表面に熱可塑性樹脂(P)が露出していることにより、熱可塑性樹脂(P)の反応性部分構造(Zγ)は、分子接着剤(M)の反応性基(Zα)と効率よく反応することができる。
The first thermoplastic resin layer has at least a reactive partial structure (Zγ) capable of forming a chemical bond with the reactive group (Zα) of the molecular adhesive (M) on the surface in contact with the molecular adhesive layer. A thermoplastic resin (P 1 ) having That is, the first thermoplastic resin layer in the bonding laminate is a reaction product of the thermoplastic resin (P 1 ) (reactive partial structure (Zγ) remains) and the thermoplastic resin (P 1 ). And at least one of the products (reactive partial structures (Zγ) changed).
Note that “the surface on the side in contact with the molecular adhesive layer contains a thermoplastic resin (P 1 )” means that the surface of the first thermoplastic resin layer is thermoplastic before the molecular adhesive layer is formed. This represents a state in which the resin (P 1 ) is exposed.
In the stage before forming the molecular adhesive layer, by a thermoplastic resin (P 1) is exposed on the surface of the first thermoplastic resin layer, the reactive moiety of the thermoplastic resin (P 1) ( Zγ) can efficiently react with the reactive group (Zα) of the molecular adhesive (M).

 熱可塑性樹脂(P)としては、オレフィン系樹脂、シクロオレフィン系樹脂、アクリル系樹脂、オレフィン-酢酸ビニル系樹脂、オレフィン系アイオノマー樹脂、ポリエステル樹脂等が挙げられる。 Examples of the thermoplastic resin (P 1 ) include olefin resins, cycloolefin resins, acrylic resins, olefin-vinyl acetate resins, olefin ionomer resins, and polyester resins.

 オレフィン系樹脂としては、低密度ポリエチレン、直鎖状低密度ポリエチレン、高密度ポリエチレン、エチレン-プロピレン共重合体、ポリプロピレン、プロピレン-α-オレフィン共重合体、ポリ(4-メチル-1-ペンテン)等が挙げられる。 Examples of the olefin resin include low density polyethylene, linear low density polyethylene, high density polyethylene, ethylene-propylene copolymer, polypropylene, propylene-α-olefin copolymer, poly (4-methyl-1-pentene), etc. Is mentioned.

 シクロオレフィン系樹脂としては、シクロオレフィンの付加重合体、シクロオレフィンとα-オレフィンとの共重合体、ノルボルネン系単量体の開環重合体等が挙げられる。
 シクロオレフィンとしては、シクロペンテン、シクロオクテン、ノルボルネン系単量体等が挙げられる。
 α-オレフィンとしては、エチレン、プロピレン等が挙げられる。
Examples of cycloolefin resins include cycloolefin addition polymers, copolymers of cycloolefins and α-olefins, and ring-opening polymers of norbornene monomers.
Examples of the cycloolefin include cyclopentene, cyclooctene, and norbornene monomers.
Examples of the α-olefin include ethylene and propylene.

 アクリル系樹脂としては、(メタ)アクリル系単量体の単独重合体、(メタ)アクリル系単量体の共重合体、(メタ)アクリル系単量体と、これと共重合可能な単量体との共重合体が挙げられる。
 (メタ)アクリル系単量体としては、メチル(メタ)アクリレート、エチル(メタ)アクリレート、n-プロピル(メタ)アクリレート、n-ブチル(メタ)アクリレート、2-ヒドロキシエチル(メタ)アクリレート、2-エチルヘキシル(メタ)アクリレート等の(メタ)アクリル酸エステル;(メタ)アクリル酸;等が挙げられる。
 (メタ)アクリル系単量体と共重合可能な単量体としては、エチレン;スチレン、α-メチルスチレン、クロロスチレン等の芳香族ビニル単量体;アクリロニトリル、メタクリロニトリル等のシアノ基含有エチレン性不飽和単量体;(メタ)アクリルアミド、N-メチロール(メタ)アクリルアミド、N-ブトキシメチル(メタ)アクリルアミド等の(メタ)アクリルアミド系単量体;等が挙げられる。
 本明細書において、「(メタ)アクリル酸」は、「アクリル酸又はメタクリル酸」を意味する。また「(メタ)アクリル酸エステル」、「(メタ)アクリル」、「(メタ)アクリレート」等の同様の記載についても同じである。
As acrylic resins, homopolymers of (meth) acrylic monomers, copolymers of (meth) acrylic monomers, (meth) acrylic monomers, and single quantities copolymerizable therewith And a copolymer with the body.
(Meth) acrylic monomers include methyl (meth) acrylate, ethyl (meth) acrylate, n-propyl (meth) acrylate, n-butyl (meth) acrylate, 2-hydroxyethyl (meth) acrylate, 2- (Meth) acrylic acid esters such as ethylhexyl (meth) acrylate; (meth) acrylic acid; and the like.
Monomers copolymerizable with (meth) acrylic monomers include ethylene; aromatic vinyl monomers such as styrene, α-methylstyrene and chlorostyrene; cyano group-containing ethylene such as acrylonitrile and methacrylonitrile. Unsaturated monomers; (meth) acrylamide monomers such as (meth) acrylamide, N-methylol (meth) acrylamide, and N-butoxymethyl (meth) acrylamide;
In the present specification, “(meth) acrylic acid” means “acrylic acid or methacrylic acid”. The same applies to the same description of “(meth) acrylic acid ester”, “(meth) acrylic”, “(meth) acrylate”, and the like.

 オレフィン-酢酸ビニル系樹脂としては、エチレン-酢酸ビニル共重合体等が挙げられる。 Examples of the olefin-vinyl acetate resin include ethylene-vinyl acetate copolymers.

 オレフィン系アイオノマー樹脂としては、オレフィン系単量体由来の繰り返し単位とカルボキシ基含有単量体由来の繰り返し単位とを有する共重合体と、この共重合体鎖間を結びつけるイオン架橋を有する樹脂が挙げられる。
 オレフィン系単量体としては、エチレン、プロピレン等が挙げられる。
 カルボキシ基含有単量体としては、アクリル酸、メタクリル酸、マレイン酸、無水マレイン酸、マレイン酸モノメチルエステル、マレイン酸モノエチルエステル等が挙げられる。
Examples of the olefinic ionomer resin include a copolymer having a repeating unit derived from an olefinic monomer and a repeating unit derived from a carboxy group-containing monomer, and a resin having an ionic cross-linking that links the copolymer chains. It is done.
Examples of the olefin monomer include ethylene and propylene.
Examples of the carboxy group-containing monomer include acrylic acid, methacrylic acid, maleic acid, maleic anhydride, maleic acid monomethyl ester, and maleic acid monoethyl ester.

 オレフィン系アイオノマー樹脂のイオン架橋は、カルボキシ基含有単量体のカルボキシ基が脱プロトン化して生成したカルボキシレートイオンと、金属イオンで構成される。
 金属イオンとしては、ナトリウム(I)イオン、カリウム(I)イオン、リチウム(I)イオン、カルシウム(II)イオン、マグネシウム(II)イオン、亜鉛(II)イオン、銅(I)イオン、銅(II)イオン、コバルト(II)イオン、コバルト(III)イオン、ニッケル(II)イオン、マンガン(II)イオン、アルミニウム(III)イオン等が挙げられる。
The ionic crosslinking of the olefin ionomer resin is composed of a carboxylate ion generated by deprotonation of the carboxy group of the carboxy group-containing monomer and a metal ion.
Metal ions include sodium (I) ion, potassium (I) ion, lithium (I) ion, calcium (II) ion, magnesium (II) ion, zinc (II) ion, copper (I) ion, copper (II) ) Ion, cobalt (II) ion, cobalt (III) ion, nickel (II) ion, manganese (II) ion, aluminum (III) ion and the like.

 ポリエステル樹脂としては、多価カルボン酸と多価アルコールの重縮合反応により得られるものが挙げられる。
 多価カルボン酸としては、テレフタル酸、イソフタル酸、フタル酸、コハク酸、アジピン酸、スベリン酸、アゼライン酸、セバシン酸、デカン酸、1、4-シクロヘキサンジカルボン酸、1、4-ナフタレンジカルボン酸、2、6-ナフタレンジカルボン酸、1、8-ナフタレンジカルボン酸、トリメリット酸等が挙げられる。
 多価アルコールとしては、エチレングリコール、プロピレングリコール、1,4-ブタンジオール、2-メチル-1,3-プロパンジオール、1,5-ペンタンジオール、ネオペンチルグリコール、3-メチル-1,5-ペンタンジオール、1、2-ヘキサンジオール、1、6-ヘキサンジオール、1、9-ノナンジオール、1、4-シクロヘキサンジメタノール、ジエチレングリコール、ポリエチレングリコール、ポリプロピレングリコール、ポリテトラメチレングリコール、トリメチロールプロパン、グリセリン等が挙げられる。
Examples of the polyester resin include those obtained by a polycondensation reaction of a polyvalent carboxylic acid and a polyhydric alcohol.
Examples of the polyvalent carboxylic acid include terephthalic acid, isophthalic acid, phthalic acid, succinic acid, adipic acid, suberic acid, azelaic acid, sebacic acid, decanoic acid, 1,4-cyclohexanedicarboxylic acid, 1,4-naphthalenedicarboxylic acid, Examples include 2,6-naphthalenedicarboxylic acid, 1,8-naphthalenedicarboxylic acid, trimellitic acid, and the like.
Examples of polyhydric alcohols include ethylene glycol, propylene glycol, 1,4-butanediol, 2-methyl-1,3-propanediol, 1,5-pentanediol, neopentyl glycol, 3-methyl-1,5-pentane. Diol, 1,2-hexanediol, 1,6-hexanediol, 1,9-nonanediol, 1,4-cyclohexanedimethanol, diethylene glycol, polyethylene glycol, polypropylene glycol, polytetramethylene glycol, trimethylolpropane, glycerin, etc. Is mentioned.

 ポリエステル樹脂の中では、非晶性ポリエステル樹脂がより好ましい。非晶性ポリエステル樹脂とは、DSC(示差走査熱量測定)により、明確な、結晶化又は結晶融解ピークを示さないポリエステル樹脂をいう。
 非晶性ポリエステル樹脂としては、グリコール変性ポリエチレンテレフタレート(PETG)、グリコール変性ポリ(1,4-シクロヘキサンジメチレンテレフタレート)(PCTG)、酸変性ポリ(1,4-シクロヘキサンジメチレンテレフタレート)(PCTA)等が挙げられる。
Among the polyester resins, an amorphous polyester resin is more preferable. An amorphous polyester resin refers to a polyester resin that does not show a clear crystallization or crystal melting peak by DSC (differential scanning calorimetry).
Amorphous polyester resins include glycol-modified polyethylene terephthalate (PETG), glycol-modified poly (1,4-cyclohexanedimethylene terephthalate) (PCTG), acid-modified poly (1,4-cyclohexanedimethylene terephthalate) (PCTA), etc. Is mentioned.

 熱可塑性樹脂(P)は、1種単独で、あるいは2種以上を組み合わせて用いることができる。 The thermoplastic resin (P 1) can be used in combination singly or two or more.

 熱可塑性樹脂(P)は、分子接着剤(M)の反応性基(Zα)と化学結合を形成し得る反応性部分構造(Zγ)を有するものである。
 熱可塑性樹脂(P)が反応性部分構造(Zγ)を有することで、分子接着剤(M)を効率よく固定することができる。
The thermoplastic resin (P 1 ) has a reactive partial structure (Zγ) that can form a chemical bond with the reactive group (Zα) of the molecular adhesive (M).
Since the thermoplastic resin (P 1 ) has the reactive partial structure (Zγ), the molecular adhesive (M) can be efficiently fixed.

 熱可塑性樹脂(P)が有する反応性部分構造(Zγ)としては、ヒドロキシ基、カルボキシ基、アルデヒド基、アミノ基、炭素-炭素単結合、炭素-炭素二重結合、炭素-水素単結合等が挙げられる。後述するように、これらは、分子接着剤(M)中の反応性基(Zα)に合わせて適宜選択することができる。 Examples of the reactive partial structure (Zγ) of the thermoplastic resin (P 1 ) include a hydroxy group, a carboxy group, an aldehyde group, an amino group, a carbon-carbon single bond, a carbon-carbon double bond, and a carbon-hydrogen single bond. Is mentioned. As described later, these can be appropriately selected according to the reactive group (Zα) in the molecular adhesive (M).

 熱可塑性樹脂(P)が、ヒドロキシ基、カルボキシ基、アルデヒド基、アミノ基等の官能基を反応性部分構造(Zγ)として有する熱可塑性樹脂(P’)である場合、熱可塑性樹脂(P’)中のこれらの反応性部分構造(Zγ’)は、公知の方法により形成することができる。 When the thermoplastic resin (P 1 ) is a thermoplastic resin (P 1 ′) having a functional group such as a hydroxy group, a carboxy group, an aldehyde group, and an amino group as a reactive partial structure (Zγ), These reactive partial structures (Zγ ′) in P 1 ′) can be formed by a known method.

 例えば、重合反応を行う際に、ヒドロキシ基、カルボキシ基、アルデヒド基、アミノ基等の官能基を有する単量体を用いることにより、反応性部分構造(Zγ’)を有する熱可塑性樹脂(P’)を製造することができる。また、これらの単量体を使用せずに重合反応を行って得られた重合体に、無水マレイン酸変性等の変性処理を施したりすることにより、反応性部分構造(Zγ’)を有する熱可塑性樹脂(P’)を製造することができる。
 これらの方法により得られた熱可塑性樹脂(P’)を成形材料として用いることで、第1の熱可塑性樹脂層を効率よく形成することができる。
For example, when performing a polymerization reaction, a thermoplastic resin (P 1 ) having a reactive partial structure (Zγ ′) is obtained by using a monomer having a functional group such as a hydroxy group, a carboxy group, an aldehyde group, or an amino group. ') Can be manufactured. In addition, the polymer obtained by carrying out the polymerization reaction without using these monomers may be subjected to a modification treatment such as maleic anhydride modification to cause heat having a reactive partial structure (Zγ ′). A plastic resin (P 1 ′) can be produced.
By using the thermoplastic resin (P 1 ′) obtained by these methods as a molding material, the first thermoplastic resin layer can be efficiently formed.

 また、熱可塑性樹脂(P’)を含まない熱可塑性樹脂層を形成した後、その熱可塑性樹脂層に対して表面処理を施すことにより、その層の表面にヒドロキシ基やカルボキシ基を生じさせてもよい。すなわち、この表面処理を施すことにより、この熱可塑性樹脂層は、第1の熱可塑性樹脂層に必要な要件を充足することになる。
 表面処理としては、ヒドロキシ基やカルボキシ基を生じさせるものであれば特に限定されない。表面処理としては、コロナ処理、プラズマ処理、紫外線照射処理、電子線照射処理、オゾン処理、エキシマ紫外線処理、酸処理、及び塩基処理等が挙げられる。
 これらの表面処理は、公知の方法に従って行うことができる。
In addition, after forming a thermoplastic resin layer that does not contain the thermoplastic resin (P 1 ′), surface treatment is performed on the thermoplastic resin layer, thereby generating hydroxy groups or carboxy groups on the surface of the layer. May be. That is, by performing this surface treatment, the thermoplastic resin layer satisfies the requirements necessary for the first thermoplastic resin layer.
The surface treatment is not particularly limited as long as it generates a hydroxy group or a carboxy group. Examples of the surface treatment include corona treatment, plasma treatment, ultraviolet irradiation treatment, electron beam irradiation treatment, ozone treatment, excimer ultraviolet treatment, acid treatment, and base treatment.
These surface treatments can be performed according to known methods.

 第1の熱可塑性樹脂層は、分子接着剤層との密着性を阻害しない限り、熱可塑性樹脂(P)以外の成分を含有していてもよい。
 熱可塑性樹脂(P)以外の成分としては、紫外線吸収剤、光安定剤、酸化防止剤、帯電防止剤、スリップ剤、アンチブロッキング剤、着色剤等が挙げられる。
 これらの含有量は目的に合わせて適宜決定することができる。
The first thermoplastic resin layer may contain components other than the thermoplastic resin (P 1 ) as long as the adhesion with the molecular adhesive layer is not inhibited.
Examples of components other than the thermoplastic resin (P 1 ) include ultraviolet absorbers, light stabilizers, antioxidants, antistatic agents, slip agents, antiblocking agents, and colorants.
These contents can be appropriately determined according to the purpose.

 第1の熱可塑性樹脂層中の熱可塑性樹脂(P)の含有量は、通常50~100質量%、好ましくは80~100質量%である。 The content of the thermoplastic resin (P 1 ) in the first thermoplastic resin layer is usually 50 to 100% by mass, preferably 80 to 100% by mass.

 第1の熱可塑性樹脂層の厚さは、通常5~150μmであり、10~120μmが好ましく、15~80μmがより好ましい。
 第1の熱可塑性樹脂層の厚さが5μm以上であることで、熱溶着工程における加熱により分子接着剤層の性能が低下するのを十分に抑制することができる。また、第1の熱可塑性樹脂層の厚さが80μm以下であることで、接合部(被着体同士の間)を薄くすることができる。
The thickness of the first thermoplastic resin layer is usually 5 to 150 μm, preferably 10 to 120 μm, more preferably 15 to 80 μm.
It can fully suppress that the performance of a molecular adhesive layer falls by the heating in a heat welding process because the thickness of a 1st thermoplastic resin layer is 5 micrometers or more. Moreover, a junction part (between adherends) can be made thin because the thickness of a 1st thermoplastic resin layer is 80 micrometers or less.

 第1の熱可塑性樹脂層のヒートシール可能温度は、通常100~200℃、好ましくは120~180℃である。
 第1の熱可塑性樹脂層のヒートシール可能温度が100℃以上であることで、熱溶着する際に、第1の熱可塑性樹脂層の形状が変化するのを抑制することができる。また、第1の熱可塑性樹脂層のヒートシール可能温度が200℃以下であることで、熱溶着時に分子接着剤層に与える影響を抑えることができる。
 第1の熱可塑性樹脂層のヒートシール可能温度は、熱可塑性樹脂の種類、熱可塑性樹脂の分子量、熱可塑性樹脂の含有量、添加剤の種類、添加剤の含有量、第1の熱可塑性樹脂層の結晶化度、第1の熱可塑性樹脂層の密度等の影響を受ける特性である。
 したがって、例えば、用いる熱可塑性樹脂を決定した後、添加剤の種類や量を調整することにより、目的のヒートシール可能温度を有する第1の熱可塑性樹脂層を形成することができる。
The heat-sealable temperature of the first thermoplastic resin layer is usually 100 to 200 ° C., preferably 120 to 180 ° C.
When the heat-sealable temperature of the first thermoplastic resin layer is 100 ° C. or higher, it is possible to suppress a change in the shape of the first thermoplastic resin layer when performing heat welding. Moreover, since the heat-sealable temperature of the first thermoplastic resin layer is 200 ° C. or less, the influence on the molecular adhesive layer during heat welding can be suppressed.
The heat-sealable temperature of the first thermoplastic resin layer is the type of thermoplastic resin, the molecular weight of the thermoplastic resin, the content of the thermoplastic resin, the type of additive, the content of additive, the first thermoplastic resin The characteristics are influenced by the crystallinity of the layer, the density of the first thermoplastic resin layer, and the like.
Therefore, for example, after determining the thermoplastic resin to be used, the first thermoplastic resin layer having the target heat-sealable temperature can be formed by adjusting the type and amount of the additive.

〔第2の熱可塑性樹脂層〕
 第2の熱可塑性樹脂層は、第1の熱可塑性樹脂層に隣接する層であって、接合用積層体の使用時において、最外層の一方を構成する層である。なお、第1の熱可塑性樹脂層と第2の熱可塑性樹脂層の間には、接着剤層が存在していてもよい。
 後述するように、第2の熱可塑性樹脂層は、他の接合用積層体の第2の熱可塑性樹脂層との熱溶着に用いられる。
[Second thermoplastic resin layer]
The second thermoplastic resin layer is a layer adjacent to the first thermoplastic resin layer, and constitutes one of the outermost layers when the bonding laminate is used. Note that an adhesive layer may exist between the first thermoplastic resin layer and the second thermoplastic resin layer.
As will be described later, the second thermoplastic resin layer is used for thermal welding with the second thermoplastic resin layer of the other laminate for bonding.

 第2の熱可塑性樹脂層は、単層構造を有していてもよいし、多層構造を有していてもよい。第2の熱可塑性樹脂層が単層構造を有する場合の第2の熱可塑性樹脂層や、第2の熱可塑性樹脂層が多層構造を有する場合のそれぞれの層は、組成が均一であってもよいし、組成が均一でなくてもよい。例えば、これらの層は、層の表面付近に特定の成分を多く含有し、層の表面付近の組成と層の中心部の組成が異なっていてもよい。 The second thermoplastic resin layer may have a single layer structure or a multilayer structure. Even if the composition of the second thermoplastic resin layer when the second thermoplastic resin layer has a single-layer structure and each layer when the second thermoplastic resin layer has a multilayer structure are uniform, The composition may not be uniform. For example, these layers may contain many specific components near the surface of the layer, and the composition near the surface of the layer may be different from the composition at the center of the layer.

 第2の熱可塑性樹脂層は、少なくとも第1の熱可塑性樹脂層とは逆側の表面に、比較的低温で溶融し、かつ、短時間で固化し得る熱可塑性樹脂(以下、「熱可塑性樹脂(P)」ということがある。)を含むことが好ましい。
 第1の熱可塑性樹脂層とは逆側の表面に熱可塑性樹脂(P)を含むことで、他の接合用積層体の熱可塑性樹脂層と熱溶着する際に、その工程を効率よく行うことができる。
 「第1の熱可塑性樹脂層とは逆側の表面に熱可塑性樹脂(P)を含む」とは、第1の熱可塑性樹脂層とは逆側の表面に熱可塑性樹脂(P)が露出していることをいう。
The second thermoplastic resin layer is a thermoplastic resin (hereinafter referred to as “thermoplastic resin”) that can be melted at a relatively low temperature and solidified in a short time on at least the surface opposite to the first thermoplastic resin layer. (It may be referred to as (P 2 ) ”).
By including the thermoplastic resin (P 2 ) on the surface opposite to the first thermoplastic resin layer, the process is efficiently performed when thermally bonding with the thermoplastic resin layer of the other laminate for bonding. be able to.
“The thermoplastic resin (P 2 ) is included on the surface opposite to the first thermoplastic resin layer” means that the thermoplastic resin (P 2 ) is on the surface opposite to the first thermoplastic resin layer. It means being exposed.

 熱可塑性樹脂(P)としては、オレフィン系樹脂、シクロオレフィン系樹脂、アクリル系樹脂、オレフィン-酢酸ビニル系樹脂、オレフィン系アイオノマー樹脂、ポリエステル樹脂等が挙げられる。
 これらの熱可塑性樹脂の具体例としては、熱可塑性樹脂(P)として示したものと同様のものが挙げられる。
 熱可塑性樹脂(P)は、1種単独で、あるいは2種以上を組み合わせて用いることができる。
Examples of the thermoplastic resin (P 2 ) include olefin resins, cycloolefin resins, acrylic resins, olefin-vinyl acetate resins, olefin ionomer resins, and polyester resins.
Specific examples of these thermoplastic resins include the same as those shown as the thermoplastic resin (P 1 ).
Thermoplastic resin (P 2) can be used in combination singly or two or more.

 第2の熱可塑性樹脂層は、熱溶着性を阻害しない限り、熱可塑性樹脂(P)以外の成分を含有していてもよい。
 熱可塑性樹脂(P)以外の成分としては、紫外線吸収剤、光安定剤、酸化防止剤、帯電防止剤、スリップ剤、アンチブロッキング剤、着色剤等が挙げられる。
 これらの含有量は目的に合わせて適宜決定することができる。
The second thermoplastic resin layer may contain components other than the thermoplastic resin (P 2 ) as long as it does not hinder the heat weldability.
Examples of components other than the thermoplastic resin (P 2 ) include ultraviolet absorbers, light stabilizers, antioxidants, antistatic agents, slip agents, antiblocking agents, and colorants.
These contents can be appropriately determined according to the purpose.

 第2の熱可塑性樹脂層が単層構造を有するものであるとき、第2の熱可塑性樹脂層としては、熱可塑性樹脂(P)を含有する均一な層や、少なくとも、第1の熱可塑性樹脂層とは逆側の表面に熱可塑性樹脂(P)を含む不均一な層が挙げられる。
 単層構造を有する第2の熱可塑性樹脂層中の熱可塑性樹脂(P)の含有量は、通常50~100質量%、好ましくは80~100質量%である。
 単層構造を有する第2の熱可塑性樹脂層の厚さは、通常5~150μmであり、10~120μmが好ましく、15~80μmがより好ましい。
 単層構造を有する第2の熱可塑性樹脂層の厚さが5μm以上であることで、熱溶着を十分に行うことができる。また、この第2の熱可塑性樹脂層の厚さが150μm以下であることで、接合部(被着体同士の間)を薄くすることができる。
When the second thermoplastic resin layer has a single layer structure, the second thermoplastic resin layer may be a uniform layer containing a thermoplastic resin (P 2 ) or at least the first thermoplastic resin. A non-uniform layer containing a thermoplastic resin (P 2 ) on the surface opposite to the resin layer can be mentioned.
The content of the thermoplastic resin (P 2 ) in the second thermoplastic resin layer having a single layer structure is usually 50 to 100% by mass, preferably 80 to 100% by mass.
The thickness of the second thermoplastic resin layer having a single layer structure is usually 5 to 150 μm, preferably 10 to 120 μm, more preferably 15 to 80 μm.
When the thickness of the second thermoplastic resin layer having a single layer structure is 5 μm or more, thermal welding can be sufficiently performed. Moreover, a junction part (between adherends) can be made thin because the thickness of this 2nd thermoplastic resin layer is 150 micrometers or less.

 第2の熱可塑性樹脂層が多層構造を有するものであるとき、第2の熱可塑性樹脂層としては、第1の熱可塑性樹脂層とは逆側の最外層(多層構造を有する第2の熱可塑性樹脂層の2つの最外層のうち、第1の熱可塑性樹脂層と接していない方の最外層)が、第1の熱可塑性樹脂層とは逆側の表面に熱可塑性樹脂(P)を含む、多層構造の層が挙げられる。
 多層構造を有する第2の熱可塑性樹脂層においては、第1の熱可塑性樹脂層とは逆側の最外層に含まれる熱可塑性樹脂(P)の含有量は、その最外層全体を基準として、通常50~100質量%、好ましくは80~100質量%である。
 多層構造を有する第2の熱可塑性樹脂層全体の厚さは、通常3~150μmであり、10~120μmが好ましく、15~80μmがより好ましい。
 多層構造を有する第2の熱可塑性樹脂層全体の厚さが3μm以上であることで、熱溶着を十分に行うことができる。また、この第2の熱可塑性樹脂層の厚さが150μm以下であることで、接合部(被着体同士の間)を薄くすることができる。
 多層構造を有する第2の熱可塑性樹脂層において、その層数は特に限定されない。多層構造を有する第2の熱可塑性樹脂層の層数は、通常2~10であり、2~5が好ましい。
When the second thermoplastic resin layer has a multilayer structure, the second thermoplastic resin layer is the outermost layer on the side opposite to the first thermoplastic resin layer (second heat having a multilayer structure). Among the two outermost layers of the thermoplastic resin layer, the outermost layer that is not in contact with the first thermoplastic resin layer) has a thermoplastic resin (P 2 ) on the surface opposite to the first thermoplastic resin layer. And a layer having a multilayer structure.
In the second thermoplastic resin layer having a multilayer structure, the content of the thermoplastic resin (P 2 ) contained in the outermost layer opposite to the first thermoplastic resin layer is based on the entire outermost layer. The amount is usually 50 to 100% by mass, preferably 80 to 100% by mass.
The total thickness of the second thermoplastic resin layer having a multilayer structure is usually 3 to 150 μm, preferably 10 to 120 μm, and more preferably 15 to 80 μm.
When the thickness of the entire second thermoplastic resin layer having a multilayer structure is 3 μm or more, thermal welding can be sufficiently performed. Moreover, a junction part (between adherends) can be made thin because the thickness of this 2nd thermoplastic resin layer is 150 micrometers or less.
In the second thermoplastic resin layer having a multilayer structure, the number of layers is not particularly limited. The number of the second thermoplastic resin layers having a multilayer structure is usually 2 to 10, and preferably 2 to 5.

 第2の熱可塑性樹脂層のヒートシール可能温度は、通常50~180℃、好ましくは70~150℃である。
 第2の熱可塑性樹脂層のヒートシール可能温度が50℃以上であることで、常温での取り扱い性が良好となる。また、第2の熱可塑性樹脂層のヒートシール可能温度が180℃以下であることで、本発明の接合用積層体を使用する際、第2の熱可塑性樹脂層同士の層間を強固に接着することができ、2つの被着体をより強固に接合することができる。
 第2の熱可塑性樹脂層のヒートシール可能温度は、第1の熱可塑性樹脂層のヒートシール可能温度の調整方法と同様の方法により、調整することができる。
 なお、第2の熱可塑性樹脂層が多層構造を有するものであるとき、第2の熱可塑性樹脂層のヒートシール可能温度とは、第1の熱可塑性樹脂層とは逆側の最外層のヒートシール可能温度のことをいう。
The heat-sealable temperature of the second thermoplastic resin layer is usually 50 to 180 ° C., preferably 70 to 150 ° C.
When the heat-sealable temperature of the second thermoplastic resin layer is 50 ° C. or higher, the handleability at normal temperature is improved. Moreover, when the heat-sealable temperature of the second thermoplastic resin layer is 180 ° C. or less, when the laminate for bonding of the present invention is used, the interlayer between the second thermoplastic resin layers is firmly bonded. It is possible to bond the two adherends more firmly.
The heat-sealable temperature of the second thermoplastic resin layer can be adjusted by the same method as the method for adjusting the heat-sealable temperature of the first thermoplastic resin layer.
When the second thermoplastic resin layer has a multilayer structure, the heat-sealable temperature of the second thermoplastic resin layer is the heat of the outermost layer on the side opposite to the first thermoplastic resin layer. The temperature that can be sealed.

〔接合用積層体〕
 接合用積層体は、第1の熱可塑性樹脂層と第2の熱可塑性樹脂層で構成された積層体(以下において、「積層体(η)」と表すことがある。)の第1の熱可塑性樹脂層上に、直接、分子接着剤層を形成することにより製造することができる。
[Laminate for bonding]
The bonding laminate is a first heat of a laminate composed of a first thermoplastic resin layer and a second thermoplastic resin layer (hereinafter sometimes referred to as “laminate (η)”). It can be produced by forming a molecular adhesive layer directly on the plastic resin layer.

 例えば、図1に示すように、第1の熱可塑性樹脂層(1)及び第2の熱可塑性樹脂層(2)で構成された積層体(3)の第1の熱可塑性樹脂層(1)上に、直接、分子接着剤層(4)を形成することにより、接合用積層体(5)が得られる。
 上記のように、積層体(3)においては、第1の熱可塑性樹脂層(1)は、分子接着剤層(4)と接する側の表面(6)に熱可塑性樹脂(P)を含む。さらに、積層体(3)の第2の熱可塑性樹脂層(2)は、第1の熱可塑性樹脂層(1)とは逆側の表面(7)に熱可塑性樹脂(P)を含むことが好ましい。
For example, as shown in FIG. 1, the 1st thermoplastic resin layer (1) of the laminated body (3) comprised by the 1st thermoplastic resin layer (1) and the 2nd thermoplastic resin layer (2). A laminated body (5) for bonding is obtained by directly forming a molecular adhesive layer (4) thereon.
As described above, in the laminate (3), the first thermoplastic resin layer (1) includes the thermoplastic resin (P 1 ) on the surface (6) in contact with the molecular adhesive layer (4). . Furthermore, the second thermoplastic resin layer (2) of the laminate (3) contains a thermoplastic resin (P 2 ) on the surface (7) opposite to the first thermoplastic resin layer (1). Is preferred.

 積層体(η)の製造方法は特に限定されない。
 例えば、熱可塑性樹脂(P)を含有するペレットと、熱可塑性樹脂(P)を含有するペレットをそれぞれ溶融し、これらを多層ダイから同時に押出して得られた共押出多層フィルムを、積層体(η)として用いることができる。
 また、熱可塑性樹脂(P)を含有する樹脂フィルムと、熱可塑性樹脂(P)を含有する樹脂フィルムを貼合して得られた多層フィルムを、積層体(η)として用いることができる。
The manufacturing method of a laminated body ((eta)) is not specifically limited.
For example, a coextruded multilayer film obtained by melting a pellet containing a thermoplastic resin (P 1 ) and a pellet containing a thermoplastic resin (P 2 ) and extruding them simultaneously from a multilayer die is used as a laminate. It can be used as (η).
Further, a resin film containing a thermoplastic resin (P 1), the multi-layer film obtained by pasting a resin film containing a thermoplastic resin (P 2), can be used as a laminate (eta) .

 また、熱可塑性樹脂(P)を含有する第1の熱可塑性樹脂層(樹脂フィルム)上に、熱可塑性樹脂(P)を含有する塗布液を塗布し、得られた塗膜を乾燥して第2の熱可塑性樹脂層を形成したり、熱可塑性樹脂(P)を含有する第2の熱可塑性樹脂層(樹脂フィルム)上に、熱可塑性樹脂(P)を含有する塗布液を塗布し、得られた塗膜を乾燥して第1の熱可塑性樹脂層を形成したりすることにより得られた多層フィルムを、積層体(η)として用いることができる。 Also, on the first thermoplastic resin layer containing a thermoplastic resin (P 1) (resin film), a coating solution containing a thermoplastic resin (P 2) was applied, and drying the resulting coating film Forming a second thermoplastic resin layer, or applying a coating solution containing the thermoplastic resin (P 1 ) on the second thermoplastic resin layer (resin film) containing the thermoplastic resin (P 2 ). A multilayer film obtained by coating and drying the obtained coating film to form the first thermoplastic resin layer can be used as the laminate (η).

 これらの中でも、第1の熱可塑性樹脂層と第2の熱可塑性樹脂層の間の層間剥離が生じにくいことから、共押出多層フィルムを積層体(η)として用いることが好ましい。 Among these, it is preferable to use a coextruded multilayer film as the laminate (η) because delamination between the first thermoplastic resin layer and the second thermoplastic resin layer hardly occurs.

 なお、本明細書においては、まだ他の層が形成されていない状態の樹脂フィルムについても、「第1の熱可塑性樹脂層」や「第2の熱可塑性樹脂層」と表現することがある。 In the present specification, a resin film in which other layers are not yet formed may be expressed as “first thermoplastic resin layer” or “second thermoplastic resin layer”.

 積層体(η)を製造する際には、第1の熱可塑性樹脂層のヒートシール可能温度が第2の熱可塑性樹脂層のヒートシール可能温度よりも高くなるように、それぞれの層の成分を決定する。
 すなわち、本発明の接合用積層体は、第1の熱可塑性樹脂層のヒートシール可能温度がTh1、第2の熱可塑性樹脂層のヒートシール可能温度がTh2であるときに、Th1>Th2である。
 後述するように、2つの被着体を本発明の接合用積層体を用いて接合する場合、第1の熱可塑性樹脂層のヒートシール可能温度を第2の熱可塑性樹脂層のヒートシール可能温度よりも高くすることで、分子接着剤層に悪影響を与えることなく、熱溶着工程を行うことができる。
When producing the laminate (η), the components of each layer are adjusted so that the heat-sealable temperature of the first thermoplastic resin layer is higher than the heat-sealable temperature of the second thermoplastic resin layer. decide.
That is, when the heat-sealable temperature of the first thermoplastic resin layer is Th1 and the heat-sealable temperature of the second thermoplastic resin layer is Th2 in the bonding laminate of the present invention, Th1 > T h2 .
As will be described later, when two adherends are bonded using the bonding laminate of the present invention, the heat-sealable temperature of the first thermoplastic resin layer is set to the heat-sealable temperature of the second thermoplastic resin layer. By making it higher than this, the heat welding step can be performed without adversely affecting the molecular adhesive layer.

 分子接着剤層を形成する際に用いる分子接着剤(M)は、その反応性基(Zα)と、第1の熱可塑性樹脂層中の熱可塑性樹脂(P)の反応性部分構造(Zγ)との組み合わせを考慮して、適宜選択することができる。
 なかでも、反応性基(Zα)と反応性部分構造(Zγ)は、下記の要件(Q1)を満たすことが好ましい。
要件(Q1):
 分子接着剤(M)が有する反応性基(Zα)が、アミノ基、メルカプト基、イソシアネート基、ウレイド基及びエポキシ基からなる群から選ばれる少なくとも1種であり、前記熱可塑性樹脂(P)が有する反応性部分構造(Zγ)が、ヒドロキシ基、カルボキシ基、アルデヒド基、及びアミノ基からなる群から選ばれる少なくとも1種である、又は、
 分子接着剤(M)が有する反応性基(Zα)が、アジド基であり、前記熱可塑性樹脂(P)が有する反応性部分構造(Zγ)が、炭素-炭素単結合、炭素-炭素二重結合、及び炭素-水素単結合からなる群から選ばれる少なくとも1種である。
The molecular adhesive (M) used when forming the molecular adhesive layer is composed of the reactive group (Zα) and the reactive partial structure (Zγ) of the thermoplastic resin (P 1 ) in the first thermoplastic resin layer. ) Can be selected as appropriate.
Of these, the reactive group (Zα) and the reactive partial structure (Zγ) preferably satisfy the following requirement (Q1).
Requirement (Q1):
The reactive group (Zα) of the molecular adhesive (M) is at least one selected from the group consisting of an amino group, a mercapto group, an isocyanate group, a ureido group, and an epoxy group, and the thermoplastic resin (P 1 ). The reactive partial structure (Zγ) of is at least one selected from the group consisting of a hydroxy group, a carboxy group, an aldehyde group, and an amino group, or
The reactive group (Zα) of the molecular adhesive (M) is an azide group, and the reactive partial structure (Zγ) of the thermoplastic resin (P 1 ) is a carbon-carbon single bond, carbon-carbon two At least one selected from the group consisting of a heavy bond and a carbon-hydrogen single bond.

 本発明の接合用積層体においては、分子接着剤(M)の反応性基(Zα)と、熱可塑性樹脂(P)の反応性部分構造(Zγ)が化学結合を形成することにより、分子接着剤(M)は、第1の熱可塑性樹脂層に固定されていると考えられる。
 上記の要件(Q1)を満たすことで、この化学結合を効率よく形成できると考えられる。
In the bonding laminate of the present invention, the reactive group (Zα) of the molecular adhesive (M) and the reactive partial structure (Zγ) of the thermoplastic resin (P 1 ) form a chemical bond, It is considered that the adhesive (M) is fixed to the first thermoplastic resin layer.
It is considered that this chemical bond can be efficiently formed by satisfying the above requirement (Q1).

 反応性基(Zα)が、アミノ基、メルカプト基、イソシアネート基、ウレイド基及びエポキシ基からなる群から選ばれる少なくとも1種である場合、反応性基(Zα)と反応性部分構造(Zγ)の好ましい組み合わせ〔反応性基(Zα)/反応性部分構造(Zγ)〕としては、(アミノ基/ヒドロキシ基)、(アミノ基/カルボキシ基)、(イソシアネート基/ヒドロキシ基)、(イソシアネート基/カルボキシ基)、(ヒドロキシ基/カルボキシ基)等が挙げられる。 When the reactive group (Zα) is at least one selected from the group consisting of an amino group, a mercapto group, an isocyanate group, a ureido group and an epoxy group, the reactive group (Zα) and the reactive partial structure (Zγ) Preferred combinations [reactive group (Zα) / reactive partial structure (Zγ)] include (amino group / hydroxy group), (amino group / carboxy group), (isocyanate group / hydroxy group), and (isocyanate group / carboxy group). Group), (hydroxy group / carboxy group) and the like.

 なお、反応性基(Zα)が、アジド基である場合、後述するように光が照射されることによりアジド基が活性化される。この場合、反応中間体であるナイトレンは、炭素-炭素単結合、炭素-炭素二重結合、炭素-水素単結合と反応し得るため、熱可塑性樹脂(P)の反応性部分構造(Zγ)としては、炭素-炭素単結合、炭素-炭素二重結合、及び炭素-水素単結合からなる群から選ばれる少なくとも1種が好ましく用いられる。
 熱可塑性樹脂であれば、通常、炭素-炭素単結合、炭素-炭素二重結合、炭素-水素単結合の少なくともいずれかを含有する。したがって、アジド基を有する分子接着剤(M)を用いる場合、熱可塑性樹脂(P)の種類は特に限定されない。
When the reactive group (Zα) is an azide group, the azide group is activated by irradiation with light as described later. In this case, nitrene as a reaction intermediate can react with a carbon-carbon single bond, a carbon-carbon double bond, and a carbon-hydrogen single bond, so that the reactive partial structure (Zγ) of the thermoplastic resin (P 1 ). Is preferably at least one selected from the group consisting of a carbon-carbon single bond, a carbon-carbon double bond, and a carbon-hydrogen single bond.
A thermoplastic resin usually contains at least one of a carbon-carbon single bond, a carbon-carbon double bond, and a carbon-hydrogen single bond. Therefore, when the molecular adhesive (M) having an azide group is used, the type of the thermoplastic resin (P 1 ) is not particularly limited.

 分子接着剤層の形成方法は特に限定されない。例えば、分子接着剤(M)を含有する分子接着剤溶液を調製し、この溶液を第1の熱可塑性樹脂層上に塗布し、次いで、得られた塗膜の乾燥処理や、分子接着剤(M)を第1の熱可塑性樹脂層に固定する処理を行うことにより、分子接着剤層を形成することができる。 The method for forming the molecular adhesive layer is not particularly limited. For example, a molecular adhesive solution containing the molecular adhesive (M) is prepared, this solution is applied onto the first thermoplastic resin layer, and then the obtained coating film is subjected to a drying treatment or molecular adhesive ( A molecular adhesive layer can be formed by performing a process of fixing M) to the first thermoplastic resin layer.

 分子接着剤溶液を調製する際に用いる溶媒は特に限定されない。溶媒としては、メタノール、エタノール、イソプロパノール、エチレングリコール、ジエチレングリコール等のアルコール系溶媒;アセトン、メチルエチルケトン等のケトン系溶媒;酢酸エチル、酢酸ブチル等のエステル系溶媒;塩化メチレン等の含ハロゲン化合物系溶媒;ブタン、ヘキサン等の脂肪族炭化水素系溶媒;テトラヒドロフラン、ブチルエーテル等のエーテル系溶媒;ベンゼン、トルエン等の芳香族化合物系溶媒;N,N-ジメチルホルムアミド、N-メチルピロリドン等のアミド系溶媒;水;等が挙げられる。
 これらは1種単独で、あるいは2種以上を組み合わせて用いることができる。
The solvent used when preparing the molecular adhesive solution is not particularly limited. Examples of the solvent include alcohol solvents such as methanol, ethanol, isopropanol, ethylene glycol, and diethylene glycol; ketone solvents such as acetone and methyl ethyl ketone; ester solvents such as ethyl acetate and butyl acetate; halogen-containing compound solvents such as methylene chloride; Aliphatic hydrocarbon solvents such as butane and hexane; Ether solvents such as tetrahydrofuran and butyl ether; Aromatic solvents such as benzene and toluene; Amides solvents such as N, N-dimethylformamide and N-methylpyrrolidone; Water And the like.
These can be used alone or in combination of two or more.

 分子接着剤溶液中の分子接着剤(M)の濃度は特に限定されない。その濃度は、好ましくは0.005~1.000mol/L、より好ましくは0.050~0.500mol/Lである。分子接着剤(M)の濃度を0.005mol/L以上とすることで、分子接着剤層を第1の熱可塑性樹脂層上に効率よく形成することができる。また1.000mol/L以下とすることで分子接着剤溶液の意図しない反応を抑制することができ、溶液の安定性に優れる。 The concentration of the molecular adhesive (M) in the molecular adhesive solution is not particularly limited. The concentration is preferably 0.005 to 1.000 mol / L, more preferably 0.050 to 0.500 mol / L. By setting the concentration of the molecular adhesive (M) to 0.005 mol / L or more, the molecular adhesive layer can be efficiently formed on the first thermoplastic resin layer. Moreover, the reaction which the molecular adhesive solution does not intend can be suppressed by setting it as 1.000 mol / L or less, and it is excellent in stability of a solution.

 分子接着剤溶液の塗布方法としては特に限定されず、公知の塗布方法を使用することができる。塗布方法としては、例えば、スピンコート法、スプレーコート法、バーコート法、ナイフコート法、ロールナイフコート法、ロールコート法、ブレードコート法、ディップコート法、カーテンコート法、ダイコート法、グラビアコート法等が挙げられるが、バーコート法、グラビアコート法が好ましい。 The application method of the molecular adhesive solution is not particularly limited, and a known application method can be used. Examples of the coating method include spin coating, spray coating, bar coating, knife coating, roll knife coating, roll coating, blade coating, dip coating, curtain coating, die coating, and gravure coating. The bar coating method and the gravure coating method are preferable.

 分子接着剤溶液を塗布した後は、通常、得られた塗膜を乾燥するために、自然乾燥や乾燥機構への投入による乾燥処理が必要となる。これらの中でも、乾燥機構への投入による乾燥処理を行うことが生産性の向上の観点から好ましい。当該乾燥機構としては、例えば、エアーオーブンといったバッチ式の乾燥機構、並びにヒートロール、ホットエアースルー機構(開放式の乾燥炉内を被乾燥体が移動、通過しながら、送風を受けつつ加熱・乾燥される設備等)といった連続式の乾燥機構等が挙げられる。なお、これら乾燥機構の一部としても用いることができる装置、例えば、高周波加熱、オイルヒーター等の熱媒循環式ヒーター、及び遠赤外線式ヒーター等のヒーター自体も乾燥機構として用いることができる。これらの中でも生産性の向上の観点からホットエアースルー機構が好ましい。
 当該乾燥機構で調整される乾燥温度は、通常20~250℃、好ましくは25~200℃、より好ましくは30~150℃、特に好ましくは35~120℃である。乾燥時間は、通常1秒から120分、好ましくは10秒から10分、より好ましくは20秒から5分、特に好ましくは30秒から3分である。
After applying the molecular adhesive solution, normally, in order to dry the obtained coating film, it is necessary to carry out a natural drying or a drying process by putting it into a drying mechanism. Among these, it is preferable from the viewpoint of improvement in productivity to perform a drying process by charging into a drying mechanism. As the drying mechanism, for example, a batch-type drying mechanism such as an air oven, a heat roll, a hot air through mechanism (a drying target moves and passes through an open drying furnace, and is heated and dried while receiving air. A continuous drying mechanism, etc.). An apparatus that can also be used as a part of these drying mechanisms, for example, a heating medium circulating heater such as high-frequency heating or an oil heater, and a heater such as a far-infrared heater itself can be used as the drying mechanism. Among these, a hot air through mechanism is preferable from the viewpoint of improving productivity.
The drying temperature adjusted by the drying mechanism is usually 20 to 250 ° C., preferably 25 to 200 ° C., more preferably 30 to 150 ° C., and particularly preferably 35 to 120 ° C. The drying time is usually 1 second to 120 minutes, preferably 10 seconds to 10 minutes, more preferably 20 seconds to 5 minutes, and particularly preferably 30 seconds to 3 minutes.

 分子接着剤層を形成する際は、通常、分子接着剤(M)を第1の熱可塑性樹脂層に固定する処理(以下、固定処理ということがある。)が行われる。固定処理は、分子接着剤(M)の反応性基(Zα)の特性に応じて適宜選択することができる。通常は、分子接着剤(M)を第1の熱可塑性樹脂層上に塗布することにより化学結合が生成し、加熱することにより化学結合の生成が促進するため、加熱処理を行うことが生産性の向上の観点から好ましい。加熱温度は、通常40~250℃、好ましくは60~200℃、より好ましくは80~120℃である。加熱時間は、通常1秒から120分、好ましくは1~60分、より好ましくは1~30分である。
 加熱方法としては特に限定されず、上述の乾燥機構と同様の機構及び装置を用いることができる。
When forming the molecular adhesive layer, a process of fixing the molecular adhesive (M) to the first thermoplastic resin layer (hereinafter sometimes referred to as a fixing process) is usually performed. The fixing treatment can be appropriately selected according to the characteristics of the reactive group (Zα) of the molecular adhesive (M). Usually, a chemical bond is generated by applying the molecular adhesive (M) onto the first thermoplastic resin layer, and the generation of the chemical bond is promoted by heating. It is preferable from the viewpoint of improvement. The heating temperature is usually 40 to 250 ° C, preferably 60 to 200 ° C, more preferably 80 to 120 ° C. The heating time is usually 1 second to 120 minutes, preferably 1 to 60 minutes, more preferably 1 to 30 minutes.
It does not specifically limit as a heating method, The mechanism and apparatus similar to the above-mentioned drying mechanism can be used.

 アジド基のように、反応性基(Zα)が光反応性を有する場合、固定処理としては光照射処理が行われる。照射する光としては、通常、紫外線が用いられる。この場合は、乾燥処理の後に固定処理を行うことが、反応性基(Zα)と反応性基(Zγ)との反応性を向上させる観点から好ましい。
 紫外線の照射は、水銀ランプ、メタルハライドランプ、紫外線LED、無電極ランプ等の光源を使用した紫外線照射装置を用いて行うことができる。
 光照射処理の処理条件は、目的の光反応を行うことができる限り、特に限定されない。
When the reactive group (Zα) has photoreactivity, such as an azide group, a light irradiation process is performed as the fixing process. As the irradiation light, ultraviolet rays are usually used. In this case, it is preferable to perform the fixing treatment after the drying treatment from the viewpoint of improving the reactivity between the reactive group (Zα) and the reactive group (Zγ).
Ultraviolet irradiation can be performed using an ultraviolet irradiation device using a light source such as a mercury lamp, a metal halide lamp, an ultraviolet LED, or an electrodeless lamp.
The treatment conditions for the light irradiation treatment are not particularly limited as long as the target photoreaction can be performed.

 分子接着剤層を形成する際は、分子接着剤溶液の塗布と乾燥処理と固定処理とを複数回繰り返し行ってもよい。 When forming the molecular adhesive layer, the application of the molecular adhesive solution, the drying process, and the fixing process may be repeated a plurality of times.

2)2つの被着体を接合する方法
 本発明の2つの被着体を接合する方法は、2つの接合用積層体を使用して、被着体(I)と被着体(II)とを接合する方法であって、前記2つの接合用積層体が、それぞれ独立して、本発明の接合用積層体であり、第1の接合用積層体を、分子接着剤(M)を含む分子接着剤層(A-M)、単層構造を有する第1の熱可塑性樹脂層(A-1)、及び単層構造又は多層構造を有する第2の熱可塑性樹脂層(A-2)をこの順で有する接合用積層体(A)と表し、第2の接合用積層体を、分子接着剤(M)を含む分子接着剤層(B-M)、単層構造を有する第1の熱可塑性樹脂層(B-1)、及び単層構造又は多層構造を有する第2の熱可塑性樹脂層(B-2)をこの順で有する接合用積層体(B)と表したときに、
 以下の工程(L1)~(L3)を含む工程群と、工程(M1)~(M3)を含む工程群と、工程(N1)、(N2)を含む工程群と、から選ばれるいずれかの工程群を行うことを特徴とする、被着体(I)と被着体(II)とを接合する方法である。
工程(L1):接合用積層体(A)の分子接着剤層(A-M)と被着体(I)とを接着する工程
工程(L2):接合用積層体(B)の分子接着剤層(B-M)と被着体(II)とを接着する工程
工程(L3):工程(L1)で得られた積層体の第2の熱可塑性樹脂層(A-2)と、工程(L2)で得られた積層体の第2の熱可塑性樹脂層(B-2)とを熱溶着する工程
工程(M1):接合用積層体(A)の第2の熱可塑性樹脂層(A-2)と、接合用積層体(B)の第2の熱可塑性樹脂層(B-2)とを熱溶着する工程
工程(M2):工程(M1)で得られた積層体の分子接着剤層(A-M)と被着体(I)とを接着する工程
工程(M3):工程(M2)で得られた積層体の分子接着剤層(B-M)と被着体(II)とを接着する工程
工程(N1):接合用積層体(A)の第2の熱可塑性樹脂層(A-2)と、接合用積層体(B)の第2の熱可塑性樹脂層(B-2)が対向する配置で、被着体(I)、接合用積層体(A)、接合用積層体(B)、被着体(II)を、この順に重ねる工程
工程(N2):工程(N1)で得られたものを加熱して、分子接着剤層(A-M)と被着体(I)との接着と、分子接着剤層(B-M)と被着体(II)との接着と、第2の熱可塑性樹脂層(A-2)と第2の熱可塑性樹脂層(B-2)との熱溶着を同時に行う工程
2) Method of joining two adherends The method of joining two adherends of the present invention uses two laminates for joining, and uses adherend (I) and adherend (II). The two laminates for bonding are each independently the laminate for bonding of the present invention, and the first laminate for bonding contains a molecular adhesive (M A ). A molecular adhesive layer (AM), a first thermoplastic resin layer (A-1) having a single layer structure, and a second thermoplastic resin layer (A-2) having a single layer structure or a multilayer structure. This is expressed as a bonding laminate (A) having this order, and the second bonding laminate is composed of a molecular adhesive layer (BM) containing a molecular adhesive (M B ), a first layer having a single layer structure. A bonding laminate (B) having a thermoplastic resin layer (B-1) and a second thermoplastic resin layer (B-2) having a single layer structure or a multilayer structure in this order; When you,
Any one selected from a process group including the following processes (L1) to (L3), a process group including the processes (M1) to (M3), and a process group including the processes (N1) and (N2). It is a method for joining the adherend (I) and the adherend (II), characterized by performing a process group.
Step (L1): Step of bonding the molecular adhesive layer (AM) of the bonding laminate (A) and the adherend (I) Step (L2): Molecular adhesive of the bonding laminate (B) Step (L3) for bonding the layer (BM) and the adherend (II): the second thermoplastic resin layer (A-2) of the laminate obtained in the step (L1), and a step ( Step (M1) of heat-welding the second thermoplastic resin layer (B-2) of the laminate obtained in L2): the second thermoplastic resin layer (A- 2) and step (M2) of thermally welding the second thermoplastic resin layer (B-2) of the laminate for bonding (B): molecular adhesive layer of the laminate obtained in step (M1) Step (M3) for bonding (AM) and adherend (I): molecular adhesive layer (BM) and adherend (II) of the laminate obtained in step (M2) Process process ( 1) An arrangement in which the second thermoplastic resin layer (A-2) of the laminate for bonding (A) and the second thermoplastic resin layer (B-2) of the laminate for bonding (B) face each other. , Adherend (I), bonding laminate (A), bonding laminate (B), and adherend (II) are stacked in this order (step (N2): obtained in step (N1) Are heated, the adhesion between the molecular adhesive layer (AM) and the adherend (I), the adhesion between the molecular adhesive layer (BM) and the adherend (II), the second A step of simultaneously performing thermal welding between the thermoplastic resin layer (A-2) and the second thermoplastic resin layer (B-2).

 接合用積層体(A)は、分子接着剤(M)を含む分子接着剤層(A-M)、第1の熱可塑性樹脂層(A-1)、及び第2の熱可塑性樹脂層(A-2)をこの順で有する接合用積層体である。
 本発明の接合方法において、接合用積層体(A)は、被着体(I)との接着に利用される。
The bonding laminate (A) includes a molecular adhesive layer (AM) containing a molecular adhesive (M A ), a first thermoplastic resin layer (A-1), and a second thermoplastic resin layer ( A laminated body for bonding having A-2) in this order.
In the bonding method of the present invention, the bonding laminate (A) is used for adhesion to the adherend (I).

 接合用積層体(B)は、分子接着剤(M)を含む分子接着剤層(B-M)、第1の熱可塑性樹脂層(B-1)、及び第2の熱可塑性樹脂層(B-2)をこの順で有する接合用積層体(B)である。
 本発明の接合方法において、接合用積層体(B)は、被着体(II)との接着に利用される。
The bonding laminate (B) includes a molecular adhesive layer (BM) containing a molecular adhesive (M B ), a first thermoplastic resin layer (B-1), and a second thermoplastic resin layer ( It is a laminated body (B) having B-2) in this order.
In the bonding method of the present invention, the bonding laminate (B) is used for adhesion to the adherend (II).

 接合用積層体(A)と接合用積層体(B)は同じものであってもよいし、異なるものであってもよい。 The laminated body for bonding (A) and the laminated body for bonding (B) may be the same or different.

 接合用積層体(A)の第2の熱可塑性樹脂層(A-2)が、第1の熱可塑性樹脂層(A-1)とは逆側の表面に熱可塑性樹脂(P)(以下において、第2の熱可塑性樹脂層(A-2)に含まれる熱可塑性樹脂(P)を、「熱可塑性樹脂(P2A)」と表すことがある。)を含むものであり、接合用積層体(B)の第2の熱可塑性樹脂層(B-2)が、第1の熱可塑性樹脂層(B-1)とは逆側の表面に熱可塑性樹脂(P)(以下において、第2の熱可塑性樹脂層(B-2)に含まれる熱可塑性樹脂(P)を、「熱可塑性樹脂(P2B)」と表すことがある。)を含むものである場合、熱可塑性樹脂(P2A)(第2の熱可塑性樹脂層(A-2)が2種以上の熱可塑性樹脂(P2A)を含むときは含有量が一番多いもの)と熱可塑性樹脂(P2B)(第2の熱可塑性樹脂層(B-2)が2種以上の熱可塑性樹脂(P2B)を含むときは含有量が一番多いもの)は同じものであることが好ましい。熱可塑性樹脂(P2A)と熱可塑性樹脂(P2B)が同じものであることで、2つの被着体をより強固に接合することができる。 The second thermoplastic resin layer (A-2) of the laminate for bonding (A) has a thermoplastic resin (P 2 ) (hereinafter referred to as “the first thermoplastic resin layer (A-1)” on the surface opposite to the first thermoplastic resin layer (A-1). 2), the thermoplastic resin (P 2 ) contained in the second thermoplastic resin layer (A-2) may be represented as “thermoplastic resin (P 2A )”. The second thermoplastic resin layer (B-2) of the laminate (B) has a thermoplastic resin (P 2 ) (in the following, on the surface opposite to the first thermoplastic resin layer (B-1)). When the thermoplastic resin (P 2 ) contained in the second thermoplastic resin layer (B-2) includes a “thermoplastic resin (P 2B )”), the thermoplastic resin (P 2A ) (when the second thermoplastic resin layer (A-2) contains two or more thermoplastic resins (P 2A ), the content is the highest) and The thermoplastic resin (P 2B ) (the one with the highest content when the second thermoplastic resin layer (B-2) contains two or more thermoplastic resins (P 2B )) must be the same Is preferred. Since the thermoplastic resin (P 2A ) and the thermoplastic resin (P 2B ) are the same, the two adherends can be bonded more firmly.

 熱可塑性樹脂(P2A)(第2の熱可塑性樹脂層(A-2)が2種以上の熱可塑性樹脂(P2A)を含むときは含有量が一番多いもの)と熱可塑性樹脂(P2B)(第2の熱可塑性樹脂層(B-2)が2種以上の熱可塑性樹脂(P2B)を含むときは含有量が一番多いもの)が異なる場合、これらの熱可塑性樹脂が結晶性樹脂のときは、これらの融点の差が小さいことが好ましい。融点が近い熱可塑性樹脂(P2A)と熱可塑性樹脂(P2B)を組み合わせて用いることで、熱溶着をより効率よく行うことができる。
 熱可塑性樹脂(P2A)の融点と熱可塑性樹脂(P2B)の融点の差は、好ましくは40℃以下、より好ましくは20℃以下であり、特に好ましくは0℃である。
Thermoplastic resin (P 2A ) (when the second thermoplastic resin layer (A-2) contains two or more kinds of thermoplastic resins (P 2A ), the content is the highest) and thermoplastic resin (P 2B ) (when the second thermoplastic resin layer (B-2) contains two or more thermoplastic resins (P 2B ), the content is the highest), these thermoplastic resins are crystalline. In the case of a functional resin, it is preferable that the difference between these melting points is small. By using a combination of a thermoplastic resin (P 2A ) and a thermoplastic resin (P 2B ) having close melting points, thermal welding can be performed more efficiently.
The difference between the melting point of the thermoplastic resin (P 2A ) and the melting point of the thermoplastic resin (P 2B ) is preferably 40 ° C. or less, more preferably 20 ° C. or less, and particularly preferably 0 ° C.

 熱可塑性樹脂(P2A)(第2の熱可塑性樹脂層(A-2)が2種以上の熱可塑性樹脂(P2A)を含むときは含有量が一番多いもの)と熱可塑性樹脂(P2B)(第2の熱可塑性樹脂層(B-2)が2種以上の熱可塑性樹脂(P2B)を含むときは含有量が一番多いもの)が異なる場合、これらのハンセン溶解度パラメータの相互作用距離Raが小さいことが好ましい。ハンセン溶解度パラメータの相互作用距離Raが近い熱可塑性樹脂(P2A)と熱可塑性樹脂(P2B)を組み合わせて用いることで、熱溶着をより効率よく行うことができる。
 熱可塑性樹脂(P2A)のと熱可塑性樹脂(P2B)のハンセン溶解度パラメータの相互作用距離Raは、好ましくは10以下、より好ましくは4.5以下である。
 本発明においてハンセン溶解度パラメータの相互作用距離Raは以下の式より導き出されるものである。
Thermoplastic resin (P 2A ) (when the second thermoplastic resin layer (A-2) contains two or more kinds of thermoplastic resins (P 2A ), the content is the highest) and thermoplastic resin (P 2B ) (if the second thermoplastic resin layer (B-2) contains two or more thermoplastic resins (P 2B ), the content is the highest), these Hansen solubility parameters It is preferable that the working distance Ra is small. By using a combination of a thermoplastic resin (P 2A ) and a thermoplastic resin (P 2B ) having a close interaction distance Ra of the Hansen solubility parameter, thermal welding can be performed more efficiently.
The interaction distance Ra between the Hansen solubility parameters of the thermoplastic resin (P 2A ) and the thermoplastic resin (P 2B ) is preferably 10 or less, more preferably 4.5 or less.
In the present invention, the interaction distance Ra of the Hansen solubility parameter is derived from the following equation.

Figure JPOXMLDOC01-appb-M000010
Figure JPOXMLDOC01-appb-M000010

 前記式中、δDは、熱可塑性樹脂(P2A)のハンセン溶解度パラメータの分散成分、δDは、熱可塑性樹脂(P2B)のハンセン溶解度パラメータの分散成分、δPは、熱可塑性樹脂(P2A)のハンセン溶解度パラメータの極性成分、δPは、熱可塑性樹脂(P2B)のハンセン溶解度パラメータの極性成分、δHは、熱可塑性樹脂(P2A)のハンセン溶解度パラメータの水素結合成分、δHは、熱可塑性樹脂(P2B)のハンセン溶解度パラメータの水素結合成分を表す。 In the above formula, δD A is a dispersive component of the Hansen solubility parameter of the thermoplastic resin (P 2A ), δD B is a dispersive component of the Hansen solubility parameter of the thermoplastic resin (P 2B ), and δP A is a thermoplastic resin ( The polar component of the Hansen solubility parameter of P 2A ), δP B is the polar component of the Hansen solubility parameter of the thermoplastic resin (P 2B ), δH A is the hydrogen bonding component of the Hansen solubility parameter of the thermoplastic resin (P 2A ), δH B represents a hydrogen bonding component of the Hansen solubility parameter of the thermoplastic resin (P 2B ).

 本発明の接合方法においては、接合用積層体(A)の分子接着剤層(A-M)は、被着体(I)との接着に利用され、接合用積層体(B)の分子接着剤層(B-M)は、被着体(II)との接着に利用される。 In the bonding method of the present invention, the molecular adhesive layer (AM) of the bonding laminate (A) is used for bonding to the adherend (I), and the molecular bonding of the bonding laminate (B). The agent layer (BM) is used for adhesion to the adherend (II).

 分子接着剤層(A-M)と被着体(I)との間の接着や、分子接着剤層(B-M)と被着体(II)との間の接着は、通常、分子接着剤(M)又は(M)中の反応性基(Zβ)が、被着体(I)又は被着体(II)を構成する化合物中の官能基と反応し、化学結合が形成することにより行われる。
 したがって、通常、被着体(I)又は被着体(II)としては、反応性基(Zβ)との反応性を有する基をその表面に有するものが用いられる。
The adhesion between the molecular adhesive layer (AM) and the adherend (I) and the adhesion between the molecular adhesive layer (BM) and the adherend (II) are usually molecular adhesion. The reactive group (Zβ) in the agent (M A ) or (M B ) reacts with the functional group in the compound constituting the adherend (I) or the adherend (II) to form a chemical bond. Is done.
Therefore, usually, as the adherend (I) or the adherend (II), one having a group having reactivity with the reactive group (Zβ) on its surface is used.

 そのような被着体としては、表面に金属を含む部材、表面に無機物を含む部材、表面にシリコーン樹脂を含む部材等が挙げられる。
 金属としては、アルミニウム、クロム、マンガン、鉄、コバルト、ニッケル、銅、亜鉛、銀、金等が挙げられる。
 無機物としては、ガラス、無機酸化物(ガラスを除く)等が挙げられる。
 これらの部材に対しては表面処理を施してもよい。表面処理により、ヒドロキシ基やカルボキシ基等が生じた部材は、被着体としてより好適に用いられる。
 また、表面処理技術を利用することで、表面に熱可塑性樹脂や熱硬化性樹脂を含む部材も被着体として利用することができる。
 表面処理としては、コロナ処理、プラズマ処理、紫外線照射処理、電子線照射処理、オゾン処理、エキシマ紫外線処理、酸処理、及び塩基処理等が挙げられる。これらの表面処理は、公知の方法に従って行うことができる。
 また被着体の表面に、必要に応じてプライマー層を設けてもよい。
Examples of such an adherend include a member containing a metal on the surface, a member containing an inorganic substance on the surface, and a member containing a silicone resin on the surface.
Examples of the metal include aluminum, chromium, manganese, iron, cobalt, nickel, copper, zinc, silver, and gold.
Examples of inorganic substances include glass and inorganic oxides (excluding glass).
These members may be subjected to surface treatment. A member in which a hydroxy group, a carboxy group or the like is generated by the surface treatment is more preferably used as an adherend.
Moreover, the member which contains a thermoplastic resin and a thermosetting resin on the surface can also be utilized as a to-be-adhered body by utilizing a surface treatment technique.
Examples of the surface treatment include corona treatment, plasma treatment, ultraviolet irradiation treatment, electron beam irradiation treatment, ozone treatment, excimer ultraviolet treatment, acid treatment, and base treatment. These surface treatments can be performed according to known methods.
A primer layer may be provided on the surface of the adherend as necessary.

〔工程(L1)~(L3)を含む工程群〕
 工程(L1)~(L3)を含む工程群の各工程を図2に示す。
 工程(L1)においては、分子接着剤層(A-M)(8)、第1の熱可塑性樹脂層(A-1)(9)、及び第2の熱可塑性樹脂層(A-2)(10)を有する接合用積層体(A)(11)の分子接着剤層(A-M)(8)と、被着体(I)(12)とを接着し、積層体(13)を得る〔図2(a)〕。
[Process group including processes (L1) to (L3)]
FIG. 2 shows each step of the step group including steps (L1) to (L3).
In the step (L1), the molecular adhesive layer (AM) (8), the first thermoplastic resin layer (A-1) (9), and the second thermoplastic resin layer (A-2) ( 10) Adhering the molecular adhesive layer (AM) (8) of the laminate (A) (11) for bonding and the adherend (I) (12) to obtain the laminate (13) [FIG. 2 (a)].

 工程(L1)は、例えば、加熱プレス機、オートクレーブ装置、真空貼合機、三次元真空加熱成形機(TOM成形機)、加熱ラミネート装置等を用いて行うことができる。 Process (L1) can be performed using, for example, a heating press machine, an autoclave apparatus, a vacuum bonding machine, a three-dimensional vacuum heating molding machine (TOM molding machine), a heating laminating apparatus, or the like.

 工程(L1)において線圧をかける場合、その圧力は、通常0.1~5N/mm、好ましくは0.2~3N/mm、より好ましくは0.3~1N/mmである。
 工程(L1)において面圧をかける場合、その圧力は、通常0.1~10MPa、好ましくは0.2~5MPa、より好ましくは0.3~3MPa、さらに好ましくは0.4~1MPaである。
When a linear pressure is applied in the step (L1), the pressure is usually 0.1 to 5 N / mm, preferably 0.2 to 3 N / mm, more preferably 0.3 to 1 N / mm.
When the surface pressure is applied in the step (L1), the pressure is usually 0.1 to 10 MPa, preferably 0.2 to 5 MPa, more preferably 0.3 to 3 MPa, and further preferably 0.4 to 1 MPa.

 工程(L1)における接着温度は、通常40~200℃、好ましくは50~170℃、より好ましくは60~140℃である。
 工程(L1)の処理時間は、通常1秒から1時間、好ましくは5秒から30分、より好ましくは10秒から10分である。
The adhesion temperature in the step (L1) is usually 40 to 200 ° C., preferably 50 to 170 ° C., more preferably 60 to 140 ° C.
The treatment time in the step (L1) is usually 1 second to 1 hour, preferably 5 seconds to 30 minutes, more preferably 10 seconds to 10 minutes.

 工程(L2)においては、分子接着剤層(B-M)(14)、第1の熱可塑性樹脂層(B-1)(15)、及び第2の熱可塑性樹脂層(B-2)(16)を有する接合用積層体(B)(17)の分子接着剤層(B-M)(14)と、被着体(II)(18)とを接着し、積層体(19)を得る〔図2(b)〕。
 工程(L2)は、工程(L1)と同様の方法、同様の条件により行うことができる。
In the step (L2), the molecular adhesive layer (BM) (14), the first thermoplastic resin layer (B-1) (15), and the second thermoplastic resin layer (B-2) ( 16) Adhering the molecular adhesive layer (BM) (14) and the adherend (II) (18) of the bonding laminate (B) (17) having the laminate 16) to obtain the laminate (19) [FIG. 2 (b)].
Step (L2) can be performed according to a method and conditions similar to those of step (L1).

 工程(L3)においては、工程(L1)で得られた積層体(13)の第2の熱可塑性樹脂層(A-2)(10)と、工程(L2)で得られた積層体(19)の第2の熱可塑性樹脂層(B-2)(16)とを熱溶着し、接合構造体(20)を得る〔図2(c)〕。 In the step (L3), the second thermoplastic resin layer (A-2) (10) of the laminate (13) obtained in the step (L1) and the laminate (19) obtained in the step (L2) are used. ) And the second thermoplastic resin layer (B-2) (16) are thermally welded to obtain a bonded structure (20) [FIG. 2 (c)].

 工程(L3)は、例えば、加熱プレス機、オートクレーブ装置、真空貼合機、三次元真空加熱成形機(TOM成形機)、加熱ラミネート装置等を用いて行うことができる。
 工程(L3)において線圧をかける場合、その圧力は、通常0.1~5N/mm、好ましくは0.2~3N/mm、より好ましくは0.3~1N/mmである。
 工程(L3)において面圧をかける場合、その圧力は、通常0.05~10MPa、好ましくは0.1~5MPa、より好ましくは0.2~3MPaである。
The step (L3) can be performed using, for example, a heating press machine, an autoclave apparatus, a vacuum bonding machine, a three-dimensional vacuum heating molding machine (TOM molding machine), a heating laminating apparatus, or the like.
When a linear pressure is applied in the step (L3), the pressure is usually 0.1 to 5 N / mm, preferably 0.2 to 3 N / mm, more preferably 0.3 to 1 N / mm.
When the surface pressure is applied in the step (L3), the pressure is usually 0.05 to 10 MPa, preferably 0.1 to 5 MPa, more preferably 0.2 to 3 MPa.

 工程(L3)における熱溶着温度は、通常50~230℃、好ましくは60~200℃、より好ましくは80~170℃である。
 工程(L3)の処理時間は、通常1秒から1分、好ましくは3~30秒である。
The heat welding temperature in the step (L3) is usually 50 to 230 ° C., preferably 60 to 200 ° C., more preferably 80 to 170 ° C.
The treatment time in the step (L3) is usually 1 second to 1 minute, preferably 3 to 30 seconds.

 工程(L1)~(L3)を含む工程群を行う場合、工程(L1)において、接合用積層体(A)の分子接着剤層(A-M)と被着体(I)とを接着する際の温度がTL1、工程(L2)において、接合用積層体(B)の分子接着剤層(B-M)と被着体(II)とを接着する際の温度がTL2、工程(L3)において、第2の熱可塑性樹脂層(A-2)と第2の熱可塑性樹脂層(B-2)とを熱溶着する際の温度がTL3であり、接合用積層体(A)の第1の熱可塑性樹脂層(A-1)のヒートシール可能温度がTh1A、第2の熱可塑性樹脂層(A-2)のヒートシール可能温度がTh2Aであり、接合用積層体(B)の第1の熱可塑性樹脂層(B-1)のヒートシール可能温度がTh1B、第2の熱可塑性樹脂層(B-2)のヒートシール可能温度がTh2Bであるときに、下記式(E-1)と式(E-2)のいずれも満たし、かつ、下記式(E-3)と式(E-4)の少なくとも一方を満たすことが好ましい。 When performing the process group including the processes (L1) to (L3), the molecular adhesive layer (AM) of the bonding laminate (A) and the adherend (I) are bonded in the process (L1). temperature T L1 of time, in step (L2), the temperature T L2 when the molecular adhesive layer (B-M) for adhering the adherend (II) of the bonded laminate for (B), step ( L3), the temperature at which the second thermoplastic resin layer (A-2) and the second thermoplastic resin layer (B-2) are thermally welded is T L3 , and the joining laminate (A) The heat-sealable temperature of the first thermoplastic resin layer (A-1) is T h1A , and the heat-sealable temperature of the second thermoplastic resin layer (A-2) is Th2A. The heat-sealable temperature of the first thermoplastic resin layer (B-1) of B) is Th1B , and the heat of the second thermoplastic resin layer (B-2) is When the tossable temperature is Th 2B , both of the following formulas (E-1) and (E-2) are satisfied, and at least one of the following formulas (E-3) and (E-4) is satisfied It is preferable to satisfy.

Figure JPOXMLDOC01-appb-M000011
Figure JPOXMLDOC01-appb-M000011

 式(E-1)を満たすことで、工程(L1)における、接合用積層体(A)の第1の熱可塑性樹脂層(A-1)の変形が抑制される。
 式(E-2)を満たすことで、工程(L2)における、接合用積層体(B)の第1の熱可塑性樹脂層(B-1)の変形が抑制される。
By satisfying the formula (E-1), deformation of the first thermoplastic resin layer (A-1) of the laminate for bonding (A) in the step (L1) is suppressed.
By satisfying the formula (E-2), the deformation of the first thermoplastic resin layer (B-1) of the bonding laminate (B) in the step (L2) is suppressed.

 式(E-3)と式(E-4)の少なくとも一方を満たすことで、接合用積層体(A)の第2の熱可塑性樹脂層(A-2)と接合用積層体(B)の第2の熱可塑性樹脂層(B-2)とを効率よく熱溶着することができる。
 接合用積層体(A)の第2の熱可塑性樹脂層(A-2)と接合用積層体(B)の第2の熱可塑性樹脂層(B-2)とをより効率よく熱溶着することができることから、式(E-3)と式(E-4)のいずれも満たすことがより好ましい。
By satisfying at least one of formula (E-3) and formula (E-4), the second thermoplastic resin layer (A-2) of the joining laminate (A) and the joining laminate (B) The second thermoplastic resin layer (B-2) can be efficiently heat-welded.
More efficiently heat-welding the second thermoplastic resin layer (A-2) of the bonding laminate (A) and the second thermoplastic resin layer (B-2) of the bonding laminate (B). Therefore, it is more preferable that both the formula (E-3) and the formula (E-4) are satisfied.

〔工程(M1)~(M3)を含む工程群〕
 工程(M1)~(M3)を含む工程群の各工程を図3に示す。
 工程(M1)においては、分子接着剤層(A-M)(21)、第1の熱可塑性樹脂層(A-1)(22)、及び第2の熱可塑性樹脂層(A-2)(23)を有する接合用積層体(A)(24)の第2の熱可塑性樹脂層(A-2)(23)と、分子接着剤層(B-M)(25)、第1の熱可塑性樹脂層(B-1)(26)、及び第2の熱可塑性樹脂層(B-2)(27)を有する接合用積層体(B)(28)の第2の熱可塑性樹脂層(B-2)(27)とを熱溶着し、積層体(29)を得る〔図3(a)〕。
 工程(M1)は、工程(L3)と同様の方法、同様の条件により行うことができる。
[Process group including processes (M1) to (M3)]
FIG. 3 shows each step in the step group including steps (M1) to (M3).
In the step (M1), the molecular adhesive layer (AM) (21), the first thermoplastic resin layer (A-1) (22), and the second thermoplastic resin layer (A-2) ( 23) the second thermoplastic resin layer (A-2) (23) of the laminate (A) (24) for bonding, the molecular adhesive layer (BM) (25), the first thermoplastic layer The second thermoplastic resin layer (B-) of the laminate for bonding (B) (28) having the resin layer (B-1) (26) and the second thermoplastic resin layer (B-2) (27). 2) (27) is thermally welded to obtain a laminate (29) [FIG. 3 (a)].
Step (M1) can be performed according to a method and conditions similar to those of step (L3).

 工程(M2)においては、工程(M1)で得られた積層体(29)の分子接着剤層(A-M)(21)と被着体(I)(30)とを接着し、積層体(31)を得る〔図3(b)〕。
 工程(M3)においては、工程(M2)で得られた積層体(31)の分子接着剤層(B-M)(25)と被着体(II)(32)とを接着し、接合構造体(33)を得る〔図3(c)〕。
In the step (M2), the molecular adhesive layer (AM) (21) and the adherend (I) (30) of the laminate (29) obtained in the step (M1) are adhered, and the laminate (31) is obtained [FIG. 3 (b)].
In the step (M3), the molecular adhesive layer (BM) (25) and the adherend (II) (32) of the laminate (31) obtained in the step (M2) are bonded to each other to form a bonded structure. A body (33) is obtained [FIG. 3 (c)].

 工程(M2)、工程(M3)は、それぞれ、工程(L1)と同様の方法、同様の条件により行うことができる。
 なお、工程(M2)と工程(M3)は同時に行ってもよい。例えば、被着体(I)と工程(M1)で得られた積層体と被着体(II)とをこの順で重ね、このものに対して圧着処理を行うことにより、工程(M2)と工程(M3)を同時に行うことができる。
Step (M2) and step (M3) can be performed in the same manner and under the same conditions as in step (L1), respectively.
In addition, you may perform a process (M2) and a process (M3) simultaneously. For example, by stacking the adherend (I), the laminate obtained in the step (M1) and the adherend (II) in this order, and performing a pressure-bonding treatment on this, the step (M2) and The step (M3) can be performed simultaneously.

〔工程(N1)、(N2)を含む工程群〕
 工程(N1)、(N2)を含む工程群の各工程を図4に示す。
 工程(N1)においては、分子接着剤層(A-M)(34)、第1の熱可塑性樹脂層(A-1)(35)、及び第2の熱可塑性樹脂層(A-2)(36)を有する接合用積層体(A)(37)の第2の熱可塑性樹脂層(A-2)(36)と、分子接着剤層(B-M)(38)、第1の熱可塑性樹脂層(B-1)(39)、及び第2の熱可塑性樹脂層(B-2)(40)を有する接合用積層体(B)(41)の第2の熱可塑性樹脂層(B-2)(40)が対向する配置で、被着体(I)(42)、接合用積層体(A)(35)、接合用積層体(B)(41)、被着体(II)(43)を、この順に重ねる〔図4(a)〕。
[Process group including processes (N1) and (N2)]
Each process of the process group containing process (N1) and (N2) is shown in FIG.
In the step (N1), the molecular adhesive layer (AM) (34), the first thermoplastic resin layer (A-1) (35), and the second thermoplastic resin layer (A-2) ( 36) the second thermoplastic resin layer (A-2) (36) of the bonding laminate (A) (37), the molecular adhesive layer (BM) (38), the first thermoplasticity The second thermoplastic resin layer (B--) of the laminate (B) (41) having the resin layer (B-1) (39) and the second thermoplastic resin layer (B-2) (40). 2) In an arrangement in which (40) face each other, the adherend (I) (42), the bonding laminate (A) (35), the bonding laminate (B) (41), the adherend (II) ( 43) are overlapped in this order [FIG. 4 (a)].

 工程(N2)においては、工程(N1)で得られたもの(44)を加熱して、分子接着剤層(A-M)と被着体(I)との接着と、分子接着剤層(B-M)と被着体(II)との接着と、第2の熱可塑性樹脂層(A-2)と第2の熱可塑性樹脂層(B-2)との熱溶着を同時に行い、接合構造体(45)を得る〔図4(b)〕。 In the step (N2), the product (44) obtained in the step (N1) is heated to bond the molecular adhesive layer (AM) and the adherend (I), and the molecular adhesive layer ( BM) and adherend (II) are bonded together, and the second thermoplastic resin layer (A-2) and second thermoplastic resin layer (B-2) are simultaneously welded together. A structure (45) is obtained [FIG. 4 (b)].

 工程(N2)は、例えば、加熱プレス機、オートクレーブ装置、真空貼合機、三次元真空加熱成形機(TOM成形機)、加熱ラミネート装置等を用いて行うことができる。 Step (N2) can be performed using, for example, a heating press machine, an autoclave apparatus, a vacuum bonding machine, a three-dimensional vacuum heating molding machine (TOM molding machine), a heating laminating apparatus, or the like.

 工程(N2)において線圧をかける場合、その圧力は、通常0.1~5N/mm、好ましくは0.2~3N/mm、より好ましくは0.3~1N/mmである。
 工程(N2)において面圧をかける場合、その圧力は、通常0.1~10MPa、好ましくは0.2~5MPa、より好ましくは0.3~3MPa、さらに好ましくは0.4~1MPaである。
When a linear pressure is applied in the step (N2), the pressure is usually 0.1 to 5 N / mm, preferably 0.2 to 3 N / mm, more preferably 0.3 to 1 N / mm.
When the surface pressure is applied in the step (N2), the pressure is usually 0.1 to 10 MPa, preferably 0.2 to 5 MPa, more preferably 0.3 to 3 MPa, and further preferably 0.4 to 1 MPa.

 工程(N2)における熱溶着温度は、通常50~230℃、好ましくは60~200℃、より好ましくは80~170℃である。
 工程(N2)の処理時間は、通常1秒から1時間、好ましくは5秒から30分、より好ましくは10秒から10分である。
The heat welding temperature in the step (N2) is usually 50 to 230 ° C., preferably 60 to 200 ° C., more preferably 80 to 170 ° C.
The treatment time in the step (N2) is usually 1 second to 1 hour, preferably 5 seconds to 30 minutes, more preferably 10 seconds to 10 minutes.

 工程(N1)、(N2)を含む工程群を行う場合、接合用積層体(A)の第1の熱可塑性樹脂層(A-1)のヒートシール可能温度がTh1A、第2の熱可塑性樹脂層(A-2)のヒートシール可能温度がTh2Aであり、接合用積層体(B)の第1の熱可塑性樹脂層(B-1)のヒートシール可能温度がTh1B、第2の熱可塑性樹脂層(B-2)のヒートシール可能温度がTh2Bであり、工程(N2)において、熱溶着する際の温度がTN2であるときに、下記式(E-5)と式(E-6)の少なくとも一方を満たすことが好ましい。 When the process group including the processes (N1) and (N2) is performed, the heat-sealable temperature of the first thermoplastic resin layer (A-1) of the bonding laminate (A) is Th1A , the second thermoplasticity. The heat-sealable temperature of the resin layer (A-2) is Th2A , and the heat-sealable temperature of the first thermoplastic resin layer (B-1) of the bonding laminate (B) is Th1B , second heat-sealable temperature of the thermoplastic resin layer (B-2) is a T H2B, in step (N2), when the temperature at the time of heat welding is T N2, the following equation (E-5) formula ( It is preferable to satisfy at least one of E-6).

Figure JPOXMLDOC01-appb-M000012
Figure JPOXMLDOC01-appb-M000012

 式(E-5)と式(E-6)の少なくとも一方を満たすことで、接合用積層体(A)の第2の熱可塑性樹脂層(A-2)と接合用積層体(B)の第2の熱可塑性樹脂層(B-2)とを効率よく熱溶着することができる。
 接合用積層体(A)の第2の熱可塑性樹脂層(A-2)と接合用積層体(B)の第2の熱可塑性樹脂層(B-2)とをより効率よく熱溶着することができることから、式(E-5)と式(E-6)のいずれも満たすことがより好ましい。
By satisfying at least one of the formula (E-5) and the formula (E-6), the second thermoplastic resin layer (A-2) of the bonding laminate (A) and the bonding laminate (B) The second thermoplastic resin layer (B-2) can be efficiently heat-welded.
More efficiently heat-welding the second thermoplastic resin layer (A-2) of the bonding laminate (A) and the second thermoplastic resin layer (B-2) of the bonding laminate (B). Therefore, it is more preferable that both the formula (E-5) and the formula (E-6) are satisfied.

 被着体(I)と被着体(II)とを接合する際は、前記工程(L1)~(L3)を含む工程群、又は、前記工程(N1)、(N2)を含む工程群を行うことが好ましい。
 前記工程(L1)~(L3)を含む工程群においては、熱溶着処理を行う前に、分子接着剤層と被着体との接着処理が行われる。したがって、分子接着剤層と被着体との接着処理を、熱溶着処理に伴う熱可塑性樹脂層の熱変形が生じていない状態で行うことができるため、分子接着剤層と被着体とをより強固に接着することができる。
When bonding the adherend (I) and the adherend (II), a process group including the steps (L1) to (L3) or a process group including the steps (N1) and (N2) is included. Preferably it is done.
In the process group including the processes (L1) to (L3), the adhesion process between the molecular adhesive layer and the adherend is performed before the heat welding process. Therefore, since the adhesion treatment between the molecular adhesive layer and the adherend can be performed in a state where the thermoplastic resin layer is not thermally deformed due to the thermal welding treatment, the molecular adhesive layer and the adherend are It is possible to bond more firmly.

 前記工程(N1)、(N2)を含む工程群においては、分子接着剤層と被着体との接着処理と熱可塑性樹脂層同士の熱溶着処理が同時に行われる。したがって、2つの被着体をより効率よく接合することができる。 In the process group including the processes (N1) and (N2), the adhesion process between the molecular adhesive layer and the adherend and the thermal welding process between the thermoplastic resin layers are performed simultaneously. Therefore, two adherends can be joined more efficiently.

3)接合構造体の製造方法
 本発明の接合構造体の製造方法は、被着体(I)/接合用積層体(A)と接合用積層体(B)由来の層/被着体(II)、の層構造を有する接合構造体の製造方法であって、本発明の接合方法を使用して、被着体(I)と被着体(II)を接合することを特徴とする。
3) Method for Producing Bonded Structure The method for producing a bonded structure according to the present invention comprises an adherend (I) / laminate for joining (A) and a layer / adherent (II) derived from the laminate for joining (B). ), A bonded structure having a layer structure, wherein the adherend (I) and the adherend (II) are bonded using the bonding method of the present invention.

 本発明の製造方法によれば、被着体(I)と被着体(II)が、接合用積層体を介して強固に接合されてなる接合構造体が得られる。 According to the production method of the present invention, it is possible to obtain a bonded structure in which the adherend (I) and the adherend (II) are firmly bonded via the bonding laminate.

 被着体(I)と被着体(II)としては、2つの被着体を接合する方法の発明の中で示したものを用いることができる。
 これらの中でも、被着体(I)及び被着体(II)としては、それぞれ独立して、金属、無機物、及び熱硬化性樹脂からなる群から選ばれる少なくとも1種を、少なくとも被接着面に含むものが好ましい。
As the adherend (I) and the adherend (II), those shown in the invention of the method for joining two adherends can be used.
Among these, the adherend (I) and the adherend (II) are each independently at least one selected from the group consisting of metals, inorganic substances, and thermosetting resins on at least the adherend surface. The inclusion is preferred.

 被着体が熱可塑性樹脂で形成された被接着面を有するものである場合、本発明の接合用積層体を使用しなくても、被着体同士を直接熱溶着して接合することができることがある。
 一方、被着体の被接着面に、金属、無機物、又は熱硬化性樹脂が存在する場合、この方法によりこれらの被着体を強固に接合することは困難である。
When the adherends have an adherend surface formed of a thermoplastic resin, the adherends can be directly heat welded and joined without using the bonding laminate of the present invention. There is.
On the other hand, when a metal, an inorganic substance, or a thermosetting resin exists on the adherend surface of the adherend, it is difficult to firmly bond the adherends by this method.

 本発明の接合構造体の製造方法は、本発明の接合用積層体を用いるものである。したがって、本発明の接合構造体の製造方法によれば、被着体の被接着面に、金属、無機物、又は熱硬化性樹脂が存在する場合であっても、これらの被着体が強固に接合されてなる接合構造体を得ることができる。 The method for manufacturing a bonded structure according to the present invention uses the bonded laminate according to the present invention. Therefore, according to the method for manufacturing a bonded structure of the present invention, even when a metal, an inorganic substance, or a thermosetting resin is present on the adherend surface of the adherend, these adherends are firmly formed. A bonded structure obtained by bonding can be obtained.

 以下、実施例を挙げて本発明を更に詳細に説明する。但し、本発明は、以下の実施例になんら限定されるものではない。
 各例中の部及び%は、特に断りのない限り、質量基準である。
Hereinafter, the present invention will be described in more detail with reference to examples. However, the present invention is not limited to the following examples.
Unless otherwise indicated, the part and% in each example are based on mass.

〔多層フィルムの各層のヒートシール可能温度の測定〕
 多層フィルム(1)~(5)の各層のヒートシール可能温度は、以下の方法により求めた。
 多層フィルム(25mm×150mm)を2枚用意し、同じ成分の層が対向するようにこれらを重ね、0.2MPaで1秒の条件でこれらを熱溶着して試験片を得た。このとき、熱溶着温度を5℃間隔(例えば、140℃、145℃、150℃)で変え、複数の試験片を得た。
 得られた試験片のそれぞれについて23℃、湿度50%(相対湿度)の環境下で、引張試験機(株式会社エー・アンド・デイ製、製品名「テンシロン万能材料試験機」)を用いて300mm/分の条件でT型剥離試験を行い、それぞれの接着強度を測定した。
 接着強度が5N/25mm以上の試験片の中で、熱溶着温度が一番低い試験片の熱溶着温度を「ヒートシール可能温度」とした。
[Measurement of heat sealable temperature of each layer of multilayer film]
The heat sealable temperature of each layer of the multilayer films (1) to (5) was determined by the following method.
Two multilayer films (25 mm × 150 mm) were prepared, they were stacked so that the layers of the same component face each other, and these were thermally welded at 0.2 MPa for 1 second to obtain test pieces. At this time, the heat welding temperature was changed at intervals of 5 ° C. (for example, 140 ° C., 145 ° C., 150 ° C.) to obtain a plurality of test pieces.
Each of the obtained test pieces was 300 mm using a tensile testing machine (manufactured by A & D Co., Ltd., product name “Tensilon Universal Material Testing Machine”) in an environment of 23 ° C. and 50% humidity (relative humidity). A T-type peel test was performed under the conditions of / min and the respective adhesive strengths were measured.
Among the test pieces having an adhesive strength of 5 N / 25 mm or more, the heat welding temperature of the test piece having the lowest heat welding temperature was defined as “heat sealable temperature”.

〔製造例1〕
 2種類のポリプロピレンを成形材料として用いて、共押出し法により、「第1の熱可塑性樹脂層〔ポリプロピレン(PP)厚さ60μm〕/第2の熱可塑性樹脂層〔ポリプロピレン(PP)厚さ50μm〕」の層構造の多層フィルム(1)を得た。得られた多層フィルム(1)について、それぞれの層のヒートシール可能温度を測定したところ、第1の熱可塑性樹脂層のヒートシール可能温度は170℃、第2の熱可塑性樹脂層のヒートシール可能温度は145℃であった。
[Production Example 1]
Using two types of polypropylene as molding materials, a co-extrusion method was used to obtain “first thermoplastic resin layer [polypropylene (PP) thickness 60 μm] / second thermoplastic resin layer [polypropylene (PP) thickness 50 μm]”. A multilayer film (1) having a layer structure of When the heat-sealable temperature of each layer was measured for the obtained multilayer film (1), the heat-sealable temperature of the first thermoplastic resin layer was 170 ° C., and the heat-sealable of the second thermoplastic resin layer was possible. The temperature was 145 ° C.

〔製造例2、5〕
 第1表に記載の成形材料を使用したこと以外は、製造例1と同様にして多層フィルム(2)、(5)を得た。
[Production Examples 2 and 5]
Multilayer films (2) and (5) were obtained in the same manner as in Production Example 1 except that the molding materials listed in Table 1 were used.

〔製造例3〕
 2種類のポリエチレンと、ナイロンを成形材料として用いて、共押出法により、「第1の熱可塑性樹脂層〔ポリエチレン(PE)厚さ25μm〕/第2の熱可塑性樹脂層〔ナイロン(Ny)厚さ30μm/ポリエチレン(PE)厚さ25μm〕」の層構造の多層フィルム(3)を得た。得られた多層フィルム(3)について、それぞれの層のヒートシール可能温度を測定したところ、第1の熱可塑性樹脂層のヒートシール可能温度は140℃、第2の熱可塑性樹脂層(ポリエチレン層)のヒートシール可能温度は100℃であった。
[Production Example 3]
Using two types of polyethylene and nylon as a molding material, a “first thermoplastic resin layer [polyethylene (PE) thickness 25 μm] / second thermoplastic resin layer [nylon (Ny) thickness] A multilayer film (3) having a layer structure of “30 μm / polyethylene (PE) thickness 25 μm]” was obtained. About the obtained multilayer film (3), when the heat-sealable temperature of each layer was measured, the heat-sealable temperature of the first thermoplastic resin layer was 140 ° C., and the second thermoplastic resin layer (polyethylene layer) The heat sealable temperature of was 100 ° C.

〔製造例4〕
 ポリエステル系接着剤を用いて、ポリエチレンフィルムとエチレン・酢酸ビニル共重合樹脂フィルムとをドライラミネートし、「第1の熱可塑性樹脂層〔ポリエチレン(PE)厚さ100μm〕/第2の熱可塑性樹脂層〔エチレン・酢酸ビニル共重合樹脂(EVA)厚さ50μm〕」の層構造の多層フィルム(4)を得た。得られた多層フィルム(4)について、それぞれの層のヒートシール可能温度を測定したところ、第1の熱可塑性樹脂層のヒートシール可能温度は140℃、第2の熱可塑性樹脂層のヒートシール可能温度は110℃であった。
[Production Example 4]
Using a polyester-based adhesive, a polyethylene film and an ethylene / vinyl acetate copolymer resin film are dry-laminated, and “first thermoplastic resin layer [polyethylene (PE) thickness 100 μm] / second thermoplastic resin layer” is obtained. A multilayer film (4) having a layer structure of [ethylene / vinyl acetate copolymer resin (EVA) thickness 50 μm] was obtained. Regarding the obtained multilayer film (4), when the heat-sealable temperature of each layer was measured, the heat-sealable temperature of the first thermoplastic resin layer was 140 ° C., and the heat-sealable of the second thermoplastic resin layer was possible. The temperature was 110 ° C.

 多層フィルム(1)~(5)の詳細を第1表に示す。
 なお、第1表中、樹脂成分名は以下のように略記した。
ポリプロピレン:PP
ポリエチレン:PE
ナイロン:Ny
エチレン-酢酸ビニル共重合樹脂:EVA
Details of the multilayer films (1) to (5) are shown in Table 1.
In Table 1, resin component names are abbreviated as follows.
Polypropylene: PP
Polyethylene: PE
Nylon: Ny
Ethylene-vinyl acetate copolymer resin: EVA

Figure JPOXMLDOC01-appb-T000013
Figure JPOXMLDOC01-appb-T000013

〔製造例6〕
 WO2012/046651号に記載の方法に従って、6-(3-トリエトキシシリルプロピル)アミノ-1,3,5-トリアジン-2,4-ジアジド(前記式(10)で示される化合物、第2表中、「PTES」と記載する。)を含有する分子接着剤溶液(溶媒:エタノール、濃度0.1g/L)を得た。
[Production Example 6]
According to the method described in WO2012 / 046651, 6- (3-triethoxysilylpropyl) amino-1,3,5-triazine-2,4-diazide (compound represented by the above formula (10), in Table 2) And a molecular adhesive solution (solvent: ethanol, concentration 0.1 g / L).

〔製造実施例1〕
 以下の方法により、多層フィルム(1)を用いて接合用積層体(1)を製造した。
 多層フィルム(1)の第1の熱可塑性樹脂層に対して、コロナ処理機(信光電気計測株式会社製、製品名「コロナ・スキャナー ASA-4」、出力電圧;9kV(表面電圧)、発振周波数:20kHz)にてコロナ照射を行った。次いで、コロナ照射を行った面に、製造例6で得られた分子接着剤溶液をマイヤーバー(12番)で塗布し、得られた塗膜を80℃で60秒乾燥させた。
 次いで、紫外線照射装置(ヘレウス株式会社製、製品名「ライトハンマー 10 MARK II」、光源:水銀ランプ)を用いて、この塗膜に紫外線を照射することにより固定処理を行い、分子接着剤層と、第1の熱可塑性樹脂層及び第2の熱可塑性樹脂層(多層フィルム(1))からなる接合用積層体(1)を得た。
 なお、紫外線照射条件は、照度84mW/cm、光量29mJ/cmとし、当該照度及び光量は照度・光量計(EIT社製、製品名「UV Power Puck II」)を用いてUVCの領域の照度および光量を測定した。
[Production Example 1]
A laminate for bonding (1) was produced using the multilayer film (1) by the following method.
Corona treatment machine (manufactured by Shinko Electric Measurement Co., Ltd., product name “Corona Scanner ASA-4”, output voltage: 9 kV (surface voltage), oscillation frequency for the first thermoplastic resin layer of the multilayer film (1) : 20 kHz). Next, the surface of the surface subjected to corona irradiation was coated with the molecular adhesive solution obtained in Production Example 6 with a Meyer bar (No. 12), and the obtained coating film was dried at 80 ° C. for 60 seconds.
Next, using a UV irradiation device (product name “LIGHT HAMMER 10 MARK II” manufactured by Heraeus Co., Ltd., light source: mercury lamp), this coating film is irradiated with UV light to perform fixing treatment, and the molecular adhesive layer and A laminate (1) for bonding composed of the first thermoplastic resin layer and the second thermoplastic resin layer (multilayer film (1)) was obtained.
The ultraviolet irradiation conditions are an illuminance of 84 mW / cm 2 and an amount of light of 29 mJ / cm 2 , and the illuminance and the amount of light are measured in the UVC region using an illuminance / light meter (product name “UV Power Pack II” manufactured by EIT). Illuminance and light intensity were measured.

〔製造実施例2~4、製造比較例1〕
 製造実施例1において、多層フィルム(1)に代えて、それぞれ、第2表に記載の多層フィルム(2)~(5)を使用したこと以外は、製造実施例1と同様にして、接合用積層体(2)~(5)を得た。
[Production Examples 2 to 4, Production Comparative Example 1]
In Production Example 1, for the joining, in the same manner as Production Example 1, except that the multilayer films (2) to (5) shown in Table 2 were used instead of the multilayer film (1). Laminated bodies (2) to (5) were obtained.

 製造実施例1~4、製造比較例1で得た接合用積層体(1)~(5)の詳細を第2表に示す。 Details of the laminates for bonding (1) to (5) obtained in Production Examples 1 to 4 and Production Comparative Example 1 are shown in Table 2.

Figure JPOXMLDOC01-appb-T000014
Figure JPOXMLDOC01-appb-T000014

〔実施例1〕
 製造実施例1で得た接合用積層体(1)(10mm×10mm)2枚と、被着体〔プラズマ処理したガラス板(30mm×70mm×2mm)〕2枚を用意した。
 接合用積層体(1)の分子接着剤層がガラス板のプラズマ処理面に対向するように、接合用積層体(1)と被着体(ガラス板)を重ね、これを100℃、0.5MPa(面圧)の条件で5分間熱圧着して、被着体/分子接着剤層/第1の熱可塑性樹脂層/第2の熱可塑性樹脂層からなる積層体を得た。
 この操作とは別に、残りの接合用積層体(1)と被着体を用いて同様の操作を行い、もう1つの積層体を得た。
 次いで、得られた2つの積層体の第2の熱可塑性樹脂層同士を、145℃、0.5MPa(面圧)の条件で10秒間熱圧着して、接合構造体を得た。
[Example 1]
Two laminates for bonding (1) (10 mm × 10 mm) obtained in Production Example 1 and two adherends [plasma-treated glass plate (30 mm × 70 mm × 2 mm)] were prepared.
The bonding laminate (1) and the adherend (glass plate) are stacked so that the molecular adhesive layer of the bonding laminate (1) faces the plasma-treated surface of the glass plate. Thermocompression bonding was performed for 5 minutes under the condition of 5 MPa (surface pressure) to obtain a laminate composed of an adherend / molecular adhesive layer / first thermoplastic resin layer / second thermoplastic resin layer.
Separately from this operation, the same operation was performed using the remaining bonded laminate (1) and the adherend to obtain another laminate.
Next, the second thermoplastic resin layers of the two obtained laminates were thermocompression bonded for 10 seconds under the conditions of 145 ° C. and 0.5 MPa (surface pressure) to obtain a bonded structure.

〔実施例2〕
 製造実施例2で得た接合用積層体(2)(10mm×10mm)2枚と、被着体〔プラズマ処理したガラス板(30mm×70mm×2mm)〕2枚を用意した。
 2つの接合用積層体(2)の各分子接着剤層がガラス板のプラズマ処理面に対向するように、かつ、2つの接合用積層体(2)の第2の熱可塑性樹脂層が互いに対向するように、被着体、接合用積層体(2)、接合用積層体(2)、被着体をこの順に重ね、このものを145℃、0.5MPa(面圧)の条件で5分間熱圧着して、接合構造体を得た。
[Example 2]
Two laminates for bonding (2) (10 mm × 10 mm) obtained in Production Example 2 and two adherends [plasma-treated glass plate (30 mm × 70 mm × 2 mm)] were prepared.
Each molecular adhesive layer of the two bonding laminates (2) faces the plasma processing surface of the glass plate, and the second thermoplastic resin layers of the two bonding laminates (2) face each other. Thus, the adherend, the laminate for bonding (2), the laminate for bonding (2), and the adherend are stacked in this order, and this is laminated at 145 ° C. and 0.5 MPa (surface pressure) for 5 minutes. A bonded structure was obtained by thermocompression bonding.

〔実施例3、4、比較例1〕
 第3表に記載の接合用積層体、及び製造条件を用いたことを除き、実施例2と同様にして接合構造体を得た。
[Examples 3 and 4, Comparative Example 1]
A joined structure was obtained in the same manner as in Example 2 except that the joining laminate described in Table 3 and the production conditions were used.

〔比較例2〕
 製造例1で得た多層フィルム(1)(10mm×10mm)2枚と、被着体〔プラズマ処理したガラス板(30mm×70mm×2mm)〕2枚を用意した。
 2つの多層フィルム(1)のヒートシール可能温度が170℃の層が、それぞれ、ガラス板のプラズマ処理面に対向するように、かつ、2つの多層フィルム(1)のヒートシール可能温度が145℃の層が互いに対向するように、被着体、多層フィルム(1)、多層フィルム(1)、被着体をこの順に重ね、このものを145℃、0.5MPa(面圧)の条件で5分間熱圧着して、接合構造体を得た。
[Comparative Example 2]
Two multilayer films (1) (10 mm × 10 mm) obtained in Production Example 1 and two adherends [plasma-treated glass plates (30 mm × 70 mm × 2 mm)] were prepared.
The layers having a heat sealable temperature of 170 ° C. of the two multilayer films (1) are respectively opposed to the plasma treatment surface of the glass plate, and the heat sealable temperature of the two multilayer films (1) is 145 ° C. The adherend, the multilayer film (1), the multilayer film (1), and the adherend are stacked in this order so that the layers of each other face each other, and this is laminated at 145 ° C. and 0.5 MPa (surface pressure). The bonded structure was obtained by thermocompression bonding for a minute.

〔接着強度の測定〕
 実施例1~4、比較例1、2で得た接合構造体を試験片として用いて、万能引張試験機(インストロン社製、インストロン5581)にて、引張速度50mm/分の条件で接着強度を測定した。さらに、試験終了後に試験片の状態を観察した。結果を第3表に示す。
 なお、比較例2においては、被着体と多層フィルムが十分に接着しておらず、接着強度を測定することができなかった。
(Measurement of adhesive strength)
Using the bonded structures obtained in Examples 1 to 4 and Comparative Examples 1 and 2 as test pieces, bonding was performed with a universal tensile tester (Instron, Instron 5581) under a tensile speed of 50 mm / min. The strength was measured. Furthermore, the state of the test piece was observed after the test. The results are shown in Table 3.
In Comparative Example 2, the adherend and the multilayer film were not sufficiently bonded, and the adhesive strength could not be measured.

〔形状変化評価〕
 実施例1~4、比較例1、2で得た接合構造体を試験片として用いて、熱圧着した後の接合用積層体の浸み出しを目視で確認し、以下の基準で評価した。
 A:接合用積層体の変形による端部の浸み出しが目視で確認できなかった。
 F:接合用積層体の変形による端部の浸み出しが目視で確認できた。
(Shape change evaluation)
Using the bonded structures obtained in Examples 1 to 4 and Comparative Examples 1 and 2 as test pieces, the seepage of the bonded laminate after thermocompression bonding was visually confirmed and evaluated according to the following criteria.
A: Exudation of the end due to deformation of the joining laminate could not be confirmed visually.
F: Exudation of the end portion due to deformation of the bonding laminate was visually confirmed.

Figure JPOXMLDOC01-appb-T000015
Figure JPOXMLDOC01-appb-T000015

 第3表から、以下のことが分かる。
 実施例1~4においては、接着強度の測定後の試験片には、接合用積層体由来の層内での破壊や、接合用積層体由来の層と被着体との界面での破壊は生じていない。したがって、実施例1~4においては、2つの被着体が強固に接合されていることが分かる。
 一方、比較例1において用いた接合用積層体は、第1の熱可塑性樹脂層のヒートシール可能温度と、第2の熱可塑性樹脂層のヒートシール可能温度が同じである。このため、熱圧着時に変形が生じた。
 また、比較例2においては、被着体と多層フィルムが十分に接着していない。したがって、この方法ではガラス板を接合することは困難である。
Table 3 shows the following.
In Examples 1 to 4, the test piece after the measurement of the adhesive strength is broken in the layer derived from the bonding laminate or broken at the interface between the layer derived from the bonding laminate and the adherend. It has not occurred. Therefore, it can be seen that in Examples 1 to 4, the two adherends are firmly joined.
On the other hand, the bonding laminate used in Comparative Example 1 has the same heat-sealable temperature of the first thermoplastic resin layer and the heat-sealable temperature of the second thermoplastic resin layer. For this reason, deformation occurred during thermocompression bonding.
In Comparative Example 2, the adherend and the multilayer film are not sufficiently bonded. Therefore, it is difficult to join the glass plates by this method.

1:第1の熱可塑性樹脂層
2:第2の熱可塑性樹脂層
3:第1の熱可塑性樹脂層と第2の熱可塑性樹脂層で構成された積層体
4:分子接着剤層
5:接合用積層体
6:分子接着剤層と接する側の表面
7:第1の熱可塑性樹脂層とは逆側の表面
8.21.34:分子接着剤層(A-M)
9.22.35:第1の熱可塑性樹脂層(A-1)
10.23.36:第2の熱可塑性樹脂層(A-2)
11.24.37:接合用積層体(A)
12.30.42:被着体(I)
13:工程(L1)の結果物である積層体
14.25.38:分子接着剤層(B-M)
15.26.39:第1の熱可塑性樹脂層(B-1)
16.27.40:第2の熱可塑性樹脂層(B-2)
17.28.41:接合用積層体(B)
18.32.43:被着体(II)
19:工程(L2)の結果物である積層体
20.33.45:接合構造体
29:工程(M1)の結果物である積層体
31:工程(M2)の結果物である積層体
44:工程(N1)で得られたもの
1: First thermoplastic resin layer 2: Second thermoplastic resin layer 3: Laminate 4 composed of first thermoplastic resin layer and second thermoplastic resin layer 4: Molecular adhesive layer 5: Bonding Laminate 6: Surface 7 in contact with the molecular adhesive layer 7: Surface opposite to the first thermoplastic resin layer 8.21.34: Molecular adhesive layer (AM)
9.22.35: First thermoplastic resin layer (A-1)
10.23.36: Second thermoplastic resin layer (A-2)
11.24.37: Laminate for bonding (A)
12.30.42: adherend (I)
13: Laminate 14.25.38: molecular adhesive layer (BM) resulting from step (L1)
15.26.39: first thermoplastic resin layer (B-1)
16.27.40: second thermoplastic resin layer (B-2)
17.28.41: laminate for bonding (B)
18.32.43: adherend (II)
19: Laminated body 20.33.45 as a result of the step (L2): Bonded structure 29: Laminated body 31 as a result of the step (M1): Laminated body 44 as a result of the step (M2): Obtained in step (N1)

Claims (11)

 分子接着剤(M)を含む分子接着剤層、単層構造を有する第1の熱可塑性樹脂層、及び単層構造又は多層構造を有する第2の熱可塑性樹脂層をこの順で有し、前記分子接着剤層と第2の熱可塑性樹脂層が、それぞれ使用時における最外層を構成する接合用積層体であって、
 前記分子接着剤(M)が、アミノ基、アジド基、メルカプト基、イソシアネート基、ウレイド基及びエポキシ基からなる群から選ばれる少なくとも1種の反応性基(Zα)と、シラノール基、及び加水分解反応によりシラノール基を生成させる基からなる群から選ばれる少なくとも1種の反応性基(Zβ)とを有する化合物であり、
 前記第1の熱可塑性樹脂層は、少なくとも、分子接着剤層と接する側の表面に、前記分子接着剤(M)の反応性基(Zα)と化学結合を形成し得る反応性部分構造(Zγ)を有する熱可塑性樹脂(P)を含むものであり、
 前記第1の熱可塑性樹脂層のヒートシール可能温度がTh1、前記第2の熱可塑性樹脂層のヒートシール可能温度がTh2であるときに、Th1>Th2である接合用積層体。
A molecular adhesive layer containing a molecular adhesive (M), a first thermoplastic resin layer having a single layer structure, and a second thermoplastic resin layer having a single layer structure or a multilayer structure in this order, The molecular adhesive layer and the second thermoplastic resin layer are each a laminate for bonding that constitutes the outermost layer in use,
The molecular adhesive (M) includes at least one reactive group (Zα) selected from the group consisting of an amino group, an azide group, a mercapto group, an isocyanate group, a ureido group, and an epoxy group, a silanol group, and a hydrolysis A compound having at least one reactive group (Zβ) selected from the group consisting of groups that generate silanol groups by reaction;
The first thermoplastic resin layer has at least a reactive partial structure (Zγ) capable of forming a chemical bond with the reactive group (Zα) of the molecular adhesive (M) on the surface in contact with the molecular adhesive layer. ) Having a thermoplastic resin (P 1 ) having
Said first thermoplastic heat seal resin layer can temperature T h1, the when the heat-sealable temperature of the second thermoplastic resin layer is T h2, T h1> T h2 a is bonded laminate for.
 前記分子接着剤(M)が有する反応性基(Zα)が、アミノ基、メルカプト基、イソシアネート基、ウレイド基及びエポキシ基からなる群から選ばれる少なくとも1種であり、熱可塑性樹脂(P)が有する反応性部分構造(Zγ)が、ヒドロキシ基、カルボキシ基、アルデヒド基、及びアミノ基からなる群から選ばれる少なくとも1種である、又は、
 前記分子接着剤(M)が有する反応性基(Zα)が、アジド基であり、熱可塑性樹脂(P)が有する反応性部分構造(Zγ)が、炭素-炭素単結合、炭素-炭素二重結合、及び炭素-水素単結合からなる群から選ばれる少なくとも1種である、請求項1に記載の接合用積層体。
The reactive group (Zα) of the molecular adhesive (M) is at least one selected from the group consisting of an amino group, a mercapto group, an isocyanate group, a ureido group, and an epoxy group, and is a thermoplastic resin (P 1 ). The reactive partial structure (Zγ) of is at least one selected from the group consisting of a hydroxy group, a carboxy group, an aldehyde group, and an amino group, or
The reactive group (Zα) included in the molecular adhesive (M) is an azide group, and the reactive partial structure (Zγ) included in the thermoplastic resin (P 1 ) includes a carbon-carbon single bond, a carbon-carbon two bond. The bonding laminate according to claim 1, which is at least one selected from the group consisting of a heavy bond and a carbon-hydrogen single bond.
 前記分子接着剤(M)が、下記式(1)で示される化合物である、請求項1又は2に記載の接合用積層体。
Figure JPOXMLDOC01-appb-C000001
(Rは、アミノ基、アジド基、メルカプト基、イソシアネート基、ウレイド基及びエポキシ基からなる群から選ばれる反応性基(Zα)、又は、これらの反応性基を1以上有する1価の基(ただし、アミノ基、アジド基、メルカプト基、イソシアネート基、ウレイド基及びエポキシ基を除く。)を表し、Gは2価の有機基を表し、Xは、ヒドロキシ基、炭素数1~10のアルコキシ基又はハロゲン原子を表し、Yは、炭素数1~20の炭化水素基を表す。aは、1~3の整数を表す。)
The laminated body for joining according to claim 1 or 2, wherein the molecular adhesive (M) is a compound represented by the following formula (1).
Figure JPOXMLDOC01-appb-C000001
(R 1 is a reactive group (Zα) selected from the group consisting of an amino group, an azide group, a mercapto group, an isocyanate group, a ureido group and an epoxy group, or a monovalent group having one or more of these reactive groups. (However, an amino group, an azide group, a mercapto group, an isocyanate group, a ureido group and an epoxy group are excluded.) G represents a divalent organic group, X represents a hydroxy group, an alkoxy having 1 to 10 carbon atoms. And Y represents a hydrocarbon group having 1 to 20 carbon atoms, and a represents an integer of 1 to 3.)
 分子接着剤(M)の反応性基(Zα)と、熱可塑性樹脂(P)の反応性部分構造(Zγ)が化学結合を形成している、請求項1~3のいずれかに記載の接合用積層体。 The reactive group (Zα) of the molecular adhesive (M) and the reactive partial structure (Zγ) of the thermoplastic resin (P 1 ) form a chemical bond according to any one of claims 1 to 3. Laminate for bonding.  前記熱可塑性樹脂(P)が、オレフィン系樹脂、シクロオレフィン系樹脂、アクリル系樹脂、オレフィン-酢酸ビニル系樹脂、オレフィン系アイオノマー樹脂、及びポリエステル樹脂からなる群から選ばれる少なくとも1種である、請求項1~4のいずれかに記載の接合用積層体。 The thermoplastic resin (P 1 ) is at least one selected from the group consisting of olefin resins, cycloolefin resins, acrylic resins, olefin-vinyl acetate resins, olefin ionomer resins, and polyester resins. The bonding laminate according to any one of claims 1 to 4.  前記第2の熱可塑性樹脂層は、少なくとも分子接着剤層とは逆側の表面に、オレフィン系樹脂、シクロオレフィン系樹脂、アクリル系樹脂、オレフィン-酢酸ビニル系樹脂、オレフィン系アイオノマー樹脂、及びポリエステル樹脂からなる群から選ばれる少なくとも1種を含むものである、請求項1~5のいずれかに記載の接合用積層体。 The second thermoplastic resin layer has an olefin resin, a cycloolefin resin, an acrylic resin, an olefin-vinyl acetate resin, an olefin ionomer resin, and a polyester at least on the surface opposite to the molecular adhesive layer. The bonding laminate according to any one of claims 1 to 5, comprising at least one selected from the group consisting of resins.  2つの接合用積層体を使用して、被着体(I)と被着体(II)とを接合する方法であって、
 前記2つの接合用積層体が、それぞれ独立して、請求項1~6のいずれかに記載の接合用積層体であり、
 第1の接合用積層体を、分子接着剤(M)を含む分子接着剤層(A-M)、単層構造を有する第1の熱可塑性樹脂層(A-1)、及び単層構造又は多層構造を有する第2の熱可塑性樹脂層(A-2)をこの順で有する接合用積層体(A)と表し、第2の接合用積層体を、分子接着剤(M)を含む分子接着剤層(B-M)、単層構造を有する第1の熱可塑性樹脂層(B-1)、及び単層構造又は多層構造を有する第2の熱可塑性樹脂層(B-2)をこの順で有する接合用積層体(B)と表したときに、
 以下の工程(L1)~(L3)を含む工程群と、工程(M1)~(M3)を含む工程群と、工程(N1)、(N2)を含む工程群と、から選ばれるいずれかの工程群を行うことを特徴とする、被着体(I)と被着体(II)とを接合する方法。
工程(L1):接合用積層体(A)の分子接着剤層(A-M)と被着体(I)とを接着する工程
工程(L2):接合用積層体(B)の分子接着剤層(B-M)と被着体(II)とを接着する工程
工程(L3):工程(L1)で得られた積層体の第2の熱可塑性樹脂層(A-2)と、工程(L2)で得られた積層体の第2の熱可塑性樹脂層(B-2)とを熱溶着する工程
工程(M1):接合用積層体(A)の第2の熱可塑性樹脂層(A-2)と、接合用積層体(B)の第2の熱可塑性樹脂層(B-2)とを熱溶着する工程
工程(M2):工程(M1)で得られた積層体の分子接着剤層(A-M)と被着体(I)とを接着する工程
工程(M3):工程(M2)で得られた積層体の分子接着剤層(B-M)と被着体(II)とを接着する工程
工程(N1):接合用積層体(A)の第2の熱可塑性樹脂層(A-2)と、接合用積層体(B)の第2の熱可塑性樹脂層(B-2)が対向する配置で、被着体(I)、接合用積層体(A)、接合用積層体(B)、被着体(II)を、この順に重ねる工程
工程(N2):工程(N1)で得られたものを加熱して、分子接着剤層(A-M)と被着体(I)との接着と、分子接着剤層(B-M)と被着体(II)との接着と、第2の熱可塑性樹脂層(A-2)と第2の熱可塑性樹脂層(B-2)との熱溶着を同時に行う工程
A method of joining an adherend (I) and an adherend (II) using two laminates for joining,
The bonding laminate according to any one of claims 1 to 6, wherein the two bonding laminates are each independently
The first bonding laminate includes a molecular adhesive layer (AM) including a molecular adhesive (M A ), a first thermoplastic resin layer (A-1) having a single layer structure, and a single layer structure Alternatively, the second thermoplastic resin layer (A-2) having a multilayer structure is referred to as a bonding laminate (A) in this order, and the second bonding laminate includes a molecular adhesive (M B ). A molecular adhesive layer (BM), a first thermoplastic resin layer (B-1) having a single layer structure, and a second thermoplastic resin layer (B-2) having a single layer structure or a multilayer structure. When expressed as a laminate for bonding (B) in this order,
Any one selected from a process group including the following processes (L1) to (L3), a process group including the processes (M1) to (M3), and a process group including the processes (N1) and (N2). A method for joining the adherend (I) and the adherend (II), comprising performing a process group.
Step (L1): Step of bonding the molecular adhesive layer (AM) of the bonding laminate (A) and the adherend (I) Step (L2): Molecular adhesive of the bonding laminate (B) Step (L3) for bonding the layer (BM) and the adherend (II): the second thermoplastic resin layer (A-2) of the laminate obtained in the step (L1), and a step ( Step (M1) of heat-welding the second thermoplastic resin layer (B-2) of the laminate obtained in L2): the second thermoplastic resin layer (A- 2) and step (M2) of thermally welding the second thermoplastic resin layer (B-2) of the laminate for bonding (B): molecular adhesive layer of the laminate obtained in step (M1) Step (M3) for bonding (AM) and adherend (I): molecular adhesive layer (BM) and adherend (II) of the laminate obtained in step (M2) Process process ( 1) An arrangement in which the second thermoplastic resin layer (A-2) of the laminate for bonding (A) and the second thermoplastic resin layer (B-2) of the laminate for bonding (B) face each other. , Adherend (I), bonding laminate (A), bonding laminate (B), and adherend (II) are stacked in this order (step (N2): obtained in step (N1) Are heated, the adhesion between the molecular adhesive layer (AM) and the adherend (I), the adhesion between the molecular adhesive layer (BM) and the adherend (II), the second A step of simultaneously performing thermal welding between the thermoplastic resin layer (A-2) and the second thermoplastic resin layer (B-2).
 前記工程(L1)~(L3)を含む工程群を行う、被着体(I)と被着体(II)とを接合する方法であって、
 工程(L1)において、接合用積層体(A)の分子接着剤層(A-M)と被着体(I)とを接着する際の温度がTL1
 工程(L2)において、接合用積層体(B)の分子接着剤層(B-M)と被着体(II)とを接着する際の温度がTL2
 工程(L3)において、第2の熱可塑性樹脂層(A-2)と第2の熱可塑性樹脂層(B-2)とを熱溶着する際の温度がTL3
 接合用積層体(A)の第1の熱可塑性樹脂層(A-1)のヒートシール可能温度がTh1A、第2の熱可塑性樹脂層(A-2)のヒートシール可能温度がTh2Aであり、
 接合用積層体(B)の第1の熱可塑性樹脂層(B-1)のヒートシール可能温度がTh1B、第2の熱可塑性樹脂層(B-2)のヒートシール可能温度がTh2Bであるときに、
 下記式(E-1)と式(E-2)のいずれも満たし、かつ、下記式(E-3)と式(E-4)の少なくとも一方を満たす、請求項7に記載の、被着体(I)と被着体(II)とを接合する方法。
Figure JPOXMLDOC01-appb-M000002
A method of joining the adherend (I) and the adherend (II), comprising performing a process group including the steps (L1) to (L3),
In the step (L1), the temperature at which the molecular adhesive layer (AM) of the bonding laminate (A) and the adherend (I) are bonded is T L1 ,
In step (L2), the temperature at which the molecular adhesive layer (BM) of the laminate for bonding (B) and the adherend (II) are bonded is T L2 ,
In the step (L3), the temperature at which the second thermoplastic resin layer (A-2) and the second thermoplastic resin layer (B-2) are thermally welded is T L3 ,
The heat-sealable temperature of the first thermoplastic resin layer (A-1) of the bonding laminate (A) is Th1A , and the heat-sealable temperature of the second thermoplastic resin layer (A-2) is Th2A . Yes,
The heat-sealable temperature of the first thermoplastic resin layer (B-1) of the bonding laminate (B) is Th1B , and the heat-sealable temperature of the second thermoplastic resin layer (B-2) is Th2B . When
The deposition according to claim 7, wherein both of the following formula (E-1) and formula (E-2) are satisfied, and at least one of the following formula (E-3) and formula (E-4) is satisfied. A method of joining the body (I) and the adherend (II).
Figure JPOXMLDOC01-appb-M000002
 前記工程(N1)、(N2)を含む工程群を行う、被着体(I)と被着体(II)とを接合する方法であって、
 接合用積層体(A)の第1の熱可塑性樹脂層(A-1)のヒートシール可能温度がTh1A、第2の熱可塑性樹脂層(A-2)のヒートシール可能温度がTh2Aであり、
 接合用積層体(B)の第1の熱可塑性樹脂層(B-1)のヒートシール可能温度がTh1B、第2の熱可塑性樹脂層(B-2)のヒートシール可能温度がTh2Bであり、
 工程(N2)において、熱溶着する際の温度がTN2であるときに、
 下記式(E-5)と式(E-6)の少なくとも一方を満たす、請求項7に記載の、被着体(I)と被着体(II)とを接合する方法。
Figure JPOXMLDOC01-appb-M000003
A method of joining the adherend (I) and the adherend (II), comprising performing a process group including the steps (N1) and (N2),
The heat-sealable temperature of the first thermoplastic resin layer (A-1) of the bonding laminate (A) is Th1A , and the heat-sealable temperature of the second thermoplastic resin layer (A-2) is Th2A . Yes,
The heat-sealable temperature of the first thermoplastic resin layer (B-1) of the bonding laminate (B) is Th1B , and the heat-sealable temperature of the second thermoplastic resin layer (B-2) is Th2B . Yes,
In the step (N2), when the temperature at the time of heat welding is TN2 ,
The method for joining the adherend (I) and the adherend (II) according to claim 7, wherein at least one of the following formula (E-5) and formula (E-6) is satisfied.
Figure JPOXMLDOC01-appb-M000003
 被着体(I)/接合用積層体(A)と接合用積層体(B)由来の層/被着体(II)、の層構造を有する接合構造体の製造方法であって、請求項7~9のいずれかに記載の方法を使用して、被着体(I)と被着体(II)を接合することを特徴とする、接合構造体の製造方法。 A method for producing a bonded structure having a layer structure of an adherend (I) / a laminate for bonding (A) and a layer derived from the laminate for bonding (B) / an adherend (II), A method for producing a bonded structure comprising bonding the adherend (I) and the adherend (II) using the method according to any one of 7 to 9.  被着体(I)と被着体(II)が、それぞれ独立して、金属、無機物、及び熱硬化性樹脂からなる群から選ばれる少なくとも1種を、少なくとも被接着面に含むものである、請求項10に記載の接合構造体の製造方法。 The adherend (I) and the adherend (II) each independently contain at least one selected from the group consisting of metals, inorganic substances, and thermosetting resins in at least the adherend surface. The manufacturing method of the joining structure of 10.
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